TW324075B - Phase-shifting mask border region pattern alignment method - Google Patents

Phase-shifting mask border region pattern alignment method

Info

Publication number
TW324075B
TW324075B TW086109099A TW86109099A TW324075B TW 324075 B TW324075 B TW 324075B TW 086109099 A TW086109099 A TW 086109099A TW 86109099 A TW86109099 A TW 86109099A TW 324075 B TW324075 B TW 324075B
Authority
TW
Taiwan
Prior art keywords
border region
phase
shifting mask
alignment method
region pattern
Prior art date
Application number
TW086109099A
Other languages
Chinese (zh)
Inventor
San-Der Tzy
Yi-Shiuh Chen
Jyh-Chyang Twu
Original Assignee
Taiwan Semiconductor Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg Co Ltd filed Critical Taiwan Semiconductor Mfg Co Ltd
Priority to TW086109099A priority Critical patent/TW324075B/en
Application granted granted Critical
Publication of TW324075B publication Critical patent/TW324075B/en

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

A phase-shifting mask stricture comprises of: (1) One mask substrate; (2) One pattern region formed on the mask substrate; (3) One border region formed on the mask substrate and the pattern region outside, in which the border region approximated is formed as polygon, and one side adjacent with the pattern region has multiple turnings; (4) Multiple first contact windows formed in the border region, whose distribution method is based on each turning of the border region, extending to outside and two lateral sides in same space.
TW086109099A 1997-06-28 1997-06-28 Phase-shifting mask border region pattern alignment method TW324075B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW086109099A TW324075B (en) 1997-06-28 1997-06-28 Phase-shifting mask border region pattern alignment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW086109099A TW324075B (en) 1997-06-28 1997-06-28 Phase-shifting mask border region pattern alignment method

Publications (1)

Publication Number Publication Date
TW324075B true TW324075B (en) 1998-01-01

Family

ID=58262059

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086109099A TW324075B (en) 1997-06-28 1997-06-28 Phase-shifting mask border region pattern alignment method

Country Status (1)

Country Link
TW (1) TW324075B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI794312B (en) * 2017-10-26 2023-03-01 德商卡爾蔡司Ｓｍｔ有限公司 Set of microlithographic masks, method for determining edge positions of the images of the structures of a mask, system for carrying out such a method, use of such a method, method for determining an overlay error or a relative edge placement error of a plurality of microlithographic masks, method for producing a microstructured or nanostructured component and component produced according to such a method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI794312B (en) * 2017-10-26 2023-03-01 德商卡爾蔡司Ｓｍｔ有限公司 Set of microlithographic masks, method for determining edge positions of the images of the structures of a mask, system for carrying out such a method, use of such a method, method for determining an overlay error or a relative edge placement error of a plurality of microlithographic masks, method for producing a microstructured or nanostructured component and component produced according to such a method

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