TW202421582A - Process for preparing alumina - Google Patents

Process for preparing alumina Download PDF

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TW202421582A
TW202421582A TW112132095A TW112132095A TW202421582A TW 202421582 A TW202421582 A TW 202421582A TW 112132095 A TW112132095 A TW 112132095A TW 112132095 A TW112132095 A TW 112132095A TW 202421582 A TW202421582 A TW 202421582A
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hydrochloric acid
stream
aluminum chloride
liquid
concentration
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TW112132095A
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Chinese (zh)
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羅伯特 樂馬恰
夏儂 黛
大衛 康萊希納
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澳大利亞商美鋁澳大利亞有限公司
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Abstract

The present disclosure relates generally to processes for preparing high purity alumina. More specifically, the present disclosure relates to processes for preparing high purity alumina utilising an acid regeneration system for recycling acid throughout the process.

Description

製備氧化鋁之方法Method for preparing aluminum oxide

本發明係關於一種製備氧化鋁之方法,尤其關於一種製備高純度氧化鋁之酸再生系統及方法。The present invention relates to a method for preparing aluminum oxide, and more particularly to an acid regeneration system and method for preparing high-purity aluminum oxide.

高純度氧化鋁用於廣泛的技術應用中,包括用作以下裝置中之關鍵材料:高強度放電燈、LED、用於精密光學器件之藍寶石玻璃、手持裝置、電視螢幕及錶盤、用於雷射器的合成寶石、航天及航空工業部件以及高強度陶瓷工具。其亦可用於鋰離子電池中,充當陽極電解槽與陰極電解槽之間的電絕緣體。高純度規格在後一種應用中係尤其必要的,因為任何顯著之雜質皆會促進該等電解槽之間非所要的電子傳遞。High-purity alumina is used in a wide range of technological applications, including as a key material in high-intensity discharge lamps, LEDs, sapphire glass for precision optics, handheld devices, television screens and watch faces, synthetic gemstones for lasers, aerospace and aviation industry components, and high-strength ceramic tools. It can also be used in lithium-ion batteries as an electrical insulator between the anode and cathode cells. High purity specifications are particularly necessary in the latter application, as any significant impurities will promote undesirable electron transfer between the cells.

高純度氧化鋁可直接由鋁金屬製成,方法係將高純度鋁金屬與酸反應以產生鋁鹽溶液,隨後將該溶液濃縮並對濃縮的鹽溶液進行噴霧焙燒以提供氧化鋁粉末。此方法係基於自高純度鋁原料製備高純度氧化鋁之前提,以降低雜質污染之可能性。High purity alumina can be made directly from aluminum metal by reacting high purity aluminum metal with an acid to produce an aluminum salt solution, which is then concentrated and the concentrated salt solution is spray-baked to provide alumina powder. This method is based on the premise of preparing high purity alumina from high purity aluminum raw materials to reduce the possibility of impurity contamination.

或者,氧化鋁可自其他原料製備,然而,由於原料中存在雜質,每種原料皆面臨著加工至合適純度水平之挑戰。Alternatively, alumina can be prepared from other raw materials, however, each raw material presents challenges in processing to the appropriate purity level due to the presence of impurities in the raw materials.

冶煉級或冶金級氧化鋁可藉由用拜耳法直接煅燒由鋁土礦生產之氫氧化鋁而製成。然而,此等煅燒等級之氧化鋁可能具有0.15-0.50%之蘇打含量,此對於上文所討論之應用而言過高。Smelting grade or metallurgical grade alumina can be made by direct calcining aluminum hydroxide produced from alumina ores using the Bayer process. However, these calcined grades of alumina may have a soda content of 0.15-0.50%, which is too high for the applications discussed above.

諸如高嶺土之含鋁黏土包含氧化鋁及以氧化矽形式存在之相對高的矽含量。在此類含鋁黏土浸出期間,諸如鐵、鈦、鈣、鈉、鉀、鎂及磷之多種雜質(它們在含鋁黏土中作為氧化物被發現)與鋁一起浸出至溶液中。Aluminous clays such as kaolin contain aluminum oxide and a relatively high silicon content in the form of silicon oxide. During leaching of such aluminous clays, various impurities such as iron, titanium, calcium, sodium, potassium, magnesium and phosphorus (which are found as oxides in aluminous clays) are leached into the solution along with the aluminum.

因此,有必要開發替代的更有效之方法以一致地自各種鋁來源製備高純度氧化鋁。Therefore, there is a need to develop alternative, more efficient methods to consistently prepare high purity alumina from a variety of aluminum sources.

本發明人已經進行了研究及開發以開發一種製備高純度氧化鋁之方法。特定而言,本發明人已發現通常在工業上被視為『廢料』流之製程鹽酸可以反常識地再生及再循環以消化氯化鋁六水合物固體以製備高純度氧化鋁。藉由使用酸而不是習知水再消化固體,本發明人在維持形成高純度氧化鋁的同時,意外地減少了方法之總試劑量及能耗。The inventors have conducted research and development to develop a method for producing high purity alumina. Specifically, the inventors have discovered that process hydrochloric acid, which is typically considered a "waste" stream in the industry, can be unconventionally regenerated and recycled to digest aluminum chloride hexahydrate solids to produce high purity alumina. By using acid rather than conventional water to re-digest the solids, the inventors unexpectedly reduced the overall reagent volume and energy consumption of the process while maintaining the formation of high purity alumina.

在一個態樣中,提供了一種自氯化鋁六水合物固體製備高純度氧化鋁之方法,該方法包含: a)在鹽酸中消化具有一或多種無機雜質之氯化鋁六水合物固體,以產生在溶液中包含氯化鋁及該等無機雜質之氯化鋁液體; b)在一或多個結晶階段中自該液體中沉澱氯化鋁六水合物固體,使得該等無機雜質中之至少一些保留在該液體中; c)自該液體中分離所沉澱之氯化鋁六水合物固體,以產生包含該等無機雜質之鹽酸製程流; d)處理所分離之氯化鋁六水合物固體以形成高純度氧化鋁; e)視情況降低該鹽酸製程流中之氯化氫濃度;及 f)自該鹽酸製程流中移除該等無機雜質中之至少一些,以產生鹽酸再循環流,該鹽酸再循環流之至少一部分被再循環以供用作步驟a)中之該鹽酸。 In one embodiment, a method for preparing high purity alumina from aluminum chloride hexahydrate solid is provided, the method comprising: a) digesting aluminum chloride hexahydrate solid having one or more inorganic impurities in hydrochloric acid to produce an aluminum chloride liquid containing aluminum chloride and the inorganic impurities in solution; b) precipitating aluminum chloride hexahydrate solid from the liquid in one or more crystallization stages such that at least some of the inorganic impurities remain in the liquid; c) separating the precipitated aluminum chloride hexahydrate solid from the liquid to produce a hydrochloric acid process stream containing the inorganic impurities; d) treating the separated aluminum chloride hexahydrate solid to form high purity alumina; e) reducing the concentration of hydrogen chloride in the hydrochloric acid process stream as appropriate; and f) removing at least some of the inorganic impurities from the hydrochloric acid process stream to produce a hydrochloric acid recycle stream, at least a portion of which is recycled for use as the hydrochloric acid in step a).

在另一態樣中,提供一種自含鋁材料製備高純度氧化鋁之方法,該方法包含: a)在鹽酸中消化含鋁材料以提供在溶液中包含氯化鋁及一或多種雜質之氯化鋁液體; b)在一或多個結晶階段中自該液體中沉澱氯化鋁六水合物固體,使得該等無機雜質中之至少一些保留在該液體中; c)自該液體中分離所沉澱之氯化鋁六水合物固體,以產生包含該等無機雜質之鹽酸製程流; d)處理所分離之氯化鋁六水合物固體以形成高純度氧化鋁; e)視情況降低該鹽酸製程流中之氯化氫濃度;及 f)自該鹽酸製程流中移除該等無機雜質中之至少一些,以產生鹽酸再循環流,該鹽酸再循環流之至少一部分被再循環以供用作步驟a)中用以消化該含鋁材料之該鹽酸。 In another embodiment, a method for preparing high purity alumina from an aluminum-containing material is provided, the method comprising: a) digesting the aluminum-containing material in hydrochloric acid to provide an aluminum chloride liquid comprising aluminum chloride and one or more impurities in solution; b) precipitating an aluminum chloride hexahydrate solid from the liquid in one or more crystallization stages such that at least some of the inorganic impurities remain in the liquid; c) separating the precipitated aluminum chloride hexahydrate solid from the liquid to produce a hydrochloric acid process stream containing the inorganic impurities; d) treating the separated aluminum chloride hexahydrate solid to form high purity alumina; e) optionally reducing the concentration of hydrogen chloride in the hydrochloric acid process stream; and f) removing at least some of the inorganic impurities from the hydrochloric acid process stream to produce a hydrochloric acid recycle stream, at least a portion of which is recycled for use as the hydrochloric acid for digesting the aluminum-containing material in step a).

在一個實施例中,該鹽酸製程流具有高於該流之共沸點之氯化氫濃度,且該方法包含步驟e)在移除該一或多種無機雜質之前降低該鹽酸製程流中之該氯化氫濃度。在另一實施例中,步驟e)包含在移除該一或多種無機雜質之前,在壓力下加熱過共沸鹽酸製程流以降低共沸點從而生成氯化氫氣體流且降低該鹽酸製程流中之氯化氫濃度。在一個實施例中,加熱該氫氯酸製程流會將該鹽酸製程流之該氯化氫濃度降低至該流之共沸點處或附近。在一個實施例中,藉由在步驟e)中加熱該鹽酸製程流生成之氯化氫氣體流之至少一部分被再循環以供用作步驟b)中之一或多個結晶階段中之氯化氫氣體的來源。In one embodiment, the hydrochloric acid process stream has a hydrogen chloride concentration above the azeotropic point of the stream, and the method includes step e) reducing the hydrogen chloride concentration in the hydrochloric acid process stream before removing the one or more inorganic impurities. In another embodiment, step e) includes heating the super-azeotropic hydrochloric acid process stream under pressure to reduce the azeotropic point to generate a hydrogen chloride gas stream and reduce the hydrogen chloride concentration in the hydrochloric acid process stream before removing the one or more inorganic impurities. In one embodiment, heating the hydrochloric acid process stream reduces the hydrogen chloride concentration of the hydrochloric acid process stream to at or near the azeotropic point of the stream. In one embodiment, at least a portion of the hydrogen chloride gas stream generated by heating the hydrochloric acid process stream in step e) is recycled for use as a source of hydrogen chloride gas in one or more crystallization stages in step b).

在一個實施例中,該鹽酸再循環流具有按該流之重量計介於約5 wt.%至約30 wt.%之間的氯化氫濃度。In one embodiment, the hydrochloric acid recycle stream has a hydrogen chloride concentration of between about 5 wt.% and about 30 wt.% based on the weight of the stream.

在另一態樣中,提供一種藉由根據本文中描述之任何態樣、實施例或實例之方法製備之高純度氧化鋁。In another aspect, a high purity alumina prepared by a method according to any aspect, embodiment or example described herein is provided.

在另一態樣中,提供一種自具有一或多種雜質之氯化鋁六水合物固體製備高純度氧化鋁之系統,該系統包含: 一或多個酸消化器,用於在鹽酸中消化氯化鋁六水合物固體以產生包含該等無機雜質之氯化鋁液體; 與各酸消化器相關聯之結晶容器,用於接收來自該酸消化器之該氯化鋁液體,及用於自該液體中沉澱氯化鋁六水合物固體,使得該等無機雜質中之至少一些保留在該液體中; 視情況存在之一或多個後續結晶容器,用於再結晶該等氯化鋁六水合物固體; 與該一或多個結晶容器相關聯之分離構件,用於自該液體中分離所形成之氯化鋁六水合物固體以產生包含該等無機雜質之鹽酸製程流; 視情況存在之汽提塔,用於接收來自該分離構件之該鹽酸製程流以生成氯化氫氣體流且降低該鹽酸製程流中之氯化氫濃度; 蒸餾構件,用於自該鹽酸製程流中移除該等無機雜質中之至少一些以產生鹽酸再循環流; 導管,用於將該鹽酸再循環流再循環至該一或多個酸消化器;及 熱處理構件,用於熱處理該等氯化鋁六水合物固體以提供高純度氧化鋁。 In another embodiment, a system for preparing high-purity alumina from aluminum chloride hexahydrate solid having one or more impurities is provided, the system comprising: One or more acid digesters for digesting aluminum chloride hexahydrate solid in hydrochloric acid to produce aluminum chloride liquid containing the inorganic impurities; A crystallization vessel associated with each acid digester for receiving the aluminum chloride liquid from the acid digester and for precipitating aluminum chloride hexahydrate solid from the liquid so that at least some of the inorganic impurities remain in the liquid; Optionally, one or more subsequent crystallization vessels for recrystallizing the aluminum chloride hexahydrate solids; a separation component associated with the one or more crystallization vessels for separating the aluminum chloride hexahydrate solid formed from the liquid to produce a hydrochloric acid process stream containing the inorganic impurities; a stripping column, if applicable, for receiving the hydrochloric acid process stream from the separation component to generate a hydrogen chloride gas stream and reduce the concentration of hydrogen chloride in the hydrochloric acid process stream; a distillation component for removing at least some of the inorganic impurities from the hydrochloric acid process stream to produce a hydrochloric acid recycle stream; a conduit for recirculating the hydrochloric acid recycle stream to the one or more acid digesters; and Heat treatment components for heat treating the aluminum chloride hexahydrate solid to provide high purity aluminum oxide.

在另一態樣中,提供一種自包含一或多種雜質之含鋁材料製備高純度氧化鋁之系統,該系統包含: 一或多個酸消化器,用於消化含鋁材料以提供包含該等無機雜質之氯化鋁液體; 結晶容器,用於接收來自該酸消化器之氯化鋁液體,及用於自該液體中沉澱氯化鋁六水合物固體,使得該等無機雜質中之至少一些保留在該液體中; 視情況存在之一或多個後續結晶容器,用於再結晶該等氯化鋁六水合物固體; 與該一或多個結晶容器相關聯之分離構件,用於自該液體中分離所形成之氯化鋁六水合物固體以產生包含該等無機雜質之鹽酸製程流; 視情況存在之汽提塔,用於接收來自該分離構件之該鹽酸製程流以生成氯化氫氣體流且降低該鹽酸製程流中之氯化氫濃度; 雜質移除單元,用於自該鹽酸製程流中移除該等無機雜質中之至少一些以產生鹽酸再循環流; 導管,用於將該鹽酸再循環流再循環至該一或多個酸消化器以消化該含鋁材料;及 熱處理構件,用於熱處理該等氯化鋁六水合物固體以提供高純度氧化鋁。 In another embodiment, a system for preparing high-purity alumina from an aluminum-containing material containing one or more impurities is provided, the system comprising: One or more acid digesters for digesting the aluminum-containing material to provide an aluminum chloride liquid containing the inorganic impurities; A crystallization vessel for receiving the aluminum chloride liquid from the acid digester and for precipitating aluminum chloride hexahydrate solid from the liquid so that at least some of the inorganic impurities remain in the liquid; Optionally, one or more subsequent crystallization vessels for recrystallizing the aluminum chloride hexahydrate solids; a separation member associated with the one or more crystallization vessels for separating the aluminum chloride hexahydrate solid formed from the liquid to produce a hydrochloric acid process stream containing the inorganic impurities; an optional stripping column for receiving the hydrochloric acid process stream from the separation member to generate a hydrogen chloride gas stream and reduce the concentration of hydrogen chloride in the hydrochloric acid process stream; an impurity removal unit for removing at least some of the inorganic impurities from the hydrochloric acid process stream to produce a hydrochloric acid recycle stream; a conduit for recirculating the hydrochloric acid recycle stream to the one or more acid digesters for digesting the aluminum-containing material; and Heat treatment components for heat treating the aluminum chloride hexahydrate solid to provide high purity aluminum oxide.

本文描述與本發明相關之其他態樣及實施例。將瞭解,除非另外具體說明,否則本文中描述之本發明之各實例、態樣及實施例在細節上作必要修改後適用於每一個其他實例、態樣或實施例。本發明之範疇不受本文中所描述之特定實例的限制,該等特定實例僅旨在用於示例之目的。功能等效之產品、組合物及方法顯然在本文所述之揭示內容之範疇內。Other aspects and embodiments related to the present invention are described herein. It will be understood that each example, aspect, and embodiment of the present invention described herein applies mutatis mutandis to each other example, aspect, or embodiment unless otherwise specifically stated. The scope of the present invention is not limited to the specific examples described herein, which are intended for illustrative purposes only. Functionally equivalent products, compositions, and methods are clearly within the scope of the disclosure described herein.

本發明描述以下各種非限制性實施例,它們係關於為了開發製備高純度氧化鋁之方法而進行之研究。 通用術語 The present invention is described below with various non-limiting examples relating to research conducted to develop a method for preparing high purity alumina.

在以下描述中,對附圖進行參考,該等附圖形成以下描述之一部分且以說明的方式繪示若干實施例。應理解,可使用其他實施例且可在不背離本發明範疇之情況下進行結構變更。In the following description, reference is made to the accompanying drawings, which form a part of the following description and show several embodiments by way of illustration. It should be understood that other embodiments may be used and structural changes may be made without departing from the scope of the invention.

關於本文提供之定義,除非另有說明或自上下文隱含,否則所定義之術語及片語包括所提供之含義。除非另有明確說明或由上下文顯而易見,否則下文中之術語及片語不排除熟習此項技術者已經獲得之該術語或片語之含義。提供該等定義以輔助描述特定實施例,且不意欲限制所主張之發明,因為本發明之範疇僅藉由申請專利範圍限制。此外,除非上下文另外需要,否則單數術語應包括複數且複數術語應包括單數。With respect to the definitions provided herein, unless otherwise stated or implied from the context, the defined terms and phrases include the meanings provided. Unless otherwise expressly stated or apparent from the context, the terms and phrases used below do not exclude the meanings that one skilled in the art would have acquired for the term or phrase. These definitions are provided to aid in describing particular embodiments and are not intended to limit the claimed invention, as the scope of the invention is limited only by the scope of the patent application. In addition, unless the context requires otherwise, a singular term shall include the plural and a plural term shall include the singular.

本文所論述及/或參考之所有出版物均以全文引用的方式併入本文中。All publications discussed and/or referenced herein are incorporated by reference in their entirety.

對本說明書中已經包括之文件、法案、材料、裝置、物品或其類似物之任何論述僅出於為本發明提供背景之目的。不應將其視為承認任何或所有此等事項形成先前技術基礎之一部分或係本發明相關領域中的公共常識,僅僅因為它們在本申請案之各技術方案之優先權日期之前就已存在。Any discussion of documents, acts, materials, devices, articles or the like included in this specification is for the sole purpose of providing background for the present invention. It should not be regarded as an admission that any or all of these matters form part of the prior art basis or are common knowledge in the field relevant to the present invention simply because they existed before the priority date of the various technical solutions of this application.

在本發明通篇中,除非另外具體陳述或上下文另外需要,否則提及單一步驟、物質之組合物、步驟之群或物質之組合物之群將視為涵蓋彼等步驟、物質之組合物、步驟之群或物質之組合物之群中的一者及複數者(亦即一或多者)。因此,如本文所用,除非上下文另外明確指出,否則單數形式「一(a)」、「一(an)」及「該(the)」包括複數形式。舉例而言,提及「一(a)」包括單個以及兩個或更多個;提及「一(an)」包括單個以及兩個或更多個;提及「該(the)」包括單個以及兩個或更多個,諸如此類。Throughout this disclosure, references to a single step, composition of matter, group of steps, or group of compositions of matter are to be construed to cover both one and plural (i.e., one or more) of such steps, composition of matter, group of steps, or group of compositions of matter, unless specifically stated otherwise or the context requires otherwise. Thus, as used herein, the singular forms "a," "an," and "the" include the plural forms unless the context clearly dictates otherwise. For example, reference to "a" includes one as well as two or more; reference to "an" includes one as well as two or more; reference to "the" includes one as well as two or more, and so forth.

熟習此項技術者將瞭解,本文中之揭示內容易於進行除具體描述之彼等之外的變化及修改。應理解,本發明包括所有此類變化及修改。本發明亦包括本說明書中單獨或共同提及或指示之所有實例、步驟、特徵、方法、組合物、塗層、製程及經塗佈基板,以及該等步驟或特徵之任何及所有組合或任何兩者或更多者。Those skilled in the art will appreciate that the disclosure herein is susceptible to variations and modifications other than those specifically described. It should be understood that the present invention includes all such variations and modifications. The present invention also includes all examples, steps, features, methods, compositions, coatings, processes and coated substrates mentioned or indicated in this specification, either individually or collectively, and any and all combinations or any two or more of such steps or features.

術語「及/或」,例如「X及/或Y」應理解為意謂「X及Y」或「X或Y」且應被視為為兩種含義或任一含義提供明確支持。The term "and/or", such as "X and/or Y", should be understood to mean "X and Y" or "X or Y" and should be regarded as providing clear support for both or either meanings.

除非另外指明,否則術語「第一」、「第二」等在本文中僅用作標記,且不意欲在此等術語所指之項目上強加序數、位置或階層要求。此外,提及「第二」項並不要求或排除編號較低之項(如「第一」項)及/或編號較高之項(如「第三」項)的存在。Unless otherwise indicated, the terms "first," "second," etc. are used herein merely as labels and are not intended to impose ordinal, positional, or hierarchical requirements on the items to which such terms refer. Furthermore, reference to a "second" item does not require or preclude the existence of lower-numbered items (such as a "first" item) and/or higher-numbered items (such as a "third" item).

如本文中所使用,片語「……中之至少一者」在與項目清單一起使用時,意謂可使用所列舉項目中之一或多者之不同組合且可能僅需要清單之項目中之一者。該項目可為特定物件、事物或類別。換言之,「……中之至少一者」意謂可使用清單中之任何項目組合或項目數目,但並非清單中的所有項目皆係必需的。舉例而言,「項目A、項目B及項目C中之至少一者」可意謂項目A;項目A及項目B;項目B;項目A、項目B及項目C;或項目B及項目C。在一些情況下,「項目A、項目B及項目C中之至少一者」可意謂(例如但不限於)兩個項目A、一個項目B以及十個項目C;四個項目B及七個項目C;或一些其他適合之組合。As used herein, the phrase "at least one of...", when used with a list of items, means that different combinations of one or more of the listed items may be used and that only one of the items in the list may be required. The item may be a specific object, thing, or category. In other words, "at least one of..." means that any combination or number of items in the list may be used, but not all items in the list are required. For example, "at least one of item A, item B, and item C" may mean item A; item A and item B; item B; item A, item B, and item C; or item B and item C. In some cases, "at least one of item A, item B, and item C" may mean, for example but not limited to, two items A, one item B, and ten items C; four items B and seven items C; or some other suitable combination.

如本文所使用,除非相反陳述,否則術語「約」通常係指指定值之+/-10%,例如+/-5%。As used herein, unless stated to the contrary, the term "about" generally refers to +/- 10%, eg, +/- 5%, of a specified value.

應瞭解,出於明晰之目的而在本文的單獨實施例之上下文中描述之某些特徵亦可以組合形式提供於單一實施例中。相反,為了簡潔起見,在單個實施例之上下文中描述之各種特徵亦可單獨地或以任何子組合提供。It should be understood that certain features described in the context of separate embodiments herein for the purpose of clarity may also be provided in combination in a single embodiment. Conversely, various features described in the context of a single embodiment for the sake of brevity may also be provided separately or in any sub-combination.

貫穿本說明書,本發明之各種態樣及組件可以範圍格式呈現。包括範圍格式係出於方便起見,而不應被解釋為對本發明範疇之不靈活限制。因此,除非特定地指示,否則範圍之描述應被視為已具體揭示所有可能之子範圍以及彼範圍內之個別數值。舉例而言,除非需要整數或上下文隱含整數,否則諸如自1至5之範圍的描述應被視為具有具體揭示之子範圍,諸如自1至3、自1至4、自1至5、自2至4、自2至5、自3至5等,以及所述範圍內之個別及部分數字,例如1、2、3、4、4.5及5。不管所揭示範圍之廣度如何,此皆適用。在需要特定值時,將在本說明書中指示出來。Throughout this specification, various aspects and components of the present invention may be presented in a range format. The inclusion of a range format is for convenience and should not be construed as an inflexible limitation on the scope of the invention. Therefore, unless specifically indicated, the description of a range should be considered to have specifically disclosed all possible sub-ranges and individual numerical values within that range. For example, unless an integer is required or implied by the context, a description of a range such as from 1 to 5 should be considered to have specifically disclosed sub-ranges such as from 1 to 3, from 1 to 4, from 1 to 5, from 2 to 4, from 2 to 5, from 3 to 5, etc., as well as individual and partial numbers within the range, such as 1, 2, 3, 4, 4.5, and 5. This applies regardless of the breadth of the disclosed range. Where specific values are required, they will be indicated in this specification.

貫穿本說明書,詞語「包含(comprise)」或諸如「包含(comprises)」或「包含(comprising)」之變型應理解為暗示包括所陳述之要素、整數或步驟、或要素、整數或步驟之群,但不排除任何其他要素、整數或步驟、或要素、整數或步驟之群。片語「由……組成」意思是所列舉之要素且無其他要素。 特定術語 Throughout this specification, the word "comprise" or variations such as "comprises" or "comprising" should be understood to imply the inclusion of stated elements, integers or steps, or groups of elements, integers or steps, but not the exclusion of any other elements, integers or steps, or groups of elements, integers or steps. The phrase "consisting of" means the listed elements and no other elements. Specific terms

本文所使用之術語「氧化鋁」係指氧化鋁(Al 2O 3),特定而言,結晶多晶相α、γ、θ及κ。高純度氧化鋁係指純度為約99.99%,例如純度為>99.99% (4N)或純度為>99.999% (5N)之Al 2O 3,其適合用作包括但不限於以下應用之各種應用中之關鍵材料:高強度放電燈、LED、用於精密光學器件之藍寶石玻璃、手持裝置、電視螢幕及錶盤、用於雷射器的合成寶石、航天及航空工業部件、高強度陶瓷工具,或鋰離子電池中之電絕緣體。 The term " alumina " as used herein refers to aluminum oxide ( Al2O3 ), specifically, the crystalline polymorphs α, γ, θ and κ. High purity alumina refers to Al2O3 with a purity of about 99.99%, such as purity >99.99% ( 4N ) or purity >99.999% (5N), which is suitable for use as a key material in a variety of applications including but not limited to the following applications: high intensity discharge lamps, LEDs, sapphire glass for precision optical devices, handheld devices, TV screens and dials, synthetic gemstones for lasers, aerospace and aviation industry components, high strength ceramic tools, or electrical insulators in lithium ion batteries.

如本文所使用之術語『含鋁材料』係指具有大於10%含量(wt%當量Al 2O 3)之任何材料。此類含鋁材料之實例包括但不限於酸溶性氫氧化鋁化合物,諸如三水鋁石(γ-Al(OH) 3)、三羥鋁石(α-Al(OH) 3)、諾三水鋁石、三斜三水鋁石或絲鈉鋁石(NaAl(OH) 2.CO 3);酸溶性氧(氫氧)化鋁化合物,諸如一水硬鋁石(α-AlO(OH))或水鋁礦(γ-AlO(OH))、六水鋁酸三鈣(TCA);或Al取代羥基氧化鐵,諸如含鋁針鐵礦(Fe(Al)OOH)。該術語涵蓋天然存在之材料,例如含鋁黏土,諸如高嶺土或鋁土礦,或方法之產物或副產物。作為一實例,含鋁材料可為源於拜耳法之氧化鋁生產的副產物,諸如煅燒爐粉塵、DSP及赤泥,其鋁含量通常> 10 wt% (當量Al 2O 3)。 As used herein, the term "aluminum-containing material" refers to any material having a content (wt% equivalent Al 2 O 3 ) greater than 10%. Examples of such aluminum-containing materials include, but are not limited to, acid-soluble aluminum hydroxide compounds such as aluminite (γ-Al(OH) 3 ), trihydroxyaluminite (α-Al(OH) 3 ), norite, triclinic aluminite or natrium aluminite (NaAl(OH) 2 .CO 3 ); acid-soluble aluminum oxide (hydrogen) compounds such as alumina (α-AlO(OH)) or aluminite (γ-AlO(OH)), tricalcium aluminate hexahydrate (TCA); or Al-substituted hydroxy iron oxides such as aluminum-containing goethite (Fe(Al)OOH). The term covers naturally occurring materials, for example aluminium-containing clays such as kaolin or alumina ores, or products or by-products of a process. As an example, aluminium-containing materials may be by-products of alumina production from the Bayer process, such as calciner dust, DSP and red mud, which typically have an aluminium content of > 10 wt% (equivalent Al2O3 ) .

如本文所使用,結晶係指自液體溶液中沉澱出固體材料(沉澱物)。固體材料之沉澱係藉由將材料轉化為不溶形式及/或改變溶液之性質以降低材料溶解度而發生的。As used herein, crystallization refers to the precipitation of solid material (precipitate) from a liquid solution. Precipitation of solid material occurs by converting the material to an insoluble form and/or changing the properties of the solution to reduce the solubility of the material.

在氧化鋁生產中氫氧化鋁之煅燒產生細顆粒,其可以作為煅燒爐粉塵排放。藉由使用各種收集技術,諸如在煅燒爐堆上使用靜電除塵器,可將煅燒爐粉塵排放減輕及控制至低水平。 ESP粉塵係由靜電除塵器捕獲之細顆粒殘留物。煅燒爐粉塵顆粒可包含氧化鋁以及各種(氧基)氫氧化鋁及氫氧化鋁化合物,此等化合物被吸留蘇打及表面蘇打污染。The calcination of alumina in alumina production produces fine particles which can be emitted as calciner dust. Calciner dust emissions can be mitigated and controlled to low levels by using various collection techniques, such as using electrostatic precipitators on the calciner pile. ESP dust is the fine particle residue captured by the electrostatic precipitator. Calciner dust particles can contain alumina as well as various (oxy)alumina hydroxides and alumina compounds, which are contaminated with occluded and surface soda.

DSP係集合術語,用於描述幾種在拜耳法內沉澱之酸溶性含二氧化矽化合物。DSP主要為拜耳方鈉石,通式為[NaAlSiO 4] 6.mNa 2X.nH 2O,其中「mNa 2X」表示沸石籠狀結構內間夾之鈉鹽,且X可為碳酸根(CO 3 2 -)、硫酸根(SO 4 2 -)、氯離子(Cl -)、鋁酸根(AlO 4) -)。在消化迴路之前的拜耳法『脫矽』迴路中且亦在消化迴路自身中形成DSP。DSP最終成為鋁土礦渣(例如赤泥)的一部分。另外,熟習此項技術者應瞭解,儘管在脫矽迴路中降低了二氧化矽含量,但在整個拜耳法中,二氧化矽可能在溶液中過飽和。因此,DSP亦可能在儲罐、管道及加熱器之內表面作為積垢形成。 DSP is a collective term used to describe several acid-soluble silica-containing compounds that precipitate in the Bayer process. DSP is primarily Bayer sodium ore, with the general formula [NaAlSiO 4 ] 6 .mNa 2 X.nH 2 O, where "mNa 2 X" represents the sodium salts intercalated within the cage structure of the zeolite, and X can be carbonate (CO 3 2 - ), sulfate (SO 4 2 - ), chloride (Cl - ), aluminate (AlO 4 ) - ). DSP is formed in the Bayer process "desiliconization" loop prior to the digestion loop and also in the digestion loop itself. DSP ultimately becomes part of alumina slag (e.g. red mud). In addition, those skilled in the art will appreciate that, although the silica content is reduced in the desiliconization loop, silica may be supersaturated in solution throughout the Bayer process. Therefore, DSP may also form as deposits on the inner surfaces of tanks, pipes and heaters.

如本文所使用之術語『蘇打』及『蘇打含量』係指Na 2O及材料中存在之Na 2O量,以占材料總重量之重量百分比(wt%)報告。將瞭解,高純度氧化鋁之蘇打含量必須低。對『表面蘇打』之提及係與顆粒表面上吸附之Na 2O的存在有關,而對『吸留蘇打』之提及係與包封在另一種材料中之蘇打有關。 As used herein, the terms "soda" and "soda content" refer to Na2O and the amount of Na2O present in a material, reported as a weight percent (wt%) of the total weight of the material. It will be appreciated that the soda content of high purity alumina must be low. References to "surface soda" relate to the presence of Na2O adsorbed on the surface of the particles, while references to "occluded soda" relate to soda encapsulated in another material.

煅燒係一種熱處理方法,其中固體在無空氣或氧氣存在下或在受控空氣或氧氣供應下被加熱,通常導致固體分解以移除二氧化碳、結晶水或揮發物,或實現相變,諸如將氫氧化鋁轉化為氧化鋁。此類熱處理方法可以在諸如豎爐、迴轉窯、複床爐及流體化床反應器之爐或反應器中進行。Calcination is a heat treatment process in which a solid is heated in the absence of air or oxygen or in the presence of a controlled supply of air or oxygen, usually resulting in the decomposition of the solid to remove carbon dioxide, water of crystallization or volatiles, or to effect a phase change, such as the conversion of aluminum hydroxide to aluminum oxide. Such heat treatment processes can be carried out in furnaces or reactors such as vertical furnaces, rotary kilns, multi-bed furnaces and fluidized bed reactors.

術語『常壓沸點』用以指液體或漿料在大氣壓下沸騰之溫度。將瞭解,沸點亦可以根據液體或漿料中之各種溶質及其濃度而變化。大氣壓(亦稱為環境壓力)被視為約1巴(例如1.01325巴)。The term 'normal boiling point' is used to refer to the temperature at which a liquid or slurry boils under atmospheric pressure. It will be appreciated that the boiling point may also vary depending on the various solutes and their concentrations in the liquid or slurry. Atmospheric pressure (also known as ambient pressure) is considered to be approximately 1 bar (e.g. 1.01325 bar).

術語『wt.%』係指本文所述之流或組合物中之物質以重量計之百分比含量(亦即w/w)。 共沸物及共沸點 The term "wt.%" refers to the percentage content of a substance in a stream or composition described herein by weight (ie, w/w). Azeotropes and Azeotropic Points

如本文所使用之『共沸物』係指包含兩種或更多種液體的鹽酸/水混合物,該等液體之比例不能藉由簡單蒸餾而變化或改變。發生此現象係由於當共沸物被煮沸時,蒸汽之成分比例與未煮沸之混合物相同。發生此現象時之濃度通常被稱為混合物之「共沸點」。舉例而言,參考關於鹽酸/水混合物之圖4,當混合物中之氯化氫濃度處於或接近約19-20 wt.%時形成大氣壓下之共沸物。然而,如本文所描述,此濃度可視壓力而增加或減小。As used herein, an "azeotrope" refers to a hydrochloric acid/water mixture containing two or more liquids in proportions that cannot be varied or changed by simple distillation. This occurs because when the azeotrope is boiled, the composition of the vapor is in the same proportions as the unboiled mixture. The concentration at which this occurs is often referred to as the "azeotropic point" of the mixture. For example, referring to FIG. 4 for a hydrochloric acid/water mixture, an azeotrope at atmospheric pressure is formed when the concentration of hydrogen chloride in the mixture is at or near about 19-20 wt.%. However, as described herein, this concentration may increase or decrease depending on the pressure.

在實踐中,在給定壓力下煮沸氯化氫濃度低於共沸點之鹽酸/水混合物會致使在沸騰溶液之組合物在彼壓力下達到共沸點之前,蒸發之水比蒸發之鹽酸多。另一方面,在給定壓力下煮沸氯化氫濃度高於共沸點之鹽酸/水混合物會致使在彼壓力下達到共沸點之前,蒸發之氯化氫氣體比蒸發之水多。In practice, boiling a hydrochloric acid/water mixture at a given pressure in which the concentration of hydrogen chloride is below the azeotropic point will result in more water evaporating than hydrochloric acid evaporating before the composition of the boiling solution reaches the azeotropic point at that pressure. On the other hand, boiling a hydrochloric acid/water mixture at a given pressure in which the concentration of hydrogen chloride is above the azeotropic point will result in more hydrogen chloride gas evaporating than water evaporating before the azeotropic point is reached at that pressure.

混合物之共沸點可視壓力而變化。舉例而言,關於本文中描述之鹽酸流,在較高壓力(亦即,高於大氣壓之壓力)下,該流之共沸點降低,且在較低壓力(亦即,低於大氣壓之壓力)下,該流之共沸點升高。一旦處於或接近共沸點,混合物中氯化氫之濃度就不能藉由簡單蒸餾而變化或改變。共沸點將被理解為與流或混合物之壓力及/或溫度有關。 製備高純度氧化鋁之酸再生方法及系統 The azeotropic point of a mixture may vary depending on the pressure. For example, with respect to the hydrochloric acid stream described herein, at higher pressures (i.e., pressures above atmospheric pressure), the azeotropic point of the stream decreases, and at lower pressures (i.e., pressures below atmospheric pressure), the azeotropic point of the stream increases. Once at or near the azeotropic point, the concentration of hydrogen chloride in the mixture cannot be varied or changed by simple distillation. The azeotropic point will be understood to be related to the pressure and/or temperature of the stream or mixture. Acid Regeneration Method and System for Preparing High Purity Alumina

本發明人已經開發了一種製備高純度氧化鋁之方法。特定而言,本發明人已經開發了一種方法,該方法再循環通常在工業上被視為『廢料』之鹽酸,以用於在結晶之前消化氯化鋁六水合物固體及/或含鋁材料,以製備高純度氧化鋁。根據本文所描述之一些實施例或實例,藉由將此類『廢』鹽酸作為製備高純度氧化鋁之液體再循環至方法中,本發明人在保持形成高純度氧化鋁的同時,意外地減少了該方法之總試劑量及能耗。除了將鹽酸作為液體再循環之外,本文所述之方法亦可將一部分酸再生為氯化氫氣體,用於自經消化之氯化鋁液體中結晶氯化鋁六水合物固體。The present inventors have developed a method for preparing high purity alumina. Specifically, the present inventors have developed a method that recycles hydrochloric acid, which is usually regarded as "waste" in the industry, for use in digesting aluminum chloride hexahydrate solids and/or aluminum-containing materials prior to crystallization to prepare high purity alumina. According to some embodiments or examples described herein, by recycling such "waste" hydrochloric acid into the process as a liquid for preparing high purity alumina, the present inventors unexpectedly reduced the total reagent amount and energy consumption of the process while maintaining the formation of high purity alumina. In addition to recycling the hydrochloric acid as a liquid, the process described herein also allows a portion of the acid to be regenerated as hydrogen chloride gas for use in crystallizing aluminum chloride hexahydrate solid from the digested aluminum chloride liquid.

參考圖1至圖3,提供一種用於製備高純度氧化鋁之系統。該系統包括:一或多個酸消化器,用於在鹽酸中消化氯化鋁六水合物固體/含鋁材料以產生氯化鋁液體;與各酸消化器相關聯之結晶容器,用於接收來自酸消化器之氯化鋁液體及用於自液體中沉澱氯化鋁六水合物固體,使得該等無機雜質中之至少一些保留在液體中;與結晶容器相關聯之分離構件,用於自液體中分離所形成之氯化鋁六水合物固體以產生包含無機雜質之鹽酸製程流;視情況存在之HCl再生設備(例如,汽提塔/蒸餾器),用於接收來自分離構件之鹽酸製程流以生成氯化氫氣體流且降低鹽酸製程流中之氯化氫濃度;雜質移除單元,用於自鹽酸製程流中移除該等無機雜質中之至少一些以產生鹽酸再循環流;導管,用於將鹽酸再循環流再循環至一或多個酸消化器(例如用於消化氯化鋁六水合物固體及/或含鋁材料);及熱處理構件,用於熱處理氯化鋁六水合物固體以提供高純度氧化鋁。 高純度氧化鋁 Referring to FIGS. 1 to 3 , a system for preparing high purity alumina is provided. The system includes: one or more acid digesters for digesting aluminum chloride hexahydrate solid/aluminum-containing material in hydrochloric acid to produce aluminum chloride liquid; a crystallization vessel associated with each acid digester for receiving aluminum chloride liquid from the acid digester and for precipitating aluminum chloride hexahydrate solid from the liquid so that at least some of the inorganic impurities remain in the liquid; a separation member associated with the crystallization vessel for separating the formed aluminum chloride hexahydrate solid from the liquid to produce a hydrochloric acid process stream containing inorganic impurities; and optionally, HCl. a regeneration apparatus (e.g., a stripper/distiller) for receiving a hydrochloric acid process stream from a separation component to generate a hydrochloric acid gas stream and to reduce the concentration of hydrochloric acid in the hydrochloric acid process stream; an impurity removal unit for removing at least some of the inorganic impurities from the hydrochloric acid process stream to produce a hydrochloric acid recycle stream; a conduit for recirculating the hydrochloric acid recycle stream to one or more acid digesters (e.g., for digesting aluminum chloride hexahydrate solids and/or aluminum-containing materials); and a heat treatment component for heat treating the aluminum chloride hexahydrate solids to provide high purity alumina. High Purity Alumina

本發明之方法產生高純度氧化鋁。如本文所描述,高純度氧化鋁可自各種含鋁材料(例如含鋁黏土,諸如高嶺土)或諸如拜耳法之方法之產物或副產物製備。然而,許多此等材料相對於最終所需產品之高純度臨限值(約99.99%)具有較高的無機雜質含量。移除或控制無機雜質以達到高純度臨限值在技術上係困難的。The methods of the present invention produce high purity alumina. As described herein, high purity alumina can be prepared from various aluminum-containing materials (e.g., aluminum-containing clays such as kaolin) or products or by-products of processes such as the Bayer process. However, many of these materials have high levels of inorganic impurities relative to the high purity threshold (about 99.99%) of the final desired product. Removing or controlling inorganic impurities to achieve the high purity threshold is technically difficult.

整個所描述方法中之雜質類型及水平將取決於許多因素,主要取決於含鋁材料之來源,不過將瞭解,儘管所描述之方法步驟旨在在各步驟提供雜質水平之降低,但在高純度氧化鋁生產中採用之各個方法步驟期間可能會引入新的無機雜質。The types and levels of impurities throughout the described process will depend on many factors, primarily on the source of the aluminum-containing material, but it will be appreciated that, although the process steps described are intended to provide a reduction in impurity levels at each step, new inorganic impurities may be introduced during the various process steps employed in the production of high purity alumina.

術語無機『雜質(impurity)』或『雜質(impurities)』旨在涵蓋存在之任何非鋁化合物。特定而言,關於最終高純度氧化鋁產品,無機『雜質(impurity)』或『雜質(impurities)』表示非氧化鋁(Al 2O 3)之任何材料。高純度氧化鋁之等級係基於最終產品中無機雜質(不考慮組成)之總水平,純度>99.99% Al 2O 3(亦即,小於0.01%之無機雜質)之產品被分級為「4N」,且純度>99.999% Al 2O 3(亦即,小於0.001%之無機雜質)之產品被分級為「5N」。 The term inorganic "impurity" or "impurities" is intended to cover any non-aluminum compounds that are present. Specifically, with respect to the final high purity alumina product, inorganic "impurity" or "impurities" means any material other than aluminum oxide (Al 2 O 3 ). The grade of high purity alumina is based on the total level of inorganic impurities (regardless of composition) in the final product, with products with purity >99.99% Al 2 O 3 (i.e., less than 0.01% inorganic impurities) being graded "4N" and products with purity >99.999% Al 2 O 3 (i.e., less than 0.001% inorganic impurities) being graded "5N".

藉助於非限制性實例,至少一種無機雜質可為鈣(Ca)、鐵(Fe)、鉀(K)、鎂(Mg)、鈉(Na)、磷(P)、矽(Si)、鈦(Ti)、銅(Cu)、鉬(Mo)、鉻(Cr)、鎵(Ga)、鋅(Zn)或其組合。在一個實例中,雜質係由鈣(Ca)、鐵(Fe)、鉀(K)、鎂(Mg)、鈉(Na)、磷(P)、矽(Si)、鈦(Ti)、銅(Cu)、鉬(Mo)、鉻(Cr)、鎵(Ga)及鋅(Zn)中的一或多者提供。無機雜質可以無機鹽(例如氯化物鹽(如NaCl))之形式存在。By way of non-limiting example, at least one inorganic impurity may be calcium (Ca), iron (Fe), potassium (K), magnesium (Mg), sodium (Na), phosphorus (P), silicon (Si), titanium (Ti), copper (Cu), molybdenum (Mo), chromium (Cr), gallium (Ga), zinc (Zn), or a combination thereof. In one example, the impurity is provided by one or more of calcium (Ca), iron (Fe), potassium (K), magnesium (Mg), sodium (Na), phosphorus (P), silicon (Si), titanium (Ti), copper (Cu), molybdenum (Mo), chromium (Cr), gallium (Ga), and zinc (Zn). The inorganic impurity may be present in the form of an inorganic salt, such as a chloride salt (e.g., NaCl).

最終高純度氧化鋁產品中之個別無機雜質或總無機雜質可小於約1000 ppm、500 ppm、400 ppm、300 ppm、200 ppm、100 ppm、90 ppm、80 ppm、70 ppm、60 ppm、50 ppm、40 ppm、30 ppm、20 ppm、10 ppm或5 ppm。Individual or total inorganic impurities in the final high purity alumina product may be less than about 1000 ppm, 500 ppm, 400 ppm, 300 ppm, 200 ppm, 100 ppm, 90 ppm, 80 ppm, 70 ppm, 60 ppm, 50 ppm, 40 ppm, 30 ppm, 20 ppm, 10 ppm or 5 ppm.

在一個實例中,存在於高純度氧化鋁中之任何一種雜質之無機雜質量小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在一實例中,雜質鉀(K)小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,雜質磷(P)小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,雜質鈉(Na)小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,雜質矽(Si)小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,雜質鈣(Ca)小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,雜質鐵(Fe)小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,雜質鎂(Mg)小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,雜質鈦(Ti)小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,雜質銅(Cu)小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,雜質鉬(Mo)小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,雜質鉻(Cr)小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,雜質鎵(Ga)小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一個實例中,雜質鋅(Zn)小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。 製備高純度氧化鋁之方法 In one example, the amount of inorganic impurities of any one impurity present in the high purity alumina is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In one example, the impurity potassium (K) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity phosphorus (P) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity sodium (Na) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity silicon (Si) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity calcium (Ca) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity iron (Fe) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity magnesium (Mg) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity titanium (Ti) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity copper (Cu) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity molybdenum (Mo) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity chromium (Cr) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity gallium (Ga) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity zinc (Zn) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. Method for preparing high purity alumina

如將在本文中描述,通常在工業上被視為廢料之鹽酸之再循環及再生關閉酸環路,藉此減少總體酸消耗,從而創建有可能降低資本及/或操作成本之最佳化環路。As will be described herein, recycling and regeneration of hydrochloric acid, which is typically considered a waste in the industry, closes the acid loop, thereby reducing overall acid consumption, thereby creating an optimized loop with the potential to reduce capital and/or operating costs.

在一個態樣或實施例中,提供一種自氯化鋁六水合物固體製備高純度氧化鋁之方法,該方法包含: a)在鹽酸中消化具有一或多種無機雜質之氯化鋁六水合物固體,以產生在溶液中包含氯化鋁及該等無機雜質之氯化鋁液體; b)在一或多個結晶階段中,藉由向氯化鋁液體中噴灑氯化氫氣體,自液體中沉澱氯化鋁六水合物固體,使得該等無機雜質中之至少一些保留在該液體中; c)自液體中分離所沉澱之氯化鋁六水合物固體,以產生包含該等無機雜質之鹽酸製程流; d)處理所分離之氯化鋁六水合物固體以形成高純度氧化鋁; e)降低鹽酸製程流中之氯化氫濃度;及 f)自鹽酸製程流中移除該等無機雜質中之至少一些,以產生鹽酸再循環流,該鹽酸再循環流之至少一部分被再循環以供用作步驟a)中之鹽酸。 In one aspect or embodiment, a method for preparing high-purity alumina from aluminum chloride hexahydrate solid is provided, the method comprising: a) digesting aluminum chloride hexahydrate solid having one or more inorganic impurities in hydrochloric acid to produce an aluminum chloride liquid containing aluminum chloride and the inorganic impurities in solution; b) precipitating aluminum chloride hexahydrate solid from the liquid by spraying hydrogen chloride gas into the aluminum chloride liquid in one or more crystallization stages, so that at least some of the inorganic impurities remain in the liquid; c) separating the precipitated aluminum chloride hexahydrate solid from the liquid to produce a hydrochloric acid process stream containing the inorganic impurities; d) treating the separated aluminum chloride hexahydrate solid to form high purity alumina; e) reducing the concentration of hydrogen chloride in the hydrochloric acid process stream; and f) removing at least some of the inorganic impurities from the hydrochloric acid process stream to produce a hydrochloric acid recycle stream, at least a portion of which is recycled for use as hydrochloric acid in step a).

在一個實施例中,自步驟c)獲得之鹽酸製程流具有高於該流之共沸點之氯化氫濃度。In one embodiment, the hydrochloric acid process stream obtained from step c) has a hydrogen chloride concentration above the azeotropic point of the stream.

在一個實施例中,在步驟e)中降低鹽酸製程流中之氯化氫濃度包含加熱鹽酸製程流以生成氯化氫氣體流且降低鹽酸製程流中之氯化氫濃度。In one embodiment, reducing the concentration of hydrogen chloride in the hydrochloric acid process stream in step e) includes heating the hydrochloric acid process stream to generate a hydrogen chloride gas stream and reducing the concentration of hydrogen chloride in the hydrochloric acid process stream.

在一個實施例中,在步驟e)中降低鹽酸製程流中之氯化氫濃度包含在壓力下加熱鹽酸製程流以生成氯化氫氣體流且降低鹽酸製程流中之氯化氫濃度。In one embodiment, reducing the concentration of hydrogen chloride in the hydrochloric acid process stream in step e) comprises heating the hydrochloric acid process stream under pressure to generate a hydrogen chloride gas stream and reducing the concentration of hydrogen chloride in the hydrochloric acid process stream.

在一個實施例中,在步驟e)中,將鹽酸製程流中之鹽酸濃度降低至該流之共沸點處或附近。在另一實施例中,步驟f)包含在該流之共沸點處或附近蒸餾鹽酸製程流,以自鹽酸製程流中移除該等無機雜質中之至少一些以產生鹽酸再循環流,該鹽酸再循環流之至少一部分被再循環以供用作步驟a)中之鹽酸。In one embodiment, in step e), the hydrochloric acid concentration in the hydrochloric acid process stream is reduced to a concentration at or near the azeotropic point of the stream. In another embodiment, step f) comprises distilling the hydrochloric acid process stream at or near the azeotropic point of the stream to remove at least some of the inorganic impurities from the hydrochloric acid process stream to produce a hydrochloric acid recycle stream, at least a portion of which is recycled for use as the hydrochloric acid in step a).

在一個實施例中,在步驟e)中,在壓力下加熱自步驟c)獲得之過共沸鹽酸製程流以降低共沸點從而生成氯化氫氣體流且降低該鹽酸製程流中之氯化氫濃度。In one embodiment, in step e), the superazeotropic hydrochloric acid process stream obtained from step c) is heated under pressure to reduce the azeotropic point to generate a hydrogen chloride gas stream and reduce the concentration of hydrogen chloride in the hydrochloric acid process stream.

在一個實施例中,在步驟e)中藉由加熱鹽酸製程流而生成之氯化氫氣體流的至少一部分被再循環以供用作步驟b)中之一或多個結晶階段中之氯化氫氣體的來源。In one embodiment, at least a portion of the hydrogen chloride gas stream generated by heating the hydrochloric acid process stream in step e) is recycled for use as a source of hydrogen chloride gas in one or more crystallization stages in step b).

在一些實例中,藉由加熱以生成鹽酸氣體流來降低鹽酸製程流中之鹽酸濃度,較佳地,降低至共沸點處或附近,該鹽酸氣體流之至少一部分可被再循環以結晶氯化鋁六水合物,該鹽酸製程流隨後可易於處理以允許自方法中清除雜質且剩餘鹽酸被再循環以用於消化氯化鋁六水合物及/或含鋁材料。另外,結合藉由降低鹽酸製程流之濃度得到的鹽酸氣體以及自如下描述之熱分解及/或煅燒爐生成之鹽酸氣體,鹽酸在本文中描述之方法中作為液體及氣體兩者之再循環相對於本領域已知之方法降低了能耗及操作成本。In some examples, the hydrochloric acid concentration in the hydrochloric acid process stream is reduced, preferably to or near the azeotropic point, by heating to generate a hydrochloric acid gas stream, at least a portion of which can be recycled to crystallize aluminum chloride hexahydrate, the hydrochloric acid process stream can then be easily handled to allow impurities to be removed from the process and the remaining hydrochloric acid is recycled for use in digesting aluminum chloride hexahydrate and/or aluminum-containing materials. In addition, the recycling of hydrochloric acid as both a liquid and a gas in the process described herein reduces energy consumption and operating costs relative to methods known in the art by combining the hydrochloric acid gas obtained by reducing the concentration of the hydrochloric acid process stream and the hydrochloric acid gas generated from the thermal decomposition and/or calcining furnace described below.

在一個實施例中,在步驟f)中自鹽酸製程流中移除雜質包含蒸餾鹽酸製程流。在另一實施例中,在步驟f)中自鹽酸製程流中移除雜質包含在該流之共沸點處或附近蒸餾鹽酸製程流。In one embodiment, removing impurities from the hydrochloric acid process stream in step f) comprises distilling the hydrochloric acid process stream. In another embodiment, removing impurities from the hydrochloric acid process stream in step f) comprises distilling the hydrochloric acid process stream at or near the azeotropic point of the stream.

有利地,在共沸點處或附近蒸餾鹽酸製程流(亦即,共沸蒸餾)產生富含雜質之『鹽水』流,其中來自鹽酸製程流之大部分雜質被濃縮;及『乾淨』鹽酸流,其相較於『鹽水』鹽酸具有顯著更低之雜質水平。在共沸點處或附近蒸餾鹽酸製程流會蒸發及再冷凝已知濃度之鹽酸,且再冷凝之『乾淨』鹽酸流有利地具有低雜質含量及一致濃度,可被用作本文中描述之鹽酸再循環流。Advantageously, distilling a hydrochloric acid process stream at or near the azeotropic point (i.e., azeotropic distillation) produces an impurity-rich "brine" stream in which most of the impurities from the hydrochloric acid process stream are concentrated; and a "clean" hydrochloric acid stream having significantly lower impurity levels than "brine" hydrochloric acid. Distilling a hydrochloric acid process stream at or near the azeotropic point evaporates and recondenses hydrochloric acid of known concentration, and the recondensed "clean" hydrochloric acid stream advantageously has a low impurity content and consistent concentration and can be used as the hydrochloric acid recycle stream described herein.

為了充分理解由本發明之一些實施例提供之最佳化鹽酸環路以及相關聯之一或多個優點,可以參考以下步驟描述該方法: 在鹽酸中消化氯化鋁六水合物固體以形成氯化鋁液體; 自氯化鋁液體中沉澱氯化鋁六水合物固體,包括藉由噴灑氯化氫氣體; 自該液體中分離沉澱之氯化鋁六水合物固體以獲得鹽酸製程流; 自鹽酸製程流再生及再循環鹽酸,包含視情況降低鹽酸製程流中之氯化氫濃度及自鹽酸製程流中移除該等無機雜質中之至少一些以產生鹽酸再循環流,該鹽酸再循環流之至少一部分被再循環以供用作步驟a)中之鹽酸;及 處理所分離之氯化鋁六水合物固體以形成高純度氧化鋁。 在鹽酸中消化氯化鋁六水合物固體 In order to fully understand the optimized hydrochloric acid loop provided by some embodiments of the present invention and one or more advantages associated therewith, the method can be described with reference to the following steps: digesting aluminum chloride hexahydrate solid in hydrochloric acid to form aluminum chloride liquid; precipitating aluminum chloride hexahydrate solid from the aluminum chloride liquid, including by sparging hydrogen chloride gas; separating the precipitated aluminum chloride hexahydrate solid from the liquid to obtain a hydrochloric acid process stream; Regenerating and recycling hydrochloric acid from a hydrochloric acid process stream, comprising optionally reducing the concentration of hydrogen chloride in the hydrochloric acid process stream and removing at least some of the inorganic impurities from the hydrochloric acid process stream to produce a hydrochloric acid recycle stream, at least a portion of which is recycled for use as hydrochloric acid in step a); and treating the separated aluminum chloride hexahydrate solid to form high purity alumina. Digestion of aluminum chloride hexahydrate solid in hydrochloric acid

該方法包含消化包括一或多種無機雜質之氯化鋁六水合物固體。沉澱物中存在之一或多種雜質產生於各種含鋁材料(例如含鋁黏土,諸如高嶺土),或諸如拜耳法之方法之產物或副產物。然而,許多此等材料相對於最終所需產品之高純度臨限值(約99.99%)具有較高的無機雜質含量。移除或控制無機雜質以達到高純度臨限值在技術上係困難的。The process comprises digesting an aluminum chloride hexahydrate solid including one or more inorganic impurities. The one or more impurities present in the precipitate arise from various aluminum-containing materials (e.g., aluminum-containing clays such as kaolin), or are products or by-products of processes such as the Bayer process. However, many of these materials have a high content of inorganic impurities relative to the high purity threshold (about 99.99%) of the final desired product. Removing or controlling the inorganic impurities to achieve the high purity threshold is technically difficult.

在一個實施例中,經由本文中描述之一或多個結晶階段提供來自氯化鋁液體之沉澱物形式的氯化鋁六水合物固體。氯化鋁液體可為來自本文中描述之含鋁材料之酸消化的消化產物。在此實施例中,固體消化亦可以被稱作再消化。In one embodiment, aluminum chloride hexahydrate solid is provided as a precipitate from an aluminum chloride liquid via one or more crystallization stages described herein. The aluminum chloride liquid may be a digestion product from an acid digestion of an aluminum-containing material described herein. In this embodiment, solid digestion may also be referred to as re-digestion.

將瞭解,儘管如本文所描述,自氯化鋁液體中結晶及沉澱氯化鋁六水合物固體可將雜質之至少一部分留在液體中,但氯化鋁六水合物固體中仍存在一或多種無機雜質。按此,為了進一步降低最終高純度氧化鋁中無機雜質之濃度,在熱分解及煅燒之前,氯化鋁六水合物固體經歷一或多個消化及結晶步驟以形成高純度氧化鋁。舉例而言,在鹽酸中再消化氯化鋁六水合物固體以形成包含氯化鋁及任何雜質(例如,自用於製備初始氯化鋁六水合物沉澱物之第一結晶階段殘留之任何雜質)之氯化鋁液體。此液體接著可以如下所述之方式進行結晶以產生所沉澱之氯化鋁六水合物固體,在剩餘液體中留下另外的雜質。It will be understood that although crystallization and precipitation of aluminum chloride hexahydrate solid from aluminum chloride liquid as described herein may leave at least a portion of the impurities in the liquid, one or more inorganic impurities are still present in the aluminum chloride hexahydrate solid. Accordingly, in order to further reduce the concentration of inorganic impurities in the final high purity alumina, the aluminum chloride hexahydrate solid is subjected to one or more digestion and crystallization steps to form high purity alumina prior to thermal decomposition and calcination. For example, the aluminum chloride hexahydrate solid is further digested in hydrochloric acid to form an aluminum chloride liquid comprising aluminum chloride and any impurities (e.g., any impurities remaining from the first crystallization stage used to prepare the initial aluminum chloride hexahydrate precipitate). This liquid may then be crystallized as described below to produce a precipitated aluminum chloride hexahydrate solid, leaving additional impurities in the remaining liquid.

因此,該方法包含在鹽酸中消化具有一或多種無機雜質之氯化鋁六水合物固體,以產生在溶液中包含氯化鋁及該等無機雜質之氯化鋁液體。Thus, the method comprises digesting an aluminum chloride hexahydrate solid having one or more inorganic impurities in hydrochloric acid to produce an aluminum chloride liquid comprising aluminum chloride and the inorganic impurities in solution.

在一個實例中,氯化鋁六水合物固體之酸消化在合適的反應器/容器(例如酸消化器)中發生,且鹽酸被引入至反應器中以消化氯化鋁六水合物固體。氯化鋁六水合物固體之酸消化可在反應器中以分批模式或連續模式進行。鹽酸可作為連續鹽酸流引入至反應器中以用於消化氯化鋁六水合物固體。In one example, the acid digestion of aluminum chloride hexahydrate solids occurs in a suitable reactor/vessel (e.g., an acid digester), and hydrochloric acid is introduced into the reactor to digest the aluminum chloride hexahydrate solids. The acid digestion of aluminum chloride hexahydrate solids can be performed in a reactor in a batch mode or a continuous mode. Hydrochloric acid can be introduced into the reactor as a continuous hydrochloric acid stream for digesting aluminum chloride hexahydrate solids.

氯化鋁六水合物固體之酸消化可在單個反應器(例如酸消化器)或串聯配置之複數個反應器(例如多達5個酸消化器)中進行。Acid digestion of aluminum chloride hexahydrate solids can be carried out in a single reactor (e.g., an acid digester) or in a plurality of reactors configured in series (e.g., up to 5 acid digesters).

酸消化可在自周圍溫度至所得氯化鋁液體之常壓沸點的溫度下進行。酸消化可在至少約(以℃為單位) 25、30、35、40、45、50、55、60、65、70、75、80、85、90或95之溫度下進行。酸消化可在小於約(以℃為單位) 100、95、90、85、80、75、70、65、60、55、50、45、40、35或30之溫度下進行。酸消化可在此等較高量及較低量中之任何兩者之間,諸如約25℃至100℃、50℃至95℃、70℃至90℃,或75℃至85℃之間,例如約80℃之溫度下進行。The acid digestion can be carried out at a temperature ranging from ambient temperature to the atmospheric boiling point of the resulting aluminum chloride liquid. The acid digestion can be carried out at a temperature of at least about (in ° C) 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85, 90 or 95. The acid digestion can be carried out at a temperature of less than about (in ° C) 100, 95, 90, 85, 80, 75, 70, 65, 60, 55, 50, 45, 40, 35 or 30. The acid digestion can be carried out at a temperature between any two of these higher and lower amounts, such as about 25° C. to 100° C., 50° C. to 95° C., 70° C. to 90° C., or 75° C. to 85° C., for example, about 80° C.

將瞭解,酸消化之速率將取決於所得消化混合物之溫度、固體濃度及酸濃度。酸消化可進行至少約15分鐘、1小時、2小時、3小時、4小時、5小時或7小時之時段。酸消化可進行小於約7小時、6小時、5小時、4小時、3小時、2小時或1小時之時段。固體沉澱可進行由較高量及/或較低量中之任何兩者提供之範圍內,諸如自約15分鐘至6小時或約2至4小時之範圍內之時段。在一個特定實例中,時間段為約3小時。It will be appreciated that the rate of acid digestion will depend on the temperature, solid concentration, and acid concentration of the resulting digestion mixture. Acid digestion can be performed for a period of at least about 15 minutes, 1 hour, 2 hours, 3 hours, 4 hours, 5 hours, or 7 hours. Acid digestion can be performed for a period of less than about 7 hours, 6 hours, 5 hours, 4 hours, 3 hours, 2 hours, or 1 hour. Solid precipitation can be performed within a range provided by any two of the higher amount and/or the lower amount, such as a period in the range of about 15 minutes to 6 hours or about 2 to 4 hours. In a specific example, the period is about 3 hours.

在一個實施例中,用以消化氯化鋁六水合物固體之鹽酸亦可被稱作鹽酸消化流。In one embodiment, the hydrochloric acid used to digest the aluminum chloride hexahydrate solids may also be referred to as a hydrochloric acid digestion stream.

在一個實施例中,用以消化氯化鋁六水合物固體之鹽酸可包含本文中描述之鹽酸再循環流或由該鹽酸再循環流組成。本文中針對鹽酸再循環流描述之實施例或實例在下文同樣適用於用以消化氯化鋁六水合物固體之鹽酸。 自氯化鋁液體沉澱氯化鋁六水合物固體 In one embodiment, the hydrochloric acid used to digest the aluminum chloride hexahydrate solids may comprise or consist of a hydrochloric acid recycle stream as described herein. The embodiments or examples described herein for the hydrochloric acid recycle stream are also applicable below to the hydrochloric acid used to digest the aluminum chloride hexahydrate solids. Precipitation of aluminum chloride hexahydrate solids from aluminum chloride liquid

在酸消化以產生在溶液中包含無機雜質之氯化鋁液體之後,接著自氯化鋁液體沉澱氯化鋁六水合物固體,使得該等無機雜質中之至少一些保留在液體中。After acid digestion to produce an aluminum chloride liquid containing inorganic impurities in solution, aluminum chloride hexahydrate solid is then precipitated from the aluminum chloride liquid such that at least some of the inorganic impurities remain in the liquid.

在此步驟中所獲得之所沉澱之氯化鋁六水合物固體可被稱作「再沉澱」之氯化鋁六水合物固體。舉例而言,由於在步驟a)中消化之初始氯化鋁六水合物固體可為自本文中描述之氯化鋁液體獲得之沉澱物,該氯化鋁液體接著進行酸消化以產生氯化鋁液體,本文中描述之後續沉澱產生再沉澱之氯化鋁六水合物固體。The precipitated aluminum chloride hexahydrate solid obtained in this step can be referred to as "reprecipitated" aluminum chloride hexahydrate solid. For example, since the initial aluminum chloride hexahydrate solid digested in step a) can be a precipitate obtained from the aluminum chloride liquid described herein, which is then subjected to acid digestion to produce aluminum chloride liquid, the subsequent precipitation described herein produces reprecipitated aluminum chloride hexahydrate solid.

該方法包含在一或多個結晶階段中自該液體中沉澱氯化鋁六水合物固體,使得該等無機雜質中之至少一些保留在該液體中。舉例而言,在溶液中包含氯化鋁及一或多種雜質之氯化鋁液體可經歷一或多個結晶階段以便沉澱氯化鋁六水合物固體。The method comprises precipitating an aluminum chloride hexahydrate solid from the liquid in one or more crystallization stages such that at least some of the inorganic impurities remain in the liquid. For example, an aluminum chloride liquid comprising aluminum chloride and one or more impurities in solution may be subjected to one or more crystallization stages in order to precipitate an aluminum chloride hexahydrate solid.

在沉澱之前,氯化鋁液體之溶液中之鋁(Al)濃度可為至少約1 g/L、約10 g/L、約20 g/L、約30 g/L、約40 g/L、約50 g/L、約60 g/L、約70 g/L、約80 g/L或約90 g/L。在沉澱之前,氯化鋁液體之溶液中之Al濃度可小於約100 g/L、約90 g/L、約80 g/L、約70 g/L、約60 g/L、約50 g/L、約40 g/L、約30 g/L、約20 g/L或約10 g/L。在一實施例中,在沉澱之前,氯化鋁液體之溶液中之Al濃度可在介於約1-100 g/L之間的範圍內,例如介於上述較高濃度及/或較低濃度中之任何兩者之間的範圍,諸如約10-90 g/L或50-85 g/L或約60-80 g/L。為了便於沉澱/結晶,氯化鋁液體中之Al濃度較佳地等於或略低於溶液之飽和濃度。Prior to precipitation, the aluminum (Al) concentration in the solution of the aluminum chloride liquid may be at least about 1 g/L, about 10 g/L, about 20 g/L, about 30 g/L, about 40 g/L, about 50 g/L, about 60 g/L, about 70 g/L, about 80 g/L, or about 90 g/L. Prior to precipitation, the Al concentration in the solution of the aluminum chloride liquid may be less than about 100 g/L, about 90 g/L, about 80 g/L, about 70 g/L, about 60 g/L, about 50 g/L, about 40 g/L, about 30 g/L, about 20 g/L, or about 10 g/L. In one embodiment, before precipitation, the Al concentration in the aluminum chloride liquid solution may be in the range of about 1-100 g/L, for example, in the range between any two of the above-mentioned higher concentrations and/or lower concentrations, such as about 10-90 g/L or 50-85 g/L or about 60-80 g/L. In order to facilitate precipitation/crystallization, the Al concentration in the aluminum chloride liquid is preferably equal to or slightly lower than the saturation concentration of the solution.

在溶液中包含氯化鋁及一或多種雜質之氯化鋁液體經歷結晶階段以便沉澱氯化鋁六水合物固體且在液體中留下該等雜質之至少一部分。將瞭解,結晶可以分批模式或連續模式進行。另外,結晶可在單個反應器(例如,結晶容器)或串聯配置之複數個反應器中進行,使得各容器中所沉澱之氯化鋁六水合物固體的濃度升高。An aluminum chloride liquid comprising aluminum chloride and one or more impurities in solution undergoes a crystallization stage in order to precipitate aluminum chloride hexahydrate solid and leave at least a portion of the impurities in the liquid. It will be appreciated that crystallization can be performed in a batch mode or a continuous mode. Additionally, crystallization can be performed in a single reactor (e.g., a crystallization vessel) or in a plurality of reactors configured in series such that the concentration of aluminum chloride hexahydrate solid precipitated in each vessel increases.

在沉澱反應器中,液體中之氯化物濃度相對於氯化鋁六水合物升高至飽和濃度或更高,藉此促使氯化鋁六水合物自溶液中沉澱出。舉例而言,初始氯化物濃度可升高至至少約6 M。在另一實例中,初始氯化物濃度可升高至至少約7 M、8 M、9 M、10 M或11 M。初始氯化物濃度可升高以提供小於約12 M、11 M、10 M、9 M、8 M或7 M。初始氯化物濃度可升高以提供在此等較高量及較低量中之任何兩者之間的範圍內之量,諸如約6 M至12 M、7 M至11 M氯化物或8 M至10 M之間。在一個特定實例中,初始氯化物濃度為約9 M。In the precipitation reactor, the chloride concentration in the liquid is increased to a saturated concentration or higher relative to aluminum chloride hexahydrate, thereby causing aluminum chloride hexahydrate to precipitate from the solution. For example, the initial chloride concentration can be increased to at least about 6 M. In another example, the initial chloride concentration can be increased to at least about 7 M, 8 M, 9 M, 10 M, or 11 M. The initial chloride concentration can be increased to provide less than about 12 M, 11 M, 10 M, 9 M, 8 M, or 7 M. The initial chloride concentration can be increased to provide an amount in the range between any two of these higher and lower amounts, such as between about 6 M to 12 M, 7 M to 11 M chloride, or 8 M to 10 M. In a specific example, the initial chloride concentration is about 9 M.

在一個實施例中,步驟b)中之沉澱包含向液體中噴灑氯化氫氣體。舉例而言,藉由噴灑氯化氫氣體可容易地升高液體中之氯化物濃度。在某些實施例中,藉由連續噴灑氯化氫氣體來升高氯化物濃度。可替代地,可在沉澱製程期間定期暫停噴灑。可在初始部分之氯化氫氣體已引入至液體中之後暫停對液體之噴灑,例如可在50%之氯化氫氣體已引入至液體中之後暫停噴灑。有利地,噴灑氯化氫氣體而非液體可降低非所要雜質污染液體之可能性。In one embodiment, the precipitation in step b) comprises spraying hydrogen chloride gas into the liquid. For example, the chloride concentration in the liquid can be easily increased by spraying hydrogen chloride gas. In certain embodiments, the chloride concentration is increased by continuously spraying hydrogen chloride gas. Alternatively, the spraying can be suspended periodically during the precipitation process. The spraying of the liquid can be suspended after the initial portion of the hydrogen chloride gas has been introduced into the liquid, for example, the spraying can be suspended after 50% of the hydrogen chloride gas has been introduced into the liquid. Advantageously, spraying hydrogen chloride gas instead of liquid can reduce the possibility of contaminating the liquid with undesirable impurities.

在一個實施例中,用以向氯化鋁液體中噴灑之氯化氫氣體包含氯化氫氣體或由氯化氫氣體組成,該氯化氫氣體係如本文所描述自氯化氫製程流再生及再循環。In one embodiment, the hydrochloric acid gas used to sparge the aluminum chloride liquid comprises or consists of hydrochloric acid gas that is regenerated and recycled from a hydrochloric acid process stream as described herein.

將瞭解,使用複數個串聯反應器進行沉澱,因此需要處理之溶液體積更小,可允許改良對酸濃度、溫度及其他沉澱條件之控制,藉此改良對氯化鋁六水合物固體之結晶速率之控制。It will be appreciated that the use of multiple reactors in series for precipitation, and therefore the need to process smaller volumes of solution, may allow for improved control of acid concentration, temperature and other precipitation conditions, thereby improving control over the crystallization rate of the aluminum chloride hexahydrate solid.

鹽酸及氯化氫氣體以及氯化鋁液體之腐蝕性可導致雜質藉由對處理設備之腐蝕而進入製程。因此,要注意確保處理設備部件在可能的情況下由對鹽酸及氯化氫氣體呈惰性之材料形成,及/或保護處理設備部件免受酸侵蝕。The corrosive nature of hydrochloric acid and hydrogen chloride gases and aluminum chloride liquids can result in impurities being introduced into the process by corrosion of processing equipment. Therefore, care should be taken to ensure that processing equipment components are formed of materials that are inert to hydrochloric acid and hydrogen chloride gases whenever possible and/or to protect processing equipment components from acid attack.

固體沉澱可在至少約(以℃為單位) 25、30、35、40、45、50、55、60、65、70、75、80、85、90或95之溫度下進行。固體沉澱可在小於約(以℃為單位) 100、95、90、85、80、75、70、65、60、55、50、45、40、35或30之溫度下進行。固體沉澱可在此等較高量及較低量中之任何兩者之間,諸如約25℃至100℃、30℃至90℃或40℃至80℃之間的溫度下進行。Solid precipitation can be carried out at a temperature of at least about (in ° C.) 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85, 90, or 95. Solid precipitation can be carried out at a temperature of less than about (in ° C.) 100, 95, 90, 85, 80, 75, 70, 65, 60, 55, 50, 45, 40, 35, or 30. Solid precipitation can be carried out at a temperature between any two of these higher and lower amounts, such as between about 25° C. and 100° C., 30° C. and 90° C., or 40° C. and 80° C.

固體沉澱可進行至少約1小時、2小時、3小時、4小時、5小時或7小時之時段。固體沉澱可進行小於約7小時、6小時、5小時、4小時、3小時或2小時之時段。固體沉澱可進行由此等較高量及/或較低量中之任何兩者提供之範圍內,諸如自約1小時至6小時或約2至4小時之範圍內之時段。在一個特定實例中,該時間段為約3小時。Solid precipitation can be performed for a period of at least about 1 hour, 2 hours, 3 hours, 4 hours, 5 hours, or 7 hours. Solid precipitation can be performed for a period of less than about 7 hours, 6 hours, 5 hours, 4 hours, 3 hours, or 2 hours. Solid precipitation can be performed within a range provided by any two of the higher amounts and/or lower amounts, such as a period in the range of about 1 hour to 6 hours or about 2 to 4 hours. In a specific example, the period is about 3 hours.

可對濃縮液體種晶以輔助結晶動力學且提高所得產物之純度。晶種之組成可為促進氯化鋁六水合物自氯化鋁液體中結晶之任何合適材料,例如,可用諸如氯化鋁六水合物或氧化鋁晶體之含鋁晶種對濃縮液體種晶。用於對結晶種晶之氯化鋁六水合物或氧化鋁晶體可自製程之其他階段再循環。The concentrated liquid may be seeded to assist the crystallization kinetics and to increase the purity of the resulting product. The composition of the seed crystals may be any suitable material that promotes the crystallization of aluminum chloride hexahydrate from the aluminum chloride liquid, for example, the concentrated liquid may be seeded with aluminum-containing seed crystals such as aluminum chloride hexahydrate or alumina crystals. The aluminum chloride hexahydrate or alumina crystals used to seed the crystals may be recycled from other stages of the process.

可用至少約0.1 g/L、約1 g/L、約5 g/L、約10 g/L、約15 g/L、約20 g/L、約25 g/L、約30 g/L、約35 g/L、約40 g/L、約45 g/L或約50 g/L之量的氯化鋁六水合物晶體對氯化鋁液體種晶。可用小於約60 g/L、約55 g/L、約50 g/L、約45 g/L、約40 g/L、約35 g/L、約30 g/L、約25 g/L、約20 g/L、約15 g/L、約10 g/L或約5 g/L之量的氯化鋁六水合物晶體對製備之氯化鋁液體種晶。可用由較高量及/或較低量中之任何兩者提供之範圍內,諸如約0.1 g/L至60 g/L、約1 g/L至50 g/L或約10 g/L至55 g/L之間的量的氯化鋁六水合物晶體對製備之氯化鋁液體種晶。在其他實例中,種晶之氯化鋁六水合物晶體之範圍量可為0.1-1 g/L、1-5 g/L、5-10 g/L、10-15 g/L、15-20 g/L、20-25 g/L、25-30 g/L、30-35 g/L、35-40 g/L、40-45 g/L或45-50 g/L。在其他實例中,可針對其他合適種晶材料提供包括範圍之此等種晶量。The aluminum chloride liquid may be seeded with aluminum chloride hexahydrate crystals in an amount of at least about 0.1 g/L, about 1 g/L, about 5 g/L, about 10 g/L, about 15 g/L, about 20 g/L, about 25 g/L, about 30 g/L, about 35 g/L, about 40 g/L, about 45 g/L, or about 50 g/L. The prepared aluminum chloride liquid may be seeded with aluminum chloride hexahydrate crystals in an amount of less than about 60 g/L, about 55 g/L, about 50 g/L, about 45 g/L, about 40 g/L, about 35 g/L, about 30 g/L, about 25 g/L, about 20 g/L, about 15 g/L, about 10 g/L, or about 5 g/L. The prepared aluminum chloride liquid may be seeded with aluminum chloride hexahydrate crystals in an amount provided by any two of the higher amount and/or the lower amount, such as about 0.1 g/L to 60 g/L, about 1 g/L to 50 g/L, or about 10 g/L to 55 g/L. In other examples, the amount of aluminum chloride hexahydrate crystals seeded may be in the range of 0.1-1 g/L, 1-5 g/L, 5-10 g/L, 10-15 g/L, 15-20 g/L, 20-25 g/L, 25-30 g/L, 30-35 g/L, 35-40 g/L, 40-45 g/L, or 45-50 g/L. In other examples, such seeding amounts including ranges may be provided for other suitable seeding materials.

可在引入至結晶容器(亦即,沉澱反應器)之前,將晶種添加至氯化鋁液體。在此步驟中,可將額外的可溶性含鋁材料添加至氯化鋁液體,以便在種晶及結晶之前將Al濃度提高至所要水平。Seed crystals may be added to the aluminum chloride liquid prior to introduction into the crystallization vessel (i.e., precipitation reactor). In this step, additional soluble aluminum-containing material may be added to the aluminum chloride liquid to increase the Al concentration to a desired level prior to seeding and crystallization.

當在複數個反應器中進行結晶時,可用氯化鋁六水合物晶體種晶該等反應器中的一或多者。在一實施例中,當在複數個串聯反應器中進行結晶時,自一個反應器饋入串聯中之後一反應器的包含所沉澱之氯化鋁六水合物固體之液體可用來種晶後一反應器中之沉澱。When crystallization is performed in a plurality of reactors, one or more of the reactors may be seeded with aluminum chloride hexahydrate crystals. In one embodiment, when crystallization is performed in a plurality of reactors in series, liquid containing precipitated aluminum chloride hexahydrate solids fed from one reactor to a subsequent reactor in the series may be used to seed precipitation in the subsequent reactor.

在進行多個結晶階段的情況下,種晶可在一些或所有結晶階段中進行,但無需在所有結晶階段中均進行。在一實例中,種晶可僅在多個結晶階段中之第一結晶階段中進行以生成氯化鋁六水合物固體,同時在含鋁材料之鹽酸消化中產生的氯化鋁液體中存在大部分雜質。In the case of performing multiple crystallization stages, seeding can be performed in some or all of the crystallization stages, but need not be performed in all of the crystallization stages. In one example, seeding can be performed only in the first crystallization stage of the multiple crystallization stages to generate aluminum chloride hexahydrate solid while most of the impurities are present in the aluminum chloride liquid produced in the hydrochloric acid digestion of the aluminum-containing material.

在一實施例中,含鋁晶種包含大於90%、95%、98%或99%之鋁化合物以將引入至液體中之雜質降至最少。在另一實施例中,含鋁晶種係六水合鋁固體,其為大於90%、95%、98%、99%、99.9%、99.99%或99.999%之六水合鋁固體,以將引入至液體中之雜質降至最少。在其他實例中,含鋁晶種中之雜質總量小於1%、0.1%、0.01%、0.001%或0.0001%。In one embodiment, the aluminum-containing seed crystals contain greater than 90%, 95%, 98%, or 99% aluminum compound to minimize the introduction of impurities into the liquid. In another embodiment, the aluminum-containing seed crystals are aluminum hexahydrate solids, which are greater than 90%, 95%, 98%, 99%, 99.9%, 99.99%, or 99.999% aluminum hexahydrate solids to minimize the introduction of impurities into the liquid. In other examples, the total amount of impurities in the aluminum-containing seed crystals is less than 1%, 0.1%, 0.01%, 0.001%, or 0.0001%.

藉助於非限制性實例,晶種中存在之雜質可包括鈣(Ca)、鐵(Fe)、鉀(K)、鎂(Mg)、鈉(Na)、磷(P)、矽(Si)、鈦(Ti)、銅(Cu)、鉬(Mo)、鉻(Cr)、鎵(Ga)、鋅(Zn)或其組合。在一個實例中,雜質係由鈣(Ca)、鐵(Fe)、鉀(K)、鎂(Mg)、鈉(Na)、磷(P)、矽(Si)、鈦(Ti)、銅(Cu)、鉬(Mo)、鉻(Cr)、鎵(Ga)及鋅(Zn)中之一或多者提供。By way of non-limiting example, the impurities present in the seed crystal may include calcium (Ca), iron (Fe), potassium (K), magnesium (Mg), sodium (Na), phosphorus (P), silicon (Si), titanium (Ti), copper (Cu), molybdenum (Mo), chromium (Cr), gallium (Ga), zinc (Zn), or combinations thereof. In one example, the impurities are provided by one or more of calcium (Ca), iron (Fe), potassium (K), magnesium (Mg), sodium (Na), phosphorus (P), silicon (Si), titanium (Ti), copper (Cu), molybdenum (Mo), chromium (Cr), gallium (Ga), and zinc (Zn).

晶種中之個別雜質或總雜質可小於約1000 ppm、500 ppm、400 ppm、300 ppm、200 ppm、100 ppm、90 ppm、80 ppm、70 ppm、60 ppm、50 ppm、40 ppm、30 ppm、20 ppm、10 ppm或5 ppm。Individual impurities or the total impurities in the seeds may be less than about 1000 ppm, 500 ppm, 400 ppm, 300 ppm, 200 ppm, 100 ppm, 90 ppm, 80 ppm, 70 ppm, 60 ppm, 50 ppm, 40 ppm, 30 ppm, 20 ppm, 10 ppm or 5 ppm.

在一個實例中,任一種雜質之雜質小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在一實例中,鉀(K)之雜質小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,磷(P)之雜質小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,鈉(Na)之雜質小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,矽(Si)之雜質小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,鈣(Ca)之雜質小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,鐵(Fe)之雜質小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,鎂(Mg)之雜質小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,鈦(Ti)之雜質小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,銅(Cu)之雜質小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,鉬(Mo)之雜質小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,鉻(Cr)之雜質小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,鎵(Ga)之雜質小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。在另一實例中,鋅(Zn)之雜質小於約(以ppm為單位) 50、40、30、20、10、9、8、7、6、5、4、3、2或1。In one example, the impurity of any one impurity is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In one example, the impurity of potassium (K) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity of phosphorus (P) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity of sodium (Na) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity of silicon (Si) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity of calcium (Ca) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity of iron (Fe) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity of magnesium (Mg) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity of titanium (Ti) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity of copper (Cu) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity of molybdenum (Mo) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity of chromium (Cr) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity of gallium (Ga) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1. In another example, the impurity of zinc (Zn) is less than about (in ppm) 50, 40, 30, 20, 10, 9, 8, 7, 6, 5, 4, 3, 2, or 1.

在存在多個消化及結晶階段之製程中,操作條件在各階段中不必相同,且可回應於產品純度增加而變化。在一個實例中,如上文所論述,種晶之存在可跨結晶階段而變化。此外,當在多個結晶階段中提供種晶時,晶種量或晶種類型在不同階段可為不同的,例如晶種量可在後續結晶中減小。In a process where there are multiple digestion and crystallization stages, operating conditions need not be the same in each stage and may vary in response to increased product purity. In one example, as discussed above, the presence of seed crystals may vary across crystallization stages. In addition, when seed crystals are provided in multiple crystallization stages, the amount of seed crystals or the type of seed crystals may be different in different stages, for example, the amount of seed crystals may be reduced in subsequent crystallizations.

在另一實例中,鹽酸濃度在不同結晶階段可為不同的。雖然較高鹽酸濃度將會增加自液體中沉澱之氯化鋁六水合物固體的量,但此亦可導致沉澱之固體中具有較高雜質濃度。相反,較低濃度會在液體中留下更多鋁,但是提供更純的沉澱物。In another example, the hydrochloric acid concentration may be different at different crystallization stages. Although a higher hydrochloric acid concentration will increase the amount of aluminum chloride hexahydrate solid precipitated from the liquid, this may also result in a higher impurity concentration in the precipitated solid. Conversely, a lower concentration will leave more aluminum in the liquid, but provide a purer precipitate.

在一實施例中,製程包含兩個或更多個結晶階段,尤其三個結晶階段。第一結晶階段中之鹽酸濃度低於後續結晶階段中之至少一者。舉例而言,第一結晶階段中之鹽酸濃度可小於約10 M、9 M或8 M,且後續結晶階段中之至少一者中的鹽酸濃度可分別大於11 M、10 M或9 M。在另一實例中,在提供三個結晶階段之情況下,第一結晶階段中之鹽酸濃度可為約9 M,第二結晶階段中之鹽酸濃度可為約10.5 M,且第三結晶階段中之鹽酸濃度可為約10 M。In one embodiment, the process comprises two or more crystallization stages, in particular three crystallization stages. The hydrochloric acid concentration in the first crystallization stage is lower than at least one of the subsequent crystallization stages. For example, the hydrochloric acid concentration in the first crystallization stage may be less than about 10 M, 9 M or 8 M, and the hydrochloric acid concentration in at least one of the subsequent crystallization stages may be greater than 11 M, 10 M or 9 M, respectively. In another example, where three crystallization stages are provided, the hydrochloric acid concentration in the first crystallization stage may be about 9 M, the hydrochloric acid concentration in the second crystallization stage may be about 10.5 M, and the hydrochloric acid concentration in the third crystallization stage may be about 10 M.

在一實施例中,該或各結晶階段在串聯配置之複數個反應器中進行。在此類實施例中,串聯反應器中之鹽酸濃度可逐漸提高以達到如上文所描述之串聯的最終反應器中之濃度。在一個實施例中,該或各結晶階段包含經歷兩個或更多個沉澱階段之氯化鋁液體,其中沉澱階段係串聯的。In one embodiment, the or each crystallization stage is carried out in a plurality of reactors arranged in series. In such embodiments, the concentration of hydrochloric acid in the series reactors can be gradually increased to reach the concentration in the final reactor in the series as described above. In one embodiment, the or each crystallization stage comprises an aluminum chloride liquid that has undergone two or more precipitation stages, wherein the precipitation stages are connected in series.

在一個實施例中,步驟b)包含在兩個或更多個結晶階段中自氯化鋁液體中沉澱氯化鋁六水合物固體,其中在各結晶階段之間,在鹽酸再循環流中消化所分離之氯化鋁六水合物以產生氯化鋁液體。 分離氯化鋁六水合物固體以產生鹽酸製程流 In one embodiment, step b) comprises precipitating aluminum chloride hexahydrate solid from aluminum chloride liquid in two or more crystallization stages, wherein between each crystallization stage, the separated aluminum chloride hexahydrate is digested in a hydrochloric acid recycle stream to produce aluminum chloride liquid.

自液體中分離所得氯化鋁六水合物固體以產生包含無機雜質之鹽酸製程流。將瞭解,鹽酸製程流在分離固體之後包含液體及雜質。分離之固體可形成與鹽酸製程流分離之固體流。The resulting aluminum chloride hexahydrate solid is separated from the liquid to produce a hydrochloric acid process stream comprising inorganic impurities. It will be appreciated that the hydrochloric acid process stream comprises liquid and impurities after separation of the solid. The separated solid may form a solid stream that is separated from the hydrochloric acid process stream.

可使用任何合適之習知分離技術,諸如過濾、重力分離、離心、分級,諸如此類。將瞭解,固體可在分離期間經歷一或多次洗滌。Any suitable known separation technique may be used, such as filtration, gravity separation, centrifugation, fractionation, and the like. It will be appreciated that the solids may undergo one or more washes during separation.

在熱處理為高純度氧化鋁之前,可洗滌所分離之氯化鋁六水合物固體以移除固體內夾帶之任何液體/雜質。可用鹽酸洗滌固體。用以洗滌固體之鹽酸可如本文所描述自再生鹽酸再循環。在一個實施例中,用以洗滌固體之鹽酸可在本文中描述之HCl再生製程期間生成,例如作為在本文中描述之氯化氫氣體流冷凝期間生成之濃鹽酸流。可替代地或另外,分離之液體及組合洗滌液可再循環以供用作過濾在上游產生之氯化鋁六水合物固體之洗滌介質。Prior to heat treatment to high purity alumina, the separated aluminum chloride hexahydrate solid can be washed to remove any liquid/impurities entrained in the solid. The solid can be washed with hydrochloric acid. The hydrochloric acid used to wash the solid can be recycled from the regenerated hydrochloric acid as described herein. In one embodiment, the hydrochloric acid used to wash the solid can be generated during the HCl regeneration process described herein, for example as a concentrated hydrochloric acid stream generated during the condensation of the hydrogen chloride gas stream described herein. Alternatively or in addition, the separated liquid and combined wash liquid can be recycled for use as a wash medium for filtering aluminum chloride hexahydrate solids generated upstream.

為了進一步降低雜質濃度,所分離之經沉澱氯化鋁六水合物固體可視情況在熱分解及煅燒為高純度氧化鋁之前經歷一或多個其他消化及再結晶步驟。舉例而言,所分離之經沉澱氯化鋁六水合物固體可如本文所描述在鹽酸中消化以形成包含氯化鋁及自結晶階段殘留之任何雜質的氯化鋁液體。此液體接著可以如上文所描述之方式經歷一或多個後續結晶步驟以產生經沉澱之氯化鋁六水合物固體,在剩餘液體中留下另外的雜質。To further reduce the impurity concentration, the separated precipitated aluminum chloride hexahydrate solid may optionally undergo one or more additional digestion and recrystallization steps prior to thermal decomposition and calcination into high purity alumina. For example, the separated precipitated aluminum chloride hexahydrate solid may be digested in hydrochloric acid as described herein to form an aluminum chloride liquid comprising aluminum chloride and any impurities remaining from the crystallization stage. This liquid may then be subjected to one or more subsequent crystallization steps in the manner described above to produce a precipitated aluminum chloride hexahydrate solid, leaving additional impurities in the remaining liquid.

將瞭解,鹽酸中之酸消化及結晶階段可在處理固體以形成高純度氧化鋁之前視需要重複多次以達到適當純之氯化鋁六水合物固體濃度。然而,在其中固體中之殘留雜質足夠低以使得自過濾之後收集的固體的熱分解及煅燒產生的氧化鋁將滿足高純度氧化鋁之純度要求的彼等實施例中,可能不需要重複之酸消化及結晶。 製程鹽酸之再生及再循環 It will be appreciated that the acid digestion and crystallization stages in hydrochloric acid may be repeated as many times as necessary to achieve a suitably pure aluminum chloride hexahydrate solid concentration prior to treating the solid to form high purity alumina. However, in those embodiments where the residual impurities in the solid are sufficiently low that the alumina produced from thermal decomposition and calcination of the solid collected after filtration will meet the purity requirements for high purity alumina, repeated acid digestion and crystallization may not be required. Regeneration and Recycling of Process Hydrochloric Acid

如上文所描述,在自鹽酸製程流中分離經沉澱之氯化鋁六水合物固體之後產生包含雜質之鹽酸製程流。相較於「廢料」流,本發明人已發現在酸消化及結晶之後液體中殘留之鹽酸可作為液體流再循環回至方法中以用於消化氯化鋁六水合物固體及/或含鋁材料。As described above, a hydrochloric acid process stream containing impurities is produced after separation of the precipitated aluminum chloride hexahydrate solids from the hydrochloric acid process stream. In contrast to a "waste" stream, the inventors have discovered that the hydrochloric acid remaining in the liquid after acid digestion and crystallization can be recycled back into the process as a liquid stream for use in digesting aluminum chloride hexahydrate solids and/or aluminum-containing materials.

鹽酸製程流具有氯化氫濃度。製程流之氯化氫含量產生於本文中描述之先前一或多個酸消化步驟及一或多個結晶階段。The hydrochloric acid process stream has a hydrogen chloride concentration. The hydrogen chloride content of the process stream results from one or more previous acid digestion steps and one or more crystallization stages described herein.

在一個實施例中,鹽酸製程流具有按該流之重量計介於約5 wt.%至約40 wt.%之間的氯化氫濃度。鹽酸製程流可具有按該流之重量計至少約5、8、10、12、15、17、19、20、21、22、25、28、30、32、35或40之氯化氫濃度(以wt.%為單位)。鹽酸製程流可具有按該流之重量計小於約40、35、32、30、28、25、22、21、20、19、17、15、12、10、8或5之氯化氫濃度(以wt.%為單位)。氯化氫濃度可為由此等較高值及/或較低值中之任何兩者提供之範圍,例如按該流之重量計介於約15 wt.%至約35 wt.%之間的範圍。In one embodiment, the hydrochloric acid process stream has a concentration of hydrogen chloride between about 5 wt.% and about 40 wt.% based on the weight of the stream. The hydrochloric acid process stream may have a concentration of hydrogen chloride of at least about 5, 8, 10, 12, 15, 17, 19, 20, 21, 22, 25, 28, 30, 32, 35, or 40 wt.% based on the weight of the stream. The hydrochloric acid process stream may have a concentration of hydrogen chloride of less than about 40, 35, 32, 30, 28, 25, 22, 21, 20, 19, 17, 15, 12, 10, 8, or 5 wt.% based on the weight of the stream. The hydrogen chloride concentration may be in a range provided by any two of these higher values and/or lower values, such as a range between about 15 wt.% to about 35 wt.% based on the weight of the stream.

在一個實施例中,鹽酸製程流具有高於該流之共沸點之氯化氫濃度。舉例而言,氯化氫濃度可大於共沸點且按製程流之重量計小於約40 wt.%。在一個實施例中,鹽酸製程流具有按該流之重量計介於約25 wt.%至約40 wt.%之間的氯化氫濃度。鹽酸製程流可具有按該流之重量計至少約25、26、27、28、29、30、31、32、33、34、35、36、37、38、39或40之氯化氫濃度(以wt.%為單位)。鹽酸製程流可具有按該流之重量計至少約40、39、38、37、36、35、34、33、32、31、30、29、28、27、26或25之氯化氫濃度(以wt.%為單位)。鹽酸製程流之氯化氫濃度可為由此等較高值及/或較低值中之任何兩者提供之範圍,例如介於約28 wt.%至約37 wt.%之間的範圍。In one embodiment, the hydrochloric acid process stream has a hydrogen chloride concentration above the azeotropic point of the stream. For example, the hydrogen chloride concentration may be greater than the azeotropic point and less than about 40 wt.% by weight of the process stream. In one embodiment, the hydrochloric acid process stream has a hydrogen chloride concentration between about 25 wt.% and about 40 wt.% by weight of the stream. The hydrochloric acid process stream may have a hydrogen chloride concentration (in wt.%) of at least about 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, or 40 by weight of the stream. The hydrochloric acid process stream may have a hydrogen chloride concentration (in wt.%) of at least about 40, 39, 38, 37, 36, 35, 34, 33, 32, 31, 30, 29, 28, 27, 26, or 25, based on the weight of the stream. The hydrogen chloride concentration of the hydrochloric acid process stream may be a range provided by any two of these higher and/or lower values, such as a range between about 28 wt.% to about 37 wt.%.

在一個實施例中,鹽酸製程流具有高於該流之共沸點之氯化氫濃度,且該方法包含步驟e)在移除雜質之前降低鹽酸製程流中之氯化氫濃度。In one embodiment, the hydrochloric acid process stream has a concentration of hydrogen chloride above the azeotropic point of the stream, and the method includes step e) reducing the concentration of hydrogen chloride in the hydrochloric acid process stream prior to removing impurities.

為了降低濃度,可加熱具有高於該流之共沸點之氯化氫濃度的氯化氫製程流以蒸發及生成氯化氫氣體。如上文所描述,加熱及煮沸具有高於共沸點之氯化氫濃度之鹽酸製程流在達到共沸點之前蒸發之氯化氫氣體比蒸發之水多。因此,藉由加熱『過共沸』鹽酸製程流,生成氯化氫氣體,隨後降低製程流之氯化氫濃度直至達到共沸點為止。To reduce the concentration, a hydrochloric acid process stream having a hydrochloric acid concentration above the azeotropic point of the stream may be heated to evaporate and generate hydrochloric acid gas. As described above, heating and boiling a hydrochloric acid process stream having a hydrochloric acid concentration above the azeotropic point evaporates more hydrochloric acid gas than water before the azeotropic point is reached. Thus, by heating a "super-azeotropic" hydrochloric acid process stream, generating hydrochloric acid gas, the hydrochloric acid concentration of the process stream is then reduced until the azeotropic point is reached.

在一個實施例中,鹽酸製程流之加熱係在介於大氣壓(例如約1巴)至約16巴之間的壓力下。鹽酸製程流之壓力可處於至少約1、1.5、2、2.5、3、3.5、4、4.5、5、5.5、6、6.5、7、7.5、8、8.5、9、9.5、10、10.5、11、11.5、12、12.5、13、13.5、14、14.5、15、15.5或16之壓力(以巴為單位)下。鹽酸製程流之壓力可處於小於約16、15.5、15、14.5、14、13.5、13、12.5、12、11.5、11、10.5、10、9.5、9、8.5、8、7.5、7、6.5、6、5.5、5、4.5、4、3.5、3、2.5、2、1.5或1之壓力(以巴為單位)下。壓力可在由此等較高值及/或較低值中之任何兩者提供之範圍內,例如在介於約3巴至約10巴之間,例如介於約3巴至約3.5巴之間的範圍內。根據本文中描述之一些實施例或實例,藉由增加加熱步驟之壓力,降低鹽酸製程流之共沸點,此可生成穩態濃度下之氯化氫氣體。此外,在加熱步驟期間之壓力亦便於所生成之鹽酸再循環流的流體轉移。In one embodiment, the hydrochloric acid process stream is heated at a pressure between atmospheric pressure (e.g., about 1 bar) and about 16 bar. The pressure of the hydrochloric acid process stream may be at least about 1, 1.5, 2, 2.5, 3, 3.5, 4, 4.5, 5, 5.5, 6, 6.5, 7, 7.5, 8, 8.5, 9, 9.5, 10, 10.5, 11, 11.5, 12, 12.5, 13, 13.5, 14, 14.5, 15, 15.5, or 16 bar. The pressure of the hydrochloric acid process stream may be at a pressure (in bar) of less than about 16, 15.5, 15, 14.5, 14, 13.5, 13, 12.5, 12, 11.5, 11, 10.5, 10, 9.5, 9, 8.5, 8, 7.5, 7, 6.5, 6, 5.5, 5, 4.5, 4, 3.5, 3, 2.5, 2, 1.5, or 1. The pressure may be in a range provided by any two of these higher and/or lower values, such as in a range between about 3 bar to about 10 bar, such as in a range between about 3 bar to about 3.5 bar. According to some embodiments or examples described herein, by increasing the pressure of the heating step, the azeotropic point of the hydrochloric acid process stream is reduced, which can generate hydrogen chloride gas at a steady-state concentration. In addition, the pressure during the heating step also facilitates the fluid transfer of the generated hydrochloric acid recycle stream.

在一個實施例中,在可有效降低共沸點之壓力下(例如在高於大氣壓之壓力下)加熱鹽酸製程流以生成氯化氫氣體流且降低鹽酸製程流中之氯化氫濃度。In one embodiment, a hydrochloric acid process stream is heated at a pressure effective to reduce the azeotropic point (e.g., at a pressure above atmospheric pressure) to generate a hydrochloric acid gas stream and reduce the concentration of hydrochloric acid in the hydrochloric acid process stream.

在一個實施例中,加熱鹽酸製程流以生成氯化氫氣體係在約100℃至約200℃之間的溫度下。加熱鹽酸製程流可在至少約100、110、120、130、140、150、160、170、180、190或200之溫度(以℃為單位)下。加熱鹽酸製程流可在小於約200、190、180、170、160、150、140、130、120、110或100之溫度(以℃為單位)下。加熱溫度可為由此等較高值及/或較低值中之任何兩者提供之範圍。In one embodiment, the hydrochloric acid process stream is heated to generate hydrogen chloride gas at a temperature between about 100° C. and about 200° C. The heated hydrochloric acid process stream may be at a temperature of at least about 100, 110, 120, 130, 140, 150, 160, 170, 180, 190, or 200° C. The heated hydrochloric acid process stream may be at a temperature of less than about 200, 190, 180, 170, 160, 150, 140, 130, 120, 110, or 100° C. The heating temperature may be a range provided by any two of these higher values and/or lower values.

在一個實施例中,加熱鹽酸製程流會將氯化氫濃度降低至按該流之重量計約10 wt.%至約25 wt.%之間。加熱鹽酸製程流可將氯化氫濃度(以wt.%為單位)降低至按該流之重量計小於約25、20、15或10。In one embodiment, heating the hydrochloric acid process stream reduces the concentration of hydrogen chloride to between about 10 wt.% and about 25 wt.% based on the weight of the stream. Heating the hydrochloric acid process stream can reduce the concentration of hydrogen chloride (in wt.%) to less than about 25, 20, 15, or 10 based on the weight of the stream.

在一個實施例中,加熱鹽酸製程流會將氯化氫濃度降低至流之共沸點處或附近。在一個實施例中,加熱鹽酸製程流會將氯化氫濃度降低至按該流之重量計高達約25 wt.%之共沸點處或附近。In one embodiment, heating the hydrochloric acid process stream reduces the concentration of hydrogen chloride to at or near the azeotropic point of the stream. In one embodiment, heating the hydrochloric acid process stream reduces the concentration of hydrogen chloride to at or near the azeotropic point up to about 25 wt.% based on the weight of the stream.

在一個實施例中,氯化氫氣體流之至少一部分亦可與含水流(例如水)合併以產生鹽酸洗滌流,該鹽酸洗滌流可再循環且用以洗滌分離之氯化鋁六水合物固體(未繪示)。In one embodiment, at least a portion of the hydrogen chloride gas stream may also be combined with an aqueous stream (e.g., water) to produce a hydrochloric acid wash stream that may be recycled and used to wash the separated aluminum chloride hexahydrate solid (not shown).

在一個實施例中,藉由鹽酸製程流之加熱生成之氯化氫氣體流的至少一部分被再循環以供用作本文中描述之一或多個結晶階段中之氯化氫氣體的來源。In one embodiment, at least a portion of the hydrogen chloride gas stream generated by the heating of the hydrochloric acid process stream is recycled for use as a source of hydrogen chloride gas in one or more of the crystallization stages described herein.

在一個實施例中,降低鹽酸製程流之氯化氫濃度可在汽提器/蒸餾器塔中進行(參見圖3)。In one embodiment, reducing the hydrogen chloride concentration of the hydrochloric acid process stream may be performed in a stripper/distiller column (see FIG. 3 ).

熟習此項技術者應瞭解,自鹽酸製程流之加熱生成之氯化氫氣體流的濃度可取決於所使用之處理單元及該單元中所使用之處理條件而變化。在一個實施例中,自鹽酸製程流之加熱生成之氯化氫氣體流具有按該流之重量計介於約20 wt.%至約100 wt.%之間的氯化氫濃度。氯化氫氣體流可具有按該流之重量計至少約20、25、30、35、40、45、50、52、55、60、65、70 75、80、85、90、92.5或95之氯化氫濃度(以wt.%為單位)。氯化氫氣體流可具有按該流之重量計小於約100、99、97.5、95、92.5 90、85、80、75 70、65、60、55、52、50、45,40、35或30之氯化氫濃度(以wt.%為單位)。氯化氫氣體流可為由此等較高值及/或較低值中之任何兩者提供之範圍,例如介於約20 wt.%至約100 wt.%之間,或介於約40 wt.%至約100 wt.%之間、介於約60 wt.%至約100 wt.%之間或介於約80 wt.%至約100 wt.%之間的範圍。Those skilled in the art will appreciate that the concentration of the hydrogen chloride gas stream generated from the heating of the hydrochloric acid process stream may vary depending on the processing unit used and the processing conditions used in the unit. In one embodiment, the hydrogen chloride gas stream generated from the heating of the hydrochloric acid process stream has a hydrogen chloride concentration between about 20 wt.% and about 100 wt.% based on the weight of the stream. The hydrogen chloride gas stream may have a hydrogen chloride concentration of at least about 20, 25, 30, 35, 40, 45, 50, 52, 55, 60, 65, 70 75, 80, 85, 90, 92.5 or 95 based on the weight of the stream (in wt.%). The hydrogen chloride gas stream may have a hydrogen chloride concentration (in wt.%) of less than about 100, 99, 97.5, 95, 92.5, 90, 85, 80, 75, 70, 65, 60, 55, 52, 50, 45, 40, 35, or 30, based on the weight of the stream. The hydrogen chloride gas stream may be a range provided by any two of these higher and/or lower values, such as between about 20 wt.% and about 100 wt.%, or between about 40 wt.% and about 100 wt.%, between about 60 wt.% and about 100 wt.%, or between about 80 wt.% and about 100 wt.%.

鹽酸製程流包含在沉澱及分離氯化鋁六水合物固體之後保留在液體中之一或多種無機雜質。為了關閉本發明方法之鹽酸環路,需要自製程流中移除該等無機雜質之至少一些或全部,以便避免再引入該等雜質。自製程流中移除該等雜質會產生本文中描述之鹽酸再循環流。The hydrochloric acid process stream contains one or more inorganic impurities that remain in the liquid after precipitation and separation of the aluminum chloride hexahydrate solid. In order to close the hydrochloric acid loop of the method of the present invention, it is necessary to remove at least some or all of the inorganic impurities from the process stream in order to avoid reintroduction of the impurities. Removing the impurities from the process stream produces the hydrochloric acid recycle stream described herein.

在一個實施例中,鹽酸製程流包含按該流之重量計介於約0.1 wt.%至約10 wt.%之間的無機雜質。鹽酸製程流中之無機雜質濃度(以wt.%為單位)可為按該流之重量計至少約0.1、0.2、0.3、0.4、0.5、0.6、0.7、0.8、0.9、1、1.2、1.4、1.6、1.8、2、2.4、2.8、3.2、3.6、4、4.5、5、6、7、8、9或10。鹽酸製程流中之無機雜質濃度(以wt.%為單位)可為按該流之重量計小於約10、9、8、7、6、5、4.5、4、3.6、3.2、2.8、2.4、2、1.8、1.6、1.4、1.2、1、0.9、0.8、0.7、0.6、0.5、0.4、0.3、0.2或0.1。濃度可為由此等較高值及/或較低值中之任何兩者提供之範圍,例如介於約0.5 wt.%至約1.5 wt.%之間的範圍。In one embodiment, the hydrochloric acid process stream comprises between about 0.1 wt.% and about 10 wt.% inorganic impurities based on the weight of the stream. The concentration of inorganic impurities in the hydrochloric acid process stream (in wt.%) may be at least about 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, 1, 1.2, 1.4, 1.6, 1.8, 2, 2.4, 2.8, 3.2, 3.6, 4, 4.5, 5, 6, 7, 8, 9, or 10 based on the weight of the stream. The concentration of inorganic impurities in the hydrochloric acid process stream (in wt.%) can be less than about 10, 9, 8, 7, 6, 5, 4.5, 4, 3.6, 3.2, 2.8, 2.4, 2, 1.8, 1.6, 1.4, 1.2, 1, 0.9, 0.8, 0.7, 0.6, 0.5, 0.4, 0.3, 0.2, or 0.1 based on the weight of the stream. The concentration can be a range provided by any two of these higher and/or lower values, such as a range between about 0.5 wt.% to about 1.5 wt.%.

可藉由任何合適之方法,例如使用合適之雜質移除單元自鹽酸製程流中移除雜質。用於自鹽酸製程流中移除雜質之合適方法之實例包括蒸餾、離子交換及沉澱。Impurities may be removed from the hydrochloric acid process stream by any suitable method, such as using a suitable impurity removal unit. Examples of suitable methods for removing impurities from the hydrochloric acid process stream include distillation, ion exchange, and precipitation.

在一個實施例中,自鹽酸製程流中移除雜質包含蒸餾鹽酸製程流。在一個實施例中,自鹽酸製程流中移除雜質包含在該流之共沸點處或附近蒸餾鹽酸製程流。蒸餾鹽酸製程流(諸如經由共沸蒸餾)會蒸發及再冷凝鹽酸流且產生作為單獨流的包含雜質之無機雜質流。將瞭解,再冷凝之鹽酸流係如本文所描述之鹽酸再循環流。In one embodiment, removing impurities from a hydrochloric acid process stream comprises distilling the hydrochloric acid process stream. In one embodiment, removing impurities from a hydrochloric acid process stream comprises distilling the hydrochloric acid process stream at or near the azeotropic point of the stream. Distilling the hydrochloric acid process stream (such as by azeotropic distillation) evaporates and recondenses the hydrochloric acid stream and produces an inorganic impurity stream containing impurities as a separate stream. It will be understood that the recondensed hydrochloric acid stream is a hydrochloric acid recycle stream as described herein.

濃縮具有一或多種無機雜質之無機雜質流(亦即,淨化流)。在一個實施例中,無機雜質流具有按該流之重量計至少約1、1.5、2、2.5、3、3.5、4、4.5、5、6、8或10之無機雜質濃度(以wt.%為單位)。Concentrating an inorganic impurity stream (i.e., a purified stream) having one or more inorganic impurities. In one embodiment, the inorganic impurity stream has an inorganic impurity concentration (in wt. %) of at least about 1, 1.5, 2, 2.5, 3, 3.5, 4, 4.5, 5, 6, 8, or 10 based on the weight of the stream.

在一個實施例中,鹽酸再循環流包含按該流之重量計小於約0.5、0.1、0.05、0.01、0.005或0.001 wt.%之無機雜質。在一個實施例中,鹽酸再循環流基本上不含無機雜質(例如,係純化流)。In one embodiment, the hydrochloric acid recycle stream comprises less than about 0.5, 0.1, 0.05, 0.01, 0.005 or 0.001 wt.% of inorganic impurities based on the weight of the stream. In one embodiment, the hydrochloric acid recycle stream is substantially free of inorganic impurities (e.g., a purified stream).

在一個實施例中,鹽酸再循環流具有按該流之重量計介於約5 wt.%至約40 wt.%之間的氯化氫濃度。鹽酸再循環流可具有按該流之重量計至少約5、8、10、12、15、17、19、20、21、22、25、28、30、32、35或40之氯化氫濃度(以wt.%為單位)。鹽酸再循環流可具有按該流之重量計小於約40、35、32、30、28、25、22、21、20、19、17、15、12、10、8或5之氯化氫濃度(以wt.%為單位)。氯化氫濃度可為由此等較高值及/或較低值中之任何兩者提供之範圍,例如按該流之重量計介於約15 wt.%至約35 wt.%之間的範圍。In one embodiment, the hydrochloric acid recycle stream has a hydrogen chloride concentration of between about 5 wt.% and about 40 wt.% based on the weight of the stream. The hydrochloric acid recycle stream may have a hydrogen chloride concentration of at least about 5, 8, 10, 12, 15, 17, 19, 20, 21, 22, 25, 28, 30, 32, 35, or 40 based on the weight of the stream (in wt.%). The hydrochloric acid recycle stream may have a hydrogen chloride concentration of less than about 40, 35, 32, 30, 28, 25, 22, 21, 20, 19, 17, 15, 12, 10, 8, or 5 based on the weight of the stream (in wt.%). The hydrogen chloride concentration may be in a range provided by any two of these higher values and/or lower values, such as a range between about 15 wt.% to about 35 wt.% based on the weight of the stream.

在一個實施例中,鹽酸再循環流中之氯化氫濃度低於鹽酸製程流中之氯化氫濃度。舉例而言,如本文所描述,在移除一或多種無機雜質之前降低製程流中之氯化氫濃度。在一個實施例中,鹽酸再循環流具有按該流之重量計介於約5 wt.%至約30 wt.%之間的氯化氫濃度。再循環流中之氯化氫濃度(以wt.%為單位)可為按該流之重量計小於約35、30、25、20、18、15、10或5。範圍可由此等值中之任何兩者提供,例如按該流之重量計介於約5 wt.%至25 wt.%、約10 wt.%至約25 wt.%之間,例如介於約18 wt.%至約20 wt.%之間。In one embodiment, the concentration of hydrogen chloride in the hydrochloric acid recycle stream is lower than the concentration of hydrogen chloride in the hydrochloric acid process stream. For example, as described herein, the concentration of hydrogen chloride in the process stream is reduced before removing one or more inorganic impurities. In one embodiment, the hydrochloric acid recycle stream has a hydrogen chloride concentration between about 5 wt.% and about 30 wt.% based on the weight of the stream. The concentration of hydrogen chloride in the recycle stream (in wt.%) can be less than about 35, 30, 25, 20, 18, 15, 10, or 5 based on the weight of the stream. Ranges may be provided between any two of these equivalent values, such as between about 5 wt.% to 25 wt.%, about 10 wt.% to about 25 wt.%, such as between about 18 wt.% to about 20 wt.%, based on the weight of the stream.

在一些實施例中,氯化氫再循環流之至少一部分接著再循環以供用作在步驟a)中消化氯化鋁六水合物固體之鹽酸。用於消化之鹽酸流之此種再循環(相較於使用水)係反常的,因為這降低了氯化鋁六水合物之溶解度且歸因於同離子效應而減小了能夠溶解及消化之氯化鋁六水合物固體的量。這就解釋了為什麼此類酸流在製程中習知地不被再循環及再利用。然而,根據本文中描述之一些實施例或實例,本發明人意外地確定,可再生及再循環鹽酸同時並降低製程之操作成本且維持高純度氧化鋁生產率。具體地,再循環鹽酸流以供在步驟a)中使用可降低鹽酸製程流為產生HCl氣體而必須被蒸餾的程度(例如見表1)。這可降低在酸再生迴路中之資本及能量需求,且可完全抵消藉由減小步驟a)中可以溶解之氯化鋁六水合物固體的量而產生之任何損失。此外,藉由提高經消化氯化鋁液體之酸濃度,在一些實施例中,在用於結晶及沉澱氯化鋁之後續噴灑期間,每公升液體所需之氯化氫氣體較少。In some embodiments, at least a portion of the hydrogen chloride recycle stream is then recycled for use as hydrochloric acid for digesting the aluminum chloride hexahydrate solids in step a). Such recycling of the hydrochloric acid stream for digestion (compared to using water) is unusual because it reduces the solubility of aluminum chloride hexahydrate and reduces the amount of aluminum chloride hexahydrate solids that can be dissolved and digested due to the same ion effect. This explains why such acid streams are not conventionally recycled and reused in the process. However, according to some embodiments or examples described herein, the inventors unexpectedly determined that hydrochloric acid can be regenerated and recycled while reducing the operating costs of the process and maintaining a high purity alumina production rate. Specifically, recycling the hydrochloric acid stream for use in step a) can reduce the extent to which the hydrochloric acid process stream must be distilled to produce HCl gas (see, for example, Table 1). This can reduce capital and energy requirements in the acid regeneration loop and can completely offset any losses incurred by reducing the amount of aluminum chloride hexahydrate solid that can be dissolved in step a). In addition, by increasing the acid concentration of the digested aluminum chloride liquid, in some embodiments, less hydrogen chloride gas is required per liter of liquid during subsequent spraying for crystallization and precipitation of aluminum chloride.

可替代地或另外,鹽酸再循環流之至少一部分可再循環以供用作消化含鋁材料之鹽酸,如本文所描述。Alternatively or additionally, at least a portion of the hydrochloric acid recycle stream may be recycled for use as hydrochloric acid for digesting aluminum-containing materials, as described herein.

在一個實施例中,在雜質移除之後,鹽酸再循環流可具有介於約20℃至約100℃之間的溫度。鹽酸再循環流可具有至少約20、30、40、50、60、70、80、90或100之溫度(以℃為單位)。鹽酸再循環流可具有小於約100、90、80、70、60、50、40、30或20之溫度(以℃為單位)。範圍可由此等較高值及/或較低值中之任何兩者提供。根據本文中描述之一些實施例或實例,經加熱之再循環流提供一或多個優勢,諸如降低再消化氯化鋁六水合物固體所需之溫度,及/或增加氯化鋁六水合物固體之溶解速率。In one embodiment, after impurity removal, the hydrochloric acid recycle stream may have a temperature between about 20° C. and about 100° C. The hydrochloric acid recycle stream may have a temperature of at least about 20, 30, 40, 50, 60, 70, 80, 90, or 100° C. The hydrochloric acid recycle stream may have a temperature of less than about 100, 90, 80, 70, 60, 50, 40, 30, or 20° C. The range may be provided by any two of these higher and/or lower values. According to some embodiments or examples described herein, the heated recycle stream provides one or more advantages, such as reducing the temperature required to re-digest the aluminum chloride hexahydrate solids and/or increasing the dissolution rate of the aluminum chloride hexahydrate solids.

在一些實施例中,在將鹽酸再循環流再循環至步驟a)之前或除此之外,將鹽酸再循環流之至少一部分引入至吸收單元中,以自熱分解及/或煅燒爐生成之熱氣體中冷凝且吸收氯化氫(如下描述) 。包含自熱分解及/或煅燒爐氣體所吸收之氯化氫之所得富集鹽酸流接著可與鹽酸製程流合併(參見圖3)。在一個實施例中,來自吸收單元之未冷凝氣體可被分離且轉移至已引入了再循環流之尾塔,該尾塔充當用以在引入至吸收單元之前吸收包括未冷凝氣體之氣體的滌氣器(參見圖3)。In some embodiments, before or in addition to recycling the hydrochloric acid recycle stream to step a), at least a portion of the hydrochloric acid recycle stream is introduced into an absorption unit to condense and absorb hydrogen chloride from the hot gases generated by the thermal decomposition and/or calciner (described below). The resulting enriched hydrochloric acid stream containing hydrogen chloride absorbed from the thermal decomposition and/or calciner gases can then be combined with the hydrochloric acid process stream (see Figure 3). In one embodiment, the uncondensed gases from the absorption unit can be separated and transferred to a tailing tower into which the recycle stream has been introduced, the tailing tower acting as a degasifier for absorbing the gas including the uncondensed gases before being introduced into the absorption unit (see Figure 3).

在一些實施例中,在運送至雜質移除步驟f)之前或除此之外,將鹽酸製程流之至少一部分引入至吸收單元中,以自熱分解及/或煅燒爐生成之熱氣體冷凝且吸收氯化氫(如下描述)。在一個實施例中,包含自熱分解及/或煅燒爐氣體所吸收之氯化氫之富集鹽酸流可與鹽酸製程流合併(參見圖3)。在一個實施例中,來自吸收單元之未冷凝氣體可被分離且轉移至已引入了再循環流之尾塔,該尾塔充當用以在引入至吸收單元之前吸收包括未冷凝氣體之氣體的滌氣器(參見圖3)。In some embodiments, before or in addition to being sent to the impurity removal step f), at least a portion of the hydrochloric acid process stream is introduced into an absorption unit to condense and absorb hydrogen chloride from hot gases generated by the thermal decomposition and/or calciner (described below). In one embodiment, the enriched hydrochloric acid stream containing hydrogen chloride absorbed by the thermal decomposition and/or calciner gases can be combined with the hydrochloric acid process stream (see Figure 3). In one embodiment, the uncondensed gases from the absorption unit can be separated and transferred to a tail tower into which a recycle stream has been introduced, which serves as a degasifier for absorbing gases including uncondensed gases before being introduced into the absorption unit (see Figure 3).

在一些實施例中,在運送至雜質移除步驟f)之前或除此之外,將自步驟e)獲得之較低濃度鹽酸製程流之至少一部分引入至吸收單元中,以自熱分解及/或煅燒爐生成之熱氣體冷凝且吸收氯化氫(如下描述) (參見圖3)。在一個實施例中,來自吸收單元之未冷凝氣體可被分離且轉移至已引入了再循環流之尾塔,該尾塔充當用以在引入至吸收單元之前吸收包括未冷凝氣體之氣體的滌氣器(參見圖3)。In some embodiments, before or in addition to being sent to the impurity removal step f), at least a portion of the lower concentration hydrochloric acid process stream obtained from step e) is introduced into an absorption unit to condense and absorb hydrogen chloride (described below) from hot gases generated by the thermal decomposition and/or calciner (see FIG. 3 ). In one embodiment, the uncondensed gas from the absorption unit can be separated and transferred to a tailing tower into which a recycle stream has been introduced, the tailing tower acting as a degasifier for absorbing the gas including the uncondensed gas before being introduced into the absorption unit (see FIG. 3 ).

在一個實施例中,包含自熱分解氣體所吸收之氯化氫之富集鹽酸流具有按該流之重量計至少約25、26、27、28、29、30、31、32、33、34、35、36、37、38、39或40之氯化氫濃度(以wt.%為單位)。富集鹽酸流可具有按該流之重量計小於約40、39、38、37、36、35、34、33、32、31、30、29、28、27、26或25之氯化氫濃度(以wt.%為單位)。富集鹽酸流之氯化氫濃度可為由此等較高值及/或較低值中之任何兩者提供之範圍,例如介於約28 wt.%至約37 wt.%之間的範圍。In one embodiment, the enriched hydrochloric acid stream comprising hydrogen chloride absorbed from the thermal decomposition gas has a hydrogen chloride concentration (in wt.%) of at least about 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39 or 40 based on the weight of the stream. The enriched hydrochloric acid stream may have a hydrogen chloride concentration (in wt.%) of less than about 40, 39, 38, 37, 36, 35, 34, 33, 32, 31, 30, 29, 28, 27, 26 or 25 based on the weight of the stream. The hydrogen chloride concentration of the enriched hydrochloric acid stream may be in a range provided by any two of these higher values and/or lower values, for example, in a range between about 28 wt.% to about 37 wt.%.

在一個實施例中,包含自熱分解氣體所吸收之氯化氫之富集鹽酸流可與鹽酸製程流合併(參見圖3)。在一個實施例中,包含藉由熱分解生成之所吸收氯化氫之富集鹽酸流可在鹽酸製程流饋入汽提塔之前與鹽酸製程流合併(參見圖3)。In one embodiment, an enriched hydrochloric acid stream comprising hydrogen chloride absorbed from the thermal decomposition gases may be combined with the hydrochloric acid process stream (see FIG. 3 ). In one embodiment, an enriched hydrochloric acid stream comprising absorbed hydrogen chloride generated by thermal decomposition may be combined with the hydrochloric acid process stream before the hydrochloric acid process stream is fed to the stripping column (see FIG. 3 ).

在一個實施例中,包含自煅燒爐氣體所吸收之氯化氫之富集鹽酸流具有按該流之重量計至少約25、26、27、28、29、30、31、32、33、34、35、36、37、38、39或40之氯化氫濃度(以wt.%為單位)。富集鹽酸流可具有按該流之重量計小於約40、39、38、37、36、35、34、33、32、31、30、29、28、27、26或25之氯化氫濃度(以wt.%為單位)。富集鹽酸流之氯化氫濃度可為由此等較高值及/或較低值中之任何兩者提供之範圍,例如介於約28 wt.%至約37 wt.%之間的範圍。In one embodiment, the enriched hydrochloric acid stream comprising hydrogen chloride absorbed from the calciner gas has a hydrogen chloride concentration (in wt.%) of at least about 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39 or 40 based on the weight of the stream. The enriched hydrochloric acid stream may have a hydrogen chloride concentration (in wt.%) of less than about 40, 39, 38, 37, 36, 35, 34, 33, 32, 31, 30, 29, 28, 27, 26 or 25 based on the weight of the stream. The hydrogen chloride concentration of the enriched hydrochloric acid stream may be in a range provided by any two of these higher values and/or lower values, for example, in a range between about 28 wt.% to about 37 wt.%.

在一個實施例中,包含自煅燒爐所吸收之氯化氫之富集鹽酸流可與鹽酸製程流合併(參見圖3)。在一個實施例中,包含自煅燒爐所吸收之氯化氫之富集鹽酸流可在鹽酸製程流饋入汽提塔之前與鹽酸製程流合併(參見圖3)。In one embodiment, the enriched hydrochloric acid stream comprising hydrogen chloride absorbed from the calciner can be combined with the hydrochloric acid process stream (see Figure 3). In one embodiment, the enriched hydrochloric acid stream comprising hydrogen chloride absorbed from the calciner can be combined with the hydrochloric acid process stream before the hydrochloric acid process stream is fed into the stripper (see Figure 3).

在一個實施例中,可將水流引入至鹽酸再循環流中以稀釋氯化氫濃度。 自所沉澱之氯化鋁六水合物固體產生高純度氧化鋁 In one embodiment, a water stream may be introduced into the hydrochloric acid recycle stream to dilute the hydrogen chloride concentration. High purity alumina is produced from the precipitated aluminum chloride hexahydrate solid .

接著可處理自步驟c)分離之經沉澱氯化鋁六水合物固體以形成高純度氧化鋁。在一個實施例中,處理所分離之氯化鋁六水合物固體以形成高純度氧化鋁包含在一或多個加熱階段中熱處理所分離之氯化鋁六水合物固體。The precipitated aluminum chloride hexahydrate solid separated from step c) can then be treated to form high purity alumina. In one embodiment, treating the separated aluminum chloride hexahydrate solid to form high purity alumina comprises heat treating the separated aluminum chloride hexahydrate solid in one or more heating stages.

舉例而言,將氯化鋁六水合物沉澱物加熱至自200℃至900℃之第一溫度以熱分解該等固體。可將氯化鋁六水合物沉澱物加熱至至少約200、250、300、350、400、450、500、550、600、650、700、750、800、850或900之第一溫度(以℃為單位)。可將氯化鋁六水合物沉澱物加熱至小於約900、850、800、750、700、650、600、550、500、450、400、350、300、250或200之第一溫度(以℃為單位)。第一溫度可為由此等較高值及/或較低值中之任何兩者提供之範圍。For example, the aluminum chloride hexahydrate precipitate is heated to a first temperature of from 200° C. to 900° C. to thermally decompose the solids. The aluminum chloride hexahydrate precipitate may be heated to a first temperature of at least about 200, 250, 300, 350, 400, 450, 500, 550, 600, 650, 700, 750, 800, 850, or 900° C. The aluminum chloride hexahydrate precipitate may be heated to a first temperature of less than about 900, 850, 800, 750, 700, 650, 600, 550, 500, 450, 400, 350, 300, 250, or 200° C. The first temperature may be a range provided by any two of the higher values and/or the lower values.

在熱分解期間散出之任何氯化氫氣體可再生為用於消化本文中描述之氯化鋁六水合物固體之鹽酸及/或用於在本文中描述之一或多個結晶階段中沉澱氯化鋁六水合物固體之氯化氫氣體,如圖3中所概述。在一些實施例中,在熱分解期間散出之鹽酸氣體具有按該流之重量計介於約30 wt.%至約70 wt.%之間的氯化氫濃度。在熱分解期間散出之鹽酸氣體可具有按該流之重量計至少約30、35、40、45、50、52、55、60、65或70之氯化氫濃度(以wt.%為單位)。在熱分解期間散出之鹽酸氣體可具有按該流之重量計小於約70、65、60、55、52、50、45、40、35或30之氯化氫濃度(以wt.%為單位)。在熱分解期間散出之鹽酸氣體可為由此等較高值及/或較低值中之任何兩者提供之範圍,例如按該流之重量計介於約30 wt.%至約70 wt.%之間、介於約40 wt.%至約60 wt.%之間,或介於約45 wt.%至約55 wt.%之間的範圍。在一個實施例中,在熱分解期間散出之鹽酸氣體之氯化氫濃度可大於鹽酸製程流中之鹽酸濃度。Any hydrogen chloride gas emitted during the thermal decomposition can be regenerated as hydrochloric acid for digesting the aluminum chloride hexahydrate solid described herein and/or hydrogen chloride gas for precipitating the aluminum chloride hexahydrate solid in one or more crystallization stages described herein, as summarized in Figure 3. In some embodiments, the hydrochloric acid gas emitted during the thermal decomposition has a hydrogen chloride concentration of between about 30 wt.% and about 70 wt.% based on the weight of the stream. The hydrochloric acid gas emitted during the thermal decomposition may have a hydrogen chloride concentration of at least about 30, 35, 40, 45, 50, 52, 55, 60, 65, or 70 based on the weight of the stream (in wt.%). The hydrochloric acid gas emitted during the thermal decomposition may have a hydrogen chloride concentration (in wt.%) of less than about 70, 65, 60, 55, 52, 50, 45, 40, 35, or 30, based on the weight of the stream. The hydrochloric acid gas emitted during the thermal decomposition may be a range provided by any two of these higher values and/or lower values, such as a range of about 30 wt.% to about 70 wt.%, about 40 wt.% to about 60 wt.%, or about 45 wt.% to about 55 wt.%, based on the weight of the stream. In one embodiment, the hydrogen chloride concentration of the hydrochloric acid gas emitted during the thermal decomposition may be greater than the hydrochloric acid concentration in the hydrochloric acid process stream.

在一個實施例中,隨後在自900℃至1300℃之第二溫度下煅燒第一加熱階段之後的熱分解固體以產生高純度氧化鋁。可在至少約900、950、1000、1050、1100、1150、1200、1250或1300之第二溫度(以℃為單位)下煅燒該等熱分解固體。可在小於約1300、1250、1200、1150、1100、1050、1000、950或900之第二溫度(以℃為單位)下煅燒該等熱分解固體。煅燒溫度可為由此等較高值及/或較低值中之任何兩者提供之範圍。In one embodiment, the pyrolyzed solid after the first heating stage is then calcined at a second temperature of from 900° C. to 1300° C. to produce high purity alumina. The pyrolyzed solids may be calcined at a second temperature (in ° C.) of at least about 900, 950, 1000, 1050, 1100, 1150, 1200, 1250, or 1300. The pyrolyzed solids may be calcined at a second temperature (in ° C.) of less than about 1300, 1250, 1200, 1150, 1100, 1050, 1000, 950, or 900. The calcination temperature may be a range provided by any two of the higher and/or lower values.

可在煅燒期間散出之任何氯化氫氣體可再生為用於消化本文中描述之氯化鋁六水合物固體之鹽酸及/或用於在本文中描述之一或多個結晶階段中沉澱氯化鋁六水合物固體之氯化氫氣體,如圖3中所概述。在一些實施例中,在煅燒期間散出之氯化氫氣體具有按該流之重量計介於約30 wt.%至約70 wt.%之間的氯化氫濃度。在煅燒期間散出之鹽酸氣體可具有按該流之重量計至少約30、35、40、45、50、52、55、60、65或70之氯化氫濃度(以wt.%為單位)。在煅燒期間散出之鹽酸氣體可具有按該流之重量計小於約70、65、60、55、52、50、45,40、35或30之氯化氫濃度(以wt.%為單位)。在煅燒期間散出之鹽酸氣體可為由此等較高值及/或較低值中之任何兩者提供之範圍,例如按該流之重量計介於約30 wt.%至約70 wt.%之間、介於約40 wt.%至約60 wt.%之間,或介於約45 wt.%至約55 wt.%之間的範圍。在一個實施例中,在煅燒期間散出之鹽酸氣體之氯化氫濃度可大於鹽酸製程流中之鹽酸濃度。Any hydrogen chloride gas that may be emitted during calcination may be regenerated as hydrochloric acid for digesting the aluminum chloride hexahydrate solids described herein and/or for precipitating the aluminum chloride hexahydrate solids in one or more crystallization stages described herein, as summarized in Figure 3. In some embodiments, the hydrogen chloride gas emitted during calcination has a hydrogen chloride concentration of between about 30 wt.% and about 70 wt.% based on the weight of the stream. The hydrochloric acid gas emitted during calcination may have a hydrogen chloride concentration of at least about 30, 35, 40, 45, 50, 52, 55, 60, 65, or 70 based on the weight of the stream (in wt.%). The hydrochloric acid gas emitted during calcination may have a hydrogen chloride concentration (in wt.%) of less than about 70, 65, 60, 55, 52, 50, 45, 40, 35, or 30, based on the weight of the stream. The hydrochloric acid gas emitted during calcination may be a range provided by any two of these higher values and/or lower values, such as a range of about 30 wt.% to about 70 wt.%, about 40 wt.% to about 60 wt.%, or about 45 wt.% to about 55 wt.%, based on the weight of the stream. In one embodiment, the hydrogen chloride concentration of the hydrochloric acid gas emitted during calcination may be greater than the hydrochloric acid concentration in the hydrochloric acid process stream.

藉由控制自含鋁材料形成之初始氯化鋁液體之雜質移除且採取措施以經由根據本發明在鹽酸中實施一或多個消化步驟來減少氯化鋁六水合物固體中之雜質含量,可自多種含鋁材料可靠地達成大於99.99%純度(4N)或大於99.999%純度(5N)之較高純度氧化鋁。By controlling the removal of impurities from the initial aluminum chloride liquid formed from the aluminum-containing material and taking steps to reduce the impurity content in the aluminum chloride hexahydrate solid by performing one or more digestion steps in hydrochloric acid according to the present invention, higher purity alumina of greater than 99.99% purity (4N) or greater than 99.999% purity (5N) can be reliably achieved from a variety of aluminum-containing materials.

為了幫助將在結晶期間之雜質引入降至最低,一部分所形成之高純度氧化鋁可視情況地再循環以在一或多個上游沉澱步驟中對氯化鋁液體種晶。 自含鋁材料製備氯化鋁液體 To help minimize the introduction of impurities during crystallization, a portion of the high purity alumina formed may optionally be recycled to seed the aluminum chloride liquid in one or more upstream precipitation steps.

可藉由以下步驟來提供步驟a)中之初始氯化鋁六水合物固體:在鹽酸中消化含鋁材料以提供氯化鋁液體,及自該氯化鋁液體沉澱及分離氯化鋁六水合物固體以獲得氯化鋁六水合物固體且產生鹽酸製程流。在本文中描述自氯化鋁液體沉澱氯化鋁六水合物固體。The initial aluminum chloride hexahydrate solid in step a) can be provided by digesting an aluminum-containing material in hydrochloric acid to provide an aluminum chloride liquid, and precipitating and separating the aluminum chloride hexahydrate solid from the aluminum chloride liquid to obtain the aluminum chloride hexahydrate solid and produce a hydrochloric acid process stream. Precipitating the aluminum chloride hexahydrate solid from the aluminum chloride liquid is described herein.

在一個實施例中,本文中描述之鹽酸再循環流被再循環以供用作消化含鋁材料之鹽酸。In one embodiment, the hydrochloric acid recycle stream described herein is recycled for use as hydrochloric acid for digesting aluminum-containing materials.

在一個態樣或實施例中,提供一種自含鋁材料製備高純度氧化鋁之方法,該方法包含: a)在鹽酸中消化含鋁材料以提供在溶液中包含氯化鋁及一或多種雜質之氯化鋁液體; b)在一或多個結晶階段中自該液體中沉澱氯化鋁六水合物固體,使得該等無機雜質中之至少一些保留在該液體中; c)自該液體中分離所沉澱之氯化鋁六水合物固體,以產生包含該等無機雜質之鹽酸製程流; d)處理所分離之氯化鋁六水合物固體以形成高純度氧化鋁; e)視情況降低該鹽酸製程流中之氯化氫濃度;及 f)自鹽酸製程流中移除該等無機雜質中之至少一些,以產生鹽酸再循環流,該鹽酸再循環流被再循環以供用作步驟a)中用以消化含鋁材料之鹽酸。 In one embodiment, a method for preparing high purity alumina from an aluminum-containing material is provided, the method comprising: a) digesting the aluminum-containing material in hydrochloric acid to provide an aluminum chloride liquid containing aluminum chloride and one or more impurities in solution; b) precipitating an aluminum chloride hexahydrate solid from the liquid in one or more crystallization stages such that at least some of the inorganic impurities remain in the liquid; c) separating the precipitated aluminum chloride hexahydrate solid from the liquid to produce a hydrochloric acid process stream containing the inorganic impurities; d) treating the separated aluminum chloride hexahydrate solid to form high purity alumina; e) optionally reducing the concentration of hydrogen chloride in the hydrochloric acid process stream; and f) removing at least some of the inorganic impurities from the hydrochloric acid process stream to produce a hydrochloric acid recycle stream, which is recycled for use as hydrochloric acid for digesting the aluminum-containing material in step a).

在一個實施例中,步驟b)包含在兩個或更多個結晶階段中自氯化鋁液體中沉澱氯化鋁六水合物固體,其中在各結晶階段之間,在鹽酸再循環流中消化所分離之氯化鋁六水合物以產生氯化鋁液體,如本文所描述。In one embodiment, step b) comprises precipitating aluminum chloride hexahydrate solid from aluminum chloride liquid in two or more crystallization stages, wherein between each crystallization stage, the separated aluminum chloride hexahydrate is digested in a hydrochloric acid recycle stream to produce aluminum chloride liquid, as described herein.

將瞭解,除非另外說明,否則本文中關於鹽酸製程流及/或再循環以用作消化氯化鋁六水合物固體之鹽酸之鹽酸再循環流所描述之實施例及實例可同樣適用於鹽酸製程流及/或再循環以用作消化本文中描述之含鋁材料之鹽酸的鹽酸再循環流。It will be understood that, unless otherwise stated, the embodiments and examples described herein with respect to hydrochloric acid process streams and/or hydrochloric acid recycle streams that are recycled for use as hydrochloric acid to digest aluminum chloride hexahydrate solids may be equally applicable to hydrochloric acid process streams and/or hydrochloric acid recycle streams that are recycled for use as hydrochloric acid to digest aluminum-containing materials described herein.

含鋁材料可經歷數個預處理及處理步驟以便形成在溶液中包含氯化鋁及一或多種無機雜質之氯化鋁液體。The aluminum-containing material may undergo several pretreatment and treatment steps in order to form an aluminum chloride liquid comprising aluminum chloride and one or more inorganic impurities in solution.

原樣接收之含鋁材料可在經歷消化以形成氯化鋁液體之前經歷一或多個預處理步驟。該(等)預處理步驟可為任何一或多個選礦製程,包括但不限於聚集(concentration)、用以除去該材料中諸如砂石或石英之脈石的重力分離,或粉碎至1 μm至200 μm之粒度。The aluminum-containing material as received may be subjected to one or more pre-treatment steps before being subjected to digestion to form an aluminum chloride liquid. The pre-treatment step(s) may be any one or more mineral processing steps including, but not limited to, concentration, gravity separation to remove veins such as sand or quartz from the material, or crushing to a particle size of 1 μm to 200 μm.

將瞭解,諸如煅燒爐粉塵之某些含鋁材料可包括吸留蘇打及表面蘇打。在煅燒爐粉塵進入製程迴路之前,可藉由用二氧化碳洗滌煅燒爐粉塵以移除作為碳酸氫鈉之表面蘇打,從而自煅燒爐粉塵容易地移除表面蘇打。洗滌過的煅燒爐粉塵隨後在進入製程迴路之前可被過濾且用水洗滌以移除殘留之碳酸氫鈉。It will be appreciated that certain aluminum-containing materials such as calciner dust may include occluded soda and surface soda. The surface soda may be readily removed from the calciner dust by washing the calciner dust with carbon dioxide to remove the surface soda as sodium bicarbonate before the calciner dust enters the process loop. The washed calciner dust may then be filtered and washed with water to remove residual sodium bicarbonate before entering the process loop.

可替代地,可藉由用水洗滌而自煅燒爐粉塵至少部分地移除可溶性表面蘇打。經洗滌之煅燒爐粉塵隨後在進入製程迴路之前可被過濾。Alternatively, the soluble surface soda can be at least partially removed from the calciner dust by washing with water. The washed calciner dust can then be filtered before entering the process loop.

在一實施例中,可自拜耳法迴路提供三水鋁石饋料,其中三水鋁石饋料可視情況經歷一或多個自拜耳法迴路內所包括之鹼溶液中再結晶之步驟,藉此除去該饋料中之一或多種雜質,尤其係蘇打。In one embodiment, the alumina feed may be provided from a Bayer process loop, wherein the alumina feed may optionally be subjected to one or more steps of recrystallization from an alkaline solution included in the Bayer process loop, thereby removing one or more impurities in the feed, in particular soda.

在另一實施例中,可提供諸如高嶺土之含鋁黏土饋料。In another embodiment, an aluminum-containing clay feed such as kaolin may be provided.

製備高純度氧化鋁之方法可包括用鹽酸消化含鋁材料以產生氯化鋁液體。鹽酸可具有自5 M至12 M HCl、6至11 M HCl、6至10 M HCl或7 M至9 M HCl之濃度。The method of preparing high purity alumina may include digesting an aluminum-containing material with hydrochloric acid to produce an aluminum chloride liquid. The hydrochloric acid may have a concentration of from 5 M to 12 M HCl, 6 to 11 M HCl, 6 to 10 M HCl, or 7 M to 9 M HCl.

所得氯化鋁液體之HCl濃度可在自0 M至2 M之範圍內。舉例而言,所得氯化鋁液體之HCl濃度可為約0 M、0.5 M、1 M、1.5 M或2 M。將瞭解,消化步驟可以分批模式或連續模式進行。消化步驟可在單個反應器(容器)或串聯配置之複數個反應器(例如多達5個容器,諸如3個容器)中進行,使得串聯之各容器中之液體中的HCl濃度按級聯次序自約10 M降至約2 M。The HCl concentration of the resulting aluminum chloride liquid may range from 0 M to 2 M. For example, the HCl concentration of the resulting aluminum chloride liquid may be about 0 M, 0.5 M, 1 M, 1.5 M, or 2 M. It will be appreciated that the digestion step may be performed in a batch mode or a continuous mode. The digestion step may be performed in a single reactor (vessel) or in a plurality of reactors (e.g., up to 5 vessels, such as 3 vessels) configured in series, such that the HCl concentration in the liquid in each vessel in the series decreases from about 10 M to about 2 M in a cascade order.

在一個實施例中,本文中描述之鹽酸再循環流可引入至串聯配置之反應器中的一或多者中,其中鹽酸再循環流中之氯化氫濃度係在一或多個反應器中之氯化氫濃度處或附近。可替代地或另外,鹽酸流可引入至鹽酸再循環流中以在消化本文中描述之一或多個反應器中之含鋁材料之前濃縮氯化氫濃度。In one embodiment, the hydrochloric acid recycle stream described herein may be introduced into one or more of the reactors configured in series, wherein the concentration of hydrogen chloride in the hydrochloric acid recycle stream is at or near the concentration of hydrogen chloride in the one or more reactors. Alternatively or in addition, the hydrochloric acid stream may be introduced into the hydrochloric acid recycle stream to concentrate the hydrogen chloride concentration prior to digesting the aluminum-containing material in one or more reactors described herein.

所得混合物可具有高達50% w/w之初始固體含量,不過將瞭解,混合物之固體含量將隨消化進展而減小。The resulting mixture may have an initial solids content of up to 50% w/w, although it will be appreciated that the solids content of the mixture will decrease as digestion progresses.

酸消化可在自周圍溫度至所得氯化鋁液體之常壓沸點的溫度下進行。酸消化可在至少約(以℃為單位) 25、30、35、40、45、50、55、60、65、70、75、80、85、90或95之溫度下進行。酸消化可在小於約(以℃為單位) 100、95、90、85、80、75、70、65、60、55、50、45、40、35或30之溫度下進行。酸消化可在此等較高量及較低量中之任何兩者之間,諸如約25℃至100℃、50℃至95℃、70℃至90℃,或75℃至85℃之間,例如約80℃之溫度下進行。The acid digestion can be carried out at a temperature ranging from ambient temperature to the atmospheric boiling point of the resulting aluminum chloride liquid. The acid digestion can be carried out at a temperature of at least about (in ° C) 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85, 90 or 95. The acid digestion can be carried out at a temperature of less than about (in ° C) 100, 95, 90, 85, 80, 75, 70, 65, 60, 55, 50, 45, 40, 35 or 30. The acid digestion can be carried out at a temperature between any two of these higher and lower amounts, such as about 25° C. to 100° C., 50° C. to 95° C., 70° C. to 90° C., or 75° C. to 85° C., for example, about 80° C.

將瞭解,消化速率將取決於溫度、固體濃度及所得消化混合物中之酸濃度。酸消化可進行至少約15分鐘、1小時、2小時、3小時、4小時、5小時或7小時之時段。酸消化可進行小於約7小時、6小時、5小時、4小時、3小時、2小時或1小時之時段。固體沉澱可進行由較高量及/或較低量中之任何兩者提供之範圍內之時段,諸如自約15分鐘至6小時或約2至4小時。在一個特定實例中,該時間段為約3小時。It will be appreciated that the rate of digestion will depend on the temperature, solid concentration, and acid concentration in the resulting digestion mixture. Acid digestion can be performed for a period of at least about 15 minutes, 1 hour, 2 hours, 3 hours, 4 hours, 5 hours, or 7 hours. Acid digestion can be performed for a period of less than about 7 hours, 6 hours, 5 hours, 4 hours, 3 hours, 2 hours, or 1 hour. Solid precipitation can be performed for a period of time within a range provided by any two of the higher amount and/or the lower amount, such as from about 15 minutes to 6 hours or about 2 to 4 hours. In a specific example, the period of time is about 3 hours.

在酸溶性化合物之溶解完成之後,藉由任何合適之習知分離技術,諸如過濾、重力分離、離心等,將所得之氯化鋁液體與任何殘留固體分離。將瞭解,固體可在分離期間經歷一或多次洗滌。After dissolution of the acid-soluble compound is complete, the resulting aluminum chloride liquid is separated from any remaining solids by any suitable known separation technique, such as filtration, gravity separation, centrifugation, etc. It will be understood that the solids may undergo one or more washes during the separation.

所分離之氯化鋁液體可例如以上文所描述之方式,在經歷用以沉澱氯化鋁六水合物固體之結晶之前經歷另一預處理。The separated aluminum chloride liquid may be subjected to another pretreatment, for example in the manner described above, before being subjected to crystallization for precipitating aluminum chloride hexahydrate solid.

舉例而言,一個此類預處理可包括使氯化鋁液體與離子交換樹脂(特定而言,陽離子交換樹脂)接觸。For example, one such pretreatment may include contacting an aluminum chloride liquid with an ion exchange resin, particularly a cation exchange resin.

可替代地,此類預處理之另一實例可包括使氯化鋁液體與吸附劑接觸以吸附一或多種雜質,視情況地與錯合劑組合。合適之吸附劑包括但不限於活性氧化鋁、矽膠、活性碳、分子篩碳、分子篩沸石及高分子吸附劑。Alternatively, another example of such pretreatment may include contacting the aluminum chloride liquid with an adsorbent to adsorb one or more impurities, optionally in combination with a complexing agent. Suitable adsorbents include, but are not limited to, activated alumina, silica gel, activated carbon, molecular sieve carbon, molecular sieve zeolite, and polymer adsorbents.

預處理之另一實例可包括選擇性地沉澱一或多種雜質之氯鹽。舉例而言,液體可被冷卻且噴灑HCl氣體以促進氯化鈉之鹽析。Another example of pretreatment may include selectively precipitating one or more chloride salts of impurities. For example, the liquid may be cooled and sparged with HCl gas to promote salt precipitation of sodium chloride.

此類預處理之另一實例可包括使液體與錯合劑反應,其中錯合劑能夠選擇地與一或多種雜質形成錯合物。以此方式,當產生了氯化鋁六水合物固體時,經錯合雜質可保留在溶液中。錯合劑對Na、Fe或Ti可具選擇性。適於Na之錯合劑包括但不限於大環聚醚,諸如冠醚、套索冠醚及穴醚。對鈉具有良好選擇性之合適冠醚包括15-冠5、12-冠4及18-冠6。此類冠醚可溶於水溶液。適於鐵之錯合劑包括但不限於多吡啶配體,諸如聯吡啶配體及三吡啶配體、聚氮雜大環(polyazamacrocyle)。適於Ti之錯合劑包括但不限於併入有O、N、S、P或As供體之大環配體。其他金屬錯合劑可包括重金屬螯合劑,諸如EDTA、NTA、膦酸鹽、DPTA、IDS、DS、EDDS、GLDA、MGDA。Another example of such pretreatment may include reacting the liquid with a complexing agent, wherein the complexing agent is capable of selectively forming a complex with one or more impurities. In this way, when the aluminum chloride hexahydrate solid is produced, the complexed impurities can be retained in the solution. The complexing agent may be selective for Na, Fe or Ti. Suitable complexing agents for Na include, but are not limited to, macrocyclic polyethers, such as crown ethers, lariat crown ethers and cryptands. Suitable crown ethers with good selectivity for sodium include 15-crown 5, 12-crown 4 and 18-crown 6. Such crown ethers are soluble in aqueous solution. Suitable complexing agents for iron include, but are not limited to, polypyridine ligands, such as bipyridine ligands and tripyridine ligands, polyazamacrocyle. Suitable complexing agents for Ti include, but are not limited to, macrocyclic ligands incorporating O, N, S, P or As donors. Other metal complexing agents may include heavy metal chelating agents such as EDTA, NTA, phosphonates, DPTA, IDS, DS, EDDS, GLDA, MGDA.

此類預處理之另一實例可包括溶劑萃取。適合載劑可為非極性溶劑,包括但不限於鹵代烷,諸如氯甲烷、二氯甲烷、三氯甲烷,以及長鏈醇,諸如1-辛醇。如上文所討論之冠醚錯合劑通常比非極性溶劑更可溶於水。因此,藉由添加諸如苯并基團及長鏈脂族官能基之疏水基團對如上文所討論之冠醚錯合劑進行改性,可以改良冠醚錯合劑在非極性溶劑中之分配。Another example of such pretreatment may include solvent extraction. Suitable carriers may be non-polar solvents, including but not limited to halogenated alkanes, such as methyl chloride, dichloromethane, chloroform, and long-chain alcohols, such as 1-octanol. Crown ether complexing agents, as discussed above, are generally more soluble in water than non-polar solvents. Therefore, by modifying the crown ether complexing agents, as discussed above, by adding hydrophobic groups such as benzo groups and long-chain aliphatic functional groups, the distribution of the crown ether complexing agents in non-polar solvents can be improved.

在其中雜質係鈉之一些實施例中,可藉由將氯化鋁液體通過半透性陽離子選擇性膜(特定而言,鈉選擇性膜)以自該液體中分離鈉雜質來純化氯化鋁液體。In some embodiments where the impurity is sodium, the aluminum chloride liquid can be purified by passing the aluminum chloride liquid through a semipermeable cation-selective membrane, specifically, a sodium-selective membrane, to separate the sodium impurity from the liquid.

在經歷諸如上述之任何預處理之後,可在蒸發器中濃縮所得氯化鋁液體以提高溶液中之Al濃度。在蒸發之後氯化鋁液體之溶液中之Al濃度可為至少約1 g/L、約10 g/L、約20 g/L、約30 g/L、約40 g/L、約50 g/L、約60 g/L、約70 g/L、約80 g/L或約90 g/L。在蒸發之後氯化鋁液體之溶液中之Al濃度可小於約100 g/L、約90 g/L、約80 g/L、約70 g/L、約60 g/L、約50 g/L、約40 g/L、約30 g/L、約20 g/L或約10 g/L。在一實施例中,在蒸發之後氯化鋁液體之溶液中之Al濃度可在約1-100 g/L之間的範圍內,例如上述較高濃度及/或較低濃度中之任何兩者之間的範圍,諸如約10-90 g/L或50-85 g/L或約60-80 g/L之間的範圍。為了便於結晶,在蒸發之後氯化鋁液體中之Al濃度較佳地處於或略低於溶液之飽和濃度。After undergoing any pretreatment as described above, the resulting aluminum chloride liquid may be concentrated in an evaporator to increase the Al concentration in the solution. The Al concentration in the solution of the aluminum chloride liquid after evaporation may be at least about 1 g/L, about 10 g/L, about 20 g/L, about 30 g/L, about 40 g/L, about 50 g/L, about 60 g/L, about 70 g/L, about 80 g/L, or about 90 g/L. The Al concentration in the solution of the aluminum chloride liquid after evaporation may be less than about 100 g/L, about 90 g/L, about 80 g/L, about 70 g/L, about 60 g/L, about 50 g/L, about 40 g/L, about 30 g/L, about 20 g/L, or about 10 g/L. In one embodiment, the Al concentration in the aluminum chloride liquid solution after evaporation may be in the range of about 1-100 g/L, such as a range between any two of the above-mentioned higher concentrations and/or lower concentrations, such as about 10-90 g/L or 50-85 g/L or about 60-80 g/L. In order to facilitate crystallization, the Al concentration in the aluminum chloride liquid after evaporation is preferably at or slightly below the saturation concentration of the solution.

接著例如以上文詳細描述之方式處理濃縮液體,以便自氯化鋁液體中沉澱氯化鋁六水合物固體。The concentrated liquor is then treated, for example, in the manner described in detail above, to precipitate the aluminum chloride hexahydrate solid from the aluminum chloride liquid.

應理解,本文中描述之實施例及實例亦涵蓋一種以儘可能接近實際可實現之穩定狀態的連續方法工作之製程。在此理解下,熟習此項技術者將理解在啟動及/或關閉期間,工作條件及/或進料要求會大大偏離此處概述者。舉例而言,可能要求用其組成超出本文所描述之範圍的溶液來起動單元及/或產線。It should be understood that the embodiments and examples described herein also encompass a process that operates in a continuous manner that is as close to a steady state as is practically achievable. With this understanding, one skilled in the art will appreciate that during startup and/or shutdown, operating conditions and/or feed requirements may deviate significantly from those outlined herein. For example, it may be required to start a unit and/or line with a solution whose composition is outside the scope of what is described herein.

熟習此項技術者亦應瞭解,可能需要一或多個補充流(top up stream)來維持整個系統中所要之組成及流率。歸因於環境條件之變化、洩漏或其他意外損失、原材料變化等原因,可能需要此等流。Those skilled in the art will also appreciate that one or more top-up streams may be required to maintain the desired composition and flow rate throughout the system. Such streams may be required due to changes in environmental conditions, leaks or other unexpected losses, changes in raw materials, etc.

本申請案主張2022年8月26日申請之AU2022902444之優先權,其全部內容以引用之方式併入本文中。 實例 This application claims priority to AU2022902444 filed on August 26, 2022, the entire contents of which are incorporated herein by reference .

為了更清楚地理解本發明,下文藉由參考以下非限制性實驗材料、方法及實例進一步詳細地描述本發明之具體實施例。 實例 1 用於消化氯化鋁六水合物固體之鹽酸之再生 In order to more clearly understand the present invention, the following further describes the specific embodiments of the present invention in detail by referring to the following non-limiting experimental materials, methods and examples. Example 1 : Regeneration of hydrochloric acid for digestion of aluminum chloride hexahydrate solid

在圖1及圖2中之流程圖中提供高純度氧化鋁(HPA)之產生之一非限制性實例。 含鋁材料之消化 A non-limiting example of the production of high purity alumina (HPA) is provided in the flow charts of Figures 1 and 2. Digestion of aluminum-containing materials

在連續攪拌之HCl酸消化器單元中用鹽酸(HCl (aq))消化含鋁材料。該消化可在單個反應器或串聯配置之複數個反應器(未繪示)中進行。如本文所描述,一或多個HCl酸消化器單元中之液體中之HCl莫耳(M)濃度可變化。接著將所得漿料與在溶液中包含氯化鋁及數種雜質之經純化氯化鋁液體(AlCl 3)分離。 氯化鋁六水合物 ( ACH ) 固體之沉澱及消化 Aluminum-containing materials are digested with hydrochloric acid (HCl (aq)) in a continuous agitated HCl acid digester unit. The digestion can be carried out in a single reactor or in a plurality of reactors (not shown) arranged in series. As described herein, the molar (M) concentration of HCl in the liquid in one or more HCl acid digester units can be varied. The resulting slurry is then separated from a purified aluminum chloride liquid (AlCl 3 ) comprising aluminum chloride and several impurities in solution. Precipitation and digestion of aluminum chloride hexahydrate ( ACH ) solid

將氯化氫氣體(HCl (g))鼓泡通過連續攪拌之結晶容器中之氯化鋁液體(參見圖1及圖2中之「沉澱」)以便沉澱氯化鋁六水合物固體。自圖2可見HCl (g)可來源於本文中描述之HCl再生。結晶容器可包含串聯之兩個或更多個結晶槽(例如三個槽),其中HCl水平逐漸升高至最終槽中之濃度。可替代地,可使用一個結晶槽。所得沉澱產物流接著經歷分離步驟以獲得氯化鋁六水合物(ACH)固體流及包含約32 wt% HCl之『過共沸』製程HCl (aq)流。Hydrogen chloride gas (HCl (g)) is bubbled through the aluminum chloride liquid in a continuously stirred crystallization vessel (see "Precipitation" in Figures 1 and 2) to precipitate aluminum chloride hexahydrate solid. From Figure 2, it can be seen that HCl (g) can be derived from the HCl regeneration described herein. The crystallization vessel may comprise two or more crystallization tanks (e.g., three tanks) connected in series, in which the HCl level is gradually increased to the concentration in the final tank. Alternatively, one crystallization tank may be used. The resulting precipitate product stream is then subjected to a separation step to obtain an aluminum chloride hexahydrate (ACH) solid stream and a "super-azeotropic" process HCl (aq) stream comprising about 32 wt% HCl.

ACH固體接著可經歷一或多個額外的消化/結晶製程。參考圖2中之虛線框,向酸消化器單元饋入分離之ACH固體且用HCl (aq)進行再消化以產生氯化鋁液體。將此液體饋入至第二結晶容器(亦即,第二「沉澱」)以藉由將HCl(g)鼓泡通過氯化鋁液體以再沉澱氯化鋁六水合物固體來進行結晶。所得沉澱產物流接著經歷分離步驟以獲得氯化鋁六水合物(ACH)固體流以及包含約32 wt% HCl之『過共沸』製程HCl (aq)流。The ACH solid may then undergo one or more additional digestion/crystallization processes. Referring to the dashed box in FIG. 2 , the separated ACH solid is fed to the acid digester unit and re-digested with HCl (aq) to produce an aluminum chloride liquid. This liquid is fed to a second crystallization vessel (i.e., a second "precipitation") to crystallize by bubbling HCl (g) through the aluminum chloride liquid to re-precipitate the aluminum chloride hexahydrate solid. The resulting precipitate stream then undergoes a separation step to obtain an aluminum chloride hexahydrate (ACH) solid stream and a "super-azeotropic" process HCl (aq) stream containing about 32 wt% HCl.

將瞭解,圖2中包圍ACH消化、沉澱及分離器單元之虛線框指示ACH消化/沉澱製程可重複一次以上。舉例而言,如藉由圖2中之豎直朝上虛線箭頭所指示,離開分離器單元(虛線框內)之ACH固體可饋入至後一酸消化器單元以用於進一步純化,這強調了消化器單元可以串聯設置,且上述製程可以重複多個循環,直至ACH固體之純度達到所需水平為止。 煅燒 ACH 製備高純度氧化鋁 It will be appreciated that the dashed box surrounding the ACH digestion, precipitation and separator units in FIG. 2 indicates that the ACH digestion/precipitation process may be repeated more than once. For example, as indicated by the vertical upward dashed arrow in FIG. 2, the ACH solids exiting the separator unit (within the dashed box) may be fed to a subsequent acid digester unit for further purification, emphasizing that the digester units may be arranged in series and the above process may be repeated multiple cycles until the purity of the ACH solids reaches the desired level. Calcination of ACH to Prepare High Purity Alumina

當ACH固體之純度達到所需水平時,離開分離器之ACH固體饋入至煅燒爐,在其中生成作為產物之HPA。儘管在圖2中未繪示,但在煅燒爐中亦可生成包含約52 wt% HCl之低品質HCl (g),且可將其饋入至如本文所描述之HCl再生單元。 HCl 之再循環及再生 When the purity of the ACH solids reaches the desired level, the ACH solids leaving the separator are fed to a calciner where HPA is produced as a product. Although not shown in FIG. 2 , low-quality HCl (g) containing about 52 wt % HCl may also be produced in the calciner and may be fed to an HCl regeneration unit as described herein. Recycling and Regeneration of HCl

用於消化含鋁材料及ACH固體之鹽酸(HCl (aq))可由本文中描述之鹽酸(HCl)再循環流提供。此外,可自本文中描述之過共沸HCl製程流再生用以沉澱ACH固體之氯化氫氣體(HCl (g))。可藉由HCl再生及雜質移除單元生成HCl再循環流及再生之HCl (g)。Hydrochloric acid (HCl (aq)) used to digest the aluminum-containing material and ACH solids can be provided by the hydrochloric acid (HCl) recycle stream described herein. In addition, hydrogen chloride gas (HCl (g)) used to precipitate the ACH solids can be regenerated from the super-azeotropic HCl process stream described herein. The HCl recycle stream and the regenerated HCl (g) can be generated by the HCl regeneration and impurity removal unit.

在圖3中繪示HCl再生及雜質移除之操作。將來自煅燒爐之具有提高之HCl濃度的熱氣體饋入至吸收器單元,在其中藉由應用外部冷卻且與最初來自如下描述之汽提塔之共沸19 wt% HCl製程流的一部分混合來淬滅該熱氣體。任何未冷凝之氣體在底部自液相中分離出來且轉移至尾塔,該尾塔係前述共沸19 wt% HCl製程流首先進入之滌氣器。自氣體流移除任何殘留之HCl,且亦可釋放來自煅燒爐之惰性氣體(例如,洩漏的空氣或燃燒氣體)。The operation of HCl regeneration and impurity removal is depicted in FIG3 . Hot gases from the calciner with increased HCl concentration are fed to an absorber unit where they are quenched by applying external cooling and mixing with a portion of the azeotropic 19 wt % HCl process stream initially from the stripping column as described below. Any uncondensed gases are separated from the liquid phase at the bottom and transferred to the tail column, which is a degasser into which the aforementioned azeotropic 19 wt % HCl process stream first enters. Any residual HCl is removed from the gas stream, and inert gases from the calciner (e.g., leaked air or combustion gases) may also be released.

來自吸收器單元之液相具有約32 wt%之HCl濃度,且與在本文所述之一或多個分離步驟之後生成的過共沸32 wt% HCl製程流混合。將此混合物轉移至汽提塔。The liquid phase from the absorber unit has a HCl concentration of about 32 wt% and is mixed with the superazeotropic 32 wt% HCl process stream produced after one or more separation steps described herein. This mixture is transferred to the stripping column.

在汽提塔中,在壓力下加熱上述之過共沸32 wt.% HCl製程流,使得HCl (g)生成且自頂部離開塔且再循環以供用於一或多個ACH沉澱步驟。離開汽提塔之HCl (g)亦可與水合併以產生HCl洗滌流,該HCl洗滌流可再循環且用以洗滌分離之氯化鋁六水合物固體(未繪示)。In the stripper, the above-mentioned super-azeotropic 32 wt.% HCl process stream is heated under pressure, so that HCl (g) is generated and leaves the column from the top and is recycled for use in one or more ACH precipitation steps. The HCl (g) leaving the stripper can also be combined with water to produce an HCl wash stream, which can be recycled and used to wash the separated aluminum chloride hexahydrate solid (not shown).

剩餘溶液在底部作為共沸19 wt% HCl製程流離開汽提塔且含有被帶入至系統之無機雜質。溶液之部分返回至吸收器單元,同時排出剩餘的共沸19 wt% HCl製程流。The remaining solution leaves the stripper at the bottom as an azeotropic 19 wt% HCl process stream and contains inorganic impurities that were introduced into the system. A portion of the solution is returned to the absorber unit while the remaining azeotropic 19 wt% HCl process stream is discharged.

為了接近當前系統之HCl平衡,藉由該方法生成之含有無機雜質之共沸19 wt% HCl製程流藉由對共沸19 wt.% HC製程流進行雜質移除步驟(例如蒸餾)而被純化(參見圖3)。共沸19 wt.% HC製程流之蒸餾產生濃縮了實質上所有雜質之富含雜質之『鹽水』流,以及單獨的乾淨19 wt% HCl再循環流,用於再循環回至HCl消化器單元及/或ACH消化器單元,如圖2中所繪示。In order to approach the HCl equilibrium of the current system, the azeotropic 19 wt.% HCl process stream containing inorganic impurities generated by the process is purified by subjecting the azeotropic 19 wt.% HC process stream to an impurity removal step (e.g., distillation) (see Figure 3). Distillation of the azeotropic 19 wt.% HC process stream produces an impurity-rich "brine" stream that is enriched with substantially all impurities, and a separate clean 19 wt.% HCl recycle stream for recycling back to the HCl digester unit and/or ACH digester unit, as shown in Figure 2.

表1概述相較於利用習知變壓(PS)技術之HCl (g)再生製程,基於對本文所述之HCl (aq)再循環製程進行之建模預測的各種輸出。相對於利用習知變壓(PS)技術再生之HCl (g)中之HCl量展示了HCl量。相對於利用習知變壓(PS)技術之預測加熱要求展示了能耗。相對於習知變壓(PS)技術展示了成本。如下文強調的,再循環共沸HCl (aq)再循環流之本發明方法可在下文強調之HCl (g)消耗、能耗及資本支出方面提供各種節省。 1 HCl ( aq ) 再循環 ( 本發明方法 ) 習知變壓技術之比較 輸出 變壓 (PS) HCl (g) 再生 HCl (aq) 再循環 ( 本發明方法 ) HCl (氣體) 100 ~58.6 HCl (aq) - ~34.7 能量加熱 100 25.4 能量冷卻 93.2 16.9 特殊冷卻 1.7 - 1.1 - 相對總能量 196.0 42.4 相對成本 100 31.3 Table 1 summarizes various outputs predicted based on modeling of the HCl (aq) recycle process described herein compared to a HCl (g) regeneration process utilizing known pressure swing (PS) technology. The amount of HCl is shown relative to the amount of HCl in the HCl (g) regenerated utilizing known pressure swing (PS) technology. The energy consumption is shown relative to the predicted heating requirements utilizing known pressure swing (PS) technology. The cost is shown relative to known pressure swing (PS) technology. As highlighted below, the present method of recycling an azeotropic HCl (aq) recycle stream can provide various savings in terms of HCl (g) consumption, energy consumption, and capital expenditures as highlighted below. Table 1 : Comparison of HCl ( aq ) Recycle ( Present Method ) with Known Pressure Swing Technology Output Pressure Swing (PS) HCl (g) Regeneration HCl (aq) recycle ( method of the present invention ) HCl (gas) 100 ~58.6 HCl (aq) - ~34.7 Energy Heating 100 25.4 Energy Cooling 93.2 16.9 Special cooling 1.7 - Electricity 1.1 - Relative total energy 196.0 42.4 Relative cost 100 31.3

下面參考附圖,僅以舉例的方式對本發明之實施例作進一步描述及說明,其中:The following is a further description and explanation of the embodiments of the present invention by way of example only with reference to the accompanying drawings, wherein:

1 製備高純度氧化鋁之方法之實施例的代表性流程圖; FIG1 : A representative flow chart of an embodiment of a method for preparing high purity alumina;

2 利用鹽酸及氯化氫氣體再生製備高純度氧化鋁之方法之實施例的代表性流程圖; FIG2 : A representative flow chart of an embodiment of a method for preparing high purity aluminum oxide using hydrochloric acid and hydrogen chloride gas regeneration;

3 鹽酸及氯化氫氣體再生之代表性流程圖;及 Figure 3 : Representative flow diagram of hydrochloric acid and hydrogen chloride gas regeneration; and

4 HCl/H 2O溶液在不同溫度下之HCl-蒸氣壓及H 2O-蒸氣壓之實例(A. Schmidt, Chem. Ing. Techn.25, 445/62 [1953])。 Figure 4 : Examples of HCl vapor pressure and H 2 O vapor pressure of HCl/H 2 O solutions at different temperatures (A. Schmidt, Chem. Ing. Techn. 25, 445/62 [1953]).

Claims (25)

一種自氯化鋁六水合物固體製備高純度氧化鋁之方法,該方法包含: a)在鹽酸中消化具有一或多種無機雜質之氯化鋁六水合物固體,以產生在溶液中包含氯化鋁及該等無機雜質之氯化鋁液體; b)在一或多個結晶階段中自該液體中沉澱氯化鋁六水合物固體,使得該等無機雜質中之至少一些保留在該液體中; c)自該液體中分離所沉澱之氯化鋁六水合物固體,以產生包含該等無機雜質之鹽酸製程流; d)處理所分離之氯化鋁六水合物固體以形成高純度氧化鋁; e)視情況降低該鹽酸製程流中之氯化氫濃度;及 f)自該鹽酸製程流中移除該等無機雜質中之至少一些以產生鹽酸再循環流,該鹽酸再循環流被再循環以供用作步驟a)中之該鹽酸。 A method for preparing high purity alumina from aluminum chloride hexahydrate solid, the method comprising: a) digesting aluminum chloride hexahydrate solid having one or more inorganic impurities in hydrochloric acid to produce an aluminum chloride liquid containing aluminum chloride and the inorganic impurities in solution; b) precipitating aluminum chloride hexahydrate solid from the liquid in one or more crystallization stages so that at least some of the inorganic impurities remain in the liquid; c) separating the precipitated aluminum chloride hexahydrate solid from the liquid to produce a hydrochloric acid process stream containing the inorganic impurities; d) treating the separated aluminum chloride hexahydrate solid to form high purity alumina; e) reducing the concentration of hydrogen chloride in the hydrochloric acid process stream as appropriate; and f) removing at least some of the inorganic impurities from the hydrochloric acid process stream to produce a hydrochloric acid recycle stream, the hydrochloric acid recycle stream being recycled for use as the hydrochloric acid in step a). 如請求項1之方法,其中該鹽酸再循環流具有按該流之重量計介於約5 wt.%至約30 wt.%之間的氯化氫濃度。The method of claim 1, wherein the hydrochloric acid recycle stream has a hydrogen chloride concentration between about 5 wt.% and about 30 wt.% based on the weight of the stream. 如請求項1或請求項2之方法,其中該鹽酸再循環流在該流之共沸點處或附近之氯化氫濃度,按該流之重量計,例如介於約18 wt.%至約20 wt.%之間。The method of claim 1 or claim 2, wherein the concentration of hydrogen chloride in the hydrochloric acid recycle stream at or near the azeotropic point of the stream is, for example, between about 18 wt.% and about 20 wt.% based on the weight of the stream. 如請求項1至3中任一項之方法,其中在步驟f)中自該鹽酸製程流中移除該等雜質包含蒸餾該鹽酸製程流。The method of any one of claims 1 to 3, wherein removing the impurities from the hydrochloric acid process stream in step f) comprises distilling the hydrochloric acid process stream. 如請求項1至4中任一項之方法,其中該鹽酸再循環流包含按該流之重量計小於約0.05 wt.%之無機雜質。The method of any of claims 1 to 4, wherein the hydrochloric acid recycle stream comprises less than about 0.05 wt.% inorganic impurities based on the weight of the stream. 如請求項1至5中任一項之方法,其中該鹽酸製程流具有高於該流之該共沸點之氯化氫濃度,且該方法包含步驟e)在移除該一或多種無機雜質之前降低該鹽酸製程流中之該氯化氫濃度。A method as claimed in any one of claims 1 to 5, wherein the hydrochloric acid process stream has a concentration of hydrogen chloride above the azeotropic point of the stream, and the method comprises step e) reducing the concentration of hydrogen chloride in the hydrochloric acid process stream before removing the one or more inorganic impurities. 如請求項6之方法,其中在壓力下加熱過共沸鹽酸製程流以降低該共沸點從而生成氯化氫氣體流且降低該鹽酸製程流中之該氯化氫濃度。A method as claimed in claim 6, wherein a superazeotropic hydrochloric acid process stream is heated under pressure to lower the azeotropic point to generate a hydrogen chloride gas stream and reduce the concentration of hydrogen chloride in the hydrochloric acid process stream. 如請求項6或請求項7之方法,其中在步驟e)之前,該鹽酸製程流具有按該流之重量計至少約25 wt.%之氯化氫濃度。The method of claim 6 or claim 7, wherein prior to step e), the hydrochloric acid process stream has a hydrogen chloride concentration of at least about 25 wt.% based on the weight of the stream. 如請求項7或8之方法,其中該鹽酸製程流之該加熱係在約1巴至約10巴之間的壓力下。The method of claim 7 or 8, wherein the heating of the hydrochloric acid process stream is at a pressure between about 1 bar and about 10 bar. 如請求項7至9中任一項之方法,其中該鹽酸製程流之該加熱係在約100℃至約200℃之間的溫度下。The method of any of claims 7 to 9, wherein the heating of the hydrochloric acid process stream is at a temperature between about 100°C and about 200°C. 如請求項7至10中任一項之方法,其中該鹽酸製程流之該加熱將該氯化氫濃度降低至按該流之重量計小於約25 wt.%。The method of any of claims 7 to 10, wherein the heating of the hydrochloric acid process stream reduces the hydrogen chloride concentration to less than about 25 wt. % based on the weight of the stream. 如請求項7至11中任一項之方法,其中該鹽酸製程流之該加熱將該氯化氫濃度降低至該流之該共沸點處或附近。A method as in any of claims 7 to 11, wherein the heating of the hydrochloric acid process stream reduces the hydrogen chloride concentration to at or near the azeotropic point of the stream. 如請求項1至12中任一項之方法,其中在步驟b)中之該沉澱包含向該氯化鋁液體中噴灑氯化氫氣體。The method of any one of claims 1 to 12, wherein the precipitation in step b) comprises spraying hydrogen chloride gas into the aluminum chloride liquid. 如請求項13之方法,其中將藉由該鹽酸製程流之該加熱生成之該氯化氫氣體流的至少一部分再循環以供用作該一或多個結晶階段中之氯化氫氣體的來源。A method as claimed in claim 13, wherein at least a portion of the hydrogen chloride gas stream generated by the heating of the hydrochloric acid process stream is recycled for use as a source of hydrogen chloride gas in the one or more crystallization stages. 如請求項1至14中任一項之方法,其中自該氯化鋁液體中沉澱氯化鋁六水合物固體係在自約40℃至約80℃之溫度下進行。The method of any one of claims 1 to 14, wherein the precipitation of aluminum chloride hexahydrate solid from the aluminum chloride liquid is carried out at a temperature of from about 40°C to about 80°C. 如請求項1至15中任一項之方法,其中步驟b)包含在兩個或更多個結晶階段中自該氯化鋁液體中沉澱氯化鋁六水合物固體,其中在各結晶階段之間,在該鹽酸再循環流中消化所分離之氯化鋁六水合物以產生該氯化鋁液體。A method as claimed in any one of claims 1 to 15, wherein step b) comprises precipitating aluminum chloride hexahydrate solid from the aluminum chloride liquid in two or more crystallization stages, wherein between each crystallization stage, the separated aluminum chloride hexahydrate is digested in the hydrochloric acid recycle stream to produce the aluminum chloride liquid. 如請求項1至16中任一項之方法,其中處理所分離之氯化鋁六水合物固體以形成高純度氧化鋁包含在一或多個加熱階段中熱處理該等所分離之氯化鋁六水合物固體。A method as in any one of claims 1 to 16, wherein treating the separated aluminum chloride hexahydrate solids to form high purity alumina comprises heat treating the separated aluminum chloride hexahydrate solids in one or more heating stages. 如請求項17之方法,其中熱處理該等所分離之氯化鋁六水合物固體包含在自約200℃至約900℃之第一溫度下加熱該等所分離之氯化鋁六水合物固體,及在自約1000℃至約1300℃之第二溫度下煅燒經熱分解固體。The method of claim 17, wherein heat treating the separated aluminum chloride hexahydrate solids comprises heating the separated aluminum chloride hexahydrate solids at a first temperature from about 200°C to about 900°C, and calcining the thermally decomposed solids at a second temperature from about 1000°C to about 1300°C. 如請求項1至18中任一項之方法,其中步驟a)中之該等氯化鋁六水合物固體係藉由以下操作提供: 在鹽酸中消化含鋁材料以提供氯化鋁液體;及 自該氯化鋁液體中沉澱並分離氯化鋁六水合物固體以獲得該等氯化鋁六水合物固體,及產生該鹽酸製程流。 The method of any one of claims 1 to 18, wherein the aluminum chloride hexahydrate solids in step a) are provided by the following operations: Digesting the aluminum-containing material in hydrochloric acid to provide aluminum chloride liquid; and Precipitating and separating the aluminum chloride hexahydrate solids from the aluminum chloride liquid to obtain the aluminum chloride hexahydrate solids and produce the hydrochloric acid process stream. 如請求項19之方法,其中將該鹽酸再循環流再循環以供用作用來消化該含鋁材料之該鹽酸。The method of claim 19, wherein the hydrochloric acid recycle stream is recycled to provide the hydrochloric acid for use in digesting the aluminum-containing material. 如請求項1至20中任一項之方法,其中所形成之高純度氧化鋁包含大於99.99%或99.999%之氧化鋁。A method as in any one of claims 1 to 20, wherein the high purity alumina formed contains greater than 99.99% or 99.999% alumina. 一種藉由如請求項1至21中任一項之方法製備之高純度氧化鋁。A high purity aluminum oxide prepared by the method of any one of claims 1 to 21. 如請求項22之高純度氧化鋁,其中該高純度氧化鋁包含大於99.99%之氧化鋁。The high-purity alumina of claim 22, wherein the high-purity alumina contains greater than 99.99% of alumina. 如請求項22之高純度氧化鋁,其中該高純度氧化鋁包含大於99.999%之氧化鋁。The high-purity alumina of claim 22, wherein the high-purity alumina contains greater than 99.999% of alumina. 一種用於自具有一或多種雜質之氯化鋁六水合物固體製備高純度氧化鋁之系統,該系統包含: 一或多個酸消化器,其用於在鹽酸中消化氯化鋁六水合物固體以產生包含該等無機雜質之氯化鋁液體; 與各酸消化器相關聯之結晶容器,其用於接收來自該酸消化器之氯化鋁液體,及用於自該液體中沉澱氯化鋁六水合物固體,使得該等無機雜質中之至少一些保留在該液體中; 視情況存在之一或多個後續結晶容器,其用於再結晶該等氯化鋁六水合物固體; 與該一或多個結晶容器相關聯之分離構件,其用於自該液體中分離所形成之氯化鋁六水合物固體以產生包含該等無機雜質之鹽酸製程流; 視情況存在之汽提塔,其用於接收來自該分離構件之該鹽酸製程流以生成氯化氫氣體流且降低該鹽酸製程流中之氯化氫濃度; 雜質移除單元,其用於自該鹽酸製程流中移除至少一些該等無機雜質以產生鹽酸再循環流; 導管,其用於將該鹽酸再循環流再循環至該一或多個酸消化器;及 熱處理構件,其用於熱處理該等氯化鋁六水合物固體以提供高純度氧化鋁。 A system for preparing high-purity alumina from aluminum chloride hexahydrate solid having one or more impurities, the system comprising: One or more acid digesters for digesting aluminum chloride hexahydrate solid in hydrochloric acid to produce aluminum chloride liquid containing the inorganic impurities; A crystallization vessel associated with each acid digester for receiving aluminum chloride liquid from the acid digester and for precipitating aluminum chloride hexahydrate solid from the liquid so that at least some of the inorganic impurities remain in the liquid; Optionally, one or more subsequent crystallization vessels for recrystallizing the aluminum chloride hexahydrate solids; a separation member associated with the one or more crystallization vessels for separating the aluminum chloride hexahydrate solid formed from the liquid to produce a hydrochloric acid process stream containing the inorganic impurities; an optional stripping column for receiving the hydrochloric acid process stream from the separation member to generate a hydrogen chloride gas stream and reduce the concentration of hydrogen chloride in the hydrochloric acid process stream; an impurity removal unit for removing at least some of the inorganic impurities from the hydrochloric acid process stream to produce a hydrochloric acid recycle stream; a conduit for recirculating the hydrochloric acid recycle stream to the one or more acid digesters; and Heat treatment components for heat treating the aluminum chloride hexahydrate solids to provide high purity aluminum oxide.
TW112132095A 2022-08-26 2023-08-25 Process for preparing alumina TW202421582A (en)

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