TW202221422A - Control device for controlling manipulators for a projection lens - Google Patents

Control device for controlling manipulators for a projection lens Download PDF

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TW202221422A
TW202221422A TW110130653A TW110130653A TW202221422A TW 202221422 A TW202221422 A TW 202221422A TW 110130653 A TW110130653 A TW 110130653A TW 110130653 A TW110130653 A TW 110130653A TW 202221422 A TW202221422 A TW 202221422A
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optimization algorithm
travel
projection lens
control device
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TWI785747B (en
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馬克西米利安 舒勒莫
斯特凡 里斯特
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德商卡爾蔡司Smt有限公司
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70258Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70258Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70308Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)

Abstract

A control device (14) for controlling manipulators (M1-M4, 36) for changing an optical behaviour of a microlithographic projection lens (16) by generating respective stipulations (38) for a plurality of travel variables which define manipulations, to be undertaken by means of the manipulators, of at least one optical element (E1-E4) of the projection lens for the purposes of changing state parameters (34) of the projection lens is provided. The control device is configured to generate a respective approximation (38-1) of the stipulations for the travel variables by optimizing a uniform scaling factor (86) using a first optimization algorithm (74), said scaling factor, in constraints (82) of the first optimization algorithm, defining a uniform scaling of limits (84) specified for the individual state parameters, and to ascertain a respective final result (38) of the stipulations for the travel variables by means of at least one further optimization algorithm (76, 78) in the case where an optimization result (87) for the uniform scaling factor, as ascertained by means of the first optimization algorithm, does not exceed a specified threshold (85).

Description

用於控制投影透鏡之操縱器的控制器件Control device for manipulator of projection lens

本申請案主張於2020年8月20日申請的德國專利申請案第10 2020 210 567.7號的優先權。本專利申請案的整個內容並入本文供參考。This application claims priority from German Patent Application No. 10 2020 210 567.7 filed on August 20, 2020. The entire contents of this patent application are incorporated herein by reference.

本發明有關一種控制器件及一種用於控制多個操縱器以改變一微影投影透鏡的光學行為之方法。此外,本發明有關一種用於調整微影投影透鏡的調整裝置、一種用於具有此一控制器件的微影投影曝光裝置的投影透鏡、以及一種具有此一投影透鏡的微影投影曝光裝置。The present invention relates to a control device and a method for controlling a plurality of manipulators to change the optical behavior of a lithographic projection lens. In addition, the present invention relates to an adjustment device for adjusting a lithography projection lens, a projection lens for a lithography projection exposure device with the control device, and a lithography projection exposure device with the projection lens.

在半導體組件的生產時,一微影投影曝光裝置用於在形式為一半導體晶圓的基材上產生結構。為此,投影曝光裝置包括具有複數個光學元件的一投影透鏡,用於在曝光程序中成像光罩結構於晶圓上。In the production of semiconductor components, a lithographic projection exposure apparatus is used to produce structures on a substrate in the form of a semiconductor wafer. To this end, the projection exposure apparatus includes a projection lens with a plurality of optical elements for imaging the reticle structure on the wafer during the exposure procedure.

需要具有盡量小的波前像差的一投影透鏡,以保證成像在晶圓上的光罩結構盡可能精確。因此,投影透鏡配備操縱器可藉由改變投影透鏡的個別光學元件的狀態來校正波前誤差。此一狀態改變的示例包括:相關光學元件的六個剛體自由度中的一或多者的相對位置改變、對光學元件施加熱及/或冷。此外,還可提供一或多個後處理單元,用於藉表面處理從一光學元件上燒蝕材料,來改變一光學元件的形狀。此一後處理單元可為投影透鏡的一部分,或者與其分離,並且在本文的範圍內同樣稱為一操縱器。A projection lens with as little wavefront aberration as possible is required to ensure that the reticle structure imaged on the wafer is as accurate as possible. Therefore, a projection lens equipped with a manipulator can correct for wavefront errors by changing the state of the individual optical elements of the projection lens. Examples of such a state change include a change in relative position of one or more of the six rigid body degrees of freedom of the associated optical element, application of heat and/or cooling to the optical element. Additionally, one or more post-processing units may be provided for ablating material from an optical element by surface treatment to change the shape of an optical element. Such a post-processing unit may be part of the projection lens, or separate therefrom, and is also referred to as a manipulator within the scope of this document.

為了校正一投影透鏡的像差特徵而執行的操縱器修正係藉由一行程產生最佳化演算法來計算,其亦稱為「操縱器修正模型」。舉例來說,在專利案號WO 2010/034674 A1中揭露此最佳化演算法。Manipulator corrections performed to correct for aberration characteristics of a projection lens are calculated by a stroke-generating optimization algorithm, also known as a "manipulator correction model". For example, this optimization algorithm is disclosed in patent case number WO 2010/034674 A1.

因此,習知技術中已知的最佳化演算法可構造成解決以下最佳化問題:

Figure 02_image003
其中
Figure 02_image005
Therefore, optimization algorithms known in the prior art can be constructed to solve the following optimization problems:
Figure 02_image003
in
Figure 02_image005

此一最佳化問題構造成最小化目標函數(亦稱為優點函數或優值函數),由

Figure 02_image007
描述,考慮到由
Figure 02_image009
所描述的限度。此處, M表示一靈敏度矩陣, x表示具有個別操縱器的行程變數 x k 的一行程向量, b mess 表示投影透鏡的一狀態向量,其描述投影透鏡的一測量像差特徵的個別狀態參數,
Figure 02_image011
表示歐基里德範數,以及
Figure 02_image013
表示個別行程變數 x k 的一相對固定限制。 This optimization problem is structured to minimize the objective function (also known as the merit function or merit function), given by
Figure 02_image007
description, taking into account the
Figure 02_image009
the described limits. Here, M denotes a sensitivity matrix, x denotes a travel vector with travel variables x k of the individual manipulators, b mess denotes a state vector of the projection lens, which describes an individual state parameter of a measured aberration characteristic of the projection lens,
Figure 02_image011
represents the Euclidean norm, and
Figure 02_image013
represents a relatively fixed limit for the individual travel variable xk .

為確保即使投影透鏡的狀態參數,特別是投影透鏡的像差,也能遵守所設想的限制,按慣例將合適的影響因子項結合到目標函數中。取決於相關影響因子項的權重或者嚴格度,此類影響因子項實質上代表「軟」限制或目標,在一定程度上被遵守或選擇性超出。To ensure that even the state parameters of the projection lens, in particular the aberrations of the projection lens, respect the envisaged constraints, it is customary to incorporate a suitable influence factor term into the objective function. Depending on the weight or stringency of the relevant impact factor term, such impact factor term essentially represents a "soft" limit or target that is respected or selectively exceeded to a certain extent.

在專利案DE10 2015 206 448 A1中用於限制投影透鏡的狀態參數的此種影響因子項 H b (該狀態函數含在目標函數中)表示如下:

Figure 02_image015
Such an influence factor term H b (the state function is included in the objective function) for limiting the state parameters of the projection lens in patent DE10 2015 206 448 A1 is expressed as follows:
Figure 02_image015

其中,

Figure 02_image017
表示投影透鏡的對應狀態參數的相對目標值或規範,以冊尼克(Zernike)係數 b j 的形式表示。此外,
Figure 02_image019
Figure 02_image021
表示使用者可根據相關影響因子項的權重及嚴格度,自由選擇的參數。 in,
Figure 02_image017
Represents the relative target value or specification of the corresponding state parameter of the projection lens, expressed in the form of the Zernike coefficient b j . also,
Figure 02_image019
and
Figure 02_image021
Indicates parameters that users can freely choose according to the weight and strictness of the relevant impact factor items.

為判斷用於投影透鏡的操縱器的所謂配方,亦即對操縱器的行程變數的行程條件,按慣例需要最佳化演算法的複數個迭代,在該範圍內,影響因子項的權重或者嚴格度是變化的,直到能很好遵守狀態參數的限制。這是一個非常耗時的過程,特別是因為若找不到一可靠配方,則將不知道可靠配方是否確實存在。在此脈絡下,一可靠配方被理解為對操縱器的行程變數的行程條件。在一可靠配方的情況下,選擇行程變數的行程條件,以遵守相對規範的限度。In order to determine the so-called recipe of a manipulator for a projection lens, that is, the travel conditions for the travel variables of the manipulator, it is customary to require a plurality of iterations of the optimization algorithm, within which the weights of the influence factor terms or strict The degree is varied until the constraints of the state parameter are well respected. This is a very time-consuming process, especially since if a reliable recipe cannot be found, it will not be known whether a reliable recipe actually exists. In this context, a reliable recipe is understood as a stroke condition for the manipulator's stroke variable. In the case of a reliable recipe, the stroke conditions for the stroke variable are chosen to adhere to relative specification limits.

基本目的basic purpose

本發明之一目的是提供一種控制器件及一種解決前述問題且尤其可以相對較短的時間內找到行程變數的配方之方法。 根據本發明的解決方案 An object of the present invention is to provide a control device and a method for solving the aforementioned problems and in particular for finding a recipe for the stroke variable in a relatively short time. Solution according to the invention

舉例來說,根據本發明,前述目的可藉由一種用於控制操縱器的控制器件來達成,該控制器件藉由產生複數個行程變數的相對行程條件來改變一微影投影透鏡的光學行為,這些行程變數定義由這些操縱器對投影透鏡的至少一光學元件進行的操縱,用於改變投影透鏡的狀態參數。根據本發明的控制器件構造成藉由使用一第一最佳化演算法以最佳化一等比例縮放因子,產生對這些行程變數行程條件的一相對近似值,所述比例縮放因子在第一最佳化演算法的限度中,定義一等比例縮放的限制,這些限制是為這些個別狀態參數所指定。此外,根據本發明的控制器件構造成在由第一最佳化演算法所確定的,等比例縮放因子的一最佳化結果不超過一特定臨界值的情況下,藉由至少一進一步最佳化演算法,確定該行程變數行程條件的一相對最終結果。For example, according to the present invention, the aforementioned objects are achieved by a control device for controlling a manipulator, which control device changes the optical behavior of a lithographic projection lens by generating relative travel conditions of a plurality of travel variables, The travel variables define the manipulation of at least one optical element of the projection lens by the manipulators for changing state parameters of the projection lens. The control device according to the present invention is configured to generate a relative approximation to the travel variable travel conditions by using a first optimization algorithm to optimize a scaling factor at the first maximum In the Limits of the Optimization Algorithm, the first scaling limits are defined, and these limits are specified for these individual state parameters. Furthermore, the control device according to the present invention is configured to optimize by at least one further optimization, provided that an optimization result of the scaling factor does not exceed a certain critical value determined by the first optimization algorithm. An algorithm is developed to determine a relative end result of the trip variable trip condition.

換句話說,若等比例縮放因子的第一最佳化結果的最佳化結果不超過特定的行程,則藉至少一進一步最佳化演算法確定該行程變數行程條件的相對最終結果。在本文中,一「行程」理解為表示一或多個光學元件沿該行程的狀態參數改變,藉操縱器致動來實現,目的是改變一或多個光學元件的光功率。舉例來說,操縱可由光學元件在一特定方向上的位移組成,但也可由例如以熱、冷、力、具有一特定波長的光或電流的光學元件的一衝擊組成,該衝擊特別是局部或二維的衝擊。此外,操縱可定義在一光學元件處的材料燒蝕,藉一後處理單元執行。In other words, if the optimization result of the first optimization result of the scaling factor does not exceed a certain run, the relative final result of the run-variable run condition is determined by at least one further optimization algorithm. In this context, a "stroke" is understood to mean a change in a state parameter of one or more optical elements along the stroke, accomplished by actuation of a manipulator, for the purpose of changing the optical power of one or more optical elements. For example, the manipulation may consist of a displacement of the optical element in a particular direction, but also may consist of an impact of the optical element, in particular local or Two-dimensional shock. Additionally, manipulation can define material ablation at an optical element, performed by a post-processing unit.

特別係,狀態參數可為投影透鏡的像差。比例縮放因子亦可稱為目標到達變數。此一目標到達變數描述在限制與對應狀態參數之間的一正規化距離。舉例來說,可將值1指定為一臨界值,亦即特定的限制皆被遵守。此外,可將一較高值設為臨界值。至少在此情況下已知的是超出限制的程度。In particular, the state parameter may be the aberration of the projection lens. The scaling factor can also be referred to as the target arrival variable. This target arrival variable describes a normalized distance between the limit and the corresponding state parameter. For example, a value of 1 can be designated as a threshold, ie certain limits are respected. In addition, a higher value can be set as the threshold value. What is known, at least in this case, is the extent to which the limit is exceeded.

第一最佳化演算法有助於可靠判斷投影曝光裝置的一組狀態參數是否存在一可接受的配方,亦即,控制器件是否可確定行程變數的行程條件,藉此遵守特定的限制。特別係,第一最佳化演算法及/或第二最佳化演算法構造成解決一非線性最佳化問題。The first optimization algorithm helps to reliably determine whether there is an acceptable recipe for a set of state parameters of the projection exposure apparatus, ie, whether the control device can determine the travel conditions of the travel variable, thereby adhering to certain constraints. In particular, the first optimization algorithm and/or the second optimization algorithm are configured to solve a nonlinear optimization problem.

藉由第一最佳化演算法創造性地產生一等比例縮放因子,能夠可靠假設存在一可靠的配方,且因此可找到行程變數行程條件的最終因此,而無需以權重變化執行更最佳化演算法的複數個迭代,在這種情況下,對於等比例縮放因子的最佳化結果是否不超過特定臨界值的問題應是肯定的。因此,可以非常省時的方式找到行程變數的配方。特別係,可將限度公式化為可靠地遵守的硬限度,例如作為外顯限度。外顯限度被理解為並非相關目標函數一部分的限度,如習知技術中使用影響因子項的情況。By creatively generating a proportional scaling factor by the first optimization algorithm, it is possible to reliably assume that there is a reliable recipe, and thus to find the final result of the stroke-variable stroke condition, without the need to perform more optimization calculations with weight changes multiple iterations of the method, in which case the question of whether the optimization result for the equal scaling factor does not exceed a certain critical value should be affirmative. Thus, the recipe for the stroke variable can be found in a very time-saving manner. In particular, limits can be formulated as hard limits that are reliably observed, eg as explicit limits. Explicit limits are understood to be limits that are not part of the relevant objective function, as is the case in the prior art using impact factor terms.

根據另一具體實施例,控制器件還構造成當執行至少一進一步最佳化演算法時,執行一狀態參數最佳化演算法,在所述狀態參數最佳化演算法中最佳化個別比例縮放因子的加權加總,同時考慮與狀態參數相關的狀態參數限度,其中該狀態參數限度中的該等個別比例縮放因子,定義一相對縮放的限制,該等限制是為該等個別狀態參數所指定。According to another embodiment, the control device is further configured to, when executing at least one further optimization algorithm, execute a state parameter optimization algorithm in which individual proportions are optimized A weighted sum of scaling factors, taking into account the state parameter limits associated with the state parameters, wherein the individual scaling factors in the state parameter limits define a relative scaling limit imposed by the individual state parameters specified.

特別係,在考慮最佳化個別比例縮放因子的加權加總下,更限度對應於前述的外顯更限度。特別係,當執行至少一進一步最佳化演算法時,藉由最佳化個別比例縮放因子的加權加總來考慮更限度所產生的對行程變數的行程條件。換句話說,個別比例縮放因子的加權加總形成狀態參數最佳化演算法的目標函數。以相對的個別比例縮放因子來縮放特定限制應理解為表示複數個個別比例縮放因子之一者係指定給多個限制之每一者,然後以相對的縮放因子來縮放相對的限制。特別係,狀態參數限度還包含個別狀態參數的限制。特別係,狀態參數最佳化演算法構造成解決一非線性最佳化問題。In particular, the limit corresponds to the aforementioned explicit limit, taking into account the weighted summation of optimized individual scaling factors. In particular, when executing at least one further optimization algorithm, the travel conditions for the travel variables generated by the limits are taken into account by optimizing the weighted sum of the individual scaling factors. In other words, the weighted summation of the individual scaling factors forms the objective function of the state parameter optimization algorithm. Scaling a particular limit by a relative individual scaling factor should be understood to mean that one of a plurality of individual scaling factors is assigned to each of the plurality of constraints, and the relative constraints are then scaled by the relative scaling factor. In particular, state parameter limits also include limits for individual state parameters. In particular, the state parameter optimization algorithm is structured to solve a nonlinear optimization problem.

根據另一具體實施例,控制器件還構造成當執行至少一進一步最佳化演算法時,執行一行程最佳化演算法,其中含有行程變數的一目標函數被最佳化。特別係,狀態參數最佳化演算法構造成解決一非線性最佳化問題。According to another embodiment, the control device is further configured to execute, when executing at least one further optimization algorithm, a travel optimization algorithm, wherein an objective function including travel variables is optimized. In particular, the state parameter optimization algorithm is structured to solve a nonlinear optimization problem.

根據另一具體實施例,該控制器件構造成當執行至少一進一步最佳化演算法時,首先執行狀態參數最佳化演算法,而後執行行程最佳化演算法,其中該行程最佳化演算法構造成最佳化考慮該條件的目標函數,該條件為進一步個別比例縮放因子之每一者可超過這些對應第一個別比例縮放因子的最佳化結果不大於5%(特別是不大於1%),這些對應第一個別比例縮放因子是由該狀態參數最佳化演算法所確定。特別係,特定條件是行程最佳化限度的一部分,特別是還包括個別狀態參數的限制。使進一步個別比例縮放因子寬鬆使行程最佳化演算法能充分發揮,以找到含有行程變數的目標函數的一最佳化解決方案。According to another embodiment, the control device is configured to, when executing at least one further optimization algorithm, firstly execute the state parameter optimization algorithm, and then execute the travel optimization algorithm, wherein the travel optimization algorithm The method is constructed to optimize the objective function taking into account the condition that each of the further individual scaling factors may exceed the optimization result of these corresponding first individual scaling factors by no more than 5% (in particular, no more than 1 %), these corresponding first individual scaling factors are determined by the state parameter optimization algorithm. In particular, specific conditions are part of the travel optimization limits, and in particular also include the limits of individual state parameters. Relaxing further individual scaling factors enables the run optimization algorithm to fully exploit to find an optimal solution to the objective function with run variables.

根據另一具體實施例,該控制器件還構造成將行程最佳化演算法,奠基於這些行程變數行程條件的更近似值,這些行程變數是當執行狀態參數最佳化演算法時所確定。According to another embodiment, the control device is further configured to base the travel optimization algorithm on more approximations of travel conditions based on the travel variables determined when executing the state parameter optimization algorithm.

根據另一具體實施例,狀態參數限度還包括該條件,亦即這些第一個別比例縮放因子之每一者可超過等比例縮放因子的最佳化結果不大於5%(特別是不大於1%),該等比例縮放因子是由第一最佳化演算法所確定。使個別比例縮放因子寬鬆使狀態參數最佳化演算法能發揮,以找到個別比例縮放因子的加權加總的最佳化解決方案。According to another embodiment, the state parameter limit also includes the condition that each of these first individual scaling factors can exceed the optimal result of the equal scaling factor by no more than 5% (in particular no more than 1% ), the scaling factors are determined by the first optimization algorithm. Relaxing the individual scaling factors enables the state parameter optimization algorithm to work to find an optimal solution for the weighted sum of the individual scaling factors.

根據另一具體實施例,行程最佳化演算法的目標函數含有至少二次形式的行程變數,亦即在指數至少為2的乘冪中。According to another specific embodiment, the objective function of the travel optimization algorithm contains travel variables in at least quadratic form, ie in exponents of at least a power of 2.

根據另一具體實施例,控制器件還構造成將至少一進一步最佳化演算法,奠基於作為起始值的這些行程變數行程條件的近似值。According to another embodiment, the control means are further configured to base at least one further optimization algorithm on approximations of the travel conditions of the travel variables as starting values.

根據另一具體實施例,第一最佳化演算法的限度訂定為外顯限度,其並非在執行第一最佳化演算法時所最佳化的一目標函數的一部分。因此,一外顯限度被理解並非目標函數一部分的限度;相對於此,一內隱限度是目標函數的一部分。根據另外的具體實施例,狀態參數限度及/或行程最佳化演算法基礎的限度同樣訂定為外顯限度。According to another embodiment, the limits of the first optimization algorithm are defined as explicit limits, which are not part of an objective function that is optimized when executing the first optimization algorithm. Thus, an explicit limit is understood to be a limit that is not part of the objective function; in contrast, an implicit limit is part of the objective function. According to another embodiment, the state parameter limits and/or the limits on the basis of the itinerary optimization algorithm are also defined as explicit limits.

根據另一具體實施例,確定的行程變數行程條件定義投影透鏡的狀態參數的改變,該等改變是藉操縱器執行。特別係,其定義投影透鏡的狀態參數將發生的改變、及與投影透鏡無關的投影曝光裝置的狀態參數將發生的改變,例如與投影曝光裝置的照明系統相關的狀態參數。According to another embodiment, the determined stroke variable stroke conditions define changes in the state parameters of the projection lens, the changes being carried out by means of the manipulator. In particular, it defines the changes that will occur in the state parameters of the projection lens and the state parameters of the projection exposure device independent of the projection lens, such as those related to the illumination system of the projection exposure device.

此外,根據本發明,提供一種用於調整微影投影透鏡的調整裝置。該調整裝置包括一測量器件及如前述任一具體實施例或具體實施例變體的一控制器件,該測量器件用於確定投影透鏡的狀態參數的目前值,該控制器件從狀態參數的目前值產生行程變數行程條件。Furthermore, according to the present invention, an adjustment device for adjusting a lithography projection lens is provided. The adjustment device comprises a measuring device and a control device as in any of the preceding embodiments or variants of the specific embodiment, the measuring device being used to determine the current value of the state parameter of the projection lens, the control device from the current value of the state parameter Generates a stroke variable stroke condition.

此外,根據本發明提供一種用於微影投影曝光裝置的投影透鏡,所述投影透鏡包括操縱器,其構造成改變投影透鏡的狀態參數。此外,該投影透鏡包括如前述任一具體實施例或具體實施例變體中所述的一控制器件,用於控制操縱器。Furthermore, according to the present invention there is provided a projection lens for a lithographic projection exposure apparatus, the projection lens comprising a manipulator configured to change a state parameter of the projection lens. In addition, the projection lens includes a control device as described in any preceding embodiment or embodiment variant for controlling the manipulator.

此外,根據本發明提供一種微影投影曝光裝置,所述微影投影曝光裝置包括前述的投影透鏡。In addition, according to the present invention, there is provided a lithography projection exposure device comprising the aforementioned projection lens.

此外,前述目的可例如藉一種方法來達成,該方法用於控制操縱器,藉由產生複數個行程變數的相對行程條件來改變一微影投影透鏡的光學行為。行程變數定義由操縱器對投影透鏡的至少一光學元件進行的操縱,用於改變狀態參數。根據本發明的方法,包括藉由使用一第一最佳化演算法最佳化一等比例縮放因子,產生對行程變數行程條件的一相對近似值,其中等比例縮放因子在第一最佳化演算法的限度中,定義一等比例縮放的限制,這些限制是為個別狀態參數所指定,以及在由第一最佳化演算法所確定的,等比例縮放因子的一最佳化結果不超過一特定臨界值的情況下,藉由至少一進一步最佳化演算法,確定行程變數行程條件的一相對最終結果。Furthermore, the aforementioned objects can be achieved, for example, by a method for controlling a manipulator to change the optical behavior of a lithographic projection lens by generating relative travel conditions of a plurality of travel variables. The travel variable defines the manipulation of at least one optical element of the projection lens by the manipulator for changing the state parameter. The method according to the present invention includes generating a relative approximation to the travel variable travel conditions by optimizing a scaling factor using a first optimization algorithm, wherein the scaling factor is used in the first optimization algorithm Among the limits of the method, define the first scaling limits, which are specified for individual state parameters, and where an optimization result of the scaling factor, as determined by the first optimization algorithm, does not exceed a A relative end result of the travel variable travel condition is determined by at least one further optimization algorithm for certain thresholds.

根據本發明的方法的一具體實施例,使用至少一進一步最佳化演算法確定這些行程變數行程條件的相對最終因此,該進一步最佳化演算法考慮對投影透鏡狀態參數的外顯更限度,其並非在執行至少一進一步最佳化演算法時所最佳化的一目標函數的一部分。According to an embodiment of the method of the present invention, at least one further optimization algorithm is used to determine the relative finality of the travel variable travel conditions. Therefore, the further optimization algorithm takes into account the explicit modification of the projection lens state parameters, It is not part of an objective function that is optimized when performing at least one further optimization algorithm.

上面所列舉的是關於根據本發明的控制器件的具體實施例、示例性具體實施例及具體實施例變體等的特定特徵,可因此轉移到根據本發明的控制方法中。在附圖的描述及請求項中,解釋根據本發明的這些具體實施例及其他特徵。作為本發明的具體實施例,個別特徵可以單獨或組合實現。此外,其可描述僅在申請期間或申請後(如適合)可獨立保護及所請求保護之優選具體實施例。The specific features enumerated above with respect to specific embodiments, exemplary embodiments and specific embodiment variants etc. of the control device according to the invention can thus be transferred to the control method according to the invention. These specific embodiments and other features according to the invention are explained in the description and claims of the drawings. As specific embodiments of the invention, individual features may be implemented individually or in combination. Furthermore, it may describe preferred embodiments that are independently protectable and claimed only during or after application, as appropriate.

在以下描述的示例性具體實施例、具體實施例或具體實施例變體中,功能或結構上彼此相似的元件,盡可能使用相同或相似的參考標號。因此,為理解一特定示例性具體實施例的個別元件的特徵,應參考其他示例性具體實施例的描述或本發明的一般描述。In the exemplary embodiments, embodiments or variations of the embodiments described below, elements that are functionally or structurally similar to each other are provided with the same or similar reference numerals wherever possible. Therefore, to understand the characteristics of individual elements of a particular exemplary embodiment, reference should be made to the descriptions of other exemplary embodiments or to the general description of the invention.

為了便於說明,附圖中指示一笛卡爾xyz座標系統,從該座標系統中可以明顯看出圖中各組件的位置關係。在圖1中,y方向垂直於圖面延伸到所述平面,x方向向右延伸,z方向向上延伸。For the convenience of description, a Cartesian xyz coordinate system is indicated in the drawings, and the positional relationship of each component in the drawing can be clearly seen from the coordinate system. In Figure 1, the y-direction extends perpendicular to the plane of the drawing, the x-direction extends to the right, and the z-direction extends upward.

圖1示出一用於調整微影投影曝光裝置的投影透鏡16之調整裝置10。調整裝置10包括一測量器件12,該測量器件用於確定投影透鏡16的狀態參數34,該狀態參數表徵投影透鏡16的像差;及一控制器件14,該控制器件為一所謂行程確定器件形式,用於從狀態參數34為操縱器的行程變數 x k產生具有行程條件38n及38p的一行程命令38。在本文中,行程條件38n及38p亦稱為行程向量 x,並定義由操縱器對投影透鏡16的至少一光學元件E1至E4進行操縱,在下面更詳細地描述。 FIG. 1 shows an adjustment device 10 for adjusting a projection lens 16 of a lithographic projection exposure device. The adjustment device 10 includes a measuring device 12 for determining a state parameter 34 of the projection lens 16, which state parameter characterizes the aberration of the projection lens 16, and a control device 14 in the form of a so-called stroke determination device , for generating a travel command 38 with travel conditions 38n and 38p from the state parameter 34 for the travel variable xk of the manipulator. Herein, travel conditions 38n and 38p are also referred to as travel vector x and define the manipulation of at least one optical element E1 to E4 of projection lens 16 by a manipulator, described in more detail below.

投影透鏡16用於將光罩結構從一物件平面24成像到一影像平面28中,並可設計用於不同波長的曝光輻射,如248 nm或193 nm。在本具體實施例中,投影透鏡16設計成用於EUV波長範圍小於100 nm的一波長,例如,約13.5 nm或約6.8 nm。Projection lens 16 is used to image the reticle structure from an object plane 24 into an image plane 28 and can be designed for exposure radiation of different wavelengths, such as 248 nm or 193 nm. In this particular embodiment, the projection lens 16 is designed for a wavelength in the EUV wavelength range of less than 100 nm, eg, about 13.5 nm or about 6.8 nm.

測量器件12構造成測量投影透鏡16的波前誤差,且包括在投影透鏡16的入口側的一照明單元18及一測量光罩22、以及在投影透鏡16的出口側的一感測器元件26、一偵測器30及一評估單元32。照明單元18構造成在待測試的投影透鏡16的操作波長處,產生測量輻射20,在本情況下是以EUV輻射的形式,並且將所述輻射輻照到配置在物體平面24中測量光罩22上。通常亦稱為一「同調光罩」之測量光罩22具有一第一週期結構。具有一第二週期結構之形式為一影像光柵的感測器元件26配置在影像平面28中。還可將測量光罩22中的棋盤結構與感測器元件26中的棋盤結構組合。也可使用本領域具有通常知識者從剪切干涉法或點繞射干涉法領域已知的周期結構的其他組合。The measurement device 12 is configured to measure the wavefront error of the projection lens 16 and includes an illumination unit 18 and a measurement mask 22 on the entrance side of the projection lens 16 and a sensor element 26 on the exit side of the projection lens 16 , a detector 30 and an evaluation unit 32 . The illumination unit 18 is configured to generate measurement radiation 20, in this case in the form of EUV radiation, at the operating wavelength of the projection lens 16 to be tested, and to irradiate said radiation to the measurement reticle arranged in the object plane 24 22 on. The measurement mask 22, also commonly referred to as a "coherent mask", has a first periodic structure. A sensor element 26 in the form of an image grating with a second periodic structure is arranged in the image plane 28 . The checkerboard structure in the measurement reticle 22 may also be combined with the checkerboard structure in the sensor element 26 . Other combinations of periodic structures known to those of ordinary skill in the art from the field of shear interferometry or point diffraction interferometry can also be used.

以二維解析的一相機形式的偵測器30配置在感測器元件26下方,準確地說是在與投影透鏡16的光瞳平面共軛的一平面中。感測器元件26與偵測器30共同形成一感測器模組。測量光罩22及感測器模組形成一剪切干涉儀或點繞射干涉儀,如本領域具有通常知識者已知的,並用於測量投影透鏡16的波前誤差。為此,特別應用本領域具有通常知識者已知的相移方法。A detector 30 in the form of a camera resolved in two dimensions is arranged below the sensor element 26 , to be precise in a plane that is conjugate to the pupil plane of the projection lens 16 . The sensor element 26 and the detector 30 together form a sensor module. The measurement mask 22 and sensor module form a shear interferometer or point diffraction interferometer, as known to those of ordinary skill in the art, and are used to measure the wavefront error of the projection lens 16 . For this purpose, phase shifting methods known to those of ordinary skill in the art are used in particular.

評估單元32藉由偵測器30所記錄的強度模式,確定投影透鏡16的狀態參數34。根據本具體實施例,狀態參數34包含表徵為投影透鏡16的波前誤差的一組冊尼克係數 b j The evaluation unit 32 determines the state parameter 34 of the projection lens 16 from the intensity pattern recorded by the detector 30 . According to this particular embodiment, the state parameters 34 comprise a set of Schönnick coefficients b j characterized as the wavefront error of the projection lens 16 .

在本申請案中,冊尼克函數

Figure 02_image023
是從Daniel Malacara撰寫、約翰威立(John Wiley & Sons, Inc.)出版的教科書「Optical Shop Testing」第2版(1992)的第13.2.3章中所得知的。根據所謂的條紋排序以Z j表示,如在美國專利案US 2013/0188246A1中的第[0125]至[0129]段中所述,然後 b j是指定到相對的冊尼克多項式的冊尼克係數(亦稱為「冊尼克函數」)。條紋排序如由Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim在2005年出版的「光學系統手冊」第2卷、第215頁的表20-2中進行說明。投影透鏡物件平面中某一點處的波前偏差 W(ρ,Φ)然後以隨著光瞳平面的極座標(ρ, Φ) 的方式,如下方式串聯擴展:
Figure 02_image025
(1) In the present application, the Schonick function
Figure 02_image023
It is known from Chapter 13.2.3 of the textbook "Optical Shop Testing" 2nd Edition (1992) written by Daniel Malacara and published by John Wiley & Sons, Inc.. Denoted by Z j according to the so-called fringe ordering, as described in paragraphs [0125] to [0129] in US Patent Application US 2013/0188246 A1, then b j are the Honick coefficients assigned to the relative Sonick polynomial ( Also known as the "Schonick function"). The fringe ordering is as described in Table 20-2, "Handbook of Optical Systems", Vol. 2, p. 215, published by Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, 2005. The wavefront deviation W(ρ,Φ) at a point in the object plane of the projection lens is then expanded in series with the polar coordinates (ρ, Φ) of the pupil plane as follows:
Figure 02_image025
(1)

在本申請案的範疇內,冊尼克多項式以 Z j表示,亦即以下標索引j表示,而冊尼克係數以 b j表示。此處應注意,冊尼克係數 b j在專業領域中通常也以 Z j表示,亦即以一正常書寫的索引,諸如,例如代表散光的Z5及Z6。 Within the scope of the present application, the Schonick polynomials are denoted by Z j , ie by the subscript j, and the Schonick coefficients are denoted by b j . It should be noted here that the Schonick coefficient b j is also usually denoted by Z j in the professional field, ie by a normally written index such as, for example, Z5 and Z6 representing astigmatism.

由測量器件12的評估單元32建立的狀態特徵34係傳送到控制器件14,該控制器件14以此產生行程命令38。如前所述,本發明示例性具體實施例中的行程命令38包括行程條件38n及38p。行程條件38p包括投影透鏡16的操縱器M1至M4的行程條件

Figure 02_image027
,其中L是一用於可藉操縱器M1至M4控制的行程變數 x k的計數器。行程條件38n包含用於控制一後處理單元36、以對投影透鏡16的光學元件E1至E4進行機械後處理的行程條件
Figure 02_image029
,其中L是一用於可藉後處理單元36控制的行程變數 x k的計數器。 The status feature 34 established by the evaluation unit 32 of the measuring device 12 is transmitted to the control device 14 , which generates the travel command 38 therefrom. As previously mentioned, the travel command 38 in the exemplary embodiment of the present invention includes travel conditions 38n and 38p. The stroke condition 38p includes the stroke conditions of the manipulators M1 to M4 of the projection lens 16
Figure 02_image027
, where L is a counter for the travel variable xk controllable by the manipulators M1 to M4. The travel conditions 38n include travel conditions for controlling a post-processing unit 36 to mechanically post-process the optical elements E1 to E4 of the projection lens 16
Figure 02_image029
, where L is a counter for the run variable x k controllable by the post-processing unit 36 .

在本申請的範疇內,投影透鏡16的操縱器M1至M4及後處理單元36,兩者都理解為操縱器,用於改變投影透鏡16的光學行為,更準確地說,針對改變投影透鏡16的狀態參數34之目的,用於對投影透鏡16的光學元件E1至E4之至少一者進行操縱。Within the scope of the present application, the manipulators M1 to M4 of the projection lens 16 and the post-processing unit 36 are both understood as manipulators for changing the optical behavior of the projection lens 16 , more precisely for changing the projection lens 16 The purpose of the state parameter 34 is to manipulate at least one of the optical elements E1 to E4 of the projection lens 16 .

在根據圖1的具體實施例中,投影透鏡16具有四個光學元件E1至E4。所有光學元件以可移動方式安裝。為此,一相對的操縱器MS,特別是操縱器M1至M4中相對一者係指定給光學元件E1至E4之每一者。操縱器M1、M2及M3,每一者都能夠使指定到的光學元件E1、E2及E3,在x及y方向及因此實質上平行於光學元件的相對反射表面所在的平面中位移。In the specific embodiment according to FIG. 1 , the projection lens 16 has four optical elements E1 to E4 . All optics are removably mounted. To this end, an opposing manipulator MS, in particular an opposing one of the manipulators M1 to M4, is assigned to each of the optical elements E1 to E4. The manipulators M1 , M2 and M3 are each capable of displacing the assigned optical elements E1 , E2 and E3 in the x and y directions and thus in a plane substantially parallel to the opposing reflecting surfaces of the optical elements.

操縱器M4構造成藉繞一傾斜軸40旋轉來傾斜光學元件E4,該傾斜軸係平行於y軸配置。因此,E4的反射表面角度係相對於入射輻射而修改。可想像操縱器有更多自由度。因此,例如,可提供一相關光學元件在其光學表面上的位移,或繞著垂直於反射表面的一參考軸旋轉。The manipulator M4 is configured to tilt the optical element E4 by rotation about a tilt axis 40 which is arranged parallel to the y-axis. Therefore, the reflective surface angle of E4 is modified relative to the incident radiation. It is conceivable that the manipulator has more degrees of freedom. Thus, for example, a displacement of an associated optical element on its optical surface, or a rotation about a reference axis perpendicular to the reflective surface, can be provided.

一般而言,提供本文所示的操縱器M1至M4之每一者,以在沿著由行程條件38p定義的一行程執行剛體運動的同時,引起相關聯的光學元件E1至E4的位移。舉例來說,此一行程可以任何方式組合不同方向的平移、傾斜及/或旋轉。或者或此外,還可提供操縱器,其構造成藉由操縱器的一適當致動,對相關聯的光學元件的一狀態變數進行不同方式的改變。在這方面,可藉由例如向光學元件施加一特定溫度分布或一特定力分布來執行一致動。在此情況下,行程可為由於光學元件上的溫度分布改變或對一光學元件施加一局部張力的一因此,該光學元件可實施為一可變形透鏡或一可變形反射鏡。In general, each of the manipulators Ml-M4 shown herein are provided to cause displacement of the associated optical elements El-E4 while performing rigid body motion along a stroke defined by stroke condition 38p. For example, such a stroke may combine translations, tilts and/or rotations in different directions in any manner. Alternatively or additionally, manipulators may also be provided that are configured to change a state variable of the associated optical element in different ways by an appropriate actuation of the manipulator. In this regard, an actuation can be performed, for example, by applying a specific temperature distribution or a specific force distribution to the optical element. In this case, the stroke may be due to a change in the temperature distribution on the optical element or a local tension is applied to an optical element - thus, the optical element may be implemented as a deformable lens or a deformable mirror.

在所示的情況下,行程命令38包括的行程38p,含有行程

Figure 02_image031
Figure 02_image033
Figure 02_image035
Figure 02_image037
,其預先確定由操縱器M1至M4所執行的改變,因此其用以控制投影透鏡16的操縱器M1至M4。所確定的行程
Figure 02_image031
Figure 02_image033
Figure 02_image035
Figure 02_image037
,藉行程訊號傳達至個別操縱器M1至M4,並為其預定義要實現的相對校正行程。這些定義了指定到的光學元件M1至M4的對應位移,用於校正投影透鏡16發生的波前誤差。在一操縱器具有複數個自由度的情況下,也可以向其傳達多個行程
Figure 02_image027
。 In the case shown, the stroke command 38 includes the stroke 38p, containing the stroke
Figure 02_image031
,
Figure 02_image033
,
Figure 02_image035
and
Figure 02_image037
, which predetermines the changes performed by the manipulators M1 to M4 , which are therefore used to control the manipulators M1 to M4 of the projection lens 16 . determined itinerary
Figure 02_image031
,
Figure 02_image033
,
Figure 02_image035
and
Figure 02_image037
, which is communicated to the individual manipulators M1 to M4 by means of the travel signal, and for which the relative correction travel to be achieved is predefined. These define the corresponding displacements assigned to the optical elements M1 to M4 for correcting the wavefront errors that occur with the projection lens 16 . Multiple strokes can also be communicated to a manipulator with multiple degrees of freedom
Figure 02_image027
.

行程命令38還包括的後處理單元36的行程條件38n (

Figure 02_image029
) ,在所示的情況下含有行程
Figure 02_image039
Figure 02_image041
Figure 02_image043
Figure 02_image045
,且行程用於控制後處理單元36,以對投影透鏡16的光學元件E1、E2、E3及E4進行相對的機械後處理。因此,類似於行程
Figure 02_image031
Figure 02_image037
,行程
Figure 02_image039
Figure 02_image045
用於校正所發生投影透鏡16的波前誤差。 The travel command 38 also includes the travel condition 38n of the post-processing unit 36 (
Figure 02_image029
), with stroke in the case shown
Figure 02_image039
,
Figure 02_image041
,
Figure 02_image043
and
Figure 02_image045
, and the stroke is used to control the post-processing unit 36 to perform relative mechanical post-processing on the optical elements E1 , E2 , E3 and E4 of the projection lens 16 . So, similar to itinerary
Figure 02_image031
to
Figure 02_image037
,journey
Figure 02_image039
to
Figure 02_image045
Used to correct for wavefront errors of the projection lens 16 that occur.

後處理單元36應理解為,用於在一透鏡或一反射鏡形式的一光學元件的光學表面處,用於機械燒蝕材料的一種單元。此燒蝕跟隨光學元件的產生。因此,一對應地後處理光學元件,亦稱為一內在校正非球面(Intrinsically Corrected Asphere,ICA)。特別係,通常用於ICA機械處理的一燒蝕單元,可以用作一後處理單元36。因此,下面亦將燒蝕稱為「ICA燒蝕」。舉例來說,一離子束可用於機械處理。使用此機械處理,可將任何校正輪廓加工成一後處理的光學元件。Post-processing unit 36 should be understood as a unit for mechanically ablating material at the optical surface of an optical element in the form of a lens or a mirror. This ablation follows the creation of optical elements. Therefore, a corresponding post-processing optical element is also called an intrinsically corrected aspheric surface (Intrinsically Corrected Asphere, ICA). In particular, an ablation unit, typically used for ICA mechanical processing, can be used as a post-processing unit 36 . Therefore, ablation is also referred to below as "ICA ablation". For example, an ion beam can be used for mechanical processing. Using this mechanical process, any corrected profile can be processed into a post-processed optic.

圖2示出根據本發明的一微影投影曝光裝置50的一具體實施例。本具體實施例設計為用於在EUV波長範圍內操作。由於此操作波長,所有的光學元件實施為反射鏡。然而,本發明不限於在EUV波長範圍內的投影曝光裝置。根據本發明的另外具體實施例,設計為用於在UV範圍內的操作波長,例如365 nm、248 nm或193 nm。在此情況下,光學元件的至少一些者構造成傳統的透射透鏡元件。FIG. 2 shows a specific embodiment of a lithography projection exposure apparatus 50 according to the present invention. This particular embodiment is designed for operation in the EUV wavelength range. Due to this operating wavelength, all optical elements are implemented as mirrors. However, the present invention is not limited to projection exposure devices in the EUV wavelength range. According to further specific embodiments of the present invention, it is designed for operating wavelengths in the UV range, eg 365 nm, 248 nm or 193 nm. In this case, at least some of the optical elements are configured as conventional transmissive lens elements.

根據圖2的投影曝光裝置50包括一用於產生曝光輻射54之曝光輻射源52。在本情況下,曝光輻射源52實施為一EUV源,且其可包括例如一電漿輻射源。曝光輻射54最初穿過一照明光學單元56,並藉此偏轉到一光罩58上。照明光學單元56構造成產生曝光輻射54入射在光罩58上的不同角度分布。取決於使用者期望的一照明設定,照明光學單元56構造成曝光輻射54入射在光罩58上的角度分布。可選擇的照明設定的示例包括所謂的偶極照明、環形照明及四極照明,還有自由形式照明,亦即可自由選擇至某一點的照明輪廓的一強度分布。The projection exposure device 50 according to FIG. 2 includes an exposure radiation source 52 for generating exposure radiation 54 . In this case, the exposure radiation source 52 is implemented as an EUV source, and it may comprise, for example, a plasmonic radiation source. Exposure radiation 54 initially passes through an illumination optical unit 56 and is thereby deflected onto a reticle 58 . Illumination optics 56 are configured to produce different angular distributions of exposure radiation 54 incident on reticle 58 . Illumination optics 56 are configured to expose the angular distribution of radiation 54 incident on reticle 58 depending on an illumination setting desired by the user. Examples of selectable lighting settings include so-called dipole lighting, ring lighting and quadrupole lighting, but also freeform lighting, ie an intensity distribution of the lighting profile that can be freely selected to a point.

光罩58具有要以一晶圓形式成像在一基材64上的光罩結構,且其可移動安裝在光罩位移台60上。如圖2所示,光罩58可實施為一反射光罩,或者亦可構造成一透射光罩,特別是用於UV微影。在根據圖2的具體實施例中,曝光輻射54在光罩58處被反射,並且隨後穿過投影透鏡16,這已參考根據圖1的調整器件10進行描述。投影透鏡16用於將光罩58的光罩結構成像在基材64上。曝光輻射54藉由複數個光學元件E1至E4(以多個反射鏡呈現)在投影透鏡16內引導。基材64可移動安裝在一基材位移台66上。投影曝光裝置50可設計為所謂的掃描器或所謂的步進機。The reticle 58 has a reticle structure to be imaged on a substrate 64 in the form of a wafer, and is movably mounted on the reticle stage 60 . As shown in FIG. 2, the reticle 58 can be implemented as a reflective reticle, or it can also be configured as a transmissive reticle, especially for UV lithography. In the specific embodiment according to FIG. 2 , the exposure radiation 54 is reflected at the reticle 58 and then passes through the projection lens 16 , which has been described with reference to the adjustment device 10 according to FIG. 1 . Projection lens 16 is used to image the reticle structure of reticle 58 on substrate 64 . Exposure radiation 54 is guided within projection lens 16 by a plurality of optical elements E1 to E4 (presented as mirrors). The substrate 64 is movably mounted on a substrate translation stage 66 . The projection exposure device 50 can be designed as a so-called scanner or as a so-called stepper.

在實施為一掃描器(其亦稱為一步進掃描投影曝光裝置)的具體實施例的情況下,在每一次成像光罩58到基材64上時(亦即每次在基材64上曝光一場時),光罩位移台60及基材位移台66沿相反方向或相同方向移動。如圖2所示,在此情況下,例如,光罩位移台60在指向左側的一掃描方向62上移動,而基材位移台在指向右側的一掃描方向68上移動。所謂的衰退像差,可追溯到此一掃描器在場曝光期間的掃描運動,並在下面更詳細解釋。In the case of the embodiment implemented as a scanner (which is also referred to as a step-scan projection exposure apparatus), each time reticle 58 is imaged onto substrate 64 (ie, each time an exposure is made on substrate 64 ) During one field), the mask stage 60 and the substrate stage 66 move in opposite directions or the same direction. As shown in FIG. 2, in this case, for example, the reticle stage 60 moves in a scan direction 62 pointing to the left, and the substrate stage moves in a scan direction 68 pointing to the right. The so-called recession aberration can be traced back to the scanning motion of this scanner during field exposure and is explained in more detail below.

投影曝光裝置50更包括一控制器件14。在視覺化的具體實施例中,所述控制器件與圖1的控制器件14的不同之處,僅在於從狀態參數34產生的行程命令38僅包括為操縱器M1至M4的行程變數

Figure 02_image027
的行程條件38p。狀態參數可藉一外部波前測量器件收集,如參考圖1所述的測量器件12。然而,或者,狀態參數34亦可藉整合在基材位移台66中的一波前測量單元70來測量。根據另一具體實施例,含在投影曝光裝置50中的控制器件14可對應於圖1的控制器件14,並可產生一行程命令38,除了行程條件38p之外,還包括用於後處理單元36的行程條件38n。在此情況下,受後處理影響的光學元件E1至E4首先從投影透鏡16中移除,並基於行程條件38n進行後處理。然後,將光學元件E1至E4重新插入投影透鏡16中,並藉操縱器M1至M4根據行程條件38p進行調整。 The projection exposure apparatus 50 further includes a control device 14 . In the embodiment visualized, the control device differs from the control device 14 of FIG. 1 only in that the travel command 38 generated from the state parameters 34 includes only travel variables for the manipulators M1 to M4
Figure 02_image027
The trip condition is 38p. The state parameters may be collected by means of an external wavefront measurement device, such as measurement device 12 described with reference to FIG. 1 . Alternatively, however, the state parameter 34 may also be measured by a wavefront measurement unit 70 integrated in the substrate stage 66 . According to another specific embodiment, the control device 14 contained in the projection exposure apparatus 50 may correspond to the control device 14 of FIG. 1 and may generate a stroke command 38 which, in addition to the stroke condition 38p, also includes a post-processing unit for 36 stroke condition 38n. In this case, the optical elements E1 to E4 affected by the post-processing are first removed from the projection lens 16 and post-processed based on the travel condition 38n. Then, the optical elements E1 to E4 are reinserted into the projection lens 16 and adjusted according to the travel conditions 38p by means of the manipulators M1 to M4.

請即參考圖3,控制器件14的功能在下面以一示例性方式闡明。其構造成執行一產生行程的整體最佳化演算法72,整體最佳化演算法72包括複數個個別的最佳化演算法74、76及78。3, the function of the control device 14 is explained below in an exemplary manner. It is configured to perform an overall optimization algorithm 72 that generates a trip, the overall optimization algorithm 72 including a plurality of individual optimization algorithms 74 , 76 and 78 .

最佳化問題的限度包括投影透鏡16的狀態參數34的規範值或行程條件最大值,以及行程變數 x k的規範值或最大值。個別狀態參數34在以下亦表示為ZP i,其中i是一計數器。 The limits of the optimization problem include the specification or maximum travel condition for the state parameter 34 of the projection lens 16, and the specification or maximum for the travel variable xk . The individual state parameters 34 are also referred to below as ZP i , where i is a counter.

關於投影透鏡16的狀態參數34的限度通常表示如下:

Figure 02_image047
(2) The limits for the state parameter 34 of the projection lens 16 are generally expressed as follows:
Figure 02_image047
(2)

其中,

Figure 02_image049
是投影透鏡16的狀態參數 ZP i的規範值或限制,由索引i編號,且 B i(x) 為包括投影透鏡16的相對狀態參數的函數,其可為行程因子x的函數。根據一具體實施例,按照式子(2)的限度包括以下限度群:
Figure 02_image051
(3)
Figure 02_image053
(4)
Figure 02_image055
,及                                    (5)
Figure 02_image057
(6) in,
Figure 02_image049
is the normative value or limit of the state parameter ZP i of the projection lens 16, numbered by index i, and B i (x) is a function including the relative state parameter of the projection lens 16, which may be a function of the travel factor x. According to a specific embodiment, the limits according to equation (2) include the following limit groups:
Figure 02_image051
(3)
Figure 02_image053
(4)
Figure 02_image055
, and (5)
Figure 02_image057
(6)

其中,按照式子(3)的限度群係與個別冊尼克係數 b j 的條件有關。其中,

Figure 02_image059
是個別冊尼克係數 b j 的規範,其中索引 j從1至
Figure 02_image061
,亦即在此情況下,狀態參數 ZP i對應於冊尼克係數 b j 。規範
Figure 02_image059
對應於從項(2)i = 1至
Figure 02_image061
的一般規範值
Figure 02_image049
M是上面已提及的一靈敏度矩陣,描述標準行程 x k 0 與調整一操縱器自由度 k 之間的關係。 Among them, the limit group system according to the formula (3) is related to the conditions of the individual Schonick coefficients b j . in,
Figure 02_image059
is the specification of the individual Shonick coefficients b j , where index j ranges from 1 to
Figure 02_image061
, that is, in this case, the state parameter ZP i corresponds to the Schonick coefficient b j . specification
Figure 02_image059
corresponds to the terms (2) i = 1 to
Figure 02_image061
general specification value of
Figure 02_image049
. M is a sensitivity matrix already mentioned above, describing the relationship between the standard travel x k 0 and adjusting a manipulator degree of freedom k.

式子(4)中的表示符

Figure 02_image063
是:
Figure 02_image065
(7) Representation in Equation (4)
Figure 02_image063
Yes:
Figure 02_image065
(7)

按照式子(4)的限度群係與所謂的衰退像差

Figure 02_image067
的條件有關。這些可從測得的冊尼克像差 b j 計算而來。此外,
Figure 02_image069
是衰退像差
Figure 02_image067
的目標值或特定規範,其中索引j從1運行至
Figure 02_image071
。也就是說,在此情況下狀態參數 ZP i對應於衰退像差
Figure 02_image067
。從式子(2),規範
Figure 02_image069
對應於一般規範值
Figure 02_image049
,其中 i =
Figure 02_image061
+1 至
Figure 02_image061
+
Figure 02_image071
。索引m的總和為沿著投影曝光裝置的掃描方向在所有場點上運行。參數 w m表示所謂的掃描權重,亦即追溯到掃描運動的影像像差的權重。
Figure 02_image073
表示衰退像差
Figure 02_image067
的一靈敏度矩陣,因此定義當藉一標準行程 x 0調整操縱器時,由於衰退像差而導致的投影透鏡狀態向量b的改變。 The limit group system according to equation (4) and the so-called recession aberration
Figure 02_image067
conditions related. These can be calculated from the measured Hornic aberrations b j . also,
Figure 02_image069
is the fading aberration
Figure 02_image067
The target value or specific specification of , where index j runs from 1 to
Figure 02_image071
. That is, in this case the state parameter ZP i corresponds to the decaying aberration
Figure 02_image067
. From equation (2), the norm
Figure 02_image069
corresponds to the general norm value
Figure 02_image049
, where i =
Figure 02_image061
+1 to
Figure 02_image061
+
Figure 02_image071
. The sum of the indices m runs over all field points along the scanning direction of the projection exposure device. The parameter w m represents the so-called scan weight, ie the weight of the image aberrations traced back to the scan motion.
Figure 02_image073
Represents fading aberration
Figure 02_image067
A sensitivity matrix of , thus defining the change in the projection lens state vector b due to fading aberration when the manipulator is adjusted by a standard travel x 0 .

按照式子(5)的限度群係與覆蓋誤差的條件有關。針對不同的結構類型判斷覆蓋誤差,諸如孤立線、配置成網格的線、圓形結構等。不同的結構類型用索引p表示。一作為結構類型p及場點m的函數之覆蓋誤差係由乘積

Figure 02_image075
表示。其中,SZ p是一矩陣,其包括個別冊尼克係數 b j 的場點相依權重。因此,一覆蓋誤差
Figure 02_image075
由個別冊尼克係數 b j 的線性組合形成。 The limit group system according to equation (5) is related to the condition of the coverage error. The coverage error is judged for different structure types, such as isolated lines, lines arranged in a grid, circular structures, etc. The different structure types are denoted by the index p. - The coverage error as a function of structure type p and field point m is given by the product
Figure 02_image075
express. where SZ p is a matrix that includes the field point-dependent weights of the individual Shonick coefficients b j . Therefore, a coverage error
Figure 02_image075
It is formed by a linear combination of the individual Shonick coefficients b j .

式子(5)中的表示符OVL P是:

Figure 02_image077
(8) The notation OVL P in equation (5) is:
Figure 02_image077
(8)

此外,

Figure 02_image079
是結構類型p的覆蓋誤差的目標值或特定規範,其中索引p從1運行至p max。也就是說,在此情況下狀態參數 ZP i對應於覆蓋誤差
Figure 02_image075
。從式子(2),規範
Figure 02_image079
對應於一般規範值
Figure 02_image049
,其中 i =
Figure 02_image061
+
Figure 02_image071
+1 至
Figure 02_image061
+
Figure 02_image071
+ p max。矩陣 M是前述的靈敏度矩陣係與像差的限度群有關。max函數判斷所有場點m的最大值。 also,
Figure 02_image079
is the target value or specific specification of the coverage error for structure type p, where index p runs from 1 to p max . That is, in this case the state parameter ZP i corresponds to the overlay error
Figure 02_image075
. From equation (2), the norm
Figure 02_image079
corresponds to the general norm value
Figure 02_image049
, where i =
Figure 02_image061
+
Figure 02_image071
+1 to
Figure 02_image061
+
Figure 02_image071
+ p max . The matrix M is the aforementioned sensitivity matrix related to the limit group of aberrations. The max function determines the maximum value of all field points m.

按照式子(6)的限度群係與分組RMS值的條件有關。其中,RMS r定義如下:

Figure 02_image081
(9) The limit group according to equation (6) is related to the condition of the grouped RMS value. where RMS r is defined as follows:
Figure 02_image081
(9)

其中,r是分組的RMS值RMS r的一索引。舉例來說,藉由將對應的冊尼克係數 b j 分類為「球面像差」、「彗形像差」、「散光」等類別來進行分組。j上的總和是冊尼克級上的一總和,

Figure 02_image083
是個別冊尼克貢獻 b j 對具有指數r的RMS值的權重,且最大值是建立在投影透鏡16的影像場的所有場點m上。分組的RMS值RMS r之每一者包括一群冊尼克係數 Zj,根據各種具體實施例具有相等方位角波紋,典型上所有冊尼克係數 Zj具有相關的方位角波紋(例如,2倍或4倍方位角波紋)直至某一徑向波紋(亦即,徑向波紋≤最大徑向波紋)。舉例來說,分組RMS值「RMS_AST_0」包括冊尼克係數Zj,其中j = 12、21、32……,而分組RMS值「RMS_Coma_x」包括冊尼克係數 Zj,其中j=7、14、23及34。在式子(6)中特定的RMS值RMS r的條件下,
Figure 02_image085
是針對具有索引r的RMS值的特定規範。也就是說,在此情況下,狀態參數 ZP i對應於RMS值 RMS r。 where r is an index of the grouped RMS value RMS r . For example, grouping is performed by classifying the corresponding Hornic coefficients b j into categories such as "spherical aberration", "coma aberration", "astigmatism", and the like. The sum on j is a sum on the Sonic class,
Figure 02_image083
is the weight of the individual Schonick contributions b j to the RMS value with the index r, and the maximum value is established at all field points m of the image field of the projection lens 16 . Each of the grouped RMS values RMS r includes a set of Honnick coefficients Zj with equal azimuthal ripples according to various embodiments, typically all Honnick coefficients Zj have associated azimuthal ripples (eg, 2-fold or 4-fold azimuthal ripples). angular corrugation) up to a certain radial corrugation (ie, radial corrugation ≤ maximum radial corrugation). For example, the grouped RMS values "RMS_AST_0" include the Honnick coefficients Zj, where j = 12, 21, 32, . . Under the condition of the specified RMS value RMS r in equation (6),
Figure 02_image085
is a specific specification for the RMS value with index r. That is, in this case, the state parameter ZP i corresponds to the RMS value RMS r .

如前所述,由控制器件14執行的整體最佳化演算法72包括複數個個別最佳化演算法。在圖3中以參考標號74表示中,這些最佳化演算法中的第一者佳化下列目標函數F,通常亦稱為優點函數或優值函數,在圖3中以參考標號80表示: F( x, t s ) = t s ;                            即,F → min                      (10) As previously mentioned, the overall optimization algorithm 72 executed by the control device 14 includes a plurality of individual optimization algorithms. Denoted by reference numeral 74 in FIG. 3, the first of these optimization algorithms optimizes the following objective function F, also commonly referred to as a merit function or function of merit, denoted by reference numeral 80 in FIG. 3: F( x , t s ) = t s ; that is, F → min (10)

具有以下外顯限度:

Figure 02_image087
,                                                                             (11)
Figure 02_image089
,及                                    (12)
Figure 02_image009
(13) Has the following explicit limits:
Figure 02_image087
, (11)
Figure 02_image089
, and (12)
Figure 02_image009
(13)

式子(11)中引用的限度特定 t s不得為負數。在限度式子(12)中引用的限度(在圖3是由參考82表示)係與投影透鏡12的狀態參數ZP i有關並且對應於式子(2)中引用的限度,不同的是在圖3中是由參考標號84表示的限制或規範值

Figure 02_image049
,每個前面都有一等比例縮放因子 t s。在圖3中以參考標號86表示的縮放因子t s,對於所有規範值
Figure 02_image049
都是相同的,並且用於等比例縮放規範值或限制84,該規範值或限制84是為投影透鏡14的個別狀態參數 ZP i所指定。在(13)中引用的限度,最後為個別行程變數 x k 特定規範或限制
Figure 02_image013
,並且取決於具體實施例變體也可以省略。 The limit-specific ts quoted in equation (11) must not be negative. The limits quoted in the limit equation (12) (represented by reference 82 in FIG. 3 ) are related to the state parameter ZP i of the projection lens 12 and correspond to the limits quoted in equation (2), except that in FIG. 3 is the limit or specification value denoted by reference numeral 84
Figure 02_image049
, each preceded by a proportional scaling factor ts . The scaling factor ts denoted by reference numeral 86 in Figure 3, for all normative values
Figure 02_image049
are all the same, and are used to scale the normative value or limit 84 specified for the individual state parameter ZP i of the projection lens 14 . Limits quoted in (13), and finally individual trip variables x k specific specifications or limits
Figure 02_image013
, and may also be omitted depending on the specific embodiment variant.

最佳化演算法74現構造成藉由最小化來最佳化等比例縮放因子 t s 。由於此最佳化,基於測量的狀態參數34產生一近似行程命令38-1。此近似行程命令38-1包括用於行程變數 x k 的行程條件38p或者38n的近似值。 The optimization algorithm 74 is now structured to optimize the scaling factor ts by minimization. Due to this optimization, an approximate travel command 38-1 is generated based on the measured state parameters 34. This approximate travel command 38-1 includes an approximation of the travel condition 38p or 38n for the travel variable xk .

在圖3是由參考標號87表示在等比例縮放因子 t s的最佳化結果

Figure 02_image091
不超過一特定臨界值85的情況下,該臨界值較佳為1,亦即若
Figure 02_image091
≤ 1,則過渡到第二最佳化演算法76。在此情況下,已經可確定,對於投影透鏡16的操縱器的行程變數 x k,存在行程條件形式的一可接受配方,其中遵守為投影透鏡的狀態參數特定的所有限制84。因此,若存在限度遵守行程變數 x k的行程條件,則存在一可接受配方。若
Figure 02_image093
> 1,由於不存在可接受配方,故最佳化通常終止。然而,若 t s剛好超過臨界值,則藉由第二及第三最佳化演算法76及78產生一配方可能是有利的,藉此配方至少在最大程度上遵守限制84。 In Figure 3 is indicated by reference numeral 87 the result of the optimization at the equal scaling factor ts
Figure 02_image091
Without exceeding a certain threshold value 85, the threshold value is preferably 1, that is, if
Figure 02_image091
≤ 1, transition to the second optimization algorithm 76 . In this case, it has been determined that, for the travel variable xk of the manipulator of the projection lens 16, there is an acceptable formula in the form of travel conditions, in which all constraints 84 specific to the state parameters of the projection lens are respected. Therefore, if there are travel conditions that limit compliance with the travel variable xk , there is an acceptable recipe. like
Figure 02_image093
> 1, optimization is usually terminated because no acceptable formulation exists. However, if ts just exceeds a critical value, it may be advantageous to generate a recipe by the second and third optimization algorithms 76 and 78 whereby the recipe adheres to the constraints 84 at least to the greatest extent.

第二最佳化演算法76用於投影透鏡16的狀態參數34的個別最佳化,並且因此在本文中也被稱為狀態參數最佳化演算法。為此,每一狀態參數 ZP i被指定一對應的個別比例縮放因子t i,在圖3中以參考標號90表示。 The second optimization algorithm 76 is used for the individual optimization of the state parameters 34 of the projection lens 16 and is therefore also referred to herein as a state parameter optimization algorithm. To this end, each state parameter ZP i is assigned a corresponding individual scaling factor t i , denoted by reference numeral 90 in FIG. 3 .

第二最佳化演算法76的目標函數F(在圖3中以參考標號88表示)由個別比例縮放因子 t i的加權加總92形成,其中相對的加權因子由w i表示:

Figure 02_image095
;                                        (14) The objective function F (indicated by reference numeral 88 in FIG. 3 ) of the second optimization algorithm 76 is formed by a weighted sum 92 of the individual scaling factors ti, where the relative weighting factors are denoted by wi :
Figure 02_image095
; (14)

式子(14)中所示的目標函數F的最佳化(亦即,F → min)是在下列外顯限度下實現:

Figure 02_image097
,                                        (15)
Figure 02_image099
,及                                    (16)
Figure 02_image009
(17) The optimization of the objective function F shown in equation (14) (that is, F → min) is achieved under the following explicit limits:
Figure 02_image097
, (15)
Figure 02_image099
, and (16)
Figure 02_image009
(17)

限度式子(15)及(16)中引用的限度在本文中亦稱為狀態參數限度94。在式子(15)中引用的限度指明了在每一情況下,個別比例縮放因子 t i不能為負,並且在每一情況下,等比例縮放因子 t s的最佳化結果

Figure 02_image091
不大於1%,該最佳化結果是由第一最佳化演算法74所確定。根據另外的具體實施例,限度式子(15)亦可訂定,使得 t i可使最佳化結果
Figure 02_image091
超過一較大百分比
Figure 02_image091
,諸如,例如5%。寬鬆個別比例縮放因子90使第二最佳化演算法76能充分發揮,以找到個別比例縮放因子90的加權加總92的一最佳化解決方案。 The limits referenced in limit equations (15) and (16) are also referred to herein as state parameter limits 94 . The limits quoted in equation (15) specify that in each case the individual scaling factor ti cannot be negative, and in each case the optimal result of the equal scaling factor t s
Figure 02_image091
Not more than 1%, the optimization result is determined by the first optimization algorithm 74 . According to another specific embodiment, the limit formula (15) can also be defined, so that t i can optimize the result
Figure 02_image091
more than a larger percentage
Figure 02_image091
, such as, for example, 5%. Relaxing the individual scaling factors 90 allows the second optimization algorithm 76 to fully exploit to find an optimal solution for the weighted sum 92 of the individual scaling factors 90 .

限度式子(16)中引用的狀態參數限度94的條件對應於第一最佳化演算法74的限度式子(12),不同的是,個別狀態參數 ZP i的規範值

Figure 02_image049
之每一者前面加註相關個別比例縮放因子 t i ,而非等比例縮放因子 t s 。因此,個別比例縮放因子90定義一相對比例縮放的限制84,其係針對個別狀態參數ZP i指定。限度式子(17)中引用的限度係與第一最佳化演算法74的限度(13)相同,並且指定個別行程變數 x k 的規範或限制
Figure 02_image013
。取決於具體實施例變體,這些亦可以類似限度(13)的方式省略。 The condition of the state parameter limit 94 quoted in the limit expression (16) corresponds to the limit expression (12) of the first optimization algorithm 74, except that the canonical value of the individual state parameter ZP i
Figure 02_image049
Each of these is preceded by an associated individual scaling factor ti , rather than an equal scaling factor ts . Thus, the individual scaling factor 90 defines a relative scaling limit 84 that is specified for the individual state parameter ZP i . The limits quoted in the limit expression (17) are the same as the limit (13) of the first optimization algorithm 74 and specify the specification or limit of the individual travel variable x k
Figure 02_image013
. Depending on the specific embodiment variant, these can also be omitted in a manner similar to limit (13).

藉由第一最佳化演算法74確定而含在近似行程命令38-1中的行程條件為起始值,作為第二最佳化演算法76的基礎。第二最佳化演算法76的最佳化導致一更近似行程命令38-2及在圖3中由參考標號91表示的個別比例縮放因子 t i的最佳化結果

Figure 02_image101
。更近似行程命令38-2包括用於行程變數 x k的行程條件38p或者38n的更近似值。 The trip conditions contained in the approximate trip command 38 - 1 determined by the first optimization algorithm 74 are the starting values as the basis for the second optimization algorithm 76 . The optimization of the second optimization algorithm 76 results in a more approximate travel command 38-2 and an optimization result for the individual scaling factor ti indicated by reference numeral 91 in FIG. 3
Figure 02_image101
. The more approximate stroke command 38-2 includes a more approximate value of the stroke condition 38p or 38n for the stroke variable xk .

第三最佳化演算法78用於最佳化由投影透鏡16的操縱器執行的行程38p和38n,且選擇性由後處理單元36執行,並由行程命令38所指定。通常,本文的目標是最小化這些行程。因此,第三最佳化演算法78在本文中亦稱為行程最佳化演算法。A third optimization algorithm 78 is used to optimize the strokes 38p and 38n performed by the manipulators of the projection lens 16 and optionally performed by the post-processing unit 36 and specified by the stroke command 38 . In general, the goal of this paper is to minimize these trips. Therefore, the third optimization algorithm 78 is also referred to herein as a trip optimization algorithm.

在圖3中以參考96表示第三最佳化演算法78的目標函數F如下所示:

Figure 02_image103
(18) 其中
Figure 02_image105
Figure 02_image107
(19) The objective function F of the third optimization algorithm 78, represented by reference 96 in FIG. 3, is as follows:
Figure 02_image103
(18) of which
Figure 02_image105
and
Figure 02_image107
(19)

其中, x t 表示轉置的行程向量 xM t 表示轉置的靈敏度矩陣 Mb t 表示轉置的冊尼克係數 b j 的向量。由於按照式子(18) ,目標函數F藉行程向量 x含有行程變數 x k ,因此第三最佳化演算法78在本文中亦稱為行程最佳化演算法。由於按式子(18),目標函數F含有 xx t 作為因子,因此目標函數F含有二次形式的行程變 x k 。在式子(18)中所示的目標函數F的最佳化(亦即,F → min)是在下列外顯限度下實現:

Figure 02_image109
,                                        (20)
Figure 02_image111
,及                                    (21)
Figure 02_image009
(22) where x t represents the transposed run vector x , M t represents the transposed sensitivity matrix M , and b t represents the vector of the transposed Schonick coefficients b j . Since the objective function F contains the run variable x k through the run vector x according to equation (18), the third optimization algorithm 78 is also referred to herein as the run optimization algorithm. Since the objective function F contains x and x t as factors according to equation (18), the objective function F contains a quadratic form of the stroke variable x k . The optimization of the objective function F shown in equation (18) (ie, F → min) is achieved under the following explicit limits:
Figure 02_image109
, (20)
Figure 02_image111
, and (21)
Figure 02_image009
(twenty two)

限度式子(20)及(21)中引用的限度在本文中亦稱為行程最佳化限度98。在(20)中引用的限度特定,在每一情況下,由參考標號100表示的進一步個別比例縮放因子

Figure 02_image001
不能為負,並且在每一情況下,對應個別比例縮放因子 t i的最佳化結果
Figure 02_image101
不大於1%,該結果是由第二最佳化演算法76所確定。根據另外的具體實施例,限度式子(20)亦可訂定,使得
Figure 02_image001
可以一更大百分比超過對應最佳化結果
Figure 02_image101
,如5%。寬鬆進一步個別比例縮放因子100使第三最佳化演算法能充分發揮,以找到行程38p或者38n的一最佳化解決方案。 The bounds cited in bound equations (20) and (21) are also referred to herein as travel optimization bounds 98. The limits cited in (20) are specific, in each case further individual scaling factors denoted by reference numeral 100
Figure 02_image001
cannot be negative, and in each case corresponds to the optimization of the individual scaling factor t i
Figure 02_image101
No more than 1%, the result is determined by the second optimization algorithm 76 . According to another specific embodiment, the limit formula (20) can also be defined such that
Figure 02_image001
can exceed the corresponding optimization result by a larger percentage
Figure 02_image101
, such as 5%. Relaxing the individual scaling factor further by 100 allows the third optimization algorithm to fully exploit to find an optimal solution for either run 38p or 38n.

限度式子(21)中引用的限度98的條件對應於第二最佳化演算法76的限度(16),不同的是,個別比例縮放因子 t i取代成進一步個別比例縮放因子

Figure 02_image001
。在(22)中引用的限度係相同於第一最佳化演算法74的限度(13)及第二最佳化演算法76的限度式子(17),其為個別行程變數 x k指定規範或限制
Figure 02_image013
。取決於具體實施例變體,這些亦可以類似限度(13)的方式省略。 The condition of limit 98 cited in limit expression (21) corresponds to limit (16) of the second optimization algorithm 76, except that the individual scaling factors ti are replaced by further individual scaling factors
Figure 02_image001
. The limits cited in (22) are the same as the limits (13) of the first optimization algorithm 74 and the limit expression (17) of the second optimization algorithm 76, which specify specifications for the individual run variables x k or limit
Figure 02_image013
. Depending on the specific embodiment variant, these can also be omitted in a manner similar to limit (13).

藉由第二最佳化演算法76確定、含在進一步近似行程命令38-2中的行程條件為起始值,作為第三最佳化演算法78的基礎。第三最佳化演算法78的最佳化結果是行程命令38。後者包括行程變數 x k的行程條件38p或者38n的最終因此,然後將其作為控制訊號傳輸到投影透鏡16的操縱器M1至M4,或者傳送到後處理單元36,參考圖1及圖2所述。 The trip condition determined by the second optimization algorithm 76 and contained in the further approximated trip command 38 - 2 is the starting value as the basis for the third optimization algorithm 78 . The optimization result of the third optimization algorithm 78 is the travel command 38 . The latter includes the final result of the stroke condition 38p or 38n of the stroke variable xk , which is then transmitted as a control signal to the manipulators M1 to M4 of the projection lens 16, or to the post-processing unit 36, as described with reference to FIGS. 1 and 2 .

示例性具體實施例、具體實施例或具體實施例變體的以上描述,應理解為舉例說明。由此實現的揭露首先使本領域具有通常知識者能夠理解本發明及與其相關的優點,其次所描述的結構及方法的變化和修改,對本領域具有通常知識者的理解也是顯而易見。因此,所有變化和修改,根據文後申請專利範圍的定義,只要落入本發明的範疇及等同請求項,均應受請求項所保護。The foregoing descriptions of exemplary embodiments, specific embodiments, or variations of specific embodiments are to be understood as illustrative. The disclosure thus achieved first enables those skilled in the art to understand the invention and its related advantages, and secondly, changes and modifications to the described structures and methods are also apparent to those skilled in the art. Therefore, all changes and modifications, as long as they fall within the scope of the present invention and equivalent claims, should be protected by the claims according to the definition of the scope of the patent application hereinafter.

10:調整器件 12:測量器件 14:控制器件 16:投影透鏡 18:照明單元 20:測量輻射 22:測量光罩 26:感測器元件 30:偵測器 32:評估單元 34:狀態參數 36:後處理單元 38:行程命令 38-1:近似行程命令 38-2:更近似行程命令 38p:投影透鏡操縱器行程條件 38n:後處理單元行程條件 40:傾斜軸 50:投影曝光裝置 52:曝光輻射源: 54:曝光輻射 56:照明光學單元 58:光罩 60:光罩位移台 62:光罩位移台的掃描方向 64:基材 66:基材位移台 68:基材位移台的掃描方向 70:波前測量單元t 72:整體最佳化演算法 74:第一最佳化演算法 76:第二最佳化演算法 78:第三最佳化演算法 80:第一最佳化演算法的目標函數 82:第一最佳化演算法的限度 84:限制 85:臨界值 86:等比例縮放因子 ts 87:等比例縮放因子 ts 的最佳化結果 88:第二最佳化演算法的目標函數 90:個別比例縮放因子 ti 91:個別比例縮放因子 ti 的最佳化結果 92:加權加總 94:狀態參數限度 96:第三最佳化演算法的目標函數 98:行程最佳化限度 100:更個別比例縮放因子

Figure 02_image001
bj:像差 E1-E4:光學元件 M1-M4:操縱器 x:行程向量 xi:行程變數 xk:行程變數 10: Adjustment device 12: Measuring device 14: Control device 16: Projection lens 18: Lighting unit 20: Measuring radiation 22: Measuring mask 26: Sensor element 30: Detector 32: Evaluation unit 34: Status parameter 36: Post-processing unit 38: stroke command 38-1: approximate stroke command 38-2: more approximate stroke command 38p: projection lens manipulator stroke condition 38n: post-processing unit stroke condition 40: tilt axis 50: projection exposure device 52: exposure radiation source: 54: exposure radiation 56: illumination optics 58: reticle 60: reticle stage 62: scan direction of reticle stage 64: substrate 66: substrate stage 68: scan direction of substrate stage 70 : wavefront measurement unit t 72: overall optimization algorithm 74: first optimization algorithm 76: second optimization algorithm 78: third optimization algorithm 80: first optimization algorithm 82: Limits of the first optimization algorithm 84: Limits 85: Critical values 86: Equal scaling factor ts 87: Optimal results of the equal scaling factor ts 88: The second optimization algorithm Objective function 90: Individual scaling factors ti 91: Optimization results for individual scaling factors ti 92: Weighted summation 94: State parameter limits 96: Objective function of the third optimization algorithm 98: Travel optimization limits 100: more individual scaling factor
Figure 02_image001
bj: Aberrations E1-E4: Optical elements M1-M4: Manipulator x: Stroke vector xi: Stroke variable xk: Stroke variable

在參考附圖的下列根據本發明的多個示例性具體實施例的實施方式中示意說明本發明的前述及其他優選特徵。在附圖中:The foregoing and other preferred features of the present invention are illustrated schematically in the following description of exemplary embodiments of the invention, which are set forth with reference to the accompanying drawings. In the attached image:

圖1示出一用於調整微影投影曝光裝置的投影透鏡之調整裝置,其包括一用於產生操縱器的行程命令之控制器件;FIG. 1 shows an adjustment device for adjusting a projection lens of a lithography projection exposure device, which includes a control device for generating travel commands of a manipulator;

圖2示出一微影投影曝光裝置,其包含一用於產生操縱器的行程命令之控制器件;以及Figure 2 shows a lithographic projection exposure apparatus including a control device for generating travel commands for the manipulator; and

圖3示出前述控制器件之一具體實施例功能的視覺化。Figure 3 shows a visualization of the functionality of one of the aforementioned control means.

34:狀態參數 34: Status parameter

38:行程命令 38: Stroke Command

38-1:近似行程命令 38-1: Approximate stroke command

38-2:更近似行程命令 38-2: More approximate stroke command

72:整體最佳化演算法 72: Overall Optimization Algorithm

74:第一最佳化演算法 74: First Optimization Algorithm

76:第二最佳化演算法 76: Second Optimization Algorithm

78:第三最佳化演算法 78: Third Optimization Algorithm

80:第一最佳化演算法的目標函數 80: Objective function of the first optimization algorithm

82:第一最佳化演算法的限度 82: Limits of First Optimization Algorithms

84:限制 84: Restrictions

85:臨界值 85: critical value

86:等比例縮放因子ts 86: Equal scaling factor ts

87:等比例縮放因子ts的最佳化結果 87: Optimized results for equal scaling factor ts

88:第二最佳化演算法的目標函數 88: Objective function of the second optimization algorithm

90:個別比例縮放因子ti 90: Individual scaling factor ti

91:個別比例縮放因子ti的最佳化結果 91: Optimization results for individual scaling factors ti

92:加權加總 92: Weighted Summation

94:狀態參數限度 94: State parameter limit

96:第三最佳化演算法的目標函數 96: Objective function of the third optimization algorithm

98:行程最佳化限度 98: Itinerary optimization limit

100:更個別比例縮放因子

Figure 110130653-A0304-11-0003-4
100: more individual scaling factor
Figure 110130653-A0304-11-0003-4

Claims (15)

一種用於控制操縱器的控制器件,其藉由產生複數個行程變數的相對行程條件來改變一微影投影透鏡的光學行為,該等行程變數定義由該等操縱器對投影透鏡的至少一光學元件進行的操縱,用於改變該投影透鏡的狀態參數,其中該控制器件構造成: - 藉由使用一第一最佳化演算法最佳化一等比例縮放因子,產生對該等行程變數行程條件的一相對近似值,所述比例縮放因子在該第一最佳化演算法的限度中,定義一等比例縮放的限制,該等限制是為該等個別狀態參數所指定,以及 - 在藉由該第一最佳化演算法所確定,該等比例縮放因子的一最佳化結果不超過一特定臨界值的情況下,藉由至少一進一步最佳化演算法,確定該行程變數行程條件的一相對最終結果。 A control device for controlling a manipulator that changes the optical behavior of a lithography projection lens by generating relative travel conditions of a plurality of travel variables, the travel variables defining at least one optical effect of the manipulator on the projection lens manipulation of elements for changing state parameters of the projection lens, wherein the control device is configured to: - Generate a relative approximation to the travel variable travel conditions by optimizing a scaling factor using a first optimization algorithm, the scaling factor being within the limits of the first optimization algorithm , define the first scaling limits specified for the individual state parameters, and - determining the itinerary by at least one further optimization algorithm, provided that an optimization result of the scaling factors does not exceed a certain threshold, determined by the first optimization algorithm A relative end result for variable travel conditions. 如請求項1所述之控制器件, 其還構造成當執行該至少一進一步最佳化演算法時,執行一狀態參數最佳化演算法,在所述狀態參數最佳化演算法中最佳化個別比例縮放因子的一加權加總,同時考慮與該狀態參數相關的狀態參數限度,其中該等狀態參數限度中的該等個別比例縮放因子定義一相對縮放的限制,該等限制是為該等個別狀態參數所指定。 A control device as described in claim 1, It is also configured to, when executing the at least one further optimization algorithm, execute a state parameter optimization algorithm in which a weighted sum of individual scaling factors is optimized , while considering state parameter limits associated with the state parameter, wherein the individual scaling factors in the state parameter limits define a relative scaling limit specified for the individual state parameters. 如請求項1或2所述之控制器件, 其還構造成當執行該至少一進一步最佳化演算法時,執行一行程最佳化演算法,其中含有該行程變數的一目標函數被最佳化。 A control device as claimed in claim 1 or 2, It is also configured to execute a run optimization algorithm in which an objective function including the run variable is optimized when the at least one further optimization algorithm is executed. 如請求項2及請求項3所述之控制器件, 其構造成當執行該至少一進一步最佳化演算法時,首先執行該狀態參數最佳化演算法,而後執行該行程最佳化演算法,其中該行程最佳化演算法構造成最佳化考慮該條件的該目標函數,該條件為進一步個別比例縮放因子之每一者可能超過該等對應第一個別比例縮放因子的最佳化結果不大於5%,該等對應第一個別比例縮放因子是由該狀態參數最佳化演算法所確定。 The control device as described in claim 2 and claim 3, It is configured such that when executing the at least one further optimization algorithm, first the state parameter optimization algorithm is executed, and then the travel optimization algorithm is executed, wherein the travel optimization algorithm is configured to optimize Consider the objective function of the condition that each of the further individual scaling factors may exceed the optimization result of the corresponding first individual scaling factors by no more than 5%, the corresponding first individual scaling factors is determined by the state parameter optimization algorithm. 如請求項4所述之控制器件, 其還構造成將該行程最佳化演算法,奠基於該等行程變數行程條件的更近似值,該等行程變數是當執行該狀態參數最佳化演算法時所確定。 A control device as described in claim 4, It is also configured to base the trip optimization algorithm on more approximations of trip conditions based on the trip variables determined when executing the state parameter optimization algorithm. 如請求項2、4或5所述之控制器件, 其中該狀態參數限度更包括該條件,所述條件為該等第一個別比例縮放因子之每一者可能超過該比例縮放因子的該最佳化結果不大於5%,該比例縮放因子是由該第一最佳化演算法所確定。 A control device as claimed in claim 2, 4 or 5, wherein the state parameter limit further includes the condition that each of the first individual scaling factors may exceed the optimization result of the scaling factor by no more than 5%, the scaling factor being determined by the determined by the first optimization algorithm. 如請求項3至6中任一項所述之控制器件, 其中該行程最佳化演算法的該目標函數含有至少二次形式的該等行程變數。 A control device as claimed in any one of claims 3 to 6, Wherein the objective function of the travel optimization algorithm contains the travel variables in at least quadratic form. 如前述請求項中任一項所述的控制器件, 其還構造成將該至少一進一步最佳化演算法,奠基於作為起始值的該等行程變數行程條件的該等近似值。 A control device as claimed in any one of the preceding claims, It is also configured to base the at least one further optimization algorithm on the approximations of the travel variable travel conditions as starting values. 如前述請求項中任一項所述之控制器件, 其中該第一最佳化演算法的多個限度訂定為外顯限度,其並非在執行該第一最佳化演算法時所最佳化的一目標函數的一部分。 A control device as claimed in any one of the preceding claims, Wherein the constraints of the first optimization algorithm are defined as explicit constraints, which are not part of an objective function optimized when the first optimization algorithm is executed. 如前述請求項中任一項所述之控制器件, 其中該等確定的行程變數行程條件定義該投影透鏡的該等狀態參數的改變,該等改變是藉該等操縱器執行。 A control device as claimed in any one of the preceding claims, wherein the determined travel variable travel conditions define changes in the state parameters of the projection lens, the changes being performed by the manipulators. 一種用於調整微影投影透鏡的調整裝置,其包括一測量器件,用於確定該投影透鏡的狀態參數的目前值;及如前述請求項中任一項所述之一控制器件,用於從該等狀態參數的該等目前值產生該等行程變數行程條件。An adjustment device for adjusting a lithography projection lens, comprising a measuring device for determining the current value of a state parameter of the projection lens; The current values of the state parameters generate the travel variable travel conditions. 一種用於微影投影曝光裝置的投影透鏡包括多個操縱器,其構造成改變該投影透鏡的狀態參數;及如請求項1至10中任一項所述之一控制器件,用於控制該等操縱器。A projection lens for a lithography projection exposure apparatus comprising a plurality of manipulators configured to change a state parameter of the projection lens; and a control device as described in any one of claims 1 to 10 for controlling the Wait for the manipulator. 一種微影投影曝光器件,其包括如請求項12所述之一投影透鏡。A lithography projection exposure device comprising a projection lens as described in claim 12. 一種用於控制操縱器的方法,其藉由產生複數個行程變數的相對行程條件來改變一微影投影透鏡的光學行為,該等行程變數定義由該等操縱器對投影透鏡的至少一光學元件進行的操縱,用於改變狀態參數,該方法包含下列步驟: - 藉由使用一第一最佳化演算法最佳化一等比例縮放因子,產生對該等行程變數行程條件的一相對近似值,其中該等比例縮放因子在該第一最佳化演算法的限度中定義一等比例縮放的限制,該等限制是為該等個別狀態參數所指定;以及 - 在由該第一最佳化演算法所確定的該等比例縮放因子的一最佳化結果不超過一特定臨界值的情況下,藉由至少一進一步最佳化演算法,確定該行程變數行程條件的一相對最終結果。 A method for controlling a manipulator that alters the optical behavior of a lithographic projection lens by generating relative travel conditions of a plurality of travel variables that define control of at least one optical element of the projection lens by the manipulators Manipulation performed to change state parameters, the method consists of the following steps: - generating a relative approximation to the trip-variable trip conditions by optimizing a scaling factor using a first optimization algorithm, wherein the scaling factor in the first optimization algorithm Limits define first-scaling limits specified for those individual state parameters; and - determining the travel variable by at least one further optimization algorithm, provided that an optimization result of the scaling factors determined by the first optimization algorithm does not exceed a certain threshold A relative end result of travel conditions. 如請求項14所述之方法, 其中使用至少一進一步最佳化演算法確定該等行程變數行程條件的該相對最終因此,該進一步最佳化演算法考慮對該投影透鏡的該等狀態參數的外顯更限度,其並非在執行該至少一進一步最佳化演算法時所最佳化的一目標函數的一部分。 A method as described in claim 14, wherein at least one further optimization algorithm is used to determine the relative finality of the travel variable travel conditions. Therefore, the further optimization algorithm takes into account the apparent limits of the state parameters of the projection lens, which are not performing A portion of an objective function that is optimized in the at least one further optimization algorithm.
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