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Application filed by Mc Electronics Co LtdfiledCriticalMc Electronics Co Ltd
Priority to TW085114958ApriorityCriticalpatent/TW352500B/en
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Publication of TW352500BpublicationCriticalpatent/TW352500B/en
A process for fabricating a product including the steps of subjecting a substrate to a composition of entities, at least one of the entities emanating from a species generating by a plasma excited by a high frequency field provided by an inductive coupling structure in which the phase and anti-phase capacitive currents into the plasma are substantially balanced.
TW085114958A1996-12-041996-12-04A process for fabricating a product using a high frequency plasma, and apparatus for the same
TW352500B
(en)
A high-frequency plasma process wherein the plasma is excited by an inductive structure in which the phase and anti-phase portions of the capactive currents between the inductive structure and the plasma are balanced