TW202313772A - Allyl ether compound, resin composition and cured product thereof - Google Patents

Allyl ether compound, resin composition and cured product thereof Download PDF

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TW202313772A
TW202313772A TW111130098A TW111130098A TW202313772A TW 202313772 A TW202313772 A TW 202313772A TW 111130098 A TW111130098 A TW 111130098A TW 111130098 A TW111130098 A TW 111130098A TW 202313772 A TW202313772 A TW 202313772A
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resin
parts
resin composition
allyl ether
ether compound
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宗正浩
石原一男
柳起煥
林淸來
尹海璃
池仲輝
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日商日鐵化學材料股份有限公司
南韓商國都化學股份有限公司
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Abstract

An object of the present invention is to provide an allyl ether compound capable of forming a cured product with excellent properties such as low dielectricity, high heat resistance, etc., a resin composition thereof, and a cured product obtained from the resin composition.
A solution to the above object is an allyl ether compound represented by the following general formula (1).

Description

烯丙基醚化合物、樹脂組成物及其硬化物 Allyl ether compound, resin composition and hardened product thereof

本發明係關於一種可形成低介電特性、高耐熱性等優異之硬化物的烯丙基醚化合物、以該烯丙基醚化合物為必要成分之樹脂組成物、及由該樹脂組成物所得之硬化物、密封材、電路基板用材料、預浸體、或積層板。 The present invention relates to an allyl ether compound capable of forming a cured product excellent in low dielectric properties, high heat resistance, etc., a resin composition containing the allyl ether compound as an essential component, and a resin obtained from the resin composition Cured products, sealing materials, materials for circuit boards, prepregs, or laminates.

環氧樹脂或苯酚樹脂等熱硬化性樹脂,由於接著性、可撓性、耐熱性、耐藥品性、絕緣性、硬化反應性優異,故廣泛地使用於塗料、土木接著、燒鑄、電氣電子材料、薄膜材料等各種領域。特別於屬於電氣電子材料之一之印刷配線基板的用途上,由於對環氧樹脂賦予阻燃性而廣泛地被使用。 Thermosetting resins such as epoxy resins and phenol resins are widely used in coatings, civil engineering bonding, casting, electrical and electronic applications due to their excellent adhesiveness, flexibility, heat resistance, chemical resistance, insulation, and curing reactivity. Various fields such as materials and film materials. In particular, it is widely used for the application of printed wiring boards, which are one of electrical and electronic materials, because epoxy resins are imparted with flame retardancy.

屬於印刷配線基板之用途之一之可攜式裝置或與其連線之基地台等基礎設施裝置,近年來隨著資訊量急遽增大,也一直被要求高機能化。特別是,由於通訊規格由4G變換成5G使資訊量進一步增加,而預測必須藉由高頻進行訊號傳送。因此,於使用印刷配線基板時,為了抑制高頻所致之訊號衰減,期盼更低的介電損耗正切的材料。又,為了因應於印刷配線基板之細線化及高多層化,對於基質樹脂要求高接著力及高耐熱等特性。為了滿足該等要求,使用以往環氧樹脂之基質樹脂並不充分,而期盼更高機能的熱硬化性樹脂。 Infrastructure devices such as portable devices and base stations connected to them, which are one of the uses of printed wiring boards, have been required to be highly functional as the amount of information has increased rapidly in recent years. In particular, due to the further increase in the amount of information due to the conversion of communication standards from 4G to 5G, it is predicted that signal transmission must be performed at high frequencies. Therefore, in order to suppress signal attenuation due to high frequencies when using a printed wiring board, a material with a lower dielectric loss tangent is desired. In addition, in order to cope with thinner lines and higher multilayers of printed wiring boards, properties such as high adhesive force and high heat resistance are required for matrix resins. In order to satisfy these demands, it is not sufficient to use conventional epoxy resin matrix resins, and thermosetting resins with higher functions are desired.

關於以往使用於印刷配線基板之基質樹脂的環氧樹脂的低介電係數化,作為原料環氧樹脂,係有使雙酚A等二價酚類環氧丙基化後之化合物、使三(環氧丙氧基苯基)烷類或胺基酚等環氧丙基化後之化合物等、及使苯酚酚醛清漆等酚醛清漆類環氧丙基化後之化合物被揭示(專利文獻1)。 Regarding the lowering of the dielectric constant of epoxy resins conventionally used as matrix resins for printed wiring boards, epoxy resins used as raw materials include compounds obtained by glycidylating divalent phenols such as bisphenol A, tri( Glycidyloxyphenyl) alkanes, compounds obtained by glycidylating aminophenols, etc., and compounds obtained by glycidylating novolacs such as phenol novolaks are disclosed (Patent Document 1).

於專利文獻2、3揭示為了較環氧樹脂更改善耐熱性及機械特性而使用含醯亞胺基之酚樹脂的方法,藉由含有醯亞胺基而改善了耐熱性。又,作為適於改善與基材之接著性之基質樹脂的樹脂,於專利文獻4揭示了將含醯亞胺基之酚樹脂環氧基化的化合物。 Patent Documents 2 and 3 disclose a method of using an imide group-containing phenol resin in order to improve heat resistance and mechanical properties compared to epoxy resins, and heat resistance is improved by containing an imide group. Also, Patent Document 4 discloses a compound obtained by epoxidizing an imide group-containing phenol resin as a resin suitable for a matrix resin for improving adhesion with a base material.

又,於專利文獻5揭示藉由使用馬來醯亞胺化合物、環氧樹脂及特定結構之苯酚硬化劑而改善基板之耐熱性及阻燃性的組成物,於專利文獻6、7揭示藉由使用具有特定結構之馬來醯亞胺化合物而能提供接著力及介電特性優異的組合物。 Also, Patent Document 5 discloses a composition that improves the heat resistance and flame retardancy of the substrate by using a maleimide compound, an epoxy resin, and a phenol hardener with a specific structure, and Patent Documents 6 and 7 disclose that by using A composition with excellent adhesion and dielectric properties can be provided by using a maleimide compound with a specific structure.

於專利文獻8揭示藉由使用馬來醯亞胺化合物與烯丙基醚化合物,可得介電特性低且耐熱性高的硬化性樹脂組成物。於專利文獻9揭示藉由使用含有特定結構之馬來醯亞胺化合物、與具有烯丙基或甲基烯丙基之化合物的熱硬化性樹脂組成物,可得硬化性及耐熱性優異的組成物。 Patent Document 8 discloses that by using a maleimide compound and an allyl ether compound, a curable resin composition with low dielectric characteristics and high heat resistance can be obtained. Patent Document 9 discloses that a composition with excellent curability and heat resistance can be obtained by using a thermosetting resin composition containing a maleimide compound having a specific structure and a compound having an allyl group or a methallyl group. thing.

然而,任一文獻所揭示之硬化性樹脂組成物,皆無法充分滿足因應近年高機能化之介電特定的要求,且無法同時滿足各物性。 However, none of the curable resin compositions disclosed in the literature can fully meet the specific requirements of the dielectric in response to recent high-performance, and cannot satisfy various physical properties at the same time.

[先前技術文獻] [Prior Art Literature]

[專利文獻] [Patent Document]

專利文獻1:日本特開平5-43655號公報 Patent Document 1: Japanese Patent Application Laid-Open No. 5-43655

專利文獻2:日本特開平7-33858號公報 Patent Document 2: Japanese Patent Application Laid-Open No. 7-33858

專利文獻3:日本特開平7-10970號公報 Patent Document 3: Japanese Patent Application Laid-Open No. 7-10970

專利文獻4:日本特開2010-235823號公報 Patent Document 4: Japanese Patent Laid-Open No. 2010-235823

專利文獻5:國際公開第2011/126070號公報 Patent Document 5: International Publication No. 2011/126070

專利文獻6:國際公開第2016/208667號公報 Patent Document 6: International Publication No. 2016/208667

專利文獻7:國際公開第2020/054526號公報 Patent Document 7: International Publication No. 2020/054526

專利文獻8:日本特開第2020-111744號公報 Patent Document 8: Japanese Patent Laid-Open No. 2020-111744

專利文獻9:國際公開第2017/170844號公報 Patent Document 9: International Publication No. 2017/170844

因此,本發明欲解決之課題在於提供一種樹脂組成物及其硬化物,該組成物具有同時滿足低介電性、高耐熱性的優異性能,且有用於積層、成型、接著等用途。 Therefore, the problem to be solved by the present invention is to provide a resin composition and its cured product. The composition has excellent properties of low dielectric property and high heat resistance at the same time, and is useful for lamination, molding, bonding and other applications.

為了解決上述課題,本發明人等深入探討的結果發現,含有下述式(1)所表示之烯丙基醚化合物的樹脂組成物,可同時滿足前所未有的低介電性與高玻璃轉移溫度(Tg),而完成本發明。 In order to solve the above-mentioned problems, the inventors of the present invention found, as a result of in-depth studies, that a resin composition containing an allyl ether compound represented by the following formula (1) can simultaneously satisfy an unprecedented low dielectric property and a high glass transition temperature ( Tg), and complete the present invention.

亦即,本發明係一種烯丙基醚化合物,其特徵係以下述通式(1)所表示。 That is, the present invention is an allyl ether compound characterized by the following general formula (1).

Figure 111130098-A0202-12-0004-4
Figure 111130098-A0202-12-0004-4

此處,R1獨立地表示碳數1至8之烴基,R2獨立地表示氫原子或二環戊烯基,且其中1個以上為二環戊烯基,R3獨立地表示氫原子或碳數1至4之烴基,n表示重複數,其平均值為1至5之數。 Here, R1 independently represents a hydrocarbon group having 1 to 8 carbon atoms, R2 independently represents a hydrogen atom or a dicyclopentenyl group, and one or more of them are dicyclopentenyl groups, and R3 independently represents a hydrogen atom or a dicyclopentenyl group. In the hydrocarbon group with 1 to 4 carbons, n represents the number of repetitions, and the average value is a number of 1 to 5.

又,本發明係一種樹脂組成物,其特徵係含有上述烯丙基醚化合物、及馬來醯亞胺化合物。 Also, the present invention is a resin composition characterized by containing the above-mentioned allyl ether compound and maleimide compound.

又,本發明係一種使上述樹脂組成物硬化而成之硬化物,及以使用上述樹脂組成物為特徵的電路基板用材料、密封材、預浸體、或積層板。 Also, the present invention relates to a cured product obtained by curing the above resin composition, and a circuit board material, sealing material, prepreg, or laminate characterized by using the above resin composition.

本發明之樹脂組成物,可得玻璃轉移溫度高的硬化物,介電特性亦優異,於要求低介電係數、低介電損耗正切的積層板及電子電路基板中可發揮良好的特性。 The resin composition of the present invention can obtain a hardened product with a high glass transition temperature, and has excellent dielectric properties. It can exhibit good properties in laminates and electronic circuit boards that require low dielectric coefficient and low dielectric loss tangent.

圖1係實施例1所得之烯丙基醚樹脂之GPC圖。 Fig. 1 is the GPC figure of the allyl ether resin that embodiment 1 gains.

圖2係實施例1所得之烯丙基醚樹脂之IR圖。 Fig. 2 is the IR figure of the allyl ether resin obtained in embodiment 1.

以下,詳細說明本發明。 Hereinafter, the present invention will be described in detail.

本發明之烯丙基醚化合物,係上述通式(1)所表示之烯丙基醚化合物。此處,由於為重複數n=0、1、2...的混合物,故亦稱為烯丙基醚樹脂。 The allyl ether compound of the present invention is an allyl ether compound represented by the above general formula (1). Here, since it is a mixture of repetition number n=0, 1, 2..., it is also called an allyl ether resin.

Figure 111130098-A0202-12-0005-5
Figure 111130098-A0202-12-0005-5

於本說明書之各式中,共通的符號原則上具有相同意義。 In each formula in this specification, the common symbol has the same meaning in principle.

通式(1)中,R1獨立地表示碳數1至8之烴基,較佳為碳數1至8之烷基、碳數6至8之芳基、碳數7至8之芳烷基、或烯丙基。碳數1至8之烷基可為直鏈狀、具支鏈狀、環狀之任一者,可舉例如甲基、乙基、丙基、異丙基、正丁基、第三丁基、己基、環己基、甲基環己基等,但並不限定於此等。碳數6至8之芳基可舉例如苯基、甲苯基、二甲苯基、乙基苯基等,但並不限定於此等。碳數7至8之芳烷基可舉例如苄基、α-甲基苄基等,但並不限定於此等。此等取代基中,由取得容易性及作成硬化物時之反應性的觀點考量,較佳為苯基、碳數1至3的烷基,特佳為甲基。 In the general formula (1), R independently represents a hydrocarbon group with 1 to 8 carbons, preferably an alkyl group with 1 to 8 carbons, an aryl group with 6 to 8 carbons, an aralkyl group with 7 to 8 carbons , or allyl. The alkyl group with 1 to 8 carbons can be straight chain, branched chain, or cyclic, such as methyl, ethyl, propyl, isopropyl, n-butyl, tert-butyl , hexyl, cyclohexyl, methylcyclohexyl, etc., but not limited thereto. The aryl group having 6 to 8 carbon atoms includes, for example, phenyl, tolyl, xylyl, ethylphenyl, etc., but is not limited thereto. Examples of the aralkyl group having 7 to 8 carbon atoms include benzyl and α-methylbenzyl, but are not limited thereto. Among these substituents, a phenyl group and an alkyl group having 1 to 3 carbon atoms are preferred, and a methyl group is particularly preferred from the viewpoint of ease of availability and reactivity when it is made into a cured product.

R2獨立地表示氫原子或二環戊烯基,且1個以上為二環戊烯基。較佳為,相對於一個苯酚環,一分子中的R2平均具有0.1至1個二環戊烯基。 R 2 independently represent a hydrogen atom or a dicyclopentenyl group, and one or more of them are dicyclopentenyl groups. Preferably, R2 in one molecule has an average of 0.1 to 1 dicyclopentenyl group with respect to one phenol ring.

二環戊烯基係來自二環戊二烯的基,可以下述式(1a)或式(1b)表示。 The dicyclopentenyl group is a group derived from dicyclopentadiene, and can be represented by the following formula (1a) or formula (1b).

Figure 111130098-A0202-12-0006-6
Figure 111130098-A0202-12-0006-6

R3獨立地表示氫原子或碳數1至4之烴基,較佳為碳數1至4之烷基。碳數1至4之烷基可舉例如甲基、乙基、丙基、異丙基、正丁基、第三丁基等,但並不限定於此等。此等取代基中,由取得容易性及作成硬化物時之反應性的觀點考量,較佳為氫原子或甲基,特佳為氫原子。 R 3 independently represents a hydrogen atom or a hydrocarbon group having 1 to 4 carbons, preferably an alkyl group having 1 to 4 carbons. Examples of the alkyl group having 1 to 4 carbon atoms include methyl, ethyl, propyl, isopropyl, n-butyl, tert-butyl, etc., but are not limited thereto. Among these substituents, a hydrogen atom or a methyl group is preferred, and a hydrogen atom is particularly preferred, from the viewpoint of ease of acquisition and reactivity when it is made into a cured product.

n為重複數,表示0或1以上之數,其平均值(數量平均)為1至5,較佳為1.1至3,更佳為1.5至2.5,又更佳為1.6至2。藉由GPC所得之含量,較佳為n=0體占10面積%以下、n=1體占50至80面積%、n=2體占15至30面積%之範圍。 n is the number of repetitions, representing a number of 0 or more, and its average value (number average) is 1 to 5, preferably 1.1 to 3, more preferably 1.5 to 2.5, and more preferably 1.6 to 2. The content obtained by GPC is preferably within the range of 10 area % or less for the n=0 body, 50 to 80 area % for the n=1 body, and 15 to 30 area % for the n=2 body.

烯丙基醚化合物(樹脂)之分子量,較佳為重量平均分子量(Mw)為500至2000、數量平均分子量(Mn)為450至1000之範圍。 The molecular weight of the allyl ether compound (resin) is preferably in the range of 500 to 2000 for weight average molecular weight (Mw) and 450 to 1000 for number average molecular weight (Mn).

氫基當量(g/eq)較佳為5000以上,更佳為10000以上,軟化點,較佳為(室溫半固形)至100℃,更佳為45至80℃,150℃之熔融黏度較佳為1.0Pa.s以下,更佳為0.50Pa.s以下,更佳為0.20Pa.s以下。總氯量較佳為1000ppm以下,更佳為500ppm以下。 The hydrogen equivalent (g/eq) is preferably above 5,000, more preferably above 10,000, the softening point is preferably (semi-solid at room temperature) to 100°C, more preferably 45 to 80°C, and the melt viscosity at 150°C is higher than The best is 1.0Pa. s or less, more preferably 0.50Pa. s or less, more preferably 0.20Pa. below s. The total chlorine content is preferably at most 1000 ppm, more preferably at most 500 ppm.

本發明之通式(1)所表示之烯丙基醚化合物(樹脂),例如可由下述通式(2)所表示之多元羥基樹脂所得。 The allyl ether compound (resin) represented by the general formula (1) of the present invention can be obtained, for example, from a polyhydric hydroxyl resin represented by the following general formula (2).

Figure 111130098-A0202-12-0007-7
Figure 111130098-A0202-12-0007-7

此處,R1、R2、及n與上述通式(1)中之定義為相同意義。 Here, R 1 , R 2 , and n have the same meanings as defined in the above general formula (1).

通式(2)所表示之多元羥基樹脂,可藉由使下述通式(3)所表示之2,6-二取代苯酚類、與二環戊二烯,於三氟化硼-醚觸媒等路易士酸存在下反應而得。 The polyhydric hydroxyl resin represented by the general formula (2) can be obtained by contacting 2,6-disubstituted phenols represented by the following general formula (3) with dicyclopentadiene in boron trifluoride-ether Medium and other Lewis acid in the presence of the reaction derived.

Figure 111130098-A0202-12-0007-8
Figure 111130098-A0202-12-0007-8

此處,R1與上述通式(1)中之定義為相同意義。 Here, R1 has the same meaning as defined in the above general formula (1).

上述2,6-二取代苯酚類可舉例如2,6-二甲基苯酚、2,6-二乙基苯酚、2,6-二丙基苯酚、2,6-二異丙基苯酚、2,6-二(正丁基)苯酚、2,6-二(第三丁基)苯酚、2,6-二己基苯酚、2,6-二環己基苯酚、2,6-二苯基苯酚、2,6-二甲苯基苯酚、2,6-二苄基苯酚、2,6-二雙(α-甲基苄基)苯酚、2-乙基-6-甲基苯酚、2-烯丙基-6-甲基苯酚、2-甲苯基-6-苯基苯酚等,由取得容易性及作成硬化物時之反應性的觀點考量,較佳為2,6-二苯基苯酚、2,6-二甲基苯酚,特佳為2,6-二甲基苯酚。 The above-mentioned 2,6-disubstituted phenols can be, for example, 2,6-dimethylphenol, 2,6-diethylphenol, 2,6-dipropylphenol, 2,6-diisopropylphenol, 2 ,6-di(n-butyl)phenol, 2,6-di(tert-butyl)phenol, 2,6-dihexylphenol, 2,6-dicyclohexylphenol, 2,6-diphenylphenol, 2,6-xylylphenol, 2,6-dibenzylphenol, 2,6-bis(α-methylbenzyl)phenol, 2-ethyl-6-methylphenol, 2-allyl -6-methylphenol, 2-tolyl-6-phenylphenol, etc. From the viewpoint of ease of acquisition and reactivity when it is made into a hardened product, 2,6-diphenylphenol, 2,6- - Dimethylphenol, particularly preferably 2,6-dimethylphenol.

上述反應所使用之觸媒或路易士酸,具體而言由三氟化硼、三氟化硼.苯酚錯合物、三氟化硼-醚錯合物、氯化鋁、氯化錫、氯化鋅、氯化鐵等。其中,由操作容易性考量,較佳為三氟化硼-醚錯合物。觸媒的使用量在使用三 氟化硼-醚錯合物時,相對於二環戊二烯100質量份為0.001至20質量份,較佳為0.5至10質量份。 The catalyst or Lewis acid used in the above reaction is specifically composed of boron trifluoride, boron trifluoride. Phenol complexes, boron trifluoride-ether complexes, aluminum chloride, tin chloride, zinc chloride, ferric chloride, etc. Among them, boron trifluoride-ether complexes are preferred in consideration of ease of operation. The amount of catalyst used is three In the case of boron fluoride-ether complex, it is 0.001-20 mass parts with respect to 100 mass parts of dicyclopentadiene, Preferably it is 0.5-10 mass parts.

用以於2,6-取代類導入上述二環戊烯基的方法,係與使2,6-二取代苯酚類與以既定比率的二環戊二烯反應的方法,可連續地添加二環戊二烯使其反應,亦可分為數階段地添加(兩次以上的分批逐次添加),亦可間歇地反應。比率係相對於2,6-二取代苯酚類1莫耳,二環戊二烯為0.25至2倍莫耳。 The method for introducing the above-mentioned dicyclopentenyl group into 2,6-substituted phenols is the same as the method of reacting 2,6-disubstituted phenols with dicyclopentadiene at a predetermined ratio, and the dicyclopentadiene can be added continuously The reaction of pentadiene may be performed in several stages (addition of two or more batches), or the reaction may be performed intermittently. The ratio is 0.25 to 2 times mole of dicyclopentadiene relative to 1 mole of 2,6-disubstituted phenol.

當連續地添加二環戊二烯使其反應時的比率,相對於2,6-二取代苯酚類1莫耳,二環戊二烯為0.25至1倍莫耳,較佳為0.28至1倍莫耳,更佳為0.3至0.5倍莫耳。當將二環戊二烯分批逐次添加而使其反應時,整體較佳為0.8至2倍莫耳,更佳為0.9至1.7倍莫耳。又,於各階段之二環戊二烯的使用比率,較佳為0.1至1倍莫耳。又,亦可於反應中途回收未反應之2,6-二取代苯酚類。較佳為,導入二環戊二烯作為主鏈,之後,為了導入作為側鏈R2之二環戊二烯基,進行兩次以上的分批逐次添加。 The ratio when dicyclopentadiene is continuously added and reacted is 0.25 to 1 mole, preferably 0.28 to 1 mole, of dicyclopentadiene relative to 1 mole of 2,6-disubstituted phenols mole, more preferably 0.3 to 0.5 times mole. When dicyclopentadiene is added in batches to react, the whole is preferably 0.8 to 2 times mole, more preferably 0.9 to 1.7 times mole. Also, the usage ratio of dicyclopentadiene in each stage is preferably 0.1 to 1 mole. Also, unreacted 2,6-disubstituted phenols can be recovered during the reaction. It is preferable to introduce dicyclopentadiene as the main chain, and then, to introduce the dicyclopentadienyl group as the side chain R 2 , add two or more batches successively.

於該反應中,不僅包含取代位置不同的異構物,亦包含二環戊二烯結構與鍵結有苯酚中之羥基的結構。 In this reaction, not only isomers with different substitution positions but also dicyclopentadiene structures and structures bonded to hydroxyl groups in phenol are included.

於上述通式(2)所表示之多元羥基樹脂中,確認二環戊烯基已導入的方法,可使用質譜法(MS)與傅立葉轉換紅外線光譜儀(FT-IR)測定法。 In the polyhydric hydroxyl resin represented by the above general formula (2), the method of confirming that the dicyclopentenyl group has been introduced can use mass spectrometry (MS) and Fourier transform infrared spectrometer (FT-IR) measurement.

當使用質譜法時,可使用電噴灑游離質譜法(ESI-MS)或場脫附法(FD-MS)。藉由對以GPC等將核體數分離成相異成分之樣品進行質譜法,可確認二環戊烯基已導入。 When using mass spectrometry, electrospray ionization mass spectrometry (ESI-MS) or field desorption (FD-MS) can be used. The introduction of the dicyclopentenyl group can be confirmed by performing mass spectrometry on a sample whose nucleosome numbers have been separated into distinct components by GPC or the like.

當使用FT-IR測定法時,是將溶解於THF等有機溶劑的樣品塗布於KRS-5槽上,使有機溶劑乾燥後得附樣品薄膜槽,對該附樣品薄膜槽以IR進 行測定後,於1210cm-1附近出現來自苯酚核中C-O振動伸縮的波峰,只導入二環戊烯基時,於3040cm-1附近出現來自二環戊二烯骨架之烯烴部位之C-H振動伸縮的波峰。鍵結於主鏈的二環戊二烯由於烯烴部位消失,故未檢測出,僅可測定出作為測鏈R2導入之二環戊烯基的烯烴。將目標波峰的開始與結束以直線連接者作為基準線,當以波峰頂點距離基準線的長度作為波峰高度時,根據3040cm-1附近的波峰(A3040)與1210cm-1附近的波峰(A1210)的比率(A3040/A1210),可定量二環戊烯基的導入量。可確認到該比率愈大物性值愈好,用以滿足目標物性的較佳比率(A3040/A1210)為0.05以上,更佳為0.10以上,特佳為0.10至0.30。 When the FT-IR measurement method is used, the sample dissolved in an organic solvent such as THF is applied to the KRS-5 tank, and the organic solvent is dried to obtain a film tank with a sample. After measuring the film tank with a sample by IR, A peak originating from the stretching and stretching of CO in the phenol core appears around 1210cm -1 , and a peak originating from the stretching and stretching of CH at the olefin part of the dicyclopentadiene skeleton appears around 3040cm -1 when only dicyclopentenyl groups are introduced. The dicyclopentadiene bonded to the main chain was not detected because the olefin part disappeared, and only the olefin of the dicyclopentenyl group introduced as chain measuring R2 could be measured. The beginning and end of the target peak are connected by a straight line as the reference line, and when the peak height is taken as the peak height from the peak apex to the reference line, according to the peak near 3040cm -1 (A 3040 ) and the peak near 1210cm -1 (A 1210 ) ratio (A 3040 /A 1210 ), the amount of dicyclopentenyl introduced can be quantified. It has been confirmed that the larger the ratio, the better the physical properties. The preferred ratio (A 3040 /A 1210 ) for satisfying the target physical properties is 0.05 or more, more preferably 0.10 or more, and most preferably 0.10 to 0.30.

多官能羥基樹脂的羥基當量較佳為150至500,更佳為200至350。平均分子量,重量平均分子量(Mw)較佳為400至2000,更佳為500至2000,數量平均分子量(Mn)較佳為350至1000,更佳為400至800。軟化點較佳為70至150℃,更佳為80至120℃。 The hydroxyl equivalent weight of the polyfunctional hydroxyl resin is preferably 150-500, more preferably 200-350. The average molecular weight, the weight average molecular weight (Mw) is preferably 400-2000, more preferably 500-2000, and the number average molecular weight (Mn) is preferably 350-1000, more preferably 400-800. The softening point is preferably from 70 to 150°C, more preferably from 80 to 120°C.

本反應可以下述方式進行,亦即將2,6-二取代苯酚類與觸媒裝填於反應器,耗費1至10小時將二環戊二烯滴下。 This reaction can be carried out in the following manner, that is, the 2,6-disubstituted phenol and the catalyst are loaded into the reactor, and the dicyclopentadiene is dropped over 1 to 10 hours.

反應溫度較佳為50至200℃,更佳為100至180℃,再更佳為120至160℃。反應時間較佳為1至10小時,更佳為3至10小時,再更佳為4至8小時。 The reaction temperature is preferably from 50 to 200°C, more preferably from 100 to 180°C, and still more preferably from 120 to 160°C. The reaction time is preferably 1 to 10 hours, more preferably 3 to 10 hours, even more preferably 4 to 8 hours.

反應結束後,加入氫氧化鈉、氫氧化鉀、清氧化鈣等鹼使觸媒失活。之後,加入甲苯、二甲苯等芳香族烴類、或甲乙酮、甲基異丁基酮等酮類等之溶劑使其溶解,水洗後,於減壓下回收溶劑,即可得目標物之多元羥基樹脂。又,較佳為,使二環戊二烯盡可能地全量反應,使2,6-二取代苯酚類的一部分(較佳為10%以下)未反應,而將其減壓回收。 After the reaction is finished, alkalis such as sodium hydroxide, potassium hydroxide, and calcium oxide are added to deactivate the catalyst. After that, add aromatic hydrocarbons such as toluene and xylene, or ketones such as methyl ethyl ketone and methyl isobutyl ketone to dissolve them, wash with water, and recover the solvent under reduced pressure to obtain the polyhydric hydroxyl group of the target product. resin. Moreover, it is preferable to react as much dicyclopentadiene as possible and to recover a part (preferably 10% or less) of 2,6-disubstituted phenols under reduced pressure without reacting.

於反應之際,視需要亦可使用苯、甲苯、二甲苯等芳香族烴類;甲乙酮、甲基異丁基酮等酮類;氯苯、二氯苯等鹵化烴類;或乙二醇二甲醚、二乙二醇二甲醚等醚類等溶劑。 During the reaction, aromatic hydrocarbons such as benzene, toluene, and xylene; ketones such as methyl ethyl ketone and methyl isobutyl ketone; halogenated hydrocarbons such as chlorobenzene and dichlorobenzene; Solvents such as ethers such as methyl ether and diethylene glycol dimethyl ether.

本發明之通式(1)所表示之烯丙基醚化合物,可藉由使通式(2)所表示之多元羥基樹脂的羥基烯丙基醚化而得。 The allyl ether compound represented by the general formula (1) of the present invention can be obtained by etherifying the hydroxy allyl group of the polyhydric hydroxyl resin represented by the general formula (2).

用以製得通式(1)所表示之烯丙基醚化合物的烯丙基醚化法,可舉例如使通式(2)所表示之多元羥基樹脂,在溶劑中於鹼化合物的存在下與鹵化烯丙基化合物反應(烯丙基醚化反應)。此時,可於事先使多元羥基樹脂溶解於溶劑之後,添加鹵化烯丙基化合物溶液與鹼化合物溶液而使其反應。該烯丙基醚化反應,可以下述方式進行,亦即將多元羥基樹脂與溶劑裝填於反應器,使其溶解後,將鹵化烯丙基化合物溶液及鹼化合物溶液滴下。 The allyl etherification method used to obtain the allyl ether compound represented by the general formula (1) can be, for example, make the polyhydric hydroxyl resin represented by the general formula (2) in the presence of an alkali compound in a solvent Reaction with halogenated allyl compounds (allyl etherification). At this time, after dissolving the polyhydric hydroxyl resin in a solvent in advance, you may add and react a halogenated allyl compound solution and an alkali compound solution. The allyl etherification reaction can be carried out in the following manner, that is, the polyhydric hydroxyl resin and the solvent are filled in a reactor to be dissolved, and then the halogenated allyl compound solution and the alkali compound solution are dropped.

鹵化烯丙基化合物可舉例如烯丙基氯、烯丙基溴、甲基烯丙基氯、甲基烯丙基溴等。此等之中,由與多元羥基樹脂之反應性的觀點考量,較佳為烯丙基氯或烯丙基溴。 The halogenated allyl compound includes, for example, allyl chloride, allyl bromide, methallyl chloride, methallyl bromide, and the like. Among these, allyl chloride or allyl bromide is preferred from the viewpoint of reactivity with polyhydric hydroxy resins.

烯丙基氯有烯丙基氯彼此聚合而成為聚合物(聚烯丙基氯)的傾向,故於製造所使用之烯丙基氯,較佳為使用聚烯丙基氯之含有比率少者。若所使用之烯丙基氯中的聚烯丙基氯含有比率高,會成為所得之烯丙基醚化合物的總氯量變多的主因,且烯丙基醚化合物的分子量增加,有於硬化物中產生微量凝膠化物之虞。為了降低總氯量,有可能需要追加相當量的鹼性物質。烯丙基氯中之聚烯丙基氯的含有比率,可藉由氣相層析(GC)等容易地進行確認,以面積比計,相對於烯丙基氯單體,聚烯丙基氯的含有比率較佳為1面積%以下,更佳為0.5面積%以下,又更佳為0.2面積%以下。 Allyl chloride tends to polymerize with each other to form a polymer (polyallyl chloride). Therefore, it is preferable to use a polyallyl chloride with a small content of the allyl chloride used in the production. . If the content ratio of polyallyl chloride in the allyl chloride used is high, it will become the main reason for the increase of the total chlorine content of the obtained allyl ether compound, and the molecular weight of the allyl ether compound will increase. There is a risk of a small amount of gelation in the medium. In order to reduce the total chlorine, it may be necessary to add a considerable amount of alkaline substances. The content ratio of polyallyl chloride in allyl chloride can be easily confirmed by gas chromatography (GC), etc. In terms of area ratio, polyallyl chloride relative to allyl chloride monomer The content ratio of the compound is preferably at most 1 area %, more preferably at most 0.5 area %, and still more preferably at most 0.2 area %.

相對於多元羥基樹脂的羥基1莫耳,鹵化烯丙基化合物的使用量通常為1.0至2.0莫耳,較佳為1.0至1.5莫耳,更佳為1.0至1.25莫耳,再更佳為1.0至1.2莫耳。 The amount of the halogenated allyl compound is usually 1.0 to 2.0 moles, preferably 1.0 to 1.5 moles, more preferably 1.0 to 1.25 moles, and more preferably 1.0 moles relative to 1 mole of hydroxyl groups in the polyhydroxy resin. to 1.2 moles.

烯丙基醚化合物之製造所使用之鹼化合物,較佳為鹼金屬氫氧化物,具體例可舉例如氫氧化鈉、氫氧化鉀、碳酸鉀、碳酸鈉,較佳為氫氧化鈉、氫氧化鉀。如此之鹼金屬氫氧化物可以固形物的狀態使用,亦可以其水溶液的狀態使用。 Alkali compounds used in the manufacture of allyl ether compounds are preferably alkali metal hydroxides. Specific examples can include sodium hydroxide, potassium hydroxide, potassium carbonate, and sodium carbonate, preferably sodium hydroxide, hydroxide potassium. Such an alkali metal hydroxide may be used in the state of a solid, or in the state of its aqueous solution.

相對於多元羥基樹脂之羥基1莫耳,鹼化合物之使用量通常為1.0至2.0莫耳,較佳為1.0至1.8莫耳,更佳為1.0至1.5莫耳,再更佳為1.0至1.3莫耳,特佳為1.0至1.1莫耳。 Relative to 1 mole of hydroxyl groups in the polyhydroxy resin, the amount of the alkali compound used is usually 1.0 to 2.0 moles, preferably 1.0 to 1.8 moles, more preferably 1.0 to 1.5 moles, and more preferably 1.0 to 1.3 moles mol, preferably 1.0 to 1.1 mol.

烯丙基醚化合物之製造所使用之溶劑,並無特別限定,可舉例如甲醇、乙醇、正丙醇、異丙醇、正丁醇等醇類、丙酮、甲乙酮、甲基異丁基酮等酮類、四氫呋喃、二噁烷、二乙二醇二甲醚(diglyme)等醚類、二甲基乙醯胺、二甲基甲醯胺、二甲亞碸等非質子性極性溶劑等,可使用此等中之一種或兩種以上的有機溶劑。又,亦可將水與上述有機溶劑混合使用。 The solvent used in the production of the allyl ether compound is not particularly limited, and examples include alcohols such as methanol, ethanol, n-propanol, isopropanol, and n-butanol, acetone, methyl ethyl ketone, methyl isobutyl ketone, etc. Ketones, tetrahydrofuran, dioxane, ethers such as diglyme, aprotic polar solvents such as dimethylacetamide, dimethylformamide, and dimethyloxide, etc. One or two or more of these organic solvents are used. Moreover, water and the said organic solvent can also be mixed and used.

相對於多元羥基樹脂的總質量100質量份,有機溶劑的使用量較佳為20至300質量份,更佳為25至250質量份,特佳為25至200質量份。二甲基亞碸等非質子性極性溶劑,由於對於水洗等之精製為無用,且沸點高而不易除去,其使用量相對於多元羥基樹脂的總質量100質量份,不宜超過300質量份。 The amount of the organic solvent used is preferably 20 to 300 parts by mass, more preferably 25 to 250 parts by mass, and most preferably 25 to 200 parts by mass relative to 100 parts by mass of the total mass of the polyvalent hydroxyl resin. Aprotic polar solvents such as dimethylsulfoxide are useless for purification such as washing with water and are difficult to remove due to their high boiling points. The amount used should not exceed 300 parts by mass relative to 100 parts by mass of the total mass of the polyhydroxy resin.

又,除上述水、有機溶劑之外,亦可含有甲苯等有機溶劑(其他有機溶劑),相對於前述溶劑的使用量,其他有機溶劑的使用量較佳為100質量份以下,更佳為0.5至50質量份。 Also, in addition to the above-mentioned water and organic solvents, organic solvents such as toluene (other organic solvents) may also be contained, and the usage-amount of other organic solvents is preferably less than 100 parts by mass, more preferably 0.5 parts by mass, relative to the usage-amount of the aforementioned solvents. to 50 parts by mass.

多元羥基樹脂之烯丙基醚化反應的反應溫度,通常為30至90℃,較佳為35至80℃。又,為了得到更高純度之烯丙基醚化合物,較佳為分成兩個階段以上使反應溫度上升,例如,特佳為第一階段為35至50℃、第二階段為45至100℃。 The reaction temperature of the allyl etherification reaction of the polyhydroxy resin is usually 30 to 90°C, preferably 35 to 80°C. Also, in order to obtain an allyl ether compound of higher purity, it is preferable to raise the reaction temperature in two or more stages, for example, it is particularly preferable to set the temperature at 35 to 50°C in the first stage and 45 to 100°C in the second stage.

多元羥基樹脂之烯丙基醚化反應的反應時間,通常為0.5至10小時,較佳為1至8小時,特佳為1至5小時。反應時間若為0.5小時以上則反應可以充分進行,藉由為10小時以下,可將副生成物的生成量抑制為較低。 The reaction time of the allyl etherification reaction of the polyhydroxy resin is usually 0.5 to 10 hours, preferably 1 to 8 hours, and particularly preferably 1 to 5 hours. When the reaction time is 0.5 hours or more, the reaction can proceed sufficiently, and by being 10 hours or less, the amount of by-products produced can be kept low.

反應結束後,於加熱減壓下將溶劑蒸餾除去,或不進行蒸餾除去,而溶解於碳數4至7之酮化合物(可舉例如甲基異丁基酮、甲乙酮、環戊酮、環己酮等)、或甲苯等有機溶劑,以加溫至40至90℃(較佳為50至80℃)的狀態進行水洗使水層成為pH5至8,以將副生成之鹽除去。 After the reaction is over, the solvent is distilled off under heat and reduced pressure, or not distilled off, but dissolved in a ketone compound with 4 to 7 carbons (such as methyl isobutyl ketone, methyl ethyl ketone, cyclopentanone, cyclohexane Ketones, etc.), or organic solvents such as toluene, and wash with water in a state heated to 40 to 90°C (preferably 50 to 80°C) to make the pH of the water layer 5 to 8 to remove by-product salts.

又,多元羥基樹脂之烯丙基醚化反應,一般係於將氮等非活性氣體吹入系統內(氣中或液中)之情況下進行。藉由於將非活性氣體吹入系統內之情況下進行反應,可防止所得之生成物著色。 Also, the allyl etherification reaction of polyhydric hydroxyl resin is generally carried out by blowing inert gas such as nitrogen into the system (in gas or in liquid). By carrying out the reaction by blowing an inert gas into the system, coloration of the resulting product can be prevented.

非活性氣體之每單位時間的吹入量,雖依該反應所使用之反應釜的容積而不同,但較佳為例如以可於0.5至20小時取替換反應釜之容積的方式,調整非活性氣體每單位時間的吹入量。 The blowing amount of the inert gas per unit time varies depending on the volume of the reactor used for the reaction, but it is preferable to adjust the inactive gas so that the volume of the reactor can be replaced in 0.5 to 20 hours, for example. The amount of gas blown in per unit time.

本發明之樹脂組成物所含有之馬來醯亞胺化合物,並無特別限定,可舉例如N-苯基馬來醯亞胺、N-羥基苯基馬來醯亞胺、4,4’-二苯基甲烷雙馬來醯亞胺、聚苯基甲烷馬來醯亞胺、間伸苯基雙馬來醯亞胺、對伸苯基雙馬來醯亞胺、2,2’-[4-(4-馬來醯亞胺苯氧基)苯基]丙烷、3,3’-二甲基-5,5’-二乙基-4,4’-二苯基甲烷雙馬來醯亞胺、雙(3,5-二甲基-4-馬來醯亞胺苯基)甲烷、雙-(3-乙基- 5-甲基-4-馬來醯亞胺苯基)甲烷、雙(3,5-二乙基-4-馬來醯亞胺苯基)甲烷、4-甲基-1,3-伸苯基雙馬來醯亞胺、4,4’-二苯基醚雙馬來醯亞胺、4,4’-二苯碸雙馬來醯亞胺、1,3-雙(3-馬來醯亞胺苯氧基)苯、N,N’-伸乙基二馬來醯亞胺、N,N’-六亞甲基二馬來醯亞胺、下述通式(4)所表示之馬來醯亞胺化合物(樹脂)、或該等馬來醯亞胺化合物之預聚物、或馬來醯亞胺化合物與胺化合物的預聚物等。 The maleimide compound contained in the resin composition of the present invention is not particularly limited, and examples include N-phenylmaleimide, N-hydroxyphenylmaleimide, 4,4'- Diphenylmethane bismaleimide, polyphenylmethane maleimide, m-phenylene bismaleimide, p-phenylene bismaleimide, 2,2'-[4 -(4-maleimidephenoxy)phenyl]propane, 3,3'-dimethyl-5,5'-diethyl-4,4'-diphenylmethanebismaleimide Amine, bis(3,5-dimethyl-4-maleimidophenyl)methane, bis-(3-ethyl- 5-Methyl-4-maleimidephenyl)methane, bis(3,5-diethyl-4-maleimidephenyl)methane, 4-methyl-1,3-phenylene 1,3-bis(3-maleimide) iminophenoxy)benzene, N,N'-ethylene dimaleimide, N,N'-hexamethylene dimaleimide, horses represented by the following general formula (4) A maleimide compound (resin), or a prepolymer of the maleimide compound, or a prepolymer of a maleimide compound and an amine compound, etc.

Figure 111130098-A0202-12-0013-9
Figure 111130098-A0202-12-0013-9

此處, here,

R4獨立地表示碳數1至5之烷基或芳香族基。 R 4 independently represents an alkyl group or an aromatic group having 1 to 5 carbon atoms.

R5獨立地表示氫原子或甲基。 R 5 independently represents a hydrogen atom or a methyl group.

a表示0至4,較佳為0至2。 a represents 0-4, preferably 0-2.

b表示0至3,較佳為0至2。 b represents 0-3, preferably 0-2.

r及q為0或1。 r and q are 0 or 1.

m為重複數,平均值為1至10,較佳為1至5。 m is the number of repetitions, and the average value is 1-10, preferably 1-5.

本發明之數脂組成物,係以本發明之通式(1)所表示之烯丙基醚化合物(樹脂)與馬來醯亞胺化合物(樹脂)作為必要成分。相對於馬來醯亞胺化合物100質量份,烯丙基醚化合物之含量較佳為5至900質量份,更佳為10至300質量份,又更佳為50至200質量份,特佳為100至200質量份。 The lipid composition of the present invention contains the allyl ether compound (resin) and the maleimide compound (resin) represented by the general formula (1) of the present invention as essential components. With respect to 100 parts by mass of the maleimide compound, the content of the allyl ether compound is preferably 5 to 900 parts by mass, more preferably 10 to 300 parts by mass, more preferably 50 to 200 parts by mass, particularly preferably 100 to 200 parts by mass.

用以製得本發明之樹脂組成物所使用之烯丙基醚化合物,除本發明之通式(1)所表示之烯丙基醚化合物之外,亦可視需要併用各種烯丙基醚化合物之一種或兩種以上。較佳為,烯丙基醚化合物中之至少30質量%以上為本發明之烯丙基醚化合物,更佳為含有50質量%以上。低於該含量時,介電特性會有變差之虞。 In order to obtain the allyl ether compound used for the resin composition of the present invention, in addition to the allyl ether compound represented by the general formula (1) of the present invention, various allyl ether compounds can also be used in combination as required. One or more than two. Preferably, at least 30 mass % or more of the allyl ether compound is the allyl ether compound of this invention, More preferably, it contains 50 mass % or more. When it is less than this content, there exists a possibility that a dielectric characteristic may deteriorate.

除本發明之烯丙基醚化合物(樹脂)之外,可併用之烯丙基醚化合物可舉例如使雙酚A、雙酚F、雙酚C、雙酚K、雙酚Z、雙酚S、四甲基雙酚A、四甲基雙酚F、四甲基雙酚S、四甲基雙酚Z、二羥基二苯基硫醚、4,4’-硫代雙(3-甲基-6-第三丁基苯酚)等之雙酚類烯丙基醚化後之烯丙基醚化合物,使鄰苯二酚、間苯二酚、甲基間苯二酚、氫醌、單甲基氫醌、二甲基氫醌、三甲基氫醌、單-第三丁基氫醌、二-第三丁基氫醌等二羥基苯類烯丙基醚化後之烯丙基醚化合物,將二羥基萘、二羥基甲基萘、二羥基甲基萘、三羥基萘等羥基萘類烯丙基醚化後之烯丙基醚化合物,或使Shonol BRG-555(AICA工業股份有限公司製)等苯酚酚醛清漆樹脂、DC-5(日鐵化學材料股份有限公司製)等甲酚酚醛清漆樹脂、芳香族改性苯酚酚醛清漆樹脂、雙酚A酚醛清漆樹脂、RESITOPTPM-100(群榮化學工業股份有限公司製)等三羥基苯基甲烷型酚醛清漆樹脂、萘酚酚醛清漆樹脂等苯酚類、萘酚類及/或雙酚類與醛類之縮合物、SN-160、SN-395、SN-485(日鐵化學材料股份有限公司製)等苯酚類、萘酚類及/或雙酚類與茬二醇之縮合物、苯酚類及/或萘酚類與異丙烯基苯乙酮之縮合物、苯酚類、萘酚類及/或雙酚類與二環戊二烯之反應物、苯酚類、萘酚類及/或雙酚類與聯苯系交聯劑的縮合物等所謂酚醛清漆樹脂亦即多元羥基樹脂等烯丙基醚化後之烯丙基醚化合物,三烯丙基三異氰酸酯等。由反應性與取得容易度的觀點考量,較佳為使雙酚A、雙 酚F等雙酚類烯丙基醚化後之烯丙基醚化合物。 In addition to the allyl ether compound (resin) of the present invention, the allyl ether compound that can be used in combination can be, for example, bisphenol A, bisphenol F, bisphenol C, bisphenol K, bisphenol Z, bisphenol S , tetramethylbisphenol A, tetramethylbisphenol F, tetramethylbisphenol S, tetramethylbisphenol Z, dihydroxydiphenylsulfide, 4,4'-thiobis(3-methyl - Allyl ether compounds of bisphenols such as 6-tert-butylphenol after allyl etherification, so that catechol, resorcinol, methyl resorcinol, hydroquinone, monomethyl Allyl ether compounds of dihydroxyphenyl allyletherification such as dihydroquinone, dimethylhydroquinone, trimethylhydroquinone, mono-tert-butylhydroquinone, di-tert-butylhydroquinone, etc. , the allyl ether compound after allyl etherification of hydroxynaphthalene such as dihydroxynaphthalene, dihydroxymethylnaphthalene, dihydroxymethylnaphthalene, trihydroxynaphthalene, or Shonol BRG-555 (AICA Industry Co., Ltd. ) and other phenol novolac resins, DC-5 (Nippon Steel Chemical Materials Co., Ltd. Phenols such as trishydroxyphenylmethane-type novolac resins such as Naphthalene Novolac resins, naphthols and/or bisphenols and aldehydes condensates, SN-160, SN-395 Condensates of phenols, naphthols and/or bisphenols and diols, phenols and/or naphthols and isopropenyl acetophenone, etc. Condensates of phenols, naphthols and/or bisphenols and dicyclopentadiene, condensates of phenols, naphthols and/or bisphenols and biphenyl crosslinking agents, etc. Novolac resin is allyl ether compound after allyl etherification such as polyhydroxy resin, triallyl triisocyanate, etc. From the viewpoint of reactivity and ease of acquisition, it is preferable to use bisphenol A, bisphenol A, Allyl ether compound after allyl etherification of bisphenols such as phenol F.

可視需要於本發明之樹脂組成物調配硬化促進劑。若使用硬化促進劑則會使可與馬來醯亞胺基進行交聯反應的化合物與馬來醯亞胺基產生加成反應而產生交聯,故硬化物顯示良好的物性。 A hardening accelerator may be formulated in the resin composition of the present invention as needed. If a hardening accelerator is used, a compound capable of cross-linking reaction with maleimide groups will undergo addition reaction with maleimide groups to cause cross-linking, so the cured product exhibits good physical properties.

硬化促進劑例如有胺類、咪唑類、有機膦類、路易士酸類、有機或氧化物類等,具體而言有1,8-二氮雜雙環(5,4,0)十一碳-7-烯、三乙二胺、苄基二甲胺、三乙醇胺、二甲基胺基乙醇、三(二甲基胺基甲基)酚等三級胺,2-甲基咪唑、2-苯基咪唑、2-乙基-4-甲基咪唑、2-苯基-4-甲基咪唑、2-十七基咪唑等咪唑類,三丁基膦、甲基二苯基膦、三苯基膦、二苯基膦、苯基膦等有機膦類,有機膦類與醌化合物的加成反應物,四苯基鏻-四苯基硼酸鹽、四苯基鏻-乙基三苯基硼酸鹽、四丁基鏻-四丁基硼酸鹽等四取代鏻-四取代硼酸鹽,2-乙基-4-甲基咪唑.四苯基硼酸鹽、N-甲基嗎啉.四苯基硼酸鹽等四苯基硼鹽,過氧化銅、過氧化醛類、過氧化氫、二烷基過氧化物、二醯基過氧化物、過氧化二碳酸酯、過氧化酯等有機過氧化物類等。相對於樹脂組成物100質量份,硬化促進劑的添加量為0.2至5質量份的範圍。 Hardening accelerators include, for example, amines, imidazoles, organic phosphines, Lewis acids, organic or oxides, etc., specifically 1,8-diazabicyclo(5,4,0)undeca-7 Tertiary amines such as -ene, triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris(dimethylaminomethyl)phenol, 2-methylimidazole, 2-phenyl Imidazole, 2-ethyl-4-methylimidazole, 2-phenyl-4-methylimidazole, 2-heptadecylimidazole and other imidazoles, tributylphosphine, methyldiphenylphosphine, triphenylphosphine , diphenylphosphine, phenylphosphine and other organic phosphines, addition reactants of organic phosphines and quinone compounds, tetraphenylphosphonium-tetraphenylborate, tetraphenylphosphonium-ethyltriphenylborate, Tetrabutylphosphonium-tetrabutyl borate and other tetrasubstituted phosphonium-tetrasubstituted borates, 2-ethyl-4-methylimidazole. Tetraphenylborate, N-methylmorpholine. Tetraphenyl boron salts such as tetraphenyl borate, copper peroxide, aldehyde peroxide, hydrogen peroxide, dialkyl peroxide, diacyl peroxide, peroxydicarbonate, peroxyester and other organic Peroxides, etc. The addition amount of the hardening accelerator is in the range of 0.2 to 5 parts by mass relative to 100 parts by mass of the resin composition.

於本發明之樹脂組成物,視需要亦可調配其他各種硬化性樹脂或熱塑性樹脂。 In the resin composition of the present invention, other various curable resins or thermoplastic resins can also be blended as needed.

硬化性樹脂可舉例如環氧樹脂、不飽和聚酯樹脂、硬化型馬來醯亞胺樹脂、聚氰酸酯樹脂、酚樹脂、於分子中具有一個以上之聚合性不飽和烴基一種以上的乙烯基化合物等。由低介電係數、低介電損耗正切的觀點考量,較佳為於分子中具有一個以上之聚合性不飽和烴基一種以上的乙烯基化合物。 Examples of hardening resins include epoxy resins, unsaturated polyester resins, hardening maleimide resins, polycyanate resins, phenol resins, ethylene resins having more than one polymerizable unsaturated hydrocarbon group in the molecule. base compounds, etc. From the viewpoint of low dielectric coefficient and low dielectric loss tangent, vinyl compounds having one or more polymerizable unsaturated hydrocarbon groups in the molecule are preferred.

當硬化性樹脂為環氧樹脂時,較佳為選自於一分子中具有兩個以 上之環氧基的環氧樹脂之一種以上的環氧樹脂。相關環氧樹脂可舉例如雙酚A型環氧樹脂、雙酚F型環氧樹脂、四甲基雙酚F型環氧樹脂、雙酚型環氧樹脂、氰醌型環氧樹脂、雙酚茀型環氧樹脂、萘二酚型環氧樹脂、雙酚S型環氧樹脂、二苯基硫醚型環氧樹脂、二苯醚環氧樹脂、間苯二酚型環氧樹脂、苯酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、烷基酚醛清漆型環氧樹脂、苯乙烯化苯酚酚醛清漆型環氧樹脂、雙酚酚醛清漆型環氧樹脂、奈酚酚醛清漆型環氧樹脂、β-奈酚芳烷基型環氧樹脂、萘二醇芳烷基型環氧樹脂、α-奈酚芳烷基型環氧樹脂、聯苯基芳烷基苯酚型環氧樹脂、三羥基苯基甲烷型環氧樹脂、四羥基苯基乙烷型環氧樹脂、二環戊二烯型環氧樹脂、伸烷二醇型環氧樹脂、脂肪族環狀環氧樹脂等。該等環氧樹脂可單獨使用,亦可併用同一類之環氧樹脂兩種以上,又,亦可組合不同類之環氧樹脂使用。 When the hardening resin is an epoxy resin, it is preferably selected from one molecule having two or more One or more epoxy resins on the epoxy base. Relevant epoxy resins include, for example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, tetramethylbisphenol F type epoxy resin, bisphenol type epoxy resin, cyanoquinone type epoxy resin, bisphenol fennel type epoxy resin, naphthalenediol type epoxy resin, bisphenol S type epoxy resin, diphenyl sulfide type epoxy resin, diphenyl ether type epoxy resin, resorcinol type epoxy resin, phenol novolac Varnish type epoxy resin, cresol novolac type epoxy resin, alkyl novolac type epoxy resin, styrenated phenol novolak type epoxy resin, bisphenol novolak type epoxy resin, naphthalene novolak type epoxy resin Oxygen resin, β-naphthol aralkyl type epoxy resin, naphthalene diol aralkyl type epoxy resin, α-naphthol aralkyl type epoxy resin, biphenyl aralkylphenol type epoxy resin, Trihydroxyphenylmethane-type epoxy resins, tetrahydroxyphenylethane-type epoxy resins, dicyclopentadiene-type epoxy resins, alkylene glycol-type epoxy resins, aliphatic cyclic epoxy resins, and the like. These epoxy resins may be used alone, or two or more types of epoxy resins of the same type may be used in combination, and epoxy resins of different types may be used in combination.

又,於含有環氧樹脂時,除環氧樹脂以外亦可使用硬化劑。硬化劑並無特別限制,可舉例如苯酚系硬化劑、胺系硬化劑、醯亞胺系化合物、酸酐系化合物、萘酚系硬化劑、活性酯系硬化劑、苯并噁嗪系硬化劑、氰酸酯系硬化劑等。此等可單獨使用,亦可將同種類之兩種以上,亦可與其他種類組合使用。 Moreover, when an epoxy resin is contained, you may use a hardening|curing agent other than an epoxy resin. The curing agent is not particularly limited, and examples thereof include phenol-based curing agents, amine-based curing agents, imide-based compounds, acid anhydride-based compounds, naphthol-based curing agents, active ester-based curing agents, benzoxazine-based curing agents, Cyanate-based hardeners, etc. These may be used alone, or two or more of the same type may be used in combination with other types.

再者,當調配環氧樹脂時,可視需要使用硬化促進劑。例如胺類、咪唑類、有機膦類、路易士酸等。一般相對於環氧樹脂100質量份,硬化促進劑的添加量為0.2至5質量份之範圍。 Furthermore, when compounding an epoxy resin, a hardening accelerator may be used as needed. For example, amines, imidazoles, organic phosphines, Lewis acids, etc. Generally, the addition amount of the hardening accelerator is in the range of 0.2 to 5 parts by mass relative to 100 parts by mass of the epoxy resin.

硬化性樹脂為於分子中具有一個以上之聚合性不飽和烴基之一種以上的乙烯基化合物類(以下,亦稱為乙烯基化合物類)時,其種類並無特別限定。亦即,乙烯基化合物類只要是可藉由與本發明之乙烯基化合物反應而形成交聯並硬化者即可。聚合性不飽和烴基較佳為碳-碳不飽和雙鍵者,更佳為於分子 中具有兩個以上之碳-碳不飽和雙鍵的化合物。 When the curable resin is one or more vinyl compounds (hereinafter also referred to as vinyl compounds) having one or more polymerizable unsaturated hydrocarbon groups in the molecule, the type is not particularly limited. That is, the vinyl compounds may be any as long as they can be crosslinked and cured by reacting with the vinyl compound of the present invention. The polymerizable unsaturated hydrocarbon group is preferably a carbon-carbon unsaturated double bond, more preferably a molecule Compounds with two or more carbon-carbon unsaturated double bonds.

作為硬化性樹脂之乙烯基化合物類之每一分子之碳-碳不飽和雙鍵的平均個數(乙烯基(含有取代乙烯基)之數量,亦稱為末端雙鍵數),雖因乙烯基化合物類之Mw而不同,但較佳為例如1至20個,更佳為2至18個。該末端雙鍵數若過少,則會有硬化物難以得到充分的耐熱性之傾向。又,末端雙鍵數若過多,則反應性過高,可能會產生例如組成物之保存安定性降低、或組成物之流動性降低等不良情形。 The average number of carbon-carbon unsaturated double bonds per molecule of vinyl compounds as hardening resins (the number of vinyl groups (including substituted vinyl groups), also known as the number of terminal double bonds), although vinyl The Mw of the compound varies, but is preferably, for example, 1 to 20, more preferably 2 to 18. When the number of terminal double bonds is too small, it tends to be difficult to obtain sufficient heat resistance of the cured product. Also, if the number of terminal double bonds is too large, the reactivity may be too high, which may cause problems such as lowered storage stability of the composition or lowered fluidity of the composition.

乙烯基化合物類可舉例如三烯丙基異三聚氰酸酯(TAIC)等三烯基異三聚氰酸酯化合物、末端羥(甲基)丙烯醯基或苯乙烯基改性之改性聚伸苯醚(PPE)、於分子中具有(甲基)丙烯醯基兩個以上之多官能(甲基)丙烯酸酯化合物、聚丁二烯等於分子中具有兩個以上的乙烯基之乙烯基化合物類(多官能乙烯基化合物類)、及苯乙烯、二乙烯苯等乙烯基苄基化合物等。其中,較佳為於分子中具有兩個以上之碳-碳不飽和雙鍵者,具體而言,可舉例如TAIC、多官能(甲基)丙烯酸酯化合物、改性PPE樹脂、多官能乙烯基化合物類、及二乙烯苯化合物等。若使用此等,則推測可藉由硬化反應而更合適地形成交聯,而可提高樹脂組成物之硬化物的耐熱性。又,此等可單獨使用,亦可組合兩種以上使用。又,亦可併用於分子中具有一個碳-碳不飽和雙鍵的化合物。於分子中具有一個碳-碳不飽和雙鍵的化合物可舉例如於分子中具有一個乙烯基的化合物(單乙烯基化合物類)等。 Vinyl compounds, such as triallyl isocyanurate (TAIC) and other trienyl isocyanurate compounds, modified terminal hydroxyl (meth)acryl or styrene groups Polyphenylene ether (PPE), polyfunctional (meth)acrylate compounds with two or more (meth)acryl groups in the molecule, polybutadiene equal to vinyl groups with two or more vinyl groups in the molecule Compounds (polyfunctional vinyl compounds), vinylbenzyl compounds such as styrene and divinylbenzene, and the like. Among them, those having two or more carbon-carbon unsaturated double bonds in the molecule are preferred, specifically, TAIC, multifunctional (meth)acrylate compounds, modified PPE resins, multifunctional vinyl Compounds, and divinylbenzene compounds, etc. If these are used, it is presumed that crosslinking can be formed more appropriately by the curing reaction, and the heat resistance of the cured product of the resin composition can be improved. In addition, these may be used alone or in combination of two or more. Moreover, it can also be used together with the compound which has one carbon-carbon unsaturated double bond in a molecule|numerator. The compound having one carbon-carbon unsaturated double bond in the molecule may, for example, be a compound having one vinyl group in the molecule (monovinyl compound) and the like.

熱塑性樹脂可舉例如苯氧基樹脂、聚氨甲酸酯樹脂、聚酯樹脂、聚乙烯樹脂、聚丙烯樹脂、聚苯乙烯樹脂、ABS樹脂、AS樹脂、氯乙烯樹脂、聚乙酸乙烯酯樹脂、聚甲基丙烯酸甲酯樹脂、聚碳酸酯樹脂、聚縮醛樹脂、環狀 聚烯烴樹脂、聚亞胺樹脂、熱塑性聚醯亞胺樹脂、聚亞胺醯亞胺樹脂、聚四氟乙烯樹脂、聚醚醯亞胺樹脂、聚伸苯醚樹脂、改性聚伸苯醚樹脂、聚醚碸樹脂、聚碸樹脂、聚醚醚酮樹脂、聚苯硫醚樹脂、聚乙烯甲醛樹脂、或已知之熱塑性彈性體(例如,苯乙烯-乙烯-丙烯共聚物、苯乙烯-乙烯-丁烯共聚物、苯乙烯-丁二烯共聚物、苯乙烯-異戊二烯共聚物、氫化苯乙烯-丁二烯共聚物、氫化苯乙烯-異戊二烯共聚物等)、或橡膠類(例如聚丁二烯、聚異戊二烯)等。較佳為聚伸苯醚樹脂(未改性)、氫化苯乙烯-丁二烯共聚物等。 Thermoplastic resins include, for example, phenoxy resins, polyurethane resins, polyester resins, polyethylene resins, polypropylene resins, polystyrene resins, ABS resins, AS resins, vinyl chloride resins, polyvinyl acetate resins, Polymethyl methacrylate resin, polycarbonate resin, polyacetal resin, cyclic Polyolefin resins, polyimide resins, thermoplastic polyimide resins, polyimideimide resins, polytetrafluoroethylene resins, polyetherimide resins, polyphenylene ether resins, modified polyphenylene ether resins , polyether resin, polyether resin, polyether ether ketone resin, polyphenylene sulfide resin, polyvinyl formaldehyde resin, or known thermoplastic elastomers (such as styrene-ethylene-propylene copolymer, styrene-ethylene- butene copolymer, styrene-butadiene copolymer, styrene-isoprene copolymer, hydrogenated styrene-butadiene copolymer, hydrogenated styrene-isoprene copolymer, etc.), or rubber (e.g. polybutadiene, polyisoprene) and the like. Preferable are polyphenylene ether resins (unmodified), hydrogenated styrene-butadiene copolymers, and the like.

本發明之樹脂組成物,視需要亦可含有填充材、矽烷耦合劑、抗氧化劑、脫模劑、消泡劑、乳化劑、搖變性賦予劑、平滑劑、阻燃劑、顏料等其他之添加劑等。 The resin composition of the present invention may also contain other additives such as fillers, silane coupling agents, antioxidants, release agents, defoamers, emulsifiers, thixotropy imparting agents, smoothing agents, flame retardants, pigments, etc. wait.

填充材具體而言可舉例如熔融二氧化矽、結晶二氧化矽、氧化鋁、氮化矽、氫氧化鋁、氮化矽、氫氧化鋁、水鋁石、氫氧化鎂、滑石、雲母、碳酸鈣、矽酸鈣、氫氧化鈣、碳酸鎂、碳酸鋇、硫酸鋇、氮化硼、碳、碳纖維、玻璃纖維、氧化鋁纖維、氧化矽氧化鋁纖維、碳化矽纖維、聚酯纖維、纖維素纖維、聚芳醯胺纖維、陶瓷纖維、微粒子橡膠、熱塑性彈性體等。使用填充材之理由可舉例如耐衝擊性的提升效果。又,當使用氫氧化鋁、水鋁石、氫氧化鎂等金屬氫氧化物時,會作為阻燃助劑產生作用而有提升阻燃性的效果。其中,較佳為二氧化矽、雲母及滑石,更佳為球狀二氧化矽。又,此等可單獨使用一種,亦可組合兩種以上使用。 Specifically, fillers include fused silica, crystalline silica, alumina, silicon nitride, aluminum hydroxide, silicon nitride, aluminum hydroxide, diaspore, magnesium hydroxide, talc, mica, carbonic acid Calcium, calcium silicate, calcium hydroxide, magnesium carbonate, barium carbonate, barium sulfate, boron nitride, carbon, carbon fiber, glass fiber, alumina fiber, silica alumina fiber, silicon carbide fiber, polyester fiber, cellulose fiber, aramid fiber, ceramic fiber, microparticle rubber, thermoplastic elastomer, etc. The reason for using the filler is, for example, the effect of improving impact resistance. In addition, when metal hydroxides such as aluminum hydroxide, diaspore, and magnesium hydroxide are used, they function as flame retardant additives to improve flame retardancy. Among them, silicon dioxide, mica and talc are preferable, and spherical silicon dioxide is more preferable. Moreover, these may be used individually by 1 type, and may use them in combination of 2 or more types.

填充劑可直接使用,但亦可使用經環氧基矽烷型或胺基矽烷型等矽烷耦合劑進行表面處理者。該矽烷耦合劑較佳為乙烯基矽烷型、甲基丙烯醯氧基矽烷型、丙烯醯氧基矽烷型、及苯乙烯基矽烷型之矽烷耦合劑。藉此,可提高 與金屬箔的接著強度或樹脂彼此的層間接著強度。又,亦可不使用對填充劑事先進行表面處理的方法,而是以整體摻混法添加矽烷耦合劑而使用。 The filler can be used directly, but it can also be surface-treated with silane coupling agents such as epoxy silane type or amino silane type. The silane coupling agent is preferably vinylsilane type, methacryloxysilane type, acryloxysilane type, and styrylsilane type silane coupling agent. In this way, it is possible to increase Adhesion strength with metal foil or interlayer adhesion strength between resins. In addition, instead of using the method of surface-treating the filler in advance, it is also possible to add a silane coupling agent by an integral blending method.

當將樹脂組成物作成板狀基板時,由其尺寸安定性、彎曲強度等觀點,較佳之填充材可舉例如纖維狀者。更佳可舉例如使用將玻璃纖維編織成網格狀之纖維狀基材之填充材的玻璃纖維基板。 When the resin composition is used as a plate-shaped substrate, from the viewpoint of dimensional stability, bending strength, etc., preferable fillers include, for example, fibrous fillers. A more preferable example is a glass fiber substrate using a filler of a fibrous base material in which glass fibers are woven into a grid.

相對於樹脂組成物(固體成分)100質量份,填充材的調配量較佳為1至150質量份,更佳為10至70質量份。調配量若多則硬化物會變脆,而有無法得到充分的機械物性之虞。又,若調配量少,則有可能無法得到硬化物的耐衝擊性提升等填充材的調配效果。 The compounding quantity of a filler is preferably 1-150 mass parts with respect to 100 mass parts of resin compositions (solid content), More preferably, it is 10-70 mass parts. When the compounding quantity is large, the hardened|cured material will become brittle, and there exists a possibility that sufficient mechanical properties may not be acquired. In addition, if the compounding amount is small, there is a possibility that the effect of compounding the filler such as improving the impact resistance of the cured product cannot be obtained.

相對於樹脂組成物(固體成分)100質量份,其他添加劑的調配量較佳為0.01至20質量份的範圍。 It is preferable that the compounding quantity of other additives is the range of 0.01-20 mass parts with respect to 100 mass parts of resin compositions (solid content).

藉由對本發明之樹脂組成物進行加熱硬化而可得硬化物。用以製得硬化物的方法,較佳可使用燒鑄、壓縮成形、轉注成形等、或以樹脂片、具樹脂之銅箔、預浸體等形態積層後進行加熱加壓硬化而作成積層板等之方法。此時之溫度通常為150至300℃的範圍,硬化時間通常為10分鐘至5小時左右。 A cured product can be obtained by heating and curing the resin composition of the present invention. The method used to obtain the hardened product is preferably to use casting, compression molding, transfer molding, etc., or laminated in the form of resin sheets, resin-coated copper foil, prepregs, etc., and then heated and pressurized to make a laminate. and so on. The temperature at this time is usually in the range of 150 to 300° C., and the curing time is usually about 10 minutes to 5 hours.

本發明之樹脂組成物可藉由將上述各成分均勻混合而製得。樹脂組成物可容易地以與習知方法同樣的方法作成硬化物。硬化物可舉例如積層物、燒鑄物、成型物、接著層、絕緣層、薄膜等成形硬化物。 The resin composition of the present invention can be prepared by uniformly mixing the above-mentioned components. The resin composition can be easily made into a cured product by the same method as a conventional method. Examples of the cured product include molded cured products such as laminates, cast products, molded products, adhesive layers, insulating layers, and films.

樹脂組成物可使用之用途可舉例如印刷配線基板材料、可撓性配線基板用樹脂組成物、增層基板用層間絕緣材料等電路基板用絕緣材料、半導體密封材料、導電膏、導電膜、增層用接著膜、樹脂燒鑄材料、接著劑等。該等各種用途之中,於印刷配線基板材料、電路基板用絕緣材料、增層用接著膜用途, 可將電容器等被動元件或IC晶片等主動元件埋入基板內,作為所謂電子零件內建用基板用的絕緣材料使用。此等之中,由於高阻燃性、低介電特性、及溶劑溶解性等特性,較佳為使用於印刷配線板材料、可撓性配線基板用樹脂組成物、增層基板用層間絕緣材料等電路基板(積層板)用材料及半導體密封材料。 Examples of applications where the resin composition can be used include printed wiring board materials, resin compositions for flexible wiring boards, insulating materials for circuit boards such as interlayer insulation materials for build-up boards, semiconductor sealing materials, conductive pastes, conductive films, build-up boards, etc. Adhesive films, resin casting materials, adhesives, etc. for layers. Among these various applications, printed wiring board materials, insulating materials for circuit boards, and adhesive films for build-up, Passive elements such as capacitors and active elements such as IC chips can be embedded in substrates, and used as insulating materials for so-called substrates for built-in electronic components. Among them, due to the characteristics of high flame retardancy, low dielectric properties, and solvent solubility, it is preferably used as a printed wiring board material, a resin composition for a flexible wiring board, and an interlayer insulating material for a build-up board. Materials for circuit boards (laminates) and semiconductor sealing materials.

使用本發明之樹脂組成物所得之密封材,有膠帶狀之半導體晶片用、接合型液狀密封用、底部填料用、半導體之層間絕緣膜用等,且可適合使用於此等。為了將樹脂組成物調製成半導體密封材料用,可舉例如下述方法,將視需要調配於樹脂組成物之無機填充材或矽烷耦合劑、脫模劑等添加劑預先混合之後,使用擠製機、捏合機、輥等充分熔融混合至均勻為止的方法。此時,無機填充材通常係使用二氧化矽,於樹脂組成物中較佳為調配無機質填充材70至95質量%。 The sealing material obtained by using the resin composition of the present invention can be suitably used for tape-like semiconductor wafers, bonding liquid seals, underfills, and interlayer insulating films of semiconductors. In order to prepare the resin composition as a semiconductor sealing material, for example, the following method can be used. After pre-mixing the inorganic filler, silane coupling agent, mold release agent, etc. The method of fully melting and mixing until uniformity by machine, roller, etc. At this time, silica is usually used as the inorganic filler, and it is preferable to mix 70 to 95% by mass of the inorganic filler in the resin composition.

使用如此所製得之樹脂組成物作為半導體封裝時,可舉例如對樹脂組成物使用燒鑄、或轉注成形機、射出成形機等成形,再以180至250℃進行加熱硬化0.5至5小時,藉此製得成形物的方法。 When using the resin composition obtained in this way as a semiconductor package, for example, the resin composition can be molded by casting, transfer molding machine, injection molding machine, etc., and then heated and hardened at 180 to 250°C for 0.5 to 5 hours. A method by which a shaped object is made.

當作為膠帶密封材使用時,可舉例如將其加熱製作成半硬化片並作成密封材膠帶後,將該密封材膠帶放置於半導體晶片上,加熱至100至150℃,使其軟化成形,再以180至250℃使其完全硬化的方法。又,當作為接合型液狀密封型時,可將所得之樹脂組成物視需要溶解於溶劑後,塗佈於半導體晶片或電子零件上,使其直接硬化即可。 When used as a tape sealant, for example, heat it to make a semi-hardened sheet and make a sealant tape, place the sealant tape on a semiconductor wafer, heat it to 100 to 150°C, soften it, and then A method of fully hardening at 180 to 250°C. Also, in the case of a joint type liquid sealing type, the obtained resin composition may be dissolved in a solvent if necessary, and then applied to a semiconductor wafer or an electronic component and cured directly.

本發明之樹脂組成物可溶解於有機溶劑調而製成清漆狀。可使用之有機溶劑可舉例如甲醇、乙醇等醇系溶劑,丙酮、甲乙酮、甲基異丁基酮、環己酮等酮系溶劑,四氫呋喃等醚系溶劑,二甲基甲醯胺、二甲基乙醯胺、N-甲基 吡咯酮等含氮原子之溶劑,二甲基亞碸等含硫原子之溶劑等,可使用一種或混合兩種以上使用。只要為工業上可取得之有機溶劑即可,並無特別限定,但由溶解性、操作性的觀點考量,較佳為甲乙酮、二甲基甲醯胺。 The resin composition of the present invention can be dissolved in an organic solvent to prepare a varnish. Usable organic solvents include, for example, alcohol-based solvents such as methanol and ethanol, ketone-based solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone, ether-based solvents such as tetrahydrofuran, dimethylformamide, dimethyl Acetamide, N-methyl Nitrogen atom-containing solvents such as pyrrolidone, and sulfur atom-containing solvents such as dimethylsulfone can be used alone or in combination of two or more. It is not particularly limited as long as it is an industrially available organic solvent, but methyl ethyl ketone and dimethylformamide are preferable from the viewpoint of solubility and handleability.

本發明之樹脂組成物在溶解於有機溶劑而作成清漆後,可含浸於玻璃纖維布、聚芳醯胺不織布、液晶聚合物等聚酯不織布等纖維狀物後,進行溶劑除去,而作成預浸體。又,將組成物清漆塗佈於銅箔、不鏽鋼箔、聚醯亞胺膜、聚酯膜等片狀物上後,藉由乾燥可製成接著片。 After the resin composition of the present invention is dissolved in an organic solvent to make a varnish, it can be impregnated into fibrous materials such as glass fiber cloth, aramid non-woven fabric, polyester non-woven fabric such as liquid crystal polymer, and then the solvent is removed to form a prepreg. body. Furthermore, after coating the composition varnish on a sheet-like material such as copper foil, stainless steel foil, polyimide film, polyester film, etc., it can be made into an adhesive sheet by drying.

使用上述預浸體形成積層板時,可將一片或複數片之預浸體積層,於單側或兩側配置金屬箔而構成積層物,藉由對該積層物進行加壓加熱使預浸體硬化、一體化而得積層體。此處之金屬箔,可使用銅、鋁、黃銅、鎳等之單獨、合金、複合之金屬箔。將積層物加熱加壓的條件,可依樹脂組成物硬化的條件適當調整以進行加熱加壓,而若加壓過低則所得之積層體的內部會殘留氣泡,使電氣特性降低,故期盼以可滿足成型性的條件進行加壓。加熱溫度較佳為160至250℃,更佳為170至220℃。加壓壓力較佳為0.5至10MPa,更佳為1至5MPa。加熱加壓時間較佳為10分鐘至4小時,更佳為40分鐘至3小時。再者,亦可將如此所得之單層的積層版作為內層材而作成多層板。此時,首先於積層版以加成法(Additive Process)或減成法(Subtractive Process)等實施電路形成,對所形成之電路表面施以黑化處理而得內層材。於該內層材之單面或兩側的電路形成面,以預浸體及接著片形成絕緣層,並且於絕緣層之表面形成導體層,而形成多層板者。 When using the above-mentioned prepreg to form a laminate, one or more prepreg bulk layers can be placed on one or both sides to form a laminate, and the prepreg can be made by pressing and heating the laminate. Hardened and integrated to obtain laminates. As the metal foil here, single, alloy or composite metal foils of copper, aluminum, brass, nickel, etc. can be used. The conditions for heating and pressing the laminate can be appropriately adjusted according to the curing conditions of the resin composition for heating and pressing. If the pressure is too low, air bubbles will remain inside the resulting laminate and the electrical properties will be reduced. Therefore, it is expected that Pressing is carried out under conditions that can satisfy moldability. The heating temperature is preferably from 160 to 250°C, more preferably from 170 to 220°C. The pressing pressure is preferably from 0.5 to 10 MPa, more preferably from 1 to 5 MPa. The heating and pressing time is preferably from 10 minutes to 4 hours, more preferably from 40 minutes to 3 hours. Furthermore, it is also possible to make a multi-layer board by using the single-layer laminate plate obtained in this way as an inner layer material. At this time, firstly, the circuit is formed on the laminate plate by the additive process or the subtractive process, and the inner layer material is obtained by blackening the surface of the formed circuit. A prepreg and an adhesive sheet are used to form an insulating layer on one or both sides of the inner layer, and a conductive layer is formed on the surface of the insulating layer to form a multilayer board.

[實施例] [Example]

以下舉實施例及比較例以具體說明本發明,但本發明並不限定於 此等。除特別說明以外,「份」表示質量份,「%」表示「質量%」,「ppm」表示質量ppm。又,測定方法係分別以以下之方法進行測定。 The following examples and comparative examples are given to specifically illustrate the present invention, but the present invention is not limited to etc. Unless otherwise specified, "part" means a mass part, "%" means a "mass %", and "ppm" means a mass ppm. In addition, the measurement method was measured by the following method, respectively.

‧羥基當量: ‧Hydroxyl equivalent:

依據JIS K0070標準進行測定,單位以「g/eq.」表示。又,除特別說明之外,多元羥基樹脂之羥基當量係指酚性羥基當量之意。 Measured in accordance with JIS K0070, and the unit is "g/eq." Moreover, unless otherwise specified, the hydroxyl equivalent of a polyhydric hydroxyl resin means the equivalent of a phenolic hydroxyl group.

‧軟化點: ‧Softening Point:

依據JIS K7234標準、環球法進行測定。具體而言,係使用自動軟化點裝置(Meitec股份有限公司製,ASP-MG4)。 Measured in accordance with JIS K7234 and the ring and ball method. Specifically, an automatic softening point device (manufactured by Meitec Co., Ltd., ASP-MG4) was used.

‧玻璃轉移溫度(Tg): ‧Glass transition temperature (Tg):

依據JIS C6481標準進行測定。以動態黏彈性測定裝置(日立高科技股份有限公司製,EXSTAR DMS6100),以5℃/分的升溫條件進行測定時之tanδ峰值表示。 Measurement was performed in accordance with JIS C6481. It is represented by the peak value of tan δ when the measurement is performed with a dynamic viscoelasticity measuring device (manufactured by Hitachi High-Tech Co., Ltd., EXSTAR DMS6100) at a temperature increase of 5°C/min.

‧相對介電係數介電損耗正切: ‧Relative permittivity dielectric loss tangent:

依據IPC-TM-650 2.5.5.9使用材料分析儀(AGILENT Technologies公司製),以容量法求出頻率1GHz之相對介電係數介電損耗正切,藉此來評價。 According to IPC-TM-650 2.5.5.9, use a material analyzer (manufactured by AGILENT Technologies Co., Ltd.) to obtain the dielectric loss tangent of the relative permittivity at a frequency of 1 GHz by the volumetric method, and evaluate it by this.

‧GPC(凝膠滲透層析)測定: ‧GPC (gel permeation chromatography) determination:

使用於本體(東索股份有限公司,HLC-8220GPC)以串聯的方式具備管柱(東索股份有限公司製,TSKgelG4000HXL、TSKgelG3000HXL、TSKgelG2000 HXL)者,管柱溫度為40℃。又,於沖提液使用四氫呋喃(THF),流速為1mL/分鐘,檢測器係使用差示折射率檢測器。測定試樣係使用將樣品0.1g溶解於10mL的THF,並以微濾器過濾後之50μL者。資料處理係使用東索股份有限公司製GPC-8020模式II版6.00。 It is used when the body (HLC-8220GPC, Toso Co., Ltd.) is equipped with a column (manufactured by Toso Co., Ltd., TSKgelG4000HXL, TSKgelG3000HXL, TSKgelG2000HXL) in series, and the temperature of the column is 40°C. In addition, tetrahydrofuran (THF) was used as the eluent, the flow rate was 1 mL/min, and a differential refractive index detector was used as the detector. As a measurement sample, 0.1 g of the sample was dissolved in 10 mL of THF, and 50 μL of the sample was filtered with a microfilter. For data processing, GPC-8020 model II version 6.00 manufactured by Toso Co., Ltd. was used.

‧IR: ‧IR:

使用傅立葉轉換型紅外線光譜儀(Perkin Elmer Precisely製,Spectrum One FT-IR Spectrometer 1760X),於槽使用KRS-5,使樣品溶解於THF後塗佈於槽上,使其乾燥後測定波數650至4000cm-1之吸光度。 Using a Fourier transform infrared spectrometer (manufactured by Perkin Elmer Precisely, Spectrum One FT-IR Spectrometer 1760X), use KRS-5 in the tank, dissolve the sample in THF, apply it on the tank, dry it, and measure the wave number from 650 to 4000 cm Absorbance of -1 .

‧ESI-MS: ‧ESI-MS:

使用質譜儀(島津製作所製,LCMS-2020),使用乙腈與水作為移動相,測定溶解於乙腈之樣品,藉此進行質譜分析。 Using a mass spectrometer (manufactured by Shimadzu Corporation, LCMS-2020), using acetonitrile and water as mobile phases, a sample dissolved in acetonitrile was measured to perform mass spectrometry.

實施例、比較例所使用之簡稱係如以下所述。 Abbreviations used in Examples and Comparative Examples are as follows.

[烯丙基醚化合物] [Allyl ether compound]

R1:實施例1所得之烯丙基醚化合物(樹脂) R1: the allyl ether compound (resin) obtained in Example 1

R2:實施例2所得之烯丙基醚化合物(樹脂) R2: the allyl ether compound (resin) that embodiment 2 gains

R3:實施例3所得之烯丙基醚化合物(樹脂) R3: the allyl ether compound (resin) that embodiment 3 gains

S1:比較例1所得之烯丙基醚化合物 S1: Allyl ether compound obtained in Comparative Example 1

S2:比較例2所得之烯丙基醚化合物 S2: Allyl ether compound obtained in Comparative Example 2

S3:4,4’-(1-甲基亞乙基)雙(2-烯丙基苯酚)(富士軟片合光純藥股份有限公司製,烯丙基當量154) S3: 4,4'-(1-methylethylene)bis(2-allylphenol) (manufactured by Fujifilm Hako Pure Chemical Industries, Ltd., allyl equivalent weight 154)

[多元羥基樹脂] [Polyhydroxy resin]

P1:合成例1所得之多元羥基樹脂 P1: Polyhydric hydroxyl resin obtained in Synthesis Example 1

P2:合成例2所得之多元羥基樹脂 P2: Polyhydric hydroxyl resin obtained in Synthesis Example 2

P3:合成例3所得之多元羥基樹脂 P3: Polyhydric hydroxyl resin obtained in Synthesis Example 3

P4:合成例4所得之多元羥基樹脂 P4: Polyhydric hydroxyl resin obtained in Synthesis Example 4

MEH:聯苯基芳烷基型多元羥基樹脂(明和化成股份有限公司製,MEH-7851,羥基當量210,軟化點75℃) MEH: biphenyl aralkyl type polyhydric hydroxyl resin (Meiwa Kasei Co., Ltd., MEH-7851, hydroxyl equivalent 210, softening point 75°C)

PN:苯酚酚醛清漆樹脂(AICA工業股份有限公司製,Shonol BRG-557,羥基當量105,軟化點85℃) PN: Phenol novolak resin (manufactured by AICA Industry Co., Ltd., Shonol BRG-557, hydroxyl equivalent 105, softening point 85° C.)

[馬來醯亞胺化合物] [Maleimide compound]

M1:苯基甲烷馬來醯亞胺(大和化成工業公司製,BMI-2300) M1: phenylmethanemaleimide (manufactured by Daiwa Chemical Industry Co., Ltd., BMI-2300)

M2:合成例5所得之馬來醯亞胺化合物(樹脂) M2: The maleimide compound (resin) obtained in Synthesis Example 5

[環氧樹脂] [epoxy resin]

E1:聯苯基芳烷基型環氧樹脂(日本化藥股份有限公司製,NC-3000,環氧基當量274,軟化點60℃) E1: biphenyl aralkyl type epoxy resin (manufactured by Nippon Kayaku Co., Ltd., NC-3000, epoxy group equivalent 274, softening point 60° C.)

[硬化促進劑] [hardening accelerator]

C1:二異丙苯基過氧化物(日本油脂股份有限公司製,PERCUMYL D) C1: Dicumyl peroxide (manufactured by NOF Co., Ltd., PERCUMYL D)

C2:2-乙基-4-甲基咪唑(四國化成工業股份有限公司製,CUREZOL 2E4MZ) C2: 2-Ethyl-4-methylimidazole (manufactured by Shikoku Chemical Industry Co., Ltd., CUREZOL 2E4MZ)

合成例1 Synthesis Example 1

於具備攪拌機、溫度計、氮氣吹入管、滴入漏斗、及冷卻管之包含玻璃製可分離式燒瓶的反應裝置,裝填2,6-二甲苯酚(下述結構式)500份、 500 parts of 2,6-xylenol (the following structural formula) were filled in a reaction device including a glass separable flask equipped with a stirrer, a thermometer, a nitrogen blowing tube, a dropping funnel, and a cooling tube.

Figure 111130098-A0202-12-0024-10
47%BF3醚錯合物7.3份(相對於最初添加之二環戊二烯為0.1倍莫耳),一邊進行攪拌進行加溫至100℃。保持於相同溫度之情況下,以1小時滴入二環戊二烯(下述結構式)67.6份(相對於2,6-二甲苯酚為0.12倍莫耳)。
Figure 111130098-A0202-12-0024-10
7.3 parts of 47% BF 3 ether complex (0.1 mole relative to the dicyclopentadiene added first) were heated to 100° C. while stirring. While maintaining the same temperature, 67.6 parts of dicyclopentadiene (the following structural formula) was dripped over 1 hour (0.12 times mol with respect to 2,6-xylenol).

Figure 111130098-A0202-12-0025-11
再以115至125℃之溫度反應4小時。之後,於5mmHg之減壓下,加溫至200℃以使未反應之原料蒸發除去,加入MIBK 46.7份以溶解生成物。裝填47%BF3醚錯合物3.3份後,加溫至100℃,保持於相同溫度之情況下,以1小時滴入二環戊二烯74.7份。再以115至125℃之溫度反應4小時。加入氫氧化鉀5份。再添加10%之草酸水溶液9份。加入MIBK 350份以溶解生成物,加入80℃的溫水120份進行水洗,將下層的水層分離除去。加溫至200℃進行回流脫水,過濾後,於5mmHg之減壓下,加溫至160℃以使MIBK蒸發除去,製得紅褐色之多元羥基樹脂(P1)259份。
Figure 111130098-A0202-12-0025-11
Then react at a temperature of 115 to 125° C. for 4 hours. Thereafter, under a reduced pressure of 5 mmHg, it was heated to 200° C. to evaporate and remove unreacted raw materials, and 46.7 parts of MIBK was added to dissolve the product. After filling with 3.3 parts of 47% BF 3 ether complex, it was heated to 100°C, and 74.7 parts of dicyclopentadiene was added dropwise over 1 hour while maintaining the same temperature. Then react at a temperature of 115 to 125° C. for 4 hours. Add 5 parts of potassium hydroxide. Then add 9 parts of 10% oxalic acid aqueous solution. 350 parts of MIBK was added to dissolve the product, 120 parts of warm water at 80° C. was added and washed with water, and the lower water layer was separated and removed. Heat to 200°C for reflux dehydration, filter, then heat to 160°C under reduced pressure of 5 mmHg to remove MIBK by evaporation, and obtain 259 parts of reddish-brown polyhydroxy resin (P1).

所得之多元羥基樹脂(P1)係羥基當量323、軟化點97℃之樹脂,吸收比(A3040/A1210)為0.27。藉由GPC所得之Mw為740,Mn為490,n=0體含量占6.6面積%,n=1體含量占70.1面積%,n=2體以上之含量占23.3面積%。藉由ESI-MS(負離子)測定質譜的結果,確認M-=375、507、629、639、761。 The obtained polyhydric hydroxyl resin (P1) is a resin with a hydroxyl equivalent of 323 and a softening point of 97°C, and the absorption ratio (A 3040 /A 1210 ) is 0.27. The Mw obtained by GPC is 740, the Mn is 490, the n=0 body content accounts for 6.6 area%, the n=1 body content accounts for 70.1 area%, and the n=2 body content accounts for 23.3 area%. As a result of mass spectrometry by ESI-MS (negative ion), it was confirmed that M-=375, 507, 629, 639, and 761.

合成例2 Synthesis example 2

於與合成例1同樣的反應裝置,裝填2,6-二甲苯酚500份、47%BF3醚錯合物7.3份,一邊進行攪拌一邊加溫至100℃。保持於相同溫度之情況下,以1小時滴入二環戊二烯67.6份(相對於2,6-二甲苯酚為0.12倍莫耳)。再以115至125℃之溫度反應4小時。之後,於5mmHg之減壓下,加溫至200℃以使未反應之原料蒸發除去,加入MIBK 46.7份以溶解生成物。裝填47%BF3醚錯合物3.3份後,加溫至100℃,保持於相同溫度之情況下,以1小時滴入二環戊二烯56.0份。再以115至125℃之溫度反應4小時。加入氫氧化鉀5份。再添加10%之草 酸水溶液9份。加入MIBK 350份以溶解生成物,加入80℃的溫水110份進行水洗,將下層的水層分離除去。加溫至120℃進行回流脫水,過濾後,於5mmHg之減壓下,加溫至160℃以使MIBK蒸發除去,製得紅褐色之多元羥基樹脂(P2)240份。 In the same reaction apparatus as in Synthesis Example 1, 500 parts of 2,6-xylenol and 7.3 parts of 47% BF 3 ether complex were charged, and heated to 100° C. while stirring. While maintaining the same temperature, 67.6 parts of dicyclopentadiene (0.12 times mole relative to 2,6-xylenol) was added dropwise over 1 hour. Then react at a temperature of 115 to 125° C. for 4 hours. Thereafter, under a reduced pressure of 5 mmHg, it was heated to 200° C. to evaporate and remove unreacted raw materials, and 46.7 parts of MIBK was added to dissolve the product. After filling 3.3 parts of 47% BF 3 ether complex, it was heated to 100° C., and while maintaining the same temperature, 56.0 parts of dicyclopentadiene was added dropwise over 1 hour. Then react at a temperature of 115 to 125° C. for 4 hours. Add 5 parts of potassium hydroxide. Then add 9 parts of 10% oxalic acid aqueous solution. 350 parts of MIBK was added to dissolve the product, 110 parts of warm water at 80° C. was added and washed with water, and the lower water layer was separated and removed. Heat to 120°C for reflux dehydration, filter, then heat to 160°C under a reduced pressure of 5mmHg to evaporate and remove MIBK to obtain 240 parts of reddish-brown polyhydroxy resin (P2).

所得之多元羥基樹脂(P2)係羥基當量276、軟化點94℃之樹脂,吸收比(A3040/A1210)為0.17。藉由GPC所得之Mw為670,Mn為490,n=0體含量占6.6面積%,n=1體含量占70.3面積%,n=2體以上之含量占23.1面積%。藉由ESI-MS(負離子)測定質譜的結果,確認M-=375、507、629、639、761。 The obtained polyhydric hydroxyl resin (P2) is a resin with a hydroxyl equivalent of 276 and a softening point of 94°C, and the absorption ratio (A 3040 /A 1210 ) is 0.17. The Mw obtained by GPC is 670, the Mn is 490, the n=0 body content accounts for 6.6 area%, the n=1 body content accounts for 70.3 area%, and the n=2 body content accounts for 23.1 area%. As a result of mass spectrometry by ESI-MS (negative ion), it was confirmed that M-=375, 507, 629, 639, and 761.

合成例3 Synthesis example 3

於與合成例1同樣的反應裝置,裝填2,6-二甲苯酚500份、47%BF3醚錯合物7.3份(相對於最初添加之二環戊二烯為0.1倍莫耳),一邊進行攪拌一邊加溫至100℃。保持於相同溫度之情況下,以1小時滴入二環戊二烯67.6份(相對於2,6-二甲苯酚為0.12倍莫耳)。再以115至125℃之溫度反應4小時。之後,於5mmHg之減壓下,加溫至200℃以使未反應之原料蒸發除去,加入MIBK 46.7份以溶解生成物。裝填47%BF3醚錯合物3.3份後,加溫至100℃,保持於相同溫度之情況下,以1小時滴入二環戊二烯28.0份。再以115至125℃之溫度反應4小時。加入氫氧化鉀5份。再添加10%之草酸水溶液9份。加入MIBK 280份以溶解生成物,加入80℃的溫水100份進行水洗,將下層的水層分離除去。加溫至120℃進行回流脫水,過濾後,於5mmHg之減壓下,加溫至160℃以使MIBK蒸發除去,製得紅褐色之多元羥基樹脂(P3)213份。 In the same reaction device as in Synthesis Example 1, 500 parts of 2,6-xylenol and 7.3 parts of 47% BF 3 ether complex (0.1 times the mole relative to the initially added dicyclopentadiene) were charged. It heated up to 100 degreeC, stirring. While maintaining the same temperature, 67.6 parts of dicyclopentadiene (0.12 times mole relative to 2,6-xylenol) was added dropwise over 1 hour. Then react at a temperature of 115 to 125° C. for 4 hours. Thereafter, under a reduced pressure of 5 mmHg, it was heated to 200° C. to evaporate and remove unreacted raw materials, and 46.7 parts of MIBK was added to dissolve the product. After filling 3.3 parts of 47% BF 3 ether complex, it was heated to 100°C, and 28.0 parts of dicyclopentadiene was added dropwise over 1 hour while maintaining the same temperature. Then react at a temperature of 115 to 125° C. for 4 hours. Add 5 parts of potassium hydroxide. Then add 9 parts of 10% oxalic acid aqueous solution. 280 parts of MIBK were added to dissolve the product, 100 parts of warm water at 80° C. was added and washed with water, and the lower water layer was separated and removed. Heat to 120°C for reflux dehydration, filter, then heat to 160°C under reduced pressure of 5mmHg to evaporate and remove MIBK to obtain 213 parts of reddish-brown polyhydroxy resin (P3).

所得之多元羥基樹脂(P3)係羥基當量234、軟化點86℃之樹脂,吸收比(A3040/A1210)為0.11。藉由GPC所得之Mw為560,Mn為470,n=0體含量占6.2面 積%,n=1體含量占74.0面積%,n=2體以上之含量占19.8面積%。藉由ESI-MS(負離子)測定質譜的結果,確認M-=375、507、629、639、761。 The obtained polyhydric hydroxyl resin (P3) is a resin with a hydroxyl equivalent of 234 and a softening point of 86°C, and the absorption ratio (A 3040 /A 1210 ) is 0.11. The Mw obtained by GPC is 560, the Mn is 470, the n=0 body content accounts for 6.2 area%, the n=1 body content accounts for 74.0 area%, and the n=2 body content accounts for 19.8 area%. As a result of mass spectrometry by ESI-MS (negative ion), it was confirmed that M-=375, 507, 629, 639, and 761.

合成例4 Synthesis Example 4

於與合成例1同樣的反應裝置,裝填苯酚1507份、47%BF3醚錯合物22.7份,一邊進行攪拌一邊加溫至100℃。保持於相同溫度之情況下,以1小時滴入二環戊二烯211.7份(相對於苯酚為0.10倍莫耳)。再以115至125℃之溫度反應4小時,加入氫氧化鉀36份。再添加10%之草酸水溶液60份。之後,加溫至160℃以進行脫水後,於5mmHg之減壓下,加溫至200℃以使未反應之原料蒸發除去。加入MIBK 1720份以溶解生成物,加入80℃的溫水100份進行水洗,將下層的水層分離除去。加溫至120℃進行回流脫水,過濾後,於5mmHg之減壓下,加溫至160℃以使MIBK蒸發除去,製得下述通式(5)所表示之紅褐色之多元羥基樹脂(P4)480份。 In the same reaction apparatus as in Synthesis Example 1, 1507 parts of phenol and 22.7 parts of 47% BF 3 ether complex were charged, and heated to 100° C. while stirring. While maintaining the same temperature, 211.7 parts of dicyclopentadiene (0.10 times mole relative to phenol) was added dropwise over 1 hour. Then react at a temperature of 115 to 125° C. for 4 hours, and add 36 parts of potassium hydroxide. Then add 60 parts of 10% oxalic acid aqueous solution. Thereafter, it was heated to 160° C. for dehydration, and then heated to 200° C. under a reduced pressure of 5 mmHg to evaporate and remove unreacted raw materials. 1720 parts of MIBK was added to dissolve the product, 100 parts of warm water at 80° C. was added and washed with water, and the lower water layer was separated and removed. Heat to 120°C for reflux dehydration, after filtration, heat to 160°C under a reduced pressure of 5mmHg to evaporate and remove MIBK to obtain a reddish-brown polyhydroxy resin (P4) represented by the following general formula (5) ) 480 copies.

所得之多元羥基樹脂(P4)羥基當量175、軟化點90℃。藉由GPC所得之Mw為470,Mn為410,s=0體含量占1.0面積%,s=1體含量占68.7面積%,s=2體以上之含量占30.3面積%。藉由ESI-MS(負離子)測定質譜的結果,確認M-=375、507、629、639、761。 The obtained polyhydric hydroxyl resin (P4) had a hydroxyl equivalent of 175 and a softening point of 90°C. The Mw obtained by GPC is 470, the Mn is 410, the s=0 body content accounts for 1.0 area%, the s=1 body content accounts for 68.7 area%, and the content of s=2 or more bodies accounts for 30.3 area%. As a result of mass spectrometry by ESI-MS (negative ion), it was confirmed that M-=375, 507, 629, 639, and 761.

Figure 111130098-A0202-12-0027-12
Figure 111130098-A0202-12-0027-12

合成例5 Synthesis Example 5

於安裝有溫度計、冷卻管、迪安-斯塔克(Dean-Stark)共沸蒸餾阱、攪拌機之燒瓶,裝填苯胺100份與甲苯50份,於室溫下以1小時將35%鹽酸39.2份滴 入。滴入結束後進行加熱使其共沸,將所產生之水與甲醇冷卻、分液後,僅將有機層之甲苯倒回系統內進行脫水。接著,於將溫度保持於60至70℃之下以1小時添加4,4’-雙(氯甲基)聯苯33.6份,再以相同溫度進行反應2小時。反應結束後,一邊進行升溫一邊將甲苯蒸餾除去,使系統內溫度為195至200℃,以該溫度反應15小時。之後,於冷卻之下,以不使系統內產生劇烈回流的方式將30%氫氧化鈉水溶液86份緩慢滴入,將升溫至80℃以下時所蒸餾除去的甲苯倒回系統內,靜置於70至80℃。將分離之下層的水層除去,重複進行至反應液水洗的洗淨液呈中性為止。接著,以旋轉蒸發器於加熱減壓下(200℃,0.6KPa)由油層將過量的苯胺與甲苯蒸餾除去,藉此製得芳香族胺樹脂47份。 In a flask equipped with a thermometer, a cooling tube, a Dean-Stark azeotropic distillation trap, and a stirrer, fill 100 parts of aniline and 50 parts of toluene, and dissolve 39.2 parts of 35% hydrochloric acid at room temperature for 1 hour drop enter. After the dropwise addition, heat to make it azeotropic, cool the produced water and methanol, separate the liquids, and pour only the toluene in the organic layer back into the system for dehydration. Next, 33.6 parts of 4,4'-bis(chloromethyl)biphenyl was added over 1 hour while maintaining the temperature at 60 to 70°C, and the reaction was carried out at the same temperature for 2 hours. After completion of the reaction, toluene was distilled off while raising the temperature, the temperature in the system was adjusted to 195 to 200° C., and the reaction was carried out at this temperature for 15 hours. Afterwards, under cooling, slowly drop 86 parts of 30% sodium hydroxide aqueous solution in such a way as not to cause violent reflux in the system, pour the toluene distilled off when the temperature rises below 80°C into the system, and place it in a static place. 70 to 80°C. The water layer of the lower layer after separation was removed, and this was repeated until the washing solution obtained by washing the reaction solution with water became neutral. Next, excess aniline and toluene were distilled off from the oil layer under heating and reduced pressure (200° C., 0.6 KPa) with a rotary evaporator, whereby 47 parts of aromatic amine resins were obtained.

接著,於上述燒瓶裝填馬來酸酐75份與甲苯150份,將加熱而共沸所產生的水與甲苯冷卻、分液後,僅將有機層之甲苯倒回系統內進行脫水。接著,將上述芳香族胺樹脂100份溶解於N-甲基-2-吡咯酮100份的樹脂溶液,以1小時滴入至保持於80至85℃之系統內。滴下結束後,以相同溫度進行反應2小時,加入對甲苯磺酸1.5份,以回流條件進行共沸,將所得之縮合水與甲苯冷卻、分液後,僅將有機層之甲苯倒回系統內,於進行脫水之下進行反應20小時。反應結束後,追加甲苯100份,重複進行水洗以將對甲苯磺酸及過量之馬來酸酐除去,加熱藉由共沸由系統內將水除去。接著,濃縮反應液而製得馬來醯亞胺化合物(M2)133份。此處,馬來醯亞胺(M2),於式(4)中,a=b、b=0、r=1、q=1,R5皆為氫原子,m為1.3。 Next, 75 parts of maleic anhydride and 150 parts of toluene were filled in the above-mentioned flask, and the water and toluene produced by heating and azeotroping were cooled and separated, and only the toluene in the organic layer was poured back into the system for dehydration. Next, a resin solution in which 100 parts of the above-mentioned aromatic amine resin was dissolved in 100 parts of N-methyl-2-pyrrolidone was dropped into a system maintained at 80 to 85°C over 1 hour. After dropping, react at the same temperature for 2 hours, add 1.5 parts of p-toluenesulfonic acid, carry out azeotropy under reflux conditions, cool the resulting condensation water and toluene, and separate the liquids, then pour only the toluene in the organic layer back into the system , and reacted for 20 hours under dehydration. After the reaction, 100 parts of toluene was added, water washing was repeated to remove p-toluenesulfonic acid and excess maleic anhydride, and water was removed from the system by azeotropic heating. Next, the reaction liquid was concentrated to obtain 133 parts of a maleimide compound (M2). Here, maleimide (M2), in formula (4), a=b, b=0, r=1, q=1, R 5 are all hydrogen atoms, m is 1.3.

實施例1 Example 1

於與合成例1同樣的反應裝置,裝填合成例1所得之價羥基樹脂(P1)100份、二乙二醇二甲醚150份,加溫至100℃成為均勻的溶液後,冷卻至35℃左右。加 入50%氫氧化鈉溶液27份(相對於多元羥基樹脂為1.1倍莫耳),作成酚鹽溶液後,以30至40℃之範圍,以1小時滴入溴丙烯(下述結構式)45份(相對於多元羥基樹脂為1.2倍莫耳), In the same reaction device as in Synthesis Example 1, fill 100 parts of the valent hydroxyl resin (P1) obtained in Synthesis Example 1 and 150 parts of diethylene glycol dimethyl ether, heat to 100°C to form a uniform solution, and then cool to 35°C about. add Add 27 parts of 50% sodium hydroxide solution (1.1 times mole relative to polyhydric hydroxyl resin) to make a phenoxide solution, then drop in 45 bromide propene (the following structural formula) in the range of 30 to 40°C for 1 hour Parts (1.2 times the mole relative to the polyhydroxy resin),

Figure 111130098-A0202-12-0029-13
Figure 111130098-A0202-12-0029-13

滴下結束後,升溫至60℃,以相同溫度反應3小時。反應結束後,加入MIBK 220份,加入溫水70份以進行水洗,將下層分離除去。之後,於5mmHg的減壓下,加溫至130℃以使MIBK蒸發除去,製得褐色之烯丙基醚化合物(R1)109份。 After completion|finish of dripping, it heated up to 60 degreeC, and was made to react at the same temperature for 3 hours. After completion of the reaction, 220 parts of MIBK was added, 70 parts of warm water was added to perform water washing, and the lower layer was separated and removed. Thereafter, MIBK was evaporated and removed by heating to 130° C. under a reduced pressure of 5 mmHg to obtain 109 parts of a brown allyl ether compound (R1).

將所得之烯丙烯醚化合物(R1),其軟化點為61℃,羥基當量為12870,150℃之熔融黏度為0.14Pa.s,總氯量為68ppm。藉由GPC所得之Mw為790,Mn為510,n=0體含量占5.9面積%,n=1體含量占70.5面積%,n=2體以上之含量占23.6面積%。藉由ESI-MS(負離子)測定質譜的結果,確認M-=455、587、719、749。將所得之烯丙基醚化合物(R1)之GPC示於圖1,將IR圖表示於圖2。 The resulting propylene ether compound (R1) has a softening point of 61°C, a hydroxyl equivalent of 12870, and a melt viscosity of 0.14Pa at 150°C. s, the total chlorine content is 68ppm. The Mw obtained by GPC is 790, the Mn is 510, the n=0 body content accounts for 5.9 area%, the n=1 body content accounts for 70.5 area%, and the n=2 body content accounts for 23.6 area%. As a result of mass spectrometry by ESI-MS (negative ion), it was confirmed that M-=455, 587, 719, and 749. The GPC of the obtained allyl ether compound (R1) is shown in FIG. 1, and the IR chart is shown in FIG. 2.

實施例2 Example 2

於與合成例1同樣的反應裝置,裝填合成例2所得之價羥基樹脂(P2)100份、二乙二醇二甲醚150份,加溫至100℃成為均勻的溶液後,冷卻至35℃左右。加入50%氫氧化鈉溶液32份(相對於多元羥基樹脂為1.1倍莫耳),作成酚鹽溶液後,以30至40℃之範圍,以1小時滴入溴丙烯(下述結構式)52.5份(相對於多元羥基樹脂為1.2倍莫耳),滴下結束後,升溫至60℃,以相同溫度反應3小時。反應結束後,加入MIBK 230份,加入溫水70份以進行水洗,將下層分離除去。之後,於5mmHg的減壓下,加溫至130℃以使MIBK蒸發除去,製得褐色之烯丙基醚化合物(R2)110份。 In the same reaction device as in Synthesis Example 1, fill 100 parts of valent hydroxyl resin (P2) obtained in Synthesis Example 2 and 150 parts of diethylene glycol dimethyl ether, heat to 100°C to form a uniform solution, and then cool to 35°C about. Add 32 parts of 50% sodium hydroxide solution (1.1 times the mole relative to the polyhydroxy resin) to make a phenoxide solution, and drop in 52.5 propylene bromide (the following structural formula) in the range of 30 to 40 ° C for 1 hour part (1.2 times the mole relative to the polyhydric hydroxyl resin), after the completion of the dropping, the temperature was raised to 60° C., and the reaction was carried out at the same temperature for 3 hours. After completion of the reaction, 230 parts of MIBK was added, 70 parts of warm water was added to perform water washing, and the lower layer was separated and removed. Thereafter, MIBK was evaporated and removed by heating to 130° C. under a reduced pressure of 5 mmHg to obtain 110 parts of a brown allyl ether compound (R2).

將所得之烯丙烯醚化合物(R2),其軟化點為48℃,羥基當量為20000,150℃之熔融黏度為0.07Pa.s,總氯量為132ppm。藉由GPC所得之Mw為670,Mn為490,n=0體含量占6.1面積%,n=1體含量占71.7面積%,n=2體以上之含量占22.1面積%。藉由ESI-MS(負離子)測定質譜的結果,確認M-=455、587、719、749。 The resulting propylene ether compound (R2) has a softening point of 48°C, a hydroxyl equivalent of 20,000, and a melt viscosity of 0.07Pa at 150°C. s, the total chlorine content is 132ppm. The Mw obtained by GPC is 670, the Mn is 490, the n=0 body content accounts for 6.1 area%, the n=1 body content accounts for 71.7 area%, and the n=2 body content accounts for 22.1 area%. As a result of mass spectrometry by ESI-MS (negative ion), it was confirmed that M-=455, 587, 719, and 749.

實施例3 Example 3

於與合成例1同樣的反應裝置,裝填合成例3所得之價羥基樹脂(P3)100份、二乙二醇二甲醚150份,加溫至100℃成為均勻的溶液後,冷卻至35℃左右。加入50%氫氧化鈉溶液38份(相對於多元羥基樹脂為1.1倍莫耳),作成酚鹽溶液後,以30至40℃之範圍,以1小時滴入溴丙烯(下述結構式)62.2份(相對於多元羥基樹脂為1.2倍莫耳),滴下結束後,升溫至60℃,以相同溫度反應3小時。反應結束後,加入MIBK 240份,加入溫水70份以進行水洗,將下層分離除去。之後,於5mmHg的減壓下,加溫至130℃以使MIBK蒸發除去,製得褐色之烯丙基醚化合物(R3)114份。 In the same reaction device as in Synthesis Example 1, fill 100 parts of valent hydroxyl resin (P3) obtained in Synthesis Example 3 and 150 parts of diethylene glycol dimethyl ether, heat to 100°C to form a uniform solution, and then cool to 35°C about. Add 38 parts of 50% sodium hydroxide solution (1.1 times the mole relative to the polyhydroxy resin) to make a phenoxide solution, and drop in propylene bromide (the following structural formula) 62.2 in the range of 30 to 40°C for 1 hour part (1.2 times the mole relative to the polyhydric hydroxyl resin), after the completion of the dropping, the temperature was raised to 60° C., and the reaction was carried out at the same temperature for 3 hours. After completion of the reaction, 240 parts of MIBK was added, 70 parts of warm water was added to perform water washing, and the lower layer was separated and removed. Thereafter, MIBK was evaporated and removed by heating to 130° C. under a reduced pressure of 5 mmHg to obtain 114 parts of a brown allyl ether compound (R3).

所得之烯丙烯醚化合物(R3)為室溫半固形的樹脂,其羥基當量為69000,150℃之熔融黏度為0.03Pa.s,總氯量為148ppm。藉由GPC所得之Mw為560,Mn為460,n=0體含量占6.0面積%,n=1體含量占74.1面積%,n=2體以上之含量為20.0面積%。藉由ESI-MS(負離子)測定質譜的結果,確認M-=455、587、719、749。 The obtained propylene propylene ether compound (R3) is a semi-solid resin at room temperature with a hydroxyl equivalent of 69,000 and a melt viscosity of 0.03Pa at 150°C. s, the total chlorine content is 148ppm. The Mw obtained by GPC is 560, the Mn is 460, the n=0 body content accounts for 6.0 area%, the n=1 body content accounts for 74.1 area%, and the n=2 body content accounts for 20.0 area%. As a result of mass spectrometry by ESI-MS (negative ion), it was confirmed that M-=455, 587, 719, and 749.

比較例1 Comparative example 1

除了將多元羥基樹脂變更為合成例4所得之價羥基樹脂(P4)以外,以與實施例1同樣的操作,製得烯丙基醚化合物(S1)。 An allyl ether compound (S1) was obtained in the same manner as in Example 1, except that the polyvalent hydroxy resin was changed to the valent hydroxy resin (P4) obtained in Synthesis Example 4.

比較例2 Comparative example 2

除了將多元羥基樹脂變更為MEH以外,以與實施例1同樣的操作,製得烯丙基醚化合物(S2)。 Except having changed polyhydric hydroxyl resin into MEH, it carried out similarly to Example 1, and obtained the allyl ether compound (S2).

實施例4 Example 4

調配馬來醯亞胺化合物(M1)100.0份、實施例1所得之烯丙基醚化合物(R1)196.1份(相對於馬來醯亞胺化合物為1倍莫耳)、硬化促進劑(G1)3.0份(相對於總樹脂量為1phr),於140℃之加熱板上攪拌10分鐘。 Prepare 100.0 parts of maleimide compound (M1), 196.1 parts of allyl ether compound (R1) obtained in Example 1 (1 times mole relative to maleimide compound), hardening accelerator (G1) 3.0 parts (1phr relative to the total amount of resin), stirred on a heating plate at 140°C for 10 minutes.

將所得之樹脂組成物置入氟樹脂製模具,以150℃×30分+220℃×100分的溫度條件進行2MPa的真空加壓,製得邊長50mm×厚度2mm的硬化樹脂試驗片。將試驗片之Tg、相對介電係數及介電損耗正切之測定結果示於表1。 The obtained resin composition was placed in a mold made of fluororesin, and vacuum pressurized at 2 MPa at a temperature of 150°C x 30 minutes + 220°C x 100 minutes to obtain a hardened resin test piece with a side length of 50mm x a thickness of 2mm. Table 1 shows the measurement results of Tg, relative permittivity and dielectric loss tangent of the test piece.

實施例5至9、比較例3至6 Examples 5 to 9, Comparative Examples 3 to 6

以表1所示之調配量(份)進行調配,以同樣的操作製得樹脂組成物,進行與實施例4同樣的試驗,將其知結果示於表1。 The compounding amount (parts) shown in Table 1 was prepared, and the resin composition was prepared in the same manner, and the same test as in Example 4 was carried out, and the results are shown in Table 1.

[表1]

Figure 111130098-A0202-12-0032-14
[Table 1]
Figure 111130098-A0202-12-0032-14

[產業上之可利用性] [Industrial availability]

本發明之樹脂組成物可廣泛地利用於塗料、土木接著、燒鑄、電氣電子材料、薄膜材料等各種領域,特別是有用於要求低介電係數、低介電損耗正切的積層板及電子電路基板。 The resin composition of the present invention can be widely used in various fields such as coatings, civil engineering bonding, casting, electrical and electronic materials, film materials, etc., and is especially useful for laminates and electronic circuits that require low dielectric coefficient and low dielectric loss tangent. substrate.

Figure 111130098-A0202-11-0002-3
Figure 111130098-A0202-11-0002-3

Claims (7)

一種烯丙基醚化合物,係以下述通式(1)所表示; An allyl ether compound is represented by the following general formula (1);
Figure 111130098-A0202-13-0001-15
Figure 111130098-A0202-13-0001-15
式中,R1獨立地表示碳數1至8之烴基,R2獨立地表示氫原子或二環戊烯基,且其中1個以上為二環戊烯基,R3獨立地表示氫原子或碳數1至4之烴基,n表示重複數,其平均值為1至5之數。 In the formula, R1 independently represents a hydrocarbon group with a carbon number of 1 to 8, R2 independently represents a hydrogen atom or a dicyclopentenyl group, and more than one of them is a dicyclopentenyl group, and R3 independently represents a hydrogen atom or a dicyclopentenyl group. In the hydrocarbon group with 1 to 4 carbons, n represents the number of repetitions, and the average value is a number of 1 to 5.
一種樹脂組成物,係含有請求項1所述之烯丙基醚化合物、及馬來醯亞胺化合物。 A resin composition containing the allyl ether compound and the maleimide compound described in claim 1. 一種硬化物,係請求項2所述之樹脂組成物硬化而成者。 A hardened product, which is obtained by hardening the resin composition described in claim 2. 一種密封材,係使用請求項2所述之樹脂組成物者。 A sealing material using the resin composition described in claim 2. 一種電路基板用材料,係使用請求項2所述之樹脂組成物者。 A material for circuit boards using the resin composition described in claim 2. 一種預浸體,係使用請求項2所述之樹脂組成物者。 A prepreg using the resin composition described in claim 2. 一種積層板,係使用請求項2所述之樹脂組成物者。 A laminate using the resin composition described in claim 2.
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