TW202330095A - Apparatus and processes of instantiating the same - Google Patents

Abstract

The invention includes apparatus and methods for instantiating materials, such as gases and hydrogen, in a nanoporous carbon powder.

Description

Equipment and the manufacturing process that exemplifies the equipment

[CROSS-REFERENCE TO RELATED APPLICATIONS]

This application claims priority to U.S. Patent Application No. 63/241,697 filed September 8, 2021 under 35 USC 119(e); and to Christopher J. Nagel's U.S. Patent Application No. 17/ Continuation in Part of 474,444. The entire teachings of the aforementioned applications are incorporated herein by reference.

The present invention relates to equipment and processes for exemplary materials such as gases and hydrogen in nanoporous carbon powders.

Methods of producing hydrogen have been described, including hydrogen-on-demand systems. For example, electrolytic cells comprising a proton exchange membrane, a cathode disposed on one surface of the membrane, and an anode on a second surface of the membrane have been used. Such anodes may include an ionomer binder with dispersed particles having a core and a catalytic layer, such as iridium or platinum. However, such systems can be characterized by high pressure and/or water saturated gas. Therefore, it would be beneficial to modify such processes to produce dry or substantially dry hydrogen.

The present invention relates to the discovery that devices containing carbon substrates can be used to produce various materials such as gases, hydrogen and small organic molecules. The method of the present invention includes applying electromagnetic radiation directly and/or indirectly to the gas, nanoporous carbon, or combinations and combinations thereof, thereby pretreating the gas, and exposing the carbon substrate to the pretreated Gas neutralization recovers the products produced therein.

The present invention relates to devices for instantiating materials and methods of using the same.

The present invention includes methods comprising the steps of contacting a bed comprising nanoporous carbon with an activating gas while applying electromagnetic radiation to the nanoporous carbon for a time sufficient to cause gas instantiation and collecting the gas. The invention further relates to the gas produced by the method.

More specifically, the present invention includes a method of instantiating a material such as a gas composition (e.g. hydrogen) within a nanoporous carbon powder comprising the steps of: (i) adding the nanoporous carbon powder to a reactor as described below In a reactor assembly (RA), (ii) adding a first gas composition to the reactor assembly; (iii) powering one or more RA coils to a first electromagnetic energy level; (iv) making the nanoporous A carbon powder (the terms nanoporous carbon powder, nanoporous carbon material, and nanoporous carbon are used interchangeably herein) is subjected to harmonic patterning to exemplify a second gas composition, such as hydrogen, resulting in a product gas composition (v) collecting the product gas composition and optionally separating a second gas composition or components thereof (eg hydrogen). In one embodiment, a RA coil surrounds the nanoporous carbon bed to establish harmonic electromagnetic resonance in the ultramicropores of the nanoporous carbon powder. The first gas composition may be, for example, air, oxygen, hydrogen, helium, nitrogen, neon, argon, krypton, xenon, carbon monoxide, carbon dioxide or mixtures thereof, preferably nitrogen or air. Preferably, the nanoporous carbon powder comprises at least 99.9% by weight graphene. Carbon (metal based) with a mass mean diameter between 1 µm and 5 mm and an ultramicroporous surface area between about 100 and 3000 m ² /g.

More specifically, the present invention includes a reactor assembly comprising: (a) a reactor chamber containing a nanoporous carbon material; (b) a second porous frit defining the top of the reactor chamber; wherein each porous frit has a porosity sufficient to permit gas permeation into the reactor chamber and comprises a nanoporous carbon material; (c) the reactor headspace disposed above the reactor lid; (d) 1, 2, 3, 4, 5 or more RA coils surrounding the reactor chamber and/or reactor headspace, operatively connected to one or more RA frequency generators and/or to one or multiple power sources; (e) when there are 0, 1, 2, 3, 4, 5, or more pairs of RA lamps, wherein the pairs of RA lamps are disposed circumferentially around the RA coil and define a space between the pair of RA lamps and the RA coil; (f) an optional X-ray source for exposing the reactor chamber to X-rays; (g) one or more optional lasers, when present, configured to direct the laser light towards (eg, through or through) the gas within the reactor chamber or reactor assembly; and (h) A computer processing unit (computer processing unit, CPU) configured to control a power supply, a frequency generator, an X-ray source, a lamp, and/or a laser.

As will be described in more detail below, the gas inlet of the reactor assembly may be fluidly connected to a supply of at least one gas selected from the group consisting of air, oxygen, hydrogen, helium, nitrogen, neon, argon, krypton, xenon, Carbon monoxide, carbon dioxide, and mixtures thereof; and/or (iii) The gas supply is directed through a gas manifold controlled by a mass flow meter.

As will be described in more detail below, the nanoporous carbon powder charged to the reactor assembly may comprise graphene having at least 95% by weight. Carbon (metal based) with a mass mean diameter between 1 µm and 5 mm and an ultramicroporous surface area between about 100 and 3000 m ² /g. The nanoporous carbon powder is preferably characterized by acid conditioning, wherein the acid is selected from the group consisting of HCl, HF, HBr, HI, sulfuric acid, phosphoric acid, carbonic acid, and nitric acid, and the residual water content is less than that of exposure to less than 40% RH at room temperature. The value reached at relative humidity (RH). In a preferred embodiment, the process contemplates degassing the nanoporous carbon powder prior to the process.

As will be described in more detail below, the reactor assembly may include a number of devices capable of applying electromagnetic fields, including x-ray sources, coils, lasers, and lamps or lamps, including pencil lights, short-wave lamps, and long-wave lamps. The wavelength produced by each device (e.g. lamp or laser) can be selected independently.

As will be described in more detail below, the RA coils can be made of the same or different conductive materials. For example, the first RA coil includes copper wire, the second RA coil includes a braid of copper and silver wire, the third RA coil is platinum wire wound and each RA coil is configured to generate a magnetic field, and wherein each power supply Provides AC and/or DC current independently.

As will be described in more detail below, the reactor assembly may be characterized in that (i) a first pair of RA lamps are arranged in a first plane defined by the central axis of the reactor chamber and a first radius, (ii) a second pair of The RA lamps are arranged in a second plane defined by the central axis of the reactor chamber and the second radius and (iii) the third pair of RA lamps are arranged in a third plane defined by the central axis of the reactor chamber and the third radius. Preferably, each RA lamp is a pencil lamp characterized by a tip substantially equidistant from the central axis, and each pair of RA lamps includes a vertical RA lamp and a horizontal RA lamp. Preferably, each pair of lamps is equally spaced around the circumference of the reactor chamber.

As will be described in more detail below, the reactor assembly also includes an electromagnetic embedding enclosure (E/MEE or EMEE) as defined more specifically below. The E/MEE is typically positioned along the gas line upstream of the reactor module gas inlet. Typically, the electromagnetic inset housing upstream of the gas inlet consists of: (a) gas inlets; (b) At least one E/MEE penlight located below the internal gas line, at least one E/MEE penlight located above the internal gas line, and at least one E/MEE penlight located to the side of the internal gas line; wherein each E/MEE penlight is independently rotatably mounted, positioned along the length of the internal gas line, and The lamps and/or coils are powered by a power source, preferably from the power source of the reactor assembly; The gas flow, lights and/or coils are preferably independently controlled by one or more central processing units, preferably a central processing unit (CPU) of the reactor assembly. Usually, the CPU independently controls the power supply of each E/MEE penlight and the rotational position of each E/MEE penlight.

As will be described in more detail below, the E/MEE housing can generally be closed and opaque, the inner gas line can be transparent and the outer gas line fluidly connected to the housing outlet and gas inlet can be opaque. Typically, the internal gas lines are between 50cm and 5m or more, and between 2mm and 25cm or more in diameter.

As will be described in more detail below, the apparatus can have at least 5 E/MEE penlights located on the internal gas lines. Each E/MEE penlight can be positioned independently with its longitudinal axis (i) parallel to the internal gas line, (ii) radially arranged in a plane perpendicular to the internal gas line, or (iii) perpendicular to the plane created Along the longitudinal axis of the internal gas line or along the vertical axis of the internal gas line. Each E/MEE penlight can be independently secured to one or more pivots that allow rotation between approximately 0 and 360 degrees relative to the x, y, and/or z axes, where (i) the x axis is defined as the axis parallel to the gas line and its vertical plane, (ii) the y-axis defines the axis perpendicular to the gas line and parallel to its horizontal plane, and (iii) the z-axis defines the axis perpendicular to the gas line and parallel to its vertical plane flat.

As will be described in more detail below, the at least one E/MEE pencil lamp can be a neon lamp, the at least one E/MEE pencil lamp can be a krypton lamp, and the at least one E/MEE pencil lamp can be an argon lamp. It may be desirable to match or pair one or more E/MEE penlights with one or more (eg, a pair) RA lamps. Therefore, at least one pair of RA pencil lamps can be selected from the group consisting of neon, krypton and argon.

As will be described in more detail below, the present invention also includes nanoporous carbon powder compositions and gas compositions produced according to the claimed methods and processes.

The present invention relates to methods of instantiating materials such as gas and/or hydrogen in nanoporous carbon powders. The present invention includes a method comprising the steps of contacting a bed comprising nanoporous carbon powder with a first gas composition and optionally an electromagnetically activated gas while applying electromagnetic radiation to the nanoporous carbon powder sufficient to induce Time to instantiation within the nanopore and/or from the carbon nanopore. The method produces a product gas composition that is substantially different from the first gas composition. The method of the present invention has broad applicability in the production of novel gas compositions such as hydrogen or hydrogen on demand.

Nanoporous carbon powder

Nanoporous carbon powder or nanostructured porous carbon can be used in the processes and methods of the present invention. Nanoporous carbon powder or nanostructured porous carbon is also referred to herein as "starting material" or "charge material". Carbon powder preferably provides surface and porosity (eg, ultramicroporosity) to enhance metal deposition, including deposition, instantiation, and growth. Preferred carbon powders include activated carbon, engineered carbon, graphite and graphene. For example, carbon materials useful herein include graphene foams, fibers, nanorods, nanotubes, fullerenes, flakes, carbon black, acetylene black, mesocarbon particles, microbeads, and granules. The term "powder" is intended to define discrete fine grains or granules. Powders can be dry and flowable, or moistened and agglomerated, such as cakes that can be broken by stirring. Although powders are preferred, the present invention contemplates replacing powders in the process of the present invention with larger carbon materials, such as bricks and rods comprising larger porous carbon blocks and materials.

The examples used herein typically describe highly purified forms of carbon, eg >99.995% wt pure carbon (metal based). A highly purified form of carbon is exemplified for proof of principle, quality control, and to ensure that the results described here are not the result of cross-contamination or diffusion within the carbon source. However, it is contemplated that less pure carbon materials may also be used. Thus, the carbon powder can comprise at least about 95% wt carbon, such as at least about 96%, 97%, 98%, or 99% wt carbon. In a preferred embodiment, the carbon powder can be at least 99.9%, 99.99%, or 99.999% wt carbon. In each case, purity can be determined based on either the gray base or the metal. In another preferred embodiment, the carbon powder is a mixture of different carbon types and forms. In one embodiment, the carbon bed is composed of a mixture of different nanoengineered porous carbon forms. Carbon powder may contain dopants.

The toner preferably contains fine particles. Preferred toners can have a volume median geometric particle size between less than about 1 micron and 5 mm or greater. Preferred carbon powders may be between about 1 μm and 500 μm, such as between about 5 μm and 200 μm. Preferred carbon powders used in the examples have a median diameter between about 7 μm to 13 μm and about 30 μm to 150 μm.

The dispersibility of the carbon particle size can improve the quality of the product. It is convenient to use a carbon material having a uniform size or a single particle size distribution. Thus, preferred carbons are characterized by a polydispersity index between about 0.5 and 1.5, such as between about 0.6 and 1.4, between about 0.7 and 1.3, between about 0.8 and 1.2, or between about 0.9 and 1.1 . The polydispersity index (polydispersity index, PDI) is the ratio of the mass average diameter to the number average diameter of the particle population. Carbon materials characterized by bimodal particle sizes can improve gas flow in reactors.

The carbon powder is preferably porous. The pores or cavities present within the carbon particles may be macropores, micropores, nanopores, and/or ultramicropores. In contrast to graphene, pores may include electron distribution defects, usually due to morphological changes due to pores, cracks or fissures, corners, edges, expansion, or surface chemical changes such as addition of chemical moieties or surface groups. For example, consider possible spatial variations between carbon sheets, fullerenes, or nanotube layers. It is believed that instancing occurs preferentially at or within pores or pores containing defects, and that the nature of the surface features affects instancing. For example, Micromeritics enhanced pore distribution analysis (eg ISO 15901-3) can be used to characterize carbon. The carbon powder is preferably nanoporous. "Nanoporous carbon powder" is defined herein as a carbon powder characterized by nanopores having a pore size (eg, width or diameter) of less than 100 nm. For example, IUPAC subdivides nanoporous materials into microporous materials (pore size between 0.2nm and 2nm), mesoporous materials (pore size between 2nm and 50nm) and macroporous materials (pore size greater than 50nm). Ultramicropores are defined herein as having a pore size of less than about 1 nm.

Uniformity of pore size and/or geometry is also desirable. For example, preferred carbon materials (e.g., powders) have ultramicropores at least about 10% of the total porosity, such as at least about 20%, at least 30%, at least about 40%, at least about 50%, at least about 60% , at least about 70%, at least about 80%, or at least about 90%. Preferred carbon materials (e.g., powders) are characterized by a significant number, prevalence, or concentration of ultramicropores of the same diameter, thereby providing predictable electromagnetic harmonic resonance and/or dwell within the pores, cavities, and gaps. wave form. The term "diameter" in this context is not intended to require the spherical geometry of the pores, but is intended to encompass dimensions or other characteristic distances between surfaces. Accordingly, preferred carbon materials (e.g., powders) are characterized by equal diameter porosity (e.g., nanopores or ultramicropores) of at least about 10%, such as at least about 20%, at least about 30%, of the total porosity , at least about 40%, at least about 50%, at least about 60%, at least about 70%, at least about 80%, or at least about 90%.

Measuring the adsorption isotherm of a material can be used to characterize the surface area, porosity, eg external porosity of the carbon material. Particularly preferred carbon powders have a surface area between about 1 m ² /g and 3000 m ² /g. Specifically preferred are carbon powders having an ultramicroporous surface area of at least about 50 ^m2 /g, preferably at least about 300 ^m2 /g, at least about 400 ^m2 /g, at least about 500 ^m2 /g, or higher. Activated or engineered carbons are available with surface area specifications, as well as other high-quality carbon sources. The surface area can be measured independently by the BET surface adsorption technique.

The correlation of surface area with metal deposition was explored in a number of experiments. Typical pore surface area measurements using the Micromeritics BET surface area analysis technique under nitrogen at 77K (-196.15C) did not reveal a substantial correlation of metallic element deposition at ≥5σ confidence levels or coincidence probabilities. However, a correlation with ultramicropores (pores smaller than 1 nm in size or diameter) was observed. Without being bound by theory, solidification is believed to be related to resonant cavity characteristics of nanopores and nanoporous networks, such as the distance between surfaces or walls. The characteristics of ultramicropores can be predicted from ultramicropore diameters measured by BET, for example enhanced by density function theory (DFT) models. With the help of machine learning, more precise relationships can be established between ultramicropore size, distribution, disordered overlapping features, wall separation and diameter, and elemental metal nucleation.

Carbon materials and powders are available from a number of commercial suppliers. MSP-20X and MSC-30 are high surface area alkaline activated carbon materials with nominal surface areas of 2,000-2,500 m ² /g and >3,000 m ² /g and median diameters of 7-13µm and 60-150µm, respectively (Kansai Coke & chemical companies). Norit GSX is a steam scrubbed activated carbon obtained from Alfa Aesar. The purified carbon forms used in the experimental part all exceeded ≥99.998 wt% C (metal-based).

It may also be necessary to alter the surface chemistry of the carbon. For example, improved performance was observed when the carbon was tuned with acids or bases. It may be beneficial to contact the carbon with a dilute acid solution selected from HCl, HF, HBr, HI, sulfuric acid, phosphoric acid, carbonic acid, and nitric acid, followed by washing with water (eg, deionized water). The amount of acid is preferably less than about 30%, less than about 25%, less than about 20%, less than about 15%, less than about 10%, or less than about 5%, preferably less than or equal to 1% by volume. Preferred acids for pickling are those with a pKa of less than about 3, such as a pKa of less than about 2. After washing, it is beneficial to place the carbon under a blanket of gas such as inert gas, helium, hydrogen or mixtures thereof. Alternative gases include carbon monoxide, carbon dioxide, nitrogen, argon, neon, krypton, helium, ammonia, and hydrogen. Carbon can also be exposed to a base, such as KOH, before or after acid treatment.

Controlling the residual water content in the carbon, which may include moisture, can improve performance. For example, the carbon material can be placed in an oven at a temperature of at least about 100°C, preferably at least about 125°C, such as between 125°C and 300°C, for at least 30 minutes, such as about 1 hour. The oven can be at ambient or under negative pressure, such as under vacuum. Alternatively, the carbon material can be placed in an oven with high vacuum at a temperature of at least about 250°C, preferably at least about 350°C, for at least 1 hour, such as at least 2, 3, 4, 5, or 6 hours. Alternatively, the carbon material can be placed in an oven with high vacuum at a temperature of at least about 700°C, preferably at least about 850°C, for at least 1 hour, such as at least 2, 3, 4, 5, or 6 hours. Alternatively, water or moisture can be removed by vacuum or freeze drying without extensive heating. Preferably, the carbon has a water or moisture content of less than about 35%, 30%, 25%, 20%, 15%, 10%, 5%, such as less than about 2%, by weight of carbon. In other embodiments, the carbon may be exposed to a specific relative humidity (RH), such as 0.5%, 1%, 2%, 5%, 12% RH, or 40% RH, or 70% RH, or 80% RH, or 90% RH , for example, at 22°C.

Pretreatment of carbon materials may be selected from one or more of purification, humidification, activation, acidification, washing, hydrogenation, drying, chemical modification (organic and inorganic) and blending steps, including all steps. For example, carbon materials can be reduced, protonated, or oxidized. The order of steps may be as described, or two or more steps may be performed in a different order.

For example, MSP-20X was exposed to alkali (C:KOH, molar ratio 1:0.8), activated at 700°C for 2 hours, washed with acid, and then hydrogenated using HCl and _HNO3 washes to form MSP-20X, respectively. 20X lot numbers 1000 and 105. MSP-20X was acid washed and hydrogenated after washing with HCl and _HNO3 to form MSP-20X batches 1012 and 1013, respectively. Activated carbon powder developed for hydrogen storage was acid washed with HCl, followed by _HNO3 washing and hydrogenation to form APKI batch numbers 1001 and 1002, as described by Yuan, J. Phys. Chem. B 20081124614345-14357]. Polyetheretherketone (PEEK, Victrex 450P) and polyetherimide (PEI, Ultem ^® 1000) were prepared by thermal oxidation in static air at 320°C for 15 hours, and in the temperature range of 550-1100°C under nitrogen Carbonization in atmosphere with a carbon yield of 50–60 wt%. The carbons were then activated by the following procedure: (1) Grinding the carbonized polymer with KOH in the presence of alcohol at a KOH/carbon ratio of 1/1–1/6 (w/w) to form a fine paste; (2) Heat the paste to 600-850° C. for 2 hours in a nitrogen atmosphere; (3) Wash and rinse with deionized water and dry in a vacuum oven. PEEK/PEI (50/50 wt) blend was kindly provided by PoroGen, Inc. Likewise, the acid wash sequence of batches 1001 and 1002 was reversed to form AKI batches 1003 and 1004. General-purpose natural graphite, about 200 mesh, was purchased from Alfa Aesar, product number 40799. Graphite lots R and Z were washed with HCl and hydrogenated to form R lot 1006 and Z lot 1008, respectively. Alfa Aesar graphites R and Z were washed with nitric acid and hydrogenated to form R Lot 1007 and Z Lot 1009, respectively. MSC-30 (Kansai Coke and Chemicals) was acid washed, hydrogenated after washing with HCl and _HNO3 to form MSC30 lot numbers 1010 and 1011, respectively. MSC-30 was exposed to alkali (C:KOH, molar ratio 1:0.8), activated at 700°C for 2 hours, washed with HCl or nitric acid, and then hydrogenated to form MSC-30 batches 1014 (HCl washed) and 1015, respectively ( _HNO3 wash). MSP-20X, MSC-30, Norit GSX, and Alfa Aesar R are manufactured by MWI, Inc. for MSP-20X lot numbers 2000 and 2004, MSC-30 lot numbers 2001, 2006, and 2008, Norit GSX lot numbers 2005 and 2007, and Alfa Aesar R Lot No. 2009 was used for purification. MSP-20X Lot 2000 and MSC-30 2001 were washed with HCl and hydrogenated to form MSP-20X Lot 2002 and MSC-30 Lot 2003, respectively. Alfa Aesar R was washed with 1%, 5%, 10%, 15%, 20%, 25% and 30% HCl (vol.), and then hydrogenated to R Lot Graphite n% vol HCl, respectively. Purified _MSP -20X (Lot No. 2006) was also washed with HCl, nitric acid, HF or _H2SO4 to form MSP-20X 1% HCl, MSP-20X 1% _HNO3 , MSP-20X 0.4% HF, MSP-20X 0.55% _H2SO4 (Lot ₁₀₄₄ ). Purified Norit GSX (Lot _No. 2007) was similarly washed with nitric acid, HF or _H2SO4 to form Norit _GSX 1% _HNO3 (Lot No. 1045), Norit-GSX 0.4% HF, Norit-GSX 0.55% _H2SO4 . Purified MSC30 (Lot 2008) was _similarly washed with HCl and _H2SO4 to form MSC30 ₁ % HCl and MSC30 5% _H2SO4 . Purified MSP20X (Lot 2006), Norit GSX (Lot 2007) and MSC30 (Lot 2008) were hydrogenated. Purified MSP-20X, Norit GSX, and MSC30 were washed with 1% HCl using methanol as a wetting agent. AKI-S-108 lot numbers 1021-1024 were recovered. Ref-X Blend is 40% Alfa Aesar R:60% MSP-20X (Lot No. 2006) imbibed at 850°C, then exposed to _CO2 at 138kPa (20 psi) for 5 days.

The nanoporous carbon powder is preferably degassed before starting the process. For example, nanoporous carbon powders can be degassed by subjecting the powders to a vacuum. A series of vacuums can be used with or without elevated temperature. It has been found that applying a vacuum of about 10 ^-2 Torr to 10 ^-6 Torr is sufficient. The powder may be degassed prior to loading it into the reactor chamber. Preferably, the powder may be degassed after it has been charged into the reactor chamber. In the following non-limiting example, carbon powder was loaded into a reactor chamber, placed in a reactor assembly, and the entire reactor assembly was subjected to a degassing step by maintaining the reactor assembly under vacuum. The degassing step can be performed at room temperature or at elevated temperature. For example, good results were obtained at a temperature of 400°C. Other temperatures may be at least 50°C, such as at least 100°C, at least 150°C, at least 200°C or at least 300°C. The degassing step can be for at least 30 minutes, eg, at least 45 minutes, at least 60 minutes, at least 4 hours, at least 6 hours, at least 12 hours, or at least 24 hours. Degassing the toner ensures that contaminating elements have been removed from the system.

Carbon can be recycled or reused. In recycling the carbon, the carbon can optionally be subjected to acid washing and/or water removal one or more times. In this embodiment, the carbon can be reused one or more times, such as 2, 3, 4, 5, 10, 15, 20 or about 25 or more times. Carbon can also be added in whole or in part. Recycling or reusing carbon has been found to increase the yield of metal nanostructures and tune the nucleation properties, enabling changes in element selectivity and resulting distribution. Accordingly, one aspect of the present invention is to practice the process with recycled nanoporous carbon powder, eg, nanoporous carbon powder that has previously been subjected to the process of the present invention one or more times.

Nanoporous carbon composition

The nanoporous carbon compositions produced by the processes described herein have several surprising and unique properties. The nanoporosity of carbon powders is generally preserved during processing and can be confirmed, for example, visually with a scanning electron microscope or modeled by BET analysis. Visual inspection of the powder can identify elemental nanostructures present in and around the nanopore. The nanostructures are usually elemental metals. Visual inspection of the powder can also identify the elemental macrostructure present in and around the nanopore. The macrostructure is typically elemental metallic and often contains interstitial and/or internal carbon as generally described by inventor Nagel in US Patent 10,889,892, which is incorporated herein by reference in its entirety. The process used to exemplify the gas is described in USSN 63/241,697 to Nagel, which is hereby incorporated by reference in its entirety.

Typically, the porosity of the nanoporous carbon composition is at least about 70% that of the ultramicropores of the nanoporous carbon powder starting or charge material, and the total void volume is about 40% or more of the volume of the bulk material. More. The pores or cavities present within the carbon particles may be macropores, micropores, nanopores, and/or ultramicropores. Compared to graphene, pores may include electron distribution defects, usually due to pores, cracks or gaps, edges, corners, swelling, coordination bonds or other changes in surface chemistry (e.g. addition of chemical functional groups or surface groups, etc.) caused shape changes. For example, spaces that may occur between carbon sheets, fullerenes, nanotubes, or intercalated carbon layers can be considered. It is believed that instantiation occurs preferentially at or within the pores and that the nature of the surface properties affects the deposits. For example, Micromeritics enhanced pore distribution analysis (e.g. ISO 15901-3) can be used to characterize carbon. Preferred carbon powders are nanoporous. It has now surprisingly been found that gases and other lightweight materials can be instantiated and collected in a gas flow.

method and equipment

Conceptually, the equipment used for the benchmark experiments can be divided into two main areas: gas handling and reactor assembly.

Gas handling:

The gas handling section controls the gas composition and flow rate, with the option of embedding electromagnetic (eg optical) messages or electromagnetic gas pretreatment into the reactor. The present invention includes an electromagnetic embedded enclosure (E/MEE or EMEE) or apparatus for processing a gas (feed gas or first gas composition, used interchangeably herein) comprising or consisting of: central processing unit and power supply; supply of one or more gases; a housing having a housing inlet and a housing outlet; Upstream gas lines fluidly connected to each gas supply and enclosure inlet; an internal gas line fluidly connected to the enclosure inlet and the enclosure outlet; a downstream gas line fluidly connected to the housing outlet; at least one penlight positioned below the internal gas line, at least one penlight positioned above the internal gas line, and/or at least one penlight positioned to one side of the internal gas line; Optional short-wave and/or long-wave lights; and An optional coil wound on the internal gas line, operatively connected to the frequency generator; wherein each lamp is independently rotatably mounted, positioned along the length of the internal gas line, and powered by an electrical source; and Wherein, the central processing unit independently controls the power supply to the frequency generator (if any) and each lamp, and the rotational position of each lamp. The feed gas may preferably be research grade or high purity gas, for example, delivered by one or more gas supplies such as compressed gas cylinders. Examples of gases that may be used include, for example, air, oxygen, nitrogen, hydrogen, helium, neon, argon, krypton, xenon, ammonia, carbon monoxide, carbon dioxide, and mixtures thereof. Preferred gases include nitrogen, helium, argon, carbon monoxide, carbon dioxide, and mixtures thereof. Nitrogen, air, and helium are preferred. In the following examples, highly purified nitrogen was used. Product gas analysis is facilitated by the use of highly purified nitrogen. Feed gas can be added continuously or discontinuously throughout the process.

One or more gases (e.g., 2, 3, 4, 5, or more gases) can optionally be passed through a gas manifold that includes a mass flow meter to produce a first gas composition (also referred to as a reactor feed gas ). The reactor feed gas can then bypass the electromagnetic (EM) embedded enclosure (E/MEE) or pass through one or more E/MEEs. E/MEE exposes the reactor feed gas to various electromagnetic field (EMF) sources. Flow rate, composition, and residence time can be controlled. The flow rate of the reactor feed gas can be between 0.01 standard liters per minute (SLPM) and 10 SLPM, or 100 SLPM or more. A constant gas flow maintains a clean environment within the reactor. The schematic diagram shown in Figure 1 depicts the gas flow path through the sample E/MEE. Sample E/MEE consists of a series of lamps and coils that selectively expose the reactor feed gas to EM radiation. The EMF sources within the E/MEE can be energized simultaneously or sequentially or a combination of both.

Figure 1 is a diagram of the E/MEE of the present invention. Gas enters the E/MEE through gas inlet 101 (or inlet) in line 102 and exits at gas outlet 110 (or outlet). The air inlet 101 and the air outlet 110 may optionally have valves.

Line 102 may be made of a transparent or translucent material (preferably glass) and/or an opaque or non-translucent material such as stainless steel or non-translucent plastic such as TYGON ^® manufactured by Saint-Globain Performance Plastics, or combinations thereof. When the gas resides in the line, the use of opaque materials can reduce or eliminate electromagnetic exposure to the gas. The length of line 102 may be between 50 cm and 5 meters or longer. The inner diameter of the line 102 may be between 2 mm and 25 cm or greater. The pipeline 102 may be supported on and/or enclosed within an enclosure or substrate 111 with one or more supports 112, such as one or more plates. For example, the substrate 111 may be configured as a plane or floor, a pipe or a box. Where the substrate is a box, the box may feature a floor, ceiling and side walls. The box can shut off and/or isolate ambient EM radiation, such as ambient light.

One or more lamps (eg 2, 3, 4, 5, 6, 7, 8, 9, 10 lamps or more) can be configured within the E/MEE. The lamp (separately numbered) is preferably a pen lamp, characterized by an elongated tube having a longitudinal axis. The penlight can be positioned independently with its longitudinal axis (i) parallel to the line 102, (ii) radially disposed in a vertical plane relative to the line 102, or (iii) perpendicular to the longitudinal axis along the line 102 or along the line 102 The plane created by the vertical axis of .

Each lamp can be independently fixed in its direction by the support 112 . Each light can be independently secured to pivot 113 to allow rotation from the first position. For example, the light may rotate between about 0 degrees and 360 degrees relative to the first position, such as about 45 degrees, 90 degrees, 135 degrees, 180 degrees, 225 degrees, or 70 degrees, preferably about 90 degrees. Rotation can be relative to the x, y, and/or z axes, where (i) the x-axis defines the axis parallel to the gas line and its vertical plane, and (ii) the y-axis defines the axis perpendicular to the gas line and parallel to its horizontal plane , and (iii) the z-axis is defined as the axis perpendicular to the gas line and parallel to its vertical plane.

With reference to a particular penlight within the E/MEE, line 102 is disposed along the E/MEE with gas flowing from inlet 101 and exhaust at outlet 110 . Lamp 103 is a neon lamp, first shown above line 102 , oriented along the z-axis and perpendicular to line 102 with the lamp head pointing towards line 102 . Lamp 109 , a krypton lamp, is shown below line 102 , oriented parallel to the x-axis with the lamp head pointing toward gas outlet 110 . Lamps 104 and 105 are long-wave and short-wave lamps, respectively, shown parallel to line 102 , oriented along the x-axis, with lamp heads pointing toward gas inlet 101 . Lamp 122 , an argon lamp, is shown below line 102 , oriented parallel to the x-axis with the lamp head pointing toward gas inlet 101 at approximately the same distance from lamps 104 and 105 . Lamp 106 is a neon lamp approximately mid-point downstream of the E/MEE, above line 102, capped end down. Lamp 107 , a xenon lamp, is shown downstream of lamp 106 above line 102 , parallel to the x-axis of line 102 and directed toward gas outlet 110 . Lamp 108 is an argon lamp positioned below line 102 with a lamp head pointing towards line 102 along the z-axis. An optional coil 120 is wound around the pipeline 102 . Each of these lights can be rotated independently, for example, ^90o along any axis. Each light is connected to a powered device or power source to turn the power on or off. Each lamp can be independently rotated 1, 2, 3, 4 or more times during the process. For convenience, each light is held by a pivot that can be controlled by a central processing unit, such as a computer programmed to rotate the pivot and power each light. For the convenience of describing the experimental process, each direction of each lamp is referred to as "position n", where n is 0, 1, 2, 3, 4 or more. Each lamp can be energized at a specific amperage for a specific period of time and positioned or repositioned as the process progresses.

In the example described below, the initial bulb position for each lamp is described in degrees. When looking down the gas line in the direction of expected airflow (for example, when looking at an E/MEE outlet), use the 0 ^o reference point as the 12 o'clock position on the glass tube. The length of the glass tube or tubing is considered the optical length (eg, 39 inches in this example). For example, 6 inches from the end is defined as 6 inches from the optical end of the pipe.

The lamps may be placed, for example, above, below, or to the side of the line 102 (eg, a plane that is flush with or parallel to (above or below) the longitudinal axis). The lamp can be independently placed between 5 and 100 cm from the center of the line 102 in a vertical plane from the tip of the lamp to the center of the line 102 . One or more lamps may be placed in the same vertical plane along the pipeline 102, consisting of lamps 122, 104, and 105 as shown. Two lamps are located in the same vertical plane if they are at the same distance from the air inlet 101 (defined by the head or bottom of the lamp). Preferably, lamps 105 may be placed in multiple (eg, 2, 3, 4, 5, or more) vertical planes within the E/MEE along the length of pipeline 102 . Additionally, one or more lights may be placed above, below, or across line 102 at the same level as shown by lights 104 and 105 . Two lamps are located in the same horizontal plane if they are the same distance from the center of the line 102 (defined by the head or base of the lamp). Preferably, lights may be placed in multiple (eg, 2, 3, 4, 5, or more) horizontal planes within the E/MEE along the length of pipeline 102, generally as shown.

It will be understood that, as used herein, a "pen light" is a gas or vapor filled lamp that emits a specific calibrated wavelength when excited by the vapor. For example, pencil lamps include argon lamps, neon lamps, xenon lamps, and mercury lamps. For example, one or more lamps may be selected from argon, neon, xenon or mercury or combinations thereof. Preferably, at least one lamp is selected from each of argon, neon, xenon, and mercury. Wavelengths between 150 nm and 1000 nm can be selected. An example of a penlight is a lamp characterized by an elongated tube having a head end and a base.

Long-wave and/or short-wave UV lamps may also be used. The pen lamps used in the E/MEE were purchased from VWR™ under the name UVP Pen_Ray ^® Rare Gas Lamp, or Analytik Jena in the case of UV shortwave lamps.

A power supply is operatively and independently connected to each lamp, E/MEE coil and frequency generator. The power supply can be AC and/or DC.

E/MEE can be open or closed. Where the E/MEE is enclosed, the enclosure is usually opaque and protects the gas from ambient light. The housing can be made of plastic or resin or metal. It can be rectangular or cylindrical. Preferably, the enclosure features a floor support.

In benchmark experiments, the feed gas could bypass the E/MEE section and be fed directly to the reactor assembly. The energy levels and frequencies provided by the EM source can vary.

Figure 4A provides a second illustration of the E/MEE of the present invention. Gas enters the E/MEE at gas inlet 401 and exits along line 410 at gas outlet 409 . Penlight 402 and penlight 403 are shown parallel to and above line 410 along a vertical plane passing through the axis of line 410 . Penlights 404 and 405 are parallel to and below line 410 in the same horizontal plane equidistant from the vertical plane passing line 410 . Penlight 406 is shown positioned above and perpendicular to line 410 along the z-axis. Optional coil 407 is a conductive coil wrapped around tubing 410 . Penlight 408 is shown below line 410 along the z-axis and perpendicular to line 410 . The base plate 411 provides a base for the support 412 . Pivot 413 controls the position of each penlight and allows rotation along the x-, y- and z-axes. An optional X-ray source 429 is also shown directed at the coil 407 .

Coil 407 is preferably made of conductive material and is connected to a power source and optionally to a frequency generator. Coils may comprise copper, aluminum, platinum, silver, rhodium, palladium or other metals or alloys (including braids, plating and coatings) and may optionally be covered with an insulating coating such as glyptal. It may be advantageous to use a braid of 1, 2, 3 or more wires. Coils can be made from the wire normally used for induction coils and can vary in size and number of turns. For example, a coil may include 3, 4, 5, 6, 7, 8, 9, 10 or more turns. The inner diameter of the coil may be between 2 cm and 6 cm or larger and preferably fits snugly against the line 410 . The coils used may have a diameter between 5 mm and 2 cm.

X-ray source 429 may be included in the E/MEE. For example, X-ray source 429 may be directed to line 410 along a line between inlet 401 and outlet 409 . For example, it may be advantageous to direct the X-ray source 429 at the coil 407, if present.

Reactor Assembly (RA):

The invention also relates to a reactor assembly comprising: a gas inlet and one or more gas outlets; a reactor chamber, preferably containing nanoporous carbon material or powder; a first porous frit defining the floor of the reactor chamber, a second porous frit defining the top of the reactor chamber; wherein each porous frit has a porosity sufficient to allow gas to permeate into the reactor chamber and comprises a nanoporous carbon material; an optional reactor cup defining the side walls of the reactor chamber; an optional reactor cover disposed over the second frit; a reactor main body disposed below the first porous frit; a reactor headspace disposed above the reactor head; an optional foil disposed between the reactor chamber and the reactor cup; one or more coils surrounding the reactor body and/or the reactor chamber and operatively connected to a power supply and/or frequency generator; an optional X-ray source configured to expose the reactor headspace to X-rays; one or more optional lasers configured to direct lasers toward the frit and/or through the reactor chamber; A computer processing unit configured to control the power supply, frequency generator, lamp, laser and x-ray source (if present). The invention also includes a reactor assembly comprising: a gas inlet and one or more gas outlets; a reactor chamber, preferably comprising nanoporous carbon material; a first porous frit defining the floor of the reactor chamber, a second porous frit defining the top of the reactor chamber; wherein each porous frit has a porosity sufficient to allow gas to permeate into the reactor chamber and comprises a nanoporous carbon material; a reactor headspace disposed above the reactor lid; 2, 3, 4, 5, or more RA coils surrounding the reactor chamber and/or reactor headspace and operably connected to the RA frequency generator and power supply; 2, 3, 4, 5, or more pairs of lamps, wherein the pairs of lamps are disposed circumferentially around the RA coil and define a space between the pairs of lamps and the RA coil; an optional x-ray source configured to expose the reactor chamber to x-rays; one or more optional lasers configured to direct laser light through the reactor chamber; and A computer processing unit configured to control the power supply, frequency generator and optional x-ray source and laser. The invention also includes a reactor assembly comprising: a gas inlet and one or more gas outlets; a reactor chamber, preferably comprising nanoporous carbon material; a first porous frit defining the floor of the reactor chamber, a second porous frit defining the top of the reactor chamber; wherein each porous frit has a porosity sufficient to allow gas to permeate into the reactor chamber and comprises a nanoporous carbon material; a reactor headspace disposed above the reactor chamber; an induction coil surrounding the reactor chamber and/or the reactor headspace and operatively connected to a power supply; A computer processing unit configured to control the power supply device. The reactor chamber may optionally contain a lid and/or cup to contain the carbon material.

As shown in Figures 2A and 2B, the reactor assembly includes a reactor body 202 and a starting or charge material 204 (which is typically a nanoporous carbon powder), and is located downstream of a gas source 221 and an E/MEE 222 ( as shown in Figure 2A). As mentioned above, the reactor feed gas can bypass the E/MEE. Reactor body 202 may be a packed bed tubular microreactor surrounded by one or more conductive coils 208 (shown in FIG. 2 , cross-section of the reactor assembly).

The conductive coil 208 may be made of a conductive material such as copper, aluminum, platinum, silver, rhodium, palladium or other metals or alloys (including braids, plating and coatings), and may optionally be covered with an insulating coating such as glyptal. Coils can be made from the wire normally used for induction coils and can vary in size and number of turns. For example, a coil may include 3, 4, 5, 6, 7, 8, 9, 10, or more turns. The inner diameter of the coil may be between 2 cm and 6 cm or greater and preferably fits snugly with the reactor body closed end tube 207 . The wire used may have a diameter between 5 mm and 2 cm.

Each conductive coil 208 (or coils) can generate inductive heat and optionally a magnetic field. Standard induction coils or reverse field induction coils (having lower and upper coils connected by extension arms, allowing the parts to be wound in opposite directions, thus producing opposite magnetic fields) are preferred. The conductive coil 208 may be water cooled by a heat exchanger. The conductive coil 208 may be connected to a power supply flange 210, which may also be water cooled, and in turn may be connected to a power supply, such as an Ambrell 10kW 150-400kHz power supply. In benchmark experiments, standard coils were used with simple copper windings. The wire can be wound to form a coil such that the connection to the power supply is at the opposite end of the coil (as shown in FIG. 5A ), or the coil can be returned so that the connection to the power supply is adjacent (as shown in FIG. 5B ).

The reactor assembly may optionally further include one or more conductive coils 208, preferably surrounding the reactor body 202 and its containment system. For example, a reactor assembly may include 1, 2, 3, 4, 5, 6, 7, 8, 9, or 10 or more coils (also referred to as RA coils). As shown in Figure 2B, one or more electromagnetic (E/M) coils may be used to provide the magnetic field. Preferably, 1, 2, 3, 4 or 5 or more E/M coils may be used, more preferably 3, 4, or 5 E/M coils. Figure 3 shows, for example, three coil sets, which may generally be numbered 1, 2, or 3 from top to bottom. A set of coils (as shown in Figures 3A-3E) may be referred to as a boundary. Where multiple groups are used, the number of coils used is independently selected. In addition, groups can be equally spaced or irregularly spaced.

Coils can be made of conductive materials such as copper, platinum, silver, rhodium, palladium, and braided or coated wire of two or more materials. Each coil in a group can be made of the same or different material. For example, grouping can be done such that each coil is made of a different material. For example, a braid of copper and silver wires may be used. Silver-plated copper wire may be used. The first RA coil may be made of copper windings. The second RA coil may be a copper/silver braid. The third RA coil may be a platinum wire wound. The RA coils may be configured to generate a magnetic field, and wherein each power supply independently provides AC and/or DC current. Any or all RA coils can be optionally painted.

The geometry of the coil is preferably circular. However, other geometric shapes such as circles, ellipses, and ovals may also be used. The wire diameter may be between about 0.05 mm (>about 40 gauge) and about 15 mm (about 0000 gauge) or greater. For example, the wire diameter may be between about 0.08 mm (about 40 gauge) and about 0.8 mm (about 20 gauge). Excellent results were obtained with 0.13 mm (36 gauge) wire. The coil may be a wound wire (eg, the wire may be wound in 1, 2, 3, 4, 5, 6, 7, 8, 9, 20, or more turns), or may be a single turn. When the coil is wound by a single wire, the diameter or width of the wire may preferably be 10 mm or more in diameter. In this context, a "wire" can also be thought of as a strip in which the width of the material is greater than the depth. Figure 3 provides illustrations or views of various coils and coil sets. Coils can be made from a single wire, a wire alloy, or two or more wires. For example, two wires containing different metals can be twisted or braided together.

The inner diameter of each coil (or the dimension the coils are not round) can be the same or different and can be between 2 and 200cm.

Conductive coil 208 may be independently connected to one or more power supplies, such as AC or DC power supplies or a combination thereof. For example, AC current may be provided to alternate (eg, 1, 3, and 5) or adjacent coils (eg, 1, 2, and/or 4, 5), while DC current is provided to the remaining coils. The current may (independently) be provided at a frequency, for example in a patterned frequency, eg a triangular, square or sinusoidal pattern or a combination thereof. The frequency supplied to each coil can be the same or different, between 0 and 50 MHz or higher. While the conductive coils 208 can generate thermal energy or heat and transfer it to the reactor feed gas, they are primarily used to generate a magnetic field.

The power supply may be an AC and/or DC power supply or a combination thereof. The current may (independently) be provided at a frequency, for example in a patterned frequency, eg a triangular, square or sinusoidal pattern or a combination thereof. The frequency supplied to each coil may be the same or different and be between 0 and 50 MHz or higher, for example between 1 Hz and 50 Mhz.

As mentioned above, the RA coil typically surrounds the reactor chamber and/or reactor headspace. For example, a first RA coil may be aligned with a first (or bottom) frit. A second RA coil can be aligned with the reactor chamber or nanoporous carbon bed. A third RA coil can be aligned with the second (or top) frit. If present, a fourth RA coil may be disposed between the first RA coil and the second RA coil. If present, the fifth RA coil may be disposed between the second RA coil and the third RA coil. When there are two or more reactor chambers or nanoporous carbon beds, it may be necessary to add additional RA coils, also aligned with the second or additional reactor chambers or nanoporous carbon beds. Additional RA coils can be added to align with additional frit if present.

RA coils can typically be supported in supports or stators to maintain a fixed distance between each coil. The support, if present, can be transparent. In one embodiment, the RA coil can be configured in a cartridge that can be removed or moved.

The RA coil may additionally or alternatively be aligned with the reactor headspace. Reactor headspace may typically be the volume above the second or top frit. It will be appreciated that where the reactor assembly is positioned horizontally (or at some angle other than vertical), the geometry of the space remains unchanged despite rotation. The reactor headspace may generally be a closed volume. For example, the reactor assembly can be inserted into a closed-ended clear (eg, glass) tube, vial, or bottle. The reactor assembly can be movably engaged with the RA coils (or borders), allowing each RA coil to be aligned with a different element within the reactor assembly. For example, the first RA coil can be realigned with the reactor chamber.

Reactor body 202 may also be a packed bed, moving bed, or fluidized bed or other configuration featuring one or more chambers that receive charge material 204 and facilitate passage of reactor feed gas through charge material 204 and can transfer thermal and/or electromagnetic energy. The reactor body 202 is generally contained within an enclosure, such as a closed end tube 207 and a frit 203 , which is used to contain the charge material 04 . It may be advantageous to use a reactor with a translucent or transparent shell, such as quartz or other material characterized by a high melting point. The volume of the reactor bed can be fixed or adjustable. For example, the reactor bed may contain about 1 gram or less of starting material, about 1 gram to 1 kilogram or more of starting material. Where the reactor assembly comprises two or more reactor chambers, the reactor chambers are preferably stacked directly or indirectly, preferably have a common central axis and may be separated by one or two frits.

Reactor body 202 may be made of a thermally conductive material such as graphite, copper, aluminum, nickel, molybdenum, platinum, iridium, cobalt, or niobium, or a nonthermally conductive material such as quartz, plastic (eg, acrylic), or combinations thereof. An optional cup 206 covered with a lid 205 may be advantageous. The material of the cup and lid can be selected independently. For example, the optional graphite cups in the examples below can be combined with graphite lids. Copper mugs can be combined with graphite lids. Graphite cups can be combined with copper lids. Copper mugs can be combined with copper hats and more.

The reactor assembly may also receive a gas line through an inlet or gas inlet 201 and provide exhaust through an outlet or gas outlet 209, optionally controlled by a valve. A headspace defined by the closed-end tube 207 may be disposed above the reactor body 202 . Reactor body 202 is preferably made of graphite, copper, or other inorganic rigid material. The gas lines are preferably made of inert tubing such as glass, acrylic, polyurethane, plexiglass, silicone, stainless steel, etc. may also be used. Optionally, the tubing can be flexible or rigid, translucent or opaque. The air inlet is usually located below the charge material. The air outlet can be below, above or both.

Also shown is a frit 203 used to define a chamber containing the charge material. The frit can be made of a porous material that allows gas flow. The glass frit preferably has a maximum pore size smaller than the particle size of the starting material. Pore sizes of 2 to 50 microns, preferably 4 to 15 microns may be used. The thickness of the frit may satisfactorily be between 1 and 10 mm or greater. The frit is preferably made of an inert material such as silicon dioxide or quartz. Porous frits from Technical Glass Products (Painesville Tp., Ohio) were satisfactory. In the following examples, fused silica #3 porous frit (QPD10-3) with a pore size of 4 to 15 microns and a thickness of 2-3 microns and a fused silica frit (QPD10-3) with a pore size of 14 to 40 microns were used . The glass frits exemplified here are of very high purity at 99.99%wt to ensure that the results obtained are not negligible due to contamination. Glass frits of lower purity and quality can also be used. The diameter of the porous frit is preferably chosen to allow a tight fit inside the reactor or cup. That is, the diameter of the porous frit is about the same as the inside diameter of the reactor or cup, if any.

As shown in Figures 6A and 6B, the foil may optionally surround the chamber containing the charge material inside and/or outside the frit and/or cup, thereby forming a metallic boundary around the starting material. The foil can be a metal such as copper, platinum, niobium, cobalt, gold, silver, or alloys thereof. The foil can also be graphite or the like. The thickness of the foil may be between 0 and 0.5 cm, preferably 1-10 mm. The reactor profile can be linear or configured to include a constriction below the lower frit, giving a lollipop-like appearance. A (gas) line 102 is also shown.

The size of the reactor chamber is designed to contain the desired amount of charge material 204 . For the experiments described here, the reactor chamber was designed to contain between 20 mg and 100 g of nanoporous carbon powder. Larger reactors can be scaled up.

Reactor components can add other forms of electromagnetic radiation, such as light. Figure 4B illustrates light sources 426 and 427 that generate light that is directed through reactor enclosure 415 and the starting materials contained therein. Preferred light sources 426 and 427 may be lasers and/or may emit light with a wavelength between 10 nm and 1 mm. The light is optionally subjected to one or more filters 428, as shown by the use of light sources (beams) in Figure 4B. Preferably, the reactor assembly includes 2, 3, 4, 5, or more pairs of lamps arranged circumferentially around the RA coil. Preferred pen lights are eg those used in E/MEE, which is hereby incorporated by reference from above. The pairs of lights preferably define a boundary around the coil and do not touch or otherwise be adjacent to the coil. Two lamps are considered as a pair, which are close to each other, eg in the same plane as the central axis of the RA coil. The paired lamps can be parallel or perpendicular to the central axis of the RA coil. Lamps are considered to be close to each other if the distance between any two points between the lamp and the base is within 10 cm, preferably within 5 cm. Lamps positioned orthogonal to the central axis of the RA coils are typically positioned along a line defined by the radii of the one or more RA coils.

An RA lamp, such as a penlight close to the reactor body, can be matched or paired with one or more E/MEE lamps, such as a penlight located within the E/MEE enclosure and close to the gas lines. For example, where the E/MEE pencil lamps are neon lamps, the pair of RA lamps may be neon pencil lamps. Such matched lamps may emit light characterized by substantially the same wavelength. This can be conveniently achieved by using lamps from the same manufacturer with the same specifications.

The reactor can be in a closed or open enclosure 415 and can be supported therein by reactor supports. Reactor feed gas is directed to the reactor inlet frit or bottom frit, directed through the starting material contained within enclosure 415 and exits the reactor at the reactor outlet frit or top frit. The reactor feed gas can then be vented or recycled, optionally back to the E/MEE for further processing.

The reactor may also include an X-ray source 211 (FIG. 2C) or 424 (FIG. 4B) and/or one or more lasers 212 (FIG. 2C) or 426, and 427 (FIG. 4B). Preferred X-ray sources include mini-x. X-rays are preferably directed through the reactor towards the gas headspace or target holder 213 above the charge material. X-rays may be provided directly or indirectly by the source, for example by reflecting X-rays from a foil arranged above or below the frit.

Figure 7A shows a top view of a preferred reactor assembly. Penlight 1501 , penlight 1502 , and penlight 1503 are shown with the lamp heads facing the central axis of the reactor assembly along the radius of the reactor assembly. Penlight 1504, penlight 1505, and penlight 1506 are shown oriented parallel to the central axis of the reactor assembly and disposed in a plane along the radius of the reactor assembly. Penlight 1501 and penlight 1504 together form a first RA lamp pair. Penlight 1502 forms a second RA lamp pair together with penlight 1505 . Penlight 1503 forms a third RA lamp pair together with penlight 1506 . Like the E/MEE penlight, each RA lamp can be rotated along its x, y or z axis. As shown, each pair may optionally reside in the same radial plane. Outer support 15109 provides support for penlights 1501 , 1502 , and 1503 . Inner support 15110 provides support for pen lights 1504 , 1505 , and 1506 . The outer and inner supports are preferably made of a non-conductive material such as a polymer or resin and are preferably transparent. An optional X-ray source 1507 is shown which directs X-rays towards the central axis of the reactor chamber 1508 . Reactor connector 15111 is also shown.

Figure 7B is a perspective view of the reactor assembly. Penlight 1509, penlight 1510, and penlight 1511 are shown with the lamp heads oriented along the radius of the reactor assembly toward the central axis of the reactor assembly. The lamp head of each lamp is aligned with the center or third RA coil 1517 and on the same level. Penlight 1512, penlight 1513, and penlight 1514 are shown oriented parallel to the central axis of the reactor assembly, disposed in a plane along the radius of the reactor assembly, and characterized by a lamp head pointing toward the top of the reactor, away from ( gas) inlet port 1520. These lights are shown above the horizontal pen lights. The length of each penlight is aligned with RA coils 1516 , 1517 , and 1518 . The outer support 15109 and the inner support 15110 support the penlight. An optional X-ray source 1515 is shown directing X-rays toward the central axis of the reactor assembly above a third RA coil 1516 . Disposed within the reactor assembly may be a reflective plate that directs X-rays towards the reactor chamber. Reactor connector 15111 is also shown, along with other non-material connectors and spacers. A (gas) inlet 1520 and a (gas) outlet 1519 are also shown.

Figure 7C is a second perspective view of the reactor assembly. Penlight 1521 , penlight 1522 , and penlight 1523 are shown with the lamp heads oriented toward the central axis of the reactor assembly along a radius directed toward the reactor assembly. Penlight 1524, penlight 1525, and penlight 1526 are shown oriented parallel to the central axis of the reactor assembly, disposed in a plane along the radius of the reactor assembly, and characterized by a lamp head pointing towards the bottom of the reactor, toward ( gas) inlet port 1532. These vertical lights are shown above the horizontal lights, again, each pair of lights may optionally lie in the same radial plane. The lamp head of each penlight is aligned with the third RA coil 1528 . Outer support 15109 and inner support 15110 support the penlight. Three RA coils 1528, 1529, and 1530 are shown. An optional X-ray source 1527 is shown directing X-rays toward the central axis of the reactor assembly. Disposed within the reactor assembly may be a reflective plate that directs X-rays towards the reactor chamber. Reactor connector 15111 is also shown, along with other non-material connectors and spacers. A (gas) inlet 1532 and a (gas) outlet 1531 are also shown.

Figure 7D is a cross-sectional side view of the reactor assembly with the pencil lamp and X-ray source removed. Gas enters at gas inlet 1541 and exits at gas outlet 1540 . RA coils 1537, 1538, and 1539 are shown. The first (or bottom) frit 1535 and the second (or top) frit 1533 contain a reactor chamber 1534, which can be filled with nanoporous carbon powder. Reactor body 1536 is also shown. Other non-material spacers and connectors are not marked.

7E is a second cross-sectional side view of the reactor assembly with the pencil lamp and X-ray source removed. Gas enters at gas inlet 1551. RA coils 1545, 1546, and 1547 are shown. The first (or bottom) frit 1544 and the second (or top) frit 1542 contain a reactor chamber 1543 which can be filled with nanoporous carbon powder. Reactor body 1548 is also shown. X-ray source 1549 directs X-rays toward the central axis of the reactor assembly, which are then deflected toward the reactor chamber by element 1550 . Other non-material spacers and connectors are left unlabeled.

Figure 7F is a second cross-sectional side view of the reactor assembly with a pencil lamp and an X-ray source. Gas enters at gas inlet 1564. RA coils 1555, 1556, and 1557 are shown. The first (or bottom) frit 1554 and the second (or top) frit 1552 contain a reactor chamber 1553 that can be filled with nanoporous carbon powder. Reactor body 1558 is also shown. Vertical penlights 1560 and 1561 are shown as horizontal penlights 15112 and 1559 . X-ray source 1562 directs the X-rays towards the central axis of the reactor assembly, which are then deflected by element 1563 towards the reactor chamber. Other non-material spacers and connectors are not marked.

Figure 7G is a perspective view of a reactor assembly with a pencil lamp and an X-ray source. Gas enters at gas inlet 1577 and exits at gas outlet 1578 . A first laser 1575 and a second laser 1576 are shown directing radiation toward the reactor chamber along the axis of the reactor assembly. RA coils 1571, 1572, and 1573 are shown. In this embodiment, the pen lights 1565, 1566, 1567, 1568, 1569, and 1570 are all shown arranged horizontally in pairs along a radius toward the central axis of the reactor assembly. The lamp head is near the RA coils 1571 , 1572 and 1573 . X-ray source 1574 directs X-rays towards the central axis of the reactor assembly. Support supports all horizontal penlights. Other non-material spacers and connectors are not marked.

Figure 7H is a perspective view of a reactor assembly with a pencil lamp and an X-ray source. Gas enters at the gas inlet 1591 and exits at the gas outlet 1592 . A first laser 1589 and a second laser 1590 are shown directing radiation toward the reactor chamber along the axis of the reactor assembly. RA coils 1585, 1586, and 1587 are shown. In this embodiment, the penlights 1579, 1580, 1581, 1582, 1583, and 1584 are all shown as pairs vertically disposed in radial planes aligned with the RA coils. The lamp head is adjacent to the RA coils 1585, 1586, and 1587. X-ray source 1588 directs X-rays towards the central axis of the reactor assembly. The outer support 15109 and the inner support 15110 support the penlight. Other non-material spacers and connectors are not marked.

Figure 7I is a perspective view of the reactor assembly showing the 5 RA coils, horizontal pencil light and X-ray source. Gas enters at the gas inlet 15107 and exits at the gas outlet 15108. A first laser 15105 and a second laser 15106 are shown directing radiation toward the reactor chamber along the axis of the reactor assembly. A first laser 15105 and a second laser 15106 are shown directing radiation toward the reaction chamber along the axis of the reactor assembly. RA coils 1599, 15100, 15101, 15102, and 15103 defining cylindrical boundaries are shown. The RA coil is aligned in the radial plane. The lamp head is near the RA coils 1599 and 15103. X-ray source 15104 directs X-rays towards the central axis of the reactor assembly. The outer support 15109 supports the penlight. Other non-material spacers and connectors are not marked.

Ni-1 reactor:

As shown in Figure 8A, the reactor body 1702 is based on high purity nickel (Ni) rods. A Ni rod with an outer diameter of 15.873 mm (OD) was drilled and then processed with an internal thread at one end. The inner diameter allows the installation of upper and lower frits and carbon beds. The carbon reaction medium is housed within the reactor body 1702 . To load the reactor, the reactor body 1702 is positioned on a flat surface with the gas discharge opening 1706 facing downward. A quartz frit 1705 is placed within the reactor body 1702 to form the upper containment vessel. 100 mg of carbon is then loaded into the reactor body 1702. After loading the graphite bed in the reactor body 1702, a second quartz frit 1703 is installed. Then the reactor rod 1701 is screwed onto the reactor main body 1702 by using a high-purity graphite rod processed with an external thread matched with the reactor main body 1702 . The reactor rod 1701 is designed to provide the same compression of the graphite bed as the cup design 1708 provides.

NiPtG reactor:

As shown in Figure 8B, in the NiPtG reactor embodiment, the reactor body 1707 is based on high purity nickel (Ni) rods. A Ni rod with an outer diameter of 15.873 mm (OD) was drilled and then machined to an inner diameter of 11.68 mm (ID) at one end. The inner diameter allows installation of a graphite cup 1708 and optional 0.025 mm platinum (Pt) foil 1713 . Graphite cups 1708 provide isolation of the reactor walls and foil from the carbon bed. The carbon reaction medium is contained in a cup 1708 of 99.9999 wt% pure graphite. To load the reactor, a quartz frit 1709 is placed within a graphite cup 1708 to form a bottom containment vessel. 100 mg of carbon 1710 is then charged into graphite cup 1708. After loading the graphite bed into the cup, a second quartz frit 1711 is installed; this system is defined as the cup assembly. Foil 1713 is used to line the inner surface of the reactor wall prior to installation of the cup assembly. The cup assembly was then placed within the nickel reactor body 1707 and foil 1713. After installing the cup assembly, screw the 99.9999 wt% pure graphite cap 1712 onto the reactor body. The lid prevents the cup from moving after assembly. The figure also illustrates the GG reactor configuration.

PtIrGG reactor:

As shown in Figure 8C, the reactor body 1714 is based on high purity graphite rods. Graphite rods with an outer diameter of 15.873 mm (OD) were drilled and then machined at one end to an inner diameter of 11.68 mm (ID). The inner diameter allows for the installation of a graphite cup 1715 for isolating the reactor wall from the carbon bed. The carbon reaction medium is contained in a cup 1715 of 99.9999 wt% pure graphite. To load the reactor, a quartz frit 1716 is placed within a graphite cup to form a bottom containment vessel. Then put 100 mg of carbon 1717 into the cup. After loading the graphite bed into the cup, a second quartz frit 1718 is installed; this system is defined as the cup assembly. The cup assembly is then placed 1714 within the graphite reactor body. After the cup assembly is installed, a cap 1719 consisting of platinum and 10%wt iridium is screwed onto the reactor body. The lid prevents the cup from moving after assembly.

The residence time of the starting material in the reactor is effective to exemplify the product as the starting material and can be between 0 and 15 minutes.

Referring to Figure 9, the reactor body 905 has an outer diameter and an inner diameter. The inner diameter allows the installation of a graphite cup 901 for isolating the reactor wall from the carbon bed. The carbon reaction medium is contained in the graphite cup 901. To load the reactor, a lower frit 904 is placed within a graphite cup to form a bottom containment vessel. Then fill the carbon 903 into the cup. After loading the graphite bed into the cup, the upper frit 902 is installed; the system is defined as the cup assembly. The cup assembly is then placed 905 within the reactor body. After the cup assembly is installed, the cap 901 is screwed onto the reactor body 905 . The lid prevents the cup from moving after assembly. Gas may be delivered from a (gas) gas inlet 907 via a gas transmitter 906 . Gas exits at (gas) outlet 908, optionally to a manifold for collection. The gas can be excited with a shortwave ultraviolet (SUV) lamp 909 . As previously mentioned, the reactor body and/or cup may be wrapped with electromagnetic (E/M) coils 911.

Preferred reactors for use in the process of the present invention are shown in the table below. Reactor ID cup material cover material Reactor material pole material boundary Room capacity Coil Type CgF N/A N/A copper, nickel or molybdenum, or graphite graphite N/A 100mg induction CuG graphite graphite copper quartz N/A 100mg induction or frequency PtGG graphite platinum/iridium graphite quartz N/A 100mg induction PPG graphite graphite graphite quartz Pt 100mg induction or frequency GPtGPtG graphite graphite graphite quartz 2X Pt 100mg induction GG-EL graphite graphite graphite quartz N/A 100mg- 3g induction or frequency Foil (Pt) graphite graphite graphite quartz platinum 100mg induction or frequency GZ Foil graphite graphite graphite quartz niobium, cobalt, or platinum 100mg induction or frequency nZG Foil graphite Any Z* graphite quartz iridium 100mg induction or frequency NiG graphite graphite nickel quartz N/A 100mg induction or frequency NiPtG graphite graphite nickel quartz Pt 100mg induction ZG N/A Palladium/ruthenium or any Z graphite quartz N/A 100mg induction Ref-X graphite graphite graphite quartz N/A 1-20g frequency *Any Z means any material

The invention also relates to methods of instantiating materials in nanoporous carbon powders. It has surprisingly been found that light elements such as hydrogen, oxygen, helium etc. are exemplified. Exemplary is defined herein to include the nucleation and assembly of atoms within carbon structures, particularly ultramicropores. Without being bound by theory, it is believed that instantiation is inter alia related to the degrees of freedom of electromagnetic fields as expressed by quantum field theory. By exposing the gas to harmonic resonances or harmonics of electromagnetic radiation within one or more ultramicropores, vacuum energy densities are obtained and allow nucleation and assembly of atoms. The formation and maintenance of such harmonics is enhanced by electromagnetic energy in the frequency range of the frequency generator's light, x-ray and magnetic fields. Harmonics can also be enhanced by modifying system boundaries through choice of reactor material and adding foil layers.

In particular, the present invention includes a process for producing or exemplifying a nanoporous carbon composition, comprising the following steps: Nanoporous carbon powder is added to the reactor assembly as described herein; adding feed gas to the reactor assembly; powering one or more RA coils to a first electromagnetic energy level; heating nanoporous carbon powder; The nanoporous carbon powder is harmonically patterned between the first electromagnetic energy level and the second electromagnetic energy level for a time sufficient to instantiate and optionally collect material in the nanopores.

The present invention includes a process for producing a product gas comprising the steps of: (a) Adding Feed Gas to an Electromagnetic Embedding Apparatus: (b) exposing the feed gas to at least one E/MEE light source; (c) directing the feed gas from step (b) to the reactor assembly comprising: a gas inlet and one or more gas outlets; a reactor chamber containing nanoporous carbon placed within a cup and optionally covered with a lid; a first porous frit defining a floor of the reactor chamber disposed within the cup, a second porous frit defining the top of the reactor chamber; wherein each porous frit has a porosity sufficient to allow gas to permeate into the reactor chamber; a reactor headspace disposed above the reactor chamber; at least one RA coil surrounding the reactor chamber and/or reactor headspace and operatively connected to a power supply, wherein a computer processing unit is configured to control the power supply of the RA coil; (d) Subjecting nanoporous carbon powders to harmonic patterning to exemplify the material; (f) collecting product gas containing the material; and (g) isolating the material from the product gas.

The term "harmonic patterning" is defined herein as multiple oscillations between two or more energy levels (or states). Energy states can be characterized as a first (or higher) energy level and a second (or lower) energy level. The rates of initiating the first energy level, attaining the second energy level, and re-establishing the first energy level may be the same or different. Each rate may be defined in terms of time, eg, over 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, or more seconds. Each energy level can be maintained for a period of time, such as 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, or more seconds. Harmonic patterning continues until instantiation is achieved.

In the presence of two other sources of electromagnetic radiation (e.g., coils, X-ray sources, lasers, and/or lamps), each can be harmonically patterned, and patterning can occur independently, simultaneously, or sequentially .

The process also includes independently powering any additional sources of electromagnetic radiation, as described above in the E/MEE apparatus or reactor assembly. For example, the process further includes the step of powering a RA frequency generator connected to one or more RA coils, one or more lamps or lasers, an X-ray source, an induction coil, an E/MEE coil, and substantially as above stated.

In particular, the present invention relates to the identification and collection of product gases produced by these processes. Product gas can be collected from the process in a continuous, semi-continuous or batch manner. The product gas typically comprises a feed gas (or a first gas composition, as described above) and a second gas composition, eg, comprising hydrogen. The second gas composition is different from the first gas composition and preferably comprises one or more gases not present in the feed gas. For example, when the feed gas is pure nitrogen (e.g., a gas comprising at least 99% vol nitrogen, such as at least 99.9% vol nitrogen), such as nitrogen with less than 1% hydrogen, the product gas will contain one or more other materials (e.g., , an element or molecule that exists as a gas under ambient conditions), preferably hydrogen. The feed gas may also include air. Product gases may include gases such as hydrogen, helium, water, neon, nitrogen, carbon monoxide, oxygen, argon, carbon dioxide, fluorocarbons, ammonia, krypton, xenon, methane and other hydrocarbons or organics and their mixture. "Product gas" is defined herein as being compositionally distinct from the term "feed gas" and expressly excluding air.

Preferred product gases include hydrogen and/or oxygen. Typically, the concentration of hydrogen and/or oxygen in the product gas will exceed the concentration of hydrogen and/or oxygen, respectively, in the feed gas. For example, the product gas may contain at least about 1% vol (preferably at least about 4% vol) hydrogen. In another example, the product gas can contain at least about 20% vol (preferably at least about 40% vol) oxygen. In yet another example, the product gas contains at least 1% vol (preferably at least about 3% vol) water. Preferably, the product gas will further include neon, helium, argon, and combinations thereof. Typically, the product gas will further comprise components present in the feed gas (eg nitrogen and hydrogen or air), however, in different concentrations therefrom. Preferred product gases include nitrogen, hydrogen, and gases selected from the group consisting of neon, helium, argon, and combinations thereof. Preferred product gases include nitrogen, hydrogen, oxygen, and gases selected from the group consisting of neon, helium, argon, and combinations thereof. Preferred product gases include at least 1% by volume of helium, argon, neon, and combinations.

The invention allows the production of green gases, eg product gases with less than 0.5% vol CO ₂ , eg less than 100 ppm CO ₂ .

Hydrogen can be separated or purified from the product gas to produce a high concentration of hydrogen. An example of a purification system using a hydrogen-selective membrane. Examples of suitable materials for the membrane include palladium and palladium alloys, especially thin films of such metals and metal alloys. Palladium alloys are particularly effective, especially palladium containing 35 wt% to 45 wt% copper. Another effective alloy is palladium with 2 wt% to 10 wt% gold, eg palladium with 5 wt% gold. The hydrogen selective membrane can be configured as a foil. Alternatively or additionally, a pressure swing adsorption system may be used to concentrate hydrogen and remove unwanted gases. This process uses activated carbon, silica, or zeolites.

Example 1: Energy/comb activation (E/LC)

One hundred milligrams (100 mg) of carbon powder was placed in a GG-EL graphite tube reactor (15.875 mm outer diameter, inner diameter machined to about 9 mm). Insert this reactor into the reactor assembly of Figure 2A, then place in a high vacuum oven to degas according to the degassing procedure (see Setup 1 or Setup 2). After degassing, the reactor components were transferred to the test unit for processing. Research grade nitrogen (N ₂ ) is delivered at 2 SLPM to purge the system for at least 25 seconds or longer. As mentioned above, gas passes through the E/MEE in horizontal and horizontal gas lines. During purge, the gas sampling line is also purged. TEDLAR ^® Sealed Bags, when used, are connected to the sampling line during the decontamination cycle.

In Figure 1, an argon "KC" lamp 108 at position 0 (perpendicular to the lamp direction; 7.62 cm from the gas inlet or inlet flange; at 180°; bulb tip pointing 2.54 cm from the outside diameter of the gas line) at the beginning at the same time turn on the power supply device to 5 amps. The light remains on for a hold time of at least 9 seconds. Next lamp 109 in position 1 (109; horizontal lamp orientation; 7.62 cm from air inlet or inlet flange; at 180°; bulb head end facing outlet plate; bulb glass base at optical inlet; outside gas line 5.08cm in diameter), which is a krypton lamp, and the power of the power supply device increases to 10 amperes after it is turned on. Hold it for 3 seconds, lamp 107, in position 1 (107; horizontal lamp orientation; at 0°; bulb tip at optical exit facing exit plate; 5.04 cm from gas line OD), which is a xenon lamp, Turn on and hold for 9 seconds and increase power to 15 amps. After turning on these 3 lamps in sequence, open the sealed ^TEDLAR® airtight bag for gas collection, adjust the amperage delivered to the reactor to 100 amps and hold for at least 30 seconds. Turn on lamp 103 as neon at position 1 immediately after power increase (103; vertical lamp orientation; 7.62 cm from air inlet or inlet flange; at 0°; bulb tip pointing 2.54 cm from gas line OD).

Amperometric harmonic patterning is then initiated on the reactor. For each amperometric mode (oscillation), the gas fed into the reactor can be processed by the same or different light sequences. In one example of the experimental protocol, the reactor amperage was increased within 1 second to 78.5 amps, the high-end harmonic mode point. The reactor amperage was then dropped to 38.5 amps for 9 seconds and held at 38.5 amps for 3 seconds. At the beginning of the 3-second hold, turn on the argon lamp 122 at position 1 (122; horizontal lamp orientation; at 180°; bulb tip pointing toward the entrance plate at the optical entrance; 5.04 cm from the outer diameter of the gas line). After a 3 second hold, the reactor amperage ramped up to 78.5 amps in 9 seconds, reached 78.5 amps, held for 3 seconds, and then began to drop. The reactor amperage was dropped to 38.5 amps for 9 seconds and held there for 3 seconds. At the beginning of the 3 second hold, the lamp 103 which is a neon lamp at position 1 is turned on immediately. The reactor amperage was raised again to 78.5 amps within 9 seconds, held for 3 seconds, and then dropped again to 38.5 amps within 9 seconds. Turn on the long-wave UV lamp at position 1 (104; horizontal lamp orientation; at 90°; bulb head end facing the entrance plate at the light entrance; 5.04 cm from the outer diameter of the gas line).

The reactor ramped up again to 78.5 amps for 9 seconds, held for 3 seconds, then dropped to 38.5 amps for another 9 seconds. Next turn on the E/MEE (Position 1) SWUV lamp in the E/MEE section (105; horizontal lamp orientation; 7.62 cm from the air inlet or inlet flange; at 270°; bulb tip at the optical inlet and facing the inlet plate; 5.04 cm from gas line OD) E/MEE (position 1) and hold for 3 seconds. The reactor was ramped up again to 78.5 amps in 9 seconds and held for 3 seconds. After holding for 3 seconds, the reactor current dropped to 38.5 amps for an additional 9 seconds. The reactor was then held at 38.5 amps for 3 seconds before another ramp up to 78.5 amps was initiated over 9 seconds. At 3 seconds into the ramp, light 107 at position 1 is turned on and held for the remaining 6 seconds of the 9 second total ramp. The reactor was maintained at this condition for 3 seconds.

Lamps 103, 108, 106, 105, and 104 in the E/MEE section were simultaneously turned off, and the reactor was de-energized. The reactor was held in this state with continuous gas flow for 27 seconds, during which time the ^TEDLAR® bag was closed and removed. All remaining lights were turned off and air flow continued for 240 seconds.

Example 2: Degassing setting 1

As above, 100 milligrams (100 mg) of carbon powder was placed in a graphite tube reactor (15.875 mm outer diameter, machined to about 9 mm inner diameter) and loaded into a closed-end system. After completing the ten closed-end setups, fit each individual unit into the degassing furnace opening and connect all incoming and outgoing lines to the closed-end system. Isolate each incoming line to each reactor while leaving the outgoing line in the open position. Start the vacuum system until the vacuum gauge reads at least 750 mmHg. After reaching 750 mmHg, close all outlet valves of the closed-end system and secure the vacuum pump. The system was leak tested for 30 minutes. After successfully passing the leak check, open each incoming line to the closed-end system one by one with 0.4 slpm _N2 . Once all input lines are open and the vacuum gauge reaches a slight positive pressure, open the output gas line on the degasser furnace. While maintaining the _N2 flow, start ramping the degassing furnace profile from T _amb to 400 ^° C over 1 hour. After 1 hour of linear change, maintain flow while maintaining airflow for an additional hour to stabilize temperature. After temperature stabilization is complete, secure all incoming airflow and isolate the degasser exhaust line. Immediately start the vacuum pump and start the degassing procedure. Maintain temperature and vacuum for 12 hours. After 12 hours, allow the furnace to cool before removing the dead-end unit.

Example 3: Degas Setting 2

As above, 100 milligrams (100 mg) of carbon powder was placed in a graphite tube reactor (15.875 mm outer diameter, machined to about 9 mm inner diameter) and loaded into a closed-end system. After completing the ten closed-end setups, fit each individual unit into the degassing furnace opening and connect all incoming and outgoing lines to the closed-end system. Isolate each incoming line to each reactor while leaving the outgoing line in the open position. Start the vacuum system until the vacuum gauge reads at least 750 mmHg. After reaching 750 mmHg, close all outgoing valves of the closed-end system and secure the vacuum pump. The system was leak tested for 30 minutes. After successfully passing the leak check, open each incoming line to the closed-end system one at a time at 0.4 SLPM N ₂ . Once all inlet lines are open and the vacuum gauge reaches a slight positive pressure, open the gas outlet line on the degasser. Start the degassing furnace profile from 200 ^° C ± 50 ^° C to 400 ^° C within 1 h while maintaining the _N flow. After 1 hour of linear change, maintain flow while maintaining airflow for an additional 1 hour to stabilize temperature. After temperature stabilization is complete, secure all incoming airflow and isolate the degasser exhaust line. Immediately start the vacuum pump and start the degassing procedure. Maintain temperature and vacuum for 12 hours. After 12 hours, allow the furnace to cool before removing the dead-end unit.

Example 4: Gas Analysis

For the chemical analysis of gas samples in TEDLAR ^® bags, a test procedure was developed based on established standard test methods for internal gas analysis of sealed devices. Prior to sample measurement, the system background is determined by following an exact measurement procedure for the sample gas. For system background and samples, a fixed volume of gas was introduced into a Pfeiffer QMA 200M quadrupole mass spectrometer (QMS) system via a capillary. A fixed volume of gas was introduced into a Pfeiffer QMA 200M quadrupole mass spectrometer (QMS) system via a capillary. After the sample gas is introduced, the ion current is measured at a specific mass (the same mass as the background analysis of the system). During background and sample gas analysis, the total pressure of the QMS system was also recorded, allowing correction of the measured ion currents.

Table 1: Gases analyzed for the tests and measured masses used in deconvolution. gas the quality to use for deconvolution 1. Hydrogen 2, 18, 55, 57 2. Helium (3) 2,4 3. Helium (4) 4 4. Methane 14,15 5. water 18,32,40 6. Neon (20) 18,20,40 7. Neon (22) 20 8. Nitrogen 14 9. Carbon monoxide 14, 28 10. Oxygen 32 11. Argon 40,41,43 12. Carbon dioxide 44 13. Total hydrocarbons and organic matter 55, 57 14. Fluorocarbons 69 15. Ammonia 17,18 16. Krypton 84 17. Xenon 132

data analysis:

The ion current measurements for each mass were corrected as the mean of the measured background contribution corrected for the pressure difference. After background correction, the individual corrected mass signals were averaged and corrected to known gas standards to determine the volume percent of 17 gas species. Using standard test method-based development procedures, in accordance with Military Standard (MIL-STD-883) Test Method 1018, Microcircuits, using analytical nitrogen and nitrogen-hydrogen mixed reference gases to determine all corrections to match the selected process gas for the test sample, Revision L, FSC/Area: 5962 (DLA, 16 September 2019). The results are as follows: 1% = 10,000 ppm, the volume values of blank gas and sample were generated using the developed gas analysis test method and verified using a gas mixture standard of 99.98% nitrogen and 0.02% hydrogen. All analyzes were performed by EAG Laboratories in Liverpool, NY using standard ^TEDLAR® bag gas sampling procedures and specific mass spectrometry methods.

Mass Analyzer: Quadrupole Mass Spectrometer (Pfeiffer QMA 200M)

Measurement mode: Analog scan at selected quality

Number of channels used: 64

Mass Resolution: Unit Resolution

Maximum detectable concentration: 100%

Minimum detectable concentration: 1 ppb

Background vacuum: <2 x 10 ^-6 Torr

result:

Procedure 1: Analyzed gas (Vol %) Ill. 1 Ill. 2 Ill. 3 Ill. 4 Ill. 5 hydrogen 0.7678 0.2405 0 0 0.0162 Helium (4) 0.1923 0.2963 0.1928 0.5476 0.1254 Methane (CH ₄ ) 0 0 0 0 0 water ( _H2O ) 0.4054 1.0773 0 0 0 Neon (20) 0.036 0.03 0.0417 0.1789 0.0345 Neon (22) 0.0036 0.003 0.0042 0.0179 0.0035 Nitrogen 95.276 89.3705 99.347 88.2306 99.6251 carbon monoxide (CO) 0 0 0 0 0 oxygen 3.1604 8.5606 0.3796 10.945 0.1826 Argon 0.0676 0.349 0.0003 0.08 0 carbon dioxide (CO ₂ ) 0.0138 0 0 0 0 Total Hydrocarbons and Organic Matter 0.0269 0 0.0175 0 0 Fluorocarbon 0.0261 0.0417 0.0162 0 0.0127 Ammonia (NH ₃ ) 0 0.031 0 0 0 ammonia 0.0242 0 0 0 0 xenon 0 0 0 0 0

Procedure 1 (continued) Analyzed gas (Vol %) Ill. 6 Ill 7 Ill. 8 Ill. 9 hydrogen 1.027 0 0 4.0494 Helium (4) 0.364 2.6033 0.2145 25.118 Methane (CH ₄ ) 0 0 0 0 water ( _H2O ) 0 0 0 0 Neon (20) 0.1093 0.4736 0.0308 5.6369 Neon (22) 0.0109 0.0474 0.0031 0.5637 Nitrogen 97.1911 94.6204 95.9834 56.538 carbon monoxide (CO) 0 0 0 0 oxygen 1.2975 2.2553 3.7604 4.1726 Argon 0 0 0.0078 0 carbon dioxide (CO ₂ ) 0 0 0 0 Total Hydrocarbons and Organic Matter 0 0 0 1.0654 Fluorocarbon 0 0 0 1.9565 Ammonia (NH ₃ ) 0 0 0 0 krypton 0 0 0 0.8997 xenon 0 0 0 0

Procedure 2: Analyzed gas (Vol %) Ill. 10 Ill. 11 Ill. 12 Ill. 13 Ill. 14 Ill. 15 hydrogen 0 1.0428 1.3437 0 1.6249 1.7941 Helium (4) 0.4679 0.3492 0.4409 0.8074 0.4888 0.6406 Methane (CH ₄ ) 0 0 0 0 0 0 water ( _H2O ) 0 2.3924 3.1436 0 4.4032 2.4182 Neon (20) 0.1598 0 0 0 0 0 Neon (22) 0.016 0 0 0 0 0 Nitrogen 76.7986 79.9798 94.2126 51.1046 92.2167 75.6209 carbon monoxide (CO) 0 0 0 0 0 0 oxygen 22.079 15.565 0.8348 48.088 1.239 18.7733 Argon 0.4639 0.5717 0 0 0 0.721 carbon dioxide (CO ₂ ) 0 0.0991 0.0244 0 0.0274 0.0319 Total Hydrocarbons and Organic Matter 0 0 0 0 0 0 Fluorocarbon 0.0147 0 0 0 0 0 Ammonia (NH ₃ ) 0 0 0 0 0 0 krypton 0 0 0 0 0 0 xenon 0 0 0 0 0 0

Standard (nitrogen): Analyzed gas Volume % Standard 99.98 vol% N ₂ / 200 ppm H ₂ hydrogen 0.0223 Helium (3) 0.0000 Helium (4) 0.0000 Methane (CH ₄ ) 0.0000 water ( _H2O ) 0.0000 Neon (20) 0.0000 Neon (22) 0.0000 Nitrogen 99.9777 carbon monoxide (CO) 0.0000 oxygen 0.0000 Argon 0.0000 carbon dioxide (CO ₂ ) 0.0000 Total Hydrocarbons and Organic Matter 0.0000 Fluorocarbon 0.0000 Ammonia (NH ₃ ) 0.0000 krypton 0.0000 xenon 0.0000

Example 5: Energy/comb activation (E/LC)

One hundred milligrams (100 mg) of carbon powder was put into a GG-EL graphite tube reactor (15.875 mm outer diameter, inner diameter machined to about 9 mm). In one iteration, the placement of the powdered carbon was performed in the presence of a visible emission spectrum that includes ultraviolet light. Insert this reactor into the reactor assembly of Figure 2A, then place in a high vacuum oven to degas according to the degassing procedure (see Procedure 1 or Procedure 2). After degassing, the reactor components were transferred to the test unit for processing. Research grade nitrogen ( _N2 ) is delivered at 2 SLPM to purge the system for at least 25 seconds or longer. As mentioned above, gas passes through the E/MEE in horizontal and horizontal gas lines. One iteration of the run could include the use of SUV lights on the intake line. As shown in Figure 9, when in use and prior to start of operation, turn on the horizontal SUV light 909 on the intake line and allow to heat up for 5 minutes for E/M stabilization. The light stays on throughout the operation. During purge, the gas sampling line is also purged. Tedlar ^® airtight bags, when used, are attached to the sampling line during the decontamination cycle.

Referring to Figure 1, the argon "KC" lamp 108 at position 0 (perpendicular to the lamp direction; 7.62 cm from the inlet or inlet flange; at 180°; bulb tip pointing 2.54 cm from the outside diameter of the gas line) was initially turned on, Simultaneously energize the power supply to 5 amps. The light remains on for a hold time of at least 9 seconds. Next lamp 109 in position 1 (109; horizontal lamp orientation; 7.62 cm from air inlet or inlet flange; at 180°; bulb head end facing outlet plate; bulb glass base at optical inlet; outside gas line 5.08 cm in diameter), which is a krypton lamp, was turned on and the power of the power supply was increased to 10 amps. Hold it for 3 seconds, turn on lamp 107 which is a xenon lamp in position 1 (107; horizontal lamp orientation; at 0°; bulb tip at optical exit facing exit plate; 5.04 cm from gas line OD) and hold 9 seconds and increase the power to 15 amps. After turning on these 3 lamps in turn, open the sealed Tedlar ^® bag for gas collection, adjust the current delivered to the reactor to 100 amps and maintain it for at least 30 seconds. Turn on lamp 103 which is neon in position 1 immediately after power increase (103; vertical lamp direction; 7.62 cm from air inlet or inlet flange; at 0°; bulb tip pointing 2.54 cm from gas line outer diameter).

Amperometric harmonic patterning is then initiated on the reactor. For each amperometric mode (oscillation), the gas fed into the reactor can be processed by the same or different light sequences. In one embodiment of the experimental procedure, the reactor amperage was increased within 1 second to 78.5 amps, the high-end harmonic mode point. The reactor amperage was then dropped to 38.5 amps for 9 seconds and held at 38.5 amps for 3 seconds. At the beginning of the 3-second hold, turn on the argon lamp 122 at position 1 (122; horizontal lamp orientation; at 180°; bulb tip pointing toward the entrance plate at the optical entrance; 5.04 cm from the outer diameter of the gas line). After a 3 second hold, the reactor amperage ramped up to 78.5 amps for 9 seconds, held at 78.5 amps for 3 seconds, and then began to drop. Reactor amperage drops to 38.5 amps for 9 seconds and then holds for 3 seconds. At the beginning of the 3 second hold, the neon lamp 103 in position 1 is turned on. Reactor amperage ramps up again to 78.5 amps in 9 seconds and holds for 3 seconds, if two gas samples are collected in one cycle at which point the first ^Tedlar® bag is closed and the second bag is opened to collect the gas then Power drops again to 38.5 amps in 9 seconds. Turn on the long-wave UV lamp in position 1 (104; horizontal lamp orientation; at 90°; the end of the bulb tip facing the entrance plate at the light entrance; 5.04 cm from the outer diameter of the gas line).

The reactor ramped up again to 78.5 amps for 9 seconds, held for 3 seconds, then dropped to 38.5 amps for another 9 seconds. Next turn on the E/MEE (Position 1) SWUV lamp in the E/MEE section (105; horizontal lamp orientation; 7.62 cm from the air inlet or inlet flange; at 270°; bulb tip at the optical inlet and facing the inlet plate; 5.04 cm from gas line OD) and hold for 3 seconds. The reactor was ramped up again to 78.5 amps in 9 seconds and held for 3 seconds. After holding for 3 seconds, the reactor current dropped to 38.5 amps for an additional 9 seconds. The reactor was then held at 38.5 amps for 3 seconds before initiating another linear ramp up to 78.5 amps in 9 seconds. On entering the 3 second ramp, light 107 at position 1 (107) is turned on and held for the remaining 6 seconds of the 9 second ramp. The reactor was maintained at this condition for 3 seconds.

Lamps 103, 108, 106, 105, and 104 in the E/MEE section were turned off simultaneously, and the Tedlar bag was turned off before the reactor was powered down. The reactor was powered off. The reactor was held in this state with continuous gas flow for 27 seconds. All remaining lights were turned off and air flow continued for 240 seconds.

The purpose of hydrogen analysis here is to collect gas samples and analyze the content of target substances, especially hydrogen (H ₂ ), under various experimental conditions. Eight experimental conditions were selected and sampled with the goals of: 1) increasing/changing hydrogen production, 2) providing differential gas sampling to identify changes in hydrogen production over the time of the experiment, and 3) reducing carrier gas flow to reveal a greater proportion of Hydrogen production. Experimental conditions included changes to the GSA or LA M/M operating plan basis, cold or hot degassing furnace activation, and use of short-wave ultraviolet (SUV) lamps. For each experimental condition, ten MSP-20X Lot 2006 carbon samples (100 mg each) were run. Collect one to two gas samples into ^Tedlar® bags (3 or 12 L) during each run. Twenty-eight experimental gas samples and two standard gas samples were pumped into stainless steel (SS) tanks for independent analysis using a Gas Chromatography Discharge Ionization Detector (GC-DID) process at Airborne Labs (Somerset, NJ).

All gas samples were collected using ^Tedlar® bags (3 L or 12 L). All Tedlar ^® bags were filled with carrier gas ( _N2 or Ar/Kr) and evacuated 3 times by vacuum approximately 24-72 hours before sample collection. After emptying each bag for the last time, seal it until you are ready to collect the gas. This process prepares the sampling container by removing any residual gas from the manufacturing process inside the Tedlar ^® bag.

During the experimental run, the sampling line was purged for at least 25 s. During this time, attach the sealed and prepared ^Tedlar® bag to the sampling line. Each bag opens after a 25-second decontamination period and remains open for the specified collection length, depending on the run schedule. In an experimental run where two gas samples were collected, a second sample line was used. The valve on the first bag is closed and the valve on the second bag is opened to start collection.

Selected samples were purged and pumped into 500 cubic centimeters (cc) SS tanks provided by Airborne Labs using a small micro-diaphragm pump. These cylinders are filled with helium at 2-5 psig. This was a mistake by Airborne Labs, as the cylinders needed to be vacuumed.

During collection, gas is pumped from the Tedlar ^® bag into the SS tank. Attach a pressure gauge to measure the maximum pressure of tank and tube containers. Allow approximately 1 L of gas to flow through the SS tank to purge the vessel before the valve is closed to pressurize the system. Purge the system with sample gas to reduce the possibility of contamination.

Gas chromatography (GC) uses two states of matter to separate compounds: a stationary phase (usually a solid) and a gaseous mobile phase. When an unknown mixture is introduced into a system, the components in the mixture have different affinities for the two phases and therefore pass through the system at different rates. Components with high affinity for the mobile phase move faster through the chromatographic system relative to other substances, while components with high affinity for the solid phase move slower.

The stationary phase used in this application is a molecular sieve. Molecular sieves consist of crystalline materials with a large internal volume, which allows gas molecules to be "absorbed" into the internal structure of the material. Smaller molecules move in and out of this internal structure relatively quickly, larger molecules more slowly. This difference in mobility allows smaller molecules to pass through the column faster than larger molecules and separate in a reproducible manner, separating one from the other.

Thermal conductivity detectors (TCD) generate differential heat conduction based on an electrical signal across a heated filament. Electronics maintain a constant current through the filament. A change in gas composition causes a change in electrical current, which increases or decreases to maintain a constant temperature. This current difference can be measured in a chromatogram and represented as a curve or a peak. The measured area under the peak is calculated and expressed as an operator-selected quantity.

Discharge ionization detectors (DID) use an electric current to ionize a gas species (such as helium) and produce characteristic photons. Photons illuminate the incoming gas species from the sample. Using a gas chromatography column, the different gas species are separated before reaching the ion chamber. Electrons generated by the interaction of photons and ionizable gas molecules are attracted to collectors and detectors. A detector then measures the change in current during analysis of the sample.

Gas samples were analyzed by Airborne Labs, Inc. (Somerset, NJ) using the Universal Test for noncombustible gases (NCG). The NCG procedure involves GC-DID for <5000 ppm components in the mixture and GC-TCD for ≥5000 ppm components in the mixture using a helium carrier gas. Airborne Labs results are ISO/IEC 17025:2017 certified.

Ten 100 milligram (mg) carbon samples were processed under eight different experimental conditions using different run schedules, use of SUVs, and carrier gas types and flows. Out of a total of 80 carbon samples, a total of 120 gas samples were collected for analysis using ^Tedlar® bags (3 L or 12 L).

A total of 30 gas samples were collected during the three GSA runs. Gas collection began after a 25 second purge of the gas line. Collection duration alternated between 35 s of gas trapped during EM field changes and 4 min of gas trapped throughout the vacuum. Under the first three condition types, only one sample per carbon sample was collected. Four GSA samples were submitted to Airborne Labs for further NCG testing.

A total of 50 gas samples were collected during the three LA M/M run programs using nitrogen as the carrier gas. A total of 40 gas samples were collected during two planned LA M/M runs using a mixture of argon and krypton as the carrier gas. Gas collection began after a 25 second purge of the gas line. If one sample is collected, the duration is 173 seconds. If two samples are collected, the first is 85 seconds and the second is 88 seconds.

Of the 116 viable experimental gas samples, 28 were submitted to Airborne Labs for further quantitative analysis of hydrogen, oxygen, nitrogen, argon, and krypton using the non-combustible gas composite test. Of the 28 produced gas samples sent to Airborne Labs for NCG testing, 12 produced significant hydrogen concentrations ranging from 7.7-27 ppm for nitrogen samples (Table 4) and 1-10 ppm for argon samples (Table 4). 5). These results differ from reported atmospheric hydrogen concentrations of approximately 0.6 ppm. Of the 20 samples analyzed, nine had hydrogen concentrations that exceeded the 2 ppm impurity limit reported on the nitrogen certificate of analysis. Of the 20 _N2 gas samples, 15 had an argon content of ≤100 ppm, which is within the allowable concentration range for research-grade nitrogen. In argon/krypton mixtures, no hydrogen concentration is reported as an impurity in the certificates of analysis for these two gases.

Out of a total of 20 _N2 sample SS cylinders, the two tested were rejected. The argon to oxygen ratio in the results is used to detect possible atmospheric contamination in the nitrogen samples. Samples with argon and oxygen concentrations of 0.934 ± 0.002 %vol Ar: 20.95 ± 0.32 %vol _O2 were rejected. These bounds were established using observed variations in oxygen and argon concentration analysis across groups of atmospheric samples. Reject samples with argon concentrations > 100 ppm and oxygen concentrations > 1 %vol. The rejected billets also had open valves on the SS tanks when shipped from Airborne Labs. Neither the sample nor the gas blank reported a hydrogen concentration > 2 ppm.

The reported data show some reproducibility in the hydrogen detection of LA M/M after short-wave UV treatment in nitrogen. The highest reported hydrogen concentration of 27 ppm corresponds to a reported oxygen concentration of 24% vol, more than 3% higher than atmospheric oxygen, while argon concentration of 4700 ppm is almost half the atmospheric concentration. The results for this sample highlight that the atmosphere is an unlikely source of the reported gas species. For two sets of samples from the same run (i.e. GH8030A/B, GH8050A/B), the hydrogen and oxygen concentrations in the last 88 seconds were significantly higher than in the first 85 seconds.

For experiments performed with argon/krypton mixtures, an increase in hydrogen concentration (≥ 1 ppm) was only observed at 1/2 flow conditions. Hydrogen was detected in 3 out of 4 total runs analyzed by Airborne Labs. Of note, the maximum concentration was measured within the first 83 s of run collection, contrary to what was seen in the nitrogen run.

Follow-up conversations with Airborne Labs indicated that helium was present in significant, sometimes high, quantities. After a secondary review of all results, they ensured that all data reported by DID and TCD met the pass criteria for QA/QC.

Table: Experimental sample results from a nitrogen run with hydrogen detection reported by GC-DID (Airborne Labs, Inc.). From the NCG test of 20 samples, 9 samples produced significant concentrations of hydrogen (>2 ppm). A nitrogen blank and one sample were rejected due to argon:oxygen ratio, total concentration, and known blank sample tank valve integrity issues. sample Experimental procedure Hydrogen ppm ppm Argon: Oxygen GH8008 GSA, N ₂ , HOT, SUV 0.7 4/89 (1/22.25) GH8014 GSA, N ₂ , HOT, SUV 0.9 <0 GH8021 GSA, N ₂ , HOT, No SUV 0.3 <0 GH8023 GSA, N ₂ , HOT, No SUV 1.2 3/77 GH8030A LA M/M, N ₂ , cold, SUV <0.2 <0 GH8030B LA M/M, N ₂ , cold, SUV 27 1/52 GH8031A LA M/M, N ₂ , cold, SUV 14 <0 GH8031B LA M/M, N ₂ , HOT, SUV 11 <0 GH8038 LA M/M, N ₂ , HOT, SUV 1.2 <0 GH8039 LA M/M, N ₂ , HOT, SUV 9.7 <0 GH8040 LA M/M, N ₂ , HOT, SUV 10 <0 GH8041 LA M/M, N ₂ , HOT, SUV 7.7 <0 GH8042 LA M/M, N ₂ , HOT, SUV 11 <0 GH8044 LA M/M, N ₂ , HOT, SUV 9.2 <0 GH8048A LA M/M, N ₂ , HOT, No SUV 0.6 <0 GH8048B LA M/M, N ₂ , HOT, No SUV 0.5 2/55 GH8049A LA M/M, N ₂ , HOT, No SUV 0.6 0 GH8049B LA M/M, N ₂ , HOT, No SUV <0.2 <0 GH8050A LA M/M, N ₂ , HOT, No SUV 0.5 <0 GH8050B LA M/M, N ₂ , HOT, No SUV 9.8 <0 GH071522BLK1 N ₂ blank <0.2 1/6

Table 2: Experimental sample results from argon/krypton run and hydrogen detection reported by GC-DID (Airborne Labs, Inc.). From the NCG test of 8 samples, 3 samples produced significant concentrations of hydrogen (≥ 1 ppm). sample Experimental procedure hydrogen ppm Krypton ppm GH8058A LA M/M, Ar/Kr, Heat, SUV <0.2 23000 GH8058B LA M/M, Ar/Kr, Heat, SUV <0.2 18000 GH8059A LA M/M, Ar/Kr, Heat, SUV <0.2 21000 GH8059B LA M/M, Ar/Kr, Heat, SUV <0.2 25000 GH8068A LA M/M, Ar/Kr, Hot, SUV, ½ Flow <0.2 22000 GH8068B LA M/M, Ar/Kr, Heat, SUV, ½ Flow 1 26000 GH8069A LA M/M, Ar/Kr, Heat, SUV, ½ Flow 10 23000 GH8069B LA M/M, Ar/Kr, Heat, SUV, ½ Flow 1 25000 GH071522BLK2 Ar/Kr Blank <0.2 27000

The table below provides more results:

The patent and scientific literature mentioned herein establishes the knowledge available to those skilled in the art. All US patents and published or unpublished US patent applications cited herein are hereby incorporated by reference. All published foreign patents and patent applications cited herein are hereby incorporated by reference. All other published references, documents, manuscripts, and scientific literature cited herein are hereby incorporated by reference.

While the invention has been particularly shown and described with reference to preferred embodiments thereof, it will be understood by those skilled in the art that changes may be made in form and detail thereof without departing from the scope of the invention which is covered by the appended claims. Various changes are made. Numerical values presented in the specification and claims are to be understood as approximations (eg, approximately or approximately) as would be determined by one of ordinary skill in the art in the context of that value. For example, a stated value may be understood as being within 10% of the stated value, unless otherwise understood by one of ordinary skill in the art, eg, must be an integer value.

101, 201, 401, 1520, 1532, 1541, 1551, 1564, 1577, 1591, 15107, 907: air inlet 102, 410: pipeline 103, 104, 105, 106, 107, 108, 109, 122, 909: lights 110, 209, 409, 1519, 1531, 1540, 1578, 1592, 15108, 908: air outlet 111, 411: Substrate 112, 412: support 113, 413: Pivot 120: Coil 202, 1536, 1548, 1558, 1702, 1707, 1714, 905: Reactor body 203: glass frit 204: charging material 205: cover 206: Cup 207: Containment vessel/closed end pipe 208: conductive coil 210: Power supply flange 211, 424, 429, 1507, 1515, 1527, 1549, 1562, 1574, 1588, 15104: X-ray source 212, 426, 427: laser 213: target holder 221: gas source 222:E/MEE 402, 403, 404, 405, 406, 408, 1501, 1502, 1503, 1504, 1505, 1506, 1509, 1510, 1511, 1512, 1513, 1514, 1521, 1522, 1523, 1524, 1525, 1526, 1560, 1561, 1565, 1566, 1567, 1568, 1569, 1570, 1579, 1580, 1581, 1582, 1583, 1584, 1593, 1594, 1595, 1596, 1597, 1598: pen lights 407: Coil 412: support 415: shell 426, 427: light source 428: Optical filter 902: upper glass frit 904: Lower glass frit 906: gas transmitter 911: Coil 1508, 1534, 1543, 1553: Reactor chamber 1516, 1517, 1518, 1528, 1529, 1530, 1537, 1538, 1539, 1545, 1546, 1574, 1555, 1556, 1557, 1571, 1572, 1573, 1585, 1586, 1587, 1599, 15100, 15101 , 15102, 15103:RA Coil 1533, 1544, 1554: Second (top) frit 1535, 1542, 1553: first (bottom) frit 1536: Reactor body 1550, 1563: components 15112, 1559: horizontal pen light 1560, 1561: vertical pen lights 1575, 1589, 15105: the first laser 1576, 1590, 15106: the second laser 1701: Reactor Rod 1703, 1711, 1718: Second Quartz Frit 1705, 1709, 1716: Quartz glass frit 1706: Gas discharge opening 1708, 1715, 901: graphite cup 1710, 1717, 903: Carbon 1712, 1719: cover 1713: Foil 15109: Outer support 15110: Inner support 15111: Reactor Connector

The above and other objects, features and advantages of the present invention will become apparent from the following more particular description of preferred embodiments of the present invention, as shown in the accompanying drawings, wherein like reference numerals refer to the same reference numerals in the different views. part. The drawings are not necessarily to scale, emphasis instead being placed upon illustrating the principles of the invention.

Fig. 1 is a perspective view of the E/MEE of the present invention.

Figures 2A and 2C show reactor assembly components. Figure 2B is an enlarged view of the reactor assembly components of Figure 2A.

Figures 3A, 3B, 3C, 3D, and 3E provide five views of coils that may be used in a reactor assembly.

Figure 4A is a perspective view of an E/MEE of the present invention for carbon pretreatment. Figure 4B shows the reactor assembly components.

Figure 5A illustrates one configuration of a standard coil. Figure 5B shows one configuration of a reverse field coil.

Figures 6A and 6B are diagrams of two embodiments of two composite reactor assemblies. Figure 6A shows a composite reactor with a copper body, a carbon-graphite cup, and a carbon-graphite cover. Figure 6B shows a composite reactor with a carbon graphite body and a lid and metal foil border.

Figures 7A to 7I show various reactor assembly views according to the present invention.

8A to 8C and 9 are illustrations of reactor variations.

101: air inlet

102: pipeline

103, 104, 105, 106, 107, 108, 109, 122: lights

110: air outlet

111: Substrate

112: support

113: Pivot

120: Coil

Claims (52)

A process for producing product gas, comprising the steps of: (a) To add a feed gas to an electromagnetic embedding device: (b) exposing the feed gas to at least one E/MEE light source; (c) directing the feed gas from step (b) to a reactor assembly comprising: a gas inlet and one or more gas outlets; a reactor chamber containing nanoporous carbon disposed within a cup and optionally covered with a lid; a first porous frit defining a floor of the reactor chamber disposed within the cup, a second porous frit defining the top of the reactor chamber; wherein each porous frit has a porosity sufficient to allow gas to permeate into the reactor chamber; a reactor headspace disposed above the reactor chamber; at least one RA coil surrounding the reactor chamber and/or the reactor headspace and operatively connected to a power supply, wherein a computer processing unit is configured to control the power supply of the RA coil; (d) subjecting the nanoporous carbon powder to harmonic patterning to instantiate a material; (e) collecting the product gas containing the material; and (f) Isolate the material from the product gas. The process according to claim 1, wherein the cup is made of graphite. The process according to claim 1 or 2, wherein the cover is made of graphite, platinum, palladium or ruthenium. The process of any one of claims 1 to 3, further comprising a foil surrounding the cup. The process of claim 4, wherein the foil is composed of platinum. The process of claim 1, further comprising a rod disposed below the reactor chamber and above the gas inlet. According to the process described in claim 6, the rod is composed of quartz. The process of claim 1, wherein the reactor chamber is sized to accommodate about 100 mg of nanoporous carbon. The process as described in Claim 1, wherein the feed gas is selected from the group consisting of air, oxygen, hydrogen, helium, nitrogen, neon, argon, krypton, xenon, carbon monoxide, carbon dioxide, and mixtures thereof Group. The process as claimed in claim 1, wherein the nanoporous carbon comprises graphene having at least 95 weight percent carbon (metal-based) with a mass average diameter of 1 µm to 5 mm and an ultramicroporous surface area of about 100 to 3000 m ² /g. The process according to claim 1, wherein the nanoporous carbon has been degassed. The process of claim 1, wherein the nanoporous carbon material is characterized by acid conditioning, wherein the acid is selected from HCl, HF, HBr, HI, sulfuric acid, phosphoric acid, carbonic acid, and nitric acid, and the residual water content is less than Achieved at room temperature exposed to a relative humidity of less than 40% RH (relative humidity, RH). The process according to claim 1, wherein the RA coil is an induction coil. The process of claim 1, wherein a first RA coil comprises copper wire, a second RA coil comprises a braid of copper wire and silver wire, a third RA coil is platinum wire wound and each RA The coils are configured to generate a magnetic field, and wherein each power supply independently provides AC and/or DC current. The process of claim 1, wherein the reactor assembly further comprises at least one laser, and wherein each laser is characterized by a different wavelength and is directed at the nanoporous carbon material, and the process further comprises for each powered by a laser. The process of claim 1, wherein the reactor assembly further comprises a first pair of RA lamps disposed in a first plane defined by a central axis and a first radius of the reactor chamber a second pair of RA lamps configured in a second plane defined by the central axis and a second radius of the reactor chamber; and a third pair of RA lamps configured to In a third plane defined by the central axis and a third radius of the reactor chamber, and the process also includes powering each RA lamp. The process according to claim 1, wherein the E/MEE is packaged in an opaque casing. The method according to claim 1, wherein the gas pipeline is between 50 cm and 5 m in diameter, and has a diameter between 2 mm and 25 cm. The process for producing product gas as claimed in claim 1, wherein the electromagnetic embedding equipment comprises at least 5 E/MEE pencil lamps located along a gas pipeline containing the feed gas; Each E/MEE penlight is independently positioned with its longitudinal axis (i) parallel to an internal gas line, (ii) radially disposed in a plane perpendicular to the internal gas line, or (iii) perpendicular to the a plane created by a longitudinal axis of the internal gas line or along a vertical axis of the internal gas line; and Each E/MEE penlight is independently fixed on one or more pivots that allow rotation between approximately 0 and 360 degrees relative to the x-, y-, and/or z-axes, where (i) the The x-axis is defined as the axis parallel to the gas line and its vertical plane, (ii) the y-axis is defined as the axis perpendicular to the gas line and parallel to its horizontal plane, and (iii) the z-axis is defined as the vertical The axis on the gas line and parallel to its vertical plane. The process of claim 19, wherein at least one of the E/MEE pencil lamps is a neon lamp, at least one of the E/MEE pencil lamps is a krypton lamp, and at least one of the E/MEE pencil lamps is an argon lamp. The process according to claim 1, wherein the feed gas is composed of nitrogen and hydrogen. The process of claim 1, wherein the feed gas comprises at least 99% nitrogen. The process of claim 1, wherein the feed gas comprises at least about 99.9% nitrogen. The process according to claim 1, wherein the feed gas is air. The process as claimed in any one of the preceding claims, wherein the hydrogen content of the product gas is higher than that of the feed gas. The process of claim 25, wherein the product gas comprises at least about 1% vol hydrogen. The process of claim 25, wherein the product gas further comprises helium, argon, neon, and combinations thereof. The process of claim 25, wherein helium, argon, neon, and combinations thereof comprise at least 1% vol of product gas. The process of claim 25, wherein the product gas comprises less than about 0.5 vol% _CO2 , such as less than 100 ppm _CO2 . The method of claim 21, wherein the product gas comprises at least about 1% vol of oxygen, helium, argon, neon, and combinations thereof. A process for producing product gas, comprising the steps of: (a) adding a feed gas to an electromagnetic embedding apparatus comprising: a gas line containing the feed gas; at least one E/MEE penlight is located below the gas line, at least one E/MEE penlight is located above the gas line, and at least one E/MEE penlight is located to the side of the gas line; wherein each E/MEE penlight is independently rotatably mounted, positioned along the length of the gas line; a power source operatively connected to each penlight; a central processing unit configured to independently control the power supply to each E/MEE penlight and the rotational position of each E/MEE penlight; (b) powering each penlamp, thereby subjecting the feed gas to electromagnetic radiation; optionally rotating one or more lamps; (c) directing the feed gas from step (b) to a reactor assembly comprising: a gas inlet and one or more gas outlets; a reactor chamber containing nanoporous carbon disposed within a cup and optionally covered with a lid; a first porous frit defining the floor of the reactor chamber disposed within the cup, a second porous frit defining the top of the reactor chamber and disposed below the cover; wherein each porous frit has a thickness sufficient to allow gas to permeate into the reactor chamber and comprises nano the porosity of the porous carbon; a reactor headspace disposed above the reactor head; at least one RA coil surrounding the reactor chamber and/or the reactor headspace and operatively connected to a power supply, wherein a computer processing unit is configured to control the power supply of the RA coil; (d) powering each RA to a first electromagnetic energy level; (e) subjecting the nanoporous carbon powder to harmonic patterning to instantiate a material; and (f) collecting the product gas comprising the material. The process of claim 31, wherein the material is selected from the group consisting of hydrogen, oxygen, helium, argon, neon, and combinations thereof. A product gas produced by a process according to any one of the preceding claims. The product gas of claim 33, comprising at least 1% vol of hydrogen, nitrogen, and one or more gases selected from the group consisting of helium, argon, and neon. The product gas of claim 18 comprising at least 4% vol of hydrogen, nitrogen, and one or more gases selected from the group consisting of helium, argon, and neon. The product gas of claim 20, wherein the product gas comprises less than about 0.5 vol% _CO2 , such as less than 100 ppm _CO2 . A product gas comprising at least 1% vol of hydrogen, nitrogen, and one or more gases selected from the group consisting of helium, argon, and neon. The product gas of claim 37 comprising at least 4% by volume of hydrogen, nitrogen, and one or more gases selected from the group consisting of helium, argon, and neon. The product gas of claim 37 or 38, wherein the product gas comprises less than about 0.5 vol% _CO2 , such as less than 100 ppm _CO2 . The product gas as claimed in claim 37, 38, or 39, further comprising water. The product gas as described in claim 33, comprising at least 20% vol of oxygen, nitrogen, and one or more gases selected from the group consisting of helium, argon, and neon. The product gas of claim 41 comprising at least 40% vol of oxygen, nitrogen, and one or more gases selected from the group consisting of helium, argon, and neon. The product gas as claimed in claim 41 or 42, further comprising at least 1 vol% hydrogen. The product gas as claimed in claim 41, 42 or 43, further comprising water. A product gas comprising at least 20% by volume of oxygen, nitrogen, and one or more gases selected from the group consisting of helium, argon, and neon. The product gas of claim 45 comprising at least 40% vol of oxygen, nitrogen, and one or more gases selected from the group consisting of helium, argon, and neon. The product gas as claimed in claim 45 or 46, further comprising at least 1 vol% hydrogen. The product gas as claimed in claim 45, 46 or 47, further comprising water. The product gas as described in claim 33, comprising at least 1% vol of water, at least 1 vol% of hydrogen, at least 1% vol. oxygen, nitrogen, and one or more selected from the group consisting of helium, argon and neon group of gases. The product gas as claimed in claim 49, comprising at least 3% vol water. A product gas comprising at least 1% vol of water, at least 1 vol% of hydrogen, at least 1% vol of oxygen, nitrogen, and one or more gases selected from the group consisting of helium, argon, and neon. The product gas of claim 51 comprising at least 3% vol water.

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