TW202245160A - Package carrier and manufacturing method thereof and chip package structure - Google Patents

Package carrier and manufacturing method thereof and chip package structure Download PDF

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TW202245160A
TW202245160A TW110138515A TW110138515A TW202245160A TW 202245160 A TW202245160 A TW 202245160A TW 110138515 A TW110138515 A TW 110138515A TW 110138515 A TW110138515 A TW 110138515A TW 202245160 A TW202245160 A TW 202245160A
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structure layer
layer
redistribution
conductive
circuit structure
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TW110138515A
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Chinese (zh)
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林育民
李靜觀
陳昭蓉
鄭仁信
林昂櫻
張博智
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財團法人工業技術研究院
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Priority to CN202111391873.6A priority Critical patent/CN115332213A/en
Priority to US17/547,200 priority patent/US20220367385A1/en
Publication of TW202245160A publication Critical patent/TW202245160A/en

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A package carrier includes a first redistribution structure layer, a plurality of conductive connecting members, a connection structure layer, at least one stiffener and a molding compound. The conductive connecting members are disposed on a first surface of the first redistribution structure layer and electrically connected to the first redistribution structure layer. The connection structure layer is disposed on a second surface of the first redistribution structure layer and includes a substrate and a plurality of pads. A top surface and a bottom surface of each of the pads are respectively exposed to an upper surface and a lower surface of the substrate. The pads are electrically connected to the first redistribution structure layer. The stiffener is disposed on the first surface of the first redistribution structure layer and located at least between the conductive connecting members. The molding compound is disposed on the first surface of the first redistribution structure layer and covers the conductive connecting members and the stiffener.

Description

封裝載板及其製作方法與晶片封裝結構Packaging carrier board, manufacturing method thereof, and chip packaging structure

本發明是有關於一種封裝載板及其製作方法與採用此封裝載板的晶片封裝結構。The invention relates to a package carrier board, its manufacturing method and a chip package structure using the package carrier board.

現有技術中,因二維半積體電路(two and a half dimension integrated circuit stacking,2.5D IC)堆疊需使用到矽中介層,因而使得封裝成本居高不下。為了有效地降低封裝成本,目前以有機中介層來取代矽中介層。然而,有機中介層在組裝的過程中,常因組裝面受熱翹曲,使得載板的表面共平面性不佳,進而導致晶片無法順利組裝於載板上。In the prior art, because a two-dimensional semi-integrated circuit (two and a half dimension integrated circuit stacking, 2.5D IC) stacking needs to use a silicon interposer, the packaging cost remains high. In order to effectively reduce packaging costs, organic interposers are currently used to replace silicon interposers. However, during the assembly process of the organic interposer, the assembly surface is often warped due to heat, which makes the coplanarity of the surface of the carrier poor, and thus the chips cannot be successfully assembled on the carrier.

本發明提供一種封裝載板,其表面共平面性佳,且具有較佳的結構可靠度。The invention provides a package carrier board, which has good surface coplanarity and better structural reliability.

本發明提供一種封裝載板的製作方法,用以製作上述的封裝載板,可有效地降低製作成本。The present invention provides a method for manufacturing a packaging carrier, which is used to manufacture the above-mentioned packaging carrier, which can effectively reduce the manufacturing cost.

本發明提供一種晶片封裝結構,包括上述的封裝載板,可具有較佳的封裝良率。The present invention provides a chip package structure, including the above-mentioned package carrier board, which can have a better package yield.

本發明的封裝載板,其包括第一重分佈線路結構層、多個導電連接件、連接結構層、至少一加強筋以及封裝膠體。第一重分佈線路結構層具有彼此相對的第一表面與第二表面。導電連接件配置於第一重分佈線路結構層的第一表面上,且與第一重分佈線路結構層電性連接。連接結構層配置於第一重分佈線路結構層的第二表面上。連接結構層包括基材與多個接墊。每一接墊的頂表面與底表面分別暴露於基材的上表面與下表面。接墊與第一重分佈線路結構層電性連接。加強筋配置於第一重分佈線路結構層的第一表面上,且至少位於導電連接件之間。封裝膠體配置於第一重分佈線路結構層的第一表面上,且覆蓋導電連接件與加強筋。The packaging carrier of the present invention includes a first redistribution circuit structure layer, a plurality of conductive connectors, a connection structure layer, at least one rib and packaging glue. The first redistribution wiring structure layer has a first surface and a second surface opposite to each other. The conductive connector is disposed on the first surface of the first redistribution circuit structure layer and is electrically connected with the first redistribution circuit structure layer. The connection structure layer is configured on the second surface of the first redistribution circuit structure layer. The connection structure layer includes a substrate and a plurality of pads. The top surface and the bottom surface of each pad are respectively exposed to the upper surface and the lower surface of the substrate. The pad is electrically connected to the first redistribution circuit structure layer. The reinforcing rib is configured on the first surface of the first redistribution circuit structure layer and is at least located between the conductive connectors. The encapsulant is disposed on the first surface of the first redistribution circuit structure layer, and covers the conductive connectors and the reinforcing ribs.

本發明的封裝載板的製作方法,其包括以下步驟。提供基底與多個導電條。導電條內嵌於基底內,且每一導電條的一端暴露於基底的一側。形成第一重分佈線路結構層於基底的該側上。形成多個導電連接件以及至少一加強筋於第一重分佈線路結構層上,其中加強筋至少位於導電連接件之間。形成封裝膠體於第一重分佈線路結構層上,以覆蓋導電連接件與加強筋。於形成封裝膠體後,移除部分基底與部分導電條,而形成連接結構層。連接結構層包括基材與多個接墊。每一接墊的頂表面與底表面分別暴露於基材的上表面與下表面。The manufacturing method of the packaging carrier of the present invention includes the following steps. A substrate and a plurality of conductive strips are provided. The conductive strips are embedded in the base, and one end of each conductive strip is exposed to one side of the base. A first redistribution wiring structure layer is formed on the side of the substrate. A plurality of conductive connectors and at least one reinforcing rib are formed on the first redistribution circuit structure layer, wherein the reinforcing rib is at least located between the conductive connectors. An encapsulant is formed on the first redistribution circuit structure layer to cover the conductive connectors and the reinforcing ribs. After the encapsulation compound is formed, part of the base and part of the conductive strips are removed to form a connection structure layer. The connection structure layer includes a substrate and a plurality of pads. The top surface and the bottom surface of each pad are respectively exposed to the upper surface and the lower surface of the substrate.

本發明的晶片封裝結構,包括封裝載板與至少晶片。封裝載板包括第一重分佈線路結構層、多個導電連接件、連接結構層、至少一加強筋以及封裝膠體。第一重分佈線路結構層具有彼此相對的第一表面與第二表面。導電連接件配置於第一重分佈線路結構層的第一表面上,且與第一重分佈線路結構層電性連接。連接結構層配置於第一重分佈線路結構層的第二表面上。連接結構層包括基材與多個接墊。每一接墊的頂表面與底表面分別暴露於基材的上表面與下表面。接墊與第一重分佈線路結構層電性連接。加強筋配置於第一重分佈線路結構層的第一表面上,且至少位於導電連接件之間。封裝膠體配置於第一重分佈線路結構層的第一表面上,且覆蓋導電連接件與加強筋。晶片配置於封裝載板上,且與連接結構層的接墊電性連接。The chip package structure of the present invention includes a package carrier and at least a chip. The package carrier includes a first redistribution circuit structure layer, a plurality of conductive connectors, a connection structure layer, at least one rib and encapsulant. The first redistribution wiring structure layer has a first surface and a second surface opposite to each other. The conductive connector is disposed on the first surface of the first redistribution circuit structure layer and is electrically connected to the first redistribution circuit structure layer. The connection structure layer is configured on the second surface of the first redistribution circuit structure layer. The connection structure layer includes a substrate and a plurality of pads. The top surface and the bottom surface of each pad are respectively exposed to the upper surface and the lower surface of the substrate. The pad is electrically connected to the first redistribution circuit structure layer. The reinforcing rib is configured on the first surface of the first redistribution circuit structure layer and is at least located between the conductive connectors. The encapsulant is disposed on the first surface of the first redistribution circuit structure layer, and covers the conductive connectors and the reinforcing ribs. The chip is disposed on the package carrier board and electrically connected to the pads of the connection structure layer.

基於上述,在本發明的封裝載板的設計中,導電連接件與加強筋是配置於第一重分佈線路結構層的同一表面上,且封裝膠體覆蓋導電連接件與加強筋,藉此可抑制且降低封裝載板產生翹曲,進而使本發明的封裝載板具有較佳的平整性與結構可靠度。再者,在本發明的封裝載板的製作過程中,無須使用暫時基板,因而也不用進行雷射解離(laser debond)製程,可有效地降低製作成本。此外,在本發明的封裝載板的製作過程中,封裝膠體覆蓋導電連接件與加強筋,而使得封裝載板的背面變成平整,有利於後續將晶片組裝於封裝載板的正面上。另外,由於本發明的封裝載板具有較佳的平整性,因而採用本發明的封裝載板的晶片封裝結構,則可具有較佳的封裝良率。Based on the above, in the design of the package carrier of the present invention, the conductive connectors and the ribs are arranged on the same surface of the first redistribution circuit structure layer, and the encapsulant covers the conductive connectors and the ribs, thereby suppressing the And the warping of the packaging carrier is reduced, so that the packaging carrier of the present invention has better flatness and structural reliability. Furthermore, in the manufacturing process of the package carrier of the present invention, no temporary substrate is needed, and therefore no laser debond process is required, which can effectively reduce the manufacturing cost. In addition, during the manufacturing process of the package carrier of the present invention, the encapsulant covers the conductive connectors and ribs, so that the back of the package carrier becomes flat, which facilitates subsequent assembly of chips on the front of the package carrier. In addition, since the packaging carrier of the present invention has better flatness, the chip packaging structure using the packaging carrier of the present invention can have better packaging yield.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail together with the accompanying drawings.

圖1A至圖1E是依照本發明的一實施例的一種封裝載板的製作方法的剖面示意圖。關於本實施例的封裝載板的製作方法,首先,請參考圖1A,提供基底112a與多個導電條114a。導電條114a內嵌於基底112a內,且每一導電條114a的一端115暴露於基底112a的一側113。此處,基底112a的材質例如是玻璃、矽或其他介電材料。1A to 1E are schematic cross-sectional views of a manufacturing method of a package carrier according to an embodiment of the present invention. Regarding the manufacturing method of the package carrier of this embodiment, firstly, referring to FIG. 1A , a base 112a and a plurality of conductive strips 114a are provided. The conductive strips 114a are embedded in the base 112a, and one end 115 of each conductive strip 114a is exposed to one side 113 of the base 112a. Here, the material of the substrate 112a is, for example, glass, silicon or other dielectric materials.

接著,請參考圖1B,形成第一重分佈線路結構層120於基底112a的一側113上。詳細來說,第一重分佈線路結構層120包括多個介電層121、123、多個重分佈線路層122、124、多個導電通孔125、127以及多個連接墊126。重分佈線路層122、124與介電層121、123交替堆疊於基底112a的一側113上,而連接墊126位於介電層123上。重分佈線路層122直接接觸且電性連接每一導電條114a的一端115,且透過導電通孔125與重分佈線路層124電性連接。重分佈線路層124透過導電通孔127與連接墊126電性連接。Next, please refer to FIG. 1B , a first redistribution wiring structure layer 120 is formed on one side 113 of the substrate 112 a. In detail, the first redistribution wiring structure layer 120 includes a plurality of dielectric layers 121 , 123 , a plurality of redistribution wiring layers 122 , 124 , a plurality of conductive vias 125 , 127 and a plurality of connection pads 126 . The redistribution circuit layers 122 , 124 and the dielectric layers 121 , 123 are alternately stacked on one side 113 of the substrate 112 a, and the connection pads 126 are located on the dielectric layer 123 . The redistribution circuit layer 122 directly contacts and is electrically connected to one end 115 of each conductive strip 114 a, and is electrically connected to the redistribution circuit layer 124 through the conductive via 125 . The redistribution circuit layer 124 is electrically connected to the connection pad 126 through the conductive via 127 .

接著,請參考圖1C,形成多個導電連接件130a以及至少一加強筋(示意地繪示多個加強筋140a)於第一重分佈線路結構層120上,其中加強筋140a至少位於導電連接件130a之間。更進一步來說,本實施例的導電連接件130a例如是銲球,其中導電連接件130a直接位於第一重分佈線路結構層120的連接墊126上。加強筋140a直接位於介電層123上且不接觸連接墊126,其中加強筋140a的材質例如是鋼、鋁、銅、矽或玻璃,但不以此為限。須說明的是,本實施例沒有限制形成導電連接件130a與加強筋140a的順序,可依據需求而自行決定形成導電連接件130a與加強筋140a的先後順序。Next, please refer to FIG. 1C, forming a plurality of conductive connectors 130a and at least one rib (a plurality of ribs 140a are schematically shown) on the first redistribution circuit structure layer 120, wherein the rib 140a is at least located on the conductive connector Between 130a. Furthermore, the conductive connector 130 a in this embodiment is, for example, a solder ball, wherein the conductive connector 130 a is directly located on the connection pad 126 of the first redistribution wiring structure layer 120 . The reinforcing rib 140a is directly located on the dielectric layer 123 and does not contact the connection pad 126 , wherein the material of the reinforcing rib 140a is, for example, steel, aluminum, copper, silicon or glass, but not limited thereto. It should be noted that the present embodiment does not limit the order of forming the conductive connectors 130 a and the reinforcing ribs 140 a , and the order of forming the conductive connectors 130 a and the reinforcing ribs 140 a can be determined by itself according to requirements.

之後,請參考圖1D,形成封裝膠體150於第一重分佈線路結構層120上,以覆蓋導電連接件130a與加強筋140a。此處,封裝膠體150完全包覆導電連接件130a與加強筋140a。若有需要,可選擇性地加入研磨(grinding)程序,來研磨過厚的封裝膠體150。Afterwards, referring to FIG. 1D , an encapsulant 150 is formed on the first redistribution wiring structure layer 120 to cover the conductive connectors 130 a and the ribs 140 a. Here, the encapsulant 150 completely covers the conductive connector 130a and the rib 140a. If necessary, a grinding procedure can be optionally added to grind the over-thick encapsulant 150 .

最後,請同時參考圖1D與圖1E,於形成封裝膠體150後,進行薄化(thinning)程序,以移除部分基底112a與部分導電條114a,而形成連接結構層110。此處,連接結構層110包括基材112與多個接墊114,其中基材112實質上為基底112a的一部分,而接墊114實質上為導電條114a的一部分。每一接墊114的頂表面S1與底表面S2分別暴露於基材112的上表面S3與下表面S4。在一實施例中,每一接墊114的頂表面S1與底表面S2分別切齊於基材112的上表面S3與下表面S4。此外,須說明的是,在此可依據後續晶片接合的需求,而選擇性地對連接結構層110進行表面處理程序。舉例來說,若基材112的材質為矽時,需增加介電材料層;若基材112的材質為玻璃時,則無需增加介電材料層。此外,依據後續採用的接合方式(如微焊錫接點接合或混合鍵結接合),須對接墊114進行不同的表面處理程序。至此,已完成封裝載板100a的製作。Finally, referring to FIG. 1D and FIG. 1E , after forming the encapsulant 150 , a thinning process is performed to remove part of the substrate 112 a and part of the conductive strips 114 a to form the connection structure layer 110 . Here, the connection structure layer 110 includes a substrate 112 and a plurality of pads 114 , wherein the substrate 112 is substantially a part of the base 112 a, and the pads 114 are substantially a part of the conductive strips 114 a. The top surface S1 and the bottom surface S2 of each pad 114 are respectively exposed to the upper surface S3 and the lower surface S4 of the substrate 112 . In one embodiment, the top surface S1 and the bottom surface S2 of each pad 114 are respectively aligned with the upper surface S3 and the lower surface S4 of the substrate 112 . In addition, it should be noted that, here, the surface treatment procedure can be selectively performed on the connection structure layer 110 according to the requirements of subsequent wafer bonding. For example, if the material of the base material 112 is silicon, a dielectric material layer needs to be added; if the material of the base material 112 is glass, there is no need to add a dielectric material layer. In addition, according to the subsequent bonding method (such as micro-solder joint bonding or hybrid bonding bonding), different surface treatment procedures must be performed on the pads 114 . So far, the fabrication of the package carrier 100a has been completed.

在結構上,請再參考圖1E,封裝載板100a包括第一重分佈線路結構層120、導電連接件130a、連接結構層110、加強筋140a以及封裝膠體150。第一重分佈線路結構層120具有彼此相對的第一表面F1與第二表面F2。導電連接件130a配置於第一重分佈線路結構層120的第一表面F1上,且與第一重分佈線路結構層120電性連接。連接結構層110配置於第一重分佈線路結構層120的第二表面F2上。連接結構層110包括基材112與接墊114。每一接墊114的頂表面S1與底表面S2分別暴露於基材112的上表面S3與下表面S4。接墊114與第一重分佈線路結構層120電性連接。加強筋140a配置於第一重分佈線路結構層120的第一表面F1上,且至少位於導電連接件130a之間。封裝膠體150配置於第一重分佈線路結構層120的第一表面F1上,且覆蓋導電連接件130a與加強筋140。In terms of structure, please refer to FIG. 1E again. The package carrier 100 a includes a first redistribution circuit structure layer 120 , conductive connectors 130 a , connection structure layer 110 , ribs 140 a and encapsulant 150 . The first redistribution wiring structure layer 120 has a first surface F1 and a second surface F2 opposite to each other. The conductive connector 130 a is disposed on the first surface F1 of the first redistribution circuit structure layer 120 and is electrically connected to the first redistribution circuit structure layer 120 . The connection structure layer 110 is disposed on the second surface F2 of the first redistribution wiring structure layer 120 . The connection structure layer 110 includes a substrate 112 and pads 114 . The top surface S1 and the bottom surface S2 of each pad 114 are respectively exposed to the upper surface S3 and the lower surface S4 of the substrate 112 . The pad 114 is electrically connected to the first redistribution wiring structure layer 120 . The reinforcing rib 140a is disposed on the first surface F1 of the first redistribution wiring structure layer 120 and at least located between the conductive connectors 130a. The encapsulant 150 is disposed on the first surface F1 of the first redistribution wiring structure layer 120 and covers the conductive connector 130 a and the reinforcing rib 140 .

簡言之,本實施例的封裝載板100a是透過設置加強筋140a來抑制及降低載板的翹曲。再者,本實施例的封裝載板100a內整合有電路板的增層製程,意即第一重分佈線路結構層120。導電連接件130a與加強筋140a是配置於第一重分佈線路結構層120的同一表面上,且封裝膠體150覆蓋導電連接件130a與加強筋140a,藉此可抑制且降低封裝載板100a產生翹曲,進而使本實施例的封裝載板100a具有較佳的平整性與結構可靠度。此外,在本實施例的封裝載板100a的製作過程中,無須使用暫時基板,因而也不用進行雷射解離(laser debond)製程,可有效地降低製作成本。In short, the packaging carrier 100a of this embodiment suppresses and reduces the warpage of the carrier by providing the ribs 140a. Moreover, the build-up process of the circuit board is integrated in the package carrier 100 a of this embodiment, that is, the first redistribution circuit structure layer 120 . The conductive connectors 130a and the ribs 140a are disposed on the same surface of the first redistribution circuit structure layer 120, and the encapsulant 150 covers the conductive connectors 130a and the ribs 140a, thereby suppressing and reducing the warping of the packaging substrate 100a. curvature, so that the packaging carrier 100a of this embodiment has better flatness and structural reliability. In addition, in the manufacturing process of the package carrier 100a of this embodiment, no temporary substrate is needed, and thus no laser debond process is required, which can effectively reduce the manufacturing cost.

圖1F至圖1J繪示將晶片配置於圖1E的封裝載板上而形成晶片封裝結構的製作方法的剖面示意圖。FIGS. 1F to 1J are schematic cross-sectional views illustrating a method of disposing a chip on the package carrier shown in FIG. 1E to form a chip package structure.

接著,請參考圖1F,配置至少一晶片(示意地繪示二個晶片200)於封裝載板100a上,其中晶片200可透過微焊錫接點(micro bump)接合或混合鍵結(hybrid bond)接合而與連接結構層110的接墊114電性連接。此處,如圖1F,晶片200是透過微焊錫接點210與接墊114電性連接,且之後於封裝載板100a與晶片200之間會填充底膠220,以使底膠220來包覆微焊錫接點210。在一實施例中,晶片200的接點間距為10微米至80微米。Next, please refer to FIG. 1F , dispose at least one chip (two chips 200 are schematically shown) on the package carrier 100a, wherein the chip 200 can be bonded or hybrid bonded through a micro solder joint (micro bump) bonding to electrically connect with the pads 114 of the connection structure layer 110 . Here, as shown in FIG. 1F , the chip 200 is electrically connected to the pad 114 through the micro solder joint 210 , and then the underfill 220 is filled between the package carrier 100 a and the chip 200 so that the underfill 220 covers Micro-solder joints 210 . In one embodiment, the contact pitch of the wafer 200 is 10 microns to 80 microns.

接著,請參考圖1G,形成密封材料230於封裝載板100a的連接結構層110上,且覆蓋晶片200的周圍表面201,以增加結構強度與可靠度。可選擇性地,對密封材料230進行研磨程序,以使晶片200的背面203暴露於密封材料230的表面231,可具有較佳的散熱效果。Next, referring to FIG. 1G , an encapsulation material 230 is formed on the connection structure layer 110 of the packaging substrate 100 a and covers the peripheral surface 201 of the chip 200 to increase structural strength and reliability. Optionally, the sealing material 230 is ground, so that the back surface 203 of the wafer 200 is exposed to the surface 231 of the sealing material 230 , which can have a better heat dissipation effect.

之後,請同時參考圖1G與圖1H,進行乾蝕刻(dry etching)程序,以移除部分封裝膠體150,而至少暴露出每一導電連接件130a的第一底面132a。此處,封裝膠體150亦同時暴露出每一加強筋140a的第二底面142a。加強筋140a具有長度H,而封裝膠體150具有厚度T,且長度H等於厚度T。於另一未繪示的實施例中,加強筋的長度亦可小於封裝膠體的厚度,意即加強筋可以不要露出於封裝膠體。Afterwards, please refer to FIG. 1G and FIG. 1H at the same time, and perform a dry etching process to remove part of the encapsulant 150 to expose at least the first bottom surface 132a of each conductive connection member 130a. Here, the encapsulant 150 also exposes the second bottom surface 142a of each rib 140a at the same time. The rib 140a has a length H, and the encapsulant 150 has a thickness T, and the length H is equal to the thickness T. Referring to FIG. In another non-illustrated embodiment, the length of the ribs may also be smaller than the thickness of the encapsulant, which means that the ribs may not be exposed to the encapsulant.

最後,請同時參考圖1I與圖1J,進行單體化程序,以沿著切割線L切割密封材料230與封裝載板100a,而形成晶片封裝結構10a的製作。Finally, please refer to FIG. 1I and FIG. 1J at the same time to perform a singulation procedure to cut the sealing material 230 and the package carrier 100 a along the cutting line L to form the chip package structure 10 a.

在結構上,請再參考圖1J,本實施例的晶片封裝結構10a包括上述圖1E的封裝載板100a與晶片200,其中晶片200配置於封裝載板100a上,且與連接結構層110的接墊114電性連接。進一步來說,晶片200可透過微焊錫接點(micro bump)接合或混合鍵結(hybrid bond)接合而與連接結構層110的接墊114電性連接。再者,本實施例的晶片封裝結構10a還包括密封材料230,配置於封裝載板100a的連接結構層110上,且覆蓋晶片210的周圍表面201,且晶片200的背面203暴露於密封材料230的表面231。此處,密封材料230的邊緣暴露封裝載板100a的邊緣,且封裝膠體150暴露出每一導電連接件130a的第一底面132a與加強筋140a的第二底面142a。In terms of structure, please refer to FIG. 1J again. The chip package structure 10a of this embodiment includes the above-mentioned package carrier 100a and chip 200 in FIG. The pad 114 is electrically connected. Further, the chip 200 can be electrically connected to the pad 114 of the connection structure layer 110 through micro bump bonding or hybrid bond bonding. Moreover, the chip package structure 10a of this embodiment further includes a sealing material 230, which is disposed on the connection structure layer 110 of the package carrier 100a, and covers the peripheral surface 201 of the chip 210, and the back surface 203 of the chip 200 is exposed to the sealing material 230 The surface 231 of. Here, the edge of the sealing material 230 exposes the edge of the packaging substrate 100a, and the encapsulant 150 exposes the first bottom surface 132a of each conductive connector 130a and the second bottom surface 142a of the rib 140a.

在應用上,如圖1J所示,晶片封裝結構10a可透過導電連接件130a與驅動基板20上的接墊22電性連接,而電性連接至驅動基板20上。此處,驅動基板20可例如是印刷電路板,但不以此為限。In application, as shown in FIG. 1J , the chip package structure 10 a can be electrically connected to the pads 22 on the driving substrate 20 through the conductive connector 130 a, and thus electrically connected to the driving substrate 20 . Here, the driving substrate 20 may be, for example, a printed circuit board, but is not limited thereto.

在本實施例的封裝載板100a的製作過程中,由於封裝膠體150覆蓋導電連接件130a與加強筋140a,因而使得封裝載板100a的背面變成平整。故,後續進行晶片封裝結構10a的製作時,由於封裝載板100a具有較佳的平整性,因而有利於晶片200設置於封裝載板100a的正面上,且適於採用微焊錫接點(micro bump)接合或混合鍵結(hybrid bond)接合來實現晶片200與接墊114的電性連接,可具有較佳的封裝良率。In the manufacturing process of the package carrier 100a of this embodiment, since the encapsulant 150 covers the conductive connectors 130a and the ribs 140a, the back surface of the package carrier 100a becomes flat. Therefore, when the chip package structure 10a is subsequently manufactured, since the package carrier 100a has better flatness, it is beneficial for the chip 200 to be arranged on the front side of the package carrier 100a, and it is suitable for using micro bumps. ) bonding or hybrid bond (hybrid bond) bonding to realize the electrical connection between the chip 200 and the pads 114 , which may have a better packaging yield.

在此必須說明的是,下述實施例沿用前述實施例的元件標號與部分內容,其中採用相同的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參照前述實施例,下述實施例不再重複贅述。It must be noted here that the following embodiments use the component numbers and part of the content of the previous embodiments, wherein the same numbers are used to denote the same or similar components, and descriptions of the same technical content are omitted. For the description of omitted parts, reference may be made to the foregoing embodiments, and the following embodiments will not be repeated.

圖2A至圖2D是依照本發明的另一實施例的一種封裝載板的製作方法的剖面示意圖。本實施例的封裝載板的製作方法與上述的封裝載板的製作方法相似,兩者差異在於:在圖1B的步驟之後,即形成第一重分佈線路結構層120於基底112a的一側113上之後,請參考圖2A,形成第二重分佈線路結構層160於第一重分佈線路結構層120上。詳細來說,第二重分佈線路結構層160包括多個介電層161、163、重分佈線路層162、多個導電通孔165、167以及多個連接墊164。重分佈線路層162與介電層161、163交替堆疊於第一重分佈線路結構層120上,而連接墊164位於介電層163上。重分佈線路層162透過導電通孔165與第一重分佈線路結構層120電性連接。連接墊164透過導電通孔167與重分佈線路層162電性連接。此處,第二重分佈線路結構層160的線寬與線距大於第一重分佈線路結構層120的線寬與線距。2A to 2D are schematic cross-sectional views of a manufacturing method of a package carrier according to another embodiment of the present invention. The manufacturing method of the packaging carrier of this embodiment is similar to the manufacturing method of the above-mentioned packaging carrier, the difference between the two is: after the step in FIG. After that, referring to FIG. 2A , a second redistribution circuit structure layer 160 is formed on the first redistribution circuit structure layer 120 . In detail, the second redistribution circuit structure layer 160 includes a plurality of dielectric layers 161 , 163 , a redistribution circuit layer 162 , a plurality of conductive vias 165 , 167 and a plurality of connection pads 164 . The redistribution wiring layer 162 and the dielectric layers 161 and 163 are alternately stacked on the first redistribution wiring structure layer 120 , and the connection pad 164 is located on the dielectric layer 163 . The redistribution circuit layer 162 is electrically connected to the first redistribution circuit structure layer 120 through the conductive via 165 . The connection pad 164 is electrically connected to the redistribution circuit layer 162 through the conductive via 167 . Here, the line width and line spacing of the second redistribution wiring structure layer 160 are larger than the line width and line spacing of the first redistribution wiring structure layer 120 .

接著,請參考圖2B,形成多個導電連接件130b以及至少一加強筋(示意地繪示多個加強筋140b)於第二重分佈線路結構層160上,其中加強筋140b至少位於導電連接件130b之間。更進一步來說,本實施例的導電連接件130b例如是銲球,其中導電連接件130b直接位於第二重分佈線路結構層160的連接墊164上。加強筋140b直接位於介電層163上且不接觸連接墊164,其中加強筋140b的材質例如是鋼、鋁、銅、矽或玻璃,但不以此為限。須說明的是,本實施例沒有限制形成導電連接件130b與加強筋140b的順序,可依據需求而自行決定形成導電連接件130b與加強筋140b的先後順序。Next, please refer to FIG. 2B, forming a plurality of conductive connectors 130b and at least one rib (a plurality of ribs 140b are schematically shown) on the second redistribution circuit structure layer 160, wherein the rib 140b is at least located on the conductive connectors Between 130b. Furthermore, the conductive connectors 130b in this embodiment are, for example, solder balls, wherein the conductive connectors 130b are directly located on the connection pads 164 of the second redistribution wiring structure layer 160 . The reinforcing rib 140b is directly located on the dielectric layer 163 and does not contact the connection pad 164 , wherein the material of the reinforcing rib 140b is, for example, steel, aluminum, copper, silicon or glass, but not limited thereto. It should be noted that the present embodiment does not limit the order of forming the conductive connectors 130 b and the reinforcing ribs 140 b , and the order of forming the conductive connectors 130 b and the reinforcing ribs 140 b can be determined according to requirements.

之後,請參考圖2C,形成封裝膠體150於第二重分佈線路結構層160上,以覆蓋導電連接件130b與加強筋140b。此處,封裝膠體150完全包覆導電連接件130b與加強筋140b。若有需要,可選擇性地加入研磨(grinding)程序,來研磨過厚的封裝膠體150。Afterwards, referring to FIG. 2C , an encapsulant 150 is formed on the second redistribution wiring structure layer 160 to cover the conductive connectors 130 b and the ribs 140 b. Here, the encapsulant 150 completely covers the conductive connector 130b and the reinforcing rib 140b. If necessary, a grinding procedure can be optionally added to grind the over-thick encapsulant 150 .

最後,請同時參考圖2C與圖2D,於形成封裝膠體150後,進行薄化(thinning)程序,以移除部分基底112a與部分導電條114a,而形成連接結構層110。連接結構層110包括基材112與多個接墊114,其中基材112實質上為基底112a的一部分,而接墊114實質上為導電條114a的一部分。每一接墊114的頂表面S1與底表面S2分別暴露於基材112的上表面S3與下表面S4。此外,須說明的是,在此可依據後續晶片接合的需求,而選擇性地對連接結構層110進行表面處理程序。舉例來說,若基材112的材質為矽時,需增加介電材料層;若基材112的材質為玻璃時,則無需增加介電材料層。此外,依據後續採用的接合方式(如微焊錫接點接合或混合鍵結接合),須對接墊114進行不同的表面處理程序。至此,已完成封裝載板100b的製作。Finally, referring to FIG. 2C and FIG. 2D , after forming the encapsulant 150 , a thinning process is performed to remove part of the substrate 112 a and part of the conductive strips 114 a to form the connection structure layer 110 . The connection structure layer 110 includes a substrate 112 and a plurality of pads 114 , wherein the substrate 112 is substantially a part of the base 112 a , and the pads 114 are substantially a part of the conductive strips 114 a. The top surface S1 and the bottom surface S2 of each pad 114 are respectively exposed to the upper surface S3 and the lower surface S4 of the substrate 112 . In addition, it should be noted that, here, the surface treatment procedure can be selectively performed on the connection structure layer 110 according to the requirements of subsequent wafer bonding. For example, if the material of the base material 112 is silicon, a dielectric material layer needs to be added; if the material of the base material 112 is glass, there is no need to add a dielectric material layer. In addition, according to the subsequent bonding method (such as micro-solder joint bonding or hybrid bonding bonding), different surface treatment procedures must be performed on the pads 114 . So far, the fabrication of the package carrier 100b has been completed.

圖2E至圖2I繪示將晶片配置於圖2D的封裝載板上而形成晶片封裝結構的製作方法的剖面示意圖。FIGS. 2E to 2I are schematic cross-sectional views illustrating a method of disposing a chip on the package carrier shown in FIG. 2D to form a chip package structure.

接著,請參考圖2E,配置至少一晶片(示意地繪示二個晶片200)於封裝載板100b上,其中晶片200可透過微焊錫接點(micro bump)接合或混合鍵結(hybrid bond)接合而與連接結構層110的接墊114電性連接。此處,如圖2E,晶片200是透過微焊錫接點210與接墊114電性連接,且之後於封裝載板100b與晶片200之間會填充底膠220,以使底膠220來包覆微焊錫接點210。在一實施例中,晶片200的接點間距為10微米至80微米。Next, please refer to FIG. 2E , disposing at least one chip (two chips 200 are schematically shown) on the package carrier 100b, wherein the chip 200 can be bonded or hybrid bonded through micro bumps. bonding to electrically connect with the pads 114 of the connection structure layer 110 . Here, as shown in FIG. 2E , the chip 200 is electrically connected to the pad 114 through the micro solder joint 210 , and then the underfill 220 will be filled between the package carrier 100 b and the chip 200 so that the underfill 220 can cover Micro-solder joints 210 . In one embodiment, the contact pitch of the wafer 200 is 10 microns to 80 microns.

接著,請參考圖2F,形成密封材料230於封裝載板100b的連接結構層110上,且覆蓋晶片200的周圍表面201,以增加結構強度與可靠度。選擇性地,對密封材料230進行研磨程序,以使晶片200的背面203暴露於密封材料230的表面231,可具有較佳的散熱效果。Next, please refer to FIG. 2F , a sealing material 230 is formed on the connection structure layer 110 of the packaging substrate 100 b and covers the peripheral surface 201 of the chip 200 to increase structural strength and reliability. Optionally, the sealing material 230 is ground, so that the back surface 203 of the wafer 200 is exposed to the surface 231 of the sealing material 230 , which can have a better heat dissipation effect.

之後,請同時參考圖2F與圖2G,進行乾蝕刻(dry etching)程序,以移除部分封裝膠體150,而至少暴露出每一導電連接件130b的第一底面132b。此處,加強筋140b具有長度H’,而封裝膠體150具有厚度T,且長度H’小於厚度T。Afterwards, please refer to FIG. 2F and FIG. 2G at the same time, and perform a dry etching process to remove part of the encapsulant 150 to expose at least the first bottom surface 132b of each conductive connection member 130b. Here, the rib 140b has a length H', and the encapsulant 150 has a thickness T, and the length H' is smaller than the thickness T.

最後,請同時參考圖2H與圖2I,進行單體化程序,以沿著切割線L切割密封材料230與封裝載板100b,而形成晶片封裝結構10b的製作。Finally, please refer to FIG. 2H and FIG. 2I at the same time to perform a singulation process to cut the sealing material 230 and the package carrier 100b along the cutting line L to form the chip package structure 10b.

在應用上,如圖2I所示,晶片封裝結構10b可透過導電連接件130b與驅動基板20上的接墊22電性連接,而電性連接至驅動基板20上。此處,驅動基板20可例如是印刷電路板,但不以此為限。In application, as shown in FIG. 2I , the chip package structure 10b can be electrically connected to the pads 22 on the driving substrate 20 through the conductive connectors 130b , so as to be electrically connected to the driving substrate 20 . Here, the driving substrate 20 may be, for example, a printed circuit board, but is not limited thereto.

圖3A至圖3C是依照本發明的另一實施例的一種封裝載板的製作方法的剖面示意圖。本實施例的封裝載板的製作方法與上述的封裝載板的製作方法相似,兩者差異在於:在圖1B的步驟之後,即形成第一重分佈線路結構層120於基底112a的一側113上之後,請參考圖3A,形成第二重分佈線路結構層170於第一重分佈線路結構層120上。詳細來說,第二重分佈線路結構層170包括多個介電層171、173、重分佈線路層172以及多個導電通孔175、177。重分佈線路層172與介電層171、173交替堆疊於第一重分佈線路結構層120上。重分佈線路層172透過導電通孔175與第一重分佈線路結構層120電性連接。此處,第二重分佈線路結構層170的線寬與線距大於第一重分佈線路結構層120的線寬與線距。3A to 3C are schematic cross-sectional views of a manufacturing method of a package carrier according to another embodiment of the present invention. The manufacturing method of the packaging carrier of this embodiment is similar to the manufacturing method of the above-mentioned packaging carrier, the difference between the two is: after the step in FIG. After that, referring to FIG. 3A , a second redistribution circuit structure layer 170 is formed on the first redistribution circuit structure layer 120 . In detail, the second redistribution wiring structure layer 170 includes a plurality of dielectric layers 171 , 173 , a redistribution wiring layer 172 and a plurality of conductive vias 175 , 177 . The redistribution wiring layer 172 and the dielectric layers 171 and 173 are alternately stacked on the first redistribution wiring structure layer 120 . The redistribution circuit layer 172 is electrically connected to the first redistribution circuit structure layer 120 through the conductive via 175 . Here, the line width and line spacing of the second redistribution wiring structure layer 170 are larger than the line width and line spacing of the first redistribution wiring structure layer 120 .

接著,請再參考圖3A,形成多個導電連接件130c以及至少一加強筋(示意地繪示多個加強筋140c)於第二重分佈線路結構層170上,其中加強筋140c至少位於導電連接件130c之間。更進一步來說,本實施例的導電連接件130c例如是銅柱,其中導電連接件130c直接位於第二重分佈線路結構層170的導電通孔177上。加強筋140c直接位於介電層173上且不接觸導電通孔177,其中加強筋140c的材質例如是鋼、鋁、銅、矽或玻璃,但不以此為限。須說明的是,本實施例沒有限制形成導電連接件130c與加強筋140c的順序,可依據需求而自行決定形成導電連接件130c與加強筋140c的先後順序。Next, please refer to FIG. 3A again, forming a plurality of conductive connectors 130c and at least one rib (a plurality of ribs 140c are schematically shown) on the second redistribution circuit structure layer 170, wherein the rib 140c is at least located on the conductive connection between pieces 130c. Furthermore, the conductive connector 130c in this embodiment is, for example, a copper pillar, wherein the conductive connector 130c is directly located on the conductive via 177 of the second redistribution wiring structure layer 170 . The reinforcing rib 140c is directly located on the dielectric layer 173 and does not contact the conductive via 177 , wherein the material of the reinforcing rib 140c is, for example, steel, aluminum, copper, silicon or glass, but not limited thereto. It should be noted that the present embodiment does not limit the order of forming the conductive connectors 130c and the reinforcing ribs 140c, and the order of forming the conductive connectors 130c and the reinforcing ribs 140c can be determined according to requirements.

之後,請參考圖3B,形成封裝膠體150於第二重分佈線路結構層170上,以覆蓋導電連接件130c與加強筋140c。此處,封裝膠體150完全包覆導電連接件130c與加強筋140c。若有需要,可選擇性地加入研磨(grinding)程序,來研磨過厚的封裝膠體150。Afterwards, referring to FIG. 3B , an encapsulant 150 is formed on the second redistribution wiring structure layer 170 to cover the conductive connectors 130c and the ribs 140c. Here, the encapsulant 150 completely covers the conductive connector 130c and the reinforcing rib 140c. If necessary, a grinding procedure can be optionally added to grind the over-thick encapsulant 150 .

最後,請同時參考圖3B與圖3C,於形成封裝膠體150後,進行薄化(thinning)程序,以移除部分基底112a與部分導電條114a,而形成連接結構層110。連接結構層110包括基材112與多個接墊114,其中基材112實質上為基底112a的一部分,而接墊114實質上為導電條114a的一部分。每一接墊114的頂表面S1與底表面S2分別暴露於基材112的上表面S3與下表面S4。此外,須說明的是,在此可依據後續晶片接合的需求,而選擇性地對連接結構層110進行表面處理程序。舉例來說,若基材112的材質為矽時,需增加介電材料層;若基材112的材質為玻璃時,則無需增加介電材料層。此外,依據後續採用的接合方式(如微焊錫接點接合或混合鍵結接合),須對接墊114進行不同的表面處理程序。至此,已完成封裝載板100c的製作。Finally, referring to FIG. 3B and FIG. 3C , after forming the encapsulant 150 , a thinning process is performed to remove part of the base 112 a and part of the conductive strips 114 a to form the connection structure layer 110 . The connection structure layer 110 includes a substrate 112 and a plurality of pads 114 , wherein the substrate 112 is substantially a part of the base 112 a , and the pads 114 are substantially a part of the conductive strips 114 a. The top surface S1 and the bottom surface S2 of each pad 114 are respectively exposed to the upper surface S3 and the lower surface S4 of the substrate 112 . In addition, it should be noted that, here, the surface treatment procedure can be selectively performed on the connection structure layer 110 according to the requirements of subsequent wafer bonding. For example, if the material of the base material 112 is silicon, a dielectric material layer needs to be added; if the material of the base material 112 is glass, there is no need to add a dielectric material layer. In addition, according to the subsequent bonding method (such as micro-solder joint bonding or hybrid bonding bonding), different surface treatment procedures must be performed on the pads 114 . So far, the fabrication of the package carrier 100c has been completed.

圖3D至圖3H繪示將晶片配置於圖3C的封裝載板上而形成晶片封裝結構的製作方法的剖面示意圖。FIGS. 3D to 3H are schematic cross-sectional views illustrating a manufacturing method for disposing a chip on the package carrier shown in FIG. 3C to form a chip package structure.

接著,請參考圖3D,配置至少一晶片(示意地繪示二個晶片200)於封裝載板100c上,其中晶片200可透過微焊錫接點(micro bump)接合或混合鍵結(hybrid bond)接合而與連接結構層110的接墊114電性連接。此處,如圖3D,晶片200是透過微焊錫接點210與接墊114電性連接,且之後於封裝載板100c與晶片200之間會填充底膠220,以使底膠220來包覆微焊錫接點210。在一實施例中,晶片200的接點間距為10微米至80微米。Next, please refer to FIG. 3D , disposing at least one chip (two chips 200 are schematically shown) on the package carrier 100c, wherein the chip 200 can be bonded or hybrid bonded through micro solder joints. bonding to electrically connect with the pads 114 of the connection structure layer 110 . Here, as shown in FIG. 3D , the chip 200 is electrically connected to the pad 114 through the micro solder joint 210 , and then the underfill 220 will be filled between the package carrier 100c and the chip 200 so that the underfill 220 can cover Micro-solder joints 210 . In one embodiment, the contact pitch of the wafer 200 is 10 microns to 80 microns.

接著,請參考圖3E,形成密封材料230於封裝載板100c的連接結構層110上,且覆蓋晶片200的周圍表面201,以增加結構強度與可靠度。可選擇性地,對密封材料230進行研磨程序,以使晶片200的背面203暴露於密封材料230的表面231,可具有較佳的散熱效果。Next, referring to FIG. 3E , a sealing material 230 is formed on the connection structure layer 110 of the packaging substrate 100 c and covers the peripheral surface 201 of the chip 200 to increase structural strength and reliability. Optionally, the sealing material 230 is ground, so that the back surface 203 of the wafer 200 is exposed to the surface 231 of the sealing material 230 , which can have a better heat dissipation effect.

之後,請同時參考圖3E與圖3F,進行乾蝕刻(dry etching)程序,以移除部分封裝膠體150,而至少暴露出每一導電連接件130c的第一底面132c。此處,加強筋140c具有長度H’’,而封裝膠體150具有厚度T,且長度H’’小於厚度T。Afterwards, referring to FIG. 3E and FIG. 3F , a dry etching process is performed to remove part of the encapsulant 150 to expose at least the first bottom surface 132c of each conductive connector 130c. Here, the rib 140c has a length H'', and the encapsulant 150 has a thickness T, and the length H'' is smaller than the thickness T.

最後,請同時參考圖3G與圖3H,進行單體化程序,以沿著切割線L切割密封材料230與封裝載板100c,而形成晶片封裝結構10c的製作。Finally, referring to FIG. 3G and FIG. 3H at the same time, a singulation process is performed to cut the sealing material 230 and the packaging carrier 100c along the cutting line L to form the fabrication of the chip packaging structure 10c.

在應用上,如圖3H所示,晶片封裝結構10c可透過導電連接件130c與銲球30電性連接,並藉由銲球30與驅動基板20上的接墊22電性連接,而使晶片封裝結構10c電性連接至驅動基板20上。此處,驅動基板20可例如是印刷電路板,但不以此為限。In application, as shown in FIG. 3H, the chip package structure 10c can be electrically connected to the solder ball 30 through the conductive connector 130c, and the solder ball 30 is electrically connected to the pad 22 on the driving substrate 20, so that the chip The packaging structure 10c is electrically connected to the driving substrate 20 . Here, the driving substrate 20 may be, for example, a printed circuit board, but is not limited thereto.

圖4A是依照本發明的一實施例的一種晶片封裝結構的剖面示意圖。請同時參考圖1J與圖4A,本實施例的晶片封裝結構10d與圖1J的晶片封裝結構10a相似,兩者差異在於:在本實施例中,晶片封裝結構10d包括晶片200與晶片250,其中晶片200的性質不同於晶片250的性質,且晶片200的尺寸也不同於晶片250的尺寸。意即,本實施例的晶片封裝結構10d異質整合了不同的晶片200、250。此外,在本實施例的晶片封裝結構10d中,還包括加強筋240,其中配置於晶片200與晶片250之間,且直接位於連接結構層110的基材112上且不接觸接墊114,藉此增加整體晶片封裝結構10d的結構強度。FIG. 4A is a schematic cross-sectional view of a chip package structure according to an embodiment of the present invention. Please refer to FIG. 1J and FIG. 4A at the same time. The chip package structure 10d of this embodiment is similar to the chip package structure 10a of FIG. The properties of wafer 200 are different from those of wafer 250 and the dimensions of wafer 200 are also different from the dimensions of wafer 250 . That is to say, the chip packaging structure 10d of this embodiment is heterogeneously integrated with different chips 200 and 250 . In addition, in the chip packaging structure 10d of the present embodiment, a reinforcing rib 240 is also included, which is arranged between the chip 200 and the chip 250, and is directly located on the substrate 112 of the connection structure layer 110 without contacting the pad 114, thereby This increases the structural strength of the overall chip package structure 1Od.

圖4B是依照本發明的一實施例的一種晶片封裝結構的剖面示意圖。請同時參考圖1J與圖4B,本實施例的晶片封裝結構10e與圖1J的晶片封裝結構10a相似,兩者差異在於:在本實施例中,封裝載板100e還包括增層結構層180,配置於第一重分佈線路結構層120的第一表面F1上,且位於導電連接件130e與第一重分佈線路結構層120之間。詳細來說,增層結構層180包括玻纖基板182、第一圖案化導電層184、第二圖案化導電層186、至少一第一導通孔(示意地繪示二個第一導通孔183)、至少一第二導通孔(示意地繪示二個第二導通孔185)及至少一第三導通孔(示意地繪示三個第三導通孔187)。第一圖案化導電層184與第二圖案化導電層186分別位於玻纖基板182的相對兩側。第三導通孔187貫穿玻纖基板182且電性連接第一圖案化導電層184與第二導通孔185。第一圖案化導電層184透過第一導通孔183與第一重分佈線路結構層120電性連接。第二圖案化導電層186透過第二導通孔185與第三導通孔187電性連接。導電連接件130e連接第二圖化導電層186且透過增層結構層180與第一重分佈線路結構層120電性連接。FIG. 4B is a schematic cross-sectional view of a chip package structure according to an embodiment of the present invention. Please refer to FIG. 1J and FIG. 4B at the same time. The chip package structure 10e of this embodiment is similar to the chip package structure 10a of FIG. It is disposed on the first surface F1 of the first redistribution circuit structure layer 120 , and is located between the conductive connecting member 130 e and the first redistribution circuit structure layer 120 . In detail, the build-up structure layer 180 includes a glass fiber substrate 182, a first patterned conductive layer 184, a second patterned conductive layer 186, and at least one first via hole (two first via holes 183 are schematically shown) , at least one second via hole (two second via holes 185 are schematically shown) and at least one third via hole (three third via holes 187 are schematically shown). The first patterned conductive layer 184 and the second patterned conductive layer 186 are respectively located on opposite sides of the glass fiber substrate 182 . The third via hole 187 penetrates the fiberglass substrate 182 and electrically connects the first patterned conductive layer 184 and the second via hole 185 . The first patterned conductive layer 184 is electrically connected to the first redistribution circuit structure layer 120 through the first via hole 183 . The second patterned conductive layer 186 is electrically connected to the third via hole 187 through the second via hole 185 . The conductive connector 130e is connected to the second patterned conductive layer 186 and is electrically connected to the first redistribution wiring structure layer 120 through the build-up structure layer 180 .

圖5A至圖5D是依照本發明的多個實施例的多種封裝載板的仰視示意圖。請同時參考圖5A、5C及圖5D,在封裝載板100f、100h、100i中,加強筋140f、140h、140i為連續性的結構層,透過其材料性質(即剛性),可增加整體封裝載板100f、100h、100i的結構強度,可抑制及降低封裝載板100f、100h、100i產生翹曲。詳細來說,在圖5A的封裝載板100f中,多個加強筋140f排列成網格狀而形成連續性結構層,而導電連接件130(例如是焊球)則位於網格狀內;在圖5C的封裝載板100h中,加強筋140h為單一連續結構層,且環繞導電連接件130的周圍;在圖5D的封裝載板100i中,加強筋140i包括第一加強筋144i以及多個第二加強筋146i,其中第一加強筋144i為單一連續結構層,環繞在導電連接件130分佈的外圍,而第二加強筋146i彼此分散排列,分佈在導電連接件130之間。此外,請參考圖5B,在封裝載板100g中,由於封裝載板100g其本身具有一定的結構強度,因此可透過彼此分散排列的多個加強筋140g來增加硬度,藉此提升封裝載板100g的結構強度及進一步抑制及降低封裝載板100g產生翹曲。5A to 5D are schematic bottom views of various package carriers according to various embodiments of the present invention. Please refer to FIG. 5A, 5C and FIG. 5D at the same time. In the packaging substrates 100f, 100h, and 100i, the ribs 140f, 140h, and 140i are continuous structural layers. Through their material properties (ie, rigidity), the overall packaging can be increased. The structural strength of the boards 100f, 100h, and 100i can suppress and reduce warping of the package carrier boards 100f, 100h, and 100i. In detail, in the package carrier 100f of FIG. 5A, a plurality of ribs 140f are arranged in a grid to form a continuous structural layer, and the conductive connectors 130 (such as solder balls) are located in the grid; In the package carrier 100h of FIG. 5C, the rib 140h is a single continuous structural layer and surrounds the conductive connector 130; in the package carrier 100i of FIG. 5D, the rib 140i includes a first rib 144i and a plurality of first ribs 144i Two reinforcing ribs 146i, wherein the first reinforcing rib 144i is a single continuous structure layer and surrounds the periphery of the conductive connectors 130; In addition, please refer to FIG. 5B, in the package carrier 100g, since the package carrier 100g itself has a certain structural strength, the rigidity can be increased through a plurality of ribs 140g dispersedly arranged with each other, thereby enhancing the package carrier 100g. structural strength and further suppress and reduce warping of the package carrier 100g.

綜上所述,在本發明的封裝載板的設計中,導電連接件與加強筋是配置於第一重分佈線路結構層的同一表面上,且封裝膠體覆蓋導電連接件與加強筋,藉此可抑制且降低封裝載板產生翹曲,進而使本發明的封裝載板具有較佳的平整性與結構可靠度。再者,在本發明的封裝載板的製作過程中,無須使用暫時基板,因而也不用進行雷射解離(laser debond)製程,可有效地降低製作成本。此外,在本發明的封裝載板的製作過程中,封裝膠體覆蓋導電連接件與加強筋,而使得封裝載板的背面變成平整,有利於後續將晶片組裝於封裝載板的正面上。另外,由於本發明的封裝載板具有較佳的平整性,因而採用本發明的封裝載板的晶片封裝結構,則可具有較佳的封裝良率。To sum up, in the design of the packaging carrier of the present invention, the conductive connectors and the ribs are arranged on the same surface of the first redistribution circuit structure layer, and the encapsulant covers the conductive connectors and the ribs, thereby The warping of the package carrier can be suppressed and reduced, so that the package carrier of the present invention has better flatness and structural reliability. Furthermore, in the manufacturing process of the package carrier of the present invention, no temporary substrate is needed, and therefore no laser debond process is required, which can effectively reduce the manufacturing cost. In addition, during the manufacturing process of the package carrier of the present invention, the encapsulant covers the conductive connectors and ribs, so that the back of the package carrier becomes flat, which facilitates subsequent assembly of chips on the front of the package carrier. In addition, since the packaging carrier of the present invention has better flatness, the chip packaging structure using the packaging carrier of the present invention can have better packaging yield.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed above with the embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field may make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention should be defined by the scope of the appended patent application.

10a、10b、10c、10d、10e:晶片封裝結構 20:驅動基板 22:接墊 30:銲球 100a、100b、100c、100e、100f、100g、100h、100i:封裝載板 110:連接結構層 112:基材 112a:基底 113:一側 114:接墊 114a:導電條 115:一端 120:第一重分佈線路結構層 121、123:介電層 122、124:重分佈線路層 125、127:導電通孔 126:連接墊 130、130a、130b、130c、130e:導電連接件 132a、132b、132c:第一底面 140a、140b、140c、140f、140g、140h、140i、240:加強筋 142a:第二底面 144i:第一加強筋 146i:第二加強筋 150:封裝膠體 160、170:第二重分佈線路結構層 161、163、171、173:介電層 162、172:重分佈線路層 164:連接墊 165、167、175、177:導電通孔 180:增層結構層 182:玻纖基板 183:第一導通孔 184:第一圖案化導電層 185:第二導通孔 186:第二圖案化導電層 187:第三導通孔 200、250:晶片 201:周圍表面 203:背面 210:微焊錫接點 220:底膠 230:密封材料 231:表面 H、H’ 、H’’:長度 L:切割線 F1:第一表面 F2:第二表面 S1:頂表面 S2:底表面 S3:上表面 S4:下表面 T:厚度 10a, 10b, 10c, 10d, 10e: chip package structure 20: Drive substrate 22: Pad 30: solder ball 100a, 100b, 100c, 100e, 100f, 100g, 100h, 100i: package carrier 110:Connection structure layer 112: Substrate 112a: Base 113: one side 114: Pad 114a: Conductive strip 115: one end 120: The first redistribution line structure layer 121, 123: dielectric layer 122, 124: Redistribution line layer 125, 127: Conductive vias 126: connection pad 130, 130a, 130b, 130c, 130e: conductive connectors 132a, 132b, 132c: first bottom surface 140a, 140b, 140c, 140f, 140g, 140h, 140i, 240: reinforcement 142a: second bottom surface 144i: the first rib 146i: Second rib 150: encapsulation colloid 160, 170: the second redistribution line structure layer 161, 163, 171, 173: dielectric layer 162, 172: Redistribution line layer 164: connection pad 165, 167, 175, 177: Conductive vias 180: Layer-increasing structure layer 182: Glass fiber substrate 183: the first via hole 184: the first patterned conductive layer 185: Second via hole 186: the second patterned conductive layer 187: The third via hole 200, 250: chip 201: surrounding surface 203: back 210: micro solder joints 220: primer 230: sealing material 231: surface H, H', H'': Length L: cutting line F1: first surface F2: second surface S1: top surface S2: bottom surface S3: upper surface S4: lower surface T: Thickness

圖1A至圖1E是依照本發明的一實施例的一種封裝載板的製作方法的剖面示意圖。 圖1F至圖1J繪示將晶片配置於圖1E的封裝載板上而形成晶片封裝結構的製作方法的剖面示意圖。 圖2A至圖2D是依照本發明的另一實施例的一種封裝載板的製作方法的剖面示意圖。 圖2E至圖2I繪示將晶片配置於圖2D的封裝載板上而形成晶片封裝結構的製作方法的剖面示意圖。 圖3A至圖3C是依照本發明的另一實施例的一種封裝載板的製作方法的剖面示意圖。 圖3D至圖3H繪示將晶片配置於圖3C的封裝載板上而形成晶片封裝結構的製作方法的剖面示意圖。 圖4A是依照本發明的一實施例的一種晶片封裝結構的剖面示意圖。 圖4B是依照本發明的一實施例的一種晶片封裝結構的剖面示意圖。 圖5A至圖5D是依照本發明的多個實施例的多種封裝載板的仰視示意圖。 1A to 1E are schematic cross-sectional views of a manufacturing method of a package carrier according to an embodiment of the present invention. FIGS. 1F to 1J are schematic cross-sectional views illustrating a method of disposing a chip on the package carrier shown in FIG. 1E to form a chip package structure. 2A to 2D are schematic cross-sectional views of a manufacturing method of a package carrier according to another embodiment of the present invention. FIGS. 2E to 2I are schematic cross-sectional views illustrating a method of disposing a chip on the package carrier shown in FIG. 2D to form a chip package structure. 3A to 3C are schematic cross-sectional views of a manufacturing method of a package carrier according to another embodiment of the present invention. FIGS. 3D to 3H are schematic cross-sectional views illustrating a manufacturing method for disposing a chip on the package carrier shown in FIG. 3C to form a chip package structure. FIG. 4A is a schematic cross-sectional view of a chip package structure according to an embodiment of the present invention. FIG. 4B is a schematic cross-sectional view of a chip package structure according to an embodiment of the present invention. 5A to 5D are schematic bottom views of various package carriers according to various embodiments of the present invention.

100a:封裝載板 100a: Package carrier board

110:連接結構層 110:Connection structure layer

112:基材 112: Substrate

114:接墊 114: Pad

120:第一重分佈線路結構層 120: The first redistribution line structure layer

130a:導電連接件 130a: Conductive connector

140a:加強筋 140a: reinforcement

150:封裝膠體 150: encapsulation colloid

F1:第一表面 F1: first surface

F2:第二表面 F2: second surface

S1:頂表面 S1: top surface

S2:底表面 S2: bottom surface

S3:上表面 S3: upper surface

S4:下表面 S4: lower surface

Claims (20)

一種封裝載板,包括: 第一重分佈線路結構層,具有彼此相對的第一表面與第二表面; 多個導電連接件,配置於該第一重分佈線路結構層的該第一表面上,且與該第一重分佈線路結構層電性連接; 連接結構層,配置於該第一重分佈線路結構層的該第二表面上,該連接結構層包括基材與多個接墊,各該接墊的頂表面與底表面分別暴露於該基材的上表面與下表面,且該些接墊與該第一重分佈線路結構層電性連接; 至少一加強筋,配置於該第一重分佈線路結構層的該第一表面上,且至少位於該些導電連接件之間;以及 封裝膠體,配置於該第一重分佈線路結構層的該第一表面上,且覆蓋該些導電連接件與該至少一加強筋。 A package carrier, comprising: The first redistribution circuit structure layer has a first surface and a second surface opposite to each other; a plurality of conductive connectors disposed on the first surface of the first redistribution wiring structure layer and electrically connected to the first redistribution wiring structure layer; a connection structure layer configured on the second surface of the first redistribution circuit structure layer, the connection structure layer includes a base material and a plurality of pads, the top surface and the bottom surface of each pad are respectively exposed to the base material and the pads are electrically connected to the first redistribution circuit structure layer; At least one rib is disposed on the first surface of the first redistribution wiring structure layer and at least located between the conductive connectors; and The encapsulant is disposed on the first surface of the first redistribution wiring structure layer, and covers the conductive connectors and the at least one reinforcing rib. 如請求項1所述的封裝載板,其中各該導電連接件包括銲球或銅柱。The package carrier as claimed in claim 1, wherein each of the conductive connectors includes solder balls or copper pillars. 如請求項1所述的封裝載板,更包括: 第二重分佈線路結構層,配置於該第一重分佈線路結構層的該第一表面上,且位於該些導電連接件與該第一重分佈線路結構層之間,其中該些導電連接件透過該第二重分佈線路結構層與該第一重分佈線路結構層電性連接。 The packaging carrier board as described in claim item 1 further includes: The second redistribution circuit structure layer is configured on the first surface of the first redistribution circuit structure layer, and is located between the conductive connectors and the first redistribution circuit structure layer, wherein the conductive connectors The second redistribution circuit structure layer is electrically connected to the first redistribution circuit structure layer. 如請求項3所述的封裝載板,其中該第二重分佈線路結構層的線寬與線距大於該第一重分佈線路結構層的線寬與線距。The package carrier as claimed in claim 3, wherein the line width and line spacing of the second redistribution wiring structure layer are larger than the line width and line spacing of the first redistribution wiring structure layer. 如請求項1所述的封裝載板,更包括: 增層結構層,配置於該第一重分佈線路結構層的該第一表面上,且位於該些導電連接件與該第一重分佈線路結構層之間,該增層結構層包括玻纖基板、第一圖案化導電層、第二圖案化導電層、至少一第一導通孔、至少一第二導通孔及至少一第三導通孔,該第一圖案化導電層與該第二圖案化導電層分別位於該玻纖基板的相對兩側,該至少一第三導通孔貫穿該玻纖基板且電性連接該第一圖案化導電層與該至少一第二導通孔,而該第一圖案化導電層透過該至少一第一導通孔與該第一重分佈線路結構層電性連接,該第二圖案化導電層透過該至少一第二導通孔與該至少一第一導通孔電性連接,該些導電連接件連接該第二圖化導電層且透過該增層結構層與該第一重分佈線路結構層電性連接。 The packaging carrier board as described in claim item 1 further includes: A build-up structure layer, configured on the first surface of the first redistribution circuit structure layer, and located between the conductive connectors and the first redistribution circuit structure layer, the build-up structure layer comprising a glass fiber substrate , a first patterned conductive layer, a second patterned conductive layer, at least one first via hole, at least one second via hole and at least one third via hole, the first patterned conductive layer and the second patterned conductive layer Layers are respectively located on opposite sides of the fiberglass substrate, the at least one third via hole penetrates the fiberglass substrate and electrically connects the first patterned conductive layer and the at least one second via hole, and the first patterned conductive layer The conductive layer is electrically connected to the first redistribution circuit structure layer through the at least one first via hole, and the second patterned conductive layer is electrically connected to the at least one first via hole through the at least one second via hole, The conductive connectors are connected to the second patterned conductive layer and electrically connected to the first redistribution wiring structure layer through the build-up structure layer. 如請求項1所述的封裝載板,其中該至少一加強筋具有長度,而該封裝膠體具有厚度,該長度小於或等於該厚度。The package carrier as claimed in claim 1, wherein the at least one rib has a length, and the encapsulant has a thickness, and the length is less than or equal to the thickness. 如請求項1所述的封裝載板,其中該連接結構層的該基材的材質包括玻璃或矽。The package carrier as claimed in claim 1, wherein the material of the base material of the connection structure layer includes glass or silicon. 如請求項1所述的封裝載板,其中該至少一加強筋的材質包括鋼、鋁、銅、矽或玻璃。The package carrier as claimed in claim 1, wherein the material of the at least one rib includes steel, aluminum, copper, silicon or glass. 如請求項1所述的封裝載板,其中該至少一加強筋為多個加強筋,且該些加強筋彼此分散排列或排列成網格狀。The package carrier as claimed in claim 1, wherein the at least one rib is a plurality of ribs, and the ribs are arranged in a dispersed manner or in a grid. 如請求項1所述的封裝載板,其中該至少一加強筋為連續結構層。The package carrier as claimed in claim 1, wherein the at least one rib is a continuous structural layer. 一種封裝載板的製作方法,包括: 提供基底與多個導電條,該些導電條內嵌於該基底內,且各該導電條的一端暴露於該基底的一側; 形成第一重分佈線路結構層於該基底的該側上; 形成多個導電連接件以及至少一加強筋於該第一重分佈線路結構層上,其中該至少一加強筋至少位於該些導電連接件之間; 形成封裝膠體於該第一重分佈線路結構層上,以覆蓋該些導電連接件與該至少一加強筋;以及 移除部分該基底與部分該些導電條,而形成連接結構層,該連接結構層包括基材與多個接墊,且各該接墊的頂表面與底表面分別暴露於該基材的上表面與下表面。 A method for manufacturing a package carrier board, comprising: A base and a plurality of conductive strips are provided, the conductive strips are embedded in the base, and one end of each of the conductive strips is exposed to one side of the base; forming a first redistribution wiring structure layer on the side of the substrate; forming a plurality of conductive connectors and at least one rib on the first redistribution circuit structure layer, wherein the at least one rib is at least located between the conductive connectors; forming an encapsulant on the first redistribution wiring structure layer to cover the conductive connectors and the at least one rib; and removing part of the base and part of the conductive strips to form a connection structure layer, the connection structure layer includes a base material and a plurality of pads, and the top surface and the bottom surface of each pad are respectively exposed on the base material surface and subsurface. 如請求項11所述的封裝載板的製作方法,更包括: 於形成該些導電連接件以及該至少一加強筋於該第一重分佈線路結構層上之前,形成第二重分佈線路結構層於該第一重分佈線路結構層上,其中該第二重分佈線路結構層的線寬與線距大於該第一重分佈線路結構層的線寬與線距。 The manufacturing method of the packaging carrier as described in claim item 11 further includes: Before forming the conductive connectors and the at least one rib on the first redistribution circuit structure layer, forming a second redistribution circuit structure layer on the first redistribution circuit structure layer, wherein the second redistribution circuit structure layer The line width and line spacing of the circuit structure layer are larger than the line width and line space of the first redistributed circuit structure layer. 如請求項11所述的封裝載板的製作方法,其中各該導電連接件包括銲球或銅柱。The method for manufacturing a package carrier as claimed in claim 11, wherein each of the conductive connectors includes solder balls or copper pillars. 如請求項11所述的封裝載板的製作方法,其中該至少一加強筋的材質包括鋼、鋁、銅、矽或玻璃。The method for manufacturing a package carrier as claimed in claim 11, wherein the material of the at least one rib includes steel, aluminum, copper, silicon or glass. 如請求項11所述的封裝載板的製作方法,其中該至少一加強筋具有長度,而該封裝膠體具有厚度,該長度小於或等於該厚度。The method for manufacturing a package carrier as claimed in claim 11, wherein the at least one rib has a length, and the encapsulant has a thickness, and the length is less than or equal to the thickness. 一種晶片封裝結構,包括: 封裝載板,包括: 第一重分佈線路結構層,具有彼此相對的第一表面與第二表面; 多個導電連接件,配置於該第一重分佈線路結構層的該第一表面上,且與該第一重分佈線路結構層電性連接; 連接結構層,配置於該第一重分佈線路結構層的該第二表面上,且包括基材與多個接墊,各該接墊的頂表面與底表面分別暴露於該基材的上表面與下表面,且該些接墊與該第一重分佈線路結構層電性連接; 至少一加強筋,配置於該第一重分佈線路結構層的該第一表面上,且至少位於該些導電連接件之間;以及 封裝膠體,配置於該第一重分佈線路結構層的該第一表面上,且覆蓋該些導電連接件與該至少一加強筋;以及 至少一晶片,配置於該封裝載板上,且與該連接結構層的該些接墊電性連接。 A chip packaging structure, comprising: Package carrier board, including: The first redistribution circuit structure layer has a first surface and a second surface opposite to each other; a plurality of conductive connectors disposed on the first surface of the first redistribution wiring structure layer and electrically connected to the first redistribution wiring structure layer; The connection structure layer is configured on the second surface of the first redistribution circuit structure layer, and includes a base material and a plurality of pads, the top surface and the bottom surface of each pad are respectively exposed on the upper surface of the base material and the lower surface, and the pads are electrically connected to the first redistribution circuit structure layer; At least one rib is disposed on the first surface of the first redistribution wiring structure layer and at least located between the conductive connectors; and an encapsulant, disposed on the first surface of the first redistribution wiring structure layer, and covering the conductive connectors and the at least one reinforcing rib; and At least one chip is disposed on the package carrier board and electrically connected to the pads of the connection structure layer. 如請求項16所述的晶片封裝結構,更包括: 密封材料,配置於該封裝載板的該連接結構層上,且覆蓋至少一晶片的周圍表面,其中該至少一晶片的背面暴露於該密封材料的表面。 The chip package structure as described in claim 16, further comprising: The sealing material is arranged on the connection structure layer of the packaging carrier and covers the peripheral surface of at least one chip, wherein the backside of the at least one chip is exposed on the surface of the sealing material. 如請求項16所述的晶片封裝結構,其中該至少一晶片透過微焊錫接點接合或混合鍵結接合而與該些接墊電性連接。The chip package structure as claimed in claim 16, wherein the at least one chip is electrically connected to the pads through micro-solder joint bonding or hybrid bonding bonding. 如請求項16所述的晶片封裝結構,其中該封裝膠體至少暴露出各該導電連接件的第一底面。The chip package structure as claimed in claim 16, wherein the encapsulant at least exposes the first bottom surface of each of the conductive connectors. 如請求項19所述的晶片封裝結構,其中該封裝膠體還暴露出各該加強筋的第二底面。The chip package structure as claimed in claim 19, wherein the encapsulant also exposes the second bottom surface of each rib.
TW110138515A 2021-05-11 2021-10-18 Package carrier and manufacturing method thereof and chip package structure TW202245160A (en)

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