TW202118118A - Method for substrate registration and anchoring in inkjet printing - Google Patents
Method for substrate registration and anchoring in inkjet printing Download PDFInfo
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- TW202118118A TW202118118A TW109121428A TW109121428A TW202118118A TW 202118118 A TW202118118 A TW 202118118A TW 109121428 A TW109121428 A TW 109121428A TW 109121428 A TW109121428 A TW 109121428A TW 202118118 A TW202118118 A TW 202118118A
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- 238000000034 method Methods 0.000 title claims abstract description 45
- 238000004873 anchoring Methods 0.000 title claims description 14
- 238000007641 inkjet printing Methods 0.000 title description 16
- 239000012705 liquid precursor Substances 0.000 claims abstract description 95
- 238000007639 printing Methods 0.000 claims abstract description 95
- 239000000463 material Substances 0.000 claims abstract description 74
- 239000004065 semiconductor Substances 0.000 claims description 25
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- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- HWNIMFWVBMOWHI-UHFFFAOYSA-N 2-morpholin-4-ylethyl prop-2-enoate Chemical compound C=CC(=O)OCCN1CCOCC1 HWNIMFWVBMOWHI-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
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Images
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/112—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using individual droplets, e.g. from jetting heads
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/40—Structures for supporting 3D objects during manufacture and intended to be sacrificed after completion thereof
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/568—Temporary substrate used as encapsulation process aid
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67282—Marking devices
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54426—Marks applied to semiconductor devices or parts for alignment
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Abstract
Description
本說明書涉及藉由噴墨印刷將材料沉積到基板上。This description relates to the deposition of materials onto a substrate by inkjet printing.
一些半導體裝置和顯示器製造步驟需要選擇性地沉積材料層。噴墨印刷已越來越多地用於半導體和顯示產業以沉積層,尤其是在要求較低解析度和定位精度的後端處理(例如鈍化和封裝)中。Some semiconductor device and display manufacturing steps require selective deposition of material layers. Inkjet printing has been increasingly used in the semiconductor and display industries to deposit layers, especially in back-end processing (such as passivation and packaging) that requires lower resolution and positioning accuracy.
在一個態樣中,一種在基板上印刷的方法,包含:藉由印刷液體前驅物材料並固化液體前驅物材料來印刷支撐結構;藉由在支撐結構外部印刷液體前驅物材料並固化液體前驅物材料來印刷一個或多個對準標記;將基板定位在支撐結構內;使用一個或多個對準標記對基板進行對位;以及藉由印刷和固化液體前驅物材料進行對位的同時,在基板上印刷一個或多個裝置結構。In one aspect, a method of printing on a substrate includes: printing a support structure by printing a liquid precursor material and curing the liquid precursor material; and printing a liquid precursor material on the outside of the support structure and curing the liquid precursor Materials to print one or more alignment marks; positioning the substrate in the support structure; using one or more alignment marks to align the substrate; and by printing and curing the liquid precursor material for alignment, while One or more device structures are printed on the substrate.
在另一態樣中,一種在基板上印刷的方法,包含以下步驟:藉由印刷液體前驅物材料並固化液體前驅物材料來印刷支撐結構;將基板定位在支撐結構內;藉由印刷和固化液體前驅物材料以將基板固定到支撐結構上,以在基板和支撐結構上印刷一個或多個錨定件;和藉由印刷和固化液體前驅物材料進行錨定的同時,在基板上印刷一個或多個裝置結構。In another aspect, a method of printing on a substrate includes the following steps: printing a support structure by printing a liquid precursor material and curing the liquid precursor material; positioning the substrate in the support structure; by printing and curing The liquid precursor material is used to fix the substrate to the support structure to print one or more anchors on the substrate and the support structure; and while anchoring is performed by printing and curing the liquid precursor material, one is printed on the substrate Or multiple device structures.
在另一個態樣中,一種在重構晶圓上印刷結構的方法,包含:將複數個半導體晶粒放置在一支撐基板上;藉由將橫跨半導體晶粒的邊緣延伸的複數個錨定件印刷到支撐基板上,從而將複數個半導體晶粒錨定到支撐基板上,從而形成重構晶圓;以及在錨定在支撐基板的同時在複數個半導體晶粒上印刷一個或多個裝置結構。印刷操作包括噴射液體前驅物材料的液滴並固化液體前驅物材料。In another aspect, a method of printing a structure on a reconstructed wafer includes: placing a plurality of semiconductor dies on a supporting substrate; by anchoring a plurality of semiconductor dies extending across the edge of the semiconductor die The parts are printed on the supporting substrate, thereby anchoring a plurality of semiconductor dies to the supporting substrate, thereby forming a reconstructed wafer; and printing one or more devices on the plurality of semiconductor dies while being anchored on the supporting substrate structure. The printing operation involves ejecting droplets of liquid precursor material and curing the liquid precursor material.
在另一態樣中,一種在基板上印刷的方法,包含以下步驟:藉由印刷液體前驅物材料並固化液體前驅物材料來印刷支撐結構;將基板定位在支撐結構內;藉由印刷和固化液體前驅物材料以將基板固定到支撐結構上,以在基板和支撐結構上印刷一個或多個錨定件;和藉由印刷和固化液體前驅物材料進行錨定的同時,在基板上印刷一個或多個裝置結構。In another aspect, a method of printing on a substrate includes the following steps: printing a support structure by printing a liquid precursor material and curing the liquid precursor material; positioning the substrate in the support structure; by printing and curing The liquid precursor material is used to fix the substrate to the support structure to print one or more anchors on the substrate and the support structure; and while anchoring is performed by printing and curing the liquid precursor material, one is printed on the substrate Or multiple device structures.
在另一態樣中,一種基板對位/對準設備,包括:液滴噴射印刷機;和控制器,控制器配置為使液滴噴射印刷機:藉由印刷液體前驅物材料並固化液體前驅物材料來印刷支撐結構;藉由印刷和固化液體前驅物材料以將基板固定到支撐結構上,以在基板和支撐結構上印刷一個或多個錨定件;和藉由印刷和固化液體前驅物材料進行錨定和對位的同時,在基板上印刷一個或多個裝置結構。In another aspect, a substrate alignment/alignment device includes: a droplet jet printer; and a controller configured to make the droplet jet printer: by printing a liquid precursor material and curing the liquid precursor Print the support structure by printing and curing the liquid precursor material; fix the substrate to the support structure by printing and curing the liquid precursor material to print one or more anchors on the substrate and the support structure; and by printing and curing the liquid precursor material While the material is anchored and aligned, one or more device structures are printed on the substrate.
在另一態樣中,一種在基板上印刷的方法,包含:藉由印刷液體前驅物材料並固化液體前驅物材料來印刷支撐結構,其中支撐結構是具有孔的環形體,基板被裝配到孔中;將基板定位在支撐結構中的孔內;以及藉由印刷和固化液體前驅物材料進行錨定和對位的同時在基板上印刷一個或多個裝置結構。In another aspect, a method of printing on a substrate includes: printing a support structure by printing a liquid precursor material and curing the liquid precursor material, wherein the support structure is a ring-shaped body with a hole, and the substrate is assembled to the hole In; positioning the substrate in the hole in the support structure; and printing one or more device structures on the substrate while anchoring and aligning by printing and curing the liquid precursor material.
錨定件可為圍繞晶粒的周邊延伸的框架,或複數個間隔開的條帶。間隔開的條帶可以是平行條紋,並且可以實質上垂直於晶粒的邊緣延伸。複數個間隔開的條帶可以包括在晶粒的複數個邊緣的每個邊緣上延伸的條帶。錨定件不需要在晶粒的中央部分上延伸。基板可為圓形的,支撐結構可包括圓形孔,基板裝配在此圓形孔中。錨定件可包括沿著徑向段延伸的條帶,徑向段以孔的中心為起點。支撐結構可以完全包圍基板或部分包圍基板。支撐結構可以比基板高,例如,支撐結構的內表面可以比基板高。液體前驅物材料可以是聚合物前驅物。The anchor may be a frame extending around the periphery of the die, or a plurality of spaced apart strips. The spaced-apart strips may be parallel stripes, and may extend substantially perpendicular to the edges of the die. The plurality of spaced apart strips may include a strip extending on each of the plurality of edges of the die. The anchor does not need to extend on the central part of the die. The substrate may be circular, and the supporting structure may include a circular hole in which the substrate is fitted. The anchor may include a strip extending along a radial section, the radial section starting from the center of the hole. The support structure may completely surround the substrate or partially surround the substrate. The support structure may be higher than the substrate, for example, the inner surface of the support structure may be higher than the substrate. The liquid precursor material may be a polymer precursor.
可能的優點可以包括但不限於以下一項或多項。The possible advantages may include but are not limited to one or more of the following.
可以提高被印刷到基板上的結構的對準精度。精確對準可以提高將材料沉積到基板上的精度和可重複性。另外,可以使用錨定件在印刷操作期間保持基板的對準,以防止基板在印刷處理中移動。例如,在印刷機發生機械振動或印刷機及其子系統從初始校準發生漂移的情況下,仍保持基板的對準狀態,可以改善在處理中以及後續處理中在基板上沉積材料的處理,從而提高了處理的精度和可重複性。The alignment accuracy of the structure printed on the substrate can be improved. Precise alignment can improve the accuracy and repeatability of the material deposited on the substrate. In addition, anchors can be used to maintain the alignment of the substrate during the printing operation to prevent the substrate from moving during the printing process. For example, in the case of mechanical vibration of the printer or drift of the printer and its subsystems from the initial calibration, the alignment of the substrate is still maintained, which can improve the process of depositing materials on the substrate during processing and subsequent processing, thereby Improve the accuracy and repeatability of processing.
在附加圖式與下面的說明中揭示一或更多個具體實施例的細節。根據說明與圖式,以及申請專利範圍,將可顯然理解其他的態樣、特徵與優點。The details of one or more specific embodiments are disclosed in the attached drawings and the following description. According to the description and drawings, as well as the scope of patent application, it will be obvious to understand other aspects, features and advantages.
液滴噴射印刷(也稱為噴墨印刷,即使不將所噴射的材料用作墨水)已經用於在半導體和顯示裝置製造中選擇性地沉積層。使用噴墨印刷進行選擇性沉積的優點是可以沉積圖案化層,而無需進行光刻、蝕刻、剝離和高真空度電漿沉積處理。噴墨印刷可提供出色的可擴展性、大產量、低成本和廣泛的色域。Droplet jet printing (also known as inkjet printing, even if the jetted material is not used as ink) has been used to selectively deposit layers in semiconductor and display device manufacturing. The advantage of using inkjet printing for selective deposition is that patterned layers can be deposited without the need for photolithography, etching, lift-off, and high-vacuum plasma deposition processes. Inkjet printing can provide excellent scalability, high yield, low cost and wide color gamut.
然而,要在其上印刷層的基板(「印刷基板」)相對於噴墨印刷機的精確對位或對準仍然是一個問題。通常,噴墨印刷機不配備用於具有例如來自先前處理步驟的現有圖案的基板的對位和對準機構,因此,將基板與印刷機精確對位和對準可能是有挑戰性的。另外,由於印刷期間的機械振動,印刷基板可能在構建平台上滑動、移動或旋轉。這種移動在習知印刷情況下可能不是問題,但是對於半導體和顯示設備製造所需的精度位準可能是不可接受的。一種解決方案是採用照相機和電腦視覺算法來監視此運動並執行印刷處理的動態調整,但是從物理部件的成本和動態控制所需的計算能力兩方面來看,此解決方案可能是昂貴的。一種更有效、經濟和可靠的解決方案是藉由使用印刷機將對準標記印刷到構建平台上,來確保構建平台上的印刷基板相對於印刷頭正確對準。替代或附加地,可以將印刷基板錨定在構建平台上,以防止在積層製造過程中藉由添加其他材料而移動。However, the precise alignment or alignment of the substrate on which the layer is to be printed ("printed substrate") relative to the inkjet printer is still a problem. Generally, inkjet printers are not equipped with alignment and alignment mechanisms for substrates with existing patterns, such as from previous processing steps, and therefore, precise alignment and alignment of the substrates with the printer can be challenging. In addition, due to mechanical vibration during printing, the printed substrate may slide, move, or rotate on the build platform. This movement may not be a problem in the conventional printing situation, but may be unacceptable for the precision level required for semiconductor and display device manufacturing. One solution is to use cameras and computer vision algorithms to monitor this movement and perform dynamic adjustments of the printing process. However, this solution may be expensive in terms of the cost of the physical components and the computing power required for dynamic control. A more effective, economical and reliable solution is to use a printer to print the alignment marks on the build platform to ensure that the printed substrate on the build platform is correctly aligned with respect to the print head. Alternatively or additionally, the printed substrate can be anchored on the build platform to prevent movement by adding other materials during the build-up manufacturing process.
噴墨印刷設備Inkjet printing equipment
圖1示出了示例噴墨印刷設備100的示意性側視圖。設備100可以噴射液態前驅物105的液滴,液滴可以被固化以形成各種結構,例如用於支撐印刷基板的支撐結構、用於確保適當的基板定位的對準標記、用於將印刷基板固定在支撐結構或平台上或將晶粒固定在重構晶圓上的錨定件,和/或重構晶圓上的印刷基板或晶粒上的層(例如鈍化層)。FIG. 1 shows a schematic side view of an example
設備100包括構建平台104和分配器114,以將液體前驅物105傳遞到構建平台104上(亦即直接傳遞到平台上、直接傳遞到平台上的印刷基板上、或傳遞到先前由平台或印刷基板上的分配器沉積的固化材料層上)。The
支座107,例如機架,將一個或多個印刷頭102保持在構建平台104上方。印刷頭102可以在構建平台104上方並平行於構建平台104的平面中移動,從而可以將印刷頭102選擇性地定位在構建平台104的可用區域上方。特定而言,支座107被配置為沿第一方向(例如沿x軸)橫穿構建平台104。A
在一些實施方式中,印刷頭102在構建平台104的構建區域的寬度上延伸。在這種情況下,不需要印刷頭102在垂直於第一方向的第二方向(例如,沿y軸)上的移動。在一些實施方式中,印刷頭102還可以在垂直於第一方向的第二方向上(例如,沿著y軸)沿著支座107移動。如果印刷頭102僅在構建平台104的構建區域的寬度的一部分上延伸,則可以使用此方法。相同的印刷頭102可用於在構建平台的長度上進行多次掃描,每個掃描覆蓋平台寬度的不同部分,例如柵格掃描。印刷頭102沿著支座107的運動以及支座107沿著x軸和y軸的運動,為印刷頭102提供了多個自由度。In some embodiments, the
當支座107在構建平台104上移動時,分配器114可以選擇性地將液體前驅物沉積到構建平台104的期望區域上,例如如由控制器150所控制的。分配器114可以將液體前驅物105輸送作為厚度相對均勻的層。When the
對於某些構建操作,例如支撐結構的製造,分配器114可以將液體前驅物105的連續層分配到構建平台104上。在分配每層之後或隨著每層的分配(但在分配下一層之前),此層可以硬化(例如固化)。每個連續層可以由處理過的(例如固化的)液體前驅物105的下層支撐。For certain construction operations, such as the manufacture of support structures, the
液體前驅物105可以以液滴的形式從分配器114中排出。例如,分配器114可以使用噴墨印刷機技術。由分配器114噴射的液體前驅物105的液滴的大小可以是均勻的,或者可以是大小變化的。前驅物105可具有足夠高的黏度,以使其在噴射到平台或先前固化的層上時不會顯著散開。The
用於液體前驅物105的材料可以包括聚合物前驅物,例如可UV固化的聚合物前驅物。範例包括(甲基)丙烯酸酯單體,並且可以包括一種或多種單(甲基)丙烯酸酯、二(甲基)丙烯酸酯、三(甲基)丙烯酸酯、四(甲基)丙烯酸酯或其組合。合適的單(甲基)丙烯酸酯的實例包括(甲基)丙烯酸異冰片酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸三甲基環己酯、(甲基)丙烯酰胺二乙基、(甲基)丙烯酰胺二甲基和(甲基)丙烯酸四氫糠酯。單體可用作交聯劑或其他反應性化合物。合適的交聯劑的實例包括聚乙二醇二(甲基)丙烯酸酯(例如,二乙二醇二(甲基)丙烯酸酯或三丙二醇二(甲基)丙烯酸酯)、N,N′-亞甲基雙(甲基)丙烯酰胺、季戊四醇三(甲基)酯、丙烯酸酯和季戊四醇四(甲基)丙烯酸酯。合適的反應性化合物的實例包括聚乙二醇(甲基)丙烯酸酯、乙烯基吡咯烷酮、乙烯基咪唑、苯乙烯磺酸酯、(甲基)丙烯酰胺、烷基(甲基)丙烯酰胺、二烷基(甲基)丙烯酰胺)、(甲基)丙烯酸羥乙酯、丙烯酸嗎啉代乙酯和乙烯基甲酰胺。丙烯酸酯和丙烯酰胺。The material used for the
分配器114可以在構建平台104上選擇性地分配前驅物105的層,使得一些部分接收前驅物105,而某些部分不接收前驅物105。分配器114可以具有開口的陣列,例如可以藉由獨立可控的閥來獨立地控制液體前驅物105的流動,或者藉由陣列的壓電噴射器來噴射液體前驅物105。The
可以處理(例如固化)前驅物105以固化並形成支撐結構200的層。可以使用第一能量源112來處理前驅物105,例如產生光並將光引導至液體前驅物材料105的光源。在一些實施方式中,第一能源112是紫外線(UV)光源。另外,第一能量源112可以被支撐在印刷頭102上。第一能量源112可以產生例如熱輻射、UV輻射、IR輻射和/或可見輻射。第一能量源112可以將光引導到在構建平台104的構建區域的整個寬度上延伸的區域。印刷頭102或支座107的運動可以在構建區域的整個長度上掃過此區域。第一能量源112可以照亮整個區域,包括具有和不具有液體前驅物105的區域。The
印刷頭102可以被配置為支撐第二能量源110。第二能量源110可以被配置為將能量引導到構建平台104上的粉末的局部區域。這些區域的直徑可以小到幾毫米(例如,使用點能源),也可以大一些(例如,使用區域能源)。點能量源可以是例如將雷射束發射到粉末的一小部分上的雷射。區域能量源可以例如是發出光的燈,光例如是紅外線、可見光或紫外線。The
在一些實施方式中,第二能量源110可以包括掃描雷射,掃描雷射產生聚焦能量束,聚焦能量束增加前驅物的小區域的溫度。第二能量源110可以使用例如產生並朝著前驅物105引導光的光源來處理前驅物105。第一能量源112可以產生例如熱輻射、UV輻射、IR輻射和/或可見輻射。在某些情況下,第二能量源110可以包括離子束或電子束。第二能量源還可包括例如雷射陣列,例如雷射二極體、提供寬光譜輻射的燈陣列(例如水銀燈)、或固態紅外發射器陣列。In some embodiments, the
在一些實施方式中,第二能源110包括可以獨立地被啟動的複數個光源。每個光源可以佈置成陣列,例如線性陣列,以便沿著帶的主軸線提供可選擇的照明。第二能量源可以包括例如發光二極體(LED),LED被配置為發射強度取決於輸送到LED的電流的輻射。In some embodiments, the
在一些實施方式中,第二能量源110可以獨立於印刷頭102移動。在一些示例中,除了結合到印刷頭102中的第二能量源110之外,設備100還可以包括獨立於印刷頭102的第二能量源。設備100還可以包括多個能量源,每個能量源都是可定址的,使得控制器150可以精確地控制構建平台104的接收能量的區域。In some embodiments, the
在構建操作期間,構建平台104可以相對於分配器114向上或向下移動。例如,在由分配器114分配每層前驅物105之後,構建平台104可以向下移動,使得印刷頭102可以在分配每個連續層後的相對於層頂部保持在相同的垂直高度。During the building operation, the
在針對對象的構建操作完成之後,可以將構建平台104移回到初始位置,以準備例如對後續對象(例如支撐結構200)的清理或構建操作(參見圖3)。After the construction operation for the object is completed, the
或者,構建平台104可以被保持在固定的垂直位置,並且支座107可以在每一層被沉積之後被升高。Alternatively, the
為了執行本文描述的操作,設備100包括控制器150,控制器150被配置為控制子系統的操作,子系統包括分配器114、第一能量源112、第二能量源110和支座107。控制器150可以包括接收和/或生成CAD資料的電腦輔助設計(CAD)系統。CAD資料指示將要形成的物體(例如支撐結構200、對準標記210和錨定件220),並且如本文所述,CAD資料可用於確定在積層製造過程中形成的結構的性質。基於CAD資料,控制器150可以生成可由與控制器150一起操作的每個系統使用的指令,例如以分配液體前驅物105、固化和硬化前驅物105、移動設備100的各種系統、並感測系統的屬性,例如固化和未固化的液體前驅物105。In order to perform the operations described herein, the
感測器160(例如照相機、掃描器或其他度量工具)可以被配置為接收關於液體前驅物105、支撐結構200和基板230的性質的信息(參見圖2A-2D、圖3和圖4)。如將在下面更詳細地討論的,感測器160可以幫助確定基板230在支撐結構200中的正確對準,並且感測器160可以被配置為向控制器150傳達關於積層製造的各種部件和子部件的信息。The sensor 160 (eg, a camera, scanner, or other metrology tool) may be configured to receive information about the properties of the
支撐結構supporting structure
參照圖2A-2D、3和4,由噴墨印刷設備100在構建平台104上形成支撐結構200。如圖3所示,支撐結構200可以是環形結構,例如圓環。支撐結構200由連續的層200a、200b、200c、200d等形成。在分配液體前驅物105的每個連續層之後,可以將其固化以支撐另一層液體前驅物105,直到形成支撐結構200。2A-2D, 3 and 4, the
支撐結構200具有孔212,基板將裝配在孔212中(見圖2A-2D)。儘管圖3示出了圓形孔,但是在其他實施方式中,根據基板的形狀,孔的其他形狀也可以是合適的,例如三角形、正方形或其他幾何形狀或複雜形狀。The
在一些實施方式中,支撐結構200不需要完全圍繞此區域以適合裝配基板。部分圍繞區域(例如許多未連接的弧形)而不是如圖3所示的完整圓的支撐結構,足以支撐基板230。In some embodiments, the
支撐結構200通常被構造成緊密地圍繞基板230(在下面討論)。支撐結構200的高度(例如,與基板230接觸的內表面204的高度)應大於基板230的厚度,以確保基板230完全容納在支撐結構230內。支撐結構200的底表面206接觸構建平台104並由其支撐。The
在形成支撐結構200之後(或者在形成支撐結構200的同時),藉由噴墨印刷設備100形成一個或多個對準標記210。對準標記210由一層或多層形成,例如連續層210a、210b、210c、210d等。在分配液體前驅物105的每個連續層之後,可以藉由第一能量源112或第二能量源對層進行處理以固化,以支撐液體前驅物105的後續層。對準標記210可以印刷在構建平台104上。After the
在一些實施方式中,對準標記210可以連接到支撐結構200的外表面202。在一些實施方式中,對準標記可以連接到支撐結構的頂表面208。對準標記210用於輔助基板230的定位和定向,以確保在後續處理(例如半導體和顯示器產業中的後續噴墨印刷處理)期間在支撐結構200內期望的定位或定向(在下文中討論)。對準標記210可以提供±50μm或以下的定位精度。此精度位準可以使得能夠將基板230有效地錨定到支撐結構200(在下面討論)。In some embodiments, the
對準標記210可以是點、條紋、環、十字或其他物理標記或指示符,以基板230的裝載期間幫助確定在基板230的定位(在下面討論)。在一些實施方式中,對準標記210是徑向延伸的條帶;並且孔212的中心可以為徑向延伸的條帶提供共同的原點。The alignment marks 210 may be dots, stripes, rings, crosses, or other physical marks or indicators to help determine the positioning on the
在形成對準標記210之後,將基板230裝載到支撐結構200中。基板可以是用於積體電路製造的半導體晶圓;半導體晶圓可以完成前端處理並準備開始後端處理,或者已經進行了一些後端處理。After the
基板230可被裝載以擱置在構建平台104上,並被支撐結構200圍繞(例如,被放置在孔212內)。或者,基板230可以擱置在支撐結構200的壁架、邊緣、斜坡205、頂表面208或其他部分上。支撐結構200可包括斜切斜面205。從頂表面208到內表面204的斜切斜面205可以引導基板230的定位,例如,基板230可以沿著斜切斜面205滑動到適當的位置。The
對準標記210可以用作支撐結構200內的基板230位置的視覺標記。感測器160,例如相對於構建平台104處於固定位置的照相機,可用於計算基板230的偏移量。例如,照相機可以用於確定對準標記210在照相機圖像中的位置。特定而言,控制器150可以執行圖像識別算法以確定對準標記210在相機圖像中的位置。可以將確定的位置與對準標記210的預設或預定位置進行比較,並且可以計算第一偏移。第一偏移可以是簡單的平移,也可以是更複雜的轉換,例如偏斜或旋轉。由印刷頭102進行的印刷可以適應對準標記210相對於對準標記210的預設或預定位置的第一偏移(如由照相機和控制器測量的)。The
相機(例如感測器160)可以用於進一步確定基板230在支撐結構200內的位置。特定而言,控制器150可以執行圖像識別算法來確定基板230在照相機圖像中的位置。可以將照相機圖像中的基板230的位置與基板230的預設或預定位置進行比較,並且可以計算第二偏移。第二偏移可以是簡單的平移,也可以是更複雜的轉換,例如偏斜或旋轉。然後,藉由印刷頭102進行的印刷可以適應基板230的第二偏移。A camera (such as the sensor 160) may be used to further determine the position of the
然後可以產生來自控制器150的控制信號,以考慮對準標記210的偏移和基板230的偏移。特定而言,可以將適當的變換應用於要印刷的層的圖像資料,使得在基板230上的特徵的印刷考慮到對準標記210的偏移和基板230的偏移。Then a control signal from the
一旦將基板230放置在支撐結構200內,就將基板230固定在支撐結構200內以防止在後續處理期間移動。在一些實施方式中,使用黏合劑將基板230固定到構建平台104,以在基板230和下面的構建平台104之間提供附加的黏合,以幫助將基板230固定到下面的構建平台104,以減少後續處理期間的移動。在一些實施方案中,使用黏合劑將基板230固定到支撐結構以提供額外的結合,並減少後續處理期間的移動。另外,支撐結構200可以藉由黏合劑固定到構建平台104上,以減少支撐結構200在後續過程中的移動。黏合劑可以是聚丙烯酸酯基、聚二甲基矽氧烷基或聚氨酯基黏合劑。Once the
另外或作為黏合劑的替代,參考圖2C-2D、3和4所示,由噴墨印刷設備100形成一個或多個錨定件220。錨定件220由一層或多層(例如連續的層220a、220b等)形成。在分配液體前驅物105的每個連續層之後,可以藉由第一能量源112或第二能量源110將其固化以支撐液體前驅物105的後續層。In addition or as an alternative to adhesives, referring to FIGS. 2C-2D, 3 and 4, one or
錨定件220形成在基板230上以及支撐結構200和/或構建平台104上。特定而言,錨定件220在基板230的邊緣上延伸並結合到周圍的下覆表面,例如,支撐結構200的頂表面或傾斜表面。錨定件220可以是例如沿著基板230的邊緣的點、條或框架,錨定件220將基板230連接到支撐結構200。錨定件220可進一步減少或防止基板230在隨後的處理(例如,隨後的噴墨印刷處理)期間在支撐結構200內移位。The
錨定件220在基板230上的接觸面積和厚度應足夠小,以使得在完成印刷處理之後,錨定件可以從基板上剝離,而基本上沒有損壞的危險。例如,接觸區域的寬度可以在0.5和2mm之間,並且錨定件220的厚度可以是0.2到1mm。錨定件的總接觸面積可以小於基板230的表面積的1%,例如小於0.5%,例如小於0.1%。The contact area and thickness of the
在將基板230錨定到支撐結構200上之後,藉由噴墨印刷設備100形成一個或多個印刷層250。印刷層250由一層或多層(例如連續的層250a、250b、250c、250d等)形成。在分配液體前驅物105的每個連續層之後,可以藉由第一能量源112或第二能量源110將其固化以支撐液體前驅物105的後續層。印刷層250可以是例如用於鈍化或封裝的層。After the
在一些實施方式中,用於在基板230上形成裝置的印刷層250由與用於形成支撐結構200和/或錨定件220相同的液體前驅物105形成。特定而言,可以從用於支撐結構200和/或錨定件220的相同噴嘴中噴射出形成印刷層250的液體前驅物。這確保為基板230上的裝置維持先前執行的對準或對位。In some embodiments, the
然而,在一些實施方式中,被噴射以形成印刷層250以形成裝置的液體前驅物,具有與被噴射以形成支撐結構200和/或錨定件220的液體前驅物不同的成分。但是,這裡存在的危險是,液體前驅物的不同材料特性會導致不同的噴射特性,例如速度、飛行時間、角度。因此,對於印刷層250和支撐結構200和/或錨定件220使用相同的材料,對於對準和對位具有更高的可靠性。However, in some embodiments, the liquid precursor that is sprayed to form the
在一些方法中,可以清洗噴嘴,然後清洗用於支撐結構200和/或錨定件220的相同噴嘴。或者,可以從相同的印刷頭102上的不同噴嘴組或相同的支座107上的不同印刷頭上噴射形成印刷層250的液體前驅物,使得可對不同噴嘴組應用基於對準或對位的對支座107的位置調整。然而,這裡存在的危險是,不同的噴嘴將具有略微不同的構造,這又會影響噴射特性,例如速度、飛行時間、角度。因此,對於印刷層250和支撐結構200和/或錨定件220使用相同的噴嘴,對於對準和對位具有更高的可靠性。In some methods, the nozzles can be cleaned and then the same nozzles used for the
本文所說明的系統的控制器150與其他計算裝置部分,可被由數位電子電路系統實施,或由電腦軟體、韌體或硬體來實施。例如,控制器可包含處理器以執行如儲存在電腦程式產品中(例如在非暫態性機器可讀取儲存媒體中)的電腦程式。電腦程式(也稱為程式、軟體、軟體應用、或碼)可用任何形式的程式語言編寫,包括編譯或解釋語言,並且可以以任何形式部署,包括作為獨立程序或作為模組、部件、子程序、或其他適合在計算環境中使用的單元。The
所說明的系統的控制器150與其他計算裝置部分,可包含非暫態性電腦可讀取媒體以儲存資料物件,例如電腦協助設計(CAD)相容檔案,這種檔案識別應由哪種圖樣對每一層沈積進料。例如,資料物件可為STL格式檔案、3D製造格式(3MF)檔案、或積層製造檔案格式(AMF)檔案。例如,控制器可接收來自遠端電腦的資料物件。控制器150中的處理器(例如由韌體或軟體控制),可解譯從電腦接收來的資料物件,以產生控制設備100部件以融合每一層的指定圖樣所必需的訊號組。The
參照圖4所示,錨定件220可用於將單個晶粒260的陣列結合到基礎基板(例如基板230)以形成重構晶圓240,此晶圓具有附接至其表面以用於後續處理的個別晶粒的陣列。圖5A-5H示出了用於錨定件220的各種圖案和構造(假定為方形晶粒260)。錨定件可以採用各種形式,例如連續框架(參見圖5A和5B)、點(參見圖5C和5D)、條帶(參見圖5E-5H)或以上的組合。錨定件220將晶粒260(例如基板230)固定到下覆的重構晶圓240。4, the
可以根據需要選擇錨定件220的尺寸以提供期望的錨定程度。例如,錨定件220可具有薄的輪廓(如圖5E中所示),以減小錨定件220佔據的基板230上的面積,以促進剝離。或者,當處理需要更強的錨定時,諸如圖5B或5F的構造可以被使用,以將基板230錨定到支撐結構200。The size of the
儘管本文件包含許多特定的實施細節,但是這些細節不應被解釋為對本揭示內容的任何具體實施例的範圍或可以請求的內容的限制,而是作為對特定發明的特定具體實施例特有的特徵的描述。本文件在個別具體實施例的背景內容中所說明的某些特徵,亦可被結合實施於單一具體實施例中。相對的,在單一具體實施例的背景內容中說明的各種特徵,亦可被個別地實施於多個具體實施例中或在任何適合的子結合中。再者,儘管上文可將特徵描述為以某些組合起作用並且甚至最初如此主張,但是來自所請求保護的組合的一個或多個特徵可以在一些情況下從組合中刪除,並且所請求保護的組合可以針對子組合或子組合的變化。Although this document contains many specific implementation details, these details should not be construed as limitations on the scope of any specific embodiments of the present disclosure or the content that can be requested, but as features specific to specific embodiments of the specific invention. description of. Certain features described in the background content of individual specific embodiments in this document can also be combined and implemented in a single specific embodiment. In contrast, various features described in the background content of a single specific embodiment can also be implemented in multiple specific embodiments individually or in any suitable sub-combination. Furthermore, although the features above may be described as functioning in certain combinations and even initially claimed as such, one or more features from the claimed combination may in some cases be deleted from the combination and the claimed The combination of can be for sub-combination or sub-combination changes.
第1圖的噴頭包含讓設備100能夠建構物件的數個系統。在一些情況中,AM設備包含獨立操作式系統而非噴頭,獨立操作式系統包含獨立操作的能量源、分配器、與感測器。這些系統之每一者可被獨立移動,且可或可不為模組噴頭的部分。在一些示例中,印刷頭僅包括分配器,並且設備包括單獨的能量源以執行合併(fusing)操作。因此,在這些示例中,印刷頭將與控制器配合執行分配操作。The shower head of Figure 1 includes several systems that allow the
已說明了數種具體實施例。儘管如此,將瞭解到可進行各種修改。上文說明為噴頭部分的各種部件,諸如分配器、撒佈器、感測系統、熱源及(或)能量源,可被裝設在高架上而非噴頭中,或被裝設在支撐高架的框架上。因此,存在位於申請專利範圍的範圍內的其他具體實施例。Several specific embodiments have been described. Nevertheless, it will be understood that various modifications can be made. The various components of the sprinkler head described above, such as distributors, spreaders, sensing systems, heat sources and/or energy sources, can be installed on the overhead instead of in the nozzle, or installed on the supporting overhead Frame. Therefore, there are other specific embodiments within the scope of the patent application.
100:噴墨印刷設備
102:印刷頭
104:構建平台
105:液態前驅物
107:支座
110:第二能量源
112:第一能量源
114:分配器
150:控制器
160:感測器
200:支撐結構
200a:層
200b:層
200c:層
200d:層
202:外表面
204:內表面
205:斜切斜面
206:底表面
208:頂表面
210:對準標記
210a:層
210b:層
210c:層
210d:層
212:孔
220:錨定件
220a:層
220b:層
230:基板
240:重構晶圓
250:印刷層
250a:層
250b:層
250c:層
250d:層
260:晶粒100: Inkjet printing equipment
102: print head
104: Build a platform
105: Liquid precursor
107: Support
110: second energy source
112: First Energy Source
114: Distributor
150: Controller
160: Sensor
200: supporting
圖1是積層製造處理的示例的示意性側視圖。Fig. 1 is a schematic side view of an example of a build-up manufacturing process.
圖2A-2D是示例性支撐結構的示意性側視圖。Figures 2A-2D are schematic side views of exemplary support structures.
圖3是示例性支撐結構的透視圖。Figure 3 is a perspective view of an exemplary support structure.
圖4是在重構的晶圓上的示例錨定晶粒的示意性俯視圖。Figure 4 is a schematic top view of an example anchor die on a reconstituted wafer.
圖5A-5H是示例錨定圖案的示意性俯視圖。Figures 5A-5H are schematic top views of example anchoring patterns.
國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無Domestic deposit information (please note in the order of deposit institution, date and number) no Foreign hosting information (please note in the order of hosting country, institution, date, and number) no
100:噴墨印刷設備 100: Inkjet printing equipment
102:印刷頭 102: print head
104:構建平台 104: Build a platform
105:液態前驅物 105: Liquid precursor
107:支座 107: Support
110:第二能量源 110: second energy source
112:第一能量源 112: First Energy Source
114:分配器 114: Distributor
150:控制器 150: Controller
160:感測器 160: Sensor
Claims (30)
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US201962868645P | 2019-06-28 | 2019-06-28 | |
US62/868,645 | 2019-06-28 | ||
US62/868,701 | 2019-06-28 | ||
US16/838,999 US11322381B2 (en) | 2019-06-28 | 2020-04-02 | Method for substrate registration and anchoring in inkjet printing |
US16/838,981 US11367643B2 (en) | 2019-06-28 | 2020-04-02 | Method for substrate registration and anchoring in inkjet printing |
US16/839,007 | 2020-04-02 | ||
US16/838,999 | 2020-04-02 | ||
US16/838,981 | 2020-04-02 | ||
US16/839,007 US11329003B2 (en) | 2019-06-28 | 2020-04-02 | Anchoring dies using 3D printing to form reconstructed wafer |
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US8587743B2 (en) * | 2008-09-18 | 2013-11-19 | Konica Minolta Holdings, Inc. | Inkjet image-drawing device |
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