TW202307134A - Hydrosilylation curable polyorganosiloxane composition and methods for the preparation and use thereof in encapsulation films - Google Patents
Hydrosilylation curable polyorganosiloxane composition and methods for the preparation and use thereof in encapsulation films Download PDFInfo
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- TW202307134A TW202307134A TW111128872A TW111128872A TW202307134A TW 202307134 A TW202307134 A TW 202307134A TW 111128872 A TW111128872 A TW 111128872A TW 111128872 A TW111128872 A TW 111128872A TW 202307134 A TW202307134 A TW 202307134A
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- 239000000203 mixture Substances 0.000 title claims abstract description 87
- 238000006459 hydrosilylation reaction Methods 0.000 title claims abstract description 50
- 238000005538 encapsulation Methods 0.000 title claims abstract description 34
- 238000000034 method Methods 0.000 title claims description 33
- 238000002360 preparation method Methods 0.000 title description 5
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 45
- -1 polysiloxane Polymers 0.000 claims description 92
- 239000007858 starting material Substances 0.000 claims description 73
- 239000011347 resin Substances 0.000 claims description 55
- 229920005989 resin Polymers 0.000 claims description 55
- 239000010408 film Substances 0.000 claims description 51
- 125000003342 alkenyl group Chemical group 0.000 claims description 30
- 239000003054 catalyst Substances 0.000 claims description 30
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 29
- 239000002318 adhesion promoter Substances 0.000 claims description 21
- 229920000642 polymer Polymers 0.000 claims description 19
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 14
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 13
- 229910052697 platinum Inorganic materials 0.000 claims description 13
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 13
- 229920002554 vinyl polymer Polymers 0.000 claims description 13
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 238000002161 passivation Methods 0.000 claims description 6
- 239000010409 thin film Substances 0.000 claims description 6
- 239000000080 wetting agent Substances 0.000 claims description 6
- 229910004283 SiO 4 Inorganic materials 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000002156 mixing Methods 0.000 claims description 5
- 125000005375 organosiloxane group Chemical group 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000002683 reaction inhibitor Substances 0.000 claims description 3
- 229920001002 functional polymer Polymers 0.000 claims description 2
- 230000001681 protective effect Effects 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- 229920000548 poly(silane) polymer Polymers 0.000 claims 1
- 238000003860 storage Methods 0.000 abstract description 5
- 239000003112 inhibitor Substances 0.000 description 26
- 239000002904 solvent Substances 0.000 description 21
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 239000000758 substrate Substances 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 11
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- 239000003795 chemical substances by application Substances 0.000 description 8
- 150000002430 hydrocarbons Chemical group 0.000 description 8
- 125000000962 organic group Chemical group 0.000 description 8
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 8
- 239000004205 dimethyl polysiloxane Substances 0.000 description 7
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 150000001298 alcohols Chemical class 0.000 description 6
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 239000000945 filler Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 229920001843 polymethylhydrosiloxane Polymers 0.000 description 5
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 5
- VMAWODUEPLAHOE-UHFFFAOYSA-N 2,4,6,8-tetrakis(ethenyl)-2,4,6,8-tetramethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1 VMAWODUEPLAHOE-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000013522 chelant Substances 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 229910000077 silane Inorganic materials 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
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- 150000003624 transition metals Chemical class 0.000 description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 3
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000002585 base Substances 0.000 description 3
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- 238000006243 chemical reaction Methods 0.000 description 3
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- VZCYOOQTPOCHFL-OWOJBTEDSA-L fumarate(2-) Chemical class [O-]C(=O)\C=C\C([O-])=O VZCYOOQTPOCHFL-OWOJBTEDSA-L 0.000 description 3
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- 125000006038 hexenyl group Chemical group 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 150000002688 maleic acid derivatives Chemical class 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
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- 229910052710 silicon Inorganic materials 0.000 description 3
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- QYLFHLNFIHBCPR-UHFFFAOYSA-N 1-ethynylcyclohexan-1-ol Chemical compound C#CC1(O)CCCCC1 QYLFHLNFIHBCPR-UHFFFAOYSA-N 0.000 description 2
- CEBKHWWANWSNTI-UHFFFAOYSA-N 2-methylbut-3-yn-2-ol Chemical compound CC(C)(O)C#C CEBKHWWANWSNTI-UHFFFAOYSA-N 0.000 description 2
- NECRQCBKTGZNMH-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-ol Chemical compound CC(C)CC(C)(O)C#C NECRQCBKTGZNMH-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical group [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000007809 chemical reaction catalyst Substances 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 229920005565 cyclic polymer Polymers 0.000 description 2
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- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 2
- OIKHZBFJHONJJB-UHFFFAOYSA-N dimethyl(phenyl)silicon Chemical compound C[Si](C)C1=CC=CC=C1 OIKHZBFJHONJJB-UHFFFAOYSA-N 0.000 description 2
- XVSBWQYHSLNOCU-UHFFFAOYSA-N ethenyl(dimethyl)silicon Chemical compound C[Si](C)C=C XVSBWQYHSLNOCU-UHFFFAOYSA-N 0.000 description 2
- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical class C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 2
- 150000004687 hexahydrates Chemical class 0.000 description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 description 2
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- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000003961 organosilicon compounds Chemical class 0.000 description 2
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- 150000003573 thiols Chemical class 0.000 description 2
- 150000003852 triazoles Chemical class 0.000 description 2
- JNRUXZIXAXHXTN-UHFFFAOYSA-N trimethyl(2-methylbut-3-yn-2-yloxy)silane Chemical compound C#CC(C)(C)O[Si](C)(C)C JNRUXZIXAXHXTN-UHFFFAOYSA-N 0.000 description 2
- NYDYFYYVZYXYOJ-ONEGZZNKSA-N (E)-4-[3-methoxy-2-(methoxymethyl)propoxy]-4-oxobut-2-enoic acid Chemical compound COCC(COC)COC(=O)\C=C\C(O)=O NYDYFYYVZYXYOJ-ONEGZZNKSA-N 0.000 description 1
- HMVBQEAJQVQOTI-SOFGYWHQSA-N (e)-3,5-dimethylhex-3-en-1-yne Chemical compound CC(C)\C=C(/C)C#C HMVBQEAJQVQOTI-SOFGYWHQSA-N 0.000 description 1
- GRGVQLWQXHFRHO-AATRIKPKSA-N (e)-3-methylpent-3-en-1-yne Chemical compound C\C=C(/C)C#C GRGVQLWQXHFRHO-AATRIKPKSA-N 0.000 description 1
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 1
- YOBOXHGSEJBUPB-MTOQALJVSA-N (z)-4-hydroxypent-3-en-2-one;zirconium Chemical compound [Zr].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O YOBOXHGSEJBUPB-MTOQALJVSA-N 0.000 description 1
- SXPRVMIZFRCAGC-UHFFFAOYSA-N 1,2,3,4,5-pentafluoro-6-methylbenzene Chemical compound CC1=C(F)C(F)=C(F)C(F)=C1F SXPRVMIZFRCAGC-UHFFFAOYSA-N 0.000 description 1
- SJBBXFLOLUTGCW-UHFFFAOYSA-N 1,3-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(C(F)(F)F)=C1 SJBBXFLOLUTGCW-UHFFFAOYSA-N 0.000 description 1
- YQJPWWLJDNCSCN-UHFFFAOYSA-N 1,3-diphenyltetramethyldisiloxane Chemical compound C=1C=CC=CC=1[Si](C)(C)O[Si](C)(C)C1=CC=CC=C1 YQJPWWLJDNCSCN-UHFFFAOYSA-N 0.000 description 1
- GDKOYYDQISQOMH-UHFFFAOYSA-N 1-ethynylcyclohexan-1-amine Chemical compound C#CC1(N)CCCCC1 GDKOYYDQISQOMH-UHFFFAOYSA-N 0.000 description 1
- JDLPYWQTHJDXFQ-UHFFFAOYSA-N 2,4,6,8,10,12-hexakis(ethenyl)-2,4,6,8,10,12-hexamethyl-1,3,5,7,9,11-hexaoxa-2,4,6,8,10,12-hexasilacyclododecane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1 JDLPYWQTHJDXFQ-UHFFFAOYSA-N 0.000 description 1
- BVTLTBONLZSBJC-UHFFFAOYSA-N 2,4,6-tris(ethenyl)-2,4,6-trimethyl-1,3,5,2,4,6-trioxatrisilinane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O1 BVTLTBONLZSBJC-UHFFFAOYSA-N 0.000 description 1
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- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 description 1
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- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- CUUQUEAUUPYEKK-UHFFFAOYSA-N 4-ethyloct-1-yn-3-ol Chemical compound CCCCC(CC)C(O)C#C CUUQUEAUUPYEKK-UHFFFAOYSA-N 0.000 description 1
- 241000208340 Araliaceae Species 0.000 description 1
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- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
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- FSIJKGMIQTVTNP-UHFFFAOYSA-N bis(ethenyl)-methyl-trimethylsilyloxysilane Chemical compound C[Si](C)(C)O[Si](C)(C=C)C=C FSIJKGMIQTVTNP-UHFFFAOYSA-N 0.000 description 1
- ZPOLOEWJWXZUSP-AATRIKPKSA-N bis(prop-2-enyl) (e)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C\C(=O)OCC=C ZPOLOEWJWXZUSP-AATRIKPKSA-N 0.000 description 1
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- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
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- KHCVRNWPJUWMPR-UHFFFAOYSA-N cyclohexylmethyl-ethynoxy-dimethylsilane Chemical compound C1(CCCCC1)C[Si](OC#C)(C)C KHCVRNWPJUWMPR-UHFFFAOYSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 125000004983 dialkoxyalkyl group Chemical group 0.000 description 1
- CSUUJAQRROUFFI-UHFFFAOYSA-N diethoxy-[2-(7-oxabicyclo[4.1.0]heptan-1-yl)ethyl]silane Chemical compound C1CCCC2OC21CC[SiH](OCC)OCC CSUUJAQRROUFFI-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-AATRIKPKSA-N diethyl fumarate Chemical compound CCOC(=O)\C=C\C(=O)OCC IEPRKVQEAMIZSS-AATRIKPKSA-N 0.000 description 1
- 229940008099 dimethicone Drugs 0.000 description 1
- BXLHNXKDRMPGSP-UHFFFAOYSA-N dimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-1-yl)ethyl]silane Chemical compound C1CCCC2OC21CC[SiH](OC)OC BXLHNXKDRMPGSP-UHFFFAOYSA-N 0.000 description 1
- RQCQBDUYEHRNPP-UHFFFAOYSA-N dimethyl-bis(2-methylbut-3-yn-2-yloxy)silane Chemical compound C#CC(C)(C)O[Si](C)(C)OC(C)(C)C#C RQCQBDUYEHRNPP-UHFFFAOYSA-N 0.000 description 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000011067 equilibration Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- KPWVUBSQUODFPP-UHFFFAOYSA-N ethenyl-(ethenyl-methyl-phenylsilyl)oxy-methyl-phenylsilane Chemical compound C=1C=CC=CC=1[Si](C)(C=C)O[Si](C)(C=C)C1=CC=CC=C1 KPWVUBSQUODFPP-UHFFFAOYSA-N 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 235000008434 ginseng Nutrition 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- XWHJQTQOUDOZGR-UHFFFAOYSA-N hex-1-enyl(trimethoxy)silane Chemical compound CCCCC=C[Si](OC)(OC)OC XWHJQTQOUDOZGR-UHFFFAOYSA-N 0.000 description 1
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 239000003906 humectant Substances 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- OKHRRIGNGQFVEE-UHFFFAOYSA-N methyl(diphenyl)silicon Chemical compound C=1C=CC=CC=1[Si](C)C1=CC=CC=C1 OKHRRIGNGQFVEE-UHFFFAOYSA-N 0.000 description 1
- QXLPXWSKPNOQLE-UHFFFAOYSA-N methylpentynol Chemical compound CCC(C)(O)C#C QXLPXWSKPNOQLE-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- HQFYIDOMCULPIW-UHFFFAOYSA-N n-methylprop-2-yn-1-amine Chemical compound CNCC#C HQFYIDOMCULPIW-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Chemical class CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000005386 organosiloxy group Chemical group 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000005429 oxyalkyl group Chemical group 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- FVZVCSNXTFCBQU-UHFFFAOYSA-N phosphanyl Chemical group [PH2] FVZVCSNXTFCBQU-UHFFFAOYSA-N 0.000 description 1
- CHOLPKIHPFNIPE-UHFFFAOYSA-N phosphanylphosphane rhodium Chemical compound [Rh].PP CHOLPKIHPFNIPE-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- JKANAVGODYYCQF-UHFFFAOYSA-N prop-2-yn-1-amine Chemical compound NCC#C JKANAVGODYYCQF-UHFFFAOYSA-N 0.000 description 1
- TVDSBUOJIPERQY-UHFFFAOYSA-N prop-2-yn-1-ol Chemical compound OCC#C TVDSBUOJIPERQY-UHFFFAOYSA-N 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- QBERHIJABFXGRZ-UHFFFAOYSA-M rhodium;triphenylphosphane;chloride Chemical compound [Cl-].[Rh].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QBERHIJABFXGRZ-UHFFFAOYSA-M 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- UMFJXASDGBJDEB-UHFFFAOYSA-N triethoxy(prop-2-enyl)silane Chemical compound CCO[Si](CC=C)(OCC)OCC UMFJXASDGBJDEB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- AQRLNPVMDITEJU-UHFFFAOYSA-N triethylsilane Substances CC[SiH](CC)CC AQRLNPVMDITEJU-UHFFFAOYSA-N 0.000 description 1
- QXTIBZLKQPJVII-UHFFFAOYSA-N triethylsilicon Chemical compound CC[Si](CC)CC QXTIBZLKQPJVII-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 239000011995 wilkinson's catalyst Substances 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
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- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
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- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
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Abstract
Description
相關申請案之交互參照Cross-reference to related applications
本申請案主張根據35 U.S.C. §119 (e)於2021年8月05日申請之美國臨時專利申請案序號63/229606之優先權。美國臨時專利申請案序號63/229606特此以引用方式併入本文中。This application claims priority to U.S. Provisional Patent Application Serial No. 63/229606 filed August 05, 2021 under 35 U.S.C. §119 (e). US Provisional Patent Application Serial No. 63/229606 is hereby incorporated by reference herein.
一種矽氫化可固化聚有機矽氧烷組成物可經固化以形成適用於OLED顯示器中之聚矽氧封裝膜。提供一種用於製備該組成物的方法,以及一種用於使用該組成物以製備聚矽氧封裝膜的方法。A hydrosilylation curable polyorganosiloxane composition can be cured to form a polysiloxane encapsulation film suitable for use in OLED displays. Provided are a method for preparing the composition and a method for using the composition to prepare a polysiloxane encapsulation film.
將封裝膜用於有機發光二極體(organic light emitting diode, OLED)顯示器中以保護敏感的電子組件。封裝膜覆蓋濕敏電子組件,例如有機光發射器,以防止氧化以及以物理方式保護電子組件免受由外部力造成的損害。Encapsulation films are used in organic light emitting diode (OLED) displays to protect sensitive electronic components. Encapsulation films cover moisture-sensitive electronic components, such as organic light emitters, to prevent oxidation and physically protect the electronic components from damage caused by external forces.
產業需要具有以下性質中之一或多者的封裝膜:光學透射率、快速固化性、無或最小的出氣(outgas)產生、及尺寸穩定性。模數影響封裝膜的尺寸穩定性,且亦影響堆疊含有封裝膜之電子組件的能力。此外,介電常數(dielectric constant, Dk)是膜之極化率的測量值。具有低Dk值之封裝膜可減少寄生電容,其是非所欲的,因為寄生電容增加電力消耗。因此,產業需要材料以製備具有低Dk及適當模數值兩者之OLED封裝膜。The industry needs encapsulating films that have one or more of the following properties: optical transmission, fast cure, no or minimal outgas generation, and dimensional stability. The modulus affects the dimensional stability of the encapsulation film and also affects the ability to stack electronic components containing the encapsulation film. In addition, the dielectric constant (Dk) is a measure of the polarizability of a film. Encapsulation films with low Dk values can reduce parasitic capacitance, which is undesirable because parasitic capacitance increases power consumption. Therefore, the industry needs materials to make OLED encapsulation films with both low Dk and appropriate modulus values.
提供一種用於形成聚矽氧封裝膜的方法。聚矽氧封裝膜適用於OLED顯示器。用於形成聚矽氧封裝膜的方法包含: (1) 組合起始材料,該等起始材料包含: 以起始材料(A)、(B)、(C)、及(D)的組合重量計,50%至58.59%的(A)聚二有機矽氧烷聚合物,其包含具有單元式(R 1 2R 2SiO 1/2) a(R 1 2SiO 2/2) b的線性聚合物,其中R 1是具有1至12個碳原子的烷基,R 2是具有2至12個碳原子的烯基,下標a、b、及c表示每個分子各單元的平均數,且具有以下值:a = 2,及100 ≤ b ≤ 300; 以起始材料(A)、(B)、(C)、及(D)的組合重量計,40%至48.59%的(B)烯基官能聚有機矽酸鹽樹脂,其具有單元式(R 1 2R 2SiO 1/2) d(R 1 3SiO 2/2) e(SiO 4/2) f(HO 1/2) g,其中R 1及R 2如上所述,下標e、f、g、及h表示樹脂中各單元的莫耳分率,且具有以下值:d > 0,e ≥ 0,f > 0,量(d + e + f)= 1,且樹脂具有1,500 g/mol至15,000 g/mol之數目平均分子量,且下標g > 0,其限制條件為下標g具有足以提供以樹脂重量計具有0至2重量%之羥基含量的樹脂的值; 以起始材料(A)至(D)的組合重量計,1.4重量%至2.5重量%的(C)聚有機氫矽氧烷,其具有單元式(R 1 2HSiO 1/2) h(R 1 3SiO 1/2) i(R 1 2SiO 2/2) j(R 1HSiO 2/2) k,其中R 1如上所述,下標h、i、j、及k表示每分子各單元的平均數,0 ≤ h ≤ 2,0 ≤ i ≤ 2,(h + i) = 2,0 ≤ j < 10,0 < k < 10,0 < (j + k) < 10,且2 ≤ (h + k) ≤ 12;其中(A)聚二有機矽氧烷聚合物、(B)烯基官能聚有機矽酸鹽樹脂、及(C)聚有機氫矽氧烷的量足以提供來自(C)之矽鍵結的氫原子相對於來自(A)及(B)組合的烯基的重量比(SiH/Vi比)為0.30至0.55;及 以起始材料(A)至(D)的組合重量計,0.01重量%至0.02重量%的(D)矽氫化反應催化劑,其包含與烯基官能有機矽氧烷錯合的鉑,藉以形成矽氫化可固化聚有機矽氧烷組成物; (2) 使矽氫化可固化聚有機矽氧烷組成物模製成膜;及 (3) 固化矽氫化可固化聚有機矽氧烷組成物,藉以形成聚矽氧封裝膜。 A method for forming a polysiloxane encapsulation film is provided. Polysiloxane encapsulation film is suitable for OLED displays. The method for forming a polysiloxane encapsulation film comprises: (1) Combining starting materials, these starting materials comprising: In the combined weight of starting materials (A), (B), (C), and (D) In total, 50% to 58.59% of (A) a polydiorganosiloxane polymer comprising a linear polymer having the unit formula (R 1 2 R 2 SiO 1/2 ) a (R 1 2 SiO 2/2 ) b wherein R is an alkyl group having 1 to 12 carbon atoms, R is an alkenyl group having 2 to 12 carbon atoms, and the subscripts a, b, and c represent the average number of units per molecule, and has the following values: a = 2, and 100 ≤ b ≤ 300; based on the combined weight of starting materials (A), (B), (C), and (D), 40% to 48.59% of (B) alkene A functional polyorganosilicate resin having the unit formula (R 1 2 R 2 SiO 1/2 ) d (R 1 3 SiO 2/2 ) e (SiO 4/2 ) f (HO 1/2 ) g , Wherein R 1 and R 2 are as mentioned above, subscript e, f, g and h represent the mole fraction of each unit in the resin, and have the following values: d>0, e≥0, f>0, amount ( d + e + f) = 1, and the resin has a number average molecular weight of 1,500 g/mol to 15,000 g/mol, and the subscript g > 0, with the proviso that the subscript g has sufficient Values for resins with a hydroxyl content of 2% by weight; 1.4% to 2.5% by weight, based on the combined weight of the starting materials (A) to (D), of (C) a polyorganohydrogensiloxane having the unit formula ( R 1 2 HSiO 1/2 ) h (R 1 3 SiO 1/2 ) i (R 1 2 SiO 2/2 ) j (R 1 HSiO 2/2 ) k , wherein R 1 is as above, subscript h, i, j, and k represent the average number of units per molecule, 0 ≤ h ≤ 2, 0 ≤ i ≤ 2, (h + i) = 2, 0 ≤ j < 10, 0 < k < 10, 0 < ( j + k) < 10, and 2 ≤ (h + k) ≤ 12; wherein (A) polydiorganosiloxane polymer, (B) alkenyl functional polyorganosilicate resin, and (C) polyorganosiloxane The amount of hydrosiloxane is sufficient to provide a weight ratio of silicon-bonded hydrogen atoms from (C) relative to alkenyl groups from the combination of (A) and (B) (SiH/Vi ratio) from 0.30 to 0.55; and Based on the combined weight of the starting materials (A) to (D), 0.01% to 0.02% by weight of (D) a hydrosilylation catalyst comprising platinum complexed with an alkenyl functional organosiloxane to form a hydrosilation compound Curing the polyorganosiloxane composition; (2) making the hydrosilylation curable polyorganosiloxane composition mold forming a film; and (3) curing the hydrosilylation curable polyorganosiloxane composition to form a polysiloxane encapsulating film.
在上述方法中使用的起始材料詳細描述於下文中。 (A)聚二有機矽氧烷聚合物 The starting materials used in the above methods are described in detail below. (A) Polydiorganosiloxane polymer
起始材料(A)是聚二有機矽氧烷聚合物。聚二有機矽氧烷聚合物包含(A-1)具有單元式(R 1 2R 2SiO 1/2) a(R 1 2SiO 2/2) b之線性聚合物,其中R 1是具有1至12個碳原子的烷基,R 2是具有2至12個碳原子的烯基,下標a、b、及c表示每個分子各單元的數量,下標a是2,且下標b是100至300。 The starting material (A) is a polydiorganosiloxane polymer. The polydiorganosiloxane polymer comprises (A-1) a linear polymer having the unit formula (R 1 2 R 2 SiO 1/2 ) a (R 1 2 SiO 2/2 ) b , wherein R 1 is a linear polymer having 1 An alkyl group having 2 to 12 carbon atoms, R is an alkenyl group having 2 to 12 carbon atoms, the subscripts a, b, and c represent the number of units per molecule, the subscript a is 2, and the subscript b is 100 to 300.
R 1之合適的烷基可以是直鏈、支鏈、環狀、或其二或更多者的組合。烷基係藉由以下例示:甲基、乙基、丙基(包括正丙基及/或異丙基)、丁基(包括正丁基、三級丁基、二級丁基、及/或異丁基);戊基、己基、庚基、辛基、癸基、及十二烷基(以及具有5至12個碳原子之支鏈異構物),且烷基進一步藉由環烷基,諸如環丙基、環丁基、環戊基、及環己基例示。替代地,R 1的烷基可選自由下列組成之群組:甲基、乙基、丙基、及丁基;替代地甲基、乙基、及丙基;替代地甲基及乙基。替代地,R 1的烷基可以是甲基。 Suitable alkyl groups for R 1 may be linear, branched, cyclic, or a combination of two or more thereof. Alkyl groups are exemplified by: methyl, ethyl, propyl (including n-propyl and/or isopropyl), butyl (including n-butyl, tertiary butyl, secondary butyl, and/or isobutyl); pentyl, hexyl, heptyl, octyl, decyl, and dodecyl (and branched chain isomers with 5 to 12 carbon atoms), and the alkyl group is further modified by cycloalkyl , such as cyclopropyl, cyclobutyl, cyclopentyl, and cyclohexyl are exemplified. Alternatively, the alkyl group of R can be selected from the group consisting of: methyl, ethyl, propyl, and butyl; alternatively methyl, ethyl, and propyl; alternatively methyl and ethyl. Alternatively, the alkyl group of R 1 may be methyl.
R 2的烯基可具有末端烯基官能度,例如,R 2可具有下式 ,其中下標y是0至10,替代地0至6,且*指示附著點(即,至矽原子)。替代地,各R 2可獨立地選自由乙烯基、烯丙基、及己烯基組成之群組。替代地,各R 2可獨立地選自由乙烯基及烯丙基組成之群組。替代地,各R 2可獨立地選自由乙烯基及己烯基組成之群組。替代地,各R 2可以是乙烯基。 The alkenyl group for R may have terminal alkenyl functionality, for example, R may have the formula , where the subscript y is 0 to 10, alternatively 0 to 6, and * indicates the point of attachment (ie, to the silicon atom). Alternatively, each R2 can be independently selected from the group consisting of vinyl, allyl, and hexenyl. Alternatively, each R2 can be independently selected from the group consisting of vinyl and allyl. Alternatively, each R2 can be independently selected from the group consisting of vinyl and hexenyl. Alternatively, each R2 can be vinyl.
起始材料(A-1)可包含烯基官能聚二有機矽氧烷,諸如i)雙-二甲基乙烯基矽氧基封端之聚二甲基矽氧烷,ii)雙-二甲基乙烯基矽氧基封端之聚(二甲基矽氧烷/甲基乙烯基矽氧烷),iii)雙-二甲基乙烯基矽氧基封端之聚甲基乙烯基矽氧烷,iv)雙-三甲基矽氧基封端之聚(二甲基矽氧烷/甲基乙烯基矽氧烷),v)雙-三甲基矽氧基封端之聚甲基乙烯基矽氧烷,vi)雙-二甲基己烯基矽氧基封端之聚二甲基矽氧烷,vii)雙-二甲基己烯基矽氧基封端之聚(二甲基矽氧烷/甲基己烯基矽氧烷),viii)雙-二甲基己烯基矽氧烷基封端之聚甲基己烯基矽氧烷,ix)雙-三甲基矽氧基封端之聚(二甲基矽氧烷/甲基己烯基矽氧烷),x)雙-三甲基矽氧基封端之聚甲基己烯基矽氧烷,xi)雙-二甲基乙烯基矽氧基封端之聚(二甲基矽氧烷/甲基己烯基矽氧烷),xii)雙-二甲基己烯基矽氧基封端之聚(二甲基矽氧烷/甲基乙烯基矽氧烷),及xiii) i)至xii)之二或更多者的組合。替代地,起始材料(A-1)可選自由下列組成之群組:i)雙-二甲基乙烯基矽氧基封端之聚二甲基矽氧烷、vi)雙-二甲基己烯基矽氧基封端之聚二甲基矽氧烷、及其組合。替代地,起始材料(A)可以是雙-二甲基乙烯基矽氧基封端之聚二甲基矽氧烷。The starting material (A-1) may comprise an alkenyl functional polydiorganosiloxane, such as i) bis-dimethylvinylsiloxy terminated polydimethylsiloxane, ii) bis-dimethyl poly(dimethylvinylsiloxane/methylvinylsiloxane), iii) bis-dimethylvinylsiloxy terminated polymethylvinylsiloxane , iv) bis-trimethylsiloxy-terminated poly(dimethylsiloxane/methylvinylsiloxane), v) bis-trimethylsiloxy-terminated polymethylvinyl Siloxane, vi) bis-dimethylhexenylsiloxy terminated polydimethylsiloxane, vii) bis-dimethylhexenylsiloxy terminated poly(dimethylsiloxane Oxane/Methylhexenylsiloxane), viii) Bis-Dimethylhexenylsiloxane Terminated Polymethylhexenylsiloxane, ix) Bis-Trimethylsiloxane Poly(dimethylsiloxane/methylhexenylsiloxane), x) bis-trimethylsiloxy-terminated polymethylhexenylsiloxane, xi) bis-dimethicone Methylvinylsiloxy-terminated poly(dimethylsiloxane/methylhexenylsiloxane), xii) bis-dimethylhexenylsiloxy-terminated poly(dimethyl silicone/methylvinylsiloxane), and xiii) a combination of two or more of i) to xii). Alternatively, the starting material (A-1) may be selected from the group consisting of: i) bis-dimethylvinylsiloxy-terminated polydimethylsiloxane, vi) bis-dimethyl Hexenylsiloxy-terminated polydimethylsiloxanes, and combinations thereof. Alternatively, the starting material (A) may be bis-dimethylvinylsiloxy terminated polydimethylsiloxane.
製備起始材料(A-1)之上述烯基官能聚二有機矽氧烷的方法,諸如對應有機鹵矽烷及寡聚物之水解及縮合或環狀聚二有機矽氧烷之平衡係所屬技術領域中已知的,參見例如美國專利3,284,406;4,772,515;5,169,920;5,317,072;及6,956,087,其揭示製備具有烯基之直鏈聚二有機矽氧烷。具有烯基之直鏈聚二有機矽氧烷之實例係可自例如Morrisville, Pennsylvania, USA之Gelest Inc.以下列商標名稱商購得:DMS-V00、DMS-V03、DMS-V05、DMS-V21、DMS-V6、DMS-V25、DMS-V-31、DMS-V33、DMS-V34、DMS-V35、DMS-V41、DMS-V42、DMS-V43、DMS-V46、DMS-V51、DMS-V52。Processes for the preparation of the abovementioned alkenyl-functional polydiorganosiloxanes as starting materials (A-1), such as hydrolysis and condensation of corresponding organohalosilanes and oligomers or equilibration of cyclic polydiorganosiloxanes, belong to the state of the art Known in the art, see, eg, US Patents 3,284,406; 4,772,515; 5,169,920; 5,317,072; and 6,956,087, which disclose the preparation of linear polydiorganosiloxanes having alkenyl groups. Examples of linear polydiorganosiloxanes having alkenyl groups are commercially available, for example, from Gelest Inc. of Morrisville, Pennsylvania, USA under the following trade names: DMS-V00, DMS-V03, DMS-V05, DMS-V21 , DMS-V6, DMS-V25, DMS-V-31, DMS-V33, DMS-V34, DMS-V35, DMS-V41, DMS-V42, DMS-V43, DMS-V46, DMS-V51, DMS-V52 .
起始材料(A)可任選地進一步包含(A-2)具有單元式(R 1R 2SiO 2/2) c的環狀聚合物,其中R 1及R 2如上所述,且下標c是3至12。所屬技術領域中具有通常知識者將認識到,環狀聚合物可在製造上文所描述之線性烯基官能聚二有機矽氧烷的方法中形成為副產物。環狀烯基官能聚二有機矽氧烷之實例包括2,4,6-三甲基-2,4,6-三乙烯基-環三矽氧烷、2,4,6,8-四甲基-2,4,6,8-四乙烯基-環四矽氧烷、2,4,6,8,10-五甲基-2,4,6,8,10-五乙烯基-環五矽氧烷、及2,4,6,8,10,12-六甲基-2,4,6,8,10,12-六乙烯基-環六矽氧烷。此等環狀烯基官能聚二有機矽氧烷係所屬技術領域中已知的且可商購自例如,St. Louis, Missouri, USA之Sigma-Aldrich;Spartanburg, South Carolina, USA之Milliken;及其他供應商。以起始材料(A)至(D)的組合重量計,起始材料(A-2)的量可以是0至0.2%。起始材料(A)的餘量是上文所述的起始材料(A-1)。 (B)聚有機矽酸鹽樹脂 The starting material (A) may optionally further comprise (A-2) a cyclic polymer having the unit formula (R 1 R 2 SiO 2/2 ) c , wherein R 1 and R 2 are as described above, and the subscript c is 3 to 12. Those of ordinary skill in the art will recognize that cyclic polymers may be formed as by-products in the processes for making the linear alkenyl-functional polydiorganosiloxanes described above. Examples of cyclic alkenyl functional polydiorganosiloxanes include 2,4,6-trimethyl-2,4,6-trivinyl-cyclotrisiloxane, 2,4,6,8-tetramethyl 2,4,6,8-tetravinyl-cyclotetrasiloxane, 2,4,6,8,10-pentamethyl-2,4,6,8,10-pentaethenyl-cyclopentasiloxane Siloxane, and 2,4,6,8,10,12-hexamethyl-2,4,6,8,10,12-hexavinyl-cyclohexasiloxane. Such cyclic alkenyl functional polydiorganosiloxanes are known in the art and are commercially available, for example, from Sigma-Aldrich of St. Louis, Missouri, USA; Milliken of Spartanburg, South Carolina, USA; and other suppliers. The amount of starting material (A-2) may be 0 to 0.2% based on the combined weight of starting materials (A) to (D). The balance of the starting material (A) is the starting material (A-1) described above. (B) polyorganosilicate resin
起始材料(B)是聚有機矽酸鹽樹脂,其包含式R M 3SiO 1/2的單官能單元及式SiO 4/2的四官能單元(「Q」單元),其中各R M是選自上文所述之R 1及R 2之獨立選擇的單價烴基。替代地,各R M可選自甲基、乙烯基、及苯基。替代地,R M基團之至少三分之一,或者至少三分之二是甲基。替代地,單官能單元可藉由(Me 3SiO 1/2)及(Me 2ViSiO 1/2)例示。聚有機矽酸鹽樹脂可溶於溶劑中,例如液體烴,諸如苯、甲苯、二甲苯、乙苯、庚烷、及其二或更多者的組合;或可溶於液體有機矽化合物中,諸如低黏度線性及環狀聚二有機矽氧烷。 The starting material (B) is a polyorganosilicate resin comprising monofunctional units of the formula RM 3 SiO 1/2 and tetrafunctional units ("Q" units) of the formula SiO 4/2 , wherein each R M is an independently selected monovalent hydrocarbon group selected from R1 and R2 described above. Alternatively, each R M may be selected from methyl, vinyl, and phenyl. Alternatively, at least one-third, or at least two-thirds, of the groups of R M are methyl groups. Alternatively, the monofunctional unit can be exemplified by (Me 3 SiO 1/2 ) and (Me 2 ViSiO 1/2 ). Polyorganosilicate resins are soluble in solvents, such as liquid hydrocarbons, such as benzene, toluene, xylene, ethylbenzene, heptane, and combinations of two or more thereof; or in liquid organosilicon compounds, Such as low viscosity linear and cyclic polydiorganosiloxanes.
當製備時,聚有機矽酸鹽樹脂包含上述單官能及四官能單元,且聚有機矽酸鹽樹脂進一步包含具有矽醇(矽鍵結羥基)基團之單元,且可包含式Si(OSiR M 3) 4之新五聚體(neopentamer),其中R M係如上文所描述。如美國專利第9,593,209號第32欄,參考實例2中所描述的Si 29核磁共振(Nuclear Magnetic Resonance, NMR)光譜儀可用以測量單官能單元與四官能單元的莫耳比,其中該比率係表示為{M(樹脂)+(M(新五聚體)}/{Q(樹脂)+Q(新五聚體)},且表示聚有機矽酸鹽樹脂之樹脂部分及新五聚體部分的三有機矽氧基(M單元)的總數對樹脂部分及新五聚體部分中之矽酸鹽基(Q單元)的總數的莫耳比。 When prepared, the polyorganosilicate resin comprises the monofunctional and tetrafunctional units described above, and the polyorganosilicate resin further comprises units having silanol (silicon-bonded hydroxyl) groups, and may comprise the formula Si(OSiR M 3 ) The neopentamer of 4 , wherein R M is as described above. As in U.S. Patent No. 9,593,209, column 32, the Si 29 nuclear magnetic resonance (Nuclear Magnetic Resonance, NMR) spectrometer described in Reference Example 2 can be used to measure the molar ratio of monofunctional units to tetrafunctional units, wherein the ratio is expressed as {M(resin)+(M(new pentamer)}/{Q(resin)+Q(new pentamer)}, and represent the resin part of the polyorganosilicate resin and the three parts of the new pentamer part The molar ratio of the total number of organosiloxy groups (M units) to the total number of silicate groups (Q units) in the resin fraction and neopentamer fraction.
聚有機矽酸鹽樹脂之Mn取決於各種因素,其包括由存在之R M表示的烴基的類型。聚有機矽酸鹽樹脂之Mn係指根據美國專利第9,593,209號第31欄,參考實例1中之程序使用凝膠滲透層析術(gel permeation chromatography, GPC)當自該測量排除代表新五聚體之峰時所測得的數目平均分子量。聚有機矽酸鹽樹脂之Mn可以是1,500或更大、替代地大於3,000 g/mol、替代地1,500 g/mol至15,000 g/mol、及替代地3,000 g/mol至8,000 g/mol。替代地,聚有機矽酸鹽樹脂之Mn可以是4,500 g/mol至7,500 g/mol。 The Mn of the polyorganosilicate resin depends on various factors including the type of hydrocarbyl represented by R M present. The Mn of polyorganosilicate resins refers to gel permeation chromatography (GPC) using gel permeation chromatography (GPC) according to the procedure in US Pat. The number average molecular weight measured at the peak. The Mn of the polyorganosilicate resin can be 1,500 or greater, alternatively greater than 3,000 g/mol, alternatively 1,500 g/mol to 15,000 g/mol, and alternatively 3,000 g/mol to 8,000 g/mol. Alternatively, the Mn of the polyorganosilicate resin may be 4,500 g/mol to 7,500 g/mol.
聚有機矽酸鹽樹脂可以藉由任何適合的方法製備,諸如對應矽烷的共水解或藉由二氧化矽水溶膠封蓋方法。聚有機矽酸鹽樹脂可藉由二氧化矽水溶膠加蓋程序製備,諸如Daudt等人於美國專利第2,676,182號;Rivers-Farrell等人於美國專利第4,611,042號;及Butler等人於美國專利第4,774,310號中所揭示者。上述Daudt等人之方法涉及使二氧化矽水溶膠在酸性條件下與可水解之三有機矽烷(諸如三甲基氯矽烷)、矽氧烷(諸如六甲基二矽氧烷)、或其混合物反應,及回收具有單官能單元及四官能單元的共聚物。所得共聚物一般含有2至5重量百分比的羥基。Polyorganosilicate resins can be prepared by any suitable method, such as cohydrolysis of corresponding silanes or by silica hydrosol capping methods. Polyorganosilicate resins can be prepared by silica hydrosol capping procedures such as Daudt et al., U.S. Patent No. 2,676,182; Rivers-Farrell et al., U.S. Patent No. 4,611,042; and Butler et al., U.S. Patent No. as disclosed in No. 4,774,310. The above-mentioned method of Daudt et al. involves reacting a silica hydrosol with a hydrolyzable triorganosilane (such as trimethylchlorosilane), a siloxane (such as hexamethyldisiloxane), or a mixture thereof under acidic conditions. reaction, and recovery of copolymers with monofunctional units and tetrafunctional units. The resulting copolymer generally contains 2 to 5 weight percent hydroxyl groups.
用於製備聚有機矽酸鹽樹脂之中間體可係三有機矽烷及具有四個可水解取代基之矽烷或鹼金屬矽酸鹽。三有機矽烷可具有式R 1 3SiX 1,其中R 1係如上所述且X 1表示可水解取代基。具有四個可水解取代基之矽烷可具有式SiX 2 4,其中各X 2是鹵素、烷氧基或羥基。適合之鹼金屬矽酸鹽包括矽酸鈉。 The intermediates used in the preparation of polyorganosilicate resins can be triorganosilanes and silanes with four hydrolyzable substituents or alkali metal silicates. Triorganosilanes may have the formula R 1 3 SiX 1 , wherein R 1 is as described above and X 1 represents a hydrolyzable substituent. A silane with four hydrolyzable substituents may have the formula SiX24 , where each X2 is halogen, alkoxy, or hydroxyl. Suitable alkali metal silicates include sodium silicate.
如上所述製備之聚有機矽酸鹽樹脂一般含有矽鍵結羥基,亦即具有式HOSi 3/2及/或(HO) xR M (3-x)SiO 1/2,其中下標x是1、2或3。存在於聚有機矽酸鹽樹脂中之矽鍵結羥基的濃度可根據ASTM標準E-168-16 (ASTM Standard E-168-16),使用傅立葉紅外線(Fourier Transform-Infra Red, FTIR)光譜儀來判定。對於某些應用,矽鍵結羥基之量可能需要低於0.7%,替代地低於0.3%,替代地小於1%,及替代地0.3%至0.8%。在製備聚有機矽酸鹽樹脂期間所形成之矽鍵結羥基可以藉由使該聚矽氧樹脂與含有適當端基之矽烷、二矽氧烷、或二矽氮烷反應而轉化成三烴基矽氧烷基團或不同的可水解基團。含有可水解基團之矽烷可以是以與聚有機矽酸鹽樹脂上之矽鍵結羥基反應所需量的莫耳過量添加。 Polyorganosilicate resins prepared as described above typically contain silicon-bonded hydroxyl groups, i.e., have the formula HOSi 3/2 and/or (HO) x R M (3-x) SiO 1/2 , where the subscript x is 1, 2 or 3. The concentration of silicon-bonded hydroxyl groups present in polyorganosilicate resins can be determined according to ASTM Standard E-168-16 (ASTM Standard E-168-16) using a Fourier Transform-Infra Red (FTIR) spectrometer . For certain applications, the amount of silicon-bonded hydroxyl groups may need to be less than 0.7%, alternatively less than 0.3%, alternatively less than 1%, and alternatively 0.3% to 0.8%. Silicon-bonded hydroxyl groups formed during the preparation of polyorganosilicate resins can be converted to trialkylsilanes by reacting the polysiloxane resin with silanes, disiloxanes, or disilazanes containing appropriate terminal groups. Oxyalkyl groups or different hydrolyzable groups. Silanes containing hydrolyzable groups can be added in molar excess in the amount required to react with the silicon-bonded hydroxyl groups on the polyorganosilicate resin.
替代地,聚有機矽酸鹽樹脂可具有末端脂族不飽和基團(例如,烯基)。具有末端脂族不飽和基團之聚有機矽酸鹽樹脂可以藉由使Daudt等人的產物與含不飽和有機基團之封端劑及不含脂族不飽和性封端劑反應來製備,其量足以在最終產物中提供3至30莫耳百分比的不飽和有機基團。封端劑之實例包括(但不限於)矽氮烷、矽氧烷及矽烷。適合的封端劑係所屬技術領域中已知並且係例示於美國專利第4,584,355號;第4,591,66號;及第4,585,836號中。單一封端劑或此類試劑之混合物可用於製備此類樹脂。Alternatively, the polyorganosilicate resin may have terminal aliphatic unsaturation (eg, alkenyl). Polyorganosilicate resins with terminal aliphatic unsaturation can be prepared by reacting the product of Daudt et al. with a capping agent containing unsaturated organic groups and without aliphatic unsaturation, The amount is sufficient to provide 3 to 30 mole percent unsaturated organic groups in the final product. Examples of capping agents include, but are not limited to, silazanes, siloxanes, and silanes. Suitable capping agents are known in the art and are exemplified in US Patent Nos. 4,584,355; 4,591,66; and 4,585,836. A single capping agent or a mixture of such agents can be used to prepare such resins.
聚有機矽酸鹽樹脂可具有單元式(R 1 2R 2SiO 1/2) d(R 1 3SiO 2/2) e(SiO 4/2) f(HO 1/2) g,其中R 1及R 2如上所述,下標e、f、g、及h表示樹脂中各單元的莫耳分率,且具有以下值:d > 0,e ≥ 0,f > 0,量(d + e + f)= 1,且樹脂具有1,500 g/mol至15,000 g/mol之數目平均分子量,且下標g > 0,其限制條件為下標g具有足以提供以樹脂重量計具有0至2重量%之羥基含量的樹脂的值。聚有機矽酸鹽樹脂亦可商購獲得,例如DOWSIL™ 6-3444 Int可購自DSC。 The polyorganosilicate resin may have the unit formula (R 1 2 R 2 SiO 1/2 ) d (R 1 3 SiO 2/2 ) e (SiO 4/2 ) f (HO 1/2 ) g , where R 1 And R 2 As mentioned above, the subscripts e, f, g, and h represent the mole fraction of each unit in the resin, and have the following values: d > 0, e > 0, f > 0, the amount (d + e + f) = 1, and the resin has a number average molecular weight of 1,500 g/mol to 15,000 g/mol, and the subscript g > 0, with the proviso that the subscript g has sufficient The value of the hydroxyl content of the resin. Polyorganosilicate resins are also commercially available, for example DOWSIL™ 6-3444 Int is available from DSC.
矽氫化可固化聚有機矽氧烷組成物中之(B)聚有機矽酸鹽樹脂的量取決於各種因素,包括(A)聚二有機矽氧烷聚合物的類型及量、起始材料(A)及(B)的烯基含量、及起始材料(C)的矽鍵合氫含量。然而,以起始材料(A)、(B)、(C)、及(D)的組合重量計,(B)聚有機矽酸鹽樹脂的量可以是40%至48.59%。 (C)聚有機氫矽氧烷 The amount of (B) polyorganosilicate resin in the hydrosilylation curable polyorganosiloxane composition depends on various factors, including the type and amount of (A) polydiorganosiloxane polymer, starting materials ( Alkenyl content of A) and (B), and silicon-bonded hydrogen content of starting material (C). However, the amount of (B) polyorganosilicate resin may be 40% to 48.59% based on the combined weight of the starting materials (A), (B), (C), and (D). (C) Polyorganohydrogensiloxane
矽氫化可固化聚有機矽氧烷組成物之起始材料(C)是聚有機氫矽氧烷。聚有機氫矽氧烷可具有單元式(R 1 2HSiO 1/2) h(R 1 3SiO 1/2) i(R 1 2SiO 2/2) j(R 1HSiO 2/2) k,其中R 1如上所述,下標h、i、j、及k表示每分子各單元的平均數,0 ≤ h ≤ 2,0 ≤ i ≤ 2,(h + i) = 2,0 ≤ j < 10,0 < k < 10,0 < (j + k) < 10,且2 ≤ (h + k) ≤ 12。替代地,h可以是0且i可以是2。替代地,j可以是0至5,替代地1至4,替代地2至4,及替代地3至3.5。替代地,k可以是1至10,替代地2至9,替代地3至8,替代地4至7,及替代地5至6。 The starting material (C) of the hydrosilylation-curable polyorganosiloxane composition is polyorganohydrogensiloxane. The polyorganohydrogensiloxane may have the unit formula (R 1 2 HSiO 1/2 ) h (R 1 3 SiO 1/2 ) i (R 1 2 SiO 2/2 ) j (R 1 HSiO 2/2 ) k , Wherein R 1 is as above, subscript h, i, j, and k represent the average number of units per molecule, 0 ≤ h ≤ 2, 0 ≤ i ≤ 2, (h + i) = 2, 0 ≤ j < 10, 0 < k < 10, 0 < (j + k) < 10, and 2 ≤ (h + k) ≤ 12. Alternatively, h can be 0 and i can be 2. Alternatively, j may be 0 to 5, alternatively 1 to 4, alternatively 2 to 4, and alternatively 3 to 3.5. Alternatively, k may be 1 to 10, alternatively 2 to 9, alternatively 3 to 8, alternatively 4 to 7, and alternatively 5 to 6.
適用於本文中之聚有機氫矽氧烷係藉由以下例示:(i)雙-二甲基氫矽氧基封端之聚(二甲基矽氧烷/甲基氫矽氧烷),(ii)雙-二甲基氫矽氧基封端之聚甲基氫矽氧烷,(iii)雙-三甲基矽氧基封端之聚(二甲基矽氧烷/甲基氫矽氧烷),(iv)雙-三甲基矽氧基封端之聚甲基氫矽氧烷,(v) α-二甲基氫矽氧基-ω-三甲基矽氧基封端之聚(二甲基矽氧烷/甲基氫矽氧烷),(vi) α-二甲基氫矽氧基-ω-三甲基矽氧基封端之聚甲基氫矽氧烷,及(vii)其二或更多者的組合。Polyorganohydrogensiloxanes suitable for use herein are exemplified by (i) bis-dimethylhydrogensiloxy terminated poly(dimethylsiloxane/methylhydrogensiloxane), ( ii) bis-dimethylhydrogensiloxy-terminated polymethylhydrogensiloxane, (iii) bis-trimethylsiloxy-terminated poly(dimethylsiloxane/methylhydrogensiloxane alkane), (iv) bis-trimethylsiloxy-terminated polymethylhydrogensiloxane, (v) α-dimethylhydrogensiloxy-ω-trimethylsiloxy-terminated polymethylhydrogensiloxane (dimethylsiloxane/methylhydrogensiloxane), (vi) α-dimethylhydrogensiloxy-ω-trimethylsiloxy-terminated polymethylhydrogensiloxane, and ( vii) A combination of two or more thereof.
聚有機氫矽氧烷亦可商購獲得,例如可購自Morrisville, Pennsylvania, USA之Gelest, Inc的那些,例如HMS-H271 (i)、HMS-071 (iii)、HMS-993 (iv);HMS-301及HMS-301 R (iii)、HMS-031 (iii)、HMS-991 (iv)、HMS-992 (iv)、HMS-993 (iv)、HMS-082 (iii)、HMS-151 (iii)、HMS-013 (iii)、HMS-053 (iii)、HAM-301(辛基官能性)、及HMS-HM271 (v)。替代地,本文使用的聚有機氫矽氧烷可選自由下列組成之群組:(iii)雙-三甲基矽氧基封端之聚(二甲基矽氧烷/甲基氫矽氧烷),(iv)雙-三甲基矽氧基封端之聚甲基氫矽氧烷,及其組合。聚有機氫矽氧烷亦可購自DSC,諸如DOWSIL™ 6-3570聚合物。本文中適用於製備聚有機氫矽氧烷的方法,諸如有機鹵矽烷的水解及縮合係所屬技術領域中熟知的,如例示於Speier等人之美國專利第2,87,218號;Jeram等人之美國專利第3,957,713號;及Hardman等人之美國專利第4,329,273號中。Polyorganohydrogensiloxanes are also commercially available, such as those available from Gelest, Inc of Morrisville, Pennsylvania, USA, for example HMS-H271(i), HMS-071(iii), HMS-993(iv); HMS-301 and HMS-301 R (iii), HMS-031 (iii), HMS-991 (iv), HMS-992 (iv), HMS-993 (iv), HMS-082 (iii), HMS-151 (iii), HMS-013 (iii), HMS-053 (iii), HAM-301 (octyl functionality), and HMS-HM271 (v). Alternatively, the polyorganohydrogensiloxane used herein may be selected from the group consisting of (iii) bis-trimethylsiloxy terminated poly(dimethylsiloxane/methylhydrogensiloxane ), (iv) bis-trimethylsiloxy terminated polymethylhydrogensiloxane, and combinations thereof. Polyorganohydrogensiloxanes are also commercially available from DSC, such as DOWSIL™ 6-3570 polymer. Methods suitable herein for preparing polyorganohydrogensiloxanes, such as the hydrolysis and condensation of organohalosilanes, are well known in the art, as exemplified in U.S. Patent No. 2,87,218 to Speier et al; Patent No. 3,957,713; and US Patent No. 4,329,273 to Hardman et al.
可使用根據ASTM E168之定量紅外分析來判定聚有機氫矽氧烷的矽鍵結氫(Si-H)含量。當依賴於矽氫化反應固化製程時,矽鍵結氫對烯基(例如,乙烯基)比率(亦即,SiH/Vi比)是重要的。通常,此係藉由計算組成物中之烯基(例如乙烯基[V])的總重量%及組成物中之矽鍵結氫[H]的總重量%來判定,且由於氫的分子量是1且乙烯基的分子量是27,則矽鍵結氫對乙烯基的莫耳比[H]/[V]是27。上述起始材料(A)、(B)、及(C)可經選擇以提供0.3至0.55、替代地0.31至0.53、替代地0.4至0.5、及替代地0.41至0.49的SiH/Vi比。 (D)矽氫化反應催化劑 The silicon-bonded hydrogen (Si-H) content of polyorganohydrogensiloxanes can be determined using quantitative infrared analysis according to ASTM E168. The silicon-bonded hydrogen to alkenyl (eg, vinyl) ratio (ie, SiH/Vi ratio) is important when relying on the hydrosilylation reaction curing process. Usually, this is determined by calculating the total weight % of alkenyl groups (such as vinyl [V]) in the composition and the total weight % of silicon-bonded hydrogen [H] in the composition, and since the molecular weight of hydrogen is 1 and the molecular weight of vinyl is 27, then the molar ratio [H]/[V] of silicon-bonded hydrogen to vinyl is 27. The aforementioned starting materials (A), (B), and (C) may be selected to provide a SiH/Vi ratio of 0.3 to 0.55, alternatively 0.31 to 0.53, alternatively 0.4 to 0.5, and alternatively 0.41 to 0.49. (D) Catalyst for hydrosilylation reaction
矽氫化可固化聚有機矽氧烷組成物中之起始材料(D)是矽氫化反應催化劑。此催化劑將促進起始材料(A)及(B)中之烯基與起始材料(C)及中之矽鍵結氫原子之間的反應。該催化劑包含鉑族金屬。鉑族金屬可選自由鉑、銠、釕、鈀、鋨、及銥組成之群組。替代地,鉑族金屬可以是鉑。例如,矽氫化反應催化劑可選自由下列組成之群組:上述(D-1)鉑族金屬;(D-2)此類金屬之化合物,例如氯化參(三苯基膦)銠(I)(威金森氏催化劑(Wilkinson’s Catalyst))、銠二膦螯合物,諸如[1,2-雙(二苯基膦基)乙烷]二氯二銠或[1,2-雙(二乙基膦基)乙烷]二氯二銠、氯鉑酸(施派爾氏催化劑(Speier’s Catalyst))、氯鉑酸六水合物、二氯鉑;(D-3)化合物(D-2)與烯基官能有機聚矽氧烷的錯合物;(D-4)鉑族金屬化合物,其微封裝於基質或芯殻(coreshell)型結構中;或(D-5)錯合物(D-3),其微封裝於此類基質或芯殻型結構中。鉑與烯基官能有機聚矽氧烷之錯合物包括具有鉑之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物(卡斯特氏催化劑(Karstedt's Catalyst))及在四甲基四乙烯基環四矽氧烷中的Pt(0)錯合物(阿什比氏催化劑(Ashby's Catalyst))。起始材料(D)之合適含鉑催化劑的特定實例包括氯鉑酸(呈六水合物形式或無水形式)或含鉑催化劑,其係藉由包含使氯鉑酸與脂族不飽和有機矽化合物(諸如二乙烯基四甲基二矽氧烷)或烯烴-鉑-矽基錯合物反應的方法來獲得,如Roy的美國專利6,605,734中所描述。此等烯烴-鉑-矽基錯合物可例如藉由將0.015莫耳(COD)PtCl 2與0.045莫耳COD及0.0612莫耳HMeSiCl 2混合來製備,其中COD表示環辛二烯基且Me表示甲基。其他例示性矽氫化反應催化劑係描述於美國專利Speier的2,87,218;Ashby的3,159,601;Lamoreaux的3,60,972;Chalk等人的3,296,291;Willing的3,419,593;Modic的3,516,946;Karstedt的3,715,334;Karstedt的3,814,730;Chandra的3,928,629;Lee等人的3,989,668;Lee等人的4,766,176;Lee等人的4,784,879;Togashi的5,017,654;Chung等人的5,036,117;及Brown的5,175,325;及Togashi等人的EP 0 347 895 A。起始材料(D)之合適的矽氫化反應催化劑是可商購的,例如,DOWSIL™ 3-8015 Int(鉑#2)、SYL-OFF™ 4000 Catalyst、及SYL-OFF™ 2700可購自DSC。 The starting material (D) in the hydrosilylation-curable polyorganosiloxane composition is a hydrosilylation reaction catalyst. This catalyst will facilitate the reaction between the alkenyl groups in the starting materials (A) and (B) and the silicon-bonded hydrogen atoms in the starting materials (C) and (B). The catalyst contains platinum group metals. The platinum group metal may be selected from the group consisting of platinum, rhodium, ruthenium, palladium, osmium, and iridium. Alternatively, the platinum group metal may be platinum. For example, the hydrosilylation catalyst may be selected from the group consisting of: the above-mentioned (D-1) platinum group metals; (D-2) compounds of such metals, such as chlorinated ginseng (triphenylphosphine) rhodium (I) (Wilkinson's Catalyst), rhodium diphosphine chelates such as [1,2-bis(diphenylphosphino)ethane] dirhodium dichloride or [1,2-bis(diethylphosphino) Phosphino)ethane]dichlorodirhodium, chloroplatinic acid (Speier's Catalyst), chloroplatinic acid hexahydrate, dichloroplatinum; (D-3) compound (D-2) and olefin complexes of functional organopolysiloxanes; (D-4) platinum group metal compounds microencapsulated in a matrix or coreshell (coreshell) type structure; or (D-5) complexes (D-3 ), which are microencapsulated in such matrix or core-shell structures. Complexes of platinum with alkenyl-functional organopolysiloxanes include 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complexes with platinum (Castells Catalysts (Karstedt's Catalyst)) and Pt(0) complexes in tetramethyltetravinylcyclotetrasiloxane (Ashby's Catalyst). Specific examples of suitable platinum-containing catalysts for starting material (D) include chloroplatinic acid (in hexahydrate or anhydrous form) or platinum-containing catalysts obtained by combining chloroplatinic acid with an aliphatically unsaturated organosilicon compound (such as divinyltetramethyldisiloxane) or olefin-platinum-silicon-based complex reactions, as described in Roy's US Patent 6,605,734. Such olefin-platinum-silicon-based complexes can be prepared, for example, by mixing 0.015 moles of (COD)PtCl with 0.045 moles of COD and 0.0612 moles of HMeSiCl, where COD represents cyclooctadienyl and Me represents methyl. Other exemplary hydrosilation catalysts are described in U.S. Patents 2,87,218 to Speier; 3,159,601 to Ashby; 3,60,972 to Lamoreaux; 3,296,291 to Chalk et al; 3,928,629 to Chandra; 3,989,668 to Lee et al; 4,766,176 to Lee et al; 4,784,879 to Lee et al; 5,017,654 to Togashi; Suitable hydrosilylation catalysts for starting material (D) are commercially available, for example, DOWSIL™ 3-8015 Int (Platinum #2), SYL-OFF™ 4000 Catalyst, and SYL-OFF™ 2700 are available from DSC .
起始材料(D)可以是一種矽氫化反應催化劑或上述矽氫化反應催化劑之二或更多種的組合。組成物中之(D)矽氫化反應催化劑在的量將取決於各種因素,包括起始材料(A)、(B)、及(C)的選擇,以及當存在任何可選的額外起始材料時;以及其相應烯基及矽鍵結氫原子的含量,以及矽氫化反應抑制劑是否存在於組成物中,然而,催化劑的量足以催化SiH與烯基的矽氫化反應,替代地催化劑的量足以提供至少0.01 ppm、替代地至少0.05 ppm、替代地至少0.1 ppm、替代地至少0.5 ppm、及替代地至少1 ppm以質量計的鉑族金屬,以起始材料(A)、(B)、(C)、及(D)的組合量計。同時,催化劑的量足以提供至多800 ppm、替代地至多500 ppm、及替代地至多100 ppm以質量計的鉑族金屬,以相同的基礎計。替代地,當(D)矽氫化反應催化劑包含與烯基官能有機矽氧烷錯合之鉑,該量可以是0.01重量%至0.02重量%,以起始材料(A)至(D)的組合重量計。 額外起始材料 The starting material (D) may be one hydrosilylation catalyst or a combination of two or more of the above hydrosilylation catalysts. The amount of (D) hydrosilylation catalyst in the composition will depend on various factors, including the selection of starting materials (A), (B), and (C), and the presence of any optional additional starting materials and the content of the corresponding alkenyl and silicon-bonded hydrogen atoms, and whether a hydrosilylation inhibitor is present in the composition, however, the amount of catalyst is sufficient to catalyze the hydrosilylation reaction of SiH and alkenyl, alternatively the amount of catalyst Sufficient to provide at least 0.01 ppm, alternatively at least 0.05 ppm, alternatively at least 0.1 ppm, alternatively at least 0.5 ppm, and alternatively at least 1 ppm by mass of platinum group metals, starting materials (A), (B), (C), and (D) combination meter. At the same time, the amount of catalyst is sufficient to provide at most 800 ppm, alternatively at most 500 ppm, and alternatively at most 100 ppm by mass of platinum group metals, on the same basis. Alternatively, when (D) the hydrosilylation catalyst comprises platinum complexed with an alkenyl functional organosiloxane, the amount may be 0.01% to 0.02% by weight, based on the combination of starting materials (A) to (D) weighing scale. additional starting material
矽氫化可固化聚有機矽氧烷組成物可任選地進一步包含一或多種額外的起始材料。例如,額外的起始材料可選自由下列組成之群組:(E)矽氫化反應抑制劑、(F)助黏劑、(G)溶劑、及(H)濕潤劑、以及(E)至(H)之二或更多者的組合。 (E)矽氫化反應抑制劑 The hydrosilylation-curable polyorganosiloxane composition may optionally further comprise one or more additional starting materials. For example, additional starting materials may be selected from the group consisting of (E) hydrosilylation inhibitors, (F) adhesion promoters, (G) solvents, and (H) wetting agents, and (E) to ( H) A combination of two or more. (E) Hydrosilation reaction inhibitor
起始材料(E)是矽氫化反應抑制劑(抑制劑),其可用於改變矽氫化反應之速率,與組成物相比含有相同的起始材料但省略抑制劑。起始材料(E)可選自由下列組成之群組:(E1)炔醇、(E2)矽烷化炔醇、(E3)烯-炔化合物、(E4)三唑、(E5)膦、(E6)硫醇、(E7)肼、(E8)胺、(E9)反丁烯二酸酯(fumarate)、(E10)順丁烯二酸酯(maleate)、(E11)醚、(E12)一氧化碳、(E13)烯基官能矽氧烷寡聚物、及(E14)其二或更多者的組合。替代地,矽氫化反應抑制劑可選自由下列組成之群組:(E1)炔醇、(E2)矽烷化炔醇、(E9)反丁烯二酸酯、(E10)順丁烯二酸酯、(E13)一氧化碳、(E14)其二或更多者的組合。The starting material (E) is a hydrosilylation reaction inhibitor (inhibitor), which can be used to modify the rate of the hydrosilylation reaction, compared to a composition containing the same starting material but omitting the inhibitor. The starting material (E) may be selected from the group consisting of: (E1) acetylenic alcohols, (E2) silylated acetylenic alcohols, (E3) en-yne compounds, (E4) triazoles, (E5) phosphines, (E6) ) thiol, (E7) hydrazine, (E8) amine, (E9) fumarate, (E10) maleate, (E11) ether, (E12) carbon monoxide, (E13) an alkenyl functional siloxane oligomer, and (E14) a combination of two or more thereof. Alternatively, the hydrosilylation inhibitor may be selected from the group consisting of: (E1) acetylenic alcohols, (E2) silylated acetylenic alcohols, (E9) fumarate esters, (E10) maleate esters , (E13) carbon monoxide, (E14) a combination of two or more thereof.
炔醇係由以下例示:3,5-二甲基-1-己炔-3-醇、1-丁炔-3-醇、1-丙炔-3-醇、甲基丁炔基(諸如2-甲基-3-丁炔-2-醇及3-甲基-1-丁炔-3-醇)、3-甲基-1-戊炔-3-醇、3-苯基-1-丁炔-3-醇、4-乙基-1-辛炔-3-醇、3,5-二甲基-1-己炔-3-醇、及乙炔基環己醇(諸如1-乙炔基-1-環己醇)、及其組合。乙炔醇是本領域中已知的且可購自各種來源,參見例如Kookootsedes等人的美國專利3,445,420。替代地,抑制劑可為矽烷化炔屬化合物。在不希望受到理論束縛的情況下,認為相較於不包括矽基化炔屬化合物或包括有機炔醇抑制劑的起始材料之矽氫化反應產物,添加矽基化炔屬化合物會降低自矽氫化反應製備之反應產物的黃化,諸如上述者。矽烷化炔屬化合物係由以下例示:(3-甲基-1-丁炔-3-氧基)三甲基矽烷、((1,1-二甲基-2-丙炔基)氧基)三甲基矽烷、雙(3-甲基-1-丁炔-3-氧基)二甲基矽烷、雙(3-甲基-1-丁炔-3-氧基)矽烷甲基乙烯基矽烷、雙((1,1-二甲基-2-丙炔基)氧基)二甲基矽烷、甲基(參(1,1-二甲基-2-丙炔基氧基))矽烷、甲基(參(3-甲基-1-丁炔-3-氧基))矽烷、(3-甲基-1-丁炔-3-氧基)二甲基苯基矽烷、(3-甲基-1-丁炔-3-氧基)二甲基己烯基矽烷、(3-甲基-1-丁炔-3-氧基)三乙基矽烷、雙(3-甲基-1-丁炔-3-氧基)甲基三氟丙基矽烷、(3,5-二甲基-1-己炔-3-氧基)三甲基矽烷、(3-苯基-1-丁炔-3-氧基)二苯基甲基矽烷、(3-苯基-1-丁炔-3-氧基)二甲基苯基矽烷、(3-苯基-1-丁炔-3-氧基)二甲基乙烯基矽烷、(3-苯基-1-丁炔-3-氧基)二甲基己烯基矽烷、(環己基-1-乙炔-1-氧基)二甲基己烯基矽烷、(環己基-1-乙炔-1-氧基)二甲基乙烯基矽烷、(環己基-1-乙炔-1-氧基)二苯基甲基矽烷、(環己基-1-乙炔-1-氧基)三甲基矽烷及其組合。在本文中可用作抑制劑之矽基化炔屬化合物可藉由所屬技術領域中已知的方法製備,例如Bilgrien等人的美國專利6,677,407揭示藉由在酸受體存在下使上述炔醇與氯矽烷反應而使炔醇矽基化。Alkynyl alcohols are exemplified by: 3,5-dimethyl-1-hexyn-3-ol, 1-butyn-3-ol, 1-propyn-3-ol, methylbutynyl (such as 2 -methyl-3-butyn-2-ol and 3-methyl-1-butyn-3-ol), 3-methyl-1-pentyn-3-ol, 3-phenyl-1-but Alkyn-3-ol, 4-ethyl-1-octyn-3-ol, 3,5-dimethyl-1-hexyn-3-ol, and ethynylcyclohexanol (such as 1-ethynyl- 1-cyclohexanol), and combinations thereof. Acetynyl alcohols are known in the art and are commercially available from various sources, see eg US Patent 3,445,420 to Kookootsedes et al. Alternatively, the inhibitor may be a silylated acetylenic compound. Without wishing to be bound by theory, it is believed that the addition of a silylated acetylenic compound reduces the self-silylated Yellowing of reaction products prepared by hydrogenation reactions, such as those described above. Silylated acetylenic compounds are exemplified by: (3-methyl-1-butyne-3-oxy)trimethylsilane, ((1,1-dimethyl-2-propynyl)oxy) Trimethylsilane, bis(3-methyl-1-butyne-3-oxyl)dimethylsilane, bis(3-methyl-1-butyne-3-oxyl)silanemethylvinylsilane , bis((1,1-dimethyl-2-propynyl)oxy) dimethylsilane, methyl (reference (1,1-dimethyl-2-propynyloxy)) silane, Methyl (refer to (3-methyl-1-butyne-3-oxyl)) silane, (3-methyl-1-butyne-3-oxyl) dimethylphenylsilane, (3-methyl Base-1-butyne-3-oxyl)dimethylhexenylsilane, (3-methyl-1-butyne-3-oxyl)triethylsilane, bis(3-methyl-1- butyne-3-oxyl)methyltrifluoropropylsilane, (3,5-dimethyl-1-hexyne-3-oxyl)trimethylsilane, (3-phenyl-1-butyne -3-oxy)diphenylmethylsilane, (3-phenyl-1-butyne-3-oxyl)dimethylphenylsilane, (3-phenyl-1-butyne-3-oxy base) dimethylvinylsilane, (3-phenyl-1-butyne-3-oxyl)dimethylhexenylsilane, (cyclohexyl-1-ethynyl-1-oxyl)dimethylhexylsilane Alkenylsilane, (cyclohexyl-1-ethyn-1-oxyl)dimethylvinylsilane, (cyclohexyl-1-ethynyl-1-oxyl)diphenylmethylsilane, (cyclohexyl-1- Acetylene-1-oxy)trimethylsilane and combinations thereof. The silylated acetylenic compounds useful herein as inhibitors can be prepared by methods known in the art, for example, U.S. Patent 6,677,407 to Bilgrien et al. Chlorosilanes react to silylate acetylenic alcohols.
替代地,抑制劑可以是烯-炔化合物,諸如3-甲基-3-戊烯-1-炔、3,5-二甲基-3-己烯-1-炔;及其組合。替代地,抑制劑可包含三唑,例如苯并三唑。替代地,抑制劑可包含膦。替代地,抑制劑可包含硫醇。替代地,抑制劑可包含肼。替代地,抑制劑可包含胺。胺基係由以下例示:四甲基乙二胺、3-二甲基胺-1-丙炔、正甲基炔丙胺、炔丙胺、1-乙炔基環己胺或其組合。替代地,抑制劑可包含反丁烯二酸酯。反丁烯二酸酯包括反丁烯二酸二烷酯(諸如反丁烯二酸二乙酯)、反丁烯二酸二烯酯(諸如反丁烯二酸二烯丙酯)、及反丁烯二酸二烷氧基烷酯(諸如雙-(甲氧基甲基)反丁烯二酸乙酯)。替代地,抑制劑可包含順丁烯二酸酯。順丁烯二酸酯包括順丁烯二酸二烷酯(諸如順丁烯二酸二乙酯)、順丁烯二酸二烯酯(諸如順丁烯二酸二烯丙酯)、及順丁烯二酸二烷氧基烷酯(諸如雙-(甲氧基甲基)順丁烯二酸乙酯)。替代地,抑制劑可包含醚。Alternatively, the inhibitor may be an en-yne compound, such as 3-methyl-3-penten-1-yne, 3,5-dimethyl-3-hexen-1-yne; and combinations thereof. Alternatively, the inhibitor may comprise a triazole, such as benzotriazole. Alternatively, the inhibitor may comprise a phosphine. Alternatively, the inhibitor may comprise a thiol. Alternatively, the inhibitor may comprise hydrazine. Alternatively, inhibitors may comprise amines. Amino groups are exemplified by tetramethylethylenediamine, 3-dimethylamine-1-propyne, n-methylpropargylamine, propargylamine, 1-ethynylcyclohexylamine, or combinations thereof. Alternatively, the inhibitor may comprise a fumarate. Fumarates include dialkyl fumarates such as diethyl fumarate, dienyl fumarates such as diallyl fumarate, and trans Dialkoxyalkyl butenedioates (such as bis-(methoxymethyl)ethyl fumarate). Alternatively, the inhibitor may comprise maleate. Maleic esters include dialkyl maleates such as diethyl maleate, dienyl maleates such as diallyl maleate, and maleic acid Dialkoxyalkylbutenedioate (such as bis-(methoxymethyl)ethylmaleate). Alternatively, the inhibitor may comprise an ether.
替代地,抑制劑可包含一氧化碳。替代地,抑制劑可包含烯基官能矽氧烷寡聚物,其可以是環狀或線性的,諸如甲基乙烯基環矽氧烷,例如1,3,5,7-四甲基-1,3,5,7-四乙烯基環四矽氧烷、1,3,5,7-四甲基-1,3,5,7-四己烯基環四矽氧烷、1,3-二乙烯基-1,3-二苯基-1,3-二甲基二矽氧烷;1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷;及其二或更多者之組合。可用作上述抑制劑之化合物係可商購的,例如可購自Sigma-Aldrich Inc.或Gelest, Inc.,且係本領域中已知的,例如參見Lee,等人的美國專利3,989,667。適合於本文中使用之抑制劑係藉由在美國專利申請案20007/0099007之段落[0148]至[0165]中描述為穩定劑E的彼等例示。Alternatively, the suppressant may comprise carbon monoxide. Alternatively, the inhibitor may comprise alkenyl functional siloxane oligomers, which may be cyclic or linear, such as methylvinylcyclosiloxane, e.g. 1,3,5,7-tetramethyl-1 ,3,5,7-tetravinylcyclotetrasiloxane, 1,3,5,7-tetramethyl-1,3,5,7-tetrahexenylcyclotetrasiloxane, 1,3- Divinyl-1,3-diphenyl-1,3-dimethyldisiloxane; 1,3-divinyl-1,1,3,3-tetramethyldisiloxane; and A combination of two or more. Compounds useful as such inhibitors are commercially available, eg, from Sigma-Aldrich Inc. or Gelest, Inc., and are known in the art, eg, see US Patent 3,989,667 to Lee, et al. Inhibitors suitable for use herein are exemplified by those described as Stabilizer E in paragraphs [0148] to [0165] of US Patent Application 20007/0099007.
抑制劑的量將取決於各種因素,包括所需的適用期、組成物是一份組成物或多份組成物、所使用的具體抑制劑、及矽氫化反應催化劑的選擇及量。然而,以組成物中之起始材料(A)、(B)、(C)、及(D)的組合重量計,抑制劑的量可以是0%至1%,替代地0%至5%,替代地0.001%至1%,替代地0.01%至0.5%,及替代地0.0025%至0.025%。 (F)助黏劑 The amount of inhibitor will depend on various factors including the desired pot life, whether the composition is a single composition or multiple compositions, the particular inhibitor used, and the choice and amount of the hydrosilylation catalyst. However, the amount of inhibitor may be 0% to 1%, alternatively 0% to 5%, based on the combined weight of the starting materials (A), (B), (C), and (D) in the composition , alternatively 0.001% to 1%, alternatively 0.01% to 0.5%, and alternatively 0.0025% to 0.025%. (F) Adhesion promoter
起始材料(F)是可被任選地添加至矽氫化可固化聚有機矽氧烷組成物的助黏劑。適合助黏劑可包含過渡金屬螯合物、烴氧基矽烷(諸如烷氧基矽烷)、烷氧基矽烷及烴基官能聚有機矽氧烷之組合、胺基官能矽烷或其組合。助黏劑是所屬技術領域中已知的,且可包含具有式R 3 rR 4 sSi(OR 5) 4-(r + s)之矽烷,其中各R 3獨立地係具有至少3個碳原子之單價有機基團;R 4含有至少一個SiC鍵結取代基,其具有助黏基團,諸如胺基、環氧基、巰基或丙烯酸酯基團;下標r具有0至2的值;下標s為1或2;並且(r + s)的總和不大於3。各R 5獨立地係飽和烴基。R 5的飽和烴基可以是例如具有1至4個碳原子、替代地1至2個碳原子的烷基。R 5係由甲基、乙基、丙基、及丁基例示。替代地,助黏劑可包括上述矽烷的部分縮合物。替代地,助黏劑可包括上述矽烷的部分縮合物。替代地,助黏劑可包括烷氧基矽烷與烴基官能性聚有機矽氧烷的組合。 The starting material (F) is an adhesion promoter that may optionally be added to the hydrosilylation-curable polyorganosiloxane composition. Suitable adhesion promoters may include transition metal chelates, alkoxysilanes such as alkoxysilanes, combinations of alkoxysilanes and alkyl-functional polyorganosiloxanes, amino-functional silanes, or combinations thereof. Adhesion promoters are known in the art and may comprise silanes having the formula R 3 r R 4 s Si(OR 5 ) 4-(r + s) , wherein each R 3 independently has at least 3 carbons A monovalent organic group of atoms; R contains at least one SiC-bonded substituent with an adhesion-promoting group, such as an amine, epoxy, mercapto or acrylate group; the subscript r has a value from 0 to 2; The subscript s is 1 or 2; and the sum of (r + s) is not greater than 3. Each R 5 is independently a saturated hydrocarbon group. The saturated hydrocarbon group of R 5 may be, for example, an alkyl group having 1 to 4 carbon atoms, alternatively 1 to 2 carbon atoms. R 5 is exemplified by methyl, ethyl, propyl, and butyl. Alternatively, the adhesion promoter may include partial condensates of the aforementioned silanes. Alternatively, the adhesion promoter may include partial condensates of the aforementioned silanes. Alternatively, the adhesion promoter may comprise a combination of an alkoxysilane and a hydrocarbyl functional polyorganosiloxane.
替代地,助黏劑可包括不飽和或環氧官能性化合物。助黏劑可包括不飽和或環氧官能性烷氧基矽烷。例如,官能性烷氧基矽烷可具有式R 6 tSi(OR 7) (4-t),其中下標t是1、2或3,替代地下標t是1。各R 6獨立地係單價有機基團,其其限制條件為至少一個R 6係不飽和有機基團或環氧官能性有機基團。R 6之環氧官能性有機基團係由3-環氧丙氧基丙基(glycidoxypropyl)及(環氧環己基)乙基例示。R 6之不飽和有機基團係由3-甲基丙烯醯氧基丙基、3-丙烯醯氧基丙基、及不飽和單價烴基(諸如乙烯基、烯丙基、己烯基、十一烯基)例示。各R 7獨立地係具有1至4個碳原子、替代地1至2個碳原子的飽和烴基。R 7係由Me、乙基、丙基、及丁基例示。 Alternatively, the adhesion promoter may include unsaturated or epoxy functional compounds. Adhesion promoters may include unsaturated or epoxy functional alkoxysilanes. For example, a functional alkoxysilane may have the formula R 6 t Si(OR 7 ) (4-t) , where the subscript t is 1, 2, or 3, alternatively the subscript t is 1 . Each R 6 is independently a monovalent organic group, with the proviso that at least one R 6 is an unsaturated organic group or an epoxy-functional organic group. The epoxy-functional organic group of R 6 is exemplified by 3-glycidoxypropyl and (epoxycyclohexyl)ethyl. The unsaturated organic group of R is composed of 3-methacryloxypropyl, 3-acryloxypropyl, and unsaturated monovalent hydrocarbon groups (such as vinyl, allyl, hexenyl, undecyl alkenyl) for example. Each R 7 is independently a saturated hydrocarbon group having 1 to 4 carbon atoms, alternatively 1 to 2 carbon atoms. R 7 is exemplified by Me, ethyl, propyl, and butyl.
合適的環氧官能性烷氧基矽烷之實例包括3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、(環氧環己基)乙基二甲氧基矽烷、(環氧環己基)乙基二乙氧基矽烷、及其組合。合適不飽和烷氧基矽烷之實例包括乙烯基三甲氧基矽烷、烯丙基三甲氧基矽烷、烯丙基三乙氧基矽烷、己烯基三甲氧基矽烷、十一烯基三甲氧基矽烷、3-甲基丙烯醯基氧基丙基三甲氧基矽烷、3-甲基丙烯醯基氧基丙基三乙氧基矽烷、3-丙烯醯基氧基丙基三甲氧基矽烷、3-丙烯醯基氧基丙基三乙氧基矽烷、及其組合。Examples of suitable epoxy-functional alkoxysilanes include 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, (epoxycyclohexyl)ethyl Dimethoxysilane, (epoxycyclohexyl)ethyldiethoxysilane, and combinations thereof. Examples of suitable unsaturated alkoxysilanes include vinyltrimethoxysilane, allyltrimethoxysilane, allyltriethoxysilane, hexenyltrimethoxysilane, undecenyltrimethoxysilane , 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-acryloxypropyltrimethoxysilane, 3- Acryloxypropyltriethoxysilane, and combinations thereof.
替代地,助黏劑可包括環氧官能性矽氧烷,諸如羥基封端之聚有機矽氧烷與環氧官能性烷氧基矽烷(如上所述)的反應產物,或羥基封端之聚有機矽氧烷與環氧官能性烷氧基矽烷的物理摻合物。助黏劑可包含環氧官能性烷氧基矽烷及環氧官能性矽氧烷之組合。例如,助黏劑之實例係3-環氧丙氧基丙基三甲氧基矽烷及羥基封端之甲基乙烯基矽氧烷與3-環氧丙氧基丙基三甲氧基矽烷的反應產物之混合物、或3-環氧丙氧基丙基三甲氧基矽烷及羥基封端之甲基乙烯基矽氧烷之混合物、或3-環氧丙氧基丙基三甲氧基矽烷及羥基封端之甲基乙烯基/二甲基矽氧烷共聚物之混合物。Alternatively, the adhesion promoter may comprise an epoxy-functional silicone, such as the reaction product of a hydroxyl-terminated polyorganosiloxane with an epoxy-functional alkoxysilane (described above), or a hydroxyl-terminated polyorganosiloxane. A physical blend of organosiloxanes and epoxy functional alkoxysilanes. Adhesion promoters may comprise combinations of epoxy-functional alkoxysilanes and epoxy-functional siloxanes. Examples of adhesion promoters are, for example, 3-glycidoxypropyltrimethoxysilane and the reaction product of hydroxy-terminated methylvinylsiloxane with 3-glycidoxypropyltrimethoxysilane or a mixture of 3-glycidoxypropyltrimethoxysilane and hydroxyl-terminated methylvinylsiloxane, or a mixture of 3-glycidoxypropyltrimethoxysilane and hydroxyl-terminated A mixture of methylvinyl/dimethylsiloxane copolymers.
替代地,助黏劑可包含胺基官能性矽烷,諸如由以下例示之胺基官能性烷氧基矽烷:H 2N(CH 2) 2Si(OCH 3) 3、H 2N(CH 2) 2Si(OCH 2CH 3) 3、H 2N(CH 2) 3Si(OCH 3) 3、H 2N(CH 2) 3Si(OCH 2CH 3) 3、CH 3NH(CH 2) 3Si(OCH 3) 3、CH 3NH(CH 2) 3Si(OCH 2CH 3) 3、CH 3NH(CH 2) 5Si(OCH 3) 3、CH 3NH(CH 2) 5Si(OCH 2CH 3) 3、H 2N(CH 2) 2NH(CH 2) 3Si(OCH 3) 3、H 2N(CH 2) 2NH(CH 2) 3Si(OCH 2CH 3) 3、CH 3NH(CH 2) 2NH(CH 2) 3Si(OCH 3) 3、CH 3NH(CH 2) 2NH(CH 2) 3Si(OCH 2CH 3) 3、C 4H 9NH(CH 2) 2NH(CH 2) 3Si(OCH 3) 3、C 4H 9NH(CH 2) 2NH(CH 2) 3Si(OCH 2CH 3) 3、H 2N(CH 2) 2SiCH 3(OCH 3) 2、H 2N(CH 2) 2SiCH 3(OCH 2CH 3) 2、H 2N(CH 2) 3SiCH 3(OCH 3) 2、H 2N(CH 2) 3SiCH 3(OCH 2CH 3) 2、CH 3NH(CH 2) 3SiCH 3(OCH 3) 2、CH 3NH(CH 2) 3SiCH 3(OCH 2CH 3) 2、CH 3NH(CH 2) 5SiCH 3(OCH 3) 2、CH 3NH(CH 2) 5SiCH 3(OCH 2CH 3) 2、H 2N(CH 2) 2NH(CH 2) 3SiCH 3(OCH 3) 2、H 2N(CH 2) 2NH(CH 2) 3SiCH 3(OCH 2CH 3) 2、CH 3NH(CH 2) 2NH(CH 2) 3SiCH 3(OCH 3) 2、CH 3NH(CH 2) 2NH(CH 2) 3SiCH 3(OCH 2CH 3) 2、C 4H 9NH(CH 2) 2NH(CH 2) 3SiCH 3(OCH 3) 2、C 4H 9NH(CH 2) 2NH(CH 2) 3SiCH 3(OCH 2CH 3) 2、及其組合。 Alternatively, the adhesion promoter may comprise an amino-functional silane, such as an amino-functional alkoxysilane exemplified by: H 2 N(CH 2 ) 2 Si(OCH 3 ) 3 , H 2 N(CH 2 ) 2 Si(OCH 2 CH 3 ) 3 , H 2 N(CH 2 ) 3 Si(OCH 3 ) 3 , H 2 N(CH 2 ) 3 Si(OCH 2 CH 3 ) 3 , CH 3 NH(CH 2 ) 3 Si(OCH 3 ) 3 , CH 3 NH(CH 2 ) 3 Si(OCH 2 CH 3 ) 3 , CH 3 NH(CH 2 ) 5 Si(OCH 3 ) 3 , CH 3 NH(CH 2 ) 5 Si(OCH 2 CH 3 ) 3 , H 2 N(CH 2 ) 2 NH(CH 2 ) 3 Si(OCH 3 ) 3 , H 2 N(CH 2 ) 2 NH(CH 2 ) 3 Si(OCH 2 CH 3 ) 3 , CH 3 NH(CH 2 ) 2 NH(CH 2 ) 3 Si(OCH 3 ) 3 , CH 3 NH(CH 2 ) 2 NH(CH 2 ) 3 Si(OCH 2 CH 3 ) 3 , C 4 H 9 NH( CH 2 ) 2 NH(CH 2 ) 3 Si(OCH 3 ) 3 , C 4 H 9 NH(CH 2 ) 2 NH(CH 2 ) 3 Si(OCH 2 CH 3 ) 3 , H 2 N(CH 2 ) 2 SiCH 3 (OCH 3 ) 2 , H 2 N(CH 2 ) 2 SiCH 3 (OCH 2 CH 3 ) 2 , H 2 N(CH 2 ) 3 SiCH 3 (OCH 3 ) 2 , H 2 N(CH 2 ) 3 SiCH 3 (OCH 2 CH 3 ) 2 , CH 3 NH(CH 2 ) 3 SiCH 3 (OCH 3 ) 2 , CH 3 NH(CH 2 ) 3 SiCH 3 (OCH 2 CH 3 ) 2 , CH 3 NH(CH 2 ) 5 SiCH 3 (OCH 3 ) 2 , CH 3 NH(CH 2 ) 5 SiCH 3 (OCH 2 CH 3 ) 2 , H 2 N(CH 2 ) 2 NH(CH 2 ) 3 SiCH 3 (OCH 3 ) 2 , H 2 N(CH 2 ) 2 NH(CH 2 ) 3 SiCH 3 (OCH 2 CH 3 ) 2 , CH 3 NH(CH 2 ) 2 NH(CH 2 ) 3 Si CH 3 (OCH 3 ) 2 , CH 3 NH(CH 2 ) 2 NH(CH 2 ) 3 SiCH 3 (OCH 2 CH 3 ) 2 , C 4 H 9 NH(CH 2 ) 2 NH(CH 2 ) 3 SiCH 3 (OCH 3 ) 2 , C 4 H 9 NH(CH 2 ) 2 NH(CH 2 ) 3 SiCH 3 (OCH 2 CH 3 ) 2 , and combinations thereof.
替代地,助黏劑可包含過渡金屬螯合物。合適的過渡金屬螯合物包括鈦酸鹽、鋯酸鹽(例如乙醯丙酮鋯)、鋁螯合物(例如乙醯丙酮鋁)與上述者之組合。或者,該助黏劑可包含一過渡金屬螯合物與一烷氧基矽烷的組合,例如環氧丙氧基丙基三甲氧基矽烷與一鋁螯合物或一鋯螯合物的組合。Alternatively, the adhesion promoter may comprise a transition metal chelate. Suitable transition metal chelates include titanates, zirconates such as zirconium acetylacetonate, aluminum chelates such as aluminum acetylacetonate, and combinations thereof. Alternatively, the adhesion promoter may comprise a combination of a transition metal chelate and an alkoxysilane, such as glycidoxypropyltrimethoxysilane in combination with an aluminum chelate or a zirconium chelate.
助黏劑的量取決於各種因素,包括所選擇助黏劑的種類以及組成物及其固化產物的最終用途。然而,以起始材料(A)、(B)、(C)、及(D)的組合量計,助黏劑的量可為> 0至< 2%。 (G)溶劑 The amount of adhesion promoter depends on various factors, including the type of adhesion promoter selected and the end use of the composition and its cured product. However, based on the combined amount of starting materials (A), (B), (C), and (D), the amount of adhesion promoter can be > 0 to < 2%. (G) solvent
起始材料(G)是可任選地添加以促進一或多種起始材料之組合的溶劑。例如,(B)烯基官能聚有機矽酸鹽樹脂及/或(D)矽氫化反應催化劑可在溶劑中遞送。溶劑可包含烴、鹵化烴、或環狀矽氧烷(其平均聚合度為3至10)、及/或鹵化烴。合適的烴可以是i)芳族烴,諸如苯、甲苯、乙苯、或二甲苯;ii)脂族烴,諸如己烷、庚烷、辛烷、或異烷烴(iso-paraffin);或其組合。適合的鹵化烴包括三氯乙烯;過氯乙烯;三氟甲基苯;1,3-雙(三氟甲基)苯;甲基五氟苯;二氯甲烷(dichloromethane);1,1,1-三氯乙烷;及二氯甲烷(methylene chloride)。具有3至10、替代地3至6之聚合度的適合環狀矽氧烷包括六甲基環三矽氧烷、八甲基環四矽氧烷、及/或十甲基環五矽氧烷。溶劑的確切量可依據待組合之起始材料的類型及量以及所選擇之溶劑的種類而變化,然而,可選擇溶劑的量以使得組成物形成均質混合物。以起始材料(A)、(B)、(C)、及(D)的組合重量計,溶劑之量可為> 0%至< 100%、替代地10%至90%、替代地5%至80%。在製備組成物之後,可任選地移除所有或部分的溶劑。 (H)濕潤劑 Starting material (G) is a solvent that may optionally be added to facilitate combination of one or more starting materials. For example, (B) alkenyl-functional polyorganosilicate resin and/or (D) hydrosilylation catalyst can be delivered in a solvent. The solvent may include hydrocarbons, halogenated hydrocarbons, or cyclic siloxanes (with an average degree of polymerization of 3 to 10), and/or halogenated hydrocarbons. Suitable hydrocarbons may be i) aromatic hydrocarbons, such as benzene, toluene, ethylbenzene, or xylene; ii) aliphatic hydrocarbons, such as hexane, heptane, octane, or iso-paraffin; or combination. Suitable halogenated hydrocarbons include trichloroethylene; perchloroethylene; trifluoromethylbenzene; 1,3-bis(trifluoromethyl)benzene; methylpentafluorobenzene; dichloromethane; - trichloroethane; and methylene chloride. Suitable cyclic siloxanes having a degree of polymerization of 3 to 10, alternatively 3 to 6 include hexamethylcyclotrisiloxane, octamethylcyclotetrasiloxane, and/or decamethylcyclopentasiloxane . The exact amount of solvent can vary depending on the type and amount of starting materials to be combined and the type of solvent chosen, however, the amount of solvent can be chosen so that the composition forms a homogeneous mixture. The amount of solvent may be > 0% to < 100%, alternatively 10% to 90%, alternatively 5% based on the combined weight of the starting materials (A), (B), (C), and (D) to 80%. After preparing the composition, all or part of the solvent may optionally be removed. (H) Wetting agent
矽氫化可固化聚有機矽氧烷組成物可任選性地進一步包含濕潤劑,該濕潤劑是表面活性分子,其可減少組成物之表面張力且可促進在模具或基材中之組成物的均勻分佈,藉以幫助填充間隙及/或在固化後形成均勻的聚矽氧封裝膜。濕潤劑可以是非官能聚二有機矽氧烷,諸如雙-三甲基矽氧基封端之聚二甲基矽氧烷,其黏度為5至100 cP。此類濕潤劑係所屬領域中已知的且可商購的,例如來自DSC之以DOWSIL™ 200 Fluids為商標名。以起始材料(A)、(B)、(C)、及(D)的組合重量計,濕潤劑的量可為0至1%。The hydrosilylation-curable polyorganosiloxane composition may optionally further comprise a wetting agent, which is a surface-active molecule that reduces the surface tension of the composition and facilitates adhesion of the composition in the mold or substrate. Uniform distribution to help fill gaps and/or form a uniform polysiloxane encapsulation film after curing. The humectant may be a non-functional polydiorganosiloxane, such as bis-trimethylsiloxy terminated polydimethylsiloxane, having a viscosity of 5 to 100 cP. Such wetting agents are known in the art and are commercially available, for example under the trade name DOWSIL™ 200 Fluids from DSC. The amount of wetting agent may be from 0 to 1% based on the combined weight of the starting materials (A), (B), (C), and (D).
矽氫化可固化聚有機矽氧烷組成物可不含填充劑或僅含有有限量的填充劑,諸如0至30重量%,以組成物中之所有起始材料的組合重量計。不希望受理論的束縛,認為填充劑可以黏聚或以其他方式黏附至用於施加或施配組成物的設備,且若光學透明度是期望的,填充劑可妨礙組成物及與其形成之聚矽氧封裝膜的光學性質,例如透明度。填充劑亦可能不利於聚矽氧封裝膜對基材的黏附。 製造組成物之方法 The hydrosilylation-curable polyorganosiloxane composition may contain no filler or only a limited amount of filler, such as 0 to 30% by weight, based on the combined weight of all starting materials in the composition. Without wishing to be bound by theory, it is believed that fillers may agglomerate or otherwise adhere to the equipment used to apply or dispense the composition, and if optical clarity is desired, the filler may interfere with the composition and the polysiloxane formed therewith. Optical properties of oxygen-sealed films, such as transparency. Fillers may also be detrimental to the adhesion of the silicone encapsulation film to the substrate. method of making the composition
上述組成物可藉由任何便利的手段製備,諸如使用習知設備(諸如攪動容器或靜態混合器)在RT下混合起始材料。當使用抑制劑時,可在矽氫化反應催化劑之前添加抑制劑,例如當在升高溫度下製備組成物及/或將組成物製備成一份組成物時。例如,當與組成物中之一或多種其他起始材料組合時,一或多種起始材料,例如(B)聚有機矽酸鹽樹脂及(D)矽氫化反應催化劑可在溶劑中遞送。可在混合起始材料之後,在不固化組成物的條件下(例如,藉由減少壓力或在足以揮發溶劑但不足以固化組成物的溫度下加熱)移除全部或部分的溶劑。所屬技術領域中具有通常知識者將瞭解,所得組成物不含有溶劑或可含有來自起始材料之遞送的痕量殘餘溶劑,然而,並非故意將溶劑(例如有機溶劑,諸如甲苯或非官能性聚二有機矽氧烷)添加至組成物中。The above compositions can be prepared by any convenient means, such as mixing the starting materials at RT using conventional equipment such as stirred vessels or static mixers. When an inhibitor is used, the inhibitor can be added prior to the hydrosilylation catalyst, for example when the composition is prepared at elevated temperature and/or the composition is prepared as a single composition. For example, one or more starting materials, such as (B) polyorganosilicate resin and (D) hydrosilylation catalyst, can be delivered in a solvent when combined with one or more other starting materials in the composition. After mixing the starting materials, all or part of the solvent can be removed under conditions that do not cure the composition (eg, by reducing pressure or heating at a temperature sufficient to volatilize the solvent but not sufficient to cure the composition). Those of ordinary skill in the art will appreciate that the resulting composition is solvent-free or may contain traces of residual solvent from delivery of the starting materials, however, solvents (e.g., organic solvents such as toluene or non-functional polymers Diorganosiloxane) is added to the composition.
替代地,可將組成物製備成多份組成物,例如當組成物將在使用之前儲存很長一段時間時,例如在被施配至基材上或模具中之前至多6小時。在多份組成物中,矽氫化反應催化劑係儲存於與任何具有矽鍵結氫原子之起始材料(例如,聚有機氫矽氧烷)分開的部分中,且在使用組成物前不久才組合該等部分(例如,藉由在RT下混合)。Alternatively, the composition may be prepared in multiple compositions, for example when the composition is to be stored for a long period of time before use, for example up to 6 hours before being dispensed onto a substrate or into a mold. In multiple compositions, the hydrosilylation catalyst is stored in a separate portion from any starting material having silicon-bonded hydrogen atoms (e.g., polyorganohydrogensiloxane) and assembled shortly before the composition is used The fractions (eg, by mixing at RT).
例如,可藉由以任何便利的手段(諸如混合)組合起始材料以形成基底部分來製備多份組成物,該等起始材料包含以下中之至少一些:(A)烯基官能聚二有機矽氧烷聚合物、(C)聚有機氫矽氧烷、及可選地一或多種上述其他額外的起始材料。可藉由以任何便利的手段(諸如混合)組合起始材料來製備固化劑,該等起始材料包含以下中之至少一些:(A)烯基官能聚二有機矽氧烷聚合物、(D)矽氫化反應催化劑、及可選地一或多種上述其他額外的起始材料。可在RT或升高溫度下組合起始材料。矽氫化反應抑制劑可包括在基底部分、固化劑部分、或單獨的額外部分中之一或多者中。可將助黏劑添加至基底部分,或可作為單獨的額外部分添加。可將起始材料(B),烯基官能聚有機矽酸鹽樹脂添加至基底部分或單獨的額外部分。當使用二部分組成物時,基底部分對固化劑部分的量之重量比可在1:1至10:1之範圍內。組成物將經由矽氫化反應固化以形成聚矽氧封裝膜。For example, multiple compositions may be prepared by combining starting materials comprising at least some of the following: (A) alkenyl-functional polydiorganic Silicone polymer, (C) polyorganohydrogensiloxane, and optionally one or more of the other additional starting materials described above. Curing agents may be prepared by combining starting materials comprising at least some of the following: (A) alkenyl-functional polydiorganosiloxane polymers, (D ) a hydrosilylation catalyst, and optionally one or more of the other additional starting materials described above. Starting materials can be combined at RT or at elevated temperature. A hydrosilylation inhibitor may be included in one or more of the substrate portion, the curing agent portion, or a separate additional portion. Adhesion promoters may be added to the base portion, or may be added as a separate extra portion. The starting material (B), an alkenyl functional polyorganosilicate resin, may be added to the base part or a separate additional part. When a two-part composition is used, the weight ratio of the amount of substrate part to curing agent part may range from 1:1 to 10:1. The composition will be cured through a hydrosilylation reaction to form a polysiloxane encapsulation film.
當存在溶劑時,方法可任選地進一步包含在固化之前及/或固化期間移除全部或部分的溶劑。可藉由任何便利的手段來進行溶劑的移除,諸如在將溶劑揮發而不會完全固化組成物的溫度下加熱(例如,在70℃至120℃、替代地50℃至100℃、及替代地70℃至80℃之溫度下加熱)一段足以移除所有或部分溶劑的時間(例如,30秒至1小時、替代地1分鐘至5分鐘)。When a solvent is present, the method may optionally further comprise removing all or part of the solvent prior to and/or during curing. Removal of the solvent may be performed by any convenient means, such as heating at a temperature that will volatilize the solvent without fully curing the composition (e.g., at 70°C to 120°C, alternatively 50°C to 100°C, and alternatively 70° C. to 80° C.) for a period of time sufficient to remove all or part of the solvent (eg, 30 seconds to 1 hour, alternatively 1 minute to 5 minutes).
可藉由在80℃至200℃、替代地90℃至180℃、替代地100℃至160℃、及替代地110℃至150℃之溫度下加熱一段足以固化壓敏性黏著劑組成物的時間(例如,30秒至一小時、替代地1至5分鐘)來進行組成物的固化。若固化速度需要增加或製程溫度降低,則可增加催化劑含量及/或可降低抑制劑量。此形成固化聚矽氧。固化可藉由將組成物(例如,在模具中或作為膜塗佈在基材上)置於烤箱中來進行。組成物的量取決於特定應用,然而,該量可係足夠的使得在固化之後所得固化聚矽氧的厚度可係5微米至50微米,且對於保護膜而言,厚度可係6微米至50微米、替代地8微米至40微米、及替代地10至30微米。 製造聚矽氧封裝膜之方法 The pressure-sensitive adhesive composition may be cured by heating at a temperature of 80°C to 200°C, alternatively 90°C to 180°C, alternatively 100°C to 160°C, and alternatively 110°C to 150°C (eg, 30 seconds to one hour, alternatively 1 to 5 minutes) to cure the composition. If the cure rate needs to be increased or the process temperature decreased, the catalyst level can be increased and/or the inhibitor level can be decreased. This forms cured silicone. Curing can be performed by placing the composition (eg, in a mold or as a film coated on a substrate) in an oven. The amount of the composition depends on the particular application, however, the amount may be sufficient such that the thickness of the resulting cured polysiloxane after curing may be from 5 microns to 50 microns, and for protective films from 6 microns to 50 microns. microns, alternatively 8 microns to 40 microns, and alternatively 10 to 30 microns. Method for producing polysiloxane encapsulation film
如上文所描述製備之組成物可用於形成聚矽氧封裝膜的方法。此方法包含: (1) 形成膜,矽氫化可固化聚有機矽氧烷組成物,其中組成物包括(A)聚二有機矽氧烷聚合物;(B)烯基官能聚有機矽酸鹽樹脂;(C)聚有機氫矽氧烷;及(D)矽氫化反應催化劑,其中起始材料(A)、(B)、(C)、及(D)以及製備組成物之方法如上文所描述;及 (2) 固化矽氫化可固化聚有機矽氧烷組成物,藉以形成聚矽氧封裝膜。步驟(1)可藉由任何便利的手段(諸如模製)進行,例如,將矽氫化可固化聚有機矽氧烷組成物施配至諸如鋼框之模具中,或在基材上印刷(例如,噴墨印刷)矽氫化可固化聚有機矽氧烷組成物。在步驟(2)中固化之後,可使用足以提供具有至多50微米、替代地1至50微米之厚度的聚矽氧封裝膜之量的矽氫化反應可固化組成物。步驟(2)可藉由在80℃至150℃的溫度下加熱15分鐘至1小時來進行,例如,藉由置於烤箱中。可選地,可在步驟(2)中施加增加的壓力。 使用聚矽氧封裝膜之方法 The composition prepared as described above can be used in a method of forming a polysiloxane encapsulating film. This method contains: (1) A film-forming, hydrosilylation-curable polyorganosiloxane composition comprising (A) a polydiorganosiloxane polymer; (B) an alkenyl-functional polyorganosilicate resin; (C) Polyorganohydrogensiloxane; and (D) a hydrosilylation reaction catalyst, wherein the starting materials (A), (B), (C), and (D) and the method for preparing the composition are as described above; and (2) Curing the hydrosilation curable polyorganosiloxane composition to form a polysiloxane encapsulation film. Step (1) can be performed by any convenient means such as molding, for example, dispensing the hydrosilylation-curable polyorganosiloxane composition into a mold such as a steel frame, or printing on a substrate (such as , inkjet printing) hydrosilation curable polyorganosiloxane composition. After curing in step (2), an amount of hydrosilylation curable composition sufficient to provide a silicone encapsulating film having a thickness of up to 50 microns, alternatively 1 to 50 microns, may be used. Step (2) can be performed by heating at a temperature of 80° C. to 150° C. for 15 minutes to 1 hour, for example, by placing in an oven. Optionally, increased pressure may be applied in step (2). Method of using polysiloxane encapsulation film
如上文所描述製備之聚矽氧封裝膜適合用於OLED顯示器,例如以覆蓋OLED顯示器中之濕敏電子組件。例如,一種方法包含覆蓋具有上述矽氫化反應可固化組成物之OLED顯示器中的濕敏電子組件,且固化該組成物以製備聚矽氧封裝膜,如上所述。The polysiloxane encapsulation film prepared as described above is suitable for use in OLED displays, for example to cover moisture-sensitive electronic components in OLED displays. For example, one method involves covering moisture-sensitive electronic components in an OLED display with the hydrosilylation-curable composition described above, and curing the composition to produce a polysiloxane encapsulation film, as described above.
圖1顯示結構圖,其用於具有玻璃基材之透明且剛性OLED的一組件(100)。組件(100)包括一壩體(101),其容納一濾色器(102)、一鈍化層(105)、以及一薄膜電晶體及白色有機發光二極體(104)。如上文所描述製備之聚矽氧封裝膜(103)包圍濾色器(102)、鈍化層(105)、以及薄膜電晶體及白色有機發光二極體(104),藉以保護其免受濕氣及其他損害。將組件(100)安裝至一玻璃基材(106)。 實例 Figure 1 shows a structural diagram for an assembly (100) of a transparent and rigid OLED with a glass substrate. The component (100) includes a dam (101) containing a color filter (102), a passivation layer (105), and a thin film transistor and white organic light emitting diode (104). The polysiloxane encapsulation film (103) prepared as described above surrounds the color filter (102), passivation layer (105), and thin film transistor and white organic light emitting diode (104), thereby protecting them from moisture and other damages. The assembly (100) is mounted to a glass substrate (106). example
此等實例意欲對所屬技術領域中具有通常知識者更詳細的解釋本發明,而並非用以限制隨附申請專利範圍中提出的本發明的範疇。用於這些實例中之起始材料係描述於下表1中。
表1 -起始材料
如下製備矽氫化可固化聚有機矽氧烷組成物(樣本)。將如表1中所描述之起始材料以下表2所示之量(重量份)稱取至容器中且使用Thinky混合器以1500 rpm混合2分鐘。
表2. 以重量%為單位計之矽氫化可固化聚有機矽氧烷組成物
在表2中,實例1、實例2、實例3、及實例8是比較的。實例1、實例2、及實例3各自之聚有機氫矽氧烷含量> 2.5%且SiH/Vi比> 0.55。實例8之聚有機氫矽氧烷含量< 1.4%且SiH/Vi比< 0.30。In Table 2, Example 1, Example 2, Example 3, and Example 8 are comparative. Example 1, Example 2, and Example 3 each had a polyorganohydrogensiloxane content > 2.5% and a SiH/Vi ratio > 0.55. Example 8 has a polyorganohydrogensiloxane content < 1.4% and a SiH/Vi ratio < 0.30.
為了製備聚矽氧封裝膜,將表2中所描述之各15 mL樣本倒入鋼框中,且在100℃下使用液壓熱壓機(hydraulic hot press)壓製30分鐘。所得膜的厚度為1.8至2 mm。To prepare silicone encapsulating films, 15 mL of each sample described in Table 2 was poured into a steel frame and pressed at 100° C. for 30 minutes using a hydraulic hot press. The resulting film has a thickness of 1.8 to 2 mm.
在RT下使用模數密集流量計(Modulus Compact Rheometer)(MCR,Anton Paar)測量各膜之模數。藉由將各膜置於阻抗儀器(16451B介電質文字夾具(dielectric text fixture),Keysight)之兩個38 mm直徑不鏽鋼電極之間來測量介電常數。在RT下施加100 kHz之頻率及1 V之電壓。The modulus of each membrane was measured at RT using a Modulus Compact Rheometer (MCR, Anton Paar). The dielectric constant was measured by placing each film between two 38 mm diameter stainless steel electrodes of an impedance instrument (16451B dielectric text fixture, Keysight). A frequency of 100 kHz and a voltage of 1 V were applied at RT.
使用Hildebrand硬度計(蕭氏(Shore)00)、Asker CLE-150LJ(蕭氏A)來測量硬度。測試樣品以8 mm膜製備且用儀器組裝。按壓重量且測量硬度值。結果示於下表3中。
表3. 結果
表3中之資料顯示環狀矽氧烷含量(例如,DOWSIL™ 1-687)對於固化膜之性質的影響是可忽略的。實例1、實例2、及實例3顯示當組成物之SiH/Vi比及聚有機氫矽氧烷含量高於如請求項1所述時,介電常數及模數過高。實例8,其含有比如下文請求項1所述之較少的聚有機氫矽氧烷(交聯劑),其經固化以形成凝膠狀態並非剛性膜,使得不可測量Dk。實例4至7顯示可在測試之條件下製備具有適用於OLED顯示器之硬度、介電常數、及儲存模數的聚矽氧封裝膜。可在固化矽氫化可固化聚有機矽氧烷組成物以形成聚矽氧封裝膜,其中RT下0.5≤G≤1;Dk < 2.8,且蕭氏A硬度至少為12、替代地12至45。 產業利用性 The data in Table 3 show that the content of cyclic siloxane (eg, DOWSIL™ 1-687) has a negligible effect on the properties of the cured film. Examples 1, 2, and 3 show that when the SiH/Vi ratio and polyorganohydrogensiloxane content of the composition are higher than those described in claim 1, the dielectric constant and modulus are too high. Example 8, which contained less polyorganohydrogensiloxane (crosslinker) than described in claim 1 below, was cured to form a gel state rather than a rigid film such that the Dk could not be measured. Examples 4 to 7 show that polysiloxane encapsulation films with hardness, dielectric constant, and storage modulus suitable for OLED displays can be prepared under the tested conditions. The curable polyorganosiloxane composition may be cured to form a polysiloxane encapsulating film, wherein 0.5≦G≦1 at RT; Dk<2.8, and a Shore A hardness of at least 12, alternatively 12 to 45. Industrial utilization
藉由固化如本文所述的矽氫化可固化聚有機矽氧烷組成物來製備聚矽氧封裝膜。矽氫化反應可固化組成物可提供具有儲存模數G的聚矽氧封裝膜,其中在RT下其值為0.05 MPa < G < 1 MPa。不希望受理論束縛,認為上述範圍中之模數將向聚矽氧封裝膜提供Dk < 2.8。此外,不希望受理論束縛,認為若模數低於0.05 MPa,則聚矽氧封裝膜可能具有不足的剛性或具有凝膠狀態,且黏性可能增加至不期望的水平,然而,若模數大於1 MPA,則Dk可> 2.8。 用語的定義及用法 A silicone encapsulating film is prepared by curing a hydrosilylation curable polyorganosiloxane composition as described herein. The hydrosilylation curable composition can provide a polysiloxane encapsulating film having a storage modulus G, wherein the value is 0.05 MPa < G < 1 MPa at RT. Without wishing to be bound by theory, it is believed that a modulus in the above range will provide a silicone encapsulation film with a Dk < 2.8. Furthermore, without wishing to be bound by theory, it is believed that if the modulus is below 0.05 MPa, the polysiloxane encapsulating film may have insufficient rigidity or have a gel state, and the viscosity may increase to undesired levels, however, if the modulus If it is greater than 1 MPA, then Dk can be > 2.8. Definition and Usage of Terms
除非另有指明,否則所有量、濃度、比率、及百分比均以重量計。發明內容及發明摘要以引用之方式併入本文中。除非另外指明,否則冠詞『一(a/an)』及『該(the)』各自係指一或多者。除非另有指明,否則單數包括複數。縮寫定義於下表4中。
表4. 縮寫
100:組件 101:壩體 102:濾色器 103:聚矽氧封裝膜 104:薄膜電晶體及白色有機發光二極體 105:鈍化層 106:玻璃基材 100: components 101: Dam body 102: Color filter 103: Polysiloxane encapsulation film 104: Thin film transistor and white organic light emitting diode 105: Passivation layer 106: Glass substrate
〔圖1〕是安裝至玻璃基材之透明且剛性OLED之組件的結構圖(structure scheme)。[FIG. 1] is a structure scheme of a transparent and rigid OLED mounted to a glass substrate.
100:組件 100: components
101:壩體 101: Dam body
102:濾色器 102: Color filter
103:聚矽氧封裝膜 103: Polysiloxane encapsulation film
104:薄膜電晶體及白色有機發光二極體 104: Thin film transistor and white organic light emitting diode
105:鈍化層 105: Passivation layer
106:玻璃基材 106: Glass substrate
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