TW202304698A - Optical element, optical filter, solid-state imaging device, and optical sensor device wherein the optical element includes a resin layer that reduces a shoulder peak in the red to near-infrared region based on a near-infrared absorber - Google Patents

Abstract

The present invention provides an optical element including a resin layer that reduces a shoulder peak in the red to near-infrared region based on a near-infrared absorber, and has a high transmittance of visible light including the red region and a wide absorption band in the near-infrared region. An optical element has a resin layer containing a compound (A) and a compound (B). When the maximum absorption wavelength of the compound (A) is set as [lambda]A and the maximum absorption wavelength of the compound (B) is set as [lambda]B, the resin layer satisfies the following necessary conditions (a) to (d). (a) [lambda]A < [lambda]B; (b) 680 nm ≤ [lambda]A ≤ 870 nm; (c) 760 nm ≤ [lambda]B ≤ 900 nm; and (d) the transmittance is set as Ta when a light at an arbitrary wavelength X nm in the wavelength from 600 nm to ([lambda]A-1) nm is incident from a direction perpendicular to the surface direction of the resin layer, the transmittance is set as Tb when a light at a wavelength (X+1) nm is incident from a direction perpendicular to the surface direction of the resin layer, and Tx < 0 is satisfied when the maximum value of Tb-Ta is set as Tx.

Description

Optical member, optical filter, solid-state imaging device, and optical sensor device

An optical component, an optical filter, a solid-state imaging device, and an optical sensor device.

In solid-state imaging devices such as video cameras, digital still cameras, and mobile phones with camera functions, charge-coupled devices (Charge-coupled Devices, CCDs) or complementary metal oxide semiconductors (Complementary Metal Oxide Semiconductors) are used as solid-state imaging elements for color images. Semiconductor, CMOS) image sensor. In these solid-state imaging devices, a silicon photodiode sensitive to near-infrared rays that cannot be sensed by the human eye is used for the light-receiving part. In addition, silicon photodiodes and the like are also used in optical sensor devices. For example, in a solid-state imaging device, it is necessary to correct the visual sensitivity to present a natural color seen by the human eye, and an optical member that selectively transmits or cuts light in a specific wavelength region, especially an optical filter (such as a near IR cut filter).

As such a near-infrared cut filter, filters manufactured by various methods have been used heretofore, for example, an optical filter including a near-infrared absorber is known. Also, for example, Patent Document 1 discloses a light selective transmission filter having a resin layer containing a resin and two or more near-infrared absorbers. [Prior art literature] [Patent Document]

[Patent Document 1] Japanese Patent Laid-Open No. 2014-67019

[Problem to be Solved by the Invention]

However, the light selective transmission filter (near-infrared cut filter) described in Patent Document 1 has a low visible light transmittance and has insufficient near-infrared absorption characteristics.

In addition, as the near-infrared ray absorbing agent, squaraine-based, porphyrin-based, dithiol metal complex-based, phthalocyanine-based, diimonium-based, and other compounds have been conventionally used. However, these compounds used in the past have at least one of the following problems: most of them have a shoulder on the short-wavelength side of the absorption peak in the red region to near-infrared region; ratio is small; the absorption bandwidth in the near-infrared region is insufficient; and the transmittance (R transmittance) in the red region of visible light is low. There is room for improvement of these problems in conventional optical filters using these compounds.

In addition, in the conventional optical filter, the reflected light from the filter may become a speckle or a ghost, which may adversely affect images such as camera images, especially in the reflection band of the near-infrared cut filter. In the case where it overlaps with the wavelength band in which the sensor can perform photoelectric conversion, the adverse effects may become more pronounced.

The present invention is made in view of the above circumstances, and an object of the present invention is to provide an optical member including a resin layer that reduces shoulder peaks in the red region to near-infrared region by a near-infrared absorber and has an optical member including the red region. High transmittance of visible light and wide absorption band in the near-infrared region. [Means to solve the problem]

The inventors of the present invention have diligently studied to solve the above-mentioned problems, and as a result, have found that the above-mentioned problems can be solved by the following structural examples, and have completed the present invention. The structure example of this invention is as follows. In addition, in the present invention, descriptions such as "A to B" indicating a numerical range have the same meaning as "more than A and less than B", and A and B are included in the numerical range. In addition, in the present invention, the wavelengths A nm to B nm mean the characteristics at a wavelength resolution of 1 nm in the wavelength range from the wavelength A nm to the wavelength B nm.

[1] An optical member having a resin layer containing a compound (A) and a compound (B), The resin layer satisfies the following requirements (a) to (d) when the maximum absorption wavelength of the compound (A) is λA and the maximum absorption wavelength of the compound (B) is λB. (a) λA<λB (b) 680nm≦λA≦870nm (c) 760nm≦λB≦900nm (d) Let Ta be the transmittance when light of an arbitrary wavelength X nm among wavelengths 600 nm to (λA-1) nm is incident from a direction perpendicular to the surface direction of the resin layer, and let the wavelength (X+1) Tx<0 is satisfied when the transmittance when light of nm is incident from a direction perpendicular to the surface direction of the resin layer is Tb, and the maximum value of Tb-Ta is Tx.

[2] The optical member according to [1], wherein the compound (A) satisfies the following requirement (i). (i) Among the wavelengths of 600 nm to (λA-1) nm, let the transmittance of compound (A) of light of arbitrary wavelength X nm be TaA, and the transmittance of compound (A) of light of wavelength (X+1) nm When the transmittance of TbA is TbA, there is a wavelength X nm satisfying TbA-TaA>0 in part of the wavelength 600 nm to (λA-1) nm.

[3] The optical member according to [1] or [2], wherein the minimum value of the transmittance of light having a wavelength λA nm to λB nm incident from a direction perpendicular to the surface direction of the resin layer is 3 %the following.

[4] The optical member according to any one of [1] to [3], wherein, in the light having a wavelength of 600 nm to 900 nm incident from a direction perpendicular to the surface direction of the resin layer, When Wmin is the shortest wavelength at which the transmittance is 50%, the Wmin is in the range of 650 nm to 750 nm.

[5] The optical member according to any one of [1] to [4], which transmits light having a wavelength of 600 nm to 900 nm incident from a direction perpendicular to the surface direction of the resin layer. The shortest wavelength Wmin with a transmittance of 50% and the longest wavelength Wmax with a transmittance of 50% satisfy the relationship of Wmax-Wmin≧130 nm.

[6] The optical member according to any one of [1] to [5], wherein the compound (A) and the compound (B) are selected from the group consisting of phthalocyanine compounds, naphthalocyanine compounds, Squarylium-based compounds, crotonium-based compounds, cyanine-based compounds, and polymethine-based compounds (wherein, the polymethine-based compounds are squarylium-based compounds, crotonium-based compounds, and cyanine-based compounds Compounds other than cyanide-based compounds), diimonium-based compounds, dithiol metal complex-based compounds, and pyrrolopyrrole-based compounds.

[7] The optical member according to any one of [1] to [6], wherein the transmittance of light with a wavelength of 450 nm to 570 nm incident from a direction perpendicular to the surface direction of the resin layer is The average value is above 80%.

[8] The optical member according to any one of [1] to [7], wherein the resin layer contains a resin selected from cyclic (poly)olefin-based resins, aromatic polyether-based resins, polyimide Resin, Polyester Resin, Polycarbonate Resin, Polyamide Resin, Polyarylate Resin, Polyester Resin, Polyether Resin, Polyparaphenylene Resin, Polyamideimide Resin Resins, polyethylene naphthalate-based resins, fluorinated aromatic polymer-based resins, (modified) acrylic resins, epoxy-based resins, allyl ester-based curable resins, silsesquioxane-based UV-curable resins At least one resin selected from the group consisting of UV-curable resin, acrylic UV-curable resin, and vinyl-based UV-curable resin.

[9] An optical filter comprising the optical member according to any one of [1] to [8] and a dielectric multilayer film. [10] The optical filter described in claim [9] is a near-infrared cut filter, a dual-band bandpass filter, or a single-bandband pass filter.

[11] A solid-state imaging device including the optical member according to any one of [1] to [8] or the optical filter according to any one of [9] to [10]. [12] An optical sensor device including the optical member according to any one of [1] to [8] or the optical filter according to any one of [9] to [10]. [Effect of the invention]

According to the present invention, it is possible to provide an optical member and an optical filter including a resin layer capable of reducing shoulder peaks in the red range to near-infrared range by a near-infrared absorbent and having visible light including the red range High transmittance and wide absorption band in the near-infrared region.

Furthermore, according to the present invention, it is possible to provide an optical member and an optical filter having these characteristics, in particular, widely and sufficiently shielding light in the near-infrared region, and capable of transmitting light in the visible region at a high rate. Therefore, according to the present invention, not only a near infrared-cut filter (near infrared-cut filter, NIR-CF), but also a dual-band band-pass filter (DBPF (dual band pass filter), such as visible light- near-infrared pass filter), or a single-frequency band-pass filter (such as a near-infrared pass filter (infrared pass filter, IRPF)) and other optical filters. Regarding these NIR-CF, DBPF, and single-band bandpass filters, light selection that can clearly block the wavelength region to be blocked (such as the infrared region) and exhibit high transmittance in the wavelength region to be transmitted (such as the visible light region) Excellent permeability.

As described above, according to the present invention, it is possible to provide an optical member and an optical filter having the above characteristics, particularly an optical member and an optical filter having a high transmittance to light in the red region. Therefore, by using The optical member or optical filter can obtain a good image with excellent red green blue (RGB) balance, can suppress reflected light of light by a wide absorption band in the near-infrared region, and can easily obtain an image that can provide Optical components and optical filters for excellent images with less flare and ghosting. In addition, when the optical filter is a filter having a dielectric multilayer film, the incident angle dependence due to the dielectric multilayer film can be reduced, and a good photographic image can be obtained.

"Optical Components and Optical Filters" The optical member of the present invention (hereinafter also referred to as "this optical member") has a resin layer (hereinafter also referred to as "this resin layer") containing compound (A) and compound (B), The present resin layer satisfies the following requirements (a) to (d) when the maximum absorption wavelength of the compound (A) is λA and the maximum absorption wavelength of the compound (B) is λB. (a) λA<λB (b) 680nm≦λA≦870nm (c) 760nm≦λB≦900nm (d) Let Ta be the transmittance when light of an arbitrary wavelength X nm among wavelengths 600 nm to (λA-1) nm is incident from a direction perpendicular to the surface direction of the resin layer, and let the wavelength (X+1) nm be The transmittance when the light is incident from the direction perpendicular to the surface direction of the resin layer is Tb, and when the maximum value of Tb-Ta is Tx, Tx<0 is satisfied.

This optical member may include one or more than two layers of this resin layer (only), it may also include this resin layer and a glass support (functional film), and it may also include this resin layer and other resin layers other than this resin layer (functional film). membrane). Specific examples of the present optical member include, for example, an optical member including only the present resin layer, and an optical member in which the present resin layer is laminated on a support (functional film) such as a glass support or a resin support serving as a base. . An optical member in which a resin layer (functional film) such as an overcoat layer containing a curable resin or the like is laminated on the resin layer. Among these, it is particularly preferable to laminate the resin layer on the present resin layer in terms of production cost, ease of adjustment of optical characteristics, and the effect of eliminating damage of the present resin layer, or improving the scratch resistance of the present resin layer. An optical member including a resin layer (functional film) such as an outer coating layer of curable resin.

The optical filter of the present invention (hereinafter also referred to as "the present filter") has only the present optical member, as long as it has a conventionally known structure, and the present optical member alone can be used as the present filter, but preferably has It is particularly preferable that the optical member and the dielectric multilayer film have a dielectric multilayer film on at least one surface of the optical member. In addition, at least one of the surfaces of the present optical member refers to one of the surfaces (principal surfaces) of the present optical member having the largest area. This filter may have two or more dielectric multilayer films. In this case, the optical member may have two or more dielectric multilayer films on one surface, but it is preferable to have one or more dielectric multilayer films on both surfaces of the optical member. In this case, the dielectric multilayer film is counted as one. When two or more dielectric multilayer films are included, two or more of the same multilayer films may be included, or two or more different multilayer films may be included.

The filter having such a dielectric multilayer film is preferably a filter having a dielectric multilayer film on one main surface of the optical member, or a filter having a dielectric multilayer film on both main surfaces of the optical member. When the dielectric multilayer film is provided on one side, it is excellent in manufacturing cost and ease of manufacture, and when it is provided on both sides, it is possible to easily obtain an optical filter that has high strength and is less likely to be warped or twisted. . When this filter is used for a solid-state imaging device etc., it is preferable that the warp or distortion of the said filter is small, Therefore It is preferable to provide a dielectric multilayer film on both surfaces of this optical member.

The filter can be added to the optical member and the dielectric multilayer film for the purpose of improving the surface hardness of the optical member or the dielectric multilayer film, improving chemical resistance, antistatic, and eliminating damage within the scope of not impairing the effect of the present invention. Between, on the surface of the optical member opposite to the surface on which the dielectric multilayer film is provided, or on the surface of the dielectric multilayer film on the opposite side to the surface on which the optical member is provided, it is appropriate to provide a support, an antireflection film, a hard Functional films such as coating films or antistatic films. The filter may include one functional film or more than two. When the present filter includes two or more layers of the above-mentioned functional films, two or more of the same films may be included, or two or more different films may be included.

In terms of further exerting the effects of the present invention, as the present filter, specifically, a dual-band bandpass filter such as a near-infrared cut filter (NIR-CF), a visible light-near-infrared selective transmission filter, etc. can be mentioned. Filter (DBPF), near-infrared pass filter (IRPF) and other single-band bandpass filters. In addition, this filter can also be used as a filter for Alternative Light Sources (ALS) for scientific research, etc., or as a filter for ambient light sensors.

When the present filter is NIR-CF or DBPF, it is preferably a filter that satisfies the following requirement (F1) or requirement (F2), more preferably a filter that satisfies the following requirement (F1) and requirement (F2) ) filter.

(F1): The average value (Tf_ave) of the transmittance of light with a wavelength of 450 nm to 570 nm incident from a direction perpendicular to the surface direction of the filter is preferably 85% or more, more preferably 87% or more, and even more preferably more than 90%. Since the average value of the transmittance is preferably high, the upper limit thereof is not particularly limited and may be 100%. If this filter satisfies the above-mentioned requirement (F1), it can be said that this filter has a high visible light transmittance, and can further suppress the reduction of the visible light transmittance while sufficiently cutting off the light of the wavelength in the near-infrared region to be cut off. , so it can be more preferably used as NIR-CF or DBPF.

In addition, in the present invention, the average value of the transmittance at wavelengths A nm to B nm is measured by measuring the transmittance at each wavelength in units of 1 nm from A nm to B nm, and the above The value calculated by dividing the total transmittance by the number of measured transmittances (wavelength range, B-A+1). In addition, the direction perpendicular to the surface direction of the filter refers to the direction perpendicular to the surface (principal surface) of the filter with the largest area.

(F2): The minimum transmittance (Tf_min) of light of wavelengths λA nm to λB nm incident from a direction perpendicular to the surface direction of the filter is preferably 1% or less, more preferably 0.5% or less. Since the minimum value of the transmittance is preferably small, the lower limit thereof is not particularly limited, and may be 0%. If the present filter satisfies the requirement (F2), an optical filter that sufficiently blocks light in the near-infrared region and transmits light in the visible region at a high rate can be easily obtained.

When the present filter is a filter intended to transmit light in the red region (wavelength 580 nm to 650 nm), such as NIR-CF, it is preferably a filter that satisfies the following requirement (F3). (F3): The average value of the transmittance (R transmittance) of the wavelength 580 nm to 650 nm incident from the direction perpendicular to the surface direction of the filter is preferably 80% to 96%, more preferably 82% to 94% %. If the present filter satisfies the above-mentioned requirement (F3), it can be said that the transmittance of light in the red region is sufficiently high, and a good image with excellent RGB balance can be easily obtained by using the above-mentioned optical filter.

In addition, this filter is preferably a filter that satisfies the following requirement (F4). (F4): In the case of light with a wavelength of 600 nm to 900 nm incident from a direction perpendicular to the surface direction of this filter, when the shortest wavelength at which the transmittance is 50% is Wf_min, Wf_min is preferably between 650 nm and The range of 750 nm is more preferably in the range of 660 nm to 740 nm. If the present filter satisfies the above-mentioned requirement (F4), the transmittance in the red region of visible light increases, and by using the above-mentioned optical filter, a good image with excellent RGB balance can be easily obtained.

Furthermore, this filter is preferably a filter that satisfies the following requirement (F5). (F5): In the wavelength 600 nm ~ 900 nm, the transmittance of the light incident from the direction perpendicular to the surface direction of the filter is the shortest wavelength of 20%, and the light incident from the direction 30° away from the surface direction of the filter The transmittance of light incident at an angle is preferably 1 nm to 10 nm, more preferably 1 nm to 8 nm, for the difference in the shortest wavelength of 20% (ΔT20 (0°-30°). If the present filter satisfies the above-mentioned requirement (F5), an optical filter with less dependence on incident angle and more excellent correction of visual sensitivity can be easily obtained.

Furthermore, this filter is preferably a filter that satisfies the following requirement (F6). (F6): The average value (750 nm to 850 nmTave) of the transmittance of light incident from a direction perpendicular to the surface direction of the filter with a wavelength of 750 nm to 850 nm is preferably 0.0% to 6.0%, more preferably 0.0%~4.0%. If this filter satisfies the above-mentioned requirement (F6), the light in the near-infrared region will be reduced, and a good image with less flare and ghosting can be obtained.

The thickness of the present filter may be appropriately selected according to the desired application, but it is preferable that the thickness of the present filter is also thin in view of recent trends such as thinning and weight reduction of solid-state imaging devices and the like. This filter includes this resin layer, so it can be thinned.

The thickness of the filter is preferably 300 μm or less, more preferably 280 μm or less, further preferably 250 μm or less, particularly preferably 240 μm or less, and the lower limit is not particularly limited, for example, 20 μm is ideal.

·NIR-CF The NIR-CF is preferably an optical filter excellent in cutoff performance in the wavelength range of 850 nm to 1200 nm and excellent in transmittance in the visible wavelength range. The dielectric multilayer film used in the NIR-CF is preferably a near-infrared reflective film.

When NIR-CF is used in a solid-state imaging device or the like, it is preferable that the transmittance in the near-infrared wavelength region is low. In particular, it is known that the light-receiving sensitivity of the solid-state imaging device is relatively high in the wavelength range of 800 nm to 1200 nm, and by reducing the transmittance in the wavelength range, it is possible to effectively correct the visual sensitivity of the camera image and the human eye, Excellent color reproducibility can be achieved. In addition, by reducing the transmittance in the wavelength range of 850 nm to 1200 nm, it is possible to effectively prevent the near-infrared light used for the security authentication function from reaching the image sensor and the like.

Regarding NIR-CF, in the wavelength range of 850 nm to 1200 nm, the average value of the transmittance when measured from the vertical direction of the filter is preferably 5% or less, more preferably 4% or less, and even more preferably 3% or less. % or less, particularly preferably 2% or less. When the average value of the transmittance at a wavelength of 850 nm to 1200 nm is in the above-mentioned range, near-infrared rays can be sufficiently cut off and excellent color reproducibility can be realized, which is preferable.

·DBPF The DBPF is not particularly limited as long as it is an optical filter that transmits light of a wavelength to be transmitted among visible light and near-infrared rays, and cuts off light of a wavelength of near-infrared rays to be cut off. The dielectric multilayer film used in the DBPF is preferably a film that transmits light of wavelengths to be transmitted among visible light and near-infrared rays, and cuts off light of wavelengths of near-infrared rays to be cut off.

·IRPF The IRPF is not particularly limited as long as it is an optical filter that cuts visible light and transmits light of a wavelength to be transmitted among near-infrared rays. The dielectric multilayer film used in the IRPF is preferably a film that cuts light of a wavelength to be cut (part of visible light and/or near-infrared rays). In addition, IRPF can also use visible light absorbers to block visible light.

IRPF can be preferably used in optical systems such as infrared surveillance cameras, vehicle-mounted infrared cameras, infrared communications, various sensor systems, infrared alarms, and night vision devices. The light transmittance of the wavelength is low. In particular, in the wavelength region of 380 nm to 700 nm, the average value of the transmittance when measured from the vertical direction of the filter is preferably 10% or less, more preferably 5% or less.

In addition, regarding the IRPF, the transmittance of the near-infrared rays to be transmitted is preferably high. Specifically, there is a light transmission band Ya in the region with a wavelength of 750 nm or more, and the vertical direction from the filter in the light transmission band Ya is The maximum transmittance (T _IR ) at the time of measurement is preferably 45% or more, more preferably 50% or more.

For example, the present filter is excellent in the ability to cut light of a wavelength in a region to be cut and the ability to transmit light of a wavelength to be transmitted. Therefore, it is effectively used for the correction of the visual sensitivity of a solid-state imaging device such as a CCD or a CMOS image sensor of a camera module. Especially effective for digital still cameras, cameras for smartphones, cameras for mobile phones, digital video cameras, cameras for wearable devices, personal computer (PC) cameras, surveillance cameras, automotive cameras, infrared cameras, and televisions , car navigation, portable information terminal, video game console, portable game console, fingerprint authentication system, digital music player, optical sensor (eg: ambient light sensor), various sensor systems, infrared communication wait. Furthermore, it is also effectively used as a heat ray cut filter or the like mounted on a glass plate or the like of an automobile or a building.

＜This resin layer＞ This resin layer contains resin, compound (A) and compound (B), and when the maximum absorption wavelength of compound (A) is λA, and the maximum absorption wavelength of compound (B) is λB, the following requirements are satisfied ( a) ~ Necessary condition (d). Also, when the compound (A) or the compound (B) has multiple maximum absorptions, the wavelength of the maximum absorption with the highest absorbance (lowest transmittance) among the multiple maximum absorptions is set to λA or λB.

(a): λA<λB (=λB-λA>0) λB-λA is preferably 1 nm to 100 nm, more preferably 5 nm to 80 nm, and still more preferably 10 nm to 70 nm. By using the compound (A) and the compound (B) in which the relationship between λA and λB is in the above-mentioned range, it is possible to easily obtain a shoulder peak reduction in the red region to the near-infrared region by a near-infrared absorber, and it is possible to clearly block the desired Optical components and optical filters that cut off wavelength regions (for example, infrared regions).

(b): 680nm≦λA≦870nm The lower limit of λA is preferably 700 nm, more preferably 720 nm, and the upper limit of λA is preferably 850 nm, more preferably 840 nm. When λA is within this range, an optical member and an optical filter that sufficiently shield light in the near-infrared region and transmit light in the visible region with high transmittance can be easily obtained.

(c): 760nm≦λB≦900nm The lower limit of λB is preferably 765 nm, more preferably 770 nm, and the upper limit of λB is preferably 880 nm, more preferably 870 nm. If λB is in the above range, an optical member and an optical filter including a resin layer having a wide absorption band in the infrared region can be easily obtained, and thus an optical member capable of providing a good image with less flare or ghosting can be easily obtained and optical filters. In addition, by satisfying the requirement (b) and the requirement (c), an optical member and an optical filter including a resin layer that further reduces shoulders in the red to near-infrared region by the near-infrared absorber can be easily obtained.

(d): Let Ta be the transmittance at the time of incident light at any wavelength X nm among wavelengths 600 nm to (λA-1) nm from a direction perpendicular to the surface direction of the resin layer, and let the wavelength (X +1) Tx<0 is satisfied when the transmittance when light of nm is incident from a direction perpendicular to the surface direction of the resin layer is Tb, and the maximum value of Tb-Ta is Tx. The upper limit of Tx is preferably -0.0005, more preferably -0.001, and the lower limit of Tx is usually -1. Satisfying the necessary condition (d) means that in the absorption region of this resin layer, its spectral transmittance curve always declines at the right end, and means that there is no shoulder peak in the absorption region starting from red. Therefore, by satisfying the requirement (d), it is possible to easily obtain a material that can clearly block the wavelength region to be blocked (such as the infrared region) and exhibit high transmittance in the wavelength region to be transmitted (such as the visible light region). An optical member and an optical filter excellent in light selective transmittance. In addition, since it is excellent in light selective transmittance, photographic images with good color shading can be obtained.

It is preferable that this resin layer further satisfies the following requirement (e). (e): When the maximum value of Tb-Ta with a wavelength of 600 nm to (λA-1) nm and a transmittance of 5% to 70% is Ty, satisfying Ty<-0.05 The upper limit of Ty is preferably -0.06, more preferably -0.08. The lower limit of Ty is not particularly limited, but is preferably -10. Satisfying the requirement (e) means that in the absorption region of the present resin layer, the spectral transmittance curve falls on the right end, and means that the slope becomes gentle without a sharp change. Therefore, by satisfying the requirement (e), an optical member and an optical filter excellent in light selective transmittance can be easily obtained. In addition, since it is excellent in light selective transmittance, photographic images with good color shading can be obtained.

The resin layer further preferably satisfies at least one of the following requirements (R1) to (R3), and more preferably satisfies all of the following requirements (R1) to (R3).

(R1): The average value (Ts_ave) of the transmittance of light with a wavelength of 450 nm to 570 nm incident from a direction perpendicular to the surface direction of the resin layer is preferably 80% or more, more preferably 85% or more, and even more preferably It is more than 87%. Since the average value of the transmittance is preferably high, the upper limit thereof is not particularly limited and may be 100%. If the present resin layer satisfies the above-mentioned requirement (R1), an optical member and an optical filter that can sufficiently cut light of a wavelength in the near-infrared region to be cut and further suppress a decrease in visible light transmittance can be easily obtained.

In addition, the direction perpendicular to the surface direction of the present resin layer refers to the direction perpendicular to the surface (principal surface) of the present resin layer having the largest area.

(R2): The minimum value (Ts_min) of the transmittance (Ts_min) of light of wavelengths λA nm to λB nm incident from a direction perpendicular to the surface direction of the resin layer is preferably 3% or less, more preferably 1% or less, and still more preferably less than 0.5%. Since the minimum value of the transmittance is preferably small, the lower limit thereof is not particularly limited, and may be 0%. If the present resin layer satisfies the requirement (R2), an optical member and an optical filter that sufficiently shield light in the near-infrared region and transmit light in the visible region with high transmittance can be easily obtained.

(R3): Of the light with a wavelength of 600 nm to 900 nm incident from a direction perpendicular to the surface direction of the resin layer, Wmin is the shortest wavelength with a transmittance of 50%, and the longest wavelength with a transmittance of 50% is When the wavelength is Wmax, Wmax-Wmin is preferably 130 nm or more, more preferably 140 nm or more, and still more preferably 150 nm or more. The upper limit of Wmax-Wmin is not particularly limited, for example, it is 280 nm. If the present resin layer satisfies the above requirement (R3), reflected light of light can be suppressed by a wide absorption band in the near-infrared region, and an optical member capable of providing a good image with less flare or ghosting can be easily obtained and optical filter. In addition, it is also advantageous when the optical filter using the resin layer is an infrared transmission filter, for example, that the resin layer satisfies the requirement (R3).

In addition, the present resin layer preferably satisfies the following requirement (R4). (R4): The Wmin is preferably within a range of 650 nm to 750 nm, more preferably within a range of 660 nm to 740 nm. If this resin layer satisfies the above-mentioned requirement (R4), the transmittance in the red region of visible light will increase, and by using an optical member and an optical filter including this resin layer, a good image with excellent RGB balance can be easily obtained. picture.

When the present resin layer is used for an optical filter such as NIR-CF that is intended to transmit light in the red region (wavelength 580 nm to 650 nm), the present resin layer preferably satisfies the following requirement (R5). (R5): The average value of the transmittance (R transmittance) at a wavelength of 580 nm to 650 nm incident from a direction perpendicular to the surface direction of the resin layer is preferably 72% to 96%, more preferably 74% to 94% %. If this resin layer satisfies the above-mentioned requirement (R5), it can be said that the transmittance of light in the red region is sufficiently high, and by using an optical member and an optical filter including the above-mentioned resin layer, it is possible to easily obtain a product with excellent RGB balance. good image.

The present resin layer preferably satisfies the following requirement (R6). (R6): The maximum value (Ts_max) of the transmittance (Ts_max) of light of wavelengths λA nm to λB nm incident from a direction perpendicular to the surface direction of the resin layer is preferably 11% or less, more preferably 10% or less, and even more preferably is below 8%. Since the maximum value of the transmittance is preferably small, the lower limit thereof is not particularly limited, and may be 0%. If the present resin layer satisfies the above-mentioned requirement (R6), the transmittance in the near-infrared region will decrease, and by using the optical member and optical filter including the present resin layer, a good image with less ghosting can be easily obtained.

The resin layer can be single layer or multilayer. In this case, two or more of the present resin layers may be the same or different.

The thickness of the resin layer can be appropriately selected according to the desired application, and there is no special limitation. It is usually 0.5 μm to 300 μm, preferably 1 μm to 250 μm, more preferably 2 μm to 230 μm, and particularly preferably 3 μm ~150 μm. When the thickness of the present resin layer is within the above range, the thickness and weight of the optical member and the present filter using the present resin layer can be reduced, and they can be suitably used in various applications such as solid-state imaging devices. In particular, when the single-layer present resin layer is used for a lens unit such as a camera module, it is preferable because the profile and weight of the lens unit can be reduced.

[Compound (A) and Compound (B)] The compound (A) and compound (B) are not particularly limited as long as the maximum absorption wavelength satisfies the above-mentioned requirements (a) to (c), and conventionally known near-infrared absorbers can be used.

In addition, the present resin layer may contain two or more compounds whose maximum absorption wavelengths are in the range of 680 nm to 870 nm. When the present resin layer contains two or more compounds whose maximum absorption wavelength is in the range of 680 nm to 870 nm, the compound with the longest maximum absorption wavelength among these compounds is called compound (A). In addition, the present resin layer may contain two or more compounds whose maximum absorption wavelengths are in the range of 760 nm to 900 nm. When the present resin layer contains two or more compounds having a maximum absorption wavelength in the range of 760 nm to 900 nm, the compound with the shortest maximum absorption wavelength among these compounds (among them, the compound that satisfies the requirement (a)) Called compound (B). When the present resin layer contains two or more compounds having a maximum absorption wavelength in the range of 680 nm to 870 nm or a compound having a maximum absorption wavelength in the range of 760 nm to 900 nm, the maximum concentration of the compound contained in the present resin layer Among the absorption wavelengths, when the maximum absorption wavelength is the longest wavelength after the second in descending order, and the maximum absorption wavelength is in the range of 680 nm to 870 nm, this maximum absorption wavelength is set as λA, and the resin layer When the maximum absorption wavelength of the compound contained in is the shortest wavelength among the maximum absorption wavelengths longer than the maximum absorption wavelength λA, and the maximum absorption wavelength is in the range of 760 nm to 900 nm, set the maximum absorption wavelength to is λB. That is, for example, in the case where the present resin layer contains compound 1 having a maximum absorption wavelength of 700 nm, compound 2 having a maximum absorption wavelength of 800 nm, and compound 3 having a maximum absorption wavelength of 850 nm, λB is 850 nm, and λA is 800 nm, compound 2 is compound (A), compound 3 is compound (B). In addition, for example, the present resin layer contains compound 1 having a maximum absorption wavelength of 700 nm, compound 2 having a maximum absorption wavelength of 800 nm, compound 3 having a maximum absorption wavelength of 880 nm, and compound 4 having a maximum absorption wavelength of 900 nm. In this case, λB is 880 nm, λA is 800 nm, compound 2 is compound (A), and compound 3 is compound (B).

The compound (A) and compound (B) are preferably selected from phthalocyanine-based compounds, naphthalocyanine-based compounds, squarylium-based compounds, crotonium-based compounds, cyanine-based compounds, polymethine series compounds (wherein, the polymethine series compounds are compounds other than squarylium series compounds, crotonium series compounds and cyanine series compounds), diimonium series compounds, dithiol metal complex series Compounds in the group consisting of compounds and pyrrolopyrrole-based compounds. Among these, a polymethine-based compound is preferable in terms of easily obtaining an optical member, an optical filter, and the like including a resin layer that can easily reduce the red region due to a near-infrared absorber The shoulder in the near-infrared region can clearly block the wavelength region to be blocked (such as the infrared region) and exhibit high transmittance in the wavelength region to be transmitted (such as the visible light region) and has excellent light selective transmission properties, and It has a high visible light transmittance and a broad absorption band in the near infrared region.

· Polymethine compounds As the polymethine compound, it is a compound other than squarylium compound, crotonium compound, and cyanine compound, and is not particularly limited as long as it does not impair the effect of the present invention, but can be easily obtained. In terms of optical members and optical filters that further exhibit the above effects, Japanese Patent Laid-Open No. 2021-134350, International Publication No. 2021/085372, Japanese Patent Laid-Open No. 2019-164269, and Japanese Patent Laid-Open No. 2019-164269 are preferable. Compounds described in JP-A-2022-025669 and the like. The polymethine compound may be synthesized by a generally known method.

·Phthalocyanine compounds The phthalocyanine compound is not particularly limited as long as it does not impair the effects of the present invention. For example, Japanese Patent Laid-Open No. 2005-220060, Japanese Patent Laid-Open No. The compounds described in Publication No. 195480, International Publication No. 2015/025779, and International Publication No. 2017/164024 may be synthesized by generally known methods. When using a phthalocyanine compound, it is preferable to use it together with at least 1 other near-infrared absorbing agent.

·Naphthalocyanine compounds The naphthalocyanine-based compound is not particularly limited as long as it does not impair the effect of the present invention. The compound described in No. 186490 may be synthesized by a generally known method.

· Squarylium compounds The squarylium-based compound is not particularly limited as long as it does not impair the effects of the present invention, and examples thereof include squarylium-based compounds represented by the following formula (4), Japanese Patent Application Laid-Open No. 2014-074002 The compounds described in the gazette, Japanese Patent Application Laid-Open No. 2014-052431 , and International Publication No. 2017/164024 may be synthesized by generally known methods.

[chemical 1]

Specific examples of R _sq1 to R _sq6 in the formula (4) include: methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, n-pentyl , n-hexyl, n-octyl and other alkyl groups; 2-hydroxyethyl, 2-cyanoethyl, 3-hydroxypropyl, 3-cyanopropyl, methoxyethyl, ethoxyethyl, butyl A group in which part of an alkyl group such as oxyethyl is substituted by a substituent; an aryl group such as phenyl, fluorophenyl, chlorophenyl, tolyl, diethylaminophenyl, naphthyl or a part of an aryl group is substituted Substituted groups; alkenyl groups such as vinyl, propenyl, butenyl, and pentenyl; aralkyl groups such as benzyl, p-fluorobenzyl, phenylpropyl, and naphthylethyl, or part of an aralkyl group is substituted The group substituted by the group.

Any number of hydrogen atoms contained in these R _sq1 to R _sq6 may be substituted with a substituent L. Here, examples of the substituent L include: a fluorine atom, a chlorine atom, a bromine atom, (alkylation is also possible) an amino group, a cyano group, a nitro group, an alkyl group, a hydroxyl group, a thiol group, and an alkyl ether group , an alkyl sulfide group or an ester group.

In terms of solubility with respect to the resin, R _sq1 to R _sq6 in formula (4) are preferably methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, n- Pentyl, n-hexyl, n-octyl and any number of hydrogen atoms of these groups are substituted by the substituent L, more preferably methyl, ethyl, n-propyl, isopropyl, n-butyl, Isobutyl group, tert-butyl group and any number of hydrogen atoms in these groups are substituted by the substituent L.

·Crytonium compounds The crotonium-based compound is not particularly limited as long as it does not impair the effects of the present invention, and examples include JP-A-2007-31644, JP-A-2007-169315, and WO2019/ The compounds described in No. 021767 may be synthesized by generally known methods.

·Cyanine compounds The cyanine-based compound is not particularly limited as long as it does not impair the effect of the present invention. For example, Japanese Patent Laid-Open No. 2009-108267, Japanese Patent Laid-Open No. The compounds described in Publication No. 060774 may be synthesized by generally known methods.

· Diimonium compounds The diimonium compound is not particularly limited as long as it does not impair the effects of the present invention, and examples thereof include diimonium compounds represented by the following formula (5), Japanese Patent Application Laid-Open No. 2005-234558, The compounds described in International Publication No. 2004/048480 and International Publication No. 2017/164024 may be synthesized by generally known methods.

[Chem 2]

Rdi1～Rdi12 independently represent hydrogen atom, halogen atom, sulfo group, hydroxyl group, cyano group, nitro group, carboxyl group, phosphoric acid group, -NR ^g R ^h group, -SR ⁱ group, -SO ₂ R ⁱ group, -OSO ₂ R ⁱ group or any one of the following L ^a to L ^h , R ^g and ^Rh each independently represent a hydrogen atom, -C(O)R ⁱ group or any of the following L ^a to L ^e Or, R ⁱ represents any one of the following L ^a to L ^e , (L ^a ) an aliphatic hydrocarbon group with 1 to 12 carbons (L ^b ) a halogen-substituted alkyl group with 1 to 12 carbons (L ^c ) may An alicyclic hydrocarbon group having 3 to 14 carbons (L ^d ) having a substituent K may have an aromatic hydrocarbon group having 6 to 14 carbons (L ^e ) having a substituent K having 3 to 14 carbons Heterocyclic group (L ^f ) alkoxy group with 1 to 12 carbon atoms (L ^g ) acyl group with 1 to 12 carbon atoms which may have a substituent L, (L ^h ) may have a substituent L with 1 to 12 carbon atoms The alkoxycarbonyl substituent K is at least one selected from aliphatic hydrocarbon groups with 1 to 12 carbons and halogen-substituted alkyl groups with 1 to 12 carbons, and the substituent L is selected from aliphatic hydrocarbons with 1 to 12 carbons In the group consisting of hydrocarbon group, halogen-substituted alkyl group with 1 to 12 carbons, alicyclic hydrocarbon group with 3 to 14 carbons, aromatic hydrocarbon group with 6 to 14 carbons and heterocyclic group with 3 to 14 carbons At least one, X represents the anion required to neutralize the charge.

Rdi1 to Rdi8 are preferably hydrogen atoms, methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, cyclohexyl, phenyl, benzyl, more preferably Isopropyl, sec-butyl, tert-butyl, benzyl.

Rdi9 to Rdi12 are preferably chlorine atom, fluorine atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, cyclohexyl group, phenyl group, hydroxyl group, amino group , dimethylamino, cyano, nitro, methoxy, ethoxy, n-propoxy, n-butoxy, acetylamino, propionylamino, N-methylacetylamino, three Fluoroformylamino, pentafluoroacetylamino, tert-butyrylamino, cyclohexylamino, n-butylsulfonyl, methylthio, ethylthio, n-propylthio, n-butylthio, more preferably Chlorine atom, fluorine atom, methyl group, ethyl group, n-propyl group, isopropyl group, tert-butyl group, hydroxyl group, dimethylamino group, methoxy group, ethoxy group, acetylamino group, propionylamino group, Trifluoroformylamino, pentafluoroacetylamino, tert-butyrylamino, cyclohexylamino, particularly preferably methyl, ethyl, n-propyl, isopropyl. The number of each of Rdi9 to Rdi12 bonded to the same aromatic ring is not particularly limited as long as it is 0 to 4, but is preferably 0 or 1.

The above-mentioned X is an anion required for neutralizing charges, and one molecule is required when the anion is divalent, and two molecules are required when the anion is monovalent. In the latter case, the two anions may be the same or different, but are preferably the same from the viewpoint of synthesis. X is not particularly limited as long as it is an anion, and examples thereof include the anions listed in Table 1 below.

（X-10）

（X-11）

（X-12）

（X-13）

（X-14）

（X-15）

（X-16）

（X-17）

（X-18）

（X-19）

陰離子 結構 （X-20）

（X-21）

（X-22）

（X-23）

（X-24）

（X-25）

（X-26）

（X-27）

（X-28）

（X-29）

（X-30） I ^- （X-31） N(SO ₂CH ₃) ₂ ^- （X-32） N(CF ₂CH ₃) ₂ ^- [Table 1] anion structure (X-1) ^Cl- (X-2) ^F- (X-3) ^Br- (X-4) _PF6- ^_ (X-5) ClO ₄ ^- (X-6) NO ₃ ^- (X-7) BF ₄ ^- (X-8) SCN ^- (X-9)

(X-10)

(X-11)

(X-12)

(X-13)

(X-14)

(X-15)

(X-16)

(X-17)

(X-18)

(X-19)

anion structure (X-20)

(X-21)

(X-22)

(X-23)

(X-24)

(X-25)

(X-26)

(X-27)

(X-28)

(X-29)

(X-30) I ^- (X-31) N(SO ₂ CH ₃ ) ₂ ^- (X-32) N(CF ₂ CH ₃ ) ₂ ^-

As X, if it is an anion with high acidity when it is made into an acid, it tends to improve the heat resistance of the diimonium compound when it is an anion of the diimonium compound, so it is particularly preferable to be ( X-10), (X-16), (X-17), (X-21), (X-22), (X-24), (X-28).

·Dithiol metal complex compound The dithiol metal complex compound is not particularly limited as long as it does not impair the effect of the present invention, for example, Japanese Patent Laid-Open No. 2004-010822, Japanese Patent Laid-Open No. For compounds described in Japanese Patent Laid-Open No. 2006-215395, International Publication No. 2008/086931, Japanese Patent Laid-Open No. 2012-007038, International Publication No. 2012/152584, and Japanese Patent Laid-Open No. 2015-40895, as long as It may be synthesized by a generally known method. In addition, for example, as described in International Publication No. 1998/034988, chlorides can also be used.

· Pyrrolopyrrole compounds The pyrrolopyrrole-based compound is not particularly limited as long as it does not impair the effects of the present invention. It can be synthesized by a known method.

Compound (A) and compound (B) are preferably compounds soluble in organic solvents, particularly preferably compounds soluble in methylene chloride. Here, being soluble in an organic solvent means that 0.1 g or more of the compound (A) or the compound (B) is dissolved in 100 g of an organic solvent at 25°C.

Compound (A) and compound (B) are preferably compounds satisfying the following requirement (C1). Requirement (C1): Transmission spectrum measured using a solution of compound (A) or compound (B) dissolved in methylene chloride (herein, the transmission spectrum is the transmission rate at the maximum absorption wavelength of 10% In the spectrum), the average value of the transmittance at a wavelength of 430 nm to 580 nm is preferably 93% or more, more preferably 95% or more. The average value of the transmittance is preferably high, so the upper limit thereof is not particularly limited, and may be 100%. When the compound (A) and the compound (B) satisfy the requirement (C1), it is possible to sufficiently cut off light having a wavelength in the near-infrared region to be cut off, and further suppress a decrease in visible light transmittance.

The compound (A) and the compound (B) more preferably satisfy the following requirement (C2). Requirement (C2): In the spectral absorption spectrum measured using a solution obtained by dissolving compound (A) or compound (B) in methylene chloride, the absorbance at the longest wavelength among the maximum absorption wavelengths is set to εa and εbmax are preferably 20 or more, more preferably 25 or more, and still more preferably 27 or more, when the maximum value of the absorbance at a wavelength of 430 nm to 580 nm is εbmax. Since εa/εbmax is preferably large, the upper limit is not particularly limited, and is, for example, 10,000 or less. If the compound (A) and the compound (B) satisfy the above-mentioned requirement (C2), the decrease in the visible light transmittance can be further suppressed while sufficiently cutting off light having a wavelength in the near-infrared region to be cut off.

It is preferable that the compound (A) satisfies the following requirement (i) from the viewpoint of further exerting the effects of the present invention and the like. (i): Among the wavelengths of 600 nm to (λA-1) nm, the transmittance of compound (A) for light of arbitrary wavelength X nm is TaA, and the transmittance of compound (A) for light of wavelength (X+1) nm ) when the transmittance is TbA, there is a wavelength X nm satisfying TbA-TaA>0 in part of the wavelength 600 nm to (λA-1) nm. The compound (A) that satisfies the above requirement (i) can be said to have a shoulder in the red region to the near infrared region. According to the present invention, even if such a compound (A) is used, it is possible to easily obtain the An optical member and an optical filter of a resin layer of a shoulder in the red region to the near infrared region of a near infrared absorber. Specifically, the requirement (i) can be measured by the method described in the following examples.

The content of the compound (A) in the present resin layer is preferably 0.02 to 5.0 parts by mass, more preferably 0.02 to 3 parts by mass relative to 100 parts by mass of the resin. When the content of the compound (A) is within the above range, an optical member and an optical filter that sufficiently shield light in the infrared region and transmit light in the visible region at a high rate can be easily obtained.

The content of the compound (B) in the present resin layer is preferably 0.02 to 5.0 parts by mass, more preferably 0.02 to 3.0 parts by mass relative to 100 parts by mass of the resin. If the content of the compound (B) is within the above range, an optical member and an optical filter including a resin layer having a wide absorption band in the infrared region can be easily obtained, thereby providing a light spot and less ghosting. Optical components and optical filters for good images.

[resin] The resin used in this resin layer is not particularly limited, and conventionally known resins can be used. The resin used for this resin layer may be single type, or may be two or more types.

The resin is not particularly limited as long as it does not impair the effects of the present invention. For example, it is excellent in thermal stability and formability to the shape of a film (plate), and can be easily obtained by heating at about 100°C or higher. In terms of high temperature vapor deposition to form a dielectric multilayer film, etc., the glass transition temperature (Tg) is preferably 110°C to 380°C, more preferably 110°C to 370°C, and particularly preferably 120°C. ~360°C resin. In addition, when the Tg of the resin is 140° C. or higher, a dielectric multilayer film can be vapor-deposited at a higher temperature, which is particularly preferable.

The total light transmittance (Japanese Industrial Standards (Japanese Industrial Standards, JIS) K 7375: 2008) of a resin plate with a thickness of 0.1 mm containing the resin is preferably 75% to 95%, more preferably 75% to 95%. 78% to 95%, particularly preferably 80% to 95% of the resin. When the resin whose total light transmittance exists in the said range is used, the optical member and optical filter excellent in transparency can be obtained easily.

The polystyrene-equivalent weight average molecular weight (Mw) of the resin measured by gel permeation chromatography (GPC) is usually 15,000 to 350,000, preferably 30,000 to 250,000, and the number average molecular weight (Mn) is usually 15,000 to 350,000. 10,000 to 150,000, preferably 20,000 to 100,000.

Examples of such resins include cyclic (poly)olefin-based resins, aromatic polyether-based resins, polyimide-based resins, polyester-based resins, polycarbonate-based resins, polyamide (aromatic poly Amide)-based resins, polyarylate-based resins, polyethene-based resins, polyether-based resins, polyparaphenylene-based resins, polyamide-imide-based resins, polyethylene naphthalate (polyethylene naphthalate, PEN )-based resins, fluorinated aromatic polymer-based resins, (modified) acrylic resins, epoxy-based resins, allyl ester-based curable resins, silsesquioxane-based UV-curable resins, acrylic-based UV-curable resins Resins, vinyl-based UV-curable resins. Specific examples of these resins include resins described in International Publication No. 2019/168090, and the like.

[other ingredients] The present resin layer may further contain compounds (A), compounds (B) and absorbers other than ultraviolet absorbers (hereinafter also referred to as "compound (X)"), ultraviolet absorbers, Antioxidants, fluorescent matting agents, metal complex compounds, antistatic agents, light diffusing materials and other components. These other components may be used individually by 1 type, and may use 2 or more types.

These other components may be mixed together with the resin or the like when forming the present resin layer, or may be added when synthesizing the resin. Moreover, what is necessary is just to select suitably according to desired characteristics etc., and is 0.01-5.0 mass parts normally with respect to 100 mass parts of resins, Preferably it is 0.05-2.0 mass parts.

[Compound (X)] The present resin layer may contain one kind or two or more kinds of compounds (X). Examples of the compound (X) include phthalocyanine-based compounds, naphthalocyanine-based compounds, squarylium-based compounds, crotonium-based compounds, and polymethine-based compounds (wherein the polymethine Squarylium-based compounds and crotonium-based compounds), octanary porphyrin-based compounds, diimonium-based compounds, perylene-based compounds, dithiol metal complex-based compounds, metal oxide microparticles .

As the phthalocyanine compound, naphthalocyanine compound, squarylium compound, crotonium compound, polymethine compound, diimonium compound, perylene compound, dithiol metal complex In addition to the compound whose maximum absorption wavelength falls outside the range of the above-mentioned requirement (b) and requirement (c), the compounds of the system can include those listed in the column of compound (A) and compound (B). The same compound, etc. The eight-membered porphyrin-based compound is not particularly limited as long as it does not impair the effect of the present invention, and examples thereof include compounds described in Japanese Patent Laid-Open No. 2013-53120 and Japanese Patent Laid-Open No. 2016-102074, What is necessary is just to carry out synthesis by a generally known method. The metal oxide fine particles are not particularly limited as long as the effect of the present invention is not impaired, for example, the metal oxide fine particles described in International Publication No. 2017/018419 can be used, as long as they are synthesized by a generally known method.

The compound (X) preferably includes a squarylium-based compound, more preferably includes one or more squarylium-based compounds and another compound (X'), and as the other compound (X'), Particularly preferred are phthalocyanine-based compounds and polymethine-based compounds.

The squaraine-based compound has a sharp absorption peak, and has excellent visible light transmittance and a high molar absorptivity, but may generate fluorescence that causes scattered light when light is absorbed. In this case, scattered light can be suppressed by using the squarylium-based compound in combination with the compound (X′). In this way, if scattered light is suppressed, when the obtained optical member and optical filter are used in an imaging device or the like, the image quality of the obtained camera will become better.

[ultraviolet absorber] Examples of the ultraviolet absorber include: azomethane-based compounds, indole-based compounds, benzotriazole-based compounds, triazine-based compounds, anthracene-based compounds, cyanoacrylate-based compounds, Japanese Patent Laid-Open Compounds described in Publication No. 2019-014707, etc. Among these, azoformium-based compounds, indole-based compounds, benzotriazole-based compounds, and cyanoacrylate-based compounds are particularly preferable from the viewpoint of absorption wavelength and compound stability. By containing an ultraviolet absorber, an optical member and an optical filter having a small incident angle dependence in the near-ultraviolet wavelength region can be easily obtained, and when the optical member and the optical filter are used in an imaging device or the like, the The resulting camera quality has been improved.

[Antioxidants] Examples of the antioxidant include: 2,6-di-tert-butyl-4-methylphenol, 2,2'-dioxy-3,3'-di-tert-butyl-5,5' -Dimethyldiphenylmethane, tetrakis[methylene-3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate]methane.

[Manufacturing method of this resin layer] The present resin layer can be formed, for example, by melt molding or casting molding, and if necessary, coating agents such as antireflective agents, hard coating agents, and/or antistatic agents can be applied after molding.

Regarding the laminate in which the present resin layer is laminated on the support (functional film), for example, the present resin layer forming material is melt-molded or cast-molded on the support, and preferably spin coating, slit coating, spray coating, etc. A laminate in which the present resin layer is formed on a support can be produced by applying ink or the like and then drying and removing the solvent, or performing light irradiation or heating if necessary.

Examples of the support include glass plates (including absorbing glasses such as near-infrared absorbing glass), steel belts, steel cylinders, and supports made of resins (eg, polyester films and cyclic olefin-based resin films).

Furthermore, the resin layer can also be formed on an optical part by a method such as a method of applying a liquid resin layer forming material to an optical part such as a glass plate, quartz or plastic, and drying the solvent; The permanent resin layer forming material is hardened and dried.

It is preferable that the present resin layer or the amount of residual solvent in the resin layer be as small as possible. Specifically, the residual solvent amount is preferably 3% by mass or less, more preferably 1% by mass or less, and still more preferably 0.5% by mass or less with respect to 100% by mass of the resin layer. In addition, the present resin layer and the solvent content in the resin layer are preferably suppressed to 100 mass ppm or less. When the amount of the residual solvent is within the above range, a resin layer that is less likely to be deformed or whose properties are less likely to change, and can easily exhibit a desired function can be obtained.

＜Dielectric Multilayer Film＞ Examples of the dielectric multilayer film include laminates in which high-refractive-index material layers and low-refractive-index material layers are alternately laminated.

Examples of the material constituting the high-refractive-index material layer include materials having a refractive index of 1.7 or more, and materials having a refractive index of usually 1.7 to 2.5 can be selected. Examples of such materials include titanium oxide (titania), zirconium oxide, tantalum pentoxide, niobium pentoxide, lanthanum oxide, yttrium oxide, zinc oxide, zinc sulfide, or indium oxide as the main component, and a small amount of (for example, 0% by mass to 10% by mass relative to the main component) tin oxide and/or cerium oxide or the like.

As the material constituting the low refractive index material layer, a material having a refractive index of 1.6 or less can be used, and a material having a refractive index of usually 1.2 to 1.6 can be selected. Examples of such materials include silicon dioxide, aluminum oxide, lanthanum fluoride, magnesium fluoride, and sodium aluminum hexafluoride.

The method of laminating the high-refractive-index material layer and the low-refractive-index material layer is not particularly limited as long as a dielectric multilayer film in which these material layers are laminated can be formed. For example, chemical vapor deposition (Chemical Vapor Deposition, CVD) method, sputtering method, vacuum evaporation method, ion-assisted evaporation method or ion plating method can be used to directly form a high refractive index material layer on the optical member. Dielectric multilayer film laminated alternately with low refractive index material layers.

Usually, when the near-infrared wavelength to be blocked is λ (nm), the thickness of each of the high-refractive-index material layer and the low-refractive-index material layer is preferably 0.1 λ to 0.5 λ. In addition, as the high-refractive-index material layer and the low-refractive-index material layer, according to the purpose of reducing reflection in the visible light region or improving shielding performance in a specific wavelength region, it is also possible to use those with a thickness outside the range of 0.1 λ to 0.5 λ. layer. The value of λ (nm) is, for example, 700 nm to 1400 nm, preferably 750 nm to 1300 nm in the case of NIR-CF. When the thicknesses of the high-refractive-index material layer and the low-refractive-index material layer are in the above-mentioned ranges, the product (n×d) of the refractive index (n) and the film thickness (d), that is, the optical film thickness becomes equal to λ/4 With approximately the same value, there is a tendency that the blocking-transmitting of a specific wavelength can be easily controlled by the relationship of the optical characteristics of reflection-refraction.

The total number of laminations of the high-refractive-index material layers and low-refractive-index material layers in the dielectric multilayer film is, for example, in the case of NIR-CF, preferably 16 to 70 layers for the entire optical filter, and more preferably 20. Layers to 60 floors. If the thickness of each layer, the thickness of the dielectric multilayer film as a whole of the optical filter, or the total number of laminations are within the above range, a sufficient manufacturing margin can be ensured, and the warpage of the optical filter or the dielectric multilayer can be reduced. membrane cracking.

In this filter, the types of materials constituting the high refractive index material layer and the low refractive index material layer, the high refractive index material layer and the low refractive index The thickness of each layer of the material layer, the order of lamination, and the number of laminations ensure sufficient transmittance in the wavelength region to be transmitted (for example: visible light region) and sufficient light in the near-infrared wavelength region to be cut off Cut-off characteristics, and reduce the reflectivity when near-infrared rays are incident from oblique directions.

Here, in order to optimize the conditions of the dielectric multilayer film, for example, it is only necessary to use optical film design software (for example, Essential Macleod, manufactured by Thin Film Center) so that the wavelength to be transmitted can be considered. The anti-reflection effect in the region (for example: visible light region) and the light cutoff effect in the near-infrared region to be cut off can be set by setting parameters. In the case of the above-mentioned software, for example, when forming a dielectric multilayer film of NIR-CF, the target transmittance at a wavelength of 400 nm to 700 nm is set to 100%, and the value of the target tolerance (Target Tolerance) is set to 1. In addition, set the target transmittance at wavelengths from 705 nm to 950 nm to 0%, set the value of the target tolerance (Target Tolerance) to 0.5, and other parameter setting methods. These parameters can also be combined with various characteristics of the resin layer to divide the wavelength range more finely to change the value of the target tolerance (Target Tolerance).

＜Functional film＞ The method of laminating the functional film is not particularly limited, and examples thereof include: melt-molding the optical member or a coating agent such as an antireflective agent, a hard coat agent, and/or an antistatic agent on the optical member or the dielectric multilayer film in the same manner as described above; Casting methods, etc.

In addition, it can also be produced by applying a curable composition containing the coating agent or the like to the present optical member or dielectric multilayer film using a bar coater or the like, and then curing it by ultraviolet irradiation or the like.

Examples of the coating agent include ultraviolet (Ultraviolet, UV)/electron beam (electron beam, EB) curable resins, thermosetting resins, and the like. Specifically, vinyl compounds and urethanes series, urethane acrylate series, acrylate series, epoxy series and epoxy acrylate series resins etc. One kind of coating agent may be used alone, or two or more kinds may be used. Examples of the curable composition containing these coating agents include vinyl, urethane, urethane acrylate, acrylate, epoxy and epoxy acrylate curable combinations. things etc.

The curable composition may also contain a polymerization initiator. As the polymerization initiator, a known photopolymerization initiator or a thermal polymerization initiator may be used, and a photopolymerization initiator and a thermal polymerization initiator may be used in combination. One kind of polymerization initiator may be used alone, or two or more kinds may be used.

In the curable composition, when the total amount of the curable composition is 100% by mass, the mixing ratio of the polymerization initiator is preferably 0.1% by mass to 10% by mass, more preferably 0.5% by mass to 10% by mass. % by mass, more preferably 1% by mass to 5% by mass. When the mixing ratio of the polymerization initiator is within the above range, a curable composition excellent in curability and handling properties can be easily obtained, and an antireflection film, hard coat film or antireflective film having desired hardness can be easily obtained. Electrostatic film and other functional films.

Furthermore, an organic solvent may be added as a solvent to the curable composition, and a known solvent may be used as the organic solvent. Specific examples of organic solvents include alcohols such as methanol, ethanol, isopropanol, butanol, and octanol; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; acetic acid Ethyl ester, butyl acetate, ethyl lactate, γ-butyrolactone, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate and other esters; ethylene glycol monomethyl ether, diethylene glycol monobutyl ether, etc. Ethers; benzene, toluene, xylene and other aromatic hydrocarbons; dimethylformamide, dimethylacetamide, N-methylpyrrolidone and other amides. These solvents may be used alone or in combination of two or more.

The thickness of the functional film is preferably 0.1 μm to 20 μm, more preferably 0.5 μm to 10 μm, particularly preferably 0.7 μm to 5 μm.

In addition, for the purpose of improving the adhesiveness between the optical member and the functional film and/or the dielectric multilayer film, or the adhesiveness between the functional film and the dielectric multilayer film, the surface of the optical member, the functional film or the dielectric multilayer film may also be electroplated. Surface treatment such as halo treatment or plasma treatment.

"Solid state camera" The solid-state imaging device of the present invention includes the optical member or the filter. Here, the so-called solid-state imaging device refers to a device including a solid-state imaging element such as a CCD or a CMOS image sensor. Specifically, digital still cameras, cameras for smartphones, cameras for mobile phones, and wearable devices can be cited. Cameras, digital video cameras, etc.

"Optical Sensor Device" The optical sensor device according to the present invention is not particularly limited as long as it includes this optical member or this filter, as long as it has a conventionally known structure. The optical sensor device is preferably an ambient light sensor device. For example, a device including the present filter, a photoelectric conversion element, a light diffusion film, and the like is exemplified. Here, the so-called optical sensor is a sensor that can perceive the brightness or color tone of the surroundings (intensity of red in the evening time period, etc.), and for example, it can be controlled based on the information sensed by the optical sensor. The illuminance or color of the display. [Example]

Hereinafter, the present invention will be more specifically described based on examples, but the present invention is not limited to these examples at all.

[Resin Synthesis Example] 8-methyl-8-methoxycarbonyltetracyclo[4.4.0.1 ^2,5 .1 ^7,10 ]dode-3-ene (hereinafter also referred to as 100 parts by mass called "DNM"), 18 parts by mass of 1-hexene (molecular weight regulator), and 300 parts by mass of toluene (solvent for ring-opening polymerization reaction) were put into a reaction vessel replaced with nitrogen, and the solution was heated to 80°C. Next, 0.2 parts by mass of a toluene solution of triethylaluminum (0.6 mol/liter) as a polymerization catalyst, and a toluene solution of methanol-modified tungsten hexachloride (concentration 0.025 mol/liter) were added to the solution in the reaction vessel 0.9 parts by mass, and the solution was heated and stirred at 80° C. for 3 hours to perform a ring-opening polymerization reaction to obtain a ring-opened polymer solution. The polymerization conversion rate in the polymerization reaction was 97%.

[Chem 3]

1,000 parts by mass of the obtained ring-opened polymer solution was put into an autoclave, and 0.12 parts by mass of RuHCl(CO)[P(C ₆ H ₅ ) ₃ ] ₃ was added to the ring-opened polymer solution. Under the conditions of a hydrogen pressure of 100 kg/cm ² and a reaction temperature of 165°C, the hydrogenation reaction was carried out by heating and stirring for 3 hours. After the obtained reaction solution (hydrogenated polymer solution) was cooled, the hydrogen gas was decompressed. The obtained reaction solution was poured into a large amount of methanol, the coagulated matter was separated and recovered, and dried to obtain a hydrogenated polymer (hereinafter also referred to as "resin A").

＜Molecular Weight＞ Using a GPC device manufactured by Tosoh Co., Ltd. (HLC-8220 type, column: TSKgel α-M, developing solvent: tetrahydrofuran (Tetrahydrofuran, THF)), the obtained resin A was converted into standard polymer The weight average molecular weight (Mw) and number average molecular weight (Mn) of styrene were determined. Mn is 32,000, and Mw is 137,000.

＜Glass transition temperature＞ The glass transition temperature (Tg) of the obtained resin A was measured using a differential scanning calorimeter (DSC6200) manufactured by Hitachi High-Tech Science Co., Ltd., at a heating rate: 20° C. per minute, under nitrogen flow Determination. Tg is 165°C.

[Synthesis example of compound] Compound (A) and compound (B) used in the following examples were synthesized based on generally known synthesis methods. Compound (A) and Compound (B) can be referred to, for example, JP-A-2009-108267, JP-A-5-59291, JP-A-2014-95007, JP-A-2011-52218 Gazette, International Publication No. 2007/114398, Japanese Patent Laid-Open No. 2003-246940, "Chemistry of Heterocyclic Compounds: The Cyanine Dyes and Related Compounds" (Vol. 18 (Wiley, 1964)), as described in Near-Infrared Dyes for High Technology Applications (Springer, 1997) to synthesis.

[Intermediate Synthesis Example 1] [Chemical 4]

In a 200 mL eggplant-shaped flask with a stirring bar, add 4 g of compound a-9 and 21.8 g of ethyl pivalate and stir. After 5 minutes, add sodium hydride (60%, dispersed in paraffin liquid (dispersion in Paraffin Liquid)) 3.2 g, after that, stirred at 80°C for 3 hours. Thereafter, it was cooled to room temperature, and 30 mL of 1 N hydrochloric acid aqueous solution was added for neutralization, and the organic phase was extracted with 150 mL of ethyl acetate. Then, 15 g of magnesium sulfate was added to the organic phase and stirred for 15 minutes. After that, the magnesium sulfate was removed by filtration, and the filtrate was placed in a 300 mL eggplant-shaped flask, and the solvent was distilled off using an evaporator, thus obtaining Compound a-10.

A stirring bar was placed in the eggplant-shaped flask containing the compound a-10, and 20 mL of concentrated hydrochloric acid was added thereto, followed by stirring at 40°C. After stirring for 1 hour, the reaction solution was cooled in an ice bath, and 240 mL of 1 N aqueous sodium hydroxide solution was added for neutralization. Then, the liquid was transferred to a separatory funnel, 200 mL of ethyl acetate was added to extract the organic phase, and then 15 g of magnesium sulfate was added and stirred for 15 minutes. Thereafter, magnesium sulfate was removed by filtration through a filter, the filtrate was put into a 300 mL eggplant-shaped flask, and the solvent was distilled off using an evaporator. Thereafter, the compound remaining in the flask was separated and purified by silica gel chromatography to obtain 2.0 g of the target compound a-11. In addition, identification of the compound was carried out by LC-MS and ¹ H-NMR analysis.

[Intermediate Synthesis Example 2] [Chemical 5]

Into a 200 mL eggplant-shaped flask with a stirring bar, 2.7 g of compound a-11 and 50 mL of diethyl ether were added and cooled in an ice bath. After cooling in an ice bath for 5 minutes, 24.7 mL of 1 mol/L methylmagnesium iodide diethyl ether solution was added over 10 minutes, then heated to 35°C and stirred for 2 hours. Then, the reaction solution was cooled in an ice bath, 50 mL of 20% perchloric acid aqueous solution was added, the precipitated solid was separated by filtration, washed with 50 mL of water, and dried under reduced pressure at 50°C to obtain 0.7 g of compound a-12. In addition, identification of the compound was carried out by ¹ H-NMR analysis.

[Synthesis example of compound (z1)] [Chem. 6]

In a 100 mL eggplant-shaped flask with a stirring bar, add 0.5 g of compound a-12, 0.22 g of malondialdehyde dianiline hydrochloride, 7.5 mL of acetonitrile, 2.5 mL of anhydrous acetic acid, and 0.2 mL of pyridine, Heat to reflux for 2 hours. Thereafter, it was cooled to room temperature, and the precipitated solid was recovered by filtration under reduced pressure, washed with 10 mL of acetic acid and 10 mL of acetonitrile, and dried under reduced pressure at 50°C to obtain 0.35 g of compound a-13 .

In a 100 mL eggplant-shaped flask with a stirring bar, add 0.3 g of compound a-13, 0.8 g of tetrakis-pentafluorophenyl lithium borate, 50 mL of dichloromethane, and 20 mL of water, and stir at room temperature 3 hours. Next, the liquid was transferred to a separatory funnel, and after removing the aqueous phase, the organic phase was washed twice with 20 mL of water, and the solvent was distilled off from the organic phase using an evaporator. Thereafter, the residue was dissolved in 20 mL of acetone, 100 mL of water was added, and 13 g of the solvent was distilled off with an evaporator, followed by cooling in an ice bath. Thereafter, the precipitated solid was collected by suction filtration, washed with 50 mL of methanol, and dried under reduced pressure at 50° C. to obtain 0.5 g of compound (z1). In addition, compound (z1) was identified by LC-MS and ¹ H-NMR analyses.

The compound (z1) was dissolved in dichloromethane to prepare a 7.5 mg/L solution. The prepared solution was filled into a 1 cm-thick transparent quartz cell, and the transmittance at each wavelength was measured using an ultraviolet-visible spectrophotometer (manufactured by Shimadzu Corporation, UV-3100). Compound (z1) has a maximum absorption wavelength of 770 nm. In addition, in the wavelength of 600 nm to (maximum absorption wavelength-1) nm, the transmittance of compound (z1) for light of arbitrary wavelength X nm is Ta (z1), and the transmittance of light of wavelength (X+1) nm When the transmittance of the compound (z1) is Tb(z1), it has a wavelength X nm satisfying Tb(z1)-Ta(z1)>0 at wavelengths of 700 nm to 720 nm. Table 2 shows the measured values of Ta(z1) and Tb(z1) and the calculated values of Tb(z1)-Ta(z1) at wavelengths from 695 nm to 730 nm.

[Table 2] wavelength (nm) Ta (z1) Tb(z1) Tb(z1)-Ta(z1) 695 68.60 68.35 -0.25 696 68.35 68.16 -0.19 697 68.16 68.05 -0.11 698 68.05 67.95 -0.09 699 67.95 67.94 -0.02 700 67.94 67.98 0.04 701 67.98 68.11 0.14 702 68.11 68.26 0.14 703 68.26 68.47 0.22 704 68.47 68.72 0.25 705 68.72 69.03 0.30 706 69.03 69.38 0.35 707 69.38 69.72 0.34 708 69.72 70.10 0.39 709 70.10 70.46 0.36 710 70.46 70.86 0.39 711 70.86 71.27 0.41 712 71.27 71.68 0.41 713 71.68 72.05 0.37 714 72.05 72.37 0.32 715 72.37 72.65 0.28 716 72.65 72.91 0.26 717 72.91 73.14 0.23 718 73.14 73.29 0.15 719 73.29 73.38 0.09 720 73.38 73.39 0.01 721 73.39 73.32 -0.07 722 73.32 73.18 -0.15 723 73.18 72.95 -0.22 724 72.95 72.68 -0.28 725 72.68 72.31 -0.36 726 72.31 71.84 -0.47 727 71.84 71.26 -0.58 728 71.26 70.59 -0.67 729 70.59 69.80 -0.80 730 69.80 68.93 -0.87

[Synthesis Example of Compound (z2)] The following compound (z2) was obtained by the same method as that of compound (z1) except that the raw material compound used was changed. [chemical 7]

Using the same method as compound (z1), the maximum absorption wavelength of compound (z2) and the wavelength X nm satisfying Tb-Ta>0 were obtained. As a result, the maximum absorption wavelength of compound (z2) was 790 nm, and at wavelength 717 nm X nm in ~736 nm.

[Synthesis example of compound (z3)] The following compound (z3) was obtained by the same method as that of compound (z1) except that the raw material compound used was changed. [chemical 8]

Using the same method as compound (z1), the maximum absorption wavelength of compound (z3) and the wavelength X nm satisfying Tb-Ta>0 were obtained. As a result, the maximum absorption wavelength of compound (z3) was 802 nm, and at wavelength 727 nm X nm in ~746 nm.

[Synthesis Example of Compound (z4)] The following compound (z4) was obtained by the same method as that of compound (z1) except that the raw material compound used was changed. [chemical 9]

Using the same method as compound (z1), the maximum absorption wavelength of compound (z4) and the wavelength X nm satisfying Tb-Ta>0 were obtained. As a result, the maximum absorption wavelength of compound (z4) was 808 nm, and at wavelength 717 nm X nm in ~736 nm.

[Intermediate Synthesis Example 3] [Chemical 10]

Into a 300 mL eggplant-shaped flask equipped with a stirring bar, 5 g of flavone (compound a-6) and 50 mL of THF were added, and cooled in an ice bath. After cooling in an ice bath for 5 minutes, 24.7 mL of 1 mol/L methylmagnesium iodide diethyl ether solution was added over 10 minutes, then heated to 35°C and stirred for 2 hours. Then, the reaction solution was cooled in an ice bath, 50 mL of 20% perchloric acid aqueous solution was added, the precipitated solid was separated by filtration, washed with 50 mL of water, and dried under reduced pressure at 50°C to obtain 4.5 g of compound a-7. In addition, identification of the compound was carried out by ¹ H-NMR analysis.

[Synthesis example of compound (z5)] [Chem. 11]

In a 100 mL eggplant-shaped flask with a stirring bar, add 0.7 g of compound a-7, 0.26 g of malondialdehyde dianiline hydrochloride, 10 mL of acetonitrile, 5 mL of anhydrous acetic acid, and 0.2 mL of pyridine, Heat to reflux for 2 hours. Thereafter, it was cooled to room temperature, and the precipitated solid was recovered by filtration under reduced pressure, and washed with 10 mL of diethyl ether to obtain 0.6 g of Compound a-8.

In a 100 mL eggplant-shaped flask with a stirring bar, add 0.1 g of compound a-8, 0.2 g of tetrakis-pentafluorophenyl lithium borate, 20 mL of dichloromethane, and 10 mL of water, and stir at room temperature 3 hours. Next, the liquid was transferred to a separatory funnel, and after removing the aqueous phase, the organic phase was washed twice with 20 mL of water, and the solvent was distilled off from the organic phase using an evaporator. Thereafter, the residue was dissolved in 0.5 mL of acetone, 10 mL of methanol was added and cooled in an ice bath, and the precipitated solid was collected by suction filtration and dried under reduced pressure at 50°C to obtain 0.07 g of the compound (z5). In addition, compound (z5) was identified by LC-MS and ¹ H-NMR analyses.

Using the same method as compound (z1), the maximum absorption wavelength of compound (z5) and the wavelength X nm satisfying Tb-Ta>0 were obtained. As a result, the maximum absorption wavelength of compound (z5) was 825 nm, and at wavelength 745 nm X nm in ~769 nm.

[Synthesis example of compound (z6)] The following compound (z6) was obtained by the same method as that of compound (z1) except that the raw material compound used was changed. [chemical 12]

Using the same method as compound (z1), the maximum absorption wavelength of compound (z6) and the wavelength X nm satisfying Tb-Ta>0 were obtained. As a result, the maximum absorption wavelength of compound (z6) was 835 nm, and at wavelength 749 nm X nm in ~773 nm.

[Synthesis Example of Compound (z7)] The following compound (z7) was obtained by the same method as that of compound (z1) except that the raw material compound used was changed. [chemical 13]

Using the same method as compound (z1), the maximum absorption wavelength of compound (z7) and the wavelength X nm satisfying Tb-Ta>0 were obtained. As a result, the maximum absorption wavelength of compound (z7) was 842 nm, and at wavelength 764 nm X nm in ~779 nm.

[Synthesis Example of Compound (z8)] The following compound (z8) was obtained by a known method. [chemical 14]

Using the same method as compound (z1), the maximum absorption wavelength of compound (z8) and the wavelength X nm satisfying Tb-Ta>0 were obtained. As a result, the maximum absorption wavelength of compound (z8) was 712 nm, and there was no X nm .

[Synthesis Example of Compound (z9)] The following compound (z9) was obtained by the method described in JP-A-2014-67019. [chemical 15]

Using the same method as compound (z1), the maximum absorption wavelength of compound (z9) and the wavelength X nm satisfying Tb-Ta>0 were obtained. As a result, the maximum absorption wavelength of compound (z9) was 696 nm, and at wavelength 626 nm X nm in ~648 nm.

[Synthesis Example of Compound (z10)] The following compound (z10) was obtained by a known method. [chemical 16]

Using the same method as compound (z1), the maximum absorption wavelength of compound (z10) and the wavelength X nm satisfying Tb-Ta>0 were obtained. As a result, the maximum absorption wavelength of compound (z10) was 738 nm, and at wavelength 662 nm X nm in ~682 nm.

[Synthesis Example of Compound (z11)] The following compound (z11) was obtained by a known method. [chemical 17]

Using the same method as compound (z1), the maximum absorption wavelength of compound (z11) and the wavelength X nm satisfying Tb-Ta>0 were obtained. As a result, the maximum absorption wavelength of compound (z11) was 882 nm, and at wavelength 786 nm X nm in ~813 nm.

[Synthesis Example of Compound (z12)] The following compound (z12) was obtained by the method described in JP-A-2022-025669. [chemical 18]

Using the same method as compound (z1), the maximum absorption wavelength of compound (z12) and the wavelength X nm satisfying Tb-Ta>0 were obtained. As a result, the maximum absorption wavelength of compound (z12) was 735 nm. Has X nm in 687 nm.

[Synthesis example of compound (z13)] The following compound (z13) was obtained by the method described in JP-A-2019-164269. [chemical 19]

Using the same method as compound (z1), the maximum absorption wavelength of compound (z13) and the wavelength X nm satisfying Tb-Ta>0 were obtained. As a result, the maximum absorption wavelength of compound (z13) was 827 nm, and at wavelength 751 nm X nm in ~777 nm.

[Example 1] In Example 1, an optical filter was produced using a resin layer containing the compound (A) and the compound (B).

〔Production of optical member (resin layer)〕 100 parts by mass of the resin A obtained in the resin synthesis example, 0.07 parts by mass of the compound (z1) as the compound (A), 0.07 parts by mass of the compound (z2) as the compound (B) and two Methyl chloride was used to prepare a solution with a resin concentration of 20% by mass. The obtained solution was cast on a smooth glass plate, dried at 20° C. for 8 hours, and then peeled off from the glass plate. Furthermore, the peeled coating film was dried at 100 degreeC under reduced pressure for 8 hours, and the resin layer (1) with thickness 0.1 mm, length 210 mm, and width 210 mm was obtained.

For the obtained resin layer (1), the spectral transmittance of light incident from a direction perpendicular to the surface direction of the resin layer (1) was measured using a spectrophotometer (V-7200) manufactured by JASCO Corporation. To measure. Specifically, the following spectral transmittances were measured. The results are shown in Table 7. Ts_ave: Average value of transmittance of light with a wavelength of 450 nm to 570 nm Ts_min: the minimum value of the transmittance of light with a wavelength of λA nm to λB nm Ts_max: the maximum value of the transmittance of light with a wavelength of λA nm to λB nm ・Tx: Let Ta be the transmittance when light of an arbitrary wavelength X nm among wavelengths 600 nm to (λA-1) nm is incident from a direction perpendicular to the surface direction of the resin layer, and let the wavelength (X+1) nm be The maximum value of Tb-Ta when the transmittance when the light is incident from the direction perpendicular to the surface direction of the resin layer is Tb Wmin: the shortest wavelength at which the transmittance is 50% in light with a wavelength of 600 nm to 900 nm ・R transmittance: the average value of the transmittance of light with a wavelength of 580 nm to 650 nm ・Wmax-Wmin: The difference when Wmin is the shortest wavelength at which the transmittance is 50% and Wmax is the longest wavelength at which the transmittance is 50% for light with a wavelength of 600 nm to 900 nm

〔Production of optical filter〕 The resin layer (1) obtained by the preparation of the resin layer is used as an optical member, a dielectric multilayer film (I) is formed on one side thereof, and a dielectric multilayer film (II) is further formed on the other side of the resin layer (1) , to obtain an optical filter with a thickness of about 0.110 mm.

The dielectric multilayer film (I) is a laminate (a total of 26 layers) in which silicon dioxide (SiO ₂ ) layers and titanium dioxide (TiO ₂ ) layers are alternately laminated at a deposition temperature of 100°C. The dielectric multilayer film (II) is a laminate (22 layers in total) in which silicon dioxide (SiO ₂ ) layers and titanium dioxide (TiO ₂ ) layers are alternately laminated at a deposition temperature of 100°C. In any one of the dielectric multilayer film (I) and the dielectric multilayer film (II), the silicon dioxide layer and the titanium dioxide layer are formed from the resin layer (1) side into a titanium dioxide layer, a silicon dioxide layer, a titanium dioxide layer, ... The silicon dioxide layer, the titanium dioxide layer, and the silicon dioxide layer are stacked alternately in sequence, and the outermost layer of the optical filter is set as the silicon dioxide layer.

Regarding the thickness and number of layers of each layer, combined with the wavelength dependence of the refractive index of the resin layer (1) or the absorption characteristics of the compound (A) and compound (B) used, the optical film design software (Core MacLeod (Essential Macleod) and Thin Film Center (Thin Film Center) are optimized to achieve good transmittance in the visible region and reflection performance in the near-infrared region. When performing optimization, in this embodiment, the input parameters (target (Target) values) for the software are set as shown in Table 3 below.

[table 3] Dielectric Multilayer Film wavelength (nm) Input parameters for software angle of incidence required angle target tolerance type (I) 420 20 100 1 Transmittance 430～450 20 100 0.8 Transmittance 451～561 20 100 1 Transmittance 562～650 15 100 1 Transmittance 651～700 0 100 1 Transmittance 800～949 0 0 1 Transmittance (II) 350～410 0 0 1 Transmittance 420 0 50 1 Transmittance 430～700 0 100 1 Transmittance

As a result of optimizing the film structure, the dielectric multilayer film (I) is formed by alternately stacking silicon dioxide layers with a physical film thickness of approximately 37 nm to 168 nm and titanium dioxide layers with a physical film thickness of approximately 11 nm to 104 nm. A multilayer vapor-deposited film with a stacked number of 26 layers is formed, and the dielectric multilayer film (II) is set so that silicon dioxide layers with a physical film thickness of approximately 40 nm to 191 nm and titanium dioxide layers with a physical film thickness of approximately 10 nm to 110 nm are alternated. A multilayer vapor-deposited film with a stacked number of 22 layers. An example of the optimized film structure is shown in Table 4 below.

[Table 4] Dielectric Multilayer Film layer layer material Physical film thickness (nm) Optical film thickness (nd) (I) 1 SiO ₂ 83.6 0.236 2 TiO ₂ 93.0 0.450 3 SiO ₂ 161.3 0.455 4 TiO ₂ 92.8 0.449 5 SiO ₂ 157.0 0.442 6 TiO ₂ 86.1 0.416 7 SiO ₂ 155.0 0.437 8 TiO ₂ 85.1 0.412 9 SiO ₂ 154.2 0.435 10 TiO ₂ 84.4 0.408 11 SiO ₂ 153.6 0.433 12 TiO ₂ 84.0 0.406 13 SiO ₂ 153.1 0.431 14 TiO ₂ 83.6 0.405 15 SiO ₂ 152.7 0.430 16 TiO ₂ 83.6 0.405 17 SiO ₂ 152.7 0.430 18 TiO ₂ 83.8 0.406 19 SiO ₂ 153.3 0.432 20 TiO ₂ 85.0 0.411 twenty one SiO ₂ 158.1 0.446 twenty two TiO ₂ 88.3 0.427 twenty three SiO ₂ 168.3 0.474 twenty four TiO ₂ 103.9 0.503 25 SiO ₂ 37.0 0.104 26 TiO ₂ 10.6 0.051 resin layer (II) 27 TiO ₂ 10.1 0.046 28 SiO ₂ 39.7 0.107 29 TiO ₂ 109.9 0.503 30 SiO ₂ 185.4 0.498 31 TiO ₂ 108.6 0.497 32 SiO ₂ 190.4 0.512 33 TiO ₂ 110.2 0.504 34 SiO ₂ 190.8 0.513 35 TiO ₂ 110.1 0.503 36 SiO ₂ 190.5 0.512 37 TiO ₂ 109.5 0.501 38 SiO ₂ 190.8 0.513 39 TiO ₂ 109.3 0.500 40 SiO ₂ 188.8 0.507 41 TiO ₂ 108.5 0.496 42 SiO ₂ 183.7 0.493 43 TiO ₂ 103.0 0.471 44 SiO ₂ 174.3 0.468 45 TiO ₂ 95.6 0.437 46 SiO ₂ 171.3 0.460 47 TiO ₂ 94.9 0.434 48 SiO ₂ 83.6 0.224 *λ=550nm

For the obtained optical filter, except for the case where the following T20 (30°) was measured, a spectrophotometer (V-7200) manufactured by JASCO Co., Ltd. was used to measure the temperature perpendicular to the surface direction of the optical filter. The spectral transmittance of light incident in the direction of the light is measured. Specifically, the following spectral transmittances were measured. The results are shown in Table 7. ・Tf_ave: Average value of transmittance of light with a wavelength of 450 nm to 570 nm · Tf_min: the minimum value of the transmittance of light with a wavelength of λA nm to λB nm ・ΔT20 (0°-30°): The shortest wavelength at which the transmittance of light incident from a direction perpendicular to the surface direction of the optical filter is 20% among light with a wavelength of 600 nm to 900 nm (T20 (0° )) and the shortest wavelength (T20 (30°)) at which the transmittance of light incident from an angle of 30° away from the surface of the optical filter is 20% ・750 nm～850 nmTave: The average value of the transmittance of light with a wavelength of 750 nm～850 nm Wf_min: the shortest wavelength at which the transmittance is 50% at a wavelength of 600 nm to 900 nm ・R transmittance: the average value of the transmittance of light with a wavelength of 580 nm to 650 nm

＜RGB balance evaluation of photographic images＞ The RGB balance evaluation when the optical filter was incorporated into the camera module was performed by the following method. The results are shown in Table 7. Use the same method as Japanese Patent Laid-Open No. 2016-110067 to fabricate a camera module, and use the produced camera module in the D65 light source (standard light source device "Mikebeth Jiaqi" manufactured by X-Rite Co., Ltd. Macbeth Judge) II") to photograph a 300 mm × 400 mm white plate. In addition, as shown in FIG. 5 , the positional relationship between the white board 112 and the camera module is adjusted so that the white board 112 occupies 90% or more of the area of the photographed image 111 during shooting. The color tone of the central portion 113 (shown in FIG. 5 ) of the white plate in the photographed image was evaluated visually according to the following criteria.

The level that is allowable without blue in the photographed image is judged as A, and the level that is conspicuous in blue in the photographed image and cannot be tolerated for camera module use is judged as C. Specifically, the result of the RGB balance evaluation in Example 1 was judged as "A", and the case where the photographed image was bluish compared with Example 1 was judged as "C". It is considered that when the red transmittance of the optical filter is low, the RGB balance of the photographed image is broken, and as a result, the photographed image is bluish.

＜Evaluation of color shading of photographic images＞ Evaluation of color shading when the optical filter is incorporated in the camera module was performed by the following method. The results are shown in Table 7. Use the same method as Japanese Patent Laid-Open No. 2016-110067 to fabricate a camera module, and use the produced camera module in the D65 light source (standard light source device "Mikebeth Jiaqi" manufactured by X-Rite Co., Ltd. Macbeth Judge) II") to photograph a 300 mm × 400 mm white plate. In addition, as shown in FIG. 5 , the positional relationship between the white board 112 and the camera module is adjusted so that the white board 112 occupies 90% or more of the area of the photographed image 111 during shooting. The difference in color tone between the central portion 113 (shown in FIG. 5 ) and the end portion 114 (shown in FIG. 5 ) of the white plate in the captured image was evaluated visually according to the following criteria.

A level where there is no difference in color tone is judged as A, a level where some color difference is confirmed but is acceptable as a camera module without any practical problems is judged as B, and a level where there is a clear difference in color tone and it is used as a camera module is judged The unacceptable level is judged as C. Specifically, the color shading evaluation result of Example 5 was judged as "B", compared with that of Example 5, the case where the color tone difference was small at both the ends and the center of the photographed image was judged as "A", and The case where the color tone difference was equivalent to Example 5 was judged as "B", and the case where the color tone difference was larger than that of Example 5 was judged as "C". It is considered that since the Ty is large, the light in the infrared region cannot be clearly blocked, resulting in deterioration of the color shading.

＜Evaluation of ghost images in photographed images＞ The evaluation of ghosting when the optical filter was incorporated into the camera module was performed by the following method. A camera module is produced by the same method as in Japanese Patent Application Laid-Open No. 2016-110067, and a halogen light source ("Luminar Ace" manufactured by Hayashi Shoji Co., Ltd.) is used in a dark room using the produced camera module LA-150TX") for photography. In addition, as shown in FIG. 6 , adjustment is made so that the light source 122 is located at the upper right end of the photographed image 121 during photographing. The occurrence of ghosting in the surrounding area 123 (shown in FIG. 6 ) of the light source 122 in the photographed image 121 was evaluated visually according to the following criteria.

The level that can be tolerated without ghosting is judged as A, the level where some ghosting is confirmed but there is no problem practically as a camera module is judged as B, and the degree of ghosting is serious (ghosting caused by ghosting). The color change of the light source peripheral portion 123 is large) and the level that cannot be tolerated for the camera module application is judged as C. Specifically, the evaluation result of ghosting in Example 14 was judged as "B", and compared with Embodiment 14, it was judged as "A" that the color change of the light source peripheral portion 123 due to ghosting was small, and the occurrence of The case where ghosting equivalent to that of Example 14 was determined as "B", and the case where the color change of light source peripheral portion 123 due to ghosting was greater than that of Example 14 was determined as "C". It is considered that when the maximum value (Ts_max) of the transmittance of light with wavelengths λA˜λB nm is large, the near-infrared light incident on the sensor increases, and therefore the color change of the light source peripheral portion 123 due to ghosting increases.

[Example 2-Example 6, Example 12-Example 14 and Comparative Example 1-Comparative Example 3] In Example 1, a resin layer (optical member) was produced in the same manner as in Example 1 except that the compounds described in Table 7 were used instead of Compound (z1) and Compound (z2), and an optical filter was also produced. And the spectral characteristics of these were evaluated. The spectral transmittance curve of the resin layer obtained in Example 4 is shown in FIG. 1 , and the spectral transmittance curve of the optical filter obtained in Example 4 is shown in FIG. 3 . In addition, the spectral transmittance curves of the resin layers obtained in Comparative Examples 1 to 3 are shown in FIG. 2 , and the spectral transmittance curves of the optical filters obtained in Comparative Examples 1 to 3 are shown in FIG. 4 . . Furthermore, the values of Tb-Ta at the wavelength of 600 nm to (λA-1) nm and the transmittance of 5% to 70% of the resin layer obtained in Example 4 are shown in Table 5 below. From the above Table 5, it can be seen that the Ty of the resin layer obtained in Example 4 was -0.143. In addition, Ty was obtained similarly in other Examples and Comparative Examples.

[table 5] wavelength (nm) Transmittance of resin layer (%) Tb-Ta wavelength (nm) Transmittance of resin layer (%) Tb-Ta 763 5.30 -0.447 708 25.31 -0.962 762 5.75 -0.445 707 26.27 -1.027 761 6.20 -0.439 706 27.30 -1.039 760 6.63 -0.427 705 28.34 -1.080 759 7.06 -0.428 704 29.42 -1.107 758 7.49 -0.434 703 30.52 -1.135 757 7.92 -0.413 702 31.66 -1.150 756 8.34 -0.397 701 32.81 -1.177 755 8.73 -0.397 700 33.98 -1.166 754 9.13 -0.355 699 35.15 -1.202 753 9.49 -0.315 698 36.35 -1.201 752 9.80 -0.271 697 37.55 -1.231 751 10.07 -0.272 696 38.78 -1.228 750 10.34 -0.271 695 40.01 -1.216 749 10.61 -0.249 694 41.23 -1.156 748 10.86 -0.246 693 42.38 -1.176 747 11.11 -0.229 692 43.56 -1.122 746 11.34 -0.217 691 44.68 -1.073 745 11.56 -0.203 690 45.75 -1.061 744 11.76 -0.209 689 46.82 -1.019 743 11.97 -0.168 688 47.83 -0.988 742 12.14 -0.161 687 48.82 -0.977 741 12.30 -0.158 686 49.80 -0.946 740 12.46 -0.157 685 50.75 -0.939 739 12.61 -0.158 684 51.69 -0.873 738 12.77 -0.143 683 52.56 -0.884 737 12.91 -0.154 682 53.44 -0.809 736 13.07 -0.144 681 54.25 -0.776 735 13.21 -0.159 680 55.03 -0.716 734 13.37 -0.152 679 55.74 -0.660 733 13.52 -0.160 678 56.40 -0.662 732 13.68 -0.155 677 57.06 -0.659 731 13.84 -0.177 676 57.72 -0.693 730 14.02 -0.193 675 58.42 -0.635 729 14.21 -0.219 674 59.05 -0.626 728 14.43 -0.251 673 59.68 -0.584 727 14.68 -0.251 672 60.26 -0.580 726 14.93 -0.275 671 60.84 -0.552 725 15.20 -0.308 670 61.39 -0.557 724 15.51 -0.326 669 61.95 -0.555 723 15.84 -0.365 668 62.51 -0.476 722 16.20 -0.387 667 62.98 -0.531 721 16.59 -0.434 666 63.51 -0.558 720 17.02 -0.451 665 64.07 -0.501 719 17.47 -0.507 664 64.57 -0.504 718 17.98 -0.524 663 65.08 -0.502 717 18.51 -0.585 662 65.58 -0.530 716 19.09 -0.618 661 66.11 -0.465 715 19.71 -0.659 660 66.58 -0.513 714 20.37 -0.712 659 67.09 -0.505 713 21.08 -0.739 658 67.59 -0.505 712 21.82 -0.802 657 68.10 -0.507 711 22.62 -0.847 656 68.61 -0.594 710 23.47 -0.899 655 69.20 -0.605 709 24.37 -0.942 654 69.80 -0.578

[Example 7] 100 parts by mass of the resin A obtained in the resin synthesis example, 0.07 parts by mass of the compound (z1) as the compound (A), 0.07 parts by mass of the compound (z2) as the compound (B), and UV Absorbent (compound (x1) below) 0.17 parts by mass and methylene chloride were used to prepare a solution having a resin concentration of 20% by mass. The obtained solution was cast on a smooth glass plate, dried at 20° C. for 8 hours, and then peeled off from the glass plate. Furthermore, the peeled coating film was dried at 100 degreeC under reduced pressure for 8 hours, and the resin layer (7) with thickness 0.1 mm, length 210 mm, and width 210 mm was obtained. Except for using the above-mentioned resin layer ( 7 ) as an optical member, an optical filter was produced in the same manner as in Example 1, and the spectral characteristics of the resin layer ( 7 ) and the obtained optical filter were evaluated.

・Compound (x1): The maximum absorption wavelength in dichloromethane is 394 nm [Chem. 20]

[Example 8] In Example 8, an optical member was produced using a transparent glass support having a resin layer containing the compound (A) and the compound (B) on one side, and an optical filter was produced separately.

On a transparent glass support body "OA-10G" (manufactured by NEC Glass Co., Ltd., thickness: 200 μm) cut into a size of 60 mm in length and 60 mm in width, a resin layer with the following composition was applied using a spin coater to form Using the composition (1), the solvent was evaporated and removed by heating on a hot plate at 80°C for 2 minutes. At this time, the coating conditions of the spin coater were adjusted so that the thickness after drying became 4 μm. Next, the coated composition was exposed using a conveyor belt exposure machine (exposure amount: 500 mJ/cm ² , illuminance: 200 mW/cm ² ), and the composition (1) was cured, thereby producing a resin layer (8 ), the resin layer (8) includes the compound (A) and the compound (B).

Resin layer forming composition (1): 20 parts by mass of tricyclodecane dimethanol acrylate, 80 parts by mass of dipentaerythritol hexaacrylate, 4 parts by mass of 1-hydroxycyclohexyl phenyl ketone, 1.75 parts by mass of compound (z1) , compound (z2) 1.75 parts by mass, methyl ethyl ketone (solvent, TSC: 35%)

In addition to using the prepared resin layer (8) instead of the optical member of the resin layer (1), an optical filter was produced in the same manner as in Example 1, and the resin layer was treated in the same manner as in Example 1. (8) and the spectral characteristics of the obtained optical filter were evaluated. In addition, when evaluating the spectral characteristics of the resin layer ( 8 ), the resin layer ( 8 ) peeled from the transparent glass support was used.

[Example 9] In Example 8, an optical member having a resin layer (9) was produced in the same manner as in Example 8, except that the following resin layer-forming composition (2) was used instead of the resin layer-forming composition (1). , and an optical filter was produced using the optical member having the resin layer (9), and the spectral characteristics of the resin layer (9) and the optical filter were evaluated. In addition, when evaluating the spectral characteristics of the resin layer ( 9 ), the resin layer ( 9 ) peeled from the transparent glass support was used.

Resin composition (2): 20 parts by mass of tricyclodecane dimethanol acrylate, 80 parts by mass of dipentaerythritol hexaacrylate, 4 parts by mass of 1-hydroxycyclohexyl phenyl ketone, 2.0 parts by mass of compound (z1), 2.0 parts by mass of compound ( z3) 2.0 parts by mass, methyl ethyl ketone (solvent, TSC: 35%)

[Example 10] In Example 10, an optical member was produced using a near-infrared-absorbing glass support having a resin layer containing the compound (A) and the compound (B) on one side, and an optical filter was produced separately.

Instead of the transparent glass support (OA-10G), use a near-infrared-absorbing glass support "BS-6" (manufactured by Songnami Glass Co., Ltd., thickness 210 μm) cut to a size of 60 mm in length and 60 mm in width, except Otherwise, an optical member having a resin layer (10) was produced in the same manner as in Example 8, and an optical filter was produced using the optical member having the resin layer (10), and the spectral characteristics of these were evaluated. . In addition, when evaluating the spectral characteristics of the resin layer ( 10 ), the resin layer ( 10 ) peeled from the near-infrared ray absorbing glass support was used.

[Example 11] In Example 10, except that the resin layer-forming composition (2) was used instead of the resin layer-forming composition (1), a resin layer having a resin layer (11) was produced in the same manner as in Example 10. As for the optical member, an optical filter was manufactured using the optical member having the resin layer (11), and the spectral characteristics of these were evaluated. In addition, when evaluating the spectral characteristics of the resin layer ( 11 ), the resin layer ( 11 ) peeled from the near-infrared ray absorbing glass support was used.

[Comparative Example 4 to Comparative Example 5] A dielectric multilayer film (III) is formed on one side of each of the resin layers obtained in Comparative Examples 2 to 3, and a dielectric multilayer film (IV) is further formed on the other side of the resin layer to obtain a thickness of about 0.110 mm optical filter. In the same manner as in Example 1, the spectral characteristics of the obtained resin layer and optical filter were evaluated.

The dielectric multilayer film (III) is a laminate (26 layers in total) in which silicon dioxide (SiO ₂ ) layers and titanium dioxide (TiO ₂ ) layers are alternately laminated at a deposition temperature of 100°C. The dielectric multilayer film (IV) is a laminate (a total of 20 layers) in which silicon dioxide (SiO ₂ ) layers and titanium dioxide (TiO ₂ ) layers are alternately laminated at a deposition temperature of 100°C. In any one of the dielectric multilayer film (III) and the dielectric multilayer film (IV), the silicon dioxide layer and the titanium dioxide layer are formed from the resin layer side into a titanium dioxide layer, a silicon dioxide layer, a titanium dioxide layer, ... silicon dioxide Layers, titanium dioxide layers, and silicon dioxide layers are stacked alternately in a sequential manner, and the outermost layer of the optical filter is set as the silicon dioxide layer.

As a result of optimizing the film structure, the dielectric multilayer film (III) is formed by alternately stacking silicon dioxide layers with a physical film thickness of approximately 28 nm to 139 nm and titanium dioxide layers with a physical film thickness of approximately 9 nm to 83 nm. A multilayer vapor-deposited film with a stacked number of 26 layers, the dielectric multilayer film (IV) is set so that silicon dioxide layers with a physical film thickness of about 35 nm to 177 nm and titanium dioxide layers with a physical film thickness of about 10 nm to 103 nm are alternated. A multilayer vapor-deposited film with a stacked number of 20 layers. An example of the optimized film structure is shown in Table 6 below.

[Table 6] Dielectric Multilayer Film layer layer material Physical film thickness (nm) Optical film thickness (nd) (III) 1 SiO ₂ 69.3 0.182 2 TiO ₂ 76.9 0.346 3 SiO ₂ 136.9 0.360 4 TiO ₂ 74.9 0.337 5 SiO ₂ 132.8 0.349 6 TiO ₂ 72.7 0.327 7 SiO ₂ 131.0 0.344 8 TiO ₂ 72.5 0.326 9 SiO ₂ 130.7 0.343 10 TiO ₂ 72.3 0.326 11 SiO ₂ 130.6 0.343 12 TiO ₂ 72.2 0.325 13 SiO ₂ 130.8 0.344 14 TiO ₂ 72.5 0.327 15 SiO ₂ 130.5 0.343 16 TiO ₂ 72.1 0.325 17 SiO ₂ 131.1 0.344 18 TiO ₂ 72.7 0.328 19 SiO ₂ 130.5 0.343 20 TiO ₂ 72.6 0.327 twenty one SiO ₂ 133.9 0.352 twenty two TiO ₂ 76.2 0.343 twenty three SiO ₂ 139.4 0.366 twenty four TiO ₂ 83.2 0.374 25 SiO ₂ 27.7 0.073 26 TiO ₂ 9.0 0.041 resin layer (IV) 27 TiO ₂ 10.0 0.045 28 SiO ₂ 35.1 0.092 29 TiO ₂ 103.3 0.465 30 SiO ₂ 172.3 0.453 31 TiO ₂ 100.5 0.453 32 SiO ₂ 175.8 0.462 33 TiO ₂ 102.6 0.462 34 SiO ₂ 176.6 0.464 35 TiO ₂ 101.0 0.455 36 SiO ₂ 175.4 0.461 37 TiO ₂ 101.2 0.456 38 SiO ₂ 174.8 0.459 39 TiO ₂ 100.0 0.451 40 SiO ₂ 174.7 0.459 41 TiO ₂ 100.4 0.452 42 SiO ₂ 173.5 0.456 43 TiO ₂ 98.8 0.445 44 SiO ₂ 169.5 0.445 45 TiO ₂ 95.8 0.431 46 SiO ₂ 83.4 0.219 *λ=550nm

[Table 7]

Comparative Example 1 does not contain the compound (B), so it does not satisfy the requirements (d) and the requirements (F5), and since the obtained optical filter has a large dependence on the incident angle, it is not possible to obtain an optical filter with excellent visual sensitivity correction performance. filter. Comparative Example 2 does not satisfy the requirement (c), requirement (R4), requirement (R5), requirement (F3), requirement (F4), requirement (F6), and the optical member (resin layer) and optical The filter has a low transmittance in the red region in visible light, and therefore an optical filter that can obtain an image with excellent RGB balance cannot be obtained. Even in Comparative Example 4 in which a dielectric multilayer film with different characteristics was formed using the same resin layer as Comparative Example 2, the transmittance of the optical filter in the red region of visible light was low and the requirement (F5) was not satisfied. It is therefore also impossible to obtain an optical filter that can obtain a good image. Comparative Example 3 does not satisfy the requirements (c), requirements (d), requirements (R4), requirements (R5), requirements (F3), requirements (F4), requirements (F6), and the optical member (Resin layer) and the optical filter have low transmittance in the red region of visible light, so an optical filter that can obtain an image with excellent RGB balance cannot be obtained. Even in Comparative Example 5 in which a dielectric multilayer film with different characteristics was formed using the same resin layer as Comparative Example 3, the transmittance of the optical filter in the red region of visible light was low and the requirement (F5) was not satisfied. It is therefore also impossible to obtain an optical filter that can obtain a good image.

111: Photographic images 112: white board 113: the central part of the white board 114: end 121: Photographic image 122: light source 123: Peripheral part of light source

FIG. 1 is a graph of the spectral transmittance of the resin layer obtained in Example 4. FIG. FIG. 2 is a graph of spectral transmittance of resin layers obtained in Comparative Examples 1 to 3. FIG. FIG. 3 is a graph of the spectral transmittance of the optical filter obtained in Example 4. FIG. FIG. 4 is a graph of spectral transmittance of optical filters obtained in Comparative Examples 1 to 3. FIG. FIG. 5 is an explanatory diagram of a photographed image in RGB balance evaluation and color shading evaluation in the embodiment. FIG. 6 is an explanatory diagram of a captured image (an example) in ghost evaluation in the embodiment.

Claims (12)

An optical member having a resin layer containing a compound (A) and a compound (B), The resin layer satisfies the following requirements (a) to (d) when the maximum absorption wavelength of the compound (A) is λA and the maximum absorption wavelength of the compound (B) is λB, (a) λA<λB (b) 680nm≦λA≦870nm (c) 760nm≦λB≦900nm (d) Let Ta be the transmittance when light of an arbitrary wavelength X nm among wavelengths 600 nm to (λA-1) nm is incident from a direction perpendicular to the surface direction of the resin layer, and let the wavelength (X+1) Tx<0 is satisfied when the transmittance when light of nm is incident from a direction perpendicular to the surface direction of the resin layer is Tb, and the maximum value of Tb-Ta is Tx. The optical member according to claim 1, wherein the compound (A) satisfies the following requirement (i), (i) Among the wavelengths of 600 nm to (λA-1) nm, let the transmittance of compound (A) of light of arbitrary wavelength X nm be TaA, and the transmittance of compound (A) of light of wavelength (X+1) nm When the transmittance of TbA is TbA, there is a wavelength X nm satisfying TbA-TaA>0 in part of the wavelength 600 nm to (λA-1) nm. The optical member according to claim 1, wherein a minimum transmittance of light of wavelengths λA nm to λB nm incident from a direction perpendicular to the surface direction of the resin layer is 3% or less. The optical member according to claim 1, wherein Wmin is defined as the shortest wavelength at which the transmittance is 50% among the light having a wavelength of 600 nm to 900 nm incident from a direction perpendicular to the surface direction of the resin layer When , the Wmin is in the range of 650 nm to 750 nm. The optical member according to claim 1, wherein, among light with a wavelength of 600 nm to 900 nm incident from a direction perpendicular to the surface direction of the resin layer, the ratio of the shortest wavelength Wmin at which the transmittance is 50% to the transmittance 50% of the longest wavelength Wmax satisfies the relationship of Wmax-Wmin≧130 nm. The optical member according to claim 1, wherein the compound (A) and the compound (B) are selected from phthalocyanine-based compounds, naphthalocyanine-based compounds, squarylium-based compounds, crotonium-based compounds, cyanine-based compounds, polymethine-based compounds (wherein the polymethine-based compounds are compounds other than squarylium-based compounds, crotonium-based compounds, and cyanine-based compounds), diimonium Compounds in the group consisting of compounds based on dithiol metal complexes and compounds based on pyrrolopyrrole. The optical member according to claim 1, wherein an average value of transmittance of light having a wavelength of 450 nm to 570 nm incident from a direction perpendicular to the surface direction of the resin layer is 80% or more. The optical member according to claim 1, wherein the resin layer contains a resin selected from cyclic (poly)olefin resins, aromatic polyether resins, polyimide resins, polyester resins, polycarbonate resins, Resin, polyamide-based resin, polyarylate-based resin, polyethylene-based resin, polyether-based resin, polyparaphenylene-based resin, polyamide-imide-based resin, polyethylene naphthalate-based resin , fluorinated aromatic polymer resins, (modified) acrylic resins, epoxy resins, allyl ester curable resins, silsesquioxane UV curable resins, acrylic UV curable resins and vinyl At least one resin in the group consisting of base-based ultraviolet curable resins. An optical filter comprising the optical component according to any one of claim 1 to claim 8 and a dielectric multilayer film. The optical filter according to Claim 9 is a near-infrared cut filter, a dual-band band-pass filter, or a single-band band-pass filter. A solid-state imaging device, comprising the optical component according to any one of Claim 1 to Claim 8. An optical sensor device, comprising the optical component according to any one of Claim 1 to Claim 8.

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