TW320815B - - Google Patents

Description

Printed by R Industrial and Consumer Cooperatives, Central Bureau of Standards, Ministry of Economic Affairs 320815 A6 _B6 V. Description of the invention (1) Invention of americium city The present invention shows an electroluminescent stack and its manufacturing method. The present invention also shows an electroluminescent display panel electrically connected to a voltage drive circuit from an electroluminescent® sheet. The present invention further shows a laser that depicts a pattern on a planar stack, such as address lines for transparent electrodes of electroluminescent pads. Invention Backlight Electroluminescence (EL) is light emitted from phosphorus due to applied voltage. Electroluminescent devices have applications as lamps and displays. At present, electroluminescent devices are used for flat panel display systems, and contain one of the predefined character shapes or individually addressable pixels in the short matrix. The pioneering work of electroluminescence used to be carried out at G T E S y 1 ν a n i a (company name). An alternating current (AC) voltage is applied to the powder or dispersion type EL device in which the phosphorescent powder is embedded in the organic binder deposited on the glass substrate and covering the transparent electrode. These powder or dispersion type EL devices generally have low brightness and other problems that prevent widespread use. Thin film electroluminescence (TFEL) devices were developed in the 1950s. The basic structure of the AC thin layer sheet is well known, for example, see the presentation record of the 1989 International Symposium on the Presentation of the Information Display Society (T 〇r nq vist R. 0. ; And US Patent No. 4,857,802 issued to Fuyaraa, etc. The phosphor layer is sandwiched between a pair of electrodes, and the electrodes are separated by individual insulating / dielectric layers from then on. Most commonly, the phosphorus material is zinc sulfide (Z n S) which includes manganese (Μ η) as an activator (dopant). Β ZnSMn is a yellow light-emitting β. Other colors of phosphorus have been developed. -3---------- ί ------ {----- 装 ------ ΪΓ ------ Μ (Please read the notes on the back first (This page is written on this page) This paper scale is applicable to the Zhongpu National Standard (CNS) A 4 specifications (210 X 2971 'centimeters) 82. 5. 20,000 Printed A6 B6 _5. Description of the invention (8) 2) The conventional TFEL stacked H layer is deposited on a substrate, usually glass. Therefore, the deposition of this layer is done by well-known thin film technology, such as electron beam (Ε Β) vacuum evaporation or sputtering and, more recently, atomic layer crystallography (ALE). The thickness of the entire TFEL® sheet is only in the order of 1 or 2 cm (Um). To separate the electrically insulating phosphor layer from the electrode, various insulating / dielectric materials are known and used as discussed in detail below. The electrodes of these two electrodes are different, depending on whether they are on the "rear" or "front view" side of the device. Reflective metals such as aluminum are typically used as the rear electrode. The relatively thin light-transmitting layer of tin oxide ( ITO) is typically used as the front electrode. In the application of the lamp, the two electrodes are formed in the form of an intertwined layer, thereby subjecting the entire phosphor layer between the two electrodes to the electric field. In typical display applications, the front and rear electrodes define the columns And row electrode electrical conduction address lines to make the appropriate pattern. Pixels are defined in this example where the row electrodes overlap. Various electronic display drivers are known that address one column electrode and one row electrode simultaneously to address individually Pixels. Although simple in concept, the development of thin-film electroluminescent devices has encountered many practical difficulties. The first difficulty is due to the fact that the device uses thin-film technology to deposit individual stacked H layers to form a time-consuming and expensive technology. Very small defects in any layer can cause malfunctions. Second, these thin-film devices are typically operated at fairly high voltages, ie 300-45 (3 volts to peak-to-peak. In fact, this allows the phosphor layer to operate The voltage will exceed its dielectric breakdown voltage and cause conduction. The thin-film dielectric layer on either side of the phosphor layer needs to limit or prevent conduction between the electrodes. The application of a large electric field will cause electrical between the electrodes -------- -Ι ---.------ f ----- installed ------. 玎 ------ for (please read the precautions before writing this page) This The paper scale applies the Chinese National Standard (CNS) A4 regulation (2 〖0 X 297 public issue) 82. 5. 20,000 520815 A6 B6 Printed by the Beigong Consumer Cooperative of the Central Standards Bureau of the Ministry of Economy V. Invention description (3) collapsed, Causes device failure. The present invention is specifically directed to the insulation / dielectric layer of the electroluminescent device and preventing discharge across the phosphor layer. The requirement for successful operation of the electroluminescent device is that the electrode (address line) is isolated from the phosphor layer. This function is absolutely Line / dielectric layer. Typically, the insulating / dielectric layer is attached to either side of the phosphor layer and is composed of aluminum, yttrium, silicon, silicon nitride, or other dielectric materials. During device operation, self-insulating layer and phosphor The electrons in the interface between the layers are accelerated by the electric field when they pass through the phosphor layer, and collide with the dopant atoms in the phosphor layer. The result is light emission. In the conventional TFEL device, in order to ensure that the electric field strength across the phosphor layer is sufficiently high, the thickness of the dielectric layer is usually kept less than or comparable to that of the phosphor layer. If the dielectric layer is too thick, apply it at the address Most of the voltage between the lines is connected across the dielectric layer instead of across the phosphor layer. It is important that the dielectric material is compatible with the phosphor layer. Use " Compatible " for this specification and apply for a patent The meaning in the scope is: First, provide a good injection interface, that is, the hot electron source of the phosphorus interface can promote or tunnel into the phosphorus conductive zone when an electric field is applied to initiate conduction and emit light in the phosphorus layer. Within the meaning of compatibility, the dielectric material must be chemically stable so as not to react with the adjacent layer, ie phosphorus or electrode. In a typical T F E L, in order to achieve full luminescence, the applied voltage is very close to the voltage at which dielectric breakdown occurs. As such, manufacturing control over the thickness and quality of the dielectric and phosphor layers must be strictly controlled to prevent collapse. This requirement also makes it difficult to achieve high manufacturing capabilities. A typical T F E L structure is manufactured from the front (view) side to the rear side. Thin layer --------- I ---'------ ^ ----- installed ------. 玎 ------ MJ (please read the back side first (Notes to be written on this page) This paper scale is applicable to the Chinese National Standard (CNS) f 4 specifications (210 X 297 public interpretation) 82. 5. 20,000 Printed A6 _B6_ by the Industrial and Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs (4) It is deposited sequentially on a suitable substrate. The glass substrate is used to provide transparency. The transparent front electrode (I T 0 address line) was deposited on the glass substrate by a sputtering method to a thickness of about 0.2 cm. Then usually the subsequent dielectric-phosphorus-dielectric layer is deposited by sputtering or evaporation. The thickness of the phosphorous layer is typically about 0.5 m. After about 451TC deposition, the phosphor layer is usually annealed to improve efficiency. Then, a rear electrode is typically added in the form of an aluminum address line having a thickness of 0.1 cm. The prepared TFELS sheet is encapsulated to prevent external moisture, and the cover glass or silicone oil is laminated with a ring gas resin. The initial substrate used for deposition is typically glass, and the materials and deposition techniques used for TFEL daysheets cannot require high-temperature processing. The high electric field strength used to operate the TFEL device places heavy demands on the dielectric layer. High dielectric strength is required to avoid electrical breakdown. Preferably, the medium has a high dielectric constant to provide light emission at the smallest possible driving voltage. However, efforts to use high dielectric constant materials have not provided satisfactory results. In order to reduce the driving voltage of the TFEL element, the insulation layer has been made from a higher dielectric constant material, such as S r T i 0 3 (Strontium Titanium Trioxide), P b T i 0 3 (Lead Titanium Trioxide) , And B a T a 0 3 (barium giant gasification), as reported in US Patent No. 4,857,802 issued to Toyama et al. However, these materials do not perform well and exhibit low dielectric breakdown strength. In U.S. Patent No. 4,857, 802, the dielectric layer is formed from perovskite crystals by controlled thin film deposition technology to achieve an increased plane orientation (1 1 1 h Patent reports higher dielectric strength (at about 8 . 0 X 1 0 s ~ 1 · 0 X 1 0 s volts / cm) with S r T i 0 3, P b T i 0 3 and --------- Ί —J ---- -< ----- 装 ------. 玎 ------ Zun (please read the precautions on the back before writing this page) This paper scale is applicable to China National Standard (CNS) A 4 Dange (210 X 297 mm) 82. 5. 20,000 Printed 320815 A6 __B6_ by the Staff Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs 5. Description of the invention (5) BaTiO 3 dielectric layer with a thickness of about 0.5 cm, all of which have high Dielectric constant and perovskite crystal. For this dielectric layer, this device still has the disadvantages of complex and difficult to control the thin film deposition technology. There are also efforts to develop TFEL devices using thick ceramic green layers and thin film electroluminescent layers, see T · Miyada et al., SID 91 Abstracts, etc., pages 70-73 and 286-286. This device is manufactured from BaTi03 ceramic sheet. This ceramic sheet is a fine BaTi03 powder molded by conventional cold pressing method Foam into a disc (diameter 20 cm) to form. This disc is sintered in air at 1300 ° C, then polished and polished into a ceramic sheet with a thickness of about 0.2 cm. The emission layer is deposited by chemical vapor deposition or RF magnetron sputtering It is deposited as a thin film on this ceramic sheet. Then, a thin film technique is used to deposit the appropriate electrode layer on either side of the structure. Although this device exhibits certain desired characteristics, it is not possible to use a TFEL device from a solid ceramic sheet manufacturer. OK. Polished and polished larger ceramic sheets become a uniform 0.2 cm thickness economically impractical. It is also well known in this technology to use multiple insulation / dielectric layers on each side of the phosphor layer. For example, U.S. Patent No. 4,897,313 to Sun published TFEL with an EL phosphor layer sandwiched between a pair of insulating superimposed layers, in which one or both of the insulating S plus sheets includes a first layer of nitrogenization Silicon (SiON) and a second layer of giant acid M (BT0). The first layer of SiON layer provides high resistivity, while the second layer of BT0 has a higher dielectric constant. In summary, the illustrated structure is in practice A higher brightness phosphor layer is produced under voltage. However, the most green is deposited by radio frequency sputtering, which has the disadvantage of thin film technology. --------- ί --- 1 ------ ί ----- 装------ # ------ Complete (please read the urgent matters on the back before writing this page) This paper size is applicable to the Chinese National Standard (CNS) f 4 specifications (210 X 297 mm) 82 5. 20,000 V. Description of the invention (6) A6 B6 Printed by the employee consumer cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs. Lead. The second material is expected to be more transparent. It is not necessary to use 3P body materials for the regular layer. It is necessary to use the card to guide the low auroral quality. The light length of the j pole body can be used to teach the electricity. The wave thickness of the tel guide Come ^ ^ 0 ^ 0 ^ The high-level picture erosion is a magnetic M transparent half-length hard-to-done special M replenishment is better to go to @ 学. ^ [if when the W or the gap layer is trapped 92, then (i) for this reason, there is a good electrification material, 'don't, Η body can take this, 0ϊ ±. ^. Issue. The special middle edge of the material and the material can make the 921Γ type M light M compulsory brush body ίιΗ * ^ ^ ^ ^ Ε «,, 2whm printed in the hot-packing field" W title TFgE. Take the wave to receive The Hi pole U receives the light from the TF which is shining through the material. »^-明 $ 分 雷 用 Still need to be like the Jtt40 type. ^ Body electric material light ray 3« "transparent_charge (If you need gas as you do), the S1 energy rate issued by the Ming site is similar to that of the system, and it is located on the top of the τοί material. 1¾ If it is not necessary, it will be covered with a G-like electric layer. (I glass material light, good pole akf layer pass median value needs to be loaded with YA to draw a picture of Ming Xi glass should be not electric 31105 Ming _ layer peak there, the use of moving materials and engraving through the translucent show right. Because of erosion (Η7, through the high pressure of the high-pressure drive body, the gas circumstance will be collected by the chemical industry. The display is 66-1. It is charged and charged in the lead, and the light is relatively short. In addition, Gm's material with rEL operation and warp length is very long. It is connected to Handi in YA. TF is strong and transparent. The external wave product type is sulfonic. For the low quality in the wide-spreading red long Shen Dianji, it is very common to see that the electric energy is promulgated and the Shenmai is present. It can be received by open pull type --------- I ----------_----- install ------ ΪΤ ------ (Please read the precautions on the back before writing this page) This paper scale is applicable to the Chinese National Standard (CNS) A 4 specifications (210 X 297 public goods) 82. 5. 20,000 Printed by the Ministry of Economic Affairs Central Standards Bureau Staff Consumer Cooperative A6 _B6_ V. Description of the invention (7) The neodymium YAG laser works at 4-5 watts (W) at a scan rate of 3 6 ΚΗ Η z pulse at 20 cm / sec (cm / sec). The example of this patent is published like this Describe the ITO deposited on the glass. However, the inscribed lines do not completely remove the ITO at the appropriate position as described, and the glass is melted to a depth of hundreds of angstroms. The residual I Τ0 must be followed by an etching step Removal. Other methods of forming an electrode in a transparent electrode material involve the use of an ablative laser, which produces shorter wavelength light in the ultraviolet region of the electromagnetic spectrum. At this wavelength, the transparent electrode material can absorb this laser energy. It is recommended to form conductive patterns for liquid crystal display (for Imatou No. 4,980,366, for Yanazaki No. 4,927,493 U.S. Patent), photovoltaic battery (for Carlson et al. No. 4,783,421, and Yamazaki et al. No. 4,854,974), image sensor (for Sakama) Etc. US Patent No. 5, 0 4 3, 5 6 7), and collective circuits (Leung US Patent No. 5, 109, 149). The automatic display of A / S was announced in 1990: W0 No. 9 0/0 9 7 0 of August 23, 1990, which published a process to ablate the laser to depict the matrix pattern of the electrode points in the transparent conductor on the transparent substrate . Although ablation lasers produce short-wavelength light sufficient for the transparent electrodes to absorb, allowing the electrodes to be directly ablated for patterning, such lasers are quite expensive and the engraving process must be carefully controlled to prevent melting or ablation of the underlying display glass. Furthermore, this process will result in excessive or incomplete ablation of transparent electrode materials. For example, W 0 No. 9 0/0 9 7 0 shows that if the ablation material is partially removed, the remaining part can be chemically Or plasma etching to remove. -9-(Please read the precautions on the back before writing this page) The paper size is applicable to the Chinese National Standard (CNS) f 4 specifications (210 X Li 7 g) 82. 5. 20,000 V. Description of the invention (8) A6 B6 The shot number is printed by the Industrial and Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs. j suction transfer column is said to be added to the line pressure of the property in the title layer of laser 95 W. There is a polar plate on the applied electric plate. The high 89 anti-teaching selection of the electrical appliance's Breeze selection wave display shows that he does not need to select the layer's 09 'selection. This display is used to select the pulse display at a pulse pressure to the phase display. Until the piezoelectric is positive. Add the "barrier 4" shot * ίι to the used piezoelectric zero. The top shot is applied to ensure the thunder erosion at the Ψ0 scattered point. This pressure is to make the electric current be the same as the photoelectric generation when it is transmitted. As shown in Table 0), the reduction is expected. . A day of commendation, a wave of light. The an and 9th phases mentioned in the board are shown in the Luke U Display Intergeneration Photovoltaic Generation Pulse! »Disposal of UC 40 is coming out in the negative phase of the electric applicator EL, new. Pulse display material and surface material are made by gas 68, and the combination and addition are not limited. It will be new to the end. 9 Diode Concentration Surface 56 layers of control materials will be placed in the room. Card table 4 'Ming's capital drive operation time and so on. This is G except Shi Ming 7, the serial technique in the Mingku membrane translucent device is described here. Show and act on Esau, and wait for the follow-up, the pulse is 4 'dyed and guided, and the gold η) erosion is the row of the drive plate, that is, the crossover is engraved. Each ^^ One of the site ’s planners and computer drivers once told ap to use the right fund. Xing Xing, the position of the outer body is Qijiao. Jiao (C Institute. The local pressure of the drive-like image creation and the medium wave is based on the active group Jishan and the special collection of the light layer. The new method is called the pulse of the pulse. Kai Lian. The other party's selection and exchange of names are known to expand their knowledge. Guo Kai expects that the serial drives will not be used and that they have been sold. The listed --------- Γ ---.------ ί ----- installed ------ * may ------ zun (please read the back first (Notes to be written on this page) This paper scale is applicable to the Chinese National Standards (CNS) f 4 specifications (210 X 297 mm) H2. 5. 20,000 320815 Ministry of Economic Affairs Central Standards Bureau S industrial and consumer cooperation du printing A6 B6 five 3. Description of the invention (9) In the work, the pulse train is scanned with alternating polarities on the even and odd picture frames. This alternating polarity produces a net zero charge on all display pixels. Crystal H) can be used for both asymmetric and symmetric drive technologies. Alternating drive circuits and components for EL displays that are known for use or under development, for example, see the bidirectional push of TFEL displays such as K jiji Pull-symmetric drive Law, Youth Youth Physics Daily 1989 Volume 38, page 324; and the latest developments and trends of thin-film electroluminescent display drivers such as S. Sutton (Sutton), Youth Youth Society Daily 1989 Volume 38, page 318; Bolger The second generation of chipsets for driving EL panels, SID page 229 in 1985. The upper drive design is called a multiplexed (passive) matrix address design. In theory, other types of drive designs, such as: Active matrix address design, can be used with EL display. However, this is not yet developed. This alternating drive design should be considered to be within the meaning of the voltage drive circuit for this application. In conventional EL displays, connect One method of row and column address lines to the driver circuit is to compress a polymer strip including a number of closely spaced metal sheets between the contact column connected to the display address line and the driver component connected to the driver circuit, which is fabricated on a separate circuit board (Please see Essinger's US Patent No. 4,5 0 8,9 9 0) ^ Polymeric lath is a layered elastic material element (LEE), the well-known trade names are STAX and Zebra (ZEBRA). LEE is caused by It consists of alternating layers of conductive and non-conductive elastic materials. Polymer slats -------- τ ---; ----- 1 ----- installed ------ · 玎- ---- ^ (Please read the precautions on the back before writing this page) The paper size is applicable to China National Standard (CNS) Grade 4 (210 X 47mm) 82. 5. 20,000 Central Ministry of Economic Standards Bureau 3 Industry and Consumer Cooperatives printed 52 A6 B6 V. Description of the invention (10) Avoid the need to use welding or welding wires to connect hundreds of wires to the contacts. However, interconnection and wiring technology is unreliable and does not function well at high temperatures, which can cause creep of polymer materials. Another method is commonly used in liquid crystal displays (LCDS) to connect row and column address lines to drive circuits and is considered to be electroluminescent displays, that is, wafer-on-glass (C0G) technology. The driver assembly (chip) to which the address line is connected is assembled around the periphery of the display. In the case of LCDs, the address lines evaporated on the back of the display glass extend from the effective area of the display, so that they end up being arranged as patterned pads so that the crystals can be wired here. The wire bonding is responsible for assembling the wafer on the display glass, and then individually welding the fine gold wire to the output pad on the wafer and the corresponding contact pad on the address line. The advantage of COG technology is that the number of contacts between the display glass and the driving circuit is almost eliminated, because the largest number of contacts is currently between the driving crystal H and the address line. In the driving chip and other driving circuits Typically, there are only about 20 to 30 wires, while the other drive circuits are connected to more than 200 wires. The main disadvantage of COG technology is the difficulties experienced by wire-lapped driver wafers to connect the thin film pads on the waiting line, resulting in poor manufacturing capacity. Another disadvantage is the need to have space around the periphery of the display to assemble the driver chip, thus increasing the body looseness of the display and eliminating any possibility of combining some display modules into an array to form a larger display / for direct circuit wiring Through-hole technology is widely known in semiconductor technology (please see, for example, No. 1-2 for Nakamura)-This paper scale is applicable to China National Standard (CNS) Grade 4 (2 丨 0 X 297 5. 20,000 -------- T --- > ----- 1 ----- install ------. 玎 ------ # (Please read the notes on the back first (This page will be written again) A6 B6 printed by the S Industry and Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs. V. Invention Instructions (11) 3, 6 4 1, 3 9 [) US Patent). Patent No. 4, 7 11) and No. 3 9 5 to Yang (Yuang) et al. Describe a method and apparatus for preparing a through-hole substrate with a stable vacuum. However, to the inventor's wisdom, through-hole printing has not been successfully applied to EL displays. U.S. Patent No. 3,504,214 to Lake et al. Describes an H-segment storage type EL device in which pixels are turned on by light to turn the phosphor layer @light guide layer into electrical conduction. Explain complex via conductors. This patent points out that the general through-hole wiring is not suitable for high-resolution TFEL displays, because the conductive material may work with phosphorus, so the performance of the display is reduced. The invention has various dielectric constants for each layer of electroluminescent tablets. The potential difference across the lamination layer is proportionally divided across the layers according to the thickness of each layer, and is inversely proportional to the relative dielectric constant of the material. For example, if one layer has twice the thickness and dielectric constant of another layer, the voltage is equally divided between the two layers. The present invention uses this characteristic to combine a thick dielectric layer with a high dielectric constant and a thin phosphor layer with a substantially lower dielectric constant. As such, before the conduction is initiated by the phosphor layer, the voltage across the pixel can be sufficiently connected across the phosphor layer, as long as the dielectric layer has a sufficiently high dielectric constant. The present invention provides an EL «sheet with a novel and improved dielectric layer and a method for manufacturing this sheet. The beta dielectric layer is formed from a ceramic material into a thick layer to provide:-a dielectric strength greater than about 1.0 Χ10〇6 volts per meter (V / m); a dielectric constant such that the ratio of the dielectric constant (k2) of the dielectric material to the phosphor layer (ki) is greater than about 5 Ο ·· 1 (preferably greater than 1 (3 0: 1); -1 3-this paper The scale is applicable to the Chinese National Standard (CNS) f 4 specifications (210 X 297 public goods) 82. 5, 20,000 ---------; --- j ------ f ------ Installed ------ ordered ----- specially (please read the precautions on the back before writing this page) A6 B6 5. Description of the invention (12) (please read the precautions on the back before writing the book) Page) a thickness so that the ratio of the thickness of the dielectric layer (d 2) to the phosphor layer (di) in the range of about 20: 1 to 5 0 0: 1 (preferably 4 0: 1 to 3 0 0: 1); And a surface adjacent to the phosphor layer is compatible with the phosphor layer and is sufficiently smooth to make the phosphor layer emit light approximately uniformly under the specified excitation voltage. The thin plate including the dielectric layer of the present invention is preferably a phosphor layer in which the thin layer is thin A typical thin film phosphor layer is formed with Z n S: Mn having a thickness of about 0.2 to 2.0 Meters, typically about 0.5 ton. Z n S: Μ η material has a dielectric constant of about 5 to 1 ϋ. According to the theoretical calculation of the best phosphorus layer (please see the guide published above), the The dielectric layer has a dielectric constant greater than about 500, and optimally greater than about 1QQ0, and the thickness is in the range of about 1Q-3Q0 microns, and preferably between 2Q-15Q Chemi. To achieve a high dielectric constant, It is preferably a ferroelectric material, and most preferably these materials have a perovskite (Perovskite) crystal structure. Exemplary materials include: P b N b 0 3 (lead niobium trioxide), BaTiO a, SrTiO 3 and P b T i 0 3 〇 The Ministry of Economy Central Standards Bureau employee consumer cooperatives printed the dielectric layer of the present invention is formed from the back to the front of the production of tablets. In this way, the back electrode is deposited on the substrate, such as ceramics such as vaporized aluminum, It can withstand higher temperatures than glass during manufacturing (used in front-to-back TFEL construction to provide front transparency). Then, the thick film technology is used to deposit the dielectric layer of the present invention on the back electrode. Then on the substrate and back electrode Thick film technology and high temperature sintering The use is important for the overall properties of the dielectric layer, because a dense layer with a high degree of crystallinity is used to improve the overall dielectric constant and dielectric strength of this layer. Practically, the inventor found that the available ceramic materials are difficult to produce. -1 4-82. 5. The size of 20,000 clothing sheets is in accordance with Chinese National Standard (CNS) f 4 specifications (2 丨 0 X 297 mm) A6 B6 printed by Beigong Consumer Cooperative of Central Bureau of Standards, Ministry of Economic Affairs ) The desired dielectric surface adjacent to the phosphor layer (well, compatible and smooth). As such, in the detailed embodiment of the present invention, the dielectric layer is formed into two layers, the first dielectric layer formed on the rear electrode has a better high dielectric strength and dielectric constant value as described above, and the second dielectric layer is as above The surface providing the adjacent phosphor layer. In a detailed embodiment of the present invention, the first dielectric layer is deposited by thick film technology (preferably screen printing) and then sintered at a high temperature (preferably, less than all lower layers) Melting point, typically less than 1000 ° C) ^ Pactco containing ferroelectric ceramics has a perovskite crystalline structure and is a preferred material as described above. Providing a paste formulation allows sintering at high sintering temperatures. The second dielectric layer is preferably deposited by the lyogel technique and then sintered at high temperature to provide a smooth surface. The material used for the second layer preferably provides a high dielectric constant (preferably greater than 20, more preferably greater than 1GQ) and a thickness greater than 2 microns (preferably 2-1Q microns) ^ Ferroelectric ceramics have perovskite The best crystal structure. The present invention has demonstrated that a first dielectric layer with a thickness of 3 Q Chemi is formed by screen printing from lead niobate, and a second dielectric layer with a thickness of 2-3 Chemi is spin-deposited from lead acid titanate sol. It has also been demonstrated that the lyogel layer is formed with immersion liquid to form layers with a total thickness of 6-10 cm. Lead strontium titanate is also demonstrated as a lyogel layer. The use of 2-layer media, although not a basic requirement, has its advantages. Although the first dielectric layer is formed as a thick layer having the required high dielectric strength and high dielectric constant, the second layer is not so limited. As long as the second layer has the desired compatible and smooth surface, it can be used differently from the first layer-15-this paper scale is applicable to the Chinese National Standard (CNS) A 4 specifications (210 X 297 ) 82. 5. 20,000 --------- ^ ---------- ^ ----- installed ------ ordered ------ for (please first Read the precautions on the back and write this page) A6 B6 Printed by Beigong Consumer Cooperative of Central Bureau of Standards of the Ministry of Economy 5. The material of the invention description (14) is formed into a thin layer. Many studies have been carried out on changing the dielectric properties of the EL interface to the phosphor interface, for example to improve chemical stability or injection properties. Including these improved materials or deposition techniques can be used in conjunction with the first and / or second dielectric layer of the present invention, for example, to change the surface of the second layer, or to use a third material applied on the first or second layer Further to the thin film layer, the material or deposition technique used for the first or second layer is selected. The pancakes made according to the present invention are demonstrated to exhibit good luminescence without collapse of low operating voltage. Compared to the thin film technology described above, the preferred thick film and lyogel deposition techniques for the dielectric layer are generally simple and inexpensive. Another advantage of the dielectric layer of the present invention is that the combination of the dielectric layer does not require a further dielectric layer between the disc layer and the second electrode, although such a further dielectric layer may be included if desired. As such, in a broad perspective, the present invention provides a dielectric layer including a phosphor layer sandwiched between the front and back electrodes in the form of electroluminescent tablets, after which the electrode is formed on the substrate and the phosphor layer is separated from the rear electrode by the dielectric layer The dielectric layer includes a planar layer formed from a ceramic material that provides a dielectric strength greater than about 1.0 x 10s V / m and a dielectric constant such that the ratio of 1 ^ 2 / ki is greater than about 50 ·· 1. This dielectric layer has a thickness such that d 2: The ratio of d 1 is approximately in the range of 20: 1 to 500: 1, and this dielectric layer has a surface compatible with the phosphor layer and is sufficiently smooth to make the phosphor layer emit light approximately uniformly under the specified excitation voltage. The present invention also broadly extends to a method of forming an electroluminescent lamination in which a dielectric layer includes a phosphor layer sandwiched between the front and back electrodes, the back electrode is formed --------- I ---; ------ L ----- 装 ------. 玎 ------ Code (please read the precautions on the back before writing this page) The size of clothing paper is in accordance with Chinese national standards ( CNS) A4 specifications (210 X 297 mm) 82. 5. 20,000 ^^ 0815 ^^ 0815 Ministry of Economic Affairs Central Standards Bureau Staff Consumer Cooperative Inno A6 B6 V. Description of invention (15) On the substrate, the phosphor layer is The dielectric layer is separated from the rear pole. This method includes: depositing on the rear electrode with thick film technology, followed by sintering, a ceramic material with a dielectric constant such that k 2 / ki is greater than about 5 Q: 1, and a dielectric material having a dielectric strength of greater than 1.0 〇X 1 〇6 V / m and thickness such that the d 2 / d 1 ratio is in the range of about 20: 1 to 5G0: 1 dielectric layer, this dielectric layer forms a surface adjacent to the phosphor layer, which is compatible with the phosphor layer and sufficiently smooth so that The phosphor layer emits light substantially uniformly under a prescribed excitation voltage. The invention also widely provides a process for laser depicting patterns on a planar lamination with at least one upper cover layer (upper cover layer) and at least one lower layer (underlay layer), including: externally applied focused laser The beam is on the side of the cover layer on the chip. The laser beam has a wavelength that is not substantially absorbed by the upper cover layer, but is absorbed by the lower layer, so that the entire thickness range is directly ablated at least a part of the lower layer The cover layer is indirectly ablated. ELSH In this article, the upper cover layer is a transparent conductive material, and the phosphor layer, the lower layer is one or more dielectric layers, and the pattern is an electrode pattern with parallel spaced address lines. In the entire specification and patent application, it is applicable The following definitions: —Fun collection occurs when the quantum of the irradiated energy is consistent with the transition to a higher energy state in the material, for example, to promote electrons through the energy band gap for the material》-Indirect ablation of the material with laser beam The main cause of ablation is decomposition and / or because the material absorbs the energy of the laser beam. -Indirect ablation of materials with a laser beam occurs mainly due to ablation of the heat generated by an adjacent material to absorb the energy of the laser beam irradiation -1 7-This paper scale is applicable to China National Standard (CNS) A4 specifications (210 X 297 mm) 82. 5. 20,000 -------- 一 ---- Γ ------ ί ----- install ------ '玎 --- --- Μ (please read the precautions on the back before writing this page) A6 B6 printed by the Ministry of Economic Affairs Central Standard 4 Employee Consumer Cooperative V. Invention Instructions (16) and evaporated. The invention also extends to an electroluminescent display panel that uses through-hole conductors to provide electrical wiring from planar electroluminescent grids to the output of one or more solid voltage drive components of the drive circuit. The display panel includes:-an electroluminescent lamination, formed on the rear substrate, and having front and rear sets of intersecting address lines, such as is well known in the art; a large number of through holes are formed adjacent to the address lines In the base of the terminal; and-a device forming a conductive path, through each hole on the base to each end of the address line, to provide electrical wiring of each address line to the voltage drive component of the drive circuit. Preferably, the electroluminescent film of the display panel includes the thick film dielectric layer of the present invention. This dielectric layer enables the lamination to be produced from the rear substrate and looking forward. It also enables the through-hole connector and the thick film circuit pattern to be connected to the voltage formed by the interleaved circuit manufacturing step of the electroluminescent stacking step Drive components and address lines. Such a step cannot be easily achieved in the fabrication of conventional electroluminescent laminations, because this layer is deposited on the front display glass that does not withstand temperature and burns a thick film of conductive paste. According to the present invention, the voltage driving assembly or the entire driving circuit can be formed on the rear (reverse side) of the rear substrate. The use of through-hole connectors provides more direct and highly reliable interconnection wiring between address lines and drive circuits. Since there is no need for an invalid periphery around the display panel required in conventional technology. This facilitates the assembly of large displays from individual display panels without dark borders between the modules. -18 ™ clothing paper scale is applicable to China National Standard (CNS) A4 specifications (2) 0 X 21) 7 mm) 82. 5. 20,000 --------- Γ ---'---- --f ----- installed ------ ordered ------ for (please read the precautions on the back and then write this page) 32〇8jf5 A6 B6 Clear instructions, five-sided cross-section The structure of the suggested structure Η '«is shown in Figure 1. The figure below shows the structure of the stack. The stack 1 is the figure 2. Routine implementation of the stacking of electricity and detailed description of the details of the pole group electric-Ί drive the pressure along the electricity is a three-way voltage electric circuit electric drive ηρ «to the line to connect the gas and electricity is located at the site ; It is the type diagram with the figure 4 cut off and protruding; the detailed back base of the detailed base of the road map TV dynamic subduction; the back base of the back base of the detailed base body is printed in Group 5; The figure drives the line-up and line-up pads and the polar row above the front 1 afln base and then printed on 0 S3 is 6 pictures (please read the precautions on the back before writing this page) Super figure road The electric drive 50 is in production, and the printed view is better than the type 7 picture.

And type map road electricity., Moving picture-driven up-and-down type., 7 figure picture and glass view 5 glass upside-down seal in a densely-made map-printed line map. Optimized electricity is more strongly a pad It is 8 lined 9 figure road map S 9-^.

A Printed by the Central Bureau of Standards of the Ministry of Economic Affairs, I® Industrial and Consumer Cooperatives, which clearly states that 0 is the promise of the map. I 1 Ο The map is a map between the Fentu and the line-to-line electrical and electronic printing houses. ΙΊ / 1 1 The electric back mass C is stratified into a layered structure 2 and the original I 2 is inserted with a root synth and it is said to be 10. The paper size is applicable to the Chinese National Standard (CNS) f 4 specifications (210 X 297 mm) 82. 5. 20,000

Central Bureau of Standards® of the Ministry of Economy®: K A6 B6 printed by the Industrial and Consumer Cooperative Society V. Description of Invention (18) The pole layer 14 is formed on the base 12. As shown in the figure, for display applications, the rear electrode H is composed of a row of conductive address lines concentrated on the base 12 and spaced green from the base. The electrical contact joint 16 protrudes from the electrode 14. The first thick dielectric layer 18 is formed on the back electrode 14 followed by the second thinner dielectric layer 20. The phosphor layer 22 is formed on the second dielectric layer 20, followed by the front and transparent electrodes 24. The front electrode layer 24 is shown compact in the figure, but is actually used for display applications, and it consists of a row of address lines arranged perpendicular to the address lines of the rear electrode 14. The sheet 10 is enclosed with a transparent sealing layer 26 to prevent the penetration of moisture. The electrical contact 28 is attached to the second electrode 24. EL stack 10 works by connecting AC power to electrode contacts 16 and 28. The ELSH according to the invention has applications as lamps or displays, although it is most often found in displays. It will be appreciated by those skilled in the art that further intervening layers can be included in the laminate 10 without departing from the invention. The method of making a dual dielectric layer in a £ 1 laminate according to the present invention will now be described with detailed materials and process steps. The laminated sheet 10 is produced from back to front (view) side. The lamination 10 is formed on a suitable substrate 12. The substrate 12 is preferably ceramic, which is resistant to the high sintering temperature (typically lootrc) used for the dielectric layer. Vaporized aluminum is optimal. The first rear electrode 14 is deposited on the substrate 12. Many techniques and materials are well known for designing thin columns of address lines. Preferably, use an emulsifier that can be washed away in the area where the lake is to be printed, from silver / platinum paste to-20-the paper size is applicable to China National Standard (CNS) A 4 specifications (210 X 297 %) 82. 5. 20,000 ^; ------ ^ ----- installed ------, 11 ------ ^ (Please read the precautions on the back before writing this page ) The Central Bureau of Standards of the Ministry of Economic Affairs, Industrial and Consumer Cooperation, Du Printing A6 B6 V. Description of the Invention (19) Screen printing of conductive metal address lines. Afterwards, the paste is dried and fired. Alternatively, the back electrode 14 may be formed from other expensive metals such as gold, or other metals such as cadmium, tungsten, molybdenum, giant or alloys of gold and other gold. The first dielectric layer 18 is deposited on the rear electrode by a known thick film technique. The first dielectric layer 18 is preferably formed from a ferroelectric material, preferably one having a perovskite crystal structure, and provides a high dielectric constant compared to the phosphor layer 22. This material will have a minimum dielectric constant of 500 at a reasonable operating temperature range of 20-100 ° C. More preferably, the dielectric constant of the first dielectric layer is 1000 or more. Exemplary materials for the first dielectric layer 18 include PbNbO 3 s BaTiO 3, S rT i 0 3, PbTiO 3. PbNbO 3 is particularly good. Those skilled in the art will understand that a ceramic material selected for the first dielectric layer 18 (ie, an insulating material having a melting point sufficiently high to allow preparation of other layers of the wafer) is known to have a high dielectric Constant and medium strength. These are the essential properties of this material, however, the value is generally in granular materials, which appear in a dense, highly crystalline form. The deposition technique used can change these properties. "About the dielectric constant of the material. After the thick film deposition technique, as the sintering at high temperature, the size of large particles (in the range of about 1 to 2 Chemi) will be preserved, and High crystallinity in the dense structure so that the dielectric constant is not significantly reduced from the starting material. Similarly, high dielectric strength is achieved by thick film deposition followed by high temperature sintering. However, the dielectric strength of this layer must be finally measured across the complete lamination with an applied working voltage. -21- This paper scale is applicable to China National Standard (CNS) Grade 4 (2 丨 0 X 47mm) 82. 5. 20,000 -------- T ---.----- 1 ----- Installed ------ * 玎 ------ ^ (Please read the precautions on the back before writing this page) A6 B6 printed by S Industry and Consumer Cooperative, Central Bureau of Standards, Ministry of Economic Affairs 2. Description of the invention (2) The thick film deposition technology is published as mentioned above and is a well-known technology. In this technique, a dielectric material is deposited on the back electrode layer 14 to a desired thickness with substantially uniform coverage. Thick film deposition techniques are often used in the manufacture of electronic circuits on ceramic substrates. Screen printing is the best technique. Commercially available media can be used with the recommended sintering steps described by the paste manufacturer. The paste must be selected or formulated to allow high temperature, typically 1000 ° C, and sintered. However, other technologies can achieve the same result. An alternative thick film technique is to use a dielectric into a "green band (G!> E e η T a p e)" so that it can be designed on the back electrode 14. The green belt contains the dielectric powder in the polymer matrix, which can be burned off during the subsequent sintering process. This belt is flexible before sintering and can be rolled or compacted on the electrode layer 14. One of the possible advantages of this green tape on screen-printed media is that when it burns, it may have fewer holes and be slightly denser. At present, green tape media does not have widely available "thick film pastes The roller can be coated on the back electrode layer 14 or applied with a doctor blade. More complicated techniques, such as the electrostatic deposition of dielectric powder, then sinter immediately before the powder loses its charge. As indicated, the first dielectric layer 18 is preferably screen printed from paste. It is preferable to deposit into multiple layers and then sinter at high temperature to achieve low porosity, high crystallinity, and minimum cracking. The sintering temperature depends on the materials to be used, but does not exceed the temperature β 1 0 0 (the temperature of KC is typical for most electrode materials. The temperature of the first dielectric layer 18 is The thickness will vary with its dielectric constant and the dielectric constant and thickness of the phosphor layer 2 2 and the second dielectric layer 20. Usually, the thickness of the first dielectric layer 18 is between 10 and 10: i 0 0 through -11- the paper size Applicable to China National Standards (CNS) Flat! Specifications (2 丨 0 X 297 male seam) 82. 5. 20,000 -------- ^ --------- ^ ----- ------ Subscribe ------ ^ '-7 (Please read the precautions on the back before writing this page) A6 B6 printed by the 8th Industry and Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs 5. Description of invention (21 ) Within the range of meters, preferably 2 0-1 5 0 Chemi, and most preferably 3 0-1 0 Chemi. Generally, it can be understood that the criteria for establishing the dielectric thickness and dielectric constant of the dielectric layer are calculated in order to Provide the appropriate dielectric strength at the minimum operating voltage. This criterion and the following are related to the "typically known phosphorous layer thickness (di) range between ϋ. 2 and 2.0 cm, approximately between 5 and 10. The dielectric constant ki range of interphosphorus layer is About 10 6 to 1 0 7 V / οι dielectric layer dielectric strength range, the following cut-offs and calculations can be used to determine the typical thickness (d2) and dielectric constant (k2) values of the dielectric layer of the present invention. Such calculations and calculations It can be used as a guide to determine the values of d 2 and k 2 without departing from the scope of the present invention, if the typical range published above is sufficiently changed. It is connected across the uniform dielectric layer and uniform non-uniformity between the two conductive electrodes. The applied voltage V of the two layers of the conductive phosphor layer is generated by Equation 1: V = E 2 * d 2 + E 1 * d 1 (1) where: E2 is the electric field strength in the dielectric layer;

Ei is the electric field strength in the phosphor layer; (12 is the thickness of the dielectric layer; and d 1 is the thickness of the phosphor layer. In these calculations, the direction of the electric field strength is the interface between the vertical phosphor layer and the dielectric layer. Equation 1 applies the applied voltage In the phosphor layer, the electric field strength is sufficiently high so that the phosphor layer begins to collapse electrically and the device starts to emit light below the threshold voltage, M holds authenticity. By electromagnetic theory, perpendicular to two insulating materials with different dielectric constants 2 3- This paper scale is applicable to the Chinese National Standard (CNS> T 4 Clam (210 X 297 mm) 82. 5. 20,000 -------- 1 ---- Γ ---------- Installed ------------- f (please read the precautions on the back before writing this page) 3208J5 A6B6 Printed by the Central Bureau of Standards of the Ministry of Economics 3 Industrial and Consumer Cooperatives V. Invention Instructions (22) The electrical displacement component D between them intersects the interface successively. The electrical displacement component in the material is defined as the product of the dielectric constant and the electric field component in the same direction. From this relationship, the equation of the interface in the two-layer structure is obtained 2: ^ E 2 = ki * Ei (2) where: k 2 is the dielectric constant of the dielectric material, and k is the dielectric of the phosphor material Number ^ Equations 1 and 2 can be combined to produce Equation 3: V = (ka * d2 / k2 + di) * Εχ (¾ To reduce the threshold voltage, the first term in Equation 3 must be as small as practical. The second term is Choose the thickness of phosphorus to make the phosphorus output the largest demand to be fixed. For this calculation, the first item is taken as 1/10 of the size of the second item. Substituting this condition into Equation 3 yields Equation 4: d2 / k2 = Ol ^ di / ki (4) According to the nature of phosphorus, Equation 4 establishes the ratio of the thickness of the dielectric layer to its dielectric constant. This thickness determines that when the phosphorus layer becomes conductive above the threshold voltage, the dielectric strength of this layer is sufficient to maintain the entire The requirement of applied voltage. This thickness is calculated using Equation 5: d 2 = V / S ⑸ where: S is the strength of the dielectric material. Using the above equation and the reasonable values of (1 1, k 1 and S provide 2 4--------- ^ ---- ^ ------ J .----- installed ------ 1T ------ J (please read the back first (Notes on this page will be written on this page) This paper again uses the Chinese National Standard (CNS) A 4 specifications (210 X 297 mm) 82. 5. 20,000 Ministry of Economic Affairs t Central Standards Bureau employee consumption cooperation Du Yin ¾ A6 B6 V. Description of invention ( 23) The range of the thickness and dielectric constant of the dielectric layer within the scope of this specification and patent application. As mentioned above, the second dielectric layer 20 is not required, if the surface of the first dielectric layer 22 provided adjacent to the phosphor layer is sufficiently smooth (That is, the subsequently deposited phosphorous layer emits light substantially uniformly under a prescribed excitation voltage), and is compatible with the phosphorous layer 22. In general, the fluctuation of the surface fluctuations in the range of about 1G00 micrometers about 0.5 cm (which is approximately equal to the width of one pixel) is sufficient. The surface relief in the range of Q.1-Q.2 microns is better. If the first layer 18 provides a sufficiently smooth surface, but does not provide the desired compatibility with the phosphor layer 22, for example, a further material layer (preferably, but without the need for a dielectric material) using thin film technology can be added Provide compatibility. If the second dielectric layer 20 is required, it is formed on the first dielectric layer 18. The second layer 2G may have a lower dielectric constant than the first dielectric layer 18, and is typically formed as a very thin layer (preferably larger than 2 microns, and more preferably 2-10 microns). The expected thickness of the second dielectric layer is generally a function of smoothness, that is, this layer can be as thin as possible, as long as a smooth surface is achieved. To provide a smooth surface, it is preferable to use lyogel deposition technique followed by high temperature sintering. The technique of dissolving gel is well known in this technology. For example, please see R.W. Jonnes (J ο nes), "The Basic Principles of Dissolving Gel" in 1989. The glue process enables the material to be mixed in the sol in a molecular order before displaying the solution, one of which is a colloidal gel or a polymeric macromolecular network, while maintaining the solvent. This solvent, when removed, leaves high-order pores Solid, therefore, increase the surface free energy value so that -2 5--------- ^ ---- ^ ------ 1 ----- install -------- ir ------ ^ (Please read the precautions on the back before writing this page) The paper size is applicable to China National Standard (CNS) A 4 specifications (210 X 297 mm) 82. 5. 20,000 Central Ministry of Economic Affairs Bureau of Standards, Beigong Consumer Cooperation Du Yin ¾ A6 B6 V. Description of the invention (24) It is obtained that this solid can be sintered and densified at a relatively low temperature that can be obtained by using most other technologies. It can be deposited on the first dielectric layer 18 to a smooth surface. In addition to providing a smooth surface, this lysing process easily fills the pores in the sintered thick film layer. Spin deposition or liquid immersion is optimal. These are techniques used in the semiconductor industry for many years, mainly in the photolithography process. For spin deposition, sol droplets are deposited on the first medium layer 18 rotating at high speed, Typically several thousand RPM (revolutions per minute) β. If necessary, the sol can be deposited in several stages. The thickness of layer 20 can be adjusted by varying the viscosity of the coagulation and the automatic speed to control β rotation. A thin layer of wet solution gel is formed On the surface, the lyogel is generally sintered at less than 1000 ° C to form a ceramic surface. The sol can also be deposited by liquid immersion. The surface to be coated is immersed in the sol and then drawn out at a constant speed, usually very slowly. The thickness of this layer is controlled by varying the viscosity and extraction speed of the sol. The sol can also be screen printed or spray coated, although it is more difficult to control the thickness of the layer using these techniques. The material used for the second dielectric layer 20 is It is preferably a ferroelectric ceramic material, preferably with a perovskite crystalline structure, providing a high dielectric constant. This dielectric constant is preferably similar to the first dielectric layer material in order to avoid voltage changes across the two dielectric layers 18, 2G However, when applied as a thinner layer in the second dielectric layer 2 (), a dielectric constant as low as about 2 ϋ can be used, but it will preferably be greater than 100. Exemplary materials include lead titanate silicate (Ρ ZO) , Lead lanthanum titanate (PLZT), and titanium of Sr, Pb and Ba are used in the first dielectric layer 18, PZT -2 6--------- Η ---.----- -f ----- installed ------, 玎 ------ (please read the notes on the back before filling in this page) This paper scale is applicable to the Chinese National Standard (CNS) A4 present grid ( 2 丨 Ο X '297 W 竑) 82. 5. 20,000 Printed by the Central Bureau of Standards of the Ministry of Economic Affairs, Industry and Consumer Cooperatives $ A6 B6 V. Description of invention (25) and PLZT are the best. PZT or PLZT is preferably deposited by spin deposition into a lyogel, which is subsequently sintered at less than about 600 ° C to form a smooth ceramic surface suitable for the deposition of sublayers. The sub-layer to be deposited is typically a phosphor layer, however, as described above, it is possible within the scope of the invention to include a further layer above the second dielectric layer 20 to further improve the interface with the phosphor layer. For example, a well-known film layer material that provides good injection properties and compatibility can be used. The deposition of the phosphor layer 22 is a well-known thin film deposition technique, such as: vacuum evaporation in an electron beam evaporator, sputtering method, and the like. The preferred phosphor material is Z n S: Mn, but other phosphors are known to emit light of different colors. Phosphorus layer 22 typically has a thickness of about 0.5 microns and a dielectric constant of between about 5 and 10. A further transparent dielectric layer above phosphorous 22 is not required, but can be included if necessary. The front electrode 34 is deposited directly on the phosphor layer 22 (or a further dielectric layer, if included). The front electrode is transparent and is preferably formed using well-known thin film technology, such as vacuum evaporation from an electron beam evaporator (UTO). The mandrel 10 is typically annealed and then sealed with a sealing layer 26, such as glass. From the back to the front according to the present invention, the better "sheets with typical thickness values are as follows: -2 7---------; ---- 7 ------ ί ----- Install ------. 玎 ------ Μ (Please read the precautions on the back before writing this page) This paper size is applicable to the Chinese National Standard (CNS) A 4 specifications (210 X 297 cm ¢) 82. 5. 20,000 320815 A6 Printed by Beigong Consumer Cooperation of the Central Standards Bureau of the Ministry of Economic Affairs _B6 V. Description of the invention (Μ) Substrate layer-vaporized aluminum rear electrode-A g / R t address line-10 micron 1 Dielectric layer-lead niobate-3 0 micrometers 2nd dielectric layer-lead chromate titanate-2 chemiphosphorus layer-ZnS: Mn-0.5 meter removal front electrode-ITO-0.1 chemisealing layer-glass-10- 20 microns In larger EL displays, the thickness of each layer can vary. For example, the thickness of the gel layer is typically increased to about 6-10 cm to provide the desired smoothness β. Similarly, the ITO layer thickness can be increased to 0.3 nm in larger displays. According to the present invention, the wiring of the front and back address lines of the electroluminescent stack to the voltage driving circuit is preferably formed by using through holes in the rear substrate. Preferably, the EL stack includes the thick dielectric layer of the present invention. Although not required. The voltage driving circuit includes a voltage driving component (typically a high-voltage driving chip) whose output is connected to the individual column and row address lines of the rear and front electrodes, so as to selectively activate pixels according to the image input multiple. Voltage drive circuits and components are generally well known in the art. To illustrate the present invention, through-hole wiring is provided on a known sealed high-voltage driver chip that is surface-bonded with known reflow soldering techniques. This type of high-voltage driver chip is famous for its conventional symmetrical pulse drive design and asymmetrical pulse drive design. However, those who are struggling with this technology will recognize that the drive circuit or drive components can be changed, and therefore will naturally be provided for wiring to the drive power (please read the precautions on the back before filling out this page) Order. This paper scale applies the Chinese National Standard (CNS) A4 specifications (2 丨 X X 297 mm) 82. 5. 20,000 printed by the Central Bureau of Standards of the Ministry of Economic Affairs, B, B and C cooperative printing A6 B6 V. Description of invention (27) Road Circuit pattern and through hole pattern. The present invention has applications regardless of whether the entire driving circuit or only part of it is to be assembled on the rear substrate. For example, instead of using a high-pressure sealed crystal H, it is possible to use a conventional mold H fixing method to use an unpackaged silicon wafer (crystal H) on the substrate, and it is possible to connect the driver circuit to the substrate using conventional wire bonding technology. In this case, the driving crystal H will occupy a small area on the substrate, and it will be possible to arrange all the driving circuits on the substrate. The result is an ultra-thin display panel that can interface directly to image signals and connect directly to dc power. Such displays will be used in ultra-thin portable products that require displays. Of course, the ability to assemble the driver circuit on the back of the substrate is an attempt at the overall size of the display. Larger displays provide more space for the driver circuit directly on the back of the substrate. A graphical illustration of the circuit wiring view of the present invention is illustrated in Figures 3-10. As indicated above, it is used to assemble the high-voltage driver wafer 30 to hold separate through holes and circuit patterns on the reverse surface of the rear substrate for illustration purposes. The chip to be selected is Superte X Η V 7 0 2 2 PJ chip connected to the column address line 1 4, and Supertex HV8308PJ and HV8408PJ (Supertex company is located in Sunnyvale, California, USA (S Li η nyva I e )) Used for wiring to row address 2 4. The difference between the latter two wafers is that one of the lead patterns is a reflection mirror image of the other lead pattern. Referring to the drawing, E L «sheet 10 is preferably, but not necessarily, produced with the two dielectric layers 18, 20 of the present invention, and is thus produced from the rear substrate 12 to the front view side. The rear substrate 12 has a through hole 32 in the pattern so that it will be close to the ends of the address lines 14 and 24 (which will be formed later). Alternatively, additional communication (please read the precautions on the back before writing this page) This paper size applies to the National Standards (CNS) f 4 specifications (210 X 297 mm) 82. 5. 20,000 Central Standards of the Ministry of Economic Affairs Bureau 8 Industrial and Consumer Cooperatives printed A6 B6 V. Description of the invention (28) Kong Neng provided a spaced relationship along the address line. This will be useful for providing wiring to the front η '〇 address line with high resistance. The graph in Figure 4 is to follow the column address line (rear electrode) 14 of the longer dimension and the row position along the shorter dimension. The address line (front electrode) 2 4 provides an EL panel connected to the rectangular base 12. The through hole 32 is preferably formed by laser. The through hole 32 is typically wider on one side due to the nature of the laser drilling process, and this side is selected as the back or reverse side to allow flowing conductive material to easily enter the through hole. The substrate 12 used for the EL laminate must be able to withstand the temperatures experienced in the subsequent processing steps. The substrate typically used is to provide sufficient rigidity to support the laminate and stabilize at or above 850 ° C to withstand subsequent pyrogenic sintering steps for thick film pastes and lyogel materials. The substrate will also be opaque to the laser light, allowing laser drilling to form the through holes 32. Finally, the substrate should provide good adhesion to the thick film paste used in the subsequent steps. Crystalline ceramic materials and opaque glass materials can be used. Vaporized aluminum is good. The circuit pattern 34 of conductive material is printed on the rear side of the base body 12 into the pattern shown in FIG. 5. In this step, the conductive material is drawn through the through-holes in a manner to be discussed. 2 2 ^ The substrate 1 2 has a circuit pattern on the rear side 3 4. The rear connector pad 36 around each through-hole 3 2 is driven by high voltage. Crystal H connector pads for chip (not shown) output 38, further connector pads (not labeled) for wiring to other circuits of the drive circuit (not shown), and many of the connector pads shown Electrical leads (not marked) etc. (please read the precautions on the back before writing this page) 丨 Installed-^ -30- This paper scale is applicable to China National Standard (CNS) A 4 specifications (210 X 297 ) 82. 5. 20,000 A6 B6 Printed by the Industrial and Commercial Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs 5. Description of the invention (29) The conductive material is preferably screen printed with a thick conductive paste applied. Silver / platinum thick film lakes are preferred. To form conductive paths through the through holes 32, when the circuit 34 is printed on the rear side, a vacuum is applied on the front side of the base 12. This is preferably achieved by placing the base body 12 between the base body 12 and the vacuum on a vacuum table having a main board drilled with holes of the pattern shown in FIG. The holes in the main board are aligned with or slightly larger than the holes in the base 12. No vacuum is applied until the circuit is printed to ensure that the vacuum is applied evenly. The vacuum is continuous until the conductive material is drawn through to the front of the substrate. At this point, a small amount of conductive material is drawn through to the front of the substrate 12, and the through-hole wall is coated, and then fired according to known procedures Thick film paste. According to this step, the circuit pad reinforcement pattern 42 is preferably, but not necessary, printed as shown in FIG. 7. The same conductive material, printing and burning steps are as follows. The column address lines 14 and the connector pads 4 Q a and 4 0 b are preferably formed by screen printing a thick film conductive paste such as silver / lead paste on the front side of the base 12. The address line pattern shown in FIG. 6 includes a row extending along the length of the base 12 and a terminal (row) terminal pad 40a. During this same step, the front (row) connector pad is printed to provide the row address line to the final wiring of the drive circuit through the via 32. The conductive paste is preferably as above, drawn through the through hole with a vacuum applied from the rear circuit side of the substrate. When the device for forming the conductive path through the perforation 32 has been formed from the thick film conductive paste as described above, the conductive path is also formed as a plated through hole, or becomes -3 1 --------- τ-- -5 ----- 1 ----- Dressing ------ 玎 ------ Μ (Please read the precautions on the back before writing this page) This paper size is applicable to Chinese national frame Standard (CNS) A 4 specifications (210 X 297 public goods) 82. 5. 20,000 A6 B6 Ministry of Economic Affairs Central Standards Bureau 3 industrial and consumer cooperatives printed goods V. Description of invention (3〇) Through holes formed by electrodeless plating, so It is well known in the art, as long as the plating layer is properly adhered to the substrate, and the subsequent layer is adhered to the conductor that has been plated. Then, the thick film dielectric layer 18 of the present invention is preferably formed and fired in the above-described manner. Then, the circuit side behind the substrate is preferably sealed with a sealant 44, for example, screen-printed with thick film glass paste, and the remaining is used to drive the wafer and connector pins 45 to other drive circuits (not shown) at high pressure Of the exposed connector pad. The seal pattern is shown in Figure 8. Then, the EL # sheet is completed with the lyogel layer 20, the phosphor layer 22, and the forward address line 2 4 as shown above. The sigmoid shape for the forward address line 24 shown in FIG. 9 is formed across the base 12 The width terminal is formed by parallel rows of front (row) connector pads 4G. The row address line 24 and the front (row) connector pad 40 are electrically interconnected. Line 46, if required, is provided for reliable electrical wiring. These are preferably formed by printing a conductive material such as silver via the screen in the pattern shown in FIG. The front sealing layer 26 as described above is provided to prevent the penetration of moisture. According to the present invention, the pre-IT 0 address line 24 of EL # slice 10 is preferably formed by laser characterization. The technical description of the laser engraving of the preferred EL stack 10 of the present invention is as follows. However, please understand that laser portrayal technology has a wide range of applications in graphics with flat overlays on top and bottom layers. In this regard, IT 0 and the phosphor layer 2 4, 2 2 are shown as not absorbing laser light to any -3 2---------- Μ --- · ------ ^- --- installed --- ordered --- for (please read the precautions on the back before writing this page) This paper size is applicable to China National Standard (CNS) A 4 specifications (210 X 297 Goods) 82. 5. 20,000 V. Description of the invention (31) A6 B6 Acid C junction layer and surface 18 lower layer in the medium of light quality 2 lead shot 02 acid Lei S niobium included film absorption thick and material, shown The layer is made of lead on the coating body of the cover 2 of the cover. The lead is made of lead acid and titanium, and the photolithography is transparent. , See. The connection of C and the length of the bulk material can be extended to the depth of the material layer. The depth of the inner layer is half-displayed. The phase layer of the bright layer is covered by the EL cut cover. In the, ί layer. Hold the light red, use the solution to reduce the amount of care, see or immediately respond to the electric injection, need to be able to burn the pan-yang, and the required text is too wide in the field of view. The wide-area frequency energy method of the spectrum straight tool shows the engraved explosion layer of the magnetic material side under the lower Ming Ming, which is engraved on the surface of the electric material and the surface layer of the liquid thunder layer. The radio-layer material is used in the thunder layer to avoid the use of two or one materials. Guide,

0 Τ 0 α > U (please read the precautions on the back before filling in this page). — Pack -11. Among them, the number of 傜 傜 s collected and sucked the layer cover under the cover II II U 0 α α ^ Printing System of Employees ’Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs — The U6 ′ cladding layer UT with a thick Μ cover is overlaid with Alpha, the number is higher in Shangdi II II. The number of accumulated layers is less than 0. The accumulated number To is more than 0 or α / in the case of ten minutes and the sum of the layers. The time product of ο τ ο the layer 1 of α is the product of TU U α and the layer 1 of each is That is, the paper scale is applicable to the Chinese National Standard (CNS) A4 specifications (210 X 297 mm) 82. 5. 20,000 V. Description of the invention (32) α Σ A6 B6 T can be passed through 1 ° C. 0 α According to the root case 1 i, U Chiwei · J Σ is related to the fact that the thickness is as thick as the whole. Excessive wear, thick and burned, and the overcoat layer covered on the cover of the layer is burned in the ground and then burned in the ground, and the ground is only or ground, the heat is like this. The steam is steamed or fried \ burst and The chemist guide will be burnt, and the layer below the surface can cover the material layer under the low material level, such as steaming and melting, under the layer covering the cover, and it can cover the material layer. . The heat transfer is necessary for the material to be transferred to the layer under the surface heat transfer layer, and the two-strength material can cut the material and burn the layer to remove the cover and cover the upper layer. The light beams burned in the positive area in the intermittent period will be exposed to light and exposure. The heat lost flow divides the time interval of the charging area. The time interval between the expansion of the cl 34J seeding period of this beam of light 'scattered light spread in a large area of the mutual exposure and exposure area to avoid the need to avoid the big need to measure the general knowledge 〇 Jiaming, whose outstanding paintings are engraved by the projective radiographs of the week, is based on the fact that the shot of the big thunder with the help of the wave is also false, and the results are scattered, and the explosion is divided into 0. Explosion shadows, sweeping and burning rate shooting with high-speed tracings, long connection and straight connection to change and control energy control strips. Shoot the fruit, Lei Jie, he hopes to wait for this, etc., eclipse and burn (please read the precautions on the back before writing this page).

The Ministry of Economic Affairs, Central Bureau of Standards, S Industry and Consumer Cooperatives printed K. The long-wave area of the laser beam is red YA or light. See Lei Keqi with argon equipment for shooting. About WC 0 (for example, the continuous wave or thunder wave G i A is used in Zhejiang). The paper standard that can use 0 long wave is applicable to the Chinese National Standard (CNS) f 4 specification (210 X 297 gong) 82. 5. 20,000 320815 A6 B6 Printed by the Central Bureau of Standards, Ministry of Economic Affairs, S Industry and Consumer Cooperatives 5. Description of the invention (33) Laser, the latter is better to provide accurate, high resolution burning. The laser beam is known to the proper The lens is focused to achieve the desired decomposition and ensure sufficient local power density to complete the removal of the upper cover. Generally, the power density of the laser beam is set so that the burned groove is sufficiently larger than the thickness of the upper cover transparent layer. When the transparent layer contains electrode address lines, this ensures that the address lines are clearly defined and electrically isolated. Implementing the depiction can move the laser beam to the material to be exhausted, or better. Install the material to be depicted at the relative laser X-Υ coordinate machine with movable beam. For depicting address lines, it is preferable to move the machine in X direction (ie, perpendicular to the line drawn), and move the laser beam in Υ direction, ie, Along this bit Line 〇 The material evaporated or decomposed during the laser burnout process can be placed in a vacuum close to the laser beam to draw away the depicted material. In the preferred EL® sheet 10 of the present invention, a thin layer of gasified tin 24 is deposited on the phosphor layer 22 by a known method. The vacuum deposition method or the solution gel method to deposit IT 0 is published in US Patent Nos. 4,568,578 and 4,849,252. An arbitrary transparent medium The layer may be provided between the ITO and the phosphor layers 24, 2 2. The preferred PZT lyogel layer 20 and the thick film dielectric layer 18 of lead niobate are disposed under the phosphor layer. The EL 10 sheet 10 is as described above Conventional TFEL devices are formed in the reverse order. This facilitates the IT 0 layer 24 and the phosphor layer 22 to be below (below) the opaque dielectric layers 18, 2 ϋ (lead niobate and PZT> above) (upper (Cover) transparent layer, in line with the laser engraving according to the invention. -3 5--------- Η ---------- {----- 装 --- --- # ------ Ai (Please read the precautions on the back before filling out this page) This paper size is applicable to China National Standards (CNS) fl regulations (2 丨 Ο X 2D7mm) 82. 5 . 20,000 Ministry of Economic Affairs Central Standards Bureau S Work Consumer Printed by the cooperative A6 B6 5. Description of the invention (34) As mentioned above, the laser depicts individual row address lines 24. The laser beam directly ablate the lyogel layer 2 I) At least a part and possibly the underlying medium A small portion of layer 18, and indirectly ablate through the entire thickness of IT 0 and phosphor layers 24, 2 2. This leaves a reliable insulation gap between adjacent lines. As mentioned above, row address line 24 Connect to the drive circuit. In more detail, according to the above-mentioned preferred through-hole connection process, the electrical interconnection wiring 46 is formed in the pattern shown in FIG. 10 by evaporating silver before laser engraving, and the address line IT 0 is formed at the end of S. The position of the floor part. Then, the address lines are drawn in the manner described above. The completed EL laminate can be sealed on the front surface with the polymer-sealed lamination protected by spraying as described above, or by bonding the glass plate 26 to the front surface. Using indirect ablation to characterize transparent conductor materials yields some advantages. An orange can be used when the low-power entangled wave laser generates light in the visible range without using an ultraviolet pulse laser with a high instantaneous power output. This not only reduces the laser cost, but also produces a smooth edge on the ablated burn. This is especially important for high-resolution EL displays. Direct burning of uranium in transparent materials requires extremely high instantaneous laser power to deposit the energy necessary for ablation in a sufficiently short time to avoid the diffusion of heat from the ablation area. In conventional techniques, transparent conductors deposited on a transparent substrate are directly ablated. Only a fraction of the laser power is directly absorbed by the transparent conductor material; most of the light passes through the two transparent layers. In many cases, indirect ablation can reduce the problem of cross-diffusion between layers, because thermal evaporation of the transparent electrode occurs from the bottom of the transparent electrode. This promotes the removal of ablation outwards and upwards in the flow of evaporated material-3 6-This paper scale applies the Chinese National Standard (CNS) τ 4 regulations (210 X 297 mm) H2. 5. 20,000 ^ --- -"------ j ----- installed ------, 11 ------ Ψ ·-. (Please read the precautions on the back before writing this page) Central Ministry of Economic Affairs The Bureau of Standards and Staff ’s consumer cooperation du printed A6 B6. 5. The material of the description (35), not the material diffused into the lower layer. This is especially important in order to preserve the quality of the medium and phosphor layer in the EL display. The example is further illustrated. Example 1 This example includes the illustration of a thick film of barium titanate (this material is used as a ceramic sheet in Miyata and other references) by simple screen printing under about 2f) 0v working conditions The layer is subject to electrical breakdown. The single pixel electroluminescent device was fabricated on a vaporized aluminum substrate (5 cm square, 0.1 cm thick) from coors ceramics (Crossado, USA, large junction). Rear electrode Applied and concentrated on the substrate, but there is a gap from the edge "The material used is a silver / platinum conductor, which is printed The address line is as used in electronic technology. In more detail, ceramic alloy # C4740 (Conshohoken, Pennsylvania, Ceramic alloy (Cerma 11 oy) is available from stock) via 320 mesh stainless steel wire mesh It is printed as a thick film paste and coated with an emulsion. The emulsifier is exposed to ultraviolet light through a light screen, which causes the area of the emulsifier that is reserved for printing to be exposed. The unexposed emulsifier is dissolved in water and the screen is used for printing Where the paste is made. Then, the remaining emulsifier is further hardened with additional light exposure. The printed paste is dried in an oven at 150 ° C for several minutes and in the atmosphere of the BTU type TFP 142-79 GA24 belt furnace The temperature distribution recommended by the manufacturer of the paste is fired. The maximum processing temperature is 85 ° C. The resulting thickness of the fired electrode conductor layer is about 9 cm. The formation of the dielectric layer on this electrode layer is as follows. Media (please read the precautions on the back before filling in this page) α. Installed., 11. The paper size is applicable to the Chinese National Standard (CNS) A 4 specifications (210 X Lie 7 Gong) 82. 5. 20,000 Ministry of Economic Affairs Printed by the Central Standards Bureau W Industrial and Consumer Cooperative A6 B6 V 3. Description of the invention (36) Lake (ESL # 4 5 2 0, King 〇f P russia, Pennsylvania, USA, electronic science laboratory is available from stock, medium constant 2 5 0 0-3 G 0 Q) It is printed on a 200-mesh screen in a square pattern so that it is completely covered except for the electrical contact pads of the electrode border. The printed dielectric paste is burned in the atmosphere in the BTU furnace at the temperature distribution recommended by the paste manufacturer ( Maximum temperature g〇-1 (3Q (rC). As a result, the thickness of the fired medium is in the range of 12 to 15%. Then, the second and third layers of the medium are printed and fired on the first layer in the same manner. The combined thickness of the three printed and sintered dielectric layers is 40 to 50 microns. According to the known thin film technology, the disc layer is directly deposited on the dielectric layer. In particular, a 0.5 cm thick layer of zinc sulfide doped with 1 mole of magnesium is evaporated onto the dielectric layer using a UHV instrument model 6000 electron beam evaporator. This layer is heated under vacuum in the evaporator, and is maintained at a temperature of 150 ° C during evaporation for about 2 minutes. The β-phosphorus layer is coated with a transparent electrical conductor composed of vaporized tin oxide. This layer is applied by known thin film deposition techniques, in particular, using an electron beam evaporator at 400 ° C under vacuum. The laminations were then annealed in air at 450 ° C for 15 minutes to anneal the phosphor and vaporized tin conductor layers. Welding contacts are provided on the I T 0 layer. This device is made of silicon sealant (silicone resin varnish, cat. # 419, manufactured by M.G. Chemical). This device was tested by applying a DC voltage of 20 () V across the two electrodes. This device directly surrounds the contact area of vaporized fuming tin when a voltage is applied -38- (please read the precautions on the back before writing this page) 1-装-end_ CNS) Y4 specification (210 X 297 mm) 82. 5. 20,000 V. Description of the invention (37) A6 B6 The quality is clearly shown to be because the observation is the appearance of the obstacle. The face mask is installed on this table, so the letter slip is a head-up, and it is necessary to collapse the method of gas supply. The gas supply side is charged with the same layer of phase phosphor to the single material with or without the inner layer. The quality of the material is not clear and the paste quality is based on the use of the root quotient. It is not because the barium is the acid and the titanium is not listed, it is not the quality of the layer. If there are 2 lines and 1 split, the system of the first example has a lower temperature than the niobium and lead. The titanic acid content of barium is lower than that of niobium and lead. The sub-layer and the sub-layer of niobium white have a specific value of 0, but the development of light is not prepared, but the formula of Fang Qiang Homogeneous Intermediate 1 is suitable. Lead approx. Medium / IV number, for example, is thick (please read the precautions on the back before writing this page) • Pack. Add 40 to apply and install it later. This C-cracked layered medium is tangible and unacceptable.> Measurement 1 Piezoelectric CD at the time of volts Piezoelectric 0 Piezoelectric 0 at the interface because the interface is good or bad. Relatively speaking, the appearance of niobium and niobium lead oxide is regarded as a must. Layer 1 is not proton-mediated. Example 1, this is the same as a single C. The problem is that it is not possible to understand the basis of the layer 3. For example, there is a production system with a medium layer two. The original version is based on a clear explanation of the drawing. The book is set for the Ministry of Economic Affairs. The Central Standards Bureau. Employee consumption cooperation. Du «layer phosphorus in the step outside, there is) 〇1W example The light is made like a hair but the {layer is well placed and the quality is good. The layer is 2 1 c ^ l in the lead-acid mesophase niobium 2. The rp titanate junction and the paper size are in accordance with Chinese national standards. (CNS) Yuan 4 specifications (210 X 297 mm) 82. 5. 20,000 Printed by the Beigong Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs $ A6 B6 V. Description of the invention (38) Before application, use the gelling process to apply the stearic acid titanate Lead (PZT) layer to the printed and fired dielectric layer. The sol is prepared in the following directions. Acetic acid was dehydrated at 105 ° C for 5 minutes. 12 g of lead acetate dissolves into 7 milliliters (m 1) of dehydrated acetic acid at 80 ° C to form a colorless solution. This solution was allowed to cool, and the propylene gasification knot was stirred into 5.54 grams (g) into the solution to form a pale yellow solution. This solution was maintained at 6 ITC to 80 ° C for 5 minutes after the addition of 2.18 g of titanium propionate and stirring. The resulting solution was stirred in the ultrasonic bed for about 20 minutes to ensure that any remaining solids were dissolved. Then, about 1.75 m 1 of 4: 2: 1 ethylene glycol to propanol to aqueous solution is added to make a stable sol. Before coating, add more ethylene glycol to adjust the viscosity to the desired value for spin coating or liquid immersion. The prepared dielectric layer is spin-coated in one case, and immersed in the sol solution in another case. In the case of spin coating, the solution droplets flow onto the first dielectric layer spinning at 3000 rpn in the horizontal plane. In the clear form of liquid immersion, use a higher viscosity solution. For the liquid immersion process, the substrate is withdrawn from the sol at a rate of 5 cm per minute. Then, the resulting coating was assembled in an atmosphere at an oven temperature of 600 ° C and heated for 30 minutes to convert the sol to ΡΤΤΤβΡΤΤ thickness about 2 to 3 microns. The observed surface of PZT is considerably smoother than the surface of the first dielectric layer re-sintered by screen printing. After the application of the P Z T layer, phosphorous and transparent conductor layers were deposited as in Example 1. This completed "Plate performance is good, with the same or better than the reported luminosity of Miyata et al. For the minimum paper size used for display, the Chinese National Standard (CNS) f 4 specifications (210 X 297 g) 82. 5. 20,000 -------- 丨 · ---- ^ --- --- ^ ----- 装 ------------ ^ 'J (Please read the precautions on the back before writing this page) 32〇8ί5 Α6 Β6 Central Bureau of Standards, Ministry of Economic Affairs Β Industrial and consumer cooperation Duyin S4 V. Description of invention (39) The threshold voltage of photometric is 11QV. The luminosity at 50V above the threshold voltage (卽 1 6 0 volts, 6 Ο Η ζ) is 5 7 f t-1 b (two feet Lambert). Example Q4 This example includes a graphic illustration of the change in the thickness of the dielectric layer that affects both the operating voltage and the luminosity of the display. The display was made as in Example 3, except that only two dielectric layers were applied instead of three screen printed layers. The thickness of the first dielectric layer is relatively reduced to 20 to 30 meters. This monitor functions well. The expected threshold voltage for minimum luminosity is theoretically considered to be 70 volts (compared to 110 volts in Example 3). The luminosity at 50 volts above the threshold voltage was also reduced to 35 ft-lb (compare 57 f t-lb in Example 3). Example FS This example illustrates a detailed embodiment using via holes to connect the row and column address lines of the EL stack to the drive circuit. The addressable EL display was fabricated using the same sequence of layer deposition as described in Example 3. The substrate is 0.025 inch rectangular vaporized aluminum obtained from Cor rs ceramics (Crollado, USA, Grand Junction), with a size of 6 inches long and 2 inches wide. Use the two gasification sulphur laser to drill a 0.Q06 inch diameter through hole with the pattern shown in Figure 4. The substrate is inspected to ensure that all holes are clean. The diameter found on the laser facing side is about 〇. 〇〇8 inches, and about 0.06 inches on the opposite side. The opening side with a larger hole is selected as the back side of the base and-4 1----------'--- Μ ----- 1 ----- installed ------, 玎 ------ ψ J (please read the precautions on the back before filling in this page) (CNS) A4 specifications (210 X 297 mm) 82. 5. 20,000 A6 B6 Printed by the Beigong Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs. V. Description of the invention (4〇) Facilitates the flow of conductive materials into the through holes. After that, using the ceramic alloy # 4 7 4 0 silver / platinum paste, the circuit pattern shown in Figure 5 was printed onto the back side of the substrate through a 3 2 5 mesh stainless steel mesh. During the printing process, the substrate alignment was drilled. As shown in Figure 4 Same as figure 0. ϋ 40-inch diameter main board, and apply vacuum under the main board to draw conductive paste through the through hole in the base body (that is, to the front side of the base body). The circuit pattern of 5 and the conductive path through each through hole in the substrate are formed together. In order to ensure the uniformity of the vacuum application, the vacuum is not activated until the substrate has been printed. This part is checked to ensure that the through holes are filled. After the preparation, the substrate is burned in the BTU type TFF 142-790Α24 belt-like inner atmosphere at the temperature recommended by the paste manufacturer. The maximum temperature is 850 ° C. After this step, the circuit enhancement pattern is printed as shown in Figure 7 And fire on the back of the substrate, on the circuit side (using the same ceramic alloy conductive paste). This step makes the circuit pattern thicker in some areas where electrical wiring is subsequently performed. Then, the column address line and the front row and column connector liner The pads are screen printed on the front side of the substrate. This line extends across the length of the substrate to the column connector liner in the pattern shown in Figure 6. The row connector liner shown in Figure 6 is the same step Printed in China. Address line and connection The lining is formed from the same conductive lake (ceramic alloy # 4 7 4 0) using the same printing and firing conditions. The substrate is placed on the same main board with the through hole pattern of FIG. 4, and the & 2-(Please read the precautions on the back before writing this page) The size of this paper is applicable to the National Standard (CNS) A 4 specifications (210 X 297 mm) of 82. 5. 20,000 The Ministry of Economic Affairs Central Standards Bureau Printed by the cooperative A6 B6 _ V. Description of the invention (41) Apply vacuum to oil out the conductive paste and pass through the through hole to the rear side of the substrate. The thickness of the fired electrode layer is about 8 cm. There are 52 address lines per British hour, and the total number of address lines is 68. This section is inspected to ensure that the through holes are filled. The three layers of dielectric paste (ceramic alloy SIP9333) were printed and fired as shown in Example 3 to form a dielectric layer approximately 5 μm thick. Then, the back side and the circuit side of the base body are sealed. Thick film glass paste (Heraeus, Pennsylvania-Heralus IP9028 made of ceramic alloy) was printed using the 250 mesh screen in the pattern shown in FIG. 8. The connector pad used for wiring to the high-voltage drive crystal H and other drive circuits is left uncovered. Then, this glass sealing layer uses the temperature distribution recommended by the manufacturer at a maximum temperature of 70 ° C in the BT belt furnace Fire. During the above firing step, the substrate holder is at either end of the ceramic material portion to avoid contact between the printed material on the circuit side and the furnace belt. Then, the lyogel layer was formed by liquid immersion substantially as described in Example 3. Typically, a 3 or 4 lyogel layer is used, drawn from a mixture having a viscosity of about 100 cp as measured in falling ball viscosity at a rate of 10-25 seconds / inch. The lyogel between the liquid immersion layers was dried at 11 Q ° C for 5 minutes. The vacuum suction cup is placed on the effective area of the lamination, and the remaining area is washed away with the gel water. Then, this layer was fired in a belt furnace at about 600 ° C for 25 minutes. The thickness of the total lyogel is between 3 and 10 microns. Following this, the phosphoric oxide as in Example 3 utilizes zinc sulfide doped with one percent of magnesium impurities and has a thickness of 0.5-1.0 m. -4 3-This paper scale is applicable to the Chinese National Standard (CNS) f 4 specifications (2 丨 0 X 297 mm) 82. 5. 20,000 --------- '丨 J ------ f ----- Installed ------, 玎 ------ ^ J (Please read the precautions on the back before writing this page) 3208 ^ 5 Α6 Β6 Central Bureau of Standards, Ministry of Economic Affairs 0Κ 工 consumer cooperative Print 5. Description of the invention (42) Pictured. < The line master's address is 25 English and a total of 19 lines. Jier 5 Shen line, tin site, location, qi, 52, own, about 3 times per son. It is an example of the distance between the pictures. The 9 lines are the wide lines and the lines from the line line to the line address line are formed and the criminal soil of the steamed plate network is shown. So ο 11 The heart picture is in front of the silver heart, the light paint of the whole paint is bright, 0 shows the fat line, and it is connected to the _ gas agent silicon electric seal is the dense body _ the sealing guide silicon dense hole coating for the spray On the table to make it decent. And the picture seal as the densely lined device Η 上 接 # The connection of the factory is provided by the factory. 1 connection-~ The display is completed by the device. The meridian element pairs the display circuit listed in each row and the device as the image pad. After the electric time is added, the voltage is applied to the electric base. When it is tested in the C product, it is lighted up to 1 point. Total 6 cases (please first Read the precautions on the back and then write this page) --installed. In the strong degree, the measurement of 3 results in the same phase with the same image and the work of the prime image. The film of shooting mine «L Ε's Mingfa version is based on a clear explanation of the example of the graph. On the basis of a non-ceramic pottery in the production process, the C use case makes the applicator show no detail. H. 1¾ Moment of the array The location of the line is Dora House 2 in Si Kefan State, Luo Ke, and the United States is beautiful (British Porcelain 2, Tao Du Skuer, and Ku Cun since 6). The body has a long base with 0 faces. The square shape is long and thick, and the type of the picture is shown in Figure 4. In this way, the aluminum oxide clean green »7—the hole is guaranteed to be inspected by the division. This paper size of 0-inch straight-length English paper is applicable to the Chinese National Standard (CNS) A 4 specifications (210 X 297 mm) 82. 5. 20,000 orders. 320815 A6 B6 V. Description of the invention (43) The picture was made by the manufacturer-# 〇 after the heroic show, the printing is quick and easy. 74 间 电 # Periods of lead and silver on the body of the United States and the United States 4 iso gold mesh C3 in 2 with porcelain? 3 with a pottery quasi-plus after the firing period of the firing period of the printing part is here and the main hole The pass-through pattern is the same as the suction phase of the hollow body C. If the hole is drilled into the base body to the inch space Yingzhen aE Chin 2 4 4 1 1 FF factory T modeling made TU JJ paste to share this 85. degree road temperature The highest conductivity of Tonggao is shaped, and the body cloth is divided into porcelain.

V In (please read the precautions on the back and fill in this page first) Burning in the air large internal furnace with fire} Then paste the electronic printing guide through the gold type picture porcelain ceramic pottery same-phase electrical instruction center 7 The figure above is like the road S, the step body after IpBC, and the step body. This base is followed by the line Igml Shu in the inner area of the burning road. The thickness of this step is better than that of the top 6 of the C-type. The body of the figure is based on {6 in the liner system, such as a printer, and the liner is connected to the liner. The line is connected to the step «.ΓΡΓ ..VJ The base pads of the long pad body of the degree of address are connected one after another, and the line is followed. This. .} With the side view, the strip-shaped burned body fire hole base and the four-hole printed pattern are commonly used in the past, and the use of the empty is an Anzhen University body with a lining base applicator. The lower connection is from the column and the column from the lead to the upper silver is the same as the column from the main phase. Pieces phase 0 every 0 meters. 8 of about 68 are just a few of the thickness of several layers of the total line of the electrical address. Line paste site potential guide lists 52 oils with side inches and then English.-installation. Ordered by the Ministry of Economic Affairs, Central Standards Bureau, S Industry and Consumer Cooperatives, printed by Jinshuhe Porcelain 3 Tao Zi, for example, the paste is as good as the quality. The most important line on the niobium 丨 the three positions of the site are listed in the order of the business order ^ ^ 嗛 3) t 3 and 9 with rp in the temperature distribution of the I cloth division. This paper scale applies the Chinese national standard ( CNS) A4 specifications (210 X 297 mm) 82. 5. 20,000 Ministry of Economic Affairs Central Standards Bureau employee consumption cooperation Du Yin meal A6 __B6_ · Fifth, the invention description (44). The thickness of this combination of dielectric layers is 50 microns. Following this, the rear side and the circuit side of the substrate were sealed as shown in Example 5 into the pattern shown in FIG. 8. Secondly, a 3-10 cm thick layer of lead titanate (PZT) is deposited on the lead niobate layer to form a smooth surface. The lyogel technique using liquid immersion as described in Example 5 was used. The thin film phosphor layer is then beam deposited using known techniques of electron beam evaporation. This phosphorous layer is zinc sulfide doped with U magnesium impurities, which is deposited to a thickness between 0.5 and 1 micron. The next step is to deposit 300-micron-thick vaporized soot (ITO) on the phosphor layer using electron beam evaporation methods known in the art. Then, the I T 0 layer is patterned into 2 5 6 address lines using a 2 Watt (W) C W (continuous ore wave) argon ion laser adjusted to 5 1 4.5 dust meters. The E L lamination is mounted on a movable X-coordinate table so that the pancake moves in a direction perpendicular to the line drawn under the laser beam. This laser beam moves in the Y direction to draw a line. The laser beam is focused into a 12-meter-removed spot, and the laser power is adjusted to cause ablation where the tin oxide, the underlying phosphor layer, and the 10% combined dielectric layer below are scanned by the laser beam. Off (about 1.8W). This scanning speed is controlled at about 1QQ to 500 μ / sec to provide address lines with a gap of 40 or 25 microns, respectively, and an address line depth of 6 to 8 or 3 to 4 cm respectively. The distance between them (卽, between the online centers) is about 500 cm. Vacuum oil adjacent to the substrate removes vaporized and ablated materials. The pattern of the transparent electrode is as shown in FIG. 9 when the ablation is completed. On the completed display, there are about 50 lines of address lines per hour, and a total of 2 5 -4 6-one T ------ {装 ------ '11 ------ ^ J --- * (Please read the precautions on the back before writing this page) The paper size is applicable to China National Standard (CNS) A 4 specifications (210 X 297 public goods) 82. 5. 20,000 3 ^ 0815 A6 __B6 _ 5. Description of invention (45). Before engraving the I T 0 row address line, the silver interconnection between the front (row) connector pad and the final I T 0 address line is printed from the silver screen through the screen to form the pattern in Figure 10. After the laser characterization, the protective polymer layer on the front side of the display (silicone resin varnish, cat # 4 19, manufactured by MG Chemical) has been completed. Then, the monitor applies a voltage test by connecting a pulse voltage of 160 V and a pulse voltage of 64 Hz across the selected pixels. Each pixel is reliably lit with the same luminosity β as the single pixel device of the above example. The refractive index of the address line of this example is usually much higher than that achievable with photolithography technology. Commercial off-the-shelf devices typically have I Τ 0 address lines with a degree of 180-205 mils and a gap between 65-800 microns. As described above, according to the present invention, the production of gaps of 25 and 40 microns depends on the laser scanning speed. This higher bridge resolution allows the display to have a higher effective ratio to the total area, because the wider IT0 address lines can have a smaller gap. Example 7 This example illustrates a two-layer medium made according to the present invention, but the first medium layer is made from a paste having a higher dielectric constant than the pastes used in Examples 3 and 4. (Please read the precautions on the back before filling out this page) — Binding-Ordering. The layered paste-like layered dielectric printed by the R and Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs. It is usually 10 but 42, code 00 as the number. 'Prepared as 10 to provide a summary of the three-room paste test results, such as the study of this set, the device lead, the electrical acid from niobium, the paper standard is applicable to the national standard (CNS) f 4 Specification (210 X 297 mm) 82. 5. 20,000 S20815 Printed goods A6 B6____ of the R and Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs 5. Description of the invention (46) It has a thickness of about 5 Q microns. As described in Example 3, the gel of E > Z T was applied to a thickness of about 5 cm. This device functions well, with a 91 volt threshold voltage for minimum luminosity and a 50 ft-1 b luminosity at 150 volts. Example ft This example illustrates the production of a two-layer dielectric using a first dielectric layer formed from lead niobate paste and a second dielectric layer formed from lead zirconate titanate (PLZT). PLZT has a dielectric constant of about 1,000. This PLZT has a molar ratio of 5 2: 3 2: 1 6 with a ratio of titanium to lanthanum. This device was fabricated as described in Example 3, with a coagulation layer prepared as follows: Dissolve 9 9 .5% pure lead acetate 120 g in 50 m 1 glacial acetic acid. The resulting solution was heated to 9 G ° C and kept at this temperature for 2 minutes before cooling to 7 Q ° C. Secondly, 55.4 g of propanol gas was added, and the synthesis solution was heated to 8 Q ° C and kept at this temperature for 1 minute. After cooling to 70 ° C, 21.8 g of isopropylated titanium was added. Next, dissolve 11.4 g of lanthanum nitrate into 20? Glacial acetic acid, and add this to the solution. Finally, in order to stabilize the solution and adjust the viscosity to an appropriate value, add 10 ml of ethylene glycol, 5 ml of propanol and 2.5 ml of demineralized water. The PL Z T lyogel was applied to the first dielectric layer by liquid immersion in the same manner as described in Example 3. The liquid-immersed part is burned at 6 Gfl ° C to transform the second layer into P L Z T. The 4 layers of P L Z T are applied by immersion liquid immersion and such a fire to prepare drops for smoothing the phosphor layer. To a total thickness of 5 cm. 1 4 8 _ (Please read the precautions on the back before filling in this page) 丨 Binding-The size of the paper is applicable to China National Standards (CNS) A 4 specifications (210 X 297 mm) 82. 5. 20,000 V. Inventions Description (47) A6, B6, and the current limit voltage is about 5 to 7, with a good energy, good light, good energy, Lb, and tf. The technique of stupid technique with this 37 is the same as the test. The publication of this article is a combination of all the things that are indicated. The reminder refers to the standard water in II. Those who have a technical institute should indicate the specifics and make sure that the other forms of the table are the same as C. The test enrollment is not good enough, and the demonstrative language used in the demonstrative description is pretended to be clear and clear, and the clear language is LC = 1 and the language is used in the standard calculation mode. This is not used in c. Restricted profits should be applied for encirclement. The civilization is issued as it is known, and the system is limited, and it is a bit of a wait-and-see paradigm (please read the precautions on the back and then write this page). The size of the paper printed by the Beigong Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs is applicable to the Chinese National Standard (CNS) Grade 4 (210 X 297 mm) 82. 5. 20,000

Claims (1)

Announcement Printed by the Employee Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs VI. Scope of Patent Application Η-一-'Plant I ill Γ * 1 1 No. 82103846 Plant with Thick Film Medium Electroluminescent Stack Η J Patent Case 1 1 (87 years May revision) 1 I 1. — A type of electroluminescent stack Η includes;., / ^ -N 1 I please I a flat and m layer »read I read 1 1 before and after the phosphor layer on both sides of the back of the plane electrode 1 | 1 A flat dielectric layer 1 is between the back electrode and the layer. This dielectric is notable. 1 Event 1 is formed of sintered ceramic material. 9 The dielectric strength of the dielectric layer is greater than 1 to about 1.0.) < 1 06 V / m and the ratio of the dielectric constant of the dielectric layer to the phosphor layer is approximately greater than 50 1 1 The ratio of the thickness of the dielectric layer to the thickness of the phosphor layer page 1 | is 20 1 to 5 Within the range of Θ 0 1 »The dielectric layer has 1 I-a surface adjacent to the phosphor layer, which is very smooth > makes the m layer emit light uniformly as a whole under a given excitation 1 1 excitation m 9 and in which the dielectric layer or the m layer Connect 1 to touch> or at least separate it with an additional layer 9 The additional layer itself is in contact with the phosphorus-1I layer 9 and the layer in contact with the phosphorus layer can be bonded to the m layer. 1 1 1 2. If please Patent scope item 1 electroluminescence fee Η 9 where the ratio of the dielectric constant of the dielectric layer 1 1 to the dielectric constant of the phosphor layer is greater than about 100 1 and 1 1. silver where the thickness ratio of the dielectric layer to the m layer is about 40 1 to 30 0: 1 of 1 1 to Ϊ m within 〇1 1 3, such as Shen The patented item 1 of the electroluminescent lamination »where the m layer is a thin film layer sandwiched between the 1 -X-*-m and the rear electrode. The front electrode is a transparent 1 > m layer with The dielectric layer is separated from the rear electrode by 〇1 1 4. For example, the electroluminescent element 1 of item 3 of the patent application, where 1 1 of the dielectric layer has a dielectric constant of greater than 500 »and a thickness of -1 degree of approximately 10 -300 metre. Scope, 1 1 1 1 1 1 This paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) ABiCD Ministry of Economic Affairs employee consumption agreement. The company prints the copy and applies for the patent. 5. For example, in the 4th patent application, the m light emission "Η, where the dielectric layer contains at least two layers, a first medium ® is formed on the last 15 poles and has the dielectric strength and dielectric constant as in the 4th patent application, And a second dielectric layer is formed on the first dielectric layer, and its surface is adjacent to the phosphor layer, which is very smooth, so that the carcass layer emits light uniformly under a given excitation voltage. The first and second dielectrics have the scope of patent applications The combined thickness described in item 4. 6. For example, in the 5th scope of Shenhua's patent, Dianguangguangday H, where the first and second dielectric layers are formed of ferroelectric ceramic materials. 7. For the electroluminescent day piece of the patent application item 5, the dielectric constant of the second dielectric layer is at least 20, and the thickness is at least about 2 cm. 8. For the electroluminescent stack M of item 7 of the patent application, the dielectric constant of the first dielectric layer is at least 1000, and the dielectric constant of the second dielectric layer is at least 100. 9. For the electroluminescent SH of patent application item 8, the thickness of the first dielectric layer is approximately in the range of 20-150 decimeters, and the thickness of the second dielectric layer is in the range of approximately 2-10 decimeters. 10. For example, in the 9th item of the patent application, 難 光 "H, in which the first and second dielectric layers are formed of a galvanic ceramic material with a perovskite crystal structure. 11. For example, the "M-2-Original Paper" in the scope of the first patent application, the "H -2-This Paper" scale is used in the country's national kneading falcon (.CNS) MN (210X male;! T) (please first Read the precautions on the back and fill in the page), τ Six, apply for a patent Fan Yuan AS 83 C3 D8 Μ Ministry of Economic Affairs Central Lark Falcon Bureau Bei Gongxiao «He Ling Hong Zhong». Hard Η hard its alpha intermediary point is low Ηmedium lead is stacked, 4r ^ 1 2 melt 2 in the base 1 acid is divided into the first after the second light 2 The first line is filled in the middle «only in the middle body with the middle acid has its own Light j is low in its basic skills. In electricity, its zirconium, with, and, made it. ， It is made up of 80 Η plaque after electric temperature Η sheet pole Η gel-shaped item Η is the base * base 0r with ® day electricity «condensation and 12, shape * layer this light 85 items. After the light is light, the light dissolves or becomes a light quality, and the hair is burned. 12 About the technology, the hair is burned in the shape of 11-shaped lead hair dielectric electrode or immersed in the low shape of the film-shaped electric mold, lead acid 2 Electricity 6 The bearing of the thick and the fluidity is 6 after the titanium acid. After the item, the item can be settled. After the term or temperature, niobic acid 3¾ and into 10% 5 by burning 13 into 13 with 14 points 5 from zirconium 13- shape first shape is the first layer of the first shape. The first smelt is the first or the upper part of the upper wall. The extremely high-quality surrounding brushes form a surrounding lead circle. Fan Qi. Fan Dijie Wen Fan Yin Fan colloidal fan self-learning fan acid lead lead, Η profit, 1 point after the use of a sharp network and condensed, including the base of the titanium titanic acid body * Special "special and first melt special filtration Special solution and special package and special 1 acid special niobium base support base support please please please burn please please read the end of the application after the application and the application of the support after the application of the application is the application is the next application is the electricity Shenzhong Youshen is 1 with the same as the same and the base as the layer as the layer is as the layer after the layer as if it is the layer content, content. In, and · quality. Quality temperature. Quality in.-Layer · quality 2 3 4 5 6 7 8 ^----. _ J I- I 士 · -1-— ^^^ 1 I.. M I a J. ', V5 (Please close the precautions on the back before filling this page) In this paper, the 31 standard national falcon (CNS) Α4 is now available (210Χ 29? Public; f) ABCD Six, apply for a patent garden or lead titanate hemicides formed. 19. For example, the electroluminescent laminate of claim 16 of the patent scope, in which the first dielectric layer is formed of lead niobate, and the second dielectric layer is formed of lead titanate or lead titanate. 20. For the electroluminescent lamination of claim 11 or 12; the basic certificate is vaporized aluminum. 21. The electroluminescent UK as claimed in item 19 of the patent scope, wherein the substrate is vaporized aluminum. 2 2. The electroluminescent stack as claimed in item 16 of the patent application, in which the surface of the dielectric layer adjacent to the lamina has a undulation within 1000 μm, which has never been greater than about 0.5 μm. 23. For example, the electroluminescent SH in the 19th scope of the patent application, in which the rear electrode is integrated with silver-platinum sites formed on a vaporized aluminum substrate, and the front electrode is integrated with oxidative offset sites. 24. If the luminous lamination of item 23 of the patent scope is applied, a sealing layer is included on the front electrode. 25. For the electroluminescent day H of items 1, 11 or 12 of the patent application, where the dielectric layer is bonded to the layer. 26. For the electroluminescent stack of items 5, 11 or 12 of the patent scope of the application, the second dielectric layer is in contact with the carcass layer. 27. For example, the 4,5,11 or 12 items of Shen Qing's patented film of Deng Guangguang, where the undulation of the surface of the medium connected to the S5 / S is about 1000 Chemi (please read the notes on the back first (Fill in this page again) The papers used in this book are printed in the Chinese National Standard (CNS) 64 4 Liluo (210X297mm). Λ 8 Β8 CS D8 6. Apply for a patent model. The domestic unlucky love is greater than about 0.5 cm. 28. —Electroluminescence * Η. There is a phosphor layer sandwiched between the front and back electrodes, and 硿 ® is separated from the back electrode by a dielectric layer, its characteristics are: The dielectric layer forms at least two layers. The first dielectric layer Formed on the back 15 pole, the second dielectric layer is formed on the first dielectric layer. The second dielectric layer has a very smooth surface so that the phosphor layer emits light uniformly under a given excitation voltage. The first and second dielectric layers It is formed of sintered ceramic material, and its dielectric strength is greater than about 1.0xl0e V / d · dielectric constant of the dielectric layer to the dielectric constant of the phosphor layer is greater than about 50: 1, the thickness of the first and second dielectric layers combined to phosphor The ratio of layer thicknesses is in the range of 20: 1 to 500: 1. 29. The electroluminescent delta sheet as claimed in Item 28 of the patent scope, in which the ratio of the dielectric constant of the dielectric layer to the moraine layer is greater than about 100: 1. And the combined thickness of the dielectric layers is such that the ratio of the dielectric layer to the thickness of the chain layer About in the range of 40: 1 to 300: 1. Ministry of Economic Affairs 夬 帬 隼 局 男工 消 # Cooperation let the seal ¾ -------- (install —— (please read the precautions on the back and then fill out this page) 30. If applying for patent scope item 29霣 luminescence stack Η, wherein the dielectric constant of the first dielectric layer is greater than 500, the thickness is in the range of about 10 to 300 Chemi, and wherein the dielectric constant of the second dielectric layer is at least 20, the thickness is at least 2 mm. 31. Such as The 30th patent application for electroluminescent βΗ, in which the first and second dielectric layers are formed of 黡 霣 ceramic materials. 32. For example, the 31st application of the patent scope of the patent application, the luminescent day Η, of which 1-7- Ben · Zhang Zhangzhi uses the Chinese National Falcon (CNS) A4JS Brother (210X 297 Public Broadcasting). The Ministry of Economic Affairs Central Falcon Bureau Male Workers Eliminates Kidney Cooperation Thorium Seal JL Λ3 B3 C3 D3 The dielectric constant of 1000, and the second dielectric layer provides a dielectric constant of at least 100. 33. For the electroluminescence of the 32nd patent application, the thickness of the first dielectric layer is about 20-150 meters, The thickness of the second dielectric layer is approximately in the range of 2-10 cm. 34. If the patent application is in the 33rd range "Pieces. The first and second dielectric layers are formed of ferroelectric ceramic materials with a perovskite sulfonic crystal structure. 35. The electroluminescence" Μ, as in the patent application item 28, where the "Η contains a base , The rear pole is formed on it, and the rear base has sufficient hardness to support β Μ. 36. For example, the electroluminescent sheet of the patent scope item 34, where the ® sheet contains a rear base, formed on it The back electrode, the back base plaque has sufficient hardness to support ® M. 37. As in the patent application item 35 or 36 of the electroluminescent day Η, where the first medium ® is formed on the back of the pole by thick film technology, then It is sintered at a temperature lower than the melting point of the back electrode or the base card. 38. For the electroluminescent light of the patent application No. 35 or 3δ, the first dielectric layer is formed by screen printing, and then below the back electrode or base It can be sintered at the melting point temperature of the certificate. 39. As in the patent application, the 36th daylight-emitting day tablets, in which the second S-layer is formed by the gel-gel technology. Then the temperature is lower than the back-end or base --- ------ One pack ------ Order (please read the precautions on the back before filling in this page) This paper is in use again A family tree twin (CNS) Α4 Lige (2 丨 0Χ 297mm) A3 B8 C8 D3 Six, apply for a patent Fan Guoguo at the melting point temperature 40. If the scope of the patent application item 39: luminous day tablets, of which The coagulation technology includes spin deposition or liquid immersion. 41. For the electroluminescent® sheet of patent application No. 28, 35, 36 or 40, the first dielectric layer is formed of lead niobate, and the second dielectric The layer is formed of lead titanate or zirconate lead lanthanum titanate. 42. The electroluminescent IIM as claimed in item 28 or 40 of the patent application, in which the surface of the second dielectric layer has a surface undulation within about 1,000 m 2 Will not be greater than about 0.5 Chemi. 43. As described in the 28th item of the patent application, 霣 光 βK. The first dielectric layer is formed on the rear 11 掻 using thick film technology, and then sintered at a temperature lower than the melting point of the rear pole. 44. _ A method of forming a dielectric layer in an electroluminescent laminate, the type of which includes a disc layer sandwiched between the front and rear electrodes, and the raft layer is separated from the rear electrode by a dielectric layer / contains: Thick film technology on the rear electrode A ceramic material is deposited on it, and then sintered to form a dielectric layer with a dielectric strength greater than 1 · 0 × l0β ν / π, so that the ratio of the dielectric constant of the dielectric layer to the comparative layer to the dielectric constant of the layer is approximately greater than 50: 1, And make the thickness ratio of the dielectric layer to the molybdenum layer in the range of about 20: 1 to 500: 1, Dielectric® forms a surface tethered to the carcass layer, which is very smooth and makes the moat layer illuminate uniformly under a predetermined excitation pressure , And the medium is connected with "or at least one outer layer of 頮 and -7-(please read the precautions on the back and then fill out this page). The standard size of the bound paper is the Chinese National Standard Falcon (CNS) Α · 4. (210X 29 is public; *) Λ 3 Β3 C3 D8 々, separated from the patent application Fan Guo, the extra layer itself is connected to the phosphor layer ®, and the layer in contact with the ruffle layer can be combined with the ruffle layer. 45. The method as claimed in item 44 of the patent application, wherein the ratio of the dielectric constant of the dielectric layer to the phosphor layer is greater than about 100: 1, and the ratio of the thickness of the dielectric layer to the scour layer is in the range of about 40: 1 to 300: 1. . 46. The method as claimed in item 44 of the patent application, in which the dielectric layer is formed in the electroluminescent daysheet. Its type includes a thin film layer sandwiched between a front transparent electrode and a rear electrode, and a medium is connected to the rear corner Layer separation. 47. The method as claimed in item 46 of the patent application, in which the dielectric constant of the dielectric layer is greater than about 508, and the thickness of the dielectric layer is in the range of 10 to 300 millimeters. 43. The method of claim 47, wherein the dielectric layer is formed of at least two layers, a first dielectric layer is deposited on the back electrode by thick film technology, and has the medium as described in patent application item 47 Strength and dielectric constant, and a second dielectric layer is deposited on the second dielectric layer to provide the surface of the phosphor layer as described in item 4 of the patent application scope. The first and second dielectric layers have The combined thickness as described in item 47 of the patent scope. 49. The method of claim 48, wherein the first and second dielectric layers are formed of ferroelectric ceramic materials. 50. The method of claim 43, wherein the second dielectric layer provides a dielectric constant of at least 20 and a thickness of at least about 2 cm. -8-________— · _____ ^ _ Ding, Qin. 1 (Please read the notes on the back before filling out this page) This paper uses the Chinese National Standard Falcon (CNS) A4 format (210X 297mm). Apply for a patent Fan Guo ABCD to mention 1 layer of less quality to refer to 1 to mention the middle level of its quality, refer to the 2nd party's item's 50's of the circumstantial quality Fan Jieli's special 00 please 10 apply for less. The layer has a medium layer, a medium layer, a medium layer, a second layer, and a thickness term of 51 degrees within the range of Fan Fanmi. Licht Mathematics 5 often asks -1 to pledge 2 to refer as agreed. There are 2 to 1 and 1 to the French method. Term degree 52 Thickness of the range of the scope of the Fanfan special rice please apply for 10 such as 0 after forming an I shape in the material electrode ceramics and ceramics in the pottery, the method of the construction of the crystal item 4 knots 4 mine calcium Fan Youzhu has a special application, such as the quality of the application. After 0 1 Μ After the electric support is supported, it is filled with a moderately large method. There are 53 items in the base and the Fan-Licheng special form Please go to Shenti Ruji. Pole 0 electric K after «with the plaque support base with a moderate i / hard 丨 Fangfangfang has a full range of 55 body and the base range of this model, if you have a special form, please go to Shen Manru Base. Accumulation technique 85 technology is subject to thick support so that the layer is the first medium and the formation of the material is the temperature of the V base or the extreme sky. The low is followed by the layer medium 1X Item 5 of the French side of the law 6 5 0th Fan Fan Shao Li under the special request Wen Shen points like melting. (Please read the precautions on the back before filling out this page) Bookbinding the Ministry of Economic Affairs Central Building Rate Bureau Monthly Work Consumer Ik Cooperation. Du Yin ». Based on the stratospheric melting of the 2 0th base or its pole, the electric method is behind The lowest item is around 56 after. Fan Zhen Ji Li Shen Shen Specialist Skills, please apply the Indian glue net like Ning S. Dissolve the layer to mediate the 2nd item of the French method 7 5th Fan Fanli. Exclusively request the application to make a decision. The paper ’s standard uses the national standard rate (CNS) Α · 4 Liluo (210 X 297 g; t) Ministry of Economic Affairs " 夬 暾 隼 局 shellfish elimination cooperation cooperation Du Inayal Λ 8 Β8 C3 D8 VI. The patent application includes spin deposition or liquid smelting technology deposition, and then the temperature is lower than the melting point of the rear electrode or substrate. 60. The method as claimed in item 53, item 54 or item 55. The first dielectric layer is formed of lead niobate, and the second dielectric layer is composed of lead zirconate titanate or lead titanate I form. 61. The method as claimed in item 56 of the patent application. The first dielectric layer is formed of lead niobate, and the second dielectric layer is formed of lead titanate or lead titanate. 62. As in the method of claim 59, the first dielectric layer is formed of lead niobate, and the second dielectric layer is formed of lead titanate or lanthanum lead titanate. 63. For example, the method of applying for the patent scope item 54, di or 59. The base plaque is vaporized aluminum. 64. As in the method of claim 62, the base plaque is vaporized aluminum. 65. The method of claim 47, 48, or 59, wherein the surface of the dielectric layer adjacent to the disc layer is in contact with the raft layer, and the fluctuation of its surface within about 1000 microns does not vary by more than 0.5 microns. 66. The method as claimed in item 62 of the patent application, in which the dielectric layer is formed in the «sheet. This stack H has a post-electrode formed by firing the silver / platinum site integrated on a vaporized aluminum substrate and by The front electrode formed by the vaporization of the tin-tin junction. 67. For example, the method of item S6 in the scope of patent application. Among them, the medium JS is formed on -10- (please read the precautions on the back before filling in this page). _ Ding »IU, τ This paper is easy to use in the letter $ 1 标 3Μ CNS) Λ4 Lige · (210Χ 297 degrees) ABCD Ministry of Economic Affairs Zhongkang Oak Falcon Bureau shellfish consumption Hekawang ¥ 6, the scope of patent application is in βΗ with a sealing layer on the front pole. 68.-A procedure for forming a small light-emitting head display board, which is formed by electrically connecting an electroluminescent chip to a voltage driving circuit. The electroluminescent lamination has:-a learning layer, sandwiched between intersecting front and rear address groups, The back address complex is formed on a substrate with sufficient hardness to support ®H, and the ply layer is separated from the back address complex by one or more dielectric layers, and is selectively separated from the front address, including the following Steps: (a) Provide a base plaque, forming a lot of through holes, and the figure is formed in order near the end of the address synthesis; (b) Form a conductive path through the through holes in the base to provide a comprehensive view of each site Electrical connection, thus forming an electrical connection to the voltage drive circuit; (c) Forming spaced back address summaries on the base card, one end of each line is connected to a through hole and is electrically connected to the conductive path therein; (d) Forming a dielectric layer on the post site; (e) forming a dimple layer on the dielectric layer; (f) selectively forming a transparent dielectric layer on the moraine layer; then (g) forming a moraine layer or a transparent dielectric layer Form a spaced front address junction, one end of each line is connected to a through hole, and with the guide path in it Sex linked. 69. The procedure as claimed in item 68 of the patent scope, in which the voltage-driven driving circuit includes a voltage-driving driving element, and it is in the spot (b). A road-pattern seal-1 1--------- -(------, 1τ (please read the precautions on the back before filling in this page) * The standard of this paper is general Chinese country. Sample Feng (CNS) Α4 said grid (2 丨 ΟΧ ZO97; Ϊ) VI. Application Patent scope AS B8 CB D8 Ministry of Economic Affairs Central Bureau of Industry and Commerce Beigong " = 咋. Biping yttrium base hole behind the heald and the site of aluminum long body (c), platinum Yutong). It is the base s (diameter / installed each (b type is not upset after the connection) Lu Yinan S is connected to the edge diagram and is a large connection (b: each path is followed by the path, the front body. Adjacent snap-guide cracks can be combined in the material base and base in the body electricity. The base brush in the burn-in electricity base g) is the material middle middle-the upper middle middle is the element guides its formation W the electricity its t its Its surrounding area. Its branch stomach-shaped after 5 or lead, Μ,,, peripheries, coral-wood driven out of the sequence and (C, the sequence of the sequence of the order of the order of the order of the membrane membrane mildew pressure in the process The outer pad of the pad is M. Cheng Cheng Hip Synthetic Thickness Guide 2-Electric Qi Kong Zongbu ’s base of M is the base of the 12th, and the general address of the item is connected with the I item, the g item, the shape item, and the bit item. The 4_ type, 69 people, Qian Qianzhen, 70U71, and 7271%. The 74 borders 75 are connected to the first in the picture, the first one is the first, the first one is the first, and the first is the first continuous type of padding pad. The end-end fan 85 fan Kong fan fan pass the order of the material fan front road. The material is expected to be the same as the material of the day and the benefit of the benefit of the day and the post-electric comprehensive material. Type the address, please drive or line know how to ask for it and please ask the map to pinch the face position to apply M pressure terminal address to apply for and apply for-two applications for the application roadbed, then one call as if If so, as if the shape is as small as the use of a dagger in the body connection, connected to the knot. · Fangzhi. So. After 0 1 2 3 4 5 6 -------- one ' Packing --- Order (please read the precautions on the back before filling in this page) This paper "• Standard Use China® Jiahua (CNS> A4 present style (210X 297 degrees) Λ 8 Β8 C3 D8 Economy Department 4-Falcon Falcon bureau ^ Provincial Jeong Tu Cha Bian 51 51. Patent application Surround 1 1 | paste, and the conductive material used to connect the front address line to the front connection is silver. 1 1 1 77 • As in the procedure of patent application item 69 t where in step SS (b) 1 I 1 • The conductive paths through each pass are formed by the electrical cracks printed on the back of the substrate. 1 I-loop-shaped thick-film conductive paste. 1 Provided through the through holes in the base m. Back 1 | Surface I. All sides The front and back connection pads on the j are then burnt. 1 The rear connection pads are noted 1 I Italian 1 I The power supply is connected to the voltage drive circuit $ and the front connection pad provides electrical connection to the thing 1 1 step formed by ¥ r 1 (c) The rear address line, and the front address line in step (S) is connected to the front connection with a second conductive material. Ο Drive this page I 78 • If the procedure of patent application item 77 includes the base plaque and the rear position Address 1 1 The composite is formed of a material that can withstand a temperature of about 8 5 0 ¾. 1 1 79. For example, the procedure 1 of item 78 of the patent scope in which the basic certificate is usually 1 square in length, and where the through hole surrounds the surrounding of the substrate to form a t-connected base terminal at least on both sides. 〇1 I 80 * As in the procedure 1 of item 79 of the patent application scope, where the thick film in step SK (b) and 1 I (C) is a kind of fired kunbo lake, and step recognition (g) 1 i The second conductive material is silver Ο L · · Ί 8 1-as in the procedure of patent application item 77 »where the dielectric layer i 1 in step (d) is formed by depositing a ceramic material on the rear mold pole < Thick film 1 1 technique and then sintering method to form approximately greater than 1 · 0) < 1 09 V / n Dielectric strength of 1 1 Dielectric m »Make the dielectric constant ratio of dielectric material to 85 ary materials m greater than 1 1 50: 1, and the ratio of the thickness of the dielectric layer to the thickness of the rafter layer is about 20: 1 1 In the range of I to 500 1 t Dielectric layer formation — m attached surface I 1 1 1 3-1 1 1 This paper wave scale is applicable to the Chinese National Standard (CNS) Λ4 See a little (2 〖0Χ 297 公; t) Economy A8 Βδ C8 D8 ^ printed by the Consumer Cooperative of the Central Bureau of Standards of the Ministry, the patent application dry circumference is very smooth, so that the phosphor layer emits light uniformly under a predetermined excitation voltage 82. For example, the procedure of item 81 of the patent application scope, where the dielectric layer is at least Two layers are formed, a first dielectric layer is deposited on the back electrode by thick film technology and then sintered, and has the dielectric strength and dielectric constant as described in item δ 1 of the patent application scope, and a second dielectric layer is The lyogel technique is then deposited on the first dielectric layer by sintering to provide the surface adjacent to the phosphorus layer as described in item 81 of the patent application, and the first and second dielectric layers have The combined thickness described in item 81 of the patent scope. 83. As in the procedure of claim 82, where the first and second dielectric layers are formed of ferroelectric ceramic materials with a perovskite crystal structure, where the first dielectric layer provides a dielectric constant of at least 1000 and has a value of about 20 A thickness of -15 0 microns, the second dielectric layer provides a dielectric constant of at least 100 and has a thickness of about 2-10 microns. 8 4. As in the procedure of claim 82 or 83, where the first dielectric layer is formed by screen printing and sintering a thick film dielectric paste, and the second dielectric layer is formed by sintering and then sintering method . 85. The procedure of claim 84, wherein the first dielectric layer is formed of lead niobate, and the second dielectric layer is formed of lead zirconate titanate or lead lanthanum titanate. 8.6.—Procedure for scoring a plow with a laser in a plane with at least one overlying layer and at least one underlayer, including: applying a focused laser beam on the top layer of # Η, the laser光光 -1 4-This paper scale is applicable to China National Standard (CNS) A4 gauge (210X297mm) --------- t ------, order ------ ^ (please Read the precautions on the back first and then this page) (Applicable patent range Λ 3 Β8 C3 D3 See the midfield and the wave can be divided into layers and the group absorbs the S layer-outside the red layer M that is the upper cover In the Ming Dynasty or in each of the independent light transmissions, it is not possible to see the situation, but it can be received-the sequence of the direct sequence light is divided into the frequency spectrum. The frequency of the cover. The cover one. The term is less on the magnetic term 86 Layer ¾86 This is the thickest pad underneath the circumference is not surrounded by layers and wears a long and long range on the M, Yin, Polly quality and specialized: S to get eclipse beam, please apply for the burn Guang Shenchengyu. The ground is like a shot. If the beam is long. Lightning inside. Thick Τ α Σ > > The following teachings and terms are in the 9¾ series; C 8 low 〇0 degree of acceptance, the first degree of absorption, the thickness of the surrounding temperature range, the layered layer, the layered layer, the layered cover, the cover, the cover, the cover, the cover Dedicated to the upper and lower levels, please: II II II Η Shen M Shenzhong as above as its α α Τ 得. 得. Make the group of the species 1 should be covered with 0 neutral its lead, transfer sequence heat The higher item is 6 more, the 8th floor is lower, and the lower fan is more specialized. Please apply for the layer as above. Relatively, the picture is very 0. The dish is drawn in the menu. The engraved journey is £ 4. 9 of the engraved items are in the 9th place. In the surrounding area, Fan Lili's special director stated that the paper is transparent * The standard uses the Chinese a standard standard (CNS) '\ 4this grid (210χ 2 < Π 公 广;) (Please read the precautions on the back before filling in this I) 蠈 丁 ABCD 齐 郎中 矢 采 " 卜 tl- 太 0-Τ * · 6. The scope of patent application for mobile "H and laser Formed by one or both of the beams. 93. For example, the procedure of item 92 in the scope of the patent application, in which the day M is an electroluminescence with a disc layer sandwiched between front and back interleaved address complexes, the rear address complexes are formed on the rear substrate, and the phosphor layer is composed of one or more The tilted dielectric layer is separated from the rear address in a comprehensive way. The upper cover layer includes the front address layer and the pad layer formed with transparent conductive materials. The underlying layer contains one or more dielectric layers, and the electrode pattern is made of many transparent conductive materials. It consists of spaced address lines. 94. For example, in the procedure of claim 93, a part of the dielectric layer is directly burned, and phosphorus and transparent conductive materials are burned indirectly through its thickness. 95. As in the procedure of claim 94, the transparent conductive material is tin oxide. 96. As in the procedure of claim 95, where the dielectric layer contains: a planar layer formed of a sintered ceramic material, the dielectric layer provides a dielectric strength of greater than 1.0x 10e V / id and the dielectric material The ratio of the dielectric constant is about greater than 50: 1, the thickness of the dielectric layer is such that the thickness ratio of the dielectric layer to the phosphorous layer is in the range of about 20: 1 to 500: 1. And this dielectric layer has the surface of the tanned phosphor layer, Very smooth. Make the carotid layer glow uniformly under the given excitation voltage. 97. For example, the procedure of item 96 of the patent application scope, where Medium® forms at least two layers, and a first medium layer is formed on the back address. It has a size of approximately -1.芈 (CNS) Λ · 4 见 洛 （2 丨 0X 297 Gongqing） (please read the notes on the back before filling in this page) Binding Cooperation of the Falcon Bureau in the Ministry of Economic Affairs. Du Printing Β8 C3 D8 六, The patent application Fan Guo has a dielectric constant of 500 and a thickness in the range of about 10 to 300 cm, and a second dielectric layer is formed on the first dielectric layer and has the Tan is connected to the surface of the Yun layer. The first and second dielectric layers have a combined thickness of about 10 to 300 cm. 98. The procedure as claimed in item 97 of the patent scope, in which the first and second dielectric layers are formed of ferroelectric ceramic materials with a perovskite crystal structure, wherein the first dielectric layer provides a dielectric constant of at least 1800 and has a A thickness of 20-15 microns, and wherein the second dielectric layer provides a dielectric constant of at least 100 and has a thickness of about 2-10 microns. 99. As in the procedure of claim 93, where the first dielectric layer is printed with satin silk and sintered thick-film dielectric paste, and the second dielectric layer is formed by sintering method after the gel-tolerant technology. 100. As in the procedure of claim 99, the first dielectric layer is formed of lead niobate. The second dielectric layer is formed of lead titanate or lead lanthanum titanate. 101.-A procedure for forming a light-emitting stack K, βκ has a layer sandwiched between-before and after the address complex of the cross, the latter is formed on a rear base, and the chain is made of one or more mediums. The layer is separated from the rear address line and can be selectively separated from the front address complex. It includes the following steps: (a) The rear address complex is formed on the base, and the base has sufficient hardness to select ® K; U) Form a dielectric layer on the back address line: -1 7-^ — ^ 1-II _-_ ·· _ jn I--fl if ί 1— I i I n ^ u 1 ·· ml · — ^^ i (Please read the precautions on the back before filling in this page) This paper * standard is applicable to China Azuka Falcon (CNS) A4 (210X 297 official celebration) B3 C8 D8 VI. Patent application scope (C) in the medium Forming a layer on top of the layer; (d) forming a transparent dielectric layer on the disc layer; then (e) depositing a layer of transparent conductive material on the underlying layer before forming on the underlying ply layer or transparent dielectric layer The address is comprehensive, and the secondary address line is engraved with the focused laser beam, the wavelength of the laser beam is not absorbed by the transparent conductive material, the transparent medium layer and the phosphor layer However, it is absorbed by the lower dielectric layer, so that a part of the lower dielectric layer is directly eroded by the laser beam, while the upper phosphor layer, the g-selective transparent dielectric layer and the transparent conductive material are indirectly ablated through their thickness . 102. The procedure as claimed in item 101 of the patent application, in which the laser beam has a wavelength greater than about 400 nn. 103. As in the procedure of claim 102, where the composition and thickness of each layer becomes: Σ α Τ > Σ α Τ where: α = absorption of the lower dielectric layer α = absorption of the transparent layer T = lower Thickness of dielectric layer T = thickness of transparent layer. 104. For example, the procedure of claim 103, where the transparent conductive material is tin oxide. * 18- -------- i installed ------ ordered (please read the precautions on the back before filling in this page) The standard of this paper is the general Chinese National Falcon (CNS) A4 cash (210X male) Qing) AS B8 C8 D8 VI. Patent application scope 105. For example, the procedure of item 104 of the patent application scope, in which the dielectric layer below the phosphor layer contains: A planar layer is formed by a sintered ceramic material, which makes the dielectric layer of the dielectric The intensity is greater than 1.0X105 V / id and the ratio of the dielectric constant of the dielectric material to the disc is greater than 50: 1. The thickness of the dielectric layer makes the thickness ratio of the dielectric layer to the phosphor layer in the range of 20: 1 to 500: 1 And the medium. The layer has a surface connected to the disc layer, which is very smooth, making the base layer glow uniformly under the predetermined excitation pressure. 106. The procedure as claimed in item 105 of the patent application, in which the dielectric layer forms at least two layers, a first dielectric layer is formed on the back electrode and has a dielectric constant of approximately greater than 500, and a thickness of approximately 10 to 308 cm Within the scope, and a second dielectric layer is formed on the first medium ® and has a surface attached to phosphorus ® as described in item 105 of the patent application, the first and second dielectric layers have about 10 to 300 microns The combined thickness. 107. Such as the procedure of the 108th patent application, in which the first and second dielectric layers are formed of iron-yellow ceramic materials with a perovskite crystal structure, wherein the first dielectric layer provides a dielectric constant of at least 1000 and has The thickness is about 20-150 metre. And the second dielectric layer provides a dielectric constant of at least 100 and has a thickness of about 2-10 metre. 108. For example, the procedure of item 107 of the patent application scope. Among them, the first medium ® is screen printed with ® and formed by a thick lake. The second medium layer is formed by the sintering method using the coagulation technique. -1 9-(Please discuss the matters on the back of the cabinet first and fill out the page). Use the paper method and use the 21 Chinese ladders (CNS) A4 now (; Π0 × 297 mm) A3 B8 C8 D8 Ministry of Economic Affairs Zhong Zu Tu Falcon Ma Bei Er Xiao fb Zhatu Pa VI. Application for a patent Fan Garden 1 1 I 109. If the application for patent scope item 103 < where the first dielectric layer I! 1 is sufficient for lead niobate formation »and the second dielectric layer is based on chromate titanate bell or zirconium 1 I please 1 lead lanthanum titanate to form α first 1 read I 110.-Seed Luminous day Η, including: Read back I £ ri 1 of the rear matrix 1 1 Italian 1 I — group of parallel post-address lines on the rear base 1 Matter 1 I 1 1 medium on the back address line m * fill in Base layer on top of the media layer Page 1 One m selective transparent media layer on the layer 1 1 A group of transparent front site summaries that are spaced in parallel above the layer Pixels are formed at the intersections »The front address line is separated by the groove of the laser shovel 9 The It extends through the I Λ m below it and enters * but does not pass through the underlying dielectric layer 〇1 1 111. As in the application of the IS patent scope item 1 1Θ of the electroluminescent day Η 9 where in the last 1 | address junction The medium m contains 1 1 a planar layer is formed by a ceramic material of the junction »Make the medium layer to provide about greater than 1.0 0 > < The dielectric strength of 10 ° V / 01 and the ratio of the dielectric constant of the dielectric material to 85 1 | are approximately greater than 59 1, the thickness of the dielectric layer is such that the thickness of the dielectric layer 1 I IS to the layer fch is approximately 20: 1 to 50 In the range of 0: 1, 1 1 and the dielectric layer has a surface with a t-joint m, which is very smooth. • Make the dish m emit light uniformly under the predetermined excitation electric m of 1 1 〇 I I 112. If applying for patent scope item 11 Luminescence β Η »where the medium 1 I 20 — 1 1 [1 paper-based standard used in 89 ® family 楗 楼 (CNS) A4 present grid (2 丨 OX 297 degrees) Ministry of Economic Affairs Central Bureau of Standards only for consumer cooperation ♦ Du Yinai A3 B8 C3 D3 6. Apply for a patent Fan Guo layer to form at least two layers, a first dielectric layer is formed on the back electrode and has a dielectric constant greater than 500 and a thickness in the range of approximately 10 to 300 chem, And a second dielectric layer is formed on the first dielectric layer and has a surface connected to the moraine layer as described in item 105 of the patent application range. The first and second dielectric layers have about 10 to 300 Combined thickness meter. 113. As claimed in item 112 of the patent application, the luminescent stack M, in which the first and second dielectric layers are formed of a ceramic ceramic material with a crystal structure of perovskite, wherein the first dielectric layer provides a dielectric constant of at least 1000 and Has a thickness of about 20-150 microns, and wherein the second medium ® provides a dielectric constant of at least 100 and has a thickness of about 2-10 cm. 114. For example, the patent application No. 11 3 of the electroluminescent day H, in which the first dielectric layer is formed by screen printing and sintering a thick film dielectric, and the second dielectric layer is sintered by the coagulation technology法 Formation. 115. For the electroluminescent stack K according to item 114 of the patent application, the first dielectric layer is formed of lead niobate, and the second dielectric layer is formed of lead titanate or lead lanthanum titanate. 116. For the electroluminescent stack H according to item 110 of the patent application, where the dielectric layer is in contact with ®. -21-This paper uses the Chinese National Standard (CNS) ABJUi · (210Χ 297) (Please read the precautions on the back before filling out this page) Buding