TW212242B - Method of manufacture magnetic recording media - Google Patents

Abstract

The method to manufacture magnetic recording media, comprises: (a) Providing a substrate, (b) Providing a target material made by mangnese-iron, which has small pieces of cobalt and iron pasted on top for adjusting its proportion of composition, (c) Under controlled condition for the target material, forming a magenetic recording media film.

Description

212242

AG l \ C Ministry of Economics-1. Printed by the Quasi-Bureau Pongong Consumer Cooperative V. Description of the invention (1) This case is a manufacturing method of magnetic recording media. M enables the formation of a high recording density of cobalt / manganese / tungsten oxide Magnetic recording film. At present, hard disks are generally thin film disks that use Longitudinal 'recording technology. The magnetization directions of magnetic recording media are arranged horizontally. The magnetic head slides on the surface of the film, and the magnetic moment is induced through the coil or through the channel. The magnetic field generated by the flow changes the direction of magnetic moment magnetization to read and write data. This installation method is called the Winchester disk drive hard drive, which is currently the mainstream of commercial hard drives. The materials available in the literature for the application research of magnetic recording thin films cover the three major fields of horizontal recording, vertical recording, and magneto-optical recording. Cat gold-plated film is the largest in the three technical fields. . As far as horizontal magnetic recording materials are concerned, the general manufacturing method is shown in the first figure. Among them, CoCrH (M = Ni, Pt, Ta) in the sputtered gold film is currently the most widely used material system, although its The coercive force is up to about 1500 Oe, the saturation magnetization (Saturation magnetization) Ms is also up to about 600 ~ 1200 emu / ca ^, the squareness ratio (Squareness ratio) S is also about 0.8 K, the thickness is about 50 nm, let other The phase of the material is discolored, but the metal magnetic recording film still has shortcomings, including: 1) In addition to the CoPt alloy itself has a strong film crystal anisotropy, Cr needs to be used as the bottom layer to help the crystal orientation of the rib magnetic layer Growth, use M to enhance the magnetic crystalline anisotropy (magnetocrystalline a η is 〇tr 〇py) and diamagnetic force of the film. According to the current research, the magnetic and grain size of these films are deeply affected by the thickness of the Cr layer, especially when Cr (please read the precautions on the back before writing the wooden page) -llv uc 1 '· t- K ·· Packing. Thread. The original size of this paper is 5 Gen. It uses the Chinese National Standard (CNS) T4 specification (210X297 male dragon)

Λ (ί UG layer thickness is less than 2) method plating over 3 00 t: thick film, potential 3) on the film table 4) Κ, and the capital cost is slightly worse, the metal plating is thin 21224 ^ V. Description of the invention (2 When thin, the impact of the magnetic properties of the magnetic film is insufficient. The hardness of the gold film is insufficient, so the substrate must be coated with NIP to strengthen the surface. If the subsequent process will result in the crystallization of amorphous N i P The increase in noise is not conducive to the easy compliance of the Jinmao thin film disc. To increase the fear, the surface is coated with an amorphous carbon film as a protective layer. The cobalt content of the cobalt-based alloy Jinmao thin film is in the heavy cobalt diaphragm strategic material. The high price makes the film into electroless electroplating CoP and CoNiP. Although it is made, it is affected by the poor magnetic properties of the film, and it is difficult to upgrade to a high recording density disc. The film is currently only used for tape production. It must be written with the substrate temperature in the non-channeling plating and forming soft magnetic data. The service life is 60%, which is high. The process is simple and the material is uniform and attached. The steam field has not yet become hot. Please read first Pay attention to the matter and write a gold page on the wood page. The description can be improved. Figure 2. The second reading method is as follows:

The reason of I A is that the extreme sun is not affected but the closeness is tight. The group and sex: the thin film of the magnetic resonance film

—1 A degree of hard surface surface strong ribbed layer bottom Ministry of Economics Central Bureau of Industry and Engineering Cooperative Society quality ceramics; Tao Gaozhi's blunt information and dominance of the number of active information learning OJ, but not the lack of Although the phase oxygen is 2), the magnetic 3 is li A, but the cost of corrosion is lower than the original cost. Because there is less money in the gold layer, the protection of the coating must be maintained. The paper size of the title book uses the Chinese National Standard (CNS) T4 specification (210X297; «:) A6 B6 V. Description of the invention (3) The main purpose of this case is to reduce costs because iron is the main component. The second purpose of this case is to achieve a better signal-to-noise ratio. Another purpose of this case is to achieve better corrosion resistance. The other purpose of this case is to add elements such as cobalt and manganese, together with appropriate heat treatment conditions, to make its coercive force higher than 1000 Oe. This case is a method of manufacturing a magnetic recording medium, which includes: providing a substrate; providing a target made of Mn and discriminated, with small Η, Κ of cobalt and e on top of it for adjusting the composition ratio; and making the target Under controlled conditions, a magnetic recording medium film is formed on the substrate. The above substrate can be a silicon wafer, a glass sheet, and gold noodles. To enhance the surface hardness, a layer of Ab 0 $ film can be plated on the substrate, and the magnetic recording medium is a DC plasma method or Made by radio frequency plasma method. The target material is made of manganese and zirconia with a purity of about 99.7, and small pieces of cobalt and osmium with a purity of about 99.9 are pasted on it. M adjusts the composition ratio of the thin film of the magnetic recording medium. The composition of the magnetic recording medium film is K cobalt weight percent Co cobalt about 0 ~ 20¾, Mn Mn about 0 ~ 18.53ί, K and Fe osmium about 61.5 ~ 99. 5¾ formed, and the preferred ratio of this film is Co cobalt is about 6 ~ 12¾, Mn manganese is about 0.1 ~ 6¾. The magnetic recording media film formed must have 'F e (know the precautions on the back and then fill in this page). ¾. The Central Standards Bureau of the Ministry of Economic Affairs prints the 2 ui phase or Fe3〇 + phase, so the above magnetic recording The media film needs to undergo the first heat treatment process, that is, about 200 ~ 350TC (preferably 300 ~ 3401), constant temperature under H atmosphere for about 0.1 ~ 2 hours (compared to 0.5 ~ 1 hour). (-"&Amp; 0 彡 phase can be made into Fe30 + phase. After that, the second hot spotting process is performed, that is, the temperature is raised to about 300 ~ 400Ό (preferably 340 ~ 380C), and the constant temperature under the atmosphere is about 0.1 ~ 4. Hours (preferably 0.5 ~ 2 hours). • Green · A 4 (210X297 public transmutation) 2122μ: ^ A6 B6 5. Description of the invention (4) If you want to make the magnetic recording medium film diamagnetic force is about 3 0 0 0 Above Oe, a third heat treatment process is required, that is, about 3 0 0 ~ 3 8 0 (preferably about 340 ~ 380¾), and annealing in an air furnace for about 0.1 ~ 4 hours (preferably about 2 ~ 8 hours). The thickness of the magnetic recording medium film obtained under the above manufacturing method and heat treatment process is about 30 ~ 500 nm, and its magnetic value is diamagnetic About 900 ~ 4000 0e (preferably 1200 ~ 2000 0e), the saturation magnetization is about 44 ~ 310 emu / on3 (preferably about 200 emu / ci / m), the angle ratio is about 0.47 ~ 0.90 (preferably About 0.7 μM.) In order to avoid magnetic head wear, you can add a lubricating film to this magnetic recording medium (please read the precautions on the back side before filling out this page). Explained clearly that the borrowed textbook solved the structure of the structure of the structure of the gold film before the iron-like oxygenation. The text of the case is shown in Figure 1 2 in the 7th and 7th cases of the middle case. Department of system diagrams Figures three four fiveth ej-the film f thin thin Γ f 3 3 ο ο ft · * shape chart after shooting around yyaar after fire retreating film a shape chart shooting strange January C • 1 new d η said technology ΓΡ branch pe Yuί from the record vertical ε a — m out < push a record of the optical technique and disc} magnetic S film in 13 thin new Γ ο C e Γ point Xi Youzhi's recording skills for hitting Rong Rong are very new. In addition to the fierce, fierce tactical skills to record g F nd 水 Γ 8 Ο monument i * «Unified threat 1 S Yan e η

C. Printed by the Central Bureau of Standards of the Ministry of Economics. It is widely known that ec masters are small, short, thin and light. Γ advances and tends to be daily, close and confidential, technical records, high, and higher A 4 (210X297 public) 21224 ^ A6 _B6 V. Description of the invention (5)

To be a horizontal recording density magnetic recording film, the following conditions must be met: the magnetic recording material must have a high coercivity He, at least higher than 1000 Oe; the residual magnetization (residual magnetization) Mr should be high enough ; The thinner the thickness of the magnetic thin film, the lower the demagnetization interaction between the magnetic regions of the thin film (demagnetization interaction); Μ and high signal to noise ratio (signal to noise ratio) SNR

O Since IBM published a magnetic recording technology with a recording density of 1 (ib / in2) in 1990 (T. Yogi et al, IEEE Trans. Magn., MAG-26, (1990), 2271), people found that There is a lot of room for the record limit. It is generally predicted that it will be possible to reach 10Gb / in by 2010 (ES Murdock, IEEE Trans. Magn., MAG-28, (1992), 3078), the record required at that time The media has five designs, the lowest diamagnetic force is about 2,500 0e, the highest one needs to be about 4,500 0e, the former Mr5 must reach about 1.0 menu / cm2, the latter only needs to be about 0.35memu / cmz, resulting from the development of technology Trend assessment shows that in the foreseeable future, high-He films (He > 2000 0e) are urgently needed. Another purpose of this case is to develop such films. M responds to the need for a significant increase in recording density. Central Standard of the Ministry of Economy Printed by the Bureau (please read the precautions on the back and then fill out this page) In order to understand the oxide film further, so start with the literature, based on the literature (ET Wuori and DE, Speliotis, Plating ίη the Electronic Industry, 3rd symposium, (1971), 315) pointed out that The gold-thin film, first about 450 ~ 500 t: oxidized to a-FqOj, then about 400¾, can be converted into Fe 彡 0+ under the atmosphere of h and C0. Another document (RL Comstock and A4 ( 210X297 father eaves) Printed by the Ministry of Economic Affairs, Central Bureau of Industry and Commerce KKX Consumer Consultation Co., Ltd. 21224 ^ Λ6 __no_ V. Description of Invention (6) E. B. Moore, IBM J. Res. Dev. 18, (1 9 7 4), 5 5) Point out that the M spin coating method of Fe (H〇9) 3 · 9ΗΑ0 aqueous solution can be applied to the substrate of about 300 ~ 3 5 0 TC to obtain α-F ^ 03 thin film, which can be subjected to the original heat treatment with oxidation The Fe3〇 + and 7-F ^ 03 films were obtained separately. Early studies focused on the synthesis of phases without adding any additives, so the diamagnetic force is not high, only about 200 0e. But since 1977, some people Take the needle-like 7-F & 03 magnetic powder and add C 〇 to improve the result of He, and transfer it to the thin film. Literature (M. Satuo et al, IEEE Trans. Hagn .. MAG-1 3, (1977), 1400) The M vapor deposition method is proposed to produce C 〇χ F e0 + thin film. They first plated Fe on a glass substrate and oxidized it to a-Fe2〇3 at about 400 1C, then plated a layer of Co and annealed in vacuum to expand C 〇 to a-F e2 03 and form Cox Fe3_x. 0+, the diamagnetic force of the resulting film is greatly increased to 700 0e. Based on the significant improvement of diamagnetic force, many researchers have successively invested in this field. The literature (S. Hattori et al, IEEE Trans. Hagn., HAG-15, (1979), 1549) first proposed that the reactive sputtering method can be successfully used to prepare iron oxide magnetic films with Co and Ti added. It is plated with oc -Fe2 03 under the atmosphere of Ar- (U, and then formed into Fe3 0_ under the atmosphere, which can then be oxidized to 7-F 4 0. The resulting magnetic resistance of the thin film is about 7 0 0 0 e , The aspect ratio is about 0.8, and the recording density is about 1100 bits / mm2. This method is the most common process for the industrial production of oxide-based hard disks. In the next year, according to the literature (S · Hattori et a 1, IEEE Trans . Magn., MAG- 1 5, (1 98 0), 1 1 1 4) pointed out that the same batch of people improved the process slightly, omitting one step, and synthesized Fe3 0+ by direct M reactive sputtering method (please read the back first Matters needing attention to write a wooden page) Binding-Binding _ Line · This paper standard is used in Chinese National Standards (CNS) 4 specifications (210x297 male dragon)

212 ^ Λ G It G

The Central Bureau of Economics of the Ministry of Economic Affairs only prints M of the cooperative and the cooperative. V. Description of invention (7) 7-Fe203 is obtained by reoxidation. Although the angular ratio S is increased to about 0.85, the coercive force is slightly reduced, only about 600 0e. Therefore, post-irrigation researchers rarely adopt this process, and most of them adopt the experimental procedure published in 1979. By 1984, 0 Ishii and I. Hata-keyama in the aforementioned research group proposed in the literature (J. AppI. Phys. 55, (1984), 2269) that reactive sputtering method was used to add (Os) made a major breakthrough. They found that the addition of Os has the following benefits: greatly improve the coercive force to about 1 9 2 0 0 e, can not be achieved only by adding C 〇; can effectively suppress the grain growth caused by post-reading heat treatment, and thereby improve the SNR value of the film, and Adding Cu to Μ has the same effect; after annealing under a magnetic field (7 KOe), the coercive force can be increased to about 2100 0e; and the Coercive Squareness (S *) is increased to about 0.95, which is more effective than adding Ti in the past. The biggest disadvantage of this material is that 0s is too expensive, so there is still room for research on osmium oxide magnetic films. The aforementioned document uses a multi-M vacuum coating method to prepare osmium-oxygen magnetic thin film, and the equipment cost is relatively expensive. Another feasible method with simple equipment is the fogging cracking plating method. According to the literature (M. Langlet et al, IEEE Trans. Magn., MAG-22, (1986), 151), it is pointed out that the spray cracking method can also prepare high magnetic resistive oxygen magnetic films. Dissolve iron acety-lacetonate in butanol, use ultrasonic vibrator to tank the solution, and the mixed gas of M Ar-Og blows the atomized droplets to about 420 ~ 550t! The surface of the glass substrate is deposited into 7-Feii03-Fe 0+ film. The film obtained after proper heat treatment has the highest diamagnetism (please read the notes on the back before leaving this page). Binding · Binding-This paper uses the Chinese Standard (CNS) 4 specifications (210X2) Machiko *) Printed by the Central Bureau of Economic Affairs of the Ministry of Economic Affairs, printed by β Gongxiaot Cooperative

A G W C Fifth, the invention description (8) is about 800 Oe, and the Ms value is about 400 emu / on3. If adding 10 wtS! Co can increase the coercive force to about 1000 〇e M, Ms value is about 350 emu / cm ^. This case is based on the reactive sputtering method to produce a thinner film with better adhesion, concurrently adjust the weight percentage of cobalt (manganese) ions / iron ions, and with heat treatment conditions, high coercive cobalt (manganese ) Gasification magnetic film, effectively overcome the shortcomings of adding cobalt, titanium and copper ions in the aforementioned literature. The magnetic resistance is less than 1000 0e, while avoiding the use of expensive hungry elements can also produce a magnetic resistance of up to about 4000 0e. Thin film is a method with rich economic benefits and excellent magnetic thin film. Due to the appropriate addition of elements such as cobalt and manganese to control the coercive force, as a high recording density magnetic film, Kun detailed the process of this case as follows: provide a substrate, the substrate can be a silicon wafer, glass or metal sheet, this example The substrate adopts the η type [S i 0 X / S ί (1 0 0)] chip and the 7059 glass substrate produced by Corning, both of which have optical flatness. The test piece is first cut with a diamond knife to 0.5 X 0.5 i η2, then add M cleaning, the cleaning step is to immerse the substrate in acetone, M ultrasonic wave vibration for 5 minutes to eliminate surface grease, and then immerse in deionized water, M ultrasonic wave vibration for 5 minutes, eliminate There is a solvent on the surface, and then take out the K nitrogen gun to blow dry; provide a target material, which is coated by direct current (dc) or radio frequency (rf) magnetron sputtering method, so that the magnetic field of the magnet can effectively assist the sputtering process, Therefore, the target material should be as non-magnetic as possible, so that the magnetic field lines of the magnetic field can penetrate to achieve the effect of magnetron control. However, the selected Fe and Co in this case are materials with high magnetic permeability, so the manufacturing method of the alloy target is more special , The purity is large At about 99.7 years old, and the paper is used in the 5 gen standard for the use of the B National Standard (CNS) 4 specifications (210x297 g; ¢) (please read the precautions on the back and then write the wooden page). Installation and line. 21224 ^

Λ G ___lj_6_ V. Description of the invention (9) (Please read the notes on the back #Cube to write this page) The electrolytic manganese is weighed on the electric balance, and the total weight of the alloy is 150 grams each time, and the weight ratio of manganese is 3: 1, according to the phase diagram, this composition is a 7-Fe non-magnetic phase at room temperature, which can avoid the target #magnetic problem, pour the weighed material into the alumina crucible, under the atmosphere M Gao Yubo smelted it after melting. The melted target material was turned by a lathe into a round bar with a diameter of 1 inch. The water-cooled cutting was then cut into 2.5mm thick wafers. The weight percentage of the wafers obtained by ICP analysis It is Fe: Mn = 77:23, which is not far from the original ratio. As for the adjustment of the composition, a thin film of osmium and manganese with a purity of about 99.9 (pe 1 1 et) is adjusted on the wafer. The proportion of ingredients; under control conditions, a magnetic recording medium film is formed on the substrate. The vacuum sputtering equipment used in this case is no different from the general commercial traditional sputtering system. The exhaust system can achieve an ultimate ffi force of 2 in an ideal state. X 1 0 &lt; T 〇 "r, before evacuating, first insert the target material into the sputtering gun At the bottom, the substrate is also placed in an appropriate position on the pedestal tray, and then the cavity is roughly pumped to 5 X 1 0 <T 〇rr, at this time the quartz lamp under the pedestal is turned on for heating, and the vacuum reaches lX10_; lT〇rr After that, close the rough pumping valve and start fine pumping for high vacuum exhaust. The vacuum degree is lxl Torr. The Ministry of Economic Affairs Central Standards Bureau Beigongyi Cooperative Society can print the sputtering process after printing. Pre-sputtering (pre-sputtering) is performed before sputtering. sputtering), the target surface is completely cleaned in the M phase, and the fresh surface is exposed for coating. The pre-sputtering conditions vary depending on the system. For this system, 15 mT〇r Ar is set, set The output power of the DC power supply is 30 watts for 10 minutes. At this time, the current value has approached the fixed value, and the sputtering rate is kept constant. The shutter above the substrate can be opened for thin film plating. The sputtering method can be used Direct current (dc) or radio frequency (rf) sputtering. Those skilled in the art know that the sputtering conditions are very different depending on the system used. The paper size is free to use the Chinese National Standard (CNS) f 4 specifications (210X297); ¢ ) 21224 ^

Λ C Η C The Ministry of Economic Affairs, Central Standards Bureau, Employee Consumer Cooperatives printed t V. The description of the invention (10) is different, so the sputtering conditions in this case are not particularly limited except those described in the examples given. The composition and heat treatment conditions of the invention can make the plated film have the properties mentioned in this case, and the composition of the magnetic recording medium film is K cobalt weight percent Co cobalt about 0 ~ 20%, Mn manganese about 0 ~ 18,5! Ϋ Μ and Fe osmium about 61.5 ~ 99.5! 1; formed, and the preferred ratio of this film is Co cobalt about 6 ~ 12X, Mn about 0.1 ~ 6%. The formed magnetic recording medium film needs to have a 7-Fea2 03 phase or a 0% phase, so the above magnetic recording medium film needs to undergo the first heat treatment process, that is, about 200 to 3501 (preferably about 3 0 0 ~ 34 Ot :), the constant temperature under the atmosphere is about 0. 1 ~ 2 hours (preferably 0.5 ~ 1 hour), the a-Fh〇3 phase can be transformed into Fe3〇4 phase, and then after The second thermal management procedure, that is, to raise the temperature to about 300 ~ 400C (preferably about 340 ~ 38〇 · 〇), the temperature under the atmosphere is about 0.1 ~ 4 hours (preferably about 0.5 ~ 2 hours ). If you want to make the magnetic resistance of the magnetic recording medium film to about 300 0 0 0 e Μ need to go through the third heat treatment process, that is about 300 ~ 380TC (preferably about 340 ~ 380¾), annealing in the air furnace about 0.1 ~ 4 hours (preferably 2-8 hours). The thickness of the magnetic recording medium film obtained under the above manufacturing method and heat treatment process is about 30 ~ 500 nra, the magnetic value of the coercive force is about 900 ~ 4000 0e (preferably about 1200 ~ 2000 0e), the saturation magnetization Approximately 44 ~ 310 emu / on5 (preferably about 200 eBu / cm3 Μ) corner ratio is about 0.47 ~ 0.90 (preferably about 0.7 or more). To avoid wear of the magnetic head, a lubricant layer can be added on the magnetic recording medium film. The X-ray diffraction analysis of the film obtained by the above process can be proved to be a film of pure phase and 7-Fe20j phase, and the process of this case is used (please read the it on the back of it # 堺 写 木 页) Installation · Order_ Line · This paper is used in "B home standard (CNS) T4 specification (210X29741) 212 fine

Λ G jj_G_ V. Description of the invention (11) (Please read the precautions before writing this page) Different alloys are added to the composition, combined with heat treatment conditions to control the level of diamagnetic force, and the film prepared by the K sputtering method, Its adhesion and film flatness are excellent, with the degree of specular reflection, and the oxide film has a high signal-to-noise ratio, so this case is very suitable for high-density magnetic recording films. In order to understand the magnetic recording media more step by step, here is an example to add M description: the metal weight ratio of the target is Fe: Co: Mn = 96.4: 2.4: 1.2, the substrate is η type [Si〇x / Si ( 100)] Wafer, K DC sputtering method coating, sputtering conditions are 5 cm between the target and the substrate, the substrate temperature is maintained at about 100Ό, the substrate rotation speed is 20 RPM, and the sputtering partial pressure ratio is controlled to Ar: = 1: 1, and the total pressure is 30 mTorr, the input power is set at 30 watts, the operating current is 70 ibA, the initial coating is subjected to a heat treatment of about 300 ~ 340 C for 1 hour, and the anti-magnetic force of the film obtained after furnace cooling is about 2250 0e, The saturation magnetization is about 100 emu / απ5 and the angular ratio is about 0.7. For example, the film after heat treatment before Qiankan was vaporized at about 3 5 0 ~ 400 1] for 2 hours. The anti-magnetic force of the film after Po cooling is about 1300 0e, the saturation magnetization is about 55 emu / απ ', angular The ratio is about 0.75. Of course, those who are familiar with this skill must make the following changes to the aforementioned example: Printed by the Employees ’Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 1) As in the above example, only the substrate is changed to Corning 7 0 5 9 glass, and other conditions remain unchanged. , The primary coating is heat-treated at about 300 ~ 340C for 1 hour, then the diamagnetism obtained after furnace cooling is 2,450 0e, the saturation magnetization is about 1 0 5 emu / on3, and the angular ratio is about 0.68 . For example, the film after heat treatment at about 350 ~ 400t: oxidized for 2 hours, after the furnace is cooled, the paper scale is used in China National Standard (CNS) A 4 specifications (210X297 g *) V. Description of the invention (12 )

AG H G The film printed by the Cooperative Society of the Central Standards Bureau of the Ministry of Economy has a diamagnetic force of about 900 Oe, a saturation magnetization of about 45 emu / cm ^, and an angular ratio of 0.90. 2) As in the above example, only the percentage of heavy metal in the target is changed to |? E: Co: Μη = 89.3: 10.5: 0.2, other conditions remain unchanged, the initial coating is still K about 3 ϋ 0 ~ 3 4 0 t After the original heat treatment for 1 hour, the diamagnetism force of the film obtained after furnace cooling is about 1 1 700 e, although the saturation magnetization is about 2 60 emu / and the angular ratio is about 0.56. Please refer to the third figure, which is the X-ray diffraction pattern of this film, which can be confirmed as F e3 0+ phase after analysis. The heat-treated film is then oxidized at about 360 ~ 400C for 2 hours. After the furnace is cooled, the anti-magnetic force of the film is about 3,000 0e, the saturation magnetization is about 310 emu / cm3, and the angular ratio is about 0.61 . Please refer to the fourth figure, which is the X-ray diffraction pattern of this film, which can be confirmed as γ-FeiOj after analysis, so that the film is subjected to annealing treatment for about 340 ~ 360¾ 8 hours, and the resistance of the film obtained after cooling The magnetic force is about 3 800 0 0 e, the saturation magnetization is about 2 6 0 emu /, and the angular ratio is about 0.63. Please refer to the fifth figure, which is the X-ray diffraction pattern of this film. After analysis, it can be confirmed that it is still 7-Fe; phase l03. 3) As in the above example, the weight percentage of the target metal is Fe: Co: Mn = 89.3: 10.5: 0.2, the substrate is Corning 7 0 5 9 glass, the initial coating film M is about 300 ~ 340t: the original heat treatment is 1 hour, the furnace is cooled The resulting film has a coercive force of about 1020 0e, a saturation magnetization of about 270 emu / on3, and an angular ratio of about 0.62. For example, after the initial coating of the original film, and then oxidized for about 3 6 0 ~ 380¾ for 2 hours, the film obtained after furnace cooling has a magnetic resistance of about 2700 0e and a saturation magnetization of about 2 9 0 emu / cnr. 0.90, so the film is then annealed for about 340 ~ 36〇 · Ιΰ for about 8 hours, then "after cooling, the paper size is used in China National Standards (CNS) A 4 specifications (210X297;« :) And the precautions will be written on this page) Installation · Line &lt;, 1224

Λ fi W C 5. Description of the invention (; L3) The resulting film has a coercive force of approximately 4000 Oe, a saturation magnetization of approximately 255 e m u /, and an angular ratio of approximately 0.83. In order to get a clearer understanding of this magnetic recording medium, here is another example to add M description: The target percentage of gold weight is Fe: Co: Mn = 79.5: 10.5: 10.0, the substrate is η type [Si0x / Si (100 )〕 Wafer, M RF cat plating method, sputtering conditions are: target to substrate distance is about 5 C m, substrate temperature is maintained about 100Ό, substrate rotation speed is 20 RPM, sputtering partial pressure ratio is controlled to Ar: 0 = 1: 1, and the total pressure is 30 mTorr, the input power is set at 50 watts, the working current is 70 mA, the initial coating is subjected to a heat treatment of about 300 ~ 340¾ for 1 hour, and the anti-magnetic force of the resulting film after cooling is about 1200 0e, the saturation magnetization is about 200 emu / cm3, and the aspect ratio is about 0.45. If the film after heat treatment is subjected to the original heat treatment, it is then oxidized for about 360 ~ 38010 for 2 hours. It is about 27,000 e, the saturation magnetization is about 1 2 8 emu / 〇 /, and the angle ratio is about 0.45. Of course, the above example can also be changed as follows: Printed by the Ministry of Economic Affairs Central Purification Bureau Beigong Consumer Cooperative (please read the notes on the back before writing this page) D1) As in the above example, only the substrate is changed For Corning 7059 glass, the other conditions remain unchanged. The initial film is heat-treated at about 300 ~ 3401 for 1 hour. After the furnace is cooled, the anti-magnetic force of the film obtained is about 1050 0e, and the saturation magnetization is about 205 emu / cm3. , The aspect ratio is about 0.47. For example, the film after heat treatment can be oxidized for about 360 ~ 400T0 for 2 hours. After the furnace is cooled, the magnetic resistance of the film is about 2520 0e, the saturation magnetization is about 115 emu / αη ^, and the angle ratio is 0.48. . 2) Change the metal weight percentage of the target to Fe: Co as described in the above example: This paper scale is easy to use Chinese Η home sample standard (CNS) A 4 specifications (210X297 g; a :) Λ ο Π c 2l224i〇 V. Invention Description (1 spoon Mn = 71.0: 10.5: 18.5, other conditions remain unchanged, the obtained initial coating K is about 300 ~ 340 ¾ can be heat-treated for 1 hour, the diamagnetic resistance of the film obtained after furnace cooling is about 1400 0e, although the saturation magnetization Approximately 150 erau / cm3, the angle ratio is about 0.4 3. If this film is heat-treated, it will be oxidized by about 3 6 0 ~ 4 0 0 1C for about 2 hours. The magnetic force is about 2 6 5 0 0 e, the saturation magnetization is about 1 5 0 emu / cm3, the angular ratio is about 0.3 0. 3) As in the above example, change the metal weight percentage of the target to Fe: Co : Μη = 71.0: 10.5: 18.5, and the substrate is also changed to Corning 7 059 glass, other conditions remain unchanged, the obtained preliminary film is heat-treated at about 300 ~ 340 &quot; C Ahara for 1 hour, and then obtained after cooling The diamagnetic force of the film is about 1350 0e, the saturation magnetization is about 165emu / cm3, and the angular ratio is about 0.41. If the film after the heat treatment of the original wrap is subjected to about 3 6 0 ~ 4 0 0 t: oxidation for 2 hours, the film obtained after furnace cooling has a diamagnetic resistance of about 2200 0e and a saturation magnetization of about 145 emu / απ3 .Angle ratio is 0.33. From the above description and illustrations, those skilled in the art know that the present invention can achieve the purpose of pre-disclosure, but none of them are as protected as the scope of the patent application. : Write a wooden page again) Printed by the Ministry of Economic Affairs, Central Bureau of Industry and Technology, EX Industrial and Consumer Cooperatives. This paper is used in the middle of the standard (CNS) TM specifications (210X297; ¢)

Claims (1)

AT B7 C7 g ^ 24 £ _D7_ VI. Patent application ® 1. A manufacturing method of magnetic recording media includes: a) providing a substrate; b) providing a target material made of manganese-aluminum and sticking on top of it The small pieces K of cobalt and e are used to adjust the composition ratio; M and c) the target material forms a magnetic recording medium film on the substrate under controlled conditions. 2. The manufacturing method as described in the first item of the patent application, wherein the substrate is a sand wafer. 3. The manufacturing method as described in the first item of the patent application, wherein the substrate is a glass sheet. 4. The manufacturing method as described in the first item of the patent application scope, wherein the substrate is a gold display. 5. The manufacturing method as described in the first item of the patent application Fanpu, in which an A 03 layer M must be plated on the substrate to strengthen its surface hardness. 6. The manufacturing method as described in the first paragraph of the patent application, wherein the magnetic recording medium is formed by the DC plasma method. 7. The manufacturing method as described in the first item of the patent application scope, wherein the magnetic recording medium is formed by a radio frequency plasma method. Printed by the Beigong Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs (please read the precautions on the back before filling in this page) 8. The manufacturing method as described in the first item of the patent scope, where the target material is M with a purity of about 9 9.7 Made of manganese and osmium. 9. The manufacturing method as described in the first item of the scope of the patent application, in which the small pieces of cobalt and lai attached to the target are made of cobalt and iron with a purity of about 99.9 M. 10. The manufacturing method as described in the first item of the patent application park, where the paper size is applicable to China National Standard (CNS) Grade 4 (210x297 gong) ⑽43 _ ^ _ ⑽43 _ ^ _ Qizhongbu Printed by the quasi-bureau te Gongxiao f Hezaisha Λ. Λ 7 Β7 六 '中 M Patent Court IS Magnetic recording media film, its composition is M cobalt weight percentage of Co cobalt is about 0 ~ 20%, Mn is about 0 ~ 18.5! «, Μ and Fe 戡 about 61.5 ~ 99. 5¾ formed. 11. The manufacturing method as described in the first item of the patent application scope, wherein the formed magnetic recording medium film has a cation weight percentage of preferably 〇Cobalt about 6 ~ l 2 S :, Mn Mn about 0 . 1 ~ 6! «. 12. The manufacturing method as described in the first item of the patent application scope, in which the magnetic recording medium film formed has a 7-F e2 03 phase. 13. The manufacturing method as described in the first item of the scope of the patent application, wherein the formed magnetic recording medium film has a Fe3 0 phase. 14. The manufacturing method as described in the first item of the patent application scope, in which the magnetic recording medium film formed has 7-F 4 03 and F% 0+ phases. 15. The manufacturing method as described in the first item of the patent application, wherein the formed magnetic recording medium film has a thickness of about 30 ~ 500 nm, and a magnetic value of diamagnetic force of about 900 ~ 4000 0e, saturation magnetization It is about 44 ~ 310 emu / co ^, and the aspect ratio is about 0.47 ~ 0.90. 16. The manufacturing method described in the fifteenth item of the patent application, wherein the formed magnetic recording medium film, the preferred state coercive force is about 12000 ~ 20000e, the saturation magnetization is about 200 emu / cm3. The ratio of W and angle is approximately 0.70 Μ. 17. The manufacturing method as described in the first paragraph of the patent application, where the magnetic recording medium film formed is subjected to the first heat treatment process, that is, a constant temperature under an atmosphere of about 2 0 0 ~ 3 5 0 C, Η2 About 0.1 ~ 2 hours, the α-Fe ^ Oj phase is transformed into Fe 彡 0 潳 phase. This paper scale is applicable to China National Standard (CNS) Class A (tM21〇x297 ft) ........................................... .......... (........... &amp; ................................ .... Order ............... Factory ............ ^-(•• t? Read the precautions on the back first (Fill in this page) B7 C7 D7 6. Scope of patent application 18. The manufacturing method as described in Item 17 of the patent application, where the first heat treatment process, the preferred conditions are about 300 ~ 340t: under H2 atmosphere The constant temperature is about 0.5 ~ 1 hour. 19. The manufacturing method as described in Item 17 of the patent application range, in which the formed magnetic recording medium film needs to undergo a second heat treatment process to be heated to about 3 0 0 ~ 4 0 0 Ό, a constant temperature under the atmosphere of about 0.1 ~ 4 hours, M obtained phase. 2 0. The manufacturing method as described in item 19 of the scope of patent application, wherein the second heat treatment process, the preferred conditions are about 340 ~ 3801C, constant temperature under the atmosphere for about 0.5 ~ 2 hours. 2 1. The manufacturing method as described in item 19 of the patent application scope, wherein a third heat treatment step is added after the second heat treatment procedure At about 300 ~ 3 80 T0, annealing in air furnace for about 0.1 ~ 10 hours, the magnetic resistance of the magnetic recording medium film can reach about 3000 〇e Μ. 2 2. If the patent application scope is twenty-first The manufacturing method described in the item, wherein the third heat treatment step, the preferred conditions are about 340 ~ 380t: annealing in an air furnace for about 2 ~ 8 hours. 23. The manufacturing method as described in the first item of the patent application , Where the formed magnetic recording medium film, a lubricant layer must be added on it to avoid wear of the magnetic head. --- L——I ---------- / ------- 装------ ΪΤ ------ i (Please read the precautions on the back before writing this page) The paper standard printed by the Staff Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economy and Economy is applicable to the Chinese National Standard (CNS) A 4 specifications (210 X 297 mm)