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A method of pattern-processing of a photosensitive resin composition comprising coating on a substrate a positive photosensitive resin composition having a polyamide represented by the following formula: (1) and a diazoquinone compound, subjecting the same to prebaking and then to irradiation with a light; wherein X is a tetravalent aromatic group given as follows: and A for -CH2-, -O-, -S-, -SO2-, -CO-, -NHCO- or -CO-, -NHCO- or -C(CF3)2-; Y is a divalent group; given as follows; where A for -CH2-, -O-, -S-, -SO2-, -CO-, -NHCO- or -CO-, -NHCO- or -C(CF3)2-; Z is in which R1 and R2 are divalent organic groups and R3 and R4 are monovalent organic groups, a and b are mole fractions; a + b = 10-0 mole %; a = 60.0 - 100 mole %; b = 0 - 40.0 mole % and n = 2 - 500.
TW085115887A1995-06-301996-12-23Method for the pattern-processing of photosensitive resin compositions
TW338770B
(en)
Charge imparting member and method for producing the same, electrostatic latent image developer using the same, image forming apparatus, and image forming method
Silane hydrolysates and aluminium compounds non-abrasive coating compositions; non-abrasive and high impact strength products coated with said compositions
ABRASION-RESISTANT THERMAL CURING POLYSILOXANE COATING COMPOSITIONS, METHOD FOR THE PRODUCTION THEREOF AND COATED OBJECTS, IN PARTICULAR CONTACT LENSES