TW327693B - The plasma treatment method for lowing down resistance of TiN - Google Patents

The plasma treatment method for lowing down resistance of TiN

Info

Publication number
TW327693B
TW327693B TW085114974A TW85114974A TW327693B TW 327693 B TW327693 B TW 327693B TW 085114974 A TW085114974 A TW 085114974A TW 85114974 A TW85114974 A TW 85114974A TW 327693 B TW327693 B TW 327693B
Authority
TW
Taiwan
Prior art keywords
tin
treatment method
plasma treatment
tin layer
chamber
Prior art date
Application number
TW085114974A
Other languages
Chinese (zh)
Inventor
Song-Jiun Shieh
Yeong-Tsuen Luoh
Jeng-Shiun Tsay
Wenn-Yuh Her
Original Assignee
Mos Electronics Taiwan Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mos Electronics Taiwan Inc filed Critical Mos Electronics Taiwan Inc
Priority to TW085114974A priority Critical patent/TW327693B/en
Application granted granted Critical
Publication of TW327693B publication Critical patent/TW327693B/en

Links

Abstract

A plasma treatment method used to low down the resistance of TiN. It includes: - Form TiN layer on substrate, in which, the TiN layer is formed inside the 1st chamber; - Purify TiN layer to form TiN layer with low resistance; In which, the purity TiN layer is proceeded inside the 2nd chamber, and the temperature of 2nd chamber is different from 1st chamber.
TW085114974A 1996-12-04 1996-12-04 The plasma treatment method for lowing down resistance of TiN TW327693B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW085114974A TW327693B (en) 1996-12-04 1996-12-04 The plasma treatment method for lowing down resistance of TiN

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW085114974A TW327693B (en) 1996-12-04 1996-12-04 The plasma treatment method for lowing down resistance of TiN

Publications (1)

Publication Number Publication Date
TW327693B true TW327693B (en) 1998-03-01

Family

ID=58262366

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085114974A TW327693B (en) 1996-12-04 1996-12-04 The plasma treatment method for lowing down resistance of TiN

Country Status (1)

Country Link
TW (1) TW327693B (en)

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees