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Publication of TW202416060ApublicationCriticalpatent/TW202416060A/en
Disclosed herein is a stand-alone conditioning system for a fluid handling structure of a lithographic apparatus, comprising: an inspection system configured to inspect the fluid handling structure and to determine one or more different types of conditioning to be performed on a major surface of the fluid handling structure; and a conditioning device configured to perform the determined one or more different types of conditioning on the major surface of the fluid handling structure.
TW112129302A2022-08-192023-08-04A conditioning system, arrangement and method
TW202416060A
(en)