TW202421853A - Micro-corrosive liquid and application thereof in presenting boundary line of interface of cu-ni elemental metal plating layer - Google Patents

Micro-corrosive liquid and application thereof in presenting boundary line of interface of cu-ni elemental metal plating layer Download PDF

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TW202421853A
TW202421853A TW112102427A TW112102427A TW202421853A TW 202421853 A TW202421853 A TW 202421853A TW 112102427 A TW112102427 A TW 112102427A TW 112102427 A TW112102427 A TW 112102427A TW 202421853 A TW202421853 A TW 202421853A
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micro
interface
hydrogen peroxide
boundary line
corrosion
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王秀婷
戴寶業
徐艷彩
董帥
方盈龍
張金新
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大陸商立芯精密智造(昆山)有限公司
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Abstract

The present invention discloses a micro-corrosive liquid and its application in presenting boundary line of interface of Cu-Ni elemental metal plating layer. The micro-corrosive liquid comprises hydrogen peroxide solution with mass volume percentage of 2.5%-15%. The use of hydrogen peroxide solution with low concentration enables the boundary line at the interface of Cu-Ni elemental metal plating layer to be presented clearly, which facilitates accurate measurement of the thickness of the elemental metal plating layer and reduces the SEM image measurement error. The micro-corrosive liquid of the present invention is composed of simple composition, can be substituted by medical hydrogen peroxide, is cheap, safe for corrosion operation, less harmful, owns long shelf life and can be applied broadly.

Description

一種微腐蝕液及其在顯現單質金屬鍍層Cu-Ni交界面分界線中的應用A micro-corrosive liquid and its application in revealing the boundary line of Cu-Ni interface in single metal coating

本發明實施例涉及金屬表面處理技術領域,例如一種微腐蝕液及其在顯現單質金屬鍍層Cu-Ni交界面分界線中的應用。The embodiments of the present invention relate to the field of metal surface treatment technology, for example, a micro-corrosive liquid and its application in revealing the boundary line of the Cu-Ni interface of a single metal coating.

印刷電路板(PCB)上Cu襯底表面常做沉金處理來預防Cu襯底氧化,但在沉金過程中通常會產生金絲造成電路短路,因此在沉金前會對Cu襯底表面進行化鎳處理以隔絕Au和Cu之間的擴散,同時焊接層也需要鎳層有足夠的厚度。The Cu substrate surface on the printed circuit board (PCB) is often treated with immersion gold to prevent oxidation of the Cu substrate. However, gold wires are usually generated during the immersion gold process, causing circuit short circuits. Therefore, the Cu substrate surface is treated with nickel before immersion gold to isolate the diffusion between Au and Cu. At the same time, the soldering layer also requires a nickel layer with sufficient thickness.

對於PCB上Cu襯底經鎳金處理後進行截面切片(X-section)製作,借助SEM量測鎳金厚度確認鍍層品質。因SEM的背散射電子(BSE)成像基於訊號接收器接收到BSE電子所攜帶的樣品物理訊號強度改變圖像的灰度等級,原子序數越大的部分,BSE產率越高,在圖像中呈亮區。由於Ni(原子序數28)和Cu(原子序數29)原子序數相近,所以在SEM成像時圖像灰度等級相近,所以當銅層表面鍍鎳後在SEM成像時無法有效的辨別Ni層與Cu層之間的界線,導致無法量測Ni層厚度。For the Cu substrate on the PCB, after being treated with nickel, a cross-section (X-section) is made, and the nickel thickness is measured by SEM to confirm the coating quality. Since the backscattered electron (BSE) imaging of SEM is based on the signal receiver receiving the physical signal intensity of the sample carried by the BSE electrons to change the grayscale level of the image, the part with a larger atomic number has a higher BSE yield, and it appears as a bright area in the image. Since Ni (atomic number 28) and Cu (atomic number 29) have similar atomic numbers, the grayscale levels of the images are similar during SEM imaging. Therefore, when the copper layer surface is nickel-plated, the boundary between the Ni layer and the Cu layer cannot be effectively distinguished during SEM imaging, resulting in the inability to measure the thickness of the Ni layer.

目前常見的金屬腐蝕液有H 2O 2-氨水-水蝕刻液或含硫酸的分層劑。但用於腐蝕金屬的混溶液H 2O 2-氨水-水蝕刻液雙氧水含量低,配置複雜,氨水的易揮發性導致蝕刻液有效時間僅能維持2小時否則會影響腐蝕效果,且蝕刻液多用於電鍍銅-化學銅的分界線腐蝕。而用於焊接形成的金屬間化合物表面腐蝕的含硫酸分層劑,稀硫酸氧化Ni和Cu的速度較為緩慢,短時間內腐蝕效果差,所以分層劑用於Cu-Ni界線腐蝕時效性差。而Cu-Ni截面經過分層劑腐蝕5分鐘後,Ni層與Cu層分界線仍不清晰,銅層僅出現輕微腐蝕痕迹,且腐蝕不均勻。 Common metal etching solutions currently include H2O2 -ammonia-water etching solutions or sulfuric acid-containing layering agents. However , the mixed solution H2O2 -ammonia-water etching solutions used for metal corrosion have low hydrogen peroxide content and are complex to prepare. The volatility of ammonia means that the effective time of the etching solution can only be maintained for 2 hours, otherwise it will affect the corrosion effect. In addition, etching solutions are mostly used for electroplated copper-chemical copper boundary corrosion. For sulfuric acid-containing layering agents used for surface corrosion of intermetallic compounds formed by welding, the rate of oxidation of Ni and Cu by dilute sulfuric acid is relatively slow, and the corrosion effect is poor in a short period of time, so the layering agent has poor timeliness when used for Cu-Ni boundary corrosion. After the Cu-Ni cross section was corroded by the layering agent for 5 minutes, the boundary between the Ni layer and the Cu layer was still unclear, and the copper layer only showed slight corrosion marks, and the corrosion was uneven.

如上先前技術中均不能實現單質金屬鍍層Cu-Ni交界面的清晰分層,因而在印刷電路板需要進行金屬鍍層厚度的確認時,無法進行準確測量,因此,在本發明所屬技術領域中,期望開發一種能夠實現單質金屬鍍層Cu-Ni交界面的清晰分層的微腐蝕液。As mentioned above, the previous technologies cannot achieve clear stratification of the Cu-Ni interface of the single metal coating, so when the thickness of the metal coating on the printed circuit board needs to be confirmed, it is impossible to perform accurate measurement. Therefore, in the technical field to which the present invention belongs, it is hoped to develop a micro-corrosive liquid that can achieve clear stratification of the Cu-Ni interface of the single metal coating.

以下是對本說明書詳細描述的主題的概述。本概述並非是為了限制請求項的保護範圍。The following is a summary of the topics that are described in detail in this specification. This summary is not intended to limit the scope of the claims.

本發明實施例提供一種微腐蝕液及其在顯現單質金屬鍍層Cu-Ni交界面分界線中的應用,特別是提供一種用於清晰顯現單質金屬鍍層Cu-Ni交界面分界線的微腐蝕液及其應用。The embodiment of the present invention provides a micro-corrosive liquid and its application in showing the boundary line of the Cu-Ni interface of the single metal coating, and in particular provides a micro-corrosive liquid for clearly showing the boundary line of the Cu-Ni interface of the single metal coating and its application.

一方面,本發明實施例提供一種用於顯現單質金屬鍍層Cu-Ni交界面分界線的微腐蝕液,所述微腐蝕液包括質量體積百分比濃度為2.5%至15%的雙氧水溶液。On the one hand, an embodiment of the present invention provides a micro-corrosive solution for revealing the boundary line of the Cu-Ni interface of a single metal coating, wherein the micro-corrosive solution comprises a hydrogen peroxide aqueous solution having a mass volume percentage concentration of 2.5% to 15%.

在本發明中,利用稀的雙氧水溶液能夠使得在單質金屬鍍層Cu-Ni交界面分界線清晰地呈現出來,以便能夠對於金屬鍍層厚度進行準確測量,只有準確的確認各鍍層厚度,特別是Ni層厚度,才能保證印刷電路板中足夠的Ni厚能夠防止Au和Cu之間的擴散,同時也能滿足印刷電路板焊接層的焊接需求。In the present invention, a dilute hydrogen peroxide solution is used to make the boundary line of the Cu-Ni interface of the single metal coating clearly appear, so that the thickness of the metal coating can be accurately measured. Only by accurately confirming the thickness of each coating layer, especially the thickness of the Ni layer, can it be guaranteed that the Ni thickness in the printed circuit board is sufficient to prevent the diffusion between Au and Cu, and at the same time meet the welding requirements of the printed circuit board welding layer.

本發明的微腐蝕液成分簡單,可用醫用雙氧水進行替代,價格便宜,腐蝕操作安全,危害較小。雖然室溫環境下雙氧水會緩慢分解,但參照醫用雙氧水有效期,該腐蝕液有效期可達半年之久,腐蝕後的Cu-Ni金屬層間界線較為清晰,降低了SEM圖像測量誤差。The micro-corrosive liquid of the present invention has simple ingredients and can be replaced by medical hydrogen peroxide. It is cheap, the corrosion operation is safe, and the harm is small. Although hydrogen peroxide will slowly decompose under room temperature, the corrosion liquid can be valid for half a year with reference to the validity period of medical hydrogen peroxide. The boundary between the Cu-Ni metal layers after corrosion is clearer, which reduces the measurement error of SEM images.

在本發明中,所述雙氧水溶液為雙氧水的水溶液。在本發明中,所使用的雙氧水溶液的濃度可以為2.5%至15%,如3%、5%、10%、12%或15%,理想為3至15%,在本發明中,如果雙氧水溶液的濃度低於2.5%,則由於雙氧水濃度過低,腐蝕效果不明顯,Ni-Cu層未顯現分界線,而雙氧水溶液的濃度高於15%,則由於雙氧水濃度過高,導致銅面表面出現蜂窩凹坑,表面形貌惡化,疏鬆的氧化銅殘留在切片表面,同時高濃度的雙氧水溶液在使用過程中還需特別注意使用的安全性。In the present invention, the hydrogen peroxide solution is an aqueous solution of hydrogen peroxide. In the present invention, the concentration of the hydrogen peroxide solution used can be 2.5% to 15%, such as 3%, 5%, 10%, 12% or 15%, and ideally 3 to 15%. In the present invention, if the concentration of the hydrogen peroxide solution is lower than 2.5%, the corrosion effect is not obvious due to the low concentration of hydrogen peroxide, and the Ni-Cu layer does not show a boundary line. If the concentration of the hydrogen peroxide solution is higher than 15%, the concentration of the hydrogen peroxide solution is too high, resulting in honeycomb pits on the copper surface, deterioration of the surface morphology, and loose copper oxide residues on the slice surface. At the same time, special attention should be paid to the safety of the high-concentration hydrogen peroxide solution during use.

本發明中,雙氧水溶液微腐蝕的時間為5秒至15分鐘,例如30秒、1分鐘、3分鐘、5分鐘、10分鐘或15分鐘。切片腐蝕5秒後即可清晰區分Cu-Ni層,為獲取最佳表面形貌可延長腐蝕時間至5分鐘,但建議不超出30分鐘,因為腐蝕時間過長,銅面表面出現明顯的蜂窩凹坑,故腐蝕時長理想為30秒至15分鐘,進一步理想為30秒至5分鐘。In the present invention, the micro-etching time of the hydrogen peroxide solution is 5 seconds to 15 minutes, such as 30 seconds, 1 minute, 3 minutes, 5 minutes, 10 minutes or 15 minutes. After 5 seconds of etching, the Cu-Ni layer can be clearly distinguished. In order to obtain the best surface morphology, the etching time can be extended to 5 minutes, but it is recommended not to exceed 30 minutes, because if the etching time is too long, obvious honeycomb pits will appear on the copper surface. Therefore, the ideal etching time is 30 seconds to 15 minutes, and more preferably 30 seconds to 5 minutes.

綜上,在本發明中,對於2.5%至15%含量雙氧水腐蝕液蝕刻30秒至15分鐘後Ni-Cu表面形貌最佳。雙氧水腐蝕液濃度低於1%,腐蝕時長小於5秒則無明顯的腐蝕,Cu-Ni層不能顯現分界線;雙氧水腐蝕液濃度小於2%,腐蝕時長5秒至30秒Cu-Ni層出現輕微腐蝕,分界線不明顯;而雙氧水腐蝕液濃度高於15%,腐蝕時長高於15分鐘後則銅面表面出現蜂窩凹坑,存留疏鬆氧化銅,表面形貌惡化,此外較高濃度的雙氧水具有較強的氧化性,使用時需注意安全,同時腐蝕時間的延長也會降低工作效率。In summary, in the present invention, the Ni-Cu surface morphology is best after etching with a hydrogen peroxide etching solution with a content of 2.5% to 15% for 30 seconds to 15 minutes. When the concentration of hydrogen peroxide corrosive solution is less than 1% and the corrosion time is less than 5 seconds, there is no obvious corrosion and the Cu-Ni layer cannot show the boundary line; when the concentration of hydrogen peroxide corrosive solution is less than 2% and the corrosion time is 5 to 30 seconds, the Cu-Ni layer will be slightly corroded and the boundary line will not be obvious; when the concentration of hydrogen peroxide corrosive solution is higher than 15% and the corrosion time is higher than 15 minutes, honeycomb pits will appear on the copper surface, loose copper oxide will remain, and the surface morphology will deteriorate. In addition, high-concentration hydrogen peroxide has strong oxidizing properties, so safety should be paid attention to when using it. At the same time, the extension of corrosion time will also reduce work efficiency.

另一方面,本發明實施例提供一種顯現單質金屬鍍層Cu-Ni交界面分界線的方法,所述方法使用如上所述的微腐蝕液。On the other hand, an embodiment of the present invention provides a method for revealing the boundary line of the Cu-Ni interface of a single metal coating, wherein the method uses the micro-corrosive solution as described above.

理想地,所述方法包括以下步驟: (1)對Cu-Ni鍍層樣品進行切片,對切片後的樣品截面進行打磨、拋光; (2)在步驟(1)處理後的切片截面上加入質量百分比濃度為2.5%至15%的雙氧水溶液進行微腐蝕,在掃描電鏡下觀察到單質金屬鍍層Cu-Ni交界面的分界線。 Ideally, the method comprises the following steps: (1) slicing the Cu-Ni coated sample, grinding and polishing the sliced sample cross section; (2) adding a hydrogen peroxide aqueous solution with a mass percentage concentration of 2.5% to 15% to the sliced cross section after the treatment in step (1) to perform micro-corrosion, and observing the boundary line of the Cu-Ni interface of the single metal coating under a scanning electron microscope.

在本發明中,步驟(1)所述打磨可以為用砂紙打磨。In the present invention, the polishing in step (1) can be polishing with sandpaper.

理想地,步驟(1)所述打磨為用180目、800目、2000目和2400目砂紙依次打磨。Ideally, the polishing in step (1) is performed using 180 grit, 800 grit, 2000 grit and 2400 grit sandpaper in sequence.

在本發明中,步驟(1)所述拋光為本發明所屬技術領域常用的拋光手段,例如可以用氧化鋁拋光液進行拋光,目的是保證切片截面表面無明顯劃痕。In the present invention, the polishing in step (1) is a polishing method commonly used in the technical field to which the present invention belongs, for example, polishing can be performed using an aluminum oxide polishing liquid, the purpose of which is to ensure that there are no obvious scratches on the surface of the slice cross section.

在本發明中,將雙氧水溶液在切片截面上均勻塗開。In the present invention, a hydrogen peroxide solution is evenly applied on the cross section of the slice.

理想地,針對步驟(1)處理後的切片截面,以截面的面積計算,步驟(2)所述雙氧水溶液的用量為1.0至1.5 mL/cm 2,例如1.0 mL/cm 2、1.1 mL/cm 2、1.2 mL/cm 2、1.3 mL/cm 2、1.4 mL/cm 2或1.5 mL/cm 2Ideally, for the slice section treated in step (1), the amount of the hydrogen peroxide solution used in step (2) is 1.0 to 1.5 mL/cm 2 , for example 1.0 mL/cm 2 , 1.1 mL/cm 2 , 1.2 mL/cm 2 , 1.3 mL/cm 2 , 1.4 mL/cm 2 or 1.5 mL/cm 2 , calculated based on the area of the section.

理想地,驟(2)所述微腐蝕的時間為1秒至120分鐘,例如1秒、3秒、5秒、20秒、30 秒、50秒、1分鐘、3 分鐘、5分鐘、10 分鐘、30分鐘、50分鐘、60分鐘、80分鐘、100分鐘或120分鐘,理想為30秒至5分鐘,進一步理想為30秒至5分鐘。Ideally, the microcorrosion time of step (2) is from 1 second to 120 minutes, for example, from 1 second, 3 seconds, 5 seconds, 20 seconds, 30 seconds, 50 seconds, 1 minute, 3 minutes, 5 minutes, 10 minutes, 30 minutes, 50 minutes, 60 minutes, 80 minutes, 100 minutes or 120 minutes, ideally from 30 seconds to 5 minutes, and more preferably from 30 seconds to 5 minutes.

在本發明中雙氧水溶液在步驟(1)處理後的切片截面上進行微腐蝕後,使用乾淨的無塵布將切片表面殘餘的腐蝕液擦除。In the present invention, after the hydrogen peroxide solution is used to micro-etch the slice section after the treatment in step (1), the residual etching solution on the slice surface is wiped off with a clean dust-free cloth.

在本發明中,利用所述低濃度的雙氧水溶液在切片截面進行微腐蝕較短的時間(5至30秒),就可以使得Ni和Cu形成不同的外觀形貌並顯現出明顯的交界線,在SEM電鏡下就可清晰地區分Ni層和Cu層。In the present invention, by using the low-concentration hydrogen peroxide solution to perform micro-etching on the slice cross section for a short time (5 to 30 seconds), Ni and Cu can form different appearances and show a clear boundary line, and the Ni layer and the Cu layer can be clearly distinguished under a SEM electron microscope.

在本發明中,由於金屬Ni的活潑性大於Cu,金屬鍍層截面切片製作完成後Ni會被空氣中O 2迅速氧化並在其表面形成一層薄薄的緻密氧化層,而空氣中的O 2對Cu的氧化就相對較為緩慢。本發明利用較低濃度的雙氧水氧化Ni和Cu時,由於切片截面的Ni表面已形成薄的緻密氧化膜會阻止雙氧水對Ni的進一步氧化。而對Cu層而言,雙氧水會氧化Cu層,形成的是較厚的相對鬆散多孔性的氧化層(CuO),而且無法形成鈍化層以進一步阻止表面上的Cu氧化作用。所以Ni和Cu因表面形貌不同在兩金屬單質交界處出現一清晰的界線。 In the present invention, since the activity of metal Ni is greater than that of Cu, after the metal coating cross section is sliced, Ni will be rapidly oxidized by O2 in the air and form a thin and dense oxide layer on its surface, while the oxidation of Cu by O2 in the air is relatively slow. When the present invention uses low-concentration hydrogen peroxide to oxidize Ni and Cu, a thin and dense oxide film has been formed on the Ni surface of the sliced cross section, which will prevent hydrogen peroxide from further oxidizing Ni. As for the Cu layer, hydrogen peroxide will oxidize the Cu layer to form a relatively thick, relatively loose and porous oxide layer (CuO), and it is impossible to form a passivation layer to further prevent the oxidation of Cu on the surface. Therefore, due to the different surface morphologies, a clear boundary appears at the junction of the two metal elements between Ni and Cu.

本發明所述方法中利用低濃度雙氧水進行微腐蝕,對環境要求低,安全可靠,可在常溫常壓下進行,腐蝕時間短。The method of the present invention utilizes low-concentration hydrogen peroxide to perform micro-corrosion, has low environmental requirements, is safe and reliable, can be performed at normal temperature and pressure, and has a short corrosion time.

另一方面,本發明實施例提供了如上所述的微腐蝕液或者顯現單質金屬鍍層Cu-Ni交界面分界線的方法在印刷電路板質量控制中的應用。On the other hand, the embodiments of the present invention provide the application of the micro-corrosive solution or the method for revealing the boundary line of the Cu-Ni interface of the single metal coating as described above in the quality control of printed circuit boards.

相對於相關技術,本發明實施例具有以下功效: 在本發明實施例中,利用稀的雙氧水溶液能夠使得在單質金屬鍍層Cu-Ni交界面分界線清晰地呈現出來,以便能夠對於金屬鍍層厚度進行準確測量,降低了SEM圖像測量誤差,本發明的微腐蝕液成分簡單,可用醫用雙氧水進行替代,價格便宜,腐蝕操作安全,危害較小,保存時間長,具有廣闊應用前景。 Compared with the related technologies, the embodiments of the present invention have the following effects: In the embodiments of the present invention, the use of a dilute hydrogen peroxide solution can make the boundary line of the Cu-Ni interface of the single metal coating clearly present, so that the thickness of the metal coating can be accurately measured, reducing the measurement error of the SEM image. The micro-corrosion liquid of the present invention has a simple composition and can be replaced by medical hydrogen peroxide. It is cheap, the corrosion operation is safe, the harm is small, the storage time is long, and it has broad application prospects.

在閱讀並理解了圖式和詳細描述後,可以明白其他方面。Other aspects will become apparent after reading and understanding the diagram and detailed description.

下面通過具體實施方式來進一步說明本發明的技術手段。本發明所屬技術領域中具有通常知識者應該明瞭,所述實施例僅僅是幫助理解本發明,不應視為對本發明的具體限制。 [實施例1] The technical means of the present invention are further explained below through specific implementation methods. Those with ordinary knowledge in the technical field to which the present invention belongs should understand that the above-mentioned embodiments are only to help understand the present invention and should not be regarded as specific limitations of the present invention. [Implementation Example 1]

本實施例中提供一種用於清晰顯現單質金屬鍍層Cu-Ni交界面分界線的微腐蝕液,該微腐蝕液為3%的雙氧水溶液。This embodiment provides a micro-corrosive liquid for clearly showing the boundary line of the Cu-Ni interface of the single metal coating. The micro-corrosive liquid is a 3% hydrogen peroxide aqueous solution.

利用該微腐蝕液進行單質金屬鍍層Cu-Ni交界面分界線顯現的方法,具體包括以下步驟: (1)對Cu-Ni鍍層樣品進行切片,對切片後的樣品截面用180目、800目、2000目和2400目砂紙依次打磨,而後利用氧化鋁拋光液(TROJAN AO-W氧化鋁拋光液氧化鋁粒徑0.05um)進行拋光; (2)在步驟(1)處理後的切片截面上加入3%的雙氧水溶液,均勻塗開,以截面的面積計算,所述雙氧水溶液的加入量1.0 mL/cm 2,進行微腐蝕30秒,在掃描電鏡下觀察到單質金屬鍍層Cu-Ni交界面的分界線,如圖1所示,圖2為未經微腐蝕的樣品截面(即步驟(1)處理後的切片截面)的掃描電鏡圖,從圖1中可以看出,Cu-Ni交界面的分界線明顯呈現,而從圖2中可以看出,未經微腐蝕的樣品截面Cu-Ni交界面的分界線不明顯。 [比較例1] The method for revealing the boundary line of the Cu-Ni interface of a single metal coating using the micro-corrosive liquid specifically comprises the following steps: (1) slicing a Cu-Ni coating sample, polishing the sample cross section with 180 mesh, 800 mesh, 2000 mesh and 2400 mesh sandpaper in sequence, and then polishing with an alumina polishing liquid (TROJAN AO-W alumina polishing liquid, alumina particle size 0.05 um); (2) adding a 3% hydrogen peroxide solution to the cross section of the slice treated in step (1), evenly spreading it, and calculating the amount of the hydrogen peroxide solution added is 1.0 mL/ cm2 based on the area of the cross section. , micro-corrosion was performed for 30 seconds, and the boundary line of the Cu-Ni interface of the single metal coating was observed under a scanning electron microscope, as shown in Figure 1. Figure 2 is a scanning electron microscope image of the cross section of the sample that has not been micro-corroded (i.e., the cross section of the slice after step (1) treatment). It can be seen from Figure 1 that the boundary line of the Cu-Ni interface is clearly presented, while it can be seen from Figure 2 that the boundary line of the Cu-Ni interface of the cross section of the sample that has not been micro-corroded is not obvious. [Comparison Example 1]

與實施例1的區別僅在於,所使用的微腐蝕液為0.5%的雙氧水溶液。 [比較例2] The only difference from Example 1 is that the micro-corrosive liquid used is a 0.5% hydrogen peroxide solution. [Comparative Example 2]

與實施例1的區別僅在於,所使用的微腐蝕液為1.0%的雙氧水溶液。 [比較例3] The only difference from Example 1 is that the micro-corrosive liquid used is a 1.0% hydrogen peroxide solution. [Comparative Example 3]

與實施例1的區別僅在於,所使用的微腐蝕液為2.0%的雙氧水溶液。 [實施例2] The only difference from Example 1 is that the micro-corrosive liquid used is a 2.0% hydrogen peroxide solution. [Example 2]

與實施例1的區別僅在於,所使用的微腐蝕液為5.0%的雙氧水溶液。 [實施例3] The only difference from Example 1 is that the micro-corrosive liquid used is a 5.0% hydrogen peroxide solution. [Example 3]

與實施例1的區別僅在於,所使用的微腐蝕液為10%的雙氧水溶液。 [實施例4] The only difference from Example 1 is that the micro-corrosive liquid used is a 10% hydrogen peroxide solution. [Example 4]

與實施例1的區別僅在於,所使用的微腐蝕液為15%的雙氧水溶液。 [比較例4] The only difference from Example 1 is that the micro-corrosive liquid used is a 15% hydrogen peroxide solution. [Comparative Example 4]

與實施例1的區別僅在於,所使用的微腐蝕液為20%的雙氧水溶液。 [比較例5] The only difference from Example 1 is that the micro-corrosive liquid used is a 20% hydrogen peroxide solution. [Comparative Example 5]

與實施例1的區別僅在於,所使用的微腐蝕液為25%的雙氧水溶液。 [比較例6] The only difference from Example 1 is that the micro-corrosive liquid used is a 25% hydrogen peroxide solution. [Comparative Example 6]

與實施例1的區別僅在於,所使用的微腐蝕液為30%的雙氧水溶液。The only difference from Example 1 is that the micro-corrosive liquid used is a 30% hydrogen peroxide solution.

為尋求不同雙氧水濃度對Cu-Ni腐蝕的影響,比較了不同濃度雙氧水在相同的腐蝕時間(30秒)作用後Au-Ni-Cu的形貌。雙氧水濃度低於1%時,Cu-Ni交界面未出現明顯界線(比較例1,其經微腐蝕後樣品截面的描電鏡圖如圖3所示),1%至2%僅在Cu-Ni交界出銅區域僅有輕微腐蝕(比較例2和3,其經微腐蝕後樣品截面的描電鏡圖如圖4和圖5所示);雙氧水濃度3%至15%(實施例1至4,其經微腐蝕後樣品截面的描電鏡圖如圖1、圖6至8所示),Cu-Ni交界面界線逐漸明顯,隨腐蝕濃度增大Cu-Ni交界線越顯著,銅面腐蝕均勻,銅層表面趨於平整,雙氧水濃度大於15%後(比較例4至6,其經微腐蝕後樣品截面的電鏡圖如圖9至圖11所示),Cu-Ni交界面雖然出現明顯的交界線,但由於雙氧水濃度過大,銅層表面出現蜂窩狀凹坑,且濃度越大長蜂窩現狀越明顯同時在銅層表面殘留大量碎屑,銅層形貌品質越來越差。 [比較例7] In order to explore the effect of different hydrogen peroxide concentrations on Cu-Ni corrosion, the morphology of Au-Ni-Cu after being exposed to hydrogen peroxide of different concentrations for the same corrosion time (30 seconds) was compared. When the concentration of hydrogen peroxide is lower than 1%, no obvious boundary appears at the Cu-Ni interface (Comparative Example 1, the SEM image of the cross section of the sample after micro-corrosion is shown in Figure 3), and 1% to 2% only slightly corrodes the copper region at the Cu-Ni interface (Comparative Examples 2 and 3, the SEM images of the cross section of the sample after micro-corrosion are shown in Figures 4 and 5). When the concentration of hydrogen peroxide is 3% to 15% (Examples 1 to 4, the SEM images of the cross section of the sample after micro-corrosion are shown in Figures 1, 6 to 8), the Cu-Ni interface has a clear boundary. The Cu-Ni interface gradually becomes obvious. As the corrosion concentration increases, the Cu-Ni boundary line becomes more obvious. The copper surface is evenly corroded, and the copper layer surface tends to be flat. When the hydrogen peroxide concentration is greater than 15% (Comparison Examples 4 to 6, the electron microscope images of the cross-section of the sample after micro-corrosion are shown in Figures 9 to 11), although the Cu-Ni interface has an obvious boundary line, due to the excessive concentration of hydrogen peroxide, honeycomb-shaped pits appear on the surface of the copper layer. The higher the concentration, the more obvious the honeycomb phenomenon. At the same time, a large amount of debris remains on the surface of the copper layer, and the morphology quality of the copper layer becomes worse and worse. [Comparison Example 7]

與實施例1的區別僅在於,腐蝕時間為1秒。 [比較例8] The only difference from Example 1 is that the corrosion time is 1 second. [Comparative Example 8]

與實施例1的區別僅在於,腐蝕時間為5秒。 [實施例5] The only difference from Example 1 is that the corrosion time is 5 seconds. [Example 5]

與實施例1的區別僅在於,腐蝕時間為1分鐘。 [實施例6] The only difference from Example 1 is that the corrosion time is 1 minute. [Example 6]

與實施例1的區別僅在於,腐蝕時間為5分鐘。 [實施例7] The only difference from Example 1 is that the corrosion time is 5 minutes. [Example 7]

與實施例1的區別僅在於,腐蝕時間為15分鐘。 [比較例9] The only difference from Example 1 is that the corrosion time is 15 minutes. [Comparative Example 9]

與實施例1的區別僅在於,腐蝕時間為30分鐘。 [比較例10] The only difference from Example 1 is that the corrosion time is 30 minutes. [Comparative Example 10]

與實施例1的區別僅在於,腐蝕時間為60分鐘。 [比較例11] The only difference from Example 1 is that the corrosion time is 60 minutes. [Comparative Example 11]

與實施例1的區別僅在於,腐蝕時間為120分鐘。The only difference from Example 1 is that the corrosion time is 120 minutes.

為尋求雙氧水最佳腐蝕時長,比較了相同濃度下(3%含量)雙氧水腐蝕液蝕刻不同時長後Cu-Ni的形貌。雙氧水蝕刻1秒,Cu-Ni交界面未出現明顯界線,在Cu-Ni交界出銅區域僅有輕微腐蝕(比較例7,其經微腐蝕後樣品截面的電鏡圖如圖12所示);雙氧水蝕刻5秒至30秒,Cu-Ni交界面界線逐漸明顯,但銅面腐蝕不均勻,銅表面殘留有少量未被腐蝕的區域(比較例8和實施例1其經微腐蝕後樣品截面的電鏡圖如圖13和圖1所示),隨腐蝕時間延長,未被腐蝕區域逐漸减少;雙氧水蝕刻1至15分鐘(實施例5至7,其經微腐蝕後樣品截面的電鏡圖如圖14至16所示),Cu-Ni交界面出現明顯的交界線,且銅面腐蝕均勻,銅層表面趨於平整;雙氧水蝕刻30至120分鐘(比較例9至11,其經微腐蝕後樣品截面的電鏡圖如圖17至19所示),Cu-Ni交界面雖然出現明顯的交界線,但由於雙氧水長時間的腐蝕作用,銅層表面出現蜂窩狀凹坑,且腐蝕時間越長蜂窩現狀越明顯同時在銅面出現大量的絨狀碎屑,銅面形貌品質越來越差。 [比較例12] In order to find the optimal corrosion time of hydrogen peroxide, the morphology of Cu-Ni after etching for different times with hydrogen peroxide corrosion solution at the same concentration (3%) was compared. After hydrogen peroxide etching for 1 second, no obvious boundary appeared at the Cu-Ni interface, and only slight corrosion occurred in the copper region at the Cu-Ni interface (Comparative Example 7, the electron microscope image of the cross section of the sample after micro-corrosion is shown in Figure 12); after hydrogen peroxide etching for 5 to 30 seconds, the boundary of the Cu-Ni interface gradually became obvious, but the copper surface was not uniformly corroded, and a small amount of uncorroded area remained on the copper surface (Comparative Example 8 and Example 1, the electron microscope images of the cross section of the sample after micro-corrosion are shown in Figure 13 and Figure 1). As the etching time increases, the uncorroded area gradually decreases; after hydrogen peroxide etching for 1 to 15 minutes (Examples 5 to 7 , the electron microscope images of the sample cross section after micro-corrosion are shown in Figures 14 to 16), the Cu-Ni interface has a clear boundary line, and the copper surface is evenly corroded, and the copper layer surface tends to be flat; hydrogen peroxide etching for 30 to 120 minutes (Comparison Examples 9 to 11, the electron microscope images of the sample cross section after micro-corrosion are shown in Figures 17 to 19), although the Cu-Ni interface has a clear boundary line, due to the long-term corrosion of hydrogen peroxide, honeycomb-like pits appear on the surface of the copper layer, and the longer the corrosion time, the more obvious the honeycomb phenomenon is. At the same time, a large amount of velvety debris appears on the copper surface, and the quality of the copper surface morphology is getting worse and worse. [Comparison Example 12]

與實施例1的區別僅在於,使用分層劑替代實施例1中使用的雙氧水溶液,所述分層劑為酒精硫酸混溶液(酒精原液25mL+10%(weight%)的硫酸 1mL),經過該分層劑對步驟(1)處理後的切片截面進行腐蝕2分鐘,其Cu-Ni交界面的掃描電鏡如圖20所示,由圖20可以看出,Cu-Ni交界面未出現明顯界線。 [比較例13] The difference from Example 1 is that a layering agent is used instead of the hydrogen peroxide solution used in Example 1. The layering agent is a mixed solution of alcohol and sulfuric acid (25 mL of alcohol stock solution + 1 mL of 10% (weight%) sulfuric acid). The slice section treated in step (1) is corroded for 2 minutes with the layering agent. The scanning electron microscope of the Cu-Ni interface is shown in Figure 20. As can be seen from Figure 20, no obvious boundary appears at the Cu-Ni interface. [Comparative Example 13]

與實施例1的區別僅在於,使用H 2O 2-氨水-水蝕刻液替代實施例1中使用的雙氧水溶液,所述H 2O 2-氨水-水蝕刻液組分為32%的氨水與純水1:1(V:V)混合形成50mL氨水溶液後加入36%的雙氧水溶液1.0mL,經過該蝕刻液對步驟(1)處理後的切片截面進行腐蝕2分鐘,其Cu-Ni交界面的掃描電鏡如圖21所示,由圖21可以看出,由於H 2O 2的含量較低,Cu-Ni交界面未出現明顯界線,且該蝕刻液配置複雜,有效期短。 The difference from Example 1 is that H2O2 -ammonia-water etching liquid is used instead of the hydrogen peroxide solution used in Example 1. The H2O2 - ammonia -water etching liquid is composed of 32% ammonia water and pure water mixed in a ratio of 1:1 (V:V) to form 50 mL ammonia solution, followed by the addition of 1.0 mL 36% hydrogen peroxide solution. The slice section treated in step (1) is etched with the etching liquid for 2 minutes. The scanning electron microscope image of the Cu-Ni interface is shown in FIG21. As can be seen from FIG21, due to the low content of H2O2 , no obvious boundary appears at the Cu-Ni interface. In addition, the etching liquid has a complex configuration and a short effective period.

發明人聲明,本發明通過上述實施例來說明本發明的微腐蝕液及其在顯現單質金屬鍍層Cu-Ni交界面分界線中的應用,但本發明並不局限於上述工藝步驟,即不意味著本發明必須依賴上述工藝步驟才能實施。所屬技術領域中具有通常知識者應該明瞭,對本發明的任何改進,對本發明所選用原料的等效替換及輔助成分的添加、具體方式的選擇等,均落在本發明的保護範圍和揭露範圍之內。The inventor declares that the present invention uses the above-mentioned embodiments to illustrate the micro-corrosive liquid of the present invention and its application in revealing the boundary line of the Cu-Ni interface of the single metal coating, but the present invention is not limited to the above-mentioned process steps, that is, it does not mean that the present invention must rely on the above-mentioned process steps to be implemented. Those with ordinary knowledge in the relevant technical field should understand that any improvement of the present invention, equivalent replacement of the raw materials selected by the present invention, addition of auxiliary components, selection of specific methods, etc., all fall within the scope of protection and disclosure of the present invention.

without

圖式用來提供對本文技術手段的進一步理解,並且構成說明書的一部分,與本發明的實施例一起用於解釋本文的技術手段,並不構成對本文技術手段的限制。The drawings are used to provide a further understanding of the technical means of this article and constitute a part of the specification. Together with the embodiments of the present invention, they are used to explain the technical means of this article and do not constitute a limitation of the technical means of this article.

〔圖1〕為實施例1中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖2〕為實施例1中步驟(1)處理後的切片截面未經微腐蝕的掃描電鏡圖。 〔圖3〕為比較例1中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖4〕為比較例2中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖5〕為比較例3中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖6〕為實施例2中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖7〕為實施例3中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖8〕為實施例4中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖9〕為比較例4中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖10〕為比較例5中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖11〕為比較例6中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖12〕為比較例7中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖13〕為比較例8中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖14〕為實施例5中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖15〕為實施例6中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖16〕為實施例7中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖17〕為比較例9中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖18〕為比較例10中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖19〕為比較例11中經微腐蝕後樣品截面的掃描電鏡圖。 〔圖20〕為比較例12中利用分層劑進行腐蝕後的樣品截面的掃描電鏡圖。 〔圖21〕為比較例13中利用H 2O 2-氨水-水蝕刻液進行腐蝕後的樣品截面的掃描電鏡圖。 [Figure 1] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Example 1. [Figure 2] is a scanning electron microscope image of the cross section of the slice after step (1) in Example 1 without microcorrosion. [Figure 3] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Comparative Example 1. [Figure 4] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Comparative Example 2. [Figure 5] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Comparative Example 3. [Figure 6] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Example 2. [Figure 7] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Example 3. [Figure 8] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Example 4. [Figure 9] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Comparative Example 4. [Figure 10] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Comparative Example 5. [Figure 11] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Comparative Example 6. [Figure 12] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Comparative Example 7. [Figure 13] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Comparative Example 8. [Figure 14] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Example 5. [Figure 15] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Example 6. [Figure 16] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Example 7. [Figure 17] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Comparative Example 9. [Figure 18] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Comparative Example 10. [Figure 19] is a scanning electron microscope image of the cross section of the sample after microcorrosion in Comparative Example 11. [Figure 20] is a scanning electron microscope image of the cross section of the sample after corrosion using a layering agent in Comparative Example 12. [Fig. 21] is a scanning electron microscope image of the cross section of the sample after being etched using H2O2 - ammonia -water etching solution in Comparative Example 13.

Claims (12)

一種用於顯現單質金屬鍍層Cu-Ni交界面分界線的微腐蝕液,其特徵係,該微腐蝕液包括質量體積百分比濃度為2.5%至15%的雙氧水溶液。A micro-corrosive liquid for revealing the boundary line of the Cu-Ni interface of a single metal coating is characterized in that the micro-corrosive liquid comprises a hydrogen peroxide aqueous solution with a mass volume percentage concentration of 2.5% to 15%. 如請求項1所述之用於顯現單質金屬鍍層Cu-Ni交界面分界線的微腐蝕液,其中,該雙氧水溶液的質量體積百分比濃度為3%至15%。A micro-corrosive liquid for revealing the boundary line of the Cu-Ni interface of a single metal coating as described in claim 1, wherein the mass volume percentage concentration of the hydrogen peroxide aqueous solution is 3% to 15%. 一種顯現單質金屬鍍層Cu-Ni交界面分界線的方法,其特徵係,該方法使用如請求項1或2所述之用於顯現單質金屬鍍層Cu-Ni交界面分界線的微腐蝕液。A method for revealing the boundary line of the Cu-Ni interface of a single metal coating, characterized in that the method uses a micro-corrosive liquid for revealing the boundary line of the Cu-Ni interface of a single metal coating as described in claim 1 or 2. 如請求項3所述之方法,其中,其包括以下步驟: (1)對Cu-Ni鍍層樣品進行切片,對切片後的樣品截面進行打磨、拋光; (2)在步驟(1)處理後的切片截面上加入該微腐蝕液進行微腐蝕,該微腐蝕包括質量體積百分比濃度為2.5%至15%的雙氧水溶液,而後在掃描電鏡下觀察到單質金屬鍍層Cu-Ni交界面的分界線。 The method as described in claim 3, wherein it comprises the following steps: (1) slicing the Cu-Ni coated sample, and grinding and polishing the cross section of the sliced sample; (2) adding the micro-corrosion liquid to the cross section of the slice treated in step (1) to perform micro-corrosion, wherein the micro-corrosion comprises a hydrogen peroxide aqueous solution with a mass volume percentage concentration of 2.5% to 15%, and then observing the boundary line of the Cu-Ni interface of the single metal coating under a scanning electron microscope. 如請求項4所述之方法,其中,步驟(1)該打磨為用砂紙打磨。The method as described in claim 4, wherein the polishing in step (1) is performed using sandpaper. 如請求項5所述之方法,其中,步驟(1)該打磨為用180目、800目、2000目和2400目砂紙依次打磨。The method as described in claim 5, wherein the polishing in step (1) is performed using 180 grit, 800 grit, 2000 grit and 2400 grit sandpaper in sequence. 如請求項4所述之方法,其中,步驟(1)該拋光為用氧化鋁拋光液進行拋光。The method as described in claim 4, wherein the polishing in step (1) is performed using an aluminum oxide polishing solution. 如請求項4所述之方法,其中,針對步驟(1)處理後的切片截面,以截面的面積計算,步驟(2)該雙氧水溶液的用量為1.0至1.5 mL/cm 2The method as claimed in claim 4, wherein, for the slice section treated in step (1), the amount of the hydrogen peroxide solution used in step (2) is 1.0 to 1.5 mL/cm 2 , calculated based on the area of the section. 如請求項4所述之方法,其中,步驟(2)該微腐蝕的時間為1秒至120分鐘。The method as described in claim 4, wherein the micro-corrosion time in step (2) is 1 second to 120 minutes. 如請求項9所述之方法,其中,步驟(2)該微腐蝕的時間為30秒至15分鐘。The method as described in claim 9, wherein the micro-corrosion time in step (2) is 30 seconds to 15 minutes. 如請求項10所述之方法,其中,步驟(2)該微腐蝕的時間為30秒至5分鐘。The method as described in claim 10, wherein the micro-corrosion time in step (2) is 30 seconds to 5 minutes. 一種如請求項1或2所述之用於顯現單質金屬鍍層Cu-Ni交界面分界線的微腐蝕液或者如請求項3至11中任一項所述之顯現單質金屬鍍層Cu-Ni交界面分界線的方法在印刷電路板質量控制中的應用。A micro-corrosive liquid for revealing the boundary line of the Cu-Ni interface of a single metal coating as described in claim 1 or 2, or a method for revealing the boundary line of the Cu-Ni interface of a single metal coating as described in any one of claims 3 to 11, used in the quality control of printed circuit boards.
TW112102427A 2022-11-23 2023-01-18 Micro-corrosive liquid and application thereof in presenting boundary line of interface of cu-ni elemental metal plating layer TW202421853A (en)

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