TW223683B - - Google Patents
Info
- Publication number
- TW223683B TW223683B TW81102294A TW81102294A TW223683B TW 223683 B TW223683 B TW 223683B TW 81102294 A TW81102294 A TW 81102294A TW 81102294 A TW81102294 A TW 81102294A TW 223683 B TW223683 B TW 223683B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH93691 | 1991-03-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW223683B true TW223683B (en) | 1994-05-11 |
Family
ID=4198626
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW81102294A TW223683B (en) | 1991-03-27 | 1992-03-25 |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW223683B (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7517636B2 (en) | 2000-05-29 | 2009-04-14 | Hitachi Chemical Co., Ltd. | Photosensitive resin composition, photosensitive element, production method of resist pattern and production method for printed circuit board |
TWI454390B (en) * | 2009-12-31 | 2014-10-01 | Hon Hai Prec Ind Co Ltd | Transfer film and manufacturing method thereof |
CN113906066A (en) * | 2019-05-30 | 2022-01-07 | 罗杰斯公司 | Photocurable composition for stereolithography, stereolithography method using the same, polymer assembly formed by stereolithography method, and device comprising the polymer assembly |
-
1992
- 1992-03-25 TW TW81102294A patent/TW223683B/zh active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7517636B2 (en) | 2000-05-29 | 2009-04-14 | Hitachi Chemical Co., Ltd. | Photosensitive resin composition, photosensitive element, production method of resist pattern and production method for printed circuit board |
TWI454390B (en) * | 2009-12-31 | 2014-10-01 | Hon Hai Prec Ind Co Ltd | Transfer film and manufacturing method thereof |
CN113906066A (en) * | 2019-05-30 | 2022-01-07 | 罗杰斯公司 | Photocurable composition for stereolithography, stereolithography method using the same, polymer assembly formed by stereolithography method, and device comprising the polymer assembly |