TW202340422A - Delayed fluorescence material, laser oscillation material, and laser element - Google Patents

Delayed fluorescence material, laser oscillation material, and laser element Download PDF

Info

Publication number
TW202340422A
TW202340422A TW111143948A TW111143948A TW202340422A TW 202340422 A TW202340422 A TW 202340422A TW 111143948 A TW111143948 A TW 111143948A TW 111143948 A TW111143948 A TW 111143948A TW 202340422 A TW202340422 A TW 202340422A
Authority
TW
Taiwan
Prior art keywords
delayed fluorescent
fluorescent material
ring
formula
group
Prior art date
Application number
TW111143948A
Other languages
Chinese (zh)
Inventor
合志憲一
安部彩乃
安達千波矢
亞茲達尼 薩哈爾 阿拉斯萬德
法蒂瑪 班傑科
藤原隆
Original Assignee
國立大學法人九州大學
日商考拉科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 國立大學法人九州大學, 日商考拉科技股份有限公司 filed Critical 國立大學法人九州大學
Publication of TW202340422A publication Critical patent/TW202340422A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/06Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30Coordination compounds
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2101/00Properties of the organic materials covered by group H10K85/00
    • H10K2101/20Delayed fluorescence emission

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Materials For Photolithography (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)

Abstract

This delayed fluorescence material expressed by formula (1) has a long sustained laser oscillation time and is useful as a laser oscillation material. In the formula, [sigma]em is the stimulated emission cross-sectional area, [sigma]TT is the absorption cross-sectional area in the excited triplet state, kISC is the intersystem crossing rate from the excited singlet state to the excited triplet state, and kRISC is the reverse intersystem crossing rate from the excited triplet state to the excited singlet state.

Description

延遲螢光材料、雷射振盪材料及雷射元件Delayed fluorescent materials, laser oscillation materials and laser components

本發明係有關一種雷射振盪之延遲螢光材料。又,本發明亦係有關一種使用了這樣的延遲螢光材料之雷射振盪材料、雷射元件。進而,本發明亦係有關一種延遲螢光材料之評價方法、使用了其之延遲螢光材料之設計方法、雷射振盪材料之設計方法、雷射元件之設計方法。又,本發明還係有關一種用於該等之資料庫、程式。The invention relates to a laser oscillation delayed fluorescent material. Furthermore, the present invention also relates to a laser oscillation material and a laser element using such a delayed fluorescent material. Furthermore, the present invention also relates to an evaluation method of a delayed fluorescent material, a design method of a delayed fluorescent material using the delayed fluorescent material, a design method of a laser oscillation material, and a design method of a laser element. In addition, the present invention also relates to a database and a program for the above.

有機雷射的波長可調性廣,並且容易將製造成本抑制得低,因此受到矚目,期待對將微型雷射顯示器組裝到隱形眼鏡之增強現實(AR)裝置、分光測量器用光源、生物感測技術等的應用。為了響應這樣的期待,積極地進行雷射材料、共振器結構的研究之結果,開發了將有機螢光材料用於振盪材料之光激發有機固態雷射(OSSL)、電流激發型有機半導體雷射二極體(OSLD)。 然而,習知之有機雷射存在如下課題,亦即,無論是持續照射激發光,還是持續流通電流,雷射振盪都會在短時間內結束。這係因為:在有機螢光材料處於激發狀態之期間,長壽命的三重態激子蓄積而引起激發三重態狀態吸收,誘導發射過程受到阻礙(參閱非專利文獻1~非專利文獻7)。因此,為了在光激發或電流激發下,使用有機螢光材料實現有效率的連續雷射振盪,需要抑制激發三重態狀態的蓄積。 Organic lasers are attracting attention due to their wide wavelength tunability and the ease of keeping manufacturing costs low. They are expected to be used in augmented reality (AR) devices incorporating micro laser displays into contact lenses, light sources for spectrometers, and biosensing. Applications of technology, etc. In response to such expectations, as a result of active research on laser materials and resonator structures, light-excited organic solid-state lasers (OSSL) and current-excited organic semiconductor lasers using organic fluorescent materials as oscillation materials have been developed. Diode (OSLD). However, conventional organic lasers have the following problem. That is, whether the excitation light is continuously irradiated or the current is continuously passed, the laser oscillation will end in a short time. This is because while the organic fluorescent material is in an excited state, long-lived triplet excitons accumulate, causing absorption in the excited triplet state, and the induced emission process is hindered (see Non-Patent Document 1 to Non-Patent Document 7). Therefore, in order to achieve efficient continuous laser oscillation using organic fluorescent materials under photoexcitation or current excitation, it is necessary to suppress the accumulation of excited triplet states.

[非專利文獻1] Forget, S.;Chénais, S.;Organic Solid-State Lasers;Springer, 2013. [非專利文獻2] Org. Electron. 2011, 12, 8, 1346-1351. [非專利文獻3] Phys. Rev. B 2010, 81, 165206. [非專利文獻4] Phys. Rev. B 2011, 84, 241301. [非專利文獻5] J. Appl. Phys. 2007, 101, 023107. [非專利文獻6] Nat. Commun. 2020, 11, 5623. [非專利文獻7] ACS Nano 2011, 5, 12, 9958-0065. [Non-patent document 1] Forget, S.; Chénais, S.; Organic Solid-State Lasers; Springer, 2013. [Non-patent document 2] Org. Electron. 2011, 12, 8, 1346-1351. [Non-patent document 3] Phys. Rev. B 2010, 81, 165206. [Non-patent document 4] Phys. Rev. B 2011, 84, 241301. [Non-patent document 5] J. Appl. Phys. 2007, 101, 023107. [Non-patent document 6] Nat. Commun. 2020, 11, 5623. [Non-patent document 7] ACS Nano 2011, 5, 12, 9958-0065.

作為抑制激發三重態狀態的蓄積之方法,提出了利用熱活化型延遲螢光材料的逆系間穿越將三重態激子轉換為單重態激發狀態之方法,但是關於有效率的連續雷射振盪所需的條件及材料係未知的。 因此,為了如下目的進行了苦心探討:藉由利用熱活化型延遲螢光材料,提供能夠實現有效率的連續振盪固態雷射元件及電流激發型雷射半導體元件之條件及材料。 As a method of suppressing the accumulation of excited triplet states, a method of converting triplet excitons into a singlet excited state using reverse intersystem crossing of a thermally activated delayed fluorescent material has been proposed. However, regarding efficient continuous laser oscillation, The required conditions and materials are unknown. Therefore, intensive research has been conducted for the purpose of providing conditions and materials that can realize efficient continuous oscillation solid-state laser elements and current-excitation laser semiconductor elements by using thermally activated delayed fluorescent materials.

藉由理論考察,對利用了熱活化型延遲螢光之有效率的連續雷射振盪所需的條件進行調查,實際上利用數值計算對其妥當性進行探討之結果,第一次發現了藉由使用滿足特定的條件之延遲螢光材料,能夠長期進行雷射振盪。Through theoretical investigation, we investigated the conditions required for efficient continuous laser oscillation using thermally activated delayed fluorescence, and as a result of actually examining its validity using numerical calculations, we discovered for the first time that Using delayed fluorescent materials that meet specific conditions can enable long-term laser oscillation.

本發明係依據這樣的見解而提出者,具體而言,包括以下內容。 [1]一種延遲螢光材料,其滿足下述式(1)。 [數式1] 式(1) σ em :誘導發射截面積 σ TT :激發三重態狀態的吸收截面積 k ISC:從激發單重態狀態到激發三重態狀態的系間穿越速度 k RISC:從激發三重態狀態到激發單重態狀態的逆系間穿越速度 [2]如[1]所述之延遲螢光材料,其中 最低激發單重態狀態與77K的最低激發三重態狀態的能量差ΔE ST為0.3eV以下。 [3]如[1]所述之延遲螢光材料,其中 最低激發單重態狀態與77K的最低激發三重態狀態的能量差ΔE ST為0.2eV以下。 [4]如[1]所述之延遲螢光材料,其中 最低激發單重態狀態與77K的最低激發三重態狀態的能量差ΔE ST為0.1eV以下。 [5]如[1]至[4]之任一項所述之延遲螢光材料,其中 k RISC為1×10 6sec -1以上。 [6]如[1]至[4]之任一項所述之延遲螢光材料,其中 k RISC為1×10 7s -1以上。 [7]如[1]至[6]之任一項所述之延遲螢光材料,其僅由選自包括碳原子、氫原子、氮原子、氧原子、硫原子、硼原子、矽原子、磷原子及氟原子的群組中之原子構成。 [8]如[1]至[7]之任一項所述之延遲螢光材料,其具備具有多重共振效果之含硼多環芳香族骨架。 [9]如[1]至[7]之任一項所述之延遲螢光材料,其具有施體性基和受體性基。 [10]一種雷射振盪材料,其含有[1]至[9]之任一項所述之延遲螢光材料。 [11]一種雷射元件,其使用了[1]至[9]之任一項所述之延遲螢光材料。 [12]如[11]所述之雷射元件,其係電流驅動型。 [13]如[11]所述之雷射元件,其係固態雷射元件。 [14]一種延遲螢光材料之評價方法,其包括如下步驟:測量延遲螢光材料的σ em、σ TT、k ISC、k RISC。 [15]如[14]所述之延遲螢光材料之評價方法,其包括如下步驟:測量延遲螢光材料的σ em、σ TT、k ISC、k RISC,判定是否滿足前述式(1)。 [16]如[15]所述之延遲螢光材料之評價方法,其中 在滿足前述式(1)之情形下,評價為作為雷射振盪材料有用。 [17]如[15]或[16]所述之延遲螢光材料之評價方法,其中 分選滿足前述式(1)之延遲螢光材料。 [18]如[14]至[17]之任一項所述之延遲螢光材料之評價方法,其包括如下步驟:測量延遲螢光材料的σ em、σ TT、k ISC、k RISC,計算下述式(2)所表示之差量Δ。 [數式2] 式(2) [19]如[18]所述之延遲螢光材料之評價方法,其中 對前述差量Δ大者進行高度評價。 [20]如[18]或[19]所述之延遲螢光材料之評價方法,其中 累積延遲螢光材料的化學結構與差量Δ的關係。 [21]如[20]所述之延遲螢光材料之評價方法,其中 利用所累積之前述關係來預測新的延遲螢光材料的化學結構與差量Δ的關係。 [22]如[20]或[21]所述之延遲螢光材料之評價方法,其中 利用所累積之前述關係來預測差量Δ大的延遲螢光材料的化學結構。 [23]如[20]至[22]之任一項所述之延遲螢光材料之評價方法,其中 利用所累積之前述關係來預測滿足前述式(1)之延遲螢光材料的化學結構。 [24]如[21]至[23]之任一項所述之延遲螢光材料之評價方法,其中 成為前述累積對象的延遲螢光材料為具有共同的特定的部分結構之延遲螢光材料群。 [25]如[21]至[23]之任一項所述之延遲螢光材料之評價方法,其中 成為前述累積對象的延遲螢光材料為具有特定的施體性基之延遲螢光材料群。 [26]如[21]至[23]之任一項所述之延遲螢光材料之評價方法,其中 成為前述累積對象的延遲螢光材料為具有特定的受體性基之延遲螢光材料群。 [27]如[21]至[23]之任一項所述之延遲螢光材料之評價方法,其中 成為前述累積對象的延遲螢光材料為具備具有多重共振效果之含硼多環芳香族骨架之延遲螢光材料群。 [28]一種延遲螢光材料之設計方法,其使用了[14]至[27]之任一項所述之評價方法。 [29]一種雷射振盪材料之設計方法,其使用了[14]至[27]之任一項所述之評價方法。 [30]一種雷射元件之設計方法,其使用了[14]至[27]之任一項所述之評價方法。 [31]一種資料庫,其累積了延遲螢光材料的化學結構與σ em、σ TT、k ISC、k RISC的關係。 [32]一種資料庫,其累積了[20]所述之延遲螢光材料的化學結構與差量Δ的關係。 [33]一種資料庫,其累積了滿足前述式(1)之延遲螢光材料的化學結構。 [34]一種延遲螢光材料之評價方法,其使用[31]至[33]之任一項所述之資料庫,實施[14]至[27]之任一項所述之評價方法。 [35]一種延遲螢光材料之設計方法,其利用[31]至[33]之任一項所述之資料庫。 [36]一種雷射振盪材料之設計方法,其利用[31]至[33]之任一項所述之資料庫。 [37]一種雷射元件之設計方法,其利用[31]至[33]之任一項所述之資料庫。 [38]一種程式,其實施[21]至[27]及[34]之任一項所述之評價方法。 [39]一種方法,其係縮短雷射動作達到穩定狀態為止的時間之方法,其包括如下步驟:將具有更高的k RISC且滿足前述式(1)之延遲螢光材料用於雷射元件。 [40]如[39]所述之方法,其中 用於雷射元件之延遲螢光材料的k RISC為1×10 7s -1以上。 [41]如[39]所述之方法,其中 用於雷射元件之延遲螢光材料的k RISC為1×10 8s -1以上。 [42]如[39]至[41]之任一項所述之方法,其中 用於雷射元件之延遲螢光材料進一步滿足下述式(1a)。 [數式3] 式(1a) k ISC:從激發單重態狀態到激發三重態狀態的系間穿越速度 k RISC:從激發三重態狀態到激發單重態狀態的逆系間穿越速度 [43]一種方法,其係雷射動作達到穩定狀態為止的時間短的雷射元件之設計方法,其包括如下步驟:依據延遲螢光材料的k RISC,從包括至少2個滿足前述式(1)之延遲螢光材料的群組中選擇1個延遲螢光材料;及將所選擇之前述延遲螢光材料用於雷射元件。 [44]如[43]所述之方法,其中 在從前述群組中選擇1個延遲螢光材料時,選擇k RISC最高的延遲螢光材料。 [45]一種程式,其實施[39]至[44]之任一項所述之方法。 [發明效果] The present invention is proposed based on such knowledge, and specifically includes the following contents. [1] A delayed fluorescent material satisfying the following formula (1). [Formula 1] Formula (1) σ em : Induced emission cross-sectional area σ TT : Absorption cross-sectional area k of the excited triplet state ISC : Intersystem crossing speed k from the excited singlet state to the excited triplet state RISC : From the excited triplet state to the excited singlet state Inverse intersystem crossing velocity [2] The delayed fluorescent material as described in [1], in which the energy difference ΔE ST between the lowest excited singlet state and the lowest excited triplet state at 77K is less than 0.3 eV. [3] The delayed fluorescent material as described in [1], wherein the energy difference ΔE ST between the lowest excited singlet state and the lowest excited triplet state at 77K is 0.2 eV or less. [4] The delayed fluorescent material as described in [1], wherein the energy difference ΔE ST between the lowest excited singlet state and the lowest excited triplet state at 77K is 0.1 eV or less. [5] The delayed fluorescent material according to any one of [1] to [4], wherein k RISC is 1×10 6 sec -1 or more. [6] The delayed fluorescent material according to any one of [1] to [4], wherein k RISC is 1×10 7 s -1 or more. [7] The delayed fluorescent material according to any one of [1] to [6], which is composed only of carbon atoms, hydrogen atoms, nitrogen atoms, oxygen atoms, sulfur atoms, boron atoms, silicon atoms, It is composed of atoms in the group of phosphorus atoms and fluorine atoms. [8] The delayed fluorescent material according to any one of [1] to [7], which has a boron-containing polycyclic aromatic skeleton with multiple resonance effects. [9] The delayed fluorescent material according to any one of [1] to [7], which has a donor group and an acceptor group. [10] A laser oscillation material containing the delayed fluorescent material according to any one of [1] to [9]. [11] A laser element using the delayed fluorescent material according to any one of [1] to [9]. [12] The laser element as described in [11], which is a current driven type. [13] The laser element as described in [11], which is a solid-state laser element. [14] A method for evaluating delayed fluorescent materials, which includes the following steps: measuring σ em , σ TT , k ISC , and k RISC of the delayed fluorescent material. [15] The evaluation method of delayed fluorescent material as described in [14], which includes the following steps: measuring σ em , σ TT , k ISC , and k RISC of the delayed fluorescent material, and determining whether the aforementioned formula (1) is satisfied. [16] The method for evaluating a delayed fluorescent material as described in [15], wherein the material is evaluated to be useful as a laser oscillation material when the aforementioned formula (1) is satisfied. [17] The method for evaluating delayed fluorescent materials as described in [15] or [16], wherein delayed fluorescent materials satisfying the aforementioned formula (1) are sorted. [18] The evaluation method of delayed fluorescent material as described in any one of [14] to [17], which includes the following steps: measuring σ em , σ TT , k ISC , k RISC of the delayed fluorescent material, and calculating The difference Δ is represented by the following formula (2). [Formula 2] Formula (2) [19] The method for evaluating delayed fluorescent materials according to [18], wherein those with a large difference Δ are highly evaluated. [20] The evaluation method of a delayed fluorescent material as described in [18] or [19], wherein the relationship between the chemical structure of the delayed fluorescent material and the difference Δ is accumulated. [21] The evaluation method of delayed fluorescent material as described in [20], wherein the relationship between the chemical structure of the new delayed fluorescent material and the difference Δ is predicted using the accumulated aforementioned relationship. [22] The evaluation method of a delayed fluorescent material as described in [20] or [21], wherein the chemical structure of the delayed fluorescent material with a large difference Δ is predicted using the accumulated aforementioned relationship. [23] The method for evaluating delayed fluorescent materials according to any one of [20] to [22], wherein the chemical structure of the delayed fluorescent material satisfying the aforementioned formula (1) is predicted using the accumulated aforementioned relationships. [24] The method for evaluating delayed fluorescent materials according to any one of [21] to [23], wherein the delayed fluorescent materials to be accumulated are a group of delayed fluorescent materials having a common specific partial structure. . [25] The method for evaluating delayed fluorescent materials according to any one of [21] to [23], wherein the delayed fluorescent materials to be accumulated are a group of delayed fluorescent materials having a specific donor group . [26] The method for evaluating a delayed fluorescent material according to any one of [21] to [23], wherein the delayed fluorescent material to be accumulated is a group of delayed fluorescent materials having a specific acceptor group. . [27] The method for evaluating a delayed fluorescent material as described in any one of [21] to [23], wherein the delayed fluorescent material to be accumulated is a boron-containing polycyclic aromatic skeleton with multiple resonance effects. Delayed fluorescent material group. [28] A method for designing delayed fluorescent materials using the evaluation method described in any one of [14] to [27]. [29] A method for designing a laser oscillation material using the evaluation method described in any one of [14] to [27]. [30] A method for designing a laser element using the evaluation method described in any one of [14] to [27]. [31] A database that accumulates the relationship between the chemical structure of delayed fluorescent materials and σ em , σ TT , k ISC , and k RISC . [32] A database that accumulates the relationship between the chemical structure of the delayed fluorescent material described in [20] and the difference Δ. [33] A database that accumulates chemical structures of delayed fluorescent materials that satisfy the aforementioned formula (1). [34] An evaluation method for delayed fluorescent materials, which uses the database described in any one of [31] to [33] and implements the evaluation method described in any one of [14] to [27]. [35] A method for designing delayed fluorescent materials using the database described in any one of [31] to [33]. [36] A method for designing laser oscillation materials using the database described in any one of [31] to [33]. [37] A method for designing a laser element using the database described in any one of [31] to [33]. [38] A program that implements the evaluation method described in any one of [21] to [27] and [34]. [39] A method to shorten the time until the laser operation reaches a stable state, which includes the following steps: using a delayed fluorescent material with a higher k RISC and satisfying the aforementioned formula (1) for the laser element . [40] The method as described in [39], wherein the k RISC of the delayed fluorescent material used for the laser element is 1×10 7 s -1 or more. [41] The method as described in [39], wherein the k RISC of the delayed fluorescent material used for the laser element is 1×10 8 s -1 or more. [42] The method according to any one of [39] to [41], wherein the delayed fluorescent material used for the laser element further satisfies the following formula (1a). [Formula 3] Formula (1a) k ISC : The intersystem crossing velocity from the excited singlet state to the excited triplet state k RISC : The inverse intersystem crossing velocity from the excited triplet state to the excited singlet state [43] A method in which the laser action reaches stability A method for designing a laser element with a short time to state, which includes the following steps: according to the k RISC of the delayed fluorescent material, select one from a group including at least two delayed fluorescent materials that satisfy the aforementioned formula (1) Delayed fluorescent material; and using the selected delayed fluorescent material as the laser element. [44] The method described in [43], wherein when selecting one delayed fluorescent material from the aforementioned group, the delayed fluorescent material with the highest k RISC is selected. [45] A program that implements the method described in any one of [39] to [44]. [Effects of the invention]

依據本發明,能夠提供一種雷射振盪之延遲螢光材料。又,還能夠對延遲螢光材料的雷射振盪特性進行評價,或者設計雷射振盪之延遲螢光材料。進而,還能夠縮短雷射動作達到穩定狀態為止的時間。又進而,還能夠提供或者設計雷射元件。According to the present invention, a laser oscillation delayed fluorescent material can be provided. Furthermore, it is also possible to evaluate the laser oscillation characteristics of the delayed fluorescent material, or to design a delayed fluorescent material that emits laser oscillation. Furthermore, the time required for the laser operation to reach a stable state can be shortened. Furthermore, laser components can also be provided or designed.

以下,對本發明的內容詳細地進行說明。以下所記載之構成要件的說明有時依據本發明的代表性實施樣態、具體例而進行,但是本發明並不限定於這樣的實施樣態、具體例。再者,在本說明書中使用「~」表示之數值範圍係指將記載於「~」的前後之數值作為下限值及上限值包括之範圍。Hereinafter, the contents of the present invention will be described in detail. The description of the constituent elements described below may be based on representative embodiments and specific examples of the present invention, but the present invention is not limited to such embodiments and specific examples. In addition, the numerical range expressed using "~" in this specification means a range including the numerical values before and after "~" as the lower limit and the upper limit.

<延遲螢光材料> 本發明的延遲螢光材料的特徵為,滿足下述式(1)。 <Delayed fluorescent material> The delayed fluorescent material of the present invention is characterized by satisfying the following formula (1).

[數式4] 式(1) σ em :誘導發射截面積 σ TT :激發三重態狀態的吸收截面積 k ISC:從激發單重態狀態到激發三重態狀態的系間穿越速度 k RISC:從激發三重態狀態到激發單重態狀態的逆系間穿越速度 [Formula 4] Formula (1) σ em : Induced emission cross-sectional area σ TT : Absorption cross-sectional area k of the excited triplet state ISC : Intersystem crossing speed k from the excited singlet state to the excited triplet state RISC : From the excited triplet state to the excited singlet state Inverse intersystem crossing speed

本發明中的「延遲螢光材料」係指能夠引起從激發三重態狀態到激發單重態狀態的逆系間穿越之有機化合物。在這樣的有機化合物中,在從由逆系間穿越產生之激發單重態狀態轉變為基態時自然發射光子。藉由該自然發射之光與由來自基態的直接激發產生之來自激發單重態狀態的自然發射光相比,通常延遲而被觀測,因此稱為「延遲螢光」。在本發明中,將在藉由螢光壽命測量系統(Hamamatsu Photonics K.K.製造的條紋攝影機系統等)測量發光壽命時,觀測到發光壽命為100ns(奈秒)以上的螢光者稱為延遲螢光材料。又,本發明中的「延遲螢光材料」亦是藉由在以一定以上的激發強度施加了激發能量時產生反轉分布並在該狀態下射入電磁波(光子)而能夠引起誘導發射之有機化合物。亦即,本發明的延遲螢光材料為顯示逆系間穿越和誘導發射這兩者之有機化合物。The "delayed fluorescent material" in the present invention refers to an organic compound that can cause reverse intersystem crossing from an excited triplet state to an excited singlet state. In such organic compounds, photons are naturally emitted upon transition from an excited singlet state resulting from inverse intersystem crossing to the ground state. This naturally emitted light is usually observed with a delay compared with the naturally emitted light from the excited singlet state resulting from direct excitation from the ground state, hence the name "delayed fluorescence". In the present invention, when the luminescence lifetime is measured with a fluorescence lifetime measurement system (such as a fringe camera system manufactured by Hamamatsu Photonics K.K.), a phosphor whose luminescence lifetime is 100 ns (nanoseconds) or more is observed is called delayed fluorescence. Material. In addition, the "delayed fluorescent material" in the present invention is also an organic material that can cause induced emission by generating an inversion distribution when excitation energy is applied at a certain or higher excitation intensity and by incident electromagnetic waves (photons) in this state. compound. That is, the delayed fluorescent material of the present invention is an organic compound that exhibits both reverse intersystem crossing and induced emission.

延遲螢光材料中,最低激發單重態能量與77K的最低激發三重態能量之差ΔE ST係0.3eV以下為較佳,0.25eV以下為更佳,0.2eV以下為更佳,0.15eV以下為更佳,0.1eV以下為進一步較佳,0.07eV以下為更進一步較佳,0.05eV以下為更進一步較佳,0.03eV以下為更進一步較佳,0.01eV以下為特佳。 ΔE ST小的有機化合物藉由熱能的吸收而容易從激發單重態狀態逆系間穿越到激發三重態狀態,因此作為熱活化型延遲螢光材料發揮作用。熱活化型延遲螢光材料吸收裝置所發出之熱而從激發三重態狀態相對容易地逆系間穿越到激發單重態,能夠有效地抑制三重態激子的蓄積。 ΔE ST能夠藉由下述[b4]一欄中所記載之方法來測量。 Among delayed fluorescent materials, the difference ΔE ST between the lowest excited singlet energy and the lowest excited triplet energy at 77K is preferably 0.3eV or less, more preferably 0.25eV or less, 0.2eV or less, even better, and 0.15eV or less. It is good, 0.1 eV or less is still better, 0.07 eV or less is even better, 0.05 eV or less is even better, 0.03 eV or less is even better, and 0.01 eV or less is extremely good. Organic compounds with a small ΔE ST easily transition from the excited singlet state to the excited triplet state through the absorption of thermal energy, and therefore function as a thermally activated delayed fluorescent material. The thermally activated delayed fluorescent material absorbs the heat emitted by the device and relatively easily travels backward from the excited triplet state to the excited singlet state, thereby effectively suppressing the accumulation of triplet excitons. ΔE ST can be measured by the method described in column [b4] below.

並且,本發明的延遲螢光材料的特徵為,特別是滿足式(1)。在式(1)中,誘導發射截面積(σ em)為延遲螢光材料分子的誘導發射的易發生性的尺度,σ em越大者,則係指越容易發生誘導發射。另一方面,激發三重態狀態的吸收截面積(σ TT)為激發三重態狀態吸收的易發生性的尺度。在此,「激發三重態狀態吸收」為三重態激子吸收來自單重態激子的發射光而轉變為高次的激發三重態狀態之現象,成為光損耗的原因。因此,σ TT越大者,則越容易產生由激發三重態狀態吸收引起之光損耗。本發明的延遲螢光材料中,藉由這樣的σ em和σ TT滿足系間穿越及逆系間穿越的各速度常數(k ISC、k RISC)與式(1)的關係,誘導發射速度超過激發三重態狀態吸收的速度,能夠使雷射振盪長期持續。對於σ em、σ TT、k ISC、k RISC之測量方法,將在後面進行敘述。 Furthermore, the delayed fluorescent material of the present invention is characterized by satisfying formula (1) in particular. In the formula (1), the induced emission cross-sectional area (σ em ) is a measure of the likelihood of induced emission of delayed fluorescent material molecules. The larger σ em means the easier it is for induced emission to occur. On the other hand, the absorption cross-sectional area (σ TT ) of the excited triplet state is a measure of the susceptibility of absorption of the excited triplet state. Here, "excited triplet state absorption" is a phenomenon in which triplet excitons absorb emitted light from singlet excitons and transform into a higher-order excited triplet state, which causes light loss. Therefore, the larger σ TT is, the easier it is to produce light loss caused by absorption in the excited triplet state. In the delayed fluorescent material of the present invention, since σ em and σ TT satisfy the relationship between the speed constants (k ISC , k RISC ) of intersystem crossing and inverse intersystem crossing and equation (1), the induced emission speed exceeds The speed of absorption in the excited triplet state enables long-term continuation of laser oscillations. The measurement methods of σ em , σ TT , k ISC , and k RISC will be described later.

在滿足式(1)之延遲螢光材料中,雷射振盪長期持續能夠使用下述式(2)所表示之增益係數(Gain Coefficient)進行說明。 [數式5] 式(2) S:激發單重態狀態 T:激發三重態狀態 σ em :誘導發射截面積 σ TT :激發三重態狀態的吸收截面積 Γ:光限制因子 α cav :傳播損耗 In a delayed fluorescent material satisfying equation (1), long-term continuation of laser oscillation can be explained using the gain coefficient (Gain Coefficient) represented by the following equation (2). [Formula 5] Formula (2) S: Excited singlet state T: Excited triplet state σ em : Induced emission cross-sectional area σ TT : Absorption cross-sectional area of the excited triplet state Γ: Light confinement factor α cav : Propagation loss

增益係數包括Γσ emS所表示之光放大項、α CAV所表示之傳播損耗項及Γσ TTT所表示之激發三重態狀態吸收項這3個項。在增益係數為0以上的情形下,係指光放大機構工作而進行雷射振盪。另一方面,在增益係數為負的情形下,損失製程(傳播損耗和激發三重態狀態吸收)優於光放大項,係指不會引起雷射振盪。並且,在即使藉由施加超過雷射振盪臨界值之激發能量,增益係數暫時成為0以上而產生雷射振盪,亦隨著時間經過而三重態激子蓄積之情形下,激發三重態狀態吸收項(Γσ TTT)佔支配地位,最終增益係數變得小於0,雷射振盪停止。因此,藉由模擬增益係數的時間變化而求出增益係數為0以上的時間,能夠對雷射振盪持續時間進行評價。 在此,在不引起逆系間穿越之習知之有機雷射材料中,由來自激發單重態狀態的系間穿越產生之三重態激子原樣蓄積而引起激發三重態狀態吸收,因此存在雷射振盪時間短的問題。 對此,在延遲螢光材料中,引起從激發三重態狀態到激發單重態狀態的逆系間穿越,因此由系間穿越產生之三重態激子不會高密度地蓄積,而轉換為單重態激子。並且,尤其若延遲螢光材料滿足式(1),則藉由以穩定狀態的密度比S/T=k RISC/R ISC轉換之式(1)為σ emS>σ TTT,放大項(Γσ emS)比激發三重態狀態吸收項(Γσ TTT)佔優勢。因此,滿足式(1)之延遲螢光材料即使時間經過,增益係數亦維持在0以上,能夠使雷射振盪長期持續。 The gain coefficient includes three terms: the light amplification term represented by Γσ em S, the propagation loss term represented by α CAV , and the excited triplet state absorption term represented by Γσ TT T. When the gain coefficient is above 0, it means that the optical amplification mechanism operates and laser oscillation occurs. On the other hand, when the gain coefficient is negative, the loss process (propagation loss and excited triplet state absorption) is better than the optical amplification term, which means that it will not cause laser oscillation. Furthermore, even if the gain coefficient temporarily becomes 0 or more and laser oscillation is generated by applying excitation energy exceeding the laser oscillation critical value, triplet excitons are accumulated as time passes, and the triplet state absorption term is excited (Γσ TT T) dominates, the final gain coefficient becomes less than 0, and the laser oscillation stops. Therefore, by simulating the time change of the gain coefficient and finding the time when the gain coefficient is equal to or greater than 0, the laser oscillation duration can be evaluated. Here, in conventional organic laser materials that do not cause inverse intersystem crossing, triplet excitons generated from intersystem crossing from the excited singlet state are accumulated as they are to cause absorption in the excited triplet state, so laser oscillation exists Short time problem. In this regard, in the delayed fluorescent material, inverse intersystem crossing from the excited triplet state to the excited singlet state occurs, so the triplet excitons generated by the intersystem crossing are not accumulated at high density and are converted to the singlet state. exciton. Moreover, especially if the delayed fluorescent material satisfies equation (1), by converting equation (1) with the density ratio S/T=k RISC /R ISC in the steady state to σ em S>σ TT T, the amplification term ( Γσ em S) dominates the excited triplet state absorption term (Γσ TT T). Therefore, the delayed fluorescent material that satisfies equation (1) maintains a gain coefficient above 0 even if time passes, and can sustain laser oscillation for a long period of time.

在此,式(1)的各參數依據延遲螢光材料的化學結構而取各式各樣的值,但是σ em通常為10 -16級左右(cm 2)。關於σ TT,在大多數情形下為10 -17級左右(cm 2),在極小的例子中為10 -19級左右(cm 2)。但是,本發明的滿足式(1)之延遲螢光材料未限定性地解釋為σ em及σ TT為該等級者。延遲螢光材料的k RISC係1×10 6s -1以上為較佳,1×10 7s -1以上為更佳,1×10 8s -1以上為進一步較佳。延遲螢光材料的k ISC係1×10 10s -1以下為較佳,1×10 9s -1以下為更佳,1×10 8s -1以下為進一步較佳。 Here, each parameter of Formula (1) takes various values depending on the chemical structure of the delayed fluorescent material, but σ em is usually about 10 -16 levels (cm 2 ). Regarding σ TT , in most cases it is about 10 -17 levels (cm 2 ), and in very rare cases it is about 10 -19 levels (cm 2 ). However, the delayed fluorescent material of the present invention that satisfies the formula (1) is not limitedly interpreted as having σ em and σ TT of this level. The k RISC system of the delayed fluorescent material is preferably 1×10 6 s -1 or more, more preferably 1×10 7 s -1 or more, and further preferably 1×10 8 s -1 or more. The k ISC of the delayed fluorescent material is preferably 1×10 10 s -1 or less, more preferably 1×10 9 s -1 or less, and further preferably 1×10 8 s -1 or less.

以下,藉由使用了雷射元件模型之模擬,對本發明的滿足式(1)之延遲螢光材料顯示效果之機制進行說明。 雷射元件模型為使用了將4,6-雙((E)-4-(二苯基胺基)苯乙烯)-2,2-二氟-2H-1λ 3,3,2λ 4-二氧雜硼烷-5-羧酸乙酯(TPA-BCm)作為延遲螢光材料模型(客體)且將4,4’-雙(N-咔唑基)-1,1’-聯苯(CBP)作為主體之主體-客體系增益媒體之DFB雷射元件模型。在此,TPA-BCm為具備延遲螢光特性和雷射特性這兩者之化合物。以下,將該雷射元件模型稱為「CBP-TADF元件模型」。 Hereinafter, through simulation using a laser element model, the mechanism of the delayed fluorescent material display effect that satisfies equation (1) of the present invention will be explained. The laser element model uses 4,6-bis((E)-4-(diphenylamino)styrene)-2,2-difluoro-2H-1λ 3 ,3,2λ 4 -dioxy Borane-5-carboxylic acid ethyl ester (TPA-BCm) was used as a delayed fluorescent material model (guest) and 4,4'-bis(N-carbazolyl)-1,1'-biphenyl (CBP) DFB laser element model as the gain medium of the subject-object system. Here, TPA-BCm is a compound having both delayed fluorescence properties and laser properties. Hereinafter, this laser element model is called "CBP-TADF element model".

將CBP及TPA-BCm的化學結構、其能階圖及能量轉移製程示於圖1中。 在圖1中,S 0表示基態單重態能階,S 1表示最低激發單重態能階,T 1表示最低激發三重態能階,T n表示高次的激發三重態能階。CBP(T 1:2.6eV)具有比TPA-BCm(T 1:1.6eV)高的最低激發三重態能階,因此顯示將激發三重態能量限制在客體分子內之三重態限制作用。又,k S ET表示從主體到客體分子的激發單重態能量轉移的速度常數,k T ET表示從主體到客體分子的激發三重態能量轉移的速度常數,k r,CBP表示CBP的輻射衰減常數、k r,TB表示TPA-BCm的輻射衰減常數,k T nr,CBP表示CBP的激發三重態狀態的非輻射衰減常數,k S nr,TB表示TPA-BCm的激發單重態狀態的非輻射衰減常數,k T nr,TB表示TPA-BCm的激發三重態狀態的非輻射衰減常數,k ISC,CBP表示CBP的系間穿越的速度常數,k ISC,TB表示TPA-BCm的系間穿越的速度常數,k RISC表示TPA-BCm的逆系間穿越的速度常數。 The chemical structures of CBP and TPA-BCm, their energy level diagrams and energy transfer processes are shown in Figure 1. In Figure 1, S 0 represents the ground state singlet energy level, S 1 represents the lowest excited singlet energy level, T 1 represents the lowest excited triplet energy level, and T n represents the higher-order excited triplet energy level. CBP (T 1 :2.6eV) has a higher lowest excited triplet energy level than TPA-BCm (T 1 :1.6eV), and therefore exhibits a triplet confinement effect that confines the excited triplet energy within the guest molecule. In addition, k S ET represents the rate constant of the excited singlet state energy transfer from the host to the guest molecule, k T ET represents the rate constant of the excited triplet state energy transfer from the host to the guest molecule, and k r,CBP represents the radiative attenuation constant of CBP. , k r,TB represents the radiative attenuation constant of TPA-BCm, k T nr,CBP represents the non-radiative attenuation constant of the excited triplet state of CBP, k S nr,TB represents the non-radiative attenuation of the excited singlet state of TPA-BCm Constant, k T nr,TB represents the non-radiative attenuation constant of the excited triplet state of TPA-BCm, k ISC,CBP represents the intersystem crossing speed constant of CBP, k ISC,TB represents the intersystem crossing speed of TPA-BCm The constant, k RISC represents the speed constant of the inverse intersystem crossing of TPA-BCm.

將用於模擬之CBP-TADF元件模型的參數值示於表1中。對於參數之測量方法和數值解析方法,將在後面進行敘述。The parameter values of the CBP-TADF component model used for simulation are shown in Table 1. The measurement method and numerical analysis method of parameters will be described later.

[表1] [Table 1]

表1中,k st表示單重態-三重態消滅(STA)的速度常數,Γ表示限制係數,n eff表示折射率,β表示光與腔模態的比率,α cav表示傳播損耗。對於其他參數的定義,能夠參閱關於式(1)及圖1的說明。 另外,在模擬中,作為延遲螢光材料的參數,在除了k RISC以外的參數中使用TPA-BCm的值,但是k RISC的值進行了各式各樣變更。雷射振盪臨界值、雷射振盪持續時間及各種效率的計算,使用數式處理系統軟體(Mathematica:Wolfram Research公司製造)來進行。 又,以下所示之模擬妥當係依據藉由相同的模擬求出之4’4-雙[( N-咔唑)苯乙烯]聯苯(BSB-Cz)的雷射振盪臨界值(55Wcm −2)與已報告之雷射振盪臨界值(70Wcm −2)等同來確認。 In Table 1, k st represents the rate constant of singlet-triplet elimination (STA), Γ represents the confinement coefficient, n eff represents the refractive index, β represents the ratio of light to cavity mode, and α cav represents the propagation loss. For the definition of other parameters, please refer to the description of equation (1) and Figure 1. In addition, in the simulation, the value of TPA-BCm was used as a parameter of the delayed fluorescent material except k RISC , but the value of k RISC was variously changed. Calculations of the laser oscillation critical value, laser oscillation duration, and various efficiencies were performed using numerical processing system software (Mathematica: manufactured by Wolfram Research Corporation). In addition, the simulation shown below is appropriate based on the laser oscillation critical value (55Wcm −2 ) of 4'4-bis[( N -carbazole)styrene]biphenyl (BSB-Cz) obtained through the same simulation. ) is confirmed to be equal to the reported laser oscillation critical value (70Wcm −2 ).

首先,藉由計算由下述式(3)定義之誘導發射效率(Φ Stim)來模擬了由於三重態激子的蓄積而使雷射振盪停止之製程。 First, the process of stopping laser oscillation due to the accumulation of triplet excitons was simulated by calculating the induced emission efficiency (Φ Stim ) defined by the following equation (3).

[數式6] 式(3) Φ Stim:誘導發射效率 k Stim:誘導發射速度常數 c:光速 P:光子密度 [Formula 6] Formula (3) Φ Stim : induced emission efficiency k Stim : induced emission velocity constant c: light speed P: photon density

將模擬了系間穿越效率(Φ ISC)和誘導發射效率(Φ Stim)的時間變化之結果示於圖2中。在圖2中,圖2(a)表示將激發光強度設定為5kWcm −2而求出之各效率的時間變化,圖2(b)表示將激發光強度設定為10kWcm −2而求出之各效率的時間變化。 The results of simulating the time changes of the intersystem crossing efficiency (Φ ISC ) and the induced emission efficiency (Φ Stim ) are shown in Figure 2. In Figure 2, Figure 2(a) shows the time change of each efficiency obtained by setting the excitation light intensity to 5kWcm −2 , and Figure 2(b) shows the time changes of each efficiency obtained by setting the excitation light intensity to 10kWcm −2 . Temporal changes in efficiency.

如圖2所示,雷射振盪開始之後,Φ Stim立即達到最大值,與此同時,Φ ISC大幅減小。此時,單重態激子被急速消耗,因此Φ Stim剛達到最大值之後,雷射振盪瞬間被抑制而使Φ Stim減小,Φ ISC急劇增加。其後,單重態激子密度和光子密度急速恢復,再度引起雷射振盪。這樣的Φ Stim和Φ ISC的時間變化顯示被稱為鬆弛振盪之振電結構,且係由雷射振盪剛開始之後的單重態密度的急劇增加和減小引起的。在該體系中,系間穿越速度無法追隨振盪速度,因此Φ ISC在鬆弛振盪中的瞬間上升不會對激發三重態生成過程造成強烈的影響。並且,Φ Stim一邊振盪一邊接近1個值而使鬆弛振盪收斂。隨後,形成準穩定狀態而使Φ Stim減小。在此,系間穿越過程與誘導發射競爭,因此Φ Stim減小,藉此系間穿越過程進行而使三重態激子逐漸蓄積。藉此,Φ Stim逐漸減小而使雷射振盪在數十奈秒內停止。亦即,依據該模擬得知,雷射振盪衰減而停止係因為,形成準穩定狀態之後系間穿越進行而使三重態激子蓄積。 As shown in Figure 2, after the laser oscillation starts, Φ Stim reaches the maximum value immediately, and at the same time, Φ ISC decreases significantly. At this time, singlet excitons are rapidly consumed, so just after Φ Stim reaches the maximum value, the laser oscillation is instantly suppressed, causing Φ Stim to decrease and Φ ISC to increase sharply. Afterwards, the singlet exciton density and photon density recovered rapidly, causing laser oscillation again. Such temporal changes in Φ Stim and Φ ISC show a vibratory structure called relaxation oscillation, and are caused by a sharp increase and decrease in singlet density just after the start of laser oscillation. In this system, the intersystem crossing velocity cannot follow the oscillation velocity, so the instantaneous rise of Φ ISC in the relaxation oscillation will not have a strong impact on the excited triplet generation process. Furthermore, Φ Stim approaches 1 value while oscillating, and the relaxation oscillation converges. Subsequently, a quasi-stable state is formed and Φ Stim decreases. Here, the intersystem crossing process competes with induced emission, so Φ Stim decreases, whereby the intersystem crossing process proceeds and triplet excitons are gradually accumulated. As a result, Φ Stim gradually decreases and the laser oscillation stops within tens of nanoseconds. That is, it is known from this simulation that the laser oscillation attenuates and stops because triplet excitons accumulate after intersystem crossing proceeds after a quasi-stable state is formed.

接著,由該三重態蓄積引起之雷射振盪的衰減藉由使用滿足式(1)之延遲螢光材料而被抑制,藉由使用了CBP-TADF元件模型之模擬來驗證雷射振盪持續時間變長。 將模擬了CBP-TADF元件模型雷射特性之結果示於圖3中。在圖3中,圖3(a)為針對將延遲螢光材料的k RISC設定為TPA-BCm的1.0×10 4s -1(實測值)之情形和變更為1.0×10 7s -1及1.0×10 8s -1之情形,相對於激發光強度標繪了發光強度之圖。在各圖中,在標繪的配適線的斜度改變之方面,激發光強度相當於雷射振盪臨界值。圖3(b)為將延遲螢光材料的k RISC設定為1.0×10 8s -1,將激發光強度設定為15kWcm -2,模擬增益係數的時間變化而獲得之曲線圖,圖3(c)為將延遲螢光材料的k RISC設定為1.0×10 4s -1、1.0×10 7s -1及1.0×10 8s -1,將激發光強度設定為5.0kWcm -2、4.0kWcm -2及3.0kWcm -2,模擬增益係數的時間變化而獲得之曲線圖。在圖3(b)、圖3(c)中,增益係數為0以上的期間相當於雷射振盪持續時間。又,在此處的模擬中,在除了k RISC以外的參數中使用了表1所示之值。將各條件下的σ em/k ISC與σ TT/k RISC的大小關係示於表2中。 Next, the attenuation of the laser oscillation caused by the accumulation of the triplet state was suppressed by using a delayed fluorescent material that satisfies the equation (1), and simulations using the CBP-TADF element model were used to verify the change in the duration of the laser oscillation. long. The results of simulating the laser characteristics of the CBP-TADF element model are shown in Figure 3. In Figure 3, Figure 3(a) shows the case where the k RISC of the delayed fluorescent material is set to 1.0×10 4 s -1 (actual measurement value) of TPA-BCm and is changed to 1.0×10 7 s -1 and For the case of 1.0×10 8 s -1 , the luminescence intensity is plotted against the excitation light intensity. In each figure, the excitation light intensity corresponds to the laser oscillation critical value in terms of the change in the slope of the plotted fit line. Figure 3(b) is a graph obtained by simulating the time change of the gain coefficient by setting the k RISC of the delayed fluorescent material to 1.0×10 8 s -1 and the excitation light intensity to 15kWcm -2 . Figure 3(c) ) To set the k RISC of the delayed fluorescent material to 1.0×10 4 s -1 , 1.0×10 7 s -1 and 1.0×10 8 s -1 , the excitation light intensity is set to 5.0kWcm -2 and 4.0kWcm - 2 and 3.0kWcm -2 , the curve obtained by simulating the time change of the gain coefficient. In Figures 3(b) and 3(c), the period in which the gain coefficient is equal to or greater than 0 corresponds to the laser oscillation duration. In addition, in the simulation here, the values shown in Table 1 were used for parameters other than k RISC . The relationship between σ em /k ISC and σ TT /k RISC under each condition is shown in Table 2.

[表2] K RISC(s -1 σ TT/K RISC σ em/k ISC與σ TT/k RISC的關係 1.0×10 4 3.9×10 -21 2.6×10 -24<3.9×10 -21 1.0×10 7 3.9×10 -24 2.6×10 -24<3.9×10 -24 1.0×10 8 3.9×10 -25 2.6×10 -24>3.9×10 -25 [Table 2] K RISC (s -1 ) σTT/ KRISC The relationship between σ em /k ISC and σ TT /k RISC 1.0×10 4 3.9× 10-21 2.6×10 -24 <3.9×10 -21 1.0×10 7 3.9× 10-24 2.6×10 -24 <3.9×10 -24 1.0×10 8 3.9× 10-25 2.6×10 -24 >3.9×10 -25

如圖3(a)所示,關於雷射振盪臨界值,在k RISC=1.0×10 4s -1的情形和k RISC=1.0×10 7s -1的情形下均為3.3kWcm -2,在k RISC=1.0×10 8s -1的情形下亦為2.7kWcm -2,與該等雷射振盪臨界值相比為稍小的程度。關於雷射振盪持續時間,在k RISC=1.0×10 4s -1的情形和k RISC=1.0×10 7s -1的情形下,在5kWcm -2的激發光強度下均為與約20ns相同程度。對此,若設為k RISC=1.0×10 8s -1而使σ TT/k RISC比σ em/k ISC小(σ em/k ISC>σ TT/k RISC),則與大小關係相反的情形不同,在5kWcm -2的激發光強度下增益係數超過0之後,接著鬆弛振盪和其收斂、準穩定狀態,增益係數為0的狀態持續而出現連續波(CW)振盪。 依據以上的模擬結果確認到,藉由將滿足σ em/k ISC>σ TT/k RISCσ TT/k RISC之延遲螢光材料用於雷射振盪材料,準穩定狀態下的三重態蓄積被抑制而激發三重態狀態吸收被抑制,從而能夠實現雷射振盪長期持續之雷射元件。 As shown in Figure 3(a), the critical value of laser oscillation is 3.3kWcm -2 in both the case of k RISC =1.0×10 4 s -1 and the case of k RISC =1.0×10 7 s -1 . In the case of k RISC =1.0×10 8 s -1, it is also 2.7kWcm -2 , which is slightly smaller than the critical value of laser oscillation. Regarding the laser oscillation duration, it is the same as about 20 ns at the excitation light intensity of 5kWcm -2 in both the case of k RISC =1.0×10 4 s -1 and the case of k RISC =1.0×10 7 s -1 degree. In this regard, if k RISC =1.0×10 8 s -1 and σ TT /k RISC is smaller than σ em /k ISCem /k ISC > σ TT /k RISC ), then the magnitude relationship is opposite The situation is different. After the gain coefficient exceeds 0 at an excitation light intensity of 5 kWcm -2 , relaxation oscillation and its convergence, quasi-stable state follow, and the state where the gain coefficient is 0 continues and continuous wave (CW) oscillation occurs. Based on the above simulation results, it was confirmed that by using a delayed fluorescent material that satisfies σ em /k ISCTT /k RISC σ TT /k RISC as a laser oscillation material, triplet accumulation in a quasi-stable state is suppressed. The absorption of the excited triplet state is suppressed, thereby enabling a laser element that can sustain laser oscillation for a long time.

(參數之測量方法及計算方法) 以下,對在上述模擬中使用之參數之測量方法及數值解析方法進行說明。 [a1] 速度常數 k S ET k r,CBP k ISC,CBP k r,TB k RISC 依據摻雜了6質量%的TPA-BCm之CBP膜及CBP單一膜的光致發光量子產率(PLQY)和發光壽命求出了速度常數。其結果,CBP的輻射衰減速度常數(k r,CBP)為2.4×10 8s −1,CBP的系間穿越速度常數(k ISC,CBP)為3.7×10 8s −1,從主體(CBP)到客體分子(TPA-BCm)的單重態能量轉移速度常數(k S ET)為1.8×10 9s −1,TPA-BCm的輻射衰減速度常數(k r,TB)為2.3×10 8s −1。又,推斷為,CBP的單重態激子的非輻射衰減速度常數(k S nr,CBP)小到能夠忽略,TPA-BCm的逆系間穿越速度常數(k RISC)為1×10 4s −1。k RISC的數值妥當係藉由將使用k RISC和其他參數計算出之外部量子效率的理論值與已報告之有機電致發光元件的實驗資料進行比較來確認(Nat. Photonics 2018, 12, 98-104.)。 (Measurement method and calculation method of parameters) The following describes the measurement method and numerical analysis method of parameters used in the above simulation. [a1] Rate constant ( k S ET , k r,CBP , k ISC,CBP , k r,TB , k RISC ) based on photoluminescence of CBP film doped with 6 mass% TPA-BCm and CBP single film The rate constant was found for quantum yield (PLQY) and luminescence lifetime. As a result, the radiation attenuation speed constant of CBP (k r,CBP ) is 2.4×10 8 s −1 , the intersystem crossing speed constant of CBP (k ISC,CBP ) is 3.7×10 8 s −1 , and the radiation from the main body (CBP ) to the guest molecule (TPA-BCm), the singlet energy transfer rate constant (k S ET ) is 1.8×10 9 s −1 , and the radiation decay rate constant (k r,TB ) of TPA-BCm is 2.3×10 8 s −1 . Furthermore, it is inferred that the nonradiative decay rate constant (k S nr,CBP ) of singlet excitons of CBP is small enough to be ignored, and the inverse intersystem crossing rate constant (k RISC ) of TPA-BCm is 1×10 4 s − 1 . The numerical adequacy of k RISC was confirmed by comparing the theoretical values of external quantum efficiency calculated using k RISC and other parameters with reported experimental data of organic electroluminescent devices (Nat. Photonics 2018, 12, 98- 104.).

[a2]CBP 分子及 TPA-BCm 分子的密度關於CBP分子及TPA-BCm分子在膜中的密度,將膜的密度假設為1.1gcm -3,分別計算為1.3×10 21cm -3、2.7×10 19cm -3 [a2] Density of CBP molecules and TPA-BCm molecules Regarding the density of CBP molecules and TPA-BCm molecules in the membrane, assuming that the density of the membrane is 1.1gcm -3 , the calculations are respectively 1.3×10 21 cm -3 and 2.7× 10 19 cm -3 .

[a3]TPA-BCm 的誘導發射截面積( σ em )及激發三重態狀態的吸收截面積( σ TT TPA-BCm的σ em藉由計算下述式(4)來求出。 [a3] Induced emission cross-sectional area ( σ em ) of TPA-BCm and absorption cross-sectional area ( σ TT ) of the excited triplet state. The σ em of TPA-BCm was calculated by calculating the following equation (4).

[數式7] 式(4) F D (λ):螢光光譜 λ:波長 n(λ):λ處的折射率 Φ F:6質量%TPA-BCm摻雜CBP膜的光致發光量子產率 [Formula 7] Formula (4) F D (λ): Fluorescence spectrum λ: Wavelength n (λ): Refractive index at λ Φ F : Photoluminescence quantum yield of 6 mass% TPA-BCm doped CBP film

關於TPA−BCm的σ TT,依據Nat. Mater. 2014, 13, 938-946.中所記載之方法,由藉由三重態增感劑增強之瞬態吸收推斷。 The σ TT of TPA−BCm was inferred from the transient absorption enhanced by the triplet sensitizer according to the method described in Nat. Mater. 2014, 13, 938-946.

圖4中示出TPA-BCm的σ em及σ TT的波長依賴性。如圖4所示,σ em的最大值及σ TT的最大值分別為2.6×10 −16cm 2、3.9×10 −17cm 2Figure 4 shows the wavelength dependence of σ em and σ TT of TPA-BCm. As shown in Figure 4, the maximum values of σ em and σ TT are 2.6×10 −16 cm 2 and 3.9×10 −17 cm 2 respectively.

[a4] 單重態 - 三重態消滅的速度常數( k st 單重態-三重態消滅(STA)係由從激發單重態狀態到激發三重態狀態的Foerster能量轉移引起的。因此,關於STA的速度常數(k st),使用將σ TT代入到下述式(6)中而計算出之R 6 F,計算下述式(5)來求出。在此,將3.9×10 −17cm 2代入到σ TT中,將k st計算為2.1×10 −10cm 3s -1。關於式(5)及(6)的導出方法,能夠參閱Jpn. J. Appl. Phys. 2015, 54, 071601.及Phys. Rev. Lett. 2007, 98, 197402。 [a4] Rate constant of singlet - triplet annihilation ( k st ) Singlet-triplet annihilation (STA) is caused by the Foerster energy transfer from the excited singlet state to the excited triplet state. Therefore, the speed constant (k st ) of the STA is determined by calculating the following equation (5) using R 6 F calculated by substituting σ TT into the following equation (6). Here, substituting 3.9×10 −17 cm 2 into σ TT , k st is calculated as 2.1×10 −10 cm 3 s −1 . For the derivation methods of equations (5) and (6), please refer to Jpn. J. Appl. Phys. 2015, 54, 071601. and Phys. Rev. Lett. 2007, 98, 197402.

[數式8] 式(5) 式(6) τ s:TPA-BCm的螢光壽命 N A :亞佛加厥常數 k 2 :被認為係2/3之指向性因子(方向係數) [Formula 8] Formula (5) Formula (6) τ s : Fluorescence lifetime of TPA-BCm N A : Avogajer constant k 2 : Directivity factor (direction coefficient) considered to be 2/3

[a5] 其他速度常數 k S nr,TB k T nr,TB k ISC k T ET 關於TPA-BCm的單重態激子的非輻射衰減速度常數(k S nr,TB)、三重態激子的非輻射衰減速度常數( k T nr,TB)及系間穿越速度常數(k ISC)、從主體到客體分子的三重態能量轉移速度常數(k T ET),藉由配適在長脈衝激發下測量之發光的瞬態光致發光(PL)曲線來求出。 圖5中示出對於6重量%TPA-BCm摻雜CBP膜以6W/cm 2、31W/cm 2及57W/cm 2的各激發光強度測量之瞬態PL曲線(實線)和其配適曲線(虛線)。對於激發光,使用了波長為355nm、脈衝間隔為40μs的長脈衝雷射。 如圖5所示,觀測到三重態激子逐漸蓄積而增強之由單重態-三重態消滅引起之發光衰減。 在依據Φ F和τ s估算之k ISC,TB+k S nr,TB=2×10 8s −1的拘束條件下,使用下述式(7)~(10)和P=k r,TBS TB(假設為非空腔結構)對該等實測資料進行了分析。其結果,藉由使用k ISC,TB=1.0×10 8s −1、k S nr,TB=1.0×10 8s −1、k T nr,TB=1.0×10 5s −1及k T ET=5×10 4s −1,可獲得與實測資料一致之模擬結果,將在該模擬中使用之值作為各速度常數。 [a5] Other rate constants ( k S nr,TB , k T nr,TB , k ISC , k T ET ) Regarding the nonradiative decay rate constant (k S nr,TB ) of singlet excitons of TPA-BCm, triplet The non-radiative decay rate constant of state excitons ( k T nr,TB ), the intersystem crossing rate constant (k ISC ), and the triplet energy transfer rate constant from the host to the guest molecule (k T ET ) are calculated by fitting It is obtained by measuring the transient photoluminescence (PL) curve of luminescence under long pulse excitation. Figure 5 shows the transient PL curve (solid line) measured at each excitation light intensity of 6 W/cm 2 , 31 W/cm 2 and 57 W/cm 2 for a 6 wt% TPA-BCm doped CBP film and its adaptation. Curve (dashed line). For the excitation light, a long pulse laser with a wavelength of 355 nm and a pulse interval of 40 μs was used. As shown in Figure 5, the gradual accumulation of triplet excitons and the enhanced luminescence decay caused by singlet-triplet elimination were observed. Under the constraint of k ISC,TB +k S nr,TB =2×10 8 s −1 estimated based on Φ F and τ s , the following formulas (7) to (10) and P=k r,TB are used S TB (assuming a non-cavity structure) analyzed these measured data. As a result, by using k ISC,TB =1.0×10 8 s −1 , k S nr,TB =1.0×10 8 s −1 , k T nr,TB =1.0×10 5 s −1 and k T ET =5×10 4 s −1 , the simulation results consistent with the measured data can be obtained, and the values used in the simulation are used as each speed constant.

[a6] 傳播損耗( α cav 關於傳播損耗(α cav),藉由使用由[a1]至[a5]求出之參數值,模擬相對於2次DFB雷射(光柵週期Λ 2=450nm)的激發光強度之輸出強度,計算為80cm -1。將α cav、Γ及b分別設定為80cm -1、0.7、1×10 -4並藉由模擬求出之振盪臨界值為3.2kWcm -2,與在氮氣雷射的脈衝光激發下實測之振盪臨界值(I th)的3.5kWcm −2大致一致。 [a6] Propagation loss ( α cav ) Regarding the propagation loss (α cav ), by using the parameter values calculated from [a1] to [a5], the simulation is performed for a 2-pass DFB laser (grating period Λ 2 =450nm) The output intensity of the excitation light intensity is calculated as 80cm -1 . α cav , Γ and b are respectively set to 80cm -1 , 0.7, 1×10 -4 and the oscillation critical value calculated through simulation is 3.2kWcm -2 , which is consistent with the measured oscillation under pulse light excitation of nitrogen laser. The critical value (I th ) of 3.5kWcm −2 is roughly consistent.

[a7] 用於模擬之激子密度及光子密度的各速率方程式CBP的單重態激子密度(S CBP)及三重態激子密度(T CBP)、TPA-BCm的單重態激子密度(S TB)及三重態激子密度(T TB)的各速率方程式、以及光子密度(P)的速率方程式由下述式(7)~(11)給出。 [a7] Each rate equation for exciton density and photon density used in the simulation: singlet exciton density ( SCBP ) and triplet exciton density ( TCBP ) of CBP, singlet exciton density (S) of TPA-BCm TB ) and triplet exciton density (T TB ), and the rate equation for photon density (P) are given by the following equations (7) to (11).

[數式9] 式(7) 式(8) 式(9) 式(10) 式(11) [Formula 9] Formula (7) Formula (8) Formula (9) Formula (10) Formula (11)

G表示激發速度,R CBP表示CBP的基態飽和概率,R TB表示TPA-BCm的基態飽和概率。關於其他參數的定義,能夠參閱關於式(1)、(3)及表1的說明。對於激子生成速度,假設為與G和基態的飽和概率(R=[N molecule-(S+T)]/N molecule)成正比。又,在該速率方程式的模型中,輸出強度與光子密度成正比。因此,振盪臨界值由相對於G標繪之P的非線性增加來確定。 G represents the excitation speed, R CBP represents the ground state saturation probability of CBP, and R TB represents the ground state saturation probability of TPA-BCm. For the definitions of other parameters, please refer to the descriptions of formulas (1), (3) and Table 1. For the exciton generation rate, it is assumed to be proportional to the saturation probability of G and the ground state (R=[N molecule - (S+T)]/N molecule ). Again, in this model of the rate equation, the output intensity is proportional to the photon density. Therefore, the oscillation threshold is determined by the nonlinear increase in P plotted against G.

(測量中所使用之膜及雷射元件之製作方法、以及其特性之測量方法) 以下示出用於測量參數之6質量%TPA-BCm摻雜CBP膜及CBP單一膜之製作方法、測量雷射特性之雷射元件之製作方法及各種特性之測量方法。 (Methods for making films and laser elements used in measurement, and methods for measuring their characteristics) The following shows the production method of 6 mass% TPA-BCm doped CBP film and CBP single film for measuring parameters, the production method of laser element for measuring laser characteristics, and the measurement method of various characteristics.

[b1] 6 質量 %TPA-BCm 摻雜 CBP 膜及 CBP 單一膜的製作藉由旋塗法將溶解有TPA-BCm和CBP之氯仿溶液塗佈於石英基板上,並使其乾燥,藉此以100nm的膜厚形成了6質量%TPA-BCm摻雜CBP膜。 又,使用僅溶解有CBP之氯仿溶液來代替TPA-BCm和CBP的氯仿溶液,除此以外,以相同的方式,以100nm的膜厚形成了CBP單一膜。 [b1] Preparation of 6 mass % TPA-BCm- doped CBP film and CBP single film. A chloroform solution containing TPA-BCm and CBP was coated on a quartz substrate by spin coating and dried. A 6 mass% TPA-BCm doped CBP film was formed with a film thickness of 100 nm. In addition, a CBP single film was formed with a film thickness of 100 nm in the same manner except that a chloroform solution in which only CBP was dissolved was used instead of the chloroform solution of TPA-BCm and CBP.

[b2] 6 質量 %TPA-BCm 摻雜 CBP 膜用於增益媒體之雷射元件的製作準備了形成有2次DFB圖案之玻璃基板。關於2次DFB圖案,以滿足下述布拉格方程式之光柵週期使用電子束微影術(JBX-5500SC:JEOL Ltd.製造)和蝕刻法來形成。 布拉格方程式:mλ Bragg=2 neffΛ m在此,m為繞射次數,λ Bragg為布拉格波長,Λ為繞射光柵的週期。 藉由旋塗法在該玻璃基板上塗佈溶解有TPA-BCm和CBP之氯仿溶液之後,使其乾燥,藉此形成了膜厚為200nm的6質量%TPA-BCm摻雜CBP膜。接著,用藍寶石玻璃覆蓋TPA-BCm摻雜CBP膜,用CYTOP(AGC Inc.製造,註冊商標)進行密封,藉此製作了雷射元件。 [b2] The 6 mass % TPA-BCm doped CBP film was used for the production of a laser element as a gain medium. A glass substrate with a secondary DFB pattern was prepared. The secondary DFB pattern is formed using electron beam lithography (JBX-5500SC: manufactured by JEOL Ltd.) and etching so that the grating period satisfies the Bragg equation below. Bragg equation: mλ Bragg =2 neff Λ m Here, m is the number of diffraction, λ Bragg is the Bragg wavelength, and Λ is the period of the diffraction grating. A chloroform solution in which TPA-BCm and CBP were dissolved was applied to the glass substrate by a spin coating method and then dried to form a 6 mass % TPA-BCm doped CBP film with a film thickness of 200 nm. Next, the TPA-BCm-doped CBP film was covered with sapphire glass and sealed with CYTOP (manufactured by AGC Inc., registered trademark), thereby producing a laser element.

[b3] 吸收特性、發光特性及雷射振盪特性之測量方法對於6質量%TPA-BCm摻雜CBP膜及CBP單一膜,測量了紫外可見吸收光譜、發射光譜、光致發光量子產率及發光壽命。在測量中使用了紫外可見分光光度計(LAMDA950:PerkinElmer Co.,Ltd.製造)、分光螢光光度計(FP-8600:JASCO Corporation製造)、絕對PL量子產率測量裝置(Quantaurus-QY:Hamamatsu Photonics K.K.製造)、螢光壽命測量裝置(Quantaurus-tau:Hamamatsu Photonics K.K.製造)。又,對於6質量%TPA-BCm摻雜CBP膜,將355nmCW雷射用於激發光源而測量了瞬態發光特性。 在雷射元件的振盪特性的測量中使用了氮氣雷射(KEN-2020:USHO,波長=337nm,脈衝寬度=0.8ns,照射面積=6.8×10 -3cm 2)和光子多通道分析儀(PMA50:Hamamatsu Photonics K.K.)。關於瞬態吸收測量,藉由使用了時間分辨吸收光譜解析系統(Hamamatsu Photonics K.K.製造)之泵浦探測法,使用激發光源(YAG雷射,波長=355nm)及探測光源(疝氣燈)來進行。 [b3] Measurement method of absorption characteristics, luminescence characteristics and laser oscillation characteristics For 6 mass% TPA-BCm doped CBP film and CBP single film, the ultraviolet-visible absorption spectrum, emission spectrum, photoluminescence quantum yield and luminescence were measured lifespan. For the measurement, a UV-visible spectrophotometer (LAMDA950: manufactured by PerkinElmer Co., Ltd.), a spectrofluorophotometer (FP-8600: manufactured by JASCO Corporation), and an absolute PL quantum yield measuring device (Quantaurus-QY: Hamamatsu Photonics KK), fluorescence lifetime measurement device (Quantaurus-tau: Hamamatsu Photonics KK). In addition, for the 6 mass % TPA-BCm doped CBP film, the transient luminescence characteristics were measured using a 355 nm CW laser as the excitation light source. A nitrogen laser (KEN-2020: USHO, wavelength = 337nm, pulse width = 0.8ns, irradiation area = 6.8×10 -3 cm 2 ) and a photon multi-channel analyzer ( PMA50: Hamamatsu Photonics KK). The transient absorption measurement was performed by the pump-probe method using a time-resolved absorption spectrum analysis system (manufactured by Hamamatsu Photonics KK), using an excitation light source (YAG laser, wavelength = 355 nm) and a detection light source (hernia lamp).

[b4]ΔE ST 之測量方法關於各材料的最低激發單重態能量(E S1)與最低激發三重態能量(E T1)之差(ΔE ST),藉由以下方法計算最低激發單重態能量(E S1)和最低激發三重態能量,並藉由ΔE ST=E S1-E T1來求出。 (1)最低激發單重態能量E S1將測量對象化合物和mCBP[3,3’-二(9H-咔唑-9-基)]進行共蒸鍍,以使測量對象化合物成為濃度6重量%,藉此在Si基板上製作厚度為100nm的試樣。在常溫(300K)下測量該試樣的螢光光譜。藉由對從激發光剛射入後到射入後經100奈秒為止的發光進行累計,獲得將縱軸設為發光強度、將橫軸設為波長的螢光光譜。螢光光譜中,將縱軸設為發光,將橫軸設為波長。相對於該發射光譜的短波側的凸起繪製切線,求出該切線與橫軸的交點的波長值λedge[nm]。將藉由以下所示之換算公式將該波長值換算為能量值之值設為E S1。 換算公式:E S1[eV]=1239.85/λedge 在發射光譜的測量中,對於將氮氣雷射(Lasertechnik Berlin公司製造,MNL200)用於激發光源之檢測器,能夠使用條紋攝影機(Hamamatsu Photonics K.K.製造,C4334)等。 (2)最低激發三重態能量E T1將與最低激發單重態能量E S1相同的試樣冷卻至77[K],將激發光照射到磷光測量用試樣上,使用條紋攝影機來測量磷光強度。藉由對從激發光射入後經1毫秒到射入後經10毫秒的發光進行累計,獲得將縱軸設為發光強度、將橫軸設為波長的磷光光譜。相對於該磷光光譜的短波長側的凸起繪製切線,求出該切線與橫軸的交點的波長值λedge[nm]。將藉由以下所示之換算公式將該波長值換算為能量值之值設為E T1。 換算公式:E T1[eV]=1239.85/λedge 相對於磷光光譜的短波長側的凸起之切線如下繪製。在光譜曲線上從磷光光譜的短波長側移動到光譜的極大值中的最短波長側的極大值時,考慮朝向長波長側在曲線上的各點處的切線。該切線隨著曲線凸起(亦即,隨著縱軸增加),斜度增加。將在該斜度的值取極大值之點處繪製之切線作為相對於該磷光光譜的短波長側的凸起之切線。 另外,關於具有光譜的最大峰強度的10%以下的峰強度之極大點,將在不包含在上述最短波長側的極大值中而最靠近最短波長側的極大值的、斜度的值取極大值之點處繪製之切線作為相對於該磷光光譜的短波長側的凸起之切線。 [b4] Measurement method of ΔE ST Regarding the difference (ΔE ST ) between the lowest excited singlet energy (E S1 ) and the lowest excited triplet energy ( ET1 ) of each material, the lowest excited singlet energy (E S1 ) and the lowest excited triplet energy, and are found by ΔE ST =E S1 -E T1 . (1) Minimum excited singlet energy E S1 Co-evaporate the measurement target compound and mCBP [3,3'-bis(9H-carbazol-9-yl)] so that the measurement target compound has a concentration of 6% by weight, In this way, a sample with a thickness of 100 nm was produced on the Si substrate. The fluorescence spectrum of the sample was measured at normal temperature (300K). By integrating the luminescence from just after the excitation light is incident to 100 nanoseconds after the incident, a fluorescence spectrum is obtained in which the vertical axis represents the luminous intensity and the horizontal axis represents the wavelength. In the fluorescence spectrum, the vertical axis represents emission and the horizontal axis represents wavelength. A tangent line is drawn with respect to the protrusion on the short-wave side of the emission spectrum, and the wavelength value λedge [nm] at the intersection of the tangent line and the horizontal axis is found. Let the value that converts the wavelength value into an energy value using the conversion formula shown below be E S1 . Conversion formula: E S1 [eV] = 1239.85/λedge In the measurement of the emission spectrum, a streak camera (Hamamatsu Photonics KK, manufactured by Hamamatsu Photonics KK) can be used as a detector using a nitrogen laser (MNL200 manufactured by Lasertechnik Berlin) as the excitation light source. C4334) etc. (2) Minimum excited triplet energy E T1 Cool the sample that is the same as the minimum excited singlet energy E S1 to 77 [K], irradiate the excitation light onto the sample for phosphorescence measurement, and use a fringe camera to measure the phosphorescence intensity. By integrating the luminescence from 1 millisecond after the incident of the excitation light to 10 milliseconds after the incident, a phosphorescence spectrum in which the vertical axis represents the emission intensity and the horizontal axis represents the wavelength is obtained. A tangent line is drawn with respect to the protrusion on the short wavelength side of the phosphorescence spectrum, and the wavelength value λedge [nm] at the intersection of the tangent line and the horizontal axis is obtained. Let the value that converts the wavelength value into an energy value using the conversion formula shown below be E T1 . Conversion formula: E T1 [eV]=1239.85/λedge The tangent line to the protrusion on the short wavelength side of the phosphorescence spectrum is drawn as follows. When moving on the spectrum curve from the short wavelength side of the phosphorescence spectrum to the maximum value on the shortest wavelength side among the maximum values of the spectrum, tangent lines at each point on the curve toward the long wavelength side are considered. The tangent increases in slope as the curve bulges (that is, as the vertical axis increases). A tangent line drawn at a point where the value of the slope takes a maximum value is defined as a tangent line to the protrusion on the short wavelength side of the phosphorescence spectrum. In addition, regarding the maximum point of the peak intensity that is 10% or less of the maximum peak intensity of the spectrum, the slope value closest to the maximum value on the shortest wavelength side that is not included in the maximum value on the shortest wavelength side is taken as the maximum. The tangent line drawn at the point of value serves as the tangent line to the bump with respect to the short wavelength side of the phosphorescence spectrum.

(延遲螢光材料的化學結構) 接著,對延遲螢光材料的化學結構進行說明。 本發明的延遲螢光材料只要係滿足式(1)者,則其結構並無特別限制。 在本發明的一樣態中,滿足式(1)之延遲螢光材料為僅由選自包括碳原子、氫原子、氮原子、氧原子、硫原子、硼原子、矽原子、磷原子及氟原子的群組中之原子構成之化合物。在本發明的較佳的一樣態中,滿足式(1)之延遲螢光材料為僅由選自包括碳原子、氫原子、氮原子、氧原子、硫原子、硼原子及氟原子的群組中之原子構成之化合物,在本發明的更佳的一樣態中,滿足式(1)之延遲螢光材料為由選自包括碳原子、氫原子、氮原子、氧原子、硼原子及氟原子的群組中之原子構成之化合物。 (Chemical structure of delayed fluorescent material) Next, the chemical structure of the delayed fluorescent material will be described. The structure of the delayed fluorescent material of the present invention is not particularly limited as long as it satisfies formula (1). In one aspect of the present invention, the delayed fluorescent material satisfying formula (1) is selected from the group consisting of carbon atoms, hydrogen atoms, nitrogen atoms, oxygen atoms, sulfur atoms, boron atoms, silicon atoms, phosphorus atoms and fluorine atoms. A compound composed of atoms in a group. In a preferred aspect of the present invention, the delayed fluorescent material that satisfies formula (1) is selected from the group consisting of carbon atoms, hydrogen atoms, nitrogen atoms, oxygen atoms, sulfur atoms, boron atoms and fluorine atoms. In a more preferred aspect of the present invention, the delayed fluorescent material satisfying formula (1) is selected from the group consisting of carbon atoms, hydrogen atoms, nitrogen atoms, oxygen atoms, boron atoms and fluorine atoms. A compound composed of atoms in a group.

滿足式(1)之延遲螢光材料例如能夠從具備具有多重共振效果之含硼多環芳香族骨架之化合物中進行選擇。作為這樣的化合物,可舉出具有下述通式(I)所表示之骨架結構之化合物。The delayed fluorescent material satisfying Formula (1) can be selected from compounds having a boron-containing polycyclic aromatic skeleton having a multiple resonance effect, for example. Examples of such compounds include compounds having a skeleton structure represented by the following general formula (I).

[化學式1] (通式(I)中,A環、B環及C環分別獨立地為芳環或雜芳環,該等環中的至少1個氫原子可以被取代,Y 1為B、X 1及X 2分別獨立地為O、N-R、S或Se,前述N-R的R為可以被取代之芳基、可以被取代之雜芳基或烷基,並且,前述N-R的R可以藉由連結基或單鍵與前述A環、B環及/或C環鍵結,並且,通式(I)所表示之化合物或結構中的至少1個氫原子可以被鹵素原子或氘原子取代。) 本發明的延遲螢光材料可以為具有複數個通式(I)所表示之單元結構之多聚物。 [Chemical formula 1] (In the general formula (I), A ring, B ring and C ring are independently aromatic rings or heteroaromatic rings. At least one hydrogen atom in these rings can be substituted. Y 1 is B, X 1 and X 2 are independently O, NR, S or Se. The R of the aforementioned NR is an optionally substituted aryl group, an optionally substituted heteroaryl group or an alkyl group, and the R of the aforementioned NR can be connected through a connecting group or a single bond. Bonded to the aforementioned A ring, B ring and/or C ring, and at least one hydrogen atom in the compound or structure represented by the general formula (I) may be replaced by a halogen atom or a deuterium atom.) Delayed fluorescence of the present invention The optical material may be a polymer having a plurality of unit structures represented by general formula (I).

通式(I)所表示之化合物較佳為下述通式(II)所表示之化合物或具有複數個下述通式(II)所表示之單元結構之多聚物。The compound represented by the general formula (I) is preferably a compound represented by the following general formula (II) or a polymer having a plurality of unit structures represented by the following general formula (II).

[化學式2] [Chemical formula 2]

通式(I)中的A環、B環及C環分別獨立地為芳環或雜芳環,該等環中的至少1個氫原子可以被取代基取代。該取代基係取代或未取代的芳基、取代或未取代的雜芳基、取代或未取代的二芳基胺基、取代或未取代的二雜芳基胺基、取代或未取代的芳基雜芳基胺基(具有芳基和雜芳基之胺基)、取代或未取代的烷基、取代或未取代的烷氧基、或者取代或未取代的芳氧基為較佳。作為該等基團具有取代基時的取代基,可舉出芳基、雜芳基或烷基。又,上述芳環或雜芳環具有與由Y 1、X 1及X 2構成之通式(I)中央的稠合雙環結構(以下,亦將該結構稱為「D結構」)共價鍵之5員環或6員環為較佳。 The A ring, B ring and C ring in the general formula (I) are each independently an aromatic ring or a heteroaromatic ring, and at least one hydrogen atom in these rings may be substituted by a substituent. The substituent is a substituted or unsubstituted aryl group, a substituted or unsubstituted heteroaryl group, a substituted or unsubstituted diarylamine group, a substituted or unsubstituted diarylamine group, a substituted or unsubstituted aryl group. Preferred are heteroarylamino groups (amine groups having an aryl group and a heteroaryl group), substituted or unsubstituted alkyl groups, substituted or unsubstituted alkoxy groups, or substituted or unsubstituted aryloxy groups. When these groups have a substituent, examples of the substituent include an aryl group, a heteroaryl group, or an alkyl group. Moreover, the above-mentioned aromatic ring or heteroaromatic ring has a covalent bond with the fused bicyclic structure (hereinafter, this structure is also referred to as "D structure") in the center of the general formula (I) consisting of Y 1 , X 1 and X 2 A 5-member ring or a 6-member ring is better.

在此,「稠合雙環結構(D結構)」係指,在通式(I)的中央所示之、包括Y 1、X 1及X 2而構成之2個飽和烴環稠合之結構。又,「與稠合雙環結構共價鍵之6員環」例如係指如上述通式(II)所示般與前述D結構稠合之a環(苯環(6員環))。又,「(作為A環之)芳環或雜芳環具有該6員環」係指,僅由該6員環形成A環、或者以包括該6員環之方式其他環等進一步與該6員環稠合而形成A環。換言之,在此所說的「具有6員環之(作為A環之)芳環或雜芳環」係指構成A環的全部或一部分之6員環與前述D結構稠合。對於「B環(b環)」、「C環(c環)」及「5員環」,亦適用相同的說明。 Here, the "fused bicyclic structure (D structure)" refers to a structure in which two saturated hydrocarbon rings including Y 1 , X 1 and X 2 shown in the center of the general formula (I) are fused. Moreover, "the 6-membered ring covalently bonded to the fused bicyclic structure" refers to, for example, the a ring (benzene ring (6-membered ring)) fused to the aforementioned D structure as shown in the aforementioned general formula (II). Furthermore, "the aromatic ring or heteroaromatic ring (as the A ring) has the 6-membered ring" means that the A-ring is formed only from the 6-membered ring, or other rings are further combined with the 6-membered ring by including the 6-membered ring. The member rings fuse to form ring A. In other words, "an aromatic ring or heteroaromatic ring having a 6-membered ring (as the A ring)" referred to here means that the 6-membered ring constituting all or part of the A ring is fused with the aforementioned D structure. The same instructions apply to "B ring (b ring)", "C ring (c ring)" and "5-member ring".

通式(I)中的A環(或B環、C環)對應於通式(II)中的a環和其取代基R 1~R 3(或者b環和其取代基R 4~R 7、c環和其取代基R 8~R 11)。亦即,通式(II)對應於選擇「具有6員環之A~C環」作為通式(I)的A~C環者。在該意義上,由小寫字母的a~c表示了通式(II)的各環。 Ring A (or ring B or ring C) in the general formula (I) corresponds to ring a and its substituents R 1 to R 3 (or ring b and its substituents R 4 to R 7 ) in the general formula (II) , c ring and its substituents R 8 ~ R 11 ). That is, the general formula (II) corresponds to the case where "A to C rings having 6-membered rings" are selected as the A to C rings of the general formula (I). In this sense, each ring of the general formula (II) is represented by lowercase letters a to c.

在通式(II)中,a環、b環及c環的取代基R 1~R 11中的鄰接之基團彼此可以鍵結而與a環、b環或c環一起形成芳環或雜芳環,所形成之環中的至少1個氫原子可以被芳基、雜芳基、二芳基胺基、二雜芳基胺基、芳基雜芳基胺基、烷基、烷氧基或芳氧基取代,該等中的至少1個氫原子可以被芳基、雜芳基或烷基取代。因此,通式(II)所表示之多環芳香族化合物依據a環、b環及c環中的取代基相互的鍵結形態,如下述式(2-1)及式(2-2)所示般,構成化合物之環結構改變。各式中的A’環、B’環及C’環分別對應於通式(I)中的A環、B環及C環。 In the general formula (II), the adjacent groups among the substituents R 1 to R 11 of the a ring, b ring and c ring can be bonded to each other to form an aromatic ring or a heterocyclic ring together with the a ring, b ring or c ring. Aromatic ring, at least one hydrogen atom in the formed ring can be aryl, heteroaryl, diarylamine, diarylamine, arylheteroarylamine, alkyl, alkoxy or aryloxy substituted, at least 1 hydrogen atom in these may be substituted by aryl, heteroaryl or alkyl. Therefore, the polycyclic aromatic compound represented by the general formula (II) is as shown in the following formula (2-1) and formula (2-2) based on the mutual bonding form of the substituents in the a ring, b ring and c ring. In general, the ring structure of the compound changes. The A' ring, B' ring and C' ring in each formula correspond to the A ring, B ring and C ring in the general formula (I) respectively.

[化學式3] [Chemical formula 3]

對於上述式(2-1)及式(2-2)中的A’環、B’環及C’環,若在通式(II)中進行說明,則表示取代基R 1~R 11中的鄰接之基團彼此鍵結而分別與a環、b環及c環一起形成之芳環或雜芳環(亦可稱為其他環結構與a環、b環或c環稠合而成之稠環)。另外,雖然未在式中顯示,但是亦有a環、b環及c環全部改變為A’環、B’環及C’環之化合物。又,如由上述式(2-1)及式(2-2)可知般,例如,b環的R 8和c環的R 7、b環的R 11和a環的R 1、c環的R 4和a環的R 3等不屬於「鄰接之基團彼此」,該等不會鍵結。亦即,「鄰接之基團」係指在同一個環上鄰接之基團。 When the A' ring, B' ring and C' ring in the above formula (2-1) and formula (2-2) are described in the general formula (II), they represent the substituents R 1 to R 11 The adjacent groups are bonded to each other to form an aromatic ring or a heteroaromatic ring together with the a ring, b ring and c ring respectively (it can also be called other ring structures formed by fusion with a ring, b ring or c ring) fused ring). In addition, although not shown in the formula, there are also compounds in which all a ring, b ring and c ring are changed to A' ring, B' ring and C' ring. Moreover, as can be seen from the above formulas (2-1) and formula (2-2), for example, R 8 of the b ring and R 7 of the c ring, R 11 of the b ring, R 1 of the a ring, and c ring R 4 and R 3 of the a ring do not belong to "adjacent groups" and they will not bond. That is, "adjacent groups" refers to groups that are adjacent on the same ring.

上述式(2-1)、式(2-2)所表示之化合物例如對應於WO2015/102118號公報中所記載之包括式(1-2)~(1-17)所表示之結構作為環骨架之化合物。亦即,例如為具有苯環、吲哚環、吡咯環、苯并呋喃環或苯并噻吩環與作為a環(或b環或c環)之苯環稠合而形成之A’環(或B’環或C’環)之化合物,所形成之稠環A’(或稠環B’或稠環C’)分別為萘環、咔唑環、吲哚環、二苯并呋喃環或二苯并噻吩環。The compounds represented by the above formulas (2-1) and formula (2-2) correspond to, for example, structures represented by formulas (1-2) to (1-17) described in WO2015/102118 as ring skeletons. of compounds. That is, for example, it is an A' ring (or B' ring or C' ring) compound, the fused ring A' (or fused ring B' or fused ring C') formed is naphthalene ring, carbazole ring, indole ring, dibenzofuran ring or dibenzofuran ring. Benzothiophene ring.

通式(I)中的X 1及X 2分別獨立地為O、N-R、S或Se,前述N-R的R為可以被取代之芳基、可以被取代之雜芳基或烷基,前述N-R的R可以藉由連結基或單鍵與前述B環及/或C環鍵結,作為連結基,-O-、-S-或-C(-R) 2-為較佳。另外,前述「-C(-R) 2-」的R為氫原子或烷基。該說明在通式(II)中的X 1及X 2中亦相同。 X 1 and R can be bonded to the aforementioned B ring and/or C ring through a linking group or a single bond. As the linking group, -O-, -S- or -C(-R) 2 - is preferred. In addition, R in the aforementioned "-C(-R) 2 -" is a hydrogen atom or an alkyl group. This description is also the same for X 1 and X 2 in the general formula (II).

在此,通式(I)中的「N-R的R藉由連結基或單鍵與前述A環、B環及/或C環鍵結」的規定對應於通式(II)中的「N-R的R藉由-O-、-S-、-C(-R) 2-或單鍵與前述a環、b環及/或c環鍵結」的規定。該規定能夠由下述式(2-3-1)所表示之、具有X 1、X 2被導入到稠環B’及稠環C’之環結構之化合物表達。亦即,例如為具有相對於通式(II)中的作為b環(或c環)之苯環導入X 1(或X 2)而稠合其他環來形成之B’環(或C’環)之化合物。該化合物例如對應於WO2015/102118號公報中所記載之包括式(1-451)~(1-462)所表示之結構作為環骨架之化合物及包括式(1-1401)~(1-1460)所表示之結構作為環骨架之化合物,所形成之稠環B’(或稠環C’)例如為啡㗁𠯤環、啡噻𠯤環或吖啶環。 又,上述規定亦能夠由下述式(2-3-2)、式(2-3-3)所表示之、具有X 1及/或X 2被導入到稠環A’之環結構之化合物表達。亦即,例如為具有相對於通式(II)中的作為a環之苯環導入X 1(及/或X 2)而稠合其他環來形成之A’環之化合物。該化合物例如對應於WO2015/102118號公報中所記載之包括式(1-471)~(1-479)所表示之結構作為環骨架之化合物,所形成之稠環A’例如為啡㗁𠯤環、啡噻𠯤環或吖啶環。 Here, the requirement that "R of NR is bonded to the aforementioned A ring, B ring and/or C ring through a linking group or a single bond" in the general formula (I) corresponds to "the R of NR" in the general formula (II) "R is bonded to the aforementioned a ring, b ring and/or c ring through -O-, -S-, -C(-R) 2 - or a single bond." This requirement can be expressed by a compound represented by the following formula (2-3-1) and having a ring structure in which X 1 and X 2 are introduced into fused ring B' and fused ring C'. That is, for example, it has a B' ring (or C ' ring) formed by introducing X 1 (or ) compound. This compound corresponds to, for example, a compound including a structure represented by formulas (1-451) to (1-462) as a ring skeleton and a compound including formulas (1-1401) to (1-1460) described in WO2015/102118 The structure represented is a compound with a ring skeleton, and the fused ring B' (or fused ring C') formed is, for example, a phenyl ring, a phenyl ring or an acridine ring. In addition, the above-mentioned regulations can also be represented by the following formula (2-3-2) and the compound having a ring structure in which X 1 and/or X 2 is introduced into the fused ring A', represented by the formula (2-3-3). Express. That is, for example, it is a compound having an A′ ring formed by introducing X 1 (and/or X 2 ) to the benzene ring as the a ring in the general formula (II) and condensing other rings. This compound corresponds to a compound described in WO2015/102118, for example, which includes a structure represented by formulas (1-471) to (1-479) as a ring skeleton, and the fused ring A' formed is, for example, a phenyl ring. , thiophene 𠯤 ring or acridine ring.

[化學式4] [Chemical formula 4]

作為通式(I)的A環、B環及C環亦即「芳環」,例如可舉出碳數6~30的芳環,碳數6~16的芳環為較佳,碳數6~12的芳環為更佳,碳數6~10的芳環為特佳。另外,該「芳環」對應於通式(II)中所規定之「R 1~R 11中的鄰接之基團彼此鍵結而與a環、b環或c環一起形成之芳環」,並且,a環(或b環、c環)已由碳數為6的苯環構成,因此5員環與其稠合之稠環的總碳數9成為下限碳數。 Examples of the A ring, B ring, and C ring of the general formula (I), that is, the "aromatic ring" include an aromatic ring having 6 to 30 carbon atoms, preferably an aromatic ring having 6 to 16 carbon atoms, and an aromatic ring having 6 carbon atoms. An aromatic ring having ∼12 carbon atoms is more preferred, and an aromatic ring having 6 to 10 carbon atoms is particularly preferred. In addition, the "aromatic ring" corresponds to "an aromatic ring formed by the adjacent groups among R 1 to R 11 bonded to each other together with the a ring, b ring or c ring" specified in the general formula (II), In addition, the a ring (or b ring, c ring) is already composed of a benzene ring with a carbon number of 6, so the total carbon number of the 5-membered ring and the fused ring to which it is fused, 9, becomes the lower limit of carbon number.

作為具體的「芳環」,可舉出作為單環系之苯環、作為雙環系之聯苯環、作為稠合雙環系之萘環、作為三環系之三聯苯環(間三聯苯環、鄰三聯苯環、對三聯苯環)、作為稠合三環系之、苊環、茀環、萉環、菲環、作為稠合四環系之聯三伸苯環、芘環、稠四苯環、作為稠合五環系之苝環、稠五苯環等。Specific "aromatic rings" include a benzene ring as a monocyclic system, a biphenyl ring as a bicyclic system, a naphthalene ring as a fused bicyclic system, and a terphenyl ring as a tricyclic system (m-terphenyl ring, o-terphenyl ring, p-terphenyl ring), acenaphthylene ring, fluorine ring, pyrene ring, phenanthrene ring as a fused tricyclic system, biterphenyl ring, pyrene ring, fused tetraphenyl ring as a fused tetracyclic system Ring, perylene ring as a fused pentacyclic ring system, fused pentaphenyl ring, etc.

作為通式(I)的A環、B環及C環亦即「雜芳環」,例如可舉出碳數2~30的雜芳環,碳數2~25的雜芳環為較佳,碳數2~20的雜芳環為更佳,碳數2~15的雜芳環為進一步較佳,碳數2~10的雜芳環為特佳。又,作為「雜芳環」,例如可舉出作為環構成原子除了碳以外還含有1至5個選自氧、硫及氮中之雜原子之雜環等。另外,該「雜芳環」對應於通式(II)中所規定之「R 1~R 11中的鄰接之基團彼此鍵結而與a環、b環或c環一起形成之雜芳環」,並且,a環(或b環、c環)已由碳數為6的苯環構成,因此5員環與其稠合之稠環的總碳數6成為下限碳數。 Examples of the A ring, B ring and C ring of the general formula (I), that is, the "heteroaromatic ring", include a heteroaromatic ring having 2 to 30 carbon atoms, and a heteroaromatic ring having 2 to 25 carbon atoms is preferred. A heteroaromatic ring having 2 to 20 carbon atoms is more preferred, a heteroaromatic ring having 2 to 15 carbon atoms is still more preferred, and a heteroaromatic ring having 2 to 10 carbon atoms is particularly preferred. Examples of the "heteroaromatic ring" include a heterocyclic ring containing 1 to 5 heteroatoms selected from oxygen, sulfur, and nitrogen in addition to carbon as ring constituent atoms. In addition, the "heteroaromatic ring" corresponds to a heteroaromatic ring in which adjacent groups among R 1 to R 11 are bonded to each other to form a heteroaromatic ring together with the a ring, b ring or c ring specified in the general formula (II). ”, and the a ring (or b ring, c ring) is already composed of a benzene ring with a carbon number of 6, so the total carbon number of the 5-membered ring and the fused ring to which it is fused, 6, becomes the lower limit of carbon number.

作為具體的「雜芳環」,例如可舉出吡咯環、㗁唑環、異㗁唑環、噻唑環、異噻唑環、咪唑環、㗁二唑環、噻二唑環、三唑環、四唑環、吡唑環、吡啶環、嘧啶環、嗒𠯤環、吡𠯤環、三𠯤環、吲哚環、異吲哚環、1H-吲唑環、苯并咪唑環、苯并㗁唑環、苯并噻唑環、1H-苯并三唑環、喹啉環、異喹啉環、㖕啉環、喹唑啉環、喹㗁啉環、呔𠯤環、㖠啶環、嘌呤環、喋啶環、咔唑環、吖啶環、啡㗁噻(phenoxathiine)環、啡㗁𠯤環、啡噻𠯤環、啡𠯤環、吲𠯤環、呋喃環、苯并呋喃環、異苯并呋喃環、二苯并呋喃環、噻吩環、苯并噻吩環、二苯并噻吩環、呋呫環、噻嗯環等。Specific "heteroaromatic rings" include, for example, a pyrrole ring, an ethazole ring, an isothiazole ring, a thiazole ring, an isothiazole ring, an imidazole ring, an ethadiazole ring, a thiadiazole ring, a triazole ring, and a tetrazole ring. Azole ring, pyrazole ring, pyridine ring, pyrimidine ring, pyridine ring, pyridine ring, tri-pyridine ring, indole ring, isoindole ring, 1H-indazole ring, benzimidazole ring, benzothiazole ring , benzothiazole ring, 1H-benzotriazole ring, quinoline ring, isoquinoline ring, quinoline ring, quinazoline ring, quinoline ring, pyridine ring, purine ring, pyridine ring, carbazole ring, acridine ring, phenoxathiine ring, phenoxathiine ring, phenoxathiine ring, phenoxathiine ring, phenoxathiine ring, indino ring, furan ring, benzofuran ring, isobenzofuran ring, Dibenzofuran ring, thiophene ring, benzothiophene ring, dibenzothiophene ring, furoxan ring, thien ring, etc.

上述「芳環」或「雜芳環」中的至少1個氫原子可以被作為第1取代基之、取代或未取代的「芳基」、取代或未取代的「雜芳基」、取代或未取代的「二芳基胺基」、取代或未取代的「二雜芳基胺基」、取代或未取代的「芳基雜芳基胺基」、取代或未取代的「烷基」、取代或未取代的「烷氧基」、或者取代或未取代的「芳氧基」取代,但是可舉出作為該第1取代基的「芳基」、「雜芳基」、「二芳基胺基」的芳基、「二雜芳基胺基」的雜芳基、「芳基雜芳基胺基」的芳基和雜芳基及作為「芳氧基」的芳基在上面敘述之「芳環」或「雜芳環」的一價的基團。At least one hydrogen atom in the above-mentioned "aromatic ring" or "heteroaryl ring" may be substituted or unsubstituted "aryl", substituted or unsubstituted "heteroaryl", substituted or unsubstituted "aryl" as the first substituent. Unsubstituted "diarylamine", substituted or unsubstituted "diarylamine", substituted or unsubstituted "arylheteroarylamine", substituted or unsubstituted "alkyl", Substituted with a substituted or unsubstituted "alkoxy group" or a substituted or unsubstituted "aryloxy group", examples of the first substituent include "aryl", "heteroaryl" and "diaryl" The aryl group of "amine group", the heteroaryl group of "diheteroarylamino group", the aryl group and heteroaryl group of "arylheteroarylamine group" and the aryl group as "aryloxy group" are as described above. A monovalent group of "aromatic ring" or "heteroaromatic ring".

又,作為第1取代基的「烷基」,可以為直鏈及支鏈中的任一種,例如可舉出碳數1~24的直鏈烷基或碳數3~24的支鏈烷基。碳數1~18的烷基(碳數3~18的支鏈烷基)為較佳,碳數1~12的烷基(碳數3~12的支鏈烷基)為更佳,碳數1~6的烷基(碳數3~6的支鏈烷基)為進一步較佳,碳數1~4的烷基(碳數3~4的支鏈烷基)為特佳。In addition, the "alkyl group" as the first substituent may be either linear or branched, and examples thereof include a linear alkyl group having 1 to 24 carbon atoms or a branched alkyl group having 3 to 24 carbon atoms. . An alkyl group having 1 to 18 carbon atoms (branched alkyl group having 3 to 18 carbon atoms) is preferred, and an alkyl group having 1 to 12 carbon atoms (branched alkyl group having 3 to 12 carbon atoms) is more preferred. An alkyl group having 1 to 6 carbon atoms (branched chain alkyl group having 3 to 6 carbon atoms) is more preferred, and an alkyl group having 1 to 4 carbon atoms (branched chain alkyl group having 3 to 4 carbon atoms) is particularly preferred.

作為具體的烷基,可舉出甲基、乙基、正丙基、異丙基、正丁基、異丁基、二級丁基、三級丁基、正戊基、異戊基、新戊基、三級戊基、正己基、1-甲基戊基、4-甲基-2-戊基、3,3-二甲基丁基、2-乙基丁基、正庚基、1-甲基己基、正辛基、三級辛基、1-甲基庚基、2-乙基己基、2-丙基戊基、正壬基、2,2-二甲基庚基、2,6-二甲基-4-庚基、3,5,5-三甲基己基、正癸基、正十一基、1-甲基癸基、正十二基、正十三基、1-己基庚基、正十四基、正十五基、正十六基、正十七基、正十八基、正二十基等。Specific alkyl groups include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, secondary butyl, tertiary butyl, n-pentyl, isopentyl, neo Pentyl, tertiary pentyl, n-hexyl, 1-methylpentyl, 4-methyl-2-pentyl, 3,3-dimethylbutyl, 2-ethylbutyl, n-heptyl, 1 -Methylhexyl, n-octyl, tertiary octyl, 1-methylheptyl, 2-ethylhexyl, 2-propylpentyl, n-nonyl, 2,2-dimethylheptyl, 2, 6-Dimethyl-4-heptyl, 3,5,5-trimethylhexyl, n-decyl, n-undecyl, 1-methyldecyl, n-dodecyl, n-tridecyl, 1- Hexyl heptyl, positive fourteen bases, positive fifteen bases, positive sixteen bases, positive seventeen bases, positive eighteen bases, positive twenty bases, etc.

又,作為第1取代基的「烷氧基」,例如可舉出碳數1~24的直鏈烷氧基或碳數3~24的支鏈烷氧基。碳數1~18的烷氧基(碳數3~18的支鏈烷氧基)為較佳,碳數1~12的烷氧基(碳數3~12的支鏈烷氧基)為更佳,碳數1~6的烷氧基(碳數3~6的支鏈烷氧基)為進一步較佳,碳數1~4的烷氧基(碳數3~4的支鏈烷氧基)為特佳。Examples of the "alkoxy group" as the first substituent include a linear alkoxy group having 1 to 24 carbon atoms or a branched alkoxy group having 3 to 24 carbon atoms. An alkoxy group having 1 to 18 carbon atoms (branched chain alkoxy group having 3 to 18 carbon atoms) is preferred, and an alkoxy group having 1 to 12 carbon atoms (branched chain alkoxy group having 3 to 12 carbon atoms) is more preferred. Preferably, an alkoxy group having 1 to 6 carbon atoms (branched chain alkoxy group having 3 to 6 carbon atoms) is even more preferable, and an alkoxy group having 1 to 4 carbon atoms (branched chain alkoxy group having 3 to 4 carbon atoms) is more preferable. ) is particularly good.

作為具體的烷氧基,可舉出甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、二級丁氧基、三級丁氧基、戊氧基、己氧基、庚氧基、辛氧基等。Specific alkoxy groups include methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, secondary butoxy, tertiary butoxy, and pentoxy. base, hexyloxy, heptyloxy, octyloxy, etc.

作為第1取代基之、取代或未取代的「芳基」、取代或未取代的「雜芳基」、取代或未取代的「二芳基胺基」、取代或未取代的「二雜芳基胺基」、取代或未取代的「芳基雜芳基胺基」、取代或未取代的「烷基」、取代或未取代的「烷氧基」、或者取代或未取代的「芳氧基」如說明為取代或未取代般,該等中的至少1個氫原子可以被第2取代基取代。作為該第2取代基,例如可舉出芳基、雜芳基或烷基,該等的具體例能夠參閱上述之「芳環」或「雜芳環」的一價的基團及作為第1取代基的「烷基」的說明。又,在作為第2取代基的芳基、雜芳基中,該等中的至少1個氫原子被苯基等芳基(具體例為上述者)、甲基等烷基(具體例為上述者)取代者亦包含在作為第2取代基的芳基、雜芳基中。作為其一例,在第2取代基為咔唑基的情形下,9位處的至少1個氫原子被苯基等芳基、甲基等烷基取代之咔唑基亦包含在作為第2取代基的雜芳基中。As the first substituent, a substituted or unsubstituted "aryl group", a substituted or unsubstituted "heteroaryl group", a substituted or unsubstituted "diarylamine group", a substituted or unsubstituted "diheteroaryl group" "amine", substituted or unsubstituted "arylheteroarylamine", substituted or unsubstituted "alkyl", substituted or unsubstituted "alkoxy", or substituted or unsubstituted "aryloxy" "Group" means whether it is substituted or unsubstituted, at least one hydrogen atom among them may be substituted by a second substituent. Examples of the second substituent include an aryl group, a heteroaryl group, or an alkyl group. For specific examples of these, refer to the monovalent group of the above-mentioned “aromatic ring” or “heteroaryl ring” and the first Description of "alkyl" substituent. In addition, in the aryl group and heteroaryl group as the second substituent, at least one hydrogen atom in these is replaced by an aryl group such as phenyl (specific examples are the above), an alkyl group such as methyl (specific examples are the above) ) substituents are also included in the aryl group and heteroaryl group as the second substituent. As an example, when the second substituent is a carbazolyl group, a carbazolyl group in which at least one hydrogen atom at position 9 is substituted by an aryl group such as phenyl or an alkyl group such as methyl is also included as the second substituent. In the heteroaryl group of the base.

作為通式(II)的R 1~R 11中的芳基、雜芳基、二芳基胺基的芳基、二雜芳基胺基的雜芳基、芳基雜芳基胺基的芳基和雜芳基、或芳氧基的芳基,可舉出在通式(I)中說明之「芳環」或「雜芳環」的一價的基團。又,作為R 1~R 11中的烷基或烷氧基,能夠參閱上述之通式(I)的說明中的作為第1取代基的「烷基」、「烷氧基」的說明。進而,作為對該等基團的取代基的芳基、雜芳基或烷基亦相同。又,關於在R 1~R 11中的鄰接之基團彼此鍵結而與a環、b環或c環一起形成芳環或雜芳環時的、作為對該等環的取代基之雜芳基、二芳基胺基、二雜芳基胺基、芳基雜芳基胺基、烷基、烷氧基或芳氧基及作為進一步的取代基之芳基、雜芳基或烷基亦相同。 As an aryl group, a heteroaryl group, an aryl group of a diarylamine group, a heteroaryl group of a diarylamine group, or an aryl group of an arylheteroarylamine group in R 1 to R 11 of the general formula (II) Examples of the aryl group such as an aryl group and a heteroaryl group or an aryloxy group include an "aromatic ring" or a "heteroaryl ring" monovalent group described in the general formula (I). In addition, as the alkyl group or alkoxy group in R 1 to R 11 , refer to the description of “alkyl group” and “alkoxy group” as the first substituent in the description of the general formula (I) above. Furthermore, the same applies to the aryl group, heteroaryl group or alkyl group that is a substituent for these groups. Furthermore, when adjacent groups among R 1 to R 11 are bonded to each other to form an aromatic ring or a heteroaromatic ring together with the a ring, b ring or c ring, heteroaryl as a substituent for these rings Aryl, diarylamine, diarylamine, arylheteroarylamine, alkyl, alkoxy or aryloxy and aryl, heteroaryl or alkyl as further substituents are also same.

通式(I)的X 1及X 2中的N-R的R為可以被上述之第2取代基取代之芳基、雜芳基或烷基,芳基、雜芳基中的至少1個氫原子例如可以被烷基或芳基取代。作為該芳基、雜芳基、烷基,可舉出上述者。尤其,碳數6~10的芳基(例如苯基、萘基等)、碳數2~15的雜芳基(例如咔唑基等)、碳數1~4的烷基(例如甲基、乙基等)為較佳。該說明在通式(II)中的X 1及X 2中亦相同。 R in NR in X 1 and For example, they may be substituted by alkyl or aryl groups. Examples of the aryl group, heteroaryl group and alkyl group include those mentioned above. In particular, aryl groups with 6 to 10 carbon atoms (such as phenyl, naphthyl, etc.), heteroaryl groups with 2 to 15 carbon atoms (such as carbazolyl, etc.), alkyl groups with 1 to 4 carbon atoms (such as methyl, Ethyl, etc.) are preferred. This description is also the same for X 1 and X 2 in the general formula (II).

通式(I)中的連結基亦即「-C(-R) 2-」的R為氫原子或烷基,但是作為該烷基,可舉出上述者。尤其,碳數1~4的烷基(例如甲基、乙基等)為較佳。該說明在通式(II)中的連結基亦即「-C(-R) 2-」中亦相同。 R in "-C(-R) 2 -", which is the linking group in the general formula (I), is a hydrogen atom or an alkyl group. Examples of the alkyl group include those mentioned above. In particular, an alkyl group having 1 to 4 carbon atoms (eg, methyl group, ethyl group, etc.) is preferred. This description is also the same for "-C(-R) 2 -" which is the coupling group in general formula (II).

又,本發明的雷射元件所包含之化合物可以為具有複數個通式(I)所表示之單元結構之多聚物、較佳為具有複數個通式(II)所表示之單元結構之多聚物。多聚物係二聚物~六聚物為較佳,二聚物~三聚物為更佳,二聚物為特佳。關於多聚物,只要係在一個化合物中具有複數個上述單元結構之形態即可,例如,除了上述單元結構藉由單鍵、碳數1~3的伸烷基、伸苯基、伸萘基等連結基鍵結有複數個之形態以外,還可以為由複數個單元結構共價上述單元結構中所包含之任意環(A環、B環或C環、a環、b環或c環)而鍵結之形態,並且,還可以為上述單元結構中所包含之任意環(A環、B環或C環、a環、b環或c環)彼此稠合而鍵結之形態。Furthermore, the compound contained in the laser element of the present invention may be a polymer having a plurality of unit structures represented by the general formula (I), preferably a polymer having a plurality of unit structures represented by the general formula (II). Polymer. The polymer is preferably a dimer to a hexamer, a dimer to a trimer is more preferred, and a dimer is particularly preferred. Regarding the polymer, it suffices as long as it has a plurality of the above-mentioned unit structures in one compound. For example, in addition to the above-mentioned unit structures through a single bond, an alkylene group having 1 to 3 carbon atoms, a phenyl group, or a naphthylene group. In addition to the form in which the linking group has a plurality of bonds, it can also be covalently composed of a plurality of unit structures and any ring included in the above unit structure (A ring, B ring or C ring, a ring, b ring or c ring) The bonding form may also be a form in which any of the rings included in the above unit structure (A ring, B ring or C ring, a ring, b ring or c ring) are fused to each other and bonded.

作為這種多聚物,例如可舉出下述式(2-4)、式(2-4-1)、式(2-4-2)、式(2-5-1)~式(2-5-4)或式(2-6)所表示之多聚物化合物。下述式(2-4)所表示之多聚物化合物例如對應於WO2015/102118號公報中所記載之包括式(1-21)所表示之結構作為環骨架之化合物。亦即,若在通式(II)中進行說明,則為共價作為a環之苯環而在一個化合物中具有複數個通式(II)所表示之單元結構之多聚物化合物。又,下述式(2-4-1)所表示之多聚物化合物例如對應於WO2015/102118號公報中所記載之包括式(1-2665)所表示之結構作為環骨架之化合物。亦即,若在通式(II)中進行說明,則為共價作為a環之苯環而在一個化合物中具有兩個通式(II)所表示之單元結構之多聚物化合物。又,下述式(2-4-2)所表示之多聚物化合物例如對應於WO2015/102118號公報中所記載之包括式(1-2666)所表示之結構作為環骨架之化合物。亦即,若在通式(II)中進行說明,則為共價作為a環之苯環而在一個化合物中具有兩個通式(II)所表示之單元結構之多聚物化合物。又,下述式(2-5-1)~式(2-5-4)所表示之多聚物化合物例如對應於WO2015/102118號公報中所記載之包括式(1-22)~(1-25)所表示之結構作為環骨架之化合物。亦即,若在通式(II)中進行說明,則為共價作為b環(或c環)之苯環而在一個化合物中具有複數個通式(II)所表示之單元結構之多聚物化合物。又,下述式(2-6)所表示之多聚物化合物例如對應於WO2015/102118號公報中所記載之包括式(1-31)~(1-37)所表示之結構作為環骨架之化合物。亦即,若在通式(II)中進行說明,則例如為作為某一單元結構的b環(或a環、c環)之苯環與作為某一單元結構的b環(或a環、c環)之苯環稠合而在一個化合物中具有複數個通式(II)所表示之單元結構之多聚物化合物。Examples of such a multipolymer include the following formula (2-4), formula (2-4-1), formula (2-4-2), formula (2-5-1) to formula (2 -5-4) or a polymer compound represented by formula (2-6). The polymer compound represented by the following formula (2-4) corresponds to a compound including a structure represented by the formula (1-21) as a ring skeleton described in WO2015/102118, for example. That is, if it is described in the general formula (II), it is a polymer compound having a plurality of unit structures represented by the general formula (II) in one compound with a benzene ring covalently serving as the a ring. In addition, the polymer compound represented by the following formula (2-4-1) corresponds to a compound including a structure represented by the formula (1-2665) as a ring skeleton described in WO2015/102118, for example. That is, if it is described in the general formula (II), it is a polymer compound having two unit structures represented by the general formula (II) in one compound with the benzene ring covalently serving as the a ring. In addition, the polymer compound represented by the following formula (2-4-2) corresponds to a compound including a structure represented by the formula (1-2666) as a ring skeleton described in WO2015/102118, for example. That is, if it is described in the general formula (II), it is a polymer compound having two unit structures represented by the general formula (II) in one compound with the benzene ring covalently serving as the a ring. In addition, the polymer compound represented by the following formula (2-5-1) to formula (2-5-4) corresponds to the formulas (1-22) to (1) described in WO2015/102118, for example. -25) The structure represented is a compound with a ring skeleton. That is, if it is described in the general formula (II), it is a polymer having a plurality of unit structures represented by the general formula (II) in one compound as a benzene ring covalently serving as the b ring (or c ring). compounds. In addition, the polymer compound represented by the following formula (2-6) corresponds to, for example, the structure represented by the formulas (1-31) to (1-37) described in WO2015/102118 as a ring skeleton. compound. That is, if it is explained in the general formula (II), for example, a benzene ring of b ring (or a ring, c ring) which is a certain unit structure and a b ring (or a ring, c ring) which is a certain unit structure c ring) The benzene ring is fused to form a polymer compound having a plurality of unit structures represented by the general formula (II) in one compound.

[化學式5] [Chemical formula 5]

多聚物化合物可以為組合式(2-4)、式(2-4-1)或式(2-4-2)所表達之多聚化形態和式(2-5-1)~式(2-5-4)中的任一個或式(2-6)所表達之多聚化形態而成之多聚物,亦可以為組合式(2-5-1)~式(2-5-4)中的任一個所表達之多聚化形態和式(2-6)所表達之多聚化形態而成之多聚物,還可以為組合式(2-4)、式(2-4-1)或式(2-4-2)所表達之多聚化形態、式(2-5-1)~式(2-5-4)中的任一個所表達之多聚化形態及式(2-6)所表達之多聚化形態而成之多聚物。The polymer compound can be a polymerized form expressed by combined formula (2-4), formula (2-4-1) or formula (2-4-2) and formula (2-5-1) ~ formula ( Any one of 2-5-4) or the polymerized form expressed by formula (2-6) can also be a combination of formula (2-5-1) to formula (2-5- The polymer formed by the polymerization form expressed by any one of 4) and the polymerization form expressed by formula (2-6) can also be a combination of formula (2-4) and formula (2-4) -1) or the multimerization form expressed by formula (2-4-2), the multimerization form expressed by any one of formula (2-5-1) to formula (2-5-4), and the formula (2-6) Polymers formed by the expressed polymerization form.

又,通式(I)或(II)所表示之化合物及其多聚物的化學結構中的氫原子的全部或一部分可以為氘原子。In addition, all or part of the hydrogen atoms in the chemical structure of the compound represented by the general formula (I) or (II) and its polymer may be deuterium atoms.

又,通式(I)或(II)所表示之化合物及其多聚物的化學結構中的氫原子的全部或一部分可以為鹵素原子。例如,在通式(I)中,A環、B環、C環(A~C環為芳環或雜芳環)、對A~C環的取代基、Y 1為Si-R或Ge-R時的R(亦即烷基、芳基)、以及X 1及X 2為N-R時的R(亦即烷基、芳基)中的氫原子可以被鹵素原子取代,但是在該等中可舉出芳基、雜芳基中的全部或一部分氫原子被鹵素原子取代之樣態。鹵素原子為氟原子、氯原子、溴原子或碘原子,較佳為氟原子、氯原子或溴原子,更佳為氯原子。 In addition, all or part of the hydrogen atoms in the chemical structure of the compound represented by the general formula (I) or (II) and its polymer may be halogen atoms. For example, in the general formula (I), A ring, B ring, C ring (A to C rings are aromatic rings or heteroaromatic rings), substituents for A to C rings, Y 1 is Si-R or Ge- The hydrogen atoms in R (i.e. alkyl, aryl) when R, and R (i.e. alkyl, aryl) when X 1 and X 2 are NR may be substituted by halogen atoms, but in these cases Examples include examples in which all or part of the hydrogen atoms in an aryl group or a heteroaryl group are substituted by halogen atoms. The halogen atom is a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, preferably a fluorine atom, a chlorine atom or a bromine atom, and more preferably a chlorine atom.

在通式(II)所表示之化合物中,R 1~R 11中的至少1個可以為在通式(II)中規定之特定的取代基。在通式(II)中規定之R 1~R 11可採用之取代基中,芳基及二芳基胺基為較佳,碳數6~30的芳基及二芳基胺基(但是,芳基為碳數6~12的芳基)為更佳。 In the compound represented by the general formula (II), at least one of R 1 to R 11 may be a specific substituent specified in the general formula (II). Among the substituents that can be used for R 1 to R 11 specified in the general formula (II), an aryl group and a diarylamine group are preferred, and an aryl group and a diarylamine group having 6 to 30 carbon atoms (however, More preferably, the aryl group is an aryl group having 6 to 12 carbon atoms).

關於通式(I)所表示之化合物之合成法,能夠參閱WO2015/102118號公報的[0281]至[0316]段。Regarding the synthesis method of the compound represented by the general formula (I), please refer to paragraphs [0281] to [0316] of WO2015/102118.

關於滿足式(1)之延遲螢光材料,還能夠從具有施體性基(典型而言,哈米特的σp值為負的基團)和受體性基(典型而言,哈米特的σp值為正的基團)與連接基團(典型而言,芳香族基等共軛系連結基)鍵結之結構之化合物群中選擇。Regarding the delayed fluorescent material that satisfies the formula (1), it is also possible to select a donor group (typically, a group with a negative Hammett σp value) and an acceptor group (typically, Hammett’s σp value is negative). Select from a group of compounds with a structure in which a group with a positive σp value is bonded to a linking group (typically, a conjugated linking group such as an aromatic group).

哈米特的σp值為由L.P.哈米特提出者,且為將取代基對對位取代苯甲酸的酸解離平衡帶來之影響進行了定量化者。具體而言,在對位取代苯甲酸中的取代基與酸解離平衡常數之間成立之下述式: σp=logK x-logK H中的取代基特有的常數(σp)。 在上式中,K H表示不具有取代基之苯甲酸的酸解離平衡常數,K X表示對位被取代基取代之苯甲酸的酸解離平衡常數。對於關於哈米特的σp之說明和各取代基的數值,能夠參閱Hansch, C. et. al., Chem. Rev., 91, 165-195(1991)。 哈米特的σp為正的值係指,其取代基為受體性基(拉電子基),哈米特的σp為負的值係指,其取代基為施體性基(推電子基)。 Hammett's σp value was proposed by LP Hammett and quantified the influence of substituents on the acid dissociation equilibrium of para-substituted benzoic acid. Specifically, the following formula is established between the substituent in para-substituted benzoic acid and the acid dissociation equilibrium constant: σp=logK x -logK Constant unique to the substituent in H (σp). In the above formula, K H represents the acid dissociation equilibrium constant of benzoic acid having no substituent, and K X represents the acid dissociation equilibrium constant of benzoic acid substituted with a substituent at the para position. For an explanation of Hammett's σp and the numerical values of each substituent, please refer to Hansch, C. et. al., Chem. Rev., 91, 165-195 (1991). A positive value of Hammett's σp means that its substituent is an acceptor group (electron withdrawing group), and a negative value of Hammett's σp means that its substituent is a donor group (electron withdrawing group). ).

作為哈米特的σp值為正的取代基的較佳例,例如能夠舉出氟原子、醯基、醯氧基、烷氧基羰基、芳氧基羰基、氰基、膦氧化物基、磺醯基、全氟烷基、醯胺基、烷氧基、吡啶基、嘧啶基、三唑基等。 作為哈米特的σp值為負的取代基的較佳例,能夠舉出取代胺基及取代胺基芳基。在此所說之取代胺基係取代或未取代的二芳基胺基為較佳,構成取代或未取代的二芳基胺基之2個芳基可以相互連結。連結可以藉由單鍵而成(此時,形成咔唑環),亦可以藉由-O-、-S-、-N(R 71)-、-C(R 72)(R 73)-、-Si(R 74)(R 75)-等連結基而成。在此,R 71~R 75表示氫原子或取代基,R 72與R 73、R 74與R 75可以分別相互連結而形成環狀結構。作為「取代胺基芳基」的芳基,能夠例示從作為上述通式(I)的A環等的例子而舉出之芳環中去除了1個氫原子之一價的基團。 Preferable examples of the substituent having a positive Hammett's σp value include a fluorine atom, a hydroxyl group, a hydroxyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a cyano group, a phosphine oxide group, and a sulfonate group. Cyl group, perfluoroalkyl group, acylamino group, alkoxy group, pyridyl group, pyrimidinyl group, triazolyl group, etc. Preferable examples of the substituent having a negative Hammett σp value include a substituted amino group and a substituted aminoaryl group. The substituted amino group here is preferably a substituted or unsubstituted diarylamine group, and the two aryl groups constituting the substituted or unsubstituted diarylamine group may be linked to each other. The connection can be through a single bond (in this case, a carbazole ring is formed), or through -O-, -S-, -N (R 71 ) -, -C (R 72 ) (R 73 ) -, -Si (R 74 ) (R 75 ) - and other connecting groups. Here, R 71 to R 75 represent a hydrogen atom or a substituent, and R 72 and R 73 and R 74 and R 75 may be connected to each other to form a cyclic structure. Examples of the aryl group of the "substituted aminoaryl group" include a group in which one hydrogen atom is removed from the aromatic ring exemplified as an example of the A ring of the general formula (I).

作為共軛系連結基,能夠舉出芳香族烴基、雜芳香族基。關於構成芳香族烴基之芳香族烴環(芳環)的說明和較佳範圍、具體例,能夠參閱上述通式(I)的A環等中的關於芳環的記載,關於構成雜芳香族基之雜芳香環(雜芳環)的說明和較佳範圍、具體例,能夠參閱上述通式(I)的A環等中的關於雜芳環的記載。關於芳香族烴基及雜芳香族基的價數,在將相對應之芳香族烴環或雜芳香環的可取代的氫原子數設為n時,能夠分別從2以上且n以下的整數中選擇。例如,由苯環構成之芳香族烴基的價數從2~6的整數中選擇。Examples of the conjugated linking group include aromatic hydrocarbon groups and heteroaromatic groups. For a description, preferred range, and specific examples of the aromatic hydrocarbon ring (aromatic ring) constituting the aromatic hydrocarbon group, please refer to the description of the aromatic ring in the A ring of the general formula (I), etc., and for the description of the aromatic ring constituting the heteroaromatic group For the description, preferred range, and specific examples of the heteroaromatic ring (heteroaromatic ring), please refer to the description of the heteroaromatic ring in the A ring of the above-mentioned general formula (I), etc. Regarding the valency of the aromatic hydrocarbon group and the heteroaromatic group, when the number of substitutable hydrogen atoms of the corresponding aromatic hydrocarbon ring or heteroaromatic ring is n, each can be selected from an integer of 2 or more and n or less. . For example, the valence of the aromatic hydrocarbon group composed of a benzene ring is selected from an integer of 2 to 6.

又,作為共軛系連結基的較佳例,能夠舉出下述通式(III)所表示之連結基。Moreover, as a preferable example of a conjugated coupling group, the coupling group represented by the following general formula (III) can be mentioned.

[化學式6] [Chemical formula 6]

在通式(III)中,R 81~R 85各自獨立地表示施體性基或受體性基的鍵結位置。在R 81及R 83鍵結有施體性基為較佳,在R 82、R 84、R 85鍵結有受體性基為較佳。作為與R 81及R 83鍵結之施體性基的較佳例,能夠舉出取代胺基芳基。又,作為與R 82鍵結之受體性基的較佳例,能夠舉出烷氧基羰基(例如,碳數2~25的烷氧基羰基),作為與R 84及R 85鍵結之受體性基的較佳例,能夠舉出鹵素原子(例如氟原子)。 In the general formula (III), R 81 to R 85 each independently represent the bonding position of a donor group or an acceptor group. It is preferable that R 81 and R 83 are bonded with donor groups, and it is more preferable that R 82 , R 84 and R 85 are bonded with acceptor groups. Preferable examples of the donor group bonded to R 81 and R 83 include a substituted aminoaryl group. Preferable examples of the acceptor group bonded to R 82 include an alkoxycarbonyl group (for example, an alkoxycarbonyl group having 2 to 25 carbon atoms). Examples of the acceptor group bonded to R 84 and R 85 include Preferable examples of the acceptor group include a halogen atom (for example, a fluorine atom).

<雷射振盪材料> 本發明的雷射振盪材料為含有本發明的延遲螢光材料者。 關於本發明的延遲螢光材料的說明,能夠參閱上述<延遲螢光材料>一欄的記載。本發明的延遲螢光材料藉由滿足式(1),在雷射振盪過程中由激發三重態狀態吸收引起之光損耗被抑制,從而能夠使雷射振盪長期持續。因此,本發明的延遲螢光材料作為雷射振盪材料而有用性高,特別適合用作CW雷射用雷射振盪材料。 雷射振盪材料可以僅由滿足式(1)之延遲螢光材料構成,亦可以包含其他成分。 <Laser oscillation material> The laser oscillation material of the present invention contains the delayed fluorescent material of the present invention. For a description of the delayed fluorescent material of the present invention, please refer to the description in the above column of <Delayed Fluorescent Material>. By satisfying equation (1), the delayed fluorescent material of the present invention can suppress the light loss caused by the absorption of the excited triplet state during the laser oscillation process, thereby enabling the laser oscillation to continue for a long time. Therefore, the delayed fluorescent material of the present invention is highly useful as a laser oscillation material, and is particularly suitable as a laser oscillation material for CW laser. The laser oscillation material may only be composed of delayed fluorescent materials that satisfy equation (1), or may include other components.

<雷射元件> 本發明的雷射元件為使用了本發明的延遲螢光材料者。關於本發明的延遲螢光材料的說明,能夠參閱上述<延遲螢光材料>一欄的記載。 在本發明的雷射元件中,將滿足式(1)之延遲螢光材料用作構成增益媒體之雷射振盪材料為較佳。藉此,能夠實現雷射振盪的持續時間長的雷射元件。本發明的雷射元件可以為增益媒體為液態的液態雷射,亦可以為增益媒體為固態(活性層)的固態雷射。又,本發明的雷射元件可以為藉由對增益媒體照射激發光而輻射雷射光之光激發型雷射元件,亦可以為對增益媒體注入電洞和電子,藉由該等再結合而產生之能量輻射雷射光之電流激發型雷射元件。光激發型雷射元件具有在基板上至少形成有活性層(增益媒體)之結構。又,電流激發型雷射元件具有至少包括陽極、陰極及形成於陽極與陰極之間之有機層之結構。有機層為至少具有活性層(增益媒體)者,亦可以為僅包括活性層者,亦可以為除了活性層以外還具有1層以上的有機層者。作為這樣的其他有機層,能夠舉出電洞傳輸層、電洞注入層、電子阻擋層、電洞阻擋層、電子注入層、電子傳輸層、激子阻擋層等。電洞傳輸層可以為具有電洞注入功能之電洞注入傳輸層,電子傳輸層可以為具有電子注入功能之電子注入傳輸層。作為具體的雷射元件的結構例,能夠舉出依序積層基板/陽極/電洞注入層/電洞傳輸層/活性層/電子傳輸層/陰極而成之結構。在電流激發型雷射元件中,在活性層中產生之雷射光可以透射陽極而取出到外部,亦可以透射陰極而取出到外部,還可以透射陽極及陰極而取出到外部,還可以從有機層的端面取出到外部。又,光激發型及電流激發型各雷射元件可以進一步具備以特定波長放大來自活性層的誘導發射光之光共振器。 以下,對電流激發型雷射元件的各構件及各層進行說明。另外,基板和活性層的說明亦對應於光激發型雷射元件的基板和活性層。 <Laser Components> The laser element of the present invention uses the delayed fluorescent material of the present invention. For a description of the delayed fluorescent material of the present invention, please refer to the description in the above column of <Delayed Fluorescent Material>. In the laser element of the present invention, it is preferable to use a delayed fluorescent material that satisfies formula (1) as the laser oscillation material constituting the gain medium. This makes it possible to realize a laser element with a long duration of laser oscillation. The laser element of the present invention can be a liquid laser in which the gain medium is liquid, or a solid-state laser in which the gain medium is solid (active layer). Furthermore, the laser element of the present invention may be a light-excited laser element that radiates laser light by irradiating the gain medium with excitation light, or may be generated by injecting holes and electrons into the gain medium and recombination of these. The energy radiation laser light is a current-excited laser element. The photoexcited laser element has a structure in which at least an active layer (gain medium) is formed on a substrate. Furthermore, the current excitation type laser element has a structure including at least an anode, a cathode, and an organic layer formed between the anode and the cathode. The organic layer may include at least an active layer (gain medium), may include only the active layer, or may include one or more organic layers in addition to the active layer. Examples of such other organic layers include a hole transport layer, a hole injection layer, an electron blocking layer, a hole blocking layer, an electron injection layer, an electron transport layer, an exciton blocking layer, and the like. The hole transport layer can be a hole injection transport layer with a hole injection function, and the electron transport layer can be an electron injection transport layer with an electron injection function. As a specific structural example of a laser element, there can be mentioned a structure in which substrate/anode/hole injection layer/hole transport layer/active layer/electron transport layer/cathode are laminated in this order. In a current-excited laser element, the laser light generated in the active layer can be taken out to the outside through the anode, the cathode can be taken out to the outside, the anode and the cathode can be taken out to the outside, or it can be taken out from the organic layer. The end face is taken out to the outside. Furthermore, each of the photoexcitation type and current excitation type laser elements may further include an optical resonator that amplifies the induced emission light from the active layer at a specific wavelength. Each component and each layer of the current excitation laser element will be described below. In addition, the description of the substrate and active layer also corresponds to the substrate and active layer of the photo-excited laser element.

(基板) 本發明的雷射元件支撐於基板為較佳。作為基板,在雷射元件為從基板側取出雷射光之結構之情形下,使用對雷射光具有透光性之基板,使用包含玻璃、透明塑膠、石英等之透明基板為較佳。另一方面,在雷射元件為從與基板相反的一側取出雷射光之結構之情形下,基板並無特別限制,除了上述透明基板以外,還能夠使用包含矽、紙、布之基板。 (Substrate) The laser element of the present invention is preferably supported on a substrate. As the substrate, when the laser element has a structure that takes out the laser light from the substrate side, it is preferable to use a substrate that is translucent to the laser light, and it is preferable to use a transparent substrate including glass, transparent plastic, quartz, etc. On the other hand, when the laser element is configured to take out laser light from the side opposite to the substrate, the substrate is not particularly limited. In addition to the above-mentioned transparent substrate, substrates including silicon, paper, and cloth can also be used.

(陽極) 作為雷射元件中的陽極,可較佳使用將功函數大(4eV以上)的金屬、合金、導電性化合物及該等的混合物作為電極材料者。作為這種電極材料的具體例,可舉出Au等金屬、CuI、銦錫氧化物(ITO)、SnO 2、ZnO、TiN等導電性透明材料。又,可以使用IDIXO(In 2O 3-ZnO)等非晶質且能夠製作透明導電膜之材料。陽極能夠藉由蒸鍍、濺鍍等方法將該等電極材料進行成膜而形成。又,在所形成之薄膜上,可以藉由光刻法形成所期望的形狀的圖案而作為陽極,或者在不太需要圖案精度之情形下(100μm以上左右),可以在上述電極材料的蒸鍍、濺鍍時經由所期望的形狀的遮罩形成圖案。或者,在使用如有機導電性化合物般可塗佈之材料之情形下,還能夠使用印刷方式、塗佈方式等濕式成膜法。 但是,在雷射元件為透射陽極而取出雷射光之結構之情形下,陽極需要對雷射光具有透光性,構成為該雷射光的透射率大於1%為較佳,構成為大於10%為更佳。具體而言,將上述導電性透明材料用於陽極、或者將金屬或合金以10~100nm的厚度形成之薄膜用於陽極為較佳。 作為陽極的片電阻係數百Ω/□以下為較佳。進而,膜厚亦取決於材料,但是通常在10~1000nm、較佳為10~200nm的範圍內選擇。 (Anode) As the anode in the laser element, metals, alloys, conductive compounds, and mixtures thereof with a large work function (4 eV or more) can be preferably used as electrode materials. Specific examples of such electrode materials include metals such as Au, conductive transparent materials such as CuI, indium tin oxide (ITO), SnO 2 , ZnO, and TiN. In addition, amorphous materials capable of producing transparent conductive films such as IDIXO (In 2 O 3 -ZnO) can be used. The anode can be formed by depositing the electrode materials into a film by evaporation, sputtering or other methods. In addition, on the formed thin film, a pattern of a desired shape can be formed by photolithography to serve as an anode. Alternatively, when pattern accuracy is not required (about 100 μm or more), the above-mentioned electrode material can be vapor-deposited. , the pattern is formed through a mask of the desired shape during sputtering. Alternatively, when a material that can be coated such as an organic conductive compound is used, a wet film-forming method such as a printing method or a coating method can also be used. However, in the case where the laser element has a structure that transmits the anode and extracts the laser light, the anode needs to be translucent to the laser light. The transmittance of the laser light is preferably greater than 1%, and the transmittance of the laser light is greater than 10%. Better. Specifically, it is preferable to use the above-mentioned conductive transparent material for the anode, or to use a thin film of metal or alloy with a thickness of 10 to 100 nm for the anode. The sheet resistance of the anode is preferably several hundred Ω/□ or less. Furthermore, the film thickness also depends on the material, but is usually selected within the range of 10 to 1000 nm, preferably 10 to 200 nm.

(陰極) 另一方面,作為陰極,可使用將功函數比用於陽極之材料小的金屬(稱為電子注入性金屬)、合金、導電性化合物及該等的混合物作為電極材料者。作為這種電極材料的具體例,可舉出鈉、鈉-鉀合金、鎂、鋰、鎂/銅混合物、鎂/銀混合物、鎂/鋁混合物、鎂/銦混合物、鋁/酸化鋁(Al 2O 3)混合物、銦、鋰/鋁混合物、稀土金屬等。該等中,就電子注入性及對氧化等之耐久性的觀點而言,電子注入性金屬和與其相比功函數的值大且穩定的金屬亦即第二金屬的混合物、例如鎂/銀混合物、鎂/鋁混合物、鎂/銦混合物、鋁/酸化鋁(Al 2O 3)混合物、鋰/鋁混合物、鋁等為適合。陰極能夠藉由蒸鍍、濺鍍等方法將該等電極材料進行成膜而形成。 但是,在雷射元件為透射陰極而取出雷射光之結構之情形下,陰極需要對雷射光具有透光性,構成為該雷射光的透射率大於1%為較佳,構成為大於10%為更佳。具體而言,將上述電極材料以10~100nm的厚度形成之薄膜用於陰極為較佳。 作為陰極的片電阻係數百Ω/□以下為較佳,膜厚通常在10nm~5μm、較佳為50~200nm的範圍內選擇。 (Cathode) On the other hand, as the cathode, a metal having a smaller work function than the material used for the anode (called an electron-injecting metal), an alloy, a conductive compound, or a mixture thereof can be used as the electrode material. Specific examples of such electrode materials include sodium, sodium-potassium alloy, magnesium, lithium, magnesium/copper mixture, magnesium/silver mixture, magnesium/aluminum mixture, magnesium/indium mixture, aluminum/aluminum oxide (Al 2 O 3 ) mixtures, indium, lithium/aluminum mixtures, rare earth metals, etc. Among these, a mixture of an electron-injecting metal and a second metal having a larger and more stable work function value than the electron-injecting metal, such as a magnesium/silver mixture, is used from the viewpoint of electron injection properties and durability against oxidation, etc. , magnesium/aluminum mixture, magnesium/indium mixture, aluminum/aluminum oxide (Al 2 O 3 ) mixture, lithium/aluminum mixture, aluminum, etc. are suitable. The cathode can be formed by depositing the electrode materials into a film by evaporation, sputtering or other methods. However, in the case where the laser element has a structure that transmits the cathode and extracts the laser light, the cathode needs to be transparent to the laser light. The transmittance of the laser light is preferably greater than 1%, and the transmittance of the laser light is greater than 10%. Better. Specifically, it is preferable to use a thin film of the above electrode material with a thickness of 10 to 100 nm for the cathode. The sheet resistance of the cathode is preferably several hundred Ω/□ or less, and the film thickness is usually selected in the range of 10 nm to 5 μm, preferably 50 to 200 nm.

(活性層) 活性層為如下層,亦即,藉由分別從陽極及陰極注入之電洞及電子再結合而生成激子,形成反轉分布之後,引起誘導發射之層。 活性層可以僅由雷射振盪材料構成,但是較佳為包括雷射振盪材料和主體材料。作為雷射振盪材料,能夠使用選自滿足式(1)之延遲螢光材料中之1種或2種以上。為了進一步降低本發明的雷射元件的臨界值電流密度,重要的係將在雷射振盪材料中生成之單重態激子及三重態激子限制在雷射振盪材料中。因此,在活性層中除了雷射振盪材料以外還使用主體材料為較佳。作為主體材料,能夠使用激發單重態能量、激發三重態能量中的至少任一者具有比用作雷射振盪材料之延遲螢光材料高的值之有機化合物。其結果,能夠將在雷射振盪材料中生成之單重態激子及三重態激子限制在雷射振盪材料的分子中,能夠降低用以產生雷射振盪之臨界值電流密度。但是,即使無法充分地限制單重態激子及三重態激子,有時亦能夠有助於低臨界值化、雷射特性的改善,因此只要係能夠實現低臨界值化、雷射特性的改善之主體材料,則能夠無特別限制地用於本發明。在本發明的雷射元件中,雷射振盪材料誘導發射之光藉由光共振器等的作用而成為雷射光並被發射到外部。雷射元件所發射之光可以包括來自雷射振盪材料的自然發射光、自然發射放大光,亦可以包括從主體材料發射之光,但是雷射光為主要成分為較佳。 在使用主體材料之情形下,用於雷射振盪材料之延遲螢光材料在活性層中所含有之量係0.1重量%以上為較佳,1重量%以上為更佳,並且,50重量%以下為較佳,25重量%以下為更佳,20重量%以下為進一步較佳,15重量%以下為特佳。 作為活性層中的主體材料,具有電洞傳輸能力、電子傳輸能力,並且防止發光的長波長化,進而具有高玻璃轉移溫度之有機化合物為較佳。 (active layer) The active layer is a layer that causes induced emission after recombination of holes and electrons injected from the anode and cathode to generate excitons, forming an inversion distribution. The active layer may be composed only of the laser oscillation material, but preferably includes the laser oscillation material and the host material. As the laser oscillation material, one or two or more types selected from delayed fluorescent materials that satisfy equation (1) can be used. In order to further reduce the critical current density of the laser element of the present invention, it is important to limit the singlet excitons and triplet excitons generated in the laser oscillation material to the laser oscillation material. Therefore, it is preferable to use a host material in addition to the laser oscillation material in the active layer. As the host material, an organic compound having at least one of an excited singlet energy and an excited triplet energy higher than that of a delayed fluorescent material used as a laser oscillation material can be used. As a result, the singlet excitons and triplet excitons generated in the laser oscillation material can be confined in the molecules of the laser oscillation material, and the critical current density for generating laser oscillation can be reduced. However, even if the singlet excitons and triplet excitons cannot be sufficiently confined, it may still contribute to lowering the critical value and improving the laser characteristics. Therefore, as long as the system can achieve lowering the critical value and improving the laser characteristics. The host material can be used in the present invention without particular limitations. In the laser element of the present invention, the light induced by the laser oscillation material becomes laser light by the action of the optical resonator and the like and is emitted to the outside. The light emitted by the laser element may include natural emission light from the laser oscillation material, natural emission amplified light, or light emitted from the host material, but it is better if laser light is the main component. When a host material is used, the amount of the delayed fluorescent material used for the laser oscillation material in the active layer is preferably 0.1% by weight or more, more preferably 1% by weight or more, and 50% by weight or less. Preferably, it is 25% by weight or less, more preferably 20% by weight or less, still more preferably 20% by weight or less, and particularly preferably 15% by weight or less. As the host material in the active layer, organic compounds that have hole-transporting capabilities, electron-transporting capabilities, prevent long-wavelength emission of light, and have a high glass transition temperature are preferred.

(注入層) 注入層係指為了降低驅動電壓、提高發光亮度而設置於電極與有機層之間之層,有電洞注入層和電子注入層,可以存在於陽極與活性層或電洞傳輸層之間、及陰極與活性層或電子傳輸層之間。注入層能夠依需要來設置。 (injection layer) The injection layer refers to the layer placed between the electrode and the organic layer in order to reduce the driving voltage and increase the luminous brightness. There are hole injection layers and electron injection layers, which can exist between the anode and the active layer or hole transport layer, and Between the cathode and the active layer or electron transport layer. The injection layer can be configured as needed.

(阻擋層) 阻擋層為能夠阻擋存在於活性層中之電荷(電子或電洞)及/或激子向活性層外擴散之層。電子阻擋層能夠配置於活性層及電洞傳輸層之間,阻擋電子朝向電洞傳輸層而通過活性層。同樣地,電洞阻擋層能夠配置於活性層及電子傳輸層之間,阻擋電洞朝向電子傳輸層而通過活性層。阻擋層還能夠用於阻擋激子擴散到活性層的外側。亦即,電子阻擋層、電洞阻擋層分別還能夠兼備作為激子阻擋層的功能。在本說明書中所說之電子阻擋層或激子阻擋層係在包括以一層具有電子阻擋層及激子阻擋層的功能之層之含義下使用。 (barrier layer) The barrier layer is a layer that can block charges (electrons or holes) and/or excitons existing in the active layer from diffusing out of the active layer. The electron blocking layer can be disposed between the active layer and the hole transport layer to block electrons from passing towards the hole transport layer and passing through the active layer. Similarly, the hole blocking layer can be disposed between the active layer and the electron transport layer to block holes from passing through the active layer towards the electron transport layer. The barrier layer can also serve to block the diffusion of excitons to the outside of the active layer. That is, the electron blocking layer and the hole blocking layer can each also serve as an exciton blocking layer. The electron blocking layer or exciton blocking layer mentioned in this specification is used in the sense of including a layer having the functions of an electron blocking layer and an exciton blocking layer.

(電洞阻擋層) 電洞阻擋層在廣義上具有電子傳輸層的功能。電洞阻擋層具有傳輸電子的同時,阻擋電洞到達電子傳輸層之作用,藉此能夠提高活性層中的電子與電洞的再結合概率。作為電洞阻擋層的材料,能夠依需要使用後述之電子傳輸層的材料。 (hole blocking layer) The hole blocking layer has the function of an electron transport layer in a broad sense. The hole blocking layer has the function of transporting electrons and blocking holes from reaching the electron transport layer, thereby increasing the probability of recombination of electrons and holes in the active layer. As the material of the hole blocking layer, the material of the electron transport layer described below can be used if necessary.

(電子阻擋層) 電子阻擋層在廣義上具有傳輸電洞之功能。電子阻擋層具有傳輸電洞的同時,阻擋電子到達電洞傳輸層之作用,藉此能夠提高活性層中的電子與電洞再結合之概率。 (electron blocking layer) The electron blocking layer has the function of transporting holes in a broad sense. The electron blocking layer has the function of transporting holes and blocking electrons from reaching the hole transport layer, thereby increasing the probability of recombination of electrons and holes in the active layer.

(激子阻擋層) 激子阻擋層係指用以阻擋藉由在活性層內電洞與電子再結合而產生之激子擴散到電荷傳輸層之層,藉由插入本層而能夠有效率地將激子限制在活性層內,能夠提高元件的發光效率。激子阻擋層能夠鄰接於活性層而插入到陽極側、陰極側中的任一側,亦能夠兩者同時插入。亦即,在陽極側具有激子阻擋層之情形下,能夠在電洞傳輸層與活性層之間鄰接於活性層而插入該層,在插入到陰極側之情形下,能夠在活性層與陰極之間鄰接於活性層而插入該層。又,在陽極與鄰接於活性層的陽極側之激子阻擋層之間,能夠具有電洞注入層、電子阻擋層等,能夠在陰極與鄰接於活性層的陰極側之激子阻擋層之間,能夠具有電子注入層、電子傳輸層、電洞阻擋層等。在配置阻擋層之情形下,用作阻擋層之材料的激發單重態能量及激發三重態能量中的至少任一者比雷射振盪材料的激發單重態能量及激發三重態能量高為較佳。 (Exciton blocking layer) The exciton blocking layer refers to a layer that blocks the excitons generated by the recombination of holes and electrons in the active layer from diffusing to the charge transport layer. By inserting this layer, the excitons can be effectively confined in the active layer. Within the layer, the luminous efficiency of the element can be improved. The exciton blocking layer can be inserted into either the anode side or the cathode side adjacent to the active layer, or both can be inserted at the same time. That is, when there is an exciton blocking layer on the anode side, the hole transport layer and the active layer can be inserted adjacent to the active layer. When it is inserted on the cathode side, the hole transport layer can be inserted between the active layer and the cathode. This layer is inserted adjacent to the active layer. Furthermore, a hole injection layer, an electron blocking layer, etc. can be provided between the anode and the exciton blocking layer adjacent to the anode side of the active layer, and between the cathode and the exciton blocking layer adjacent to the cathode side of the active layer. , can have an electron injection layer, an electron transport layer, a hole blocking layer, etc. When a barrier layer is provided, it is preferable that at least one of the excited singlet energy and the excited triplet energy of the material used as the barrier layer is higher than the excited singlet energy and excited triplet energy of the laser oscillation material.

(電洞傳輸層) 電洞傳輸層包含具有傳輸電洞之功能之電洞傳輸材料,電洞傳輸層能夠設置單層或複數層。 作為電洞傳輸材料,為具有電洞的注入或傳輸、電子的障壁性中的任一個者,可以為有機物、無機物中的任一種。作為能夠使用之公知的電洞傳輸材料,例如可舉出三唑衍生物、㗁二唑衍生物、咪唑衍生物、咔唑衍生物、吲哚并咔唑衍生物、聚芳基烷烴衍生物、吡唑啉衍生物及吡唑啉酮衍生物、苯二胺衍生物、芳胺衍生物、胺基取代查耳酮衍生物、㗁唑衍生物、苯乙烯蔥衍生物、茀酮衍生物、腙衍生物、茋衍生物、矽氮烷衍生物、苯胺系共聚物及導電性高分子寡聚物、特別係噻吩寡聚物等,但是使用卟啉化合物、芳香族三級胺化合物及苯乙烯胺化合物為較佳,使用芳香族三級胺化合物為更佳。 (hole transport layer) The hole transport layer includes a hole transport material with the function of transporting holes. The hole transport layer can be provided with a single layer or multiple layers. The hole transport material has either injection or transport properties of holes or barrier properties for electrons, and may be either an organic substance or an inorganic substance. Examples of known hole transport materials that can be used include triazole derivatives, oxadiazole derivatives, imidazole derivatives, carbazole derivatives, indolocarbazole derivatives, and polyarylalkane derivatives. Pyrazoline derivatives and pyrazolone derivatives, phenylenediamine derivatives, aromatic amine derivatives, amino-substituted chalcone derivatives, ethazole derivatives, styrene scallion derivatives, quinone derivatives, hydrazones Derivatives, stilbene derivatives, silazane derivatives, aniline copolymers and conductive polymer oligomers, especially thiophene oligomers, etc. However, porphyrin compounds, aromatic tertiary amine compounds and styrylamines are used It is preferable to use an aromatic tertiary amine compound.

(電子傳輸層) 電子傳輸層包含具有傳輸電子之功能之材料,電子傳輸層能夠設置單層或複數層。 作為電子傳輸材料(有時亦兼作電洞阻擋材料),只要具有將從陰極注入之電子傳遞至活性層之功能即可。作為能夠使用之電子傳輸層,例如可舉出硝基取代茀衍生物、二苯基苯醌(diphenylquinone)衍生物、噻喃二氧化物衍生物、碳二亞胺、亞茀基甲烷衍生物、蒽醌二甲烷及蒽酮衍生物、㗁二唑衍生物等。進而,在上述㗁二唑衍生物中,將㗁二唑環的氧原子取代為硫原子之噻二唑衍生物、具有作為拉電子基而已知之喹㗁啉環之喹㗁啉衍生物亦能夠用作電子傳輸材料。進而,還能夠使用將該等材料導入到高分子鏈或將該等材料作為高分子的主鏈之高分子材料。 (electron transport layer) The electron transport layer contains a material with the function of transporting electrons, and the electron transport layer can be provided with a single layer or multiple layers. As an electron transport material (sometimes also used as a hole blocking material), it only needs to have the function of transferring electrons injected from the cathode to the active layer. Examples of the electron transport layer that can be used include nitro-substituted fluorine derivatives, diphenylquinone derivatives, thiopyran dioxide derivatives, carbodiimides, and fluorylidenemethane derivatives. Anthraquinone dimethane and anthrone derivatives, oxadiazole derivatives, etc. Furthermore, among the above-mentioned 㗁adiazole derivatives, thiadiazole derivatives in which the oxygen atom of the 㗁adiazole ring is substituted with a sulfur atom, and quintiline derivatives having a quintiline ring known as an electron-withdrawing group can also be used. As electron transmission material. Furthermore, a polymer material in which these materials are introduced into a polymer chain or used as a main chain of a polymer can also be used.

(光共振器) 光共振器具有藉由共振使來自活性層的誘導發射光放大而生成雷射光之功能。光共振器可以為由繞射光柵反射光之分布回饋(DFB)型光共振器、分布反射型(DBR)光共振器,亦可以為由相互對向配置之反射鏡和部分反射鏡構成之法布里培若型光共振器。構成共振器之繞射光柵只要與構成波導之層鄰接配置即可,可以配置於活性層與其鄰接層(有機層或電極)之間,亦可以配置於除了活性層以外的有機層彼此之間、除了活性層以外的有機層與電極之間。在法布里培若型光共振器中,反射鏡的反射率係100%左右為較佳,部分反射鏡的反射率係50~95%為較佳。藉此,部分反射鏡亦作為輸出鏡發揮功能,能夠從該部分反射鏡側取出雷射光。在採用法布里培若型光共振器之情形下,可以使陽極、陰極兼具反射鏡或部分反射鏡的功能,亦可以與其不同地設置反射鏡和部分反射鏡。 (Optical resonator) The optical resonator has the function of amplifying the induced emission light from the active layer through resonance to generate laser light. The optical resonator can be a distributed feedback (DFB) optical resonator that reflects light from a diffraction grating, a distributed reflection (DBR) optical resonator, or it can be composed of mirrors and partial mirrors arranged to face each other. Brimpero type optical resonator. The diffraction grating constituting the resonator only needs to be disposed adjacent to the layer constituting the waveguide. It may be disposed between the active layer and its adjacent layer (organic layer or electrode), or between organic layers other than the active layer. Between organic layers other than the active layer and electrodes. In a Fabry-Perot type optical resonator, the reflectivity of the reflecting mirror is preferably about 100%, and the reflectivity of the partial reflecting mirror is preferably 50 to 95%. Thereby, the partial reflecting mirror also functions as an output mirror, and laser light can be extracted from the side of the partial reflecting mirror. When a Fabry-Perot type optical resonator is used, the anode and the cathode can have the function of a reflector or a partial reflector, or the reflector and the partial reflector can be provided separately.

如上所述的雷射元件藉由在陽極與陰極之間流通臨界值電流密度以上的電流而輻射雷射光。此時,在本發明的雷射元件中,藉由包含滿足式(1)之延遲螢光材料,由三重態蓄積引起之激發三重態狀態吸收被抑制,從而能夠長期持續雷射振盪。The laser element as described above radiates laser light by flowing a current exceeding a critical value current density between the anode and the cathode. At this time, in the laser element of the present invention, by including a delayed fluorescent material that satisfies equation (1), the absorption of the excited triplet state caused by triplet accumulation is suppressed, so that laser oscillation can be sustained for a long period of time.

在製作本發明的雷射元件時,構成雷射元件之各層之製膜方法並無特別限定,可以藉由乾式製程、濕式製程中的任一種來製作。When producing the laser element of the present invention, the film forming method of each layer constituting the laser element is not particularly limited, and can be produced by either a dry process or a wet process.

<延遲螢光材料之評價方法> 本發明之評價方法包括測量延遲螢光材料的σ em、σ TT、k ISC、k RISC之步驟(測量步驟)。 供於測量各參數(σ em、σ TT、k ISC、k RISC)之延遲螢光材料例如能夠從上述(延遲螢光材料的化學結構)一欄中所記載之作為延遲螢光材料的化合物群中選擇。關於延遲螢光材料的定義、各參數的定義和測量方法,能夠參閱上述<延遲螢光材料>一欄的相對應之記載。以下,對本發明之評價方法的第1實施形態和第2實施形態進行說明。 <Evaluation method of delayed fluorescent material> The evaluation method of the present invention includes a step (measurement step) of measuring σ em , σ TT , k ISC , and k RISC of the delayed fluorescent material. The delayed fluorescent material used for measuring each parameter (σ em , σ TT , k ISC , k RISC ) can be selected from the compound group as delayed fluorescent material described in the above column (Chemical Structure of Delayed Fluorescent Material), for example. Select in. For the definition of delayed fluorescent material, the definition of each parameter and the measurement method, you can refer to the corresponding description in the above column "Delayed fluorescent material". Hereinafter, the first and second embodiments of the evaluation method of the present invention will be described.

(評價方法的第1實施形態) 在第1實施形態之評價方法中,包括判定在測量步驟中測量出之σ em、σ TT、k ISC、k RISC是否滿足式(1)之步驟(判定步驟)。關於式(1),能夠參閱上述<延遲螢光材料>一欄的關於式(1)的記載。 第1實施形態之評價方法包括對在判定步驟中判定為滿足式(1)之延遲螢光材料評價為作為雷射振盪材料有用之步驟(第1評價步驟)、及分選在判定步驟中判定為滿足式(1)之延遲螢光材料之步驟(分選步驟)中的至少一個步驟為較佳。 如上述<延遲螢光材料>一欄所示,滿足式(1)之延遲螢光材料中,雷射振盪長期持續。因此,藉由進行以上的各步驟,能夠利用簡單的計算公式判別能夠長期進行雷射振盪之延遲螢光材料,能夠容易地篩選延遲螢光材料。 (First Embodiment of Evaluation Method) The evaluation method of the first embodiment includes a step of determining whether σ em , σ TT , k ISC , and k RISC measured in the measurement step satisfy the equation (1) (judgment step). ). Regarding the formula (1), please refer to the description of the formula (1) in the column of <Delayed Fluorescent Material> mentioned above. The evaluation method of the first embodiment includes a step of evaluating a delayed fluorescent material that is judged to satisfy equation (1) in the judgment step to be useful as a laser oscillation material (first evaluation step), and a step of sorting and judging in the judgment step. It is preferable that at least one of the steps (sorting step) of the delayed fluorescent material satisfy the formula (1). As shown in the "Delayed Fluorescent Material" column above, in the delayed fluorescent material that satisfies equation (1), laser oscillation continues for a long time. Therefore, by performing the above steps, delayed fluorescent materials that can perform laser oscillation for a long time can be identified using a simple calculation formula, and delayed fluorescent materials can be easily screened.

(評價方法的第2實施形態) 第2實施形態之評價方法包括使用在測量步驟中測量出之σ em、σ TT、k ISC、k RISC來計算下述式(2)所表示之差量Δ之步驟(計算步驟)。式(2)的σ em、σ TT、k ISC、k RISC與式(1)的相對應之參數為相同含義。 (Second Embodiment of Evaluation Method) The evaluation method of the second embodiment includes calculating the difference Δ represented by the following formula (2) using σ em , σ TT , k ISC , and k RISC measured in the measurement step. steps (calculation steps). σ em , σ TT , k ISC , k RISC of formula (2) have the same meaning as the corresponding parameters of formula (1).

[數式10] 式(2) [Formula 10] Formula (2)

由式(2)計算之差量Δ越大,則係指雷射振盪更確實地長期持續,作為雷射振盪材料而有用性越高。因此,藉由計算差量Δ,能夠定量地評價延遲螢光材料的雷射振盪持續性能。 第2實施形態之評價方法包括依據在計算步驟中計算出之差量Δ來高度評價該差量Δ大的延遲螢光材料之步驟(第2評價步驟)、及累積延遲螢光材料的化學結構與差量Δ的關係之步驟(累積步驟)中的至少一個步驟為較佳。 第2評價步驟可以包括重複進行如下步驟之製程:比較2個延遲螢光材料的差量Δ,高度評價差量Δ更大的延遲螢光材料之後,比較該高度評價之延遲螢光材料的差量Δ與另一個延遲螢光材料的差量Δ,更高度評價差量Δ更大的延遲螢光材料。又,第2評價步驟亦可以包括如下步驟:設定成為基準之差量Δ(基準Δ),高度評價差量Δ比該基準Δ大的延遲螢光材料。 在累積步驟中,作為設為累積對象之延遲螢光材料群的例子,能夠舉出具有共同的特定的部分結構之延遲螢光材料群、具有特定的施體性基之延遲螢光材料群、具有特定的受體性基之延遲螢光材料群、具備具有多重共振效果之含硼多環芳香族骨架之延遲螢光材料群。藉由進行累積步驟,能夠掌握顯示增加延遲螢光材料的差量Δ之傾向之部分結構、施體性基、受體性基,並且,在「具備具有多重共振效果之含硼多環芳香族骨架之延遲螢光材料」中,能夠掌握顯示增加差量Δ之傾向之結構的特徵。 關於具備施體性基及受體性基、具有多重共振效果之含硼多環芳香族骨架之延遲螢光材料的說明,能夠參閱(延遲螢光材料的化學結構)一欄的記載。 又,在第2實施形態之評價方法包括累積步驟之情形下,可以包括進而利用在累積步驟中累積之關係來預測新的延遲螢光材料的化學結構與差量Δ的關係之步驟(第1預測步驟)、利用累積之關係來預測差量Δ大的延遲螢光材料的化學結構之步驟(第2預測步驟)、及利用累積之關係來預測滿足式(1)之延遲螢光材料的化學結構之步驟(第3預測步驟)中的至少1個步驟。 例如,在第1預測步驟中,在累積之關係中,具有特定的部分結構之延遲螢光材料群的差量Δ在A±α的範圍內的情形下,能夠預測具有相同部分結構之新的延遲螢光材料的差量Δ亦在A±α的範圍內。又,在第2預測步驟及第3預測步驟中,能夠將包括顯示出增加延遲螢光材料的差量Δ之傾向之施體性基、受體性基、部分結構之延遲螢光材料的化學結構預測為差量Δ大的延遲螢光材料的化學結構或滿足式(1)之延遲螢光材料的化學結構。在此,所預測之化學結構可以為僅包括顯示出增加差量Δ之傾向之施體性基、受體性基及部分結構中的任一種者,亦可以為包括顯示出增加差量Δ之傾向之施體性基、受體性基及部分結構中的2種以上者。 The larger the difference Δ calculated from equation (2) is, the more reliable the laser oscillation is for a long period of time, and the higher the usefulness as a laser oscillation material. Therefore, by calculating the difference Δ, the laser oscillation sustaining performance of the delayed fluorescent material can be quantitatively evaluated. The evaluation method of the second embodiment includes a step of highly evaluating a delayed fluorescent material with a large difference Δ based on the difference Δ calculated in the calculation step (second evaluation step), and accumulating the chemical structure of the delayed fluorescent material. At least one of the steps (accumulation steps) related to the difference Δ is preferred. The second evaluation step may include a process of repeating the following steps: comparing the difference Δ between two delayed fluorescent materials, highly evaluating the delayed fluorescent material with the larger difference Δ, and then comparing the difference between the highly evaluated delayed fluorescent materials. The difference Δ between the quantity Δ and another delayed phosphor material is Δ, and the delayed phosphor material with a larger difference Δ is more highly evaluated. Furthermore, the second evaluation step may include a step of setting a difference Δ as a reference (standard Δ) and highly evaluating a delayed fluorescent material whose difference Δ is larger than the reference Δ. In the accumulation step, examples of the delayed fluorescent material group to be accumulated include a delayed fluorescent material group having a common specific partial structure, a delayed fluorescent material group having a specific donor group, A group of delayed fluorescent materials with specific acceptor groups and a group of delayed fluorescent materials with boron-containing polycyclic aromatic skeletons with multiple resonance effects. By performing the accumulation process, it is possible to identify the partial structure, donor group, and acceptor group that tend to increase the difference Δ of the delayed fluorescent material, and in "boron-containing polycyclic aromatic compounds with multiple resonance effects, "Skeleton Delayed Fluorescent Material", the characteristics of the structure showing a tendency to increase the difference Δ can be understood. For an explanation of the delayed fluorescent material having a donor group and an acceptor group and a boron-containing polycyclic aromatic skeleton with multiple resonance effects, please refer to the description in the (Chemical Structure of Delayed Fluorescent Material) column. In addition, when the evaluation method of the second embodiment includes an accumulation step, it may further include a step of predicting the relationship between the chemical structure of the new delayed fluorescent material and the difference Δ using the relationship accumulated in the accumulation step (first step). Prediction step), the step of using the cumulative relationship to predict the chemical structure of the delayed fluorescent material with a large difference Δ (the second prediction step), and using the cumulative relationship to predict the chemistry of the delayed fluorescent material that satisfies the formula (1) At least 1 step in the structure step (3rd prediction step). For example, in the first prediction step, when the difference Δ between delayed fluorescent materials having a specific partial structure is within the range of A±α in a cumulative relationship, it is possible to predict a new group of delayed fluorescent materials having the same partial structure. The difference Δ of the delayed fluorescent material is also within the range of A±α. Furthermore, in the second prediction step and the third prediction step, the chemistry of the delayed fluorescent material including a donor group, an acceptor group, and a partial structure that tend to increase the difference Δ of the delayed fluorescent material can be The structure is predicted to be a chemical structure of a delayed fluorescent material with a large difference Δ or a chemical structure of a delayed fluorescent material that satisfies formula (1). Here, the predicted chemical structure may include only any one of a donor group, an acceptor group, and a partial structure showing a tendency to increase the difference Δ, or may include a structure showing an increase in the difference Δ. Two or more of the preferred donor groups, acceptor groups, and partial structures.

又,第2實施形態之評價方法可以進一步包括第1實施形態的各步驟。此時,第2實施形態之評價方法可以僅包括上述(評價方法的第1實施形態)一欄中所記載之步驟的一部分,亦可以包括全部。Furthermore, the evaluation method of the second embodiment may further include each step of the first embodiment. In this case, the evaluation method of the second embodiment may include only a part of the steps described in the above column (First Embodiment of Evaluation Method), or may include all of them.

<延遲螢光材料、雷射振盪材料及雷射元件之設計方法> 本發明的延遲螢光材料、雷射振盪材料及雷射元件之設計方法的特徵為,使用了本發明之評價方法。 關於本發明之評價方法,能夠參閱上述<延遲螢光材料之評價方法>一欄的記載。 在本發明的延遲螢光材料之設計方法中,例如,對於分子設計之延遲螢光材料,能夠使用第1實施形態之評價方法來進行篩選。藉此,能夠從分子設計之延遲螢光材料群中容易地判別雷射振盪持續時間長的延遲螢光材料。 又,在本發明的延遲螢光材料之設計方法中,在第2實施形態之評價方法中,可以如具有在第2預測步驟中預測之「差量Δ大的延遲螢光材料」的化學結構、在第3預測步驟中預測之「滿足式(1)之延遲螢光材料」的化學結構般對延遲螢光材料進行分子設計。 又,本發明的雷射振盪材料及雷射元件之設計方法可以包括如下步驟:將在本發明的延遲螢光材料之設計方法中設計之延遲螢光材料用作雷射振盪材料。在雷射元件之設計方法中,除了雷射振盪材料以外的設計能夠參閱上述<雷射元件>一欄中所記載之結構來進行。 <Design methods for delayed fluorescent materials, laser oscillation materials and laser components> The characteristic of the design method of delayed fluorescent materials, laser oscillation materials and laser elements of the present invention is that the evaluation method of the present invention is used. Regarding the evaluation method of the present invention, please refer to the description in the above column "Evaluation Method of Delayed Fluorescent Material". In the method for designing delayed fluorescent materials of the present invention, for example, molecularly designed delayed fluorescent materials can be screened using the evaluation method of the first embodiment. Thereby, a delayed fluorescent material with a long laser oscillation duration can be easily identified from a molecularly designed delayed fluorescent material group. Furthermore, in the method for designing a delayed fluorescent material of the present invention, in the evaluation method of the second embodiment, it is possible to have a chemical structure of "a delayed fluorescent material with a large difference Δ" predicted in the second prediction step. , carry out molecular design of the delayed fluorescent material according to the chemical structure of the "delayed fluorescent material satisfying formula (1)" predicted in the third prediction step. Furthermore, the method for designing a laser oscillation material and a laser element of the present invention may include the following steps: using the delayed fluorescent material designed in the method for designing a delayed fluorescent material of the present invention as a laser oscillation material. In the design method of the laser element, the design other than the laser oscillation material can be carried out by referring to the structure described in the <Laser Element> column above.

<資料庫> 本發明的第1資料庫為累積了延遲螢光材料的化學結構與σ em、σ TT、k ISC、k RISC的關係之資料庫。 本發明的第2資料庫為累積了延遲螢光材料的化學結構與差量Δ的關係之資料庫。 本發明的第3資料庫為累積了滿足式(1)之延遲螢光材料的化學結構之資料庫。 關於延遲螢光材料的化學結構,能夠參閱上述(延遲螢光材料的化學結構)一欄的記載,關於式(1)及σ em、σ TT、k ISC、k RISC的定義,能夠參閱上述<延遲螢光材料>一欄的記載。關於差量Δ,能夠參閱上述(評價方法的第2實施形態)一欄的記載。 本發明的資料庫可以記錄於記錄媒體,以使電腦可讀取。記錄媒體可以為磁記錄媒體、光記錄媒體、半導體記憶體中的任一種,作為具體例,能夠舉出軟性磁碟、硬碟、光碟、磁光碟、CD-ROM(Read Only Memory:唯讀記憶體)、CD-R、DVD-ROM、磁帶、非易失性記憶卡、ROM、EEPROM、矽碟等。 <Database> The first database of the present invention is a database that accumulates relationships between the chemical structure of delayed fluorescent materials and σ em , σ TT , k ISC , and k RISC . The second database of the present invention is a database that accumulates the relationship between the chemical structure of the delayed fluorescent material and the difference Δ. The third database of the present invention is a database that accumulates chemical structures of delayed fluorescent materials that satisfy formula (1). For the chemical structure of the delayed fluorescent material, you can refer to the description in the above (Chemical Structure of the Delayed Fluorescent Material) column. For the definitions of formula (1) and σ em , σ TT , k ISC , k RISC , you can refer to the above < Delayed fluorescent materials> column. Regarding the difference Δ, refer to the description in the above (Second Embodiment of Evaluation Method) column. The database of the present invention can be recorded on a recording medium so that it can be read by a computer. The recording medium may be any of a magnetic recording medium, an optical recording medium, and a semiconductor memory. Specific examples include a flexible disk, a hard disk, an optical disk, a magneto-optical disk, and a CD-ROM (Read Only Memory). (body), CD-R, DVD-ROM, magnetic tape, non-volatile memory card, ROM, EEPROM, silicon disk, etc.

能夠利用本發明的資料庫來實施本發明之評價方法,能夠利用本發明的資料庫來實施本發明的延遲螢光材料、雷射振盪材料及雷射元件之設計方法。關於該等本發明的方法,能夠參閱上述<延遲螢光材料之評價方法>一欄的記載及<延遲螢光材料、雷射振盪材料及雷射元件之設計方法>一欄的記載。The database of the present invention can be used to implement the evaluation method of the present invention, and the database of the present invention can be used to implement the design method of delayed fluorescent materials, laser oscillation materials and laser elements of the present invention. Regarding the methods of the present invention, please refer to the descriptions in the column "Evaluation Methods of Delayed Fluorescent Materials" and the descriptions in the column "Design Methods of Delayed Fluorescent Materials, Laser Oscillation Materials and Laser Elements".

<程式(第1程式)> 本發明的程式(第1程式)為實施本發明之評價方法之程式。亦即,本發明的程式為用以使電腦執行本發明之評價方法所包括之各步驟之程式。 關於本發明之評價方法及其各步驟,能夠參閱上述<延遲螢光材料之評價方法>一欄的記載。 本發明的程式可以記錄於記錄媒體,以使電腦可讀取。關於記錄媒體的說明和具體例,能夠參閱上述<資料庫>一欄的相對應之記載。 <Program (1st program)> The program (first program) of the present invention is a program for implementing the evaluation method of the present invention. That is, the program of the present invention is a program for causing a computer to execute each step included in the evaluation method of the present invention. Regarding the evaluation method of the present invention and its respective steps, please refer to the description in the above column "Evaluation Method of Delayed Fluorescent Material". The program of the present invention can be recorded on a recording medium so that it can be read by a computer. For descriptions and specific examples of recording media, please refer to the corresponding records in the <Database> column above.

<縮短雷射動作的穩定狀態達到時間之方法> 本發明的方法為縮短雷射動作達到穩定狀態為止的時間之方法,並且包括如下步驟:將具有更高的k RISC且滿足式(1)之延遲螢光材料用於雷射元件。 關於滿足式(1)之延遲螢光材料及k RISC的定義,能夠參閱上述<延遲螢光材料>一欄的記載,關於雷射元件的結構,能夠參閱上述<雷射元件>一欄的記載。 本發明中的「雷射動作達到穩定狀態為止的時間」(以下為「雷射動作的穩定狀態達到時間」)係指,在雷射輸出的時間變化中,從鬆弛振盪收斂之時點到輸出成為恆定為止的時間。但是,在未觀測到鬆弛振盪之情形下,從開始雷射振盪之時點到輸出成為恆定為止的時間為「雷射動作的穩定狀態達到時間」。若將具有更高的k RISC且滿足式(1)之延遲螢光材料用於雷射元件,則穩定狀態達到時間縮短,雷射輸出提前達到穩定狀態,能夠實現穩定的雷射動作。 以下,藉由將DABNA-2用於延遲螢光材料模型之模擬來驗證可獲得這樣的效果。在下述結構式中,Ph表示苯基。DABNA-2的速度常數為k r=1.7x10 8(s -1)、k ISC=1x10 8(s -1)、k RISC=1x10 4(s -1)、σ em=9.1x10 -17(cm 2)、σ TT=0。 <Method of shortening the time until the laser operation reaches the stable state> The method of the present invention is a method of shortening the time until the laser operation reaches the stable state, and includes the following steps: converting a laser with a higher k RISC and satisfying the equation (1) Delayed fluorescent materials are used in laser components. For the definitions of delayed fluorescent materials and k RISC that satisfy equation (1), you can refer to the description in the above <Delayed fluorescent material> column. Regarding the structure of the laser element, you can refer to the description in the above <Laser element> column. . In the present invention, "the time until the laser operation reaches a stable state" (hereinafter referred to as "the time for the laser operation to reach a stable state") refers to the time from when the relaxation oscillation converges to when the output becomes time until constant. However, when relaxation oscillation is not observed, the time from the start of laser oscillation until the output becomes constant is the "stable state attainment time of the laser operation." If delayed fluorescent materials with higher k RISC and satisfying equation (1) are used in laser components, the time to reach the steady state is shortened, the laser output reaches the steady state in advance, and stable laser operation can be achieved. Below, it is verified that such an effect can be obtained by using DABNA-2 for the simulation of the delayed fluorescent material model. In the following structural formula, Ph represents a phenyl group. The velocity constants of DABNA-2 are k r =1.7x10 8 (s -1 ), k ISC =1x10 8 (s -1 ), k RISC =1x10 4 (s -1 ), σ em =9.1x10 -17 (cm 2 ), σ TT =0.

[化學式7] [Chemical Formula 7]

關於設定為k r=1.7x10 8(s -1)、k ISC=1x10 8(s -1),在5×10 3~1×10 9(s -1)的範圍內改變k RISC之情形和將k RISC改變為1×10 9(s -1)或1×10 9(s -1)之情形,將模擬了激發後的光子密度的時間變化之結果分別示於圖6及圖7中。又,將依據圖6的模擬結果求出之穩定狀態持續時間ω與k RISC的關係示於圖8中。在圖8中,虛線為標繪的配適曲線。藉由該配適曲線的歐拉法求出之速率方程式為y=1E×10x -1.231。 如圖8所示,得知穩定狀態達到時間ω隨著k RISC變大而變短,若k RISC成為1×10 7s -1以上,則ω大致成為0。又,由圖7還示出了,若k RISC成為1×10 9s -1以上,則鬆弛振盪顯著減小。依據該模擬結果確認到,藉由將具有更高的k RISC且滿足式(1)之延遲螢光材料用於雷射元件,雷射動作的穩定狀態達到時間短縮,雷射動作提前穩定化。 進而,確認到在本發明的方法中用於雷射元件之延遲螢光材料中,k RISC係1×10 7s -1以上為較佳,1×10 8s -1以上為更佳,1×10 9s -1以上為進一步較佳,滿足下述式(1a)亦為較佳。 Regarding the case where k r =1.7x10 8 (s -1 ) and k ISC =1x10 8 (s -1 ) are set, k RISC is changed within the range of 5×10 3 to 1×10 9 (s -1 ). When k RISC is changed to 1×10 9 (s -1 ) or 1×10 9 (s -1 ), the results of simulating the time change of the photon density after excitation are shown in Figures 6 and 7 respectively. In addition, the relationship between the steady state duration ω and k RISC calculated based on the simulation results in Figure 6 is shown in Figure 8 . In Figure 8, the dashed line is the plotted fit curve. The rate equation obtained by the Euler method of this fitting curve is y=1E×10x -1.231 . As shown in Fig. 8, it is found that the steady state reaching time ω becomes shorter as k RISC becomes larger, and when k RISC becomes 1×10 7 s -1 or more, ω becomes approximately 0. In addition, as shown in Fig. 7, when k RISC becomes 1×10 9 s -1 or more, the relaxation oscillation is significantly reduced. Based on the simulation results, it was confirmed that by using a delayed fluorescent material that has a higher k RISC and satisfies equation (1) for the laser element, the time for the laser operation to reach a stable state is shortened and the laser operation is stabilized in advance. Furthermore, it was confirmed that in the delayed fluorescent material used for the laser element in the method of the present invention, k RISC is preferably 1×10 7 s -1 or more, more preferably 1×10 8 s -1 or more, and 1 It is more preferable that it is ×10 9 s -1 or more, and it is also preferable that it satisfies the following formula (1a).

[數式11] 式(1a) k ISC:從激發單重態狀態到激發三重態狀態的系間穿越速度 k RISC:從激發三重態狀態到激發單重態狀態的逆系間穿越速度 [Formula 11] Formula (1a) k ISC : The intersystem crossing velocity from the excited singlet state to the excited triplet state k RISC : The inverse intersystem crossing velocity from the excited triplet state to the excited singlet state

<雷射動作的穩定狀態達到時間短的雷射元件之設計方法> 本發明的雷射元件之設計方法為雷射動作達到穩定狀態為止的時間(雷射動作的穩定狀態達到時間)短的雷射元件之設計方法,並且包括:依據延遲螢光材料的k RISC,從包括至少2個滿足下述式(1)之延遲螢光材料的群組中選擇1個延遲螢光材料之步驟(選擇步驟);及將所選擇之前述延遲螢光材料用於雷射元件之步驟(應用步驟)。 關於滿足式(1)之延遲螢光材料及k RISC的定義,能夠參閱上述<延遲螢光材料>一欄的記載,關於所設計之雷射元件的結構,能夠參閱上述<雷射元件>一欄的記載。 在本發明之設計方法中,在從包括滿足式(1)之延遲螢光材料的群組中選擇1個延遲螢光材料時,選擇構成群組之延遲螢光材料中的k RISC最高的延遲螢光材料為較佳。如上述<縮短雷射動作的穩定狀態達到時間之方法>一欄中所說明般,若將具有更高的k RISC且滿足式(1)之延遲螢光材料用於雷射元件,則雷射動作的穩定狀態達到時間短縮。因此,藉由將這樣選擇之延遲螢光材料用於雷射元件,能夠設計雷射動作的穩定狀態達到時間短,且雷射動作提前穩定化之雷射元件。 <Design method of laser element with short time to reach stable state of laser operation> The method of designing the laser element of the present invention is to shorten the time until the time of laser operation to reach stable state (the time to achieve stable state of laser operation). The design method of the emissive element, and includes: the step of selecting one delayed fluorescent material from a group including at least two delayed fluorescent materials that satisfy the following formula (1) according to the k RISC of the delayed fluorescent material (selecting Step); and the step of applying the selected delayed fluorescent material to the laser element (application step). For the definitions of delayed fluorescent materials and k RISC that satisfy equation (1), you can refer to the records in the <Delayed Fluorescent Materials> column above. For the structure of the designed laser element, you can refer to the <Laser Elements> column above. column records. In the design method of the present invention, when selecting a delayed fluorescent material from a group including delayed fluorescent materials that satisfy equation (1), the retardation with the highest k RISC among the delayed fluorescent materials constituting the group is selected. Fluorescent materials are preferred. As explained in the above column "Methods to shorten the stable state arrival time of laser operation", if a delayed fluorescent material with a higher k RISC and satisfying equation (1) is used for a laser element, the laser The time to reach the steady state of the action is shortened. Therefore, by using the delayed fluorescent material selected in this way for a laser element, it is possible to design a laser element that takes a short time to reach a stable state of the laser operation and stabilizes the laser operation in advance.

<程式(第2程式)> 本發明的程式(第2程式)為實施本發明的「縮短雷射動作達到穩定狀態為止的時間之方法」或本發明的「雷射動作達到穩定狀態為止的時間短的雷射元件之設計方法」之程式。亦即,本發明的程式為用以使電腦執行本發明之各方法所包括之各步驟之程式。 關於本發明的各方法及其各步驟,能夠分別參閱上述<縮短雷射動作的穩定狀態達到時間之方法>一欄的記載、上述<雷射動作的穩定狀態達到時間短的雷射元件之設計方法>一欄的記載。 本發明的程式可以記錄於記錄媒體,以使電腦可讀取。關於記錄媒體的說明和具體例,能夠參閱上述<資料庫>一欄的記載。 <Program (2nd program)> The program (second program) of the present invention is to implement the "method of shortening the time until the laser operation reaches the stable state" of the present invention or the "design method of the laser element with short time until the laser operation reaches the stable state" of the present invention. ” program. That is, the program of the present invention is a program used to cause a computer to execute each step included in each method of the present invention. Regarding each method and each step of the present invention, please refer to the description in the above column "Method to shorten the time to reach the steady state of the laser operation" and the above "Design of a laser element with a short time to reach the steady state of the laser operation". Record in the Method> column. The program of the present invention can be recorded on a recording medium so that it can be read by a computer. For descriptions and specific examples of recording media, please refer to the description in the <Database> column above.

<本發明的變形例> 另外,還能夠使用下述式(3)~式(6)中的至少1個來代替式(1)或式(2)。 <Modifications of the present invention> In addition, at least one of the following formulas (3) to (6) can be used instead of formula (1) or formula (2).

[數式12] 式(3) σ em(誘導發射截面積)>σ TT(激發三重態狀態的吸收截面積) [Formula 12] Formula (3) σ em (induced emission cross-sectional area) > σ TT (absorption cross-sectional area of the excited triplet state)

[數式13] 式(4) k RISC(從激發三重態狀態到激發單重態狀態的逆系間穿越速度)>k ISC(從激發單重態狀態到激發三重態狀態的系間穿越速度) [Formula 13] Formula (4) k RISC (Inverse intersystem crossing speed from excited triplet state to excited singlet state) > k ISC (Intersystem crossing speed from excited singlet state to excited triplet state)

[數式14] 式(5) Δ=σ em(誘導發射截面積)>σ TT(激發三重態狀態的吸收截面積) [Formula 14] Formula (5) Δ=σ em (induced emission cross-sectional area) >σ TT (absorption cross-sectional area of the excited triplet state)

[數式15] 式(6) Δ=k RISC(從激發三重態狀態到激發單重態狀態的逆系間穿越速度)>k ISC(從激發單重態狀態到激發三重態狀態的系間穿越速度) [Equation 15] Formula (6) Δ=k RISC (Inverse intersystem crossing speed from excited triplet state to excited singlet state) > k ISC (Intersystem crossing speed from excited singlet state to excited triplet state) )

又,還能夠適當組合式(3)~式(6)。 又,還能夠使用分別組合構成式(1)~式(6)之「σ em(誘導發射截面積)」「σ TT(激發三重態狀態的吸收截面積)」「k RISC(從激發三重態狀態到激發單重態狀態的逆系間穿越速度)「k ISC(從激發單重態狀態到激發三重態狀態的系間穿越速度)」「Δ」而成之式。 Furthermore, equations (3) to (6) can also be combined appropriately. Furthermore, "σ em (induced emission cross-sectional area)", "σ TT (absorption cross-sectional area of the excited triplet state)" and "k RISC (from the excited triplet state)" that constitute formulas (1) to (6) can also be used. The inverse intersystem crossing speed from the excited singlet state to the excited singlet state) "k ISC (the intersystem crossing speed from the excited singlet state to the excited triplet state)""Δ".

[產業上之可利用性] 本發明的滿足式(1)之延遲螢光材料作為雷射振盪材料有用。藉由使用本發明的延遲螢光材料,能夠實現雷射振盪的持續時間長的雷射元件。又,利用其關係式,還能夠進行延遲螢光材料的篩選、分子設計、雷射元件的設計。因此,本發明的產業上之可利用性高。 [Industrial availability] The delayed fluorescent material satisfying formula (1) of the present invention is useful as a laser oscillation material. By using the delayed fluorescent material of the present invention, a laser element with a long duration of laser oscillation can be realized. Furthermore, by utilizing this relational expression, screening of delayed fluorescent materials, molecular design, and laser element design can also be performed. Therefore, the present invention has high industrial applicability.

圖1係表示CBP及TPA-BCm的化學結構、其能階圖及能量轉移製程之圖。 圖2係模擬CBP-TADF元件模型的系間穿越效率(Φ ISC)和誘導發射效率(Φ Stim)的時間變化而獲得之曲線圖,圖2(a)係將激發光強度設定為5kWcm −2而求出之各效率的時間變化,圖2(b)係將激發光強度設定為10kWcm −2而求出之各效率的時間變化。 圖3係模擬CBP-TADF元件模型雷射特性而獲得之曲線圖,圖3(a)係相對於激發光強度之發光強度的標繪圖和其配適線,圖3(b)係將k RISC設定為1.0×10 8s -1時的增益係數的時間變化,圖3(c)係將k RISC設定為1.0×10 4s -1、1.0×10 7s -1及1.0×10 8s -1時的增益係數的時間變化。 圖4係表示TPA-BCm的σ em及σ TT的波長依賴性之曲線圖。 圖5係表示對於6重量%TPA-BCm摻雜CBP膜以6W/cm 2、31W/cm 2及57W/cm 2的各激發光強度測量之瞬態PL曲線(實線)和其配適曲線(虛線)之曲線圖。 圖6係表示將k r設定為1.7x10 8(s -1)、將k ISC設定為1x10 8(s -1),將k RISC設定在5×10 3~1×10 9(s -1)的範圍內,模擬激發後的光子密度的時間變化而獲得之曲線圖。 圖7係表示將k r設定為1.7x10 8(s -1)、將k ISC設定為1x10 8(s -1),將k RISC設定為1×10 9或1×10 9(s -1),模擬激發後的光子密度的時間變化而獲得之曲線圖。 圖8係表示依據圖6的模擬結果求出之穩定狀態持續時間ω與k RISC的關係之曲線圖。 Figure 1 is a diagram showing the chemical structures, energy level diagrams and energy transfer processes of CBP and TPA-BCm. Figure 2 is a graph obtained by simulating the time changes of the intersystem crossing efficiency (Φ ISC ) and induced emission efficiency (Φ Stim ) of the CBP-TADF element model. Figure 2 (a) sets the excitation light intensity to 5kWcm −2 As for the time change of each efficiency calculated, Figure 2(b) shows the time change of each efficiency calculated by setting the excitation light intensity to 10kWcm −2 . Figure 3 is a graph obtained by simulating the laser characteristics of the CBP-TADF element model. Figure 3 (a) is a plot of the luminous intensity relative to the excitation light intensity and its fitting line. Figure 3 (b) is a k RISC Time changes of the gain coefficient when set to 1.0×10 8 s -1 . Figure 3(c) shows k RISC set to 1.0×10 4 s -1 , 1.0×10 7 s -1 and 1.0×10 8 s - Time variation of the gain coefficient at 1 . FIG. 4 is a graph showing the wavelength dependence of σ em and σ TT of TPA-BCm. Figure 5 shows the transient PL curve (solid line) and its fitting curve measured at various excitation light intensities of 6W/cm 2 , 31W/cm 2 and 57W/cm 2 for a 6 wt% TPA-BCm doped CBP film. (dashed line) graph. Figure 6 shows that k r is set to 1.7x10 8 (s -1 ), k ISC is set to 1x10 8 (s -1 ), and k RISC is set to 5×10 3 to 1×10 9 (s -1 ). Within the range, the curve obtained by simulating the time change of photon density after excitation. Figure 7 shows that k r is set to 1.7x10 8 (s -1 ), k ISC is set to 1x10 8 (s -1 ), and k RISC is set to 1×10 9 or 1×10 9 (s -1 ). , a curve obtained by simulating the time change of photon density after excitation. FIG. 8 is a graph showing the relationship between the steady state duration ω and k RISC calculated based on the simulation results in FIG. 6 .

Claims (45)

一種延遲螢光材料,其滿足下述式(1), [數式1] 式(1) σ em :誘導發射截面積 σ TT :激發三重態狀態的吸收截面積 k ISC:從激發單重態狀態到激發三重態狀態的系間穿越速度 k RISC:從激發三重態狀態到激發單重態狀態的逆系間穿越速度。 A delayed fluorescent material that satisfies the following formula (1), [Formula 1] Formula (1) σ em : Induced emission cross-sectional area σ TT : Absorption cross-sectional area k of the excited triplet state ISC : Intersystem crossing speed k from the excited singlet state to the excited triplet state RISC : From the excited triplet state to the excited singlet state Inverse intersystem crossing speed. 如請求項1所述之延遲螢光材料,其中 最低激發單重態狀態與77K的最低激發三重態狀態的能量差ΔE ST為0.3eV以下。 The delayed fluorescent material as described in claim 1, wherein the energy difference ΔE ST between the lowest excited singlet state and the lowest excited triplet state at 77K is less than 0.3 eV. 如請求項1所述之延遲螢光材料,其中 最低激發單重態狀態與77K的最低激發三重態狀態的能量差ΔE ST為0.2eV以下。 The delayed fluorescent material as described in claim 1, wherein the energy difference ΔE ST between the lowest excited singlet state and the lowest excited triplet state at 77K is less than 0.2 eV. 如請求項1所述之延遲螢光材料,其中 最低激發單重態狀態與77K的最低激發三重態狀態的能量差ΔE ST為0.1eV以下。 The delayed fluorescent material as described in claim 1, wherein the energy difference ΔE ST between the lowest excited singlet state and the lowest excited triplet state at 77K is less than 0.1 eV. 如請求項1所述之延遲螢光材料,其中 k RISC為1×10 6sec -1以上。 The delayed fluorescent material as described in claim 1, wherein k RISC is 1×10 6 sec -1 or more. 如請求項1所述之延遲螢光材料,其中 k RISC為1×10 7s -1以上。 The delayed fluorescent material as described in claim 1, wherein k RISC is 1×10 7 s -1 or more. 如請求項1所述之延遲螢光材料,其僅由選自包括碳原子、氫原子、氮原子、氧原子、硫原子、硼原子、矽原子、磷原子及氟原子的群組中之原子構成。The delayed fluorescent material of claim 1, which is composed only of atoms selected from the group consisting of carbon atoms, hydrogen atoms, nitrogen atoms, oxygen atoms, sulfur atoms, boron atoms, silicon atoms, phosphorus atoms and fluorine atoms. composition. 如請求項1所述之延遲螢光材料,其具備具有多重共振效果之含硼多環芳香族骨架。The delayed fluorescent material described in claim 1 has a boron-containing polycyclic aromatic skeleton with multiple resonance effects. 如請求項1所述之延遲螢光材料,其具有施體性基和受體性基。The delayed fluorescent material according to claim 1, which has a donor group and an acceptor group. 一種雷射振盪材料,其含有請求項1至請求項9之任一項所述之延遲螢光材料。A laser oscillation material containing the delayed fluorescent material described in any one of claim 1 to claim 9. 一種雷射元件,其使用了請求項1至請求項9之任一項所述之延遲螢光材料。A laser element using the delayed fluorescent material according to any one of claims 1 to 9. 如請求項11所述之雷射元件,其係電流驅動型。The laser element according to claim 11, which is a current driven type. 如請求項11所述之雷射元件,其係固態雷射元件。The laser component as described in claim 11 is a solid-state laser component. 一種延遲螢光材料之評價方法,其包括如下步驟:測量延遲螢光材料的σ em、σ TT、k ISC、k RISCAn evaluation method for delayed fluorescent materials, which includes the following steps: measuring σ em , σ TT , k ISC , and k RISC of the delayed fluorescent materials. 如請求項14所述之延遲螢光材料之評價方法,其包括如下步驟:測量延遲螢光材料的σ em、σ TT、k ISC、k RISC,判定是否滿足前述式(1)。 The evaluation method of delayed fluorescent material as described in claim 14, which includes the following steps: measuring σ em , σ TT , k ISC , and k RISC of the delayed fluorescent material, and determining whether the aforementioned formula (1) is satisfied. 如請求項15所述之延遲螢光材料之評價方法,其中 在滿足前述式(1)之情形下,評價為作為雷射振盪材料有用。 The evaluation method for delayed fluorescent materials as described in claim 15, wherein When the above formula (1) is satisfied, it is evaluated that it is useful as a laser oscillation material. 如請求項15所述之延遲螢光材料之評價方法,其中 分選滿足前述式(1)之延遲螢光材料。 The evaluation method for delayed fluorescent materials as described in claim 15, wherein Sort delayed fluorescent materials that satisfy the aforementioned formula (1). 如請求項14所述之延遲螢光材料之評價方法,其包括如下步驟:測量延遲螢光材料的σ em、σ TT、k ISC、k RISC,計算由下述式(2)表示的差量Δ, [數式2] 式(2) The evaluation method of delayed fluorescent material as described in claim 14, which includes the following steps: measuring σ em , σ TT , k ISC , and k RISC of the delayed fluorescent material, and calculating the difference represented by the following formula (2) Δ, [Formula 2] Formula (2) . 如請求項18所述之延遲螢光材料之評價方法,其中 對前述差量Δ大者進行高度評價。 The evaluation method for delayed fluorescent materials as described in claim 18, wherein Those with a large difference Δ are highly evaluated. 如請求項18所述之延遲螢光材料之評價方法,其中 累積延遲螢光材料的化學結構與差量Δ的關係。 The evaluation method for delayed fluorescent materials as described in claim 18, wherein The relationship between the chemical structure of the cumulative delayed fluorescent material and the difference Δ. 如請求項20所述之延遲螢光材料之評價方法,其中 利用所累積之前述關係來預測新的延遲螢光材料的化學結構與差量Δ的關係。 The evaluation method for delayed fluorescent materials as described in claim 20, wherein The relationship between the chemical structure of the new delayed fluorescent material and the difference Δ is predicted using the accumulated aforementioned relationships. 如請求項20所述之延遲螢光材料之評價方法,其中 利用所累積之前述關係來預測差量Δ大的延遲螢光材料的化學結構。 The evaluation method for delayed fluorescent materials as described in claim 20, wherein The accumulated aforementioned relationships are used to predict the chemical structure of the delayed fluorescent material with a large difference Δ. 如請求項20所述之延遲螢光材料之評價方法,其中 利用所累積之前述關係來預測滿足前述式(1)之延遲螢光材料的化學結構。 The evaluation method for delayed fluorescent materials as described in claim 20, wherein The chemical structure of the delayed fluorescent material satisfying the aforementioned formula (1) is predicted using the accumulated aforementioned relationships. 如請求項21所述之延遲螢光材料之評價方法,其中 成為前述累積對象的延遲螢光材料為具有共同的特定的部分結構之延遲螢光材料群。 The evaluation method for delayed fluorescent materials as described in claim 21, wherein The delayed fluorescent materials to be accumulated are a group of delayed fluorescent materials having a common specific partial structure. 如請求項21所述之延遲螢光材料之評價方法,其中 成為前述累積對象的延遲螢光材料為具有特定的施體性基之延遲螢光材料群。 The evaluation method for delayed fluorescent materials as described in claim 21, wherein The delayed fluorescent materials to be accumulated are a group of delayed fluorescent materials having a specific donor group. 如請求項21所述之延遲螢光材料之評價方法,其中 成為前述累積對象的延遲螢光材料為具有特定的受體性基之延遲螢光材料群。 The evaluation method for delayed fluorescent materials as described in claim 21, wherein The delayed fluorescent materials to be accumulated are a group of delayed fluorescent materials having a specific acceptor group. 如請求項21所述之延遲螢光材料之評價方法,其中 成為前述累積對象的延遲螢光材料為具備具有多重共振效果之含硼多環芳香族骨架之延遲螢光材料群。 The evaluation method for delayed fluorescent materials as described in claim 21, wherein The delayed fluorescent materials targeted for accumulation are a group of delayed fluorescent materials having a boron-containing polycyclic aromatic skeleton with multiple resonance effects. 一種延遲螢光材料之設計方法,其使用了請求項14至請求項27之任一項所述之評價方法。A method for designing delayed fluorescent materials using the evaluation method described in any one of claims 14 to 27. 一種雷射振盪材料之設計方法,其使用了請求項14至請求項27之任一項所述之評價方法。A method for designing a laser oscillation material using the evaluation method described in any one of claims 14 to 27. 一種雷射元件之設計方法,其使用了請求項14至請求項27之任一項所述之評價方法。A method for designing a laser element using the evaluation method described in any one of claims 14 to 27. 一種資料庫,其累積了延遲螢光材料的化學結構與σ em、σ TT、k ISC、k RISC的關係。 A database that accumulates the relationship between the chemical structure of delayed fluorescent materials and σ em , σ TT , k ISC , and k RISC . 一種資料庫,其累積了請求項20所述之延遲螢光材料的化學結構與差量Δ的關係。A database that accumulates the relationship between the chemical structure of the delayed fluorescent material described in claim 20 and the difference Δ. 一種資料庫,其累積了滿足前述式(1)之延遲螢光材料的化學結構。A database that accumulates chemical structures of delayed fluorescent materials that satisfy the aforementioned formula (1). 一種延遲螢光材料之評價方法,其使用請求項31至請求項33之任一項所述之資料庫,實施請求項14至請求項27之任一項所述之評價方法。An evaluation method for delayed fluorescent materials, which uses the database described in any one of claims 31 to 33 and implements the evaluation method described in any one of claims 14 to 27. 一種延遲螢光材料之設計方法,其利用請求項31至請求項33之任一項所述之資料庫。A method for designing delayed fluorescent materials, which utilizes the database described in any one of claims 31 to 33. 一種雷射振盪材料之設計方法,其利用請求項31至請求項33之任一項所述之資料庫。A method for designing laser oscillation materials, which uses the database described in any one of claims 31 to 33. 一種雷射元件之設計方法,其利用請求項31至請求項33之任一項所述之資料庫。A method for designing a laser component using the database described in any one of claims 31 to 33. 一種程式,其實施請求項21至請求項27之任一項所述之評價方法。A program that implements the evaluation method described in any one of claims 21 to 27. 一種方法,其係縮短雷射動作達到穩定狀態為止的時間之方法,其包括如下步驟: 將具有更高的k RISC且滿足下述式(1)之延遲螢光材料用於雷射元件, [數式3] 式(1) σ em :誘導發射截面積 σ TT :激發三重態狀態的吸收截面積 k ISC:從激發單重態狀態到激發三重態狀態的系間穿越速度 k RISC:從激發三重態狀態到激發單重態狀態的逆系間穿越速度。 [ Formula 3] Formula (1) σ em : Induced emission cross-sectional area σ TT : Absorption cross-sectional area k of the excited triplet state ISC : Intersystem crossing speed k from the excited singlet state to the excited triplet state RISC : From the excited triplet state to the excited singlet state Inverse intersystem crossing speed. 如請求項39所述之方法,其中 用於雷射元件之延遲螢光材料的k RISC為1×10 7s -1以上。 The method of claim 39, wherein the k RISC of the delayed fluorescent material used for the laser element is 1×10 7 s -1 or more. 如請求項39所述之方法,其中 用於雷射元件之延遲螢光材料的k RISC為1×10 8s -1以上。 The method of claim 39, wherein the k RISC of the delayed fluorescent material used for the laser element is 1×10 8 s -1 or more. 如請求項39所述之方法,其中 用於雷射元件之延遲螢光材料進一步滿足下述式(1a), [數式4] 式(1a) k ISC:從激發單重態狀態到激發三重態狀態的系間穿越速度 k RISC:從激發三重態狀態到激發單重態狀態的逆系間穿越速度。 The method according to claim 39, wherein the delayed fluorescent material used for the laser element further satisfies the following formula (1a), [Formula 4] Formula (1a) k ISC : The intersystem crossing speed from the excited singlet state to the excited triplet state k RISC : The inverse intersystem crossing speed from the excited triplet state to the excited singlet state. 一種方法,其係雷射動作達到穩定狀態為止的時間短的雷射元件之設計方法,其包括如下步驟: 依據延遲螢光材料的k RISC,從包括至少2個滿足下述式(1)之延遲螢光材料的群組中選擇1個延遲螢光材料;及 將所選擇之前述延遲螢光材料用於雷射元件, [數式5] 式(1) σ em :誘導發射截面積 σ TT :激發三重態狀態的吸收截面積 k ISC:從激發單重態狀態到激發三重態狀態的系間穿越速度 k RISC:從激發三重態狀態到激發單重態狀態的逆系間穿越速度。 A method for designing a laser element with a short time until the laser action reaches a stable state, which includes the following steps: Based on the k RISC of the delayed fluorescent material, from including at least 2 elements that satisfy the following formula (1) Select one delayed fluorescent material from the group of delayed fluorescent materials; and use the selected delayed fluorescent material for the laser element, [Formula 5] Formula (1) σ em : Induced emission cross-sectional area σ TT : Absorption cross-sectional area k of the excited triplet state ISC : Intersystem crossing speed k from the excited singlet state to the excited triplet state RISC : From the excited triplet state to the excited singlet state Inverse intersystem crossing speed. 如請求項43所述之方法,其中 在從前述群組中選擇1個延遲螢光材料時,選擇k RISC最高的延遲螢光材料。 The method of claim 43, wherein when selecting a delayed fluorescent material from the aforementioned group, the delayed fluorescent material with the highest k RISC is selected. 一種程式,其實施請求項39至請求項44之任一項所述之方法。A program that implements the method described in any one of claims 39 to 44.
TW111143948A 2021-12-02 2022-11-17 Delayed fluorescence material, laser oscillation material, and laser element TW202340422A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-196028 2021-12-02
JP2021196028 2021-12-02

Publications (1)

Publication Number Publication Date
TW202340422A true TW202340422A (en) 2023-10-16

Family

ID=86612142

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111143948A TW202340422A (en) 2021-12-02 2022-11-17 Delayed fluorescence material, laser oscillation material, and laser element

Country Status (2)

Country Link
TW (1) TW202340422A (en)
WO (1) WO2023100678A1 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI636056B (en) * 2014-02-18 2018-09-21 學校法人關西學院 Polycyclic aromatic compound and method for production the same, material for organic device and application thereof

Also Published As

Publication number Publication date
WO2023100678A1 (en) 2023-06-08

Similar Documents

Publication Publication Date Title
Ye et al. Near-infrared electroluminescence and low threshold amplified spontaneous emission above 800 nm from a thermally activated delayed fluorescent emitter
Jiang et al. Organic solid-state lasers: A materials view and future development
Cai et al. Purely organic crystals exhibit bright thermally activated delayed fluorescence
Jiang et al. Synthesis, Two‐Photon Absorption and Optical Limiting Properties of Multi‐branched Styryl Derivatives Based on 1, 3, 5‐Triazine
Wang et al. Cyano‐Substituted Oligo (p‐phenylene vinylene) Single Crystals: A Promising Laser Material
Laquai et al. Excitation energy transfer in organic materials: From fundamentals to optoelectronic devices
JP6482782B2 (en) Organic light emitting device
KR20160035062A (en) Compound, light-emitting material, and organic light-emitting element
WO2014189122A1 (en) Compound, light-emitting material, and organic light-emitting element
Christogiannis et al. Characterizing the electroluminescence emission from a strongly coupled organic semiconductor microcavity LED
KR20150016242A (en) Light-emitting material and organic light-emitting element
Stavrou et al. Emission and Absorption Tuning in TADF B, N‐Doped Heptacenes: Toward Ideal‐Blue Hyperfluorescent OLEDs
KR20150050570A (en) Light emitting material, compound and organic light emitting element using light emitting material
TW201815761A (en) Organic light-emitting element, and light-emitting material and compound for use therein
CN110582905B (en) Organic semiconductor laser element
Vembris et al. Stimulated emission and optical properties of pyranyliden fragment containing compounds in PVK matrix
Chen et al. Highly Efficient Purely Organic Phosphorescence Light‐Emitting Diodes Employing a Donor–Acceptor Skeleton with a Phenoxaselenine Donor
Rajamalli et al. Planar and Rigid Pyrazine‐Based TADF Emitter for Deep Blue Bright Organic Light‐Emitting Diodes
Abe et al. Numerical study of triplet dynamics in organic semiconductors aimed for the active utilization of triplets by TADF under continuous-wave lasing
Jang et al. Hybridized Local and Charge-Transfer Excited-State Emitter for a Blue Organic Solid-State Laser
Ledos et al. Tuning the Charge Transfer in λ5-Phosphinines with Amino Substituents
TW201815758A (en) Organic light-emitting element, and luminescent material and compound used therefor
TW202340422A (en) Delayed fluorescence material, laser oscillation material, and laser element
Su et al. “H-Type” Like Constructed Dimer: Another Way to Enhance the Thermally Activated Delayed Fluorescence Effect
Zhao et al. Excitonic Creation of Highly Luminescent Defects In Situ in Working Organic Light‐Emitting Diodes