TW202309562A - Optical film with release film - Google Patents

Optical film with release film Download PDF

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TW202309562A
TW202309562A TW111123856A TW111123856A TW202309562A TW 202309562 A TW202309562 A TW 202309562A TW 111123856 A TW111123856 A TW 111123856A TW 111123856 A TW111123856 A TW 111123856A TW 202309562 A TW202309562 A TW 202309562A
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Taiwan
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film
adhesive layer
release film
peeling
optical film
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TW111123856A
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Chinese (zh)
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野田美菜子
三浦大生
寳田翔
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日商日東電工股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/06Interconnection of layers permitting easy separation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/04Layered products comprising a layer of synthetic resin as impregnant, bonding, or embedding substance
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/023Optical properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/05Interconnection of layers the layers not being connected over the whole surface, e.g. discontinuous connection or patterned connection
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/412Transparent
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/50Properties of the layers or laminate having particular mechanical properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Laminated Bodies (AREA)
  • Adhesive Tapes (AREA)
  • Polarising Elements (AREA)

Abstract

An optical film (X) with a release film according to the present invention is provided with an optical film (Y) with an adhesive layer, a light release film (40), and a heavy release film (50). The optical film (Y) with the adhesive layer is provided with an optical film (10) having a first surface (11) and a second surface (12) and having a thickness of 100 [mu]m or less, an adhesive layer (20) affixed to the first surface (11) and having an adhesive surface (21), and an adhesive layer (30) affixed to the second surface (12) and having an adhesive surface (31). The light release film (40) is arranged on the adhesive surface (21), and the heavy release film (50) is arranged on the adhesive surface (31). In a lateral surface irregularity end (E) of the optical film (X), end edges (22, 32) of the adhesive layers (20, 30) are withdrawn further than end edges of the films (10, 40, 50) in an in-plane direction (D), wherein a first withdrawn length d1 of the end edge (22) is smaller than a second withdrawn length d2 of the end edge (32).

Description

附有剝離膜之光學膜Optical film with release film

本發明係關於一種附有剝離膜之光學膜。The invention relates to an optical film with a release film.

顯示面板例如具有包含像素面板、觸控面板、及透明覆蓋膜等之積層構造。於顯示面板之積層構造中設置有具有特定之光學功能之光學膜。光學膜例如可例舉膜狀之偏光板、及相位差膜。該光學膜例如係製造成於光學膜之兩面分別設置有黏著劑層及剝離膜之附有剝離膜之光學膜。附有剝離膜之光學膜例如記載於下述專利文獻1。 [先前技術文獻] [專利文獻] The display panel has, for example, a laminated structure including a pixel panel, a touch panel, and a transparent cover film. Optical films with specific optical functions are provided in the laminated structure of the display panel. The optical film may, for example, be a film-shaped polarizing plate or retardation film. The optical film is, for example, manufactured as an optical film with a release film in which an adhesive layer and a release film are respectively provided on both surfaces of the optical film. An optical film with a release film is described in, for example, Patent Document 1 below. [Prior Art Literature] [Patent Document]

[專利文獻1]日本專利特開2020-190754號公報[Patent Document 1] Japanese Patent Laid-Open No. 2020-190754

[發明所欲解決之問題][Problem to be solved by the invention]

圖6係作為先前之附有剝離膜之光學膜之一例的膜Z之剖面模式圖。膜Z於厚度方向T依序具備剝離膜91、黏著劑層92、光學膜93、黏著劑層94、及剝離膜95。黏著劑層92貼合於光學膜93之一面。黏著劑層94貼合於光學膜93之另一面。剝離膜91可剝離地貼合於黏著劑層92。剝離膜95可剝離地貼合於黏著劑層94。於膜Z之端部E'中,剝離膜91之端緣91e、黏著劑層92之端緣92e、光學膜93之端緣93e、黏著劑層94之端緣94e、及剝離膜95之端緣95e相互處於同一平面。Fig. 6 is a schematic cross-sectional view of a film Z as an example of a conventional optical film with a release film. The film Z includes a peeling film 91 , an adhesive layer 92 , an optical film 93 , an adhesive layer 94 , and a peeling film 95 in the thickness direction T in this order. The adhesive layer 92 is attached to one surface of the optical film 93 . The adhesive layer 94 is pasted on the other side of the optical film 93 . The release film 91 is releasably attached to the adhesive layer 92 . The release film 95 is releasably attached to the adhesive layer 94 . In the end E' of the film Z, the edge 91e of the peeling film 91, the edge 92e of the adhesive layer 92, the edge 93e of the optical film 93, the edge 94e of the adhesive layer 94, and the end of the peeling film 95 Edges 95e are on the same plane as each other.

於將此種膜Z用於顯示面板之製造過程之情形時,首先,將剝離膜91自黏著劑層92剝離(第1剝離步驟)。於該步驟中,首先,於膜Z之端部E'中,向剝離膜91施加用以將剝離膜91自黏著劑層92捲起之力作為剝離開始用負荷。該負荷包含於端部E'使剝離膜91充分地變形所需之力、及自追隨剝離膜91之變形而發生彈性變形之黏著劑層92將剝離膜91拉離所需之力。於端部E'中,因賦予此種負荷,剝離膜91之端部以自黏著劑層92之端緣92e被拉離之方式而變形。繼而,以進行剝離膜91與黏著劑層92之間之拉離之方式,將剝離膜91之端部朝遠離端緣92e之方向拉伸,從而使剝離膜91自黏著劑層92脫離。此後,經由露出之黏著劑層92將光學膜93與像素面板等第1被接著體(未圖示)接合。其次,將剝離膜95自黏著劑層94剝離(第2剝離步驟)。其次,經由因該剝離而露出之黏著劑層94將光學膜93與第2被接著體(未圖示)接合。When using such a film Z in the manufacturing process of a display panel, first, the peeling film 91 is peeled from the adhesive layer 92 (1st peeling process). In this step, first, in the edge part E' of the film Z, the force for winding up the peeling film 91 from the adhesive layer 92 is applied to the peeling film 91 as a load for peeling start. This load includes the force required to fully deform the release film 91 at the end E′ and the force required to pull the release film 91 away from the adhesive layer 92 elastically deformed following the deformation of the release film 91 . In the edge part E', when such a load is given, the edge part of the peeling film 91 deform|transforms so that it may be pulled away from the edge 92e of the adhesive agent layer 92. As shown in FIG. Next, the end of the release film 91 is stretched in a direction away from the edge 92 e so as to separate the release film 91 from the adhesive layer 92 , thereby detaching the release film 91 from the adhesive layer 92 . Thereafter, the optical film 93 is bonded to a first adherend (not shown) such as a pixel panel through the exposed adhesive layer 92 . Next, the peeling film 95 is peeled from the adhesive layer 94 (2nd peeling process). Next, the optical film 93 is bonded to a second adherend (not shown) via the adhesive layer 94 exposed by the peeling.

另一方面,例如用於智慧型手機及平板終端、可反覆彎折(可摺疊)之顯示面板之開發正日益推進。於可摺疊之顯示面板中,要求積層構造中之各要素較薄且具有可撓性。On the other hand, the development of display panels that can be repeatedly bent (foldable), such as for smartphones and tablet terminals, is advancing. In a foldable display panel, each element in the laminated structure is required to be thin and flexible.

然而,於先前之膜Z中,光學膜93越薄,上述第1剝離步驟中之剝離開始用負荷越容易於膜Z之端部E'引起光學膜93之顯著變形。此種光學膜93之變形引起貼合於光學膜93之黏著劑層94之變形,將黏著劑層94之端緣94e自剝離膜95拉離。一旦端緣94e離開剝離膜95,則黏著劑層94與剝離膜95之間容易進行分離。若於第1剝離步驟中,黏著劑層94與剝離膜95之間進行分離,則無法實施下一步驟。However, in the conventional film Z, the thinner the optical film 93 is, the easier it is for the load for starting the peeling in the first peeling step to cause significant deformation of the optical film 93 at the end E′ of the film Z. Such deformation of the optical film 93 causes deformation of the adhesive layer 94 attached to the optical film 93 , and the edge 94 e of the adhesive layer 94 is pulled away from the release film 95 . When the edge 94e separates from the release film 95, the adhesive layer 94 and the release film 95 are easily separated. If separation occurs between the adhesive layer 94 and the release film 95 in the first peeling step, the next step cannot be implemented.

本發明提供一種附有剝離膜之光學膜,其適於自兩面附有黏著劑層之薄光學膜剝離輕剝離膜,同時抑制重剝離膜之剝離。 [解決問題之技術手段] The present invention provides an optical film with a peeling film, which is suitable for peeling off a light peeling film from a thin optical film with adhesive layers on both sides, while suppressing the peeling of a heavy peeling film. [Technical means to solve the problem]

本發明[1]包含一種附有剝離膜之光學膜,其具備附有黏著劑層之光學膜、輕剝離膜及重剝離膜,上述附有黏著劑層之光學膜具備:光學膜,其具有第1面及與該第1面為相反側之第2面;第1黏著劑層,其貼合於上述第1面且於上述光學膜之相反側具有第1黏著面;及第2黏著劑層,其貼合於上述第2面且於上述光學膜之相反側具有第2黏著面;上述輕剝離膜配置於上述第1黏著面上,上述重剝離膜配置於上述第2黏著面上,上述光學膜具有100 μm以下之厚度,上述附有剝離膜之光學膜具有側面凹凸端部,於該側面凹凸端部中,於上述光學膜之與上述厚度之方向正交之面內方向上,上述第1黏著劑層之第1端緣及上述第2黏著劑層之第2端緣較上述光學膜、上述輕剝離膜、及上述重剝離膜之各端緣退避,且於上述側面凹凸端部中,上述第1端緣與上述輕剝離膜之端緣相距之第1退避長度較上述第2端緣與上述重剝離膜之端緣相距之第2退避長度小。The present invention [1] includes an optical film with a peeling film, which includes an optical film with an adhesive layer, a light peeling film, and a heavy peeling film. The above-mentioned optical film with an adhesive layer includes: an optical film that has A first surface and a second surface opposite to the first surface; a first adhesive layer that is bonded to the first surface and has a first adhesive surface on the opposite side of the optical film; and a second adhesive A layer, which is attached to the second surface and has a second adhesive surface on the opposite side of the optical film; the light release film is arranged on the first adhesive surface, and the heavy release film is arranged on the second adhesive surface, The above-mentioned optical film has a thickness of 100 μm or less, and the above-mentioned optical film with release film has side concave-convex end portions, and in the side concave-convex end portions, in the in-plane direction of the above-mentioned optical film perpendicular to the direction of the above-mentioned thickness, The first edge of the first adhesive layer and the second edge of the second adhesive layer are retreated from the edges of the optical film, the light release film, and the heavy release film, and are located at the concave and convex ends of the side surface. In the section, a first relief length between the first edge and the edge of the light release film is smaller than a second relief length between the second edge and the edge of the heavy release film.

如上所述,於本發明之附有剝離膜之光學膜之側面凹凸端部中,於光學膜之面內方向上,第1黏著劑層之第1端緣較該光學膜、輕剝離膜、及重剝離膜之各端緣退避。於此種側面凹凸端部中,輕剝離膜具有未貼合第1黏著劑層之自由部分。因此,於側面凹凸端部將輕剝離膜自第1黏著劑層剝離時,首先,可捲起輕剝離膜之自由部分而使其變形,隨後拉伸已捲起變形之輕剝離膜之端部而將輕剝離膜自第1黏著劑層之第1端緣拉離。即,於剝離開始過程中,無需同時施加用以使輕剝離膜之端部充分地變形之力(第1力)、及用以自追隨輕剝離膜之變形而發生彈性變形之第1黏著劑層之第1端緣將輕剝離膜拉離之力(第2力)(與此相對,於上述膜Z中,必須同時施加第1力及第2力,因此,剝離開始過程所需之力較大)。此種附有剝離膜之光學膜適於減小剝離開始過程所需之力。該力越小,越可於輕剝離膜之剝離開始過程中,抑制厚度薄至100 μm以下之光學膜之變形,從而亦抑制第2黏著劑層之變形,因此,可抑制第2黏著劑層之第2端緣自重剝離膜分離。As mentioned above, in the side concavo-convex end portion of the optical film with release film of the present invention, in the in-plane direction of the optical film, the first edge of the first adhesive layer is smaller than the optical film, light release film, And the edges of the heavy peeling film are retreated. In such side concavo-convex end portions, the light release film has a free portion where the first adhesive layer is not bonded. Therefore, when peeling the easy-release film from the first adhesive layer at the concave-convex end of the side surface, first, the free part of the light-release film can be rolled up to deform it, and then the end of the rolled-up and deformed light-release film can be stretched. And the light release film is pulled away from the first edge of the first adhesive layer. That is, in the peeling start process, there is no need to simultaneously apply a force (first force) for sufficiently deforming the end of the light release film and a first adhesive for elastically deforming itself following the deformation of the light release film The force (second force) that the first edge of the layer pulls the light peeling film away (in contrast, in the above-mentioned film Z, the first force and the second force must be applied at the same time, so the force required to start the peeling process larger). Such an optical film with release film is suitable for reducing the force required for the peel initiation process. The smaller the force, the more it can suppress the deformation of the optical film with a thickness of less than 100 μm during the peeling process of the light release film, thereby also suppressing the deformation of the second adhesive layer. Therefore, the second adhesive layer can be suppressed. The second end edge is separated from the gravity peeling film.

又,如上所述,於本附有剝離膜之光學膜之側面凹凸端部中,第1退避長度(膜面內方向上之輕剝離膜之端緣至第1黏著劑層之第1端緣之距離)較第2退避長度(膜面內方向上之重剝離膜之端緣至第2黏著劑層之第2端緣之距離)小。即,於側面凹凸端部中,於膜面內方向上,第2黏著劑層之第2端緣較第1黏著劑層之第1端緣退避。此種構成適於在輕剝離膜之剝離開始過程中,於用以自第1黏著劑層之第1端緣將輕剝離膜拉離之上述第2力作用於本附有剝離膜之光學膜時,抑制第2黏著劑層之變形,因此,適於抑制第2黏著劑層之第2端緣自重剝離膜分離。Also, as mentioned above, in the concave-convex end portion of the side surface of the optical film with a release film, the first relief length (the edge of the light release film in the film surface direction to the first edge of the first adhesive layer) distance) is smaller than the second back-off length (the distance from the edge of the heavy release film to the second edge of the second adhesive layer in the in-plane direction of the film). That is, the second edge of the second adhesive layer is receded from the first edge of the first adhesive layer in the in-plane direction of the film in the concave-convex end portion of the side surface. Such a configuration is suitable for the above-mentioned second force for pulling the light release film away from the first edge of the first adhesive layer to act on the optical film with the release film in the process of starting the release of the light release film. Therefore, it is suitable to suppress the separation of the second end edge of the second adhesive layer from the weight release film.

本發明[2]包含如上述[1]之附有剝離膜之光學膜,其中上述面內方向上之上述第1端緣與上述第2端緣之間之距離為1 μm以上。The present invention [2] includes the optical film with a release film according to the above [1], wherein the distance between the first edge and the second edge in the in-plane direction is 1 μm or more.

此種構成可較佳地用於在輕剝離膜之剝離開始過程中抑制第2黏著劑層之上述變形,因此,可較佳地用於抑制第2黏著劑層之第2端緣自重剝離膜分離。This structure can be preferably used to suppress the above-mentioned deformation of the second adhesive layer during the peeling start of the light release film, and therefore, can be preferably used to suppress the second edge of the second adhesive layer from peeling the film by its own weight. separate.

本發明[3]包含如上述[1]或[2]之附有剝離膜之光學膜,其中上述第1退避長度為20 μm以上。The present invention [3] includes the optical film with a release film according to the above [1] or [2], wherein the first relief length is 20 μm or more.

此種構成適於在輕剝離膜之剝離開始過程中,於自第1黏著劑層之第1端緣將輕剝離膜拉離之前,充分地捲起輕剝離膜之端部(上述自由部分)而使其變形,因此,可較佳地用於減小輕剝離膜之剝離開始所需之力(總力)。This structure is suitable for fully rolling up the end portion (the above-mentioned free portion) of the easy-release film before pulling the easy-release film away from the first edge of the first adhesive layer during the start of peeling of the easy-release film. It deforms it, and therefore, it can preferably be used to reduce the force (total force) required for the start of peeling of the light release film.

本發明[4]包含如上述[1]至[3]中任一項之附有剝離膜之光學膜,其中上述第1退避長度相對於上述第1黏著劑層之厚度之比率為0.4以上8以下。The present invention [4] includes the optical film with a release film according to any one of the above-mentioned [1] to [3], wherein the ratio of the above-mentioned first relief length to the thickness of the above-mentioned first adhesive layer is 0.4 or more8 the following.

此種構成適於在輕剝離膜之剝離開始過程中,於自第1黏著劑層之第1端緣將輕剝離膜拉離之前,充分地捲起輕剝離膜之端部(上述自由部分)而使其變形,因此,可較佳地用於減小輕剝離膜之剝離開始所需之力。This structure is suitable for fully rolling up the end portion (the above-mentioned free portion) of the easy-release film before pulling the easy-release film away from the first edge of the first adhesive layer during the start of peeling of the easy-release film. It deforms it, therefore, it can preferably be used to reduce the force required for the peeling initiation of the light release film.

本發明[5]包含如上述[1]至[4]中任一項之附有剝離膜之光學膜,其中用以開始自上述第1黏著面剝離上述輕剝離膜之第1剝離開始力較用以開始自上述第2黏著面剝離上述重剝離膜之第2剝離開始力小。The present invention [5] includes the optical film with a release film according to any one of the above-mentioned [1] to [4], wherein the first peeling initiation force for starting to peel the light release film from the first adhesive surface is relatively low The second peeling initiation force for starting the peeling of the heavy release film from the second adhesive surface is small.

此種構成可較佳地用於在輕剝離膜之剝離開始過程中抑制第2黏著劑層之上述變形,因此,可較佳地用於抑制第2黏著劑層之第2端緣自重剝離膜分離。This structure can be preferably used to suppress the above-mentioned deformation of the second adhesive layer during the peeling start of the light release film, and therefore, can be preferably used to suppress the second edge of the second adhesive layer from peeling the film by its own weight. separate.

本發明[6]包含如上述[5]之附有剝離膜之光學膜,其中上述第1剝離開始力相對於上述第2剝離開始力之比率為0.8以下。The present invention [6] includes the optical film with a peeling film according to the above [5], wherein the ratio of the first peeling initiation force to the second peeling initiation force is 0.8 or less.

此種構成可較佳地用於在輕剝離膜之剝離開始過程中抑制第2黏著劑層之上述變形,因此,可較佳地用於抑制第2黏著劑層之第2端緣自重剝離膜分離。This structure can be preferably used to suppress the above-mentioned deformation of the second adhesive layer during the peeling start of the light release film, and therefore, can be preferably used to suppress the second edge of the second adhesive layer from peeling the film by its own weight. separate.

本發明[7]包含如上述[6]之附有剝離膜之光學膜,其中上述第1剝離開始力未達800 gf/25 mm。The present invention [7] includes the optical film with a peeling film according to the above [6], wherein the first peeling initiation force is less than 800 gf/25 mm.

此種構成可較佳地用於在輕剝離膜之剝離開始過程中抑制第2黏著劑層之第2端緣自重剝離膜分離,並且降低對光學膜之負荷。Such a configuration can be preferably used to suppress separation of the second edge of the second adhesive layer from the heavy release film during the start of peeling of the light release film, and to reduce the load on the optical film.

本發明[8]包含如上述[6]或[7]之附有剝離膜之光學膜,其中上述第2剝離開始力為800 gf/25 mm以下。The present invention [8] includes the optical film with a peeling film according to the above [6] or [7], wherein the second peeling initiation force is 800 gf/25 mm or less.

此種構成可較佳地用於在輕剝離膜之剝離開始過程中抑制第2黏著劑層之第2端緣自重剝離膜分離,並且在重剝離膜自第2黏著劑層之剝離開始過程中降低對光學膜之負荷。Such a configuration can be preferably used to suppress separation of the second edge of the second adhesive layer from the heavy release film during the start of peeling of the light release film, and to prevent the separation of the heavy release film from the second adhesive layer. Reduce the load on the optical film.

如圖1所示,作為本發明之附有剝離膜之光學膜之一實施方式的光學膜X於厚度方向T依序具備輕剝離膜40(輕剝離襯墊)、附有黏著劑層之光學膜Y、及重剝離膜50(重剝離襯墊)。光學膜X於與厚度方向T正交之面內方向D上延伸。附有黏著劑層之光學膜Y係配置於可摺疊器件中之光通過部位之要素。可摺疊器件例如可例舉可摺疊顯示面板。可摺疊顯示面板例如具有包含像素面板、觸控面板、及覆蓋膜等之積層構造。有於可摺疊顯示面板之積層構造中設置有具有特定光學功能之光學膜之情形。光學膜例如可例舉膜狀之偏光板、及相位差膜。附有黏著劑層之光學膜Y係於可摺疊顯示面板之製造過程中用作上述積層構造所包含光學膜之供給材料。As shown in FIG. 1 , an optical film X that is an embodiment of an optical film with a release film of the present invention has a light release film 40 (light release liner), an optical film with an adhesive layer, and an optical film X in the thickness direction T sequentially. Film Y, and heavy release film 50 (heavy release liner). The optical film X extends in the in-plane direction D perpendicular to the thickness direction T. The optical film Y with an adhesive layer is an element arranged at the light passage part in the foldable device. The foldable device may, for example, be a foldable display panel. The foldable display panel has, for example, a laminated structure including a pixel panel, a touch panel, and a cover film. There are situations where an optical film with specific optical functions is provided in the laminated structure of the foldable display panel. The optical film may, for example, be a film-shaped polarizing plate or retardation film. The optical film Y with an adhesive layer is used as a supply material for the optical film included in the above-mentioned laminated structure during the manufacturing process of the foldable display panel.

附有黏著劑層之光學膜Y具備厚度100 μm以下之光學膜10、黏著劑層20(第1黏著劑層)、及黏著劑層30(第2黏著劑層)。光學膜10具有第1面11、及與該第1面11為相反側之第2面12。黏著劑層20貼合於第1面11,且於光學膜10之相反側具有黏著面21(第1黏著面)。輕剝離膜40配置於黏著面21上。黏著劑層30貼合於第2面12,且於光學膜10之相反側具有黏著面31(第2黏著面)。重剝離膜50配置於黏著面31上。又,關於界定俯視外輪廓形狀之端緣,光學膜10具有端緣13,黏著劑層20具有端緣22(第1端緣),黏著劑層30具有端緣32(第2端緣),輕剝離膜40具有端緣42,重剝離膜50具有端緣52。The optical film Y with an adhesive layer includes an optical film 10 having a thickness of 100 μm or less, an adhesive layer 20 (first adhesive layer), and an adhesive layer 30 (second adhesive layer). The optical film 10 has a first surface 11 and a second surface 12 opposite to the first surface 11 . The adhesive layer 20 is attached to the first surface 11 and has an adhesive surface 21 (first adhesive surface) on the opposite side of the optical film 10 . The light release film 40 is disposed on the adhesive surface 21 . The adhesive layer 30 is attached to the second surface 12 and has an adhesive surface 31 (second adhesive surface) on the opposite side of the optical film 10 . The heavy release film 50 is disposed on the adhesive surface 31 . Also, with regard to the edges defining the outer contour shape in plan view, the optical film 10 has an edge 13, the adhesive layer 20 has an edge 22 (first edge), and the adhesive layer 30 has an edge 32 (second edge), The light release film 40 has an end edge 42 and the heavy release film 50 has an end edge 52 .

如圖2所示,光學膜X於該膜之外周端之全部或一部分具有側面凹凸端部E。於側面凹凸端部E中,於面內方向D上,黏著劑層20、30之端緣22、32較光學膜10、輕剝離膜40、及重剝離膜50之端緣13、42、52退避。又,於側面凹凸端部E中,黏著劑層20之端緣22距輕剝離膜40之端緣42之第1退避長度d1較黏著劑層30之端緣32距重剝離膜50之端緣52之第2退避長度d2小。第1退避長度d1係面內方向D上之端緣22、42間之距離。第2退避長度d2係面內方向D上之端緣32、52間之距離。第1退避長度d1之調整方法例如可例舉黏著劑層20之厚度之調整及彈性模數之調整。第2退避長度d2之調整方法例如可例舉黏著劑層30之厚度之調整及彈性模數之調整。又,面內方向D上之端緣22、32間之距離(即,第1退避長度d1與第2退避長度d2之差)之調整方法例如可例舉為了形成側面凹凸端部E而使用旋轉刀所實施之後述切斷步驟中之切斷條件之調整。該切斷條件例如可例舉旋轉刀之刀尖之錐角、旋轉刀之轉速、後述旋轉刀相對於光學膜積層體之表面之入射方向、及切削光學膜積層體之旋轉刀之位移速度。As shown in FIG. 2 , the optical film X has a side concave-convex end portion E on all or a part of the outer peripheral end of the film. In the side concave-convex end E, in the in-plane direction D, the edges 22, 32 of the adhesive layers 20, 30 are smaller than the edges 13, 42, 52 of the optical film 10, the light release film 40, and the heavy release film 50. retreat. Also, in the concave-convex end portion E of the side surface, the distance d1 between the end edge 22 of the adhesive layer 20 and the end edge 42 of the light release film 40 is greater than the distance between the end edge 32 of the adhesive layer 30 and the end edge of the heavy release film 50. The second retreat length d2 of 52 is small. The first relief length d1 is the distance between the edges 22 and 42 in the in-plane direction D. The second retraction length d2 is the distance between the edges 32 and 52 in the in-plane direction D. The adjustment method of the 1st back-off length d1 is mentioned, for example, the adjustment of the thickness of the adhesive layer 20, and the adjustment of elastic modulus. The adjustment method of the 2nd back-off length d2 is mentioned, for example, the adjustment of the thickness of the adhesive layer 30, and the adjustment of elastic modulus. Also, the method of adjusting the distance between the edges 22 and 32 in the in-plane direction D (i.e., the difference between the first relief length d1 and the second relief length d2) can be, for example, using a rotating Adjustment of the cutting conditions in the cutting step described after the knife is implemented. The cutting conditions include, for example, the taper angle of the blade tip of the rotary blade, the rotational speed of the rotary blade, the incident direction of the rotary blade relative to the surface of the optical film laminate described later, and the displacement speed of the rotary blade for cutting the optical film laminate.

如上所述,於光學膜X之側面凹凸端部E中,於面內方向D上,黏著劑層20之端緣22較光學膜10、輕剝離膜40、及重剝離膜50之端緣13、42、52退避。於此種側面凹凸端部E中,輕剝離膜40具有未貼合黏著劑層20之自由部分40a。因此,於側面凹凸端部E中,自黏著劑層20剝離輕剝離膜40時,首先,可如圖2中假想線所示般捲起輕剝離膜40之自由部分40a而使其變形,隨後拉伸已捲起變形之自由部分40a而將輕剝離膜40自黏著劑層20之端緣22拉離。即,於剝離開始過程中,無需同時施加用以使輕剝離膜40之自由部分40a充分地變形之力(第1力)、及用以自追隨輕剝離膜40之變形而發生彈性變形之黏著劑層20之端緣22將輕剝離膜40拉離之力(第2力)。此種光學膜X適於減小剝離開始過程所需之力。該力越小,越可於輕剝離膜40之剝離開始過程中,抑制厚度薄至100 μm以下之光學膜10之變形,從而亦抑制黏著劑層30之變形,因此,可抑制黏著劑層30之端緣32自重剝離膜50分離。As mentioned above, in the side concave-convex end portion E of the optical film X, in the in-plane direction D, the edge 22 of the adhesive layer 20 is smaller than the edge 13 of the optical film 10, the light release film 40, and the heavy release film 50. , 42, 52 retreat. In such side concave-convex end portion E, the light release film 40 has a free portion 40a where the adhesive layer 20 is not bonded. Therefore, when the light release film 40 is peeled off from the adhesive layer 20 in the side uneven end part E, first, the free part 40a of the light release film 40 can be rolled up as shown by the imaginary line in FIG. 2 to deform it, and then The free portion 40 a that has been rolled up and deformed is stretched to pull the light release film 40 away from the end edge 22 of the adhesive layer 20 . That is, in the process of starting the peeling, it is not necessary to simultaneously apply a force (first force) for sufficiently deforming the free portion 40a of the light release film 40 and an adhesive force for elastically deforming the light release film 40 following the deformation. The edge 22 of the agent layer 20 pulls the light release film 40 away (the second force). Such an optical film X is suitable for reducing the force required for the peel initiation process. The smaller the force, the more it is possible to suppress the deformation of the optical film 10 whose thickness is as thin as 100 μm or less in the process of starting the peeling of the light release film 40, thereby also suppressing the deformation of the adhesive layer 30. Therefore, the adhesive layer 30 can be suppressed. The end edge 32 is separated from the weight release film 50 .

又,如上所述,於光學膜X之側面凹凸端部E中,第1退避長度d1較第2退避長度d2小。即,於側面凹凸端部E中,於面內方向D上,黏著劑層30之端緣32較黏著劑層20之端緣22退避。此種構成適於在輕剝離膜40之剝離開始過程中,於用以自黏著劑層20之端緣22將輕剝離膜40拉離之上述第2力作用於光學膜X時,抑制黏著劑層30之變形,因此,適於抑制黏著劑層30之端緣32自重剝離膜50分離。Moreover, as mentioned above, in the side surface concave-convex end part E of the optical film X, the 1st relief length d1 is smaller than the 2nd relief length d2. That is, the edge 32 of the adhesive layer 30 is receded from the edge 22 of the adhesive layer 20 in the in-plane direction D in the concave-convex end portion E of the side surface. This configuration is suitable for suppressing the adhesive when the above-mentioned second force for pulling the easy-release film 40 away from the edge 22 of the adhesive layer 20 acts on the optical film X in the process of starting the peeling of the easy-release film 40 . Deformation of layer 30 is, therefore, adapted to inhibit separation of edge 32 of adhesive layer 30 from weight release film 50 .

如上所述,光學膜X適於自附有黏著劑層20、30之薄光學膜10剝離輕剝離膜40,同時抑制重剝離膜50之剝離。As described above, the optical film X is suitable for peeling the light release film 40 from the thin optical film 10 with the adhesive layers 20 , 30 while suppressing the peeling of the heavy release film 50 .

於光學膜X中,面內方向D之端緣22、32間之距離較佳為1 μm以上,更佳為5 μm以上,進而較佳為10 μm以上。此種構成可較佳地用於在輕剝離膜40之上述剝離開始過程中抑制黏著劑層20之上述變形,因此,可較佳地用於抑制黏著劑層40之端緣42自重剝離膜50分離。又,面內方向D之端緣22、32間之距離較佳為300 μm以下,更佳為250 μm以下,進而較佳為220 μm以下。此種構成可較佳地用於抑制光學膜10之端部之損傷,又,可較佳地用於抑制光學膜10與黏著劑層20、30之間之接著面積之減小所導致的光學膜10之端部之耐久性降低。In the optical film X, the distance between the edges 22 and 32 in the in-plane direction D is preferably at least 1 μm, more preferably at least 5 μm, and still more preferably at least 10 μm. Such a configuration can be preferably used to suppress the above-mentioned deformation of the adhesive layer 20 during the above-mentioned peeling initiation process of the light release film 40, and therefore, can be preferably used to suppress the peeling of the film 50 from the edge 42 of the adhesive layer 40 by its own weight. separate. Also, the distance between the edges 22 and 32 in the in-plane direction D is preferably 300 μm or less, more preferably 250 μm or less, further preferably 220 μm or less. This kind of structure can be preferably used to suppress the damage of the end portion of the optical film 10, and can be preferably used to suppress the optical damage caused by the reduction of the bonding area between the optical film 10 and the adhesive layer 20,30. The durability of the end portion of the film 10 is reduced.

第1退避長度d1較佳為20 μm以上,更佳為40 μm以上,進而較佳為60 μm以上。此種構成適於在輕剝離膜40之上述剝離開始過程中,於自黏著劑層20之端緣22將輕剝離膜40拉離之前,充分地捲起輕剝離膜40之自由部分40a而使其變形,因此,可較佳地用於減小輕剝離膜40之剝離開始所需之力(總力)。又,第1退避長度d1較佳為500 μm以下,更佳為400 μm以下,進而較佳為300 μm以下。第2退避長度d2只要較第1退避長度d1大,則較佳為21 μm以上,更佳為41 μm以上,進而較佳為61 μm以上。第2退避長度d2只要較第1退避長度d1大,則較佳為550 μm以下,更佳為450 μm以下,進而較佳為350 μm以下。第2退避長度d2相對於第1退避長度d1之比率(d2/d1)較佳為1.1以上,更佳為1.2以上。比率(d2/d1)較佳為5以下,更佳為4以下。The first back-off length d1 is preferably at least 20 μm, more preferably at least 40 μm, and still more preferably at least 60 μm. This structure is suitable for fully rolling up the free part 40a of the easy-release film 40 before pulling the easy-release film 40 away from the edge 22 of the adhesive layer 20 during the above-mentioned peeling start process of the light-release film 40. Its deformation, therefore, can preferably be used to reduce the force (total force) required for the peeling initiation of the light release film 40 . Also, the first back-off length d1 is preferably 500 μm or less, more preferably 400 μm or less, and still more preferably 300 μm or less. As long as the second back-off length d2 is larger than the first back-off length d1, it is preferably at least 21 μm, more preferably at least 41 μm, and still more preferably at least 61 μm. As long as the second back-off length d2 is larger than the first back-off length d1, it is preferably 550 μm or less, more preferably 450 μm or less, and still more preferably 350 μm or less. The ratio (d2/d1) of the second relief length d2 to the first relief length d1 is preferably 1.1 or more, more preferably 1.2 or more. The ratio (d2/d1) is preferably 5 or less, more preferably 4 or less.

用以開始自黏著劑層20之黏著面21剝離輕剝離膜40之第1剝離開始力F1較佳為較用以開始自黏著劑層30之黏著面31剝離重剝離膜50之第2剝離開始力F2小。第1剝離開始力F1相對於第2剝離開始力F2之比率(F1/F2)較佳為0.8以下,更佳為0.78以下。比率(F1/F2)較佳為0.1以上,更佳為0.15以上。該等構成可較佳地用於在輕剝離膜40之剝離開始過程中抑制黏著劑層20之上述變形,因此,可較佳地用於抑制黏著劑層30之端緣32自重剝離膜50分離。The first peeling start force F1 for starting to peel off the light release film 40 from the adhesive surface 21 of the adhesive layer 20 is preferably higher than the second peeling start for starting to peel the heavy release film 50 from the adhesive surface 31 of the adhesive layer 30. The force F2 is small. The ratio (F1/F2) of the first peeling initiation force F1 to the second peeling initiation force F2 is preferably 0.8 or less, more preferably 0.78 or less. The ratio (F1/F2) is preferably at least 0.1, more preferably at least 0.15. These configurations can be preferably used to suppress the above-mentioned deformation of the adhesive layer 20 during the start of peeling of the light release film 40, and therefore, can be preferably used to suppress separation of the edge 32 of the adhesive layer 30 from the weight release film 50. .

於本實施方式中,剝離開始力係指將可剝離地貼合於黏著劑層之剝離膜自該黏著劑層剝離時之剝離開始過程所需之力。於剝離開始過程中,力以剝離膜於遠離黏著劑層之方向發生變形之方式作用於該剝離膜。藉此,貼合於該剝離膜之黏著劑層之端緣及其附近追隨剝離膜之變形而暫時發生彈性變形。繼而,於以足以自如此發生彈性變形之黏著劑層端部將剝離膜拉離之力拉伸剝離膜之情形時,黏著劑層之端緣及其附近與剝離膜之間開裂而開始剝離。即,剝離開始力係指於剝離開始過程中自已彈性變形之黏著劑層端部將剝離膜拉離而開始自黏著劑層將剝離膜剝離所需之力。此種剝離開始力可藉由後述實施例中敍述之方法進行測定。此種剝離開始力之調整方法例如可例舉剝離膜之厚度之調整、及剝離膜之黏著劑層側表面之剝離處理劑之種類之選擇。In this embodiment, the peeling start force refers to the force required for the peeling start process when the release film releasably adhered to the adhesive layer is peeled from the adhesive layer. During the initiation of peeling, a force acts on the release film in such a way that the release film deforms in a direction away from the adhesive layer. Thereby, the edge of the adhesive layer bonded to the release film and its vicinity are temporarily elastically deformed following the deformation of the release film. Then, when the release film is stretched with a force sufficient to pull the release film away from the end of the adhesive layer elastically deformed in this way, the edge of the adhesive layer and its vicinity and the release film are cracked to start peeling. That is, the peeling start force refers to the force required to start peeling the release film from the adhesive layer by pulling the release film away from the end of the adhesive layer that has elastically deformed during the peeling start process. Such a peeling initiation force can be measured by the method described in the later-mentioned Examples. Such a method of adjusting the peeling initiation force may, for example, be the adjustment of the thickness of the release film and the selection of the type of release treatment agent on the adhesive layer side surface of the release film.

第1剝離開始力F1較佳為未達800 gf/25 mm,更佳為500 gf/25 mm以下,進而較佳為400 gf/25 mm以下。此種構成可較佳地用於在輕剝離膜40之剝離開始過程中抑制黏著劑層30之端緣32與重剝離膜50分離,並且降低對光學膜10之負荷。又,第1剝離開始力F1較佳為5 gf/25 mm以上,更佳為10 gf/25 mm以上,進而較佳為20 gf/25 mm以上。此種構成可較佳地用於在光學膜X之例如輸送中及操作時抑制輕剝離膜40自黏著劑層20起翹(部分剝離)。The first peeling start force F1 is preferably less than 800 gf/25 mm, more preferably at most 500 gf/25 mm, further preferably at most 400 gf/25 mm. Such a configuration can be preferably used to suppress separation of the edge 32 of the adhesive layer 30 from the heavy release film 50 during the start of peeling of the light release film 40 and to reduce the load on the optical film 10 . Also, the first peeling initiation force F1 is preferably at least 5 gf/25 mm, more preferably at least 10 gf/25 mm, and still more preferably at least 20 gf/25 mm. Such a configuration can be preferably used to suppress lifting (partial peeling) of the light release film 40 from the adhesive layer 20 during, for example, conveyance and handling of the optical film X.

用以於輕剝離膜40自黏著劑層20之剝離開始後將該輕剝離膜40自黏著劑層20之黏著面21剝離之剝離力f1較佳為0.1 gf/25 mm以上,更佳為0.3 gf/25 mm以上,進而較佳為0.5 gf/25 mm以上。剝離力f1較佳為5 gf/25 mm以下,更佳為4 gf/25 mm以下,進而較佳為3 gf/25 mm以下。The peeling force f1 for peeling the light release film 40 from the adhesive surface 21 of the adhesive layer 20 after the start of peeling the light release film 40 from the adhesive layer 20 is preferably 0.1 gf/25 mm or more, more preferably 0.3 gf/25 mm or more. gf/25 mm or more, and more preferably 0.5 gf/25 mm or more. The peel force f1 is preferably at most 5 gf/25 mm, more preferably at most 4 gf/25 mm, further preferably at most 3 gf/25 mm.

第2剝離開始力F2較佳為800 gf/25 mm以下,更佳為700 gf/25 mm以下,進而較佳為600 gf/25 mm以下。此種構成可較佳地用於在輕剝離膜40之剝離開始過程中抑制黏著劑層30之端緣32自重剝離膜50分離,並且在重剝離膜50自黏著劑層30之剝離開始過程中降低對光學膜10之負荷。又,第2剝離開始力F2較佳為10 gf/25 mm以上,更佳為20 gf/25 mm以上,進而較佳為30 gf/25 mm以上。此種構成可較佳地用於在光學膜X之例如輸送中及操作時抑制重剝離膜50自黏著劑層30起翹(部分剝離)。The second peeling start force F2 is preferably at most 800 gf/25 mm, more preferably at most 700 gf/25 mm, further preferably at most 600 gf/25 mm. Such a configuration can be preferably used to suppress the separation of the edge 32 of the adhesive layer 30 from the heavy release film 50 during the start of peeling of the light release film 40, and to prevent the peeling of the heavy release film 50 from the adhesive layer 30. The load on the optical film 10 is reduced. Also, the second peeling start force F2 is preferably at least 10 gf/25 mm, more preferably at least 20 gf/25 mm, and still more preferably at least 30 gf/25 mm. Such a configuration can be preferably used to suppress warpage (partial peeling) of the heavy release film 50 from the adhesive layer 30 during conveyance and handling of the optical film X, for example.

用以於重剝離膜50自黏著劑層30之剝離開始後將該重剝離膜50自黏著劑層30之黏著面31剝離之剝離力f2較佳為0.1 gf/25 mm以上,更佳為0.3 gf/25 mm以上,進而較佳為0.5 gf/25 mm以上。剝離力f2較佳為5 gf/25 mm以下,更佳為4 gf/25 mm以下,進而較佳為3 gf/25 mm以下。又,上述剝離力f1相對於剝離力f2之比率(f1/f2)較佳為0.8以下,更佳為0.7以下。比率(f1/f2)較佳為0.1以上,更佳為0.2以上。The peel force f2 for peeling the heavy release film 50 from the adhesive surface 31 of the adhesive layer 30 after the peeling of the heavy release film 50 from the adhesive layer 30 is preferably 0.1 gf/25 mm or more, more preferably 0.3 gf/25 mm or more. gf/25 mm or more, and more preferably 0.5 gf/25 mm or more. The peel force f2 is preferably at most 5 gf/25 mm, more preferably at most 4 gf/25 mm, further preferably at most 3 gf/25 mm. Moreover, the ratio (f1/f2) of the peeling force f1 to the peeling force f2 is preferably 0.8 or less, more preferably 0.7 or less. The ratio (f1/f2) is preferably at least 0.1, more preferably at least 0.2.

於光學膜10為膜狀之偏光板(偏光膜)之情形時,該偏光膜例如可例舉具備偏光元件、及貼合於該偏光元件之單面或兩面之透明保護膜的偏光膜。偏光元件例如可例舉吸附有二色性物質之單軸延伸之親水性高分子膜、及多烯配向膜。親水性高分子膜例如可例舉聚乙烯醇膜、部分縮甲醛化聚乙烯醇膜、及乙烯-乙酸乙烯酯共聚物部分皂化膜。二色性物質例如可例舉碘及二色性染料。多烯配向膜例如可例舉聚乙烯醇之脫水處理物、及聚氯乙烯之脫氯化氫處理物。When the optical film 10 is a film-shaped polarizing plate (polarizing film), the polarizing film includes, for example, a polarizing element and a transparent protective film attached to one or both sides of the polarizing element. The polarizing element may, for example, be a uniaxially stretched hydrophilic polymer film on which a dichroic substance is adsorbed, or a polyene alignment film. The hydrophilic polymer film may, for example, be a polyvinyl alcohol film, a partially formalized polyvinyl alcohol film, or an ethylene-vinyl acetate copolymer partially saponified film. As a dichroic substance, iodine and a dichroic dye are mentioned, for example. The polyene alignment film may, for example, be a dehydrated product of polyvinyl alcohol or a dehydrochlorinated product of polyvinyl chloride.

亦可使用厚度10 μm以下之薄型偏光元件作為偏光元件。薄型偏光元件例如可例舉日本專利特開昭51-069644號公報、日本專利特開2000-338329號公報、WO2010/100917號、日本專利第4691205號、及日本專利第4751481號所記載之偏光元件。Thin polarizers with a thickness of 10 μm or less can also be used as polarizers. Thin polarizers, for example, include polarizers described in Japanese Patent Laid-Open No. 51-069644, Japanese Patent Laid-Open No. 2000-338329, WO2010/100917, Japanese Patent No. 4691205, and Japanese Patent No. 4751481 .

透明保護膜較佳為透明性、機械強度、熱穩定性、水分阻隔性、及光學各向同性優異之膜。此種透明保護膜之材料例如可例舉纖維素樹脂、環狀聚烯烴樹脂、丙烯酸樹脂、苯基馬來醯亞胺樹脂、及聚碳酸酯樹脂。The transparent protective film is preferably a film excellent in transparency, mechanical strength, heat stability, moisture barrier property, and optical isotropy. The material of such a transparent protective film may, for example, be cellulose resin, cyclic polyolefin resin, acrylic resin, phenylmaleimide resin, or polycarbonate resin.

就可撓性之觀點而言,偏光板之厚度較佳為100 μm以下,更佳為80 μm以下,進而較佳為70 μm以下。From the viewpoint of flexibility, the thickness of the polarizing plate is preferably at most 100 μm, more preferably at most 80 μm, and still more preferably at most 70 μm.

黏著劑層20係由第1黏著劑組合物所形成之壓敏接著劑層。黏著劑層20具有透明性(可見光透過性)。第1黏著劑組合物至少含有基礎聚合物。The adhesive layer 20 is a pressure-sensitive adhesive layer formed from the first adhesive composition. The adhesive layer 20 has transparency (visible light transmittance). The first adhesive composition contains at least a base polymer.

基礎聚合物係於黏著劑層20中表現黏著性之黏著成分。基礎聚合物例如可例舉:丙烯酸聚合物、矽酮聚合物、聚酯聚合物、聚胺酯聚合物、聚醯胺聚合物、聚乙烯醚聚合物、乙酸乙烯酯/氯乙烯共聚物、改性聚烯烴聚合物、環氧聚合物、氟聚合物、及橡膠聚合物。基礎聚合物可單獨使用,亦可將兩種以上併用。就確保黏著劑層20之良好之透明性及黏著性之觀點而言,較佳為使用丙烯酸聚合物作為基礎聚合物。The base polymer is an adhesive component that expresses adhesiveness in the adhesive layer 20 . Examples of base polymers include acrylic polymers, silicone polymers, polyester polymers, polyurethane polymers, polyamide polymers, polyvinyl ether polymers, vinyl acetate/vinyl chloride copolymers, modified poly Olefin polymers, epoxy polymers, fluoropolymers, and rubber polymers. The base polymer may be used alone or in combination of two or more. From the viewpoint of securing good transparency and adhesiveness of the adhesive layer 20, it is preferable to use an acrylic polymer as the base polymer.

丙烯酸聚合物係以50質量%以上之比例包含(甲基)丙烯酸烷基酯之單體成分之共聚物。「(甲基)丙烯酸」意指丙烯酸及/或甲基丙烯酸。The acrylic polymer is a copolymer containing a monomer component of alkyl (meth)acrylate in a ratio of 50% by mass or more. "(Meth)acrylic acid" means acrylic acid and/or methacrylic acid.

(甲基)丙烯酸烷基酯適宜使用烷基之碳數為1~20之(甲基)丙烯酸烷基酯。(甲基)丙烯酸烷基酯可具有直鏈狀或支鏈狀烷基,亦可具有脂環式烷基等環狀烷基。As the alkyl (meth)acrylate, an alkyl (meth)acrylate having 1 to 20 carbon atoms in the alkyl group is preferably used. Alkyl (meth)acrylate may have linear or branched alkyl groups, and may have cyclic alkyl groups such as alicyclic alkyl groups.

具有直鏈狀或支鏈狀烷基之(甲基)丙烯酸烷基酯例如可例舉(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸新戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯(即丙烯酸月桂酯)、(甲基)丙烯酸異十三烷基酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸異十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸十六烷基酯、(甲基)丙烯酸十七烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸異十八烷基酯、及(甲基)丙烯酸十九烷基酯。Examples of the alkyl (meth)acrylate having a linear or branched alkyl group include methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, (meth)acrylate, ) isobutyl acrylate, second butyl (meth)acrylate, third butyl (meth)acrylate, pentyl (meth)acrylate, isopentyl (meth)acrylate, neopentyl (meth)acrylate ester, hexyl (meth)acrylate, heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, (meth)acrylate ) nonyl acrylate, isononyl (meth) acrylate, decyl (meth) acrylate, isodecyl (meth) acrylate, undecyl (meth) acrylate, dodecyl (meth) acrylate (meth)acrylic acid isotridecyl ester, (meth)acrylic acid isotetradecyl ester, (meth)acrylate isotetradecyl ester, (meth)acrylate Pentadecyl, Cetyl (meth)acrylate, Heptadecyl (meth)acrylate, Octadecyl (meth)acrylate, Isostearyl (meth)acrylate, and nonadecyl (meth)acrylate.

具有脂環式烷基之(甲基)丙烯酸烷基酯例如可例舉(甲基)丙烯酸環烷基酯、具有二環式脂肪族烴環之(甲基)丙烯酸酯、及具有三環以上之脂肪族烴環之(甲基)丙烯酸酯。(甲基)丙烯酸環烷基酯例如可例舉(甲基)丙烯酸環戊酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸環庚酯、及(甲基)丙烯酸環辛酯。具有二環式脂肪族烴環之(甲基)丙烯酸酯例如可例舉(甲基)丙烯酸異𦯉酯。具有三環以上之脂肪族烴環之(甲基)丙烯酸酯例如可例舉(甲基)丙烯酸雙環戊酯、(甲基)丙烯酸雙環戊氧基乙酯、(甲基)丙烯酸三環戊酯、(甲基)丙烯酸1-金剛烷基酯、(甲基)丙烯酸2-甲基-2-金剛烷基酯、及(甲基)丙烯酸2-乙基-2-金剛烷基酯。Examples of alkyl (meth)acrylates having an alicyclic alkyl group include cycloalkyl (meth)acrylates, (meth)acrylates having a bicyclic aliphatic hydrocarbon ring, and (meth)acrylates having three or more rings. (meth)acrylates of aliphatic hydrocarbon rings. As cycloalkyl (meth)acrylate, cyclopentyl (meth)acrylate, cyclohexyl (meth)acrylate, cycloheptyl (meth)acrylate, and cyclooctyl (meth)acrylate are mentioned, for example. As the (meth)acrylate having a bicyclic aliphatic hydrocarbon ring, for example, iso(meth)acrylate is mentioned. Examples of (meth)acrylates having an aliphatic hydrocarbon ring having three or more rings include dicyclopentyl (meth)acrylate, dicyclopentyloxyethyl (meth)acrylate, and tricyclopentyl (meth)acrylate. , 1-adamantyl (meth)acrylate, 2-methyl-2-adamantyl (meth)acrylate, and 2-ethyl-2-adamantyl (meth)acrylate.

(甲基)丙烯酸烷基酯較佳為使用具有碳數3~15之烷基之丙烯酸烷基酯,更佳為使用選自由丙烯酸正丁酯、丙烯酸2-乙基己酯、及丙烯酸十二烷基酯所組成之群中之至少一個。Alkyl (meth)acrylate is preferably an alkyl acrylate having an alkyl group with 3 to 15 carbon atoms, more preferably an alkyl acrylate selected from n-butyl acrylate, 2-ethylhexyl acrylate, and dodecyl acrylate. At least one of the group consisting of alkyl esters.

就於黏著劑層20中適當表現黏著性等基本特性之觀點而言,單體成分中之(甲基)丙烯酸烷基酯之比例較佳為50質量%以上,更佳為60質量%以上,進而較佳為70質量%以上。該比例例如為99質量%以下。From the viewpoint of appropriately expressing basic properties such as adhesiveness in the adhesive layer 20, the ratio of the alkyl (meth)acrylate in the monomer component is preferably at least 50% by mass, more preferably at least 60% by mass. Furthermore, it is more preferable that it is 70 mass % or more. This ratio is, for example, 99% by mass or less.

單體成分亦可包含可與(甲基)丙烯酸烷基酯進行共聚之共聚性單體。共聚性單體例如可例舉具有極性基之單體。含極性基單體例如可例舉具有含氮原子環之單體、含羥基單體、及含羧基單體。含極性基單體可用於丙烯酸聚合物之改質,如向丙烯酸聚合物導入交聯點、確保丙烯酸聚合物之凝聚力等。The monomer component may also contain a copolymerizable monomer that can be copolymerized with an alkyl (meth)acrylate. As a copolymerizable monomer, the monomer which has a polar group is mentioned, for example. The polar group-containing monomer may, for example, be a monomer having a nitrogen atom ring, a hydroxyl group-containing monomer, or a carboxyl group-containing monomer. Polar group-containing monomers can be used to modify acrylic polymers, such as introducing crosslinking points into acrylic polymers, ensuring the cohesion of acrylic polymers, etc.

具有含氮原子環之單體例如可例舉:N-乙烯基-2-吡咯啶酮、N-甲基乙烯基吡咯啶酮、N-乙烯基吡啶、N-乙烯基哌啶酮、N-乙烯基嘧啶、N-乙烯基哌𠯤、N-乙烯基吡𠯤、N-乙烯基吡咯、N-乙烯基咪唑、N-乙烯基㗁唑、N-(甲基)丙烯醯基-2-吡咯啶酮、N-(甲基)丙烯醯基哌啶、N-(甲基)丙烯醯基吡咯啶、N-乙烯基嗎啉、N-乙烯基-3-嗎啉酮、N-乙烯基-2-己內醯胺、N-乙烯基-1,3-㗁𠯤-2-酮、N-乙烯基-3,5-嗎啉二酮、N-乙烯基吡唑、N-乙烯基異㗁唑、N-乙烯基噻唑、及N-乙烯基異噻唑。具有含氮原子環之單體較佳為使用N-乙烯基-2-吡咯啶酮。Monomers having a ring containing a nitrogen atom include, for example: N-vinyl-2-pyrrolidone, N-methylvinylpyrrolidone, N-vinylpyridine, N-vinylpiperidone, N- Vinylpyrimidine, N-vinylpiperone, N-vinylpyrrole, N-vinylpyrrole, N-vinylimidazole, N-vinylpyrazole, N-(meth)acryl-2-pyrrole Pyridone, N-(meth)acrylpiperidine, N-(meth)acrylpyrrolidine, N-vinylmorpholine, N-vinyl-3-morpholinone, N-vinyl- 2-Caprolactam, N-Vinyl-1,3-㗁𠯤-2-one, N-Vinyl-3,5-Morpholinedione, N-Vinylpyrazole, N-Vinyliso㗁Azole, N-vinylthiazole, and N-vinylisothiazole. As a monomer having a ring containing a nitrogen atom, N-vinyl-2-pyrrolidone is preferably used.

就確保黏著劑層20中之凝聚力、及確保黏著劑層20對被接著體之密接力之觀點而言,單體成分中之具有含氮原子環之單體之比例較佳為0.1質量%以上,更佳為0.3質量%以上,進而較佳為0.55質量%以上。就調整丙烯酸聚合物之玻璃轉移溫度、及調整丙烯酸聚合物之極性(與黏著劑層20中之各種添加劑成分與丙烯酸聚合物之相溶性相關)之觀點而言,該比例較佳為30質量%以下,更佳為20質量%以下。From the viewpoint of ensuring the cohesion in the adhesive layer 20 and ensuring the adhesion of the adhesive layer 20 to the adherend, the ratio of the monomer having a nitrogen atom ring in the monomer component is preferably 0.1% by mass or more , more preferably at least 0.3% by mass, further preferably at least 0.55% by mass. From the viewpoint of adjusting the glass transition temperature of the acrylic polymer and adjusting the polarity of the acrylic polymer (related to the compatibility of various additive components in the adhesive layer 20 with the acrylic polymer), the ratio is preferably 30 mass % Below, more preferably below 20% by mass.

含羥基單體例如可例舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸2-羥基丁酯、(甲基)丙烯酸3-羥基丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸10-羥基癸酯、(甲基)丙烯酸12-羥基月桂酯、及(甲基)丙烯酸(4-羥基甲基環己基)甲酯。含羥基單體較佳為使用(甲基)丙烯酸4-羥基丁酯,更佳為使用丙烯酸4-羥基丁酯。Examples of hydroxyl-containing monomers include: 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 3-hydroxyl (meth)acrylate Propyl ester, 4-hydroxybutyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, 8-hydroxyoctyl (meth)acrylate, 10-hydroxydecyl (meth)acrylate, (methyl) ) 12-hydroxylauryl acrylate, and (4-hydroxymethylcyclohexyl)methyl (meth)acrylate. As the hydroxyl group-containing monomer, it is preferable to use 4-hydroxybutyl (meth)acrylate, more preferably to use 4-hydroxybutyl acrylate.

就向丙烯酸聚合物導入交聯結構、及確保黏著劑層20中之凝聚力之觀點而言,單體成分中之含羥基單體之比例較佳為0.1質量%以上,更佳為0.5質量%以上,進而較佳為0.8質量%以上。就調整丙烯酸聚合物之極性(與黏著劑層20中之各種添加劑成分與丙烯酸聚合物之相溶性相關)之觀點而言,該比例較佳為20質量%以下,更佳為10質量%以下。From the viewpoint of introducing a crosslinked structure into the acrylic polymer and ensuring cohesion in the adhesive layer 20, the proportion of the hydroxyl group-containing monomer in the monomer component is preferably at least 0.1% by mass, more preferably at least 0.5% by mass , and more preferably at least 0.8% by mass. From the viewpoint of adjusting the polarity of the acrylic polymer (related to the compatibility of various additive components in the adhesive layer 20 and the acrylic polymer), the ratio is preferably 20% by mass or less, more preferably 10% by mass or less.

含羧基單體例如可例舉:丙烯酸、甲基丙烯酸、丙烯酸羧基乙酯、丙烯酸羧基戊酯、伊康酸、順丁烯二酸、富馬酸、丁烯酸、及異丁烯酸。Examples of carboxyl group-containing monomers include acrylic acid, methacrylic acid, carboxyethyl acrylate, carboxypentyl acrylate, itaconic acid, maleic acid, fumaric acid, crotonic acid, and methacrylic acid.

就向丙烯酸聚合物導入交聯結構、確保黏著劑層20中之凝聚力、及確保黏著劑層20對被接著體之密接力之觀點而言,單體成分中之含羧基單體之比例較佳為0.1質量%以上,更佳為0.5質量%以上,進而較佳為0.8質量%以上。就調整丙烯酸聚合物之玻璃轉移溫度、及避免酸所引起之被接著體之腐蝕風險之觀點而言,該比例較佳為30質量%以下,更佳為20質量%以下。From the viewpoint of introducing a cross-linked structure to the acrylic polymer, ensuring the cohesion in the adhesive layer 20, and ensuring the adhesion of the adhesive layer 20 to the adherend, the ratio of the carboxyl group-containing monomer in the monomer component is preferable. It is 0.1 mass % or more, More preferably, it is 0.5 mass % or more, More preferably, it is 0.8 mass % or more. From the viewpoint of adjusting the glass transition temperature of the acrylic polymer and avoiding the risk of corrosion of the adherend due to acid, the ratio is preferably at most 30% by mass, more preferably at most 20% by mass.

為了防止可摺疊器件中之電極等金屬要素因酸成分而腐蝕,黏著劑層20之酸含量較小為佳。又,於將黏著劑層20用於偏光板之接著之情形時,為了抑制酸成分所導致之聚乙烯醇偏光元件之多烯化,黏著劑層20之酸含量較小為佳。此種無酸黏著劑層20中之有機酸單體(例如,(甲基)丙烯酸及含羧基單體)之含量較佳為100 ppm以下,更佳為70 ppm以下,進而較佳為50 ppm以下。黏著劑層20之有機酸單體含量可藉由如下方式求出,即,將黏著劑層20浸漬於純水中而以100℃加溫45分鐘,藉此將酸單體提取至水中,並利用離子層析對酸單體進行定量。In order to prevent metal elements such as electrodes in the foldable device from being corroded by the acid component, the acid content of the adhesive layer 20 is preferably small. Also, when the adhesive layer 20 is used for bonding polarizing plates, the acid content of the adhesive layer 20 is preferably small in order to suppress polyeneization of the polyvinyl alcohol polarizing element caused by the acid component. The content of organic acid monomers (such as (meth)acrylic acid and carboxyl group-containing monomers) in the acid-free adhesive layer 20 is preferably less than 100 ppm, more preferably less than 70 ppm, and even more preferably 50 ppm. the following. The organic acid monomer content of the adhesive layer 20 can be obtained by immersing the adhesive layer 20 in pure water and heating it at 100° C. for 45 minutes to extract the acid monomer into the water, and Acid monomers were quantified using ion chromatography.

就無酸之觀點而言,較佳為黏著劑層20中之基礎聚合物實質上不含有機酸單體作為單體成分。就無酸之觀點而言,單體成分中之有機酸單體之比例較佳為0.5質量%以下,更佳為0.1質量%以下,進而較佳為0.05質量%,較理想為0質量%。From the viewpoint of no acid, it is preferable that the base polymer in the adhesive layer 20 does not substantially contain an organic acid monomer as a monomer component. From the viewpoint of acid-free, the proportion of the organic acid monomer in the monomer component is preferably at most 0.5% by mass, more preferably at most 0.1% by mass, still more preferably 0.05% by mass, and most preferably 0% by mass.

單體成分亦可包含其他共聚性單體。其他共聚性單體例如可例舉酸酐單體、含磺酸基單體、含磷酸基單體、含環氧基單體、含氰基單體、含烷氧基單體、及芳香族乙烯基化合物。該等其他共聚性單體可單獨使用,亦可將兩種以上併用。The monomer component may also contain other copolymerizable monomers. Other copolymerizable monomers include acid anhydride monomers, sulfonic acid-containing monomers, phosphoric acid-containing monomers, epoxy-containing monomers, cyano-containing monomers, alkoxy-containing monomers, and aromatic vinyl base compound. These other copolymerizable monomers may be used alone or in combination of two or more.

於本實施方式中,基礎聚合物具有交聯結構。向基礎聚合物導入交聯結構之方法可例舉:將具有可與交聯劑進行反應之官能基之基礎聚合物及交聯劑調配成第1黏著劑組合物並使基礎聚合物與交聯劑於黏著劑層20中進行反應的方法(第1方法);及於形成基礎聚合物之單體成分包含多官能單體並藉由該單體成分之聚合形成聚合物鏈中導入有支鏈結構(交聯結構)之基礎聚合物的方法(第2方法)。該等方法亦可併用。In this embodiment, the base polymer has a cross-linked structure. The method of introducing a cross-linked structure into the base polymer can be exemplified by formulating the base polymer with a functional group capable of reacting with the cross-linking agent and the cross-linking agent into the first adhesive composition, and making the base polymer and the cross-linking agent A method in which the agent reacts in the adhesive layer 20 (the first method); and the monomer component forming the base polymer includes a multifunctional monomer and the polymer chain is formed by polymerization of the monomer component to introduce a branched chain The method (the second method) of the base polymer of the structure (cross-linked structure). These methods can also be used in combination.

上述第1方法中所使用之交聯劑例如可例舉與基礎聚合物所包含之官能基(羥基及羧基等)進行反應之化合物。此種交聯劑例如可例舉異氰酸酯交聯劑、過氧化物交聯劑、環氧交聯劑、㗁唑啉交聯劑、氮丙啶交聯劑、碳二醯亞胺交聯劑、及金屬螯合物交聯劑。交聯劑可單獨使用,亦可將兩種以上併用。就與基礎聚合物中之羥基及羧基之反應性較高、容易導入交聯結構之方面而言,交聯劑較佳為使用異氰酸酯交聯劑、過氧化物交聯劑、及環氧交聯劑。Examples of the crosslinking agent used in the above-mentioned first method include compounds that react with functional groups (hydroxyl groups, carboxyl groups, etc.) contained in the base polymer. Such a crosslinking agent may, for example, be an isocyanate crosslinking agent, a peroxide crosslinking agent, an epoxy crosslinking agent, an azoline crosslinking agent, an aziridine crosslinking agent, a carbodiimide crosslinking agent, And metal chelate crosslinking agent. A crosslinking agent may be used individually or in combination of 2 or more types. In terms of high reactivity with the hydroxyl and carboxyl groups in the base polymer and the ease of introducing a crosslinked structure, the crosslinking agent is preferably an isocyanate crosslinking agent, a peroxide crosslinking agent, and an epoxy crosslinking agent. agent.

異氰酸酯交聯劑例如可例舉:甲苯二異氰酸酯、六亞甲基二異氰酸酯、異佛爾酮二異氰酸酯、苯二甲基二異氰酸酯、氫化苯二甲基二異氰酸酯、二苯甲烷二異氰酸酯、氫化二苯甲烷二異氰酸酯、四甲基苯二甲基二異氰酸酯、萘二異氰酸酯、三苯甲烷三異氰酸酯、及聚亞甲基聚苯基異氰酸酯。又,異氰酸酯交聯劑亦可例舉該等異氰酸酯之衍生物。該異氰酸酯衍生物例如可例舉異氰尿酸酯改性體及多元醇改性體。異氰酸酯交聯劑之市售品例如可例舉:Coronate L(甲苯二異氰酸酯之三羥甲基丙烷加成物,Tosoh製造)、Coronate HL(六亞甲基二異氰酸酯之三羥甲基丙烷加成物,Tosoh製造)、Coronate HX(六亞甲基二異氰酸酯之異氰尿酸酯體,Tosoh製造)、及Takenate D110N(苯二甲基二異氰酸酯之三羥甲基丙烷加成物,三井化學製造)。The isocyanate crosslinking agent may, for example, be exemplified: toluene diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, xylylene diisocyanate, hydrogenated xylylene diisocyanate, diphenylmethane diisocyanate, hydrogenated diisocyanate, Benzene diisocyanate, tetramethylxylylene diisocyanate, naphthalene diisocyanate, triphenylmethane triisocyanate, and polymethylene polyphenylisocyanate. Moreover, derivatives of these isocyanate can also be mentioned as an isocyanate crosslinking agent. As this isocyanate derivative, a modified isocyanurate and a modified polyol are mentioned, for example. Examples of commercially available isocyanate crosslinking agents include: Coronate L (trimethylolpropane adduct of toluene diisocyanate, manufactured by Tosoh), Coronate HL (trimethylolpropane adduct of hexamethylene diisocyanate) product, manufactured by Tosoh), Coronate HX (isocyanurate body of hexamethylene diisocyanate, manufactured by Tosoh), and Takenate D110N (trimethylolpropane adduct of xylylene diisocyanate, manufactured by Mitsui Chemicals ).

過氧化物交聯劑可例舉:過氧化二苯甲醯、二(2-乙基己基)過氧化二碳酸酯、過氧化二碳酸二(4-第三丁基環己基)酯、過氧化二碳酸二第二丁酯、過氧化新癸酸第三丁酯、過氧化特戊酸第三己酯、及過氧化特戊酸第三丁酯。The peroxide crosslinking agent can be exemplified: dibenzoyl peroxide, bis(2-ethylhexyl) peroxydicarbonate, bis(4-tert-butylcyclohexyl) peroxydicarbonate, peroxydicarbonate Di-2-butyl dicarbonate, tert-butyl peroxyneodecanoate, tert-hexyl peroxypivalate, and tert-butyl peroxypivalate.

環氧交聯劑可例舉:雙酚A、表氯醇型環氧樹脂、乙烯縮水甘油醚、聚乙二醇二縮水甘油醚、甘油二縮水甘油醚、甘油三縮水甘油醚、1,6-己二醇縮水甘油醚、三羥甲基丙烷三縮水甘油醚、二縮水甘油基苯胺、二胺縮水甘油胺、N,N,N',N'-四縮水甘油基間苯二甲胺、及1,3-雙(N,N-二縮水甘油胺甲基)環己烷。Examples of epoxy crosslinking agents include: bisphenol A, epichlorohydrin type epoxy resin, vinyl glycidyl ether, polyethylene glycol diglycidyl ether, glycerol diglycidyl ether, glycerol triglycidyl ether, 1,6 -Hexanediol Glycidyl Ether, Trimethylolpropane Triglycidyl Ether, Diglycidylaniline, Diamine Glycidylamine, N,N,N',N'-Tetraglycidyl m-xylylenediamine, and 1,3-bis(N,N-diglycidylaminomethyl)cyclohexane.

就確保黏著劑層20之適度之柔軟性(由此具有之彎曲性)之觀點而言,較佳為異氰酸酯交聯劑(尤其是二官能之異氰酸酯交聯劑)及過氧化物交聯劑。就確保黏著劑層20之耐久性之觀點而言,較佳為異氰酸酯交聯劑(尤其是三官能之異氰酸酯交聯劑)。於基礎聚合物中,二官能異氰酸酯交聯劑及過氧化物交聯劑形成更柔軟之二維交聯,而三官能異氰酸酯交聯劑形成更牢固之三維交聯。就兼顧黏著劑層20之耐久性與柔軟性之觀點而言,較佳為將三官能異氰酸酯交聯劑與過氧化物交聯劑及/或二官能異氰酸酯交聯劑併用。From the viewpoint of ensuring appropriate flexibility (thereby having flexibility) of the adhesive layer 20 , an isocyanate crosslinking agent (especially a difunctional isocyanate crosslinking agent) and a peroxide crosslinking agent are preferable. From the viewpoint of securing the durability of the adhesive layer 20, an isocyanate crosslinking agent (especially a trifunctional isocyanate crosslinking agent) is preferable. In the base polymer, difunctional isocyanate crosslinkers and peroxide crosslinkers form softer two-dimensional crosslinks, while trifunctional isocyanate crosslinkers form stronger three-dimensional crosslinks. From the viewpoint of achieving both durability and flexibility of the adhesive layer 20 , it is preferable to use a trifunctional isocyanate crosslinking agent, a peroxide crosslinking agent and/or a difunctional isocyanate crosslinking agent in combination.

就確保黏著劑層20之凝聚力之觀點而言,交聯劑之調配量相對於基礎聚合物100質量份例如為0.01質量份以上,較佳為0.05質量份以上,更佳為0.07質量份以上。就於黏著劑層20中確保良好之黏性之觀點而言,交聯劑相對於基礎聚合物100質量份之調配量例如為10質量份以下,較佳為5質量份以下,更佳為3質量份以下。From the viewpoint of securing the cohesive force of the adhesive layer 20 , the compounded amount of the crosslinking agent is, for example, 0.01 parts by mass or more, preferably 0.05 parts by mass or more, more preferably 0.07 parts by mass or more, based on 100 parts by mass of the base polymer. From the viewpoint of ensuring good adhesiveness in the adhesive layer 20, the blending amount of the crosslinking agent relative to 100 parts by mass of the base polymer is, for example, 10 parts by mass or less, preferably 5 parts by mass or less, more preferably 3 parts by mass. Parts by mass or less.

於上述第2方法中,單體成分(包含用以導入交聯結構之多官能單體及其他單體)可一次性聚合,亦可多階段地聚合。於多階段聚合之方法中,首先,使用以形成基礎聚合物之單官能單體進行聚合(預聚合),藉此製備含有部分聚合物(低聚合度之聚合物與未反應之單體之混合物)之預聚物組合物。其次,向預聚物組合物添加多官能單體之後,使部分聚合物與多官能單體進行聚合(正式聚合)。In the above-mentioned second method, monomer components (including polyfunctional monomers and other monomers for introducing a crosslinked structure) may be polymerized at one time or in multiple stages. In the method of multi-stage polymerization, first, polymerization (pre-polymerization) is carried out using monofunctional monomers to form the base polymer, thereby preparing a mixture containing part of the polymer (polymer with a low degree of polymerization and unreacted monomer ) of the prepolymer composition. Next, after adding the polyfunctional monomer to the prepolymer composition, a part of the polymer is polymerized with the polyfunctional monomer (main polymerization).

多官能單體例如可例舉於1分子中含有2個以上之乙烯性不飽和雙鍵之多官能(甲基)丙烯酸酯。就可藉由活性能量線聚合(光聚合)導入交聯結構之觀點而言,多官能單體較佳為多官能丙烯酸酯。As a polyfunctional monomer, the polyfunctional (meth)acrylate which has 2 or more ethylenically unsaturated double bonds in 1 molecule is mentioned, for example. From the viewpoint that a crosslinked structure can be introduced by active energy ray polymerization (photopolymerization), the polyfunctional monomer is preferably a polyfunctional acrylate.

多官能(甲基)丙烯酸酯可例舉二官能(甲基)丙烯酸酯、三官能(甲基)丙烯酸酯、及四官能以上之多官能(甲基)丙烯酸酯。The multifunctional (meth)acrylate may, for example, be a bifunctional (meth)acrylate, a trifunctional (meth)acrylate, or a tetrafunctional or higher polyfunctional (meth)acrylate.

二官能(甲基)丙烯酸酯例如可例舉:乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、四乙二醇二甲基丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、1,9-壬二醇二(甲基)丙烯酸酯、甘油二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、硬脂酸改性季戊四醇二(甲基)丙烯酸酯、二環戊烯基二丙烯酸酯、異氰尿酸二(甲基)丙烯醯酯、及環氧烷改性雙酚二(甲基)丙烯酸酯。Difunctional (meth)acrylates can be exemplified, for example: ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, Diol Dimethacrylate, 1,6-Hexanediol Di(meth)acrylate, 1,9-Nanediol Di(meth)acrylate, Glycerin Di(meth)acrylate, Neopentyldiol Alcohol di(meth)acrylate, stearic acid modified pentaerythritol di(meth)acrylate, dicyclopentenyl diacrylate, isocyanuric acid di(meth)acryl ester, and alkylene oxide modified Bisphenol di(meth)acrylate.

三官能(甲基)丙烯酸酯例如可例舉三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、及異氰尿酸三(丙烯醯氧基乙基)酯。Trifunctional (meth)acrylates may, for example, be trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, or tri(acryloxyethyl)isocyanurate.

四官能以上之多官能(甲基)丙烯酸酯例如可例舉二-三羥甲基丙烷四(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇單羥基五(甲基)丙烯酸酯、烷基改性二季戊四醇五丙烯酸酯、及二季戊四醇六(甲基)丙烯酸酯。Examples of polyfunctional (meth)acrylates with four or more functions include di-trimethylolpropane tetra(meth)acrylate, pentaerythritol tetra(meth)acrylate, and dipentaerythritol monohydroxypenta(meth)acrylate. ester, alkyl-modified dipentaerythritol pentaacrylate, and dipentaerythritol hexa(meth)acrylate.

多官能單體之分子量較佳為1500以下,更佳為1000以下。又,多官能單體之官能基當量(g/eq)較佳為50以上,更佳為70以上,進而較佳為80以上。該官能基當量較佳為500以下,更佳為300以下,進而較佳為200以下。該等構成就於基礎聚合物中藉由導入交聯結構而適當調整黏彈性(例如,儲存模數G'及損耗正切tanδ)之觀點而言較佳。The molecular weight of the polyfunctional monomer is preferably 1500 or less, more preferably 1000 or less. Moreover, the functional group equivalent (g/eq) of a polyfunctional monomer becomes like this. Preferably it is 50 or more, More preferably, it is 70 or more, More preferably, it is 80 or more. The functional group equivalent weight is preferably 500 or less, more preferably 300 or less, further preferably 200 or less. These constitutions are preferable from the viewpoint of appropriately adjusting viscoelasticity (for example, storage modulus G' and loss tangent tanδ) by introducing a crosslinked structure into the base polymer.

可藉由使上述單體成分進行聚合而形成丙烯酸聚合物。聚合方法例如可例舉溶液聚合、活性能量線聚合(例如紫外線聚合)、塊狀聚合、及乳化聚合。就黏著劑層20之透明性、耐水性、及成本之觀點而言,較佳為溶液聚合及紫外線聚合。溶液聚合之溶劑例如可使用乙酸乙酯及甲苯。又,聚合之起始劑例如可使用熱聚合起始劑及光聚合起始劑。聚合起始劑之使用量相對於單體成分100質量份例如為0.05質量份以上,又,例如為1質量份以下。An acrylic polymer can be formed by polymerizing the above monomer components. The polymerization method may, for example, be solution polymerization, active energy ray polymerization (such as ultraviolet polymerization), bulk polymerization, or emulsion polymerization. From the viewpoints of transparency, water resistance, and cost of the adhesive layer 20, solution polymerization and ultraviolet polymerization are preferable. As a solvent for solution polymerization, ethyl acetate and toluene can be used, for example. Moreover, as a polymerization initiator, a thermal polymerization initiator and a photopolymerization initiator can be used, for example. The usage-amount of a polymerization initiator is 0.05 mass part or more with respect to 100 mass parts of monomer components, and is, for example, 1 mass part or less.

熱聚合起始劑例如可例舉偶氮聚合起始劑及過氧化物聚合起始劑。偶氮聚合起始劑例如可例舉:2,2'-偶氮二異丁腈、2,2'-偶氮雙-2-甲基丁腈、2,2'-偶氮雙(2-甲基丙酸)二甲酯、4,4'-偶氮雙-4-氰基戊酸、偶氮二異戊腈、2,2'-偶氮雙(2-脒基丙烷)二鹽酸鹽、2,2'-偶氮雙[2-(5-甲基-2-咪唑啉-2-基)丙烷]二鹽酸鹽、2,2'-偶氮雙(2-甲基丙脒)二硫酸鹽、及2,2'-偶氮雙(N,N'-二亞甲基異丁脒)二鹽酸鹽。過氧化物聚合起始劑例如可例舉過氧化二苯甲醯、過氧化順丁烯二酸第三丁酯、及過氧化月桂醯。As a thermal polymerization initiator, an azo polymerization initiator and a peroxide polymerization initiator are mentioned, for example. Examples of azo polymerization initiators include: 2,2'-azobisisobutyronitrile, 2,2'-azobis-2-methylbutyronitrile, 2,2'-azobis(2- Dimethyl methylpropionate, 4,4'-azobis-4-cyanovaleric acid, azobisisovaleronitrile, 2,2'-azobis(2-amidinopropane) dihydrochloride Salt, 2,2'-Azobis[2-(5-methyl-2-imidazolin-2-yl)propane] dihydrochloride, 2,2'-Azobis(2-methylpropionamidine ) disulfate, and 2,2'-azobis(N,N'-dimethyleneisobutyramide) dihydrochloride. The peroxide polymerization initiator may, for example, be dibenzoyl peroxide, tert-butyl peroxymaleate, or lauryl peroxide.

光聚合起始劑例如可例舉:安息香醚光聚合起始劑、苯乙酮光聚合起始劑、α-酮醇光聚合起始劑、芳香族磺醯氯光聚合起始劑、光活性肟光聚合起始劑、安息香光聚合起始劑、二苯乙二酮光聚合起始劑、二苯甲酮光聚合起始劑、縮酮光聚合起始劑、9-氧硫𠮿

Figure 111123856-001
光聚合起始劑、及醯基氧化膦光聚合起始劑。The photopolymerization initiator may, for example, be benzoin ether photopolymerization initiator, acetophenone photopolymerization initiator, α-ketol photopolymerization initiator, aromatic sulfonyl chloride photopolymerization initiator, photoactive Oxime Photopolymerization Initiator, Benzoin Photopolymerization Initiator, Benzophenone Photopolymerization Initiator, Benzophenone Photopolymerization Initiator, Ketal Photopolymerization Initiator, 9-Oxysulfur
Figure 111123856-001
A photopolymerization initiator, and an acyl phosphine oxide photopolymerization initiator.

於聚合中,亦可使用鏈轉移劑及/或聚合抑制劑(聚合延遲劑)以進行分子量調整等。鏈轉移劑可例舉:α-硫甘油、月桂基硫醇、縮水甘油基硫醇、巰基乙酸、2-巰基乙醇、硫代乙醇酸、硫代乙醇酸2-乙基己酯、2,3-二巰基-1-丙醇、及α-甲基苯乙烯二聚物。During the polymerization, a chain transfer agent and/or a polymerization inhibitor (polymerization retarder) can also be used for molecular weight adjustment and the like. Examples of chain transfer agents include: α-thioglycerol, lauryl mercaptan, glycidyl mercaptan, thioglycolic acid, 2-mercaptoethanol, thioglycolic acid, 2-ethylhexyl thioglycolic acid, 2,3 - Dimercapto-1-propanol, and α-methylstyrene dimer.

可藉由調整聚合起始劑之種類及/或量來調整基礎聚合物之分子量。例如,於自由基聚合中,聚合起始劑之量越多,反應系之自由基濃度越高,因此有反應起始點之密度較高、所形成之基礎聚合物之分子量減小之傾向。與此相對,聚合起始劑之量越少,反應起始點之密度越低,因此有聚合物鏈容易延伸、所形成之基礎聚合物分子量增大之傾向。The molecular weight of the base polymer can be adjusted by adjusting the type and/or amount of the polymerization initiator. For example, in free radical polymerization, the more the amount of polymerization initiator is, the higher the concentration of free radicals in the reaction system is, so the density of reaction starting points tends to be higher and the molecular weight of the formed base polymer tends to decrease. On the other hand, the smaller the amount of the polymerization initiator, the lower the density of the reaction starting point, so the polymer chain tends to be easily extended, and the molecular weight of the formed base polymer tends to increase.

作為丙烯酸聚合物之重量平均分子量,就確保黏著劑層20中之凝聚力之觀點而言,較佳為10萬以上,更佳為30萬以上,進而較佳為50萬以上。該重量平均分子量較佳為500萬以下,更佳為300萬以下,進而較佳為200萬以下。丙烯酸聚合物之重量平均分子量係藉由凝膠滲透層析儀(GPC)進行測定並根據聚苯乙烯換算而算出。The weight average molecular weight of the acrylic polymer is preferably at least 100,000, more preferably at least 300,000, and still more preferably at least 500,000, from the viewpoint of ensuring cohesion in the adhesive layer 20 . The weight average molecular weight is preferably at most 5 million, more preferably at most 3 million, further preferably at most 2 million. The weight-average molecular weight of the acrylic polymer was measured by gel permeation chromatography (GPC) and calculated in terms of polystyrene.

基礎聚合物之玻璃轉移溫度(Tg)較佳為0℃以下,更佳為-10℃以下,進而較佳為-20℃以下。該玻璃轉移溫度例如為-80℃以上。The glass transition temperature (Tg) of the base polymer is preferably 0°C or lower, more preferably -10°C or lower, further preferably -20°C or lower. The glass transition temperature is, for example, -80°C or higher.

關於基礎聚合物之玻璃轉移溫度(Tg),可使用基於下述Fox公式求出之玻璃轉移溫度(理論值)。Fox公式係聚合物之玻璃轉移溫度Tg與構成該聚合物之單體之均聚物之玻璃轉移溫度Tgi的關係式。於下述Fox公式中,Tg表示聚合物之玻璃轉移溫度(℃),Wi表示構成該聚合物之單體i之重量分率,Tgi表示由單體i所形成之均聚物之玻璃轉移溫度(℃)。均聚物之玻璃轉移溫度可使用文獻值。例如,「Polymer Handbook」(第4版,John Wiley & Sons, Inc.,1999年)及「新高分子文庫7 塗料用合成樹脂入門」(北岡協三著,高分子出版協會,1995年)中例舉有各種均聚物之玻璃轉移溫度。另一方面,單體之均聚物之玻璃轉移溫度亦可藉由日本專利特開2007-51271號公報中具體記載之方法求出。Regarding the glass transition temperature (Tg) of the base polymer, the glass transition temperature (theoretical value) obtained based on the following Fox formula can be used. The Fox formula is a relationship between the glass transition temperature Tg of a polymer and the glass transition temperature Tgi of a homopolymer of monomers constituting the polymer. In the following Fox formula, Tg represents the glass transition temperature (°C) of the polymer, Wi represents the weight fraction of monomer i constituting the polymer, and Tgi represents the glass transition temperature of the homopolymer formed by monomer i (℃). The glass transition temperature of the homopolymer can use the literature value. For example, "Polymer Handbook" (4th edition, John Wiley & Sons, Inc., 1999) and "New Polymer Library 7 Introduction to Synthetic Resins for Coatings" (Kyo Kitaoka, Polymer Publishing Association, 1995) List the glass transition temperatures of various homopolymers. On the other hand, the glass transition temperature of the homopolymer of the monomer can also be obtained by the method specifically described in JP-A-2007-51271.

Fox公式      1/(273+Tg)=Σ[Wi/(273+Tgi)]Fox formula 1/(273+Tg)=Σ[Wi/(273+Tgi)]

除基礎聚合物外,第1黏著劑組合物亦可包含一種或兩種以上之低聚物。於使用丙烯酸聚合物作為基礎聚合物之情形時,較佳為使用丙烯酸酯低聚物作為低聚物。丙烯酸酯低聚物係以50質量%以上之比例包含(甲基)丙烯酸烷基酯之單體成分之共聚物,重量平均分子量例如為1000以上30000以下。In addition to the base polymer, the first adhesive composition may also contain one or two or more oligomers. In the case of using an acrylic polymer as the base polymer, it is preferable to use an acrylate oligomer as the oligomer. The acrylate oligomer is a copolymer containing a monomer component of an alkyl (meth)acrylate in a ratio of 50% by mass or more, and has a weight average molecular weight of, for example, 1,000 to 30,000.

丙烯酸酯低聚物之玻璃轉移溫度較佳為60℃以上,更佳為80℃以上,進而較佳為100℃以上,尤佳為110℃以上。丙烯酸酯低聚物之玻璃轉移溫度例如為200℃以下,較佳為180℃以下,更佳為160℃以下。藉由將導入有交聯結構之低Tg之丙烯酸聚合物(基礎聚合物)與高Tg之丙烯酸酯低聚物併用,可提高黏著劑層20之接著力、尤其高溫下之接著力。丙烯酸酯低聚物之玻璃轉移溫度係藉由上述Fox公式算出。The glass transition temperature of the acrylate oligomer is preferably at least 60°C, more preferably at least 80°C, still more preferably at least 100°C, especially preferably at least 110°C. The glass transition temperature of the acrylate oligomer is, for example, below 200°C, preferably below 180°C, more preferably below 160°C. By using a low Tg acrylic polymer (base polymer) with a crosslinked structure and a high Tg acrylate oligomer in combination, the adhesive force of the adhesive layer 20, especially the adhesive force at high temperature, can be improved. The glass transition temperature of the acrylate oligomer is calculated by the above-mentioned Fox formula.

玻璃轉移溫度為60℃以上之丙烯酸酯低聚物較佳為包含具有鏈狀烷基之(甲基)丙烯酸烷基酯((甲基)丙烯酸鏈狀烷基酯)及具有脂環式烷基之(甲基)丙烯酸烷基酯((甲基)丙烯酸脂環式烷基酯)的單體成分之聚合物。該等(甲基)丙烯酸烷基酯之具體例例如可例舉上述(甲基)丙烯酸烷基酯作為丙烯酸聚合物之單體成分。The acrylate oligomer having a glass transition temperature of 60° C. or higher preferably contains an alkyl (meth)acrylate (chain alkyl (meth)acrylate) with a chain alkyl group and an alicyclic alkyl group. A polymer of monomer components of alkyl (meth)acrylate (cycloalkyl (meth)acrylate). Specific examples of these alkyl (meth)acrylates include the above-mentioned alkyl (meth)acrylates as monomer components of acrylic polymers.

就玻璃轉移溫度較高、與基礎聚合物之相溶性優異之方面而言,(甲基)丙烯酸鏈狀烷基酯較佳為甲基丙烯酸甲酯。(甲基)丙烯酸脂環式烷基酯較佳為丙烯酸雙環戊酯、甲基丙烯酸雙環戊酯、丙烯酸環己酯、及甲基丙烯酸環己酯。即,丙烯酸酯低聚物較佳為包含選自由丙烯酸雙環戊酯、甲基丙烯酸雙環戊酯、丙烯酸環己酯、及甲基丙烯酸環己酯所組成之群中之1種以上、及甲基丙烯酸甲酯的單體成分之聚合物。The chain alkyl (meth)acrylate is preferably methyl methacrylate in terms of a high glass transition temperature and excellent compatibility with the base polymer. The alicyclic alkyl (meth)acrylate is preferably dicyclopentyl acrylate, dicyclopentyl methacrylate, cyclohexyl acrylate, and cyclohexyl methacrylate. That is, the acrylate oligomer preferably contains one or more kinds selected from the group consisting of dicyclopentyl acrylate, dicyclopentyl methacrylate, cyclohexyl acrylate, and cyclohexyl methacrylate, and methyl Polymer of monomer component of methyl acrylate.

丙烯酸酯低聚物之單體成分中之(甲基)丙烯酸脂環式烷基酯之比例較佳為10重量%以上,更佳為20重量%以上,進而較佳為30重量%以上。該比例較佳為90重量%以下,更佳為80重量%以下,進而較佳為70重量%以下。丙烯酸酯低聚物之單體成分中之(甲基)丙烯酸鏈狀烷基酯之比例較佳為90重量%以下,更佳為80重量%以下,進而較佳為70重量%以下。該比例較佳為10重量%以上,更佳為20重量%以上,進而較佳為30重量%以上。The ratio of the alicyclic alkyl (meth)acrylate in the monomer component of the acrylate oligomer is preferably at least 10% by weight, more preferably at least 20% by weight, and still more preferably at least 30% by weight. The ratio is preferably at most 90% by weight, more preferably at most 80% by weight, further preferably at most 70% by weight. The proportion of the chain alkyl (meth)acrylate in the monomer component of the acrylate oligomer is preferably at most 90% by weight, more preferably at most 80% by weight, further preferably at most 70% by weight. The ratio is preferably at least 10% by weight, more preferably at least 20% by weight, and still more preferably at least 30% by weight.

丙烯酸酯低聚物之重量平均分子量較佳為1000以上,更佳為1500以上,進而較佳為2000以上。該分子量較佳為30000以下,更佳為10000以下,進而較佳為8000以下。此種丙烯酸酯低聚物之分子量範圍對於確保黏著劑層20之接著力及接著保持力而言較佳。The weight average molecular weight of the acrylate oligomer is preferably at least 1,000, more preferably at least 1,500, and still more preferably at least 2,000. The molecular weight is preferably at most 30000, more preferably at most 10000, still more preferably at most 8000. The molecular weight range of the acrylate oligomer is preferable to ensure the adhesion and adhesion of the adhesive layer 20 .

丙烯酸酯低聚物係藉由使該丙烯酸酯低聚物之單體成分進行聚合而獲得。聚合方法例如可例舉溶液聚合、活性能量線聚合(例如紫外線聚合)、塊狀聚合、及乳化聚合。於丙烯酸酯低聚物之聚合中,亦可使用聚合起始劑,或者亦可使用鏈轉移劑以進行分子量之調整。The acrylate oligomer is obtained by polymerizing the monomer components of the acrylate oligomer. The polymerization method may, for example, be solution polymerization, active energy ray polymerization (such as ultraviolet polymerization), bulk polymerization, or emulsion polymerization. In the polymerization of the acrylate oligomer, a polymerization initiator can also be used, or a chain transfer agent can also be used to adjust the molecular weight.

為了充分提高黏著劑層20之接著力,黏著劑層20中之丙烯酸酯低聚物之含量相對於基礎聚合物100質量份較佳為0.5質量份以上,更佳為0.8質量份以上,進而較佳為1質量份以上。另一方面,就確保黏著劑層20之透明性之觀點而言,黏著劑層20中之丙烯酸酯低聚物之含量相對於基礎聚合物100質量份較佳為5質量份以下,更佳為4質量份以下,進而較佳為3質量份以下。於黏著劑層20中丙烯酸酯低聚物之含量過大之情形時,有如下傾向,即,因該丙烯酸酯低聚物之相溶性降低而霧度上升,透明性降低。In order to fully improve the adhesion of the adhesive layer 20, the content of the acrylate oligomer in the adhesive layer 20 is preferably at least 0.5 parts by mass, more preferably at least 0.8 parts by mass, and even more preferably 100 parts by mass of the base polymer. Preferably, it is at least 1 part by mass. On the other hand, from the viewpoint of ensuring the transparency of the adhesive layer 20, the content of the acrylate oligomer in the adhesive layer 20 is preferably 5 parts by mass or less with respect to 100 parts by mass of the base polymer, more preferably 5 parts by mass or less. 4 parts by mass or less, more preferably 3 parts by mass or less. When the content of the acrylate oligomer in the pressure-sensitive adhesive layer 20 is too large, the haze tends to increase due to the decrease in compatibility of the acrylate oligomer, and the transparency tends to decrease.

第1黏著劑組合物亦可含有矽烷偶合劑。第1黏著劑組合物中之矽烷偶合劑之含量相對於基礎聚合物100質量份較佳為0.1質量份以上,更佳為0.2質量份以上。該含量較佳為5質量份以下,更佳為3質量份以下。The first adhesive composition may also contain a silane coupling agent. The content of the silane coupling agent in the first adhesive composition is preferably at least 0.1 parts by mass, more preferably at least 0.2 parts by mass, based on 100 parts by mass of the base polymer. The content is preferably at most 5 parts by mass, more preferably at most 3 parts by mass.

第1黏著劑組合物亦可視需要含有其他成分。其他成分例如可例舉黏著賦予劑、塑化劑、軟化劑、抗劣化劑、填充劑、著色劑、紫外線吸收劑、抗氧化劑、界面活性劑、及抗靜電劑。The 1st adhesive composition may contain other components as needed. Other components include, for example, an adhesion imparting agent, a plasticizer, a softener, an anti-deterioration agent, a filler, a colorant, an ultraviolet absorber, an antioxidant, a surfactant, and an antistatic agent.

就確保對被接著體之充分之黏著性之觀點而言,黏著劑層20之厚度H較佳為10 μm以上,更佳為15 μm以上。就操作性之觀點而言,厚度H較佳為300 μm以下,更佳為200 μm以下,進而較佳為100 μm以下,尤佳為50 μm以下。From the viewpoint of ensuring sufficient adhesiveness to the adherend, the thickness H of the adhesive layer 20 is preferably 10 μm or more, more preferably 15 μm or more. From the viewpoint of handleability, the thickness H is preferably at most 300 μm, more preferably at most 200 μm, still more preferably at most 100 μm, and most preferably at most 50 μm.

上述第1退避長度d1相對於厚度H之比率(d1/H)較佳為0.4以上,更佳為0.6以上。比率(d1/H)較佳為8以下,更佳為6以下。該等構成適於在輕剝離膜40之剝離開始過程中,於自黏著劑層20之端緣22將輕剝離膜40拉離之前,充分地捲起輕剝離膜40之端部(上述自由部分40a)而使其變形,因此,可較佳地用於減小輕剝離膜40之剝離開始所需之力。The ratio (d1/H) of the first relief length d1 to the thickness H is preferably at least 0.4, more preferably at least 0.6. The ratio (d1/H) is preferably 8 or less, more preferably 6 or less. These configurations are suitable for fully rolling up the end portion of the easy release film 40 (the above-mentioned free portion) before pulling the easy release film 40 away from the end edge 22 of the adhesive layer 20 during the peeling start of the easy release film 40. 40a) to deform it, and therefore, can preferably be used to reduce the force required for the peeling initiation of the light release film 40 .

黏著劑層20之霧度較佳為3%以下,更佳為2%以下,更佳為1%以下。黏著劑層20之霧度可依據JIS K7136(2000年),使用霧度計進行測定。霧度計例如可例舉日本電色工業公司製造之「NDH2000」、及村上色彩技術研究所製造之「HM-150型」。The haze of the adhesive layer 20 is preferably 3% or less, more preferably 2% or less, more preferably 1% or less. The haze of the adhesive layer 20 can be measured using a haze meter according to JIS K7136 (2000). Examples of the haze meter include "NDH2000" manufactured by Nippon Denshoku Industries Co., Ltd. and "HM-150" manufactured by Murakami Color Technology Laboratory.

黏著劑層20之全光線透過率較佳為60%以上,更佳為80%以上,進而較佳為85%以上。黏著劑層20之全光線透過率例如為100%以下。黏著劑層20之全光線透過率可依據JIS K 7375(2008年)進行測定。The total light transmittance of the adhesive layer 20 is preferably at least 60%, more preferably at least 80%, and still more preferably at least 85%. The total light transmittance of the adhesive layer 20 is, for example, 100% or less. The total light transmittance of the adhesive layer 20 can be measured according to JIS K 7375 (2008).

黏著劑層30係由第2黏著劑組合物所形成之壓敏接著劑層。黏著劑層30具有透明性。第2黏著劑組合物至少含有基礎聚合物。第2黏著劑組合物所含有之基礎聚合物例如可例舉上文關於第1黏著劑組合物所記載之基礎聚合物。第1黏著劑組合物中之基礎聚合物與第2黏著劑組合物中之基礎聚合物可相同亦可不同。第2黏著劑組合物亦可含有除基礎聚合物以外之成分。第2黏著劑組合物所含有之該成分例如可例舉上文關於第1黏著劑組合物所記載之除基礎聚合物以外之成分。第1黏著劑組合物之組成與第2黏著劑組合物之組成可相同亦可不同。就調整上述剝離開始力F1、F2及剝離力f1、f2之觀點而言,較佳為第1黏著劑組合物之組成與第2黏著劑組合物之組成不同。The adhesive layer 30 is a pressure-sensitive adhesive layer formed from the second adhesive composition. The adhesive layer 30 has transparency. The second adhesive composition contains at least a base polymer. The base polymer contained in the second adhesive composition may, for example, be the base polymer described above regarding the first adhesive composition. The base polymer in the first adhesive composition and the base polymer in the second adhesive composition may be the same or different. The second adhesive composition may contain components other than the base polymer. The components contained in the second adhesive composition include, for example, the components other than the base polymer described above about the first adhesive composition. The composition of the first adhesive composition and the composition of the second adhesive composition may be the same or different. From the viewpoint of adjusting the above-mentioned peeling initiation forces F1, F2 and peeling forces f1, f2, it is preferable that the composition of the first adhesive composition is different from the composition of the second adhesive composition.

黏著劑層30之厚度可與黏著劑層20之厚度相同,亦可不同。就確保對被接著體之充分之黏著性之觀點而言,黏著劑層30之厚度較佳為10 μm以上,更佳為15 μm以上。就操作性之觀點而言,黏著劑層30之厚度較佳為300 μm以下,更佳為200 μm以下,進而較佳為100 μm以下,尤佳為50 μm以下。又,黏著劑層30之厚度相對於黏著劑層20之厚度之比率例如為0.2以上,又,例如為5以下。The thickness of the adhesive layer 30 may be the same as that of the adhesive layer 20 or different. From the viewpoint of ensuring sufficient adhesiveness to the adherend, the thickness of the adhesive layer 30 is preferably 10 μm or more, more preferably 15 μm or more. From the viewpoint of handleability, the thickness of the adhesive layer 30 is preferably 300 μm or less, more preferably 200 μm or less, further preferably 100 μm or less, especially preferably 50 μm or less. Moreover, the ratio of the thickness of the adhesive layer 30 to the thickness of the adhesive layer 20 is 0.2 or more, for example, and 5 or less, for example.

黏著劑層30之霧度較佳為3%以下,更佳為2%以下,進而較佳為1%以下。黏著劑層30之霧度可依據JIS K7136(2000年),使用霧度計進行測定。The haze of the adhesive layer 30 is preferably 3% or less, more preferably 2% or less, and still more preferably 1% or less. The haze of the adhesive layer 30 can be measured using a haze meter according to JIS K7136 (2000).

黏著劑層30之全光線透過率較佳為60%以上,更佳為80%以上,進而較佳為85%以上。黏著劑層30之全光線透過率例如為100%以下。黏著劑層30之全光線透過率可依據JIS K 7375(2008年)進行測定。The total light transmittance of the adhesive layer 30 is preferably at least 60%, more preferably at least 80%, and still more preferably at least 85%. The total light transmittance of the adhesive layer 30 is, for example, 100% or less. The total light transmittance of the adhesive layer 30 can be measured according to JIS K 7375 (2008).

輕剝離膜40例如可例舉具有可撓性之塑膠膜。該塑膠膜例如可例舉聚對苯二甲酸乙二酯膜、聚乙烯膜、聚丙烯膜、及聚酯膜。輕剝離膜40之厚度較佳為5 μm以上,更佳為10 μm以上,又,較佳為200 μm以下,更佳為150 μm以下。輕剝離膜40之表面較佳為經剝離處理。剝離處理例如可例舉矽酮剝離處理及氟剝離處理(後述剝離處理亦同)。可藉由剝離處理之有無、種類之選擇、及條件之調整,對與輕剝離膜40自黏著劑層20之剝離相關之上述第1剝離開始力F1及剝離力f1進行調整。The light release film 40 can be, for example, a flexible plastic film. The plastic film may, for example, be a polyethylene terephthalate film, a polyethylene film, a polypropylene film, or a polyester film. The thickness of the light release film 40 is preferably at least 5 μm, more preferably at least 10 μm, and is preferably at most 200 μm, more preferably at most 150 μm. The surface of the light release film 40 is preferably peeled off. The peeling treatment may, for example, be a silicone peeling treatment or a fluorine peeling treatment (the same applies to the peeling treatment described later). The above-mentioned first peeling initiation force F1 and peeling force f1 related to the peeling of the light peeling film 40 from the adhesive layer 20 can be adjusted by the presence or absence of peeling treatment, selection of the type, and adjustment of conditions.

重剝離膜50例如可例舉上文關於輕剝離膜40所記載之塑膠膜。重剝離膜50之厚度較佳為5 μm以上,更佳為10 μm以上,又,較佳為200 μm以下,更佳為150 μm以下。重剝離膜50之表面較佳為經剝離處理。可藉由剝離處理之有無、種類之選擇、及條件之調整,對與重剝離膜50自黏著劑層30之剝離相關之上述第2剝離開始力F2及剝離力f2進行調整。The heavy release film 50 can, for example, be the plastic film described above with respect to the light release film 40 . The thickness of the heavy release film 50 is preferably at least 5 μm, more preferably at least 10 μm, and is preferably at most 200 μm, more preferably at most 150 μm. The surface of the heavy peeling film 50 is preferably peeled off. The above-mentioned second peeling start force F2 and peeling force f2 related to the peeling of the heavy peeling film 50 from the adhesive layer 30 can be adjusted by the presence or absence of peeling treatment, selection of the type, and adjustment of conditions.

光學膜X例如可以如下方式製造。The optical film X can be manufactured as follows, for example.

首先,準備光學膜10、附有輕剝離膜40之黏著劑層20、及附有重剝離膜50之黏著劑層30(準備步驟)。First, the optical film 10 , the adhesive layer 20 with the light release film 40 , and the adhesive layer 30 with the heavy release film 50 are prepared (preparatory step).

附有輕剝離膜40之黏著劑層20可藉由如下方式形成,即,於輕剝離膜40上塗佈第1黏著劑組合物(清漆)而形成塗膜,隨後使該塗膜乾燥。第1黏著劑組合物之塗佈方法例如可例舉:輥式塗佈、接觸輥式塗佈、凹版塗佈、反向塗佈、輥式刷塗、噴塗、浸漬輥式塗佈、棒式塗佈、刮塗、氣刀塗佈、淋幕式塗佈、模唇塗佈、及模嘴塗佈(第2黏著劑組合物之後述塗佈之方法亦同)。亦可於輕剝離膜40上之黏著劑層20上進而積層其他剝離膜。該剝離膜係於光學膜10與黏著劑層20之貼合前剝離。The adhesive layer 20 with the light release film 40 can be formed by coating the first adhesive composition (varnish) on the light release film 40 to form a coating film, and then drying the coating film. The coating method of the first adhesive composition is, for example, roll coating, touch roll coating, gravure coating, reverse coating, roll brush coating, spray coating, dip roll coating, rod coating, etc. Coating, blade coating, air knife coating, curtain coating, die lip coating, and die coating (the method of coating the second adhesive composition described later is also the same). It is also possible to laminate other release films on the adhesive layer 20 on the light release film 40 . The peeling film is peeled before the bonding of the optical film 10 and the adhesive layer 20 .

附有重剝離膜50之黏著劑層30可藉由如下方式形成,即,於重剝離膜50上塗佈第2黏著劑組合物(清漆)而形成塗膜,隨後使該塗膜乾燥。亦可於重剝離膜50上之黏著劑層30上進而積層其他剝離膜。該剝離膜係於光學膜10與黏著劑層30之貼合前剝離。The adhesive layer 30 with the heavy release film 50 can be formed by coating the second adhesive composition (varnish) on the heavy release film 50 to form a coating film, and then drying the coating film. It is also possible to laminate other release films on the adhesive layer 30 on the heavy release film 50 . The peeling film is peeled before the bonding of the optical film 10 and the adhesive layer 30 .

其次,將光學膜10之第1面11與附有輕剝離膜40之黏著劑層20之黏著劑層20側貼合(第1貼合步驟)。其次,將光學膜10之第2面12與附有重剝離膜50之黏著劑層30之黏著劑層30側貼合(第2貼合步驟)。藉此,獲得外周端未加工之作為光學膜X之積層體。較佳為,於該等貼合之前對光學膜10之第1面11及第2面12、附有輕剝離膜40之黏著劑層20之露出面、及附有重剝離膜50之黏著劑層30之露出面進行電漿處理。Next, the first surface 11 of the optical film 10 is bonded to the adhesive layer 20 side of the adhesive layer 20 with the light release film 40 (first bonding step). Next, the second surface 12 of the optical film 10 is bonded to the adhesive layer 30 side of the adhesive layer 30 with the heavy release film 50 (second bonding step). Thereby, the laminated body which is the optical film X with the outer peripheral end unprocessed was obtained. Preferably, the first surface 11 and the second surface 12 of the optical film 10, the exposed surface of the adhesive layer 20 with the light release film 40, and the adhesive with the heavy release film 50 are The exposed surface of layer 30 is plasma treated.

其次,藉由進行夾持之夾具於厚度方向保持積層體,並以各黏著劑層20、30發生彈性變形而自積層體之側端面伸出至特定程度之方式對夾具於厚度方向對積層體賦予之加壓力進行調整(加壓保持步驟)。藉由調整加壓力,可調整黏著劑層20、30之彈性變形之程度,因此,可調整自積層體側端面伸出之長度。Next, the laminated body is held in the thickness direction by the jig for clamping, and the laminated body is aligned with the jig in the thickness direction in such a way that each adhesive layer 20, 30 elastically deforms and protrudes from the side end surface of the laminated body to a certain extent. The applied pressure is adjusted (pressurized holding step). By adjusting the pressure, the degree of elastic deformation of the adhesive layer 20, 30 can be adjusted, therefore, the length protruding from the side end surface of the laminate can be adjusted.

其次,於黏著劑層20、30以自積層體側端面伸出之方式發生彈性變形之狀態下,藉由旋轉刀於距積層體側端面特定長度之內側處於厚度方向上予以切斷,以重新形成該積層體之外周端之全部或一部分(切斷步驟)。上述特定長度例如為0.1 mm以上,又,例如為1 mm以下。隨後,解除夾具所形成之積層體之加壓狀態。藉此,黏著劑層20、30發生彈性恢復,黏著劑層20、30之端緣22、32於面內方向D上較光學膜10、輕剝離膜40、及重剝離膜50之端緣13、42、52朝內側退避。以此方式形成側面凹凸端部E。Next, in the state where the adhesive layer 20, 30 is elastically deformed in such a way that it protrudes from the side end surface of the laminate, it is cut in the thickness direction by a rotary knife on the inner side of a certain length from the side end surface of the laminate, so as to re- All or part of the outer periphery of the laminate is formed (cutting step). The above-mentioned specific length is, for example, 0.1 mm or more, and, for example, 1 mm or less. Then, the pressurized state of the laminate formed by the jig is released. Thereby, the adhesive layer 20, 30 undergoes elastic recovery, and the edge 22, 32 of the adhesive layer 20, 30 is in the in-plane direction D than the edge 13 of the optical film 10, the light release film 40, and the heavy release film 50. , 42, 52 backed away towards the inside. In this way, the side concave-convex end portion E is formed.

於此種切斷步驟中,藉由調整於厚度方向對積層體所賦予之上述加壓力,可調整黏著劑層20、30自積層體之側端面伸出之長度,可調整解除加壓狀態後之端緣22、32之退避長度d1、d2。又,如上所述,第1退避長度d1之調整方法亦可例舉黏著劑層20之厚度之調整及彈性模數之調整。如上所述,第2退避長度d2之調整方法亦可例舉黏著劑層30之厚度之調整及彈性模數之調整。又,如上所述,面內方向D上之端緣22、32間之距離(即,第1退避長度d1與第2退避長度d2之差)之調整方法可例舉為了形成側面凹凸端部E而使用旋轉刀所實施之後述切斷步驟中之切斷條件之調整。該切斷條件例如可例舉旋轉刀之刀尖之錐角、旋轉刀之轉速、後述旋轉刀相對於光學膜積層體之表面之入射方向、及切削光學膜積層體之旋轉刀之位移速度。In this cutting step, by adjusting the pressure applied to the laminate in the thickness direction, the length of the adhesive layer 20, 30 protruding from the side end surface of the laminate can be adjusted, and the pressure can be adjusted after the pressurized state is released. The back-off lengths d1, d2 of the end edges 22, 32. Moreover, as mentioned above, the adjustment method of the 1st back-off length d1 can also illustrate the adjustment of the thickness of the adhesive layer 20, and the adjustment of elastic modulus. As mentioned above, the adjustment method of the 2nd back-off length d2 can also exemplify the adjustment of the thickness of the adhesive layer 30, and the adjustment of elastic modulus. Also, as mentioned above, the method of adjusting the distance between the edges 22 and 32 in the in-plane direction D (that is, the difference between the first relief length d1 and the second relief length d2) can be exemplified in order to form the concave-convex end portion E of the side surface. The adjustment of cutting conditions in the cutting step described later is carried out using a rotary knife. The cutting conditions include, for example, the taper angle of the blade tip of the rotary blade, the rotational speed of the rotary blade, the incident direction of the rotary blade relative to the surface of the optical film laminate described later, and the displacement speed of the rotary blade for cutting the optical film laminate.

以上述方式可製造上述光學膜X(附有剝離膜之光學膜)。The above-mentioned optical film X (optical film with release film) can be manufactured in the above-mentioned manner.

於上述準備步驟中,亦可使用第1步驟用剝離膜來代替輕剝離膜40而準備附有第1步驟用剝離膜之黏著劑層20,亦可使用第2步驟用剝離膜來代替重剝離膜50而準備附有第2步驟用剝離膜之黏著劑層30。於此情形時,於上述第1貼合步驟中,將光學膜10之第1面11與附有第1步驟用剝離膜之黏著劑層20之黏著劑層20側貼合。又,於第2貼合步驟中,將光學膜10之第2面12與附有第2步驟用剝離膜之黏著劑層30之黏著劑層30側貼合(於貼合前,較佳為實施上述電漿處理)。藉此,獲得於厚度方向依序具備第1步驟用剝離膜、黏著劑層20、光學膜10、黏著劑層30、及第2步驟用剝離膜之積層體。繼而,於該積層體中,於將第1步驟用剝離膜自黏著劑層20後,將輕剝離膜40貼合於黏著劑層20之露出面,於將第2步驟用剝離膜自黏著劑層30剝離後,將重剝離膜50貼合於黏著劑層30之露出面。以上述方式亦可獲得外周端未加工之作為光學膜X之積層體。此後,可對該積層體實施上述加壓保持步驟及切斷步驟,藉此製造光學膜X(附有剝離膜之光學膜)。In the above preparation steps, the release film for the first step can also be used instead of the light release film 40 to prepare the adhesive layer 20 with the release film for the first step, and the release film for the second step can also be used instead of the heavy release film. The film 50 is used to prepare the adhesive layer 30 with the release film for the second step. In this case, in the above-mentioned first bonding step, the first surface 11 of the optical film 10 is bonded to the adhesive layer 20 side of the adhesive layer 20 with the release film for the first step. Also, in the second bonding step, the second surface 12 of the optical film 10 is bonded to the adhesive layer 30 side of the adhesive layer 30 with a release film for the second step (before bonding, preferably implementation of the plasma treatment described above). Thereby, the laminated body provided with the release film for 1st process, the adhesive layer 20, the optical film 10, the adhesive layer 30, and the release film for 2nd process in this order in the thickness direction is obtained. Next, in this laminated body, after the release film is used in the first step to self-adhesive layer 20, the light release film 40 is attached to the exposed surface of the adhesive layer 20, and after the release film is used in the second step to self-adhesive After the layer 30 is peeled off, the heavy release film 50 is pasted on the exposed surface of the adhesive layer 30 . A laminated body as the optical film X can also be obtained with the outer peripheral edge unprocessed in the above manner. Thereafter, the above-mentioned pressure holding step and cutting step can be performed on the laminated body, whereby the optical film X (optical film with release film) can be produced.

於光學膜X之製造過程中,亦可於第1貼合步驟中,將附有第1步驟用剝離膜之黏著劑層20貼合於光學膜10之第1面11,並且於第2貼合步驟中,將附有重剝離膜50之黏著劑層30貼合於光學膜10之第2面12(於貼合前,較佳為實施上述電漿處理)。藉此,獲得於厚度方向具備第1步驟用剝離膜、黏著劑層20、光學膜10、黏著劑層30、及重剝離膜50之積層體。繼而,於該積層體中,於將第1步驟用剝離膜自黏著劑層20剝離之後,將輕剝離膜40貼合於黏著劑層20之露出面。以上述方式亦可獲得外周端未加工之作為光學膜X之積層體。此後,可對該積層體實施上述加壓保持步驟及切斷步驟,藉此製造光學膜X(附有剝離膜之光學膜)。In the manufacturing process of the optical film X, in the first bonding step, the adhesive layer 20 with the release film for the first step can be bonded to the first surface 11 of the optical film 10, and can be bonded in the second bonding step. In the bonding step, the adhesive layer 30 with the heavy release film 50 is bonded to the second surface 12 of the optical film 10 (before bonding, the above-mentioned plasma treatment is preferably performed). Thereby, the laminated body provided with the release film for 1st process, the adhesive layer 20, the optical film 10, the adhesive layer 30, and the heavy release film 50 in the thickness direction is obtained. Next, in this laminated body, after peeling the release film for the first step from the adhesive layer 20 , the light release film 40 is bonded to the exposed surface of the adhesive layer 20 . A laminated body as the optical film X can also be obtained with the outer peripheral edge unprocessed in the above manner. Thereafter, the above-mentioned pressure holding step and cutting step can be performed on the laminated body, whereby the optical film X (optical film with release film) can be produced.

於光學膜X之製造過程中,亦可於第1貼合步驟中,將附有輕剝離膜40之黏著劑層20貼合於光學膜10之第1面11,並且於第2貼合步驟中,將附有第2步驟用剝離膜之黏著劑層30貼合於光學膜10之第2面12(於貼合前,較佳為實施上述電漿處理)。藉此,獲得於厚度方向依序具備輕剝離膜40、黏著劑層20、光學膜10、黏著劑層30、及第2步驟用剝離膜之積層體。繼而,於該積層體中,於將第2步驟用剝離膜自黏著劑層30剝離之後,將重剝離膜50貼合於黏著劑層30之露出面。以上述方式亦可獲得外周端未加工之作為光學膜X之積層體。此後,可對該積層體實施上述加壓保持步驟及切斷步驟,藉此製造光學膜X(附有剝離膜之光學膜)。In the manufacturing process of the optical film X, in the first bonding step, the adhesive layer 20 with the light release film 40 can be bonded to the first surface 11 of the optical film 10, and in the second bonding step In this process, the adhesive layer 30 with the release film for the second step is bonded to the second surface 12 of the optical film 10 (before bonding, it is preferable to perform the above-mentioned plasma treatment). Thereby, the laminated body provided with the light release film 40, the adhesive layer 20, the optical film 10, the adhesive layer 30, and the release film for 2nd steps in this order in the thickness direction is obtained. Next, in this laminated body, after peeling off the release film for the 2nd step from the adhesive layer 30, the heavy release film 50 is bonded to the exposed surface of the adhesive layer 30. A laminated body as the optical film X can also be obtained with the outer peripheral edge unprocessed in the above manner. Thereafter, the above-mentioned pressure holding step and cutting step can be performed on the laminated body, whereby the optical film X (optical film with release film) can be produced.

於光學膜X之製造過程中,亦可使用光硬化性黏著劑組合物作為黏著劑組合物來形成黏著劑層20、30。光硬化性黏著劑組合物例如可例舉接受紫外線照射而進行含單體成分之聚合反應之紫外線硬化型黏著劑組合物。例如,於將光硬化性黏著劑組合物用作第2黏著劑組合物之情形時,首先,於第2步驟用剝離膜上塗佈該第2黏著劑組合物而形成塗膜。其次,於第2步驟用剝離膜上之塗膜上積層重剝離膜50。其次,藉由對剝離膜間之塗膜照射特定波長之光(紫外線等)而使該塗膜光硬化。藉此,於剝離膜間形成黏著劑層30。其次,自重剝離膜50上之黏著劑層30剝離第2步驟用剝離膜。亦可使用以此方式獲得之附有重剝離膜50之黏著劑層30實施上述第2貼合步驟。In the manufacturing process of the optical film X, a photocurable adhesive composition may also be used as the adhesive composition to form the adhesive layers 20 and 30 . The photocurable adhesive composition may, for example, be an ultraviolet curable adhesive composition that undergoes polymerization reaction of a monomer component by being irradiated with ultraviolet rays. For example, when using a photocurable adhesive composition as a 2nd adhesive composition, first, apply this 2nd adhesive composition on the peeling film for 2nd steps, and form a coating film. Next, a heavy release film 50 is laminated on the coating film on the release film for the second step. Next, the coating film is photocured by irradiating light of a specific wavelength (ultraviolet rays, etc.) to the coating film between release films. Thereby, the adhesive layer 30 is formed between the release films. Next, the adhesive layer 30 on the peeling film 50 by its own weight is peeled off from the second-step peeling film. The adhesive layer 30 with the heavy release film 50 obtained in this way can also be used to carry out the above-mentioned second bonding step.

圖3A至圖3D表示光學膜X之使用方法之一例。An example of the usage method of the optical film X is shown in FIG. 3A to FIG. 3D.

於本方法中,首先,如圖3A所示,自光學膜X之黏著劑層20剝離輕剝離膜40。例如,於將光學膜X之重剝離膜50側固定於工作台上之狀態下,使力作用於側面凹凸端部E中之輕剝離膜40之端部而自黏著劑層20剝離輕剝離膜40。藉此,露出黏著劑層20之黏著面21。In this method, first, as shown in FIG. 3A , the light release film 40 is peeled off from the pressure-sensitive adhesive layer 20 of the optical film X. For example, in the state where the heavy release film 50 side of the optical film X is fixed on the table, a force is applied to the end of the light release film 40 in the side concave-convex end portion E to peel the light release film from the adhesive layer 20. 40. Thereby, the adhesive surface 21 of the adhesive layer 20 is exposed.

如上所述,於側面凹凸端部E中,於面內方向D上,黏著劑層20之端緣22較光學膜10、輕剝離膜40、及重剝離膜50之端緣13、42、52退避。如參照圖2於上文所敍述般,於此種側面凹凸端部E中,輕剝離膜40具有未貼合黏著劑層20之自由部分40a。因此,於側面凹凸端部E中,自黏著劑層20剝離輕剝離膜40時,首先,可如圖2中以假想線所示般捲起輕剝離膜40之自由部分40a而使其變形,隨後拉伸已捲起變形之自由部分40a而將輕剝離膜40自黏著劑層20之端緣22拉離。即,於剝離開始過程中,無需同時施加用以使輕剝離膜40之自由部分40a充分地變形之力(第1力)、及用以自追隨輕剝離膜40之變形而發生彈性變形之黏著劑層20之端緣22將輕剝離膜40拉離之力(第2力)。此種光學膜X適於減小剝離開始過程所需之力。該力越小,越可於輕剝離膜40之剝離開始過程中,抑制厚度薄至100 μm以下之光學膜10之變形,從而亦抑制黏著劑層30之變形,因此,可抑制黏著劑層30之端緣32自重剝離膜50分離。As described above, in the in-plane direction D in the concave-convex end portion E, the edge 22 of the adhesive layer 20 is smaller than the edges 13, 42, 52 of the optical film 10, the light release film 40, and the heavy release film 50. retreat. As described above with reference to FIG. 2 , in such a side concave-convex end portion E, the light release film 40 has a free portion 40 a to which the adhesive layer 20 is not bonded. Therefore, when peeling the light release film 40 from the adhesive layer 20 at the side uneven end part E, first, the free part 40a of the light release film 40 can be deformed by rolling up as shown by phantom lines in FIG. Then stretch the rolled and deformed free portion 40 a to pull the light release film 40 away from the end edge 22 of the adhesive layer 20 . That is, in the process of starting the peeling, it is not necessary to simultaneously apply a force (first force) for sufficiently deforming the free portion 40a of the light release film 40 and an adhesive force for elastically deforming the light release film 40 following the deformation. The edge 22 of the agent layer 20 pulls the light release film 40 away (the second force). Such an optical film X is suitable for reducing the force required for the peel initiation process. The smaller the force, the more it is possible to suppress the deformation of the optical film 10 whose thickness is as thin as 100 μm or less in the process of starting the peeling of the light release film 40, thereby also suppressing the deformation of the adhesive layer 30. Therefore, the adhesive layer 30 can be suppressed. The end edge 32 is separated from the weight release film 50 .

又,如圖2所示,於側面凹凸端部E中,第1退避長度d1較第2退避長度d2小。即,於側面凹凸端部E中,於面內方向D上,黏著劑層30之端緣32較黏著劑層20之端緣22退避。此種構成適於在輕剝離膜40之剝離開始過程中,於用以自黏著劑層20之端緣22將輕剝離膜40拉離之上述第2力作用於光學膜X時,抑制黏著劑層30之變形,因此,適於抑制黏著劑層30之端緣32自重剝離膜50分離。In addition, as shown in FIG. 2 , in the side concave-convex end portion E, the first relief length d1 is smaller than the second relief length d2. That is, the edge 32 of the adhesive layer 30 is receded from the edge 22 of the adhesive layer 20 in the in-plane direction D in the concave-convex end portion E of the side surface. This configuration is suitable for suppressing the adhesive when the above-mentioned second force for pulling the easy-release film 40 away from the edge 22 of the adhesive layer 20 acts on the optical film X in the process of starting the peeling of the easy-release film 40 . Deformation of layer 30 is, therefore, adapted to inhibit separation of edge 32 of adhesive layer 30 from weight release film 50 .

其次,如圖3B所示,經由黏著劑層20將光學膜10與第1構件M1(第1被接著體)接合。第1構件M1例如為軟性面板所具有之積層構造中之一要素。該要素例如可例舉像素面板、觸控面板、及透明覆蓋膜(後述第2構件M2亦同)。Next, as shown in FIG. 3B , the optical film 10 and the first member M1 (first adherend) are bonded via the adhesive layer 20 . The first member M1 is, for example, one element of the laminated structure of the flexible panel. This element may, for example, be a pixel panel, a touch panel, or a transparent cover film (the same applies to the second member M2 described later).

其次,如圖3C所示,自黏著劑層30剝離重剝離膜50。藉此,露出黏著劑層30之黏著面31。Next, as shown in FIG. 3C , the heavy release film 50 is peeled off from the adhesive layer 30 . Thereby, the adhesive surface 31 of the adhesive layer 30 is exposed.

其次,如圖3D所示,經由黏著劑層30將光學膜10與第2構件M2(第2被接著體)接合。Next, as shown in FIG. 3D , the optical film 10 and the second member M2 (second adherend) are bonded via the adhesive layer 30 .

於例如軟性面板之製造過程中,以上述方式使用光學膜X。 [實施例] In the manufacturing process of, for example, a flexible panel, the optical film X is used in the above-mentioned manner. [Example]

以下,示出實施例而對本發明進行具體說明。本發明並不限定於實施例。又,以下所記載之調配量(含量)、物性值、參數等之具體數值可以上述「實施方式」中所記載的與其等對應之調配量(含量)、物性值、參數等之上限(定義為「以下」或「未達」之數值)或下限(定義為「以上」或「超過」之數值)代替。Hereinafter, an Example is shown and this invention is demonstrated concretely. This invention is not limited to an Example. In addition, the specific numerical values of the blending amount (content), physical property values, parameters, etc. described below may be the upper limit of the blending amount (content), physical property values, parameters, etc. corresponding to the above-mentioned "embodiment" (defined as "below" or "under" value) or lower limit (defined as "above" or "over" value) instead.

[實施例1] <第1黏著片之製作> 以下述方式製作實施例1中之第1黏著片。 [Example 1] <Production of the first adhesive sheet> The 1st adhesive sheet in Example 1 was produced in the following manner.

<丙烯酸酯低聚物之製備> 於具備攪拌機、溫度計、回流冷凝器、及氮氣導入管之反應容器內,將包含甲基丙烯酸環己酯(CHMA)95質量份、丙烯酸(AA)5質量份、作為鏈轉移劑之α-甲基苯乙烯二聚物10質量份、及作為溶劑之甲苯120質量份之混合物於室溫、氮氣氛圍下攪拌1小時。隨後,向混合物中添加作為熱聚合起始劑之2,2'-偶氮二異丁腈(AIBN)10質量份而製備反應溶液,並於氮氣氛圍下於85℃進行5小時之反應(丙烯酸酯低聚物之形成)。藉此,獲得含有丙烯酸酯低聚物之低聚物溶液(固形物成分濃度50質量%)。丙烯酸酯低聚物之重量平均分子量為4300。又,丙烯酸酯低聚物之玻璃轉移溫度(Tg)為84℃。 <Preparation of acrylate oligomer> In a reaction vessel equipped with a stirrer, a thermometer, a reflux condenser, and a nitrogen gas introduction tube, 95 parts by mass of cyclohexyl methacrylate (CHMA), 5 parts by mass of acrylic acid (AA), and α-methanol as a chain transfer agent A mixture of 10 parts by mass of styrene dimer and 120 parts by mass of toluene as a solvent was stirred at room temperature under a nitrogen atmosphere for 1 hour. Subsequently, 10 parts by mass of 2,2'-azobisisobutyronitrile (AIBN) was added to the mixture as a thermal polymerization initiator to prepare a reaction solution, and the reaction was carried out at 85° C. for 5 hours under a nitrogen atmosphere (acrylic acid formation of ester oligomers). Thereby, the oligomer solution (50 mass % of solid content concentration) containing an acrylate oligomer was obtained. The weight average molecular weight of the acrylate oligomer was 4300. Moreover, the glass transition temperature (Tg) of an acrylate oligomer was 84 degreeC.

<第1丙烯酸基礎聚合物之製備> 於具備攪拌機、溫度計、回流冷凝器、及氮氣導入管之反應容器內,將包含丙烯酸2-乙基己酯(2EHA)70質量份、丙烯酸正丁酯(BA)20質量份、丙烯酸月桂酯(LA)8質量份、丙烯酸4-羥基丁酯(4HBA)1質量份、N-乙烯基-2-吡咯啶酮(NVP)0.6質量份、作為熱聚合起始劑之2,2'-偶氮二異丁腈(AIBN)0.1質量份、及作為溶劑之乙酸乙酯之混合物(固形物成分濃度47質量%)於56℃、氮氣氛圍下攪拌6小時(聚合反應)。藉此,獲得含有第1丙烯酸基礎聚合物之第1聚合物溶液。該聚合物溶液中之第1丙烯酸基礎聚合物之重量平均分子量約為200萬。 <Preparation of the first acrylic base polymer> In a reaction vessel equipped with a stirrer, a thermometer, a reflux condenser, and a nitrogen inlet tube, 70 parts by mass of 2-ethylhexyl acrylate (2EHA), 20 parts by mass of n-butyl acrylate (BA), 20 parts by mass of n-butyl acrylate, lauryl acrylate ( LA) 8 parts by mass, 4-hydroxybutyl acrylate (4HBA) 1 part by mass, N-vinyl-2-pyrrolidone (NVP) 0.6 parts by mass, 2,2'-azo as a thermal polymerization initiator A mixture (solid content concentration: 47% by mass) of 0.1 parts by mass of diisobutyronitrile (AIBN) and ethyl acetate as a solvent was stirred at 56° C. under a nitrogen atmosphere for 6 hours (polymerization reaction). Thereby, the 1st polymer solution containing the 1st acrylic base polymer was obtained. The weight average molecular weight of the first acrylic base polymer in the polymer solution was about 2 million.

<第1黏著劑組合物之製備> 向第1聚合物溶液中,相對於該聚合物溶液之固形物成分100質量份添加丙烯酸酯低聚物1.5質量份、第1交聯劑(產品名「Nyper BMT-40SV」,過氧化二苯甲醯,日本油脂製造)0.26質量份、第2交聯劑(產品名「Coronate L」,三羥甲基丙烷/甲苯二異氰酸酯三聚物加成物,Tosoh製造)0.02質量份、及矽烷偶合劑(產品名「KBM403」,信越化學工業製造)0.3質量份並進行混合,從而製備第1黏著劑組合物。 <Preparation of the first adhesive composition> To the first polymer solution, 1.5 parts by mass of an acrylate oligomer and a first crosslinking agent (product name "Nyper BMT-40SV", diphenyl peroxide formyl, manufactured by NOF) 0.26 parts by mass, a second crosslinking agent (product name "Coronate L", trimethylolpropane/toluene diisocyanate trimer adduct, manufactured by Tosoh) 0.02 parts by mass, and silane diisocyanate A mixture (product name "KBM403", manufactured by Shin-Etsu Chemical Co., Ltd.) was mixed with 0.3 parts by mass to prepare a first adhesive composition.

<第1黏著片之形成> 於單面經矽酮剝離處理之剝離膜L1之剝離處理面上塗佈第1黏著劑組合物而形成塗膜。剝離膜L1為單面經矽酮剝離處理之聚對苯二甲酸乙二酯(PET)膜(產品名「DIAFOIL MRF50」,厚度50 μm,Mitsubishi Chemical製造)。其次,將單面經矽酮剝離處理之剝離膜L2之剝離處理面貼合於剝離膜L1上之塗膜。剝離膜L2為單面經矽酮剝離處理之PET膜(產品名「DIAFOIL MRV75」,厚度75 μm,Mitsubishi Chemical製造)。其次,將夾持於剝離膜L1與剝離膜L2之塗膜以100℃加熱1分鐘,隨後以150℃加熱3分鐘,藉此使塗膜乾燥,形成厚度50 μm之透明之第1黏著劑層所構成之第1黏著片。以上述方式製作附有剝離膜L1、L2之第1黏著片。 <Formation of the first adhesive sheet> The first adhesive composition was applied to the release-treated surface of the release film L1 which had been subjected to a silicone release treatment on one side to form a coating film. The release film L1 is a polyethylene terephthalate (PET) film (product name "DIAFOIL MRF50", thickness 50 μm, manufactured by Mitsubishi Chemical) that has undergone silicone release treatment on one side. Next, the release-treated surface of the release film L2 that has been subjected to silicone release treatment on one side is bonded to the coating film on the release film L1. The release film L2 is a PET film (product name "DIAFOIL MRV75", thickness 75 μm, manufactured by Mitsubishi Chemical) that has undergone silicone release treatment on one side. Next, heat the coating film sandwiched between the release film L1 and the release film L2 at 100°C for 1 minute, and then heat at 150°C for 3 minutes to dry the coating film and form a transparent first adhesive layer with a thickness of 50 μm The first adhesive sheet formed. The 1st adhesive sheet with the peeling film L1, L2 was produced in the above-mentioned manner.

<第2黏著片之製作> 以下述方式製作實施例1中之第2黏著片。 <Production of the second adhesive sheet> The 2nd adhesive sheet in Example 1 was produced in the following manner.

<第2丙烯酸基礎聚合物之製備> 於具備攪拌機、溫度計、回流冷凝器、及氮氣導入管之反應容器內,將包含丙烯酸丁酯(BA)99質量份、丙烯酸4-羥基丁酯(4HBA)1質量份、作為熱聚合起始劑之2,2'-偶氮二異丁腈(AIBN)0.3質量份、及作為溶劑之乙酸乙酯之混合物於60℃、氮氣氛圍下攪拌4小時(聚合反應)。藉此,獲得含有第2丙烯酸基礎聚合物之第2聚合物溶液。該聚合物溶液中之第2丙烯酸基礎聚合物之重量平均分子量為165萬。 <Preparation of the second acrylic base polymer> In a reaction vessel equipped with a stirrer, a thermometer, a reflux condenser, and a nitrogen gas introduction pipe, 99 parts by mass of butyl acrylate (BA), 1 part by mass of 4-hydroxybutyl acrylate (4HBA), as a thermal polymerization initiator A mixture of 0.3 parts by mass of 2,2'-azobisisobutyronitrile (AIBN) and ethyl acetate as a solvent was stirred at 60° C. for 4 hours under a nitrogen atmosphere (polymerization reaction). Thereby, the 2nd polymer solution containing the 2nd acrylic base polymer was obtained. The weight average molecular weight of the second acrylic base polymer in this polymer solution was 1.65 million.

<第2黏著劑組合物之製備> 向第2聚合物溶液中,相對於該聚合物溶液之固形物成分100質量份添加第1交聯劑(產品名「Nyper BMT-40SV」,過氧化二苯甲醯,日本油脂製造)0.3質量份、第3交聯劑(產品名「Takenate D110N」,三羥甲基丙烷苯二甲基二異氰酸酯,三井化學製造)0.1質量份、及矽烷偶合劑(產品名「KBM403」,信越化學工業製造)0.3質量份並進行混合,從而製備第2黏著劑組合物。 <Preparation of the second adhesive composition> To the second polymer solution, 0.3 parts by mass of the first crosslinking agent (product name "Nyper BMT-40SV", dibenzoyl peroxide, manufactured by NOF) was added to 100 parts by mass of the solid content of the polymer solution. Parts, 0.1 parts by mass of the third crosslinking agent (product name "Takenate D110N", trimethylolpropane xylylene diisocyanate, manufactured by Mitsui Chemicals), and a silane coupling agent (product name "KBM403", manufactured by Shin-Etsu Chemical Co., Ltd. ) 0.3 parts by mass and mixed to prepare the second adhesive composition.

<第2黏著片之形成> 於單面經矽酮剝離處理之剝離膜L3之剝離處理面上塗佈第2黏著劑組合物而形成塗膜。剝離膜L3為單面經矽酮剝離處理之聚對苯二甲酸乙二酯(PET)膜(產品名「DIAFOIL MRF50」,厚度50 μm,Mitsubishi Chemical製造)。其次,將單面經矽酮剝離處理之剝離膜L4之剝離處理面貼合於剝離膜L3上之塗膜。剝離膜L4為單面經矽酮剝離處理之PET膜(產品名「DIAFOIL MRV75」,厚度75 μm,Mitsubishi Chemical製造)。其次,將夾持於剝離膜L3與剝離膜L4之塗膜以100℃加熱1分鐘,隨後以150℃加熱3分鐘,藉此使塗膜乾燥,形成厚度50 μm之透明之第2黏著劑層所構成之第2黏著片。以上述方式製作附有剝離膜L3、L4之第2黏著片。 <Formation of the second adhesive sheet> A coating film was formed by applying the second adhesive composition on the release-treated surface of the release film L3 which had been subjected to a silicone release treatment on one side. The release film L3 is a polyethylene terephthalate (PET) film (product name "DIAFOIL MRF50", thickness 50 μm, manufactured by Mitsubishi Chemical) that has undergone silicone release treatment on one side. Next, the release-treated surface of the release film L4 that has been subjected to silicone release treatment on one side is bonded to the coating film on the release film L3. The release film L4 is a PET film (product name "DIAFOIL MRV75", thickness 75 μm, manufactured by Mitsubishi Chemical) with one side treated with silicone release. Next, heat the coating film sandwiched between the release film L3 and the release film L4 at 100°C for 1 minute, and then heat at 150°C for 3 minutes to dry the coating film and form a transparent second adhesive layer with a thickness of 50 μm The second adhesive sheet formed. The 2nd adhesive sheet with the peeling film L3, L4 was produced in the above-mentioned manner.

<附有剝離膜之光學膜之製作> 首先,自兩面附有剝離膜之第1黏著片將剝離膜L2剝離,並對藉此露出之露出面進行電漿處理。另一方面,對厚度31 μm之偏光板之兩面(第1面、第2面)亦進行電漿處理。於各電漿處理中,使用電漿照射裝置(產品名「AP-TO5」,積水工業公司製造),並將電壓設為160 V,頻率設為10 kHz,處理速度設為5000 mm/min(後述電漿處理中亦同)。繼而,將第1黏著片之上述露出面與偏光板之第1面貼合。於該貼合中,於25℃之環境下,藉由使2 kg之輥往返一次之作業對附有剝離膜L1之第1黏著片與偏光板進行壓接。 <Production of optical film with release film> First, the release film L2 is peeled off from the first adhesive sheet with the release film on both sides, and the exposed surface exposed by this is subjected to plasma treatment. On the other hand, plasma treatment was also performed on both surfaces (first surface and second surface) of a polarizing plate with a thickness of 31 μm. In each plasma treatment, a plasma irradiation device (product name "AP-TO5", manufactured by Sekisui Kogyo Co., Ltd.) was used, and the voltage was set to 160 V, the frequency was set to 10 kHz, and the processing speed was set to 5000 mm/min ( The same applies to the plasma treatment described later). Next, the above-mentioned exposed surface of the first adhesive sheet was bonded to the first surface of the polarizing plate. In this lamination, the 1st adhesive sheet with the release film L1 and the polarizing plate were pressure-bonded by the operation which made the 2 kg roller reciprocate once in the environment of 25 degreeC.

其次,自附有剝離膜L3、L4之第2黏著片將剝離膜L3剝離,並對藉此露出之露出面進行電漿處理。繼而,將第2黏著片之露出面與偏光板之第2面貼合。於該貼合中,於25℃之環境下,藉由使2 kg之輥往返一次之作業對附有剝離膜L4之第2黏著片與偏光板進行壓接。藉此,獲得附有剝離膜L1(厚度50 μm)之第1黏著片、偏光板、與附有剝離膜L4(厚度75 μm)之第2黏著片之積層構成之積層膜。Next, the release film L3 is peeled from the second adhesive sheet with the release films L3 and L4, and the exposed surface exposed by this is subjected to plasma treatment. Next, the exposed surface of the second adhesive sheet was bonded to the second surface of the polarizing plate. In this lamination, the 2nd adhesive sheet with the peeling film L4 and the polarizing plate were pressure-bonded by the operation which made the 2 kg roller reciprocate once in the environment of 25 degreeC. Thereby, a laminated film composed of a laminate of the first adhesive sheet with release film L1 (thickness 50 μm), a polarizing plate, and the second adhesive sheet with release film L4 (thickness 75 μm) was obtained.

其次,使用沖裁加工機及Thomson刀將積層膜沖裁成150 mm×120 mm之尺寸(沖裁加工步驟)。Next, the laminated film was punched out into a size of 150 mm×120 mm using a punching machine and a Thomson knife (blanking process step).

其次,以下述方式實施外形加工(外形加工步驟)。首先,堆積沖裁成同一尺寸之50片積層膜而獲得積層體。具體而言,以相鄰之積層膜中一積層膜之剝離膜L1(第1剝離膜)與另一積層膜之剝離膜L4(第2剝離膜)相接之方式堆積50片積層膜而獲得積層體。該積層體具有於表面配置有第1剝離膜之厚度方向一面(第1表層面)、及於表面配置有第2剝離膜之厚度方向另一面(第2表層面)。其次,藉由進行夾持之夾具於厚度方向保持該積層體。其次,以各黏著劑層自積層體之端面伸出至特定程度之方式對夾具於厚度方向對積層體賦予之加壓力進行調整。於該狀態下,於距積層體之端面0.5 mm之內側於厚度方向上予以切斷,以重新形成該積層體之外周端。切斷係使用特定之切斷加工機、及安裝於該加工機之第1旋轉刀。該旋轉刀具有圓盤部、及自該圓盤部之周端朝圓盤徑向突出之複數個突出刀。如圖4A及圖4B所示,突出刀70於旋轉刀旋轉時之前方側之緣端具有用以將切斷對象物80切斷之直線狀之刀刃71(長度6 mm)。於外形加工步驟中,以各突出刀70對積層體(切斷對象物80)自其第1表層面側切入之方式使旋轉刀相對於積層體旋轉,並將旋轉刀之旋轉速度設為4500 rpm,將旋轉刀相對於積層體之位移速度設為1000 mm/min,將對向之刀刃71於即將切斷積層體之前相對於積層體表面(第1表層面)之仰角(刃角θ)設為-5°(圖4B)(將刃角θ如圖4A所示般朝圓盤徑向外側張開之情形設為正刃角θ,將刃角θ如圖4B所示般朝圓盤徑向內側張開之情形設為負刃角θ)。繼而,於外形加工後,解除夾具所形成之積層體之加壓狀態。Next, contour processing (contour processing step) is carried out in the following manner. First, 50 laminated films punched to the same size were piled up to obtain a laminated body. Specifically, 50 laminated films were stacked so that the release film L1 (first release film) of one of the adjacent laminated films was in contact with the release film L4 (second release film) of the other laminated film. laminated body. This laminate has one surface in the thickness direction (first surface layer) on which the first release film is arranged, and the other surface in the thickness direction (second surface layer) on which the second release film is arranged on the surface. Next, the laminate is held in the thickness direction by a jig for clamping. Next, the pressing force applied by the jig to the laminate in the thickness direction is adjusted so that each adhesive layer protrudes from the end surface of the laminate to a certain extent. In this state, the laminate was cut in the thickness direction within 0.5 mm from the end face of the laminate to re-form the outer peripheral end of the laminate. For cutting, a specific cutting machine and a first rotary blade installed in the machine are used. The rotary knife has a disc portion and a plurality of protruding knives protruding radially from the peripheral end of the disc portion toward the disc. As shown in FIG. 4A and FIG. 4B , the protruding knife 70 has a linear blade 71 (length 6 mm) for cutting the cutting object 80 at the front edge when the rotary knife rotates. In the shape processing step, the rotary blades are rotated relative to the laminate in such a way that each protruding knife 70 cuts into the laminate (cutting object 80) from the first surface side, and the rotation speed of the rotary blade is set to 4500 rpm, set the displacement speed of the rotary knife relative to the laminate to 1000 mm/min, and set the elevation angle (blade angle θ) of the facing blade 71 relative to the surface of the laminate (the first surface layer) before cutting the laminate Set to -5° (Fig. 4B) (the case where the edge angle θ is opened toward the radially outer side of the disk as shown in Fig. 4A is set as a positive edge angle θ, and the edge angle θ is set as shown in Fig. The case where the inner side is open is set as a negative edge angle θ). Then, after the shape processing, the pressurized state of the laminate formed by the jig is released.

以上述方式製作實施例1之附有剝離膜之光學膜。該附有剝離膜之光學膜於厚度方向依序具備作為輕剝離膜之第1剝離膜(剝離膜L1)、第1黏著劑層(第1黏著片)、作為光學膜之偏光板、第2黏著劑層(第2黏著片)、作為重剝離膜之第2剝離膜(剝離膜L4),且於整個外周端具有側面凹凸端部。於該側面凹凸端部中,於膜面內方向上,第1及第2黏著劑層之各端緣較各膜之端緣退避。又,於以上述方式製作之該附有剝離膜之光學膜中,於膜面內方向上,第1剝離膜、光學膜、及第2剝離膜之各端緣處於實質上相同之位置。即,於該附有剝離膜之光學膜之側面凹凸端部中,第1黏著劑層之第1端緣距第1剝離膜之端緣之第1退避長度d1實質上等於第1黏著劑層之第1端緣距光學膜之端緣相退避長度d1',第2黏著劑層之第2端緣距第2剝離膜之端緣之第2退避長度d2實質上等於第2黏著劑層之第2端緣距光學膜之端緣之退避長度d2'。The optical film with release film of Example 1 was produced in the above-mentioned manner. The optical film with a release film is sequentially provided with a first release film (release film L1) as a light release film, a first adhesive layer (first adhesive sheet), a polarizing plate as an optical film, and a second release film as an optical film in the thickness direction. The adhesive layer (second adhesive sheet) and the second release film (release film L4) which is a heavy release film have side concave-convex end portions on the entire outer peripheral end. In the concave-convex end portion of the side surface, each edge of the first and second adhesive layers is retreated from the edge of each film in the in-plane direction of the film. In addition, in the optical film with a release film produced as described above, the edges of the first release film, the optical film, and the second release film are at substantially the same position in the in-plane direction of the film. That is, in the side concavo-convex end portion of the optical film with release film, the first relief length d1 from the first edge of the first adhesive layer to the edge of the first release film is substantially equal to the first adhesive layer The distance d1' between the first edge of the second adhesive layer and the edge of the optical film, and the second relief length d2 between the second edge of the second adhesive layer and the edge of the second peeling film are substantially equal to that of the second adhesive layer. The distance d2' between the second edge and the edge of the optical film.

[實施例2~6] 除以下內容以外,以與實施例1之附有剝離膜之光學膜相同之方式製作實施例2~6之各附有剝離膜之光學膜。 [Embodiments 2-6] Except the following, the optical film with a release film of each of Examples 2-6 was produced in the same manner as the optical film with a release film of Example 1.

關於外形加工時之上述刃角θ,於實施例3、4中以絕對值於負側較實施例1大之方式進行調整,於實施例2中以絕對值進而於負側較實施例3、4大之方式進行調整,於實施例6中以絕對值進而於負側較實施例2大之方式進行調整。又,於實施例5中,將外形加工時之上述刃角θ調整為較實施例1朝正側發生變化,且將該加工時之上述旋轉刀位移速度調整為較實施例1慢。Regarding the above-mentioned edge angle θ during contour processing, in Examples 3 and 4, the absolute value is adjusted in a manner that is larger on the negative side than in Example 1, and in Example 2, the absolute value is further adjusted on the negative side than in Example 3, 4 is adjusted in a way that is larger, and in Example 6, the absolute value and the negative side are adjusted in a way that is larger than that of Example 2. Also, in Example 5, the blade angle θ during contour machining was adjusted to change to the positive side compared with Example 1, and the displacement speed of the rotary blade during this machining was adjusted to be slower than Example 1.

[實施例7] 除使用厚度80 μm之偏光板代替厚度31 μm之偏光板以外,以與實施例1之附有剝離膜之光學膜相同之方式製作實施例7之附有剝離膜之光學膜。 [Example 7] The optical film with a release film of Example 7 was produced in the same manner as the optical film with a release film of Example 1 except that a polarizer with a thickness of 80 μm was used instead of a polarizer with a thickness of 31 μm.

[實施例8] 除使用厚度100 μm之偏光板代替厚度31 μm之偏光板以外,以與實施例1之附有剝離膜之光學膜相同之方式製作實施例7之附有剝離膜之光學膜。 [Example 8] The optical film with a release film of Example 7 was produced in the same manner as the optical film with a release film of Example 1 except that a polarizer with a thickness of 100 μm was used instead of a polarizer with a thickness of 31 μm.

[比較例1] 除未實施上述沖裁加工後之作業以外,以與實施例1之附有剝離膜之光學膜相同之方式製作比較例1之附有剝離膜之光學膜。 [Comparative example 1] The optical film with a release film of Comparative Example 1 was produced in the same manner as the optical film with a release film of Example 1 except that the operation after the punching process was not performed.

[比較例2] 除以下內容以外,以與實施例1之附有剝離膜之光學膜相同之方式製作比較例2之附有剝離膜之光學膜。 [Comparative example 2] Except for the following, the optical film with a release film of Comparative Example 2 was produced in the same manner as the optical film with a release film of Example 1.

使用第2旋轉刀代替第1旋轉刀。該旋轉刀具有圓盤部、及自該圓盤部之周端朝圓盤徑向突出之複數個突出刀。於外形加工步驟中,以各突出刀70對積層體(切斷對象物80)自其第2表層面側切入之方式使旋轉刀相對於積層體旋轉(即,使積層體相對於旋轉刀之配置態樣之正反與實施例1中相反),並將旋轉刀之旋轉速度設為4500 rpm,將旋轉刀相對於積層體之位移速度設為1000 mm/min,將對向之刀刃71(長度6 mm)於即將切斷積層體之前相對於積層體表面(第2表層面)之仰角(刃角θ)設為+5°(圖4A)。Use the 2nd rotary knife instead of the 1st rotary knife. The rotary knife has a disc portion and a plurality of protruding knives protruding radially from the peripheral end of the disc portion toward the disc. In the shape processing step, the rotary knife is rotated relative to the laminated body in such a manner that each protruding knife 70 cuts into the laminated body (cutting object 80) from its second surface side (that is, the laminated body is rotated relative to the rotary knife). The pros and cons of the arrangement are opposite to those in Example 1), and the rotation speed of the rotary knife is set to 4500 rpm, the displacement speed of the rotary knife relative to the laminate is set to 1000 mm/min, and the opposite blade 71 ( The elevation angle (blade angle θ) with respect to the surface of the laminate (the second surface layer) immediately before cutting the laminate was set to +5° (Fig. 4A).

<退避長度> 對於實施例1~8及比較例1、2中之各附有剝離膜之光學膜(兩面附有剝離膜之光學膜),以如下方式檢查第1黏著劑層之第1端緣之第1退避長度d1、及第2黏著劑層之第2端緣之第2退避長度d2。 <Retraction length> For each of the optical films with release films (optical films with release films on both sides) in Examples 1 to 8 and Comparative Examples 1 and 2, the first edge of the first adhesive layer of the first adhesive layer was inspected in the following manner. The back-off length d1 and the second back-off length d2 of the second edge of the second adhesive layer.

首先,自兩面附有剝離膜之光學膜將第1剝離膜剝離後,經由因該剝離而露出之第1黏著劑層將單面附有剝離膜之光學膜貼附於玻璃基板。其次,自玻璃基板上之光學膜(兩面附有黏著劑層之光學膜)將第2剝離膜剝離。藉由光學顯微鏡對自玻璃基板上之兩面附有黏著劑層之光學膜之外周端選擇的特定部位進行觀察。具體而言,於兩面附有黏著劑層之光學膜之厚度方向上,藉由光學顯微鏡對兩面附有黏著劑層之光學膜,自與玻璃基板相反一側進行觀察及拍攝。繼而,於拍攝所得之圖像中,對第1黏著劑層之第1端緣距光學膜之端緣之退避長度d1'、及第2黏著劑層之第2端緣距光學膜之該端緣之退避長度d2'進行測定。將測定結果以退避長度d1(μm)及退避長度d2(μm)之形式示於表1(如上所述,退避長度d1'實質上等於退避長度d1,退避長度d2'實質上等於退避長度d2)。First, after the first release film is peeled from the optical film with a release film on both sides, the optical film with a release film on one side is attached to a glass substrate through the first adhesive layer exposed by the peeling. Next, the 2nd peeling film was peeled off from the optical film (optical film with adhesive layer attached to both surfaces) on the glass substrate. Specific locations selected from the outer periphery of the optical film with adhesive layers on both sides on the glass substrate were observed with an optical microscope. Specifically, in the thickness direction of the optical film with the adhesive layer on both sides, the optical film with the adhesive layer on both sides was observed and photographed from the side opposite to the glass substrate with an optical microscope. Then, in the captured image, the distance d1' between the first edge of the first adhesive layer and the edge of the optical film, and the distance between the second edge of the second adhesive layer and the end of the optical film The back-off length d2' of the edge is measured. The measurement results are shown in Table 1 in the form of back-off length d1 (μm) and back-off length d2 (μm) (as mentioned above, back-off length d1' is substantially equal to back-off length d1, back-off length d2' is substantially equal to back-off length d2) .

<剝離開始力及剝離力> 針對實施例1~8及比較例1、2中之各附有剝離膜之光學膜,檢查各剝離膜之剝離所需之力(剝離開始力及其後之剝離力)。 <Peel initiation force and peel force> The force required for the peeling of each peeling film (peeling start force and subsequent peeling force) was examined for each of the optical films with a release film in Examples 1 to 8 and Comparative Examples 1 and 2.

首先,自附有剝離膜之光學膜切出測定用試片(短邊25 mm×長邊150 mm左右)。具體而言,自附有剝離膜之光學膜之側面凹凸端部切出具有150 mm左右之長度且具有25 mm之寬度之試片。First, a test piece for measurement (about 25 mm on the short side x 150 mm on the long side) is cut out from the optical film with the release film. Specifically, a test piece having a length of about 150 mm and a width of 25 mm was cut out from the side concave-convex end of the optical film with a release film.

其次,將試片固定於拉伸試驗機(產品名「自動立體測圖儀」,島津製作所製造)之固定用平台。具體而言,自試片將一剝離膜(第1剝離膜或第2剝離膜)剝離而去除後,經由因該剝離而露出之黏著劑層將該試片貼附於固定用平台。Next, the test piece was fixed on a fixing platform of a tensile testing machine (product name "Automatic Stereograph", manufactured by Shimadzu Corporation). Specifically, after peeling and removing one peeling film (first peeling film or second peeling film) from the test piece, the test piece is attached to the platform for fixing through the adhesive layer exposed by the peeling.

其次,將固持用膠帶貼附於位於試片之露出面側之另一剝離膜(第2剝離膜或第1剝離膜)中之側面凹凸端部側之短邊。該固持用膠帶具有強黏著面,經由該強黏著面將固持用膠帶貼附於試片之剝離膜。Next, stick the adhesive tape for holding to the short side of the concave-convex end side of the other release film (second release film or first release film) located on the exposed surface side of the test piece. The holding tape has a strong adhesive surface, and the holding tape is attached to the release film of the test piece through the strong adhesive surface.

其次,藉由拉伸試驗機實施將試片中之黏著劑層之剝離膜自該黏著劑層剝離之剝離試驗,並測定剝離所需之力作為剝離強度。於本測定中,將測定溫度設為25℃,藉由拉伸固持用膠帶將剝離膜剝離,將剝離角度設為180°,將拉伸速度設為300 mm/min,且將剝離長度設為100 mm。將藉由此種剝離試驗所獲得之曲線圖之一例示於圖5。於圖5之曲線圖中,橫軸表示剝離長度(mm),縱軸表示剝離強度(gf),Fm表示剝離強度之最大值。Next, a peeling test in which the peeling film of the adhesive layer in the test piece is peeled from the adhesive layer was implemented with a tensile tester, and the force required for peeling was measured as the peeling strength. In this measurement, the measurement temperature was set to 25°C, the peeling film was peeled off by stretching the holding tape, the peeling angle was set to 180°, the stretching speed was set to 300 mm/min, and the peeling length was set to 100mm. An example of a graph obtained by such a peel test is shown in FIG. 5 . In the graph of FIG. 5 , the horizontal axis represents the peeling length (mm), the vertical axis represents the peeling strength (gf), and Fm represents the maximum value of the peeling strength.

將藉由如上所述之剝離試驗所求出之剝離開始力F1、F2(gf/25 mm)及剝離力f1、f2(gf/25 mm)示於表1(其中,實施例7、8中未測定剝離開始力F1、F2)。剝離開始力F1係將第1剝離膜自第1黏著劑層剝離時之剝離長度20 mm以內之剝離強度之最大值,剝離力f1係剝離長度20~100 mm(剝離強度於經歷剝離開始時之剝離開始力F1之後穩定)內之剝離強度之平均值。剝離開始力F2係將第2剝離膜自第2黏著劑層剝離時之剝離長度20 mm以內之剝離強度之最大值,剝離力f2係剝離長度20~100 mm(剝離強度於經歷剝離開始時之剝離開始力F2之後穩定)內之剝離強度之平均值。The peeling initiation forces F1, F2 (gf/25 mm) and peeling forces f1, f2 (gf/25 mm) obtained by the above-mentioned peeling test are shown in Table 1 (among them, in Examples 7 and 8 The peel initiation force F1, F2) was not determined. Peeling initiation force F1 is the maximum value of the peeling strength within a peeling length of 20 mm when the first peeling film is peeled from the first adhesive layer. The average value of the peel strength within the peeling initiation force F1 and then stable). Peeling initiation force F2 is the maximum value of the peeling strength within a peeling length of 20 mm when the second peeling film is peeled from the second adhesive layer. The average value of the peel strength within the peeling initiation force F2 and then stable).

<輕剝離膜剝離時之重剝離膜之剝離抑制> 對實施例1~8及比較例1、2中之各附有剝離膜之光學膜檢查剝離輕剝離膜時之重剝離膜之剝離難度。具體而言,首先,為各附有剝離膜之光學膜製作10片評價樣品。其次,剝離各評價樣品之輕剝離膜。剝離係使用拉伸試驗機(產品名「自動立體測圖儀」,島津製作所製造)。於剝離中,將剝離角度設為180°,將拉伸速度設為300 mm/min。繼而,將未出現重剝離膜之剝離僅可適當剝離輕剝離膜之評價樣品數量為10之情形評價為“優”,數量為7~9之情形評價為“良”,數量為0~6之情形評價為“不良”。將評價結果示於表1。 <Suppression of peeling of heavy release film when light release film is peeled> Regarding the optical films with release films in Examples 1 to 8 and Comparative Examples 1 and 2, the difficulty of peeling off the heavy release film when peeling off the light release film was examined. Specifically, first, 10 evaluation samples were produced for each optical film with a release film. Next, the light release film of each evaluation sample was peeled off. For the peeling system, a tensile tester (product name "Automatic Stereograph", manufactured by Shimadzu Corporation) was used. In peeling, the peeling angle was set to 180°, and the stretching speed was set to 300 mm/min. Then, when the number of evaluation samples that did not peel off the heavy peeling film and only the light peeling film could be properly peeled off was 10, it was evaluated as "excellent", when the number was 7-9, it was evaluated as "good", and when the number was 0-6 The condition was evaluated as "bad". Table 1 shows the evaluation results.

<光學膜之端部龜裂之抑制> 對實施例1~8及比較例1、2中之各附有剝離膜之光學膜檢查經歷輕剝離膜之剝離之情形時於光學膜端部產生龜裂之難度。具體而言,首先,為各附有剝離膜之光學膜製作評價樣品。其次,手動剝離評價樣品之輕剝離膜。其次,藉由光學顯微鏡對光學膜之外周部(距端緣1 mm之區域)進行觀察。繼而,將剝離輕剝離膜後未於光學膜之上述外周部產生長度200 μm以上之龜裂之情形評價為“優”,將產生長度200 μm以上之龜裂之情形評價為“不良”。 <Inhibition of Cracks at the End of Optical Film> Regarding the optical films with release films in Examples 1 to 8 and Comparative Examples 1 and 2, the difficulty of generating cracks at the ends of the optical films when the release films were lightly peeled was examined. Specifically, first, evaluation samples were produced for each optical film with a release film. Next, the light peel film of the evaluation sample was manually peeled off. Next, the outer periphery of the optical film (a region 1 mm from the edge) was observed with an optical microscope. Then, when the cracks of 200 μm or more in length were not generated on the outer peripheral portion of the optical film after peeling off the light release film, it was evaluated as “excellent”, and when cracks of 200 μm or more in length were generated, it was rated as “poor”.

<端部之黏連> 對實施例1~8及比較例1、2中之各附有剝離膜之光學膜檢查端部黏連之難度。具體而言,首先,為各附有剝離膜之光學膜製作10片評價樣品,並將10片評價樣品堆積而形成膜堆(第1步驟)。其次,將前端具有黏著面之圓柱形桿(直徑10 mm)之前端黏著面自上方壓抵於位於膜堆最上方之附有剝離膜之光學膜,隨後向上方提拉該桿,並計算隨著桿提昇之附有剝離膜之光學膜之片數(第2步驟)。對各附有剝離膜之光學膜進行10次包含第1步驟及隨後之第2步驟之試驗。將10次試驗中僅一片附有剝離膜之光學膜隨著桿提昇之試驗之數量為10之情形評價為“優”,數量為6~9之情形評價為“良”,數量為5以下之情形評價為“不良”。將該評價結果示於表1。 <Adhesion at the end> For each of the optical films with release films in Examples 1 to 8 and Comparative Examples 1 and 2, the difficulty of end adhesion was checked. Specifically, first, 10 evaluation samples were produced for each optical film with a release film, and the 10 evaluation samples were stacked to form a film stack (first step). Secondly, press the front end of a cylindrical rod (diameter 10 mm) with an adhesive surface against the optical film with a release film on the top of the film stack from above, then pull the rod upwards, and calculate the following The number of pieces of optical film with release film lifted by the rod (step 2). The test including the first step and the subsequent second step was performed 10 times for each optical film with a release film. In the 10 tests, the number of tests in which only one piece of optical film with a peeling film was raised with the rod was evaluated as "excellent", 6 to 9 cases were evaluated as "good", and the number was 5 or less. The condition was evaluated as "bad". The evaluation results are shown in Table 1.

[表1] 表1    實施例1 實施例2 實施例3 實施例4 實施例5 實施例6 實施例7 實施例8 比較例1 比較例2 輕剝離膜之厚度(μm) 50 50 50 50 50 50 50 50 50 50 第1黏著劑層之厚度H(μm) 50 50 50 50 50 50 50 50 50 50 光學膜之厚度(μm) 31 31 31 31 31 31 80 100 31 31 第2黏著劑層之厚度(μm) 50 50 50 50 50 50 50 50 50 50 重剝離膜之厚度(μm) 75 75 75 50 75 75 75 75 75 75 第1退避長度d1(μm) 80 130 90 90 20 280 80 80 0 100 第2退避長度d2(μm) 120 150 150 300 50 350 120 120 0 65 d2-d1(μm) 40 20 60 210 30 70 40 40 0 -35 d1/H 0.8 2.6 1.8 1.8 0.4 5.6 1.6 1.6 0 -0.7 剝離開始力F1(gf/25 mm) 170 30 100 100 350 70 - - 600 80 剝離力f1(gf/25 mm) 2 2 2 2 2 2 2 2 2 2 剝離開始力F2(gf/25 mm) 220 190 190 180 550 160 - - 950 300 剝離力f2(gf/25 mm) 4 4 4 14 4 4 4 4 4 4 F1/F2 0.77 0.16 0.53 0.56 0.64 0.44 - - 0.63 0.27 重剝離膜之剝離抑制 不良 不良 端部龜裂之抑制 不良 黏連之抑制 不良 [Table 1] Table 1 Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Example 8 Comparative example 1 Comparative example 2 Thickness of light release film (μm) 50 50 50 50 50 50 50 50 50 50 Thickness H of the first adhesive layer (μm) 50 50 50 50 50 50 50 50 50 50 Optical film thickness (μm) 31 31 31 31 31 31 80 100 31 31 Thickness of the second adhesive layer (μm) 50 50 50 50 50 50 50 50 50 50 Thickness of heavy release film (μm) 75 75 75 50 75 75 75 75 75 75 1st retraction length d1(μm) 80 130 90 90 20 280 80 80 0 100 2nd retraction length d2(μm) 120 150 150 300 50 350 120 120 0 65 d2-d1(μm) 40 20 60 210 30 70 40 40 0 -35 d1/H 0.8 2.6 1.8 1.8 0.4 5.6 1.6 1.6 0 -0.7 Peeling start force F1(gf/25 mm) 170 30 100 100 350 70 - - 600 80 Peel force f1(gf/25 mm) 2 2 2 2 2 2 2 2 2 2 Peeling start force F2 (gf/25 mm) 220 190 190 180 550 160 - - 950 300 Peeling force f2(gf/25 mm) 4 4 4 14 4 4 4 4 4 4 F1/F2 0.77 0.16 0.53 0.56 0.64 0.44 - - 0.63 0.27 Peeling inhibition of heavy release film excellent excellent excellent excellent excellent excellent excellent excellent bad bad Inhibition of end cracks excellent excellent excellent excellent excellent excellent excellent excellent bad excellent inhibition of adhesion excellent excellent excellent excellent excellent good excellent excellent bad excellent

10:光學膜 11:第1面 12:第2面 13:端緣 20:黏著劑層 21:黏著面 22:端緣(第1端緣) 30:黏著劑層 31:黏著面 32:端緣(第2端緣) 40:輕剝離膜 40a:自由部分 42:端緣 50:重剝離膜 52:端緣 70:突出刀 71:刀刃 80:切斷對象物 91:剝離膜 91e:端緣 92:黏著劑層 92e:端緣 93:光學膜 93e:端緣 94:黏著劑層 94e:端緣 95:剝離膜 95e:端緣 d1:退避長度 d2:退避長度 D:面內方向 E:側面凹凸端部 E':端部 F m:剝離強度之最大值 M1:第1構件(第1被接著體) M2:第2構件(第2被接著體) T:厚度方向 X:光學膜(附有剝離膜之光學膜) Y:附有黏著劑層之光學膜 Z:膜 θ:刃角 10: Optical film 11: First surface 12: Second surface 13: Edge 20: Adhesive layer 21: Adhesive surface 22: Edge (first edge) 30: Adhesive layer 31: Adhesive surface 32: Edge (Second edge) 40: light peeling film 40a: free part 42: edge 50: heavy peeling film 52: edge 70: protruding knife 71: blade 80: object to be cut 91: peeling film 91e: edge 92 : Adhesive layer 92e: Edge 93: Optical film 93e: Edge 94: Adhesive layer 94e: Edge 95: Release film 95e: Edge d1: Back-off length d2: Back-off length D: In-plane direction E: Side unevenness End E': End F m : Maximum value of peel strength M1: First member (first adherend) M2: Second member (second adherend) T: Thickness direction X: Optical film (attached Optical film of release film) Y: Optical film with adhesive layer Z: Film θ: Bevel angle

圖1係本發明之附有剝離膜之光學膜之一實施方式之剖面模式圖。 圖2係圖1所示之附有剝離膜之光學膜之局部放大剖面模式圖。 圖3A~圖3D表示本發明之附有剝離膜之光學膜之使用方法之一例。圖3A表示剝離輕剝離膜之第1剝離步驟,圖3B表示經由第1黏著劑層將光學膜與第1被接著體接合之第1接合步驟,圖3C表示剝離重剝離膜之第2剝離步驟,圖3D表示經由第2黏著劑層將光學膜與第2被接著體接合之第2接合步驟。 圖4A、4B係用以對實施例及比較例中之外形加工步驟中所使用之旋轉刀之刃角進行說明之模式圖。 圖5係表示藉由將黏著劑層上之剝離膜自黏著劑層剝離之剝離試驗所獲得之曲線圖之一例。 圖6係先前之附有剝離膜之光學膜之剖面模式圖。 Fig. 1 is a schematic cross-sectional view of an embodiment of an optical film with a release film of the present invention. Fig. 2 is a partially enlarged cross-sectional model view of the optical film with a release film shown in Fig. 1 . 3A to 3D show an example of the usage method of the optical film with release film of the present invention. Fig. 3A shows the first peeling step of peeling the light release film, Fig. 3B shows the first bonding step of bonding the optical film and the first adherend through the first adhesive layer, and Fig. 3C shows the second peeling step of peeling the heavy release film , FIG. 3D shows the second bonding step of bonding the optical film to the second adherend through the second adhesive layer. 4A and 4B are schematic diagrams for explaining the edge angle of the rotary knife used in the contour processing step in the embodiment and the comparative example. Fig. 5 shows an example of a graph obtained by a peeling test in which the release film on the adhesive layer is peeled off from the adhesive layer. Fig. 6 is a schematic cross-sectional view of a conventional optical film with a release film.

10:光學膜 10: Optical film

11:第1面 11:Side 1

12:第2面 12:Side 2

13:端緣 13: Edge

20:黏著劑層 20: Adhesive layer

21:黏著面 21: Adhesive surface

22:端緣(第1端緣) 22: End edge (first end edge)

30:黏著劑層 30: Adhesive layer

31:黏著面 31: Adhesive surface

32:端緣(第2端緣) 32: End edge (second end edge)

40:輕剝離膜 40: Lightly peel off the film

40a:自由部分 40a: Free part

42:端緣 42: Edge

50:重剝離膜 50: heavy release film

52:端緣 52: edge

d1:退避長度 d1: back-off length

d2:退避長度 d2: back-off length

D:面內方向 D: in-plane direction

E:側面凹凸端部 E: Concave-convex end of the side

T:厚度方向 T: Thickness direction

Y:附有黏著劑層之光學膜 Y: Optical film with adhesive layer

Claims (8)

一種附有剝離膜之光學膜,其具備附有黏著劑層之光學膜、輕剝離膜及重剝離膜, 上述附有黏著劑層之光學膜具備:光學膜,其具有第1面及與該第1面為相反側之第2面; 第1黏著劑層,其貼合於上述第1面,且於上述光學膜之相反側具有第1黏著面;及 第2黏著劑層,其貼合於上述第2面,且於上述光學膜之相反側具有第2黏著面; 上述輕剝離膜配置於上述第1黏著面上, 上述重剝離膜配置於上述第2黏著面上, 上述光學膜具有100 μm以下之厚度, 上述附有剝離膜之光學膜具有側面凹凸端部,於該側面凹凸端部中,於上述光學膜之與上述厚度之方向正交之面內方向上,上述第1黏著劑層之第1端緣及上述第2黏著劑層之第2端緣較上述光學膜、上述輕剝離膜、及上述重剝離膜之各端緣退避, 於上述側面凹凸端部中,上述第1端緣距上述輕剝離膜之端緣之第1退避長度較上述第2端緣距上述重剝離膜之端緣之第2退避長度小。 An optical film with a release film comprising an optical film with an adhesive layer, a light release film and a heavy release film, The above-mentioned optical film with an adhesive layer includes: an optical film having a first surface and a second surface opposite to the first surface; a first adhesive layer, which is bonded to the first surface and has a first adhesive surface on the opposite side of the optical film; and A second adhesive layer, which is attached to the second surface and has a second adhesive surface on the opposite side of the optical film; The above-mentioned light release film is arranged on the above-mentioned first adhesive surface, The above-mentioned heavy release film is arranged on the above-mentioned second adhesive surface, The above-mentioned optical film has a thickness of 100 μm or less, The above-mentioned optical film with a release film has side concave-convex end portions, and in the side concave-convex end portions, the first end of the above-mentioned first adhesive layer is The edge and the second edge of the second adhesive layer are retreated from the edges of the optical film, the light release film, and the heavy release film, In the side concave-convex end portion, a first relief length from the first edge to the edge of the light release film is smaller than a second relief length from the second edge to the edge of the heavy release film. 如請求項1之附有剝離膜之光學膜,其中上述面內方向上之上述第1端緣與上述第2端緣間之距離為1 μm以上。The optical film with a release film according to claim 1, wherein the distance between the first edge and the second edge in the in-plane direction is 1 μm or more. 如請求項1之附有剝離膜之光學膜,其中上述第1退避長度為20 μm以上。The optical film with a release film according to claim 1, wherein the first relief length is 20 μm or more. 如請求項1之附有剝離膜之光學膜,其中上述第1退避長度相對於上述第1黏著劑層之厚度之比率為0.4以上8以下。The optical film with a release film according to claim 1, wherein the ratio of the first relief length to the thickness of the first adhesive layer is not less than 0.4 and not more than 8. 如請求項1至4中任一項之附有剝離膜之光學膜,其中用以開始自上述第1黏著面剝離上述輕剝離膜之第1剝離開始力較用以開始自上述第2黏著面剝離上述重剝離膜之第2剝離開始力小。The optical film with a release film according to any one of claims 1 to 4, wherein the first peeling starting force used to start peeling the light release film from the first adhesive surface is used to start peeling from the second adhesive surface The second peeling initiation force for peeling off the above-mentioned heavy peeling film is small. 如請求項5之附有剝離膜之光學膜,其中上述第1剝離開始力相對於上述第2剝離開始力之比率為0.8以下。The optical film with a peeling film according to claim 5, wherein the ratio of the first peeling initiation force to the second peeling initiation force is 0.8 or less. 如請求項6之附有剝離膜之光學膜,其中上述第1剝離開始力未達800 gf/25 mm。The optical film with a peeling film according to claim 6, wherein the first peeling initiation force is less than 800 gf/25 mm. 如請求項6之附有剝離膜之光學膜,其中上述第2剝離開始力為800 gf/25 mm以下。The optical film with a peeling film according to claim 6, wherein the second peeling initiation force is 800 gf/25 mm or less.
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