TW202032875A - Semiconductor laser light source device used to increase light output while suppressing expansion of the device scale - Google Patents

Semiconductor laser light source device used to increase light output while suppressing expansion of the device scale Download PDF

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TW202032875A
TW202032875A TW108148514A TW108148514A TW202032875A TW 202032875 A TW202032875 A TW 202032875A TW 108148514 A TW108148514 A TW 108148514A TW 108148514 A TW108148514 A TW 108148514A TW 202032875 A TW202032875 A TW 202032875A
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semiconductor laser
light
lens
focal point
optical system
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TW108148514A
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Chinese (zh)
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山田裕貴
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日商牛尾電機股份有限公司
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details
    • G03B21/20Lamp housings
    • G03B21/2006Lamp housings characterised by the light source
    • G03B21/2013Plural light sources
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details
    • G03B21/20Lamp housings
    • G03B21/2006Lamp housings characterised by the light source
    • G03B21/2033LED or laser light sources
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details
    • G03B21/20Lamp housings
    • G03B21/2053Intensity control of illuminating light
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/0604Arrangements for controlling the laser output parameters, e.g. by operating on the active medium comprising a non-linear region, e.g. generating harmonics of the laser frequency
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/40Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4018Lasers electrically in series

Abstract

This invention provides a semiconductor laser light source device in which a plurality of semiconductor laser elements are used to increase light output while suppressing the expansion of the device scale. A semiconductor laser light source device is equipped with: a plurality of semiconductor laser elements formed on an upper layer of a surface of a heat dissipation sheet and having a light emitting region, and a refracting optical system for a bundle of light rays emitted from the light emitting region incident changing a traveling direction and emitting. At least two semiconductor laser elements are configured as inclined to each other when viewed from a first direction orthogonal to the surface of the heat dissipation sheet, so that the main rays of the bundle of light rays emitted from the respective light emitting region of each semiconductor laser element are non-parallel to each other. The refracting optical system is composed of an optical system that a first focal point and a second focal point can displace in the optical axis direction. The first focal point is the focal point on a first plane of the first direction and the optical axis direction of the refracting optical system. The second focal point is the focal point on a second plane of the optical axis direction and a second direction orthogonal to the first direction.

Description

半導體雷射光源裝置Semiconductor laser light source device

本發明,關於半導體雷射光源裝置,特別是關於具有複數個半導體雷射元件的半導體雷射裝置。The present invention relates to a semiconductor laser light source device, and particularly relates to a semiconductor laser device having a plurality of semiconductor laser elements.

作為投影機用的光源,是進展為利用半導體雷射元件。近年來,如上述般將半導體雷射元件作為光源來使用,且市場更進一步期待能提高光輸出的光源裝置。As a light source for projectors, semiconductor laser elements have been developed. In recent years, semiconductor laser elements have been used as light sources as described above, and the market has further expected a light source device capable of improving light output.

為了提高光源側的光輸出,有考慮到將從複數個半導體雷射元件射出的光予以聚光的方法。但是,半導體雷射元件存在一定的寬度,將該等予以密接配置會有所極限。也就是說,若只是配置複數個半導體雷射元件的話,會導致光源裝置的大型化。In order to increase the light output on the light source side, a method of concentrating the light emitted from a plurality of semiconductor laser elements is considered. However, semiconductor laser elements have a certain width, and there is a limit to placing them in close contact. In other words, if only a plurality of semiconductor laser elements are arranged, the light source device will increase in size.

就該觀點來看,例如下述專利文獻1那般,存在有:在第一區域配置半導體雷射元件群,在與第一區域不同的第二區域配置其他的半導體雷射元件群,將從兩半導體雷射元件群射出的光,使用由狹長鏡所成的光合成手段來合成的技術。藉由該方法,與僅在相同部位並排複數個半導體雷射元件的情況相較之下,可縮小配置面積並提高光強度。 [先前技術文獻] [專利文獻]From this point of view, for example, as in the following Patent Document 1, there is a group of semiconductor laser elements arranged in a first area, and another group of semiconductor laser elements are arranged in a second area different from the first area. The light emitted by the two semiconductor laser element groups is synthesized using a light synthesis method formed by a long and narrow mirror. With this method, compared with the case where a plurality of semiconductor laser elements are arranged side by side only at the same part, the arrangement area can be reduced and the light intensity can be increased. [Prior Technical Literature] [Patent Literature]

[專利文獻1]日本特開2017-215570號公報[Patent Document 1] JP 2017-215570 A

[發明所欲解決之問題][The problem to be solved by the invention]

但是,作為提高光源側之光強度的方法,已知有使用複數具備半導體雷射元件的光源模組的方法。根據該構造,因應半導體雷射元件的設置數量,而複數具備有射出雷射光的區域(光射出區域:以下有時稱為「射極」)。本發明者,利用這種光源模組,來檢討提高光強度,但發現存在有以下的課題。However, as a method of increasing the light intensity on the light source side, a method of using a plurality of light source modules provided with semiconductor laser elements is known. According to this structure, in accordance with the number of semiconductor laser elements installed, a plurality of regions (light emitting regions: sometimes referred to as "emitters") emitting laser light are provided. The inventors of the present invention used this light source module to review and improve the light intensity, but found that there are the following problems.

圖1A,是將具備一個射極的半導體雷射元件的構造予以示意表示的立體圖。這種半導體雷射元件,有時被稱為「單射極型」。又,在圖1A,針對從射極射出的光(雷射光)的光線束,亦為示意圖示。又,在本說明書,是將從單一射極射出之形成束狀的光線群稱為「光線束」,將從射極中心射出的光線稱為「主光線」。Fig. 1A is a perspective view schematically showing the structure of a semiconductor laser element provided with one emitter. This kind of semiconductor laser element is sometimes called "single emitter type". In addition, in FIG. 1A, the beam of light (laser light) emitted from the emitter is also schematically shown. In addition, in this specification, the beam-shaped group of light rays emitted from a single emitter is called "ray beam", and the light rays emitted from the center of the emitter are called "primary rays".

如圖1A所示般,所謂的「端面發光型」之半導體雷射元件100的情況,已知從射極101射出的光線束101L,是顯示成橢圓錐型。在本說明書,與光軸(圖1A所示的Z方向)正交的2方向(X方向及Y方向)之中,將光線束101L之發散角較大的方向(圖1A所示的Y方向)稱為「快軸方向」,將光線束101L之發散角較小的方向(圖1A所示的X方向)稱為「慢軸方向」。又,「快軸」有時被稱為「Fast軸」,同樣地,「慢軸」有時被稱為「Slow軸」。As shown in FIG. 1A, in the case of a so-called "end-emitting type" semiconductor laser element 100, it is known that the light beam 101L emitted from the emitter 101 is displayed in an elliptical cone shape. In this specification, among the two directions (X direction and Y direction) orthogonal to the optical axis (Z direction shown in FIG. 1A), the direction where the divergence angle of the light beam 101L is larger (Y direction shown in FIG. 1A) ) Is called the "fast axis direction", and the direction in which the divergence angle of the light beam 101L is small (the X direction shown in FIG. 1A) is called the "slow axis direction". Also, the "fast axis" is sometimes called the "Fast axis", and similarly, the "slow axis" is sometimes called the "Slow axis".

圖1B,是分別示意圖示出將光線束101L從X方向觀看的情況與從Y方向觀看的情況。如圖1B所示般,快軸方向之光線束101L的發散角θy較大,慢軸方向之光線束101L的發散角θx較小。FIG. 1B is a schematic diagram showing the case when the light beam 101L is viewed from the X direction and the case when viewed from the Y direction. As shown in FIG. 1B, the divergence angle θy of the light beam 101L in the fast axis direction is larger, and the divergence angle θx of the light beam 101L in the slow axis direction is smaller.

又,在圖1B,僅畫出從射極101的上端及下端射出的光線,這種描繪方法,亦適用於以下的圖式。且,在以下的各圖,為了方便說明,有將光線束(光線束101L等)的發散角圖示成比實際還誇大的情況。In addition, in FIG. 1B, only the light rays emitted from the upper and lower ends of the emitter 101 are drawn. This drawing method is also applicable to the following drawings. In addition, in the following figures, for convenience of description, the divergence angle of the light beam (light beam 101L, etc.) may be shown to be exaggerated than the actual one.

複數配置半導體雷射元件100,將從各半導體雷射元件100射出的光(光線束101L)予以聚光來利用的情況,就抑制光學構件之尺寸的觀點來看,一般是使各光線束101L平行光化之後,藉由透鏡來聚光。具體來說,是在半導體雷射元件100的後段配置準直鏡(亦稱為「準直透鏡」),來進行各光線束101L之發散角的縮小。When a plurality of semiconductor laser elements 100 are arranged and the light (beam 101L) emitted from each semiconductor laser element 100 is condensed and used, from the viewpoint of reducing the size of the optical member, generally the light beam 101L After the parallel light is converted, the light is collected by a lens. Specifically, a collimator lens (also referred to as a "collimating lens") is arranged at the rear of the semiconductor laser element 100 to reduce the divergence angle of each light beam 101L.

圖2A,是在半導體雷射元件100的後段配置準直鏡102的情況時,將於YZ平面方向行進的光線束予以示意表示的圖。2A is a diagram schematically showing the beam of light traveling in the YZ plane direction when the collimator lens 102 is arranged at the rear stage of the semiconductor laser element 100.

根據圖2A,光線束101L,在通過準直鏡102之後,成為在快軸方向(Y方向)實質的平行光線束(以下稱為「大致平行光線束」)。又,在本說明書中,「實質的平行光線束」或「大致平行光線束」,是指發散角小於4˚的光線束。又,在圖2A以下的各圖中,有將大致平行光線束作為完全平行光線束來圖示的情況。According to FIG. 2A, the light beam 101L becomes a substantially parallel light beam (hereinafter referred to as "substantially parallel light beam") in the fast axis direction (Y direction) after passing through the collimator lens 102. In addition, in this specification, "substantially parallel light beam" or "substantially parallel light beam" refers to a light beam with a divergence angle of less than 4˚. In addition, in each of the following figures of FIG. 2A, there are cases where a substantially parallel light beam is illustrated as a completely parallel light beam.

圖2B,是在半導體雷射元件100的後段配置準直鏡102的情況時,將於XZ平面方向行進的光線束予以示意表示的圖。根據圖2B,光線束101L,在通過準直鏡102之後,亦在慢軸方向(X方向)成為大致平行光線束。2B is a diagram schematically showing the beam of light traveling in the XZ plane direction when the collimator lens 102 is arranged at the rear stage of the semiconductor laser element 100. According to FIG. 2B, after passing through the collimator lens 102, the light beam 101L also becomes a substantially parallel light beam in the slow axis direction (X direction).

圖3A,是將複數具備圖1A所示之半導體雷射元件100的光源模組的構造予以示意圖示者。如圖3A所示般,光源模組120,具備輔助座121,在該輔助座121之面的上層,具備複數個半導體雷射元件(100、110)。從Z方向(光軸方向)觀看時,例如圖3B所示般,使各射極(101、111)鄰接配置。又,在圖3A,為了方便圖示,將各射極(101、111)之X方向的距離誇大地顯示。FIG. 3A schematically illustrates the structure of a plurality of light source modules including the semiconductor laser element 100 shown in FIG. 1A. As shown in FIG. 3A, the light source module 120 has an auxiliary base 121, and a plurality of semiconductor laser elements (100, 110) are provided on the upper layer of the auxiliary base 121. When viewed in the Z direction (optical axis direction), for example, as shown in FIG. 3B, the emitters (101, 111) are arranged adjacent to each other. In addition, in FIG. 3A, for convenience of illustration, the X-direction distance of each emitter (101, 111) is exaggeratedly displayed.

圖4,是如同圖1B那般,分別示意圖示出將從圖3A所示之光源模組120所搭載之各射極(101、111)射出的光線束(101L、111L)從X方向觀看的情況與從Y方向觀看的情況。又,在圖4,為了方便圖式,關於從X方向觀看的圖,僅顯示射極(101、111)。Fig. 4 is the same as Fig. 1B, respectively showing the light beams (101L, 111L) emitted from each emitter (101, 111) mounted on the light source module 120 shown in Fig. 3A as viewed from the X direction The situation is the same as that viewed from the Y direction. In addition, in Fig. 4, for the convenience of the drawing, only the emitters (101, 111) are shown in the figure viewed from the X direction.

如圖3A及圖3B所示般,各半導體雷射元件(100、110),是使射極(101、111)的面在X方向並排配列。亦即,各射極(101、111),是在Y方向的同個座標位置處形成,從X方向觀看的情況時,光線束(101L、111L)是完全重疊。另一方面,各射極(101、111),是在X方向的不同座標位置處形成,從Y方向觀看時,光線束(101L、111L)各自的位置是錯開顯示。As shown in FIG. 3A and FIG. 3B, the semiconductor laser elements (100, 110) are arranged so that the faces of the emitters (101, 111) are arranged side by side in the X direction. That is, the emitters (101, 111) are formed at the same coordinate position in the Y direction, and when viewed from the X direction, the light beams (101L, 111L) completely overlap. On the other hand, the emitters (101, 111) are formed at different coordinate positions in the X direction, and when viewed from the Y direction, the respective positions of the light beams (101L, 111L) are displayed staggered.

在圖3A所圖示之光源模組120的後段,與圖2A及圖2B同樣地針對配置準直鏡102的情況之光線束的態樣進行檢討。參照圖4而如上述般,從X方向觀看時光線束(101L、111L)會完全重疊。因此,在快軸方向(Y方向),各光線束(101L、111L)通過準直鏡102之後,會與圖2A同樣地成為大致平行光線束。In the latter part of the light source module 120 illustrated in FIG. 3A, similarly to FIGS. 2A and 2B, the state of the light beam when the collimator lens 102 is arranged is reviewed. Referring to FIG. 4, as described above, the light beams (101L, 111L) completely overlap when viewed from the X direction. Therefore, in the fast axis direction (Y direction), after each light beam (101L, 111L) passes through the collimator lens 102, it becomes a substantially parallel light beam like FIG. 2A.

圖5,是在光源模組120的後段配置準直鏡102的情況時,將於XZ平面方向行進的光線束予以示意表示的圖。又,為了方便圖式,將光源模組120所具備之各半導體雷射元件(100、110)的大小予以部分縮小化來圖示。FIG. 5 is a diagram schematically showing the light beam traveling in the XZ plane direction when the collimator lens 102 is arranged at the rear of the light source module 120. In addition, in order to facilitate the drawing, the size of each semiconductor laser element (100, 110) included in the light source module 120 is partially reduced for illustration.

如上述般,光源模組120,具備複數個半導體雷射元件(100、110),各個射極(101、111),是在X方向分離配置。因此,準直鏡102之中心位置的X座標與各射極(101、111)之中心位置的X座標,會產生無法避免的錯位。As described above, the light source module 120 includes a plurality of semiconductor laser elements (100, 110), and each emitter (101, 111) is arranged separately in the X direction. Therefore, the X coordinate of the center position of the collimator lens 102 and the X coordinate of the center position of each emitter (101, 111) will be unavoidably misaligned.

其結果,從射極101射出的光線束101L、以及從射極111射出的光線束111L各自雖然會在通過準直鏡102之後成為大致平行光線束,但光線束101L的主光線101Lm與光線束111L的主光線111Lm成為非平行。也就是說,光線束101L與光線束111L,各自在X方向的行進方向(XZ平面上的行進方向)有所不同。As a result, although the light beam 101L emitted from the emitter 101 and the light beam 111L emitted from the emitter 111 each become a substantially parallel light beam after passing through the collimator lens 102, the chief ray 101Lm of the light beam 101L and the light beam The chief ray 111Lm of 111L becomes non-parallel. That is, the light beam 101L and the light beam 111L have different travel directions in the X direction (the travel direction on the XZ plane).

該構造的情況,例如,即使之後使用聚光光學系統來將各光線束(101L、111L)聚光,亦會在聚光後的光線束群發生擴散,會產生無法導向目的方向的光線。其結果,光的利用效率會降低。In the case of this structure, for example, even if a condensing optical system is used to condense the light beams (101L, 111L) later, the condensed light beam group will be diffused, and light rays that cannot be guided to the target direction are generated. As a result, the light utilization efficiency will be reduced.

在通過準直鏡102之後,光線束101L與光線束111L之XZ平面上的行進方向對光軸(Z軸)的角度,是藉由射極(101、111)間之距離的相對值對準直鏡102的焦點距離來決定。更詳細來說,將準直鏡102的光軸與離準直鏡102的光軸最遠的各射極(101、111)的位置之間的距離定為d,將準直鏡102的焦點距離定為f時,光線束(101L、111L)之各自的主光線(101Lm、111Lm)的行進方向與準直鏡102之光軸所夾的角度θ,是被定為θ= tan-1 (d/f)。此時,主光線101Lm與主光線111Lm所夾的角度θxm ,成為上述θ的兩倍。After passing through the collimator lens 102, the direction of travel of the light beam 101L and the light beam 111L on the XZ plane to the optical axis (Z axis) is aligned by the relative value of the distance between the emitters (101, 111) The focal length of the straight lens 102 is determined. In more detail, the distance between the optical axis of the collimator lens 102 and the positions of the emitters (101, 111) farthest from the optical axis of the collimator lens 102 is defined as d, and the focal point of the collimator lens 102 When the distance is set to f, the angle θ between the traveling direction of the principal rays (101Lm, 111Lm) of the light beam (101L, 111L) and the optical axis of the collimator 102 is set as θ= tan -1 ( d/f). At this time, the angle θ xm between the chief ray 101Lm and the chief ray 111Lm becomes twice the aforementioned θ.

如圖5所示般,主光線101L與主光線111L,在通過準直鏡102之後,是在X方向互相接近地行進,之後兩者往分開的方向行進。其結果,在圖5的態樣,是在光軸方向(Z方向)之z1的位置,光線束101L與光線束111L完全分離。As shown in FIG. 5, the chief ray 101L and the chief ray 111L, after passing through the collimator lens 102, travel close to each other in the X direction, and then the two travel in separate directions. As a result, in the aspect of FIG. 5, the light beam 101L is completely separated from the light beam 111L at the position of z1 in the optical axis direction (Z direction).

反過來說,對於準直鏡102的焦點距離,若射極(101、111)間的距離有著足以忽視之程度之大小的情況,在X方向之光線束110L的主光線101Lm與光線束111L的主光線111Lm所夾角度實質地接近0˚,不會發生使各光線束(101L、111L)分離的情況。但是,為此,準直鏡102有必要成為具有充分長之焦點距離的透鏡,會導致光學系統的尺寸擴大。Conversely, for the focal distance of the collimator lens 102, if the distance between the emitters (101, 111) is large enough to be ignored, the difference between the chief ray 101Lm of the ray beam 110L and the ray beam 111L in the X direction The angle between the chief ray 111Lm is substantially close to 0˚, and the separation of the light beams (101L, 111L) does not occur. However, for this, it is necessary for the collimator lens 102 to be a lens with a sufficiently long focal length, which will result in an increase in the size of the optical system.

特別是,在複數配置光源模組120來構成光源裝置的情況,有必要對應各光源模組120所具備的射極(101、111)來配置準直鏡102,故裝置規模會變得極大。In particular, when a plurality of light source modules 120 are arranged to form a light source device, it is necessary to arrange the collimator lens 102 corresponding to the emitters (101, 111) of each light source module 120, so the scale of the device becomes extremely large.

本發明,是鑑於上述課題,而以提供半導體雷射光源裝置為目的,其使用複數個半導體雷射元件,抑制裝置規模的擴大並提高光輸出。 [解決問題之技術手段]In view of the above-mentioned problems, the present invention aims to provide a semiconductor laser light source device, which uses a plurality of semiconductor laser elements to suppress the expansion of the device scale and increase the light output. [Technical means to solve the problem]

本發明的半導體雷射光源裝置,具備: 散熱片、 形成在前述散熱片之面之上層且具有光射出區域的複數個半導體雷射元件、以及 供從前述複數個半導體雷射元件所具有的前述光射出區域射出的光線束射入,並變換行進方向來射出的折射光學系統, 至少兩個的前述半導體雷射元件,是在與前述散熱片之面正交的第一方向觀看時互相傾斜地配置,而使從各半導體雷射元件所具有之各自的前述光射出區域射出的前述光線束之主光線彼此互相成為非平行, 前述折射光學系統,是以使第一焦點與第二焦點在前述光軸方向位移的光學系統所構成,該第一焦點是在由前述第一方向與該折射光學系統的光軸方向所形成之第一平面上的焦點,該第二焦點是在由前述光軸方向與正交於前述第一方向的第二方向所形成之第二平面上的焦點。The semiconductor laser light source device of the present invention includes: heat sink, A plurality of semiconductor laser elements formed on the surface of the aforementioned heat sink and having a light emitting area, and A refractive optical system that enters the light beams emitted from the light-exiting regions of the plurality of semiconductor laser elements and changes the direction of travel to be emitted, At least two of the semiconductor laser elements are arranged obliquely to each other when viewed in a first direction orthogonal to the surface of the heat sink, so that each of the semiconductor laser elements emits the light from the respective light emitting regions The principal rays of the light beam become non-parallel to each other, The refractive optical system is composed of an optical system that displaces a first focus and a second focus in the optical axis direction, and the first focus is formed by the first direction and the optical axis direction of the refractive optical system The focal point on the first plane, and the second focal point is the focal point on the second plane formed by the optical axis direction and the second direction orthogonal to the first direction.

參照圖5,如上述般,複數具備半導體雷射元件的半導體雷射光源裝置中,在慢軸方向使光射出區域(射極)分離配置。其結果,光線束在慢軸方向產生擴散。5, as described above, in a semiconductor laser light source device including a plurality of semiconductor laser elements, the light emission regions (emitters) are separated and arranged in the slow axis direction. As a result, the light beam diffuses in the slow axis direction.

對此,根據上述構造的話,至少兩個的半導體雷射元件,是在散熱片之面上互相傾斜地配置。更詳細來說,至少兩個的半導體雷射元件,是配置成使從各半導體雷射元件所具有之光射出區域射出的光線束之主光線彼此成為非平行。In this regard, according to the above structure, at least two semiconductor laser elements are arranged obliquely to each other on the surface of the heat sink. In more detail, the at least two semiconductor laser elements are arranged so that the chief rays of the light beams emitted from the light exit regions of the semiconductor laser elements become non-parallel to each other.

首先,為了簡易,以從前述兩個半導體雷射元件所具備之光射出區域射出的光線束之主光線彼此,隨著在第二平面上行進而互相接近的方式,使兩個半導體雷射元件傾斜配置的情況進行說明。將該態樣稱為「第一態樣」。該第一態樣的情況,從各光射出區域射出的光線束,是隨著在第二平面上行進,其分離距離會縮小。First, for the sake of simplicity, the principal rays of the light beams emitted from the light-exit regions of the two semiconductor laser elements mentioned above approach each other as they travel on the second plane, so that the two semiconductor laser elements The inclined configuration will be described. This aspect is called the "first aspect". In the case of the first aspect, the separation distance of the light beams emitted from each light exit area will decrease as they travel on the second plane.

在此,本發明的半導體雷射光源裝置所具備的折射光學系統,是以使第一平面上的焦點(第一焦點)與第二平面上的焦點(第二焦點)在光軸方向位移的光學系統所構成。例如,可在光軸方向將光射出區域存在的位置定為第一焦點,將比這還靠光軸方向前方之從各光射出區域射出的光線束之主光線彼此交錯的位置之附近定為第二焦點。此時,從前述兩個光射出區域射出而在第二平面上行進的光線束,與該光射出區域的分離距離相較之下,折射光學系統之第二焦點的位置處的分離距離較短。通過折射光學系統之後的光線束之發散角,是依存於焦點之位置的光線束之光束寬度,故根據該構造的話,可得到抑制在第二平面上行進之光線束之發散角的效果。藉此,可比以往還抑制光線束的擴散,維持光的利用效率,使配置於後段的聚光光學系統小型化。Here, the refractive optical system included in the semiconductor laser light source device of the present invention displaces the focus on the first plane (first focus) and the focus on the second plane (second focus) in the optical axis direction The optical system is composed. For example, the position where the light exit area exists in the optical axis direction can be set as the first focus, and the vicinity of the position where the principal rays of the light beams emitted from the light exit areas intersect each other, which is further ahead of the optical axis direction, can be set as The second focus. At this time, the light beams emitted from the aforementioned two light exit areas and travel on the second plane have a shorter separation distance at the position of the second focal point of the refractive optical system than the separation distance of the light exit area . The divergence angle of the light beam after passing through the refractive optical system depends on the beam width of the light beam at the focal point. Therefore, with this structure, the effect of suppressing the divergence angle of the light beam traveling on the second plane can be obtained. As a result, it is possible to suppress the spread of light beams than before, maintain light utilization efficiency, and reduce the size of the condensing optical system disposed in the subsequent stage.

半導體雷射元件,是在散熱片之面上,透過輔助座來配置者亦可。在該情況時,於一個輔助座上,載置一個半導體雷射元件亦可,載置複數個半導體雷射元件亦可。The semiconductor laser component is on the surface of the heat sink, and it can be configured through the auxiliary seat. In this case, one semiconductor laser element or multiple semiconductor laser elements may be placed on one auxiliary base.

更詳細來說, 將從鄰接之前述半導體雷射元件所具有的前述光射出區域射出的前述主光線彼此在前述第二方向的間隔定為d1時, 前述複數個半導體雷射元件,可互相傾斜地配置成,在前述光軸方向,從前述光射出區域到比前述折射光學系統還靠前述光射出區域側之特定位置為止之間,隨著於前述光軸方向行進而使前述間隔d1變小。In more detail, When the distance between the chief rays of light emitted from the light emitting area of the adjacent semiconductor laser element in the second direction is defined as d1, The plurality of semiconductor laser elements may be arranged obliquely to each other such that in the direction of the optical axis, from the light emitting area to a specific position on the side of the light emitting area than the refractive optical system, it follows the light Traveling in the axial direction reduces the aforementioned interval d1.

此時,前述第二焦點,即使比前述第一焦點還位於前述光軸方向之靠前述折射光學系統之側亦可。At this time, the second focal point may be located closer to the refractive optical system than the first focal point in the optical axis direction.

又,與上述所說明的構造相反,將兩個半導體雷射元件傾斜配置成,使從前述兩個半導體雷射元件所具備之光射出區域射出的光線束之主光線彼此,隨著在第二平面上行進而互相分開亦可。將該態樣稱為「第二態樣」。該情況時,從各光射出區域射出的光線束,是隨著在第二平面上行進,其分離距離變大。In addition, contrary to the structure described above, the two semiconductor laser elements are arranged obliquely so that the principal rays of the light beams emitted from the light emission regions of the two semiconductor laser elements follow each other in the second The planes can go up and separate from each other. This aspect is called the "second aspect." In this case, the beams of light emitted from the respective light exit regions have a greater separation distance as they travel on the second plane.

但是,在該構造也是,假設使從各光射出區域射出的光線束之主光線彼此往與行進方向相反地延長時,將該等之虛擬的主光線彼此交錯的位置之附近定為第二焦點,將光軸方向之光射出區域存在的位置定為第一焦點,藉此可得到與上述同樣的效果。亦即,即使是該構造的情況,從前述兩個光射出區域射出而在第二平面上行進的光線束,與光射出區域的分離距離相較之下,折射光學系統之第二焦點的位置的分離距離(在此,對應於虛擬光線束的分離距離)會較短。如上述般,通過折射光學系統之後的光線束之發散角,是依存於焦點的光線束之光束寬度,故即使是該第二態樣的情況,亦與第一態樣同樣地,可得到抑制在第二平面上行進之光線束之發散角的效果。However, in this structure as well, assuming that the chief rays of the light beams emitted from the respective light exit regions extend opposite to the direction of travel, the vicinity of the position where the virtual chief rays intersect each other is set as the second focus , Setting the position where the light exiting area in the optical axis direction exists as the first focus, by which the same effect as the above can be obtained. That is, even in the case of this configuration, the beam of light emitted from the aforementioned two light exit areas and travels on the second plane is at the position of the second focal point of the refraction optical system compared to the separation distance of the light exit area The separation distance (here, corresponding to the separation distance of the virtual light beam) will be shorter. As mentioned above, the divergence angle of the light beam after passing through the refractive optical system depends on the beam width of the light beam at the focal point. Therefore, even in the case of the second aspect, it can be suppressed in the same way as the first aspect. The effect of the divergence angle of the light beam traveling on the second plane.

更詳細來說,將從鄰接之前述半導體雷射元件所具有的前述光射出區域射出的前述主光線彼此,往與前述折射光學系統相反側之方向虛擬地延長所得到的虛擬主光線彼此之前述第二方向的間隔定為d1時, 前述複數個半導體雷射元件,互相傾斜地配置成,在前述光軸方向,從與前述光射出區域相反側之位置的端面所對應之虛擬光射出區域到特定位置為止之間,隨著於與前述光軸方向相反的方向行進而使前述間隔d1變小。In more detail, the principal rays emitted from the light exit region of the adjacent semiconductor laser element are virtually extended in the direction opposite to the refractive optical system. When the interval in the second direction is d1, The plurality of semiconductor laser elements are arranged obliquely to each other such that in the direction of the optical axis, from the virtual light emitting area corresponding to the end face at the position opposite to the light emitting area to a specific position, it follows Traveling in the opposite direction of the optical axis direction reduces the aforementioned interval d1.

此時,前述第二焦點,即使比前述第一焦點還位於前述光軸方向之遠離前述折射光學系統之側亦可。At this time, the second focal point may be located further away from the refractive optical system in the optical axis direction than the first focal point.

前述折射光學系統,只要是使前述第一焦點與前述第二焦點在前述光軸方向位移的光學系統的話,則具體的構造為任意。The refractive optical system may have any specific structure as long as it is an optical system that displaces the first focal point and the second focal point in the optical axis direction.

作為一例, 前述折射光學系統,是由使前述第一方向的焦點距離與前述第二方向的焦點距離不同之單一的透鏡所構成者亦可。作為這種透鏡,可利用變形透鏡等。As an example, The refractive optical system may be composed of a single lens in which the focal length in the first direction is different from the focal length in the second direction. As such a lens, an anamorphic lens or the like can be used.

作為其他一例, 前述折射光學系統,亦可具有: 對於從前述光射出區域射出的前述光線束,以使前述第一方向的發散角縮小的前述第一焦點作為焦點的第一透鏡;以及 配置在前述第一透鏡的後段,對於從前述光射出區域射出的前述光線束,以使前述第二方向的發散角縮小的前述第二焦點作為焦點的第二透鏡。As another example, The aforementioned refractive optical system may also have: For the light beam emitted from the light exit area, the first lens having the first focal point that reduces the divergence angle in the first direction is used as the focal point; and The second lens is arranged at a rear stage of the first lens, and for the beam of light emitted from the light exit area, the second focal point whose divergence angle in the second direction is reduced is a second lens.

前述第一透鏡,可為FAC(Fast Axis Collimation)透鏡,前述第二透鏡,可為SAC(Slow Axis Collimation)透鏡。The aforementioned first lens can be a FAC (Fast Axis Collimation) lens, and the aforementioned second lens can be a SAC (Slow Axis Collimation) lens.

作為另外一例, 前述折射光學系統,亦可具有: 對於從前述光射出區域射出的前述光線束,以使前述第一方向及前述第二方向的發散角縮小的前述第一焦點為焦點的第一透鏡;以及 配置在前述第一透鏡的後段,對於從前述光射出區域射出的前述光線束,以使前述第二方向的發散角縮小的前述第二焦點作為焦點的第二透鏡。As another example, The aforementioned refractive optical system may also have: For the beam of light emitted from the light exit area, a first lens focusing on the first focal point at which the divergence angles in the first direction and the second direction are reduced; and The second lens is arranged at a rear stage of the first lens, and for the beam of light emitted from the light exit area, the second focal point whose divergence angle in the second direction is reduced is a second lens.

該情況時,前述第一透鏡,可為將快軸及慢軸之雙方向予以準直的準直鏡,前述第二透鏡可為僅將慢軸方向予以折射的柱面透鏡。In this case, the first lens may be a collimator lens that collimates both directions of the fast axis and the slow axis, and the second lens may be a cylindrical lens that refracts only the slow axis direction.

前述複數個半導體雷射元件,亦可串聯地連接。特別是,半導體雷射裝置,在具備本發明之半導體雷射元件(以下,在此稱「第一半導體雷射元件」)、以及驅動電壓比這還高且射出其他波長帶之光的半導體雷射元件(以下,在此稱為「第二半導體雷射元件」)的情況時,在第一半導體雷射元件與第二半導體雷射元件之驅動電源可共通化這點為有用。 [發明之效果]The foregoing plural semiconductor laser elements may also be connected in series. In particular, the semiconductor laser device includes the semiconductor laser element of the present invention (hereinafter, referred to as the "first semiconductor laser element") and a semiconductor laser that has a higher driving voltage and emits light in other wavelength bands. In the case of a radio element (hereinafter, referred to as a "second semiconductor laser element"), it is useful that the driving power of the first semiconductor laser element and the second semiconductor laser element can be shared. [Effects of Invention]

根據本發明,使用複數個半導體雷射元件,來實現抑制裝置規模的擴大並提高光輸出的半導體雷射光源裝置。According to the present invention, a plurality of semiconductor laser elements are used to realize a semiconductor laser light source device that suppresses the expansion of the device scale and improves the light output.

針對本發明之半導體雷射光源裝置的各實施形態,適當參照圖式來說明。又,以下的各圖式,均為示意地圖示者,實際的尺寸比與圖式上的尺寸比並不一定一致。且,在各圖式間,尺寸比亦不一定一致。Each embodiment of the semiconductor laser light source device of the present invention will be described with reference to the drawings as appropriate. In addition, each of the following drawings is a schematic illustration, and the actual size ratio and the size ratio on the drawing do not necessarily match. Moreover, the size ratios are not necessarily the same among the various drawings.

[第一實施形態] 針對本發明之半導體雷射光源裝置的第一實施形態來說明。[First Embodiment] The first embodiment of the semiconductor laser light source device of the present invention will be described.

圖6,是將半導體雷射光源裝置之第一實施形態之構造予以示意表示的圖。且,圖7,是將半導體雷射光源裝置所具備之半導體雷射元件之構造予以示意表示的圖。Fig. 6 is a diagram schematically showing the structure of the first embodiment of the semiconductor laser light source device. 7 is a diagram schematically showing the structure of the semiconductor laser element included in the semiconductor laser light source device.

半導體雷射光源裝置1,具備半導體雷射元件(10、20)與折射光學系統30。各半導體雷射元件(10、20),如圖7所圖示般,形成在同一個散熱片5上,收容於外殼構件6內。而且,從外部導線4供電,藉此從各半導體雷射元件(10、20)所具有的光射出區域(11、21)射出光線束(12、22)。該光線束(12、22),例如透過設在外殼構件6的窗構件7來到達外部。又,在本實施形態,半導體雷射元件10與半導體雷射元件20,是互相串聯連接。The semiconductor laser light source device 1 includes semiconductor laser elements (10, 20) and a refractive optical system 30. The semiconductor laser elements (10, 20), as shown in FIG. 7, are formed on the same heat sink 5 and housed in the housing member 6. In addition, power is supplied from the external lead 4, thereby emitting light beams (12, 22) from the light emitting regions (11, 21) of the semiconductor laser elements (10, 20). This light beam (12, 22) passes through the window member 7 provided in the housing member 6, and reaches the outside, for example. Furthermore, in this embodiment, the semiconductor laser element 10 and the semiconductor laser element 20 are connected in series with each other.

又,以下,適當參照圖6或圖7等所圖示的XYZ座標系來說明。亦即,將折射光學系統30之光軸30A的方向規定為「Z方向」。且,將從各光射出區域(11、21)射出之光線束(12、22)的快軸方向規定為「Y方向」,將慢軸方向規定為「X方向」。此時,Y方向對應於「第一方向」,X方向對應於「第二方向」。且,以Y方向與Z方向所規定的YZ平面對應於「第一平面」,以X方向與Z方向所規定的XZ平面對應於「第二平面」。在圖6及圖7,都是將YZ平面上的構造及XZ平面上的構造分成上下段來圖示。又,圖7的上段,是圖示出從X方向觀看外殼構件6時的狀態,故於圖7之下段所圖示的兩根外部導線4,是在X方向重疊地顯示。In addition, in the following, description will be made with reference to the XYZ coordinate system illustrated in FIG. 6 or FIG. 7 as appropriate. That is, the direction of the optical axis 30A of the refractive optical system 30 is defined as the "Z direction". In addition, the fast axis direction of the light beam (12, 22) emitted from each light emission area (11, 21) is defined as the "Y direction", and the slow axis direction is defined as the "X direction". At this time, the Y direction corresponds to the "first direction", and the X direction corresponds to the "second direction". In addition, the YZ plane defined by the Y direction and the Z direction corresponds to the "first plane", and the XZ plane defined by the X direction and the Z direction corresponds to the "second plane". In Fig. 6 and Fig. 7, the structure on the YZ plane and the structure on the XZ plane are divided into upper and lower sections. In addition, the upper part of FIG. 7 illustrates the state when the housing member 6 is viewed from the X direction. Therefore, the two outer lead wires 4 illustrated in the lower part of FIG. 7 are displayed superimposed in the X direction.

且,以下,在僅記載為「X方向」、「Y方向」、或「Z方向」的情況時,並不區別方向的正負。另一方面,在區別方向的正負來記載的情況時,是標記為「+X方向」、「-X方向」等。In addition, in the following, when it is described only as "X direction", "Y direction", or "Z direction", the sign of the direction is not distinguished. On the other hand, in the case of distinguishing the sign of the direction and describing it, it is marked as "+X direction", "-X direction", etc.

如圖7所示般,半導體雷射元件(10、20),形成在散熱片5的面上。在此,散熱片5的面,是圖示成與XZ平面平行的情況。而且,半導體雷射元件10與半導體雷射元件20,是在X方向分開配置。As shown in FIG. 7, semiconductor laser elements (10, 20) are formed on the surface of the heat sink 5. Here, the surface of the radiating fin 5 is shown as being parallel to the XZ plane. Moreover, the semiconductor laser element 10 and the semiconductor laser element 20 are arranged separately in the X direction.

又,雖於圖7沒有圖示,但半導體雷射元件(10、20),是在散熱片5的面上透過輔助座來載置者亦可。散熱片5,是以將半導體雷射元件(10、20)之發光時所產生的熱予以散熱的目的來設置,由銅或銅合金等之熱傳導率高的材料所構成。輔助座,例如在面上設有未圖示的電極配線,藉此形成用來對半導體雷射元件(10、20)供電的電性連接,並具有將半導體雷射元件(10、20)之發光時所產生的熱予以導向散熱片5側的功能。輔助座,是鑑於散熱性、絕緣性、與半導體雷射元件(10、20)的線膨脹係數差等,來選擇適當材料。作為一例,輔助座,是由AlN、Al2 O3 、SiC、CuW等之材料所構成。In addition, although not shown in FIG. 7, the semiconductor laser elements (10, 20) may be mounted on the surface of the heat sink 5 through an auxiliary seat. The heat sink 5 is provided for the purpose of dissipating heat generated when the semiconductor laser element (10, 20) emits light, and is made of a material with high thermal conductivity such as copper or copper alloy. The auxiliary seat, for example, is provided with electrode wiring not shown on the surface, thereby forming an electrical connection for supplying power to the semiconductor laser element (10, 20), and has a connection between the semiconductor laser element (10, 20) The heat generated during light emission is guided to the heat sink 5 side. The auxiliary seat is to choose an appropriate material in view of heat dissipation, insulation, and the difference in linear expansion coefficient with semiconductor laser components (10, 20). As an example, the auxiliary seat is made of materials such as AlN, Al 2 O 3 , SiC, and CuW.

此外,如圖7之下段所示般,半導體雷射元件(10、20),在從Y方向觀看時,是互相傾斜配置。關於這點,回到圖6來接著說明。In addition, as shown in the lower part of FIG. 7, the semiconductor laser elements (10, 20) are arranged obliquely to each other when viewed from the Y direction. Regarding this point, return to FIG. 6 to continue the description.

圖6中,上段的圖,是將從半導體雷射元件(10、20)所具備之光射出區域(11、21)射出的光線束(12、22),沿著YZ平面來行進的樣子予以示意表示的圖。且,圖6之下段的圖,是將光線束(12、22)沿著XZ平面來行進的樣子予以示意表示的圖。亦即,圖6中,上段的圖,是使圖面上方向對應於光射出區域(11、21)的快軸方向,下段的圖,是使圖面上方向對應於光射出區域(11、21)的慢軸方向。In Fig. 6, the upper part of the figure shows the light beam (12, 22) emitted from the light emitting area (11, 21) of the semiconductor laser element (10, 20) traveling along the YZ plane. Schematic representation. In addition, the lower part of FIG. 6 is a diagram schematically showing how the light beam (12, 22) travels along the XZ plane. That is, in FIG. 6, the upper part of the figure is to make the direction on the figure surface correspond to the fast axis direction of the light exit area (11, 21), and the lower figure is to make the direction of the figure face correspond to the light exit area (11, 21). 21) The slow axis direction.

又,在圖6,為了方便,將光線束(12、22)的主光線(12m、22m)以單點鏈線來圖示。在以下的圖式中亦共通。In addition, in FIG. 6, the principal rays (12m, 22m) of the ray bundles (12, 22) are shown as single-point chain lines for convenience. It is also common in the following diagrams.

如上述般,半導體雷射元件(10、20),是從光射出區域(11、21)射出橢圓錐型的光線束(12、22)。參照圖4而與上述同樣地,各光射出區域(11、21),是形成在Y方向的相同座標位置,故從X方向觀看時各光線束(12、22)是完全重疊(參照圖6的上段)。且,如上述般,半導體雷射元件(10、20),是在X方向分離配置,故各光射出區域(11、21),是形成在X方向的不同座標位置。因此,從Y方向觀看時各光線束(12、22)各自的位置是錯開表示(參照圖6的下段)。As described above, the semiconductor laser element (10, 20) emits an elliptical cone-shaped light beam (12, 22) from the light emitting area (11, 21). With reference to Figure 4 and the same as above, the light exit regions (11, 21) are formed at the same coordinate position in the Y direction, so when viewed from the X direction, the light beams (12, 22) are completely overlapped (see Figure 6 Upper paragraph). Also, as described above, the semiconductor laser elements (10, 20) are arranged separately in the X direction, so the light emitting regions (11, 21) are formed at different coordinate positions in the X direction. Therefore, when viewed from the Y direction, the respective positions of the light beams (12, 22) are shifted (refer to the lower part of FIG. 6).

在此,本實施形態的半導體雷射光源裝置1所具備的折射光學系統30,是由YZ平面上的焦點距離與XZ平面上的焦點距離不同的透鏡31所構成。作為這種透鏡31,例如可利用變形透鏡等。Here, the refractive optical system 30 included in the semiconductor laser light source device 1 of the present embodiment is composed of a lens 31 whose focal length on the YZ plane is different from the focal length on the XZ plane. As such a lens 31, for example, an anamorphic lens or the like can be used.

更詳細來說,透鏡31,在YZ平面上的焦點30yf與透鏡31的中心位置之間於Z方向的焦點距離、在XZ平面上的焦點30xf與透鏡31的中心位置之間於Z方向的焦點距離,兩者不同。焦點30yf對應於「第一焦點」,焦點30xf對應於「第二焦點」。此時,焦點30yf與焦點30xf,是在Z方向位移。在本實施形態的構造,焦點30xf,是在Z方向位於比焦點30yf還以距離dz偏靠透鏡31側。In more detail, the focal length of the lens 31 in the Z direction between the focal point 30yf on the YZ plane and the center position of the lens 31, the focal point in the Z direction between the focal point 30xf on the XZ plane and the center position of the lens 31 The distance is different. The focus 30yf corresponds to the “first focus”, and the focus 30xf corresponds to the “second focus”. At this time, the focal point 30yf and the focal point 30xf are displaced in the Z direction. In the structure of this embodiment, the focal point 30xf is located on the side of the lens 31 in the Z direction by a distance dz from the focal point 30yf.

透鏡31,對於在YZ平面上行進的光線束(12、22),是參照圖2A而具有上述之與準直鏡102相同的功能。參照圖4而藉由與上述同樣的理由,從半導體雷射元件(10、20)射出的光線束(12、22),是在快軸方向具有較大的發散角θy來行進。亦即,假設透鏡31不存在的情況,光線束(12、22)會在Y方向一邊擴散一邊在YZ平面上行進。透鏡31,是以抑制光線束(12、22)往Y方向的擴散為目的來設置。較佳為,透鏡31,將在YZ平面上於Z方向行進的光線束(12、22),變換成大致平行光線束(13、23)。因此,透鏡31,在YZ平面上的焦點30yf,是配置在半導體雷射元件(10、20)之光射出區域(11、21)的位置附近。The lens 31 has the same function as the collimator lens 102 described above with reference to FIG. 2A for the light beam (12, 22) traveling on the YZ plane. 4 and for the same reason as described above, the light beam (12, 22) emitted from the semiconductor laser element (10, 20) travels with a large divergence angle θy in the fast axis direction. That is, assuming that the lens 31 does not exist, the light beam (12, 22) will spread in the Y direction while traveling on the YZ plane. The lens 31 is provided for the purpose of suppressing the spread of the light beam (12, 22) in the Y direction. Preferably, the lens 31 transforms the light beam (12, 22) traveling in the Z direction on the YZ plane into a substantially parallel light beam (13, 23). Therefore, the focal point 30yf of the lens 31 on the YZ plane is arranged near the position of the light emitting area (11, 21) of the semiconductor laser element (10, 20).

又,此處之「光射出區域(11、21)的位置附近」,是指除了Z座標與光射出區域(11、21)的Z座標(以下,簡單稱為「座標Z0」)完全一致的情況之外,還包含將座標Z0與透鏡31的Z座標之間的Z方向的分離距離定為zc時,對於座標Z0以前述離間距離zc之10%以內的長度在Z方向前後位移的區域。In addition, the "near the position of the light exit area (11, 21)" here means that except for the Z coordinate and the Z coordinate of the light exit area (11, 21) (hereinafter, simply referred to as "coordinate Z0") exactly the same In addition to the case, when the Z-direction separation distance between the coordinate Z0 and the Z coordinate of the lens 31 is defined as zc, the area where the coordinate Z0 is displaced back and forth in the Z direction by a length within 10% of the aforementioned separation distance zc.

另一方面,如上述般,半導體雷射元件(10、20),在XZ平面上,以互相傾斜的狀態來配置。在本實施形態的情況,是將半導體雷射元件(10、20)傾斜地配置成,使從半導體雷射元件10所具備之光射出區域11射出的光線束12之主光線12m、從半導體雷射元件20所具備之光射出區域21射出的光線束22之主光線22m,隨著在Z方向行進而在X方向逐漸接近。On the other hand, as described above, the semiconductor laser elements (10, 20) are arranged in a mutually inclined state on the XZ plane. In the case of this embodiment, the semiconductor laser elements (10, 20) are arranged obliquely so that the chief ray 12m of the light beam 12 emitted from the light emitting region 11 provided in the semiconductor laser element 10 is emitted from the semiconductor laser The chief ray 22m of the light beam 22 emitted from the light exit area 21 of the element 20 gradually approaches in the X direction as it travels in the Z direction.

更詳細來說,如在圖8擴大地圖示般,半導體雷射元件10,是將光射出區域11的端面,從與X方向平行地配置的狀態,變成在XZ平面上順時鐘旋轉角度θ11 的狀態來配置。另一方面,半導體雷射元件20,是將光射出區域21的端面,從與X方向平行地配置的狀態,變成在XZ平面上逆時鐘旋轉角度θ12 的狀態來配置。又,在圖示的方便上,圖8是與圖6不同,針對光線束(12、22)只有主光線(12m、22m)代表地圖示。In more detail, as shown in an enlarged view in FIG. 8, the semiconductor laser element 10 has the end face of the light emitting region 11 arranged in parallel to the X direction and turned clockwise on the XZ plane by an angle θ 11 status to configure. On the other hand, in the semiconductor laser element 20, the end face of the light emitting region 21 is arranged in a state where it is arranged parallel to the X direction to a state rotated counterclockwise by an angle θ 12 on the XZ plane. Also, for the convenience of illustration, FIG. 8 is different from FIG. 6 in that only the chief rays (12m, 22m) are representatively shown for the light beams (12, 22).

光射出區域11與光射出區域21,其端面在X方向是分開有距離d0,故各主光線(12m、22m),也是在端面附近以分開距離d0的狀態在XZ平面上行進。但是,如上述般,各半導體雷射元件(10、20)是互相傾斜地配置,故主光線12m與主光線22m,會互相在X方向使間隔d1接近地於XZ平面上行進。這代表著,從光射出區域11射出的光線束12與從光射出區域21射出的光線束22,會一邊在X方向互相接近一邊在XZ平面上行進(參照圖6的下段)。The end surfaces of the light exit area 11 and the light exit area 21 are separated by a distance d0 in the X direction, so the chief rays (12m, 22m) also travel in the XZ plane near the end surfaces with a distance d0. However, as described above, the semiconductor laser elements (10, 20) are arranged obliquely to each other. Therefore, the chief ray 12m and the chief ray 22m travel in the X direction with an interval d1 close to the XZ plane. This means that the light beam 12 emitted from the light exit area 11 and the light beam 22 emitted from the light exit area 21 travel in the XZ plane while approaching each other in the X direction (refer to the lower part of FIG. 6).

此時,如圖8示意地表示般,在某特定位置40,主光線12m與主光線22m會在XZ平面上交錯。該特定位置40,是對應於光線束12與光線束22在X方向最接近的位置。因此,使透鏡31之XZ平面上的焦點30xf定在該特定位置40的附近,藉此可使射入至透鏡31的光線束(12、22),視為從彷彿存在於特定位置40附近之光束徑較小的虛擬光源射出的光線束。其結果,藉由透鏡31,可使在XZ平面上行進的光線束(12、22)變換成大致平行光線束(13、23)。At this time, as shown schematically in FIG. 8, at a specific position 40, the chief ray 12m and the chief ray 22m will intersect on the XZ plane. The specific position 40 corresponds to the position where the light beam 12 and the light beam 22 are closest in the X direction. Therefore, the focal point 30xf on the XZ plane of the lens 31 is set in the vicinity of the specific position 40, so that the beam of light (12, 22) entering the lens 31 can be regarded as being in the vicinity of the specific position 40 A beam of light emitted by a virtual light source with a smaller beam diameter. As a result, by the lens 31, the light beam (12, 22) traveling in the XZ plane can be converted into a substantially parallel light beam (13, 23).

又,此處所稱之「特定位置40的附近」,是除了指Z座標與特定位置40的Z座標(以下,簡單稱為「座標Z40」)完全一致的情況之外,還包含將光射出區域(11、21)的Z座標(對應於上述「座標Z1」)與座標Z40之間的Z方向之位移量定為za時,對於座標Z40以位移量za之25%以內的長度在Z方向前後位移的區域。In addition, the "near the specific position 40" referred to here refers to the case where the Z coordinate and the Z coordinate of the specific position 40 (hereinafter, simply referred to as "coordinate Z40") are exactly the same, as well as the area where the light is emitted When the displacement in the Z direction between the Z coordinate of (11, 21) (corresponding to the above "coordinate Z1") and the coordinate Z40 is set as za, the length of the coordinate Z40 within 25% of the displacement za is forward and backward in the Z direction The area of displacement.

又,透鏡31之XZ平面上的焦點30xf,雖在特定位置40的位置附近為佳,但只要在X方向之光線束(12、22)的間隔d1比光射出區域(11、21)的間隔d0還短的位置的話,位於從特定位置40的位置附近偏向Z方向的位置亦可。Also, although the focal point 30xf on the XZ plane of the lens 31 is preferably near the specific position 40, as long as the interval d1 of the beam of light (12, 22) in the X direction is greater than the interval of the light exit area (11, 21) If the d0 is still short, it may be located at a position deviated from the vicinity of the specific position 40 in the Z direction.

[驗證] 根據本實施形態的半導體雷射光源裝置1,就抑制從透鏡31射出後之光線束(13、23)之慢軸方向(X方向)的擴散這點,基於模擬結果來說明。模擬條件如以下所述。[verification] According to the semiconductor laser light source device 1 of this embodiment, the point that the light beam (13, 23) emitted from the lens 31 is prevented from spreading in the slow axis direction (X direction) will be explained based on the simulation result. The simulation conditions are as follows.

(比較例1) 如圖5所示般,將半導體雷射光源裝置作為比較例1的構造,其具備:使XZ平面上的各光射出區域(101、111)平行地配置的半導體雷射元件(100、110)、快軸方向的焦點距離Ff與慢軸方向的焦點距離Fs為相同(4mm)的準直鏡102。(Comparative example 1) As shown in FIG. 5, the semiconductor laser light source device is taken as the structure of Comparative Example 1, which includes: semiconductor laser elements (100, 110) arranged in parallel to the light emission regions (101, 111) on the XZ plane A collimator lens 102 in which the focal distance Ff in the fast axis direction and the focal distance Fs in the slow axis direction are the same (4 mm).

又,光射出區域101的中心位置與光射出區域111的中心位置,在X方向之間隔d0的長度為112.5μm。且,將光射出區域101及光射出區域111在XY平面上的形狀,定為X方向的長度為75μm且Y方向的長度為1μm的矩形狀。In addition, the length of the distance d0 between the center position of the light exit region 101 and the center position of the light exit region 111 in the X direction is 112.5 μm. In addition, the shape of the light exit area 101 and the light exit area 111 on the XY plane is defined as a rectangular shape with a length in the X direction of 75 μm and a length in the Y direction of 1 μm.

且,將從光射出區域(101、111)射出的光線束(101L、111L)在快軸方向(Y方向)的發散角定為為33˚,將慢軸方向(X方向)的發散角定為12˚。Also, the divergence angle of the light beam (101L, 111L) emitted from the light exit area (101, 111) in the fast axis direction (Y direction) is set to 33˚, and the divergence angle in the slow axis direction (X direction) is set Is 12˚.

(比較例2) 將半導體雷射光源裝置作為比較例2的構造,其具備:圖8所示之角度θ11 及角度θ12 均定為15˚且使XZ平面上之各光射出區域(11、21)互相傾斜30˚來配置的半導體雷射元件(10、20)、快軸方向的焦點距離Ff與慢軸方向的焦點距離Fs為相同(4mm)的準直鏡102。至於光射出區域11的中心位置與光射出區域21的中心位置在X方向的間隔d0之長度、光射出區域11及光射出區域21在XY平面上的形狀,是與比較例1共通。且,從各光射出區域(11、21)射出的光線束(12、22)之快軸方向及慢軸方向的發散角,亦與比較例1的光線束(101L、111L)共通。(Comparative Example 2) A semiconductor laser light source device is used as the structure of Comparative Example 2, which has: the angle θ 11 and the angle θ 12 shown in FIG. 8 are both set to 15 ˚, and each light emission area on the XZ plane (11 , 21) Semiconductor laser elements (10, 20) arranged at an angle of 30˚ to each other, and a collimator 102 whose focal distance Ff in the fast axis direction and focal distance Fs in the slow axis direction are the same (4mm). The length of the distance d0 between the center position of the light exit region 11 and the center position of the light exit region 21 in the X direction, and the shapes of the light exit region 11 and the light exit region 21 on the XY plane are the same as those of Comparative Example 1. In addition, the divergence angles of the fast axis direction and the slow axis direction of the light beams (12, 22) emitted from the respective light exit regions (11, 21) are also common to the light beams (101L, 111L) of Comparative Example 1.

(實施例1) 將半導體雷射光源裝置1,作為實施例1的構造,其具備:圖8所示之角度θ11 及角度θ12 均定為15˚且使XZ平面上之各光射出區域(11、21)互相傾斜30˚來配置的半導體雷射元件(10、20)、快軸方向的焦點距離Ff為4mm且慢軸方向的焦點距離Fs為3.9mm的透鏡31。至於光射出區域11的中心位置與光射出區域21的中心位置在X方向的間隔d0之長度、及光射出區域11與光射出區域21在XY平面上的形狀,是與比較例1及2共通。且,從各光射出區域(11、21)射出的光線束(12、22)之快軸方向及慢軸方向的發散角,亦與比較例1共通。(Embodiment 1) A semiconductor laser light source device 1 is used as the structure of Embodiment 1. It has: the angle θ 11 and the angle θ 12 shown in FIG. 8 are both set to 15 ˚ and each light exit area on the XZ plane (11, 21) Semiconductor laser elements (10, 20) arranged at an angle of 30° with respect to each other, and lens 31 with a focal distance Ff in the fast axis direction of 4 mm and a focal distance Fs in the slow axis direction of 3.9 mm. As for the length of the distance d0 between the center position of the light emitting area 11 and the center position of the light emitting area 21 in the X direction, and the shape of the light emitting area 11 and the light emitting area 21 on the XY plane, they are common to Comparative Examples 1 and 2 . In addition, the divergence angles of the fast axis direction and the slow axis direction of the light beams (12, 22) emitted from the respective light emitting regions (11, 21) are also the same as those of Comparative Example 1.

(實施例2〜7) 除了使慢軸方向的焦點距離Fs改變這點以外,都與實施例1共通。具體來說,是如以下所述。 ・實施例2:將透鏡31之快軸方向的焦點距離Ff定為4mm,將慢軸方向的焦點距離Fs定為3.8mm。 ・實施例3:將透鏡31之快軸方向的焦點距離Ff定為4mm,將慢軸方向的焦點距離Fs定為3.7mm。 ・實施例4:將透鏡31之快軸方向的焦點距離Ff定為4mm,將慢軸方向的焦點距離Fs定為3.6mm。 ・實施例5:將透鏡31之快軸方向的焦點距離Ff定為4mm,將慢軸方向的焦點距離Fs定為3.5mm。 ・實施例6:將透鏡31之快軸方向的焦點距離Ff定為4mm,將慢軸方向的焦點距離Fs定為3.4mm。 ・實施例7:將透鏡31之快軸方向的焦點距離Ff定為4mm,將慢軸方向的焦點距離Fs定為3.3mm。(Examples 2~7) Except for changing the focal length Fs in the slow axis direction, it is the same as the first embodiment. Specifically, it is as follows. • Example 2: The focal distance Ff in the fast axis direction of the lens 31 is set to 4 mm, and the focal distance Fs in the slow axis direction is set to 3.8 mm. • Example 3: The focal distance Ff in the fast axis direction of the lens 31 is set to 4 mm, and the focal distance Fs in the slow axis direction is set to 3.7 mm. • Example 4: The focal distance Ff in the fast axis direction of the lens 31 is set to 4 mm, and the focal distance Fs in the slow axis direction is set to 3.6 mm. • Example 5: The focal distance Ff in the fast axis direction of the lens 31 is set to 4 mm, and the focal distance Fs in the slow axis direction is set to 3.5 mm. • Example 6: The focal distance Ff in the fast axis direction of the lens 31 is set to 4 mm, and the focal distance Fs in the slow axis direction is set to 3.4 mm. -Example 7: The focal distance Ff in the fast axis direction of the lens 31 is set to 4 mm, and the focal distance Fs in the slow axis direction is set to 3.3 mm.

在比較例1〜2、及實施例1〜7的各半導體雷射光源裝置中,將從準直鏡102或透鏡31射出之光線束群之各角度的光強度,藉由模擬來分別算出快軸方向(Y方向)及慢軸方向(X方向)。將該結果示於圖9A〜圖9I。各圖中,橫軸為角度,縱軸為光強度的相對值。且,各圖中,「fast」對應於往快軸方向(Y方向)的發散角,「slow」對應於往慢軸方向(X方向)的發散角。In the semiconductor laser light source devices of Comparative Examples 1 to 2, and Examples 1 to 7, the light intensity at each angle of the light beam group emitted from the collimator lens 102 or the lens 31 was calculated by simulation. Axis direction (Y direction) and slow axis direction (X direction). The results are shown in FIGS. 9A to 9I. In each figure, the horizontal axis is the angle, and the vertical axis is the relative value of light intensity. In addition, in each figure, "fast" corresponds to the divergence angle in the fast axis direction (Y direction), and "slow" corresponds to the divergence angle in the slow axis direction (X direction).

且,圖9J,是將比較例2及實施例1〜7的結果予以描點的統整圖表。圖9J中,橫軸為透鏡31之慢軸方向的焦點距離Fs,縱軸為慢軸方向之光線束群之角度強度分布的半峰半寬(HWHM:half width at half maximum)之值。又,於圖9J,為了比較,將比較例1之前述半峰半寬的值,以平行於橫軸的虛線來表示。其他的描點,從橫軸Fs的右側開始依序為實施例1〜7,亦即相當於Fs為3.9mm〜3.3mm的情況。9J is a graph showing the results of Comparative Example 2 and Examples 1-7. In FIG. 9J, the horizontal axis is the focal distance Fs in the slow axis direction of the lens 31, and the vertical axis is the value of the half width at half maximum (HWHM) of the angular intensity distribution of the light beam group in the slow axis direction. In addition, in FIG. 9J, for comparison, the value of the half-maximum half-width of Comparative Example 1 is shown by a dotted line parallel to the horizontal axis. The other plot points are in order from the right side of the horizontal axis Fs to Examples 1 to 7, which is equivalent to the case where Fs is 3.9 mm to 3.3 mm.

如圖9A所示般,以往構造之半導體雷射光源裝置(比較例1)的情況,得知從準直鏡102射出之後的光線束群,在慢軸方向是作為兩道光線束而分離。而且,根據光強度顯示半峰的區域(半峰全寬),得知兩道光線束群在慢軸方向具有約4.4˚的發散角。此時,半峰半寬(HWHM)值,約為2.2˚。As shown in FIG. 9A, in the case of the conventional semiconductor laser light source device (Comparative Example 1), it is known that the light beam group emitted from the collimator lens 102 is separated as two light beams in the slow axis direction. Moreover, according to the area where the light intensity shows the half-peak (full width at half-max), it is known that the two light beam groups have a divergence angle of about 4.4˚ in the slow axis direction. At this time, the half-width at half maximum (HWHM) value is about 2.2˚.

如圖9B所示般,取代比較例1的半導體雷射元件(100、110),而具備有在XZ平面上互相傾斜之半導體雷射元件(10、20)的比較例2之情況,亦與比較例1同樣地,得知從準直鏡102射出之後的光線束群,在慢軸方向是作為兩道光線束而分離。又,該光線束群在慢軸方向的發散角,顯示為較比較例1大的約4.7˚。此時之半峰半寬(HWHM)值,約為2.4˚。As shown in FIG. 9B, instead of the semiconductor laser elements (100, 110) of Comparative Example 1, the case of Comparative Example 2 which has semiconductor laser elements (10, 20) inclined to each other on the XZ plane is also the same as Similarly in Comparative Example 1, it is found that the light beam group after being emitted from the collimator lens 102 is separated as two light beams in the slow axis direction. In addition, the divergence angle of the light beam group in the slow axis direction is approximately 4.7˚ larger than that of Comparative Example 1. The half-width at half-maximum (HWHM) value at this time is approximately 2.4˚.

如圖9C所示般,取代比較例2的準直鏡102,而具備有使慢軸方向的焦點距離Fs比快軸方向的焦點距離Ff(4.0mm)還短之3.9mm之透鏡31的實施例1之情況,亦與比較例1及比較例2同樣地,得知從透鏡31射出之後的光線束群,在慢軸方向是作為兩道光線束(13、23)而分離。但是,根據光強度顯示半峰的區域(半峰全寬),得知在實施例1,兩道光線束群在慢軸方向具有約4.2˚的發散角。由此結果,與比較例1及比較例2相較之下,在實施例1,顯示出可抑制慢軸方向的發散角。又,此時之半峰半寬(HWHM)值,約為2.1˚。As shown in FIG. 9C, instead of the collimator lens 102 of Comparative Example 2, a lens 31 having a focal length Fs in the slow axis direction shorter than a focal distance Ff (4.0 mm) in the fast axis direction by 3.9 mm is provided. In the case of Example 1, as in Comparative Example 1 and Comparative Example 2, it is found that the light beam group after being emitted from the lens 31 is separated as two light beams (13, 23) in the slow axis direction. However, according to the region where the light intensity shows the half peak (full width at half maximum), it is known that in Example 1, the two light beam groups have a divergence angle of about 4.2˚ in the slow axis direction. As a result, compared with Comparative Example 1 and Comparative Example 2, in Example 1, the divergence angle in the slow axis direction can be suppressed. Also, the half-width at half maximum (HWHM) value at this time is approximately 2.1˚.

如圖9D〜圖9G所示般,若使慢軸方向的焦點距離Fs比實施例1還要逐漸變短的話(實施例2〜5),得知伴隨於此會使慢軸方向之強度分布的半峰寬度進一步減少。這表示,從透鏡31射出之後的光線束群在慢軸方向的發散角可進一步受到抑制。又,根據實施例3〜5的結果,得知從透鏡31射出之後的光線束群,是在慢軸方向彼此重疊。As shown in FIGS. 9D to 9G, if the focal distance Fs in the slow axis direction is gradually shorter than in Example 1 (Examples 2 to 5), it is known that the intensity distribution in the slow axis direction will be accompanied by this. The half-width of the peak is further reduced. This means that the divergence angle of the light beam group in the slow axis direction after being emitted from the lens 31 can be further suppressed. Furthermore, according to the results of Examples 3 to 5, it is known that the light beam groups after being emitted from the lens 31 overlap each other in the slow axis direction.

又,從實施例5進一步使慢軸方向的焦點距離Fs變小的話(實施例6、實施例7),確認到慢軸方向之強度分布的半峰寬度顯示出上升傾向(參照圖9H〜圖9J)。但是,在實施例6中,慢軸方向之光強度的半峰全寬約為2.0˚(半峰半寬約為1.0˚),在實施例7中,慢軸方向的半峰全寬約為3.2˚(半峰半寬約為1.6˚)。亦即,即使在實施例6及7中,亦相較於比較例1及比較例2,顯示出慢軸方向之光強度的半峰寬度較小的值,得知慢軸方向之光線束群的發散角受到抑制。In addition, when the focal length Fs in the slow axis direction is further reduced from Example 5 (Example 6, Example 7), it is confirmed that the half-width of the intensity distribution in the slow axis direction shows an upward trend (refer to FIGS. 9H~ 9J). However, in Example 6, the full width at half maximum of the light intensity in the slow axis direction is about 2.0˚ (the full width at half maximum is about 1.0˚). In Example 7, the full width at half maximum in the slow axis direction is about 3.2˚ (Half width at half maximum is about 1.6˚). That is, even in Examples 6 and 7, compared with Comparative Example 1 and Comparative Example 2, the half-value width of the light intensity in the slow axis direction is smaller, and it is known that the light beam group in the slow axis direction The divergence angle is suppressed.

實施例6及7的狀態,如圖8所示般,使透鏡31之XZ平面上的焦點30xf,位在比起主光線12m與主光線22m在XZ平面上交錯的點亦即特定位置40還在Z方向(光軸30A的方向)靠近透鏡31的位置。也就是說,在該位置,主光線(12m、22m)彼此的間隔d1,雖比特定位置40還寬,但比光射出區域(11、21)之端面的間隔d0還要靠近。因此,可得到比起比較例1還能抑制慢軸方向(X方向)之光線束(13、23)之擴散的結論。The state of Examples 6 and 7, as shown in FIG. 8, the focal point 30xf on the XZ plane of the lens 31 is positioned at a specific position 40 that is more than the intersecting point of the chief ray 12m and the chief ray 22m on the XZ plane. A position close to the lens 31 in the Z direction (the direction of the optical axis 30A). That is, at this position, the interval d1 between the chief rays (12m, 22m) is wider than the specific position 40, but is closer than the interval d0 between the end faces of the light exit regions (11, 21). Therefore, it can be concluded that the diffusion of the light beams (13, 23) in the slow axis direction (X direction) can be suppressed compared to Comparative Example 1.

[第二實施形態] 針對本發明之半導體雷射光源裝置的第二實施形態,以與第一實施形態不同的部分為中心來說明。[Second Embodiment] Regarding the second embodiment of the semiconductor laser light source device of the present invention, the description will be focused on the parts different from the first embodiment.

第一實施形態如上述般,折射光學系統30,是YZ平面上的焦點距離與XZ平面上的焦點距離不同的光學系統。在第一實施形態,折射光學系統30雖由一片的透鏡31所構成,但在本實施形態,折射光學系統30是由複數片的透鏡所構成,在這點不同。又,關於其他的構造,是與第一實施形態共通。In the first embodiment, as described above, the refractive optical system 30 is an optical system in which the focal length on the YZ plane and the focal length on the XZ plane are different. In the first embodiment, the refractive optical system 30 is composed of a single lens 31, but in this embodiment, the refractive optical system 30 is composed of a plurality of lenses, and this point is different. In addition, the other structure is common to the first embodiment.

更詳細來說,如圖10所示般,在本實施形態的半導體雷射光源裝置1中,折射光學系統30,具備第一透鏡32與第二透鏡33。In more detail, as shown in FIG. 10, in the semiconductor laser light source device 1 of the present embodiment, the refractive optical system 30 includes a first lens 32 and a second lens 33.

第一透鏡32,僅具有對於在Z方向行進的光線束(12、22)抑制往Y方向(快軸方向)之發散的功能,不具有抑制往X方向(慢軸方向)之擴散的功能,有被稱為FAC(Fast Axis Collimation)透鏡之名稱的情況。另一方面,第二透鏡33,僅具有對於在Z方向行進的光線束(12、22)抑制往X方向(慢軸方向)之擴散的功能,不具有抑制往Y方向(快軸方向)之擴散的功能,有被稱為SAC(Slow Axis Collimation)透鏡之名稱的情況。The first lens 32 only has the function of suppressing the divergence to the Y direction (fast axis direction) for the light beam (12, 22) traveling in the Z direction, and does not have the function of suppressing the divergence to the X direction (slow axis direction), Sometimes it is called FAC (Fast Axis Collimation) lens. On the other hand, the second lens 33 only has the function of suppressing the spread of the light beams (12, 22) traveling in the Z direction in the X direction (slow axis direction), and does not have the function of suppressing the Y direction (fast axis direction). The function of diffusion is sometimes called the name of SAC (Slow Axis Collimation) lens.

第一透鏡32,與第一實施形態的透鏡31同樣地,使YZ平面上的焦點30yf,配置在半導體雷射元件(10、20)之光射出區域(11、21)的位置附近。且,第二透鏡33,與第一實施形態的透鏡31同樣地,使XZ平面上的焦點30xf,配置在主光線12m與主光線22m交錯的特定位置40附近。The first lens 32, like the lens 31 of the first embodiment, has the focal point 30yf on the YZ plane arranged near the position of the light emitting area (11, 21) of the semiconductor laser element (10, 20). In addition, the second lens 33, like the lens 31 of the first embodiment, arranges the focal point 30xf on the XZ plane near the specific position 40 where the chief ray 12m and the chief ray 22m intersect.

第一透鏡32,對於在YZ平面上行進的光線束(12、22),發揮出與在第一實施形態所述的透鏡31同樣的功能。另一方面,第二透鏡33,對於在YZ平面上行進的光線束(12、22),不具有使光線束折射的功能,射入的光線束會直接穿透。其結果,如圖10的上段所示般,從各光射出區域(11、21)射出而在YZ平面上行進的光線束(12、22),在通過第一透鏡32及第二透鏡33之後,與第一實施形態同樣地,變換成大致平行光線束(13、23)。The first lens 32 performs the same function as the lens 31 described in the first embodiment for the light beam (12, 22) traveling in the YZ plane. On the other hand, the second lens 33 does not have the function of refracting the light beam (12, 22) traveling on the YZ plane, and the incident light beam will directly penetrate. As a result, as shown in the upper part of FIG. 10, the light beams (12, 22) emitted from the respective light exit regions (11, 21) and traveling in the YZ plane pass through the first lens 32 and the second lens 33 In the same way as the first embodiment, it is converted into a substantially parallel light beam (13, 23).

第一透鏡32,對於在XZ平面上行進的光線束(12、22),不具有使光線束折射的功能,射入的光線束會直接穿透。另一方面,第二透鏡33,對於在XZ平面上行進的光線束(12、22),發揮出與在第一實施形態所述的透鏡31同樣的功能。其結果,如圖10的下段所示般,從各光射出區域(11、21)射出而在XZ平面上行進的光線束(12、22),直接通過第一透鏡32之後,在射入至第二透鏡33時會折射。此處,與第一實施形態同樣地,第二透鏡33,使XZ平面上的焦點30xf配置在主光線12m與主光線22m交錯的特定位置40附近,故通過第二透鏡33之後的光線束(13、23),各自的主光線(13m、23m)會在XZ平面上成為大致平行。其結果,與第一實施形態同樣地,通過第二透鏡33之後的光線束(13、23),在XZ平面上亦成為大致平行光線束。The first lens 32 does not have the function of refracting the light beam (12, 22) traveling on the XZ plane, and the incident light beam will directly penetrate. On the other hand, the second lens 33 performs the same function as the lens 31 described in the first embodiment for the light beam (12, 22) traveling in the XZ plane. As a result, as shown in the lower part of FIG. 10, the light beams (12, 22) emitted from the respective light emitting areas (11, 21) and traveling on the XZ plane pass directly through the first lens 32 and then enter The second lens 33 will refract. Here, as in the first embodiment, the second lens 33 arranges the focal point 30xf on the XZ plane near the specific position 40 where the chief ray 12m and the chief ray 22m intersect, so the beam of light after passing through the second lens 33 ( 13, 23), the respective chief rays (13m, 23m) will become approximately parallel on the XZ plane. As a result, as in the first embodiment, the light beams (13, 23) after passing through the second lens 33 also become substantially parallel light beams on the XZ plane.

因此,在本實施形態的半導體雷射光源裝置1,亦藉由與第一實施形態同樣的理由,可得到往慢軸方向(X方向)之發散角受到抑制的光線束(13、23)。Therefore, in the semiconductor laser light source device 1 of the present embodiment, for the same reason as the first embodiment, a light beam (13, 23) whose divergence angle in the slow axis direction (X direction) is suppressed can be obtained.

[第三實施形態] 針對本發明之半導體雷射光源裝置的第二實施形態,以與第一實施形態不同的部分為中心來說明。[Third Embodiment] Regarding the second embodiment of the semiconductor laser light source device of the present invention, the description will be focused on the parts different from the first embodiment.

第一實施形態如上述般,折射光學系統30,是YZ平面上的焦點距離與XZ平面上的焦點距離不同的光學系統。在第一實施形態,折射光學系統30雖由一片的透鏡31所構成,但在本實施形態,亦與第二實施形態同樣地,折射光學系統30是由複數片的透鏡所構成,在這點不同。又,關於其他的構造,是與第一實施形態共通。In the first embodiment, as described above, the refractive optical system 30 is an optical system in which the focal length on the YZ plane and the focal length on the XZ plane are different. In the first embodiment, the refractive optical system 30 is composed of a single lens 31, but in this embodiment, similarly to the second embodiment, the refractive optical system 30 is composed of a plurality of lenses. different. In addition, the other structure is common to the first embodiment.

更詳細來說,如圖11所示般,在本實施形態的半導體雷射光源裝置1中,折射光學系統30,具備第一透鏡34與第二透鏡35。In more detail, as shown in FIG. 11, in the semiconductor laser light source device 1 of the present embodiment, the refractive optical system 30 includes a first lens 34 and a second lens 35.

第一透鏡34,參照圖2A及圖2B而與上述的準直鏡102同樣地,對於在Z方向行進的光線束(12、22),顯示出抑制往Y方向(快軸方向)及X方向(慢軸方向)之擴散的功能。且,第二透鏡35,僅具有對於在Z方向行進的光線束(12、22)抑制往X方向(慢軸方向)之擴散的功能,不具有抑制往Y方向(快軸方向)之擴散的功能,且由柱面透鏡所構成。又,在第二實施形態可使用上述的SAC透鏡。The first lens 34, with reference to FIGS. 2A and 2B and similar to the above-mentioned collimator 102, shows that the light beams (12, 22) traveling in the Z direction are suppressed in the Y direction (fast axis direction) and X direction (Slow axis direction) the function of diffusion. Moreover, the second lens 35 only has the function of suppressing the diffusion to the X direction (slow axis direction) for the light beam (12, 22) traveling in the Z direction, and does not have the function of suppressing the diffusion to the Y direction (fast axis direction) Functional and composed of cylindrical lenses. In addition, the above-mentioned SAC lens can be used in the second embodiment.

第一透鏡34,與第一實施形態的透鏡31同樣地,使YZ平面上的焦點30yf,配置在半導體雷射元件(10、20)之光射出區域(11、21)的位置附近。又,第一透鏡34,為一般的準直鏡,故Y方向的焦點距離與X方向的焦點距離相同。因此,雖未圖示,但第一透鏡34,其XZ平面上的焦點,亦在半導體雷射元件(10、20)之光射出區域(11、21)的位置附近。The first lens 34, like the lens 31 of the first embodiment, has the focal point 30yf on the YZ plane arranged near the position of the light emitting area (11, 21) of the semiconductor laser element (10, 20). In addition, the first lens 34 is a general collimator lens, so the focal length in the Y direction is the same as the focal length in the X direction. Therefore, although not shown, the focal point of the first lens 34 on the XZ plane is also near the position of the light emitting area (11, 21) of the semiconductor laser element (10, 20).

另一方面,第二透鏡35,是使XZ平面上的焦點與第一透鏡34不同,藉此展現出將第一透鏡34之XZ平面上的焦點實質地往Z方向位移的功能。亦即,第二透鏡35,是將焦點調整成,使跟第一透鏡34的合成光學系統(折射光學系統30)之XZ平面上的焦點30xf,位在主光線12m與主光線22m交錯的特定位置40附近。On the other hand, the second lens 35 makes the focal point on the XZ plane different from that of the first lens 34, thereby exhibiting the function of substantially shifting the focal point on the XZ plane of the first lens 34 to the Z direction. That is, the second lens 35 adjusts the focal point so that the focal point 30xf on the XZ plane of the combined optical system (refractive optical system 30) of the first lens 34 is positioned at the specific intersection of the chief ray 12m and the chief ray 22m. Location near 40.

第一透鏡34,對於在YZ平面上行進的光線束(12、22),發揮出與在第一實施形態所述的透鏡31同樣的功能。另一方面,第二透鏡33,對於在YZ平面上行進的光線束(12、22),不具有使光線束折射的功能,射入的光線束會直接穿透。其結果,如圖11的上段所示般,從各光射出區域(11、21)射出而在YZ平面上行進的光線束(12、22),在通過第一透鏡32及第二透鏡33之後,與第一實施形態同樣地,變換成大致平行光線束(13、23)。The first lens 34 performs the same function as the lens 31 described in the first embodiment for the light beam (12, 22) traveling on the YZ plane. On the other hand, the second lens 33 does not have the function of refracting the light beam (12, 22) traveling on the YZ plane, and the incident light beam will directly penetrate. As a result, as shown in the upper part of FIG. 11, the light beams (12, 22) emitted from the respective light emitting areas (11, 21) and traveling in the YZ plane pass through the first lens 32 and the second lens 33 In the same way as the first embodiment, it is converted into a substantially parallel light beam (13, 23).

第一透鏡34,亦對於在XZ平面上行進的光線束(12、22)展現出折射的功能。因此,光線束(12、22),若在XZ平面上進行而通過第一透鏡34的話,在折射之後射入至第二透鏡35。此處,如上述般,第二透鏡35,在跟第一透鏡34的合成光學系統中,設置成使XZ平面上的焦點30xf位在特定位置40附近。因此,光線束(12、22),若在XZ平面上進行而通過第二透鏡35的話,因與第一實施形態同樣的理由,而變換成大致平行光線束(13、23)。The first lens 34 also exhibits a refraction function for the light beams (12, 22) traveling on the XZ plane. Therefore, if the light beam (12, 22) passes through the first lens 34 on the XZ plane, it enters the second lens 35 after being refracted. Here, as described above, the second lens 35 and the first lens 34 are combined with the optical system so that the focal point 30xf on the XZ plane is located near the specific position 40. Therefore, if the light beams (12, 22) travel on the XZ plane and pass through the second lens 35, they are converted into substantially parallel light beams (13, 23) for the same reason as in the first embodiment.

因此,在本實施形態的半導體雷射光源裝置1,亦藉由與第一實施形態同樣的理由,可得到往慢軸方向(X方向)之發散角受到抑制的光線束(13、23)。Therefore, in the semiconductor laser light source device 1 of the present embodiment, for the same reason as the first embodiment, a light beam (13, 23) whose divergence angle in the slow axis direction (X direction) is suppressed can be obtained.

[其他實施形態] 以下,針對其他實施形態來說明。[Other embodiments] Hereinafter, other embodiments will be described.

<1>在上述實施形態是說明了,將半導體雷射元件(10、20)傾斜地配置成,從半導體雷射元件10所具備之光射出區域11射出的光線束12之主光線12m、從半導體雷射元件20所具備之光射出區域21射出的光線束22之主光線22m,隨著在Z方向行進而在X方向逐漸接近的情況。但是,如圖12所示般,使半導體雷射元件(10、20)傾斜配置成,主光線12m與主光線22m,隨著在Z方向行進而在X方向(慢軸方向)分離亦可。<1> In the above embodiment, it is explained that the semiconductor laser element (10, 20) is arranged obliquely so that the chief ray 12m of the light beam 12 emitted from the light emission region 11 of the semiconductor laser element 10 The chief ray 22m of the light beam 22 emitted from the light exit area 21 of the laser element 20 gradually approaches in the X direction as it travels in the Z direction. However, as shown in FIG. 12, the semiconductor laser elements (10, 20) may be arranged obliquely so that the chief ray 12m and the chief ray 22m may be separated in the X direction (slow axis direction) as they travel in the Z direction.

在該構造的情況,若將各主光線(12m、22m)往與光射出區域(11、21)相反之側(−Z方向)虛擬地延長的話,從與光射出區域(11、21)相反之側的端面(11a、12a)虛擬地射出的光線束之主光線(12ma、22ma)彼此交錯的位置會存在。將該交錯位置定為上述特定位置40,使透鏡31之XZ平面上的焦點30xf位在該特定位置40附近亦可。In the case of this structure, if each chief ray (12m, 22m) is extended virtually to the side (−Z direction) opposite to the light exit area (11, 21), it will be from the opposite to the light exit area (11, 21) There will be positions where the chief rays (12ma, 22ma) of the light beams virtually emitted from the end faces (11a, 12a) on the side intersect each other. The staggered position is set as the above-mentioned specific position 40, and the focal point 30xf on the XZ plane of the lens 31 may be located near the specific position 40.

即使是該構造,亦與第一實施形態同樣地,可使在XZ平面上進行而射入至透鏡31的光線束(12、22),視為從彷彿存在於特定位置40附近之光束徑較小的虛擬光源射出的光線束。其結果,藉由透鏡31,可使在XZ平面上行進的光線束(12、22)變換成大致平行光線束(13、23)。Even with this structure, similar to the first embodiment, the beam of light (12, 22) that enters the lens 31 on the XZ plane can be regarded as having a smaller diameter than the beam that seems to exist near the specific position 40 A beam of light emitted by a small virtual light source. As a result, by the lens 31, the light beam (12, 22) traveling in the XZ plane can be converted into a substantially parallel light beam (13, 23).

又,在圖12,折射光學系統30在第一實施形態是圖示出由上述的透鏡31所構成的情況,但亦可採用第二實施形態、第三實施形態的構造。In addition, in FIG. 12, in the first embodiment, the refracting optical system 30 is illustrated as being composed of the above-mentioned lens 31, but the structure of the second embodiment and the third embodiment may be adopted.

<2>在第二實施形態及第三實施形態,是說明了折射光學系統30具有兩片透鏡的情況。但是,本發明,並不排除折射光學系統30具有三片透鏡以上的情況。<2> In the second embodiment and the third embodiment, the case where the refractive optical system 30 has two lenses has been described. However, the present invention does not exclude the case where the refractive optical system 30 has three or more lenses.

<3>在上述各實施形態,搭載於同一個散熱片5上的兩個半導體雷射元件(10、20),是說明了使各個串聯連接,並通過外部導線4來供電者。但是,本發明,並不排除搭載於同一個散熱片5上的兩個半導體雷射元件(10、20)互相並聯連接的情況。<3> In each of the above embodiments, the two semiconductor laser elements (10, 20) mounted on the same heat sink 5 are connected in series, and power is supplied through the external lead 4. However, the present invention does not exclude the case where two semiconductor laser elements (10, 20) mounted on the same heat sink 5 are connected in parallel with each other.

<4>在上述各實施形態,舉例說明了半導體雷射光源裝置1,在同一個散熱片5上搭載有兩個半導體雷射元件(10、20)的情況。但是,本發明的半導體雷射光源裝置1,在同一個散熱片5上具備三個半導體雷射元件以上亦可。在該情況中,只要配置成從至少兩個的半導體雷射元件所具有之光射出區域射出的主光線彼此成為非平行即可,配置成從鄰接的兩個光射出區域射出的主光線彼此成為非平行為佳。甚至,配置成從鄰接之所有的光射出區域射出的主光線彼此互相成為非平行更佳。<4> In each of the above-mentioned embodiments, the case where the semiconductor laser light source device 1 is mounted on the same heat sink 5 with two semiconductor laser elements (10, 20) has been exemplified. However, the semiconductor laser light source device 1 of the present invention may include three or more semiconductor laser elements on the same heat sink 5. In this case, it is only necessary to arrange so that the chief rays emitted from the light emission regions of at least two semiconductor laser elements are non-parallel to each other, and the chief rays arranged so that the chief rays emitted from two adjacent light emission regions become mutually. Non-parallel is better. Furthermore, it is more preferable that the chief rays emitted from all adjacent light emitting regions are not parallel to each other.

<5>在上述各實施形態,說明了各半導體雷射元件(10、20)各自具備一個光射出區域(11、21)的情況。但是,即使各半導體雷射元件(10、20)為各自具備複數個光射出區域的構造(多射極型)亦可。<5> In each of the above embodiments, the case where each semiconductor laser element (10, 20) is provided with one light emitting region (11, 21) has been described. However, each semiconductor laser element (10, 20) may have a structure (multi-emitter type) each having a plurality of light emission regions.

<6>在各實施形態所說明的折射光學系統30,是收容在外殼構件6的內側亦可,兼用於窗構件7亦可,配置在外殼構件6的外側亦可。<6> The refractive optical system 30 described in each embodiment may be housed inside the housing member 6, may also be used for the window member 7, or may be arranged outside the housing member 6.

1:半導體雷射光源裝置 4:外部導線 5:散熱片 6:外殼構件 7:窗構件 10:半導體雷射元件 11:光射出區域 12:光線束 20:半導體雷射元件 21:光射出區域 22:光線束 30:折射光學系統 30A:折射光學系統的光軸 30xf:折射光學系統的第二焦點 30yf:折射光學系統的第一焦點 31:透鏡 32:第一透鏡 33:第二透鏡 34:第一透鏡 35:第二透鏡 40:特定位置 100:半導體雷射元件 101:光射出區域(射極) 101L:從射極射出的光線束 102:準直鏡 120:光源模組 121:輔助座 θy:快軸方向的發散角 θx:慢軸方向的發散角1: Semiconductor laser light source device 4: External wire 5: heat sink 6: Shell components 7: Window components 10: Semiconductor laser components 11: Light exit area 12: light beam 20: Semiconductor laser components 21: Light exit area 22: light beam 30: Refractive optical system 30A: Optical axis of refractive optical system 30xf: The second focus of the refractive optical system 30yf: the first focus of the refractive optical system 31: lens 32: The first lens 33: second lens 34: The first lens 35: second lens 40: specific location 100: Semiconductor laser components 101: Light exit area (emitter) 101L: the beam of light emitted from the emitter 102: collimator lens 120: light source module 121: auxiliary seat θy: divergence angle in the fast axis direction θx: divergence angle in the slow axis direction

[圖1A],是將半導體雷射元件之構造予以示意表示的立體圖。 [圖1B],是分別示意圖示出將從圖1A的半導體雷射元件射出的光線束從X方向觀看的情況與從Y方向觀看的情況。 [圖2A],是在半導體雷射元件的後段配置準直鏡的情況時,將於YZ平面方向行進的光線束予以示意表示的圖。 [圖2B],是在半導體雷射元件的後段配置準直鏡的情況時,將於XZ平面方向行進的光線束予以示意表示的圖。 [圖3A],是將具備複數個半導體雷射元件的光源模組之構造予以示意表示的立體圖。 [圖3B],是從光軸方向觀看圖3A之光源模組所具備之射極時的示意圖。 [圖4],是分別示意圖示出將從圖3A的光源模組射出的光線束從X方向觀看的情況與從Y方向觀看的情況。 [圖5],是在圖3A的光源模組的後段配置準直鏡的情況時,將於XZ平面方向行進的光線束予以示意表示的圖。 [圖6],是將半導體雷射光源裝置之第一實施形態之構造予以示意表示的圖。 [圖7],是將半導體雷射光源裝置所具備之半導體雷射元件之構造予以示意表示的圖。 [圖8],是在圖6之下段所圖示之XZ俯視圖的部分擴大圖。 [圖9A],是在比較例1的半導體雷射光源裝置中,表示從準直鏡射出後之光線束群所示之慢軸方向與快軸方向之各角度的光強度分布的圖表。 [圖9B],是在比較例2的半導體雷射光源裝置中,表示從準直鏡射出後之光線束群所示之慢軸方向與快軸方向之各角度的光強度分布的圖表。 [圖9C],是在實施例1的半導體雷射光源裝置中,表示從透鏡射出後之光線束群所示之慢軸方向與快軸方向之各角度的光強度分布的圖表。 [圖9D],是在實施例2的半導體雷射光源裝置中,表示從透鏡射出後之光線束群所示之慢軸方向與快軸方向之各角度的光強度分布的圖表。 [圖9E],是在實施例3的半導體雷射光源裝置中,表示從透鏡射出後之光線束群所示之慢軸方向與快軸方向之各角度的光強度分布的圖表。 [圖9F],是在實施例4的半導體雷射光源裝置中,表示從透鏡射出後之光線束群所示之慢軸方向與快軸方向之各角度的光強度分布的圖表。 [圖9G],是在實施例5的半導體雷射光源裝置中,表示從透鏡射出後之光線束群所示之慢軸方向與快軸方向之各角度的光強度分布的圖表。 [圖9H],是在實施例6的半導體雷射光源裝置中,表示從透鏡射出後之光線束群所示之慢軸方向與快軸方向之各角度的光強度分布的圖表。 [圖9I],是在實施例7的半導體雷射光源裝置中,表示從透鏡射出後之光線束群所示之慢軸方向與快軸方向之各角度的光強度分布的圖表。 [圖9J],是在實施例1〜7及比較例2的半導體雷射光源裝置中,表示從透鏡射出後之光線束群所示之慢軸方向與快軸方向之各角度的光強度分布的圖表。 [圖10],是將半導體雷射光源裝置之第二實施形態之構造予以示意表示的圖。 [圖11],是將半導體雷射光源裝置之第三實施形態之構造予以示意表示的圖。 [圖12],是將半導體雷射光源裝置之其他實施形態之構造予以示意表示的圖。[Fig. 1A] is a perspective view schematically showing the structure of a semiconductor laser element. [FIG. 1B] is a schematic diagram showing the situation when the light beam emitted from the semiconductor laser element of FIG. 1A is viewed from the X direction and the situation when viewed from the Y direction. [FIG. 2A] is a diagram schematically showing a beam of light traveling in the YZ plane direction when a collimator lens is arranged at the rear of the semiconductor laser element. [FIG. 2B] is a diagram schematically showing the beam of light traveling in the XZ plane direction when a collimator lens is arranged at the rear stage of the semiconductor laser element. [FIG. 3A] is a perspective view schematically showing the structure of a light source module equipped with a plurality of semiconductor laser elements. [Fig. 3B] is a schematic diagram when viewing the emitter included in the light source module of Fig. 3A from the direction of the optical axis. [Fig. 4] is a schematic diagram showing the situation when the light beam emitted from the light source module of Fig. 3A is viewed from the X direction and the situation when viewed from the Y direction. [Fig. 5] is a diagram schematically showing the light beam traveling in the XZ plane direction when the collimator lens is arranged at the rear stage of the light source module of Fig. 3A. [Fig. 6] is a diagram schematically showing the structure of the first embodiment of the semiconductor laser light source device. [Fig. 7] is a diagram schematically showing the structure of the semiconductor laser element included in the semiconductor laser light source device. [Fig. 8] is a partially enlarged view of the XZ top view shown in the lower part of Fig. 6. [FIG. 9A] is a graph showing the light intensity distribution at each angle in the slow axis direction and the fast axis direction shown by the light beam group emitted from the collimator lens in the semiconductor laser light source device of Comparative Example 1. [FIG. 9B] is a graph showing the light intensity distribution of each angle in the slow axis direction and the fast axis direction shown in the light beam group after the collimator lens in the semiconductor laser light source device of Comparative Example 2. [FIG. 9C] is a graph showing the light intensity distribution at each angle in the slow axis direction and the fast axis direction shown in the light beam group after the light beam emitted from the lens in the semiconductor laser light source device of the first embodiment. [FIG. 9D] is a graph showing the light intensity distribution of each angle in the slow axis direction and the fast axis direction shown in the light beam group after the light beam emitted from the lens in the semiconductor laser light source device of the second embodiment. [FIG. 9E] is a graph showing the light intensity distribution at each angle in the slow axis direction and the fast axis direction shown in the light beam group emitted from the lens in the semiconductor laser light source device of the third embodiment. [FIG. 9F] is a graph showing the light intensity distribution at each angle in the slow axis direction and the fast axis direction shown in the light beam group emitted from the lens in the semiconductor laser light source device of the fourth embodiment. [FIG. 9G] is a graph showing the light intensity distribution at each angle in the slow axis direction and the fast axis direction shown in the light beam group after the light beam emitted from the lens in the semiconductor laser light source device of the fifth embodiment. [FIG. 9H] is a graph showing the light intensity distribution of each angle in the slow axis direction and the fast axis direction shown in the light beam group after the light beam emitted from the lens in the semiconductor laser light source device of the sixth embodiment. [FIG. 9I] is a graph showing the light intensity distribution at various angles in the slow axis direction and the fast axis direction shown by the light beam group emitted from the lens in the semiconductor laser light source device of the seventh embodiment. [FIG. 9J] In the semiconductor laser light source devices of Examples 1-7 and Comparative Example 2, the light intensity distribution at each angle between the slow axis direction and the fast axis direction shown by the group of light beams emitted from the lens Chart. [Fig. 10] is a diagram schematically showing the structure of the second embodiment of the semiconductor laser light source device. [Fig. 11] is a diagram schematically showing the structure of the third embodiment of the semiconductor laser light source device. [Fig. 12] is a diagram schematically showing the structure of another embodiment of the semiconductor laser light source device.

1:半導體雷射光源裝置 1: Semiconductor laser light source device

10:半導體雷射元件 10: Semiconductor laser components

11:光射出區域 11: Light exit area

12:光線束 12: light beam

12m:主光線 12m: chief ray

13:光線束 13: light beam

13m:主光線 13m: chief ray

20:半導體雷射元件 20: Semiconductor laser components

21:光射出區域 21: Light exit area

22:光線束 22: light beam

22m:主光線 22m: chief ray

23:光線束 23: light beam

23m:主光線 23m: chief ray

30:折射光學系統 30: Refractive optical system

30A:折射光學系統的光軸 30A: Optical axis of refractive optical system

30xf:折射光學系統的第二焦點 30xf: The second focus of the refractive optical system

30yf:折射光學系統的第一焦點 30yf: the first focus of the refractive optical system

31:透鏡 31: lens

dz:距離 dz: distance

Claims (9)

一種半導體雷射光源裝置,其特徵為,具備: 散熱片、 形成在前述散熱片之面之上層且具有光射出區域的複數個半導體雷射元件、以及 供從前述複數個半導體雷射元件所具有的前述光射出區域射出的光線束射入,並變換行進方向來射出的折射光學系統, 至少兩個的前述半導體雷射元件,是在與前述散熱片之面正交的第一方向觀看時互相傾斜地配置,而使從各半導體雷射元件所具有之各自的前述光射出區域射出的前述光線束之主光線彼此互相成為非平行, 前述折射光學系統,是以使第一焦點與第二焦點在前述光軸方向位移的光學系統所構成,該第一焦點是在由前述第一方向與該折射光學系統的光軸方向所形成之第一平面上的焦點,該第二焦點是在由前述光軸方向與正交於前述第一方向的第二方向所形成之第二平面上的焦點。A semiconductor laser light source device, characterized in that it has: heat sink, A plurality of semiconductor laser elements formed on the surface of the aforementioned heat sink and having a light emitting area, and A refractive optical system that enters the light beams emitted from the light-exiting regions of the plurality of semiconductor laser elements and changes the direction of travel to be emitted, At least two of the semiconductor laser elements are arranged obliquely to each other when viewed in a first direction orthogonal to the surface of the heat sink, so that each of the semiconductor laser elements emits the light from the respective light emitting regions The principal rays of the light beam become non-parallel to each other, The refractive optical system is composed of an optical system that displaces a first focus and a second focus in the optical axis direction, and the first focus is formed by the first direction and the optical axis direction of the refractive optical system The focal point on the first plane, and the second focal point is the focal point on the second plane formed by the optical axis direction and the second direction orthogonal to the first direction. 如請求項1所述之半導體雷射光源裝置,其中, 將從鄰接之前述半導體雷射元件所具有的前述光射出區域射出的前述主光線彼此在前述第二方向的間隔定為d1時, 前述複數個半導體雷射元件,互相傾斜地配置成,在前述光軸方向,從前述光射出區域到比前述折射光學系統還靠前述光射出區域側之特定位置為止之間,隨著於前述光軸方向行進而使前述間隔d1變小。The semiconductor laser light source device according to claim 1, wherein: When the distance between the chief rays of light emitted from the light emitting area of the adjacent semiconductor laser element in the second direction is defined as d1, The plurality of semiconductor laser elements are arranged obliquely to each other in the direction of the optical axis, from the light exit area to a specific position on the side of the light exit area than the refractive optical system, and follow the optical axis Directional travel makes the aforementioned interval d1 smaller. 如請求項2所述之半導體雷射光源裝置,其中,前述第二焦點,比前述第一焦點還位於前述光軸方向之靠前述折射光學系統之側。The semiconductor laser light source device according to claim 2, wherein the second focal point is located closer to the refractive optical system in the optical axis direction than the first focal point. 如請求項1所述之半導體雷射光源裝置,其中, 將從鄰接之前述半導體雷射元件所具有的前述光射出區域射出的前述主光線彼此,往與前述折射光學系統相反側之方向虛擬地延長所得到的虛擬主光線彼此之前述第二方向的間隔定為d1時, 前述複數個半導體雷射元件,互相傾斜地配置成,在前述光軸方向,從與前述光射出區域相反側之位置的端面所對應之虛擬光射出區域到特定位置為止之間,隨著於與前述光軸方向相反的方向行進而使前述間隔d1變小。The semiconductor laser light source device according to claim 1, wherein: The chief rays emitted from the light emission regions of the adjacent semiconductor laser elements are virtually extended in the second direction of the resulting virtual chief rays in the direction opposite to the refractive optical system When set to d1, The plurality of semiconductor laser elements are arranged obliquely to each other such that in the direction of the optical axis, from the virtual light emitting area corresponding to the end face at the position opposite to the light emitting area to a specific position, it follows Traveling in the opposite direction of the optical axis direction reduces the aforementioned interval d1. 如請求項4所述之半導體雷射光源裝置,其中,前述第二焦點,比前述第一焦點還位於前述光軸方向之遠離前述折射光學系統之側。The semiconductor laser light source device according to claim 4, wherein the second focal point is located further away from the refractive optical system in the optical axis direction than the first focal point. 如請求項1至5中任一項所述之半導體雷射光源裝置,其中,前述折射光學系統,是由使前述第一方向的焦點距離與前述第二方向的焦點距離不同之單一的透鏡所構成者。The semiconductor laser light source device according to any one of claims 1 to 5, wherein the refractive optical system is composed of a single lens that makes the focal length in the first direction different from the focal length in the second direction Constructor. 如請求項1至5中任一項所述之半導體雷射光源裝置,其中, 前述折射光學系統,具有: 對於從前述光射出區域射出的前述光線束,以使前述第一方向的發散角縮小的前述第一焦點作為焦點的第一透鏡;以及 配置在前述第一透鏡的後段,對於從前述光射出區域射出的前述光線束,以使前述第二方向的發散角縮小的前述第二焦點作為焦點的第二透鏡。The semiconductor laser light source device according to any one of claims 1 to 5, wherein: The aforementioned refractive optical system has: For the light beam emitted from the light exit area, the first lens having the first focal point that reduces the divergence angle in the first direction is used as the focal point; and The second lens is arranged at a rear stage of the first lens, and for the beam of light emitted from the light exit area, the second focal point whose divergence angle in the second direction is reduced is a second lens. 如請求項1至5中任一項所述之半導體雷射光源裝置,其中, 前述折射光學系統,具有: 對於從前述光射出區域射出的前述光線束,以使前述第一方向及前述第二方向的發散角縮小的前述第一焦點為焦點的第一透鏡;以及 配置在前述第一透鏡的後段,對於從前述光射出區域射出的前述光線束,以使前述第二方向的發散角縮小的前述第二焦點作為焦點的第二透鏡。The semiconductor laser light source device according to any one of claims 1 to 5, wherein: The aforementioned refractive optical system has: For the beam of light emitted from the light exit area, a first lens focusing on the first focal point at which the divergence angles in the first direction and the second direction are reduced; and The second lens is arranged at a rear stage of the first lens, and for the beam of light emitted from the light exit area, the second focal point whose divergence angle in the second direction is reduced is a second lens. 如請求項1至5中任一項所述之半導體雷射光源裝置,其中,前述複數個半導體雷射元件,為串聯連接。The semiconductor laser light source device according to any one of claims 1 to 5, wherein the plurality of semiconductor laser elements are connected in series.
TW108148514A 2019-02-07 2019-12-31 Semiconductor laser light source device used to increase light output while suppressing expansion of the device scale TW202032875A (en)

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