TW202116204A - A bonding method for an adhesive with a substrate - Google Patents

A bonding method for an adhesive with a substrate Download PDF

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Publication number
TW202116204A
TW202116204A TW109136772A TW109136772A TW202116204A TW 202116204 A TW202116204 A TW 202116204A TW 109136772 A TW109136772 A TW 109136772A TW 109136772 A TW109136772 A TW 109136772A TW 202116204 A TW202116204 A TW 202116204A
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Taiwan
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melt adhesive
hot melt
substrate
hot
polar medium
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TW109136772A
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Chinese (zh)
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許立雍
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許立雍
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    • AHUMAN NECESSITIES
    • A43FOOTWEAR
    • A43BCHARACTERISTIC FEATURES OF FOOTWEAR; PARTS OF FOOTWEAR
    • A43B13/00Soles; Sole-and-heel integral units
    • AHUMAN NECESSITIES
    • A43FOOTWEAR
    • A43DMACHINES, TOOLS, EQUIPMENT OR METHODS FOR MANUFACTURING OR REPAIRING FOOTWEAR
    • A43D25/00Devices for gluing shoe parts
    • AHUMAN NECESSITIES
    • A43FOOTWEAR
    • A43DMACHINES, TOOLS, EQUIPMENT OR METHODS FOR MANUFACTURING OR REPAIRING FOOTWEAR
    • A43D25/00Devices for gluing shoe parts
    • A43D25/16Devices for making glued platform shoes
    • AHUMAN NECESSITIES
    • A43FOOTWEAR
    • A43DMACHINES, TOOLS, EQUIPMENT OR METHODS FOR MANUFACTURING OR REPAIRING FOOTWEAR
    • A43D25/00Devices for gluing shoe parts
    • A43D25/20Arrangements for activating or for accelerating setting of adhesives, e.g. by using heat
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/04Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould using liquids, gas or steam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation

Abstract

The present invention discloses an adhesive-covered substrate including an adhesive with polar medium and a substrate. Among this, at least one of the polar medium and the adhesive can be heated and liquefied via an activated means, so as to a substrate surface of the substrate is adhered to a colloidal surface of the adhesive. Similarly, the substrate surface can be separated from the colloidal surface in response to the activated means. Thereby, the adhesive can be repeatedly adhered to or separated from the substrate.

Description

熱熔膠體與基材之結合方法Combination method of hot melt glue and substrate

本發明係提供一種具有熱熔膠體之基材及其結合方法,特別是一種具有極性介質之熱熔膠體,且藉由一活化手段,以活化加熱極性介質與熱熔膠體中之至少一者,而使熱熔膠體結合基材。The present invention provides a substrate with a hot melt adhesive and a method for combining the same, especially a hot melt adhesive with a polar medium, and at least one of the polar medium and the hot melt adhesive is activated by an activation means, The hot-melt glue is combined with the substrate.

隨著製造業的蓬勃發展,對於如何應用熱熔膠體於不同產業的基材中,以達到簡化流程、自動化生產並降低成本,實為目前各產業發展的重要議題。With the vigorous development of the manufacturing industry, how to apply hot melt adhesives to substrates in different industries in order to simplify processes, automate production and reduce costs has become an important issue for the development of various industries.

然而,於各個產業中,實際將熱熔膠體結合於基材上時,便發現不同的材質特性會嚴重限制了習知熱熔膠體的應用範圍及方式。詳細來說,以習知加熱方法加熱習知熱熔膠體時,會因高溫而破壞與熱熔膠體結合之基材,像是鞋材或是鞋面等。且,因材質或是基材整體的結構性因素,也會使習知熱熔膠體無法被順利加熱,以致迄今,仍無法將熱熔膠體大量地引入不同產業中實施。However, in various industries, when the hot-melt adhesive is actually bonded to the substrate, it is found that different material characteristics will severely limit the application range and method of the conventional hot-melt adhesive. In detail, when the conventional hot-melt adhesive is heated by the conventional heating method, the substrate combined with the hot-melt adhesive, such as shoe material or upper, will be damaged due to high temperature. In addition, due to the structural factors of the material or the substrate as a whole, the conventional hot-melt adhesive cannot be heated smoothly. So far, it has not been possible to introduce the hot-melt adhesive in large quantities in different industries for implementation.

就以製鞋業來說,傳統製鞋流程十分繁瑣又複雜,其中應用的基材至少包括中叉、部件、中底(midsole)、大底(outsole)、鞋面(upper)或其他配件等,皆須仰賴大量的人力塗膠並組裝。以運動鞋為例,其至少包括大底(outsole)、緩震中底(midsole)及鞋面(upper)等組裝配件,且於組裝時需經由大量人工處理多道流程,例如:打粗、清洗、上處理劑、烘乾、多次上膠水後再烘乾以及貼合等程序,始能順利完成,此實極為費時、費力又高成本。As far as the shoe industry is concerned, the traditional shoemaking process is very cumbersome and complicated, and the applied substrates include at least the middle fork, parts, midsole, outsole, upper or other accessories, etc. , All have to rely on a lot of manpower to apply glue and assemble. Taking sports shoes as an example, they at least include assembly accessories such as outsole, midsole and upper, and a lot of manual processing and multiple processes are required during assembly, such as roughing and cleaning. Procedures such as applying treatment agent, drying, drying after applying glue several times, and laminating can only be completed smoothly, which is extremely time-consuming, laborious and costly.

甚且,應用於鞋體的基材大多為軟質材料或不規則的形體,縱使現今自動化機械技術已大幅進展,仍無法克服以機械手臂組裝上述各式基材的難題,因而未能使製鞋流程得以自動化,從而無法提升整體的產能及有效地降低成本。Moreover, most of the substrates used in shoe bodies are soft materials or irregular shapes. Even though the automation machinery technology has made great progress today, it is still unable to overcome the difficulty of assembling the above-mentioned various substrates with a robotic arm, and therefore fails to make shoes. The process can be automated, so that the overall production capacity cannot be increased and the cost can be effectively reduced.

再者,習知的製鞋流程因大多採用液態膠水以及處理劑,其包含揮發性有機物(Volatile Organic Compounds, VOC)。而揮發性有機物中之有毒化合物嚴重地危害自然環境以及人體健康,因此,也即將面臨日後必須被禁止使用的潛在環保問題。Furthermore, the conventional shoemaking process mostly uses liquid glue and treatment agent, which contains Volatile Organic Compounds (VOC). The toxic compounds in volatile organic compounds seriously endanger the natural environment and human health. Therefore, they are about to face potential environmental protection issues that must be banned in the future.

有鑒於此,對於如何將熱熔膠體廣泛應用於各產業中,實仍須設計出一種新穎與流程方便的結合方法及具有熱熔膠體之基材,以解決前述習知技術於應用上所產生的缺失。In view of this, for how to apply hot melt adhesives to various industries, it is still necessary to design a novel and convenient process combination method and a substrate with hot melt adhesives to solve the problems caused by the application of the aforementioned conventional technologies. The missing.

本發明之目的在於提供一種具有熱熔膠體之基材及其結合方法,以達到自動化生產並提升產能,且同時有效地降低成本以及顧慮環保議題。The purpose of the present invention is to provide a substrate with hot melt adhesive and a bonding method thereof, so as to achieve automated production and increase productivity, while effectively reducing costs and considering environmental issues.

本發明之熱熔膠體可應活化手段而被重複地液化接著於複數基材,亦可藉由活化手段而拆解分離複數基材,亦即複數基材可重複地藉由活化手段而被液化接著或液化分離於彼此,只要當熱熔膠體的溫度經由活化誘發而達到熔點溫度時,即可有此功效。如此,本發明之具有極性介質的熱熔膠體不僅可組裝接著於不同複合基材,還可解決當前必要的環保議題,有利於回收循環再利用,大幅地減少環境的負擔。The hot melt adhesive of the present invention can be repeatedly liquefied by activation means and then be liquefied on multiple substrates, or can be disassembled and separated by activation means, that is, multiple substrates can be repeatedly liquefied by activation means Then or liquefy and separate from each other, as long as the temperature of the hot melt gel reaches the melting point temperature through activation induction, this effect can be achieved. In this way, the hot melt adhesive with polar medium of the present invention can not only be assembled on different composite substrates, but also solve the current necessary environmental protection issues, facilitate recycling and reuse, and greatly reduce the burden on the environment.

以下係提出實施例進行詳細說明,實施例僅用以作為範例說明,並不會限縮本發明欲保護之範圍。此外,實施例中之圖式係省略不必要或以通常技術即可完成之元件,以清楚顯示本發明之技術特點。以下,茲以本發明之較佳實施例並配合圖式作進一步說明。The following examples are provided for detailed description. The examples are only used as examples for description, and do not limit the scope of the present invention to be protected. In addition, the drawings in the embodiments omit unnecessary components or components that can be completed by common techniques to clearly show the technical features of the present invention. Hereinafter, the preferred embodiments of the present invention are further described in conjunction with the drawings.

請參閱圖1A至圖1F,圖1A係為應用本案發明概念之第一較佳實施概念中基材、熱熔膠體及限位手段的方塊示意圖。圖1B至圖1C係為本案發明概念中熱熔膠體與基材之結合方法的第一較佳實施流程圖。圖1D至圖1F係為應用圖1C而形成不同具有熱熔膠體之基材的剖面圖Please refer to FIGS. 1A to 1F. FIG. 1A is a block diagram of the substrate, the hot melt adhesive, and the limiting means in the first preferred embodiment applying the inventive concept of the present invention. FIG. 1B to FIG. 1C are the first preferred implementation flowcharts of the method of combining the hot melt adhesive and the substrate in the concept of the present invention. Figures 1D to 1F are cross-sectional views of using Figure 1C to form different substrates with hot melt adhesives

如圖1A至圖1C所示,本案之結合方法S11-S15應用於基材110、熱熔膠體120、限位手段130與活化手段140,基材110係由基材形成機構111所形成或入料,基材形成設備111可包括基材製作設備、基材塑模成型設備或基材射出成型設備;熱熔膠膜120具有極性介質121,以重複性地因應活化手段140而活化產生熱能;限位手段130包括限位施壓機構131以及離型結構體132,限位施壓機構131於實際應用中,可包括限位機構1311以及施壓機構1312,抑或由兩者結合而組成的單一限位施壓機構131。其中,離型結構體132設置於限位施壓機構131與熱熔膠體120中之至少一者,也就是說離型結構體132可設置於兩者120.131接觸之處。舉例來說,離型結構體132可設於限位施壓機構131上及/或貼附於熱熔膠體120上,其中離型結構體132的材質可為AB膠、塑料、金屬、矽膠或其他軟質不沾膠材料,以使熱熔膠膜120不沾黏於限位施壓機構131。As shown in Figures 1A to 1C, the bonding methods S11-S15 of this case are applied to the substrate 110, the hot melt adhesive 120, the limiting means 130 and the activation means 140. The substrate 110 is formed or inserted by the substrate forming mechanism 111. The substrate forming equipment 111 may include substrate manufacturing equipment, substrate molding equipment or substrate injection molding equipment; the hot melt adhesive film 120 has a polar medium 121 to repeatedly activate in response to the activation means 140 to generate heat; The limiting means 130 includes a limiting and pressing mechanism 131 and a release structure 132. In practical applications, the limiting and pressing mechanism 131 may include a limiting mechanism 1311 and a pressing mechanism 1312, or a single combination of the two Limit pressure mechanism 131. The release structure 132 is disposed on at least one of the limit pressing mechanism 131 and the hot melt adhesive 120, that is, the release structure 132 can be disposed at the place where the two 120.131 contact. For example, the release structure 132 can be provided on the limit pressing mechanism 131 and/or attached to the hot melt adhesive 120. The material of the release structure 132 can be AB glue, plastic, metal, silicon or Other soft non-stick materials, so that the hot melt adhesive film 120 does not stick to the limit pressing mechanism 131.

再者,活化手段140用以活化極性介質121與熱熔膠體120中之至少一著,以使熱熔膠體因應活化而被加熱呈液化狀態,其中當活化手段140為電磁場處理手段140時,其係由電磁場處理機構產生無線電波140a、微波140a或電離輻射線140a,而誘發極性介質121及/或熱熔膠體120;抑或,當活化手段140為介質處理手段140時,其係由介質處理機構以加熱液體140a或加熱氣體140a的方式,而活化極性介質121及/或熱熔膠體120。Furthermore, the activation means 140 is used to activate at least one of the polar medium 121 and the hot melt adhesive 120, so that the hot melt adhesive is heated to a liquefied state in response to the activation. When the activation means 140 is an electromagnetic field treatment means 140, it Radio waves 140a, microwaves 140a, or ionizing radiation 140a are generated by the electromagnetic field processing mechanism to induce the polar medium 121 and/or the hot melt colloid 120; or, when the activation means 140 is the medium processing means 140, it is caused by the medium processing mechanism The polar medium 121 and/or the hot melt adhesive 120 are activated by heating the liquid 140a or heating the gas 140a.

其中,本案之熱熔膠體120包括熱塑性材質之樹脂,於實際應用中可為聚氨酯(PU、TPU)、反應型聚氨酯(PUR)、聚己內酯(PCL)、聚碳酸酯(PC)、乙烯-醋酸乙烯共聚物(EVA)、聚氯乙烯(PVC)、聚乙烯(PE)、聚丙烯(PP)、聚苯乙烯(SBS、SIS、SEBS)、ABS、聚酰胺(PA)、熱塑性聚酯(PET、PBT)、聚醚(Polyether)、酚醛樹脂(PF)、聚乙烯醇縮醛(Polyvinyl acetal)、聚碸(PSU)、聚酰亞胺(PI)、熱塑性丁苯橡膠(TPR)、熱塑性硫化膠(TPV)等之其中一者、其中之共聚物或混合物。且,該熱熔膠體120可為熱熔膠液、熱熔膠粉末、熱熔膠粒子、熱熔膠片、熱熔膠膜與熱熔膠塊中之至少一者或及其組合。Among them, the hot melt adhesive 120 in this case includes thermoplastic resins, which in practical applications can be polyurethane (PU, TPU), reactive polyurethane (PUR), polycaprolactone (PCL), polycarbonate (PC), vinyl -Vinyl acetate copolymer (EVA), polyvinyl chloride (PVC), polyethylene (PE), polypropylene (PP), polystyrene (SBS, SIS, SEBS), ABS, polyamide (PA), thermoplastic polyester (PET, PBT), polyether (Polyether), phenolic resin (PF), polyvinyl acetal, polyvinyl acetal (PSU), polyimide (PI), thermoplastic styrene butadiene rubber (TPR), One of thermoplastic vulcanizates (TPV), copolymers or mixtures thereof. Moreover, the hot melt adhesive 120 may be at least one of hot melt adhesive liquid, hot melt adhesive powder, hot melt adhesive particles, hot melt film, hot melt adhesive film, and hot melt adhesive block, or a combination thereof.

要特別說明的是,熱熔膠體120中之極性介質121的定義為,在化學中,極性(polarity)係指一根共價鍵或一個共價分子中電荷分布的不均勻性。當電荷分布不均勻則稱該鍵或分子為極性;相同地,若分布均勻則稱為非極性。亦即,共價鍵的極性係因成鍵或分子中的兩個原子電負度不相同而產生的。因此,熱熔膠體120中之極性介質121可因應活化手段140中之無線電波140a、微波140a或電離輻射線140a而被誘發,相當於一微波介質121可因應電磁場的變化而被誘發加熱。In particular, the definition of the polar medium 121 in the hot melt adhesive 120 is that in chemistry, polarity refers to the unevenness of the charge distribution in a covalent bond or a covalent molecule. When the charge distribution is uneven, the bond or molecule is called polar; similarly, if the distribution is uniform, it is called non-polar. That is, the polarity of the covalent bond is caused by the bond formation or the difference in electronegativity between the two atoms in the molecule. Therefore, the polar medium 121 in the hot melt adhesive 120 can be induced in response to the radio waves 140a, microwaves 140a, or ionizing radiation 140a in the activation means 140, which is equivalent to a microwave medium 121 that can be induced to heat in response to changes in the electromagnetic field.

依此,本案之極性介質121可經由活化手段140重複性地活化,而使熱熔膠體120得以被加熱液化,從而產生接著結合的效果,亦即本案具有極性介質121之熱熔膠體120可經由活化手段140,而得以被重複性地活化而多次結合或分離於至少一基材110,從而達到具有重複性組裝結合或拆解分離的功效。再者,熱熔膠體120中之樹脂以100重量份為基準,其中可包含0.001至60重量份的極性介質121。Accordingly, the polar medium 121 of the present case can be repeatedly activated by the activation means 140, so that the hot melt adhesive 120 can be heated and liquefied, thereby producing the effect of subsequent bonding, that is, the hot melt adhesive 120 with the polar medium 121 in this case can pass through The activation means 140 can be repeatedly activated to be combined or separated from at least one substrate 110 multiple times, thereby achieving the effect of repetitive assembly, combination, or disassembly and separation. Furthermore, the resin in the hot melt adhesive 120 is based on 100 parts by weight, and may contain 0.001 to 60 parts by weight of the polar medium 121.

於實際應用中,極性介質121可為極性化合物、極性聚合物、碳及其化合物、陶瓷粉末或金屬及其氧化物。之中,極性化合物可為醇類或胺類,如水、丁酮、二甲基乙醯胺、二乙二醇、二乙醇胺、丙三醇或乙二胺。極性聚合物可為聚氨酯、聚氯乙烯、聚酰胺。碳及其化合物可為碳黑、石墨、碳化矽、羰基铁粉。陶瓷粉末可為矽酸鹽、氮化硼。金屬及其氧化物,如為鐵、鋅、銅、鋁、錳、鑭、氧化鋅、二氧化錳、四氧化三鐵或二氧化鈦。In practical applications, the polar medium 121 can be a polar compound, a polar polymer, carbon and its compound, ceramic powder or metal and its oxide. Among them, the polar compound may be alcohols or amines, such as water, methyl ethyl ketone, dimethylacetamide, diethylene glycol, diethanolamine, glycerol or ethylenediamine. The polar polymer can be polyurethane, polyvinyl chloride, polyamide. Carbon and its compounds can be carbon black, graphite, silicon carbide, carbonyl iron powder. The ceramic powder can be silicate or boron nitride. Metals and their oxides, such as iron, zinc, copper, aluminum, manganese, lanthanum, zinc oxide, manganese dioxide, ferroferric oxide or titanium dioxide.

此外,極性介質121可與樹脂混合形成熱熔膠體120;抑或於熱熔膠體120形成後,極性介質121位於熱熔膠體120內部或表面;抑或極性介質121應用於熱熔膠體120結合於基材110時,其可位於熱熔膠體120與基材110之間。當然,極性介質除了應用於熱熔膠體之外,亦可應用於基材中,主要因應活化手段而直接地或間接地加熱液化熱熔膠體,以使熱熔膠體與基材得以接著結合,不應以本案之實施例為限制。In addition, the polar medium 121 can be mixed with resin to form the hot melt adhesive 120; or after the hot melt 120 is formed, the polar medium 121 is located inside or on the hot melt adhesive 120; or the polar medium 121 is applied to the hot melt adhesive 120 to bond to the substrate At 110, it can be located between the hot melt adhesive 120 and the substrate 110. Of course, in addition to the application of the polar medium to the hot melt adhesive, it can also be applied to the substrate, mainly in response to the activation means to directly or indirectly heat the liquefied hot melt adhesive, so that the hot melt adhesive can be subsequently combined with the substrate. It should be limited by the embodiment of this case.

接著,請再搭配參閱圖1A至圖1F,以說明熱熔膠體120與基材110之結合方法與其形成之結果。本案之結合方法S11-S15係為,執行步驟S11:置放熱熔膠體120與基材110於限位機構1311中,以使熱熔膠體120限位並接觸於基材表面110a,亦可置放熱熔膠體120與基材110中之至少一者於限位施壓機構131中,相當於入料流程;執行步驟S12:藉由施壓機構1312,以使熱熔膠體120及基材表面110a中之一者被緊密地施壓於其中之另一者,以使熱熔膠體120可緊密地接觸基材110之基材表面110a;執行步驟S13:藉由活化手段140,活化具有極性介質121之熱熔膠體120,以使熱熔膠體120之膠體表面120a接著結合於基材表面110a,相當於以活化方式來誘發而加熱極性介質121及/或熱熔膠體120,而使膠體表面120a結合基材表面110a;執行步驟S14:藉由冷卻手段,冷卻貼附於基材110之熱熔膠體120,其中冷卻手段為液體冷卻方式或氣體冷卻方式;執行步驟S15:藉由加工手段,去除未結合於基材表面110a之部分熱熔膠體120,相當於以去毛邊的方式去除多餘的熱熔膠體120,以完成具有熱熔膠體120之基材110。Next, please refer to FIGS. 1A to 1F to illustrate the method of combining the hot melt adhesive 120 and the substrate 110 and the result of its formation. The combination method S11-S15 of this case is to perform step S11: place the hot melt adhesive 120 and the substrate 110 in the limiting mechanism 1311, so that the hot melt adhesive 120 is limited and contacted with the substrate surface 110a, and can also be placed to release heat At least one of the melt adhesive 120 and the substrate 110 is in the limit pressing mechanism 131, which is equivalent to the feeding process; Step S12 is performed: the pressing mechanism 1312 is used to make the hot melt adhesive 120 and the substrate surface 110a One of them is pressed tightly on the other, so that the hot melt adhesive 120 can closely contact the substrate surface 110a of the substrate 110; Step S13 is performed: the activation means 140 is used to activate the polar medium 121 The hot melt adhesive 120, so that the colloidal surface 120a of the hot melt adhesive 120 is then bonded to the substrate surface 110a, which is equivalent to inducing and heating the polar medium 121 and/or the hot melt adhesive 120 in an activation manner, so that the colloidal surface 120a is bonded to the base Material surface 110a; Step S14: Cool the hot melt adhesive 120 attached to the substrate 110 by means of cooling, wherein the cooling means is liquid cooling or gas cooling; Step S15: Use processing means to remove unbound The part of the hot melt adhesive 120 on the surface 110 a of the substrate is equivalent to removing the excess hot melt adhesive 120 by deburring to complete the substrate 110 with the hot melt adhesive 120.

詳細來說,除了上述結合方法S11-S15之外,本案之結合方法還可為下列步驟S161-S163,其中更包括:具有基材表面112a之另一基材112與具有膠體表面122a之另一熱熔膠體122。執行步驟S161:形成具有極性介質121之熱熔膠體120於基材110之基材表面110a,如同前述步驟S11-S15所形成之具有熱熔膠體的基材;執行步驟S162:形成另一熱熔膠體122於基材110之另一基材表面110b,其中另一基材表面110b接觸另一熱熔膠體122之膠體表面122a,且藉由上述步驟S13:再次活化具有極性介質121之熱熔膠體120,而使基材表面110a及另一基材表面110b分別形成於熱熔膠體120及另一熱熔膠體122上。In detail, in addition to the above-mentioned bonding methods S11-S15, the bonding method of this case may also include the following steps S161-S163, which further include: another substrate 112 with a substrate surface 112a and another substrate with a colloidal surface 122a Hot melt adhesive 122. Perform step S161: form the hot melt adhesive 120 with the polar medium 121 on the substrate surface 110a of the substrate 110, as the substrate with the hot melt adhesive formed in the previous steps S11-S15; perform step S162: form another hot melt The gel 122 is on the other substrate surface 110b of the substrate 110, wherein the other substrate surface 110b contacts the gel surface 122a of the other hot melt gel 122, and the hot melt gel with the polar medium 121 is activated again by the above step S13 120, so that the substrate surface 110a and the other substrate surface 110b are formed on the hot melt adhesive 120 and the other hot melt adhesive 122, respectively.

接著,執行步驟S163:形成另一基材112於熱熔膠體120之另一膠體表面120b,其中另一膠體表面120b接觸另一基材112之基材表面112a,且藉由上述步驟S13:再次活化具有極性介質121之熱熔膠體120,並藉由熱熔膠體120,122被活化液化,而使兩基材表面110a,112a分別被接著結合於熱熔膠體之120之膠體表面120a及另一膠體表面120b。依此,完成形成如圖1D所示之具有熱熔膠體120,122之基材110,112。Next, perform step S163: forming another substrate 112 on the other gel surface 120b of the hot melt adhesive 120, wherein the other gel surface 120b contacts the substrate surface 112a of the other substrate 112, and by the above step S13: again The hot melt adhesive 120 with the polar medium 121 is activated, and the hot melt adhesives 120, 122 are activated and liquefied, so that the two substrate surfaces 110a, 112a are respectively bonded to the colloidal surface 120a and the other colloidal surface of the hot melt adhesive 120, respectively 120b. According to this, the substrate 110, 112 with the hot melt adhesive 120, 122 as shown in FIG. 1D is completed.

要特別說明的是,上述步驟S161-S163可因應實際需求而調整。舉例來說,當執行步驟S161-S162時,即可形成具有雙面熱熔膠體120,122的基材110如圖1E所示,也就是基材表面110a及另一基材表面110b分別形成於熱熔膠體120及另一熱熔膠體122上。當執行步驟S161及S163時,可使基材110及另一基材112藉由熱熔膠體120,122被活化液化,而被組裝結合如圖1F所示,兩基材表面110a,112a分別結合於熱熔膠體之120之膠體表面120a及另一膠體表面120b。It should be particularly noted that the above steps S161-S163 can be adjusted according to actual needs. For example, when steps S161-S162 are performed, a substrate 110 with double-sided hot melt adhesives 120, 122 can be formed as shown in FIG. 1E, that is, the substrate surface 110a and the other substrate surface 110b are formed on the hot melt. On the glue 120 and another hot melt glue 122. When steps S161 and S163 are performed, the substrate 110 and the other substrate 112 can be activated and liquefied by the hot melt adhesive 120, 122, and then assembled and combined as shown in FIG. 1F. The two substrate surfaces 110a, 112a are respectively bonded to the heat The colloidal surface 120a of the melted colloid 120 and the other colloidal surface 120b.

另一方面,除了上述之第一較佳實施概念,本案還包括第二較佳實施概念。請參閱圖2A至圖2E,圖2A係為應用本案發明概念之第二較佳實施例中基材、熱熔膠體及限位手段的方塊示意圖。圖2B至圖2C係為本案發明概念中熱熔膠體與基材之結合方法的第二較佳實施流程圖。圖2D至圖2E係為應用圖2C方法中具有熱熔膠體之基材的側視圖。On the other hand, in addition to the above-mentioned first preferred implementation concept, this case also includes a second preferred implementation concept. Please refer to FIG. 2A to FIG. 2E. FIG. 2A is a block diagram of the substrate, the hot melt adhesive and the limiting means in the second preferred embodiment applying the inventive concept of the present invention. 2B to 2C are the second preferred implementation flowcharts of the method of combining hot melt adhesive and substrate in the concept of the present invention. Figures 2D to 2E are side views of the substrate with hot melt adhesive applied in the method of Figure 2C.

如圖2A至圖2C所示,本案之結合方法S21-S24應用於基材210,212、熱熔膠體220、具有微波功能之限位施壓機構230與活化手段240。相同地,基材210係由基材形成機構211所形成或入料;熱熔膠膜220具有極性介質221;具有微波功能之限位施壓機構230包括限位施壓機構231、離型結構體232以及活化手段240。其中,熱熔膠膜220可重複性地因應活化手段240,而被活化產生熱能,離型結構體232設置於限位施壓機構231中,以接觸限位或接觸施壓基材210,212與熱熔膠體220中之至少一者,抑或離型結構體232貼附於熱熔膠體220上。再者,活化手段240可為電磁場處理機構240或微波產生機構240,用以產生無線電波240a、微波240a或電離輻射線240a,從而誘發極性介質121及/或熱熔膠體120,亦即活化手段為微波手段或具有微波功能之機構。其中,上述無線電波之頻率為30kHz至300MHz,微波240a之頻率為300MHz至300GHz,電離輻射線240a之頻率為30PHz至30EHz。而本例使用微波活化後的攝氏溫度範圍介於30ºC至300ºC,或為60ºC至200ºC,或為80ºC至130ºC。而微波處理的功率為100W至60000W,或為500W至30000W,或為1000W至20000W。當然,於實際應用時,微波的應用頻率可為300MHz至300GHz,或為1000MHz至4000MHz,或為1500MHz至3000MHz。如此一來,因應微波處理具有加熱選擇性,而適用於處理熱熔膠膜與耐熱性差的基材之間的接著結合。As shown in FIGS. 2A to 2C, the combining methods S21-S24 of this case are applied to substrates 210, 212, hot melt adhesive 220, limit pressing mechanism 230 with microwave function, and activation means 240. Similarly, the substrate 210 is formed or fed by the substrate forming mechanism 211; the hot melt adhesive film 220 has a polar medium 221; the limit pressing mechanism 230 with microwave function includes a limit pressing mechanism 231 and a release structure Body 232 and activation means 240. Among them, the hot melt adhesive film 220 can be activated to generate heat repeatedly in response to the activation means 240, and the release structure 232 is disposed in the limit pressing mechanism 231 to contact the limit or contact the pressing substrate 210, 212 and the heat At least one of the melt adhesive 220 or the release structure 232 is attached to the hot melt adhesive 220. Furthermore, the activation means 240 can be an electromagnetic field processing mechanism 240 or a microwave generating mechanism 240 for generating radio waves 240a, microwaves 240a, or ionizing radiation 240a, thereby inducing the polar medium 121 and/or the hot melt gel 120, which is the activation means It is a microwave means or an organization with microwave function. Among them, the frequency of the above-mentioned radio wave is 30kHz to 300MHz, the frequency of the microwave 240a is 300MHz to 300GHz, and the frequency of the ionizing radiation 240a is 30PHz to 30EHz. In this case, the temperature range of Celsius after microwave activation is 30ºC to 300ºC, or 60ºC to 200ºC, or 80ºC to 130ºC. The power of microwave processing is 100W to 60000W, or 500W to 30000W, or 1000W to 20000W. Of course, in practical applications, the application frequency of microwaves can be 300MHz to 300GHz, or 1000MHz to 4000MHz, or 1500MHz to 3000MHz. In this way, due to the heating selectivity of microwave processing, it is suitable for processing the adhesive bonding between the hot melt adhesive film and the substrate with poor heat resistance.

接著,請再搭配參閱圖2A至圖2E,以說明熱熔膠體220與基材210,212之結合方法。本案之結合方法S21-S24係為,執行步驟S21:藉由具有微波功能之限位施壓機構230,限位具有極性介質221之熱熔膠體220位於兩基材210,212之間;執行步驟S22:藉由活化手段240,活化極性介質221與熱熔膠體220中之至少一者,以使熱熔膠體220之膠體表面220a及另一膠體表面220b分別接著結合於兩基材210,212之基材表面210a,212a;執行步驟S23:藉由冷卻手段,冷卻貼附於基材210,212之熱熔膠體220,即以氣冷或水冷方式冷卻熱熔膠體220;執行步驟S24:藉由加工手段,去除未結合於基材表面210a,212a之部分熱熔膠體220,相當於去毛邊手段,而完成如圖2D所示之具有熱熔膠體220之基材210,212,也就是說兩基材210,212藉由熱熔膠體220而結合,分別形成兩基材210,212於膠體表面220a與另一膠體表面220b,如同圖2D所示。Next, please refer to FIG. 2A to FIG. 2E to illustrate the bonding method of the hot melt adhesive 220 and the substrates 210 and 212. The combination method S21-S24 of the present case is to perform step S21: using the limit pressing mechanism 230 with microwave function, limit the hot melt adhesive 220 with the polar medium 221 between the two substrates 210, 212; perform step S22: By the activation means 240, at least one of the polar medium 221 and the hot melt glue 220 is activated, so that the glue surface 220a and the other glue surface 220b of the hot melt glue 220 are then respectively bonded to the substrate surfaces 210a of the two substrates 210 and 212 , 212a; Perform step S23: Cool the hot melt adhesive 220 attached to the substrates 210 and 212 by cooling means, that is, cool the hot melt adhesive 220 by air cooling or water cooling; Perform step S24: Remove unbound by processing means The part of the hot melt adhesive 220 on the surface of the substrate 210a, 212a is equivalent to the deburring means, and the substrate 210, 212 with the hot melt adhesive 220 as shown in FIG. 2D is completed, that is, the two substrates 210, 212 are made of hot melt adhesive 220 is combined to form two substrates 210, 212 on the colloid surface 220a and the other colloid surface 220b, respectively, as shown in FIG. 2D.

此外,除了上述結合方法S21-S24之外,本案還可為下列步驟S251-S252,執行步驟S251:藉由活化手段240,形成具有極性介質221之熱熔膠體220於兩基材210,212之間,如前述步驟S21-S24所形成的結果,相當於圖2D所示;以及步驟S252:藉由該活化手段240,再次活化極性介質221及該熱熔膠體220中之至少一者,以使熱熔膠體220液化,而使兩基材210,212分離,即因應活化手段240而使熱熔膠體220被誘發液化,從而分別分離兩基材210,212於膠體表面220a與另一膠體表面220b,如同圖2E所示。In addition, in addition to the above-mentioned bonding methods S21-S24, the present case may also include the following steps S251-S252 to perform step S251: by the activation means 240, a hot melt adhesive 220 with a polar medium 221 is formed between the two substrates 210, 212, The result formed by the foregoing steps S21-S24 is equivalent to that shown in FIG. 2D; and step S252: by the activation means 240, at least one of the polar medium 221 and the hot melt adhesive 220 is activated again to make the hot melt The colloid 220 is liquefied to separate the two substrates 210 and 212, that is, the hot melt colloid 220 is induced to liquefy in response to the activation means 240, thereby separating the two substrates 210, 212 on the colloid surface 220a and the other colloid surface 220b, respectively, as shown in FIG. 2E .

接續將舉製鞋業之各式基材,像是大底(outsole)、緩震中底(midsole)、發泡中底、鞋面(upper)及其他塑料射出成型部件等,說明本案之結合方法。請參閱圖3A至圖3D,係為應用圖1A及圖1B所示之一實施例示意圖。請再搭配圖1A及圖1B,將以此例說明本案發明概念的流程(如圖1B之步驟S11-S15)。Next, various substrates in the footwear industry, such as outsoles, midsoles, foamed midsoles, uppers and other plastic injection molded parts, will be cited to illustrate the combination method of this case. . Please refer to FIGS. 3A to 3D, which are schematic diagrams of an embodiment shown in FIGS. 1A and 1B. Please use FIG. 1A and FIG. 1B to illustrate the process of the inventive concept in this case (steps S11-S15 in FIG. 1B).

如圖3A至圖3D所示,包括基材310、具有極性介質321之熱熔膠體320以及限位手段330,其中熱熔膠體320為熱熔膠模320,限位手段330包括限位施壓裝置331以及離型結構體332,而限位施壓裝置331包括具有收容空間3311a之限位機構3311與具有接觸面3312a之施壓機構3312,其中離型結構體332設置於施壓機構3312的接觸面上,而此例使用的活化手段340包括介質340a以及微波340b。其中,限位機構3311為模具3311,收容空間3311a為模穴3311a,施壓機構3312為可容納介質340的彈性容器3312,而使接觸面3312a因應此特性亦具有彈性,介質340可為氣體340或液體340。As shown in FIGS. 3A to 3D, it includes a substrate 310, a hot melt adhesive 320 with a polar medium 321, and a limiting means 330. The hot melt adhesive 320 is a hot melt adhesive mold 320, and the limiting means 330 includes limiting and pressing The device 331 and the release structure 332, and the limiting pressing device 331 includes a limiting mechanism 3311 with a receiving space 3311a and a pressing mechanism 3312 with a contact surface 3312a, wherein the releasing structure 332 is disposed on the pressing mechanism 3312 On the contact surface, the activation means 340 used in this example includes a medium 340a and a microwave 340b. Among them, the limiting mechanism 3311 is a mold 3311, the accommodating space 3311a is a mold cavity 3311a, and the pressing mechanism 3312 is an elastic container 3312 that can contain the medium 340, so that the contact surface 3312a is also elastic due to this characteristic. The medium 340 can be a gas 340 Or liquid 340.

執行圖1B之步驟S11-S12:置放基材310於模具3311之模穴3311a中,且施壓機構3312位於熱熔膠膜320上,以使熱熔膠膜320接觸基材310,如圖3A所示;執行步驟S13:注入介質340a於施壓機構3312中,如水、油或空氣等;其中,介質340a的攝氏溫度範圍為30ºC至300ºC,或60ºC至200ºC,或80ºC至130ºC,以同時施壓並加熱熱熔膠膜320,如圖3B所示,抑或注入介質340a以施壓熱熔膠膜320,而使其緊密接觸基材310,再由微波手段340b而活化極性介質321,以加熱熱熔膠膜320液化,而使熱熔膠膜320接著於基材310,如圖3C所示;執行步驟S14-S15:藉由冷卻手段,冷卻貼附於基材310之熱熔膠膜320,並去除未結合於基材310之部分熱熔膠體320,而形成具有熱熔膠膜320之基材310,其中以去毛邊方式除去多餘的熱熔膠膜320。Perform steps S11-S12 of FIG. 1B: Place the substrate 310 in the cavity 3311a of the mold 3311, and the pressing mechanism 3312 is located on the hot melt adhesive film 320, so that the hot melt adhesive film 320 contacts the substrate 310, as shown in FIG. As shown in 3A; perform step S13: inject medium 340a into the pressure mechanism 3312, such as water, oil or air, etc.; among them, the temperature range of medium 340a is 30ºC to 300ºC, or 60ºC to 200ºC, or 80ºC to 130ºC, at the same time Pressing and heating the hot melt adhesive film 320, as shown in FIG. 3B, or injecting the medium 340a to press the hot melt adhesive film 320 so that it closely contacts the substrate 310, and then the polar medium 321 is activated by the microwave means 340b to The hot melt adhesive film 320 is heated to liquefy, so that the hot melt adhesive film 320 is attached to the substrate 310, as shown in FIG. 3C; Steps S14-S15 are performed: cooling the hot melt adhesive film attached to the substrate 310 by cooling means 320, and remove part of the hot melt adhesive 320 that is not bonded to the substrate 310 to form a substrate 310 with a hot melt adhesive film 320, in which the excess hot melt adhesive film 320 is removed by deburring.

要特別說明的是,此例可以彈性容器3312施壓並注入介質340a而活化熱熔膠膜320,亦可為藉由彈性容器3312中之介質340a施壓而限位熱熔膠膜320於基材210上,再以無線電波340b、微波340b或電離輻射線340b,活化誘發以使熱熔膠膜320被加熱液化而接著結合基材310,其中用以施壓之介質340a攝氏溫度為80ºC以下。It should be noted that in this example, the elastic container 3312 can be pressed and the medium 340a can be injected to activate the hot melt adhesive film 320, or the medium 340a in the elastic container 3312 can be pressed to limit the hot melt adhesive film 320 on the base. On the material 210, radio waves 340b, microwaves 340b or ionizing radiation 340b are activated to induce the hot melt adhesive film 320 to be heated and liquefied and then bonded to the substrate 310. The temperature of the medium 340a used for pressure is below 80ºC. .

倘若基材係以塑料射出成型,本案還可應用其他結合方式完成具有熱熔膠體之基材。請參閱圖4A至圖4C,分別係為應用圖1A及圖1B所示部分發明概念的另一實施例示意圖,將以此例說明塑料射出成型的結合方法及其限位施壓機構。此例包括基材形成機構411、具有極性介質421之熱熔膠膜420、限位施壓機構431及離型結構體432,限位施壓機構431包括具有收容空間4311a之限位機構4311,以及具有接觸面4312a之施壓機構4312。其中,基材形成設備411可包括基材製作設備411、基材塑模成型設備411或基材射出成型設備411。If the substrate is plastic injection molding, other bonding methods can also be used in this case to complete the substrate with hot melt adhesive. Please refer to FIGS. 4A to 4C, which are respectively schematic diagrams of another embodiment applying some of the inventive concepts shown in FIGS. 1A and 1B. This example illustrates the combination method of plastic injection molding and its limiting and pressing mechanism. This example includes a substrate forming mechanism 411, a hot melt adhesive film 420 with a polar medium 421, a limiting pressing mechanism 431, and a release structure 432. The limiting pressing mechanism 431 includes a limiting mechanism 4311 with a receiving space 4311a, And a pressing mechanism 4312 having a contact surface 4312a. Among them, the substrate forming equipment 411 may include a substrate manufacturing equipment 411, a substrate molding equipment 411, or a substrate injection molding equipment 411.

詳細來說,如圖4A至圖4C所示,執行步驟S31:收容該具有極性介質421之熱熔膠膜420及該基材410中之一者420/410於該收容空間4311a中,此例係將熱熔膠膜420置放於收容空間4311a中;執行步驟S32:藉由該接觸面4312a,限位或施壓該者420/410於該收容空間4311a內,此例之接觸面4312a係連通施壓機構4312,施壓機構4312相當於提供負壓之氣壓運作設備(抽吸真空設備),以抽真空方式施壓並限位熱熔膠膜420;執行步驟S33:活化該具有極性介質421之熱熔膠膜420及該基材410中之另一者420/410,而使該熱熔膠膜420接著結合該基材410,此例為基材射出成型設備411射出基材410,並使其接觸於熱熔膠膜420,且因應射出成型時的溫度而使熱熔膠膜420液化接著該基材410;執行步驟S34:藉由冷卻手段,冷卻貼附於該基材410之該熱熔膠膜420。In detail, as shown in FIGS. 4A to 4C, step S31 is performed: one of the hot melt adhesive film 420 with the polar medium 421 and the substrate 410 420/410 is accommodated in the accommodation space 4311a, in this example The hot melt adhesive film 420 is placed in the receiving space 4311a; step S32 is performed: the contact surface 4312a is used to limit or press the one 420/410 in the receiving space 4311a. In this example, the contact surface 4312a is Connected to the pressure applying mechanism 4312, the pressure applying mechanism 4312 is equivalent to the air pressure operating equipment (suction vacuum equipment) that provides negative pressure, and presses and limits the hot melt adhesive film 420 in a vacuum manner; execute step S33: activate the polar medium 421 hot melt adhesive film 420 and the other one of the substrate 410, 420/410, so that the hot melt adhesive film 420 is then combined with the substrate 410. In this example, the substrate injection molding equipment 411 injects the substrate 410. And make it contact the hot melt adhesive film 420, and the hot melt adhesive film 420 is liquefied to adhere to the substrate 410 according to the temperature during injection molding; step S34 is performed: cooling the substrate 410 attached to the substrate 410 by cooling means The hot melt adhesive film 420.

當然,此例亦可將基材形成設備411與熱熔膠膜形成機構(圖未示出)置換,調整為應用熱熔膠膜420形成於基材410上,也就是說將基材410限位並施壓於收容空間4311a中,再活化熱熔膠膜430呈液化狀態,相當於受熱之熱熔膠液,而接著結合基材410上,當熱熔膠液經冷卻後,回到正常室溫時,則形成熱熔膠膜420於基材410之基材表面。再者,施壓機構4312可為施壓物件或提供正壓或負壓之氣壓/液壓運作設備,其中施壓物件為機構治具或另一基材;抑或,氣壓/液壓運作設備為灌氣加壓設備、抽吸真空設備或液態加壓設備等。Of course, in this example, the substrate forming device 411 can also be replaced with a hot melt adhesive film forming mechanism (not shown), and adjusted to apply the hot melt adhesive film 420 to be formed on the substrate 410, that is, the substrate 410 is limited Position and press in the containment space 4311a, the reactivated hot melt adhesive film 430 is in a liquefied state, which is equivalent to the heated hot melt adhesive, and then bonded to the substrate 410. When the hot melt adhesive is cooled, it returns to normal At room temperature, a hot melt adhesive film 420 is formed on the substrate surface of the substrate 410. Furthermore, the pressure applying mechanism 4312 can be a pressure object or a pneumatic/hydraulic operating device that provides positive or negative pressure, where the pressure applied object is a mechanism fixture or another substrate; or, the pneumatic/hydraulic operating device is gas filling Pressurizing equipment, suction vacuum equipment or liquid pressurizing equipment, etc.

除上述結合方法之外,接續將再以製鞋業說明第二較佳實施概念的運作方式。首先說明,製鞋業之鞋材至少包括鞋底(如大底、中底)、其他部件(塑料射出成型組件)以及鞋面(編織鞋面等)。In addition to the above-mentioned combination method, the operation mode of the second preferred implementation concept will be explained in the footwear industry. First of all, the shoe materials in the shoe industry include at least soles (such as outsoles, midsoles), other components (plastic injection molding components), and uppers (woven uppers, etc.).

詳細來說,第一較佳實施概念可應用於大底廠、中底廠以及射出鞋材廠。應用於大底廠的鞋材為止滑大底、耐磨大底、抗化學腐蝕大底以及中底廠,而應用於中底廠的鞋材可為發泡中底、緩震中底、回彈中底等等各式中底。抑或,應用於射出鞋材廠的鞋材部件,例如:鐵心、射出片、碳纖維片等。而鞋面部分主要係以電腦針車或飛織法製成鞋面後,再於鞋廠組裝結合上述鞋材以完成鞋體。其中,像是女鞋、休閒鞋、靴子或具有硫化邊條的帆布鞋等,可因應其材質如美耐皿(Melamine)、生橡膠,或其外觀形狀而對應調整結構設計。In detail, the first preferred implementation concept can be applied to outsole factories, midsole factories, and injection shoe material factories. The shoe material used in the outsole factory is non-slip outsole, wear-resistant outsole, chemical-resistant outsole and midsole factory, and the shoe material used in the midsole factory can be foamed midsole, cushioning midsole, rebound Midsole and so on all kinds of midsole. Or, it is applied to shoe material parts in injection shoe material factories, such as iron cores, injection sheets, carbon fiber sheets, etc. The upper part is mainly made by computer stitching or flying knitting method, and then assembled and combined with the above-mentioned shoe materials in the shoe factory to complete the shoe body. Among them, such as women's shoes, casual shoes, boots or canvas shoes with vulcanized side strips, etc., the structural design can be adjusted according to the material such as Melamine, raw rubber, or its appearance.

而應用於組裝結合上述鞋材之限位施壓機構包括收容空間以及接觸面,限位施壓機構可為袋體(真空袋),收容空間為袋體收容空間,接觸面為袋體內側面;抑或限位施壓機構可為具有頂蓋與底蓋之盒體,該收容空間為盒體收容空間,接觸面為盒體內側面,且皆可設置離型結構體於接觸面上。The position-limiting and pressing mechanism used in assembling and combining the above-mentioned shoe materials includes a containing space and a contact surface. The position-limiting and pressing mechanism may be a bag (vacuum bag), the containing space is the bag containing space, and the contact surface is the inner side of the bag; Or the limiting and pressing mechanism can be a box with a top cover and a bottom cover, the containing space is the box containing space, the contact surface is the inner side of the box, and a release structure can be provided on the contact surface.

請參閱圖5A至圖5C,係為應用圖2A及圖2B所示部分發明概念的一實施例示意圖。組裝為鞋體之鞋材510至少包括鞋面511、中底512及大底513,且中底512及大底513皆形成具有極性介質521之熱熔膠膜520,而鞋面511套設於楦頭550上。其中,中底512及大底513分別包括相對應之限位結構512a,512b,513a,513b,藉由限位結構512a,512b,513a,513b而使大底513接觸並限位於中底512中,以使兩者得以相互卡合或卡扣。當然,限位結構512a,512b,513a,513b可為公/母結構或凹/凸結構,像是凸點與凹孔,或卡榫與凹槽等設計,用以限位鞋材510間的相對位置。如此一來,即便應用機械手臂移動或翻轉鞋材510,仍能使其不掉落或分離於彼此。Please refer to FIGS. 5A to 5C, which are schematic diagrams of an embodiment applying some of the inventive concepts shown in FIGS. 2A and 2B. The shoe material 510 assembled into a shoe body includes at least an upper 511, a midsole 512, and an outsole 513, and the midsole 512 and the outsole 513 both form a hot melt adhesive film 520 with a polar medium 521, and the upper 511 is sleeved on Last 550 on. Among them, the midsole 512 and the outsole 513 respectively include corresponding limit structures 512a, 512b, 513a, and 513b. The outsole 513 is in contact with and confined in the midsole 512 by the limit structures 512a, 512b, 513a, and 513b. , So that the two can be locked or snapped with each other. Of course, the limiting structure 512a, 512b, 513a, 513b can be a male/female structure or a concave/convex structure, such as a convex point and a concave hole, or a tenon and a groove, to limit the gap between the shoe materials 510 relative position. In this way, even if the shoe material 510 is moved or turned by the robotic arm, it can still prevent it from falling or being separated from each other.

接著,如圖5C所示,應用具有真空手段531之真空袋530,將鞋材510組裝後,置入於真空袋530中,並以真空手段531限位施壓而使鞋材510緊密接觸。之後,再以微波手段540活化誘發極性介質521,而使熱熔膠膜520被加熱液化,從而使鞋材510接著結合而形成鞋體。其中,真空袋530的材質可為AB膠、塑料、矽膠或其他軟質不沾膠材料,以避免熱熔膠膜520沾黏於其上。Next, as shown in FIG. 5C, a vacuum bag 530 with a vacuum means 531 is used, after assembling the shoe material 510, it is placed in the vacuum bag 530, and the vacuum means 531 is used to limit the pressure to bring the shoe material 510 into close contact. After that, the polar medium 521 is activated by microwave means 540, so that the hot melt adhesive film 520 is heated and liquefied, so that the shoe material 510 is then combined to form a shoe body. Among them, the material of the vacuum bag 530 can be AB glue, plastic, silicon glue or other soft non-sticky materials to prevent the hot melt adhesive film 520 from sticking to it.

此外,請參閱圖6A至圖6C,係為應用圖2C所示部分發明概念的另一實施例示意圖。將以此例說明鞋材組裝結合後,再次以活化手段拆解分離的運作方式。其中,組裝為鞋體之鞋材610相同地包括鞋面611、中底612及大底613,且鞋材610皆形成具有極性介質621之熱熔膠膜620於其上,而鞋面611套設於楦頭上。In addition, please refer to FIGS. 6A to 6C, which are schematic diagrams of another embodiment applying part of the inventive concept shown in FIG. 2C. This example illustrates how the shoe materials are assembled and combined and then disassembled and separated again by activation means. Wherein, the shoe material 610 assembled into the shoe body includes the upper 611, the midsole 612 and the outsole 613, and the shoe material 610 is formed with a hot melt adhesive film 620 with a polar medium 621 on it, and the shoe upper 611 sets Set on the last.

接著,如圖6A所示,組裝鞋材610並將其置入於盒體630中,盒體630包括具有離型結構體632a,632b的頂蓋631a以及底蓋631b,且頂蓋631a與底蓋631b藉由注入介質631a,631b而使離型結構體632a,632b彈性地抵頂於鞋材610,從而使鞋材610緊密地接觸彼此,亦即離型結構體632a,632b設置於頂蓋631a及底蓋631b與鞋材610接觸的接觸面上。其中,介質631a,631b可為液體或氣體。之後,再將盒體630以微波手段640活化誘發熱熔膠膜620中之極性介質621,而使鞋材610因應熱熔膠膜620被加熱液化而形成鞋體。之後,請再搭配圖6B及圖6C,具有微波功能之限位施壓機構650包括收容空間651、離型結構體652以及電磁場處理模組653,離型結構體652設於收容空間651收容並接觸鞋體的接觸面,微波手段640包含利用電磁場處理模組653,用以產生無線電波、微波或電離輻射線。如此一來,將上述鞋體置入具有微波功能之限位施壓機構650中,且藉由微波手段640而使鞋體中具有極性介質621之熱熔膠膜加熱液化,進而使鞋材610之鞋面611、中底612及大底613被拆解分離。Next, as shown in FIG. 6A, the shoe material 610 is assembled and placed in a box body 630. The box body 630 includes a top cover 631a and a bottom cover 631b with release structures 632a, 632b, and the top cover 631a and the bottom The cover 631b makes the release structure 632a, 632b elastically abut the shoe material 610 by injecting the medium 631a, 631b, so that the shoe material 610 is in close contact with each other, that is, the release structure 632a, 632b is disposed on the top cover 631a and the bottom cover 631b are in contact with the contact surface of the shoe material 610. Among them, the medium 631a, 631b can be liquid or gas. After that, the box body 630 is activated by microwave means 640 to induce the polar medium 621 in the hot melt adhesive film 620, so that the shoe material 610 is heated and liquefied in response to the hot melt adhesive film 620 to form a shoe body. Afterwards, please use Figure 6B and Figure 6C. The microwave-enabled limit pressing mechanism 650 includes a containment space 651, a release structure 652 and an electromagnetic field processing module 653. The release structure 652 is set in the containment space 651 to accommodate and accommodate In contact with the contact surface of the shoe body, the microwave means 640 includes an electromagnetic field processing module 653 for generating radio waves, microwaves or ionizing radiation. In this way, the above-mentioned shoe body is placed in the limit pressing mechanism 650 with microwave function, and the hot melt adhesive film with the polar medium 621 in the shoe body is heated and liquefied by the microwave means 640, thereby making the shoe material 610 The shoe upper 611, midsole 612 and outsole 613 are disassembled and separated.

當然,上述之限位施壓機構可為具有組裝限位活化手段的單一機構或為連續式(或稱為流水線式)機構,像是本例中之限位施壓機構即屬於具有限位施壓手段及/或微波手段的單一機構;而施壓的手段可為真空加壓(負壓)或袋體施壓(正壓)等方式,用以依據基材(鞋材)的形狀而施壓限位熱熔膠體(熱熔膠膜)於其上,亦即可對應基材的立體形狀而使熱熔膠體服貼於其上,再以微波手段而使兩者熔融接著。此外,於其他實施例中,限位施壓機構還可增設感溫偵測手段,用以判斷熱熔膠體的升溫狀態,以提升基材間接著的品質,不應以上述實施例為限。Of course, the above-mentioned limit pressing mechanism can be a single mechanism with assembly limit activation means or a continuous type (or called assembly line) mechanism. For example, the limit pressing mechanism in this example belongs to the limit applying mechanism. A single mechanism of pressure means and/or microwave means; and the means of pressure can be vacuum pressure (negative pressure) or bag body pressure (positive pressure), etc., to apply according to the shape of the substrate (shoe material) Press the limit hot melt adhesive (hot melt adhesive film) on it, which can correspond to the three-dimensional shape of the substrate to make the hot melt adhesive adhere to it, and then melt the two by microwave means. In addition, in other embodiments, the limit pressing mechanism can also be equipped with a temperature-sensing detection means to determine the heating state of the hot melt adhesive to improve the quality of the substrate, which should not be limited to the above-mentioned embodiments.

再者,除了上述的製鞋業應用領域之外,本案之熱熔膠體還可應用於成衣業、玩具、建材或具有特殊需求之各專業領域中,例如:登山器材、醫療器材等。舉例來說,熱熔膠體可部份結合於玩具或建材上,而使其得以與另一基材進行接著。Furthermore, in addition to the above-mentioned application fields in the shoe industry, the hot melt adhesive of this case can also be used in the garment industry, toys, building materials or various professional fields with special needs, such as mountaineering equipment, medical equipment, etc. For example, the hot melt adhesive can be partially bonded to toys or building materials so that it can be bonded to another substrate.

綜上所述,本案之主要技術特徵為,熱熔膠體可因應活化手段,如電磁場處理手段(無線電波、微波、電離輻射線)或介質處理手段,而被重複地液化接著於複數基材(如鞋材、玩具、建材)。同理地,亦可藉由活化手段而拆解分離複數基材。也就是說,複數基材可重複地藉由活化手段而被液化接著或液化分離於彼此,只要當熱熔膠體的溫度經由活化誘發而達到熔點溫度時,即可有此功效。In summary, the main technical feature of this case is that the hot-melt gel can be repeatedly liquefied and then deposited on a plurality of substrates in response to activation means, such as electromagnetic field treatment means (radio waves, microwaves, ionizing radiation) or medium treatment means ( Such as shoe materials, toys, building materials). Similarly, multiple substrates can also be disassembled and separated by activation means. In other words, multiple substrates can be liquefied and then liquefied or separated from each other repeatedly by activation means, as long as the temperature of the hot melt gel reaches the melting point temperature induced by activation, this effect can be achieved.

如此一來,具有極性介質之熱熔膠體可組裝接著於不同複合基材之外,還可解決當前必要的環保議題,即綠色和平組織Green peace近年來不斷地推動減塑的政策,像是注重後續廢棄物的處理,以及如何回收循環再利用。因此,若能應用本案之熱熔膠膜於任一產業產品中,並藉由活化手段而能使任一產業產品得以回收分類或再利用,必定能大幅地減少環境的負擔,且亦可同時因應產品的綠色循環性,而大幅地提升品牌的形象與價值。In this way, hot melt adhesives with polar media can be assembled and then attached to different composite substrates, and can also solve the current necessary environmental protection issues. That is, Green peace has continuously promoted the policy of plastic reduction in recent years, such as focusing on Subsequent waste disposal, and how to recycle it. Therefore, if the hot melt adhesive film of this case can be applied to any industrial product, and any industrial product can be recycled, sorted or reused by means of activation, it will definitely reduce the burden on the environment, and at the same time In response to the green circularity of the product, the image and value of the brand have been greatly enhanced.

以上所述僅為本發明之較佳實施例,並非用以限定本發明之申請專利範圍,因此凡其它未脫離本發明所揭示之精神下所完成之等效改變或修飾,均應包含於本案之申請專利範圍內。The above descriptions are only the preferred embodiments of the present invention and are not intended to limit the scope of the patent application of the present invention. Therefore, all other equivalent changes or modifications made without departing from the spirit of the present invention should be included in this case. Within the scope of the patent application.

110,112:基材 110a,110b,112a:基材表面 111:基材形成機構 120,122:熱熔膠體 120a,120b,122a:膠體表面 121:極性介質 130:限位手段 131:限位施壓機構 1311:限位機構 1312:施壓機構 132:離型結構體 140:活化手段,電磁場處理手段,介質處理手段 140a:無線電波,微波,電離輻射線,液體,氣體 210,212:基材 211:基材形成機構 220:熱熔膠體 221:極性介質 230:具有微波功能之限位施壓機構 231:限位施壓機構 232:離型結構體 240:活化手段,電磁場處理機構,微波產生機構 240a:無線電波,微波,電離輻射線 310:基材 320:熱熔膠體 321:極性介質 330:限位手段 331:限位施壓機構 3311:限位機構 3311a:收容空間 3312:施壓機構 3312a:接觸面 332:離型結構體 340a:介質,液體,氣體 340b:無線電波,微波,電離輻射線 410:基材 411:基材形成機構 420:熱熔膠體 421:極性介質 431:限位施壓機構 4311:限位機構 4311a:收容空間 4312:施壓機構 4312a:接觸面 432:離型結構體 510:鞋材 511:鞋面 512:中底 512a,512b:限位結構 513:大底 513a,513b:限位結構 520:熱熔膠膜 521:極性介質 530:真空袋 531:真空手段 540:微波手段 550:楦頭 610:鞋材 611:鞋面 612:中底 613:大底 620:熱熔膠膜 621:極性介質 630:盒體 631a,631b:真空手段 632a,632b 633a,633b 640:無線電波,微波,電離輻射線 650:具有微波功能之限位施壓機構 651:收容空間 652:離型結構體 653:電磁場處理模組 11-S15,S161-S163,S21-S24,S251-S252,S31-S33:流程步驟110,112: Substrate 110a, 110b, 112a: substrate surface 111: Substrate forming mechanism 120, 122: hot melt glue 120a, 120b, 122a: colloidal surface 121: Polar medium 130: limit means 131: Limit pressure mechanism 1311: limit mechanism 1312: pressure mechanism 132: Release structure 140: Activation means, electromagnetic field treatment means, medium treatment means 140a: radio waves, microwaves, ionizing radiation, liquids, gases 210,212: Substrate 211: Substrate forming mechanism 220: hot melt glue 221: Polar medium 230: Limit pressure mechanism with microwave function 231: Limit pressure mechanism 232: Release structure 240: Activation means, electromagnetic field processing mechanism, microwave generating mechanism 240a: radio waves, microwaves, ionizing radiation 310: Substrate 320: hot melt glue 321: Polar medium 330: Limiting Means 331: Limit pressure mechanism 3311: limit mechanism 3311a: containment space 3312: pressure mechanism 3312a: contact surface 332: Release structure 340a: medium, liquid, gas 340b: radio waves, microwaves, ionizing radiation 410: Substrate 411: Substrate Forming Mechanism 420: hot melt glue 421: Polar medium 431: Limit Pressure Mechanism 4311: limit mechanism 4311a: containment space 4312: Pressure Mechanism 4312a: contact surface 432: Release structure 510: shoe material 511: upper 512: Midsole 512a, 512b: limit structure 513: outsole 513a, 513b: limit structure 520: hot melt adhesive film 521: Polar medium 530: vacuum bag 531: vacuum 540: Microwave Means 550: Last 610: shoe material 611: Vamp 612: midsole 613: outsole 620: hot melt adhesive film 621: Polar medium 630: Box 631a, 631b: vacuum means 632a,632b 633a,633b 640: radio waves, microwaves, ionizing radiation 650: Limit pressure mechanism with microwave function 651: Containment Space 652: release structure 653: Electromagnetic Field Processing Module 11-S15, S161-S163, S21-S24, S251-S252, S31-S33: Process steps

圖1A至圖1F:係為本案發明概念中具有熱熔膠體之基材及其結合方法的第一較佳實施概念示意圖。 圖2A至圖2E:係為本案發明概念中具有熱熔膠體之基材及其結合方法的第二較佳實施概念示意圖。 圖3A至圖3D:係為應用圖1A及圖1B所示部分發明概念的一實施例示意圖。 圖4A至圖4C:係為應用圖1A及圖1B所示部分發明概念的另一實施例示意圖。 圖5A至圖5C:係為應用圖2A及圖2B所示部分發明概念的一實施例示意圖。 圖6A至圖6C:係為應用圖2C所示部分發明概念的另一實施例示意圖。Figures 1A to 1F are schematic diagrams of the first preferred implementation concept of the substrate with hot melt adhesive and its bonding method in the concept of the present invention. 2A to 2E are schematic diagrams of the second preferred implementation concept of the substrate with hot melt adhesive and its bonding method in the concept of the present invention. Figures 3A to 3D are schematic diagrams of an embodiment applying part of the inventive concept shown in Figures 1A and 1B. 4A to 4C are schematic diagrams of another embodiment applying part of the inventive concept shown in FIG. 1A and FIG. 1B. 5A to 5C are schematic diagrams of an embodiment applying part of the inventive concept shown in FIG. 2A and FIG. 2B. 6A to 6C are schematic diagrams of another embodiment applying part of the inventive concept shown in FIG. 2C.

S11-S15:流程步驟 S11-S15: Process steps

Claims (12)

一種熱熔膠體與基材之結合方法,應用於一具有極性介質之熱熔膠體以及兩基材;其中,該熱熔膠體包括0.001至100重量份之該極性介質,該極性介質係為一極性化合物、一陶瓷粉末、一碳及其化合物、一極性聚合物或一金屬及其氧化物,該方法至少包括下列步驟: (A):藉由一限位手段,限位該熱熔膠體位於該兩基材之間;以及 (B):藉由一活化手段,活化該極性介質,以使該熱熔膠體之一膠體表面及另一膠體表面分別接著結合於該兩基材之一基材表面。A method for combining a hot melt adhesive with a substrate, which is applied to a hot melt adhesive with a polar medium and two substrates; wherein the hot melt adhesive includes 0.001 to 100 parts by weight of the polar medium, and the polar medium is a polar medium Compound, a ceramic powder, a carbon and its compound, a polar polymer or a metal and its oxide, the method includes at least the following steps: (A): By a limiting means, the hot melt adhesive is limited between the two substrates; and (B): The polar medium is activated by an activation means, so that one colloidal surface and the other colloidal surface of the hot melt adhesive are respectively bonded to the surface of one of the two substrates. 如請求項1所述之方法,該步驟(B)中之該活化手段係為一電磁場處理手段或一介質處理手段,更包括: 步驟(B1):活化該至少一者,以加熱液化該熱熔膠體。According to the method described in claim 1, the activation means in step (B) is an electromagnetic field treatment means or a medium treatment means, and further includes: Step (B1): activating the at least one to heat and liquefy the hot melt colloid. 如請求項2所述之方法,該電磁場處理手段產生一無線電波、一微波或一電離輻射線;其中,該無線電波之頻率範圍係介於30kHz至300MHz之間,而該微波之頻率範圍係介於300MHz至300GHz之間。According to the method of claim 2, the electromagnetic field processing means generates a radio wave, a microwave or an ionizing radiation; wherein the frequency range of the radio wave is between 30kHz and 300MHz, and the frequency range of the microwave is Between 300MHz and 300GHz. 如請求項2所述之方法,該活化手段為該電磁場處理手段時,該電磁場處理手段為一微波產生機構;其中,於該微波產生機構與該熱熔膠體接觸之處,設置一離型結構體。According to the method of claim 2, when the activation means is the electromagnetic field treatment means, the electromagnetic field treatment means is a microwave generating mechanism; wherein a release structure is provided where the microwave generating mechanism contacts the hot melt adhesive body. 如請求項4中之方法,其中,該微波產生機構結合該限位手段,而組成一具有微波功能之限位施壓機構。Such as the method in claim 4, wherein the microwave generating mechanism combines with the limiting means to form a limiting and pressing mechanism with microwave function. 如請求項2所述之方法,該介質處理手段係以一氣體或一液體進行加熱活化;其中,該氣體或該液體之加熱攝氏溫度係介於60度至300度。According to the method of claim 2, the medium processing means is heated and activated with a gas or a liquid; wherein the heating temperature of the gas or the liquid is between 60 degrees and 300 degrees. 如請求項1所述之方法,更包括: 步驟(C):藉由一冷卻手段,冷卻貼附於該基材之該熱熔膠體;其中,該冷卻手段為一氣體冷卻方式及/或一液體冷卻方式。The method described in claim 1, further including: Step (C): cooling the hot melt adhesive attached to the substrate by a cooling means; wherein the cooling means is a gas cooling method and/or a liquid cooling method. 如請求項1所述之方法,更包括: 步驟(E):藉由一加工手段,去除未結合於該基材表面之部分該熱熔膠體。The method described in claim 1, further including: Step (E): using a processing method to remove the part of the hot melt adhesive that is not bonded to the surface of the substrate. 如請求項1所述之方法,其中,該基材係為一中叉、一配件、一中底(midsole)、一大底(outsole)、一鞋面(upper)或其他應用領域之一塑料材質及一軟質材料中之一者或及其組合。The method according to claim 1, wherein the substrate is a middle fork, an accessory, a midsole, an outsole, an upper, or a plastic in other application fields One of a material and a soft material or a combination thereof. 如請求項1所述之方法,該熱熔膠體為一熱塑性材質;其中,該熱塑性材質為一聚氨酯(PU、TPU)、一反應型聚氨酯(PUR)、一乙烯-醋酸乙烯共聚物(EVA)、一聚酰胺(PA)及一熱塑性丁苯橡膠(TPR)中之一者或其中之共聚物或混合物。According to the method of claim 1, the hot melt adhesive is a thermoplastic material; wherein, the thermoplastic material is a polyurethane (PU, TPU), a reactive polyurethane (PUR), or an ethylene-vinyl acetate copolymer (EVA) , One of a polyamide (PA) and a thermoplastic styrene butadiene rubber (TPR) or a copolymer or mixture thereof. 如請求項1所述之方法,其中,該熱熔膠體係為一熱熔膠液、一熱熔膠粉末、一熱熔膠粒子、一熱熔膠片、一熱熔膠膜與一熱熔膠塊中之至少一者或及其組合。The method according to claim 1, wherein the hot-melt adhesive system is a hot-melt adhesive liquid, a hot-melt adhesive powder, a hot-melt adhesive particle, a hot-melt film, a hot-melt adhesive film, and a hot-melt adhesive At least one of the blocks or a combination thereof. 如請求項1所述之方法,其中,更包括: 步驟(D):藉由該活化手段,再次活化該極性介質及該熱熔膠體中之至少一者,以使熱熔膠體液化,而使該兩基材分離。The method according to claim 1, which further includes: Step (D): by the activation means, at least one of the polar medium and the hot melt gel is activated again to liquefy the hot melt gel and separate the two substrates.
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