TW202201108A - Wavelength conversion element, projector, and phosphor ceramic member including a substrate, and a phosphor ceramic layer located above a light reflecting surface and containing the first crystal phase with garnet structure - Google Patents

Wavelength conversion element, projector, and phosphor ceramic member including a substrate, and a phosphor ceramic layer located above a light reflecting surface and containing the first crystal phase with garnet structure Download PDF

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TW202201108A
TW202201108A TW110123029A TW110123029A TW202201108A TW 202201108 A TW202201108 A TW 202201108A TW 110123029 A TW110123029 A TW 110123029A TW 110123029 A TW110123029 A TW 110123029A TW 202201108 A TW202201108 A TW 202201108A
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light
phosphor ceramic
wavelength conversion
conversion element
ceramic layer
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TWI802918B (en
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阿部岳志
本多洋介
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日商松下知識產權經營股份有限公司
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details
    • G03B21/20Lamp housings
    • G03B21/2006Lamp housings characterised by the light source
    • G03B21/2033LED or laser light sources
    • G03B21/204LED or laser light sources using secondary light emission, e.g. luminescence or fluorescence
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/77Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
    • C09K11/7766Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing two or more rare earth metals
    • C09K11/7774Aluminates
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details
    • G03B21/20Lamp housings
    • G03B21/2066Reflectors in illumination beam

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  • Inorganic Chemistry (AREA)
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Abstract

The present invention provides a wavelength conversion element having a high light utilization efficiency, a projector, and a phosphor ceramic member. The wavelength conversion element 1 is used in the projector 100 to receive excitation light L1 and emits reflected light L2 including fluorescent light, and includes: a substrate 10 having a light reflecting surface 13; and a phosphor ceramic layer 20 located above a light reflecting surface 13 and containing a first crystal phase with garnet structure. The visible light reflectance of the light reflecting surface 13 is 95% or more and 100% or less. The density of the phosphor ceramic layer 20 is 97% or more and 100% or less of the theoretical density. The film thickness of the phosphor ceramic layer 20 is 50 [mu]m or more and less than 120 [mu]m.

Description

波長轉換元件、投影機及螢光體陶瓷構件Wavelength conversion element, projector and phosphor ceramic member

本發明係關於一種波長轉換元件、使用該波長轉換元件之投影機、及螢光體陶瓷構件。The present invention relates to a wavelength conversion element, a projector using the wavelength conversion element, and a phosphor ceramic member.

過去,已知一種使用於投影機之波長轉換元件。In the past, a wavelength conversion element for use in projectors has been known.

例如,於專利文獻1揭露之波長轉換元件,具備俯視呈圓形之基板、及沿著基板的圓周方向設置之螢光體層(螢光體陶瓷構件),可藉由與基板的中心連接之馬達而旋轉。在專利文獻1,此波長轉換元件,作為投影機的反射型之螢光輪而作用,該波長轉換元件之螢光體層所放出的螢光,作為投影機放出的光線(投射光)而利用。 [習知技術文獻] [專利文獻]For example, the wavelength conversion element disclosed in Patent Document 1 includes a substrate that is circular in plan view, and a phosphor layer (phosphor ceramic member) provided along the circumferential direction of the substrate, and can be connected to the center of the substrate by a motor. while rotating. In Patent Document 1, the wavelength conversion element functions as a reflection-type fluorescent wheel of a projector, and the fluorescent light emitted by the phosphor layer of the wavelength conversion element is used as light (projection light) emitted by the projector. [Previously known technical literature] [Patent Literature]

專利文獻1:日本特開第2019-66880號公報Patent Document 1: Japanese Patent Laid-Open No. 2019-66880

[本發明所欲解決的問題][Problems to be Solved by the Invention]

而上述習知之波長轉換元件、投影機及螢光體陶瓷構件,有光線之利用效率低等問題。因而,本發明提供光利用效率高之波長轉換元件、投影機及螢光體陶瓷構件。 [解決問題之技術手段]However, the above-mentioned conventional wavelength conversion elements, projectors and phosphor ceramic components have problems such as low utilization efficiency of light. Therefore, the present invention provides a wavelength conversion element, a projector, and a phosphor ceramic member with high light utilization efficiency. [Technical means to solve problems]

本發明的一態樣之波長轉換元件,使用在投影機,接收激發光,放出包含螢光的反射光,其具備:基板,具有光反射面;以及螢光體陶瓷層,位於該光反射面的上方,包含具有石榴石構造之第1結晶相;該光反射面的可見光反射率為95%以上100%以下;該螢光體陶瓷層的密度為理論密度之97%以上100%以下;該螢光體陶瓷層的膜厚為50μm以上而未滿120μm。A wavelength conversion element of one aspect of the present invention is used in a projector, receives excitation light, and emits reflected light including fluorescent light, comprising: a substrate having a light reflecting surface; and a phosphor ceramic layer on the light reflecting surface The top of the phosphor ceramic layer contains the first crystal phase with garnet structure; the visible light reflectance of the light reflecting surface is 95% or more and 100% or less; the density of the phosphor ceramic layer is 97% or more of the theoretical density and less than 100%; the The film thickness of the phosphor ceramic layer is 50 μm or more and less than 120 μm.

此外,本發明的一態樣之投影機,具備:激發光源,放出激發光;以及該波長轉換元件,接收該激發光,放出包含螢光的反射光。Furthermore, a projector according to an aspect of the present invention includes: an excitation light source that emits excitation light; and the wavelength conversion element that receives the excitation light and emits reflected light including fluorescent light.

此外,本發明的一態樣之螢光體陶瓷構件,使用在投影機,其包含具有石榴石構造之第1結晶相、及具有石榴石構造以外的構造之第2結晶相;該螢光體陶瓷構件的密度為理論密度之97%以上100%以下;該螢光體陶瓷構件的膜厚為50μm以上而未滿300μm。 [本發明之效果]In addition, a phosphor ceramic member according to an aspect of the present invention, which is used in a projector, includes a first crystal phase having a garnet structure and a second crystal phase having a structure other than the garnet structure; the phosphor The density of the ceramic member is 97% or more and 100% or less of the theoretical density; the film thickness of the phosphor ceramic member is 50 μm or more and less than 300 μm. [Effect of the present invention]

依本發明,則可提供光利用效率高之波長轉換元件、投影機及螢光體陶瓷構件。According to the present invention, a wavelength conversion element, a projector and a phosphor ceramic member with high light utilization efficiency can be provided.

以下,利用圖式,針對本發明的實施形態之波長轉換元件等詳細地予以說明。Hereinafter, the wavelength conversion element and the like according to the embodiments of the present invention will be described in detail with reference to the drawings.

另,以下說明之實施形態,皆顯綜合性或具體性案例。下述實施形態所示的數值、形狀、材料、構成要素、構成要素之配置位置與連接形態、製程、製程之順序等皆為一例,主旨不在於限定本發明。此外,將關於下述實施形態的構成要素中之未記載於獨立請求項的構成要素,作為任意構成要素而說明。In addition, the implementation forms described below are all comprehensive or specific cases. The numerical values, shapes, materials, components, arrangement positions and connection forms of components, processes, and order of processes shown in the following embodiments are all examples, and are not intended to limit the present invention. In addition, among the components concerning the following embodiment, the components which are not described in the independent claim are demonstrated as arbitrary components.

此外,各圖為示意圖,並非為嚴格圖示。因此,例如,在各圖中比例尺等不必非得一致。此外,各圖中,對實質上相同的構成給予相同的符號,將重複的說明省略或簡化。In addition, each figure is a schematic diagram, and is not strictly a diagram. Therefore, for example, the scale or the like does not necessarily have to be the same among the figures. In addition, in each figure, the same code|symbol is attached|subjected to the substantially same structure, and the overlapping description is abbreviate|omitted or simplified.

本說明書中,平行或正交等表示要素間的關係性之用語、及圓形或橢圓形等表示要素的形狀之用語、與數值範圍,並非僅為表示嚴格意義的展現,而係意指亦包含實質上同等範圍,例如數%程度之差異的展現。In this specification, terms indicating the relationship between elements, such as parallel or orthogonal, and terms indicating the shape of elements such as circle or ellipse, and numerical ranges are not only expressions in a strict sense, but also mean Substantially equivalent ranges are included, for example, representations of differences of the order of a few percent.

此外,本說明書中,「俯視」,係指沿著基板所具有之光反射面的垂直方向觀察波長轉換元件之情況。In addition, in this specification, "planar view" means the case where a wavelength conversion element is seen along the perpendicular direction of the light reflection surface which a board|substrate has.

此外,本說明書中,波長轉換元件的構成之「上」及「下」等用語,並非指絕對的空間認知的上方(鉛直上方)及下方(鉛直下方),而係以疊層構造之疊層順序為基礎而藉由相對的位置關係規定之用語。此外,「上方」及「下方」等用語,不僅適用於2個構成要素彼此隔著間隔配置而在2個構成要素之間存在其他構成要素的情況,亦適用於2個構成要素彼此密接配置而使2個構成要素接觸的情況。In addition, in this specification, the terms "upper" and "lower" in the structure of the wavelength conversion element do not refer to the upper (vertical upper) and lower (vertical lower) of the absolute spatial perception, but refer to the stacked layers in the stacked structure. A term specified by relative positional relationship on the basis of order. In addition, the terms "above" and "below" are not only applicable to the case where two components are arranged with a gap between each other and another component exists between the two components, but also when the two components are arranged in close contact with each other. When two components are brought into contact.

此外,本說明書及圖式中,x軸、y軸及z軸,表示三維正交座標系之三軸。各實施形態,使和基板所具有之光反射面平行的二軸為x軸及y軸,使和光反射面呈正交之方向為z軸方向。此外,下述說明之各實施形態中,有將z軸正方向記載為上方,將z軸負方向記載為下方的情況。In addition, in this specification and the drawings, the x-axis, the y-axis, and the z-axis represent three axes of a three-dimensional orthogonal coordinate system. In each embodiment, the two axes parallel to the light reflecting surface of the substrate are the x-axis and the y-axis, and the direction orthogonal to the light reflecting surface is the z-axis direction. In addition, in each embodiment described below, the positive z-axis direction is described as upward, and the negative z-axis direction is described as downward.

(實施形態) [波長轉換元件的構成] 首先,利用圖式,針對本實施形態之波長轉換元件1的構成予以說明。圖1係本實施形態之波長轉換元件1的立體圖。圖2係顯示圖1的II-II線之波長轉換元件1的截斷面之剖面圖。(implementation form) [Configuration of wavelength conversion element] First, the configuration of the wavelength conversion element 1 of the present embodiment will be described with reference to the drawings. FIG. 1 is a perspective view of the wavelength conversion element 1 of the present embodiment. FIG. 2 is a cross-sectional view showing a cross-section of the wavelength conversion element 1 along the line II-II of FIG. 1 .

如圖1及圖2所示,波長轉換元件1,係具備具有光反射面13的基板10、螢光體陶瓷層20、及防止反射層30之元件。As shown in FIGS. 1 and 2 , the wavelength conversion element 1 includes a substrate 10 having a light reflecting surface 13 , a phosphor ceramic layer 20 , and an antireflection layer 30 .

本實施形態中,波長轉換元件1,係使用在投影機,接收激發光L1,放出包含螢光的反射光之螢光輪。波長轉換元件1,具有圓盤形狀,於俯視時波長轉換元件1的中央設置有旋轉驅動的馬達4。因此,波長轉換元件1,藉由馬達4,以馬達4為軸而往圖1所示之箭頭的方向旋轉驅動。In the present embodiment, the wavelength conversion element 1 is used in a projector, and is a fluorescent wheel that receives excitation light L1 and emits reflected light including fluorescent light. The wavelength conversion element 1 has a disk shape, and a motor 4 that is rotationally driven is provided at the center of the wavelength conversion element 1 in plan view. Therefore, the wavelength conversion element 1 is rotationally driven by the motor 4 in the direction of the arrow shown in FIG. 1 using the motor 4 as a shaft.

另,圖1中,顯示設置馬達4之螢光輪的構成,但波長轉換元件1,亦可不具備馬達4。亦即,波長轉換元件1,亦可為固定元件而不旋轉驅動。若為此等構成,則波長轉換元件1成為小型,故可提供密實的投影機。In addition, although FIG. 1 shows the structure of the fluorescent wheel provided with the motor 4, the wavelength conversion element 1 may not have the motor 4. That is, the wavelength conversion element 1 may be a fixed element without being driven to rotate. With such a configuration, the wavelength conversion element 1 can be reduced in size, so that a compact projector can be provided.

螢光體陶瓷層20,係位於基板10所具有的光反射面13的上方的層。本實施形態中,波長轉換元件1為螢光輪,故螢光體陶瓷層20,為螢光環。螢光體陶瓷層20,在從波長轉換元件1之旋轉中心部(即設置馬達4處)算起的距離相等之圓周上呈環狀地設置。亦即,螢光體陶瓷層20,設置為俯視時沿著圓周方向的帶狀。The phosphor ceramic layer 20 is a layer located above the light reflecting surface 13 of the substrate 10 . In this embodiment, the wavelength conversion element 1 is a fluorescent wheel, so the fluorescent ceramic layer 20 is a fluorescent ring. The phosphor ceramic layer 20 is provided annularly on the circumference at an equal distance from the rotation center portion of the wavelength conversion element 1 (ie, where the motor 4 is provided). That is, the phosphor ceramic layer 20 is provided in a band shape along the circumferential direction in plan view.

螢光體陶瓷層20,包含具有石榴石構造之第1結晶相。更具體而言,本實施形態中,螢光體陶瓷層20,僅由具有石榴石構造之第1結晶相構成。亦即,本實施形態之螢光體陶瓷層20,不含具有與石榴石構造不同的構造之結晶相。石榴石構造,係以A3 B2 C3 O12 之一般式表示的結晶構造。於元素A,應用Ca、Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb及Lu等稀土族元素;於元素B,應用Mg、Al、Si、Ga及Sc等元素;於元素C,應用Al、Si及Ga等元素。作為此等石榴石構造,可列舉YAG(釔鋁石榴石(Yttrium Aluminum Garnet))、LuAG(鎦鋁石榴石(Lutetium Aluminum Garnet))、Lu2 CaMg2 Si3 O12 (鎦鈣鎂矽石榴石(Lutetium Calcium Magnesium Silicon Garnet))及TAG(鋱鋁石榴石(Terbium Aluminum Garnet))等。本實施形態中,螢光體陶瓷層20,係由以(Y1 x Cex3 Al2 Al3 O12 (即(Y1 x Cex3 Al5 O12 )(0.001≦x<0.1)表示之第1結晶相,亦即由YAG構成。The phosphor ceramic layer 20 includes a first crystal phase having a garnet structure. More specifically, in the present embodiment, the phosphor ceramic layer 20 is composed of only the first crystal phase having a garnet structure. That is, the phosphor ceramic layer 20 of the present embodiment does not contain a crystal phase having a structure different from the garnet structure. The garnet structure is a crystal structure represented by the general formula of A 3 B 2 C 3 O 12 . For element A, use rare earth elements such as Ca, Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, and Lu; for element B, use elements such as Mg, Al, Si, Ga, and Sc; C, the application of elements such as Al, Si and Ga. Examples of such garnet structures include YAG (Yttrium Aluminum Garnet), LuAG (Lutetium Aluminum Garnet), Lu 2 CaMg 2 Si 3 O 12 (Lutetium Aluminum Garnet) (Lutetium Calcium Magnesium Silicon Garnet) and TAG (Terbium Aluminum Garnet), etc. In this embodiment, the phosphor ceramic layer 20 is made of (Y 1 - x Ce x ) 3 Al 2 Al 3 O 12 (that is, (Y 1 - x Ce x ) 3 Al 5 O 12 ) (0.001≦x <0.1), the first crystal phase is composed of YAG.

另,構成螢光體陶瓷層20之第1結晶相,亦可為化學組成不同之複數種石榴石結晶相的固溶體。作為此等固溶體,可列舉以(Y1 x Cex3 Al2 Al3 O12 (0.001≦x<0.1)表示之石榴石結晶相與以(Lu1 d Ced3 Al2 Al3 O12 (0.001≦d<0.1)表示之石榴石結晶相的固溶體((1-a)(Y1 x Cex3 Al5 O12 ・a(Lu1 d Ced3 Al2 Al3 O12 (0<a<1))。此外,作為此等固溶體,可列舉以(Y1 x Cex3 Al2 Al3 O12 (0.001≦x<0.1)表示之石榴石結晶相與以(Lu1 z Cez2 CaMg2 Si3 O12 (0.0015≦z<0.15)表示之石榴石結晶相的固溶體((1-b)(Y1 x Cex3 Al2 Al3 O12 ・b(Lu1 z Cez2 CaMg2 Si3 O12 (0<b<1))等。藉由以化學組成不同之複數種石榴石結晶相的固溶體構成螢光體陶瓷層20,而使螢光體陶瓷層20所放出的螢光之螢光光譜更為寬波段化,增加綠色光成分與紅色光成分。因此,可提供放出寬色域的投射光之投影機。In addition, the first crystal phase constituting the phosphor ceramic layer 20 may be a solid solution of a plurality of garnet crystal phases having different chemical compositions. Examples of such solid solutions include a garnet crystal phase represented by (Y 1 - x Ce x ) 3 Al 2 Al 3 O 12 (0.001≦x<0.1) and a garnet crystal phase represented by (Lu 1 - d Ce d ) 3 Al 2 Solid solution of garnet crystal phase represented by Al 3 O 12 (0.001≦d<0.1) ((1-a)(Y 1 - x Ce x ) 3 Al 5 O 12 ·a (Lu 1 - d Ce d ) 3 Al 2 Al 3 O 12 (0<a<1)). In addition, as these solid solutions, a garnet crystal phase represented by (Y 1 - x Ce x ) 3 Al 2 Al 3 O 12 (0.001≦x<0.1) and a garnet crystal phase represented by (Lu 1 - z Ce z ) can be mentioned. 2 Solid solution of garnet crystal phase represented by CaMg 2 Si 3 O 12 (0.0015≦z<0.15) ((1-b)(Y 1 - x C x ) 3 Al 2 Al 3 O 12 ·b (Lu 1 - z Ce z ) 2 CaMg 2 Si 3 O 12 (0<b<1)) and the like. By forming the phosphor ceramic layer 20 with a solid solution of a plurality of garnet crystal phases with different chemical compositions, the fluorescence spectrum of the fluorescence emitted by the phosphor ceramic layer 20 is broadened and the green color is increased. light component and red light component. Therefore, a projector that emits projected light with a wide color gamut can be provided.

此外,構成螢光體陶瓷層20之第1結晶相,亦可包含相對於以上述一般式A3 B2 C3 O12 表示之結晶相使化學組成偏移之結晶相。作為此等結晶相,可列舉相對於以(Y1 x Cex3 Al2 Al3 O12 (0.001≦x<0.1)表示之結晶相為富Al的(Y1 x Cex3 Al2 δ Al3 O12 (δ為正數)。此外,作為此等結晶相,可列舉相對於以(Y1 x Cex3 Al2 Al3 O12 (0.001≦x<0.1)表示之結晶相為富Y的(Y1 x Cex3 ζ Al2 Al3 O12 (ζ為正數)等。此等結晶相,相對於以一般式A3 B2 C3 O12 表示之結晶相,雖使化學組成偏移,但仍維持石榴石構造。藉由使螢光體陶瓷層20由化學組成偏移之結晶相構成,而於螢光體陶瓷層20中產生折射率不同的區域,故激發光L1及螢光更為分散,螢光體陶瓷層20的發光面積變得更小。因此,可提供光展量(Etendue)更小、光利用效率更高之波長轉換元件1及投影機。In addition, the first crystal phase constituting the phosphor ceramic layer 20 may include a crystal phase whose chemical composition is shifted from the crystal phase represented by the general formula A 3 B 2 C 3 O 12 described above. Examples of such crystal phases include (Y 1 -x Ce x ) 3 that is rich in Al with respect to the crystal phase represented by (Y 1 -x Ce x ) 3 Al 2 Al 3 O 12 (0.001≦x<0.1 ) . Al 2 + δ Al 3 O 12 (δ is a positive number). In addition, as these crystal phases, (Y 1 -x Ce x ) rich in Y relative to the crystal phase represented by (Y 1 -x Ce x ) 3 Al 2 Al 3 O 12 (0.001≦ x <0.1) can be mentioned . ) 3 + ζ Al 2 Al 3 O 12 (ζ is a positive number), etc. These crystal phases maintain a garnet structure even though the chemical composition is shifted relative to the crystal phase represented by the general formula A 3 B 2 C 3 O 12 . By making the phosphor ceramic layer 20 composed of crystal phases whose chemical composition is shifted, regions with different refractive indices are generated in the phosphor ceramic layer 20, so the excitation light L1 and the fluorescence are more dispersed, and the phosphor ceramic The light emitting area of the layer 20 becomes smaller. Therefore, the wavelength conversion element 1 and the projector with smaller etendue and higher light utilization efficiency can be provided.

進一步,螢光體陶瓷層20,亦可包含第1結晶相、及具有石榴石構造以外的構造之不同相。藉由由此等第1結晶相及不同相構成螢光體陶瓷層20,而於螢光體陶瓷層20中產生折射率不同的區域,故激發光L1及螢光更為分散,螢光體陶瓷層20的發光面積變得更小。因此,可提供光展量更小、光利用效率更高之波長轉換元件1及投影機。Furthermore, the phosphor ceramic layer 20 may include the first crystal phase and a different phase having a structure other than the garnet structure. By forming the phosphor ceramic layer 20 with the first crystal phase and the different phases, regions with different refractive indices are generated in the phosphor ceramic layer 20, so that the excitation light L1 and the fluorescent light are more dispersed, and the phosphor ceramic layer 20 is formed. The light emitting area of the ceramic layer 20 becomes smaller. Therefore, the wavelength conversion element 1 and the projector with smaller etendue and higher light utilization efficiency can be provided.

以YAG構成之螢光體陶瓷層20,接收從波長轉換元件1的上方入射的光線作為激發光L1,放出螢光。更具體而言,將從後述激發光源射出的光線作為激發光L1對螢光體陶瓷層20照射,藉以從螢光體陶瓷層20放出螢光作為波長轉換光。亦即,從螢光體陶瓷層20放出的波長轉換光,為波長較激發光L1之波長更長的光線。The phosphor ceramic layer 20 made of YAG receives light incident from above the wavelength conversion element 1 as excitation light L1 and emits fluorescent light. More specifically, the phosphor ceramic layer 20 is irradiated with light emitted from an excitation light source described later as excitation light L1 , thereby emitting fluorescence from the phosphor ceramic layer 20 as wavelength-converted light. That is, the wavelength-converted light emitted from the phosphor ceramic layer 20 is light having a wavelength longer than that of the excitation light L1.

本實施形態中,於從螢光體陶瓷層20放出的波長轉換光,包含係黃色系光的螢光。螢光體陶瓷層20,例如,吸收波長380nm以上490nm以下的光線,放出將在波長490nm以上580nm以下的範圍具有螢光峰波長之係黃色系光的螢光。藉由以YAG構成螢光體陶瓷層20,而簡單地實現將在波長490nm以上580nm以下的範圍具有螢光峰波長之螢光放出的螢光體陶瓷層20。In the present embodiment, the wavelength-converted light emitted from the phosphor ceramic layer 20 includes fluorescent light of yellow-based light. The phosphor ceramic layer 20 absorbs, for example, light having a wavelength of 380 nm to 490 nm and emits fluorescent light having a fluorescence peak wavelength in a range of 490 nm to 580 nm. By forming the phosphor ceramic layer 20 with YAG, the phosphor ceramic layer 20 that emits fluorescence having a fluorescence peak wavelength in the range of wavelengths from 490 nm to 580 nm can be easily realized.

從螢光體陶瓷層20放出的波長轉換光之色度圖的x座標,宜為0.415以下,更宜為0.410以下,進一步宜為0.408以下。若從螢光體陶瓷層20放出的波長轉換光之色度圖的x座標為上述數值,則螢光體陶瓷層20的熱淬滅(temperature quenching)變小,故可實現發光效率高之螢光體陶瓷層20。The x-coordinate of the chromaticity diagram of the wavelength-converted light emitted from the phosphor ceramic layer 20 is preferably 0.415 or less, more preferably 0.410 or less, and further preferably 0.408 or less. If the x-coordinate of the chromaticity diagram of the wavelength-converted light emitted from the phosphor ceramic layer 20 is the above-mentioned value, the thermal quenching of the phosphor ceramic layer 20 becomes small, so that a phosphor with high luminous efficiency can be realized. Light body ceramic layer 20 .

螢光體陶瓷層20的密度,宜為理論密度之95%以上100%以下,更宜為理論密度之97%以上100%以下。此處,理論密度,係使層中的原子理想地配置之情況的密度。換而言之,理論密度,係假定為螢光體陶瓷層20中無空隙時的密度,為利用結晶構造計算出的值。例如,螢光體陶瓷層20的密度為99%之情況,剩下的1%相當於空隙。亦即,螢光體陶瓷層20的密度越高,則空隙越少。若螢光體陶瓷層20的密度為上述範圍,則螢光體陶瓷層20所放出的總螢光量增加,故可提供放射的光量更多之波長轉換元件1及投影機。The density of the phosphor ceramic layer 20 is preferably not less than 95% and not more than 100% of the theoretical density, more preferably not less than 97% and not more than 100% of the theoretical density. Here, the theoretical density is the density when atoms in the layer are ideally arranged. In other words, the theoretical density is assumed to be the density when there is no void in the phosphor ceramic layer 20 , and is a value calculated from the crystal structure. For example, when the density of the phosphor ceramic layer 20 is 99%, the remaining 1% corresponds to voids. That is, the higher the density of the phosphor ceramic layer 20, the fewer the voids. If the density of the phosphor ceramic layer 20 is within the above range, the total amount of fluorescent light emitted by the phosphor ceramic layer 20 increases, so that the wavelength conversion element 1 and the projector with a larger amount of emitted light can be provided.

此外,螢光體陶瓷層20的密度,宜為4.32g/cm3 以上4.55g/cm3 以下,更宜為4.41g/cm3 以上4.55g/cm3 以下。如本實施形態所示,以YAG構成螢光體陶瓷層20的情況,若螢光體陶瓷層20的密度為上述範圍,則螢光體陶瓷層20的密度分別成為理論密度之95%以上100%以下及97%以上100%以下。藉由使螢光體陶瓷層20的密度為上述範圍,而可將螢光體陶瓷層20吸收的激發光L1效率良好地轉換為螢光。亦即,實現發光效率高之螢光體陶瓷層20。In addition, the density of the phosphor ceramic layer 20 is preferably 4.32 g/cm 3 or more and 4.55 g/cm 3 or less, more preferably 4.41 g/cm 3 or more and 4.55 g/cm 3 or less. As shown in the present embodiment, when the phosphor ceramic layer 20 is formed of YAG, if the density of the phosphor ceramic layer 20 is within the above-mentioned range, the density of the phosphor ceramic layer 20 is 95% or more of the theoretical density and 100%. % below and above 97% and below 100%. By making the density of the phosphor ceramic layer 20 within the above-mentioned range, the excitation light L1 absorbed by the phosphor ceramic layer 20 can be efficiently converted into fluorescent light. That is, the phosphor ceramic layer 20 with high luminous efficiency is realized.

螢光體陶瓷層20的膜厚(z軸方向之長度),宜為50μm以上而未滿150μm,更宜為50μm以上而未滿120μm。此外,該螢光體陶瓷層的膜厚,若為70μm以上而未滿120μm則更佳,為80μm以上而未滿110μm則進一步更佳。The film thickness (length in the z-axis direction) of the phosphor ceramic layer 20 is preferably 50 μm or more and less than 150 μm, and more preferably 50 μm or more and less than 120 μm. In addition, the film thickness of the phosphor ceramic layer is more preferably 70 μm or more and less than 120 μm, and more preferably 80 μm or more and less than 110 μm.

進一步,防止反射層30,位於螢光體陶瓷層20的上方。Further, the anti-reflection layer 30 is located above the phosphor ceramic layer 20 .

防止反射層30,係防止,更具體而言,抑制激發光L1之反射的層。防止反射層30,降低波長轉換元件1中的激發光L1之反射率,使到達螢光體陶瓷層20的激發光L1之量增加。其結果,螢光體陶瓷層20可吸收的激發光L1之量亦增加,故螢光體陶瓷層20放出的螢光之量亦增加。亦即,藉由設置防止反射層30,而使螢光體陶瓷層20放出的螢光之量增加。The anti-reflection layer 30 is a layer that prevents, more specifically, suppresses reflection of the excitation light L1. The anti-reflection layer 30 reduces the reflectance of the excitation light L1 in the wavelength conversion element 1 and increases the amount of the excitation light L1 reaching the phosphor ceramic layer 20 . As a result, the amount of excitation light L1 that the phosphor ceramic layer 20 can absorb also increases, so the amount of fluorescent light emitted from the phosphor ceramic layer 20 also increases. That is, by providing the anti-reflection layer 30, the amount of fluorescent light emitted from the phosphor ceramic layer 20 is increased.

防止反射層30,例如亦可藉由介電膜、或較可見光範圍之光線的波長更小之周期的微細凹凸構造(所謂的蛾眼構造)等構成。以介電膜構成防止反射層30的情況,防止反射層30,宜包含無機化合物。此一情況,防止反射層30,包含從SiO2 、TiO2 、Al2 O3 、ZnO、Nb2 O5 及MgF等選出之一種以上的無機化合物。The anti-reflection layer 30 may be constituted by, for example, a dielectric film, a fine concavo-convex structure (so-called moth-eye structure) having a period smaller than the wavelength of light in the visible light range, or the like. When the anti-reflection layer 30 is formed of a dielectric film, the anti-reflection layer 30 preferably contains an inorganic compound. In this case, the anti-reflection layer 30 contains one or more inorganic compounds selected from SiO 2 , TiO 2 , Al 2 O 3 , ZnO, Nb 2 O 5 , and MgF.

此外,圖1及圖2中,顯示設置防止反射層30之構成,但波長轉換元件1,亦可不具備防止反射層30。1 and 2 , the configuration in which the anti-reflection layer 30 is provided is shown, but the wavelength conversion element 1 may not include the anti-reflection layer 30 .

基板10,為圓盤形狀的板材,係支持螢光體陶瓷層20及防止反射層30的基材。馬達4,俯視時設置於基板10之中央。如圖2所示,基板10,具備基板本體11、及光反射層12。The substrate 10 is a disc-shaped plate, and is a substrate supporting the phosphor ceramic layer 20 and the antireflection layer 30 . The motor 4 is disposed in the center of the substrate 10 in a plan view. As shown in FIG. 2 , the substrate 10 includes a substrate body 11 and a light reflection layer 12 .

基板本體11,宜以熱傳導率高之材料構成。例如,基板本體11,宜以熱傳導率較螢光體陶瓷層20更高之材料構成,但不限於此一形態。基板本體11,例如例示玻璃基板、石英基板、GaN基板、藍寶石基板、Si基板、金屬基板等。此外,基板本體11,亦可由PEN(聚對萘二甲酸乙二酯)薄膜、或PET(聚對苯二甲酸乙二酯)薄膜等樹脂構成。進一步,基板本體11為金屬基板的情況,基板本體11,由Al、Fe及Ti等金屬材料構成。The substrate body 11 is preferably made of a material with high thermal conductivity. For example, the substrate body 11 is preferably made of a material with higher thermal conductivity than the phosphor ceramic layer 20 , but is not limited to this form. The substrate body 11 is, for example, a glass substrate, a quartz substrate, a GaN substrate, a sapphire substrate, a Si substrate, a metal substrate, or the like. In addition, the substrate main body 11 may be formed of resin such as a PEN (polyethylene terephthalate) film or a PET (polyethylene terephthalate) film. Furthermore, when the substrate body 11 is a metal substrate, the substrate body 11 is made of metal materials such as Al, Fe, and Ti.

本實施形態中,基板本體11為由Al構成的金屬基板。Al熱傳導率高且輕量,故可提高基板本體11之散熱性,並減輕基板本體11之重量。基板本體11的厚度,例如為1.5mm以下。In this embodiment, the substrate body 11 is a metal substrate made of Al. Al has high thermal conductivity and light weight, so it can improve the heat dissipation of the substrate body 11 and reduce the weight of the substrate body 11 . The thickness of the substrate body 11 is, for example, 1.5 mm or less.

此外,基板10具有光反射面13。光反射面13,係螢光體陶瓷層20所位於之側的基板10之一面。本實施形態中,光反射面13,係由光反射層12包含之一面所構成。Further, the substrate 10 has a light reflecting surface 13 . The light reflecting surface 13 is a surface of the substrate 10 on the side where the phosphor ceramic layer 20 is located. In this embodiment, the light reflection surface 13 is constituted by one surface included in the light reflection layer 12 .

光反射面13,係將螢光體陶瓷層20放出的螢光予以反射之面。此外,光反射面13,亦反射在螢光體陶瓷層20中未轉換為螢光的激發光L1。光反射面13,將螢光及未轉換為螢光的激發光L1往上方反射。本實施形態中,螢光及激發光L1為可見光範圍的光線,故光反射面13的可見光反射率越高則光的損耗越少。具體而言,光反射面13的可見光反射率,宜為90%以上100%以下,更宜為95%以上100%以下。若光反射面13的可見光反射率為上述範圍,則將螢光及激發光L1往更上方反射,故往橫向(即平行於光反射面13之方向)的螢光及激發光L1之導波受到抑制,發光面積變得更小。因此,可提供光展量更小、光利用效率更高之波長轉換元件1及投影機。此外,光反射面13的490nm以上780nm以下之波長範圍的光線之反射率,宜為90%以上100%以下,更宜為95%以上100%以下。若光反射面13的490nm以上780nm以下之波長範圍的光線之反射率為上述範圍,則螢光往更上方反射,故往橫向的螢光之導波受到抑制,發光面積變得更小。因此,可提供光展量更小、光利用效率更高之波長轉換元件1及投影機。另,本實施形態中,可見光範圍,係波長380nm以上780nm以下之波長範圍。The light reflecting surface 13 is a surface reflecting the fluorescent light emitted from the phosphor ceramic layer 20 . In addition, the light reflecting surface 13 also reflects the excitation light L1 that has not been converted into fluorescent light in the phosphor ceramic layer 20 . The light reflecting surface 13 reflects the fluorescent light and the excitation light L1 that has not been converted into fluorescent light upward. In the present embodiment, since the fluorescent light and the excitation light L1 are light in the visible light range, the higher the visible light reflectance of the light reflecting surface 13 is, the less the loss of light is. Specifically, the visible light reflectance of the light reflecting surface 13 is preferably 90% or more and 100% or less, and more preferably 95% or more and 100% or less. If the visible light reflectance of the light reflecting surface 13 is in the above range, the fluorescent light and the excitation light L1 are reflected upward, so that the fluorescent light and the excitation light L1 are guided in the lateral direction (ie, the direction parallel to the light reflecting surface 13 ). Being suppressed, the light emitting area becomes smaller. Therefore, the wavelength conversion element 1 and the projector with smaller etendue and higher light utilization efficiency can be provided. In addition, the reflectance of light in the wavelength range of 490 nm to 780 nm of the light reflecting surface 13 is preferably 90% or more and 100% or less, more preferably 95% or more and 100% or less. If the reflectance of light in the wavelength range from 490 nm to 780 nm of the light reflecting surface 13 is in the above range, the fluorescent light is reflected further upward, so that the guided wave of the fluorescent light in the lateral direction is suppressed, and the light emitting area becomes smaller. Therefore, the wavelength conversion element 1 and the projector with smaller etendue and higher light utilization efficiency can be provided. In addition, in this embodiment, the visible light range is a wavelength range of 380 nm or more and 780 nm or less.

光反射層12,若可將螢光及未轉換為螢光的激發光L1往上方反射,則以何種材料構成皆可。本實施形態中,光反射層12,係以光散射性粒子121、及使光散射性粒子121分散的黏結劑122構成之複合層。亦即,光反射層12,具有光漫射性(光散射性),藉由光漫射將螢光及未轉換為螢光的激發光L1往上方反射。The light reflection layer 12 may be formed of any material as long as it can reflect the fluorescent light and the excitation light L1 that has not been converted into fluorescent light upward. In the present embodiment, the light reflection layer 12 is a composite layer composed of the light scattering particles 121 and the binder 122 in which the light scattering particles 121 are dispersed. That is, the light reflection layer 12 has a light diffusing property (light scattering property), and reflects the fluorescent light and the excitation light L1 that is not converted into the fluorescent light upward by the light diffusing.

光反射層12,藉由光散射性粒子121與黏結劑122之折射率差而使光線擴散。光散射性粒子121,例如為由無機化合物或樹脂材料構成之填料或白色粒子。更具體而言,光散射性粒子121,可為SiO2 、TiO2 、Al2 O3 、ZnO、Nb2 O5 、ZrO2 及CaCO3 等無機化合物,亦可為苯乙烯系樹脂及丙烯酸系樹脂等樹脂材料。此外,黏結劑122,宜由具有透光性之丙烯酸系樹脂及矽氧系樹脂等樹脂材料構成。The light reflection layer 12 diffuses light by the difference in refractive index between the light scattering particles 121 and the binder 122 . The light-scattering particles 121 are, for example, fillers or white particles made of inorganic compounds or resin materials. More specifically, the light-scattering particles 121 may be inorganic compounds such as SiO 2 , TiO 2 , Al 2 O 3 , ZnO, Nb 2 O 5 , ZrO 2 , and CaCO 3 , or may be styrene-based resins and acrylics Resin and other resin materials. In addition, the adhesive 122 is preferably composed of resin materials such as acrylic resin and silicone resin having light transmittance.

藉由設置光反射層12,而可提高光反射面13的可見光反射率。進一步,藉由以包含光散射性粒子121的複合層構成光反射層12,而可為更提高光反射面13的可見光反射率。亦即,可更為抑制波長轉換元件1中之光的損耗。By providing the light reflection layer 12 , the visible light reflectance of the light reflection surface 13 can be improved. Furthermore, by forming the light reflection layer 12 with a composite layer including the light scattering particles 121 , the visible light reflectance of the light reflection surface 13 can be further improved. That is, the loss of light in the wavelength conversion element 1 can be more suppressed.

另,光反射層12,亦可為由具有光反射性之金屬構成的金屬層。例如,該金屬,為Ag、Al、或包含其等任一者的合金。光反射層12,宜將該金屬藉由乾式處理或濕式處理而形成。於此等情況中,亦可期待與以包含光散射性粒子121的複合層構成光反射層12之情況相同的作用效果。In addition, the light reflection layer 12 may be a metal layer made of a metal having light reflection properties. For example, the metal is Ag, Al, or an alloy containing any of these. The light reflection layer 12 is preferably formed by dry processing or wet processing of the metal. In these cases, the same effects as in the case where the light reflection layer 12 is constituted by a composite layer including the light scattering particles 121 can be expected.

此外,亦可於光反射層12與螢光體陶瓷層20之間,設置接合層。藉由成為此等構成,可使光反射層12與螢光體陶瓷層20更為密接,故可將在螢光體陶瓷層20產生的熱,經由光反射層12,更有效率地往基板本體11傳導。因此,可提供螢光體陶瓷層20的熱淬滅少、效率高之波長轉換元件1。接合層,宜由矽氧系樹脂或環氧系樹脂等透明材料構成。此外,接合層的厚度,宜為1μm以上而未滿100μm,更宜為1μm以上而未滿20μm。In addition, a bonding layer may also be provided between the light reflection layer 12 and the phosphor ceramic layer 20 . With such a configuration, the light reflection layer 12 and the phosphor ceramic layer 20 can be brought into closer contact, so that the heat generated in the phosphor ceramic layer 20 can be transferred to the substrate more efficiently through the light reflection layer 12 The body 11 conducts. Therefore, the wavelength conversion element 1 with less thermal quenching of the phosphor ceramic layer 20 and high efficiency can be provided. The bonding layer is preferably made of a transparent material such as silicone resin or epoxy resin. In addition, the thickness of the bonding layer is preferably 1 μm or more and less than 100 μm, and more preferably 1 μm or more and less than 20 μm.

另,圖1及圖2中,顯示設置光反射層12之構成,但波長轉換元件1,亦可不具備光反射層12。此一情況,基板本體11之表面,成為光反射面13。1 and 2 , the configuration in which the light reflection layer 12 is provided is shown, but the wavelength conversion element 1 may not include the light reflection layer 12 . In this case, the surface of the substrate body 11 becomes the light reflecting surface 13 .

[投影機的構成] 如同上述地構成之波長轉換元件1,使用在圖3及圖4所示之投影機100。圖3係顯示本實施形態之投影機100的外觀之立體圖。圖4係本實施形態之投影機100的光學系統之示意圖。以下,利用圖3及圖4,針對本實施形態之投影機100的構成予以說明。[Configuration of the projector] The wavelength conversion element 1 configured as described above is used in the projector 100 shown in FIGS. 3 and 4 . FIG. 3 is a perspective view showing the appearance of the projector 100 of the present embodiment. FIG. 4 is a schematic diagram of the optical system of the projector 100 of the present embodiment. Hereinafter, the configuration of the projector 100 according to the present embodiment will be described with reference to FIGS. 3 and 4 .

如圖3及圖4所示,本實施形態之投影機100,具備:光源3、分光鏡(Dichroic mirror)5、波長轉換元件1、顯示元件6、投射光學構件7、及反射鏡8。As shown in FIGS. 3 and 4 , the projector 100 of the present embodiment includes a light source 3 , a dichroic mirror 5 , a wavelength conversion element 1 , a display element 6 , a projection optical member 7 , and a reflection mirror 8 .

光源3,例如為半導體雷射光源或LED(Light Emitting Diode,發光二極體)光源,藉由驅動電流驅動,放出既定顏色(波長)的光線。The light source 3 is, for example, a semiconductor laser light source or an LED (Light Emitting Diode) light source, and is driven by a driving current to emit light of a predetermined color (wavelength).

本實施形態中,光源3為半導體雷射光源。另,光源3所具備之半導體雷射元件,例如為由氮化物半導體材料構成之GaN系半導體雷射元件(雷射晶片)。本實施形態中,係半導體雷射光源之光源3,為多晶片類型之發光裝置。In this embodiment, the light source 3 is a semiconductor laser light source. The semiconductor laser element included in the light source 3 is, for example, a GaN-based semiconductor laser element (laser chip) made of a nitride semiconductor material. In this embodiment, the light source 3, which is a semiconductor laser light source, is a multi-chip type light-emitting device.

作為一例,光源3,將在波長380nm以上490nm以下具有峰值波長之近紫外線至藍光範圍內的雷射光放出。更具體而言,光源3,放出峰值波長為445nm的藍色光。本實施形態之光源3為激發光源的一例。光源3所放出的雷射光,到達分光鏡5。As an example, the light source 3 emits laser light in the range from near-ultraviolet to blue light having a wavelength of 380 nm or more and 490 nm or less. More specifically, the light source 3 emits blue light having a peak wavelength of 445 nm. The light source 3 of the present embodiment is an example of an excitation light source. The laser light emitted by the light source 3 reaches the beam splitter 5 .

分光鏡5,對於光源3的光軸以45度的角度配置。本實施形態之分光鏡5,係使藍色光的一部分透射並將另一部分反射,使黃色系螢光透射之分光鏡。The beam splitter 5 is arranged at an angle of 45 degrees with respect to the optical axis of the light source 3 . The beam splitter 5 of the present embodiment is a beam splitter that transmits a part of blue light and reflects the other part, and transmits yellow fluorescent light.

亦即,分光鏡5,具有使從光源3放出的雷射光之波長範圍的光線反射及透射之特性。因而,從光源3放出的雷射光之一部分,不改變進行方向地透射過分光鏡5;該雷射光之另一部分,藉由分光鏡5反射,使進行方向變更90°,前往波長轉換元件1。That is, the beam splitter 5 has the characteristics of reflecting and transmitting light in the wavelength range of the laser light emitted from the light source 3 . Therefore, a part of the laser light emitted from the light source 3 is transmitted through the beam splitter 5 without changing the direction of travel; the other part of the laser light is reflected by the beam splitter 5 , and the direction of travel is changed by 90° to the wavelength conversion element 1 .

此處,從光源3放出的雷射光之另一部分,作為激發光L1,到達波長轉換元件1。波長轉換元件1,接收激發光L1,放出包含螢光的反射光L2。更具體而言,反射光L2,包含藉由波長轉換元件1所具備之螢光體陶瓷層20及光反射面13分別波長轉換及反射的光線。更具體而言,反射光L2為,包含以螢光體陶瓷層20產生的黃色系螢光、及未以螢光體陶瓷層20轉換為的螢光之係藍色光的激發光L1之光線。然則,反射光L2中,螢光所占之比例高,故反射光L2為黃色系光。Here, the other part of the laser light emitted from the light source 3 reaches the wavelength conversion element 1 as the excitation light L1 . The wavelength conversion element 1 receives excitation light L1 and emits reflected light L2 including fluorescent light. More specifically, the reflected light L2 includes light wavelength-converted and reflected by the phosphor ceramic layer 20 and the light reflecting surface 13 included in the wavelength conversion element 1 , respectively. More specifically, the reflected light L2 is light including excitation light L1 including yellow-based fluorescent light generated by the phosphor ceramic layer 20 and blue light of fluorescent light that is not converted by the phosphor ceramic layer 20 . However, in the reflected light L2, the ratio of fluorescent light is high, so the reflected light L2 is yellow light.

不改變進行方向地透射過分光鏡5的雷射光,作為透射光L12,到達反射鏡8,藉由反射鏡8正反射,前往分光鏡5的另一方之面。而後,該透射光L12,藉由分光鏡5的另一方之面反射,使進行方向變更90°,前往顯示元件6。The laser light that has passed through the beam splitter 5 without changing its advancing direction reaches the reflector 8 as transmitted light L12 , is specularly reflected by the reflector 8 , and travels to the other side of the beam splitter 5 . Then, the transmitted light L12 is reflected by the other surface of the dichroic mirror 5 , and the traveling direction is changed by 90° to travel to the display element 6 .

此外,反射光L2,到達分光鏡5。此時,分光鏡5,對於反射光L2之光軸以45度的角度配置,此外,使黃色系螢光透射。因此,到達至分光鏡5的反射光L2之進行方向未變化。Further, the reflected light L2 reaches the beam splitter 5 . At this time, the beam splitter 5 is arranged at an angle of 45 degrees with respect to the optical axis of the reflected light L2, and also transmits yellow fluorescent light. Therefore, the traveling direction of the reflected light L2 reaching the beam splitter 5 does not change.

藉此,如圖4所示,反射光L2之光軸,與透射光L12之光軸一致,朝向顯示元件6。此時,反射光L2為黃色系光,透射光L12為藍色光,故此等光線所複合出的光線為白色光。亦即,從分光鏡5前往顯示元件6的光線為白色光。Thereby, as shown in FIG. 4 , the optical axis of the reflected light L2 coincides with the optical axis of the transmitted light L12 and is directed toward the display element 6 . At this time, the reflected light L2 is yellow light, and the transmitted light L12 is blue light, so the light combined with these light rays is white light. That is, the light ray going from the beam splitter 5 to the display element 6 is white light.

反射光L2與透射光L12的混合光即白色光,前往顯示元件6。此處,若反射光L2為光展量大的光,則相較於顯示元件6的尺寸,向顯示元件6照射的反射光L2之尺寸變大。因此,未照射至顯示元件6之無效(即無法利用)的光成分變多。The mixed light of the reflected light L2 and the transmitted light L12 , that is, white light, travels to the display element 6 . Here, if the reflected light L2 is light with a large etendue, the size of the reflected light L2 irradiated to the display element 6 becomes larger than the size of the display element 6 . Therefore, there are many light components that are not irradiated to the display element 6 and that are not used (that is, cannot be used).

顯示元件6,係控制通過開口部2a的光線(白色光)而將其作為映像輸出之略平面狀的元件。換而言之,顯示元件6,生成映像用的光線。顯示元件6,具體而言,為具有DMD(Digital Micromirror Device,數位微鏡元件)的DLP(Digital Light Processing,數位光處理)元件。此外,例如,顯示元件6,亦可為反射型液晶面板等。另,於顯示元件6與分光鏡5之間,亦可具備複眼透鏡、偏光轉換元件及鏡桿等。The display element 6 is a substantially flat element that controls the light (white light) passing through the opening 2a and outputs it as a picture. In other words, the display element 6 generates light for images. The display element 6 is, specifically, a DLP (Digital Light Processing, digital light processing) element having a DMD (Digital Micromirror Device, digital micromirror element). In addition, for example, the display element 6 may be a reflective liquid crystal panel or the like. In addition, between the display element 6 and the beam splitter 5, a fly-eye lens, a polarization conversion element, a mirror rod, and the like may be provided.

由顯示元件6生成之映像用的光,藉由投射光學構件7,成為往屏幕放大投射的投射光。The light for images generated by the display element 6 is projected by the projection optical member 7 to be enlarged and projected onto the screen.

投影機100,僅將照射至顯示元件6的光線利用作為投射光。亦即,反射光L2之光展量越小,可作為投影機100之投射光而利用的光線越多。The projector 100 uses only the light irradiated on the display element 6 as projection light. That is, the smaller the etendue of the reflected light L2 is, the more light can be used as the projection light of the projector 100 .

[波長轉換元件之光行為] 此處,針對波長轉換元件1之光行為,利用本實施形態與比較例予以說明。[Light behavior of wavelength conversion element] Here, the optical behavior of the wavelength conversion element 1 will be described using this embodiment and a comparative example.

圖5A係本實施形態之波長轉換元件1與孔隙構件2的示意圖。圖5B係本實施形態的比較例之波長轉換元件1x與孔隙構件2的示意圖。另,此處為了方便,利用孔隙構件2、波長轉換元件1與1x、激發光L1、反射光L2予以說明。FIG. 5A is a schematic diagram of the wavelength conversion element 1 and the aperture member 2 of the present embodiment. FIG. 5B is a schematic diagram of the wavelength conversion element 1x and the aperture member 2 in the comparative example of the present embodiment. In addition, here, for convenience, the aperture member 2, the wavelength conversion elements 1 and 1x, the excitation light L1, and the reflected light L2 are used for description.

此處,孔隙構件2為用於評價反射光L2之光展量的大小之構件。孔隙構件2為光吸收構件,係於孔隙構件2之中央部設置有開口部2a的構件。若通過孔隙構件2之開口部2a的光成分之比例相對地多,則可說是反射光L2之光展量小。Here, the aperture member 2 is a member for evaluating the magnitude of the etendue of the reflected light L2. The aperture member 2 is a light absorbing member, and is a member provided with an opening portion 2 a in the central portion of the aperture member 2 . When the ratio of the light component passing through the opening 2a of the aperture member 2 is relatively large, it can be said that the etendue of the reflected light L2 is small.

比較例之波長轉換元件1x,除了使螢光體陶瓷層20x的厚度較本實施形態之螢光體陶瓷層20更厚(例如200μm)的點以外,為與本實施形態之波長轉換元件1相同的構成。The wavelength conversion element 1x of the comparative example is the same as the wavelength conversion element 1 of the present embodiment except that the thickness of the phosphor ceramic layer 20x is thicker (for example, 200 μm) than that of the phosphor ceramic layer 20 of the present embodiment. composition.

螢光體陶瓷層20及20x的密度為4.41g/cm3 以上4.55g/cm3 以下,密度高。亦即,螢光體陶瓷層20及20x中,空隙少而不易發生光散射,故光容易往層之平面方向(亦即,x軸方向或y軸方向)前進,容易發生所謂的導光。The density of the phosphor ceramic layers 20 and 20x is 4.41 g/cm 3 or more and 4.55 g/cm 3 or less, and the density is high. That is, in the phosphor ceramic layers 20 and 20x, there are few voids and light scattering is unlikely to occur. Therefore, light tends to travel in the plane direction of the layers (ie, the x-axis direction or the y-axis direction), and so-called light guiding is likely to occur.

首先,利用圖5A,針對本實施形態之波長轉換元件1予以說明。First, the wavelength conversion element 1 of the present embodiment will be described with reference to FIG. 5A .

若如本實施形態之螢光體陶瓷層20般地厚度非常薄(50μm以上120μm以下),則可將從激發光L1入射至反射光L2射出為止的層之平面方向(此處為x軸方向)的距離D更為縮短。換而言之,本實施形態中,螢光體陶瓷層20之螢光的發光面積(發光點徑)非常小。因此,如圖5A所示,藉由光反射面13反射並從螢光體陶瓷層20射出的反射光L2,容易通過孔隙構件2之開口部2a。通過開口部2a的光線,如同上述,可作為經由顯示元件6及投射光學構件7往屏幕放大投射的光而利用。If the thickness is very thin (50 μm or more and 120 μm or less) like the phosphor ceramic layer 20 of the present embodiment, the plane direction (here, the x-axis direction) of the layer from the incident of the excitation light L1 to the output of the reflected light L2 can be achieved. ), the distance D is even shorter. In other words, in the present embodiment, the fluorescent light-emitting area (light-emitting spot diameter) of the phosphor ceramic layer 20 is very small. Therefore, as shown in FIG. 5A , the reflected light L2 reflected by the light reflecting surface 13 and emitted from the phosphor ceramic layer 20 easily passes through the opening 2 a of the aperture member 2 . The light passing through the opening 2a can be used as the light to be enlarged and projected onto the screen via the display element 6 and the projection optical member 7 as described above.

亦即,本實施形態中,波長轉換元件1所具備之螢光體陶瓷層20的厚度非常薄,故可使螢光的發光面積非常小。因此,通過孔隙構件2之開口部2a的光線多,故可作為投影機100之投射光而利用的光線多。亦即,藉由上述構成,實現光利用效率高之波長轉換元件1。進一步,藉由具備此等波長轉換元件1,而實現光利用效率高之投影機100。That is, in this embodiment, the thickness of the phosphor ceramic layer 20 included in the wavelength conversion element 1 is very thin, so that the luminescent area of the fluorescent light can be made very small. Therefore, since there are many light rays passing through the openings 2 a of the aperture member 2 , many light rays can be used as the projection light of the projector 100 . That is, with the above configuration, the wavelength conversion element 1 with high light utilization efficiency is realized. Furthermore, by including these wavelength conversion elements 1, the projector 100 with high light utilization efficiency is realized.

接著,利用圖5B,針對比較例之波長轉換元件1x予以說明。Next, the wavelength conversion element 1x of the comparative example will be described with reference to FIG. 5B.

若如比較例之螢光體陶瓷層20x般厚度非常厚(200μm),則激發光L1入射至反射光L2x射出為止的層之平面方向的距離Dx變得更長。換而言之,比較例中,螢光體陶瓷層20x之螢光的發光面積(發光點徑)變大。因此,如圖5B所示,藉由光反射面13反射而從螢光體陶瓷層20x射出的反射光L2x,容易受到孔隙構件2遮蔽。因此,比較例之波長轉換元件1x,光利用效率低。When the thickness is very thick (200 μm) like the phosphor ceramic layer 20x of the comparative example, the distance Dx in the plane direction of the layer from which the excitation light L1 is incident and the reflected light L2x is emitted becomes longer. In other words, in the comparative example, the light-emitting area (light-emitting spot diameter) of the fluorescent light of the phosphor ceramic layer 20x is increased. Therefore, as shown in FIG. 5B , the reflected light L2 x emitted from the phosphor ceramic layer 20 x by the reflection by the light reflecting surface 13 is easily shielded by the aperture member 2 . Therefore, the wavelength conversion element 1x of the comparative example has low light utilization efficiency.

此外,如同上述,於本實施形態中,藉由設置光反射層12,進一步以包含光散射性粒子121的複合層構成光反射層12,而可更為提高光反射面13的可見光反射率。藉此,可更為抑制波長轉換元件1中之光的損耗,故實現光利用效率高之波長轉換元件1。In addition, as described above, in this embodiment, by providing the light reflecting layer 12 and further comprising the light reflecting layer 12 with a composite layer including the light scattering particles 121 , the visible light reflectance of the light reflecting surface 13 can be further improved. Thereby, the loss of light in the wavelength conversion element 1 can be further suppressed, so that the wavelength conversion element 1 with high light utilization efficiency can be realized.

[實施例] 此處,於本實施形態的實施例1~3與比較例之波長轉換元件中,針對製造方法與光利用效率予以說明。[Example] Here, in the wavelength conversion elements of Examples 1 to 3 and the comparative example of the present embodiment, the manufacturing method and the light utilization efficiency will be described.

首先,針對螢光體陶瓷層之製造方法予以記述。First, the manufacturing method of the phosphor ceramic layer will be described.

實施例1~3及比較例之螢光體陶瓷層,皆由以(Y0.9953 Ce0.00473 Al5 O12 表示之第1結晶相構成。此外,實施例1~3及比較例之螢光體陶瓷層,皆以Ce3 活化螢光體構成。The phosphor ceramic layers of Examples 1 to 3 and Comparative Example are all composed of a first crystal phase represented by (Y 0.9953 Ce 0.0047 ) 3 Al 5 O 12 . In addition, the phosphor ceramic layers of Examples 1 to 3 and the comparative example are all composed of Ce 3 + activated phosphor.

實施例1~3及比較例之螢光體陶瓷層,作為化合物粉末,將以下三種作為原料使用。具體而言,使用Y2 O3 (氧化釔,純度3N,日本YTTRIUM株式會社)、Al2 O3 (氧化鋁,純度3N,住友化學株式會社)及CeO2 (氧化鈰,純度3N,日本YTTRIUM株式會社)。The phosphor ceramic layers of Examples 1 to 3 and Comparative Examples used the following three kinds of raw materials as compound powders. Specifically, Y 2 O 3 (yttrium oxide, purity 3N, Japan YTTRIUM Co., Ltd.), Al 2 O 3 (alumina, 3N purity, Sumitomo Chemical Co., Ltd.), and CeO 2 (cerium oxide, 3N purity, Japan YTTRIUM Co., Ltd.) were used. Co., Ltd.).

首先,秤量上述原料,使其成為化學計量組成之化合物(Y0.9953 Ce0.00473 Al5 O12 。而後,將秤量出的原料與氧化鋁製的球珠(直徑10mm),投入至塑膠製的壺。氧化鋁製的球珠之量,為充填塑膠製的壺之容積的1/3程度之量。其後,將純水投入至塑膠製的壺,利用壺旋轉裝置(日陶化學株式會社製,BALL MILL ANZ-51S),使原料與純水混合。將此一混合實施12小時。如此地,獲得漿狀的混合原料。First, the above-mentioned raw materials are weighed so as to be a compound of stoichiometric composition (Y 0.9953 Ce 0.0047 ) 3 Al 5 O 12 . Then, the weighed raw materials and alumina balls (10 mm in diameter) were put into a plastic pot. The amount of alumina balls is about 1/3 of the volume of the plastic pot. Then, pure water was put into the plastic pot, and the raw material and the pure water were mixed using a pot rotating device (BALL MILL ANZ-51S, manufactured by Nitto Chemical Co., Ltd.). This mixing was carried out for 12 hours. In this way, a slurry-like mixed raw material was obtained.

將漿狀的混合原料,利用乾燥機予以乾燥。具體而言,以覆蓋金屬製的盤之內壁的方式敷設Naflon(註冊商標)片,使混合原料流入Naflon(註冊商標)片的上方。將金屬製的盤、Naflon(註冊商標)片、混合原料,以設定為150℃之乾燥機處理8小時,予以乾燥。其後,將乾燥後的混合原料回收,利用噴霧乾燥裝置將混合原料造粒。另,造粒時,作為黏著劑(黏結劑),使用聚乙烯醇。The slurry-like mixed raw materials were dried with a dryer. Specifically, the Naflon (registered trademark) sheet was laid so as to cover the inner wall of the metal disk, and the mixed raw material was made to flow over the Naflon (registered trademark) sheet. The metal pan, the Naflon (registered trademark) sheet, and the mixed raw material were treated with a dryer set to 150° C. for 8 hours and dried. Then, the mixed raw material after drying is recovered, and the mixed raw material is granulated by a spray drying apparatus. In addition, at the time of granulation, polyvinyl alcohol was used as a binder (binder).

將造成粒的混合原料,利用電動油壓加壓機(理研精機株式會社製,EMP-5)與圓筒型之模具(外徑58mm、內徑38mm、高度130mm),暫時成型為圓筒型。使成型時的壓力為5MPa/cm2 。而後,利用冷均壓加壓裝置,使暫時成型後之成型體正式成型。使正式成型時的壓力為300MPa。另,將正式成型後之成型體,以去除造粒時使用的黏著劑(黏結劑)為目的,施行加熱處理(去黏結劑處理)。使加熱處理的溫度為500℃。此外,使加熱處理的時間為10小時。The granulated mixed raw material is temporarily formed into a cylindrical shape using an electric hydraulic press (manufactured by Riken Seiki Co., Ltd., EMP-5) and a cylindrical mold (outer diameter 58mm, inner diameter 38mm, height 130mm). . The pressure during molding was 5 MPa/cm 2 . Then, using a cold equalizing and pressing device, the once-molded molded body is fully molded. The pressure at the time of main molding was 300 MPa. In addition, the molded body after the main molding is subjected to heat treatment (binder removal treatment) for the purpose of removing the binder (binder) used in the granulation. The temperature of the heat treatment was set to 500°C. In addition, the time for the heat treatment was set to 10 hours.

利用管狀氣體環境爐,鍛燒加熱處理後之成型體。使鍛燒溫度為1675℃。此外,使鍛燒時間為4小時。使鍛燒氣體環境,為氮與氫的混合氣體環境。另,鍛燒後之鍛燒物的外徑及內徑,分別為43mm及29mm。The formed body after heat treatment is calcined in a tubular gas atmosphere furnace. The calcination temperature was set to 1675°C. In addition, the calcination time was made 4 hours. The calcining gas atmosphere is a mixed gas atmosphere of nitrogen and hydrogen. In addition, the outer diameter and inner diameter of the calcined product after calcination were 43 mm and 29 mm, respectively.

利用多線鋸,將鍛燒後的圓筒型之鍛燒物切片。切成片的圓筒型之鍛燒物的厚度,約為700μm。Using a multi-wire saw, the calcined cylindrical calcined material was sliced. The thickness of the cylindrical calcined product cut into pieces was about 700 μm.

利用研磨裝置,研磨切片後之鍛燒物,施行鍛燒物的厚度之調整。藉由施行此一調整,使鍛燒物成為螢光體陶瓷層。螢光體陶瓷層的厚度,在實施例1為53μm,在實施例2為75μm,在實施例3為106μm,在比較例為206μm。The calcined material after slicing is ground by a grinding device, and the thickness of the calcined material is adjusted. By performing this adjustment, the calcined product becomes a phosphor ceramic layer. The thickness of the phosphor ceramic layer was 53 μm in Example 1, 75 μm in Example 2, 106 μm in Example 3, and 206 μm in Comparative Example.

另,實施例1~3及比較例之螢光體陶瓷層的外徑及內徑,分別為43mm及29mm。此外,實施例1~3及比較例之螢光體陶瓷層,為深黃色。In addition, the outer diameter and inner diameter of the phosphor ceramic layers of Examples 1 to 3 and the comparative example were 43 mm and 29 mm, respectively. In addition, the phosphor ceramic layers of Examples 1 to 3 and the comparative example were dark yellow.

接著,針對螢光體陶瓷層之評價予以說明。Next, the evaluation of the phosphor ceramic layer will be described.

首先,利用阿基米德法,評價實施例1~3及比較例之螢光體陶瓷層的密度。實施例1~3及比較例之螢光體陶瓷層的密度,皆為4.49g/cm3 。此外,實施例1~3及比較例之螢光體陶瓷層的密度,皆為Y3 Al5 O12 的理論密度(4.55g/cm3 )之98.7%。亦即,實施例1~3及比較例之螢光體陶瓷層的密度,皆為Y3 Al5 O12 的理論密度之97%以上100%以下。First, the density of the phosphor ceramic layers of Examples 1 to 3 and Comparative Example was evaluated by the Archimedes method. The densities of the phosphor ceramic layers of Examples 1 to 3 and Comparative Example were all 4.49 g/cm 3 . In addition, the densities of the phosphor ceramic layers of Examples 1 to 3 and the comparative example were all 98.7% of the theoretical density (4.55 g/cm 3 ) of Y 3 Al 5 O 12 . That is, the densities of the phosphor ceramic layers of Examples 1 to 3 and the comparative example are all 97% or more and 100% or less of the theoretical density of Y 3 Al 5 O 12 .

接著,針對波長轉換元件的製造方法予以記述。Next, a method of manufacturing the wavelength conversion element will be described.

首先,準備Al之圓盤狀的基板本體(直徑50mm、厚度0.5mm)。接著,利用分注裝置,於基板本體塗步包含分散有TiO2 粒子之矽氧系樹脂的光反射層,使其成為圓形(外徑46mm、內徑30mm)。此處,光反射層所含之矽氧系樹脂,亦發揮將螢光體陶瓷層與基板本體貼合之黏接劑的功能。First, an Al disk-shaped substrate body (50 mm in diameter, 0.5 mm in thickness) was prepared. Next, using a dispensing apparatus, a light reflection layer containing a silicone-based resin dispersed with TiO 2 particles was coated on the substrate body to make it circular (outer diameter 46 mm, inner diameter 30 mm). Here, the silicon-oxygen resin contained in the light reflection layer also functions as an adhesive for bonding the phosphor ceramic layer to the substrate body.

其後,將螢光體陶瓷層,以與塗布為圓形的光反射層重合之方式配置。此處,使光反射層的厚度成為約50μm,藉由金屬製的治具,固定螢光體陶瓷層。其後,藉由利用乾燥機施行加熱處理,而使光反射層硬化。此時之加熱處理的溫度為150℃。另,光反射層所包含之一面即光反射面的可見光反射率,為95%以上。After that, the phosphor ceramic layer was arranged so as to overlap with the light reflection layer coated in a circular shape. Here, the thickness of the light reflection layer was set to about 50 μm, and the phosphor ceramic layer was fixed with a metal jig. Then, the light reflection layer is hardened by performing heat processing with a dryer. The temperature of the heat treatment at this time was 150°C. In addition, the visible light reflectance of the light reflection surface, which is one surface included in the light reflection layer, is 95% or more.

如此地,可獲得分別具備上述實施例1~3及比較例之螢光體陶瓷層與基板的實施例1~3及比較例之波長轉換元件。In this way, the wavelength conversion elements of Examples 1 to 3 and Comparative Examples each including the phosphor ceramic layers and substrates of Examples 1 to 3 and Comparative Examples described above were obtained.

進一步,針對波長轉換元件的評價予以說明。Further, evaluation of the wavelength conversion element will be described.

利用反射型雷射激發方式之對於波長轉換元件的評價裝置,評價實施例1~3及比較例之波長轉換元件。具體而言,該評價裝置中,對旋轉之波長轉換元件照射激發光(雷射光),藉由功率計評價從波長轉換元件放出的螢光之螢光能量。雷射光之波長、輸出及照射點徑(1/e2 ),分別為455nm、70W及1.2mm。另,此雷射光為高斯光束。此外,波長轉換元件的旋轉速度為7200rpm。於該評價裝置設置孔隙構件,該孔隙構件遮蔽從波長轉換元件放出的螢光之一部分。此時,例如,波長轉換元件與孔隙構件的距離,為3mm以上100mm以下;孔隙構件之開口部,係開口徑5mm以上10mm以下之圓形的孔。The wavelength conversion elements of Examples 1 to 3 and the comparative example were evaluated by an evaluation device for wavelength conversion elements of a reflection type laser excitation method. Specifically, in this evaluation apparatus, excitation light (laser light) is irradiated to the rotating wavelength conversion element, and the fluorescence energy of the fluorescence emitted from the wavelength conversion element is evaluated by a power meter. The wavelength, output and irradiation spot diameter (1/e 2 ) of the laser light are 455nm, 70W and 1.2mm, respectively. In addition, the laser light is a Gaussian beam. In addition, the rotational speed of the wavelength conversion element was 7200 rpm. An aperture member is provided in the evaluation device, and the aperture member shields a part of the fluorescence emitted from the wavelength conversion element. In this case, for example, the distance between the wavelength conversion element and the aperture member is 3 mm or more and 100 mm or less, and the opening of the aperture member is a circular hole with an opening diameter of 5 mm or more and 10 mm or less.

圖6係顯示本實施形態的實施例1~3及比較例之波長轉換元件的評價結果之圖。具體而言,於圖6,顯示實施例1~3及比較例之波長轉換元件的螢光能量相對值(通過開口部後)、螢光能量相對值(通過開口部前)及結合效率。FIG. 6 is a graph showing the evaluation results of the wavelength conversion elements of Examples 1 to 3 and Comparative Example of the present embodiment. Specifically, FIG. 6 shows the relative value of fluorescence energy (after passing through the opening), the relative value of fluorescence energy (before passing through the opening), and the binding efficiency of the wavelength conversion elements of Examples 1 to 3 and Comparative Example.

此處,螢光能量相對值(通過開口部後),係通過孔隙構件的開口部後之各個波長轉換元件放出的螢光之螢光能量的相對值。另,使通過開口部後的比較例之波長轉換元件放出的螢光之螢光能量為100%。Here, the relative value of the fluorescence energy (after passing through the opening) is the relative value of the fluorescence energy of the fluorescence emitted by each wavelength conversion element after passing through the opening of the aperture member. In addition, the fluorescence energy of the fluorescence emitted from the wavelength conversion element of the comparative example after passing through the opening was set to 100%.

此外,螢光能量相對值(通過開口部前),係通過孔隙構件之開口部前的各個波長轉換元件放出的螢光之螢光能量的相對值。另,使通過開口部後的比較例之波長轉換元件放出的螢光之螢光能量為100%。In addition, the relative value of fluorescence energy (before passing through the opening) is the relative value of the fluorescence energy of the fluorescence emitted by each wavelength conversion element before passing through the opening of the aperture member. In addition, the fluorescence energy of the fluorescence emitted from the wavelength conversion element of the comparative example after passing through the opening was set to 100%.

此外,結合效率,係相對於螢光能量相對值(通過開口部前)之螢光能量相對值(通過開口部後)的比例。亦即,結合效率,係將螢光能量相對值(通過開口部後)除以螢光能量相對值(通過開口部前)的值。In addition, the binding efficiency is the ratio of the relative value of fluorescence energy (after passing through the opening) to the relative value of fluorescence energy (before passing through the opening). That is, the binding efficiency is a value obtained by dividing the relative value of fluorescence energy (after passing through the opening) by the relative value of fluorescence energy (before passing through the opening).

在投影機,將通過開口部後的螢光,作為投射光之一部分而利用。亦即,螢光能量相對值(通過開口部後)越大,則可說是能夠作為投影機之投射光而利用的螢光越多。In the projector, the fluorescent light after passing through the opening is used as a part of the projected light. That is, the larger the relative value of the fluorescent energy (after passing through the opening), the more fluorescent light that can be used as the projection light of the projector.

如圖6所示,實施例1、實施例2、實施例3及比較例之波長轉換元件的結合效率,分別為85%、86%、84%及81%。亦即,實施例之結合效率,皆較比較例之結合效率更高。結合效率越高,則表示產生的螢光中之通過開口部的光線越多,亦即,如圖5A及圖5B所示,表示波長轉換元件放出的螢光之發光面積越小。亦即,實施例1~3之波長轉換元件放出的螢光之發光面積,較比較例之波長轉換元件放出的螢光之發光面積更小,表示實施例之波長轉換元件光利用效率高。As shown in FIG. 6 , the combining efficiencies of the wavelength conversion elements of Example 1, Example 2, Example 3 and Comparative Example are 85%, 86%, 84% and 81%, respectively. That is, the combining efficiency of the examples is higher than that of the comparative example. The higher the binding efficiency, the more light passing through the openings in the generated fluorescent light, that is, the smaller the light emitting area of the fluorescent light emitted by the wavelength conversion element, as shown in FIGS. 5A and 5B . That is, the light emitting area of the fluorescent light emitted by the wavelength conversion element of Examples 1 to 3 is smaller than that of the fluorescent light emitted by the wavelength conversion element of the comparative example, indicating that the wavelength conversion element of the embodiment has high light utilization efficiency.

此外,如圖6所示,可清楚得知藉由使實施例1~3之螢光體陶瓷層的厚度,位於50μm以上120μm以下之範圍,相較於比較例,成為非常高的結合效率。亦即,藉由使上述本實施形態之螢光體陶瓷層20的厚度為50μm以上120μm以下之範圍,而實現光利用效率高之波長轉換元件1。In addition, as shown in FIG. 6 , by setting the thickness of the phosphor ceramic layers of Examples 1 to 3 in the range of 50 μm or more and 120 μm or less, the bonding efficiency is very high compared to the comparative example. That is, by making the thickness of the phosphor ceramic layer 20 of the present embodiment described above in the range of 50 μm or more and 120 μm or less, the wavelength conversion element 1 with high light utilization efficiency is realized.

此外,實施例1、實施例2、實施例3及比較例之波長轉換元件的螢光能量相對值(通過開口部後),分別為103%、106%、105%及100%。亦即,實施例1~3中,螢光能量相對值(通過開口部後),皆較比較例的螢光能量相對值(通過開口部後)更高。而實施例1~3中,螢光體陶瓷層的厚度為76μm之實施例2、及螢光體陶瓷層的厚度為106μm之實施例3之波長轉換元件的螢光能量相對值(通過開口部後)更高。In addition, the relative values of fluorescence energy (after passing through the opening) of the wavelength conversion elements of Example 1, Example 2, Example 3, and Comparative Example were 103%, 106%, 105%, and 100%, respectively. That is, in Examples 1 to 3, the relative value of fluorescence energy (after passing through the opening) was higher than that of the comparative example (after passing through the opening). On the other hand, among Examples 1 to 3, the relative values of fluorescence energy (through the openings) of the wavelength conversion element of Example 2 in which the thickness of the phosphor ceramic layer was 76 μm and the wavelength conversion element of Example 3 in which the thickness of the phosphor ceramic layer was 106 μm later) higher.

此外,如圖6所示,可清楚得知藉由使實施例2及3之螢光體陶瓷層的厚度位於70μm以上120μm以下之範圍,相較於比較例,成為非常高的螢光能量相對值(通過開口部後)。亦即,藉由使上述本實施形態之螢光體陶瓷層20的厚度為70μm以上120μm以下之範圍,而實現光利用效率更高之波長轉換元件1。In addition, as shown in FIG. 6 , it can be clearly seen that by setting the thickness of the phosphor ceramic layers of Examples 2 and 3 in the range of 70 μm or more and 120 μm or less, compared with the comparative example, a very high fluorescence energy relative value (after passing through the opening). That is, by making the thickness of the phosphor ceramic layer 20 of the present embodiment described above in the range of 70 μm or more and 120 μm or less, the wavelength conversion element 1 with higher light utilization efficiency is realized.

進一步,實施例1、實施例2、實施例3及比較例之波長轉換元件的螢光能量相對值(通過開口部前),分別為121%、124%、125%及124%。螢光體陶瓷層的厚度最薄之53μm的實施例1之波長轉換元件的螢光能量相對值(通過開口部前),較實施例2及3與比較例之波長轉換元件的螢光能量相對值(通過開口部前)更低。發明人認為其理由係因在實施例1之波長轉換元件,由於螢光體陶瓷層的厚度薄,而使螢光體陶瓷層無法充分吸收雷射光之緣故。Further, the relative values of fluorescence energy (before passing through the opening) of the wavelength conversion elements of Example 1, Example 2, Example 3 and Comparative Example were 121%, 124%, 125% and 124%, respectively. The relative value of the fluorescence energy of the wavelength conversion element of Example 1 (before passing through the opening) with the thinnest phosphor ceramic layer of 53 μm is compared with the fluorescence energy of the wavelength conversion element of Examples 2 and 3 and the comparative example. The value (before passing through the opening) is lower. The inventor believes that the reason is that in the wavelength conversion element of Example 1, the thickness of the phosphor ceramic layer is thin, so that the phosphor ceramic layer cannot sufficiently absorb the laser light.

此處,進一步,於本實施形態的實施例4之波長轉換元件中,針對製造方法與光利用效率予以說明。Here, further, in the wavelength conversion element of Example 4 of the present embodiment, the manufacturing method and the light utilization efficiency will be described.

首先,針對本實施形態的實施例4之波長轉換元件所具備的螢光體陶瓷層之製造方法予以記述。First, the manufacturing method of the phosphor ceramic layer with which the wavelength conversion element of Example 4 of this embodiment is equipped is described.

實施例4之螢光體陶瓷層,皆由以(Y0.997 Ce0.0033 Al5 O12 表示之第1結晶相構成。此外,實施例4之螢光體陶瓷層,皆以Ce3 賦活螢光體構成。The phosphor ceramic layers of Example 4 are all composed of the first crystal phase represented by (Y 0.997 Ce 0.003 ) 3 Al 5 O 12 . In addition, the phosphor ceramic layers of Example 4 are all composed of Ce 3 + activated phosphor.

在實施例4,除了秤量原料,使其成為化學計量組成之化合物(Y0.997 Ce0.0033 Al5 O12 以外,以與實施例1~3相同的順序獲得鍛燒物。亦即,實施例1~3之螢光體陶瓷層,與實施例4之螢光體陶瓷層的主要差異點,係Y與Ce之組成比不同的點。In Example 4, a calcined product was obtained in the same procedure as in Examples 1 to 3, except that the raw materials were weighed so as to be a compound having a stoichiometric composition (Y 0.997 Ce 0.003 ) 3 Al 5 O 12 . That is, the main point of difference between the phosphor ceramic layers of Examples 1 to 3 and the phosphor ceramic layer of Example 4 is the point in which the composition ratio of Y and Ce is different.

實施例4之螢光體陶瓷層的厚度為103μm。The thickness of the phosphor ceramic layer of Example 4 was 103 μm.

另,實施例4之螢光體陶瓷層的外徑及內徑為41mm及27mm。此外,實施例4之螢光體陶瓷層,為深黃色。In addition, the outer diameter and inner diameter of the phosphor ceramic layer of Example 4 were 41 mm and 27 mm. In addition, the phosphor ceramic layer of Example 4 was dark yellow.

接著,針對螢光體陶瓷層之評價予以說明。Next, the evaluation of the phosphor ceramic layer will be described.

首先,利用阿基米德法,評價實施例4之螢光體陶瓷層的密度。實施例4之螢光體陶瓷層的密度,為4.48g/cm3 。此外,實施例4之螢光體陶瓷層的密度,皆為Y3 Al5 O12 的理論密度(4.55g/cm3 )之98.4%。亦即,實施例4之螢光體陶瓷層的密度,為Y3 Al5 O12 的理論密度之97%以上100%以下。First, the density of the phosphor ceramic layer of Example 4 was evaluated by the Archimedes method. The density of the phosphor ceramic layer of Example 4 was 4.48 g/cm 3 . In addition, the density of the phosphor ceramic layer of Example 4 is all 98.4% of the theoretical density (4.55 g/cm 3 ) of Y 3 Al 5 O 12 . That is, the density of the phosphor ceramic layer of Example 4 is 97% or more and 100% or less of the theoretical density of Y 3 Al 5 O 12 .

另,如同上述,本實施形態之螢光體陶瓷層20,由具有Ce3 及Ce4 的YAG構成,亦即,螢光體陶瓷層20,包含Ce3 及Ce4 。而接著利用硬X射線XAFS裝置,評價實施例4之螢光體陶瓷層的Ce3 存在比及Ce4 存在比。具體而言,利用硬X射線XAFS裝置,在5687eV~5777eV的範圍取得實施例4之螢光體陶瓷層的XAFS光譜。對該取得的XAFS光譜,施行Ce3 之參考光譜及Ce4 之參考光譜的擬合解析,藉以評價Ce3 存在比及Ce4 存在比。另,為了獲得Ce3 之參考光譜及Ce4 之參考光譜,而將CeO2 及CeF3 以同樣的條件評價。In addition, as described above, the phosphor ceramic layer 20 of the present embodiment is composed of YAG having Ce 3 + and Ce 4 + , that is, the phosphor ceramic layer 20 includes Ce 3 + and Ce 4 + . Next, the Ce 3 + existence ratio and the Ce 4 + existence ratio of the phosphor ceramic layer of Example 4 were evaluated using a hard X-ray XAFS apparatus. Specifically, using a hard X-ray XAFS apparatus, the XAFS spectrum of the phosphor ceramic layer of Example 4 was acquired in the range of 5687 eV to 5777 eV. The obtained XAFS spectrum was subjected to fitting analysis of the reference spectrum of Ce 3 + and the reference spectrum of Ce 4 + , thereby evaluating the Ce 3 + existence ratio and the Ce 4 + existence ratio. In addition, in order to obtain the reference spectrum of Ce 3+ and the reference spectrum of Ce 4+ , CeO 2 and CeF 3 were evaluated under the same conditions.

表1為顯示實施例4之螢光體陶瓷層的Ce3 存在比及Ce4 存在比之表。如表1所示,實施例4之螢光體陶瓷層的Ce3 存在比及Ce4 存在比,分別為78.3%及21.7%。於實施例4之螢光體陶瓷層中,滿足Ce3 ×100%/(Ce3 +Ce4 )≧60%,亦即,Ce3 存在比為60%以上。 [表1]

Figure 02_image001
Table 1 is a table showing the Ce 3 + existence ratio and the Ce 4 + existence ratio of the phosphor ceramic layer of Example 4. As shown in Table 1, the Ce 3 + existence ratio and the Ce 4 + existence ratio of the phosphor ceramic layer of Example 4 were 78.3% and 21.7%, respectively. In the phosphor ceramic layer of Example 4, Ce 3 + ×100%/(Ce 3 + +Ce 4 + )≧60%, that is, the Ce 3 + existence ratio is 60% or more. [Table 1]
Figure 02_image001

接著,針對實施例4之波長轉換元件的製造方法予以記述。Next, the manufacturing method of the wavelength conversion element of Example 4 is described.

首先,作為光反射層,準備塗Ag的Al之圓盤狀的基板本體(直徑50mm、厚度0.5mm)。另,於此基板本體之中心部,開設螺孔。接著,於此基板本體,設置螢光體陶瓷層。First, as a light reflection layer, an Ag-coated Al disk-shaped substrate body (50 mm in diameter, 0.5 mm in thickness) was prepared. In addition, a screw hole is opened in the center portion of the base body. Next, on the substrate body, a phosphor ceramic layer is provided.

於螢光體陶瓷層的內側,設置中心部開設有螺孔的Al之圓盤狀的第1板構件(外徑26.5mm、厚度100μm)。另,螢光體陶瓷層為螢光環;第1板構件,設置於環狀的內側。而後,進一步,以與螢光體陶瓷層及第1板構件重疊的方式,設置中心部開設有螺孔的Al之圓盤狀的第2板構件(外徑29mm、厚度200μm)。而後,將基板本體、第1板構件及第2板構件予以螺著固定。如此地,固定螢光體陶瓷層,獲得波長轉換元件。亦即,實施例4之波長轉換元件中,螢光體陶瓷層,係藉由基板本體與第2板構件而包夾固定。Inside the phosphor ceramic layer, an Al disc-shaped first plate member (outer diameter 26.5 mm, thickness 100 μm) having a screw hole in the center was provided. In addition, the phosphor ceramic layer is a phosphor ring, and the first plate member is provided on the inner side of the ring. Then, a disk-shaped second plate member (outer diameter 29 mm, thickness 200 μm) of Al having a screw hole in the center was provided so as to overlap the phosphor ceramic layer and the first plate member. Then, the substrate body, the first plate member, and the second plate member are screwed and fixed. In this way, the phosphor ceramic layer is fixed to obtain a wavelength conversion element. That is, in the wavelength conversion element of Example 4, the phosphor ceramic layer is sandwiched and fixed by the substrate body and the second plate member.

如此地,獲得實施例4之螢光體陶瓷層及波長轉換元件。In this way, the phosphor ceramic layer and the wavelength conversion element of Example 4 were obtained.

進一步,針對波長轉換元件的評價予以說明。Further, evaluation of the wavelength conversion element will be described.

將實施例4之波長轉換元件,以與實施例1~3相同的方法評價。The wavelength conversion element of Example 4 was evaluated by the same method as Examples 1-3.

圖7係顯示本實施形態的實施例4之波長轉換元件的評價結果之圖。具體而言,於圖7,顯示實施例4之波長轉換元件的螢光能量相對值(通過開口部後)、螢光能量相對值(通過開口部前)及結合效率。另,於圖7,為了比較,亦顯示實施例1~3及比較例之波長轉換元件的螢光能量相對值(通過開口部後)、螢光能量相對值(通過開口部前)及結合效率。FIG. 7 is a graph showing the evaluation results of the wavelength conversion element of Example 4 of the present embodiment. Specifically, FIG. 7 shows the relative value of fluorescence energy (after passing through the opening), the relative value of fluorescence energy (before passing through the opening), and the binding efficiency of the wavelength conversion element of Example 4. In addition, FIG. 7 also shows the relative value of fluorescence energy (after passing through the opening), the relative value of fluorescence energy (before passing through the opening), and the binding efficiency of the wavelength conversion elements of Examples 1 to 3 and the comparative example for comparison. .

此處,螢光能量相對值(通過開口部後),係通過孔隙構件的開口部後之波長轉換元件放出的螢光之螢光能量的相對值。另,使通過開口部後的比較例之波長轉換元件放出的螢光之螢光能量為100%。Here, the relative value of the fluorescence energy (after passing through the opening) is the relative value of the fluorescence energy of the fluorescence emitted from the wavelength conversion element after passing through the opening of the aperture member. In addition, the fluorescence energy of the fluorescence emitted from the wavelength conversion element of the comparative example after passing through the opening was set to 100%.

此外,螢光能量相對值(通過開口部前),係通過孔隙構件的開口部前之波長轉換元件放出的螢光之螢光能量的相對值。另,使通過開口部後的比較例之波長轉換元件放出的螢光之螢光能量為100%。In addition, the relative value of fluorescence energy (before passing through the opening) is the relative value of the fluorescence energy of the fluorescence emitted from the wavelength conversion element before passing through the opening of the aperture member. In addition, the fluorescence energy of the fluorescence emitted from the wavelength conversion element of the comparative example after passing through the opening was set to 100%.

此外,結合效率,係相對於螢光能量相對值(通過開口部前)之螢光能量相對值(通過開口部後)的比例。亦即,結合效率,係將螢光能量相對值(通過開口部後)除以螢光能量相對值(通過開口部前)的值。In addition, the binding efficiency is the ratio of the relative value of fluorescence energy (after passing through the opening) to the relative value of fluorescence energy (before passing through the opening). That is, the binding efficiency is a value obtained by dividing the relative value of fluorescence energy (after passing through the opening) by the relative value of fluorescence energy (before passing through the opening).

如圖7所示,實施例4之波長轉換元件的結合效率為85%。此外,如同上述,比較例之波長轉換元件的結合效率為81%。結合效率較高的實施例4之波長轉換元件,產生的螢光中之通過開口部的光線更多、螢光的發光面積更小。例如,如圖5A及圖5B所示,於實施例4之波長轉換元件中,通過孔隙構件2之開口部2a的光線多,故可作為投影機100之投射光而利用的光線多。亦即,表示實施例4之波長轉換元件光利用效率高。As shown in FIG. 7 , the combining efficiency of the wavelength conversion element of Example 4 was 85%. In addition, as described above, the binding efficiency of the wavelength conversion element of the comparative example was 81%. Combined with the wavelength conversion element of the fourth embodiment with higher efficiency, the generated fluorescence has more light passing through the opening, and the fluorescent light-emitting area is smaller. For example, as shown in FIGS. 5A and 5B , in the wavelength conversion element of the fourth embodiment, more light passes through the opening 2 a of the aperture member 2 , so that more light can be used as the projection light of the projector 100 . That is, it shows that the wavelength conversion element of Example 4 has high light utilization efficiency.

進一步,實施例4之波長轉換元件的螢光能量相對值(通過開口部後)及螢光能量相對值(通過開口部前),分別為108%及128%。相較於實施例1~3之波長轉換元件的螢光能量相對值(通過開口部後)及螢光能量相對值(通過開口部前),此值為較高的值。Further, the relative value of fluorescence energy (after passing through the opening) and the relative value of fluorescence energy (before passing through the opening) of the wavelength conversion element of Example 4 were 108% and 128%, respectively. This value is higher than the relative value of fluorescence energy (after passing through the opening) and the relative value of fluorescence energy (before passing through the opening) of the wavelength conversion elements of Examples 1 to 3.

如同上述,實施例4之螢光體陶瓷層中,Ce3 存在比為60%以上,Ce4 的存在比少,未滿40%。因此,Ce4 所造成的非發光緩和損耗減少,故Ce3 存在比為60%以上的實施例4之螢光體陶瓷層,發光效率變高。因此,實施例4之波長轉換元件,藉由具備此等螢光體陶瓷層,可提高光利用效率。進一步,在使投影機具備此等波長轉換元件1之情況,可提高投影機的光利用效率。例如,可實現消耗電力低之投影機。As described above, in the phosphor ceramic layer of Example 4, the Ce 3 + existence ratio was 60% or more, and the Ce 4 + existence ratio was as small as less than 40%. Therefore, the non-luminescence relaxation loss due to Ce 4 + is reduced, so that the phosphor ceramic layer of Example 4 in which the Ce 3 + existence ratio is 60% or more has a higher luminous efficiency. Therefore, the wavelength conversion element of Example 4 can improve the light utilization efficiency by having these phosphor ceramic layers. Furthermore, when the projector is provided with these wavelength conversion elements 1, the light utilization efficiency of the projector can be improved. For example, a projector with low power consumption can be realized.

此外,由於Ce4 所造成的非發光緩和損耗減少,故實施例4之螢光體陶瓷層的發熱減少。因此,具備此等螢光體陶瓷層之投影機中,可提高激發光L1之最大輸入能量,亦即,可實現高輸出之投影機。In addition, the heat generation of the phosphor ceramic layer of Example 4 is reduced because the non-luminescence relaxation loss due to Ce 4 + is reduced. Therefore, in a projector provided with these phosphor ceramic layers, the maximum input energy of the excitation light L1 can be increased, that is, a projector with high output can be realized.

(變形例1) 實施形態之螢光體陶瓷層20,僅由第1結晶相構成,但未限定於此一形態。此處,針對具備包含第1結晶相與第2結晶相的螢光體陶瓷層20a之波長轉換元件1a予以說明。(Variation 1) The phosphor ceramic layer 20 of the embodiment is composed of only the first crystal phase, but is not limited to this form. Here, the wavelength conversion element 1a including the phosphor ceramic layer 20a including the first crystal phase and the second crystal phase will be described.

[波長轉換元件的構成] 首先,利用圖式,針對本變形例之波長轉換元件1a的構成予以說明。圖8係本變形例之波長轉換元件1a的立體圖。圖9係顯示圖8的IX-IX線之波長轉換元件1a的截斷面之剖面圖。[Configuration of wavelength conversion element] First, the structure of the wavelength conversion element 1a of this modification is demonstrated using drawings. FIG. 8 is a perspective view of the wavelength conversion element 1a of this modification. FIG. 9 is a cross-sectional view showing a cross-section of the wavelength conversion element 1 a on line IX-IX of FIG. 8 .

本變形例之波長轉換元件1a,除了具備螢光體陶瓷層20a的點以外,具有與實施形態之波長轉換元件1相同的構成。亦即,如圖8及圖9所示,波長轉換元件1a,具備具有光反射面13的基板10、螢光體陶瓷層20a、及防止反射層30。The wavelength conversion element 1a of the present modification has the same configuration as the wavelength conversion element 1 of the embodiment except for the point that the phosphor ceramic layer 20a is provided. That is, as shown in FIGS. 8 and 9 , the wavelength conversion element 1 a includes the substrate 10 having the light reflecting surface 13 , the phosphor ceramic layer 20 a , and the antireflection layer 30 .

另,本變形例中,波長轉換元件1a,亦為使用在投影機,接收激發光L1,放出包含螢光的反射光之螢光輪。In addition, in this modification, the wavelength conversion element 1a is also used in a projector, and is a fluorescent wheel that receives the excitation light L1 and emits reflected light including fluorescent light.

螢光體陶瓷層20a,包含第1結晶相與第2結晶相。更具體而言,本變形例中,螢光體陶瓷層20a,由第1結晶相與第2結晶相構成。The phosphor ceramic layer 20a includes a first crystal phase and a second crystal phase. More specifically, in this modification, the phosphor ceramic layer 20a is composed of the first crystal phase and the second crystal phase.

第1結晶相,具有如實施形態所記載的構成。The first crystal phase has the structure described in the embodiment.

此外,第2結晶相,係具有與石榴石構造不同的構造之結晶相。亦即,第2結晶相,具備與第1結晶相所具有之構造不同的構造。因此,第1結晶相之折射率,與第2結晶相之折射率彼此不同。In addition, the second crystal phase is a crystal phase having a structure different from the garnet structure. That is, the second crystal phase has a structure different from that of the first crystal phase. Therefore, the refractive index of the first crystal phase and the refractive index of the second crystal phase are different from each other.

將螢光體陶瓷層20a予以剖面觀察的情況,使顯示螢光體陶瓷層20a之影像的面積全體為100%時,顯示第1結晶相的面積,例如為10%以上99%以下。另,顯示第1結晶相的面積不限於此,例如可為75%以上98%以下,亦可為85%以上95%以下。亦即,本變形例之螢光體陶瓷層20a,主要包含第1結晶相。When the phosphor ceramic layer 20a is observed in cross section, the area showing the first crystal phase is, for example, 10% to 99% when the entire area showing the image of the phosphor ceramic layer 20a is 100%. In addition, the area which shows a 1st crystal phase is not limited to this, For example, 75% or more and 98% or less may be sufficient as it, and 85% or more and 95% or less may be sufficient as it. That is, the phosphor ceramic layer 20a of this modification mainly includes the first crystal phase.

作為一例,本變形例之第2結晶相,係具有鈣鈦礦構造之結晶相,但不限於此一型態,亦可為具有與石榴石構造及鈣鈦礦構造不同的構造之結晶相。As an example, the second crystal phase in this modification is a crystal phase having a perovskite structure, but is not limited to this type, and may be a crystal phase having a structure different from the garnet structure and the perovskite structure.

鈣鈦礦構造,係以EFO3 之一般式表示的結晶構造。於元素E,應用Ca、Y、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb及Lu等稀土族元素;於元素F,應用Mg、Al、Si、Ga及Sc等元素。作為此等石榴石構造,可列舉YAP(釔鋁鈣鈦礦(Yttrium Aluminum Perovskite))等。本變形例中,第2結晶相,以(Y1 y Cey )AlO3 (0≦y<0.1)表示,亦即以YAP表示。The perovskite structure is a crystal structure represented by the general formula of EFO 3 . For element E, rare earth elements such as Ca, Y, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, and Lu are used; for element F, elements such as Mg, Al, Si, Ga, and Sc are used. As such a garnet structure, YAP (Yttrium Aluminum Perovskite) etc. are mentioned. In this modification, the second crystal phase is represented by (Y 1 - y Ce y )AlO 3 (0≦y<0.1), that is, represented by YAP.

另,第2結晶相,亦可為化學組成不同之複數種鈣鈦礦結晶相的固溶體。In addition, the second crystal phase may be a solid solution of a plurality of perovskite crystal phases having different chemical compositions.

此外,第2結晶相,亦可包含相對於以上述一般式EFO3 表示之結晶相使化學組成偏移之結晶相。In addition, the second crystal phase may include a crystal phase whose chemical composition is shifted from the crystal phase represented by the general formula EFO 3 described above.

另,本變形例之螢光體陶瓷層20a,僅由第1結晶相及第2結晶相構成,亦即,不含具有與石榴石構造及鈣鈦礦構造不同的構造之結晶相。In addition, the phosphor ceramic layer 20a of this modification is composed of only the first crystal phase and the second crystal phase, that is, does not contain a crystal phase having a structure different from the garnet structure and the perovskite structure.

本變形例中,表示第2結晶相的材料,作為一例為YAP,但不限於此一材料。此外,宜以使表示第2結晶相的材料之折射率,與表示具有石榴石構造之第1結晶相的材料(此處為YAG)之折射率的差,為0.05以上0.5以下之方式,選擇表示第2結晶相的材料。藉此,如同上述,第1結晶相之折射率,與第2結晶相之折射率成為彼此不同。另,表示第2結晶相的材料之折射率與表示第1結晶相的材料之折射率的差,更宜為0.06以上0.3以下,進一步宜為0.07以上0.15以下。In this modification, the material representing the second crystal phase is YAP as an example, but is not limited to this material. In addition, it is preferable to select so that the difference between the refractive index of the material representing the second crystal phase and the refractive index of the material representing the first crystal phase having a garnet structure (here, YAG) is 0.05 or more and 0.5 or less. Indicates the material of the second crystal phase. Thereby, as described above, the refractive index of the first crystal phase and the refractive index of the second crystal phase are different from each other. The difference between the refractive index of the material representing the second crystal phase and the refractive index of the material representing the first crystal phase is more preferably 0.06 or more and 0.3 or less, and further preferably 0.07 or more and 0.15 or less.

此外,例如,本變形例之第2結晶相為具有與石榴石構造及鈣鈦礦構造不同的構造之結晶相的情況,作為表示第2結晶相的材料,宜為Al2 O3 、Y2 O3 、Y4 Al2 O9 、Lu2 O3 及Lu4 Al2 O9 等。In addition, for example, when the second crystal phase of this modification is a crystal phase having a structure different from the garnet structure and the perovskite structure, the material representing the second crystal phase is preferably Al 2 O 3 and Y 2 O 3 , Y 4 Al 2 O 9 , Lu 2 O 3 and Lu 4 Al 2 O 9 and the like.

螢光體陶瓷層20a,接收從波長轉換元件1a的上方入射的光線作為激發光L1,放出螢光。更具體而言,將從後述激發光源射出的光線作為激發光L1對螢光體陶瓷層20a照射,藉以從螢光體陶瓷層20a放出螢光作為波長轉換光。亦即,從螢光體陶瓷層20a放出的波長轉換光,為波長較激發光L1之波長更長的光線。The phosphor ceramic layer 20a receives light incident from above the wavelength conversion element 1a as excitation light L1, and emits fluorescent light. More specifically, the phosphor ceramic layer 20a is irradiated with light emitted from an excitation light source described later as excitation light L1, whereby fluorescence is emitted from the phosphor ceramic layer 20a as wavelength-converted light. That is, the wavelength-converted light emitted from the phosphor ceramic layer 20a is light having a wavelength longer than that of the excitation light L1.

本變形例中,於從螢光體陶瓷層20a放出的波長轉換光,包含係黃色系光的螢光。螢光體陶瓷層20a,例如,吸收波長380nm以上490nm以下的光線,放出在波長490nm以上580nm以下的範圍具有螢光峰波長之係黃色系光的螢光。藉由以YAG及YAP構成螢光體陶瓷層20a,而簡單地實現將在波長490nm以上580nm以下的範圍具有螢光峰波長之螢光放出的螢光體陶瓷層20a。In this modification, the wavelength-converted light emitted from the phosphor ceramic layer 20a includes fluorescent light of yellow-based light. The phosphor ceramic layer 20a, for example, absorbs light having a wavelength of 380 nm to 490 nm, and emits fluorescence having a fluorescence peak wavelength in a range of 490 nm to 580 nm. By constituting the phosphor ceramic layer 20a with YAG and YAP, the phosphor ceramic layer 20a that emits fluorescence having a fluorescence peak wavelength in the range of wavelengths from 490 nm to 580 nm can be easily realized.

從螢光體陶瓷層20a放出的波長轉換光之色度圖的x座標,宜為0.415以下,更宜為0.410以下,進一步宜為0.408以下。若從螢光體陶瓷層20a放出的波長轉換光之色度圖的x座標為上述數值,則螢光體陶瓷層20a的熱淬滅變小,故可實現發光效率高之螢光體陶瓷層20a。The x-coordinate of the chromaticity diagram of the wavelength-converted light emitted from the phosphor ceramic layer 20a is preferably 0.415 or less, more preferably 0.410 or less, and further preferably 0.408 or less. If the x-coordinate of the chromaticity diagram of the wavelength-converted light emitted from the phosphor ceramic layer 20a is the above-mentioned value, the thermal quenching of the phosphor ceramic layer 20a is reduced, so that a phosphor ceramic layer with high luminous efficiency can be realized. 20a.

螢光體陶瓷層20a的密度,宜為理論密度之95%以上100%以下,更宜為理論密度之97%以上100%以下。此處,理論密度,係使層中的原子理想地配置之情況的密度。換而言之,理論密度,係假定為螢光體陶瓷層20a中無空隙時的密度,為利用結晶構造計算出的值。例如,螢光體陶瓷層20a的密度為99%之情況,剩下的1%相當於空隙。亦即,螢光體陶瓷層20a的密度越高,則空隙越少。若螢光體陶瓷層20a的密度為上述範圍,則螢光體陶瓷層20a所放出的總螢光量增加,故可提供放射的光量更多之波長轉換元件1a及投影機。另,理論密度,為具有石榴石構造之第1結晶相的理論密度。The density of the phosphor ceramic layer 20a is preferably not less than 95% and not more than 100% of the theoretical density, and more preferably not less than 97% and not more than 100% of the theoretical density. Here, the theoretical density is the density when atoms in the layer are ideally arranged. In other words, the theoretical density is assumed to be the density when there is no void in the phosphor ceramic layer 20a, and is a value calculated from the crystal structure. For example, when the density of the phosphor ceramic layer 20a is 99%, the remaining 1% corresponds to voids. That is, the higher the density of the phosphor ceramic layer 20a, the smaller the voids. If the density of the phosphor ceramic layer 20a is within the above range, the total amount of fluorescent light emitted by the phosphor ceramic layer 20a increases, so that a wavelength conversion element 1a and a projector with a larger amount of emitted light can be provided. In addition, the theoretical density is the theoretical density of the first crystal phase having a garnet structure.

螢光體陶瓷層20a的密度,宜為4.32g/cm3 以上4.55g/cm3 以下,更宜為4.41g/cm3 以上4.55g/cm3 以下。如本變形例所示,以YAG及YAP構成螢光體陶瓷層20a的情況,若螢光體陶瓷層20a的密度為上述範圍,則螢光體陶瓷層20a的密度分別成為理論密度之95%以上100%以下及97%以上100%以下。藉由使螢光體陶瓷層20a的密度為上述範圍,可將螢光體陶瓷層20a吸收的激發光L1效率良好地轉換為螢光。亦即,實現發光效率高之螢光體陶瓷層20a。The density of the phosphor ceramic layer 20a is preferably 4.32 g/cm 3 or more and 4.55 g/cm 3 or less, more preferably 4.41 g/cm 3 or more and 4.55 g/cm 3 or less. As shown in this modification, when the phosphor ceramic layer 20a is formed of YAG and YAP, if the density of the phosphor ceramic layer 20a falls within the above-mentioned range, the density of the phosphor ceramic layer 20a becomes 95% of the theoretical density, respectively. Above 100% and below 97% below 100%. By making the density of the phosphor ceramic layer 20a into the above-mentioned range, the excitation light L1 absorbed by the phosphor ceramic layer 20a can be efficiently converted into fluorescent light. That is, the phosphor ceramic layer 20a with high luminous efficiency is realized.

螢光體陶瓷層20a的膜厚(z軸方向之長度),宜為50μm以上而未滿150μm,更宜為50μm以上而未滿120μm。此外,該螢光體陶瓷層的膜厚,若為70μm以上而未滿120μm則更佳,為80μm以上而未滿110μm則進一步更佳。The film thickness (length in the z-axis direction) of the phosphor ceramic layer 20a is preferably 50 μm or more and less than 150 μm, and more preferably 50 μm or more and less than 120 μm. In addition, the film thickness of the phosphor ceramic layer is more preferably 70 μm or more and less than 120 μm, and more preferably 80 μm or more and less than 110 μm.

[投影機的構成] 如同上述地構成之波長轉換元件1a,與實施形態之波長轉換元件1同樣地,使用在投影機。亦即,亦可取代實施形態之波長轉換元件1,使用本變形例之波長轉換元件1a。[Configuration of the projector] The wavelength conversion element 1a configured as described above is used in a projector similarly to the wavelength conversion element 1 of the embodiment. That is, the wavelength conversion element 1a of this modification may be used instead of the wavelength conversion element 1 of the embodiment.

[實施例] 此處,於實施例5及6之波長轉換元件中,針對製造方法與光利用效率予以說明。另,實施例5之波長轉換元件具備與本變形例之波長轉換元件1a相同的構成,實施例6之波長轉換元件具備與實施形態之波長轉換元件1相同的構成。[Example] Here, in the wavelength conversion elements of Examples 5 and 6, the manufacturing method and the light utilization efficiency will be described. In addition, the wavelength conversion element of Example 5 has the same structure as the wavelength conversion element 1a of this modification, and the wavelength conversion element of Example 6 has the same structure as the wavelength conversion element 1 of embodiment.

首先,針對實施例5及6之波長轉換元件所具備的螢光體陶瓷層之製造方法予以記述。First, the manufacturing method of the phosphor ceramic layer with which the wavelength conversion element of Example 5 and 6 is equipped is described.

實施例5之螢光體陶瓷層,主要由以(Y0.997 Ce0.0033 Al5 O12 表示之結晶相(即第1結晶相)構成。另,如同上述,實施例5之螢光體陶瓷層,亦包含第2結晶相。實施例6之螢光體陶瓷層,由以(Y0.997 Ce0.0033 Al5 O12 表示之結晶相(即第1結晶相)構成。此外,實施例5及6之螢光體陶瓷層,皆以Ce3 賦活螢光體構成。The phosphor ceramic layer of Example 5 is mainly composed of a crystal phase represented by (Y 0.997 Ce 0.003 ) 3 Al 5 O 12 (ie, the first crystal phase). In addition, as described above, the phosphor ceramic layer of Example 5 also includes the second crystal phase. The phosphor ceramic layer of Example 6 is composed of a crystal phase represented by (Y 0.997 Ce 0.003 ) 3 Al 5 O 12 (ie, the first crystal phase). In addition, the phosphor ceramic layers of Examples 5 and 6 are all composed of Ce 3 + activated phosphor.

實施例5及6之螢光體陶瓷層,使用與在實施例1~3使用的原料相同的原料。For the phosphor ceramic layers of Examples 5 and 6, the same raw materials as those used in Examples 1 to 3 were used.

首先,秤量上述原料,使其成為化學計量組成之化合物(Y0.997 Ce0.0033 Al5 O12 。而後,以與實施例1~3相同之順序將上述原料混合,獲得漿狀的混合原料。First, the above-mentioned raw materials are weighed so as to be a compound of stoichiometric composition (Y 0.997 Ce 0.003 ) 3 Al 5 O 12 . Then, the above-mentioned raw materials were mixed in the same procedure as in Examples 1 to 3 to obtain a slurry-like mixed raw material.

而後,在實施例5,藉由未利用噴霧乾燥裝置之方法,獲得造成粒的混合原料。具體而言,將利用乾燥機乾燥之混合原料100g,投入至氧化鋁製的研缽。而後,將使聚乙烯醇以0.5wt%的比率水溶之溶液作為聚乙烯醇溶液,將此聚乙烯醇溶液18mL進一步投入至氧化鋁製的研缽。其後,利用磨杵,將混合原料與聚乙烯醇溶液混合。而後,將混合原料與聚乙烯醇溶液的混合物,利用開孔512μm的篩網過濾。其結果,獲得粒子尺寸成為512μm程度以下之混合原料與聚乙烯醇溶液的混合物。其後,將該混合物,以設定為105℃之乾燥機處理30分鐘,將水分去除。如此地,獲得在實施例5使用之造成粒的混合原料。此外,在實施例6,以與實施例1~3相同之順序將混合原料造粒,獲得造成粒的混合原料。Then, in Example 5, a mixed raw material for granulation was obtained by a method without using a spray drying apparatus. Specifically, 100 g of the mixed raw material dried by a dryer was put into a mortar made of alumina. Then, a solution obtained by dissolving polyvinyl alcohol in water at a ratio of 0.5 wt % was used as a polyvinyl alcohol solution, and 18 mL of this polyvinyl alcohol solution was further put into a mortar made of alumina. Then, the mixed raw material and the polyvinyl alcohol solution were mixed with a pestle. Then, the mixture of the mixed raw material and the polyvinyl alcohol solution was filtered through a mesh having an opening of 512 μm. As a result, a mixture of the mixed raw material and the polyvinyl alcohol solution having a particle size of about 512 μm or less was obtained. Thereafter, the mixture was treated with a dryer set at 105° C. for 30 minutes to remove moisture. In this way, the granulated mixed raw material used in Example 5 was obtained. In addition, in Example 6, the mixed raw material was granulated in the same procedure as in Examples 1 to 3 to obtain a granulated mixed raw material.

實施例5及6之螢光體陶瓷層,以相同方法暫時成型。具體而言,將造成粒的混合原料,利用電動油壓加壓機(理研精機株式會社製,EMP-5)與圓筒型之模具(外徑66mm、內徑46mm、高度130mm),暫時成型為圓筒型。使成型時的壓力為5MPa。而後,利用冷均壓加壓裝置,使暫時成型後之成型體正式成型。使正式成型時的壓力為300MPa。另,將正式成型後之成型體,以去除造粒時使用的黏著劑(黏結劑)為目的,施行加熱處理(去黏結劑處理)。使加熱處理的溫度為500℃。此外,使加熱處理的時間為10小時。The phosphor ceramic layers of Examples 5 and 6 were temporarily formed by the same method. Specifically, the mixed raw material to be granulated is temporarily molded using an electric hydraulic press (manufactured by Riken Seiki Co., Ltd., EMP-5) and a cylindrical mold (outer diameter 66mm, inner diameter 46mm, height 130mm). It is cylindrical. The pressure at the time of molding was 5 MPa. Then, using a cold equalizing and pressing device, the once-molded molded body is fully molded. The pressure at the time of main molding was 300 MPa. In addition, the molded body after the main molding is subjected to heat treatment (binder removal treatment) for the purpose of removing the binder (binder) used in the granulation. The temperature of the heat treatment was set to 500°C. In addition, the time for the heat treatment was set to 10 hours.

利用管狀氣體環境爐,鍛燒加熱處理後之成型體。使鍛燒溫度為1675℃。此外,使鍛燒時間為4小時。使鍛燒氣體環境,為氮與氫的混合氣體環境。另,鍛燒後之鍛燒物的外徑及內徑,分別為49mm及35mm。The formed body after heat treatment is calcined in a tubular gas atmosphere furnace. The calcination temperature was set to 1675°C. In addition, the calcination time was made 4 hours. The calcining gas atmosphere is a mixed gas atmosphere of nitrogen and hydrogen. In addition, the outer diameter and inner diameter of the calcined product after calcination were 49 mm and 35 mm, respectively.

利用多線鋸,將鍛燒後的圓筒型之鍛燒物切片。切成片的圓筒型之鍛燒物的厚度,約為700μm。Using a multi-wire saw, the calcined cylindrical calcined material was sliced. The thickness of the cylindrical calcined product cut into pieces was about 700 μm.

另,在實施例5及6,將鍛燒後之鍛燒物,以1000℃以上的溫度予以加熱處理。In addition, in Examples 5 and 6, the calcined product after calcination was heat-treated at a temperature of 1000° C. or higher.

利用研磨裝置,研磨切片後之鍛燒物,施行鍛燒物的厚度之調整。螢光體陶瓷層的厚度,在實施例5為118μm,在實施例6為117μm。The calcined material after slicing is ground by a grinding device, and the thickness of the calcined material is adjusted. The thickness of the phosphor ceramic layer was 118 μm in Example 5 and 117 μm in Example 6.

另,實施例5及6之螢光體陶瓷層的外徑及內徑,皆為49mm及35mm。此外,實施例5及6之螢光體陶瓷層,為深黃色。In addition, the outer diameter and inner diameter of the phosphor ceramic layers of Examples 5 and 6 were both 49 mm and 35 mm. In addition, the phosphor ceramic layers of Examples 5 and 6 were dark yellow.

接著,針對螢光體陶瓷層之評價予以說明。Next, the evaluation of the phosphor ceramic layer will be described.

首先,利用阿基米德法,評價實施例5及6之螢光體陶瓷層的密度。實施例5及6之螢光體陶瓷層的密度,分別為4.48g/cm3 及4.42g/cm3 。此外,實施例5及6之螢光體陶瓷層的密度,分別為Y3 Al5 O12 的理論密度(4.55g/cm3)之98.4%及97.1%。亦即,實施例5及6之螢光體陶瓷層的密度,為Y3 Al5 O12 的理論密度之97%以上100%以下。First, the density of the phosphor ceramic layers of Examples 5 and 6 was evaluated by the Archimedes method. The densities of the phosphor ceramic layers of Examples 5 and 6 were 4.48 g/cm 3 and 4.42 g/cm 3 , respectively. In addition, the densities of the phosphor ceramic layers of Examples 5 and 6 were 98.4% and 97.1% of the theoretical density (4.55 g/cm 3 ) of Y 3 Al 5 O 12 , respectively. That is, the density of the phosphor ceramic layers of Examples 5 and 6 was 97% or more and 100% or less of the theoretical density of Y 3 Al 5 O 12 .

而後,利用掃描式電子顯微鏡(SEM),評價實施例5之螢光體陶瓷層的剖面SEM影像。Then, the cross-sectional SEM image of the phosphor ceramic layer of Example 5 was evaluated using a scanning electron microscope (SEM).

圖10係顯示本變形例的實施例5之螢光體陶瓷層的剖面之SEM影像。圖10(a)係顯示實施例5之螢光體陶瓷層的廣範圍之剖面的SEM影像。另,圖10(a)所示之SEM影像,相當於在圖9所示之剖面圖以虛線矩形包圍的區域之影像。圖10(b),係將圖10(a)的以一點鏈線之矩形包圍的區域放大之SEM影像。圖10(c),係將圖10(a)的以二點鏈線之矩形包圍的區域放大之SEM影像。FIG. 10 is an SEM image showing a cross section of the phosphor ceramic layer of Example 5 of the present modification. FIG. 10( a ) is an SEM image showing a broad cross section of the phosphor ceramic layer of Example 5. FIG. In addition, the SEM image shown in FIG. 10( a ) corresponds to the image of the area enclosed by the dotted rectangle in the cross-sectional view shown in FIG. 9 . Fig. 10(b) is an enlarged SEM image of the area enclosed by the rectangle of a dotted chain line in Fig. 10(a). Fig. 10(c) is an enlarged SEM image of the area enclosed by the rectangle of the two-dot chain line in Fig. 10(a).

此處,實施例5之螢光體陶瓷層,即本變形例之螢光體陶瓷層20a,包含單相部、及與該單相部區別之混合相部。於圖10(b)顯示單相部,於圖10(c)顯示混合相部。Here, the phosphor ceramic layer of Example 5, that is, the phosphor ceramic layer 20a of this modification, includes a single-phase portion and a mixed-phase portion distinguished from the single-phase portion. A single-phase portion is shown in FIG. 10( b ), and a mixed-phase portion is shown in FIG. 10( c ).

本變形例中,在圖10之SEM影像中,顏色較深之區域相當於具有石榴石構造之第1結晶相,顏色較淺之區域相當於具有鈣鈦礦構造之第2結晶相。此外,在圖10之SEM影像中,顏色最深之區域相當於空隙。In this modification, in the SEM image of FIG. 10 , the darker region corresponds to the first crystal phase having a garnet structure, and the lighter region corresponds to the second crystal phase having a perovskite structure. Furthermore, in the SEM image of Figure 10, the darkest region corresponds to a void.

於單相部,僅設置具有石榴石構造之第1結晶相、及具有與石榴石構造不同的構造(此處為鈣鈦礦構造)之第2結晶相中的第1結晶相。另,更具體而言,此處,於單相部,僅設置第1結晶相,未設置具有與石榴石構造及鈣鈦礦構造不同的構造之其他結晶相等。In the single-phase portion, only a first crystal phase having a garnet structure and a second crystal phase having a structure different from the garnet structure (here, a perovskite structure) are provided. In addition, more specifically, here, in the single-phase portion, only the first crystal phase is provided, and other crystals having structures different from the garnet structure and the perovskite structure are not provided.

此外,於混合相部,混合設置第1結晶相及第2結晶相兩者。更具體而言,於混合相部,僅混合設置第1結晶相及第2結晶相兩者。另,亦可於混合相部,混合設置第1結晶相及第2結晶相兩者、進一步設置具有與石榴石構造及鈣鈦礦構造不同的構造之其他結晶相。In addition, in the mixed phase portion, both the first crystal phase and the second crystal phase are provided in a mixed manner. More specifically, in the mixed phase portion, only both the first crystal phase and the second crystal phase are provided in a mixed manner. In addition, in the mixed phase portion, both the first crystal phase and the second crystal phase may be mixed, and another crystal phase having a structure different from the garnet structure and the perovskite structure may be further provided.

實施例5之混合相部,以將第1結晶相及第2結晶相兩者隨機交雜的構造混合設置,但未限定於此一形態,以第1結晶相及第2結晶相兩者周期性地配置的構造混合設置亦可。The mixed phase portion of Example 5 is provided in a structure in which both the first crystal phase and the second crystal phase are randomly intermixed, but is not limited to this form, and both the first crystal phase and the second crystal phase are periodically Configurable hybrid setups that are configured randomly are also possible.

另,實施例5之螢光體陶瓷層,包含複數混合相部。在圖10(a)以點線包圍的區域,分別相當於混合相部。In addition, the phosphor ceramic layer of Example 5 includes a plurality of mixed-phase portions. The regions enclosed by the dotted lines in FIG. 10( a ) correspond to the mixed-phase portions, respectively.

複數混合相部之周圍,分別由單相部包圍。單相部及複數混合相部的形狀,亦可說是海島狀。此一情況,單相部相當於海,複數混合相部相當於島。Surroundings of the complex mixed-phase parts are respectively surrounded by single-phase parts. The shape of the single-phase portion and the plural mixed-phase portion can also be said to be in the shape of a sea island. In this case, the single-phase part corresponds to the sea, and the plural mixed-phase part corresponds to the island.

此外,於混合相部,相較於第1結晶相,宜設置更多之第2結晶相。例如,混合相部中之第1結晶相與第2結晶相的比率,如同下述。將實施例5之螢光體陶瓷層予以剖面觀察的情況(例如,圖10),使顯示混合相部之影像的面積全體為100%時,顯示第2結晶相的面積,例如為10%以上99%以下。另,顯示第2結晶相的面積不限於此,例如可為70%以上95%以下,亦可為80%以上90%以下。亦即,於本變形例之混合相部,主要設置第2結晶相。In addition, in the mixed phase portion, it is preferable to provide more second crystal phases than the first crystal phases. For example, the ratio of the first crystal phase to the second crystal phase in the mixed phase portion is as follows. When the phosphor ceramic layer of Example 5 is observed in cross-section (for example, Fig. 10 ), when the total area of the image showing the mixed phase portion is 100%, the area showing the second crystal phase is, for example, 10% or more. Below 99%. The area showing the second crystal phase is not limited to this, and may be, for example, 70% or more and 95% or less, or 80% or more and 90% or less. That is, in the mixed phase part of this modification, the 2nd crystal phase is mainly provided.

如此地,於混合相部,混合設置具有石榴石構造之第1結晶相及具有鈣鈦礦構造之第2結晶相兩者。如同上述,第1結晶相之折射率,與第2結晶相之折射率彼此不同。因此,僅設置第1結晶相的單相部之折射率,與混合相部之折射率彼此不同。本變形例中,YAG之折射率為1.83,YAP之折射率為1.91,故單相部之折射率較混合相部之折射率更低。In this way, in the mixed phase portion, both the first crystal phase having a garnet structure and the second crystal phase having a perovskite structure are provided in a mixed manner. As described above, the refractive index of the first crystal phase and the refractive index of the second crystal phase are different from each other. Therefore, the refractive index of the single-phase portion in which only the first crystal phase is provided is different from the refractive index of the mixed-phase portion. In this modification, the refractive index of YAG is 1.83, and the refractive index of YAP is 1.91, so the refractive index of the single-phase portion is lower than that of the mixed-phase portion.

進一步,針對混合相部之尺寸予以說明。另,混合相部之尺寸,表示圖10所示之SEM影像的混合相部之長邊方向之長度。混合相部之尺寸,例如為以圖10的雙箭頭表示之長度。混合相部之尺寸,宜為0.5μm以上而未滿500μm,更宜為1μm以上而未滿300μm,進一步宜為2μm以上而未滿100μm。Further, the size of the mixed phase portion will be described. In addition, the size of the mixed phase portion represents the length in the longitudinal direction of the mixed phase portion of the SEM image shown in FIG. 10 . The size of the mixed phase portion is, for example, the length indicated by the double arrow in FIG. 10 . The size of the mixed phase portion is preferably 0.5 μm or more and less than 500 μm, more preferably 1 μm or more and less than 300 μm, and further preferably 2 μm or more and less than 100 μm.

如此地,實施例5之螢光體陶瓷層(螢光體陶瓷層20a),包含第1結晶相及第2結晶相,在圖10顯示設置單相部及混合相部。另一方面,實施例6之螢光體陶瓷層,僅由第1結晶相構成。因此,確認實施例6之螢光體陶瓷層,並未設置混合相部。In this way, the phosphor ceramic layer (phosphor ceramic layer 20 a ) of Example 5 includes the first crystal phase and the second crystal phase, and the single-phase portion and the mixed-phase portion are provided as shown in FIG. 10 . On the other hand, the phosphor ceramic layer of Example 6 was composed of only the first crystal phase. Therefore, it was confirmed that the phosphor ceramic layer of Example 6 was not provided with a mixed phase portion.

接著,針對實施例5及6之波長轉換元件的製造方法予以記述。Next, the manufacturing methods of the wavelength conversion elements of Examples 5 and 6 will be described.

首先,作為光反射層,準備塗Ag的Al之圓盤狀的基板本體(直徑50mm、厚度0.5mm)。另,於此基板本體之中心部,開設螺孔。接著,於此基板本體,設置螢光體陶瓷層。First, as a light reflection layer, an Ag-coated Al disk-shaped substrate body (50 mm in diameter, 0.5 mm in thickness) was prepared. In addition, a screw hole is opened in the center portion of the base body. Next, on the substrate body, a phosphor ceramic layer is provided.

於螢光體陶瓷層的內側,設置中心部開設有螺孔的Al之圓盤狀的第3板構件(外徑34.5mm、厚度100μm)。另,螢光體陶瓷層為螢光環;第3板構件,設置於環狀的內側。而後,進一步,以與螢光體陶瓷層及第3板構件重疊的方式,設置中心部開設有螺孔的Al之圓盤狀的第4板構件(外徑39mm、厚度200μm)。而後,將基板本體、第3板構件及第4板構件予以螺著固定。如此地,固定螢光體陶瓷層,獲得波長轉換元件。亦即,實施例5及6之波長轉換元件中,螢光體陶瓷層,係藉由基板本體與第4板構件而包夾固定。On the inner side of the phosphor ceramic layer, a third plate member (outer diameter 34.5 mm, thickness 100 μm) of Al disk shape having a screw hole opened in the center was provided. In addition, the phosphor ceramic layer is a phosphor ring, and the third plate member is provided on the inner side of the ring. Then, a fourth plate member (outer diameter 39 mm, thickness 200 μm) of Al disc-shaped with a screw hole opened in the center was provided so as to overlap the phosphor ceramic layer and the third plate member. Then, the substrate body, the third plate member, and the fourth plate member are screwed and fixed. In this way, the phosphor ceramic layer is fixed to obtain a wavelength conversion element. That is, in the wavelength conversion elements of Examples 5 and 6, the phosphor ceramic layer is sandwiched and fixed by the substrate body and the fourth plate member.

進一步,針對波長轉換元件的評價予以說明。Further, evaluation of the wavelength conversion element will be described.

將實施例5及6之波長轉換元件,以與實施例1~3相同的方法評價。The wavelength conversion elements of Examples 5 and 6 were evaluated in the same manner as in Examples 1 to 3.

圖11係顯示本變形例的實施例5及6之波長轉換元件的評價結果之圖。具體而言,於圖11,顯示實施例5及6之波長轉換元件的螢光能量相對值(通過開口部後)、螢光能量相對值(通過開口部前)及結合效率。FIG. 11 is a graph showing the evaluation results of the wavelength conversion elements of Examples 5 and 6 of the present modification. Specifically, FIG. 11 shows the relative value of fluorescence energy (after passing through the opening), the relative value of fluorescence energy (before passing through the opening), and the binding efficiency of the wavelength conversion elements of Examples 5 and 6.

此處,螢光能量相對值(通過開口部後),係通過孔隙構件的開口部後之各個波長轉換元件放出的螢光之螢光能量的相對值。另,使通過開口部後的實施例6之波長轉換元件放出的螢光之螢光能量為100%。Here, the relative value of the fluorescence energy (after passing through the opening) is the relative value of the fluorescence energy of the fluorescence emitted by each wavelength conversion element after passing through the opening of the aperture member. In addition, the fluorescence energy of the fluorescence emitted from the wavelength conversion element of Example 6 after passing through the opening was set to 100%.

此外,螢光能量相對值(通過開口部前),係通過孔隙構件的開口部前之各個波長轉換元件放出的螢光之螢光能量的相對值。另,使通過開口部後的實施例6之波長轉換元件放出的螢光之螢光能量為100%。In addition, the relative value of fluorescence energy (before passing through the opening) is the relative value of the fluorescence energy of the fluorescence emitted by each wavelength conversion element before passing through the opening of the aperture member. In addition, the fluorescence energy of the fluorescence emitted from the wavelength conversion element of Example 6 after passing through the opening was set to 100%.

此外,結合效率,係相對於螢光能量相對值(通過開口部前)之螢光能量相對值(通過開口部後)的比例。亦即,結合效率,係將螢光能量相對值(通過開口部後)除以螢光能量相對值(通過開口部前)的值。In addition, the binding efficiency is the ratio of the relative value of fluorescence energy (after passing through the opening) to the relative value of fluorescence energy (before passing through the opening). That is, the binding efficiency is a value obtained by dividing the relative value of fluorescence energy (after passing through the opening) by the relative value of fluorescence energy (before passing through the opening).

如圖11所示,實施例5及6之波長轉換元件的螢光能量相對值(通過開口部後),分別為101%及100%。進一步,實施例5及6之波長轉換元件的螢光能量相對值(通過開口部前),分別為117%及122%。As shown in FIG. 11 , the relative values of fluorescence energy (after passing through the opening) of the wavelength conversion elements of Examples 5 and 6 were 101% and 100%, respectively. Furthermore, the relative values of fluorescence energy (before passing through the opening) of the wavelength conversion elements of Examples 5 and 6 were 117% and 122%, respectively.

此外,與本變形例之波長轉換元件1a相當的實施例5之波長轉換元件的結合效率,為87%。與實施形態之波長轉換元件1相當的實施例6之波長轉換元件的結合效率,為82%。In addition, the coupling efficiency of the wavelength conversion element of Example 5, which is equivalent to the wavelength conversion element 1a of the present modification, was 87%. The binding efficiency of the wavelength conversion element of Example 6, which is equivalent to the wavelength conversion element 1 of the embodiment, was 82%.

如同上述,實施例5之波長轉換元件所具備的螢光體陶瓷層(螢光體陶瓷層20a),由折射率彼此不同之第1結晶相與第2結晶相構成。As described above, the phosphor ceramic layer (phosphor ceramic layer 20 a ) included in the wavelength conversion element of Example 5 is composed of the first crystal phase and the second crystal phase having different refractive indices from each other.

藉此,於螢光體陶瓷層20a中產生折射率不同的區域,故激發光L1及螢光變得容易分散。其結果,實施形態之在圖5A及圖5B顯示的往層之平面方向(亦即,x軸方向或y軸方向)之導光受到抑制,螢光體陶瓷層20a的發光面積變得更小。因此,實施例5之波長轉換元件的結合效率,相較於實施例6之波長轉換元件的結合效率變得更高。亦即,實現光展量更小、光利用效率更高的實施例5之波長轉換元件(波長轉換元件1a)。在投影機具備此等波長轉換元件1a之情況,可更為提高投影機的光利用效率。As a result, regions with different refractive indices are generated in the phosphor ceramic layer 20a, so that the excitation light L1 and the fluorescent light are easily dispersed. As a result, the light guide in the plane direction (that is, the x-axis direction or the y-axis direction) of the layers shown in FIGS. 5A and 5B in the embodiment is suppressed, and the light-emitting area of the phosphor ceramic layer 20a becomes smaller. . Therefore, the coupling efficiency of the wavelength conversion element of Example 5 becomes higher than that of the wavelength conversion element of Example 6. That is, the wavelength conversion element (wavelength conversion element 1 a ) of Example 5 with smaller etendue and higher light utilization efficiency is realized. When the projector is provided with these wavelength conversion elements 1a, the light utilization efficiency of the projector can be further improved.

此外,螢光體陶瓷層20a,包含單相部、及與該單相部區別之混合相部。於單相部,僅設置第1結晶相及第2結晶相中之第1結晶相;於混合相部,混合設置第1結晶相及第2結晶相兩者。此等單相部之折射率及混合相部之折射率,彼此不同。In addition, the phosphor ceramic layer 20a includes a single-phase portion and a mixed-phase portion distinguished from the single-phase portion. In the single-phase portion, only the first crystal phase among the first crystal phase and the second crystal phase is provided; in the mixed-phase portion, both the first crystal phase and the second crystal phase are provided in a mixed manner. The refractive index of the single-phase portion and the refractive index of the mixed-phase portion are different from each other.

藉此,於螢光體陶瓷層20a中產生折射率不同的區域,故激發光L1及螢光變得更容易分散。其結果,螢光體陶瓷層20a的發光面積變得更小。因此,可實現光展量更小、光利用效率更高之波長轉換元件1a。As a result, regions with different refractive indices are generated in the phosphor ceramic layer 20a, so that the excitation light L1 and the fluorescent light are more easily dispersed. As a result, the light-emitting area of the phosphor ceramic layer 20a becomes smaller. Therefore, the wavelength conversion element 1a with smaller etendue and higher light utilization efficiency can be realized.

此外,混合相部之尺寸為上述範圍的情況,激發光L1及螢光變得更容易分散。In addition, when the size of the mixed-phase portion is within the above-mentioned range, the excitation light L1 and the fluorescent light are more easily dispersed.

此外,螢光體陶瓷層20a,包含複數混合相部。複數混合相部各自之周圍,受到單相部包圍。In addition, the phosphor ceramic layer 20a includes a plurality of mixed-phase portions. The periphery of each of the plural mixed-phase parts is surrounded by the single-phase part.

藉此,激發光L1及螢光變得更容易分散。其結果,螢光體陶瓷層20a的發光面積變得更小。因此,實現光展量更小、光利用效率更高之波長轉換元件1a。Thereby, the excitation light L1 and the fluorescent light are more easily dispersed. As a result, the light-emitting area of the phosphor ceramic layer 20a becomes smaller. Therefore, the wavelength conversion element 1a with smaller etendue and higher light utilization efficiency is realized.

上述結果顯示:不僅藉由螢光體陶瓷層20a的膜厚薄所產生的導光抑制效果,亦藉由螢光體陶瓷層20a自身的導光抑制效果,提高波長轉換元件1a的結合效率。亦即,顯示:即便未控制螢光體陶瓷層20a的膜厚,仍提高波長轉換元件1a的結合效率。The above results show that not only the light guide suppressing effect produced by the thin film thickness of the phosphor ceramic layer 20a, but also the light guide suppressing effect of the phosphor ceramic layer 20a itself, improves the bonding efficiency of the wavelength conversion element 1a. That is, it was shown that even if the film thickness of the phosphor ceramic layer 20a is not controlled, the bonding efficiency of the wavelength conversion element 1a is improved.

此外,表示第2結晶相的材料之折射率,與表示第1結晶相的材料之折射率的差,為0.05以上0.5以下。In addition, the difference between the refractive index of the material representing the second crystal phase and the refractive index of the material representing the first crystal phase is 0.05 or more and 0.5 or less.

藉此,激發光L1及螢光變得更容易分散。其結果,螢光體陶瓷層20a的發光面積變得更小。因此,實現光展量更小、光利用效率更高之波長轉換元件1a。Thereby, the excitation light L1 and the fluorescent light are more easily dispersed. As a result, the light-emitting area of the phosphor ceramic layer 20a becomes smaller. Therefore, the wavelength conversion element 1a with smaller etendue and higher light utilization efficiency is realized.

此外,第2結晶相,係以(Y1 y Cey )AlO3 (0≦y<0.1)表示之結晶相。In addition, the second crystal phase is a crystal phase represented by (Y 1 - y Ce y )AlO 3 (0≦y<0.1).

藉此,容易使表示第2結晶相的材料之折射率,與表示第1結晶相的材料之折射率的差為上述範圍。This makes it easy to make the difference between the refractive index of the material representing the second crystal phase and the refractive index of the material representing the first crystal phase within the above range.

(變形例2) 進一步,針對構成與螢光體陶瓷層20及20a不同之螢光體陶瓷層20b予以說明。(Variation 2) Further, the configuration of the phosphor ceramic layer 20b different from that of the phosphor ceramic layers 20 and 20a will be described.

圖12係本變形例之螢光體陶瓷構件的立體圖。FIG. 12 is a perspective view of the phosphor ceramic member of this modification.

本變形例之螢光體陶瓷構件,作為一例,為具有層狀之形狀的螢光體陶瓷層20b。As an example, the phosphor ceramic member of the present modification is a phosphor ceramic layer 20b having a layered shape.

螢光體陶瓷層20b,與實施形態及變形例1所示之螢光體陶瓷層20及20a同樣地,為使用在投影機之構件。Like the phosphor ceramic layers 20 and 20a shown in the embodiment and modification 1, the phosphor ceramic layer 20b is a member used in a projector.

螢光體陶瓷層20b,除了下述一點以外,具備與變形例1之螢光體陶瓷層20a同樣的構成。具體而言,該一點,係使Ce3 存在比為60%以上。The phosphor ceramic layer 20b has the same configuration as the phosphor ceramic layer 20a of Modification 1 except for the following point. Specifically, in this regard, the Ce 3 + existence ratio is set to 60% or more.

亦即,螢光體陶瓷層20b,包含具有石榴石構造之第1結晶相、及具有石榴石構造以外的構造之第2結晶相。第1結晶相與第2結晶相,折射率彼此不同。另,本變形例中,第1結晶相及第2結晶相分別為以YAG及YAP表示之結晶相;螢光體陶瓷層20b,亦主要包含第1結晶相。此外,螢光體陶瓷構件(螢光體陶瓷層20b)的密度,宜為理論密度之95%以上100%以下,更宜為理論密度之97%以上100%以下。此外,螢光體陶瓷構件(螢光體陶瓷層20b)的膜厚宜未特別限制,但在設置限制之情況,宜為50μm以上而未滿500μm,更宜為50μm以上而未滿300μm。此外,該膜厚進一步宜為50μm以上而未滿120μm。That is, the phosphor ceramic layer 20b includes a first crystal phase having a garnet structure and a second crystal phase having a structure other than the garnet structure. The first crystal phase and the second crystal phase have different refractive indices from each other. In addition, in this modification, the first crystal phase and the second crystal phase are crystal phases represented by YAG and YAP, respectively; the phosphor ceramic layer 20b also mainly includes the first crystal phase. In addition, the density of the phosphor ceramic member (phosphor ceramic layer 20b) is preferably 95% or more and 100% or less of the theoretical density, more preferably 97% or more and 100% or less of the theoretical density. In addition, the film thickness of the phosphor ceramic member (phosphor ceramic layer 20b) is preferably not particularly limited, but when a limit is set, it is preferably 50 μm or more and less than 500 μm, more preferably 50 μm or more and less than 300 μm. In addition, the film thickness is more preferably 50 μm or more and less than 120 μm.

螢光體陶瓷構件(螢光體陶瓷層20b)具備上述構成。因此,將螢光體陶瓷層20b使用在投影機,照射激發光之情況,於螢光體陶瓷層20b中產生折射率不同的區域,故激發光及螢光更為分散。其結果,實施形態之在圖5A及圖5B顯示的往層之平面方向(亦即,x軸方向或y軸方向)的導光受到抑制,螢光體陶瓷層20b的發光面積變得更小。因此,成為光展量更小、光利用效率更高之螢光體陶瓷構件。使投影機具備此等螢光體陶瓷構件(螢光體陶瓷層20b)之情況,可更為提高投影機的光利用效率。The phosphor ceramic member (phosphor ceramic layer 20 b ) has the above-described configuration. Therefore, when the phosphor ceramic layer 20b is used in a projector and irradiated with excitation light, regions with different refractive indices are generated in the phosphor ceramic layer 20b, so that the excitation light and the fluorescent light are more dispersed. As a result, the light guide in the plane direction of the layer (that is, the x-axis direction or the y-axis direction) shown in FIGS. 5A and 5B in the embodiment is suppressed, and the light-emitting area of the phosphor ceramic layer 20b becomes smaller. . Therefore, it becomes a phosphor ceramic member with smaller etendue and higher light utilization efficiency. When the projector is provided with these phosphor ceramic members (the phosphor ceramic layer 20 b ), the light utilization efficiency of the projector can be further improved.

進一步,螢光體陶瓷層20b,由具有Ce3 及Ce4 的YAG及YAP構成,亦即,螢光體陶瓷層20b,包含Ce3 及Ce4 。此處,螢光體陶瓷層20b中,滿足Ce3 ×100%/(Ce3 +Ce4 )≧60%,亦即,Ce3 存在比,為60%以上。Further, the phosphor ceramic layer 20b is composed of YAG and YAP having Ce 3 + and Ce 4 + , that is, the phosphor ceramic layer 20b includes Ce 3 + and Ce 4 + . Here, in the phosphor ceramic layer 20b, Ce 3 + ×100%/(Ce 3 + +Ce 4 + )≧60%, that is, the Ce 3 + existence ratio is 60% or more.

Ce3 存在比為60%以上之螢光體陶瓷層20b,由於Ce4 所造成的非發光緩和損耗減少,故發光效率變高。進一步,在具備此等螢光體陶瓷層20b之投影機中,可提高光利用效率。例如,可實現消耗電力低之投影機。In the phosphor ceramic layer 20b in which the Ce 3 + existence ratio is 60% or more, the non-luminescence relaxation loss due to Ce 4 + is reduced, so that the luminous efficiency becomes high. Furthermore, in the projector provided with these phosphor ceramic layers 20b, the light utilization efficiency can be improved. For example, a projector with low power consumption can be realized.

此外,由於Ce4 所造成的非發光緩和損耗減少,故螢光體陶瓷層20b的發熱減少。因此,在具備此等螢光體陶瓷層20b之投影機中,可提高激發光之最大輸入能量,亦即,可實現高輸出之投影機。In addition, since the non-emission relaxation loss due to Ce 4 + is reduced, the heat generation of the phosphor ceramic layer 20b is reduced. Therefore, in a projector provided with these phosphor ceramic layers 20b, the maximum input energy of excitation light can be increased, that is, a projector with high output can be realized.

(其他實施形態) 以上,針對本發明之波長轉換元件等,依據實施形態及變形例予以說明,但本發明並未限定於此等實施形態及變形例。若未脫離本發明之主旨,則對實施形態及變形例施以所屬技術領域中具有通常知識者所思及之各種變形者、或將實施形態及變形例中之一部分的構成要素予以組合構築之其他形態,皆包含於本發明的範圍。(Other Embodiments) As mentioned above, although the wavelength conversion element etc. of this invention were demonstrated based on embodiment and modification, this invention is not limited to these embodiment and modification. Unless deviating from the gist of the present invention, the embodiment and the modification may be constructed by various modifications that are conceivable by those skilled in the art, or by combining some of the constituent elements of the embodiment and the modification Other forms are included in the scope of the present invention.

另,實施形態中,光源為半導體雷射光源,但未限定於此一形態,亦可為LED光源。In addition, in embodiment, although the light source is a semiconductor laser light source, it is not limited to this form, An LED light source may be sufficient as it.

此外,上述實施形態,可於發明申請專利範圍或其均等範圍中進行各種變更、置換、附加、省略等。In addition, various changes, substitutions, additions, omissions, and the like can be made in the above-described embodiments within the scope of the claims of the invention or their equivalents.

1,1a,1x:波長轉換元件 10:基板 100:投影機 11:基板本體 12:光反射層 121:光散射性粒子 122:黏結劑 13:光反射面 2:孔隙構件 2a:開口部 20,20a,20b,20x:螢光體陶瓷層 3:光源 30:防止反射層 4:馬達 5:分光鏡 6:顯示元件 7:投射光學構件 8:反射鏡 D,Dx:距離 L1:激發光 L12:透射光 L2,L2x:反射光1, 1a, 1x: wavelength conversion element 10: Substrate 100: Projector 11: Substrate body 12: Light reflection layer 121: Light Scattering Particles 122: Binder 13: light reflecting surface 2: Pore member 2a: Opening 20, 20a, 20b, 20x: phosphor ceramic layer 3: Light source 30: Anti-reflection layer 4: Motor 5: Beamsplitter 6: Display components 7: Projection optics 8: Reflector D, Dx: distance L1: Excitation light L12: transmitted light L2, L2x: Reflected light

圖1係實施形態之波長轉換元件的立體圖。 圖2係顯示圖1的II-II線之波長轉換元件的截斷面之剖面圖。 圖3係顯示實施形態之投影機的外觀之立體圖。 圖4係實施形態之投影機的光學系統之示意圖。 圖5A係實施形態之波長轉換元件與孔隙構件之示意圖。 圖5B係實施形態的比較例之波長轉換元件與孔隙構件之示意圖。 圖6係顯示實施形態的實施例及比較例之波長轉換元件的評價結果之圖。 圖7係顯示實施形態的實施例之波長轉換元件的評價結果之圖。 圖8係變形例1之波長轉換元件的立體圖。 圖9係顯示圖8的IX-IX線之波長轉換元件的截斷面之剖面圖。 圖10(a)~(c)係顯示變形例1的實施例之螢光體陶瓷層的剖面之SEM影像。 圖11係顯示變形例1的實施例之波長轉換元件的評價結果之圖。 圖12係顯示變形例2之螢光體陶瓷構件的立體圖。FIG. 1 is a perspective view of a wavelength conversion element according to an embodiment. FIG. 2 is a cross-sectional view showing a cross-section of the wavelength conversion element along the line II-II of FIG. 1 . FIG. 3 is a perspective view showing the appearance of the projector according to the embodiment. FIG. 4 is a schematic diagram of the optical system of the projector according to the embodiment. FIG. 5A is a schematic diagram of the wavelength conversion element and the aperture member of the embodiment. 5B is a schematic diagram of the wavelength conversion element and the aperture member in the comparative example of the embodiment. FIG. 6 is a graph showing the evaluation results of the wavelength conversion elements of Examples and Comparative Examples of the embodiment. FIG. 7 is a graph showing the evaluation result of the wavelength conversion element of the example of the embodiment. FIG. 8 is a perspective view of the wavelength conversion element of Modification 1. FIG. FIG. 9 is a cross-sectional view showing a cross-section of the wavelength conversion element on line IX-IX of FIG. 8 . FIGS. 10( a ) to ( c ) are SEM images showing the cross section of the phosphor ceramic layer of the Example of Modification 1. FIG. FIG. 11 is a graph showing the evaluation results of the wavelength conversion element of the Example of Modification 1. FIG. FIG. 12 is a perspective view showing a phosphor ceramic member of Modification 2. FIG.

1:波長轉換元件1: wavelength conversion element

10:基板10: Substrate

11:基板本體11: Substrate body

12:光反射層12: Light reflection layer

13:光反射面13: light reflecting surface

20:螢光體陶瓷層20: phosphor ceramic layer

30:防止反射層30: Anti-reflection layer

121:光散射性粒子121: Light Scattering Particles

122:黏結劑122: Binder

L1:激發光L1: Excitation light

Claims (16)

一種波長轉換元件,使用在投影機,接收激發光,放出包含螢光的反射光,包含: 基板,具有光反射面;以及 螢光體陶瓷層,位於該光反射面的上方,包含具有石榴石構造之第1結晶相; 該光反射面的可見光反射率為95%以上100%以下; 該螢光體陶瓷層的密度為理論密度之97%以上100%以下; 該螢光體陶瓷層的膜厚為50μm以上而未滿120μm。A wavelength conversion element, used in a projector, receives excitation light and emits reflected light including fluorescent light, comprising: a substrate having a light reflecting surface; and a phosphor ceramic layer, located above the light-reflecting surface, comprising a first crystal phase having a garnet structure; The visible light reflectance of the light reflecting surface is more than 95% and less than 100%; The density of the phosphor ceramic layer is more than 97% and less than 100% of the theoretical density; The film thickness of the phosphor ceramic layer is 50 μm or more and less than 120 μm. 如請求項1之波長轉換元件,其中, 該螢光體陶瓷層的膜厚為70μm以上而未滿120μm。The wavelength conversion element of claim 1, wherein, The film thickness of the phosphor ceramic layer is 70 μm or more and less than 120 μm. 如請求項1之波長轉換元件,其中, 更包含防止反射層,其位於該螢光體陶瓷層的上方,防止該激發光之反射。The wavelength conversion element of claim 1, wherein, It further comprises an anti-reflection layer, which is located above the phosphor ceramic layer to prevent the reflection of the excitation light. 如請求項1之波長轉換元件,其中, 該基板,包含基板本體及光反射層; 該光反射面,係由該光反射層包含之一面所構成。The wavelength conversion element of claim 1, wherein, The substrate includes a substrate body and a light reflection layer; The light reflection surface is formed by a surface included in the light reflection layer. 如請求項4之波長轉換元件,其中, 該光反射層,包含光散射性粒子。The wavelength conversion element of claim 4, wherein, The light-reflecting layer contains light-scattering particles. 如請求項4之波長轉換元件,其中, 該光反射層,包含Ag。The wavelength conversion element of claim 4, wherein, The light reflection layer contains Ag. 如請求項1之波長轉換元件,其中, 該螢光體陶瓷層,係由以(Y1 x Cex3 Al5 O12 (0.001≦x<0.1)表示之該第1結晶相構成。The wavelength conversion element of claim 1, wherein the phosphor ceramic layer is composed of the first crystal phase represented by (Y 1 - x Ce x ) 3 Al 5 O 12 (0.001≦x<0.1). 如請求項1之波長轉換元件,其中, 該螢光體陶瓷層的密度為4.41g/cm3 以上4.55g/cm3 以下。The wavelength conversion element according to claim 1, wherein the density of the phosphor ceramic layer is 4.41 g/cm 3 or more and 4.55 g/cm 3 or less. 如請求項1之波長轉換元件,其中, 該螢光體陶瓷層,更包含具有與石榴石構造不同的構造之第2結晶相。The wavelength conversion element of claim 1, wherein, The phosphor ceramic layer further includes a second crystal phase having a structure different from the garnet structure. 如請求項9之波長轉換元件,其中, 該螢光體陶瓷層,包含單相部、及與該單相部區別之混合相部; 於該單相部,僅設置該第1結晶相及該第2結晶相中之該第1結晶相; 於該混合相部,混合設置該第1結晶相及該第2結晶相兩者。The wavelength conversion element of claim 9, wherein, The phosphor ceramic layer includes a single-phase portion and a mixed-phase portion different from the single-phase portion; In the single-phase portion, only the first crystal phase among the first crystal phase and the second crystal phase is provided; In the mixed phase portion, both the first crystal phase and the second crystal phase are provided in a mixed manner. 如請求項10之波長轉換元件,其中, 該螢光體陶瓷層,包含複數該混合相部; 該複數混合相部各自之周圍,受到該單相部包圍。The wavelength conversion element of claim 10, wherein, The phosphor ceramic layer includes a plurality of the mixed-phase portions; The periphery of each of the plurality of mixed-phase parts is surrounded by the single-phase part. 如請求項9之波長轉換元件,其中, 表示該第2結晶相的材料之折射率,與表示該第1結晶相的材料之折射率的差,為0.05以上0.5以下。The wavelength conversion element of claim 9, wherein, The difference between the refractive index of the material representing the second crystal phase and the refractive index of the material representing the first crystal phase is 0.05 or more and 0.5 or less. 如請求項9之波長轉換元件,其中, 該第2結晶相,係以(Y1 y Cey )AlO3 (0≦y<0.1)表示之結晶相。The wavelength conversion element according to claim 9, wherein the second crystal phase is a crystal phase represented by (Y 1 - y C y )AlO 3 (0≦y<0.1). 如請求項1至13中任一項之波長轉換元件,其中, 該螢光體陶瓷層,包含Ce3 及Ce4 ; 滿足Ce3 ×100%/(Ce3 +Ce4 )≧60%。The wavelength conversion element according to any one of claims 1 to 13, wherein the phosphor ceramic layer contains Ce 3 + and Ce 4 + ; and Ce 3 + ×100%/(Ce 3 + +Ce 4 + )≧ 60%. 一種投影機,包含: 激發光源,放出激發光;以及 如請求項1至14中任一項之波長轉換元件,接收該激發光,放出包含螢光的反射光。A projector comprising: an excitation light source that emits excitation light; and The wavelength conversion element according to any one of claims 1 to 14 receives the excitation light and emits reflected light including fluorescence. 一種螢光體陶瓷構件,使用在投影機,其包含: 第1結晶相,具有石榴石構造;以及 第2結晶相,具有石榴石構造以外的構造; 該螢光體陶瓷構件的密度為理論密度之97%以上100%以下; 該螢光體陶瓷構件的膜厚為50μm以上而未滿300μm。A phosphor ceramic component used in a projector, comprising: a first crystalline phase having a garnet structure; and The second crystal phase has a structure other than the garnet structure; The density of the phosphor ceramic component is more than 97% and less than 100% of the theoretical density; The film thickness of the phosphor ceramic member is 50 μm or more and less than 300 μm.
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