TW343376B - Semiconductor device and its manufacture - Google Patents
Semiconductor device and its manufactureInfo
- Publication number
- TW343376B TW343376B TW086110808A TW86110808A TW343376B TW 343376 B TW343376 B TW 343376B TW 086110808 A TW086110808 A TW 086110808A TW 86110808 A TW86110808 A TW 86110808A TW 343376 B TW343376 B TW 343376B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- oxide dielectric
- electrode layer
- substrate
- semiconductor device
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
Abstract
A semiconductor device characterized in having a substrate, a lower electrode layer installed on the upper portion of the substrate, an oxide dielectric layer formed on the lower electrode layer, and an upper electrode layer installed on the oxide dielectric layer; the lower and upper electrode layers and the oxide dielectric layer constituting the oxide dielectric capacitor, the lower electrode layer including a conductive oxide layer comprised of two adjacent layers having the same crystal structure and containing the same element and being different from each other only in the oxygen ratio in the composition, the side layer of the inner substrate on the two adjacent layers containing oxygen deficiency.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP1996/002226 WO1998006131A1 (en) | 1996-08-07 | 1996-08-07 | Semiconductor device and its manufacture |
Publications (1)
Publication Number | Publication Date |
---|---|
TW343376B true TW343376B (en) | 1998-10-21 |
Family
ID=14153652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086110808A TW343376B (en) | 1996-08-07 | 1997-07-29 | Semiconductor device and its manufacture |
Country Status (2)
Country | Link |
---|---|
TW (1) | TW343376B (en) |
WO (1) | WO1998006131A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3681632B2 (en) | 2000-11-06 | 2005-08-10 | 松下電器産業株式会社 | Semiconductor device and manufacturing method thereof |
WO2009122497A1 (en) | 2008-03-31 | 2009-10-08 | 富士通マイクロエレクトロニクス株式会社 | Ferroelectric memory and its manufacturing method, and ferroelectric capacitor manufacturing method |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2682392B2 (en) * | 1993-09-01 | 1997-11-26 | 日本電気株式会社 | Thin film capacitor and method of manufacturing the same |
US5504041A (en) * | 1994-08-01 | 1996-04-02 | Texas Instruments Incorporated | Conductive exotic-nitride barrier layer for high-dielectric-constant materials |
JP2703206B2 (en) * | 1994-09-30 | 1998-01-26 | 三星電子株式会社 | Ferroelectric capacitor and method of manufacturing the same |
JP2735094B2 (en) * | 1994-12-01 | 1998-04-02 | 日本電気株式会社 | Thin film capacitor and method of manufacturing the same |
-
1996
- 1996-08-07 WO PCT/JP1996/002226 patent/WO1998006131A1/en not_active Application Discontinuation
-
1997
- 1997-07-29 TW TW086110808A patent/TW343376B/en active
Also Published As
Publication number | Publication date |
---|---|
WO1998006131A1 (en) | 1998-02-12 |
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