TW202312485A - Pixel structure and manufacturing method thereof - Google Patents

Pixel structure and manufacturing method thereof Download PDF

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TW202312485A
TW202312485A TW110133948A TW110133948A TW202312485A TW 202312485 A TW202312485 A TW 202312485A TW 110133948 A TW110133948 A TW 110133948A TW 110133948 A TW110133948 A TW 110133948A TW 202312485 A TW202312485 A TW 202312485A
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light
hydrophobic
layer
protruding structures
pixel structure
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TW110133948A
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TWI830059B (en
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陳世明
陳文龍
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友達光電股份有限公司
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Abstract

A pixel structure includes a driving backplane, at least one light emitting device, a hydrophobic layer and at least one convex structure. The at least one light emitting device is disposed on and electrically connected to the driving backplane. The hydrophobic layer is disposed on the at least one light emitting device. The at least one convex structure is disposed on the hydrophobic layer. The hydrophobic layer is disposed between the at least one convex structure and the at least one light emitting device. Moreover, a manufacturing method of the pixel structure is also provided.

Description

畫素結構及其製造方法Pixel structure and manufacturing method thereof

本發明是有關於一種畫素結構及其製造方法。The invention relates to a pixel structure and a manufacturing method thereof.

發光二極體顯示裝置包括驅動背板及轉置於驅動背板上的多個發光二極體元件。繼承發光二極體的特性,發光二極體顯示裝置具有省電、高效率、高亮度及反應時間快等優點。此外,相較於有機發光二極體顯示裝置,發光二極體顯示裝置更具有色彩易調校、發光壽命長、無影像烙印等優勢。因此,發光二極體顯示裝置被視為下一世代的顯示技術。The light emitting diode display device includes a driving backplane and a plurality of light emitting diode elements transposed on the driving backplane. Inheriting the characteristics of light-emitting diodes, light-emitting diode display devices have the advantages of power saving, high efficiency, high brightness, and fast response time. In addition, compared with organic light emitting diode display devices, light emitting diode display devices have more advantages such as easy color adjustment, long luminous life, and no image burn-in. Therefore, light emitting diode display devices are regarded as the next generation display technology.

為提升發光二極體顯示裝置的解析度,發光二極體顯示裝置所採用的發光二極體的尺寸越來越小。然而,當發光二極體的尺寸越來越小時,發光二極體的外部量子效率也隨之降低,影響發光二極體顯示裝置的亮度。因此,如何提升發光二極體顯示裝置的發光二極體的出光效率,以增加發光二極體顯示裝置的亮度,為研發人員的一大課題。In order to improve the resolution of the light emitting diode display device, the size of the light emitting diode used in the light emitting diode display device is getting smaller and smaller. However, when the size of the light-emitting diode becomes smaller and smaller, the external quantum efficiency of the light-emitting diode also decreases, which affects the brightness of the light-emitting diode display device. Therefore, how to improve the light-emitting efficiency of the light-emitting diodes of the light-emitting diode display device to increase the brightness of the light-emitting diode display device is a major issue for researchers.

本發明提供一種畫素結構,出光效率高。The invention provides a pixel structure with high light extraction efficiency.

本發明的畫素結構包括驅動背板、至少一發光元件、疏水層及至少一外凸結構。至少一發光元件設置於驅動背板上,且與驅動背板電性連接。疏水層設置於至少一發光元件上。至少一外凸結構設置於疏水層上。疏水層位於至少一外凸結構與至少一發光元件之間。The pixel structure of the present invention includes a driving backplane, at least one light-emitting element, a hydrophobic layer and at least one protruding structure. At least one light-emitting element is disposed on the driving backplane and is electrically connected to the driving backplane. The hydrophobic layer is disposed on at least one light emitting element. At least one protruding structure is disposed on the hydrophobic layer. The hydrophobic layer is located between at least one protruding structure and at least one light emitting element.

本發明的畫素結構的製造方法包括下列步驟:提供一驅動背板;轉置多個發光元件於驅動背板上,且使多個發光元件電性連接至驅動背板;於驅動背板上形成疏水材料層,以覆蓋多個發光元件;於疏水材料層上形成多個外凸結構,其中多個外凸結構分別重疊於多個發光元件;移除多個外凸結構之間的疏水材料層的一部分,以形成疏水層,其中疏水層具有分別重疊於多個外凸結構的多個疏水圖案。The manufacturing method of the pixel structure of the present invention includes the following steps: providing a driving backplane; transposing a plurality of light-emitting elements on the driving backplane, and electrically connecting the plurality of light-emitting elements to the driving backplane; forming a layer of hydrophobic material to cover a plurality of light-emitting elements; forming a plurality of protruding structures on the layer of hydrophobic material, wherein the plurality of protruding structures respectively overlap a plurality of light-emitting elements; removing the hydrophobic material between the plurality of protruding structures A part of the layer to form a hydrophobic layer, wherein the hydrophobic layer has a plurality of hydrophobic patterns overlapping the plurality of protruding structures respectively.

現將詳細地參考本發明的示範性實施例,示範性實施例的實例說明於附圖中。只要有可能,相同元件符號在圖式和描述中用來表示相同或相似部分。Reference will now be made in detail to the exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and descriptions to refer to the same or like parts.

應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件“上”或“連接到”另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為“直接在另一元件上”或“直接連接到”另一元件時,不存在中間元件。如本文所使用的,“連接”可以指物理及/或電性連接。再者,“電性連接”或“耦合”可以是二元件間存在其它元件。It will be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element, or Intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to physical and/or electrical connection. Furthermore, "electrically connected" or "coupled" may mean that other elements exist between two elements.

本文使用的“約”、“近似”、或“實質上”包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值,考慮到所討論的測量和與測量相關的誤差的特定數量(即,測量系統的限制)。例如,“約”可以表示在所述值的一個或多個標準偏差內,或±30%、±20%、±10%、±5%內。再者,本文使用的“約”、“近似”或“實質上”可依光學性質、蝕刻性質或其它性質,來選擇較可接受的偏差範圍或標準偏差,而可不用一個標準偏差適用全部性質。As used herein, "about," "approximately," or "substantially" includes stated values and averages within acceptable deviations from a particular value as determined by one of ordinary skill in the art, taking into account the measurements in question and the relative A specific amount of measurement-related error (ie, the limit of the measurement system). For example, "about" can mean within one or more standard deviations of the stated value, or within ±30%, ±20%, ±10%, ±5%. Moreover, "about", "approximately" or "substantially" used herein may select a more acceptable deviation range or standard deviation according to optical properties, etching properties or other properties, and may not use one standard deviation to apply to all properties .

除非另有定義,本文使用的所有術語(包括技術和科學術語)具有與本發明所屬領域的普通技術人員通常理解的相同的含義。將進一步理解的是,諸如在通常使用的字典中定義的那些術語應當被解釋為具有與它們在相關技術和本發明的上下文中的含義一致的含義,並且將不被解釋為理想化的或過度正式的意義,除非本文中明確地這樣定義。Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted to have meanings consistent with their meanings in the context of the relevant art and the present invention, and will not be interpreted as idealized or excessive formal meaning, unless expressly so defined herein.

圖1A至圖1F為本發明一實施例之畫素結構10的製造流程剖面示意圖。1A to 1F are schematic cross-sectional views of the manufacturing process of the pixel structure 10 according to an embodiment of the present invention.

請參照圖1A,首先,提供一驅動背板110。在本實施例中,驅動背板110包括基底(未繪示)、設置於基底上的多個畫素驅動電路(未繪示)及電性連接至多個畫素驅動電路的多個接墊組112,每一接墊組112包括第一接墊112a及第二接墊112b。舉例而言,在本實施例中,每一子畫素驅動電路可包括一資料線(未繪示)、一掃描線(未繪示)、一電源線(未繪示)、一共通線(未繪示)、一第一電晶體(未繪示)、一第二電晶體(未繪示)及一電容(未繪示),第一電晶體的第一端電性連接至資料線,第一電晶體的控制端電性連接至掃描線,第一電晶體的第二端電性連接至第二電晶體的控制端,第二電晶體的第一端電性連接至電源線,電容電性連接於第一電晶體的第二端及第二電晶體的第一端,第二電晶體的第二端電性連接至對應之接墊組112的第一接墊112a,共通線電性連接至對應之接墊組112的第二接墊112b,但本發明不以此為限。Please refer to FIG. 1A , firstly, a driving backplane 110 is provided. In this embodiment, the driving backplane 110 includes a substrate (not shown), a plurality of pixel driving circuits (not shown) disposed on the substrate, and a plurality of pad groups electrically connected to the plurality of pixel driving circuits 112. Each pad group 112 includes a first pad 112a and a second pad 112b. For example, in this embodiment, each sub-pixel driving circuit may include a data line (not shown), a scan line (not shown), a power line (not shown), a common line ( not shown), a first transistor (not shown), a second transistor (not shown) and a capacitor (not shown), the first end of the first transistor is electrically connected to the data line, The control end of the first transistor is electrically connected to the scan line, the second end of the first transistor is electrically connected to the control end of the second transistor, the first end of the second transistor is electrically connected to the power line, and the capacitor Electrically connected to the second end of the first transistor and the first end of the second transistor, the second end of the second transistor is electrically connected to the first pad 112a of the corresponding pad group 112, common line are connected to the second pads 112b of the corresponding pad group 112, but the invention is not limited thereto.

接著,轉置多個發光元件120於驅動背板110上,且使多個發光元件120電性連接至驅動背板110。詳細而言,在本實施例中,每一發光元件120具有第一電極(未繪示)及第二電極(未繪示),每一發光元件120的第一電極及第二電極分別電性連接至對應之接墊組112的第一接墊112a及第二接墊112b。Then, the plurality of light emitting elements 120 are transposed on the driving backplane 110 , and the plurality of light emitting elements 120 are electrically connected to the driving backplane 110 . In detail, in this embodiment, each light-emitting element 120 has a first electrode (not shown) and a second electrode (not shown), and the first electrode and the second electrode of each light-emitting element 120 are respectively electrically Connect to the first pad 112 a and the second pad 112 b of the corresponding pad set 112 .

請參照圖1B,接著,在本實施例中,可選擇性地在驅動背板110上形成遮光層(或者說,抗反射層/吸光層)130,其中遮光層130包括實體部132及多個開口部134,遮光層130的實體部132遮蔽發光元件120的側壁120s的至少一部分,多個發光元件120分別重疊於遮光層130的多個開口部134,遮光層130的開口部134露出發光元件120的頂面120a。然而,本發明不限於此,在其它實施例中,也可省略遮光層130的設置。Please refer to FIG. 1B. Next, in this embodiment, a light-shielding layer (or anti-reflection layer/light-absorbing layer) 130 can be selectively formed on the driving backplane 110, wherein the light-shielding layer 130 includes a solid part 132 and a plurality of The opening 134, the solid part 132 of the light-shielding layer 130 shields at least a part of the side wall 120s of the light-shielding element 120, and the plurality of light-emitting elements 120 are respectively overlapped with the plurality of openings 134 of the light-shielding layer 130, and the opening 134 of the light-shielding layer 130 exposes the light-emitting element 120 top surface 120a. However, the present invention is not limited thereto, and in other embodiments, the disposition of the light shielding layer 130 may also be omitted.

請參照圖1C,接著,於驅動背板110上形成疏水材料層140,以覆蓋多個發光元件120。疏水材料層140至少覆蓋發光元件120的頂面120a。在本實施例中,疏水材料層140更覆蓋發光元件120的側壁120s的一部分及遮光層130的實體部132,但本發明不以此為限。在本實施例中,可使用噴塗(spraying)的方式形成疏水材料層140,但本發明不以此為限。在本實施例中,疏水材料層140例如是氟素層,但本發明不以此為限。Referring to FIG. 1C , next, a hydrophobic material layer 140 is formed on the driving backplane 110 to cover the plurality of light emitting elements 120 . The hydrophobic material layer 140 at least covers the top surface 120 a of the light emitting element 120 . In this embodiment, the hydrophobic material layer 140 further covers a part of the sidewall 120s of the light emitting element 120 and the solid portion 132 of the light shielding layer 130 , but the invention is not limited thereto. In this embodiment, the hydrophobic material layer 140 may be formed by spraying, but the invention is not limited thereto. In this embodiment, the hydrophobic material layer 140 is, for example, a fluorine layer, but the invention is not limited thereto.

請參照圖1D,接著,於疏水材料層140上形成多個外凸結構150,其中多個外凸結構150分別重疊於多個發光元件120。在本實施例中,外凸結構150可包覆發光元件120的頂面120a及側壁120s的一部分,但本發明不以此為限。在本實施例中,可將高折射率材料滴在多個發光元件120上,進而形成外凸結構150。值得一提的是,由於疏水材料層140的材料特性,高折射率材料與疏水材料層140能形成大接觸角,並匯聚在發光元件120上方,進而良好的外凸結構150。良好的外凸結構150能有效地將發光元件120發出的光線往正視方向集中,進而提高出光效率。Referring to FIG. 1D , next, a plurality of protruding structures 150 are formed on the hydrophobic material layer 140 , wherein the plurality of protruding structures 150 are respectively overlapped on the plurality of light emitting elements 120 . In this embodiment, the protruding structure 150 can cover a part of the top surface 120 a and the sidewall 120 s of the light emitting element 120 , but the invention is not limited thereto. In this embodiment, a high refractive index material can be dropped on the plurality of light emitting elements 120 to form the convex structure 150 . It is worth mentioning that due to the material properties of the hydrophobic material layer 140 , the high refractive index material and the hydrophobic material layer 140 can form a large contact angle and converge on the light-emitting element 120 , thereby forming a good convex structure 150 . The good convex structure 150 can effectively concentrate the light emitted by the light emitting element 120 in the direction of the front view, thereby improving the light extraction efficiency.

請參照圖1D及圖1E,接著,移除多個外凸結構150之間的疏水材料層140的一部分,以形成疏水層142。疏水層142具有分別重疊於多個外凸結構150的多個疏水圖案142-1。多個疏水圖案142-1位於多個外凸結構150與多個發光元件120之間。Referring to FIG. 1D and FIG. 1E , then, a part of the hydrophobic material layer 140 between the plurality of protruding structures 150 is removed to form a hydrophobic layer 142 . The hydrophobic layer 142 has a plurality of hydrophobic patterns 142 - 1 respectively overlapping the plurality of protruding structures 150 . The plurality of hydrophobic patterns 142 - 1 are located between the plurality of protruding structures 150 and the plurality of light emitting elements 120 .

詳細而言,在本實施例中,可移除疏水材料層140之未被外凸結構150覆蓋的部分,以形成疏水層142;由於疏水材料層140之未被外凸結構150覆蓋的部分已被移除,因此,留下之疏水材料層140的另一部分(即,多個疏水圖案142-1)會與多個外凸結構150切齊;也就是說,多個疏水圖案142-1在驅動背板110上的多個垂直投影與多個外凸結構150在驅動背板110上的多個垂直投影實質上分別重合;但本發明不以此為限。舉例而言,在本實施例中,可使用低壓電漿清除疏水材料層140之未被外凸結構150覆蓋的部分,以形成疏水層142,但本發明不以此為限。In detail, in this embodiment, the part of the hydrophobic material layer 140 not covered by the protruding structure 150 can be removed to form the hydrophobic layer 142; since the part of the hydrophobic material layer 140 not covered by the protruding structure 150 has been is removed, therefore, another part of the hydrophobic material layer 140 (that is, the plurality of hydrophobic patterns 142-1) will be aligned with the plurality of protruding structures 150; that is, the plurality of hydrophobic patterns 142-1 in The plurality of vertical projections on the driving backplane 110 and the plurality of vertical projections of the plurality of protruding structures 150 on the driving backplane 110 substantially coincide respectively; however, the present invention is not limited thereto. For example, in this embodiment, the portion of the hydrophobic material layer 140 not covered by the protruding structure 150 can be removed by using low pressure plasma to form the hydrophobic layer 142 , but the invention is not limited thereto.

請參照圖1F,接著,於驅動背板110上形成一封膠層( molding layer)160,以覆蓋多個外凸結構150,其中多個外凸結構150彼此分離,且封膠層160的一部分162填入多個外凸結構150之間的間隙G150。在本實施例中,多個疏水圖案142-1彼此分離,且封膠層160的一部分162更填入多個疏水圖案142-1之間的間隙G142。在本實施例中,遮光層130的實體部132重疊於多個外凸結構150之間的間隙G150及多個疏水圖案142-1之間的間隙G142,且填入間隙G150及間隙G142的封膠層160的一部分162接觸於遮光層130的實體部132。於此,便完成本實施例的畫素結構10。 Please refer to FIG. 1F, and then, form an adhesive layer on the drive backplane 110 ( molding layer) 160 to cover the plurality of protruding structures 150 , wherein the plurality of protruding structures 150 are separated from each other, and a part 162 of the sealing layer 160 fills the gap G150 between the plurality of protruding structures 150 . In this embodiment, the plurality of hydrophobic patterns 142-1 are separated from each other, and a part 162 of the sealant layer 160 further fills the gap G142 between the plurality of hydrophobic patterns 142-1. In this embodiment, the solid part 132 of the light-shielding layer 130 overlaps the gap G150 between the plurality of protruding structures 150 and the gap G142 between the plurality of hydrophobic patterns 142-1, and fills the gap between the gap G150 and the gap G142. A portion 162 of the adhesive layer 160 is in contact with the solid portion 132 of the light shielding layer 130 . Here, the pixel structure 10 of this embodiment is completed.

圖2示出水W及用以形成本發明一實施例之外凸結構150的高折射率材料150’在驅動背板110及疏水材料層140上的狀態。由圖2可知,高折射率材料150’與疏水材料層140的接觸角明顯大於高折射率材料150’與驅動背板110的接觸角,而有助於形成良好的外凸結構150(繪於圖1F)。2 shows the state of water and the high refractive index material 150' used to form the convex structure 150 according to an embodiment of the present invention on the driving backplane 110 and the hydrophobic material layer 140. It can be seen from FIG. 2 that the contact angle between the high refractive index material 150' and the hydrophobic material layer 140 is significantly larger than the contact angle between the high refractive index material 150' and the driving backplane 110, which helps to form a good convex structure 150 (drawn in Figure 1F).

10:畫素結構 110:驅動背板 112:接墊組 112a:第一接墊 112b:第二接墊 120:發光元件 120a:頂面 120s:側壁 130:遮光層 132:實體部 134:開口部 140:疏水材料層 142:疏水層 142-1:疏水圖案 150:外凸結構 150’:高折射率材料 160:封膠層 162:一部分 G120、G142、G150:間隙 W:水 10: Pixel structure 110: Drive backplane 112: Pad set 112a: first pad 112b: second pad 120: Light emitting element 120a: top surface 120s: side wall 130: shading layer 132: Entity Department 134: opening 140: Hydrophobic material layer 142: Hydrophobic layer 142-1: Hydrophobic pattern 150: convex structure 150': high refractive index material 160: sealing layer 162: part G120, G142, G150: Clearance W: water

圖1A至圖1F為本發明一實施例之畫素結構10的製造流程剖面示意圖。 圖2示出水W及用以形成本發明一實施例之外凸結構150的高折射率材料150’在驅動背板110及疏水材料層140上的狀態。 1A to 1F are schematic cross-sectional views of the manufacturing process of the pixel structure 10 according to an embodiment of the present invention. 2 shows the state of water and the high refractive index material 150' used to form the convex structure 150 according to an embodiment of the present invention on the driving backplane 110 and the hydrophobic material layer 140.

10:畫素結構 10: Pixel structure

110:驅動背板 110: Drive backplane

112:接墊組 112: Pad set

112a:第一接墊 112a: first pad

112b:第二接墊 112b: second pad

120:發光元件 120: Light emitting element

120a:頂面 120a: top surface

120s:側壁 120s: side wall

130:遮光層 130: shading layer

132:實體部 132: Entity Department

134:開口部 134: opening

142:疏水層 142: Hydrophobic layer

142-1:疏水圖案 142-1: Hydrophobic pattern

150:外凸結構 150: convex structure

160:封膠層 160: sealing layer

162:一部分 162: part

G120、G142、G150:間隙 G120, G142, G150: Clearance

Claims (12)

一種畫素結構,包括: 一驅動背板; 至少一發光元件,設置於該驅動背板上,且與該驅動背板電性連接; 一疏水層,設置於該至少一發光元件上;以及 至少一外凸結構,設置於該疏水層上,其中該疏水層位於該至少一外凸結構與該至少一發光元件之間。 A pixel structure, including: a drive backplane; At least one light-emitting element is arranged on the driving backplane and is electrically connected to the driving backplane; a hydrophobic layer disposed on the at least one light emitting element; and At least one protruding structure is disposed on the hydrophobic layer, wherein the hydrophobic layer is located between the at least one protruding structure and the at least one light emitting element. 如請求項1所述的畫素結構,其中該至少一發光元件為多個發光元件;該疏水層具有多個疏水圖案,分別設置於該些發光元件上;該至少一外凸結構為多個外凸結構,分別設置於該些疏水圖案上;該些疏水圖案位於該些外凸結構與該些發光元件之間。The pixel structure according to claim 1, wherein the at least one light-emitting element is a plurality of light-emitting elements; the hydrophobic layer has a plurality of hydrophobic patterns, which are respectively arranged on the light-emitting elements; the at least one convex structure is a plurality of The protruding structures are respectively arranged on the hydrophobic patterns; the hydrophobic patterns are located between the protruding structures and the light emitting elements. 如請求項2所述的畫素結構,更包括: 一封膠層,設置於該些外凸結構上,其中該些外凸結構彼此分離,且該封膠層的一部分填入該些外凸結構之間的一間隙。 The pixel structure as described in claim item 2 further includes: The sealant layer is disposed on the protruding structures, wherein the protruding structures are separated from each other, and a part of the sealant layer fills a gap between the protruding structures. 如請求項3所述的畫素結構,其中該些疏水圖案彼此分離,且該封膠層的該部分更填入該些疏水圖案之間的一間隙。The pixel structure according to claim 3, wherein the hydrophobic patterns are separated from each other, and the part of the sealing layer further fills a gap between the hydrophobic patterns. 如請求項3所述的畫素結構,更包括: 一遮光層,設置於該驅動背板上,其中該遮光層包括一實體部及多個開口部,該遮光層的該實體部重疊於該些外凸結構之間的該間隙,該些發光元件分別重疊於該遮光層的該些開口部,且填入該間隙之該封膠層的該部分接觸於該遮光層的該實體部。 The pixel structure as described in claim item 3 further includes: A light-shielding layer, disposed on the driving backplane, wherein the light-shielding layer includes a solid portion and a plurality of openings, the solid portion of the light-shielding layer overlaps the gap between the protruding structures, and the light-emitting elements The portion of the sealant layer that overlaps the openings of the light-shielding layer and fills the gap is in contact with the solid portion of the light-shielding layer. 如請求項2所述的畫素結構,其中該些疏水圖案在該驅動背板上的多個垂直投影與該些外凸結構在該驅動背板上的多個垂直投影實質上分別重合。The pixel structure according to claim 2, wherein the vertical projections of the hydrophobic patterns on the driving backplane and the vertical projections of the protruding structures on the driving backplane substantially overlap respectively. 一種畫素結構的製造方法,包括: 提供一驅動背板; 轉置多個發光元件於該驅動背板上,且使該些發光元件電性連接至該驅動背板; 於該驅動背板上形成一疏水材料層,以覆蓋該些發光元件; 於該疏水材料層上形成多個外凸結構,其中該些外凸結構分別重疊於該些發光元件;以及 移除該些外凸結構之間的該疏水材料層的一部分,以形成一疏水層,其中該疏水層具有分別重疊於該些外凸結構的多個疏水圖案。 A method for manufacturing a pixel structure, comprising: providing a drive backplane; Transposing a plurality of light-emitting elements on the driving backplane, and electrically connecting the light-emitting elements to the driving backplane; forming a hydrophobic material layer on the driving backplane to cover the light emitting elements; forming a plurality of protruding structures on the hydrophobic material layer, wherein the protruding structures respectively overlap the light-emitting elements; and A part of the hydrophobic material layer between the protruding structures is removed to form a hydrophobic layer, wherein the hydrophobic layer has a plurality of hydrophobic patterns overlapping the protruding structures respectively. 如請求項7所述的畫素結構的製造方法,其中該些疏水圖案位於該些外凸結構與該些發光元件之間。The manufacturing method of the pixel structure according to claim 7, wherein the hydrophobic patterns are located between the protruding structures and the light emitting elements. 如請求項7所述的畫素結構的製造方法,更包括: 於該驅動背板上形成一封膠層,以覆蓋該些外凸結構,其中該些外凸結構彼此分離,且該封膠層的一部分填入該些外凸結構之間的一間隙。 The manufacturing method of the pixel structure as described in claim item 7, further comprising: A sealant layer is formed on the driving backplane to cover the protruding structures, wherein the protruding structures are separated from each other, and a part of the sealant layer fills a gap between the protruding structures. 如請求項9所述的畫素結構的製造方法,其中該些疏水圖案彼此分離,且該封膠層的該部分更填入該些疏水圖案之間的一間隙。The manufacturing method of the pixel structure according to claim 9, wherein the hydrophobic patterns are separated from each other, and the part of the sealant layer further fills a gap between the hydrophobic patterns. 如請求項9所述的畫素結構的製造方法,更包括: 在轉置該些發光元件於該驅動背板上且使該些發光元件電性連接至該驅動背板之後以及於該驅動背板上形成該疏水材料層之前,在該驅動背板上形成一遮光層,其中該遮光層包括一實體部及多個開口部,該遮光層的該實體部重疊於該些外凸結構之間的該間隙,該些發光元件分別重疊於該遮光層的該些開口部,且填入該間隙之該封膠層的該部分接觸於該遮光層的該實體部。 The manufacturing method of the pixel structure as described in claim item 9, further comprising: After transposing the light-emitting elements on the driving backplane and electrically connecting the light-emitting elements to the driving backplane and before forming the hydrophobic material layer on the driving backplane, forming a A light-shielding layer, wherein the light-shielding layer includes a solid portion and a plurality of openings, the solid portion of the light-shielding layer overlaps the gap between the protruding structures, and the light-emitting elements overlap the light-shielding elements respectively the opening, and the part of the sealant layer filling the gap is in contact with the solid part of the light shielding layer. 如請求項7所述的畫素結構的製造方法,其中該些疏水圖案在該驅動背板上的多個垂直投影與該些外凸結構在該驅動背板上的多個垂直投影實質上分別重合。The manufacturing method of the pixel structure as claimed in item 7, wherein the plurality of vertical projections of the hydrophobic patterns on the driving backplane are substantially different from the plurality of vertical projections of the convex structures on the driving backplane coincide.
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