TW207574B - - Google Patents
Info
- Publication number
- TW207574B TW207574B TW080101941A TW80101941A TW207574B TW 207574 B TW207574 B TW 207574B TW 080101941 A TW080101941 A TW 080101941A TW 80101941 A TW80101941 A TW 80101941A TW 207574 B TW207574 B TW 207574B
- Authority
- TW
- Taiwan
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US48073390A | 1990-02-16 | 1990-02-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW207574B true TW207574B (en:Method) | 1993-06-11 |
Family
ID=23909140
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW080101941A TW207574B (en:Method) | 1990-02-16 | 1991-03-12 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0442755A3 (en:Method) |
| KR (1) | KR910015883A (en:Method) |
| TW (1) | TW207574B (en:Method) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0136110A3 (en) * | 1983-08-30 | 1986-05-28 | Mitsubishi Kasei Corporation | Positive photosensitive compositions useful as photoresists |
| US4596763A (en) * | 1984-10-01 | 1986-06-24 | American Hoechst Corporation | Positive photoresist processing with mid U-V range exposure |
| EP0227487B1 (en) * | 1985-12-27 | 1992-07-15 | Japan Synthetic Rubber Co., Ltd. | Positive type radiation-sensitive resin composition |
| JPS63167351A (ja) * | 1986-12-22 | 1988-07-11 | インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン | フォトレジスト組成物 |
| DE3810631A1 (de) * | 1988-03-29 | 1989-10-12 | Hoechst Ag | Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial mit hohem waermestand |
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1991
- 1991-02-13 KR KR1019910002477A patent/KR910015883A/ko not_active Withdrawn
- 1991-02-15 EP EP19910301240 patent/EP0442755A3/en not_active Withdrawn
- 1991-03-12 TW TW080101941A patent/TW207574B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| EP0442755A3 (en) | 1991-10-23 |
| KR910015883A (ko) | 1991-09-30 |
| EP0442755A2 (en) | 1991-08-21 |