TW202336025A - Surface treatment agent - Google Patents

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TW202336025A
TW202336025A TW111139883A TW111139883A TW202336025A TW 202336025 A TW202336025 A TW 202336025A TW 111139883 A TW111139883 A TW 111139883A TW 111139883 A TW111139883 A TW 111139883A TW 202336025 A TW202336025 A TW 202336025A
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丸橋和希
三橋尚志
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日商大金工業股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02Silicon compounds
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    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32Polymers modified by chemical after-treatment
    • C08G65/329Polymers modified by chemical after-treatment with organic compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C08G65/48Polymers modified by chemical after-treatment
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/16Antifouling paints; Underwater paints
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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    • C09K3/18Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces

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Abstract

The present invention provides a compound represented by the following formula (1) (wherein each symbol has the same meaning as described in the specification). R<SP>b</SP>2N-R<SP>d</SP>-CO-(R<SP>F2</SP>-CO-NR<SP>c</SP>-R<SP>a</SP>(R<SP>Ac</SP>m)-NR<SP>c</SP>-CO)x-R<SP>F2</SP>-CO-R<SP>d</SP>-NR<SP>b</SP>2 (1).

Description

表面處理劑 surface treatment agent

本揭示係關於新穎的含氟聚醚基之丙烯酸化合物、以及含有該化合物之表面處理劑。 The present disclosure relates to novel fluoropolyether-based acrylic compounds and surface treatment agents containing the compounds.

某種含氟聚醚基之矽烷化合物已知於使用在基板的表面處理時,可提供優異的撥水性、撥油性、防污性等。從含有含氟聚醚基之矽烷化合物的表面處理劑所得到的層(以下亦稱為「表面處理層」),係作為所謂的功能性薄膜而被施用於例如玻璃、塑膠、纖維、衛生用品、建築資材等各式各樣的基材上(專利文獻1)。 Certain fluoropolyether-based silane compounds are known to provide excellent water repellency, oil repellency, antifouling properties, etc. when used in surface treatment of substrates. A layer obtained from a surface treatment agent containing a silane compound containing a fluoropolyether group (hereinafter also referred to as a "surface treatment layer") is applied as a so-called functional film to, for example, glass, plastics, fibers, and sanitary products. , building materials and other various base materials (Patent Document 1).

[先前技術文獻] [Prior technical literature]

[專利文獻] [Patent Document]

[專利文獻1]日本特開2003-238577號公報 [Patent Document 1] Japanese Patent Application Publication No. 2003-238577

專利文獻1所記載之含氟聚醚基之矽烷化合物雖可賦予具有優異功能之表面處理層,惟仍謀求具有更高的耐久性之表面處理層。 Although the fluoropolyether group-containing silane compound described in Patent Document 1 can provide a surface treatment layer with excellent functions, there is still a need for a surface treatment layer with higher durability.

本揭示之目的係提供一種可提供耐久性優異之表面處理層的含氟聚醚基化合物。 An object of the present disclosure is to provide a fluorine-containing polyether-based compound that can provide a surface treatment layer with excellent durability.

本揭示係包含下列態樣。 This disclosure includes the following aspects.

[1]一種化合物,係下述式(1)所表示者, [1] A compound represented by the following formula (1),

Rb 2N-Rd-CO-(RF2-CO-NRc-Ra(RAc m)-NRc-CO)x-RF2-CO-Rd-NRb 2 (1) R b 2 NR d -CO-(R F2 -CO-NR c -R a (R Ac m )-NR c -CO) x -R F2 -CO-R d -NR b 2 (1)

式中, In the formula,

RF2分別獨立地為-Rf2 p-RF-Oq-, R F2 are independently -Rf 2 p -R F -O q -,

Rf2為可經1個以上的氟原子取代之C1-6伸烷基, Rf 2 is a C 1-6 alkylene group which may be substituted by more than one fluorine atom,

RF為二價氟聚醚基, R F is a divalent fluoropolyether group,

p為0或1, p is 0 or 1,

q為0或1, q is 0 or 1,

Ra分別獨立地為(m+2)價有機基, R a are independently (m+2)-valent organic groups,

m為1至4的整數, m is an integer from 1 to 4,

Rb分別獨立地為RSi、RAc或RcR b is independently R Si , R Ac or R c ,

RSi分別獨立地為-XC-SiR1 n’R2 3-n’R Si are independently -X C -SiR 1 n' R 2 3-n' ,

XC為碳數1至10的二價有機基, X C is a divalent organic group with 1 to 10 carbon atoms,

R1分別獨立地為羥基或水解性基, R 1 are each independently a hydroxyl group or a hydrolyzable group,

R2分別獨立地為氫原子或一價有機基, R 2 is independently a hydrogen atom or a monovalent organic group,

n’為1至3的整數, n’ is an integer from 1 to 3,

RAc分別獨立地為-XD-XE(-XF-OCO-CR5=CH2)m’R Ac are each independently -X D -X E (-X F -OCO-CR 5 =CH 2 ) m' ,

XD為二價有機基, X D is a divalent organic radical,

XE為單鍵或(m’+1)價基, X E is a single bond or (m'+1) valence base,

XF分別獨立地為碳數1至10的二價有機基, X F are each independently a divalent organic group having 1 to 10 carbon atoms,

R5為氫原子或碳數1至8的一價有機基, R 5 is a hydrogen atom or a monovalent organic group with 1 to 8 carbon atoms,

m’為1至10的整數, m’ is an integer from 1 to 10,

Rc分別獨立地為氫原子或C1-6烷基, R c are each independently a hydrogen atom or a C 1-6 alkyl group,

Rd分別獨立地為單鍵或二價有機基, R d are independently single bonds or divalent organic groups,

x為1以上的整數。 x is an integer above 1.

[2]如上述[1]所述之化合物,其中,RF分別獨立地為下式所表示之基, [2] The compound as described in the above [1], wherein R F are each independently a group represented by the following formula,

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3RFa 6)d-(OC2F4)e-(OCF2)f- -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 R Fa 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f -

式中,RFa分別獨立地為氫原子、氟原子或氯原子, In the formula, R Fa are independently a hydrogen atom, a fluorine atom or a chlorine atom,

a、b、c、d、e及f分別獨立地為0至200的整數,a、b、c、d、e及f之和為1以上,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意,惟於所有的RFa皆為氫原子或氯原子時,a、b、c、e及f的至少1個為1以上。 a, b, c, d, e and f are each independently an integer from 0 to 200. The sum of a, b, c, d, e and f is more than 1. Mark a, b, c, d, e or f The order of existence of each repeating unit enclosed in parentheses is arbitrary in the formula, but when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is 1 or more.

[3]如上述[1]或[2]所述之化合物,其中,RFa為氟原子。 [3] The compound according to [1] or [2] above, wherein R Fa is a fluorine atom.

[4]如上述[1]至[3]中任一項所述之化合物,其中,RF分別獨立地為下述式(f1)、(f2)、(f3)、(f4)、(f5)或(f6)所表示之基, [4] The compound according to any one of the above [1] to [3], wherein R F is each independently the following formula (f1), (f2), (f3), (f4), (f5) ) or the basis represented by (f6),

-(OC3F6)d-(OC2F4)e- (f1) -(OC 3 F 6 ) d -(OC 2 F 4 ) e - (f1)

式中,d為1至200的整數,e為0至2的整數,標註下標d或e並以括弧括起之各重複單元的存在順序於式中為任意; In the formula, d is an integer from 1 to 200, and e is an integer from 0 to 2. The order of existence of each repeating unit marked with the subscript d or e and enclosed in brackets is arbitrary in the formula;

-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f2) -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f2)

式中,c及d分別獨立地為0至30的整數, In the formula, c and d are independently integers from 0 to 30,

e及f分別獨立地為1至200的整數, e and f are independently integers from 1 to 200,

c、d、e及f之和為10至200的整數, The sum of c, d, e and f is an integer from 10 to 200,

標註下標c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; The order of existence of each repeating unit marked with the subscript c, d, e or f and enclosed in parentheses is arbitrary in the formula;

-(R6-R7)g-R9- (f3) -(R 6 -R 7 ) g -R 9 - (f3)

式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 ,

R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基,或為選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of 2 or 3 groups selected from these groups,

R9為單鍵,或為選自OCF2、OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基, R 9 is a single bond, or a group selected from OCF 2 , OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 ,

g為2至100的整數; g is an integer from 2 to 100;

-(R6-R7)g-Rr-(R7’-R6’)g’- (f4) -(R 6 -R 7 ) g -R r -(R 7' -R 6' ) g' - (f4)

式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 ,

R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基,或為獨立地選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of 2 or 3 groups independently selected from these groups,

R6’為OCF2或OC2F4R 6' is OCF 2 or OC 2 F 4 ,

R7’為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基,或為獨立地選自此等基之2或3個基的組合, R 7' is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of 2 or 3 groups independently selected from these groups. ,

g為2至100的整數, g is an integer from 2 to 100,

g’為2至100的整數, g’ is an integer from 2 to 100,

Rr為如下列化學式所示者, R r is as shown in the following chemical formula,

Figure 111139883-A0202-12-0005-2
Figure 111139883-A0202-12-0005-2

式中,*表示鍵結位置; In the formula, * represents the bonding position;

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f5) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f5)

式中,e為1以上200以下的整數,a、b、c、d及f分別獨立地為0以上200以下的整數,a、b、c、d、e及f之和至少為1,再者,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意, In the formula, e is an integer from 1 to 200, a, b, c, d and f are each independently an integer from 0 to 200, the sum of a, b, c, d, e and f is at least 1, and then Or, the order of existence of each repeating unit marked a, b, c, d, e or f and enclosed in parentheses is arbitrary in the formula,

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f6) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f6)

式中,f為1以上200以下的整數,a、b、c、d及e分別獨立地為0以上200以下的整數,a、b、c、d、e及f之和至少為1,再者,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意。 In the formula, f is an integer from 1 to 200, a, b, c, d and e are each independently an integer from 0 to 200, the sum of a, b, c, d, e and f is at least 1, and then Otherwise, the order of existence of each repeating unit marked a, b, c, d, e or f and enclosed in parentheses is arbitrary in the formula.

[5]如上述[1]至[4]中任一項所述之化合物,其中,RF2分別獨立地為C1-6全氟伸烷基。 [5] The compound according to any one of the above [1] to [4], wherein RF2 is each independently a C 1-6 perfluoroalkylene group.

[6]如上述[1]至[5]中任一項所述之化合物,其中,Ra分別獨立地為下述式所表示之基, [6] The compound according to any one of the above [1] to [5], wherein R a is each independently a group represented by the following formula,

-R9-(Ra’-R9)k- -R 9 -(R a '-R 9 ) k -

式中, In the formula,

R9分別獨立地為C1-6伸烷基, R 9 are each independently C 1-6 alkylene group,

Ra’分別獨立地為3價有機基, R a' are each independently a trivalent organic group,

k為1至4的整數。 k is an integer from 1 to 4.

[7]如上述[6]所述之化合物,其中,Ra’分別獨立地為含有N原子或O原子之3價有機基。 [7] The compound according to the above [6], wherein R a' is each independently a trivalent organic group containing an N atom or an O atom.

[8]如上述[6]所述之化合物,其中,Ra’分別獨立地為可於碳-碳原子間含有胺基鍵、醯胺鍵、胺基甲酸酯鍵、脲鍵、醚鍵或酯鍵之3價有機基。 [8] The compound as described in the above [6], wherein R a' can independently contain an amine bond, an amide bond, a urethane bond, a urea bond, or an ether bond between carbon-carbon atoms. Or the 3-valent organic group of the ester bond.

[9]如上述[6]至[8]中任一項所述之化合物,其中,Ra’分別獨立地為下述基, [9] The compound according to any one of the above [6] to [8], wherein R a' is each independently the following group,

Figure 111139883-A0202-12-0006-3
Figure 111139883-A0202-12-0006-3

式中,R8為氫原子或C1-6烷基。 In the formula, R 8 is a hydrogen atom or a C 1-6 alkyl group.

[10]如上述[6]至[9]中任一項所述之化合物,其中,Ra’為N。 [10] The compound according to any one of [6] to [9] above, wherein R a' is N.

[11]如上述[6]至[10]中任一項所述之化合物,其中,k為1。 [11] The compound according to any one of [6] to [10] above, wherein k is 1.

[12]如上述[6]至[10]中任一項所述之化合物,其中,k為2。 [12] The compound according to any one of [6] to [10] above, wherein k is 2.

[13]如上述[1]至[12]中任一項所述之化合物,其中,至少1個Rb為RSi[13] The compound according to any one of the above [1] to [12], wherein at least one R b is R Si .

[14]如上述[1]至[13]中任一項所述之化合物,其中,與位於各末端之N原子鍵結之Rb的1個為RSi,其他為Rc[14] The compound according to any one of the above [1] to [13], wherein one of the R b 's bonded to the N atom at each terminal is R Si and the others are R c .

[15]如上述[1]至[13]中任一項所述之化合物,其中,與位於各末端之N原子鍵結之Rb的1個為RSi,其他為RAc[15] The compound according to any one of the above [1] to [13], wherein one of the R b 's bonded to the N atom at each terminal is R Si and the others are R Ac .

[16]如上述[1]至[15]中任一項所述之化合物,其中,XC為: [16] The compound according to any one of [1] to [15] above, wherein X C is:

C1-6伸烷基、 C 1-6 alkylene group,

-(CH2)z1-O-(CH2)z2-(式中,z1為0至6的整數,z2為0至6的整數)、或 -(CH 2 ) z1 -O-(CH 2 ) z2 -(where z1 is an integer from 0 to 6, z2 is an integer from 0 to 6), or

-(CH2)z3-伸苯基-(CH2)z4-(式中,z3為0至6的整數,z4為0至6的整數)。 -(CH 2 ) z3 -phenylene-(CH 2 ) z4 -(in the formula, z3 is an integer from 0 to 6, and z4 is an integer from 0 to 6).

[17]如上述[1]至[16]中任一項所述之化合物,其中,XC為C1-6伸烷基。 [17] The compound according to any one of [1] to [16] above, wherein X C is a C 1-6 alkylene group.

[18]如上述[1]至[17]中任一項所述之化合物,其中,n’為2或3。 [18] The compound according to any one of the above [1] to [17], wherein n' is 2 or 3.

[19]如上述[1]至[18]中任一項所述之化合物,其中,n’為3。 [19] The compound according to any one of [1] to [18] above, wherein n' is 3.

[20]如上述[1]至[19]中任一項所述之化合物,其中,XD為-O-、-CO-、-COO-、-OCO-、-CONH-、-NHCO-、-OCONH-、-NHCOO-、-NH-CO-NH-、-CH2CH(OH)CH2-或-CH(CH2OH)CH2-。 [20] The compound according to any one of the above [1] to [19], wherein X D is -O-, -CO-, -COO-, -OCO-, -CONH-, -NHCO-, -OCONH-, -NHCOO-, -NH-CO-NH-, -CH 2 CH(OH)CH 2 - or -CH(CH 2 OH)CH 2 -.

[21]如上述[1]至[20]中任一項所述之化合物,其中,XD為-CONH-、-CH2CH(OH)CH2-或-CH(CH2OH)CH2-。 [21] The compound according to any one of the above [1] to [20], wherein X D is -CONH-, -CH 2 CH(OH)CH 2 - or -CH(CH 2 OH)CH 2 -.

[22]如上述[1]至[21]中任一項所述之化合物,其中,XD為-CONH-。 [22] The compound according to any one of [1] to [21] above, wherein X D is -CONH-.

[23]如上述[1]至[22]中任一項所述之化合物,其中,XE為單鍵。 [23] The compound according to any one of the above [1] to [22], wherein X E is a single bond.

[24]如上述[1]至[23]中任一項所述之化合物,其中,XE為-XG-XH[24] The compound according to any one of the above [1] to [23], wherein X E is -X G -X H ,

XG為: X G is:

單鍵、 single key,

C1-6伸烷基、 C 1-6 alkylene group,

-(CH2)z9-O-(CH2)z10-(式中,z9為0至6的整數,z10為0至6的整數)、或 -(CH 2 ) z9 -O-(CH 2 ) z10 -(where z9 is an integer from 0 to 6, z10 is an integer from 0 to 6), or

-(CH2)z11-伸苯基-(CH2)z12-(式中,z11為0至6的整數,z12為0至6的整數), -(CH 2 ) z11 -phenylene-(CH 2 ) z12 -(in the formula, z11 is an integer from 0 to 6, z12 is an integer from 0 to 6),

XH為如下列化學式所示者, X H is as shown in the following chemical formula,

Figure 111139883-A0202-12-0008-4
Figure 111139883-A0202-12-0008-4

R8為氫原子或C1-6烷基。 R 8 is a hydrogen atom or a C 1-6 alkyl group.

[25]如上述[1]至[24]中任一項所述之化合物,其中,XF為: [25] The compound according to any one of [1] to [24] above, wherein X F is:

C1-6伸烷基、 C 1-6 alkylene group,

-(CH2)z5-O-(CH2)z6-(式中,z5為0至6的整數,z6為0至6的整數)、或 -(CH 2 ) z5 -O-(CH 2 ) z6 -(where z5 is an integer from 0 to 6, z6 is an integer from 0 to 6), or

-(CH2)z7-伸苯基-(CH2)z8-(式中,z7為0至6的整數,z8為0至6的整數)。 -(CH 2 ) z7 -phenylene-(CH 2 ) z8 -(in the formula, z7 is an integer from 0 to 6, and z8 is an integer from 0 to 6).

[26]如上述[1]至[25]中任一項所述之化合物,其中,Rc分別獨立地為氫原子或C1-6烷基。 [26] The compound according to any one of the above [1] to [25], wherein R c is each independently a hydrogen atom or a C 1-6 alkyl group.

[27]如上述[1]至[26]中任一項所述之化合物,其中,Rd分別獨立地為單鍵或-(CH2)z17-NR10-(CH2)z18-(式中,R10為氫原子或C1-6烷基,z17為0至6的整數,z18為0至6的整數)。 [27] The compound according to any one of the above [1] to [26], wherein R d is each independently a single bond or -(CH 2 ) z17 -NR 10 -(CH 2 ) z18 -(Formula , R 10 is a hydrogen atom or a C 1-6 alkyl group, z17 is an integer from 0 to 6, and z18 is an integer from 0 to 6).

[28]如上述[1]至[27]中任一項所述之化合物,其中,x為1以上5以下的整數。 [28] The compound according to any one of the above [1] to [27], wherein x is an integer from 1 to 5.

[29]一種表面處理劑,係含有上述[1]至[28]中任一項所述之化合物。 [29] A surface treatment agent containing the compound described in any one of [1] to [28] above.

[30]如上述[29]所述之表面處理劑,其係更含有選自含氟油、聚矽氧油及觸媒之1種以上的其他成分。 [30] The surface treatment agent as described in the above [29], which further contains one or more other components selected from the group consisting of fluorine-containing oil, polysilicone oil and catalyst.

[31]如上述[29]或[30]所述之表面處理劑,其係作為防污性塗佈劑或防水性塗佈劑使用。 [31] The surface treatment agent according to the above [29] or [30], which is used as an antifouling coating agent or a waterproof coating agent.

[32]一種物品,係包含基材、以及由上述[1]至[28]中任一項所述之化合物或上述[29]至[31]中任一項所述之表面處理劑形成於該基材的表面上之層。 [32] An article composed of a base material and the compound described in any one of the above [1] to [28] or the surface treatment agent described in any one of the above [29] to [31]. layer on the surface of the substrate.

根據本揭示,可提供一種能夠提供優異耐久性之表面處理層的含氟聚醚基之丙烯酸化合物。 According to the present disclosure, a fluoropolyether-based acrylic compound capable of providing a surface treatment layer with excellent durability can be provided.

在本說明書使用時,「一價有機基」意指含有碳之一價基。一價有機基並無特別限定,可為烴基或其衍生物。所謂烴基的衍生物,意指於烴基的末端或分子鏈中具有1個以上的N、O、S、Si、醯胺、磺醯基、矽氧烷、羰基、羰氧基等基。此外,在僅表示為「有機基」時,意指一價有機基。再者,所謂「二價有機基」意指含有碳之二價基。該二價有機基並無特別限定,可列舉從有機基進一步使1個氫原子脫離而成之二價基。 When used in this specification, "monovalent organic group" means a monovalent group containing carbon. The monovalent organic group is not particularly limited and may be a hydrocarbon group or a derivative thereof. The derivative of a hydrocarbon group means having one or more N, O, S, Si, amide, sulfonyl, siloxane, carbonyl, carbonyloxy and other groups at the end of the hydrocarbon group or in the molecular chain. In addition, when simply expressed as "organic group", it means a monovalent organic group. Furthermore, the so-called "bivalent organic group" means a divalent group containing carbon. The divalent organic group is not particularly limited, and examples include a divalent group obtained by detaching one hydrogen atom from an organic group.

在本說明書使用時,所謂「烴基」意指含有碳及氫之基且從烴進一步使1個氫原子脫離而成之基。該烴基並無特別限定,可列舉可經1個以上的取代基取代之C1-20烴基,例如脂肪族烴基、芳香族烴基等。上述「脂肪族烴基」可為直鏈狀、分枝鏈狀及環狀中任一者,亦可為飽和及不飽和中任一者。再者,烴基可含有1個以上的環結構。 When used in this specification, the term "hydrocarbyl group" means a group containing carbon and hydrogen and further detaching one hydrogen atom from a hydrocarbon. The hydrocarbon group is not particularly limited, and examples thereof include C 1-20 hydrocarbon groups that may be substituted by one or more substituents, such as aliphatic hydrocarbon groups, aromatic hydrocarbon groups, and the like. The above-mentioned "aliphatic hydrocarbon group" may be linear, branched, or cyclic, and may be saturated or unsaturated. Furthermore, the hydrocarbon group may contain one or more ring structures.

在本說明書使用時,「烴基」的取代基並無特別限定,可列舉例如:選自鹵素原子;可經1個以上的鹵素原子所取代之C1-6烷基、C2-6烯基、C2-6炔基、C3-10環烷基、C3-10不飽和環烷基、5至10員雜環基、5至10員不飽和雜環基、C6-10芳基及5至10員雜芳基中之1個以上的基。 When used in this specification, the substituent of the "hydrocarbyl group" is not particularly limited. Examples include: selected from halogen atoms; C 1-6 alkyl groups and C 2-6 alkenyl groups which may be substituted by one or more halogen atoms. , C 2-6 alkynyl, C 3-10 cycloalkyl, C 3-10 unsaturated cycloalkyl, 5 to 10 membered heterocyclyl, 5 to 10 membered unsaturated heterocyclyl, C 6-10 aryl and more than 1 of 5 to 10 membered heteroaryl groups.

於本說明書中所謂「水解性基」意指可接受水解反應之基,亦即,藉由水解反應可從化合物的主骨架脫離之基。水解性基之例子可列舉:-ORh、-OCORh、-O-N=CRh 2、-NRh 2、-NHRh、鹵素等,於此等式中,Rh表示取代或未取代的C1-4烷基。 The term "hydrolyzable group" in this specification means a group that can undergo hydrolysis reaction, that is, a group that can be separated from the main skeleton of the compound by hydrolysis reaction. Examples of hydrolyzable groups include -OR h , -OCOR h , -ON=CR h 2 , -NR h 2 , -NHR h , halogen, etc. In this equation, R h represents substituted or unsubstituted C 1-4 alkyl.

本揭示之含氟聚醚基之丙烯酸化合物為下述式(1)所表示之含氟聚醚基之丙烯酸化合物, The fluorine-containing polyether group acrylic compound of the present disclosure is a fluorine-containing polyether group acrylic compound represented by the following formula (1),

Rb 2N-Rd-CO-(RF2-CO-NRc-Ra(RAc m)-NRc-CO)x-RF2-CO-Rd-NRb 2 (1) R b 2 NR d -CO-(R F2 -CO-NR c -R a (R Ac m )-NR c -CO) x -R F2 -CO-R d -NR b 2 (1)

式中, In the formula,

RF2分別獨立地為-Rf2 p-RF-Oq-, R F2 are independently -Rf 2 p -R F -O q -,

Rf2為可經1個以上的氟原子取代之C1-6伸烷基, Rf 2 is a C 1-6 alkylene group which may be substituted by more than one fluorine atom,

RF為二價氟聚醚基, R F is a divalent fluoropolyether group,

p為0或1, p is 0 or 1,

q為0或1, q is 0 or 1,

Ra分別獨立地為(m+2)價有機基, R a are independently (m+2)-valent organic groups,

m為1至4的整數, m is an integer from 1 to 4,

Rb分別獨立地為RSi、RAc或RcR b is independently R Si , R Ac or R c ,

RSi分別獨立地為-XC-SiR1 n’R2 3-n’R Si are independently -X C -SiR 1 n' R 2 3-n' ,

XC為碳數1至10的二價有機基, X C is a divalent organic group with 1 to 10 carbon atoms,

R1分別獨立地為羥基或水解性基, R 1 are each independently a hydroxyl group or a hydrolyzable group,

R2分別獨立地為氫原子或一價有機基, R 2 is independently a hydrogen atom or a monovalent organic group,

n’為1至3的整數, n’ is an integer from 1 to 3,

RAc分別獨立地為-XD-XE(-XF-OCO-CR5=CH2)m’R Ac are each independently -X D -X E (-X F -OCO-CR 5 =CH 2 ) m' ,

XD為二價有機基, X D is a divalent organic radical,

XE為單鍵或(m’+1)價基, X E is a single bond or (m'+1) valence base,

XF分別獨立地為碳數1至10的二價有機基, X F are each independently a divalent organic group having 1 to 10 carbon atoms,

R5為氫原子或碳數1至8的一價有機基, R 5 is a hydrogen atom or a monovalent organic group with 1 to 8 carbon atoms,

m’為1至10的整數, m’ is an integer from 1 to 10,

Rc分別獨立地為氫原子或C1-6烷基, R c are each independently a hydrogen atom or a C 1-6 alkyl group,

Rd分別獨立地為單鍵或二價有機基, R d are independently single bonds or divalent organic groups,

x為1以上的整數。 x is an integer above 1.

於上述式(1)中,RF2為-Rf2 p-RF-Oq-。 In the above formula (1), R F2 is -Rf 2 p -R F -O q -.

於上述式中,Rf2為可經1個以上的氟原子取代之C1-6伸烷基。 In the above formula, Rf 2 is a C 1-6 alkylene group which may be substituted by one or more fluorine atoms.

上述可經1個以上的氟原子取代之C1-6伸烷基中的「C1-6伸烷基」可為直鏈或分枝鏈,較佳為直鏈或分枝鏈的C1-3伸烷基,更佳為直鏈的C1-3伸烷基。 The "C 1-6 alkylene group" in the above-mentioned C 1-6 alkylene group which may be substituted by more than one fluorine atom can be a straight chain or a branched chain, preferably a straight chain or branched chain C 1 -3 alkylene group, more preferably linear C 1-3 alkylene group.

上述Rf2較佳為經1個以上的氟原子取代之C1-6伸烷基,更佳為C1-6全氟伸烷基,更佳為C1-3全氟伸烷基。 The above-mentioned Rf 2 is preferably a C 1-6 alkylene group substituted by one or more fluorine atoms, more preferably a C 1-6 perfluoroalkylene group, and even more preferably a C 1-3 perfluoroalkylene group.

上述C1-6全氟伸烷基可為直鏈或分枝鏈,較佳為直鏈或分枝鏈的C1-3全氟伸烷基,更佳為直鏈的C1-3全氟烷基,具體為-CF2-、-CF2CF2-或-CF2CF2CF2-。 The above-mentioned C 1-6 perfluoroalkylene group can be a straight chain or a branched chain, preferably a straight chain or branched chain C 1-3 perfluoroalkylene group, and more preferably a straight chain C 1-3 perfluoroalkylene group. Fluoroalkyl group, specifically -CF 2 -, -CF 2 CF 2 - or -CF 2 CF 2 CF 2 -.

於上述式中,p為0或1。於一態樣中,p為0。於其他態樣中,p為1。 In the above formula, p is 0 or 1. In one aspect, p is 0. In other aspects, p is 1.

於上述式中,q分別獨立地為0或1。於一態樣中,q為0。於其他態樣中,q為1。 In the above formula, q is independently 0 or 1. In one aspect, q is 0. In other aspects, q is 1.

於上述式(1)中,RF分別獨立地為二價氟聚醚基。 In the above formula (1), R F are each independently a divalent fluoropolyether group.

RF較佳係可含有下述式所表示之基, The preferred system of R F may contain a group represented by the following formula,

-(OCH1RFa 2h1)h3-(OCH2RFa 2h2-2)h4- -(OCH 1 R Fa 2h1 ) h3 -(OCH 2 R Fa 2h2-2 ) h4 -

式中, In the formula,

RFa於每次出現中分別獨立地為氫原子、氟原子或氯原子, Each occurrence of R Fa is independently a hydrogen atom, a fluorine atom, or a chlorine atom,

h1為1至6的整數, h1 is an integer from 1 to 6,

h2為4至8的整數, h2 is an integer from 4 to 8,

h3為0以上的整數, h3 is an integer above 0,

h4為0以上的整數, h4 is an integer above 0,

惟,h3與h4之合成為1以上,較佳為2以上,更佳為5以上,標註h3及h4並以括弧括起之各重複單元的存在順序於式中為任意。 However, the combination of h3 and h4 is 1 or more, preferably 2 or more, more preferably 5 or more, and the order of existence of the repeating units marked h3 and h4 and enclosed in parentheses is arbitrary in the formula.

於一態樣中,RF可為直鏈狀或分枝鏈狀。RF較佳為下式所表示之基: In one aspect, RF can be linear or branched. R F is preferably the basis represented by the following formula:

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3RFa 6)d-(OC2F4)e-(OCF2)f- -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 R Fa 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f -

式中,RFa分別獨立地為氫原子、氟原子或氯原子, In the formula, R Fa are independently a hydrogen atom, a fluorine atom or a chlorine atom,

a、b、c、d、e及f分別獨立地為0至200的整數,a、b、c、d、e及f之和為1以上;標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意。惟,於所有的RFa皆為氫原子或氯原子時,a、b、c、e及f的至少1個為1以上。 a, b, c, d, e and f are each independently an integer from 0 to 200, and the sum of a, b, c, d, e and f is more than 1; label a, b, c, d, e or f And the order of existence of each repeating unit enclosed in parentheses is arbitrary in the formula. However, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is 1 or more.

RFa較佳為氫原子或氟原子,更佳為氟原子。惟,於所有的RFa皆為氫原子或氯原子時,a、b、c、e及f的至少1個為1以上。 R Fa is preferably a hydrogen atom or a fluorine atom, more preferably a fluorine atom. However, when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is 1 or more.

a、b、c、d、e及f較佳可分別獨立地為0至100的整數。 Preferably, a, b, c, d, e and f can each independently be an integer from 0 to 100.

a、b、c、d、e及f之和較佳為5以上,更佳為10以上,例如可為15以上或20以上。a、b、c、d、e及f之和較佳為200以下,更佳為100以下,更佳為60以下,例如可為50以下或30以下。 The sum of a, b, c, d, e and f is preferably 5 or more, more preferably 10 or more, for example, 15 or more or 20 or more. The sum of a, b, c, d, e and f is preferably 200 or less, more preferably 100 or less, more preferably 60 or less, for example, it can be 50 or less or 30 or less.

此等重複單元可為直鏈狀或分枝鏈狀。例如,-(OC6F12)-可為-(OCF2CF2CF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2CF2CF2)-、-(OCF2CF(CF3)CF2CF2CF2)-、-(OCF2CF2CF(CF3)CF2CF2)-、-(OCF2CF2CF2CF(CF3)CF2)-、-(OCF2CF2CF2CF2CF(CF3))-等。-(OC5F10)-可為-(OCF2CF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2CF2)-、-(OCF2CF(CF3)CF2CF2)-、-(OCF2CF2CF(CF3)CF2)-、-(OCF2CF2CF2CF(CF3))-等。-(OC4F8)-可為-(OCF2CF2CF2 CF2)-、-(OCF(CF3)CF2CF2)-、-(OCF2CF(CF3)CF2)-、-(OCF2CF2CF(CF3))-、-(OC(CF3)2CF2)-、-(OCF2C(CF3)2)-、-(OCF(CF3)CF(CF3))-、-(OCF(C2F5)CF2)-及-(OCF2CF(C2F5))-中任一者。-(OC3F6)-(亦即,上述式中,RFa為氟原子)可為-(OCF2CF2CF2)-、-(OCF(CF3)CF2)-及-(OCF2CF(CF3))-中任一者。-(OC2F4)-可為-(OCF2CF2)-及-(OCF(CF3))-中任一者。 These repeating units may be linear or branched. For example, -(OC 6 F 12 )- can be -(OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 CF 2 CF 2 )-, -(OCF 2 CF(CF 3 )CF 2 CF 2 CF 2 )-, -(OCF 2 CF 2 CF(CF 3 )CF 2 CF 2 )-, -(OCF 2 CF 2 CF 2 CF(CF 3 )CF 2 )- , -(OCF 2 CF 2 CF 2 CF 2 CF(CF 3 ))-etc. -(OC 5 F 10 )- can be -(OCF 2 CF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 CF 2 )-, -(OCF 2 CF(CF 3 ) CF 2 CF 2 )-, -(OCF 2 CF 2 CF(CF 3 )CF 2 )-, -(OCF 2 CF 2 CF 2 CF(CF 3 ))-, etc. -(OC 4 F 8 )- can be -(OCF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 )-, -(OCF 2 CF(CF 3 )CF 2 )- ,-(OCF 2 CF 2 CF(CF 3 ))-,-(OC(CF 3 ) 2 CF 2 )-,-(OCF 2 C(CF 3 ) 2 )-,-(OCF(CF 3 )CF( Any one of CF 3 ))-, -(OCF(C 2 F 5 )CF 2 )- and -(OCF 2 CF(C 2 F 5 ))-. -(OC 3 F 6 )- (that is, in the above formula, R Fa is a fluorine atom) can be -(OCF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 )- and -(OCF 2 CF (CF 3 )) - either. -(OC 2 F 4 )- may be any one of -(OCF 2 CF 2 )- and -(OCF(CF 3 ))-.

於一態樣中,上述重複單元為直鏈狀。藉由將上述重複單元設為直鏈狀,可提升表面處理層的表面平滑性、磨耗耐久性等。 In one aspect, the repeating units are linear. By making the above-mentioned repeating unit into a linear chain, the surface smoothness, abrasion durability, etc. of the surface treatment layer can be improved.

於一態樣中,上述重複單元為分枝鏈狀。藉由將上述重複單元設為分枝鏈狀,可增大表面處理層的動摩擦係數。 In one aspect, the repeating units are in the form of branched chains. By forming the repeating unit into a branched chain shape, the dynamic friction coefficient of the surface treatment layer can be increased.

於一態樣中,RF可含有環結構。 In one aspect, R F may contain a ring structure.

上述環結構可為下述三員環、四員環、五員環或六員環。 The above-mentioned ring structure may be a three-member ring, a four-member ring, a five-member ring or a six-member ring as described below.

Figure 111139883-A0202-12-0015-5
Figure 111139883-A0202-12-0015-5

式中,*表示鍵結位置。 In the formula, * represents the bonding position.

上述環結構較佳為四員環、五員環或六員環,更佳可為四員環或六員環。 The above-mentioned ring structure is preferably a four-member ring, a five-member ring or a six-member ring, and more preferably is a four-member ring or a six-member ring.

具有環結構之重複單元較佳可為下述單元。 The repeating unit having a ring structure is preferably the following unit.

Figure 111139883-A0202-12-0016-6
Figure 111139883-A0202-12-0016-6

式中,*表示鍵結位置。 In the formula, * represents the bonding position.

於一態樣中,RF分別獨立地為下述式(f1)至(f6)中任一式所表示之基。 In one aspect, R F are each independently a base represented by any one of the following formulas (f1) to (f6).

-(OC3F6)d-(OC2F4)e- (f1) -(OC 3 F 6 ) d -(OC 2 F 4 ) e - (f1)

式中,d為1至200的整數,e為0至2的整數,標註下標d或e並以括弧括起之各重複單元的存在順序於式中為任意; In the formula, d is an integer from 1 to 200, and e is an integer from 0 to 2. The order of existence of each repeating unit marked with the subscript d or e and enclosed in brackets is arbitrary in the formula;

-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f2) -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f2)

式中,c及d分別獨立地為0至30的整數,e及f分別獨立地為1至200的整數, In the formula, c and d are each independently an integer from 0 to 30, e and f are each independently an integer from 1 to 200,

c、d、e及f之和為2以上, The sum of c, d, e and f is 2 or more,

標註下標c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; The order of existence of each repeating unit marked with the subscript c, d, e or f and enclosed in parentheses is arbitrary in the formula;

-(R6-R7)g-R9- (f3) -(R 6 -R 7 ) g -R 9 - (f3)

式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 ,

R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基,或為獨立地選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of 2 or 3 groups independently selected from these groups,

R9為單鍵,或為選自OCF2、OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基, R 9 is a single bond, or a group selected from OCF 2 , OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 ,

g為2至100的整數; g is an integer from 2 to 100;

-(R6-R7)g-Rr-(R7’-R6’)g’- (f4) -(R 6 -R 7 ) g -R r -(R 7' -R 6' ) g' - (f4)

式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 ,

R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基,或為獨立地選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of 2 or 3 groups independently selected from these groups,

R6’為OCF2或OC2F4R 6' is OCF 2 or OC 2 F 4 ,

R7’為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基,或為獨立地選自此等基之2或3個基的組合, R 7' is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of 2 or 3 groups independently selected from these groups. ,

g為2至100的整數, g is an integer from 2 to 100,

g’為2至100的整數, g’ is an integer from 2 to 100,

Rr為如下列化學式所示者: R r is as shown in the following chemical formula:

Figure 111139883-A0202-12-0018-7
Figure 111139883-A0202-12-0018-7

式中,*表示鍵結位置; In the formula, * represents the bonding position;

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f5) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f5)

式中,e為1以上200以下的整數,a、b、c、d及f分別獨立地為0以上200以下的整數,再者,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; In the formula, e is an integer from 1 to 200, a, b, c, d and f are each independently an integer from 0 to 200. Furthermore, a, b, c, d, e or f are marked with brackets The order of existence of each bracketed repeating unit in the formula is arbitrary;

-(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f6) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f6)

式中,f為1以上200以下的整數,a、b、c、d及e分別獨立地為0以上200以下的整數,再者,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意。 In the formula, f is an integer from 1 to 200, a, b, c, d and e are each independently an integer from 0 to 200. Furthermore, a, b, c, d, e or f are marked with brackets The order of existence of each bracketed repeating unit in the formula is arbitrary.

於上述式(f1)中,d較佳為5至200,更佳為10至100,更佳為15至50,例如為25至35的整數。於一態樣中,e為1。於其他態樣 中,e為0。於另外態樣中,e為2。於一態樣中,上述式(f1)為以-(OCF2CF2CF2)d-(OCF2CF2)e-或-(OCF(CF3)CF2)d-(OCF(CF3))e-所表示之基。於其他態樣中,上述式(f1)為以-(OC3F6)d1-(OC2F4)e1-(OC3F6)d2-(OC2F4)e2-所表示之基(式中,d1及d2分別獨立地為1至200的整數,d1與d2之合計為200以下,e1及e2分別獨立地為0或1)。 In the above formula (f1), d is preferably an integer of 5 to 200, more preferably 10 to 100, more preferably 15 to 50, for example, 25 to 35. In one aspect, e is 1. In other aspects, e is 0. In other aspects, e is 2. In one aspect, the above formula (f1) is -(OCF 2 CF 2 CF 2 ) d -(OCF 2 CF 2 ) e -or -(OCF(CF 3 )CF 2 ) d -(OCF(CF 3 )) e - the basis represented. In other aspects, the above formula (f1) is a basis represented by -(OC 3 F 6 ) d1 -(OC 2 F 4 ) e1 -(OC 3 F 6 ) d2 -(OC 2 F 4 ) e2 - (In the formula, d1 and d2 are each independently an integer from 1 to 200, the sum of d1 and d2 is less than 200, and e1 and e2 are each independently 0 or 1).

於一態樣中,式(f1)為-(OCF2CF2CF2)d-(OCF2CF2)e-,較佳為-(OCF2CF2CF2)d-(OCF2CF2)-。 In one aspect, formula (f1) is -(OCF 2 CF 2 CF 2 ) d -(OCF 2 CF 2 ) e -, preferably -(OCF 2 CF 2 CF 2 ) d -(OCF 2 CF 2 )-.

於其他態樣中,式(f1)為以-(OCF(CF3)CF2)d-(OCF(CF3))e-所表示之基,較佳為-(OCF(CF3)CF2)d-(OCF(CF3))-。 In other aspects, formula (f1) is a base represented by -(OCF(CF 3 )CF 2 ) d -(OCF(CF 3 )) e -, preferably -(OCF(CF 3 )CF 2 ) d -(OCF(CF 3 ))-.

於其他態樣中,式(f1)為-(OC3F6)d1-(OC2F4)e1-(OC3F6)d2-(OC2F4)e2-,較佳為-(OC3F6)d1-(OC2F4)-(OC3F6)d2-(OC2F4),更佳為-(OCF(CF3)CF2)d1-(OCF2CF2)-(OCF(CF3)CF2)d2-(OCF(CF3))-。 In other aspects, formula (f1) is -(OC 3 F 6 ) d1 -(OC 2 F 4 ) e1 -(OC 3 F 6 ) d2 -(OC 2 F 4 ) e2 -, preferably -( OC 3 F 6 ) d1 -(OC 2 F 4 )-(OC 3 F 6 ) d2 -(OC 2 F 4 ), more preferably -(OCF(CF 3 )CF 2 ) d1 -(OCF 2 CF 2 ) -(OCF(CF 3 )CF 2 ) d2 -(OCF(CF 3 ))-.

於上述式(f2)中,e及f較佳係分別獨立地為5至200,更佳為10至200的整數。再者,c、d、e及f之和較佳為5以上,更佳為10以上,例如可為15以上或20以上。於一態樣中,上述式(f2)較佳為以-(OCF2CF2CF2CF2)c-(OCF2CF2CF2)d-(OCF2CF2)e-(OCF2)f-所表示之基。於其他態樣中,式(f2)可為以-(OC2F4)e-(OCF2)f-所表示之基。 In the above formula (f2), e and f are preferably each independently an integer of 5 to 200, more preferably an integer of 10 to 200. Furthermore, the sum of c, d, e and f is preferably 5 or more, more preferably 10 or more, for example, 15 or more or 20 or more. In one aspect, the above formula (f2) is preferably -(OCF 2 CF 2 CF 2 CF 2 ) c -(OCF 2 CF 2 CF 2 ) d -(OCF 2 CF 2 ) e -(OCF 2 ) f - the basis represented. In other aspects, formula (f2) may be a base represented by -(OC 2 F 4 ) e -(OCF 2 ) f -.

於上述式(f3)中,R6較佳為OC2F4。於上述(f3)中,R7較佳為選自OC2F4、OC3F6及OC4F8之基,或為獨立地選自此等基之2或3個基的組合,更佳為選自OC3F6及OC4F8之基。獨立地選自OC2F4、OC3F6及OC4F8之2或3個基的組合並無特別限定,可列舉例如:-OC2F4OC3F6-、-OC2F4OC4F8-、-OC3F6OC2F4-、-OC3F6OC3F6-、-OC3F6OC4F8-、-OC4F8 OC4F8-、-OC4F8OC3F6-、-OC4F8OC2F4-、-OC2F4OC2F4OC3F6-、-OC2F4OC2F4OC4F8-、-OC2F4OC3F6OC2F4-、-OC2F4OC3F6OC3F6-、-OC2F4OC4F8OC2F4-、-OC3F6OC2F4OC2F4-、-OC3F6OC2F4OC3F6-、-OC3F6OC3F6OC2F4-及-OC4F8OC2F4OC2F4-等。於一態樣中,R9為單鍵。於其他態樣中,R9為選自OCF2、OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基。於上述式(f3)中,g較佳為3以上,更佳為5以上的整數。上述g較佳為50以下的整數。於上述式(f3)中,OC2F4、OC3F6、OC4F8、OC5F10及OC6F12可為直鏈或分枝鏈中任一種,較佳為直鏈。於此態樣中,上述(R6-R7)g較佳為-(OC2F4-OC3F6)g-或-(OC2F4-OC4F8)g-。 In the above formula (f3), R 6 is preferably OC 2 F 4 . In the above (f3), R 7 is preferably a group selected from OC 2 F 4 , OC 3 F 6 and OC 4 F 8 , or a combination of 2 or 3 groups independently selected from these groups, and more Preferably, the base is selected from OC 3 F 6 and OC 4 F 8 . The combination of 2 or 3 groups independently selected from OC 2 F 4 , OC 3 F 6 and OC 4 F 8 is not particularly limited, and examples thereof include: -OC 2 F 4 OC 3 F 6 -, -OC 2 F 4 OC 4 F 8 -, -OC 3 F 6 OC 2 F 4 -, -OC 3 F 6 OC 3 F 6 -, -OC 3 F 6 OC 4 F 8 -, -OC 4 F 8 OC 4 F 8 - , -OC 4 F 8 OC 3 F 6 -, -OC 4 F 8 OC 2 F 4 -, -OC 2 F 4 OC 2 F 4 OC 3 F 6 -, -OC 2 F 4 OC 2 F 4 OC 4 F 8 -, -OC 2 F 4 OC 3 F 6 OC 2 F 4 -, -OC 2 F 4 OC 3 F 6 OC 3 F 6 -, -OC 2 F 4 OC 4 F 8 OC 2 F 4 -, -OC 3 F 6 OC 2 F 4 OC 2 F 4 -, -OC 3 F 6 OC 2 F 4 OC 3 F 6 -, -OC 3 F 6 OC 3 F 6 OC 2 F 4 -and-OC 4 F 8 OC 2 F 4 OC 2 F 4 -etc. In one aspect, R 9 is a single bond. In other aspects, R 9 is a group selected from OCF 2 , OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 , and OC 6 F 12 . In the above formula (f3), g is preferably an integer of 3 or more, more preferably 5 or more. The above g is preferably an integer of 50 or less. In the above formula (f3), OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 may be either linear or branched chains, and linear chains are preferred. In this aspect, the above-mentioned (R 6 -R 7 ) g is preferably -(OC 2 F 4 -OC 3 F 6 ) g - or -(OC 2 F 4 -OC 4 F 8 ) g -.

於上述式(f4)中,R6、R7及g與上述式(f3)的記載為相同意義且具有同樣的態樣。R6’、R7’及g’分別與上述式(f3)所記載之R6、R7及g為相同意義且具有同樣的態樣。Rr較佳為如下列化學式所示者: In the above-mentioned formula (f4), R 6 , R 7 and g have the same meaning and the same aspect as those described in the above-mentioned formula (f3). R 6' , R 7' and g' respectively have the same meaning and the same aspect as R 6 , R 7 and g described in the above formula (f3). R r is preferably represented by the following chemical formula:

Figure 111139883-A0202-12-0020-8
Figure 111139883-A0202-12-0020-8

式中,*表示鍵結位置; In the formula, * represents the bonding position;

更佳為如下列化學式所示者: More preferably, it is represented by the following chemical formula:

Figure 111139883-A0202-12-0021-9
Figure 111139883-A0202-12-0021-9

式中,*表示鍵結位置。 In the formula, * represents the bonding position.

於上述式(f5)中,e較佳為1以上100以下,更佳為5以上100以下的整數。a、b、c、d、e及f之和較佳為5以上,更佳為10以上,例如10以上100以下。 In the above formula (f5), e is preferably an integer from 1 to 100, more preferably from 5 to 100. The sum of a, b, c, d, e and f is preferably 5 or more, more preferably 10 or more, for example, 10 or more and 100 or less.

於上述式(f6)中,f較佳為1以上100以下,更佳為5以上100以下的整數。a、b、c、d、e及f之和較佳為5以上,更佳為10以上,例如10以上100以下。 In the above formula (f6), f is preferably an integer from 1 to 100, more preferably from 5 to 100. The sum of a, b, c, d, e and f is preferably 5 or more, more preferably 10 or more, for example, 10 or more and 100 or less.

於一態樣中,上述RF為以上述式(f1)或(f2)所表示之基。 In one aspect, the above-mentioned R F is a base represented by the above-mentioned formula (f1) or (f2).

於一態樣中,上述RF為以上述式(f1)所表示之基。 In one aspect, the above-mentioned R F is a group represented by the above-mentioned formula (f1).

於一態樣中,上述RF為以上述式(f2)所表示之基。 In one aspect, the above-mentioned R F is a group represented by the above-mentioned formula (f2).

於一態樣中,上述RF為以上述式(f3)所表示之基。 In one aspect, the above-mentioned R F is a group represented by the above-mentioned formula (f3).

於一態樣中,上述RF為以上述式(f4)所表示之基。 In one aspect, the above-mentioned R F is a group represented by the above-mentioned formula (f4).

於一態樣中,上述RF為以上述式(f5)所表示之基。 In one aspect, the above-mentioned R F is a group represented by the above-mentioned formula (f5).

於一態樣中,上述RF為以上述式(f6)所表示之基。 In one aspect, the above-mentioned R F is a group represented by the above-mentioned formula (f6).

於上述RF中,e相對於f之比(以下稱為「e/f比」)為0.1至10,較佳為0.2至5,更佳為0.2至2,更佳為0.2至1.5,再更佳為0.2至0.85。藉由將e/f比設為10以下,更為提升由此化合物所得到之表面處理層的平滑性、磨耗耐久性及耐化學性(例如相對於人工汗之耐久性)。e/f比 愈小,表面處理層的平滑性及磨耗耐久性愈提升。另一方面,藉由將e/f比設為0.1以上,可進一步提高化合物的穩定性。e/f比愈大,化合物的穩定性愈提升。 In the above R F , the ratio of e to f (hereinafter referred to as "e/f ratio") is 0.1 to 10, preferably 0.2 to 5, more preferably 0.2 to 2, more preferably 0.2 to 1.5, and More preferably, it is 0.2 to 0.85. By setting the e/f ratio to 10 or less, the smoothness, abrasion durability, and chemical resistance (for example, durability against artificial sweat) of the surface treatment layer obtained from this compound are further improved. The smaller the e/f ratio, the smoother and abrasion durability of the surface treatment layer are improved. On the other hand, by setting the e/f ratio to 0.1 or more, the stability of the compound can be further improved. The larger the e/f ratio, the more stable the compound is.

於一態樣中,上述e/f比較佳為0.2至0.95,更佳為0.2至0.9。 In one aspect, the above e/f ratio is preferably 0.2 to 0.95, more preferably 0.2 to 0.9.

於一態樣中,從耐熱性之觀點而言,上述e/f比較佳為1.0以上,更佳為1.0至2.0。 In one aspect, from the viewpoint of heat resistance, the e/f ratio is preferably 1.0 or more, more preferably 1.0 to 2.0.

於上述含氟聚醚基之丙烯酸化合物中,RF2部分的數量平均分子量並無特別限定,例如為500至30,000,較佳為1,500至30,000,更佳為2,000至10,000。於本說明書中,RF2的數量平均分子量係設為藉由19F-NMR所測得之值。 In the above-mentioned fluorine-containing polyether group acrylic compound, the number average molecular weight of the RF2 part is not particularly limited, for example, it is 500 to 30,000, preferably 1,500 to 30,000, more preferably 2,000 to 10,000. In this specification, the number average molecular weight of RF2 is set to the value measured by 19 F-NMR.

於上述式(1)中,Ra分別獨立地為(m+2)價有機基。 In the above formula (1), R a is each independently an (m+2)-valent organic group.

於一態樣中,Ra為下述式所表示之基: In one aspect, R a is a basis represented by:

-R9-(Ra’-R9)k- -R 9 -(R a' -R 9 ) k -

式中: In the formula:

R9分別獨立地為C1-6伸烷基, R 9 are each independently C 1-6 alkylene group,

Ra’分別獨立地為3價有機基, R a' are each independently a trivalent organic group,

k為1至4的整數。 k is an integer from 1 to 4.

於該基中,R9較佳為C1-4伸烷基,更佳為C2-4伸烷基。 In this group, R 9 is preferably a C 1-4 alkylene group, more preferably a C 2-4 alkylene group.

於較佳態樣中,k為1至2的整數。 In a preferred embodiment, k is an integer from 1 to 2.

於一態樣中,k為1。 In one aspect, k is 1.

於一態樣中,k為2。 In one aspect, k is 2.

於一態樣中,Ra’分別獨立地為含有N原子或O原子之3價基。 In one aspect, R a' is independently a trivalent group containing an N atom or an O atom.

於較佳態樣中,Ra’分別獨立地為可於碳-碳原子間含有胺基鍵、醯胺鍵、胺基甲酸酯鍵、脲鍵、醚鍵或酯鍵之3價有機基。 In a preferred embodiment, R a' is independently a trivalent organic group that can contain an amine bond, an amide bond, a urethane bond, a urea bond, an ether bond or an ester bond between carbon-carbon atoms. .

於一態樣中,Ra’分別獨立地為下述基: In one aspect, R a' are independently the following bases:

Figure 111139883-A0202-12-0023-10
Figure 111139883-A0202-12-0023-10

式中,R8為氫原子或C1-6烷基(較佳為甲基或乙基,更佳為甲基)。上述-CR8(-O-)-的O與RAc鍵結。 In the formula, R 8 is a hydrogen atom or a C 1-6 alkyl group (preferably methyl or ethyl, more preferably methyl). The O in -CR 8 (-O-)- mentioned above is bonded to R Ac .

於一態樣中,Ra’為N。 In one aspect, R a' is N.

於一態樣中,Ra’為-CR8(-O-)-。 In one aspect, R a' is -CR 8 (-O-)-.

於上述式(1)中,m為1至4的整數。 In the above formula (1), m is an integer from 1 to 4.

於較佳態樣中,m為1或2。 In a preferred embodiment, m is 1 or 2.

於一態樣中,m為1。 In one aspect, m is 1.

於一態樣中,m為2。 In one aspect, m is 2.

於上述式(1)中,Rb分別獨立地為RSi、RAc、或RcIn the above formula (1), R b is independently R Si , R Ac , or R c .

上述式(1)中,至少1個Rb為RSiIn the above formula (1), at least one R b is R Si .

於較佳態樣中,與位於式(1)的各末端之N原子鍵結之Rb的至少1個為RSiIn a preferred embodiment, at least one R b bonded to the N atom located at each terminal of the formula (1) is R Si .

於一態樣中,與位於式(1)的各末端之N原子鍵結之Rb的1個為RSi,其他為RcIn one aspect, one of the R b 's bonded to the N atoms located at each terminal of the formula (1) is R Si , and the others are R c .

於其他態樣中,與位於式(1)的各末端之N原子鍵結之Rb的1個為RSi,其他為RAcIn other aspects, one of the R b 's bonded to the N atoms located at each terminal of the formula (1) is R Si , and the others are R Ac .

上述RSi分別獨立地為-XC-SiR1 n’R2 3-n’The above R Si are each independently -X C -SiR 1 n' R 2 3-n' .

上述XC為碳數1至10的二價有機基。 The above-mentioned X C is a divalent organic group having 1 to 10 carbon atoms.

於一態樣中,XC為: In one aspect, X C is:

C1-6伸烷基、-(CH2)z1-O-(CH2)z2-(式中,z1為0至6的整數,例如為1至6的整數,z2為0至6的整數,例如為1至6的整數)、或-(CH2)z3-伸苯基-(CH2)z4-(式中,z3為0至6的整數,例如為1至6的整數,z4為0至6的整數,例如為1至6的整數)。 C 1-6 alkylene group, -(CH 2 ) z1 -O-(CH 2 ) z2 -(in the formula, z1 is an integer from 0 to 6, for example, it is an integer from 1 to 6, and z2 is an integer from 0 to 6 , for example, an integer from 1 to 6), or -(CH 2 ) z3 -phenylene-(CH 2 ) z4 -(where z3 is an integer from 0 to 6, for example, an integer from 1 to 6, z4 is an integer from 0 to 6, for example an integer from 1 to 6).

此等基可經選自例如氟原子、C1-6烷基、C2-6烯基及C2-6炔基中之1個以上的取代基所取代,惟較佳是未取代。此等基的右側與Si鍵結。 These groups may be substituted by one or more substituents selected from, for example, fluorine atom, C 1-6 alkyl group, C 2-6 alkenyl group and C 2-6 alkynyl group, but are preferably unsubstituted. The right side of these groups is bonded to Si.

上述C1-6伸烷基可為直鏈或分枝鏈,較佳為直鏈。 The above-mentioned C 1-6 alkylene group can be a straight chain or a branched chain, preferably a straight chain.

於較佳態樣中,XC為C1-6伸烷基,較佳為C2-4伸烷基。 In a preferred embodiment, X C is a C 1-6 alkylene group, preferably a C 2-4 alkylene group.

上述R1分別獨立地為羥基或水解性基。 The above R 1 is each independently a hydroxyl group or a hydrolyzable group.

R1較佳係分別獨立地為水解性基。 R 1 is preferably each independently a hydrolyzable group.

R1較佳係分別獨立地為-ORh、-OCORh、-O-N=CRh 2、-NRh 2、-NHRh、-NCO或鹵素(此等式中,Rh表示取代或未取代的C1-4烷基),更佳為-ORh(亦即烷氧基)。Rh可列舉:甲基、乙基、丙基、異丙基、正丁基、異丁基等未取代烷基;氯甲基等取代烷基。該等當中,較佳為烷基,尤其是未取代烷基,更佳為甲基或乙基。於一態樣中,Rh為甲基,於其他態樣中,Rh為乙基。 R 1 is preferably independently -OR h , -OCOR h , -ON=CR h 2 , -NR h 2 , -NHR h , -NCO or halogen (in this equation, R h represents substituted or unsubstituted C 1-4 alkyl), more preferably -OR h (that is, alkoxy). Examples of R h include unsubstituted alkyl groups such as methyl, ethyl, propyl, isopropyl, n-butyl and isobutyl; substituted alkyl groups such as chloromethyl. Among these, an alkyl group is preferred, particularly an unsubstituted alkyl group, and a methyl or ethyl group is more preferred. In one aspect, R h is methyl, in another aspect, R h is ethyl.

上述R2分別獨立地為氫原子或一價有機基。該一價有機基為排除上述水解性基之一價有機基。 The above-mentioned R 2 are each independently a hydrogen atom or a monovalent organic group. This monovalent organic group is a monovalent organic group excluding the above-mentioned hydrolyzable group.

於R2中,一價有機基較佳為C1-20烷基,更佳為C1-6烷基,更佳為甲基。 In R 2 , the monovalent organic group is preferably a C 1-20 alkyl group, more preferably a C 1-6 alkyl group, and more preferably a methyl group.

上述式中,n’於每個(SiR1 n’R2 3-n’)單元中分別獨立地為1至3的整數,較佳為2或3,更佳為3。 In the above formula, n' in each (SiR 1 n' R 2 3-n' ) unit is independently an integer from 1 to 3, preferably 2 or 3, more preferably 3.

於上述式(1)中,RAc分別獨立地為-XD-XE(-XF-OCO-CR5=CH2)m’In the above formula (1), R Ac is each independently -X D -X E (-X F -OCO-CR 5 =CH 2 ) m' .

上述XD為二價有機基。 The above-mentioned X D is a divalent organic group.

XD較佳為-O-、-CO-、-COO-、-OCO-、-CONH-、-NHCO-、-OCONH-、-NHCOO-、-NH-CO-NH-、-CH2CH(OH)CH2-或-CH(CH2OH)CH2-,更佳為-CONH-、-CH2CH(OH)CH2-或-CH(CH2OH)CH2-,更佳為-CONH-。此等基的右側與XE鍵結。 X D is preferably -O-, -CO-, -COO-, -OCO-, -CONH-, -NHCO-, -OCONH-, -NHCOO-, -NH-CO-NH-, -CH 2 CH( OH)CH 2 - or -CH(CH 2 OH)CH 2 -, more preferably -CONH-, -CH 2 CH(OH)CH 2 - or -CH(CH 2 OH)CH 2 -, more preferably - CONH-. The right side of these bases are bonded to X E.

上述XE為單鍵或(m’+1)價基。 The above X E is a single bond or (m'+1) valence base.

於一態樣中,XE為單鍵。 In one aspect, X E is a single bond.

於一態樣中,XE為以-XG-XH所表示之三或四價基, In one aspect, X E is a trivalent or tetravalent base represented by -X G -X H ,

XG為: X G is:

單鍵、 single key,

C1-6伸烷基、 C 1-6 alkylene group,

-(CH2)z9-O-(CH2)z10-(式中,z9為0至6的整數,例如為1至6的整數,z10為0至6的整數,例如為1至6的整數)、或 -(CH 2 ) z9 -O-(CH 2 ) z10 -(In the formula, z9 is an integer from 0 to 6, for example, an integer from 1 to 6, z10 is an integer from 0 to 6, for example, an integer from 1 to 6 ),or

-(CH2)z11-伸苯基-(CH2)z12-(式中,z11為0至6的整數,例如為1至6的整數,z12為0至6的整數,例如為1至6的整數), -(CH 2 ) z11 -phenylene-(CH 2 ) z12 -(where z11 is an integer from 0 to 6, for example, 1 to 6, z12 is an integer from 0 to 6, for example, 1 to 6 an integer),

XH為如下列化學式所示者: X H is represented by the following chemical formula:

Figure 111139883-A0202-12-0026-11
Figure 111139883-A0202-12-0026-11

R8為氫原子或C1-6烷基。 R 8 is a hydrogen atom or a C 1-6 alkyl group.

上述C1-6伸烷基可為直鏈或分枝鏈,較佳為直鏈。 The above-mentioned C 1-6 alkylene group can be a straight chain or a branched chain, preferably a straight chain.

於較佳態樣中,上述C1-6伸烷基為C2-4伸烷基。 In a preferred embodiment, the above-mentioned C 1-6 alkylene group is a C 2-4 alkylene group.

上述C1-6烷基較佳為C1-3烷基,更佳為甲基。 The above-mentioned C 1-6 alkyl group is preferably a C 1-3 alkyl group, and more preferably is a methyl group.

上述XF分別獨立地為碳數1至10的二價有機基。 The above-mentioned X F are each independently a divalent organic group having 1 to 10 carbon atoms.

於一態樣中,XF為: In one aspect, X F is:

C1-6伸烷基、 C 1-6 alkylene group,

-(CH2)z5-O-(CH2)z6-(式中,z5為0至6的整數,例如為1至6的整數,z6為0至6的整數,例如為1至6的整數)、或 -(CH 2 ) z5 -O-(CH 2 ) z6 -(In the formula, z5 is an integer from 0 to 6, for example, an integer from 1 to 6, z6 is an integer from 0 to 6, for example, an integer from 1 to 6 ),or

-(CH2)z7-伸苯基-(CH2)z8-(式中,z7為0至6的整數,例如為1至6的整數,z8為0至6的整數,例如為1至6的整數)。 -(CH 2 ) z7 -phenylene-(CH 2 ) z8 -(In the formula, z7 is an integer from 0 to 6, for example, from 1 to 6, and z8 is an integer from 0 to 6, for example, from 1 to 6 integer).

此等基可經選自例如氟原子、C1-6烷基、C2-6烯基及C2-6炔基之1個以上的取代基所取代,惟較佳係未取代。此等基的左側與XE鍵結。 These groups may be substituted by one or more substituents selected from, for example, fluorine atom, C 1-6 alkyl group, C 2-6 alkenyl group and C 2-6 alkynyl group, but are preferably unsubstituted. The left side of these bases are bonded to X E.

上述C1-6伸烷基可為直鏈或分枝鏈。於一態樣中,C1-6伸烷基為直鏈。於其他態樣中,C1-6伸烷基為分枝鏈。 The above-mentioned C 1-6 alkylene group may be a straight chain or a branched chain. In one aspect, the C 1-6 alkylene group is straight chain. In other aspects, the C 1-6 alkylene group is branched.

於較佳態樣中,XF為C1-6伸烷基,較佳為C2-4伸烷基。 In a preferred embodiment, X F is a C 1-6 alkylene group, preferably a C 2-4 alkylene group.

於其他較佳態樣中,XF為-O-(CH2)z6-,較佳為-O-(CH2)2-4-。 In other preferred embodiments, X F is -O-(CH 2 ) z6 -, preferably -O-(CH 2 ) 2-4 -.

上述R5為氫原子或碳數1至8的一價有機基。 The above R 5 is a hydrogen atom or a monovalent organic group having 1 to 8 carbon atoms.

上述一價有機基較佳為C1-8烷基、C3-8環烷基或C5-8芳基,更佳為C1-6烷基或苯基,更佳為C1-3烷基,特佳為甲基。 The above-mentioned monovalent organic group is preferably C 1-8 alkyl, C 3-8 cycloalkyl or C 5-8 aryl, more preferably C 1-6 alkyl or phenyl, more preferably C 1-3 Alkyl group, particularly preferably methyl group.

於一態樣中,R5為氫原子。 In one aspect, R5 is a hydrogen atom.

於一態樣中,R5為甲基。 In one aspect, R5 is methyl.

上述m’為1至10的整數,較佳為1至3的整數,更佳為1。 The above m' is an integer from 1 to 10, preferably an integer from 1 to 3, and more preferably 1.

於較佳態樣中,RAc為-CONH-XF-OCO-CR5=CH2In a preferred embodiment, R Ac is -CONH-X F -OCO-CR 5 =CH 2 .

於上述式(1)中,Rc分別獨立地為氫原子或C1-6烷基。 In the above formula (1), R c is each independently a hydrogen atom or a C 1-6 alkyl group.

上述C1-6烷基較佳為C1-3烷基,特佳為甲基。C1-6烷基可為直鏈或分枝鏈。 The above-mentioned C 1-6 alkyl group is preferably a C 1-3 alkyl group, and particularly preferably a methyl group. The C 1-6 alkyl group may be straight chain or branched chain.

於一態樣中,Rc為氫原子。 In one aspect, R c is a hydrogen atom.

於一態樣中,Rc為甲基。 In one aspect, R c is methyl.

於上述式(1)中,Rd分別獨立地為單鍵或二價有機基。 In the above formula (1), R d is independently a single bond or a divalent organic group.

於一態樣中,Rd為單鍵。 In one aspect, R d is a single bond.

於其他態樣中,Rd為二價有機基。 In other aspects, R d is a divalent organic group.

Rd中的二價有機基為: The divalent organic group in R d is:

C1-10伸烷基,較佳為C2-6伸烷基、 C 1-10 alkylene group, preferably C 2-6 alkylene group,

-(CH2)z13-O-(CH2)z14-(式中,z13為0至6的整數,例如為1至6的整數,z14為0至6的整數,例如為1至6的整數)、 -(CH 2 ) z13 -O-(CH 2 ) z14 -(In the formula, z13 is an integer from 0 to 6, for example, an integer from 1 to 6, z14 is an integer from 0 to 6, for example, an integer from 1 to 6 ),

-(CH2)z15-伸苯基-(CH2)z16-(式中,z15為0至6的整數,例如為1至 6的整數,z16為0至6的整數,例如為1至6的整數)、或 -(CH 2 ) z15 -phenylene-(CH 2 ) z16 -(where z15 is an integer from 0 to 6, for example, 1 to 6, z16 is an integer from 0 to 6, for example, 1 to 6 an integer), or

-(CH2)z17-NR10-(CH2)z18-(式中,R10為氫原子或C1-6烷基,z17為0至6的整數,z18為0至6的整數)。此等基可經選自例如氟原子、C1-6烷基、C2-6烯基及C2-6炔基之1個以上的取代基所取代,惟較佳係未取代。此等基的左側與CO鍵結。 -(CH 2 ) z17 -NR 10 -(CH 2 ) z18 -(In the formula, R 10 is a hydrogen atom or a C 1-6 alkyl group, z17 is an integer from 0 to 6, and z18 is an integer from 0 to 6). These groups may be substituted by one or more substituents selected from, for example, fluorine atom, C 1-6 alkyl group, C 2-6 alkenyl group and C 2-6 alkynyl group, but are preferably unsubstituted. The left side of these groups is bonded to CO.

Rd中的二價有機基較佳為-(CH2)z17-NR10-(CH2)z18-(式中,R10為氫原子或C1-6烷基,z17為0至6的整數,z18為0至6的整數),更佳為-NR10-(CH2)z18-(式中,R10為氫原子或C1-6烷基,z18為1至6的整數)。 The divalent organic group in R d is preferably -(CH 2 ) z17 -NR 10 -(CH 2 ) z18 -(in the formula, R 10 is a hydrogen atom or a C 1-6 alkyl group, and z17 is 0 to 6 an integer, z18 is an integer from 0 to 6), more preferably -NR 10 -(CH 2 ) z18 - (in the formula, R 10 is a hydrogen atom or a C 1-6 alkyl group, z18 is an integer from 1 to 6).

上述C1-10伸烷基可為直鏈或分枝鏈,較佳為直鏈。 The above-mentioned C 1-10 alkylene group can be a straight chain or a branched chain, preferably a straight chain.

於上述式(1)中,x為1以上的整數。 In the above formula (1), x is an integer equal to or greater than 1.

於一態樣中,X較佳為1以上100以下的整數,更佳為1以上10以下的整數,更佳為1以上5以下的整數,例如為2以上10以下的整數,更佳為2以上5以下的整數。 In one aspect, An integer above 5 and below.

上述以式(1)所表示之含氟聚醚基之丙烯酸化合物並無特別限定,可具有5×102至2×105的數量平均分子量。於該範圍中,從磨耗耐久性之觀點而言,較佳為具有2×103至1×105,更佳為3×103至2×104的數量平均分子量。該「數量平均分子量」係設為藉由19F-NMR所測得之值。 The fluorine-containing polyether group-containing acrylic compound represented by the formula (1) is not particularly limited, and may have a number average molecular weight of 5×10 2 to 2×10 5 . Within this range, from the viewpoint of abrasion durability, it is preferable to have a number average molecular weight of 2×10 3 to 1×10 5 , more preferably 3×10 3 to 2×10 4 . The "number average molecular weight" is a value measured by 19 F-NMR.

於一態樣中,上述以式(1)所表示之含氟聚醚基之丙烯酸化合物係將下述式所表示之化合物, In one aspect, the above-mentioned fluorine-containing polyether group acrylic compound represented by formula (1) is a compound represented by the following formula,

R21OOC-RF2-COOR21 R 21 OOC-R F2 -COOR 21

[式中,R21為氫原子或甲基,RF2與關於式(1)之記載為相同意義] [In the formula, R 21 is a hydrogen atom or a methyl group, and R F2 has the same meaning as described in formula (1)]

與下述化學式所表示之化合物進行反應, React with the compound represented by the following chemical formula,

NH2-R9-(NH-R9)k-NH2 NH 2 -R 9 -(NH-R 9 ) k -NH 2

[式中,R9及k與關於式(1)之記載為相同意義] [In the formula, R 9 and k have the same meaning as described in formula (1)]

而得到下述式所表示之化合物 And obtain the compound represented by the following formula

R21OOC-(RF2-CONH-R9-(NH-R9)k-NHCO)x-RF2-COOR21 R 21 OOC-(R F2 -CONH-R 9 -(NH-R 9 ) k -NHCO) x -R F2 -COOR 21

[式中,R21為氫原子或或甲基,RF2、R9及k與關於式(1)之記載為相同意義]。 [In the formula, R 21 is a hydrogen atom or a methyl group, and RF 2 , R 9 and k have the same meanings as described in the formula (1)].

接著,將所得到之化合物,與下式所表示之化合物進行反應, Next, the obtained compound is reacted with a compound represented by the following formula:

NR23 mH2-m-R22-SiR1 n’R2 3-n’ NR 23 m H 2-m -R 22 -SiR 1 n' R 2 3-n'

[式中,R23為C1-6的烷基或苯基,m為0或1,R22為二價基,R1、R2及n’與關於式(1)之記載為相同意義] [In the formula, R 23 is a C 1-6 alkyl group or phenyl group, m is 0 or 1, R 22 is a divalent group, R 1 , R 2 and n' have the same meanings as described in formula (1) ]

而得到下述式所表示之化合物, And the compound represented by the following formula is obtained,

R2 3-n’R1 n’Si-R22-HNOC-(RF2-CONH-R9-(NH-R9)k-NHCO)x-RF2-CONH-R22-SiR1 n’R2 3-n’R 2 3-n' R 1 n' Si-R 22 -HNOC-(R F2 -CONH-R 9 -(NH-R 9 ) k -NHCO) x -R F2 -CONH-R 22 -SiR 1 n' R 2 3-n' .

接著,將所得到之化合物,與下述式所表示之化合物進行反應, Next, the obtained compound is reacted with a compound represented by the following formula:

R34-R35-OCOCH=CH2 R 34 -R 35 -OCOCH=CH 2

[式中,R34為-NCO、-COOH等反應性基, [In the formula, R 34 is a reactive group such as -NCO, -COOH, etc.,

R35為二價基] R 35 is a divalent base]

藉此可得到式(1)所表示之化合物。 Thereby, the compound represented by formula (1) can be obtained.

於一態樣中,上述以式(1)所表示之含氟聚醚基之丙烯酸化合物係將下述式所表示之化合物, In one aspect, the above-mentioned fluorine-containing polyether group acrylic compound represented by formula (1) is a compound represented by the following formula,

R21OOC-RF2-COOR21 R 21 OOC-R F2 -COOR 21

[式中,R21為氫原子或甲基,RF2與關於式(1)之記載為相同意義] [In the formula, R 21 is a hydrogen atom or a methyl group, and R F2 has the same meaning as described in formula (1)]

與下述化學式所表示之化合物進行反應, React with the compound represented by the following chemical formula,

NH2-R9-(CH(OH)-R9)k-NH2 NH 2 -R 9 -(CH(OH)-R 9 ) k -NH 2

[式中,R9及k與關於式(1)之記載為相同意義] [In the formula, R 9 and k have the same meaning as described in formula (1)]

而得到下述式所表示之化合物 And obtain the compound represented by the following formula

R21OOC-(RF2-CONH-R9-(CH(OH)-R9)k-NHCO)x-RF2-COOR21 R 21 OOC-(R F2 -CONH-R 9 -(CH(OH)-R 9 ) k -NHCO) x -R F2 -COOR 21

[式中,R21為氫原子或甲基,RF2、R9及k與關於式(1)之記載為相同意義]。 [In the formula, R 21 is a hydrogen atom or a methyl group, and RF 2 , R 9 and k have the same meanings as described in the formula (1)].

接著,將所得到之化合物,與下式所表示之化合物進行反應, Next, the obtained compound is reacted with a compound represented by the following formula:

NR23 mH2-m-R22-SiR1 n’R2 3-n’ NR 23 m H 2-m -R 22 -SiR 1 n' R 2 3-n'

[式中,R23為C1-6的烷基或苯基,m為0或1,R22為二價基,R1、R2及n’與關於式(1)之記載為相同意義] [In the formula, R 23 is a C 1-6 alkyl group or phenyl group, m is 0 or 1, R 22 is a divalent group, R 1 , R 2 and n' have the same meanings as described in formula (1) ]

而得到下述式所表示之化合物, And the compound represented by the following formula is obtained,

R2 3-n’R1 n’Si-R22-HNOC-(RF2-CONH-R9-(CH(OH)-R9)k-NHCO)x-RF2-CONH-R22-SiR1 n’R2 3-n’R 2 3-n' R 1 n' Si-R 22 -HNOC-(R F2 -CONH-R 9 -(CH(OH)-R 9 ) k -NHCO) x -R F2 -CONH-R 22 -SiR 1 n' R 2 3-n' .

接著,將所得到之化合物,與下述式所表示之化合物進行反應, Next, the obtained compound is reacted with a compound represented by the following formula:

R34-R35-OCOCH=CH2 R 34 -R 35 -OCOCH=CH 2

[式中,R34為-NCO、-COOH等反應性基, [In the formula, R 34 is a reactive group such as -NCO, -COOH, etc.,

R35為二價基] R 35 is a divalent base]

藉此可得到式(1)所表示之化合物。 Thereby, the compound represented by formula (1) can be obtained.

於一態樣中,上述式(1)所表示之含氟聚醚基之丙烯酸化合物係將下述式所表示之化合物, In one aspect, the fluorine-containing polyether group acrylic compound represented by the above formula (1) is a compound represented by the following formula,

R21OOC-RF2-COOR21 R 21 OOC-R F2 -COOR 21

[式中,R21為氫原子或甲基,RF2與關於式(1)之記載為相同意義] [In the formula, R 21 is a hydrogen atom or a methyl group, and R F2 has the same meaning as described in formula (1)]

與下述化學式所表示之化合物進行反應, React with the compound represented by the following chemical formula,

NH2-R9-(NH-R9)k-NH2 NH 2 -R 9 -(NH-R 9 ) k -NH 2

式中,R9及k與關於式(1)之記載為相同意義; In the formula, R 9 and k have the same meaning as described in formula (1);

而得到下述式所表示之化合物, And the compound represented by the following formula is obtained,

R21OOC-(RF2-CONH-R9-(NH-R9)k-NHCO)x-RF2-COOR21 R 21 OOC-(R F2 -CONH-R 9 -(NH-R 9 ) k -NHCO) x -R F2 -COOR 21

[式中,R21為氫原子或甲基,RF2、R9及k與關於式(1)之記載為相同意義]。 [In the formula, R 21 is a hydrogen atom or a methyl group, and RF 2 , R 9 and k have the same meanings as described in the formula (1)].

接著,將所得到之化合物,與下述式所表示之化合物進行反應, Next, the obtained compound is reacted with a compound represented by the following formula:

NH2-R9’-NH2 NH 2 -R 9' -NH 2

[式中,R9’與關於R9之記載為相同意義] [In the formula, R 9' has the same meaning as the description about R 9 ]

而得到下述式所表示之化合物, And the compound represented by the following formula is obtained,

R21OOC-(RF2-CONH-R9-(NH-R9)k-NHCO)x-(RF2-CONH-R9’-NHCO)x’-RF2-COOR21 R 21 OOC-(R F2 -CONH-R 9 -(NH-R 9 ) k -NHCO) x -(R F2 -CONH-R 9' -NHCO) x' -R F2 -COOR 21

[式中,R21為氫原子或甲基,RF2、R9及k與關於式(1)之記載為相同意義,R9’與關於R9之記載為相同意義]。 [In the formula, R 21 is a hydrogen atom or a methyl group, RF 2 , R 9 and k have the same meanings as described in formula (1), and R 9′ has the same meaning as described in R 9 ].

接著,將所得到之化合物,與下述式所表示之化合物進行反應, Next, the obtained compound is reacted with a compound represented by the following formula:

NR23 mH2-m-R22-SiR1 n’R2 3-n’ NR 23 m H 2-m -R 22 -SiR 1 n' R 2 3-n'

[式中,R23為C1-6的烷基或苯基,m為0或1,R22為二價基,R1、R2及n’與關於式(1)之記載為相同意義] [In the formula, R 23 is a C 1-6 alkyl group or phenyl group, m is 0 or 1, R 22 is a divalent group, R 1 , R 2 and n' have the same meanings as described in formula (1) ]

而得到下述式所表示之化合物, And the compound represented by the following formula is obtained,

R2 3-n’R1 n’Si-R22-HNOC-(RF2-CONH-R9-(NH-R9)k-NHCO)x-(RF2-CONH-R9’-NHCO)x’-RF2-CONH-R22-SiR1 n’R2 3-n’R 2 3-n' R 1 n' Si-R 22 -HNOC-(R F2 -CONH-R 9 -(NH-R 9 ) k -NHCO) x -(R F2 -CONH-R 9' -NHCO) x' -R F2 -CONH-R 22 -SiR 1 n' R 2 3-n' .

接著,將所得到之化合物,與下述式所表示之化合物進行反應, Next, the obtained compound is reacted with a compound represented by the following formula:

R34-R35-OCOCH=CH2 R 34 -R 35 -OCOCH=CH 2

[式中,R34為-NCO、-COOH等反應性基, [In the formula, R 34 is a reactive group such as -NCO, -COOH, etc.,

R35為二價基] R 35 is a divalent base]

藉此可得到式(1)所表示之化合物。 Thereby, the compound represented by formula (1) can be obtained.

上述反應之各步驟的反應條件可由所屬技術領域具有通常知識者來適當地設定。 The reaction conditions of each step of the above reaction can be appropriately set by those with ordinary knowledge in the art.

接著,說明本揭示之表面處理劑。 Next, the surface treatment agent of this disclosure will be described.

本揭示之表面處理劑係含有式(1)所表示之含至少1種氟聚醚基之丙烯酸化合物。 The surface treatment agent of the present disclosure contains an acrylic compound represented by formula (1) and containing at least one fluoropolyether group.

於一態樣中,本揭示之表面處理劑中,含氟聚醚基之丙烯酸化合物為式(1)所表示之化合物。 In one aspect, in the surface treatment agent of the present disclosure, the fluorine-containing polyether group-containing acrylic compound is a compound represented by formula (1).

相對於表面處理劑整體,上述式(1)所表示之化合物的含量較佳為0.1至50.0質量%,更佳為1.0至30.0質量%,更佳為5.0至25.0質量%,特佳可為10.0至20.0質量%。藉由將上述含氟聚醚基之丙烯酸化合物的含量設為上述範圍,可得到更高的撥水撥油性及磨耗耐久性。 Relative to the entire surface treatment agent, the content of the compound represented by the above formula (1) is preferably 0.1 to 50.0 mass%, more preferably 1.0 to 30.0 mass%, more preferably 5.0 to 25.0 mass%, and particularly preferably 10.0 to 20.0% by mass. By setting the content of the acrylic compound of the fluorine-containing polyether group within the above range, higher water and oil repellency and abrasion durability can be obtained.

本揭示之表面處理劑可含有:溶劑、可理解為含氟油之(非反應性的)氟聚醚化合物,較佳為全氟(聚)醚化合物(以下統稱為「含氟油」)、可理解為聚矽氧油之(非反應性的)聚矽氧化合物(以下稱為「聚矽氧油」)、醇類、觸媒、界面活性劑、聚合抑制劑、敏化劑等。 The surface treatment agent of the present disclosure may contain: a solvent, a (non-reactive) fluoropolyether compound that can be understood as a fluorine-containing oil, preferably a perfluoro(poly)ether compound (hereinafter collectively referred to as "fluorine-containing oil"), It can be understood as the (non-reactive) polysilicone compound of polysilicone oil (hereinafter referred to as "polysilicone oil"), alcohols, catalysts, surfactants, polymerization inhibitors, sensitizers, etc.

上述溶劑可列舉例如:己烷、環己烷、庚烷、辛烷、壬烷、癸烷、十一烷、十二烷、礦物精等脂肪族烴類;苯、甲苯、二甲苯、萘、溶劑油(Solvent Naphtha)等芳香族烴類;乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸正丁酯、乙酸異丙酯、乙酸異丁酯、乙酸溶纖劑、丙二醇甲醚乙酸酯、乙酸卡必醇、草酸二乙酯、丙酮酸乙酯、丁酸乙基-2-羥酯、乙醯乙酸乙酯、乙酸戊酯、乳酸甲酯、乳酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、2-羥基異丁酸甲酯、2-羥基異丁酸乙酯等酯類;丙酮、丁酮、甲基異丁酮、2-己酮、環己酮、甲基胺酮、2-庚酮等酮類;乙基溶纖劑、甲基溶纖劑、甲基溶纖劑乙酸酯、乙基溶纖劑乙酸酯、丙二醇單甲醚、丙二醇單乙醚、丙二醇單丁醚、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙二醇單丁醚乙酸酯、二丙二醇二甲醚、乙二醇單烷醚等二醇醚類;甲醇、乙醇、異丙醇、正丁醇、異丁醇、第三丁醇、第二丁醇、3-戊醇、辛醇、3-甲基-3-甲氧基丁醇、第三戊醇等醇類;乙二醇、丙二醇等二醇類;四氫呋喃(Tetrahydrofuran)、四氫吡喃(Tetrahydropyran)、二噁烷等環狀醚類;N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等醯胺類;甲基溶纖劑、溶纖劑、異丙基溶纖劑、丁基溶纖劑、二乙二醇單甲醚等醚醇類;二乙二醇單乙醚乙酸酯;1,1,2-三氯-1,2,2-三氟乙烷、1,2-二氯-1,1,2,2-四氟乙烷、二甲基亞碸、1,1-二氯-1,2,2,3,3-五氟丙烷(HCFC225)、Zeorora H、HFE7100、HFE7200、HFE7300、CF3CH2OH、CF3CF2CH2OH、(CF3)2CHOH等含氟溶劑等。或是可列舉此等之2種以上的混合溶劑等。 Examples of the solvent include aliphatic hydrocarbons such as hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, and mineral spirits; benzene, toluene, xylene, naphthalene, Aromatic hydrocarbons such as solvent naphtha; methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, isopropyl acetate, isobutyl acetate, cellosolve acetate, propylene glycol methyl ether acetate , carbitol acetate, diethyl oxalate, ethyl pyruvate, ethyl butyrate-2-hydroxy ester, ethyl acetate, amyl acetate, methyl lactate, ethyl lactate, 3-methoxypropyl Methyl acid ester, ethyl 3-methoxypropionate, methyl 2-hydroxyisobutyrate, ethyl 2-hydroxyisobutyrate and other esters; acetone, butanone, methyl isobutyl ketone, 2-hexanone , cyclohexanone, methylamine ketone, 2-heptanone and other ketones; ethyl cellosolve, methyl cellosolve, methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol mono Methyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol dimethyl ether, ethylene glycol monoalkyl ether and other glycols Ethers; methanol, ethanol, isopropanol, n-butanol, isobutanol, tert-butanol, sec-butanol, 3-pentanol, octanol, 3-methyl-3-methoxybutanol, Alcohols such as pentanol; glycols such as ethylene glycol and propylene glycol; cyclic ethers such as tetrahydrofuran, tetrahydropyran, and dioxane; N,N-dimethylformamide , N,N-dimethylacetamide and other amide; methyl cellosolve, cellosolve, isopropyl cellosolve, butyl cellosolve, diethylene glycol monomethyl ether and other ether alcohols; Ethylene glycol monoethyl ether acetate; 1,1,2-trichloro-1,2,2-trifluoroethane, 1,2-dichloro-1,1,2,2-tetrafluoroethane, dichloroethane Methylene, 1,1-dichloro-1,2,2,3,3-pentafluoropropane (HCFC225), Zeorora H, HFE7100, HFE7200, HFE7300, CF 3 CH 2 OH, CF 3 CF 2 CH 2 Fluorine-containing solvents such as OH, (CF 3 ) 2 CHOH, etc. Alternatively, a mixed solvent of two or more of these may be used.

含氟油並無特別限定,可列舉例如下列通式(3)所表示之化合物(全氟(聚)醚化合物)。 The fluorine-containing oil is not particularly limited, and examples thereof include compounds represented by the following general formula (3) (perfluoro(poly)ether compounds).

Rf5-(OC4F8)a’-(OC3F6)b’-(OC2F4)c’-(OCF2)d’-Rf6...(3) Rf 5 -(OC 4 F 8 ) a' -(OC 3 F 6 ) b' -(OC 2 F 4 ) c' -(OCF 2 ) d' -Rf 6 . . . (3)

式中,Rf5表示可經1個以上的氟原子取代之碳數1至16烷基(較佳為C1-16的全氟烷基),Rf6表示可經1個以上的氟原子取代之碳數1至16烷基(較佳為C1-16全氟烷基)、氟原子或氫原子,Rf5及Rf6更佳係分別獨立地為C1-3全氟烷基。 In the formula, Rf 5 represents an alkyl group having 1 to 16 carbon atoms that may be substituted by one or more fluorine atoms (preferably a C 1-16 perfluoroalkyl group), and Rf 6 represents an alkyl group that may be substituted with one or more fluorine atoms. an alkyl group having 1 to 16 carbon atoms (preferably a C 1-16 perfluoroalkyl group), a fluorine atom or a hydrogen atom, and Rf 5 and Rf 6 are more preferably each independently a C 1-3 perfluoroalkyl group.

a’、b’、c’及d’分別表示構成聚合物的主骨架之全氟(聚)醚的4種重複單元數,且相互獨立地為0以上300以下的整數,a’、b’、c’及d’之和至少為1,較佳為1至300,更佳為20至300。標註下標a’、b’、c’或d’並以括弧括起之各重複單元的存在順序於式中為任意。此等重複單元中,-(OC4F8)-可為-(OCF2CF2CF2CF2)-、-(OCF(CF3)CF2CF2)-、-(OCF2CF(CF3)CF2)-、-(OCF2CF2CF(CF3))-、-(OC(CF3)2CF2)-、-(OCF2C(CF3)2)-、-(OCF(CF3)CF(CF3))-、-(OCF(C2F5)CF2)-及(OCF2CF(C2F5))-中任一者,較佳為-(OCF2CF2CF2CF2)-。-(OC3F6)-可為-(OCF2CF2CF2)-、-(OCF(CF3)CF2)-及(OCF2CF(CF3))-中任一者,較佳為-(OCF2CF2CF2)-。-(OC2F4)-可為-(OCF2CF2)-及(OCF(CF3))-中任一者,較佳為-(OCF2CF2)-。 a', b', c' and d' respectively represent the number of the four repeating units of the perfluoro (poly) ether constituting the main skeleton of the polymer, and are independently integers from 0 to 300. a', b' The sum of , c' and d' is at least 1, preferably 1 to 300, more preferably 20 to 300. The order of existence of each repeating unit marked with the subscript a', b', c' or d' and enclosed in parentheses is arbitrary in the formula. Among these repeating units, -(OC 4 F 8 )- can be -(OCF 2 CF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 CF 2 )-, -(OCF 2 CF(CF 3 )CF 2 )-,-(OCF 2 CF 2 CF(CF 3 ))-,-(OC(CF 3 ) 2 CF 2 )-,-(OCF 2 C(CF 3 ) 2 )-,-(OCF Any one of (CF 3 )CF(CF 3 ))-, -(OCF(C 2 F 5 )CF 2 )- and (OCF 2 CF(C 2 F 5 ))-, preferably -(OCF 2 CF 2 CF 2 CF 2 )-. -(OC 3 F 6 )- can be any one of -(OCF 2 CF 2 CF 2 )-, -(OCF(CF 3 )CF 2 )- and (OCF 2 CF(CF 3 ))-, preferably is -(OCF 2 CF 2 CF 2 )-. -(OC 2 F 4 )- may be any one of -(OCF 2 CF 2 )- and (OCF(CF 3 ))-, and is preferably -(OCF 2 CF 2 )-.

上述通式(3)所表示之全氟(聚)醚化合物的例子可列舉:下列通式(3a)及(3b)中任一者所表示之化合物(可為1種或2種以上的混合物)。 Examples of perfluoro(poly)ether compounds represented by the above general formula (3) include: compounds represented by either of the following general formulas (3a) and (3b) (which may be one type or a mixture of two or more types) ).

Rf5-(OCF2CF2CF2)b"-Rf6...(3a) Rf 5 -(OCF 2 CF 2 CF 2 ) b" -Rf 6 ...(3a)

Rf5-(OCF2CF2CF2CF2)a”-(OCF2CF2CF2)b”-(OCF2CF2)c”-(OCF2)d”-Rf6...(3b) Rf 5 -(OCF 2 CF 2 CF 2 CF 2 ) a” -(OCF 2 CF 2 CF 2 ) b” -(OCF 2 CF 2 ) c” -(OCF 2 ) d” -Rf 6 . . . (3b)

此等式中,Rf5及Rf6如上所述;於式(3a)中,b”為1以上100以下的整數;於式(3b)中,a”及b”分別獨立地為0以上30以下的整數,c”及d” 分別獨立地為1以上300以下的整數。標註下標a”、b”、c”、d”並以括弧括起之各重複單元的存在順序於式中為任意。 In this equation, Rf 5 and Rf 6 are as described above; in formula (3a), b” is an integer from 1 to 100; in formula (3b), a” and b” are independently from 0 to 30 The following integers, c” and d” are independently integers from 1 to 300. The order of existence of each repeating unit marked with subscripts a”, b”, c”, d” and enclosed in parentheses is in the formula: Any.

再者,從其他觀點而言,含氟油可為通式Rf3-F(式中,Rf3為C5-16全氟烷基)所表示之化合物。再者,亦可為氯三氟乙烯寡聚物。 Furthermore, from another point of view, the fluorine-containing oil can be a compound represented by the general formula Rf 3 -F (in the formula, Rf 3 is a C 5-16 perfluoroalkyl group). Furthermore, it may also be a chlorotrifluoroethylene oligomer.

上述含氟油可具有500至10000的平均分子量。含氟油的分子量可使用GPC測定。 The above-mentioned fluorine-containing oil may have an average molecular weight of 500 to 10,000. The molecular weight of fluorinated oil can be determined using GPC.

相對於本揭示之表面處理劑,含氟油可含有例如0至50質量%,較佳為0至30質量%,更佳為0至5質量%。於一態樣中,本揭示之表面處理劑實質上不含含氟油。所謂實質上不含含氟油,意指完全不含含氟油或可含有極微量的含氟油。 Relative to the surface treatment agent of the present disclosure, the fluorine-containing oil may contain, for example, 0 to 50 mass%, preferably 0 to 30 mass%, and more preferably 0 to 5 mass%. In one aspect, the surface treatment agent of the present disclosure is substantially free of fluorinated oil. The so-called substantially free of fluorinated oil means that it does not contain fluorinated oil at all or may contain a very small amount of fluorinated oil.

於一態樣中,可將含氟油的平均分子量設為大於含氟聚醚基之丙烯酸化合物的平均分子量。藉由設為此平均分子量,尤其在藉由真空蒸鍍法來形成表面處理層時,可得到更優異的磨耗耐久性及表面平滑性。 In one aspect, the average molecular weight of the fluorine-containing oil can be set to be greater than the average molecular weight of the acrylic compound containing the fluorine-containing polyether group. By setting the average molecular weight to this, more excellent abrasion durability and surface smoothness can be obtained, especially when the surface treatment layer is formed by vacuum evaporation.

於一態樣中,可將含氟油的平均分子量設為小於含氟聚醚基之丙烯酸化合物的平均分子量。藉由設為此平均分子量,可抑制從該化合物所得到之表面處理層之透明性的降低,並形成具有高磨耗耐久性及高表面平滑性之硬化物。 In one aspect, the average molecular weight of the fluorine-containing oil can be set to be smaller than the average molecular weight of the acrylic compound containing the fluorine-containing polyether group. By setting the average molecular weight to this, it is possible to suppress a decrease in the transparency of the surface treatment layer obtained from this compound and form a hardened product having high abrasion durability and high surface smoothness.

含氟油係有益於提升由本揭示之表面處理劑所形成之層的表面平滑性。 Fluorine-containing oil is beneficial to improving the surface smoothness of the layer formed by the surface treatment agent of the present disclosure.

上述聚矽氧油可使用例如矽氧烷鍵為2,000以下之直鏈狀或環狀的聚矽氧油。直鏈狀的聚矽氧油可為所謂純聚矽氧油(straight silicone oil)及改性聚矽氧油。純聚矽氧油可列舉:二甲基聚矽氧油、甲基苯基聚矽 氧油、甲基氫聚矽氧油。改性聚矽氧油可列舉:藉由烷基、芳烷基、聚醚、高級脂肪酸酯、氟烷基、胺基、環氧基、羧基、醇等將純聚矽氧油進行改性者。環狀聚矽氧油可列舉例如環狀二甲基矽氧烷油等。 As the polysiloxane oil, for example, a linear or cyclic polysiloxane oil having a siloxane bond number of 2,000 or less can be used. The linear polysilicone oil can be so-called straight silicone oil and modified polysilicone oil. Pure polysilicone oil can be listed as: dimethyl polysilicone oil, methylphenyl polysiloxane Oxygen oil, methyl hydrogen polysiloxane oil. Modified polysilicone oil can be enumerated: pure polysilicone oil is modified by alkyl groups, aralkyl groups, polyethers, higher fatty acid esters, fluoroalkyl groups, amine groups, epoxy groups, carboxyl groups, alcohols, etc. By. Examples of the cyclic polysiloxane oil include cyclic dimethylsiloxane oil.

本揭示之表面處理劑中,相對於上述本揭示之含氟聚醚基之丙烯酸化合物的合計100質量份(2種以上時為此等之合計,以下亦同),該聚矽氧油例如可以0至300質量份,較佳以50至200質量份含有。 In the surface treatment agent of the present disclosure, the polysiloxane oil may be, for example, relative to a total of 100 parts by mass of the fluorine-containing polyether group acrylic compounds of the present disclosure (when there are two or more types, the total of these, the same applies below). 0 to 300 parts by mass, preferably 50 to 200 parts by mass.

聚矽氧油係有益於提升表面處理層的表面平滑性。 Polysilicone oil is beneficial to improve the surface smoothness of the surface treatment layer.

上述醇類例如為可經1個以上的氟原子取代之碳數1至6的醇,可列舉例如:甲醇、乙醇、異丙醇、第三丁醇、CF3CH2OH、CF3CF2CH2OH、(CF3)2CHOH。藉由將此等醇類添加於表面處理劑,以提升表面處理劑的穩定性,並且改善含全氟聚醚基之丙烯酸化合物與溶劑之相溶性。 The above-mentioned alcohols are, for example, alcohols having 1 to 6 carbon atoms which may be substituted by one or more fluorine atoms. Examples include: methanol, ethanol, isopropyl alcohol, tert-butanol, CF 3 CH 2 OH, CF 3 CF 2 CH 2 OH, (CF 3 ) 2 CHOH. By adding these alcohols to the surface treatment agent, the stability of the surface treatment agent is enhanced, and the compatibility between the perfluoropolyether group-containing acrylic compound and the solvent is improved.

上述醇較佳為2,2,3,3,3-五氟-1-丙醇或2,2,2-三氟乙醇。 The above-mentioned alcohol is preferably 2,2,3,3,3-pentafluoro-1-propanol or 2,2,2-trifluoroethanol.

上述觸媒可列舉酸(例如乙酸、三氟乙酸等)、鹼(例如氨、三乙胺、二乙胺等)、過渡金屬(例如Ti、Ni、Sn等)等。 Examples of the catalyst include acids (such as acetic acid, trifluoroacetic acid, etc.), bases (such as ammonia, triethylamine, diethylamine, etc.), transition metals (such as Ti, Ni, Sn, etc.).

觸媒係促進本揭示之含氟聚醚基之丙烯酸化合物的水解、脫水縮合或聚合,促進藉由本揭示之表面處理劑所形成之層的形成。 The catalyst promotes the hydrolysis, dehydration condensation or polymerization of the fluorine-containing polyether group acrylic compound of the present disclosure, and promotes the formation of the layer formed by the surface treatment agent of the present disclosure.

其他成分除了上述之外,亦可列舉例如:四乙氧矽烷、甲基三甲氧矽烷、3-胺丙基三甲氧矽烷、3-環氧丙氧基丙基三甲氧矽烷、甲基三乙醯氧矽烷等。 In addition to the above, examples of other ingredients include: tetraethoxysilane, methyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, and methyltriethoxysilane. Oxysilane, etc.

本揭示之表面處理劑可含浸於多孔質物質(例如多孔質的陶瓷材料)、金屬纖維(例如鋼絲絨)經固定為棉狀者而構成為顆粒。該顆粒例如可使用在真空蒸鍍。 The surface treatment agent of the present disclosure can be impregnated with porous materials (such as porous ceramic materials) or metal fibers (such as steel wool) and fixed into cotton-like shapes to form particles. The particles can be used in vacuum evaporation, for example.

本揭示之表面處理劑除了上述成分之外,亦可微量地含有例如Pt、Rh、Ru、1,3-二乙烯基四甲基二矽氧烷、三苯基膦、NaCl、KCl、矽烷的縮合物等雜質。 In addition to the above-mentioned components, the surface treatment agent of the present disclosure may also contain trace amounts of Pt, Rh, Ru, 1,3-divinyltetramethyldisiloxane, triphenylphosphine, NaCl, KCl, and silane. Condensation products and other impurities.

以下說明本揭示之物品。 The following describes the items disclosed.

本揭示之物品係包含:基材、以及於該基材表面上由本揭示之表面處理劑所形成之層(表面處理層)。 The article of the present disclosure includes: a substrate, and a layer (surface treatment layer) formed on the surface of the substrate by the surface treatment agent of the present disclosure.

本揭示中可使用之基材例如可由玻璃、樹脂(天然或合成樹脂,例如可為一般的塑膠材料)、金屬、陶瓷、半導體(矽、鍺等)、纖維(織物、不織布等)、毛皮、皮革、木材、陶瓷器、石材等,建築構件等、衛生用品之任意的適當材料構成。 The substrate that can be used in the present disclosure can be made of, for example, glass, resin (natural or synthetic resin, such as general plastic materials), metal, ceramics, semiconductors (silicon, germanium, etc.), fibers (fabrics, non-woven fabrics, etc.), fur, It can be composed of any suitable material such as leather, wood, ceramics, stone, etc., building components, etc., and sanitary products.

例如,在應製造之物品為光學構件時,構成基材的表面之材料可為光學構件用材料,例如玻璃或透明塑膠等。再者,在應製造之物品為光學構件時,可於基材的表面(最外層)形成某些層(或膜),例如硬塗層或抗反射層等。抗反射層可使用單層抗反射層及多層抗反射層中任一種。可使用於抗反射層之無機物的例子可列舉:SiO2、SiO、ZrO2、TiO2、TiO、Ti2O3、Ti2O5、Al2O3、Ta2O5、Ta3O5、Nb2O5、HfO2、Si3N4、CeO2、MgO、Y2O3、SnO2、MgF2、WO3等。此等無機物可單獨使用或組合此等的2種以上(例如混合物)而使用。在構成為多層抗反射層時,於該最外層較佳係使用SiO2及/或SiO。在應製造之物品為觸控面板用的光學玻璃零件時,可於 基材(玻璃)之表面的一部分上具有透明電極,例如使用氧化銦錫(ITO:Indium Tin Oxide)或氧化銦鋅等之薄膜。再者,基材可因應其具體性規格等,具有絕緣層、黏著層(Pressure-sensitive Layer)、保護層、裝飾框層(I-CON)、霧化膜層、硬塗膜層、偏光膜、相位差膜及液晶顯示模組等。 For example, when the article to be manufactured is an optical component, the material constituting the surface of the base material may be a material for optical components, such as glass or transparent plastic. Furthermore, when the article to be manufactured is an optical component, certain layers (or films), such as hard coating layers or anti-reflective layers, can be formed on the surface (outermost layer) of the substrate. As the anti-reflection layer, either a single-layer anti-reflection layer or a multi-layer anti-reflection layer can be used. Examples of inorganic substances that can be used in the anti-reflective layer include: SiO 2 , SiO, ZrO 2 , TiO 2 , TiO, Ti 2 O 3 , Ti 2 O 5 , Al 2 O 3 , Ta 2 O 5 , Ta 3 O 5 , Nb 2 O 5 , HfO 2 , Si 3 N 4 , CeO 2 , MgO, Y 2 O 3 , SnO 2 , MgF 2 , WO 3 , etc. These inorganic substances can be used individually or in combination of 2 or more types (for example, a mixture). When forming a multi-layer anti-reflection layer, SiO 2 and/or SiO is preferably used in the outermost layer. When the article to be manufactured is an optical glass component for a touch panel, a transparent electrode may be provided on part of the surface of the base material (glass), such as using indium tin oxide (ITO: Indium Tin Oxide) or indium zinc oxide. film. Furthermore, the base material can have an insulating layer, an adhesive layer (Pressure-sensitive Layer), a protective layer, a decorative frame layer (I-CON), an atomized film layer, a hard coating layer, and a polarizing film according to its specific specifications, etc. , phase difference film and liquid crystal display module, etc.

上述基材的形狀並無特別限定,可為例如板狀、膜及其他形態。再者,應形成表面處理劑層之基材的表面區域只要是基材表面的至少一部分即可,可因應應製造之物品的用途及具體規格等來適當地決定。 The shape of the base material is not particularly limited, and may be, for example, plate-shaped, film-shaped, or other forms. Furthermore, the surface area of the base material where the surface treatment agent layer should be formed only needs to be at least a part of the surface of the base material, and can be appropriately determined according to the use and specific specifications of the article to be manufactured.

於一態樣中,該基材之至少其表面部分可為由原先具有羥基之材料所構成者。該材料可列舉玻璃,又,可列舉:表面形成有自然氧化膜或熱氧化膜之金屬(尤其是卑金屬)、陶瓷、半導體等。或是,如樹脂等般雖具有羥基但不充分時,或原先不具有羥基時,可藉由對基材施以某種前處理而在基材的表面上導入或增加羥基。該前處理的例子可列舉電漿處理(例如電暈放電)或離子束照射。電漿處理可在基材表面上導入或增加羥基,並且亦適合應用在淨化基材表面(去除雜質等)者。再者,該前處理的其他例子可列舉:藉由LB法(Langmuir-Blodgett法)或化學吸附法等,預先以單分子膜的型態將具有碳-碳不飽和鍵之界面吸附劑形成於基材表面,然後在包含氧或氮等之環境下將不飽和鍵進行開裂之方法。 In one aspect, at least a surface portion of the substrate may be composed of a material that originally has hydroxyl groups. Examples of the material include glass, metals (especially base metals) with natural oxide films or thermal oxide films formed on their surfaces, ceramics, and semiconductors. Alternatively, when resins and the like have hydroxyl groups but are insufficient, or when they do not originally have hydroxyl groups, hydroxyl groups can be introduced or added to the surface of the base material by subjecting the base material to some kind of pretreatment. Examples of this pretreatment include plasma treatment (such as corona discharge) or ion beam irradiation. Plasma treatment can introduce or add hydroxyl groups on the surface of the substrate, and is also suitable for use in purifying the surface of the substrate (removing impurities, etc.). Furthermore, other examples of this pretreatment can include: using the LB method (Langmuir-Blodgett method) or chemical adsorption method to form an interfacial adsorbent with a carbon-carbon unsaturated bond in the form of a monomolecular film in advance. A method of cracking unsaturated bonds on the surface of a substrate and then cracking the unsaturated bonds in an environment containing oxygen or nitrogen.

於其他態樣中,該基材之至少其表面部分可由具有1個以上其他反應性基,例如Si-H基之聚矽氧化合物,或含有烷氧矽烷之材料所構成。 In other aspects, at least the surface portion of the substrate may be composed of a polysiloxy compound having one or more other reactive groups, such as Si-H groups, or a material containing alkoxysilane.

於較佳態樣中,上述基材為玻璃。該玻璃較佳為藍寶石玻璃、鈉鈣玻璃、鹼鋁矽酸鹽玻璃、硼矽酸玻璃、無鹼玻璃、結晶玻璃、石英玻 璃,特佳為經化學強化之鈉鈣玻璃、經化學強化之鹼鋁矽酸鹽玻璃、以及經化學鍵結之硼矽酸玻璃。 In a preferred aspect, the above-mentioned base material is glass. The glass is preferably sapphire glass, soda-lime glass, alkali aluminosilicate glass, borosilicate glass, alkali-free glass, crystallized glass, quartz glass Glass, particularly preferably chemically strengthened soda-lime glass, chemically strengthened alkali aluminosilicate glass, and chemically bonded borosilicate glass.

本揭示之物品可藉由將上述本揭示之表面處理劑的層形成於上述基材的表面上,且因應所需對此層進行後處理,藉此從本揭示之表面處理劑來形成層而製造。 Articles of the present disclosure may be formed from the surface treatment agent of the present disclosure by forming a layer of the surface treatment agent of the present disclosure on the surface of the substrate and post-processing the layer as necessary, thereby forming a layer of the surface treatment agent of the present disclosure. manufacturing.

本揭示之表面處理劑的層形成可以被覆該表面之方式,藉由將上述表面處理劑適用於基材的表面而實施。被覆方法並無特別限定。可使用例如濕潤被覆法及乾燥被覆法。 The layer formation of the surface treatment agent of the present disclosure can be carried out by applying the above surface treatment agent to the surface of the substrate in a manner that covers the surface. The covering method is not particularly limited. For example, a wet coating method and a dry coating method can be used.

濕潤被覆法的例子可列舉:浸漬塗佈、旋轉塗佈、流動塗佈、噴霧塗佈、輥塗佈、凹版塗佈及類似的方法。 Examples of wet coating methods include dip coating, spin coating, flow coating, spray coating, roll coating, gravure coating and similar methods.

乾燥被覆法的例子可列舉蒸鍍(通常為真空蒸鍍)、濺鍍、CVD及類似的方法。蒸鍍法(通常為真空蒸鍍法)的具體例可列舉:電阻加熱、電子束、使用微波等之高頻加熱、離子束及類似的方法。CVD方法的具體例可列舉:電漿CVD、光學CVD、熱CVD及類似的方法。 Examples of dry coating methods include evaporation (usually vacuum evaporation), sputtering, CVD and similar methods. Specific examples of the evaporation method (usually a vacuum evaporation method) include resistance heating, electron beam, high-frequency heating using microwaves, ion beam, and similar methods. Specific examples of the CVD method include plasma CVD, optical CVD, thermal CVD and similar methods.

再者,亦可藉由常壓電漿法來被覆。 Furthermore, it can also be coated by atmospheric pressure plasma method.

在使用濕潤被覆法時,本揭示之表面處理劑可在以溶劑稀釋後適用在基材表面。從本揭示之組成物的穩定性及溶劑的揮發性之觀點而言,適合使用下列溶劑:碳數5至12的全氟脂肪族烴(例如全氟己烷、全氟甲基環己烷及全氟-1,3-二甲基環己烷);聚氟芳香族烴(例如雙(三氟甲基)苯);聚氟脂肪族烴(例如C6F13CH2CH3(例如旭硝子股份有限公司製的Asahiklin(註冊商標)AC-6000)、1,1,2,2,3,3,4-七氟環戊烷(例如Zeon Japan股份有限公司製的Zeorora(註冊商標)H);氫氟醚(HFE)(例如全氟丙基甲醚 (C3F7OCH3)(例如Sumitomo 3M股份有限公司製的Novec(商標)7000)、全氟丁基甲醚(C4F9OCH3)(例如Sumitomo 3M股份有限公司製的Novec(商標)7100)、全氟丁基乙醚(C4F9OC2H5)(例如Sumitomo 3M股份有限公司製的Novec(商標)7200)、全氟己基甲醚(C2F5CF(OCH3)C3F7)(例如Sumitomo 3M股份有限公司製的Novec(商標)7300)等烷基全氟烷醚(全氟烷基及烷基可為直鏈或分枝狀)、或CF3CH2OCF2CHF2(例如旭硝子股份有限公司製的Asahiklin(註冊商標)AE-3000))等。此等溶劑可單獨使用或作為2種以上的混合物而使用。當中較佳為氫氟醚,特佳為全氟丁基甲醚(C4F9OCH3)及/或全氟丁基甲醚(C4F9OCH3)。 When using the wet coating method, the surface treatment agent of the present disclosure can be applied to the surface of the substrate after being diluted with a solvent. From the viewpoint of the stability of the composition of the present disclosure and the volatility of the solvent, the following solvents are suitable for use: perfluoroaliphatic hydrocarbons with 5 to 12 carbon atoms (such as perfluorohexane, perfluoromethylcyclohexane and Perfluoro-1,3-dimethylcyclohexane); Polyfluoroaromatic hydrocarbons (e.g. bis(trifluoromethyl)benzene); Polyfluoroaliphatic hydrocarbons (e.g. C 6 F 13 CH 2 CH 3 (e.g. Asahi Glass Asahiklin (registered trademark) AC-6000 manufactured by Zeon Japan Co., Ltd.), 1,1,2,2,3,3,4-heptafluorocyclopentane (such as Zeorora (registered trademark) H manufactured by Zeon Japan Co., Ltd.) ; Hydrofluoroether (HFE) (such as perfluoropropyl methyl ether (C 3 F 7 OCH 3 ) (such as Novec (trademark) 7000 manufactured by Sumitomo 3M Co., Ltd.), perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) (for example, Novec (trademark) 7100 manufactured by Sumitomo 3M Co., Ltd.), perfluorobutyl ether (C 4 F 9 OC 2 H 5 ) (for example, Novec (trademark) 7200 manufactured by Sumitomo 3M Co., Ltd.), perfluorobutyl ether (C 4 F 9 OC 2 H 5 ) (for example, Novec (trademark) 7200 manufactured by Sumitomo 3M Co., Ltd.), perfluorobutyl ether Alkyl perfluoroalkyl ethers ( perfluoroalkyl and alkyl groups can be linear or branched), or CF 3 CH 2 OCF 2 CHF 2 (for example, Asahiklin (registered trademark) AE-3000 manufactured by Asahi Glass Co., Ltd.)), etc. These solvents can be used alone or as a mixture of two or more kinds. Among them, hydrofluoroethers are preferred, and perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) and/or perfluorobutyl methyl ether (C 4 F 9 OCH 3 ) are particularly preferred.

在使用乾燥被覆法時,本揭示之表面處理劑可直接使用在乾燥被覆法,或以上述溶劑稀釋後使用在乾燥被覆法。 When using the dry coating method, the surface treatment agent of the present disclosure can be used directly in the dry coating method, or can be used in the dry coating method after being diluted with the above solvent.

表面處理劑的層形成,較佳係於層中以使本揭示之表面處理劑與用以水解及脫水縮合之觸媒共同存在之方式來實施。簡便而言,於藉由濕潤被覆法來進行時,在以溶劑稀釋本揭示之表面處理劑後,可於即將適用在基材表面時將觸媒添加於本揭示之表面處理劑的稀釋液。於藉由乾燥被覆法來進行時,可將添加有觸媒之本揭示之表面處理劑直接進行蒸鍍(通常為真空蒸鍍)處理,或是使添加有觸媒之本揭示之表面處理劑含浸於鐵或銅等金屬多孔體而成為顆粒狀物質,使用此顆粒狀物質來進行蒸鍍(通常為真空蒸鍍)處理。 The layer formation of the surface treatment agent is preferably carried out in such a manner that the surface treatment agent of the present disclosure and the catalyst for hydrolysis and dehydration condensation coexist in the layer. To put it simply, when the wet coating method is used, after diluting the surface treatment agent of the present disclosure with a solvent, a catalyst can be added to the diluted liquid of the surface treatment agent of the present disclosure when it is about to be applied to the surface of the substrate. When carried out by the dry coating method, the surface treatment agent disclosed in the disclosure with a catalyst added can be directly evaporated (usually vacuum evaporation), or the surface treatment agent disclosed in the disclosure added with a catalyst can be used. It is impregnated into a porous metal such as iron or copper to form a granular substance, and the granular substance is used to perform evaporation (usually vacuum evaporation) processing.

觸媒可使用任意適當的酸或鹼。酸觸媒可使用例如乙酸、甲酸、三氟乙酸等。再者,鹼觸媒可使用例如氨、有機胺類等。 Any suitable acid or alkali can be used as the catalyst. As the acid catalyst, for example, acetic acid, formic acid, trifluoroacetic acid, etc. can be used. In addition, ammonia, organic amines, etc. can be used as an alkali catalyst, for example.

本揭示之物品所含有之表面處理層係具有高磨耗耐久性。再者,上述表面處理層除了高磨耗耐久性之外,雖因所使用之表面處理劑的組成而不同,惟亦可具有撥水性、撥油性、防污性(例如防止指紋等髒污的附著)、防水性(防止水往電子零件等之浸入)、表面平滑性(或潤滑性,例如指紋等髒污的拭除性,或是對手指而言的優異觸感)、耐藥性等,而適合作為功能性薄膜使用。 Articles of the present disclosure contain surface treatments that provide high wear durability. Furthermore, in addition to high abrasion durability, the above-mentioned surface treatment layer may also have water repellency, oil repellency, and antifouling properties (for example, preventing the adhesion of dirt such as fingerprints) depending on the composition of the surface treatment agent used. ), waterproofing (preventing water from penetrating into electronic parts, etc.), surface smoothness (or lubricity, such as the ability to remove dirt such as fingerprints, or excellent touch to fingers), drug resistance, etc., It is suitable for use as a functional film.

因此,本揭示亦進一步關於在最外層具有上述表面處理層之光學材料。 Therefore, the present disclosure further relates to optical materials having the above-mentioned surface treatment layer on the outermost layer.

光學材料除了與後述例示的顯示器等相關之光學材料之外,較佳可列舉各式各樣的光學材料:例如陰極射線管(CRT;例如電腦螢幕)、液晶顯示器、電漿顯示器、有機EL顯示器、無機薄膜EL點矩陣顯示器、背投影型顯示器、真空螢光顯示器(VFD;Vacuum Fluorescent Display)、場放射顯示器(FED;Field Emission Display)等顯示器或該等顯示器的保護板、或於該等的表面上施以抗反射膜處理者。 In addition to the optical materials related to displays and the like exemplified below, the optical materials are preferably various optical materials: for example, cathode ray tubes (CRT; for example, computer monitors), liquid crystal displays, plasma displays, and organic EL displays. , inorganic thin film EL dot matrix display, rear projection display, vacuum fluorescent display (VFD; Vacuum Fluorescent Display), field emission display (FED; Field Emission Display) and other displays or the protective plates of such displays, or in such displays Those with anti-reflective film treatment on the surface.

本揭示之物品並無特別限定,可為光學構件。光學構件的例子可列舉下列者:眼鏡等鏡片;PDP、LCD等顯示器的前面保護板、抗反射板、偏光板、防眩板;行動電話、可攜式資訊終端等機器的觸控面板片;藍光(Blu-ray(註冊商標))光碟、DVD光碟、CD-R、MO等光碟的碟片面;光纖;時鐘的顯示面等。 The object of the present disclosure is not particularly limited and may be an optical component. Examples of optical components include the following: lenses such as glasses; front protective plates, anti-reflective plates, polarizing plates, and anti-glare plates for displays such as PDP and LCD; touch panels for mobile phones, portable information terminals, and other equipment; The disc surface of Blu-ray (registered trademark) discs, DVD discs, CD-R, MO and other optical discs; optical fiber; the display surface of clocks, etc.

再者,本揭示之物品可為醫療機器或醫療材料。再者,具有藉由本揭示所得到之層的物品亦可為汽車的內外裝構件。外裝構件的例子 可列舉下列者:車窗、頭燈罩、車外鏡頭罩。內裝構件的例子可列舉下列者:儀錶板外罩、導航系統觸控面板、裝飾內裝構件。 Furthermore, the items disclosed herein may be medical machines or medical materials. Furthermore, the article having the layer obtained by the present disclosure may also be an interior or exterior component of a car. Examples of exterior components The following can be listed: car windows, headlight covers, exterior lens covers. Examples of interior components include the following: instrument panel covers, navigation system touch panels, and decorative interior components.

上述層的厚度並無特別限定。於光學構件時,從光學性能、磨耗耐久性及防污性之點而言,上述層的厚度較佳為1至50nm、1至30nm,更佳為1至15nm的範圍。 The thickness of the above layer is not particularly limited. In the case of optical components, from the viewpoint of optical performance, abrasion durability and antifouling properties, the thickness of the above layer is preferably in the range of 1 to 50 nm, 1 to 30 nm, and more preferably in the range of 1 to 15 nm.

以上,已詳細說明本揭示之物品。惟本揭示之物品及物品的製造方法等並不限定於上述例示。 The items disclosed herein have been described in detail above. However, the articles and methods of manufacturing the articles disclosed herein are not limited to the above examples.

[實施例] [Example]

以下,於實施例說明本揭示之化合物,惟本揭示並不限定於下列實施例。於本實施例中,構成氟聚醚之重複單元的存在順序為任意,下列所示之化學式係表示平均組成。 In the following, the compounds of the present disclosure will be described in Examples, but the present disclosure is not limited to the following Examples. In this embodiment, the order of the repeating units constituting the fluoropolyether is arbitrary, and the chemical formula shown below represents the average composition.

合成例1 Synthesis example 1

將以平均組成CH3OCOCF2O(CF2O)12(CF2CF2O)12CF2COOCH3所表示之全氟聚醚改性酯體10.0g、1,3-雙(三氟甲基)苯5.0g及二乙三胺0.20g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時。接著,在添加3-胺基丙基三甲氧矽烷0.68g後,於25℃攪拌1小時。然後於減壓下餾除揮發份,藉此得到下式所表示之含全氟聚醚基之矽烷化合物(A)。 10.0g of perfluoropolyether modified ester body represented by the average composition CH 3 OCOCF 2 O(CF 2 O) 12 (CF 2 CF 2 O) 12 CF 2 COOCH 3 , 1,3-bis(trifluoromethyl 5.0 g of benzene and 0.20 g of diethylenetriamine were put into a 100 mL three-neck flask equipped with a reflux cooler, a thermometer and a stirrer, and stirred at 25°C for 1 hour under nitrogen flow. Next, after adding 0.68 g of 3-aminopropyltrimethoxysilane, the mixture was stirred at 25° C. for 1 hour. Then, the volatile matter is distilled off under reduced pressure, thereby obtaining the perfluoropolyether group-containing silane compound (A) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2NHCH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 NHCH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

合成例2 Synthesis example 2

將合成例1中所得到之含全氟聚醚基之矽烷化合物(A)10.0g及丙烯酸2-異氰酸乙酯(昭和電工股份有限公司製Karenz(註冊商標)AOI)0.27g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(B)。 10.0 g of the perfluoropolyether group-containing silane compound (A) obtained in Synthesis Example 1 and 0.27 g of 2-ethyl acrylate (Karenz (registered trademark) AOI manufactured by Showa Denko Co., Ltd.) were added to A 100 mL three-neck flask equipped with a reflux cooler, a thermometer and a stirrer was stirred at 25° C. for 1 hour under a nitrogen flow to obtain a perfluoropolyether group-containing silane compound (B) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2N(X)CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 N(X)CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X=-CONHCH2CH2OCOCH=CH2 -X=-CONHCH 2 CH 2 OCOCH=CH 2

合成例3 Synthesis example 3

將合成例1中所得到之含全氟聚醚基之矽烷化合物(A)10.0g及異氰酸1,1-(雙丙烯醯氧基甲基)乙酯(昭和電工股份有限公司製Karenz(註冊商標)BEI)0.46g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(C)。 10.0 g of the perfluoropolyether group-containing silane compound (A) obtained in Synthesis Example 1 and 1,1-(bisacrylyloxymethyl)ethyl isocyanate (Karenz (manufactured by Showa Denko Co., Ltd.) Registered trademark) BEI) 0.46g was put into a 100mL three-neck flask equipped with a reflux cooler, a thermometer and a stirrer, and stirred at 25°C for 1 hour under a nitrogen flow to obtain a perfluoropolyether group-containing compound represented by the following formula Silane compound (C).

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2N(X)CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 N(X)CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X=-CONHC(CH3)(CH2OCOCH=CH2)2 -X=-CONHC(CH 3 )(CH 2 OCOCH=CH 2 ) 2

合成例4 Synthesis example 4

將以平均組成CH3OCOCF2O(CF2O)12(CF2CF2O)12CF2COOCH3所表示之全氟聚醚改性酯體10.0g、1,3-雙(三氟甲基)苯5.0g及三乙四胺0.28g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮 氣流下於25℃攪拌1小時。接著,添加3-胺基丙基三甲氧矽烷0.68g後,於25℃攪拌1小時。然後於減壓下餾除揮發份,藉此得到下式所表示之含全氟聚醚基之矽烷化合物(D)。 10.0g of perfluoropolyether modified ester body represented by the average composition CH 3 OCOCF 2 O(CF 2 O) 12 (CF 2 CF 2 O) 12 CF 2 COOCH 3 , 1,3-bis(trifluoromethyl 5.0 g of benzene and 0.28 g of triethylenetetramine were put into a 100 mL three-neck flask equipped with a reflux cooler, a thermometer and a stirrer, and stirred at 25°C for 1 hour under nitrogen flow. Next, 0.68 g of 3-aminopropyltrimethoxysilane was added, and the mixture was stirred at 25° C. for 1 hour. Then, the volatile components are distilled off under reduced pressure, thereby obtaining the perfluoropolyether group-containing silane compound (D) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2NHCH2CH2NHCH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 NHCH 2 CH 2 NHCH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

合成例5 Synthesis example 5

將合成例4中所得到之含全氟聚醚基之矽烷化合物(D)10.0g及丙烯酸2-異氰酸乙酯(昭和電工股份有限公司製Karenz(註冊商標)AOI)0.54g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(E)。 10.0 g of the perfluoropolyether group-containing silane compound (D) obtained in Synthesis Example 4 and 0.54 g of 2-ethyl acrylate (Karenz (registered trademark) AOI manufactured by Showa Denko Co., Ltd.) were added to A 100 mL three-neck flask equipped with a reflux cooler, a thermometer and a stirrer was stirred at 25° C. for 1 hour under a nitrogen flow to obtain a perfluoropolyether group-containing silane compound (E) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2N(X)CH2CH2N(X)CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 N(X)CH 2 CH 2 N(X)CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X=-CONHCH2CH2OCOCH=CH2 -X=-CONHCH 2 CH 2 OCOCH=CH 2

合成例6 Synthesis example 6

將以平均組成CH3OCOCF(CF3){OCF2CF(CF3)}mOCF2CF2O{CF(CF3)CF2O}nCF(CF3)COOCH3(m+n≒34)所表示之全氟聚醚改性酯體10.0g、六氟苯5.0g及二乙三胺0.085g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於70℃攪拌13小時。接著,添加3-胺基丙基三甲氧矽烷0.29g後,於70℃攪拌12小時。然後於 減壓下餾除揮發份,藉此得到下式所表示之含全氟聚醚基之矽烷化合物(F)。 The average composition will be CH 3 OCOCF(CF 3 ){OCF 2 CF(CF 3 )} m OCF 2 CF 2 O{CF(CF 3 )CF 2 O} n CF(CF 3 )COOCH 3 (m+n≒34 ), 10.0g of the perfluoropolyether modified ester body, 5.0g of hexafluorobenzene and 0.085g of diethylenetriamine represented by Stir at 70°C for 13 hours. Next, after adding 0.29 g of 3-aminopropyltrimethoxysilane, the mixture was stirred at 70° C. for 12 hours. Then, the volatile components are distilled off under reduced pressure, thereby obtaining the perfluoropolyether group-containing silane compound (F) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF(CF3){OCF2CF(CF3)}mOCF2CF2O{CF(CF3)CF2O}nCF(CF3)CONHCH2CH2NHCH2CH2NHCOCF(CF3){OCF2CF(CF3)}mOCF2CF2O{CF(CF3)CF2O}nCF(CF3)CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF(CF 3 ){OCF 2 CF(CF 3 )} m OCF 2 CF 2 O{CF(CF 3 )CF 2 O} n CF(CF 3 )CONHCH 2 CH 2 NHCH 2 CH 2 NHCOCF(CF 3 ){OCF 2 CF(CF 3 )} m OCF 2 CF 2 O{CF(CF 3 )CF 2 O} n CF(CF 3 )CONHCH 2 CH 2 CH 2 Si( OCH 3 ) 3

合成例7 Synthesis Example 7

將合成例6中所得到之含全氟聚醚基之矽烷化合物(F)10.0g及丙烯酸2-異氰酸乙酯(昭和電工股份有限公司製Karenz(註冊商標)AOI)0.12g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(G)。 10.0 g of the perfluoropolyether group-containing silane compound (F) obtained in Synthesis Example 6 and 0.12 g of 2-ethyl acrylate (Karenz (registered trademark) AOI manufactured by Showa Denko Co., Ltd.) were added to A 100 mL three-neck flask equipped with a reflux cooler, a thermometer and a stirrer was stirred at 25° C. for 1 hour under a nitrogen flow to obtain a perfluoropolyether group-containing silane compound (G) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF(CF3){OCF2CF(CF3)}mOCF2CF2O{CF(CF3)CF2O}nCF(CF3)CONHCH2CH2N(X)CH2CH2NHCOCF(CF3){OCF2CF(CF3)}mOCF2CF2O{CF(CF3)CF2O}nCF(CF3)CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF(CF 3 ){OCF 2 CF(CF 3 )} m OCF 2 CF 2 O{CF(CF 3 )CF 2 O} n CF(CF 3 )CONHCH 2 CH 2 N(X)CH 2 CH 2 NHCOCF(CF 3 ){OCF 2 CF(CF 3 )} m OCF 2 CF 2 O{CF(CF 3 )CF 2 O} n CF(CF 3 )CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X=-CONHCH2CH2OCOCH=CH2 -X=-CONHCH 2 CH 2 OCOCH=CH 2

合成例8 Synthesis example 8

將合成例1中所得到之含全氟聚醚基之矽烷化合物(A)10.0g及丙烯酸4-羥基丁酯縮水甘油醚(Mitsubishi Chemical股份有限公司製4HBAGE)0.38g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於50℃攪拌3小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(H)。 10.0 g of the perfluoropolyether group-containing silane compound (A) obtained in Synthesis Example 1 and 0.38 g of 4-hydroxybutyl acrylate glycidyl ether (4HBAGE manufactured by Mitsubishi Chemical Co., Ltd.) were put into a reflux cooling device. A 100 mL three-neck flask was equipped with a thermometer, a thermometer, and a stirrer, and stirred at 50°C for 3 hours under a nitrogen flow to obtain a perfluoropolyether group-containing silane compound (H) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2N(X)CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 N(X)CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X為下述-X1與-X2之混合物(X1:X2=80:20) -X is a mixture of the following -X 1 and -X 2 (X 1 : X 2 =80: 20)

-X1=-CH2CH(OH)CH2OCH2CH2CH2CH2OCOCH=CH2 -X 1 =-CH 2 CH(OH)CH 2 OCH 2 CH 2 CH 2 CH 2 OCOCH=CH 2

-X2=-CH(CH2OH)CH2OCH2CH2CH2CH2OCOCH=CH2 -X 2 =-CH(CH 2 OH)CH 2 OCH 2 CH 2 CH 2 CH 2 OCOCH=CH 2

合成例9 Synthesis example 9

將以平均組成CH3OCOCF2O(CF2O)12(CF2CF2O)12CF2COOCH3所表示之全氟聚醚改性酯體10.0g、1,3-雙(三氟甲基)苯5.0g及1,3-二胺基-2-丙醇0.20g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時。接著,添加3-胺基丙基三甲氧矽烷0.68g後,於25℃攪拌1小時。然後於減壓下餾除揮發份,藉此得到下式所表示之含全氟聚醚基之矽烷化合物(I)。 10.0g of perfluoropolyether modified ester body represented by the average composition CH 3 OCOCF 2 O(CF 2 O) 12 (CF 2 CF 2 O) 12 CF 2 COOCH 3 , 1,3-bis(trifluoromethyl 5.0 g of benzene and 0.20 g of 1,3-diamino-2-propanol were put into a 100 mL three-neck flask equipped with a reflux cooler, a thermometer and a stirrer, and stirred at 25°C for 1 hour under nitrogen flow. Next, 0.68 g of 3-aminopropyltrimethoxysilane was added, and the mixture was stirred at 25° C. for 1 hour. Then, the volatile components are distilled off under reduced pressure, thereby obtaining the perfluoropolyether group-containing silane compound (I) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH(OH)CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH(OH)CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

合成例10 Synthesis example 10

將合成例9中所得到之含全氟聚醚基之矽烷化合物(I)10.0g、丙烯酸2-異氰酸乙酯(昭和電工股份有限公司製Karenz(註冊商標)AOI)0.27g及二月桂酸二丁基錫0.012g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於50℃攪拌2小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(J)。 10.0 g of the perfluoropolyether group-containing silane compound (I) obtained in Synthesis Example 9, 0.27 g of 2-isocyanate ethyl acrylate (Karenz (registered trademark) AOI manufactured by Showa Denko Co., Ltd.) and laurel 0.012g of dibutyltin acid was put into a 100mL three-neck flask equipped with a reflux cooler, a thermometer and a stirrer, and stirred at 50°C for 2 hours under a nitrogen flow to obtain a perfluoropolyether group-containing silane represented by the following formula Compound (J).

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH(OX)CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH(OX)CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X=-CONHCH2CH2OCOCH=CH2 -X=-CONHCH 2 CH 2 OCOCH=CH 2

合成例11 Synthesis Example 11

將以平均組成CH3OCOCF2O(CF2O)12(CF2CF2O)12CF2COOCH3所表示之全氟聚醚改性酯體10.0g、1,3-雙(三氟甲基)苯5.0g及二乙三胺0.20g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時。接著,添加3-(2-胺基乙基胺基)丙基三甲氧矽烷0.85g後,於25℃攪拌1小時。然後於減壓下餾除揮發份,藉此得到下式所表示之含全氟聚醚基之矽烷化合物(K)。 10.0g of perfluoropolyether modified ester body represented by the average composition CH 3 OCOCF 2 O(CF 2 O) 12 (CF 2 CF 2 O) 12 CF 2 COOCH 3 , 1,3-bis(trifluoromethyl 5.0 g of benzene and 0.20 g of diethylenetriamine were put into a 100 mL three-neck flask equipped with a reflux cooler, a thermometer and a stirrer, and stirred at 25°C for 1 hour under nitrogen flow. Next, after adding 0.85 g of 3-(2-aminoethylamino)propyltrimethoxysilane, the mixture was stirred at 25° C. for 1 hour. Then, the volatile matter is distilled off under reduced pressure, thereby obtaining a perfluoropolyether group-containing silane compound (K) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2NHCH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2NHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 NHCH 2 CH 2 NHCOCF 2 O( CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 NHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

合成例12 Synthesis example 12

將合成例11中所得到之含全氟聚醚基之矽烷化合物(K)10.0g及丙烯酸2-異氰酸乙酯(昭和電工股份有限公司製Karenz(註冊商標)AOI)0.81g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌2小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(L)。 10.0 g of the perfluoropolyether group-containing silane compound (K) obtained in Synthesis Example 11 and 0.81 g of 2-ethyl acrylate (Karenz (registered trademark) AOI manufactured by Showa Denko Co., Ltd.) were added to A 100 mL three-neck flask equipped with a reflux cooler, a thermometer and a stirrer was stirred at 25° C. for 2 hours under a nitrogen flow to obtain a perfluoropolyether group-containing silane compound (L) represented by the following formula.

(CH3O)3SiCH2CH2CH2N(X)CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2N(X)CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2N(X)CH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 N(X)CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 N(X)CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 N(X)CH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X=-CONHCH2CH2OCOCH=CH2 -X=-CONHCH 2 CH 2 OCOCH=CH 2

合成例13 Synthesis example 13

將以平均組成CH3OCOCF2CF2O(CF2CF2CF2O)16CF2CF2COOCH3所表示之全氟聚醚改性酯體10.0g、1,3-雙(三氟甲基)苯5.0g及二乙三胺0.17g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時。接著,添加3-胺基丙基三甲氧矽烷0.60g後,於25℃攪拌1小時。然後於減壓下餾除揮發份,藉此得到下式所表示之含全氟聚醚基之矽烷化合物(M)。 10.0g of perfluoropolyether modified ester body represented by the average composition CH 3 OCOCF 2 CF 2 O (CF 2 CF 2 CF 2 O) 16 CF 2 CF 2 COOCH 3 , 1,3-bis(trifluoromethyl 5.0g of benzene and 0.17g of diethylenetriamine were put into a 100mL three-neck flask equipped with a reflux cooler, a thermometer and a stirrer, and stirred at 25°C for 1 hour under nitrogen flow. Next, after adding 0.60 g of 3-aminopropyltrimethoxysilane, the mixture was stirred at 25° C. for 1 hour. Then, the volatile matter is distilled off under reduced pressure, thereby obtaining a perfluoropolyether group-containing silane compound (M) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2CF2O(CF2CF2CF2O)16CF2CF2CONHCH2CH2NHCH2CH2NHCOCF2CF2O(CF2CF2CF2O)16CF2CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 CF 2 O(CF 2 CF 2 CF 2 O) 16 CF 2 CF 2 CONHCH 2 CH 2 NHCH 2 CH 2 NHCOCF 2 CF 2 O(CF 2 CF 2 CF 2 O) 16 CF 2 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

合成例14 Synthesis Example 14

將合成例13中所得到之含全氟聚醚基之矽烷化合物(M)10.0g及丙烯酸2-異氰酸乙酯(昭和電工股份有限公司製Karenz(註冊商標)AOI)0.24g,投入於安裝有迴流冷卻器、溫度計及攪拌機之100mL的三頸燒瓶,並在氮氣流下於25℃攪拌1小時,而得到下式所表示之含全氟聚醚基之矽烷化合物(N)。 10.0 g of the perfluoropolyether group-containing silane compound (M) obtained in Synthesis Example 13 and 0.24 g of 2-ethyl acrylate (Karenz (registered trademark) AOI manufactured by Showa Denko Co., Ltd.) were added to A 100 mL three-neck flask equipped with a reflux cooler, a thermometer and a stirrer was stirred at 25° C. for 1 hour under a nitrogen flow to obtain a perfluoropolyether group-containing silane compound (N) represented by the following formula.

(CH3O)3SiCH2CH2CH2NHCOCF2CF2O(CF2CF2CF2O)16CF2CF2CONHCH2CH2N(X)CH2CH2NHCOCF2CF2O(CF2CF2CF2O)16CF2CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 CF 2 O(CF 2 CF 2 CF 2 O) 16 CF 2 CF 2 CONHCH 2 CH 2 N(X)CH 2 CH 2 NHCOCF 2 CF 2 O(CF 2 CF 2 CF 2 O) 16 CF 2 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

-X=-CONHCH2CH2OCOCH=CH2 -X=-CONHCH 2 CH 2 OCOCH=CH 2

實施例1 Example 1

以濃度成為20wt%之方式,將上述合成例2中所得到之化合物(B)溶解於Novec 7200(3M公司製),而調製出表面處理劑。 The compound (B) obtained in the above Synthesis Example 2 was dissolved in Novec 7200 (manufactured by 3M Company) so that the concentration became 20 wt%, and a surface treatment agent was prepared.

將上述所調製之表面處理劑分別真空蒸鍍於化學強化玻璃(Corning公司製、「Gorilla」玻璃、厚度0.7mm)上。真空蒸鍍法的條件:電阻加熱式蒸鍍機處理室大小1,900mmφ、真空度5.0E-05、電流值240A、電壓10V、基材溫度40℃。接著,將蒸鍍後的化學強化玻璃於溫度150℃的環境下靜置30分鐘,然後放置冷卻至室溫。接著在空氣環境下,以1000mJ/cm2的強度將含有365nm的UV光之光線照射在蒸鍍後的化學強化玻璃,而在玻璃基材上形成表面處理層。 The surface treatment agents prepared above were each vacuum evaporated on chemically strengthened glass ("Gorilla" glass manufactured by Corning Co., Ltd., thickness 0.7 mm). The conditions for the vacuum evaporation method: the resistance heating evaporation machine processing chamber size is 1,900mmφ, the vacuum degree is 5.0E-05, the current value is 240A, the voltage is 10V, and the substrate temperature is 40°C. Next, the evaporated chemically strengthened glass was left to stand in an environment with a temperature of 150° C. for 30 minutes, and then left to cool to room temperature. Then, in an air environment, light containing 365nm UV light is irradiated on the evaporated chemically strengthened glass at an intensity of 1000mJ/cm 2 to form a surface treatment layer on the glass substrate.

實施例2 Example 2

除了使用上述合成例3中所得到之化合物(C)來取代化合物(B)之外,其他與實施例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and a surface treatment layer was formed in the same manner as in Example 1 except that the compound (C) obtained in the above Synthesis Example 3 was used instead of the compound (B).

實施例3 Example 3

除了使用上述合成例5中所得到之化合物(E)來取代化合物(B)之外,其他與實施例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and a surface treatment layer was formed in the same manner as in Example 1 except that the compound (E) obtained in Synthesis Example 5 was used instead of the compound (B).

實施例4 Example 4

除了使用上述合成例7中所得到之化合物(G)來取代化合物(B)之外,其他與實施例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and a surface treatment layer was formed in the same manner as in Example 1 except that the compound (G) obtained in Synthesis Example 7 was used instead of the compound (B).

實施例5 Example 5

除了使用上述合成例8中所得到之化合物(H)來取代化合物(B)之外,其他與實施例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and a surface treatment layer was formed in the same manner as in Example 1 except that the compound (H) obtained in the above-mentioned Synthesis Example 8 was used instead of the compound (B).

實施例6 Example 6

除了使用上述合成例10中所得到之化合物(J)來取代化合物(B)之外,其他與實施例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and a surface treatment layer was formed in the same manner as in Example 1 except that the compound (J) obtained in the above-mentioned Synthesis Example 10 was used instead of the compound (B).

實施例7 Example 7

除了使用上述合成例12中所得到之化合物(L)來取代化合物(B)之外,其他與實施例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and a surface treatment layer was formed in the same manner as in Example 1 except that the compound (L) obtained in Synthesis Example 12 was used instead of the compound (B).

實施例8 Example 8

除了使用上述合成例14中所得到之化合物(N)來取代化合物(B)之外,其他與實施例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and a surface treatment layer was formed in the same manner as in Example 1 except that the compound (N) obtained in Synthesis Example 14 was used instead of the compound (B).

比較例1 Comparative example 1

以濃度成為20wt%之方式,將下述化合物(O)溶解於Novec 7200(3M公司製),而調製出表面處理劑。 The following compound (O) was dissolved in Novec 7200 (manufactured by 3M Company) so that the concentration became 20 wt%, and a surface treatment agent was prepared.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

將上述所調製之表面處理劑分別真空蒸鍍於化學強化玻璃(Corning公司製、「Gorilla」玻璃、厚度0.7mm)上。真空蒸鍍法的條件:電阻加熱式蒸鍍機處理室大小1,900mmφ、真空度5.0E-05、電流值240A、電壓10V、基材溫度40℃。接著將蒸鍍後的化學強化玻璃於溫度150℃的環境下靜置30分鐘,然後放置冷卻至室溫,而在玻璃基材上形成表面處理層。 The surface treatment agents prepared above were each vacuum evaporated on chemically strengthened glass ("Gorilla" glass manufactured by Corning Co., Ltd., thickness 0.7 mm). The conditions for the vacuum evaporation method: the resistance heating evaporation machine processing chamber size is 1,900mmφ, the vacuum degree is 5.0E-05, the current value is 240A, the voltage is 10V, and the substrate temperature is 40°C. Then, the evaporated chemically strengthened glass is left to stand in an environment with a temperature of 150° C. for 30 minutes, and then left to cool to room temperature to form a surface treatment layer on the glass substrate.

比較例2 Comparative example 2

除了使用下述化合物(P)來取代化合物(O)之外,其他與比較例1相同地施作,而調製表面處理劑並形成表面處理層。 Except that the following compound (P) was used instead of the compound (O), the same procedure as in Comparative Example 1 was performed to prepare a surface treatment agent and form a surface treatment layer.

(CH3O)3SiCH2CH2CH2NHCOCF2CF2O(CF2CF2CF2O)16CF2CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 CF 2 O(CF 2 CF 2 CF 2 O) 16 CF 2 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

比較例3 Comparative example 3

除了使用下述化合物(Q)來取代化合物(O)之外,其他與比較例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared in the same manner as Comparative Example 1 except that the following compound (Q) was used instead of the compound (O), and a surface treatment layer was formed.

(CH3O)3SiCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2NHCOCF2O(CF2CF2O)12(CF2O)12CF2CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 NHCOCF 2 O(CF 2 CF 2 O) 12 (CF 2 O) 12 CF 2 CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

比較例4 Comparative example 4

除了使用下述化合物(R)來取代化合物(O)之外,其他與比較例1相同地施作,而調製表面處理劑並形成表面處理層。 The surface treatment agent was prepared and a surface treatment layer was formed in the same manner as in Comparative Example 1 except that the following compound (R) was used instead of the compound (O).

(CH3O)3SiCH2CH2CH2NHCOCF(CF3){OCF2CF(CF3)}mOCF2CF2O{CF(CF3)CF2O}nCF(CF3)CONHCH2CH2CH2Si(OCH3)3 (CH 3 O) 3 SiCH 2 CH 2 CH 2 NHCOCF(CF 3 ){OCF 2 CF(CF 3 )} m OCF 2 CF 2 O{CF(CF 3 )CF 2 O} n CF(CF 3 )CONHCH 2 CH 2 CH 2 Si(OCH 3 ) 3

〈評估〉 <evaluate>

對於上述所得到之附表面處理層玻璃基體,分別以下列方式進行水接觸角的測定、鹼試驗的評估。 For the glass substrate with a surface treatment layer obtained above, the water contact angle was measured and the alkali test was evaluated in the following manner.

(鹼浸漬試驗) (alkali immersion test)

將直徑1cm的PTFE製O型環設置在上述實施例1至8以及比較例1至4經表面處理後之基材的表面上,並將8N的NaOH溶液(鹼水溶液)滴入於上述O型環內以使表面處理層的表面與鹼水溶液接觸,而使用在鹼浸漬試驗。在鹼浸漬試驗經過20至300分鐘後,拭除鹼水溶液並以純水、乙醇進行洗淨後,測定相對於水之接觸角。水的靜態接觸角係使2μL純水的 水滴著滴於上述鹼浸漬試驗後之玻璃基體的表面上,並使用接觸角計(協和界面化學公司製:自動接觸角計DropMaster 701)來測定相對於水之接觸角。鹼浸漬試驗後之水的靜態接觸角的測定處係在5處進行。水之靜態接觸角的測定值在300分鐘以內降低時,於中途停止鹼浸漬試驗。將浸漬時間與5處的接觸角平均值之關表示於下表。 An O-ring made of PTFE with a diameter of 1 cm was placed on the surface of the surface-treated base material of Examples 1 to 8 and Comparative Examples 1 to 4, and an 8N NaOH solution (alkali aqueous solution) was dropped into the O-ring. The ring is used in the alkali immersion test to bring the surface of the surface treatment layer into contact with the alkali aqueous solution. After the alkali immersion test has elapsed for 20 to 300 minutes, the alkali aqueous solution is wiped off and washed with pure water and ethanol, and then the contact angle with respect to water is measured. The static contact angle of water is such that 2 μL of pure water Water was dropped onto the surface of the glass substrate after the alkali immersion test, and the contact angle with respect to water was measured using a contact angle meter (automatic contact angle meter DropMaster 701 manufactured by Kyowa Interface Chemical Co., Ltd.). The static contact angle of water after the alkali immersion test was measured at 5 locations. When the measured value of the static contact angle of water decreases within 300 minutes, the alkali immersion test is stopped midway. The relationship between the immersion time and the average contact angle at 5 locations is shown in the table below.

[表1]

Figure 111139883-A0202-12-0052-14
[Table 1]
Figure 111139883-A0202-12-0052-14

(磨耗耐久性試驗) (Abrasion durability test)

水平地配置形成有表面處理層之樣本物品,使下述摩擦件與表面處理層的表面(接觸面為直徑1cm的圓)接觸,於其上方賦予5N的荷重,然後在施加荷重之狀態下以40mm/秒的速度使摩擦件來回行進。使摩擦件來回行進最大為4000次,於來回次數(摩擦次數)每1000次時測定水的靜態接觸角(°)。在水之靜態接觸角的測定值未達60°之時間點中止試驗。水之靜態接觸角的測定係與上述鹼試驗同樣地實施。將結果表示於下述表。 Arrange the sample article with the surface treatment layer horizontally, place the following friction member in contact with the surface of the surface treatment layer (the contact surface is a circle with a diameter of 1 cm), apply a load of 5N on top of it, and then apply the load to The friction part travels back and forth at a speed of 40mm/second. The friction member is allowed to travel back and forth a maximum of 4,000 times, and the static contact angle (°) of water is measured every 1,000 times (number of frictions). Stop the test when the measured value of the static contact angle of water does not reach 60°. The static contact angle of water was measured in the same manner as the above-mentioned alkali test. The results are shown in the following table.

˙摩擦件 ˙Friction parts

以浸漬在下述所示之組成的人工汗液後之棉布被覆下述所示之聚矽氧橡膠加工品的表面(直徑1cm)者,作為摩擦件使用。 The surface (diameter 1cm) of the silicone rubber processed product shown below is covered with cotton cloth soaked in artificial perspiration of the composition shown below and used as a friction member.

人工汗液的組成: The composition of artificial sweat:

無水磷酸氫二鈉:2g Anhydrous disodium hydrogen phosphate: 2g

氯化鈉:20g Sodium chloride: 20g

85%乳酸:2g 85% lactic acid: 2g

組胺酸鹽酸鹽:5g Histamine hydrochloride: 5g

蒸餾水:1Kg。 Distilled water: 1Kg.

聚矽氧橡膠加工品: Polysilicone rubber processed products:

將Tigers Polymer公司製、聚矽氧橡膠栓SR-51加工為直徑1cm、厚度1cm的圓柱狀者。 Polysilicone rubber plug SR-51 manufactured by Tigers Polymer Co., Ltd. was processed into a cylindrical shape with a diameter of 1 cm and a thickness of 1 cm.

[表2]

Figure 111139883-A0202-12-0053-16
[Table 2]
Figure 111139883-A0202-12-0053-16

[產業上之可應用性] [Industrial applicability]

本揭示之含氟聚醚基之丙烯酸化合物係適合利用在用以於各式各樣之基材,尤其是要求磨耗耐久性之光學構件的表面上形成表面處理層。 The fluoropolyether-based acrylic compound disclosed in the present disclosure is suitable for use to form a surface treatment layer on the surface of various substrates, especially optical components requiring abrasion durability.

Figure 111139883-A0202-11-0001-1
Figure 111139883-A0202-11-0001-1

Claims (32)

一種化合物,係下述式(1)所表示者, A compound represented by the following formula (1), Rb 2N-Rd-CO-(RF2-CO-NRc-Ra(RAc m)-NRc-CO)x-RF2-CO-Rd-NRb 2 (1) R b 2 NR d -CO-(R F2 -CO-NR c -R a (R Ac m )-NR c -CO) x -R F2 -CO-R d -NR b 2 (1) 式中, In the formula, RF2分別獨立地為-Rf2 p-RF-Oq-, R F2 are independently -Rf 2 p -R F -O q -, Rf2為可經1個以上的氟原子取代之C1-6伸烷基, Rf 2 is a C 1-6 alkylene group which may be substituted by more than one fluorine atom, RF為二價氟聚醚基, R F is a divalent fluoropolyether group, p為0或1, p is 0 or 1, q為0或1, q is 0 or 1, Ra分別獨立地為(m+2)價有機基, R a are independently (m+2)-valent organic groups, m為1至4的整數, m is an integer from 1 to 4, Rb分別獨立地為RSi、RAc或RcR b is independently R Si , R Ac or R c , RSi分別獨立地為-XC-SiR1 n’R2 3-n’R Si are independently -X C -SiR 1 n' R 2 3-n' , XC為碳數1至10的二價有機基, X C is a divalent organic group with 1 to 10 carbon atoms, R1分別獨立地為羥基或水解性基, R 1 are each independently a hydroxyl group or a hydrolyzable group, R2分別獨立地為氫原子或一價有機基, R 2 is independently a hydrogen atom or a monovalent organic group, n’為1至3的整數, n’ is an integer from 1 to 3, RAc分別獨立地為-XD-XE(-XF-OCO-CR5=CH2)m’R Ac are each independently -X D -X E (-X F -OCO-CR 5 =CH 2 ) m' , XD為二價有機基, X D is a divalent organic radical, XE為單鍵或(m’+1)價基, X E is a single bond or (m'+1) valence base, XF分別獨立地為碳數1至10的二價有機基, X F are each independently a divalent organic group having 1 to 10 carbon atoms, R5為氫原子或碳數1至8的一價有機基, R 5 is a hydrogen atom or a monovalent organic group with 1 to 8 carbon atoms, m’為1至10的整數, m’ is an integer from 1 to 10, Rc分別獨立地為氫原子或C1-6烷基, R c are each independently a hydrogen atom or a C 1-6 alkyl group, Rd分別獨立地為單鍵或二價有機基, R d are independently single bonds or divalent organic groups, x為1以上的整數。 x is an integer above 1. 如請求項1所述之化合物,其中,RF分別獨立地為下式所表示之基, The compound as claimed in claim 1, wherein R F are each independently a group represented by the following formula, -(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3RFa 6)d-(OC2F4)e-(OCF2)f- -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 R Fa 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - 式中,RFa分別獨立地為氫原子、氟原子或氯原子, In the formula, R Fa are independently a hydrogen atom, a fluorine atom or a chlorine atom, a、b、c、d、e及f分別獨立地為0至200的整數,a、b、c、d、e及f之和為1以上,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意,惟於所有的RFa為氫原子或氯原子時,a、b、c、e及f的至少1個為1以上。 a, b, c, d, e and f are each independently an integer from 0 to 200. The sum of a, b, c, d, e and f is more than 1. Mark a, b, c, d, e or f The order of existence of each repeating unit enclosed in parentheses is arbitrary in the formula, but when all R Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is 1 or more. 如請求項1或2所述之化合物,其中,RFa為氟原子。 The compound according to claim 1 or 2, wherein R Fa is a fluorine atom. 如請求項1至3中任一項所述之化合物,其中,RF分別獨立地為下述式(f1)、(f2)、(f3)、(f4)、(f5)或(f6)所表示之基, The compound according to any one of claims 1 to 3, wherein R F is independently represented by the following formula (f1), (f2), (f3), (f4), (f5) or (f6) The basis of expression, -(OC3F6)d-(OC2F4)e- (f1) -(OC 3 F 6 ) d -(OC 2 F 4 ) e - (f1) 式中,d為1至200的整數,e為0至2的整數,標註下標d或e並以括弧括起之各重複單元的存在順序於式中為任意; In the formula, d is an integer from 1 to 200, and e is an integer from 0 to 2. The order of existence of each repeating unit marked with the subscript d or e and enclosed in brackets is arbitrary in the formula; -(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f2) -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f2) 式中,c及d分別獨立地為0至30的整數, In the formula, c and d are independently integers from 0 to 30, e及f分別獨立地為1至200的整數, e and f are independently integers from 1 to 200, c、d、e及f之和為10至200的整數, The sum of c, d, e and f is an integer from 10 to 200, 標註下標c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; The order of existence of each repeating unit marked with the subscript c, d, e or f and enclosed in parentheses is arbitrary in the formula; -(R6-R7)g-R9- (f3) -(R 6 -R 7 ) g -R 9 - (f3) 式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 , R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基,或為選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of 2 or 3 groups selected from these groups, R9為單鍵,或為選自OCF2、OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基, R 9 is a single bond, or a group selected from OCF 2 , OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , g為2至100的整數; g is an integer from 2 to 100; -(R6-R7)g-Rr-(R7’-R6’)g’- (f4) -(R 6 -R 7 ) g -R r -(R 7' -R 6' ) g' - (f4) 式中,R6為OCF2或OC2F4In the formula, R 6 is OCF 2 or OC 2 F 4 , R7為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基,或為獨立地選自此等基之2或3個基的組合, R 7 is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of 2 or 3 groups independently selected from these groups, R6’為OCF2或OC2F4R 6' is OCF 2 or OC 2 F 4 , R7’為選自OC2F4、OC3F6、OC4F8、OC5F10及OC6F12之基,或為獨立地選自此等基之2或3個基的組合, R 7' is a group selected from OC 2 F 4 , OC 3 F 6 , OC 4 F 8 , OC 5 F 10 and OC 6 F 12 , or a combination of 2 or 3 groups independently selected from these groups. , g為2至100的整數, g is an integer from 2 to 100, g’為2至100的整數, g’ is an integer from 2 to 100, Rr為如下列化學式所示者, R r is as shown in the following chemical formula,
Figure 111139883-A0202-13-0004-17
Figure 111139883-A0202-13-0004-17
式中,*表示鍵結位置; In the formula, * represents the bonding position; -(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f5) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f5) 式中,e為1以上200以下的整數,a、b、c、d及f分別獨立地為0以上200以下的整數,a、b、c、d、e及f之和至少為1,再者,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意; In the formula, e is an integer from 1 to 200, a, b, c, d and f are each independently an integer from 0 to 200, the sum of a, b, c, d, e and f is at least 1, and then Otherwise, the order of existence of each repeating unit marked a, b, c, d, e or f and enclosed in parentheses in the formula is arbitrary; -(OC6F12)a-(OC5F10)b-(OC4F8)c-(OC3F6)d-(OC2F4)e-(OCF2)f- (f6) -(OC 6 F 12 ) a -(OC 5 F 10 ) b -(OC 4 F 8 ) c -(OC 3 F 6 ) d -(OC 2 F 4 ) e -(OCF 2 ) f - (f6) 式中,f為1以上200以下的整數,a、b、c、d及e分別獨立地為0以上200以下的整數,a、b、c、d、e及f之和至少為1,再者,標註a、b、c、d、e或f並以括弧括起之各重複單元的存在順序於式中為任意。 In the formula, f is an integer from 1 to 200, a, b, c, d and e are each independently an integer from 0 to 200, the sum of a, b, c, d, e and f is at least 1, and then Otherwise, the order of existence of each repeating unit marked a, b, c, d, e or f and enclosed in parentheses is arbitrary in the formula.
如請求項1至4中任一項所述之化合物,其中,RF2分別獨立地為C1-6全氟伸烷基。 The compound according to any one of claims 1 to 4, wherein RF2 is independently a C 1-6 perfluoroalkyl group. 如請求項1至5中任一項所述之化合物,其中,Ra分別獨立地為下述式所表示之基, The compound according to any one of claims 1 to 5, wherein R a is independently a group represented by the following formula, -R9-(Ra’-R9)k- -R 9 -(R a' -R 9 ) k - 式中, In the formula, R9分別獨立地為C1-6伸烷基, R 9 are each independently C 1-6 alkylene group, Ra’分別獨立地為3價有機基, R a' are each independently a trivalent organic group, k為1至4的整數。 k is an integer from 1 to 4. 如請求項6所述之化合物,其中,Ra’分別獨立地為含有N原子或O原子之3價有機基。 The compound according to claim 6, wherein R a' is independently a trivalent organic group containing an N atom or an O atom. 如請求項6所述之化合物,其中,Ra’分別獨立地為可於碳-碳原子間含有胺基鍵、醯胺鍵、胺基甲酸酯鍵、脲鍵、醚鍵或酯鍵之3價有機基。 The compound as claimed in claim 6, wherein R a' can independently contain an amine bond, an amide bond, a urethane bond, a urea bond, an ether bond or an ester bond between carbon-carbon atoms. 3-valent organic base. 如請求項6至8中任一項所述之化合物,其中,Ra’分別獨立地為下述基, The compound according to any one of claims 6 to 8, wherein R a' is each independently the following group,
Figure 111139883-A0202-13-0005-18
Figure 111139883-A0202-13-0005-18
式中,R8為氫原子或C1-6烷基。 In the formula, R 8 is a hydrogen atom or a C 1-6 alkyl group.
如請求項6至9中任一項所述之化合物,其中,Ra’為N。 The compound according to any one of claims 6 to 9, wherein R a' is N. 如請求項6至10中任一項所述之化合物,其中,k為1。 The compound according to any one of claims 6 to 10, wherein k is 1. 如請求項6至10中任一項所述之化合物,其中,k為2。 The compound according to any one of claims 6 to 10, wherein k is 2. 如請求項1至12中任一項所述之化合物,其中,至少1個Rb為RSiThe compound according to any one of claims 1 to 12, wherein at least one R b is R Si . 如請求項1至13中任一項所述之化合物,其中,與位於各末端之N原子鍵結之Rb的1個為RSi,其他為RcThe compound according to any one of claims 1 to 13, wherein one of the R b 's bonded to the N atom at each terminal is R Si and the others are R c . 如請求項1至13中任一項所述之化合物,其中,與位於各末端之N原子鍵結之Rb的1個為RSi,其他為RAcThe compound according to any one of claims 1 to 13, wherein one of the R b 's bonded to the N atom at each terminal is R Si and the others are R Ac . 如請求項1至15中任一項所述之化合物,其中,XC為: The compound as described in any one of claims 1 to 15, wherein X C is: C1-6伸烷基, C 1-6 alkylene group, -(CH2)z1-O-(CH2)z2-(式中,z1為0至6的整數,z2為0至6的整數),或 -(CH 2 ) z1 -O-(CH 2 ) z2 -(where z1 is an integer from 0 to 6, z2 is an integer from 0 to 6), or -(CH2)z3-伸苯基-(CH2)z4-(式中,z3為0至6的整數,z4為0至6的整數)。 -(CH 2 ) z3 -phenylene-(CH 2 ) z4 -(in the formula, z3 is an integer from 0 to 6, and z4 is an integer from 0 to 6). 如請求項1至16中任一項所述之化合物,其中,XC為C1-6伸烷基。 The compound according to any one of claims 1 to 16, wherein X C is C 1-6 alkylene group. 如請求項1至17中任一項所述之化合物,其中,n’為2或3。 The compound according to any one of claims 1 to 17, wherein n' is 2 or 3. 如請求項1至18中任一項所述之化合物,其中,n’為3。 The compound according to any one of claims 1 to 18, wherein n' is 3. 如請求項1至19中任一項所述之化合物,其中,XD為-O-、-CO-、-COO-、-OCO-、-CONH-、-NHCO-、-OCONH-、-NHCOO-、-NH-CO-NH-、-CH2CH(OH)CH2-或-CH(CH2OH)CH2-。 The compound according to any one of claims 1 to 19, wherein X D is -O-, -CO-, -COO-, -OCO-, -CONH-, -NHCO-, -OCONH-, -NHCOO -, -NH-CO-NH-, -CH 2 CH(OH)CH 2 - or -CH(CH 2 OH)CH 2 -. 如請求項1至20中任一項所述之化合物,其中,XD為-CONH-、-CH2CH(OH)CH2-或-CH(CH2OH)CH2-。 The compound according to any one of claims 1 to 20, wherein X D is -CONH-, -CH 2 CH(OH)CH 2 - or -CH(CH 2 OH)CH 2 -. 如請求項1至21中任一項所述之化合物,其中,XD為-CONH-。 The compound according to any one of claims 1 to 21, wherein X D is -CONH-. 如請求項1至22中任一項所述之化合物,其中,XE為單鍵。 The compound according to any one of claims 1 to 22, wherein X E is a single bond. 如請求項1至23中任一項所述之化合物,其中, The compound according to any one of claims 1 to 23, wherein, XE為-XG-XHX E is -X G -X H ; XG為: X G is: 單鍵, single key, C1-6伸烷基, C 1-6 alkylene group, -(CH2)z9-O-(CH2)z10-(式中,z9為0至6的整數,z10為0至6的整數),或 -(CH 2 ) z9 -O-(CH 2 ) z10 -(where z9 is an integer from 0 to 6, z10 is an integer from 0 to 6), or -(CH2)z11-伸苯基-(CH2)z12-(式中,z11為0至6的整數,z12為0至6的整數); -(CH 2 ) z11 -phenylene-(CH 2 ) z12 -(in the formula, z11 is an integer from 0 to 6, z12 is an integer from 0 to 6); XH為如下列化學式所示者, X H is as shown in the following chemical formula,
Figure 111139883-A0202-13-0007-19
Figure 111139883-A0202-13-0007-19
R8為氫原子或C1-6烷基。 R 8 is a hydrogen atom or a C 1-6 alkyl group.
如請求項1至24中任一項所述之化合物,其中,XF為: The compound as described in any one of claims 1 to 24, wherein X F is: C1-6伸烷基, C 1-6 alkylene group, -(CH2)z5-O-(CH2)z6-(式中,z5為0至6的整數,z6為0至6的整數),或 -(CH 2 ) z5 -O-(CH 2 ) z6 -(where z5 is an integer from 0 to 6, z6 is an integer from 0 to 6), or -(CH2)z7-伸苯基-(CH2)z8-(式中,z7為0至6的整數,z8為0至6的整數)。 -(CH 2 ) z7 -phenylene-(CH 2 ) z8 -(in the formula, z7 is an integer from 0 to 6, and z8 is an integer from 0 to 6). 如請求項1至25中任一項所述之化合物,其中,Rc分別獨立地為氫原子或C1-6烷基。 The compound according to any one of claims 1 to 25, wherein R c is independently a hydrogen atom or a C 1-6 alkyl group. 如請求項1至26中任一項所述之化合物,其中,Rd分別獨立地為單鍵或-(CH2)z17-NR10-(CH2)z18-(式中,R10為氫原子或C1-6烷基,z17為0至6的整數,z18為0至6的整數)。 The compound according to any one of claims 1 to 26, wherein R d is independently a single bond or -(CH 2 ) z17 -NR 10 -(CH 2 ) z18 -(in the formula, R 10 is hydrogen atom or C 1-6 alkyl group, z17 is an integer from 0 to 6, z18 is an integer from 0 to 6). 如請求項1至27中任一項所述之化合物,其中,x為1以上5以下的整數。 The compound according to any one of claims 1 to 27, wherein x is an integer from 1 to 5. 一種表面處理劑,係含有請求項1至28中任一項所述之化合物。 A surface treatment agent containing the compound described in any one of claims 1 to 28. 如請求項29所述之表面處理劑,係更含有選自含氟油、聚矽氧油及觸媒中之1種以上的其他成分。 The surface treatment agent as described in claim 29 further contains one or more other components selected from the group consisting of fluorine-containing oil, polysiloxane oil and catalyst. 如請求項29或30所述之表面處理劑,其係作為防污性塗佈劑或防水性塗佈劑使用。 The surface treatment agent according to claim 29 or 30 is used as an antifouling coating agent or a waterproof coating agent. 一種物品,係包含基材、以及由請求項1至28中任一項所述之化合物或請求項29至31中任一項所述之表面處理劑形成於該基材的表面上之層。 An article comprising a base material and a layer formed on the surface of the base material from the compound described in any one of claims 1 to 28 or the surface treatment agent described in any one of claims 29 to 31.
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