Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Semiconductor CorpfiledCriticalUnited Semiconductor Corp
Priority to TW086113090ApriorityCriticalpatent/TW352464B/en
Application grantedgrantedCritical
Publication of TW352464BpublicationCriticalpatent/TW352464B/en
Physical Or Chemical Processes And Apparatus
(AREA)
Abstract
The process for reducing cross contamination in the ion implantor comprises a disc chamber containing a disc tray and a plurality of gates, the steps are: (a) to close up all valves for the gates of the disc chamber; (b) a air source supplying air required to the disc chamber, the air inported will react with the contaminant to be eradicated; (c) to cut off the air supply; (d) using vacuum cleaner to remove out of the chamber the by-products created by reaction of air with the contaminants; (e) repeating the above steps (a) through (d) several times will ensure the complete removal of contaminant from the disc surface.
TW086113090A1997-09-101997-09-10Method for reducing cross contamination in ion implantor
TW352464B
(en)