TW202302214A - Gas-liquid mixing apparatus and method wherein the gas-liquid mixing apparatus includes a pressure tank and a gas input pipe - Google Patents

Abstract

A gas-liquid mixing apparatus includes a pressure tank and a gas input pipe. A limiting flow plate is disposed in a tank body of the pressure tank, and the interior of the pressure tank is partitioned into a gas-liquid mixing chamber and a liquid storage chamber by the limiting flow plate. The gas input pipe penetrates into the gas-liquid mixing chamber from the outside and has a plurality of air holes. The limiting flow plate has a limiting flow channel, and a total sectional area of the limiting flow channel is limited to be less than a quarter of a sectional area of an input port for inputting a liquid into the pressure tank. The liquid outflow of the gas-liquid mixing chamber is limited by the sectional area of the limiting flow channel so that the liquid input into the tank body can be rapidly replenished into the gas-liquid mixing chamber and the pressure change of the gas-liquid mixing chamber can be reduced, thereby providing a gas solution with a stable concentration.

Description

Gas-liquid mixing device and method

The invention relates to a means for gas-liquid mixing, in particular to a gas-liquid mixing device and method capable of supplying gas solution with a stable concentration.

The current system that mixes gas with liquid, such as the traditional pressure tank system, has a structure that includes compressors, static mixers, ejectors, high-pressure dissolution tanks, saturation tanks, etc., and control and feedback between pipelines during use Most of them need to be electronically controlled. However, electronically controlled systems are limited by the need for power supply. Therefore, it is necessary to develop a non-electronically controlled device for stably supplying a specific concentration of gas solution.

In view of this, the object of the present invention is to provide a gas-liquid mixing device, which stabilizes the pressure in the gas-liquid mixing space through flow limitation, and achieves the effect of providing a gas solution with a stable concentration.

To achieve the above object, the present invention provides a gas-liquid mixing device, comprising:

A pressure tank, including a pressure tank body and a flow limiting plate, wherein the pressure tank body has a gas inlet pipe perforation, the flow limiting plate is arranged inside the pressure tank body and divides the space inside the pressure tank body into a gas A liquid mixing chamber and a liquid storage chamber, the flow limiting plate has a flow limiting channel, the flow limiting channel communicates with the gas-liquid mixing chamber and the liquid storage chamber, and the total cross-sectional area of the flow limiting channel is smaller than the cross-sectional area of the liquid input port a quarter of the area, the part of the pressure tank body corresponding to the gas-liquid mixing chamber has a liquid input port, and the part of the pressure tank body corresponding to the liquid storage chamber has a liquid output port; and

A gas input pipe is perforated through the gas input pipe so that part of the pipe section is located outside the pressure tank, and part of the pipe section is located inside the pressure tank body, wherein the inner end of the pipe section of the gas input pipe located inside the pressure tank body has a The inner end is located in the gas-liquid mixing chamber and has a plurality of air holes.

To achieve the above object, the invention provides a gas-liquid mixing method, the steps of which include:

Restricting the total cross-sectional area of the flow-restricting passage leading from a gas-liquid mixing chamber to a liquid storage chamber to be less than a quarter of the cross-sectional area of the liquid inlet leading to the gas-liquid mixing chamber; and

The liquid is continuously input from the liquid input port, and the bubbles of the gas to be dissolved in the liquid are continuously injected into the gas-liquid mixing chamber, so that the bubbles dissolve into the liquid in the gas-liquid mixing chamber to become a gas solution, and the ratio of the cross-sectional area through the aforementioned The flow-limiting channel produces a flow-limiting effect, so that the liquid flowing into the gas-liquid mixing chamber can be quickly replenished to fill up the pressure, reducing the pressure change of the liquid in the gas-liquid mixing chamber, and stabilizing the concentration of the gas solution. The liquid storage chamber outputs the gas solution to the outside.

When the present invention is used or implemented, after the liquid enters the pressure tank from the liquid input port, the gas input from the gas input pipe passes through a plurality of pores and turns into bubbles, which are mixed with the liquid and dissolved in the gas-liquid mixing chamber to become a gas solution. , and then the gas solution flows into the liquid storage chamber, and then is output from the liquid output port for machine cleaning or other purposes.

The effect of the present invention is that, since the total cross-sectional area of the flow-restricting passage is less than a quarter of the cross-sectional area of the liquid inlet, after the gas solution flows out of the supply machine from the liquid outlet, the liquid can quickly flow into the The gas-liquid mixing chamber replenishes the pressure to reduce the pressure change of the liquid in the gas-liquid mixing chamber. The process does not require electronic control means. By limiting the ratio of the liquid inflow and outflow apertures, the gas-liquid mixing chamber can generate The concentration of the gas solution is stable, and then the gas solution with a stable concentration is output.

In order to illustrate the present invention more clearly, preferred embodiments are given and detailed descriptions are given below in conjunction with drawings. Please refer to Fig. 1 and shown in Fig. 2, it is a gas-liquid mixing device 100 of a preferred embodiment of the present invention, which mainly includes a pressure tank 10 and a gas input pipe 20, wherein:

The pressure tank 10 includes a pressure tank body 12 and a restrictor plate 14, the restrictor plate 14 is combined with the inside of the pressure tank body 12, as in this preferred embodiment, the flow restrictor plate 14 is the pressure tank 10 The upper and lower sides of the internal space are divided into a gas-liquid mixing chamber 121 and a liquid storage chamber 122. The pressure tank 12 has a liquid input port 123 corresponding to the top of the gas-liquid mixing chamber 121. The pressure tank 12 corresponds to the liquid storage. Both sides of the bottom of the chamber 122 have a liquid output port 124 and a gas input pipe perforation 125; the present invention can also use this pressure tank 10 as a straight state in other preferred embodiments except the aforementioned state. The restrictor plate 14 separates the gas-liquid mixing chamber 121 and the liquid storage chamber 122 in the pressure tank body 12 into a side-by-side state.

The restrictor plate 14 has a restrictor channel 141 through which the gas-liquid mixing chamber 121 and the liquid storage chamber 122 are communicated. In this preferred embodiment, the restrictor channel 141 is a single-hole type. Round hole, in other preferred embodiments, the restrictor plate 14 can also be designed as a double-hole or multi-hole pattern, and there is a central perforation 142 in the middle of the restrictor plate 14; in this preferred embodiment, the restrictor flow The total cross-sectional area of the channel 141 is designed to be less than a quarter of the cross-sectional area of the liquid inlet, so that the flow-limiting function of the flow-limiting channel 141 to limit the flow of liquid to the liquid storage chamber 122 can be used to make the gas flow into the liquid storage chamber 122. The liquid in the liquid mixing chamber 121 can be replenished quickly to make up the pressure, so as to reduce the pressure change of the liquid in the gas-liquid mixing chamber 121 .

The gas inlet pipe 20 is a pipe body, and the inner end is sealed from the outside through the gas inlet pipe perforation 125 and extends into the liquid storage chamber 122 of the pressure tank body 12, so that part of the pipe section is located in the pressure tank body 12, and part of it is The pipe section is located inside the pressure tank body 12 . The inner end of the gas inlet pipe 20 penetrating into the liquid storage chamber 122 is a closed end, and after penetrating, it turns upwards and penetrates into the gas-liquid mixing chamber 121 through the middle perforation 142 sealingly, and the gas inlet pipe 20 extends into the gas-liquid mixing chamber 121. The part in the gas-liquid mixing chamber 121 is an inner end 22, and there are a plurality of air holes 24 around the inner end 22; Directly penetrating into the gas-liquid mixing chamber 121 can also achieve the effect of using multiple air holes 24 to input air bubbles and liquid into the gas-liquid mixing chamber 121. At this time, the restrictor plate 14 does not need to allow the gas input pipe 20 to pass through , so the aforementioned intermediate perforation 142 is not provided.

When the gas-liquid mixing device 100 of the aforementioned preferred embodiment mixes gas and liquid, the liquid and gas are respectively input from the liquid input port 123 of the pressure tank 10 and the gas input pipe 20, for example, in this preferred embodiment, the liquid As the gas, deionized water (DIW) and carbon dioxide gas (CO ₂ gas) were used, respectively. The deionized water imported into the gas-liquid mixing chamber 121 from the liquid input port 123 will fill the gas-liquid mixing chamber 121 and the liquid storage chamber 122, and the carbon dioxide gas imported from the gas inlet pipe 20 will pass through a plurality of air holes 24 into Bubbles are mixed in the gas-liquid mixing chamber 121 and dissolved in deionized water to become a gas solution (CO ₂ -DIW) of carbon dioxide; the gas-liquid mixing device 100 is connected in parallel to more than one The wafer cleaning device C is connected to multiple wafer cleaning devices C in this preferred embodiment, and the front end of each wafer cleaning device C is respectively provided with a machine manual valve C1, which can be controlled by operating each machine manual valve C1. The total amount of gas solution used in each wafer cleaning device C is controlled.

In order to allow the liquid to contact the pore wall of each pore 24, when the capillary pressure (Capillary pressure) that produces capillary phenomenon faces into each pore 24, it can compete with the pressure that the gas wants to pass through each pore 24 to produce a reaction force on the gas, Or when the capillary pressure is drawn toward the outside of each air hole 24 to generate a driving force, the capillary pressure needs to be sufficient to affect the gas pressure. According to the formula of capillarity: h=2γcosθ/ρgr, where γ is the surface tension between liquid and air (unit J/m² or N/m), θ is the contact angle, ρ is the liquid density (unit kg/m3), g Be the gravitational acceleration (unit m/s²), r is the radius (unit m), known capillary pressure is inversely proportional to the diameter of each air hole 24, so the above-mentioned diameters of a plurality of air holes 24 that are located at the inner end 22 are respectively set as equal to or a size less than 500 μm is preferred, for example, in this preferred embodiment, the diameters of the plurality of pores 24 are respectively set to a size of 150 μm or more to 160 μm or less, and the capillary pressure generated when the liquid contacts the pore walls of each pore 24 sufficient to affect the pressure of the gas.

When the aforesaid gas-liquid mixing device 100 is in operation, a gas-liquid mixing method is implemented, and the steps are to pass the gas-liquid mixing chamber 121 to the liquid storage chamber 122 through the restricting channel 141 through the setting of the restrictor plate 14. The total sectional area is limited to less than a quarter of the sectional area of the liquid input port 123 leading to the gas-liquid mixing chamber 121; The pipe 20 continuously injects bubbles of carbon dioxide gas to be dissolved into the liquid into the gas-liquid mixing chamber, so that the bubbles dissolve into the liquid in the gas-liquid mixing chamber to become a gas solution of carbon dioxide, and the ratio of the aforementioned cross-sectional area makes the flow-restricting passage 141 The effect of current limiting is generated, so that the gas solution flows out from the liquid output port 124 to supply each wafer cleaning device C, and the liquid flowing into the gas-liquid mixing chamber 121 can be quickly replenished to fill up the pressure, reducing the gas-liquid mixing. The pressure of the liquid in chamber 121 changes.

In the past, through experimental tests, we know that the key to gas-liquid mixing is not only the contact area and temperature, but the pressure of the liquid is an important factor. It can be known from Henry's law (P=KC, P is pressure, K is a constant, and C is gas concentration). The effect of pressure on gas concentration, the more stable the pressure, the more stable the concentration of gas-liquid mixture. Due to the design of the present invention in the preferred embodiment, the pressure of the liquid in the gas-liquid mixing chamber 121 can be made more stable, so the concentration of the gas solution produced in the gas-liquid mixing chamber 121 can be stabilized, and then stored by the liquid The chamber 122 outputs the gas solution to the outside. In addition, the present invention can increase the proportion of the gas-liquid mixing chamber 121 in the pressure tank 12 by limiting the volume of the liquid storage chamber 122 to less than a quarter of the volume of the gas-liquid mixing chamber 121, so that The liquid stored in the gas-liquid mixing chamber 121 is more than four times that of the liquid in the liquid storage chamber 122. Further, by reducing the liquid in the gas-liquid mixing chamber 121 flowing to the liquid storage chamber 122 as a whole, the ratio of the liquid to the liquid storage chamber 122 is further stabilized. The pressure of the liquid in the gas-liquid mixing chamber 121 and the concentration of the gas solution generated there.

In order to adjust the pressure of the liquid in the gas-liquid mixing chamber 121, in this preferred embodiment, the part of the pressure tank body 12 corresponding to the gas-liquid mixing chamber 121 has a discharge hole 126 around the top to allow the discharge The hole 126 is connected with a valve such as a needle valve, and the pressure of the liquid in the gas-liquid mixing chamber 121 can be changed and adjusted by adjusting the needle valve to discharge liquid from the discharge hole 126 .

The aforementioned gas-liquid mixing device 100 further includes a gas-liquid supply structure 30 and a sensing and control valve group 40 , wherein the gas-liquid supply structure 30 includes a gas supply source 32 and a liquid supply source 34 . The outer end of the gas input pipe 20 is connected to the gas supply source 32, the pressure tank 10 is connected to a liquid input pipe A with the liquid input port 123 and then connected to the liquid supply source 34, and connected to a liquid with the liquid output port 124. The output pipe B is connected to the aforementioned multiple wafer cleaning devices C in parallel through the liquid output pipe B, and a discharge pipe D is connected with the discharge hole 126, and a discharge limiter is arranged in series in the discharge pipe D. A flow valve part D1, the discharge flow limiting valve part D1 can be a needle valve, a flow limiter and the like.

Since the valves of the sensing and control valve group 40 are all mechanical structures, the aforementioned valves do not require electronic control. Cooperating with the positions of the gas-liquid mixing chamber 121 and the liquid storage chamber 122, the valves in the pressure tank body 12 are respectively A gas-liquid mixing chamber pressure gauge 41 and a liquid storage chamber pressure gauge 42 are installed to measure the liquid pressure in the gas-liquid mixing chamber 121 and the liquid storage chamber 122 respectively, so that the user can control the gas-liquid mixing chamber 121 and the liquid pressure data in the liquid storage chamber 122, adjust the flow rate of the gas supply source 32 and the liquid supply source 34 into the pressure tank 10 according to the demand, or adjust the flow rate from the discharge hole 126 and the discharge flow Tube D discharges the flow of liquid outward.

In order to precisely adjust the flow rate of the aforementioned gas and liquid input into the pressure tank 10, or the flow rate of the liquid discharged from the pressure tank 10 through the discharge pipe D, the sensing and control valve group 40 is further connected to the gas input pipe 20, The liquid inlet pipe A, the liquid outlet pipe B, and the discharge pipe D are respectively provided with a liquid flowmeter 43 in series; the liquid inlet pipe A and the gas inlet pipe 20 are respectively provided with a flow regulating valve 44 in series, The liquid inlet pipe A and the liquid outlet pipe B are respectively provided with a manual valve 45 in series, the liquid flowmeter 43 arranged on the gas inlet pipe 20 is located upstream of the flow regulating valve 44, and the gas inlet pipe 20 is located at the The position downstream of the flow regulating valve 44 is provided with a restrictor valve part 46 in series. A barometer 47 is arranged in series between the valves 47, and a non-return valve 48 is arranged in series in the part of the gas inlet pipe 20 located downstream of the restrictor valve member 46, wherein:

The flow regulating valve 44 located in the same liquid inlet pipe A is located downstream of the liquid flowmeter 43, and the manual valve 45 arranged in the same liquid inlet pipe A is located downstream of the liquid flowmeter 43; The manual valve 45 is located downstream of the liquid flow meter 43 .

In order to obtain the concentration of the gas mixture transported in parallel from the liquid output pipe B to a plurality of wafer cleaning devices C, the sensing and control valve group 40 is provided with a concentration detection device 49 in series with the liquid output pipe B, And the concentration detection device 49 is arranged downstream of the manual valve 45 . In this preferred embodiment, the concentration detection device 49 obtains the gas concentration of the gas solution by sensing the conductivity (the conductivity of the liquid is proportional to the concentration of the dissolved gas).

When the manual valve C1 of each machine is opened successively to gradually increase the amount of the gas solution flowing out of the liquid storage chamber 122 of the gas-liquid mixing device 100, the concentration detection device 49 measures the conductivity of the gas solution (μS /cm) and flow rate (LPM, L/min, liter/minute) relationship (aforesaid electrical conductivity corresponds to the concentration of dissolved gas), plotted as shown in Figure 3, also drawn in this Figure 3 when the flow limiting plate 14 is not installed The curves of flow and conductivity (gas concentration) can be seen from the comparison of the two curves without/with the flow limiting plate 14 installed, through the total flow of the flow limiting passage 141 leading to the liquid storage chamber 122 from the gas-liquid mixing chamber 121 The cross-sectional area is limited to less than a quarter of the cross-sectional area of the liquid inlet 123 leading to the gas-liquid mixing chamber 121. The structure and method can effectively reduce the pressure change of the liquid in the gas-liquid mixing chamber 121, and stabilize the The concentration of the gas-dissolved liquid generated in the gas-liquid mixing chamber 121.

As mentioned above, the pressure change of the liquid in the gas-liquid mixing chamber 121 has been stabilized within a certain range. The present invention limits the diameter of each air hole 24 to a size equal to or smaller than 500 μm, such as in the above-mentioned preferred embodiment The diameter is further limited to a size of not less than 150 μm and not more than 160 μm, so that the capillary pressure generated by the liquid contacting the walls around the pores 24 can also control the gas to pass through the plurality of pores 24 and enter the gas-liquid mixing chamber under slight pressure changes Dissolved flow changes within 121.

By limiting the size of each air hole 24 , as shown in FIG. 2 and FIG. 4A , when the output flow rate of the liquid output port 124 is stable, the gas flows into the gas-liquid mixing chamber 121 through each air hole 24 . When the output flow rate of the liquid output port 124 decreases instantaneously, the pressure in the gas-liquid mixing chamber 121 will increase slightly instantaneously, and the increase in pressure at this time will reduce the pressure difference between the water pressure and the air pressure, as shown in Figure 4B. Let the liquid contact the pore wall of each air hole 24 instantly, and the liquid blocks each air hole 24 by the capillary pressure towards each air hole 24, reduces the total amount of gas entering the gas-liquid mixing chamber 121, and reduces the amount of gas mixed with the liquid . On the contrary, when the flow rate of the liquid outlet 124 output became larger, the pressure in the gas-liquid mixing chamber 121 became smaller, and the pressure difference between the gas and liquid became larger, so that the gas passed through each air hole 24 and entered into the gas-liquid mixing chamber 121. The amount of air intake increases; the present invention can stabilize the mixed liquid concentration through the aforementioned reaction.

The above description is only a preferred feasible embodiment of the present invention, and all equivalent changes made by applying the description of the present invention and the scope of the patent application should be included in the scope of the patent of the present invention.

[this invention] 100: gas-liquid mixing device 10: Pressure tank 12: Pressure tank 121: gas-liquid mixing chamber 122: liquid storage room 123: liquid input port 124: liquid output port 125: gas input pipe perforation 126: Drain hole 14: Current limiting plate 141: Current limiting channel 142: middle perforation 20: Gas input pipe 22: inner end 24: stomata 30: Gas-liquid supply structure 32: Gas supply source 34: Liquid supply source 40: Sensing and control valve group 41: Gas-liquid mixing chamber pressure gauge 42: Liquid storage room pressure gauge 43: Liquid flow meter 44: Flow regulating valve 45: Manual valve 46: Flow limiting valve 47: Barometer 48: check valve 49: Concentration detection device A: Liquid input tube B: liquid output pipe C: Wafer cleaning device C1: machine manual valve D: drain pipe D1: Discharge flow limiting valve

Fig. 1 is a three-dimensional schematic diagram of a pressure tank and a gas input pipe in a preferred embodiment of the present invention. FIG. 2 is a schematic diagram of connecting multiple wafer cleaning devices according to a preferred embodiment of the present invention. Fig. 3 is a diagram of the flow rate and the conductivity when the current limiting plate is installed or not installed in a preferred embodiment of the present invention. FIG. 4A is a schematic diagram of the air hole state when the liquid output is balanced according to a preferred embodiment of the present invention. FIG. 4B is a schematic diagram of the air hole state at the moment when the liquid output decreases in a preferred embodiment of the present invention. Fig. 4C is a schematic diagram of the air hole state when the liquid output increases in a preferred embodiment of the present invention.

100: gas-liquid mixing device

10: Pressure tank

12: Pressure tank

121: gas-liquid mixing chamber

122: liquid storage room

123: liquid input port

124: liquid output port

125: gas input pipe perforation

126: Drain hole

14: Current limiting plate

141: Current limiting channel

142: middle perforation

20: Gas input pipe

22: inner end

24: stomata

41: Gas-liquid mixing chamber pressure gauge

42: Liquid storage room pressure gauge

A: Liquid input tube

B: liquid output pipe

D: drain pipe

Claims (12)

A gas-liquid mixing device, comprising: A pressure tank, including a pressure tank body and a flow limiting plate, wherein the pressure tank body has a gas inlet pipe perforation, the flow limiting plate is arranged inside the pressure tank body and divides the space inside the pressure tank body into a gas A liquid mixing chamber and a liquid storage chamber, the flow limiting plate has a flow limiting channel, the flow limiting channel communicates with the gas-liquid mixing chamber and the liquid storage chamber, and the total cross-sectional area of the flow limiting channel is smaller than the cross-sectional area of the liquid input port a quarter of the area, the part of the pressure tank body corresponding to the gas-liquid mixing chamber has a liquid input port, and the part of the pressure tank body corresponding to the liquid storage chamber has a liquid output port; and A gas input pipe is perforated through the gas input pipe so that part of the pipe section is located outside the pressure tank, and part of the pipe section is located inside the pressure tank body, wherein the inner end of the pipe section of the gas input pipe located inside the pressure tank body has a The inner end is located in the gas-liquid mixing chamber and has a plurality of air holes. The gas-liquid mixing device according to claim 1, wherein the volume of the liquid storage chamber is less than one fourth of the volume of the gas-liquid mixing chamber. The gas-liquid mixing device as described in claim 1 or 2, which includes a concentration detection device connected to the liquid output port for measuring the output from the liquid storage chamber to the liquid output port The gas concentration of the gas solution changes. The gas-liquid mixing device as described in claim 3, wherein a gas-liquid mixing chamber pressure gauge and a liquid storage chamber pressure gauge are respectively installed on the pressure tank body in accordance with the positions of the gas-liquid mixing chamber and the liquid storage chamber, so as to use the The gas-liquid mixing chamber pressure meter measures the liquid pressure in the gas-liquid mixing chamber, and the liquid storage chamber pressure meter measures the liquid pressure in the liquid storage chamber. The gas-liquid mixing device as described in claim 4, wherein the part of the pressure tank body corresponding to the gas-liquid mixing chamber has a discharge hole, a discharge pipe is connected to the discharge hole, and a discharge pipe is connected in series. Drain flow restrictor valve. The gas-liquid mixing device as described in Claim 5, wherein the perforation of the gas inlet pipe is located at the position of the pressure tank body corresponding to the liquid storage chamber, so that a part of the gas inlet pipe passes through the liquid storage chamber, and the flow restriction There is a central perforation in the middle of the plate, and the inner end of the gas input pipe penetrates into the gas-liquid mixing chamber through the central perforation. The gas-liquid mixing device as described in claim 6, wherein a liquid input pipe is connected to a liquid supply source at the liquid input port, a gas supply source is connected to the outer end of the gas input pipe, and a gas supply source is connected to the liquid output port. A liquid output pipe, the concentration detection device is arranged in series on the liquid output pipe. The gas-liquid mixing device as described in claim item 7, wherein a liquid flowmeter is arranged in series in the gas inlet pipe, the liquid inlet pipe, the liquid outlet pipe, and the discharge pipe respectively; The gas input pipes are respectively provided with a flow regulating valve in series, and the flow regulating valve located in the same liquid input pipe is located downstream of the liquid flowmeter; the liquid input pipe and the liquid output pipe are respectively provided with a manual valve in series, located at The manual valve on the same liquid inlet pipe is located downstream of the liquid flow meter, and the manual valve on the same liquid output pipe is located downstream of the liquid flow meter; and The discharge flow limiting valve set in the same discharge pipe is located upstream of the liquid flowmeter, and a flow limiting valve piece is arranged in series on the gas input pipe, the liquid flowmeter and the flow limiter set in the same gas input pipe The flow valve parts are respectively located upstream and downstream of the flow regulating valve; a barometer is arranged in series at the part of the gas inlet pipe between the flow restricting valve part and the flow regulating valve, and the gas inlet pipe is located at the restricting valve. A non-return valve is provided in series in the downstream portion of the flow valve member. The gas-liquid mixing device as described in Claim 1 or 2, wherein the diameter of each pore is equal to or less than 500 μm, when the pressure in the gas-liquid mixing chamber rises so that the liquid in the gas-liquid mixing chamber contacts the pore wall of each pore, The liquid will block the air holes with the capillary pressure to reduce the total amount of the gas input by the gas input pipe entering the gas-liquid mixing chamber. A gas-liquid mixing method, the steps of the method comprising: Restricting the total cross-sectional area of the flow-restricting passage leading from a gas-liquid mixing chamber to a liquid storage chamber to be less than a quarter of the cross-sectional area of the liquid inlet leading to the gas-liquid mixing chamber; and The liquid is continuously input from the liquid input port, and the bubbles of the gas to be dissolved in the liquid are continuously injected into the gas-liquid mixing chamber, so that the bubbles dissolve into the liquid in the gas-liquid mixing chamber to become a gas solution, and the ratio of the cross-sectional area through the aforementioned The flow-limiting channel produces a flow-limiting effect, so that the liquid flowing into the gas-liquid mixing chamber can be quickly replenished to fill up the pressure, reducing the pressure change of the liquid in the gas-liquid mixing chamber, and stabilizing the concentration of the gas solution. The liquid storage chamber outputs the gas solution to the outside. The gas-liquid mixing method according to claim 10, wherein the volume of the liquid storage chamber is further limited to less than a quarter of the volume of the gas-liquid mixing chamber. The gas-liquid mixing method as described in Claim 10 or 11, wherein the diameter of each pore is equal to or less than 500 μm, when the pressure in the gas-liquid mixing chamber rises so that the liquid in the gas-liquid mixing chamber contacts the pore wall of each pore, The liquid will block the air holes with the capillary pressure to reduce the total amount of the gas input by the gas input pipe entering the gas-liquid mixing chamber.

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