TW202040833A - Method for transferring micro device - Google Patents

Method for transferring micro device Download PDF

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TW202040833A
TW202040833A TW108139323A TW108139323A TW202040833A TW 202040833 A TW202040833 A TW 202040833A TW 108139323 A TW108139323 A TW 108139323A TW 108139323 A TW108139323 A TW 108139323A TW 202040833 A TW202040833 A TW 202040833A
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micro
component
transfer head
force
receiving substrate
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TW108139323A
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TWI752369B (en
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陳立宜
簡芳基
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薩摩亞商美科米尚技術有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
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  • Micromachines (AREA)

Abstract

A method for transferring a micro device is provided. The method includes: preparing a carrier substrate with the micro device thereon, wherein an adhesive layer is between and in contact with the carrier substrate and the micro device; picking up the micro-device from the carrier substrate by a transfer head; forming a liquid layer on a receiving substrate; and placing the micro device over the receiving substrate by the transfer head such that the micro device is in contact with the liquid layer and is gripped by a capillary force; and moving the transfer head away from the receiving substrate such that the micro device is detached from the transfer head and is stuck to the receiving substrate.

Description

用於轉移微型元件的方法 Method for transferring micro components

本揭露是有關於一種用於將微型元件從載體基板轉移到接收基板的方法。 The present disclosure relates to a method for transferring micro components from a carrier substrate to a receiving substrate.

此處的陳述僅提供與本揭露有關的背景信息,而不必然地構成現有技術。 The statements here only provide background information related to the present disclosure, and do not necessarily constitute prior art.

用於轉移元件的傳統技術包括藉由晶圓黏合(wafer bonding)從轉移晶圓轉移到接收基板。一種這樣的實施方式是「直接黏合」,其涉及將元件陣列從轉移晶圓到接收基板的一個黏合步驟,接著移除轉移晶圓。另一種這樣的實施方式是「間接黏合」,其涉及兩個黏合/剝離步驟。在間接黏合中,轉移頭可以從供應基板拾取元件陣列,然後將元件陣列黏合到接收基板,然後移除轉移頭。 Traditional techniques for transferring components include transferring from a transfer wafer to a receiving substrate by wafer bonding. One such implementation is "direct bonding", which involves a bonding step of the element array from the transfer wafer to the receiving substrate, followed by removal of the transfer wafer. Another such embodiment is "indirect bonding", which involves two bonding/peeling steps. In indirect bonding, the transfer head can pick up the element array from the supply substrate, then bond the element array to the receiving substrate, and then remove the transfer head.

本揭露的一些實施例提出了一種用於轉移微型元件的方法。方法包含:準備載體基板,載體基板上具有微型元件,其中黏著層位於載體基板和微型元件之間並接觸載體基板和微型元件;藉由轉移頭從載體基板上拾取微型元件;在接收 基板上形成液體層;藉由轉移頭將微型元件放置在接收基板上,使得微型元件與液體層接觸並被毛細力夾持;以及將轉移頭移離接收基板,使得微型元件與轉移頭分離並黏附固定到接收基板。 Some embodiments of the present disclosure propose a method for transferring micro-components. The method includes: preparing a carrier substrate with micro components on the carrier substrate, wherein the adhesive layer is located between the carrier substrate and the micro components and contacts the carrier substrate and the micro components; picking up the micro components from the carrier substrate by a transfer head; A liquid layer is formed on the substrate; the micro component is placed on the receiving substrate by the transfer head, so that the micro component is in contact with the liquid layer and is clamped by capillary force; and the transfer head is moved away from the receiving substrate, so that the micro component is separated from the transfer head and Adhesively fixed to the receiving substrate.

為了讓本揭露的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 In order to make the above-mentioned features and advantages of the present disclosure more obvious and understandable, the following specific embodiments are described in detail in conjunction with the accompanying drawings.

100‧‧‧方法 100‧‧‧Method

110‧‧‧操作 110‧‧‧Operation

120‧‧‧操作 120‧‧‧Operation

130‧‧‧操作 130‧‧‧Operation

140‧‧‧操作 140‧‧‧Operation

150‧‧‧操作 150‧‧‧Operation

210‧‧‧載體基板 210‧‧‧Carrier substrate

220‧‧‧微型元件 220‧‧‧Micro components

230‧‧‧黏著層 230‧‧‧Adhesive layer

240‧‧‧轉移頭 240‧‧‧Transfer head

242‧‧‧夾持區域 242‧‧‧Clamping area

244‧‧‧凹洞 244‧‧‧Cave

250‧‧‧液體層 250‧‧‧Liquid layer

252‧‧‧彎月面 252‧‧‧ Meniscus

260‧‧‧接收基板 260‧‧‧Receiving board

262‧‧‧導電墊 262‧‧‧Conductive pad

當結合隨附圖式閱讀時,自以下詳細描述將最佳地理解本揭露之態樣。應注意,根據工業中之標準實務,各特徵未必依比例繪示。實際上,可出於論述清晰之目的而增減所說明的特徵之尺寸。 When read in conjunction with the accompanying drawings, the following detailed description will best understand the aspect of this disclosure. It should be noted that according to standard practice in the industry, each feature may not be drawn to scale. In fact, the dimensions of the described features can be increased or decreased for the purpose of clarity of the discussion.

圖1是在本揭露內容的一些具體實施例中用於將微型元件從載體基板轉移到接收基板的方法的流程圖; FIG. 1 is a flowchart of a method for transferring micro-components from a carrier substrate to a receiving substrate in some specific embodiments of the present disclosure;

圖2是在本揭露內容的一些具體實施例中用於轉移微型元件的方法的中間步驟的示意性剖視圖; 2 is a schematic cross-sectional view of an intermediate step of the method for transferring micro-components in some specific embodiments of the present disclosure;

圖3是在本揭露內容的一些具體實施例中用於轉移微型元件的方法的中間步驟的示意性剖視圖; 3 is a schematic cross-sectional view of an intermediate step of the method for transferring micro-components in some specific embodiments of the present disclosure;

圖4A是在本揭露內容的一些具體實施例中用於轉移微型元件的方法的中間步驟的示意性剖視圖; 4A is a schematic cross-sectional view of an intermediate step of the method for transferring micro-components in some specific embodiments of the present disclosure;

圖4B是在本揭露內容的一些具體實施例中用於轉移微型元件的方法的中間步驟的示意性剖視圖; 4B is a schematic cross-sectional view of an intermediate step of the method for transferring micro-components in some specific embodiments of the present disclosure;

圖5A是在本揭露內容的一些具體實施例中用於轉移微型元件的方法的中間步驟的示意性剖視圖; 5A is a schematic cross-sectional view of an intermediate step of a method for transferring micro-components in some specific embodiments of the present disclosure;

圖5B是在本揭露內容的一些具體實施例中用於轉移微型 元件的方法的中間步驟的示意性剖視圖; Fig. 5B is used to transfer the miniature in some specific embodiments of the disclosure A schematic cross-sectional view of an intermediate step of the method of the component;

圖6是在本揭露內容的一些具體實施例中用於轉移微型元件的方法的中間步驟的示意性剖視圖; 6 is a schematic cross-sectional view of an intermediate step of the method for transferring micro-components in some specific embodiments of the present disclosure;

圖7A是在本揭露內容的一些具體實施例中用於轉移微型元件的方法的中間步驟的示意性剖視圖;以及 FIG. 7A is a schematic cross-sectional view of an intermediate step of the method for transferring micro-components in some specific embodiments of the present disclosure; and

圖7B是在本揭露內容的一些具體實施例中用於轉移微型元件的方法的中間步驟的示意性剖視圖。 FIG. 7B is a schematic cross-sectional view of an intermediate step of the method for transferring micro-components in some specific embodiments of the present disclosure.

為更進一步闡述本揭露為達成預定發明目的所採取的技術手段及功效,以下結合附圖及較佳實施例,對依據本揭露提出的用於轉移微型元件的方法,其具體實施方式、結構、方法、步驟、特徵及其功效,詳細說明如後。 In order to further explain the technical means and effects of the present disclosure to achieve the intended purpose of the invention, in conjunction with the accompanying drawings and preferred embodiments, the method for transferring micro-components according to the present disclosure, its specific implementation, structure, The methods, steps, characteristics and effects are described in detail below.

有關本揭露的前述及其他技術內容、特點及功效,在以下配合參考附圖的較佳實施例的詳細說明中將可清楚呈現。通過具體實施方式的說明,當可對本揭露為達成預定目的所採取的技術手段及功效更加深入且具體的瞭解,然而所附附圖僅是提供參考與說明之用,並非用來對本揭露加以限制。 The aforementioned and other technical content, features and effects of the present disclosure will be clearly presented in the following detailed description of the preferred embodiment with reference to the accompanying drawings. Through the description of the specific implementation manners, it is possible to have a more in-depth and specific understanding of the technical means and effects adopted by the present disclosure to achieve the predetermined purpose. However, the attached drawings are only for reference and explanation, and are not used to limit the present disclosure. .

為簡化附圖,一些現有已知慣用的結構與元件在附圖中將以簡單示意的方式繪示。並且,除非有其它表示,在不同附圖中相同的元件符號可視為相對應的元件。這些附圖的繪示是為了清楚表達這些實施方式中各元件之間的連接關係,並非繪示各元件的實際尺寸。 In order to simplify the drawings, some conventionally known and conventional structures and elements are shown in the drawings in a simple schematic manner. In addition, unless otherwise indicated, the same component symbols in different drawings may be regarded as corresponding components. The drawing in these drawings is to clearly express the connection relationship between the elements in these embodiments, and does not illustrate the actual size of each element.

圖1是用於將微型元件從載體基板轉移到接收基板的方法的流程圖。圖2至圖7B是圖1的方法100的中間步驟的 示意性剖視圖。參考圖1至7B。方法100開始於操作110,其中準備載體基板210,載體基板210上具有微型元件220。黏著層230位於載體基板210和微型元件220之間並與載體基板210和微型元件220接觸(如圖2所示)。方法100繼續操作120,其中藉由轉移頭240從載體基板210拾取微型元件220(如圖3所示)。方法100繼續進行操作130和140,其中液體層250或圖案化液體層250形成在接收基板260上(如圖4A和4B所示),然後藉由轉移頭240將已經拾取的微型元件220放置在接收基板260上,使得微型元件220與液體層250接觸並被液體層250產生的毛細力夾持(如圖5A、5B、6所示)。方法100繼續進行操作150,其中轉移頭240移離接收基板260,使得微型元件220與轉移頭240分離並黏附固定到接收基板260上(如圖7A和圖7B所示)。 Fig. 1 is a flowchart of a method for transferring a micro-component from a carrier substrate to a receiving substrate. 2 to 7B are intermediate steps of the method 100 of FIG. 1 Schematic cross-sectional view. Refer to Figures 1 to 7B. The method 100 starts at operation 110, where a carrier substrate 210 is prepared, and the carrier substrate 210 has micro-components 220 thereon. The adhesive layer 230 is located between the carrier substrate 210 and the micro device 220 and is in contact with the carrier substrate 210 and the micro device 220 (as shown in FIG. 2). The method 100 continues to operation 120, where the micro-component 220 is picked up from the carrier substrate 210 by the transfer head 240 (as shown in FIG. 3). The method 100 continues with operations 130 and 140, in which the liquid layer 250 or the patterned liquid layer 250 is formed on the receiving substrate 260 (as shown in FIGS. 4A and 4B), and then the picked-up micro-component 220 is placed on the receiving substrate 260 by the transfer head 240 On the receiving substrate 260, the micro-elements 220 are in contact with the liquid layer 250 and clamped by the capillary force generated by the liquid layer 250 (as shown in FIGS. 5A, 5B, and 6). The method 100 continues with operation 150, in which the transfer head 240 is moved away from the receiving substrate 260, so that the micro-component 220 is separated from the transfer head 240 and adhered to the receiving substrate 260 (as shown in FIGS. 7A and 7B).

儘管在前一段和圖1中僅提到了「一」微型元件220,但是在實際應用中可以使用「多個」微型元件220並且仍然在本揭示內容的範圍內,如將在以下具體實施例中說明的。 Although only the "one" micro-elements 220 are mentioned in the previous paragraph and FIG. 1, in practical applications, "multiple" micro-elements 220 can be used and still fall within the scope of this disclosure, as will be described in the following specific embodiments Illustrative.

參考圖2。如上所述,黏著層230位於載體基板210和複數個微型元件220之間。特定而言,黏著層230與載體基板210和微型元件220接觸。在一些具體實施例中,黏著層230的形成,係藉由將具有黏著能力的材料塗覆到載體基板210上來執行。黏著層230可以通過旋塗機、狹縫塗佈機或其任何組合進行塗覆。在一些實施例中,黏著層230可以由具有黏著能力的有機材料製成,諸如環氧樹脂(epoxy)、聚甲基丙烯酸甲酯(polymethylmethacrylate,PMMA)、聚矽氧烷 (polysiloxanes)、矽樹脂(silicone)或其任何組合。此外,黏著層230可具有約1微米至約100微米的厚度。 Refer to Figure 2. As described above, the adhesive layer 230 is located between the carrier substrate 210 and the plurality of micro devices 220. In particular, the adhesive layer 230 is in contact with the carrier substrate 210 and the micro device 220. In some embodiments, the formation of the adhesive layer 230 is performed by coating a material with adhesive ability on the carrier substrate 210. The adhesive layer 230 may be coated by a spin coater, a slit coater, or any combination thereof. In some embodiments, the adhesion layer 230 may be made of an organic material with adhesion capabilities, such as epoxy, polymethylmethacrylate (PMMA), polysiloxane (polysiloxanes), silicone (silicone) or any combination thereof. In addition, the adhesion layer 230 may have a thickness of about 1 micrometer to about 100 micrometers.

黏著力F1是黏著層230對每個微型元件220的黏著力,並且具有值F11。在一些具體實施例中,黏著力F1是在減小之後黏著層230對每個微型元件220的黏著力,並且具有值F12。在一些實施例中,值F11(在沒有進行所述減小之下的黏著力F1的值)大於值F12。所述減小是減小黏著層230對每個微型元件220的原始黏著力,這可以在拾取一些微型元件220之前執行。在一些具體實施例中,可以藉由在黏著層230上加熱、冷卻、施加電場、電磁輻射、超聲波、機械力、壓力或其任何組合來執行減小,但是不應限於此。在一些具體實施例中,微型元件220之一的側向長度L小於或等於約50微米。所述側向長度在方向Y上測量。方向Y垂直於厚度方向Z,厚度方向Z垂直於載體基板210的平面延伸方向。例如,對於具有約10微米×10微米的表面積的一個微型元件220,所述減小的黏著力F1具有約50奈米牛頓(nN)的值F12。本揭示內容的具體實施例不限於此。依據實際應用可以執行對黏著層230的適當修改。黏著力F1可以包括凡得瓦力(Waals forces),但不應限於此。 The adhesive force F1 is the adhesive force of the adhesive layer 230 to each micro-component 220, and has a value of F11. In some specific embodiments, the adhesive force F1 is the adhesive force of the adhesive layer 230 to each micro element 220 after being reduced, and has a value of F12. In some embodiments, the value F11 (the value of the adhesion force F1 without the reduction) is greater than the value F12. The reduction is to reduce the original adhesive force of the adhesive layer 230 to each micro component 220, which can be performed before picking up some micro components 220. In some specific embodiments, the reduction may be performed by heating, cooling, applying an electric field, electromagnetic radiation, ultrasonic waves, mechanical force, pressure, or any combination thereof on the adhesive layer 230, but it should not be limited thereto. In some embodiments, the lateral length L of one of the micro-elements 220 is less than or equal to about 50 microns. The lateral length is measured in direction Y. The direction Y is perpendicular to the thickness direction Z, and the thickness direction Z is perpendicular to the plane extending direction of the carrier substrate 210. For example, for a micro-element 220 having a surface area of about 10 microns×10 microns, the reduced adhesion force F1 has a value F12 of about 50 nano-Newtons (nN). The specific embodiments of the present disclosure are not limited to this. Appropriate modifications to the adhesive layer 230 can be performed according to actual applications. The adhesion force F1 may include Waals forces, but should not be limited thereto.

在一些實施例中,載體基板210可以是剛性基板。剛性基板可以由玻璃、矽(silicon)、聚碳酸酯(polycarbonate,PC)、丙烯腈-丁二烯-苯乙烯(acrylonitrile butadiene styrene,ABS)或其任何組合製成。本揭示內容的具體實施例不限於此。可以執行取決於實際應用的對載體基板210的適當修改。 In some embodiments, the carrier substrate 210 may be a rigid substrate. The rigid substrate may be made of glass, silicon (silicon), polycarbonate (PC), acrylonitrile butadiene styrene (ABS), or any combination thereof. The specific embodiments of the present disclosure are not limited to this. Appropriate modifications to the carrier substrate 210 depending on actual applications can be performed.

在一些實施例中,微型元件220可以是發光結構,諸如具有對應於光譜中的特定區域的能隙的化合物半導體。例如,發光結構可以包括基於II-VI材料(例如ZnSe、ZnO)或III-V氮化物材料(例如GaN、AlN、InN、InGaN、GaP、AlInGaP、AlGaAs或其合金)的一個或多個層。在一些其他實施例中,微型元件220也可以是積體電路(IC)或微機電系統(MEMS)元件,並且不應限於此。 In some embodiments, the micro-component 220 may be a light emitting structure, such as a compound semiconductor having an energy gap corresponding to a specific region in the spectrum. For example, the light emitting structure may include one or more layers based on II-VI materials (such as ZnSe, ZnO) or III-V nitride materials (such as GaN, AlN, InN, InGaN, GaP, AlInGaP, AlGaAs or alloys thereof). In some other embodiments, the micro-component 220 may also be an integrated circuit (IC) or a micro-electromechanical system (MEMS) component, and should not be limited thereto.

參考圖3。如上所述,藉由轉移頭240從載體基板210拾取一些微型元件220。在一些實施例中,轉移頭240可以藉由例如真空、黏著、磁吸引、靜電吸引等,在每個微型元件220上施加拾取壓力或拾取力。在下文中將僅討論黏著力,但是上述其他類型的力仍然在本揭示內容的範圍內。在一些具體實施例中,轉移頭240可具有複數個夾持區域242,用於拾取和放置微型元件220。在夾持區域242中還可以存在凹洞244,凹洞244被配置為容納不欲拾取和/或放置的物件的位置。此外,當執行將微型元件220放置在接收基板260上時,原本在接收基板260上的物體將不會受到干擾。在夾持區域242中還可以存在凹洞244。轉移頭240的夾持區域242可以由具有黏著能力的材料製成,或者轉移頭240可以在其上具有圖案化的黏著層,使得當轉移頭240與微型元件220接觸時,可以由黏著力F2拾取每個微型元件220。在一些實施例中,對於具有約10微米×10微米的表面積的一個微型元件220,用於一個微型元件220的所述黏著力F2為約100nN至1000nN。黏著力F2可以包括凡得瓦力,但不應限於此。 Refer to Figure 3. As described above, some micro-elements 220 are picked up from the carrier substrate 210 by the transfer head 240. In some embodiments, the transfer head 240 may apply picking pressure or picking force on each micro-component 220 by, for example, vacuum, adhesion, magnetic attraction, electrostatic attraction, etc. In the following, only adhesive force will be discussed, but the other types of force described above are still within the scope of the present disclosure. In some specific embodiments, the transfer head 240 may have a plurality of clamping areas 242 for picking and placing the micro components 220. There may also be a cavity 244 in the clamping area 242, and the cavity 244 is configured to accommodate a position of an object not to be picked up and/or placed. In addition, when the micro-component 220 is placed on the receiving substrate 260, objects originally on the receiving substrate 260 will not be disturbed. There may also be a cavity 244 in the clamping area 242. The clamping area 242 of the transfer head 240 may be made of a material with adhesive ability, or the transfer head 240 may have a patterned adhesive layer thereon, so that when the transfer head 240 contacts the micro-component 220, the adhesive force F2 Pick up each micro component 220. In some embodiments, for a micro-component 220 having a surface area of about 10 μm×10 μm, the adhesion force F2 for one micro-component 220 is about 100 nN to 1000 nN. The adhesion force F2 may include Van der Waals force, but should not be limited to this.

如上所述,在一些具體實施例中,可以在拾取之 前減小具有值F11的原始黏著力F1以形成具有值F12的黏著力F1,使得黏著力F2和黏著力F1之間的差異被增加,以便於促進拾取微型元件220的性能。 As mentioned above, in some specific embodiments, you can The original adhesion force F1 having the value F11 is previously reduced to form the adhesion force F1 having the value F12, so that the difference between the adhesion force F2 and the adhesion force F1 is increased, so as to promote the performance of picking up the micro-component 220.

參考圖4A和4B。如上所述,液體層250形成在接收基板260上。液體層250可以形成為接收基板260上的一層,如圖4A所示,或者圖案化為接收基板260上的離散部分,如圖4B所示。在圖4B中,圖案化的液體層250可以是將微型元件220放置在其上的位置。接收基板260可以是顯示基板、發光基板、具有諸如電晶體或積體電路的功能元件的基板、或具有金屬重分佈線的基板,但不限於此。在一些具體實施例中,可以藉由在包括蒸氣的環境中降低接收基板260的溫度來形成液體層250,使得至少一部分蒸氣凝結以在接收基板260上形成液體層250。特定而言,液體層250或圖案化液體層250可以被形成在接收基板260的導電墊262上,但是不應限於此。在一些具體實施例中,每個導電墊262的面積小於或等於約1平方毫米。在一些具體實施例中,接收基板260的溫度降低至大約露點,使得環境中的水蒸氣凝結以形成用作液體層250的液態水。此外,液體層250的形成也可以通過噴灑蒸氣、噴墨印刷、輥塗、浸塗等來實現。 Refer to Figures 4A and 4B. As described above, the liquid layer 250 is formed on the receiving substrate 260. The liquid layer 250 may be formed as a layer on the receiving substrate 260, as shown in FIG. 4A, or patterned to receive discrete parts on the substrate 260, as shown in FIG. 4B. In FIG. 4B, the patterned liquid layer 250 may be the location on which the micro-component 220 is placed. The receiving substrate 260 may be a display substrate, a light emitting substrate, a substrate having functional elements such as a transistor or an integrated circuit, or a substrate having metal redistribution lines, but is not limited thereto. In some embodiments, the liquid layer 250 may be formed by lowering the temperature of the receiving substrate 260 in an environment that includes vapor, so that at least a portion of the vapor is condensed to form the liquid layer 250 on the receiving substrate 260. In particular, the liquid layer 250 or the patterned liquid layer 250 may be formed on the conductive pad 262 of the receiving substrate 260, but should not be limited thereto. In some embodiments, the area of each conductive pad 262 is less than or equal to about 1 square millimeter. In some specific embodiments, the temperature of the receiving substrate 260 is reduced to approximately the dew point, so that water vapor in the environment condenses to form liquid water used as the liquid layer 250. In addition, the formation of the liquid layer 250 can also be achieved by spraying steam, inkjet printing, roll coating, dip coating, or the like.

參考圖5A、5B和6。如上所述,已經拾取的微型元件220藉由轉移頭240放置在接收基板260上,使得每個微型元件220與液體層250接觸並由毛細力F31夾持。特定而言,微型元件220接近導電墊262放置,使得液體層250可以夾持微型元件220。如圖6所示的液體層250的彎月面252由毛細力F31引起。微型元件220被微型元件220和導電墊262之間的液體層 250產生的毛細力F31夾持。在一些具體實施例中,當微型元件220被毛細力F31夾持時,液體層250的厚度小於微型元件220的厚度。注意到,可以交換操作130和操作140的順序。也就是說,微型元件220可以放置在導電墊262上並與導電墊262接觸,然後液體層250形成在接收基板260上。 Refer to Figures 5A, 5B and 6. As described above, the micro components 220 that have been picked up are placed on the receiving substrate 260 by the transfer head 240 so that each micro component 220 is in contact with the liquid layer 250 and is clamped by the capillary force F31. Specifically, the micro element 220 is placed close to the conductive pad 262 so that the liquid layer 250 can clamp the micro element 220. The meniscus 252 of the liquid layer 250 as shown in FIG. 6 is caused by the capillary force F31. The micro component 220 is covered by the liquid layer between the micro component 220 and the conductive pad 262 The capillary force F31 generated by 250 clamps. In some specific embodiments, when the micro component 220 is clamped by the capillary force F31, the thickness of the liquid layer 250 is less than the thickness of the micro component 220. Note that the order of operation 130 and operation 140 may be exchanged. That is, the micro-component 220 may be placed on and in contact with the conductive pad 262, and then the liquid layer 250 is formed on the receiving substrate 260.

參考圖7A和7B。如上所述,在微型元件220被毛細力F31夾持之後,微型元件220與轉移頭240分離。在一些具體實施例中,微型元件220藉由黏著力F1黏著到黏著層230,黏著力F1具有如上所述的值F11或值F12。一些微型元件220藉由黏著力F2黏附到轉移頭240,並且毛細力F31大於黏著力F2,使得在所述放置之後,當轉移頭240移離接收基板260時微型元件220從轉移頭240分離並黏附固定到接收基板260,如圖7A所示。 Refer to Figures 7A and 7B. As described above, after the micro component 220 is clamped by the capillary force F31, the micro component 220 is separated from the transfer head 240. In some embodiments, the micro-component 220 is adhered to the adhesive layer 230 by the adhesive force F1, and the adhesive force F1 has the value F11 or the value F12 as described above. Some micro-components 220 are adhered to the transfer head 240 by the adhesion force F2, and the capillary force F31 is greater than the adhesion force F2, so that after the placement, when the transfer head 240 is moved away from the receiving substrate 260, the micro-elements 220 are separated from the transfer head 240 and It is adhered and fixed to the receiving substrate 260, as shown in FIG. 7A.

在一些具體實施例中,方法100還包括蒸發液體層250,使得微型元件220中的至少一個被貼附到導電墊262中的一個,並且與所述導電墊262電性接觸。液體層250的蒸發可以通過例如升高接收基板260或導電墊262的溫度來實現。微型元件220可以分別具有電極於其上,用於電性接觸導電墊262。在一些具體實施例中,在液體層250蒸發之前,轉移頭240移離接收基板260。在這種情況下,用於克服黏著力F2的力F3是如上所述的毛細力F31,並且毛細力F31大於黏著力F2。在一些具體實施例中,在液體層250蒸發之後,轉移頭240移離接收基板260。在這種情況下,用於克服黏著力F2的力F3是在所述蒸發之後一個微型元件220與一個導電墊262之間產生的黏附固定力F32,並且黏附固定力F32大於黏著力F2。 In some specific embodiments, the method 100 further includes evaporating the liquid layer 250 so that at least one of the micro-elements 220 is attached to one of the conductive pads 262 and is in electrical contact with the conductive pad 262. The evaporation of the liquid layer 250 can be achieved by, for example, increasing the temperature of the receiving substrate 260 or the conductive pad 262. The micro-elements 220 may respectively have electrodes on them for electrically contacting the conductive pads 262. In some embodiments, the transfer head 240 is moved away from the receiving substrate 260 before the liquid layer 250 is evaporated. In this case, the force F3 for overcoming the adhesive force F2 is the capillary force F31 as described above, and the capillary force F31 is greater than the adhesive force F2. In some embodiments, after the liquid layer 250 is evaporated, the transfer head 240 is moved away from the receiving substrate 260. In this case, the force F3 for overcoming the adhesion force F2 is the adhesion fixing force F32 generated between a micro-component 220 and a conductive pad 262 after the evaporation, and the adhesion fixing force F32 is greater than the adhesion force F2.

在一些實施例中,方法100還包括,在轉移頭240移離接收基板260之前降低接收基板260或導電墊262的溫度,使得液體層250被冷凍。當液體層250被冷凍時,由冷凍液體層250產生的另一個抓持力F33被施加到微型元件220。一般而言,抓持力F33大於黏著力F2。 In some embodiments, the method 100 further includes reducing the temperature of the receiving substrate 260 or the conductive pad 262 before the transfer head 240 is moved away from the receiving substrate 260, so that the liquid layer 250 is frozen. When the liquid layer 250 is frozen, another gripping force F33 generated by the frozen liquid layer 250 is applied to the micro element 220. Generally speaking, the gripping force F33 is greater than the adhesion force F2.

在一些實施例中,在轉移頭240移離接收基板260之前,轉移頭240、微型元件220、液體層250和接收基板260的組合被加熱,經由微型元件220和接收基板260之間的黏合力F34在微型元件220和接收基板260之間形成黏合。黏合力F34大於黏著力F2。 In some embodiments, before the transfer head 240 is moved away from the receiving substrate 260, the combination of the transfer head 240, the micro-component 220, the liquid layer 250, and the receiving substrate 260 is heated through the adhesion between the micro-component 220 and the receiving substrate 260 F34 forms a bond between the micro-component 220 and the receiving substrate 260. The adhesion force F34 is greater than the adhesion force F2.

簡而言之,力F3包括以下力之一:(1)由微型元件220和導電墊262之間的液體層250產生的毛細力F31;(2)微型元件220和導電墊262之間的黏附固定力F32,其中(1)和(2)之間的差異取決於液體層250是否被蒸發;(3)由冷凍液體層250產生的抓持力F33;以及(4)加熱後微型元件220和接收基板260之間的黏合力F34。 In short, the force F3 includes one of the following forces: (1) the capillary force F31 generated by the liquid layer 250 between the micro component 220 and the conductive pad 262; (2) the adhesion between the micro component 220 and the conductive pad 262 Fixing force F32, where the difference between (1) and (2) depends on whether the liquid layer 250 is evaporated; (3) the holding force F33 generated by the frozen liquid layer 250; and (4) the micro-elements 220 and The adhesion force F34 between the substrates 260 is received.

在一些具體實施例中,微型元件220的側向長度可小於或等於50微米。對側向長度的限制是為了確保上述具體實施例的可行性,因為一些力(諸如由液體層250引起的毛細力F31、在蒸發其間液體層250後由微型元件220和導電墊262之間的界面引起的黏附固定力F32、以及由冷凍液體層250引起的抓持力F33)可以根據微型元件220的側向長度而大大改變。應注意,當微型元件220的尺寸(例如側向長度)逐漸縮小時,毛細力F31、黏附固定力F32和抓持力F33對微型元件220的影響將逐漸取得支配(相較於施加到微型元件220的其 他力)。此外,如果微型元件220的側向長度太大,則需要考慮重力,這對於實現本揭示內容中揭示的一些具體實施例而言是不被期望的。在上述具體實施例中,由於微型元件220的尺寸效應(亦即較小的側向長度),毛細力F31、黏附固定力F32和抓持力F33中的至少一個大於黏著力F2。 In some specific embodiments, the lateral length of the micro-elements 220 may be less than or equal to 50 microns. The limitation on the lateral length is to ensure the feasibility of the above specific embodiment, because some forces (such as the capillary force F31 caused by the liquid layer 250, after evaporating the liquid layer 250 between the micro-component 220 and the conductive pad 262 The adhesion and fixing force F32 caused by the interface and the gripping force F33 caused by the frozen liquid layer 250 can be greatly changed according to the lateral length of the micro-component 220. It should be noted that when the size (for example, lateral length) of the micro-component 220 is gradually reduced, the capillary force F31, the adhesion fixing force F32, and the holding force F33 will gradually gain control over the influence of the micro-component 220 (compared to the effect applied to the micro-component 220 other He power). In addition, if the lateral length of the micro-component 220 is too large, gravity needs to be considered, which is undesirable for implementing some specific embodiments disclosed in this disclosure. In the above specific embodiment, due to the size effect of the micro-component 220 (that is, the smaller lateral length), at least one of the capillary force F31, the adhesion fixing force F32, and the gripping force F33 is greater than the adhesion force F2.

更特定而言,施加到具有在這些具體實施例中提到的範圍內的側向長度的微型元件220的力將遵循以下不等式: More specifically, the force applied to the micro-component 220 having a lateral length within the range mentioned in these specific embodiments will follow the following inequality:

F11<F2<F31.........................................................(1) F11<F2<F31............................................. ............(1)

F11<F2<F32.........................................................(2) F11<F2<F32............................................. ............(2)

F11<F2<F33.........................................................(3) F11<F2<F33............................................. ............(3)

F11<F2<F34.........................................................(4) F11<F2<F34............................................. ............(4)

F12<F2<F31.........................................................(5) F12<F2<F31............................................. ............(5)

F12<F2<F32.........................................................(6) F12<F2<F32............................................. ............(6)

F12<F2<F33.........................................................(7) F12<F2<F33............................................. ............(7)

F12<F2<F34.........................................................(8) F12<F2<F34............................................. ............(8)

其中不等式(1)至(8)的左側:F11<F2和F12<F2可以藉由選擇用於黏著層230的材料的合適組合和與微型元件220接觸的抓持區域242的表面來滿足。 The left side of inequalities (1) to (8): F11<F2 and F12<F2 can be satisfied by selecting a suitable combination of materials for the adhesive layer 230 and the surface of the grip area 242 in contact with the micro-component 220.

表1列出了迄今為止提到的各種力: Table 1 lists the various forces mentioned so far:

Figure 108139323-A0101-12-0010-1
Figure 108139323-A0101-12-0010-1

Figure 108139323-A0101-12-0011-2
Figure 108139323-A0101-12-0011-2

通常,當微型元件220的側向長度改變時,每單位面積的黏著力F1(包括值F11和值F12)和每單位面積的黏著力F2不改變。在一些具體實施例中,在轉移頭240與微型元件220接觸之後,可以藉由使轉移頭240向上移離載體基板210的速度來額外地修改黏著力F2。速度越快,黏著力F2越大。如此,可以用黏著型轉移頭240實現上述轉移製程。可以省略由靜電力、真空力、機械力或其任何組合操作的轉移頭的複雜電路設計或機械設計。黏著型轉移頭240能夠完成轉移製程,並且降低了製程的成本。 Generally, when the lateral length of the micro-component 220 changes, the adhesion force F1 per unit area (including the values F11 and F12) and the adhesion force F2 per unit area do not change. In some embodiments, after the transfer head 240 contacts the micro-component 220, the speed at which the transfer head 240 moves upward and away from the carrier substrate 210 can be used to additionally modify the adhesion force F2. The faster the speed, the greater the adhesion force F2. In this way, the adhesive transfer head 240 can be used to implement the above transfer process. The complicated circuit design or mechanical design of the transfer head operated by electrostatic force, vacuum force, mechanical force or any combination thereof can be omitted. The adhesive transfer head 240 can complete the transfer process and reduce the cost of the process.

在由圖1至圖7B支持的上述具體實施例中,在一些微型元件220放置在接收基板260上之後,微型元件220被微型元件220和導電墊262之間的液體層250產生的毛細力 F31、在該蒸發之後微型元件220和導電墊262之間產生的黏附固定力F32、由冷凍液體層250產生的抓持力F33、和/或在轉移頭、微型元件、液體層和接收基板的組合被加熱以在微型元件220與接收基板260之間形成黏合的黏合力F34夾持,且隨後微型元件220被從轉移頭240分離且被轉移到接收基板260。如此,沒有複雜電路設計的黏著型轉移頭240能夠由於液體層250的存在而完成轉移製程,並且降低了製程成本。 In the above-mentioned specific embodiment supported by FIGS. 1 to 7B, after some micro-elements 220 are placed on the receiving substrate 260, the micro-elements 220 are capillary force generated by the liquid layer 250 between the micro-elements 220 and the conductive pad 262 F31. After the evaporation, the adhesion and fixing force F32 generated between the micro-component 220 and the conductive pad 262, the gripping force F33 generated by the frozen liquid layer 250, and/or the transfer head, the micro-component, the liquid layer and the receiving substrate The combination is heated to form an adhesive force F34 clamping between the micro-component 220 and the receiving substrate 260, and then the micro-component 220 is separated from the transfer head 240 and transferred to the receiving substrate 260. In this way, the adhesive transfer head 240 without complicated circuit design can complete the transfer process due to the presence of the liquid layer 250, and reduce the process cost.

總之,提供了一種藉由黏著型轉移頭將微型元件從載體基板轉移到接收基板的方法。因此,藉由簡單的轉移機制簡化了轉移製程。 In short, a method for transferring micro-components from a carrier substrate to a receiving substrate by means of an adhesive transfer head is provided. Therefore, the transfer process is simplified by a simple transfer mechanism.

以上所述,僅是本揭露的較佳實施例而已,並非對本揭露作任何形式上的限制,雖然本揭露已以較佳實施例公開如上,然而並非用以限定本揭露,任何熟悉本專業的技術人員,在不脫離本揭露技術方案範圍內,當可利用上述發明的技術內容作出些許更動或修飾為等同變化的等效實施例,但凡是未脫離本揭露技術方案的內容,依據本揭露的技術實質對以上實施例所作的任何簡單修改、等同變化與修飾,均仍屬於本揭露技術方案的範圍內。 The above are only the preferred embodiments of the present disclosure, and do not limit the disclosure in any form. Although the present disclosure has been disclosed in the preferred embodiments as above, it is not intended to limit the disclosure. Anyone familiar with the profession Those skilled in the art, without departing from the scope of the technical solution of the present disclosure, can use the technical content of the above invention to make slight changes or modification into equivalent embodiments with equivalent changes, provided that the content of the technical solution of the present disclosure is not deviated from the content of the technical solution of the present disclosure, according to this disclosure Any simple modifications, equivalent changes and modifications made to the above embodiments by technical essence still fall within the scope of the technical solutions of the present disclosure.

100‧‧‧方法 100‧‧‧Method

110‧‧‧操作 110‧‧‧Operation

120‧‧‧操作 120‧‧‧Operation

130‧‧‧操作 130‧‧‧Operation

140‧‧‧操作 140‧‧‧Operation

150‧‧‧操作 150‧‧‧Operation

Claims (11)

一種轉移微型元件的方法,包括: A method of transferring micro-components includes: 準備一載體基板,該載體基板上具有該微型元件,其中一黏著層位於該載體基板和該微型元件之間並接觸該載體基板和該微型元件; Preparing a carrier substrate with the micro component on the carrier substrate, wherein an adhesive layer is located between the carrier substrate and the micro component and contacts the carrier substrate and the micro component; 藉由一轉移頭從該載體基板上拾取該微型元件; Picking up the micro component from the carrier substrate by a transfer head; 在一接收基板上形成一液體層; Forming a liquid layer on a receiving substrate; 藉由該轉移頭將該微型元件放置在該接收基板上,使得該微型元件與該液體層接觸並被一毛細力夾持;以及 Placing the micro-component on the receiving substrate by the transfer head so that the micro-component is in contact with the liquid layer and is clamped by a capillary force; and 將該轉移頭移離該接收基板,使得該微型元件與該轉移頭分離並黏附固定到該接收基板。 The transfer head is moved away from the receiving substrate, so that the micro-element is separated from the transfer head and adhered and fixed to the receiving substrate. 如請求項1所述的方法,其中該微型元件藉由一第一黏著力黏著到該黏著層,該微型元件藉由一第二黏著力黏附到該轉移頭,並且該毛細力大於該第一黏著力和該第二黏著力,使得在執行該放置時該微型元件與該轉移頭分離並且黏附固定到該接收基板。 The method of claim 1, wherein the micro-component is adhered to the adhesive layer by a first adhesive force, the micro-component is adhered to the transfer head by a second adhesive force, and the capillary force is greater than the first The adhesive force and the second adhesive force enable the micro-component to be separated from the transfer head and adhered and fixed to the receiving substrate when the placement is performed. 如請求項2所述之方法,其中該第一黏著力和該第二黏著力包括凡得瓦力。 The method according to claim 2, wherein the first adhesive force and the second adhesive force include Van der Waals force. 如請求項2所述之方法,其中該第二黏著力大於該第一黏著力。 The method according to claim 2, wherein the second adhesive force is greater than the first adhesive force. 如請求項1所述之方法,其中該微型元件的側向長度小於或等於約50微米。 The method according to claim 1, wherein the lateral length of the micro device is less than or equal to about 50 microns. 如請求項1所述之方法,其中該方法進一步包含: The method according to claim 1, wherein the method further comprises: 在該微型元件與該轉移頭分離之前蒸發該液體層,使得該微型元件貼附到該接收基板的一導電墊並且與該導電墊電性接觸,其中將該微型元件黏附到該導電墊的力是在該蒸發之後所產生的黏附固定力。 The liquid layer is evaporated before the micro component is separated from the transfer head, so that the micro component is attached to a conductive pad of the receiving substrate and electrically contacts the conductive pad, wherein the force of the micro component to the conductive pad It is the adhesion and fixation force generated after this evaporation. 如請求項6所述之方法,其中該微型元件包含在其上的一電極,並且該微型元件經由該電極與該導電墊貼附並與該導電墊電性接觸。 The method according to claim 6, wherein the micro-device includes an electrode thereon, and the micro-device is attached to the conductive pad via the electrode and electrically contacts the conductive pad. 如請求項6所述之方法,其中該微型元件藉由一第一黏著力黏著到該黏著層,該微型元件藉由一第二黏著力黏附到該轉移頭,並且該黏附固定力大於該第一黏著力和該第二黏著力,使得在執行該放置時該微型元件與該轉移頭分離並且黏附固定到該接收基板。 The method of claim 6, wherein the micro-component is adhered to the adhesive layer by a first adhesive force, the micro-component is adhered to the transfer head by a second adhesive force, and the adhesion fixing force is greater than the first adhesive force An adhesive force and the second adhesive force enable the micro component to be separated from the transfer head and adhered and fixed to the receiving substrate when the placement is performed. 如請求項6所述之方法,其中該導電墊的一面積小於或等於約1平方毫米。 The method according to claim 6, wherein an area of the conductive pad is less than or equal to about 1 square millimeter. 如請求項1所述之方法,其中該方法進一 步包含: The method according to claim 1, wherein the method further The steps include: 在將該轉移頭移離該接收基板之前降低該接收基板的溫度,使得該液體層被冷凍。 The temperature of the receiving substrate is lowered before the transfer head is moved away from the receiving substrate, so that the liquid layer is frozen. 如請求項1所述之方法,其中該方法進一步包含: The method according to claim 1, wherein the method further comprises: 在該轉移頭移離該接收基板之前加熱該轉移頭、該微型元件、該液體層和該接收基板的一組合,以藉由該微型元件和該接收基板之間的一黏合力在該微型元件和該接收基板之間形成黏合。 Before the transfer head is moved away from the receiving substrate, a combination of the transfer head, the micro component, the liquid layer, and the receiving substrate is heated, so that a bonding force between the micro component and the receiving substrate is applied to the micro component A bond is formed with the receiving substrate.
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