TW202112979A - Highly durable dye-based polarizing plate comprising near-infrared absorbing dye - Google Patents

Highly durable dye-based polarizing plate comprising near-infrared absorbing dye Download PDF

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TW202112979A
TW202112979A TW109122608A TW109122608A TW202112979A TW 202112979 A TW202112979 A TW 202112979A TW 109122608 A TW109122608 A TW 109122608A TW 109122608 A TW109122608 A TW 109122608A TW 202112979 A TW202112979 A TW 202112979A
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polarizing plate
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plate according
substrate
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TW109122608A
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望月典明
森田陵太郎
服部由侑
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日商日本化藥股份有限公司
日商寶來技術有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/16Layered products comprising a layer of synthetic resin specially treated, e.g. irradiated
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/023Optical properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/027Thermal properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Thermal Sciences (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polarising Elements (AREA)

Abstract

A polarizing plate of this invention contains a hydrophilic polymer film containing a near-infrared absorbing dye, and a substrate provided on one or both sides of the film, wherein the substrate has at least one characteristicof the following a) and b):
a) When the hydrophilic polymer film contains a boron compound, after exposing the polarizing plate to an environment of 90% RH and 80℃ for 1000 hours, the mass (boric acid equivalent value) of the boron compound contained in the hydrophilic polymer film is maintained at 20 or more if the value before the exposure is set as 100.
b) The moisture permeability of the substrate based on JIS Z 0208 moisture permeability test in an environment of 90% RH relative humidity and 40℃ is 0 to 1500 g/m2 in 24 hours.

Description

含有近紅外線吸收染料之高耐久性染料系偏光板 High-durability dye-based polarizing plate containing near-infrared absorbing dye

本發明係關於一種偏光板,該偏光板係在包含近紅外線吸收染料之染料系偏光板中,在高溫高濕環境下具有高的耐久性,尤其,在高溫高濕環境下即使曝露於強的光線亦具有高的耐久性。 The present invention relates to a polarizing plate. The polarizing plate is a dye-based polarizing plate containing a near-infrared absorbing dye and has high durability in a high temperature and high humidity environment, especially, even if exposed to a strong high temperature and humidity environment. Light also has high durability.

具有光之穿透/遮蔽功能的偏光板係使用於具有光之開關功能的液晶以及液晶顯示器(LCD)等之顯示裝置。該LCD之應用領域係從市售初期之電子計算機、手錶等之小型機器正逐漸擴展至筆記型電腦、文書處理機、液晶投影機、液晶電視、汽車導航系統、及屋內外之資訊顯示裝置、測量工具等。又,偏光板係亦可應用於具有偏光功能之透鏡,正成為應用在視認性提升之太陽眼鏡,或在近年係對應於3D電視等之偏光眼鏡等。又,偏光板係不僅被利用於顯示用途,亦被利用於所謂真偽判定用裝置中之精度提升、或CCD及CMOS等之影像感測器中的反射光截斷所產生的訊號/雜訊比(S/N比)之提升的目的。 Polarizing plates with light penetration/shielding function are used in display devices such as liquid crystals and liquid crystal displays (LCD) with light switching functions. The application field of the LCD is gradually expanding from small machines such as electronic computers and watches on the market to notebook computers, word processors, liquid crystal projectors, liquid crystal TVs, car navigation systems, and information display devices inside and outside the house. Measuring tools, etc. In addition, polarizing plates can also be applied to lenses with polarizing functions, and are becoming used in sunglasses for improved visibility, or polarized glasses corresponding to 3D TVs in recent years. In addition, the polarizing plate is used not only for display purposes, but also for improving the accuracy of so-called authenticity judging devices, or the signal/noise ratio generated by the interception of reflected light in image sensors such as CCD and CMOS. (S/N ratio) The purpose of the improvement.

一般的偏光板係在藉由經延伸定向之聚乙烯醇或其衍生物之膜、或聚氯乙烯膜之去鹽酸或聚乙烯醇系膜之脫水而生成聚烯並使其定向而成之聚 烯系之膜等基材,含有碘或二色性染料來製造。此等之中,碘系偏光元件雖然偏光性能優異,但對水及熱之耐用性低,在高溫、高濕之狀態長時間使用時,在其耐久性上有問題。另一方面,相較於碘系偏光元件,使用二色性染料之染料系偏光元件雖然耐濕性及耐熱性優異,但一般偏光性能不充分。 General polarizers are formed by forming polyolefins by stretching and oriented polyvinyl alcohol or its derivatives, or by removing hydrochloric acid from polyvinyl chloride films or dehydrating polyvinyl alcohol-based films, and orienting them to form polyolefins. Base materials such as olefin-based films contain iodine or dichroic dyes. Among these, although the iodine-based polarizing element has excellent polarization performance, it has low durability against water and heat, and has a problem in its durability when it is used for a long time in a high temperature and high humidity state. On the other hand, compared to iodine-based polarizers, dye-based polarizers using dichroic dyes have excellent moisture resistance and heat resistance, but generally have insufficient polarization performance.

在近年,用以辨識使用於觸控面板等之動作的光源、防犯照相機、感測器、防偽裝置、通訊機器等之用途中,不僅要求在可見光區域使用之偏光板,亦要求在紅外線區域使用之偏光板。對於如此之期望,在專利文獻1係已報告一種使碘系偏光板聚烯化而成之紅外線偏光板,在專利文獻2及3係已報告一種應用金屬線柵(wire grid)之紅外線偏光板。又,在專利文獻4係已報告一種含有微粒子之玻璃經延伸而成之紅外線偏光片,在專利文獻5及6已報告一種使用膽固醇液晶之紅外線偏光板。 In recent years, the use of light sources, anti-falsification cameras, sensors, anti-counterfeiting devices, communication equipment, etc. used to identify the actions of touch panels, etc. requires not only the use of polarizers in the visible light region, but also the use in the infrared region. The polarizing plate. In response to this expectation, Patent Document 1 has reported an infrared polarizing plate made by polyalkyleneizing an iodine-based polarizer, and Patent Documents 2 and 3 have reported an infrared polarizing plate using a wire grid. . In addition, Patent Document 4 has reported an infrared polarizer formed by stretching glass containing fine particles, and Patent Documents 5 and 6 have reported an infrared polarizer using cholesteric liquid crystal.

惟,專利文獻1之紅外線偏光板係耐久性低,尤其耐熱性、濕熱耐久性、及耐光性低,尚未達實用化。專利文獻2及3之金屬線柵型之紅外線偏光板係可加工成膜狀,同時因耐熱性高而正在普及化。然而,該紅外線偏光板若在表面無奈米級之凹凸,則不能維持光學特性,故不能接觸表面,在表面不能有異物或水之微滴,因而用途受到限制。又,該紅外線偏光板係難以進行抗反射或防眩(Anitglare)加工。記載於專利文獻4之紅外線偏光板係具有高的耐久性,且具有高的二色性,故已達實用化。然而,因係屬於一邊包含微粒子一邊被延伸之玻璃,故容易龜裂、脆裂。而且,因為無如以往之偏光板的柔軟性,故亦有難以表面加工或與其他基板貼合的問題點。記載於專利文獻5及專利文獻6之紅外線偏光板係使用自古即已為人知之圓偏光的技術,但依據視認之角度而顏色會變化。又,基本上,因係利用反射之偏光板,故產生迷光,難以形成絕對偏光之光。 However, the infrared polarizing plate of Patent Document 1 has low durability, especially low heat resistance, wet heat durability, and light resistance, and has not yet reached practical use. The metal wire grid type infrared polarizing plate of Patent Documents 2 and 3 can be processed into a film shape, and at the same time, it is popularized because of its high heat resistance. However, if the infrared polarizing plate has no nanometer-level unevenness on the surface, the optical characteristics cannot be maintained, so the surface cannot be contacted, and there can be no foreign matter or water droplets on the surface, so its use is limited. In addition, the infrared polarizing plate is difficult to perform anti-reflection or anti-glare processing. The infrared polarizing plate described in Patent Document 4 has high durability and high dichroism, so it has been put into practical use. However, since it belongs to glass that is stretched while containing fine particles, it is prone to cracks and brittleness. Moreover, because it does not have the flexibility of the conventional polarizing plate, it also has the problem of difficulty in surface processing or bonding with other substrates. The infrared polarizing plate described in Patent Document 5 and Patent Document 6 uses a technique of circular polarization that has been known since ancient times, but the color changes depending on the viewing angle. Also, basically, because the reflective polarizer is used, stray light is generated, and it is difficult to form absolutely polarized light.

如此,在如碘系偏光板之吸收型偏光板中,形成膜狀,有柔軟性,且具有高的耐久性之紅外線偏光板並不存在。此係起因於至今已開發起作為二色性染料之染料為可見光區域用之染料。對於如此之問題,在專利文獻7係已揭示一種將含有在紅外線區域具有吸收性之染料的膜進行延伸,而獲得近紅外線偏光板。然而,在該紅外線偏光板係(近)紅外線吸收染料之耐濕性差,並非一些處理吸收(近)紅外線時之發熱大的問題者。近年,即使紅外線偏光板,亦正被期待著應用於車載裝置,故在高溫高濕環境高的耐久性,尤其,開始要求即使在高溫高濕環境照射紅外線線,亦具有高的耐久性。因此,期望具有可依照如此之要求,具有高的耐久性之紅外線偏光板。 In this way, in an absorption polarizer such as an iodine-based polarizer, there is no infrared polarizer that is formed into a film, has flexibility, and has high durability. This system is due to the fact that the dye that has been developed as a dichroic dye is a dye for the visible light region. In response to such a problem, Patent Document 7 has disclosed a near-infrared polarizing plate by stretching a film containing a dye having absorption in the infrared region. However, the infrared polarizing plate system (near) infrared absorbing dye has poor moisture resistance, and it is not a problem of large heat generation when dealing with (near) infrared absorbing. In recent years, even infrared polarizers are expected to be applied to in-vehicle devices. Therefore, they have high durability in high-temperature and high-humidity environments. In particular, high durability has begun to be required even when infrared rays are irradiated in high-temperature and high-humidity environments. Therefore, it is desired to have an infrared polarizing plate that can meet such requirements and have high durability.

[先前技術文獻] [Prior Technical Literature]

[專利文獻] [Patent Literature]

[專利文獻1]美國專利申請案公開2,494,686號說明書 [Patent Document 1] Specification of U.S. Patent Application Publication No. 2,494,686

[專利文獻2]日本特開2016-148871號公報 [Patent Document 2] JP 2016-148871 A

[專利文獻3]日本特開2013-24982號公報 [Patent Document 3] JP 2013-24982 A

[專利文獻4]日本特開2004-86100號公報 [Patent Document 4] JP 2004-86100 A

[專利文獻5]國際公開2015/87709號 [Patent Document 5] International Publication No. 2015/87709

[專利文獻6]日本特許第5777463號公報 [Patent Document 6] Japanese Patent No. 5777463

[專利文獻7]國際公開2018/88558號 [Patent Document 7] International Publication No. 2018/88558

[專利文獻8]日本特許第5979728號公報 [Patent Document 8] Japanese Patent No. 5979728

[專利文獻9]國際公開2010/073649號 [Patent Document 9] International Publication No. 2010/073649

[專利文獻10]日本特開昭59-11385號公報 [Patent Document 10] Japanese Patent Application Laid-Open No. 59-11385

[專利文獻11]國際公開2010/137332 [Patent Document 11] International Publication 2010/137332

[專利文獻12]國際公開2006/112223 [Patent Document 12] International Publication 2006/112223

[非專利文獻] [Non-Patent Literature]

[非專利文獻1]染料化學;細田豐著1957年621頁 [Non-Patent Document 1] Dye Chemistry; Hosoda Toyohiro, 1957, p.621

[非專利文獻2]偏光板中之未反應硼酸分析法之開發,住友化學2012, 2012年,27-35頁 [Non-Patent Document 2] Development of an analysis method for unreacted boric acid in polarizing plates, Sumitomo Chemical 2012, 2012, pages 27-35

[非專利文獻3]紫外線硬化系統 綜合技術中心發行,加藤清視著,259-303頁 [Non-Patent Document 3] Issued by the Comprehensive Technology Center of Ultraviolet Curing System, Kato Kiyomizu, pages 259-303

因此,本發明之目的在於提供一種偏光板,該偏光板係在包含近紅外線吸收染料之染料系偏光板中,在高溫高濕環境下具有高的耐久性,尤其,在高溫高濕環境下即使曝露於強的光線亦具有高的耐久性。 Therefore, the object of the present invention is to provide a polarizing plate, which is a dye-based polarizing plate containing a near-infrared absorbing dye and has high durability in a high temperature and high humidity environment, especially, even in a high temperature and high humidity environment. Exposure to strong light also has high durability.

本發明人等為達成如此之目的,進行努力研究之結果,嶄新地發現藉由具備下列特性,可獲得具有高的耐久性之偏光板:在包含由含有近紅外線吸收染料之親水性高分子膜、及設於該親水性高分子膜之單面或兩面的基板之染料系偏光板中,該基板可在高溫高濕之環境下以一定程度以上維持親水性高分子膜中之硼化合物的量、且/或在預定之透濕度試驗並在高溫高濕之環境下透濕度為一定以下。 In order to achieve this goal, the inventors have made diligent research and found that polarizing plates with high durability can be obtained by having the following characteristics: , And in the dye-based polarizer set on the substrate of one or both sides of the hydrophilic polymer film, the substrate can maintain the amount of boron compound in the hydrophilic polymer film to a certain extent under the environment of high temperature and high humidity , And/or the moisture permeability is below a certain value in a predetermined moisture permeability test and in a high temperature and high humidity environment.

亦即,本發明係關於下述偏光板、以及具備該偏光板之光學裝置及顯示裝置。 That is, the present invention relates to the following polarizing plate, and an optical device and a display device provided with the polarizing plate.

[1]一種偏光板,係包含:由含有近紅外線吸收染料之親水性高分子膜所構成的偏光元件、及設於該膜之單面或兩面的基板;且, [1] A polarizing plate comprising: a polarizing element composed of a hydrophilic polymer film containing a near-infrared absorbing dye, and a substrate provided on one or both sides of the film; and,

該基板為至少具有下述a)及b)之任一者的特性者: The substrate has at least any one of the following characteristics a) and b):

a)該親水性高分子膜包含硼化合物時,使該偏光板在相對濕度90%RH、80℃之環境下曝露1000小時之後,以該曝露前作為100時,該親水性高分子膜中所含之硼化合物的質量保持於20以上; a) When the hydrophilic polymer film contains a boron compound, after the polarizer is exposed to a relative humidity of 90%RH and 80°C for 1000 hours, the time before the exposure is set as 100, the content of the hydrophilic polymer film The quality of the boron compound contained is kept above 20;

b)依據JIS Z 0208透濕度試驗所得之該基板在相對濕度90%RH、40℃之環境的水分透濕度以24小時計為0至1500g/m2b) According to JIS Z 0208 moisture permeability test, the moisture permeability of the substrate in an environment with a relative humidity of 90%RH and 40°C is 0 to 1500g/m 2 in 24 hours.

[2]如[1]所述之偏光板,其中,前述基板之至少1個為具有b)之特性的樹脂製之基板。 [2] The polarizing plate according to [1], wherein at least one of the aforementioned substrates is a resin-made substrate having the characteristics of b).

[3]如[2]所述之偏光板,其中,在前述親水性高分子膜之兩面具備基板,且在與前述樹脂製之基板為相反側具備具有b)之特性的無機基板或樹脂製基板。 [3] The polarizing plate according to [2], wherein a substrate is provided on both sides of the hydrophilic polymer film, and an inorganic substrate or resin-made substrate having the characteristics of b) is provided on the opposite side of the resin-made substrate Substrate.

[4]如[1]至[3]中任一項所述之偏光板,其中,前述親水性高分子膜為以選自由聚乙烯醇系樹脂、直鏈澱粉系樹脂、澱粉系樹脂、纖維素系樹脂、聚丙烯酸鹽系樹脂、及此等之衍生物所組成之群組中的樹脂所構成,且含有硼化合物。 [4] The polarizing plate according to any one of [1] to [3], wherein the hydrophilic polymer film is selected from the group consisting of polyvinyl alcohol-based resins, amylose-based resins, starch-based resins, and fibers. It is composed of resins in the group consisting of plain resins, polyacrylate resins, and derivatives thereof, and contains a boron compound.

[5]如[2]至[4]中任一項所述之偏光板,其中,前述樹脂製基板包含選自由矽系樹脂、(甲基)丙烯酸系樹脂、環烯烴系樹脂、聚酯系樹脂、及聚碳酸酯樹脂所組成之群組中的一種以上之樹脂。 [5] The polarizing plate according to any one of [2] to [4], wherein the resin substrate includes a resin selected from the group consisting of silicon resin, (meth)acrylic resin, cycloolefin resin, and polyester resin. One or more resins in the group consisting of resin and polycarbonate resin.

[6]如[2]至[5]中任一項所述之偏光板,其中,前述樹脂製基板包含使聚合性單體組成物聚合所得到之膜,而該聚合性單體組成物係包含在分子內具有3個以上之(甲基)丙烯醯基的(甲基)丙烯酸酯化合物。 [6] The polarizing plate according to any one of [2] to [5], wherein the resin substrate includes a film obtained by polymerizing a polymerizable monomer composition, and the polymerizable monomer composition is Contains a (meth)acrylate compound having 3 or more (meth)acrylic groups in the molecule.

[7]如[6]所述之偏光板,其中,前述(甲基)丙烯酸酯化合物具有選自由新戊四醇骨架、新戊二醇骨架、三羥甲基丙烷骨架、及二環戊二烯骨架所組成之群組中的任一骨架。 [7] The polarizing plate according to [6], wherein the (meth)acrylate compound is selected from the group consisting of neopentyl erythritol skeleton, neopentyl glycol skeleton, trimethylolpropane skeleton, and dicyclopentadiene Any skeleton in the group consisting of alkene skeletons.

[8]如[6]或[7]所述之偏光板,其中,以固體成分濃度計,在聚合性單體組成物中之全部單體中,前述(甲基)丙烯酸酯化合物為15質量%以上。 [8] The polarizing plate according to [6] or [7], wherein the (meth)acrylate compound is 15 masses in terms of solid content concentration among all monomers in the polymerizable monomer composition %the above.

[9]如[3]至[8]中任一項所述之偏光板,其中,上述無機基板包含玻璃、石英、藍寶石、水晶、及尖晶石之任一者。 [9] The polarizing plate according to any one of [3] to [8], wherein the inorganic substrate includes any one of glass, quartz, sapphire, crystal, and spinel.

[10]如[2]至[9]中任一項所述之偏光板,其中,前述樹脂製基板之厚度為0.5μm至10μm。 [10] The polarizing plate according to any one of [2] to [9], wherein the thickness of the resin substrate is 0.5 μm to 10 μm.

[11]如[4]至[10]中任一項所述之偏光板,其中,前述親水性高分子膜包含聚乙烯醇樹脂或其衍生物。 [11] The polarizing plate according to any one of [4] to [10], wherein the hydrophilic polymer film contains a polyvinyl alcohol resin or a derivative thereof.

[12]如[1]至[11]中任一項所述之偏光板,其中,前述近紅外線吸收染料為下述式(1)所示之偶氮化合物。 [12] The polarizing plate according to any one of [1] to [11], wherein the near-infrared absorbing dye is an azo compound represented by the following formula (1).

Figure 109122608-A0202-12-0007-1
(式(1)中,A1為可具有取代基之苯基、可具有取代基之萘基或可具有取代基之雜環基,A2、A3及A4係分別獨立地為可具有取代基之苯基或可具有取代基之萘基,k係表示0或1之整數;R1為羥基、碳數1至4之烷氧基或取代或非取代之胺基,m係表示0至5之整數。M係表示氫、金屬離子或銨離子,n係表示1或2之整數;環a及環b之氫原子係可分別獨立地以取代基R1取代,環a及環b之任一者或兩者的氫原子係以取代基SO3M取代。)
Figure 109122608-A0202-12-0007-1
(In formula (1), A 1 is an optionally substituted phenyl group, an optionally substituted naphthyl group, or an optionally substituted heterocyclic group, and A 2 , A 3 and A 4 are each independently an optionally substituted Substituent phenyl or substituted naphthyl, k represents an integer of 0 or 1; R 1 is a hydroxyl group, an alkoxy group with 1 to 4 carbon atoms or a substituted or unsubstituted amine group, and m represents 0 .M-based integer of 5 to represent hydrogen, a metal ion or an ammonium ion, n-system represents an integer of 1 or 2; a hydrogen atom and ring lines of the loop b can each independently be substituted the substituents R 1, ring a and ring b The hydrogen atoms of either or both are replaced with the substituent SO 3 M.)

[13]如[12]所述之偏光板,其中,上述式(1)中之A2、A3及A4係分別獨立地以下述式(2)或式(3)所示,A2、A3及A4之至少1個係以式(2)所示。 [13] The polarizing plate according to [12], wherein A 2 , A 3 and A 4 in the above formula (1) are independently represented by the following formula (2) or formula (3), and A 2 At least one of, A 3 and A 4 is represented by formula (2).

Figure 109122608-A0202-12-0007-3
(式(2)中,R2係表示羥基、碳數1至4之脂肪族烴基、碳數1至4之烷氧基、取代或非取代之胺基或以磺基取代之碳數1至4的烷氧基,m2係表示0至6之整數;M係表示氫、金屬離子或銨離子,n3係表示0至2之整數。)
Figure 109122608-A0202-12-0007-3
(In formula (2), R 2 represents a hydroxyl group, an aliphatic hydrocarbon group with 1 to 4 carbons, an alkoxy group with 1 to 4 carbons, a substituted or unsubstituted amine group or a sulfo group substituted with 1 to 4 is an alkoxy group, m 2 represents an integer from 0 to 6; M represents hydrogen, a metal ion or an ammonium ion, and n 3 represents an integer from 0 to 2.)

Figure 109122608-A0202-12-0008-4
(式(3)中,R3及R4係分別獨立地表示氫原子、碳數1至4之脂肪族烴基、碳數1至4之烷氧基、以羥基取代之碳數1至4的烷氧基或以磺基取代之碳數1至4的烷氧基。)
Figure 109122608-A0202-12-0008-4
(In formula (3), R 3 and R 4 each independently represent a hydrogen atom, an aliphatic hydrocarbon group with 1 to 4 carbons, an alkoxy group with 1 to 4 carbons, and a group with 1 to 4 carbons substituted by a hydroxyl group. An alkoxy group or an alkoxy group having 1 to 4 carbons substituted with a sulfo group.)

[14]如[12]或[13]所述之偏光板,其中,上述式(1)之偶氮化合物為下述式(4)所示之化合物。 [14] The polarizing plate according to [12] or [13], wherein the azo compound of the above formula (1) is a compound represented by the following formula (4).

Figure 109122608-A0202-12-0008-5
(式(4)中,A1、A2、A3、A4、M、n及k係分別與上述式(1)為相同,又,環a及環b之一者或兩者之氫原子係以取代基SO3M取代。)
Figure 109122608-A0202-12-0008-5
(In formula (4), A 1 , A 2 , A 3 , A 4 , M, n, and k are the same as the above formula (1), and the hydrogen of one or both of ring a and ring b The atom is substituted with the substituent SO 3 M.)

[15]如[12]至[14]中任一項所述之偏光板,其中,上述式(1)或(4)中之A1為選自由以羥基、磺基取代的碳數1至4之烷氧基及磺基所組成之群組中的1個以上之取代基取代的萘基。 [15] The polarizing plate according to any one of [12] to [14], wherein A 1 in the above formula (1) or (4) is selected from the group consisting of 1 to 1 carbon atoms substituted with a hydroxyl group and a sulfo group. A naphthyl group substituted with one or more substituents in the group consisting of 4 alkoxy and sulfo groups.

[16]如[12]至[14]中任一項所述之偏光板,其中,在上述式(1)或(4)中,A1為下述式(5)所示者。 [16] The polarizing plate according to any one of [12] to [14], wherein in the above formula (1) or (4), A 1 is represented by the following formula (5).

Figure 109122608-A0202-12-0008-6
(式(5)中,n4係表示1或2之整數。)
Figure 109122608-A0202-12-0008-6
(In formula (5), n 4 represents an integer of 1 or 2.)

[17]如[12]至[14]中任一項所述之偏光板,其中,上述式(1)或(4)中之A1為以選自硝基及磺基之至少1個取代基取代的苯基。 [17] The polarizing plate according to any one of [12] to [14], wherein A 1 in the above formula (1) or (4) is substituted with at least one selected from a nitro group and a sulfo group Group substituted phenyl.

[18]如[12]至[14]中任一項所述之偏光板,其中,上述式(1)或(4)之A1中之可具有取代基之雜環基為選自由(6)至(8)所示之基所組成之群組中的基。 [18] The polarizing plate according to any one of [12] to [14], wherein the heterocyclic group which may have a substituent in A 1 of the above formula (1) or (4) is selected from (6) ) To (8) in the group consisting of the groups shown in (8).

Figure 109122608-A0202-12-0009-7
(式(6)至(8)中之X係分別獨立地為鹵素基、硝基、羥基、碳數1至4之脂肪族烴基、碳數1至4之烷氧基、以磺基取代之碳數1至4之脂肪族烴基、以羥基取代之碳數1至4之脂肪族烴基、以羧基取代之碳數1至4之脂肪族烴基、以磺基取代之碳數1至4之烷氧基、以羥基取代之碳數1至4之烷氧基、或以羧基取代之碳數1至4之烷氧基,q1係表示0至4之整數,q2係表示0至6之整數;M係表示氫、金屬離子、或銨離子,n1及n2係分別獨立地表示0至3之整數;各式中*係表示與偶氮鍵結之接合位置。)
Figure 109122608-A0202-12-0009-7
(X in formulas (6) to (8) are each independently a halogen group, a nitro group, a hydroxyl group, an aliphatic hydrocarbon group with a carbon number of 1 to 4, an alkoxy group with a carbon number of 1 to 4, and a sulfo group substituted Aliphatic hydrocarbon groups with 1 to 4 carbons, aliphatic hydrocarbon groups with 1 to 4 carbons substituted with hydroxyl groups, aliphatic hydrocarbons with 1 to 4 carbons substituted with carboxyl groups, alkanes with 1 to 4 carbons substituted with sulfo groups An oxy group, an alkoxy group with a carbon number of 1 to 4 substituted by a hydroxyl group, or an alkoxy group with a carbon number of 1 to 4 substituted by a carboxyl group, q 1 represents an integer from 0 to 4, and q 2 represents a range from 0 to 6 Integer; M represents hydrogen, metal ion, or ammonium ion, n 1 and n 2 each independently represent an integer from 0 to 3; in each formula, * represents the bonding position of the azo bond.)

[19]如[1]至[18]中任一項所述之偏光板,其中,在至少700至1500nm具有:對於已偏光之光顯示最高的穿透率之軸的吸光度、與對於已偏光之光顯示最低的穿透率之軸的吸光度之吸光度比為5以上之波長域。 [19] The polarizing plate according to any one of [1] to [18], wherein at least 700 to 1500 nm has the absorbance of the axis showing the highest transmittance for polarized light, and the absorbance for polarized light The light shows the lowest transmittance axis in the wavelength range where the ratio of absorbance to absorbance is 5 or more.

[20]如[12]至[19]中任一項所述之偏光板,其更包含上述式(1)所示之偶氮化合物以外的有機染料之一種類以上。 [20] The polarizing plate according to any one of [12] to [19], which further contains one or more kinds of organic dyes other than the azo compound represented by the above formula (1).

[21]如[20]所述之偏光板,其係顯示中性灰色。 [21] The polarizing plate as described in [20], which displays a neutral gray.

[22]一種光學裝置,係具備[1]至[21]中任一項所述之偏光板。 [22] An optical device comprising the polarizing plate according to any one of [1] to [21].

[23]一種顯示裝置,係具備[1]至[21]中任一項所述之偏光板、或[22]所述之光學裝置。 [23] A display device comprising the polarizing plate described in any one of [1] to [21] or the optical device described in [22].

上述偏光板及裝置係儘管含有近紅外線吸收染料,在高溫高濕環境下亦具有高的耐久性,尤其,在高溫高濕環境下即使曝露於強的光,尤其紅外線線,亦具有高的耐久性。 The above-mentioned polarizing plate and device contain near-infrared absorbing dyes, and have high durability in high temperature and high humidity environments. In particular, they have high durability even when exposed to strong light, especially infrared rays, in high temperature and high humidity environments. Sex.

以下,藉由其實施型態詳細說明本發明。惟,本發明係不受以下之實施型態所限制。 Hereinafter, the present invention will be described in detail through its implementation modes. However, the present invention is not limited by the following implementation types.

以本發明之實施型態所產生的偏光板其特徵係在包含含有近紅外線吸收染料之親水性高分子膜及基板之染料系偏光板中,藉由在該親水性高分子膜積層具有特定之特性的基板,在高溫高濕之環境下具有高的耐久性。 The polarizing plate produced by the embodiment of the present invention is characterized by a dye-based polarizing plate including a hydrophilic polymer film containing a near-infrared absorbing dye and a substrate, and the hydrophilic polymer film has a specific The characteristic substrate has high durability in a high temperature and high humidity environment.

以下,說明各構成要素。 Hereinafter, each component will be described.

(近紅外線吸收染料) (Near infrared absorbing dye)

一般而言,所謂紅外線區域(亦有時稱為紅外線波長域或紅外線區域波長域)係指700nm至3000nm之波長區域,所謂近紅外線區域係指700nm至1500nm之波長區域,但以本發明之實施型態所得到之偏光板係包含近紅外線吸收染料,且在近紅外線區域發揮偏光功能。因此,以本發明之實施型態所得到之偏光板係在700nm至1500nm之波長區域具有偏光功能,但較佳係在700nm至1300nm之波長區域發揮偏光功能,更佳係在750nm至1200nm之波長區域發揮偏光功能。作為吸 收之各向異性的二色比若為5以上,可以感測器等使用,但較佳係10以上,更佳係20以上,再更佳係30以上,特佳係40以上。具體而言,若單體穿透率設為30%,就二色比為5時,偏光度係表示88.2%及約90%之偏光度,就二色比為10時,偏光度係表示98.3%及約99%之偏光度。 Generally speaking, the so-called infrared region (also sometimes referred to as infrared wavelength region or infrared region wavelength region) refers to the wavelength region from 700 nm to 3000 nm, and the so-called near infrared region refers to the wavelength region from 700 nm to 1500 nm, but the implementation of the present invention The resulting polarizing plate contains near-infrared absorbing dyes and has a polarizing function in the near-infrared region. Therefore, the polarizing plate obtained by the embodiment of the present invention has a polarization function in the wavelength region of 700nm to 1500nm, but preferably has a polarization function in the wavelength region of 700nm to 1300nm, and more preferably in the wavelength region of 750nm to 1200nm The area plays a polarizing function. As suck If the anisotropic dichroic ratio is 5 or more, it can be used as a sensor, but it is preferably 10 or more, more preferably 20 or more, still more preferably 30 or more, particularly preferably 40 or more. Specifically, if the monomer transmittance is set to 30%, when the dichroic ratio is 5, the degree of polarization is 88.2% and about 90%, and when the dichroic ratio is 10, the degree of polarization is 98.3. % And about 99% polarization.

在本發明之實施型態使用之近紅外線吸收染料係可列舉例如,酞菁系、萘酞菁系、金屬錯合物系、硼錯合物系、菁系、方酸菁系、二亞銨系、二苯基胺/三苯基胺類系、醌系、及偶氮系之染料。一般而言,此等之染料係藉由擴展既存之π共軛系統而使吸收波長長波長化,藉由其構造顯示多種多樣的吸收波長。又,其許多係採取疏水性染料或顏料之型態,但亦有藉由進行水溶性化,利用來作為親水性染料者。本發明之較佳的實施型態係使用偶氮系近紅外線吸收染料作為近紅外線吸收染料。又,在本說明書中,有時將近紅外線吸收染料僅簡稱並記載為染料。 The near-infrared absorbing dyes used in the embodiment of the present invention include, for example, phthalocyanines, naphthalocyanines, metal complexes, boron complexes, cyanines, squaraine, and diiminium. Dyestuffs based on dyes, diphenylamine/triphenylamine, quinone, and azo dyes. Generally speaking, these dyes extend the existing π-conjugated system to make the absorption wavelength longer, and display a variety of absorption wavelengths through their structure. In addition, many of them take the form of hydrophobic dyes or pigments, but some are used as hydrophilic dyes by making them water-soluble. A preferred embodiment of the present invention uses an azo-based near-infrared absorbing dye as the near-infrared absorbing dye. In addition, in this specification, the near-infrared absorbing dye may only be abbreviated and described as a dye.

上述近紅外線吸收染料係可為游離形態,亦可為鹽之形態。因此,本案說明書中之近紅外線吸收染料係包含兩者之形態。鹽係可列舉例如,鋰鹽、鈉鹽、鉀鹽等之鹼金屬鹽;及銨鹽、烷基胺鹽等之有機鹽,以鈉鹽為較佳。 The above-mentioned near-infrared absorbing dye system may be in a free form or in the form of a salt. Therefore, the near-infrared absorbing dye in the specification of this case includes both forms. Examples of the salt system include alkali metal salts such as lithium salt, sodium salt, and potassium salt; and organic salts such as ammonium salt and alkylamine salt, and sodium salt is preferred.

一般的偶氮系染料係吸收可見光區域之光,水溶性印墨為主要之用途。惟,已有市售藉由使吸收廣帶域化,至近紅外線區域為止可吸收之近紅外線吸收染料,亦可使用此等。例如,在專利文獻8係已記載以製作黑色印墨之目的,使用C.I.Acid Black 2(ORIENT化學工業公司製)、C.I.Direct Black 19(ALDRICH工業公司製)之例,但亦可使用此等之染料。又,此等偶氮系染料係亦可與金屬形成錯合物,亦可使用此等錯合物。錯合物係可列舉下述式(9)之化合物。 General azo dyes absorb light in the visible light region, and water-soluble inks are the main purpose. However, there are already commercially available near-infrared absorbing dyes that can absorb to the near-infrared region by widening the absorption band, and these can also be used. For example, Patent Document 8 describes the use of CIacid Black 2 (manufactured by Orient Chemical Industry Co., Ltd.) and CIDirect Black 19 (manufactured by ALDRICH Industrial Co., Ltd.) for the purpose of producing black ink, but these can also be used. dye. In addition, these azo dyes may form complexes with metals, and these complexes may also be used. Examples of the complex system include compounds of the following formula (9).

Figure 109122608-A0202-12-0012-8
式中,Mz係表示中心金屬,金屬種係例示鈷、鎳等。又,式中,Az及Bz係分別獨立地表示苯基或萘基等之芳香族環。由如此之錯合物所構成的染料之具體例係例示專利文獻10記載之近紅外線線吸收劑。專利文獻10之內容係藉由參照而摘入於本案中。
Figure 109122608-A0202-12-0012-8
In the formula, Mz represents the central metal, and the metal species exemplifies cobalt, nickel, and the like. In addition, in the formula, Az and Bz each independently represent an aromatic ring such as a phenyl group or a naphthyl group. Specific examples of dyes composed of such complexes are the near-infrared ray absorbers described in Patent Document 10. The content of Patent Document 10 is extracted in this case by reference.

近紅外線吸收染料係以水溶性偶氮化合物為較佳,以下述式(1)所示之偶氮化合物為特佳。 The near-infrared absorbing dye is preferably a water-soluble azo compound, and particularly preferably an azo compound represented by the following formula (1).

Figure 109122608-A0202-12-0012-9
Figure 109122608-A0202-12-0012-9

上述式(1)中,A1係可具有取代基之苯基、可具有取代基之萘基或可具有取代基之雜環基,A2、A3、及A4係分別獨立地為可具有取代基之苯基或可具有取代基之萘基,k係表示0或1之整數。R1係氫原子、羥基、碳數1至4之烷氧基或取代或非取代之胺基,m係表示0至5之整數。M係表示氫、金屬離子、或銨離子,n係表示1或2之整數。環a及環b之氫原子係分別獨立地可以取代基R1取代,環a及環b之任一者或兩者之氫原子係以取代基SO3M取代。 In the above formula (1), A 1 is an optionally substituted phenyl group, an optionally substituted naphthyl group, or an optionally substituted heterocyclic group, and A 2 , A 3 , and A 4 are each independently an optional The substituted phenyl group or the substituted naphthyl group, k represents an integer of 0 or 1. R 1 is a hydrogen atom, a hydroxyl group, an alkoxy group having a carbon number of 1 to 4, or a substituted or unsubstituted amine group, and m is an integer of 0 to 5. M represents hydrogen, metal ion, or ammonium ion, and n represents an integer of 1 or 2. The hydrogen atoms of the ring a and the ring b may be independently substituted with the substituent R 1 , and the hydrogen atoms of either or both of the ring a and the ring b are substituted with the substituent SO 3 M.

A1中之「可具有取代基之苯基」、「可具有取代基之萘基」及「可具有取代基之雜環基」中之「取代基」並無特別限定,但可列舉例如,可具有取代基之碳數1至4之脂肪族烴基、可具有取代基之碳數1至4之烷氧基、以磺基取代之碳數1至4的烷氧基、可具有取代基之芳氧基、羥基、磺基、羧基、硝基、鹵素原子、取代或非取代之胺基、醯胺基等。 A 1 in the "group of the phenyl may have a substituent", "naphthyl group may have a substituent group of the" and "may have a substituent group the heterocyclic group" in the "substituent group" is not particularly limited, but include for example, An aliphatic hydrocarbon group with 1 to 4 carbons which may have a substituent, an alkoxy group with 1 to 4 carbons which may have a substituent, an alkoxy group with 1 to 4 carbons which may be substituted with a sulfo group, and those which may have a substituent Aryloxy group, hydroxyl group, sulfo group, carboxyl group, nitro group, halogen atom, substituted or unsubstituted amine group, amide group, etc.

上述「可具有取代基之碳數1至4之脂肪族烴基」係可列舉例如,甲基、乙基、正丙基、正丁基等之直鏈之脂肪族烴基、異丙基、第二丁基、第三丁基等之分枝鏈脂肪族烴基、環丁基等之環狀脂肪族烴基等,此等取代基係例如可以羥基、磺基、羧基、取代或非取代之胺基(後述)、或醯胺基取代。 The above-mentioned "aliphatic hydrocarbon groups with 1 to 4 carbons which may have substituents" include, for example, linear aliphatic hydrocarbon groups such as methyl, ethyl, n-propyl, n-butyl, isopropyl, and second Branched chain aliphatic hydrocarbon groups such as butyl and tertiary butyl groups, cyclic aliphatic hydrocarbon groups such as cyclobutyl groups, etc., and these substituents may be, for example, hydroxyl, sulfo, carboxyl, substituted or unsubstituted amine groups ( (Described later), or amide group substitution.

上述「可具有取代基之碳數1至4之烷氧基」係可列舉例如,甲氧基、乙氧基、正丙氧基、正丁氧基、異丙氧基、第二丁氧基、第三丁氧基、環丁氧基等,此等取代基係例如,可以羥基、磺基、羧基、取代或非取代之胺基(後述)、或醯胺基取代。 The above-mentioned "optionally substituted alkoxy group having 1 to 4 carbons" includes, for example, methoxy, ethoxy, n-propoxy, n-butoxy, isopropoxy, and second butoxy , Tert-butoxy, cyclobutoxy, etc. These substituents may be substituted with, for example, a hydroxyl group, a sulfo group, a carboxyl group, a substituted or unsubstituted amine group (described later), or an amido group.

上述「以磺基取代之碳數1至4的烷氧基」係可列舉例如,磺甲氧基、磺乙氧基、3-磺丙氧基、4-磺丁氧基、3-磺丁氧基等。 The above-mentioned "alkoxy group having 1 to 4 carbon atoms substituted with a sulfo group" includes, for example, sulfomethoxy, sulfoethoxy, 3-sulfopropoxy, 4-sulfobutoxy, 3-sulfobutane Oxy etc.

上述「可具有取代基之芳氧基」係可列舉例如,5員或6員單環式芳氧基或11員至14員縮合二環式芳氧基等,更具體而言係可列舉苯氧基、萘氧基等。「可具有取代基之芳氧基」中之「取代基」並無特別限制,可列舉例如,可具有上述取代基之碳數1至4之脂肪族烴基。 The above-mentioned "aryloxy group which may have a substituent" system includes, for example, 5-membered or 6-membered monocyclic aryloxy group or 11-membered to 14-membered condensed bicyclic aryloxy group. More specifically, benzene may be mentioned. Oxy, naphthoxy, etc. The "substituent" in the "aryloxy group which may have a substituent" is not particularly limited, and examples thereof include aliphatic hydrocarbon groups having 1 to 4 carbons which may have the above-mentioned substituents.

上述「鹵素原子」係可列舉例如,氯原子、溴原子等。 The above-mentioned "halogen atom" includes, for example, a chlorine atom and a bromine atom.

上述「取代或非取代之胺基」係可列舉例如,非取代胺基;甲基胺基、乙基胺基、正丙基胺基、正丁基胺基等之單C1-4烷基胺基、單苯基胺基、 單萘基胺基等之單芳基胺基(5員或6員單環式芳基胺基或11員乃至14員縮合二環式芳基胺基)、醯基胺基(較佳係式:R-CO-NH-之醯基胺基(式中,R係碳數1至4之脂肪族烴基))等之單取代胺基;以及,二甲基胺基、二乙基胺基、N-乙基-N-甲基胺基等之二C1-4烷基胺基、二苯基胺基等之二芳基胺基(選自5員或6員單環式芳基及11員至14員縮合二環式芳基之以2個芳基取代的胺基)、以N-乙基-N-苯基胺基等之C1-4烷基及5員或6員單環式芳基或11員至14員縮合二環式芳基取代之胺基等的二取代胺基。 The above-mentioned "substituted or unsubstituted amino group" includes, for example, unsubstituted amino groups; mono C 1-4 alkyl groups such as methyl amino groups, ethyl amino groups, n-propyl amino groups, n-butyl amino groups, etc. Monoarylamino groups such as amine groups, monophenylamino groups, mononaphthylamino groups (5-membered or 6-membered monocyclic arylamine groups or 11-member or even 14-membered condensed bicyclic arylamine groups), Monosubstituted amino groups such as acylamino groups (preferably of the formula: R-CO-NH- acylamino groups (wherein R is an aliphatic hydrocarbon group with 1 to 4 carbon atoms)); and, dimethyl Amino, diethylamino, N-ethyl-N-methylamino and other two C 1-4 alkylamino groups, diphenylamino groups and other diarylamino groups (selected from 5 members or 6-membered monocyclic aryl group and 11-membered to 14-membered condensed bicyclic aryl group (amino group substituted with 2 aryl groups), C 1-4 alkane with N-ethyl-N-phenylamino group, etc. And disubstituted amino groups such as 5-membered or 6-membered monocyclic aryl groups or 11 to 14-membered condensed bicyclic aryl substituted amino groups.

A1中之「可具有取代基之苯基」之「取代基」更佳係選自由以磺基、羧基、羥基、磺基取代之碳數1至4之烷氧基、碳數1至4之脂肪族烴基、碳數1至4之烷氧基、以鹵素原子、硝基、非取代胺基、碳數1至4之脂肪族烴取代的胺基、式:R-CO-NH-之醯基胺基(式中,R係碳數1至4之脂肪族烴基)、及式:醯胺基(式中,R係碳數1至4之脂肪族烴基,分別獨立地為氫或碳數1至4之脂肪族烴基)所組成之群組中的1個以上之取代基。該「取代基」再更佳係磺基、羧基、羥基、氯原子、溴原子、硝基、非取代胺基、3-磺丙氧基、4-磺丁氧基、或3-磺丁氧基。 A 1 in the "group of a phenyl substituent" of the "substituent groups" more preferably selected from the group consisting of alkyl substituents at the sulfo group, a carboxyl group, a hydroxyl group, a sulfo group of 1 to 4 carbon atoms, alkoxy, of 1 to 4 carbon atoms The aliphatic hydrocarbon group, the alkoxy group with carbon number of 1 to 4, the amino group substituted with halogen atom, nitro group, unsubstituted amine group, the aliphatic hydrocarbon group with carbon number of 1 to 4, the formula: R-CO-NH- Amino (in the formula, R is an aliphatic hydrocarbon group with 1 to 4 carbons), and formula: an amino (in the formula, R is an aliphatic hydrocarbon with 1 to 4 carbons, each independently of hydrogen or carbon One or more substituents in the group consisting of aliphatic hydrocarbon groups (1 to 4). The "substituent" is more preferably a sulfo group, a carboxyl group, a hydroxyl group, a chlorine atom, a bromine atom, a nitro group, an unsubstituted amino group, a 3-sulfopropoxy group, a 4-sulfobutoxy group, or a 3-sulfobutoxy group base.

該苯基具有2個以上之取代基時,該等取代基之至少1個為以磺基、硝基、羧基、或磺基取代之碳數1至4的烷氧基,較佳係其他之取代基為以磺基、硝基、碳數1至4之脂肪族烴基、碳數1至4之烷氧基、以磺基取代之碳數1至4之烷氧基、以羧基、鹵素原子、硝基、胺基、碳數1至4之脂肪族烴取代之胺基、或碳數1至4之脂肪族烴取代醯基胺基。其他之取代基更佳係磺基、甲基、乙基、甲氧基、乙氧基、羧基、羥基、2-磺乙氧基、3-磺丙氧基、4-磺丁氧基、氯原子、硝基、或胺基,再更佳係磺基、羧基、硝基、甲基、甲氧基、2-磺乙氧基、3-磺 丙氧基、或4-磺丁氧基,特佳係磺基、羧基、硝基、甲基、甲氧基、羥基、3-磺丙氧基、或4-磺丁氧基。 When the phenyl group has two or more substituents, at least one of the substituents is an alkoxy group having 1 to 4 carbons substituted with a sulfo group, a nitro group, a carboxyl group, or a sulfo group, preferably others Substituents are sulfo groups, nitro groups, aliphatic hydrocarbon groups with 1 to 4 carbons, alkoxy groups with 1 to 4 carbons, alkoxy groups with 1 to 4 carbons substituted with sulfo groups, carboxyl groups, halogen atoms , Nitro group, amine group, aliphatic hydrocarbon substituted amine group with 1 to 4 carbon atoms, or aliphatic hydrocarbon substituted amine group with 1 to 4 carbon atoms. Other substituents are preferably sulfo, methyl, ethyl, methoxy, ethoxy, carboxy, hydroxy, 2-sulfoethoxy, 3-sulfopropoxy, 4-sulfobutoxy, chlorine Atom, nitro group, or amino group, more preferably sulfo, carboxy, nitro, methyl, methoxy, 2-sulfoethoxy, 3-sulfon Propoxy or 4-sulfobutoxy, particularly preferably sulfo, carboxy, nitro, methyl, methoxy, hydroxy, 3-sulfopropoxy, or 4-sulfobutoxy.

A1中之「可具有取代基之苯基」之「取代基」的位置並無特別限定,但較佳係僅在2位、僅在4位、在2位及6位、在2位及4位、或在3位及5位,特佳係僅在2位、僅在4位、在2位及4位、或在3位及5位。又,僅在2位、僅在4位係表示僅在2位或4位具有1個之氫原子以外的取代基。 The position of the "substituent" of the "substitutable phenyl group" in A 1 is not particularly limited, but it is preferably only at the 2-position, only at the 4-position, at the 2-position and the 6-position, at the 2-position and at the 2-position. 4 digits, or 3 and 5 digits, especially good ones are only 2 digits, only 4 digits, 2 and 4 digits, or 3 and 5 digits. In addition, only the 2-position and only the 4-position system means that there is only one substituent other than the hydrogen atom at the 2-position or the 4-position.

A1中之「可具有取代基之苯基」之較佳的取代基與其位置之組合係使偶氮鍵結作為1位時,可列舉在2位具有磺基,在4位具有硝基之苯基、或在3位與5位分別具有羧基之苯基。 When the combination of the preferable substituent of the "phenyl which may have a substituent" and its position in A 1 is such that an azo bond is used as the 1-position, examples include those having a sulfo group at the 2-position and a nitro group at the 4-position. A phenyl group or a phenyl group each having a carboxyl group at the 3-position and 5-position.

A1中之「可具有取代基之萘基」之「取代基」較佳係選自由以羥基、磺基取代之碳數1至4的烷氧基及磺基所組成之群組中的取代基,以磺基、3-磺丙氧基、4-磺丁氧基或羥基為再更佳。使偶氮基之取代位置作為1位時,朝逆時鐘旋轉,更佳係8位以羥基取代之萘基,再者,特佳係任意之位置以磺基取代之下述式(5)所示的萘基。 The "substituent" of the "substitutable naphthyl group" in A 1 is preferably selected from the group consisting of a hydroxyl group, a sulfo group substituted with an alkoxy group having 1 to 4 carbon atoms, and a sulfo group The group is more preferably a sulfo group, 3-sulfopropoxy group, 4-sulfobutoxy group or hydroxyl group. When the substitution position of the azo group is set to the 1-position, it is rotated counterclockwise, and it is more preferably a naphthyl group substituted with a hydroxyl group at the 8-position, and particularly preferably any position is substituted with a sulfo group in the following formula (5) Shown by naphthyl.

Figure 109122608-A0202-12-0015-10
(式(5)中,n4係表示1或2之整數,以1為較佳。)
Figure 109122608-A0202-12-0015-10
(In formula (5), n 4 represents an integer of 1 or 2, and 1 is preferred.)

A1中之「可具有取代基之雜環基」係可列舉例如,可具有取代基之噻唑基、噁唑基、咪唑基、噻吩基、呋喃基、吡咯基、噻二唑基、吡唑基、吡啶基、六氫吡

Figure 109122608-A0202-12-0015-85
基(piperazinyl)、喹啉基、苯并咪唑基、萘并咪唑基、苯并噻唑基、 萘并噻二唑基、苯并噻二唑基等,以可具有取代基之苯并噻二唑基或萘并噻二唑基為較佳。 The "heterocyclic group which may have substituents" in A 1 includes, for example, thiazolyl, oxazolyl, imidazolyl, thienyl, furyl, pyrrolyl, thiadiazolyl, and pyrazole which may have substituents. Pyridyl, pyridyl, hexahydropyridine
Figure 109122608-A0202-12-0015-85
Group (piperazinyl), quinolinyl, benzimidazolyl, naphthimidazolyl, benzothiazolyl, naphththiadiazolyl, benzothiadiazolyl, etc., and optionally substituted benzothiadiazole Nyl or naphththiadiazolyl is preferred.

上述「可具有取代基之雜環基」中之「取代基」並無特別限制,但較佳係可列舉磺基、羧基、鹵素原子、硝基、羥基、碳數1至4之脂肪族烴基、碳數1至4之烷氧基、以磺基取代之碳數1至4之脂肪族烴基、以羥基取代之碳數1至4之脂肪族烴基、以羧基取代之碳數1至4之脂肪族烴基、以磺基取代之碳數1至4之烷氧基、以羥基取代之碳數1至4之烷氧基、及以羧基取代之碳數1至4之烷氧基,更佳係羥基、羧基或磺基。 The "substituent" in the above-mentioned "substitutable heterocyclic group" is not particularly limited, but preferred examples include sulfo group, carboxyl group, halogen atom, nitro group, hydroxyl group, and aliphatic hydrocarbon group with 1 to 4 carbon atoms. , Alkoxy groups with 1 to 4 carbons, aliphatic hydrocarbon groups with 1 to 4 carbons substituted with sulfo groups, aliphatic hydrocarbon groups with 1 to 4 carbons substituted with hydroxyl groups, and aliphatic hydrocarbon groups with 1 to 4 carbons substituted with carboxyl groups Aliphatic hydrocarbon group, alkoxy group with 1 to 4 carbons substituted with sulfo group, alkoxy group with 1 to 4 carbons substituted with hydroxyl group, and alkoxy group with 1 to 4 carbons substituted with carboxyl group, more preferred It is a hydroxyl group, a carboxyl group or a sulfo group.

如此之雜環基特佳係選自由下述式(6)至(8)所示之基所成的群中之基。 Such heterocyclic groups are particularly preferably selected from the group consisting of groups represented by the following formulas (6) to (8).

Figure 109122608-A0202-12-0016-11
(式(6)至(8)中之X係分別獨立地為鹵素基、硝基、羥基、羧基、碳數1至4之脂肪族烴基、碳數1至4之烷氧基、以磺基取代之碳數1至4之脂肪族烴基、以羥基取代之碳數1至4之脂肪族烴基、以羧基取代之碳數1至4之脂肪族烴基、以磺基取代之碳數1至4之烷氧基、以羥基取代之碳數1至4之烷氧基或以羧基取代之碳數1至4的烷氧基,較佳係磺基、羧基或羥基,q1係表示0至4之整數,較佳係表示0或1,q2係表示0至6之整數,較佳係表示0或1。M係表示氫、金屬離子或銨離子,n1及n2係分別獨立地表示0至3之整數,較佳係表示0或1。各式中*係表示與偶氮鍵結之接合位置。)
Figure 109122608-A0202-12-0016-11
(X in formulas (6) to (8) are each independently a halogen group, a nitro group, a hydroxyl group, a carboxyl group, an aliphatic hydrocarbon group with 1 to 4 carbons, an alkoxy group with 1 to 4 carbons, and a sulfo group. Substituted aliphatic hydrocarbon groups with 1 to 4 carbons, aliphatic hydrocarbon groups with 1 to 4 carbons substituted with hydroxy groups, aliphatic hydrocarbon groups with 1 to 4 carbons substituted with carboxyl groups, and 1 to 4 carbons substituted with sulfo groups The alkoxy group, the alkoxy group with 1 to 4 carbons substituted by a hydroxyl group, or the alkoxy group with 1 to 4 carbons substituted with a carboxyl group, preferably a sulfo group, a carboxyl group or a hydroxyl group, q 1 represents 0 to 4 Integer preferably represents 0 or 1, q 2 represents an integer from 0 to 6, preferably represents 0 or 1. M represents hydrogen, metal ion or ammonium ion, n 1 and n 2 represent independently An integer from 0 to 3, preferably represents 0 or 1. In each formula, * represents the bonding position of the azo bond.)

上述式(1)中之A2、A3及A4係分別獨立地為可具有取代基之苯基或可具有取代基之萘基。「可具有取代基之苯基」或「可具有取代基之萘基」中之「取代基」並無特別限制,可與上述A1中之「可具有取代基之苯基」、「可具有取代基之萘基」及「可具有取代基之雜環基」中之以「取代基」所例示之取代基為相同。 A 2 , A 3 and A 4 in the above formula (1) are each independently an optionally substituted phenyl group or an optionally substituted naphthyl group. The "substituent group" in "substitutable phenyl group" or "substitutable naphthyl group" is not particularly limited, and it can be compared with "substitutable phenyl group" and "substitutable group" in A 1 above. The substituents exemplified by the "substituent" in the "substituent naphthyl group" and the "substitutable heterocyclic group" are the same.

上述式(1)中之A2、A3、及A4係分別獨立地為以下述式(2)或式(3)表示,為了獲得廣帶域的偏光元件,較佳係A2、A3、及A4之至少1個為式(2)所示者。 A 2 , A 3 , and A 4 in the above formula (1) are each independently represented by the following formula (2) or formula (3). In order to obtain a wide-band polarizing element, A 2 , A At least one of 3 and A 4 is represented by formula (2).

Figure 109122608-A0202-12-0017-12
Figure 109122608-A0202-12-0017-12

Figure 109122608-A0202-12-0017-13
Figure 109122608-A0202-12-0017-13

上述式(2)中,R2係表示羥基、碳數1至4之脂肪族烴基、碳數1至4之烷氧基、取代或非取代之胺基或以磺基取代的碳數1至4之烷氧基,m2係表示0至6之整數。M係表示氫、金屬離子或銨離子,n3係表示0至2之整數。碳數1至4之脂肪族烴基、碳數1至4之烷氧基、取代或非取代之胺基、以磺基取代之碳數1至4之烷氧基、及M係可分別與式(1)為相同。 In the above formula (2), R 2 represents a hydroxyl group, an aliphatic hydrocarbon group with 1 to 4 carbons, an alkoxy group with 1 to 4 carbons, a substituted or unsubstituted amine group, or a sulfo group substituted with a carbon number of 1 to 4 is an alkoxy group, m 2 represents an integer from 0 to 6. M represents hydrogen, metal ion or ammonium ion, and n 3 represents an integer from 0 to 2. Aliphatic hydrocarbon groups with 1 to 4 carbons, alkoxy groups with 1 to 4 carbons, substituted or unsubstituted amine groups, alkoxy groups with 1 to 4 carbons substituted with sulfo groups, and M series can be respectively combined with the formula (1) is the same.

上述式(2)中,m2係以0至4為較佳,以0至2為再更佳,以0或1為特佳。又,m2為1以上時,R2係以羥基為較佳。n3係以0或1為較佳,以1為再更佳。在式(1)中,R2之取代位置若以A1側之與偶氮基的鍵結位置設為1位,以2位、3位、 5位或8位為較佳。具體而言,以2位及3位之任一者被甲氧基取代者為較佳,以3位被甲氧基取代者更佳。又,5位或8位係以被羥基取代為較佳。上述式(1)中,A3或A4具有上述式(2)所示之構造時,為廣帶域且發揮高的偏光度之偏光功能,故為較佳,具體而言,k=0之時,較佳係A3具有式(2)之構造,k=1之時,較佳係A4具有式(2)之構造。 In the above formula (2), m 2 is preferably 0 to 4, more preferably 0 to 2, and particularly preferably 0 or 1. In addition, when m 2 is 1 or more, R 2 is preferably a hydroxyl group. For n 3 , 0 or 1 is preferred, and 1 is even more preferred. In formula (1), if the substitution position of R 2 is set to the 1 position with the bonding position of the A 1 side to the azo group, the 2 position, the 3 position, the 5 position or the 8 position are preferred. Specifically, it is preferable that either the 2-position or the 3-position is substituted by a methoxy group, and the 3-position is more preferable that it is substituted by a methoxy group. In addition, the 5-position or 8-position is preferably substituted by a hydroxyl group. In the above formula (1), when A 3 or A 4 has the structure shown in the above formula (2), it is a wide-band region and exhibits a polarization function with a high degree of polarization, so it is preferable. Specifically, k=0 At this time, it is preferable that A 3 has the structure of formula (2), and when k=1, it is preferable that A 4 has the structure of formula (2).

上述式(3)中,R3及R4係分別獨立地表示氫原子、碳數1至4之脂肪族烴基、碳數1至4之烷氧基、以羥基取代之碳數1至4的烷氧基或以磺基取代之碳數1至4的烷氧基。碳數1至4之脂肪族烴基、碳數1至4之烷氧基、以羥基取代之碳數1至4的烷氧基、及以磺基取代之碳數1至4之烷氧基係分別與式(1)為相同。上述式(1)中,A3或A4具有式(3)所示之構造,且R3或R4分別獨立地為氫原子或碳數1至4之烷氧基時,較佳係分別獨立地為甲氧基或乙氧基之時,特佳係R3及R4為甲氧基之時,為廣帶域且發揮具有高的偏光度之偏光功能,故為較佳。具體而言,k=0之時,較佳係A3具有式(3)之構造,且R3及R4為甲氧基,k=1之時,較佳係A4具有式(3)之構造,且R3及R4為甲氧基。 In the above formula (3), R 3 and R 4 each independently represent a hydrogen atom, an aliphatic hydrocarbon group with 1 to 4 carbons, an alkoxy group with 1 to 4 carbons, and a carbon 1 to 4 substituted with a hydroxyl group. An alkoxy group or an alkoxy group having 1 to 4 carbons substituted with a sulfo group. Aliphatic hydrocarbon groups with 1 to 4 carbons, alkoxy groups with 1 to 4 carbons, alkoxy groups with 1 to 4 carbons substituted with hydroxyl groups, and alkoxy groups with 1 to 4 carbons substituted with sulfo groups They are the same as formula (1) respectively. In the above formula (1), when A 3 or A 4 has the structure shown in formula (3), and R 3 or R 4 are each independently a hydrogen atom or an alkoxy group with 1 to 4 carbon atoms, they are preferably respectively When independently being a methoxy group or an ethoxy group, it is particularly preferable that when R 3 and R 4 are a methoxy group, it is a wide band and exhibits a polarization function with a high degree of polarization. Specifically, when k=0, it is preferable that A 3 has the structure of formula (3), and R 3 and R 4 are methoxy groups, and when k=1, it is preferable that A 4 has the formula (3) , And R 3 and R 4 are methoxy groups.

上述式(1)中之R1係氫原子、羥基、碳數1至4之烷氧基、或取代或非取代之胺基。R1係以氫原子或羥基為較佳,以羥基為更佳。R1之取代位置係以環a之羥基作為1位時,以5位為較佳。 R 1 in the above formula (1) is a hydrogen atom, a hydroxyl group, an alkoxy group having 1 to 4 carbon atoms, or a substituted or unsubstituted amine group. R 1 is preferably a hydrogen atom or a hydroxyl group, more preferably a hydroxyl group. When the substitution position of R 1 is based on the hydroxyl group of ring a as the 1-position, the 5-position is preferred.

上述式(1)中之M係表示氫、金屬離子或銨離子。金屬離子係可列舉例如,鋰離子、鈉離子、鉀離子等之鹼金屬離子、鈣離子、鎂離子等之鹼土金屬離子等。銨離子係可列舉例如,銨離子、甲基銨離子、二甲基銨離子、三乙基銨離子、四乙基銨離子、四-正丙基銨離子、四-正丁基銨離子、三乙醇銨離子等。 更具體而言,例如,M為氫之時,表示磺酸(-SO3H),M為鈉離子時,表示磺酸鈉(-SO3Na),M為銨離子時,表示磺酸銨(-SO3NH4)。 M in the above formula (1) represents hydrogen, metal ion or ammonium ion. Examples of the metal ion system include alkali metal ions such as lithium ion, sodium ion, and potassium ion, and alkaline earth metal ions such as calcium ion and magnesium ion. The ammonium ion system includes, for example, ammonium ion, methylammonium ion, dimethylammonium ion, triethylammonium ion, tetraethylammonium ion, tetra-n-propylammonium ion, tetra-n-butylammonium ion, and triethylammonium ion. Ethanol ammonium ion and so on. More specifically, for example, when M is hydrogen, it means sulfonic acid (-SO 3 H), when M is sodium ion, it means sodium sulfonate (-SO 3 Na), and when M is ammonium ion, it means ammonium sulfonate. (-SO 3 NH 4 ).

上述式(1)中之環a及環b的氫原子係可以上述取代基(R1)、及/或上述取代基(-SO3M)取代。 The hydrogen atom system of the ring a and the ring b in the above formula (1) may be substituted with the above substituent (R 1 ) and/or the above substituent (-SO 3 M).

上述式(1)中之環a及環b較佳係任一者或兩者以磺基取代。又,亦較佳係環b以羥基取代。其中,以環a之偶氮鍵結部位作為1位時,在逆時針旋轉,2位以羥基取代且3位及7位以磺基取代之環構造、4位以磺基取代之環構造、2位以羥基取代且4位以磺基取代之環構造、或7位以磺基取代之環構造為特佳。 It is preferable that either or both of ring a and ring b in the above formula (1) are substituted with a sulfo group. Furthermore, it is also preferable that ring b is substituted with a hydroxyl group. Among them, when the azo bonding site of ring a is used as the 1-position, it rotates counterclockwise, the 2-position is substituted with a hydroxyl group and the 3-position and 7-position are substituted with a sulfo group, and the 4-position is substituted with a sulfo group. A ring structure in which the 2-position is substituted with a hydroxyl group and the 4-position is substituted with a sulfo group, or a ring structure in which the 7-position is substituted with a sulfo group is particularly preferred.

上述式(1)所示之偶氮化合物特佳係下述式(4)所示之化合物。 The azo compound represented by the above formula (1) is particularly preferably a compound represented by the following formula (4).

Figure 109122608-A0202-12-0019-14
Figure 109122608-A0202-12-0019-14

上述式(4)中,A1至A4、M、n、k、環a、及環b係分別與上述式(1)為相同。上述式(1)所示之偶氮化合物之中,上述式(4)所示之化合物係進一步為廣帶域、且發揮具有高偏光度之近紅外線區域偏光功能,故為較佳。 In the above formula (4), A 1 to A 4 , M, n, k, ring a, and ring b are the same as the above formula (1), respectively. Among the azo compounds represented by the above formula (1), the compound represented by the above formula (4) has a wider band and exhibits a near-infrared region polarization function with a high degree of polarization, so it is preferable.

將上述式(1)所示之偶氮化合物之具體例列舉於以下。又,式中之磺基、羧基及羥基係以游離酸之形態表示,但在上述式(1)所示之偶氮化合物亦包含下述列舉之化合物的鹽。 Specific examples of the azo compound represented by the above formula (1) are listed below. In addition, the sulfo group, carboxyl group, and hydroxyl group in the formula are expressed in the form of free acid, but the azo compound represented by the above formula (1) also includes the salts of the compounds listed below.

Figure 109122608-A0202-12-0020-15
Figure 109122608-A0202-12-0020-15

Figure 109122608-A0202-12-0020-16
Figure 109122608-A0202-12-0020-16

Figure 109122608-A0202-12-0020-17
Figure 109122608-A0202-12-0020-17

Figure 109122608-A0202-12-0020-18
Figure 109122608-A0202-12-0020-18

Figure 109122608-A0202-12-0020-19
Figure 109122608-A0202-12-0020-19

Figure 109122608-A0202-12-0020-20
Figure 109122608-A0202-12-0020-20

Figure 109122608-A0202-12-0020-21
Figure 109122608-A0202-12-0020-21

Figure 109122608-A0202-12-0021-22
Figure 109122608-A0202-12-0021-22

Figure 109122608-A0202-12-0021-23
Figure 109122608-A0202-12-0021-23

Figure 109122608-A0202-12-0021-24
Figure 109122608-A0202-12-0021-24

Figure 109122608-A0202-12-0021-86
Figure 109122608-A0202-12-0021-86

Figure 109122608-A0202-12-0021-35
Figure 109122608-A0202-12-0021-35

Figure 109122608-A0202-12-0021-27
Figure 109122608-A0202-12-0021-27

Figure 109122608-A0202-12-0021-28
Figure 109122608-A0202-12-0021-28

Figure 109122608-A0202-12-0022-29
Figure 109122608-A0202-12-0022-29

Figure 109122608-A0202-12-0022-30
Figure 109122608-A0202-12-0022-30

Figure 109122608-A0202-12-0022-31
Figure 109122608-A0202-12-0022-31

Figure 109122608-A0202-12-0022-32
Figure 109122608-A0202-12-0022-32

Figure 109122608-A0202-12-0023-36
Figure 109122608-A0202-12-0023-36

Figure 109122608-A0202-12-0023-37
Figure 109122608-A0202-12-0023-37

Figure 109122608-A0202-12-0023-38
Figure 109122608-A0202-12-0023-38

Figure 109122608-A0202-12-0023-39
Figure 109122608-A0202-12-0023-39

Figure 109122608-A0202-12-0023-40
Figure 109122608-A0202-12-0023-40

Figure 109122608-A0202-12-0023-41
Figure 109122608-A0202-12-0023-41

Figure 109122608-A0202-12-0023-42
Figure 109122608-A0202-12-0023-42

Figure 109122608-A0202-12-0024-43
Figure 109122608-A0202-12-0024-43

Figure 109122608-A0202-12-0024-44
Figure 109122608-A0202-12-0024-44

Figure 109122608-A0202-12-0024-45
Figure 109122608-A0202-12-0024-45

Figure 109122608-A0202-12-0024-46
Figure 109122608-A0202-12-0024-46

Figure 109122608-A0202-12-0024-47
Figure 109122608-A0202-12-0024-47

Figure 109122608-A0202-12-0024-48
Figure 109122608-A0202-12-0024-48

Figure 109122608-A0202-12-0024-49
Figure 109122608-A0202-12-0024-49

Figure 109122608-A0202-12-0025-50
Figure 109122608-A0202-12-0025-50

Figure 109122608-A0202-12-0025-51
Figure 109122608-A0202-12-0025-51

Figure 109122608-A0202-12-0025-52
Figure 109122608-A0202-12-0025-52

Figure 109122608-A0202-12-0025-53
Figure 109122608-A0202-12-0025-53

Figure 109122608-A0202-12-0025-54
Figure 109122608-A0202-12-0025-54

Figure 109122608-A0202-12-0026-55
Figure 109122608-A0202-12-0026-55

Figure 109122608-A0202-12-0026-56
Figure 109122608-A0202-12-0026-56

Figure 109122608-A0202-12-0026-57
Figure 109122608-A0202-12-0026-57

Figure 109122608-A0202-12-0026-58
Figure 109122608-A0202-12-0026-58

上述式(1)所示之偶氮化合物或其鹽係例如,可依據如非專利文獻1記載之通常的偶氮染料之製造方法,藉由進行重氮基化及偶合化來製造。 The azo compound represented by the above formula (1) or a salt thereof can be produced, for example, by performing diazolation and coupling in accordance with the usual production method of azo dyes as described in Non-Patent Document 1.

就具體的製造方法之一例而言,以下述述在上述式(1)中將k=0之化合物之製造方法。 As an example of a specific manufacturing method, the manufacturing method of the compound in which k=0 in the above-mentioned formula (1) is described as follows.

使下述式(A)所示之胺基萘類進行重氮基化,與下述式(B)所示之胺基萘類或苯胺類一次偶合化,獲得下述式(C)所示之單偶氮胺基化合物。使該單偶氮胺基化合物(C)進行重氮基化,與下述式(D)所示之胺基萘類或苯胺類二次偶合化,獲得下述式(E)所示之雙偶氮胺基化合物。使該雙偶氮胺基化合物(E)進行重氮基化,藉由與下述式(F)之萘酚類三次偶合化,獲得上述式(1)之偶氮化合物。 The amino naphthalenes represented by the following formula (A) are diazotized, and the amino naphthalenes represented by the following formula (B) or anilines are coupled once to obtain the following formula (C) The single azoamine-based compound. The monoazoamine compound (C) is diazolated, and the amino naphthalenes or anilines represented by the following formula (D) are coupled to each other to obtain the double compound represented by the following formula (E) Azoamine-based compounds. The bisazoamine compound (E) is diazolated, and the azo compound of the above formula (1) is obtained by three-time coupling with the naphthol of the following formula (F).

Figure 109122608-A0202-12-0027-60
Figure 109122608-A0202-12-0027-60

在上述製造方法中,重氮基化步驟較佳係依據在重氮基成分之鹽酸、硫酸等之無機酸水溶液或懸浮液中混合亞硝酸鈉等之亞硝酸鹽之順序法,或在重氮基成分之中性或弱鹼性的水溶液中預先加入亞硝酸鹽,藉由將此與無機酸混合之逆序法而進行。重氮基化之溫度係以-10至40℃為適當。又,與胺基萘類或苯胺類之偶合化較佳係將鹽酸、乙酸等之酸性水溶液與上述各重氮基液混合,在-10至40℃之溫度以pH2至7之酸性條件進行。 In the above manufacturing method, the diazolation step is preferably based on the sequential method of mixing nitrite such as sodium nitrite in an aqueous solution or suspension of an inorganic acid such as hydrochloric acid, sulfuric acid, etc., or a diazonium Nitrite is added to a neutral or weakly alkaline aqueous solution of the base component in advance, and this is performed by the reverse order method of mixing this with an inorganic acid. The appropriate temperature for diazotization is -10 to 40°C. In addition, the coupling with aminonaphthalenes or anilines is preferably performed by mixing acidic aqueous solutions of hydrochloric acid, acetic acid, etc., with each of the above-mentioned diazonium-based liquids, and performing acidic conditions of pH 2 to 7 at a temperature of -10 to 40°C.

進行偶合化所得到之上述式(C)及式(E)的偶氮化合物係直接進行濾過,或藉由酸析或鹽析使其析出並濾過而取出,或亦可直接以溶液或懸浮液進入下列之步驟。重氮鎓鹽為難溶性且成為懸浮液時亦可進行濾過,形成擠壓濾餅而在下列之偶合化步驟使用。 The azo compound of formula (C) and formula (E) obtained by coupling is directly filtered, or precipitated and filtered by acid precipitation or salting out, and then taken out, or directly as a solution or suspension Go to the following steps. The diazonium salt is poorly soluble and can be filtered when it becomes a suspension to form an extruded filter cake and used in the following coupling step.

上述式(E)之雙偶氮胺基化合物之重氮基化物、與上述式(F)所示之萘酚類的三次偶合化反應,較佳係在-10至40℃之溫度從pH7至10之中性以鹼性條件進行。反應終止後,較佳係藉由鹽析使所得到之式(1)的偶氮化合物或鹽析出並濾過而取出。又,必須精製時,只要重複鹽析或使用有機溶劑而從水中析出即可。使用於精製之有機溶劑係可列舉例如,甲醇、乙醇等之醇類、丙酮等之酮類等的水溶性有機溶劑。 The third coupling reaction of the diazonium compound of the bisazoamine compound of the above formula (E) with the naphthol represented by the above formula (F) is preferably at a temperature of -10 to 40°C from pH 7 to 10 Neutrality is carried out under alkaline conditions. After the reaction is terminated, the obtained azo compound or salt of the formula (1) is preferably precipitated by salting out and filtered to be taken out. In addition, when purification is necessary, it is only necessary to repeat salting out or use an organic solvent to precipitate from water. The organic solvent used for the purification includes, for example, water-soluble organic solvents such as alcohols such as methanol and ethanol, and ketones such as acetone.

式(1)所示之近紅外線吸收染料或其鹽係可用來作為偏光元件用之染料,在近紅外線區域中具有高的偏光功能,藉由與後述之其他的構成要素組合,可提供具有耐濕性/耐熱性/耐光性之高性能的染料系近紅外線區域偏光板。 The near-infrared absorbing dye represented by formula (1) or its salt can be used as a dye for polarizing elements. It has a high polarizing function in the near-infrared region. By combining with other constituent elements described later, it can provide A high-performance dye-based polarizing plate in the near-infrared region of moisture/heat resistance/light resistance.

(其他之有機染料) (Other organic dyes)

在本發明之實施型態中,偏光元件係除了近紅外線吸收染料,可含有在可見光區域具有偏光性能之其他的有機染料。藉此,例如,不僅可實現紅外線光區域,亦可實現至可見光區域為止可控制之中性灰色(neutral gray)的染料系偏光板。在此,「中性灰色」係意指使2片之偏光元件以其定向方向為互相正交之方式重疊的狀態時,在可見光區域及近紅外線區域中之特定波長、或全波長中光洩漏(顏色洩漏)少。在本說明書中,在可見光區域具有偏光性能之其他之染料有時僅簡稱為其他之有機染料。 In the embodiment of the present invention, in addition to the near-infrared absorbing dye, the polarizing element may contain other organic dyes that have polarizing properties in the visible light region. In this way, for example, it is possible to realize not only the infrared light region but also the dye-based polarizing plate capable of controlling neutral gray up to the visible light region. Here, "neutral gray" means that when two polarizing elements are overlapped with their orientation directions orthogonal to each other, the light leaks at a specific wavelength in the visible light region and the near-infrared region, or in the full wavelength ( Color leakage) is less. In this specification, other dyes with polarization properties in the visible light region are sometimes simply referred to as other organic dyes.

其他之有機染料並無特別限制,但較佳係在與式(1)所示之偶氮化合物或其鹽之吸收波長區域為相異之波長區域具有二色性之染料,且其二色性高之染料。如此之有機染料係可列舉例如,C.I.Direct Yellow 12、C.I.Direct Yellow 28、C.I.Direct Yellow 44、C.I.Direct Orange 26、C.I.Direct Orange 39、C.I.Direct Orange 71、C.I.Direct Orange 107、C.I.Direct Red 2、C.I.Direct Red 31、C.I.Direct Red 79、C.I.Direct Red 81、C.I.Direct Red 247、C.I.Direct Blue 69、C.I.Direct Blue 78、C.I.Direct Blue 247、C.I.Direct Green 80、及C.I.Direct Green 59等為代表例。此等之有機染料係可作為游離酸、或作為鹼金屬鹽(例如Na鹽、K鹽、Li鹽)、銨鹽、或胺類之鹽而包含於偏光元件中。 Other organic dyes are not particularly limited, but they are preferably dyes that have dichroism in a wavelength region different from the absorption wavelength region of the azo compound or its salt represented by formula (1), and its dichroism High dyes. Such organic dyes include, for example, CIDirect Yellow 12, CIDirect Yellow 28, CIDirect Yellow 44, CIDirect Orange 26, CIDirect Orange 39, CIDirect Orange 71, CIDirect Orange 107, CIDirect Red 2, CI Direct Red 31, CIDirect Red 79, CIDirect Red 81, CIDirect Red 247, CIDirect Blue 69, CIDirect Blue 78, CIDirect Blue 247, CIDirect Green 80, and CIDirect Green 59 are representative examples. These organic dyes can be included in the polarizing element as a free acid, or as an alkali metal salt (such as Na salt, K salt, Li salt), ammonium salt, or amine salt.

包含近紅外線吸收染料以及其他之有機染料的偏光板係目的之偏光板為中性灰色之偏光板、液晶投影機用彩色偏光板、其他之各色彩色偏光 板。因而,所含之其他的有機染料之種類為相異。其他之有機染料的調配比例並無特別限定,但以式(1)所示之近紅外線吸收染料之質量作為100時,一種或複數種之其他的有機染料之合計以0.1至10為較佳。 Polarizers containing near-infrared absorbing dyes and other organic dyes. The purpose of the polarizer is a neutral gray polarizer, a color polarizer for liquid crystal projectors, and other color polarizers of various colors. board. Therefore, the types of other organic dyes contained are different. The blending ratio of other organic dyes is not particularly limited, but when the mass of the near-infrared absorbing dye represented by formula (1) is taken as 100, the total of one or more other organic dyes is preferably 0.1-10.

在近紅外線區域具有偏光功能之中性灰色之偏光板時,較佳係以所得到之偏光板的可見光區域中之顏色洩漏變少之方式,調整吸收紅外線區域之光的近紅外線吸收染料及其他之有機染料的種類及其調配比例。 In the case of a neutral gray polarizer with a polarization function in the near-infrared region, it is better to adjust the near-infrared absorbing dye and others that absorb light in the infrared region so that the color leakage in the visible light region of the obtained polarizer is reduced The types of organic dyes and their blending ratios.

(親水性高分子膜及偏光元件) (Hydrophilic polymer film and polarizing element)

在本發明之實施型態中,偏光元件係以親水性高分子膜所構成,而該親水性高分子膜係含有上述之近紅外線吸收染料及以任意選擇之其他的有機染料(以下,係有時簡稱為近紅外線吸收染料等)並進行定向。 In the embodiment of the present invention, the polarizing element is composed of a hydrophilic polymer film, and the hydrophilic polymer film contains the above-mentioned near-infrared absorbing dye and optionally other organic dyes (hereinafter, there are Sometimes referred to as near-infrared absorbing dyes, etc.) and oriented.

「親水性高分子膜」係指與水之親和性高的膜,通常,係指使之浸漬於水或接觸水時,吸收水並膨潤之膜,較佳之實施型態係利用該特性,使之含有近紅外線吸收染料等,或使其定向。親水性高分子膜並無特別限定,但可列舉例如,聚乙烯醇樹脂、直鏈澱粉樹脂、澱粉樹脂、纖維素樹脂、聚丙烯酸鹽樹脂、或此等之衍生物所構成之膜。在本案說明書中,所謂「衍生物」係意指在上述之樹脂使特有之基本骨架設為共通,但在其以外之構造的點,加上一些修飾之樹脂。聚乙烯醇等之上述樹脂的衍生物係可列舉使上述之樹脂以乙烯、丙烯等之烯烴、或巴豆酸、丙烯酸、甲基丙烯酸、馬來酸等之不飽和羧酸等改質之樹脂。 "Hydrophilic polymer membrane" refers to a membrane that has a high affinity for water. Generally, it refers to a membrane that absorbs water and swells when it is immersed in or in contact with water. The preferred embodiment uses this characteristic to make it Contains near-infrared absorbing dyes, etc., or makes them oriented. The hydrophilic polymer film is not particularly limited, but examples thereof include films composed of polyvinyl alcohol resin, amylose resin, starch resin, cellulose resin, polyacrylate resin, or derivatives thereof. In the specification of the present case, the so-called "derivative" means that the above-mentioned resin makes the unique basic skeleton common, but at the point of other structures, some modified resins are added. Derivatives of the above-mentioned resins such as polyvinyl alcohol include resins modified with olefins such as ethylene and propylene, or unsaturated carboxylic acids such as crotonic acid, acrylic acid, methacrylic acid, and maleic acid.

從近紅外線吸收染料等之吸附性及定向性之觀點而言,以由聚乙烯醇樹脂或其衍生物所構成之膜為最佳。 From the viewpoint of the adsorption and orientation properties of near-infrared absorbing dyes, etc., a film composed of polyvinyl alcohol resin or its derivatives is the most preferred.

在如高溫高濕之嚴苛的狀況下,為了保持近紅外線吸收染料等經定向之狀態,並維持偏光特性,較佳係以親水性高分子膜具有交聯構造之樹脂所構成。因 此,本發明之較佳的實施型態,偏光元件係以在上述樹脂以硼酸或硼砂等之硼化合物經交聯處理而成的親水性高分子膜所構成。又,具有如此之交聯構造的偏光元件、及具有後述之a)的特性之基板之組合係本發明之特佳的實施型態。 Under severe conditions such as high temperature and high humidity, in order to maintain the oriented state of near-infrared absorbing dyes and the like and maintain the polarization characteristics, it is preferable to be composed of a resin with a cross-linked structure of a hydrophilic polymer film. because Therefore, in a preferred embodiment of the present invention, the polarizing element is composed of a hydrophilic polymer film formed by cross-linking the above resin with a boron compound such as boric acid or borax. In addition, the combination of a polarizing element having such a cross-linked structure and a substrate having the characteristics of a) described later is a particularly preferred embodiment of the present invention.

親水性高分子之膜的厚度並非限定者,但通常為10至100μm,較佳係25至80μm左右。 The thickness of the hydrophilic polymer film is not limited, but is usually 10 to 100 μm, preferably about 25 to 80 μm.

在本發明之實施型態中,偏光元件係在親水性高分子膜含有近紅外線吸收染料等,藉由使該親水性高分子膜進行延伸,使親水性高分子及在親水性高分子中所含有的染料定向,而顯現近紅外線區域及以任意選擇之可見光區域的吸收之各向異性(所謂之二色性)來獲得。 In the embodiment of the present invention, the polarizing element is a hydrophilic polymer film containing near-infrared absorbing dyes, etc., by extending the hydrophilic polymer film, the hydrophilic polymer and the hydrophilic polymer The dye contained is oriented to express the anisotropy of absorption in the near-infrared region and the arbitrarily selected visible light region (so-called dichroism).

含有近紅外線吸收染料等之親水性高分子膜係例如,使聚乙烯醇系膜等之親水性高分子膜在溫水等膨潤之後,相對於水1000重量份可含有近紅外線吸收染料等0.001至10質量部之水溶液中,藉由使其膨潤而成的膜進行浸漬來製作。含有近紅外線吸收染料等之水溶液係可依需要而含有染色助劑,例如,可以0.1至10質量%左右之濃度含有芒硝。在染浴中浸漬膜之時間係例如為1至10分鐘左右。染色溫度較佳係30至80℃左右。 Hydrophilic polymer films containing near-infrared absorbing dyes, etc. For example, after swelling a hydrophilic polymer film such as polyvinyl alcohol-based films in warm water, it may contain 0.001 to 0.001 to 1000 parts by weight of water, such as near-infrared absorbing dyes. It is produced by immersing a film formed by swelling it in an aqueous solution of 10 parts by mass. The aqueous solution containing near-infrared absorbing dyes and the like may contain dyeing auxiliary agents as needed, for example, Glauber's salt may be contained in a concentration of about 0.1 to 10% by mass. The time for immersing the film in the dye bath is, for example, about 1 to 10 minutes. The dyeing temperature is preferably about 30 to 80°C.

含有近紅外線吸收染料等之親水性高分子膜係亦可在親水性高分子預先含有近紅外線吸收染料,並使含有該近紅外線吸收染料之親水性高分子形成為膜而製作。例如,將聚乙烯醇溶解於水中8至12質量%之水溶液中,該水溶液之固體成分中以0.01至10質量%之濃度含有近紅外線吸收染料等,將該水溶液澆鑄製膜,使作為溶劑之水蒸發,藉此,可獲得含有近紅外線吸收染料等之親水性高分子膜。 A hydrophilic polymer film containing a near-infrared absorbing dye or the like can also be produced by preliminarily containing a near-infrared absorbing dye in a hydrophilic polymer, and forming a hydrophilic polymer containing the near-infrared absorbing dye into a film. For example, polyvinyl alcohol is dissolved in an aqueous solution of 8 to 12% by mass in water, and the solid content of the aqueous solution contains near-infrared absorbing dyes at a concentration of 0.01 to 10% by mass, and the aqueous solution is cast into a film to be used as a solvent. The water evaporates, whereby a hydrophilic polymer film containing near-infrared absorbing dyes and the like can be obtained.

要使親水性高分子膜中之近紅外線吸收染料等定向而獲得偏光元件,通常係將含有近紅外線吸收染料等之膜進行延伸之延伸方法,例如可為濕式法、乾式法等之任意公知的方法。將以濕式法含有近紅外線吸收染料等之親水性高分子膜進行延伸時,例如,放入包含硼酸或硼砂等之硼化合物的液體之槽中朝一軸方向延伸至2至9倍,然後,使其乾燥,藉此,獲得偏光元件。 In order to align the near-infrared absorbing dyes in the hydrophilic polymer film to obtain a polarizing element, the film containing near-infrared absorbing dyes etc. is usually stretched. For example, it can be any well-known method such as wet method and dry method. Methods. When a hydrophilic polymer film containing near-infrared absorbing dyes and the like is stretched by a wet method, for example, it is placed in a tank of a liquid containing a boron compound such as boric acid or borax and stretched in the uniaxial direction up to 2 to 9 times, and then, It was dried, thereby obtaining a polarizing element.

以硼化合物進行的處理一般係以提高染料系偏光元件之光穿透率及偏光度之目的來進行,但如後述,在經如此處理的親水性高分子膜,近紅外線吸收染料等可在高溫高濕之環境下以硼酸或硼砂等之硼化合物維持交聯,故可利用硼化合物之含量作為與親水性高分子膜一起維持近紅外線吸收染料之定向的指標。 The treatment with boron compound is generally performed for the purpose of increasing the light transmittance and polarization of the dye-based polarizing element. However, as described later, in the hydrophilic polymer film treated in this way, near-infrared absorbing dyes, etc. can be used at high temperatures. In a high-humidity environment, a boron compound such as boric acid or borax is used to maintain crosslinking. Therefore, the content of the boron compound can be used as an index to maintain the orientation of the near-infrared absorbing dye together with the hydrophilic polymer film.

以硼酸、硼砂等之硼化合物進行處理之條件係依據所使用之親水性高分子膜之種類或所使用之近紅外線吸收染料的種類而異,但例如,由聚乙烯醇所構成之膜時,使水溶液中之硼化合物之濃度(硼酸換算值)設為0.1至10質量%,較佳係設為0.5至7質量%之範圍,特佳係設為1至5質量%。延伸處理係例如在30至80℃,較佳係在40至75℃之溫度範圍,例如,浸漬0.5至10分鐘而朝單軸方向延伸至2至9倍。處理步驟之pH若為5至9,可成為使用近紅外線吸收染料等之偏光元件之具有偏光功能的波長域之廣帶域化,但更佳係可列舉6.5至8.5,特佳係6.0至8.0為一個較佳的型態。 The conditions for treatment with boron compounds such as boric acid and borax vary depending on the type of hydrophilic polymer film used or the type of near-infrared absorbing dye used, but for example, in the case of a film made of polyvinyl alcohol, The concentration of the boron compound (in terms of boric acid) in the aqueous solution is set to 0.1 to 10% by mass, preferably 0.5 to 7% by mass, and particularly preferably 1 to 5% by mass. The stretching treatment is, for example, in the temperature range of 30 to 80°C, preferably 40 to 75°C, for example, immersing for 0.5 to 10 minutes to extend in the uniaxial direction to 2 to 9 times. If the pH of the treatment step is 5 to 9, it can become a wide band of the wavelength range with the polarization function of the polarizing element using near-infrared absorbing dyes, etc., but more preferably 6.5 to 8.5, particularly preferably 6.0 to 8.0 It is a better type.

將處理時之水溶液,特別是含有硼酸之水溶液的pH調整至6至9之方法,較佳係添加氫氧化鈉、氫氧化鉀、硼砂等之鹼性物質而進行處理。又,使用硼砂時,可併用硼酸與硼砂。依需要,進一步可以包含陽離子系高分子化合物之水溶液合併進行固定處理。上述延伸處理係可以1段進行,亦可以2段以上之多段處理進行。 The method of adjusting the pH of the aqueous solution during the treatment, especially the aqueous solution containing boric acid, to 6 to 9, preferably by adding alkaline substances such as sodium hydroxide, potassium hydroxide, borax and the like for treatment. In addition, when borax is used, boric acid and borax can be used in combination. If necessary, an aqueous solution containing a cationic polymer compound may be combined and subjected to a fixation treatment. The above-mentioned extension treatment can be carried out in one stage or in multiple stages of two or more stages.

親水性高分子膜之延伸視情況可在染色之前進行。此時,在染色之段階進行水溶性染料之定向。以硼化合物進行之處理係可在上述延伸步驟之後進行。此時,延伸步驟係只要在不含硼化合物之液體(例如水)中進行即可。 The extension of the hydrophilic polymer membrane can be carried out before dyeing as the case may be. At this time, the orientation of the water-soluble dye is carried out in the stage of dyeing. The treatment with the boron compound can be carried out after the above-mentioned extension step. In this case, the extension step may be carried out in a liquid (for example, water) that does not contain a boron compound.

偏光元件之性能能以近紅外線吸收染料等之含量、近紅外線吸收染料等之二色性、延伸時的延伸倍率等進行調整。 The performance of the polarizing element can be adjusted by the content of the near-infrared absorbing dye, the dichroism of the near-infrared absorbing dye, and the stretching ratio during stretching.

上述延伸處理可為乾式延伸法。乾式延伸係對膜施加熱,藉由其熱而變柔軟之狀態時,將膜進行延伸者。乾式延伸法之情形,係可以大氣(空氣)或氮等之氣體作為延伸加熱介質而延伸,溫度較佳係親水性高分子膜之玻璃轉移溫度或融點等考量加工性而依照構成膜之樹脂的種類在常溫至200℃進行延伸。又,濕度較佳係在0至95%RH之環境的任意環境下進行處理。加熱方法係可列舉例如,輥間區域延伸法、輥加熱延伸法、壓延伸法、紅外線線加熱延伸法等,但熱傳導至膜,若可延伸,不限定於此等。延伸倍率係以2倍至9倍為較佳,但只要考量各樹脂之可延伸的倍率、及、可使染料定向的延伸倍率而進行調整即可。延伸處理係可以1段進行處理,亦可以2段以上之多段進行處理。 The above-mentioned stretching treatment may be a dry stretching method. Dry stretching means applying heat to the film and stretching the film when it becomes soft by the heat. In the case of the dry stretching method, air (air) or nitrogen can be used as the stretching heating medium for stretching. The temperature is preferably the glass transition temperature or melting point of the hydrophilic polymer film, and the processability is considered according to the resin constituting the film. The types of spores are extended at room temperature to 200°C. In addition, the humidity is preferably processed in any environment of 0 to 95% RH. The heating method includes, for example, an inter-roll zone stretching method, a roll heating stretching method, a pressure stretching method, an infrared ray heating stretching method, etc. However, heat is conducted to the film, and if stretching is possible, it is not limited to these. The stretch magnification is preferably 2 to 9 times, but it may be adjusted by considering the stretchable magnification of each resin and the stretch magnification that can be used to align the dye. The extension process can be processed in one stage or in multiple stages of two or more stages.

(基板) (Substrate)

偏光板係具備上述偏光元件、及積層於偏光元件之基板。在本發明之實施型態中,偏光板其特徵係具備具有下述a)或b),較佳係a)及b)之特性之基板。 The polarizing plate includes the above-mentioned polarizing element and a substrate laminated on the polarizing element. In the embodiment of the present invention, the polarizing plate is characterized by having a substrate with the following a) or b), preferably a) and b).

a)親水性高分子膜包含硼化合物時,使偏光板在相對濕度90%RH、80℃之環境下曝露1000小時之後,以該曝露前作為100%,保持親水性高分子膜中所含的硼化合物之質量20%以上。 a) When the hydrophilic polymer film contains a boron compound, after exposing the polarizer to an environment with a relative humidity of 90%RH and 80°C for 1000 hours, use 100% before the exposure to maintain the content of the hydrophilic polymer film. The mass of boron compound is more than 20%.

b)依據JIS Z 0208透濕度試驗所得之該基板在相對濕度90%RH、40℃之環境的水分之透濕度以24小時計為0至1500g/m2b) The moisture permeability of the substrate in an environment with a relative humidity of 90%RH and 40°C based on the JIS Z 0208 moisture permeability test is 0 to 1500 g/m 2 in 24 hours.

藉由具有上述特性之基板,偏光板係可在高溫高濕環境下亦具有高的耐久性,尤其,在高溫高濕環境下曝露於強的光線亦具有高的耐久性。 With the substrate with the above-mentioned characteristics, the polarizing plate can have high durability even in a high temperature and high humidity environment, especially when exposed to strong light in a high temperature and high humidity environment.

亦即,滿足a)之特性的偏光板係在親水性高分子膜中所含的硼化合物之含量即使曝露於高溫高濕之環境下,亦以高的程度保持,但如此之特性係意指偏光元件具有高程度之交聯構造,維持藉由延伸所得到之近紅外線吸收染料等之定向狀態。具有如此之特性的偏光板係即使在高溫高濕環境下,亦可抑制近紅外線吸收染料等之異性化及分解劣化,並可維持高穿透率且高偏光度。但,如在非專利文獻2已揭示,以聚乙烯醇所例示之親水性高分子膜係在包含二色性色素之偏光元件中並非硼化合物之全部進行交聯,而是會再接著已交聯之水分等而硼酸脫離。而在高溫高濕之環境下,硼化合物係交聯從親水性高分子膜徐緩地脫離,並擴散,擴散係不只於親水性高分子膜,而是會朝積層於偏光元件之接著層或透明保護層移動。然而,硼化合物之移動少,親水性高分子膜中之硼化合物的保持率愈高,愈可維持交聯,即使曝露在高溫高濕之環境下,亦可以高的程度保持。因而,防止來自親水性高分子膜之硼化合物的擴散及朝基板之移動係很重要,但其係必須硼化合物與基板為低的親和性。其親和性係可以化學物質之溶解度或移動量之測定表示,但從我們的研究結果,可知偏光元件中之硼化合物的保持率顯示硼化合物與基板之親和性作為抑制硼化合物之移動的指標很有效。考量以上之情形,在親水性高分子膜中所含之硼化合物的質量中,以該曝露前作為100%,使用保持20%以上之基板係作為在高溫高濕環境下亦含有近紅外線吸收染料等的偏光元件中可獲得高的耐久性之指標,終於達成本發明。 That is, a polarizing plate that satisfies the characteristics of a) maintains the content of the boron compound contained in the hydrophilic polymer film at a high level even if exposed to a high temperature and high humidity environment, but such characteristics mean The polarizing element has a high degree of cross-linking structure and maintains the orientation state of the near-infrared absorbing dye, etc. obtained by stretching. The polarizing plate with such characteristics can suppress the anisotropy and decomposition deterioration of near-infrared absorbing dyes even in a high-temperature and high-humidity environment, and can maintain high transmittance and high degree of polarization. However, as disclosed in Non-Patent Document 2, the hydrophilic polymer film exemplified by polyvinyl alcohol does not cross-link all the boron compounds in a polarizing element containing a dichroic pigment, but will then be cross-linked. The boric acid is separated from the water and so on. In the environment of high temperature and high humidity, the boron compound cross-links are gradually separated from the hydrophilic polymer film and diffused. The diffusion system is not limited to the hydrophilic polymer film, but will move toward the adhesive layer or transparent layer laminated on the polarizing element. The protective layer moves. However, the movement of the boron compound is less, and the higher the retention rate of the boron compound in the hydrophilic polymer film, the more the cross-linking can be maintained, even if it is exposed to a high temperature and high humidity environment, it can be maintained to a high degree. Therefore, it is important to prevent the diffusion of the boron compound from the hydrophilic polymer film and the migration to the substrate, but the system must have a low affinity between the boron compound and the substrate. Its affinity can be measured by the solubility or the amount of movement of the chemical substance, but from our research results, we know that the retention rate of the boron compound in the polarizing element shows that the affinity between the boron compound and the substrate is a very good indicator of inhibiting the movement of the boron compound. effective. Considering the above circumstances, in the mass of the boron compound contained in the hydrophilic polymer film, 100% is used before the exposure, and 20% or more of the substrate is used as a substrate that also contains near-infrared absorbing dyes under high temperature and high humidity environments. It is an index of obtaining high durability among other polarizing elements, and finally reached the invention.

滿足b)之特性的偏光板係意指即使曝露於高溫高濕之環境下通過基板而達到偏光元件之水分亦少。因此,偏光元件係難以引起因水分所產生之定向緩和, 維持藉由延伸所得到之定向狀態,且可以將親水性高分子膜中之分子凝集力保持在高的狀態。再者包含硼化合物時,間接地表示與親水性高分子膜之交聯難以脫離,難以引起擴散或朝基板之移動。在具有如此之特性的偏光板係即使在高溫高濕環境下,亦可抑制近紅外線吸收染料之異性化及分解劣化,並可維持高穿透率及高偏光度。 A polarizing plate that satisfies the characteristics of b) means that even if it is exposed to a high-temperature and high-humidity environment, the water that passes through the substrate and reaches the polarizing element is small. Therefore, it is difficult for the polarizing element to cause the relaxation of orientation due to moisture. The orientation state obtained by stretching is maintained, and the cohesive force of molecules in the hydrophilic polymer film can be maintained at a high state. In addition, when a boron compound is included, it indirectly indicates that it is difficult to detach the crosslink from the hydrophilic polymer film, and it is difficult to cause diffusion or movement to the substrate. Even in the high temperature and high humidity environment, the polarizing plate system with such characteristics can suppress the anisotropy and decomposition deterioration of the near-infrared absorbing dye, and can maintain high transmittance and high polarization.

上述a)之特性,以上述曝露前之硼化合物的量作為100%時,在上述曝露後保持35%以上之硼化合物為較佳,以保持50%以上為更佳,以保持60%以上為再更佳。 For the characteristics of the above a), when the amount of boron compound before the above exposure is taken as 100%, it is better to keep 35% or more of the boron compound after the above exposure, more preferably to maintain 50% or more, and to maintain 60% or more. Even better.

有關b)之特性係在相對濕度90%RH、40℃之環境,隔24小時之時的基板之透濕度,較佳係可表示0至1100g/m2,更佳係可表示0至900g/m2,再更佳係可表示0至800g/m2The characteristic of b) is the relative humidity 90%RH, 40℃ environment, the moisture permeability of the substrate after 24 hours, preferably 0 to 1100g/m 2 , more preferably 0 to 900g/ m 2 , even more preferably, can represent 0 to 800 g/m 2 .

基板係可藉由設於偏光元件之單面,賦予上述特性之任一者,但較佳係將相同或不同種之基板設於偏光元件之兩面,藉此,即使從偏光元件之任一面曝露於高溫高濕環境下,亦可抑制水分之影響或交聯斷裂而硼化合物移動,或可賦予兩特性。 The substrate can be provided on one side of the polarizing element to give any of the above characteristics, but it is preferable to arrange the same or different substrates on both sides of the polarizing element, so that even when exposed from either side of the polarizing element In a high-temperature and high-humidity environment, it can also inhibit the influence of moisture or cross-link breakage and move the boron compound, or it can impart both characteristics.

對偏光元件設有基板時,亦可以直接將基板相接於偏光元件之方式進行積層,但亦可隔著接著層等之其他的層而對偏光元件設有基板。因此,在本案說明書中所謂在「偏光元件之單面或兩面」設有基板時,包含兩種情形:直接將基板相接於偏光元件之方式設置之情形、以及、隔著其他的層而對偏光元件設有基板之情形。 When the polarizing element is provided with a substrate, the substrate may be directly connected to the polarizing element to be laminated, but the polarizing element may be provided with a substrate via another layer such as an adhesive layer. Therefore, in the specification of this case, when the substrate is provided on "single or both sides of the polarizing element", it includes two situations: the case where the substrate is directly connected to the polarizing element, and the other layer is interposed. When the polarizing element is provided with a substrate.

就其他之層而言,一般亦可在基板與偏光元件之間設有使用來作為光學膜之膜。可設於基板與偏光元件之間的光學膜係例如,可例示一般在偏光板所使用 之三乙酸纖維素膜、環烯烴膜、丙烯酸膜或使用來作為相位差板之膜等。相位差板係可為由高分子所構成的相位差板,亦可為由液晶所構成的相位差板,並非限定者。相位差板一般係對於欲控制之波長而使用1/4λ、1/2λ等,但亦可使用任意之相位差板。 As for other layers, a film used as an optical film can generally be provided between the substrate and the polarizing element. The optical film system that can be set between the substrate and the polarizing element, for example, can be exemplified generally used in the polarizing plate The three cellulose acetate film, cycloolefin film, acrylic film or film used as a phase difference plate, etc. The phase difference plate may be a phase difference plate composed of a polymer or a phase difference plate composed of liquid crystal, and it is not limited. The retardation plate generally uses 1/4λ, 1/2λ, etc. for the wavelength to be controlled, but any retardation plate can also be used.

可滿足上述之特性a)及/或b)的基板係可為無機基板及有機樹脂基板。 The substrates satisfying the above-mentioned characteristics a) and/or b) may be inorganic substrates and organic resin substrates.

可滿足上述之特性a)及/或b)的無機基板係例如,例示由具有透明性之玻璃、石英、藍寶石、水晶或尖晶石所構成之基板。在本案說明書謂「具有透明性」之情形,意指偏光板具有偏光特性之波長帶域,例如在380至1500nm中,穿透率具有20%以上。在要求透明性之偏光板中,係以具有50%以上之穿透率為更佳,以具有80%以上之穿透率為再更佳,以具有90%以上之穿透率為特佳。就該點而言,由石英、藍寶石、或水晶所構成之基板係透明性高,為較佳的無機基板。又,在熱傳導率高,亦即散熱性高之點而言,此等之無機基板為較佳,以由藍寶石、或水晶所構成之基板為更佳。近紅外線吸收染料等在親水性高分子膜中定向之偏光元件若吸收紅外線線區域之高亮度的光,偏光元件因進行散熱,故所謂散熱性高係在提高該種之偏光板的耐久性上,具有重要的意義。 An inorganic substrate that can satisfy the above-mentioned characteristics a) and/or b) is, for example, a substrate made of transparent glass, quartz, sapphire, crystal, or spinel. In the case of the description of this case, “transparency” means that the polarizing plate has a wavelength band with polarization characteristics, for example, in the range of 380 to 1500 nm, the transmittance has a transmittance of more than 20%. In the polarizing plate that requires transparency, it is better to have a transmittance of 50% or more, it is even better to have a transmittance of 80% or more, and it is particularly preferable to have a transmittance of 90% or more. In this regard, a substrate made of quartz, sapphire, or crystal has high transparency and is a preferable inorganic substrate. In addition, in terms of high thermal conductivity, that is, high heat dissipation, these inorganic substrates are preferable, and a substrate made of sapphire or crystal is more preferable. If a polarizing element oriented in a hydrophilic polymer film such as a near-infrared absorbing dye absorbs high-brightness light in the infrared region, the polarizing element dissipates heat, so the so-called high heat dissipation is to improve the durability of the polarizer. , Has important meaning.

玻璃係就透明性之點而言,雖然略差,但具有低成本且可容易製造之優點,亦可與其他之基板組合而使用。玻璃係有鈉玻璃、硼矽酸玻璃、無鹼玻璃等,但並無特別限定。 In terms of transparency, glass is slightly inferior, but it has the advantages of low cost and easy manufacture, and it can also be used in combination with other substrates. The glass series includes soda glass, borosilicate glass, alkali-free glass, etc., but it is not particularly limited.

在未要求透明性之基板中,亦可使用其他之無機基板。例如,使用鋁、銀、鐵、矽、銅等而使表面具有反射性(光澤性)及散射反射性,亦可獲得以光學性偏光反射作為目的之偏光反射元件。 In substrates that do not require transparency, other inorganic substrates can also be used. For example, by using aluminum, silver, iron, silicon, copper, etc., to make the surface reflective (glossy) and scattering reflectivity, it is also possible to obtain a polarized light reflection element for the purpose of optically polarized light reflection.

將基板設於偏光元件之兩面時,從在高溫高濕環境下亦賦予高的耐久性之觀點而言,較佳係以至少1個基板作為無機基板,例如,可設為由玻璃、石英、藍寶石或水晶所構成之基板。從同樣之觀點而言,亦可在偏光元件之兩面設有無機基板。此時,基板係可為相同之無機基板,亦可為相異之無機基板。又,從透明性及放熱性之觀點而言,特佳係以由石英、藍寶石或水晶所構成之基板夾持偏光元件之兩面。又,在偏光元件之單面設有基板,並將偏光板貼合於光學裝置或顯示裝置時,若另一面貼合於裝置之玻璃等無機基板,實質上裝置之無機基板可發揮作為偏光板之基板的功能。 When the substrate is provided on both sides of the polarizing element, it is preferable to use at least one substrate as an inorganic substrate from the viewpoint of imparting high durability even in a high-temperature and high-humidity environment. For example, it can be made of glass, quartz, A substrate made of sapphire or crystal. From the same point of view, inorganic substrates can also be provided on both sides of the polarizing element. At this time, the substrates may be the same inorganic substrates or different inorganic substrates. Also, from the viewpoint of transparency and heat dissipation, it is particularly preferable to sandwich both sides of the polarizing element with a substrate made of quartz, sapphire, or crystal. In addition, when a substrate is provided on one side of the polarizing element and the polarizing plate is attached to an optical device or a display device, if the other side is attached to an inorganic substrate such as glass of the device, the inorganic substrate of the device can essentially serve as a polarizing plate The function of the substrate.

使無機基板隔著接著層或黏著層而積層於偏光元件時,將接著劑或黏著劑塗佈於無機基板而形成接著層或黏著層。對於接著劑或黏著劑係只要可接著的話,並無特別限定,接著劑係例如,可使用紫外線硬化型接著劑、熱硬化型接著劑、矽系接著劑等。又,對於黏著劑亦無特別限定,例如,可使用使至少包含丙烯酸系烷酯之單體組成物聚合所得到之丙烯酸(共)聚合樹脂、矽系黏著劑等。但,不限定於此等。又,可為組合硬化型接著劑與黏著劑者。組合硬化型接著劑與黏著劑而成之黏接著劑係例如,可適宜使用專利文獻9記載之黏著性配合組成物,將專利文獻9之內容藉由參照摘入於本案說明書中。接著層係可為後述之樹脂基板。 When the inorganic substrate is laminated on the polarizing element via the adhesive layer or the adhesive layer, the adhesive or the adhesive is applied to the inorganic substrate to form the adhesive layer or the adhesive layer. The adhesive or the adhesive system is not particularly limited as long as it can be adhered. For the adhesive system, for example, ultraviolet curable adhesives, thermosetting adhesives, silicon-based adhesives, and the like can be used. In addition, the adhesive is not particularly limited. For example, acrylic (co)polymer resins, silicone adhesives, etc. obtained by polymerizing a monomer composition containing at least acrylic alkyl esters can be used. However, it is not limited to these. In addition, it may be a combination of a hardening type adhesive and an adhesive. For an adhesive system that combines a hardening type adhesive and an adhesive, for example, the adhesive compound composition described in Patent Document 9 can be suitably used, and the content of Patent Document 9 is incorporated in the specification of this application by reference. The subsequent layer system may be a resin substrate described later.

可滿足上述之特性a)或b)之樹脂基板係可列舉選自由矽系樹脂、丙烯酸系樹脂、烯烴系樹脂、環烯烴系樹脂、聚酯系樹脂、偏氯乙烯樹脂及聚碳酸酯樹脂中之1種、或2種以上所構成之基板。尤其,較佳係由矽氧烷矽系樹脂、丙烯酸系樹脂、環烯烴系樹脂、或聚酯系樹脂、聚碳酸酯樹脂所構成之基板。基板可為膜形狀(為薄且有可撓性)。 The resin substrate system that can satisfy the above characteristics a) or b) can be selected from silicone resins, acrylic resins, olefin resins, cycloolefin resins, polyester resins, vinylidene chloride resins, and polycarbonate resins. One type or two or more types of substrates. In particular, a substrate made of silicone resin, acrylic resin, cycloolefin resin, polyester resin, or polycarbonate resin is preferable. The substrate can be in the shape of a film (thin and flexible).

矽系樹脂較佳係例如以專利文獻11(國際公開2010/137332)記載之具有(甲基)丙烯醯基的有機倍半矽氧烷作為主成分而經聚合的矽樹脂,可使用將其製膜所得到之膜作為基板。藉由參照,專利文獻11之內容係摘入於本案說明書中。 The silicone resin is preferably a silicone resin polymerized with (meth)acrylic acid group-containing organossesquioxanes described in Patent Document 11 (International Publication 2010/137332) as the main component, and can be used to make The resulting film serves as a substrate. By reference, the content of Patent Document 11 is extracted in the specification of this case.

丙烯酸系樹脂係例如依據專利文獻12(國際公開2006/112223)之實施例1的記載而以丙烯酸系樹脂為較佳,可使用將該等製膜所得到之膜作為基板。藉由參照,專利文獻12之內容係摘入於本案說明書中。 The acrylic resin is based on, for example, the description of Example 1 of Patent Document 12 (International Publication 2006/112223), preferably an acrylic resin, and a film obtained by forming such a film can be used as a substrate. By reference, the content of Patent Document 12 is extracted from the specification of this case.

由環烯烴系樹脂所構成的膜係例示日本ZEON公司製ZEONOR或JSR公司製ARTON作為較佳的膜,可使用該等膜作為基板。 The film system composed of a cycloolefin-based resin exemplifies ZEONOR manufactured by Japan's Zeon Corporation or ARTON manufactured by JSR Corporation as preferred films, and these films can be used as substrates.

聚酯系樹脂係以聚對苯二甲酸乙二酯樹脂或聚萘二甲酸乙二酯樹脂為較佳,由此等之樹脂所構成之膜係例如以東洋紡公司製SRF膜為較佳。 The polyester resin is preferably a polyethylene terephthalate resin or a polyethylene naphthalate resin, and a film composed of these resins is preferably an SRF film manufactured by Toyobo Co., Ltd., for example.

偏氯乙烯樹脂係例如,以旭化成公司製SARAN樹脂為較佳,可使用將該等製膜所得到之膜作為基板。 As the vinylidene chloride resin, for example, SARAN resin manufactured by Asahi Kasei Co., Ltd. is preferable, and a film obtained by forming such a film can be used as a substrate.

聚碳酸酯樹脂係以帝人公司製PUREACE或KANEKA公司製R膜等為較佳,可使用此等作為基板。 The polycarbonate resin is preferably PUREACE manufactured by Teijin Corporation or R film manufactured by KANEKA Corporation, and these can be used as a substrate.

使高分子基板隔著接著層或黏著層而積層於偏光元件時之接著劑、或黏著劑係只要可接著的話,並無特別限制,接著劑係例如,可使用紫外線硬化型接著劑、熱硬化型接著劑、矽系接著劑等。又,黏著劑係例如,可使用至少包含(甲基)丙烯酸系烷酯之單體組成物進行聚合所得到之丙烯酸(共)聚合樹脂、或矽系黏著劑等,但不限定於此等。又,亦可組合硬化型接著劑與黏著劑。組合硬化型接著劑與黏著劑而成之黏接著劑係可適宜使用上述之專利文獻9記載的黏著性配合組成物。接著層係可為由使後述之聚合性化合物進行聚合所得到之硬化物所構成之層。 There are no particular restrictions on the adhesive or adhesive system when the polymer substrate is laminated on the polarizing element with the adhesive layer or the adhesive layer interposed therebetween, as long as it can be adhered. Type adhesive, silicon-based adhesive, etc. In addition, the adhesive system can be, for example, acrylic (co)polymer resin obtained by polymerizing a monomer composition containing at least (meth)acrylic acid alkyl ester, or a silicon adhesive, but it is not limited to these. In addition, a hardening type adhesive and an adhesive may be combined. The adhesive compound system which combines a hardening type adhesive agent and an adhesive agent can use the adhesive compounding composition described in the above-mentioned patent document 9 suitably. The subsequent layer may be a layer composed of a cured product obtained by polymerizing a polymerizable compound described later.

在本發明之較佳的實施型態中,作為可滿足上述之特性a)或b)的樹脂基板,可列舉例如,由使縮水甘油基、(甲基)丙烯醯基、異氰酸酯基等之具有聚合性取代基的化合物進行聚合所得到之特定的樹脂所構成之基板。 In a preferred embodiment of the present invention, as a resin substrate that satisfies the above-mentioned characteristics a) or b), for example, a resin substrate having a glycidyl group, (meth)acryloyl group, isocyanate group, etc. A substrate composed of a specific resin obtained by polymerizing a compound with a polymerizable substituent.

更具體而言,係可例示非專利文獻3記載之由包含聚合性單體的組成物之硬化物所構成的基板,藉由參照,非專利文獻3之內容係摘入於本案說明書中。適宜係可列舉由使包含具有(甲基)丙烯醯基之化合物與聚合起始劑的聚合性單體組成物聚合反應而成的硬化物所構成之基板。在本發明之較佳的實施型態中,聚合性單體組成物係包含具有2個以上之(甲基)丙烯醯基的化合物。在該實施型態中,聚合性單體組成物係在全單體中,含有具有2個以上之(甲基)丙烯醯基的化合物較佳係30質量%以上,更佳係50質量%以上,再更佳係70質量%以上。 More specifically, a substrate composed of a cured product of a composition containing a polymerizable monomer described in Non-Patent Document 3 can be exemplified. By reference, the content of Non-Patent Document 3 is extracted in this specification. A suitable system includes a substrate composed of a cured product obtained by polymerizing a polymerizable monomer composition containing a compound having a (meth)acryloyl group and a polymerization initiator. In a preferred embodiment of the present invention, the polymerizable monomer composition includes a compound having two or more (meth)acrylic groups. In this embodiment, the polymerizable monomer composition is in all monomers, and the compound containing two or more (meth)acrylic groups is preferably 30% by mass or more, more preferably 50% by mass or more , More preferably more than 70% by mass.

在本發明之更佳的實施型態中,聚合性單體組成物係包含具有3個以上之(甲基)丙烯醯基的化合物。在該實施型態中,聚合性單體組成物係全單體中,以包含具有(甲基)丙烯醯基3個以上之單體30%以上,以包含50%以上為更佳,以包含70%以上為特佳。如此之單體組成的聚合性單體組成物係可獲得由硬且交聯密度更高的樹脂所構成之基板。 In a more preferable embodiment of the present invention, the polymerizable monomer composition includes a compound having three or more (meth)acrylic groups. In this embodiment, among all the monomers of the polymerizable monomer composition system, the monomer having 3 or more (meth)acrylic groups is contained at least 30%, and more preferably at least 50% is contained. More than 70% is particularly good. The polymerizable monomer composition system composed of such a monomer can obtain a substrate composed of a hard resin with a higher crosslinking density.

基板為了滿足上述特性a)及/或b),上述具有(甲基)丙烯醯基之化合物之中,較佳係具有新戊四醇骨架、新戊二醇骨架、三羥甲基丙烷骨架、及二環戊二烯骨架之至少一種類以上的構造之化合物。在較佳的實施型態中,具有如此之骨架的(甲基)丙烯酸酯化合物,以固體成分濃度計在全部單體中包含15質量%以上為較佳,以包含30質量%以上為更佳,以包含50質量%以上為再更佳,以包含70%以上為特佳。 In order for the substrate to satisfy the above characteristics a) and/or b), among the above-mentioned compounds having a (meth)acryloyl group, it is preferable to have a neopentylerythritol skeleton, a neopentyl glycol skeleton, a trimethylolpropane skeleton, And a compound of at least one type or more of the structure of the dicyclopentadiene skeleton. In a preferred embodiment, the (meth)acrylate compound having such a skeleton is preferably contained in a solid content of 15% by mass or more in all monomers, and more preferably 30% by mass or more. It is even more preferable to contain 50% by mass or more, and it is particularly preferable to contain 70% or more.

具有如此之構造的化合物之例與透濕度一起表示於表1中。 Examples of compounds having such a structure are shown in Table 1 together with the moisture permeability.

[表1]

Figure 109122608-A0202-12-0039-62
[Table 1]
Figure 109122608-A0202-12-0039-62

評估上述透濕度之方法係在半晒牛皮紙(取自TOTSUYA ECHO股份有限公司)塗佈用以將固體成分濃度5%之聚乙烯醇錨定塗佈(anchor coating)成1μm之厚度而成者形成樹脂基板的單體組成物,並使其硬化而形成樹脂基板、或進行張貼所形成之樹脂基板或無機基板。包含具有(甲基)丙烯醯基之化合物作為記載於上述表1之聚合性單體的組成物係將具有(甲基)丙烯醯基之化合物10重量份、甲苯5重量份、1-羥基環己基苯基酮(BASF公司製IRGACURE 184)0.6重量份混合,作為組成物。將其組成物以溶劑揮發後之樹脂固體成分成為5μm厚度之方式塗佈於錨定塗佈有聚乙烯醇之該半晒牛皮紙。 The method for evaluating the moisture permeability above is formed by coating semi-suned kraft paper (taken from TOTSUYA ECHO Co., Ltd.) to anchor coating of polyvinyl alcohol with a solid content of 5% to a thickness of 1μm. The monomer composition of the resin substrate is cured to form a resin substrate, or the resin substrate or the inorganic substrate formed is pasted. The composition system comprising a compound having a (meth)acryloyl group as the polymerizable monomer described in Table 1 above will have 10 parts by weight of the compound having a (meth)acryloyl group, 5 parts by weight of toluene, and 1-hydroxy ring 0.6 parts by weight of hexyl phenyl ketone (IRGACURE 184 manufactured by BASF Corporation) was mixed and used as a composition. The composition was coated on the semi-suned kraft paper anchored and coated with polyvinyl alcohol so that the solid resin content after solvent volatilization became 5 μm in thickness.

將所作成之試料放置於b)之條件後,可依據JIS Z 0208而確認半晒牛皮紙之透濕度,評估基板之透濕度。 After placing the finished sample under the condition of b), the moisture permeability of semi-suned kraft paper can be confirmed according to JIS Z 0208, and the moisture permeability of the substrate can be evaluated.

具有新戊四醇骨架之製品係可列舉KAYARAD PET-30、KAYARAD PET-40、KAYARAD DPHA等,具有新戊二醇骨架之製品係可列舉KAYARAD NPGDA等,具有三羥甲基丙烷骨架之製品係可列舉KAYARAD TMPTA等,具有二環戊二烯骨架之製品係可列舉KAYARAD R-684等。 Products with a neopentylerythritol skeleton can include KAYARAD PET-30, KAYARAD PET-40, KAYARAD DPHA, etc., products with a neopentyl glycol skeleton can include KAYARAD NPGDA, etc., products with a trimethylolpropane skeleton Examples include KAYARAD TMPTA and the like, and products having a dicyclopentadiene skeleton include KAYARAD R-684.

在如此之(甲基)丙烯酸酯化合物之中,就透濕度更低、耐濕熱性優異之點而言,以具有新戊四醇骨架、新戊二醇骨架、或三羥甲基丙烷骨架之(甲基)丙烯酸酯化合物為更佳,以具有新戊四醇骨架之(甲基)丙烯酸酯化合物為特佳。 Among such (meth)acrylate compounds, in terms of lower moisture permeability and excellent moisture and heat resistance, one having a neopentyl erythritol skeleton, a neopentyl glycol skeleton, or a trimethylolpropane skeleton The (meth)acrylate compound is more preferable, and the (meth)acrylate compound having a neopentylerythritol skeleton is particularly preferable.

上述樹脂組成物藉由紫外線進行聚合之組成的情形,該樹脂組成物可包含紫外線聚合起始劑。紫外線聚合起始劑係可列舉例如,2-甲基-1-[4-(甲基硫)苯基]-2-嗎啉基丙烷-1(BASF公司製IRGACURE 907)、1-羥基環己基苯基酮(BASF公司製IRGACURE 184)、4-(2-羥基乙氧基)-苯基(2-羥基-2-丙基)酮(BASF公司製IRGACURE 2959)、1-(4-十二烷基苯基)-2-羥基-2-甲基丙烷-1-酮(MERCK 製DAROCURE 953)、1-(4-異丙基苯基)-2-羥基-2-甲基丙烷-1-酮(MERCK製DAROCURE 1116)、2-羥基-2-甲基-1-苯基丙烷-1-酮(BASF公司製IRGACURE 1173)、二乙氧基乙醯苯等之乙醯苯系化合物、苯偶姻、苯偶姻甲基醚、苯偶姻乙基醚、苯偶姻異丙基醚、苯偶姻異丁基醚、2,2-二甲氧基-2-苯基乙醯苯(BASF公司製IRGACURE 651)等之苯偶姻系化合物、苯甲醯基苯甲酸酸、苯甲醯基苯甲酸甲酯、4-苯基二苯甲酮、羥基二苯甲酮、4-苯甲醯基-4’-甲基二苯基硫醚、3,3’-二甲基-4-甲氧基二苯甲酮(日本化藥製KAYACURE MBP)等之二苯甲酮系化合物、硫雜蒽酮(Thioxanthone)、2-氯硫雜蒽酮(日本化藥製KAYACURE CTX)、2-甲基硫雜蒽酮、2,4-二甲基硫雜蒽酮(日本化藥製KAYACURE RTX)、異丙基硫雜蒽酮、2,4-二氯硫雜蒽酮(日本化藥製KAYACURE CTX)、2,4-二乙基硫雜蒽酮(日本化藥製KAYACURE DETX)、2,4-二異丙基硫雜蒽酮(日本化藥製KAYACURE DITX)等之硫雜蒽酮系化合物等。更佳係可列舉2-甲基-1-[4-(甲基硫)苯基]-2-嗎啉基丙烷-1(BASF公司製IRGACURE 907)、1-羥基環己基苯基酮(BASF公司製IRGACURE 184)、及2,2-二甲氧基-2-苯基乙醯苯(BASF公司製IRGACURE 651)。此等之光聚合起始劑係可為一種類亦可為複數以任意之調配比率混合而使用。 In the case of the composition in which the above-mentioned resin composition is polymerized by ultraviolet rays, the resin composition may contain an ultraviolet polymerization initiator. Examples of the ultraviolet polymerization initiator system include 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropane-1 (IRGACURE 907 manufactured by BASF), 1-hydroxycyclohexyl Phenyl ketone (IRGACURE 184 manufactured by BASF), 4-(2-hydroxyethoxy)-phenyl(2-hydroxy-2-propyl) ketone (IRGACURE 2959 manufactured by BASF), 1-(4-decane Alkylphenyl)-2-hydroxy-2-methylpropane-1-one (MERCK DAROCURE 953), 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropane-1-one (DAROCURE 1116 manufactured by MERCK), 2-hydroxy-2-methyl-1-phenyl Propane-1-one (IRGACURE 1173 manufactured by BASF), diethoxy acetobenzene and other acetobenzene compounds, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin iso Benzoin-based compounds such as propyl ether, benzoin isobutyl ether, 2,2-dimethoxy-2-phenylacetonitrile (IRGACURE 651 manufactured by BASF), benzoin benzoic acid , Benzoyl methyl benzoate, 4-phenylbenzophenone, hydroxybenzophenone, 4-benzyl-4'-methyl diphenyl sulfide, 3,3'-dimethyl 4-methoxybenzophenone (KAYACURE MBP manufactured by Nippon Kayaku Pharmaceutical Co., Ltd.) and other benzophenone compounds, thioxanthone (Thioxanthone), 2-chlorothioxanthone (KAYACURE CTX manufactured by Nippon Kayaku Pharmaceutical Co., Ltd.) ), 2-methylthioxanthone, 2,4-dimethylthioxanthone (KAYACURE RTX manufactured by Nippon Kayaku Co., Ltd.), isopropylthioxanthone, 2,4-dichlorothioxanthone ( KAYACURE CTX manufactured by Nippon Kayaku Pharmaceutical Co., Ltd., 2,4-diethyl thioxanthone (KAYACURE DETX manufactured by Nippon Kayaku Pharmaceutical Co., Ltd.), 2,4-diisopropyl thioxanthone (KAYACURE DITX manufactured by Nippon Kayaku Pharmaceutical Co., Ltd.), etc. Lucanthone-based compounds, etc. More preferred systems include 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropane-1 (IRGACURE 907 manufactured by BASF), 1-hydroxycyclohexyl phenyl ketone (BASF IRGACURE 184 manufactured by the company), and 2,2-Dimethoxy-2-phenylacetonitrile (IRGACURE 651 manufactured by BASF). These photopolymerization initiators may be of one kind or may be used by mixing a plurality of them at any mixing ratio.

包含上述二苯甲酮系化合物或硫雜蒽酮系化合物作為紫外線聚合起始劑時,為了促進光聚合反應,亦可併用助劑。如此之助劑係可列舉例如,三乙醇胺、甲基二乙醇胺、三異丙醇胺、正丁基胺、N-甲基二乙醇胺、二乙基胺基乙基甲基丙烯酸酯、米希勒酮、4,4’-二乙基胺基酚、4-二甲基胺基苯甲酸乙酯、4-二甲基胺基苯甲酸(正丁氧基)乙酯、4-二甲基胺基苯甲酸異戊酯等之胺系化合物。 When the aforementioned benzophenone-based compound or thioxanthone-based compound is contained as an ultraviolet polymerization initiator, an auxiliary agent may be used in combination in order to promote the photopolymerization reaction. Such auxiliary agents include, for example, triethanolamine, methyldiethanolamine, triisopropanolamine, n-butylamine, N-methyldiethanolamine, diethylaminoethyl methacrylate, Michler Ketone, 4,4'-diethylaminophenol, ethyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate (n-butoxy), 4-dimethylamine Amine compounds such as isoamyl benzoate.

上述光聚合起始劑及助劑之添加量較佳係在不引起偏光性能之降低的範圍使用,其量係相對於聚合性組成物中之具有(甲基)丙烯醯基等的聚合性取代基之化合物100重量份,較佳係可為0.5重量份以上12重量份以下,更佳係可為2重量份以上10重量份以下左右。又,相對於光聚合起始劑,助劑可為0.5倍至2倍量左右。 The addition amount of the above-mentioned photopolymerization initiator and auxiliary agent is preferably used in a range that does not cause a decrease in the polarization performance, and the amount is relative to the polymerizable substitution such as (meth)acryloyl group in the polymerizable composition. 100 parts by weight of the base compound, preferably 0.5 parts by weight or more and 12 parts by weight or less, more preferably 2 parts by weight or more and 10 parts by weight or less. In addition, the amount of the auxiliary agent may be about 0.5 to 2 times relative to the photopolymerization initiator.

上述聚合性單體組成物為包含熱聚合性單體時,可含有聚合起始劑、交聯劑及/或起始觸媒。交聯劑係可使用異氰酸酯系、硼系、鈦酸酯系等之各種公知之交聯劑。其添加量係在聚合性單體組成物100重量份中可為0.1重量份以上20重量份以下,更佳係在該組成物100重量份中可為1重量份以上10重量份以下左右。 When the polymerizable monomer composition contains a thermally polymerizable monomer, it may contain a polymerization initiator, a crosslinking agent, and/or an initiator. As the crosslinking agent, various known crosslinking agents such as isocyanate, boron, and titanate can be used. The addition amount can be 0.1 part by weight or more and 20 parts by weight or less in 100 parts by weight of the polymerizable monomer composition, and more preferably can be about 1 part by weight or more and 10 parts by weight or less in 100 parts by weight of the composition.

形成樹脂基板之方法係例如,以上述聚合性單體組成物作為原液,或依需要而使用溶劑進行稀釋,偏光元件或積層於偏光元件之膜、或在製膜後,直接或隔著接著層等而塗佈至可轉印至偏光元件之膜,其後可藉由加熱等依需要而去除溶劑,藉由加熱、或照射紫外線,獲得作為本發明之聚合性樹脂硬化層的基板。又,積層於偏光元件之膜係可使用三乙酸纖維素膜等。 The method of forming a resin substrate is, for example, using the above polymerizable monomer composition as a stock solution, or diluting with a solvent as necessary, polarizing element or a film laminated on the polarizing element, or directly or via an adhesive layer after film formation It can be applied to a film that can be transferred to a polarizing element, and then the solvent can be removed as necessary by heating or the like, and by heating or irradiating ultraviolet rays, a substrate as the polymerizable resin cured layer of the present invention can be obtained. In addition, a cellulose triacetate film or the like can be used as the film system laminated on the polarizing element.

上述單體組成物之溶劑較佳係該組成物中之單體的溶解性、及對基板之潤濕性優異、且不引起基材表面之平滑性的降低者,例如可列舉水;甲苯、二甲苯等之芳香族烴類;茴香醚、二惡烷、四氫呋喃等之醚類;甲基異丁酮、甲乙酮、環己酮、環戊酮、2-戊酮、3-戊酮、2-己酮、3-己酮、2-庚酮、3-庚酮、4-庚酮、2,6-二甲基-4-庚酮等之酮類;正丁醇、2-丁醇、環己酮、異丙醇等之醇類;甲基溶纖劑、乙酸甲基溶纖劑等之溶纖劑類;乙酸乙酯、乙酸丁酯、乳酸甲酯、丙二醇單甲基醚乙酸酯、丙二醇乙基醚乙酸酯、乙酸甲氧基乙酯、乙酸乙氧基乙 酯等之酯類;二甲基亞碸、乙腈、及N,N-二甲基乙醯基甲醯胺,但不限定於此等。較佳係甲苯、環戊酮、或乙酸乙酯。又,溶劑係可為單一亦可為混合物。樹脂組成物之濃度係依溶劑溶解性、對基板之潤濕性、塗布後之厚度等而異,但較佳係5至95重量%,更佳係10至80重量%左右。 The solvent of the aforementioned monomer composition is preferably one that has excellent solubility of the monomers in the composition and wettability to the substrate, and does not cause a decrease in the smoothness of the substrate surface, for example, water; toluene, Aromatic hydrocarbons such as xylene; ethers such as anisole, dioxane, and tetrahydrofuran; methyl isobutyl ketone, methyl ethyl ketone, cyclohexanone, cyclopentanone, 2-pentanone, 3-pentanone, 2- Ketones such as hexanone, 3-hexanone, 2-heptanone, 3-heptanone, 4-heptanone, 2,6-dimethyl-4-heptanone, etc.; n-butanol, 2-butanol, ring Alcohols such as hexanone and isopropanol; cellosolves such as methyl cellosolve and methyl cellosolve acetate; ethyl acetate, butyl acetate, methyl lactate, propylene glycol monomethyl ether acetate , Propylene glycol ethyl ether acetate, methoxy ethyl acetate, ethoxy ethyl acetate Esters such as esters; but not limited to dimethyl sulfene, acetonitrile, and N,N-dimethyl acetonitrile. Preferably it is toluene, cyclopentanone, or ethyl acetate. In addition, the solvent system may be a single or a mixture. The concentration of the resin composition varies depending on solvent solubility, wettability to the substrate, thickness after coating, etc., but is preferably 5 to 95% by weight, more preferably about 10 to 80% by weight.

又,缺乏對基板之潤濕性時,或所形成之基材表面的平滑性低時,為了改善該等問題,在樹脂組成物中亦可添加各種之調平劑。調平劑係可使用矽系、氟系、聚醚系、丙烯酸共聚物系、鈦酸酯系等之各種的調平劑。其添加量係在聚合性單體組成物100重量份中可為0.0001重量份以上10重量份以下,更佳係在該單體組成物100重量份中可為0.1重量份以上5重量份以下左右。 In addition, when the wettability to the substrate is insufficient, or when the smoothness of the formed substrate surface is low, in order to improve these problems, various leveling agents may be added to the resin composition. As the leveling agent, various leveling agents such as silicon-based, fluorine-based, polyether-based, acrylic copolymer-based, and titanate-based, can be used. The addition amount can be 0.0001 parts by weight or more and 10 parts by weight in 100 parts by weight of the polymerizable monomer composition, and more preferably 0.1 parts by weight or more and about 5 parts by weight in 100 parts by weight of the monomer composition. .

使形成膜之單體組成物硬化時,基板之偏光元件或積層於偏光元件之膜的密著性差時,為了改善該等問題,在單體組成物中亦可添加各種之交聯劑。交聯劑之種類係可使用異氰酸酯系、硼系、鈦酸酯系等之各種的化合物。其添加量係在聚合性單體組成物100重量份中可為0.0001重量份以上20重量份以下,更佳係在該組成物100重量份中可為0.1重量份以上10重量份以下左右。 When the monomer composition forming the film is cured, when the adhesion of the polarizing element of the substrate or the film laminated on the polarizing element is poor, various crosslinking agents may be added to the monomer composition in order to improve these problems. As the type of crosslinking agent, various compounds such as isocyanate-based, boron-based, and titanate-based compounds can be used. The addition amount can be 0.0001 part by weight or more and 20 parts by weight or less in 100 parts by weight of the polymerizable monomer composition, more preferably 0.1 part by weight or more and 10 parts by weight or less in 100 parts by weight of the composition.

形成樹脂基板之方法係直接塗覆於偏光元件之方法;在用以使三乙酸纖維素等積層所使用的膜上設有樹脂基板之方法;或,將聚合性單體組成物之層形成於另一膜之後,轉印,或使其積層而在偏光元件上設有基板之方法;再者係設有接著層,再於其上積層樹脂基板之方法亦可效率佳且簡易地製作偏光板。塗佈聚合性單體組成物之方法並無特別限定,而可列舉例如,以旋轉塗覆方式、線棒塗覆方式、凹版塗覆方式、微凹版塗覆方式、壓延塗覆方式、噴塗塗覆方式、液面彎曲式(meniscus)塗覆方式等進行之方法。 The method of forming a resin substrate is a method of directly coating a polarizing element; a method of providing a resin substrate on a film used for laminating cellulose triacetate or the like; or, a layer of polymerizable monomer composition is formed on After another film is transferred or laminated to provide a substrate on the polarizing element; the method of providing an adhesive layer and then laminating a resin substrate on it can also make the polarizing plate more efficient and simple . The method of coating the polymerizable monomer composition is not particularly limited, and examples include spin coating, wire bar coating, gravure coating, microgravure coating, calender coating, and spray coating. Methods such as coating method, meniscus coating method, etc.

上述樹脂基板較佳係藉由加熱或紫外線照射使單體充分聚合,未反應成分極少。其程度係硬化後之樹脂組成物100重量份中的未反應單體(例如,丙烯酸酯化合物)可為0重量份以上5重量份以下,更佳係可為0重量份以上3重量份以下,再更佳係可為0重量份以上1重量份以下。獲得如此之層的方法係可列舉例如,使塗布後之樹脂組成物的層之厚度最適化的方法;使添加之光聚合起始劑之種類或量最適化之方法;充分的加熱或照射紫外線之方法;在氮氣等之惰性氣體中進行等之改變紫外線照射時的環境而使其硬化之方法等。就簡易的方法而言,以僅改變樹脂濃度,或改變樹脂塗布量可最適化之點而言,使樹脂之層的厚度進行最適化之方法為方便。 The above-mentioned resin substrate is preferably heated or irradiated with ultraviolet rays to fully polymerize the monomers, with very few unreacted components. The degree is that the unreacted monomer (for example, acrylate compound) in 100 parts by weight of the cured resin composition can be 0 parts by weight or more and 5 parts by weight or less, and more preferably, it can be 0 parts by weight or more and 3 parts by weight or less. More preferably, it may be 0 part by weight or more and 1 part by weight or less. The method of obtaining such a layer includes, for example, a method of optimizing the thickness of the layer of the resin composition after coating; a method of optimizing the type or amount of the photopolymerization initiator added; sufficient heating or ultraviolet irradiation The method; the method of changing the environment during ultraviolet irradiation to harden it in an inert gas such as nitrogen. In terms of a simple method, it is convenient to optimize the thickness of the resin layer at the point that only the resin concentration or the resin coating amount can be optimized.

上述樹脂基板之厚度係以0.5μm乃至10μm為較佳,以1μm乃至8μm為更佳,以2μm至6μm為再更佳。若比10μm還厚,有時殘留未反應單體增加,濕熱耐久性變得不充分,在乾熱耐久性試驗中偏光板進行紅變。另一方面,若比0.5μm還薄,濕熱耐久性容易變成不充分。紫外線之照射量係依照丙烯酸酯化合物種類、光聚合起始劑之種類與添加量、膜厚而異,但例如可為100至1500mJ/cm2左右。 The thickness of the resin substrate is preferably 0.5 μm or even 10 μm, more preferably 1 μm or even 8 μm, and even more preferably 2 μm to 6 μm. If it is thicker than 10 μm, the remaining unreacted monomer may increase, and the wet heat durability may become insufficient, and the polarizing plate may undergo a red change in the dry heat durability test. On the other hand, if it is thinner than 0.5 μm, the wet heat durability is likely to become insufficient. The amount of ultraviolet irradiation varies depending on the type of acrylate compound, the type and amount of the photopolymerization initiator, and the film thickness, but it can be, for example, about 100 to 1500 mJ/cm 2 .

又,上述樹脂基板較佳係藉由鹼性溶液而處理亦為透明者。具體而言,藉由pH為11以上之鹼水溶液而在40℃下處理10分鐘以上之後,無白濁係成為一個指標。其基準係在三乙酸纖維素將紫外線硬化型單體組成物塗佈成5μm之厚度,設有已硬化之層的膜以pH11之水溶液在40℃處理10分鐘以上,在波長550nm中之光線穿透率仍可為85%以上,較佳係90%以上。另一方面,藉由以鹼水溶液處理樹脂基板,使樹脂基板表面設為親水性,因與親水性高分子膜例如聚乙烯醇系膜之密著性提高,故亦較佳。就其時之樹脂基板為親水性之指標而言, 係使用:滴入10μL之水時之接觸角為60°以下,更佳係50°以下,再更佳係40°以下。對偏光元件貼合時,以鹼水溶液處理之後,以水或酸性水溶液進行中和處理,其後,應用乾燥處理者為較佳的配方。 In addition, the above-mentioned resin substrate is preferably treated with an alkaline solution and is also transparent. Specifically, after treatment at 40°C for 10 minutes or longer with an aqueous alkali solution having a pH of 11 or higher, the non-cloudy system becomes an index. The standard is that cellulose triacetate is coated with an ultraviolet curable monomer composition to a thickness of 5μm, and the film with a cured layer is treated with an aqueous solution of pH 11 at 40°C for more than 10 minutes, and the light in the wavelength of 550nm penetrates The transmittance can still be over 85%, preferably over 90%. On the other hand, by treating the resin substrate with an aqueous alkali solution to make the surface of the resin substrate hydrophilic, it is also preferable because the adhesion to a hydrophilic polymer film such as a polyvinyl alcohol film is improved. As far as the resin substrate at that time is an indicator of hydrophilicity, For use: the contact angle when dripping 10μL of water is 60° or less, more preferably 50° or less, and even more preferably 40° or less. When attaching a polarizing element, after treatment with an alkaline aqueous solution, neutralization treatment with water or an acidic aqueous solution, after which, a drying treatment is the preferred formula.

欲獲得滿足上述條件a)、b)之兩者的偏光板時,較佳係設為具有2層以上之由聚合性單體組成物之硬化物所構成的基板之多層構造。 When it is desired to obtain a polarizing plate that satisfies both of the aforementioned conditions a) and b), it is preferable to have a multilayer structure having two or more layers of a substrate composed of a cured product of a polymerizable monomer composition.

獲得包含上述樹脂基板之偏光板時,可直接在偏光元件積層該樹脂基板,但例如,包含一般的三乙酸纖維素膜(以下,省略為TAC)之偏光板的構成、例如,以「TAC/接著層(或黏著層)/偏光元件/接著層(或黏著層)/TAC」所示之構成的偏光板之任一者之層之間或在表面設有1層以上之上述樹脂基板,可提高耐久性。具體而言,係可在未與接著層(或黏著層)面對之TAC的表面、TAC與接著層(或黏著層)之間、接著層(或黏著層)與偏光元件之間;之任一者可設有一層以上,以提高耐久性。為提高更耐久性,係貼合於顯示裝置之後,在成為露出面之表面側設有樹脂基板為有效果。具體而言,係使偏光板貼合於顯示裝置之後,使成為露出面之表面側的TAC貼合於TAC(F)、顯示裝置之後,使成為露出面之表面側的接著層(或黏著層)設為接著層(F)時,偏光板之構成係成為「TAC(F)/接著層(F)/偏光元件/接著層(或黏著層)/TAC/黏著層/顯示裝置」,但在該構成中之TAC(F)的表面、TAC(F)與接著層(F)之間、或接著層(F)與偏光元件之間設有由聚合性樹脂硬化物所構成之基板為較佳。又,為防止密著性之提升、或樹脂基板中之未反應單體的移動,在偏光元件與樹脂基板之間可設有錨定塗覆層。 When obtaining a polarizing plate containing the above-mentioned resin substrate, the resin substrate can be laminated directly on the polarizing element. However, for example, the composition of a polarizing plate containing a general cellulose triacetate film (hereinafter, abbreviated as TAC), such as "TAC/ Adhesive layer (or adhesive layer)/polarizing element/adhesive layer (or adhesive layer)/TAC" between any one of the layers of the polarizing plate shown in "Tac" or is provided with more than one layer of the above-mentioned resin substrate on the surface. Improve durability. Specifically, it can be on the surface of the TAC that is not facing the adhesive layer (or adhesive layer), between the TAC and the adhesive layer (or adhesive layer), or between the adhesive layer (or adhesive layer) and the polarizing element; One can have more than one layer to improve durability. In order to improve durability, it is effective to provide a resin substrate on the side of the exposed surface after bonding to the display device. Specifically, after bonding the polarizing plate to the display device, the TAC on the surface side of the exposed surface is bonded to the TAC(F) and the display device, and then the adhesive layer (or adhesive layer) on the surface side of the exposed surface is bonded ) Is set as the adhesive layer (F), the composition of the polarizing plate is "TAC(F)/adhesive layer (F)/polarizing element/adhesive layer (or adhesive layer)/TAC/adhesive layer/display device", but in In this structure, a substrate made of a cured polymer resin is preferably provided on the surface of the TAC (F), between the TAC (F) and the adhesive layer (F), or between the adhesive layer (F) and the polarizing element. . In addition, in order to prevent the improvement of adhesion or the movement of unreacted monomers in the resin substrate, an anchor coating layer may be provided between the polarizing element and the resin substrate.

上述偏光元件係可在其單面、或兩面貼合上述基板以外之透明的膜或層作為保護層。以上述一般的偏光板之構成所例示的TAC亦可成為其保護層之一個。透明的保護層係可藉由以聚合物進行塗布而形成層,或積層膜而設置。 形成透明保護層之透明聚合物或膜較佳係機械性強度高,熱安定性為良好的透明聚合物或膜。就使用來作為透明保護層之物質而言,可列舉例如,如三乙酸纖維素或二乙醯基纖維素之纖維素乙酸酯樹脂或其膜、主鏈或側鏈為醯亞胺基及/或醯胺之樹脂或聚合物或其膜等。可設有具有液晶性之樹脂或其膜。可藉由在單面、或兩面設有一層以上其中之同種或異種的樹脂或膜而製作偏光板。保護層、或使用作為保護層之膜的厚度並無特別限定,但可為0.5至200μm,較佳係可為10至100μm。 The above-mentioned polarizing element may be laminated with a transparent film or layer other than the above-mentioned substrate as a protective layer on one side or on both sides thereof. The TAC exemplified by the structure of the above-mentioned general polarizing plate may also be one of its protective layers. The transparent protective layer can be formed by coating with a polymer to form a layer or a laminated film. The transparent polymer or film forming the transparent protective layer is preferably a transparent polymer or film with high mechanical strength and good thermal stability. Regarding the substance used as a transparent protective layer, for example, cellulose acetate resin such as cellulose triacetate or diacetyl cellulose or its film, the main chain or side chain is an imine group and / Or amide resin or polymer or its film, etc. Can be provided with liquid crystal resin or its film. The polarizing plate can be made by arranging more than one layer of the same or different resin or film on one side or on both sides. The thickness of the protective layer or the film used as the protective layer is not particularly limited, but may be 0.5 to 200 μm, preferably 10 to 100 μm.

可使用於貼合上述偏光元件與上述保護層之接著劑係可列舉聚乙烯醇系接著劑、胺基甲酸酯乳化液系接著劑、丙烯酸系接著劑、及由多元醇與異氰酸酯所構成的接著劑等,並無特別限定。 Adhesives that can be used to bond the polarizing element and the protective layer include polyvinyl alcohol-based adhesives, urethane emulsion-based adhesives, acrylic-based adhesives, and those composed of polyols and isocyanates. Adhesives and the like are not particularly limited.

<表面處理層> <Surface treatment layer>

在上述偏光板之表面係可更設有透明的表面處理層。表面處理層係例如可例示丙烯酸系、胺基甲酸酯系或聚矽氧烷系之硬塗覆層、或一般的抗反射層(AR層)、防眩層(AG層)。又,為更提高單板穿透率,在該保護層之上設有AR層為較佳。AR層係例如可藉由蒸鍍或濺鍍處理二氧化矽、氧化鈦等之物質來形成,又,可藉由薄塗佈氟系物質來形成。AG層係塗佈含有以二氧化矽或聚合物等作為材料之粒子的塗覆層,亦可形成藉由內部散射、或形成凹凸之散射而顯現防眩性者。本案之偏光板係亦可在表面更貼附相位差板,使用來作為圓偏光板或橢圓偏光板。 A transparent surface treatment layer may be further provided on the surface of the above-mentioned polarizing plate. Examples of the surface treatment layer include acrylic, urethane, or polysiloxane hard coat layers, or general anti-reflection layers (AR layers) and anti-glare layers (AG layers). In addition, in order to further improve the penetration rate of the veneer, it is better to provide an AR layer on the protective layer. The AR layer can be formed by, for example, vapor deposition or sputtering treatment of silicon dioxide, titanium oxide, etc., and can be formed by thin coating of a fluorine-based material. The AG layer is a coating layer containing particles made of silicon dioxide or polymer as a material, and can also be formed to exhibit anti-glare properties by internal scattering or scattering that forms unevenness. The polarizing plate of this case can also be attached with a phase difference plate on the surface to be used as a circular polarizing plate or an elliptical polarizing plate.

<偏光板之用途> <Purpose of Polarizing Plate>

在本案發明所得到之偏光板的用途係例如可列舉液晶投影機、電子計算機、手錶、筆記型電腦、文書處理機、液晶電視、汽車導航系統、及屋內外之計測器 或顯示器等、及透鏡或眼鏡、真偽判定用裝置、CCD及CMOS等之影像感測器用途等。染料系偏光元件係即使在近紅外線區域中亦具有高的偏光性能,且耐久性亦優異。因此,特別適宜在必須有高的偏光性能與耐久性之各種液晶表示體用、液晶投影機用、車載用、及屋外顯示用(例如工業計器類之顯示用途或可穿戴用途)、必須有高可靠性的安全裝置等。 The application of the polarizing plate obtained by the present invention includes, for example, liquid crystal projectors, electronic computers, watches, notebook computers, word processors, liquid crystal televisions, car navigation systems, and indoor and outdoor measuring devices. Or monitors, etc., and lenses or glasses, devices for authenticity determination, CCD and CMOS image sensors, etc. The dye-based polarizing element system has high polarization performance even in the near-infrared region, and is also excellent in durability. Therefore, it is particularly suitable for various liquid crystal display applications, liquid crystal projectors, automotive applications, and outdoor displays (such as display applications or wearable applications such as industrial meters), which must have high polarization performance and durability. Reliable safety devices, etc.

[實施例] [Example]

以下,藉由實施例更詳細說明本發明,但此等係例示性者,且並非任何限定本發明者。又,記載於下述之「%」及「份」係只要無特別聲明,為質量基準。又,在各實施例及比較例使用之化合物的各構造式中,磺基等之酸性官能基係以游離酸之形態記載,但不限定於此。 Hereinafter, the present invention will be described in more detail with examples, but these are exemplary and do not limit the present inventors in any way. In addition, the "%" and "parts" described below are quality standards unless otherwise stated. Moreover, in each structural formula of the compound used in each Example and Comparative Example, the acidic functional group, such as a sulfonic group, is described in the form of a free acid, but it is not limited to this.

[合成例1] [Synthesis Example 1]

(步驟1) (step 1)

將4-胺基-5-羥基-2,7-萘二磺酸31.9份加入於水200份中,使用25%氫氧化鈉以pH6至8一邊調整一邊使其溶解之後,將4-甲苯磺醯氯19.1份保持於pH10.5至11.0並滴入,進行攪拌而使反應結束。其後,以氯化鈉鹽析之後,進行濾過而獲得下述式(101)所示之化合物之濕式濾餅142份。 After adding 31.9 parts of 4-amino-5-hydroxy-2,7-naphthalene disulfonic acid to 200 parts of water, using 25% sodium hydroxide to adjust the pH from 6 to 8 while dissolving, the 4-toluenesulfonic acid 19.1 parts of acetonitrile were kept at pH 10.5 to 11.0, dropped in, and stirred to complete the reaction. Thereafter, after salting out with sodium chloride, filtration was performed to obtain 142 parts of a wet cake of the compound represented by the following formula (101).

Figure 109122608-A0202-12-0047-63
Figure 109122608-A0202-12-0047-63

(步驟2) (Step 2)

將所得到之式(101)所示的化合物之濕式濾餅142份加入於水300份中,進行攪拌而使其懸浮,使用25%氫氧化鈉使pH成為9.0,於其中加入40%亞硝酸鈉水溶液15.5份。將所得到之懸浮液滴入於水100份與35%鹽酸37.5份之混合液中,調製重氮基液。另一方面,將8-胺基萘-2-磺酸20.1份加入水200份中,使用25%氫氧化鈉水溶液一邊將pH調整成6至8一邊溶解。在該液中,將先前所得到之重氮基液依需要而以35%鹽酸保持於pH4.5至6.0並滴入,進行攪拌而使偶合化反應結束。其後,以氯化鈉鹽析之後,進行濾過而獲得式(102)所示之單偶氮化合物的濕式濾餅148份。 142 parts of the wet cake of the compound represented by the formula (101) obtained was added to 300 parts of water, stirred to suspend it, 25% sodium hydroxide was used to make the pH 9.0, and 40% sodium hydroxide was added to it. 15.5 parts of sodium nitrate aqueous solution. The obtained suspension was dropped into a mixed liquid of 100 parts of water and 37.5 parts of 35% hydrochloric acid to prepare a diazonium base liquid. On the other hand, 20.1 parts of 8-aminonaphthalene-2-sulfonic acid was added to 200 parts of water, and it was dissolved while adjusting the pH to 6 to 8 using a 25% aqueous sodium hydroxide solution. In this solution, the previously obtained diazonium-based solution is maintained at pH 4.5 to 6.0 with 35% hydrochloric acid as needed, and dropped, and stirred to complete the coupling reaction. Then, after salting out with sodium chloride, filtration was performed and 148 parts of wet cakes of the monoazo compound represented by formula (102) were obtained.

Figure 109122608-A0202-12-0048-64
Figure 109122608-A0202-12-0048-64

(步驟3) (Step 3)

將所得到之式(102)所示的雙偶氮化合物之濕式濾餅148份加入於水300份中,進行攪拌而使其懸浮,使用25%氫氧化鈉使pH成為9.0,再於其中加入40%亞硝酸鈉水溶液10.9份。將所得到之懸浮液滴入於水100份與35%鹽酸26.3份之混合液中,調製重氮基液。另一方面,將8-胺基萘-2-磺酸14.0份加入水200份中,使用25%氫氧化鈉水溶液,一邊將pH調整成6至8一邊溶解。在該液中,將上述式(102)之重氮基液依需要而以35%鹽酸保持於pH4.5至6.0並滴入,進行攪拌並使偶合化反應結束。其後,以氯化鈉鹽析之後,濾過結晶而獲得下述式(103)所示之雙偶氮化合物的濕式濾餅138份。 Add 148 parts of the resulting wet cake of the bisazo compound represented by formula (102) to 300 parts of water, stir to suspend it, use 25% sodium hydroxide to make the pH 9.0, and then add it to it Add 10.9 parts of 40% sodium nitrite aqueous solution. The obtained suspension was dropped into a mixed liquid of 100 parts of water and 26.3 parts of 35% hydrochloric acid to prepare a diazonium base liquid. On the other hand, 14.0 parts of 8-aminonaphthalene-2-sulfonic acid was added to 200 parts of water, and a 25% sodium hydroxide aqueous solution was used to dissolve while adjusting the pH to 6 to 8. In this solution, the diazonium-based solution of the above formula (102) is maintained at pH 4.5 to 6.0 with 35% hydrochloric acid as needed, and dropped, followed by stirring to complete the coupling reaction. Thereafter, after salting out with sodium chloride, the crystal was filtered to obtain 138 parts of a wet cake of the disazo compound represented by the following formula (103).

Figure 109122608-A0202-12-0049-65
Figure 109122608-A0202-12-0049-65

將所得到之式(103)所示的單偶氮化合物之濕式濾餅138份加入於水300份中,進行攪拌而使其懸浮,使用25%氫氧化鈉使pH成為9.0,再於其中加入40%亞硝酸鈉水溶液7.6份。將所得到之懸浮液滴入於水100份與35%鹽酸18.4份之混合液中,調製重氮基液。另一方面,將1,5-二羥基萘-2,6-二磺酸14.1份加入水150份中,使用25%氫氧化鈉水溶液,一邊將pH調整成6至8一邊溶解。在該液中,將上述式(103)之重氮基液保持於pH6.5至8.0並滴入,進行攪拌並使偶合化反應結束。其後,以氯化鈉鹽析之後,藉由濾過結晶並乾燥,獲得下述式(104)所示之參偶氮化合物的濕式濾餅74.6份。 Add 138 parts of the obtained wet cake of the monoazo compound represented by formula (103) to 300 parts of water, stir to suspend it, use 25% sodium hydroxide to make the pH 9.0, and then add it to it Add 7.6 parts of 40% sodium nitrite aqueous solution. The obtained suspension was dropped into a mixed liquid of 100 parts of water and 18.4 parts of 35% hydrochloric acid to prepare a diazonium base liquid. On the other hand, 14.1 parts of 1,5-dihydroxynaphthalene-2,6-disulfonic acid was added to 150 parts of water, and a 25% sodium hydroxide aqueous solution was used to dissolve while adjusting the pH to 6 to 8. In this liquid, the diazonium base liquid of the above formula (103) is maintained at a pH of 6.5 to 8.0 and dropped, followed by stirring to complete the coupling reaction. Thereafter, after salting out with sodium chloride, the crystallization was filtered and dried to obtain 74.6 parts of a wet cake of the parazo compound represented by the following formula (104).

Figure 109122608-A0202-12-0049-66
Figure 109122608-A0202-12-0049-66

將所得到之上述式(104)所示之參偶氮化合物的濕式濾餅74.6份加入於水300份中,進行攪拌並使其懸浮,使用25%氫氧化鈉保持pH10.0至10.5而在50至55℃下攪拌2日。其後,以氯化鈉鹽析之後,藉由濾過並乾燥,獲得下述[化合物例1-5]所示之水溶性二色性染料9.0份。 74.6 parts of the obtained wet cake of the parazo compound represented by the above formula (104) was added to 300 parts of water, stirred and suspended, and the pH was maintained at 10.0 to 10.5 with 25% sodium hydroxide. Stir at 50 to 55°C for 2 days. Then, after salting out with sodium chloride, filtration and drying were performed to obtain 9.0 parts of the water-soluble dichroic dye shown in the following [Compound Example 1-5].

Figure 109122608-A0202-12-0050-67
Figure 109122608-A0202-12-0050-67

[合成例2] [Synthesis Example 2]

(步驟1) (step 1)

將2-胺基-5-硝苯磺酸21.8份加入於水500份中,使用25%氫氧化鈉一邊調整pH成為6至8,一邊使其溶解之後,加入35%鹽酸並使pH為0.2。於所得到之液中加入40%亞硝酸鈉水溶液17.3份,調製重氮基液。另一方面,將8-胺基萘-2-磺酸22.3份加入水200份中,使用25%氫氧化鈉水溶液,一邊將pH調整成6至8一邊溶解。在該液中,將先前所調製之重氮基液保持於pH4.5至6.0並滴入,進行攪拌並使偶合化反應結束。其後,以氯化鈉鹽析之後,進行濾過而獲得下述式(105)所示之單偶氮化合物的濕式濾餅241份。 Add 21.8 parts of 2-amino-5-nitrobenzenesulfonic acid to 500 parts of water, adjust the pH to 6 to 8 with 25% sodium hydroxide, and then dissolve it, then add 35% hydrochloric acid to make the pH 0.2 . 17.3 parts of 40% sodium nitrite aqueous solution was added to the obtained liquid to prepare a diazonium base liquid. On the other hand, 22.3 parts of 8-aminonaphthalene-2-sulfonic acid was added to 200 parts of water, and a 25% sodium hydroxide aqueous solution was used to dissolve while adjusting the pH to 6 to 8. In this liquid, the previously prepared diazonium base liquid was kept at pH 4.5 to 6.0 and dropped, and stirred to complete the coupling reaction. Then, after salting out with sodium chloride, filtration was performed and 241 parts of wet cakes of the monoazo compound represented by the following formula (105) were obtained.

Figure 109122608-A0202-12-0050-68
Figure 109122608-A0202-12-0050-68

(步驟2) (Step 2)

將所得到之上述式(105)所示的單偶氮化合物之濕式濾餅241份加入於水300份中,進行攪拌而使其懸浮,使用25%氫氧化鈉而使前述懸浮液設為pH9.0,再於其中加入40%亞硝酸鈉水溶液34.5份。將所得到之懸浮液滴入於水200份與35%鹽酸50份之混合液中,調製重氮基液。另一方面,將8-胺基萘-2-磺酸22.3份加入 水200份中,使用25%氫氧化鈉水溶液,一邊將pH調整成6至8一邊溶解。在該液中,將上述式(105)之重氮基液保持於pH4.5至6.0並滴入,進行攪拌並使偶合化反應結束。其後,以氯化鈉鹽析之後,進行濾過而獲得下述式(106)所示之雙偶氮化合物的濕式濾餅342份。 241 parts of the obtained wet cake of the monoazo compound represented by the above formula (105) was added to 300 parts of water, stirred and suspended, and 25% sodium hydroxide was used to make the aforementioned suspension pH 9.0, and then add 34.5 parts of 40% sodium nitrite aqueous solution to it. The obtained suspension was dropped into a mixed liquid of 200 parts of water and 50 parts of 35% hydrochloric acid to prepare a diazonium base liquid. On the other hand, 22.3 parts of 8-aminonaphthalene-2-sulfonic acid were added In 200 parts of water, a 25% sodium hydroxide aqueous solution was used to dissolve while adjusting the pH to 6 to 8. In this liquid, the diazonium base liquid of the above formula (105) is kept at pH 4.5 to 6.0 and dropped, and the coupling reaction is terminated by stirring. Then, after salting out with sodium chloride, filtration was performed and 342 parts of wet cakes of the disazo compound represented by the following formula (106) were obtained.

Figure 109122608-A0202-12-0051-69
Figure 109122608-A0202-12-0051-69

將所得到之上述式(106)所示的雙偶氮化合物之濕式濾餅68.4份加入於水400份中,進行攪拌而使其懸浮,使用25%氫氧化鈉而使前述懸浮液設為pH9.0,再於其中加入40%亞硝酸鈉水溶液13.8份。將所得到之懸浮液滴入於水100份與35%鹽酸40份之混合液中,調製重氮基液。另一方面,將8-胺基萘-2-磺酸4.5份加入水150份中,以25%氫氧化鈉水溶液,一邊將pH調整成6至8一邊溶解。在該液中,將上述式(106)之重氮基液依需要而以35%鹽酸保持於pH4.5至6.0並滴入,進行攪拌並使偶合化反應結束。其後,以氯化鈉鹽析之後,進行濾過而獲得下述式(107)所示之參偶氮化合物的濕式濾餅100份。 68.4 parts of the obtained wet cake of the bisazo compound represented by the above formula (106) was added to 400 parts of water, stirred and suspended, and 25% sodium hydroxide was used to make the aforementioned suspension pH 9.0, and then add 13.8 parts of 40% sodium nitrite aqueous solution to it. The obtained suspension was dropped into a mixed liquid of 100 parts of water and 40 parts of 35% hydrochloric acid to prepare a diazonium base liquid. On the other hand, 4.5 parts of 8-aminonaphthalene-2-sulfonic acid was added to 150 parts of water and dissolved in a 25% aqueous sodium hydroxide solution while adjusting the pH to 6 to 8. In this solution, the diazonium-based solution of the above formula (106) is maintained at pH 4.5 to 6.0 with 35% hydrochloric acid as needed and dropped, and the coupling reaction is completed by stirring. Thereafter, after salting out with sodium chloride, filtration was performed to obtain 100 parts of wet cake of the parazo compound represented by the following formula (107).

Figure 109122608-A0202-12-0051-70
Figure 109122608-A0202-12-0051-70

將所得到之上述式(107)所示的參偶氮化合物之濕式濾餅50份加入於水200份中,進行攪拌而使其懸浮,使用25%氫氧化鈉而使前述懸浮液設為pH9.0,再於其中加入40%亞硝酸鈉水溶液6.9份。將所得到之懸浮液滴入於水100份與35%鹽酸25份之混合液中,調製重氮基液。另一方面,將1,5-二羥基萘-2,6-二磺酸10.0份加入水100份中,使用25%氫氧化鈉水溶液,將pH調整成6至8並溶解。在該液中,將上述式(107)之重氮基液依需要而以35%鹽酸保持於Ph6.5至8.0並滴入,進行攪拌並使偶合化反應結束。其後,以氯化鈉鹽析之後,藉由進行濾過並乾燥,而獲得下述[化合物例1-29]所示之水溶性二色性染料5.0份。 Add 50 parts of the obtained wet cake of the parazo compound represented by the above formula (107) to 200 parts of water, stir to suspend it, and use 25% sodium hydroxide to make the aforementioned suspension pH 9.0, and then add 6.9 parts of 40% sodium nitrite aqueous solution to it. The obtained suspension was dropped into a mixed liquid of 100 parts of water and 25 parts of 35% hydrochloric acid to prepare a diazonium base liquid. On the other hand, 10.0 parts of 1,5-dihydroxynaphthalene-2,6-disulfonic acid was added to 100 parts of water, and a 25% sodium hydroxide aqueous solution was used to adjust the pH to 6 to 8 and dissolve. In this solution, the diazonium-based solution of the above formula (107) is maintained at Ph 6.5 to 8.0 with 35% hydrochloric acid as needed and dropped, followed by stirring to complete the coupling reaction. Thereafter, after salting out with sodium chloride, filtration and drying were performed to obtain 5.0 parts of the water-soluble dichroic dye shown in the following [Compound Example 1-29].

Figure 109122608-A0202-12-0052-84
Figure 109122608-A0202-12-0052-84

<使用[化合物例1-5]之偏光元件的製作> <Production of Polarizing Element Using [Compound Example 1-5]>

將皂化度99%以上之平均聚合度2400的聚乙烯醇膜(KURARAY公司製VF-PS # 7500)浸漬於45℃之溫水中3分鐘,進行膨潤處理,延伸1.30倍。在含有水1500質量份、無水芒硝1.5質量份、[化合物例1-5]0.30質量份之45℃的染色液中,浸漬經膨潤之膜15分鐘,使膜含有[化合物例1-5]所示之二色性染料。將所得到之膜浸漬於含有硼酸(富士膜和光純藥股份有限公司公司製)20g/l之40℃的水溶液中1分鐘。將浸漬後之膜置入於含有硼酸30.0g/l之50℃的水溶液(pH5.3)中,進行5分鐘之延伸處理,延伸5.0倍。藉由保持其拉緊狀態,同時浸漬於25℃之水中20秒鐘,洗淨處理所得到之膜。使洗淨後之膜在70℃下乾燥9分鐘,獲得偏光元件。 The polyvinyl alcohol film (VF-PS #7500 manufactured by KURARAY) with a saponification degree of 99% or more and an average degree of polymerization of 2400 was immersed in warm water at 45°C for 3 minutes, and then subjected to swelling treatment to extend 1.30 times. In a 45°C dyeing solution containing 1500 parts by mass of water, 1.5 parts by mass of anhydrous Glauber's salt, and 0.30 parts by mass of [Compound Example 1-5], immerse the swollen film for 15 minutes so that the film contains the [Compound Example 1-5] Shows the dichroic dye. The obtained film was immersed in a 40°C aqueous solution containing 20 g/l of boric acid (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) for 1 minute. The immersed film was placed in an aqueous solution (pH 5.3) at 50°C containing 30.0 g/l of boric acid, and subjected to an extension treatment for 5 minutes, extending 5.0 times. By maintaining its tension state, while immersing in water at 25°C for 20 seconds, the resulting film was washed. The cleaned film was dried at 70°C for 9 minutes to obtain a polarizing element.

<使用[化合物例1-29]之偏光元件之製作> <Production of Polarizing Element Using [Compound Example 1-29]>

將皂化度99%以上之平均聚合度2400的聚乙烯醇膜(KURARAY公司製VF-PS # 7500)浸漬於45℃之溫水中3分鐘,使其膨潤,延伸1.30倍。在含有水1500質量份、無水芒硝1.5質量份、[化合物例1-29]0.30質量份之45℃的染色液中,浸漬經膨潤之膜15分鐘,使膜含有[化合物例1-29]所示之二色性染料。將所得到之膜浸漬於含有硼酸(富士膜和光純藥股份有限公司公司製)20g/l之40℃的水溶液中1分鐘。將浸漬後之膜置入於含有硼酸22.0g/l、硼砂8.0g/l之50℃的水溶液(pH7.0)中,進行5分鐘之延伸處理,延伸5.0倍。藉由保持其拉緊狀態,同時浸漬於25℃之水中20秒鐘,洗淨處理所得到之膜。使洗淨後之膜在70℃下乾燥9分鐘,獲得偏光元件。 The polyvinyl alcohol film (VF-PS #7500 manufactured by KURARAY) with a saponification degree of 99% or more and an average degree of polymerization of 2400 was immersed in warm water at 45°C for 3 minutes to swell and stretch 1.30 times. In a 45°C dyeing solution containing 1500 parts by mass of water, 1.5 parts by mass of anhydrous Glauber's salt, and 0.30 parts by mass of [Compound Example 1-29], immerse the swollen film for 15 minutes so that the film contains the [Compound Example 1-29] Shows the dichroic dye. The obtained film was immersed in a 40°C aqueous solution containing 20 g/l of boric acid (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) for 1 minute. The immersed film was placed in a 50°C aqueous solution (pH 7.0) containing 22.0 g/l of boric acid and 8.0 g/l of borax, and subjected to an extension treatment for 5 minutes to extend 5.0 times. By maintaining its tension state, while immersing in water at 25°C for 20 seconds, the resulting film was washed. The cleaned film was dried at 70°C for 9 minutes to obtain a polarizing element.

(偏光元件之極大吸收波長、其穿透率及偏光度之測定) (Determination of the maximum absorption wavelength of the polarizing element, its transmittance and the degree of polarization)

對於使用上述[化合物例1-5]而製作成之偏光元件、及使用上述[化合物例1-29]而製作成之偏光元件,測定極大吸收波長、其波長之單體穿透率(%)、及其偏光度(%)。在偏光元件之極大吸收波長(nm,λmax)之測定及偏光度之算出中,偏光入射時之平行穿透率(Ky,%)、以及正交穿透率(Kz,%)係使用設有格蘭-湯姆森(Glan-Thompson)偏光板(200至2600nm用偏光板)之分光光度計(日立製作所製U-4100),使偏光入射於測定試料而測定。在此,所謂平行穿透率(Ky)係測定時所使用之絕對偏光片之吸收軸與偏光元件之吸收軸為平行時之穿透率,所為正交穿透率(Kz)係測定時所使用之絕對偏光片之吸收軸與偏光元件之吸收軸表示正交時之穿透率。各波長之平行穿透率及正交穿透率係在380至1200nm中以5nm間隔測定。使用分別測定之值,從下述式(i)算出各波長之單體穿透率,從下述式(ii)算出各波長之偏光度,獲得在380至1200nm最高時之偏光度、其極大吸收波長(λmax)、及單體穿透率。又,將Ky、及Kz換算為吸光度,從此處所得到之吸光度 比,算出最高的吸光度比作為二色比(Rd)。又,確認出其二色比為5以上之區域,以及二色比為10以上之區域。 For the polarizing element produced using the above [Compound Example 1-5] and the polarizing element produced using the above [Compound Example 1-29], the maximum absorption wavelength and the monomer transmittance (%) of the wavelength were measured , And its polarization (%). In the measurement of the maximum absorption wavelength (nm, λmax) of the polarizing element and the calculation of the degree of polarization, the parallel transmittance (Ky, %) and orthogonal transmittance (Kz, %) when polarized light is incident are used with A spectrophotometer (U-4100 manufactured by Hitachi, Ltd.) of a Glan-Thompson polarizing plate (polarizing plate for 200 to 2600 nm) was measured by making polarized light incident on the measurement sample. Here, the so-called parallel transmittance (Ky) is the transmittance when the absorption axis of the absolute polarizer used in the measurement is parallel to the absorption axis of the polarizing element, and the orthogonal transmittance (Kz) is determined during the measurement. The absorption axis of the absolute polarizer used and the absorption axis of the polarizing element represent the transmittance when orthogonal. The parallel transmittance and orthogonal transmittance of each wavelength are measured at intervals of 5 nm from 380 to 1200 nm. Using the measured values, calculate the monomer transmittance of each wavelength from the following formula (i), and calculate the polarization degree of each wavelength from the following formula (ii) to obtain the maximum polarization degree at 380 to 1200 nm. Absorption wavelength (λmax), and monomer transmittance. Also, convert Ky and Kz into absorbance, and the absorbance obtained from here Calculate the highest absorbance ratio as the dichroic ratio (Rd). In addition, areas with a two-color ratio of 5 or more and areas with a two-color ratio of 10 or more were confirmed.

將所得到之偏光元件之偏光度最高的波長(λmax)之光學特性、以及Rd為5以上、及Rd為10以上之區域的波長之結果表示於表2中。 Table 2 shows the optical characteristics of the wavelength (λmax) at which the degree of polarization of the obtained polarizer is the highest, and the results of the wavelength in the region where Rd is 5 or more and Rd is 10 or more.

(式1)單體穿透率(%)=(Ky+Kz)/2 (i) (Formula 1) monomer penetration rate (%)=(Ky+Kz)/2 (i)

(式2)偏光度(%)=[(Ky-Kz)/(Ky+Kz)]×100 (ii) (Equation 2) Polarization (%)=[(Ky-Kz)/(Ky+Kz)]×100 (ii)

[表2]

Figure 109122608-A0202-12-0054-79
[Table 2]
Figure 109122608-A0202-12-0054-79

如表1所述,使用上述[化合物例1-5]所製作之偏光元件、及使用上述[化合物例1-29]所製作之偏光元件係在極大吸收波長(λmax)中,具有高的偏光性能,任一者皆在近紅外線區域具有二色比(Rd)5以上之吸收各向異性。又,為在1080nm存在二色比10以上之帶域,且在廣帶域的區域具有高的偏光度之偏光元件。 As shown in Table 1, the polarizing element produced using the above [Compound Example 1-5] and the polarizing element produced using the above [Compound Example 1-29] have high polarization at the maximum absorption wavelength (λmax) Performance, any one of them has absorption anisotropy of dichroic ratio (Rd) 5 or more in the near-infrared region. In addition, it is a polarizing element in which a band with a dichroic ratio of 10 or more exists at 1080 nm and a high degree of polarization in a wide-band region.

<兩面黏著薄片之製作> <Production of Adhesive Sheets on Both Sides>

依據專利文獻9之實施例1之配方,獲得用以接著基板與偏光元件之兩面黏接著薄片。專利文獻9之內容係藉由參照而摘入於本案說明書中。 According to the formula of Example 1 of Patent Document 9, a double-sided adhesive sheet for bonding the substrate and the polarizing element was obtained. The content of Patent Document 9 is incorporated into the specification of this case by reference.

具體而言,係將丙烯酸正丁酯94g、丙烯酸2-羥基乙酯1g、及N,N-二甲基丙烯醯胺5g溶解於乙酸乙酯185g中,添加偶氮雙異丁腈0.05g,在70℃聚合5小時而 獲得丙烯酸樹脂共聚物溶液。所得到之丙烯酸共聚物係以聚苯乙烯換算之凝膠滲透色層分析(GPC)所得到之重量平均分子量:1,100,000。繼而,在所得到之共聚物溶液加入乙酸乙酯,以樹脂成分成為22.5重量%的方式調製,獲得丙烯酸系黏著劑。將所得到之樹脂成分含量22.5重量%之丙烯酸系黏著劑以固體成分含量計79重量份、異氰酸酯系交聯劑(TOSOH公司製CORONATE RTMHL)0.035重量份、3-環氧丙氧基丙基三甲氧基矽烷(信越化學公司製KBM-403)0.009重量份、二月桂酸二丁基錫(純正化學公司製)0.002重量份、具有丙烯酸基之烷氧基矽烷的3-丙烯醯氧基丙基三甲氧基矽烷(信越化學公司製KBM-5103)17重量份、作為2官能之光聚合性化合物的KAYARAD R-115(日本化藥公司製)2重量份、作為光聚合起始劑之IRGACURE(IRGACURE)-184(BASF公司製)2重量份、及2-丁酮32重量份進行混合,獲得在本發明使用之調配組成物。以所得到之配合組成物之固體成分含量成為20重量份之方式加入甲乙酮,混合1小時,獲得黏著薄片用之本發明調配組成物。使用塗佈機,將所得到之調配組成物挾在2片之離型膜(聚對苯二甲酸乙二酯膜)間,成形為薄片狀。所得到之薄片係厚度20μm,使用來作為積層體用之兩面黏接著薄片。 Specifically, 94 g of n-butyl acrylate, 1 g of 2-hydroxyethyl acrylate, and 5 g of N,N-dimethylacrylamide were dissolved in 185 g of ethyl acetate, and 0.05 g of azobisisobutyronitrile was added. Polymerize at 70°C for 5 hours while An acrylic resin copolymer solution is obtained. The obtained acrylic copolymer has a weight average molecular weight obtained by gel permeation chromatography (GPC) in terms of polystyrene: 1,100,000. Then, ethyl acetate was added to the obtained copolymer solution, and it prepared so that a resin component might become 22.5% by weight, and an acrylic adhesive was obtained. The obtained acrylic adhesive with a resin content of 22.5% by weight was 79 parts by weight in terms of solid content, an isocyanate-based crosslinking agent (CORONATE RTMHL manufactured by TOSOH) 0.035 parts by weight, and 3-glycidoxypropyl trimethyl Oxysilane (KBM-403 manufactured by Shin-Etsu Chemical Co., Ltd.) 0.009 parts by weight, dibutyltin dilaurate (manufactured by Junsei Chemical Co., Ltd.) 0.002 parts by weight, 3-propenyloxypropyl trimethoxy silane having an acrylic group-containing alkoxysilane 17 parts by weight of silane (KBM-5103 manufactured by Shin-Etsu Chemical Co., Ltd.), 2 parts by weight of KAYARAD R-115 (manufactured by Nippon Kayaku Co., Ltd.) as a bifunctional photopolymerizable compound, and IRGACURE (IRGACURE) as a photopolymerization initiator 2 parts by weight of -184 (manufactured by BASF Corporation) and 32 parts by weight of 2-butanone were mixed to obtain the compounding composition used in the present invention. Methyl ethyl ketone was added so that the solid content of the obtained compound composition became 20 parts by weight, and the mixture was mixed for 1 hour to obtain the compound composition of the present invention for adhesive sheets. Using a coater, the obtained compounding composition was sandwiched between two release films (polyethylene terephthalate films) and formed into a sheet. The obtained sheet has a thickness of 20 μm and is used as a double-sided adhesive sheet for a laminate.

<基板對親水性高分子膜中之硼化合物保持率的影響> <The influence of the substrate on the retention rate of the boron compound in the hydrophilic polymer film>

(1)作為試驗對象之基板 (1) The substrate as the test object

樹脂基板-1 Resin substrate-1

將日本化藥公司製PET-30(新戊四醇三丙烯酸酯)10重量份、甲苯5重量份、及1-羥基環己基苯基酮(BASF公司製IRGACURE 184)0.6重量份進行混合,照射紫外線而形成。 10 parts by weight of PET-30 (neopentylerythritol triacrylate) manufactured by Nippon Kayaku Co., Ltd., 5 parts by weight of toluene, and 0.6 parts by weight of 1-hydroxycyclohexyl phenyl ketone (IRGACURE 184 manufactured by BASF) were mixed and irradiated Formed by ultraviolet rays.

樹脂基板-2 Resin substrate-2

將日本化藥公司製PET-30(新戊四醇三丙烯酸酯)5重量份、日立化成製FA-511A(丙烯酸二環戊烯基酯)5重量份、甲苯5重量份、及1-羥基環己基苯基酮(BASF公司製IRGACURE 184)0.6重量份進行混合,照射紫外線而形成。 5 parts by weight of PET-30 (neopentyl erythritol triacrylate) manufactured by Nippon Kayaku Co., Ltd., 5 parts by weight of FA-511A (dicyclopentenyl acrylate) manufactured by Hitachi Chemical Co., Ltd., 5 parts by weight of toluene, and 1-hydroxyl 0.6 parts by weight of cyclohexyl phenyl ketone (IRGACURE 184 manufactured by BASF Corporation) was mixed and irradiated with ultraviolet rays to form it.

樹脂基板-3 Resin substrate-3

將日本化藥公司製PEG-400DA(聚乙二醇二丙烯酸酯)10重量份、甲苯5重量份、及1-羥基環己基苯基酮(BASF公司製IRGACURE 184)0.6重量份進行混合,照射紫外線而形成。 10 parts by weight of PEG-400DA (polyethylene glycol diacrylate) manufactured by Nippon Kayaku Co., Ltd., 5 parts by weight of toluene, and 0.6 part by weight of 1-hydroxycyclohexyl phenyl ketone (IRGACURE 184 manufactured by BASF) were mixed and irradiated Formed by ultraviolet rays.

樹脂基板-4 Resin substrate-4

使用日本ZEON公司製之環烯烴製膜(商品名:Zeonor)。 Cycloolefin membrane (trade name: Zeonor) manufactured by Japan's ZEON company was used.

樹脂基板-5 Resin substrate-5

依據國際公開專利WO2006-112223之實施例1的記載而將丙烯酸系樹脂製膜成40μm而作成。 According to the description of Example 1 of International Publication WO2006-112223, the acrylic resin was formed into a film of 40 μm.

無機基板-1 Inorganic substrate-1

使用河村久藏公司製白板透明板玻璃基板。 Use the whiteboard transparent glass substrate made by Kawamura Kuzou.

無機基板-2 Inorganic substrate-2

使用岩手村田製作所股份有限公司製水晶基板。 The crystal substrate made by Iwate Murata Manufacturing Co., Ltd. is used.

TAC膜 TAC film

作為比較,以TAC膜(富士膜公司製TD-80U)作為試驗對象。 For comparison, a TAC film (TD-80U manufactured by Fuji Film Co., Ltd.) was used as a test object.

(2)測定試料之製作 (2) Preparation of measurement samples

將作為親水性高分子膜之皂化度99%以上的平均聚合度2400之聚乙烯醇膜(KURARAY公司製VF-PS # 7500)浸漬於45℃之溫水中3分鐘,進行膨潤,延伸1.30倍。在45℃之溫水中浸漬經膨潤之膜15分鐘,將所得到之膜浸漬於含有硼酸 (富士膜和光純藥股份有限公司公司製)20g/l之40℃的水溶液中1分鐘。將浸漬後之膜在含有硼酸30.0g/l之50℃的水溶液中進行5分鐘之延伸處理而延伸成5.0倍。將所得到之膜保持其拉緊狀態,同時浸漬於25℃之水中20秒鐘,藉此,進行洗淨處理。使洗淨後之膜在70℃乾燥9分鐘而獲得含有硼化合物之聚乙烯醇膜。含有所得到之硼化合物的聚乙烯醇膜,係使用將聚乙烯醇(日本VAM & POVAL公司製NH-26)以4%溶解於水中而成者作為接著劑,將經鹼處理之三乙酸纖維素膜(富士膜公司製TD-80,以下,省略為TAC膜)積層於單面,再將各基板於另一面隔著上述兩面黏接著薄片而積層,以所謂基板/兩面黏接著薄片/含有硼化合物之聚乙烯醇膜/PVA接著劑層/TAC膜/兩面黏接著薄片/玻璃的構成,製作測定試料。 A polyvinyl alcohol film (VF-PS #7500 manufactured by KURARAY), which is a hydrophilic polymer film with a saponification degree of 99% or higher and an average degree of polymerization of 2400, was immersed in warm water at 45°C for 3 minutes, swelled, and stretched 1.30 times. Soak the swollen membrane in warm water at 45°C for 15 minutes, and immerse the resulting membrane in boric acid (Manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) 20 g/l in an aqueous solution at 40°C for 1 minute. The immersed film is stretched to 5.0 times by stretching in an aqueous solution containing 30.0 g/l of boric acid at 50°C for 5 minutes. While maintaining the tensioned state of the obtained film, it is immersed in water at 25°C for 20 seconds, thereby performing a washing treatment. The washed film was dried at 70°C for 9 minutes to obtain a polyvinyl alcohol film containing a boron compound. The polyvinyl alcohol film containing the obtained boron compound is prepared by dissolving polyvinyl alcohol (NH-26 manufactured by VAM & POVAL Co., Ltd., Japan) at 4% in water as an adhesive. A plain film (TD-80 manufactured by Fujifilm Co., Ltd., hereinafter, abbreviated as TAC film) is laminated on one side, and then each substrate is laminated on the other side via the above-mentioned two-sided adhesive sheet. The so-called substrate/two-sided adhesive sheet/contains The composition of boron compound polyvinyl alcohol film/PVA adhesive layer/TAC film/adhesive sheet on both sides/glass was used to prepare measurement samples.

(3)試驗方法 (3) Test method

將所得到之測定試料放置於80℃、相對濕度90%RH之環境下1000小時之後,僅取出含有硼化合物之聚乙烯醇膜,測定殘留於聚乙烯醇膜之硼化合物量。 After placing the obtained measurement sample in an environment of 80°C and a relative humidity of 90%RH for 1000 hours, only the polyvinyl alcohol film containing the boron compound was taken out, and the amount of boron compound remaining on the polyvinyl alcohol film was measured.

硼化合物含量係首先,在水50g中使含有硼化合物之聚乙烯醇膜約0.05g溶解,並煮沸60分鐘,使聚乙烯醇膜溶解或完全膨潤,冷卻至常溫,加入D(-)-甘露醇3g,滴入0.05mol/l之氫氧化鈉水溶液至成為pH=8.4,藉由其滴入之量,求出硼酸濃度,作為硼化合物之含量。硼化合物之含量係藉由式(iii)而求得。此時之B係僅以水滴入氫氧化鈉時,顯示成為pH=8.4之滴入量(ml)。F係表示氫氧化鈉水溶液之因子。 The content of boron compound is firstly, dissolve about 0.05g of polyvinyl alcohol film containing boron compound in 50g of water, and boil for 60 minutes to dissolve or completely swell the polyvinyl alcohol film, cool to normal temperature, add D(-)-mannan 3 g of alcohol, 0.05 mol/l sodium hydroxide aqueous solution was dropped to pH=8.4, and the concentration of boric acid was calculated from the dropped amount as the content of the boron compound. The content of the boron compound is obtained by formula (iii). At this time, when only sodium hydroxide is dripped into B system, the dripping amount (ml) of pH=8.4 is displayed. F represents the factor of sodium hydroxide aqueous solution.

(式3)硼化合物含量(%)=(氫氧化鈉之滴定量[ml]-B)×F×0.30915/偏光發光元件之重量[g] (iii) (Formula 3) Boron compound content (%)=(NaOH titer [ml]-B)×F×0.30915/weight of polarized light-emitting element [g] (iii)

將供給至透濕度、及硼化合物之保持率的測定之各基板與其試驗結果一起表示於下述表3。 The respective substrates supplied to the measurement of the moisture permeability and the retention of the boron compound are shown in Table 3 below together with the test results.

[表3]

Figure 109122608-A0202-12-0058-80
[table 3]
Figure 109122608-A0202-12-0058-80

如上述,可知樹脂基板-3、TAC膜未滿足上述a)之條件。 As described above, it can be seen that the resin substrate-3 and the TAC film do not satisfy the condition a) above.

<透濕度之測定> <Determination of moisture permeability>

(1)具有樹脂基板之測定用試料的製作 (1) Preparation of test sample with resin substrate

樹脂基板-1 Resin substrate-1

在半晒牛皮紙(取自TOTSUYA ECHO股份有限公司)上將固體成分濃度5%之聚乙烯醇錨定塗佈成1μm之厚度而成者中,混合日本化藥公司製PET-30(新戊四醇三丙烯酸酯)10重量份、甲苯5重量份、1-羥基環己基苯基酮(BASF公司製IRGACURE 184)0.6重量份,調製形成樹脂基板-1之組成物。將其組成物以溶劑揮發後之樹脂固體成分成為5μm厚度之方式塗佈於錨定塗佈有聚乙烯醇而成之該半晒牛皮紙上,製作具有樹脂基板-1之測定試料。 The semi-suned kraft paper (taken from TOTSUYA ECHO Co., Ltd.) is formed by anchoring and coating polyvinyl alcohol with a solid content concentration of 5% to a thickness of 1 μm, and blending PET-30 (Nippon Kayaku Co., Ltd.) Alcohol triacrylate) 10 parts by weight, 5 parts by weight of toluene, and 0.6 parts by weight of 1-hydroxycyclohexyl phenyl ketone (IRGACURE 184 manufactured by BASF) were prepared to form a resin substrate-1 composition. The composition was coated on the semi-suned kraft paper anchor-coated with polyvinyl alcohol so that the resin solid content after solvent volatilization became 5 μm thickness to prepare a measurement sample with a resin substrate-1.

樹脂基板-2 Resin substrate-2

除了將日本化藥公司製PET-30(新戊四醇三丙烯酸酯)10重量份取代成日本化藥公司製PET-30(新戊四醇三丙烯酸酯)5重量份、及日立化成製FA-511A(丙烯 酸二環戊烯基酯)5重量份以外,其餘係同樣方式,製作具有樹脂基板-2之測定試料。 In addition to replacing 10 parts by weight of Nippon Kayaku Corporation PET-30 (neopentyl erythritol triacrylate) with 5 parts by weight of Nippon Kayaku Corporation PET-30 (neopentyl erythritol triacrylate), and Hitachi Chemical's FA -511A (acrylic Except for 5 parts by weight of dicyclopentenyl acid), the rest is the same to prepare a measurement sample having a resin substrate-2.

樹脂基板-3 Resin substrate-3

除了將日本化藥公司製PET-30(新戊四醇三丙烯酸酯)10重量份取代成日本化藥公司製PEG-400DA(聚乙二醇二丙烯酸酯)10重量份以外,其餘係同樣方式,製作具有樹脂基板-3之測定試料。 Except that 10 parts by weight of PET-30 (neopentylerythritol triacrylate) manufactured by Nippon Kayaku Co., Ltd. is replaced by 10 parts by weight of PEG-400DA (polyethylene glycol diacrylate) manufactured by Nippon Kayaku Co., Ltd., the rest is the same. , Prepare a measurement sample with resin substrate-3.

樹脂基板-4 Resin substrate-4

以日本ZEON公司製之環烯烴製膜(商品名:Zeonor)作為測定試料。 Cycloolefin membrane (trade name: Zeonor) manufactured by ZEON Corporation of Japan was used as a measurement sample.

樹脂基板-5 Resin substrate-5

依據國際公開專利WO2006-112223之實施例1的記載,以將丙烯酸系樹脂製膜成40μm而作成之膜作為測定試料。 According to the description of Example 1 of International Publication WO2006-112223, a film made by forming an acrylic resin into a film of 40 μm was used as a measurement sample.

無機基板-1 Inorganic substrate-1

以河村久藏公司製白板透明板玻璃基板作為無機基板-1。 A whiteboard transparent glass substrate made by Kawamura Kuzou was used as the inorganic substrate-1.

無機基板-2 Inorganic substrate-2

以岩手村田製作所公司製水晶基板作為無機基板-2。 A crystal substrate made by Iwate Murata Manufacturing Co., Ltd. was used as the inorganic substrate-2.

(2)透濕度之測定 (2) Measurement of moisture permeability

使用L80-5000型 水蒸氣穿透度計(Systech Instruments公司製)測定各基板之透濕度。 The moisture permeability of each substrate was measured using an L80-5000 water vapor permeability meter (manufactured by Systech Instruments).

將在本案實施例使用之基板的透濕度之測定結果表示於下述表4中。表4中,ND係表示測定下限值以下。 The measurement results of the moisture permeability of the substrates used in the examples of this case are shown in Table 4 below. In Table 4, the ND system represents the lower limit of measurement or less.

[表4]

Figure 109122608-A0202-12-0060-81
[Table 4]
Figure 109122608-A0202-12-0060-81

可知樹脂基板-3未滿足上述b)之條件。 It can be seen that the resin substrate-3 does not satisfy the above-mentioned condition b).

<實施例1> <Example 1>

將上述樹脂基板-1以形成後之膜厚成為5μm之方式設置於三乙酸纖維素膜(富士膜公司製TD-80U、以下簡稱為TAC膜),製作具有樹脂基板-1之TAC膜。將具有樹脂基板-1之TAC膜浸漬於pH=11之氫氧化鈉水溶液中10分鐘之後,浸漬於pH=6之水溶液中1分鐘。使用4%聚乙烯醇水溶液(日本VAM & POVAL公司製NH-26 4%水溶液)而將進行處理所得到之具有樹脂基板-1的TAC膜之TAC面、與使用上述[化合物例1-5]製作之偏光元件接著。再者,以偏光元件被TAC膜挾持之方式,使用4%聚乙烯醇水溶液而將僅進行皂化處理之TAC膜接著。在以接著劑貼合之膜的TAC面上,以乾燥後之厚度成為20μm之方式塗佈日本化藥公司製黏著劑PTR-3000而形成黏著層,在形成有黏著層之側貼合於玻璃,獲得偏光板。亦即,獲得一種使用樹脂基板-1/TAC膜/接著層/[化合物例1-5]來製作並成為偏光元件/接著層/TAC膜/黏著層/玻璃的偏光板。 The resin substrate-1 was placed on a cellulose triacetate film (TD-80U manufactured by Fujifilm Co., Ltd., hereinafter referred to as TAC film) so that the film thickness after formation was 5 μm, and a TAC film having the resin substrate-1 was produced. After immersing the TAC film with the resin substrate-1 in a pH=11 aqueous sodium hydroxide solution for 10 minutes, it is immersed in a pH=6 aqueous solution for 1 minute. Using 4% polyvinyl alcohol aqueous solution (NH-26 4% aqueous solution manufactured by Japan VAM & POVAL Co., Ltd.), the TAC surface of the TAC film with resin substrate-1 obtained by the treatment, and the above-mentioned [Compound Example 1-5] The produced polarizing element is then connected. Furthermore, in a manner that the polarizing element is held by the TAC film, a 4% polyvinyl alcohol aqueous solution is used to bond the TAC film that has only undergone saponification treatment. On the TAC surface of the film bonded with the adhesive, the adhesive PTR-3000 manufactured by Nippon Kayaku Co., Ltd. is coated so that the thickness after drying becomes 20 μm to form an adhesive layer, and the adhesive layer is formed on the side of the glass. , Get a polarizing plate. That is, a polarizing plate produced by using the resin substrate-1/TAC film/adhesive layer/[Compound Example 1-5] to become a polarizing element/adhesive layer/TAC film/adhesive layer/glass was obtained.

<實施例2> <Example 2>

在上述實施例1中,除了將上述樹脂基板-1改變成上述樹脂基板-2以外,係與實施例1同樣方式,獲得一種使用樹脂基板-2/TAC膜/接著劑層/[化合物例1-5]來製作並成為偏光元件/接著劑層/TAC膜/黏著層/玻璃之偏光板。 In the above-mentioned Example 1, except that the above-mentioned resin substrate-1 was changed to the above-mentioned resin substrate-2, in the same manner as in Example 1, a resin substrate-2/TAC film/adhesive layer/[Compound Example 1 -5] to make and become a polarizing plate of polarizing element/adhesive layer/TAC film/adhesive layer/glass.

<實施例3> <Example 3>

在上述實施例1中,除了將形成有樹脂基板-1之TAC膜改變成應用電暈處理之環烯烴膜(日本ZEON公司製Zeonor)以外,係與實施例1同樣方式,獲得一種使用環烯烴膜/接著劑層/[化合物例1-5]來製作並成為偏光元件/接著劑層/TAC膜/黏著層/玻璃之偏光板。 In the above-mentioned Example 1, except that the TAC film formed with the resin substrate-1 was changed to a cycloolefin film (Zeonor manufactured by ZEON Corporation, Japan) applied corona treatment, the same method as in Example 1 was used to obtain a cycloolefin film. Film/adhesive layer/[Compound Example 1-5] is produced and becomes a polarizing plate of polarizing element/adhesive layer/TAC film/adhesive layer/glass.

<實施例4> <Example 4>

在使用上述實施例1中使用的[化合物例1-5]之偏光元件的兩面,貼合上述之兩面黏接著薄片,一單面貼合玻璃,一單面係貼合水晶,獲得一種使用玻璃/兩面黏接著薄片/[化合物例1-5]來製作並成為偏光元件/兩面黏接著薄片/水晶之偏光板。 Using the two sides of the polarizing element of [Compound Example 1-5] used in Example 1 above, the above-mentioned two-sided adhesive sheet was laminated, one side was laminated with glass, and the other side was laminated with crystal to obtain a glass /Adhesive sheet on both sides/[Compound Example 1-5] to produce and become a polarizing element/adhesive sheet on both sides/crystal polarizing plate.

<實施例5> <Example 5>

在上述實施例1中,除了將形成有樹脂基板-1之TAC膜改變成形成有易接著層之樹脂基板-5,且將使用[化合物例1-5]之偏光元件改變成使用上述[化合物例1-29]而製作之偏光元件以外,係與實施例1同樣方式,獲得一種使用丙烯酸膜/接著劑層/[化合物例1-29]來製作並成為偏光元件/接著劑層/TAC膜/黏著層/玻璃的實施例5之偏光板。 In the above-mentioned Example 1, except that the TAC film formed with the resin substrate-1 was changed to the resin substrate-5 with the easy-adhesive layer formed, and the polarizing element using [Compound Example 1-5] was changed to use the above-mentioned [Compound Example 1-29] Except for the polarizing element produced, in the same manner as in Example 1, an acrylic film/adhesive layer/[Compound Example 1-29] was obtained to produce and became a polarizing element/adhesive layer/TAC film /Adhesive layer/Glass Polarizing plate of Example 5.

<實施例6> <Example 6>

在上述實施例2中,除了將使用[化合物例1-5]而製作之偏光元件改變成使用上述[化合物例1-29]製作之偏光元件以外,係與實施例2同樣方式,獲得一種使用 樹脂基板-2/TAC膜/接著劑層/[化合物例1-29]來製作並成為偏光元件/接著劑層/TAC膜/黏著層/玻璃之偏光板。 In the above-mentioned Example 2, except that the polarizing element produced using [Compound Example 1-5] was changed to the polarizing element produced using the above-mentioned [Compound Example 1-29], it was carried out in the same manner as in Example 2 to obtain a Resin substrate-2/TAC film/adhesive layer/[Compound Example 1-29] was produced and became a polarizing plate of polarizing element/adhesive layer/TAC film/adhesive layer/glass.

<比較例1> <Comparative Example 1>

在上述實施例1中,除了不使用樹脂基板-1以外,其餘係與實施例1同樣方式,獲得一種使用TAC膜/接著劑層/[化合物例1-5]來製作並成為偏光元件/接著劑層/TAC膜/黏著層/玻璃之比較例1的偏光板。 In the above Example 1, except that the resin substrate-1 is not used, the rest is the same as in Example 1. A TAC film/adhesive layer/[Compound Example 1-5] is obtained to produce and become a polarizing element/adhesive The polarizing plate of Comparative Example 1 of agent layer/TAC film/adhesive layer/glass.

<比較例2> <Comparative Example 2>

在上述實施例1中,除了使用上述樹脂基板-3取代樹脂基板-1以外,係與實施例1同樣方式,獲得一種使用樹脂基板-3/TAC膜/接著劑層/[化合物例1-5]來製作並成為偏光元件/接著劑層/TAC膜/黏著層/玻璃之偏光板。 In the above-mentioned Example 1, except that the above-mentioned resin substrate-3 was used instead of the resin substrate-1, in the same manner as in Example 1, a resin substrate-3/TAC film/adhesive layer/[Compound Example 1-5 ] To produce and become a polarizing element/adhesive layer/TAC film/adhesive layer/glass polarizing plate.

將所得到之實施例1至6及比較例1至2之偏光板放置於相對濕度90%RH、80℃之環境下1000小時,確認出該高溫高濕處理前後之950nm中的Ky(%)、Kz(%)、單體穿透率(%)、偏光度(%)、及Rd之各光學特性之變化。將其結果表示於表5中。 The obtained polarizing plates of Examples 1 to 6 and Comparative Examples 1 to 2 were placed in an environment with a relative humidity of 90%RH and 80°C for 1000 hours, and the Ky(%) in 950nm before and after the high temperature and high humidity treatment was confirmed , Kz (%), monomer transmittance (%), polarization (%), and changes in the optical properties of Rd. The results are shown in Table 5.

[表5]

Figure 109122608-A0202-12-0062-82
[table 5]
Figure 109122608-A0202-12-0062-82

如上述表5所示,在比較例1、2中,上述應用後之950nm之Ky係分別從79.82%大幅度降低至48.58%,從79.25%大幅度降低至49.83%,單體穿透率 係分別從39.97%大幅度降低至24.92%,從39.67%大幅度降低至25.47%。相對於此,可知在實施例1至6中,Ky、及單體穿透率係單體穿透率之變化為最大的實施例6,Ky係僅從81.98%變化至80.54%,在單體穿透率中係從42.30%至41.43%,為0.87%左右的變化,約略維持初期之狀態。從此情形,可知實施例1至6之偏光板係具有極高的濕熱耐久性。 As shown in Table 5 above, in Comparative Examples 1 and 2, the Ky system at 950 nm after the above application is greatly reduced from 79.82% to 48.58%, and from 79.25% to 49.83%, respectively, and the monomer penetration rate is greatly reduced. Departments were significantly reduced from 39.97% to 24.92%, and from 39.67% to 25.47%. In contrast to this, it can be seen that in Examples 1 to 6, Ky and monomer transmittance are the largest change in monomer transmittance, and Ky is only changed from 81.98% to 80.54%. The penetration rate varies from 42.30% to 41.43%, which is about 0.87%, and it maintains approximately the initial state. From this situation, it can be seen that the polarizing plates of Examples 1 to 6 have extremely high damp heat durability.

<耐光性試驗> <Light resistance test>

對於上述實施例4與比較例1所製作之偏光板,以氙弧光試驗機(SUGA試驗機公司製;SX-75)在150W、環境溫度70℃、環境濕度50%下,實施例4係從玻璃側,比較例1係從TAC膜側進行240小時之光照射試驗。確認出光照射前後在950nm之Ky(%)、Kz(%)、單體穿透率(%)、偏光度(%)、及Rd之各光學特性之變化。將其結果表示於表6中。 For the polarizing plates produced in the above-mentioned Example 4 and Comparative Example 1, a xenon arc tester (manufactured by SUGA Tester; SX-75) at 150W, an ambient temperature of 70°C, and an ambient humidity of 50%, was used in Example 4 On the glass side, in Comparative Example 1, a 240-hour light irradiation test was performed from the TAC film side. Confirm the changes in the optical properties of Ky (%), Kz (%), monomer transmittance (%), polarization (%), and Rd at 950 nm before and after light irradiation. The results are shown in Table 6.

[表6]

Figure 109122608-A0202-12-0063-83
[Table 6]
Figure 109122608-A0202-12-0063-83

從表6之結果,在耐光性試驗中,實施例4係950nm之變化為僅從0.1145%變化成0.2615%,但比較例1係從0.1132大幅度變化為5.2350%。即使在偏光度中,實施例4係維持99%以上,相對於此,比較例1係降低至88.08%。在二色比(Rd)中,實施例4係僅由29.2變化成23.0,但比較例1係從30.1降低至15.4。從以上之情形,可知實施例4之偏光板係在近紅外線區域中,具有高的耐光性。 From the results of Table 6, in the light resistance test, the 950 nm change of Example 4 was only 0.1145% to 0.2615%, but the comparative example 1 was greatly changed from 0.1132 to 5.2350%. Even in the degree of polarization, the Example 4 system maintained 99% or more, while the Comparative Example 1 system decreased to 88.08%. In the dichroic ratio (Rd), the Example 4 system only changed from 29.2 to 23.0, but the Comparative Example 1 system decreased from 30.1 to 15.4. From the above, it can be seen that the polarizing plate of Example 4 is in the near-infrared region and has high light resistance.

[產業上之利用可能性] [Industrial Utilization Possibility]

本案之偏光板係可在紅外線區域、或可見光區域至紅外線區域具有高的偏光度,且耐久性高的偏光板。所得到之偏光板係在高溫高濕或高溫下長時間曝露於強光時,亦具有高的耐光性。因而,本案之偏光板係可應用於要求高偏光度之感測器、透鏡、開關元件、隔離器、照相機、及屋內外之計測器或駕駛感測模組等之車載器等。又,可適宜使用於感知紅外線之機器,例如紅外線面板、空間紅外線觸控模組等,再者藉由與以往之顯示器例如電卓、時計、筆記型電腦、文書處理器、液晶電視、偏光透鏡、偏光眼鏡、汽車導航器等併用,不僅可提供可見光之顯示,亦可提供活用紅外線光之模組。 The polarizing plate of this case is a polarizing plate that can have a high degree of polarization in the infrared region, or the visible light region to the infrared region, and has high durability. The obtained polarizing plate also has high light resistance when exposed to strong light for a long time under high temperature, high humidity or high temperature. Therefore, the polarizing plate of this case can be applied to sensors, lenses, switching elements, isolators, cameras, indoor and outdoor measuring devices or driving sensor modules that require high degree of polarization. In addition, it can be suitably used for infrared-sensing machines, such as infrared panels, spatial infrared touch modules, etc., and can be used in conjunction with conventional displays such as electronic devices, timepieces, notebook computers, word processors, LCD TVs, polarized lenses, Polarized glasses, car navigation systems, etc. can be used together to provide not only visible light displays, but also modules that use infrared light.

Claims (23)

一種偏光板,係包含:由含有近紅外線吸收染料之親水性高分子膜所構成的偏光元件、及設於該膜之單面或兩面的基板; A polarizing plate, comprising: a polarizing element composed of a hydrophilic polymer film containing a near-infrared absorbing dye, and a substrate provided on one or both sides of the film; 該基板為至少具有下述a)及b)之任一者的特性者: The substrate has at least any one of the following characteristics a) and b): a)該親水性高分子膜包含硼化合物時,使該偏光板在相對濕度90%RH、80℃之環境下曝露1000小時之後,以該曝露前作為100時,該親水性高分子膜中所含之硼化合物的質量保持於20以上; a) When the hydrophilic polymer film contains a boron compound, after the polarizer is exposed to a relative humidity of 90%RH and 80°C for 1000 hours, the time before the exposure is set as 100, the content of the hydrophilic polymer film The quality of the boron compound contained is kept above 20; b)依據JIS Z 0208透濕度試驗所得之該基板在相對濕度90%RH、40℃之環境的水分透濕度以24小時計為0至1500g/m2b) According to the JIS Z 0208 moisture permeability test, the moisture permeability of the substrate in an environment with a relative humidity of 90%RH and 40°C is 0 to 1500g/m 2 in 24 hours. 如請求項1所述之偏光板,其中,該基板之至少1個為具有b)之特性的樹脂製基板。 The polarizing plate according to claim 1, wherein at least one of the substrates is a resin substrate having the characteristics of b). 如請求項2所述之偏光板,其中,在前述親水性高分子膜之兩面具備基板,且在與前述樹脂製之基板為相反側具備具有b)之特性的無機基板或樹脂製基板。 The polarizing plate according to claim 2, wherein a substrate is provided on both sides of the hydrophilic polymer film, and an inorganic substrate or a resin substrate having the characteristics of b) is provided on the side opposite to the resin substrate. 如請求項1至3中任一項所述之偏光板,其中,前述親水性高分子膜為以選自由聚乙烯醇系樹脂、直鏈澱粉系樹脂、澱粉系樹脂、纖維素系樹脂、聚丙烯酸鹽系樹脂、及此等之衍生物所組成之群組中的樹脂所構成,且含有硼化合物。 The polarizing plate according to any one of claims 1 to 3, wherein the hydrophilic polymer film is selected from the group consisting of polyvinyl alcohol-based resins, amylose-based resins, starch-based resins, cellulose-based resins, and polyvinyl alcohol-based resins. It is composed of acrylate resins and resins in the group consisting of these derivatives, and contains a boron compound. 如請求項2至4中任一項所述之偏光板,其中,前述樹脂製基板包含選自由矽系樹脂、(甲基)丙烯酸系樹脂、環烯烴系樹脂、聚酯系樹脂、及聚碳酸酯樹脂所組成之群組中的一種以上之樹脂。 The polarizing plate according to any one of claims 2 to 4, wherein the resin-made substrate includes a resin selected from the group consisting of silicon-based resin, (meth)acrylic resin, cycloolefin-based resin, polyester-based resin, and polycarbonate One or more resins in the group consisting of ester resins. 如請求項2至5中任一項所述之偏光板,其中,前述樹脂製基板包含使聚合性單體組成物聚合所得到之膜,而該聚合性單體組成物係包含在分子內具有3個以上之(甲基)丙烯醯基的(甲基)丙烯酸酯化合物。 The polarizing plate according to any one of claims 2 to 5, wherein the resin substrate includes a film obtained by polymerizing a polymerizable monomer composition, and the polymerizable monomer composition contains Three or more (meth)acrylic (meth)acrylate compounds. 如請求項6所述之偏光板,其中,前述(甲基)丙烯酸酯化合物具有選自由新戊四醇骨架、新戊二醇骨架、三羥甲基丙烷骨架、及二環戊二烯骨架所組成之群組中的任一骨架。 The polarizing plate according to claim 6, wherein the (meth)acrylate compound has a structure selected from the group consisting of neopentyl erythritol skeleton, neopentyl glycol skeleton, trimethylolpropane skeleton, and dicyclopentadiene skeleton. Any skeleton in the group. 如請求項6或7所述之偏光板,其中,以固體成分濃度計,在聚合性單體組成物中之全部單體中,前述(甲基)丙烯酸酯化合物為15質量%以上。 The polarizing plate according to claim 6 or 7, wherein the (meth)acrylate compound is 15% by mass or more in all monomers in the polymerizable monomer composition in terms of solid content concentration. 如請求項3至8中任一項所述之偏光板,其中,上述無機基板包含玻璃、石英、藍寶石、水晶、及尖晶石之任一者。 The polarizing plate according to any one of claims 3 to 8, wherein the inorganic substrate includes any one of glass, quartz, sapphire, crystal, and spinel. 如請求項2至9中任一項所述之偏光板,其中,前述樹脂製基板之厚度為0.5μm至10μm。 The polarizing plate according to any one of claims 2 to 9, wherein the thickness of the resin substrate is 0.5 μm to 10 μm. 如請求項4至10中任一項所述之偏光板,其中,前述親水性高分子膜包含聚乙烯醇樹脂或其衍生物。 The polarizing plate according to any one of claims 4 to 10, wherein the hydrophilic polymer film contains polyvinyl alcohol resin or a derivative thereof. 】如請求項1至11中任一項所述之偏光板,其中,前述近紅外線吸收染料為下述式(1)所示之偶氮化合物, ] The polarizing plate according to any one of claims 1 to 11, wherein the near-infrared absorbing dye is an azo compound represented by the following formula (1),
Figure 109122608-A0202-13-0002-71
Figure 109122608-A0202-13-0002-71
式(1)中,A1為可具有取代基之苯基、可具有取代基之萘基或可具有取代基之雜環基,A2、A3及A4係分別獨立地為可具有取代基之苯基或可具有取代基之萘基,k係表示0或1之整數;R1為羥基、碳數1至4之烷氧基或取代或非取代之胺 基,m係表示0至5之整數;M係表示氫、金屬離子或銨離子,n係表示1或2之整數;環a及環b之氫原子係可分別獨立地以取代基R1取代,環a及環b之任一者或兩者的氫原子係以取代基SO3M取代。 In formula (1), A 1 is optionally substituted phenyl, optionally substituted naphthyl or optionally substituted heterocyclic group, and A 2 , A 3 and A 4 are each independently optionally substituted The phenyl group or the naphthyl group that may have a substituent, k represents an integer of 0 or 1; R 1 is a hydroxyl group, an alkoxy group with 1 to 4 carbons or a substituted or unsubstituted amino group, and m represents 0 to An integer of 5; M represents hydrogen, a metal ion or an ammonium ion, and n represents an integer of 1 or 2; the hydrogen atoms of ring a and ring b can be independently substituted with substituent R 1 respectively, and between ring a and ring b Either or both of the hydrogen atoms are substituted with the substituent SO 3 M.
如請求項12所述之偏光板,其中,上述式(1)中之A2、A3及A4係分別獨立地以下述式(2)或式(3)所示,A2、A3及A4之至少1個係以式(2)所示, The polarizing plate according to claim 12, wherein A 2 , A 3 and A 4 in the above formula (1) are independently represented by the following formula (2) or (3), A 2 , A 3 And at least one of A 4 is shown in formula (2),
Figure 109122608-A0202-13-0003-72
Figure 109122608-A0202-13-0003-72
式(2)中,R2係表示羥基、碳數1至4之脂肪族烴基、碳數1至4之烷氧基、取代或非取代之胺基或以磺基取代之碳數1至4的烷氧基,m2係表示0至6之整數;M係表示氫、金屬離子或銨離子,n3係表示0至2之整數; In formula (2), R 2 represents a hydroxyl group, an aliphatic hydrocarbon group with 1 to 4 carbons, an alkoxy group with 1 to 4 carbons, a substituted or unsubstituted amine group, or a sulfo group substituted with 1 to 4 carbons. The alkoxy of, m 2 represents an integer from 0 to 6; M represents hydrogen, metal ion or ammonium ion, and n 3 represents an integer from 0 to 2;
Figure 109122608-A0202-13-0003-73
Figure 109122608-A0202-13-0003-73
式(3)中,R3及R4係分別獨立地表示氫原子、碳數1至4之脂肪族烴基、碳數1至4之烷氧基、以羥基取代之碳數1至4的烷氧基或以磺基取代之碳數1至4的烷氧基。 In formula (3), R 3 and R 4 each independently represent a hydrogen atom, an aliphatic hydrocarbon group with 1 to 4 carbons, an alkoxy group with 1 to 4 carbons, and an alkane with 1 to 4 carbons substituted with a hydroxyl group. An oxy group or an alkoxy group having 1 to 4 carbons substituted with a sulfo group.
如請求項12或13所述之偏光板,其中,上述式(1)之偶氮化合物為下述式(4)所示之化合物; The polarizing plate according to claim 12 or 13, wherein the azo compound of the above formula (1) is a compound represented by the following formula (4);
Figure 109122608-A0202-13-0003-75
Figure 109122608-A0202-13-0003-75
式(4)中,A1、A2、A3、A4、M、n及k係分別與上述式(1)為相同,又,環a及環b之一者或兩者之氫原子係以取代基SO3M取代。 In formula (4), A 1 , A 2 , A 3 , A 4 , M, n, and k are the same as the above formula (1), and the hydrogen atom of one or both of ring a and ring b It is substituted with the substituent SO 3 M.
如請求項12至14中任一項所述之偏光板,其中,上述式(1)或(4)中之A1為選自由以羥基、磺基取代的碳數1至4之烷氧基及磺基所組成之群組中的1個以上之取代基取代的萘基。 The polarizing plate according to any one of claims 12 to 14, wherein A 1 in the above formula (1) or (4) is selected from alkoxy groups having 1 to 4 carbons substituted with a hydroxyl group and a sulfo group And a naphthyl group substituted with one or more substituents in the group consisting of a sulfo group. 如請求項12至14中任一項所述之偏光板,其中,在上述式(1)或(4)中,A1為下述式(5)所示者; The polarizing plate according to any one of claims 12 to 14, wherein, in the above formula (1) or (4), A 1 is represented by the following formula (5);
Figure 109122608-A0202-13-0004-76
Figure 109122608-A0202-13-0004-76
式(5)中,n4係表示1或2之整數。 In formula (5), n 4 represents an integer of 1 or 2.
如請求項12至14中任一項所述之偏光板,其中,上述式(1)或(4)中之A1為以選自硝基及磺基之至少1個取代基取代的苯基。 The polarizing plate according to any one of claims 12 to 14, wherein A 1 in the above formula (1) or (4) is a phenyl group substituted with at least one substituent selected from a nitro group and a sulfo group . 如請求項12至14中任一項所述之偏光板,其中,上述式(1)或(4)之A1中之可具有取代基之雜環基為選自由(6)至(8)所示之基所組成之群組中的基; The polarizing plate according to any one of claims 12 to 14, wherein the heterocyclic group which may have a substituent in A 1 of the above formula (1) or (4) is selected from (6) to (8) The bases in the group consisting of the bases shown;
Figure 109122608-A0202-13-0004-77
Figure 109122608-A0202-13-0004-77
式(6)至(8)中之X係分別獨立地為鹵素基、硝基、羥基、碳數1至4之脂肪族烴基、碳數1至4之烷氧基、以磺基取代之碳數1至4之脂肪族烴基、以羥基取代之碳數1至4之脂肪族烴基、以羧基取代之碳數1至4之脂肪族烴基、以磺基取代之碳數 1至4之烷氧基、以羥基取代之碳數1至4之烷氧基、或以羧基取代之碳數1至4之烷氧基,q1係表示0至4之整數,q2係表示0至6之整數;M係表示氫、金屬離子、或銨離子,n1及n2係分別獨立地表示0至3之整數;各式中*係表示與偶氮鍵結之接合位置。 X in formulas (6) to (8) are independently halogen groups, nitro groups, hydroxyl groups, aliphatic hydrocarbon groups with 1 to 4 carbons, alkoxy groups with 1 to 4 carbons, and carbons substituted with sulfo groups. Aliphatic hydrocarbon groups of 1 to 4, aliphatic hydrocarbon groups of 1 to 4 carbons substituted with hydroxyl groups, aliphatic hydrocarbons of 1 to 4 carbons substituted with carboxyl groups, alkoxy groups of 1 to 4 carbons substituted with sulfo groups Group, an alkoxy group with 1 to 4 carbons substituted by a hydroxyl group, or an alkoxy group with 1 to 4 carbons substituted with a carboxyl group, q 1 represents an integer from 0 to 4, and q 2 represents an integer from 0 to 6 ; M represents hydrogen, metal ion, or ammonium ion, n 1 and n 2 each independently represent an integer from 0 to 3; in each formula * represents the bonding position of the azo bond.
如請求項1至18中任一項所述之偏光板,其中,至少在700至1500nm具有:對於已偏光之光顯示最高的穿透率之軸的吸光度、與對於已偏光之光顯示最低的穿透率之軸的吸光度之吸光度比為5以上之波長域。 The polarizing plate according to any one of claims 1 to 18, wherein at least 700 to 1500 nm has: absorbance on the axis showing the highest transmittance for polarized light, and the lowest absorbance for polarized light The ratio of absorbance on the axis of transmittance to absorbance is in the wavelength range of 5 or more. 如請求項12至19中任一項所述之偏光板,其更包含上述式(1)所示之偶氮化合物以外的有機染料之一種類以上。 The polarizing plate according to any one of claims 12 to 19, which further contains one or more kinds of organic dyes other than the azo compound represented by the above formula (1). 如請求項20所述之偏光板,其係顯示中性灰色。 The polarizing plate according to claim 20, which is displayed in neutral gray. 一種光學裝置,係具備請求項1至21中任一項所述之偏光板。 An optical device provided with the polarizing plate according to any one of claims 1 to 21. 一種顯示裝置,係具備請求項1至21中任一項所述之偏光板、或請求項22所述之光學裝置。 A display device is provided with the polarizing plate according to any one of claims 1 to 21, or the optical device according to claim 22.
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