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Application filed by Biing-Lin GuofiledCriticalBiing-Lin Guo
Priority to TW085102772ApriorityCriticalpatent/TW327182B/en
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Publication of TW327182BpublicationCriticalpatent/TW327182B/en
A burning resistant phosphide with double functional groups such as formula(I), in which A is H or -CONHRNCO-, R is C1~20, aromatic compounds; B is C 1~20; R1 is H or C1~4; R2 is H or C1~4; m is any integer of 1~5; n is any integer of 1~5; x is any integer of 1~100; y is any integer 2~5000; molecular weight is between 300 and 50000.
TW085102772A1996-03-071996-03-07Burning resistant phosphide with double functional groups
TW327182B
(en)
A base resin for use in chemically amplified resist and a manufacturing method thereof the invention relates to a base resin for use in a chemically amplified resist and a manufacturing method thereof, the base resin containing two t-butyl groups