TW202036198A - Temperature control device, temperature control method, and inspection apparatus - Google Patents

Temperature control device, temperature control method, and inspection apparatus Download PDF

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TW202036198A
TW202036198A TW108142080A TW108142080A TW202036198A TW 202036198 A TW202036198 A TW 202036198A TW 108142080 A TW108142080 A TW 108142080A TW 108142080 A TW108142080 A TW 108142080A TW 202036198 A TW202036198 A TW 202036198A
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cooling
temperature control
temperature
sliding mode
controller
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TW108142080A
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TWI840451B (en
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小林將人
河西繁
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日商東京威力科創股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2855Environmental, reliability or burn-in testing
    • G01R31/2872Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation
    • G01R31/2874Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67248Temperature monitoring
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements

Abstract

A temperature control device for controlling a temperature of an object, the temperature control device includes a heater having a heating source configured to heat the object, a cooler having a cooling source configured to cool the object; and a temperature controller configured to control the heating source and the cooling source. The temperature controller includes a sliding mode controller configured to supply power to the heating source as an operation amount, a cooling mode controller configured to supply power to the cooling source as an operation amount, and a switching controller configured to determine whether an output of the sliding mode controller will be output to the heating source as a first operation amount, or an output of the cooling mode controller will be used as a second operation amount, based on a nonlinear term value of the output of the sliding mode controller.

Description

溫度控制裝置、溫度控制方法以及檢查裝置 Temperature control device, temperature control method and inspection device

本揭露係關於一種溫度控制裝置、溫度控制方法以及檢查裝置。 This disclosure relates to a temperature control device, a temperature control method, and an inspection device.

半導體製造程序中,係將具有既定電路圖案之大量電子元件形成在半導體晶圓(以下僅記為晶圓)上。所形成之電子元件會進行電氣特性等的檢查,而區別出良品與不良品。電子元件之檢查係例如在將各電子元件分割前的晶圓狀態下,使用檢查裝置來加以進行。 In the semiconductor manufacturing process, a large number of electronic components with a predetermined circuit pattern are formed on a semiconductor wafer (hereinafter only referred to as wafer). The formed electronic components will be inspected for electrical characteristics, etc., to distinguish good products from defective products. The inspection of electronic components is performed, for example, using an inspection device in a wafer state before each electronic component is divided.

電子元件之檢查裝置係具備:具有多數針狀之探針的探針卡;載置晶圓之載置台;以及測試台(參照專利文獻1)。此檢查裝置係讓探針卡之各探針接觸於會對應於電子元件之電極來設置的電極接點或銲錫凸塊,而使來自電子元件之訊號朝測試台傳遞,以檢查電子元件之電氣特性。又,專利文獻1之檢查裝置在檢查電子元件之電氣特性時,為了再現該電子元件之實際裝設環境,係具有藉由載置台內之冷媒流道或加熱器來控制載置台溫度之溫度控制裝置。 The electronic component inspection device is equipped with: a probe card with a large number of needle-shaped probes; a mounting table on which a wafer is placed; and a test table (refer to Patent Document 1). This inspection device allows the probes of the probe card to contact the electrode contacts or solder bumps that are set corresponding to the electrodes of the electronic components, so that the signals from the electronic components are transmitted to the test bench to inspect the electrical of the electronic components characteristic. In addition, when inspecting the electrical characteristics of electronic components, the inspection device of Patent Document 1 has a temperature control that controls the temperature of the mounting table by means of a refrigerant flow channel or a heater in the mounting table in order to reproduce the actual installation environment of the electronic component. Device.

又,專利文獻2記載有使用冷卻水與熱電轉換模組,並以滑動模式(sliding mode)控制來進行晶圓之溫度控制。 In addition, Patent Document 2 describes the use of cooling water and a thermoelectric conversion module, and a sliding mode control to perform temperature control of the wafer.

[先前技術文獻] [Prior Technical Literature]

[專利文獻] [Patent Literature]

專利文獻1:日本特開平10-135315號公報 Patent Document 1: Japanese Patent Application Laid-Open No. 10-135315

專利文獻2:日本特開2002-318602號公報 Patent Document 2: Japanese Patent Application Publication No. 2002-318602

本揭露係提供一種即便產生干擾,仍可以良好的控制性來控制溫度控制對象之溫度的溫度控制裝置、溫度控制方法以及檢查裝置。 The present disclosure provides a temperature control device, a temperature control method, and an inspection device that can control the temperature of a temperature control object with good controllability even if interference occurs.

本揭露一態樣相關之溫度控制裝置係進行溫度控制對象物之溫度控制的溫度控制裝置;具備:加熱機構,係具有會加熱該溫度控制對象物之加熱源;冷卻機構,係具有會冷卻該溫度控制對象物之冷卻源;以及溫度控制器,係控制該加熱源與該冷卻源;該溫度控制器係以該溫度控制對象物之溫度測量值為控制對象,並具有:滑動模式(sliding mode)控制器,係將朝該加熱源投入之功率作為操作量;冷卻模式控制器,係將朝該冷卻源投入之功率作為操作量;以及切換控制器,係在為該滑動模式控制器之輸出的線性項與非線性項中,藉由該非線性項之數值來決定是否直接將該滑動模式控制器之輸出作為第1操作量而輸出至該加熱源,或是不使用該滑動模式控制器之輸出,而將該冷卻模式控制器之輸出作為第2操作量來加以使用。 The temperature control device related to one aspect of the present disclosure is a temperature control device that performs temperature control of the temperature control object; it has a heating mechanism that has a heating source that can heat the temperature control object; a cooling mechanism that can cool the object The cooling source of the temperature control object; and the temperature controller, which controls the heating source and the cooling source; the temperature controller takes the temperature measurement of the temperature control object as the control object, and has: a sliding mode ) The controller uses the power input to the heating source as the operating variable; the cooling mode controller uses the power input to the cooling source as the operating variable; and the switching controller is the output of the sliding mode controller In the linear and nonlinear terms, the value of the nonlinear term is used to determine whether to directly output the output of the sliding mode controller as the first operating variable to the heating source, or not to use the sliding mode controller Output, and use the output of the cooling mode controller as the second operation amount.

本揭露另一態樣相關之溫度控制裝置係進行溫度控制對象物之溫度控制的溫度控制裝置;具備:加熱機構,係具有會加熱該溫度控制對象物之加熱源;冷卻機構,係具有會冷卻該溫度控制對象物之冷卻源;以及溫度控制器,係控制該加熱源與該冷卻源;該溫度控制器係以該溫度控制對象物之溫度測量值為控制對象,並具有:滑動模式(sliding mode)控制器,係將朝該加熱源投入之功率作為操作量;冷卻模式控制器,係將朝該冷卻源投入之功率作為操作量;以及切換控制器,係在為該滑動模式控制器之輸出的線性項與非線性項中,藉由該非線性項之數值來決定是否直接將該滑動模式控制器之輸出作為第1操 作量而輸出至該加熱源,或是將該滑動模式控制器之輸出與該冷卻模式控制器之輸出相加者作為第2操作量來加以使用。 The temperature control device related to another aspect of the present disclosure is a temperature control device that performs temperature control of the temperature control object; it has a heating mechanism that has a heating source that can heat the temperature control object; a cooling mechanism that can cool The cooling source of the temperature control object; and a temperature controller that controls the heating source and the cooling source; the temperature controller takes the temperature measurement of the temperature control object as the control object, and has: a sliding mode (sliding mode) mode) controller, which regards the power input to the heating source as the operating quantity; the cooling mode controller, which regards the power input to the cooling source as the operating quantity; and the switching controller, which is the sliding mode controller In the output linear term and nonlinear term, the value of the nonlinear term is used to determine whether to directly use the output of the sliding mode controller as the first operation The output to the heating source or the addition of the output of the sliding mode controller and the output of the cooling mode controller is used as the second operation amount.

根據本揭露,便可提供一種即便產生干擾,仍可以良好的控制性來控制溫度控制對象之溫度的溫度控制裝置、溫度控制方法以及檢查裝置。 According to the present disclosure, it is possible to provide a temperature control device, a temperature control method, and an inspection device that can control the temperature of the temperature control object with good controllability even if interference occurs.

1:檢查裝置 1: Inspection device

2:檢查部 2: Inspection Department

3:裝載部 3: Loading department

4:測試台 4: Test bench

10:台座 10: Pedestal

12:探針卡 12: Probe card

12a:探針 12a: Probe

13:介面 13: Interface

15:控制部 15: Control Department

20:溫度控制裝置 20: Temperature control device

30、30’:溫度控制器 30, 30’: Temperature controller

31a:溫度感應器 31a: Temperature sensor

32a:冷媒流道 32a: refrigerant flow path

40:加熱機構 40: heating mechanism

41:LED 41: LED

50:冷卻機構 50: Cooling mechanism

52:冷卻配管 52: Cooling piping

53:可變流量閥 53: Variable flow valve

54:高速閥 54: high speed valve

60:溫度測量電路 60: Temperature measurement circuit

71:滑動模式控制器 71: Sliding Mode Controller

72:冷卻模式控制器 72: Cooling mode controller

73、73’:切換控制器 73, 73’: Switch controller

74:廠模型 74: Factory model

77:加算器 77: adder

D:電子元件(溫度測量對象) D: Electronic components (temperature measurement object)

W:晶圓 W: Wafer

圖1係顯示第1實施形態相關之檢查裝置的概略構成的立體圖。 Fig. 1 is a perspective view showing a schematic configuration of an inspection device related to the first embodiment.

圖2係以剖面來顯示圖1之檢查裝置一部分的前視圖。 Fig. 2 is a front view showing a part of the inspection device of Fig. 1 in section.

圖3係概略性地顯示作為被檢查體的基板之晶圓的構成之俯視圖。 Fig. 3 is a plan view schematically showing the structure of a wafer as a substrate of an object to be inspected.

圖4係概略性地顯示台座之上部構成及溫度控制裝置的剖面圖。 Fig. 4 is a cross-sectional view schematically showing the structure of the upper part of the pedestal and the temperature control device.

圖5係概略性地顯示加熱機構之構成的俯視圖。 Fig. 5 is a plan view schematically showing the structure of the heating mechanism.

圖6係概略性地顯示電子元件之溫度測量用電路的構成之圖式。 Fig. 6 is a diagram schematically showing the structure of a circuit for temperature measurement of an electronic component.

圖7係用以說明滑動模式控制之圖式。 Fig. 7 is a diagram for explaining the sliding mode control.

圖8係顯示第1實施形態相關之檢查裝置中的溫度控制器之控制塊的塊狀圖。 Fig. 8 is a block diagram showing the control block of the temperature controller in the inspection device according to the first embodiment.

圖9係顯示圖8之溫度控制器中的滑動模式控制器內部的塊狀圖。 FIG. 9 is a block diagram showing the interior of the sliding mode controller in the temperature controller of FIG. 8.

圖10係顯示圖9之滑動模式控制器的非線性輸入部的塊狀圖。 Fig. 10 is a block diagram showing the nonlinear input part of the sliding mode controller of Fig. 9.

圖11係顯示圖8之溫度控制器中的冷卻模式控制器及切換控制器之構成及該等訊號的收授的塊狀圖。 FIG. 11 is a block diagram showing the composition of the cooling mode controller and the switching controller in the temperature controller of FIG. 8 and the reception and transmission of these signals.

圖12係顯示廠模型內部之塊狀圖。 Figure 12 shows the block diagram inside the factory model.

圖13係顯示第2實施形態相關之檢查裝置中的溫度控制器之控制塊的塊狀圖。 Fig. 13 is a block diagram showing the control block of the temperature controller in the inspection device according to the second embodiment.

圖14係顯示圖13之溫度控制器中的冷卻模式控制器及切換控制器之內部及該等訊號之收授的塊狀圖。 FIG. 14 is a block diagram showing the internals of the cooling mode controller and the switching controller in the temperature controller of FIG. 13 and the reception of these signals.

圖15係在藉由滑動模式控制來進行晶片之溫度控制的情況下發熱干擾為150W時之模擬結果的圖式。 FIG. 15 is a diagram of the simulation result when the heat interference is 150W when the temperature control of the chip is performed by sliding mode control.

圖16係在藉由滑動模式控制來進行晶片之溫度控制的情況下發熱干擾為300W時之模擬結果的圖式。 Fig. 16 is a graph of the simulation result when the heat interference is 300W when the temperature control of the chip is performed by sliding mode control.

圖17係在藉由滑動模式控制來進行晶片之溫度控制的情況下發熱干擾為450W時之模擬結果的圖式。 FIG. 17 is a diagram of the simulation result when the heat interference is 450W when the temperature control of the chip is performed by sliding mode control.

圖18係在藉由第1實施形態之控制來進行晶片之溫度控制的情況下發熱干擾為150W時之模擬結果的圖式。 FIG. 18 is a graph of simulation results when the heat interference is 150W when the temperature control of the chip is performed by the control of the first embodiment.

圖19係在藉由第1實施形態之控制來進行晶片之溫度控制的情況下發熱干擾為300W時之模擬結果的圖式。 FIG. 19 is a graph of the simulation result when the heat interference is 300 W when the temperature control of the chip is performed by the control of the first embodiment.

圖20係在藉由第1實施形態之控制來進行晶片之溫度控制的情況下發熱干擾為450W時之模擬結果的圖式。 FIG. 20 is a graph of simulation results when the heat interference is 450W when the temperature control of the chip is performed by the control of the first embodiment.

圖21係在藉由第2實施形態之控制來進行晶片之溫度控制的情況下發熱干擾為150W時之模擬結果的圖式。 FIG. 21 is a graph of simulation results when the heat interference is 150W when the temperature control of the chip is performed by the control of the second embodiment.

圖22係在藉由第2實施形態之控制來進行晶片之溫度控制的情況下發熱干擾為300W時之模擬結果的圖式。 Fig. 22 is a graph of simulation results when the heat interference is 300W when the temperature control of the chip is performed by the control of the second embodiment.

圖23係在藉由第2實施形態之控制來進行晶片之溫度控制的情況下發熱干擾為450W時之模擬結果的圖式。 FIG. 23 is a graph of the simulation result when the heat interference is 450W when the temperature control of the chip is performed by the control of the second embodiment.

圖24係將發熱干擾為150W時之第1實施形態的模擬結果放大而顯示的圖式。 Fig. 24 is a diagram showing an enlarged simulation result of the first embodiment when the heat interference is 150W.

圖25係將發熱干擾為150W時之第2實施形態的模擬結果放大而顯示的圖式。 FIG. 25 is a diagram showing an enlarged simulation result of the second embodiment when the heat interference is 150W.

圖26係將發熱干擾為300W時之第1實施形態的模擬結果放大而顯示的圖式。 Fig. 26 is a diagram showing an enlarged simulation result of the first embodiment when the heat interference is 300W.

圖27係將發熱干擾為300W時之第2實施形態的模擬結果放大而顯示的圖式。 Fig. 27 is a diagram showing an enlarged simulation result of the second embodiment when the heat interference is 300W.

圖28係將發熱干擾為450W時之第1實施形態的模擬結果放大而顯示的圖式。 Fig. 28 is a diagram showing an enlarged simulation result of the first embodiment when the heat interference is 450W.

圖29係將發熱干擾為450W時之第2實施形態的模擬結果放大而顯示的圖式。 Fig. 29 is a diagram showing an enlarged simulation result of the second embodiment when the heat interference is 450W.

以下,便參照添附圖式就實施形態來加以說明。 Hereinafter, the embodiment will be described with reference to the attached drawings.

<第1實施形態> <First Embodiment>

首先,就第1實施形態來加以說明。 First, the first embodiment will be described.

圖1係顯示第1實施形態相關之檢查裝置的概略構成的立體圖,圖2係以剖面來顯示圖1之檢查裝置一部分的前視圖。 Fig. 1 is a perspective view showing a schematic configuration of an inspection device related to the first embodiment, and Fig. 2 is a front view showing a part of the inspection device of Fig. 1 in cross section.

如圖1及圖2所示,檢查裝置1係進行被形成在作為被檢查體之基板的晶圓W之複數電子元件的各電氣特性的檢查者,具備:檢查部2;裝載部3;以及測試台4。 As shown in FIGS. 1 and 2, the inspection apparatus 1 is a person who inspects the electrical characteristics of a plurality of electronic components formed on a wafer W as a substrate of an object to be inspected, and includes: an inspection section 2; a loading section 3; and Test bench 4.

檢查部2係具有內部呈空洞之框體11,框體11內係具有會吸附固定有檢查對象之晶圓W的台座10。又,台座10係構成為會藉由移動機構(未圖示) 來自由移動於水平方向及垂直方向。台座10下方係設置有控制台座之溫度的溫度控制裝置20。關於溫度控制裝置20會在之後詳細說明。 The inspection unit 2 has a frame 11 with a cavity inside, and the frame 11 has a pedestal 10 on which the wafer W to be inspected can be sucked and fixed. In addition, the pedestal 10 is configured to use a moving mechanism (not shown) Move freely in the horizontal and vertical directions. Below the base 10 is a temperature control device 20 for the temperature of the console base. The temperature control device 20 will be described in detail later.

檢查部2中之該台座10上方係以對向於該台座10的方式來配置有探針卡12。探針卡12係具有為接觸子之複數探針12a。又,探針卡12會透過介面13來連接於測試台4。在各探針12a接觸於晶圓W之各電子元件的電極時,各探針12a會從測試台4透過介面13來朝電子元件供給電力,或是將來自電子元件之訊號透過介面13來朝測試台4傳遞。 A probe card 12 is arranged above the pedestal 10 in the inspection part 2 so as to face the pedestal 10. The probe card 12 has a plurality of probes 12a as contacts. In addition, the probe card 12 is connected to the test bench 4 through the interface 13. When each probe 12a is in contact with the electrode of each electronic component of the wafer W, each probe 12a supplies power from the test station 4 to the electronic component through the interface 13, or transmits a signal from the electronic component to the electronic component through the interface 13. Test bench 4 passes.

裝載部3係具有框體14,框體14內係配置有為收納有晶圓W之搬送容易的FOUP(未圖示)。又,裝載部3係具有搬送機構(未圖示),而藉由搬送機構來取出被收納於FOUP的晶圓W並朝檢查部2之台座10搬送。又,會藉由搬送裝置來搬送電氣特性之檢查結束後的台座10上之晶圓W,而朝FOUP收納。 The loading unit 3 has a frame 14 in which a FOUP (not shown) that is easy to transport in which the wafer W is accommodated is arranged. In addition, the loading unit 3 has a transport mechanism (not shown), and the wafer W stored in the FOUP is taken out by the transport mechanism and transported to the pedestal 10 of the inspection unit 2. In addition, the wafer W on the pedestal 10 after the inspection of the electrical characteristics is completed is transported by the transport device, and stored in the FOUP.

又,裝載部3之框體14內係設置有:控制部15,係進行檢查對象之電子元件的溫度控制等之各種控制;以及電位差測量單元16,係測量各電子元件中之電位差生成電路(省略圖示)的電位差。電位差生成電路係例如二極體、電晶體或電抗。電位差測量單元16會被連接於介面13,而取得會朝上述電位差生成電路所對應之2個電極接觸的2個探針12a間的電位差,而將所取得之電位差朝控制部15傳遞。關於介面13中之各探針12a及從電位差測量單元16之配線的連接構造會在之後詳述。 In addition, the frame 14 of the loading section 3 is provided with a control section 15 which performs various controls such as temperature control of electronic components of the inspection object; and a potential difference measurement unit 16 which measures the potential difference generation circuit in each electronic component ( (Illustration omitted) potential difference. The potential difference generating circuit is, for example, a diode, a transistor, or a reactance. The potential difference measuring unit 16 is connected to the interface 13 to obtain the potential difference between the two probes 12a that will contact the two electrodes corresponding to the potential difference generating circuit, and transmit the obtained potential difference to the control unit 15. The connection structure of each probe 12a in the interface 13 and the wiring from the potential difference measuring unit 16 will be described in detail later.

控制部15係具有會被包含在溫度控制裝置20之溫度控制器30,溫度控制器30會控制下述加熱機構及冷卻機構。另外,控制部15及電位差測量單元16係可被設置在檢查部2之框體11內,又,電位差測量裝置16亦可被設置在探針卡12。 The control unit 15 has a temperature controller 30 included in the temperature control device 20, and the temperature controller 30 controls the following heating mechanism and cooling mechanism. In addition, the control unit 15 and the potential difference measurement unit 16 may be installed in the housing 11 of the inspection unit 2, and the potential difference measurement device 16 may also be installed in the probe card 12.

檢查部2之框體11係設置有會構成控制部15一部分的使用者介面部18。使用者介面部18係用以對使用者顯示資訊或讓使用者輸入指者,例如由觸控面板或鍵盤等的輸入部與液晶顯示器等的顯示部所構成。 The frame 11 of the inspection unit 2 is provided with a user interface surface 18 that constitutes a part of the control unit 15. The user interface surface 18 is used to display information to the user or allow the user to input a pointer, and is composed of, for example, an input unit such as a touch panel or a keyboard and a display unit such as a liquid crystal display.

測試台4係具有會將搭載有電子元件之主機板的電路構成一部分再現的測試板(省略圖示)。測試板係被連接於會基於來自電子元件之訊號來判斷該電子元件之良莠的測試電腦17。測試台4中係可藉由取代上述測試板來再現複數種的主機板之電路構成。 The test stand 4 has a test board (not shown) that reproduces a part of the circuit configuration of the motherboard on which electronic components are mounted. The test board is connected to a test computer 17 which judges the quality of the electronic component based on the signal from the electronic component. The test bench 4 can be constructed by replacing the above-mentioned test board to reproduce a plurality of motherboard circuits.

另外,探針卡12、介面13、測試台4係構成檢查機構。 In addition, the probe card 12, the interface 13, and the test stand 4 constitute an inspection mechanism.

在檢查電子元件之電氣特性時,測試電腦17會將數據朝透過各探針12a來與電子元件連接之測試板傳遞。然後,測試電腦17會基於來自該測試板之電氣訊號,來判斷所傳遞之數據是否有藉由該測試板來被正確地處理。 When checking the electrical characteristics of electronic components, the test computer 17 transmits data to the test board connected to the electronic components through the probes 12a. Then, the test computer 17 judges whether the transmitted data is correctly processed by the test board based on the electrical signal from the test board.

作為被檢查體之基板的晶圓W如圖3所示,係具有:複數電子元件D,係藉由對略圓板狀之矽基板施加蝕刻處理或配線處理來於其表面隔有既定間隔而被加以形成。電子元件D之表面係形成有電極E,該電極E會被電性連接在該電子元件D內部之電路元件。藉由朝電極E施加電壓,便可使電流流通於各電子元件D內部之電路元件。 As shown in FIG. 3, the wafer W as the substrate of the object to be inspected has a plurality of electronic components D, which are separated by predetermined intervals on the surface by applying etching or wiring processing to a substantially disc-shaped silicon substrate Be formed. An electrode E is formed on the surface of the electronic component D, and the electrode E is electrically connected to the circuit component inside the electronic component D. By applying a voltage to the electrode E, a current can flow through the circuit elements inside each electronic element D.

接著,便使用圖4就台座10及溫度控制裝置20來加以說明。圖4係概略性地顯示台座10之上部構成及溫度控制裝置20的剖面圖。 Next, the pedestal 10 and the temperature control device 20 will be described using FIG. 4. 4 is a cross-sectional view schematically showing the upper structure of the pedestal 10 and the temperature control device 20.

如圖4所示,台座10係具有有底構件32與蓋構件31。蓋構件31會透過密封環33來被安裝在有底構件32上。晶圓W會被吸附保持在蓋構件31上。 As shown in FIG. 4, the pedestal 10 has a bottomed member 32 and a cover member 31. The cover member 31 is installed on the bottomed member 32 through the sealing ring 33. The wafer W is sucked and held on the cover member 31.

蓋構件31係形成為圓板狀,且例如以SiC所構成。SiC之熱傳導率及楊式率會較高。又,相對於來自下述加熱機構40之LED41的光線之吸收效率 亦會較高,而可藉由來自加熱機構40之光線來有效率地加熱蓋構件31。又,SiC係可在成形於生胚薄板(green sheet)後燒結來加以形成,而能減少加工量。 The cover member 31 is formed in a disc shape, and is made of, for example, SiC. The thermal conductivity and Young's rate of SiC will be higher. Also, relative to the absorption efficiency of the light from the LED41 of the heating mechanism 40 below It will also be higher, and the cover member 31 can be heated efficiently by the light from the heating mechanism 40. In addition, the SiC system can be formed by sintering after being formed on a green sheet, which can reduce the amount of processing.

蓋構件31上面係形成有用以吸附晶圓W之吸附孔(省略圖示)。又,蓋構件31係在俯視觀察下會互相分離的位置埋設有複數溫度感應器31a。 The upper surface of the cover member 31 is formed with suction holes (not shown) for sucking the wafer W. In addition, the cover member 31 is embedded with a plurality of temperature sensors 31a at positions separated from each other in a plan view.

有底構件32係形成為與蓋構件31略相同直徑之圓板狀,並相對於來自下述LED之光線的波長而以透明的材料所構成。有底構件32上部係形成有用以流通冷媒之溝,該溝會被蓋構件31所覆蓋而形成冷媒流道32a。亦即,台座10係於內部具有冷媒流道32a。 The bottomed member 32 is formed in a circular plate shape having approximately the same diameter as the cover member 31, and is composed of a transparent material with respect to the wavelength of the light from the LED below. The upper portion of the bottomed member 32 is formed with a groove for circulating the refrigerant, and the groove is covered by the cover member 31 to form a refrigerant flow passage 32a. That is, the pedestal 10 has a refrigerant flow passage 32a inside.

溫度控制裝置20係具有加熱機構40、冷卻機構50以及溫度控制器30。溫度控制裝置20會藉由加熱機構40之加熱以及冷卻機構50之冷卻,並以使台座10上之晶圓W所形成的檢查對象之電子元件D的溫度穩定在目標溫度之方式來進行控制。 The temperature control device 20 has a heating mechanism 40, a cooling mechanism 50 and a temperature controller 30. The temperature control device 20 is controlled by heating by the heating mechanism 40 and cooling by the cooling mechanism 50 to stabilize the temperature of the electronic component D of the inspection object formed by the wafer W on the pedestal 10 at the target temperature.

加熱機構40會構成為光照射機構,而藉由將光線照射至台座10之蓋構件31而加熱該蓋構件31,來加熱晶圓W,以加熱晶圓W上所形成之電子元件D。 The heating mechanism 40 is configured as a light irradiation mechanism, and the cover member 31 of the pedestal 10 is irradiated with light to heat the cover member 31 to heat the wafer W to heat the electronic components D formed on the wafer W.

加熱機構40係以會對向於台座10之晶圓W載置面相反側的面,亦即有底構件32之下面的方式來加以配置。加熱機構40係具有會作為加熱源來朝向晶圓W照射光線的複數LED41。具體而言,加熱機構40係具有將會使複數LED41被單元化後之LED單元43複數搭載於基底42表面的構成。加熱機構40之LED單元43如圖5所示,係具有:單元43a,係以對應於電子元件D(參照圖3)的方式來配列,且俯視觀察下為正方形狀;以及單元43b,係設置於其外周,且俯視 觀察下為非正方形狀。藉由單元43a及43b來覆蓋基底42之略整面,而可從LED單元43之LED41來將光線至少照射至蓋構件31中搭載有晶圓W之部分整體。 The heating mechanism 40 is arranged so as to face the surface opposite to the wafer W mounting surface of the pedestal 10, that is, the lower surface of the bottomed member 32. The heating mechanism 40 has a plurality of LEDs 41 that irradiate light toward the wafer W as a heating source. Specifically, the heating mechanism 40 has a structure in which a plurality of LED units 43 after a plurality of LEDs 41 are unitized are mounted on the surface of the base 42. As shown in FIG. 5, the LED unit 43 of the heating mechanism 40 has: a unit 43a, which is arranged in a manner corresponding to the electronic component D (refer to FIG. 3), and is square in plan view; and a unit 43b, which is arranged On its periphery and looking down It is non-square under observation. With the units 43a and 43b covering substantially the entire surface of the base 42, the LED 41 of the LED unit 43 can irradiate at least the whole part of the cover member 31 where the wafer W is mounted.

各LED41會射出例如近紅外光。從LED41所射出之光線(以下,亦稱為「LED光」。)會穿透由光穿透構件所構成的台座10之有底構件32。流通於冷媒流道32a的冷媒係由會讓來自LED41之光線穿透的材料所構成,穿透過有底構件32之光線會穿透流通於冷媒流道32a的冷媒,而入射至蓋構件31。在來自LED41之光線為近紅外光之情況,可使用聚碳酸酯、石英、聚氯乙烯、壓克力樹脂或玻璃來作為構成有底構件32之光穿透構件。該等材料可易於加工或成形。 Each LED 41 emits near-infrared light, for example. The light emitted from the LED 41 (hereinafter, also referred to as "LED light") will penetrate the bottomed member 32 of the pedestal 10 formed by the light-transmitting member. The refrigerant circulating in the refrigerant flow passage 32a is made of a material that allows light from the LED 41 to pass through. The light passing through the bottomed member 32 penetrates the refrigerant circulating in the refrigerant flow passage 32a and enters the cover member 31. When the light from the LED 41 is near-infrared light, polycarbonate, quartz, polyvinyl chloride, acrylic resin or glass can be used as the light transmitting member constituting the bottomed member 32. These materials can be easily processed or shaped.

加熱機構40中,入射至台座10之載置有晶圓W的蓋構件31之LED光係以LED單元43為單位來加以控制。從而,加熱機構40係可僅將LED光照射至蓋構件31之任意位置,或是讓照射之光線的強度在任意位置與其他位置有所不同。 In the heating mechanism 40, the LED light incident on the cover member 31 of the pedestal 10 on which the wafer W is placed is controlled by the LED unit 43 as a unit. Therefore, the heating mechanism 40 can only irradiate the LED light to any position of the cover member 31, or the intensity of the irradiated light can be different from other positions at any position.

冷卻機構50係具有冷卻單元51、冷媒配管52、可變流量閥53以及高速閥54。冷卻單元51會儲存冷媒,並將冷媒溫度控制在既定溫度。作為冷媒係可使用例如能讓從LED41所照射之光線穿透且為液體之水。冷媒配管52係連接於有底構件32側部所設置之供給口32b與排出口32c,且連接於冷卻單元51。冷卻單元51內之冷媒會藉由設置於冷媒配管52之泵(未圖示)並透過冷媒配管52來循環於冷媒流道32a。可變流量閥53會被設置於冷媒配管52之冷卻單元51下游側,高速閥54係在冷卻單元51下游側被設置於會將可變流量閥53分流之分流配管52a。可變流量閥53係可設定流量,並以所設定之流量的固定量來供給冷媒。又,高速閥54係基於在下述滑動控制時的非線性增益項來高速進行開閉(開啟、關閉),而可在高速下來進行流通於分流配管52a的冷媒之供給/停止。 The cooling mechanism 50 includes a cooling unit 51, a refrigerant pipe 52, a variable flow valve 53, and a high-speed valve 54. The cooling unit 51 stores the refrigerant and controls the temperature of the refrigerant to a predetermined temperature. As the refrigerant system, for example, liquid water that can penetrate the light irradiated from the LED 41 can be used. The refrigerant pipe 52 is connected to the supply port 32 b and the discharge port 32 c provided on the side of the bottomed member 32, and is connected to the cooling unit 51. The refrigerant in the cooling unit 51 is circulated in the refrigerant flow passage 32a through the refrigerant pipe 52 by a pump (not shown) installed in the refrigerant pipe 52. The variable flow valve 53 is provided on the downstream side of the cooling unit 51 of the refrigerant piping 52, and the high-speed valve 54 is provided on the downstream side of the cooling unit 51 in the branch pipe 52a that divides the variable flow valve 53. The variable flow valve 53 can set the flow rate and supply the refrigerant at a fixed amount of the set flow rate. In addition, the high-speed valve 54 opens and closes (opens, closes) at a high speed based on a nonlinear gain term in the sliding control described below, and can supply/stop the refrigerant flowing through the branch pipe 52a at a high speed.

溫度控制器30會基於電子元件D之溫度的測量結果,而藉由加熱機構40及冷卻機構50,並以使電子元件D之溫度成為既定溫度的方式來控制台座之溫度。 Based on the measurement result of the temperature of the electronic component D, the temperature controller 30 uses the heating mechanism 40 and the cooling mechanism 50 to control the temperature of the base in such a way that the temperature of the electronic component D becomes a predetermined temperature.

電子元件D之溫度係藉由溫度測量用電路60來加以測量。圖6係概略性地顯示電子元件D之溫度測量用電路60的構成之圖式。 The temperature of the electronic component D is measured by the temperature measurement circuit 60. FIG. 6 is a diagram schematically showing the configuration of the temperature measurement circuit 60 of the electronic component D.

如圖6所示,各探針12a會藉由介面13所配置之複數配線61來連接於測試台4。在將電子元件D中之電位差生成電路(例如二極體)的2個電極E所接觸的2個探針12a與測試台4連接的2個配線61係分別設置有繼電器62。又,繼電器62亦可連接於電位差測量單元16之配線63。 As shown in FIG. 6, each probe 12a is connected to the test bench 4 through a plurality of wires 61 arranged on the interface 13. The two wirings 61 connecting the two probes 12a of the potential difference generating circuit (for example, a diode) in the electronic component D to the two electrodes E of the test stand 4 are respectively provided with a relay 62. In addition, the relay 62 may also be connected to the wiring 63 of the potential difference measurement unit 16.

亦即,各繼電器62係可將各電極E之電位朝測試台4及電位差測量單元16的任一者切換而進行傳遞。例如,在進行電子元件D之電氣特性的檢查時,於朝各電極E施加實際裝設時之電壓後,便會在既定時間點將各電極E之電位朝電位差測量單元16傳遞。已知在上述電位差生成電路中,於流通既定電流時所產生的電位差會因溫度而有所不同。從而,便可基於電子元件D之電位差生成電路的電位差,亦即,電位差生成電路的2個電極E(探針12a)間的電位差來在檢查中即時測量電子元件D之溫度。 That is, each relay 62 can switch the potential of each electrode E to any one of the test stand 4 and the potential difference measurement unit 16 for transmission. For example, when the electrical characteristics of the electronic component D are inspected, after the actual installation voltage is applied to each electrode E, the potential of each electrode E is transmitted to the potential difference measuring unit 16 at a predetermined time. It is known that in the above-mentioned potential difference generating circuit, the potential difference generated when a predetermined current flows varies depending on the temperature. Therefore, the temperature of the electronic component D can be measured immediately during the inspection based on the potential difference of the potential difference generating circuit of the electronic component D, that is, the potential difference between the two electrodes E (probe 12a) of the potential difference generating circuit.

亦即,溫度測量用電路60係由電子元件D中之電位差生成電路、其2個電極所接觸的2個探針12a、連接於該等的2個配線61、繼電器62、配線63以及電位差測量單元16所構成。 That is, the temperature measurement circuit 60 is composed of a potential difference generation circuit in the electronic component D, two probes 12a contacted by its two electrodes, two wirings 61, relay 62, wiring 63, and potential difference measurement connected to them. The unit 16 constitutes.

另外,電子元件D之溫度的測量方法並不限於上述者,亦可為其他方法。 In addition, the method for measuring the temperature of the electronic component D is not limited to the above, and may be other methods.

溫度控制器30係基於上述般之電子元件D的溫度測量結果,並藉由將朝為加熱源之LED41投入之功率(電流值輸出)作為操作量的滑動模式控制,以及將朝為冷卻源之高速閥投入之功率(亦即高速閥之開閉訊號)作為操作量的冷卻模式控制來進行溫度控制。 The temperature controller 30 is based on the temperature measurement result of the above-mentioned general electronic component D, and is controlled by the sliding mode that uses the power (current value output) input to the LED 41 as the heating source as the operating quantity, and the direction as the cooling source. The input power of the high-speed valve (that is, the opening and closing signal of the high-speed valve) is used as the cooling mode control of the operating quantity for temperature control.

滑動模式控制係以在狀態空間內之預設切換相平面(切換面)拘束狀態的方式來在切換相平面的上下切換控制之控制方法。在控制對象之初期狀態位在切換相平面外的情況,會使控制對象之狀態在有限時間抵達、拘束在切換相平面(抵達模式)。在控制對象之狀態抵達至切換相平面後,便會在切換相平面來讓狀態滑動,並朝目標值收斂(滑動模式)。滑動模式控制之控制輸入u係線性項(線性控制操作量)u1與非線性項(非線性控制操作量)un1之和,並可以下數學式來加以表示 The sliding mode control is a control method of switching control on the upper and lower switching phase planes by the way of the preset switching phase plane (switching surface) in the state space. In the case that the initial state of the control object is outside the switching phase plane, the state of the control object will arrive in a limited time and be constrained in the switching phase plane (arrival mode). After the state of the control object reaches the switching phase plane, it will slide the state on the switching phase plane and converge towards the target value (sliding mode). The control input u of the sliding mode control is the sum of the linear term (linear control operation quantity) u1 and the non-linear term (non-linear control operation quantity) un1, and can be expressed by the following mathematical formula

u=-(SB)-1SAx-K(SB)-1.sgn(σ)=-(SB)-1{SAx+K.sgn(σ)} u=-(SB) -1 SAx-K(SB) -1 . sgn(σ)=-(SB) -1 {SAx+K. sgn(σ)}

σ=Sx σ=Sx

SAx為線性項,K.sgn(σ)為非線性項。A、B為狀態方程式之行列式,S與K為控制參數。函數sgn係表示不連續函數,sgn(σ)為滑動模式之切換函數。切換相平面係可以線性控制之框架來加以設計,滑動模式中,係在切換相平面上藉由非線性項來在極短時間來回於圖7所示的區域II與區域I並在切換相平面上移動。亦即,滑動模式中,線性項(線性控制操作量)係使控制系統之狀態在切換相平面上將控制誤差成為最小,非線性項則是在存在有模型化誤差或不確定干擾時使控制系統之狀態朝向切換相平面。 SAx is a linear term, K. sgn(σ) is a nonlinear term. A and B are the determinants of the state equation, and S and K are the control parameters. The function sgn is a discontinuous function, and sgn(σ) is the switching function of the sliding mode. The switching phase plane can be designed in the framework of linear control. In the sliding mode, the switching phase plane uses a nonlinear term to go back and forth between the area II and the area I shown in Figure 7 in a very short time and switch the phase plane. Move up. That is, in the sliding mode, the linear term (linear control operation amount) minimizes the control error in the switching phase plane of the state of the control system, and the nonlinear term makes the control when there are modeling errors or uncertain disturbances. The state of the system is towards the switching phase plane.

圖8係顯示溫度控制器30之控制塊的圖式。溫度控制器30係具有滑動模式控制器17、冷卻模式控制器72、切換控制器73以及廠模型74。 FIG. 8 is a diagram showing the control block of the temperature controller 30. The temperature controller 30 has a sliding mode controller 17, a cooling mode controller 72, a switching controller 73 and a factory model 74.

滑動模式控制器71係將朝加熱機構40之LED41投入之功率(作為電流值為輸出)作為操作量來輸出,而進行溫度控制。滑動模式控制器71中,如圖9所示,係輸入溫度檢出訊號x,而藉由線性項(線性增益項)與在非線性輸入部75所生成之非線性項(非線性增益項)來形成控制輸入u。非線性輸入部75如圖10所示,藉由切換函數σ、SWgain:k、SWita:η來生成非線性輸入(非線性項):un1。un1係以下數學式來加以表示。 The slide mode controller 71 outputs the power input to the LED 41 of the heating mechanism 40 (output as a current value) as an operation amount, and performs temperature control. In the sliding mode controller 71, as shown in FIG. 9, the temperature detection signal x is input, and the linear term (linear gain term) and the nonlinear term (nonlinear gain term) generated in the nonlinear input part 75 To form the control input u. As shown in FIG. 10, the nonlinear input unit 75 generates a nonlinear input (non-linear term): un1 by switching functions σ, SWgain: k, and SWita: η. un1 is expressed by the following mathematical formula.

un1=-k.σ/(|σ|+η) un1=-k. σ/(|σ|+η)

η係顫動抑制項。由於非線性輸入(非線性項):un1係切換頻率為無限,故狀態量在切換相平面附近會顫動(高頻振動)。因此,便會使用η來抑制顫動而使輸入平滑化。 η is the vibration suppression item. Due to the non-linear input (non-linear term): the switching frequency of the un1 system is infinite, so the state quantity will vibrate (high frequency vibration) near the switching phase plane. Therefore, η is used to suppress chattering and smooth the input.

圖11係顯示冷卻模式控制器72及切換控制器73之內部的塊狀圖。 FIG. 11 is a block diagram showing the inside of the cooling mode controller 72 and the switching controller 73.

冷卻模式控制器72係將朝為冷卻源之高速閥54投入之功率(高速閥54之開閉訊號)作為操作量來進行冷卻控制。藉此,來控制被供給至台座10之冷媒流道32a的冷媒之量,以將電子元件D進行溫度控制。冷卻模式控制器72之輸出係基於冷媒流量及吸熱係數並藉由吸熱模型來加以計算。雖圖11中係將吸熱係數表示為-0.4,但此不過是一範例,其數值係可根據電子元件D等而變化。 The cooling mode controller 72 performs cooling control by using the power input to the high-speed valve 54 as the cooling source (the opening/closing signal of the high-speed valve 54) as the operation amount. In this way, the amount of refrigerant supplied to the refrigerant flow passage 32a of the pedestal 10 is controlled to control the temperature of the electronic component D. The output of the cooling mode controller 72 is calculated by the heat absorption model based on the refrigerant flow rate and the heat absorption coefficient. Although the endothermic coefficient is represented as -0.4 in FIG. 11, this is just an example, and its value can be changed according to the electronic component D and the like.

切換控制器73係使用滑動模式控制器之非線性項un1的數值來作為切換訊號。亦即,切換控制器73係藉由非線性項un1的數值來決定是否直接使用滑動模式控制器71之輸出(控制輸出),或是不使用滑動模式控制器71之輸出,而將冷卻模式控制器72之輸出作為第2操作量來加以使用。 The switching controller 73 uses the value of the non-linear term un1 of the sliding mode controller as the switching signal. That is, the switching controller 73 uses the value of the non-linear term un1 to determine whether to directly use the output of the sliding mode controller 71 (control output), or not to use the output of the sliding mode controller 71 to control the cooling mode The output of the device 72 is used as the second operation amount.

所謂直接使用滑動模式控制器71之輸出(控制輸入)係指將滑動模式控制器71之輸出作為第1操作量來輸出至為加熱源之LED41。 The so-called direct use of the output (control input) of the sliding mode controller 71 refers to outputting the output of the sliding mode controller 71 as the first operation quantity to the LED 41 as the heating source.

所謂將冷卻模式控制器72之輸出作為第2操作量來加以使用係指將為冷卻模式控制器72之冷卻源的高速閥之輸出作為第2操作量來加以使用。 The use of the output of the cooling mode controller 72 as the second operation amount means that the output of the high-speed valve which is the cooling source of the cooling mode controller 72 is used as the second operation amount.

具體而言,切換控制器73在非線性項un1之數值為正(切換相平面之一邊側;圖7之區域I)之情況,便會直接將滑動模式控制器71之輸出作為第1操作量來輸出至LED41。又,在非線性項un1之數值為負(切換相平面之另邊側;圖7之區域II)之情況,便會將為冷卻模式控制器72之冷卻源的高速閥之輸出(高速閥之開閉訊號)作為第2操作量來加以使用。高速閥之開閉時間為0.1sec以下的高速,高速閥54係可追隨非線性項un1的高速切換來加以開閉,而可高控制性地進行溫度控制。 Specifically, when the value of the non-linear term un1 is positive (one side of the switching phase plane; area I in Fig. 7), the switching controller 73 will directly use the output of the sliding mode controller 71 as the first operation variable. To output to LED41. In addition, when the value of the non-linear term un1 is negative (the other side of the switching phase plane; area II in Fig. 7), the output of the high-speed valve that is the cooling source of the cooling mode controller 72 (the high-speed valve The open/close signal) is used as the second operation quantity. The opening and closing time of the high-speed valve is at a high speed of 0.1sec or less. The high-speed valve 54 can be opened and closed following the high-speed switching of the non-linear term un1, and the temperature can be controlled with high controllability.

廠模型74係為溫度控制對象之電子元件D(台座10)的物理模型,為圖12所示者。然後,從切換控制器73所輸出之訊號會被輸入至廠模型74,而在廠模型74中經過必要的演算來得到控制訊號。 The plant model 74 is a physical model of the electronic component D (the pedestal 10) that is the temperature control object, and is shown in FIG. 12. Then, the signal output from the switching controller 73 is input to the factory model 74, and the factory model 74 undergoes necessary calculations to obtain the control signal.

電子元件D之溫度控制係一邊藉由冷卻機構50之可變流量閥53,並以固定流量來使冷媒流通於冷媒流道32a而吸熱,一邊藉由溫度控制器30來加以進行。亦即,可藉由溫度控制器30,來進行將朝為加熱源之LED41投入的功率作為操作量之滑動模式控制,以及將朝為冷卻源之高速閥54投入之功率(高速閥之開閉訊號)作為操作量的冷卻模式控制所致的溫度控制。此時,便會藉由切換控制器73,而以非線性項un1之數值來決定是否直接使用非線性項un1來進行滑動模式控制,或是將非線性項un1作為高速閥54之開閉訊號來使用,以進行冷卻模式控制。在滑動模式控制之非線性項un1的數值為正之情況,便會藉由直接將朝LED41投入之功率作為操作量的滑動模式控制來進行溫度控制。在滑動模式控制之非線性項un1的數值為負之情況,非線性項un1便會作為高速閥54之開 閉訊號來輸出,而將LED41之滑動模式控制切換為冷卻模式控制。此時溫度控制便不會使用滑動模式控制器71之輸出。藉由使用冷卻模式控制,便可在關閉LED41之情況之外,還可冷卻電子元件D。藉此,便可確保在有非常大之發熱干擾的情況下之電子元件D的溫度控制性。 The temperature control of the electronic component D is performed by the temperature controller 30 while using the variable flow valve 53 of the cooling mechanism 50 to make the refrigerant flow through the refrigerant flow passage 32a at a fixed flow rate to absorb heat. That is, the temperature controller 30 can be used to perform sliding mode control in which the power input to the LED 41 as the heating source is used as the operating quantity, and the power input to the high-speed valve 54 as the cooling source (open/close signal of the high-speed valve) ) Temperature control due to cooling mode control as the operating quantity. At this time, by switching the controller 73, the value of the nonlinear term un1 is used to determine whether to directly use the nonlinear term un1 for sliding mode control, or use the nonlinear term un1 as the opening and closing signal of the high-speed valve 54 Used for cooling mode control. When the value of the non-linear term un1 of the sliding mode control is positive, the temperature control is performed by the sliding mode control that directly uses the power input to the LED 41 as the operating quantity. When the value of the non-linear term un1 of sliding mode control is negative, the non-linear term un1 will be used as the opening of the high-speed valve 54 The closing signal is output, and the sliding mode control of the LED 41 is switched to the cooling mode control. At this time, the temperature control will not use the output of the sliding mode controller 71. By using the cooling mode control, the electronic component D can be cooled in addition to turning off the LED 41. In this way, the temperature controllability of the electronic component D can be ensured under the condition of very large heating interference.

控制部15係由電腦所構成,且除了溫度控制器30之外,還具備具有控制檢查裝置1之各構成部的複數控制機能部的主控制部,而會藉由主控制部來控制檢查裝置之各構成部的動作。又,控制部係具有輸入裝置、輸出裝置、顯示裝置以及記憶裝置。主控制部所致之各構成部的控制會藉由被記憶於記憶裝置所內建之記憶媒體(硬碟、光碟、半導體記憶體等)的控制程式之處理配方來加以實行。 The control unit 15 is composed of a computer, and in addition to the temperature controller 30, it also has a main control unit with a plurality of control functions for controlling each component of the inspection device 1, and the inspection device is controlled by the main control unit The actions of each component. In addition, the control unit has an input device, an output device, a display device, and a memory device. The control of each component caused by the main control unit is implemented by the processing formula of the control program stored in the storage medium (hard disk, optical disc, semiconductor memory, etc.) built into the storage device.

接著,便就使用檢查裝置1來對晶圓W進行檢查處理一範例來加以說明。首先,從裝載部3之FOUP藉由搬送裝置來取出晶圓W,而搬送至台座10並加以載置。接著,將台座10移動至既定位置。 Next, an example of using the inspection device 1 to perform inspection processing on the wafer W will be described. First, the wafer W is taken out from the FOUP of the loading part 3 by the transfer device, and is transferred to the pedestal 10 and placed on it. Next, the pedestal 10 is moved to a predetermined position.

然後,開啟加熱機構40之全部LED41,而基於從蓋構件31之溫度感應器31a所取得的資訊,並以使蓋構件31之溫度在面內成為均勻的方式來調整來自LED41之光線輸出以及藉由可變流量閥53來調整流通於台座10內之冷媒流道32a的冷媒之流量。 Then, all the LEDs 41 of the heating mechanism 40 are turned on, and based on the information obtained from the temperature sensor 31a of the cover member 31, the light output from the LED 41 is adjusted in such a way that the temperature of the cover member 31 becomes uniform in the plane. The variable flow valve 53 adjusts the flow rate of the refrigerant flowing through the refrigerant flow passage 32a in the pedestal 10.

在此狀態下,會藉由電位差測量單元16來取得檢查對象之電子元件D中的上述電位差生成電路的電位差。然後,以在面內為均勻的蓋構件31之溫度會與檢查對象之電子元件D的溫度成為略一致的方式來進行上述電位差之校正,而修正上述電位差之溫度特性的資訊。 In this state, the potential difference of the above-mentioned potential difference generating circuit in the electronic component D of the inspection object is obtained by the potential difference measuring unit 16. Then, the above-mentioned potential difference is corrected so that the temperature of the cover member 31 that is uniform in the plane and the temperature of the electronic component D of the inspection object become approximately the same, and the information of the temperature characteristic of the above-mentioned potential difference is corrected.

之後,便讓台座10移動,而使設置於台座10上方之探針12a與晶圓W之檢查對象的電子元件D的電極E接觸。然後,對探針12a輸入檢查用之訊號。藉此,便開始電子元件D之檢查。 After that, the pedestal 10 is moved, and the probe 12a provided above the pedestal 10 is brought into contact with the electrode E of the electronic component D of the inspection target of the wafer W. Then, a signal for inspection is input to the probe 12a. With this, the inspection of the electronic component D is started.

上述檢查中,會基於檢查對象之電子元件D的電位差生成電路所產生的電位差之資訊來測量該電子元件D之溫度,並將該測量溫度作為目標溫度,再藉由溫度控制裝置20來進行該電子元件D之溫度控制。 In the above inspection, the temperature of the electronic component D to be inspected is measured based on the information of the potential difference generated by the potential difference generating circuit of the electronic component D, and the measured temperature is used as the target temperature, and then the temperature control device 20 performs this Temperature control of electronic component D.

此時,會一邊藉由冷卻機構50之可變流量閥53,並以固定流量來使冷媒流通於冷媒流道32a而吸熱,一邊藉由溫度控制器30來進行溫度控制。亦即,可藉由溫度控制器30,來進行將朝為加熱源之LED41投入的功率作為操作量之滑動模式控制,以及將朝為冷卻源之高速閥54投入之功率(高速閥之開閉訊號)作為操作量的冷卻模式控制所致的溫度控制。此時,切換控制器73便會如上述般,藉由非線性項un1之數值來決定是否直接使用滑動模式控制器71之輸出(控制輸入),或是將非線性項un1作為高速閥54之開閉訊號來使用,以進行冷卻模式控制。具體而言,在滑動模式控制之非線性項un1的數值為正之情況,便會直接將滑動模式控制器71之輸出作為第1操作量來輸出至LED41。另一方面,非線性項un1的數值為負之情況,便會將非線性項un1作為高速閥54之開閉訊號來使用,而作為第2操作量來輸出至高速閥。 At this time, while the variable flow valve 53 of the cooling mechanism 50 causes the refrigerant to flow through the refrigerant flow passage 32a at a fixed flow rate to absorb heat, the temperature controller 30 performs temperature control. That is, the temperature controller 30 can be used to perform sliding mode control in which the power input to the LED 41 as the heating source is used as the operating quantity, and the power input to the high-speed valve 54 as the cooling source (open/close signal of the high-speed valve) ) Temperature control due to cooling mode control as the operating quantity. At this time, the switching controller 73 will determine whether to directly use the output (control input) of the sliding mode controller 71 or use the non-linear term un1 as the high-speed valve 54 by using the value of the non-linear term un1 as described above. Open and close signals are used to control the cooling mode. Specifically, when the value of the non-linear term un1 of the sliding mode control is positive, the output of the sliding mode controller 71 is directly output to the LED 41 as the first operation variable. On the other hand, when the value of the non-linear term un1 is negative, the non-linear term un1 will be used as the opening and closing signal of the high-speed valve 54 and output to the high-speed valve as the second operating quantity.

在上述專利文獻1之檢查裝置中,於檢查電子元件的電氣特性時,為了再現該電子元件之實際裝設環境,便會藉由載置台內之冷媒流道或是加熱器來進行載置台之溫度控制。 In the inspection apparatus of Patent Document 1, when inspecting the electrical characteristics of electronic components, in order to reproduce the actual installation environment of the electronic components, the mounting table is performed by the refrigerant flow channel or heater in the mounting table. temperature control.

另一方面,近年來,由於電子元件會朝高速化及微細化發展,且集積度會變高,而使動作時之發熱增加非常多,故在晶圓中便有於電子元件之 檢查中,產生發熱干擾而讓電子元件產生不良狀況之虞。然而,上述專利文獻1中並未顯示出解除此般發熱干擾之方法。 On the other hand, in recent years, electronic components have been developing towards higher speed and miniaturization, and the degree of integration will become higher, which will increase the heat generation during operation. Therefore, they are used in electronic components on wafers. During the inspection, there is a risk of generating heat interference and causing bad conditions in the electronic components. However, the above-mentioned Patent Document 1 does not show a method to relieve such heating interference.

於是,本實施形態中,係在藉由冷卻機構50之可變流量閥53並以固定流量來讓冷媒流通於台座10之冷媒供給路32a而確保吸熱後,使用較能承受干擾之滑動模式控制,並將朝加熱機構40之LED41投入的功率(電流值)作為操作量來進行電子元件D之溫度控制。 Therefore, in this embodiment, after the variable flow valve 53 of the cooling mechanism 50 is used to allow the refrigerant to circulate through the refrigerant supply path 32a of the pedestal 10 at a fixed flow rate to ensure heat absorption, the sliding mode control that can withstand interference is used. , And use the power (current value) input to the LED 41 of the heating mechanism 40 as the operating quantity to control the temperature of the electronic component D.

然而,僅在固定冷媒流量,而將朝LED41投入的功率作為操作量的滑動模式控制中,於發熱干擾變得非常大的情況下,即便關閉LED41仍會使吸熱不夠充分。因此,便會產生干擾控制的反應變慢的情況或是無法充分進行溫度控制的情況。又,雖會考量增加冷媒流量來提高吸熱性,但在此情況下,LED41之輸出便會不夠而無法達到目標溫度。又,雖有可增加冷媒流量並藉由使用最大輸出較大的LED,或是增加LED的密度來抑制電子元件之溫度上升的情況,但在該情況下,會使成本增加而非為現實。 However, in the sliding mode control in which only the refrigerant flow rate is fixed and the power input to the LED 41 is used as the operation amount, when the heat generation interference becomes very large, even if the LED 41 is turned off, the heat absorption is insufficient. Therefore, there may be cases where the response to interference control becomes slow or the temperature cannot be fully controlled. In addition, although consideration will be given to increasing the refrigerant flow rate to improve heat absorption, in this case, the output of the LED 41 will be insufficient to reach the target temperature. In addition, although it is possible to increase the refrigerant flow rate and use LEDs with a larger maximum output or increase the density of LEDs to suppress the temperature rise of the electronic components, in this case, the cost will increase rather than being realistic.

於是,本實施形態中,便一邊藉由冷卻機構50之可變流量閥53,並以固定流量來使冷媒流通於冷媒流道32a而吸熱,一邊藉由非線性項un1之數值並以切換控制器7來切換實施將朝LED41投入的功率作為操作量之滑動模式控制,以及將朝高速閥54投入之功率(高速閥之開閉訊號)作為操作量的冷卻模式控制。亦即,在滑動模式控制之非線性項un1的數值為正之情況,由於發熱干擾之影響會較小,故會直接將滑動模式控制器71之輸出作為第1操作量而朝為加熱源之LED41投入。另一方面,在非線性項un1的數值為負之情況,便會將朝為冷卻源之高速閥54投入的功率(高速閥之開閉訊號)作為第2操作量來進行冷卻模式控制。亦即,在進行滑動模式控制時,於電子元件D之發熱干擾較大且滑動模式 控制之非線性項un1為負的情況,便會藉由切換控制器73來切換為冷卻模式控制。藉此,除了在關閉LED41的情況以外還可冷卻台座10,而使冷卻能力強化。從而,即便在有非常大的發熱干擾之情況下,仍可充分冷卻電子元件D之溫度,而可以良好的控制性來進行電子元件D之溫度控制。另外,從盡可能地減少無謂時間浪費的觀點看來,此時之高速閥54的位置最好是盡可能地靠近於台座10。 Therefore, in this embodiment, the variable flow valve 53 of the cooling mechanism 50 allows the refrigerant to flow through the refrigerant flow passage 32a at a fixed flow rate to absorb heat, and the value of the nonlinear term un1 is used to switch control The device 7 switches and implements the sliding mode control using the power input to the LED 41 as the operation amount, and the cooling mode control using the power input to the high-speed valve 54 (the opening and closing signal of the high-speed valve) as the operation amount. That is, when the value of the non-linear term un1 of the sliding mode control is positive, since the influence of the heating interference will be small, the output of the sliding mode controller 71 will be directly used as the first operating quantity and directed to the LED 41 as the heating source Invest. On the other hand, when the value of the non-linear term un1 is negative, the power input to the high-speed valve 54 as the cooling source (the opening/closing signal of the high-speed valve) is used as the second operation amount to perform the cooling mode control. That is, when the sliding mode control is performed, the heating interference of the electronic component D is large and the sliding mode When the non-linear term un1 of the control is negative, the switching controller 73 is used to switch to the cooling mode control. Thereby, in addition to the case where the LED 41 is turned off, the pedestal 10 can be cooled, and the cooling capacity can be enhanced. Therefore, even in the case of very large heating interference, the temperature of the electronic component D can be sufficiently cooled, and the temperature of the electronic component D can be controlled with good controllability. In addition, from the viewpoint of reducing unnecessary time wastage as much as possible, the position of the high-speed valve 54 at this time is preferably as close to the pedestal 10 as possible.

又,由於加熱機構40會以對應於複數之各電子元件D的方式來設置搭載有複數LED41之複數LED單元43,故可個別地加熱電子元件D。因此,便可僅加熱檢查中之電子元件D,而可抑制對其他電子元件D之發熱干擾。 In addition, since the heating mechanism 40 is provided with a plurality of LED units 43 equipped with a plurality of LEDs 41 in a manner corresponding to the plurality of electronic components D, the electronic components D can be individually heated. Therefore, only the electronic component D under inspection can be heated, and heating interference to other electronic components D can be suppressed.

進一步地,由於會使用高速閥54來進行冷卻模式控制,故可追隨作為切換訊號所使用的非線性項un1之正負變動來開閉高速閥54,而可以高精度來進行冷卻控制。 Furthermore, since the high-speed valve 54 is used for cooling mode control, the high-speed valve 54 can be opened and closed following the positive and negative changes of the non-linear term un1 used as the switching signal, and the cooling control can be performed with high accuracy.

又,由於可使用水來作為冷媒,故無需使用氟氯烷系冷媒,且吸熱性會較使用氟氯烷系冷媒的情況要良好,而可將吸熱高速化。 In addition, since water can be used as a refrigerant, there is no need to use a chlorofluorocarbon-based refrigerant, and the endothermic property is better than the case of using a chlorofluorocarbon-based refrigerant, and the endothermic heat can be accelerated.

另外,電子元件之檢查可將複數元件總括來加以進行,亦可以DRAM等所採用之總括接觸探測般將所有的電子元件總括來加以進行。不論在任一情況下,檢查對象之電子元件的溫度都可如上述般,藉由併用將LED41之功率作為操作量的滑動模式控制以及利用高速閥之開閉的冷卻模式控制來以良好的控制性進行電子元件之溫度控制。 In addition, the inspection of electronic components can be carried out collectively with a plurality of components, and can also be carried out collectively with all electronic components like the collective contact detection used in DRAM and the like. In either case, the temperature of the electronic components of the inspection object can be as described above. The sliding mode control that uses the power of the LED41 as the operating quantity and the cooling mode control that uses the opening and closing of the high-speed valve are used together to achieve good controllability. Temperature control of electronic components.

<第2實施形態> <Second Embodiment>

接著,便就第2實施形態來加以說明。 Next, the second embodiment will be described.

雖第2實施形態之檢查裝置的基本構成會與第1實施形態之檢查裝置1相同,但如下述圖13所示,僅在搭載有控制方式有所不同之溫度控制器30’來取代 被包含在第1實施形態的溫度控制裝置20之溫度控制器30的點上,來與第1實施形態之檢查裝置1有所不同。 Although the basic structure of the inspection device of the second embodiment is the same as that of the inspection device 1 of the first embodiment, as shown in FIG. 13 below, only a temperature controller 30' with a different control method is installed instead of The point included in the temperature controller 30 of the temperature control device 20 of the first embodiment is different from the inspection device 1 of the first embodiment.

在本實施形態之溫度控制器30’中,係與第1實施形態之溫度控制器30同樣,會基於電子元件D之溫度測量結果,來進行會基於將朝為加熱源之LED41投入的功率(電流值輸出)作為操作量的滑動模式控制之控制。又,溫度控制器30’中,係與第1實施形態之溫度控制器30同樣,除了滑動模式控制之外,還進行會將朝高速閥投入之功率(亦即高速閥之開閉訊號)作為操作量的冷卻模式控制。其中,本實施形態之溫度控制器30’係在冷卻模式時亦會將控制訊號傳送至為加熱源之LED41的點上來與溫度控制器30有所不同。 In the temperature controller 30' of the present embodiment, similar to the temperature controller 30 of the first embodiment, it is based on the temperature measurement result of the electronic component D, and it is based on the power applied to the LED 41 as the heating source ( Current value output) as the control of the sliding mode control of the operating quantity. In addition, the temperature controller 30' is the same as the temperature controller 30 of the first embodiment. In addition to the sliding mode control, the power input to the high-speed valve (that is, the opening and closing signal of the high-speed valve) is also used as an operation The amount of cooling mode control. Among them, the temperature controller 30' of this embodiment is different from the temperature controller 30 by transmitting the control signal to the LED 41 which is the heating source during the cooling mode.

以下,便就溫度控制器30’來詳細說明。 Hereinafter, the temperature controller 30' will be described in detail.

圖13係顯示溫度控制器30’之控制塊的圖式。溫度控制器30’係具有滑動模式控制器71、冷卻模式控制器72、加算器77、切換控制器73’以及廠模型74。滑動模式控制器71、冷卻模式控制器72、廠模型74之基本構成係與第1實施形態之溫度控制器30相同。 Fig. 13 is a diagram showing the control block of the temperature controller 30'. The temperature controller 30' has a sliding mode controller 71, a cooling mode controller 72, an adder 77, a switching controller 73' and a factory model 74. The basic configurations of the sliding mode controller 71, the cooling mode controller 72, and the factory model 74 are the same as the temperature controller 30 of the first embodiment.

圖14係顯示冷卻模式控制器72、加算器77及切換控制器73’之構成及該等訊號之收授的塊狀圖。 Fig. 14 is a block diagram showing the composition of the cooling mode controller 72, the adder 77 and the switching controller 73' and the reception and transmission of these signals.

如上述,冷卻模式控制器72係將朝為冷卻源之高速閥54投入之功率(高速閥54之開閉訊號)作為操作量來進行冷卻控制。藉此,來控制被供給至台座10之冷媒流道32a的冷媒之量,以將電子元件D進行溫度控制。冷卻模式控制器72之輸出係基於冷媒流量及吸熱係數並藉由吸熱模型來加以計算。雖圖14中係將吸熱係數表示為-20,但此不過是一範例,其數值係可根據電子元件D等而變化。 As described above, the cooling mode controller 72 performs cooling control by using the power input to the high-speed valve 54 as the cooling source (the opening/closing signal of the high-speed valve 54) as the operation amount. In this way, the amount of refrigerant supplied to the refrigerant flow passage 32a of the pedestal 10 is controlled to control the temperature of the electronic component D. The output of the cooling mode controller 72 is calculated by the heat absorption model based on the refrigerant flow rate and the heat absorption coefficient. Although the endothermic coefficient is represented as -20 in FIG. 14, this is just an example, and the value can vary depending on the electronic component D and the like.

切換控制器73’係與第1實施形態之切換控制器73同樣,會使用滑動模式控制器之非線性項un1的數值來作為切換訊號。然後,切換控制器73’係藉由非線性項un1的數值來決定是否直接使用滑動模式控制器71之輸出,或是使用第2操作量。切換控制器73’會使用以加算器77而將滑動模式輸出與冷卻模式控制器72之輸出相加者來作為第2操作量。亦即,第2操作量係將來自滑動模式控制器71之朝為加熱源的LED41之輸出以及冷卻模式控制器之為冷卻源的高速閥之輸出相加者。 The switching controller 73' is the same as the switching controller 73 of the first embodiment, and uses the value of the non-linear term un1 of the sliding mode controller as the switching signal. Then, the switching controller 73' uses the value of the non-linear term un1 to determine whether to directly use the output of the sliding mode controller 71 or use the second operating value. The switching controller 73' uses the adder 77 to add the output of the sliding mode and the output of the cooling mode controller 72 as the second operation amount. That is, the second operation amount is the sum of the output of the LED 41 from the sliding mode controller 71 as the heating source and the output of the high-speed valve from the cooling mode controller as the cooling source.

所謂直接使用滑動模式控制器71之輸出(控制輸入)係指將滑動模式控制器71之輸出作為第1操作量來輸出至為加熱源之LED41。 The so-called direct use of the output (control input) of the sliding mode controller 71 refers to outputting the output of the sliding mode controller 71 as the first operation quantity to the LED 41 as the heating source.

具體而言,切換控制器73’在非線性項un1的數值為正(切換相平面之一邊側;圖7之區域I)之情況,便會直接將滑動模式控制器71之輸出作為第1操作量來輸出至LED41。又,非線性項un1的數值為負(切換相平面之另邊側;圖7之區域II)之情況,便會將滑動模式控制器71之輸出與冷卻模式控制器72之為冷卻源的高速閥54之輸出(高速閥之開閉訊號)相加者作為第2操作量來使用。 Specifically, when the value of the non-linear term un1 is positive (one side of the switching phase plane; area I in Figure 7), the switching controller 73' will directly use the output of the sliding mode controller 71 as the first operation The amount is output to LED41. In addition, if the value of the non-linear term un1 is negative (the other side of the switching phase plane; area II in Figure 7), the output of the sliding mode controller 71 and the cooling mode controller 72 will be the high-speed cooling source. The sum of the output of the valve 54 (the opening and closing signal of the high-speed valve) is used as the second operation amount.

冷卻模式控制器72如上述,係使開閉時間為0.1sec以下的高速來動作的高速閥54會追隨非線性項un1所致之高速切換而加以開閉。藉此,便可在關閉LED41之情況之外,還可冷卻電子元件D,而可確保在有非常大之發熱干擾的情況下之電子元件D的溫度控制性。又,作為第2操作量,不僅有此般冷卻模式控制器72之高速閥的輸出,還可藉由相加有滑動模式控制器71之輸出,來緩和急速冷卻的過度反應而得到良好的控制性。 As described above, the cooling mode controller 72 opens and closes the high-speed valve 54 operating at a high speed with an opening and closing time of 0.1 sec or less following the high-speed switching caused by the nonlinear term un1. In this way, in addition to turning off the LED 41, the electronic component D can be cooled, and the temperature control of the electronic component D can be ensured in the case of very large heating interference. In addition, as the second operating quantity, not only the output of the high-speed valve of the cooling mode controller 72, but also the output of the sliding mode controller 71 can be added to alleviate the excessive reaction of rapid cooling and obtain good control. Sex.

本實施形態中,係與第1實施形態同樣,開始電子元件D之檢查。然後,在該檢查中,會基於檢查對象之電子元件D的電位差生成電路所生成的電 位差的資訊,來測量該電子元件D之溫度,而將該測量溫度作為目標溫度,並藉由溫度控制裝置20來進行該電子元件D之溫度控制。 In this embodiment, similar to the first embodiment, the inspection of the electronic component D is started. Then, in this inspection, the electricity generated by the circuit is generated based on the potential difference of the electronic component D to be inspected. The position difference information is used to measure the temperature of the electronic component D, and the measured temperature is used as the target temperature, and the temperature control device 20 controls the temperature of the electronic component D.

此時,會一邊藉由冷卻機構50之可變流量閥53,並以固定流量來使冷媒流通於冷媒流道32a而吸熱,一邊藉由溫度控制器30’來進行溫度控制。亦即,溫度控制器30’中,切換控制器73’便會藉由非線性項un1之數值來決定是否直接使用滑動模式控制器71之輸出,或是使用會將滑動模式輸出與冷卻模式控制器72之輸出相加的第2操作量。具體而言,在滑動模式控制之非線性項un1的數值為正之情況,便會直接將滑動模式控制器71之輸出作為第1操作量來輸出至LED41。另一方面,非線性項un1的數值為負之情況,便會將滑動模式控制器71之輸出與冷卻模式控制器72之為冷卻源的高速閥之輸出相加者作為第2操作量來加以輸出。 At this time, the variable flow valve 53 of the cooling mechanism 50 causes the refrigerant to flow through the refrigerant flow passage 32a at a fixed flow rate to absorb heat, and the temperature is controlled by the temperature controller 30'. That is, in the temperature controller 30', the switching controller 73' will use the value of the non-linear term un1 to determine whether to directly use the output of the sliding mode controller 71, or to use the output of the sliding mode and the cooling mode control The second operation amount of the addition of the output of the device 72. Specifically, when the value of the non-linear term un1 of the sliding mode control is positive, the output of the sliding mode controller 71 is directly output to the LED 41 as the first operation variable. On the other hand, when the value of the non-linear term un1 is negative, the sum of the output of the sliding mode controller 71 and the output of the high-speed valve that is the cooling source of the cooling mode controller 72 is added as the second operation amount Output.

上述第1實施形態中,冷卻模式控制器72會使開閉時間為0.1sec以下的高速來動作的高速閥54會追隨非線性項un1所致之高速切換而加以開閉。藉此,便可在關閉LED41之情況之外,還可冷卻電子元件D,而可確保在有非常大之發熱干擾的情況下之電子元件D的溫度控制性。 In the first embodiment described above, the cooling mode controller 72 causes the high-speed valve 54 operating at a high speed with an opening and closing time of 0.1 sec or less to open and close following the high-speed switching caused by the nonlinear term un1. In this way, in addition to turning off the LED 41, the electronic component D can be cooled, and the temperature control of the electronic component D can be ensured in the case of very large heating interference.

然而,第1實施形態中,雖控制性為良好,但在非線性項un1為負的情況,由於僅為高速閥54之動作,故會有急速冷卻的過度反應之情事。亦即,為了彌補藉由切換控制器73’來開啟高速閥54時之電子元件D的溫度下降,便需要加大LED41之輸出,又,亦會使進行接下來之冷卻的時間點(高速閥為開啟的時間點)提早。因此,在利用切換控制器73’來控制時,便會有電流值之振幅變大及高速閥54開啟的頻度變高的傾向。 However, in the first embodiment, although the controllability is good, when the non-linear term un1 is negative, since only the high-speed valve 54 is operated, the rapid cooling may be overreacted. That is, in order to compensate for the temperature drop of the electronic component D when the high-speed valve 54 is opened by the switching controller 73', the output of the LED 41 needs to be increased, and the time point for the subsequent cooling (high-speed valve To open the time point) earlier. Therefore, when the switching controller 73' is used for control, the amplitude of the current value will increase and the frequency of opening the high-speed valve 54 will increase.

相對於此,本實施形態中,作為非線性項un1為負之情況的第2操作量不僅是此般冷卻模式控制器72之高速閥的輸出,還加上滑動模式控制器71之輸出。如此般,由於在高速閥54之動作中亦會同時將控制訊號傳送至LED41,故可緩和急速冷卻之過度反應。因此,除了上述第1實施形態之基本效果之外,還可以降低電流值之振幅,且減少高速閥54之開啟頻度,而可達成振幅更小且更順暢的溫度控制之效果。 On the other hand, in the present embodiment, the second operation amount in the case where the non-linear term un1 is negative is not only the output of the high-speed valve of the cooling mode controller 72 but also the output of the sliding mode controller 71. In this way, since the control signal is also transmitted to the LED 41 during the operation of the high-speed valve 54, the excessive reaction of rapid cooling can be alleviated. Therefore, in addition to the basic effects of the first embodiment described above, the amplitude of the current value can be reduced, and the opening frequency of the high-speed valve 54 can be reduced, and the effect of smaller amplitude and smoother temperature control can be achieved.

另外,第2實施形態中,由於基本的檢查裝置之構成係與第1實施形態相同,故其他以第1實施形態所得到之效果亦可同樣地在第2實施形態獲得。 In addition, in the second embodiment, since the basic inspection device has the same configuration as the first embodiment, other effects obtained by the first embodiment can also be obtained in the second embodiment in the same manner.

<模擬結果> <Simulation results>

接著,便就模擬結果來加以說明。 Next, the simulation results will be explained.

在此,便就對形成在晶圓的30mm×40mm大小之電子元件(晶片),受到150W、300W、450W的發熱干擾所影響的情況下之溫度控制性來進行模擬。 Here, we will simulate the temperature controllability of electronic components (chips) with a size of 30mm×40mm formed on a wafer under the influence of thermal interference of 150W, 300W, and 450W.

圖15~17係顯示就供給固定流量之冷媒,並將朝LED投入之功率作為操作量,且藉由滑動模式控制來進行晶片之溫度控制的情況來進行模擬之結果的圖式。 Figures 15 to 17 are graphs showing the results of the simulation when a constant flow of refrigerant is supplied, the power input to the LED is used as the operating quantity, and the temperature of the chip is controlled by sliding mode control.

如圖15所示,在滑動模式控制的情況,雖在發熱干擾為150W下可維持良好的控制性,但如圖16、17所示,確認到在發熱干擾為300W、450W的情況,會觀察到溫度上升,而無法進行溫度控制之情事。 As shown in Figure 15, in the case of sliding mode control, although good controllability can be maintained at 150W heat interference, as shown in Figures 16 and 17, it is confirmed that when the heat interference is 300W, 450W, it will be observed When the temperature rises, the temperature cannot be controlled.

圖18~20係顯示就併用將朝LED投入之功率作為操作量的滑動模式控制與在非線性項un1為負時所進行之高速閥的開閉所致之冷卻模式控制的第1實施形態來進行模擬之結果的圖式。 Figures 18 to 20 show the first embodiment that uses both sliding mode control using the power input to the LED as the operating quantity and cooling mode control by opening and closing the high-speed valve when the non-linear term un1 is negative. Schema of the simulation result.

如該等圖所示,確認到藉由併用滑動模式控制與高速閥之開閉所致的冷卻模式控制之第1實施形態,受到150W~450W的發熱干擾所影響的情況下之任一者都可進行良好的溫度控制。 As shown in these figures, it was confirmed that the first embodiment of the cooling mode control by using the sliding mode control and the opening and closing of the high-speed valve together can be affected by the heat interference of 150W~450W. Perform good temperature control.

圖21~23係顯示就併用滑動模式控制以及在非線性項un1為負時所進行之將滑動模式控制器輸出與冷卻模式控制器輸出相加的控制之第2實施形態來進行模擬的結果之圖式。 Figures 21 to 23 show the results of the simulation of the second embodiment of the control that adds the output of the sliding mode controller and the output of the cooling mode controller when the non-linear term un1 is negative. figure.

如該等圖所示,確認到併用滑動模式控制以及將滑動模式控制器輸出與冷卻模式控制器輸出相加的控制之第2實施形態,便可在150W~450W的任一者之發熱干擾的情況下都能進行良好的溫度控制。又,得知相較於第1實施形態,第2實施形態在產生發熱干擾的情況下所供給之電流的振幅會較小。 As shown in the figure, it was confirmed that the second embodiment of the control that uses the sliding mode control together and the control that adds the output of the sliding mode controller and the output of the cooling mode controller can interfere with heat generation at any one of 150W to 450W. Under the circumstances, good temperature control can be carried out. In addition, it is found that the amplitude of the current supplied in the second embodiment is smaller in the case of heat disturbance than in the first embodiment.

圖24及圖25係分別將發熱干擾為150W時之第1實施形態及第2實施形態的模擬結果放大而顯示的圖式。由該等圖式看來,得知相較於第1實施形態,第2實施形態的電流輸出之振幅會較小,且控制振幅會較小。又,得知發熱干擾會急遽改變的時間點中之控制對象溫度的過衝或下衝亦在第2實施形態會較小。 FIGS. 24 and 25 are diagrams respectively showing the results of the simulation of the first embodiment and the second embodiment when the heat disturbance is 150W, and are displayed in an enlarged manner. From these diagrams, it can be seen that compared with the first embodiment, the amplitude of the current output in the second embodiment is smaller, and the control amplitude is smaller. In addition, the overshoot or undershoot of the control target temperature at the point in time when it is known that the heating disturbance will change rapidly is also smaller in the second embodiment.

圖26及圖27係分別將發熱干擾為300W時之第1實施形態及第2實施形態的模擬結果放大而顯示的圖式。又,圖28及圖29係分別將發熱干擾為450W時之第1實施形態及第2實施形態的模擬結果放大而顯示的圖式。如從該等圖便能了解般,得知即便干擾大至300W、450W,仍會與干擾為150W時同樣,相較於第1實施形態,第2實施形態的電流輸出之振幅會較小,且控制振幅會較小。又,得知發熱干擾會急遽改變的時間點中之控制對象溫度的過衝或下衝亦在第2實施形態會較小。 FIGS. 26 and 27 are diagrams respectively showing the results of the simulation of the first embodiment and the second embodiment when the heat interference is 300W, and are displayed in an enlarged manner. In addition, FIGS. 28 and 29 are respectively enlarged and displayed diagrams of the simulation results of the first embodiment and the second embodiment when the heat interference is 450W. As can be understood from these figures, even if the interference is as large as 300W or 450W, it will still be the same as when the interference is 150W. Compared with the first embodiment, the amplitude of the current output in the second embodiment will be smaller. And the control amplitude will be smaller. In addition, the overshoot or undershoot of the control target temperature at the point in time when it is known that the heating disturbance will change rapidly is also smaller in the second embodiment.

<其他適用> <Other applicable>

以上,雖已就實施形態來加以說明,但本次所揭露的實施形態在所有的點上應都只是例示而非為限制。上述實施形態係可不超出添附申請專利範圍及其主旨來以各種形態進行省略、置換、變更。 Although the embodiment has been described above, the embodiment disclosed this time should be an illustration in all points and not a limitation. The above-mentioned embodiments can be omitted, replaced, and changed in various forms without going beyond the scope of the attached patent application and the spirit thereof.

例如,上述實施形態中,雖已就使用LED來作為加熱源之情況來加以說明,但加熱源並不限於LED,亦可為阻抗加熱器等的其他加熱源。又,雖上述實施形態中,作為溫度控制對象係以晶圓上之電子元件(晶片)為例來加以表示,但溫度控制對象亦可為台座,而不限於電子元件(晶片)。又,亦不限於將溫度控制裝置適用在檢查裝置之情況。 For example, in the above-mentioned embodiment, although the case where an LED is used as a heating source has been described, the heating source is not limited to an LED, and other heating sources such as impedance heaters may be used. In addition, although in the above-mentioned embodiment, the electronic component (chip) on the wafer is shown as an example of the temperature control target, the temperature control target may also be a pedestal and is not limited to the electronic component (chip). Moreover, it is not limited to the case where the temperature control device is applied to the inspection device.

30:溫度控制器 30: temperature controller

71:滑動模式控制器 71: Sliding Mode Controller

72:冷卻模式控制器 72: Cooling mode controller

73:切換控制器 73: Switch controller

74:廠模型 74: Factory model

x:溫度檢出訊號 x: temperature detection signal

u:控制輸入 u: control input

σ:切換函數 σ: switching function

Claims (19)

一種溫度控制裝置,係進行溫度控制對象物之溫度控制的溫度控制裝置;具備: A temperature control device, which is a temperature control device that performs temperature control of a temperature control object; equipped with: 加熱機構,係具有會加熱該溫度控制對象物之加熱源; The heating mechanism has a heating source that can heat the temperature control object; 冷卻機構,係具有會冷卻該溫度控制對象物之冷卻源;以及 The cooling mechanism has a cooling source capable of cooling the temperature control object; and 溫度控制器,係控制該加熱源與該冷卻源; The temperature controller controls the heating source and the cooling source; 該溫度控制器係以該溫度控制對象物之溫度測量值為控制對象,並具有: The temperature controller takes the temperature measurement of the temperature control object as the control object, and has: 滑動模式(sliding mode)控制器,係將朝該加熱源投入之功率作為操作量; Sliding mode (sliding mode) controller, the power input to the heating source as the operating quantity; 冷卻模式控制器,係將朝該冷卻源投入之功率作為操作量;以及 The cooling mode controller uses the power input to the cooling source as the operating quantity; and 切換控制器,係在為滑動模式控制器之輸出的線性項與非線性項中,藉由該非線性項之數值來決定是否直接將該滑動模式控制器之輸出作為第1操作量而輸出至該加熱源,或是不使用該滑動模式控制器之輸出,而將該冷卻模式控制器之輸出作為第2操作量來加以使用。 The switching controller is the linear term and the nonlinear term of the output of the sliding mode controller. The value of the nonlinear term determines whether to directly output the output of the sliding mode controller as the first operating variable. The heating source, or the output of the sliding mode controller is not used, and the output of the cooling mode controller is used as the second operation quantity. 一種溫度控制裝置,係進行溫度控制對象物之溫度控制的溫度控制裝置;具備: A temperature control device, which is a temperature control device that performs temperature control of a temperature control object; equipped with: 加熱機構,係具有會加熱該溫度控制對象物之加熱源; The heating mechanism has a heating source that can heat the temperature control object; 冷卻機構,係具有會冷卻該溫度控制對象物之冷卻源;以及 The cooling mechanism has a cooling source capable of cooling the temperature control object; and 溫度控制器,係控制該加熱源與該冷卻源; The temperature controller controls the heating source and the cooling source; 該溫度控制器係以該溫度控制對象物之溫度測量值為控制對象,並具有: The temperature controller takes the temperature measurement of the temperature control object as the control object, and has: 滑動模式(sliding mode)控制器,係將朝該加熱源投入之功率作為操作量; Sliding mode (sliding mode) controller, the power input to the heating source as the operating quantity; 冷卻模式控制器,係將朝該冷卻源投入之功率作為操作量;以及 The cooling mode controller uses the power input to the cooling source as the operating quantity; and 切換控制器,係在為滑動模式控制器之輸出的線性項與非線性項中,藉由該非線性項之數值來決定是否直接將該滑動模式控制器之輸出作為第1操作量而輸出至該加熱源,或是將該滑動模式控制器之輸出與該冷卻模式控制器之輸出相加者作為第2操作量來加以使用。 The switching controller is the linear term and the nonlinear term of the output of the sliding mode controller. The value of the nonlinear term determines whether to directly output the output of the sliding mode controller as the first operating variable. The heating source or the sum of the output of the sliding mode controller and the output of the cooling mode controller is used as the second operation quantity. 如申請專利範圍第1或2項之溫度控制裝置,其中該切換控制器係以在該非線性項位在滑動模式控制下的切換相平面的一邊側之區域的情況,便僅使用該滑動模式控制器之輸出,而位在該切換相平面的另邊側之區域的情況,則使用該冷卻模式控制器之輸出的方式來加以切換。 For example, the temperature control device of item 1 or 2 of the scope of patent application, wherein the switching controller is to use only the sliding mode control when the nonlinear term is in the area on one side of the switching phase plane under sliding mode control If the output of the cooling device is located in the area on the other side of the switching phase plane, the output of the cooling mode controller is used to switch. 如申請專利範圍第3項之溫度控制裝置,其中該一邊側的區域係該非線性項之數值為正的區域,該另邊側的區域則為該非線性項之數值為負的區域。 For example, in the temperature control device of item 3 of the scope of patent application, the area on one side is the area where the value of the nonlinear term is positive, and the area on the other side is the area where the value of the nonlinear term is negative. 如申請專利範圍第1至4項中任一項之溫度控制裝置,其中該加熱源係LED,該第1操作量係投入至LED的電流值。 For example, the temperature control device of any one of items 1 to 4 in the scope of patent application, wherein the heating source is an LED, and the first operation quantity is the current value input to the LED. 如申請專利範圍第1至5項中任一項之溫度控制裝置,其中該冷卻機構係藉由冷媒來冷卻該溫度控制對象物,該冷卻源係開閉冷媒之流道的高速閥,該冷卻模式控制器之輸出係朝該高速閥之開閉訊號。 For example, the temperature control device of any one of items 1 to 5 in the scope of patent application, wherein the cooling mechanism cools the temperature control object by a refrigerant, the cooling source is a high-speed valve that opens and closes the flow path of the refrigerant, and the cooling mode The output of the controller is the opening and closing signal to the high-speed valve. 如申請專利範圍第1至6項中任一項之溫度控制裝置,其中該冷卻機構係不同於該冷卻模式控制器會朝該冷卻源投入之功率而以既定流量來供給該冷媒,以進行該溫度控制對象物之吸熱。 For example, the temperature control device of any one of items 1 to 6 in the scope of the patent application, wherein the cooling mechanism is different from the power input to the cooling source by the cooling mode controller and supplies the refrigerant at a predetermined flow rate to perform the The heat absorption of the temperature control object. 如申請專利範圍第1至7項中任一項之溫度控制裝置,其中該溫度控制對象物係設置於基板之電子元件。 For example, the temperature control device of any one of items 1 to 7 in the scope of the patent application, wherein the temperature control object is an electronic component provided on a substrate. 一種溫度控制方法,係進行溫度控制對象物之溫度控制的溫度控制方法,其會以該溫度控制對象物之溫度測量值為控制對象,並具有: A temperature control method is a temperature control method for temperature control of a temperature control object, which takes the temperature measurement of the temperature control object as the control object, and has: 將朝加熱該溫度控制對象物之加熱源投入的功率作為操作量來進行滑動模式控制(sliding mode)之工序; The process of sliding mode control (sliding mode) is performed using the power input to the heating source for heating the temperature control object as the operation amount; 將朝冷卻該溫度控制對象物之冷卻源投入的功率作為操作量來進行冷卻模式控制之工序;以及 The process of performing cooling mode control using the power input to the cooling source for cooling the temperature control object as the operation amount; and 在為該滑動模式控制之輸出的線性項與非線性項中,藉由該非線性項之數值來決定是否直接將該滑動模式控制之輸出作為第1操作量而輸出至該加熱源,或是不使用該滑動模式控制之輸出,而將該冷卻模式控制之輸出作為第2操作量來加以使用。 In the linear term and nonlinear term of the output of the sliding mode control, the value of the nonlinear term is used to determine whether to directly output the output of the sliding mode control as the first operating quantity to the heating source, or not The output of the sliding mode control is used, and the output of the cooling mode control is used as the second operation amount. 一種溫度控制方法,係進行溫度控制對象物之溫度控制的溫度控制方法,其會以該溫度控制對象物之溫度測量值為控制對象,並具有: A temperature control method is a temperature control method for temperature control of a temperature control object, which takes the temperature measurement of the temperature control object as the control object, and has: 將朝加熱該溫度控制對象物之加熱源投入的功率作為操作量來進行滑動模式控制(sliding mode)之工序; The process of sliding mode control (sliding mode) is performed using the power input to the heating source for heating the temperature control object as the operation amount; 併用該滑動模式控制以及會將朝冷卻該溫度控制對象物之冷卻源投入的功率作為操作量的冷卻模式控制之工序;以及 Combining the sliding mode control and the cooling mode control process in which the power input to the cooling source for cooling the temperature control object is used as the operation amount; and 在為該滑動模式控制之輸出的線性項與非線性項中,藉由該非線性項之數值來決定是否直接將該滑動模式控制之輸出作為第1操作量而輸出至該加熱源,或是將該滑動模式控制之輸出與該冷卻模式控制之輸出相加者作為第2操作量來加以使用之工序。 In the linear term and nonlinear term of the output of the sliding mode control, the value of the nonlinear term is used to determine whether to directly output the output of the sliding mode control as the first operating quantity to the heating source, or to The addition of the output of the sliding mode control and the output of the cooling mode control is used as a second operation amount. 如申請專利範圍第9或10項之溫度控制方法,其中該決定工序係以該非線性項在滑動模式控制下之切換相平面的一邊側之區域的情況,僅使 用該滑動模式控制,而位在該切換相平面的另邊側之區域的情況,則使用該冷卻模式控制之輸出的方式來加以切換。 For example, the temperature control method of item 9 or 10 in the scope of the patent application, wherein the determination process is based on the non-linear term in the region on one side of the switching phase plane under sliding mode control, only using If the sliding mode is used for control, and the area on the other side of the switching phase plane is used, the output of the cooling mode control is used for switching. 如申請專利範圍第11項之溫度控制方法,其中該一邊側的區域係該非線性項之數值為正的區域,該另邊側的區域則為該非線性項之數值為負的區域。 For example, the temperature control method of item 11 in the scope of patent application, wherein the area on one side is the area where the value of the nonlinear term is positive, and the area on the other side is the area where the value of the nonlinear term is negative. 如申請專利範圍第9至12項中任一項之溫度控制方法,其中該加熱源係LED,該第1操作量係投入至LED的電流值。 For example, the temperature control method of any one of items 9 to 12 in the scope of patent application, wherein the heating source is an LED, and the first operation quantity is the current value input to the LED. 如申請專利範圍第9至13項中任一項之溫度控制方法,其中該冷卻源係開閉會冷卻該溫度控制對象物的冷媒之流道的高速閥,該冷卻模式控制之操作量係朝該高速閥之開閉訊號。 For example, the temperature control method of any one of items 9 to 13 in the scope of patent application, wherein the cooling source is a high-speed valve that opens and closes the flow path of the refrigerant that cools the temperature control object, and the operation amount of the cooling mode control is directed toward the High-speed valve opening and closing signal. 如申請專利範圍第9至14項中任一項之溫度控制方法,其係不同於該冷卻模式控制之操作量而以既定流量來供給該冷媒,以進行該溫度控制對象物之吸熱。 For example, the temperature control method of any one of items 9 to 14 in the scope of the patent application is different from the operating volume of the cooling mode control and supplies the refrigerant at a predetermined flow rate to absorb heat of the temperature control object. 如申請專利範圍第9至15項中任一項之溫度控制方法,其中該溫度控制對象物係設置於基板之電子元件。 For example, the temperature control method of any one of items 9 to 15 in the scope of the patent application, wherein the temperature control object is an electronic component provided on a substrate. 一種檢查裝置,係具備: An inspection device with: 台座,係載置設置有電子元件之基板; The pedestal is a substrate on which electronic components are placed; 檢查機構,係讓探針電氣接觸於設置於該台座上之基板的該電子元件,以檢查該電子元件; The inspection mechanism is to make the probe electrically contact the electronic component of the substrate set on the pedestal to inspect the electronic component; 溫度測量部,係測量該電子元件之溫度;以及 The temperature measuring part measures the temperature of the electronic component; and 溫控制控制裝置,係進行該電子元件之溫度控制; Temperature control control device, which controls the temperature of the electronic component; 該溫度控制裝置係具備: The temperature control device is equipped with: 加熱機構,係具有會加熱該電子元件之加熱源; The heating mechanism has a heating source that can heat the electronic component; 冷卻機構,係具有會冷卻該電子元件之冷卻源;以及 The cooling mechanism has a cooling source capable of cooling the electronic component; and 溫度控制器,係控制該加熱源與該冷卻源; The temperature controller controls the heating source and the cooling source; 該溫度控制器係以該電子元件之溫度測量值為控制對象,並具有: The temperature controller takes the temperature measurement of the electronic component as the control object, and has: 滑動模式(sliding mode)控制器,係將朝該加熱源投入之功率作為操作量; Sliding mode (sliding mode) controller, the power input to the heating source as the operating quantity; 冷卻模式控制器,係將朝該冷卻源投入之功率作為操作量;以及 The cooling mode controller uses the power input to the cooling source as the operating quantity; and 切換控制器,係在為該滑動模式控制器之輸出的線性項與非線性項中,藉由該非線性項之數值來決定是否直接將該滑動模式控制器之輸出作為第1操作量而輸出至該加熱源,或是不使用該滑動模式控制器之輸出,而將該冷卻模式控制器之輸出作為第2操作量來加以使用。 The switching controller is in the linear term and the nonlinear term of the output of the sliding mode controller. The value of the nonlinear term determines whether to directly output the output of the sliding mode controller as the first operating variable. The heating source or the output of the sliding mode controller is not used, and the output of the cooling mode controller is used as the second operation quantity. 一種檢查裝置,係具備: An inspection device with: 台座,係載置設置有電子元件之基板; The pedestal is a substrate on which electronic components are placed; 檢查機構,係讓探針電氣接觸於設置於該台座上之基板的該電子元件,以檢查該電子元件; The inspection mechanism is to make the probe electrically contact the electronic component of the substrate set on the pedestal to inspect the electronic component; 溫度測量部,係測量該電子元件之溫度;以及 The temperature measuring part measures the temperature of the electronic component; and 溫控制控制裝置,係進行該電子元件之溫度控制; Temperature control control device, which controls the temperature of the electronic component; 該溫度控制裝置係具備: The temperature control device is equipped with: 加熱機構,係具有會加熱該電子元件之加熱源; The heating mechanism has a heating source that can heat the electronic component; 冷卻機構,係具有會冷卻該電子元件之冷卻源;以及 The cooling mechanism has a cooling source capable of cooling the electronic component; and 溫度控制器,係控制該加熱源與該冷卻源; The temperature controller controls the heating source and the cooling source; 該溫度控制器係以該電子元件之溫度測量值為控制對象,並具有: The temperature controller takes the temperature measurement of the electronic component as the control object, and has: 滑動模式(sliding mode)控制器,係將朝該加熱源投入之功率作為操作量; Sliding mode (sliding mode) controller, the power input to the heating source as the operating quantity; 冷卻模式控制器,係將朝該冷卻源投入之功率作為操作量;以及 The cooling mode controller uses the power input to the cooling source as the operating quantity; and 切換控制器,係在為該滑動模式控制器之輸出的線性項與非線性項中,藉由該非線性項之數值來決定是否直接將該滑動模式控制器之輸出作為第1操作量而輸出至該加熱源,或是將該滑動模式控制器之輸出與該冷卻模式控制器之輸出相加者作為第2操作量來加以使用。 The switching controller is in the linear term and the nonlinear term of the output of the sliding mode controller. The value of the nonlinear term determines whether to directly output the output of the sliding mode controller as the first operating variable. The heating source or the sum of the output of the sliding mode controller and the output of the cooling mode controller is used as the second operation quantity. 一種檢查裝置,係具備: An inspection device with: 台座,係載置設置有電子元件之基板; The pedestal is a substrate on which electronic components are placed; 檢查機構,係讓探針電氣接觸於設置於該台座上之基板的該電子元件,以檢查該電子元件; The inspection mechanism is to make the probe electrically contact the electronic component of the substrate set on the pedestal to inspect the electronic component; 溫度測量部,係測量該電子元件之溫度;以及 The temperature measuring part measures the temperature of the electronic component; and 溫控制控制裝置,係進行該電子元件之溫度控制; Temperature control control device, which controls the temperature of the electronic component; 該溫度控制裝置係具備: The temperature control device is equipped with: 加熱機構,係具有會加熱該電子元件之加熱源; The heating mechanism has a heating source that can heat the electronic component; 冷卻機構,係具有會冷卻該電子元件之冷卻源;以及 The cooling mechanism has a cooling source capable of cooling the electronic component; and 溫度控制器,係控制該加熱源與該冷卻源; The temperature controller controls the heating source and the cooling source; 該冷卻機構係具有: The cooling mechanism has: 冷媒源,係供給作為該冷卻源之冷媒; The refrigerant source is the refrigerant supplied as the cooling source; 第1冷媒配管,係連接於該冷媒源與該台座,而從該冷媒源以既定量來將該冷媒供給至該台座; The first refrigerant piping is connected to the refrigerant source and the pedestal, and the refrigerant is supplied to the pedestal in a predetermined amount from the refrigerant source; 第2冷媒配管,係與該第1冷媒配管並列設置,而從該冷媒源來將該冷媒供給至該台座;以及 The second refrigerant pipe is arranged in parallel with the first refrigerant pipe, and the refrigerant is supplied to the base from the refrigerant source; and 高速閥,係被設置於該第2冷媒配管,而朝該台座進行該冷媒之供給/停止。 The high-speed valve is installed in the second refrigerant pipe, and supplies/stops the refrigerant toward the base.
TW108142080A 2018-11-29 2019-11-20 Temperature control device, temperature control method and electronic component inspection device TWI840451B (en)

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