TW202136712A - Micro-displacement measurement device - Google Patents
Micro-displacement measurement device Download PDFInfo
- Publication number
- TW202136712A TW202136712A TW109108654A TW109108654A TW202136712A TW 202136712 A TW202136712 A TW 202136712A TW 109108654 A TW109108654 A TW 109108654A TW 109108654 A TW109108654 A TW 109108654A TW 202136712 A TW202136712 A TW 202136712A
- Authority
- TW
- Taiwan
- Prior art keywords
- grating
- pattern
- circuit board
- micro
- measuring device
- Prior art date
Links
- 238000006073 displacement reaction Methods 0.000 title claims abstract description 39
- 238000005259 measurement Methods 0.000 title description 5
- 239000003973 paint Substances 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 abstract description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
Images
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Abstract
Description
本發明涉及光學測量技術領域,特別是涉及一種微位移測量裝置。The present invention relates to the technical field of optical measurement, in particular to a micro-displacement measuring device.
光柵尺是對刀具和工件的座標起一個檢測的作用,在數控機床中常用來觀察其是否走刀有誤差,以起到一個補償刀具的運動誤差的補償效果,因此光柵尺在各種精密加工機床中得到廣泛的應用。傳統的光柵尺是光源發出的光經過主、副光柵後被光探測器接收,再利用光探測器把主、副光柵移動時產生的莫爾條紋之明暗變化轉變為電流變化的方式,最後利用數據處理單元對電流的變化轉變為數字電流以計算位移量,由於光探測器在接收光信號時容易受到電磁波的幹擾,導致測量誤差。The grating ruler is used to detect the coordinates of the tool and the workpiece. It is commonly used in CNC machine tools to observe whether there is an error in the cutting tool, so as to achieve a compensation effect for compensating the movement error of the tool. Therefore, the grating ruler is used in various precision machining machine tools. It has been widely used. The traditional grating ruler is a method in which the light emitted by the light source passes through the main and auxiliary gratings and is received by the photodetector. The light detector is then used to convert the light and dark changes of the moiré fringe generated when the main and auxiliary gratings move into current changes. The data processing unit converts the change of the current into a digital current to calculate the displacement. Because the photodetector is susceptible to interference from electromagnetic waves when receiving the optical signal, measurement errors are caused.
有鑑於此,有必要提供一種能夠解決上述技術問題的微位移測量裝置。In view of this, it is necessary to provide a micro-displacement measuring device that can solve the above technical problems.
一種微位移測量裝置,包括光柵尺、影像處理單元及數據處理單元,所述光柵尺包括光源以及依次設置在所述光源光路上的準直裝置、主光柵、副光柵、影像感測晶片;所述主光柵及副光柵分別包括第一圖案以及位於所述第一圖案左右兩側的多個第二圖案,所述主光柵及所述副光柵兩者之一能相對另一個運動發生位移,所述光源發出的光能經過所述準直裝置、主光柵及副光柵後能在所述影像感測晶片上形成圖像,所述影像處理單元用於對所述圖像進行處理,所述數據處理單元用於根據所述影像處理單元處理的結果計算得到所述位移。A micro-displacement measuring device includes a grating ruler, an image processing unit and a data processing unit. The grating ruler includes a light source and a collimating device, a main grating, a sub-grating, and an image sensing chip sequentially arranged on the light path of the light source; The main grating and the sub-grating respectively include a first pattern and a plurality of second patterns located on the left and right sides of the first pattern. One of the main grating and the sub-grating can move relative to the other. The light energy emitted by the light source can form an image on the image sensor chip after passing through the collimating device, the main grating and the sub-grating, the image processing unit is used to process the image, and the data The processing unit is configured to calculate the displacement according to the processing result of the image processing unit.
在一個優選實施例中,所述第一圖案與鄰近的所述第二圖案之間的間距等於每兩個相鄰的第二圖案之間的間距。In a preferred embodiment, the distance between the first pattern and the adjacent second pattern is equal to the distance between every two adjacent second patterns.
在一個優選實施例中,所述第一圖案及所述第二圖案共同作為圖案部,所述第一圖案與所述第二圖案之間的間隔以及相鄰的第二圖案之間的間隔為空白部,所述圖案部與所述空白部兩者之一能透光,另一者不能透光。In a preferred embodiment, the first pattern and the second pattern together serve as a pattern portion, and the interval between the first pattern and the second pattern and the interval between adjacent second patterns are The blank part, one of the pattern part and the blank part can transmit light, and the other can not transmit light.
在一個優選實施例中,所述第一圖案及第二圖案為在所述主光柵及所述副光柵上開設形成的不同形狀的凹槽。In a preferred embodiment, the first pattern and the second pattern are grooves of different shapes formed on the main grating and the secondary grating.
在一個優選實施例中,所述第一圖案為菱形凹槽,所述第二圖案為方形凹槽。In a preferred embodiment, the first pattern is a diamond-shaped groove, and the second pattern is a square groove.
在一個優選實施例中,所述第一圖案及第二圖案為在所述光柵表面塗布黑漆形成。In a preferred embodiment, the first pattern and the second pattern are formed by coating black paint on the surface of the grating.
在一個優選實施例中,所述光柵尺還包括印刷電路板,所述印刷電路板包括第一線路板、第二線路板、垂直連接所述第一線路板及第二線路板的可撓曲的連接部以及與所述第一線路板連接的延伸部,所述第一線路板與第二線路板正對設置,所述影像感測晶片設置於所述第一線路板,所述光源設置於所述第二線路板,所述延伸部設置有電連接器。In a preferred embodiment, the grating ruler further includes a printed circuit board, and the printed circuit board includes a first circuit board, a second circuit board, and a flexible circuit board vertically connected to the first circuit board and the second circuit board. The connecting portion and the extension portion connected with the first circuit board, the first circuit board and the second circuit board are arranged directly opposite, the image sensor chip is arranged on the first circuit board, and the light source is arranged On the second circuit board, the extension portion is provided with an electrical connector.
在一個優選實施例中,所述光柵尺還包括底座,所述底座包括上表面、下表面、連接所述上表面與所述下表面的前側表面以及連接所述上表面、下表面的左側面以及右側面,所述上表面朝向下表面凹設形成容納槽,所述前側表面向開設形成貫穿孔,所述貫穿孔與所述容納槽相通,所述第一線路板設置於所述容納槽,所述延伸部從所述貫穿孔中伸出至所述容納槽外;所述底座還包括插槽,所述插槽從左側面延伸貫穿至右側面,所述主光柵與所述副光柵均從所述插槽插設且所述主光柵及副光柵的兩端均位於所述插槽外。In a preferred embodiment, the grating ruler further includes a base, the base includes an upper surface, a lower surface, a front side surface connecting the upper surface and the lower surface, and a left side surface connecting the upper surface and the lower surface And on the right side, the upper surface faces the lower surface and is recessed to form a receiving groove, the front side surface is opened to form a through hole, the through hole communicates with the receiving groove, and the first circuit board is disposed in the receiving groove , The extension part protrudes from the through hole to the outside of the receiving groove; the base further includes a slot, the slot extends from the left side to the right side, the main grating and the auxiliary grating Both are inserted from the slot, and both ends of the main grating and the sub-grating are located outside the slot.
在一個優選實施例中,所述光柵尺還包括設置於所述底座上的中框,所述中框包括第一表面、相對所述第一表面的第二表面以及凸出於所述第二表面的凸臺,所述中框開設有位於所述凸臺一側的條形槽,所述凸臺中央形成有臺階部以及位於臺階部中央的通光孔,所述通光孔包括承載臺,所述準直裝置設置於所述承載臺;所述可撓曲的連接部穿過所述條形槽以使所述第二線路板與所述凸臺間隔設置,所述光源發出的光束能通過所述通光孔傳輸至所述影像感測晶片,進而被所述影像感測晶片感測。In a preferred embodiment, the grating ruler further includes a middle frame arranged on the base, and the middle frame includes a first surface, a second surface opposite to the first surface, and a second surface protruding from the second surface. The boss on the surface, the middle frame is provided with a strip groove located on one side of the boss, a step part and a light hole at the center of the step part are formed in the center of the boss, and the light hole includes a bearing platform , The collimating device is arranged on the bearing platform; the flexible connecting portion passes through the strip groove so that the second circuit board and the boss are arranged at intervals, and the light beam emitted by the light source It can be transmitted to the image sensor chip through the light-through hole, and then be sensed by the image sensor chip.
在一個優選實施例中,所述光柵尺還包括蓋體,所述蓋體包括朝向所述中框的底表面,所述底表面凹設有凹部,所述蓋體蓋設於所述中框,所述第二線路板收容於所述凹部。In a preferred embodiment, the grating ruler further includes a cover, the cover includes a bottom surface facing the middle frame, the bottom surface is recessed with a recess, and the cover is disposed on the middle frame. , The second circuit board is accommodated in the recess.
與現有技術相比,本發明提供的微位移測量裝置,由於是使光源發出的光能經過準直裝置、主光柵及副光柵後能在所述影像感測晶片上形成圖像,然後利用所述影像處理單元用於對所述圖像進行處理,所述數據處理單元用於根據所述影像處理單元處理的結果計算得到所述位移。如此,無需設置光探測器接收明暗條紋,克服了電磁波對信號的幹擾,提高了微位移測量的準確度。Compared with the prior art, the micro-displacement measuring device provided by the present invention enables the light emitted by the light source to pass through the collimating device, the main grating and the sub-grating to form an image on the image sensor chip, and then use all The image processing unit is used for processing the image, and the data processing unit is used for calculating the displacement according to the result of the processing by the image processing unit. In this way, there is no need to set a light detector to receive the bright and dark stripes, which overcomes the interference of electromagnetic waves on the signal, and improves the accuracy of micro-displacement measurement.
在下面的描述中闡述了很多具體細節以便於充分理解本發明,所描述的實施例僅是本發明一部分實施例,而不是全部的實施例。基於本發明中的實施例,本領域普通技術人員在沒有做出創造性勞動前提下所獲得的所有其他實施例,都屬於本發明保護的範圍。In the following description, many specific details are set forth in order to fully understand the present invention. The described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the protection scope of the present invention.
除非另有定義,本文所使用的所有的技術和科學術語與屬於本發明的技術領域的技術人員通常理解的含義相同。本文中在本發明的說明書中所使用的術語只是為了描述具體的實施例的目的,不是旨在於限制本發明。Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by those skilled in the technical field of the present invention. The terms used in the specification of the present invention herein are only for the purpose of describing specific embodiments, and are not intended to limit the present invention.
下面將結合附圖及實施例,對本發明提供的微位移測量裝置200作進一步的詳細說明。In the following, the micro-displacement measuring
請參與圖1-4,為本發明提供的一種微位移測量裝置200。所述微位移測量裝置200包括光柵尺100、影像處理單元110及數據處理單元120。所述影像處理單元110及數據處理單元120可以集成於所述光柵尺100包括的電路板上,也可以位於所述光柵尺100外部。Please refer to FIGS. 1-4, which are a
請參閱圖4及圖7,所述光柵尺100包括光源10以及依次設置在所述光源10光路上的準直裝置20、主光柵30、副光柵40、影像感測晶片50。Referring to FIGS. 4 and 7, the
所述光源10可以為發光二極體或者雷射二極體。在本實施方式中,由於雷射二極體發出的光束準直度較高,所以選擇的是雷射二極體(LD)。The
所述準直裝置20為透鏡或者光纖維,光導管。The
請參閱圖6及圖7,所述主光柵30及副光柵40分別包括第一圖案31以及位於所述第一圖案31左右兩側的多個第二圖案33,所述主光柵30及所述副光柵40兩者之一能相對另一個運動發生位移。也即,可以使主光柵30固定,而副光柵40相對主光柵30移動,還可以是副光柵40固定,主光柵30移動。6 and 7, the
可以理解,當副光柵40移動時,可以只在所述副光柵40上形成第一圖案31即可。It can be understood that when the secondary grating 40 moves, only the
所述光源10發出的光經過所述準直裝置20、主光柵30及副光柵40後能在所述影像感測晶片50上形成圖像。所述影像處理單元110用於對所述圖像進行處理,所述數據處理單元120用於根據所述影像處理單元110處理的結果計算得到位移。The light emitted by the
請參閱圖8,所述第一圖案31與鄰近的所述第二圖案33之間的間距L1等於每兩個相鄰的第二圖案33之間的間距L2。譬如,間距可以設置為0.01微米。Referring to FIG. 8, the distance L1 between the
請參閱圖6,以主光柵30為例,所述第一圖案31及所述第二圖案33共同作為圖案部310。所述第一圖案31與所述第二圖案33之間的間隔、相鄰的第二圖案33之間的間隔為空白部320。所述圖案部310與所述空白部320兩者之一能透光,另一者不能透光。也即圖案部310透光時,所述空白部320就不透光。圖案部310不透光時,所述空白部320就設置為透光。在本實施方式中,是使所述圖案部310不透光。對於副光柵40也是如同主光柵30同樣設置。如此是為了形成顏色差,使在所述影像感測晶片50上形成容易辨識的圖案部310的圖像。譬如,所述第一圖案31及第二圖案33為在所述主光柵30及副光柵40表面塗布黑漆形成。而空白部320則為透光的。可以理解,當主光柵30及副光柵40上只設置有第一圖案31時,那就除第一圖案31之外的區域全部定義為空白部320。Please refer to FIG. 6, taking the
在本實施方式中,所述第一圖案31及第二圖案33為在所述主光柵30及所述副光柵40上開設形成的不同形狀的凹槽。當第一圖案31及第二圖案33為凹槽時,黑漆通過印刷形成於所述凹槽的底表面。In this embodiment, the
所述第一圖案31為菱形凹槽、梯形凹槽,三角形凹槽或者圓形凹槽中的任意一種,所述第二圖案33為方形凹槽或者圓形凹槽中的一種。在本實施方式中,所述第一圖案31為菱形凹槽,菱形凹槽的對角線的長度可以設定為0.012微米。所述第二圖案33為方形凹槽。方形凹槽的邊長可以設定為0.01微米。The
在本實施方式中,所述光柵尺100還包括印刷電路板60。請參閱圖4及圖5,所述印刷電路板60包括第一線路板62、第二線路板64、垂直連接所述第一線路板62及第二線路板64的可撓曲的連接部66以及與所述第一線路板62連接的延伸部68,所述第一線路板62與第二線路板64正對設置,所述影像感測晶片50設置於所述第一線路板62,所述光源10設置於所述第二線路板64,所述延伸部68設置有電連接器680。所述電連接器680用於實現光柵尺100與外部電子裝置之間的信號傳輸。In this embodiment, the
在本實施方式中,所述光柵尺100還包括底座70,所述底座70包括上表面71、下表面72、連接所述上表面71與所述下表面72的前側表面73以及連接所述上表面71、下表面72的左側面74以及右側面75。所述上表面71朝向下表面72凹設形成容納槽701,所述前側表面73開設形成貫穿孔703,所述貫穿孔703與所述容納槽701相通,所述第一線路板62設置於所述容納槽701。請參閱圖1,圖2,所述印刷電路板60設置於所述底座70時所述延伸部68從所述貫穿孔703中伸出至所述容納槽701外。所述底座70還包括插槽705,所述插槽705從左側面74延伸貫穿至右側面75,所述主光柵30與所述副光柵40均從所述插槽705插設且所述主光柵30及副光柵40的兩端均位於所述插槽705外。所述副光柵40可以與所述插槽705位置固定,所述主光柵30相對所述副光柵40移動,當然,所述主光柵30與所述副光柵40還可以分別固定於相對移動的兩個物體上。In this embodiment, the
在本實施方式中,所述光柵尺100還包括設置於所述底座70上的中框80,所述中框80包括朝向所述底座70的第一表面81、相對所述第一表面81的第二表面83以及凸出於所述第二表面83的凸臺85,所述中框80開設有位於所述凸臺85一側的條形槽87,所述凸臺85中央形成有臺階部89以及位於臺階部89中央的通光孔890,所述通光孔890包括承載臺892。所述準直裝置20設置於所述承載臺892;可撓曲的所述連接部66穿過所述條形槽87以使所述第二線路板64與所述第二表面83間隔設置,所述光源10設置於所述第二線路板64上且位於所述臺階部89,從而,所述光源10發出的光束能通過所述通光孔890傳輸至所述影像感測晶片50,進而在所述影像感測晶片50上成像。In this embodiment, the
在本實施方式中,所述光柵尺100還包括蓋體90。請參閱圖5,所述蓋體90包括朝向所述中框80的底表面92,所述底表面92凹設有凹部920,所述蓋體90蓋設於所述中框80,所述第二線路板64收容於所述凹部920。In this embodiment, the
請參閱圖1,所述蓋體90上可以嵌入設置顯示幕130,所述數據處理單元120處理的位移通過電性連接或者無線傳輸的方式將計算結果傳輸至顯示幕130,所述顯示幕130用來顯示所述數據處理單元120計算得到的位移,從而,方便從所述顯示幕130上讀取位移的數值。1, a
綜上所述,本發明提供的微位移測量裝置200,由於包括主光柵30及副光柵40,在使用時,使主光柵30及副光柵40分別固定於相對移動的兩個部件上,當主光柵30相對副光柵40移動時,所述光源10發出的光經過準直裝置20、主光柵30及副光柵40後能在所述影像感測晶片50上形成圖像。在初始位置時,主光柵30的第一圖案31與副光柵40的第一圖案31是對齊的,如圖8的P1圖像所示。當主光柵30與副光柵發生位移時,主光柵30的第一圖案31與副光柵40的第一圖案31就會錯開,如圖8的P2圖像所示, 主光柵30的第一圖案31與副光柵40的第一圖案31之間的距離就代表發生的位移, 兩個所述第一圖案31之間的所有第二圖案33及所有間隔之和就是所述位移。其中,圖8的兩張圖像為了清楚顯示第一圖案31及第二圖案33均省略了圖像中的畫素點(pixel point),實際上兩張圖像均佈滿了畫素點。所述數據處理單元120中建立有圖像的畫素與圖案之間的比例關係,所述影像處理單元110能判斷所述圖像中主光柵30的第一圖案31與副光柵40的第一圖案31之間包括多少畫素,從而即可得到主光柵30的第一圖案31與副光柵40的第一圖案31之間的畫素數量,所述數據處理單元120用於根據所述影像處理單元110處理的畫素數量計算得到所述位移,並將所述位移顯示在所述顯示幕130。如此,無需設置光探測器接收明暗條紋,克服了電磁波對信號的幹擾,提高了微位移測量的準確度。In summary, the
可以理解的是,以上實施例僅用來說明本發明,並非用作對本發明的限定。對於本領域的普通技術人員來說,根據本發明的技術構思做出的其它各種相應的改變與變形,都落在本發明請求項的保護範圍之內。It can be understood that the above embodiments are only used to illustrate the present invention, and are not used to limit the present invention. For those of ordinary skill in the art, various other corresponding changes and modifications made according to the technical concept of the present invention fall within the protection scope of the claims of the present invention.
200:微位移測量裝置 100:光柵尺 110:影像處理單元 120:數據處理單元 10:光源 20:準直裝置 30:主光柵 40:副光柵 50:影像感測晶片 31:第一圖案 33:第二圖案 L1,L2:間距 310:圖案部 320:空白部 60:印刷電路板 62:第一線路板 64:第二線路板 66:連接部 68:延伸部 680:電連接器 70:底座 71:上表面 72:下表面 73:前側表面 74:左側面 75:右側面 701:容納槽 703:貫穿孔 703:插槽 80:中框 81:第一表面 83:第二表面 85:凸臺 87:條形槽 89:臺階部 890:通光孔 892:承載臺 90:蓋體 92:底表面 920:凹部 130:顯示幕 P1、P2:圖像200: Micro displacement measuring device 100: grating ruler 110: image processing unit 120: data processing unit 10: light source 20: Collimation device 30: Main grating 40: Sub-grating 50: Image sensor chip 31: The first pattern 33: The second pattern L1, L2: Spacing 310: Pattern Department 320: blank part 60: printed circuit board 62: The first circuit board 64: second circuit board 66: Connection 68: Extension 680: electrical connector 70: base 71: upper surface 72: lower surface 73: front surface 74: left side 75: right side 701: holding tank 703: Through hole 703: Slot 80: middle frame 81: The first surface 83: second surface 85: boss 87: Strip Groove 89: Step 890: Clear hole 892: Carrier 90: Lid 92: bottom surface 920: recess 130: display P1, P2: image
圖1為本發明提供的微位移測量裝置的模組示意圖。FIG. 1 is a schematic diagram of a module of a micro-displacement measuring device provided by the present invention.
圖2為圖1提供的微位移測量裝置包括的光柵尺的整體結構圖。Fig. 2 is an overall structure diagram of a grating ruler included in the micro-displacement measuring device provided in Fig. 1.
圖3為圖2提供的光柵尺的部分分解圖。Fig. 3 is a partial exploded view of the grating ruler provided in Fig. 2.
圖4為圖2提供的光柵尺的分解圖。Fig. 4 is an exploded view of the grating ruler provided in Fig. 2.
圖5為圖4提供的光柵尺的分解圖翻轉180度後的示意圖。FIG. 5 is a schematic diagram of the exploded view of the grating ruler provided in FIG. 4 after being turned 180 degrees.
圖6為圖2提供的光柵尺包括的主光柵的結構圖。Fig. 6 is a structural diagram of a main grating included in the grating ruler provided in Fig. 2.
圖7為圖2提供的光柵尺沿VII-VII方向的剖面圖。Fig. 7 is a cross-sectional view of the grating ruler provided in Fig. 2 along the direction VII-VII.
圖8為光柵尺測量位移的原理圖。Figure 8 is the principle diagram of measuring displacement with grating ruler.
10:光源10: light source
20:準直裝置20: Collimation device
30:主光柵30: Main grating
40:副光柵40: Sub-grating
50:影像感測晶片50: Image sensor chip
31:第一圖案31: The first pattern
33:第二圖案33: The second pattern
60:印刷電路板60: printed circuit board
62:第一線路板62: The first circuit board
70:底座70: base
80:中框80: middle frame
89:臺階部89: Step
890:通光孔890: Clear hole
892:承載臺892: Carrier
920:凹部920: recess
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW109108654A TWI724821B (en) | 2020-03-16 | 2020-03-16 | Micro-displacement measurement device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW109108654A TWI724821B (en) | 2020-03-16 | 2020-03-16 | Micro-displacement measurement device |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI724821B TWI724821B (en) | 2021-04-11 |
TW202136712A true TW202136712A (en) | 2021-10-01 |
Family
ID=76604795
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109108654A TWI724821B (en) | 2020-03-16 | 2020-03-16 | Micro-displacement measurement device |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI724821B (en) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5165045A (en) * | 1991-10-10 | 1992-11-17 | Eselun Steven A | Method and apparatus for measuring displacement having parallel grating lines perpendicular to a displacement direction for diffracting a light beam |
US10345096B2 (en) * | 2014-06-27 | 2019-07-09 | Illinois Tool Works Inc. | Optical strain gauge |
-
2020
- 2020-03-16 TW TW109108654A patent/TWI724821B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TWI724821B (en) | 2021-04-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7984561B2 (en) | Device for determining dimension of a workpiece | |
CN111721235B (en) | Photoelectric edge detection system and detection method thereof | |
KR100299930B1 (en) | Apparatus for measuring the dimensions of objects and the scales used therein | |
EP0006473B1 (en) | Gap measurement method | |
JP2022087326A (en) | Encoder | |
TWI724821B (en) | Micro-displacement measurement device | |
CN102865835B (en) | Vernier slit type photoelectric autocollimator | |
US11333533B2 (en) | Grating measuring module and micro-displacement measurement device | |
US6535290B1 (en) | Optical position measuring device with a beam splitter | |
US5017013A (en) | Method of determining the position of a reference point of a scanner relative to an incremental scale as well as a reference point communicator | |
JP4822342B2 (en) | Position detection method | |
KR100295477B1 (en) | Device for measuring the dimensions of objects | |
US10458882B2 (en) | Element provided with portion for position determination and measuring method | |
EP2275782A1 (en) | High resolution absolute rotary encoder | |
CN203011354U (en) | Vernier slit type photoelectric autocollimator | |
CN214149152U (en) | One-way micro-displacement detection device based on light spot image | |
JP7475163B2 (en) | measuring device | |
US20160076881A1 (en) | Measurement apparatus and adjusting method thereof | |
KR102027163B1 (en) | Measuring device and method for triangulation measurement | |
JP4401852B2 (en) | Optical displacement measuring device | |
JPH0585004B2 (en) | ||
WO1990009559A1 (en) | Position determination method and apparatus | |
JP2000314602A (en) | Size measuring tool | |
US11353583B2 (en) | Optical position-measurement device with varying focal length along a transverse direction | |
JP3226753B2 (en) | Lens and its mold |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |