TW345717B - Planarized component structure with buried gate and process for producing the same - Google Patents

Planarized component structure with buried gate and process for producing the same

Info

Publication number
TW345717B
TW345717B TW086112429A TW86112429A TW345717B TW 345717 B TW345717 B TW 345717B TW 086112429 A TW086112429 A TW 086112429A TW 86112429 A TW86112429 A TW 86112429A TW 345717 B TW345717 B TW 345717B
Authority
TW
Taiwan
Prior art keywords
trench
buried gate
component structure
producing
same
Prior art date
Application number
TW086112429A
Other languages
Chinese (zh)
Inventor
Yeu-Haw Yang
Original Assignee
Winbond Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Winbond Electronics Corp filed Critical Winbond Electronics Corp
Priority to TW086112429A priority Critical patent/TW345717B/en
Application granted granted Critical
Publication of TW345717B publication Critical patent/TW345717B/en

Links

Landscapes

  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Semiconductor Memories (AREA)

Abstract

A planarized component structure with a buried gate, which comprises: a semiconductor substrate formed with a trench therein; a pair of source and drain regions separately formed in the semiconductor substrate on both sides of the trench and having a depth approximately equivalent to the depth of the trench; a side wall spacer formed on the side wall of the trench; a gate oxide layer formed on the surface of the bottom portion of the trench; and a buried gate formed on the gate oxide layer and filling up the trench, the surface of which being approximately at the same height as that of the surface of the pair of source and drain regions.
TW086112429A 1997-08-30 1997-08-30 Planarized component structure with buried gate and process for producing the same TW345717B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW086112429A TW345717B (en) 1997-08-30 1997-08-30 Planarized component structure with buried gate and process for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW086112429A TW345717B (en) 1997-08-30 1997-08-30 Planarized component structure with buried gate and process for producing the same

Publications (1)

Publication Number Publication Date
TW345717B true TW345717B (en) 1998-11-21

Family

ID=58263851

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086112429A TW345717B (en) 1997-08-30 1997-08-30 Planarized component structure with buried gate and process for producing the same

Country Status (1)

Country Link
TW (1) TW345717B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2275374A1 (en) 2009-07-16 2011-01-19 Sdi Corporation Rotatable knob controlled adhesive tape dispenser
CN109473356A (en) * 2017-09-08 2019-03-15 Imec 非营利协会 It is used to form the method and vertical channel device of vertical channel device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2275374A1 (en) 2009-07-16 2011-01-19 Sdi Corporation Rotatable knob controlled adhesive tape dispenser
CN109473356A (en) * 2017-09-08 2019-03-15 Imec 非营利协会 It is used to form the method and vertical channel device of vertical channel device

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees