TW202138846A - Varaiable focal length optical element - Google Patents

Varaiable focal length optical element Download PDF

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TW202138846A
TW202138846A TW109113250A TW109113250A TW202138846A TW 202138846 A TW202138846 A TW 202138846A TW 109113250 A TW109113250 A TW 109113250A TW 109113250 A TW109113250 A TW 109113250A TW 202138846 A TW202138846 A TW 202138846A
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layer
light
optical element
substrate
piezoelectric film
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TW109113250A
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Chinese (zh)
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陳美玲
童璽文
吳名清
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中光電智能感測股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/004Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/02Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]

Abstract

A variable focal length optical element is provided. The variable focal length optical element includes a first substrate, a bearing layer, a piezoelectric film, a driving electrode and a light transmitting layer. The first substrate has a first surface and a second surface opposite to each other. The bearing layer is located on the first surface of the first substrate and has a light-passing region penetrating the bearing layer. The bearing layer has a convex protruding structure, which surrounds the light-passing region, wherein the convex protruding structure extends from the first surface of the first substrate to the center of the light-passing region in the radial direction of the light-passing region. The piezoelectric film is located on the bearing layer.

Description

可變焦距光學元件Variable focus optics

本發明是有關於一種光學元件,且特別是有關於一種可變焦距光學元件。The present invention relates to an optical element, and particularly relates to a variable focal length optical element.

具有變焦能力的光學元件已多元應用於各式光學系統中,如具自動對焦的成像光學、適應性光學系統、光開關、虛擬實境(Virtual Reality, VR)或擴增實境(Augmented Reality, AR)穿戴顯示裝置等。常見的變焦光學元件依其原理主要可區分為兩類,第一類的變焦光學元件為利用透鏡間光軸方向相對距離變化來達到變焦的功能,第二類的變焦光學元件為具有可變形(Deformable)的光學透鏡。Optical components with zoom capability have been applied to various optical systems, such as imaging optics with autofocus, adaptive optical systems, light switches, virtual reality (VR) or augmented reality (Augmented Reality, AR) Wearable display devices, etc. Common zoom optical elements can be divided into two types according to their principles. The first type of zoom optical elements use the relative distance between the optical axis directions of the lenses to achieve the zoom function, and the second type of zoom optical elements are deformable ( Deformable) optical lens.

具體而言,第一類的變焦光學元件至少有一透鏡需外加線性驅動裝置,以使透鏡相對距離變化來達成光學變焦的目的。因此,會有體積較大、精度控制難度較高、驅動噪音等缺點。另一方面,第二類的變焦光學元件因採用可變形的光學透鏡,無須線性驅動單元;具有體積小、精度高、響應快、無聲作動等優點。在具有可變形光學透鏡的光學變焦元件中,以壓電效應驅動的變焦光學元件具有高達數十仟赫茲(kHz)以上的響應速率,且可利用製作微機電系統(Micro Electro Mechanical System, MEMS)的製程製作,可將光學變焦元件的結構更進一步微型化與大量生產,因此具有廣泛的商業應用性。Specifically, at least one lens of the first type of zoom optical element requires an external linear drive device to change the relative distance of the lens to achieve the objective of optical zoom. Therefore, there are disadvantages such as larger volume, higher difficulty in precision control, and driving noise. On the other hand, the second type of zoom optical element uses a deformable optical lens and does not require a linear drive unit; it has the advantages of small size, high precision, fast response, and silent operation. Among the optical zoom elements with deformable optical lenses, the zoom optical elements driven by the piezoelectric effect have a response rate of more than tens of thousands of hertz (kHz), and can be used to produce Micro Electro Mechanical System (MEMS) The manufacturing process can further miniaturize the structure of the optical zoom element and mass production, so it has a wide range of commercial applications.

“先前技術”段落只是用來幫助了解本發明內容,因此在“先前技術”段落所揭露的內容可能包含一些沒有構成所屬技術領域中具有通常知識者所知道的習知技術。在“先前技術”段落所揭露的內容,不代表該內容或者本發明一個或多個實施例所要解決的問題,在本發明申請前已被所屬技術領域中具有通常知識者所知曉或認知。The "prior art" paragraph is only used to help understand the content of the present invention, so the contents disclosed in the "prior art" paragraph may include some conventional technologies that do not constitute the common knowledge in the technical field. The content disclosed in the "prior art" paragraph does not represent the content or the problem to be solved by one or more embodiments of the present invention, and has been known or recognized by those with ordinary knowledge in the technical field before the application of the present invention.

本發明提供一種可變焦距光學元件,其製程簡易且具有穩定的光學特性。The invention provides a variable focal length optical element, which has a simple manufacturing process and stable optical characteristics.

本發明的其他目的和優點可以從本發明所揭露的技術特徵中得到進一步的了解。The other objectives and advantages of the present invention can be further understood from the technical features disclosed in the present invention.

為達上述之一或部份或全部目的或是其他目的,本發明的一實施例提出一種可變焦距光學元件。可變焦距光學元件包括第一基板、承載層、壓電薄膜、驅動電極以及透光層。第一基板具有相對的第一表面與第二表面,第一基板具有第一腔體,其中第一腔體貫穿第一表面與第二表面。承載層位於第一基板的第一表面上且具有貫穿承載層的光通區域,承載層具有凸伸結構,凸伸結構圍成光通區域,其中凸伸結構在光通區域的徑向方向上自第一基板的第一表面向光通區域的中心延伸。壓電薄膜位於承載層上。驅動電極位於承載層上,用於驅動壓電薄膜,其中驅動電極施加驅動電壓至壓電薄膜,以使壓電薄膜產生伸縮形變並拉動凸伸結構彎曲形變。透光層,重疊設置於凸伸結構,且透光層覆蓋光通區域。In order to achieve one or part or all of the above objectives or other objectives, an embodiment of the present invention provides a variable focal length optical element. The variable focus optical element includes a first substrate, a carrying layer, a piezoelectric film, a driving electrode, and a light-transmitting layer. The first substrate has a first surface and a second surface opposite to each other. The first substrate has a first cavity, wherein the first cavity penetrates the first surface and the second surface. The supporting layer is located on the first surface of the first substrate and has a light passing area penetrating the supporting layer. The supporting layer has a convex structure that encloses the light passing area, wherein the convex structure is in the radial direction of the light passing area It extends from the first surface of the first substrate to the center of the light-passing area. The piezoelectric film is located on the carrier layer. The driving electrode is located on the carrier layer and is used to drive the piezoelectric film, wherein the driving electrode applies a driving voltage to the piezoelectric film to cause the piezoelectric film to stretch and deform and pull the convex structure to bend and deform. The light-transmitting layer is overlapped and arranged on the protruding structure, and the light-transmitting layer covers the light-passing area.

在本發明的一實施例中,上述的可變焦距光學元件還包括第二基板以及彈性膜,第二基板位於第一基板的第二表面上且具有至少一第二腔體,至少一第二腔體與第一基板的第一腔體連通,以及第二基板位於彈性膜與第一基板之間,彈性膜覆蓋第二基板,且彈性膜的彈性係數小於透光層的彈性係數。In an embodiment of the present invention, the aforementioned variable focus optical element further includes a second substrate and an elastic film. The second substrate is located on the second surface of the first substrate and has at least one second cavity and at least one second cavity. The cavity is in communication with the first cavity of the first substrate, and the second substrate is located between the elastic film and the first substrate, the elastic film covers the second substrate, and the elastic coefficient of the elastic film is smaller than the elastic coefficient of the light-transmitting layer.

在本發明的一實施例中,上述的承載層包括第一絕緣層、第二絕緣層以及晶圓層。第二絕緣層與第一絕緣層重疊設置。晶圓層位於第一絕緣層與第二絕緣層之間,其中壓電薄膜設置於第一絕緣層上,且透光層設置於壓電薄膜上。In an embodiment of the present invention, the above-mentioned carrier layer includes a first insulating layer, a second insulating layer, and a wafer layer. The second insulating layer is overlapped with the first insulating layer. The wafer layer is located between the first insulating layer and the second insulating layer, wherein the piezoelectric film is disposed on the first insulating layer, and the light-transmitting layer is disposed on the piezoelectric film.

在本發明的一實施例中,上述的透光層的材料包含高分子材料或玻璃。In an embodiment of the present invention, the material of the above-mentioned light-transmitting layer includes a polymer material or glass.

在本發明的一實施例中,上述的透光層為第一絕緣層,承載層包括第二絕緣層以及晶圓層,第一絕緣層疊設於晶圓層上,且晶圓層位於第二絕緣層與透光層之間。In an embodiment of the present invention, the above-mentioned light-transmitting layer is a first insulating layer, the carrier layer includes a second insulating layer and a wafer layer, the first insulating layer is stacked on the wafer layer, and the wafer layer is located on the second insulating layer. Between the insulating layer and the light-transmitting layer.

在本發明的一實施例中,上述的承載層包括第一絕緣層以及晶圓層,透光層為第二絕緣層,晶圓層位於第一絕緣層與透光層之間,透光層位於第一基板與晶圓層之間,其中可變焦距光學元件更包括輔助壓電薄膜,輔助壓電薄膜設置於透光層上。In an embodiment of the present invention, the above-mentioned carrier layer includes a first insulating layer and a wafer layer, the light-transmitting layer is a second insulating layer, the wafer layer is located between the first insulating layer and the light-transmitting layer, and the light-transmitting layer Located between the first substrate and the wafer layer, the variable focus optical element further includes an auxiliary piezoelectric film, and the auxiliary piezoelectric film is disposed on the light-transmitting layer.

在本發明的一實施例中,上述的承載層包括第二絕緣層以及晶圓層,第二絕緣層位於第一基板與晶圓層之間,透光層位於晶圓層與壓電薄膜之間,且壓電薄膜覆蓋光通區域,其中該透光層的材料包含高分子材料或玻璃。In an embodiment of the present invention, the above-mentioned carrier layer includes a second insulating layer and a wafer layer, the second insulating layer is located between the first substrate and the wafer layer, and the light-transmitting layer is located between the wafer layer and the piezoelectric film. The piezoelectric film covers the light-transmitting area, and the material of the light-transmitting layer includes polymer material or glass.

在本發明的一實施例中,上述的驅動電極的形狀為環狀,且驅動電極環繞光通區域。In an embodiment of the present invention, the shape of the aforementioned driving electrode is ring-shaped, and the driving electrode surrounds the light-passing area.

在本發明的一實施例中,上述的驅動電極包含複數個圓弧狀電極,這些圓弧狀電極排列在圓環區域上,圓環區域環繞光通區域,且任一圓弧狀電極的驅動電壓的極性方向與相鄰的這些圓弧狀電極所施加的驅動電壓的極性方向相反。In an embodiment of the present invention, the above-mentioned driving electrode includes a plurality of arc-shaped electrodes, these arc-shaped electrodes are arranged on the ring area, the ring area surrounds the light transmission area, and any arc-shaped electrode drives The polarity direction of the voltage is opposite to the polarity direction of the driving voltage applied by these adjacent arc-shaped electrodes.

在本發明的一實施例中,上述的驅動電壓的範圍介於0至50伏特之間。In an embodiment of the present invention, the above-mentioned driving voltage ranges from 0 to 50 volts.

在本發明的一實施例中,上述的壓電薄膜具有開孔區域,且開孔區域的邊界與光通區域的邊界相同。In an embodiment of the present invention, the above-mentioned piezoelectric film has an open area, and the boundary of the open area is the same as the boundary of the light transmission area.

在本發明的一實施例中,上述的可變焦距光學元件還包括光學液體,適於填滿第一腔體,其中透光層直接接觸光學液體。In an embodiment of the present invention, the aforementioned variable focal length optical element further includes an optical liquid suitable for filling the first cavity, wherein the light-transmitting layer directly contacts the optical liquid.

基於上述,本發明的實施例至少具有以下其中一個優點或功效。在本發明的實施例中,可變焦距光學元件可採用預定的驅動電壓施加至壓電薄膜,以使壓電薄膜產生應力變形,進而帶動承載層的凸伸結構以及透光層產生形變。並且,承載層可應用絕緣層上覆矽的製程技術來製作,而可與現有製程技術整合,製作簡易。此外,可變焦距光學元件藉由彈性係數相對較小的彈性膜的設置,而使位於光通區域內的壓電薄膜在不同環境條件下仍能在施加驅動電壓時保持近似於球面的形狀,而有效維持可變焦距光學元件的光學品質。Based on the above, the embodiments of the present invention have at least one of the following advantages or effects. In the embodiment of the present invention, the variable focus optical element can be applied to the piezoelectric film with a predetermined driving voltage to cause the piezoelectric film to produce stress and deformation, which in turn drives the convex structure of the carrier layer and the light-transmitting layer to deform. In addition, the carrier layer can be fabricated by using the process technology of covering silicon on the insulating layer, and can be integrated with the existing process technology for easy fabrication. In addition, the variable focus optical element is provided with an elastic film with a relatively small elastic coefficient, so that the piezoelectric film located in the luminous flux region can still maintain an approximate spherical shape when the driving voltage is applied under different environmental conditions. And effectively maintain the optical quality of the variable focal length optical element.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail in conjunction with the accompanying drawings.

有關本發明之前述及其他技術內容、特點與功效,在以下配合參考圖式之一較佳實施例的詳細說明中,將可清楚的呈現。以下實施例中所提到的方向用語,例如:上、下、左、右、前或後等,僅是參考附加圖式的方向。因此,使用的方向用語是用來說明並非用來限制本發明。The foregoing and other technical content, features, and effects of the present invention will be clearly presented in the following detailed description of a preferred embodiment with reference to the drawings. The directional terms mentioned in the following embodiments, for example: up, down, left, right, front or back, etc., are only directions for referring to the attached drawings. Therefore, the directional terms used are used to illustrate but not to limit the present invention.

圖1A是依照本發明的實施例的一種可變焦距光學元件的剖視示意圖。圖1B是圖1A的可變焦距光學元件的俯視示意圖。請參照圖1A,本實施例的可變焦距光學元件100包括第一基板110、壓電薄膜120、光學液體130、承載層140、驅動電極150、透光層160、第二基板170以及彈性膜180。應注意的是,為了凸顯本發明的重要技術特徵,圖式僅表示示意圖,並非以比例來繪製。在本實施例中,第一基板110的材質例如為矽(Silicon) ,但本發明不以此為限。在本實施例中,壓電薄膜120為透光材質,例如可為單晶(single crystal)材料的壓電薄膜,但本發明亦不以此為限,在其他實施例中,壓電薄膜120可為非透光材料。在本實施例中,光學液體130的材料為此技術領域人員可知道的透光材料,在此即不贅述。透光層160的材質例如包含有機分子材料、高分子材料或玻璃(氧化矽)的透明材料,第二基板170的材質例如為玻璃,彈性膜180的材質例如為聚對二甲苯(Parylene)或聚二甲基矽氧烷(Polydimethylsiloxane, PDMS),但本發明不以此為限。FIG. 1A is a schematic cross-sectional view of a variable focal length optical element according to an embodiment of the present invention. FIG. 1B is a schematic top view of the variable focal length optical element of FIG. 1A. 1A, the variable focus optical element 100 of this embodiment includes a first substrate 110, a piezoelectric film 120, an optical liquid 130, a carrier layer 140, a driving electrode 150, a light-transmitting layer 160, a second substrate 170, and an elastic film 180. It should be noted that, in order to highlight the important technical features of the present invention, the drawings only represent schematic diagrams, and are not drawn to scale. In this embodiment, the material of the first substrate 110 is, for example, silicon, but the invention is not limited to this. In this embodiment, the piezoelectric film 120 is made of a light-transmitting material, such as a single crystal (single crystal) piezoelectric film, but the present invention is not limited to this. In other embodiments, the piezoelectric film 120 It can be a non-light-transmitting material. In this embodiment, the material of the optical liquid 130 is a light-transmitting material known to those skilled in the art, and will not be repeated here. The material of the light-transmitting layer 160 includes, for example, organic molecular materials, polymer materials, or transparent materials such as glass (silica), the material of the second substrate 170 is, for example, glass, and the material of the elastic film 180 is, for example, Parylene or Polydimethylsiloxane (PDMS), but the present invention is not limited to this.

具體而言,如圖1A所示,在本實施例中,第一基板110具有相對的第一表面111與第二表面112,且第一基板110具有第一腔體113,例如第一腔體113位於第一基板110的中央處,其中第一腔體113貫穿第一表面111與第二表面112。此外,在本實施例中,第二基板170位於第一基板110的第二表面112上,其中第二基板170具有至少一第二腔體171。舉例而言,如圖1A與圖1B所示,在本實施例中,至少一第二腔體171包含多個圓柱狀腔體CH,其中至少一第二腔體171與第一基板110的第一腔體113連通,但本發明不以此為限。在其他的實施例中,第二腔體171可為三角柱、四角柱或其他外型的腔體,本發明不特別限制。Specifically, as shown in FIG. 1A, in this embodiment, the first substrate 110 has a first surface 111 and a second surface 112 opposite to each other, and the first substrate 110 has a first cavity 113, such as a first cavity. 113 is located at the center of the first substrate 110, wherein the first cavity 113 penetrates the first surface 111 and the second surface 112. In addition, in this embodiment, the second substrate 170 is located on the second surface 112 of the first substrate 110, wherein the second substrate 170 has at least one second cavity 171. For example, as shown in FIG. 1A and FIG. 1B, in this embodiment, at least one second cavity 171 includes a plurality of cylindrical cavities CH, of which at least one second cavity 171 and the first substrate 110 A cavity 113 is connected, but the invention is not limited to this. In other embodiments, the second cavity 171 may be a triangular column, a quadrangular column, or a cavity with other shapes, and the present invention is not particularly limited.

進一步而言,如圖1A所示,在本實施例中,光學液體130適於填滿第一腔體113,且光學液體130亦會填滿至少一第二腔體171。在本實施例中,第二基板170位於彈性膜180與第一基板110的第二表面112之間,彈性膜180覆蓋第二基板170與至少一第二腔體171,以密封光學液體130。另一方面,透光層160位於第一基板110的第一表面111上,而填滿第一腔體113與第二腔體171的光學液體130會直接接觸透光層160與彈性膜180。Furthermore, as shown in FIG. 1A, in this embodiment, the optical liquid 130 is suitable to fill the first cavity 113, and the optical liquid 130 also fills at least one second cavity 171. In this embodiment, the second substrate 170 is located between the elastic film 180 and the second surface 112 of the first substrate 110, and the elastic film 180 covers the second substrate 170 and at least one second cavity 171 to seal the optical liquid 130. On the other hand, the light-transmitting layer 160 is located on the first surface 111 of the first substrate 110, and the optical liquid 130 filling the first cavity 113 and the second cavity 171 directly contacts the light-transmitting layer 160 and the elastic film 180.

另一方面,如圖1A所示,在本實施例中,承載層140位於第一基板110的第一表面111上。更具體而言,如圖1A所示,在本實施例中,承載層140包括第一絕緣層IL1、第二絕緣層IL2以及晶圓層WF。第二絕緣層IL2與第一絕緣層IL1重疊設置。晶圓層WF位於第一絕緣層IL1與第二絕緣層IL2之間。舉例而言,在本實施例中,晶圓層WF的材質例如為矽(Silicon),第一絕緣層IL1與第二絕緣層IL2的材質例如為矽氧化物。如此,承載層140可應用絕緣層上覆矽(Silicon-on-Insulator;SOI)的製程技術來製作,而可與現有製程技術整合,製作簡易。On the other hand, as shown in FIG. 1A, in this embodiment, the carrier layer 140 is located on the first surface 111 of the first substrate 110. More specifically, as shown in FIG. 1A, in this embodiment, the carrier layer 140 includes a first insulating layer IL1, a second insulating layer IL2, and a wafer layer WF. The second insulating layer IL2 is overlapped with the first insulating layer IL1. The wafer layer WF is located between the first insulating layer IL1 and the second insulating layer IL2. For example, in this embodiment, the material of the wafer layer WF is, for example, silicon, and the material of the first insulating layer IL1 and the second insulating layer IL2 is, for example, silicon oxide. In this way, the carrier layer 140 can be fabricated using a silicon-on-insulator (SOI) process technology, and can be integrated with the existing process technology, making it easy to manufacture.

如圖1A所示,在本實施例中,承載層140具有貫穿承載層140的光通區域CA。進一步而言,承載層140具有凸伸結構PS,凸伸結構PS圍成光通區域CA,其中凸伸結構PS在光通區域CA的徑向方向R上自第一基板110的第一表面111向光通區域CA的中心延伸,意即,承載層140完全覆蓋第一基板110的第一表面111並向光通區域CA的中心延伸,延伸的部分即為凸伸結構PS。換句話說,光通區域CA在第一基板110的投影面積小於第一腔體113在第一基板110的投影面積。特別說明的是,在本實施例中,承載層140的凸伸結構PS由晶圓層WF及第一絕緣層IL1所組成(意即,第二絕緣層IL2的邊界與第一基板110的邊界相同),但本發明不以此為限。在其他實施例中,承載層140可為單一層結構,承載層140向光通區域CA的中心延伸而形成凸伸結構PS,承載層140可例如為絕緣層或半導體層。As shown in FIG. 1A, in this embodiment, the carrier layer 140 has a light pass area CA penetrating the carrier layer 140. Furthermore, the carrier layer 140 has a protruding structure PS, the protruding structure PS encloses the light passing area CA, wherein the protruding structure PS extends from the first surface 111 of the first substrate 110 in the radial direction R of the light passing area CA. Extending to the center of the light-passing area CA means that the carrier layer 140 completely covers the first surface 111 of the first substrate 110 and extends to the center of the light-passing area CA, and the extended part is the protruding structure PS. In other words, the projected area of the light-passing area CA on the first substrate 110 is smaller than the projected area of the first cavity 113 on the first substrate 110. Specifically, in this embodiment, the protruding structure PS of the carrier layer 140 is composed of the wafer layer WF and the first insulating layer IL1 (that is, the boundary of the second insulating layer IL2 and the boundary of the first substrate 110 Same), but the present invention is not limited to this. In other embodiments, the carrier layer 140 may be a single-layer structure, and the carrier layer 140 extends toward the center of the light-passing area CA to form the protruding structure PS. The carrier layer 140 may be, for example, an insulating layer or a semiconductor layer.

如圖1A所示,壓電薄膜120位於承載層140上,其中壓電薄膜120設置於第一絕緣層IL1上,且透光層160位於壓電薄膜120上。但本發明亦不以此為限,在其他實施例中,亦可將透光層160設置於壓電薄膜120與承載層140之間,或是通過其他的疊構方式來形成壓電薄膜120與透光層160。壓電薄膜120具有開孔區域,且開孔區域的邊界與光通區域CA的邊界相同,但本發明不以此為限。在其他實施例中,壓電薄膜120的開孔區域在第一基板110的投影面積可大於或等於光通區域CA在第一基板110的投影面積。如圖1A所示,在本實施例中,透光層160重疊設置於壓電薄膜120與承載層140的凸伸結構PS上,且透光層160覆蓋光通區域CA。As shown in FIG. 1A, the piezoelectric film 120 is located on the carrier layer 140, wherein the piezoelectric film 120 is disposed on the first insulating layer IL1, and the light-transmitting layer 160 is located on the piezoelectric film 120. However, the present invention is not limited to this. In other embodiments, the light-transmitting layer 160 may be disposed between the piezoelectric film 120 and the carrier layer 140, or the piezoelectric film 120 may be formed by other stacking methods. With light-transmitting layer 160. The piezoelectric film 120 has an open area, and the boundary of the open area is the same as the boundary of the light passing area CA, but the present invention is not limited to this. In other embodiments, the projected area of the opening area of the piezoelectric film 120 on the first substrate 110 may be greater than or equal to the projected area of the light-passing area CA on the first substrate 110. As shown in FIG. 1A, in this embodiment, the light-transmitting layer 160 is overlapped and disposed on the protrusion structure PS of the piezoelectric film 120 and the carrier layer 140, and the light-transmitting layer 160 covers the light-passing area CA.

更具體而言,如圖1B所示,在本實施例中,透光層160在第一基板110上的投影範圍會完全覆蓋光通區域CA,而光通區域CA在第一基板110的投影區域與第一腔體113重疊。此外,如圖1B所示,在本實施例中,第一腔體113在第一基板110上的投影範圍與至少一第二腔體171在第一基板110上的投影範圍至少部分重疊。特別說明的是,第二腔體117在第一基板110上的投影範圍與光通區域CA在第一基板110上的投影範圍不會重疊,如此可以確保第二腔體117的設置不會影響光線通過光通區域CA的光學表現。More specifically, as shown in FIG. 1B, in this embodiment, the projection range of the light-transmitting layer 160 on the first substrate 110 completely covers the light-passing area CA, and the projection of the light-passing area CA on the first substrate 110 The area overlaps with the first cavity 113. In addition, as shown in FIG. 1B, in this embodiment, the projection range of the first cavity 113 on the first substrate 110 and the projection range of the at least one second cavity 171 on the first substrate 110 at least partially overlap. In particular, the projection range of the second cavity 117 on the first substrate 110 and the projection range of the light-passing area CA on the first substrate 110 will not overlap, which ensures that the setting of the second cavity 117 will not affect Optical performance of light passing through the luminous area CA.

接著,請繼續參照圖1A與圖1B,在本實施例中,驅動電極150位於承載層140上,用於驅動壓電薄膜120。舉例而言,如圖1A所示,在本實施例中,壓電薄膜120分別被對應的驅動電極150夾持。這些驅動電極150包括第一驅動電極151與第二驅動電極152,其中第一驅動電極151、壓電薄膜120、第二驅動電極152自下而上依序相疊於承載層140上。更詳細而言,如圖1A所示,在本實施例中,壓電薄膜120具有相對的外表面120a與內表面120b,其中外表面120a面向透光層160,內表面120b面向承載層140。第一驅動電極151位於承載層140與壓電薄膜120的內表面120b之間。第二驅動電極152位於壓電薄膜120的外表面120a與透光層160之間。舉例而言,第一驅動電極151與第二驅動電極152的材質分別可為鉑與金。並且,如圖1B所示,驅動電極150的形狀為環狀,而驅動電極150環繞光通區域CA。Next, please continue to refer to FIG. 1A and FIG. 1B. In this embodiment, the driving electrode 150 is located on the carrier layer 140 and is used to drive the piezoelectric film 120. For example, as shown in FIG. 1A, in this embodiment, the piezoelectric films 120 are respectively clamped by the corresponding driving electrodes 150. The driving electrodes 150 include a first driving electrode 151 and a second driving electrode 152. The first driving electrode 151, the piezoelectric film 120, and the second driving electrode 152 are sequentially stacked on the carrier layer 140 from bottom to top. In more detail, as shown in FIG. 1A, in this embodiment, the piezoelectric film 120 has an outer surface 120 a and an inner surface 120 b opposite to each other. The outer surface 120 a faces the light-transmitting layer 160, and the inner surface 120 b faces the carrier layer 140. The first driving electrode 151 is located between the carrier layer 140 and the inner surface 120 b of the piezoelectric film 120. The second driving electrode 152 is located between the outer surface 120 a of the piezoelectric film 120 and the light-transmitting layer 160. For example, the materials of the first driving electrode 151 and the second driving electrode 152 may be platinum and gold, respectively. Moreover, as shown in FIG. 1B, the shape of the driving electrode 150 is a ring shape, and the driving electrode 150 surrounds the light passing area CA.

如此,當驅動電極150施加驅動電壓至壓電薄膜120,壓電薄膜120受電場會產生壓縮或拉伸形變(例如壓電薄膜120在平行於第一基板110的方向上被壓縮或拉伸),拉動凸伸結構PS變曲形變(例如凸伸結構PS往平行於第一基板110的法線方向上彎曲),並帶動透光層160產生形變,而達到光學變焦的目的。在本實施例中,壓電薄膜120受電場影響而產生形變,使得承載層140的凸伸結構PS與透光層160皆會受力變形,且因承載層140的凸伸結構PS的彈性係數較大,可增強彈性係數較小的透光層160的結構強度。因此隨著電場變化,透光層160可遠離第一腔體113或者朝向第一腔體113彎曲而形成凸狀球面或凹狀球面的形變,達到變焦的目的。In this way, when the driving electrode 150 applies a driving voltage to the piezoelectric film 120, the piezoelectric film 120 is compressed or stretched by the electric field (for example, the piezoelectric film 120 is compressed or stretched in a direction parallel to the first substrate 110) , Pulling the convex structure PS to bend and deform (for example, the convex structure PS bends in a direction parallel to the normal line of the first substrate 110), and drives the light-transmitting layer 160 to deform, so as to achieve the purpose of optical zooming. In this embodiment, the piezoelectric film 120 is deformed under the influence of the electric field, so that the protruding structure PS of the carrier layer 140 and the light-transmitting layer 160 are both deformed due to the elastic coefficient of the protruding structure PS of the carrier layer 140 A larger value can enhance the structural strength of the light-transmitting layer 160 with a smaller elastic coefficient. Therefore, as the electric field changes, the light-transmitting layer 160 can move away from the first cavity 113 or bend toward the first cavity 113 to form a convex spherical surface or a concave spherical surface to achieve the purpose of zooming.

另一方面,在本實施例中,彈性膜180的彈性係數小於透光層160的彈性係數。如此,可藉由彈性係數相對較小的彈性膜180的設置,而能吸收透光層160變形時的體積變化量,進而使位於光通區域CA內的透光層160在壓電薄膜120被施加驅動電壓時仍能保持近似於球面的形狀,而有效維持可變焦距光學元件100的光學品質。On the other hand, in this embodiment, the elastic coefficient of the elastic film 180 is smaller than the elastic coefficient of the light-transmitting layer 160. In this way, the arrangement of the elastic film 180 with a relatively small coefficient of elasticity can absorb the volume change of the light-transmitting layer 160 when deformed, so that the light-transmitting layer 160 located in the light-passing area CA is covered by the piezoelectric film 120. When the driving voltage is applied, the shape close to the spherical surface can still be maintained, and the optical quality of the variable focus optical element 100 can be effectively maintained.

舉例而言,在本實施例中,第一基板110、透光層160、第二基板170以及彈性膜180的長度跟寬度皆約為3-13毫米(mm),而第一基板110、透光層160、第二基板170以及彈性膜180的厚度分別約為10微米、25微米、300微米以及10微米。第一腔體113的直徑約為4毫米,第二腔體171的直徑約為1.8毫米。應注意的是,此處的數值範圍皆僅是作為例示說明之用,其並非用以限定本發明。For example, in this embodiment, the length and width of the first substrate 110, the transparent layer 160, the second substrate 170, and the elastic film 180 are all about 3-13 millimeters (mm), and the first substrate 110, the transparent The thicknesses of the optical layer 160, the second substrate 170, and the elastic film 180 are about 10 micrometers, 25 micrometers, 300 micrometers, and 10 micrometers, respectively. The diameter of the first cavity 113 is about 4 mm, and the diameter of the second cavity 171 is about 1.8 mm. It should be noted that the numerical ranges here are for illustrative purposes only, and are not intended to limit the present invention.

另一方面,在本實施例中,驅動電極150的外徑約為2-10毫米,內徑約為0.5-6毫米,光通區域CA的直徑約為0.5-6毫米,而承載層140的凸伸結構PS的尺寸約為0.5-4毫米。特別說明的是,依據凸伸結構PS尺寸的變化,彈性係數亦有所差異,透光層160凸起幅度也會有所變異。如此,當驅動電極150施加適當的驅動電壓至壓電薄膜120時,壓電薄膜120所產生伸縮形變的拉力將可使凸伸結構PS以及透光層160所產生的形變維持在所需的範圍內。如此一來,在上述配置下,通過光學液體130、壓電薄膜120、承載層140的凸伸結構PS以及透光層160的應變作用,可變焦距光學元件100可對光通區域CA內的透光層160的曲率半徑進行調變,進而達到改變焦距的功效。以下將搭配圖2A至圖2F,對此進行進一步地解說。On the other hand, in this embodiment, the outer diameter of the driving electrode 150 is about 2-10 mm, the inner diameter is about 0.5-6 mm, the diameter of the light-passing area CA is about 0.5-6 mm, and the diameter of the carrier layer 140 is about 0.5-6 mm. The size of the projecting structure PS is about 0.5-4 mm. In particular, according to the change of the size of the protruding structure PS, the elastic coefficient is also different, and the protrusion width of the light-transmitting layer 160 also varies. In this way, when the driving electrode 150 applies an appropriate driving voltage to the piezoelectric film 120, the tensile force generated by the piezoelectric film 120 will maintain the deformation generated by the protruding structure PS and the light-transmitting layer 160 within the required range. Inside. In this way, under the above configuration, through the strain action of the optical liquid 130, the piezoelectric film 120, the protruding structure PS of the carrier layer 140, and the light-transmitting layer 160, the variable focus optical element 100 can affect the light-transmitting area CA The radius of curvature of the transparent layer 160 is adjusted to achieve the effect of changing the focal length. Hereinafter, this will be further explained in conjunction with FIGS. 2A to 2F.

圖2A是圖1A的可變焦距光學元件100被施加驅動電壓的剖視示意圖。具體而言,如圖2A所示,壓電薄膜120被施加驅動電壓,進而帶動透光層160產生形變,而承載層140、壓電薄膜120、驅動電極150及透光層160可共同圍成可變焦腔體,且可變焦腔體與第一腔體113連通。特別說明的是,由於壓電薄膜120及驅動電極150的厚度可遠小於承載層140的厚度,因此光通區域CA及透光層160圍成的區域亦可直接視為可變焦腔體,另外第一腔體113的範圍會因承載層140的變形而改變,但可變焦腔體仍維持與第一腔體113連通。在本實施例中,當透光層160產生形變時,由於第一腔體113、第二腔體171與可變焦腔體圍成一密封空間,填滿在上述腔體內的光學液體130的體積會保持恆定,因此光學液體130會在第一腔體113、第二腔體171與可變焦腔體內流動,由於彈性膜180的彈性係數遠小於透光層160,因此能調配透光層160變形時的容積變化,而此時覆蓋於第二基板170的第二腔體171的彈性膜180亦會隨之變形,而可使光學液體130可順利地流動,而不會引起不需要的形變,換句話說,若無設置彈性膜180,則將影響透光層160的變形量,而藉由彈性膜180的設置,透光層160的表面的形狀變形量能符合預期的變形而維持可變焦距光學元件100的光學品質。如此,藉由彈性係數相對較小的彈性膜180的設置,即可使位於光通區域CA內的透光層160在施加驅動電壓時仍能保持近似於球面的形狀,而有效維持可變焦距光學元件100的光學品質。FIG. 2A is a schematic cross-sectional view of the variable focus optical element 100 of FIG. 1A when a driving voltage is applied. Specifically, as shown in FIG. 2A, the piezoelectric film 120 is applied with a driving voltage, which in turn drives the light-transmitting layer 160 to deform, and the carrier layer 140, the piezoelectric film 120, the driving electrode 150, and the light-transmitting layer 160 can collectively form The zoomable cavity is in communication with the first cavity 113. In particular, since the thickness of the piezoelectric film 120 and the driving electrode 150 can be much smaller than the thickness of the carrier layer 140, the area enclosed by the light-passing area CA and the light-transmitting layer 160 can also be directly regarded as a variable-focus cavity. The range of the first cavity 113 will be changed due to the deformation of the carrier layer 140, but the zoomable cavity still maintains communication with the first cavity 113. In this embodiment, when the light-transmitting layer 160 is deformed, since the first cavity 113, the second cavity 171 and the variable-focus cavity form a sealed space, the volume of the optical liquid 130 in the cavity is filled. Will remain constant, so the optical liquid 130 will flow in the first cavity 113, the second cavity 171 and the variable-focus cavity. Since the elastic coefficient of the elastic film 180 is much smaller than that of the light-transmitting layer 160, the light-transmitting layer 160 can be configured to deform At this time, the volume changes, and the elastic film 180 covering the second cavity 171 of the second substrate 170 will also deform accordingly, so that the optical liquid 130 can flow smoothly without causing unnecessary deformation. In other words, if the elastic film 180 is not provided, the deformation of the light-transmitting layer 160 will be affected. With the provision of the elastic film 180, the shape deformation of the surface of the light-transmitting layer 160 can conform to the expected deformation and remain variable. The optical quality of the focal length optical element 100. In this way, with the arrangement of the elastic film 180 with a relatively small elasticity coefficient, the light-transmitting layer 160 located in the light-passing area CA can still maintain an approximate spherical shape when a driving voltage is applied, thereby effectively maintaining the variable focal length. The optical quality of the optical element 100.

圖2B至圖2E是圖1A的可變焦距光學元件100被施加不同驅動電壓時的曲率半徑與理想曲率半徑的數據對照圖。圖2F是圖2A的壓電薄膜120變形量與驅動電壓的模擬數據關係圖。具體而言,在本實施例中,當驅動電極150施加一定的驅動電壓時,透光層160所產生形變的數據經由模擬分析後,結果如圖2B至圖2E所示。2B to 2E are data comparison diagrams of the radius of curvature and the ideal radius of curvature of the variable focus optical element 100 of FIG. 1A when different driving voltages are applied. FIG. 2F is a graph showing the relationship between the amount of deformation of the piezoelectric film 120 in FIG. 2A and the simulation data of the driving voltage. Specifically, in this embodiment, when a certain driving voltage is applied to the driving electrode 150, the deformation data generated by the light-transmitting layer 160 is simulated and analyzed, and the results are shown in FIGS. 2B to 2E.

詳細而言,如圖2B至圖2E所示,在本實施例中,藉由正、負電壓的改變可讓可變焦距光學元件100的壓電薄膜120以及透光層160形變的方向改變,詳細的說,就是可變焦距光學元件100的透光層160形變的方向可遠離第一腔體113或者朝向第一腔體113彎曲。並且,藉由電壓的大小的改變,可讓可變焦距光學元件100的壓電薄膜120所帶動的透光層160的形變量改變。如圖2B所示,在驅動電壓為+10V時,可變焦距光學元件100的中心弧矢的最大形變量(亦即透光層160的最大形變量)為+5.2微米,如圖2C所示,在驅動電壓為+5V時,可變焦距光學元件100的中心弧矢的最大形變量為+3.0微米,並且如圖2B至圖2C所示,可變焦距光學元件100的形變的方向遠離第一腔體113而彎曲。另一方面,如圖2D所示,在驅動電壓為-5V時,可變焦距光學元件100的中心弧矢的最大形變量為-4.5微米,如圖2E所示,在驅動電壓為-10V時,可變焦距光學元件100的中心弧矢的最大形變量為-12微米,並且如圖2D至圖2E所示,可變焦距光學元件100的形變的方向朝向第一腔體113彎曲。In detail, as shown in FIGS. 2B to 2E, in this embodiment, the direction of deformation of the piezoelectric film 120 and the light-transmitting layer 160 of the variable focus optical element 100 can be changed by changing the positive and negative voltages. Specifically, the direction in which the light-transmitting layer 160 of the variable focal length optical element 100 is deformed can be away from the first cavity 113 or bend toward the first cavity 113. Moreover, by changing the magnitude of the voltage, the deformation of the transparent layer 160 driven by the piezoelectric film 120 of the variable focus optical element 100 can be changed. As shown in FIG. 2B, when the driving voltage is +10V, the maximum amount of deformation of the center sagittal of the variable focus optical element 100 (that is, the maximum amount of deformation of the light-transmitting layer 160) is +5.2 microns, as shown in FIG. 2C When the driving voltage is +5V, the maximum amount of deformation of the center sagittal of the variable focus optical element 100 is +3.0 microns, and as shown in FIGS. 2B to 2C, the direction of deformation of the variable focus optical element 100 is far away from the first A cavity 113 is curved. On the other hand, as shown in FIG. 2D, when the driving voltage is -5V, the maximum amount of deformation of the center sagittal of the variable focus optical element 100 is -4.5 micrometers, as shown in FIG. 2E, when the driving voltage is -10V The maximum amount of deformation of the center sagittal of the variable focus optical element 100 is -12 micrometers, and as shown in FIGS. 2D to 2E, the deformation direction of the variable focus optical element 100 is curved toward the first cavity 113.

並且,如圖2B至圖2E所示,可變焦距光學元件100的透光層160與理想的球面輪廓十分接近。換言之,通過光學液體130、壓電薄膜120、承載層140的凸伸結構PS以及透光層160的應變作用,可變焦距光學元件100的透光層160的曲率半徑接近理想值,可有效減少球面像差,而有效維持可變焦距光學元件100的光學品質。Moreover, as shown in FIGS. 2B to 2E, the light-transmitting layer 160 of the variable focal length optical element 100 is very close to the ideal spherical contour. In other words, through the strain action of the optical liquid 130, the piezoelectric film 120, the protruding structure PS of the carrier layer 140, and the light-transmitting layer 160, the radius of curvature of the light-transmitting layer 160 of the variable focus optical element 100 is close to the ideal value, which can effectively reduce The spherical aberration effectively maintains the optical quality of the variable focal length optical element 100.

進一步而言,如圖2F所示,在本實施例中,以預定的驅動電壓施加至壓電薄膜120,即能有效使壓電薄膜120產生不同的伸縮應力變形。舉例而言,在本實施例中,驅動電壓的範圍可介於0至50伏特,藉由調變電壓能有效讓壓電薄膜120產生所需要的變形。應注意的是,此處的數值範圍皆僅是作為例示說明之用,其並非用以限定本發明。舉例而言,依據不同的壓電材質及結構尺寸設計,在其他的實施例中,驅動電壓的範圍較佳也可為大於30伏特、-25至25伏特或-50至50伏特等值,而可使可變焦距光學元件100達到所期望的焦距值,本發明不以此為限。Furthermore, as shown in FIG. 2F, in this embodiment, applying a predetermined driving voltage to the piezoelectric film 120 can effectively cause the piezoelectric film 120 to generate different stretching stresses and deformations. For example, in this embodiment, the driving voltage can range from 0 to 50 volts, and the piezoelectric film 120 can be effectively deformed by modulating the voltage. It should be noted that the numerical ranges here are for illustrative purposes only, and are not intended to limit the present invention. For example, depending on the design of different piezoelectric materials and structural dimensions, in other embodiments, the range of the driving voltage may preferably be greater than 30 volts, -25 to 25 volts, or -50 to 50 volts. The variable focal length optical element 100 can reach the desired focal length value, and the present invention is not limited thereto.

如此一來,本實施例的可變焦距光學元件100以預定的驅動電壓施加至壓電薄膜120,以使壓電薄膜120產生伸縮應力變形,進而帶動承載層140的凸伸結構PS彎曲形變以及透光層160產生形變。並且,承載層140可應用絕緣層上覆矽(Silicon-on-Insulator;SOI)的製程技術來製作,而可與現有製程技術整合,製作簡易。In this way, the variable focal length optical element 100 of this embodiment is applied to the piezoelectric film 120 with a predetermined driving voltage, so that the piezoelectric film 120 is deformed by stretching stress, and then drives the convex structure PS of the carrier layer 140 to bend and deform. The transparent layer 160 is deformed. In addition, the carrier layer 140 can be fabricated by a silicon-on-insulator (SOI) process technology, and can be integrated with the existing process technology for easy fabrication.

另一方面,藉由彈性膜180的設置,可在充填光學液體130時具有較大的體積容差值,換言之,當採用彈性膜180的設置時,則可完全吸收光學液填充所造成的體積誤差,以消除屈光度的誤差。如此,藉由彈性膜180的設置,透光層160就不會在未施加驅動電壓時就產生形變。On the other hand, with the arrangement of the elastic film 180, the optical liquid 130 can be filled with a larger volume tolerance value. In other words, when the arrangement of the elastic film 180 is used, the volume caused by the filling of the optical liquid can be completely absorbed. Error to eliminate the error of diopter. In this way, with the arrangement of the elastic film 180, the light-transmitting layer 160 will not be deformed when the driving voltage is not applied.

圖3是依照本發明的另一種可變焦距光學元件的實施例的俯視示意圖。請參照圖3,本實施例的可變焦距光學元件300與圖1A的可變焦距光學元件100類似,而兩者的差異如下所述。如圖3所示,可變焦距光學元件300的驅動電極350包含複數個圓弧狀電極CE1、CE2,這些圓弧狀電極CE1、CE2排列在圓環區域CR上,圓環區域CR環繞光通區域CA,且任一圓弧狀電極CE1、CE2的驅動電壓的極性方向與相鄰的這些圓弧狀電極CE1、CE2所施加的驅動電壓的極性方向相反。舉例來說,這些圓弧狀電極CE1、CE2交錯排列在圓環區域CR上,且任一圓弧狀電極CE1的驅動電壓的極性方向與相鄰的圓弧狀電極CE2所施加的驅動電壓的極性方向相反,亦即任一圓弧狀電極CE2的驅動電壓的極性方向與相鄰的圓弧狀電極CE1所施加的驅動電壓的極性方向相反。如此,可變焦距光學元件300的驅動電極350可適用於驅動不具有自發極性的壓電薄膜320,而可使壓電薄膜320的極性在被初始化後,可搭配具有特定的驅動電壓方向的圓弧狀電極CE1、CE2,來進一步產生形變。如此,在本實施例中,可變焦距光學元件300亦可藉由正、負電壓的改變可讓壓電薄膜320伸縮變形而影響承載層140形變的方向改變。詳細的說,就是承載層140形變的方向可遠離第一腔體113或者朝向第一腔體113彎曲,進而帶動透光層160形成凸狀球面或凹狀球面。Fig. 3 is a schematic top view of another embodiment of a variable focal length optical element according to the present invention. Referring to FIG. 3, the variable focus optical element 300 of this embodiment is similar to the variable focus optical element 100 of FIG. 1A, and the difference between the two is as follows. As shown in FIG. 3, the driving electrode 350 of the variable focal length optical element 300 includes a plurality of arc-shaped electrodes CE1 and CE2. These arc-shaped electrodes CE1 and CE2 are arranged on the ring area CR, which surrounds the light flux. In the area CA, the polarity direction of the driving voltage of any arc-shaped electrode CE1 and CE2 is opposite to the polarity direction of the driving voltage applied to the adjacent arc-shaped electrodes CE1 and CE2. For example, these arc-shaped electrodes CE1 and CE2 are alternately arranged on the circular area CR, and the polarity direction of the driving voltage of any arc-shaped electrode CE1 is equal to that of the driving voltage applied by the adjacent arc-shaped electrode CE2. The polarity direction is opposite, that is, the polarity direction of the driving voltage of any arc-shaped electrode CE2 is opposite to the polarity direction of the driving voltage applied by the adjacent arc-shaped electrode CE1. In this way, the driving electrode 350 of the variable focus optical element 300 can be adapted to drive the piezoelectric film 320 that does not have a spontaneous polarity, and the polarity of the piezoelectric film 320 can be matched with a circle with a specific driving voltage direction after being initialized. The arc-shaped electrodes CE1 and CE2 are further deformed. In this way, in this embodiment, the variable focus optical element 300 can also cause the piezoelectric film 320 to stretch and deform by changing the positive and negative voltages, which affects the direction of the deformation of the carrier layer 140. Specifically, the direction in which the carrier layer 140 is deformed can be away from the first cavity 113 or bend toward the first cavity 113, thereby driving the light-transmitting layer 160 to form a convex spherical surface or a concave spherical surface.

如此一來,本實施例的可變焦距光學元件300亦可採用預定的驅動電壓施加至壓電薄膜320,以使壓電薄膜320產生伸縮應力變形,進而帶動承載層140的凸伸結構PS以及透光層160產生形變。In this way, the variable focal length optical element 300 of this embodiment can also be applied to the piezoelectric film 320 by using a predetermined driving voltage to cause the piezoelectric film 320 to generate stretching stress and deformation, thereby driving the protruding structure PS of the carrier layer 140 and The transparent layer 160 is deformed.

圖4是依照本發明的另一種可變焦距光學元件的實施例的剖視示意圖。請參照圖4,本實施例的可變焦距光學元件400與圖1A的可變焦距光學元件100類似,而兩者的差異如下所述。如圖4所示,在本實施例中,透光層460設置於壓電薄膜420與承載層440之間。舉例來說,透光層460可由圖1A的第一絕緣層IL1形成,其材質為矽氧化物且具有透光性,而承載層440則僅包括第二絕緣層IL2以及晶圓層WF。具體而言,如圖4所示,在本實施例中,透光層460(第一絕緣層IL1)疊設於晶圓層WF上,且晶圓層WF位於第二絕緣層IL2與透光層460之間。如此,承載層440與透光層460的製作可應用絕緣層上覆矽(Silicon-on-Insulator;SOI)的製程技術來製作,而可與現有製程技術整合,製作簡易,但本發明不以此為限。在其他的實施例中,承載層440同樣僅包括第二絕緣層IL2以及晶圓層WF,第二絕緣層IL2位於第一基板110與晶圓層WF之間,透光層460位於晶圓層WF與壓電薄膜420之間,且壓電薄膜420覆蓋光通區域CA,其材料可選擇性地包含高分子材料或玻璃。此外,如圖4所示,在本實施例中,壓電薄膜420可選擇性地覆蓋光通區域CA。4 is a schematic cross-sectional view of another embodiment of a variable focal length optical element according to the present invention. Please refer to FIG. 4, the variable focus optical element 400 of this embodiment is similar to the variable focus optical element 100 of FIG. 1A, and the difference between the two is as follows. As shown in FIG. 4, in this embodiment, the light-transmitting layer 460 is disposed between the piezoelectric film 420 and the carrier layer 440. For example, the light-transmitting layer 460 may be formed of the first insulating layer IL1 of FIG. 1A, which is made of silicon oxide and has light-transmitting properties, and the carrier layer 440 only includes the second insulating layer IL2 and the wafer layer WF. Specifically, as shown in FIG. 4, in this embodiment, the light-transmitting layer 460 (the first insulating layer IL1) is stacked on the wafer layer WF, and the wafer layer WF is located on the second insulating layer IL2 and the light-transmitting layer WF. Between layers 460. In this way, the production of the carrier layer 440 and the light-transmitting layer 460 can be fabricated using the silicon-on-insulator (SOI) process technology, and can be integrated with the existing process technology, and the fabrication is simple, but the present invention does not This is limited. In other embodiments, the carrier layer 440 also includes only the second insulating layer IL2 and the wafer layer WF. The second insulating layer IL2 is located between the first substrate 110 and the wafer layer WF, and the light-transmitting layer 460 is located on the wafer layer. Between the WF and the piezoelectric film 420, and the piezoelectric film 420 covers the light transmission area CA, the material of the piezoelectric film 420 may optionally include polymer materials or glass. In addition, as shown in FIG. 4, in this embodiment, the piezoelectric film 420 can selectively cover the light-passing area CA.

如此,本實施例的可變焦距光學元件400亦可採用預定的驅動電壓施加至壓電薄膜420,以使壓電薄膜420產生伸縮應力變形,進而帶動承載層440的凸伸結構PS以及透光層460產生形變。在本實施例中,由於可變焦距光學元件400與可變焦距光學元件100具有類似的結構,因此可變焦距光學元件400具有可變焦距光學元件100所提及的優點,在此亦不再贅述。In this way, the variable focal length optical element 400 of this embodiment can also be applied to the piezoelectric film 420 by using a predetermined driving voltage, so that the piezoelectric film 420 generates stretching stress and deformation, thereby driving the protruding structure PS of the carrying layer 440 and the light transmission. The layer 460 is deformed. In this embodiment, since the variable focal length optical element 400 and the variable focal length optical element 100 have a similar structure, the variable focal length optical element 400 has the advantages mentioned in the variable focal length optical element 100, and will not be omitted here. Go into details.

圖5是依照本發明的另一種可變焦距光學元件的實施例的剖視示意圖。請參照圖5,本實施例的可變焦距光學元件500與圖1A的可變焦距光學元件100類似,而兩者的差異如下所述。如圖5所示,在本實施例中,承載層540僅包括第一絕緣層IL1以及晶圓層WF,透光層560可由圖1A的第二絕緣層IL2形成,且具有透光性,其材質為為矽氧化物。具體而言,如圖5所示,晶圓層WF位於第一絕緣層IL1與透光層560之間,透光層560位於第一基板110與晶圓層WF之間。在本實施例中,可變焦距光學元件100可選擇性地更包括輔助壓電薄膜AP,輔助壓電薄膜AP設置於透光層560上,且可選擇性地僅覆蓋通光區域,以提高透光層560的穩定性,並且輔助壓電薄膜AP不會因驅動電壓而產生伸縮應力變形。5 is a schematic cross-sectional view of another embodiment of a variable focal length optical element according to the present invention. Please refer to FIG. 5, the variable focus optical element 500 of this embodiment is similar to the variable focus optical element 100 of FIG. 1A, and the difference between the two is as follows. As shown in FIG. 5, in this embodiment, the carrier layer 540 only includes the first insulating layer IL1 and the wafer layer WF. The light-transmitting layer 560 may be formed of the second insulating layer IL2 of FIG. 1A and has light-transmitting properties. The material is silicon oxide. Specifically, as shown in FIG. 5, the wafer layer WF is located between the first insulating layer IL1 and the light-transmitting layer 560, and the light-transmitting layer 560 is located between the first substrate 110 and the wafer layer WF. In this embodiment, the variable focus optical element 100 may optionally further include an auxiliary piezoelectric film AP. The auxiliary piezoelectric film AP is disposed on the light-transmitting layer 560 and may selectively cover only the light-transmitting area to improve The light-transmitting layer 560 is stable, and the auxiliary piezoelectric film AP will not be deformed due to stretching stress due to the driving voltage.

在本實施例中,由於可變焦距光學元件500與可變焦距光學元件100具有類似的結構,因此可變焦距光學元件500具有可變焦距光學元件100所提及的優點,在此亦不再贅述。In this embodiment, since the variable focal length optical element 500 and the variable focal length optical element 100 have a similar structure, the variable focal length optical element 500 has the advantages mentioned in the variable focal length optical element 100, and will not be omitted here. Go into details.

圖6是依照本發明的另一種可變焦距光學元件的實施例的剖視示意圖。請參照圖6,本實施例的可變焦距光學元件700與圖1A的可變焦距光學元件100類似,而兩者的差異如下所述。如圖6所示,在本實施例中,圖1A的承載層即為透光層760,且由絕緣層形成,其材質為矽氧化物或可為玻璃,其中第一基板110與透光層760可為矽玻璃鍵合的晶圓(SOG wafer)。在本實施例中,可變焦距光學元件700的透光層760中同於圖1A的承載層的凸伸結構(承載層)可向光通區域CA的中心延伸並相互連接而不具有貫通承載層的通孔。具體而言,如圖6所示,透光層760位於第一基板110與壓電薄膜120之間。6 is a schematic cross-sectional view of another embodiment of a variable focal length optical element according to the present invention. Please refer to FIG. 6, the variable focus optical element 700 of this embodiment is similar to the variable focus optical element 100 of FIG. 1A, and the difference between the two is as follows. As shown in FIG. 6, in this embodiment, the carrier layer of FIG. 1A is the light-transmitting layer 760 and is formed of an insulating layer. The material is silicon oxide or glass. The first substrate 110 and the light-transmitting layer 760 can be a silicon glass bonded wafer (SOG wafer). In this embodiment, in the light-transmitting layer 760 of the variable focal length optical element 700, the convex structure (supporting layer) of the supporting layer that is the same as that of FIG. Layer of through holes. Specifically, as shown in FIG. 6, the light-transmitting layer 760 is located between the first substrate 110 and the piezoelectric film 120.

如此,本實施例的可變焦距光學元件700亦可採用預定的驅動電壓施加至壓電薄膜120,以使壓電薄膜120產生伸縮應力變形,進而帶動透光層760產生形變。在本實施例中,可變焦距光學元件700與可變焦距光學元件100具有類似的壓電薄膜伸縮應力變形,因此可變焦距光學元件700具有可變焦距光學元件100所提及的優點,在此亦不再贅述。In this way, the variable focus optical element 700 of this embodiment can also be applied to the piezoelectric film 120 with a predetermined driving voltage, so that the piezoelectric film 120 is deformed by stretching stress, thereby driving the light-transmitting layer 760 to deform. In this embodiment, the variable focal length optical element 700 and the variable focal length optical element 100 have similar piezoelectric film stretching stress and deformation, so the variable focal length optical element 700 has the advantages mentioned in the variable focal length optical element 100. This will not be repeated here.

綜上所述,本發明的實施例至少具有以下其中一個優點或功效。在本發明的實施例中,可變焦距光學元件可採用預定的驅動電壓施加至壓電薄膜,以使壓電薄膜產生伸縮應力變形,進而帶動承載層的凸伸結構以及透光層產生彎曲形變。並且,承載層可應用絕緣層上覆矽的製程技術來製作,而可與現有製程技術整合,製作簡易。此外,可變焦距光學元件藉由彈性係數相對較小的彈性膜的設置,而使位於光通區域內的壓電薄膜在不同環境條件下仍能在施加驅動電壓時保持近似於球面的形狀,而有效維持可變焦距光學元件的光學品質。In summary, the embodiments of the present invention have at least one of the following advantages or effects. In the embodiment of the present invention, the variable focal length optical element can be applied to the piezoelectric film with a predetermined driving voltage, so that the piezoelectric film generates stretching stress and deformation, which in turn drives the convex structure of the carrier layer and the light-transmitting layer to bend and deform . In addition, the carrier layer can be fabricated by using the process technology of covering silicon on the insulating layer, and can be integrated with the existing process technology for easy fabrication. In addition, the variable focus optical element is provided with an elastic film with a relatively small elastic coefficient, so that the piezoelectric film located in the luminous flux region can still maintain an approximate spherical shape when the driving voltage is applied under different environmental conditions. And effectively maintain the optical quality of the variable focal length optical element.

惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍,即大凡依本發明申請專利範圍及發明說明內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。另外本發明的任一實施例或申請專利範圍不須達成本發明所揭露之全部目的或優點或特點。此外,摘要部分和標題僅是用來輔助專利文件搜尋之用,並非用來限制本發明之權利範圍。此外,本說明書或申請專利範圍中提及的“第一”、“第二”等用語僅用以命名元件(element)的名稱或區別不同實施例或範圍,而並非用來限制元件數量上的上限或下限。However, the above are only preferred embodiments of the present invention, and should not be used to limit the scope of implementation of the present invention, that is, simple equivalent changes and modifications made in accordance with the scope of the patent application of the present invention and the description of the invention, All are still within the scope of the invention patent. In addition, any embodiment of the present invention or the scope of the patent application does not have to achieve all the objectives or advantages or features disclosed in the present invention. In addition, the abstract part and title are only used to assist in searching for patent documents, and are not used to limit the scope of rights of the present invention. In addition, the terms "first" and "second" mentioned in this specification or the scope of the patent application are only used to name the element (element) or to distinguish different embodiments or ranges, and are not used to limit the number of elements. Upper or lower limit.

100、300、400、500、700:可變焦距光學元件 110:第一基板 111:第一表面 112:第二表面 113:第一腔體 120、320、420:壓電薄膜 120a:外表面 120b:內表面 130:光學液體 140、440、540:承載層 150、350:驅動電極 151:第一驅動電極 152:第二驅動電極 160、460、560、760:透光層 170:第二基板 171:第二腔體 180:彈性膜 AP:輔助壓電薄膜 CH:圓柱狀腔體 CA:光通區域 CE1、CE2:圓弧狀電極 CR:圓環區域 PS:凸伸結構 R:徑向方向 IL1:第一絕緣層 IL2:第二絕緣層 WF:晶圓層100, 300, 400, 500, 700: Variable focal length optics 110: First substrate 111: first surface 112: second surface 113: first cavity 120, 320, 420: piezoelectric film 120a: outer surface 120b: inner surface 130: optical liquid 140, 440, 540: carrier layer 150, 350: drive electrodes 151: first drive electrode 152: second drive electrode 160, 460, 560, 760: light-transmitting layer 170: second substrate 171: The second cavity 180: elastic membrane AP: auxiliary piezoelectric film CH: Cylindrical cavity CA: Luminous area CE1, CE2: arc-shaped electrodes CR: ring area PS: protruding structure R: radial direction IL1: first insulating layer IL2: second insulating layer WF: Wafer layer

圖1A是依照本發明的實施例的一種可變焦距光學元件的剖視示意圖。 圖1B是圖1A的可變焦距光學元件的俯視示意圖。 圖2A是圖1A的可變焦距光學元件被施加驅動電壓而變形的剖視示意圖。 圖2B至圖2E是圖2A的可變焦距光學元件被施加不同驅動電壓時的曲率半徑與理想曲率半徑的數據對照圖。 圖2F是圖2A的壓電薄膜變形量與驅動電壓的模擬數據關係圖。 圖3是依照本發明的實施例的另一種可變焦距光學元件的俯視示意圖。 圖4至圖6是依照本發明的實施例的不同可變焦距光學元件的剖視示意圖。FIG. 1A is a schematic cross-sectional view of a variable focal length optical element according to an embodiment of the present invention. FIG. 1B is a schematic top view of the variable focal length optical element of FIG. 1A. 2A is a schematic cross-sectional view of the variable focal length optical element of FIG. 1A deformed by applying a driving voltage. 2B to 2E are data comparison diagrams of the radius of curvature and the ideal radius of curvature of the variable focus optical element of FIG. 2A when different driving voltages are applied. Fig. 2F is a graph showing the relationship between the deformation of the piezoelectric film and the simulation data of the driving voltage of Fig. 2A. Fig. 3 is a schematic top view of another variable focal length optical element according to an embodiment of the present invention. 4 to 6 are schematic cross-sectional views of different variable focal length optical elements according to embodiments of the present invention.

100:可變焦距光學元件100: Variable focal length optics

110:第一基板110: First substrate

111:第一表面111: first surface

112:第二表面112: second surface

113:第一腔體113: first cavity

120:壓電薄膜120: Piezo film

120a:外表面120a: outer surface

120b:內表面120b: inner surface

130:光學液體130: optical liquid

140:承載層140: Carrier layer

150:驅動電極150: drive electrode

151:第一驅動電極151: first drive electrode

152:第二驅動電極152: second drive electrode

160:透光層160: light-transmitting layer

170:第二基板170: second substrate

171:第二腔體171: The second cavity

180:彈性膜180: elastic membrane

CA:光通區域CA: Luminous area

PS:凸伸結構PS: protruding structure

IL1:第一絕緣層IL1: first insulating layer

IL2:第二絕緣層IL2: second insulating layer

WF:晶圓層WF: Wafer layer

Claims (12)

一種可變焦距光學元件,包括: 一第一基板,具有相對的一第一表面與一第二表面,該第一基板具有一第一腔體,其中該第一腔體貫穿該第一表面與該第二表面; 一承載層,位於該第一基板的該第一表面上且具有貫穿該承載層的一光通區域,該承載層具有一凸伸結構,該凸伸結構圍成該光通區域,其中該凸伸結構在該光通區域的徑向方向上自該第一基板的該第一表面向該光通區域的中心延伸; 一壓電薄膜,位於該承載層上; 一驅動電極,位於該承載層上,用於驅動該壓電薄膜,其中該驅動電極施加一驅動電壓至該壓電薄膜,以使該壓電薄膜產生伸縮形變並拉動該凸伸結構彎曲形變;以及 一透光層,重疊設置於該凸伸結構,且該透光層覆蓋該光通區域。A variable focal length optical element, including: A first substrate having a first surface and a second surface opposite to each other, the first substrate having a first cavity, wherein the first cavity penetrates the first surface and the second surface; A carrier layer is located on the first surface of the first substrate and has a light-passing area penetrating the carrying layer. The carrying layer has a protruding structure that encloses the light-passing area. The extension structure extends from the first surface of the first substrate to the center of the light-passing area in the radial direction of the light-passing area; A piezoelectric film located on the carrier layer; A driving electrode located on the carrying layer for driving the piezoelectric film, wherein the driving electrode applies a driving voltage to the piezoelectric film to cause the piezoelectric film to stretch and deform and pull the protruding structure to bend and deform; as well as A light-transmitting layer is overlapped and arranged on the protruding structure, and the light-transmitting layer covers the light-passing area. 如請求項1所述的可變焦距光學元件,其中該可變焦距光學元件還包括一第二基板以及一彈性膜,該第二基板位於該第一基板的該第二表面上且具有至少一第二腔體,該至少一第二腔體與該第一基板的該第一腔體連通,以及該第二基板位於該彈性膜與該第一基板之間,該彈性膜覆蓋該第二基板,且該彈性膜的彈性係數小於該透光層的彈性係數。The variable focal length optical element according to claim 1, wherein the variable focal length optical element further includes a second substrate and an elastic film, and the second substrate is located on the second surface of the first substrate and has at least one A second cavity, the at least one second cavity communicates with the first cavity of the first substrate, and the second substrate is located between the elastic film and the first substrate, and the elastic film covers the second substrate And the elastic coefficient of the elastic film is smaller than the elastic coefficient of the light-transmitting layer. 如請求項1所述的可變焦距光學元件,其中該承載層包括: 一第一絕緣層; 一第二絕緣層,與該第一絕緣層重疊設置;以及 一晶圓層,位於該第一絕緣層與該第二絕緣層之間,其中該壓電薄膜設置於該第一絕緣層上,且該透光層設置於該壓電薄膜上。The variable focus optical element according to claim 1, wherein the bearing layer includes: A first insulating layer; A second insulating layer arranged to overlap the first insulating layer; and A wafer layer is located between the first insulating layer and the second insulating layer, wherein the piezoelectric film is disposed on the first insulating layer, and the light-transmitting layer is disposed on the piezoelectric film. 如請求項1所述的可變焦距光學元件,其中該透光層的材料包含高分子材料或玻璃。The variable focal length optical element according to claim 1, wherein the material of the light-transmitting layer comprises a polymer material or glass. 如請求項1所述的可變焦距光學元件,其中該透光層為一第一絕緣層,該承載層包括一第二絕緣層以及一晶圓層,該第一絕緣層疊設於該晶圓層上,且該晶圓層位於該第二絕緣層與該透光層之間。The variable focal length optical element according to claim 1, wherein the light-transmitting layer is a first insulating layer, the carrier layer includes a second insulating layer and a wafer layer, and the first insulating layer is laminated on the wafer And the wafer layer is located between the second insulating layer and the light-transmitting layer. 如請求項1所述的可變焦距光學元件,其中該承載層包括一第一絕緣層以及一晶圓層,該透光層為一第二絕緣層,該晶圓層位於該第一絕緣層與該透光層之間,該透光層位於該第一基板與該晶圓層之間,其中該可變焦距光學元件更包括一輔助壓電薄膜,該輔助壓電薄膜設置於該透光層上。The variable focus optical element according to claim 1, wherein the carrier layer includes a first insulating layer and a wafer layer, the light-transmitting layer is a second insulating layer, and the wafer layer is located on the first insulating layer Between the transparent layer and the transparent layer, the transparent layer is located between the first substrate and the wafer layer, wherein the variable focus optical element further includes an auxiliary piezoelectric film, and the auxiliary piezoelectric film is disposed on the transparent Layer up. 如請求項1所述的可變焦距光學元件,其中該承載層包括一第二絕緣層以及一晶圓層,該第二絕緣層位於該第一基板與該晶圓層之間,該透光層位於該晶圓層與該壓電薄膜之間,且該壓電薄膜覆蓋該光通區域,其中該透光層的材料包含高分子材料或玻璃。The variable focus optical element according to claim 1, wherein the carrier layer includes a second insulating layer and a wafer layer, the second insulating layer is located between the first substrate and the wafer layer, and the light-transmitting layer The layer is located between the wafer layer and the piezoelectric film, and the piezoelectric film covers the light-passing area, wherein the material of the light-transmitting layer includes polymer material or glass. 如請求項1所述的可變焦距光學元件,其中該驅動電極的形狀為環狀,且該驅動電極環繞該光通區域。The variable focal length optical element according to claim 1, wherein the shape of the driving electrode is a ring, and the driving electrode surrounds the light transmission area. 如請求項1所述的可變焦距光學元件,其中該驅動電極包含複數個圓弧狀電極,該些圓弧狀電極排列在一圓環區域上,該圓環區域環繞該光通區域,且任一該圓弧狀電極的驅動電壓的極性方向與相鄰的該些圓弧狀電極所施加的驅動電壓的極性方向相反。The variable focal length optical element according to claim 1, wherein the driving electrode includes a plurality of arc-shaped electrodes, the arc-shaped electrodes are arranged on an annular area, the annular area surrounds the light transmission area, and The polarity direction of the driving voltage of any one of the arc-shaped electrodes is opposite to the polarity direction of the driving voltage applied by the adjacent arc-shaped electrodes. 如請求項9所述的可變焦距光學元件,其中該驅動電壓的範圍介於0至50伏特之間。The variable focus optical element according to claim 9, wherein the driving voltage ranges from 0 to 50 volts. 如請求項1所述的可變焦距光學元件,其中該壓電薄膜具有一開孔區域,且該開孔區域的邊界與該光通區域的邊界相同。The variable focal length optical element according to claim 1, wherein the piezoelectric film has an opening area, and the boundary of the opening area is the same as the boundary of the light transmission area. 如請求項1所述的可變焦距光學元件,其中該可變焦距光學元件還包括一光學液體,適於填滿該第一腔體,其中該透光層直接接觸該光學液體。The variable focal length optical element according to claim 1, wherein the variable focal length optical element further comprises an optical liquid suitable for filling the first cavity, wherein the light-transmitting layer directly contacts the optical liquid.
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