TW202314005A - Method for preparing electrochromic ion storage film including performing a co-sputtering treatment with a vanadium pentoxide target material and a cobalt target material - Google Patents

Method for preparing electrochromic ion storage film including performing a co-sputtering treatment with a vanadium pentoxide target material and a cobalt target material Download PDF

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TW202314005A
TW202314005A TW110134785A TW110134785A TW202314005A TW 202314005 A TW202314005 A TW 202314005A TW 110134785 A TW110134785 A TW 110134785A TW 110134785 A TW110134785 A TW 110134785A TW 202314005 A TW202314005 A TW 202314005A
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ion storage
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radio frequency
storage film
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TWI832093B (en
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林天財
黃文昌
林俞呈
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崑山科技大學
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Abstract

A method for preparing an electrochromic ion storage film comprises setting a vanadium pentoxide target material and a cobalt target material in an environment containing an argon gas and an oxygen gas to perform radio frequency co-sputtering treatment, so as to form a layer of electrochromic ion storage film on a substrate. The pressure of the environment is controlled at 0.005 torr. The content ratio of the argon gas to the oxygen is controlled within a range. The radio frequency power of the vanadium pentoxide target is controlled at a first power and the radio frequency power of the cobalt target is controlled at a second power. The ratio of the second power to the first power is between 0.158 and 0.175. The invention can improve and optimize a color contrast and a color change rate of the electrochromic ion storage film.

Description

電致變色離子儲存膜的製備方法Preparation method of electrochromic ion storage membrane

本發明係關於一種電致變色離子儲存膜的製備方法,尤指利用摻雜鈷於五氧化二釩薄膜的電致變色離子儲存膜的製備方法。The invention relates to a preparation method of an electrochromic ion storage membrane, in particular to a preparation method of an electrochromic ion storage membrane using cobalt doped on a vanadium pentoxide thin film.

電致變色裝置(electrochromic device)的應用相當廣泛,例如應用於非發光的資訊顯示器(non-emissive information displays)、節能智慧窗、汽車天窗,及防眩光後視鏡等等中。以往的電致變色裝置由上而下包含一片玻璃基板、一層透明導電層、一層電致變色層、一層電解質層、一層離子儲存層、一層透明導電層,及一片玻璃基板。Electrochromic devices are widely used, for example, in non-emissive information displays, energy-saving smart windows, car sunroofs, and anti-glare rearview mirrors. The conventional electrochromic device comprises a glass substrate, a transparent conductive layer, an electrochromic layer, an electrolyte layer, an ion storage layer, a transparent conductive layer, and a glass substrate from top to bottom.

其中,五氧化二釩的薄膜具有半導體特性,離子和電子傳導的混合導電材料,因此可以作為鋰離子電池陰極材料和電致變色材料,結構方面屬於層狀結構,有利於離子傳輸,具有較好的鋰離子注入、脫出可逆性,這使得五氧化二釩可以作為許多碱金屬離子、有機複合物和聚合物等的嵌入主體,從中判斷五氧化二釩薄膜可能適合做為離子儲存層的優異材料,但五氧化二釩的薄膜也存在著幾個缺點,如較差的色彩對比和低變色速率。Among them, the thin film of vanadium pentoxide has semiconductor characteristics, and is a mixed conductive material for ion and electron conduction, so it can be used as a cathode material for lithium-ion batteries and an electrochromic material. The structure is a layered structure, which is conducive to ion transmission and has good The reversibility of lithium ion implantation and extraction makes vanadium pentoxide can be used as the intercalation host of many alkali metal ions, organic compounds and polymers, and it can be judged that vanadium pentoxide thin film may be suitable as an excellent ion storage layer. material, but thin films of vanadium pentoxide also suffer from several disadvantages, such as poor color contrast and low discoloration rates.

爰此,本發明人為使利用五氧化二釩的薄膜製備的離子儲存層提升其色彩對比及著色速率,而提出一種電致變色離子儲存膜的製備方法。Therefore, the present inventor proposes a method for preparing an electrochromic ion storage film in order to improve the color contrast and coloring rate of the ion storage layer prepared using a thin film of vanadium pentoxide.

該電致變色離子儲存膜的製備方法包含一射頻共濺鍍步驟。The preparation method of the electrochromic ion storage membrane comprises a radio frequency co-sputtering step.

該射頻共濺鍍步驟為將一五氧化二釩靶材及一鈷靶材設置在包含一氬氣及一氧氣的環境中進行射頻共濺鍍處理,以在一基板上形成一層電致變色離子儲存膜,其中,該環境的壓力控制在5x10 -3torr,該氬氣與該氧氣的含量比例控制在一範圍,且該五氧化二釩靶材的射頻功率控制在一第一功率,該鈷靶材的射頻功率控制在一第二功率,該第二功率比該第一功率的比值介於0.158至0.175之間。 In the radio frequency co-sputtering step, a vanadium pentoxide target and a cobalt target are placed in an environment containing an argon gas and an oxygen gas to perform a radio frequency co-sputtering process to form a layer of electrochromic ions on a substrate storage film, wherein the pressure of the environment is controlled at 5x10 -3 torr, the content ratio of the argon and the oxygen is controlled within a range, and the radio frequency power of the vanadium pentoxide target is controlled at a first power, the cobalt The radio frequency power of the target is controlled at a second power, and the ratio of the second power to the first power is between 0.158 and 0.175.

進一步,該第一功率為120W,該第二功率介於19W至21W之間。Further, the first power is 120W, and the second power is between 19W and 21W.

進一步,該範圍為該氧氣佔該氬氣與該氧氣形成總量的8.65%至9.55%之間。Further, the range is that the oxygen accounts for 8.65% to 9.55% of the total amount of the argon and the oxygen formed.

進一步,該基板為一氧化銦錫玻璃。Further, the substrate is indium tin oxide glass.

進一步,該環境的壓力控制在5x10 -3torr之前,先使用一機械幫浦抽氣至該環境的壓力為4x10 -2torr後,再用一高真空油式擴散幫浦抽氣至該環境的壓力至5x10 -5torr,接著通入該氬氣及該氧氣,使該環境的壓力控制在5x10 -3torr。 Further, before the pressure of the environment is controlled at 5x10 -3 torr, a mechanical pump is used to evacuate the environment until the pressure of the environment is 4x10 -2 torr, and then a high vacuum oil diffusion pump is used to evacuate the air to the environment. The pressure is up to 5x10 -5 torr, and then the argon and the oxygen are introduced to control the pressure of the environment at 5x10 -3 torr.

進一步,該電致變色離子儲存膜的製備方法在該射頻共濺鍍步驟之前還包含一清洗步驟,該清洗步驟為將該基板浸泡於一丙酮溶液中以超音波震盪5分鐘,再將該基板浸泡於純水中以超音波震盪5分鐘,接著再將該基板浸泡於一異丙醇溶液中以超音波震盪5分鐘,再將該基板浸泡於純水中以超音波震盪5分鐘,最後再以高壓氮氣迅速將該基板吹乾。Further, the preparation method of the electrochromic ion storage film also includes a cleaning step before the radio frequency co-sputtering step, the cleaning step is to immerse the substrate in an acetone solution and vibrate it with ultrasonic waves for 5 minutes, and then the substrate Soak in pure water and vibrate with ultrasonic waves for 5 minutes, then soak the substrate in an isopropanol solution and vibrate with ultrasonic waves for 5 minutes, then soak the substrate in pure water and vibrate with ultrasonic waves for 5 minutes, and finally The substrate was quickly blown dry with high-pressure nitrogen.

根據上述技術特徵可達成以下功效:According to the above-mentioned technical features, the following effects can be achieved:

1.在該電致變色離子儲存膜的製備方法藉由調整該五氧化二釩靶材的射頻功率於該第一功率,該鈷靶材的射頻功率於該第二功率,及該第二功率比該第一功率的比值介於0.158至0.175之間,以控制摻雜鈷於五氧化二釩薄膜的量,相較於未摻雜鈷的五氧化二釩薄膜,該電致變色離子儲存膜的色彩對比及變色速率,確實受到改善、優化。1. In the preparation method of the electrochromic ion storage film, by adjusting the radio frequency power of the vanadium pentoxide target at the first power, the radio frequency power of the cobalt target at the second power, and the second power The ratio of the first power ratio is between 0.158 and 0.175 to control the amount of cobalt doped in the vanadium pentoxide film. Compared with the vanadium pentoxide film not doped with cobalt, the electrochromic ion storage film The color contrast and color change rate are indeed improved and optimized.

2.藉由調整該氧氣佔該氬氣與該氧氣總工作氣體的含量至8.65 %至9.55 %之間,讓該電致變色離子儲存膜的色彩對比及變色速率也受到改善。2. By adjusting the content of the oxygen in the total working gas of the argon and the oxygen to between 8.65% and 9.55%, the color contrast and color change rate of the electrochromic ion storage film are also improved.

綜合上述技術特徵,本發明電致變色離子儲存膜的製備方法的主要功效將可於下述實施例清楚呈現。Based on the above technical features, the main effects of the method for preparing the electrochromic ion storage membrane of the present invention will be clearly presented in the following examples.

參閱第一圖,本發明電致變色離子儲存膜的製備方法的一實施例,該電致變色離子儲存膜的製備方法包含一清洗步驟S01及一射頻共濺鍍步驟S02。Referring to the first figure, it is an embodiment of the preparation method of the electrochromic ion storage membrane of the present invention. The preparation method of the electrochromic ion storage membrane includes a cleaning step S01 and a radio frequency co-sputtering step S02.

該清洗步驟S01為將一基板浸泡於一丙酮溶液中以超音波震盪5分鐘,以除去該基板表面的油脂及有機物,再將該基板浸泡於純水中以超音波震盪5分鐘,以除去該基板殘留的該丙酮溶液,接著再將該基板浸泡於一異丙醇溶液中以超音波震盪5分鐘,再將該基板浸泡於純水中以超音波震盪5分鐘,最後再以高壓氮氣迅速將該基板吹乾。在本例中,該基板為一氧化銦錫玻璃。The cleaning step S01 is to immerse a substrate in an acetone solution and oscillate with ultrasonic waves for 5 minutes to remove grease and organic matter on the surface of the substrate, and then immerse the substrate in pure water and oscillate with ultrasonic waves for 5 minutes to remove the The acetone solution remaining on the substrate, then soak the substrate in an isopropanol solution and oscillate it with ultrasonic waves for 5 minutes, then immerse the substrate in pure water and oscillate it with ultrasonic waves for 5 minutes, and finally quickly remove it with high-pressure nitrogen gas The substrate was blown dry. In this example, the substrate is indium tin oxide glass.

該射頻共濺鍍步驟S02為先將該基板設置在一腔體內,該腔體先使用一機械幫浦抽氣至環境壓力為4x10 -2torr後,再用一高真空油式擴散幫浦抽氣至環境壓力至5x10 -5torr,接著通入工作氣體一氬氣及一氧氣,使該環境的壓力控制在5x10 -3torr,該氧氣佔該氬氣與該氧氣形成總量的8.65 %至9.55 %之間,最佳為9.1 %,在本例中,該氬氣流量固定為22.0 sccm,該氧氣流量固定為2.2 sccm。將一五氧化二釩靶材及一鈷靶材設置在該腔體內進行射頻共濺鍍處理,以在該基板上形成一層電致變色離子儲存膜,該五氧化二釩靶材的射頻功率控制在一第一功率,該鈷靶材的射頻功率控制在一第二功率,該第二功率比該第一功率的比值介於0.158至0.175之間。在本例中,該第一功率為120 W,該第二功率在19 W至21 W之間,最佳為20 W In the RF co-sputtering step S02, the substrate is first placed in a cavity, and the cavity is first evacuated by a mechanical pump to an ambient pressure of 4x10 -2 torr, and then evacuated by a high-vacuum oil-type diffusion pump. gas to the ambient pressure to 5x10 -5 torr, and then feed the working gas, argon and oxygen, so that the pressure of the environment is controlled at 5x10 -3 torr, and the oxygen accounts for 8.65% to 8.65% of the total amount of the argon and the oxygen 9.55%, the optimum is 9.1%. In this example, the argon flow is fixed at 22.0 sccm, and the oxygen flow is fixed at 2.2 sccm. A vanadium pentoxide target and a cobalt target are placed in the cavity for radio frequency co-sputtering treatment to form an electrochromic ion storage film on the substrate, and the radio frequency power of the vanadium pentoxide target is controlled At a first power, the radio frequency power of the cobalt target is controlled at a second power, and the ratio of the second power to the first power is between 0.158 and 0.175. In this example, the first power is 120 W and the second power is between 19 W and 21 W, optimally 20 W

該電致變色離子儲存膜在施加電壓進行還原變色(著色)時,電解液的鋰離子(Li +)與電子遷入該電致變色離子儲存膜中,使該電致變色離子儲存膜形成Li xV 2O 5,而該電致變色離子儲存膜的五氧化二釩從V 5+還原成V 4+。該電致變色離子儲存膜在施加電壓進行氧化變色(去色)時,原本在該電致變色離子儲存膜中的鋰離子與電子就會遷出回到電解液體之中,使五氧化二釩薄膜從V 4+再氧化成V 5+。反應式如下。 When the electrochromic ion storage film undergoes reduction discoloration (coloring) by applying a voltage, lithium ions (Li + ) and electrons in the electrolyte move into the electrochromic ion storage film, so that the electrochromic ion storage film forms Li x V 2 O 5 , and the vanadium pentoxide of the electrochromic ion storage membrane is reduced from V 5+ to V 4+ . When the electrochromic ion storage film is oxidatively discolored (decolorized) by applying a voltage, the lithium ions and electrons originally in the electrochromic ion storage film will move out and return to the electrolytic liquid, making the vanadium pentoxide The film is reoxidized from V 4+ to V 5+ . The reaction formula is as follows.

Figure 02_image001
V 2O 5+ Li ++ xe -(氧化反應)           Li xV 2O 5(還原反應)
Figure 02_image001
V 2 O 5 + Li + + xe - (oxidation reaction) Li x V 2 O 5 (reduction reaction)

發明人針對調整該鈷靶材的射頻功率進行多組實驗,證實摻雜鈷於五氧化二釩薄膜,確實會影響該電致變色離子儲存膜的色彩對比及變色速率。The inventors conducted multiple experiments on adjusting the radio frequency power of the cobalt target, and confirmed that doping cobalt into the vanadium pentoxide thin film will indeed affect the color contrast and discoloration rate of the electrochromic ion storage film.

參閱第二圖至第十圖及表一,該腔體先抽氣至環境壓力至5x10 -5torr,在通入該氬氣流量固定為22.0 sccm,該氧氣流量固定為2.2 sccm,使該腔體的壓力控制在5x10 -3torr,該五氧化二釩靶材的射頻功率固定控制在120 W,該鈷靶材的射頻功率控制在0 W、10 W、20 W、30 W、50 W、70 W、90 W、110 W、120 W等9種狀態,且經過3小時沉積該電致變色離子儲存膜,總共產生9個試片。 Referring to Figures 2 to 10 and Table 1, the chamber is first evacuated to an ambient pressure of 5x10 -5 torr, and the flow rate of the argon gas is fixed at 22.0 sccm and the flow rate of the oxygen gas is fixed at 2.2 sccm, so that the chamber The pressure of the body is controlled at 5x10 -3 torr, the RF power of the vanadium pentoxide target is fixed at 120 W, and the RF power of the cobalt target is controlled at 0 W, 10 W, 20 W, 30 W, 50 W, 9 states of 70 W, 90 W, 110 W, and 120 W, and after 3 hours of deposition of the electrochromic ion storage film, a total of 9 test pieces were produced.

將該9個試片使用紫外光-可見光光譜儀(SEMSO-3000 光電化學同步量測系統)進行量測,量測該等試片分別在三個可見光波長550nm、600nm、650 nm的光穿透率,以穿透率差值表示變色的變化範圍。該等試片在進行著色的過程,會使穿透率降低,若進行去色的過程,會使穿透率增加,因此穿透率差值越大表示變色的變化範圍越明顯。穿透率差的公式如下所示。其中∆T表示穿透率差值,T bleach表示去色的穿透率,T color表示著色的穿透率。 The 9 test pieces were measured using an ultraviolet-visible light spectrometer (SEMSO-3000 photoelectrochemical simultaneous measurement system) to measure the light transmittance of the test pieces at three visible light wavelengths of 550nm, 600nm, and 650 nm , the range of discoloration is represented by the difference in transmittance. The transmittance of these test pieces will decrease during the coloring process, and the transmittance will increase if the color removal process is carried out. Therefore, the greater the transmittance difference, the more obvious the range of discoloration. The formula for the difference in penetration is shown below. Among them, ∆T represents the difference in transmittance, T bleach represents the transmittance of decolorization, and T color represents the transmittance of coloring.

∆T = T bleach- T color ∆T = T bleach - T color

從實驗可看出在該鈷靶材的射頻功率控制在10 W、20 W、30 W時,變色的變化範圍有明顯的變化,但是,當該鈷靶材的射頻功率控制在50 W時,在三個可見光波長550nm、600nm、650 nm的變化範圍明顯地縮小許多,而該鈷靶材的射頻功率控制在70 W後,其光譜變化範圍縮小地更多,當該鈷靶材的射頻功率在90 W~120 W的狀態時,其光譜變色穿透率基本就沒有了變化。因此,將鈷少量的摻雜在五氧化二釩薄膜,使變色範圍發生變化,但是過量的摻雜會使得五氧化二釩薄膜喪失變色機能,但該鈷靶材的射頻功率控制在20 W時,該電致變色離子儲存膜導致的鋰離子遷移都是變色效果中最佳的,即穿透率差值的範圍是所有條件中最佳。It can be seen from the experiment that when the RF power of the cobalt target is controlled at 10 W, 20 W, and 30 W, the range of discoloration changes significantly. However, when the RF power of the cobalt target is controlled at 50 W, In the three visible wavelengths of 550nm, 600nm, and 650 nm, the range of variation is significantly reduced, and after the RF power of the cobalt target is controlled at 70 W, the range of variation in the spectrum is reduced even more. When the RF power of the cobalt target In the state of 90 W~120 W, the spectral color change transmittance basically does not change. Therefore, a small amount of cobalt is doped in the vanadium pentoxide film to change the color range, but excessive doping will make the vanadium pentoxide film lose the color change function, but the RF power of the cobalt target is controlled at 20 W , the lithium ion migration caused by the electrochromic ion storage film is the best in the discoloration effect, that is, the range of the transmittance difference is the best in all conditions.

配合參閱第十一圖至第十三圖,將該9個試片使用紫外光-可見光光譜儀(SEMSO-3000 光電化學同步量測系統)進行量測,量測該等試片分別在全光譜波長的光穿透率,及施加於每一試片進行還原變色(著色)與氧化變色(去色)的電壓分別為-3.0 V與+3.0 V下的光穿透率,該等試片在全光譜變化範圍的變化與三個可見光波長550nm、600nm、650 nm的變化範圍的變化類似,即該鈷靶材的射頻功率控制在20 W時,該電致變色離子儲存膜導致的鋰離子遷移也是變色效果中最佳的,即穿透率的變化是所有條件中最佳,本案只揭示該鈷靶材的射頻功率控制在0 W、20 W、90 W。 表一 可見光波長(nm)的光穿透率差值(∆T)/鈷靶材的射頻功率 0 W 10 W 20 W 30 W 50 W 70 W 90 W 110 W 120 W 550 nm ∆T(%) 6.47 9.08 13.86 9.4 2.01 2.07 0.91 0.21 0.04 600 nm ∆T(%) 10.51 10.97 15.78 10.11 3.14 2.28 0.46 0.08 0.14 650 nm ∆T(%) 15.49 14.12 19.21 10.10 2.66 3.05 1.22 0.17 0.09 With reference to the eleventh figure to the thirteenth figure, the 9 test pieces are measured by the ultraviolet-visible light spectrometer (SEMSO-3000 photoelectrochemical simultaneous measurement system), and the measurement of the test pieces in the full spectrum wavelength The light transmittance, and the voltage applied to each test piece for reductive discoloration (coloring) and oxidative discoloration (decolorization) are the light transmittance at -3.0 V and +3.0 V respectively. The changes in the spectral range are similar to the changes in the three visible light wavelengths of 550nm, 600nm, and 650 nm, that is, when the RF power of the cobalt target is controlled at 20 W, the lithium ion migration caused by the electrochromic ion storage film is also The color change effect is the best, that is, the change of the transmittance is the best among all conditions. This case only reveals that the RF power of the cobalt target is controlled at 0 W, 20 W, and 90 W. Table I The light transmittance difference (∆T) of visible light wavelength (nm)/RF power of cobalt target 0W 10W 20W 30W 50W 70W 90W 110W 120W 550nm ∆T(%) 6.47 9.08 13.86 9.4 2.01 2.07 0.91 0.21 0.04 600nm ∆T(%) 10.51 10.97 15.78 10.11 3.14 2.28 0.46 0.08 0.14 650nm ∆T(%) 15.49 14.12 19.21 10.10 2.66 3.05 1.22 0.17 0.09

參閱第十四圖,發明人進一步對這9種試片進行著色及去色過程,一樣施加於每一試片進行還原變色(著色)與氧化變色(去色)的電壓分別為-3.0 V與+3.0 V。在該鈷靶材的射頻功率控制在20 W時,該電致變色離子儲存膜的著色速率及去色速率都是最快的。Referring to the fourteenth figure, the inventor further carried out the coloring and decolorization process on these 9 kinds of test pieces, and the voltages applied to each test piece for reductive discoloration (coloring) and oxidative discoloration (decolorization) were respectively -3.0 V and +3.0V. When the RF power of the cobalt target is controlled at 20 W, the coloring rate and decolorization rate of the electrochromic ion storage film are the fastest.

發明人針對調整該氧氣佔整體氣體之含量進行多組實驗,證實調整氧含量亦會影響該電致變色離子儲存膜的色彩對比及變色速率。The inventors conducted multiple experiments on adjusting the oxygen content in the whole gas, and confirmed that adjusting the oxygen content will also affect the color contrast and color change rate of the electrochromic ion storage film.

參閱第十五圖至第十八圖及表二,該腔體先抽氣至環境壓力至5x10 -5torr,在通入該氬氣流量固定為22.0 sccm,該氧氣流量控制在1.1 sccm、1.47 sccm、2.2 sccm、4.4 sccm等4種狀態,即該氧氣佔整體氣體之含量為4.76 %、6.25 %、9.1 %、16.67%等4種狀態,使該腔體的壓力控制在5x10 -3torr,該五氧化二釩靶材的射頻功率固定控制在120 W,該鈷靶材的射頻功率控制在20W,且經過3小時沉積該電致變色離子儲存膜,總共產生4個試片。 Referring to Figures 15 to 18 and Table 2, the cavity is first evacuated to ambient pressure to 5x10 -5 torr, and the flow rate of the argon gas is fixed at 22.0 sccm, and the flow rate of the oxygen gas is controlled at 1.1 sccm, 1.47 sccm, 2.2 sccm, and 4.4 sccm, that is, the content of oxygen in the whole gas is 4.76%, 6.25%, 9.1%, and 16.67%, so that the pressure of the cavity is controlled at 5x10 -3 torr, The radio frequency power of the vanadium pentoxide target was fixed at 120 W, the radio frequency power of the cobalt target was controlled at 20 W, and the electrochromic ion storage film was deposited after 3 hours, and a total of 4 test pieces were produced.

將該4個試片一樣使用紫外光-可見光光譜儀(SEMSO-3000 光電化學同步量測系統)進行量測,量測該等試片分別在三個可見光波長550 nm、600 nm、650 nm的光穿透率。從實驗可看出在射頻共濺鍍處理時,通入少量的氧氣與氬氣混合成工作氣體,該電致變色離子儲存膜的光穿透率有一定程度上的改善,當工作氣體的含氧量百分比提升到9.09 %時,光穿透率與光穿透率差值得到了有效的改善,但是當工作氣體的含氧量百分比提升到了16.67 %時,光穿透率與光穿透率差值反而下降。因此,工作氣體的含氧量在9.09 %時,光穿透率差值範圍是所有條件中最佳。 表二 可見光波長(nm)的光穿透率差值(∆T)/氧含量百分比 4.76 % 6.25% 9.09% 16.67% 550 nm ∆T(%) 8.47 8.53 13.86 5.82 600 nm ∆T(%) 7.39 7.73 15.78 6.21 650 nm ∆T(%) 6.24 5.91 18.60 4.42 The four test pieces were also measured using a UV-visible spectrometer (SEMSO-3000 photoelectrochemical simultaneous measurement system) to measure the light of these test pieces at three visible wavelengths of 550 nm, 600 nm, and 650 nm. penetration rate. It can be seen from the experiment that in the RF co-sputtering process, a small amount of oxygen and argon are introduced into the working gas, and the light transmittance of the electrochromic ion storage film is improved to a certain extent. When the working gas contains When the percentage of oxygen increased to 9.09%, the difference between light transmittance and light transmittance was effectively improved, but when the percentage of oxygen in the working gas was raised to 16.67%, the difference between light transmittance and light transmittance value decreased instead. Therefore, when the oxygen content of the working gas is 9.09%, the light transmittance difference range is the best among all conditions. Table II Difference in light transmittance (∆T) of visible light wavelength (nm)/percentage of oxygen content 4.76% 6.25% 9.09% 16.67% 550nm ∆T(%) 8.47 8.53 13.86 5.82 600nm ∆T(%) 7.39 7.73 15.78 6.21 650nm ∆T(%) 6.24 5.91 18.60 4.42

參閱第十九圖,發明人進一步對該4個試片進行著色及去色過程,施加於每一試片進行還原變色(著色)與氧化變色(去色)的電壓分別為-3.0 V與+3.0 V。在工作氣體的含氧量百分比為9.09 %時,該電致變色離子儲存膜的著色速率及去色速率都是最快的。Referring to Figure 19, the inventor further carried out the coloring and decolorization process on the four test pieces, and the voltages applied to each test piece for reductive discoloration (coloring) and oxidative discoloration (decolorization) were -3.0 V and + 3.0V. When the oxygen content percentage of the working gas is 9.09%, the coloring rate and decoloring rate of the electrochromic ion storage membrane are the fastest.

綜上所述,在該電致變色離子儲存膜的製備方法藉由調整該五氧化二釩靶材的射頻功率於該第一功率,該鈷靶材的射頻功率於該第二功率,及該第二功率比該第一功率的比值介於0.158至0.175之間,以控制摻雜鈷於五氧化二釩薄膜的量,相較於未摻雜鈷的五氧化二釩薄膜,該電致變色離子儲存膜的色彩對比及變色速率,確實受到改善、優化,更藉由調整該氧氣佔該氬氣與該氧氣總工作氣體的含量至8.65 %至9.55 %之間,讓該電致變色離子儲存膜的色彩對比及變色速率也受到改善。In summary, in the preparation method of the electrochromic ion storage film, by adjusting the radio frequency power of the vanadium pentoxide target at the first power, the radio frequency power of the cobalt target at the second power, and the The ratio of the second power ratio to the first power is between 0.158 and 0.175 to control the amount of cobalt doped in the vanadium pentoxide film. Compared with the vanadium pentoxide film not doped with cobalt, the electrochromic The color contrast and discoloration rate of the ion storage film are indeed improved and optimized, and the electrochromic ion is stored by adjusting the content of the oxygen in the total working gas of the argon and the oxygen to 8.65% to 9.55%. The color contrast and rate of color change of the film are also improved.

綜合上述實施例之說明,當可充分瞭解本發明之操作、使用及本發明產生之功效,惟以上所述實施例僅係為本發明之較佳實施例,當不能以此限定本發明實施之範圍,即依本發明申請專利範圍及發明說明內容所作簡單的等效變化與修飾,皆屬本發明涵蓋之範圍內。Based on the description of the above-mentioned embodiments, it is possible to fully understand the operation of the present invention, use and the effect that the present invention produces, but the above-mentioned embodiments are only preferred embodiments of the present invention, and should not be used to limit the implementation of the present invention. The scope, that is, the simple equivalent changes and modifications made according to the patent scope of the present invention and the content of the description of the invention, all fall within the scope of the present invention.

S01:清洗步驟 S02:射頻共濺鍍步驟 S01: Cleaning step S02: RF co-sputtering step

[第一圖]是一流程圖,說明本發明電致變色離子儲存膜的製備方法的一實施例。 [第二圖]是一實驗圖,說明該電致變色離子儲存膜的製備在五氧化二釩靶材的射頻功率控制在120 W,鈷靶材射頻功率控制在0 W時的狀態下的穿透率差值。 [第三圖]是一實驗圖,說明該電致變色離子儲存膜的製備在五氧化二釩靶材的射頻功率控制在120 W,鈷靶材射頻功率控制在10 W時的狀態下的穿透率差值。 [第四圖]是一實驗圖,說明該電致變色離子儲存膜的製備在五氧化二釩靶材的射頻功率控制在120 W,鈷靶材射頻功率控制在20 W時的狀態下的穿透率差值。 [第五圖]是一實驗圖,說明該電致變色離子儲存膜的製備在五氧化二釩靶材的射頻功率控制在120 W,鈷靶材射頻功率控制在30 W時的狀態下的穿透率差值。 [第六圖]是一實驗圖,說明該電致變色離子儲存膜的製備在五氧化二釩靶材的射頻功率控制在120 W,鈷靶材射頻功率控制在50 W時的狀態下的穿透率差值。 [第七圖]是一實驗圖,說明該電致變色離子儲存膜的製備在五氧化二釩靶材的射頻功率控制在120 W,鈷靶材射頻功率控制在70 W時的狀態下的穿透率差值。 [第八圖]是一實驗圖,說明該電致變色離子儲存膜的製備在五氧化二釩靶材的射頻功率控制在120 W,鈷靶材射頻功率控制在90 W時的狀態下的穿透率差值。 [第九圖]是一實驗圖,說明該電致變色離子儲存膜的製備在五氧化二釩靶材的射頻功率控制在120 W,鈷靶材射頻功率控制在110 W時的狀態下的穿透率差值。 [第十圖]是一實驗圖,說明該電致變色離子儲存膜的製備在五氧化二釩靶材的射頻功率控制在120 W,鈷靶材射頻功率控制在120 W時的狀態下的穿透率差值。 [第十一圖]是一實驗圖,說明該電致變色離子儲存膜的製備在五氧化二釩靶材的射頻功率控制在120 W,鈷靶材射頻功率控制在0 W時的狀態下,未進行氧化還原及進行氧化還原的穿透率。 [第十二圖]是一實驗圖,說明該電致變色離子儲存膜的製備在五氧化二釩靶材的射頻功率控制在120 W,鈷靶材射頻功率控制在20 W時的狀態下,未進行氧化還原及進行氧化還原的穿透率。 [第十三圖]是一實驗圖,說明該電致變色離子儲存膜的製備在五氧化二釩靶材的射頻功率控制在120 W,鈷靶材射頻功率控制在90 W時的狀態下,未進行氧化還原及進行氧化還原的穿透率。 [第十四圖]是一實驗圖,說明該電致變色離子儲存膜的製備在鈷靶材射頻功率控制與變色速率的關係。 [第十五圖]是一實驗圖,說明該電致變色離子儲存膜的製備在氧含量控制在4.76 %時的狀態下的穿透率差值。 [第十六圖]是一實驗圖,說明該電致變色離子儲存膜的製備在氧含量控制在6.25 %時的狀態下的穿透率差值。 [第十七圖]是一實驗圖,說明該電致變色離子儲存膜的製備在氧含量控制在9.09 %時的狀態下的穿透率差值。 [第十八圖]是一實驗圖,說明該電致變色離子儲存膜的製備在氧含量控制在16.67 %時的狀態下的穿透率差值。 [第十九圖]是一實驗圖,說明該電致變色離子儲存膜的製備在氧含量控制與變色速率的關係。 [FIG. 1] is a flowchart illustrating an embodiment of the method for producing the electrochromic ion storage membrane of the present invention. [The second figure] is an experimental diagram illustrating the penetration of the electrochromic ion storage film when the radio frequency power of the vanadium pentoxide target is controlled at 120 W and the radio frequency power of the cobalt target is controlled at 0 W. Transmittance difference. [The third figure] is an experimental diagram, illustrating the penetration of the electrochromic ion storage film when the radio frequency power of the vanadium pentoxide target is controlled at 120 W and the radio frequency power of the cobalt target is controlled at 10 W. Transmittance difference. [Figure 4] is an experimental diagram illustrating the penetration of the electrochromic ion storage film when the radio frequency power of the vanadium pentoxide target is controlled at 120 W and the radio frequency power of the cobalt target is controlled at 20 W. Transmittance difference. [Figure 5] is an experimental diagram illustrating the penetration of the electrochromic ion storage film when the radio frequency power of the vanadium pentoxide target is controlled at 120 W and the radio frequency power of the cobalt target is controlled at 30 W. Transmittance difference. [Figure 6] is an experimental diagram illustrating the penetration of the electrochromic ion storage film when the radio frequency power of the vanadium pentoxide target is controlled at 120 W and the radio frequency power of the cobalt target is controlled at 50 W. Transmittance difference. [Figure 7] is an experimental diagram illustrating the penetration of the electrochromic ion storage film when the radio frequency power of the vanadium pentoxide target is controlled at 120 W and the radio frequency power of the cobalt target is controlled at 70 W. Transmittance difference. [Figure 8] is an experimental diagram illustrating the penetration of the electrochromic ion storage film when the radio frequency power of the vanadium pentoxide target is controlled at 120 W and the radio frequency power of the cobalt target is controlled at 90 W. Transmittance difference. [Figure 9] is an experimental diagram illustrating the penetration of the electrochromic ion storage film when the radio frequency power of the vanadium pentoxide target is controlled at 120 W and the radio frequency power of the cobalt target is controlled at 110 W. Transmittance difference. [Figure 10] is an experimental diagram illustrating the penetration of the electrochromic ion storage film when the radio frequency power of the vanadium pentoxide target is controlled at 120 W and the radio frequency power of the cobalt target is controlled at 120 W. Transmittance difference. [Figure 11] is an experimental diagram, illustrating that the preparation of the electrochromic ion storage film is under the condition that the radio frequency power of the vanadium pentoxide target is controlled at 120 W, and the radio frequency power of the cobalt target is controlled at 0 W. Penetration without redox and with redox. [Figure 12] is an experimental diagram, illustrating that the preparation of the electrochromic ion storage film is under the condition that the radio frequency power of the vanadium pentoxide target is controlled at 120 W, and the radio frequency power of the cobalt target is controlled at 20 W. Penetration without redox and with redox. [Figure 13] is an experimental diagram, illustrating that the preparation of the electrochromic ion storage film is under the condition that the radio frequency power of the vanadium pentoxide target is controlled at 120 W, and the radio frequency power of the cobalt target is controlled at 90 W. Penetration without redox and with redox. [Figure 14] is an experimental diagram illustrating the relationship between the electrochromic ion storage film and the control of the radio frequency power of the cobalt target and the discoloration rate in the preparation of the electrochromic ion storage film. [Fig. 15] is an experimental diagram illustrating the difference in transmittance of the electrochromic ion storage membrane when the oxygen content is controlled at 4.76%. [Figure 16] is an experimental diagram illustrating the difference in transmittance when the oxygen content of the electrochromic ion storage membrane is controlled at 6.25%. [Figure 17] is an experimental diagram illustrating the difference in transmittance when the electrochromic ion storage membrane is prepared when the oxygen content is controlled at 9.09%. [Figure 18] is an experimental diagram illustrating the difference in transmittance of the electrochromic ion storage membrane when the oxygen content is controlled at 16.67%. [Figure 19] is an experimental figure illustrating the relationship between oxygen content control and discoloration rate in the preparation of the electrochromic ion storage membrane.

S01:清洗步驟 S01: Cleaning step

S02:射頻共濺鍍步驟 S02: RF co-sputtering step

Claims (6)

一種電致變色離子儲存膜的製備方法,包含: 將一五氧化二釩靶材及一鈷靶材設置在包含一氬氣及一氧氣的環境中進行射頻共濺鍍處理,以在一基板上形成一層電致變色離子儲存膜,其中,該環境的壓力控制在5x10 -3torr,該氬氣與該氧氣的含量比例控制在一範圍,且該五氧化二釩靶材的射頻功率控制在一第一功率,該鈷靶材的射頻功率控制在一第二功率,該第二功率比該第一功率的比值介於0.158至0.175之間。 A method for preparing an electrochromic ion storage film, comprising: setting a vanadium pentoxide target material and a cobalt target material in an environment containing an argon gas and an oxygen gas to perform radio frequency co-sputtering treatment, so that on a substrate An electrochromic ion storage film is formed, wherein the pressure of the environment is controlled at 5x10 -3 torr, the content ratio of the argon gas to the oxygen is controlled within a certain range, and the radio frequency power of the vanadium pentoxide target is controlled within a certain range. The first power, the radio frequency power of the cobalt target is controlled at a second power, and the ratio of the second power to the first power is between 0.158 and 0.175. 如請求項1所述之電致變色離子儲存膜的製備方法,其中,該第一功率為120W,該第二功率介於19W至21W之間。The method for preparing an electrochromic ion storage membrane according to Claim 1, wherein the first power is 120W, and the second power is between 19W and 21W. 如請求項1所述之電致變色離子儲存膜的製備方法,其中,該範圍為該氧氣佔該氬氣與該氧氣形成總量的8.65%至9.55%之間。The method for preparing an electrochromic ion storage membrane according to claim 1, wherein the range is that the oxygen accounts for 8.65% to 9.55% of the total amount of the argon and the oxygen formed. 如請求項1所述之電致變色離子儲存膜的製備方法,其中,該基板為一氧化銦錫玻璃。The method for preparing an electrochromic ion storage film according to claim 1, wherein the substrate is indium tin oxide glass. 如請求項1所述之電致變色離子儲存膜的製備方法,其中,該環境的壓力控制在5x10 -3torr之前,先使用一機械幫浦抽氣至該環境的壓力為4x10 -2torr後,再用一高真空油式擴散幫浦抽氣至該環境的壓力至5x10 -5torr,接著通入該氬氣及該氧氣,使該環境的壓力控制在5x10 -3torr。 The preparation method of the electrochromic ion storage membrane as described in Claim 1, wherein, before the pressure of the environment is controlled at 5x10 -3 torr, a mechanical pump is used to pump air until the pressure of the environment is 4x10 -2 torr , and then use a high vacuum oil diffusion pump to evacuate the environment to a pressure of 5x10 -5 torr, and then introduce the argon and oxygen to control the pressure of the environment at 5x10 -3 torr. 如請求項1所述之電致變色離子儲存膜的製備方法,在進行射頻共濺鍍處理之前還包含:將該基板浸泡於一丙酮溶液中以超音波震盪5分鐘,再將該基板浸泡於純水中以超音波震盪5分鐘,接著再將該基板浸泡於一異丙醇溶液中以超音波震盪5分鐘,再將該基板浸泡於純水中以超音波震盪5分鐘,最後再以高壓氮氣迅速將該基板吹乾。The preparation method of the electrochromic ion storage film as described in Claim 1 further includes: soaking the substrate in an acetone solution and vibrating it with ultrasonic waves for 5 minutes before performing radio frequency co-sputtering treatment, and then soaking the substrate in Vibrate with ultrasonic waves in pure water for 5 minutes, then soak the substrate in an isopropanol solution and vibrate with ultrasonic waves for 5 minutes, then soak the substrate in pure water and vibrate with ultrasonic waves for 5 minutes, and finally use high pressure Nitrogen quickly blows the substrate dry.
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