TW202328308A - Coating composition, preparation methods of the coating composition and polyimide resin wherein the coating composition includes polyamic acid, an imidazole compound and a solvent - Google Patents

Coating composition, preparation methods of the coating composition and polyimide resin wherein the coating composition includes polyamic acid, an imidazole compound and a solvent Download PDF

Info

Publication number
TW202328308A
TW202328308A TW111140350A TW111140350A TW202328308A TW 202328308 A TW202328308 A TW 202328308A TW 111140350 A TW111140350 A TW 111140350A TW 111140350 A TW111140350 A TW 111140350A TW 202328308 A TW202328308 A TW 202328308A
Authority
TW
Taiwan
Prior art keywords
group
coating composition
formula
mass
solvent
Prior art date
Application number
TW111140350A
Other languages
Chinese (zh)
Inventor
田所恵典
西條秀樹
Original Assignee
日商東京應化工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商東京應化工業股份有限公司 filed Critical 日商東京應化工業股份有限公司
Publication of TW202328308A publication Critical patent/TW202328308A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09D179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003Preparatory processes
    • C08G73/1007Preparatory processes from tetracarboxylic acids or derivatives and diamines
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1075Partially aromatic polyimides
    • C08G73/1078Partially aromatic polyimides wholly aromatic in the diamino moiety
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3442Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
    • C08K5/3445Five-membered rings
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20Diluents or solvents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/63Additives non-macromolecular organic

Abstract

The object of the present invention is to provide a coating composition capable of forming a polyimide resin having less coloration and excellent mechanical properties, a method for producing the coating composition, and a method for producing a polyimide resin using the coating composition. The solution of the present invention includes a coating composition of polyamic acid (A) and a solvent (S). The weight average molecular weight of the polyamic acid (A) is 20,000 or more. The coating composition further includes an imidazole compound (B) with a specific structure. The solvent (S) includes a urea-based solvent (S1) not less than 0% by mass and not more than 10% by mass.

Description

塗料組成物、塗料組成物之製造方法,及聚醯亞胺樹脂之製造方法Coating composition, manufacturing method of coating composition, and manufacturing method of polyimide resin

本發明係關於塗料組成物、與該塗料組成物之製造方法、與使用該塗料組成物之聚醯亞胺樹脂之製造方法。The present invention relates to a coating composition, a method for producing the coating composition, and a method for producing a polyimide resin using the coating composition.

聚醯亞胺樹脂由於具有優異之耐熱性、機械性強度及絕緣性,或低介電常數等之特性,故在如各種元件或多層配線基板等之電子基板般的電氣・電子零件,被廣泛作為絕緣材料或保護材料使用。Polyimide resin is widely used in electrical and electronic components such as electronic substrates such as various components or multilayer wiring boards due to its excellent heat resistance, mechanical strength, insulation, and low dielectric constant. Used as insulating or protective material.

一般而言,聚醯亞胺樹脂係藉由將四羧酸二酐成分與二胺成分於極性有機溶劑中聚合所得之聚醯胺酸進行熱處理而形成。亦有這般的背景,電子材料用之聚醯亞胺製品多數作為如聚醯胺酸般之聚醯亞胺前驅體的溶液供給。具體而言,製造電氣・電子零件時,聚醯亞胺前驅體的溶液於形成絕緣材料或保護材料的點,藉由塗佈或注入等之方法供給後,熱處理聚醯亞胺前驅體的溶液,而形成絕緣材料或保護材料。Generally, the polyimide resin is formed by heat-treating polyamic acid obtained by polymerizing tetracarboxylic dianhydride components and diamine components in a polar organic solvent. There is also such a background. Most polyimide products used in electronic materials are supplied as solutions of polyimide precursors such as polyamic acid. Specifically, in the manufacture of electrical and electronic parts, the solution of the polyimide precursor is supplied by coating or injection at the point where the insulating material or protective material is formed, and then the solution of the polyimide precursor is heat-treated , and form an insulating material or a protective material.

關於這般的聚醯亞胺樹脂之技術開拓已被認真研究,揭示有包含聚醯胺酸等之各種樹脂組成物(例如參照專利文獻1等)。 [先前技術文獻] [專利文獻] Technological development of such polyimide resins has been earnestly studied, and various resin compositions including polyamic acid and the like have been disclosed (for example, refer to Patent Document 1 and the like). [Prior Art Literature] [Patent Document]

[專利文獻1]日本特開2018-58918號公報[Patent Document 1] Japanese Patent Laid-Open No. 2018-58918

[發明欲解決之課題][Problem to be solved by the invention]

於聚醯亞胺樹脂、尤其是聚醯亞胺薄膜,有因用途,而期望著色少或拉伸彈性率等之機械特性優異的情況。惟,將專利文獻1等所記載之樹脂組成物作為塗料組成物使用,製造聚醯亞胺樹脂時,有難以形成兼備著色少與優異之機械特性的聚醯亞胺樹脂的問題。In polyimide resins, especially polyimide films, depending on the application, less coloring or excellent mechanical properties such as tensile modulus may be desired. However, when a polyimide resin is produced using the resin composition described in Patent Document 1 and the like as a paint composition, it is difficult to form a polyimide resin having both less coloring and excellent mechanical properties.

本發明係鑑於上述之課題而完成者,以提供一種可形成兼備著色少與優異之機械特性之聚醯亞胺樹脂的塗料組成物、與該塗料組成物之製造方法、與使用該塗料組成物之聚醯亞胺樹脂之製造方法作為目的。 [用以解決課題之手段] The present invention was made in view of the above-mentioned problems to provide a coating composition capable of forming a polyimide resin having less coloration and excellent mechanical properties, a method for producing the coating composition, and a coating composition using the coating composition The production method of the polyimide resin is the purpose. [Means to solve the problem]

本發明者們發現在包含聚醯胺酸(A)、與溶媒(S)之塗料組成物,藉由使用重量平均分子量為20,000以上之聚醯胺酸(A)、與特定之構造的咪唑化合物(B)、與尿素系溶媒(S1)的含量為0質量%以上10質量%以下的溶媒(S),可解決上述之課題,而終至完成本發明。更具體而言,本發明係提供以下者。The inventors of the present invention found that in the coating composition comprising polyamic acid (A) and solvent (S), by using polyamic acid (A) with a weight average molecular weight of 20,000 or more and an imidazole compound with a specific structure (B), and the solvent (S) whose content with the urea-based solvent (S1) is not less than 0% by mass and not more than 10% by mass can solve the above-mentioned problems, and finally complete the present invention. More specifically, the present invention provides the following.

本發明之第1態樣為一種塗料組成物,其特徵為 包含聚醯胺酸(A)、與咪唑化合物(B)、與溶媒(S), 聚醯胺酸(A)的重量平均分子量為20,000以上, 咪唑化合物(B)為下述式(1)表示之化合物, (式(1)中,R 1為氫原子或烷基,R 2為可具有取代基之芳香族基,R 3為可具有取代基之伸烷基,R 4分別獨立為鹵素原子、羥基、巰基、硫化物基、矽烷基、矽烷醇基、硝基、亞硝基、磺酸根基、膦基、氧膦基、膦酸根基或有機基,n為0以上3以下之整數) 包含>N-CO-N<表示之尿素骨架之尿素系溶媒(S1)的質量相對於溶媒(S)的質量的比率,為0質量%以上10質量%以下。 The first aspect of the present invention is a coating composition characterized by comprising polyamic acid (A), imidazole compound (B), and solvent (S), and the weight average molecular weight of polyamic acid (A) is 20,000 or more, the imidazole compound (B) is a compound represented by the following formula (1), (In formula (1), R 1 is a hydrogen atom or an alkyl group, R 2 is an aromatic group that may have a substituent, R 3 is an alkylene group that may have a substituent, and R 4 is independently a halogen atom, a hydroxyl group, Mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfonate group, phosphine group, phosphinyl group, phosphonate group or organic group, n is an integer between 0 and 3) including >N The ratio of the mass of the urea-based solvent (S1) in the urea skeleton represented by -CO-N< to the mass of the solvent (S) is 0% by mass or more and 10% by mass or less.

本發明之第2態樣為一種塗料組成物之製造方法,其係包含: 聚醯胺酸(A)、與咪唑化合物(B)、與溶媒(S)的塗料組成物之製造方法,其特徵為包含 將四羧酸二酐、與二胺化合物於溶媒(S)中,於咪唑化合物(B)的存在下使其聚合,生成聚醯胺酸(A), 咪唑化合物(B)為下述式(1)表示之化合物, (式(1)中,R 1為氫原子或烷基,R 2為可具有取代基之芳香族基,R 3為可具有取代基之伸烷基,R 4分別獨立為鹵素原子、羥基、巰基、硫化物基、矽烷基、矽烷醇基、硝基、亞硝基、磺酸根基、膦基、氧膦基、膦酸根基或有機基,n為0以上3以下之整數) 包含>N-CO-N<表示之尿素骨架之尿素系溶媒(S1)的質量相對於溶媒(S)的質量的比率,為0質量%以上10質量%以下, 將二胺成分、與四羧酸二酐成分的聚合進行至聚醯胺酸(A)的重量平均分子量成為20,000以上為止。 The second aspect of the present invention is a method for producing a coating composition, which is a method for producing a coating composition comprising: polyamic acid (A), imidazole compound (B), and solvent (S), and is characterized in In order to include tetracarboxylic dianhydride and diamine compound in the solvent (S), it is polymerized in the presence of the imidazole compound (B) to generate polyamic acid (A). The imidazole compound (B) is as follows The compound represented by formula (1), (In formula (1), R 1 is a hydrogen atom or an alkyl group, R 2 is an aromatic group that may have a substituent, R 3 is an alkylene group that may have a substituent, and R 4 is independently a halogen atom, a hydroxyl group, Mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfonate group, phosphine group, phosphinyl group, phosphonate group or organic group, n is an integer between 0 and 3) including >N The ratio of the mass of the urea-based solvent (S1) to the mass of the solvent (S) of the urea skeleton represented by -CO-N< is 0% by mass or more and 10% by mass or less, and the diamine component and tetracarboxylic dianhydride Polymerization of components is performed until the weight average molecular weight of polyamic acid (A) becomes 20,000 or more.

本發明之第3態樣為一種聚醯亞胺樹脂之製造方法,其係包含: 成形該第1態樣之塗料組成物之成形步驟、與 加熱經成形之塗料組成物,使其醯亞胺化之醯亞胺化步驟。 [發明效果] The 3rd aspect of the present invention is a kind of manufacturing method of polyimide resin, and it is to comprise: The forming step of forming the coating composition of the first aspect, and The imidization step of heating the formed coating composition to imidize it. [Invention effect]

根據本發明,可提供一種可形成兼備著色少與優異之機械特性之聚醯亞胺樹脂的塗料組成物、與該塗料組成物之製造方法、與使用該塗料組成物之聚醯亞胺樹脂之製造方法。According to the present invention, it is possible to provide a coating composition capable of forming a polyimide resin having less coloration and excellent mechanical properties, a method for producing the coating composition, and a polyimide resin using the coating composition. Manufacturing method.

≪塗料組成物≫≪Paint composition≫

塗料組成物包含聚醯胺酸(A)、與溶媒(S)。該塗料組成物進一步包含後述之咪唑化合物(B)。包含>N-CO-N<表示之尿素骨架之尿素系溶媒(S1)的質量相對於溶媒(S)的質量的比率,為0質量%以上10質量%以下。該塗料組成物被使用在聚醯亞胺樹脂的形成。 藉由使用滿足上述之指定的要件之塗料組成物,可形成兼備著色少與優異之機械特性之聚醯亞胺樹脂。 The coating composition includes polyamic acid (A), and a solvent (S). This coating composition further contains the imidazole compound (B) mentioned later. The mass ratio of the urea-based solvent (S1) containing the urea skeleton represented by >N-CO-N< to the mass of the solvent (S) is 0% by mass or more and 10% by mass or less. This coating composition is used in the formation of polyimide resin. By using a coating composition that satisfies the above specified requirements, it is possible to form a polyimide resin that has both less coloration and excellent mechanical properties.

以下,關於塗料組成物之必須或任意的成分進行說明。Hereinafter, the essential or optional components of the paint composition will be described.

<聚醯胺酸(A)> 塗料組成物包含聚醯胺酸(A)。聚醯胺酸(A)係硬化塗料組成物時所生成之聚醯亞胺樹脂的前驅體聚合物。聚醯胺酸(A)自以往,若為作為製造聚醯亞胺樹脂時之前驅體聚合物使用之樹脂,則並未特別限定。 聚醯胺酸(A)的重量平均分子量為20,000以上。藉由將這般的分子量之聚醯胺酸與後述之咪唑化合物(B)一起摻合在塗料組成物,並使用塗料組成物,可形成兼備著色少與優異之機械特性之聚醯亞胺樹脂。 聚醯胺酸(A)的重量平均分子量較佳為5,000以上100,000以下,更佳為10,000以上75,000以下。 <Polyamide (A)> The coating composition contains polyamic acid (A). Polyamic acid (A) is a precursor polymer of polyimide resin produced when the coating composition is cured. The polyamic acid (A) is not particularly limited as long as it is a resin used as a precursor polymer in the production of a polyimide resin conventionally. The weight average molecular weight of polyamide acid (A) is 20,000 or more. By blending polyamic acid of such a molecular weight with the imidazole compound (B) described later in a coating composition and using the coating composition, a polyimide resin having less coloring and excellent mechanical properties can be formed . The weight average molecular weight of the polyamide acid (A) is preferably from 5,000 to 100,000, more preferably from 10,000 to 75,000.

聚醯胺酸(A)通常可藉由縮合由四羧酸二酐、與二胺所構成之單體成分獲得。 聚醯胺酸可具有下述式(a1)表示之構造單位。 (式(a1)中,A 1為碳原子數6以上50以下之4價的有機基,A 2為2價的有機基)。 Polyamic acid (A) can usually be obtained by condensing a monomer component composed of tetracarboxylic dianhydride and diamine. Polyamide acid may have a structural unit represented by the following formula (a1). (In the formula (a1), A1 is a tetravalent organic group having 6 to 50 carbon atoms, and A2 is a divalent organic group).

以下,針對使用在聚醯胺酸(A)的製造之四羧酸二酐、與二胺化合物、與聚醯胺酸(A)之製造方法,於以下進行說明。Hereinafter, the tetracarboxylic dianhydride used in the manufacture of polyamic acid (A), the diamine compound, and the manufacturing method of polyamic acid (A) are demonstrated below.

[四羧酸二酐] 生成式(a1)表示之構造單位的四羧酸二酐係以下述式(a1-1)表示。 式(a1-1)表示之四羧酸二酐與後述之二胺化合物反應,給予具有式(a1)表示之構造單位的聚醯胺酸(A)。該四羧酸二酐可1種單獨使用,亦可組合2種以上使用。 (式(a1-1)中,A 1為碳原子數6以上50以下之4價的有機基)。 [Tetracarboxylic dianhydride] The tetracarboxylic dianhydride that generates the structural unit represented by the formula (a1) is represented by the following formula (a1-1). Tetracarboxylic dianhydride represented by formula (a1-1) reacts with a diamine compound described later to give polyamic acid (A) having a structural unit represented by formula (a1). This tetracarboxylic dianhydride may be used individually by 1 type, and may use it in combination of 2 or more types. (In the formula (a1-1), A1 is a tetravalent organic group having 6 to 50 carbon atoms).

式(a1-1)中,A 1為碳原子數6以上50以下之4價的有機基,除了在式(a1-1)之2個-CO-O-CO-表示之酸酐基之外,可具有1個或複數個取代基。 作為取代基的合適之例,較佳為氟原子、碳原子數1以上6以下之烷基、碳原子數1以上6以下之烷氧基、碳原子數1以上6以下之氟化烷基、碳原子數1以上6以下之氟化烷氧基。又,式(a1-1)表示之化合物除了酸酐基之外,可包含羧基、羧酸酯基。 取代基為氟化烷基或氟化烷氧基時,較佳為全氟烷基或全氟烷氧基。 對於以上之取代基,可說對於後述之芳香族基可具有在芳香環上之1個或複數個取代基亦相同。 In the formula (a1-1), A1 is a tetravalent organic group with 6 to 50 carbon atoms, except for the acid anhydride groups represented by the two -CO-O-CO- in the formula (a1-1), It may have 1 or plural substituents. Suitable examples of substituents are preferably fluorine atoms, alkyl groups having 1 to 6 carbon atoms, alkoxy groups having 1 to 6 carbon atoms, fluorinated alkyl groups having 1 to 6 carbon atoms, A fluorinated alkoxy group having 1 to 6 carbon atoms. Moreover, the compound represented by formula (a1-1) may contain a carboxyl group and a carboxylate group other than an acid anhydride group. When the substituent is a fluorinated alkyl group or a fluorinated alkoxy group, it is preferably a perfluoroalkyl group or a perfluoroalkoxy group. The same can be said about the above substituents that the aromatic group described later may have one or a plurality of substituents on the aromatic ring.

式(a1-1)中,A 1為4價的有機基,其碳原子數的下限值為6,上限值為50。 構成A 1之碳原子數更佳為8以上,再更佳為12以上。又,構成A 1之碳原子數更佳為40以下,再更佳為30以下。A 1可為脂肪族基,亦可為芳香族基,亦可為組合此等之構造之基。A 1除了碳原子及氫原子之外,可包含鹵素原子、氧原子、氮原子及硫原子。A 1為包含氧原子、氮原子或硫原子時,氧原子、氮原子或硫原子作為選自含氮雜環基、-CONH-、-NH-、-N=N-、-CH=N-、-COO-、-O-、-CO-、 -SO-、-SO 2-、-S-及-S-S-中之基,可包含在A 1,作為選自 -O-、-CO-、-SO-、-SO 2-、-S-及-S-S-中之基,更佳為包含在A 1In the formula (a1-1), A 1 is a tetravalent organic group, the lower limit of the number of carbon atoms is 6, and the upper limit is 50. The number of carbon atoms constituting A1 is more preferably 8 or more, and still more preferably 12 or more. Also, the number of carbon atoms constituting A1 is more preferably 40 or less, and still more preferably 30 or less. A 1 may be an aliphatic group, an aromatic group, or a combination of these structures. A1 may contain a halogen atom, an oxygen atom, a nitrogen atom, and a sulfur atom in addition to a carbon atom and a hydrogen atom. When A1 is an oxygen atom, nitrogen atom or sulfur atom, the oxygen atom, nitrogen atom or sulfur atom is selected from nitrogen-containing heterocyclic group, -CONH-, -NH-, -N=N-, -CH=N- , -COO-, -O-, -CO-, -SO-, -SO 2 -, -S- and -SS-, may be contained in A 1 as a group selected from -O-, -CO-, The groups among -SO-, -SO 2 -, -S- and -SS- are preferably included in A 1 .

四羧酸二酐自以往,即可從被作為聚醯胺酸的合成原料使用之四羧酸二酐中適當選擇。四羧酸二酐可為脂肪族四羧酸二酐,亦可為芳香族四羧酸二酐。從容易得到透明性及機械特性優異之聚醯亞胺樹脂的點來看,四羧酸二酐較佳為脂肪族四羧酸二酐,更佳為後述之脂環式四羧酸二酐(A1)。 以下,對於脂環式四羧酸二酐(A1)進行說明。 Tetracarboxylic dianhydrides can be appropriately selected from tetracarboxylic dianhydrides conventionally used as synthesis raw materials of polyamic acid. The tetracarboxylic dianhydride may be an aliphatic tetracarboxylic dianhydride or an aromatic tetracarboxylic dianhydride. The tetracarboxylic dianhydride is preferably an aliphatic tetracarboxylic dianhydride, more preferably an alicyclic tetracarboxylic dianhydride ( A1). Hereinafter, alicyclic tetracarboxylic dianhydride (A1) is demonstrated.

(脂環式四羧酸二酐(A1)) 作為脂環式四羧酸二酐(A1)的合適之例,可列舉前述之式(a1-1)表示,前述之A 1未包含芳香族基,包含脂環之碳原子數4以上50以下之4價的有機基的化合物。在該化合物,2個羧酸酐基鍵結在脂環上。脂環式四羧酸二酐(A1)可1種單獨使用,亦可組合2種以上使用。 (Alicyclic tetracarboxylic dianhydride (A1)) A suitable example of the alicyclic tetracarboxylic dianhydride (A1) is represented by the aforementioned formula (a1-1), and the aforementioned A1 does not contain aromatic A group, a compound containing a tetravalent organic group with an alicyclic ring having 4 to 50 carbon atoms. In this compound, two carboxylic acid anhydride groups are bonded to the alicyclic ring. The alicyclic tetracarboxylic dianhydride (A1) may be used alone or in combination of two or more.

脂環式四羧酸二酐(A1)係具有2個鍵結在脂環上之羧酸酐基,且不包含芳香族基之化合物。脂環式四羧酸二酐可具有直鏈狀或分枝鏈狀之鏈狀脂肪族基。 脂環式四羧酸二酐(A1)所具有之脂環及鏈狀脂肪族基除了碳原子及氫原子之外,可包含鹵素原子、氧原子、氮原子及硫原子。例如,氧原子、氮原子或硫原子作為選自含氮雜環基、-CONH-、-NH-、-N=N-、-CH=N-、-COO-、-O-、-CO-、-SO-、-SO 2-、-S-及-S-S-中之基,可包含在脂環及鏈狀脂肪族基。 Alicyclic tetracarboxylic dianhydride (A1) is a compound which has two carboxylic anhydride groups bonded to an alicyclic ring and does not contain an aromatic group. The alicyclic tetracarboxylic dianhydride may have a linear or branched chain aliphatic group. The alicyclic and chain aliphatic groups which the alicyclic tetracarboxylic dianhydride (A1) has may contain a halogen atom, an oxygen atom, a nitrogen atom, and a sulfur atom other than a carbon atom and a hydrogen atom. For example, an oxygen atom, a nitrogen atom or a sulfur atom is selected from a nitrogen-containing heterocyclic group, -CONH-, -NH-, -N=N-, -CH=N-, -COO-, -O-, -CO- The groups in , -SO-, -SO 2 -, -S- and -SS- may be included in alicyclic and chain aliphatic groups.

脂環式四羧酸二酐(A1)所包含之脂環可為單環,亦可為多環。作為多環式之脂環式構造,例如可列舉聯環[2.2.1]庚烷等之橋接脂環式構造等。例如橋接脂環式構造可與其他橋接脂環式構造及/或非橋接脂環式構造縮合,亦可橋接脂環式構造藉由與其他橋接脂環式構造及/或非橋接脂環式構造螺鍵結來連結。藉由使用脂環式四羧酸二酐(A1),使用塗料組成物,而得到透明性優異之聚醯亞胺樹脂。The alicyclic ring contained in the alicyclic tetracarboxylic dianhydride (A1) may be monocyclic or polycyclic. Examples of the polycyclic alicyclic structure include bridged alicyclic structures such as bicyclo[2.2.1]heptane, and the like. For example, bridged alicyclic structures can be condensed with other bridged alicyclic structures and/or non-bridged alicyclic structures, and bridged alicyclic structures can also be condensed with other bridged alicyclic structures and/or non-bridged alicyclic structures. Screw key to connect. By using the alicyclic tetracarboxylic dianhydride (A1) and using the coating composition, a polyimide resin excellent in transparency can be obtained.

作為脂環式四羧酸二酐(A1)之合適的具體例,可列舉1,2,4,5-環己烷四羧酸二酐、聯環[2.2.2]辛烷-2,3,5,6-四羧酸二酐、聯環[2.2.2]辛-7-烯-2,3,5,6-四羧酸二酐、5-(2,5-二側氧基四氫呋喃-3-基)-3-甲基-3-環已烯-1,2-二羧酸酐、4-(2,5-二側氧基四氫呋喃-3-基)-四氫化萘-1,2-二羧酸酐、四氫呋喃-2,3,4,5-四羧酸二酐、1,2,3,4-環戊烷四羧酸二酐、1,2,3,4-環丁烷四羧酸二酐、1,3-二甲基-1,2,3,4-環丁烷四羧酸二酐,及1,4-二甲基-1,2,3,4-環丁烷四羧酸二酐等。Specific examples of alicyclic tetracarboxylic dianhydride (A1) include 1,2,4,5-cyclohexanetetracarboxylic dianhydride, bicyclo[2.2.2]octane-2,3 ,5,6-tetracarboxylic dianhydride, bicyclo[2.2.2]oct-7-ene-2,3,5,6-tetracarboxylic dianhydride, 5-(2,5-dioxo-tetrahydrofuran -3-yl)-3-methyl-3-cyclohexene-1,2-dicarboxylic acid anhydride, 4-(2,5-dioxotetrahydrofuran-3-yl)-tetrahydronaphthalene-1,2 -Dicarboxylic anhydride, tetrahydrofuran-2,3,4,5-tetracarboxylic dianhydride, 1,2,3,4-cyclopentane tetracarboxylic dianhydride, 1,2,3,4-cyclobutane tetra Carboxylic dianhydride, 1,3-dimethyl-1,2,3,4-cyclobutane tetracarboxylic dianhydride, and 1,4-dimethyl-1,2,3,4-cyclobutane Tetracarboxylic dianhydride, etc.

又,作為脂環式四羧酸二酐(A1),較佳為下述式(a2)表示之化合物。使用下述式(a2)表示之化合物時,有容易得到透明性優異之聚醯亞胺樹脂的傾向。 尚,從原料化合物之純化容易的點來看,式(a2)中之a較佳為5以下,更佳為3以下。又,由於原料化合物之化學的安定性優異,a較佳為1以上,更佳為2以上。 式(a2)中之a特佳為2或3。 Moreover, as alicyclic tetracarboxylic dianhydride (A1), the compound represented by following formula (a2) is preferable. When a compound represented by the following formula (a2) is used, it tends to be easy to obtain a polyimide resin excellent in transparency. Furthermore, a in the formula (a2) is preferably 5 or less, more preferably 3 or less, from the viewpoint of ease of purification of the raw material compound. Moreover, since the chemical stability of the raw material compound is excellent, a is preferably 1 or more, more preferably 2 or more. a in the formula (a2) is particularly preferably 2 or 3.

(式(a2)中,R a11、R a12及R a13分別獨立為選自由氫原子、碳原子數1以上5以下之烷基及氟原子所構成之群組中之1種,a為0以上12以下之整數)。 (In formula (a2), R a11 , R a12 and R a13 are each independently selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, and a fluorine atom, and a is 0 or more an integer below 12).

可作為式(a2)中之R a11選擇之烷基,係碳原子數為1以上5以下之烷基。烷基之碳原子數再更佳為1以上4以下,特佳為1以上3以下。 R a11為烷基時,該烷基可為直鏈狀,亦可為分枝鏈狀。 The alkyl group that can be selected as R a11 in formula (a2) is an alkyl group having 1 to 5 carbon atoms. The number of carbon atoms in the alkyl group is still more preferably from 1 to 4, particularly preferably from 1 to 3. When R a11 is an alkyl group, the alkyl group may be linear or branched.

作為式(a2)中之R a11,從式(a2)表示之四羧酸二酐的取得或純化容易的點來看,更佳為氫原子、甲基、乙基、n-丙基或異丙基,特佳為氫原子或甲基。 式(a2)中之複數個R a11由於式(a2)表示之四羧酸二酐的純化容易,故較佳為相同之基。 As R a11 in the formula (a2), it is more preferable to be a hydrogen atom, a methyl group, an ethyl group, an n-propyl group or an iso The propyl group is particularly preferably a hydrogen atom or a methyl group. The plurality of R a11 in the formula (a2) are preferably the same group because the purification of the tetracarboxylic dianhydride represented by the formula (a2) is easy.

式(a2)中之a表示0以上12以下之整數。a之值超過12時,給予式(a2)表示之4價的有機基之四羧酸二酐的純化困難。 從式(a2)表示之四羧酸二酐的純化容易的點來看,a的上限較佳為5,更佳為3。 從式(a2)表示之四羧酸二酐的化學的安定性的點來看,a的下限較佳為1,更佳為2。 式(a2)中之a特佳為2或3。 a in the formula (a2) represents an integer of 0 to 12. When the value of a exceeds 12, purification of tetracarboxylic dianhydride which gives a tetravalent organic group represented by formula (a2) becomes difficult. The upper limit of a is preferably 5, more preferably 3, from the viewpoint of easy purification of tetracarboxylic dianhydride represented by formula (a2). The lower limit of a is preferably 1, more preferably 2 from the viewpoint of the chemical stability of tetracarboxylic dianhydride represented by formula (a2). a in the formula (a2) is particularly preferably 2 or 3.

可作為式(a2)中之R a12及R a13選擇之碳原子數1以上5以下之烷基,係與可作為R a11選擇之碳原子數1以上5以下之烷基相同。 R a12及R a13從式(a2)表示之四羧酸二酐的純化容易的點來看,較佳為氫原子或碳原子數1以上5以下之烷基,特佳為氫原子或甲基。 The alkyl group having 1 to 5 carbon atoms that can be selected as R a12 and R a13 in formula (a2) is the same as the alkyl group having 1 to 5 carbon atoms that can be selected as R a11 . R a12 and R a13 are preferably a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, particularly preferably a hydrogen atom or a methyl group, from the viewpoint of ease of purification of the tetracarboxylic dianhydride represented by the formula (a2). .

作為式(a2)表示之四羧酸二酐,例如可列舉降冰片烷-2-螺環-α-環戊酮-α’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐(別名「降冰片烷-2-螺環-2’-環戊酮-5’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐」)、甲基降冰片烷-2-螺環-α-環戊酮-α’-螺環-2”-(甲基降冰片烷)-5,5”,6,6”-四羧酸二酐、降冰片烷-2-螺環-α-環己酮-α’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐(別名「降冰片烷-2-螺環-2’-環己酮-6’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐」)、甲基降冰片烷-2-螺環-α-環己酮-α’-螺環-2”-(甲基降冰片烷)-5,5”,6,6”-四羧酸二酐、降冰片烷-2-螺環-α-環丙酮-α’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐、降冰片烷-2-螺環-α-環丁酮-α’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐、降冰片烷-2-螺環-α-環庚酮-α’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐、降冰片烷-2-螺環-α-環辛酮-α’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐、降冰片烷-2-螺環-α-環壬酮-α’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐、降冰片烷-2-螺環-α-環癸酮-α’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐、降冰片烷-2-螺環-α-環十一烷酮-α’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐、降冰片烷-2-螺環-α-環十二烷酮-α’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐、降冰片烷-2-螺環-α-環十三烷酮-α’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐、降冰片烷-2-螺環-α-環十四烷酮-α’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐、降冰片烷-2-螺環-α-環十五烷酮-α’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐、降冰片烷-2-螺環-α-(甲基環戊酮)-α’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐、降冰片烷-2-螺環-α-(甲基環己酮)-α’-螺環-2”-降冰片烷-5,5”,6,6”-四羧酸二酐等。As the tetracarboxylic dianhydride represented by formula (a2), for example, norbornane-2-spiro-α-cyclopentanone-α'-spiro-2"-norbornane-5,5",6 ,6"-tetracarboxylic dianhydride (alias "norbornane-2-spirocycle-2'-cyclopentanone-5'-spirocycle-2"-norbornane-5,5",6,6" -tetracarboxylic dianhydride"), methylnorbornane-2-spiro-α-cyclopentanone-α'-spiro-2"-(methylnorbornane)-5,5",6, 6"-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclohexanone-α'-spiro-2"-norbornane-5,5",6,6"-tetracarboxylic acid Dianhydride (alias "norbornane-2-spiro-2'-cyclohexanone-6'-spiro-2"-norbornane-5,5",6,6"-tetracarboxylic dianhydride" ), Methylnorbornane-2-spiro-α-cyclohexanone-α'-spiro-2”-(methylnorbornane)-5,5”,6,6”-tetracarboxylic dicarboxylic acid Anhydride, norbornane-2-spiro-α-cyclopropanone-α'-spiro-2”-norbornane-5,5”,6,6”-tetracarboxylic dianhydride, norbornane-2 -spiro-α-cyclobutanone-α'-spiro-2”-norbornane-5,5”,6,6”-tetracarboxylic dianhydride, norbornane-2-spiro-α- Cycloheptanone-α'-spiro-2"-norbornane-5,5",6,6"-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclooctanone-α' -Spiro-2"-Norbornane-5,5",6,6"-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclononanone-α'-spiro-2" -Norbornane-5,5",6,6"-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclodecanone-α'-spiro-2"-norbornane-5 ,5",6,6"-Tetracarboxylic dianhydride, norbornane-2-spiro-α-cycloundecone-α'-spiro-2"-norbornane-5,5", 6,6"-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclododecanone-α'-spiro-2"-norbornane-5,5",6,6" -Tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclotridecanone-α'-spiro-2”-norbornane-5,5”,6,6”-tetracarboxylic acid Dianhydride, norbornane-2-spiro-α-cyclotetradecanone-α'-spiro-2”-norbornane-5,5”,6,6”-tetracarboxylic dianhydride, norbornane Bornane-2-spiro-α-cyclopentadecanone-α'-spiro-2”-norbornane-5,5”,6,6”-tetracarboxylic dianhydride, norbornane-2 -Spiro-α-(methylcyclopentanone)-α'-spiro-2”-norbornane-5,5”,6,6”-tetracarboxylic dianhydride, norbornane-2-spiro Cyclo-α-(methylcyclohexanone)-α'-spiro-2”-norbornane-5,5”,6,6”-tetracarboxylic dianhydride, etc.

又,作為式(a2)表示之四羧酸二酐,從使用塗料組成物所製造之聚醯亞胺樹脂的熱物性、機械物性、光學特性、電氣特性良好的點來看,較佳為含有下述式(a2-1)表示之化合物(A2-1)及下述式(a2-2)表示之化合物(A2-2)當中之至少1種,且為化合物(A2-1)及化合物(A2-2)的總量為30莫耳%以上之四羧酸二酐, (式(a2-1)中,R a11、R a12、R a13、a係與式(a2)中之R a11、R a12、R a13、a同義)。 (式(a2-2)中,R a11、R a12、R a13、a係與式(a2)中之R a11、R a12、R a13、a同義)。 Also, as the tetracarboxylic dianhydride represented by the formula (a2), it is preferable to contain At least one of compound (A2-1) represented by the following formula (a2-1) and compound (A2-2) represented by the following formula (a2-2), and compound (A2-1) and compound ( A2-2) The total amount is more than 30 mol% of tetracarboxylic dianhydride, (In formula (a2-1), R a11 , R a12 , R a13 , and a are synonymous with R a11 , R a12 , R a13 , and a in formula (a2). (In formula (a2-2), R a11 , R a12 , R a13 , and a are synonymous with R a11 , R a12 , R a13 , and a in formula (a2).

式(a2-1)表示之化合物(A2-1)係2個降冰片烷基反式配置,且相對於該2個降冰片烷基的個別,係環烷酮之羰基成為端之立體配置的式(a2)表示之四羧酸二酐的異構體。 式(a2-2)表示之化合物(A2-2)係2個降冰片烷基順式配置,且相對於該2個降冰片烷基的個別,係環烷酮之羰基成為端之立體配置的式(a2)表示之四羧酸二酐的異構體。 尚,將這般的異構體以上述比率含有之四羧酸二酐之製造方法亦並未特別限制,可適當採用公知之方法,例如可適當採用國際公開第2014/034760號所記載之方法等。 The compound (A2-1) represented by the formula (a2-1) has two norbornyl groups trans-configured, and relative to each of the two norbornyl groups, the carbonyl group of the cycloalkanone is end-stereo-configured An isomer of tetracarboxylic dianhydride represented by formula (a2). The compound (A2-2) represented by the formula (a2-2) has two norbornyl groups arranged in cis, and relative to each of the two norbornyl groups, the carbonyl group of the cycloalkanone is end-stereo-configured An isomer of tetracarboxylic dianhydride represented by formula (a2). Also, the method for producing tetracarboxylic dianhydride containing such isomers at the above ratio is not particularly limited, and known methods can be appropriately used, for example, the method described in International Publication No. 2014/034760 can be appropriately used wait.

(芳香族四羧酸二酐) 如前述,作為四羧酸二酐,亦可使用芳香族四羧酸二酐。 芳香族四羧酸二酐係於其構造中包含芳香環之四羧酸二酐。作為芳香族四羧酸二酐,自以往,即可無特別限制使用被使用在聚醯亞胺樹脂的製造之芳香族四羧酸二酐。 (aromatic tetracarboxylic dianhydride) As mentioned above, an aromatic tetracarboxylic dianhydride can also be used as a tetracarboxylic dianhydride. The aromatic tetracarboxylic dianhydride is a tetracarboxylic dianhydride containing an aromatic ring in its structure. As the aromatic tetracarboxylic dianhydride, conventionally, aromatic tetracarboxylic dianhydrides used in the production of polyimide resins can be used without any particular limitation.

作為芳香族四羧酸二酐之合適的具體例,例如可列舉均苯四甲酸二酐、1,4-雙(3,4-二羧基苯氧基)苯二酐、3,3’,4,4’-氧基雙鄰苯二甲酸二酐、3,3’,4,4’-聯苯基四羧酸二酐、2,3,3’,4’-聯苯基四羧酸二酐、3,3’,4,4’-二苯基甲酮四羧酸二酐、3,3’,4,4’-二苯基碸四羧酸二酐及萘-1,4,5,8-四羧酸二酐等。Specific examples of suitable aromatic tetracarboxylic dianhydrides include pyromellitic dianhydride, 1,4-bis(3,4-dicarboxyphenoxy)phthalic anhydride, 3,3′,4 ,4'-Oxydiphthalic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2,3,3',4'-biphenyltetracarboxylic dicarboxylic acid anhydride, 3,3',4,4'-diphenyl ketone tetracarboxylic dianhydride, 3,3',4,4'-diphenylphenone tetracarboxylic dianhydride and naphthalene-1,4,5 , 8-tetracarboxylic dianhydride, etc.

作為芳香族四羧酸二酐,又,例如亦可為下述式(a1-2)~(a1-4)表示之化合物。 Moreover, as an aromatic tetracarboxylic dianhydride, the compound represented by following formula (a1-2)-(a1-4) can also be used, for example.

在上述式(a1-2)及式(a1-3),R a1、R a2及R a3分別表示可被鹵素取代之脂肪族基、氧原子、硫原子、透過1個以上之2價元素的芳香族基之任一者,或藉由該等之組合構成之2價的基。R a2及R a3可為相同,亦可為相異。 亦即,R a1、R a2及R a3可包含碳-碳之單鍵、碳-氧-碳之醚鍵或鹵素元素(氟、氯、溴、碘)。作為式(a1-2)表示之化合物,可列舉2,2-雙(3,4-二羧基苯氧基)丙烷二酐及1,4-雙(3,4-二羧基苯氧基)苯二酐等。 In the above formula (a1-2) and formula (a1-3), R a1 , R a2 and R a3 respectively represent an aliphatic group which may be substituted by a halogen, an oxygen atom, a sulfur atom, or a divalent element through which one or more Any of the aromatic groups, or a divalent group constituted by a combination thereof. R a2 and R a3 may be the same or different. That is, R a1 , R a2 and R a3 may contain a carbon-carbon single bond, a carbon-oxygen-carbon ether bond, or a halogen element (fluorine, chlorine, bromine, iodine). Examples of compounds represented by formula (a1-2) include 2,2-bis(3,4-dicarboxyphenoxy)propane dianhydride and 1,4-bis(3,4-dicarboxyphenoxy)benzene Dianhydride, etc.

又,在上述式(a1-4),R a4、R a5表示可被鹵素取代之脂肪族基、透過1個以上之2價元素的芳香族基、鹵素之任一者,或藉由該等之組合構成之1價的取代基。R a4及R a5可分別為相同,亦可為相異。作為式(a1-4)表示之化合物,亦可使用二氟均苯四甲酸二酐及二氯均苯四甲酸二酐等。 In addition, in the above-mentioned formula (a1-4), R a4 and R a5 represent any one of an aliphatic group which may be substituted by halogen, an aromatic group through which one or more divalent elements, halogen, or A combination of monovalent substituents. R a4 and R a5 may be the same or different. As a compound represented by formula (a1-4), difluoropyromellitic dianhydride, dichloropyromellitic dianhydride, and the like can also be used.

作為用以得到於分子構造內含有氟之含氟聚醯亞胺的四羧酸二酐,例如可列舉(三氟甲基)均苯四甲酸二酐、二(三氟甲基)均苯四甲酸二酐、二(七氟丙基)均苯四甲酸二酐、五氟乙基均苯四甲酸二酐、雙{3,5-二(三氟甲基)苯氧基}均苯四甲酸二酐、2,2-雙(3,4-二羧基苯基)六氟丙烷二酐、5,5’-雙(三氟甲基)-3,3’,4,4’-四羧基聯苯基二酐、2,2’,5,5’-肆(三氟甲基)-3,3’,4,4’-四羧基聯苯基二酐、5,5’-雙(三氟甲基)-3,3’,4,4’-四羧基二苯基醚二酐、5,5’-雙(三氟甲基)-3,3’,4,4’-四羧基二苯基甲酮二酐、雙{(三氟甲基)二羧基苯氧基}苯二酐、雙{(三氟甲基)二羧基苯氧基}(三氟甲基)苯二酐、雙(二羧基苯氧基)(三氟甲基)苯二酐、雙(二羧基苯氧基)雙(三氟甲基)苯二酐、雙(二羧基苯氧基)肆(三氟甲基)苯二酐、2,2-雙{4-(3,4-二羧基苯氧基)苯基}六氟丙烷二酐、雙{(三氟甲基)二羧基苯氧基}聯苯基二酐、雙{(三氟甲基)二羧基苯氧基}雙(三氟甲基)聯苯基二酐、雙{(三氟甲基)二羧基苯氧基}二苯基醚二酐、雙(二羧基苯氧基)雙(三氟甲基)聯苯基二酐、二氟均苯四甲酸二酐、1,4-雙(3,4-二羧基三氟苯氧基)四氟苯二酐、1,4-雙(3,4-二羧基三氟苯氧基)八氟聯苯基二酐等。Examples of tetracarboxylic dianhydrides used to obtain fluorine-containing polyimides containing fluorine in their molecular structure include (trifluoromethyl)pyromellitic dianhydride, bis(trifluoromethyl)pyromellitic Formic dianhydride, bis(heptafluoropropyl)pyromellitic dianhydride, pentafluoroethylpyromellitic dianhydride, bis{3,5-bis(trifluoromethyl)phenoxy}pyromellitic acid Dianhydride, 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride, 5,5'-bis(trifluoromethyl)-3,3',4,4'-tetracarboxybis Phenyl dianhydride, 2,2',5,5'-tetra(trifluoromethyl)-3,3',4,4'-tetracarboxybiphenyl dianhydride, 5,5'-bis(trifluoromethyl) Methyl)-3,3',4,4'-tetracarboxydiphenyl ether dianhydride, 5,5'-bis(trifluoromethyl)-3,3',4,4'-tetracarboxydiphenyl Methyl ketone dianhydride, bis{(trifluoromethyl)dicarboxyphenoxy}phthalic anhydride, bis{(trifluoromethyl)dicarboxyphenoxy}(trifluoromethyl)phthalic anhydride, bis( Dicarboxyphenoxy)(trifluoromethyl)phthalic anhydride, bis(dicarboxyphenoxy)bis(trifluoromethyl)phthalic anhydride, bis(dicarboxyphenoxy)tetra(trifluoromethyl) Phthalic anhydride, 2,2-bis{4-(3,4-dicarboxyphenoxy)phenyl}hexafluoropropane dianhydride, bis{(trifluoromethyl)dicarboxyphenoxy}biphenyl anhydride, bis{(trifluoromethyl)dicarboxyphenoxy}bis(trifluoromethyl)biphenyl dianhydride, bis{(trifluoromethyl)dicarboxyphenoxy}diphenylether dianhydride, Bis(dicarboxyphenoxy)bis(trifluoromethyl)biphenyl dianhydride, difluoropyromellitic dianhydride, 1,4-bis(3,4-dicarboxytrifluorophenoxy)tetrafluoro Phthalic anhydride, 1,4-bis(3,4-dicarboxytrifluorophenoxy)octafluorobiphenyldianhydride, etc.

四羧酸二酐可與二羧酸酐併用。併用此等之羧酸酐時,有使得所得之聚醯亞胺樹脂等之含有醯亞胺環之聚合物的特性進一步變良好的情況。作為二羧酸酐,例如可列舉馬來酸酐、琥珀酸酐、衣康酸酐、鄰苯二甲酸酐、四氫鄰苯二甲酸酐、六氫鄰苯二甲酸酐、甲基內亞甲基四氫鄰苯二甲酸酐、氯菌酸酐、甲基四氫鄰苯二甲酸酐、戊二酸酐、cis-4-環已烯-1,2-二羧酸酐等。Tetracarboxylic dianhydride and dicarboxylic anhydride can be used together. When these carboxylic anhydrides are used in combination, the properties of the obtained imide ring-containing polymer such as polyimide resin may be further improved. Examples of dicarboxylic anhydrides include maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylendomethylene tetrahydrophthalic anhydride, Phthalic anhydride, chlorendic anhydride, methyltetrahydrophthalic anhydride, glutaric anhydride, cis-4-cyclohexene-1,2-dicarboxylic anhydride, etc.

[二胺化合物] 二胺化合物通常可以使用下述式(a3-1)表示之化合物。二胺化合物可1種單獨使用,亦可組合2種以上使用。 (式(a3-1)中,A 2表示2價的有機基)。 [Diamine Compound] As a diamine compound, generally, a compound represented by the following formula (a3-1) can be used. A diamine compound may be used individually by 1 type, and may use it in combination of 2 or more types. (In the formula (a3-1), A 2 represents a divalent organic group).

式(a3-1)中,A 2為2價的有機基,除了在式(a3-1)之2個胺基之外,可具有1個或複數個取代基。 作為取代基的合適之例,較佳為氟原子、碳原子數1以上6以下之烷基、碳原子數1以上6以下之烷氧基、碳原子數1以上6以下之氟化烷基、碳原子數1以上6以下之氟化烷氧基或羥基。 取代基為氟化烷基或氟化烷氧基時,較佳為全氟烷基或全氟烷氧基。 In formula (a3-1), A 2 is a divalent organic group, which may have one or more substituents in addition to the two amino groups in formula (a3-1). Suitable examples of substituents are preferably fluorine atoms, alkyl groups having 1 to 6 carbon atoms, alkoxy groups having 1 to 6 carbon atoms, fluorinated alkyl groups having 1 to 6 carbon atoms, A fluorinated alkoxy group or hydroxyl group having 1 to 6 carbon atoms. When the substituent is a fluorinated alkyl group or a fluorinated alkoxy group, it is preferably a perfluoroalkyl group or a perfluoroalkoxy group.

式(a3-1)中,作為A 2之有機基的碳原子數的下限值較佳為2,更佳為6,作為上限值,較佳為50,更佳為30。 A 2雖可為脂肪族基,但較佳為包含1個以上之芳香環的有機基。 A 2為包含1個以上之芳香環的有機基時,該有機基亦可為1個之芳香族基本身,亦可為2個以上之芳香族基透過脂肪族烴基及鹵素化脂肪族烴基,或氧原子、硫原子及氮原子等之包含雜原子之鍵結而鍵結之基。作為A 2所包含之氧原子、硫原子及氮原子等之包含雜原子之鍵結,可列舉-CONH-、-NH-、-N=N-、-CH=N-、-COO-、-O-、-CO-、 -SO-、-SO 2-、-S-及-S-S-等,較佳為-O-、-CO-、-SO-、 -SO 2-、-S-及-S-S-。 與A 2中之胺基鍵結之芳香環較佳為苯環。與A 2中之胺基鍵結之環為包含2以上之環的縮合環時,較佳為與該縮合環中之胺基鍵結之環為苯環。 又,A 2所包含之芳香環,亦可為芳香族雜環。 由於容易得到機械特性優異之聚醯胺樹脂,作為二胺化合物,較佳為後述之芳香族二胺化合物(A2)。 In formula (a3-1), the lower limit of the number of carbon atoms in the organic group of A2 is preferably 2, more preferably 6, and the upper limit is preferably 50, more preferably 30. A 2 may be an aliphatic group, but is preferably an organic group including one or more aromatic rings. When A2 is an organic group containing one or more aromatic rings, the organic group may be one aromatic group itself, or two or more aromatic groups through an aliphatic hydrocarbon group or a halogenated aliphatic hydrocarbon group, Or a bonded group including a bond of a heteroatom such as an oxygen atom, a sulfur atom, or a nitrogen atom. Bonds including heteroatoms such as oxygen atoms, sulfur atoms, and nitrogen atoms included in A2 include -CONH-, -NH-, -N=N-, -CH=N-, -COO-, - O-, -CO-, -SO-, -SO 2 -, -S- and -SS-, etc., preferably -O-, -CO-, -SO-, -SO 2 -, -S- and - SS-. The aromatic ring bonded to the amine group in A2 is preferably a benzene ring. When the ring bonded to the amino group in A2 is a condensed ring containing two or more rings, it is preferable that the ring bonded to the amino group in the condensed ring is a benzene ring. In addition, the aromatic ring included in A2 may be an aromatic heterocyclic ring. Since it is easy to obtain a polyamide resin excellent in mechanical properties, the diamine compound is preferably an aromatic diamine compound (A2) described later.

(芳香族二胺化合物(A2)) 作為芳香族二胺化合物(A2),自以往,即可無特別限制使用被使用在聚醯亞胺樹脂的製造之具有芳香族基之二胺化合物。於此,將2個胺基皆鍵結在芳香族基之二胺化合物定為芳香族二胺化合物(A2)。 (Aromatic diamine compound (A2)) As the aromatic diamine compound (A2), a diamine compound having an aromatic group that has been conventionally used in the production of polyimide resins can be used without particular limitation. Here, the diamine compound whose two amine groups are all bonded to an aromatic group is defined as an aromatic diamine compound (A2).

作為芳香族二胺化合物(A2),可列舉以前述之式(a3-1)表示,A 2為包含芳香族基之2價的有機基的化合物。此情況下,作為A 2之有機基,除了在式(a3-1)之2個胺基之外,可具有1個或複數個取代基。又,此情況下,作為A 2之有機基的碳原子數的下限值較佳為6,作為碳原子數的上限值,較佳為50,更佳為30。 Examples of the aromatic diamine compound (A2) include compounds represented by the aforementioned formula (a3-1), wherein A2 is a divalent organic group containing an aromatic group. In this case, the organic group of A2 may have one or more substituents in addition to the two amino groups in the formula (a3-1). Also, in this case, the lower limit of the number of carbon atoms in the organic group of A2 is preferably 6, and the upper limit of the number of carbon atoms is preferably 50, more preferably 30.

作為包含作為A 2之芳香族基的有機基可具有之取代基的合適之例,較佳為氟原子、碳原子數1以上6以下之烷基、碳原子數1以上6以下之烷氧基、碳原子數1以上6以下之氟化烷基、碳原子數1以上6以下之氟化烷氧基或羥基。 取代基為氟化烷基或氟化烷氧基時,較佳為全氟烷基或全氟烷氧基。 As suitable examples of the substituent that the organic group including the aromatic group as A2 may have, a fluorine atom, an alkyl group having 1 to 6 carbon atoms, and an alkoxy group having 1 to 6 carbon atoms are preferable. , A fluorinated alkyl group having 1 to 6 carbon atoms, a fluorinated alkoxy group or a hydroxyl group having 1 to 6 carbon atoms. When the substituent is a fluorinated alkyl group or a fluorinated alkoxy group, it is preferably a perfluoroalkyl group or a perfluoroalkoxy group.

包含作為A 2之芳香族基的有機基,可為芳香族基本身,亦可為2個以上之芳香族基透過脂肪族烴基及鹵素化脂肪族烴基,或包含氧原子、硫原子及氮原子等之雜原子的鍵結而鍵結之基。作為A 2所包含之包含氧原子、硫原子及氮原子等之雜原子的鍵結,可列舉-CONH-、-NH-、-N=N-、-CH=N-、-COO-、-O-、-CO-、-SO-、-SO 2-、-S-及-S-S-等,較佳為-O-、-CO-、-SO-、-SO 2-、-S-及-S-S-。 An organic group containing an aromatic group as A2 may be an aromatic group itself, or two or more aromatic groups through an aliphatic hydrocarbon group or a halogenated aliphatic hydrocarbon group, or may contain an oxygen atom, a sulfur atom, and a nitrogen atom The bonded base of the bonded heteroatoms. Examples of bonds of heteroatoms including oxygen atoms, sulfur atoms, and nitrogen atoms included in A2 include -CONH-, -NH-, -N=N-, -CH=N-, -COO-, - O-, -CO-, -SO-, -SO 2 -, -S- and -SS-, etc., preferably -O-, -CO-, -SO-, -SO 2 -, -S- and - SS-.

與A 2中之胺基鍵結之芳香環較佳為苯環。與A 2中之胺基鍵結之環為包含2以上之環的縮合環時,較佳為與該縮合環中之胺基鍵結之環為苯環。 又,A 2所包含之芳香環,亦可為芳香族雜環。 The aromatic ring bonded to the amine group in A2 is preferably a benzene ring. When the ring bonded to the amino group in A2 is a condensed ring containing two or more rings, it is preferable that the ring bonded to the amino group in the condensed ring is a benzene ring. In addition, the aromatic ring included in A2 may be an aromatic heterocyclic ring.

A 2為包含芳香族環之有機基時,從使用塗料組成物所形成之硬化物之耐熱性的點來看,較佳為芳香族二胺化合物(A2)為下述式(21)~(24)表示之化合物當中之至少1種。 (式(21)~(24)中,R 111表示選自由氫原子、氟原子、羥基、碳原子數1以上4以下之烷基及碳原子數1以上4以下之鹵素化烷基所構成之群組中之1種。式(24)中,Q表示9,9’-亞茀基,或選自由式:-C 6H 4-、-CONH-C 6H 4-NHCO-、-NHCO-C 6H 4-CONH-、-O-C 6H 4-CO-C 6H 4-O-、 -OCO-C 6H 4-COO-、-OCO-C 6H 4-C 6H 4-COO-、-OCO-、-O-、-S-、-CO-、-CONH-、-SO 2-、-C(CF 3) 2-、-C(CH 3) 2-、-CH 2-、-O-C 6H 4-C(CH 3) 2-C 6H 4-O-、-O-C 6H 4-C(CF 3) 2-C 6H 4-O-、 -O-C 6H 4-SO 2-C 6H 4-O-、-C(CH 3) 2-C 6H 4-C(CH 3) 2-、-O-C 10H 6-O-、-O-C 6H 4-C 6H 4-O-及-O-C 6H 4-O-表示之基所構成之群組中之1種。 在Q之例示中,-C 6H 4-為伸苯基,較佳為m-伸苯基及p-伸苯基,更佳為p-伸苯基。又,-C 10H 6-為萘二基,較佳為萘-1,2-二基、萘-1,4-二基、萘-2,3-二基、萘-2,6-二基及萘-2,7-二基,更佳為萘-1,4-二基及萘-2,6-二基)。 When A2 is an organic group containing an aromatic ring, it is preferable that the aromatic diamine compound (A2) has the following formulas (21) to ( 24) At least one of the compounds represented. (In the formulas (21) to (24), R 111 represents a group consisting of a hydrogen atom, a fluorine atom, a hydroxyl group, an alkyl group with 1 to 4 carbon atoms, and a halogenated alkyl group with 1 to 4 carbon atoms. One of the group. In formula (24), Q represents 9,9'-fenylene, or is selected from the formula: -C 6 H 4 -, -CONH-C 6 H 4 -NHCO-, -NHCO- C 6 H 4 -CONH-, -OC 6 H 4 -CO-C 6 H 4 -O-, -OCO-C 6 H 4 -COO-, -OCO-C 6 H 4 -C 6 H 4 -COO- , -OCO-, -O-, -S-, -CO-, -CONH-, -SO 2 -, -C(CF 3 ) 2 -, -C(CH 3 ) 2 -, -CH 2 -, - OC 6 H 4 -C(CH 3 ) 2 -C 6 H 4 -O-, -OC 6 H 4 -C(CF 3 ) 2 -C 6 H 4 -O-, -OC 6 H 4 -SO 2 - C 6 H 4 -O-, -C(CH 3 ) 2 -C 6 H 4 -C(CH 3 ) 2 -, -OC 10 H 6 -O-, -OC 6 H 4 -C 6 H 4 -O One of the groups represented by - and -OC 6 H 4 -O-. In the example of Q, -C 6 H 4 - is a phenylene group, preferably m-phenylene group and p - Phenylylene, more preferably p-phenylene. Also, -C 10 H 6 - is naphthalene diyl, preferably naphthalene-1,2-diyl, naphthalene-1,4-diyl, naphthalene- 2,3-diyl, naphthalene-2,6-diyl and naphthalene-2,7-diyl, more preferably naphthalene-1,4-diyl and naphthalene-2,6-diyl).

作為式(21)~(24)中之R 111,從所形成之聚醯亞胺樹脂之耐熱性的觀點來看,更佳為氫原子、羥基、氟原子、甲基、乙基或三氟甲基,特佳為氫原子、羥基或三氟甲基。 R 111 in the formulas (21) to (24) is more preferably a hydrogen atom, a hydroxyl group, a fluorine atom, a methyl group, an ethyl group or a trifluoro group from the viewpoint of heat resistance of the formed polyimide resin A methyl group is particularly preferably a hydrogen atom, a hydroxyl group or a trifluoromethyl group.

作為式(24)中之Q,從所形成之聚醯亞胺樹脂之耐熱性的點來看,較佳為9,9’-亞茀基、-O-C 6H 4-O-、-C(CF 3) 2-、-O-、-C(CH 3) 2-、-CH 2-或-O-C 6H 4-C(CH 3) 2-C 6H 4-O-、-CONH-,更佳為-CONH-、-O-C 6H 4-O-、 -C(CF 3) 2-或-O-,特佳為-CONH-。 As Q in the formula (24), from the viewpoint of the heat resistance of the polyimide resin to be formed, 9,9'-berylene, -OC 6 H 4 -O-, -C( CF 3 ) 2 -, -O-, -C(CH 3 ) 2 -, -CH 2 - or -OC 6 H 4 -C(CH 3 ) 2 -C 6 H 4 -O-, -CONH-, more Preferably it is -CONH-, -OC 6 H 4 -O-, -C(CF 3 ) 2 - or -O-, particularly preferably -CONH-.

作為式(a3-1)表示之芳香族二胺化合物,可適合使用以下所示之化合物。 亦即,作為芳香族二胺化合物(A2),可列舉p-苯二胺、m-苯二胺、2,4-二胺基甲苯、4,4’-二胺基聯苯基、4,4’-二胺基-2,2’-雙(三氟甲基)聯苯基、3,3’-二胺基二苯基碸、4,4’-二胺基二苯基碸、4,4’-二胺基二苯基硫化物、4,4’-二胺基二苯基甲烷、4,4’-二胺基二苯基醚、3,4’-二胺基二苯基醚、3,3’-二胺基二苯基醚、4,4’-二胺基苯甲醯苯胺、3,3’-二胺基苯甲醯苯胺、1,4-雙(4-胺基苯氧基)苯、1,3-雙(4-胺基苯氧基)苯、1,3-雙(3-胺基苯氧基)苯、4,4’-雙(4-胺基苯氧基)聯苯基、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(3-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2-雙[4-(4-胺基苯氧基)苯基]六氟丙烷、9,9-雙(4-胺基苯基)茀、9,9-雙(4-胺基-3-甲基苯基)茀及4,4’-[1,4-伸苯基雙(1-甲基乙烷-1,1-二基)]二苯胺等。此等當中,從價格、取得容易性等來看,較佳為p-苯二胺、m-苯二胺、2,4-二胺基甲苯、4,4’-二胺基二苯基醚及4,4’-二胺基苯甲醯苯胺。 As the aromatic diamine compound represented by formula (a3-1), the compounds shown below can be suitably used. That is, examples of the aromatic diamine compound (A2) include p-phenylenediamine, m-phenylenediamine, 2,4-diaminotoluene, 4,4'-diaminobiphenyl, 4, 4'-Diamino-2,2'-bis(trifluoromethyl)biphenyl, 3,3'-diaminodiphenyl, 4,4'-diaminodiphenyl, 4 ,4'-Diaminodiphenyl sulfide, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl ether, 4,4'-diaminobenzanilide, 3,3'-diaminobenzaniline, 1,4-bis(4-amine phenoxy)benzene, 1,3-bis(4-aminophenoxy)benzene, 1,3-bis(3-aminophenoxy)benzene, 4,4'-bis(4-aminophenoxy)benzene Phenoxy)biphenyl, bis[4-(4-aminophenoxy)phenyl]pyridine, bis[4-(3-aminophenoxy)phenyl]pyridine, 2,2-bis[ 4-(4-aminophenoxy)phenyl]propane, 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, 9,9-bis(4-amino Phenyl) fluorene, 9,9-bis(4-amino-3-methylphenyl) fluorene and 4,4'-[1,4-phenylene bis(1-methylethane-1,1 -diyl)] diphenylamine and the like. Among these, p-phenylenediamine, m-phenylenediamine, 2,4-diaminotoluene, and 4,4'-diaminodiphenyl ether are preferable in terms of price and availability. and 4,4'-diaminobenzamide aniline.

芳香族二胺化合物(A2)較佳為下述式(25)表示之化合物。 (式(25)中,Ar 1及Ar 2分別獨立為碳原子數6以上18以下之芳香族烴基,R 112為氫原子或1價的有機基)。 The aromatic diamine compound (A2) is preferably a compound represented by the following formula (25). (In formula (25), Ar 1 and Ar 2 are each independently an aromatic hydrocarbon group having 6 to 18 carbon atoms, and R 112 is a hydrogen atom or a monovalent organic group).

作為式(25)表示之芳香族二胺化合物(A2)之具體例,可列舉2,4-雙(4-胺基苯胺基)-1,3,5-三𠯤、2,4-雙(4-胺基苯胺基)-6-甲基-1,3,5-三𠯤、2,4-雙(4-胺基苯胺基)-6-乙基-1,3,5-三𠯤、2,4-雙(4-胺基苯胺基)-6-苯基-1,3,5-三𠯤、2,4-雙(4-胺基苯胺基)-6-胺基-1,3,5-三𠯤、2,4-雙(4-胺基苯胺基)-6-甲基胺基-1,3,5-三𠯤、2,4-雙(4-胺基苯胺基)-6-二甲基胺基-1,3,5-三𠯤、2,4-雙(4-胺基苯胺基)-6-乙基胺基-1,3,5-三𠯤、2,4-雙(4-胺基苯胺基)-6-二乙基胺基-1,3,5-三𠯤、2,4-雙(4-胺基苯胺基)-6-苯胺基-1,3,5-三𠯤及2,4-雙(4-胺基苯胺基)-6-二苯基胺基-1,3,5-三𠯤等。 此等當中,較佳為2,4-雙(4-胺基苯胺基)-6-胺基-1,3,5-三𠯤、2,4-雙(4-胺基苯胺基)-6-甲基胺基-1,3,5-三𠯤、2,4-雙(4-胺基苯胺基)-6-乙基胺基-1,3,5-三𠯤及2,4-雙(4-胺基苯胺基)-6-苯胺基-1,3,5-三𠯤,更佳為2,4-雙(4-胺基苯胺基)-6-苯胺基-1,3,5-三𠯤。 Specific examples of the aromatic diamine compound (A2) represented by the formula (25) include 2,4-bis(4-aminoanilino)-1,3,5-trisalpine, 2,4-bis( 4-aminoanilino)-6-methyl-1,3,5-trimethanone, 2,4-bis(4-aminoanilino)-6-ethyl-1,3,5-trimethanone, 2,4-bis(4-aminoanilino)-6-phenyl-1,3,5-trimethanone, 2,4-bis(4-aminoanilino)-6-amino-1,3 ,5-Trisalpine, 2,4-bis(4-aminoanilino)-6-methylamino-1,3,5-trithiol, 2,4-bis(4-aminoanilino)- 6-Dimethylamino-1,3,5-trimethanol, 2,4-bis(4-aminoanilino)-6-ethylamino-1,3,5-trimethanol, 2,4 -Bis(4-aminoanilino)-6-diethylamino-1,3,5-trimethanone, 2,4-bis(4-aminoanilino)-6-anilino-1,3 , 5-three 𠯤 and 2,4-bis(4-aminoanilino)-6-diphenylamino-1,3,5-tris 𠯤 and so on. Among these, 2,4-bis(4-aminoanilino)-6-amino-1,3,5-trimethanone, 2,4-bis(4-aminoanilino)-6 -Methylamino-1,3,5-tri-methanol, 2,4-bis(4-aminoanilino)-6-ethylamino-1,3,5-tri-methanol and 2,4-bis (4-Aminoanilino)-6-anilino-1,3,5-trisulfone, more preferably 2,4-bis(4-aminoanilino)-6-anilino-1,3,5 -Three 𠯤.

[聚醯胺酸(A)之製造方法] 聚醯胺酸(A)可藉由例如將四羧酸二酐及二胺化合物於有機溶媒中聚合獲得。 聚醯胺酸(A)之合成方法只要可製造重量平均分子量為20,000以上之聚醯胺酸(A),則並未特別限定。 [Manufacturing method of polyamide acid (A)] The polyamic acid (A) can be obtained by, for example, polymerizing tetracarboxylic dianhydride and a diamine compound in an organic solvent. The method for synthesizing polyamic acid (A) is not particularly limited as long as polyamic acid (A) having a weight average molecular weight of 20,000 or more can be produced.

作為聚醯胺酸(A)之較佳的合成方法,可列舉於有機溶媒中,於後述之咪唑化合物(B)的存在下,使四羧酸二酐、與二胺化合物聚合,而生成聚醯胺酸(A)之方法。有機溶媒可單獨或混合2種以上使用。As a preferred synthesis method of polyamic acid (A), it can be mentioned that tetracarboxylic dianhydride and diamine compound are polymerized in an organic solvent in the presence of the imidazole compound (B) described later to form a polyamic acid dianhydride. Method for Amino Acid (A). An organic solvent can be used individually or in mixture of 2 or more types.

於咪唑化合物(B)的存在下,藉由使四羧酸二酐、與二胺化合物聚合,容易得到分子量高之聚醯胺酸(A)。 於咪唑化合物(B)的存在下,使四羧酸二酐、與二胺化合物聚合時,作為有機溶媒,較佳為後述之溶媒(S)。 於後述之溶媒(S)中,藉由於咪唑化合物(B)的存在下,聚合四羧酸二酐、與二胺化合物,容易得到尤其是分子量高之聚醯胺酸(A)。 將四羧酸二酐、與二胺化合物於咪唑化合物(B)的存在下聚合時,咪唑化合物(B)的使用量相對於四羧酸二酐1莫耳,較佳為0.01莫耳以上0.30莫耳以下,更佳為0.02莫耳以上0.15莫耳以下。 In the presence of the imidazole compound (B), by polymerizing the tetracarboxylic dianhydride and the diamine compound, it is easy to obtain the polyamic acid (A) with high molecular weight. When polymerizing a tetracarboxylic dianhydride and a diamine compound in the presence of an imidazole compound (B), as an organic solvent, the solvent (S) mentioned later is preferable. In the solvent (S) described later, by polymerizing tetracarboxylic dianhydride and diamine compound in the presence of imidazole compound (B), polyamic acid (A) with especially high molecular weight can be easily obtained. When tetracarboxylic dianhydride and diamine compound are polymerized in the presence of imidazole compound (B), the usage amount of imidazole compound (B) is preferably 0.01 mol or more and 0.30 mol to 1 mol of tetracarboxylic dianhydride. Mole or less, more preferably 0.02 mole or more and 0.15 mole or less.

可作為後述之溶媒(S)使用之有機溶媒當中,較佳為N-甲基-2-吡咯烷酮、N,N-二甲基乙醯胺、N,N-二乙基乙醯胺、N,N-二甲基甲醯胺、N,N-二乙基甲醯胺及N-甲基己內醯胺等之含氮極性溶媒;二甲基亞碸;乙腈;二乙二醇二甲基醚、二乙二醇二乙基醚、二噁烷及四氫呋喃等之醚類作為上述之聚合反應所使用之溶媒。Among the organic solvents that can be used as the solvent (S) described later, N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-diethylacetamide, N, Nitrogen-containing polar solvents such as N-dimethylformamide, N,N-diethylformamide and N-methylcaprolactam; dimethylsulfoxide; acetonitrile; diethylene glycol dimethyl Ether, diethylene glycol diethyl ether, ethers such as dioxane and tetrahydrofuran are used as the solvent used in the above polymerization reaction.

合成聚醯胺酸(A)時之四羧酸二酐及二胺化合物的使用量並未特別限定。相對於四羧酸二酐1莫耳,較佳為使用二胺化合物0.50莫耳以上1.50莫耳以下,更佳為使用0.60莫耳以上1.30莫耳以下,特佳為使用0.70莫耳以上1.20莫耳以下。 係如前述,聚醯胺酸(A)的重量平均分子量為20,000以上,較佳為5,000以上100,000以下,更佳為10,000以上75,000以下。 重量平均分子量若調整四羧酸二酐與二胺化合物的摻合量或溶媒或反應溫度等之反應條件,定為上述之值即可。 The usage-amount of tetracarboxylic dianhydride and a diamine compound at the time of synthesizing a polyamic acid (A) is not specifically limited. With respect to 1 mol of tetracarboxylic dianhydride, it is preferable to use 0.50 mol to 1.50 mol of diamine compound, more preferably to use 0.60 mol to 1.30 mol, and particularly preferably to use 0.70 mol to 1.20 mol below the ears. As mentioned above, the weight average molecular weight of the polyamic acid (A) is not less than 20,000, preferably not less than 5,000 and not more than 100,000, more preferably not less than 10,000 and not more than 75,000. The weight average molecular weight may be set to the above value by adjusting the compounding quantity of tetracarboxylic dianhydride and diamine compound, the reaction conditions, such as a solvent, and reaction temperature.

使四羧酸二酐、與二胺化合物反應時之溫度只要反應能良好地進行,則並未特別限定。通常而言,四羧酸二酐、與二胺化合物的反應溫度,較佳為-5℃以上150℃以下,更佳為0℃以上120℃以下,特佳為0℃以上70℃以下。使四羧酸二酐、與二胺化合物反應之時間雖藉由反應溫度而成為相異,但通常而言,較佳為1小時以上50小時以下,更佳為2小時以上40小時以下,特佳為5小時以上30小時以下。The temperature at the time of making tetracarboxylic dianhydride and a diamine compound react will not be specifically limited as long as reaction progresses favorably. Generally speaking, the reaction temperature between tetracarboxylic dianhydride and diamine compound is preferably from -5°C to 150°C, more preferably from 0°C to 120°C, particularly preferably from 0°C to 70°C. The time for reacting the tetracarboxylic dianhydride and the diamine compound varies depending on the reaction temperature, but generally, it is preferably from 1 hour to 50 hours, more preferably from 2 hours to 40 hours, especially Preferably, it is not less than 5 hours and not more than 30 hours.

藉由以上說明之方法,而得到包含聚醯胺酸(A)之溶液。 藉由於後述之溶媒(S)中進行聚合反應,可直接將如上述進行所得之包含聚醯胺酸(A)之溶液作為塗料組成物使用,或亦可使用在塗料組成物的調製。將如上述進行所得之包含聚醯胺酸(A)之溶液於減壓下,於不會產生對聚醯胺酸(A)之聚醯亞胺樹脂的變換程度的低溫,亦可將從聚醯胺酸(A)之溶液去除溶劑的至少一部分所得之聚醯胺酸(A)之糊料或固體使用在塗料組成物的調製。 By the method explained above, the solution containing polyamide acid (A) was obtained. By carrying out the polymerization reaction in the solvent (S) described later, the solution containing polyamic acid (A) obtained as above can be directly used as a coating composition, or can also be used in the preparation of a coating composition. The solution containing polyamic acid (A) obtained as described above is under reduced pressure, and at a low temperature that does not produce the degree of transformation of the polyimide resin of polyamic acid (A), it is also possible to obtain the solution from polyamic acid (A). The paste or solid of the polyamic acid (A) obtained by removing at least a part of the solvent from the solution of the amide acid (A) is used in the preparation of a paint composition.

在塗料組成物之聚醯胺酸(A)的含量可考量塗料組成物的塗佈性或對聚醯胺酸(A)之溶媒(S)的溶解性等適當決定。通常而言,在塗料組成物之聚醯胺酸(A)的含量相對於塗料組成物的質量,較佳為5質量%以上45質量%以下,更佳為7質量%以上40質量%以下,再更佳為10質量%以上30質量%以下。The content of the polyamic acid (A) in the paint composition can be appropriately determined in consideration of the coatability of the paint composition or the solubility to the solvent (S) of the polyamic acid (A). Generally speaking, the content of the polyamic acid (A) in the coating composition is preferably not less than 5 mass % and not more than 45 mass %, more preferably not less than 7 mass % and not more than 40 mass %, relative to the mass of the coating composition, More preferably, it is 10 mass % or more and 30 mass % or less.

<咪唑化合物(B)> 塗料組成物作為咪唑化合物(B),係包含下述式(1)表示之化合物。塗料組成物藉由組合重量平均分子量為20,000以上之聚醯胺酸(A)、與咪唑化合物(B)、與尿素系溶媒(S1)的含量為0質量%以上10質量%以下的溶媒(S)包含,使用塗料組成物,可形成著色少,且機械特性優異之聚醯亞胺樹脂。 <Imidazole compound (B)> The paint composition contains a compound represented by the following formula (1) as the imidazole compound (B). The paint composition is made by combining polyamic acid (A) with a weight average molecular weight of 20,000 or more, imidazole compound (B), and urea-based solvent (S1) with a content of 0% by mass to 10% by mass (S1). ) includes, the use of the paint composition can form a polyimide resin with less coloring and excellent mechanical properties.

(式(1)中,R 1為氫原子或烷基,R 2為可具有取代基之芳香族基,R 3為可具有取代基之伸烷基,R 4分別獨立為鹵素原子、羥基、巰基、硫化物基、矽烷基、矽烷醇基、硝基、亞硝基、磺酸根基、膦基、氧膦基、膦酸根基或有機基,n為0以上3以下之整數)。 (In formula (1), R 1 is a hydrogen atom or an alkyl group, R 2 is an aromatic group that may have a substituent, R 3 is an alkylene group that may have a substituent, and R 4 is independently a halogen atom, a hydroxyl group, Mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfonate group, phosphine group, phosphinyl group, phosphonate group or organic group, n is an integer ranging from 0 to 3).

式(1)中,R 1為氫原子或烷基。R 1為烷基時,該烷基亦可為直鏈烷基,亦可為分枝鏈烷基。該烷基之碳原子數雖並未特別限定,但較佳為1以上20以下,更佳為1以上10以下,再更佳為1以上5以下。 In formula (1), R 1 is a hydrogen atom or an alkyl group. When R 1 is an alkyl group, the alkyl group can also be a straight-chain alkyl group or a branched-chain alkyl group. The number of carbon atoms in the alkyl group is not particularly limited, but is preferably from 1 to 20, more preferably from 1 to 10, and still more preferably from 1 to 5.

作為適合作為R 1的烷基之具體例,可列舉甲基、乙基、n-丙基、異丙基、n-丁基、異丁基、sec-丁基、tert-丁基、n-戊基、異戊基、tert-戊基、n-己基、n-庚基、n-辛基、2-乙基-n-己基、n-壬基、n-癸基、n-十一烷基、n-十二烷基、n-十三烷基、n-十四烷基、n-十五烷基、n-十六烷基、n-十七烷基、n-十八烷基、n-十九烷基及n二十烷基。 Specific examples of alkyl groups suitable as R include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n- Pentyl, isopentyl, tert-pentyl, n-hexyl, n-heptyl, n-octyl, 2-ethyl-n-hexyl, n-nonyl, n-decyl, n-undecyl base, n-dodecyl, n-tridecyl, n-tetradecyl, n-pentadecyl, n-hexadecyl, n-heptadecyl, n-octadecyl , n-nonadecanyl and n-eicosyl.

式(1)中,R 2為可具有取代基之芳香族基。可具有取代基之芳香族基可為可具有取代基之芳香族烴基,亦可為可具有取代基之芳香族雜環基。 In formula (1), R 2 is an aromatic group which may have a substituent. The aromatic group which may have a substituent may be an aromatic hydrocarbon group which may have a substituent, or may be an aromatic heterocyclic group which may have a substituent.

芳香族烴基的種類於未阻礙本發明之目的的範圍,並未特別限定。芳香族烴基,亦可為單環式之芳香族基,亦可為縮合2以上之芳香族烴基而形成之基,亦可為2以上之芳香族烴基藉由單鍵鍵結而形成之基。作為芳香族烴基,較佳為苯基、萘基、聯苯基、蒽基、菲基(Phenanthrenyl)。The type of aromatic hydrocarbon group is not particularly limited within the range that does not hinder the object of the present invention. The aromatic hydrocarbon group may be a monocyclic aromatic group, a group formed by condensing two or more aromatic hydrocarbon groups, or a group formed by bonding two or more aromatic hydrocarbon groups with a single bond. The aromatic hydrocarbon group is preferably phenyl, naphthyl, biphenyl, anthracenyl, or phenanthrenyl.

芳香族雜環基的種類於未阻礙本發明之目的的範圍,並未特別限定。芳香族雜環基,亦可為單環式基,亦可為多環式基。作為芳香族雜環基,較佳為吡啶基、呋喃基、噻吩基、咪唑基、吡唑基、噁唑基、噻唑基、異噁唑基、異噻唑基、苯并噁唑基、苯并噻唑基及苯并咪唑基。The type of aromatic heterocyclic group is not particularly limited insofar as it does not hinder the object of the present invention. The aromatic heterocyclic group may be a monocyclic group or a polycyclic group. The aromatic heterocyclic group is preferably pyridyl, furyl, thienyl, imidazolyl, pyrazolyl, oxazolyl, thiazolyl, isoxazolyl, isothiazolyl, benzoxazolyl, benzo Thiazolyl and benzimidazolyl.

作為苯基、多環芳香族烴基或芳香族雜環基可具有之取代基,可列舉鹵素原子、羥基、巰基、硫化物基、矽烷基、矽烷醇基、硝基、亞硝基、亞磺酸基、磺基、磺酸根基、膦基、氧膦基、膦醯基、膦酸根基、胺基、銨基及有機基。苯基、多環芳香族烴基,或芳香族雜環基具有複數個取代基時,該複數個取代基可為相同,亦可為相異。Examples of substituents that a phenyl group, a polycyclic aromatic hydrocarbon group, or an aromatic heterocyclic group may have include a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, and a sulfinic group. Acid group, sulfo group, sulfonate group, phosphino group, phosphinyl group, phosphono group, phosphonate group, amine group, ammonium group and organic group. When a phenyl group, a polycyclic aromatic hydrocarbon group, or an aromatic heterocyclic group has a plurality of substituents, the plurality of substituents may be the same or different.

芳香族基所具有之取代基為有機基時,作為該有機基,可列舉烷基、烯基、環烷基、環烯基、芳基及芳烷基等。此有機基可於該有機基中包含雜原子等之烴基以外之鍵結或取代基。又,此有機基可為直鏈狀、分枝鏈狀、環狀之任一種。此有機基通常雖為1價,但形成環狀構造的情況等,可成為2價以上之有機基。When the substituent which the aromatic group has is an organic group, an alkyl group, an alkenyl group, a cycloalkyl group, a cycloalkenyl group, an aryl group, an aralkyl group etc. are mentioned as this organic group. This organic group may contain a bond or a substituent other than a hydrocarbon group such as a hetero atom in the organic group. In addition, this organic group may be any of linear, branched and cyclic. This organic group is usually monovalent, but it may be a divalent or higher organic group when forming a ring structure.

於與芳香族基相鄰之碳原子上具有取代基時,鍵結在相鄰之碳原子上之2個取代基可鍵結其而形成環狀構造。作為環狀構造,可列舉脂肪族烴環或包含雜原子之脂肪族環。When there is a substituent on the carbon atom adjacent to the aromatic group, two substituents bonded to the adjacent carbon atom may bond to form a ring structure. As a cyclic structure, an aliphatic hydrocarbon ring or an aliphatic ring containing a heteroatom is mentioned.

芳香族基所具有之取代基為有機基的情況下,該有機基所包含之鍵結只要不損害本發明之效果,並未特別限定,有機基可包含氧原子、氮原子、矽原子等之包含雜原子之鍵結。作為包含雜原子之鍵結之具體例,可列舉醚鍵、硫醚鍵、羰基鍵、硫羰基鍵、酯鍵、醯胺鍵、胺基甲酸酯鍵、醯亞胺鍵(-N=C(-R)-、-C(=NR)-:R表示氫原子或有機基)、碳酸酯鍵、磺醯基鍵、亞磺醯基鍵、偶氮鍵等。When the substituent of the aromatic group is an organic group, the bond included in the organic group is not particularly limited as long as it does not impair the effect of the present invention, and the organic group may contain oxygen atoms, nitrogen atoms, silicon atoms, etc. Contains linkages of heteroatoms. Specific examples of bonds containing heteroatoms include ether bonds, thioether bonds, carbonyl bonds, thiocarbonyl bonds, ester bonds, amide bonds, urethane bonds, and imide bonds (-N=C (-R)-, -C(=NR)-: R represents hydrogen atom or organic group), carbonate bond, sulfonyl bond, sulfinyl bond, azo bond, etc.

作為有機基可具有之包含雜原子之鍵結,從式(1)表示之咪唑化合物之耐熱性的觀點來看,較佳為醚鍵、硫醚鍵、羰基鍵、硫羰基鍵、酯鍵、醯胺鍵、胺基鍵(-NR-:R表示氫原子或1價的有機基)胺基甲酸酯鍵、醯亞胺鍵(-N=C(-R)-、-C(=NR)-:R表示氫原子或1價的有機基)、碳酸酯鍵、磺醯基鍵、亞磺醯基鍵。From the standpoint of the heat resistance of the imidazole compound represented by the formula (1), the bond including a heteroatom that the organic group may have is preferably an ether bond, a thioether bond, a carbonyl bond, a thiocarbonyl bond, an ester bond, Amide bond, amine bond (-NR-: R represents a hydrogen atom or a 1-valent organic group) urethane bond, imide bond (-N=C(-R)-, -C(=NR )-: R represents a hydrogen atom or a monovalent organic group), a carbonate bond, a sulfonyl bond, or a sulfinyl bond.

有機基為烴基以外之取代基時,烴基以外之取代基的種類於不阻礙本發明之目的的範圍並未特別限定。作為烴基以外之取代基之具體例,可列舉鹵素原子、羥基、巰基、硫化物基、氰基、異氰基、氰氧基、異氰酸基、硫氰基、異硫氰基、矽烷基、矽烷醇基、烷氧基、烷氧基羰基、胺基、單烷基胺基、二烷基鋁基、單芳基胺基、二芳基胺基、胺基甲醯基、硫代胺基甲醯基、硝基、亞硝基、羧酸酯基、醯基、醯基氧基、亞磺酸基、磺酸根基、膦基、氧膦基、膦酸根基、烷基醚基、烯基醚基、烷基硫醚基、烯基硫醚基、芳基醚基、芳基硫醚基等。上述取代基所包含之氫原子亦可藉由烴基取代。又,上述取代基所包含之烴基可為直鏈狀、分枝鏈狀及環狀之任一者。When the organic group is a substituent other than a hydrocarbon group, the type of the substituent other than a hydrocarbon group is not particularly limited insofar as it does not hinder the object of the present invention. Specific examples of substituents other than hydrocarbon groups include halogen atoms, hydroxyl groups, mercapto groups, sulfide groups, cyano groups, isocyano groups, cyanoxy groups, isocyanato groups, thiocyano groups, isothiocyano groups, and silyl groups. , silanol, alkoxy, alkoxycarbonyl, amino, monoalkylamino, dialkylaluminum, monoarylamino, diarylamine, aminoformyl, thioamine Formyl group, nitro group, nitroso group, carboxylate group, acyl group, acyloxy group, sulfinate group, sulfonate group, phosphine group, phosphine oxide group, phosphonate group, alkyl ether group, Alkenyl ether group, alkyl sulfide group, alkenyl sulfide group, aryl ether group, aryl sulfide group, etc. Hydrogen atoms contained in the above-mentioned substituents may also be substituted by hydrocarbon groups. Moreover, the hydrocarbon group contained in the said substituent may be any of linear, branched and cyclic.

作為苯基、多環芳香族烴基或芳香族雜環基所具有之取代基,較佳為碳原子數1以上12以下之烷基、碳原子數1以上12以下之芳基、碳原子數1以上12以下之烷氧基、碳原子數1以上12以下之芳基氧基、碳原子數1以上12以下之芳基胺基及鹵素原子。As a substituent of a phenyl group, a polycyclic aromatic hydrocarbon group, or an aromatic heterocyclic group, an alkyl group having 1 to 12 carbon atoms, an aryl group having 1 to 12 carbon atoms, and an aryl group having 1 to 12 carbon atoms are preferable. An alkoxy group having 12 or less carbon atoms, an aryloxy group having 1 or more carbon atoms but not more than 12, an arylamino group having 1 or more carbon atoms and not more than 12, and a halogen atom.

作為R 2,由於可便宜且輕易合成式(1)表示之咪唑化合物,相對於咪唑化合物之水或有機溶劑的溶解性良好,較佳為分別為可具有取代基之苯基、呋喃基、噻吩基。 As R 2 , since the imidazole compound represented by the formula (1) can be synthesized cheaply and easily, and has good solubility in water or organic solvents of the imidazole compound, it is preferably phenyl, furyl, and thiophene, which may have substituents, respectively. base.

式(1)中,R 3為可具有取代基之伸烷基。伸烷基可具有之取代基於未阻礙本發明之目的的範圍,並未特別限定。作為伸烷基可具有之取代基之具體例,可列舉羥基、烷氧基、胺基、氰基及鹵素原子等。伸烷基可為直鏈伸烷基,亦可為分枝鏈伸烷基,較佳為直鏈伸烷基。伸烷基之碳原子數雖並未特別限定,但較佳為1以上20以下,更佳為1以上10以下,再更佳為1以上5以下。尚,伸烷基之碳原子數中,未包含與伸烷基鍵結之取代基之碳原子。 In formula (1), R 3 is an alkylene group which may have a substituent. The substitution which an alkylene group may have is not specifically limited in the range which does not hinder the object of this invention. Specific examples of the substituent that the alkylene group may have include a hydroxyl group, an alkoxy group, an amino group, a cyano group, and a halogen atom. The alkylene group may be a straight chain alkylene group or a branched chain alkylene group, preferably a straight chain alkylene group. The number of carbon atoms in the alkylene group is not particularly limited, but is preferably from 1 to 20, more preferably from 1 to 10, and still more preferably from 1 to 5. Also, the number of carbon atoms in the alkylene group does not include the carbon atoms of the substituent bonded to the alkylene group.

作為與伸烷基鍵結之取代基的烷氧基,亦可為直鏈烷氧基,亦可為分枝鏈烷氧基。作為取代基之烷氧基之碳原子數雖並未特別限定,但較佳為1以上10以下,更佳為1以上6以下,特佳為1以上3以下。The alkoxy group as a substituent bonded to an alkylene group may be a straight-chain alkoxy group or a branched-chain alkoxy group. The number of carbon atoms of the alkoxy group as a substituent is not particularly limited, but is preferably from 1 to 10, more preferably from 1 to 6, and particularly preferably from 1 to 3.

作為與伸烷基鍵結之取代基的胺基,亦可為單烷基胺基或二烷基胺基。單烷基胺基或二烷基胺基所包含之烷基可為直鏈烷基,亦可為分枝鏈烷基。單烷基胺基或二烷基胺基所包含之烷基的碳原子數雖並未特別限定,但較佳為1以上10以下,更佳為1以上6以下,特佳為1以上3以下。The amine group as a substituent bonded to an alkylene group may be a monoalkylamine group or a dialkylamine group. The alkyl group contained in the monoalkylamine group or the dialkylamine group may be a straight-chain alkyl group or a branched-chain alkyl group. Although the number of carbon atoms of the alkyl group contained in the monoalkylamine group or dialkylamine group is not particularly limited, it is preferably from 1 to 10, more preferably from 1 to 6, and particularly preferably from 1 to 3. .

作為適合作為R 3之伸烷基之具體例,可列舉亞甲基、乙烷-1,2-二基、n-丙烷-1,3-二基、n-丙烷-2,2-二基、n-丁烷-1,4-二基、n-戊烷-1,5-二基、n-己烷-1,6-二基、n-庚烷-1,7-二基、n-辛烷-1,8-二基、n-壬烷-1,9-二基、n-癸烷-1,10-二基、n-十一烷-1,11-二基、n-十二烷-1,12-二基、n-十三烷-1,13-二基、n-十四烷-1,14-二基、n-十五烷-1,15-二基、n-十六烷-1,16-二基、n-十七烷-1,17-二基、n-十八烷-1,18-二基、n-十九烷-1,19-二基及n-二十烷-1,20-二基。 Specific examples of alkylene groups suitable for R include methylene, ethane-1,2-diyl, n-propane-1,3-diyl, n-propane-2,2-diyl , n-butane-1,4-diyl, n-pentane-1,5-diyl, n-hexane-1,6-diyl, n-heptane-1,7-diyl, n -octane-1,8-diyl, n-nonane-1,9-diyl, n-decane-1,10-diyl, n-undecane-1,11-diyl, n- Dodecane-1,12-diyl, n-tridecane-1,13-diyl, n-tetradecane-1,14-diyl, n-pentadecane-1,15-diyl, n-hexadecane-1,16-diyl, n-heptadecane-1,17-diyl, n-octadecane-1,18-diyl, n-nonadecane-1,19-diyl and n-eicosane-1,20-diyl.

R 4為鹵素原子、羥基、巰基、硫化物基、矽烷基、矽烷醇基、硝基、亞硝基、磺酸根基、膦基、氧膦基、膦酸根基或有機基,n為0以上3以下之整數。n為2以上3以下之整數時,複數個R 4可分別為相同,亦可為相異。 R4 is a halogen atom, hydroxyl group, mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfonate group, phosphine group, phosphinyl group, phosphonate group or organic group, n is 0 or more An integer of 3 or less. When n is an integer of 2 to 3, the plurality of R 4 may be the same or different.

R 4為有機基時,該有機基對於R 2,亦與芳香族基可作為取代基具有之有機基相同。 When R 4 is an organic group, the organic group is the same as the organic group that an aromatic group may have as a substituent for R 2 .

R 4為有機基時,作為有機基,較佳為烷基、芳香族烴基及芳香族雜環基。作為烷基,較佳為碳原子數1以上8以下之直鏈狀或分枝鏈狀之烷基,更佳為甲基、乙基、n-丙基及異丙基。作為芳香族烴基,較佳為苯基、萘基、聯苯基、蒽基及菲基(Phenanthrenyl),更佳為苯基及萘基,特佳為苯基。作為芳香族雜環基,較佳為吡啶基、呋喃基、噻吩基、咪唑基、吡唑基、噁唑基、噻唑基、異噁唑基、異噻唑基、苯并噁唑基、苯并噻唑基及苯并咪唑基,更佳為呋喃基及噻吩基。 When R 4 is an organic group, the organic group is preferably an alkyl group, an aromatic hydrocarbon group, and an aromatic heterocyclic group. The alkyl group is preferably a linear or branched chain alkyl group having 1 to 8 carbon atoms, more preferably methyl, ethyl, n-propyl and isopropyl. As the aromatic hydrocarbon group, phenyl, naphthyl, biphenyl, anthracenyl and phenanthrenyl are preferred, phenyl and naphthyl are more preferred, and phenyl is particularly preferred. The aromatic heterocyclic group is preferably pyridyl, furyl, thienyl, imidazolyl, pyrazolyl, oxazolyl, thiazolyl, isoxazolyl, isothiazolyl, benzoxazolyl, benzo Thiazolyl and benzimidazolyl, more preferably furyl and thienyl.

R 4為烷基時,於烷基之咪唑環上的鍵結位置係2位、4位、5位之任一者皆較佳,更佳為2位。R 4為芳香族烴基及芳香族雜環基時,於此等之基的咪唑上的鍵結位置較佳為2位。 When R 4 is an alkyl group, the bonding position on the imidazole ring of the alkyl group is preferably any one of the 2-position, 4-position, and 5-position, more preferably the 2-position. When R 4 is an aromatic hydrocarbon group and an aromatic heterocyclic group, the bonding position on the imidazole of these groups is preferably at the 2-position.

上述式(1)表示之咪唑化合物當中,從便宜且可輕易合成,對於水或有機溶劑之溶解性優異的點來看,較佳為下述式(1-1)表示之化合物,更佳為式(1-1)表示,R 3為亞甲基之化合物。 Among the imidazole compounds represented by the above-mentioned formula (1), compounds represented by the following formula (1-1) are preferred, more preferably: Formula (1-1) represents a compound in which R 3 is a methylene group.

(式(1-1)中,R 1、R 3、R 4及n係式(1)相同,R 5、R 6、R 7、R 8及R 9分別獨立為氫原子、鹵素原子、羥基、巰基、硫化物基、矽烷基、矽烷醇基、硝基、亞硝基、亞磺酸基、磺基、磺酸根基、膦基、氧膦基、膦醯基、膦酸根基、胺基、銨基或有機基,惟,R 5、R 6、R 7、R 8及R 9當中,至少一個為氫原子以外之基)。 (In formula (1-1), R 1 , R 3 , R 4 and n are the same as formula (1), R 5 , R 6 , R 7 , R 8 and R 9 are independently hydrogen atom, halogen atom, hydroxyl , mercapto, sulfide, silyl, silanol, nitro, nitroso, sulfinate, sulfo, sulfonate, phosphino, phosphinyl, phosphonyl, phosphonate, amine , ammonium group or organic group, provided that at least one of R 5 , R 6 , R 7 , R 8 and R 9 is a group other than a hydrogen atom).

R 5、R 6、R 7、R 8及R 9為有機基時,該有機基係與在式(1)中之R 2作為取代基具有之有機基相同。R 5、R 6、R 7及R 8從對於咪唑化合物的溶劑(S)之溶解性的點來看,較佳為氫原子。 When R 5 , R 6 , R 7 , R 8 and R 9 are organic groups, the organic groups are the same as those that R 2 in formula (1) has as a substituent. R 5 , R 6 , R 7 and R 8 are preferably hydrogen atoms from the viewpoint of solubility in the solvent (S) of the imidazole compound.

其中,較佳為R 5、R 6、R 7、R 8及R 9當中,至少一個為下述取代基,特佳為R 9為下述取代基。R 9為下述取代基時,較佳為R 5、R 6、R 7及R 8為氫原子。 (R 10為氫原子或有機基)。 Among them, preferably at least one of R 5 , R 6 , R 7 , R 8 and R 9 is the following substituent, particularly preferably R 9 is the following substituent. When R 9 is the following substituent, R 5 , R 6 , R 7 and R 8 are preferably hydrogen atoms. (R 10 is a hydrogen atom or an organic group).

R 10為有機基時,該有機基係與在式(1)之R 2作為取代基具有之有機基相同。作為R 10,較佳為烷基,更佳為碳原子數1以上8以下之烷基,特佳為碳原子數1以上3以下之烷基,最佳為甲基。 When R 10 is an organic group, the organic group is the same as the organic group that R 2 in formula (1) has as a substituent. R 10 is preferably an alkyl group, more preferably an alkyl group having 1 to 8 carbon atoms, particularly preferably an alkyl group having 1 to 3 carbon atoms, most preferably a methyl group.

上述式(1-1)表示之化合物當中,較佳為下述式(1-1-1)表示之化合物。 (在式(1-1-1),R 1、R 4及n係與式(1)相同,R 11、R 12、R 13、R 14及R 15分別獨立為氫原子、羥基、巰基、硫化物基、矽烷基、矽烷醇基、硝基、亞硝基、亞磺酸基、磺基、磺酸根基、膦基、氧膦基、膦醯基、膦酸根基、胺基、銨基或有機基,惟,R 11、R 12、R 13、R 14及R 15當中,至少一個為氫原子以外之基)。 Among the compounds represented by the above formula (1-1), compounds represented by the following formula (1-1-1) are preferred. (In formula (1-1-1), R 1 , R 4 and n are the same as formula (1), R 11 , R 12 , R 13 , R 14 and R 15 are independently hydrogen atom, hydroxyl, mercapto, Sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfinate group, sulfo group, sulfonate group, phosphino group, phosphinyl group, phosphono group, phosphonate group, amine group, ammonium group or an organic group, provided that at least one of R 11 , R 12 , R 13 , R 14 and R 15 is a group other than a hydrogen atom).

式(1-1-1)表示之化合物當中,較佳為R 11、R 12、R 13、R 14及R 15當中,至少一個為前述之-O-R 10表示之基,特佳為R 15為-O-R 10表示之基。R 15為-O-R 10表示之基時,較佳為R 11、R 12、R 13及R 14為氫原子。 Among the compounds represented by formula (1-1-1), at least one of R 11 , R 12 , R 13 , R 14 and R 15 is preferably the group represented by the aforementioned -OR 10 , particularly preferably R 15 is -OR 10 represents the base. When R 15 is a group represented by -OR 10 , R 11 , R 12 , R 13 and R 14 are preferably hydrogen atoms.

上述式(1)表示之咪唑化合物的合成方法並未特別限定。例如可藉由將下述式(I)表示之鹵素含有羧酸衍生物、與下述式(II)表示之咪唑化合物依照常法使其反應,進行咪唑基化,合成上述式(1)表示之咪唑化合物。The synthesis method of the imidazole compound represented by the above formula (1) is not particularly limited. For example, the halogen-containing carboxylic acid derivative represented by the following formula (I) can be reacted with the imidazole compound represented by the following formula (II) according to the usual method to carry out imidazolylation to synthesize the compound represented by the above formula (1). of imidazole compounds.

(式(I)及式(II)中,R 1、R 2、R 3、R 4及n係與式(1)相同。在式(I),Hal為鹵素原子)。 (In formula (I) and formula (II), R 1 , R 2 , R 3 , R 4 and n are the same as in formula (1). In formula (I), Hal is a halogen atom).

又,咪唑化合物為以式(1)表示,且R 3為亞甲基之化合物時,亦即咪唑化合物為下述式(1-2)表示之化合物時,即使藉由以於以下所說明之Michael加成反應之方法,亦可合成咪唑化合物。 Also, when the imidazole compound is represented by formula (1), and R 3 is a compound of methylene, that is, when the imidazole compound is a compound represented by the following formula (1-2), even by the following The method of Michael addition reaction can also synthesize imidazole compounds.

(式(1-2)中,R 1、R 2、R 4及n係與式(1)相同)。 (In formula (1-2), R 1 , R 2 , R 4 and n are the same as formula (1)).

具體而言,例如藉由將下述式(III)表示之3-取代丙烯酸衍生物、與上述式(II)表示之咪唑化合物於溶媒中混合,產生Michael加成反應,而得到上述式(1-2)表示之咪唑化合物。Specifically, for example, by mixing the 3-substituted acrylic acid derivative represented by the following formula (III) and the imidazole compound represented by the above formula (II) in a solvent, a Michael addition reaction occurs to obtain the above formula (1 -2) The imidazole compound represented.

(式(III)中,R 1及R 2係與式(1)相同)。 (In formula (III), R 1 and R 2 are the same as formula (1)).

又,藉由將包含下述式(IV)表示之咪唑基的3-取代丙烯酸衍生物加在包含水之溶媒中,而得到下述式(1-3)表示之咪唑化合物。Also, an imidazole compound represented by the following formula (1-3) is obtained by adding a 3-substituted acrylic acid derivative containing an imidazole group represented by the following formula (IV) to a solvent containing water.

(式(IV)及式(1-3)中,R 2、R 4及n係與式(1)相同)。 (In formula (IV) and formula (1-3), R 2 , R 4 and n are the same as formula (1)).

此情況下,藉由上述式(IV)表示之3-取代丙烯酸衍生物的水解,生成上述式(II)表示之咪唑化合物、與下述式(V)表示之3-取代丙烯酸。而且,於下述式(V)表示之3-取代丙烯酸、與上述式(II)表示之咪唑化合物之間產生Michael加成反應,生成上述式(1-3)表示之咪唑化合物。In this case, the imidazole compound represented by the above formula (II) and the 3-substituted acrylic acid represented by the following formula (V) are produced by hydrolysis of the 3-substituted acrylic acid derivative represented by the above formula (IV). Furthermore, a Michael addition reaction occurs between the 3-substituted acrylic acid represented by the following formula (V) and the imidazole compound represented by the above formula (II) to produce the imidazole compound represented by the above formula (1-3).

(式(V)中,R 2係與式(1)相同)。 (In formula (V), R 2 is the same as formula (1)).

作為式(1)表示之咪唑化合物之合適的具體例,可列舉以下之化合物。 Suitable specific examples of the imidazole compound represented by formula (1) include the following compounds.

塗料組成物中之咪唑化合物(B)的含量,相對於固體成分全體100質量份,較佳為1質量份以上20質量份以下,更佳為2質量份以上10質量份以下。藉由使用該範圍內的量之咪唑化合物(B),不會伴隨咪唑化合物(B)之熱分解物的過度揮發或昇華,可有效果地促進來自聚醯胺酸(A)之聚醯胺樹脂的生成。其結果,可形成著色少,且機械特性優異之聚醯亞胺樹脂。The content of the imidazole compound (B) in the paint composition is preferably from 1 to 20 parts by mass, more preferably from 2 to 10 parts by mass, based on 100 parts by mass of the total solid content. By using the imidazole compound (B) in the amount within this range, without excessive volatilization or sublimation of the pyrolyzed product of the imidazole compound (B), it is possible to effectively promote the production of polyamide from polyamic acid (A). Resin production. As a result, a polyimide resin with less coloring and excellent mechanical properties can be obtained.

<溶媒(S)> 塗料組成物含有溶媒(S)。包含>N-CO-N<表示之尿素骨架之尿素系溶媒(S1)的質量相對於溶媒(S)的質量的比率,為0質量%以上10質量%以下。尿素系溶媒(S1)的質量相對於溶媒(S)的質量的比率,較佳為0質量%以上5質量%以下,更佳為0質量%以上3質量%以下,再更佳為0質量%以上1質量%以下,特佳為0質量%。 溶媒(S)只要尿素系溶媒(S1)的含量在指定的範圍內,則並未特別限定。作為溶媒(S),通常使用有機溶媒。 塗料組成物雖可為包含固體之糊料,亦可為溶液,但較佳為溶液。溶媒(S)可單獨或混合2種以上使用。 <Solvent (S)> The paint composition contains a solvent (S). The mass ratio of the urea-based solvent (S1) containing the urea skeleton represented by >N-CO-N< to the mass of the solvent (S) is 0% by mass or more and 10% by mass or less. The ratio of the mass of the urea-based solvent (S1) to the mass of the solvent (S) is preferably from 0% by mass to 5% by mass, more preferably from 0% by mass to 3% by mass, still more preferably 0% by mass The above is 1% by mass or less, particularly preferably 0% by mass. The solvent (S) is not particularly limited as long as the content of the urea-based solvent (S1) is within the specified range. As the solvent (S), an organic solvent is usually used. The paint composition may be a paste containing solids or a solution, but is preferably a solution. A solvent (S) can be used individually or in mixture of 2 or more types.

作為尿素系溶媒(S1)之典型的例,為N,N,N’,N’-四烷基脲。尤其是N,N,N’,N’-四甲基脲的質量的比率、與N,N,N’,N’-四乙基脲的質量相對於溶媒(S)的質量的比率,較佳為0質量%以上5質量%以下,更佳為0質量%以上3質量%以下,再更佳為0質量%。A typical example of the urea-based solvent (S1) is N,N,N',N'-tetraalkylurea. Especially the ratio of the mass of N,N,N',N'-tetramethylurea and the ratio of the mass of N,N,N',N'-tetraethylurea to the mass of the solvent (S) are relatively Preferably, it is 0 mass % or more and 5 mass % or less, More preferably, it is 0 mass % or more and 3 mass % or less, More preferably, it is 0 mass %.

溶媒(S)的種類於未阻礙本發明之目的的範圍,並未特別限定,可列舉水、乙二醇單甲基醚、乙二醇單乙基醚、乙二醇單丙基醚、乙二醇單丁基醚、丙二醇單甲基醚、丙二醇單乙基醚、丙二醇單丙基醚、丙二醇單丁基醚、二乙二醇單甲基醚、二乙二醇單乙基醚、二乙二醇單丙基醚,及二乙二醇單苯基醚等之甘醇單醚;乙二醇二甲基醚、乙二醇二乙基醚、乙二醇二丙基醚、丙二醇二甲基醚、丙二醇二乙基醚、丙二醇二丙基醚、二乙二醇二甲基醚、二乙二醇二乙基醚,及二乙二醇二丙基醚等之甘醇二醚;乙二醇單甲基醚乙酸酯、乙二醇單乙基醚乙酸酯、乙二醇單丙基醚乙酸酯、乙二醇單丁基醚乙酸酯、乙二醇單苯基醚乙酸酯、二乙二醇單甲基醚乙酸酯,及二乙二醇單乙基醚乙酸酯等之甘醇單乙酸酯;二乙二醇單丙基醚乙酸酯、二乙二醇單丁基醚乙酸酯、二乙二醇單苯基醚乙酸酯、丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯、丙二醇單丙基醚乙酸酯、2-甲氧基丁基乙酸酯、3-甲氧基丁基乙酸酯、4-甲氧基丁基乙酸酯、2-甲基-3-甲氧基丁基乙酸酯、3-甲基-3-甲氧基丁基乙酸酯、3-乙基-3-甲氧基丁基乙酸酯、2-乙氧基丁基乙酸酯、4-乙氧基丁基乙酸酯、4-丙氧基丁基乙酸酯、2-甲氧基戊基乙酸酯、3-甲氧基戊基乙酸酯、4-甲氧基戊基乙酸酯、2-甲基-3-甲氧基戊基乙酸酯、3-甲基-3-甲氧基戊基乙酸酯、3-甲基-4-甲氧基戊基乙酸酯,及4-甲基-4-甲氧基戊基乙酸酯等之二醇類之單醚單乙酸酯;丙酮、甲基乙基酮、二乙基酮、甲基異丁基酮、乙基異丁基酮及環己酮等之酮類;丙酸甲酯、丙酸乙酯、丙酸丙酯、丙酸異丙酯、2-羥基丙酸甲酯、2-羥基丙酸乙酯、2-羥基-2-甲基、甲基-3-甲氧基丙酸酯、乙基-3-甲氧基丙酸酯、乙基-3-乙氧基丙酸酯、乙基-3-丙氧基丙酸酯、丙基-3-甲氧基丙酸酯、異丙基-3-甲氧基丙酸酯、乙氧基乙酸乙酯、氧基乙酸乙酯、2-羥基-3-甲基丁酸甲酯、乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸異丙酯、乙酸丁酯、乙酸異戊酯、碳酸甲酯、碳酸乙酯、碳酸丙酯、碳酸丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸丙酯、丙酮酸丁酯、乙醯乙酸甲酯、乙醯乙酸乙酯、乙酸苄酯、苯甲酸乙酯、草酸二乙酯、馬來酸二乙酯及γ-丁內酯等之酯類;二乙基醚、二丙基醚、二丁基醚、二己基醚、苄基甲基醚、苄基乙基醚、二噁烷及四氫呋喃等之醚類;苯、甲苯、二甲苯、乙基苯、甲酚及氯苯等之芳香族類;甲醇、乙醇、n-丙醇、異丙醇、n-丁醇、n-己醇及環己醇等之脂肪族醇類;聚乙二醇、乙二醇、二乙二醇、丙二醇及二丙二醇等之甘醇類;甘油;N-甲基-2-吡咯烷酮、N,N-二甲基乙醯胺、N,N-二乙基乙醯胺、N,N-二甲基甲醯胺、N,N-二乙基甲醯胺及N-甲基己內醯胺等之含氮極性溶媒;二甲基亞碸;乙腈等。The type of solvent (S) is not particularly limited within the range that does not hinder the purpose of the present invention, and examples thereof include water, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monopropyl ether, Glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, Ethylene glycol monopropyl ether, and glycol monoethers such as diethylene glycol monophenyl ether; ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dipropyl ether, propylene glycol di Glycol diethers such as methyl ether, propylene glycol diethyl ether, propylene glycol dipropyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and diethylene glycol dipropyl ether; Ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monobutyl ether acetate, ethylene glycol monophenyl Ether acetate, diethylene glycol monomethyl ether acetate, and glycol monoacetate such as diethylene glycol monoethyl ether acetate; diethylene glycol monopropyl ether acetate, Diethylene glycol monobutyl ether acetate, diethylene glycol monophenyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate , 2-methoxybutyl acetate, 3-methoxybutyl acetate, 4-methoxybutyl acetate, 2-methyl-3-methoxybutyl acetate, 3-Methyl-3-methoxybutyl acetate, 3-ethyl-3-methoxybutyl acetate, 2-ethoxybutyl acetate, 4-ethoxybutyl Acetate, 4-propoxybutyl acetate, 2-methoxypentyl acetate, 3-methoxypentyl acetate, 4-methoxypentyl acetate, 2- Methyl-3-methoxypentyl acetate, 3-methyl-3-methoxypentyl acetate, 3-methyl-4-methoxypentyl acetate, and 4-methoxypentyl acetate Monoether monoacetate of diols such as 4-methoxypentyl acetate; acetone, methyl ethyl ketone, diethyl ketone, methyl isobutyl ketone, ethyl isobutyl Ketones such as ketone and cyclohexanone; methyl propionate, ethyl propionate, propyl propionate, isopropyl propionate, methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, 2-hydroxy -2-methyl, methyl-3-methoxypropionate, ethyl-3-methoxypropionate, ethyl-3-ethoxypropionate, ethyl-3-propoxy Propionate, Propyl-3-methoxypropionate, Isopropyl-3-methoxypropionate, Ethoxyacetate, Ethyloxyacetate, 2-Hydroxy-3-methyl Methyl butyrate, methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isopentyl acetate, methyl carbonate, ethyl carbonate, propyl carbonate, butyl carbonate, methyl pyruvate ester, ethyl pyruvate, propyl pyruvate, butyl pyruvate, methyl acetoacetate, ethyl acetoacetate, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate and Esters of γ-butyrolactone, etc.; ethers of diethyl ether, dipropyl ether, dibutyl ether, dihexyl ether, benzyl methyl ether, benzyl ethyl ether, dioxane, tetrahydrofuran, etc. ; Aromatics such as benzene, toluene, xylene, ethylbenzene, cresol and chlorobenzene; Methanol, ethanol, n-propanol, isopropanol, n-butanol, n-hexanol and cyclohexanol, etc. Aliphatic alcohols; glycols such as polyethylene glycol, ethylene glycol, diethylene glycol, propylene glycol, and dipropylene glycol; glycerin; N-methyl-2-pyrrolidone, N,N-dimethylacetyl Nitrogen-containing polar solvents such as amine, N,N-diethylacetamide, N,N-dimethylformamide, N,N-diethylformamide and N-methylcaprolactam; Dimethylsulfone; acetonitrile, etc.

溶媒(S)可包含下式(S1)表示之含氮化合物。 (式(S1)中,R S1及R S2分別獨立為碳原子數1以上3以下之烷基,R S3為氫原子或下述式(S1-1)表示之基, R S4為氫原子或羥基,R S5及R S6分別獨立為氫原子、碳原子數1以上3以下之烷基,R S3為式(S1-1)表示之基時,R S2及R S3可彼此鍵結形成環)。 The solvent (S) may contain a nitrogen-containing compound represented by the following formula (S1). (In the formula (S1), R S1 and R S2 are independently an alkyl group with 1 to 3 carbon atoms, and R S3 is a hydrogen atom or a group represented by the following formula (S1-1), R S4 is a hydrogen atom or a hydroxyl group, R S5 and R S6 are each independently a hydrogen atom, an alkyl group with 1 to 3 carbon atoms, and when R S3 is a group represented by formula (S1-1), R S2 and R S3 can be bonded to each other to form a ring).

作為式(S1)表示之含氮化合物當中,R S3為氫原子或式(S1-1)表示之基時之具體例,可列舉N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N,N,2-三甲基丙醯胺、N-乙基,N,2-二甲基丙醯胺、N,N-二乙基-2-甲基丙醯胺、N,N,2-三甲基-2-羥基丙醯胺、N-乙基-N,2-二甲基-2-羥基丙醯胺及N,N-二乙基-2-羥基-2-甲基丙醯胺等。 Among the nitrogen-containing compounds represented by formula (S1), specific examples of when R S3 is a hydrogen atom or a group represented by formula (S1-1) include N, N-dimethylformamide, N, N-di Methylacetamide, N,N,2-trimethylpropionamide, N-ethyl,N,2-dimethylpropionamide, N,N-diethyl-2-methylpropionamide , N,N,2-trimethyl-2-hydroxypropionamide, N-ethyl-N,2-dimethyl-2-hydroxypropionamide and N,N-diethyl-2-hydroxy- 2-methylacrylamide, etc.

作為式(S1)表示之含氮化合物當中,R S3為式(S1-1)表示之基,R S2及R S3彼此鍵結而形成環時之具體例,可列舉N-甲基-2-吡咯烷酮及N-乙基-2-吡咯烷酮等。 Among the nitrogen-containing compounds represented by formula (S1), R S3 is a group represented by formula (S1-1), and specific examples of when R S2 and R S3 are bonded to each other to form a ring include N-methyl-2- Pyrrolidone and N-ethyl-2-pyrrolidone, etc.

作為式(S1)表示之含氮化合物之上述之例當中,特佳的化合物,可列舉N,N-二甲基甲醯胺、N,N-二甲基乙醯胺及N,N,2-三甲基丙醯胺。此等當中,較佳為N,N,2-三甲基丙醯胺。N,N,2-三甲基丙醯胺於大氣壓下的沸點為175℃。如此,N,N,2-三甲基丙醯胺係比較性沸點較低。 因此,使用含有包含N,N,2-三甲基丙醯胺之溶媒(S)的塗料組成物時,形成聚醯亞胺樹脂時,於藉由加熱生成之聚醯亞胺樹脂中難以殘存溶媒(S),難以招致所得之聚醯亞胺樹脂之機械特性的低下等。 Among the above examples of nitrogen-containing compounds represented by formula (S1), particularly preferred compounds include N,N-dimethylformamide, N,N-dimethylacetamide and N,N,2 - Trimethylacrylamide. Among these, N,N,2-trimethylacrylamide is preferred. The boiling point of N,N,2-trimethylacrylamide at atmospheric pressure is 175°C. Thus, N,N,2-trimethylacrylamide has relatively low boiling point. Therefore, when using a coating composition containing a solvent (S) containing N,N,2-trimethylacrylamide, when forming a polyimide resin, it is difficult to remain in the polyimide resin generated by heating The solvent (S) is unlikely to cause a decrease in the mechanical properties of the polyimide resin obtained.

進而,N,N,2-三甲基丙醯胺在EU(歐洲聯盟)之REACH規則中,不會像SVHC(Substance of Very High Concern、高憂慮物質)被指定為有有害性憂慮的物質般,而於有害性低的物質的點亦為有用。Furthermore, N,N,2-trimethylacrylamide will not be designated as a substance of harmful concern in the REACH regulations of the EU (European Union) like SVHC (Substance of Very High Concern, Substance of Very High Concern) , It is also useful for substances with low harmfulness.

塗料成物中之溶媒(S)的含量於未阻礙本發明之目的的範圍,並未特別限定。塗料組成物中之溶媒(S)的含量因應塗料組成物中之固體成分含量適當調整。塗料組成物中之固體成分含量例如為5質量%以上99.9質量%以下的範圍,較佳為5質量%以上70質量%以下,更佳為10質量%以上60質量%以下。The content of the solvent (S) in the paint composition is not particularly limited within the range that does not hinder the object of the present invention. The content of the solvent (S) in the coating composition is properly adjusted according to the solid content in the coating composition. The solid content in the paint composition is, for example, in the range of 5% by mass to 99.9% by mass, preferably 5% by mass to 70% by mass, more preferably 10% by mass to 60% by mass.

<其他成分> 塗料組成物如有必要可含有各種添加劑。作為添加劑,可列舉著色劑、分散劑、增感劑、密著促進劑、抗氧化劑、紫外線吸收劑、抗凝聚劑、消泡劑、界面活性劑等。又,塗料組成物如有必要可包含各種填充材料或強化材料。 各種添加劑的使用量於未阻礙本發明之目的的範圍,並未特別限定。相對於塗料組成物之固體成分的質量,例如於0.001質量%以上60質量%以下的範圍內適當調整即可,較佳為0.05質量%以上5質量%以下。 填充材料或強化材料的使用量於未阻礙本發明之目的的範圍,並未特別限定。填充材料或強化材料的使用量通常而言,相對於聚醯胺酸(A)的質量,較佳為1質量%以上300質量%以下,更佳為5質量%以上200質量%以下,再更佳為10質量%以上100質量%以下。 <Other ingredients> The paint composition may contain various additives as necessary. Examples of additives include coloring agents, dispersants, sensitizers, adhesion promoters, antioxidants, ultraviolet absorbers, anti-aggregating agents, antifoaming agents, and surfactants. Also, the paint composition may contain various fillers or reinforcing materials as necessary. The usage-amount of various additives is not specifically limited in the range which does not hinder the object of this invention. The mass of the solid content of the paint composition may be appropriately adjusted within a range of, for example, 0.001% by mass to 60% by mass, preferably 0.05% by mass to 5% by mass. The usage-amount of a filler or a reinforcing material is not specifically limited in the range which does not hinder the object of this invention. The amount of the filler or reinforcing material used is usually preferably from 1% by mass to 300% by mass, more preferably from 5% by mass to 200% by mass, and more preferably with respect to the mass of the polyamic acid (A). Preferably, it is not less than 10% by mass and not more than 100% by mass.

如以上,根據上述之塗料組成物,可形成著色少,且斷裂伸長率、拉伸彈性率、拉伸強度及低熱膨脹性等之機械特性優異之聚醯亞胺樹脂。As mentioned above, according to the above-mentioned coating composition, it is possible to form a polyimide resin with less coloring and excellent mechanical properties such as elongation at break, tensile modulus of elasticity, tensile strength, and low thermal expansion.

≪塗料組成物之製造方法≫ 作為塗料組成物之合適的製造方法,可列舉包含: 將四羧酸二酐、與二胺化合物於前述之溶媒(S)中,於咪唑化合物(B)的存在下使其聚合,生成聚醯胺酸(A)之方法。 四羧酸二酐、與二胺化合物的聚合進行至聚醯胺酸(A)的重量平均分子量成為20,000以上為止。 ≪Manufacturing method of paint composition≫ Suitable manufacturing methods of the coating composition include: A method for producing polyamic acid (A) by polymerizing tetracarboxylic dianhydride and diamine compound in the aforementioned solvent (S) in the presence of imidazole compound (B). Polymerization of tetracarboxylic dianhydride and a diamine compound is performed until the weight average molecular weight of polyamic acid (A) becomes 20,000 or more.

對於使四羧酸二酐及二胺化合物聚合之方法,係如前述。The method for polymerizing tetracarboxylic dianhydride and diamine compound is as described above.

藉由反應時之溫度,使四羧酸二酐、與二胺化合物反應時,有咪唑化合物(B)分解的情況。此情況下,從所得之聚合反應液,調製塗料組成物時,可將所期望之量的咪唑化合物(B)追加在聚合反應液。 又,聚合反應後,可藉由濃縮聚合反應液或對聚合反應液加入溶媒(S),來調製塗料組成物。 Depending on the temperature at the time of reaction, when tetracarboxylic dianhydride and a diamine compound are reacted, the imidazole compound (B) may decompose. In this case, when preparing a paint composition from the obtained polymerization reaction liquid, a desired amount of imidazole compound (B) can be added to the polymerization reaction liquid. Also, after the polymerization reaction, the coating composition can be prepared by concentrating the polymerization reaction liquid or adding a solvent (S) to the polymerization reaction liquid.

≪聚醯亞胺樹脂之製造方法≫ 可藉由包含成形以上說明之塗料組成物之成形步驟、與 加熱經成形之塗料組成物,使其醯亞胺化之醯亞胺化步驟的方法,製造聚醯亞胺樹脂。 ≪Manufacturing method of polyimide resin≫ It can be formed by the forming step including forming the above-described coating composition, and A method of imidizing the formed coating composition by heating and imidizing it to produce a polyimide resin.

成形塗料組成物時所成形之塗料組成物的形狀並未特別限定。成形塗料組成物之方法並未特別限定。例如可列舉於所期望之形狀的型當中注入塗料組成物之方法,或使用刮板等,於鑄型內填充塗料組成物之方法,或於基材上塗佈塗料組成物之方法等。 此等之方法當中,由於聚醯亞胺樹脂薄膜的需求大,或於聚醯亞胺樹脂製造時容易從塗料組成物良好地去除溶媒(S)等,較佳為於基材上塗佈塗料組成物之方法。 塗料組成物的塗佈後,放置在加熱及/或真空或是減壓環境,乾燥塗佈膜,並形成乾燥膜。 The shape of the paint composition to be molded when molding the paint composition is not particularly limited. The method for forming the coating composition is not particularly limited. For example, a method of injecting a coating composition into a mold having a desired shape, a method of filling a mold with a coating composition using a squeegee, or a method of coating a coating composition on a substrate may be mentioned. Among these methods, since the polyimide resin film is in great demand, or it is easy to remove the solvent (S) from the coating composition well when the polyimide resin is produced, it is preferable to coat the coating on the substrate. Method of composition. After the coating composition is applied, it is placed in a heating and/or vacuum or reduced pressure environment to dry the coating film and form a dry film.

加熱塗料組成物或乾燥步驟後之塗料組成物的溫度,若為得到所期望之性能的聚醯亞胺樹脂的溫度,則並未特別限定。加熱聚醯胺酸的溫度較佳為120℃以上450℃以下,更佳為150℃以上435℃以下。藉由以這般的範圍的溫度加熱塗料組成物,可抑制生成之聚醯亞胺樹脂的熱劣化或熱分解,可去除溶媒(S),並且可生成聚醯亞胺樹脂。 又,由於容易形成玻璃轉移溫度高,且斷裂伸長率之機械性優異,熱膨脹率低,著色少之聚醯亞胺樹脂,故將聚醯胺酸於70℃以上120℃以下之溫度10分鐘至2小時左右,進而於150℃以上435℃以下5分鐘至2小時左右,一邊階段性提昇溫度一邊加熱,來生成聚醯亞胺樹脂亦佳。 The temperature for heating the paint composition or the paint composition after the drying step is not particularly limited as long as it is a temperature at which the polyimide resin with desired properties can be obtained. The temperature for heating polyamic acid is preferably from 120°C to 450°C, more preferably from 150°C to 435°C. By heating the paint composition at a temperature in such a range, thermal deterioration or thermal decomposition of the produced polyimide resin can be suppressed, the solvent (S) can be removed, and the polyimide resin can be produced. In addition, since it is easy to form a polyimide resin with a high glass transition temperature, excellent mechanical properties of elongation at break, low thermal expansion rate, and less coloring, the polyimide resin is kept at a temperature above 70°C and below 120°C for 10 minutes to For about 2 hours, further heating at 150° C. to 435° C. for 5 minutes to 2 hours while increasing the temperature step by step is also preferable to produce polyimide resin.

根據以上說明之聚醯亞胺樹脂之製造方法,可製造著色少,且斷裂伸長率、拉伸彈性率、拉伸強度及低熱膨脹性等之機械特性優異之聚醯亞胺樹脂。 [實施例] According to the production method of the polyimide resin described above, it is possible to produce a polyimide resin with less coloration and excellent mechanical properties such as elongation at break, tensile modulus of elasticity, tensile strength, and low thermal expansion. [Example]

以下,雖將本發明藉由實施例進行詳細說明,但本發明的範圍並非被限定於此等之實施例。Hereinafter, although the present invention will be described in detail through examples, the scope of the present invention is not limited to these examples.

在實施例及比較例,作為四羧酸二酐,係使用脂環式四羧酸二酐的下述式之化合物。 在實施例及比較例,作為二胺化合物,係使用芳香族二胺化合物的4,4’-二胺基苯甲醯苯胺。 In Examples and Comparative Examples, a compound of the following formula of an alicyclic tetracarboxylic dianhydride was used as tetracarboxylic dianhydride. In Examples and Comparative Examples, 4,4'-diaminobenzanilide, which is an aromatic diamine compound, was used as the diamine compound.

在實施例及比較例,作為咪唑化合物(B),係使用下述式之化合物。 In Examples and Comparative Examples, as the imidazole compound (B), a compound of the following formula was used.

[實施例1~4及比較例1] 將容量30mL之三口燒瓶以熱風槍加熱,充分使其乾燥。接著,將三口燒瓶內的環境以氮取代,並將三口燒瓶內定為氮環境。於三口燒瓶內,添加4,4’-二胺基苯甲醯苯胺0.2045g(0.90mmol:日本純良藥品股份有限公司製:DABAN)、與表1所記載之量的咪唑化合物(B)後,再添加N-甲基-2-吡咯烷酮(NMP)。攪拌三口燒瓶之內容物,而得到於NMP中分散芳香族二胺(DABAN)的漿料液。尚,於比較例1,在聚醯胺酸(A)之合成,並未使用咪唑化合物。 NMP的量係與四羧酸二酐的質量、與二胺化合物的質量的合計為同質量。 接著,於三口燒瓶內添加上述之四羧酸二酐0.3459g (0.90mmol)。然後,於氮環境下於40℃攪拌6小時燒瓶之內容物,而得到反應液。尚,於實施例1~4之反應液中,直接殘存咪唑化合物(B)。 於實施例1~4,對於包含如此進行所得之聚醯胺酸(A)的反應液,相對於四羧酸二酐的質量、與二胺化合物的質量之合計,加入相當於10質量%的量之咪唑化合物(B)55.04mg。 又,即使於比較例1,於聚醯胺酸(A)之合成完成後,相對於四羧酸二酐的質量、與二胺化合物的質量之合計,加入相當於10質量%的量之咪唑化合物(B)55.04mg。 接著,將包含聚醯胺酸(A)之反應液以聚醯胺酸(A)的濃度成為22質量%的方式以NMP稀釋,而得到各實施例及各比較例之塗料組成物。將作為藉由所得之聚醯胺酸(A)之凝膠滲透層析測定之聚苯乙烯換算值的重量平均分子量(Mw)、與分散(Mw/Mn、Mn為數平均分子量)記於表1。 [Examples 1 to 4 and Comparative Example 1] Heat a three-neck flask with a capacity of 30mL with a heat gun to fully dry it. Next, the environment in the three-necked flask was replaced with nitrogen, and the inside of the three-necked flask was set as a nitrogen environment. In a three-necked flask, add 0.2045 g (0.90 mmol: DABAN) of 4,4'-diaminobenzylaniline and the imidazole compound (B) in the amount listed in Table 1, Further N-methyl-2-pyrrolidone (NMP) was added. The contents of the three-necked flask were stirred to obtain a slurry liquid in which aromatic diamine (DABAN) was dispersed in NMP. Still, in Comparative Example 1, no imidazole compound was used in the synthesis of polyamic acid (A). The quantity of NMP is the same mass as the total of the mass of tetracarboxylic dianhydride, and the mass of a diamine compound. Next, 0.3459 g (0.90 mmol) of the above-mentioned tetracarboxylic dianhydrides were added in the three-necked flask. Then, the content of the flask was stirred at 40° C. for 6 hours under a nitrogen atmosphere to obtain a reaction liquid. Furthermore, in the reaction liquids of Examples 1-4, the imidazole compound (B) remained as it was. In Examples 1 to 4, for the reaction solution containing the polyamic acid (A) obtained in this way, 10% by mass of polyamide was added to the total mass of the tetracarboxylic dianhydride and the mass of the diamine compound. The amount of imidazole compound (B) was 55.04 mg. Also in Comparative Example 1, after the synthesis of polyamic acid (A) was completed, imidazole was added in an amount equivalent to 10% by mass based on the total mass of the tetracarboxylic dianhydride and the mass of the diamine compound. Compound (B) 55.04 mg. Next, the reaction liquid containing polyamic acid (A) was diluted with NMP so that the density|concentration of polyamic acid (A) might become 22 mass %, and the coating composition of each Example and each comparative example was obtained. Table 1 shows the weight average molecular weight (Mw) and dispersion (Mw/Mn, where Mn is the number average molecular weight) as polystyrene-equivalent values measured by gel permeation chromatography of the obtained polyamic acid (A) .

使用如以上進行所得之各實施例及比較例之塗料組成物,依據以下之方法,進行聚醯亞胺樹脂薄膜的成膜,對於所形成之聚醯亞胺樹脂薄膜,進行黃色度(YI)、光線透過率、熱膨脹率(CTE)、斷裂伸長率、拉伸強度及拉伸彈性率的評估。將此等之評估結果記於表1。Using the coating compositions of the various examples and comparative examples obtained as above, according to the following method, film formation of polyimide resin films was carried out, and the yellowness (YI) of the formed polyimide resin films was measured. , Light transmittance, coefficient of thermal expansion (CTE), elongation at break, tensile strength and tensile modulus of elasticity. Record these evaluation results in Table 1.

<聚醯亞胺樹脂薄膜的成膜方法> 於玻璃基板(縱:100mm、橫100mm、厚度1.3mm)上,將如上述進行所得之塗料組成物,以加熱硬化後之塗膜的厚度成為13μm的方式進行旋塗,形成塗膜。接著,將具備塗膜之玻璃基板以溫度50℃、壓力13Pa的條件下,進行真空乾燥,去除塗膜中之溶媒。 溶媒的去除後,將具備塗膜之玻璃基板投入以3L/分鐘的流量流動氮之惰性烘箱。於惰性烘箱內,以氮環境下、80℃的溫度條件,靜置0.5小時後,以300℃的溫度條件靜置0.5小時,進而以430℃的溫度條件(最終加熱溫度)加熱5分鐘,使塗膜硬化,而得到以由聚醯亞胺所構成之薄膜(聚醯亞胺薄膜)塗佈之聚醯亞胺塗佈玻璃。 將所得之聚醯亞胺塗佈玻璃浸漬在90℃之熱水當中,從玻璃基板使聚醯亞胺薄膜剝離,而得到聚醯亞胺薄膜(縱100mm、橫100mm、厚度13μm大小的薄膜)。 <Film Formation Method of Polyimide Resin Film> On a glass substrate (100 mm in length, 100 mm in width, and 1.3 mm in thickness), the coating composition obtained as described above was spin-coated so that the thickness of the coating film after heating and hardening became 13 μm to form a coating film. Next, the glass substrate provided with the coating film was vacuum-dried under the conditions of a temperature of 50° C. and a pressure of 13 Pa to remove the solvent in the coating film. After removal of the solvent, the glass substrate provided with the coating film was put into an inert oven flowing nitrogen at a flow rate of 3 L/min. In an inert oven, under a nitrogen atmosphere, at a temperature of 80°C, let stand for 0.5 hours, then stand at a temperature of 300°C for 0.5 hours, and then heat at a temperature of 430°C (final heating temperature) for 5 minutes, so that The coating film was cured to obtain a polyimide-coated glass coated with a thin film (polyimide film) made of polyimide. The obtained polyimide-coated glass was immersed in hot water at 90°C, and the polyimide film was peeled off from the glass substrate to obtain a polyimide film (100 mm in length, 100 mm in width, and 13 μm in thickness) .

<黃色度(YI)、光線透過率> 各實施例及比較例之聚醯亞胺薄膜的光線透過率之值(單位:%)及黃色度(YI),係藉由使用日本電色工業股份有限公司製之商品名「霧度計NDH-5000」作為測定裝置,並進行行依照JIS K7361-1(1997年發行)之測定求出。光線透過率為在光線波長380nm~780nm之值。 對於黃色度,依照以下之基準,來判定評估結果。 ◎:YI值未滿4.0。 〇:YI值為4.0以上5.0以下。 ×:YI值超過5.0。 <Yellowness (YI), light transmittance> The values (unit: %) and yellowness (YI) of the light transmittance (unit: %) and the yellowness (YI) of the polyimide film of each embodiment and the comparative example are obtained by using the trade name "haze meter NDH" manufactured by Nippon Denshoku Industries Co., Ltd. -5000" was used as a measuring device, and it was determined in accordance with JIS K7361-1 (issued in 1997). The light transmittance is the value at the wavelength of light from 380nm to 780nm. Regarding the degree of yellowness, the evaluation results are judged according to the following criteria. ⊚: YI value is less than 4.0. 〇: YI value is not less than 4.0 and not more than 5.0. ×: YI value exceeds 5.0.

<熱膨脹率(CTE)> 從各實施例及比較例之聚醯亞胺薄膜,形成縱:20 mm、橫:5mm大小的測定用之薄膜。 接著,藉由利用熱機械性分析裝置(島津製作所股份有限公司製之商品名「TMA-60」)作為測定裝置,並將所得之測定用之薄膜於氮環境下,測定以昇溫速度10℃/分鐘的條件,從30℃昇溫至200℃後,一度冷卻至30℃,再度以昇溫速度10℃/分鐘的條件,從30℃昇溫至500℃時之在100℃~400℃之試料長度的變化,求出在100℃~400℃之每1℃之長度變化的平均值來測定。尚,拉伸模式定為49mN。 <Coefficient of Thermal Expansion (CTE)> From the polyimide films of the respective examples and comparative examples, a film for measurement having a size of 20 mm in length and 5 mm in width was formed. Next, by using a thermomechanical analyzer (trade name "TMA-60" manufactured by Shimadzu Corporation) as a measurement device, the obtained thin film for measurement was measured under a nitrogen atmosphere at a temperature increase rate of 10°C/ Changes in the length of the sample at 100°C to 400°C when the temperature is raised from 30°C to 200°C, once cooled to 30°C, and then heated from 30°C to 500°C at a heating rate of 10°C/min. , Obtain the average value of the change in length per 1°C between 100°C and 400°C. Still, the tensile mode was set at 49mN.

<斷裂伸長率、拉伸強度及拉伸彈性率> 對於各實施例及比較例之聚醯亞胺薄膜,於SD型槓桿式試料裁斷器(DUMBBEL股份有限公司製之裁斷器(型式SDL-200)),安裝DUMBBEL股份有限公司製之商品名「SUPER DUMBBELL CUTTER(型:SDMK-1000-D、依照JIS K7139(2009年發行)之A22規格)」,以聚醯亞胺薄膜的大小成為全長:75mm、標籤部間距離:57mm、平行部的長度:30mm、肩部的半徑:30mm、端部的寬度:10 mm、中央之平行部的寬度:5mm、厚度:13μm的方式裁斷,將DUMBBEL形狀之試驗片(除了將厚度定為13μm之外,照著JIS K7139 型A22(縮尺試驗片)之規格的試驗片)作為測定試料調製。 接著,使用張力型萬能試驗機(A&D股份有限公司製之型號「UCT-10T」),將測定試料以夾具間的寬度成為57mm、挾住部分的寬度成為10mm(端部的全寬)的方式進行來配置後,以荷重全刻度:0.05kN、試驗速度:1~300mm/分鐘的條件,進行拉伸測定試料之拉伸試驗,求出拉伸強度、斷裂伸長率及拉伸彈性率之值。 上述之試驗係依照JIS K7162(1994年發行)之試驗。 又,斷裂伸長率之值(%)係將試驗片之平行部的長度(=平行部的長度:30mm)定為L0,將至斷裂為止之試驗片之平行部的長度(斷裂時之試驗片之平行部的長度:30mm+α)定為L,計算下述式: [斷裂伸長率(%)]={(L-L0)/L0}×100 求出。 對於斷裂伸長率,依據以下之基準,來判定評估結果。 ◎:斷裂伸長率超過15%。 〇:斷裂伸長率為10%以上15%以下。 ×:斷裂伸長率未滿10%。 <Elongation at break, tensile strength and tensile modulus> For the polyimide films of the respective examples and comparative examples, a product named "SUPER" manufactured by DUMBBEL Co., Ltd. was installed on an SD-type lever type sample cutter (a cutter made by DUMBBEL Co., Ltd. (type SDL-200)). DUMBBELL CUTTER (type: SDMK-1000-D, in accordance with A22 standard of JIS K7139 (issued in 2009))", the size of the polyimide film becomes the overall length: 75mm, the distance between the label parts: 57mm, the length of the parallel part: 30mm, radius of shoulder: 30mm, width of end: 10mm, width of central parallel part: 5mm, thickness: 13μm, and the test piece of DUMBBEL shape (except that the thickness is set to 13μm, according to A test piece conforming to the standard of JIS K7139 type A22 (reduced scale test piece)) was prepared as a measurement sample. Next, using a tension-type universal testing machine (model "UCT-10T" manufactured by A&D Co., Ltd.), the measurement sample was made so that the width between the grips became 57mm and the width of the pinched part became 10mm (full width of the end) After the configuration is carried out, under the conditions of full load scale: 0.05kN and test speed: 1-300mm/min, carry out the tensile test of the tensile measurement sample, and obtain the values of tensile strength, elongation at break and tensile elastic modulus . The above test is based on the test of JIS K7162 (published in 1994). In addition, the value (%) of the elongation at break is based on the length of the parallel portion of the test piece (=length of the parallel portion: 30mm) as L0, and the length of the parallel portion of the test piece until it breaks (test piece at the time of breakage) The length of the parallel part: 30mm+α) is defined as L, and the following formula is calculated: [Elongation at break (%)]={(L-L0)/L0}×100 Find out. Regarding the elongation at break, the evaluation results were judged on the basis of the following criteria. ◎: The elongation at break exceeds 15%. 〇: Elongation at break is 10% or more and 15% or less. ×: Elongation at break is less than 10%.

根據表1,瞭解到使用組合重量平均分子量為20,000以上之聚醯胺酸(A)、與前述之特定之構造的咪唑化合物(B)、與尿素系溶媒(S1)的含量為0質量%以上10質量%以下的溶媒(S)包含之實施例之塗料組成物時,可形成兼備著色少與優異之機械特性之聚醯亞胺樹脂。 另一方面,根據比較例,瞭解到聚醯胺酸(A)的重量平均分子量未滿20,000時,所得之聚醯亞胺樹脂著色,且斷裂伸長率等之機械特性低下。 又,從實施例、與比較例的比較,瞭解到於尿素系溶媒(S1)的含量為0質量%以上10質量%以下的溶媒(S)中,藉由於前述之特定之構造的咪唑化合物(B)的存在下,聚合四羧酸二酐、與二胺化合物,得到分子量高之聚醯胺酸。 According to Table 1, it is understood that the polyamic acid (A) with a combined weight average molecular weight of 20,000 or more, the imidazole compound (B) with the above-mentioned specific structure, and the content of urea-based solvent (S1) are 0% by mass or more. When the coating composition of the example containing the solvent (S) is 10% by mass or less, a polyimide resin having less coloring and excellent mechanical properties can be formed. On the other hand, according to Comparative Examples, when the weight average molecular weight of the polyamic acid (A) is less than 20,000, the obtained polyimide resin is colored and mechanical properties such as elongation at break are lowered. Also, from the comparison of Examples and Comparative Examples, it is understood that in the solvent (S) whose content of the urea-based solvent (S1) is 0% by mass to 10% by mass, the imidazole compound ( In the presence of B), polymerize tetracarboxylic dianhydride and diamine compound to obtain polyamic acid with high molecular weight.

Claims (8)

一種塗料組成物,其特徵為包含聚醯胺酸(A)、與咪唑化合物(B)、與溶媒(S), 前述聚醯胺酸(A)的重量平均分子量為20,000以上, 前述咪唑化合物(B)為下述式(1)表示之化合物, (式(1)中,R 1為氫原子或烷基,R 2為可具有取代基之芳香族基,R 3為可具有取代基之伸烷基,R 4分別獨立為鹵素原子、羥基、巰基、硫化物基、矽烷基、矽烷醇基、硝基、亞硝基、磺酸根基、膦基、氧膦基、膦酸根基或有機基,n為0以上3以下之整數) 包含>N-CO-N<表示之尿素骨架之尿素系溶媒(S1)的質量相對於溶媒(S)的質量的比率,為0質量%以上10質量%以下。 A coating composition, characterized by comprising polyamic acid (A), imidazole compound (B), and solvent (S), the weight average molecular weight of the aforementioned polyamic acid (A) is more than 20,000, and the aforementioned imidazole compound ( B) is a compound represented by the following formula (1), (In formula (1), R 1 is a hydrogen atom or an alkyl group, R 2 is an aromatic group that may have a substituent, R 3 is an alkylene group that may have a substituent, and R 4 is independently a halogen atom, a hydroxyl group, Mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfonate group, phosphine group, phosphinyl group, phosphonate group or organic group, n is an integer between 0 and 3) including >N The ratio of the mass of the urea-based solvent (S1) in the urea skeleton represented by -CO-N< to the mass of the solvent (S) is 0% by mass or more and 10% by mass or less. 如請求項1之塗料組成物,其中,前述聚醯胺酸(A)為脂環式四羧酸二酐(A1)及芳香族二胺化合物(A2)之聚合物。The coating composition according to claim 1, wherein the aforementioned polyamic acid (A) is a polymer of alicyclic tetracarboxylic dianhydride (A1) and aromatic diamine compound (A2). 如請求項2之塗料組成物,其中,前述脂環式四羧酸二酐(A1)包含下述式(a2)表示之化合物, (式(a2)中,R a11、R a12及R a13分別獨立為選自由氫原子、碳原子數1以上5以下之烷基及氟原子所構成之群組中之1種,a為0以上12以下之整數)。 The coating composition according to claim 2, wherein the aforementioned alicyclic tetracarboxylic dianhydride (A1) comprises a compound represented by the following formula (a2), (In formula (a2), R a11 , R a12 and R a13 are each independently selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, and a fluorine atom, and a is 0 or more an integer below 12). 如請求項1~3中任一項之塗料組成物,其中,前述芳香族二胺化合物(A2)為選自下述式(21)~式(24)表示之化合物中之1種以上, (式(21)~(24)中,R 111表示選自由氫原子、氟原子、羥基、碳原子數1以上4以下之烷基及碳原子數1以上4以下之鹵素化烷基所構成之群組中之1種, 式(24)中,Q表示9,9’-亞茀基,或選自由式:-C 6H 4-、 -CONH-C 6H 4-NHCO-、-NHCO-C 6H 4-CONH-、-O-C 6H 4-CO-C 6H 4-O-、-OCO-C 6H 4-COO-、-OCO-C 6H 4-C 6H 4-COO-、 -OCO-、-O-、-S-、-CO-、-CONH-、-SO 2-、-C(CF 3) 2-、 -C(CH 3) 2-、-CH 2-、-O-C 6H 4-C(CH 3) 2-C 6H 4-O-、-O-C 6H 4-C(CF 3) 2-C 6H 4-O-、-O-C 6H 4-SO 2-C 6H 4-O-、-C(CH 3) 2-C 6H 4-C(CH 3) 2-、-O-C 10H 6-O-、-O-C 6H 4-C 6H 4-O-及-O-C 6H 4-O-表示之基所構成之群組中之1種,-C 6H 4-為伸苯基,-C 10H 6-為萘二基)。 The coating composition according to any one of claims 1 to 3, wherein the aromatic diamine compound (A2) is one or more compounds selected from the following formulas (21) to (24), (In the formulas (21) to (24), R111 represents a group consisting of a hydrogen atom, a fluorine atom, a hydroxyl group, an alkyl group with 1 to 4 carbon atoms, and a halogenated alkyl group with 1 to 4 carbon atoms. One of the group, in formula (24), Q represents 9,9'-fenylene, or is selected from the formula: -C 6 H 4 -, -CONH-C 6 H 4 -NHCO-, -NHCO- C 6 H 4 -CONH-, -OC 6 H 4 -CO-C 6 H 4 -O-, -OCO-C 6 H 4 -COO-, -OCO-C 6 H 4 -C 6 H 4 -COO- , -OCO-, -O-, -S-, -CO-, -CONH-, -SO 2 -, -C(CF 3 ) 2 -, -C(CH 3 ) 2 -, -CH 2 -, - OC 6 H 4 -C(CH 3 ) 2 -C 6 H 4 -O-, -OC 6 H 4 -C(CF 3 ) 2 -C 6 H 4 -O-, -OC 6 H 4 -SO 2 - C 6 H 4 -O-, -C(CH 3 ) 2 -C 6 H 4 -C(CH 3 ) 2 -, -OC 10 H 6 -O-, -OC 6 H 4 -C 6 H 4 -O - and -OC 6 H 4 -O- is one of the group consisting of groups represented by -C 6 H 4 - is phenylene, -C 10 H 6 - is naphthalenediyl). 如請求項4之塗料組成物,其中,前述芳香族二胺化合物(A2)包含前述式(24)表示之化合物。The coating composition according to claim 4, wherein the aforementioned aromatic diamine compound (A2) includes a compound represented by the aforementioned formula (24). 如請求項5之塗料組成物,其中,前述芳香族二胺化合物(A2)係以前述式(24)表示,前述Q為-CONH-之化合物。The coating composition according to Claim 5, wherein the above-mentioned aromatic diamine compound (A2) is represented by the above-mentioned formula (24), and the above-mentioned Q is a compound of -CONH-. 一種塗料組成物之製造方法,其係包含聚醯胺酸(A)、與咪唑化合物(B)、與溶媒(S)的塗料組成物之製造方法,其特徵為包含 將四羧酸二酐、與二胺化合物於前述溶媒(S)中,於咪唑化合物(B)的存在下使其聚合,生成前述聚醯胺酸(A), 前述咪唑化合物(B)為下述式(1)表示之化合物, (式(1)中,R 1為氫原子或烷基,R 2為可具有取代基之芳香族基,R 3為可具有取代基之伸烷基,R 4分別獨立為鹵素原子、羥基、巰基、硫化物基、矽烷基、矽烷醇基、硝基、亞硝基、磺酸根基、膦基、氧膦基、膦酸根基或有機基,n為0以上3以下之整數) 包含>N-CO-N<表示之尿素骨架之尿素系溶媒(S1)的質量相對於溶媒(S)的質量的比率,為0質量%以上10質量%以下, 將前述二胺成分、與前述四羧酸二酐成分的聚合進行至前述聚醯胺酸(A)的重量平均分子量成為20,000以上為止。 A method for producing a coating composition, which is a method for producing a coating composition comprising polyamic acid (A), an imidazole compound (B), and a solvent (S), characterized in that it comprises tetracarboxylic dianhydride, Polymerize with diamine compound in the aforementioned solvent (S) in the presence of imidazole compound (B) to generate the aforementioned polyamic acid (A). The aforementioned imidazole compound (B) is represented by the following formula (1): compound, (In formula (1), R 1 is a hydrogen atom or an alkyl group, R 2 is an aromatic group that may have a substituent, R 3 is an alkylene group that may have a substituent, and R 4 is independently a halogen atom, a hydroxyl group, Mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfonate group, phosphine group, phosphinyl group, phosphonate group or organic group, n is an integer between 0 and 3) including >N The ratio of the mass of the urea-based solvent (S1) of the urea skeleton represented by -CO-N< to the mass of the solvent (S) is 0% by mass or more and 10% by mass or less, and the aforementioned diamine component and the aforementioned tetracarboxylic acid The superposition|polymerization of a dianhydride component is performed until the weight average molecular weight of the said polyamic acid (A) becomes 20,000 or more. 一種聚醯亞胺樹脂之製造方法,其係包含成形如請求項1~6中任一項之前述塗料組成物之成形步驟、與 加熱經成形之前述塗料組成物,使其醯亞胺化之醯亞胺化步驟。 A method for producing a polyimide resin, comprising a step of forming the aforementioned coating composition according to any one of claims 1 to 6, and An imidization step of heating the shaped coating composition to imidize it.
TW111140350A 2021-12-17 2022-10-25 Coating composition, preparation methods of the coating composition and polyimide resin wherein the coating composition includes polyamic acid, an imidazole compound and a solvent TW202328308A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-205345 2021-12-17
JP2021205345A JP2023090404A (en) 2021-12-17 2021-12-17 Varnish composition, method for producing varnish composition, and method for producing polyimide resin

Publications (1)

Publication Number Publication Date
TW202328308A true TW202328308A (en) 2023-07-16

Family

ID=86876409

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111140350A TW202328308A (en) 2021-12-17 2022-10-25 Coating composition, preparation methods of the coating composition and polyimide resin wherein the coating composition includes polyamic acid, an imidazole compound and a solvent

Country Status (4)

Country Link
JP (1) JP2023090404A (en)
KR (1) KR20230092743A (en)
CN (1) CN116333585A (en)
TW (1) TW202328308A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7039166B2 (en) 2016-09-30 2022-03-22 東京応化工業株式会社 Resin composition, method for producing cured product, and cured product

Also Published As

Publication number Publication date
CN116333585A (en) 2023-06-27
KR20230092743A (en) 2023-06-26
JP2023090404A (en) 2023-06-29

Similar Documents

Publication Publication Date Title
TWI770374B (en) Polyimide, polyimide solution, polyimide, polyimide film, laminate and flexible device, and method for producing polyimide film
JP6794611B2 (en) Polyimide copolymer and polyimide film using it
TWI535760B (en) Polyamic acid solution having high heat-resistance properties and polyimide film
TWI638844B (en) High strength transparent polyamide-imide and process for preparing same
US9988534B2 (en) Polyimide precursor composition and method for producing polyimide precursor composition
EP3106487B1 (en) Polyamide acid composition and polyimide composition
TW201742880A (en) High strength transparent polyamide-imide and process for preparing the same, and polyamide-imide film
JP2016030760A (en) Polyimide precursor composition, method for producing polyimide precursor, polyimide molded article and method for producing polyimide molded article
US20210395568A1 (en) Polyimide resin, varnish, and polyimide film
EP1311587A1 (en) Cured fluorenyl polyimides
US9505886B2 (en) Polyimide precursor composition, method for preparing polyimide precursor, polyimide molded article, and method for preparing polyimide molded article
Yang et al. Synthesis and properties of novel benzocyclobutene‐functionalized siloxane thermosets
KR102262507B1 (en) Compoistion of polyimide precursor and polyimide film prepared using same
TW202328308A (en) Coating composition, preparation methods of the coating composition and polyimide resin wherein the coating composition includes polyamic acid, an imidazole compound and a solvent
KR102276094B1 (en) An evaluating method for electrical surface charge density of polymer film, polyimide film with improved surface charge density and flexible device using same
TW202328310A (en) Coating composition, preparation methods of the coating composition and polyimide resin wherein the coating composition includes polyamic acid and a solvent
TW202328309A (en) Coating composition, preparation methods of the coating composition and polyimide resin wherein the coating composition includes polyamic acid and a solvent
TW202102583A (en) Polyimide, polyamic acid, resin solution, coating agent, and polyimide film
JP7437996B2 (en) Varnish composition and method for producing polyimide resin
CN114854011B (en) Polyamide acid solution, polyimide film and preparation method thereof
KR20120073909A (en) Polyimide film having excellent high temperature stability and substrate for display device using the same
JP2018131486A (en) Resin composition, method for producing cured product, cured product, flexible substrate, and flexible display
JP2022099806A (en) Varnish composition, method for producing polyimide resin, and additive
JP2024025999A (en) Polyamic acids, polyimides, films and varnishes
JP2023157164A (en) Polyimide with isocyanuric acid backbone