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Priority claimed from JP03352074Aexternal-prioritypatent/JP3083898B2/ja
Priority claimed from JP03331077Aexternal-prioritypatent/JP3124599B2/ja
Application filed by Tokyo Electron Co LtdfiledCriticalTokyo Electron Co Ltd
Application grantedgrantedCritical
Publication of TW224492BpublicationCriticalpatent/TW224492B/zh
H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26