TW202319650A - Turbomolecular vacuum pump - Google Patents
Turbomolecular vacuum pump Download PDFInfo
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- TW202319650A TW202319650A TW111135935A TW111135935A TW202319650A TW 202319650 A TW202319650 A TW 202319650A TW 111135935 A TW111135935 A TW 111135935A TW 111135935 A TW111135935 A TW 111135935A TW 202319650 A TW202319650 A TW 202319650A
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
- F04D19/044—Holweck-type pumps
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D29/00—Details, component parts, or accessories
- F04D29/40—Casings; Connections of working fluid
- F04D29/52—Casings; Connections of working fluid for axial pumps
- F04D29/522—Casings; Connections of working fluid for axial pumps especially adapted for elastic fluid pumps
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D29/00—Details, component parts, or accessories
- F04D29/58—Cooling; Heating; Diminishing heat transfer
- F04D29/582—Cooling; Heating; Diminishing heat transfer specially adapted for elastic fluid pumps
- F04D29/584—Cooling; Heating; Diminishing heat transfer specially adapted for elastic fluid pumps cooling or heating the machine
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D29/00—Details, component parts, or accessories
- F04D29/58—Cooling; Heating; Diminishing heat transfer
- F04D29/582—Cooling; Heating; Diminishing heat transfer specially adapted for elastic fluid pumps
- F04D29/5853—Cooling; Heating; Diminishing heat transfer specially adapted for elastic fluid pumps heat insulation or conduction
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Abstract
Description
本發明有關渦輪分子真空泵。The present invention relates to turbomolecular vacuum pumps.
在封圍件中的高真空之生成需要使用渦輪分子真空泵,其由定子所組成,轉子於定子中被驅動快速旋轉,例如以每分鐘超過九萬轉的速率旋轉。The generation of high vacuum in the enclosure requires the use of a turbomolecular vacuum pump, which consists of a stator in which a rotor is driven in rapid rotation, for example at a rate of more than 90,000 revolutions per minute.
在使用渦輪分子真空泵之某些製程、諸如半導體或LED製造製程中,沉積層可形成於真空泵中。In certain processes using turbomolecular vacuum pumps, such as semiconductor or LED manufacturing processes, deposited layers may be formed in the vacuum pump.
眾所周知,藉著外部加熱帶來加熱定子,以便防止反應產物在泵中的凝結。然而,新世代之製程產生越來越多可凝結的副產物。於某些案例中,傳統之加熱方式不再足以防止副產物的形成,且其係不可能進一步增加定子之溫度,而無機械地削弱鋁轉子的風險。沉積物可接著顯現於高壓壓縮或霍爾韋克階段之定子上,在此與轉子的功能間隙(總計數十毫米)係相當小,轉子幾乎不會暴露,因為其旋轉防止沉積物之附著。如果不進行預防性維護,沉積物可變得更厚,並可於轉子與定子之間發生接觸,由於轉子的高旋轉速率及其動能而導致泵之立即故障。在半導體的製造期間,真空泵之此破壞可導致所製造的一批晶片之破壞及製造設備的數天不能動、以及泵之完全破壞。財務損失可為相當大。It is known to heat the stator by means of external heating strips in order to prevent condensation of reaction products in the pump. However, new generation processes produce more and more condensable by-products. In some cases, conventional heating methods are no longer sufficient to prevent the formation of by-products and it is not possible to further increase the temperature of the stator without the risk of mechanically weakening the aluminum rotor. Deposits can then show up on the stator of the high pressure compression or Holwerk stage, where the functional clearance to the rotor (tens of millimeters in total) is quite small and the rotor is hardly exposed since its rotation prevents deposition of deposits. If preventive maintenance is not performed, deposits can become thicker and contact between the rotor and stator can occur, causing immediate failure of the pump due to the high rotation rate of the rotor and its kinetic energy. During the manufacture of semiconductors, such failure of a vacuum pump can result in the destruction of a batch of wafers being manufactured and the immobilization of the manufacturing equipment for several days, as well as complete failure of the pump. Financial losses can be substantial.
為了限制沉積物於這些關鍵間隙內的積累之風險,一種解決方案可為將霍爾韋克壓縮階段快速加熱至200℃以上的溫度、諸如300℃或400℃,亦即在少於兩分鐘之時段內,以便不加熱整個泵體,並具有最小熱慣性,主要加熱可凝結的沉積物而不加熱定子,並避免霍爾韋克壓縮階段中之冷區的建立。To limit the risk of deposits accumulating in these critical gaps, one solution could be to rapidly heat the Holwerk compression stage to a temperature above 200°C, such as 300°C or 400°C, i.e. in less than two minutes time period so as not to heat the entire pump body and have a minimum thermal inertia, mainly heat the condensable deposits without heating the stator, and avoid the establishment of cold zones in the Holwerk compression stage.
因此,文件FR3101115A1提出將真空加熱裝置配置在泵送氣體之路徑中,以便更好地定位於真空泵內側的加熱。加熱裝置包含加熱電阻及插在霍爾韋克定子與加熱電阻之間的絕緣層。加熱電阻可短暫地通電,例如通電至500℃達一秒,以便不會使轉子過熱。加熱元件之這些高溫允許已沉積於加熱元件上或其旁邊的固體反應產物之蒸發或分解,而不需要加熱轉子。然而,此技術-其尤其是需要在定子上沉積絕緣層-可證明實施起來很複雜,且因此成本很高。再者,於渦輪分子真空泵的氣體之流動路徑中,至配置在真空中的加熱元件之電源亦可證明難以實施。事實上,電纜的包皮、焊料之錫或甚至焊料的保護樹脂都可於藉由加熱元件所產生的真空之下藉由紅外線加熱所損壞。Therefore, document FR3101115A1 proposes to arrange the vacuum heating device in the path of the pumped gas in order to better position the heating inside the vacuum pump. The heating unit consists of a heating resistor and an insulating layer inserted between the Holwerk stator and the heating resistor. The heating resistors may be energized briefly, for example to 500° C. for one second, so as not to overheat the rotor. These high temperatures of the heating elements allow for the evaporation or decomposition of solid reaction products that have deposited on or next to the heating elements without the need to heat the rotor. However, this technique - which requires, inter alia, the deposition of an insulating layer on the stator - can prove complex to implement and therefore costly. Furthermore, in the flow path of the gas of the turbomolecular vacuum pump, the power supply to the heating elements disposed in the vacuum can also prove difficult to implement. In fact, the sheathing of the cable, the tin of the solder or even the protective resin of the solder can be damaged by infrared heating under the vacuum created by the heating element.
本發明之目的之其中一者係提出至少部分地解決現有技術的缺點之渦輪分子真空泵。One of the objects of the present invention is to propose a turbomolecular vacuum pump which at least partially solves the disadvantages of the prior art.
為此目的,本發明有關包含定子及轉子之渦輪分子真空泵,轉子被建構為在定子中旋轉,螺旋溝槽配置於定子的面朝轉子之霍爾韋克裙部的高壓定子中,其特徵在於真空泵亦包含至少一個加熱棒,此加熱棒具有至少一個固持零件及當此加熱棒通電時利用焦耳效應之加熱零件,此固持零件形成用於至加熱零件的電源線之包皮,至少一個連接管道係至少部分地配置在用於固持零件的通過之高壓定子中,此加熱零件係沿著高壓定子的至少一個螺旋溝槽收容。For this purpose, the invention relates to a turbomolecular vacuum pump comprising a stator and a rotor, the rotor being constructed to rotate in the stator, the helical grooves being arranged in the high-voltage stator of the Holwerk skirt of the stator facing the rotor, characterized in that The vacuum pump also comprises at least one heating rod having at least one holding part and a heating part utilizing the Joule effect when the heating rod is energized, the holding part forming a sheath for the power line to the heating part, at least one connecting duct system Arranged at least partially in the high voltage stator for the passage of a holding element, the heating element is received along at least one helical groove of the high voltage stator.
在操作期間,加熱零件當通電時,於氣體之泵送路徑中以大於或等於200℃的溫度輻射出紅外線。在泵送氣體之路徑中,真空泵的通常為反射性之內部表面於沒有沉積物的情況下反射所輻射之熱量,反之此等沉積物-通常為有機材料及放射率較高、大於0.5-吸收熱量。因此,此等沉積物吸收更多熱量,且它們的溫度上升超過真空泵的壁面之溫度。真空泵的內部壁面所反射的熱量亦抵達加熱棒之加熱零件或沉積物。被加熱至高溫的沉積物可接著蒸發,並以氣態形式被驅動朝出口孔口,而不會使轉子或定子之內部壁面過熱。一旦沉積物的厚度係足夠小以不再吸收紅外線輻射,後者係藉由真空泵之壁面所反射。因此,沉積物可自動地消除,而不會控制或循環加熱,其可維持於高溫。此加熱係亦有針對性且因此是有效的,而不會對轉子之完整性造成傷害。During operation, the heating element, when energized, radiates infrared rays at a temperature greater than or equal to 200°C in the pumping path of the gas. In the path of the pumped gas, the usually reflective internal surfaces of the vacuum pump reflect the radiated heat in the absence of deposits, which instead - usually organic materials with high emissivity, greater than 0.5 - absorb heat. Consequently, these deposits absorb more heat and their temperature rises above the temperature of the walls of the vacuum pump. The heat reflected by the inner wall of the vacuum pump also reaches the heating parts or deposits of the heating rod. The deposits heated to high temperature can then be vaporized and driven in gaseous form towards the outlet orifice without overheating the inner walls of the rotor or stator. Once the thickness of the deposit is small enough to no longer absorb infrared radiation, the latter is reflected by the walls of the vacuum pump. Thus, deposits can be eliminated automatically without controlled or cyclic heating, which can be maintained at high temperature. This heating system is also targeted and thus effective without harming the integrity of the rotor.
加熱棒的加熱零件在螺旋溝槽中之配置允許藉由輻射對沉積物加熱,並於高壓定子的加熱之前將其蒸發。加熱棒的加熱零件係亦位於真空泵的定子在氣體循環方向中之高壓側,亦即位於壓力係最高及沉積風險較大的位置。加熱零件在螺旋溝槽中佔用很小空間,且不會破壞分子泵送,因為它們順著螺旋溝槽之曲率。於泵送氣體循環的區域中,只有加熱零件會加熱。在連接管道中所收容之固持零件不會被加熱,且因此不可能因為高溫而造成電源線熔化或損壞。其接著係可能保證高壓定子的良好機械強度及足夠之熱絕緣,以允許加熱棒的溫度上升並輻射進入所泵送氣體之流動路徑。The arrangement of the heating elements of the heating rods in the helical grooves allows heating of the deposit by radiation and vaporization of it prior to heating of the high voltage stator. The heating part of the heating rod is also located on the high-pressure side of the vacuum pump's stator in the direction of gas circulation, that is, at the position where the pressure system is the highest and the risk of deposition is greater. The heating elements take up little space in the helical groove and do not disrupt molecular pumping because they follow the curvature of the helical groove. In the area where the pumped gas circulates, only the heating parts are heated. The holding parts accommodated in the connecting duct are not heated, and therefore it is impossible to melt or damage the power cord due to high temperatures. It is then possible to ensure good mechanical strength of the high voltage stator and sufficient thermal insulation to allow the temperature of the heating rods to rise and radiate into the flow path of the pumped gas.
渦輪分子真空泵亦可包含下面所敘述的一個以上之單獨或結合採用的特徵。A turbomolecular vacuum pump may also include one or more of the features described below, either alone or in combination.
真空泵包含例如1與12根之間的加熱棒。The vacuum pump contains, for example, between 1 and 12 heating rods.
每根加熱棒係在一端部由至少一個固持零件所形成,而附接至加熱零件。固持零件係“非加熱式”,亦即當加熱棒通電時,其溫度設計為低於150℃。加熱零件包含電阻器,當加熱棒通電時,其表面溫度設計為大於或等於200℃。Each heating rod is formed at one end by at least one retaining element attached to the heating element. The holding part is "non-heated", that is, when the heating rod is energized, its temperature is designed to be lower than 150°C. The heating part contains a resistor, and when the heating rod is energized, its surface temperature is designed to be greater than or equal to 200°C.
例如,加熱棒包含由耐潛在腐蝕性泵送氣體之材料所製成的包皮、諸如合金包皮、諸如不銹鋼或鎳包皮。For example, the heating rod comprises a sheath made of a material resistant to the potentially corrosive pumped gas, such as an alloy sheath, such as stainless steel or a nickel sheath.
電源導線可為僅只附接於加熱棒之一側面上、在固持零件的一側面上。然後,加熱零件之端部係自由的,或換句話說,係沒有電連接,其中電阻於連接至固持零件之側面上的電源線之包皮中形成一迴圈。The power lead may be attached to only one side of the heating rod, on the side of the holding part. Then, the end of the heating part is free, or in other words, has no electrical connection, with the resistance forming a loop in the sheath connected to the power line on the side of the holding part.
在替代的解決方案中,電源線可為連接於加熱棒之兩側面上,在加熱棒的包含固持零件之每一端部。於此案例中,僅只中間加熱零件可藉由紅外線輻射有效地加熱其環境。In an alternative solution, the power cord may be connected to both sides of the heating rod, at each end of the heating rod comprising a holding part. In this case, only the middle heating element can effectively heat its environment by means of infrared radiation.
連接管道係例如配置在高壓定子的一端部,例如於高壓定子之平坦環形圓周上方,例如在高壓定子的入口側上,用於要泵送氣體之輸入。當有數條連接管道時,它們例如有規律地分佈在高壓定子之此端部的周邊上。A connecting duct is arranged, for example, at one end of the high-pressure stator, for example above the flat annular circumference of the high-pressure stator, for example on the inlet side of the high-pressure stator, for the input of the gas to be pumped. When there are several connecting ducts, they are for example regularly distributed over the periphery of this end of the high voltage stator.
於示範性實施例中,真空泵包含至少與高壓定子一樣多之加熱棒,包含螺旋溝槽,至少一個加熱零件被收容在各個相關聯的螺旋溝槽中。In an exemplary embodiment, the vacuum pump comprises at least as many heating rods as the high voltage stator, comprising helical grooves, at least one heating element being received in each associated helical groove.
於另一示範性實施例中,加熱零件係沿著至少兩個螺旋溝槽收容。In another exemplary embodiment, the heating element is accommodated along at least two spiral grooves.
加熱零件較佳係延伸超過高壓定子之螺旋溝槽,進入位於高壓定子之出口與真空泵的回流孔口之間的環形回流空間,及/或進入真空泵之渦輪分子階段。然後,其係亦可能藉由輻射加熱來加熱環形回流空間及/或渦輪分子階段。The heating element preferably extends beyond the helical groove of the high pressure stator, into the annular return space between the outlet of the high pressure stator and the return orifice of the vacuum pump, and/or into the turbomolecular stage of the vacuum pump. It is then also possible to heat the annular recirculation space and/or the turbomolecular stage by means of radiative heating.
真空泵亦可包含至少一個附加的加熱棒,其具有至少一個固持零件及當此附加之加熱棒通電時利用焦耳效應的加熱零件,此固持零件形成用於加熱零件之電源線的包皮。至少一個附加之棒的固持零件係位於至少一條連接管道中,此加熱零件被收容在位於高壓定子之出口與真空泵的回流孔口之間的環形回流空間中,及/或在此真空泵之渦輪分子階段中。例如,規定至少一個加熱棒及至少一個附加加熱棒的固持零件被收容於同一連接管道中。The vacuum pump may also comprise at least one additional heating rod having at least one holding part and a heating part utilizing the Joule effect when the additional heating rod is energized, the holding part forming a sheath for the power cord for heating the part. At least one additional rod holding part is located in at least one connecting duct, the heating part is accommodated in the annular return space between the outlet of the high-pressure stator and the return orifice of the vacuum pump, and/or the turbomolecular of the vacuum pump stage. For example, it is provided that the holding parts of at least one heating rod and at least one additional heating rod are accommodated in the same connecting duct.
通道可提供在螺旋溝槽之基底中,用於收容加熱零件。Channels may be provided in the base of the helical groove for receiving heating elements.
加熱棒可預先形成為連接管道及相關聯螺旋溝槽的形狀。加熱棒包含例如可為冷成形之電阻。因此,加熱棒可為僅只經由幾個用於附接至高壓定子的區域(兩個或三個)連接,故藉由傳導傳送非常少之熱量,大部分係藉由紅外線輻射傳送。The heating rods may be pre-formed in the shape of the connecting pipes and associated helical grooves. The heating rod comprises, for example, a resistance which may be cold formed. Thus, the heating rods may be connected via only a few areas (two or three) for attachment to the high voltage stator, so very little heat is transferred by conduction, mostly by infrared radiation.
定子亦可包含固定至高壓定子的端部之第一個環形固定板,連接管道係至少部分地配置在此端部中,以便關閉連接管道並保留固持零件,連接管道配置於藉由第一個固定板所關閉的高壓定子之端部中、及/或在第一個固定板中。The stator may also comprise a first annular fixing plate fixed to the end of the high-voltage stator in which the connecting duct is arranged at least partially in order to close the connecting duct and retain the holding part, the connecting duct being arranged by means of the first In the end of the high voltage stator closed by the fixing plate and/or in the first fixing plate.
定子亦可包含固定至高壓定子的相反端部之第二個環形固定板,以便保留加熱零件或另一個固持零件或諸多零件的端部。另一固持零件(於提供之處)係位於加熱棒之另一端部。The stator may also comprise a second annular fixing plate fixed to the opposite end of the high voltage stator in order to retain the end of the heating part or another holding part or parts. Another retaining part (where provided) is located at the other end of the heating rod.
根據另一範例,連接管道係至少部分地配置在高壓定子的面朝定子之葉片階段的端部中,連接管道係藉由葉片階段之圓環所封閉,並配置於此圓環中及/或高壓定子的端部中。According to another example, connecting ducts are arranged at least partially in the end of the high-pressure stator facing the vane stage of the stator, the connecting ducts are closed by the ring of the vane stage and are arranged in this ring and/or In the end of the high voltage stator.
加熱零件較佳地係主要無接觸地固持在高壓定子之螺旋溝槽中。The heating elements are preferably held mainly contact-free in the helical grooves of the high-voltage stator.
為此,真空泵可包含配置於螺旋溝槽中的熱絕緣間隔件。To this end, the vacuum pump may comprise thermally insulating spacers arranged in the helical grooves.
替代地或另外,加熱零件可經由配置在螺旋溝槽之側壁中的兩個孔口被固持於螺旋溝槽中。Alternatively or additionally, the heating element may be held in the helical groove via two apertures arranged in the side walls of the helical groove.
根據一個示範性實施例,真空泵亦包含用於將吹掃氣體注入連接管道之吹掃氣體輸入。相對高壓定子的內部,吹掃氣體係在連接管道中處於較高壓力之下,因此為泵送氣體建立動態屏障。因此,位於潛在腐蝕性泵送氣體通過之區域與始終處於真空之下的區域之間的連接管道本身並未密封,但在機械及熱方面係堅固的,並藉由吹掃氣體之掃除流動來保護免於潛在腐蝕性泵送氣體的影響。因此,加熱棒之固持零件被保護免於泵送氣體及紅外線輻射的影響。然後,真空泵可包含傳統之密封連接器,其配置在與非常熱的區域保持一定距離處。這避免環繞加熱棒建立溫度密閉之通道,其將需要使用能夠承受高達接近加熱棒的200℃之高溫的材料用於密封配件,能夠耐得住加熱棒與高壓定子之間的熱膨脹差,並能夠耐得住在一些案例中可為高度腐蝕性之氣體的侵蝕。整個連接可被吹掃,同時防止泵送氣體之進入。According to an exemplary embodiment, the vacuum pump also comprises a purge gas input for injecting purge gas into the connecting pipe. The purge gas system is under higher pressure in the connecting piping than inside the high-pressure stator, thus creating a dynamic barrier for the pumped gas. Therefore, the connecting duct between the area through which the potentially corrosive pumped gas passes and the area which is always under vacuum is not itself sealed, but is mechanically and thermally robust and is secured by the sweeping flow of purge gas. Protected from potentially corrosive pumped gases. Thus, the holding parts of the heating rod are protected from the pumped gas and from infrared radiation. The vacuum pump may then incorporate conventional hermetic connectors placed at a distance from very hot areas. This avoids creating a temperature-tight passage around the heating rod, which would require the use of materials that can withstand temperatures up to 200°C close to the heating rod for the sealing fittings, be able to withstand the differential thermal expansion between the heating rod and the high voltage stator, and be able to Resistant to the attack of highly corrosive gases in some cases. The entire connection can be purged while preventing the ingress of pumped gas.
吹掃氣體輸入包含例如與圍繞高壓定子的環形空間相通之公共管道,此公共管道與連接管道相通。The purge gas input comprises, for example, a common duct communicating with the annular space surrounding the high-voltage stator, the common duct communicating with the connecting duct.
圍繞高壓定子的環形空間亦可連結至插入高壓定子與定子的高壓殼體之間的環形通道,此高壓殼體圍繞高壓定子並將高壓定子連接至回流孔口。環形通道允許吹掃氣體通過兩個零件之整個圓周上方。如於連接管道中,注入環形通道的吹掃氣體係相對環形回流空間在較高壓力之下,因此為泵送氣體建立動態屏障,並允許於環形通道中避免使用密封配件。The annular space surrounding the high voltage stator may also be connected to an annular channel inserted between the high voltage stator and the high voltage housing of the stator, which surrounds the high voltage stator and connects the high voltage stator to the return orifice. The annular channel allows the purge gas to pass over the entire circumference of the two parts. As in the connection piping, the purge gas system injected into the annular channel is at a higher pressure relative to the annular return space, thus creating a dynamic barrier for the pumped gas and allowing the use of sealing fittings to be avoided in the annular channel.
吹掃氣體輸入可包含另外的管道,其使環形空間與收容密封配件之定子的密封通道相通。除了允許在高壓定子與高壓殼體之間的整個圓周上方供給吹掃氣體以外,此環形空間允許吹掃氣體進入附加管道直至密封通道。因此,密封配件可於低成本下保護免受腐蝕性氣體之影響,其允許對於密封配件使用耐化學性較差的材料,且從而降低價格。The purge gas input may comprise an additional conduit which communicates the annulus with the seal passage of the stator housing the seal fitting. In addition to allowing the purge gas to be supplied over the entire circumference between the high pressure stator and the high pressure housing, this annular space allows the purge gas to enter the additional duct up to the sealing channel. Thus, the sealing fittings can be protected from corrosive gases at low cost, which allows the use of less chemically resistant materials for the sealing fittings and thus reduces the price.
用以與泵送氣體相通之定子的內部壁面及轉子之壁面亦例如具有小於或等於0.2的放射率,已知為低放射率。例如,它們係金屬的,由鋁或不銹鋼材料所製成,或具有低放射率之塗層,諸如含有鎳。壁面可為拋光的。這些具有低放射率之表面具有反射紅外線輻射的優點,其首先允許避免加熱定子之內部壁面及轉子的用以與泵送氣體相通之壁面,且其次是將熱量集中在沉積物上,此等沉積物大致上是有機沉積物,其放射率係高於低放射率的表面。這利用定子及轉子之壁面係由具有低放射率、尤其是允許耐腐蝕的材料所製成,此等壁面係與泵送氣體相通,且由鋁、不銹鋼材料或塗覆鋼或鋁所製成。這些低放射率之特性有助於避免真空泵的加熱,同時促進不想要沉積物之加熱。The inner walls of the stator and the walls of the rotor for communicating with the pumped gas also have emissivity less than or equal to 0.2, known as low emissivity, for example. For example, they are metallic, made of aluminum or stainless steel material, or have a low emissivity coating, such as containing nickel. The walls may be polished. These surfaces with low emissivity have the advantage of reflecting infrared radiation, which firstly allows avoiding heating of the inner walls of the stator and of the walls of the rotor intended to communicate with the pumped gas, and secondly concentrates the heat on the deposits, which deposits Deposits are largely organic deposits with higher emissivity than low emissivity surfaces. This takes advantage of the fact that the walls of the stator and rotor are made of materials with low emissivity, especially allowing corrosion resistance, these walls communicate with the pumped gas and are made of aluminum, stainless steel material or coated steel or aluminum . These low emissivity properties help avoid vacuum pump heating while promoting heating of unwanted deposits.
渦輪分子真空泵亦可包含定子的外部加熱裝置、諸如加熱電阻帶,用於將定子加熱至參考溫度,例如大於80℃、諸如100℃。藉由加熱棒之加熱接著補充定子的外部加熱裝置。The turbomolecular vacuum pump may also comprise external heating means of the stator, such as heating resistance bands, for heating the stator to a reference temperature, eg greater than 80°C, such as 100°C. The heating by the heating rods then supplements the external heating of the stator.
渦輪分子真空泵亦可包含冷卻裝置,尤其是用於冷卻渦輪分子階段之第一個葉片階段。例如,藉由水在周遭溫度下的循環,冷卻裝置允許此溫度被控制至小於或等於75℃、例如70℃之溫度。The turbomolecular vacuum pump may also comprise cooling means, especially for cooling the first vane stage of the turbomolecular stage. For example, by circulation of water at the ambient temperature, the cooling device allows this temperature to be controlled to a temperature less than or equal to 75°C, for example 70°C.
以下的實施例係示範性。儘管此敘述提及一個以上之實施例,但這並不一定意指每一個參考都有關相同的實施例,或此等特徵僅只適用於單一實施例。不同實施例之個別特徵亦可組合或互換,以便提供其他實施例。The following examples are exemplary. Although this description refers to more than one embodiment, this does not necessarily mean that each reference is to the same embodiment, or that these features are only applicable to a single embodiment. Individual features of different embodiments can also be combined or interchanged in order to provide other embodiments.
“上游”一詞意指相對泵送氣體的循環方向F1置於另一元件之前的元件。相比之下,“下游”一詞意指相對泵送氣體的循環方向F1置於另一元件後面之元件。The term "upstream" means an element placed before another element with respect to the circulation direction F1 of the pumped gas. In contrast, the term "downstream" means an element placed behind another element with respect to the circulation direction F1 of the pumped gas.
圖1說明示範性渦輪分子真空泵1。FIG. 1 illustrates an exemplary
真空泵1包含定子2,其中轉子3被設計為以高軸向旋轉速率旋轉,例如以每分鐘超過九萬轉的速率旋轉。The
氣體經由真空泵1之進氣孔口6進入,首先通過渦輪分子階段4、接著是分子階段5,且接著朝用以連接至主泵的真空泵1之回流孔口7排空。例如,環形入口突緣8圍繞進氣孔口6,以便將真空泵1連接至要降低壓力的封圍件。在操作中,氣體係於泵送氣體之循環方向F1中從進氣孔口6驅動至回流孔口7。The gas enters through the
在渦輪分子階段4中,轉子3包含至少兩個翼片階段9,且定子包含至少一個葉片階段10。翼片階段9及葉片階段10係沿著轉子3的轉軸I-I依次軸向地配置。轉子3包含例如四個以上之翼片階段9,例如於四個與十二個翼片階段9之間。In the
轉子3的每一翼片階段9包含有角度之翼片,此等翼片從轉子3的輪轂11在實質上徑向方向中延伸,輪轂11係例如藉由螺絲配件固定至真空泵1之驅動軸桿12。翼片係有規律地分佈環繞輪轂11的周邊。Each
定子2之每一葉片階段10包含圓環,環繞圓環的內周邊規律分佈之有角度的葉片由此圓環以大致上徑向的方向延伸。定子2之葉片階段10的葉片嚙合在轉子3之兩個連續翼片階段9的翼片之間。轉子3的翼片9、及定子2之葉片10係有角度的,以便將泵送氣體之分子導引至分子階段5。Each
於分子階段5中,轉子3包含在至少兩個翼片階段9下游的霍爾韋克裙部13,並以光滑圓柱體形成,此圓柱體相對配置於已知為霍爾韋克定子或高壓定子19(看圖2及3)的定子2之一部分中的螺旋溝槽14旋轉。高壓定子19包含複數個彼此上下配置之螺旋溝槽14。例如,有在三個與十個之間的螺旋溝槽14,諸如六個。高壓定子19係例如由鋁材料製成,並可具有低放射率之鎳型塗層。設計高壓定子19,以便增加用於所謂的中間壓力之真空泵1的壓縮率。螺旋溝槽14允許泵送氣體被壓縮並導引朝回流孔口7。In the
轉子3被設計成在定子2中藉由真空泵1之內部馬達16驅動旋轉。馬達16係例如配置於定子2的鐘形外殼17中,它本身被配置在轉子3之內碗15下方,轉子3的驅動軸桿12通過定子2之鐘形外殼17。The
轉子3係藉由支撐轉子3的驅動軸桿12並位於定子2中之磁性軸承18或機械滾子軸承橫向及軸向地導引。The
真空泵1可包含收容在定子2中、例如於鐘形外殼17中的冷卻裝置,或與諸如液壓迴路之鐘形外殼17熱接觸,用於持續地冷卻鐘形外殼17及其含有的元件、諸如尤其是軸承18、馬達16及其他電相關元件或電子元件,以便允許其發揮作用及/或冷卻渦輪分子階段4之第一個葉片階段10。此冷卻裝置允許例如藉由水在周遭溫度下的循環,將溫度控制至小於或等於75℃之溫度、例如70°。The
真空泵1亦可包含吹掃裝置25,其包含被設計成連接至吹掃氣體來源的入口管道27,以便將吹掃氣體引導進入定子2之鐘形外殼17與轉子3的內碗15之間的間隙。藉由圖1上之箭頭f2示意地指示吹掃氣體的循環。吹掃氣體較佳地係空氣或氮氣,但亦可為另一惰性氣體、諸如氦氣或氬氣。吹掃氣體之流動係輕微的。The
真空泵1亦包含至少一個加熱棒20,例如在1與12個加熱棒20之間,於此是6個(圖4)。The
每一加熱棒20包含至少一個固持零件20a及加熱零件20b,其當加熱棒20通電時利用焦耳效應。Each
每一加熱棒20係藉由在一端部附接至加熱零件20b的至少一個固持零件20a所形成。固持零件20a係“非加熱式”、亦即被設計成當加熱棒20通電時具有低於150℃之溫度。加熱零件20b包含電阻,其被設計成當加熱棒20通電時具有大於或等於200℃的溫度。Each
例如,加熱棒20包含由抗潛在腐蝕性泵送氣體之材料所製成的包皮、諸如合金包皮、諸如不銹鋼或鎳包皮。For example, the
例如,加熱棒20係以140 V供電,以便於真空之下獲得接近400℃的加熱零件20b之表面溫度,允許藉由紅外線輻射加熱環境,同時保留可收容的使用壽命。For example, the
加熱棒20可為串聯或並聯地電連接在一起。可同步地供應所有加熱棒20、或至少一群組之加熱棒20。二者取一地,加熱棒20可非同步地、分組或單獨地供應。加熱棒20可連續地或以循環方式供應,亦即通電週期與非通電週期交替地進行。一循環可有變動的長度,亦即具有於幾毫秒與數分鐘之間的循環持續時間。電力控制系統可考慮到加熱棒20之溫度、高壓定子19的溫度、轉子3之溫度、馬達16的扭矩、或來自真空泵1之另一感測器、諸如配置在氣體的流動路徑中之沉積物感測器或壓力感測器的信號。The
加熱棒20之橫截面可為圓形、橢圓形、正方形、長方形或扁平的。例如,加熱棒20具有直徑於2 mm與5 mm之間、諸如3.7 mm的圓形橫截面。The cross-section of the
固持零件20a具有例如大於100 mm、諸如150 mm之長度。此固持零件20a形成用於加熱棒20的電源線之包皮。The holding
電源線可僅只連接在加熱棒20的一側面上、於固持零件20a之側面上。然後,加熱零件20b的端部係保持自由,或換句話說未電連接,其中電阻在連接至固持零件20a之側面上的電源線之包皮中形成一迴圈。The power cord can be connected only to one side of the
二者取一地,電源線可為連接於加熱棒20的兩側面上,加熱棒20之每一端部包含固持零件20a。然後僅只中間的加熱零件20b藉由紅外線輻射有效地加熱其環境。Alternatively, the power cord may be connected to both sides of the
至少一條連接管道21係至少部分地配置在高壓定子19中,用於使固持零件20a通過(圖4)。At least one connecting
連接管道21係例如至少部分地配置在高壓定子19之端部、例如於高壓定子19的平坦環形周邊上、例如在待泵送氣體之入口處配置於高壓定子19的入口之側面上。這些連接管道21係例如在高壓定子19的此端部有規律地分佈於周邊上方。它們具有各個橫截面,此橫截面係實質上大於加熱棒20之橫截面,例如對於直徑為3.7 mm的加熱棒20來說,此橫截面為4 mm x 4 mm,以便形成低傳導性,正如下文所見,其尤其是限制吹掃氣體之流出。The connecting
例如,加熱零件20b具有超過200 mm的長度,諸如在250 mm與1700 mm之間。For example, the
加熱零件20b係沿著高壓定子19的至少一個螺旋溝槽14收容、例如於螺旋溝槽14之中間(圖2、3)、或接近螺旋溝槽14的側壁14a(圖7)。The
尺寸略大於加熱棒20之那些尺寸的通道22亦可配置在螺旋溝槽14之基底中、於每一溝槽14中、例如在溝槽14的中間,用於收容加熱零件20b(圖3)。通道22之橫截面形狀可為正方形、矩形、圓形或任何另一可加工的形式。通道22可位於溝槽14之中心,或從中心朝側壁的其中一者偏置。
真空泵1包含例如與高壓定子19一樣多之加熱棒20,具有螺旋溝槽14且因此具有連接管道21,其中至少一個加熱零件20b被收容在相關聯的各個螺旋溝槽14中。The
真空泵1可包含比高壓定子19更多之加熱棒20,並具有螺旋溝槽14。尤其是,真空泵1可於每一螺旋溝槽14中包含一個以上的加熱棒20、例如兩個。The
螺旋溝槽14沿著高壓定子19從一端部延伸至另一端部。它們首先在高壓定子19之一端部通入連接管道21,且其次可通入位於在相反端部之高壓定子19的出口與回流孔口7之間的環形回流空間34。連接管道21係例如線性的,並以藉由相關聯之螺旋溝槽14所給與的角度之連續性定向。The
加熱棒20的加熱零件20b可延伸超出高壓定子19之螺旋溝槽14,例如進入環形回流空間34,或甚至超出回流孔口7及/或進入渦輪分子階段4。其接著可能亦藉由輻射熱來加熱環形回流空間34及/或渦輪分子階段4。The
當真空泵1包含數個加熱棒20時,加熱零件20b的數個端部可突出進入環繞高壓定子19之環形回流空間34。例如,加熱零件20b的六個端部突出進入環形回流空間34,有規律地分佈環繞高壓定子19(圖2)。When the
加熱零件20b較佳地係主要為無接觸地固持於高壓定子19之螺旋溝槽14中、或在所提供的螺旋溝槽14的通道22中,以便避免定子2藉由傳導加熱。儘管加熱棒20與高壓定子19可具有數個點接觸,但於初級真空之下藉由傳導所傳輸的熱量保持非常低。The
為此,加熱棒20可被預先成形,亦即在被安裝於高壓定子19中之前,順著連接管道21的形狀及相關聯螺旋溝槽14之形狀、及-在提供之處-通道22的形狀事先塑形。加熱棒20包含例如可冷成形之電阻器。因此,加熱棒20可僅只藉由用於附接至高壓定子19的幾個區域(兩個或三個)連接,所以藉由傳導傳送之熱量非常少,大部分係藉由紅外線輻射所傳送。For this purpose, the
定子2亦可包含例如藉由螺絲配件固定至高壓定子19的端部之第一個環形固定板23,連接管道21係配置在高壓定子19的端部中及/或第一個固定板23中,第一個固定板23封閉連接管道21並將固持零件20a保留於連接管道21中(圖2及4)。The
定子2亦可包含第二個環形固定板24,在此由數個片段所製成,並例如藉由螺絲配件固定至高壓定子19之相反端部,以便當加熱棒20在每一端部包含固持零件20a時,保留位於加熱棒20的另一端部之加熱零件20b或固持零件20a的端部。固定板23、24有助於將加熱棒20保留在螺旋溝槽14中、尤其是於預先成形加熱棒20之案例中。The
在另一範例中,連接管道21係至少部分地配置於高壓定子19的面向定子2之葉片階段10的端部中,連接管道21係藉由葉片階段10之圓環所封閉並配置在此圓環中及/或於高壓定子19的端部中。In another example, a connecting
下文將參照圖6及圖7敘述其他示範性實施例,其允許加熱零件20b主要以無接觸方式保留在螺旋溝槽14中。Further exemplary embodiments will be described below with reference to FIGS. 6 and 7 , which allow the
於操作中,加熱零件20b在通電時,於氣體之泵送路徑中在大於或等於200℃的溫度、諸如300℃、且例如小於700℃下輻射紅外線。在泵送氣體之路徑中,真空泵1的內部表面通常為反射性,於沒有沉積物之情況下反射所輻射的熱量,反之沉積物-通常為有機材料且具有大於0.5的高放射率-吸收熱量。因此,沉積物吸收更多熱量,且溫度比真空泵1之壁面上升得更快。藉由真空泵1的內部壁面所反射之熱量亦抵達加熱棒20的加熱零件20b或沉積物。被加熱至高溫之沉積物可接著蒸發並以氣態形式被驅動朝出口孔口7,而不會使轉子3或定子2的內部壁面過熱。一旦沉積物之厚度足夠低,以不再吸收紅外線輻射,就會藉由真空泵1的壁面所反射。因此,沉積物可被自動地消除,而未控制或循環加熱,此加熱可保留於高溫。再者,此加熱是有針對性且因此有效,而不會對轉子3之完整性造成傷害。In operation, the
用以與泵送氣體相通的定子2之內部壁面及轉子3的壁面例如具有小於或等於0.2之放射率,已知為低放射率。用以與泵送氣體相通並具有低放射率的定子2之內部壁面及轉子3的壁面係例如金屬的,由鋁或不銹鋼材料所製成,或具有低放射率之塗層、諸如包含鎳。壁面可被拋光。這些具有低放射率的表面具有反射紅外線輻射之優點,其允許首先避免加熱用以與泵送氣體相通的定子2之內部壁面及轉子3的壁面,且其次將熱量集中在沉積物上,此等沉積物通常是其放射率高於低放射率之表面的有機沉積物。這利用與泵送氣體相通且由鋁、不銹鋼材料或塗覆鋼或鋁所製成之定子2及轉子3的壁面係由具有低放射率之材料所製成的事實,其尤其是允許耐腐蝕。低放射率之這些特性有助於避免真空泵1的加熱,同時促進不想要沉積物之加熱。The inner wall surface of the
加熱棒20的加熱零件20b在螺旋溝槽14中之配置允許於加熱高壓定子19之前藉由輻射重新加熱沉積物並同樣使其蒸發。加熱棒20的加熱零件20b係亦在氣體循環方向中位於真空泵1之定子2的高壓側上,亦即在壓力為最高或沉積物風險較大之位置。加熱零件20b於螺旋溝槽14中佔用的空間很小,且不會破壞分子泵送,因為它們順著螺旋溝槽14之曲率。僅只加熱零件20b在泵送氣體循環的區域中加熱。連接管道21中所收容之固持零件20a未被加熱,且因此不可能因為高溫而造成電源線的熔化或損壞。其接著係可能保證高壓定子19之良好機械強度及足夠的熱絕緣,以允許加熱棒20之溫度上升並輻射進入泵送氣體的流動路徑。The arrangement of the
渦輪分子真空泵1亦可包含定子2之外部加熱裝置、諸如加熱電阻帶,用於將定子2加熱至參考溫度、例如大於80℃、諸如100℃。然後藉由加熱棒20的加熱來補充定子2之外部加熱裝置。The
根據示範性實施例,真空泵1包含設計用於將吹掃氣體注入連接管道21的吹掃氣體輸入27。例如,吹掃氣體輸入27將真空泵1之吹掃裝置25的入口管道26連接至連接管道21。根據另一範例,吹掃氣體輸入27將附加之吹掃氣體入口管道連接至此連接管道21,此附加的入口管道係獨立於吹掃裝置25之入口管道26。According to an exemplary embodiment, the
吹掃氣體輸入27包含例如與圍繞高壓定子19的環形空間27b相通之公共管道27a,其本身係與連接管道21相通。公共管道27a係例如與吹掃裝置25的入口管道26相通,或與輔助入口管道相通。此吹掃氣體輸入27係例如配置在定子2之高壓殼體29中,此殼體圍繞高壓定子19並將高壓定子19連接至回流孔口7,以便使離開高壓定子19的泵送氣體與回流孔口7相通。The
於操作中,吹掃氣體進入此吹掃氣體輸入27,然後進入公共管道27a,且接著進入環形空間27b。吹掃氣體進入圍繞高壓定子19之環形空間27b,且接著進入藉由第一個封閉板23所封閉的連接管道21,通過連接管道21,並用泵送氣體驅動朝回流孔口7。吹掃氣體係相對高壓定子19之內部在連接管道21中的較高壓力之下,從而為泵送氣體建立動態屏障。In operation, purge gas enters this
因此位於可能有腐蝕性的泵送氣體通過之區域與始終處於真空狀態之下的區域之間的連接管道21係本身未密封,但在機械上及熱力上是堅固的,並藉由吹掃氣體之掃掠流動來保護其免受潛在腐蝕性泵送氣體的影響。因此,加熱棒20之固持零件20a被保護免受泵送氣體及紅外線輻射的影響。然後,真空泵1可包含配置於與非常熱之區域離一定距離處的傳統密封連接器。這避免環繞加熱棒20之溫度密閉通道的建立,其將需要使用能夠忍受接近加熱棒20之高達200℃的高溫材料作為密封配件,及能夠耐得住加熱棒20與高壓定子19之間的不同熱膨脹,且能夠耐得住在一些案例中可為高度腐蝕性之氣體的侵蝕。整個連接可被吹掃,同時防止泵送氣體進入。The connecting
根據示範性實施例,圍繞高壓定子19之環形空間27b係連接至插入高壓定子19與定子2的高壓殼體29之間的環形通道28(於圖5之頂部的細節)。環形通道28可配置在高壓殼體29或高壓定子19中。According to an exemplary embodiment, the
於操作中,吹掃氣體進入吹掃氣體輸入27、公共管道27a、及接著環形空間27b、連接管道21及高壓定子19與高壓殼體29之間的環形通道28。環形通道28允許吹掃氣體在兩個零件之整個圓周上方通過。如於連接管道21中,注入環形通道28的吹掃氣體係相對環形回流空間34在較高壓力之下,因此為泵送氣體建立動態屏障,且避免於環形通道28中使用密封配件。In operation, purge gas enters purge
根據示範性實施例,吹掃氣體輸入27包含將環形空間27b帶入與收容密封配件33的定子2之密封通道30相通的附加管道32。According to an exemplary embodiment, the
例如,附加管道32將環形通道28或環形空間27b帶入與定子2之回流連接件31的密封通道30相通(在圖5之底部的細節)。密封通道30被配置於回流連接件31與高壓殼體20的本體之間,吹掃氣體輸入27係配置在高壓殼體20中。回流連接件31包含用於連接至真空泵1的回流孔口7之管件及突緣,它們是用於真空的標準。For example, an
在操作中,吹掃氣體進入吹掃氣體輸入27、公共管道27a及接著進入環形空間27b、連接管道21及附加管道32直至密封通道30,從而保護密封配件33免受潛在腐蝕性泵送氣體之影響。和允許於高壓定子19與高壓殼體29之間的整個圓周上方引導吹掃氣體一樣,環形空間27b允許吹掃氣體被傳送至一直下降至密封通道30之附加管道32。因此,密封配件33可在低成本下保護免受腐蝕性氣體的影響,其允許對於密封配件33使用耐化學性較差且因此價格便宜之材料。In operation, purge gas enters purge
根據另一範例,附加管道(未示出)將環形通道28或環形空間27b帶入與位於真空泵1的高壓殼體29與低壓殼體37之間的密封通道36相通。低壓殼體37承載著定子2(圖1)之葉片階段10的圓環。如前面之範例中所敘述,用於密封通道36中所收容的密封配件33,吹掃氣體允許避免使用特殊之材料。According to another example, an additional conduit (not shown) brings the
用於加熱棒20的其他實施例係可能的。Other embodiments for the
尤其是,加熱棒20之加熱零件20b可沿著至少兩個螺旋溝槽14收容。例如,加熱零件20b沿著第一個螺旋溝槽14下降,並沿著相鄰的第二個螺旋溝槽14上升。然後,真空泵1可包含比高壓定子19較少之加熱棒20,且包含螺旋溝槽14,其中同一加熱棒20具有依次通過兩個以上的螺旋溝槽14之加熱零件20b。In particular, the
在數個螺旋溝槽14中延伸的加熱棒20之加熱零件20b可延伸超出高壓定子19的螺旋溝槽14,例如進入環形回流空間34及/或進入渦輪分子階段4,甚至超過回流孔口7。The
真空泵1可包含於所有螺旋溝槽14中延伸之單一加熱棒20,加熱棒20依次先上升後下降通過所有螺旋溝槽14(未示出)。此組構尤其適合用於包含兩個用於電連接的固持零件20a之加熱棒20,在加熱零件20b的每一側面上各有一個固持零件。The
圖6顯示第二個示範性實施例。Figure 6 shows a second exemplary embodiment.
於此範例中,渦輪分子真空泵1包含配置在每一螺旋溝槽14中之熱絕緣間隔件35、例如兩個或三個,以便固持與高壓定子19間隔的加熱棒20。例如,至少一個間隔件35係配置於螺旋溝槽14之入口處,且一個間隔件係由螺旋溝槽14配置在出口處。間隔件35例如係由陶瓷材料所製成,並具有與加熱棒20的橫截面互補之圓柱形孔口。這限制加熱棒20的加熱零件20b與高壓定子19之間的熱接觸,並因此限制定子2之加熱。In this example, the
對於間隔件35有數種形式係可能的。例如,它們例如可具有塊狀形式(圖6)或具有圓環或類似者之形式。例如,間隔件亦可具有與螺旋溝槽14的互補形狀配合之形狀、諸如導軌。Several forms are possible for the
此範例的其他特徵係與第一示範性實施例之那些特徵類似。Other features of this example are similar to those of the first exemplary embodiment.
圖7顯示第三示範性實施例。Fig. 7 shows a third exemplary embodiment.
在此範例中,加熱零件20b主要係經由配置於螺旋溝槽14的側壁14a中之兩個孔口無接觸地固持在高壓定子19的螺旋溝槽14中。例如,一個孔口係於側壁14a中配置在至螺旋溝槽14之入口處,且於氣體循環方向中,一個孔口係在側壁14a中配置在離螺旋溝槽14的出口處。在此,其係將加熱零件20b固持於螺旋溝槽14中之適當位置的螺旋溝槽14,主要未與螺旋溝槽14接觸。In this example, the
此範例之其他特徵係與前面兩個示範性實施例的那些特徵類似。Other features of this example are similar to those of the previous two exemplary embodiments.
1:渦輪分子真空泵
2:定子
3:轉子
4:渦輪分子階段
5:分子階段
6:進氣孔口
7:回流孔口
8:入口突緣
9:翼片階段
10:葉片階段
11:輪轂
12:驅動軸桿
13:霍爾韋克裙部
14:螺旋溝槽
14a:側壁
15:內碗
16:馬達
17:鐘形外殼
18:磁性軸承
19:高壓定子
20:加熱棒
20a:固持零件
20b:加熱零件
21:連接管道
22:通道
23:固定板
24:固定板
25:吹掃裝置
26:入口管道
27:吹掃氣體輸入
27a:公共管道
27b:環形空間
28:環形通道
29:高壓殼體
30:密封通道
31:回流連接件
32:附加管道
33:密封配件
34:回流空間
35:間隔件
36:密封通道
37:高壓殼體
F1:氣體的循環方向
f2:箭頭
I:轉軸
1: Turbo molecular vacuum pump
2: Stator
3: rotor
4: Turbomolecular stage
5: Molecular stage
6: Air inlet orifice
7: Return orifice
8: Entrance flange
9:Foil stage
10: Blade stage
11: hub
12: Drive shaft
13: Holwick Skirt
14:
進一步優點及特徵將由閱讀以下對本發明的特定實施例之敘述、並由附圖變得明顯,此敘述絕不是限制性的,其中:Further advantages and features will become apparent from reading the following description of specific embodiments of the invention, and from the accompanying drawings, which are by no means limiting, in which:
[圖1]顯示根據第一實施例之渦輪分子真空泵的軸向剖面圖。[ Fig. 1 ] An axial sectional view showing a turbomolecular vacuum pump according to a first embodiment.
[圖2]顯示來自圖1之渦輪分子真空泵的元件之剖面圖(沿著兩個徑向平面),具有以虛線描繪的第一個固定板。[ FIG. 2 ] Shows a cross-sectional view (along two radial planes) of elements of the turbomolecular vacuum pump from FIG. 1 , with the first fixed plate depicted in dotted lines.
[圖3]顯示來自圖2之元件的軸向剖面圖,並具有放大之細節。[ FIG. 3 ] shows an axial cross-sectional view of the element from FIG. 2 with enlarged details.
[圖4]顯示來自圖2的元件之拆解視圖。[ Fig. 4 ] An exploded view showing the element from Fig. 2 .
[圖5]係來自圖1的真空泵之一部分的軸向剖視圖,具有第一個及第二個放大之細節。[ FIG. 5 ] is an axial cross-sectional view of a part of the vacuum pump from FIG. 1 , with first and second enlarged details.
[圖6]顯示與圖3類似而用於第二個實施例的視圖。[ Fig. 6 ] A view similar to Fig. 3 is shown for the second embodiment.
[圖7]顯示用於第三示範性實施例之渦輪分子真空泵的元件之剖視圖。[ Fig. 7 ] A sectional view showing elements used in a turbomolecular vacuum pump of a third exemplary embodiment.
在此等圖面上,完全相同的元件帶有相同之參考符號。In these figures, identical elements bear the same reference symbols.
1:渦輪分子真空泵 1: Turbo molecular vacuum pump
2:定子 2: Stator
3:轉子 3: rotor
4:渦輪分子階段 4: Turbomolecular stage
5:分子階段 5: Molecular stage
6:進氣孔口 6: Air inlet orifice
7:回流孔口 7: Return orifice
8:入口突緣 8: Entrance flange
9:翼片階段 9:Foil stage
10:葉片階段 10: Blade stage
11:輪轂 11: hub
12:驅動軸桿 12: Drive shaft
13:霍爾韋克裙部 13: Holwick Skirt
14:螺旋溝槽 14: spiral groove
15:內碗 15: inner bowl
16:馬達 16: Motor
17:鐘形外殼 17: bell shell
18:磁性軸承 18: Magnetic bearing
19:高壓定子 19:High voltage stator
20:加熱棒 20: heating rod
25:吹掃裝置 25: Purging device
26:入口管道 26: Inlet pipe
27:吹掃氣體輸入 27: Purge gas input
27a:公共管道 27a: Public plumbing
27b:環形空間 27b: Annular space
28:環形通道 28: Ring channel
29:高壓殼體 29: High pressure shell
30:密封通道 30: sealed channel
31:回流連接件 31: Return connector
33:密封配件 33:Sealing accessories
34:回流空間 34: Return space
36:密封通道 36: sealed channel
37:高壓殼體 37: High pressure shell
F1:氣體的循環方向 F1: circulation direction of gas
f2:箭頭 f2: arrow
I:轉軸 I: Shaft
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FR (1) | FR3127531A1 (en) |
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---|---|---|---|---|
JP3125207B2 (en) * | 1995-07-07 | 2001-01-15 | 東京エレクトロン株式会社 | Vacuum processing equipment |
US10655638B2 (en) * | 2018-03-15 | 2020-05-19 | Lam Research Corporation | Turbomolecular pump deposition control and particle management |
JP7048391B2 (en) * | 2018-03-30 | 2022-04-05 | エドワーズ株式会社 | Vacuum pump |
FR3101115A1 (en) | 2019-09-25 | 2021-03-26 | Pfeiffer Vacuum | Method of heating a stator and a turbomolecular or molecular vacuum pump |
-
2021
- 2021-09-24 FR FR2110064A patent/FR3127531A1/en active Pending
-
2022
- 2022-09-21 JP JP2024518275A patent/JP2024535340A/en active Pending
- 2022-09-21 WO PCT/EP2022/076154 patent/WO2023046712A1/en active Application Filing
- 2022-09-22 TW TW111135935A patent/TW202319650A/en unknown
Also Published As
Publication number | Publication date |
---|---|
FR3127531A1 (en) | 2023-03-31 |
WO2023046712A1 (en) | 2023-03-30 |
JP2024535340A (en) | 2024-09-30 |
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