TW202317037A - Magnetic field compatible neural probe and manufacturing method thereof - Google Patents

Abstract

A magnetic field compatible neural probe and manufacturing method thereof are provided. The method includes: sequentially coating a first biomedical polymer layer, a first metal layer, and a second biomedical polymer layer on a substrate; sputtering a second metal layer and a third metal layer as the base material of a metal circuit layer, which includes at least one electrode point, at least two connection points, at least one reference electrode point and a metal circuit for connecting the electrode point or the reference electrode point and the connection point; Spraying a third biomedical polymer layer; modifying the electrode point, the reference electrode point and the connection points; forming the neural probe basing on a contour pattern. The magnetic field compatible neural probe can be applied to the magnetic resonance imaging environment to stably detect activity of neural signal in the brain and record synchronously with magnetic resonance imaging.

Description

Magnetic compatible nerve probe and its manufacturing method

This case is about a neural probe and its manufacturing method.

Traditional neural probes have been widely used to study the electrophysiological functions of cranial nerves. However, the traditional microelectrode probes currently developed are still difficult to reliably detect nerve cells during Magnetic Resonance Imaging (MRI) It is mainly due to the fact that the current electrodes are mostly made of metal electrodes, which not only have high impedance in the low frequency range, but also weaken the strength and range of electrophysiological signal collection; when performing MRI inspection, the metal part will change in the high-intensity magnetic field Even under the static magnetic field, it may cause displacement due to magnetic force and damage nerve tissue. In addition, some common metal components contained in ordinary nerve electrodes and probes will produce different degrees of distortion and artifacts on the image during magnetic resonance imaging, which greatly limits its application range. As shown in Figure 13, when using a tungsten electrode 91 (total diameter of about 100 microns) composed of two monofilaments, or a two-channel platinum-iridium electrode 92 (total diameter of 150 microns), when MRI imaging is performed, the A large area of black shadow is generated at the electrode, which affects the relevant judgment.

Neural implant technology began in the 1960s. At the time, neuroscientists and neurosurgeons were experimenting with electrical stimulation of nerves using microelectrodes to target specific parts of the brain, while signal processors were used to analyze changes in neuronal activity. Meanwhile, it was discovered that electrical stimulation of a certain structure in the brain can suppress the symptoms of neurological diseases (such as spontaneous tremor and Parkinson's disease). Therefore, in order to understand how brain neurons perform neural encoding for specific behavioral movements, and then develop multi-channel neural implants, researchers began to record neuron activities in different brain regions simultaneously, trying to understand the meaning of neural language. This technology allows researchers to gain knowledge about how neurons communicate and process information by simultaneously recording information about the activity of neurons in multiple brain regions within the brain. This knowledge can be used to solve many problems in neurobiology, behavior and cognitive science. It is a major breakthrough in the study of neuroscience methodology.

Some of the known probes are multi-channel microelectrode arrays based on silicon. The microelectrode arrays of this type are usually called Michigan electrode arrays. On the stalk-like structure, these microelectrode arrangements also provide high spatial resolution for more complete neural signal recording. However, due to the complex structure of the brain, which is full of nerves, it is necessary to be extra careful when doing related invasive tests, especially the use of neural probes to extract information about neural activity in specific brain regions. How to increase the detection range of a single neural probe and reduce the occurrence of misjudgment of signal strength is a problem that needs to be overcome.

The object of the present invention is to provide a magnetically compatible neural probe and its manufacturing method, which can be applied to the detection of microvoltage or current in the brain, especially suitable for synchronous use with high magnetic flux detection instruments, and can stably detect brain The state of internal micro-voltage or current, as well as the stimulation of current or voltage to nerve cells, does not have high impedance in the low-frequency range, and will not be restricted by metal substances and cannot be recorded synchronously with the detection instrument.

In view of this, this case proposes a method for manufacturing a magnetically compatible neural probe, which includes coating a first biomedical polymer film layer on a base material, and covering the first biomedical polymer film layer with a The first metal layer, wherein, the first metal layer completely covers the first biomedical polymer film layer, or the first metal layer is made into the shape of a nerve probe; on the first metal layer Covering a second biomedical polymer film layer, sequentially sputtering a second metal layer and a third metal layer on the second biomedical polymer film layer as a metal circuit structure layer substrate; through the metal circuit A photomask, etching a metal circuit structure layer on the metal circuit structure layer base material, the metal circuit structure layer includes at least one electrode point, at least two connection points, at least one reference electrode point, and is used to connect the electrode point or the reference A metal circuit between the electrode point and the connection point; a third biomedical polymer film layer is sprayed onto the metal circuit structure layer, and then the pattern with the electrode point, the reference electrode point and the connection point is set to On the third biomedical polymer film layer, the electrode point, the reference electrode point and the connection point are exposed by etching; a gold layer or a silver layer is electroplated on the electrode point, the reference electrode point and the connection point. On the connection point, the height of the electrode point, the reference electrode point and the connection point after electroplating the gold layer or the silver layer is greater than the third biomedical polymer film layer; the electrode is electrochemically modified with iridium oxide point, the reference electrode point; and separating the base material and forming the neural probe according to the outline pattern.

According to some embodiments, in the step of separating the base material and forming the neural probe according to the outline pattern, laser micro-dissection or dry etching is used to form the neural probe after the base material is separated.

According to some embodiments, in the step of electrochemically modifying the electrode point, the reference electrode point with iridium oxide, a layer of parylene is covered on the third biomedical point except the electrode point, the reference electrode point and the connection point. On the polymer film layer; the electrode point and the reference electrode point are modified with iridium oxide electrochemically to remove the parylene layer. According to some embodiments, in the step of separating the base material and forming the neural probe according to the outer contour pattern, the outer contour pattern of the neural probe is placed on the third biomedical polymer film layer, and the first one is removed by etching. The biomedical macromolecular film layer, the second biomedical macromolecular film layer and the part of the third biomedical macromolecular film layer outside the outline pattern; the nerve probe is formed after separating the base material.

According to some embodiments, the etching technique may be an oxygen plasma etching technique.

According to some embodiments, the base material is a glass sheet or a silicon wafer.

According to some embodiments, the material of the first biomedical polymer film, the second biomedical polymer film and the third biomedical polymer film is selected from polyimide, polyethylene, polypropylene, The group consisting of polyvinyl chloride, polytetrafluoroethylene, polyacrylate, polymethacrylic acid, ethylene terephthalate, polycarbonate, parylene, and combinations thereof.

According to some embodiments, the material of the first metal layer and the second metal layer is selected from the group consisting of titanium, copper, chromium, gold, silver and combinations thereof.

According to some embodiments, the material of the third metal layer is selected from the group consisting of copper, gold, silver and combinations thereof.

According to some embodiments, the thickness of the first biomedical polymer film layer and the second biomedical polymer film layer is between 10 micrometers and 60 micrometers; the thickness of the first metal layer is between 100 nanometers to 500 nanometers; the thickness of the second metal layer is between 50 nanometers and 400 nanometers; the thickness of the third metal layer is between 500 nanometers and 1000 nanometers; the third biomedical The thickness of the polymer film layer is between 1 micron and 20 microns. Preferably, the thickness of the first biomedical polymer film layer and the second biomedical polymer film layer is 30 micrometers; the thickness of the first metal layer is 200 nanometers; the thickness of the second metal layer is 100 nanometers; the thickness of the third biomedical polymer film layer is 3.2 micrometers.

According to some embodiments, the thickness of the third metal layer is between 500 nm and 1000 nm. According to some embodiments, the thickness of the gold layer or the silver layer is between 2 μm and 20 μm. Preferably, the third metal layer has a thickness of 700 nm; preferably, the gold layer or the silver layer has a thickness of 5 microns.

This case also proposes a magnetically compatible neural probe, which includes a first biomedical polymer film layer; a first metal layer arranged on the first biomedical polymer film layer, and the first metal layer is a The shape of the nerve probe; and a second biomedical polymer film layer, which is arranged on the first metal layer, and a metal circuit structure layer and a third biomedical film layer are arranged on the second biomedical polymer film layer. Using a polymer film layer, the metal circuit structure layer includes at least one electrode point, at least two connection points, at least one reference electrode point and a metal circuit for connecting the electrode point or the reference electrode point and the connection point, the first Three biomedical polymer film layers are arranged on the second biomedical polymer film layer except the electrode point, the reference electrode point and the connection point; wherein, the electrode point and the reference electrode point are sequentially Covered with a gold layer or a silver layer, an iridium oxide modification layer, the connection point is covered with a gold layer or a silver layer, the height of the electrode point, the reference electrode point and the connection point is higher than that of the third biomedical polymer film layer.

According to some embodiments, the metal wiring structure layer is etched from a metal wiring structure layer substrate including a second metal layer and a third metal layer, the first biomedical polymer film layer and the second metal layer The thickness of the second biomedical polymer film layer is between 10 microns and 60 microns; the thickness of the first metal layer is between 100 nanometers and 500 nanometers; the thickness of the second metal layer is between 50 nanometers The thickness of the third biomedical polymer film layer is between 1 micron and 20 microns. Preferably, the thickness of the first biomedical polymer film layer and the second biomedical polymer film layer is 30 micrometers; the thickness of the first metal layer is 200 nanometers; the thickness of the second metal layer is 100 nanometers; the thickness of the third biomedical polymer film layer is 3.2 micrometers.

According to some embodiments, the metal wiring structure layer is formed by etching a metal wiring structure layer substrate including a second metal layer and a third metal layer, and the thickness of the third metal layer is between 500 nm and between 1000 nanometers; the thickness of the gold layer or the silver layer is between 2 micrometers and 20 micrometers; the area of the reference electrode point is more than 10 times the area of the electrode point. Preferably, the thickness of the third metal layer is 700 nanometers; the thickness of the gold layer or the silver layer is 5 micrometers; the area of the reference electrode point is more than 20 times the area of the electrode point.

To sum up, according to some embodiments, the nerve probe provided by the present invention integrates the traditional reference/ground wire functions relying on metal nails and wires into metal components without using ferromagnetic materials and minimizing metal components. On the circuit structure layer, when it is in the environment of the MRI imager, it will not be affected by the magnetic force, and at the same time, the corresponding current detection will be performed, and the problem of image defects caused by the prior art will be overcome. According to some embodiments, the neural probes provided by the present invention can be used to record signals from single or multiple neurons in the brain, and can also be used to give electrical stimulation to specific brain regions to inhibit or promote the corresponding neuron activity, and can also be used at the same time Conduct electrical stimulation and signal measurement. The electrophysiological signals of specific brain regions recorded by neural probes can be used to diagnose epilepsy, migraine, Alzheimer's disease and other diseases after analysis, and can also be used to give electrical stimulation to specific brain regions or neurons to achieve specific neuromodulation purpose of treatment.

According to some embodiments, the nerve probe provided by the embodiments of the present invention can be applied to synchronously detect and implement electrical stimulation with a magnetic resonance imaging apparatus, and can stably detect changes in nerve signals in the brain without being affected by magnetic fields Due to limitations, it is impossible to record neuroelectric signals synchronously with the MRI imager.

In order to easily understand the structure and manufacturing method of the magnetically compatible neural probe N of the present invention, the manufacturing method and drawings will be described below.

As shown in Figures 1 to 10, the magnetically compatible neural probe N provided in this embodiment: sequentially includes a first biomedical polymer film layer 10, a first metal layer 11, and a second biomedical polymer film layer 20. The first metal layer 11 is in the shape of a nerve probe, and the second biomedical polymer film layer 20 is provided with a metal circuit structure layer 22. The metal circuit structure layer 22 includes two electrode points 222 and three connection points 221 , a reference electrode point R and a metal line 223 for connecting the electrode point 222 or the reference electrode point R and the connection point 221; on the second biomedical polymer film layer 20, the electrode point 222, the reference electrode point R and the connection point The area other than 221 is provided with a third biomedical polymer film layer 30; the electrode point 222 and the reference electrode point R are sequentially covered with a gold layer or silver layer 31 and an iridium oxide modification layer 50; the connection point 221 is covered with a gold layer or silver layer 31 .

The manufacturing method of the above-mentioned magnetically compatible nerve probe N is as follows:

S1. As shown in FIG. 1 , the first biomedical polymer film layer 10 is placed on the base material B, and the first metal layer 11 is covered on the first biomedical polymer film layer 10 . Wherein, the base material B can be made of glass or silicon wafer. In addition, as shown in FIG. 2 , the first metal layer 11 may be laid out in a probe shape. In this embodiment, the first metal layer 11 is etched into the shape of a nerve probe. The first metal layer 11 can enhance the mechanical strength of the entire probe.

S2, as shown in FIG. 3 , cover the second biomedical polymer film layer 20 on the first metal layer 11 having a probe shape, and set the second metal layer on the second biomedical polymer film layer 20 The third metal layer is used as the metal circuit structure layer substrate 21 , and the metal circuit structure layer substrate 21 can be combined and covered on the second biomedical polymer film layer 20 by sputtering.

Wherein, the thicknesses of the first biomedical polymer film layer 10 and the second biomedical polymer film layer 20 are respectively between 10 microns and 60 microns, and 30 microns is the best. The thickness of the first metal layer 11 is between 100 nanometers and 500 nanometers, and its optimum is 200 nanometers; the thickness of the second metal layer is between 50 nanometers and 400 nanometers, wherein 100 nanometers It is the best; the thickness of the third metal layer is between 500nm and 1000nm, among which 700nm is the best. Wherein, the first biomedical polymer film layer 10, the second biomedical polymer film layer 20, and the third biomedical polymer film layer 30 can be polyimide, polyethylene, polypropylene, polyvinyl chloride , polytetrafluoroethylene, polyacrylic acid ester, polymethacrylic acid, ethylene terephthalate, polycarbonate, parylene or a combination of any two or more. Also, the first metal layer 11 can be chromium, copper, titanium, gold, silver. The second metal layer and the third metal layer can be copper, gold, or silver.

S3. As shown in FIG. 4A and FIG. 4B, the metal circuit pattern includes at least one electrode point 222, at least two connection points 221, at least one reference electrode point R, and at least two metal lines 223, and the metal circuit pattern is passed through the metal line The photomask is set (reticle etching and printing technology) on the metal circuit structure layer substrate 21, and then after etching the metal circuit structure layer substrate 21 not covered by the metal circuit pattern, a second biomedical polymer film is formed. Metal wiring structure layer 22 on layer 20. The metal circuit structure layer 22 includes at least one electrode point 222, at least two connection points 221, a reference electrode point R and at least two metal lines 223, and the metal line 223 is electrically connected to the electrode point 222, the reference electrode point R and the connection point 221 . In this embodiment, the metal circuit structure layer 22 includes two electrode points 222, three connection points 221, one reference electrode point R, and three metal strips for connecting the electrode points 222 and the reference electrode point R to the connection point 221 respectively. Line 223.

S4, as shown in Figure 5, the third biomedical polymer film layer 30 is sprayed and arranged on the metal circuit structure layer 22, and then corresponds to the pattern light of the electrode point 222, the connection point 221 and the reference electrode point R The mask is placed on the third biomedical polymer film layer 30 , and then the electrode point 222 , the reference electrode point R and the connection point 221 are exposed using an oxygen plasma etching technique.

S5, as shown in Figure 6, gold layer 31 (or silver layer) is electroplated on electrode point 222, reference electrode point R and connection point 221, electrode point 222, reference electrode point R and connection point after electroplating gold layer 31 The height of 221 is higher than the third biomedical polymer film layer 30 .

Wherein: the thickness of the third biomedical polymer film layer 30 is between 1 micron and 20 microns, wherein the optimum is 3.2 microns; the thickness of the gold layer 31 (or silver layer) is between 2 microns and 20 microns , of which 5 microns is the best.

S6. As shown in FIG. 7 , cover the parylene layer 40 on the third biomedical polymer film layer 30, except the gold layer corresponding to the electrode point 222, the reference electrode point R and the connection point 221 31 (or the silver layer), to protect the third biomedical polymer film layer 30 from being damaged during the subsequent modification process of the electrode point 222 and the reference electrode point R.

S7. As shown in FIGS. 8 to 10, the modification process electrochemically uses iridium oxide (IrOx) to modify the electrode point 222 and the reference electrode point R (that is, cover the electrode point 222 and the reference electrode point R on the corresponding gold layer 31 (or silver layer), and then the parylene layer 40 is removed. According to some embodiments, the electrochemical method of the present invention is cyclic voltammetry (Cyclic Voltammetry, CV). Iridium oxide is a transition metal oxide with conductivity. Through the modification of iridium oxide, a conductive film layer with acid, alkali and corrosion resistance is formed on the surface of the electrode point 222 . In addition, the microstructure of the iridium oxide thin film layer formed by the manufacturing method of the present invention has a porous and open morphology, thereby having a high surface area characteristic and being able to exhibit a higher charge storage capacity (CSC). Therefore, they could be used in implantable neurostimulation to improve therapeutic efficiency and reduce tissue damage. The outline pattern of the probe is printed onto the third biomedical polymer film layer 30, and the first biomedical polymer film layer 10, the second biomedical polymer film layer 20, the The part of the third biomedical polymer film layer 30 outside the outline pattern. Finally, the magnetically compatible neural probe N is formed after being separated from the base material B.

Wherein, S6 and S7 in the above steps can also be replaced with the non-covered parylene layer 40 on the third biomedical polymer film layer 30, and the modified electrode point 222, the reference electrode point R, and the separation of the base material After B, the neural probes are patterned using laser microdissection or dry etching. In this way, the manufacturing speed and dimensional accuracy can be improved.

According to some embodiments, the area of the reference electrode point R of the magnetically compatible neural probe N provided by the present invention is greater than ten times the area of the electrode point 222 , and preferably greater than twenty times.

As shown in FIG. 11 , it is a structural diagram of a magnetically compatible neural probe, on which a plurality of electrode points 222 are arranged, and these electrode points 222 are used to contact the area to be tested after being implanted in the brain. Near the end of the probe, set the reference electrode point R. The reference electrode point R will not touch the area to be measured, so the potential value outside the area to be measured can be obtained as a reference potential. Through the setting of the reference electrode point R in this embodiment, the magnetically compatible neural probe N can be used as a reference potential after being implanted in the brain, thereby replacing the need to connect metal nails to the brain surface (or brain bone) in the prior art The measures can reduce the formation of eddy currents and overcome the disadvantage that the nerve probes in the prior art cannot simultaneously perform imaging and nerve electrical signal detection in the environment of a magnetic resonance imaging apparatus with a high magnetic field. That is, as shown in Figure 12, after the magnetically compatible neural probe N of the present invention is implanted in the brain, it is detected by a magnetic resonance imaging instrument. The detection of electrical signals and the implementation of electrical stimulation, and the area of the shadow is reduced to be difficult to detect, which overcomes the conventional problem.

Neural probes can be used to record the signals of single or multiple neurons in the brain, and can also be used to give electrical stimulation to specific brain regions to inhibit or promote the corresponding neuron activity, and can also perform electrical stimulation and signal measurement at the same time. The electrophysiological signals of specific brain regions recorded by neural probes can be used for diagnosis of epilepsy, migraine, Alzheimer's disease, Parkinson's disease and other diseases after analysis, and can also be used to give electrical stimulation to specific brain regions or neurons In order to achieve the therapeutic purpose of specific neuromodulation.

10: The first biomedical polymer film layer 11: The first metal layer 20: The second biomedical polymer film layer 21: Metal circuit structure layer base material 22: Metal circuit structure layer 222: electrode point 221: Connection point 223: metal line 30: The third biomedical polymer film layer 31: gold layer (or silver layer) 40: Parylene layer 50: iridium oxide modified layer 91: Tungsten electrode 92: Platinum iridium electrode R: reference electrode point B: base material N: Magnetic Compatibility Neural Probe

[Fig. 1] is a schematic structural view covering the first metal layer on the first biomedical polymer film layer; [Fig. 2] is another structural schematic diagram of covering the first metal layer on the first biomedical polymer film layer; [Fig. 3] is a schematic structural view of covering the second biomedical polymer film layer on the first metal layer; [FIG. 4A] is a schematic cross-sectional view of a metal circuit structure layer that has not been etched; [FIG. 4B] is a structural schematic diagram of etching out the metal circuit structure layer; [Fig. 5] is a structural schematic diagram of spraying the third biomedical polymer film layer onto the metal circuit structure layer; [Fig. 6] is a structural schematic diagram of electroplating a gold layer or a silver layer onto an electrode point, a reference electrode point and a connection point; [Fig. 7] is a schematic structural view of covering the parylene layer on the third biomedical polymer film layer except electrode points, reference electrode points and connection points; [Fig. 8] is a structural schematic diagram after electrochemically modifying electrode points and reference electrode points with iridium oxide; [FIG. 9] is a structural schematic diagram of etching and removing the first biomedical polymer film layer, the second biomedical polymer film layer and the third biomedical polymer film layer outside the outer contour pattern; [Fig. 10] is a structural schematic diagram of the neural probe formed after separating the base material; [Fig. 11] is a schematic structural diagram of a magnetically compatible neural probe; [Figure 12] is a schematic diagram of the state when the embodiment of the present invention is applied to MRI; and [ Fig. 13 ] is a schematic diagram of the state when the prior art is applied to MRI.

10: The first biomedical polymer film layer

20: The second biomedical polymer film layer

30: The third biomedical polymer film layer

N: Magnetic Compatibility Neural Probe

Claims (10)

A method for manufacturing a magnetically compatible nerve probe, comprising the following steps: A first biomedical polymer film layer is coated on a base material, and a first metal layer is covered on the first biomedical polymer film layer, wherein the first metal layer completely covers the first metal layer. On the biomedical polymer film layer, or make the first metal layer into the shape of a nerve probe; A second biomedical polymer film layer is covered on the first metal layer, and a second metal layer and a third metal layer are sequentially sputtered on the second biomedical polymer film layer as a metal circuit structure layer substrate; through the metal circuit mask, a metal circuit structure layer is etched on the metal circuit structure layer substrate, and the metal circuit structure layer includes at least one electrode point, at least two connection points, at least one reference electrode point and for a metal line connecting the electrode point or the reference electrode point and the connection point; A third biomedical polymer film layer is sprayed onto the metal circuit structure layer, and then the pattern at the electrode point, the reference electrode point and the connection point is set on the third biomedical polymer film layer , and then expose the electrode point, the reference electrode point and the connection point by etching; A gold layer or a silver layer is electroplated on the electrode point, the reference electrode point and the connection point, and the height of the electrode point, the reference electrode point and the connection point after electroplating the gold layer or the silver layer is greater than the height of the electrode point, the reference electrode point and the connection point. The third biomedical polymer film layer; electrochemically modifying the electrode point, the reference electrode point, with iridium oxide; and The base material is separated and the neural probe is formed according to the outline pattern. The manufacturing method of the magnetically compatible neural probe according to Claim 1, wherein the material of the base material is a glass sheet or a silicon wafer. The manufacturing method of the magnetically compatible neural probe as claimed in item 1, wherein, the first biomedical polymer film layer, the second biomedical polymer film layer and the third biomedical polymer film layer The material of the layer is selected from polyimide, polyethylene, polypropylene, polyvinyl chloride, polytetrafluoroethylene, polyacrylate, polymethacrylic acid, ethylene terephthalate, polycarbonate, The group consisting of parylene and combinations thereof. The manufacturing method of the magnetically compatible neural probe as claimed in item 1, wherein the material of the first metal layer and the second metal layer is selected from the group consisting of titanium, copper, chromium, gold, silver and combinations thereof Group. The manufacturing method of the magnetically compatible neural probe according to claim 1, wherein the material of the third metal layer is selected from the group consisting of copper, gold, silver and combinations thereof. The manufacturing method of the magnetically compatible neural probe as described in Claim 1, wherein the thickness of the first biomedical polymer film layer and the second biomedical polymer film layer is between 10 microns and 60 microns between; the thickness of the first metal layer is between 100 nm and 500 nm; the thickness of the second metal layer is between 50 nm and 400 nm; the thickness of the third metal layer is between 500 nm between nanometers and 1000 nanometers; the thickness of the third biomedical polymer film layer is between 1 micrometer and 20 micrometers. The manufacturing method of the magnetically compatible neural probe according to claim 1, wherein the thickness of the gold layer or the silver layer is between 2 microns and 20 microns. A magnetically compatible neural probe comprising: - the first biomedical polymer film layer; a first metal layer arranged on the first biomedical polymer film layer, the first metal layer is in the shape of a nerve probe; and A second biomedical polymer film layer is arranged on the first metal layer, a metal circuit structure layer and a third biomedical polymer film layer are arranged on the second biomedical polymer film layer, the The metal circuit structure layer includes at least one electrode point, at least two connection points, at least one reference electrode point and a metal circuit for connecting the electrode point or the reference electrode point and the connection point, and the third biomedical polymer film The layer is arranged on the area of the second biomedical polymer film layer except the electrode point, the reference electrode point and the connection point; Wherein, the electrode point and the reference electrode point are sequentially covered with a gold layer or a silver layer and an iridium oxide modification layer, the connection point is covered with another gold layer or another silver layer, the electrode point, the reference electrode The point and the connecting point are higher than the third biomedical polymer film layer. The magnetic compatibility nerve probe as described in Claim 8, wherein the metal circuit structure layer is etched from a metal circuit structure layer substrate comprising a second metal layer and a third metal layer, and the first metal circuit structure layer is formed by etching The thickness of a biomedical polymer film layer and the second biomedical polymer film layer is between 10 micrometers and 60 micrometers; the thickness of the first metal layer is between 100 nanometers and 500 nanometers; The thickness of the second metal layer is between 50 nm and 400 nm; the thickness of the third biomedical polymer film layer is between 1 micron and 20 microns. The magnetic compatibility nerve probe as described in Claim 8, wherein the metal circuit structure layer is etched from a metal circuit structure layer substrate comprising a second metal layer and a third metal layer, and the first metal circuit structure layer is formed by etching The thickness of the three metal layers is between 500 nanometers and 1000 nanometers; the thickness of the gold layer or the silver layer is between 2 micrometers and 20 micrometers; the area of the reference electrode point is 10 times the area of the electrode point above.

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