TW202340852A - Pellicle - Google Patents

Pellicle Download PDF

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TW202340852A
TW202340852A TW112102815A TW112102815A TW202340852A TW 202340852 A TW202340852 A TW 202340852A TW 112102815 A TW112102815 A TW 112102815A TW 112102815 A TW112102815 A TW 112102815A TW 202340852 A TW202340852 A TW 202340852A
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Taiwan
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protective film
mentioned
film
displacement
pellicle
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TW112102815A
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Chinese (zh)
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TWI855515B (en
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平野政勝
田中友和
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日商旭化成股份有限公司
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B13/00Measuring arrangements characterised by the use of fluids
    • G01B13/02Measuring arrangements characterised by the use of fluids for measuring length, width or thickness
    • G01B13/06Measuring arrangements characterised by the use of fluids for measuring length, width or thickness for measuring thickness

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Adhesive Tapes (AREA)

Abstract

Provided is a pellicle in which the membrane stress in the pellicle film is adjusted to be suitable, distortion due to turbulent flow, etc., is kept under control, and the structural stability is excellent. A pellicle (1) is provided with a rectangular frame (2), a pellicle film (3) provided to one surface of the frame (2), and a mask adhesive (4) provided to the other surface of the frame (2). The length of the longer side of the frame (2) is 600 mm or greater and the length of the shorter side is 500 mm or greater. The pellicle is characterized in that when a predetermined air-blast flutter experiment is carried out, the sum of displacement (T1) in a first direction and displacement (T2) in a second direction ([Delta] displacement = T1 + T2) is between 1.50 mm and 2.80 mm, and the greater of a maximum displacement (T1max) in the first direction and a maximum displacement (T2max) in the second direction (flutter amounts) is between 1.00 mm and 2.40 mm.

Description

護膜protective film

本發明係關於一種護膜。The present invention relates to a protective film.

於光微影世界中,除對半導體之IC(Integrated Circuit,積體電路)晶片之類的小面積之曝光以外,亦開發有對液晶顯示器等平板顯示器之類的更大面積的一次性曝光技術。 於大規模積體電路(LSI)、超LSI等半導體元件或液晶顯示板等之製造步驟中,藉由介隔遮罩(亦稱為曝光原板、光罩(reticle))對感光層等照射光而進行圖案化。此時,若遮罩上附著有異物,則光會被異物吸收,或光於異物表面反射而轉向。其結果,所形成之圖案變形或邊緣粗糙,而產生圖案化後之尺寸、品質及外觀等受損的問題。為了消除此種問題,而採用於遮罩之表面安裝具備使光透過之護膜薄膜之護膜,來抑制異物附著之方法(例如專利文獻1)。 In the world of photolithography, in addition to exposing small areas such as semiconductor IC (Integrated Circuit) wafers, one-time exposure technology has also been developed for larger areas such as flat panel displays such as liquid crystal displays. . In the manufacturing process of semiconductor components such as large-scale integrated circuits (LSI) and super-LSI, or liquid crystal display panels, the photosensitive layer, etc. is irradiated with light through an intervening mask (also called an exposure plate or reticle). Patterning. At this time, if there is a foreign object attached to the mask, the light will be absorbed by the foreign object, or the light will be reflected on the surface of the foreign object and deflected. As a result, the formed pattern is deformed or has rough edges, causing problems such as damage to the size, quality, and appearance after patterning. In order to eliminate this problem, a method is adopted in which a pellicle having a pellicle film that transmits light is mounted on the surface of the mask to suppress the adhesion of foreign matter (for example, Patent Document 1).

於遮罩上安裝有此種護膜之狀態下,護膜內部之氣密性非常高,存在因氣壓變化或溫度變化而導致薄膜之護膜薄膜成為鬆弛或膨脹狀態之情形。於如此護膜薄膜失去平滑性之情形時,不僅護膜薄膜之光學特性會發生變化,而且於凹凸之程度劇烈之情形時,有時護膜薄膜會與遮罩接觸或觸碰到裝置而導致護膜薄膜損傷。 [先前技術文獻] [專利文獻] When such a protective film is installed on the mask, the air tightness inside the protective film is very high, and the protective film of the film may become loose or expanded due to changes in air pressure or temperature. When the pellicle film loses its smoothness, not only the optical properties of the pellicle film will change, but also when the degree of unevenness is severe, the pellicle film may sometimes come into contact with the mask or the device, resulting in Protective film damage. [Prior technical literature] [Patent Document]

[專利文獻1]日本專利特開2020-160466號公報[Patent Document 1] Japanese Patent Application Laid-Open No. 2020-160466

[發明所欲解決之問題][Problem to be solved by the invention]

尤其是於製造平板顯示器時所使用之大型護膜中,膜張力難以到達護膜薄膜之中央部分。若膜張力過小,則於膜中央部分易發生撓曲,若膜張力過大,則框架所受之應力變大而難以確保結構穩定性。Especially in large pellicles used in the manufacture of flat panel displays, it is difficult for the film tension to reach the center of the pellicle film. If the film tension is too small, deflection will easily occur in the central part of the film. If the film tension is too high, the stress on the frame will increase, making it difficult to ensure structural stability.

本發明係鑒於此種先前之實際情況而提出者,本發明之目的在於提供一種護膜,其護膜薄膜之膜張力適宜地得到調整,由風壓等所引起之變形得到抑制,且結構穩定性優異。 [解決問題之技術手段] The present invention was proposed in view of this previous actual situation, and an object of the present invention is to provide a protective film in which the film tension of the protective film is appropriately adjusted, deformation caused by wind pressure, etc. is suppressed, and the structure is stable. Excellent performance. [Technical means to solve problems]

本發明如下。 [1] 一種護膜,其特徵在於:具備矩形狀殼體、設置於上述殼體之一面側之護膜薄膜、及設置於上述殼體之另一面側之遮罩黏著劑,且上述殼體之長邊之長度為600 mm以上,及短邊之長度為500 mm以上,且 於進行具有以下步驟: (1)經由上述遮罩黏著劑將上述護膜貼附於平面板之步驟; (2)於上述護膜與另一平面板之間設置5.5 mm、8.0 mm、10.0 mm或12.0 mm之間隔之步驟; (3)以包含靜止時之上述殼體之一面之假想面為基準,使用送風機沿著上述護膜之長邊方向,朝上述護膜與上述另一平面板之間以1,000 mm/秒送風時,測定經過特定之測定時間,上述護膜薄膜相對於上述假想面於厚度方向上之位移量的步驟;及 (4)獲得上述位移量中向接近上述平面板之第1方向之位移量、及向遠離上述平面板之第2方向之位移量的步驟; 之送風顫動實驗時, 向上述第1方向之位移量(T1)與向上述第2方向之位移量(T2)之和(Δ位移量=T1+T2)為1.50 mm~2.80 mm,且 向上述第1方向之最大位移量(T1 max)與向上述第2方向之最大位移量(T2 max)中之較大者(顫動量)為1.00 mm~2.40 mm。 [2] 如[1]所記載之護膜,其中向上述第1方向之最大位移量(T1 max)大於向上述第2方向之最大位移量(T2 max)。 [3] 如[1]或[2]所記載之護膜,其中上述Δ位移量及上述顫動量係基於在上述送風顫動實驗中沿著上述護膜薄膜之複數個測定點處之測定結果而獲得者。 [4] 如[1]至[3]中任一項所記載之護膜,其中於上述送風顫動實驗中,設置兩處以上之於送風之上游側之測定點處向上述第1方向之最大位移量大於在送風之下游側之測定點處向上述第1方向之最大位移量的該測定點之組合。 [5] 如[1]至[4]中任一項所記載之護膜,其中於上述送風顫動實驗中,設置兩處以上之於送風之上游側之測定點處向上述第2方向之最大位移量小於在送風之下游側之測定點處向上述第2方向之最大位移量的該測定點之組合。 [6] 如[1]至[5]中任一項所記載之護膜,其中上述殼體之長邊之長度為600 mm以上4000 mm以下,及短邊之長度為500 mm以上3000 mm以下。 [發明之效果] The invention is as follows. [1] A protective film, characterized by: having a rectangular casing, a protective film film provided on one side of the casing, and a mask adhesive provided on the other side of the casing, and the casing The length of the long side is more than 600 mm, and the length of the short side is more than 500 mm, and the following steps are performed: (1) The step of attaching the above protective film to the flat panel through the above mask adhesive; (2) ) Steps to set a distance of 5.5 mm, 8.0 mm, 10.0 mm or 12.0 mm between the above-mentioned protective film and another flat panel; (3) Based on the imaginary surface including one side of the above-mentioned housing at rest, use a blower to move along the When air is blown at 1,000 mm/second along the long side of the protective film between the protective film and the other flat plate, the displacement of the protective film in the thickness direction relative to the imaginary surface after a specific measurement time is measured. The steps of measuring; and (4) the steps of obtaining the displacement amount in the first direction close to the above-mentioned flat plate and the displacement amount in the second direction away from the above-mentioned flat plate among the above-mentioned displacement amounts; during the air supply flutter experiment, to the above-mentioned The sum of the displacement in the first direction (T1) and the displacement in the second direction (T2) (Δdisplacement = T1 + T2) is 1.50 mm ~ 2.80 mm, and the maximum displacement in the first direction (T1 max ) and the maximum displacement in the second direction (T2 max ), whichever is greater (the amount of vibration) is 1.00 mm to 2.40 mm. [2] The protective film according to [1], wherein the maximum displacement amount in the first direction (T1 max ) is greater than the maximum displacement amount in the second direction (T2 max ). [3] The protective film according to [1] or [2], wherein the Δ displacement amount and the vibration amount are based on the measurement results at a plurality of measurement points along the protective film film in the air blow vibration experiment. winner. [4] The protective film according to any one of [1] to [3], wherein in the above-mentioned air supply flutter experiment, two or more measuring points on the upstream side of the air supply are provided with the maximum value in the above-mentioned first direction. A combination of measurement points whose displacement amount is greater than the maximum displacement amount in the first direction at the measurement point on the downstream side of the air supply. [5] The protective film according to any one of [1] to [4], wherein in the above-mentioned air supply flutter experiment, two or more measuring points on the upstream side of the air supply are provided with the maximum value in the second direction. A combination of measurement points whose displacement amount is less than the maximum displacement amount in the second direction at the measurement point on the downstream side of the air supply. [6] The protective film according to any one of [1] to [5], wherein the length of the long side of the housing is not less than 600 mm and not more than 4000 mm, and the length of the short side is not less than 500 mm and not more than 3000 mm. . [Effects of the invention]

根據本發明,可提供一種護膜,其護膜薄膜之膜張力適宜地得到調整,由風壓等所引起之變形得到抑制,且結構穩定性優異。According to the present invention, it is possible to provide a pellicle in which the film tension of the pellicle film is appropriately adjusted, deformation caused by wind pressure, etc. is suppressed, and the structure stability is excellent.

以下,一面參照圖式一面對用以實施本發明之形態(以下簡稱為「實施方式」)進行說明。本發明並不僅限定於以下實施方式,可於其主旨範圍內進行各種變化而實施。各圖中,對同一構成要素附以同一符號,又,有時省略重複說明。Hereinafter, a mode for implementing the present invention (hereinafter simply referred to as "embodiment") will be described with reference to the drawings. The present invention is not limited to the following embodiments, and can be implemented with various changes within the scope of the spirit. In each drawing, the same components are assigned the same symbols, and repeated descriptions may be omitted.

對本實施方式之護膜之概要進行說明。圖1(a)係示出護膜1之俯視圖,圖1(b)係縱剖視圖。 再者,於以下說明中,將各圖中之上側設為「上」、將下側設為「下」來進行說明。同樣地,將各圖中之右側設為「右」、將左側設為「左」來進行說明。 又,於本說明書中使用「~」所表示之數值範圍包括上限及下限之數值。 An outline of the protective film according to this embodiment will be described. FIG. 1(a) is a top view of the protective film 1, and FIG. 1(b) is a longitudinal sectional view. In addition, in the following description, the upper side in each figure is referred to as "upper", and the lower side is referred to as "lower". Similarly, in each figure, the right side is referred to as "right" and the left side is referred to as "left" for explanation. In addition, the numerical range expressed by "~" in this specification includes the upper limit and the lower limit.

<護膜> 護膜1係於光微影等中進行光罩之防塵之結構體。護膜1具備矩形狀殼體2、設置於殼體2之一面側之護膜薄膜3、設置於殼體2之另一面側之黏著層4、及剝離膜5。 <Protective film> The protective film 1 is a structure used to prevent dust from the photomask in photolithography and the like. The pellicle 1 includes a rectangular casing 2, a pellicle film 3 provided on one side of the casing 2, an adhesive layer 4 provided on the other side of the casing 2, and a release film 5.

殼體2(護膜框)可具有能夠將護膜薄膜3張設於殼體2之任意形態,例如可於殼之前視下具有矩形等外形。矩形為正方形、長方形等,可具有角為直角之情形、及角帶弧度之大致矩形(圖1)之情形兩者。The casing 2 (pellicle frame) may have any shape that allows the pellicle film 3 to be stretched on the casing 2. For example, it may have a rectangular shape when viewed from the front of the casing. The rectangle can be a square, a rectangle, etc., and can have both a case where the corners are right angles and a case where the corners are roughly rectangular (Fig. 1).

殼體2及其開口部之尺寸可根據光罩之尺寸而設定。於殼體2於前視下為包含一對長邊與一對短邊之長方形狀之情形時,長邊長度可為600 mm~4000 mm、600 mm~3000 mm或600 mm~2000 mm,短邊長度可為500 mm~3000 mm、500 mm~2000 mm或500 mm~1800 mm,長邊與短邊之寬度分別可為4.0 mm~20.0 mm,且/或殼之高度可為2.0 mm~10.0 mm。 尤其,本實施方式之護膜1較佳為如殼體2之長邊之長度為600 mm以上、及短邊之長度為500 mm以上之大型護膜,更佳為殼體2之長邊之長度為1700 mm以上,短邊之長度為1600 mm以上。 The size of the housing 2 and its opening can be set according to the size of the photomask. When the shell 2 has a rectangular shape including a pair of long sides and a pair of short sides when viewed from the front, the length of the long side can be 600 mm ~ 4000 mm, 600 mm ~ 3000 mm or 600 mm ~ 2000 mm. The side length can be 500 mm ~ 3000 mm, 500 mm ~ 2000 mm or 500 mm ~ 1800 mm, the width of the long side and the short side can be 4.0 mm ~ 20.0 mm respectively, and/or the height of the shell can be 2.0 mm ~ 10.0 mm. In particular, the protective film 1 of this embodiment is preferably a large protective film in which the length of the long side of the housing 2 is more than 600 mm and the length of the short side is more than 500 mm. More preferably, the protective film 1 is a long side of the housing 2. The length is more than 1700 mm, and the length of the short side is more than 1600 mm.

如圖1所示,殼體2具有邊緣部。邊緣部可具有呈直線狀延伸之棒狀邊緣構件。一對邊緣構件可相互隔開間隔而平行地配置,同樣地,另一對邊緣構件亦可相互隔開間隔而平行地配置。相接觸之2個邊緣構件可以相互成大致直角之方式使端部連接。As shown in FIG. 1 , the housing 2 has an edge portion. The edge portion may have a linearly extending rod-shaped edge member. A pair of edge members may be spaced apart from each other and arranged in parallel. Similarly, the other pair of edge members may be spaced apart from each other and arranged in parallel. The ends of two contacting edge members can be connected at approximately right angles to each other.

殼體2及其邊緣構件例如可由如下已知材料形成:鋁;鋁合金(例如5000系、6000系、7000系等);鈦;鈦合金;鋼鐵;不鏽鋼;鎂合金;陶瓷(例如SiC、AlN、Al 2O 3等);陶瓷與金屬之複合材料(例如Al-SiC、Al-AlN、Al-Al 2O 3等);PE(Polyethylene,聚乙烯)、PA(Polyamide,聚醯胺)、PC(Polycarbonate,聚碳酸酯)、PEEK(Poly(ether-ether-ketone),聚醚醚酮)等工程塑膠;GFRP(Glass Fiber Reinforced Plastics,玻璃纖維強化塑膠)、CFRP(Carbon Fiber Reinforced Plastics,碳纖維強化塑膠)等纖維複合材料;或其等之組合等。 The housing 2 and its edge members may be formed of, for example, the following known materials: aluminum; aluminum alloys (such as 5000 series, 6000 series, 7000 series, etc.); titanium; titanium alloys; steel; stainless steel; magnesium alloys; ceramics (such as SiC, AIN , Al 2 O 3 , etc.); composite materials of ceramics and metals (such as Al-SiC, Al-AlN, Al-Al 2 O 3, etc.); PE (Polyethylene, polyethylene), PA (Polyamide, polyamide), Engineering plastics such as PC (Polycarbonate, polycarbonate), PEEK (Poly (ether-ether-ketone), polyether ether ketone); GFRP (Glass Fiber Reinforced Plastics, glass fiber reinforced plastics), CFRP (Carbon Fiber Reinforced Plastics, carbon fiber Reinforced plastic) and other fiber composite materials; or combinations thereof, etc.

殼體2之厚度之下限較佳為3.0 mm以上,更佳為3.5 mm以上,進而較佳為4.0 mm以上。另一方面,殼體2之厚度之上限較佳為10.0 mm以下,更佳為8.0 mm以下,進而較佳為7.0 mm以下。The lower limit of the thickness of the housing 2 is preferably 3.0 mm or more, more preferably 3.5 mm or more, and further preferably 4.0 mm or more. On the other hand, the upper limit of the thickness of the housing 2 is preferably 10.0 mm or less, more preferably 8.0 mm or less, and further preferably 7.0 mm or less.

殼體2之寬度較佳為3.5 mm~30 mm之間。藉由處於該範圍內,而確保有效曝光面積,且可耐受護膜薄膜3之張力,因此較佳。殼體2之寬度之下限更佳為4.0 mm以上,進而較佳為6.0 mm以上,進而較佳為12.0 mm以上,較佳為根據殼體2之面積以可耐受膜張力之方式進行變更。尤其於長邊之長度為1700 mm以上、短邊之長度為1600 mm以上之殼體2之情形時,上述殼體2之寬度較佳為15.0 mm以上。另一方面,殼體2之寬度之上限更佳為25 mm以下,進而較佳為20 mm以下。 再者,關於殼體2之寬度,可長邊、短邊之任一邊之寬度均相同,亦可長邊、短邊為分別獨立之寬度。 The width of the housing 2 is preferably between 3.5 mm and 30 mm. Being within this range ensures an effective exposure area and can withstand the tension of the pellicle film 3, so it is preferable. The lower limit of the width of the housing 2 is preferably at least 4.0 mm, further preferably at least 6.0 mm, further preferably at least 12.0 mm, and is preferably changed according to the area of the housing 2 in a manner that can withstand film tension. Especially when the length of the long side is 1700 mm or more and the length of the short side is 1600 mm or more, the width of the casing 2 is preferably 15.0 mm or more. On the other hand, the upper limit of the width of the housing 2 is more preferably 25 mm or less, and further preferably 20 mm or less. Furthermore, regarding the width of the housing 2, the widths of either the long side and the short side may be the same, or the long side and the short side may have independent widths.

於殼體2之內周面或整個面,可視需要塗佈用以捕獲異物之黏著劑(例如丙烯酸系、乙酸乙烯酯系、矽酮系、橡膠系黏著劑等)、或潤滑脂(例如矽酮系、氟系潤滑脂等)。The inner circumferential surface or the entire surface of the housing 2 may be coated with adhesive (such as acrylic, vinyl acetate, silicone, rubber, etc.) or grease (such as silicone) to capture foreign matter if necessary. Ketone series, fluorine series grease, etc.).

護膜薄膜3為透明之薄膜。護膜薄膜3之厚度為10 μm以下,形成為於光微影中使光源所發出之光充分地透過。尤其厚度較佳為2.0 μm~4.5 μm。The protective film 3 is a transparent film. The thickness of the protective film 3 is 10 μm or less, and is formed to fully transmit the light emitted by the light source during photolithography. In particular, the thickness is preferably 2.0 μm to 4.5 μm.

作為構成護膜薄膜3之材料,並無特別限定,例如可例舉:硝化纖維素、纖維素衍生物、氟聚合物、碳材料等,其中,較佳為碳材料。The material constituting the pellicle film 3 is not particularly limited, and examples thereof include nitrocellulose, cellulose derivatives, fluoropolymers, carbon materials, and the like. Among them, carbon materials are preferred.

如圖1(b)所示,護膜薄膜3藉由未圖示之黏著劑而接著及固定於殼體2之一端側,覆蓋殼體2。As shown in FIG. 1(b) , the protective film 3 is adhered and fixed to one end side of the housing 2 by an adhesive (not shown), covering the housing 2 .

如圖1(b)所示,於殼體2之另一端側(殼體2之與護膜薄膜3相反側),配置有用以將護膜1貼附於光罩之黏著層4。As shown in FIG. 1(b) , an adhesive layer 4 for attaching the pellicle 1 to the photomask is disposed on the other end side of the housing 2 (the side of the housing 2 opposite to the pellicle film 3 ).

黏著層4(遮罩黏著層)係包含丙烯酸系、橡膠系、乙烯系、環氧系、矽酮系等之接著劑而構成,更佳之構成材料為丙烯酸系、橡膠系、矽酮系等。黏著層4之厚度例如較佳為0.8 mm~3.0 mm。The adhesive layer 4 (mask adhesive layer) is composed of adhesives such as acrylic, rubber, vinyl, epoxy, silicone, etc., and more preferred materials are acrylic, rubber, silicone, etc. The thickness of the adhesive layer 4 is preferably 0.8 mm to 3.0 mm, for example.

以覆蓋黏著層4之方式配置有剝離膜5(襯墊)。該剝離膜5於非使用時保護黏著層4,且於使用護膜1時自黏著層4剝離。 關於剝離膜5,通常使用聚酯等厚度30 μm~200 μm左右之膜。又,若自黏著層4將剝離膜5剝離時之剝離力較大,則有剝離時黏著層4變形之虞,因此為了成為適宜之剝離力,可於與黏著劑相接之膜表面進行矽酮或氟等離型處理。 The release film 5 (liner) is arranged so as to cover the adhesive layer 4 . The peeling film 5 protects the adhesive layer 4 when not in use, and peels off from the adhesive layer 4 when the protective film 1 is in use. As for the release film 5, a film having a thickness of about 30 μm to 200 μm, such as polyester, is usually used. In addition, if the peeling force when peeling off the peeling film 5 from the adhesive layer 4 is large, there is a risk that the adhesive layer 4 will be deformed during peeling. Therefore, in order to achieve an appropriate peeling force, silicone can be applied to the surface of the film that is in contact with the adhesive. Ketone or fluorine plasma treatment.

剝離膜5具有大於黏著層4之寬度,配置為自黏著層4伸出至殼體2之外周側。The release film 5 has a width larger than that of the adhesive layer 4 and is configured to extend from the adhesive layer 4 to the outer peripheral side of the housing 2 .

並且,對於本實施方式之護膜1,適當調整護膜薄膜3之張力,以使進行以下所示之送風顫動實驗時之位移量及顫動量處於特定範圍。 藉此,於本實施方式之護膜1中,適宜之膜張力到達護膜薄膜3之中央部分,抑制於護膜薄膜3之中央部分產生撓曲,且殼體2所受之應力亦適宜,抑制應變之產生,即便為大型護膜,亦能夠確保結構穩定性。 In addition, for the pellicle 1 of this embodiment, the tension of the pellicle film 3 is appropriately adjusted so that the displacement amount and the tremble amount when performing the air blow flutter test shown below are within a specific range. Thereby, in the pellicle 1 of this embodiment, the appropriate film tension reaches the central part of the pellicle film 3, suppressing the deflection of the central part of the pellicle film 3, and the stress on the housing 2 is also appropriate. Suppressing the occurrence of strain ensures structural stability even for large-scale protective films.

<送風顫動實驗> 以下,對本發明中所定義之送風顫動實驗進行說明。 送風顫動實驗具有以下步驟。 (1)介隔黏著層4將護膜1貼附於平板12(平面板)之步驟; (2)於護膜1與壓盤11(另一平面板)之間設置5.5 mm、8.0 mm、10.0 mm或12.0 mm之間隔之步驟; (3)以包含靜止時之殼體2之一面之假想面為基準,使用送風機13沿著護膜1之長邊方向以1,000 mm/秒送風時,測定經過特定之測定時間,護膜薄膜3相對於假想面於厚度方向上之位移量的步驟;及 (4)獲得位移量之中向接近平板12之第1方向之最大位移量(T1 max)、及向遠離平面板之第2方向之最大位移量(T2 max)的步驟; 以下,對各步驟進行說明。 <Air flow flutter test> Hereinafter, the air flow flutter test defined in the present invention will be described. The supply air flutter experiment has the following steps. (1) Steps of attaching the protective film 1 to the flat plate 12 (flat plate) through the adhesive layer 4; (2) Set 5.5 mm, 8.0 mm, 10.0 between the protective film 1 and the pressure plate 11 (another flat plate) mm or 12.0 mm intervals; (3) Using the imaginary surface including one side of the housing 2 at rest as a reference, use the air blower 13 to blow air at 1,000 mm/second along the long side of the protective film 1, and measure the elapsed time Steps for measuring the displacement amount of the pellicle film 3 in the thickness direction relative to the imaginary surface at a specific time; and (4) obtaining the maximum displacement amount (T1 max ) in the first direction approaching the flat plate 12 among the displacement amounts, and The steps of maximum displacement (T2 max ) in the second direction away from the flat plate; Each step is explained below.

(1)介隔黏著層4(遮罩黏著層)將護膜1貼附於平面板。 圖2係模式性地示出於本發明中進行護膜薄膜3之顫動量之測定(送風顫動實驗)之實驗裝置之一構成例的圖,(a)為俯視圖、(b)為側視圖。 (1) Attach the protective film 1 to the flat panel through the adhesive layer 4 (mask adhesive layer). 2 is a diagram schematically showing a configuration example of an experimental device for measuring the flutter amount of the pellicle film 3 (air flow flutter test) in the present invention, with (a) being a top view and (b) being a side view.

送風顫動實驗之實驗裝置10具備:石壓盤11;於石壓盤11之上側隔開特定間隔且與石壓盤11大致平行地配置之平板12(平面板);配置於平板12之與石壓盤11(另一平面板)對向之側之相反側之複數個雷射位移計P1~P6;及朝向石壓盤11與平板12之間之空間吹送風之送風機13。就送風穩定性而言,石壓盤11較佳為具有特定平坦性者,就構成穩定性之觀點而言,石壓盤11較佳為具有特定剛性者。The experimental device 10 of the air flow vibration experiment includes: a stone pressure plate 11; a flat plate 12 (flat plate) arranged at a specific distance above the stone pressure plate 11 and substantially parallel to the stone pressure plate 11; A plurality of laser displacement meters P1 to P6 on the opposite side to the side facing the pressure plate 11 (another flat plate); and an air blower 13 that blows air toward the space between the stone pressure plate 11 and the flat plate 12 . From the viewpoint of air supply stability, the stone pressure plate 11 is preferably one with specific flatness, and from the viewpoint of structural stability, the stone pressure plate 11 is preferably one with specific rigidity.

關於平板12,由於藉由雷射位移計P1~P6來測定護膜薄膜3之位移,故需要將平板切割成雷射位移計之形狀以使雷射位移計P1~P6能夠測定,且就能夠將護膜薄膜之情況可視化之方面而言,較佳為透明且易加工之材料。尤佳為壓克力板等。 於送風顫動實驗時,護膜1藉由黏著層4而貼附於平板12之下側之面。 Regarding the flat plate 12, since the displacement of the pellicle film 3 is measured by the laser displacement meters P1 to P6, it is necessary to cut the flat plate into the shape of the laser displacement meter so that the laser displacement meters P1 to P6 can measure it, and it can In order to visualize the condition of the pellicle film, a material that is transparent and easy to process is preferred. Acrylic boards are particularly preferred. During the air supply flutter experiment, the protective film 1 is attached to the lower side of the flat plate 12 through the adhesive layer 4 .

石壓盤11及平板12之大小並無特別限定,由所測定之護膜1之大小來決定,通常為較護膜1大之大小。 於本實施方式中,護膜1之大小為長邊1780 mm×短邊1620 mm,平板12之大小為2000 mm×2000 mm。又,石壓盤11之大小較佳為大於平板12。 The size of the stone pressure plate 11 and the flat plate 12 is not particularly limited and is determined by the measured size of the protective film 1, which is usually larger than the protective film 1. In this embodiment, the size of the protective film 1 is 1780 mm on the long side × 1620 mm on the short side, and the size of the flat plate 12 is 2000 mm × 2000 mm. In addition, the size of the stone pressure plate 11 is preferably larger than the flat plate 12 .

若護膜1變大至例如長邊為1700 mm以上,則護膜薄膜2之顫動問題變得顯著。 即,若護膜薄膜1變大,則護膜薄膜3之撓曲或顫動本身亦變大,即便於曝光裝置中,若零件間隔變窄,又,遮罩台之移動高速化、複雜化,則護膜薄膜3之撓曲或顫動之影響亦會變大,護膜薄膜3與遮罩或零件接觸而導致護膜薄膜3受損傷之可能性變高。若護膜薄膜受損傷,則會造成曝光時焦點偏移等不良影響。 If the pellicle 1 becomes larger, for example, with a long side of 1700 mm or more, the problem of fluttering of the pellicle film 2 becomes significant. That is, as the pellicle film 1 becomes larger, the deflection or vibration of the pellicle film 3 itself also becomes larger. Even in the exposure device, if the distance between parts becomes narrower and the movement of the mask table becomes faster and more complicated, Then the influence of the deflection or vibration of the pellicle film 3 will also become greater, and the possibility that the pellicle film 3 will be damaged due to contact with the mask or parts becomes higher. If the protective film is damaged, it will cause adverse effects such as focus shift during exposure.

因此,本發明中之送風顫動實驗係將殼體2之長邊至少為1700 mm以上之大型護膜作為對象。 本發明係於殼體2之長邊至少為1700 mm以上之大型護膜中,考慮到因遮罩台之高速移動所引起之風壓之影響,以顫動之影響變小之方式將護膜薄膜3之張力等最佳化,若僅增大先前之護膜之大小,則無法獲得本發明之效果。 Therefore, the air supply vibration experiment in the present invention targets a large protective film with a long side of the casing 2 of at least 1700 mm. The present invention is a large-scale protective film with a long side of the casing 2 of at least 1700 mm. Taking into account the influence of wind pressure caused by the high-speed movement of the masking table, the protective film is reduced in a way that the influence of vibration is reduced. 3. Optimizing the tension, etc., if only increasing the size of the previous protective film, the effect of the present invention cannot be obtained.

於平板12及石壓盤11之外側配置有送風機13。送風機13係將風吹送至貼附於平板12之護膜1與石壓盤11之間之空間的裝置。 於圖2所示之例中,送風機13自圖中左側朝向右側以特定風速吹送風W。 An air blower 13 is arranged outside the flat plate 12 and the stone pressure plate 11 . The air blower 13 is a device that blows air to the space between the protective film 1 attached to the flat plate 12 and the stone pressure plate 11 . In the example shown in FIG. 2 , the air blower 13 blows the air W at a specific wind speed from the left to the right in the figure.

雷射位移計P1~P6係測定送風時護膜薄膜3之位移(位移之方向、位移量)之裝置,配置於平板12之與供貼附護膜1之側相反之側。 雷射位移計P1~P6之測定點較佳為設置複數個。於本實施方式中,於護膜薄膜3之中央部沿著送風方向,以300 mm間隔配置有6台雷射位移計P1~P6。 Laser displacement meters P1 to P6 are devices for measuring the displacement (direction and amount of displacement) of the protective film 3 during air supply, and are arranged on the side of the flat plate 12 opposite to the side where the protective film 1 is attached. It is preferable to set a plurality of measurement points of the laser displacement meters P1 to P6. In this embodiment, six laser displacement meters P1 to P6 are arranged at intervals of 300 mm along the air supply direction in the center of the pellicle film 3 .

於此種實驗裝置中,將剝離膜5剝離,使露出之黏著層4與平板12之下側之面對向而貼附作為被測定物之護膜1。In this experimental device, the peeling film 5 is peeled off, and the protective film 1 serving as the object to be measured is affixed so that the exposed adhesive layer 4 faces the lower surface of the flat plate 12 .

(2)於護膜1與石壓盤11(另一平面板)之間設置5.5 mm、8.0 mm、10.0 mm或12.0 mm之間隔。 貼附於平板12之護膜1與石壓盤11之間隔D可依照護膜1於實際所使用之微影裝置中與護膜1裝置零件之間隔來適當設定。於本實施方式中,間隔D設為5.5 mm~12.0 mm。 (2) Set a distance of 5.5 mm, 8.0 mm, 10.0 mm or 12.0 mm between the protective film 1 and the stone pressure plate 11 (another flat plate). The distance D between the protective film 1 attached to the flat plate 12 and the stone platen 11 can be appropriately set according to the distance between the protective film 1 and the device components of the protective film 1 in the actual lithography device used. In this embodiment, the distance D is set to 5.5 mm to 12.0 mm.

(3)使用送風機13沿著護膜1送風,測定護膜薄膜3於厚度方向上之位移量。 朝向護膜薄膜3與石壓盤11之間之空間,使用送風機13送風,測定由風壓所引起之護膜薄膜3之位移量。 (3) Use the air blower 13 to blow air along the pellicle 1 and measure the displacement of the pellicle film 3 in the thickness direction. The air blower 13 was used to blow air toward the space between the pellicle film 3 and the stone pressure plate 11, and the displacement amount of the pellicle membrane 3 caused by the wind pressure was measured.

於本實施方式中,送風機13之風速係設定為於護膜薄膜3之中央部成為1000 mm/秒。送風係將2秒之送風與2秒之間隔設為1組,將其反覆4次。 藉由沿著送風方向所配置之6台雷射位移計P1~P6,測定各地點之護膜薄膜3之位移(位移之方向、位移量)。 In this embodiment, the wind speed of the air blower 13 is set to 1000 mm/second at the center of the pellicle film 3 . The air supply system sets the air supply of 2 seconds and the interval of 2 seconds as one set, and repeats this 4 times. By using six laser displacement meters P1 to P6 arranged along the air supply direction, the displacement (direction of displacement and amount of displacement) of the pellicle film 3 at each location is measured.

具體而言,作為護膜薄膜3之位移,以包含靜止時之殼體2之一面之假想面為基準。該假想面表示靜止時之護膜薄膜3。Specifically, the displacement of the pellicle film 3 is based on an imaginary plane including one side of the housing 2 at rest. This imaginary surface represents the pellicle film 3 at rest.

然後,經過特定之測定時間(送風時間),獲得相對於假想面向接近平板12之第1方向之位移量(T1)、及向遠離平板12之第2方向之位移量(T2)。於圖2(b)中,第1方向係自假想面朝向上側之方向,第2方向係自假想面朝向下側之方向。Then, after a specific measurement time (air blowing time), the displacement amount (T1) in the first direction approaching the flat plate 12 and the displacement amount (T2) in the second direction away from the flat plate 12 relative to the imaginary surface are obtained. In FIG. 2(b) , the first direction is the direction from the imaginary surface to the upper side, and the second direction is the direction from the imaginary surface to the lower side.

(4)獲得位移量之中朝向平面之第1方向上之最大位移量(T1 max)、及遠離平面之第2方向之最大位移量(T2 max)。 分別獲得上述(2)步驟中所獲得之向第1方向之位移量(T1)中之最大位移量(T1 max)、及向第2方向之位移量(T2)中之最大位移量(T2 max)。 (4) Obtain the maximum displacement amount in the first direction toward the plane (T1 max ) and the maximum displacement amount in the second direction away from the plane (T2 max ) among the displacement amounts. Obtain the maximum displacement amount (T1 max ) among the displacement amounts in the first direction (T1) obtained in the above ( 2) step, and the maximum displacement amount (T2 max ) among the displacement amounts in the second direction (T2). ).

並且,於本實施方式之護膜1中, (a)向第1方向之位移量(T1)與向第2方向之位移量(T2)之和(Δ位移量=T1+T2)為1.50 mm~2.80 mm,且 (b)向第1方向之最大位移量(T1 max)與第2方向之最大位移量(T2 max)中之較大者(顫動量)為1.00 mm~2.40 mm。 Furthermore, in the protective film 1 of this embodiment, (a) the sum of the displacement amount in the first direction (T1) and the displacement amount in the second direction (T2) (Δ displacement amount = T1 + T2) is 1.50 mm to 2.80 mm, and (b) the greater of the maximum displacement in the first direction (T1 max ) and the maximum displacement in the second direction (T2 max ) (the amount of vibration) is 1.00 mm to 2.40 mm.

藉此,即便因遮罩台移動等而使護膜薄膜3受到風壓,亦能夠抑制護膜薄膜3之變形(位移或顫動),可降低護膜薄膜3與遮罩或裝置零件接觸之風險。Thereby, even if the pellicle film 3 is subject to wind pressure due to movement of the masking table, etc., the deformation (displacement or vibration) of the pellicle film 3 can be suppressed, thereby reducing the risk of the pellicle film 3 coming into contact with the mask or device parts. .

此種護膜薄膜3之位移量或顫動量可藉由適當調節護膜薄膜3之膜張力,而調整至上述範圍。具體而言,例如可例舉適當調節將護膜薄膜3貼附於殼體2時賦予至護膜薄膜3之張力之方向或大小等之方法。The amount of displacement or vibration of the pellicle film 3 can be adjusted to the above range by appropriately adjusting the film tension of the pellicle film 3 . Specifically, for example, a method of appropriately adjusting the direction or magnitude of the tension applied to the pellicle film 3 when attaching the pellicle film 3 to the housing 2 can be exemplified.

具體而言,例如作為殼體2,使用使一對邊部向外側鼓出者,於將護膜薄膜3貼附於殼體2時,於使該鼓出之邊部朝向殼體2之內側彈性變形之狀態下,貼附護膜薄膜3並將其平展,藉此可容易地平衡殼體2之回覆力與護膜薄膜3之平展力。此時,藉由將邊部之鼓出量調整至特定範圍,可適當調節賦予至護膜薄膜3之張力之方向或大小等。 又,藉由使殼體2包含具有特定範圍之楊氏模數之材料,可於將護膜薄膜3貼附於殼體2時,於殼體2成為大致矩形狀之狀態下,適宜地平衡殼體2之回覆力與護膜薄膜3之膜張力。於該情形時,作為楊氏模數,較佳為具有100 MPa以上之材料。 Specifically, for example, as the case 2, a pair of edges bulged outward is used, and when the pellicle film 3 is attached to the case 2, the bulged edges are directed toward the inside of the case 2. In the state of elastic deformation, the protective film 3 is attached and flattened, so that the restoring force of the housing 2 and the flattening force of the protective film 3 can be easily balanced. At this time, by adjusting the bulging amount of the edge portion to a specific range, the direction or magnitude of the tension applied to the pellicle film 3 can be appropriately adjusted. Furthermore, by making the case 2 contain a material with a Young's modulus in a specific range, when the pellicle film 3 is attached to the case 2, the case 2 can be appropriately balanced in a state of being in a substantially rectangular shape. The restoring force of the shell 2 and the film tension of the protective film 3. In this case, a material having a Young's modulus of 100 MPa or more is preferred.

或者,於將護膜薄膜3貼附於殼體2時,於將濕度設為與曝光裝置內之濕度相同程度或高於其之環境下進行,藉此亦能夠將護膜薄膜3之應力維持得較小,可適當調節賦予至護膜薄膜3之張力。Alternatively, when attaching the pellicle film 3 to the casing 2 , it is performed in an environment where the humidity is the same as or higher than the humidity in the exposure device. This can also maintain the stress of the pellicle film 3 is smaller, the tension given to the protective film 3 can be appropriately adjusted.

(a)若位移量T1與T2之和、或(b)顫動量大於上述範圍,則護膜薄膜3所受之張力較低,有可能於護膜薄膜3之中央部分發生撓曲。又,若(a)位移量T1與T2之和、或(b)顫動量小於上述範圍,則護膜薄膜3受到了過大之張力,有可能殼體2所受之應力較大而產生應變。(a) If the sum of the displacement amounts T1 and T2 or (b) the vibration amount is greater than the above range, the tension on the pellicle film 3 is low, and the central part of the pellicle film 3 may be deflected. In addition, if (a) the sum of the displacement amounts T1 and T2 or (b) the vibration amount is smaller than the above range, the pellicle film 3 is subjected to excessive tension, and the casing 2 may be subjected to a large stress and cause strain.

就抑制護膜薄膜3之變形,且謀求護膜薄膜3之張力與殼體2之應力之平衡之觀點而言,需要滿足(a)與(b)兩者。 藉此,於本實施方式之護膜1中,適宜之膜張力到達護膜薄膜3之中央部分,抑制於護膜薄膜3之中央部分發生撓曲,且殼體2所受之應力亦適宜,抑制應變之產生,具有優異之結構穩定性。 From the viewpoint of suppressing the deformation of the pellicle film 3 and achieving a balance between the tension of the pellicle film 3 and the stress of the case 2, both (a) and (b) need to be satisfied. Thereby, in the pellicle 1 of this embodiment, the appropriate film tension reaches the central part of the pellicle film 3, suppressing the deflection of the central part of the pellicle film 3, and the stress on the casing 2 is also appropriate. Suppresses the generation of strain and has excellent structural stability.

(a)Δ位移量(=T1+T2)較佳為超過1.50 mm且未達2.80 mm,更佳為1.60 mm~2.70 mm。又,(b)顫動量較佳為超過1.00 mm且未達2.40 mm,更佳為1.10 mm~2.35 mm。 藉此,可使護膜1之結構穩定性更優異。 (a) The Δ displacement (=T1+T2) is preferably more than 1.50 mm and less than 2.80 mm, more preferably 1.60 mm to 2.70 mm. Moreover, (b) the vibration amount is preferably more than 1.00 mm and less than 2.40 mm, more preferably 1.10 mm to 2.35 mm. Thereby, the structural stability of the protective film 1 can be improved.

再者,Δ位移量及顫動量較佳為基於在送風顫動實驗中沿著護膜薄膜3之複數個測定點處之測定結果而獲得者。 當然,於護膜薄膜3之端部及中央部、送風之上游側及下游側,送風顫動實驗中之行為亦不同。藉由並非僅設置1處測定點,而是設置複數個,更詳細地瞭解護膜1整體之各地點之動向,可提昇送風顫動實驗之可靠性,將護膜整體之位移量及顫動量抑制得更小。 Furthermore, the Δ displacement amount and the flutter amount are preferably obtained based on the measurement results at a plurality of measurement points along the pellicle film 3 in the blower flutter experiment. Of course, the behavior in the air supply flutter experiment is also different at the ends and the center of the pellicle film 3, the upstream side and the downstream side of the air supply. By setting up not just one measurement point, but multiple measurement points, the movement of each location on the entire mulch 1 can be understood in more detail, thereby improving the reliability of the air supply flutter experiment and suppressing the displacement and flutter of the entire mulch. smaller.

進而,於送風顫動實驗中,較佳為設置兩處以上之於送風之上游側之測定點處向第1方向之最大位移量(T1 max)大於在送風之下游側之測定點處向第1方向之最大位移量(T1 max)的測定點之組合。 藉此,可使送風顫動實驗之可靠性更優異。 Furthermore, in the air supply flutter experiment, it is preferable to set up two or more places where the maximum displacement amount (T1 max ) in the first direction at the measuring point on the upstream side of the air supply is larger than that in the first direction at the measuring point on the downstream side of the air supply. The combination of measuring points for the maximum displacement in the direction (T1 max ). In this way, the reliability of the air supply flutter experiment can be improved.

又,於送風顫動實驗中,較佳為設置兩處以上之於送風之上游側之測定點處向第2方向之最大位移量(T2 max)小於在送風之下游側之測定點處向第2方向之最大位移量(T2 max)的測定點之組合。 藉此,可使送風顫動實驗之可靠性更優異。 Furthermore, in the air supply flutter experiment, it is preferable to set up two or more places where the maximum displacement amount (T2 max ) in the second direction at the measurement point on the upstream side of the air supply is smaller than the maximum displacement in the second direction (T2 max ) at the measurement point on the downstream side of the air supply. The combination of measuring points for the maximum displacement in the direction (T2 max ). In this way, the reliability of the air supply flutter experiment can be improved.

進而,於送風顫動實驗中,較佳為即便於改變石壓盤11與護膜薄膜3之間隔D並以同樣之方式進行實驗,設為各間隔之情形時,亦使護膜薄膜3之位移量滿足上述條件。例如於本實施方式中,將護膜薄膜3之中央部之石壓盤11與護膜薄膜3之間隔D變更為5.5 mm、8.0 mm、10.0 mm、12.0 mm並以同樣之方式進行實驗。 藉此,即便於光微影裝置中光罩與裝置零件之間隔等條件改變之情形時,亦能夠確保護膜薄膜3之結構穩定性。 Furthermore, in the air flow flutter test, it is preferable to change the distance D between the stone pressure plate 11 and the pellicle film 3 and perform the experiment in the same manner, assuming that the displacement of the pellicle membrane 3 is maintained at each interval. The quantity satisfies the above conditions. For example, in this embodiment, the distance D between the stone platen 11 in the center of the protective film 3 and the protective film 3 is changed to 5.5 mm, 8.0 mm, 10.0 mm, or 12.0 mm, and the experiment is performed in the same manner. Thereby, even when conditions such as the distance between the photomask and the device parts in the photolithography device change, the structural stability of the pellicle film 3 can be ensured.

認為護膜1越大型,則位移或顫動量變得越大。因此,於本實施方式之護膜1為殼體2之長邊之長度為600 mm以上4000 mm以下、及短邊之長度為500 mm以上3000 mm以下般之大型護膜之情形時,可使本發明之效果更顯著,故較佳。尤其,於殼體2之長邊之長度為1700 mm以上4000 mm以下、短邊之長度為1600 mm以上3000 mm以下般之情形時,可使本發明之效果進一步顯著。It is considered that the larger the protective film 1 is, the greater the amount of displacement or vibration becomes. Therefore, when the protective film 1 of this embodiment is a large protective film such that the length of the long side of the housing 2 is not less than 600 mm and not more than 4000 mm, and the length of the short side is not less than 500 mm and not more than 3000 mm, it can be used The effect of the present invention is more significant, so it is better. In particular, when the length of the long side of the housing 2 is from 1,700 mm to 4,000 mm, and the length of the short side is from 1,600 to 3,000 mm, the effect of the present invention can be further enhanced.

以上,對本發明之實施方式進行了說明,但本發明並不限定於此,可於不脫離發明主旨之範圍內適當進行變更。 例如於本實施方式中,使用雷射位移計來測定護膜薄膜之位移(位移之方向、位移量),但只要為可測定護膜薄膜之位移者,亦可為除雷射位移計以外之位移計。 又,於上述實施方式中,將雷射位移計配置於平板側,自上側測定護膜薄膜之位移,但亦可將雷射位移計配置於石壓盤側,自護膜薄膜之下側直接測定護膜薄膜之位移。 [實施例] The embodiments of the present invention have been described above. However, the present invention is not limited thereto and may be appropriately modified within the scope of the invention. For example, in this embodiment, a laser displacement meter is used to measure the displacement (direction of displacement, amount of displacement) of the pellicle film. However, as long as it can measure the displacement of the pellicle film, it may be other than a laser displacement meter. Displacement meter. Moreover, in the above embodiment, the laser displacement meter is arranged on the side of the flat plate and the displacement of the protective film is measured from the upper side. However, the laser displacement meter can also be arranged on the side of the stone plate and measured directly from the lower side of the protective film. Measure the displacement of the protective film. [Example]

繼而,例舉實施例來更具體地說明本發明。然而,本發明只要不脫離其主旨,便不限定於以下實施例。實施例中之物性係藉由以下方法進行測定。 又,只要無特別指定,則護膜之製作及送風顫動實驗係於室溫(23℃)下進行。 Next, an Example is given and this invention is demonstrated more concretely. However, the present invention is not limited to the following examples unless it deviates from the gist of the invention. The physical properties in the examples were measured by the following methods. In addition, unless otherwise specified, the production of the protective film and the air flow vibration test are performed at room temperature (23°C).

[護膜之製作] <實施例> (1)附黏著層之殼體之製作 使用外徑1620 mm×1780 mm×高度6.5 mm、長邊寬16.5 mm、短邊寬18.5 mm且材質使用鋁合金,殼體之剖面形狀為長方形之形狀者。該殼體設為以各邊部之中央附近向外側凸起之方式彎曲鼓出之形狀,作為初始形狀之向外側之凸量,長邊部側設為10.0 mm,短邊部側設為5.0 mm。然後,對所使用之殼體實施黑色氧化鋁膜處理。 其後,於殼體之下端面塗附厚度1.5 mm之苯乙烯-乙烯-丁烯-苯乙烯之橡膠系熱熔黏著劑作為遮罩黏著材。為了保護黏著劑而將保護膜(PET)貼附於黏著劑,從而製成附黏著劑之殼體。 [Production of protective film] <Example> (1) Preparation of shell with adhesive layer The outer diameter is 1620 mm×1780 mm×height 6.5 mm, the long side width is 16.5 mm, and the short side width is 18.5 mm. The material is made of aluminum alloy, and the cross-sectional shape of the shell is a rectangular shape. The housing is curved and bulged in such a way that the center of each side protrudes outward. The outward protrusion of the initial shape is 10.0 mm on the long side and 5.0 on the short side. mm. Then, the used casing is treated with a black aluminum oxide film. Afterwards, a 1.5 mm thick styrene-ethylene-butylene-styrene rubber-based hot-melt adhesive was applied to the lower end surface of the shell as a mask adhesive material. In order to protect the adhesive, a protective film (PET) is attached to the adhesive to form an adhesive-attached case.

(2)護膜薄膜之製作 作為護膜薄膜,將纖維素酯之聚合物溶液塗佈於低鹼玻璃上,利用閉杯(closed cup)式旋轉塗佈而形成主膜。 繼而,將利用旋轉塗佈於該主膜上塗佈氟聚合物溶液而成膜抗反射層之厚度4 μm之護膜薄膜轉印至外尺寸為2000 mm×2000 mm之經氧化鋁膜處理之鋁合金之模框,同樣地進行準備。 一面以(1)中所製作之附黏著劑之殼體之各邊部成為大致直線狀之方式使用治具向內側壓住,一面經由膜接著劑使(2)中所製作之護膜薄膜接著於上述殼體。其後,自短邊部側解除由治具所致之外力,其後,解除長邊部側之由治具所致之外力,而製作護膜。 適當調節賦予至護膜薄膜之張力之方向或大小等,且經由接著劑將所獲得之護膜薄膜貼附於附黏著劑之殼體之上端面,藉此製作實施例之護膜。 (2) Production of protective film As a protective film, a polymer solution of cellulose ester is coated on low-alkali glass, and a closed cup spin coating is used to form a main film. Then, the fluoropolymer solution was coated on the main film by spin coating to form an anti-reflective layer with a thickness of 4 μm and the protective film was transferred to an aluminum oxide film-treated surface with an outer size of 2000 mm × 2000 mm. The aluminum alloy mold frame is prepared in the same way. While using a jig to press inward the sides of the adhesive-coated casing made in (1) so that each edge is roughly straight, adhere the protective film made in (2) through the film adhesive. in the above casing. Thereafter, the external force caused by the jig is released from the short side part side, and then the external force caused by the jig is released from the long side part side, and a protective film is produced. The direction or size of the tension applied to the pellicle film is appropriately adjusted, and the pellicle film obtained is attached to the upper end surface of the adhesive-attached case via an adhesive, thereby producing a pellicle of the embodiment.

[送風顫動實驗] 對於所獲得之護膜,使用圖2所示之實驗裝置進行送風顫動實驗。 使用KEYENCE公司製造之NR-500作為雷射位移計。雷射位移計係於護膜薄膜之中央部沿著送風方向(護膜之長邊方向)以300 mm間隔配置有6台(P1~P6)。 [Air supply flutter experiment] For the obtained protective film, the experimental device shown in Figure 2 was used to conduct an air supply flutter experiment. Use NR-500 manufactured by KEYENCE Company as the laser displacement meter. Six laser displacement meters (P1 to P6) are arranged at intervals of 300 mm in the center of the pellicle film along the air supply direction (the long side direction of the pellicle).

(1)經由遮罩黏著劑將護膜貼附於平板(平面板)。 介隔黏著層將作為被測定物之護膜對向地貼附於平板之下側之面。平板為厚度5.0 mm之壓克力板,其大小為2000 mm×2000 mm。進而,為了抑制平板之撓曲,將鋁合金補強體呈格子狀設置於平板之上側。 然後,將石壓盤(另一平面板)與護膜薄膜之間隔設為5.5 mm。石壓盤之大小為2500 mm×2500 mm。 (1) Attach the protective film to the flat panel (flat panel) via mask adhesive. The intervening adhesive layer attaches the protective film as the object to be measured to the lower side of the flat plate. The flat plate is an acrylic plate with a thickness of 5.0 mm and a size of 2000 mm × 2000 mm. Furthermore, in order to suppress the deflection of the flat plate, aluminum alloy reinforcements are provided on the upper side of the flat plate in a lattice shape. Then, set the distance between the stone pressure plate (another flat plate) and the protective film to 5.5 mm. The size of the stone pressure plate is 2500 mm×2500 mm.

(2)使用送風機,沿著護膜之長邊方向送風,測定護膜薄膜於厚度方向上之位移量。 送風機之風速設為於護膜薄膜之中央部成為1000 mm/秒。送風係將2秒之送風與2秒之間隔設為1組,將其反覆4次(合計16秒)。 (2) Use an air blower to blow air along the long side of the protective film, and measure the displacement of the protective film in the thickness direction. The wind speed of the air blower is set to 1000 mm/second at the center of the pellicle film. The air supply system consists of a set of 2 seconds of air supply and 2 seconds of interval, and repeats this 4 times (a total of 16 seconds).

藉由沿著送風方向所配置之雷射位移計P1~P6,測定各地點處之護膜薄膜之位移(位移之方向、位移量)。具體而言,作為護膜薄膜之位移,以包含殼體之一面之假想面為基準,經過測定時間(送風時間),獲得相對於假想面向接近平板之第1方向之位移量(T1)、及向遠離平板之第2方向之位移量(T2)。By using laser displacement meters P1 to P6 arranged along the air supply direction, the displacement (direction of displacement and amount of displacement) of the pellicle film at each location is measured. Specifically, as the displacement of the pellicle film, the displacement amount (T1) in the first direction close to the flat plate with respect to the imaginary surface is obtained after the measurement time (air blowing time) is based on the imaginary plane including one surface of the casing, and The amount of displacement in the second direction away from the plate (T2).

圖3係模式性地示出利用雷射位移計P1~P6之各者所測得之護膜薄膜之位移的圖。 於圖3中,0為假想面,表示靜止時之護膜薄膜。將該假想面作為護膜薄膜之位移之基準面。 相對於基準面(0),圖之上側(+)表示向接近平板之第1方向之位移,圖之下側(-)表示向遠離平板之第2方向之位移。 FIG. 3 is a diagram schematically showing the displacement of the pellicle film measured by each of the laser displacement meters P1 to P6. In Figure 3, 0 is an imaginary surface, representing the protective film at rest. This imaginary plane is used as the reference plane for the displacement of the pellicle film. Relative to the datum plane (0), the upper side (+) of the figure indicates the displacement in the first direction closer to the flat plate, and the lower side (-) of the figure indicates the displacement in the second direction away from the flat plate.

根據圖3可知,當開始送風(Blow on)時,護膜薄膜因風壓而顫動、位移,當停止送風(Blow off)時,恢復為原狀。 作為顫動之大致傾向,於送風之上游側(P1~P2),觀察到護膜薄膜相對於基準面於偏向第1方向上顫動之傾向。於下游側(P5~P6),觀察到護膜薄膜相對於基準面於偏向第2方向上顫動之傾向。於中央部分(P3~P5),觀察到護膜薄膜相對於基準面於第1及第2方向兩者顫動之傾向。 又,於送風之上游側位移相對較大,於下游側位移相對較小。於中央部分之位移尤其大。 According to Figure 3, it can be seen that when the air blowing starts (Blow on), the protective film vibrates and shifts due to the wind pressure, and when the air blowing stops (Blow off), it returns to its original state. As a general tendency of the vibration, on the upstream side (P1 to P2) of the air supply, the tendency of the pellicle film to vibrate in the first direction relative to the reference plane was observed. On the downstream side (P5 to P6), a tendency of the pellicle film to vibrate in the second direction relative to the reference plane was observed. In the central portion (P3 to P5), a tendency of the pellicle film to vibrate in both the first and second directions relative to the reference plane was observed. In addition, the displacement on the upstream side of the air supply is relatively large, and the displacement on the downstream side is relatively small. The displacement in the central part is particularly large.

圖4係示出於圖3中之第1測定點(Blow on時),利用雷射位移計P1~P6所測得之護膜薄膜之位移量的圖,圖5係示出於圖3中之第2測定點(Blow off時),利用雷射位移計P1~P6所測得之護膜薄膜之位移量的圖。 於圖4及圖5中,測量位置0表示沿著送風方向之護膜薄膜之中心。 Figure 4 is a graph showing the displacement of the pellicle film measured by laser displacement meters P1 to P6 at the first measurement point in Figure 3 (when blowing on). Figure 5 is a graph showing the displacement of the pellicle film in Figure 3 At the second measurement point (when Blow off), the displacement of the pellicle film measured by laser displacement meters P1 to P6 is shown. In Figures 4 and 5, the measurement position 0 represents the center of the pellicle film along the air supply direction.

於圖4及圖5中,將利用P1~P6所測得之向第1方向之位移量T1中之最大值設為T1 max。又,將利用P1~P6所測得之向第2方向之位移量T2中之最大值設為T2 max。 例如,於圖4所示之第1點,向第1方向之位移量最大的是利用P2所測得之0.96[mm],將該值設為T1 max。又,向第2方向之位移量最大的是利用P5所測得之1.70[mm],將該值設為T2 maxIn FIGS. 4 and 5 , the maximum value of the displacement amounts T1 in the first direction measured using P1 to P6 is set to T1 max . Moreover, let the maximum value among the displacement amounts T2 in the second direction measured using P1 to P6 be T2 max . For example, at the first point shown in Figure 4, the maximum displacement amount in the first direction is 0.96 [mm] measured using P2, and this value is set to T1 max . In addition, the maximum displacement amount in the second direction is 1.70 [mm] measured by P5, and this value is set to T2 max .

再者,於圖3~圖5中,向第2方向之位移係以負(-)表示,但本發明中所規定之T1、T2等之值係位移量之絕對值,以正值表示。Furthermore, in Figures 3 to 5, the displacement in the second direction is expressed as negative (-), but the values of T1, T2, etc. specified in the present invention are the absolute values of the displacement and are expressed as positive values.

並且,向第1方向之位移量(T1)與向上述第2方向之位移量(T2)之和(Δ位移量=T1+T2)為0.96[mm]+1.70[mm]=2.66[mm]。Furthermore, the sum of the displacement amount in the first direction (T1) and the displacement amount in the second direction (T2) (Δ displacement amount = T1 + T2) is 0.96 [mm] + 1.70 [mm] = 2.66 [mm].

再者,於本實施例中,於Δ位移量之運算時,分別使用T1 max、T1 max之值作為T1、T2,但並不限定於此。 Furthermore, in this embodiment, when calculating the Δ displacement, the values of T1 max and T1 max are respectively used as T1 and T2, but they are not limited to this.

又,向第1方向之最大位移量(T1 max)與向上述第2方向之最大位移量(T2 max)中之較大者(顫動量)為T2 max之1.70[mm]。 In addition, the larger of the maximum displacement amount in the first direction (T1 max ) and the maximum displacement amount in the second direction (T2 max ) (vibration amount) is 1.70 [mm] of T2 max .

同樣地,於圖5所示之第2點,向第1方向之位移量最大之T1 max係利用P2所測得之2.29[mm]。又,向第2方向之位移量最大之T2 max係利用P6所測得之0.15[mm]。 Similarly, at the second point shown in Figure 5, T1 max , which has the largest displacement in the first direction, is 2.29 [mm] measured using P2. In addition, T2 max, which has the largest displacement amount in the second direction, is 0.15 [mm] measured using P6.

並且,向第1方向之位移量(T1)與向上述第2方向之位移量(T2)之和(Δ位移量=T1+T2)為2.29[mm]+0.15[mm]=2.44[mm]。Furthermore, the sum of the displacement amount in the first direction (T1) and the displacement amount in the second direction (T2) (Δ displacement amount = T1 + T2) is 2.29 [mm] + 0.15 [mm] = 2.44 [mm].

又,向第1方向之最大位移量(T1 max)與向上述第2方向之最大位移量(T2 max)中之較大者(顫動量)為T1 max之2.29[mm]。 In addition, the larger of the maximum displacement amount in the first direction (T1 max ) and the maximum displacement amount in the second direction (T2 max ) (vibration amount) is 2.29 [mm] of T1 max .

將護膜薄膜之中央部之石壓盤與護膜薄膜之間隔改變為8.0 mm、10.0 mm、12.0 mm,並以同樣之方式進行送風顫動實驗。Change the distance between the stone pressure plate in the center of the protective film and the protective film to 8.0 mm, 10.0 mm, and 12.0 mm, and conduct the air supply flutter experiment in the same way.

又,作為比較例,準備與實施例1相同尺寸之附黏著劑之殼體,使各邊部不向內側壓住而接著於護膜薄膜,除此以外,以與實施例同樣之方式製作護膜,將石壓盤與護膜薄膜之間隔設為5.5 mm、8.0 mm、10.0 mm、12.0 mm,以同樣之方式進行送風顫動實驗。Furthermore, as a comparative example, a case with adhesive attached of the same size as in Example 1 was prepared, and other than that each edge was adhered to the protective film without being pressed inward, the protective film was produced in the same manner as in Example 1. membrane, set the distance between the stone pressure plate and the protective film to 5.5 mm, 8.0 mm, 10.0 mm, and 12.0 mm, and conduct the air supply flutter experiment in the same way.

並且,將針對各情形於第1測定點(Blow on時)及第2測定點(Blow off時)所測得之護膜薄膜之位移量(T1、T2)中之最大值(T1 max、T2 max)、T1 max+T2 max之和(T1 max+T2 max)、及T1 max與T2 max中之較大者(T max:顫動量)一併示於表1中。 In addition, for each case, the maximum value (T1 max , T2 ) of the displacement amounts (T1, T2) of the pellicle film measured at the first measurement point (when Blow on) and the second measurement point (when Blow off) were measured. max ), the sum of T1 max + T2 max (T1 max + T2 max ), and the larger of T1 max and T2 max (T max : tremor amount) are shown in Table 1 together.

[表1]    間隔 [mm] 風速 [mm/秒] 位移量[mm] 第1測定點(Blow on) 第2測定點(Blow off) T1 max T2 max T1 max+ T2 max T max T1 max T2 max T1 max+ T2 max T max 實施例 5.5 1.000 0.96 1.70 2.66 1.70 2.29 0.15 2.44 2.29 8.0 1.000 1.45 0.79 2.24 1.45 2.04 0.16 2.20 2.04 10.0 1.000 1.30 0.74 2.04 1.30 1.52 0.14 1.66 1.52 12.0 1.000 1.19 0.89 2.08 1.19 1.63 0.21 1.84 1.63 比較例 5.5 1.000 1.12 2.00 3.12 2.00 2.69 0.18 2.87 2.69 8.0 1.000 1.71 0.93 2.64 1.71 2.40 0.19 2.59 2.40 10.0 1.000 1.53 0.88 2.41 1.53 1.79 0.15 1.94 1.79 12.0 1.000 1.39 1.05 2.44 1.39 1.92 0.25 2.17 1.92 [Table 1] Spacing[mm] Wind speed [mm/second] Displacement[mm] 1st measuring point (Blow on) 2nd measuring point (Blow off) T1 max T2 max T1 max + T2 max Tmax T1 max T2 max T1 max + T2 max Tmax Example 5.5 1.000 0.96 1.70 2.66 1.70 2.29 0.15 2.44 2.29 8.0 1.000 1.45 0.79 2.24 1.45 2.04 0.16 2.20 2.04 10.0 1.000 1.30 0.74 2.04 1.30 1.52 0.14 1.66 1.52 12.0 1.000 1.19 0.89 2.08 1.19 1.63 0.21 1.84 1.63 Comparative example 5.5 1.000 1.12 2.00 3.12 2.00 2.69 0.18 2.87 2.69 8.0 1.000 1.71 0.93 2.64 1.71 2.40 0.19 2.59 2.40 10.0 1.000 1.53 0.88 2.41 1.53 1.79 0.15 1.94 1.79 12.0 1.000 1.39 1.05 2.44 1.39 1.92 0.25 2.17 1.92

於如上所述之送風顫動實驗中,於實施例之護膜中, (a)向第1方向之位移量(T1)與向第2方向之位移量(T2)之和(Δ位移量=T1+T2)為1.50 mm~2.80 mm,且 (b)向第1方向之最大位移量(T1 max)與向第2方向之最大位移量(T2 max)中之較大者(顫動量)為1.00 mm~2.40 mm。 於滿足關於(a)Δ位移量或(b)顫動量之兩者之條件的實施例之護膜中,護膜薄膜之張力適宜,護膜薄膜之應變或變形得到抑制,結構穩定性得以確保。 In the air supply flutter test as described above, in the protective film of the example, (a) the sum of the displacement amount in the first direction (T1) and the displacement amount in the second direction (T2) (Δ displacement = T1 + T2 ) is 1.50 mm ~ 2.80 mm, and (b) the greater of the maximum displacement amount in the first direction (T1 max ) and the maximum displacement amount in the second direction (T2 max ) (the vibration amount) is 1.00 mm ~ 2.40mm. In the pellicle of the embodiment that satisfies both conditions regarding (a) Δ displacement or (b) tremor amount, the tension of the pellicle film is appropriate, the strain or deformation of the pellicle film is suppressed, and the structural stability is ensured. .

相對於此,於比較例之護膜中,(a)Δ位移量及(b)顫動量之至少一者不滿足上述範圍。On the other hand, in the protective film of the comparative example, at least one of (a) the Δ displacement amount and (b) the vibration amount does not satisfy the above range.

進而,對於顫動試驗後之護膜薄膜,以下述方式確認有無損傷。 即,首先,於暗室中對顫動試驗前之護膜薄膜照射聚光燈,藉由目視確認無損傷。繼而,於顫動試驗後自平板將護膜卸除,於暗室中照射聚光燈,藉由目視確認有無損傷。 其結果,實施例之護膜薄膜無損傷,比較例之護膜薄膜於P2或P5附近產生了損傷。 Furthermore, the presence or absence of damage to the pellicle film after the flutter test was confirmed in the following manner. That is, first, the pellicle film before the flutter test was irradiated with a spotlight in a dark room to visually confirm that there was no damage. Then, after the vibration test, the protective film was removed from the flat panel, and a spotlight was irradiated in a dark room to visually confirm whether there was any damage. As a result, the pellicle film of the Example was not damaged, but the pellicle film of the Comparative Example was damaged near P2 or P5.

以上,對本發明之實施方式進行了說明,但本發明並不限定於此,可於不脫離發明主旨之範圍內適當進行變更。 [產業上之可利用性] The embodiments of the present invention have been described above. However, the present invention is not limited thereto and may be appropriately modified within the scope of the invention. [Industrial availability]

藉由使用本發明之護膜,可使護膜薄膜之張力或殼體之應力適宜,抑制應變,確保結構穩定性。 藉此,即便為大型護膜,即便受到因遮罩台之高速移動所引起之風壓之影響,亦能夠使變形較小,抑制護膜薄膜之光學特性之變化、或護膜薄膜向遮罩或裝置之接觸。 By using the protective film of the present invention, the tension of the protective film or the stress of the housing can be made appropriate, strain can be suppressed, and structural stability can be ensured. This allows small deformation of large-sized pellicles even under the influence of wind pressure caused by high-speed movement of the masking table, thereby suppressing changes in the optical properties of the pellicle film or the movement of the pellicle film to the mask. or device contact.

1:護膜 2:殼體 3:護膜薄膜 4:黏著層 5:剝離膜 10:實驗裝置 11:石壓盤 12:平板 13:送風機 D:石壓盤11與護膜薄膜3之間隔 P1~P6:雷射位移計 W:風 1: Protective film 2: Shell 3: Protective film 4:Adhesive layer 5: Peel off film 10: Experimental device 11: Stone pressure plate 12: Tablet 13: Blower D: Space between stone pressure plate 11 and protective film 3 P1~P6: Laser displacement meter W: wind

圖1(a)、(b)係示出護膜之一構成例之圖。 圖2(a)、(b)係模式性地示出送風顫動實驗中所使用之實驗裝置之一構成例之圖。 圖3係模式性地示出利用雷射位移計P1~P6之各者所測得之護膜薄膜之位移的圖。 圖4係示出實施例中,於第1測定點利用雷射位移計P1~P6所測得之護膜薄膜之位移量的圖。 圖5係示出實施例中,於第2測定點利用雷射位移計P1~P6所測得之護膜薄膜之位移量的圖。 FIGS. 1(a) and 1(b) are diagrams showing a structural example of a protective film. 2 (a) and (b) are diagrams schematically showing an example of the configuration of an experimental device used in the air supply flutter experiment. FIG. 3 is a diagram schematically showing the displacement of the pellicle film measured by each of the laser displacement meters P1 to P6. FIG. 4 is a diagram showing the displacement amount of the pellicle film measured at the first measurement point using laser displacement meters P1 to P6 in the embodiment. FIG. 5 is a graph showing the displacement amount of the pellicle film measured at the second measurement point using laser displacement meters P1 to P6 in the embodiment.

1:護膜 1: Protective film

2:殼體 2: Shell

3:護膜薄膜 3: Protective film

4:黏著層 4:Adhesive layer

10:實驗裝置 10: Experimental device

11:石壓盤 11: Stone pressure plate

12:平板 12: Tablet

13:送風機 13: Blower

D:石壓盤11與護膜薄膜3之間隔 D: Space between stone pressure plate 11 and protective film 3

P1~P6:雷射位移計 P1~P6: Laser displacement meter

W:風 W: wind

Claims (6)

一種護膜,其特徵在於:具備矩形狀殼體、設置於上述殼體之一面側之護膜薄膜、及設置於上述殼體之另一面側之遮罩黏著劑,且上述殼體之長邊之長度為600 mm以上,及短邊之長度為500 mm以上,且 於進行具有以下步驟: (1)經由上述遮罩黏著劑將上述護膜貼附於平面板之步驟; (2)於上述護膜與另一平面板之間設置5.5 mm、8.0 mm、10.0 mm或12.0 mm之間隔之步驟; (3)以包含靜止時之上述殼體之一面之假想面為基準,使用送風機沿著上述護膜之長邊方向,朝上述護膜與上述另一平面板之間以1,000 mm/秒送風時,測定經過特定之測定時間,上述護膜薄膜相對於上述假想面於厚度方向上之位移量的步驟;及 (4)獲得上述位移量之中向接近上述平面板之第1方向之位移量、及向遠離上述平面板之第2方向之位移量的步驟; 之送風顫動實驗時, 向上述第1方向之位移量(T1)與向上述第2方向之位移量(T2)之和(Δ位移量=T1+T2)為1.50 mm~2.80 mm,且 向上述第1方向之最大位移量(T1 max)與向上述第2方向之最大位移量(T2 max)中之較大者(顫動量)為1.00 mm~2.40 mm。 A protective film, characterized by: having a rectangular casing, a protective film film disposed on one side of the casing, and a mask adhesive disposed on the other side of the casing, and the long side of the casing The length is more than 600 mm, and the length of the short side is more than 500 mm, and the following steps are performed: (1) The step of attaching the above-mentioned protective film to the flat panel through the above-mentioned mask adhesive; (2) The above-mentioned steps Steps to set a gap of 5.5 mm, 8.0 mm, 10.0 mm or 12.0 mm between the protective film and another flat panel; (3) Based on the imaginary surface including one side of the above-mentioned housing at rest, use an air blower to move along the above-mentioned protective film. The step of measuring the displacement of the above-mentioned pellicle film in the thickness direction relative to the above-mentioned imaginary surface after a specific measurement time when air is blown at 1,000 mm/second between the above-mentioned pellicle and the above-mentioned other flat plate in the longitudinal direction of the film. ; and (4) the step of obtaining the displacement amount in the first direction close to the above-mentioned flat plate and the displacement amount in the second direction away from the above-mentioned flat plate among the above-mentioned displacement amounts; During the air supply flutter experiment, to the above-mentioned first direction The sum of the displacement in the direction (T1) and the displacement in the second direction (T2) (Δdisplacement = T1 + T2) is 1.50 mm ~ 2.80 mm, and the maximum displacement in the first direction (T1 max ) is equal to The larger of the maximum displacement amounts (T2 max ) in the above-mentioned second direction (tremor amount) is 1.00 mm to 2.40 mm. 如請求項1之護膜,其中向上述第1方向之最大位移量(T1 max)大於向上述第2方向之最大位移量(T2 max)。 The protective film of claim 1, wherein the maximum displacement amount in the above-mentioned first direction (T1 max ) is greater than the maximum displacement amount in the above-mentioned second direction (T2 max ). 如請求項1之護膜,其中上述Δ位移量及上述顫動量係基於在上述送風顫動實驗中沿著上述護膜薄膜之複數個測定點處之測定結果而獲得者。The protective film of claim 1, wherein the Δ displacement amount and the vibration amount are obtained based on the measurement results at a plurality of measurement points along the protective film film in the air supply vibration experiment. 如請求項1之護膜,其中於上述送風顫動實驗中,設置兩處以上之於送風之上游側之測定點處向上述第1方向之最大位移量大於在送風之下游側之測定點處向上述第1方向之最大位移量的該測定點之組合。Such as the protective film of claim 1, wherein in the above-mentioned air supply flutter experiment, the maximum displacement amount in the first direction at the measuring point on the upstream side of the air supply is greater than that at the measuring point on the downstream side of the air supply. The combination of the measurement points of the maximum displacement amount in the first direction. 如請求項1之護膜,其中於上述送風顫動實驗中,設置兩處以上之於送風之上游側之測定點處向上述第2方向之最大位移量小於在送風之下游側之測定點處向上述第2方向之最大位移量的該測定點之組合。Such as the protective film of claim 1, wherein in the above-mentioned air supply flutter experiment, the maximum displacement amount in the second direction at the measuring point on the upstream side of the air supply is smaller than that at the measuring point on the downstream side of the air supply. The combination of the measurement points of the maximum displacement amount in the above-mentioned second direction. 如請求項1之護膜,其中上述殼體之長邊之長度為600 mm以上4000 mm以下,及短邊之長度為500 mm以上3000 mm以下。Such as the protective film of claim 1, wherein the length of the long side of the above-mentioned housing is not less than 600 mm and not more than 4000 mm, and the length of the short side is not less than 500 mm and not more than 3000 mm.
TW112102815A 2022-01-26 2023-01-19 Protective film TWI855515B (en)

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