TW283253B - The method for coating photo resist - Google Patents

The method for coating photo resist

Info

Publication number
TW283253B
TW283253B TW83111787A TW83111787A TW283253B TW 283253 B TW283253 B TW 283253B TW 83111787 A TW83111787 A TW 83111787A TW 83111787 A TW83111787 A TW 83111787A TW 283253 B TW283253 B TW 283253B
Authority
TW
Taiwan
Prior art keywords
photo resist
coating
bake
layer
coating photo
Prior art date
Application number
TW83111787A
Other languages
Chinese (zh)
Inventor
Ming-Jong Yang
Bor-Ren Jeng
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW83111787A priority Critical patent/TW283253B/en
Application granted granted Critical
Publication of TW283253B publication Critical patent/TW283253B/en

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Thin Film Transistor (AREA)

Abstract

A coating PR method for pre-formed element area pattern on the surface of semiconductor panel, includes: Dehydrate bake on semiconductor panel; Reflow bake for surface hardness process after forming the first PR layer; and Soft bake process after forming 2nd PR layer above the first PR layer, thus complete the PR coating method.
TW83111787A 1994-12-17 1994-12-17 The method for coating photo resist TW283253B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW83111787A TW283253B (en) 1994-12-17 1994-12-17 The method for coating photo resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW83111787A TW283253B (en) 1994-12-17 1994-12-17 The method for coating photo resist

Publications (1)

Publication Number Publication Date
TW283253B true TW283253B (en) 1996-08-11

Family

ID=51397757

Family Applications (1)

Application Number Title Priority Date Filing Date
TW83111787A TW283253B (en) 1994-12-17 1994-12-17 The method for coating photo resist

Country Status (1)

Country Link
TW (1) TW283253B (en)

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees