TW202246394A - Apparatus for mixing resin composition for manufacturing polishing pad and method for manufacturing polishing pad - Google Patents
Apparatus for mixing resin composition for manufacturing polishing pad and method for manufacturing polishing pad Download PDFInfo
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- TW202246394A TW202246394A TW111119530A TW111119530A TW202246394A TW 202246394 A TW202246394 A TW 202246394A TW 111119530 A TW111119530 A TW 111119530A TW 111119530 A TW111119530 A TW 111119530A TW 202246394 A TW202246394 A TW 202246394A
- Authority
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- Taiwan
- Prior art keywords
- raw material
- filter
- mixed raw
- polishing pad
- mixing
- Prior art date
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- 229940029284 trichlorofluoromethane Drugs 0.000 description 1
- WDIWAJVQNKHNGJ-UHFFFAOYSA-N trimethyl(propan-2-yl)silane Chemical compound CC(C)[Si](C)(C)C WDIWAJVQNKHNGJ-UHFFFAOYSA-N 0.000 description 1
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- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2075/00—Use of PU, i.e. polyureas or polyurethanes or derivatives thereof, as moulding material
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
Abstract
Description
本實施方式涉及用於製備拋光墊的樹脂組合物混合裝置、拋光墊的製備方法等。The present embodiment relates to a resin composition mixing device for preparing a polishing pad, a method for preparing a polishing pad, and the like.
化學機械平坦化(Chemical Mechanical Polishing,CMP)製程是以化學和機械方式使如晶圓表面等的拋光物件的凹凸部分平坦化的製程。就晶圓(wafer)而言,在將拋光物件附著於拋光頭並與形成在平臺(platen)上的拋光墊的表面接觸的狀態下,通過供應漿料來使晶圓表面發生化學反應,以使平臺和拋光頭相對運動的方式進行平坦化的情況較多。The Chemical Mechanical Polishing (CMP) process is a process for chemically and mechanically planarizing the concave-convex portion of a polished object such as a wafer surface. In the case of a wafer, the surface of the wafer is chemically reacted by supplying a slurry in a state where a polishing object is attached to a polishing head and in contact with the surface of a polishing pad formed on a platen to In many cases, planarization is performed by relatively moving the stage and the polishing head.
拋光墊所含的拋光層是在化學機械平坦化製程中起重要作用的必不可少的原材料之一。The polishing layer contained in the polishing pad is one of the essential raw materials that plays an important role in the chemical mechanical planarization process.
化學機械拋光製程的拋光效率和拋光後的被拋光物體的品質,受化學機械拋光設備、漿料組合物的組成及拋光墊的形狀和物理性能等的很大影響。The polishing efficiency of the chemical mechanical polishing process and the quality of the polished object after polishing are greatly affected by the chemical mechanical polishing equipment, the composition of the slurry composition, and the shape and physical properties of the polishing pad.
拋光墊通常由聚氨酯製成。例如,製備通過混合預聚物(prepolymer)、發泡劑、固化劑等,將混合物放入模具中並進行固化反應而形成的聚氨酯,對該聚氨酯進行加工,從而可以製成拋光墊。Polishing pads are usually made of polyurethane. For example, polyurethane formed by mixing a prepolymer, a foaming agent, a curing agent, etc., putting the mixture in a mold and performing a curing reaction is prepared, and the polyurethane is processed so that a polishing pad can be made.
現有技術文獻
專利文獻
專利文獻1韓國授權專利第10-0467765號(2005.01.13.)
專利文獻2韓國授權專利第10-1894071號(2018.08.31.)
prior art literature
patent
技術問題technical problem
實施方式提供一種能夠有效地混合用於製備拋光墊的原料,並且能夠在原料混合過程中去除原料中所含的金屬異物的技術。Embodiments provide a technique capable of efficiently mixing raw materials for preparing a polishing pad and capable of removing metallic foreign matter contained in the raw materials during the mixing of the raw materials.
解決問題的方案solution to the problem
根據一實施方式的用於製備拋光墊的樹脂組合物混合裝置包括:原料混合部,用於製備包括預聚物和發泡劑的混合原料;過濾單元,與上述原料混合部連接,對上述混合原料進行過濾;及墊組合物形成部,與上述過濾單元連接,以製備包含過濾後的混合原料和固化劑的可固化混合物。A resin composition mixing device for preparing a polishing pad according to one embodiment includes: a raw material mixing part for preparing a mixed raw material including a prepolymer and a foaming agent; a filter unit connected to the above-mentioned raw material mixing part for the mixing The raw material is filtered; and the mat composition forming part is connected with the above-mentioned filtering unit to prepare a curable mixture including the filtered mixed raw material and a curing agent.
上述原料混合部可以包括具有彼此不同的轉速的多個旋轉工具。The above-mentioned raw material mixing unit may include a plurality of rotating tools having different rotational speeds from each other.
上述過濾單元可以包括用於從上述混合原料中分離金屬物質的第二過濾器部。The filter unit may include a second filter unit for separating metal substances from the mixed raw material.
上述過濾單元可以包括:第一過濾器部,用於根據尺寸過濾上述混合原料;以及第二過濾器部,用於從上述混合原料中分離金屬物質。The filtering unit may include: a first filter part for filtering the mixed raw material according to size; and a second filter part for separating metal substances from the mixed raw material.
上述第一過濾器部可以包括:過濾器外殼,供上述混合原料移動;及過濾器構件,設置在上述過濾器外殼中,供上述混合原料通過。The first filter unit may include: a filter case through which the mixed raw material moves; and a filter member provided in the filter case through which the mixed raw material passes.
上述過濾器構件供預定尺寸以下的上述混合原料通過。The said filter member passes the said mixed raw material of a predetermined size or less.
上述第二過濾器部可以包括:過濾器外殼,供上述混合原料通過;及支架,設置在上述過濾器外殼中,與通過的上述混合原料接觸;及磁體,設置在上述支架內部並產生磁力。The second filter part may include: a filter case through which the mixed raw material passes; a holder provided in the filter case and in contact with the passed mixed raw material; and a magnet provided inside the holder to generate magnetic force.
上述金屬物質通過上述磁力附著到上述支架的外周,從上述混合原料中被去除。The metal substance is attached to the outer periphery of the stent by the magnetic force, and is removed from the mixed raw material.
在上述過濾器外殼的內部設置有上述支架所在的過濾器空間。A filter space where the bracket is located is provided inside the filter housing.
在上述過濾器外殼的下側的外周,設有供上述混合原料流入到上述過濾器空間的入口,其可以沿著上述外周的接線方向設置。An inlet for the mixed raw material to flow into the filter space is provided on the outer periphery of the lower side of the filter housing, which may be arranged along the connection direction of the outer periphery.
在上述過濾器外殼的上側的外周,設有用於排出上述混合原料的出口,上述混合原料為經由上述過濾器空間且分離上述金屬物質的混合原料。An outlet for discharging the mixed raw material passing through the filter space and separating the metal substance is provided on the outer periphery of the upper side of the filter case.
上述出口可以以平行於上述接線方向設置。The above-mentioned outlet can be arranged parallel to the above-mentioned wiring direction.
上述入口和上述出口可以隔著上述支架在對角線上彼此相對。The inlet and the outlet may be diagonally opposed to each other across the bracket.
上述第二過濾器部還可包括蓋,其可拆卸地結合到上述過濾器外殼並連接到上述支架。The second filter part may further include a cover detachably coupled to the filter housing and connected to the bracket.
上述原料混合部可以包括:原料混合容器,設置有原料混合空間;及原料混合工具,設置在上述原料混合空間中,借助上述多個旋轉工具移動。The raw material mixing unit may include: a raw material mixing container provided with a raw material mixing space; and a raw material mixing tool provided in the raw material mixing space and moved by the plurality of rotating tools.
上述原料混合工具,用於混合容納在上述原料混合空間中的上述預聚物和上述發泡劑,並將上述發泡劑分散在上述混合原料中。The above-mentioned raw material mixing tool is used for mixing the above-mentioned prepolymer and the above-mentioned foaming agent accommodated in the above-mentioned raw material mixing space, and dispersing the above-mentioned foaming agent in the above-mentioned mixed raw material.
上述多個旋轉工具可以包括第一驅動構件和至少一個第二驅動構件。The aforementioned plurality of rotary tools may include a first drive member and at least one second drive member.
上述原料混合工具可以包括:旋轉主體,通過與上述第一驅動構件連接來能夠旋轉,設置有上述至少一個第二驅動構件;及至少一個原料混合構件,通過與上述至少一個第二驅動構件連接來能夠旋轉。The raw material mixing tool may include: a rotating main body rotatable by being connected to the first driving member, and provided with the at least one second driving member; and at least one raw material mixing member connected to the at least one second driving member. able to rotate.
上述至少一個原料混合構件可以通過上述至少一個第二驅動構件旋轉。The at least one raw material mixing member may be rotated by the at least one second driving member.
上述原料混合構件可以包括:軸,與上述第二驅動構件的驅動軸連接;攪拌葉片,與上述軸連接,容納在上述原料混合空間內。The raw material mixing member may include: a shaft connected to the driving shaft of the second driving member; and a stirring blade connected to the shaft and accommodated in the raw material mixing space.
上述攪拌葉片可以包括螺旋型攪拌葉片。The aforementioned stirring blade may include a spiral type stirring blade.
上述墊組合物形成部可以包括:組合物混合容器,設置有組合物混合空間;及組合物混合構件,設置在上述組合物混合容器中。The pad composition forming part may include: a composition mixing container provided with a composition mixing space; and a composition mixing member provided in the composition mixing container.
上述組合物混合構件,通過混合上述混合原料和上述固化劑來製備可固化混合物。上述混合原料可以是在通過過濾單元的同時進行過濾的混合原料。The above-mentioned composition mixing member prepares a curable mixture by mixing the above-mentioned mixing raw material and the above-mentioned curing agent. The above-mentioned mixed raw material may be a mixed raw material that is filtered while passing through a filtration unit.
上述組合物混合構件可以包括:電機;軸,連接到上述電機的驅動軸;及攪拌葉片,與上述軸連接,將容納在上述組合物混合空間中的上述混合原料和上述固化劑混合。The composition mixing member may include: a motor; a shaft connected to the driving shaft of the motor; and a stirring blade connected to the shaft to mix the above-mentioned mixing raw material and the above-mentioned curing agent contained in the above-mentioned composition mixing space.
上述用於製備拋光墊的樹脂組合物混合裝置還可以包括均質化部,該均質化部用於提高從上述原料混合部排出的上述混合原料的分散程度。The above-mentioned resin composition mixing device for preparing a polishing pad may further include a homogenization section for increasing the degree of dispersion of the above-mentioned mixed raw material discharged from the above-mentioned raw material mixing section.
上述均質化部可以包括:均質化外殼,具有流入口和排出口;轉子,可旋轉地設置在上述均質化外殼內部;及電機,連接到上述均質化外殼,使上述轉子旋轉。The homogenization unit may include: a homogenization case having an inlet and a discharge port; a rotor rotatably provided inside the homogenization case; and a motor connected to the homogenization case to rotate the rotor.
上述均質化部可以包括:均質化外殼,具有流入口和排出口;軸,可旋轉地設置在上述均質化外殼的內部;及均質化板,沿著上述軸的長度方向排列,形成有流動孔。The homogenization part may include: a homogenization case having an inlet and a discharge port; a shaft rotatably provided inside the homogenization case; and a homogenization plate arranged along the length direction of the shaft and forming a flow hole .
相鄰的上述均質化板的流動孔可以錯開。The flow holes of adjacent homogenization plates can be staggered.
根據另一實施方式的用於製備拋光墊的樹脂組合物混合裝置包括:原料混合部,用於製備包括預聚物和發泡劑的混合原料;過濾單元,與上述原料混合部連接,對上述混合原料進行過濾;及墊組合物形成部,與上述過濾單元連接,以製備包含過濾後的混合原料和固化劑的可固化混合物。A resin composition mixing device for preparing a polishing pad according to another embodiment includes: a raw material mixing part for preparing a mixed raw material including a prepolymer and a foaming agent; a filter unit connected to the above-mentioned raw material mixing part for the above-mentioned The mixed raw material is filtered; and a mat composition forming part is connected with the above-mentioned filtering unit to prepare a curable mixture including the filtered mixed raw material and a curing agent.
上述原料混合部可以包括:原料混合容器,形成有原料混合空間;軸,與驅動部的驅動軸連接,位於上述原料混合空間內;攪拌葉片,與上述軸連接旋轉。The raw material mixing part may include: a raw material mixing container forming a raw material mixing space; a shaft connected to a driving shaft of the driving part and located in the raw material mixing space; and a stirring blade connected to the shaft to rotate.
上述攪拌葉片,可以在旋轉的同時混合供應到上述原料混合空間中的上述預聚物和上述發泡劑,並將發泡劑分散在上述混合原料中。The stirring blade may mix the prepolymer and the foaming agent supplied to the raw material mixing space while rotating, and disperse the foaming agent in the mixed raw material.
上述過濾單元可以包括用於分離金屬物質的第二過濾器部。The above-mentioned filter unit may include a second filter part for separating metal substances.
上述過濾單元可以包括:第一過濾器部,用於根據尺寸過濾上述混合原料;及第二過濾器部,用於從上述混合原料中分離金屬物質。The filter unit may include: a first filter part for filtering the mixed raw material according to size; and a second filter part for separating metal substances from the mixed raw material.
根據另一實施方式的拋光墊的製備方法包括如下步驟:過濾步驟,對包含預聚物和發泡劑的混合原料進行過濾,以製備過濾後的混合原料,可固化混合步驟,製備包含上述過濾後的混合原料和固化劑的可固化混合物,以及成型步驟,將上述可固化混合物放入模具並製備成型體;通過上述拋光墊的製備方法,製備將成型體的至少一部分作為拋光層的拋光墊。A preparation method of a polishing pad according to another embodiment includes the following steps: a filtering step of filtering a mixed raw material comprising a prepolymer and a foaming agent to prepare a filtered mixed raw material; After the curable mixture of mixed raw materials and curing agent, and the molding step, the above curable mixture is put into a mold and a molded body is prepared; through the preparation method of the above-mentioned polishing pad, at least a part of the molded body is prepared as a polishing pad of a polishing layer .
上述過濾包括適用磁性過濾器的過濾過程。The above-mentioned filtration includes a filtration process using a magnetic filter.
上述發泡劑可包括固態發泡劑,上述固態發泡劑可以是經過分級純化的固態發泡劑。The above-mentioned foaming agent may include a solid foaming agent, and the above-mentioned solid foaming agent may be a fractionated and purified solid foaming agent.
發明的效果The effect of the invention
根據實施方式,通過用於製備拋光墊的樹脂組合物的混合裝置控制用於製備拋光墊的樹脂組合物的混合分散過程,從而製備實質上均質且異物混入得到控制的可固化混合物,使用該混合物製備拋光墊,從而可以改善由於可固化混合物的不良而導致的拋光墊的物理性能劣化,進而可以進一步提高通過拋光墊拋光的被拋光物體(例如,晶圓等)的拋光品質。According to an embodiment, the mixing and dispersing process of the resin composition for preparing the polishing pad is controlled by a mixing device for the resin composition for preparing the polishing pad, thereby preparing a curable mixture that is substantially homogeneous and in which the incorporation of foreign matter is controlled, and the mixture is used A polishing pad is prepared, so that the deterioration of the physical properties of the polishing pad caused by the poor curable mixture can be improved, and the polishing quality of the polished object (eg, wafer, etc.) polished by the polishing pad can be further improved.
以下,參照附圖來對多個實施方式進行詳細說明,以使本發明所屬技術領域的普通技術人員輕鬆實現實施方式。然而,本發明可通過多種不同的實施方式實現,並不限定於在本說明書中所說明的實施例。在說明書全文中,對於相同或相似的元件賦予相同的附圖標記。Hereinafter, multiple embodiments will be described in detail with reference to the accompanying drawings, so that those skilled in the art to which the present invention pertains can easily implement the embodiments. However, the present invention can be realized in various embodiments and is not limited to the examples described in this specification. Throughout the specification, the same reference numerals are given to the same or similar elements.
在本說明書的整個文件中,程度的術語“約”或“實質上”等意指具有接近指定的具有容許誤差的數值或範圍的含義,並旨在防止用於理解本實施方式所公開的準確的或絕對的數值被任何不合情理的第三方不正當或非法地使用。Throughout the documents of this specification, the terms "about" or "substantially" etc. of degree mean to have the meaning close to the specified numerical value or range with allowable error, and are intended to prevent people from understanding the exact meaning disclosed in the present embodiment. The absolute or absolute values are used improperly or illegally by any unreasonable third party.
在本說明書全文中,馬庫西型描述中包括的術語“……的組合”是指從馬庫西型描述的組成要素組成的組中選擇的一個或多個組成要素的混合或組合,從而意味著本發明包括選自由上述組成要素組成的組中的一個或多個組成要素。Throughout this specification, the term "combination of ..." included in a Markush-type description refers to a mixture or combination of one or more constituent elements selected from the group consisting of constituent elements of a Markush-type description such that It means that the present invention includes one or more constituent elements selected from the group consisting of the above constituent elements.
在本說明書全文中,“A和/或B”形式的記載意指“A或B,或A和B”。Throughout the present specification, description in the form of "A and/or B" means "A or B, or A and B".
在本說明書全文中,除非有特別說明,如“第一”、“第二”或“A”、“B”等的術語為了互相區別相同術語而使用。Throughout this specification, terms such as "first", "second" or "A", "B", etc. are used to distinguish the same terms from each other unless otherwise specified.
在本說明書中,B位於A上的含義是指B位於A上或其中間存在其他層的情況下B位於A上或可位於A上,不應限定於B以接觸的方式位於A表面的含義來解釋。In this specification, the meaning that B is located on A means that B is located on A or that B is located on A or can be located on A when there are other layers in between, and it should not be limited to the meaning that B is located on the surface of A in a contact manner. to explain.
除非有特別說明,在本說明書中單數的表述解釋為包括上下文所解釋的單數或複數的含義。Unless otherwise specified, expressions in the singular in this specification are interpreted to include the meanings of the singular or the plural interpreted in the context.
在本說明書中,為了說明本發明,附圖中的各個元件的尺寸可能被誇大,並且可與實際比例不同。In this specification, in order to explain the present invention, the size of each element in the drawings may be exaggerated and may be different from the actual ratio.
拋光墊包括泡沫體(foamed body)形式的拋光層,該泡沫體包括孔且具有彈性。拋光層的製備中適用發泡劑和樹脂組合物。The polishing pad includes a polishing layer in the form of a foamed body that includes cells and has elasticity. A foaming agent and a resin composition are used in the preparation of the polishing layer.
為了更精確地控制孔的粒徑,適用粉末型固態發泡劑(solid foaming agent)。將粉末型發泡劑完全均勻地分散在液態聚合物樹脂中並不容易。當液態聚合物樹脂具有一定程度以上的黏度時,其分散更加困難。In order to control the particle size of the pores more precisely, a powder-type solid foaming agent (solid foaming agent) is suitable. It is not easy to completely and uniformly disperse powder type blowing agent in liquid polymer resin. When the liquid polymer resin has a viscosity above a certain level, its dispersion is more difficult.
本發明人發現,固態發泡劑的至少一部分相互凝聚,容易以凝聚體的形式存在於混合原料中,尺寸較大的凝聚體,在拋光墊中成為異物或在拋光時改變漿料的流向等帶來影響,這不僅影響拋光墊的品質,還影響被拋光物體的拋光品質。The present inventors have found that at least a part of the solid foaming agent aggregates with each other and easily exists in the mixed raw material in the form of aggregates. Larger aggregates become foreign objects in the polishing pad or change the flow direction of the slurry during polishing. Influence, which not only affects the quality of the polishing pad, but also affects the polishing quality of the polished object.
本發明人發現,在製備拋光墊的過程中無意混入的雜質會對被拋光物體的品質產生很大影響,而作為其例子之一的金屬異物是在被拋光物體上造成劃痕等的原因之一。The present inventors have found that impurities that are unintentionally mixed in the process of preparing the polishing pad have a great influence on the quality of the object to be polished, and metal foreign matter as one of its examples is one of the causes of scratches and the like on the object to be polished one.
因此,本發明人研究了有效地製備拋光墊的方法以及提高所製備的拋光墊和用該拋光墊拋光的被拋光物體的物理性能的方法,從而提出以下將說明的實施方式。Accordingly, the present inventors studied methods of efficiently preparing a polishing pad and methods of improving physical properties of the prepared polishing pad and an object to be polished polished with the polishing pad, thereby proposing embodiments to be described below.
用於製備拋光墊的樹脂組合物混合裝置Resin composition mixing apparatus for preparing polishing pads
將參照圖1至圖5說明根據一實施方式的用於製備拋光墊的樹脂組合物混合裝置。A resin composition mixing device for preparing a polishing pad according to an embodiment will be explained with reference to FIGS. 1 to 5 .
圖1為示出根據一實施方式的用於製備拋光墊的樹脂組合物混合裝置的示意圖,圖2為示出圖1中的原料混合部的放大圖,圖3為示出圖1中的第一過濾器部的示意圖,圖4為示出圖1中的第二過濾器部的示意圖,圖5為圖4的分解圖。1 is a schematic diagram showing a resin composition mixing device for preparing a polishing pad according to one embodiment, FIG. 2 is an enlarged view showing a raw material mixing part in FIG. 1 , and FIG. A schematic diagram of a filter part, FIG. 4 is a schematic diagram showing a second filter part in FIG. 1 , and FIG. 5 is an exploded view of FIG. 4 .
參照圖1至圖5,根據實施方式的用於製備拋光墊的樹脂組合物混合裝置1包括:原料混合部10,用於製備包括預聚物和發泡劑的混合原料;過濾單元20,與原料混合部10連接,對混合原料進行過濾;及墊組合物形成部50,與過濾單元20連接,以製備包含過濾後的混合原料和固化劑的可固化混合物。Referring to FIGS. 1 to 5, a resin
根據另一實施方式的用於製備拋光墊的樹脂組合物混合裝置具有參照下面將描述的圖1至圖7描述的實施例的大部分組件。A resin composition mixing device for preparing a polishing pad according to another embodiment has most of the components of the embodiment described with reference to FIGS. 1 to 7 to be described below.
實施方式的原料混合部10包括至少一個驅動部(圖中未示出),該驅動部包括至少一個電機。The raw
驅動部與軸(圖中未示出)連接並旋轉,攪拌葉片(圖中未示出)通過軸在原料混合容器11內部進行旋轉,將供應的預聚物與發泡劑混合,從而製備混合原料。The driving part is connected to a shaft (not shown in the figure) and rotates, and the stirring blade (not shown in the figure) is rotated inside the raw
在混合原料通過均質化部60、70時,顆粒被均質化,並且在通過過濾單元20時,可以保持預定尺寸且分離金屬物質。When the mixed raw material passes through the
原料混合部:批次(batch)式Raw material mixing section: batch type
原料混合部10包括:原料混合容器11,在內部設置有原料混合空間111;原料混合工具13,設置在原料混合空間111中,通過多個旋轉工具12移動;以及多個旋轉工具12,使原料混合工具13進行操作,具有不同的轉速。The raw
原料混合容器11可以連接到用於供應預聚物的第一供應部10a和用於供應發泡劑的第二供應部10b。在原料混合容器11的原料混合空間111中可以容納分別從第一供應部10a和第二供應部10b供應的預聚物和發泡劑。The raw
在原料混合空間111中可以設置有用於壓送通過混合預聚物和發泡劑而製備的混合原料的泵(圖中未示出)。在原料混合空間111中可以設置有用於壓送通過混合預聚物和發泡劑而製備的混合原料的鼓風機(blower)。泵和鼓風機可根據混合原料的狀態(溶液或粉末)而選擇性地適用。A pump (not shown in the figure) for pressure-feeding a mixed raw material prepared by mixing a prepolymer and a foaming agent may be provided in the raw
預聚物(prepolymer)是指,在製備最終成型品時,與將聚合度保持在中間階段的最終成型品相比,具有低分子量的聚合物樹脂。預聚物可以通過自身成型或與其他聚合性化合物反應後成型,通常以液態形式適用。A prepolymer (prepolymer) refers to a polymer resin having a lower molecular weight than a final molded product in which the degree of polymerization is kept at an intermediate stage when preparing a final molded product. Prepolymers can be molded by themselves or reacted with other polymerizable compounds, usually in liquid form.
上述液態預聚物可以包括選自由聚氨酯、聚碸、聚醚碸、尼龍、聚醚、聚酯、聚苯乙烯、聚烯烴、環氧樹脂、有機矽及其組合組成的組中的一種,且可以是形成聚氨酯的預聚物。The above-mentioned liquid prepolymer may include one selected from the group consisting of polyurethane, polyether, polyether, nylon, polyether, polyester, polystyrene, polyolefin, epoxy resin, silicone, and combinations thereof, and It may be a polyurethane-forming prepolymer.
上述預聚物可以是異氰酸酯化合物和多元醇反應而成的預聚物。示例性地,可以適用異氰酸酯類化合物、多元醇、由上述異氰酸酯和上述多元醇製備的預聚物等。The aforementioned prepolymer may be a prepolymer obtained by reacting an isocyanate compound and a polyol. Illustratively, isocyanate-based compounds, polyols, prepolymers prepared from the above-mentioned isocyanates and the above-mentioned polyols, and the like can be applied.
例如,可用於製備聚氨酯類預聚物的異氰酸酯類化合物可以是選自甲苯二異氰酸酯(toluene diisocyanate,TDI)、萘-1,5-二異氰酸酯(naphthalene-1,5-diisocyanate)、對苯二異氰酸酯(p-phenylene diisocyanate)、二甲基聯苯二異氰酸酯(tolidine diisocyanate)、4,4'-二苯甲烷二異氰酸酯(4,4'-diphenyl methane diisocyanate)、六亞甲基二異氰酸酯(hexamethylene diisocyanate)、二環己基甲烷二異氰酸酯(dicyclohexylmethane diisocyanate)及異佛爾酮二異氰酸酯(isophorone diisocyanate)中的至少一種異氰酸酯。For example, the isocyanate compounds that can be used to prepare polyurethane prepolymers can be selected from toluene diisocyanate (toluene diisocyanate, TDI), naphthalene-1,5-diisocyanate (naphthalene-1,5-diisocyanate), p-phenylene diisocyanate (p-phenylene diisocyanate), tolidine diisocyanate, 4,4'-diphenylmethane diisocyanate, hexamethylene diisocyanate At least one isocyanate selected from dicyclohexylmethane diisocyanate (dicyclohexylmethane diisocyanate) and isophorone diisocyanate (isophorone diisocyanate).
例如,可用於製備聚氨酯類預聚物的多元醇可以是選自由聚醚多元醇(polyether polyol)、聚酯多元醇(polyester polyol)、聚碳酸酯多元醇(polycarbonate polyol)及丙烯基多元醇(acryl polyol)組成的組中的至少一種多元醇。多元醇的重均分子量(Mw)可以為300g/mol至3000g/mol。For example, the polyols that can be used to prepare polyurethane prepolymers can be selected from polyether polyols (polyether polyols), polyester polyols (polyester polyols), polycarbonate polyols (polycarbonate polyols) and acrylic polyols ( at least one polyol from the group consisting of acryl polyol). The polyol may have a weight average molecular weight (Mw) of 300 g/mol to 3000 g/mol.
聚氨酯類預聚物可以為具有500g/mol至3000g/mol的重均分子量的聚合物,其使用甲苯二異氰酸酯作為異氰酸酯化合物且使用聚四亞甲基醚二醇作為多元醇而聚合而成。The polyurethane-based prepolymer may be a polymer having a weight average molecular weight of 500 g/mol to 3000 g/mol, which is polymerized using toluene diisocyanate as an isocyanate compound and polytetramethylene ether glycol as a polyol.
作為最終成型品的成型體或拋光層可以是具有孔(氣孔)的泡沫體。The molded body or the polishing layer as the final molded product may be a foam body having pores (pores).
孔以分散的方式存在於成型的聚氨酯樹脂中。孔可以由作為固態發泡劑的熱膨脹微囊形成,或者可以由通過適用非活性氣體而成的氣泡形成。Pores exist in the molded polyurethane resin in a dispersed manner. The pores may be formed by thermally expandable microcapsules as a solid blowing agent, or may be formed by gas bubbles by applying an inert gas.
發泡劑包括固態發泡劑。固態發泡劑可以是熱膨脹(尺寸被調節)的微囊,並且可以是平均粒徑為5μm至200μm的微球結構體。熱膨脹(尺寸被調節)的微囊可以是通過將熱膨脹性微囊加熱並膨脹來獲得的。Blowing agents include solid blowing agents. The solid blowing agent may be thermally expanded (size-adjusted) microcapsules, and may be a microsphere structure with an average particle diameter of 5 μm to 200 μm. Heat-expandable (size-adjusted) microcapsules can be obtained by heating and expanding heat-expandable microcapsules.
上述熱膨脹性微囊的密度可以為100kg/m3以下,或密度可以為80kg/m3以下。另外,上述熱膨脹性微囊的密度可以為10kg/m3至80kg/m3,或密度可以為10kg/m3至60kg/m3。The thermally expandable microcapsules may have a density of 100 kg/m3 or less, or a density of 80 kg/m3 or less. In addition, the above-mentioned heat-expandable microcapsules may have a density of 10 kg/m3 to 80 kg/m3, or a density of 10 kg/m3 to 60 kg/m3.
熱膨脹性微囊可以包括含有熱塑性樹脂的外皮及封裝在上述外皮內部的發泡劑。熱塑性樹脂可以是選自偏二氯乙烯類共聚物、丙烯腈類共聚物、甲基丙烯腈類共聚物及丙烯酸類共聚物中的一種以上。此外,上述的封裝在內部的發泡劑可以是由具有1個至7個碳原子的烴組成的組中的一種以上。The heat-expandable microcapsule may include an outer skin containing a thermoplastic resin and a foaming agent encapsulated inside the outer skin. The thermoplastic resin may be one or more selected from vinylidene chloride-based copolymers, acrylonitrile-based copolymers, methacrylonitrile-based copolymers, and acrylic copolymers. In addition, the aforementioned blowing agent encapsulated inside may be one or more species selected from the group consisting of hydrocarbons having 1 to 7 carbon atoms.
封裝在熱膨脹性微囊內部的發泡劑可以選自由如乙烷(ethane)、乙烯(ethylene)、丙烷(propane)、丙烯(propene)、正丁烷(nbutane)、異丁烷(isobutene)、丁烯(butene)、異丁烯(isobutene)、正戊烷(n-pentane)、異戊烷(isopentane)、新戊烷(neopentane)、正己烷(n-hexane)、庚烷(heptane)、石油醚(petroleum ether)等的低分子量烴、如三氯氟甲烷(trichlorofluoromethane,CCl 3F)、二氯二氟甲烷(dichlorodifluoromethane,CCl 2F 2)、氯三氟甲烷(chlorotrifluoromethane,CClF 3)、四氟乙烯(tetrafluoroethylene,CClF 2-CClF 2)等的氯氟烴、如四甲基矽烷(tetramethylsilane)、三甲基乙基矽烷(trimethylethylsilane)、三甲基異丙基矽烷(trimethylisopropylsilane)、三甲基正丙基矽烷(trimethyl-n-propylsilane)等的四烷基矽烷組成的組中。 The blowing agent encapsulated inside the heat-expandable microcapsule can be selected from such as ethane (ethane), ethylene (ethylene), propane (propane), propylene (propene), nbutane (nbutane), isobutane (isobutene), Butene, isobutene, n-pentane, isopentane, neopentane, n-hexane, heptane, petroleum ether (petroleum ether) and other low molecular weight hydrocarbons, such as trichlorofluoromethane (CCl 3 F), dichlorodifluoromethane (CCl 2 F 2 ), chlorotrifluoromethane (CClF 3 ), tetrafluoromethane Chlorofluorocarbons such as tetrafluoroethylene (CClF 2 -CClF 2 ), such as tetramethylsilane, trimethylethylsilane, trimethylisopropylsilane, trimethyl n- Propylsilane (trimethyl-n-propylsilane) and other tetraalkylsilane group.
上述發泡劑可以根據要適用的孔的比率而不同。具體而言,基於100重量份的預聚物,上述發泡劑的含量可以為0.5重量份至40重量份、1重量份至35重量份或5重量份至30重量份。The aforementioned foaming agent may vary depending on the ratio of cells to be applied. Specifically, based on 100 parts by weight of the prepolymer, the content of the foaming agent may be 0.5 to 40 parts by weight, 1 to 35 parts by weight, or 5 to 30 parts by weight.
根據需要,混合原料可以進一步包括穩泡劑。穩泡劑通過降低混合原料的表面張力來提高混溶性,有助於使混合過程中可產生的氣泡大小相對均勻。穩泡劑例如可以為表面活性劑。基於100重量份的預聚物,穩泡劑的含量可以為0.1重量份至5重量份。The mixed raw material may further include a foam stabilizer as needed. Foam stabilizers improve miscibility by reducing the surface tension of the mixed raw materials, which helps to make the size of the bubbles that can be generated during the mixing process relatively uniform. Foam stabilizers may be, for example, surfactants. The content of the foam stabilizer may be 0.1 to 5 parts by weight based on 100 parts by weight of the prepolymer.
原料混合工具13包括:旋轉主體131,通過與旋轉工具12連接來能夠旋轉;及至少一個原料混合構件132,位於原料混合空間111,通過與旋轉主體131連接來能夠旋轉。The raw
旋轉工具12和旋轉主體131可以設置在原料混合空間111中。旋轉工具12和旋轉主體131可以設置在原料混合空間111的外部。The
上述旋轉工具12可以設置在原料混合容器11的上方。The above-mentioned
上述旋轉主體131可以設置在原料混合容器11的上方。The above-mentioned
多個旋轉工具12包括第一驅動構件121和第二驅動構件122。The plurality of
第一驅動構件121可以連接到旋轉主體131以旋轉旋轉主體131。The
一個或兩個或更多個第二驅動構件122可以設置在旋轉主體131上。One or two or more
第一驅動構件121可以以與第二驅動構件122不同的速率和/或不同的方向旋轉,以控制原料混合構件的旋轉運動。由此,能夠在位於原料混合空間111的混合原料中引起紊流產生,能夠更有效地引起混合原料的均質化。The
第一驅動構件121可以連接到旋轉主體131。第一驅動構件121可以旋轉旋轉主體131。The
第二驅動構件122可以連接到旋轉主體131。第二驅動構件122可以設置在旋轉主體131。兩個或更多個第二驅動構件122可以設置在旋轉主體131上,或兩個或九個第二驅動構件122可以設置在旋轉主體131上。兩個或更多個原料混合構件132可以分別設置成不相互干擾。The
原料混合構件132與第二驅動構件122連接,在通過旋轉主體131進行旋轉(第一旋轉,公轉)的同時,可以通過第二驅動構件122進行旋轉(第二旋轉,自轉)。上述第一旋轉(公轉)和上述第二旋轉(自轉)的旋轉方向可以是相反的。The raw
多個旋轉工具12包括:第一驅動構件121,與旋轉主體131連接以使旋轉主體131旋轉;至少一個第二驅動構件122,設置在旋轉主體131。The plurality of
至少一個第二驅動構件122可以以與第一驅動構件121彼此隔開間隔的方式設置在旋轉主體131中。例如,至少一個第二驅動構件122可以設置在旋轉主體131的邊緣。At least one
至少一個第二驅動構件122可以以第一驅動構件121為基準沿旋轉主體131的周長方向排列。儘管在附圖中示出兩個第二驅動構件122,但是第二驅動構件122的數量可以根據用於製備拋光墊的樹脂組合物混合裝置的設計而改變。At least one
第一驅動構件121和第二驅動構件122包括公知的電機,第一驅動構件121和第二驅動構件122的轉速可以相同或不同。The
第一驅動構件121的轉速可以為50rpm至3000rpm。第一驅動構件121的轉速可以為80rpm至2000rpm。第一驅動構件121的轉速可以為80rpm至500rpm。The rotational speed of the first driving
第二驅動構件122的轉速可以為50rpm至3000rpm。第二驅動構件122的轉速可以為80rpm至2500rpm。第二驅動構件122的轉速可以為80rpm至2200rpm。The rotational speed of the
第一驅動構件121的轉速與第二驅動構件122的轉速之比率可以為1:0.1至1:40。第一驅動構件121的轉速與第二驅動構件122的轉速之比率可以為1:0.8至1:30。第一驅動構件121的轉速與第二驅動構件122的轉速之比率可以為1:8至1:28。第一驅動構件121的轉速與第二驅動構件122的轉速之比率可以為1:15至1:25。當通過將旋轉速度控制在上述範圍內並使第一驅動構件121和第二驅動構件122旋轉來製備混合原料時,可以製備混合原料實質上均質且凝聚固態發泡劑而成的凝聚體減少的混合原料。The ratio of the rotational speed of the first driving
上述混合原料在70℃測定的黏度可以為1000cps以上,可以為1000cps至2300cps,或也可以為1000cps至2000cps。原料混合部可以將具有上述黏度範圍的混合原料以相當水準分散並均質化。The viscosity of the mixed raw material measured at 70° C. may be above 1000 cps, may be 1000 cps to 2300 cps, or may be 1000 cps to 2000 cps. The raw material mixing section can disperse and homogenize the mixed raw material having the above-mentioned viscosity range at a considerable level.
旋轉主體131通過第一驅動構件121的驅動在原料混合容器11的上方以第一驅動構件121的驅動軸(圖中未示出)為基準旋轉。此外,旋轉主體131可以通過如致動器或電動缸等的升降單元進行升降。第二驅動構件122可以通過旋轉的旋轉主體131以第一驅動構件121為基準沿圓周方向移動。The
至少一個原料混合構件132與至少一個第二驅動構件122連接。因此,至少一個原料混合構件132通過至少一個第二驅動構件122旋轉的同時沿旋轉主體131移動。原料混合構件132的數量可以與第二驅動構件122的數量相同。At least one raw
原料混合構件132包括:軸132a,位於原料混合空間111內,並通過與第二驅動件122的驅動軸(圖中未示出)連接來能夠旋轉;及攪拌葉片132b,與軸132a連接,使容納在原料混合空間111中的預聚物和發泡劑混合。原料混合構件132可通過第二驅動件122旋轉,並通過旋轉主體131移動,以混合在原料混合空間111中的預聚物和發泡劑。原料混合構件132可通過第二驅動件122旋轉,並通過旋轉主體131沿著原料混合容器11的圓周方向移動,以混合原料混合空間111中的預聚物和發泡劑。The raw
上述原料混合構件132具有攪拌葉片。攪拌葉片的形式可以是槳式、渦輪式、螺旋槳式、錨式或螺旋式攪拌葉片。將螺旋式攪拌葉片用作攪拌葉片時,有利於提高混合效率。The raw
原料混合部通過適用兩個以上的驅動構件和兩個以上的原料混合構件,從而能夠有效地製備實質上均質化的混合原料。The raw material mixing unit can efficiently prepare substantially homogeneous mixed raw materials by using two or more driving means and two or more raw material mixing means.
在原料混合部中,通過多個旋轉工具操作的原料混合工具在旋轉的同時將原料混合容器內部的混合原料有效地混合並均質化,從而可以製備常規固態粉末形式的固態發泡劑的凝聚現象較少且發泡劑相對均勻分散在液態預聚物中的混合原料。In the raw material mixing section, the raw material mixing tool operated by a plurality of rotating tools effectively mixes and homogenizes the mixed raw material inside the raw material mixing container while rotating, so that the agglomeration phenomenon of a solid blowing agent in the form of a conventional solid powder can be prepared A mixed raw material that is less and the blowing agent is relatively evenly dispersed in the liquid prepolymer.
原料混合部:直通(inline)式Raw material mixing section: straight-through (inline) type
將參照圖6和圖7描述根據另一實施方式的用於製備拋光墊的樹脂組合物混合裝置。A resin composition mixing device for preparing a polishing pad according to another embodiment will be described with reference to FIGS. 6 and 7 .
圖6為示出根據實施方式的用於製備拋光墊的樹脂組合物混合裝置的示意圖,圖7為示出圖6中的均質化部的示意圖。6 is a schematic diagram illustrating a resin composition mixing device for preparing a polishing pad according to an embodiment, and FIG. 7 is a schematic diagram illustrating a homogenization part in FIG. 6 .
參照圖6及圖7,根據實施方式的用於製備拋光墊的樹脂組合物混合裝置2包括原料混合部10、均質化部60、過濾單元20及墊組合物形成部50。Referring to FIGS. 6 and 7 , the resin
根據實施方式的原料混合部10、過濾單元20及墊組合物形成部50與根據圖1至圖5的實施例的原料混合部、過濾單元及墊組合物形成部相同,因此將省略重複說明。The raw
均質化部60位於原料混合部10和過濾單元20之間,將包括凝聚體的混合原料的分散程度,增加到高於經過上述均質化部之前的混合原料的分散程度,並實質上均質化。上述凝聚體的形成方式為,在使混合原料中所含的固態發泡劑和液態預聚物混合的過程中,固態成分在其至少一部分上相互凝聚。The
均質化部60可以包括:均質化外殼61,具備流入口611和排出口612;轉子62,可旋轉地設置在均質化外殼61的內部;及電機63,與均質化外殼61連接並旋轉轉子62。The
轉子62可以在均質化外殼61內部通過電機63進行旋轉的同時,使通過流入口611流入到均質化外殼61中的混合原料流動並粉碎團塊。The
如圖1至圖5所示的實施例中說明的許多特徵可以適用於本實施例。Many of the features described in the embodiments shown in Figures 1 to 5 are applicable to this embodiment.
原料混合部:多混合(polymix)式Raw material mixing part: polymix type
將參照圖8和圖9描述根據又一實施方式的用於製備拋光墊的樹脂組合物混合裝置。A resin composition mixing device for preparing a polishing pad according to still another embodiment will be described with reference to FIGS. 8 and 9 .
圖8為示出根據實施方式的用於製備拋光墊的樹脂組合物混合裝置的示意圖,圖9為示出圖8中的均質化部的示意圖。FIG. 8 is a schematic diagram illustrating a resin composition mixing device for preparing a polishing pad according to an embodiment, and FIG. 9 is a schematic diagram illustrating a homogenization part in FIG. 8 .
根據實施方式的用於製備拋光墊的樹脂組合物混合裝置具有參照圖1至圖5或圖6至圖7描述的實施例的大部分組件。然而,實施方式的均質化部70具有與根據圖6和圖7的實施方式的均質化部不同的結構。A resin composition mixing device for preparing a polishing pad according to an embodiment has most components of the embodiments described with reference to FIGS. 1 to 5 or 6 to 7 . However, the
參照圖8和圖9,根據實施方式的用於製備拋光墊的樹脂組合物混合裝置3的均質化部70包括:均質化外殼71,具備流入口711和排出口712;軸(圖中未示出),與電機(圖中未示出)動力連接,可旋轉地設置在均質化外殼71的內部;及均質化板73,沿著軸的長度方向排列,形成有流動孔731。流動孔731沿均質化板73的圓周方向隔開間隔形成有多個。Referring to Fig. 8 and Fig. 9, the
相鄰的均質化板73可以設置成使得流動孔731彼此錯開定位。均質化板73可以相對於軸以預定角度傾斜,以向排出口712的方向推動通過流入口711流入到均質化外殼71中的混合原料。
通過流入口711流入的混合原料可以在經由旋轉的均質化板73的流動孔731的同時以類似於粉碎的方式被均質化。即,流過均質化外殼71的混合原料中的凝聚體被旋轉的均質化板73粉碎,從而在混合原料中分散並實質上均質化。The mixed raw material flowing in through the
如圖1至圖7所示的實施例中說明的許多特徵可以適用於本實施例。Many of the features described in the embodiment shown in Figures 1 to 7 are applicable to this embodiment.
過濾單元filter unit
過濾單元20可以設置在從原料混合容器11排出的混合原料的移動路徑中。過濾單元20包括用於從混合原料中分離金屬物質的第二過濾器部22。過濾單元20可以包括:第一過濾器部21,根據大小過濾混合原料;及第二過濾器部22,從通過第一過濾器部21的混合原料中分離金屬物質。The
混合原料包括預聚物和發泡劑,作為發泡劑適用固態發泡劑。粉末形式的固態發泡劑可以在混合原料中與液態預聚物混合,而在混合過程中可能會部分發生粉末的凝聚等。第一過濾器部21可以按大小對液態混合原料中以固態存在的發泡劑和其他固態異物進行分類並去除。The mixed raw materials include prepolymer and foaming agent, and solid foaming agent is suitable as the foaming agent. The solid foaming agent in powder form can be mixed with the liquid prepolymer in the mixed raw material, and the powder coagulation and the like may partially occur during the mixing process. The
第一過濾器部21包括:過濾器外殼211,供從原料混合容器11排出的混合原料移動;及過濾器構件212,設置在過濾器外殼211,僅供在通過過濾器外殼211的混合原料中的尺寸小於或等於預定尺寸的混合原料通過。The
在過濾器外殼211的內部設有過濾器構件212,且設置有供混合原料移動的過濾器空間211a。A
過濾器外殼211的上下長度可比左右長度長。混合原料可以沿著過濾器外殼211的左右長度所在的方向移動。The upper and lower lengths of the
過濾器外殼211的左右長度可比上下長度長。混合原料可以沿著過濾器外殼211的上下長度所在的方向移動。The left and right lengths of the
過濾器外殼211可包括入口211b和出口211c,上述入口211b供混合原料流入,上述出口211c供通過過濾器構件212的混合原料排出。The
過濾器外殼211的一側可形成有供混合原料流入的入口211b,另一側可形成有供經由過濾器構件212的混合原料排出的出口211c。One side of the
入口211b和出口211c實質上可以在同一線上彼此面對。The
出口211c可以設置在入口211b的下方。The
過濾器構件212可以包括單個或多個網狀(mesh)構件。The
過濾器構件212位於過濾器外殼211的內部,可以設置成以從入口211b向出口211c方向的混合原料的移動方向為基準時,具有大於0度且等於或小於90度的角度。過濾器構件212位於過濾器外殼211的內部,可以設置成以從入口211b向出口211c方向的混合原料的移動方向為基準時,具有大於45度且等於或小於90度的角度。The
過濾器構件212的外周與過濾器外殼211的內周相接。因此,過濾器構件212和過濾器外殼211的內周之間不會通過混合原料。網狀構件可以由金屬或纖維製成。The outer periphery of the
每個網狀構件具有不同的孔徑。過濾器構件212可以是50目至300目(mesh)的網狀構件。Each mesh member has a different pore size. The
過濾器構件212可以是尺寸不同的網狀構件沿著混合原料的移動方向順序排列而成的。當過濾器構件212包括多個構件時,可以按目數從小到大的順序設置構件。此時,在通過過濾器外殼211的混合原料中凝聚而成的凝聚體,通過網狀構件的同時依次被過濾,因此可以進行有效過濾。The
在混合原料中,尺寸等於或大於預定尺寸的混合原料被去除,只有尺寸小於預定尺寸的混合原料通過第一過濾器部21。Among the mixed raw materials, the mixed raw materials whose size is equal to or larger than the predetermined size are removed, and only the mixed raw materials whose size is smaller than the predetermined size pass through the
在上面將作為第一過濾器部21的過濾器構件212說明為網狀構件,但不限於此。只要可以過濾凝聚成塊狀的過濾物件物的構件,就可以適用各種類型的構件。The
過濾器外殼211可以包括開放孔,可分離的蓋(圖中未示出)設置在上述開放孔。在蓋分離的狀態下,過濾器構件212可以通過開放孔從過濾器外殼211分離。因此,能夠去除夾在過濾器構件212上的塊狀的混合原料。The
第二過濾器部22包括:過濾器外殼221,供混合原料通過;支架222,設置在過濾器外殼211內部,與經由的混合原料接觸;及磁體223,設置在支架222內部,產生磁力。The
由磁體223產生的磁力使封裝在混合原料中的金屬物質黏附到支架222的外周並被去除,去除金屬物質的混合原料在後續過程中製成拋光墊時,可以減少晶圓的損傷。The magnetic force generated by the
在過濾器外殼221的內部設有支架222,且設置有供混合原料通過的過濾器空間221a。A
混合原料可以是已通過第一過濾器部21的。The mixed raw material may have passed through the
混合原料可以是已通過原料混合部10的。The mixed raw material may have passed through the raw
過濾器外殼211的上下長度可以比左右長度長。混合原料可以沿著過濾器外殼211的左右長度所在的方向移動。The upper and lower lengths of the
過濾器外殼211的左右長度可以比上下長度長。混合原料可以沿著過濾器外殼211的上下長度所在的方向移動。The left and right lengths of the
在過濾器外殼211可形成有入口211b和出口211c,上述入口211b供混合原料流入,上述出口211c供經由過濾器構件212的混合原料排出。The
過濾器外殼221的下側可形成有供混合原料流入的入口221b。The lower side of the
入口221b在接線方向上連接到過濾器外殼221的內周。另外,在過濾器外殼221的上側形成有用於排出通過過濾器空間221a的混合原料的出口221c。排出到上述出口的混合原料是實質上去除金屬物質的混合原料。當從正面觀察過濾器外殼211時,入口221b和出口221c可以隔著支架222在對角線上彼此相對。The
從原料混合部10或第一過濾器部21排出並通過入口221b沿接線方向流入到過濾器外殼221的內部的混合原料,在與支架222相接的同時引起湍流,整體上成為迴旋流動,向出口221c方向呈螺旋狀移動,排出到第二過濾器部22的外部。The mixed raw material discharged from the raw
支架222設置在過濾器外殼221的內部。The
支架222可以沿上下方向設置在過濾器外殼221的內部。The
支架222可以沿左右方向設置在過濾器外殼221的內部。The
可以設置多個支架222。示例性地,可以設置兩個或更多個支架222,或可以設置兩個至九個支架222。
支架222的外周可以與移動的混合原料接觸而形成湍流。The outer perimeter of the
為了增加混合原料與支架222的接觸力,支架222的長度所在的方向可以與混合原料的迴旋流動方向形成一定的角度,例如,上述角度可以大於0度且小於或等於90度,或可以為約45度至約90度,或可以為實質上直角。支架222的內部可以具有容納空間,且是空的。In order to increase the contact force between the mixed raw material and the
在過濾器外殼221中可以形成開放孔,開放孔可以通過可分離的蓋224打開和關閉。An open hole may be formed in the
支架222可以連接到蓋224。因此,當蓋224被分離時,支架222可以被拉出到過濾器外殼221的外部。
支架222可以直接設置在過濾器外殼221。The
支架222的設置位置可以根據用於製備拋光墊的樹脂組合物混合裝置的設計而進行各種變更。The installation position of the
磁體223可以是順磁體和/或電磁體。The
磁體可以是釹(Neodymium)磁體。磁體可以具有10000高斯(Gauss)至12000高斯的磁力。磁體223可以位於每個支架222中並可分離地設置在內部。The magnets may be Neodymium magnets. The magnet may have a magnetic force of 10000 Gauss to 12000 Gauss. A
通過過濾器空間221a的混合原料可以不與磁體223直接接觸。通過設置磁體223,在支架222周圍,即,在過濾器空間221a中可形成磁力。在過濾器空間221a中迴旋流動的混合原料中混合的金屬物質可以通過磁體223的磁力附著到支架222的外周。因此,可以從通過過濾器外殼221的混合原料分離金屬物質。分離金屬物質的混合原料通過出口211c排出到第二過濾器部22的外部。The mixed raw material passing through the
在分離金屬物質之後,支架222可以從過濾器外殼221分離,並且磁體223可以從支架222分離。由於磁鐵223的分離,支架222的周邊的磁力消失,通過磁力附著於支架222的外周的金屬物質從支架222的外周脫落。因此,容易進行金屬物質去除工作。After separating the metallic substance, the
沿支架222的外周可以設置有刮刀(CORNE,圖中未示出),上述刮刀可以沿著支架222的縱向進行移動。附著在支架222上的金屬物質可以通過刮刀的移動被去除。可以在磁體223從支架222分離的狀態下允許刮刀的移動,並且可以在磁體223設置在支架222上的狀態下允許刮刀的移動。A scraper (CORNE, not shown in the figure) may be provided along the outer periphery of the
由於形成磁力的第二過濾器部22位於第一過濾器部21的後方,因此在第一過濾器部21的網狀構件分離的金屬物質也能夠在第二過濾器部22被分離。因此,形成磁力的第二過濾器部22位於第一過濾器部21的後方,則可以提高根據金屬物質分離的效率。Since the
然而,雖然在上述說明中假設從原料混合容器11排出的混合原料通過第一過濾器部21後通過第二過濾器部22,但第二過濾器部22也可以設置在第一過濾器部21之前,使得從原料混合容器11排出的混合原料通過第二過濾器部22以分離金屬物質後,通過第一過濾器部21以根據尺寸被過濾。However, although it is assumed in the above description that the mixed raw material discharged from the raw
混合原料在通過過濾單元的同時經過物理過濾和/或磁力過濾,從而在固態物的尺寸為預定尺寸以上時去除上述固態物,並去除金屬物質,從而可以製備經過過濾的混合原料,上述固態物因發泡劑等凝聚或不完全均質化而形成。The mixed raw material is physically filtered and/or magnetically filtered while passing through the filter unit, thereby removing the above-mentioned solid matter when the size of the solid matter is larger than a predetermined size, and removing the metal substance, so that the filtered mixed raw material can be prepared, and the above-mentioned solid matter Formed by condensation or incomplete homogenization of foaming agents, etc.
通過在可固化混合物中包含過濾後的混合原料,從而可以製備異物混入實質上最小化且相對均勻的可固化混合物。By including filtered mixed raw materials in the curable mixture, it is possible to prepare a relatively uniform curable mixture in which foreign matter is substantially minimized.
另一方面,根據本實施例的用於製備拋光墊的樹脂組合物混合裝置還可以包括儲存部30,該儲存部30儲存有混合原料,該混合原料通過過濾單元20在保持預定尺寸以下的尺寸,同時其中的金屬物質被去除。儲存部30可包括能夠阻止異物流入並保護混合原料免受外部因素的儲存槽、容器、罐(tank)等。On the other hand, the resin composition mixing device for preparing a polishing pad according to the present embodiment may further include a
墊組合物形成部Mat composition forming part
墊組合物形成部50與上述過濾單元20連接,以製備包括過濾後的混合原料和固化劑的可固化混合物。The pad
墊組合物形成部50包括:混合容器51,設置有組合物混合空間511;以及混合構件52,設置在組合物混合容器51中。The pad
組合物混合容器51可以通過管道與過濾單元20以及固化劑供應部40連接。組合物混合容器51可以通過管道與儲存部30以及固化劑供應部40連接。The
可以在過濾單元20、儲存部30及固化劑供應部40中設置泵或鼓風機。通過泵或鼓風機的操作,可以將過濾後的混合物原料和固化劑供應到組合物混合容器51的組合物混合空間511。並且,在組合物混合容器51形成有供混合後的可固化混合物排出的排出口(圖中未示出)。A pump or a blower may be provided in the
固化劑可以包括選自由芳香胺、脂肪胺、芳香醇及脂肪醇組成的組中的一種以上。The curing agent may include one or more selected from the group consisting of aromatic amines, aliphatic amines, aromatic alcohols, and aliphatic alcohols.
例如,固化劑可以是選自由4,4'-亞甲基雙(2-氯苯胺)(MOCA)、二乙基甲苯二胺(diethyltoluenediamine)、二氨基二苯基甲烷(diaminodiphenyl methane)、二氨基二苯碸(diaminodiphenyl sulphone)、間苯二甲胺(m-xylylene diamine)、異佛爾酮二胺(isophoronediamine)、乙二胺(ethylenediamine)、二乙烯三胺(diethylenetriamine)、三乙烯四胺(triethylenetetramine)、聚丙烯二胺(polypropylenediamine)、聚丙烯三胺(polypropylenetriamine)、乙二醇(ethyleneglycol)、二甘醇(diethyleneglycol)、二丙二醇(dipropyleneglycol)、丁二醇(butanediol)、己二醇(hexanediol)、甘油(glycerine)、三羥甲基丙烷(trimethylolpropane)及雙(4-氨基-3-氯苯基)甲烷(bis(4-amino-3-chlorophenyl)methane)組成的組中的一種以上。For example, the curing agent can be selected from 4,4'-methylenebis(2-chloroaniline) (MOCA), diethyltoluenediamine, diaminodiphenylmethane, diamino Diaminodiphenyl sulphone, m-xylylene diamine, isophoronediamine, ethylenediamine, diethylenetriamine, triethylenetetramine ( triethylenenetetramine), polypropylenediamine, polypropylenetriamine, ethyleneglycol, diethyleneglycol, dipropyleneglycol, butanediol, hexanediol ( Hexanediol), glycerine (glycerine), trimethylolpropane (trimethylolpropane) and bis (4-amino-3-chlorophenyl) methane (bis (4-amino-3-chlorophenyl) methane) group consisting of one or more .
基於100重量份的聚氨酯類預聚物,固化劑的含量可以為1重量份至40重量份、10重量份至30重量份或20重量份至30重量份。Based on 100 parts by weight of the polyurethane prepolymer, the content of the curing agent may be 1 to 40 parts by weight, 10 to 30 parts by weight or 20 to 30 parts by weight.
根據需要,可固化混合物還可以包含反應速率調節劑。The curable mixture may also contain reaction rate modifiers, as desired.
反應速率調節劑可以是反應促進劑或反應緩凝劑。The reaction rate regulator can be a reaction accelerator or a reaction retarder.
例如,上述反應速率調節劑可以包括選自由三乙烯二胺(triethylene diamine,TEDA)、二甲基乙醇胺(dimethyl ethanol amine,DMEA)、四甲基丁烷二胺(tetramethyl butane diamine,TMBDA)、2-甲基三乙烯二胺(2-methyl-triethylene diamine)、二甲基環己基胺(dimethyl cyclohexyl amine,DMCHA)、三乙胺(triethyl amine,TEA)、三異丙醇胺(triisopropanol amine,TIPA)、1,4-二氮雜雙環(2,2,2)辛烷(1,4-diazabicyclo(2,2,2)octane)、雙(2-甲基氨基乙基)醚(bis(2-methylaminoethyl)ether)、三甲氨基乙醇胺(trimethylaminoethylethanol amine)、N,N,N,N,N''-五甲基二乙烯三胺(N,N,N,N,N''-pentamethyldiethylene triamine)、二甲基胺基乙胺(dimethylaminoethyl amine)、二甲基氨基丙胺(dimethylaminopropyl amine)、苄基二甲基胺(benzyldimethyl amine)、N-乙基嗎啉(N-ethylmorpholine)、N,N-二甲基氨基乙基嗎啉(N,N dimethyl aminoethylmorpholine)、N,N-二甲基環己基胺(N,N-dimethylcyclohexyl amine)、2-甲基-2-氮雜硼烷(2-methyl-2-azanorbornane)、二月桂酸二丁基錫(dibutyltin dilaurate)、辛酸亞錫(stannous octoate)、二乙酸二丁基錫(dibutyltin diacetate)、二乙酸二辛酯(diocthyltin diacetate)、馬來酸二丁基錫(dibutyltin maleate)、二丁基二異辛酸錫(dibutyltin di-2-ethylhexanoate)及二丁基二硫醇錫(dibutyltin dimercaptide)組成的組中的一種以上。具體而言,上述反應速率調節劑可以是選自由苄基二甲基胺、N,N-二甲基環己基胺及三乙胺組成的組中的一種以上。For example, the above-mentioned reaction rate regulator may include triethylene diamine (triethylene diamine, TEDA), dimethyl ethanol amine (dimethyl ethanol amine, DMEA), tetramethyl butane diamine (tetramethyl butane diamine, TMBDA), 2 -Methyl-triethylene diamine (2-methyl-triethylene diamine), dimethyl cyclohexyl amine (dimethyl cyclohexyl amine, DMCHA), triethyl amine (triethyl amine, TEA), triisopropanol amine (triisopropanol amine, TIPA ), 1,4-diazabicyclo (2,2,2) octane (1,4-diazabicyclo (2,2,2) octane), bis (2-methylaminoethyl) ether (bis (2 -methylaminoethyl) ether), trimethylaminoethylenethanol amine, N,N,N,N,N''-pentamethyldiethylene triamine (N,N,N,N,N''-pentamethyldiethylene triamine), Dimethylaminoethylamine, dimethylaminopropylamine, benzyldimethylamine, N-ethylmorpholine, N,N-di Methylaminoethylmorpholine (N,N dimethyl aminoethylmorpholine), N,N-dimethylcyclohexylamine (N,N-dimethylcyclohexyl amine), 2-methyl-2-azaborine (2-methyl- 2-azanorbornane), dibutyltin dilaurate, stannous octoate, dibutyltin diacetate, dioctyltin diacetate, dibutyltin maleate ), dibutyltin di-2-ethylhexanoate and dibutyltin dimercaptide. Specifically, the reaction rate regulator may be one or more selected from the group consisting of benzyldimethylamine, N,N-dimethylcyclohexylamine, and triethylamine.
基於100重量份的聚氨酯類預聚物,上述反應速率調節劑的含量可以為0.1重量份至2重量份。Based on 100 parts by weight of the polyurethane prepolymer, the content of the above-mentioned reaction rate modifier may be 0.1 to 2 parts by weight.
可固化混合物可具有500g/mol至3000g/mol的重均分子量。The curable mixture may have a weight average molecular weight of 500 g/mol to 3000 g/mol.
可固化混合物是聚氨酯樹脂,可以具有600g/mol至2000g/mol或700g/mol至1500g/mol的重均分子量(Mw)。The curable mixture is a polyurethane resin, which may have a weight average molecular weight (Mw) of 600 g/mol to 2000 g/mol or 700 g/mol to 1500 g/mol.
可固化混合物的膠凝化時間可以為30秒至300秒,或可以為70秒至180秒。可固化混合物的膠凝化時間可以為90秒至110秒。在這種情況下,可以製備工作性更良好的可固化混合物。The gel time of the curable mixture may be from 30 seconds to 300 seconds, or may be from 70 seconds to 180 seconds. The gel time of the curable mixture may be 90 seconds to 110 seconds. In this case, a more workable curable mixture can be prepared.
組合物混合構件52包括:組合物混合容器51的電機521;軸522,可位於組合物混合容器51的內部且與電機521的驅動軸連接;及攪拌葉片523,在組合物混合容器51的內部與軸522連接,將容納在原料混合空間中的混合原料和固化劑混合。電機521可以設置在外部,並以預定的旋轉力使軸522旋轉。Composition mixing member 52 comprises: the
攪拌葉片523通過軸522在組合物混合容器51的內部旋轉預定時間,並混合過濾後的混合原料和固化劑,以製備可固化混合物。The
組合物混合構件52可以與致動器、電動缸等的升降裝置(圖中未示出)連接。組合物混合構件52可以在組合物混合容器51中進行升降,並且攪拌葉片523可以從組合物混合容器51的內部向外部脫離。The composition mixing member 52 may be connected with a lifting device (not shown in the figure) of an actuator, an electric cylinder, or the like. The composition mixing member 52 can be raised and lowered in the
在原料混合部中,由多個旋轉工具操作的原料混合工具在原料混合容器中整體移動,以均勻混合預聚物和發泡劑。因此,可以獲得實質上均勻的混合物。In the raw material mixing section, the raw material mixing tool operated by a plurality of rotating tools moves integrally in the raw material mixing container to uniformly mix the prepolymer and the blowing agent. Therefore, a substantially homogeneous mixture can be obtained.
隨著混合原料通過過濾單元,達到保持不包括預定尺寸以上的固態物並去除金屬物質的狀態,即,獲得過濾後的混合原料。在墊組合物形成部的組合物混合容器中,通過組合物混合構件混合過濾後的混合原料和固化劑,製備實質上均勻的可固化混合物,並且可固化混合物可形成拋光墊,以提高拋光墊本身的品質,使利用該拋光墊進行拋光的被拋光物體的劃痕等缺陷發生最小化。As the mixed raw material passes through the filtering unit, a state of keeping solid matter above a predetermined size and removing metal substances is achieved, that is, a filtered mixed raw material is obtained. In the composition mixing container of the pad composition forming part, the filtered mixed raw material and curing agent are mixed by the composition mixing member to prepare a substantially uniform curable mixture, and the curable mixture can form a polishing pad to improve the polishing pad The quality of itself minimizes the occurrence of defects such as scratches on the polished object polished by the polishing pad.
拋光墊的製備方法Preparation method of polishing pad
根據另一實施方式的拋光墊的製備方法包括過濾步驟、可固化混合步驟及成型步驟。拋光墊的製備方法,在成型步驟之後,還可以包括墊化步驟。A method of preparing a polishing pad according to another embodiment includes a filtering step, a curable mixing step, and a molding step. The method for preparing the polishing pad may further include a padding step after the shaping step.
過濾步驟是通過對包含預聚物和發泡劑的混合原料進行過濾以製備過濾後的混合原料的步驟。The filtering step is a step of preparing a filtered mixed raw material by filtering a mixed raw material including a prepolymer and a blowing agent.
由於關於預聚物、發泡劑及混合原料的具體說明與上述說明重複,因此將省略其記載。此外,過濾過程可以通過使上述混合原料通過上述過濾單元來進行。Since the specific description about the prepolymer, foaming agent, and mixed raw material overlaps with the above description, description thereof will be omitted. In addition, the filtration process may be performed by passing the above-mentioned mixed raw material through the above-mentioned filtration unit.
在上述過濾過程中,可以同時或分開進行物理過濾過程和磁過濾過程。可以按順序進行物理過濾過程和磁過濾過程。In the above filtering process, the physical filtering process and the magnetic filtering process may be performed simultaneously or separately. The physical filtration process and the magnetic filtration process may be performed in sequence.
可固化混合步驟是製備包含上述過濾後的混合原料和固化劑的可固化混合物的步驟。The curable mixing step is a step of preparing a curable mixture comprising the above-mentioned filtered mixed raw material and a curing agent.
由於關於固化劑和其他添加物的具體說明與上述說明重複,因此將省略詳細說明。Since specific descriptions about the curing agent and other additives are repeated with the above description, detailed descriptions will be omitted.
可使用在上面說明的墊組合物形成部進行可固化混合物的混合過程。在這種情況下,能夠更有效地混合可固化混合物。The mixing process of the curable mixture may be performed using the mat composition forming part explained above. In this case, the curable mixture can be mixed more efficiently.
成型步驟是將上述可固化混合物放入模具並製備成型體的步驟。The molding step is a step of putting the above curable mixture into a mold and preparing a molded body.
上述模具(圖中未示出)可以包括能夠形成具有一定厚度和形狀的成型體的模具,由該模具形成的成型體可以單獨作為拋光層適用,也可以在經過額外形狀加工之後作為拋光層適用。The above-mentioned mold (not shown in the figure) may include a mold capable of forming a molded body with a certain thickness and shape, and the molded body formed by the mold can be used as a polishing layer alone, or as a polishing layer after additional shape processing .
在成型步驟中,可以添加非活性氣體。可將非活性氣體添加到可固化混合物的反應過程中,以在成型體中形成孔。During the molding step, an inert gas may be added. A non-reactive gas can be added during the reaction of the curable mixture to form pores in the shaped body.
只要不參與預聚物與固化劑之間的反應,就對非活性氣體的種類沒有特別限定。例如,非活性氣體可以是選自由氮氣(N 2)、氬氣(Ar)及氦氣(He)組成的組中的一種以上。 The type of inert gas is not particularly limited as long as it does not participate in the reaction between the prepolymer and the curing agent. For example, the inert gas may be one or more selected from the group consisting of nitrogen (N 2 ), argon (Ar), and helium (He).
基於可固化混合物的總體積,非活性氣體的添加量可以為20體積%至35體積%。基於可固化混合物的總體積,非活性氣體的添加量可以為20體積%至30體積%。The non-reactive gas may be added in an amount of 20% to 35% by volume based on the total volume of the curable mixture. The inert gas may be added in an amount of 20% to 30% by volume based on the total volume of the curable mixture.
在上述成型步驟之後,還可以包括包裝步驟。After the above molding step, a packaging step may also be included.
包裝步驟是包裝成型體的步驟。在進行化學機械拋光之前,可以將上述成型體或拋光層通過自動方式以單位數量包裝並儲存或運輸。The packaging step is a step of packaging the molded body. Before chemical mechanical polishing, the above-mentioned shaped body or polishing layer can be packaged in unit quantities by automatic means and stored or transported.
墊化步驟是製備拋光墊的步驟,上述拋光墊包括上述成型體的至少一部分作為拋光層。The padding step is a step of preparing a polishing pad including at least a part of the above-mentioned molded body as a polishing layer.
拋光墊包括拋光層作為頂墊。The polishing pad includes a polishing layer as a top pad.
拋光層的平均孔尺寸可以為10um至30um。當適用具有上述平均孔尺寸的拋光層時,有利於提高拋光墊的拋光效率。The average pore size of the polishing layer may be 10um to 30um. When the polishing layer having the above-mentioned average pore size is used, it is beneficial to improve the polishing efficiency of the polishing pad.
拋光層可以是具有36%至44%的面積率的泡沫體形式的聚氨酯。The polishing layer may be polyurethane in the form of a foam having an area ratio of 36% to 44%.
拋光層可以是每單位面積(0.3cm 2)孔數為350個至500個的泡沫體形式的聚氨酯。 The polishing layer may be polyurethane in the form of a foam having 350 to 500 cells per unit area (0.3 cm 2 ).
當具有這些特性的泡沫體形式的聚氨酯拋光層用作頂墊時,可以進行有效的晶圓拋光。Effective wafer polishing is possible when a polyurethane polishing layer in the form of a foam with these properties is used as a top pad.
作為拋光層,可以適用肖氏D硬度為50至65的拋光層,在這種情況下,可以提高拋光效率。As the polishing layer, a polishing layer having a Shore D hardness of 50 to 65 can be used, and in this case, the polishing efficiency can be improved.
作為拋光層,可以適用抗拉強度為15N/mm 2至35N/mm 2的拋光層,在這種情況下,可以進一步提高拋光效率。 As the polishing layer, a polishing layer having a tensile strength of 15N/mm 2 to 35N/mm 2 can be applied, and in this case, the polishing efficiency can be further improved.
作為拋光層,可以適用伸長率為110%至230%的拋光層,在這種情況下,可以進一步提高拋光效率。As the polishing layer, a polishing layer having an elongation of 110% to 230% can be used, and in this case, the polishing efficiency can be further improved.
作為拋光層,可以適用厚度為1.5mm至3mm的拋光層,在這種情況下,可以提高拋光效率。As the polishing layer, a polishing layer having a thickness of 1.5 mm to 3 mm can be used, and in this case, polishing efficiency can be improved.
泡沫體形式的拋光層包括多個孔,孔的平均尺寸可為約30um以下,且可為約15um至約25um。The polishing layer in the form of a foam includes a plurality of pores, which may have an average size of about 30 um or less, and may range from about 15 um to about 25 um.
通過泡沫體形式的拋光層進行拋光的被拋光物體,具有低缺陷特性,即,以被拋光物體的整個拋光表面為基準,具有3個以下的缺陷和1個以下的劃痕。An object to be polished that is polished by a polishing layer in the form of a foam has low-defect characteristics, that is, has 3 or less defects and 1 or less scratches based on the entire polished surface of the object to be polished.
拋光墊還可包括位於頂墊下方的子墊。The polishing pad may also include a subpad located below the top pad.
子墊可以是絨面革類型或非織造類型。The subpad can be of suede type or non-woven type.
子墊可具有60至90的Asker C硬度。The subpad may have an Asker C hardness of 60 to 90.
子墊的厚度可以為0.5mm至1mm。The thickness of the subpad may be 0.5 mm to 1 mm.
黏接層可以設置在頂墊(拋光層)和子墊之間。A bonding layer may be provided between the top pad (polish layer) and the subpad.
頂墊(拋光層)和子墊可以通過熱熔黏接層附著。The top pad (polish layer) and subpad can be attached by a hot melt adhesive layer.
可將橡膠類黏接劑適用於子墊的另一面。A rubber-based adhesive can be applied to the other side of the subpad.
橡膠類黏接劑的另一面上可設有如PET膜等的薄膜。上述膜上還可設有其他橡膠類黏接劑層。The other side of the rubber adhesive may be provided with a thin film such as a PET film. The film may also be provided with other rubber-based adhesive layers.
子墊的另一面可以通過橡膠類黏接劑黏附到拋光裝置的平臺上。The other side of the subpad can be adhered to the platform of the polishing device by a rubber-like adhesive.
根據實施方案製備的拋光墊可通過提高預聚物和發泡劑的分散度而實質上抑制固態發泡劑的凝聚現象,並且可提高拋光墊製備的穩定性。此外,在適用拋光墊進行拋光時,易於確保漿料顆粒的儲存穩定性和微流動性,因此可實現更高品質的拋光。The polishing pad prepared according to the embodiment can substantially suppress the coagulation phenomenon of the solid foaming agent by increasing the dispersion degree of the prepolymer and the foaming agent, and can improve the stability of polishing pad preparation. In addition, when polishing is performed using a polishing pad, storage stability and microfluidity of slurry particles can be easily ensured, so higher-quality polishing can be achieved.
固態體發泡劑的分級純化Fractional Purification of Solid Foaming Agent
固態發泡劑可以是通過其分級純化方法進行分級純化的。The solid foaming agent may be fractionally purified by its fractional purification method.
分級純化可以通過分級純化方法來進行,包括分級步驟和過濾步驟的固態發泡劑。Fractional purification can be carried out by a fractional purification method comprising a solid foaming agent in a fractionation step and a filtration step.
分級步驟是根據固態泡沫體的下降速度劃分成第一微球體和第二微球體的步驟,上述下降速度借助供應於分級空間中的流動氣體而上升。The classification step is a step of dividing the solid foam into first microspheres and second microspheres according to the descending speed which is raised by the flowing gas supplied in the classifying space.
流動氣體可以是乾燥空氣或氮氣,上述第一微球體的水分率可以為3重量%以下。The flowing gas may be dry air or nitrogen, and the moisture content of the first microspheres may be 3% by weight or less.
過濾步驟是製備經過分級純化的固態發泡劑的步驟,上述固態發泡劑通過上述第一微球體在通過過濾器部的同時通過磁性過濾器與金屬物質分離並純化。The filtering step is a step of preparing a fractionated and purified solid blowing agent which is separated and purified from metal substances by a magnetic filter while passing through the filter section through the first microspheres.
當將通過分級步驟控制水分率並被分級為具有在一定範圍內的尺寸和/或重量的第一微球體作為上述固態發泡劑時,能夠更順利控制拋光層的孔的尺寸和分佈,且金屬異物也通過磁過濾器被去除,因此可以進一步提高拋光品質。When the first microspheres whose moisture content is controlled through the classification step and are classified to have a size and/or weight within a certain range are used as the above-mentioned solid foaming agent, the size and distribution of pores of the polishing layer can be more smoothly controlled, and Metallic foreign matter is also removed by the magnetic filter, so the polishing quality can be further improved.
固態發泡劑分級純化裝置包括:分級部,用於將供應的固態發泡劑分級為第一微球體和第二微球體;儲存部,與上述分級部連接,供所分級的上述第一微球體流入、儲存並排出;及過濾器部,設置在上述固態發泡劑或第一微球體的移動路徑,以從包括上述固態發泡劑或上述第一微球體的過濾物件分離金屬物質。The solid foaming agent classification and purification device includes: a classification part, which is used to classify the supplied solid foaming agent into first microspheres and second microspheres; a storage part, connected to the above-mentioned classification part, for the classified first microspheres spheres flow in, store and discharge; and a filter part is provided in the moving path of the above-mentioned solid foaming agent or the first microspheres to separate metal substances from the filtering material including the above-mentioned solid foaming agent or the above-mentioned first microspheres.
上述過濾器部可以包括:過濾器外殼,內部形成有供上述固態發泡劑或上述第一微球體經由的過濾器空間;過濾器蓋,可分離地設置在上述過濾器外殼,以打開或關閉上述過濾器空間;及過濾器構件,設置在上述過濾器空間,產生磁力。The above-mentioned filter part may include: a filter housing, inside which is formed a filter space for the above-mentioned solid foaming agent or the above-mentioned first microsphere to pass through; a filter cover, which is detachably arranged on the above-mentioned filter housing to open or close The filter space; and a filter member disposed in the filter space and generating magnetic force.
上述金屬物質通過上述磁力附著到上述過濾器構件。The above-mentioned metal substance is attached to the above-mentioned filter member by the above-mentioned magnetic force.
上述過濾器構件可包括:支架,位於上述過濾空間中;以及磁體,設置在上述支架。The above-mentioned filter member may include: a holder located in the above-mentioned filtering space; and a magnet provided on the above-mentioned holder.
上述金屬物質可以附著到上述支架,以從上述過濾物件移除。The metal substance can be attached to the bracket to be removed from the filter element.
上述過濾器外殼中,形成有與上述過濾器空間連接的過濾器流入口,並且上述過濾器流入口可以在上述過濾器外殼的下部與上述過濾器空間的周長沿接線方向連接到。In the filter housing, a filter inlet connected to the filter space is formed, and the filter inlet may be connected to the periphery of the filter space at the lower portion of the filter housing in a wiring direction.
在上述過濾器空間中,上述過濾物件可以在與上述過濾器構件相接的同時產生渦流並移動。In the filter space, the filter material may move while being in contact with the filter member while generating a vortex.
上述過濾器外殼或上述過濾器蓋上可以形成有過濾器排出口,上述過濾器排出口與上述過濾器空間連接,供已去除金屬物質的過濾物件排出。A filter discharge port may be formed on the filter housing or the filter cover, and the filter discharge port is connected to the filter space for discharging the filter objects from which metal substances have been removed.
上述過濾器蓋可以設置在上述過濾器外殼的開方面,上述過濾器排出口可以形成在上述過濾器蓋。The said filter cover may be provided in the open side of the said filter case, and the said filter discharge port may be formed in the said filter cover.
上述過濾物件可以在上述過濾器空間中與上述過濾器構件相接的同時逐漸上升,並通過上述過濾器排出口排出到上述過濾器外殼的外部。The filter material may gradually rise while being in contact with the filter member in the filter space, and may be discharged to the outside of the filter case through the filter outlet.
上述固態發泡劑可以具有100kg/m 3以下的密度。 The aforementioned solid foaming agent may have a density of 100 kg/m 3 or less.
以下,將對具體實施例進行更詳細的說明。以下實施例僅是用於幫助理解本發明的示例,本發明的範圍不限於此。Hereinafter, specific examples will be described in more detail. The following examples are merely examples to help understanding of the present invention, and the scope of the present invention is not limited thereto.
製備例Preparation example
1.固態發泡劑的分級1. Grading of solid blowing agent
通過分級純化方法,對未經分級的固態發泡劑(Expancel,平均粒徑:5.5um,水分率:3.5%,密度:47.2kg/m 3)進行分級。 The unclassified solid blowing agent (Expancel, average particle size: 5.5um, moisture content: 3.5%, density: 47.2kg/m 3 ) was classified by the method of classification purification.
作為樣品1,為僅進行分級而未適用磁性過濾器的發泡劑,而作為樣品2、樣品3及樣品4為在氮氣下進行分級和純化之後回收的發泡劑。
將磁性過濾器(磁力:10000G)設置在分級部的後端儲存部和分級部之間來進行實驗。通過操作設置在裝置中的振動轉子進行振動旋轉,並以10Hz至100Hz施加振動。是否適用如下述表1所示。The experiment was performed by installing a magnetic filter (magnetic force: 10000G) between the storage unit at the rear end of the classification unit and the classification unit. Vibration rotation is performed by operating a vibration rotor provided in the device, and vibration is applied at 10 Hz to 100 Hz. Applicability is shown in Table 1 below.
通過使用HX204(梅特勒托利多(Mettler Toledo)科技有限公司),計量1g至3g的每個樣品,並在120℃的溫度下加熱1分30秒,以確認重量的增減來測量水分率。Moisture content was measured by measuring 1 g to 3 g of each sample using HX204 (Mettler Toledo Technology Co., Ltd.), and heating at 120°C for 1 minute and 30 seconds to confirm the increase or decrease in weight .
使用AccuPyc 1340(美國麥克(Micromeritics)公司)在10cc單元中放入樣品,測量重量後測量密度。A sample was placed in a 10 cc cell using AccuPyc 1340 (Micromeritics, USA), and the density was measured after measuring the weight.
通過S3500+(美國麥奇克(Microtrac)公司)將樣品分散在乙醇溶劑中來測量平均細微性。Average fineness was measured by dispersing the sample in ethanol solvent by S3500+ (Microtrac, USA).
表1
參照上述表1確認到,與樣品1相比,樣品2、樣品3及樣品4在工序後水分率都下降,就平均細微性或密度而言,經過純化和分級的實施例具有更低的值。Referring to the above Table 1, it was confirmed that compared with
至於金屬去除率,樣品3和樣品4的通過適用磁性過濾器去除的金屬去除率分別為98mg/Kg和106mg/Kg,從而可確認通過磁性過濾器能夠去除相當大量的金屬異物。As for the metal removal rate,
2.拋光層的製備2. Preparation of polishing layer
將聚氨酯類預聚物(NCO為9.1重量%,重均分子量為1200g/mol)和在上面進行分級的固態發泡劑放入原料混合部中,在以如下述表2所示的轉速(rpm)旋轉第一驅動工具和第二驅動工具的同時進行混合,從而製備混合原料。Put the polyurethane prepolymer (NCO is 9.1% by weight, and the weight average molecular weight is 1200g/mol) and the solid foaming agent classified above into the raw material mixing part, and at the speed (rpm) shown in the following table 2 ) mixing while rotating the first driving tool and the second driving tool, thereby preparing a mixed raw material.
作為混合原料,根據樣品以順次經過或不經過70目(間隙大小為250um)的網孔過濾器和磁性過濾器的方式製備混合原料。As a mixed raw material, according to the sample, the mixed raw material is prepared by passing through a 70-mesh (gap size of 250um) mesh filter and a magnetic filter in sequence.
固化劑(雙(4-氨基-3-氯苯基)甲烷)、非活性氣體(N 2)、反應速率調節劑(叔胺類化合物)等添加到墊組合物形成部並混合以製備可固化混合物。 Curing agent (bis(4-amino-3-chlorophenyl)methane), inert gas (N 2 ), reaction rate regulator (tertiary amine compound), etc. are added to the pad composition forming part and mixed to prepare curable mixture.
作為上述固態發泡劑,基於100重量份的聚氨酯類預聚物,適用2重量份的如下述表2所示的固態發泡劑。將上述可固化混合物混合後,注入模具(寬度為1000mm、長度為1000mm、高度為3mm),得到成型體。經過用平面研磨機研磨上述成型體並使用尖端開槽的過程,分別製備平均厚度為2mm的拋光層。As the solid foaming agent, 2 parts by weight of the solid foaming agent shown in Table 2 below was used based on 100 parts by weight of the polyurethane prepolymer. After mixing the aforementioned curable mixture, it was poured into a mold (1000 mm in width, 1000 mm in length, and 3 mm in height) to obtain a molded body. Polishing layers having an average thickness of 2 mm were respectively prepared through a process of grinding the above molded body with a flat grinder and notching using a tip.
表2
將上述拋光層分別附著在厚度為1.1mm、硬度(Shore C)為70的無紡布類型子墊上以製備拋光墊。上述拋光墊適用於以下的評價例。The above polishing layers were respectively attached to nonwoven fabric type subpads having a thickness of 1.1 mm and a hardness (Shore C) of 70 to prepare polishing pads. The above-mentioned polishing pad was applied to the following evaluation examples.
評估例Evaluation example
1.拋光層的物理性能測量1. Physical property measurement of polishing layer
硬度:測量肖氏D硬度,將拋光墊切割成2cm×2cm(厚度:2mm)的尺寸,並在23±2℃的溫度和50±5%的濕度下靜置16小時。之後,使用硬度計(D型硬度計)測量拋光墊的硬度。Hardness: To measure the Shore D hardness, cut the polishing pad into a size of 2cm×2cm (thickness: 2mm), and let it stand for 16 hours at a temperature of 23±2°C and a humidity of 50±5%. After that, the hardness of the polishing pad was measured using a durometer (D-type durometer).
密度:將拋光墊切割成4cm×8.5cm的直角四邊形(厚度:2mm)的尺寸,並在23±2℃的溫度和50±5%的濕度下靜置16小時。使用密度計測量拋光墊的密度。Density: Cut the polishing pad into a rectangular quadrilateral (thickness: 2mm) size of 4cm×8.5cm, and let it stand for 16 hours at a temperature of 23±2°C and a humidity of 50±5%. Use a density meter to measure the density of the polishing pad.
拉伸性能:作為實驗樣品,在墊中取寬度為150mm,長度為10mm的5個部位,使用JIS B 7721拉伸試驗機測量拉伸強度和伸長率。Tensile property: As an experimental sample, 5 parts with a width of 150 mm and a length of 10 mm were taken in the mat, and the tensile strength and elongation were measured using a JIS B 7721 tensile testing machine.
2.孔的物理性能測量2. Measurement of physical properties of pores
孔平均粒徑:將拋光墊切割成2cm×2cm的正四邊形(厚度:2mm)的尺寸,並使用掃描電子顯微鏡(SEM,日本電子光學實驗室(Japan Electron Optics Laboratory,JEOL))以100倍觀察。由使用圖像分析軟體獲得的圖像測量總孔粒徑,並計算數量、尺寸、面積率等。Pore average particle diameter: The polishing pad was cut into the size of a regular quadrilateral (thickness: 2 mm) of 2 cm × 2 cm, and observed at 100 times using a scanning electron microscope (SEM, Japan Electron Optics Laboratory (JEOL)) . The total pore diameter is measured from an image obtained using image analysis software, and the number, size, area ratio, etc. are calculated.
3.拋光性能測量3. Polishing performance measurement
拋光率的測量:The measurement of polishing rate:
使用CMP拋光設備,設置形成有由TEOS-等離子CVD法製備的氧化矽膜的直徑為300mm的矽晶圓後,使矽晶圓的氧化矽膜朝向下方並設定在附接有上述多孔聚氨酯拋光墊的平臺上。Using CMP polishing equipment, after setting a silicon wafer with a diameter of 300mm formed with a silicon oxide film prepared by TEOS-plasma CVD method, the silicon oxide film of the silicon wafer faces downward and is set on the above-mentioned porous polyurethane polishing pad attached on the platform.
通過將拋光負載調整為4.0psi並以150rpm旋轉拋光墊,在拋光墊上以250ml/分鐘的速率添加煆燒二氧化矽漿料,以150rpm旋轉平臺60秒,拋光氧化矽膜。Polish the silicon oxide film by adjusting the polishing load to 4.0 psi and rotating the polishing pad at 150 rpm, adding the calcined silica slurry on the polishing pad at a rate of 250 ml/min, and rotating the platform at 150 rpm for 60 seconds.
拋光後,將矽晶圓從載體上取下,安裝在旋轉乾燥機(spin dryer)上,用純淨水(DIW)清洗,然後用空氣乾燥15秒。用光學干涉式厚度測量裝置(製備商:日本基恩士(Keyence)公司,型號名稱:SI-F80R)測量乾燥的矽晶圓的拋光前後的膜厚變化,通過下述式計算拋光率(Remove Rate,去除率)。After polishing, the silicon wafer was removed from the carrier, mounted on a spin dryer, rinsed with purified water (DIW), and then air dried for 15 seconds. Use an optical interferometric thickness measurement device (manufacturer: Keyence, Japan, model name: SI-F80R) to measure the film thickness change of the dry silicon wafer before and after polishing, and calculate the polishing rate by the following formula (Remove Rate, removal rate).
拋光率=矽晶圓的拋光厚度(Å)/拋光時間(60秒)Polishing rate = polished thickness of silicon wafer (Å) / polishing time (60 seconds)
缺陷測量:矽晶圓中的缺陷數量Defect Measurement: Number of Defects in Silicon Wafers
使用CMP拋光設備以與拋光率測量方法相同的方式進行拋光。拋光後,將矽晶圓轉移到清潔器,分別使用1重量%的HF、1重量%的H2NO3及純淨水(DIW)來清洗10秒。然後,將其轉移到旋轉乾燥機,用純淨水清洗,然後用氮氣乾燥15秒。Polishing was performed in the same manner as the polishing rate measurement method using a CMP polishing apparatus. After polishing, the silicon wafer was transferred to a cleaner and cleaned with 1 wt% HF, 1 wt% H2NO3, and purified water (DIW) for 10 seconds, respectively. Then, it was transferred to a rotary dryer, washed with purified water, and then dried with nitrogen for 15 seconds.
用缺陷測量裝置(製備商:Tenkor公司,型號名稱:XP+)測量乾燥的矽晶圓的拋光後的缺陷數量。缺陷是指微劃痕或顫痕。作為適用直徑為300mm的矽晶圓來進行評價的結果,以下缺陷數是以70685.83mm 2的面積為基準評價的結果。 The number of defects after polishing of the dried silicon wafer was measured with a defect measurement device (manufacturer: Tenkor Corporation, model name: XP+). Defects are micro scratches or chatter marks. As a result of evaluating a silicon wafer with a diameter of 300mm, the number of defects below is based on an area of 70685.83mm2.
表3
參照上述表2和表3的結果,根據所適用的固態發泡劑的預處理程度,缺陷或劃痕的結果存在差異。但是,在適用了經過相同的預處理的固態發泡劑的實施例1至4的情況下,也根據第一驅動工具和第二驅動工具的轉速的比率、伸長率、孔物理性能、拋光率等有很大的差異。這被認為在轉速比率比較大的實施例3和實施例2的情況下,孔數比較多,進行實質上均勻的混合,因此沒有通過網狀過濾器等去除凝聚的發泡劑,而實現順利分散,從而觀察到相對大量的孔數。另一方面,就伸長率而言,稍微降低,這可被認為是因為,由於比較強的旋轉,在聚合物鏈的一部分中出現機械變性。就拋光率而言,當對觀察到表面孔數實質上相同的實施例3和實施例4進行比較時,實施例4顯示出更高的拋光率、更少的缺陷和劃痕程度,從而顯示出最優異的結果。Referring to the results of Tables 2 and 3 above, there are differences in the results of defects or scratches depending on the degree of pretreatment of the solid blowing agent applied. However, in the case of Examples 1 to 4 where the same pretreated solid foaming agent was applied, the ratio of the rotational speeds of the first driving tool and the second driving tool, elongation, pore physical properties, polishing rate Etc makes a big difference. It is considered that in the case of Example 3 and Example 2 with a relatively large rotational speed ratio, the number of pores is relatively large, and substantially uniform mixing is performed, so that the agglomerated blowing agent is not removed by a mesh filter, etc., and smoothness is achieved. Scattered so that a relatively large number of pores is observed. In terms of elongation, on the other hand, there is a slight decrease, which can be considered because mechanical denaturation occurs in a part of the polymer chain due to a relatively strong rotation. In terms of polishing rate, when comparing Example 3 and Example 4 in which the number of surface pores was observed to be substantially the same, Example 4 showed a higher polishing rate and less defects and scratches, thereby showing produce the best results.
以上對本發明的優選實施例進行了詳細說明,但本發明的範圍並不限定於此,利用所附發明要求保護範圍中所定義的本發明的基本概念的本發明所屬技術領域的普通技術人員的各種變形及改良形態也屬於本發明的範圍。The preferred embodiment of the present invention has been described in detail above, but the scope of the present invention is not limited thereto, utilize the basic idea of the present invention defined in the scope of protection of the appended invention to be understood by those of ordinary skill in the technical field of the present invention Various modifications and improvements also belong to the scope of the present invention.
1、2、3:用於製備拋光墊的樹脂組合物混合裝置
10:原料混合部
10a:第一供應部
10b:第二供應部
11:原料混合容器
111:原料混合空間
12:旋轉工具
121:第一驅動構件
122:第二驅動構件
13:原料混合工具
131:旋轉主體
132:原料混合構件
132a、522:軸
132b、523:攪拌葉片
20:過濾單元
21:第一過濾嘴部
211、221:過濾器外殼
211a、221a:過濾器空間
211b、221b:入口
211c、221c:出口
212:過濾器構件
22:第二過濾嘴部
222:支架
223:磁體
224:蓋
30:儲存部
40:固化劑供應部
50:墊組合物形成部
51:組合物混合容器
511:組合物混合空間
52:組合物混合構件
521:電機
60、70:均質化部
61、71:均質化外殼
611、711:流入口
612、712:排出口
62:轉子
73:均質化板
731:流動孔
1, 2, 3: Resin composition mixing device for preparing polishing pad
10: Raw
圖1為示出根據一實施方式的用於製備拋光墊的樹脂組合物混合裝置的示意圖。 圖2為示出圖1中的原料混合部的放大圖。 圖3為示出圖1中的第一過濾器部的示意圖。 圖4為示出圖1中的第二過濾器部的示意圖。 圖5為圖4的分解圖。 圖6為示出根據另一實施方式的用於製備拋光墊的樹脂組合物混合裝置的示意圖。 圖7為示出圖6中的均質化部的示意圖。 圖8為示出根據另一實施方式的用於製備拋光墊的樹脂組合物混合裝置的示意圖。 圖9為示出圖8中的均質化部的示意圖。 FIG. 1 is a schematic diagram illustrating a resin composition mixing device for preparing a polishing pad according to an embodiment. FIG. 2 is an enlarged view showing a raw material mixing section in FIG. 1 . FIG. 3 is a schematic diagram illustrating a first filter part in FIG. 1 . FIG. 4 is a schematic diagram illustrating a second filter part in FIG. 1 . FIG. 5 is an exploded view of FIG. 4 . FIG. 6 is a schematic diagram illustrating a resin composition mixing device for preparing a polishing pad according to another embodiment. FIG. 7 is a schematic diagram illustrating a homogenization section in FIG. 6 . FIG. 8 is a schematic diagram illustrating a resin composition mixing device for preparing a polishing pad according to another embodiment. FIG. 9 is a schematic diagram illustrating a homogenization section in FIG. 8 .
1:用於製備拋光墊的樹脂組合物混合裝置 1: Resin composition mixing device for preparing polishing pad
10:原料混合部 10: Raw material mixing department
10a:第一供應部 10a: The first supply department
10b:第二供應部 10b: The second supply department
11:原料混合容器 11: Raw material mixing container
111:原料混合空間 111: Raw material mixing space
13:原料混合工具 13: Raw material mixing tool
20:過濾單元 20: Filter unit
21:第一過濾嘴部 21: The first filter part
22:第二過濾嘴部 22: The second filter part
30:儲存部 30: storage department
40:固化劑供應部 40: Curing agent supply department
50:墊組合物形成部 50: pad composition forming part
51:組合物混合容器 51: Composition mixing container
511:組合物混合空間 511: Composition Mix Space
52:組合物混合構件 52: Composition Mixing Components
521:電機 521: motor
522:軸 522: axis
523:攪拌葉片 523: stirring blade
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