TW293902B - - Google Patents

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TW293902B
TW293902B TW084112672A TW84112672A TW293902B TW 293902 B TW293902 B TW 293902B TW 084112672 A TW084112672 A TW 084112672A TW 84112672 A TW84112672 A TW 84112672A TW 293902 B TW293902 B TW 293902B
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pixel
imaging
patent application
item
imaging device
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TW084112672A
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Chinese (zh)
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Simage Oy
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01TMEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16Measuring radiation intensity
    • G01T1/24Measuring radiation intensity with semiconductor detectors
    • G01T1/243Modular detectors, e.g. arrays formed from self contained units
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01TMEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16Measuring radiation intensity
    • G01T1/24Measuring radiation intensity with semiconductor detectors
    • G01T1/247Detector read-out circuitry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01TMEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/29Measurement performed on radiation beams, e.g. position or section of the beam; Measurement of spatial distribution of radiation
    • G01T1/2914Measurement of spatial distribution of radiation
    • G01T1/2964Scanners
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14665Imagers using a photoconductor layer
    • H01L27/14676X-ray, gamma-ray or corpuscular radiation imagers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/148Charge coupled imagers
    • H01L27/14831Area CCD imagers
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/40Extracting pixel data from image sensors by controlling scanning circuits, e.g. by modifying the number of pixels sampled or to be sampled
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/71Charge-coupled device [CCD] sensors; Charge-transfer registers specially adapted for CCD sensors
    • H04N25/74Circuitry for scanning or addressing the pixel array
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N5/00Details of television systems
    • H04N5/30Transforming light or analogous information into electric information
    • H04N5/32Transforming X-rays
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N5/00Details of television systems
    • H04N5/30Transforming light or analogous information into electric information
    • H04N5/32Transforming X-rays
    • H04N5/321Transforming X-rays with video transmission of fluoroscopic images
    • H04N5/325Image enhancement, e.g. by subtraction techniques using polyenergetic X-rays

Description

經濟部中央標準局貝工消费合作社印裝 ^93902 Α7 Β7 五、發明说明(1 ) 1.發明背景: a. 發明領域: 本發明係有關成像裝置、糸統及方法,並且特別有關’ 一棰用做圖像檢測器之半導體像素成像裝置,Μ及有關利 用該像素半導體成像装置之成像条統與方法。 b. 先前技S之描述: 在先前技藝中已知兩棰基本型式之半導體像素裝置: 1>霣荷播合檢測器,亦習知為霣荷耩合装置(Charge Coupled Devices,下文簡稱CCD>及2)脈衝計數半導髏像素裝置。 吾人使用CCDs業已達15年,而大致用做圈像檢测器( 例如,可看1981年第二販之S.M Sze “半導醱裝置之物理 學”)。賁際上所有可用之CCDs皆是用矽技術製成。CCD 之蓮作原理是基於一項事實,即當經由一霄極柵門施予適 當電壓時,大董之矽原子即變成用盡多數載流子(例如空 穴)之狀態,並且產生可聚集II子之區域(耗盡區)。這· 耗盡區總計逹到一勢阱,而與所施加霉壓形成某一深度比 例。隨後可儲存在CCD像素中之最大霄荷置,係有賴於在 霣極下方之面積、所施加之電壓、來自大塊矽原子之暗霣 流或漏霣溁、及該II極與大塊矽間之氣化物層厚度,而該 暗霉流係持續充滿該勢阱。這些因素即決定該有效之CCD 霣荷儲存能力。 當電子聚積在該勢阱中且需加Μ讀出時*即脈動位於 各霣極柵門之電勢,並使在一柵極下所儲存之«子包開始 Μ時鐘脈衝方式朝向下一柵極等。該霣子包絕不會離開矽 本紙張尺度適用中國國家榡準(CNS ) A4規格(210X297公釐) 5 1^. 1 I裝 —訂 ^旅 (請先閲讀背面之注意事項再填寫本頁)Printed by the Beigong Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs ^ 93902 Α7 Β7 5. Description of the invention (1) 1. Background of the invention: a. Field of the invention: The present invention relates to imaging devices, systems and methods, and is particularly relevant Semiconductor pixel imaging device used as image detector, M and related imaging system and method using the pixel semiconductor imaging device. b. Description of the prior art: In the prior art, two basic types of semiconductor pixel devices are known: 1 > 霣 荷 合 合 器, also known as 霣 荷 合 合 装置 (Charge Coupled Devices, hereinafter referred to as CCD > And 2) Pulse counting semi-conducting skull pixel device. I have been using CCDs for 15 years, and they have generally been used as circle image detectors (for example, see S.M Sze "Physics of Semiconducting Device" in 1981, the second vendor.) All available CCDs are made of silicon technology. The principle of the CCD lotus is based on the fact that when an appropriate voltage is applied through the gate of the gate, the silicon atoms of the Dong Dong become in a state of exhausting the majority of carriers (such as holes), and produce aggregates Region II (depletion zone). This depletion region reaches a potential well and forms a certain depth ratio with the applied mold pressure. The maximum load that can be stored in the CCD pixel later depends on the area under the pole, the applied voltage, the dark flow or leakage from the bulk silicon atoms, and the II pole and the bulk silicon The thickness of the gasification layer in between, and the dark mold stream continues to fill the potential well. These factors determine the effective CCD load storage capacity. When electrons accumulate in the potential well and need to be read with M *, that is, pulsate the electric potential of each gate gate, and make the sub-packet stored under one gate start to clock towards the next gate Wait. The engraved bag will never leave the silicon paper. The standard of China National Standard (CNS) A4 (210X297mm) is applicable. 5 1 ^. 1 I Packing—Booking ^ Travel (please read the precautions on the back before filling this page )

A 經濟部中央標準局貝工消費合作社印裝 五、發明説明(2 ) 基片,並且為了讀取在某一像素位置之儲存霉荷,必須Μ 連繙之方式先讀出在其前方之所有其它像素内容。在逭過 程期間,沒有其它電荷可再聚集,因道可能摧毁每一像素 之電荷含量資訊,且随後其可能破壊彩像解晰度及對比。 因此在讓出期間,該影像檢測器是沒有作用的。上述製程 每値像素至少需要3掴柵極。 CCDs可用於偵測、聚集與讀出由光及/或輻射線所產 生之霄荷,或可只用做一讀出装置,俾能讀取另一偵測機 構(例如光電二極管)所產生之霣荷。當用於偵測射入之 輻射線及讀取訊號時* CCDs具有一棰低效率之附加限制。 尤其是在高能輻射中(如超過若干仟霣子伏特之X射 線),CCDs是與光變換螢幕一起使用,該等螢幕可將X射 線轉變成可見光,在此CCD是較爲感光的。然而,光之擴 散將使解晰度及對比變壞。 因此乃以下列方式蓮作一艏CCD: 1〉將電荷聚集在由一施加霉壓所產生之耗盡區内。對 於每一個像素,該耗盡區具有一勢阱形狀,並將霣子限制 在電極柵門下方,Μ保持位於該大塊矽體積内側。 2〉脈動各電壓至各霣極柵門,俥使每一値霣荷包能Μ 時鐘脈衝方式送至對底下一値像素之矽體内。該霄荷包總 是保留在矽基片内側,並以時鐘脈衝方式逐一經遇各像素 至一共同輪出裝置。在此過程期間不可聚集額外之《荷。 上述之結果是該CCD係爲一棰具有兩項實質限制之裝 置: 本紙張又度逋用中國國家橾準(CNS ) A4規格(2丨0x297公釐) 6 (請先閲讀背面之注意事項再填寫本頁) -裝· 訂 五、發明 A7 B7 •明説明(3 ) 經濟部中央揉準局負工消费合作社印製 1) 有妥協之動態範圍。通常一値CCD可聚集100,000至 700,000個霣子。有限制動態範圍之理由是因為該矽讎内 之暗電流將填滿該勢阱,而聚集電荷之電極柵門表面最多 佔總像素面積之三分之一(因此不會利用該像素之全部重 荷儲存能力),並且與該儲存能力亦有關之氧化物層厚度 必須加厚,Μ忍受該讀出所需之急劇霣睡脈衝(注意:該 氧化層愈厚,則該勢阱中可儲存之電荷愈少)。 2) 長惰性時間。該讀取所需之惰性時間相當久。在許 多案例中,這狀況阻礙CCDs用於快速之動態多格影像聚集 〇 在專利申請案第GB-A-2249430與GB-A-2262383號中包 括兩個使用CCDs之糸统範例。該二申請案係有關克服該等 CCD固有限制之方法。 半導體像素探測器包括一設有多値電極之半導體基片 ,該等電極可施加一耗盡電壓至每一像素,並且界定一電 荷聚集體。當吸收一光子或«離性輻射横越該半導髏基片 之耗盡區時,用簡單之缓衝霣路即可讀出電子訊號。該等 缓衝電路可位於相同基片上(比較於ΕΡ-Α-0,287, 197號專 利)如同該等電荷聚集體,或可位於一分開之基片上(比 較於EP-A-0,571,135號專利),該分開基片係機械性地接 合至一設有該等電荷聚集醴之基片,例如,配合習知之碰 撞接合技術(碰撞接合是一種已知逢10年或更久之技術) 。這些像素探測器係Μ脈衝模式運作。可藉箸連繙讀出各 像素或在一夠快速率下相繼讀出各像素,Μ實施一棰脈衝 本紙張尺度適用中國國家橾準(CNS ) A4規格(210 X 297公嫠〉 ------^---I 裝------訂------1 線 (請先閲讀背面之注意事項再填寫本荑) 經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明(4 ) 計數棋式或簡單之脈衝成像。 在任一系例中,每次因一高能射線或光線而存有一霣 荷時,其目欞即是将它讀出及處理此資訊。該等像素探測 器可減少所需之讀出速度*因為其有一較高之整流子片及 較多之平行讀出通道。然而,它們不能對應於高密度之臁 用,因為該等讀出《子將溢流或計數能力將飽和*而因此 損害該影像對比。在某些此等裝置中*同時進入之射《將 造成可疑及“重像”撞擊,逭些將不能解析及使解晰度變 差。雖然埴些装置可直接探测該進入射線,由於是基於單 脈衝計數棋式之操作及基於各離散酤計數之成像,它們具 有多項限制。 吾人將由上述發現所有目前可用之裝置具有不能解析 之各項限制。尤其是CCDs能使來自相繼撞擊之«荷聚集, 但只能聚集至該矽基片内铒一勢阱中之可能有限程度,逭 實質上邸限制其動態範園。亦邸因為該霣荷聚集方法,乃 Μ時鐘脈衝方式將像素霣荷含量送至鄭接之像素雔存單元 (逭通常是相同之矽基片),而Μ—時序棋式產生«荷之 讓出作用。因此,非直到所有像素如一串時序般讀出後, 一 CCD不能聚集一新的彩像楨格,因為額外進入之射線及 /或光線在讀出遇程期間不能Μ—對一對對*之方式記錄 於一像素位置。因此在成像期間,有限之動態範圔及長惰 性時間是其二主要CCD限制。 另一方面某些半導鼸像素装置黎已提出在每次探拥到 一次撞擊時即直接讀取該像素内容。逭些裝置是在單脈衝 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) -8 _ d ^ — I —^ 裝 ~~ 訂 n f 成 (請先閲讀背面之注意事項再填寫本f ) 經濟部中央橾準局負工消費合作社印製 扣的〇2 Α7· _ _Β7_ 五、發明説明(5 ) 計數模式上蓮作,並且在高計數速率下因飽和問題而受害 。此等傳統式單擊計數裝置具有一很小之動態範圍。 2.發明概論: 據此,本發明之目的是提供基於不同方法之一成像裝 置,該方法能減輕及/或解決先前技蕤之各項問題。 根據本發明之一論點,其設有用於成像輻射線之成像 装置,該成像裝置包括一列含有半導體基片之像素單元, 該基片具有一陣列可回應進入輻射線而產生電荷之像素檢 波器,及一對應陣列之像素電路,每一像素霣路皆聯結一 値別像素檢波器,用K聚集來自該像素檢波器上進入輻射 線之電荷,該等像素電路皆可値別编址,並包括電路圖, 用以聚集來自各個像素檢波器上連續輻射線撞擊之霣荷。 本發明提供一種成像裝置,其可描述為一種主動像素 半導鼷成像裝置(Active-pixel Semiconductor Imaging Device,下文簡稱AS ID)。根據本發明之成像裝置實施例 特別適用於高能輻射成像,諸如X-射線,/3 -射線及α -射 線實時成像。本發明亦可應用於其它輻射線型式之成像, 例如包括可見光。 在輻照期間,一個AS ID能爲各値像素積極地聚集霄荷 。其直接在該半導體基片之一像素單元檢波器上檢出入射 線,並且在一對應該像素單元檢波器之有源霣路中聚集電 荷(藉著直接將該電荷聚集成各種罨荷值,或将其轉換成 一霉壓或電流,且聚集最終之電壓或電流)。藉箸使每一 像素之有源電路皆能獨立编址,亦即與其它所有像素«路 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) J . ^ I裝 訂 {银 (請先閱讀背面之注意事項再填寫本頁) A7 B7 五、 經濟部中夬棣準局員工消費合作社印製 S^S9〇2 發明説明(6 ) 皆無關(例如,Μ隨機或逐次順序),則可在鞴照期間或 之後任何時間讀出所儲存之霄荷。 因此在本發明之一實施例中*霄荷係聚集在笛荷累集 電路中(例如集成電晶體或集成電容器之柵極)。其不需 及沒有使用如CCD範例中之耗耋層及勢阱。可最佳化一S 荷健存裝置,諸如一場效電晶睡(Field Effect Transistor ,下文簡稱FET)或電容器,Μ便實質上用最小厚度之氧化 物層覆蓋所有像素電路面積。這二因素使該霣荷儲存能力 變得最大,例如比CCD多過二级量值。再者,每一像素不 會干擾其鄰接之像素。各像素之獨立進出可呈現較快之動 態影像幀格聚集,而這在CCDs是不可能的。 本發明之一實施例亦可克服在离速計數時各脈衡計數 像素装置之先前限制,其中可在讀出之前聚集數百或數千 値脈衝。因此可減少讀出通道之數目而不箱妥協装置之性 能。 該有源電路最好是位於該像素檢波器附近(不論是與 含有該等像素單元檢波器之半導體基片一體成形,或是位 於其所接合之一基片上),並且具有一充分之動態範圍, 以便聚集在該對應像素檢波器上之數百或數千次輻射捶擊 所產生之對應電荷。 該有源像素電路之讀出可設計成非常快速,並與所有 其它像素霣路無關,因此實際上沒有空載時間,以致該有 源霣路及對應之像素單元檢波器可立即準備繼繙聚集輻射 撞擊。 本紙張尺度適用中國國家標準(CNS ) A4規格(210 X 297公釐) ----?---:---^丨裝------訂-----人線 (請先閱讀背面之注意事項再填寫本頁) 10A Printed by the Beigong Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economy V. Description of the invention (2) The substrate, and in order to read the stored mold lotus at a certain pixel location, all the in front of it must be read out in a continuous flip Other pixel content. During the course of the process, no other charge can be accumulated, because the channel may destroy the charge content information of each pixel, and then it may break the resolution and contrast of the color image. Therefore, during the yield period, the image detector has no effect. The above process requires at least 3 slap gates per pixel. CCDs can be used to detect, focus and read out the light load generated by light and / or radiation, or can be used as a read-out device only to read the light generated by another detection mechanism (such as a photodiode) Yuan He. When used to detect incoming radiation and read signals * CCDs have an additional limitation of low efficiency. Especially in high-energy radiation (such as X-rays over several thousand volts), CCDs are used with light-converting screens, which can convert X-rays into visible light, where the CCD is more sensitive. However, the spread of light will deteriorate the resolution and contrast. Therefore, the lotus is used as a bow CCD in the following manner: 1> The charge is concentrated in the depletion zone generated by an applied mold pressure. For each pixel, the depletion region has the shape of a well and confines the beneath the electrode gate, and M remains inside the bulk silicon volume. 2> Pulse each voltage to each gate gate, so that each value packet can be sent to the silicon body of the next pixel by M clock pulse. The small purse is always kept on the inside of the silicon substrate, and encounters each pixel one by one in a clock pulse to a common round-out device. During this process no additional "Dutch" can be gathered. The above result is that the CCD is a device with two substantial restrictions: This paper uses the Chinese National Standard (CNS) A4 specification (2 丨 0x297mm) 6 (Please read the notes on the back first (Fill in this page)-Installation · Order 5. Invention A7 B7 • Explained (3) Printed by the Ministry of Economic Affairs Central Bureau of Accreditation Consumer Cooperative 1) There is a dynamic range of compromise. Generally, a single CCD can gather 100,000 to 700,000 children. The reason for limiting the dynamic range is that the dark current in the silicon gate will fill the potential well, and the surface of the electrode gate that accumulates charge accounts for up to one-third of the total pixel area (thus not using the full load of the pixel Storage capacity), and the thickness of the oxide layer that is also related to the storage capacity must be thickened, M endures the sharp drowsy pulse required for the readout (note: the thicker the oxide layer, the charge that can be stored in the potential well Less). 2) Long inert time. The inert time required for this reading is quite long. In many cases, this situation has prevented CCDs from being used for rapid dynamic multi-frame image aggregation. Included in patent applications GB-A-2249430 and GB-A-2262383 are two examples of the use of CCDs. The two applications are about ways to overcome the inherent limitations of these CCDs. The semiconductor pixel detector includes a semiconductor substrate provided with multiple electrodes, which can apply a depletion voltage to each pixel and define a charge aggregate. When absorbing a photon or «ionizing radiation across the depletion region of the semi-conductor skull substrate, the electronic signal can be read out with a simple buffer. The buffer circuits may be located on the same substrate (compare to EP-A-0,287,197) as the charge aggregates, or may be located on a separate substrate (compare to EP-A-0,571,135), The separate substrate is mechanically bonded to a substrate provided with such charge accumulation, for example, in conjunction with the conventional collision bonding technology (collision bonding is a technology known every 10 years or more). These pixel detectors operate in M pulse mode. The pixels can be read out continuously or successively at a sufficiently fast rate. ΜImplement a pulse of this paper. The paper standard is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 public daughter) --- --- ^ --- I installed ------ order ------ 1 line (please read the precautions on the back before filling in this book) A7 B7 printed by the employee consumer cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs 2. Description of the invention (4) Counting chess or simple pulse imaging. In any system, every time there is an energetic charge due to a high-energy ray or light, its eye is to read it out and process this information. These pixel detectors can reduce the required readout speed * because they have a higher commutator slice and more parallel readout channels. However, they cannot correspond to the use of high density, because these readouts The overflow or counting capacity will saturate * and therefore damage the contrast of the image. In some of these devices * the simultaneous shot "will cause a suspicious and" ghost "impact, some will not be resolved and the resolution will be reduced Worse. Although some devices can directly detect the incoming ray, because it is based on single pulse counting The operation and imaging based on discrete counts have many limitations. We will discover from the above that all currently available devices have various limitations that cannot be resolved. Especially CCDs can gather «charges from successive impacts, but only gather To the limited extent possible in the erbium potential well in the silicon substrate, Yau essentially limits its dynamic range. It is also due to the method of aggregation of the charge, that is, the M clock pulse method sends the content of the pixel charge to Zheng Jiezhi The pixel storage unit (the same is usually the same silicon substrate), and the M-timing chess pattern produces a «give up effect. Therefore, until all pixels are read out like a sequence of timing, a CCD cannot gather a new one Color image frame, because the additional rays and / or rays cannot be recorded at a pixel position during the readout process—pair to pair *. Therefore, during imaging, limited dynamic range and long inert time It is the second major CCD limitation. On the other hand, some semiconducting pixel device Li has proposed to directly read the content of the pixel every time a collision is detected. Some devices are in single pulse The size of this paper is in accordance with Chinese National Standard (CNS) Α4 specification (210X 297mm) -8 _ d ^ — I — ^ Pack ~~ Order nf (please read the precautions on the back and fill in this f) Central Ministry of Economic Affairs The quasi-bureau consumer labor cooperative prints the deduction 〇2 Α7 · _ Β7_ 5. Description of the invention (5) The counting mode is a lotus, and it is damaged due to saturation problems at a high counting rate. These traditional one-click counting devices have A very small dynamic range. 2. Introduction to the invention: Accordingly, the object of the present invention is to provide an imaging device based on different methods that can alleviate and / or solve the problems of the prior art. According to one of the inventions The point is that it is provided with an imaging device for imaging radiation. The imaging device includes a row of pixel units containing a semiconductor substrate, the substrate has an array of pixel detectors that can generate charge in response to entering the radiation, and a corresponding array of Pixel circuits, each pixel circuit is connected to a different pixel detector, using K to accumulate the charge from the pixel detector into the radiation line, these pixel circuits can be addressed separately Comprising a circuit diagram for the striking accumulation of charge from a rainstorm successive radiation detector pixels on each line. The present invention provides an imaging device, which can be described as an active pixel semiconductor imaging device (Active-pixel Semiconductor Imaging Device, hereinafter referred to as AS ID). Embodiments of the imaging device according to the invention are particularly suitable for high-energy radiation imaging, such as X-ray, / 3-ray and α-ray real-time imaging. The invention can also be applied to imaging of other radiation patterns, including visible light, for example. During the irradiation, an AS ID can actively gather small lotus for each pixel. It detects incoming rays directly on one of the pixel unit detectors of the semiconductor substrate, and collects charges in an active pair of paths corresponding to the pixel unit detectors (by directly collecting this charge into various charge values, Or convert it to a mold pressure or current, and gather the final voltage or current). With the help of the chopsticks, the active circuit of each pixel can be addressed independently, that is, with all other pixels «Luben paper standard is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) J. ^ I binding {silver (please (Read the notes on the back before filling in this page) A7 B7 5. The S ^ S9〇2 invention description (6) printed by the Employee Consumer Cooperative of the Ministry of Economic Affairs of the Ministry of Economic Affairs (6) is irrelevant (for example, Μ random or sequential order), then The stored Xiao He can be read at any time during or after Nao Zhao. Therefore, in one embodiment of the present invention, the charge is concentrated in the whistle accumulation circuit (such as the gate of an integrated transistor or an integrated capacitor). It does not require and does not use depletion layers and potential wells as in the CCD paradigm. It is possible to optimize an S-charge storage device, such as a Field Effect Transistor (hereinafter referred to as FET) or a capacitor, so that substantially all the pixel circuit area is covered with the oxide layer of the minimum thickness. These two factors maximize the storage capacity of the load, for example, it is more than two-level magnitude than the CCD. Furthermore, each pixel does not interfere with its neighboring pixels. The independent entry and exit of each pixel can present a faster dynamic image frame aggregation, which is not possible with CCDs. An embodiment of the present invention can also overcome the previous limitation of each pulse-counting pixel device during off-speed counting, where hundreds or thousands of high-value pulses can be gathered before reading. Therefore, the number of read channels can be reduced without compromising the performance of the device. The active circuit is preferably located near the pixel detector (whether it is integrally formed with the semiconductor substrate containing the pixel unit detector or on a substrate to which it is bonded), and has a sufficient dynamic range , So as to gather the corresponding charge generated by hundreds or thousands of radiation strikes on the corresponding pixel detector. The readout of the active pixel circuit can be designed to be very fast and has nothing to do with all other pixels, so there is actually no dead time, so that the active pixel and the corresponding pixel unit detector can be immediately ready to continue to turn over and gather Radiation impact. This paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ----? ---: --- ^ 丨 installed ------ order ----- person line (please (Read the notes on the back before filling this page) 10

經濟部中央標準局貝工消費合作社印装 五、發明説明(7 ) 在輻射期間,每一檢出元件及相聯之有源電路構成一 可隨意進出、能聚集電荷之動態有源成像像素(不論是直 接用做一m荷或一電壓或對等電流),並且在輻照期間或 之後能讓出。每一像素之内容隨後並未相繼送到鄰近之像 素,而是與其它所有像素無關地讓出。可最佳化該讀出資 料之讀取速度及平行或連續訊號處理之層级,μ配合其輻 射強度及可用於聚集一影像幀格之時間。 據此,配合本發明之一成像装置可由連鳙輻射或光線 撞擊聚集電荷,逭是利用一轚晶髓及/或一電容器之大幅 動態範匾,該電晶體及/或霄容器係以一對一之對應方式 設有一檢出像素單元。有鑒於CCDs是利用一矽基片內侧之 耗盡層儲存電荷於一勢阱内,一ASI D則可在一電晶體及/ 或電容器之柵極上聚集霣荷。因此一 ASID將具有比CCD多 達二级量值之動態範圍。在影像楨格聚集期間,相同之電 荷聚集像素電路元件亦允許每一値聚集電荷值之讀出,尤 其是沒有空載時間,而該電荷值係與該檢出像素元件呈一 對一之關係。一 AS ID亦可減少傳統半導體像素装置之限制 ,該等傳統装置係Μ脈衝計數模式操作,因其係Μ正比於 總聚集電荷之方式實施成像作用,而非正比於輻射撞擊數 。雖然傳統之脈衝計數像素裝置在高速計數時受困於飽和 問題AS ID卻可在讀出之前聚集數百或數千之撞擊。較 長之電荷聚集時段(可能由數撤秒至約1秒)可減少重置 該等像素霄路之效醮。因此毎一像素霣路之全部惰性時間 只佔該電荷聚集時間(或活性時間)之一極小部份。 本紙張尺度適用中國國家標孪(CNS )八4規格(210X297公釐) 11 ---j-------丨裝------訂-----1 银 (請先閱讀背面之注意^項再填寫本頁) 經濟部中央橾準局員工消費合作社印製 A7 _ B7 五、發明説明(8 ) 吾人發現本發明可特別應用於高強度之成像用途。藉 著本發明之各項實施例即可克服先前像素檢波器之所有問 題,如不實際之讀出速度、不明確與“重像”撞擊,Μ及 CCD裝置之低效率、低動態範圍與高惰性時間之問題。然 而,吾人將發現本發明並未受限於高能及高強度應用,而 本發明之各實施例亦可在較低能醮用(例如在紫外線、可 見光或紅外線波長中)及低強度應用(在天文學中)發現 其用途。 每一像素電路最好包括一聚集電荷用之電荷儲存装置 ,例如一電容器及/或一電晶體。在本發明之一較佳實施 例中,電荷係聚集在一FET之柵極上,其最好形成一對FET 之一 *而連接當做一柵地-陰地放大器之放大級。 每一像素霣路最好亦包括用於選擇性重置該電荷儲存 裝置之«路設計,例如在讀出任何儲存於其上之霣荷後。 本發明之一較佳實施例包括第一與苐二値FET開關,第一 個FET開關偽回應於一有作用之訊號,而將該霣荷儲存装 置連接至一蝓出線路,用Μ蠄出所聚集之霄荷;其第二艏 FET開關係回應於一重置訊號,以使該電荷儲存装置接地 而重置該電荷儲存装置。 在某些應用中,例如7攝影機及核子翳學,該像素尺 寸可Μ是1«米寬之等级或更少,最好是約350撤米宽。 在其它應用中*該像素箪元尺寸可Μ是約150撤米寬 或更小,較好是約50撤米寬或更小,且更好是約10撤米宽 ,而具有一在200撤米與3毫米間之基片厚度。 本紙張尺度適用中國國家標準(CNS > Α4規格(2丨ΟX 297公釐) -12- ; 5 J ·裝 —~訂 入 線 (請先閱讀背面之注意事項再填寫本頁) 經濟部中央標準局貝工消費合作社印製 29^9〇2 at Β7 五、發明説明(9 ) 該等像素電路可與該基片一體成形,並與對應之像素 檢波器齊平。另一種選擇是,可在另一基片中製成該等像 素電路,此另一基片係併入該等像素轚路而播合至併入該 等像素檢波器之基片,其每一像素電路係對齊及耦合至對 應之像素檢波器。 在本發明之特定實施例中,該陣列包括單行之像素檢 波器及相聯之像素電路而形成一狹缝型成像装置,或包括 多行像素檢波器及相聯之像素霣路而形成一凹槽型成像装 置。在此一實施例中,各個像素檢波器所用之像素霣路亦 可播向地排列,而鄰接於對應之像素檢波器。 用該成像裝置之一成像条統包括使用該成像装置之控 制電子學,其包括對個別像素霣路編址用之编址邏輯線路 ,而用於由該像素電路讀出所聚集之霣荷及S擇性地重置 該像素電路。該编址邏輯線路最好包括用Μ連接該等像素 電路之_出線路至該成像裝置輸出點之機構、用Μ供應讀 出起動訊號至該等像素電路讀出起動輪入點之機構、及用 以供應重置訊號至該等像素霣路重置_入點之機構。 連接輪出線路用之機構可包括一移位寄存器或一計數 器,用Μ對各列像素相繼連接該等像素霣路之_出線路至 該成像裝置之輪出端。同理,供應讀出起動訊號用之機構 可包括一移位寄存器或一計數器,用Μ對各行像素連繙供 應讀出起動訊號至該等像素霄路之讀出起動輪入端,及/ 或供應重置訊號用之機構可包括一移位寄存器或一計數器 ,用Μ對各行像素連續供應重置訊號至該等像素電路之重 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 13 ----5---;---f ·裝------訂------^踩 (請先閲讀背面之注意事項再填寫本頁) 經濟部中央棣準局負工消費合作社印製 A7 B7 五、發明説明(10 ) 置鑰入端。 因此,在本發明之一較佳實施例中,該編址邏輯線路 包括第一、第二及第三値移位寄存器,第一艏移位寄存器 係用Μ對各列像素相雄連接該等像素電路之輪出線路至該 成像裝置之輪出端,第二値移位寄存器係用以對各行像素 連績供應讀取起動訊號至各像素霄路之讀取起動輪入端, 而第三個移位寄存器係用Μ對各行像素連繙供應重置訊號 至各像素電路之重置輸入端。在另一較佳實施例中,可用 一計數器實施相同之控制訊號*該計數器能產生行與列之 位址,而這些位址皆可解碼成輪出選擇、重置及讀取起動 訊號。該控制霣子學可包括一模擬一數字變換器(Analogue to Digital Converter,下文箄稱ADC),用以將來自一像 素電路之霣荷讀數轉變成一數位電荷值。 至少局部之控制電子設計係可併入該半導體基片,而 該等像素霄路即形成於該基片上。 該成像条統最好包括一連接至該控制電子設計之彩像 處理器,用以處理來自各個像素電路之數位霄荷值,俥能 在一顯示器裝置上形成一彩像而顯示之。 爲能最佳化所捕捉彩像之顯示,該處理器將決定用以 顯示像素之最大與最小電荷值,而指定極限灰度或彩色極 值给最大與最小之18荷值,且根據一滑尺分配灰度或色值 至一値別像素|該滑尺係在該二極值之間,並視該像素之 ®荷值而定。 最好根據下列公式分配該等灰度或色值: 本紙張认適用中國國家標率(CNS ) A4a格(2丨Qx 297公釐) —η - 1^1 4 I H^I HI >«l^i In ·1 I I In m. HI --SJ1^1 ^1.^1 - - -ιί 1^1 y-(請先閱讀背面之注意事項再填寫本頁) B7 經濟部中央標準局負工消費合作社印製 五、發明説明(11 (像素i之電荷值-最小電荷值) 像素i之灰度值=最小灰度值+-x(最大灰度值-最小灰度值〉 (最大電荷值-最小電荷值) 在本發明之一較佳實施例中,一成像条统包括多數如 上面所定義之成像裝置,而Μ鋪瓦般連接在一起,俥形成 一感光崁鑲幕面。這能製造大面積之成像裝置,而不會有 通常在很大表面積集成裝置中逋遇之屈服問題。該感光崁 鑲幕面可包括多列瓦面成像装置,該等相鄰列之成像装置 係在該列方向中偏置。該成像条統最好包括跨入或移去該 成像裝置及/或一欲成像物體之機構,以便在一整値影像 區上方聚集一彩像。 在一實施例中,該成像糸統包括二成像表面,每一表 面包括各成像裝置之一感光崁鑲幕两,該二成像表面實質 上係彼此平行地排列著,且彼此隔開*而有一欲成像之物 體放在該二表面間,該二感光崁鑲幕面係彼此横向地偏置 * Μ實質上给予該物體之完整成像。這實質上在某些應用 中已能完整成像,而不需該等成像平面所用之平移機構。 多數瓦面成像裝置之各個影像輪出最好是連接至一共 用之多路調制器,該多路調制器之_出端係連接至一共同 之ADC。另一種選擇是,多數瓦面成像裝置可先知雛菊花 環般連結,並且隨後轉換至一共用ADC。亦可對各個像素 電路加Μ纗址,用以在一速率下讀取所聚集之電荷,俾能 最佳化一可將類比聚集鬣荷值轉換成數位值之ADC解晰度 。逭些方法可提供設計镡性,Μ便在價格(愈多多路傳輸 ,則愈少ADCs)及影像對比(愈少多路傳繪則愈多ADCs) 本紙浪尺度適用中國國家樣準(CNS ) A4規格(210X297公釐) 15 1--7--、---f I裝------訂------*银 (請先閲讀背面之注意事項再填寫本頁) A7 B7 i、發明説明(12 ) 之間最佳化。 如上所述,在包含一或多個狹縫形或凹槽形成像裝置 之成像条統中,乃提供一用Μ移動該(等)狹缝形或凹榷 形成像装置之機構,而可在横亙於成像裝置縱軸之方向中 移動,俾能在一成像區上方聚集一完整影像。 根據本發明之另一簧施例,其設有一操作成像糸統之 方法,該成像条統具有一如上所述之狹缝形或凹槽形成像 裝置,而該方法包括在横侧方向中移動該(等)狹缝形或 凹槽形成像裝置,並以對應該(等)成像裝置移動之速率 由該(等)狹缝形或凹槽形成像裝置之像素霄路讀取所聚 集之霣荷,其移動距離係在該運動方向中等於或少於該像 素之一半尺寸。 根據本發明之另一論點,其設有一操作成像条統之方 法,該成像条統包括一或多個如上所述之狹縫形或凹槽形 成像装置,而該方法包括藉著最佳化下列各參數間之闢係 Μ使輻射線之散射效應減至最小:輻射源及欲成像物讎間 之距離;欲成像物體與該(等)狹缝形或凹槽形成像裝置 間之距離;及該(等)狹缝形或凹槽形成像装置之寬度。 經濟部中央標隼局貝工消費合作社印製Printed by the Beigong Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs 5. Description of the invention (7) During the radiation period, each detected element and the associated active circuit form a dynamic active imaging pixel that can enter and exit at will and can accumulate charge at will ( Whether it is used directly as a m charge or a voltage or equivalent current), and can be released during or after irradiation. The content of each pixel is not sent to neighboring pixels one after another, but is ceded independently of all other pixels. The reading speed of the readout data and the level of parallel or continuous signal processing can be optimized, with the combination of its radiation intensity and the time available for gathering an image frame. Accordingly, according to one imaging device of the present invention, the charge can be collected by radiation or light impingement of the bighead carp, using a large dynamic range of plaque and / or a capacitor, the transistor and / or the container are paired One corresponding way is provided with a detection pixel unit. In view of the fact that CCDs use a depletion layer on the inside of a silicon substrate to store charge in a potential well, an ASI D can concentrate the charge on the gate of a transistor and / or capacitor. Therefore, an ASID will have a dynamic range of up to two magnitudes higher than the CCD. During image frame accumulation, the same charge accumulation pixel circuit element also allows the reading of each value of the accumulated charge value, especially when there is no dead time, and the charge value is in a one-to-one relationship with the detected pixel element . An AS ID can also reduce the limitations of conventional semiconductor pixel devices. These conventional devices operate in M pulse counting mode, because they implement imaging in a manner proportional to the total accumulated charge, not proportional to the number of radiation strikes. Although the conventional pulse counting pixel device suffers from saturation during high-speed counting, the AS ID can gather hundreds or thousands of impacts before reading. A longer charge accumulation period (possibly from several seconds to about 1 second) can reduce the effectiveness of resetting these pixel roads. Therefore, the total inert time of each pixel path only accounts for a very small part of the charge accumulation time (or active time). This paper scale is applicable to China National Standard (CNS) 84 specifications (210X297mm) 11 --- j ------- 丨 installed ------ order ----- 1 silver (please first Read the notes on the back ^ item and fill in this page) A7 _ B7 printed by the Employee Consumer Cooperative of the Central Department of Economic Affairs of the Ministry of Economic Affairs 5. Description of the invention (8) I have found that the present invention can be particularly applied to high-intensity imaging applications. Through the various embodiments of the present invention, all the problems of the previous pixel detectors can be overcome, such as unrealistic readout speed, unclear and "ghost" impact, low efficiency, low dynamic range and high The problem of inert time. However, I will find that the present invention is not limited to high-energy and high-intensity applications, and embodiments of the present invention can also be used at lower energy levels (such as in ultraviolet, visible, or infrared wavelengths) and low-intensity applications (in Astronomy) found its use. Each pixel circuit preferably includes a charge storage device for collecting charge, such as a capacitor and / or a transistor. In a preferred embodiment of the present invention, the charge is concentrated on the gate of an FET, which preferably forms one of a pair of FETs * and is connected as an amplifier stage of a gate-ground amplifier. Each pixel path preferably also includes a path design for selectively resetting the charge storage device, for example, after reading out any charges stored on it. A preferred embodiment of the present invention includes the first and second two-value FET switches. The first FET switch pseudo-responds to an active signal, and connects the load storage device to a stud-out line, using the The accumulated charge; its second bow FET open relationship responds to a reset signal to ground the charge storage device and reset the charge storage device. In some applications, such as 7-camera and nuclear science, the pixel size may be 1 «m wide or less, preferably about 350 m wide. In other applications * The pixel element size may be about 150 mm wide or less, preferably about 50 mm wide or less, and more preferably about 10 mm wide, and has a size of 200 mm. The thickness of the substrate between meters and 3 mm. The standard of this paper is applicable to the Chinese National Standard (CNS & Α4 specification (2 丨 ΟX 297mm) -12-; 5 J · Packing— ~ booking line (please read the precautions on the back before filling in this page) Central Standard of the Ministry of Economic Affairs 29 ^ 9〇2 at Β7 printed by the Bureau Cooperative Consumer Co., Ltd. 5. Description of the invention (9) The pixel circuits can be formed integrally with the substrate and flush with the corresponding pixel detector. Another option is to The pixel circuits are made in another substrate, the other substrate is merged into the pixel circuits and broadcast to the substrate incorporated into the pixel detectors, and each pixel circuit thereof is aligned and coupled to Corresponding pixel detector. In a specific embodiment of the present invention, the array includes a single row of pixel detectors and associated pixel circuits to form a slit-type imaging device, or includes multiple rows of pixel detectors and associated pixels A groove-shaped imaging device is formed by the path. In this embodiment, the pixel paths used by each pixel detector can also be arranged in a broadcast direction, and adjacent to the corresponding pixel detector. Imaging with one of the imaging devices The rules include the use of The control electronics of the device, which includes addressing logic circuits for addressing individual pixels, is used for reading out the accumulated loads from the pixel circuit and selectively resetting the pixel circuit. The addressing The logic circuit preferably includes a mechanism for connecting the output circuit of the pixel circuits to the output point of the imaging device with M, a mechanism for supplying the readout start signal to the readout start point of the pixel circuits with M, and a means for supplying The mechanism for resetting the signal to the reset points of these pixels. The mechanism for connecting the round-out line may include a shift register or a counter, and use Μ to connect the pixels of each column successively to the pixels. Line to the round-out end of the imaging device. Similarly, the mechanism for supplying the readout start signal may include a shift register or a counter, and use M to continuously supply the readout start signal to the pixels of each row of pixels. The mechanism for reading the start-in input and / or supplying the reset signal may include a shift register or a counter, and use M to continuously supply the reset signal to the pixels of each row of pixels. National Standard (CNS) A4 specification (210X297mm) 13 ---- 5 ---; --- f · Install ------ order ------ ^ step on (please read the back side first (Notes need to fill out this page) A7 B7 printed by the Ministry of Economic Affairs, Central Bureau of Preservation and Consumer Cooperatives V. Description of the invention (10) The key entry. Therefore, in one preferred embodiment of the present invention, the addressing logic The circuit includes first, second, and third value shift registers. The first bow shift register uses M to connect each column of pixels to the wheel out line of the pixel circuits to the wheel out end of the imaging device. The second The shift register is used to supply the read start signal for each row of pixels to the read start input end of each pixel road, and the third shift register is used to continuously supply the reset signal to each row of pixels. The reset input terminal of each pixel circuit. In another preferred embodiment, a counter can be used to implement the same control signal * The counter can generate row and column addresses, and these addresses can be decoded into round selection, reset, and read start signals. The control theory may include an analogue to digital converter (hereinafter referred to as ADC) for converting the charge reading from a pixel circuit into a digital charge value. At least part of the control electronics design can be incorporated into the semiconductor substrate, and the pixel roads are formed on the substrate. The imaging system preferably includes a color image processor connected to the control electronics design for processing digital load values from various pixel circuits so that a color image can be formed and displayed on a display device. In order to optimize the display of the captured color image, the processor will determine the maximum and minimum charge values used to display pixels, and assign the limit grayscale or color extreme value to the maximum and minimum 18 charge values, and according to a sliding The ruler assigns grayscale or color values to a different pixel | The slide rule is between the two extreme values and depends on the ® charge value of the pixel. It is best to distribute these grayscale or color values according to the following formula: This paper should be suitable for China National Standard (CNS) A4a grid (2 丨 Qx 297mm) —η-1 ^ 1 4 IH ^ I HI > «l ^ i In · 1 II In m. HI --SJ1 ^ 1 ^ 1. ^ 1---ιί 1 ^ 1 y- (please read the notes on the back before filling out this page) B7 Ministry of Economic Affairs Printed by the consumer cooperative V. Description of the invention (11 (Charge value of pixel i-minimum charge value) Gray value of pixel i = minimum gray value +-x (maximum gray value-minimum gray value) (maximum charge value -Minimum charge value) In a preferred embodiment of the present invention, an imaging system includes most imaging devices as defined above, and M tiles are connected together to form a photosensitive screen surface. This can Manufacturing large-area imaging devices without the yield problems normally encountered in large-surface-area integrated devices. The photosensitive screen surface may include multiple rows of imaging devices, and the adjacent rows of imaging devices are located in The column direction is offset. The imaging system preferably includes a mechanism for straddling or removing the imaging device and / or an object to be imaged, so that A color image is gathered above the entire image area. In one embodiment, the imaging system includes two imaging surfaces, each surface includes two photosensitive screens of one imaging device, and the two imaging surfaces are substantially parallel to each other. Lined up and separated from each other * and an object to be imaged is placed between the two surfaces, the two photosensitive screen surfaces are laterally offset from each other * Μ essentially gives a complete image of the object. This is essentially in a certain In some applications, complete imaging is possible without the translation mechanism used by these imaging planes. The image wheels of most tile imaging devices are preferably connected to a common multiplexer. The output is connected to a common ADC. Another option is that most tiled imaging devices can be connected like a daisy garland, and then converted to a common ADC. You can also add M addresses to each pixel circuit to The accumulated charge can be read at a rate to optimize the resolution of an ADC that can convert the analog aggregated iguana value into a digital value. These methods can provide design performance, so the price is more (more , The less ADCs) and the image comparison (the less the multi-pass painting, the more ADCs) The paper wave scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 15 1--7--, --- f I installed ------ ordered ------ * silver (please read the precautions on the back before filling this page) A7 B7 i, the invention description (12) is optimized. As mentioned above, In the imaging system including one or more slit-shaped or groove-shaped image-forming devices, a mechanism for moving the slit-shaped or concave image-forming device with M is provided, which can be used for imaging The device moves in the direction of the longitudinal axis so that a complete image can be gathered above an imaging area. According to another embodiment of the present invention, it is provided with a method of operating an imaging system having a slit-shaped or groove-forming image device as described above, and the method includes moving in a lateral direction The slit-shaped or groove-shaped image-forming device is read from the pixels of the slit-shaped or groove-shaped image-forming device at a rate corresponding to the movement of the imaging device. For the charge, the moving distance is equal to or less than half the size of the pixel in the direction of motion. According to another aspect of the present invention, it is provided with a method of operating an imaging system including one or more slit-shaped or groove-shaped imaging devices as described above, and the method includes optimization by The following parameters are used to minimize the scattering effect of radiation: the distance between the radiation source and the object to be imaged; the distance between the object to be imaged and the slit-shaped or groove-shaped imaging device; And the slit shape or groove forms the width of the image device. Printed by the Beigong Consumer Cooperative of the Central Standard Falcon Bureau of the Ministry of Economic Affairs

Hi J— I I-- 11^ I -- (請先閲讀背面之注意事項再填寫本頁) 訂 本發明亦提供用Μ成像所聚集霄荷值之方法,該等聚 集值係對應於一像素陣列內之各痼像素位置,諸如用於上 面所述成像装置各値像素位置所聚集之m荷值,該方法包 括: -對欲成像之像素陣列面積内各像素決定最大及最小 之聚集值; 本紙張尺度適用中國國家標孪(CNS ) A4規格(2丨0X297公釐) 16 1 C.Hi J— I I-- 11 ^ I-(Please read the precautions on the back before filling in this page). The present invention also provides a method of collecting the small charge values collected by Μ imaging, which correspond to one pixel The position of each pixel in the array, such as the m charge value accumulated at each pixel position of the imaging device described above, the method includes:-determining the maximum and minimum aggregate values for each pixel in the area of the pixel array to be imaged; This paper scale is applicable to China National Standard (CNS) A4 specification (2 丨 0X297mm) 16 1 C.

經濟部中央標隼局貝工消費合作社印製Printed by the Beigong Consumer Cooperative of the Central Standard Falcon Bureau of the Ministry of Economic Affairs

五、發明説明(B -在欲成像灰度或色度極值處指定灰度或色值給最大 及最小之聚集值;及 -指定灰度或色值给各個像素之聚集值,該等像素聚 集值係根據該二極值而按比例分佈;及 -在各個影像之像素位置處成像所指定之灰度或色值 〇 換言之,對Η根據本發明成像裝置所捕捉彩像之每一 部份,可比較欲顯示所有像素之電荷密度,其最高與最低 電荷密度點係已指定為一色值,而位於所使用灰度或色度 之二極值處。其餘之像素點係給予一來自該灰度或色度比 例之值,此比例係根據各個像素中所聚集之霣荷多寡。 本發明亦提供一棰自動最佳化成像之方法,其例如使 用一種如上所述之成像条統,而用於不同之成像應用,在 此進入之輻射線係在一半導體基片之像素檢波器中留下一 不同之電力訊號,此訊號需視所用半導«材料或合成物、 能置及進入鞴射線之型式而定,該方法包括:5. Description of the invention (B-assign the gray or color value to the maximum and minimum aggregate value at the gray or chroma extreme value to be imaged; and-specify the gray or color value to the aggregate value of each pixel, such pixels The aggregation value is proportionally distributed according to the two extreme values; and-the grayscale or color value specified by imaging at the pixel position of each image. In other words, for each part of the color image captured by the imaging device according to the invention , The charge density of all pixels to be displayed can be compared, the highest and lowest charge density points have been designated as a color value, and are located at the two extreme values of gray or chromaticity used. The remaining pixels are given a The value of the ratio of chromaticity or chromaticity, which is based on the amount of charge accumulated in each pixel. The present invention also provides a method for automatically optimizing imaging, which uses, for example, an imaging system as described above, and For different imaging applications, the radiation entering here leaves a different power signal in the pixel detector of a semiconductor substrate. This signal depends on the semiconducting material used, material or composition, placement and entry Depending on the type, the method comprising:

I -使用重心技術決定預期之最佳解晰度; -決定預期之效率,此效率為輻射線型式及能董之函 數;及 -決定一像素尺寸及厚度,逭是一選定輻射線型式、 能量及一選定半導鱧材料或合成物之函數。 這方法亦可包括一自動選擇成像裝置之步想*該装置 具有已決定之像素尺寸及厚度。 這方法能對不同之成像應用自動做影像處理之最桂化 本紙張尺度適用中國國家標準(CMS ) A4規格(210X297公釐) 17 裝 訂 11 ^ (請先閱讀背面之注意事項再填寫本頁) A7 B7 ^^3902 五、發明説明(14 ) (請先閱讀背面之注意事項再填寫本頁) ,在此需視所用半導體材料或合成物而定,其進入之輻射 線將有關該能量及進入輻射線之型式而留下一不同之電力 訊號。根據逭方法,可用一重心技術辨認該預期之最佳解 晰度,在此該半導饈内侧之每一次輻射步驟係藉著能量損 失而加重,或藉著該步班中所產生之霄荷訊號而等值加重 。因此藉著電荷加重之平均值可決定解晰度。同理,預期 之效率係如輻射線型式及能置之函數而定。對於每一種ASID 半導體材料或合成物,有一賫料庫可提供用於各種輻射型 式及能量之值,因此能立即與自動最佳化其設計規格。 本發明亦提供一種用於自動檢出及消除所檢出像素值 之方法,該等像素值代表一成像装置之像素單元上之進入 輻射線,該成像装置係例如上面所定義者,該方法包括: -比較所檢出之像素值與一臨界值,該臨界值係有两 —最小之檢出電荷值,而預期爲直接進入之輻射線者·,及 -放索所檢出之像素值少於該臨界值者。 經濟部中央橾準^w工消费合作社印装 因此本發明之逭論點能使進入該成像裝置前已散射之 進入輻射線(尤其是低強度之輻射線)在處理之前即已逐 出。造是藉著辨別所檢出之輻射線而達成,而此辨別功能 係根據Μ電力訊號型式所寄存之能量。因為已散射之輻射 線會損失其某些能量,故其將不會穿過最小之能量截止值 〇 本發明之另一論點亦可提供一種用以實施有機物或無 機物實時成像之方法,該方法包括: -用一可產生X射線,7射線、射線或α射線之輾 18 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐)I-use the center of gravity technique to determine the best resolution expected;-determine the expected efficiency, which is a function of the radiation pattern and energy management; and-determine the size and thickness of a pixel, which is a selected radiation pattern, energy And a function of the selected semiconducting snakehead material or composite. This method may also include a step of automatically selecting an imaging device * The device has a determined pixel size and thickness. This method can automatically perform image processing for different imaging applications. This paper standard is applicable to the Chinese National Standard (CMS) A4 specification (210X297 mm) 17 Binding 11 ^ (please read the precautions on the back before filling this page) A7 B7 ^^ 3902 V. Description of the invention (14) (please read the precautions on the back before filling in this page), here it depends on the semiconductor material or composition used, and the radiation it enters will be related to the energy and entry The type of radiation line leaves a different electrical signal. According to the method, a center-of-gravity technique can be used to identify the optimal resolution of the expectation, where each radiation step inside the semi-conductor is aggravated by energy loss, or by the small charge generated in the step shift The signal is equivalent to aggravate. Therefore, the resolution can be determined by the average value of the increased charge. For the same reason, the expected efficiency depends on the radiation pattern and the energy function. For each ASID semiconductor material or composite, there is a material library that can provide values for various radiation types and energies, so that the design specifications can be optimized immediately and automatically. The present invention also provides a method for automatically detecting and eliminating detected pixel values. The pixel values represent the incoming radiation on a pixel unit of an imaging device. The imaging device is, for example, as defined above. The method includes :-Compare the detected pixel value with a critical value, the critical value is two-the smallest detected charge value, and the expected radiation is directly entered, and-the pixel value detected by the release line is less Those who are above this threshold. Printed by the Central Ministry of Economic Affairs and Industry Consumer Cooperatives. Therefore, the argument of the present invention enables incoming radiation (especially low-intensity radiation) scattered before entering the imaging device to be expelled before processing. The creation is achieved by identifying the detected radiation, and this identification function is based on the energy stored in the M power signal type. Because the scattered radiation will lose some of its energy, it will not pass through the minimum energy cutoff value. Another argument of the present invention can also provide a method for real-time imaging of organic or inorganic substances, which includes :-Use a roll that can produce X-rays, 7 rays, rays or alpha rays. The size of this paper is applicable to the Chinese National Standard (CNS) A4 specification (210X297mm)

經濟部中央樣隼局負工消費合作社印製 五、發明説明(is ) 射源照射該物齷; -在一如上所述成像裝置之一半導體成像平面或多個 平面處檢测未吸收之輻射線,或檢測逸出該物醱所遘擇區 域之輻射線,藉此使源自該成像装置各個像素單元處之進 入輻射線電荷聚集在各個像素單元之有源電路中; -個別對該像素之各有源霣路编址,用Μ讚出所聚集 之霣荷; -處理所讀出之霣荷,以提供影像之像素數據;及 -顯示該影像像素數據。 因此,除了提供一種新成像装置外,本發明亦提供使 用該成像裝置之条統。在第一個較佳架構中*該等成像像 素係MMX Ν之距陣排列,其中Μ與Ν可達數干個,因而提供 一種全場成像平面。在另一較佳結構中,該等成像像素係 排列成狹缝或凹槽型,具有數千行,且每行有若干列。在 一定速度下該狹縫或凹榷係移動於—欲成像表面之上方, 並且夠快地讀出該狹缝(或凹槽)幀格,以致沿箸浬動方 向在相鄰幀格間所掃描之距離係小於半個像素之尺寸。具 有這棰架構及操作楔式,其可能沿著浬動方向達成一點線 解晰度,而這在同一方向中係等於該像素尺寸。因此,其 可能改良2倍之位置解晰度,而是一種全場成像平面或不 是Μ所述模式操作之傳統狹缝或凹槽所能獲得者。在另一 較佳配置中,數値上述狹缝(或凹槽)係彼此平行地排列 在同一平面上,並且各狹缝(或凹槽)之縱軸間具有一不 變之距離。因此,若有η個此等狹縫(或凹槽)且所捕描 本紙張尺度適用中國國家標準(CNS ) Α4規格(2Ι0Χ297公釐) 19 I - I I ϋ 1· —Μ 裝 I I I I I 訂 ^線 - „ ί ( (請先閱讀背面之注意事項再填寫本頁)Printed by the Consumer Labor Cooperative of the Central Sample Falcon Bureau of the Ministry of Economy V. Description of the invention (is) The source irradiates the object;-Detecting unabsorbed radiation at a semiconductor imaging plane or planes of one of the imaging devices as described above Line, or detecting radiation that escapes the selected area of the object, thereby collecting the incoming radiation charge from each pixel unit of the imaging device in the active circuit of each pixel unit; Addressing each active image road, using M to compile the collected image data;-processing the image information to provide pixel data of the image; and-displaying the image pixel data. Therefore, in addition to providing a new imaging device, the present invention also provides a system for using the imaging device. In the first preferred architecture * the imaging pixels are arranged in a matrix of MMX N, where M and N can be up to a few, thus providing a full-field imaging plane. In another preferred structure, the imaging pixels are arranged in a slit or groove type, have thousands of rows, and each row has several columns. At a certain speed, the slit or recess moves above the surface to be imaged, and the slit (or groove) frame is read out fast enough so that it moves between adjacent frames in the direction of the movement The scanning distance is less than half a pixel. With this frame structure and operating wedge type, it is possible to achieve a little line resolution along the direction of motion, which is equal to the pixel size in the same direction. Therefore, it may improve the position resolution by a factor of two, but it can be obtained by a full-field imaging plane or a conventional slit or groove that is not operated in the mode described. In another preferred configuration, the above-mentioned slits (or grooves) are arranged parallel to each other on the same plane, and the longitudinal axis of each slit (or groove) has a constant distance between them. Therefore, if there are η such slits (or grooves) and the size of the captured paper is applicable to the Chinese National Standard (CNS) Α4 specification (2Ι0Χ297mm) 19 I-II -„Ί (Please read the precautions on the back before filling this page)

經濟部中央棣準局員工消費合作社印製 五、發明説明(l6 ) 之總距離為X公分,則每一狹缝(或凹槽)只需掃描x/n 公分。這將減少高速掃描機構之需求,且同一影像可在一 單位時段下形成,而使X射線光源可在一較低電流下操作 (單一狹缝/凹槽具有η次較低之霣流)° 本發明亦提供一棰操作上述成像裝置或成像条統之方 法,其包括Μ—速率由各個像素霣路讀出所聚集之霣荷, 以最佳化把類比聚集«荷值轉換成數位值之一 ADC解晰度 0 本發明亦提供利用上述裝置及条統之各項方法。 因此,本發明提供可直接檢出高能射線之主動聚集類 比成像,而與基於撞擊計數之傳統數位成像技術相反。根 據本發明,乃聚集一霣荷(或同等電流或霣壓)值而非若 干點,該霣荷值係直接及線性對應於起始射線之總能鼉。 CCDs只可在很低能量(靠近可見光譜)時提供直接成像。 對於高能應用(超過10仟電子伏特之X射線),CCDs係與 各轉換螢幕一起操作,這些螢幕可將高能射嫌轉換成可見 光波長,而CCDs對這種波長較為靈敏。在這過程期間,光 之產生及漫射實際上將使該影像對比及解晰度變差。此外 ,對所有實用目的而言,CCDs係只受限於使用矽元素。然 而吾人已知矽是一相當低密度之材料,對於檢出能量超過 若干仟伏特之射線具有極低之效率。 根據本發明之一論點,乃提供一棰将聚集電荷轉變成 一影像之方法,Μ便對一已知之影像部份提供可播得之最 高對比及解晰度。對於該影像之每一部份,可藉著比較所 ------_---j-丨裝------訂-----j線 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 20 - 20 經濟部中央樣準局貝工消費合作社印製 A7 B7 五、發明説明(17 ) 有像素之霣荷密度而連成逋目的。最高及最低霣荷密度點 可指定爲所使用灰度或色度二極值之一色值。其餘之點是 由該灰度或色度比例而给予一值,該色度比例是根據那些 像素所聚集之霣荷(或同等霣滾或霣S)。 本發明亦提供一棰使進入該成像装置之前已散射之射 線影像解晰度效應減至最小之方法。據此,當直接檢出射 線之主動聚集類比成像棋式有作用時,該等攘散射線在對 比度中具有一極小之分量,因爲它們將在該成像裝置中寄 存棰少之能量。對應於未«散射線之«荷值(或同等霣流 或m壓) >其寄存能量是逮高於前者。因此,當在影像處 理期間每一像素皆根據所聚集之電荷值指定一色度或灰度 值時,可使擴散輻射之效應滅至最小。 本發明亦提供一種在進入該成像装置之前排除相干或 不相干已價散射線之方法。一種凹槽技術用在逋效應上, 其具有一準直射源,而可調整至放出各種射線且對準一成 像凹槽。藉著最佳化該光源與所觀察物鼸之隔两距離、所 觀察物體與該成像凹榷之隔閭距離及該凹槽之宽度,邸可 決定一台幾何形狀,而可使擴散射線之檢出變得最少。埴 是因為擴散射線“看到”一小相空間及“沒有理由”進入 該薄成像凹槽。因其是一項幾何學技術及不痛射線能量之 知雄,故埴方法特別有效力。已擠散之射線,不論它們是 不相干地散射及已損失其某些能量(此為廒普領散射), 或是柑干地散射及保留其所有能量(此為瑞利散射)*皆 将最不可能檢出。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐〉 21 ----:--^---一 -裝------訂------1 # (請先閲讀背面之注意事項再填寫本頁)Printed by the Employee Consumer Cooperative of the Central Bureau of Precision of the Ministry of Economic Affairs. 5. The total distance of the invention description (l6) is X centimeters, so each slit (or groove) only needs to scan x / n centimeters. This will reduce the need for a high-speed scanning mechanism, and the same image can be formed in a unit time period, so that the X-ray light source can be operated at a lower current (single slit / groove has η times lower flow) ° The present invention also provides a method of operating the above imaging device or imaging system, which includes an M-rate reading of the accumulated charge from each pixel to optimize the conversion of the analog aggregate load into digital values An ADC resolution 0 The present invention also provides various methods that utilize the above-mentioned devices and rules. Therefore, the present invention provides active focused analog imaging that can directly detect high-energy rays, as opposed to traditional digital imaging techniques based on impact counting. According to the present invention, instead of a few points, a value of the charge (or equivalent current or pressure) is gathered, which corresponds directly and linearly to the total energy of the starting ray. CCDs can only provide direct imaging at very low energy (near the visible spectrum). For high-energy applications (X-rays over 10 thousand electron volts), CCDs are operated with conversion screens that convert high-energy radiation into visible light wavelengths, and CCDs are more sensitive to such wavelengths. During this process, the generation and diffusion of light will actually deteriorate the contrast and resolution of the image. In addition, for all practical purposes, CCDs are limited to the use of silicon. However, we know that silicon is a relatively low-density material, and has extremely low efficiency for detecting rays with energies exceeding several thousand volts. According to one of the arguments of the present invention, a method for converting accumulated charges into an image is provided, and M provides the highest contrast and resolution that can be broadcast for a known image portion. For each part of the image, you can compare it by ------_--- j- 丨 install ------ order ----- j line (please read the notes on the back first (Fill in this page again) This paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 20-20 Printed A7 B7 by the Beige Consumer Cooperative of the Central Prototype Bureau of the Ministry of Economic Affairs 5. Invention description (17) The density of the load is linked to the purpose. The highest and lowest density points can be specified as one of the two extreme values of gray or chroma. The rest of the points are given a value by the grayscale or chroma ratio, which is based on the accumulation of those pixels (or the equivalent of rolling or rolling). The present invention also provides a method of minimizing the resolution effect of ray images scattered before entering the imaging device. According to this, when the active gathering analogue of the direct detection of the rays has an effect, these scattered rays have a very small component in the contrast, because they will store very little energy in the imaging device. Corresponding to the "non-scattered ray" charge value (or equivalent galvanic flow or m pressure) > its storage energy is caught higher than the former. Therefore, when each pixel specifies a chromaticity or gray value according to the accumulated charge value during image processing, the effect of diffuse radiation can be minimized. The invention also provides a method of excluding coherent or incoherent valence scattered rays before entering the imaging device. A groove technique is used for the effect, which has a collimated source and can be adjusted to emit various rays and aim at an imaging groove. By optimizing the distance between the light source and the observed object, the distance between the observed object and the imaging recess, and the width of the groove, Di can determine a geometric shape, which can diffuse the rays The detection becomes the least. It is because the diffused rays "see" a small phase space and "have no reason" to enter the thin imaging groove. Because it is a know-how of geometry technology and painless ray energy, the method is particularly effective. The squeezed rays, whether they are scattered incoherently and have lost some of their energy (this is black collar scattering), or are scattered and retained all their energy (this is Rayleigh scattering) * The most unlikely detection. This paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297mm> 21 ----:-^ --- 一-装 ------ 定 ------ 1 # (please first (Read the notes on the back and fill in this page)

經濟部中央標準局員工消費合作社印製 五、發明説明(18 ) 本發明亦提供排除已檢出輻射線之方法,該等輻射線 係在低強度應用中於進入該成像裝置邸已散射。經由使用 一門限值Μ逐去能置低於一預定值之檢出輻射線,這可由 檢出區排除已損失其某些起始能量及已不相干散射之能量 〇 本發明亦能對每一種成像應用之特定架構做自動最佳 化。視所使用半導鱧材料及輻射線型式與能量而定,其將 寄存一不同之電力訊號,使用一種重心方法,吾人可發現 一預期之最佳解晰度。亦可決定一預期之效率,此效率為 輻射線型式及能量之函數。對於每一種半導體像素材料或 合成物*設有一資料庫以提供各種輻射線型式及能*所需 之值,因此能立即與自動最佳化其設計規格。 上述之成像装置或成像条統可用於傳统之X射線、胸 腔X射線、X射線乳房照相術、罨腦斷層照相術、X射線骨 頭密度測定法、7射線核子放射照相術、單光子放射霣腦 斷層照相術(SPECT)之7攝影機、陽電子放射斷層照相術 (PET)、X射線牙齒成像、X射線全景牙齒成像,使用同位 素於去氧核糖核酸(DNA)、核糖核酸(RNA)、與蛋白質串序 、定向雜交、DNA雜交、RNA雜交與晡離蛋白質或整黼蛋白 質雜交之/3射線成像、一般之卢射線成像及使用色譜法與 聚合龌鐽式反應之自體放射照相術、產品品質控制之X射 線與7射線成像、非破壞性測試及實時與線上監督、及使 用輻射線,包括可見光之安全控制条统與實時成像。 3.圖面簡述: ---Ί------f.-裝------訂------< 辣--- (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 22 A7 xr ^Bd〇2 __ B7 五、發明説明(19 ) 下文只參考所附各圖面而藉由舉例説明本發明之各項 示範實施例•其中: 第1圖是一成像条統之示意方塊圖,該糸統包括根據 本發明成像裝置之一實施例; 第1A圖是一 FET之示意圖; 第2麵是一像素電路範例之示意電路流程圖,其用於 根據本發明之成像裝置; 第3圖是一成像陣列及控制電子設計之局部示意流程 圖,其用於根據本發明之一成像裝置; 第4麗是·成像陣列及控制電子設計之局部示意電路 圖,其用於根據本發明之一成像装置,該成像装置設有像 素單元方塊; 第5圖是指出多數成像裝置之一示意圖,該等根據本 發明之成像裝置係如瓦面般鋪設形成一感光崁鑲幕面; 第5 A圖是本發明一實施例之控制電子設計局部示意圖 ,其包括多數鋪蓋形成一感光崁鑲幕面之成像裝置; 第6 A至6C圖是一成像裝置呈瓦面型式之示意圖; 第7A至7D圖説明一範例,其中配合本發明之··-項應用 ,將2成像平面放在欲成像物體之相對兩側面上; 第8圔是另一像素電路範例之示意電路圖,其用於根 據本發明之--成像裝置; 第9A與9B圖分別是第8圖實施例之成像陣列及控制連 接裝置之局部示意方塊圖; 第10圖是根據本發明之一成像裝置範例之局部橫截面 23 本纸張尺度逋用中國國家標準(CNS ) Α4規格(210 X 297公釐) --------ί .裝------訂------{球 (請先閱讀背面之注意事項再填寫本頁) 經濟部中央橾準局員工消費合作社印製 五、發明説明(2〇 ) A7 B7 經濟部中央標準局負工消費合作社印製 第11圖是另一像素《路範例之示意《路圈,其係用於 根據本發明之一成像裝置; 第12圖說明一根據本發明之成像技術,其使用一狹缝 或凹槽型成像装置; 第13圖說明用於一狹縫或凹槽型成像裝置之最佳化參 數,Μ減低其散射效應;及 第14園是/3射線穿經矽元素之一示意圖。 4.較佳實施例之描述: 第1圖是一成像糸統10之應用範例示意圖,該成像糸 統包括根據本發明之一成像裝置實施例。 逭項應用係有關一物體12承受輻射線14之輻射成像。 該輻射線例如可能是X射線輻射,而該物醱例如可能是人 醱之一部份。 該成像裝置包括一主動一像素半導體成像裝置(ASID> 16,此AS ID包括多數像素單元18。該成像裝置可直接檢出 高能進入之輻射線,諸如X射線、7射線、/8射線或ct射 線,並且在每一像素單元聚集代表入射於該像素單元之輻 射值,這是利用位在一對應像素單元檢波器上或附近之可 随意進出、主動、動態像素«路。 可將該ASID設計成單一半導鼸基片(例如矽元素), 其具有一像素單元,而包括一像素檢波器19及一有源像素 霉路20。另一種選擇是,可將該AS ID設計在二基片上,其 —片設有一陣列之像素檢波器19,而另一基片設有一陣列 ----;------^ -裝------訂------j線 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) 24 經濟部中央標準局貝工消費合作社印製 Α7 Β7 五、發明説明(21 ) 之有源像素霣路20,該二基片係藉由例如傳統式碰撞接合 技術而彼此機械式地連接。 每一個像素單元18事實上皆Μ電極(未顯示)界定於 該基片上,此等霄極可施加一偏壓而界定該像素單元18之 檢波區(亦即該像素檢波器19)。呈霄子結構型式之有源 像素電路20 (例如電晶鼸、電容器等結構),係可界定於 每一像素單元18上或位在其相聯第二塊基片上之一對應位 置處,例如當一光子或輻射線之霄荷顆粒入射在該像素單 元18之耗盡區上時*其即可聚集該像素檢波器中所產生之 電荷。一有源像素電路20及像素檢波器19之尺寸可以爲數 十撤米(例如10至50撤米)之级數。下文參考第2、8與 11圖描述有源像素電路之各項範例。 如上所述,有源像素霣路20可與該像素單元18上之半 導龌基Η 16—驩成形,而為該半導體處理製程之一部份。 可用特殊之處理技術以集成具有該等檢出像素之同一晶片 上的像素電路。另一種選擇是,可在第二塊晶片上製造有 源像素霣路20,並且分配對應於第一塊晶片上各艟像素單 元18所界定之像素檢波器19。該二元件隨後可用習知之方 式連接在一起,例如籍著碰撞接合技術,Μ致每一像素單 元18之有源像素電路20係位於該像素單元18之對應像素檢 波器19附近(後面)及置於其上。 該等像素檢出器19係製成具有一耗盡區,Μ致當於一 像素單元18之半導體基片16中光電吸牧一光子而產生一電 荷時,或當一霣荷輻射線離子化一像素單元18半導體基片 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) ^ -裝 訂 I ? 線 (請先閲讀背面之注意事項再填寫本頁) 25 A7 B7 經濟部中央標準局貝工消費合作社印製 五、發明説明(22 16之耗盡區時,一霣子脈衝即由該半導體基片耗盡區流至 該像素單元18之有源像素電路20。醣後在一有源電路元件 中聚集該電子脈衝之一相關值,其可直接當做一電荷值或 一同等電壓或電流值,Μ致隨後進入之輻射線所產生之新 霄荷可連繙加在其上面。聚集裝置之可能範例如一積睡霄 容器或一積體霉晶鼸之柵極。持續著一有源像素電路20中 之電荷聚集過程,直到由控制霣子設計24發出控制訊號, Μ啟動一讀出資訊之過程,這是藉著對每一像素單元编址 *而Μ隨機存取之方式由每一個別像素單元讀出資訊。在 該等聚集霄荷值之讀出期間,電荷將持續聚集,因為檢出 各像素單元用之讀出作用總是可獨立地完成。像素霣路可 能在讀出後選擇性地重置,Μ釋出該霣荷聚集電路元件, 並且隨後各像素只有一極短時間無作用(實際上將如所示 地無空載時間)。因此,各痼像素只有在重置期間無作用 〇 第la圖根據本發明指出一像素霣路霄荷聚集元件範例 之電荷聚集原理。在這範例中,一場效霄晶鳢(FET)係形 成於一半導體基片上。在一 P型矽基片1中,N型摻雜匾 4與6係分別明確地形成該源極與漏極。源極3與漏極5 之電極係形成於一氧化物層2中,一柵極7係形成於該氧 化物層2上方。由於該場效罨晶體之柵極霣容,霣荷係聚 集在一金靥氧化物半導體場效霣晶體(M0SFET)之柵極7上 。當電荷聚集在該FET柵極上時,其在該FET逆溫層8 (該 層具有FET操作所需之少數電子載流子)減少電子濃度。 ----;--^---f I 裝------* 訂------;喊 (請先閲讀背面之注意項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 26 - 26 經濟部中央揉準局貝工消費合作社印製 29^9〇2 A7 B7 五、發明説明(23 ) 可聚集之最大霣荷視該逆溫層中之可容許最小電子密度而 定。因此該電荷之聚集不受任何來自矽髏暗電流之影«, 如CCD案例中所發生者,因為霣荷不會聚集在任何耗盡容 積内。只用總共之FET柵極面稹(其實際上可極接近該像 素電路之面積)、該氧化物層厚度(可為若干毫撤米或數 十毫撤米薄)及該FET動態範圍(其決定最大之柵極電壓 )決定霣荷之聚集能力。應注意的是這只是一像素霣路霣 荷聚集元件之範例,並且根據本發明,霣荷可聚集在任何 適用之電荷聚集装置内,而在該對應像素電路中實施。 該像素間距可小至10撤米,這導致極佳之位置解晰度 Μ及隨後而來之極佳影像解晰度。 第2圖說明一有源像素電路20之較佳範例,其係用於 根據本發明一成像装置範例之像素單元中。本發明之此範 例係使用FETs,它們係排列成一連接至放大$之柵地、陰 地放大级霣路。VBIAS 40是一橫越該耗盡區之傾壓_入, 而形成該像素單元之像素檢波器19。該像素檢波器19係以 二極體符號D11表示。在一像素霣路本身中,SI GOUT 42是 一類比訊號_出,而VANA 44是一類比電源輪入。RES-R-1 是一重置鎗入,而ENA-R-1是該像素電路之起動輪入。當 RES-R-1 46與ENA-R-1 48蠄入皆為低時,霣荷係聚集在一 霣晶體M11A 50之柵極中。 該柵極霄容實質上形成該輸入節點霣容(即缠霣容) ,因此可使電荷儲存能力最大化。本發明之一目檷是提供 最大之電荷聚集能力,這是藉著使所有其它電路(及檢波 本紙張尺度適用中國國家標準(CNS ) A4規格(210 X 297公釐) 1.1 —.. 裝 訂 ^旅 (請先閲讀背面之注意事項再填寫本頁) 27 經濟部中央梯隼局貝工消費合作社印製 A7 B7 五、發明説明(24 ) 器)組件之寄存或不想要電容減至最小,並且實質上由該 霣荷聚集電晶體Ml 1A 50形成所有輸入節點電容。對於35 撤米乘以35撤米之像素霣路而言,其Mil A 50¾容可Μ為2 微撤法,而該FET柵極電壓動態範圍至少可Μ為2伏特。這 儲存能力係約對應於25,000,000個電子,而超過同一像素 尺寸之CCD容量100倍。應注意的是上述範例中該FET霣容2 撤撤法實際上形成該像素單元之所有_入節黠霣容。在上 述35撤米乘Μ35撤米像素之範例中,每一像素電路中該檢 波器與其它元件及對應像素檢波器之全部寄存霣容,是在 若干® (ΙΟ-18)法拉或數十塵法拉之範圍内。應最大化該 電荷儲存裝置之電容,並且無論如何應實質大於每一像素 單元中之寄存霄容。在上述範例中,FET之霣容係用做該 像素電路之一電苘聚集裝置,而其超過該像素單元全部霣 容之百分之90,該像素單元包括一像素檢波器及對應之像 素電路。這結果是實際上所有已收集之«荷將聚集在該霉 荷聚集FET中*而非分佈在各檢波器及該像素霄路之其餘 元件間。 吾人將發現使用FET可提供一項只羼於本發明之範例, 在此範例中可用一像素電荷儲存装置(諸如一 FET柵極或 一霄容)使霣荷聚集«容變成最大,而總共達到每一像素 之大部份蠄入節點電容。 為讀出該像素單元,ENA-R-1採用高能狀態,而允許 電流由電晶鱧M11A 50經過霣晶醴M11B 52流至SIG0UT 42 。藉著使RES-R-1變至高能階及可重置該像素霣路*而於 本紙張尺度逋用中國國家橾準(CNS〉A4規格(210X 297公釐) 28 1.1 —I·— M— ^ 裝 n 訂 H —~-4'線 (請先閲讀背面之注意事項再填寫本頁) 經濟部中央標準局貝工消費合作社印裝 A7 B7 五、發明説明(25 ) RES-R-1已在高能階僅達數撤秒後,將由m晶體M11A 50 之柵極移去任何聚集電荷。直接在RES-R-1 46回至低能階 後,電荷可立即開始聚集在該電晶體Ml 1A 50之柵極。若 無重置脈衝送至該RES-R-1 46重置輸入,則發現當起動WI 入ENA-R-1變高能階時,一讀出操作不會破壞其電荷,反 之只造成一正比於該聚集霣荷之霣滾。這允許多次之讀取 而不需重置。 第11圖說明一有源像素電路320之另一範例,其係用 於根據本發明一成像装置範例之像素單元中。這範例係類 似第2圖者。在像素單元之PD 319處表示其像素檢波器。 於像素電路自身中,VBIAS 140是一傭IE,OUT 342是一類 比訊號輸出、RESET 346是一連接至重置FET 347之重置輪 入,而ENABLE 348是連接至該像素電路起動FET 352之起 動输入。當ENABLE 348繪入為低階而RESET 346_入為高 階時,電荷(電子)即聚集在一電荷儲存FET 350之柵極 中。爲讀出該像素單元,ENABLE 348係採高階,而允許堪 流由FET 350流經FET 352至OUT 342。使RESET變低階而重 置該像素電路,在此當RESET 346已位在低階而只達若干 撤米時,任何聚集之霣荷將已由FET 350之柵極移去。直 接在RESET 346回至高階後,可立即開姶在FET 350之柵極 聚集電荷。若無重置脈衝送至該重置輪入RESET 346,則 可發現當該起動輸入ENABLE變高階時,一項讀取操作將不 會破壊該電荷,反之僅只造成一正比於所聚集霣荷之«流 。因此將可看出第11圆之電路蓮作係類似於第2圖者。此 本紙張尺度適用中國國家標準(CNS ) A4規格(2丨0X297公釐) 丨._-----^---^ -裝------訂------1 威 (請先閲讀背面之注意事項再填寫本頁) 經濟部中央搮準局貝工消費合作社印製 at B7 五、發明説明(26 外,第11圖之霣路包括二極體354與356,它們係用做該像 素II路之過載保護霄路設計。該等二極醱提供對FET過載 及可能損害FETs之靜電保護。若FET柵極350聚集多過一預 定臨界值之電荷(例如對應於其偏壓5伏特),則霄流將 開始流經二極鑊356朝向地面,因此保護該PET 350。造將 保_各像素單元,它們例如係承接欲成像物體周邊外侧之 全部輻射劑置。最好該二FETs 350與352是當做一柵地一 陰地放大器階级應用。在這架構中,該二FETs 350與3 52 提供較大之阻抗變換,卻不會因此增加其矂音。因此來自 本實施例所述每一像素電路之噪音级數只約500e,而該像 素電路係保留在很小之尺寸(小至10-20撤米像素尺寸) ,並具有約50,000,000 e之極大動態範園,且有値別存取 之能力。 第11圖亦說明可能省略之選用雙棰電晶體360。稍後 將描述該連接至一電壓源VBASE之雙極霣晶鯉的用途。 第10圖是根據本發明成像裝置實施例之一示意匾。第 10圖中所示成像裝置包括一像素檢波器基片214,而具有 成形於笫二基片212上之有源像素電路》該第二基片係以 撤缓衝器222連接至該像素檢波器214。該有源像素霣路20 係Μ — FET符號示意地表示於基片212内。 該像素檢波器基片214於其曝露至進入輻射線之位置 上設有一連繙式霣極110。換言之,在第10圜中,進入之 輻射線係假設爲在朝上之方向中抵達。因此該像素檢波器 基片112之主鱧係置於該連續式電極110之後面。在該層112 ----^---J---^ -裝------訂-----1、銀 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度通用中國國家標準(CNS ) A4規格(210X297公釐) -30 30 A7 B7 2^39〇2 五、發明説明(27 ) 之後側表面上設有多數像素檢波器霣極114。它是為該像 素檢波器«極114之陣列,而可有效地界定該像素檢波器 基片214内之各個像素檢波器單元19。每一個像素檢波器 霣極114係用一個別撤缓衝器222¾子及機械地耩合至個別 之像素電路20。其將發現第10圖中所代表者只為示意,而 非按比例者。 除了上面已描述之特點外,第10圖亦說明其它選用之 待點*它們可Μ下文所述之方式隔絕各値像素«路。Printed by the Employee Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs 5. Description of the invention (18) The present invention also provides a method of excluding detected radiation that has been scattered when entering the imaging device in low-intensity applications. By using a threshold M, the detected radiation can be set lower than a predetermined value, which can exclude some of its initial energy and energy that has been irrelevantly scattered by the detection area. The present invention can also The specific architecture of the imaging application is automatically optimized. Depending on the semiconducting snake material used and the radiation pattern and energy, it will register a different electrical signal. Using a center of gravity method, we can find an optimal resolution expected. It can also determine an expected efficiency, which is a function of the radiation pattern and energy. For each semiconductor pixel material or composite *, a database is provided to provide various radiation patterns and values required for energy *, so that the design specifications can be optimized immediately and automatically. The above imaging device or imaging system can be used for traditional X-ray, thoracic X-ray, X-ray mammography, brain tomography, X-ray bone densitometry, 7-ray nuclear radiography, single-photon radiography 7 cameras of tomography (SPECT), positron emission tomography (PET), X-ray dental imaging, X-ray panoramic dental imaging, using isotopes in deoxyribonucleic acid (DNA), ribonucleic acid (RNA), and protein strings Sequence, directional hybridization, DNA hybridization, RNA hybridization and hybridization of protein or whole protein / 3-ray imaging, general Lu-ray imaging, autoradiography using chromatography and polymerization reaction, product quality control X-ray and 7-ray imaging, non-destructive testing and real-time and online monitoring, and the use of radiation, including visible light safety control rules and real-time imaging. 3. Brief description of the picture: --- Ί ------ f.-install ------ order ------ < spicy --- (please read the notes on the back before filling in This page) This paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 22 A7 xr ^ Bd〇2 __ B7 5. Description of the invention (19) The following only refers to the attached drawings and illustrates this Exemplary embodiments of the invention • Among them: FIG. 1 is a schematic block diagram of an imaging system, which includes an embodiment of an imaging device according to the present invention; FIG. 1A is a schematic diagram of an FET; A schematic circuit flowchart of an example of a pixel circuit, which is used for the imaging device according to the present invention; FIG. 3 is a partial schematic flowchart of an imaging array and control electronics design, which is used for an imaging device according to the present invention; Li is a partial schematic circuit diagram of the imaging array and control electronics design, which is used in an imaging device according to the present invention, the imaging device is provided with a pixel unit block; FIG. 5 is a schematic diagram indicating one of most imaging devices, which are based on this The imaging device of the invention is laid like a tile surface to form a photosensitive screen surface FIG. 5A is a partial schematic diagram of a control electronic design according to an embodiment of the present invention, which includes a plurality of imaging devices that are covered to form a photosensitive screen surface; FIGS. 6A to 6C are schematic diagrams of an imaging device in the form of a tile surface; FIGS. 7A to 7D illustrate an example in which, in conjunction with the application of the present invention, the 2 imaging planes are placed on opposite sides of the object to be imaged; the eighth circle is a schematic circuit diagram of another pixel circuit example, which is used for According to the present invention-the imaging device; Figures 9A and 9B are partial schematic block diagrams of the imaging array and control connection device of the embodiment of Figure 8; Figure 10 is a partial cross-section of an example of an imaging device according to the invention 23 The size of this paper uses the Chinese National Standard (CNS) Α4 specification (210 X 297 mm) -------- ί. Loading ------ order ------ {ball (please Read the precautions on the back first and then fill out this page) Printed by the Employee Consumer Cooperative of the Central Department of Economics of the Ministry of Economic Affairs V. Description of Invention (2〇) A7 B7 Printed by the Cooperative Consumer Cooperative of the Central Standards Bureau of the Ministry of Economics. Picture 11 is another pixel "Indications of Road Examples" Road Circle, which is used according to this Figure 12 illustrates an imaging device according to the present invention, which uses a slit or groove type imaging device; Figure 13 illustrates optimized parameters for a slit or groove type imaging device, Μ reduces its scattering effect; and the 14th circle is a schematic diagram of / 3 rays passing through the silicon element. 4. Description of the preferred embodiment: FIG. 1 is a schematic diagram of an application example of an imaging system 10, which includes an embodiment of an imaging device according to the present invention. The application is related to the imaging of an object 12 subjected to radiation 14. The radiation may be, for example, X-ray radiation, and the object may be part of a human body. The imaging device includes an active one-pixel semiconductor imaging device (ASID> 16, this AS ID includes a majority of pixel units 18. The imaging device can directly detect high-energy radiation, such as X-rays, 7 rays, / 8 rays, or ct Rays, and the concentration of each pixel unit represents the radiation value incident on the pixel unit. This is the use of freely accessible, active, and dynamic pixels located on or near a corresponding pixel unit detector. The ASID can be designed A single-half-conducting lamina substrate (such as silicon element), which has a pixel unit, and includes a pixel detector 19 and an active pixel mold 20. Another option is to design the AS ID on two substrates , Its one piece is provided with an array of pixel detectors 19, and the other substrate is provided with an array ----; ------ ^ -installed ------ order ------ j line (Please read the precautions on the back before filling in this page) This paper size is applicable to China National Standard (CNS) Α4 specification (210X 297 mm) 24 Α7 Β7 printed by Beigong Consumer Cooperative of Central Bureau of Standards of the Ministry of Economy V. Description of invention ( 21) the active pixels 霣 路 20, the two substrates are For example, the conventional collision bonding technology is mechanically connected to each other. In fact, each pixel unit 18 is defined by an M electrode (not shown) on the substrate, and these electrodes can apply a bias voltage to define the detection of the pixel unit 18 Area (that is, the pixel detector 19). The active pixel circuit 20 (such as transistors, capacitors, etc.) in the form of a small structure can be defined on each pixel unit 18 or located in the associated At one of the corresponding positions on the two substrates, for example, when a photon or radiation particle is incident on the depletion region of the pixel unit 18 * it can accumulate the charge generated in the pixel detector. The size of the source pixel circuit 20 and the pixel detector 19 can be in the order of several tens of meters (for example, 10 to 50 meters). The following describes various examples of the active pixel circuit with reference to FIGS. 2, 8, and 11. As described above As mentioned above, the active pixel circuit 20 can be formed with the semiconductor semiconductor 16 on the pixel unit 18 as part of the semiconductor processing process. Special processing techniques can be used to integrate the detected pixels Image on the same chip Circuit. Another option is that the active pixel circuit 20 can be fabricated on the second wafer, and the pixel detector 19 corresponding to each pixel unit 18 on the first wafer can be assigned. The two components can be used later. Connected together by known methods, such as collision bonding technology, the active pixel circuit 20 of each pixel unit 18 is located near (behind) the corresponding pixel detector 19 of the pixel unit 18 and placed on it. The pixel detector 19 is made with a depletion region, so that when a photon is photoelectrically absorbed in a semiconductor substrate 16 of a pixel unit 18 to generate a charge, or when a charged ionization ionizes a pixel Unit 18 semiconductor substrates. The paper size is in accordance with Chinese National Standard (CNS) Α4 specification (210Χ297mm) ^ -binding I? Line (please read the precautions on the back before filling this page) 25 A7 B7 Ministry of Economic Affairs Central Standards Bureau Printed by the Industrial and Consumer Cooperative Society 5. Description of the invention (22 In the depletion region of 16, a small pulse flows from the depletion region of the semiconductor substrate to the active pixel circuit 20 of the pixel unit 18. After sugar, a relevant value of the electronic pulse is collected in an active circuit element, which can be directly used as a charge value or an equivalent voltage or current value, so that the new charge generated by the radiation that enters subsequently can be doubled. On top of it. A possible example of a gathering device is an accumulating sleeping vessel or an accumulating mold grid. The charge accumulation process in an active pixel circuit 20 continues until the control signal 24 sends out a control signal, Μ initiates a process of reading out information, which is by addressing each pixel unit * The way to read the information from each individual pixel unit. During the readout of these accumulated charge values, the charge will continue to accumulate because the readout function for detecting each pixel unit can always be completed independently. The pixel circuit may be selectively reset after reading out, M releases the circuit assembly of the load, and then each pixel has no effect for a very short time (in fact, there will be no dead time as shown). Therefore, each pixel only has no effect during the reset period. Figure la points out the charge accumulation principle of an example of a pixel-based charge accumulation element according to the present invention. In this example, a field effect crystal FET (FET) is formed on a semiconductor substrate. In a P-type silicon substrate 1, N-type doped plaques 4 and 6 form the source and drain clearly, respectively. The electrodes of the source electrode 3 and the drain electrode 5 are formed in an oxide layer 2, and a gate electrode 7 is formed above the oxide layer 2. Due to the gate capacitance of the field effect crystal, the charge is concentrated on the gate 7 of a gold oxide semiconductor field effect crystal (MOSFET). When charge accumulates on the FET gate, it reduces the electron concentration in the FET inversion layer 8 (which has the few electron carriers required for FET operation). ----;-^ --- f I installed ------ * ordered ------; shout (please read the notes on the back before filling in this page) This paper standard is applicable to Chinese national standards (CNS) A4 specification (210X297 mm) 26-26 Printed by the Ministry of Economic Affairs Central Bureau of Precision Industry Beigong Consumer Cooperatives 29 ^ 9〇2 A7 B7 5. Description of the invention (23) The maximum concentration that can be gathered depends on the temperature inversion layer The minimum allowable electron density depends on. Therefore, the accumulation of this charge is not affected by any shadow from the dark current of the silicon skull «, as happened in the CCD case, because the charge will not accumulate in any depleted volume. Only the total FET gate area (which can actually be very close to the area of the pixel circuit), the thickness of the oxide layer (which can be several millimeters or tens of millimeters thin) and the dynamic range of the FET (which Determine the maximum gate voltage) to determine the accumulation capacity of the elder. It should be noted that this is only an example of a pixel-based charge accumulation element, and according to the present invention, the charge can be accumulated in any suitable charge accumulation device and implemented in the corresponding pixel circuit. The pixel pitch can be as small as 10 meters, which results in excellent position resolution M and subsequent excellent image resolution. FIG. 2 illustrates a preferred example of an active pixel circuit 20, which is used in a pixel unit of an example of an imaging device according to the present invention. This example of the present invention uses FETs, which are arranged in a grid-level amplifier circuit connected to the gate of the amplifier and the cathode of the amplifier. The VBIAS 40 is a tilt input across the depletion region to form the pixel detector 19 of the pixel unit. The pixel detector 19 is indicated by diode symbol D11. In a pixel road itself, SI GOUT 42 is an analog signal out, and VANA 44 is an analog power in. RES-R-1 is a reset shot, and ENA-R-1 is the starting round of the pixel circuit. When both RES-R-1 46 and ENA-R-1 48 are low, the charge system gathers in the gate of the crystal M11A 50. The grid capacitance substantially forms the input node capacitance (ie, entanglement capacitance), so that the charge storage capacity can be maximized. One of the objectives of the present invention is to provide the maximum charge accumulation ability, which is achieved by making all other circuits (and the detection paper size applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1.1 — .. Binding ^ Travel (Please read the precautions on the back before filling in this page) 27 A7 B7 printed by the Beigong Consumer Cooperative of the Central Falcon Bureau of the Ministry of Economic Affairs 5. Invention Instructions (24)) The storage of components or unwanted capacitance is minimized and the substance The input charge capacitors Ml 1A 50 form all input node capacitances. For the 35-meter-by-35-meter pixel road, its Mil A 50¾ capacity can be 2 micro-drops, and the FET gate voltage dynamic range can be at least 2 volts. This storage capacity corresponds to approximately 25,000,000 electrons, and exceeds 100 times the capacity of a CCD with the same pixel size. It should be noted that in the above example, the withdrawal method of the FET device 2 actually forms all of the pixel cells. In the above example of 35-meter-by-M35-meter-meter pixels, the total storage capacity of the detector and other components and corresponding pixel detectors in each pixel circuit is in a number of Farah. The capacitance of the charge storage device should be maximized, and in any case should be substantially larger than the storage capacity in each pixel unit. In the above example, the power capacity of the FET is used as an electrical device for the pixel circuit, and it exceeds 90% of the total capacity of the pixel unit. The pixel unit includes a pixel detector and corresponding pixel circuit . The result of this is that virtually all collected «charges will be collected in the mold-collection FET * instead of being distributed between each detector and the remaining elements of the pixel road. I will find that the use of FETs can provide an example that is unique to the present invention. In this example, a pixel charge storage device (such as a FET gate or a small capacitor) can be used to maximize the accumulation of 霣 荷, and the total reaches Most of each pixel is incorporated into the node capacitance. In order to read out the pixel unit, ENA-R-1 adopts a high-energy state, and allows current to flow from the electric crystal M11A 50 to the SIGOUT 42 through the M11B 52. By changing RES-R-1 to a high energy level and resetting the pixel path *, the Chinese National Standard (CNS> A4 specification (210X 297 mm) is used at this paper scale 28 1.1 —I · —M — ^ Install n Order H — ~ -4 'line (please read the precautions on the back before filling in this page) A7 B7 printed by Beigong Consumer Cooperative of Central Bureau of Standards of the Ministry of Economy V. Description of invention (25) RES-R-1 After a few seconds have elapsed at the high energy level, any accumulated charge will be removed from the gate of the m-crystal M11A 50. Directly after RES-R-1 46 returns to the low energy level, the charge can begin to accumulate in the transistor Ml 1A The gate of 50. If no reset pulse is sent to the RES-R-1 46 reset input, it is found that when the WI is activated and the ENA-R-1 becomes higher energy level, a read operation will not destroy its charge, otherwise It only causes a roll proportional to the accumulated load. This allows multiple readings without resetting. FIG. 11 illustrates another example of an active pixel circuit 320, which is used for imaging according to the present invention. In the pixel unit of the device example. This example is similar to the one in Figure 2. The pixel detector is shown at PD 319 of the pixel unit. Among them, VBIAS 140 is a IE, OUT 342 is an analog signal output, RESET 346 is a reset round connected to reset FET 347, and ENABLE 348 is a start input connected to the pixel circuit start FET 352. When When ENABLE 348 is drawn at a low level and RESET 346_ is at a high level, charges (electrons) are collected in the gate of a charge storage FET 350. To read out the pixel unit, ENABLE 348 adopts a high level and allows current flow Flow from FET 350 through FET 352 to OUT 342. Make RESET low-level to reset the pixel circuit, here when RESET 346 is already in low-level and only reaches a few meters, any concentrated load will have been transferred by FET The gate of 350 is removed. Directly after RESET 346 returns to the higher order, it can be turned on immediately to accumulate charge on the gate of FET 350. If no reset pulse is sent to the reset to turn into RESET 346, it can be found that the start When the input ENABLE becomes higher, a read operation will not break the charge, on the contrary, it will only cause a «current proportional to the accumulated load. Therefore, it can be seen that the circuit of the eleventh circle is similar to the figure This paper standard is applicable to China National Standard (CNS) A4 Specification (2 丨 0X297mm) 丨 ._----- ^ --- ^ -installed ------ order ------ 1 Granville (please read the notes on the back before filling this page ) Printed at B7 by the Beigong Consumer Cooperative of the Central Bureau of Economic Affairs of the Ministry of Economic Affairs. 5. Description of the invention (26, the eleventh road in Figure 11 includes diodes 354 and 356, which are used as overload protection roads for the pixel II road design. These diodes provide electrostatic protection against FET overload and possible damage to FETs. If the FET gate 350 accumulates more than a predetermined threshold of charge (for example, corresponding to its bias voltage of 5 volts), the galvanic current will begin to flow through the dipolar wok 356 toward the ground, thus protecting the PET 350. The pixel units are created to, for example, accept all radiation agents outside the periphery of the object to be imaged. Preferably, the two FETs 350 and 352 are used as a grid-to-negative amplifier class application. In this architecture, the two FETs 350 and 3 52 provide a larger impedance transformation, but they will not increase their pitch. Therefore, the noise level from each pixel circuit described in this embodiment is only about 500e, and the pixel circuit is kept at a very small size (as small as 10-20 m pixel size), and has a great dynamic of about 50,000,000 e Fan Garden, and has the ability to access by value. Figure 11 also illustrates the possible use of the dual transistor 360. The use of the bipolar Jiao Jing carp connected to a voltage source VBASE will be described later. Fig. 10 is a schematic plaque of one embodiment of the imaging device according to the present invention. The imaging device shown in FIG. 10 includes a pixel detector substrate 214, and has an active pixel circuit formed on the second substrate 212. The second substrate is connected to the pixel detector with a buffer 222器 214. The active pixel 20-based M-FET symbol is schematically shown in the substrate 212. The pixel detector substrate 214 is provided with a continuous flip electrode 110 at the position where it is exposed to enter the radiation. In other words, in the tenth circle, the incoming radiation is assumed to arrive in the upward direction. Therefore, the main snakehead of the pixel detector substrate 112 is placed behind the continuous electrode 110. In this layer 112 ---- ^ --- J --- ^ -install ------ order ----- 1, silver (please read the notes on the back before filling in this page) Common Chinese National Standard (CNS) A4 specification (210X297mm) -30 30 A7 B7 2 ^ 39〇2 5. Description of the invention (27) There are many pixel detectors 114 on the rear surface. It is an array of the pixel detector «pole 114, and can effectively define each pixel detector unit 19 in the pixel detector substrate 214. Each pixel detector 114 is mechanically coupled to an individual pixel circuit 20 using a separate buffer 2222 and mechanically. It will find that the representative in Figure 10 is only for illustration, not to scale. In addition to the features already described above, Figure 10 also illustrates other optional features * They can isolate each pixel pixel in the manner described below.

對於不同之檢波器像素單元,其對應之霉荷儲存FETs 350可能聚集不同數量之電荷,逋是因不同輻射線或光強 度射入該等檢波器像素上之结果。隨後在相鄰像素之間產 生一電位差。若各像素未電子隔離,則逭霣位降可能造成 訊號電荷由一像素電路經過該檢波器而洩漏進入相鄰之像 素霄路。其聚集時間愈長,則問題可能更駸重。根據本發 明之一較佳論點,藉著提供電子隔離之機構,或同等最大 化相鄰像素單元之霣阻即可消除或減輕逭效應。據此,在 檢波器像素單元之間(亦即界定該檢波器像素單元之II極 114間)塗上一鈍化層116,例如聚珠胺。這可電隔離鄰接 之檢波器像素單元,因為此一鈍化層是不導電的。此外, 可能在該鈍化層上設有電極,且所施加之«KV將造成一 阻擋層電壓118,並穿透該檢波器髏積內侧數微米。因此 企圃由該像素電路20内之霣荷聚集FET逸出之罨荷,將遭 遇該阻擋層霄壓,並且將不會散發進入相鄰之像素電路PET Ο 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) !1 -^ ^ 裝 訂 ^線 (請先閲讀背面之注意ί項再填寫本頁) 經濟部中央揉準局員工消费合作杜印製 31 A7 B7 2^39〇2 五、發明説明(28 ) 再者,第三棰選擇是提供一棰位在每一像素電路入口 處之NPN型電晶體(雙極電晶黼)。逭係顯示於第11圖。 當該雙極霣晶體之基極係設在一適當之霣壓,而與該等像 素霄路之所有雙極電晶體共通時(約1伏特),則該雙極 霣晶體將如一種二極體般作用,以允許霣荷流入該FET 350 之柵極,但同時防止其沿著相反路徑之任何逃逸。在逭方 式中,雖然可在電荷聚集FETs 350之柵極處保持不同之電 位降(其正比於已聚集之不同訊號霉荷),在像素霣路入 口處之霣位係與所有像素霣路共通。因此,根據本發明之 這觀黠,可在成像装置中提供霉隔離像素單元之機構,Μ 致可在每一像素霣路上保持所有或大致全部之聚集電荷。 當聚集時間相當長時,本發明之這項較佳觀酤特別有用* 例如在數十或數百撤秒之範圍中時,且當聚集時間是在數 撤秒或數十或數百微秒之範圍中時甚至更有用。 一像素電路20可聚集一霄荷,其在每一像素上代表多 達60,000,000個霣子,同時保持一像素尺寸少於50乘以50 撤米。該像素厚度或完全耗盡之像素檢波器部份可達到3 毫米厚,因此使得這些檢波器對少於200仟《子伏特能1 之X射線非常敏感。對於已荷電之輻射線,其茧敏度實際 上為百分之百。最小之像素厚度可以是200微米之等级, 其可在欲檢出較低能量之荷«輻射時改良其解晰度。對輻 射線不敏感之半導體基片空載層可以薄至50毫撤米,Μ致 來自具有少於30仟霣子伏特能量之/9輻射線訊號不會漏失 本紙張尺度適用中國國家橾準(CNS ) A4規格(210X297公釐) ----;-----^ ,丨裝------訂------1球 (請先閲讀背面之注意事項再填寫本頁) 經濟部中央標準局WC工消費合作社印製 32 2939ο总 Α7 Β7 五、發明説明(29 ) 經濟部中央梯準局貝工消费合作社印裝 第3圃是一第1画控制«子設計24之一棰可能架構示 意圖,並指出霣子控制設計24與該等像素單元18 乘η矩 陣型有源電路20之關係。爲了易於說明,在第3圔中只圔 解說明一種9餡像素單元之陣列,並且只有顯示某些構成 第1圖中路徑22之訊號線路。吾人将發現根據本發明之成 像装置通常包括遠多於第3圈中所示之像素單元數目。行 灌定通揖電路60控制該行讀出(ΕΝΑ 74>及行重置(RES 76〉 ,且列邏輯霣路62回應一時鐘脈衝訊號79而由每一像素« 路20起動(C0L-SEL)已聚集電荷值之讀出。 控制電子設計24包括行選定邏輯霣路60、列緬址邏輯 霣路62、霄源電路70、ADC 56、與訊號處理霣路58。若非 全部,最好某些控制霣子設計24係設在基片16上,而位於 該陣列像素單元18所形成之影像陣列周邊。 霄源電路70經由線路54 (第3圖概略示出者)供«至 該等像素單元18上之各餹有源電路20,並且可額外安排經 由線路(未示出)供應偏壓至界定該等像素單元*之霣棰。 行選定邏辑霄路60分別經由行起動及重置線路64與66 提供訊號。(在第3圖中亦概略示出),用Μ分別選定該 等像素單元18各値有源電路20之讀取及重置。該等行選定 64及行重置66線路係分別連接至該行每一像素霣路之起動 蠄入ENA-R-1 48及重置輪入RES-R-1 46。在行遘定邏輯霣 路60中亦顯示用Μ掃描相繼各行之行起動74與行重置76訊 號。其可看出該重置脈衝76係随在該行起動臃衝74之後, Μ造成該等有源電路在讀出後重置。 ----:-----一— 裝------訂------^旅 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) Α4規格(210 X 297公釐) 33 五、發明説明(30 ) A7 B7 經濟部中央橾準局貝工消费合作社印製 該列灌定邏輯電路62係有效地包括用以經由該等行線 路68 (在第3圖3亦概略示出)灌定訊號輓出之多路調制 器,每一條列線路皆連接至該列中每一像素電路20之SI GOUT 輪出42。因此該列選定邏輯電路62中所代表之C0L-SEL訊 號78係選定用以讓出像素單元18各個有源電路20之各列, 而為目前各行起動脈衝74所選定者。在所示實施例中,於 一行起動時段期間,該列選定脈衝係回應該時鐘脈衝CLK 79而送至相繼之列位置,以致在該行選定脈衝繼續送至下 一行之前,目前所選行上各値有源像素電路之聚集電荷值 係在每一時鏟脈衝下轅出。剛讀出行之每一有源像素電路 隨後同時用該行重置脈衝76重置。 用傳統雙金羼化技術即可輕易實現第3·中所示連接 裝置。雖然,如參考第3圖中所示者,各像素係以預定順 序相繼讀出,吾人將發現各像素事實上可Μ隨機存取方式 藉著獨立之行列起動訊號進出。吾人亦將發現其掃描方向 可相反之(行至列),或事實上各個像素可藉由適當之行 列起動訊號而Μ完全隨機之次序存取。吾人亦將發現可輕 易修改其串列或平行處理之程度,以符合每一種應用之需 求。例如所有行可在一高起動能階下同時重置,以致該列選 定時鏟脈衝將平行_出所有行,藉此增加其讀出速率。各 行之重量不需配合其讀出速率。在多次讓取後,可能以一 比該讀出速率低之速率重置每一行。吾人將發現各行與列 之指定可以是隨意的,並且可相反之。 為以一有效方式覆蓋一極大之成像表面,各像素單元 請 先 閲 背. 66 之 注 意 事3」 裝 訂 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 34 A7 B7 經濟部中央樣準局貝工消费合作社印製 五、發明説明(31 ) 最好是分群組合成m乘η個像素之方塊,而每一方塊內之像 索皆可在各行中相繼讓出與重置。第4匾是一示意_,指 出一種2行乘Μ4列之像素電路20方塊。該等像素霣路在 各電晶體MijA之柵極上聚集霄荷,其中i = i,2且j = l,2 ,3, .4。為保持各電晶體位於一低霣位,每一柵極在讀出 後即接地。藉箸施加一串時鏟脈衝至該CLK輪入80,及一 高脲衝遇期(讚取位元)至一RB-IN輪入82,即可啟姶讀 出作用。 在第一個時鏟脈衝週期間,RB-IN輪入82起動開動SW4 ,並連接第4列之類比輪出線路68至該類比輸出ROUT 88 。因此,當第一行之行起動輪入ENA-R-1為高能階時,其 在此第一値時鐘脈衝週期間將打開第一行之開關霣晶體 M1*B 52,而該像素霄路20(1,4)電晶體M14A 50檷極上所 儲存之任何«荷所代表之訊號霣流,將流過該«晶體及經 由開两SW4滾至類比鑰出ROUT 90。 在該時鐘脈衝CLK之下一次脈衝遇期之前,必須下降 RB-IN輪入。原先在觸發霣路U1輪入處之高能階係Μ時鐘 脈衝串列CLK送至觸發霣路U2之_入及開關SW3,隨後此開 關係連接該第三列之類比輪出線路68至類比轜出ROUT 88 ,以致一代表該像素霣路20(1,3)«晶臁M13A 50柵極上所 儲存任何電荷之訊號電流,將可滾遇該霣晶鼸且經由開闢 SW3流至類比綸出ROUT 90。因爲SW4現在爲低(下)能階, 其不會連接第四列之類比輪出線路68。因此該讓取位元係 波狀移經各開關SW4-SW1及梅發開蘭U1-U4,此是因該時鑊 本紙張尺度適用中國國家標準(CNS ) Μ規格(210X297公釐) 35 —H —| I ^ ^ — 裝 訂 線 (請先閲讀背面之注意事項再填寫本頁) 經濟部中央樣準局貝工消费合作社印製 A7 B7 五、發明説明(32 ) 脈衝CLK之連薄式時鐘脈衝所致。該列起動觸發開關U1-U4 形成第一傾移位寄存器。 當讀取位元以時鐘脈衝送出該觸發開關U4時,其可再 以時脈方式送回該觸發開關U1。其亦Μ時脈方式送至行起 動邏輯電路U5-U7與行重置纽輯電路U9-Ul 1之時脈輪入。 每一次它們由該觸發開關U4之輸出接收一時脲輸入時,它 們將分別推進一讀取位元及一重置位元,該重置位元在該 讀出位元後方一階梯處移動。該行起動a輯電路之觸發開 關U5-U7形成第二痼移位寄存器,而行重置觸發開關U9-U11 形成第三個移位寄存器。 在這方式中,每次讀出一行,該讀取位元即上移一行 。同理,該重置位元現在亦上移一行,但位於該讀取位元 後方一行。當最後一個觸發開關U11之重置位元讀出時, 其可供應至該讀出位元之RBO输出84,並可啟動一新的讚 出循環。相繼讀取操作間之時刻應夠短,Μ保持各霄晶齷 Mi j Α之柵極具有極小之電位差,最好電位差比該重置霣位 (或零霄荷聚集之霄位)低2伏特。 在本發明之另一較佳實施例中,第4·中所示柑同功 能係可用一計數器實現之,該計數器產生行與列之位址, 而可解碼成如第3圖之相同控制訊號,如COL-SEL 78、 RES 76與 ΕΝΑ 74 ° 各霣晶體Mij Α之儲存能力視該霣晶髓柵棰上之電容及 «壓而定。該等霣晶睡Mi jA可忍受逹10伏特,但其想要的 是保持該柵極霄壓逮低於此,且至多達離該重置電位約2 本紙張尺度逋用中國國家標準(CNS ) A4规格(210X297公釐) 36 ^ ^ 裝 訂 ^旅 (請先閲讀背面之注意事項再填寫本頁)For different detector pixel units, the corresponding mold charge storage FETs 350 may accumulate different amounts of charge, which is the result of different radiation or light intensity incident on the detector pixels. Then, a potential difference is generated between adjacent pixels. If each pixel is not electronically isolated, the early drop may cause signal charge to leak from a pixel circuit through the detector into the adjacent pixel road. The longer the aggregation time, the more serious the problem. According to a preferred argument of the present invention, by providing a mechanism for electronic isolation, or equivalently maximizing the resistance of adjacent pixel units, the effect of elimination can be eliminated or reduced. According to this, a passivation layer 116, such as poly bead amine, is coated between the detector pixel units (that is, between the II electrodes 114 defining the detector pixel unit). This can electrically isolate adjacent detector pixel cells because this passivation layer is not conductive. In addition, an electrode may be provided on the passivation layer, and the applied «KV will cause a barrier voltage 118 and penetrate a few microns inside the cross-sectional area of the detector. Therefore, the enterprise garden will escape from the load of FETs in the pixel circuit 20 and will encounter the pressure of the barrier layer, and will not be emitted into the adjacent pixel circuit PET. This paper standard is applicable to the Chinese National Standard (CNS ) Α4 specification (210Χ297mm)! 1-^ ^ Binding ^ line (please read the note on the back first and then fill in this page) Employee Consumer Cooperation Du Printing 31 A7 B7 2 ^ 39〇2 5. Description of the invention (28) Furthermore, the third option is to provide an NPN transistor (bipolar transistor) at the entrance of each pixel circuit. It is shown in Figure 11. When the base of the bipolar engraved crystal is set at an appropriate voltage and is common to all bipolar transistors of the pixel roads (approximately 1 volt), the bipolar engraved crystal will behave like a dipole It acts as a body to allow the charge to flow into the gate of the FET 350, but at the same time prevents any escape along the opposite path. In the mode, although the different potential drops can be maintained at the gate of the charge accumulation FETs 350 (which is proportional to the different signals of the accumulated charge), the entrance at the entrance of the pixel road is common to all pixel roads . Therefore, according to the concept of the present invention, a mechanism for mold-isolating pixel units can be provided in the imaging device, so that all or substantially all of the accumulated charge can be maintained on each pixel path. This preferred concept of the present invention is particularly useful when the aggregation time is quite long * For example, in the range of tens or hundreds of seconds, and when the aggregation time is in seconds or tens or hundreds of microseconds It is even more useful when it is in the middle. A pixel circuit 20 can gather a small lotus, which represents up to 60,000,000 dips on each pixel, while keeping a pixel size less than 50 times 50 meters. The pixel thickness or completely depleted pixel detectors can be up to 3 mm thick, thus making these detectors very sensitive to X-rays of less than 200 thousand subvolts. For the charged radiation, the cocoon sensitivity is actually 100%. The minimum pixel thickness can be in the order of 200 microns, which can improve the resolution when lower energy charge radiation is to be detected. The no-load layer of the semiconductor substrate that is insensitive to radiation can be as thin as 50 millimeters, so that the signal from the / 9 radiation line with an energy of less than 30 thousand volts will not be lost. CNS) A4 specification (210X297mm) ----; ----- ^, 丨 installed ------ order ------ 1 ball (please read the precautions on the back before filling this page ) Printed by the WC Industrial and Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs 32 2939ο Total Α7 Β7 V. Description of the invention (29) Printed and printed by the Central Bureau of Economic Affairs of the Ministry of Economic Affairs of the Central Bureau of Economics and Technology Co., Ltd. The third nursery is a first painting control A schematic diagram of possible architectures and points out the relationship between the design of the control unit 24 and the pixel units 18 by the n-matrix active circuit 20. For ease of explanation, in the third image, only an array of 9-filled pixel units is explained, and only certain signal lines that constitute the path 22 in the first image are shown. I will find that the imaging device according to the present invention generally includes a much larger number of pixel units than shown in the third circle. The row irrigation fixed circuit 60 controls the row readout (ΕΝΑ 74> and row reset (RES 76>), and the column logic circuit 62 responds to a clock pulse signal 79 and is activated by each pixel «circuit 20 (C0L-SEL ) The readout of the accumulated charge value. The control electronics design 24 includes row selection logic 60, column address logic 62, Xiaoyuan circuit 70, ADC 56, and signal processing 58. If not all, it is best The control design 24 is located on the substrate 16 and is located around the image array formed by the pixel unit 18. The source circuit 70 is supplied to these pixels via a line 54 (shown schematically in FIG. 3) Each of the active circuits 20 on the unit 18, and can additionally be arranged to supply bias voltages to define the pixel units * via lines (not shown). The row selection logic road 60 is activated and reset through the row, respectively Lines 64 and 66 provide signals. (Also shown schematically in Figure 3), use M to select and read the pixel units 18 and the active circuit 20 respectively. The row selection 64 and row reset Line 66 is connected to ENA-R-1 48 and the start of each pixel in the row. Set the turn into RES-R-1 46. The line start logic 74 and the line reset 76 signal of the successive lines are also displayed in the line setting logic 60. It can be seen that the reset pulse 76 is followed by the After the line starts to run 74, Μ causes the active circuits to be reset after reading. ----: ----- 一 — 装 ------ 定 ------ ^ 旅 ( Please read the precautions on the back before filling out this page) This paper size is applicable to the Chinese National Standard (CNS) Α4 specification (210 X 297 mm) 33 V. Invention description (30) A7 B7 Ministry of Economic Affairs Central Bureau of Industry and Fisheries Consumption The cooperative printing the column filling logic circuit 62 effectively includes a multiplexer for drawing out the signal through the row lines 68 (also shown schematically in FIG. 3), each column line is connected The SI GOUT of each pixel circuit 20 in the column is round 42. Therefore, the COL-SEL signal 78 represented in the column selection logic circuit 62 is selected to yield each column of each active circuit 20 of the pixel unit 18, It is currently selected by the starting pulse 74 of each row. In the illustrated embodiment, during the starting period of one row, the selected pulse of this column corresponds to the clock pulse C LK 79 is sent to successive column positions, so that before the selected pulse of the row continues to be sent to the next row, the accumulated charge value of each active pixel circuit on the currently selected row is output under the pulse of each time. Just read Each active pixel circuit on the trip is then simultaneously reset with the reset pulse 76 of the row. The connection device shown in Section 3 can be easily realized using the traditional double-golden technology. Although, as shown in reference to Figure 3 In addition, each pixel is read out one after another in a predetermined order, and we will find that each pixel can actually be accessed in random access mode by independent row and column activation signals. We will also find that the scanning direction can be reversed (row to column), or in fact the individual pixels can be accessed in a completely random order by the appropriate row and column activation signals. We will also find that the degree of serial or parallel processing can be easily modified to meet the needs of each application. For example, all rows can be reset at a high starting energy level at the same time, so that the column selection timing shovel pulse will parallel out all rows, thereby increasing its readout rate. The weight of each row does not need to match its reading rate. After multiple yields, each line may be reset at a rate lower than the readout rate. We will find that the designation of each row and column can be arbitrary, and can be reversed. In order to cover an extremely large imaging surface in an effective way, please read the back of each pixel unit first. Notes on 66 3 ”The size of the bound paper is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 34 A7 B7 Central Ministry of Economic Affairs Printed by the Beiguan Consumer Cooperative Society 5. The description of the invention (31) It is best to synthesize m by n pixels in groups, and the image lines in each block can be successively ceded and reset in each row. . The fourth plaque is a symbol_, indicating a block of 20 pixel circuits of 2 rows by M4 columns. These pixels are gathered on the gate of each transistor MijA, where i = i, 2 and j = l, 2, 3, .4. To keep the transistors in a low position, each gate is grounded after reading. By applying a string of time shovel pulses to the CLK round 80, and a high urea collision period (like bit) to a RB-IN round 82, the reading function can be started. During the first time shovel pulse cycle, the RB-IN wheel 82 starts SW4 and connects the analog wheel output line 68 in the fourth column to the analog output ROUT 88. Therefore, when ENA-R-1 of the first row starts to turn into the high energy level, it will turn on the switch of the first row M1 * B 52 during the first value clock cycle, and the pixel will be 20 (1,4) Transistor M14A Any signal stored on the 50 pole of the «represented by the Netherlands, will flow through the« crystal and roll through two SW4 to the analog key out ROUT 90. Before the next pulse encounters the clock pulse CLK, it must fall RB-IN round. The high-energy level MCLK pulse train CLK at the round-in of the trigger U1 is sent to the input and switch SW3 of the trigger U2, and then the open relationship connects the analogous round-out line 68 of the third row ROUT 88, so that a signal current representing any charge stored on the gate of the pixel 20 (1,3) «Crystal M13A 50, will be able to meet the crystal and flow through the SW3 to the analog fiber ROUT 90. Because SW4 is now at a low (lower) energy level, it will not connect to the analogous round-out line 68 in the fourth column. Therefore, the bit shifting system should be moved through the switches SW4-SW1 and Meifa Kailan U1-U4. This is because the paper standard of the wok is applicable to the Chinese National Standard (CNS) M specifications (210X297 mm) 35 — H — | I ^ ^ — Gutter (please read the precautions on the back before filling in this page) A7 B7 printed by Beigong Consumer Cooperative of the Central Bureau of Economics of the Ministry of Economic Affairs V. Invention description (32) Pulse CLK connected thin clock Caused by the pulse. This column activates trigger switches U1-U4 to form a first tilt shift register. When the read bit is sent out of the trigger switch U4 as a clock pulse, it can be sent back to the trigger switch U1 in a clock mode. It is also clocked in when the clock mode is sent to the line start logic circuit U5-U7 and the line reset button circuit U9-Ul 1. Each time they receive a momentary urea input from the output of the trigger switch U4, they will advance a read bit and a reset bit, respectively, and the reset bit moves at a step behind the read bit. This row activates the trigger switches U5-U7 of the series a circuit to form the second shift register, and the row reset trigger switches U9-U11 form the third shift register. In this way, each time a line is read, the read bit is shifted up by one line. In the same way, the reset bit is now also moved up one line, but it is one line behind the read bit. When the reset bit of the last trigger switch U11 is read, it can be supplied to the RBO output 84 of the read bit, and a new praise cycle can be started. The time between successive reading operations should be short enough, M keeps the gates of each micro crystal Mi j Α to have a very small potential difference, preferably the potential difference is 2 volts lower than the reset position (or the zero-point charge level) . In another preferred embodiment of the present invention, the same function shown in Section 4 · can be implemented by a counter that generates row and column addresses and can be decoded into the same control signal as in Figure 3 , Such as COL-SEL 78, RES 76 and ΕΝΑ 74 ° The storage capacity of each crystal Mij Α depends on the capacitance and pressure on the crystal lattice of the crystal. These 難 晶 睡 Mi jA can tolerate 10 volts, but what they want is to keep the grid voltage lower than this, and up to about 2 from the reset potential. This paper standard uses the Chinese National Standard (CNS ) A4 size (210X297mm) 36 ^ ^ Binding ^ Brigade (please read the notes on the back before filling this page)

經濟部中央標準局男工消費合作社印製 五、發明説明(33 ) 伏特之霣位差。對低於50撤米乘Μ 50徹米之像素尺寸,其 柵極轚容可上達約5撖撤法拉。逭意指可儲存6X 1〇τ但1¾ 子。這是一CCD容量之約86倍,而該CCD是将霣荷儲存在該 基片内之儲存勢阱中。 為能了解根據本發明成像装置所能呈現之優點,可考 慮用尺寸為2公分乘M2公分之單成像裝置。若該像素尺 寸是35撤米乘Μ 35撤米,則該成像平面包括571行乘以571 列之像素。據此,若該成像装置是一個ASID,則用速率為 10百萬赫玆之倍頻器時脈可在每32撤秒内讀出全部326,041 個像素。因此,在造只有一讀出頻道之範例中,每32撤秒 將顯示一幀格,以呈現實時成像。因為該等像素電路具有 數千萬個霣子之霣荷儲存能力,一個ASID事實上可解決未 來可見之最高強度應用。這不是Μ影像空間解晰度(在此 範例中像素尺寸是35撤米)及空載與惰性成像時間爲代價 。事實上可在讀出後立即重置每一行之像素,只要持續著 下一行之讀出作用(在先前段落中已解釋其讀出循環)。 這行讀出之時間是100毫徹秒乘以每行之像素數目,亦即 57.1撤秒。隨後,超過32毫秒之影像幀格顯示時間時,其 惰性時間只有57撤秒或百分之0.17,這實際上是無空載時 間。因此一 ASID装置可達成高空間解晰度、具有32毫秒影 像幀格更新之實時成像、極高之動態範園、實際上無空載 時間、極低之霣子噪音,且除此之外其在逭特定範例中只 擗要一讀出頻道,而為一具成本效率之方式。亦藉箸直接 進出每一値像素«路,其在一 AS ID中儲存一測定影像幀格 I.n—^— ; I裝 訂 {線 (請先閲讀背面之注意事項再填寫本頁) 本紙浪尺度逋用中國國家標隼(CNS ) A4規格(210X297公釐) -37 - 37Printed by the Male Workers' Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs. 5. Description of Invention (33). For pixel sizes less than 50 meters removed by M 50 metre, the gate volume can be up to about 5 to remove the farad. "Yi" means that 6X 1〇τ but 1¾ son can be stored. This is about 86 times the capacity of a CCD, and the CCD stores the charge in the storage potential well in the substrate. In order to understand the advantages presented by the imaging device according to the present invention, a single imaging device with a size of 2 cm by M2 cm can be considered. If the pixel size is 35 metric meters by 35 metric meters, the imaging plane includes 571 rows by 571 columns of pixels. According to this, if the imaging device is an ASID, all 326,041 pixels can be read out every 32 seconds with a frequency multiplier clock rate of 10 million Hz. Therefore, in the example of creating only one readout channel, a frame will be displayed every 32 seconds to present real-time imaging. Because these pixel circuits have the ability to store tens of millions of yuans, an ASID can actually solve the highest intensity applications that will be seen in the future. This is not at the expense of the spatial resolution of the M image (in this example, the pixel size is 35 meters) and the no-load and inert imaging time. In fact, the pixels of each line can be reset immediately after reading, as long as the reading effect of the next line continues (the reading cycle has been explained in the previous paragraph). The time for reading out this line is 100 milliseconds times the number of pixels in each line, which is 57.1 seconds. Subsequently, when the display time of the video frame exceeding 32 milliseconds, the inert time is only 57 seconds or 0.17 percent, which is actually no-load time. Therefore, an ASID device can achieve high spatial resolution, real-time imaging with 32 millisecond image frame updates, extremely high dynamic range, practically no dead time, extremely low noise, and other than that In the specific example, only one channel is read out, which is a cost-effective way. Also use 箸 to directly enter and exit each pixel «way, which stores a measurement image frame In — ^ — in an AS ID; Use China National Standard Falcon (CNS) A4 specification (210X297mm) -37-37

經濟部中央橾準局貝工消費合作社印$L A7 B7 五、發明説明(34 ) 是柑當填碎的,這是利用每一個聚集影像幀格所儲存之各値 像素基座及由其扣減之。在一實時成像應用中,這測定時 間可在每數秒或更少之時間内完成,因為其可保持該等基 座(消皤脈衝霣平)及ASID中之極低之噪轚霣平檯定。 第8匾是一有源電路20另一範例之電路圔,其用於根 據本發明一實施例之像素單元18中。 像素檢波器19是用連接至偏壓VbUs 180之二極膿符 號182表示之(該檢波器亦可能另外當做一霣狙器),經 由電極(未示出)施予這偏壓,而界定該像素單元18之耗 盡體稹或像素檢波器19。 該像素單元18之耗盡區體稹上進入輻射線所產生之霣 荷,係鎗入第一個輸入電晶體184之基極(在此一場效霣 晶體FET具有比如〇.3毫歐姆(ms)跨導係數、及一 100徹安 培之漏源電流值I與〇 . 1撤撤法拉之霣容)。該翰入FET 184之源極與漏極係連接在第一個«流源186 (在此是一適 當設計之FET,雖然這可能用一電阻器替換之)及一接地 線路GND 174之間。該電流源186依序連接至一正極霣源線 路 V+ 172。 鑰入FET 184與霄流源186間之接酤係連接至第二個霄 晶體188之一端,而形成一共基極雙極放大器,並由施予 其基極之偏壓控制之。第二個電晶體188之基極係連接至 該偏壓線路Vd 178。第二個電晶髏之其餘端子係經由一反 .饋電容器Cf 190 (例如具有0.3微撤法拉之霣容)連接至 該输入PET 184之基極。 本紙張尺度逋用中國國家橾準(CNS ) A4規格(210X297公釐) ----:--:---II (請先閲讀背面之注意事項再填寫本頁) 訂 38 A7 B7 ^93902 五、發明説明(35 ) 第二艟電晶體188與霣容器Cf 190間之接酤亦連接至 第二個負極鬣源線路V-176之霣流源(在此其是一適當設 計之FET,雖然可能用一電阻器替代之)。因此來自該像 素單元耗盡區體積上進入輻射線所產生之電荷,將可聚集 在該電容器Cf 190處。 X及Y讀出線路,即Xread 160與Yread 164係連接至讀 出邏輯電路198 (在此是一雙基極FET),其依序連接在該 負極電源線路V-176與一輪入開關196(在此是一 FET)之 間,籍此當該Xread與Yread線路160、164上同時供應一訊 號時,該電容器Cf 190上所聚集之霣荷可經由一繪出線路 156_出。該X與Y重置線路,邸Xread 162與Yread 168係 連接至放電邐輯《路100 (在此是一雙基底FET),其依序 連接在該負極霣源線路V-176與一放霣開關192 (在此是一 FET 192)之間,用Μ放霣,並且在此當Xread與Yread線 路162、168上同時供應一訊號時,可重置該霣容器Cf 190 Ο 第8圖中所示《路形成一電荷靈敏放大器,其在反賸 霣容器Cf 190中具有電荷儲存能力,並且具有输出及重置 電路設計。視該霄荷儲存時間及輻射硬性需求而定,可用 諸如結型場效電晶體(J-FET)或M0SFET之適當技術補足該 等FET。若霣容器Cf 190具有0.3微撤法拉之霣容,逭即對 應一約1.8百萬個電子之儲存容量。若霣容器Cf 190具有 1微微法拉之霄容,則這對應於約6百萬個電子之儲存容 置。在輪出線路中,具有一重置FET之最大輸出時脈頻率 本紙張尺度適用中國國家標準(CNS ) A4規格(2丨OX29?公釐) | ^ 裝 H 訂-J線 (請先M讀背面之注意事項再填寫本頁) 經濟部中央橾準局貝工消費合作社印製 A7 B7 經濟部中央梂準局貝工消費合作社印製 五、發明説明(36 ) 為5至10百萬赫茲。在該綸出線路中若沒有一重置FET,則 埴最大檢出頻率減少約200仟赫玆。 第8圖中所示電路設計可實施於例如具有約150乘Μ 150微米尺寸之像素單元上。在諸如7照相術及血管照相 術等應用中,像素尺寸不需小於約150徹米寬。在這案例 中,各像素霄路上額外之空間能用於除了電荷聚集、譲出 及重置Μ外之操作。例如,第8圖之配置可放大已聚集之 電荷值。此外,第8圖配置可在霣荷聚集於該像素電路上 之前改良之,以提供進入輻射撞擊之電荷鑒別。在逭方式 中,對應低於預期能量之進入輻射線可在聚集於像素霣路 上之前排除。環繞該等成像單元陣列所形成成像區之外侧 ,某些或所有控制電路設計24亦可能裂成該半導膿基底晶片 16之一完整部份。 第9Α圖是更詳細控制電路設計24,及其與第8圃所示 基片16上該有源像素霣路型式20之關係示意圃。爲了易於 說明,在第9Α画中只圃示一陣列之16個像素單元,並且只 顯示某些構成第1圖中所示路徑22之訊號線路。吾人將發 現一根據本發明之成像裝置,通常將包括一遠超過第9Α_ 所示數目之像素單元18。 控制電路設計24包括X位址邏輯電路144、Υ位址邏輯 電路146、電源電路150及訊號處理電路148,若非全部, 最好某些控制《路設計24係設在該基片上,而設在該陣列 像素霣路之周邊,此等像素電路亦設在該基片上。«源電 路150經由線路170 (在第9Α圖中概略示出)提供霣源给各 本紙張尺度適用中國國家標率(CNS ) Μ規格(210X297公釐〉 40 ----··--^----裝------訂------f 成 (請先閲讀背面之注意事項再填寫本頁) A7 B7 經濟部中央標準局員工消费合作社印製 五、發明説明(37 ) 個像素霣路20,並且可額外安排,Μ經由線路(未示出) 供應偏壓至界定像素單元檢波器之電極。X與Υ编址邏輯霣 路144與146分別經由行與列線路152與154提供訊號(第9 圈中概略示出者),用Μ控制及重置各個像素霄路20。第 9Α圖中概略示出之訊號處理電路148係連接至該有源電路 20之輪出線路156。在第9Α圖之實施例中,每一行像素罨 路20設有一輸出線路,並且經由一輪出放大器158連接至 該訊號處理電路148。然而,吾人將發現另一種選擇是亦 可如所痛求的對每一列、或行組或列組或像素單元/電路 群組提供獨立之輪出線路。 笫9Β圖更詳細說明各訊號線路,它們係設在控制電路 24及一像素電路20之間,而用於根據本發明逭實施例之像 素單元18中。電源線路170包括一正極霣源線V+ 72、一接 地線GRD 174、一負極霣源線V-176及一放大霣源線Vq 178 。行線路152包括一條Xread線160與一條Xreset線162,並 且該列線路154包括一 Yread線164與一 Yreset線168。如所 已解釋者,這實施例中每一行設有一條綸出線路。 笫2、8與11圖所示之像素霄路,以及第3、4、9A 與9B所示之連接裝置,係可用傳統積疆霣路製造技術一醱 成形於單一半導髖晶片上,或成形於二重叠之半導體基片 上,而使一陣列之像素檢波器位於第一塊基片上,且一陣 列之像素電路係位於機械式連接至第一塊基片之第二塊基 片上,該機械式連接例如係Μ碰撞接合之方式,而在各像 素檢波器與其對應像素電路之間係呈一對一之對應藺係。 本紙張尺度遑用中國國家梯隼(CNS ) Μ規格(210X297公釐} 41 ----7--^---f ·裝------訂------{線 (請先閱讀背面之注意事項再填寫本頁) 02 A7 B7 五、 經濟部中央標準局員工消費合作社印製 發明説明(38 ) (請先閲讀背面之注意事項再填寫本頁) 在本發明用於乳房X光照相術之典型實施例中,每一 方塊包括80乘以240個像素。乳房X光照相術可能是本成像 24及一像素®路20之間,讀出速度及儲存能量方面具有某些 最嚴格之要求。對於成功之乳房X光照相術,每一値像素 «在1秒内於20仟電子伏特下記錄10000條X射線。在每一 個具有6X107個霄子儲存能力之像素電路處,這意即每一 像素上可聚集多個10000條之X射線,這是指在需要讀出該 像素内容之前。因此,隨之每一像素例如可在每秒或更少 時間内讀出多逹10倍,其等於10赫玆之像素讀出速率。在 每一個具有240像素之80行方塊中,可用時脈速率除M 19200 界定其整個方塊之讀出時間,這是指該方塊中之全部像素 。對於10百萬赫茲之時脈速率,埴是一棰典型之時脈速率 ,而整個方塊可在520赫玆之速率下讀出。由於乳房X光照 柑術只需10赫Η,其可看出本發明之實施例能處理比乳房 X光照相術所要求者多達50倍之強度。如同將簡短解釋者 ,埴多餘部份可里現把許多方塊(瓦面)之輪出點調制在 一起之能力,並且使全部讀出頻道之數目減至最小。 本裝置蓮作之一論點是其空載時間,這可定義為其在 已諛出後重置每一行所費時間。一行像素可在10撤秒或更 短時間内重置。在這時段期間各像素是呈惰性的。既然在 1秒中可施行10次或更少之讀出及重量操作(逋是乳房X 光照相術之典型速度),逭即意指比較於全部時間則其全 部空載時間是0.0001秒或0.01%,造全部時間是指該成像 装置必須有效之時間。因此本發明實施例之空載時間是無 42 本紙張尺度逋用中國國家標準(CNS ) Α4規格(210Χ297公釐) 經濟部中央標準局貝工消费合作社印製 Α7 Β7 五、發明説明(39 ) 關緊要的,並且好至無空載時間。爲能了解這空載時間多 麽小*吾人發現在這時段期間所損失之X射線數目(假設 每個像素每秒接收10000條X射線)是10000X 0.0001 (約 每値像素1條X射線)。這是遠小於該總和波動極限(100> *而這極限是1萬條X射線之統計誤差。據此,本發明之 這實施例係Μ配合該統計學上可能獲得之最大性能操作。 在第2或11圖中所示像素電路範例,係可製成具有少 於35徹米之主要尺寸,Μ致該等像素單元可能是35撤米平 方或更少。每一方塊圖此具有4毫米乘以12毫米之尺寸, 並且可由數百個瓦面之一感光崁壤幕面製成例如18公分乘 Μ 24公分之成像表面積,在此每一塊瓦面係對應至比如 115乘Μ341個像素之方塊。 使用鋪瓦面之方法以產生大成像表面,係具有高產能 之優點。其亦提供棋組化之優點,以致若一瓦面失效,則 可能只替換該瓦面而不霈替換整値成像表面。逭卽能經濟 便宜地製造大型成像陣列。 令人驚訝的是,其仍可能在使用鋪瓦面之方法下«得 良好之成像品質,即使該等瓦面包括m乘η値像素單元方塊 及相聯之霣路設計與控制霣子設計。每一瓦面將需要至少 4値、可能5至10個外侧接點。每一瓦面上在該有源彩像 面積邊緣亦包括該m乘η個像素單元陣列,其有某些惰性無 效空間放置該瓦面之控制及邏輯霣路。在本發明之一較佳 實施例中,各瓦面因此如第5圈中所示地放在一感光崁嫌 幕面中。 本紙張尺度適用中國國家標準(CNS ) Α4规格(210X297公釐) 43 (請先閲讀背面之注意事項再填寫本頁) -裝. 訂 經濟部中央梯準局貞工消费合作社印製 Α7 Β7 五、發明説明(40 ) 爲了用在乳房X光照相術中,一檢波平面應爲30公分 乘以30公分之级數。在該檢波平面中不允許有空載空間。 為以第5圖所示設備達成逭點*該感光崁鑲幕面係分兩步 驟移動,Μ致可藉著聚集三個影像幀格而完全涵蓋整個欲 成像之表面。這瓦面形狀實質上可Μ呈矩形。一瓦面檢波 (或有效)區之最佳長度係等於總空載空間長側面之兩倍 。然而,因預估瓦面對齊精確度為50至100微米,而逭要 求該等反面有效區之某些部份重II,故該等瓦面尺寸可能 不會對應該等最佳之尺寸。對於乳房X光照相術之應用* 其可能慼光崁錶幕面之範例係可包括621塊瓦面,而每一 塊瓦面具有41760個35撤米乘Η 35撤米之像素單元。 可用傳統上具有足夠精確度與速度之機械式排列達成 該影像感光崁鑲幕面之移動。第5圖說明在每一瓦面上已 對其電子設計提供足夠之空間。最佳化第5圖中所示排列 ,Μ使欲產生之全表面影像具有3個影像,這三値影像係 分別聚集在該二12毫米節距之前、之間與之後。然而,吾 人將發現其它實施例可能利用異於第5圖所示之配置,並 且在此所揭露之技術係可用於任何聚集100%影像之應用 中。 第5Α圖說明本發明一實施例之局部控制電子設計,其 包括一瓦面感光崁鑲幕面,例如第5圃中所示者。 每一反面之基本控制電子設計(例如Τ2)大致對應於 第3画中所示者。然而,不是每一塊瓦面設有一 ADC 56 ( 如第3圖中所示),來自多數瓦面之轅出(例如Τ1-Τ10) 本紙張尺度逋用中國國家標準(CNS ) Α4規格(210Χ297公釐) 44 ^ ; j--裝 訂 I — ί 線 (請先閱讀背面之注意事項再填寫本頁)Printed by the Ministry of Economic Affairs of the Central Bureau of Industry and Fisheries Cooperative Society $ L A7 B7 V. Description of the invention (34) It is filled with oranges. This is the use of each pixel base stored in each aggregated image frame and deducted by it Minus it. In a real-time imaging application, this measurement time can be completed in every few seconds or less, because it can keep these bases (consumer pulse level) and the extremely low noise platform in ASID set . The eighth plaque is another exemplary circuit of an active circuit 20, which is used in the pixel unit 18 according to an embodiment of the present invention. The pixel detector 19 is represented by a bipolar pus symbol 182 connected to the bias voltage VbUs 180 (the detector may also be used as a sniper), and the bias voltage is applied through an electrode (not shown) to define the The pixel unit 18 is depleted by the volume or pixel detector 19. The charge generated by the radiation line entering the depletion region of the pixel unit 18 is shot into the base of the first input transistor 184 (in this case, the effective crystal FET has, for example, 0.3 milliohm (ms) ) Transconductance coefficient, and a 100-ampere drain-source current value I and 0.1 retreat farad's envy). The source and drain of the input FET 184 are connected between the first «current source 186 (here a properly designed FET, although this may be replaced with a resistor) and a ground line GND 174. The current source 186 is sequentially connected to a positive power source line V + 172. The junction between the key-in FET 184 and the current source 186 is connected to one end of the second crystal 188 to form a common base bipolar amplifier, which is controlled by the bias applied to its base. The base of the second transistor 188 is connected to the bias line Vd 178. The remaining terminals of the second transistor are connected to the base of the input PET 184 via a feedback capacitor Cf 190 (for example, with a capacitance of 0.3 microfarad). This paper uses the Chinese National Standard (CNS) A4 (210X297mm) ----:-: --- II (please read the precautions on the back before filling in this page) Order 38 A7 B7 ^ 93902 5. Description of the invention (35) The junction between the second transistor 188 and the Cf 190 is also connected to the second current source of the negative-electrode line V-176 (here it is a properly designed FET, Although it may be replaced with a resistor). Therefore, the charge generated from the volume of the depletion region of the pixel unit entering the radiation line can be collected at the capacitor Cf 190. The X and Y readout circuits, that is, Xread 160 and Yread 164 are connected to the readout logic circuit 198 (here is a double base FET), which is sequentially connected to the negative power supply line V-176 and a round switch 196 ( Here is a FET), so that when a signal is simultaneously supplied on the Xread and Yread lines 160, 164, the accumulated charge on the capacitor Cf 190 can be drawn out through a drawing line 156_. The X and Y reset lines, Xread 162 and Yread 168 are connected to the discharge series "Road 100 (here is a pair of base FETs), which are sequentially connected to the negative power source line V-176 and a release power Between the switch 192 (here is a FET 192), use M to release the signal, and here, when a signal is simultaneously supplied on the Xread and Yread lines 162, 168, the device Cf 190 can be reset. It shows that the circuit forms a charge sensitive amplifier, which has a charge storage capability in the counter residual container Cf 190, and has an output and reset circuit design. Depending on the storage time of the load and the radiation hardness requirements, these FETs can be supplemented with appropriate techniques such as junction field effect transistors (J-FETs) or MOSFETs. If the container Cf 190 has a capacity of 0.3 microfarads, it corresponds to a storage capacity of about 1.8 million electrons. If the Cf 190 has a picofarad capacity of 1 picofarad, this corresponds to a storage capacity of about 6 million electrons. In the round-robin circuit, the maximum output clock frequency with a reset FET This paper standard is applicable to the Chinese National Standard (CNS) A4 specification (2 丨 OX29? Mm) | ^ Pack H-J line (please read M first (Notes on the back and then fill out this page) Printed by the Ministry of Economic Affairs, Central Bureau of Industry and Fisheries Co-operative Cooperative A7 B7 Printed by the Ministry of Economic Affairs, Central Bureau of Industry and Customs Co., Ltd., Beigong Consumer Cooperative V. The description of invention (36) is 5 to 10 million Hz. If there is no reset FET in the output circuit, the maximum detection frequency is reduced by about 200 kHz. The circuit design shown in FIG. 8 can be implemented on a pixel unit having a size of about 150 by M 150 microns, for example. In applications such as 7-photography and angiography, the pixel size need not be less than about 150 cm wide. In this case, the extra space on each pixel road can be used for operations other than charge accumulation, draining, and resetting Μ. For example, the configuration in Figure 8 can amplify the accumulated charge value. In addition, the configuration of Figure 8 can be modified before the concentrated charge is concentrated on the pixel circuit to provide charge discrimination into the impact of radiation. In the ruined mode, incoming radiation corresponding to a lower-than-expected energy can be excluded before converging on the pixel road. Around the outside of the imaging area formed by the imaging unit arrays, some or all of the control circuit designs 24 may also split into a complete part of the semiconducting base wafer 16. Fig. 9A shows a more detailed control circuit design 24 and its relationship with the active pixel pattern 20 on the substrate 16 shown in the eighth garden. For ease of explanation, only an array of 16 pixel units is shown in the 9A picture, and only certain signal lines constituting the path 22 shown in the first figure are shown. We will find that an imaging device according to the present invention will generally include a pixel unit 18 far exceeding the number shown in No. 9A_. The control circuit design 24 includes an X-address logic circuit 144, a Y-address logic circuit 146, a power supply circuit 150, and a signal processing circuit 148. If not all, it is preferable that certain control circuits 24 are provided on the substrate, and Around the pixels of the array, these pixel circuits are also provided on the substrate. «The source circuit 150 provides a source of power to each paper size via line 170 (schematically shown in Figure 9A). Applicable to the Chinese National Standard Rate (CNS) M specifications (210X297 mm) 40 ---- ··-^ ---- Installed ------ Ordered ------ f (Please read the precautions on the back before filling in this page) A7 B7 Printed by the Consumer Cooperative of the Central Standards Bureau of the Ministry of Economy V. Invention Instructions ( 37) 20 pixel paths 20, and can be additionally arranged, M supplies the bias voltage to the electrodes defining the detector of the pixel unit via lines (not shown). The X and Y addressing logic paths 144 and 146 pass the row and column lines respectively 152 and 154 provide signals (schematically shown in circle 9) and use M to control and reset each pixel road 20. The signal processing circuit 148 schematically shown in FIG. 9A is connected to the wheel of the active circuit 20 Out line 156. In the embodiment of FIG. 9A, each row of pixel paths 20 is provided with an output line, and is connected to the signal processing circuit 148 through a round-out amplifier 158. However, I will find that another option is Provided for each column, or row group or column group or pixel unit / circuit group Independent wheel-out circuit. Figure 9B illustrates the signal circuits in more detail. They are provided between the control circuit 24 and a pixel circuit 20, and are used in the pixel unit 18 according to an embodiment of the present invention. The power circuit 170 includes A positive electrode source line V + 72, a grounding line GRD 174, a negative electrode source line V-176 and an amplified image source line Vq 178. The row line 152 includes an Xread line 160 and an Xreset line 162, and the column line 154 It includes a Yread line 164 and a Yreset line 168. As already explained, each row in this embodiment is provided with an outgoing line. The pixel roads shown in Figures 2, 8, and 11 and the third, fourth, and fourth lines The connection devices shown in 9A and 9B can be formed on a single half of the hip guide wafer by conventional JJY manufacturing technology, or on two overlapping semiconductor substrates, so that an array of pixel detectors is placed first On a block substrate, and an array of pixel circuits are located on a second substrate that is mechanically connected to the first substrate. The mechanical connection is, for example, a collision-bonding method, and each pixel detector and its corresponding pixel circuit A pair Correspondence of this paper. The size of this paper uses the Chinese National Falcon (CNS) M specifications (210X297mm) 41 ---- 7-^ --- f -{Line (please read the precautions on the back before filling out this page) 02 A7 B7 V. The printed description of inventions by the staff consumer cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs (38) (please read the precautions on the back before filling out this page) In a typical embodiment of the present invention for mammography, each square includes 80 by 240 pixels. Mammography may be between this imaging 24 and one pixel® 20, with some of the most stringent requirements in terms of readout speed and stored energy. For successful mammography, each pixel «records 10,000 X-rays at 20 thousand electron volts in 1 second. At each pixel circuit with a storage capacity of 6 × 107 pixels, this means that each pixel can gather more than 10,000 X-rays, which means before the content of the pixel needs to be read out. Therefore, each pixel can read 10 times more per second or less, which is equal to a pixel readout rate of 10 Hz. In each 80-line block with 240 pixels, the available clock rate divided by M 19200 defines the readout time of the entire block, which refers to all pixels in the block. For a clock rate of 10 million Hertz, Zeng is a typical clock rate, and the entire block can be read at a rate of 520 Hertz. Since mammography requires only 10 Hz, it can be seen that embodiments of the present invention can handle up to 50 times more intensity than that required by mammography. As explained shortly, the redundant part can now have the ability to modulate the round out points of many squares (tiles) together, and minimize the number of all read channels. One of the arguments of this device's lotus work is its no-load time, which can be defined as the time it takes to reset each row after it has been ridiculed. A row of pixels can be reset in 10 seconds or less. During this period each pixel is inert. Since 10 times or less of readout and weight operations can be performed in 1 second (逋 is a typical speed of mammography), 逭 means that the total no-load time is 0.0001 seconds or 0.01% compared to the total time The total time refers to the time when the imaging device must be effective. Therefore, the no-load time of the embodiments of the present invention is 42. The size of the paper adopts the Chinese National Standard (CNS) Α4 specification (210 × 297 mm). The A7 Β7 is printed by the Beigong Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economy. V. Invention Description (39) It matters, and is so good that there is no dead time. In order to understand how much this dead time is, I found that the number of X-rays lost during this period (assuming that each pixel receives 10,000 X-rays per second) is 10000X 0.0001 (about 1 X-ray per pixel). This is much smaller than the total fluctuation limit (100> *) and this limit is the statistical error of 10,000 X-rays. According to this, this embodiment of the present invention is the maximum performance operation that can be obtained in conjunction with the statistics. The example of the pixel circuit shown in Figure 2 or 11 can be made to have a main size of less than 35 cm, so that the pixel units may be 35 square meters or less. Each block diagram has a multiplier of 4 mm With a size of 12 mm, and can be made from one of hundreds of tile surfaces, the imaging surface area is 18 cm by M 24 cm, for example, each tile surface corresponds to a square of 115 by M341 pixels, for example. The use of the tiled surface method to produce a large imaging surface has the advantage of high productivity. It also provides the advantage of grouping, so that if a tile surface fails, it is possible to replace only the tile surface without replacing the entire image The surface can be used to manufacture large imaging arrays economically and inexpensively. Surprisingly, it is still possible to obtain good imaging quality using the tiled surface method, even if such tile surfaces include m by η-value pixel unit squares And associated The design of the road and the design of the control road. Each tile surface will require at least 4 values, possibly 5 to 10 outer contacts. Each tile surface also includes the m by n pixel units at the edge of the active color image area Array, which has some inert invalid space to place the control and logic path of the tile surface. In a preferred embodiment of the present invention, each tile surface is therefore placed on a photosensitive screen as shown in circle 5 The size of the paper is applicable to the Chinese National Standard (CNS) Α4 specification (210X297mm) 43 (please read the precautions on the back and then fill out this page)-installed. Printed by the Ministry of Economic Affairs Central Equatorial Bureau Zhengong Consumer Cooperative Α7 Β7 5. Description of the invention (40) In order to be used in mammography, a detection plane should be 30 centimeters times 30 centimeters. No empty space is allowed in the detection plane. For the fifth figure The device shown reaches the point * The photosensitive screen surface is moved in two steps, so that the entire surface to be imaged can be completely covered by gathering three image frames. The shape of the tile surface can be substantially rectangular. The optimal length of a tile detection (or effective) area is It is equal to twice the long side of the total empty space. However, due to the estimated accuracy of the tile surface alignment of 50 to 100 microns, and the requirement that some parts of the effective area of the reverse surface weigh II, the size of the tile surface It may not correspond to these optimal sizes. For the application of mammography *, the example of the Qiguangzhen surface may include 621 tiles, and each tile has 41,760 35-meter-by-H 35-meter-reduced pixel unit. The mechanical arrangement of the traditionally accurate and fast enough to achieve the movement of the image sensitive screen surface. Figure 5 shows that each tile surface has provided enough space for its electronic design Optimizing the arrangement shown in Figure 5, M makes the full-surface image to be generated have 3 images, and these three-value images are gathered before, between, and after the two 12 mm pitches, respectively. However, we will find that other embodiments may utilize configurations other than those shown in Figure 5, and the technology disclosed here can be used in any application that gathers 100% images. Figure 5A illustrates the local control electronic design of an embodiment of the present invention, which includes a tiled photosensitive screen surface, such as that shown in the fifth garden. The basic control electronics design (eg T2) on each reverse side roughly corresponds to that shown in Picture 3. However, not every tile surface is provided with an ADC 56 (as shown in Figure 3). From the majority of the tile surface (such as Τ1-Τ10), the paper standard uses the Chinese National Standard (CNS) A4 specification (210Χ297 %) 44 ^; j--binding I — ί line (please read the notes on the back before filling this page)

五、發明説明(41 ) A7 B7 經濟部中央標準局員工消費合作社印製 係經由一主倍頻器MM (例如在10至100百萬赫玆之時脲速 率下操作)連接至一共同ADC 561,並且由此連接至該訊 號處理邏輯電路、顯示器等58。該主倍頻器MM不需放在該 等瓦面自身上,但可放在其附近。該等ADCs 561亦非設在 各瓦面上,但最好位於附近。 使用主倍頻器之一優點是可減少所需之ADCs數目,因 而減少該成像条統之全部費用。如第5A圖之另一種逸擇, 各瓦面可Μ呈雛菊花環般連結,並在單一共用ADC上讃出 。高解晰度之ADCs構成整艟糸統之一昂貴部份,Μ致減少 其數目可在其全部費用上具有重大影«。在諸如乳房X光 照柑術、傳統X光射線、胸腔X射線等應用中,其可包括數 百萬瓦面之一感光崁鑲幕面,而最少需要約9個ADCs (亦 即只有9個輪出通道),以便提供所要之讀出性能,甚至 高強度應用。根據本發明之霣路設計能使各瓦面在受控制 方式下讀出,致使可轉著多次讀出該等瓦面而聚集一影像 。這是用某些装置所不能連成者,例如一 CCD装置。該等 瓦面之多次讀取能Μ下列方式改良對比。如同一項考廉有 5000條X射線射在一檢波器像素上之範例。若該像素之儲 存能力可處理所有5000條X射線,其可能決意設定該讀出 速率,Μ對應一接收該5000條X射線之時間分配,俥使所 有5000條X射線之類比電荷值可儲存在一像素上,並且随 後讀出全部之聚集電荷值。若毎4.88條Χ射線使用一棰10 倍元之ADC (亦卽5000條X射線除Μ 1024灰度),則其將對 應於一不同灰度分層。然而,若用一較快之讀出速率,例 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ2.97公釐) 45 I 裝— I I I I 訂— — I I I 線 - - 气 一 (請先閲讀背面之注意事項再填寫本頁) 經濟部中央梯準局貝工消費合作社印氧 A7 _B7_ 五、發明説明(42 ) 如對應於接收1000條X射線之時間分配及使用相同之ADC, 則具有每1000條X射線除Μ 1024等於0.97之對應灰度分層 。由逭略概範例,其可看出僅只在一較高速率下讀取即可 增加該灰度解晰度。 正上方所述之技術及參考第5Α圖*即能在費用(愈多 倍頻則愈少ADCs)及影像對比(愈少倍頻則愈多ADCs)之 間取得最佳化。 第6A至6C圖更詳細說明一瓦面範例之結構,該瓦面具 有一層狀結構,包括一混合支撐板210、一矽讀出晶片212 、及一像素檢波器層214,該晶片212係安裝在該支播板上 ,而該層214例如是由碲化鎘鋅、碲化鎘、碘化汞、砷化 鎵、緒、矽或溴化鉈製成,並且碰撞連接至該讀出晶片。 第6A圖是該像素檢波器層214之一平面圖,在這範例中, 其具有一 19.985毫米乘K 19.98 5毫米之有效表面積216。 瓌繞該像素檢波器層之有效表面積者是一無效之惰性區, 其包括一檢波器保護環218。第6B圖是該檢波器層安装在 讚出晶片212與支撐板210上之平面圖。吾人將發現與該檢 波器保護環218—樣,該無效區係環繞箸該有效檢波器區 ,而亦包括該讀出晶片212與混合支撐層210之邊緣,Μ及 各瓦面間所需之空間。支撐層或板210上之引線接合墼220 允許該讓出晶片霣力連接至板210上之霣路設計,並且由 此經由一主要後侧平面連接至彩像處理《路設計。第6C圏 是該瓦面之一播截面圏,其指出該檢波器層214係在各個 像素位置用碰撞接合222連接至該讀出晶片。該支播板設 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐)5. Description of the invention (41) A7 B7 The printing of the Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs is connected to a common ADC 561 via a main frequency multiplier MM (eg operating at a urea rate of 10 to 100 million hertz), And thus connected to the signal processing logic circuit, display, etc. 58. The main frequency multiplier MM need not be placed on the tile surface itself, but can be placed near it. These ADCs 561 are also not located on each tile surface, but are preferably located nearby. One of the advantages of using the main frequency multiplier is that it reduces the number of ADCs required, thereby reducing the overall cost of the imaging system. As another alternative in Figure 5A, each tile surface can be connected like a daisy garland and can be found on a single common ADC. The high-resolution ADCs constitute an expensive part of the whole system. The reduction in the number of them can have a significant impact on the overall cost «. In applications such as mammography, traditional X-rays, chest X-rays, etc., it can include one of the millions of tile surfaces, and a minimum of about 9 ADCs (that is, only 9 rounds) Output channel) in order to provide the desired readout performance, even for high-intensity applications. The design of the road according to the present invention enables each tile surface to be read out in a controlled manner, so that the tile surface can be read out multiple times in turn to gather an image. This is not possible with some devices, such as a CCD device. Multiple readings of these tiles can improve the comparison in the following ways. As an example, there is an example in which 5000 X-rays are shot on a detector pixel. If the storage capacity of the pixel can handle all 5000 X-rays, it may decide to set the readout rate, M corresponds to the time allocation of receiving the 5000 X-rays, so that the analog charge value of all 5000 X-rays can be stored in One pixel, and then read out all the accumulated charge value. If every 4.88 X-rays use an ADC of 10 × 10 (also 5000 X-rays except M 1024 gray scale), it will correspond to a different gray scale. However, if a faster reading rate is used, for example, the paper size is applicable to the Chinese National Standard (CNS) Α4 specification (210Χ2.97mm). 45 I Packed—IIII Ordered——III Line--Gas One (please read first Note on the back and then fill out this page) The Ministry of Economic Affairs, Central Bureau of Standards and Technology, Beigong Consumer Cooperative Printed Oxygen A7 _B7_ V. Description of Invention (42) If the time allocation corresponding to receiving 1000 X-rays and the use of the same ADC, each has The corresponding gray-scale layering of 1000 X-rays divided by M 1024 equals 0.97. From a general example, it can be seen that only grayscale resolution can be increased by only reading at a higher rate. The technique described directly above and reference to Figure 5A * can be optimized between cost (more octave, less ADCs) and image comparison (less octave, more ADCs). FIGS. 6A to 6C illustrate the structure of an example of a tile surface in more detail. The tile surface has a layered structure, including a hybrid support plate 210, a silicon readout chip 212, and a pixel detector layer 214. The chip 212 is a Mounted on the support board, and the layer 214 is made of, for example, cadmium zinc telluride, cadmium telluride, mercury iodide, gallium arsenide, sulfide, silicon or thallium bromide, and is connected to the readout chip by collision . FIG. 6A is a plan view of the pixel detector layer 214. In this example, it has an effective surface area 216 of 19.985 mm by K 19.98 5 mm. What surrounds the effective surface area of the pixel detector layer is an inert zone, which includes a detector guard ring 218. Fig. 6B is a plan view of the detector layer mounted on the praise wafer 212 and the support plate 210. We will find that as with the detector guard ring 218, the inactive area surrounds the effective detector area, and also includes the edge of the readout chip 212 and the hybrid support layer 210, M and the required between the tile surfaces space. The wire bond 220 on the support layer or board 210 allows the yielding chip to be force-connected to the design of the circuit on the board 210, and is thus connected to the color image processing via a main rear plane. The 6th coil is one of the tile cross-sectional coils, which indicates that the detector layer 214 is connected to the readout chip at each pixel position with a collision bond 222. The paper size of this support board is applicable to China National Standard (CNS) Α4 specification (210Χ297mm)

In J. I I" *裝 訂 {線 (請先閲讀背面之注意事項再填寫本頁) 經濟部中央橾準局貝工消費合作社印製 A7 _____B7__ 五、發明説明U3 ) 有一陣列插銷224 ,用Μ在一主要背後平面上定位及連接 該瓦面。 第7Α至7D圖說明另一種選擇,其提供參考第5匾所述 單一檢波平面之轉移,例如應用於自體放射照相術中,在 此欲成像之表面可放出輻射線,而非同一外部光源。考* 一種自體放射照相術範例,在此一搛本上貼有同位素檷記 (例如硝14、磷32、磷35、硫32、碘125、氫3等),並且 其儘可能定位靠近一影像檢波器(例如-成像平面),如 第7Α圖中所示。通常該樣本係置於一約1.5撤米厚之薄聚 酯樹脂層上,以避免弄污。若該樣本係置於該成像平面上 ,則不可能發生有關第5圖所述該成像平面之蓮動。然而 ,因該無效匾係環撓著該瓦面之有效區,如第7Α圖所示箪 一慼光崁鑲幕面層之有效成像區將只覆蓋該總面稹之百分 之85。第7Α圖說明一瓦面感光崁鑲幕面範例之某些尺寸。 如第7Β與7C圈中概略示出者,這問題之一項解決方法 是提供一棰夾心層,使二成像平面DPI與DP2分別位於樣本 0S之上下方。第二镅成像平面要儘可能靠近第一個成像平 面,而將樣本置於其間,並使二成像平面彼此平行及稍撤 相對位移。該位置精確度可好到1至2撤米。第7D圖表示 第7B與7C圖所示設備中各有效成像區間之空載或惰性空間 。白點代表惰性區,交叉影線匾係指出該等有效區重叠處 ,而其餘之影線匾係指出只有一有效匾重叠該樣本之一區 。在所示特定範例中*並且如第7D國中所辨別者,只有總 面積之百分之1.2是惰性區,百分之68.9是用二成像平面 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -47 - ----;——^----裝------訂------J線 (請先閱讀背面之注意事項再填寫本頁) A7 B7 經濟部中央標準局員工消費合作社印裝 五、發明説明(44 ) 成像(因此當在該樣本二侧面上檢出輻射線時可增加其效 率),並且百分之29.9是只用一平面成像。百分之1.2之 惰性區例如仍可偁爾舉起該上方平面而覆蓋之,並且將其 稍微沿著對角線位移。 在自體放射照相術中,理想上箱要大至42公分乘M39 公分之影像表面。具有如上述之瓦面尺寸及35撤米乘Μ 35 徹米之像素,則總面稹之百分之98.8可覆蓋578塊瓦面。 若各瓦面係如本文別處所述地調制在一起,則其可能只需 要40値ADCs或更少。使用這些技術,則可能每3秒產生及 顯示一全新影像。本發明之這項應用實際上可给予一樣本 逹4π之覆蓋範圍,而增加整體效率、實時成像、35撤米 之空間解晰度及6値量级之動態範圍。 因此這另一種選擇之排列,係適用於欲成像物體包括 一輻射源之應用中,而提供實質上彼此平行排列之第一及 第二檢出平面,該二平面係用一設在其間之欲成像物體輻 射源彼此隔開。葙著安排各痼成像平面之瓦面彼此相對播 側地偏置,其可能實質獲得一物體之整値成像,在此來自 該物體之輻射線實質上同樣朝向該二平面。 在不同應用中可使用其它架構之成像裝置。例如,對 於電腦X光斷層照柑術之應用,各成像裝置實質上係繞著 一瓌狀物或部份環狀物之周邊呈切線地拂列著,以包圍或 局部包圍一欲成像物體之一部份。該等成像裝置亦可能實 質上呈切線地排列環繞多數環狀物或部份琢狀物之周邊, 並在該等瓖狀物或部份環狀物之共用軸所形成方向中彼此 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 48 ----^---;---f <裝------訂------{線 (請先閲讀背面之注意事項再填寫本頁) A7 B7 ^Sd〇2 五、發明説明(45 ) 位移,以便成像該物饈之多數部位。在諸如非破壞性測試 及實時監控之其它應用中,各成像裝置可能如瓦面般鋪設 在一起,以形成一配合欲成像物體面積及形狀之感光崁鑲 幕面,及/或形成一環繞欲成像物體一部份或全部之感光 崁鑲幕面。 若非在一大矩形陣列中排列各像素單元,則於本發明 之其它實施例中,該成像裝置可能設計成一狹缝,而各像 素單元係排列在單一列中,或設計成一凹槽,而其各像素 係並排在數列中。可在許多應用中使用一狹缝或凹槽,諸 如身體放射照相掃描、牙齒全景成像、安全性拥描等。凹 槽之使用亦可用做全區掃描之另一棰選擇,因其較低之成 像表面而具有較低费用之優點。在一狹縫或凹槽具有一或 二行像素之茱例中,該等像素霣路可能位在同一半導醴基 片上對應像素檢波器之侧邊,而非在同一或不同半導體基 片上各像素檢波器之後面。可首尾銜接地放置若干狹缝型 (或凹槽型)瓦面,Μ形成一很長之連績狹缝(或凹槽) 。相鄰列之各瓦面可在該列方向中位移,Μ致在掃描期間 各瓦面之間將沒有對應該惰性空間之惰性區。這係顯示於 第5圖中。藉著将控制電子設計定位於各像素檢波器與像 素霄路所形成像素單元之侧邊,該等像素單元實際上可直 接延伸至各個狹缝(或凹槽)瓦面之尾端。在這方式中, 可用很便宜之方式製造一很長之連績式狹缝(或凹槽)。 回頭參考第1圈,該控制霣子設計24包括參考第3與 4圖所述之處理及控制霄路設計,其係連接至該半導體基 本紙張尺度適用中國國家橾準(CNS ) Α4規格(210X297公釐) -49 - ----Γ--^---f I裝------訂------f 線 (請先閲讀背面之注意事項再填寫本頁) 經濟部中央梂準局員工消费合作社印製 A7 B7 五、 經濟部中央橾準局貝工消費合作社印裝 發明説明(46 ) 片上之各像素單元18,如雙向箭頭22所概略表示者。該控 制電子設計24能對連結各個像素單元18之有源霣路20編址 (例如掃描之),用Μ在各傾像素單元18處讀出該有源霣 路20中所聚集之霣荷。所讀出之霣荷係送至ADCs,用以送 至數位化及數據簡化處理器(Data Reduction Processors ,下文簡稱DRPs),俾能處理該二位元訊號。 用DRPs所施行之處理可包括不能滿足某些狀況之鑒別 訊號,諸如一最小之能階。這在每一讚出訊號係對應於單 一進入輻射線之事件時特別有用。若對應該量測訊號之能 量少於所使用輻射線之預期者,其可斷定所滅少之儲存霄 荷值係源自散射效應。在此一案例中,可放索此量測,而 這最終可改良影像之解晰度。對於像素大於100撤米寬度 之另一種選擇,可如先前所述在每一像素罨路上實現該鑒 別功能。在這案例中已排除低能童之撞擊,而其餘者係聚 集在各像素電路上。 控制電子設計另外經由一路徑交接至一影像處理器28 ,該路徑係以箭頭26概略表示之。影像處理器28包括資料 儲存装置,其中可儲存讀自每一像素單元而代表電荷之數 位值,以及相鼷像素單元18之位置。對於每一値像素單元 18,讀自該像素單元之每一値霣荷值係累加至業已為該像 素單元所儲存之電荷值,Μ致可聚集一霣荷值。其結果是 每一個影像皆可儲存為一項二維像素陣列之表示值,而它 們例如係可儲存在一資料摩中。 該影像處理器28可存取該賫料庫中所儲存之影像資料 本紙張尺度適用中國國家標準(CNS ) Α4规格(210X297公釐) ----;--Μ---f -裝------訂------ί 線 (請先閲讀背面之注意事項再填寫本頁) 50 A7 B7 經濟部中央橾準局员工消费合作杜印製 五、發明説明(47 ,以苗擇一已知彩像(所有陣列)或一部份彩像(該彩像 陣列之一副本)。該影像處理器28可讀出各S定像素位置 所健存之值,並經由筋頭30所概輅表示之路徑在一願示器 32上造成欲顯示資料之Η像。該資料當然可列印出來,而 非、或除了_示外不能列印,並且可加Μ進一步之處理操 作。通常可由毎一像素霣荷值減去背景及噪轚。若在所獲 得之彩像採取-“空”彩像之前,即可能扣滅逭消_脈衝 «平及/或背景。對於每一«像素,可減去一背景值且據 此扣除。 在下文中將更詳細描述該像素處理器28之操作。 第12鼸說明根據本發明之一成像技術,其係使用根據 本發明之一成像裝置,而具有一可隨意存取、有效動菔像 素單元之狹缝或凹槽。配合逭項技術,該狹缝或凹榷可用 一定速度V在铒邊移動,並在毎值tt-t。之時間單位下讀 出 在第12圏所示範例中,一狹缠沒有6值像索,每一像 素具有之尺寸爲(x,y)。一定之移動方向係位於該尺寸X之 方向中。若在時間U發生讀出操作,則配合本發明之逭論 點,應允許該狭缝移動,直到一時間I且隨後再次讀出。 時段U-U期間所移動或播描之距離為dx,並且在該移動 方向中«不大於半fi像素尺寸(亦邸dx小於等於x/2>。逭 技術可沿其移動麯改良解晰度,而比較於全域成像或傅统 本紙張尺度適用中國國家標芈(CNS ) A4規格(210X297公釐) ----;---^---j *裝------訂------f 球 (請先閲讀背面之注意事項再填寫本頁) 51 2^S9〇2 A7 B7 五、發明説明(48 狹缝(凹槽)技術則改良速2倍。其改良之理由係在於其 所使用之多次取樣棋式,並且據此若在夠短間隔中聚集該 狹缝(凹槽)幀格(所掃描距離必須小於半傾像素尺寸) ,其下面之结構將感測到等於該像素尺寸之解晰度*而非 該像素尺寸之兩倍。一全域成像平面或一狹縫(凹槽)之 有效解晰度是該像素尺寸之兩倍,其中該狹缝是不Μ根據 本發明逭項論點之方式操作。上述技術例如可用於牙齒全 景成像。其播描速度通常為每秒4米,且該凹槽寬度為4 毫米、長度為8毫米。逭可轉變成80X 1600個像素,每値 像素尺寸為50撖米。整籲影像之聚集應持績約10秒。根據 本發明之此實施例,應至少每25撤米邸讀出該凹榷,意邸 一凹榷讀出速率爲1.6仟_茲。若使用80列乘以20行像素 之方塊及5百萬赫茲之時脈頻率,則該方塊之讀出速度是 5X 10β (20X 80) = 3.1仟鎗Η ;逭逋大於所需之1仟鎗茲 , ; ·(-裝 訂 "1.^ (請先閲讀背面之注意事項再填寫本頁) 經濟部中央橾準局貝工消费合作社印製 當使用該狹缝(凹槽)技術時,X射線光源»設定在 一較髙之操作《流,或者若可能,該等X射線應由一全域 面積聚集成該狹縫(凹槽)之尺寸。逭需要保持該彩像聚 集時間維持一定。在許多案例中,逭可能是技術上困難且 费用昂贵的。該單狹缝(凹槽)技術之另一種選择是多狹 缝(凹槽)技術。根據逭種變化貢施例,多條狭缝(凹槽 )係置於一平面上且彼此平行,而在各狭缠(凹槽)之縱 本紙張尺度適用中國國家橾準(CNS ) Α4規格(210 X 297公釐) 52 經濟部中央樣準局員工消費合作杜印製 2^39〇2 a? Β7 五、發明説明(49 ) 軸間具有某些一定之距離。在逭方式中,若有η條狹缝( 凹檐)且全部播描距離為X公分,則每一條狹缠(凹槽) 只需掃描Χ/η公分。逭将箱要較少之機構,但更重要的是 該X射線光源強度只痛增加X/(η X狹缝或凹槽宽度>。 現将描述配合本發明成像裝置及条統之各棰操作方法 。如上所述,本發明之装置及条統係意欲提供高強度鞴射 之成像,該輻射係意欲直接入射在各成像装置上。在本發 明之各實施例中,係回醮輻射撞擊Μ聚集霣荷(藉著直接 儲存霣荷值或等董霣壓或電流),且該霣荷值係全然線性 相關於該進入輻射線之结能量,而非藉著計數點數或事件 數目成脲衝數。因此一 ASID可聚集各霣晶覼及/或«容器 檷棰上(或其它設在該像素霄路上之霣荷聚集裝置)之霣 荷,逭說明了每一像素《路及每一像素檢波器之大部份輪 入節酤«容*並且一 ASID對所有像素單元具有直接一對一 之存取。逭兩項主要特黏在其性能上具有戲劇性之衢擊。 一棰々510可以一(^0聚集約多達2倍量级之霣荷。-^510 亦提供淸晰之成像,而具有少於百分之一之惰性時間。其 電子噪音聲平只有約數百儸«子。 比較於傅統之脈衝計數式半導膿像素檢波器,一種 ASID在其輾射(及/或光)強度上沒有任何限制。長彩像 幘格聚集時間(若需要可達1秒)及很离之動態範園將容 許离強度之實時成像*而不會有飽和現象。 本紙張尺度適用中國國家橾率(CNS ) A4規格(210X297公釐) — —. m^u ^ * 裝 訂 I 1.^ (請先閲讀背面之注意事項再填寫本頁) 53 經濟部中央揉準局貞工消費合作社印製 Α7 Β7 五、發明説明(50 ) 如上所述參考第1圓,在ADCs之後有一彩像處理器28 ,該處理器可儲存沿著相關像素單元18之位置而由每一像 素單元所讀出代表《荷之數位值。對於每一值像素單元18 ,每一儸讀自該像素單元之霣荷值係累加至該像索單元業 已儲存之霣荷值,以致可聚集一霣荷值。其結果是每一傾 彩像皆可健存爲一棰二維像素值陣列之鼷表。 該等影像資料例如可儲存於一資料庫中,而成爲該彩 像之二維陣列: 影像(1: Npixeis,1: 3) 在此第一傾引數包括項,其代表該成像平面 上之像素數目,此引數係指由1線性地蓮轉至最大之像素 數目,並且第二傯引數包括三鴒值,分別是X舆Y 座欞及每一像素所聚集之《荷值。對於每一傾彩像,可扣 滅一背景/消隱脈衝«平陣列。例如,正好在該彩像聚集 成一校準影像之前,可聚集其背景/消隱脈衡«平之像素 值。埴棰方式之校準係偏別針對每一像素,並且非爲所有 像素之全龌常態。 該影像處理器28係在賫料庫中存取所儲存之彩像資料 ,Μ灌擇一已知之影像(整値陣列)成該彩像之一部份( 該彩像陣列之子樣本),並造成欲顯示、列印或進一步處 理資料之圓像。 在顯示、列印或進一步處理該影像資料之前,該彩像 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) ^ I (- •裝 訂 ^.^. (請先閲讀背面之注意事項再填寫本頁) - 54 經濟部中央揉準局貝工消費合作社印製 A7 B7 五、發明説明(51 ) 處理器28最好能發現該等菹定像素所儲存之二像索霣荷極 值,並將逭些值指定為該灰度或色度之二極值,而可用於 專羼地顯示、列印或進一步處理該彩像。根據霣荷放在該 像素上之位置,其餘各像素位置之m荷值隨卽可指定爲一 位於這二極值間之中間灰度或色值。例如可根據下列方程 式將該灰度值指定給各镇像素之霄荷值: («荷i-最小《荷) 像素i之灰度值=Minerey +-X (最大灰度-最小灰度> (最小灰度〉(最大«荷-最小霣荷〉 藉著傳統之使用者輪入装置36,經由筋頭34所概略表 示之資料路徑,即可完成一部份欲放大彩像之S定,逭可 能與雙箭頭38所概略表示之顯示器32 —起作用。該使用者 輸入裝置36可包括例如一鍵盤、一》鼠等。 本發明因可在一有源《路中對每一儀像索單元聚集« 荷而導致若干利益。 在各像素單元上之有源霣路中聚集霣荷*隨後遘擇性 地以一對一之像素單元對應两係而由各值可存取有源«路 中讀出所儲存霣荷之能力,可完全解決任何有鼷同時進入 轅射線之入射酤不明確問題。 因爲霣荷可在各傭有源霣路上聚集超遇一時期,故其 讀出速度不霈過高*對於此等結果,其可能例如Μ軟艚爲 基礎實時生成及處理彩像,且事實上在容易可用之霣腦硬 鱧上即可便宜地資現之。 本紙張尺度逋用中國國家標準(CNS ) Α4規格(210X 297公釐) ----.---:---f ‘裝------訂------ί 冰 (請先閲讀背面之注意事項再填寫本莨) 經濟部中央樣準局貝工消費合作社印製 ---- i '發明説明(52 ) 對於所捕捉影像之每一部份,其對比與解晰度皆可自 動調整及顯示在一全螢幕上。不論何時,«該成像装置所 捕捉之影像匾各像素單元間有霣荷密度之變化,而顯示所 捕捉彩像之該部份時,皆可解晰該彩像之外觀。 設若來自該像索單元有源16路之霣荷儲存装置之16荷 已讀出,並且在該«荷儲存装置之儲存能力耗盡之前反覆 地重置該霣荷儲存裝置,則其動態範園是有效而未受限制 的。其僅只霈S擇各有源《路之“重置速率”,亦邸讀出 及重置那些«路之頻率,Μ適合該等電荷儲存裝置之儲存 能力及預期之最大輻射密度。因此,由於愈多輻射邸產生 愈多«荷,逭將儲存於各像紫單元之有源《路中*隨後在 適當間隔中讀出,並用控制霣路設計數位化。在數位後, 該«荷具有一已知值,而可與同一像素之現存數位«荷值 一起聚集。僅有之實際限制是該處理«路設計所能健存之 最大數位值。然而,邸使如此該處理«路設計可排列成檢 出一值,該值係接近所能儲存之最大可能值,並且隨後施 加一比例因數至所有像素單元之儲存值。 本發明能夠資時成像。一旦已產生一彩像陣列,即使 在開始照射之前,該影像陣列可用來自該成像装置之新數 位化«荷值加以不斷更新,此等《荷值隨即累加至該陣列 各個像素之現存霣荷值,並且資時顯示所聚集之霣荷值。 在利用一連鑛更新影像陣列處,逭可提供一種霣腦儲 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐)In J. I I " * binding {line (please read the precautions on the back before filling in this page) A7 _____B7__ printed by the Ministry of Economic Affairs, Central Bureau of Industry and Commerce, Beigong Consumer Cooperatives 5. Instruction for U3) There is an array of pins 224, using Position and connect the tile surface on a major back plane. Figures 7A to 7D illustrate another option, which provides the transfer of a single detection plane as described with reference to the fifth plaque, for example in autoradiography, where the surface to be imaged can emit radiation instead of the same external light source. Examination * An example of autoradiography, on which an isotope is recorded (eg, nitrate 14, phosphorus 32, phosphorus 35, sulfur 32, iodine 125, hydrogen 3, etc.), and it is located as close as possible to a Image detector (for example-imaging plane) as shown in Figure 7A. Usually the sample is placed on a thin polyester resin layer about 1.5 meters thick to avoid contamination. If the sample is placed on the imaging plane, it is impossible for the imaging plane described in Figure 5 to move. However, since the invalid plaque loops are flexing the effective area of the tile surface, as shown in Figure 7A, the effective imaging area of the surface layer of the Qi Guangzhen installation will only cover 85 percent of the total surface area. Figure 7Α illustrates some dimensions of an example of a tiled photosensitive screen surface. As outlined in circles 7B and 7C, one solution to this problem is to provide a sandwich layer so that the two imaging planes DPI and DP2 are located above and below the sample OS, respectively. The second americium imaging plane should be as close as possible to the first imaging plane, with the sample in between, with the two imaging planes parallel to each other and slightly displaced relative to each other. The position accuracy can be as good as 1 to 2 meters. Figure 7D shows the empty or inert space in each effective imaging interval of the equipment shown in Figures 7B and 7C. The white dots represent inert areas. Cross-hatched plaques indicate where these effective areas overlap, while the remaining hatched plaques indicate that only one effective plaque overlaps one of the samples. In the specific example shown * and as discerned in the 7D country, only 1.2% of the total area is an inert zone, and 68.9% is a two-imaging plane. The paper scale applies the Chinese National Standard (CNS) A4 specification ( 210X297mm) -47-----; ---- ^ ---- installed ------ ordered ------ J line (please read the precautions on the back before filling this page) A7 B7 Printed by the Employee Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs V. Description of Invention (44) Imaging (so the efficiency can be increased when the radiation is detected on the second side of the sample), and 29.9% is imaged with only one plane. The 1.2% inert zone can still be lifted up to cover the upper plane, for example, and it can be slightly displaced diagonally. In autoradiography, ideally the box should be as large as 42 cm by M39 cm. With a tile surface size as described above and a pixel of 35 cu. Meters by Μ 35 ft., 98.8% of the total area can cover 578 tile surfaces. If the tile surfaces are modulated together as described elsewhere in this article, they may only require 40-bit ADCs or less. Using these techniques, a new image may be generated and displayed every 3 seconds. This application of the present invention can actually give a sample of 4π coverage, while increasing the overall efficiency, real-time imaging, spatial resolution of 35 meters and a dynamic range of 6 magnitude. Therefore, this alternative arrangement is suitable for applications where the object to be imaged includes a radiation source, and provides first and second detection planes that are arranged substantially parallel to each other. The two planes use a desire placed in between Radiation sources of imaging objects are separated from each other. By arranging the tile surfaces of each imaging plane to be offset with respect to the broadcast side, it may substantially obtain an image of the entire value of an object, where the radiation from the object is also substantially towards the two planes. Imaging devices of other architectures can be used in different applications. For example, for the application of computer X-ray tomography, each imaging device is substantially tangentially lined around the periphery of a chaff or part of a ring to surround or partially surround an object to be imaged a part. The imaging devices may also be arranged substantially tangentially around the circumference of most rings or partial cutouts, and in the direction formed by the common axis of these loops or partial loops Applicable to China National Standard (CNS) A4 specification (210X297mm) 48 ---- ^ ---; --- f < installed ------ ordered ------ {line (please read first (Notes on the back and then fill in this page) A7 B7 ^ Sd〇2 V. Description of the invention (45) Displacement, in order to image most parts of the object. In other applications such as non-destructive testing and real-time monitoring, the imaging devices may be laid together like a tile surface to form a photosensitive screen surface that matches the area and shape of the object to be imaged, and / or to form a surround The photosensitive surface of part or all of the imaged object is mounted on the screen surface. If the pixel units are not arranged in a large rectangular array, in other embodiments of the present invention, the imaging device may be designed as a slit, and the pixel units are arranged in a single row, or as a groove, and the The pixels are arranged side by side in the series. A slit or groove can be used in many applications, such as body radiography scans, panoramic tooth imaging, safety profiling, and so on. The use of grooves can also be used as an alternative to full-area scanning, which has the advantage of lower cost due to its lower imaging surface. In a case where one slit or groove has one or two rows of pixels, the pixels may be located on the same semiconductor substrate on the side of the corresponding pixel detector, rather than on the same or different semiconductor substrates. Behind the pixel detector. Several slit-type (or groove-type) tile surfaces can be placed end to end, and M forms a long continuous slit (or groove). Each tile surface of the adjacent column can be displaced in the direction of the column, so that there will be no inert area corresponding to the inert space between the tile surfaces during scanning. This is shown in Figure 5. By positioning the control electronics design on the side of each pixel unit formed by each pixel detector and pixel road, these pixel units can actually extend directly to the end of each slot (or groove) tile surface. In this way, a very long continuous slit (or groove) can be made in a very cheap way. Referring back to the first circle, the control design 24 includes the processing and control road design described in reference to Figures 3 and 4, which is connected to the semiconductor basic paper standard and is applicable to the Chinese National Standard (CNS) Α4 specification (210X297 Mm) -49----- Γ-^ --- f I installed ------ ordered ------ f line (please read the precautions on the back before filling this page) Ministry of Economic Affairs Printed A7 B7 by the Employee's Consumer Cooperative of the Central Bureau of Precinct V. Printed invention description (46) of the Pongong Consumer Cooperative of the Central Provincial Bureau of the Ministry of Economic Affairs (46) Each pixel unit 18 on the film, as outlined by the two-way arrow 22. The control electronic design 24 can address (for example, scan) the active corners 20 connecting each pixel unit 18, and use M to read out the concentrated charges in the active corners 20 at each tilted pixel unit 18. The read charge is sent to ADCs for digitalization and data reduction processors (hereinafter referred to as DRPs) to process the two-bit signal. The processing performed by DRPs may include authentication signals that cannot satisfy certain conditions, such as a minimum energy level. This is particularly useful when each praise signal corresponds to a single incident into the radiation. If the energy corresponding to the measured signal is less than expected from the radiation used, it can be concluded that the reduced storage charge is due to scattering effects. In this case, the measurement can be released, and this can ultimately improve the resolution of the image. For another option where the pixel width is greater than 100 m, the identification function can be implemented on each pixel path as described previously. In this case, the impact of low-energy children has been ruled out, and the rest are gathered on each pixel circuit. The control electronics design is additionally transferred to an image processor 28 via a path, which is schematically indicated by arrow 26. The image processor 28 includes a data storage device in which the digital value representing the charge read from each pixel unit and the position of the corresponding pixel unit 18 can be stored. For each pixel unit 18, each value charged from the pixel unit is accumulated to the charge value that has been stored for the pixel unit, so that a value can be accumulated. As a result, each image can be stored as a representation of a two-dimensional pixel array, and they can be stored in a data file, for example. The image processor 28 can access the image data stored in the material library. The paper standard applies to the Chinese National Standard (CNS) Α4 specification (210X297mm) ----; --Μ --- f-装- ----- Subscribe ------ ί line (please read the precautions on the back before filling in this page) 50 A7 B7 Central Government Bureau of Economic Affairs Employee consumption cooperation du printed five, invention description (47, to Miao chooses a known color image (all arrays) or a part of the color image (a copy of the color image array). The image processor 28 can read out the values stored in each S fixed pixel position, and through the tendons The path outlined in 30 creates a H image of the data to be displayed on a wish display 32. Of course, the data can be printed out, not, or cannot be printed except _, and further processing operations can be added. . Normally the background and noise can be subtracted from each pixel of the charge value. If the obtained color image is taken before-"empty" color image, it may be possible to deactivate the anti-pulse «level and / or background. For each «Pixels, a background value can be subtracted and deducted accordingly. The operation of the pixel processor 28 will be described in more detail below. According to one imaging technology of the present invention, it uses an imaging device according to the present invention, and has a slit or groove that can be freely accessed to effectively move the pixel unit. With the Japanese technology, the slit or groove It is possible to move around the erbium with a certain speed V, and read it in the time unit of tt-t. In the example shown on the twelfth circle, there is no 6-value image cord in a narrow winding, and each pixel has a size of ( x, y). A certain direction of movement is in the direction of the dimension X. If a read operation occurs at time U, in accordance with the argument of the present invention, the slit should be allowed to move until a time I and then read again The distance moved or broadcasted during the period UU is dx, and in this movement direction «not more than half the fi pixel size (also dx is less than or equal to x / 2 >. 逭 technology can improve the resolution along its movement curve , And compared with the full-scale imaging or Fu Tongben paper scale, the Chinese national standard (CNS) A4 specification (210X297 mm) is applied ----; --- ^ --- j * installed ------ order --- --- f ball (please read the precautions on the back before filling this page) 51 2 ^ S9〇2 A7 B7 V. Invention (48 slit (groove) technology is improved by twice. The reason for the improvement is that it uses multiple sampling chess styles, and according to this, if the slit (groove) frame is gathered in a short enough interval (The scanning distance must be less than the half-tilt pixel size), the structure below it will sense a resolution equal to the pixel size * instead of twice the pixel size. A global imaging plane or a slit (groove) The effective resolution is twice the size of the pixel, where the slit is not operated according to the argument of the invention. The above technique can be used for panoramic imaging of teeth, for example. The playback speed is usually 4 meters per second, And the width of the groove is 4 mm, and the length is 8 mm. It can be converted into 80X 1600 pixels, each pixel size is 50 meters. The gathering of the whole image should last about 10 seconds. According to this embodiment of the present invention, the indentation should be read at least every 25 meters. The reading rate of the indentation is 1.6 thousand. If you use a block of 80 columns by 20 rows of pixels and a clock frequency of 5 million Hertz, the readout speed of the block is 5X 10β (20X 80) = 3.1 thousand guns HI; the threshold is greater than the required one thousand guns ·; (-Binding " 1. ^ (please read the notes on the back before filling in this page) Printed by the Ministry of Economic Affairs, Central Bureau of Industry and Commerce Beigong Consumer Cooperative. When using this slit (groove) technology, X The ray source »is set in a high-level operation" Flow, or if possible, the X-rays should be gathered from a global area into the size of the slit (groove). It is necessary to keep the color image gathering time constant. In many cases, it may be technically difficult and expensive. Another option for the single slit (groove) technology is the multi-slot (groove) technology. According to the variation of the species, the multiple slits The slits (grooves) are placed on a plane and parallel to each other, and the vertical paper size of each slit (groove) is applicable to China National Standard (CNS) Α4 specification (210 X 297 mm) 52 Central Ministry of Economic Affairs Sample quasi-bureau employee consumer cooperation du printing 2 ^ 39〇2 a? Β7 V. Invention description (49) Axis There are certain distances. In the Japanese way, if there are η slits (concave eaves) and the total broadcast distance is X cm, then each narrow winding (groove) only needs to scan Χ / η cm. The box requires fewer mechanisms, but more importantly, the intensity of the X-ray light source only increases by X / (η X slit or groove width>. Now, various methods of operation in conjunction with the imaging device and system of the present invention will be described As mentioned above, the device and system of the present invention are intended to provide high-intensity imaging, and the radiation is intended to be directly incident on each imaging device. In the embodiments of the present invention, the radiation is impinged on the M concentration Charge (by directly storing the charge value or equivalent pressure or current), and the charge value is completely linearly related to the junction energy of the incoming radiation, not by counting the number of points or the number of events As a result, an ASID can gather the weights of individual crystals and / or «containers (or other devices on the pixel road), which describes each pixel, the road and each pixel. Most of the detectors are in turn, and the ASID is used for all The pixel unit has direct one-to-one access. The two main special sticks have a dramatic attack on their performance. One 々510 can gather up to about 2 times as much as one ^ 0 .- ^ 510 also provides clear imaging, and has an inert time of less than 1%. Its electronic noise level is only about several hundred 㑩. Compared with Fu Tong ’s pulse counting type semiconducting pus pixel detector, an ASID is in its There are no restrictions on the intensity of the roll (and / or light). Long color image gathering time (up to 1 second if required) and a very dynamic range will allow real-time imaging of the intensity * without saturation . This paper scale is applicable to China National Atomic Rate (CNS) A4 specification (210X297mm) — —. M ^ u ^ * Binding I 1. ^ (please read the notes on the back before filling in this page) 53 Central Ministry of Economy Printed by the quasi-bureau Zhengong Consumer Cooperative Association Α7 Β7 V. Description of the invention (50) As mentioned above with reference to the first circle, there is a color image processor 28 after the ADCs, which can store the position along the relevant pixel unit 18 The read out value of each pixel unit represents the digital value of the lotus. For each pixel unit 18 of value, each load value read from the pixel unit is accumulated to the stored charge value of the pixel unit, so that a single charge value can be aggregated. As a result, each color image can be stored as a list of two-dimensional pixel values. Such image data can be stored in a database, for example, and become a two-dimensional array of the color image: image (1: Npixeis, 1: 3) where the first tilt parameter includes items, which represent the image plane Number of pixels. This parameter refers to the number of pixels linearly shifted from 1 to the maximum, and the second parameter includes three values, which are the X and Y blocks and the "charge value" collected by each pixel. For each tilt image, a background / blanking pulse «flat array can be suppressed. For example, just before the color image is aggregated into a calibration image, its background / blanking pulse balance can be aggregated. The calibration method is specific to each pixel, and is not the normal state of all pixels. The image processor 28 accesses the stored color image data in the library, M selects a known image (integer array) into a part of the color image (a sub-sample of the color image array), and Create a round image of the data to be displayed, printed or further processed. Before displaying, printing or further processing the image data, the color paper size is applicable to the Chinese National Standard (CNS) Α4 specification (210Χ297mm) ^ I (-• binding ^. ^. (Please read the note on the back Please fill in this page for details)-54 Printed A7 B7 by the Beigong Consumer Cooperative of the Central Bureau of Economic Development of the Ministry of Economic Affairs 5. Description of the invention (51) The processor 28 should preferably be able to find the two images stored in these potted pixels. Value, and specify some of these values as the second extreme value of the grayscale or chroma, and can be used to exclusively display, print or further process the color image. According to the position of the heavy load on the pixel, the rest The m charge value of the pixel position can be specified as an intermediate gray value or color value between these two extreme values. For example, the gray value can be assigned to the small sky charge value of each town pixel according to the following equation: («荷 i -Minimum "Lotus" Gray value of pixel i = Minerey + -X (Maximum gray-minimum grayscale> (Minimum grayscale> (Maximum «charge-minimum gray scale> By the traditional user turn-in device 36 , Through the data path outlined by tendons 34, you can complete a part of the image you want to enlarge It is possible that the display may function with the display 32 schematically represented by the double arrow 38. The user input device 36 may include, for example, a keyboard, a mouse, etc. The present invention can be used for each active A unit of image cable aggregates «charge and results in several benefits. The accumulation of charge in the active path on each pixel unit * then selectively corresponds to the two systems with one-to-one pixel units and can be accessed by each value Active «The ability to read out the stored charge in the middle of the road can completely solve the problem of any unclear incidence of the incident incident of the rays at the same time entering the yoke. Because the charge can gather on each of the main roads for a period of super encounter, its reading The output speed is not too high * For these results, it may be possible to generate and process color images in real time based on, for example, M soft cockroaches, and in fact, it can be cheaply realized on the easy-to-use hard brain. Use Chinese National Standard (CNS) Α4 specification (210X 297mm) ----.---: --- f 'installed ------ ordered ------ ί ice (please read first (Notes on the back and then fill out this book) Printed by the Beigong Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs ---- i 'invention (52) For each part of the captured image, the contrast and resolution can be automatically adjusted and displayed on a full screen. No matter when, «the image plaque captured by the imaging device is loaded between each pixel unit When the density changes, and the part of the captured color image is displayed, the appearance of the color image can be clarified. It is assumed that the 16 loads from the active 16-way load storage device of the image cable unit have been read out, and If the storage capacity of the «load storage device is repeatedly reset before the exhausted storage device is exhausted, its dynamic range is valid and unrestricted. It only selects the active" reset rate "of each path. , Also read and reset the frequency of those «paths, M is suitable for the storage capacity of these charge storage devices and the expected maximum radiation density. Therefore, as more radiation sources produce more «charges, the active« in the road * stored in each purple-like unit will then be read out at appropriate intervals and digitized with the control 霣 路 design. After digits, the «charge has a known value, but can be aggregated with the existing digital« charge value of the same pixel. The only practical limitation is the maximum number of digits that the process can survive. However, the process design can be arranged to detect a value that is close to the maximum possible value that can be stored, and then apply a scaling factor to the stored value of all pixel units. The invention can take time-consuming imaging. Once a color image array has been generated, the image array can be continuously updated with the new digitized «charge value from the imaging device even before the illumination is started. These" charge values are then added to the existing energetic value of each pixel of the array , And the time display shows the accumulated load value. At the location where a continuous mine is used to update the image array, Yuen can provide a copy of the Ennao storage paper. The paper is suitable for the Chinese National Standard (CNS) A4 specification (210X 297mm)

Inn·—— _ | * 裝 n I 訂 (請先閲讀背面之注意事項再填寫本頁) 56 A7 B7 經濟部中央梯準局男工消费合作杜印製 五、發明説明(W ) 存之有效使用,因所檢出之輻射線将不會產生更多之影像 點,這如同某些先前之技術,但取代者是有Μ之各像素單 元位置可產生較高之電荷值。換言之,本發明能使輻射計 量聚集,而非產生輻射撞擊點之平均增加數目。一種ASID 亦可用於提供實時成像,在此每一預定時段可顯示一新的 彩像幀格。各影像楨格間之情性時間實際上為零,因此實 時成像可提供最大效率,並且在讀出通道或像素霣路數目 之複雜度上不須額外賨用。 本發明提供一棰方法,以便使輻射擴散效醮在進入該 成像裝置之前減至最小。當Μ上述方式使用一成像裝置時 ,擴散之射線將導致一較低之聚集霄荷值,這是指比該輻 射線直接入射之狀況。這是因為擴散之射線將在該像素檢 波器之耗盡區中寄存較少之能量。因此,當處理所聚集之 霣荷時,擴散之輻射比直接輻射具有對全部聚集霄荷遠較 低之效應。當顯示一聚集影像時,藉著指定一適當灰度或 色值給較低之值,其可能使擴散輻射效應減至最小。 對於所需輻射強度少於每像素最大可達讀出速度(仟 赫玆範圍)之應用,本發明提供一種包括進入該成像装置 前之輻射擴散效«方法,若未包括此方法則將降低其影像 解晰度。現將解釋可逹到此點之方法。由每一個光子或充 霣輻射顆粒所產生之電荷首先儲存在各像素單元之有源霣 路中,並且隨後讀出。該控制電子設計可數位化該電荷, 並且該DRP可比較此數位化值與一門閥參考值。該參考值 係對應於來自該進入輻射線型式所預期之霄荷,例如是一 ----:--^---f -裝------訂------1 線 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家揉準(CNS ) A4規格(210X297公釐) 57 - 57 經濟部中央橾準局貝工消費合作社印製 2〇S9〇2 A7 B7 五、發明説明(54 ) 已知波長之X射線或來自一已知能量之充®輻射線。由於 進一步考量,若該數位化電荷值小於該參考值則排除之。 逭項鑒別操作能在考置下剔除已揍散之射線。當在該成像 平面之前發生無適應性之散射效應,而該輻射線例如是橫 貫一欲觀察之物體時,該散射之輻射線將在成像平面之前 損失某些能悬,Μ致在一像素單元之耗盡區中產生較少之 霣荷。此等效應係為光子之康普頓散射及帶霣顆粒之離子 散射。 另一方面,已擴散之射線可在任何入射強度下排除之 ,設若這是在電荷聚集之前於各像素霣路上完成之。諸如 7照相術及實時血管照相術成像等應用需要100徹米或更 大寬度之像素,並且該像素電路上有足夠空間Κ實施門閥 值截止。 在進入該成像裝置之前,有一種排除輻射線擴散效應 之方法範例,其不論是相干或非柑干地,皆可使用一凹槽 技術及一對準輻射源,以致其可調節放出各射線,該等射 線係瞄準該成像凹橹。可最佳化該射源及所觀察物醴間之 距離、該物體及成像凹檜間之距離及該凹槽之寬度。這些 參數可用於定義其幾何形狀,而使己擴散射線之檢出減至 最小。這是因該已擴散射線“看到”一小相空間,並且沒 有理由進入該薄成像凹榷。這方法持別有力是因為其乃基 於幾何形狀,並且不需知道入射線之能量。若各射線業已 擴散,它們將最可能避免檢出,不論它們是已不柑干地擴 散且損失其某些能量(康普頓散射),或是相干地散射且 本紙張尺度適用中國國家橾準(CNS ) Α4規格(210X 297公釐) cft I---:---^---1 -裝------訂------一線 (請先閲讀背面之注意#'項再填寫本頁) 經濟部中央標準局貝工消费合作社印製 A7 B7 五、發明説明(55 ) 保留其所有能置(雷利散射)。 第13圖藉由舉例說明抵逹該狹缝(凹槽)之未擴散輻 射比,其爲4種不同光子能董之狹缝(凹槽)寬度、及該 狹縫(凹槽)與所觀察物體間4種不同距離之函數。對逭 範例,係假設水爲造成超過10公分厚度散射之物體。假設 該半導體為矽。可由此4條曲線看出,實際上在1毫米及 4毫米間之凹槽寬度即可排除所有散射(百分之百之垂直 軸)。這結果幾乎與該凹棺及物體間之間隔無關(在圔面 中為β )。若該凹槽寬度開始大於1至4毫米,隨後亦開 始視/3而決定其结果。因此,對於一已知能置及所考慮之 物體,可決定其最佳凹槽寬度及該凹槽與物體間之距離/3 ,以致該等散射之射線幾乎將全部排除,因此大幅改良其 影像解晰度及對比。這方法能排除相干擴散射線,而其它 方法卻不能排除之,因為它們具有與未擴散射線相同之能 量° 可用一種預定之自動化方式實現根據本發明之最佳化 成像装置設計。每一棰材料或合成物所選用之半導體基片 具有一種對進入輻射線之不同回應,此棰回應視該材料或 合成物之物理特性、輻射型式及輻射能置而定。在每一步 驟施加重心方法至該寄存電子訊號*而此時進入之輻射線 係横跨該半導醱基片。這能決定可獲得之最佳解晰度,而 為上面各參數之一函數。因此可決定該像素尺寸。藉著正 確選擇該像素尺寸,即可最大化其訊號與矂音比(因為在 一像素中包含大部份之訊號),同時使費用及裝置後雜度 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ 297公釐) ^ ^ I裝 II 訂 ^線 (請先閲讀背面之注意事項再填寫本頁) 經濟部中央梂準局負工消費合作社印製 A7 B7 五、發明説明(56 ) 減至最小。這些結果及預期之δ敏度係可儲存在一資料癉 中,並且可用於界定該成像裝置之成像平面的設計參數》 亦即其像素尺寸及基片厚度。另一種選擇是,可提供一条 列成像平面,它們係與一共用控制霄子組及一彩像處理器 相容。隨後一位最終使用者可在實施成像之前賴!入一想要 之δ敏度至該影像處理器*以造成該處理器自動地以正確 規格選擇一成像平面。 如一範例,可考廉使用矽當作該半導體基片材料。在 生物科技應用中,係使用諸如氫3、硫35、磷32、磷33、 硪14及碘125等同位素。這些同位素放出/9輻射。例如考 廉硫35,其可放出170仟電子伏待之帶霣輻射。第14圔指 出許多此等/3射線穿經矽晶Η之通道。若施Μ該重心方法 ,其可發現該解晰度不會比32撤米佳。隨後可逸擇該像素 尺寸,使其大於32撤米,Μ便包含大部份之電子訊號。上 述/3輻射同位素係用於大部份生物科技應用中。在乳房X 光照相術、X光斷層照相術、核子玲學、牙齒成像、安全 糸統及產品品質控制中,X射線係用位於10仟霣子伏特至 180仟電子伏特間之能量,並且碲化鎘鋅、碲化鎘及碘化 汞皆是半導體之適合逛擇材料。 有許多生物學應用係輻射實施成像。最常見者係 使用下列各同位素之一:氫3 ( 18仟霣子伏特)、碩14 ( 155仟霣子伏特)、硫35 ( 170仟楚子伏特)、磷32 ( 250 仟霣子伏特)、磷32 ( 1700仟電子伏特)。 逭些應用之精確要求可總結如下: 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公着) 60 I ^ ^ *裝 ^訂 n f 球 (請先閱讀背面之注意事項再填寫本頁) A7 B7 經濟部中央橾準局負工消費合作杜印製 五、發明説明(57 -理想上原地雜配需10撤米空間; -DNA、RNA上之雜配及隔離或統合蛋白質,理想上箱 要多於300撤米之空間; -DNA串列理想上需要100撤米。 一種根據本發明之成像装置可滿足上面各項要求。除 了極佳之效率(實際上為百分之百),根據本發明之成像 装置可減少由數日或數月至數小時播取結果之時間。既然 該成像係於實時中完成,一生物學家可在它們聚集時看到 其結果。可用軟體及統計學分析方法說明這些結果。 在乳房X光照相術中,所用X射線通常具有由10仟霄子 伏特至30仟電子伏特之能量。該X光源係置於該欲觀察物 睡後方,該物體可吸收局部X射線,並讓其餘X射線穿過。 抵速該成像平面之X射線隨後吸收其光子,並且由所決定 之入射點產生一電力訊號。其電荷密度分佈可有效地界定 該彩像,而聯線之傳統處理裝置可上色、放大及分析,以 便具有最大之影像對比及解晰度、對於0.5至1毫米厚之活 性碲化鎘鋅、碲化鎘或碘化汞,各像素之效率幾乎為百分 之百,並且可大幅減少所需劑量、用於乳房X光照相術之 解晰度可比30徹米佳,並且可顯示該尺寸之有機結構。 在核子B學診斷中,一在150仟霣子伏特範圍放出X射 線之同位素(諸如具有6小時半壽命之Tc 99)係注射入 人體,並且濃縮在某些欲成像區域。該輻射係等方性地放 出,並且環繞該人體準直管過濾器,Μ逮離不想要之方向 ,因此使得一點投射至不同平面。根據本發明之一範例, -------:---^ .裝------訂------^線 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 61 - 61 ^〇S9〇2 經濟部中央揉準局貝工消费合作社印製 A7 B7 五、發明説明(58 ) 該例如由碲化鎘鋅、碲化鎘、碘化汞、娣化銦、緒、砷化 鎵或矽製成之AS ID,係可置於取代目前各成像平面之人腦 前面及四週。 在牙齒成像操作中係Μ 40至100仟電子伏特能量之X射 線施行之,並且箱要約15至25平方公分之成像面積。因此 上述使用該狹縫/凹縫技術之牙齒全景成像將構成本發明 之一較佳應用。適合之半導體係如上所述。 然則本發明之另一項可能應用是非破壊性之工莱核定 及產品品質控制。視所觀察之無機物體而定,可選擇一不 同X射線之能量,Μ致最佳化具有高對比之解晰度及高效 率。可使用在20至180仟霣子伏特範圍内之X射線能* ° 一 產品或一結構之影像係自動比較於同一產品或結構之理想 影像,並且各種劇烈程度可能觭發不同作用,並反讃至其 生產線。 一棰AS ID及上述之方法可在一廣泛應用中發現其用途 ,包括X射線、胸腔X射線、X光乳房照相術、X光斷層照相 術、電腦斷層照相術、空間霣腦斷層照相術、X光骨頭密 度测定法、7射線核子放射照相術、7照相術、單光子放 射霣腦斷層照柑術(SPECT)、陽離子放射斷層照相術(PET) 、X射線牙齒成像、X射線牙齒全景成像、使用同位素而用 於DNA、RNA與蛋白質串列、原地雜配、DNA、RNA雜配及蛋 白質隔離或統合之;8射線成像,及一般之/9射線成像、使 用色譜法與聚合物鏈結反應之自髑放射照相術、產品品質 控制中之X射線與7射線成像、非破壞性測試及實時與線 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) —1' -裝 訂 f &- (請先閲讀背面之注意事項再填寫本頁) 62 A7 B7 五、發明説明(59 ) 上監控、安全控制条統及使用輻射線之實時(蓮動)成像 〇 吾人將發現可放置於單一半導體檢波器上之像素單元 尺寸及數目,係需視所用特定半導膿積匾技術而定。因此 ,雖然已知尺寸及元件值之特定範例》本發明並未受限於 此,並意欲包括在那些尺寸及值之改變,這些改變係指目 前此技術及未來技術所可能施行者。亦應注意的是*所示 有源電路,例如第2、8與11圜中所示像素霣路20、第3 、4與9圖中所示連接線路與控制霄路設計,係只為可能 之電路範例,並且在本發明之範睡内可能有許多修改及附 加物。 雖然樂已在此參考所附圖面詳細描述本發明之例示實 施例,應注意的是本發明並未受限於那些明確之*施例, 並且在此一位精通本技藝之人士將可實施各種變化與改良 ,卻不會偏離本發明之範嘛及精神,如所附申請專利範围 所定義者。 ;111 ^ -裝 訂 I ^線 (請先閲讀背面之注意事項再填寫本頁) 經濟部中央標準局負工消費合作社印製 63 本紙張尺度適用中國國家標準(CNS )八4規格(210X 297公釐) 經濟部中央橾準局員工消費合作社印製 2939〇2 A7 B7 五、發明説明(60 ) 元件禰«對照 1,214,212 ....矽基片 42,342 ....類比訊號輪出 2 …· 氧化物層 44 .... 類比霣源Μ入 3 .… 源棰 46,346 ....重置Ml入 4.6 ... .N型摻雜匾 48.348 ....起動Μ入 5 ---- 漏棰 50 .... 霣晶黼檷極 7 ---- 柵棰 52 .... Φ晶齷 8 … 逆潘《 54 ____ 線路 10 ---- 成像糸統 56,561 ....類比數位轉換器 12 ____ 物釀 58 ____ 訊號處理霣路 14—— 韆射線 60 ____ 行逸定邏輯霣路 16---- 主動-像索半導鼸 62____ 列编址邏輯霣路 成像装置 64 ____ 起動線路 18 · · · · 像素單元 66____ 重置線路 19,319,214,112 ...像素檢波 68 ____ 列線路 器(二極羅) 70 ____ 霣源霣路 20—— 有源像素霣路 74 .... 行讀出ΕΝΑ 22 ____ 路徑 76 ____ 行重置RES 24____ 控制《子設計 78____ 列灌定訊號 28____ 彩像處理器 79____ 時鏟脈衝訊轚 30 ____ 箭頭 80 ____ 時鳙腯衝輪入 32____ 顯示器 82 ____ 讀取位元綸入 40,140.180 .·.·軀壓_入 84 ____ 讀出位元_出 ----.--J---^ ‘裝------訂------1' 4 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 64 五、發明説明(61 ) A7 B7 90,88 .. ..類比輪出 192 ____ 放電開關 100 ____ 放電邏輯霄路 196 ____ 輪出開關 110 ---- 連續式電極 198 ____ 讚出邏輯電路 114 ____ 檢波器電極 210 ____ 混合支撐板 116 ____ 鈍化層 212 ---- 矽讀出晶片 156 ____ 蝓出線路 214 ____ 像素檢波器層 160 ... · X讀出線路 216 ____ 有效面積 162 .... X重置線路 218 ____ 保護環 164 ____ Y讀出線路 220 ____ 引線接合墼 168 ... · Y重置線路 222 ____ 撤緩衝器 172 ____ 正極電源線路 222 ____ 碰撞接合 174 ____ 接地線路 224 ____ 揷銷 176 ____ 負極電源線路 347 ____ 重置FET 178 ____ 偏壓線路 350 ____ 電荷儲存FET 184,188 ....輸入電晶髏 352 ____ 起動FET 186 _ 電流源 354,356,182 ____ 二極體 190 ____ 反饋電容器 360 ··.. 雙極電晶體 } ; ^ ·裝 訂 (請先閱讀背面之注意事項再填寫本頁) 經濟部中央標準局員工消費合作社印裝 本紙張尺度適用中國國家標準(CNS ) A4規格(2丨Ο X 297公釐) 65Inn · —— _ | * Pack n I order (please read the precautions on the back and then fill in this page) 56 A7 B7 The Ministry of Economic Affairs Central Escalation Bureau male workers' consumption cooperation du printing 5. The invention description (W) is valid Use, because the detected radiation will not produce more image points, which is like some previous techniques, but the replacement is that each pixel unit position with M can generate a higher charge value. In other words, the present invention enables the concentration of radiation measurements rather than the average increase in the number of radiation impact points. An ASID can also be used to provide real-time imaging, where a new color image frame can be displayed every predetermined time period. The emotional time between frames of each image is actually zero, so real-time imaging can provide maximum efficiency, and there is no need to extra use in the complexity of the number of readout channels or pixel paths. The present invention provides a method to minimize the radiation diffusion effect before entering the imaging device. When an imaging device is used in the above manner, the diffused rays will result in a lower concentration charge, which refers to the situation where the rays are directly incident. This is because the diffused rays will register less energy in the depletion region of the pixel detector. Therefore, when dealing with the collected charge, the diffused radiation has a much lower effect on the total charge than the direct radiation. When displaying an aggregated image, by assigning an appropriate grayscale or color value to a lower value, it may minimize the effects of diffuse radiation. For applications where the required radiation intensity is less than the maximum achievable readout speed per pixel (in the range of thousands of hertz), the present invention provides a method including radiation diffusion effect before entering the imaging device. If this method is not included, the image will be reduced Clarity. The method that can reach this point will now be explained. The charge generated by each photon or charged radiation particle is first stored in the active circuit of each pixel unit, and then read out. The control electronics design can digitize the charge, and the DRP can compare the digitized value with a gate valve reference value. The reference value corresponds to the expected load from the incoming radiation pattern, for example it is a ----:-^ --- f -installed ------ order ----- 1 line (Please read the precautions on the back before filling in this page) This paper size is applicable to China National Standard (CNS) A4 (210X297mm) 57-57 Printed by the Central Consortium Bureau of the Ministry of Economic Affairs Beigong Consumer Cooperatives 2〇S9. 2 A7 B7 V. Description of the invention (54) X-rays of known wavelengths or charged® radiation from a known energy. For further consideration, if the digitized charge value is less than the reference value, it is excluded. The item identification operation can eliminate the scattered rays under the test. When a non-adaptive scattering effect occurs before the imaging plane, and the radiation is, for example, traversing an object to be observed, the scattered radiation will lose some cantilever before the imaging plane, resulting in a pixel unit Less depletion is generated in the depletion region. These effects are Compton scattering of photons and ion scattering of entrapped particles. On the other hand, the diffused rays can be excluded at any incident intensity, provided that this is done on each pixel before the charge is accumulated. Applications such as 7-photography and real-time angiography imaging require pixels with a width of 100 cm or more, and there is enough space on the pixel circuit to implement gate threshold cut-off. Before entering the imaging device, there is an example of a method to eliminate the radiation diffusion effect. Whether it is coherent or non-citrus dry, a groove technique and an aiming radiation source can be used so that it can radiate various rays. The rays are aimed at the imaging cavity. The distance between the source and the object under observation, the distance between the object and the imaging recess and the width of the groove can be optimized. These parameters can be used to define its geometry and minimize the detection of diffused rays. This is because the diffused rays "see" a small phase space, and there is no reason to enter the thin imaging cavity. This method is powerful because it is based on geometry and does not need to know the energy of the incoming rays. If the rays have diffused, they will most likely avoid detection, regardless of whether they have diffused dry and lost some of their energy (Compton Scattering), or coherently scattered and this paper scale is applicable to Chinese national standards (CNS) Α4 specification (210X 297mm) cft I ---: --- ^ --- 1 -installation ------ order ------ first line (please read the note on the back first # ' Item and then fill out this page) A7 B7 printed by the Beigong Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs V. Description of the invention (55) Keep all its settings (Rayleigh scattering). Figure 13 illustrates the undiffused radiation ratio against the slit (groove) by way of example, which is the width of the slit (groove) of four different photon energy sources, and the slit (groove) and the observed A function of 4 different distances between objects. For the Japanese example, it is assumed that water is an object that causes scattering over 10 cm in thickness. Assume that the semiconductor is silicon. It can be seen from these four curves that in fact the groove width between 1 mm and 4 mm can exclude all scattering (100% vertical axis). This result is almost independent of the distance between the coffin and the object (β in the squint surface). If the width of the groove begins to be greater than 1 to 4 mm, then the result is determined based on / 3. Therefore, for a known object that can be placed under consideration, the optimal groove width and the distance between the groove and the object / 3 can be determined, so that almost all scattered rays will be excluded, so the image solution is greatly improved Clarity and contrast. This method can exclude coherent diffused rays, but other methods cannot, because they have the same energy as undiffused rays. The optimized imaging device design according to the present invention can be realized in a predetermined automated manner. The semiconductor substrate selected for each material or composition has a different response to incoming radiation, and this response depends on the physical characteristics, radiation pattern, and radiation energy of the material or composition. At each step, the center of gravity method is applied to the registered electronic signal * and the radiation line entering at this time is across the semiconducting substrate. This determines the best resolution available, and is a function of one of the above parameters. Therefore, the pixel size can be determined. By choosing the pixel size correctly, you can maximize the signal-to-band ratio (because a pixel contains most of the signal), and at the same time make the cost and post-device complexity of this paper standard applicable to the Chinese National Standard (CNS) Α4 specification (210Χ 297 mm) ^ ^ I installed II line ^ (please read the precautions on the back before filling in this page) A7 B7 printed by the Ministry of Economic Affairs Central Counseling Bureau Cooperative Labor Co., Ltd. 5. Description of invention (56) Minimize. These results and the expected delta sensitivity can be stored in a data frame and can be used to define the design parameters of the imaging plane of the imaging device, that is, its pixel size and substrate thickness. Another option is to provide a series of imaging planes that are compatible with a common control unit and a color image processor. An end user can then rely on it before implementing imaging! Enter a desired delta sensitivity into the image processor * to cause the processor to automatically select an imaging plane with the correct specifications. As an example, Kaolian uses silicon as the semiconductor substrate material. In biotechnological applications, isotopes such as hydrogen 3, sulfur 35, phosphorus 32, phosphorus 33, sodium 14 and iodine 125 are used. These isotopes emit / 9 radiation. For example, Kaolian Sulfur 35, which emits 170 thousand electrons of waiting radiation. Section 14 indicates many channels through which these three rays pass through the silicon crystal H. If the method of gravity is applied, it can be found that the resolution is no better than 32 meters. The pixel size can then be selected so that it is greater than 32 meters, and M contains most of the electronic signals. The above / 3 radiation isotope system is used in most biotechnology applications. In mammography, tomography, nuclear linguistics, dental imaging, safety systems, and product quality control, X-rays use energy between 10 to 180 volts, and telluride Cadmium zinc, cadmium telluride and mercury iodide are all suitable materials for semiconductors. There are many biological applications where radiation imaging is performed. The most common is the use of one of the following isotopes: hydrogen 3 (18 thousand volts), Shuo 14 (155 thousand volts), sulfur 35 (170 thousand volts), phosphorus 32 (250 thousand volts) , Phosphorus 32 (1700 thousand electron volts). The precise requirements for some applications can be summarized as follows: This paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297 publication) 60 I ^ ^ * Binding ^ order nf ball (please read the precautions on the back before filling this page) A7 B7 Du Printed by the Central Ministry of Economic Affairs of the Ministry of Economic Affairs. 5. Description of the invention (57-Ideally for in-situ miscellaneous needs 10 meters of space;-Miscellaneous and isolated or integrated proteins on DNA and RNA, ideally on the box It requires more than 300 metre-removing space;-DNA tandem ideally requires 100 metre-removal. An imaging device according to the present invention can meet the above requirements. In addition to excellent efficiency (actually 100%), according to the present invention The imaging device can reduce the time of broadcasting results from days or months to hours. Since the imaging is done in real time, a biologist can see the results when they gather. It can be explained by software and statistical analysis methods These results. In mammography, the X-rays used usually have an energy from 10 volts to 30 volts. The X-ray source is placed behind the object to be observed, and the object can be absorbed Part of the X-rays, and let the rest of the X-rays pass through. The X-rays that resist the imaging plane then absorb their photons and generate an electrical signal from the determined point of incidence. Their charge density distribution can effectively define the color image, and The traditional on-line processing device can be colored, magnified and analyzed for maximum image contrast and resolution. For each 0.5 to 1 mm thick active cadmium zinc telluride, cadmium telluride or mercury iodide, the efficiency of each pixel It is almost 100%, and can greatly reduce the required dose, the resolution of mammography can be better than 30 cm, and it can display the organic structure of this size. In nuclear B diagnosis, one is 150 thousand yuan Isotopes that emit X-rays in the volt range (such as Tc 99 with a half-life of 6 hours) are injected into the human body and concentrated in certain areas to be imaged. The radiation is emitted isotropically and surrounds the body collimator filter , Μ catches the unwanted direction, so a point is projected to different planes. According to an example of the present invention, -------: --- ^. 装 ------ 定 ----- -^ Line (please read the notes on the back first (Fill in this page) This paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 61-61 ^ 〇S9〇2 A7 B7 printed by the Beigong Consumer Cooperative of the Central Bureau of Economic Development of the Ministry of Economic Affairs 5. Description of the invention (58) This AS ID, made of, for example, cadmium zinc telluride, cadmium telluride, mercury iodide, indium difluoride, aluminum sulfide, gallium arsenide, or silicon, can be placed in front of and around the human brain replacing the current imaging planes. In the dental imaging operation, X-rays with an energy of 40 to 100 thousand electron volts are applied, and the box requires an imaging area of about 15 to 25 square centimeters. Therefore, the above-mentioned panoramic imaging of teeth using the slit / groove technique will constitute the present invention. A better application. Suitable semiconductors are as described above. However, another possible application of the present invention is non-destructive engineering verification and product quality control. Depending on the inorganic object being observed, a different X-ray energy can be selected to optimize the resolution and efficiency with high contrast. X-ray energy can be used in the range of 20 to 180 thousand volts * ° The image of a product or a structure is automatically compared to the ideal image of the same product or structure, and various degrees of severity may occur differently and refute To its production line. The AS ID and the above methods can be found in a wide range of applications, including X-rays, chest X-rays, mammography, X-ray tomography, computed tomography, spatial brain tomography, X-ray bone densitometry, 7-ray nuclear radiography, 7 radiography, single-photon radiographic tomography (SPECT), cation radiography (PET), X-ray dental imaging, X-ray panoramic dental imaging 、 Use isotopes for DNA, RNA and protein tandem, in situ hybridization, DNA, RNA hybridization and protein isolation or integration; 8-ray imaging, and general / 9-ray imaging, use chromatography and polymer chain The self-bending radiography of the reaction, X-ray and 7-ray imaging in product quality control, non-destructive testing, and real-time and linear paper scale are applicable to the Chinese National Standard (CNS) A4 specification (210X 297 mm) — 1 ' -Binding f &-(please read the precautions on the back before filling in this page) 62 A7 B7 5. Description of the invention (59) Real-time (lotus) imaging of monitoring, safety control rules and the use of radiation lines. Found will be placed on the cell size and the number of pixels on a single semiconductor detector, with a specific system will depend upon the semiconductor technology may be purulent plaques product. Therefore, although the "specific examples of known dimensions and component values" the present invention is not limited thereto, and is intended to include changes in those dimensions and values, these changes refer to the current technology and future technology may be implemented by those who implement. It should also be noted that the active circuits shown in *, such as the pixel circuits 20, 3, 4 and 9 shown in Figures 2, 8 and 11, are designed to connect the lines and control roads as possible. Circuit examples, and there may be many modifications and additions within the scope of the present invention. Although Le has here described in detail exemplary embodiments of the present invention with reference to the attached drawings, it should be noted that the present invention is not limited to those specific * embodiments, and a person skilled in the art will be able to implement Various changes and improvements will not deviate from the scope and spirit of the present invention, as defined by the scope of the attached patent application. ; 111 ^-Binding I ^ line (please read the precautions on the back before filling this page) Printed by the Ministry of Economic Affairs, Central Standards Bureau, Negative Consumer Cooperative 63 This paper scale is applicable to the Chinese National Standard (CNS) 84 specifications (210X 297 2) Printed 2939〇2 A7 B7 by Employee Consumer Cooperative of the Central Bureau of Economic Affairs of the Ministry of Economic Affairs 5. Description of the invention (60) Components «Comparative 1,214,212 .... Silicon substrate 42,342 .... Analog signal round out 2 ... Oxidation Object layer 44 .. Analogue source M input 3... Source input 46,346 .... reset M1 input 4.6 ... .N-type doped plaque 48.348 .... start M input 5 ---- drain曰 50 .... 難 晶 黼 渷 极 7 ---- Grid 雰 52 .... Φ 晶 龌 8… Inverse Pan "54 ____ Line 10 ---- Imaging System 56,561 .... Analog Digital Conversion Device 12 ____ Material Brew 58 ____ Signal Processing 14-Thousand Rays 60 ____ Xing Yi Ding Logic 16 16-Active-Like-Semiconductor 62 62 __ Column Addressing Logic 61 ____ Start Line 18 · Pixel unit 66____ Reset line 19,319,214,112 ... Pixel detection 68 ____ Column line device (dipole) 70 ____ 霣 源 霣 路 20 — Active pixel circuit 74 .... Line read ΕΝΑ 22 ____ Path 76 ____ Line reset RES 24____ Control "Sub-design 78____ Column irrigation signal 28____ Color image processor 79____ Time shovel pulse signal 30 ____ Arrow 80 ____ When the carp rushes into the wheel 32____ the display 82 ____ reads the bit into the fiber 40,140.180... · Body pressure _ into 84 ____ reads out the bit _ out ----.-- J --- ^ 'installed --- --- Subscribe ------ 1 '4 (Please read the precautions on the back before filling in this page) This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297mm) 64 V. Description of invention (61 ) A7 B7 90,88... .. analog round-out 192 ____ discharge switch 100 ____ discharge logic road 196 ____ round-out switch 110 ---- continuous electrode 198 ____ praise logic circuit 114 ____ detector electrode 210 ____ hybrid Support plate 116 ____ Passivation layer 212 ---- Silicon readout chip 156 ____ Sap out line 214 ____ Pixel detector layer 160 ... · X readout line 216 ____ Effective area 162 .... X reset line 218 ____ Guard ring 164 ____ Y readout line 220 ____ Wire bonding 168 ... · Y reset line 222 ____ Withdraw buffer 172 ____ Positive power line 222 ____ Collision junction 174 ____ Ground line 224 ____ Pin 176 ____ Negative power line 347 ____ Reset FET 178 ____ Bias line 350 ____ Charge storage FET 184,188 .... input transistor 352 ____ Starting FET 186 _ Current source 354,356,182 ____ Diode 190 ____ Feedback capacitor 360 ··· .. bipolar transistor}; ^ · Binding (please read the precautions on the back before filling in this page) Employee consumption of the Central Standards Bureau of the Ministry of Economic Affairs The paper size of the printed version of the cooperative is applicable to the Chinese National Standard (CNS) A4 specification (2 丨 X 297 mm) 65

Claims (1)

Α8 Β8 C8 D8 經濟部中央標準局貝工消費合作社印製 六、申請專利範圍 第84112672號申請案申請專利範圍修正本 85.7.6. 1. 一種用於成像高能輻射之成像裝置,該成像裝置包含 一設有半導體基片之像素單元陣列,該基Μ含有一像 素檢波器陣列及一對應之像素電路陣列,該等檢波器 可回應進入之輻射線而産生電荷;其每一個像素電路 係聯結一各別像素檢波器*用以聚積射入該像素檢波 器上之輻射線所産生的電Μ,該等像素電路偽可値別 编址*並包含電荷聚積電路、讀取電路與重置電路: 其中該電荷聚積電路包括用以積聚由入射至値別像素 檢波器上之輻射所造成電荷的電荷儲存機構,該讀取 電路傜用以判讀由該電荷儲存機構聚積之電荷,該重 置電路偽用以重置該電荷儲存機構;其待戡在於每一 像素電路係被組構來提供備有一電容及足以儲存1.8百 萬個電子之動態範圍的電荷儲存機構,以在被判讀或 重置之前,積聚在各別像素檢波器上之多次連續的高 能輻射線撞出之電荷。 2. 根據申請專利範圍第1項之成像裝置,其中每一個像 素電路所有之輸入節點電容超過〇.1撤撤法拉•最好 超過0.3擻微法拉。 3. 根據申請專利範圍第2項之成像裝置,其中每一像素 電路包含一電荷儲存裝置以聚積電荷,該電荷儲存裝 置之電容大致形成該像素電路及該像素單元之輸入節 點電容。 4. 根據申請專利範圍第2項之成像裝置•其中每一像素 -66 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) m tm ^^^1 1— ~ι ϋ-— t ---去κ I ^^^1 ^^^1 ml 14 —^n —^n mi.. , i 0 i ^ 鉑 (請先閱讀背面之注意事項再填寫本頁) 經濟部中央揉準局員工消费合作社印製 A8 B8 C8 D8 六、申請專利範圍 電路至少包括二個電晶體,第一値電晶體偽用做該電 荷儲存裝置》而第二値電晶體偽用做一讀出開關*其 係回應於一起動訊號,以便連接該第一個電晶體至一 輸出線路,用以輸出任何已聚積之電Μ。 5. 根據申請專利範圍第2項之成像裝置I其中每一像素 電路至少包括二値呈柵地一陰地放大级之電晶體。 6. 根據申請專利範圍第4項之成像裝置,其中該等電晶 體是場效電晶體。 7. 根據申請專利範圍第6項之成像裝置,其中第一値電 晶體之PET電容實爾上形成該淥素電路及像素單元之 輸入節點電容。 8. 根據申請專利範圍第4項之成像裝置,其中每一像素 電路包括另一傾場效電晶體•其可回應一重置訊號* 以便重置該電荷儲存裝置。 9. 根據申請專利範圍第2項之成像裝置,其中該像素電 路包括過載保護電路設計、最好是二極體,用以過壓 或失壓保護。 10. 根據申請專利範圍第1項之成像裝置,其包括用以電 子隔離各像素單元之電力阻抗機構。 11. 根據申請專利範圍第10項之成像裝置,其中該電力阻 抗機構包括一設在相鄰像素檢出器間之非導電性鈍準 層0 12. 根據申請專利範圍第11項之成像裝置 > 其中在該鈍態 層施予一電位*以便在該鈍態層下方之半導體基Η内 本紙張尺度適用中國國家標準(CNS )八4規格(210X297公嫠) -------1! I裝------?τ-----f ·線 (請先閲讀背面之注意事項再填寫本頁):.... 8 888 XBCD 經濟部中央標準局貝工消費合作社印製 六、申請專利範圍 産生一電位障,用於進一步電力隔離各像素單元。 13. 根據申請專利範圍第1〇項之成像裝置,其中該電力阻 抗機構包括一構成該像素電路一部份之二極體。 14. 根據申請專利範圍第1〇項之成像裝置,其中該電力阻 抗機構包括構成該像素電路一部份之雙極電晶體。 15. 根據申請專利範圍第14項之成像裝置,其中毎一像素 電路之雙極電晶體之基極係設定至一共同電位。 16. 根據申請專利範圍第1項之成像裝置,其中一像素電 路中所聚積之電荷值傺由一像素電路輸出,而當做一 電流值。 , 17. 根據申請專利範圍第1項之成像裝置,其中該像素單 元之尺寸係為1毫米寬度之等級或比其更少,最好是 約350徹米寬。 18. 根據申請專利範圍第1項之成像裝置,其中該像素單 元之尺寸約為150微米寬或更少,較好是約為50撤米 寬或更少,且最好是約10徹米寬。 19. 根據申請專利範圍第1項之成像裝置,其中該基Η厚 度是在200徹米與3毫米之間。 20. 根據申請專利範圍第1項之成像裝置,其中該等像素 電路偽與該基片形成一整體,並與對應之像素檢波器 齊平。 : 21. 根據申請專利範圍第1項之成像裝置*其中該像素電 路係製成於另一基片中,該另一基片傜併入該等像素 電路,而耦合至併入該等像素檢波器之基Η ·其每一 -68 - 本紙張尺度適用中國國家標準(CNS )八4«!/格(210Χ297公釐) ---------ί丨裝------訂-----一· 線 (請先閱讀背面之注意事項再填寫本頁) 經濟部中央標準局貝工消費合作社印裝 29S9〇2 as B8 C8 D8 六、申請專利範圍 像素電路偽與該對應像素檢波器對齊及耦合。 22.根據申請專利範圍第1項之成像裝置,其中該陣列包 括單行像素檢波器及相聯之像素電路,以形成一狹縫 型成像裝置,或包括多數行之像素檢波器及相聯之像 素電路,以形成一凹槽型成像裝置。 23 .根據申請專利範圍第22項之成像裝置,其中各個像素 檢波器之像素電路傜橫向鄰接對應之像素檢波器。 24 ·根據申請專利範圍第1至23項中任一項之成像裝置, 其中每一像素電路上可在讀出之前聚積電荷達1秒之 級數時段。 . 25.根據申請專利範圍苐1項之成像裝置,其包括含有编 址邏輯電路之控制電子設計,用以對各個像素電路编 址,及由該等像'素電路讀出己聚積之電Μ值,並且選 擇性地重S該等像素電路。 26 .根據申請專利範圍第25項之成像裝置,其中該編址邏 輯電路包括用以連接像素電路之輸出線路至該成像裝 置輸出點之機構·用以供應讀取起動訊號至該等像素 電路謓取起動輸入之機構,及用以供應重置訊號至各 像素電路重置輸入之機構。 27 ·根據申請專利範圍第26項之成像裝置*其中用以連接 各輸出線路之機構包括一移位寄存器或計數器,用以 相繼連接各列像素之像素電路輸出線路至該成像裝置 之輸出。 28.根據申請專利範圍第26項之成像裝置,其中用以供應 -69 - 本紙張尺度適用中國國家榡準(CNS ) Α4規格(2Ι0Χ297公釐) I PJ—裝 n 訂 | 線 (請先閲讀背面之注意事項再填寫本頁) 經濟部中央揉準局員工消費合作社印裝 ^3902 A8 B8 C8 D8 六、申請專利範圍 讀取起動訊號之機構包括一移位寄存器或計數器,用 以相繼供應讀出起動訊號至各行像素之像素電路讀取 起動輸入。 29 .根據申謓專利範圍第27項之成像裝置,其中用以供應 重置訊號之機構包括一移位寄存器或計數器,俾能相 繼供應重置訊號至各行像素之像素電路重置輸入。 30. 根據申請專利範圍第25項之成像裝置,其中該控制電 子設計包括一類比數位轉換器,用以由該像素電路把 一類比電荷值轉換成一數位電荷值。 31. 根據申請專利範圍第25項之成像裝置,其中至少部份 控制電子設計傜整合入一半導體基片,而該等像素電 路傜整合於其上。 32. 根據申請專利範圍第1項之成像裝置,其中該半導體 基片係由一材料製成,該材料係選自:碲化鎘鋅、碲 化鎘、碘化汞、銻化絪、砷化鎵、鍺、溴化鉈與矽。 33. —種成像条統,包含有根據申請專利範圍第30項之成 像裝置,該成像糸統包含一連接至該控制電子設計之 影像處理器,用以處理來自各個像素電路之數位電荷 值,以便在一顯示裝置上形成一影像,用以顯示。 34 .根據申請專利範圍第33項之成像糸統,其中該處理器 可決定欲顯示各像素之最大與最小電荷值,指定極值 灰度或色值給該等最大與最小電荷值,並根據該二極 值間之滑尺分配灰度或色值給一個別像素,而這是有 賴於該像素之電荷值而定。 -70 - 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) n 1^1 n^· 1^—· HM I ^^^1 nn n^— ^^^1 In-^-^nn >^^^1 ^^^1 ml ^ (請先閲讀背面之注意事項再填寫本頁) 經濟部中央榇準局員工消費合作社印製 2^S9〇2 六、申請專利範圍 35 .根據申請專利範圍第34項之成像条統,其中該灰度或 色值偽根據下列公式分配: ‘ (電荷i 一最小電荷) 像素i之灰度值=最小灰度+ ---- (最大電Μ ~最小電荷) / 二 X (最大灰度一最小y \:入 36 . —種成像条統,包含有多個專利範圍第1項 之成像裝置,該等成像裝置係如瓦面般鋪設在一起, 以形成一感光嵌鑲幕面。 37 ·根據申請專利範圍第36項之成像糸統,其中該感光嵌 _幕面包括多數列之瓦面成像裝置,相鄰列之成像裝 置像在該列方向中偏置。 38 .根據申請專利範圍第36項之成像糸統,其中包括用以 步進或移勤該成像裝置及/或欲成像物體之機構.以 便在一整個影像區之上方聚積一影像。 3 9 .根據申請專利範圍第3 6項之成像糸統,其包括二成像 表面,每一表面包括各成像裝置之一感光嵌鑲幕面, 該二成像表面實質上傜彼此平行地排列,並且用一置 於該二表面間之欲成像物體彼此隔開,該等感光嵌鑲 幕面傜彼此相對橫向地偏置,以實質賦予該物體之完 整成像。 40 . —種成像条統,包含有多個根據申請專利範圍第1項 之成像裝置,其中該等成像裝置實質上俗繞著一環狀 物或局部環狀物之周邊切線地排列,以包圍或局部包 -71 -Α8 Β8 C8 D8 Printed by Beigong Consumer Cooperative of Central Bureau of Standards of the Ministry of Economy VI. Application for Patent Scope No. 84112672 Application for Amendment of Patent Scope 85.7.6. 1. An imaging device for imaging high-energy radiation, the imaging device includes A pixel unit array provided with a semiconductor substrate, the base M contains a pixel detector array and a corresponding pixel circuit array, the detectors can generate charges in response to incoming radiation; each pixel circuit is connected to a Each pixel detector * is used to accumulate the electric energy generated by the radiation incident on the pixel detector. These pixel circuits can be pseudo-addressable * and include a charge accumulation circuit, a reading circuit and a reset circuit: Wherein the charge accumulation circuit includes a charge storage mechanism for accumulating charge caused by radiation incident on the pixel detector, the reading circuit is used to interpret the charge accumulated by the charge storage mechanism, and the reset circuit is pseudo Used to reset the charge storage mechanism; its standby is that each pixel circuit is configured to provide a capacitor and enough to store 1.8 million electricity The charge storage mechanism of the dynamic range of the sub is to accumulate the charges that are generated by multiple consecutive high-energy radiation lines on the respective pixel detectors before being interpreted or reset. 2. The imaging device according to item 1 of the patent application, in which the capacitance of all input nodes of each pixel circuit exceeds 0.1 retreat farad • preferably more than 0.3 microfarad. 3. The imaging device according to item 2 of the patent application, wherein each pixel circuit includes a charge storage device to accumulate charge, and the capacitance of the charge storage device substantially forms the input node capacitance of the pixel circuit and the pixel unit. 4. The imaging device according to item 2 of the scope of patent application • Each pixel-66 paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297mm) m tm ^^^ 1 1 ~ ~ ι ϋ --- t --- Go κ I ^^^ 1 ^^^ 1 ml 14 — ^ n — ^ n mi .., i 0 i ^ platinum (please read the precautions on the back before filling out this page) A8 B8 C8 D8 printed by the Employee Consumer Cooperative. 6. The scope of patent application includes at least two transistors. The first transistor is used as a charge storage device "and the second transistor is used as a readout switch *. It responds to a moving signal in order to connect the first transistor to an output line for outputting any accumulated electricity. 5. The imaging device I according to item 2 of the scope of patent application wherein each pixel circuit includes at least two transistors with a grid-to-negative amplification stage. 6. The imaging device according to item 4 of the patent application scope, in which the transistors are field effect transistors. 7. The imaging device according to item 6 of the patent application scope, in which the PET capacitor of the first transistor forms the input node capacitance of the pixel circuit and the pixel unit. 8. The imaging device according to item 4 of the patent application, where each pixel circuit includes another tilt field effect transistor. It can respond to a reset signal * to reset the charge storage device. 9. The imaging device according to item 2 of the patent application, wherein the pixel circuit includes an overload protection circuit design, preferably a diode, for overvoltage or loss of voltage protection. 10. The imaging device according to item 1 of the patent application scope includes a power impedance mechanism for electrically isolating each pixel unit. 11. The imaging device according to item 10 of the patent application scope, wherein the power impedance mechanism includes a non-conductive passive quasi layer disposed between adjacent pixel detectors 0 12. The imaging device according to item 11 of the patent application scope> ; Where a potential is applied to the passivation layer * so that the paper standard is in accordance with the Chinese National Standard (CNS) 84 specifications (210X297 public daughter) within the semiconductor base Η under the passivation layer ------- 1 ! I installed ------? Τ ----- f · line (please read the precautions on the back before filling this page): ... 8 888 XBCD Printed by Beigong Consumer Cooperatives, Central Bureau of Standards, Ministry of Economic Affairs Sixth, the patent application scope generates a potential barrier, which is used to further electrically isolate each pixel unit. 13. The imaging device according to item 10 of the patent application range, wherein the power impedance mechanism includes a diode that forms part of the pixel circuit. 14. The imaging device according to item 10 of the patent application range, wherein the power impedance mechanism includes a bipolar transistor that forms part of the pixel circuit. 15. According to the imaging device of claim 14, the base of the bipolar transistor of each pixel circuit is set to a common potential. 16. According to the imaging device of claim 1, the charge value accumulated in a pixel circuit is output by a pixel circuit, which is regarded as a current value. 17. The imaging device according to item 1 of the scope of the patent application, in which the size of the pixel unit is 1 mm wide or less, preferably about 350 cm wide. 18. The imaging device according to item 1 of the patent application, wherein the size of the pixel unit is about 150 microns wide or less, preferably about 50 meters wide or less, and most preferably about 10 meters wide . 19. The imaging device according to item 1 of the patent application scope, wherein the thickness of the base H is between 200 cm and 3 mm. 20. The imaging device according to item 1 of the patent application scope, in which the pixel circuits are pseudo-integrated with the substrate and flush with the corresponding pixel detectors. : 21. The imaging device according to item 1 of the scope of the patent application * wherein the pixel circuit is made in another substrate, the other substrate is incorporated into the pixel circuits, and is coupled to the pixel detection器 的 基 Η · Each -68-This paper scale is applicable to the Chinese National Standard (CNS) 8 4 «! / Grid (210Χ297mm) --------- ί 丨 装 ------ Order ----- One line (please read the precautions on the back before filling in this page) 29S9〇2 as B8 C8 D8 printed by Beigong Consumer Cooperative of Central Bureau of Standards of the Ministry of Economy Corresponding pixel detector alignment and coupling. 22. The imaging device according to item 1 of the patent application, wherein the array includes a single row of pixel detectors and associated pixel circuits to form a slit-type imaging device, or includes multiple rows of pixel detectors and associated pixels Circuit to form a groove-type imaging device. 23. The imaging device according to item 22 of the patent application scope, wherein the pixel circuit of each pixel detector is laterally adjacent to the corresponding pixel detector. 24. The imaging device according to any one of claims 1 to 23, wherein each pixel circuit can accumulate charge for an order period of 1 second before reading out. 25. An imaging device according to item 1 of the patent application, which includes a control electronic design containing addressing logic circuits for addressing each pixel circuit and reading out the accumulated electricity from these pixel circuits Value, and selectively reset the pixel circuits. 26. The imaging device according to item 25 of the patent application scope, wherein the addressing logic circuit includes a mechanism for connecting the output circuit of the pixel circuit to the output point of the imaging device · for supplying a read start signal to the pixel circuits A mechanism for starting input and a mechanism for supplying a reset signal to each pixel circuit reset input. 27. The imaging device according to item 26 of the patent application scope *. The mechanism for connecting each output line includes a shift register or a counter for successively connecting the pixel circuit output lines of each column of pixels to the output of the imaging device. 28. The imaging device according to item 26 of the patent application scope, which is used to supply -69-This paper size is applicable to the Chinese National Standard (CNS) Α4 specification (2Ι0Χ297mm) I PJ—install n order | line (please read first (Notes on the back and then fill out this page) Printed by the Employees' Consumer Cooperative of the Central Bureau of Economic Development of the Ministry of Economic Affairs ^ 3902 A8 B8 C8 D8 6. The scope of applying for patents The organization that reads the start signal includes a shift register or counter for successive supply of reading The start signal is sent to the pixel circuit of each row of pixels to read the start input. 29. The imaging device according to item 27 of the patent application scope, wherein the mechanism for supplying the reset signal includes a shift register or a counter, so that the reset signal can be successively supplied to the pixel circuit reset input of each row of pixels. 30. The imaging device according to item 25 of the patent application scope, wherein the control electronic design includes an analog-to-digital converter for converting the analog charge value into a digital charge value by the pixel circuit. 31. The imaging device according to item 25 of the patent application scope, in which at least part of the control electronics design is integrated into a semiconductor substrate, and the pixel circuits are integrated on it. 32. The imaging device according to item 1 of the patent application scope, wherein the semiconductor substrate is made of a material selected from the group consisting of: cadmium zinc telluride, cadmium telluride, mercury iodide, antimony arsenide, arsenide Gallium, germanium, thallium bromide and silicon. 33. An imaging system, including an imaging device according to item 30 of the patent application scope, the imaging system includes an image processor connected to the control electronics design for processing digital charge values from each pixel circuit, In order to form an image on a display device for display. 34. According to the imaging system of claim 33, where the processor can determine the maximum and minimum charge values of each pixel to be displayed, assign extreme gray or color values to these maximum and minimum charge values, and according to The slider between the two extreme values assigns grayscale or color values to another pixel, and this depends on the charge value of the pixel. -70-This paper scale applies the Chinese National Standard (CNS) A4 specification (210X297 mm) n 1 ^ 1 n ^ · 1 ^ — · HM I ^^^ 1 nn n ^ — ^^^ 1 In-^-^ nn > ^^^ 1 ^^^ 1 ml ^ (Please read the precautions on the back before filling out this page) Printed by the Consumer Cooperative of the Central Bureau of Economic Affairs of the Ministry of Economic Affairs 2 ^ S9〇2 6.Applicable patent scope 35. The imaging system of claim 34 of the patent scope, in which the gray scale or color value is pseudo-distributed according to the following formula: '(charge i-minimum charge) gray scale value of pixel i = minimum gray scale + ---- (maximum power Μ ~ minimum charge) / two X (maximum gray scale-minimum y \: into 36.-a variety of imaging systems, including a number of imaging devices in the first patent range, these imaging devices are laid like tiles Together to form a photosensitive mosaic screen 37. According to the imaging system of the 36th item of the patent application range, the photosensitive mosaic screen includes a plurality of rows of tile imaging devices, and the imaging devices of adjacent rows are located in this 38. The imaging system according to item 36 of the patent application scope, including the imaging device for stepping or shifting And / or the mechanism of the object to be imaged. In order to accumulate an image over an entire image area. 3 9. The imaging system according to item 36 of the patent application scope includes two imaging surfaces, each surface including each imaging device A photosensitive inlay screen surface, the two imaging surfaces are substantially parallel to each other, and are separated from each other by an object to be imaged placed between the two surfaces, the photosensitive inlay screen surfaces are laterally offset relative to each other In order to give the object a complete imaging. 40.-An imaging system, including a number of imaging devices according to item 1 of the patent application scope, where these imaging devices are essentially around a ring or part The circumference of the ring is arranged tangentially to surround or partially wrap -71- --------1 -裝------訂-----< 線 (請先閱讀背面之注意事項再填寫本頁) A8 B8 C8 D8 ^08902 六、申請專利範圍 圍一部份欲成像物體。 41 .根據申請專利範圍第40項之成像条統,其中該等成像 裝置實際上偽環繞著多數環狀物或部份環狀物之周邊 呈切線地排列 > 各環狀物係在構成該等環狀物或部份 環狀物共用軸之方向中彼此隔開。 42 . —種成像条統,包含有多個根據申請專利範圍第1項 之成像裝置,該等成像裝置偽如瓦面般鋪設在一起, 以形成一配合欲成像物體之面積與形狀的感光嵌鑲幕 面0 43 . —種成像条統,包含有多個根據申請專利範圍第1項 之成像裝置,該等成像裝置傜如瓦面般鋪設在一起, 以形成環繞部份或全部欲成像物體之感光嵌鑲幕面。 44.根據申請專利範圍第36項之成像条統,其中多數瓦面 成像裝置之各個影像輸出係連接至一共用倍頻器,該 倍頻器之輸出係連接至一共用之類比數位轉換器。 45 .根據申請專利範圍第36項之成像条統,其中多數瓦面 成像裝置之各値影像輸出係如雛菊花環般連接至一共 用之類比數位轉換器。 46 .根據申請專利範圍第44項之成像条統,其中該倍頻器 之輸出包括代表來自該等像素電路所聚積電荷之電流 值。 47.根據申請專利範圍第33項之成像糸統,其中對各個像 素電路加以编址,用以在一速率下讀出所聚積之電荷 ,以最佳化一把類比聚積電荷值轉換成數位值之類比 -72 - 本紙張尺度適用中國國家標準(CNS ) A4g ( 210X297公釐) ^ _裝 訂 一 線 (請先閱讀背面之注意事項再填寫本頁) 經濟部中央標準局員工消費合作社印製 2939〇2 A8 B8 C8 D8 六、申請專利範圍 數位轉換器解晰度。 48. 根據申請專利範圍第33項之成像条統,其中可在一類 比數位轉換階段,或隨後在一影像處理階段聚積多數 影像幀格。 49. 根據申請專利範圍第33項之成像条統,在該等成像單 元安排聚積各影像幀格·以重覆讀出欲顯示之補充影 像,並在足夠速率下重置該等像素電路•以避免該等 像素電路儲存電荷裝置之飽和。 50. —種成像条統,包含有一或多個根據申請專利範圍第 22項之狹縫或凹槽型成像装置,以及用以在該狹縫或 凹槽形成像裝置與欲成像物體間相對移動之機構,該 移動之方向傜横亙於該等成像裝置之一縱軸,用以在 一成像區上方聚積一完整影像。 51. 根據申請專利範圍第1項之成像裝置,其中該像素電 路傜被組配來提供備有一電容及足以在被判讀或重置 之前•儲存6百萬個電子、較佳地為25百萬個、更佳地 為50百萬値以及更適宜地為60百萬値電子之動態範圍 的電荷儲存機構。 52. 根據申請專利範圍第1項之成像裝置,其中每一像素 電路包含放電機構,當一進入之輻射的對應能量低於 一預定值時,由該放電機構在該像素電路聚積前放電。 53. —種用於成像所聚積之值的方法*該積聚值係為申請 專利範圍第1項所界定之一成像裝置之各値像素位置 所聚積者,該方法包括: -73 - 本紙張尺度適用中國國家標準(CNS ) A4规格(210X297公嫠) —裝 訂 | 線 (請先閲讀背面之注意事項再填寫本頁) 經濟部中央標準局員工消費合作社印製 8 888 • ABCD ^93902 六、申請專利範圍 對欲成像之該像素陣列之一區域内的諸像素,決 定其最大與最小之聚積值; 在欲成像之灰度或色度極值處,指定灰度或色值 給該等最大及最小聚積值; 對於根據該二極值而按比例調整之各痼像素,指 定灰度或色值給該等聚積值;及 在各個影像像素位置成像該等已指定之灰度或色 值。 54.—種用於實施一有機物或無機物實時成像之方法,該 方法包括: · 使用一可産生X射線、7射線、/3射線或α射線之 輻射源照射該物體; 在根據申請專利範圍第1項之成像裝置半導體成 像平面處梭出吸收之輻射線或該物體選定區所放出之 輻射線,藉此源自輻射線連鑛入射於該成像裝置各値 像素檢波器上之電荷量傜可聚積在各個像素電路中; 對該等像素電路値別編址,用以讀出所聚積之電 荷; 處理該讀出電荷,以提供影像像素資料;及 顯示該影像像素資料。 55 . —種操作根據申請專利範圍第1項之成像裝置之方法 ,該方法包括: 以一速率由各値像素電路讀出所聚積之電Μ,以 最佳化一類比數位轉換器之解析度,該轉換器偽用以 本紙張尺度逋用中國國家標準(CNS ) Α4規格(210X 297公釐) --------f —裝------訂-----{ 線 (請先閱讀背面之注意事項再填寫本頁) 經濟部中央揉準局員工消費合作社印裝 203902 A8 B8 C8 D8 經濟部中央標準局β:工消費合作社印製 A、申請專利範圍 將類比聚積電苘值轉換成數位值。 56.根據申請專利範圍第1至23或25至32或51或52項中任 一項之成像裝置,其偽用於傳統X光、胸腔X射線、X 光乳房照相術、X光斷層掃描照相術、電腦斷層照相 術、空間電腦斷層照相術、X射線骨頭密度測定術、X 射線牙齒成像、X射線牙齒全景成像、使用同位素於 D N A、R N A及蛋白質串序、原地雜配、D N A、R N A雜配與 蛋白質隔離或整合之/5射線成像、一般之/3射線成像 、使用色譜法與聚合物鍵結反應之自體放射照相術、 在産品品質控制中X射線與7射線成像、非破壞性測 試及即時與線上監控、安全控制糸統、及蓮動成像。 57 .根據申請專利範圍第24項之成像裝置,其偽用於傳統 X光、胸腔X射線、X光乳房照相術、X光斷層掃描照相 術、電腦斷層照相術、空間電腦斷層照相術、X射線 骨頭密度測定術、X射線牙齒成像、X射線牙齒全景成 像、使用同位素於DN A、RN Α及蛋白質串序、原地雜配 、DNA、RNA雜配與蛋白質隔離或整合之/3射線成像、 一般之/3射線成像、使用色譜法與聚合物鍵結反應之 自體放射照相術、在産品品質控制中之X射線與7射 線成像、非破壞性測試及即時與線上監控、安全控制 糸統、及蓮動成像 58 .根據申請專利範圍第33至50項中任一項之成像条統, 其偽用於傳統X光、胸腔X射線、X光乳房照相術、X光 斷層掃描照相術、電腦斷層照相術、空間電腦斷層照 -75 - 本紙張尺度適用中國國家標準(CNS ) Α4規格(210 X 297公釐) ---------1 裝------訂------ί』 (請先閲讀背面之注意事項再填寫本頁) Α8 Β8 C8 D8 々、申請專利範圍 相術、X射線骨頭密度測定術、X射線牙齒成像、X射 線牙齒全景成像、使用同位素於DM A、RN A及蛋白質串 序、原地雜配、DN A、RNA雜配與蛋白質隔離或整合之 召射線成像、一般之/3射線成像、使用色譜法與聚合 物鍵結反應之自體放射照相術、在産品品質控制中之 X射線與7射線成像、非破Μ性測試及即時與線上監 控、安全控制糸統、及運動成像。 59 .根據申請專利範圍第1項之成像裝置,其俤用於紅夕卜 線成像、可見光成像及紫外線成像。 ---------A—— (請先閱讀背面之注意事項再填寫本页) 訂-----\ 線 經濟部中央梂準局月工消费合作社印製 76 本紙張尺度適用中國國家梯準(CNS ) A4規格(210X297公釐)-------- 1 -installed ------ order ----- < line (please read the precautions on the back before filling in this page) A8 B8 C8 D8 ^ 08902 VI. Scope of patent application Part of the object to be imaged. 41. The imaging system according to item 40 of the patent application scope, in which the imaging devices are actually arranged tangentially around the periphery of most rings or part of rings> Each ring is composed of Equal rings or partial rings are separated from each other in the direction of the common axis. 42. A type of imaging system, including a plurality of imaging devices according to item 1 of the patent application scope, these imaging devices are laid like a tile surface to form a photosensitive embedding that matches the area and shape of the object to be imaged Mounting surface 0 43.-A variety of imaging systems, including multiple imaging devices according to item 1 of the patent application. These imaging devices are laid together like tiles to form a surrounding part or all of the object to be imaged. The photosensitive inlaid screen surface. 44. According to the imaging system of claim 36, each image output of most tile imaging devices is connected to a common frequency multiplier, and the output of the frequency multiplier is connected to a common analog digital converter. 45. According to the imaging system of patent application scope item 36, the image output of most tile surface imaging devices is connected like a daisy wreath to a common analog digital converter. 46. The imaging system according to item 44 of the patent application scope, wherein the output of the frequency multiplier includes a current value representing the charge accumulated from the pixel circuits. 47. The imaging system according to item 33 of the patent application scope, in which each pixel circuit is addressed to read out the accumulated charge at a rate to optimize the conversion of the accumulated charge value into a digital value Analogy-72-This paper scale is applicable to the Chinese National Standard (CNS) A4g (210X297mm) ^ _ binding line (please read the notes on the back before filling this page) Printed 2939 by the Employees Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 2 A8 B8 C8 D8 Sixth, patent resolution resolution of digital converter. 48. According to the imaging principle of item 33 of the patent application scope, most of the image frames can be accumulated in an analog-to-digital conversion stage or subsequently in an image processing stage. 49. According to the imaging principle of item 33 of the patent application scope, arrange each image frame to accumulate in the imaging units to re-read the supplementary images to be displayed and reset the pixel circuits at a sufficient rate • Avoid saturation of the charge storage devices of these pixel circuits. 50. An imaging system, including one or more slit or groove type imaging devices according to item 22 of the patent application, and relative movement between the slit or groove image forming device and the object to be imaged The mechanism, the direction of the movement is transverse to a longitudinal axis of the imaging devices, for accumulating a complete image above an imaging area. 51. The imaging device according to item 1 of the scope of the patent application, in which the pixel circuit is configured to provide a capacitor and sufficient to be interpreted or reset before storing 6 million electrons, preferably 25 million A charge storage mechanism with a dynamic range of 50 million values and more preferably 60 million values of electrons. 52. The imaging device according to item 1 of the patent application, wherein each pixel circuit includes a discharge mechanism, and when the corresponding energy of an incoming radiation is lower than a predetermined value, the discharge mechanism discharges before the pixel circuit accumulates. 53.-A method for the accumulated value of imaging * The accumulated value is accumulated at each pixel position of an imaging device as defined in item 1 of the scope of patent application, the method includes: -73-This paper scale Applicable to the Chinese National Standard (CNS) A4 specification (210X297 gong)-binding | line (please read the precautions on the back before filling this page) Printed by the Ministry of Economy Central Standards Bureau employee consumer cooperative 8 888 • ABCD ^ 93902 VI. Application The scope of the patent determines the maximum and minimum accumulation values of the pixels in an area of the pixel array to be imaged; at the extreme value of grayscale or chromaticity to be imaged, the grayscale or color value is assigned to these maximum and The minimum accumulation value; for each pixel that is proportionally adjusted according to the two extreme values, assign a grayscale or color value to the accumulation value; and image the specified grayscale or color value at each image pixel position. 54.—A method for implementing real-time imaging of an organic or inorganic substance, the method including: • irradiating the object with a radiation source capable of generating X-rays, 7 rays, / 3 rays, or α rays; Item 1 of the imaging device emits absorbed radiation at the semiconductor imaging plane or radiation emitted from a selected area of the object, whereby the amount of charge incident on each pixel detector of the imaging device from the radiation line ore can be Accumulate in each pixel circuit; address these pixel circuits separately to read out the accumulated charge; process the readout charge to provide image pixel data; and display the image pixel data. 55. A method of operating an imaging device according to item 1 of the scope of the patent application, the method comprising: reading the accumulated electricity from each pixel circuit at a rate to optimize the resolution of an analog-to-digital converter , The converter is used to use the Chinese National Standard (CNS) Α4 specification (210X 297 mm) for this paper standard -------- f —installation ------ order ----- { Line (please read the precautions on the back before filling in this page) Printed by the Consumer Cooperative of the Ministry of Economic Affairs Central Bureau of Accreditation 203902 A8 B8 C8 D8 Central Bureau of Standards of the Ministry of Economic Affairs β: Printed by the Industrial and Consumer Cooperative A The electrical acne value is converted to a digital value. 56. The imaging device according to any one of items 1 to 23 or 25 to 32 or 51 or 52 of the patent application, which is pseudo used for traditional X-ray, chest X-ray, X-ray mammography, X-ray tomography Surgery, computed tomography, space computed tomography, X-ray bone densitometry, X-ray dental imaging, X-ray panoramic dental imaging, use of isotopes in DNA, RNA and protein sequence, in situ hybridization, DNA, RNA Isolation or integration of miscellaneous and protein / 5-ray imaging, general / 3-ray imaging, autoradiography using chromatography and polymer bonding reaction, X-ray and 7-ray imaging in product quality control, non-destructive Sex testing and real-time and online monitoring, security control system, and lotus dynamic imaging. 57. The imaging device according to item 24 of the patent application, which is pseudo-used in traditional X-ray, chest X-ray, X-ray mammography, X-ray tomography, computer tomography, space computer tomography, X Ray bone densitometry, X-ray dental imaging, X-ray dental panoramic imaging, / 3-ray imaging using isotopes in DNA, RN A and protein sequence, in situ hybridization, DNA, RNA hybridization and protein isolation or integration , General / 3-ray imaging, autoradiography using chromatography and polymer bonding reaction, X-ray and 7-ray imaging in product quality control, non-destructive testing and real-time and online monitoring, safety control System, and lotus imaging 58. According to the imaging system of any one of the patent application items 33 to 50, it is pseudo used for traditional X-ray, chest X-ray, X-ray mammography, X-ray tomography , Computer tomography, space computer tomography -75-This paper scale is applicable to China National Standard (CNS) Α4 specification (210 X 297 mm) --------- 1 Packing ------ order ------ ί 』(Please read the back first (Notes to fill out this page) Α8 Β8 C8 D8 々, patent application phase technique, X-ray bone densitometry, X-ray dental imaging, X-ray dental panoramic imaging, use of isotopes in DM A, RNA and protein sequence, original Ground heterozygosity, DNA hybridization and RNA isolation and protein isolation or integration of radiographic imaging, general / 3-ray imaging, autoradiography using chromatography and polymer bonding reaction, X in product quality control X-ray and 7-ray imaging, non-destructive testing and real-time and online monitoring, security control system, and motion imaging. 59. The imaging device according to item 1 of the scope of the patent application, which is used for red ray imaging, visible light imaging and ultraviolet imaging. --------- A—— (Please read the precautions on the back before filling in this page) Order ----- \ Printed by the Ministry of Economic Affairs, Central Bureau of Economic and Social Affairs Monthly Consumer Cooperatives 76 This paper size is applicable China National Standards (CNS) A4 specification (210X297mm)
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GB2318411B (en) 1996-10-15 1999-03-10 Simage Oy Imaging device for imaging radiation
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WO1999045411A1 (en) * 1997-02-18 1999-09-10 Simage Oy Semiconductor imaging device
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US6243441B1 (en) * 1999-07-13 2001-06-05 Edge Medical Devices Active matrix detector for X-ray imaging
US6596483B1 (en) 1999-11-12 2003-07-22 Motorola, Inc. System and method for detecting molecules using an active pixel sensor
AU2002360748A1 (en) * 2001-12-21 2003-07-15 University Of Massachusetts Medical Center Scatter reducing imaging device
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