TW202233718A - Curable resin composition, prepreg, and cured product of same - Google Patents
Curable resin composition, prepreg, and cured product of same Download PDFInfo
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- TW202233718A TW202233718A TW111106963A TW111106963A TW202233718A TW 202233718 A TW202233718 A TW 202233718A TW 111106963 A TW111106963 A TW 111106963A TW 111106963 A TW111106963 A TW 111106963A TW 202233718 A TW202233718 A TW 202233718A
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- Prior art keywords
- resin composition
- curable resin
- compound
- acid
- bis
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 62
- -1 maleimide compound Chemical class 0.000 claims abstract description 85
- 150000001875 compounds Chemical class 0.000 claims abstract description 60
- 229920001955 polyphenylene ether Polymers 0.000 claims abstract description 30
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 7
- 239000000463 material Substances 0.000 claims description 15
- 239000000835 fiber Substances 0.000 claims description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 15
- 239000011889 copper foil Substances 0.000 abstract description 15
- 229920005989 resin Polymers 0.000 description 81
- 239000011347 resin Substances 0.000 description 81
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 67
- 239000002904 solvent Substances 0.000 description 41
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 40
- 238000006243 chemical reaction Methods 0.000 description 39
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 30
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 26
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 19
- 239000003054 catalyst Substances 0.000 description 19
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 18
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 18
- 150000002148 esters Chemical class 0.000 description 15
- 239000000243 solution Substances 0.000 description 15
- 150000004982 aromatic amines Chemical class 0.000 description 14
- 238000005227 gel permeation chromatography Methods 0.000 description 14
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 13
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 12
- 239000003822 epoxy resin Substances 0.000 description 12
- 239000011521 glass Substances 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- 150000002989 phenols Chemical class 0.000 description 12
- 229920000647 polyepoxide Polymers 0.000 description 12
- 238000012360 testing method Methods 0.000 description 12
- 238000010521 absorption reaction Methods 0.000 description 11
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 11
- 239000011976 maleic acid Substances 0.000 description 11
- 238000005259 measurement Methods 0.000 description 11
- 229920003986 novolac Polymers 0.000 description 11
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 11
- 239000002966 varnish Substances 0.000 description 11
- 239000002253 acid Substances 0.000 description 10
- 150000001412 amines Chemical class 0.000 description 10
- 238000004458 analytical method Methods 0.000 description 10
- 239000010410 layer Substances 0.000 description 10
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 10
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 9
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 9
- 239000005011 phenolic resin Substances 0.000 description 9
- 239000004805 Cyclohexane-1,2-dicarboxylic acid Substances 0.000 description 8
- 239000002585 base Substances 0.000 description 8
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 8
- 239000004744 fabric Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 238000002156 mixing Methods 0.000 description 8
- 229910052698 phosphorus Inorganic materials 0.000 description 8
- 239000011574 phosphorus Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 239000012948 isocyanate Substances 0.000 description 7
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 7
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 7
- 229920001721 polyimide Polymers 0.000 description 7
- 238000010992 reflux Methods 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 229920000049 Carbon (fiber) Polymers 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- TYMZLIDQEUWXEL-UHFFFAOYSA-N bis(2,3-dimethylphenyl) hydrogen phosphate Chemical compound CC1=CC=CC(OP(O)(=O)OC=2C(=C(C)C=CC=2)C)=C1C TYMZLIDQEUWXEL-UHFFFAOYSA-N 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 239000004917 carbon fiber Substances 0.000 description 6
- 150000002513 isocyanates Chemical class 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229940098779 methanesulfonic acid Drugs 0.000 description 6
- 238000000465 moulding Methods 0.000 description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- 239000002798 polar solvent Substances 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- XKZQKPRCPNGNFR-UHFFFAOYSA-N 2-(3-hydroxyphenyl)phenol Chemical class OC1=CC=CC(C=2C(=CC=CC=2)O)=C1 XKZQKPRCPNGNFR-UHFFFAOYSA-N 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical class OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 230000002378 acidificating effect Effects 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 150000001336 alkenes Chemical class 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 5
- 239000004643 cyanate ester Substances 0.000 description 5
- 238000006297 dehydration reaction Methods 0.000 description 5
- 238000004128 high performance liquid chromatography Methods 0.000 description 5
- 239000004611 light stabiliser Substances 0.000 description 5
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 5
- 229920003192 poly(bis maleimide) Polymers 0.000 description 5
- 239000004848 polyfunctional curative Substances 0.000 description 5
- 239000003566 sealing material Substances 0.000 description 5
- 239000002759 woven fabric Substances 0.000 description 5
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical group C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 description 4
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 4
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical class C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 4
- 238000004891 communication Methods 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 230000018044 dehydration Effects 0.000 description 4
- 230000002349 favourable effect Effects 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- 239000003365 glass fiber Substances 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 4
- 150000002978 peroxides Chemical class 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 239000007870 radical polymerization initiator Substances 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical class OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- ZZHIDJWUJRKHGX-UHFFFAOYSA-N 1,4-bis(chloromethyl)benzene Chemical compound ClCC1=CC=C(CCl)C=C1 ZZHIDJWUJRKHGX-UHFFFAOYSA-N 0.000 description 3
- MODAACUAXYPNJH-UHFFFAOYSA-N 1-(methoxymethyl)-4-[4-(methoxymethyl)phenyl]benzene Chemical group C1=CC(COC)=CC=C1C1=CC=C(COC)C=C1 MODAACUAXYPNJH-UHFFFAOYSA-N 0.000 description 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical class C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 3
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
- KWOIWTRRPFHBSI-UHFFFAOYSA-N 4-[2-[3-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=CC(C(C)(C)C=2C=CC(N)=CC=2)=CC=1C(C)(C)C1=CC=C(N)C=C1 KWOIWTRRPFHBSI-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- 229920000459 Nitrile rubber Polymers 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000010533 azeotropic distillation Methods 0.000 description 3
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical group O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000006837 decompression Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 3
- 229920006122 polyamide resin Polymers 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000003799 water insoluble solvent Substances 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- KJPRLNWUNMBNBZ-QPJJXVBHSA-N (E)-cinnamaldehyde Chemical compound O=C\C=C\C1=CC=CC=C1 KJPRLNWUNMBNBZ-QPJJXVBHSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 2
- PBLZLIFKVPJDCO-UHFFFAOYSA-N 12-aminododecanoic acid Chemical compound NCCCCCCCCCCCC(O)=O PBLZLIFKVPJDCO-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- KSMBFKMHJGVFQO-UHFFFAOYSA-N 2-[2-(2-hydroxypropan-2-yl)phenyl]propan-2-ol Chemical compound CC(C)(O)C1=CC=CC=C1C(C)(C)O KSMBFKMHJGVFQO-UHFFFAOYSA-N 0.000 description 2
- MLPVBIWIRCKMJV-UHFFFAOYSA-N 2-ethylaniline Chemical compound CCC1=CC=CC=C1N MLPVBIWIRCKMJV-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical group C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- AMNPXXIGUOKIPP-UHFFFAOYSA-N [4-(carbamothioylamino)phenyl]thiourea Chemical compound NC(=S)NC1=CC=C(NC(N)=S)C=C1 AMNPXXIGUOKIPP-UHFFFAOYSA-N 0.000 description 2
- BWVAOONFBYYRHY-UHFFFAOYSA-N [4-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=C(CO)C=C1 BWVAOONFBYYRHY-UHFFFAOYSA-N 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 239000010425 asbestos Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 150000004074 biphenyls Chemical class 0.000 description 2
- FLPKSBDJMLUTEX-UHFFFAOYSA-N bis(1,2,2,6,6-pentamethylpiperidin-4-yl) 2-butyl-2-[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]propanedioate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)C(C(=O)OC1CC(C)(C)N(C)C(C)(C)C1)(CCCC)CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 FLPKSBDJMLUTEX-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 2
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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- WYKYCHHWIJXDAO-UHFFFAOYSA-N tert-butyl 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOC(C)(C)C WYKYCHHWIJXDAO-UHFFFAOYSA-N 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- BWSZXUOMATYHHI-UHFFFAOYSA-N tert-butyl octaneperoxoate Chemical compound CCCCCCCC(=O)OOC(C)(C)C BWSZXUOMATYHHI-UHFFFAOYSA-N 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical class CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- XGSHEASGZHYHBU-UHFFFAOYSA-N tetradecane-1,1-diamine Chemical compound CCCCCCCCCCCCCC(N)N XGSHEASGZHYHBU-UHFFFAOYSA-N 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- BJIOGJUNALELMI-UHFFFAOYSA-N trans-isoeugenol Natural products COC1=CC(C=CC)=CC=C1O BJIOGJUNALELMI-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003623 transition metal compounds Chemical class 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- 238000005829 trimerization reaction Methods 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- CAPOZRICGSDRLP-UHFFFAOYSA-N tris(2,3-dimethylphenyl) phosphate Chemical compound CC1=CC=CC(OP(=O)(OC=2C(=C(C)C=CC=2)C)OC=2C(=C(C)C=CC=2)C)=C1C CAPOZRICGSDRLP-UHFFFAOYSA-N 0.000 description 1
- XJIAZXYLMDIWLU-UHFFFAOYSA-N undecane-1,1-diamine Chemical compound CCCCCCCCCCC(N)N XJIAZXYLMDIWLU-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 150000003752 zinc compounds Chemical class 0.000 description 1
- 229940105125 zinc myristate Drugs 0.000 description 1
- JRHDFVNUWLMGBU-UHFFFAOYSA-L zinc octyl phosphate Chemical compound C(CCCCCCC)OP(=O)([O-])[O-].[Zn+2] JRHDFVNUWLMGBU-UHFFFAOYSA-L 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
- IFNXAMCERSVZCV-UHFFFAOYSA-L zinc;2-ethylhexanoate Chemical compound [Zn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O IFNXAMCERSVZCV-UHFFFAOYSA-L 0.000 description 1
- IJQXGKBNDNQWAT-UHFFFAOYSA-L zinc;docosanoate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCCCCCC([O-])=O IJQXGKBNDNQWAT-UHFFFAOYSA-L 0.000 description 1
- PORPEXMDRRVVNF-UHFFFAOYSA-L zinc;octadecyl phosphate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCCOP([O-])([O-])=O PORPEXMDRRVVNF-UHFFFAOYSA-L 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
- GBFLQPIIIRJQLU-UHFFFAOYSA-L zinc;tetradecanoate Chemical compound [Zn+2].CCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCC([O-])=O GBFLQPIIIRJQLU-UHFFFAOYSA-L 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
Abstract
Description
本發明是有關於一種硬化性樹脂組成物、預浸體及其硬化物,可較佳地用於半導體密封材、印刷配線基板、增層積層板等電氣/電子零件、碳纖維強化塑膠、玻璃纖維強化塑膠等輕量高強度材料、三維(three dimensional,3D)列印用途中。The present invention relates to a curable resin composition, a prepreg and a cured product thereof, which can be preferably used in electrical/electronic parts such as semiconductor sealing materials, printed wiring boards, build-up laminates, carbon fiber reinforced plastics, glass fiber Lightweight and high-strength materials such as reinforced plastics, and three-dimensional (3D) printing applications.
近年來,搭載電氣/電子零件的積層板由於其利用領域的擴大,要求特性廣泛且高度化。例如,先前,半導體晶片的主流為搭載於金屬製的引線框架,但中央處理單元(central processing unit,CPU)等具有高處理能力的半導體晶片大多搭載於由高分子材料製成的積層板。隨著CPU等元件的高速化發展而時鐘頻率變高,訊號傳播延遲或傳輸損耗成為問題,對配線板要求低介電常數化或低介電損耗角正切化。In recent years, due to the expansion of the field of use of the laminated board on which electric/electronic components are mounted, a wide range of properties and heightened requirements are required. For example, conventionally, semiconductor chips are mainly mounted on metal lead frames, but semiconductor chips with high processing capabilities such as central processing units (CPUs) are often mounted on laminates made of polymer materials. With the development of high-speed components such as CPUs and the increase in clock frequency, signal propagation delay and transmission loss have become problems, and wiring boards are required to have a low dielectric constant or a low dielectric loss tangent.
就通訊技術發展的方面而言,近年來的第五代行動通訊(fifth generation,5G)的時機正在形成,預期不僅使用Sub6的通訊器件、而且使用10 GHz以上、特別是28 GHz以上的準毫米波、毫米波的通訊器件將爆發式地增加,於基站、天線、通訊器件中,需要對應於高頻的基板材料。於該些基板材料等中,為了不使傳輸速度降低,重視高度的介電特性(特別是介電損耗角正切),要求可於該些區域中穩定地使用的材料。In terms of the development of communication technology, the fifth generation (5G) is taking shape in recent years, and it is expected to use not only Sub6 communication devices, but also quasi-millimeters above 10 GHz, especially 28 GHz. Wave and millimeter wave communication devices will increase explosively. In base stations, antennas, and communication devices, substrate materials corresponding to high frequencies are required. Among these substrate materials and the like, in order not to lower the transmission speed, high dielectric properties (in particular, dielectric loss tangent) are emphasized, and materials that can be stably used in these regions are required.
另外,近年來,由於行動電話等行動電子設備的普及,精密電子設備開始被攜帶至室外環境或於人體的極近處使用,因此需要具有對外部環境(特別是耐濕熱環境)的耐性。進而,於汽車領域中,電子化迅速發展,有時亦會於發動機的附近配置精密電子設備,對耐熱/耐濕性有更高水準的要求。In addition, in recent years, due to the popularization of mobile electronic devices such as mobile phones, precision electronic devices have been carried to outdoor environments or used in close proximity to the human body. Therefore, resistance to external environments (especially heat-and-moisture environments) is required. Furthermore, in the field of automobiles, with the rapid development of electronics, precision electronic devices are sometimes placed near the engine, and higher levels of heat and humidity resistance are required.
使用了如專利文獻1般的併用雙酚A型氰酸酯化合物與雙馬來醯亞胺化合物的樹脂即BT樹脂的配線板由於耐熱性、耐化學品、介電特性等優異,因此,被廣泛用作高性能配線板,但為了應對如上所述的進一步的高性能,需要加以改善。Wiring boards using BT resin, which is a resin that uses a bisphenol A-type cyanate ester compound and a bismaleimide compound in combination as in Patent Document 1, are excellent in heat resistance, chemical resistance, dielectric properties, and the like. It is widely used as a high-performance wiring board, but needs to be improved in order to cope with further high performance as described above.
於此種情況下,可於市場上獲取的馬來醯亞胺樹脂與上述用途中以往所使用的環氧樹脂等相比,耐熱性大幅提高,於高頻區域下發揮優異的介電特性,但具有高耐熱性的馬來醯亞胺樹脂具有以下缺點:耐濕性低,另外由於為剛性而脆,對銅箔的接著力亦低。In this case, the commercially available maleimide resins have significantly improved heat resistance compared to epoxy resins conventionally used in the above-mentioned applications, and exhibit excellent dielectric properties in the high-frequency region. However, the maleimide resin having high heat resistance has the following disadvantages: low moisture resistance, brittleness due to rigidity, and low adhesion to copper foil.
相對於此,亦對如專利文獻2、專利文獻3般的馬來醯亞胺樹脂進行了開發,但尚不可謂之充分。On the other hand, maleimide resins such as Patent Document 2 and Patent Document 3 have also been developed, but they are not sufficient.
另外,提出了如專利文獻4般的包含馬來醯亞胺樹脂與含丙烯基的酚樹脂的組成物,但於硬化反應時不參與反應的酚性羥基會殘存,因此除了介電特性不充分以外,亦有吸水率高的問題。 [現有技術文獻] [專利文獻] In addition, a composition comprising a maleimide resin and a propylene group-containing phenol resin as in Patent Document 4 has been proposed, but the phenolic hydroxyl group that does not participate in the reaction at the time of curing reaction remains, so the dielectric properties are not sufficient. In addition, there is also a problem of high water absorption. [Prior Art Literature] [Patent Literature]
[專利文獻1]日本專利特公昭54-30440號公報 [專利文獻2]日本專利特開平3-100016號公報 [專利文獻3]日本專利第5030297號公報 [專利文獻4]日本專利特開平04-359911號公報 [專利文獻5]日本專利特公平4-75222號公報 [專利文獻6]日本專利特公平6-37465號公報 [Patent Document 1] Japanese Patent Publication No. 54-30440 [Patent Document 2] Japanese Patent Laid-Open No. 3-100016 [Patent Document 3] Japanese Patent No. 5030297 [Patent Document 4] Japanese Patent Laid-Open No. 04-359911 [Patent Document 5] Japanese Patent Laid-Open No. 4-75222 [Patent Document 6] Japanese Patent Laid-Open No. 6-37465
[發明所欲解決之課題] 本發明是鑒於此種狀況而成者,其目的在於提供一種顯示出優異的耐熱性、銅箔剝離強度、介電特性、耐濕性的硬化性樹脂組成物及其硬化物。 [解決課題之手段] [The problem to be solved by the invention] The present invention was made in view of such a situation, and an object thereof is to provide a curable resin composition and a cured product thereof exhibiting excellent heat resistance, copper foil peel strength, dielectric properties, and moisture resistance. [Means of Solving Problems]
本發明者等人為解決上述課題進行了努力研究,結果發現,包含具有特定結構的馬來醯亞胺化合物與具有不飽和雙鍵的聚苯醚化合物的硬化性樹脂組成物的硬化物的耐熱性、銅箔剝離強度、介電特性、耐濕性優異,從而完成了本發明。The inventors of the present invention have made diligent studies to solve the above-mentioned problems, and as a result, found that the heat resistance of a cured product of a curable resin composition comprising a maleimide compound having a specific structure and a polyphenylene ether compound having an unsaturated double bond , copper foil peeling strength, dielectric properties, and moisture resistance are excellent, thereby completing the present invention.
即,本發明是有關於以下的[1]~[7]。 [1] 一種硬化性樹脂組成物,含有下述式(1)所表示的馬來醯亞胺化合物(A)、以及具有不飽和雙鍵的聚苯醚化合物(B),成分(A)與成分(B)的重量比率為50/50~5/95。 That is, the present invention relates to the following [1] to [7]. [1] A curable resin composition comprising a maleimide compound (A) represented by the following formula (1), a polyphenylene ether compound (B) having an unsaturated double bond, a component (A) and a component (B) ) in a weight ratio of 50/50 to 5/95.
[化1] [hua 1]
(式(1)中,R表示氫原子或甲基。m表示0~3的整數。n為重複數,其平均值為1<n<5。) [2] 一種硬化性樹脂組成物,含有下述式(1)所表示的馬來醯亞胺化合物(A)、以及具有不飽和雙鍵的聚苯醚化合物(B),相對於成分(A)1當量,成分(B)為0.20當量~4.2當量。 (In formula (1), R represents a hydrogen atom or a methyl group. m represents an integer of 0 to 3. n is a repeating number, and the average value is 1<n<5.) [2] A curable resin composition containing a maleimide compound (A) represented by the following formula (1) and a polyphenylene ether compound (B) having an unsaturated double bond in an amount of 1 equivalent relative to the component (A) , the component (B) is 0.20 to 4.2 equivalents.
[化2] [hua 2]
(式(1)中,R表示氫原子或甲基。m表示0~3的整數。n為重複數,其平均值為1<n<5。) [3] 如前項[1]或[2]所述的硬化性樹脂組成物,其中,所述成分(B)為具有(甲基)丙烯酸基的聚苯醚化合物。 [4] 如前項[1]至[3]中任一項所述的硬化性樹脂組成物,其中,所述成分(B)為下述式(2)所表示的化合物或下述式(4)所表示的化合物。 (In formula (1), R represents a hydrogen atom or a methyl group. m represents an integer of 0 to 3. n is a repeating number, and the average value is 1<n<5.) [3] The curable resin composition according to the above item [1] or [2], wherein the component (B) is a polyphenylene ether compound having a (meth)acrylic group. [4] The curable resin composition according to any one of the above items [1] to [3], wherein the component (B) is a compound represented by the following formula (2) or a compound represented by the following formula (4) compound of.
[化3] [hua 3]
(式(2)中,n為重複數,其平均值為1<n<10。)(In formula (2), n is the number of repetitions, and the average value thereof is 1<n<10.)
[化4] [hua 4]
(式(4)中,n為重複數,其平均值為1<n<10。) [5] 如前項[1]至[4]中任一項所述的硬化性樹脂組成物,更含有硬化促進劑。 [6] 一種預浸體,將如前項[1]至[5]中任一項所述的硬化性樹脂組成物保持於片狀的纖維基材的中而成。 [7] 一種硬化物,將如前項[1]至[5]中任一項所述的硬化性樹脂組成物、或如前項[6]所述的預浸體硬化而得。 [發明的效果] (In formula (4), n is the number of repetitions, and the average value thereof is 1<n<10.) [5] The curable resin composition according to any one of [1] to [4] above, which further contains a curing accelerator. [6] A prepreg obtained by holding the curable resin composition according to any one of the above items [1] to [5] in a sheet-like fiber base material. [7] A cured product obtained by curing the curable resin composition according to any one of the above [1] to [5], or the prepreg according to the above [6]. [Effect of invention]
本發明的硬化性樹脂組成物的硬化物具有耐熱性、銅箔剝離強度、介電特性、耐濕性優異的效果。The cured product of the curable resin composition of the present invention has the effect of being excellent in heat resistance, copper foil peel strength, dielectric properties, and moisture resistance.
以下對本發明的硬化性樹脂組成物進行說明。 本發明的硬化性樹脂組成物含有下述式(1)所表示的馬來醯亞胺化合物(以下,亦稱為成分(A)。)、具有不飽和雙鍵的聚苯醚化合物(以下,亦稱為成分(B)。)。 The curable resin composition of the present invention will be described below. The curable resin composition of the present invention contains a maleimide compound (hereinafter, also referred to as component (A)) represented by the following formula (1), and a polyphenylene ether compound having an unsaturated double bond (hereinafter, Also known as ingredient (B).).
[化5] [hua 5]
(式(1)中,R表示氫原子或甲基。m表示0~3的整數。n為重複數,其平均值為1<n<5)(In formula (1), R represents a hydrogen atom or a methyl group. m represents an integer of 0 to 3. n is a repeating number, and the average value is 1<n<5)
所述式(1)所表示的化合物特佳為由下述式(1-a)表示時。The compound represented by the formula (1) is particularly preferably represented by the following formula (1-a).
[化6] [hua 6]
所述式(1)中,n的值可根據藉由馬來醯亞胺樹脂的凝膠滲透層析法(GPC,檢測器:RI(折射率(refractive index))的測定而求出的數量平均分子量的值、或者分離出的峰各自的面積比來算出。In the above formula (1), the value of n can be obtained from the number obtained by measuring the gel permeation chromatography (GPC, detector: RI (refractive index)) of a maleimide resin The value of the average molecular weight or the area ratio of each of the separated peaks was calculated.
所述式(1)中,於n=1的情況下,於溶劑中的溶解性低,另外,於n為5以上的情況下,成型時的流動性變差,無法充分發揮作為硬化物的特性。In the above formula (1), when n=1, the solubility in the solvent is low, and when n is 5 or more, the fluidity at the time of molding is deteriorated, and the cured product cannot be sufficiently exhibited. characteristic.
成分(A)較佳為具有分子量分佈,所述式(1)中,n=1體的藉由GPC分析(RI)而得的含量較佳為98面積%以下、更佳為20面積%~90面積%、進而較佳為30面積%~80面積%、特佳為40面積%~80面積%的範圍。若n=1體的含量為98面積%以下,則耐熱性變得良好。另外,結晶性降低,溶劑溶解性變得良好。另一方面,若n=1體的下限值為20面積%以上,則樹脂溶液的黏度降低,含浸性變得良好。另外,作為固體取出時可於低溫下將溶劑去除,因此不易發生自聚合,操作變得容易。The component (A) preferably has a molecular weight distribution, and in the formula (1), the content obtained by GPC analysis (RI) of n=1 body is preferably 98 area % or less, more preferably 20 area % to 90 area %, more preferably 30 area % to 80 area %, particularly preferably 40 area % to 80 area %. Heat resistance becomes favorable as content of n=1 body is 98 area % or less. In addition, the crystallinity decreased, and the solvent solubility became favorable. On the other hand, when the lower limit value of n=1 body is 20 area % or more, the viscosity of the resin solution decreases, and the impregnation property becomes favorable. In addition, since the solvent can be removed at low temperature when taken out as a solid, self-polymerization does not easily occur, and the handling becomes easy.
成分(A)藉由增加相對於馬來醯亞胺基的配向性不同的非對稱結構的比例,溶劑溶解性變得良好,另外,於其硬化物中可提高介電特性。所述式(1)的n=1體中的配向比可根據高效液相層析法(high performance liquid chromatography,HPLC)分析(225 nm)來求出,鄰-對位體較佳為於n=1體總量中為30面積%以上且小於60面積%,進而較佳為35面積%以上且小於55面積%,特佳為40面積%以上且小於55面積%。Component (A) increases the proportion of asymmetric structures having different orientations with respect to maleimide groups, so that solvent solubility becomes favorable, and dielectric properties can be improved in the cured product. The alignment ratio in the n=1 body of the formula (1) can be obtained according to high performance liquid chromatography (high performance liquid chromatography, HPLC) analysis (225 nm), and the ortho-para body is preferably n = 30 area % or more and less than 60 area % in the total body amount, more preferably 35 area % or more and less than 55 area %, particularly preferably 40 area % or more and less than 55 area %.
成分(A)的軟化點較佳為50℃~150℃,更佳為80℃~120℃,進而較佳為90℃~120℃,特佳為95℃~120℃。另外,150℃下的熔融黏度為0.05 Pa·s~100 Pa·s,較佳為0.1 Pa·s~40 Pa·s。The softening point of the component (A) is preferably 50°C to 150°C, more preferably 80°C to 120°C, further preferably 90°C to 120°C, particularly preferably 95°C to 120°C. In addition, the melt viscosity at 150°C is 0.05 Pa·s to 100 Pa·s, preferably 0.1 Pa·s to 40 Pa·s.
以下,對成分(A)的製造方法進行說明,但並不限定於本製法。Hereinafter, although the manufacturing method of a component (A) is demonstrated, it is not limited to this manufacturing method.
[芳香族胺樹脂的製造方法] 成分(A)可使用下述式(3)所表示的芳香族胺樹脂作為前驅物。 [Manufacturing method of aromatic amine resin] As the component (A), an aromatic amine resin represented by the following formula (3) can be used as a precursor.
[化7] [hua 7]
(式(3)中,R表示氫原子或甲基。m表示0~3的整數。n為重複數,其平均值為1<n<5。)(In formula (3), R represents a hydrogen atom or a methyl group. m represents an integer of 0 to 3. n is a repeating number, and the average value is 1<n<5.)
所述式(3)所表示的芳香族胺樹脂的製法並無特別限定,例如,於專利文獻5中,藉由使苯胺與間二異丙烯基苯或間二(α-羥基異丙基)苯於酸性觸媒的存在下、於180℃~250℃下進行反應而獲得所述式(3)中的n=1體作為主成分。於n=1體中,包含如1,3-雙(對胺基枯基)苯、1,3-雙(鄰胺基枯基)苯般的相對於苯胺2分子的配向性相同的對稱結構的化合物;如1-(鄰胺基枯基)-3-(對胺基枯基)苯般的相對於苯胺2分子的配向性不同的非對稱結構的化合物的三個異構體。進而,亦生成n=2~5體作為副成分,但於專利文獻5中,藉由晶析對該些進行精製而獲得了純度98%的1,3-雙(對胺基枯基)苯。另外,於專利文獻6中,將1,3-雙(對胺基枯基)苯加以馬來醯亞胺化來合成N,N'-(1,3-伸苯基-二-(2,2-亞丙基)-二-對伸苯基)雙馬來醯亞胺,獲得了作為結晶的生成物,但為了將其溶解於溶劑中而需要加熱,且若於加熱後放置於室溫下,則於數小時內結晶析出。因此,於對樹脂組成物進行調整的情況下亦有析出結晶的可能性,N,N'-(1,3-伸苯基-二-(2,2-亞丙基)-二-對伸苯基)雙馬來醯亞胺的濃度越高,結晶化的可能性越高。為了製作印刷配線板或複合材料而使玻璃布或碳纖維含浸於清漆中並使樹脂附著,但若結晶析出,則無法進行含浸作業,另一方面,若為了保持溶解狀態而提高溫度,則組成物的反應會加快,清漆的可使用時間變短。The method for producing the aromatic amine resin represented by the formula (3) is not particularly limited. Benzene is reacted at 180°C to 250°C in the presence of an acidic catalyst to obtain the n=1 body in the formula (3) as a main component. In the body of n=1, it contains a symmetrical structure with the same alignment with respect to 2 molecules of aniline, such as 1,3-bis(p-aminocumyl)benzene and 1,3-bis(o-aminocumyl)benzene The compound; such as 1-(o-aminocumyl)-3-(p-aminocumyl)benzene, three isomers of asymmetric structure compounds with different orientations relative to aniline 2 molecules. Furthermore, n=2 to 5 forms are also produced as subcomponents, but in Patent Document 5, these are purified by crystallization to obtain 1,3-bis(p-aminocumyl)benzene with a purity of 98% . In addition, in Patent Document 6, 1,3-bis(p-aminocumyl)benzene is maleimidized to synthesize N,N'-(1,3-phenylene-bis-(2, 2-Propylidene)-bis-p-phenylene)bismaleimide, obtained as a crystalline product, but it needs to be heated in order to dissolve it in a solvent, and if it is placed at room temperature after heating , it crystallizes out within a few hours. Therefore, there is a possibility of precipitation of crystals even when the resin composition is adjusted. N,N'-(1,3-phenylene-bis-(2,2-propylene)-bis-paratylene The higher the concentration of phenyl)bismaleimide, the higher the likelihood of crystallization. In order to produce printed wiring boards or composite materials, glass cloth or carbon fiber is impregnated in varnish to adhere resin. However, if crystals are precipitated, impregnation cannot be performed. On the other hand, if the temperature is increased to maintain the dissolved state, the composition will The reaction of the varnish will be accelerated and the working time of the varnish will be shortened.
當合成所述式(3)所表示的芳香族胺樹脂時,所使用的酸性觸媒可列舉鹽酸、磷酸、硫酸、甲酸、氯化鋅、氯化鐵、氯化鋁、對甲苯磺酸、甲磺酸等酸性觸媒等。於本發明中,較佳為鹽酸、對甲苯磺酸、甲磺酸等質子酸。該些可單獨使用亦可併用兩種以上。相對於所使用的苯胺100重量%,觸媒的使用量較佳為1重量%~12重量%,進而較佳為1重量%~10重量%,特佳為1重量%~7重量%,若多於12重量%,則作為目標的非對稱結構的化合物少,具有對稱結構的化合物優先形成。另一方面,若小於1%,則不僅反應的進行變慢,而且亦存在反應無法完結的情況,因此欠佳。When synthesizing the aromatic amine resin represented by the above formula (3), the acidic catalyst to be used includes hydrochloric acid, phosphoric acid, sulfuric acid, formic acid, zinc chloride, ferric chloride, aluminum chloride, p-toluenesulfonic acid, Acid catalysts such as methanesulfonic acid, etc. In the present invention, protic acids such as hydrochloric acid, p-toluenesulfonic acid, and methanesulfonic acid are preferred. These may be used alone or in combination of two or more. With respect to 100% by weight of the aniline used, the amount of catalyst used is preferably 1% by weight to 12% by weight, more preferably 1% by weight to 10% by weight, and particularly preferably 1% by weight to 7% by weight. If it exceeds 12 weight %, the target asymmetric structure compound will be few, and the compound which has a symmetrical structure will be formed preferentially. On the other hand, if it is less than 1%, not only the progress of the reaction becomes slow, but also the reaction may not be completed, so it is not preferable.
反應視需要可使用甲苯、二甲苯等有機溶劑進行,亦可在無溶劑下進行。例如,於在苯胺與溶劑的混合溶液中添加酸性觸媒後,觸媒含有水的情況下,較佳為藉由共沸而自系統內除去水。然後添加二異丙烯基苯或二(α-羥基異丙基)苯,之後一邊自系統內除去溶劑一邊升溫,於140℃~190℃、較佳為160℃~190℃下進行5小時~50小時、較佳為5小時~30小時反應。於反應溫度過高的情況下,於生成非對稱結構後會進行再鍵結,對稱結構優先形成,因此無法發揮作為目標的溶劑溶解性、電特性。使用二(α-羥基異丙基)苯時會副生成水,因此於升溫時在與溶劑共沸的同時自系統內去除。反應結束後,利用鹼水溶液中和酸性觸媒後,向油層加入非水溶性有機溶劑,反覆水洗直至廢水變為中性,之後於加熱減壓下去除溶劑及過剩的苯胺衍生物。於使用活性白土或離子交換樹脂的情況下,反應結束後過濾反應液,去除觸媒。 另外,根據反應溫度或觸媒的種類會副生成二苯胺,因此較佳為根據需要而去除。於高溫/高真空下,或者使用水蒸氣蒸餾等手段,將二苯基胺衍生物去除至1重量%以下、較佳為0.5重量%以下、更佳為0.2重量%以下。 The reaction may be performed using organic solvents such as toluene and xylene as necessary, or may be performed without a solvent. For example, when an acidic catalyst is added to a mixed solution of aniline and a solvent, and the catalyst contains water, it is preferable to remove water from the system by azeotropy. Then, diisopropenylbenzene or bis(α-hydroxyisopropyl)benzene is added, and the temperature is raised while removing the solvent from the system, and the temperature is raised at 140°C to 190°C, preferably 160°C to 190°C for 5 hours to 50°C. hours, preferably 5 to 30 hours. When the reaction temperature is too high, rebonding occurs after the asymmetric structure is formed, and the symmetric structure is preferentially formed, so that the intended solvent solubility and electrical properties cannot be exhibited. When bis(α-hydroxyisopropyl)benzene is used, water is by-produced, so it is removed from the system while azeotroping with the solvent when the temperature is raised. After the reaction was completed, the acidic catalyst was neutralized with an aqueous alkaline solution, and a water-insoluble organic solvent was added to the oil layer, and the water was repeatedly washed until the wastewater became neutral, and then the solvent and excess aniline derivatives were removed under heating and reduced pressure. In the case of using activated clay or ion exchange resin, after the reaction is completed, the reaction solution is filtered to remove the catalyst. In addition, since diphenylamine is by-produced depending on the reaction temperature and the type of catalyst, it is preferable to remove it as necessary. The diphenylamine derivative is removed to 1 wt % or less, preferably 0.5 wt % or less, and more preferably 0.2 wt % or less, under high temperature/high vacuum, or by means of steam distillation or the like.
[馬來醯亞胺樹脂的製造方法] 成分(A)可藉由以下方式獲得:使藉由以上步驟而獲得的所述式(3)所表示的芳香族胺樹脂、與馬來酸或馬來酸酐(以下,亦稱為「馬來酸無水物」。)於溶劑、觸媒的存在下進行加成或脫水縮合反應。 [Manufacturing method of maleimide resin] Component (A) can be obtained by mixing the aromatic amine resin represented by the formula (3) obtained by the above steps, with maleic acid or maleic anhydride (hereinafter, also referred to as "maleic acid"). Acid anhydrous ".) in the presence of a solvent and a catalyst for addition or dehydration condensation reaction.
反應中使用的溶劑需要自系統內去除反應中生成的水,因此較佳為使用非水溶性的溶劑。例如可列舉:甲苯、二甲苯等芳香族溶劑;環己烷、正己烷等脂肪族溶劑;二乙醚、二異丙醚等醚類;乙酸乙酯、乙酸丁酯等酯系溶劑;甲基異丁基酮、環戊酮等酮系溶劑等,但並不限定於該些,亦可併用兩種以上。The solvent used in the reaction needs to remove the water generated in the reaction from the system, so it is preferable to use a water-insoluble solvent. For example, aromatic solvents such as toluene and xylene; aliphatic solvents such as cyclohexane and n-hexane; ethers such as diethyl ether and diisopropyl ether; ester solvents such as ethyl acetate and butyl acetate; Ketone-based solvents such as butyl ketone and cyclopentanone, etc. are not limited to these, and two or more of them may be used in combination.
另外,除了所述非水溶性溶劑以外,亦可併用非質子性極性溶劑。例如可列舉二甲基碸、二甲基亞碸、二甲基甲醯胺、二甲基乙醯胺、1,3-二甲基-2-咪唑啶酮、N-甲基-2-吡咯啶酮等,亦可併用兩種以上。於使用非質子性極性溶劑的情況下,較佳為使用沸點較併用的非水溶性溶劑高者。Moreover, in addition to the said water-insoluble solvent, an aprotic polar solvent may be used together. For example, dimethylsulfoxide, dimethylsulfoxide, dimethylformamide, dimethylacetamide, 1,3-dimethyl-2-imidazolidinone, and N-methyl-2-pyrrole can be mentioned. A pyridone or the like may be used in combination of two or more. In the case of using an aprotic polar solvent, it is preferable to use one having a higher boiling point than the water-insoluble solvent used in combination.
另外,反應中使用的觸媒為酸性觸媒,並無特別限定,例如可列舉對甲苯磺酸、羥基-對甲苯磺酸、甲磺酸、硫酸、磷酸等。相對於芳香族胺樹脂,酸觸媒的使用量通常為0.1重量%~10重量%,較佳為1重量%~5重量%。In addition, the catalyst used in the reaction is an acidic catalyst, which is not particularly limited, and examples thereof include p-toluenesulfonic acid, hydroxy-p-toluenesulfonic acid, methanesulfonic acid, sulfuric acid, phosphoric acid, and the like. The usage-amount of an acid catalyst is 0.1 to 10 weight% normally with respect to an aromatic amine resin, Preferably it is 1 to 5 weight%.
例如,於甲苯與N-甲基-2-吡咯啶酮中溶解由所述式(3)所表示的芳香族胺樹脂,向其中添加馬來酸無水物而生成醯胺酸,然後加入對甲苯磺酸,一邊自系統內去除在回流條件下生成的水一邊進行反應。For example, the aromatic amine resin represented by the formula (3) is dissolved in toluene and N-methyl-2-pyrrolidone, and anhydrous maleic acid is added thereto to generate amide acid, and then p-toluene is added. The sulfonic acid reacts while removing water produced under reflux conditions from the system.
或者,將馬來酸無水物溶解於甲苯中,於攪拌下添加所述式(3)所表示的芳香族胺樹脂的N-甲基-2-吡咯啶酮溶液而生成醯胺酸,然後加入對甲苯磺酸,一邊自系統內除去在回流條件下生成的水一邊進行反應。Alternatively, anhydrous maleic acid is dissolved in toluene, and the N-methyl-2-pyrrolidone solution of the aromatic amine resin represented by the formula (3) is added with stirring to generate amide acid, followed by adding The p-toluenesulfonic acid was reacted while removing water generated under reflux conditions from the system.
或者,將馬來酸無水物溶解於甲苯中,加入對甲苯磺酸,一邊在攪拌/回流狀態下滴加所述式(3)所表示的芳香族胺樹脂的N-甲基-2-吡咯啶酮溶液,一邊在中途向系統外除去共沸時生成的水,甲苯返回系統內的同時進行反應(以上為第一階段反應)。Alternatively, the N-methyl-2-pyrrole of the aromatic amine resin represented by the above formula (3) is added dropwise under stirring/reflux while dissolving anhydrous maleic acid in toluene and adding p-toluenesulfonic acid. The pyridone solution was subjected to the reaction while removing the water produced during azeotropy to the outside of the system and returning toluene to the system (the above is the first-stage reaction).
於任一種方法中,相對於所述式(3)所表示的芳香族胺樹脂的胺基,馬來酸無水物均通常使用1.0倍當量~3.0倍當量,較佳為使用1.2倍當量~2.0倍當量。In any method, the anhydrous maleic acid is usually used in an amount of 1.0 times to 3.0 times the equivalent, preferably 1.2 times to 2.0 times the amount of the amine group of the aromatic amine resin represented by the formula (3). times equivalent.
為了減少未閉環的醯胺酸,於以上所列出的馬來醯亞胺化反應後向反應溶液中加入水,使其分離為樹脂溶液層及水層,由於過剩的馬來酸或馬來酸酐、非質子性極性溶媒、觸媒等溶解於水層側,故將其分液去除,進而反覆進行同樣的操作,將過剩的馬來酸或馬來酸酐、非質子性極性溶媒、觸媒徹底去除。於去除了過剩的馬來酸或馬來酸酐、非質子性極性溶媒、觸媒的有機層的馬來醯亞胺樹脂溶液中再次添加觸媒,並再次進行加熱回流條件下的殘存醯胺酸的脫水閉環反應,藉此獲得酸價低的馬來醯亞胺樹脂溶液(以上為第二階段反應)。In order to reduce the unclosed amide acid, water is added to the reaction solution after the maleimidization reaction listed above, so that it is separated into a resin solution layer and a water layer, due to excess maleic acid or maleic acid. Acid anhydrides, aprotic polar solvents, catalysts, etc. are dissolved in the water layer, so they are separated and removed, and the same operation is repeated repeatedly to remove excess maleic acid or maleic anhydride, aprotic polar solvents, and catalysts. Remove completely. The catalyst is added to the maleimide resin solution from which excess maleic acid or maleic anhydride, aprotic polar solvent, and the organic layer of the catalyst have been removed, and the residual amide acid is heated and refluxed again. The dehydration and ring-closure reaction of the above method can obtain the maleimide resin solution with low acid value (the above is the second-stage reaction).
再脫水閉環反應的時間通常為1小時~5小時,較佳為1小時~3小時,視需要亦可添加所述非質子性極性溶劑。於反應結束後冷卻,反覆水洗直至水洗水變為中性。然後,於加熱減壓下藉由共沸脫水而除去水後,可蒸餾去除溶劑、或者加入其他溶劑而調整為所期望濃度的樹脂溶液,亦可完全蒸餾去除溶劑而以固體樹脂的形式取出。The time for the re-dehydration and ring-closure reaction is usually 1 hour to 5 hours, preferably 1 hour to 3 hours, and the aprotic polar solvent may also be added if necessary. After the reaction was completed, it was cooled and washed with water repeatedly until the washing water became neutral. Then, after removing water by azeotropic dehydration under heating and reducing pressure, the solvent may be distilled off, or another solvent may be added to adjust the resin solution to a desired concentration, or the solvent may be completely distilled off and taken out as a solid resin.
接下來,對成分(B)進行說明。 成分(B)只要具有不飽和雙鍵及聚苯醚結構,則並無特別限定。作為成分(B)中的不飽和雙鍵,可列舉:(甲基)丙烯酸基、苯乙烯基、烯丙基、乙烯基、甲基烯丙基(methallyl),較佳為(甲基)丙烯酸基。作為市售品,可列舉下述式(2)所表示的SA-9000-111(沙特基礎工業公司(Saudi Basic Industries Corporation,Sabic)公司製造,具有甲基丙烯酸基的聚苯醚化合物)或下述式(4)所表示的OPE-2St 1200(三菱瓦斯化學公司製造,具有苯乙烯基的聚苯醚化合物)等。特別是就介電特性的觀點而言,較佳為下述式(2)所表示的化合物。 Next, the component (B) will be described. The component (B) is not particularly limited as long as it has an unsaturated double bond and a polyphenylene ether structure. Examples of the unsaturated double bond in the component (B) include (meth)acrylic group, styryl group, allyl group, vinyl group, and methallyl group, preferably (meth)acrylic acid group. base. As a commercial item, SA-9000-111 represented by the following formula (2) (a polyphenylene ether compound having a methacrylic acid group, manufactured by Saudi Basic Industries Corporation (Sabic)) or the following OPE-2St 1200 (manufactured by Mitsubishi Gas Chemical Co., Ltd., polyphenylene ether compound having a styrene group) represented by the above formula (4), etc. In particular, a compound represented by the following formula (2) is preferred from the viewpoint of dielectric properties.
[化8] [hua 8]
(式(2)中,n為重複數,其平均值為1<n<10)(In formula (2), n is the number of repetitions, and the average value is 1<n<10)
[化9] [Chemical 9]
(式(4)中,n為重複數,其平均值為1<n<10)(In formula (4), n is the number of repetitions, and its average value is 1<n<10)
成分(B)的重量平均分子量(Mw)較佳為500~5000,更佳為2000~5000,進而較佳為2000~4000。若分子量為500以上,則硬化物的耐熱性提高。若分子量為5000以下,則熔融黏度降低,可獲得充分的流動性,成形性良好。另外,由於反應性提高,故可縮短硬化時間,硬化物的耐熱性亦提高。具體而言,重量平均分子量可使用凝膠滲透層析法等進行測定。The weight average molecular weight (Mw) of the component (B) is preferably 500 to 5000, more preferably 2000 to 5000, and still more preferably 2000 to 4000. When the molecular weight is 500 or more, the heat resistance of the cured product is improved. When the molecular weight is 5000 or less, the melt viscosity decreases, sufficient fluidity is obtained, and the moldability is good. In addition, since the reactivity is improved, the curing time can be shortened, and the heat resistance of the cured product is also improved. Specifically, the weight average molecular weight can be measured using gel permeation chromatography or the like.
關於成分(B),可藉由使聚苯醚化合物與甲基丙烯醯氯、丙烯醯氯、氯甲基苯乙烯等具有不飽和雙鍵的化合物反應而賦予自由基聚合性。Component (B) can be imparted with radical polymerizability by reacting a polyphenylene ether compound with a compound having an unsaturated double bond, such as methacryloyl chloride, acryl chloride, and chloromethylstyrene.
聚苯醚化合物可藉由聚合反應而獲得,亦可藉由使重量平均分子量10000~30000的高分子量的聚苯醚化合物進行再分配反應而獲得。再分配反應例如是將高分子量的聚苯醚化合物於甲苯等溶媒中,於酚化合物與自由基起始劑的存在下進行加熱而使其進行再分配反應。如此般藉由再分配反應而獲得的聚苯醚化合物由於在分子鏈的兩末端具有有助於硬化的源自酚系化合物的羥基,因此可維持更高的耐熱性,就該方面而言較佳。另外,就顯示出優異的流動性的方面而言,較佳為藉由聚合反應而得的聚苯醚化合物。The polyphenylene ether compound can be obtained by a polymerization reaction, or can be obtained by subjecting a high molecular weight polyphenylene ether compound having a weight average molecular weight of 10,000 to 30,000 to a redistribution reaction. In the redistribution reaction, for example, a high molecular weight polyphenylene ether compound is heated in a solvent such as toluene in the presence of a phenol compound and a radical initiator to perform a redistribution reaction. Since the polyphenylene ether compound obtained by the redistribution reaction in this way has hydroxyl groups derived from the phenolic compound that contribute to hardening at both ends of the molecular chain, higher heat resistance can be maintained, and in this respect, it is relatively high. good. In addition, a polyphenylene ether compound obtained by a polymerization reaction is preferable in that it exhibits excellent fluidity.
於藉由聚合反應而得的聚苯醚化合物的情況下,聚苯醚化合物的分子量的調整可藉由調整聚合條件等來進行。另外,於藉由再分配反應而得的聚苯醚化合物的情況下,可藉由調整再分配反應的條件等來調整分子量。更具體而言,可考慮調整再分配反應中使用的酚系化合物的調配量等。即,酚系化合物的調配量越多,所獲得的成分聚苯醚化合物的分子量越低。In the case of a polyphenylene ether compound obtained by a polymerization reaction, adjustment of the molecular weight of the polyphenylene ether compound can be performed by adjusting polymerization conditions and the like. In addition, in the case of the polyphenylene ether compound obtained by the redistribution reaction, the molecular weight can be adjusted by adjusting the conditions of the redistribution reaction and the like. More specifically, adjustment of the compounding amount of the phenolic compound used for the redistribution reaction, etc. can be considered. That is, the molecular weight of the component polyphenylene ether compound obtained is low, so that the compounding quantity of a phenol type compound is large.
另外,聚苯醚化合物具體而言例如可列舉聚(2,6-二甲基-1,4-伸苯醚)等。即,於藉由再分配反應而得的成分(B)的情況下,作為高分子量的聚苯醚化合物,可列舉使用聚(2,6-二甲基-1,4-伸苯醚)而得的聚苯醚化合物等。另外,所述再分配反應中使用的酚系化合物並無特別限定,例如可較佳地使用如雙酚A、苯酚酚醛清漆、甲酚酚醛清漆等般於分子中具有兩個以上酚性羥基的多官能的酚系化合物。該些可單獨使用,亦可組合使用兩種以上。Moreover, as a polyphenylene ether compound, poly (2, 6- dimethyl- 1, 4- phenylene ether) etc. are mentioned specifically, for example. That is, in the case of the component (B) obtained by the redistribution reaction, poly(2,6-dimethyl-1,4-phenylene ether) can be used as the high molecular weight polyphenylene ether compound. The obtained polyphenylene ether compounds, etc. In addition, the phenolic compound used in the redistribution reaction is not particularly limited, for example, compounds having two or more phenolic hydroxyl groups in the molecule, such as bisphenol A, phenol novolak, cresol novolak, etc., can be preferably used. Multifunctional phenolic compounds. These may be used alone or in combination of two or more.
本發明的硬化性樹脂組成物中的成分(A)與成分(B)的重量比率較佳為50/50~5/95,更佳為30/70~5/95,進而較佳為25/75~5/95,特佳為25/75~10/90。另外,作為成分(A)與成分(B)的官能基當量比率,相對於成分(A)1當量,成分(B)較佳為0.2當量~4.2當量,更佳為0.5當量~4.2當量,進而較佳為0.7當量~4.2當量,特佳為0.7當量~2.0當量。於成分(B)小於0.2當量的情況下,由於馬來醯亞胺基增大而吸水特性劣化,硬化物變脆,因此銅箔剝離強度降低。另一方面,於成分(B)多於4.2當量的情況下,交聯密度降低,耐熱性變差。The weight ratio of the component (A) to the component (B) in the curable resin composition of the present invention is preferably 50/50 to 5/95, more preferably 30/70 to 5/95, still more preferably 25/ 75~5/95, especially 25/75~10/90. In addition, as the functional group equivalent ratio of the component (A) to the component (B), the component (B) is preferably 0.2 to 4.2 equivalents, more preferably 0.5 to 4.2 equivalents, relative to 1 equivalent of the component (A), and further It is preferably 0.7 equivalents to 4.2 equivalents, and particularly preferably 0.7 equivalents to 2.0 equivalents. When the component (B) is less than 0.2 equivalents, since the maleimide group increases, the water absorption property deteriorates, and the cured product becomes brittle, so that the copper foil peeling strength decreases. On the other hand, when the component (B) is more than 4.2 equivalents, the crosslinking density decreases and the heat resistance deteriorates.
於本發明的硬化性樹脂組成物中,除成分(A)與成分(B)以外,亦可使用公知的任何樹脂材料。具體而言,可列舉:酚樹脂、環氧樹脂、胺樹脂、含活性烯烴的樹脂、異氰酸酯樹脂、聚醯胺樹脂、聚醯亞胺樹脂、氰酸酯樹脂、丙烯基樹脂、甲基烯丙基樹脂、活性酯樹脂等,可使用一種,亦可併用多種。另外,亦可併用成分(A)以外的馬來醯亞胺化合物。In the curable resin composition of the present invention, any known resin materials may be used other than the component (A) and the component (B). Specifically, phenol resins, epoxy resins, amine resins, reactive olefin-containing resins, isocyanate resins, polyamide resins, polyimide resins, cyanate resins, acryl-based resins, methallyl resins can be mentioned. A base resin, an active ester resin, etc., may use 1 type, and may use multiple types together. Moreover, you may use together the maleimide compound other than a component (A).
作為酚樹脂、環氧樹脂、胺樹脂、含活性烯烴的樹脂、異氰酸酯樹脂、聚醯胺樹脂、聚醯亞胺樹脂、氰酸酯樹脂、活性酯樹脂,分別可使用以下例示的樹脂,但並不限定於該些。As phenol resins, epoxy resins, amine resins, reactive olefin-containing resins, isocyanate resins, polyamide resins, polyimide resins, cyanate ester resins, and active ester resins, the resins exemplified below can be used, respectively. It is not limited to these.
酚樹脂:酚類(苯酚、烷基取代苯酚、芳香族取代苯酚、對苯二酚、間苯二酚、萘酚、烷基取代萘酚、二羥基苯、烷基取代二羥基苯、二羥基萘等)與各種醛(甲醛、乙醛、烷基醛、苯甲醛、烷基取代苯甲醛、羥基苯甲醛、萘醛、戊二醛、鄰苯二甲醛、巴豆醛、肉桂醛(cinnamaldehyde)、糠醛等)的縮聚物;酚類與各種二烯化合物(二環戊二烯、萜烯類、乙烯基環己烯、降冰片二烯、乙烯基降冰片烯、四氫茚、二乙烯基苯、二乙烯基聯苯、二異丙烯基聯苯、丁二烯、異戊二烯等)的聚合物;酚類與酮類(丙酮、甲基乙基酮、甲基異丁基酮、苯乙酮、二苯甲酮等)的縮聚物;藉由酚類與取代聯苯類(4,4'-雙(氯甲基)-1,1'-聯苯及4,4'-雙(甲氧基甲基)-1,1'-聯苯等)、或者取代苯基類(1,4-雙(氯甲基)苯、1,4-雙(甲氧基甲基)苯及1,4-雙(羥基甲基)苯等)等的縮聚而獲得的酚樹脂;雙酚類與各種醛的縮聚物;聚苯醚。Phenol resins: Phenols (phenol, alkyl-substituted phenol, aromatic-substituted phenol, hydroquinone, resorcinol, naphthol, alkyl-substituted naphthol, dihydroxybenzene, alkyl-substituted dihydroxybenzene, dihydroxy Naphthalene, etc.) and various aldehydes (formaldehyde, acetaldehyde, alkyl aldehyde, benzaldehyde, alkyl substituted benzaldehyde, hydroxybenzaldehyde, naphthaldehyde, glutaraldehyde, phthalaldehyde, crotonaldehyde, cinnamaldehyde (cinnamaldehyde), polycondensates of furfural, etc.); phenols and various diene compounds (dicyclopentadiene, terpenes, vinylcyclohexene, norbornadiene, vinyl norbornene, tetrahydroindene, divinylbenzene , divinyl biphenyl, diisopropenyl biphenyl, butadiene, isoprene, etc.) polymers; phenols and ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, benzene Polycondensates of ethyl ketone, benzophenone, etc.); by phenols and substituted biphenyls (4,4'-bis(chloromethyl)-1,1'-biphenyl and 4,4'-bis( methoxymethyl)-1,1'-biphenyl, etc.), or substituted phenyls (1,4-bis(chloromethyl)benzene, 1,4-bis(methoxymethyl)benzene, and 1 , 4-bis (hydroxymethyl) benzene, etc.) polycondensation obtained phenol resin; bisphenols and various aldehyde polycondensates; polyphenylene ether.
環氧樹脂:所述酚樹脂;將醇類等加以縮水甘油基化而得的縮水甘油醚系環氧樹脂;以4-乙烯基-1-環己烯二環氧化物或3,4-環氧環己基甲基-3,4'-環氧環己烷羧酸酯等為代表的脂環式環氧樹脂;以四縮水甘油基二胺基二苯基甲烷(tetraglycidyl diamino diphenylmethane,TGDDM)或三縮水甘油基-對胺基苯酚等為代表的縮水甘油胺系環氧樹脂;縮水甘油酯系環氧樹脂。Epoxy resin: the phenol resin; glycidyl ether epoxy resin obtained by glycidylation of alcohols, etc.; 4-vinyl-1-cyclohexene diepoxide or 3,4-cyclohexene Alicyclic epoxy resins represented by oxycyclohexylmethyl-3,4'-epoxycyclohexanecarboxylate, etc.; tetraglycidyl diamino diphenylmethane (TGDDM) or Glycidylamine-based epoxy resins represented by triglycidyl-p-aminophenol, etc.; glycidyl ester-based epoxy resins.
胺樹脂:二胺基二苯基甲烷;二胺基二苯基碸;異佛爾酮二胺;萘二胺;苯胺酚醛清漆;鄰乙基苯胺酚醛清漆;藉由苯胺與二氯二甲苯(xylylene chloride)的反應而獲得的苯胺樹脂;藉由日本專利第6429862號公報中記載的苯胺與取代聯苯類(4,4'-雙(氯甲基)-1,1'-聯苯及4,4'-雙(甲氧基甲基)-1,1'-聯苯等)、或者取代苯基類(1,4-雙(氯甲基)苯、1,4-雙(甲氧基甲基)苯及1,4-雙(羥基甲基)苯等)的反應而獲得的胺樹脂。Amine resins: diaminodiphenylmethane; diaminodiphenyl ash; isophorone diamine; naphthalene diamine; aniline novolac; o-ethylaniline novolac; Aniline resin obtained by the reaction of xylylene chloride; aniline and substituted biphenyls (4,4'-bis(chloromethyl)-1,1'-biphenyl and 4,4'-bis(chloromethyl)-1,1'-biphenyl and 4,4'-bis(chloromethyl)-1,1'-biphenyl and 4 ,4'-bis(methoxymethyl)-1,1'-biphenyl, etc.), or substituted phenyls (1,4-bis(chloromethyl)benzene, 1,4-bis(methoxy) Amine resin obtained by the reaction of methyl)benzene and 1,4-bis(hydroxymethyl)benzene, etc.).
含活性烯烴的樹脂:所述酚樹脂與含活性烯烴的鹵素系化合物(氯甲基苯乙烯、氯化烯丙基(allyl chloride)、氯化甲基烯丙基、丙烯醯氯等)的縮聚物;含活性烯烴的酚類(2-烯丙基苯酚、2-丙烯基苯酚、4-烯丙基苯酚、4-丙烯基苯酚、丁香酚(eugenol)、異丁香酚(isoeugenol)等)與鹵素系化合物(4,4'-雙(甲氧基甲基)-1,1'-聯苯、1,4-雙(氯甲基)苯、4,4'-二氟二苯甲酮、4,4'-二氯二苯甲酮、4,4'-二溴二苯甲酮、三聚氯化氰(cyanuric chloride)等)的縮聚物;環氧樹脂或者醇類與經取代或未經取代的丙烯酸酯類(丙烯酸酯、甲基丙烯酸酯等)的縮聚物;馬來醯亞胺樹脂(4,4'-二苯基甲烷雙馬來醯亞胺、聚苯甲烷馬來醯亞胺、間伸苯基雙馬來醯亞胺、2,2'-雙〔4-(4-馬來醯亞胺苯氧基)苯基〕丙烷、3,3'-二甲基-5,5'-二乙基-4,4'-二苯基甲烷雙馬來醯亞胺、4-甲基-1,3-伸苯基雙馬來醯亞胺、4,4'-二苯基醚雙馬來醯亞胺、4,4'-二苯基碸雙馬來醯亞胺、1,3-雙(3-馬來醯亞胺苯氧基)苯、1,3-雙(4-馬來醯亞胺苯氧基)苯)。Resin containing active olefin: polycondensation of the phenol resin and halogen-based compound containing active olefin (chloromethylstyrene, allyl chloride, methylallyl chloride, acryl chloride, etc.) compounds; phenols containing active olefins (2-allylphenol, 2-propenylphenol, 4-allylphenol, 4-propenylphenol, eugenol, isoeugenol, etc.) and Halogen compounds (4,4'-bis(methoxymethyl)-1,1'-biphenyl, 1,4-bis(chloromethyl)benzene, 4,4'-difluorobenzophenone, Polycondensates of 4,4'-dichlorobenzophenone, 4,4'-dibromobenzophenone, cyanuric chloride, etc.; epoxy resins or alcohols with substituted or unsubstituted Polycondensates of substituted acrylates (acrylates, methacrylates, etc.); maleimide resins (4,4'-diphenylmethanebismaleimide, polyphenylmethanemaleimide, etc.) Amine, m-phenylene bismaleimide, 2,2'-bis[4-(4-maleimidephenoxy)phenyl]propane, 3,3'-dimethyl-5, 5'-Diethyl-4,4'-diphenylmethane bismaleimide, 4-methyl-1,3-phenylene bismaleimide, 4,4'-diphenyl Ether bismaleimide, 4,4'-diphenyl bismaleimide, 1,3-bis(3-maleimidephenoxy)benzene, 1,3-bis(4 -maleimidephenoxy)benzene).
異氰酸酯樹脂:對苯二異氰酸酯、間苯二異氰酸酯、對二甲苯二異氰酸酯、間二甲苯二異氰酸酯、2,4-甲苯二異氰酸酯、2,6-甲苯二異氰酸酯、4,4'-二苯基甲烷二異氰酸酯、萘二異氰酸酯等的芳香族二異氰酸酯類;異佛爾酮二異氰酸酯、六亞甲基二異氰酸酯、4,4'-二環己基甲烷二異氰酸酯、氫化二甲苯二異氰酸酯、降冰片烯二異氰酸酯、離胺酸二異氰酸酯等脂肪族或脂環結構的二異氰酸酯類;異氰酸酯單體的一種以上的縮二脲體或將所述二異氰酸酯化合物三聚化而成的異氰酸酯體等多異氰酸酯;藉由所述異氰酸酯化合物與多元醇化合物的胺基甲酸酯化反應而獲得的多異氰酸酯。Isocyanate resins: p-phenylene diisocyanate, m-phenylene diisocyanate, p-xylylene diisocyanate, m-xylylene diisocyanate, 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, 4,4'-diphenylmethane Aromatic diisocyanates such as diisocyanate and naphthalene diisocyanate; isophorone diisocyanate, hexamethylene diisocyanate, 4,4'-dicyclohexylmethane diisocyanate, hydrogenated xylene diisocyanate, norbornene diisocyanate Diisocyanates of aliphatic or alicyclic structure such as isocyanates and lysine diisocyanates; polyisocyanates such as isocyanate bodies such as one or more biuret bodies of isocyanate monomers or trimerization of the diisocyanate compounds; A polyisocyanate obtained by urethane reaction of the isocyanate compound and a polyol compound.
聚醯胺樹脂:以選自胺基酸(6-胺基己酸、11-胺基十一烷酸、12-胺基十二烷酸、對胺基甲基苯甲酸等)、內醯胺(ε-己內醯胺、ω-十一烷內醯胺、ω-月桂內醯胺)及二胺(乙二胺、三亞甲基二胺、四亞甲基二胺、五亞甲基二胺、六亞甲基二胺、七亞甲基二胺、八亞甲基二胺、九亞甲基二胺、癸二胺、十一烷二胺、十二烷二胺、十三烷二胺、十四烷二胺、十五烷二胺、十六烷二胺、十七烷二胺、十八烷二胺、十九烷二胺、二十烷二胺、2-甲基-1,5-二胺基戊烷、2-甲基-1,8-二胺基辛烷等脂肪族二胺;環己烷二胺、雙-(4-胺基環己基)甲烷、雙(3-甲基-4-胺基環己基)甲烷等脂環式二胺;二甲苯二胺等芳香族二胺等)與二羧酸(草酸、丙二酸、丁二酸、戊二酸、己二酸、辛二酸、壬二酸、癸二酸、十一烷二酸、十二烷二酸等脂肪族二羧酸;對苯二甲酸、間苯二甲酸、2-氯對苯二甲酸、2-甲基對苯二甲酸、5-甲基間苯二甲酸、間苯二甲酸-5-磺酸鈉、六氫對苯二甲酸、六氫間苯二甲酸等芳香族二羧酸;環己烷二羧酸等脂環族二羧酸;該些二羧酸的二烷基酯以及二氯化物)的混合物中的一種以上為主要原料的聚合物。Polyamide resin: selected from amino acids (6-aminohexanoic acid, 11-aminoundecanoic acid, 12-aminododecanoic acid, p-aminomethylbenzoic acid, etc.), lactamide (ε-caprolactam, ω-undecanalactamide, ω-lauryl amide) and diamines (ethylenediamine, trimethylenediamine, tetramethylenediamine, pentamethylenediamine Amines, Hexamethylenediamine, Heptamethylenediamine, Octamethylenediamine, Nonamethylenediamine, Decanediamine, Undecanediamine, Dodecanediamine, Tridecanediamine Amine, tetradecanediamine, pentadecanediamine, hexadecanediamine, heptadecanediamine, octadecanediamine, nonadecanediamine, eicosanediamine, 2-methyl-1 ,5-diaminopentane, 2-methyl-1,8-diaminooctane and other aliphatic diamines; cyclohexanediamine, bis-(4-aminocyclohexyl)methane, bis(3 - Alicyclic diamines such as methyl-4-aminocyclohexyl) methane; aromatic diamines such as xylene diamine, etc.) and dicarboxylic acids (oxalic acid, malonic acid, succinic acid, glutaric acid, hexane Aliphatic dicarboxylic acids such as diacid, suberic acid, azelaic acid, sebacic acid, undecanedioic acid, dodecanedioic acid; terephthalic acid, isophthalic acid, 2-chloroterephthalic acid , 2-methyl terephthalic acid, 5-methyl isophthalic acid, isophthalic acid-5-sodium sulfonate, hexahydroterephthalic acid, hexahydroisophthalic acid and other aromatic dicarboxylic acids; Alicyclic dicarboxylic acids such as cyclohexanedicarboxylic acid; dialkyl esters and dichlorides of these dicarboxylic acids) are the main raw materials of the polymer.
聚醯亞胺樹脂:所述二胺與四羧酸二酐(4,4'-(六氟亞異丙基)二鄰苯二甲酸酐、5-(2,5-二氧代四氫-3-呋喃基)-3-甲基-環己烯-1,2-二羧酸酐、均苯四甲酸二酐、1,2,3,4-苯四羧酸二酐、3,3',4,4'-二苯甲酮四羧酸二酐、2,2',3,3'-二苯甲酮四羧酸二酐、3,3',4,4'-聯苯基四羧酸二酐、3,3',4,4'-二苯基碸四羧酸二酐、2,2',3,3'-聯苯基四羧酸二酐、亞甲基-4,4'-二鄰苯二甲酸二酐、1,1-亞乙基-4,4'-二鄰苯二甲酸二酐、2,2'-亞丙基-4,4'-二鄰苯二甲酸二酐、1,2-伸乙基-4,4'-二鄰苯二甲酸二酐、1,3-三亞甲基-4,4'-二鄰苯二甲酸二酐、1,4-四亞甲基-4,4'-二鄰苯二甲酸二酐、1,5-五亞甲基-4,4'-二鄰苯二甲酸二酐、4,4'-氧基二鄰苯二甲酸二酐、硫代-4,4'-二鄰苯二甲酸二酐、磺醯基-4,4'-二鄰苯二甲酸二酐、1,3-雙(3,4-二羧基苯基)苯二酐、1,3-雙(3,4-二羧基苯氧基)苯二酐、1,4-雙(3,4-二羧基苯氧基)苯二酐、1,3-雙[2-(3,4-二羧基苯基)-2-丙基]苯二酐、1,4-雙[2-(3,4-二羧基苯基)-2-丙基]苯二酐、雙[3-(3,4-二羧基苯氧基)苯基]甲烷二酐、雙[4-(3,4-二羧基苯氧基)苯基]甲烷二酐、2,2-雙[3-(3,4-二羧基苯氧基)苯基]丙烷二酐、2,2-雙[4-(3,4-二羧基苯氧基)苯基]丙烷二酐、雙(3,4-二羧基苯氧基)二甲基矽烷二酐、1,3-雙(3,4-二羧基苯基)-1,1,3,3-四甲基二矽氧烷二酐、2,3,6,7-萘四羧酸二酐、1,4,5,8-萘四羧酸二酐、1,2,5,6-萘四羧酸二酐、3,4,9,10-苝四羧酸二酐、2,3,6,7-蒽四羧酸二酐、1,2,7,8-菲四羧酸二酐、乙烯四羧酸二酐、1,2,3,4-丁烷四羧酸二酐、1,2,3,4-環丁烷四羧酸二酐、環戊烷四羧酸二酐、環己烷-1,2,3,4-四羧酸二酐、環己烷-1,2,4,5-四羧酸二酐、3,3',4,4'-雙環己基四羧酸二酐、羰基-4,4'-雙(環己烷-1,2-二羧酸)二酐、亞甲基-4,4'-雙(環己烷-1,2-二羧酸)二酐、1,2-伸乙基-4,4'-雙(環己烷-1,2-二羧酸)二酐、1,1-亞乙基-4,4'-雙(環己烷-1,2-二羧酸)二酐、2,2-亞丙基-4,4'-雙(環己烷-1,2-二羧酸)二酐、氧基-4,4'-雙(環己烷-1,2-二羧酸)二酐、硫代-4,4'-雙(環己烷-1,2-二羧酸)二酐、磺醯基-4,4'-雙(環己烷-1,2-二羧酸)二酐、雙環[2,2,2]辛-7-烯-2,3,5,6-四羧酸二酐、rel-[1S,5R,6R]-3-氧雜雙環[3,2,1]辛烷-2,4-二酮-6-螺-3'-(四氫呋喃-2',5'-二酮)、4-(2,5-二氧代四氫呋喃-3-基)-1,2,3,4-四氫萘-1,2-二羧酸酐、乙二醇-雙-(3,4-二羧酸酐苯基)醚、4,4'-聯苯基雙(偏苯三酸單酯酸酐)、9,9'-雙(3,4-二羧基苯基)芴二酐)的縮聚物。Polyimide resin: the diamine and tetracarboxylic dianhydride (4,4'-(hexafluoroisopropylidene) diphthalic anhydride, 5-(2,5-dioxotetrahydro- 3-furyl)-3-methyl-cyclohexene-1,2-dicarboxylic anhydride, pyromellitic dianhydride, 1,2,3,4-mellitic dianhydride, 3,3', 4,4'-benzophenone tetracarboxylic dianhydride, 2,2',3,3'-benzophenone tetracarboxylic dianhydride, 3,3',4,4'-biphenyl tetracarboxylic Acid dianhydride, 3,3',4,4'-diphenyltetracarboxylic dianhydride, 2,2',3,3'-biphenyltetracarboxylic dianhydride, methylene-4,4 '-Diphthalic dianhydride, 1,1-ethylene-4,4'-diphthalic dianhydride, 2,2'-propylene-4,4'-diphthalic acid Dianhydride, 1,2-ethylidene-4,4'-diphthalic dianhydride, 1,3-trimethylene-4,4'-diphthalic dianhydride, 1,4-tetra Methylene-4,4'-diphthalic dianhydride, 1,5-pentamethylene-4,4'-diphthalic dianhydride, 4,4'-oxydiphthalic acid Formic acid dianhydride, thio-4,4'-diphthalic acid dianhydride, sulfonyl-4,4'-diphthalic acid dianhydride, 1,3-bis(3,4-dicarboxybenzene base) phthalic anhydride, 1,3-bis(3,4-dicarboxyphenoxy)phthalic anhydride, 1,4-bis(3,4-dicarboxyphenoxy)phthalic anhydride, 1,3- Bis[2-(3,4-dicarboxyphenyl)-2-propyl]phthalic anhydride, 1,4-bis[2-(3,4-dicarboxyphenyl)-2-propyl]phthalic anhydride anhydride, bis[3-(3,4-dicarboxyphenoxy)phenyl]methane dianhydride, bis[4-(3,4-dicarboxyphenoxy)phenyl]methane dianhydride, 2,2- Bis[3-(3,4-dicarboxyphenoxy)phenyl]propanedianhydride, 2,2-bis[4-(3,4-dicarboxyphenoxy)phenyl]propanedianhydride, bis( 3,4-Dicarboxyphenoxy) dimethylsiloxane dianhydride, 1,3-bis(3,4-dicarboxyphenyl)-1,1,3,3-tetramethyldisiloxane dianhydride , 2,3,6,7-naphthalene tetracarboxylic dianhydride, 1,4,5,8-naphthalene tetracarboxylic dianhydride, 1,2,5,6-naphthalene tetracarboxylic dianhydride, 3,4, 9,10-Perylenetetracarboxylic dianhydride, 2,3,6,7-Anthracene tetracarboxylic dianhydride, 1,2,7,8-Phenanthrene tetracarboxylic dianhydride, Ethylene tetracarboxylic dianhydride, 1, 2,3,4-butanetetracarboxylic dianhydride, 1,2,3,4-cyclobutanetetracarboxylic dianhydride, cyclopentanetetracarboxylic dianhydride, cyclohexane-1,2,3, 4-tetracarboxylic dianhydride, cyclohexane-1,2,4,5-tetracarboxylic dianhydride, 3,3',4,4'-bicyclohexyltetracarboxylic dianhydride, carbonyl-4,4' -Bis(cyclohexane-1,2-dicarboxylic acid) dianhydride, methylene-4,4'-bis(cyclohexane-1,2-dicarboxylic acid) dianhydride, 1,2-ethylidene base-4,4'-bis(cyclohexane-1,2-dicarboxylic acid) dianhydride, 1,1-ethylene-4,4'-bis(cyclohexane-1,2-dicarboxylic acid) ) dianhydride, 2,2-propylene-4 ,4'-bis(cyclohexane-1,2-dicarboxylic acid) dianhydride, oxy-4,4'-bis(cyclohexane-1,2-dicarboxylic acid) dianhydride, thio-4 ,4'-bis(cyclohexane-1,2-dicarboxylic acid) dianhydride, sulfonyl-4,4'-bis(cyclohexane-1,2-dicarboxylic acid) dianhydride, bicyclo[2 ,2,2]oct-7-ene-2,3,5,6-tetracarboxylic dianhydride, rel-[1S,5R,6R]-3-oxabicyclo[3,2,1]octane- 2,4-Dione-6-spiro-3'-(tetrahydrofuran-2',5'-dione), 4-(2,5-dioxotetrahydrofuran-3-yl)-1,2,3, 4-Tetrahydronaphthalene-1,2-dicarboxylic acid anhydride, ethylene glycol-bis-(3,4-dicarboxylic acid anhydride phenyl) ether, 4,4'-biphenyl bis(trimellitic acid monoester anhydride) ), 9,9'-bis(3,4-dicarboxyphenyl) fluorene dianhydride) polycondensate.
氰酸酯樹脂:為藉由使酚樹脂與鹵化氰反應而獲得的氰酸酯化合物,作為具體例,可列舉:二氰氧基苯(dicyanatobenzene)、三氰氧基苯、二氰氧基萘、二氰氧基聯苯、2,2'-雙(4-氰氧基苯基)丙烷、雙(4-氰氧基苯基)甲烷、雙(3,5-二甲基-4-氰氧基苯基)甲烷、2,2'-雙(3,5-二甲基-4-氰氧基苯基)丙烷、2,2'-雙(4-氰氧基苯基)乙烷、2,2'-雙(4-氰氧基苯基)六氟丙烷、雙(4-氰氧基苯基)碸、雙(4-氰氧基苯基)硫醚、苯酚酚醛清漆氰酸酯、將苯酚-二環戊二烯共縮合物的羥基轉換為氰酸酯基者等,但並不限定於該些。 另外,日本專利特開2005-264154號公報中記載有合成方法的氰酸酯化合物由於低吸濕性、阻燃性、介電特性優異,因此作為氰酸酯化合物而言特佳。 為了根據需要使氰酸酯基三聚化而形成均三嗪(sym-triazine)環,氰酸酯樹脂亦可含有環烷酸鋅、環烷酸鈷、環烷酸銅、環烷酸鉛、辛酸鋅、辛酸錫、乙醯丙酮鉛、馬來酸二丁基錫等觸媒。相對於硬化性樹脂組成物的合計質量100質量份,觸媒通常使用0.0001質量份~0.10質量份,較佳為使用0.00015質量份~0.0015質量份。 Cyanate resin: It is a cyanate compound obtained by reacting a phenol resin with a cyanogen halide. Specific examples include dicyanatobenzene, tricyanobenzene, and dicyanonaphthalene. , dicyanooxybiphenyl, 2,2'-bis(4-cyanophenyl)propane, bis(4-cyanophenyl)methane, bis(3,5-dimethyl-4-cyano) oxyphenyl)methane, 2,2'-bis(3,5-dimethyl-4-cyanooxyphenyl)propane, 2,2'-bis(4-cyanooxyphenyl)ethane, 2,2'-bis(4-cyanooxyphenyl)hexafluoropropane, bis(4-cyanoxyphenyl)sulfane, bis(4-cyanoxyphenyl)sulfide, phenol novolac cyanate , a phenol-dicyclopentadiene co-condensate converted from a hydroxyl group to a cyanate group, etc., but not limited to these. In addition, the cyanate ester compound of which the synthesis method is described in Japanese Patent Laid-Open No. 2005-264154 is particularly preferred as a cyanate ester compound because it is excellent in low moisture absorption, flame retardancy, and dielectric properties. The cyanate resin may contain zinc naphthenate, cobalt naphthenate, copper naphthenate, lead naphthenate, Zinc octoate, tin octoate, lead acetylacetonate, dibutyltin maleate and other catalysts. The catalyst is usually used in 0.0001 to 0.10 parts by mass, preferably 0.00015 to 0.0015 parts by mass, relative to 100 parts by mass of the total mass of the curable resin composition.
活性酯樹脂:可根據需要使用一分子中具有一個以上的活性酯基的化合物作為環氧樹脂等硬化性樹脂的硬化劑。作為活性酯系硬化劑,較佳為苯酚酯類、苯硫酚酯類、N-羥基胺酯類、雜環羥基化合物的酯類等於一分子中具有兩個以上的反應活性高的酯基的化合物。該活性酯系硬化劑較佳為藉由羧酸化合物及硫代羧酸化合物中的至少任一種化合物、與羥基化合物及硫醇化合物中的至少任一種化合物的縮合反應而獲得。特別是就耐熱性提高的觀點而言,較佳為由羧酸化合物與羥基化合物獲得的活性酯系硬化劑,較佳為由羧酸化合物與苯酚化合物及萘酚化合物中的至少任一種化合物獲得的活性酯系硬化劑。 作為羧酸化合物,例如可列舉:苯甲酸、乙酸、琥珀酸、馬來酸、衣康酸、鄰苯二甲酸、間苯二甲酸、對苯二甲酸、均苯四甲酸等。 作為苯酚化合物或萘酚化合物,例如可列舉:對苯二酚、間苯二酚、雙酚A、雙酚F、雙酚S、酸式酚酞(phenolphthalin)、甲基化雙酚A、甲基化雙酚F、甲基化雙酚S、苯酚、鄰甲酚、間甲酚、對甲酚、兒茶酚、α-萘酚、β-萘酚、1,5-二羥基萘、1,6-二羥基萘、2,6-二羥基萘、二羥基二苯甲酮、三羥基二苯甲酮、四羥基二苯甲酮、間苯三酚(phloroglucin)、苯三酚、二環戊二烯型二苯酚化合物、苯酚酚醛清漆等。此處,所謂「二環戊二烯型二苯酚化合物」是指於二環戊二烯一分子中二分子的苯酚縮合而獲得的二苯酚化合物。 作為活性酯系硬化劑的較佳的具體例,可列舉包含二環戊二烯型二苯酚結構的活性酯化合物、包含萘結構的活性酯化合物、包含苯酚酚醛清漆的乙醯基化物的活性酯化合物、包含苯酚酚醛清漆的苯甲醯基化物的活性酯化合物。其中,更佳為包含萘結構的活性酯化合物、包含二環戊二烯型二苯酚結構的活性酯化合物。所謂「二環戊二烯型二苯酚結構」,表示包含伸苯基-二環伸戊基-伸苯基的二價結構單元。 作為活性酯系硬化劑的市售品,例如可列舉:作為包含二環戊二烯型二苯酚結構的活性酯化合物的「EXB9451」、「EXB9460」、「EXB9460S」、「HPC-8000-65T」、「HPC-8000H-65TM」、「EXB-8000L-65TM」、「EXB-8150-65T」(迪愛生(DIC)公司製造);作為包含萘結構的活性酯化合物的「EXB9416-70BK」(迪愛生(DIC)公司製造);作為包含苯酚酚醛清漆的乙醯基化物的活性酯化合物的「DC808」(三菱化學公司製造);作為包含苯酚酚醛清漆的苯甲醯基化物的活性酯化合物的「YLH1026」、「YLH1030」、「YLH1048」(三菱化學公司製造);作為為苯酚酚醛清漆的乙醯基化物的活性酯系硬化劑的「DC808」(三菱化學公司製造);作為含磷原子的活性酯系硬化劑的迪愛生(DIC)公司製造的「EXB-9050L-62M」等。 Active ester resin: A compound having one or more active ester groups in one molecule can be used as a curing agent for curable resins such as epoxy resins as needed. As the active ester-based hardener, phenolic esters, thiophenolic esters, N-hydroxyamine esters, and esters of heterocyclic hydroxy compounds are preferably those having two or more highly reactive ester groups in one molecule. compound. The active ester-based curing agent is preferably obtained by a condensation reaction of at least any one of a carboxylic acid compound and a thiocarboxylic acid compound, and at least one of a hydroxy compound and a thiol compound. In particular, from the viewpoint of improving heat resistance, an active ester-based hardener obtained from a carboxylic acid compound and a hydroxy compound is preferred, and it is preferably obtained from at least one of a carboxylic acid compound, a phenol compound, and a naphthol compound. active ester hardener. Examples of the carboxylic acid compound include benzoic acid, acetic acid, succinic acid, maleic acid, itaconic acid, phthalic acid, isophthalic acid, terephthalic acid, pyromellitic acid, and the like. Examples of the phenol compound or naphthol compound include hydroquinone, resorcinol, bisphenol A, bisphenol F, bisphenol S, phenolphthalin, methylated bisphenol A, methyl bisphenol F, methylated bisphenol S, phenol, o-cresol, m-cresol, p-cresol, catechol, α-naphthol, β-naphthol, 1,5-dihydroxynaphthalene, 1, 6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, dihydroxybenzophenone, trihydroxybenzophenone, tetrahydroxybenzophenone, phloroglucin, phloroglucin, dicyclopentane Diene-type diphenol compounds, phenol novolacs, etc. Here, the "dicyclopentadiene-type diphenol compound" refers to a diphenol compound obtained by condensing two molecules of phenol in one molecule of dicyclopentadiene. Preferable specific examples of the active ester-based curing agent include active ester compounds containing a dicyclopentadiene-type diphenol structure, active ester compounds containing a naphthalene structure, and active esters containing an acetylated compound of phenol novolac. Compounds, active ester compounds comprising benzyl compounds of phenol novolacs. Among them, the active ester compound containing a naphthalene structure and the active ester compound containing a dicyclopentadiene-type diphenol structure are more preferable. The "dicyclopentadiene-type diphenol structure" means a divalent structural unit including phenylene-dicyclopentylene-phenylene. Examples of commercially available active ester-based curing agents include "EXB9451", "EXB9460", "EXB9460S", and "HPC-8000-65T" which are active ester compounds containing a dicyclopentadiene-type diphenol structure. , "HPC-8000H-65TM", "EXB-8000L-65TM", "EXB-8150-65T" (manufactured by DIC); "EXB9416-70BK" (DIC) as an active ester compound containing a naphthalene structure DIC Corporation); "DC808" (manufactured by Mitsubishi Chemical Corporation) as an active ester compound containing a phenol novolak acetylated compound; "DC808" as an active ester compound containing a phenol novolak benzyl compound YLH1026", "YLH1030", "YLH1048" (manufactured by Mitsubishi Chemical Corporation); "DC808" (manufactured by Mitsubishi Chemical Corporation), which is an active ester-based hardener that is an acetylated compound of phenol novolak; "EXB-9050L-62M" manufactured by DIC, an ester-based hardener, etc.
本發明的硬化性樹脂組成物進而亦可併用硬化促進劑(硬化觸媒)來提高硬化性。作為可使用的硬化促進劑的具體例,較佳為以促進烯烴樹脂或馬來醯亞胺樹脂等能夠自由基聚合的硬化性樹脂的自聚合或與其他成分的自由基聚合為目的而使用自由基聚合起始劑。作為自由基聚合起始劑,可列舉:過氧化甲基乙基酮、過氧化乙醯丙酮等酮過氧化物類;過氧化苯甲醯等二醯基過氧化物類;二枯基過氧化物、1,3-雙(第三丁基過氧異丙基)苯等二烷基過氧化物類;過氧化苯甲酸第三丁酯、1,1-二-第三丁基過氧化環己烷等過氧化縮酮類;α-枯基過氧化新癸酸酯、第三丁基過氧化新癸酸酯、第三丁基過氧化三甲基乙酸酯、1,1,3,3-四甲基丁基過氧-2-乙基己酸酯、第三戊基過氧-2-乙基己酸酯、第三丁基過氧-2-乙基己酸酯、第三戊基過氧-3,5,5-三甲基己酸酯、第三丁基過氧-3,5,5-三甲基己酸酯、第三戊基過氧苯甲酸酯等烷基過氧酸酯類;二-2-乙基己基過氧化二碳酸酯、雙(4-第三丁基環己基)過氧化二碳酸酯、第三丁基過氧化異丙基碳酸酯、1,6-雙(第三丁基過氧化羰基氧基)己烷等過氧化碳酸酯類;第三丁基過氧化氫、枯烯過氧化氫、第三丁基過氧化辛酸酯、過氧化月桂醯等有機過氧化物或偶氮二異丁腈、4,4'-偶氮雙(4-氰基戊酸)、2,2'-偶氮雙(2,4-二甲基戊腈)等偶氮系化合物的公知的硬化促進劑,但並不特別限定於該些。較佳為酮過氧化物類、二醯基過氧化物類、氫過氧化物類、二烷基過氧化物類、過氧化縮酮類、烷基過氧酸酯類、過氧化碳酸酯(peroxycarbonate)類等,更佳為二烷基過氧化物類。作為自由基聚合起始劑的添加量,相對於硬化性樹脂組成物的100質量份,較佳為0.01質量份~5質量份,特佳為0.01質量份~3質量份。若所使用的自由基聚合起始劑的量多,則硬化物的介電特性劣化。The curable resin composition of the present invention may further use a curing accelerator (curing catalyst) in combination to improve curability. As a specific example of a hardening accelerator that can be used, it is preferable to use free radicals for the purpose of promoting self-polymerization of radically polymerizable curable resins such as olefin resins and maleimide resins or radical polymerization with other components. base polymerization initiator. Examples of the radical polymerization initiator include: ketone peroxides such as methyl ethyl ketone peroxide and acetylacetone peroxide; diacyl peroxides such as benzyl peroxide; dicumyl peroxide compounds, 1,3-bis(tert-butylperoxyisopropyl)benzene and other dialkyl peroxides; tert-butyl peroxybenzoate, 1,1-di-tert-butylperoxy ring Peroxy ketals such as hexane; α-cumyl peroxy neodecanoate, tert-butyl peroxy neodecanoate, tert-butyl peroxytrimethyl acetate, 1,1,3, 3-Tetramethylbutylperoxy-2-ethylhexanoate, tert-amylperoxy-2-ethylhexanoate, tert-butylperoxy-2-ethylhexanoate, tertiary Amyl peroxy-3,5,5-trimethylhexanoate, tert-butylperoxy-3,5,5-trimethylhexanoate, tert-amyl peroxybenzoate, etc. Peroxyesters; di-2-ethylhexyl peroxydicarbonate, bis(4-tert-butylcyclohexyl)peroxydicarbonate, tert-butylperoxyisopropylcarbonate, 1 ,6-bis(tert-butyl peroxycarbonyloxy) hexane and other peroxycarbonates; tert-butyl hydroperoxide, cumene hydroperoxide, tert-butyl peroxycaprylate, peroxide Laureth and other organic peroxides or azobisisobutyronitrile, 4,4'-azobis(4-cyanovaleric acid), 2,2'-azobis(2,4-dimethylvaleronitrile) ) and other well-known hardening accelerators of azo-based compounds, but are not particularly limited to these. Preferred are ketone peroxides, diacyl peroxides, hydroperoxides, dialkyl peroxides, peroxyketals, alkyl peroxyesters, peroxycarbonates ( peroxycarbonate) and the like, more preferably dialkyl peroxides. As an addition amount of a radical polymerization initiator, 0.01-5 mass parts is preferable with respect to 100 mass parts of curable resin compositions, and 0.01-3 mass parts is especially preferable. When the amount of the radical polymerization initiator used is large, the dielectric properties of the cured product are deteriorated.
本發明的硬化性樹脂組成物根據需要添加或併用自由基聚合起始劑以外的硬化促進劑亦無妨。作為可使用的硬化促進劑的具體例,可列舉:2-(二甲基胺基甲基)苯酚或1,8-二氮雜-雙環(5,4,0)十一烯-7等三級胺類;三苯基膦等膦類;四丁基銨鹽、三異丙基甲基銨鹽、三甲基癸基銨鹽、鯨蠟基三甲基銨鹽、十六烷基三甲基氫氧化銨等四級銨鹽;三苯基苄基鏻鹽、三苯基乙基鏻鹽、四丁基鏻鹽等四級鏻鹽(四級鹽的抗衡離子為鹵素、有機酸根離子、氫氧化物離子等,並無特別指定,特佳為有機酸根離子、氫氧化物離子。)、辛酸錫、羧酸鋅(2-乙基己酸鋅、硬脂酸鋅、山萮酸鋅、肉豆蔻酸鋅)或磷酸酯鋅(辛基磷酸鋅、硬脂基磷酸鋅等)等鋅化合物等過渡金屬化合物(過渡金屬鹽)等。關於硬化促進劑的調配量,相對於硬化性樹脂組成物100重量份,根據需要可使用0.01重量份~5.0重量份。The curable resin composition of the present invention may be added or used in combination with curing accelerators other than the radical polymerization initiator as necessary. Specific examples of the curing accelerator that can be used include tris such as 2-(dimethylaminomethyl)phenol and 1,8-diaza-bicyclo(5,4,0)undecene-7 Grade amines; phosphines such as triphenylphosphine; tetrabutylammonium salt, triisopropylmethylammonium salt, trimethyldecylammonium salt, cetyltrimethylammonium salt, hexadecyltrimethylammonium salt Quaternary ammonium salts such as ammonium hydroxide; Hydroxide ions and the like are not particularly specified, but organic acid ions and hydroxide ions are particularly preferred.), tin octoate, zinc carboxylate (zinc 2-ethylhexanoate, zinc stearate, zinc behenate, Transition metal compounds (transition metal salts) such as zinc compounds (zinc myristate) or zinc phosphate (zinc octyl phosphate, zinc stearyl phosphate, etc.), etc. About the compounding quantity of a hardening accelerator, 0.01 weight part - 5.0 weight part can be used as needed with respect to 100 weight part of curable resin compositions.
進而,於本發明的硬化性樹脂組成物中,亦可含有含磷化合物作為阻燃性賦予成分。作為含磷化合物,可為反應型者亦可為添加型者。作為含磷化合物的具體例,可列舉:三甲基磷酸酯、三乙基磷酸酯、三甲苯基磷酸酯、三(二甲苯基)磷酸酯、甲苯基二苯基磷酸酯、甲苯基-2,6-二(二甲苯基)磷酸酯、1,3-伸苯基雙(二(二甲苯基)磷酸酯)、1,4-伸苯基雙(二(二甲苯基)磷酸酯)、4,4'-聯苯基(二(二甲苯基)磷酸酯)等磷酸酯類;9,10-二氫-9-氧雜-10-磷雜菲-10-氧化物、10-(2,5-二羥基苯基)-10H-9-氧雜-10-磷雜菲-10-氧化物等磷烷(phosphane)類;使環氧樹脂與所述磷烷類的活性氫反應而獲得的含磷環氧化合物、紅磷等,較佳為磷酸酯類、磷烷類或含磷環氧化合物,特佳為1,3-伸苯基雙(二(二甲苯基)磷酸酯)、1,4-伸苯基雙(二(二甲苯基)磷酸酯)、4,4'-聯苯基(二(二甲苯基)磷酸酯)或含磷環氧化合物。含磷化合物的含量較佳為(含磷化合物)/硬化性樹脂組成物中的樹脂成分為0.1~0.6(重量比)的範圍。若為0.1以下,則阻燃性不充分,若為0.6以上,則有對硬化物的吸濕性、介電特性造成不良影響之虞。Furthermore, the curable resin composition of the present invention may contain a phosphorus-containing compound as a flame retardancy imparting component. The phosphorus-containing compound may be either a reactive type or an additive type. Specific examples of phosphorus-containing compounds include trimethyl phosphate, triethyl phosphate, tricresyl phosphate, tris(xylyl) phosphate, tolyldiphenyl phosphate, tolyl-2 , 6-bis(xylyl) phosphate, 1,3-phenylene bis(bis(xylyl) phosphate), 1,4-phenylene bis(bis(xylyl) phosphate), Phosphate esters such as 4,4'-biphenyl (bis(xylyl) phosphate); 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10-(2 ,5-dihydroxyphenyl)-10H-9-oxa-10-phosphane-10-oxide and other phosphanes; obtained by reacting epoxy resin with the active hydrogen of the phosphanes Phosphorus-containing epoxy compounds, red phosphorus, etc., are preferably phosphoric acid esters, phosphoranes or phosphorus-containing epoxy compounds, especially 1,3-phenylene bis(bis(xylyl) phosphate), 1,4-phenylene bis(bis(xylyl) phosphate), 4,4'-biphenyl(bis(xylyl) phosphate) or phosphorus-containing epoxy compounds. The content of the phosphorus-containing compound is preferably in the range of (phosphorus-containing compound)/resin component in the curable resin composition from 0.1 to 0.6 (weight ratio). If it is 0.1 or less, the flame retardancy will be insufficient, and if it is 0.6 or more, the hygroscopicity and dielectric properties of the cured product may be adversely affected.
進而,於本發明的硬化性樹脂組成物中,根據需要亦可添加光穩定劑。作為光穩定劑,較佳為受阻胺系的光穩定劑,特佳為受阻胺光穩定劑(Hindered Amine Light Stabilizer,HALS)等。作為HALS,並無特別限定,作為具代表性者,可列舉:二丁胺-1,3,5-三嗪-N,N'-雙(2,2,6,6-四甲基-4-哌啶基)-1,6-六亞甲基二胺與N-(2,2,6,6-四甲基-4-哌啶基)丁胺的縮聚物、琥珀酸二甲基-1-(2-羥基乙基)-4-羥基-2,2,6,6-四甲基哌啶縮聚物、聚〔{6-(1,1,3,3-四甲基丁基)胺基-1,3,5-三嗪-2,4-二基}{(2,2,6,6-四甲基-4-哌啶基)亞胺基}六亞甲基{(2,2,6,6-四甲基-4-哌啶基)亞胺基}〕、雙(1,2,2,6,6-五甲基-4-哌啶基)〔{3,5-雙(1,1-二甲基乙基)-4-羥基苯基}甲基〕丁基丙二酸酯、雙(2,2,6,6-四甲基-4-哌啶基)癸二酸酯、雙(1,2,2,6,6-五甲基-4-哌啶基)癸二酸酯、雙(1-辛氧基-2,2,6,6-四甲基-4-哌啶基)癸二酸酯、2-(3,5-二-第三丁基-4-羥基苄基)-2-正丁基丙二酸雙(1,2,2,6,6-五甲基-4-哌啶基)酯等。HALS可僅使用一種,亦可將兩種以上併用。Furthermore, a light stabilizer may be added to the curable resin composition of this invention as needed. The light stabilizer is preferably a hindered amine light stabilizer, and particularly preferably a hindered amine light stabilizer (Hindered Amine Light Stabilizer, HALS). The HALS is not particularly limited, but typical examples include dibutylamine-1,3,5-triazine-N,N'-bis(2,2,6,6-tetramethyl-4 -Piperidinyl)-1,6-hexamethylenediamine and N-(2,2,6,6-tetramethyl-4-piperidinyl) butylamine polycondensate, dimethyl succinate- 1-(2-Hydroxyethyl)-4-hydroxy-2,2,6,6-tetramethylpiperidine polycondensate, poly[{6-(1,1,3,3-tetramethylbutyl) Amino-1,3,5-triazine-2,4-diyl}{(2,2,6,6-tetramethyl-4-piperidinyl)imino}hexamethylene{(2 ,2,6,6-tetramethyl-4-piperidinyl)imino}], bis(1,2,2,6,6-pentamethyl-4-piperidinyl)[{3,5 -Bis(1,1-dimethylethyl)-4-hydroxyphenyl}methyl]butylmalonate, bis(2,2,6,6-tetramethyl-4-piperidinyl) Sebacate, bis(1,2,2,6,6-pentamethyl-4-piperidinyl)sebacate, bis(1-octyloxy-2,2,6,6-tetramethyl) yl-4-piperidinyl)sebacate, 2-(3,5-di-tert-butyl-4-hydroxybenzyl)-2-n-butylmalonic acid bis(1,2,2, 6,6-pentamethyl-4-piperidinyl) ester and the like. Only one type of HALS may be used, or two or more types may be used in combination.
進而,於本發明的硬化性樹脂組成物中,根據需要亦可調配黏合劑樹脂。作為黏合劑樹脂,可列舉縮丁醛系樹脂、縮醛系樹脂、丙烯酸系樹脂、環氧-尼龍系樹脂、腈基丁二烯橡膠(nitrile butadiene rubber,NBR)-酚系樹脂、環氧-NBR系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、矽酮系樹脂等,但並不限定於該些。黏合劑樹脂的調配量較佳為不損及硬化物的阻燃性、耐熱性的範圍,相對於樹脂成分100質量份,較佳為0.05質量份~50質量份,進而較佳為0.05質量份~20質量份。Furthermore, in the curable resin composition of this invention, a binder resin can also be mix|blended as needed. Examples of the binder resin include butyral-based resins, acetal-based resins, acrylic-based resins, epoxy-nylon-based resins, nitrile butadiene rubber (NBR)-phenol-based resins, epoxy- NBR-based resins, polyimide-based resins, polyimide-based resins, silicone-based resins, etc. are not limited to these. The blending amount of the binder resin is preferably within a range that does not impair the flame retardancy and heat resistance of the cured product, and is preferably 0.05 to 50 parts by mass, and more preferably 0.05 parts by mass relative to 100 parts by mass of the resin component ~20 parts by mass.
進而,於本發明的硬化性樹脂組成物中,根據需要可添加熔融二氧化矽、結晶二氧化矽、多孔質二氧化矽、氧化鋁、鋯石、矽酸鈣、碳酸鈣、石英粉、碳化矽、氮化矽、氮化硼、氧化鋯、氮化鋁、石墨、鎂橄欖石(forsterite)、塊滑石(steatite)、尖晶石(spinel)、富鋁紅柱石(mullite)、二氧化鈦、滑石(talc)、黏土、氧化鐵、石棉(asbestos)、玻璃粉末等粉體,或將該些製成球狀或破碎狀的無機填充材。另外,特別是於獲得半導體封裝用的硬化性樹脂組成物的情況下,於硬化性樹脂組成物中,所述無機填充材的使用量通常為80質量%~92質量%、較佳為83質量%~90質量%的範圍。Furthermore, fused silica, crystalline silica, porous silica, alumina, zircon, calcium silicate, calcium carbonate, quartz powder, carbide can be added to the curable resin composition of the present invention as needed Silicon, silicon nitride, boron nitride, zirconia, aluminum nitride, graphite, forsterite, steatite, spinel, mullite, titanium dioxide, talc (talc), clay, iron oxide, asbestos (asbestos), glass powder and other powders, or inorganic fillers made of spherical or crushed materials. In addition, in the case of obtaining a curable resin composition for semiconductor encapsulation in particular, the amount of the inorganic filler used in the curable resin composition is usually 80 to 92 mass %, preferably 83 mass % % to 90% by mass.
進而,於本發明的硬化性樹脂組成物中,根據需要可調配公知的添加劑。作為可使用的添加劑的具體例,可列舉聚丁二烯及其改質物、丙烯腈共聚物的改質物、聚苯醚、聚苯乙烯、聚乙烯、聚醯亞胺、氟樹脂、矽酮凝膠、矽油、矽烷偶合劑般的填充材的表面處理劑、脫模劑、碳黑、酞青藍、酞青綠等著色劑。相對於樹脂成分100質量份,該些添加劑的調配量較佳為1,000質量份以下,更佳為700質量份以下的範圍。Furthermore, a well-known additive can be mix|blended with the curable resin composition of this invention as needed. Specific examples of additives that can be used include polybutadiene and its modified products, modified products of acrylonitrile copolymers, polyphenylene ether, polystyrene, polyethylene, polyimide, fluororesin, and silicone gel. Surface treatment agent, mold release agent, carbon black, phthalocyanine blue, phthalocyanine green and other colorants for fillers such as glue, silicone oil, and silane coupling agent. The blending amount of these additives is preferably 1,000 parts by mass or less, more preferably 700 parts by mass or less, relative to 100 parts by mass of the resin component.
本發明的硬化性樹脂組成物可藉由以規定的比例均勻地混合所述各成分而獲得,通常於130℃~180℃下以30秒~500秒的範圍預硬化,進而於150℃~200℃下後硬化2小時~15小時,藉此進行充分的硬化反應,獲得本發明的硬化物。另外,亦可使硬化性樹脂組成物的成分均勻地分散或溶解於溶劑等中,除去溶媒後使其硬化。The curable resin composition of the present invention can be obtained by uniformly mixing the above-mentioned components in a predetermined ratio, and is usually pre-cured at 130° C. to 180° C. for 30 seconds to 500 seconds, and further at 150° C. to 200° C. By post-curing at ℃ for 2 hours to 15 hours, a sufficient curing reaction proceeds, and the cured product of the present invention is obtained. In addition, the components of the curable resin composition may be uniformly dispersed or dissolved in a solvent or the like, and the solvent may be removed and then cured.
以該方式獲得的本發明的硬化性樹脂組成物具有耐濕性、耐熱性、高接著性、低介電常數、低介電損耗角正切。因此,本發明的硬化性樹脂組成物可於要求耐濕性、耐熱性、高接著性、低介電常數、低介電損耗角正切的廣泛的領域中使用。具體而言,可有效用作絕緣材料、積層板(印刷配線板、球柵陣列(ball grid array,BGA)用基板、增層基板等)、密封材料、抗蝕劑等所有電氣/電子零件用材料。另外,除了成形材料、複合材料以外,亦可用於塗料材料、接著劑、3D列印等領域中。特別是於半導體密封中,耐焊料回流性有益。The curable resin composition of the present invention obtained in this way has moisture resistance, heat resistance, high adhesiveness, low dielectric constant, and low dielectric loss tangent. Therefore, the curable resin composition of the present invention can be used in a wide range of fields requiring moisture resistance, heat resistance, high adhesiveness, low dielectric constant, and low dielectric loss tangent. Specifically, it can be effectively used as insulating materials, laminates (printed wiring boards, substrates for ball grid array (BGA), build-up substrates, etc.), sealing materials, and resists for all electrical/electronic parts. Material. In addition to forming materials and composite materials, it can also be used in the fields of coating materials, adhesives, and 3D printing. In particular, in semiconductor sealing, solder reflow resistance is beneficial.
半導體裝置具有利用本發明的硬化性樹脂組成物來密封者。作為半導體裝置,例如可列舉:雙列直插式封裝(dual in-line package,DIP)、四面扁平封裝(quad flat package,QFP)、球柵陣列(ball grid array,BGA)、晶片尺寸封裝(chip size package,CSP)、小外形封裝(small outline package,SOP)、薄小外形封裝(thin small outline package,TSOP)、薄四面扁平封裝(thin quad flat package,TQFP)等。The semiconductor device is sealed with the curable resin composition of the present invention. Examples of semiconductor devices include dual in-line packages (DIPs), quad flat packages (QFPs), ball grid arrays (BGAs), die-scale packages ( chip size package (CSP), small outline package (SOP), thin small outline package (TSOP), thin quad flat package (TQFP), etc.
本發明的硬化性樹脂組成物的製備方法並無特別限定,可如上文所記載般藉由使各成分分散或溶解於溶劑等中並均勻地混合、根據需要將溶劑蒸餾去除來製備,或者亦可進行預聚物化。例如於存在或不存在觸媒的情況下、於存在或不存在溶劑的情況下對成分(A)與成分(B)進行加熱,藉此進行預聚物化。同樣地,除了成分(A)與成分(B)以外,亦可追加環氧樹脂、胺化合物、馬來醯亞胺系化合物、氰酸酯化合物、酚樹脂、酸酐化合物等硬化劑及其他添加劑而進行預聚物化。關於各成分的混合或預聚物化,於不存在溶劑的情況下使用例如擠出機、捏合機、輥等,於存在溶劑的情況下使用帶有攪拌裝置的反應釜等。The preparation method of the curable resin composition of the present invention is not particularly limited, and can be prepared by dispersing or dissolving each component in a solvent or the like, mixing uniformly, and distilling off the solvent if necessary, or by dispersing or dissolving the components in a solvent as described above. Prepolymerization is possible. For example, prepolymerization is performed by heating the component (A) and the component (B) in the presence or absence of a catalyst and in the presence or absence of a solvent. Similarly, in addition to the components (A) and (B), curing agents such as epoxy resins, amine compounds, maleimide compounds, cyanate ester compounds, phenol resins, acid anhydride compounds, and other additives may be added. Prepolymerization is carried out. For mixing or prepolymerization of each component, for example, an extruder, a kneader, a roll, etc. are used in the absence of a solvent, and a reactor with a stirring device or the like is used in the presence of a solvent.
作為於不使用溶劑等的情況下均勻地混合的方法,以於50℃~100℃的範圍內的溫度下,使用捏合機、輥、行星式混合機等裝置融合的方式進行混合,製成均勻的硬化性樹脂組成物。所得的硬化性樹脂組成物亦可於粉碎後,利用壓錠機(tablet machine)等成型機成型為圓柱的錠狀,或者製成顆粒狀的粉體、或粉狀的成型體,或者將該些組成物於表面支撐體上熔融而成型為厚度0.05 mm~10 mm的片狀,製成硬化性樹脂組成物成型體。所得的成型體成為於0℃~20℃下無黏性的成型體,即使於-25℃~0℃下保管1週以上,流動性、硬化性亦幾乎不降低。 對於所得的成型體,可利用轉注成型機、壓縮成型機而成型為硬化物。 As a method of mixing uniformly without using a solvent or the like, mixing is performed at a temperature in the range of 50°C to 100°C using a device such as a kneader, a roller, a planetary mixer, etc., so as to be uniformly mixed. curable resin composition. The obtained curable resin composition can also be pulverized and then molded into a cylindrical ingot by a molding machine such as a tablet machine, or into a granular powder or a powder molded body, or a mixture of these. The composition is melted on the surface support, and molded into a sheet shape having a thickness of 0.05 mm to 10 mm, thereby obtaining a curable resin composition molded body. The obtained molded body was a non-tacky molded body at 0°C to 20°C, and even when stored at -25°C to 0°C for 1 week or more, the fluidity and curability hardly decreased. The obtained molded body can be molded into a cured product using a transfer injection molding machine or a compression molding machine.
亦可於本發明的硬化性樹脂組成物中添加有機溶劑而製成清漆狀的組成物(以下,亦簡稱為清漆。)。根據需要使本發明的硬化性樹脂組成物溶解於甲苯、二甲苯、丙酮、甲基乙基酮、甲基異丁基酮、二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯啶酮等溶劑中製成清漆,含浸於玻璃纖維、碳纖維、聚酯纖維、聚醯胺纖維、氧化鋁纖維、紙等基材中並進行加熱乾燥,對所得的預浸體進行熱壓成形,藉此可製成本發明的硬化性樹脂組成物的硬化物。此時的溶劑使用於本發明的硬化性樹脂組成物與該溶劑的混合物中通常佔10重量%~70重量%、較佳為佔15重量%~70重量%的量。若溶劑量少於該範圍,則清漆黏度變高,作業性劣化,若溶劑量多,則成為使硬化物中產生空隙的原因。另外,若為液狀組成物,則亦可直接例如藉由樹脂轉注成形(resin transfer molding,RTM)方式獲得含有碳纖維的硬化性樹脂硬化物。An organic solvent may be added to the curable resin composition of this invention, and it may be set as a varnish-like composition (henceforth, it is also abbreviated as a varnish.). If necessary, the curable resin composition of the present invention is dissolved in toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl ketone, dimethylformamide, dimethylacetamide, N-methyl acetone It is made into varnish in a solvent such as pyrrolidone, impregnated in glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber, paper and other substrates, heated and dried, and the obtained prepreg is hot pressed By molding, a cured product of the curable resin composition of the present invention can be obtained. The solvent in this case is usually used in an amount of 10 to 70% by weight, preferably 15 to 70% by weight, in the mixture of the curable resin composition of the present invention and the solvent. If the amount of solvent is less than this range, the viscosity of the varnish will increase, and workability will be deteriorated, and if the amount of solvent is large, it will cause voids in the cured product. In addition, if it is a liquid composition, a curable resin cured product containing carbon fibers can be obtained directly, for example, by resin transfer molding (RTM) method.
另外,亦可將本發明的硬化性組成物用作膜型組成物的改質劑。具體而言,可於提高B-階段的可撓性等的情況下使用。此種膜型的樹脂組成物是將本發明的硬化性樹脂組成物製成所述硬化性樹脂組成物清漆並塗佈於剝離膜上,於加熱下除去溶劑後,進行B-階段化,藉此作為片狀的接著劑而獲得。該片狀接著劑可用作多層基板等的層間絕緣層。Moreover, the curable composition of this invention can also be used as a modifier of a film-type composition. Specifically, it can be used in the case of improving the flexibility of the B-stage and the like. For the resin composition of this film type, the curable resin composition of the present invention is made into the curable resin composition varnish and coated on the release film, and after removing the solvent under heating, it is B-staged. This is obtained as a sheet-like adhesive. This sheet-like adhesive can be used as an interlayer insulating layer of a multilayer substrate or the like.
本發明的硬化性樹脂組成物可加熱熔融、低黏度化而含浸於玻璃纖維、碳纖維、聚酯纖維、聚醯胺纖維、氧化鋁纖維等強化纖維中,藉此獲得預浸體。作為其具體例,例如可列舉E玻璃布、D玻璃布、S玻璃布、Q玻璃布、球狀玻璃布、NE玻璃布、及T玻璃布等玻璃纖維,進而可列舉玻璃以外的無機物的纖維或聚對苯二甲醯對苯二胺(polyparaphenylene terephthalamide)(凱夫拉(kevlar)(註冊商標),杜邦(Dupont)股份有限公司製造)、全芳香族聚醯胺、聚酯;以及聚對伸苯基苯並噁唑(polyparaphenylene benzoxazole)、聚醯亞胺及碳纖維等有機纖維,但並不特別限定於該些。作為基材的形狀,並無特別限定,例如可列舉織布、不織布、粗紗(roving)、切股氈(chopped strand mat)等。另外,作為織布的織法,已知有平紋組織、方平組織(basket weave)、斜紋組織(twill weave)等,可自該些公知的織法中根據目標用途或性能適當選擇來使用。另外,較佳為使用對織布進行了開纖處理者或利用矽烷偶合劑等進行了表面處理的玻璃織布。基材的厚度並無特別限定,較佳為0.01 mm~0.4 mm左右。另外,亦可藉由將所述清漆含浸於強化纖維中並進行加熱乾燥而獲得預浸體。The curable resin composition of the present invention can be heated, melted, and reduced in viscosity, and impregnated with reinforcing fibers such as glass fibers, carbon fibers, polyester fibers, polyamide fibers, and alumina fibers to obtain a prepreg. Specific examples thereof include glass fibers such as E glass cloth, D glass cloth, S glass cloth, Q glass cloth, spherical glass cloth, NE glass cloth, and T glass cloth, and further include inorganic fibers other than glass. or polyparaphenylene terephthalamide (kevlar (registered trademark), manufactured by Dupont Co., Ltd.), wholly aromatic polyamide, polyester; and polyparatylene Organic fibers such as polyparaphenylene benzoxazole, polyimide, and carbon fibers are not particularly limited to these. Although it does not specifically limit as a shape of a base material, For example, a woven fabric, a nonwoven fabric, a roving (roving), a chopped strand mat (chopped strand mat) etc. are mentioned. In addition, as the weave of the woven fabric, a plain weave, a basket weave, a twill weave, etc. are known, and it can be appropriately selected and used from these known weaves according to the intended use and performance. In addition, it is preferable to use a glass woven fabric that has been subjected to a fiber opening treatment on the woven fabric, or a glass woven fabric that has been surface-treated with a silane coupling agent or the like. The thickness of the base material is not particularly limited, but is preferably about 0.01 mm to 0.4 mm. In addition, a prepreg can also be obtained by impregnating the varnish in a reinforcing fiber and heating and drying it.
本實施方式的積層板包括一片以上的所述預浸體。積層板只要為包括一片以上的預浸體者則並無特別限定,亦可具有其他的任何層。作為積層板的製造方法,可適當應用一般公知的方法,並無特別限定。例如,於貼有金屬箔的積層板的成形時,可使用多段壓製機、多段真空壓製機、連續成形機、高壓釜成形機等,可藉由將所述預浸體彼此積層並進行加熱加壓成形而獲得積層板。此時,加熱的溫度並無特別限定,較佳為65℃~300℃,更佳為120℃~270℃。另外,加壓的壓力並無特別限定,若加壓過大則積層板的樹脂的固體成分調整困難,品質不穩定,另外若壓力過小,則氣泡或積層間的密接性變差,因此較佳為2.0 MPa~5.0 MPa,更佳為2.5 MPa~4.0 MPa。本實施方式的積層板藉由包括具有金屬箔的層,可較佳地用作後述的貼有金屬箔的積層板。 將所述預浸體裁斷為所期望的形狀,視需要與銅箔等積層後,一邊利用壓製成形法或高壓釜成形法、片捲曲(sheet winding)成形法等對積層物施加壓力,一邊使硬化性樹脂組成物加熱硬化,藉此可獲得電氣電子用積層板(印刷配線板)或碳纖維強化材。 The laminate of the present embodiment includes one or more pieces of the prepreg. The laminate is not particularly limited as long as it includes one or more prepregs, and may have any other layer. As a manufacturing method of a laminated board, a generally well-known method can be suitably applied, and it does not specifically limit. For example, a multi-stage press, a multi-stage vacuum press, a continuous molding machine, an autoclave molding machine, etc. can be used in the molding of a metal foil-clad laminate, and the prepregs can be laminated and heated. Press-formed to obtain a laminate. In this case, the heating temperature is not particularly limited, but is preferably 65°C to 300°C, more preferably 120°C to 270°C. In addition, the pressure of the pressing is not particularly limited. If the pressure is too large, the solid content of the resin of the laminate will be difficult to adjust and the quality will be unstable. If the pressure is too small, the adhesion between the bubbles and the laminate will be deteriorated. Therefore, it is preferably 2.0 MPa to 5.0 MPa, more preferably 2.5 MPa to 4.0 MPa. The laminated board of this embodiment can be suitably used as a laminated board with a metal foil which is mentioned later by including the layer which has a metal foil. The prepreg is cut into a desired shape, laminated with copper foil or the like as necessary, and then press-molded, autoclave, sheet-winding, or the like is applied to the laminate. The curable resin composition is heated and hardened, whereby a laminated board (printed wiring board) for electrical and electronic use or a carbon fiber reinforced material can be obtained.
本發明的硬化物可用於成型材料、接著劑、複合材料、塗料等各種用途。本發明記載的硬化性樹脂組成物的硬化物顯示出優異的耐熱性及介電特性,因此可較佳地用於半導體元件用密封材、液晶顯示元件用密封材、有機電致發光(electroluminescence,EL)元件用密封材、印刷配線基板、增層積層板等電氣電子零件或碳纖維強化塑膠、玻璃纖維強化塑膠等輕量高強度結構材用複合材料中。 [實施例] The cured product of the present invention can be used in various applications such as molding materials, adhesives, composite materials, and paints. The cured product of the curable resin composition described in the present invention exhibits excellent heat resistance and dielectric properties, and thus can be preferably used for a sealing material for semiconductor elements, a sealing material for liquid crystal display elements, and organic electroluminescence (electroluminescence, EL) components for sealing materials, printed wiring boards, electrical and electronic parts such as build-up laminates, or composite materials for lightweight and high-strength structural materials such as carbon fiber reinforced plastics and glass fiber reinforced plastics. [Example]
以下,藉由實施例、比較例來具體說明本發明。再者,本文中「份」及「%」分別表示「重量份」及「重量%」。軟化點及熔融黏度是藉由下述方法進行測定。 ・軟化點:藉由依據日本工業標準(Japanese Industrial Standards,JIS)K-7234的方法進行測定 ・熔融黏度:藉由ICI熔融黏度(150℃)錐板法測定,單位為Pa·s。 Hereinafter, the present invention will be specifically described with reference to Examples and Comparative Examples. In addition, "part" and "%" in this document represent "weight part" and "weight %", respectively. The softening point and melt viscosity were measured by the following methods. ・Softening point: Measured by a method based on Japanese Industrial Standards (JIS) K-7234 ・Melt viscosity: measured by the ICI melt viscosity (150℃) cone and plate method, the unit is Pa·s.
・凝膠滲透層析法(GPC)分析 製造商:沃特世(Waters) 管柱:索得克斯(SHODEX)GPC KF-601(兩根)、KF-602、KF-602.5、KF-603 流速:0.5 ml/min. 管柱溫度:40℃ 使用溶劑:四氫呋喃(tetrahydrofuran,THF) 檢測器:RI(示差折射檢測器) ・Gel permeation chromatography (GPC) analysis Manufacturer: Waters Column: SHODEX (SHODEX) GPC KF-601 (two), KF-602, KF-602.5, KF-603 Flow rate: 0.5 ml/min. Column temperature: 40℃ Solvent used: tetrahydrofuran (tetrahydrofuran, THF) Detector: RI (Differential Refraction Detector)
・高效液相層析法(HPLC)分析 管柱:因納茲(Inertsil)ODS-2 流速:1.0 ml/min. 管柱溫度:40℃ 使用溶劑:乙腈/水 檢測器:光二極體陣列(225 nm) ・Analysis by high performance liquid chromatography (HPLC) String: Inertsil ODS-2 Flow rate: 1.0 ml/min. Column temperature: 40℃ Solvent used: acetonitrile/water Detector: Photodiode array (225 nm)
・示差掃描量熱法(differential scanning calorimetry,DSC)分析 製造商:TA儀器(TA Instrument) 裝置:DSC2500 升溫速度:10℃/min 測定溫度範圍:30℃~350℃ ・Differential scanning calorimetry (DSC) analysis Manufacturer: TA Instrument Device: DSC2500 Heating rate: 10℃/min Measurement temperature range: 30℃~350℃
・動態機械分析(dynamic mechanical analysis,DMA) 製造商:TA儀器(TA Instrument) 裝置:DMAQ800 測定模式:拉伸 升溫速度:2℃/min. 測定溫度範圍:25℃~350℃ 測定頻率:10 Hz 將tanδ的值最大時的溫度設為Tg。 ・Dynamic mechanical analysis (DMA) Manufacturer: TA Instrument Device: DMAQ800 Measurement Mode: Stretch Heating rate: 2℃/min. Measurement temperature range: 25℃~350℃ Measurement frequency: 10 Hz The temperature at which the value of tanδ is the largest is set as Tg.
・Td5分析 製造商:精工儀器(Seiko Instruments)股份有限公司 裝置:熱重-差熱分析(thermogravimetric-differential thermal analysis,TG/DTA)6200 測定溫度範圍:30℃~580℃ 升溫速度:10℃/min ・Td5 analysis Manufacturer: Seiko Instruments Co., Ltd. Device: Thermogravimetric-differential thermal analysis (TG/DTA) 6200 Measurement temperature range: 30℃~580℃ Heating rate: 10℃/min
・熱機械分析(thermomechanical analysis,TMA) 製造商:TA儀器(TA Instrument) 裝置:TMAQ400 測定模式:拉伸 升溫速度:2℃/min. 測定溫度範圍:25℃~330℃ ・Thermomechanical analysis (TMA) Manufacturer: TA Instrument Device: TMAQ400 Measurement Mode: Stretch Heating rate: 2℃/min. Measurement temperature range: 25℃~330℃
・機械強度 製造商:島津製作所 裝置:奧拓古拉福(Autograph)AGS-X 拉伸速度:0.5 mm/min 以試驗片的長度成為5 cm的方式進行夾持,於180°方向上以所述試驗速度進行拉伸測定。 ·Mechanical strength Manufacturer: Shimadzu Corporation Installation: Autograph AGS-X Tensile speed: 0.5 mm/min The test piece was clamped so that the length of the test piece would be 5 cm, and the tensile measurement was performed in the 180° direction at the test speed.
・剝離強度試驗 製造商:島津製作所 裝置:奧拓古拉福(Autograph)AGS-X 剝離試驗拉伸速度:50 mm/min 利用厚度18 μm電解銅箔(CF-T4X-SV-18:福田金屬箔粉工業股份有限公司製造)的粗糙面與厚度35 μm的電解銅箔(CF-T9B-HTE:福田金屬箔粉工業股份有限公司製造)的粗糙面夾持硬化性樹脂組成物,於1 MPa的壓力下以220℃、2小時的條件下使其硬化而製作試驗片。將所獲得的試驗片切斷為寬度2 cm後,將厚度18 μm的電解銅箔以殘留寬度1 cm的方式切斷去除。對寬度1 cm且厚度18 μm的電解銅箔沿90°方向以所述試驗速度進行拉伸,測定剝離強度。 ・Peel strength test Manufacturer: Shimadzu Corporation Installation: Autograph AGS-X Peel test tensile speed: 50 mm/min Using the rough surface of 18 μm thick electrolytic copper foil (CF-T4X-SV-18: manufactured by Futian Metal Foil Industry Co., Ltd.) and 35 μm thick electrolytic copper foil (CF-T9B-HTE: Futian Metal Foil Powder Industry Co., Ltd. Co., Ltd.) sandwiched the curable resin composition on the rough surface, and cured it under a pressure of 1 MPa at 220° C. for 2 hours to prepare a test piece. After cutting the obtained test piece into a width of 2 cm, the electrolytic copper foil with a thickness of 18 μm was cut and removed so as to have a remaining width of 1 cm. The electrodeposited copper foil having a width of 1 cm and a thickness of 18 μm was stretched in the 90° direction at the test speed, and the peel strength was measured.
・吸水率試驗 於水中浸漬24小時後取出,並於25℃、30%的環境下放置24小時,然後測定重量來算出。 ・Water absorption test After being immersed in water for 24 hours, it was taken out, left to stand for 24 hours in an environment of 25° C. and 30%, and then calculated by measuring the weight.
・介電常數試驗、介電損耗角正切試驗 製造商:AET股份有限公司 裝置:10 GHz空腔諧振器 利用乾燥機,對寬度2.5 mm、長度5 cm的試驗片進行120℃、2小時乾燥後進行測定。進而,將試驗片於水中浸漬24小時後取出,於25℃、30%的環境下放置24小時後,再次進行測定。 ・Dielectric constant test, dielectric loss tangent test Manufacturer: AET Corporation Device: 10 GHz Cavity Resonator The measurement was performed after drying the test piece with a width of 2.5 mm and a length of 5 cm at 120° C. for 2 hours using a dryer. Furthermore, after immersing the test piece in water for 24 hours, it was taken out, and after being left to stand for 24 hours in an environment of 25°C and 30%, the measurement was performed again.
[合成例1] 芳香族胺樹脂(A-1)的合成 向安裝有溫度計、冷卻管、迪安斯塔克(Dean-Stark)共沸蒸餾捕集器、攪拌機的燒瓶中裝入苯胺192份與甲苯112份、1,3-雙(2-羥基-2-丙基)苯100份,歷時10分鐘滴加35%鹽酸21.5份。將系統內升溫至160℃,一邊蒸餾去除水、甲苯,一邊於該溫度下進行17小時反應。然後冷卻至80℃後,加入甲苯124份,歷時10分鐘滴加30%氫氧化鈉水溶液30份。其後,於該溫度下攪拌2小時,靜置30分鐘。將分離出的下層的水層去除,反覆進行反應液的水洗直至清洗液變為中性。繼而,利用旋轉蒸發器於加熱減壓下自油層蒸餾去除過剩的苯胺與甲苯,藉此獲得所述式(2)所表示的芳香族胺樹脂(A-1)158份。芳香族胺樹脂(A-1)的胺當量為186.1 g/eq,軟化點為58.8℃。根據GPC分析(RI),n=1體為62.5面積%。GPC圖示於圖1。 [Synthesis Example 1] Synthesis of Aromatic Amine Resin (A-1) 192 parts of aniline, 112 parts of toluene, 1,3-bis(2-hydroxy-2) were charged into a flask equipped with a thermometer, a cooling tube, a Dean-Stark azeotropic distillation trap, and a stirrer 100 parts of -propyl)benzene, 21.5 parts of 35% hydrochloric acid was added dropwise over 10 minutes. The temperature in the system was raised to 160°C, and the reaction was performed at this temperature for 17 hours while distilling off water and toluene. Then, after cooling to 80° C., 124 parts of toluene was added, and 30 parts of a 30% aqueous sodium hydroxide solution was added dropwise over 10 minutes. Then, it stirred at this temperature for 2 hours, and left still for 30 minutes. The separated water layer of the lower layer was removed, and the water washing of the reaction liquid was repeated until the washing liquid became neutral. Next, 158 parts of aromatic amine resins (A-1) represented by the above formula (2) were obtained by distilling off excess aniline and toluene from the oil layer under heating and decompression using a rotary evaporator. The amine equivalent of the aromatic amine resin (A-1) was 186.1 g/eq, and the softening point was 58.8°C. According to GPC analysis (RI), n=1 body was 62.5 area %. The GPC diagram is shown in Figure 1.
[合成例2] 馬來醯亞胺樹脂(M-1)的合成 向安裝有溫度計、冷卻管、迪安斯塔克共沸蒸餾捕集器、攪拌機的燒瓶中裝入馬來酸酐73.5份與甲苯126份、甲磺酸1.86份、N-甲基-2-吡咯啶酮12.6份,設為加熱回流狀態。接著,一邊保持回流狀態,一邊歷時4小時滴加將芳香族胺樹脂(A-1)93份溶解於甲苯55.8份中所得的樹脂溶液。於此期間,將在回流條件下共沸的縮合水及甲苯於迪安斯塔克共沸蒸餾捕集器內冷卻/分液後,作為有機層的甲苯返回至系統內,水排出至系統外。於樹脂溶液的滴加結束後,保持回流狀態,一邊進行脫水操作一邊進行10小時反應。 反應結束後,反覆進行4次水洗而去除甲磺酸及過剩的馬來酸酐,於70℃以下的加熱減壓下,藉由甲苯與水的共沸而自系統內去除水。繼而,加入甲磺酸2份,於加熱回流狀態下進行4小時反應。反應結束後,反覆進行3次水洗直至水洗水變為中性,之後於70℃以下的加熱減壓下,藉由甲苯與水的共沸而自系統內去除水後,於加熱減壓下蒸餾去除溶劑直至甲苯成為約70%-80%左右的樹脂濃度後,追加甲苯進行調整至樹脂濃度60%。藉此獲得含有本發明的馬來醯亞胺(M-1)的馬來醯亞胺溶液(V-1)。根據GPC分析(RI),所獲得的馬來醯亞胺樹脂(M-1)的n=1體為57.4面積%,n=2體為21.3面積%,n=3體以上為21.3面積%。根據HPLC分析(225 nm),n=1體中的配向比(鄰位-鄰位體/對位-對位體/鄰位-對位體)為32.0%/25.4%/42.6%。另外,軟化點為115.5℃,黏度為6.0 Pa·s。GPC圖示於圖2。 [Synthesis Example 2] Synthesis of Maleimide Resin (M-1) 73.5 parts of maleic anhydride, 126 parts of toluene, 1.86 parts of methanesulfonic acid, and N-methyl-2-pyrrole were placed in a flask equipped with a thermometer, a cooling pipe, a Dean Stark azeotropic distillation trap, and a stirrer. 12.6 parts of pyridones were heated and refluxed. Next, the resin solution obtained by dissolving 93 parts of aromatic amine resin (A-1) in 55.8 parts of toluene was dripped over 4 hours, maintaining a reflux state. During this period, the condensation water and toluene azeotroped under reflux conditions are cooled/separated in the Dean Stark azeotropic distillation trap, the toluene as an organic layer is returned to the system, and the water is discharged to the outside of the system . After the dropwise addition of the resin solution was completed, the reaction was performed for 10 hours while maintaining the reflux state while performing a dehydration operation. After completion of the reaction, washing with water was repeated four times to remove methanesulfonic acid and excess maleic anhydride, and water was removed from the system by azeotropy of toluene and water under heating and reduced pressure at 70°C or lower. Next, 2 parts of methanesulfonic acid was added, and the reaction was carried out for 4 hours in a heated reflux state. After the completion of the reaction, washing with water was repeated 3 times until the washing water became neutral, and then the water was removed from the system by the azeotropy of toluene and water under heating and decompression at a temperature of 70°C or lower, and then distillation was carried out under heating and decompression. After removing the solvent until the toluene has a resin concentration of about 70% to 80%, toluene is added to adjust the resin concentration to 60%. Thereby, the maleimide solution (V-1) containing the maleimide (M-1) of the present invention was obtained. According to GPC analysis (RI), the obtained maleimide resin (M-1) had 57.4 area% of n=1 body, 21.3 area% of n=2 body, and 21.3 area% of n=3 body or more. According to HPLC analysis (225 nm), the alignment ratio in the n=1 body (ortho-ortho/para-para/ortho-para) was 32.0%/25.4%/42.6%. In addition, the softening point was 115.5°C, and the viscosity was 6.0 Pa·s. The GPC diagram is shown in Figure 2.
[實施例1~實施例5、比較例1~比較例6] 以表1所表示的比例量取馬來醯亞胺化合物與具有不飽和雙鍵的聚苯醚化合物,加入甲苯以使樹脂固體成分成為50%,然後於70℃下進行1小時加熱混合,藉此製作清漆。以目視確認此時的樹脂的溶解性與相容性,於後述的條件下進行評價。結果示於表1。 進而,將作為硬化促進劑的過氧化二異丙苯(DCP(dicumyl peroxide),化藥諾力昂(Nouryon)公司製造)溶解於清漆中。利用真空乾燥機,對溶解有硬化促進劑的清漆於80℃下加熱30分鐘、於120℃下加熱1小時,藉此製備硬化性樹脂組成物。利用銅箔夾持所獲得的硬化性樹脂組成物,於真空下施加1 MPa的壓力,於220℃下硬化2小時。確認此時的硬化性,並利用後述的條件進行評價。對所獲得的硬化物進行各種測定的結果示於表1。 [Example 1 to Example 5, Comparative Example 1 to Comparative Example 6] The maleimide compound and the polyphenylene ether compound having an unsaturated double bond were weighed in the proportions shown in Table 1, toluene was added to make the resin solid content 50%, and then the mixture was heated and mixed at 70° C. for 1 hour. This makes varnish. The solubility and compatibility of the resin at this time were visually confirmed and evaluated under the conditions described later. The results are shown in Table 1. Furthermore, dicumyl peroxide (DCP (dicumyl peroxide), a chemical drug Nouryon) as a hardening accelerator was dissolved in the varnish. A curable resin composition was prepared by heating the varnish in which the hardening accelerator was dissolved by a vacuum dryer at 80°C for 30 minutes and at 120°C for 1 hour. The obtained curable resin composition was sandwiched between copper foils, and was cured at 220° C. for 2 hours by applying a pressure of 1 MPa under vacuum. The curability at this time was confirmed and evaluated under the conditions described later. Table 1 shows the results of various measurements of the obtained hardened product.
溶解性判定條件:〇・・・溶液中無沈澱 ×・・・溶液中有沈澱 相容性判定條件:〇・・・相容 ×・・・不相容(相分離) 220℃硬化性判定條件:〇・・・可獲得硬化物 ×・・・未獲得硬化物(硬化物脆,無法取出) Solubility Judgment Conditions: 〇・・・No precipitation in solution ×・・・Precipitation in solution Compatibility criteria: 〇・・・Compatible ×・・・Incompatibility (phase separation) 220℃ curability judgment condition: 〇・・・Cured product can be obtained ×・・・No hardened product obtained (hardened product is brittle and cannot be taken out)
・M-1(藉由加熱減壓將合成例2中所得物的溶劑蒸餾去除而成者) ・MIR-3000(藉由加熱減壓將MIR-3000-70MT(日本化藥股份有限公司製造)的溶劑蒸餾去除而成者) ・BMI-70(KI化成股份有限公司製造) ・BMI-2300(大和化成股份有限公司製造) ・SA-9000-111(沙特基礎工業公司(Saudi Basic Industries Corporation,Sabic)製造)Mw:3653,Mn:2648 ・OPE-2st1200(三菱瓦斯化學公司製造)Mn:1200 ・M-1 (The solvent obtained in Synthesis Example 2 was distilled off by heating and reducing pressure) ・MIR-3000 (The solvent of MIR-3000-70MT (manufactured by Nippon Kayaku Co., Ltd.) is distilled off by heating and reducing pressure) ・BMI-70 (manufactured by KI Chemical Co., Ltd.) ・BMI-2300 (manufactured by Yamato Chemical Co., Ltd.) ・SA-9000-111 (manufactured by Saudi Basic Industries Corporation (Sabic)) Mw: 3653, Mn: 2648 ・OPE-2st1200 (manufactured by Mitsubishi Gas Chemical Co., Ltd.) Mn: 1200
[表1]
實施例1~實施例5中均確認到溶劑溶解性、相容性良好,於220℃、2小時下硬化反應良好地進行,耐熱性、銅箔剝離強度、耐濕性、介電特性優異。比較例1由於大量使用了馬來醯亞胺化合物(M-1),因此確認到吸水率、介電特性高(差)。於如比較例2般單獨使用馬來醯亞胺化合物(M-1)的情況下,確認到耐熱性、介電損耗角正切良好,但由於銅箔剝離強度低、進而吸水率高,因此吸水後的介電損耗角正切亦劣化。當如比較例3般單獨使用具有不飽和雙鍵的聚苯醚化合物的情況下,於220℃、2小時的硬化條件下未硬化。於如比較例4~比較例6般使用其他馬來醯亞胺樹脂的情況下,成為溶劑溶解性或相容性差、介電特性及吸水後的介電特性高(差)的結果。In Examples 1 to 5, it was confirmed that the solvent solubility and compatibility were good, the curing reaction proceeded well at 220° C. for 2 hours, and the heat resistance, copper foil peel strength, moisture resistance, and dielectric properties were excellent. In Comparative Example 1, since a large amount of the maleimide compound (M-1) was used, it was confirmed that the water absorption rate and the dielectric properties were high (poor). When the maleimide compound (M-1) was used alone as in Comparative Example 2, it was confirmed that the heat resistance and the dielectric loss tangent were good, but the copper foil had low peel strength and high water absorption, so water was absorbed. The resulting dielectric loss tangent also deteriorates. When the polyphenylene ether compound having an unsaturated double bond was used alone as in Comparative Example 3, it was not cured under the curing conditions of 220° C. and 2 hours. When other maleimide resins were used as in Comparative Examples 4 to 6, the solvent solubility and compatibility were poor, and the dielectric properties and the dielectric properties after water absorption were high (poor).
無none
圖1是合成例1的凝膠滲透層析法(gel permeation chromatography,GPC)圖。 圖2是合成例2的GPC圖。 FIG. 1 is a graph of gel permeation chromatography (GPC) of Synthesis Example 1. FIG. FIG. 2 is a GPC chart of Synthesis Example 2. FIG.
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