TW352464B - Method for reducing cross contamination in ion implantor - Google Patents

Method for reducing cross contamination in ion implantor

Info

Publication number
TW352464B
TW352464B TW086113090A TW86113090A TW352464B TW 352464 B TW352464 B TW 352464B TW 086113090 A TW086113090 A TW 086113090A TW 86113090 A TW86113090 A TW 86113090A TW 352464 B TW352464 B TW 352464B
Authority
TW
Taiwan
Prior art keywords
air
disc
cross contamination
reducing cross
chamber
Prior art date
Application number
TW086113090A
Other languages
Chinese (zh)
Inventor
Cheng-Jr Tsia
Jen-Chiuan Jang
Chi-Ruei Sung
Original Assignee
United Semiconductor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Semiconductor Corp filed Critical United Semiconductor Corp
Priority to TW086113090A priority Critical patent/TW352464B/en
Application granted granted Critical
Publication of TW352464B publication Critical patent/TW352464B/en

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  • Cleaning In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

The process for reducing cross contamination in the ion implantor comprises a disc chamber containing a disc tray and a plurality of gates, the steps are: (a) to close up all valves for the gates of the disc chamber; (b) a air source supplying air required to the disc chamber, the air inported will react with the contaminant to be eradicated; (c) to cut off the air supply; (d) using vacuum cleaner to remove out of the chamber the by-products created by reaction of air with the contaminants; (e) repeating the above steps (a) through (d) several times will ensure the complete removal of contaminant from the disc surface.
TW086113090A 1997-09-10 1997-09-10 Method for reducing cross contamination in ion implantor TW352464B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW086113090A TW352464B (en) 1997-09-10 1997-09-10 Method for reducing cross contamination in ion implantor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW086113090A TW352464B (en) 1997-09-10 1997-09-10 Method for reducing cross contamination in ion implantor

Publications (1)

Publication Number Publication Date
TW352464B true TW352464B (en) 1999-02-11

Family

ID=57940072

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086113090A TW352464B (en) 1997-09-10 1997-09-10 Method for reducing cross contamination in ion implantor

Country Status (1)

Country Link
TW (1) TW352464B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI412620B (en) * 2004-10-26 2013-10-21 Advanced Tech Materials Methods and apparatus for cleaning semiconductor manufacturing tool

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI412620B (en) * 2004-10-26 2013-10-21 Advanced Tech Materials Methods and apparatus for cleaning semiconductor manufacturing tool

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