TW202104973A - Multi-modal wide-angle illumination employing a compound beam combiner - Google Patents

Multi-modal wide-angle illumination employing a compound beam combiner Download PDF

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TW202104973A
TW202104973A TW109117876A TW109117876A TW202104973A TW 202104973 A TW202104973 A TW 202104973A TW 109117876 A TW109117876 A TW 109117876A TW 109117876 A TW109117876 A TW 109117876A TW 202104973 A TW202104973 A TW 202104973A
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radiation
field
optical
optical axis
combiner
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TW109117876A
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大衛 費西
艾夫拉漢 艾德勒
伊利亞 露斯克
伊果 凱茲爾
艾維諾安 羅森伯格
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以色列商奧寶科技有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0061Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED
    • G02B19/0066Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a LED in the form of an LED array
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/0004Microscopes specially adapted for specific applications
    • G02B21/0016Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/06Means for illuminating specimens
    • G02B21/08Condensers
    • G02B21/12Condensers affording bright-field illumination
    • G02B21/125Condensers affording bright-field illumination affording both dark- and bright-field illumination
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/36Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G02B21/361Optical details, e.g. image relay to the camera or image sensor
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/02Simple or compound lenses with non-spherical faces
    • G02B3/08Simple or compound lenses with non-spherical faces with discontinuous faces, e.g. Fresnel lens
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/29Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10Beam splitting or combining systems
    • G02B27/12Beam splitting or combining systems operating by refraction only
    • G02B27/126The splitting element being a prism or prismatic array, including systems based on total internal reflection
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/04Prisms

Abstract

Provided is an optical apparatus that includes an illumination assembly which include an extended radiation source emitting radiation with a controllable spatial distribution and telecentric condensing optics, configured to receive and project the emitted radiation with a numerical aperture exceeding 0.3 along a first optical axis onto a field and an imaging assembly that includes a sensor and objective optics configured to image the field along a second optical axis onto the sensor and also a prism combiner positioned between the field and the condensing and objective optics which is configured to combine the first and second optical axes, while reflecting at least one of the optical axes multiple times within the prism combiner.

Description

採用複合光束組合器之多模態廣角照明Multi-mode wide-angle illumination using compound beam combiner

本發明一般而言係關於光學設備及方法,且特定而言係關於照明器。The present invention relates generally to optical devices and methods, and in particular relates to luminaires.

照明器用於光學裝置中以照明由成像光學器件成像之一物件。The illuminator is used in an optical device to illuminate an object imaged by the imaging optics.

美國專利申請公開案2013/0279017闡述一種光學裝置,其包含:一光波透射基板,其具有兩個主表面及邊緣;光學構件,其用於藉由全內反射將光耦合至基板中;及複數個部分反射表面,其由基板承載,其中部分反射表面彼此平行且不平行於基板之邊緣中之任一者,且其中部分反射表面中之一或多者係一各向異性表面。U.S. Patent Application Publication 2013/0279017 describes an optical device, which includes: a light wave transmissive substrate having two main surfaces and edges; an optical member for coupling light into the substrate by total internal reflection; and plural A partially reflective surface carried by the substrate, wherein the partially reflective surfaces are parallel to each other and not parallel to any one of the edges of the substrate, and one or more of the partially reflective surfaces are an anisotropic surface.

美國專利6,292,214闡述一種裝置,其中來自顯示單元之螢幕之一光通量由一光學系統導引至一觀察光學系統。其上顯示樣品之影像之顯示螢幕可透過觀察光學系統之一目鏡透鏡來觀察。US Patent 6,292,214 describes a device in which a light flux from the screen of the display unit is guided by an optical system to an observation optical system. The display screen on which the image of the sample is displayed can be observed through an eyepiece lens of the observation optical system.

美國專利8,514,385闡述一種用於檢驗一物件之方法及一檢驗系統,其中該系統包含:至少一個初級光源,其後續接著經調適以朝向一經檢驗物件之一區域引導至少一個初級光光束之至少一個照明路徑成像透鏡;至少一個次級光源,其後續接著經調適以朝向該區域引導至少一個次級光光束之至少一個準直組件及至少一個集光組件;其中至少一個初級光光束及至少一個次級光光束照明該區域使得該區域之一經成像部分內之實質上每一點在由實質上均勻強度表徵之一大角度範圍內被照明;一收集路徑,其包括一影像感測器、一分束器路徑及一收集路徑成像透鏡;其中分束器定位於區域之間以及收集路徑成像透鏡之間;且其中至少一個準直組件界定至少一個初級光光束透過其傳播之一中心孔徑。US Patent 8,514,385 describes a method for inspecting an object and an inspection system, wherein the system includes: at least one primary light source, which is subsequently adapted to direct at least one illumination of at least one primary light beam toward a region of an inspected object Path imaging lens; at least one secondary light source, which is subsequently adapted to guide at least one collimating component and at least one light collecting component of at least one secondary light beam toward the area; wherein at least one primary light beam and at least one secondary light beam The light beam illuminates the area so that substantially every point in one of the imaged parts of the area is illuminated within a large angle range characterized by substantially uniform intensity; a collection path including an image sensor and a beam splitter Path and a collection path imaging lens; wherein the beam splitter is positioned between the areas and between the collection path imaging lens; and wherein at least one collimating component defines a central aperture through which at least one primary light beam propagates.

美國專利申請公開案2004/0174591闡述一種用於包括至少一個觀察光束路徑之一顯微鏡,特定而言,具有一照明系統之一外科顯微鏡之燈光裝置,及一種用於將自照明系統發射之光偏轉至待觀察之一物件上,特定而言,待手術之一眼上之偏轉裝置,該偏轉裝置在相對於至少一個觀察光束路徑之各種照明角度下提供物件之一照明,其中該偏轉裝置包括至少部分地作為實體分束器提供之兩個偏轉元件。US Patent Application Publication 2004/0174591 describes a microscope for including at least one observation beam path, in particular, a lighting device for a surgical microscope with an illumination system, and a lighting device for deflecting light emitted from the illumination system To an object to be observed, in particular, a deflection device on an eye to be operated, the deflection device provides illumination of one of the objects under various illumination angles relative to at least one observation beam path, wherein the deflection device includes at least part The ground serves as the two deflection elements provided by the physical beam splitter.

下文所闡述之本發明之實施例提供用於一場之照明及成像之經改良設備及方法。The embodiments of the present invention described below provide improved equipment and methods for the illumination and imaging of a field.

依據本發明之實施例之以下詳細說明連同圖式將更全面地理解本發明,其中:According to the following detailed description of the embodiments of the present invention together with the drawings, the present invention will be more fully understood, in which:

概述  在光學成像系統之應用(舉例而言在一製造程序期間對工件之光學檢驗)中,一照明器用於藉助光學輻射來照明工件上之一場。(如在本說明及申請專利範圍中所使用,術語「光學輻射」、「輻射」及「光」通常係指任何及所有可見光、紅外及紫外輻射。) 工件之經照明場由成像光學器件成像並由一適合感測器偵測。Overview In the application of optical imaging systems (for example, optical inspection of a workpiece during a manufacturing process), an illuminator is used to illuminate a field on the workpiece with optical radiation. (As used in this description and the scope of the patent application, the terms "optical radiation", "radiation" and "light" generally refer to any and all visible light, infrared and ultraviolet radiation.) The illuminated field of the workpiece is imaged by the imaging optics It is detected by a suitable sensor.

在某些應用中,準確檢驗需要在一寬廣度之照明角度內照明具有一大對角線尺寸之一場,亦即,照明具有一高數值孔徑(NA)。檢驗可進一步需要以下兩者:每單位立體角之輻射通量(輻射強度)跨越數值孔徑係均勻的,及每單位面積之輻射通量(輻照度)跨越場係均勻的。In some applications, accurate inspection requires a field with a large diagonal size within a wide illumination angle, that is, the illumination has a high numerical aperture (NA). The inspection may further require both of the following: the radiant flux (radiation intensity) per unit solid angle is uniform across the numerical aperture, and the radiant flux (irradiance) per unit area is uniform across the field.

在光輻射測量中,輻射強度I及輻照度E依據輻射通量Φ來界定。輻射通量Φ表達在輻射場內流動之能量,其中一常用單位為瓦特(W)。在方程式(1)中界定輻射強度I: I=dΦ/dΩ                (1) 其中Ω係一立體角。輻射強度I之一常見單位係W/sr,其中sr表示作為一立體角之一單位之球面度。輻射強度可係指發射至一立體角中之通量或接收至一立體角中之通量。在後續之說明中分別使用符號IEMIT 及IRCV 來表示經發射輻射強度及經接收輻射強度。In optical radiation measurement, the radiation intensity I and the irradiance E are defined according to the radiation flux Φ. The radiant flux Φ expresses the energy flowing in the radiation field, and one of the common units is watt (W). Define the radiation intensity I in equation (1): I=dΦ/dΩ (1) where Ω is a solid angle. One common unit of radiation intensity I is W/sr, where sr represents the steradian as a unit of a solid angle. The radiation intensity can refer to the flux emitted into a solid angle or the flux received into a solid angle. In the following description, the symbols I EMIT and I RCV are used to represent the transmitted radiation intensity and the received radiation intensity, respectively.

在方程式(2)中界定經接收通量Φ之輻照度E: E=dΦ/dA                    (2) 其中A係接收通量之面積。輻照度E之一常見單位係W/cm2Define the irradiance E of the received flux Φ in equation (2): E=dΦ/dA (2) where A is the area of the received flux. One of the common units of irradiance E is W/cm 2 .

在本說明中使用之一額外輻射術語發射通量Φ之發射度M由方程式(3)界定: M=dΦ/dA                   (3) 其中A係發射通量之面積。An additional radiation term used in this description The emittance M of the emission flux Φ is defined by equation (3): M=dΦ/dA (3) Wherein A is the area of emission flux.

當在具有一大對角線尺寸之一經照明場內需要一高度輻射強度及輻照度時,尤其當對角線尺寸比場與照明器之最近點之間的空間(通常稱為「工作距離」或「自由工作距離」)大得多時,常見照明器在光學場之數值孔徑及角度廣度方面受到限制。相反地,對於一高數值孔徑及大光學場,難以達成一高度輻射強度及輻照度。當照明器用作一成像系統之部分時,通常有必要在照明路徑中嵌入一分束器使得一成像總成可擷取光學場之影像。此約束加劇滿足照明器之設計目標之難度。When a high degree of radiation intensity and irradiance is required in an illuminated field with a large diagonal dimension, especially when the diagonal dimension is smaller than the space between the field and the closest point of the illuminator (usually called the "working distance") Or "free working distance") is much larger, the common illuminator is limited in the numerical aperture and angular width of the optical field. On the contrary, for a high numerical aperture and large optical field, it is difficult to achieve a high radiation intensity and irradiance. When the illuminator is used as part of an imaging system, it is usually necessary to embed a beam splitter in the illumination path so that an imaging assembly can capture images of the optical field. This constraint exacerbates the difficulty of meeting the design goals of the luminaire.

本文中所闡述之本發明之實施例藉由提供供結合分束器及成像總成使用之照明器來解決上文所闡述之問題,該等照明器在一大數值孔徑及一大光學場內達成一高程度之輻射強度及輻照度兩者。The embodiments of the present invention described herein solve the problems described above by providing illuminators for use in combination with a beam splitter and an imaging assembly. The illuminators are in a large numerical aperture and a large optical field. Achieve a high degree of both radiation intensity and irradiance.

在所揭示實施例中,一種照明總成包含一經擴展輻射源,其發射具有一可控制空間分佈之輻射。聚光光學器件接收並沿著一光學軸以超過0.3之一數值孔徑(NA)將經發射輻射聚焦至自2 mm至20 mm之一對角線尺寸之一場上。設備亦包含一成像總成,其包括一感測器及沿著一第二光學軸將場成像至感測器上之物鏡光學器件。一稜鏡組合器,其定位於場與聚光光學器件及物鏡光學器件之間,組合光學軸,同時使光學軸中之至少一者在稜鏡組合器內反射多次。In the disclosed embodiment, a lighting assembly includes an expanded radiation source that emits radiation having a controllable spatial distribution. The condensing optics receives and focuses the emitted radiation along an optical axis with a numerical aperture (NA) exceeding 0.3 to a field with a diagonal size from 2 mm to 20 mm. The device also includes an imaging assembly, which includes a sensor and an objective optics for imaging the field onto the sensor along a second optical axis. A beam combiner, which is positioned between the field and condensing optics and the objective optics, combines the optical axes, and at the same time makes at least one of the optical axes reflect multiple times in the beam combiner.

儘管大NA及寬場,但所揭示照明總成之遠心組態以及其伴隨之平移不變性確保場之高度均勻照明。舉例而言,下文所闡述之照明總成能夠以跨越場變化不超過10%之輻照度及在場中之所有點處跨越數值孔徑變化不超過20%之經接收輻射強度來照明場。分束器內之多次反射在滿足此等目標之同時達成大NA中可係有用的。此外,聚光光學器件及稜鏡組合器之設計使得能夠以短工作距離與寬經照明場之一組合來構造照明器。Despite the large NA and wide field, the telecentric configuration of the disclosed lighting assembly and its accompanying translational invariance ensure highly uniform illumination of the field. For example, the illumination assembly described below can illuminate a field with an irradiance that does not vary more than 10% across the field and a received radiation intensity that does not vary more than 20% across the numerical aperture at all points in the field. Multiple reflections in the beam splitter can be useful in meeting these goals while achieving a large NA. In addition, the design of the concentrating optics and the beam combiner enables the luminaire to be constructed with a combination of a short working distance and a wide illumination field.

第一實施例  圖1係根據本發明之一實施例之一光學設備10之一示意性剖面圖解說明。設備10包括:一照明總成20及一成像總成76,連同一稜鏡組合器32,該稜鏡組合器組合照明及成像總成之光學軸,如下文所闡述。First Embodiment FIG. 1 is a schematic cross-sectional illustration of an optical device 10 according to an embodiment of the present invention. The device 10 includes: an illumination assembly 20 and an imaging assembly 76, which are connected to the same optical combiner 32, which combines the optical axis of the illumination and imaging assembly, as described below.

照明總成20包括:一經擴展輻射源22、一輻射源控制器23及聚光光學器件21。聚光光學器件21包括:一均質化棒陣列29、一準直透鏡陣列27、一聚焦透鏡28及一補償透鏡30。準直透鏡陣列27包括個別準直透鏡70,其中進一步細節展示於圖2至圖3以及圖5中。照明總成20,連同稜鏡組合器32沿著一第一光學軸35照明一場34。The lighting assembly 20 includes: an expanded radiation source 22, a radiation source controller 23 and a condensing optics 21. The condensing optical device 21 includes a homogenizing rod array 29, a collimating lens array 27, a focusing lens 28 and a compensation lens 30. The collimating lens array 27 includes individual collimating lenses 70, of which further details are shown in FIGS. 2 to 3 and FIG. 5. The lighting assembly 20, together with the beam combiner 32, illuminates a field 34 along a first optical axis 35.

成像總成76包括:物鏡光學器件77及一感測器79,其中物鏡光學器件將場34成像至感測器上。The imaging assembly 76 includes an objective optics 77 and a sensor 79, wherein the objective optics images the field 34 onto the sensor.

輻射源控制器23通常包括在軟體及/或韌體中程式化以執行本文中所闡述之功能之一可程式化處理器。另一選擇係或另外,輻射源控制器23包括執行控制器之功能中之至少某些功能之硬連接及/或可程式化硬體邏輯電路。儘管在圖中展示輻射源控制器23,但出於簡化之目的,作為一單個、單片功能方塊,實務上,控制器可包括一單個晶片或一組兩個或更多個晶片,其中適合介面用於輸出在圖中圖解說明及在文字中闡述之信號。在後續之實施例之內容脈絡中展示及闡述之控制器具有類似構造。The radiation source controller 23 usually includes a programmable processor programmed in software and/or firmware to perform one of the functions described herein. Alternatively or additionally, the radiation source controller 23 includes hard-wired and/or programmable hardware logic circuits that perform at least some of the functions of the controller. Although the radiation source controller 23 is shown in the figure, for the sake of simplification, as a single, monolithic functional block, in practice, the controller may include a single chip or a group of two or more chips. The interface is used to output the signal illustrated in the figure and explained in the text. The controller shown and described in the context of the subsequent embodiments has a similar structure.

在圖1中僅示意性地展示稜鏡組合器32,其中進一步細節展示於圖6中。稜鏡組合器32包括由對輻射透明之一材料製作之一多面體,該多面體具有係部分透射及部分反射之一內部分束器層以便透射進入稜鏡組合器之輻射之一部分並反射其一部分。In FIG. 1, the combinator 32 is only shown schematically, and further details are shown in FIG. 6. The beam combiner 32 includes a polyhedron made of a material that is transparent to radiation, and the polyhedron has an internal beam splitter layer that is partially transmissive and partially reflective so as to transmit a part of the radiation entering the beam combiner and reflect a part thereof.

設備10之照明方案可劃分為兩個獨立部分:非成像光學器件,其包括:經擴展輻射源22及均質化棒陣列29;及成像光學器件,其包括:準直透鏡陣列27、聚焦透鏡28、補償透鏡30及稜鏡組合器32。非成像光學器件之功能係混合由源22發射之不同波長之光並改良光收集效率。非成像光學器件之一額外功能係改良照明之角度均勻性,因此將低頻率非均質性轉換為高頻率非均質性,該高頻率非均質性可接著藉由使用一精細漫射器來容易地平滑。成像光學器件之一部分用於將自非成像光學器件部分發射之經均質化光以孔徑分段之間的一良好分離重新聚焦在場34上,此意指每一均質化棒29將僅射線發送至一對應透鏡70。下文更詳細地闡述均質化棒及透鏡。The lighting scheme of the device 10 can be divided into two independent parts: non-imaging optics, which include: expanded radiation source 22 and homogenized rod array 29; and imaging optics, which include: collimator lens array 27, focusing lens 28 , Compensation lens 30 and 稜鏡 combiner 32. The function of the non-imaging optics is to mix the light of different wavelengths emitted by the source 22 and improve the light collection efficiency. One of the additional functions of non-imaging optics is to improve the angular uniformity of illumination, thus converting low-frequency heterogeneity into high-frequency heterogeneity, which can then be easily achieved by using a fine diffuser smooth. A part of the imaging optics is used to refocus the homogenized light emitted from the non-imaging optics on the field 34 with a good separation between the aperture segments, which means that each homogenizing rod 29 will only send rays To one corresponds to the lens 70. The homogenization rod and lens are explained in more detail below.

均質化棒陣列29包括均質化棒24,其通常包括由對由源22發射之輻射透明之一材料製作之實心棒及/或具有反射內壁之空心棒。每一棒在一端處包括一入射面25且在另一端處包括一出射面26。均質化棒24之剖面通常係矩形的(舉例而言,正方形的)或圓形的,儘管可替代地使用其他剖面。在某些情形中,剖面可沿著棒之軸變化。在所描繪實施例中,舉例而言,每一均質化棒24之出射面26之線性廣度比其入射面25大2.5或3倍。由於在每一均質化棒24中傳播之光之光展量係守恆的,因此光在出射面26處之發射角減小相同2.5或3倍。(術語「光展量」係指剖面面積與一光學光束之對向立體角之乘積。) 每一均質化棒24藉助於棒內之多次反射來增加進入入射面25及自出射面26出射之輻射之空間均勻性。The homogenizing rod array 29 includes a homogenizing rod 24, which generally includes solid rods made of a material that is transparent to the radiation emitted by the source 22 and/or hollow rods with reflective inner walls. Each rod includes an entrance surface 25 at one end and an exit surface 26 at the other end. The cross-section of the homogenizing rod 24 is generally rectangular (for example, square) or circular, although other cross-sections may be used instead. In some cases, the profile can vary along the axis of the rod. In the depicted embodiment, for example, the linear extent of the exit surface 26 of each homogenizing rod 24 is 2.5 or 3 times larger than the entrance surface 25 thereof. Since the elongation of the light propagating in each homogenizing rod 24 is conserved, the emission angle of the light at the exit surface 26 is reduced by the same 2.5 or 3 times. (The term "emission" refers to the product of the cross-sectional area and the opposite solid angle of an optical beam.) Each homogenizing rod 24 increases the entrance into the entrance surface 25 and the exit from the exit surface 26 by means of multiple reflections in the rod. The spatial uniformity of radiation.

經擴展輻射源22 (圖4中進一步詳述)由來自輻射源控制器23之信號驅動,且透過均質化棒24之入射面25將輻射發射至該均質化棒中。輻射透過均質化棒24透射至其出射面26,輻射以均勻輻射發射度M (歸因於均質化棒之均質化效應)自該出射面朝向準直透鏡陣列27出射(圖5中進一步詳述)。The extended radiation source 22 (further detailed in FIG. 4) is driven by a signal from the radiation source controller 23, and emits radiation into the homogenizing rod 24 through the incident surface 25 of the homogenizing rod. The radiation is transmitted through the homogenizing rod 24 to its exit surface 26, and the radiation is emitted from the exit surface toward the collimating lens array 27 with a uniform radiation emittance M (due to the homogenizing effect of the homogenizing rod) (see further details in FIG. 5). ).

準直透鏡陣列27接收輻射並透射及準直已自出射面26上之每一點出射之射線。舉例而言,自一點38出射之射線36被準直透鏡陣列27之透鏡70中之一者準直為射線40。由準直透鏡陣列27透射及準直之射線被聚焦透鏡28接收、透射及聚焦。被聚焦透鏡28聚焦之所有射線由補償透鏡30接收,並由補償透鏡進一步透過稜鏡組合器32投影至場34。舉例而言,經準直射線40由聚焦透鏡28聚焦為聚焦至場34上之一點43上之射線42。The collimating lens array 27 receives radiation and transmits and collimates the rays that have exited from each point on the exit surface 26. For example, the ray 36 emitted from a point 38 is collimated into the ray 40 by one of the lenses 70 of the collimating lens array 27. The rays transmitted and collimated by the collimating lens array 27 are received, transmitted and focused by the focusing lens 28. All rays focused by the focusing lens 28 are received by the compensation lens 30, and are further projected to the field 34 by the compensation lens through the beam combiner 32. For example, the collimated ray 40 is focused by the focusing lens 28 into a ray 42 focused on a point 43 on the field 34.

準直透鏡陣列27形成照明總成20之一光闌,其中每一準直透鏡70包括光闌之一分段。當準直透鏡陣列27位於聚焦透鏡28與補償透鏡30之組合之焦平面中时,自場34所見之其影像位於無窮遠處(意指聚光光學器件21之出射光瞳有效地在無窮遠處)。具有在無窮遠中之一出射光瞳之此組態稱為「遠心組態」。因此,聚光光學器件21將一遠心照明提供至場34,且自場觀察之整個角度涵蓋跨越場係平移不變的。The collimating lens array 27 forms a diaphragm of the illumination assembly 20, wherein each collimating lens 70 includes a segment of the diaphragm. When the collimating lens array 27 is located in the focal plane of the combination of the focusing lens 28 and the compensation lens 30, the image seen from the field 34 is located at infinity (meaning that the exit pupil of the condensing optics 21 is effectively at infinity Place). This configuration with one of the exit pupils at infinity is called the "telecentric configuration". Therefore, the condensing optics 21 provides a telecentric illumination to the field 34, and the entire angle of self-field observation covers the constant translation across the field.

在場34上之輻照度E(空間涵蓋)方面,每一均質化棒24之出射面26由準直透鏡陣列27及聚焦透鏡28成像至場中,使得所有出射面26之影像在場中重疊。補償透鏡30之功能係藉由減小照明總成20之光學像差來改良成像之品質。舉例而言,補償透鏡30可具有用於補償光學器件之球面像差之一彎月形狀。每一出射面26之輻射發射度M之均勻性在場34上產生一均勻輻照度E。Regarding the irradiance E (spatial coverage) on the field 34, the exit surface 26 of each homogenization rod 24 is imaged into the field by the collimator lens array 27 and the focusing lens 28, so that the images of all exit surfaces 26 overlap in the field . The function of the compensation lens 30 is to improve the image quality by reducing the optical aberration of the illumination assembly 20. For example, the compensation lens 30 may have a meniscus shape for compensating the spherical aberration of the optical device. The uniformity of the radiation emittance M of each exit surface 26 produces a uniform irradiance E on the field 34.

如將在圖2中所詳述,對於場34上之經接收輻射強度IRCV (角度覆蓋),來自一既定出射面26之輻射填充照明總成20之總數值孔徑之一部分。準直透鏡陣列27 (圖5中詳述)填充照明總成之數值孔徑使得來自鄰接出射面26之輻射之間不具有間隙,因此在照明之數值孔徑內產生一實質上均勻經接收輻射強度IRCV 。此外,歸因於如上文所指示之照明之遠心性,如自場34觀察之照明之整個角度覆蓋跨越場係平移不變的。此性質在實施照明總成20之多模態功能性中係尤其有用的,從而提供亮場及暗場照明兩者,舉例而言,如下文更全面地解釋。As will be described in detail in FIG. 2, for the received radiation intensity I RCV (angle coverage) on the field 34, radiation from a given exit surface 26 fills a portion of the total aperture of the illumination assembly 20. The collimating lens array 27 (detailed in Fig. 5) fills the numerical aperture of the illumination assembly so that there is no gap between the radiation from adjacent exit surfaces 26, thus generating a substantially uniform received radiation intensity I within the numerical aperture of the illumination RCV . In addition, due to the telecentricity of the illumination as indicated above, the entire angle of the illumination observed from the field 34 covers the same translation across the field. This property is particularly useful in implementing the multi-modal functionality of the lighting assembly 20, thereby providing both bright-field and dark-field illumination, for example, as explained more fully below.

基於發明者之模擬,所揭示實施例使得能夠以在自2 mm至20 mm之一對角線尺寸之一場內超過0.3之一數值孔徑(NA)来照明場34,其中具有跨越場變化不超過10%之一輻照度且具有在場中之所有點處跨越數值孔徑變化不超過20%之一輻射強度。在某些實施例中,以超過0.5,或甚至超過0.75之NA達成此等高位準之均勻性及寬場角度。Based on the inventor’s simulations, the disclosed embodiment enables to illuminate the field 34 with a numerical aperture (NA) exceeding 0.3 in a field with a diagonal size from 2 mm to 20 mm, with a cross-field variation not exceeding An irradiance of 10% and a radiant intensity of no more than 20% across the numerical aperture at all points in the field. In some embodiments, the high-level uniformity and wide field angle are achieved with NA exceeding 0.5, or even exceeding 0.75.

在一替代實施例中(圖3中進一步詳述),每一出射面26包括一場透鏡406及一漫射器420,用於進一步控制場34上之輻照度E及經接收輻射強度IRCV 之均勻性。In an alternative embodiment (further detailed in FIG. 3), each exit surface 26 includes a field lens 406 and a diffuser 420 for further controlling the irradiance E and the received radiation intensity I RCV on the field 34 Uniformity.

圖2係根據本發明之一實施例展示光學設備10中之一部分光學路徑之一細節303之一示意性剖面圖解說明。圖解說明演示聚光光學器件21之遠心設計之效應。FIG. 2 is a schematic cross-sectional illustration showing a detail 303 of a part of the optical path in the optical device 10 according to an embodiment of the present invention. The illustration demonstrates the effect of the telecentric design of the concentrating optics 21.

細節303包括來自光學設備10之以下部分:均質化棒24中之一者之出射面26、定位為沿著一第三光學軸301與出射面26相對之準直透鏡70 (來自準直透鏡陣列27)、沿著第一光學軸35之聚焦透鏡28及場34。準直透鏡70與出射面26之間的距離係fCOLL ,其中fCOLL 表示準直透鏡之有效焦距。The detail 303 includes the following parts from the optical device 10: the exit surface 26 of one of the homogenizing rods 24, the collimating lens 70 (from the collimating lens array) positioned opposite the exit surface 26 along a third optical axis 301 27). The focusing lens 28 and the field 34 along the first optical axis 35. The distance between the collimating lens 70 and the exit surface 26 is f COLL , where f COLL represents the effective focal length of the collimating lens.

如在圖1中所展示,照明係遠心的,此乃因準直透鏡70位於聚焦透鏡28與補償透鏡30之組合之焦平面中。出於清晰之目的,已自細節303省略補償透鏡30及稜鏡組合器32。As shown in FIG. 1, the illumination is telecentric because the collimator lens 70 is located in the focal plane of the combination of the focusing lens 28 and the compensation lens 30. For the sake of clarity, the compensation lens 30 and the combinator 32 have been omitted from the details 303.

在出射面26之中心處之一點300發射射線302a、302b及302c,其中中心射線302b與第三光學軸301重合且穿過準直透鏡70與第二光學軸之間的相交點處的一點320。(透鏡70及28被處理為薄透鏡。) 射線302a及302c係來自點300之一射線錐之圍繞中心射線302b對稱地定位之極限射線。(術語「射線錐」用於表示自一點發射或入射於一點上之射線之一群組。一射線錐之角度廣度由其數值孔徑指示。) 準直透鏡70分別將射線302a、302b及302c準直為射線304a、304b及304c,該等射線接著由聚焦透鏡28聚焦為射線306a、306b及306c,從而聚焦至場34上在場與第一光學軸35之相交點處之一點308。The rays 302a, 302b, and 302c are emitted at a point 300 at the center of the exit surface 26, where the central ray 302b coincides with the third optical axis 301 and passes through a point 320 at the intersection between the collimator lens 70 and the second optical axis . (The lenses 70 and 28 are treated as thin lenses.) The rays 302a and 302c are the limiting rays from a ray cone of the point 300 positioned symmetrically around the central ray 302b. (The term "ray cone" is used to refer to a group of rays emitted from or incident on a point. The angular extent of a ray cone is indicated by its numerical aperture.) The collimating lens 70 collimates the rays 302a, 302b, and 302c, respectively The straight rays 304a, 304b, and 304c are then focused by the focusing lens 28 into rays 306a, 306b, and 306c so as to be focused to a point 308 on the field 34 at the intersection point of the field and the first optical axis 35.

在出射面26之邊緣處之一點310發射射線312a、312b及312c,其中中心射線312b穿過準直透鏡70上之點320。射線312a及312c係來自點310之射線錐之圍繞中心射線312b對稱地定位之極限射線。射線312a、312b及312c由準直透鏡70分別準直為射線314a、314b及314c,該等射線接著由聚焦透鏡28聚焦為射線316a、316b及316c,從而聚焦至場34上之一點318。The rays 312a, 312b, and 312c are emitted at a point 310 at the edge of the exit surface 26, wherein the center ray 312b passes through the point 320 on the collimator lens 70. The rays 312a and 312c are the limit rays of the ray cone from the point 310 positioned symmetrically around the central ray 312b. The rays 312a, 312b, and 312c are collimated by the collimator lens 70 into rays 314a, 314b, and 314c, respectively. The rays are then focused by the focusing lens 28 into rays 316a, 316b, and 316c to focus on a point 318 on the field 34.

射線304b及314b兩者皆穿過準直透鏡70上之點320。由於包含點320之準直透鏡70位於聚焦透鏡28之一焦平面處,因此聚焦透鏡使射線304b及314b自點320折射,使得所得經折射射線306b與316b彼此平行。歸因於兩個射線錐(一個射線錐包括射線306a至306c且另一射線錐包括射線316a至316c)之中心射線306b與316b之平行性,以及極限射線在整個光學路徑內圍繞其各別中心射線對稱之事實,兩個錐在場34處於兩個單獨場點308及318處圍繞第一光學軸35在相同數值孔徑內延伸。因此,照明之數值孔徑歸因於聚光光學器件21之遠心設計而係平移不變的。Both rays 304b and 314b pass through a point 320 on the collimating lens 70. Since the collimating lens 70 including the point 320 is located at a focal plane of the focusing lens 28, the focusing lens refracts the rays 304b and 314b from the point 320 so that the resulting refracted rays 306b and 316b are parallel to each other. Due to the parallelism of the central rays 306b and 316b of the two ray cones (one ray cone includes rays 306a to 306c and the other ray cone includes rays 316a to 316c), and the limit rays surround their respective centers in the entire optical path The fact that the rays are symmetrical, the two cones in the field 34 are at two separate field points 308 and 318 and extend around the first optical axis 35 within the same numerical aperture. Therefore, the numerical aperture of the illumination is invariant to translation due to the telecentric design of the condensing optics 21.

在包括射線306a至306c之錐內之點308處之經接收輻射強度之角度均勻性由出射面26上之點300處之經發射輻射強度IEMIT 之角度均勻性判定。類似地,在包括射線316a至316c之錐內之點318處之經接收輻射強度之角度均勻性由點310處之經發射輻射強度IEMIT 之角度均勻性判定。The angular uniformity of the received radiation intensity at the point 308 within the cone including the rays 306a to 306c is determined from the angular uniformity of the emitted radiation intensity I EMIT at the point 300 on the exit surface 26. Similarly, the angular uniformity of the received radiation intensity at point 318 within the cone including rays 316a to 316c is determined by the angular uniformity of the emitted radiation intensity I EMIT at point 310.

因此,照射於場34上之輻射錐之數值孔徑由準直透鏡陣列27中之準直器透鏡70之廣度及橫向位置判定,且數值孔徑跨越場34係平移不變的。此外,在數值孔徑內之場34上之經接收輻射強度之均勻性由來自出射面26之經發射輻射強度之均勻性判定。Therefore, the numerical aperture of the radiation cone irradiated on the field 34 is determined by the width and lateral position of the collimator lens 70 in the collimator lens array 27, and the numerical aperture is invariant in translation across the field 34. In addition, the uniformity of the received radiation intensity over the field 34 within the numerical aperture is determined by the uniformity of the emitted radiation intensity from the exit surface 26.

場34中之每一點自每一均質化棒24之出射面26中之一對應點接收輻射。因此,舉例而言,點308自每一出射面26之一中心點接收輻射,且點318自每一出射面上之一邊緣點接收輻射。因此,場34上之輻照度E係所有均質化棒24之一平均化發射度M,從而貢獻於輻照度之一高度均勻性。Each point in the field 34 receives radiation from a corresponding point in the exit surface 26 of each homogenizing rod 24. Thus, for example, point 308 receives radiation from a central point on each exit surface 26, and point 318 receives radiation from an edge point on each exit surface. Therefore, the irradiance E on the field 34 is an averaged irradiance M of all the homogenizing rods 24, thereby contributing to a high degree of irradiance uniformity.

圖3係根據本發明之一替代實施例展示另一部分光學路徑之一細節400之一示意性剖面圖解說明,圖解說明添加平凸場透鏡406。可在設備10中使用此細節代替細節303 (圖2)。FIG. 3 is a schematic cross-sectional illustration of a detail 400 of another part of the optical path according to an alternative embodiment of the present invention, illustrating the addition of a plano-convex field lens 406. This detail can be used in the device 10 instead of the detail 303 (Figure 2).

細節400包括以下部分:經擴展輻射源22內之發射器54之一陣列401 (如將在圖4中詳述)、具有入射面25及出射面26之均質化棒24、沿著第三光學軸301與出射面26相對之準直透鏡70、沿著第一光學軸35之聚焦透鏡28及場34。場透鏡406定位為與出射面26接觸或緊接近於出射面26,其中平凸形狀之扁平面極其適合將場透鏡膠結至出射面。The detail 400 includes the following parts: an array 401 of emitters 54 within the extended radiation source 22 (as will be described in detail in FIG. 4), a homogenizing rod 24 with an entrance surface 25 and an exit surface 26, and a third optical The collimating lens 70 with the axis 301 opposite to the exit surface 26, the focusing lens 28 along the first optical axis 35 and the field 34. The field lens 406 is positioned to be in contact with or close to the exit surface 26, wherein the flat surface of the plano-convex shape is extremely suitable for cementing the field lens to the exit surface.

一射線410自群組54發射,並由均質化棒24之一側壁反射為一射線412。歸因於反射,一虛擬源402a形成為群組54之一影像。藉由將展示為一虛線414之射線412延伸至一表面416來找到虛擬源402a之位置,由於射線被均質化棒24之側壁摺疊,因此一般而言表面416係一彎曲表面。均質化棒24多次反射自群組54發射之射線產生額外虛擬源402,從而一起形成一虛擬擴展源404。對於一實心均質化棒24,根據方程式(4),源404之最大橫向廣度W由以下各項給出:棒之長度L、出射面26與入射面25之線性尺寸之間的比率M及其材料之折射指數n:

Figure 02_image001
(4)A ray 410 is emitted from the group 54 and reflected as a ray 412 by a side wall of the homogenizing rod 24. Due to reflection, a virtual source 402a is formed as an image of the group 54. The position of the virtual source 402a is found by extending the ray 412 shown as a dashed line 414 to a surface 416. Since the ray is folded by the sidewall of the homogenizing rod 24, the surface 416 is generally a curved surface. The homogenizing rod 24 reflects the rays emitted from the group 54 multiple times to generate an additional virtual source 402, thereby forming a virtual extended source 404 together. For a solid homogenizing rod 24, according to equation (4), the maximum lateral width W of the source 404 is given by: the length L of the rod, the ratio M between the linear dimensions of the exit surface 26 and the entrance surface 25, and The refractive index of the material n:
Figure 02_image001
(4)

毗鄰虛擬源402之間的間隙隨著均質化棒24中之反射之一增加之數目而減少。然而,歸因於有限長度L,此等間隙不完全消失。The gap between adjacent virtual sources 402 decreases as the number of reflections in the homogenizing rod 24 increases. However, due to the limited length L, these gaps do not completely disappear.

場透鏡406將擴展虛擬源404成像至準直透鏡70上作為一影像408,因此藉助影像來填充準直透鏡,且最終填充自準直透鏡入射於場34上之照明之數值孔徑。由於照明被成像至照明器(準直透鏡70)之孔徑光闌中,因此該照明係為科勒類型(Köhler-type)。The field lens 406 images the expanded virtual source 404 onto the collimating lens 70 as an image 408, so the collimating lens is filled with the image, and finally the numerical aperture of the illumination incident on the field 34 from the collimating lens is filled. Since the illumination is imaged into the aperture stop of the illuminator (collimator lens 70), the illumination system is of Köhler-type.

漫射器420 (通常為具有舉例而言5度之一漫射角之一弱漫射器)可抵靠場透鏡406放置在更靠近準直透鏡70之側上,以便改良自準直透鏡出射之輻射之角度均勻性,且最終改良場34中之輻照度E之均勻性。The diffuser 420 (usually a weak diffuser with a diffusion angle of, for example, 5 degrees) can be placed on the side closer to the collimating lens 70 against the field lens 406 in order to improve the self-collimating lens output The angular uniformity of the radiation, and finally the uniformity of the irradiance E in the field 34 is improved.

下文在表1中給出在圖1至圖3中揭示之實施例之光學組件之典型材料及尺寸。 表1:典型材料及尺寸 組件 材料 尺寸(以mm為單位) 均質化棒24 PMMA或BK7 入射面25:3×4.5 出射面26:7.5×11.25 長度:100 場透鏡406 PMMA或BK7 直徑:14 中心厚度:4 焦距:35 準直透鏡70 經模製PMMA 焦距:60 聚焦透鏡28 經模製PMMA 焦距:80 直徑:150 補償透鏡30 BK7 凸半徑:39.8 凹半徑:104 中心厚度:7 直徑:50 稜鏡組合器32 BK7 厚度:17.5 外角:60˚、30˚、90˚ The typical materials and dimensions of the optical components of the embodiments disclosed in FIGS. 1 to 3 are given in Table 1 below. Table 1: Typical materials and dimensions Component material Dimensions (in mm) Homogenizing rod 24 PMMA or BK7 Incident surface 25: 3×4.5 Exit surface 26: 7.5×11.25 Length: 100 Field lens 406 PMMA or BK7 Diameter: 14 Center Thickness: 4 Focal Length: 35 Collimating lens 70 Molded PMMA Focal length: 60 Focus lens 28 Molded PMMA Focal length: 80 Diameter: 150 Compensation lens 30 BK7 Convex radius: 39.8 Concave radius: 104 Center thickness: 7 Diameter: 50 稜鏡 Combiner 32 BK7 Thickness: 17.5 Outer angle: 60˚, 30˚, 90˚

圖4係根據本發明之一實施例在照明總成20中使用之經擴展輻射源22之一示意性正面圖解說明。除了一圓形中心胞元52之外,經擴展輻射源22包括一截頂扇區形狀之胞元50。均質化棒24經配置使得存在恰好一個均質化棒,其中其入射面25面向經擴展輻射源22之每一胞元。FIG. 4 is a schematic front view illustration of an expanded radiation source 22 used in the lighting assembly 20 according to an embodiment of the present invention. In addition to a circular central cell 52, the expanded radiation source 22 includes a truncated sector-shaped cell 50. The homogenization rod 24 is configured such that there is exactly one homogenization rod, with its entrance surface 25 facing each cell of the expanded radiation source 22.

經擴展輻射源22之每一胞元包括朝向面向彼胞元之一個均質化棒24發射輻射之發射器54之一群組。發射器54之群組中之一者之一經放大插圖56詳述發射器54之每一群組如何包括以一波長λ1 發射輻射之三個發射器58及以一不同波長λ2 發射輻射之三個發射器60。發射器58及60包括固態發射器,舉例而言,發光二極體(LED),諸如來自OSRAM GmbH (Marcel-Breuer-Straße 6, 80807 München, GERMANY)之一紅色LED c41-A60,及來自CREE Inc., (4600 Silicon Drive, Durham, North Carolina 27703, USA)之一藍色LED EZ 1350。另一選擇係,發射器58及60可在重疊之光譜範圍內發射輻射。進一步地另一選擇係,發射器58及60可包括發射跨越可見光譜延伸之寬頻輻射之諸如可自CREE Inc.購得之所謂白光LED。另一選擇係,發射器58及60可在電磁光譜之紅外(IR)或紫外(UV)部分中發射輻射。發射器58及60較佳地包括放置為緊接近於彼此之LED晶粒。緊接近地放置發射器58及60之目的係達成注入至棒24中之高光學功率及照明之經改良均勻性兩者。每一群組54內之發射器58及60中之每一者可由輻射源控制器23獨立地激勵。因此,照明總成20可僅照明數值孔徑之部分,諸如(舉例而言)暗場照明或僅右側或左側,以及藉由使得能夠以不同波長λ1 及λ2 進行單獨或同時照明來控制照明之光譜內容。Each cell of the expanded radiation source 22 includes a group of emitters 54 that emit radiation toward a homogenizing rod 24 facing the other cell. One of the groups of emitters 54 is enlarged. Illustration 56 details how each group of emitters 54 includes three emitters 58 that emit radiation at a wavelength λ 1 and those that emit radiation at a different wavelength λ 2 Three transmitters 60. The emitters 58 and 60 include solid-state emitters, for example, light-emitting diodes (LEDs), such as the red LED c41-A60 from OSRAM GmbH (Marcel-Breuer-Straße 6, 80807 München, Germany), and from CREE Inc., (4600 Silicon Drive, Durham, North Carolina 27703, USA) one of the blue LED EZ 1350. Alternatively, the emitters 58 and 60 can emit radiation in the overlapping spectral ranges. In a further alternative, the emitters 58 and 60 may include so-called white LEDs that emit broadband radiation extending across the visible spectrum, such as those available from CREE Inc. Alternatively, the emitters 58 and 60 can emit radiation in the infrared (IR) or ultraviolet (UV) portion of the electromagnetic spectrum. The emitters 58 and 60 preferably include LED dies placed in close proximity to each other. The purpose of placing the emitters 58 and 60 in close proximity is to achieve both high optical power injected into the rod 24 and improved uniformity of illumination. Each of the transmitters 58 and 60 in each group 54 can be independently activated by the radiation source controller 23. Therefore, the illuminating assembly 20 can illuminate only the part of the numerical aperture, such as, for example, dark field illumination or only the right or left side, and the illumination can be controlled by enabling separate or simultaneous illumination with different wavelengths λ 1 and λ 2 The spectral content.

在一替代實施例中,舉例而言,發射器之每一群組54可包括以不同波長發射之三個、四個、五個或六個發射器。藉由獨立地激勵此等發射器,照明之光譜內容可經控制以包括可用波長之任何組合。In an alternative embodiment, for example, each group 54 of emitters may include three, four, five, or six emitters emitting at different wavelengths. By independently stimulating these emitters, the spectral content of the illumination can be controlled to include any combination of available wavelengths.

圖5係根據本發明之一實施例之照明總成20中之準直器透鏡陣列27之一示意性正面圖解說明。除了一圓形中心透鏡72之外,準直器透鏡陣列27包括——類似於經擴展輻射源22──呈截頂扇區形狀之透鏡70。另一選擇係,可使用其他形狀之透鏡70及72。準直器透鏡陣列27經設計使得陣列之每一透鏡接收自均質化棒24中之恰好一者之出射面26發射之輻射。準直器透鏡陣列27之每一透鏡包括一夫瑞奈(Fresnel)透鏡,其中透鏡被對接在一起,因此促進場34上之照明之一均勻經接收輻射強度IRCV ,亦即,在自每一夫瑞奈透鏡分段70引導之部分數值孔徑之間實質上未形成有間隙。特定而言,所揭示實施例之光束組合設計使得能夠合併全照明數值孔徑之軸向部分與其周圍或圓周部分以達成均勻且實質上無間隙照明。在替代實施例中,可使用除夫瑞奈透鏡之外之透鏡,諸如具有球面或非球面表面之透鏡,或以上之任何組合。FIG. 5 is a schematic front diagram illustration of one of the collimator lens arrays 27 in the illumination assembly 20 according to an embodiment of the present invention. In addition to a circular central lens 72, the collimator lens array 27 includes—similar to the expanded radiation source 22—a lens 70 in the shape of a truncated sector. Alternatively, lenses 70 and 72 of other shapes can be used. The collimator lens array 27 is designed so that each lens of the array receives radiation emitted from the exit surface 26 of exactly one of the homogenizing rods 24. Each lens of the collimator lens array 27 includes a Fresnel lens, in which the lenses are butted together, thus promoting a uniform received radiation intensity I RCV of the illumination on the field 34, that is, in each Substantially no gap is formed between the part of the numerical aperture guided by the Renaissance lens segment 70. In particular, the beam combination design of the disclosed embodiment makes it possible to combine the axial portion of the full illumination numerical aperture and its surrounding or circumferential portion to achieve uniform and substantially gapless illumination. In alternative embodiments, lenses other than Freinel lenses may be used, such as lenses with spherical or aspherical surfaces, or any combination of the above.

圖6係根據本發明之一實施例之圖1之稜鏡組合器32,連同成像總成76之一示意性剖面圖解說明。稜鏡組合器32包括由一分束器層84連結之一上部稜鏡80及一下部稜鏡82。稜鏡組合器32進一步包括一第一面90、一第二面94及一第三面102。成像總成76之物鏡光學器件77沿著一第二光學軸78舉例而言以在舉例而言0.1與0.3之間的一光學數值孔徑將場34成像至感測器79上。第一光學軸35與第二光學軸78分別重疊在分束器層84與場34之間的空間中。FIG. 6 is a schematic cross-sectional diagram illustrating the combination device 32 of FIG. 1 together with an imaging assembly 76 according to an embodiment of the present invention. The beam combiner 32 includes an upper beam 80 and a lower beam 82 connected by a beam splitter layer 84. The combiner 32 further includes a first surface 90, a second surface 94 and a third surface 102. The objective optics 77 of the imaging assembly 76 images the field 34 onto the sensor 79 along a second optical axis 78, for example, with an optical numerical aperture between, for example, 0.1 and 0.3. The first optical axis 35 and the second optical axis 78 overlap in the space between the beam splitter layer 84 and the field 34, respectively.

自照明總成20到達第一面90之極限射線86及88源自經擴展輻射源22之相對側上之兩個最外部胞元50。自照明總成20到達第一面90之中心射線92源自經擴展輻射源22之中心胞元52。所有射線86、88及92由稜鏡組合器32內部之分束器層84部分地透射且部分地反射,其中僅展示經透射射線。在所揭示實施例中,射線86、88及90透過第二面94自稜鏡組合器32出射,其中射線86及88以超過±55度之入射角入射於場34上且射線92以一法角(0度)入射於場上。The limit rays 86 and 88 reaching the first face 90 from the illumination assembly 20 originate from the two outermost cells 50 on opposite sides of the expanded radiation source 22. The central ray 92 reaching the first face 90 from the illumination assembly 20 originates from the central cell 52 of the expanded radiation source 22. All rays 86, 88, and 92 are partially transmitted and partially reflected by the beam splitter layer 84 inside the beam combiner 32, of which only the transmitted rays are shown. In the disclosed embodiment, the rays 86, 88, and 90 exit from the combiner 32 through the second surface 94, wherein the rays 86 and 88 are incident on the field 34 at an angle of incidence exceeding ±55 degrees, and the ray 92 is a method The angle (0 degrees) is incident on the field.

照明以取決於場上之特徵之一角度分佈自場34散射(通常反射及/或繞射)為射線96。在所描繪實例中,展示在成像總成76之物鏡光學器件之數值孔徑內之僅彼等射線96。射線96透過第二面94進入稜鏡組合器32,且被分束器層84部分地反射及部分地透射,其中僅展示經反射射線98。經反射射線98照射於第二面94上,其中該等經反射射線由全內反射(TIR)反射為射線100。總而言之,第二光學軸78在稜鏡組合器32內反射兩次。射線100透過第三面102自稜鏡組合器32出射,並被成像總成76接收,該成像總成接著將場34成像至感測器79上。The illumination is scattered (usually reflected and/or diffracted) from the field 34 as rays 96 with an angular distribution that depends on a characteristic on the field. In the depicted example, only their rays 96 within the numerical aperture of the objective optics of the imaging assembly 76 are shown. The rays 96 enter the beam combiner 32 through the second face 94 and are partially reflected and partially transmitted by the beam splitter layer 84, of which only the reflected rays 98 are shown. The reflected rays 98 irradiate the second surface 94, wherein the reflected rays are reflected as rays 100 by total internal reflection (TIR). All in all, the second optical axis 78 is reflected twice in the combiner 32. The ray 100 passes through the third surface 102 and exits from the beam combiner 32 and is received by the imaging assembly 76, which then images the field 34 onto the sensor 79.

由於射線86及88以超過物鏡光學器件77之數值孔徑之一數值孔徑照射於場34上,因此該等射線形成暗場照明,而以一更小入射角照射於場上之射線92形成亮場照明。輻射源控制器23可藉由激勵經擴展輻射源22中之發射器之不同群組54來控制照明之數值孔徑,且因此可選擇暗場或亮場照明或兩者。另外或另一選擇係,輻射源控制器23可藉由僅激勵對應扇區或若干扇區中之發射器來選擇一特定方位角或方位角範圍來進行照明。Since the rays 86 and 88 irradiate the field 34 with a numerical aperture that exceeds the numerical aperture of the objective optics 77, these rays form dark field illumination, and the ray 92 irradiated on the field with a smaller incident angle forms a bright field illumination. The radiation source controller 23 can control the numerical aperture of the illumination by stimulating different groups 54 of emitters in the expanded radiation source 22, and therefore can select dark field or bright field illumination or both. Additionally or alternatively, the radiation source controller 23 can select a specific azimuth or azimuth range for illumination by only energizing the emitters in the corresponding sector or several sectors.

第二實施例  圖7係根據本發明之另一實施例之一光學設備120之一示意性剖面圖解說明。Second Embodiment FIG. 7 is a schematic cross-sectional illustration of an optical device 120 according to another embodiment of the present invention.

光學設備120包括:一照明總成122、一成像總成124及一稜鏡組合器134。照明總成122包括:一經擴展輻射源126、一輻射源控制器128及聚光光學器件129,該聚光光學器件包括:一準直透鏡陣列130及一聚焦透鏡132。照明總成122透過稜鏡組合器134沿著一第一光學軸138照明一場136。與稜鏡組合器134具有一有限分離(通常1 mm)之場136由在設計上類似於如上文所展示之成像總成76之成像總成124透過稜鏡組合器(由表面152反射)沿著一第二光學軸140成像。The optical device 120 includes: an illumination assembly 122, an imaging assembly 124, and a beam combiner 134. The illumination assembly 122 includes an expanded radiation source 126, a radiation source controller 128, and a condensing optical device 129. The condensing optical device includes a collimating lens array 130 and a focusing lens 132. The illuminating assembly 122 illuminates a field 136 along a first optical axis 138 through the beam combiner 134. The field 136 with a finite separation (usually 1 mm) from the combiner 134 is formed by an imaging assembly 124 similar in design to the imaging assembly 76 shown above through the combiner (reflected by the surface 152). A second optical axis 140 is used for imaging.

經擴展輻射源126包括配置為一陣列且耦合至輻射源控制器128之固態發射器142,其中每一固態發射器由控制器獨立地激勵。每一發射器142以對所有發射器通常係相同的一單個波長或波長範圍輻射。在一替代實施例中,可以均勻角度覆蓋在波長或其組合之間切換之多波長照明可藉由用光學地組合多個獨立激勵之固態發射器之一發射器總成(如在前述實施例中一樣)替換每一固態發射器142來實施。The expanded radiation source 126 includes solid state emitters 142 configured as an array and coupled to the radiation source controller 128, where each solid state emitter is independently excited by the controller. Each emitter 142 radiates at a single wavelength or range of wavelengths that is generally the same for all emitters. In an alternative embodiment, multi-wavelength illumination that can switch between wavelengths or combinations of wavelengths with uniform angle coverage can be achieved by optically combining multiple independently excited solid-state emitters. Same as in) replace each solid-state emitter 142 to implement.

準直透鏡陣列130包括一夫瑞奈透鏡144陣列,其中每一透鏡定位為與恰好一個固態發射器142相對,且其中透鏡被對接在一起(類似於圖5之準直透鏡陣列27之透鏡)。聚焦透鏡132包括一單個夫瑞奈透鏡。在替代實施例中,可使用除夫瑞奈透鏡之外之透鏡,諸如具有球面或非球面表面之透鏡,或以上之任何組合。The collimating lens array 130 includes an array of Freinel lenses 144, where each lens is positioned opposite to exactly one solid-state emitter 142, and the lenses are butted together (similar to the lenses of the collimating lens array 27 in FIG. 5). The focusing lens 132 includes a single Freinel lens. In alternative embodiments, lenses other than Freinel lenses may be used, such as lenses with spherical or aspherical surfaces, or any combination of the above.

稜鏡組合器134包括:一棒,沿著該棒具有一恆定矩形剖面(其中術語「矩形」包含正方形形狀);一第一面146,其面向聚光光學器件129且接近於其;一第二面148,其面向場136且接近於其;及一第三面150,其面向成像總成124。稜鏡組合器134充當用於透過第一面146接收之輻射之空間分佈之一均質化棒,且其包括相對於其長軸成一45度角之一分束器塗層152。聚光光學器件129將由經擴展輻射源126發射之輻射聚焦至第一面146上,如下文將詳述。歸因於稜鏡組合器134之恆定剖面,該稜鏡組合器保留輻射之角度方向(在每一反射處具有一正負號改變)。The combiner 134 includes: a rod with a constant rectangular cross-section along the rod (wherein the term "rectangular" includes a square shape); a first surface 146 facing the condensing optics 129 and close to it; Two sides 148, which face the field 136 and are close to it; and a third side 150, which faces the imaging assembly 124. The beam combiner 134 acts as a homogenizing rod for the spatial distribution of the radiation received through the first surface 146, and it includes a beam splitter coating 152 at a 45 degree angle with respect to its long axis. The concentrating optics 129 focuses the radiation emitted by the expanded radiation source 126 onto the first surface 146, as will be described in detail below. Due to the constant cross-section of the beam combiner 134, the beam combiner preserves the angular direction of the radiation (with a sign change at each reflection).

由固態發射器142中之每一者發射之輻射由面向特定發射器之準直透鏡陣列130之一個夫瑞奈透鏡144接收、透射並準直。舉例而言,自一固態發射器142a上之一點154發射之輻射,如射線156,由一夫瑞奈透鏡144a透射並準直以形成射線158。聚焦透鏡132接收此等射線並將該等射線作為射線160聚焦至第一面146上之一點162,因此將固態發射器142a成像至第一面上,該第一面係針對來自照明總成122之輻射之入射面。在圖7中圖解說明之實施例中,將點154選擇為定位在固態發射器142a之邊緣處,且夫瑞奈透鏡144與聚焦透鏡132之焦距之比率經選擇使得點162 (其係點154之一影像)位於第一面146之邊緣處。固態發射器142a上之剩餘點亦被成像至第一面146上,點162與在第一面146之相對邊緣上之一點168之間(未展示對應射線),使得固態發射器之影像恰好填充第一面。類似地,所有其他固態發射器142之影像填充第一面146,因此在第一面上平均化來自所有發射器之輻射。藉由選擇夫瑞奈透鏡144與聚焦透鏡132之焦距之一不同比率,可致使每一固態發射器之影像過填充第一面146。The radiation emitted by each of the solid-state emitters 142 is received, transmitted, and collimated by a Freinel lens 144 of the collimating lens array 130 facing the specific emitter. For example, radiation emitted from a point 154 on a solid-state emitter 142a, such as ray 156, is transmitted and collimated by a Freinel lens 144a to form ray 158. The focusing lens 132 receives these rays and focuses the rays as rays 160 to a point 162 on the first surface 146, thus imaging the solid-state emitter 142a onto the first surface, which is directed against the light from the illumination assembly 122 The incident surface of the radiation. In the embodiment illustrated in FIG. 7, the point 154 is selected to be positioned at the edge of the solid-state emitter 142a, and the ratio of the focal lengths of the Freinel lens 144 to the focusing lens 132 is selected such that the point 162 (its system point 154 One image) is located at the edge of the first surface 146. The remaining points on the solid-state emitter 142a are also imaged on the first surface 146, between the point 162 and a point 168 on the opposite edge of the first surface 146 (corresponding rays are not shown), so that the image of the solid-state emitter is just filled The first side. Similarly, the images of all other solid-state emitters 142 fill the first surface 146, thus averaging the radiation from all emitters on the first surface. By choosing a different ratio of the focal lengths of the Freinel lens 144 and the focusing lens 132, the image of each solid-state emitter can be caused to overfill the first surface 146.

場136上之照明之角度行為之分析可劃分為兩個部分:第一、分析第一面146上之照明之角度行為,及第二、將角度行為轉移至場136。The analysis of the angular behavior of the lighting on the field 136 can be divided into two parts: first, analyzing the angular behavior of the lighting on the first surface 146, and second, transferring the angular behavior to the field 136.

可利用圖2及光學設備120與光學設備10之間的一類比來分析第一面146上之照明之角度行為:可將準直器透鏡陣列130及聚焦透鏡132與準直器透鏡陣列27及聚焦透鏡28進行比較。固態發射器142類似於出射面26,且第一面146類似於場34。此外,類似於光學設備10中之遠心配置,準直器透鏡陣列130經定位使得固態發射器142定位於其焦平面處,且聚焦透鏡132經定位使得準直器透鏡陣列130位於其焦平面處。2 and an analogy between the optical device 120 and the optical device 10 can be used to analyze the angular behavior of the illumination on the first surface 146: the collimator lens array 130 and the focusing lens 132 and the collimator lens array 27 and The focus lens 28 is compared. The solid state emitter 142 is similar to the exit surface 26 and the first surface 146 is similar to the field 34. Furthermore, similar to the telecentric configuration in the optical device 10, the collimator lens array 130 is positioned so that the solid-state emitter 142 is positioned at its focal plane, and the focusing lens 132 is positioned so that the collimator lens array 130 is positioned at its focal plane. .

因此,類似於光學設備10,準直器透鏡陣列130中之透鏡144界定照明總成122之光闌,且判定自每一透鏡144到達第一面146上之照明錐之數值孔徑。如在設備10中,聚光光學器件129係遠心的,且照明之數值孔徑在第一面146上係平移不變的。具體而言,在所描繪實例中,第一面146上之射線錐160之數值孔徑由透鏡144a判定。Therefore, similar to the optical device 10, the lens 144 in the collimator lens array 130 defines the aperture of the illumination assembly 122, and determines the numerical aperture of the illumination cone from each lens 144 to the first surface 146. As in the device 10, the condensing optics 129 is telecentric, and the numerical aperture of the illumination is invariant to translation on the first surface 146. Specifically, in the depicted example, the numerical aperture of the ray cone 160 on the first surface 146 is determined by the lens 144a.

現可使用透過第一面進入稜鏡組合器134之射線160來分析自第一面146至場136之角度行為之轉移。儘管射線160在稜鏡組合器134內圍繞第一光學軸138經歷多次反射,但歸因於稜鏡組合器之矩形剖面,該射線保持其相對於第一光學軸之角度(在每一反射處具有一正負號改變)。(出於示意性圖解說明之清晰之目的,忽略射線160進入稜鏡組合器134之後之折射,且將反射之數目限制為2)。與圖2類似地繼續,來自固態發射器142a之所有點之射線填充第一面146處之同一數值孔徑。由於所有此等射線被稜鏡組合器134轉移至場136,其中稜鏡組合器使其空間分佈均質化但保留其角度分佈,因此跨越其橫向廣度以與射線160之數值孔徑相同之數值孔徑來照明該場。It is now possible to use the ray 160 entering the beam combiner 134 through the first surface to analyze the angular behavior shift from the first surface 146 to the field 136. Although the ray 160 undergoes multiple reflections around the first optical axis 138 in the ray combiner 134, due to the rectangular cross-section of the ray combiner, the ray maintains its angle relative to the first optical axis (at each reflection The place has a sign to change). (For the sake of clarity of the schematic illustration, the refraction of the ray 160 after entering the beam combiner 134 is ignored, and the number of reflections is limited to 2). Continuing similarly to FIG. 2, the rays from all points of the solid-state emitter 142 a fill the same numerical aperture at the first face 146. Since all these rays are transferred to the field 136 by the ray combiner 134, the ray combiner homogenizes its spatial distribution but retains its angular distribution, and therefore spans its lateral extent to the same numerical aperture as the numerical aperture of the ray 160 Illuminate the field.

類似於光學設備10,當激勵所有固態發射器142時,藉由將準直透鏡陣列130之夫瑞奈透鏡144對接在一起,可達成場136之照明之整個數值孔徑之一無縫填充。Similar to the optical device 10, when all the solid-state emitters 142 are activated, by butting the Frenai lens 144 of the collimating lens array 130 together, one of the entire numerical apertures of the illumination of the field 136 can be seamlessly filled.

相反地,當激勵固態發射器142中之僅某些固態發射器時,達成場136之一定向照明。舉例而言,若激勵固態發射器142a,則所有輻射以一高角度照射在場136上。當此角度超出成像總成124之數值孔徑時,照明包括暗場照明。類似地,激勵位於第一光學軸138上之一固態發射器142b產生亮場照明。歸因於稜鏡組合器134內之來回反射,激勵相對於第一光學軸138不對稱之固態發射器142之一群組產生在場136上具有一雙重角度對稱性之照明。Conversely, when only some of the solid-state emitters 142 are excited, one of the directional illumination of the field 136 is achieved. For example, if the solid-state emitter 142a is excited, all radiation illuminates the field 136 at a high angle. When this angle exceeds the numerical aperture of the imaging assembly 124, the illumination includes dark field illumination. Similarly, a solid-state emitter 142b located on the first optical axis 138 is excited to produce bright field illumination. Due to the back-and-forth reflections within the combiner 134, excitation of a group of solid-state emitters 142 that are asymmetric with respect to the first optical axis 138 produces illumination with a double angular symmetry on the field 136.

歸因於由稜鏡組合器134自第一面146透射之輻射在自第二面148出射時係空間上均質的且角度地均勻分佈之事實,可基於場136上之所期望輻照度及光學機械考量選擇第二面148與場136之間的距離。舉例而言,此距離可係在0.5 mm與2 mm之間。Attributable to the fact that the radiation transmitted from the first surface 146 by the beam combiner 134 is spatially homogeneous and angularly evenly distributed when exiting from the second surface 148, it can be based on the desired irradiance and optics on the field 136 The distance between the second surface 148 and the field 136 is selected for mechanical considerations. For example, this distance can be between 0.5 mm and 2 mm.

基於發明者之模擬,本發明之實施例使得能夠在自2 mm至20 mm之一對角線尺寸內以超過0.3之一數值孔徑來照明場136,其中具有跨越場變化不超過10%之一輻照度且具有在場中之所有點處跨越數值孔徑變化不超過20%之一輻射強度。Based on the inventor’s simulation, the embodiment of the present invention enables the field 136 to be illuminated with a numerical aperture of more than 0.3 within a diagonal dimension from 2 mm to 20 mm, with a cross-field variation of no more than 10% Irradiance and having a radiant intensity that does not vary more than 20% across the numerical aperture at all points in the field.

由場136反射及繞射之輻射透過第二面148返回至稜鏡組合器134,傳播至分束器塗層152,且由塗層部分地反射且部分地透射。經反射輻射透過第三面150出射且被成像總成124接收,該成像總成接著將場136成像至其感測器上。第一光學軸138與第二光學軸140分別重疊在分束器塗層152與場136之間的空間中。The radiation reflected and diffracted by the field 136 returns to the beam combiner 134 through the second surface 148, propagates to the beam splitter coating 152, and is partially reflected and partially transmitted by the coating. The reflected radiation exits through the third face 150 and is received by the imaging assembly 124, which then images the field 136 onto its sensors. The first optical axis 138 and the second optical axis 140 overlap in the space between the beam splitter coating 152 and the field 136, respectively.

第三實施例  圖8係根據本發明之又一實施例之一光學設備200之一示意性剖面圖解說明。Third Embodiment FIG. 8 is a schematic cross-sectional illustration of an optical device 200 according to another embodiment of the present invention.

光學設備200包括:一照明總成202、一成像總成204及一稜鏡組合器206。照明總成202包括:一經擴展輻射源208、一空間光調變器210及一準直器透鏡212。準直器透鏡212用作照明總成202之聚光光學器件,且係在一遠心位置中使得空間光調變器210 (其係照明總成202之光闌)與其焦平面重合。在所描繪實施例中,準直器透鏡212包括一夫瑞奈透鏡。另一選擇係,其可包括具有球面或非球面表面之一習用高NA透鏡,或具有夫瑞奈類型、球面及非球面表面之任何組合之一透鏡。透鏡212之焦距及直徑根據所需照明NA及所期望經照明場大小來選擇。一輻射源控制器214耦合至經擴展輻射源208及空間光調變器210。The optical device 200 includes: an illumination assembly 202, an imaging assembly 204, and an optical combiner 206. The lighting assembly 202 includes an expanded radiation source 208, a spatial light modulator 210, and a collimator lens 212. The collimator lens 212 is used as the condensing optics of the illumination assembly 202, and in a telecentric position, the spatial light modulator 210 (which is the diaphragm of the illumination assembly 202) coincides with its focal plane. In the depicted embodiment, the collimator lens 212 includes a Freinel lens. Alternatively, it may include a conventional high NA lens with a spherical or aspherical surface, or a lens with any combination of Frenet type, spherical and aspherical surfaces. The focal length and diameter of the lens 212 are selected according to the required illumination NA and the desired illuminated field size. A radiation source controller 214 is coupled to the extended radiation source 208 and the spatial light modulator 210.

照明總成202透過稜鏡組合器206沿著多個第一光學軸218c照明一場216,如下文將詳述。成像總成204包括一感測器及沿著一第二光學軸220將場216成像至感測器上之物鏡光學器件(如上文所展示)。The illuminating assembly 202 illuminates a field 216 along a plurality of first optical axes 218c through the beam combiner 206, as will be described in detail below. The imaging assembly 204 includes a sensor and objective optics (as shown above) that images the field 216 onto the sensor along a second optical axis 220.

稜鏡組合器206包括相對於彼此平行之一第一面222及一第二面224。稜鏡組合器206進一步包括一內部鏡226及多個內部分束器層228,其中該鏡與該等分束器層兩者彼此平行且相對於面222及224傾斜。The combiner 206 includes a first surface 222 and a second surface 224 parallel to each other. The beam combiner 206 further includes an inner mirror 226 and a plurality of inner beam splitter layers 228, wherein the mirror and the beam splitter layers are parallel to each other and inclined with respect to the surfaces 222 and 224.

經擴展輻射源208沿著一第一光學軸218朝向空間光調變器210發射輻射,該第一光學軸在經擴展輻射源208與場216之間的光學路徑之不同部分中藉由反射劃分為標記218a、218b及218c之分段。可類似於一多媒體投影機光引擎來組態輻射源208。舉例而言,其光源可包括一單個白光或單色LED、諸如紅色、綠色、藍色之多個彩色LED或紅外LED、一個或數個雷射或一雷射泵激磷光體。由於稜鏡組合器206之多個分束器層228複製經照明場,因此僅需要輻射源208之光展量足夠高以在由分束器層228中之一者照明之場内提供所需均勻照明NA。稜鏡組合器206對光展量之擴增伴隨有照明之輻射強度之一對應損失,如下文將更全面地解釋。空間光調變器210基於自控制器214接收之信號控制其朝向準直器透鏡212透射及投影之輻射之空間分佈(圖9中展示實例)。舉例而言,空間光調變器210可係一數位微鏡裝置(DMD)、一透射液晶(LC)裝置或一反射矽上液晶(LCOS)裝置。另一選擇係,SLM可與經擴展光源208整合且可包括一經分段LED源或一有機發光二極體(OLED)陣列。The expanded radiation source 208 emits radiation toward the spatial light modulator 210 along a first optical axis 218 that is divided by reflection in different parts of the optical path between the expanded radiation source 208 and the field 216 The sections marked 218a, 218b, and 218c. The radiation source 208 can be configured similar to a multimedia projector light engine. For example, the light source may include a single white or monochromatic LED, multiple color LEDs or infrared LEDs such as red, green, and blue, one or several lasers, or a laser pump phosphor. Since the multiple beam splitter layers 228 of the beam combiner 206 replicate the illuminated field, it is only necessary that the elongation of the radiation source 208 is high enough to provide the required uniformity in the field illuminated by one of the beam splitter layers 228 Lighting NA. The amplification of the elongation of the luminous combiner 206 is accompanied by a corresponding loss of the radiant intensity of the illumination, which will be explained more fully below. The spatial light modulator 210 controls the spatial distribution of the radiation transmitted and projected toward the collimator lens 212 based on the signal received from the controller 214 (an example is shown in FIG. 9). For example, the spatial light modulator 210 can be a digital micromirror device (DMD), a transmissive liquid crystal (LC) device, or a reflective liquid crystal on silicon (LCOS) device. Alternatively, the SLM may be integrated with the expanded light source 208 and may include a segmented LED source or an organic light emitting diode (OLED) array.

歸因於遠心設計,準直器透鏡212準直源自空間光調變器210上之任何既定點之輻射,因此形成一經準直射線束,該經準直射線束相對於第一光學軸218a之角度由既定點距第一光學軸之距離及準直器透鏡212之焦距判定。Due to the telecentric design, the collimator lens 212 collimates the radiation from any given point on the spatial light modulator 210, thus forming a collimated ray beam. The angle of the collimated ray beam relative to the first optical axis 218a It is determined by the distance between the predetermined point and the first optical axis and the focal length of the collimator lens 212.

第一光學軸218a透過第一面222進入稜鏡組合器206,照射於鏡226上。鏡226將第一光學軸218a反射為一經反射第一光學軸218b,在到達分束器層228之前,該經反射第一光學軸分別在第一面222與第二面224之間隨後被多次反射。第一面與第二面之間的反射之數目由稜鏡組合器206之厚度及鏡226之傾斜角判定。當鏡226之傾斜角足以使得輻射隨後由全內反射自第一面222及第二面224反射時,且當稜鏡組合器206足夠薄時,分束器表現為一波導。在所揭示實施例中,稜鏡組合器206通常係自50 mm至200 mm長,自20 mm至50 mm寬,且自2 mm 至10 mm厚。內部反射之數目通常小於10,但亦可更高。歸因於面222與224之平行性,在稜鏡組合器206內傳播之輻射之射線角經保持,且照射於場216上之照明係遠心的。由於照明係遠心的,空間光調變器210上之每一空間位置轉譯為投影至場216上之輻射之一角度方向,且藉由控制空間光調變器,可選擇輻射之角度範圍。The first optical axis 218a enters into the combiner 206 through the first surface 222, and irradiates the mirror 226. The mirror 226 reflects the first optical axis 218a into a reflected first optical axis 218b. Before reaching the beam splitter layer 228, the reflected first optical axis is subsequently multiplied between the first surface 222 and the second surface 224, respectively. Times reflection. The number of reflections between the first surface and the second surface is determined by the thickness of the combiner 206 and the tilt angle of the mirror 226. When the tilt angle of the mirror 226 is sufficient to allow the radiation to be subsequently reflected from the first surface 222 and the second surface 224 by total internal reflection, and when the beam combiner 206 is sufficiently thin, the beam splitter behaves as a waveguide. In the disclosed embodiment, the combiner 206 is generally from 50 mm to 200 mm long, from 20 mm to 50 mm wide, and from 2 mm to 10 mm thick. The number of internal reflections is usually less than 10, but can be higher. Due to the parallelism of the planes 222 and 224, the ray angle of the radiation propagating in the beam combiner 206 is maintained, and the illumination on the field 216 is telecentric. Since the illumination is telecentric, each spatial position on the spatial light modulator 210 is translated into an angular direction of radiation projected onto the field 216, and by controlling the spatial light modulator, the angular range of the radiation can be selected.

在每一分束器層228處,第一光學軸218b被部分地透射且部分地反射為經反射光學軸218c中之一者。所有光學軸218c透過第二面224出射且照射於場216上,因此照明該場。連續分束器層228之反射率係漸進的,其中反射率沿著分束器206之長度增加,使得來自層228中之每一者之經反射通量相對於其他層變化不超過舉例而言10%之一預界定限制。可藉由(舉例而言)利用薄膜干涉塗層來針對離散波長達成此漸進,其中每一連續分束器塗層經設計以具有反射與透射之間的一所需比率。適合薄膜塗層可自舉例而言REO Inc. (5505 Airport Blvd, Boulder CO 8030, USA)及IDEX Corporation (200 Dorado Place SE, Albuquerque NM 87123, USA)購得。儘管具有比所揭示實施例所預期之彼等要求更寬的波長範圍及更嚴格的均勻性要求,但具類似功能之光學塗層在由Lumus (8 Pinchas Sapir Street, Ness Ziona, ISRAEL 7403631)製造之擴增實境光學引擎中實施。At each beam splitter layer 228, the first optical axis 218b is partially transmissive and partially reflected as one of the reflected optical axis 218c. All optical axes 218c exit through the second surface 224 and illuminate the field 216, thus illuminating the field. The reflectivity of the continuous beam splitter layer 228 is progressive, where the reflectivity increases along the length of the beam splitter 206 so that the reflected flux from each of the layers 228 does not change more than for example One of 10% pre-defined limit. This progression can be achieved for discrete wavelengths by, for example, using thin film interference coatings, where each continuous beam splitter coating is designed to have a desired ratio between reflection and transmission. Suitable thin film coatings can be purchased from, for example, REO Inc. (5505 Airport Blvd, Boulder CO 8030, USA) and IDEX Corporation (200 Dorado Place SE, Albuquerque NM 87123, USA). Although it has a wider wavelength range and stricter uniformity requirements than those expected by the disclosed embodiments, optical coatings with similar functions are manufactured by Lumus (8 Pinchas Sapir Street, Ness Ziona, ISRAEL 7403631) Implemented in the augmented reality optical engine.

另一選擇係,分級可藉由包括變化之直徑之金屬點之半色調(亦稱為圓點紋)型塗層來達成。在一介電塗層上方之一帶圓點塗層之優點係其對入射波長及入射角不敏感。其缺點係歸因於多次透射之一經減小效率。可藉由使不透明反射點之大小相對於網格之透明部分變化來容易地控制反射與透射之間的比率。適合帶圓點分束塗層可自舉例而言Thorlabs Inc.(56 Sparta Avenue, Newton, New Jersey 07860, USA)、Edmund Optics Inc. (101 East Gloucester Pike, Barrington, NJ 08007-1380 USA)、Sigma Koki Co. Ltd. (1-19-9, Midori, Sumida-ku, Tokyo, 130-0021, JAPAN)及Shimadzu Corporation (1 Nishinokyo Kuwabara-cho, Nakagyo-ku, Kyoto 604-8511, Japan)購得。Alternatively, the grading can be achieved by a halftone (also known as dot pattern) type coating including metallic dots of varying diameters. The advantage of a dot coating above a dielectric coating is that it is not sensitive to incident wavelength and incident angle. The disadvantage is due to the reduced efficiency of one of the multiple transmissions. The ratio between reflection and transmission can be easily controlled by changing the size of the opaque reflection point relative to the transparent part of the grid. Suitable for beam splitting coating with dots can be, for example, Thorlabs Inc. (56 Sparta Avenue, Newton, New Jersey 07860, USA), Edmund Optics Inc. (101 East Gloucester Pike, Barrington, NJ 08007-1380 USA), Koki Co. Ltd. (1-19-9, Midori, Sumida-ku, Tokyo, 130-0021, JAPAN) and Shimadzu Corporation (1 Nishinokyo Kuwabara-cho, Nakagyo-ku, Kyoto 604-8511, Japan) purchased.

分束器層228定位在距場216之平面通常在自2 mm至20 mm之範圍內之一距離處。因此,分束器層228之0.15 mm與0.3 mm之間的一點間距係足夠小的以平均化由圓點紋塗層之離散本質所致使之任何潛在空間或角度不均勻性。The beam splitter layer 228 is positioned at a distance from the plane of the field 216, usually in the range from 2 mm to 20 mm. Therefore, the distance between 0.15 mm and 0.3 mm of the beam splitter layer 228 is sufficiently small to average out any potential spatial or angular non-uniformity caused by the discrete nature of the dot pattern coating.

由於場216上之照明係無焦點的且SLM 210之影像被投影至無窮遠,因此包圍在塗層228之極限邊緣之間的稜鏡組合器206之一區段構成對經照明場之一額外限制孔徑。此限制孔徑示意性地表示為輻射透過其引導至場之第二面224之一有效孔徑230。源自SLM 210之經投影影像之照明光被場216之邊界外部之有效孔徑230漸暈。Since the illumination on the field 216 is afocal and the image of the SLM 210 is projected to infinity, a section of the combiner 206 enclosed between the extreme edges of the coating 228 constitutes an additional to the illuminated field Limit the aperture. This restricted aperture is schematically represented as an effective aperture 230 through which radiation is directed to the second face 224 of the field. The illumination light from the projected image of the SLM 210 is vignetted by the effective aperture 230 outside the boundary of the field 216.

所揭示實施例使得能夠以一高數值孔徑照明場216,僅受到稜鏡組合器206內之光之傳播依賴於TIR之事實之限制。對於由具有一折射指n < 2之玻璃構造之稜鏡組合器206,照射於場216上之照明之NA被限制為0.35。The disclosed embodiment makes it possible to illuminate the field 216 with a high numerical aperture, only limited by the fact that the propagation of the light within the beam combiner 206 depends on the TIR. In the case of the combiner 206 constructed of glass with a refractive index n<2, the NA of the illumination irradiated on the field 216 is limited to 0.35.

所揭示實施例進一步提供在場216內跨越場變化不超過10%之一輻照度且具備在場中之所有點處跨越數值孔徑變化不超過10%之一輻射強度。The disclosed embodiment further provides that the irradiance in the field 216 does not vary more than one 10% across the field and has a radiant intensity that does not exceed one 10% across the numerical aperture at all points in the field.

經照明場216之輻射朝向稜鏡組合器206反向散射(反射及繞射),且由分束器沿著第二光學軸220透射至成像總成204中,該成像總成接著將場216成像至其感測器上。The radiation passing through the illuminating field 216 is backscattered (reflected and diffracted) toward the beam combiner 206, and is transmitted by the beam splitter along the second optical axis 220 into the imaging assembly 204, which then transmits the field 216 Image onto its sensor.

儘管其經限制照明NA,但所揭示實施例具有相異效能優點。舉例而言,對於經照明場216之一既定對角線尺寸,其達成相對大的清晰照明平衡與一短工作距離(參考稜鏡組合器206與場216之間的距離)之一有利組合。特徵之此組合舉例而言在印刷或沈積在不均勻或撓曲電子基板上之精細圖案之高速檢驗中係重要的。Although it is limited to illuminate NA, the disclosed embodiment has different performance advantages. For example, for a predetermined diagonal size of the illuminated field 216, it achieves an advantageous combination of a relatively large clear lighting balance and a short working distance (refer to the distance between the combinator 206 and the field 216). This combination of features is important, for example, in the high-speed inspection of fine patterns printed or deposited on uneven or flexed electronic substrates.

另外,如上文所說明,複製經照明場減小對照明總成202之光展量之要求。此轉變為照明總成202之低功率要求以及總成之一更小大小及更低成本。In addition, as described above, the requirement for reducing the elongation of the lighting assembly 202 through the illumination field is replicated. This change is the low power requirement of the lighting assembly 202 and a smaller size and lower cost of the assembly.

圖9係根據本發明之一實施例之來自圖8之空間光調變器210之輻射之發射度之不同空間分佈之一示意性表示。FIG. 9 is a schematic representation of different spatial distributions of the emissivity of radiation from the spatial light modulator 210 of FIG. 8 according to an embodiment of the present invention.

圖9中作為一實例展示自空間光調變器210出射之輻射之六個不同空間分佈250、252、254、256、258及260。每一分佈包括一中心區域,諸如分佈 254中之一中心區域262,及圍繞中心區域之一環形物,諸如分佈254中之一環形物264。一白色區域指示舉例而言90%之一高位準之發射度M,其中100%係指發射度之最高可能位準且0%係指零發射度。光陰影指示舉例而言50%之一中間位準之發射度,且暗陰影指示舉例而言10%或更少之一低位準之發射度。藉由空間光調變器210之橫向尺寸與準直器透鏡212之焦距之一適合組合,中心區域262與環形物264之間的邊界可經選擇以對應於成像總成204之物鏡光學器件之數值孔徑。在此實施例中,中心區域262對應於亮場照明,且環形物264對應於暗場照明。分佈250…260演示來自空間光調變器210之發射度之空間分佈之不同選擇,該空間光調變器在場216處給予全亮場照明及暗場照明之不同角度分佈。As an example, FIG. 9 shows six different spatial distributions 250, 252, 254, 256, 258, and 260 of the radiation emitted from the spatial light modulator 210. Each distribution includes a central area, such as a central area 262 in the distribution 254, and a ring around the central area, such as a ring 264 in the distribution 254. A white area indicates, for example, a high level of emissivity M of 90%, where 100% refers to the highest possible level of emissivity and 0% refers to zero emissivity. The light shading indicates, for example, the emissivity of a middle level of 50%, and the dark shadow indicates the emissivity of a low level of 10% or less, for example. By suitable combination of the lateral size of the spatial light modulator 210 and the focal length of the collimator lens 212, the boundary between the central area 262 and the ring 264 can be selected to correspond to the objective optics of the imaging assembly 204 Numerical aperture. In this embodiment, the central area 262 corresponds to bright field illumination, and the ring 264 corresponds to dark field illumination. Distributions 250...260 demonstrate different options for the spatial distribution of the emittance from the spatial light modulator 210, which gives different angular distributions of full bright field illumination and dark field illumination at field 216.

儘管上文所闡述之實施例中之每一者具有某些相異特徵,但此等特徵之其他組合對於熟習此項技術者在閱讀本說明之後將係顯而易見的且被視為係在本發明之範疇內。作為一非限制性實例,上文之第三實施例之基於SLM之輻射源可與第一或第二實施例之光學器件一起使用,且第一及第二實施例中之發射器陣列可與第三實施例之光學器件一起使用。所有此等替代實施方案皆被視為在本發明之範疇內。Although each of the above-explained embodiments has certain different features, other combinations of these features will be obvious to those skilled in the art after reading this description and are considered to be related to the present invention Within the category. As a non-limiting example, the SLM-based radiation source of the third embodiment above can be used with the optical device of the first or second embodiment, and the emitter arrays of the first and second embodiments can be used with The optical devices of the third embodiment are used together. All such alternative embodiments are considered to be within the scope of the present invention.

因此,將瞭解,藉由實例方式引用上文所闡述之實施例,且本發明不限於上文中已特定展示及闡述之內容。而是,本發明之範疇包含上文中所闡述之各種特徵之組合及子組合兩者,以及熟習此項技術者在閱讀上述說明後將聯想到且在先前技術中未揭示之對該等各種特徵之變化及修改。Therefore, it will be understood that the embodiments described above are cited by way of examples, and the present invention is not limited to the content specifically shown and described above. Rather, the scope of the present invention includes both combinations and sub-combinations of the various features set forth above, and those who are familiar with the technology will think of these various features after reading the above description and have not been disclosed in the prior art. The changes and modifications.

10:光學設備/設備 20:照明總成 21:聚光光學器件 22:經擴展輻射源/源 23:輻射源控制器 24:均質化棒/實心均質化棒/棒 25:入射面 26:出射面/既定出射面 27:準直透鏡陣列/準直器透鏡陣列 28:聚焦透鏡/透鏡 29:均質化棒陣列/均質化棒 30:補償透鏡 32:稜鏡組合器 34:場 35:第一光學軸 36:射線 38:點 40:射線/經準直射線 42:射線 43:點 50:胞元/最外部胞元 52:圓形中心胞元/中心胞元 54:發射器/群組 56:經放大插圖 58:發射器 60:發射器 70:個別準直透鏡/對應透鏡/透鏡/準直透鏡/準直器透鏡/夫瑞奈透鏡分段 72:圓形中心透鏡/透鏡 76:成像總成 77:物鏡光學器件 78:第二光學軸 79:感測器 80:上部稜鏡 82:下部稜鏡 84:分束器層 86:極限射線/射線 88:極限射線/射線 90:第一面/射線 92:中心射線/射線 94:第二面 96:射線 98:經反射射線 100:射線 102:第三面 120:光學設備 122:照明總成 124:成像總成 126:經擴展輻射源 128:輻射源控制器 129:聚光光學器件 130:準直透鏡陣列/準直器透鏡陣列 132:聚焦透鏡 134:稜鏡組合器 136:場 138:第一光學軸 140:第二光學軸 142:固態發射器/發射器 142a:固態發射 142b:固態發射器 144:夫瑞奈透鏡/透鏡 144a:夫瑞奈透鏡/透鏡 146:第一面 148:第二面 150:第三面 152:表面/分束器塗層 154:點 156:射線 158:射線 160:射線/射線錐 162:點 168:點 200:光學設備 202:照明總成 204:成像總成 206:稜鏡組合器/分束器 208:經擴展輻射源/輻射源/经擴展光源 210:空間光調變器 212:準直器透鏡/透鏡 214:輻射源控制器/控制器 216:場 218a:第一光學軸 218b:經反射第一光學軸/第一光學軸 218c:第一光學軸/經反射光學軸/光學軸 220:第二光學軸 222:第一面/面 224:第二面/面 226:內部鏡/鏡 228:分束器層/層/塗層 230:有效孔徑 250:空間分佈/分佈 252:空間分佈 254:空間分佈/分佈 256:空間分佈 258:空間分佈 260:空間分佈/分佈 262:中心區域 264:環形物 300:點 301:第三光學軸 302a:射線/極限射線 302b:射線/中心射線 302c:射線/極限射線 303:細節 304a:射線 304b:射線 304c:射線 306a:射線 306b:射線/經折射射線/中心射線 306c:射線 308:點/場點 310:點 312a:射線 312b:射線/中心射線 312c:射線 314a:射線 314b:射線 314c:射線 316a:射線 316b:射線/經折射射線/中心射線 316c:射線 318:點/場點 320:點 400:細節 401:陣列 402:額外虛擬源/虛擬源 402a:虛擬源 404:虛擬擴展源/源 406:場透鏡/平凸場透鏡 408:影像 410:射線 412:射線 414:虛線 416:表面 420:漫射器 fCOLL :準直透鏡與出射面之間的距離/準直透鏡之有效焦距10: Optical equipment/equipment 20: Illumination assembly 21: Concentrating optics 22: Extended radiation source/source 23: Radiation source controller 24: Homogenizing rod/solid homogenizing rod/rod 25: Incident surface 26: Exit Surface / predetermined exit surface 27: collimating lens array / collimator lens array 28: focusing lens / lens 29: homogenizing rod array / homogenizing rod 30: compensating lens 32: 稜鏡 combiner 34: field 35: first Optical axis 36: ray 38: point 40: ray/collimated ray 42: ray 43: point 50: cell/outermost cell 52: circular central cell/central cell 54: emitter/group 56 : Enlarged Illustration 58: Emitter 60: Emitter 70: Individual collimator lens/corresponding lens/lens/collimator lens/collimator lens/Frene lens segment 72: Circular center lens/lens 76: Imaging Assembly 77: objective optics 78: second optical axis 79: sensor 80: upper beam 82: lower beam 84: beam splitter layer 86: limit ray/ray 88: limit ray/ray 90: first Face/ray 92: central ray/ray 94: second face 96: ray 98: reflected ray 100: ray 102: third face 120: optical equipment 122: lighting assembly 124: imaging assembly 126: extended radiation source 128: Radiation source controller 129: Condensing optics 130: Collimating lens array/collimator lens array 132: Focusing lens 134: Combiner 136: Field 138: First optical axis 140: Second optical axis 142 : Solid-state emitter/emitter 142a: solid-state emitter 142b: solid-state emitter 144: Freinel lens/lens 144a: Freinel lens/lens 146: first surface 148: second surface 150: third surface 152: surface / Beam splitter coating 154: point 156: ray 158: ray 160: ray/ray cone 162: point 168: point 200: optical equipment 202: lighting assembly 204: imaging assembly 206: beam combiner/beam splitter 208: extended radiation source/radiation source/extended light source 210: spatial light modulator 212: collimator lens/lens 214: radiation source controller/controller 216: field 218a: first optical axis 218b: warp Reflective first optical axis/first optical axis 218c: first optical axis/reflected optical axis/optical axis 220: second optical axis 222: first surface/surface 224: second surface/surface 226: internal mirror/mirror 228: beam splitter layer/layer/coating 230: effective aperture 250: spatial distribution/distribution 252: spatial distribution 254: spatial distribution/distribution 256: spatial distribution 258: spatial distribution 260: spatial distribution/distribution 262: central area 264 : Ring 300: point 301: third optical axis 302a: ray/limit ray 302b: ray/central ray 302c: ray/limit ray 303: detail 304a: ray 304b: ray 304c: ray 306a: shot Line 306b: Ray/Refraction Ray/Central Ray 306c: Ray 308: Point/Field Point 310: Point 312a: Ray 312b: Ray/Central Ray 312c: Ray 314a: Ray 314b: Ray 314c: Ray 316a: Ray 316b: Ray /Refracted ray/Central ray 316c: ray 318: point/field point 320: point 400: detail 401: array 402: additional virtual source/virtual source 402a: virtual source 404: virtual extended source/source 406: field lens/flat Convex field lens 408: image 410: ray 412: ray 414: dashed line 416: surface 420: diffuser f COLL : the distance between the collimating lens and the exit surface / the effective focal length of the collimating lens

圖1係根據本發明之一實施例之一照明及成像設備之一示意性剖面圖解說明; 圖2係根據本發明之一實施例展示圖1之光學設備之一細節之一示意性剖面圖解說明; 圖3係根據本發明之一替代實施例展示光學設備之一細節之一示意性剖面圖解說明; 圖4係根據本發明之一實施例在圖1之設備中使用之一輻射源之一示意性正面圖解說明; 圖5係根據本發明之一實施例在圖1之設備中使用之一準直器透鏡陣列之一示意性正面圖解說明; 圖6係根據本發明之一實施例在圖1之設備中使用之一稜鏡組合器之一示意性剖面圖解說明; 圖7係根據本發明之另一實施例之一光學設備之一示意性剖面圖解說明; 圖8係根據本發明之又一實施例之一光學設備之一示意性剖面圖解說明;及 圖9係根據本發明之一實施例來自圖8之設備中之一空間光調變器之輻射之發射度之不同空間分佈之一示意性表示。Figure 1 is a schematic cross-sectional illustration of an illumination and imaging device according to an embodiment of the present invention; FIG. 2 is a schematic cross-sectional diagram illustrating one of the details of the optical device of FIG. 1 according to an embodiment of the present invention; Fig. 3 is a schematic cross-sectional diagram illustrating one of the details of the optical device according to an alternative embodiment of the present invention; Fig. 4 is a schematic front diagrammatic illustration of a radiation source used in the device of Fig. 1 according to an embodiment of the present invention; Fig. 5 is a schematic front diagrammatic illustration of a collimator lens array used in the device of Fig. 1 according to an embodiment of the present invention; FIG. 6 is a schematic cross-sectional illustration of a combination device used in the device of FIG. 1 according to an embodiment of the present invention; Fig. 7 is a schematic cross-sectional illustration of an optical device according to another embodiment of the present invention; Fig. 8 is a schematic cross-sectional illustration of an optical device according to another embodiment of the present invention; and FIG. 9 is a schematic representation of the different spatial distribution of the emissivity of radiation from a spatial light modulator in the device of FIG. 8 according to an embodiment of the present invention.

10:光學設備/設備 10: Optical equipment/equipment

20:照明總成 20: Lighting assembly

21:聚光光學器件 21: Condensing optics

22:經擴展輻射源/源 22: Extended radiation source/source

23:輻射源控制器 23: Radiation source controller

24:均質化棒/實心均質化棒/棒 24: Homogenizing rod/solid homogenizing rod/rod

25:入射面 25: incident surface

26:出射面/既定出射面 26: Exit surface/established exit surface

27:準直透鏡陣列/準直器透鏡陣列 27: Collimator lens array/collimator lens array

28:聚焦透鏡/透鏡 28: Focusing lens/lens

29:均質化棒陣列/均質化棒 29: Homogenizing rod array/homogenizing rod

30:補償透鏡 30: Compensation lens

32:稜鏡組合器 32: 稜鏡 combiner

34:場 34: field

35:第一光學軸 35: first optical axis

36:射線 36: Ray

38:點 38: point

40:射線/經準直射線 40: Ray/Collimated Ray

42:射線 42: Ray

43:點 43: point

70:個別準直透鏡/對應透鏡/透鏡/準直透鏡/準直器透鏡/夫瑞奈透鏡分段 70: Individual collimating lens/corresponding lens/lens/collimating lens/collimator lens/frenne lens segment

76:成像總成 76: imaging assembly

77:物鏡光學器件 77: Objective optics

79:感測器 79: Sensor

Claims (58)

一種光學設備,其包括: 一照明總成,其包括: 一經擴展輻射源,其以一可控制空間分佈發射輻射;及 遠心聚光光學器件,其經組態以接收並沿著一第一光學軸以超過0.3之一數值孔徑將該經發射輻射投影至一場上; 一成像總成,其包括一感測器及經組態以沿著一第二光學軸將該場成像至該感測器上之物鏡光學器件;及 一稜鏡組合器,其定位於該場與該聚光光學器件及該物鏡光學器件之間且經組態以組合該第一光學軸與該第二光學軸,同時使該等光學軸中之至少一者在該稜鏡組合器內反射多次。An optical device, which includes: A lighting assembly, which includes: Once the extended radiation source, it emits radiation in a controllable spatial distribution; and A telecentric concentrating optical device configured to receive and project the emitted radiation onto a field along a first optical axis with a numerical aperture exceeding 0.3; An imaging assembly including a sensor and objective optics configured to image the field onto the sensor along a second optical axis; and A combiner that is positioned between the field and the condensing optics and the objective optics and is configured to combine the first optical axis and the second optical axis, while making one of the optical axes At least one of them is reflected multiple times in the 稜鏡 combiner. 如請求項1之光學設備,其中該等聚光光學器件經組態以將該輻射均勻地投影在具有超過2 mm之一對角線尺寸之該場之一區域內,其中具有跨越該區域變化不超過10%之一輻照度且具有在該區域中之所有點處跨越該數值孔徑變化不超過20%之一輻射強度。The optical device of claim 1, wherein the condensing optics are configured to uniformly project the radiation in an area of the field having a diagonal size of more than 2 mm, with variations across the area An irradiance of not more than 10% and having a radiant intensity that does not vary more than 20% across the numerical aperture at all points in the region. 如請求項2之光學設備,其中該等聚光光學器件在其內投影該光學輻射之該場之該區域之該對角線尺寸超過15 mm。The optical device of claim 2, wherein the diagonal dimension of the area of the field of the optical radiation in which the condensing optical devices project the optical radiation exceeds 15 mm. 如請求項1之光學設備,其中該經擴展輻射源包括一發射器陣列,且該設備包括一輻射源控制器,該輻射源控制器經耦合以藉由由該輻射源控制器選擇性地激勵該等發射器來控制該空間分佈。The optical device of claim 1, wherein the expanded radiation source includes an emitter array, and the device includes a radiation source controller that is coupled to be selectively excited by the radiation source controller The transmitters control the spatial distribution. 如請求項4之光學設備,其中該發射器陣列包括不同之各別波長之多個發射器,且其中該輻射源控制器經組態以選擇性地激勵該等發射器以便控制投影至該場上之該輻射之一光譜內容。The optical device of claim 4, wherein the emitter array includes a plurality of emitters of different respective wavelengths, and wherein the radiation source controller is configured to selectively excite the emitters to control projection to the field One of the spectral content of the radiation above. 如請求項4之光學設備,其中該發射器陣列係一第一陣列,且其中該等聚光光學器件包括一第二均質化棒陣列,每一棒包括經定位以自該等發射器中之一或多者接收該經發射輻射之一入射面,及該輻射透過其發射之一出射面。The optical device of claim 4, wherein the emitter array is a first array, and wherein the light-concentrating optical devices include a second homogenizing rod array, and each rod includes a One or more receive an incident surface of the emitted radiation, and an exit surface through which the radiation is emitted. 如請求項6之光學設備,其中該等聚光光學器件包括: 一第三準直透鏡陣列,其中每一準直透鏡經組態以接收並準直自該等均質化棒中之一各別者發射之該輻射;及 一聚焦透鏡,其經定位以自該第三準直透鏡陣列接收該經準直輻射並將該輻射透射並聚焦至該場上。Such as the optical equipment of claim 6, wherein the condensing optical devices include: A third collimating lens array, wherein each collimating lens is configured to receive and collimate the radiation emitted from each of the homogenizing rods; and A focusing lens positioned to receive the collimated radiation from the third collimating lens array and transmit and focus the radiation onto the field. 如請求項7之光學設備,其中該等準直透鏡包括夫瑞奈透鏡。The optical device of claim 7, wherein the collimating lenses include Freinel lenses. 如請求項7之光學設備,其中該聚焦透鏡包括一夫瑞奈透鏡。The optical device of claim 7, wherein the focusing lens includes a Freinel lens. 如請求項4之光學設備,其中每一均質化棒之該出射面包括一場透鏡及一漫射器中之至少一者。Such as the optical device of claim 4, wherein the exit surface of each homogenizing rod includes at least one of a field lens and a diffuser. 如請求項4之光學設備,其中該輻射源控制器經組態以選擇性地激勵該等發射器以便選擇投影至該場上之該輻射之一角度範圍。The optical device of claim 4, wherein the radiation source controller is configured to selectively excite the emitters so as to select an angular range of the radiation projected onto the field. 如請求項11之光學設備,其中該角度範圍係選自由一暗場及一亮場照明範圍組成之一角度範圍群組。Such as the optical device of claim 11, wherein the angle range is selected from an angle range group consisting of a dark field and a bright field illumination range. 如請求項1之光學設備,其中該稜鏡組合器經組態以在該稜鏡組合器內透射該第一光學軸及反射該第二光學軸兩次。Such as the optical device of claim 1, wherein the beam combiner is configured to transmit the first optical axis and reflect the second optical axis twice in the beam combiner. 如請求項13之光學設備,其中該第二光學軸係藉由全內反射自毗鄰於該場之該稜鏡組合器之一表面反射。The optical device of claim 13, wherein the second optical axis is reflected from a surface of the combiner adjacent to the field by total internal reflection. 如請求項1之光學設備,其中該等聚光光學器件包括接近於該稜鏡組合器之具有一彎月形狀之一補償透鏡。The optical device of claim 1, wherein the condensing optical devices include a compensating lens having a meniscus shape close to the combinator. 如請求項1之光學設備,其中該稜鏡組合器經組態以使該第一光學軸在該稜鏡組合器內反射多次以便均質化投影至該場上之該輻射。The optical device of claim 1, wherein the beam combiner is configured so that the first optical axis is reflected multiple times in the beam combiner so as to homogenize the radiation projected onto the field. 如請求項16之光學設備,其中該第一光學軸係藉由全內反射自面向該成像總成之該稜鏡組合器之一表面反射。The optical device of claim 16, wherein the first optical axis is reflected from a surface of the combiner facing the imaging assembly by total internal reflection. 如請求項16之光學設備,其中該稜鏡組合器具有一矩形剖面,且包括接近於該等聚光光學器件之一入射面及接近於該場之一出射面,且其中該等聚光光學器件經組態以將由該經擴展輻射源發射之該輻射聚焦至該入射面上。The optical device of claim 16, wherein the combinator has a rectangular cross-section and includes an incident surface close to the condensing optical devices and an exit surface close to the field, and wherein the condensing optical devices It is configured to focus the radiation emitted by the extended radiation source onto the incident surface. 如請求項18之光學設備,其中該經擴展輻射源包括一發射器陣列,且該等聚光光學器件經組態以將該等發射器中之每一者成像至該入射面上。The optical device of claim 18, wherein the expanded radiation source includes an array of emitters, and the concentrating optics are configured to image each of the emitters onto the incident surface. 如請求項19之光學設備,其中該等聚光光學器件包括一夫瑞奈聚焦透鏡。The optical device of claim 19, wherein the condensing optical devices include a Freinel focusing lens. 如請求項1之光學設備,其中該經擴展輻射源包括: 一輻射源;及 一空間光調變器,其經組態以接收並選擇性地透射由該輻射源發射之該輻射,且 其中該設備包括一輻射源控制器,其經耦合以藉由驅動該空間光調變器來控制該空間分佈。Such as the optical device of claim 1, wherein the extended radiation source includes: A radiation source; and A spatial light modulator configured to receive and selectively transmit the radiation emitted by the radiation source, and The device includes a radiation source controller, which is coupled to control the spatial distribution by driving the spatial light modulator. 如請求項21之光學設備,其中該輻射源控制器經組態以選擇性地控制該空間光調變器以便選擇投影至該場上之該輻射之一角度範圍。The optical device of claim 21, wherein the radiation source controller is configured to selectively control the spatial light modulator so as to select an angular range of the radiation projected onto the field. 如請求項21之光學設備,其中該空間光調變器包括一數位微鏡裝置。Such as the optical device of claim 21, wherein the spatial light modulator includes a digital micromirror device. 如請求項21之光學設備,其中該空間光調變器包括一液晶裝置。The optical device of claim 21, wherein the spatial light modulator includes a liquid crystal device. 如請求項1之設備,其中該稜鏡組合器包括: 一入射面,其經定位以接收由該等聚光光學器件沿著該第一光學軸投影之該輻射; 一出射面,其接近於該場;及 多個分束器層,其在該稜鏡組合器內,其中該多個分束器層中之每一者經組態以在透射該第二光學軸時透過該出射面將該輻射之一各別部分反射至該場上。Such as the equipment of claim 1, in which the combinator includes: An incident surface positioned to receive the radiation projected by the condensing optical devices along the first optical axis; An exit surface, which is close to the field; and A plurality of beam splitter layers within the beam combiner, wherein each of the plurality of beam splitter layers is configured to transmit one of the radiation through the exit surface when transmitting the second optical axis The individual parts reflect onto the field. 如請求項25之光學設備,其中該稜鏡組合器經組態以用作用於該經投影輻射之一波導。The optical device of claim 25, wherein the combinator is configured to serve as a waveguide for the projected radiation. 如請求項25之光學設備,其中該稜鏡組合器包括平行於該等分束器層且經組態以接收透過該入射面進入之該輻射並反射該經接收輻射以便致使該輻射在該稜鏡組合器內傳播之一鏡。The optical device of claim 25, wherein the beam combiner includes parallel to the beam splitter layers and is configured to receive the radiation entering through the incident surface and reflect the received radiation so as to cause the radiation to be at the edge A mirror spreads within the mirror combiner. 如請求項1之光學設備,其中沿著該第一光學軸之該數值孔徑超過0.5。The optical device of claim 1, wherein the numerical aperture along the first optical axis exceeds 0.5. 如請求項28之光學設備,其中沿著該第一光學軸之該數值孔徑超過0.7。The optical device of claim 28, wherein the numerical aperture along the first optical axis exceeds 0.7. 一種用於檢驗之方法,其包括: 以一可控制空間分佈自一經擴展輻射源發射輻射; 使用遠心聚光光學器件以超過0.3之一數值孔徑接收並沿著一第一光學軸將該經發射輻射投影至一場上; 藉助物鏡光學器件沿著一第二光學軸將該場成像至一感測器;及 使用一稜鏡組合器組合該第一光學軸與該第二光學軸,該稜鏡組合器使該等光學軸中之至少一者在該稜鏡組合器內反射多次。A method for inspection, which includes: Emit radiation from an extended radiation source in a controllable spatial distribution; Use telecentric concentrating optics to receive and project the emitted radiation onto a field along a first optical axis with a numerical aperture exceeding 0.3; Imaging the field to a sensor along a second optical axis by means of objective optics; and The first optical axis and the second optical axis are combined by using an optical combiner, and the optical combiner causes at least one of the optical axes to be reflected multiple times in the optical combiner. 如請求項30之方法,其中投影該輻射包括將該輻射均勻地投影在具有超過2 mm之一對角線尺寸之該場之一區域內,其中具有跨越該區域變化不超過10%之一輻照度且具有在該區域中之所有點處跨越該數值孔徑變化不超過20%之一輻射強度。The method of claim 30, wherein projecting the radiation includes uniformly projecting the radiation in a region of the field having a diagonal size exceeding 2 mm, wherein a radiation having a variation of no more than 10% across the region Illumination and having a radiation intensity that does not vary more than 20% across the numerical aperture at all points in the area. 如請求項31之方法,其中該等聚光光學器件將該光學輻射投影於其內之該場之該區域之該對角線尺寸超過15 mm。The method of claim 31, wherein the diagonal dimension of the area of the field in which the concentrating optical devices project the optical radiation exceeds 15 mm. 如請求項30之方法,其中發射該輻射包括自一發射器陣列發射該輻射,且藉由選擇性地激勵該等發射器來控制該空間分佈。The method of claim 30, wherein emitting the radiation includes emitting the radiation from an array of emitters, and the spatial distribution is controlled by selectively exciting the emitters. 如請求項33之方法,其中該發射器陣列包括不同之各別波長之多個發射器,且其中選擇性地激勵該等發射器包括藉由選擇該等發射器來激勵而控制投影至該場上之該輻射之一光譜內容。The method of claim 33, wherein the emitter array includes a plurality of emitters of different respective wavelengths, and wherein selectively exciting the emitters includes controlling the projection to the field by selecting the emitters to excite One of the spectral content of the radiation above. 如請求項33之方法,其中該發射器陣列係一第一陣列,且其中該等聚光光學器件包括一第二均質化棒陣列,每一棒包括經定位以自該等發射器中之一或多者接收該經發射輻射之一入射面,及該輻射透過其發射之一出射面。The method of claim 33, wherein the emitter array is a first array, and wherein the light-concentrating optical devices include a second homogenizing rod array, and each rod includes one of the emitters positioned Or more receive an incident surface of the emitted radiation, and an exit surface through which the radiation is emitted. 如請求項35之方法,其中該等聚光光學器件包括: 一第三準直透鏡陣列,其中每一準直透鏡經組態以接收並準直自該等均質化棒中之一各別者發射之該輻射;及 一聚焦透鏡,其經定位以自該第三準直透鏡陣列接收該經準直輻射且將該輻射透射並聚焦至該場上。Such as the method of claim 35, wherein the concentrating optical devices include: A third collimating lens array, wherein each collimating lens is configured to receive and collimate the radiation emitted from each of the homogenizing rods; and A focusing lens positioned to receive the collimated radiation from the third collimating lens array and transmit and focus the radiation onto the field. 如請求項36之方法,其中該等準直透鏡包括夫瑞奈透鏡。The method of claim 36, wherein the collimating lenses include Freinel lenses. 如請求項36之方法,其中該聚焦透鏡包括一夫瑞奈透鏡。The method of claim 36, wherein the focusing lens includes a Freinel lens. 如請求項33之方法,其中每一均質化棒之該出射面包括一場透鏡及一漫射器中之至少一者。Such as the method of claim 33, wherein the exit surface of each homogenizing rod includes at least one of a field lens and a diffuser. 如請求項33之方法,其中選擇性地激勵該等發射器包括選擇投影至該場上之該輻射之一角度範圍。The method of claim 33, wherein selectively energizing the emitters includes selecting an angular range of the radiation projected onto the field. 如請求項40之方法,其中選擇該角度範圍包括自由一暗場及一亮場照明範圍組成之一角度範圍群組選擇該範圍。Such as the method of claim 40, wherein selecting the angle range includes selecting the range from an angle range group consisting of a dark field and a bright field illumination range. 如請求項30之方法,其中組合該第一光學軸與該第二光學軸包括在該稜鏡組合器內透射該第一光學軸及反射該第二光學軸兩次。The method according to claim 30, wherein combining the first optical axis and the second optical axis includes transmitting the first optical axis and reflecting the second optical axis twice in the combiner. 如請求項42之方法,其中該第二光學軸係藉由全內反射自毗鄰於該場之該稜鏡組合器之一表面反射。The method of claim 42, wherein the second optical axis is reflected from a surface of the combiner adjacent to the field by total internal reflection. 如請求項30之方法,其中該等聚光光學器件包括接近於該稜鏡組合器之具有一彎月形狀之一補償透鏡。The method of claim 30, wherein the condensing optical devices include a compensation lens having a meniscus shape close to the beam combiner. 如請求項30之方法,其中組合該等光學軸包括使該第一光學軸在該稜鏡組合器內反射多次以便均質化投影至該場上之該輻射。The method of claim 30, wherein combining the optical axes includes causing the first optical axis to be reflected multiple times in the beam combiner so as to homogenize the radiation projected onto the field. 如請求項45之方法,其中該第一光學軸係藉由全內反射自面向該成像總成之該稜鏡組合器之一表面反射。The method of claim 45, wherein the first optical axis is reflected from a surface of the combiner facing the imaging assembly by total internal reflection. 如請求項45之方法,其中該稜鏡組合器具有一矩形剖面且包括接近於該等聚光光學器件之一入射面及接近於該場之一出射面,且其中該等聚光光學器件經組態以將由該經擴展輻射源發射之該輻射聚焦至該入射面上。Such as the method of claim 45, wherein the combinator has a rectangular cross-section and includes an incident surface close to the condensing optical devices and an exit surface close to the field, and wherein the condensing optical devices are assembled State to focus the radiation emitted by the extended radiation source onto the incident surface. 如請求項47之方法,其中該經擴展輻射源包括一發射器陣列,且該等聚光光學器件經組態以將該等發射器中之每一者成像至該入射面上。The method of claim 47, wherein the expanded radiation source includes an array of emitters, and the concentrating optics are configured to image each of the emitters onto the incident surface. 如請求項48之方法,其中該等聚光光學器件包括一夫瑞奈聚焦透鏡。The method of claim 48, wherein the condensing optics include a Frenet focusing lens. 如請求項30之方法,其中發射該輻射包括應用一空間光調變器以控制該輻射之該空間分佈。The method of claim 30, wherein emitting the radiation includes applying a spatial light modulator to control the spatial distribution of the radiation. 如請求項50之方法,其中選擇性地控制該空間分佈包括選擇投影至該場上之該輻射之一角度範圍。The method of claim 50, wherein selectively controlling the spatial distribution includes selecting an angular range of the radiation projected onto the field. 如請求項50之方法,其中該空間光調變器包括一數位微鏡裝置。Such as the method of claim 50, wherein the spatial light modulator includes a digital micromirror device. 如請求項50之方法,其中該空間光調變器包括一液晶裝置。Such as the method of claim 50, wherein the spatial light modulator includes a liquid crystal device. 如請求項30之方法,其中該稜鏡組合器包括: 一入射面,其經定位以接收由該等聚光光學器件沿著該第一光學軸投影之該輻射; 一出射面,其接近於該場;及 多個分束器層,其在該稜鏡組合器內,其中該多個分束器層中之每一者經組態以在透射該第二光學軸時透過該出射面將該輻射之一各別部分反射至該場上。Such as the method of claim 30, wherein the combinator includes: An incident surface positioned to receive the radiation projected by the condensing optical devices along the first optical axis; An exit surface, which is close to the field; and A plurality of beam splitter layers within the beam combiner, wherein each of the plurality of beam splitter layers is configured to transmit one of the radiation through the exit surface when transmitting the second optical axis The individual parts reflect onto the field. 如請求項54之方法,其中該稜鏡組合器經組態以用作用於該經投影輻射之一波導。The method of claim 54, wherein the combinator is configured to act as a waveguide for the projected radiation. 如請求項54之方法,其中該稜鏡組合器包括平行於該等分束器層且經組態以接收透過該入射面進入之該輻射並反射該經接收輻射以便致使該輻射在該稜鏡組合器內傳播之一鏡。The method of claim 54, wherein the beam combiner includes parallel to the beam splitter layers and is configured to receive the radiation entering through the incident surface and reflect the received radiation so as to cause the radiation to be in the beam A mirror that spreads within the combiner. 如請求項30之方法,其中沿著該第一光學軸之該數值孔徑超過0.5。The method of claim 30, wherein the numerical aperture along the first optical axis exceeds 0.5. 如請求項57之方法,其中沿著該第一光學軸之該數值孔徑超過0.7。The method of claim 57, wherein the numerical aperture along the first optical axis exceeds 0.7.
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