TW202030556A - Metrology for a body of a gas discharge stage - Google Patents

Abstract

A light source apparatus includes a gas discharge stage including a three-dimensional body defining a cavity that is configured to interact with an energy source, the body including at least two ports that are transmissive to a light beam having a wavelength in the ultraviolet range; a sensor system comprising a plurality of sensors, each sensor is configured to measure a physical aspect of a respective distinct region of the body of the gas discharge stage relative to that sensor; and a control apparatus in communication with the sensor system. The control apparatus is configured to analyze the measured physical aspects from the sensors to thereby determine a position of the body of the gas discharge stage in an XYZ coordinate system defined by an X axis, wherein the X axis is defined by the geometry of the gas discharge stage.

Description

Weights and measures for the main body of the gas discharge carrier

The disclosed subject relates to controlling the positioning or alignment of the main body of the gas discharge stage to improve the performance of the gas discharge stage.

In semiconductor lithography (or photolithography), the manufacture of integrated circuits (ICs) requires various physical and chemical processing procedures performed on semiconductor (eg, silicon) substrates (which are also called wafers). The lithography exposure device (which is also called a scanner) is a machine that applies a desired pattern to a target area of a substrate. The substrate is fixed to the stage so that the substrate extends substantially along the image plane defined by the orthogonal X _L and Y _L directions of the scanner. The substrate is irradiated with a beam of light having a wavelength somewhere between visible light and x-rays in the ultraviolet range, and thus has a wavelength between about 10 nanometers (nm) and about 400 nm. Therefore, the light beam can have a wavelength in the deep ultraviolet (DUV) range (for example, a wavelength that can be reduced from about 100 nm to about 400 nm), or a wavelength in the extreme ultraviolet (EUV) range (with a wavelength in the range of about 10 nm And a wavelength between about 100 nm). These wavelength ranges are not accurate, and there may be overlaps between whether light is considered DUV or EUV.

The light beam travels along an axial direction that corresponds to the Z _L direction of the scanner. The Z _L direction of the scanner is orthogonal to the image plane (X _L -Y _L ). The light beam passes through the beam delivery unit, is filtered by a reduction mask (or mask), and then projected onto the prepared substrate. The relative positioning between the substrate and the beam moves in the image plane and the processing procedure is repeated at each target area of the substrate. In this way, the wafer design is patterned onto the photoresist, which is then etched and cleaned, and then the process is repeated.

In some general aspects, the light source device includes: a gas discharge stage including a gas discharge stage including a three-dimensional body defining a cavity configured to interact with an energy source, The main body includes at least two ports that can transmit a light beam having a wavelength in the ultraviolet range; a sensor system including a plurality of sensors, each of which is configured to measure the gas discharge A physical aspect of a distinct area of the main body of the carrier relative to the sensor; and a control device that communicates with the sensor system. The control device is configured to analyze the measured physical state from the sensors to thereby determine the position of the main body of the gas discharge stage in an XYZ coordinate system defined by an X axis, The X axis is defined by the geometric structure of the gas discharge stage.

Implementations can include one or more of the following features. For example, the light source device may also include a measurement system configured to measure one or more performance parameters of the light beam generated by the gas discharge stage. The control device can communicate with the measurement system. The control device can be configured to: analyze the position of the main body of the gas discharge stage in the XYZ coordinate system and one or more of the measured performance parameters of the beam; and determine whether the position of the main body of the gas discharge stage has been modified One or more of the measured performance parameters will be improved. The light source device may include an actuation system physically coupled to the body of the gas discharge stage and configured to adjust the positioning of the body of the gas discharge stage. The control device can communicate with the actuation system. The control device may be configured to provide a signal to the actuation system based on a determination as to whether the positioning of the main body of the gas discharge stage should be modified. The actuation system may include a plurality of actuators, each of which is configured to physically communicate with the area of the main body of the gas discharge stage. Each actuator may include one or more of electromechanical devices, servo systems, electric servo systems, hydraulic servo systems, and/or pneumatic servo systems.

The control device can be configured to determine the position of the main body of the gas discharge stage in the XYZ coordinate system by determining the translation of the main body of the gas discharge stage from the X axis or the rotation of the main body of the gas discharge stage from the X axis. The translation of the main body of the gas discharge stage from the X axis may include one or more of the following: the translation of the main body of the gas discharge stage along the X axis, and the main body of the gas discharge stage along Y which is perpendicular to the X axis The translation of the axis, and/or the translation of the main body of the gas discharge stage along the Z axis perpendicular to the X axis and the Y axis. The rotation of the main body of the gas discharge stage from the X axis may include one or more of the following: the rotation of the main body of the gas discharge stage around the X axis, the main body of the gas discharge stage around the Y axis perpendicular to the X axis Rotation, and/or the rotation of the main body of the gas discharge stage along the Z axis perpendicular to the X axis and the Y axis.

Each sensor can be configured to measure the distance from the sensor to the body of the gas discharge stage as the physical state of the body of the gas discharge stage relative to the other sensor.

The gas discharge stage may include a beam steering device at the first end of the main body and a beam coupler at the second end of the main body, the beam steering device and the beam coupler intersect the X axis so that in the gas discharge stage The generated beam interacts with the beam coupler and beam steering device. When the main body of the gas discharge stage is in a series of acceptable positions, the energy source can supply energy to the cavity of the main body, and can be aligned with the beam steering device and beam coupler to generate a light beam. The light beam may be an amplified light beam having a wavelength in the ultraviolet range. The beam steering device may be an optical module including a plurality of optical elements for selecting and adjusting the wavelength of the beam, and the beam coupler includes a partial reflector. The beam steering device may include a configuration of optical parts configured to receive the light beam emitted from the main body of the gas discharge stage through the first port and change the direction of the light beam so that the light beam enters the gas discharge stage through the first port main body. The gas discharge stage may also include a beam expander configured to interact with the beam as it travels between the beam coupler and the cavity.

Each sensor can be configured to be fixedly mounted relative to the main body of the gas discharge stage. Each sensor can be configured to be fixed at a distance from the other sensor when it is fixedly installed relative to the main body of the gas discharge stage.

The light source device may also include: a second gas discharge stage and a second plurality of sensors optically connected in series with the gas discharge stage. The second gas discharge stage includes a second three-dimensional body defining a second cavity configured to interact with the energy source, the second body including at least two ports that can transmit light beams having wavelengths in the ultraviolet range. Each sensor of the second plurality of sensors can be configured to measure the physical state of the respective distinct area of the second body relative to the other sensor. The control device can communicate with the second plurality of sensors, and can be configured to analyze the measured physical state from the sensors in the second plurality of sensors, so as to determine that the second body is relative to The positioning of the second XYZ coordinate system defined by the second X axis through at least two ports of the second body.

Each sensor may include a displacement sensor. The displacement sensor can be an optical displacement sensor, a linear proximity sensor, an electromagnetic sensor and/or an ultrasonic displacement sensor. Each sensor may include a non-contact sensor.

The X axis may be defined by a beam steering device at the first end of the body and optically coupled with the first port and a beam coupler at the second end of the body and optically coupled with the second port.

In other general aspects, a measurement device includes: a sensor system, which includes a plurality of sensors, each sensor is configured to measure the main body of the gas discharge carrier relative to the other sensor Physical state; a measurement system configured to measure one or more performance parameters of the light beam generated by the gas discharge stage; an actuation system, which includes a plurality of actuators, each actuator is set The state is physically coupled to the dissimilar area of the main body of the gas discharge stage, the plurality of actuators work together to adjust the positioning of the main body of the gas discharge stage; and a control device, which is connected to the sensor system and the The measurement system communicates with the actuation system. The control device is configured to: analyze the measured physical state from the sensor to determine the position of the main body of the gas discharge stage in the XYZ coordinate system defined by the X axis defined by the gas discharge stage; analysis; Positioning of the main body of the gas discharge stage; analyzing one or more measured performance parameters; and providing a signal to the actuation system based on the positioning of the main body of the gas discharge stage and the analysis of one or more measured performance parameters To modify the positioning of the main body of the gas discharge stage.

Implementations can include one or more of the following features. For example, the sensors can be located away from each other and relative to the main body of the gas discharge stage.

The control device can be configured to optimize the positioning of the main body of the gas discharge stage by determining a plurality of performance parameters of the beam. Based on the positioning of the main body of the gas discharge stage and the analysis of one or more measured performance parameters The signal is provided to the actuation system to modify the positioning of the main body of the gas discharge stage.

The X axis may be defined by a beam steering device at the first end of the body and optically coupled with the first port and a beam coupler at the second end of the body and optically coupled with the second port.

In other general aspects, one method includes: measuring the physical state of the body at that region at each of the plurality of different regions of the body of the gas discharge stage of the light source; the measurement is carried by the gas discharge One or more performance parameters of the beam generated by the stage; analyze the measured physical state to determine the position of the subject in the XYZ coordinate system defined by the X axis, where the X axis is associated with the gas discharge stage Multiple aperture definitions; analyze the determined positioning of the main body of the gas discharge stage; analyze one or more measured performance parameters; determine whether the modification of the main body of the gas discharge stage will improve one of the measured performance parameters Or more; and if it is determined that the modification of the positioning of the main body of the gas discharge stage will improve one or more of the measured performance parameters, then the positioning of the main body of the gas discharge stage is modified.

Implementations can include one or more of the following features. For example, the positioning of the main body of the gas discharge stage may be modified based on the analysis of the determined position of the main body of the gas discharge stage.

The positioning of the main body of the gas discharge stage can be determined by one or more of the translation of the main body of the gas discharge stage from the X axis and/or the rotation of the main body of the gas discharge stage from the X axis. The body of the gas discharge stage can be translated from the X axis or along the X axis by one or more of the following: the translation of the body of the gas discharge stage along the X axis, the body of the gas discharge stage along and The translation of the Y axis perpendicular to the X axis, and/or the translation of the body of the gas discharge stage along the Z axis perpendicular to the X axis and the Y axis. The body of the gas discharge stage can be rotated from the X axis or around the X axis by one or more of the following: the body of the gas discharge stage rotates around the X axis, and the body of the gas discharge stage rotates perpendicular to the X axis Y axis rotation, and/or the main body of the gas discharge stage rotates along the Z axis perpendicular to the X axis and the Y axis.

The physical state of the main body can be measured by measuring the distance from the sensor to the area of the main body of the gas discharge stage.

Determining whether the modification of the positioning of the main body of the gas discharge stage will improve one or more of the measured performance parameters may include determining the positioning of the main body of the gas discharge stage that optimizes the plurality of measured performance parameters.

The method may also include generating a light beam from a gas discharge stage, including forming a resonator defined by a beam coupler at one side of the main body and a beam steering device at the other side of the main body, and forming a resonator defined by the main body. Energy is generated in the gain medium in the cavity, and the beam coupler and the beam steering device define the X axis.

One or more performance parameters of the beam can be measured by measuring a plurality of performance parameters. The plurality of performance parameters can be measured by measuring two or more of the following: the repetition rate of the pulse beam generated by the light source, the energy of the pulse beam, the duty cycle of the pulse beam, and/or The spectral characteristics of pulsed beams. The method may also include: determining the best position of the body of the gas discharge stage that provides the best set of values of the efficiency parameters of the beam; and modifying the position of the body of the gas discharge stage to be at the best position.

In other general aspects, a metrology kit includes: a sensor system, which includes a plurality of sensors, each sensor is configured to measure the physical aspect of the three-dimensional body relative to the other sensor ; A measurement system, which includes a plurality of measurement devices, each measurement device is configured to measure the performance parameters of the beam; an actuation system, which includes a plurality of configuration to be physically coupled to the three-dimensional body An actuator; and a control device configured to communicate with the sensor system, the measurement system, and the actuation system. The control device includes: a sensor processing module, which is configured to interface with the sensor system and receive sensor information from the sensor system; a measurement processing module, which is configured to measure The measurement system interfaces with and receives measurement information from the measurement system; an actuator processing module, which is configured to interface with the actuation system; and a light source processing module, which is configured to interact with a three-dimensional body Gas discharge carrier interface.

Implementations can include one or more of the following features. For example, the control device may include an analysis processing module that communicates with the sensor processing module, the measurement processing module, the actuator processing module, and the light source processing module. The analysis processing module can be configured to guide the light source processing module in use to adjust one or more characteristics of the gas discharge stage and analyze sensor information and measurement information based on the adjusted characteristics of the gas discharge stage Determine the command to the actuator processing module.

The metrology kit can be modularized so that it can be configured to operably connect and disconnect from one or more gas discharge stages, each gas discharge stage includes a defined generation The respective three-dimensional body of the cavity of the respective beam.

1 and 2A, the device 100 is designed to determine the position of the three-dimensional body 102 relative to the X axis 106 of the coordinate system 104 in the XYZ coordinate system 104. The main body 102 is a part of a gas discharge stage 108 configured to generate a light beam 110 having a wavelength in the ultraviolet range. The body 102 defines a cavity 112 configured to interact with an energy source 114, which may include a pair of electrodes. The energy source 114 may be fixed to the main body 102, as discussed in more detail below.

The gas discharge stage 108 includes a main body 102 and other optical components (such as components 140 and 142) for generating a light beam 110. The gas discharge stage 108 may include other components not shown in FIGS. 1 and 2A. The representation that the gas discharge stage 108 is a rectangular parallelepiped in FIG. 2A does not necessarily correspond to a solid wall and is shown in this way to indicate that it may include other components not shown in the figure. The gas discharge stage 108 may only correspond to a platform on which all optical components (including the main body 102) are placed. The beam 110 output from the gas discharge stage 108 can be used in a device such as a lithography exposure device (as discussed below with reference to FIG. 15) for patterning the substrate W or the beam can be subjected to further processing before being used in the device.

The main body 102 can move relative to the components of the gas discharge stage 108. During operation, the positioning of the main body 102 in the XYZ coordinate system 104 may change due to factors external to the main body 102. For example, the pressure and temperature changes in the gas discharge stage 108 can cause the main body 102 to move in the XYZ coordinate system 104. Another cause of misalignment is the internal change inside the main body 102 that causes the alignment change. For example, this situation can occur when the electrodes of the energy source 114 age and change shape during their use. In addition, the loss on the electrode and the modification of the geometry of the electrode of the energy source 114 are one reason why the body 102 must be exchanged with a new body. In addition, the main body 102 becomes misaligned when it is replaced with a new main body 102. In this case, the new body 102 needs to be properly aligned with the X axis 106.

In the example of FIGS. 1 and 2A, the main body 102 is aligned with the X axis 106. The alignment between the main body 102 and the X-axis 106 can be determined based on the degree of alignment between the longitudinal axis Ab of the main body 102 and the X-axis 106. FIG. 2B shows the longitudinal axis Ab of the main body 102. The longitudinal axis Ab may be defined as the other axis intersecting the two ports 118, 120 at the end of the main body 102. Ports 118, 120 can transmit light beam 122 (which will form light beam 110) having a wavelength in the ultraviolet range.

3A to 3F, the main body 102 of the gas discharge stage 108 may be misaligned with respect to the X-axis 106 in one or more ways. For example, in FIG. 3A, the main body 102 is rotated around the Y axis to be out of alignment and its longitudinal axis Ab is not aligned with the X axis 106. In FIG. 3B, the main body 102 is rotated around the Z axis to be out of alignment and its longitudinal axis Ab is not aligned with the X axis 106. And in FIG. 3C, the main body 102 rotates around the X axis and is out of alignment. In this case, the longitudinal axis Ab is displaced along the X axis 106. If the main body 102 is configured to rest on the platform, it is supported by gravity and the plane of the earth is the XY plane. In this case, a common misalignment is the misalignment shown in FIG. 3B, in which the main body 102 rotates around the Z axis and is misaligned.

In FIG. 3D, the main body 102 is translated along the Y axis out of alignment and the longitudinal axis Ab is displaced from the X axis 106 along the Y axis. In FIG. 3E, the main body 102 is translated along the Z axis out of alignment and the longitudinal axis Ab is displaced from the X axis 106 along the Z axis. And in FIG. 3F, the main body 102 is translated along the X axis 106 to be out of alignment and the longitudinal axis Ab is displaced along the X axis 106. If the main body 102 is configured to rest on the platform and supported by gravity and the plane of the earth is the XY plane, the common misalignment that has a relatively large impact on the efficiency of the gas discharge stage 108 is shown in FIG. 3D Misaligned, where the body 102 translates along the Y axis.

It is possible that the main body 102 is misaligned in more than one way, and thus the main body can translate and rotate, translate along more than one axis, or rotate about more than one axis.

Certain misalignments with the main body 102 may have different effects on the efficacy and operation of the gas discharge stage 108. In addition, some adjustments may be more available or feasible for modification. For example, translation along the Y axis (shown in FIG. 3D) and rotation around the Z axis (shown in FIG. 3B) can be performed relatively easily, and thus its effect on the efficiency and operation of the gas discharge stage 108 Can be tracked. Therefore, in this example, the device 100 determines the translation of the body 102 along the Y axis and determines the rotation value (angle) of the body 102 around the Z axis. The device 100 determines that the translation of the main body 102 along either or both of the other two axes and the rotation value around either or both of the other two axes are possible.

The positioning of the main body 102 relative to the X-axis 106 or the misalignment of the main body 102 relative to the X-axis 106 affects the efficiency of the operation of the gas discharge stage 108. If the main body 102 is misaligned with respect to the X-axis 106, this can result in inefficient operation of the gas discharge stage 108, and this can result in a reduced quality of the light beam 110. For example, the path of the beam 110 coincides with the X-axis 106, and the X-axis 106 is determined based on the apertures associated with the optical components 140 and 142. The energy source 114 (including electrodes) fixed to the main body 102 supplies energy to the cavity 112 to use discharge pumping gas. The energy source 114 is used to pump the gas to generate a plasma state of the gas. In addition, when this plasma state is aligned with the X-axis 106 (this happens when the main body 102 is properly aligned with the X-axis 106), the cavity of the resonator (which is formed by the components 140, 142 and is formed along the X-axis 106) There is an efficient coupling between the defined) and the plasma state, and the parameters of the beam 110 are improved. On the other hand, when the plasma state is not aligned with the X-axis 106 (this occurs when the main body 102 is not aligned with the X-axis 106), there is an inefficient coupling between the cavity of the resonator and the plasma state, and the beam 110 parameters are damaged. For example, the efficiency of the operation of the gas discharge stage 108 decreases. In this case, more energy is then required to be supplied to the main body 102 (for example, by means of the energy source 114) in order to maintain the performance parameters of the beam 110.

As another example, in the dual stage design discussed below with reference to FIG. 12, the misalignment of the main body 102 in the first gas discharge stage 1272 results in a lower efficiency of the first gas discharge stage 1272, which results in receiving The reduction efficiency of the second gas discharge stage 1273 of the light beam 1273 output from the first gas discharge stage 1272. Subsequently, unless the operation of the second gas discharge stage 1273 is changed, this causes the operation of the second gas discharge stage 1273 to be impaired.

The device 100 provides a quantitative measurement for this alignment, as well as a fast and accurate orientation measurement of the positioning of the main body 102 relative to the X-axis 106, which was not previously provided. In addition, the device 100 determines the position of the main body 102 relative to the X-axis 106 without relying on the slow and inaccurate measurement of the performance of the gas discharge stage 108.

In detail, the device 100 uses a plurality of direction measurements of the main body 102 to determine the position of the main body 102 relative to the XYZ coordinate system 104, as discussed below.

In some implementations, the device 100 can be operated during the use of the gas discharge stage 108 in which the light beam 110 is generated to determine the position of the main body 102. In other implementations, after the main body 102 is initially installed in the system, but before it is used to generate the light beam 110 for use by the device, the device 100 may be operated to determine the position of the main body 102.

The device 100 includes a sensor system 124 whose output is used to determine the position of the body 102 relative to the X-axis 106. The sensor system 124 includes at least two sensors 124 a and 124 b for providing direction measurement values of the main body 102. Although two sensors 124a and 124b are shown in FIG. 1, it is possible that the sensor system 124 has more than two sensors. Each sensor 124a, 124b is configured to measure the physical state of the respective different area 126a, 126b of the main body 102 of the gas discharge stage 108 relative to the sensor 124a, 124b.

The device 100 includes a control device 128 that communicates with each of the sensors 124a, 124b of the sensor system 124. The control device 128 is configured to analyze the measured physical state from the sensors 124 a and 124 b to thereby determine the position of the main body 102 of the gas discharge stage 108 relative to the X axis 106.

The main body 102 may be any shape configured to contain the gas mixture including the gain medium in the cavity 112. When sufficient energy is provided by the energy source 114 to form a plasma state, optical amplification appears in the gain medium. The gas mixture can be any suitable gas mixture configured to generate an amplified light beam (or laser beam) of approximately the desired wavelength and bandwidth. For example, the gas mixture may include argon fluoride (ArF) that emits light at a wavelength of about 193 nm or krypton fluoride (KrF) that emits light at a wavelength of about 248 nm.

In addition, the optical feedback mechanism may be configured or configured relative to the main body 102 to provide an optical resonator, as discussed in detail below.

The energy source 114 may include two elongated electrodes extending in the cavity 112 and fixed to the main body 102. The current supplied to the electrodes causes an electromagnetic field to be generated in the cavity 112, which provides the required energy to the gain medium to form a plasma state in which optical amplification occurs. The main body 102 may also contain a fan that circulates the gas mixture between the electrodes.

The main body 102 is made of a rigid and non-reactive material such as a metal alloy (stainless steel). The main body 102 can have any suitable geometric structure, and the geometric structure is determined by the arrangement of the electrodes and the ports 118 and 120. The main body 102 may have a rectangular parallelepiped shape or a cube shape. As shown in FIG. 2A, the main body 102 has a rectangular parallelepiped shape having two flat parallel surfaces 130x and 131x intersected by the X axis 106 and four flat surfaces 132z, 132z extending between the flat surfaces 130x and 131x, 133z, 134y, 135y. The surfaces 132z, 133z are parallel to each other and intersect by the Z axis and the surfaces 134y, 135y are parallel to each other and intersect by the Y axis. In this example, zones 126a, 126b are tied to the surface of 134y. In other implementations, the regions 126a, 126b may be on other surfaces of the main body 102 or on several different surfaces.

The ports 118 and 120 on the main body 102 can transmit the light beam 122 forming the light beam 110. Therefore, the ports 118, 120 can transmit light having a wavelength in the ultraviolet range. The ports 118, 120 can be made of rigid substrates such as fused silica or calcium fluoride that can be coated with anti-reflective materials. The ports 118 and 120 may have flat surfaces that interact with the light beam 122. Because the cavity 112 of the main body 102 holds or holds the gas mixture, the main body 102 needs to be closed or sealed, and it can be airtightly sealed. Therefore, the ports 118 and 120 are also hermetically sealed in the respective openings of the main body 102 to ensure that the gas mixture does not leak out of the main body 102 at the joint between the port and the main body 102.

In some implementations, the X axis 106 and the XYZ coordinate system 104 are defined by the design of the gas discharge stage 108. In detail, the X axis 106 is defined as a line passing through two apertures in the gas discharge stage 108. These two apertures can be positioned adjacent to the respective optical components 140, 142 that interact with the main body 102 in the gas discharge stage 108. In this way, the optical components 140, 142 and their apertures define the X axis 106 (and therefore the XYZ coordinate system 104). In addition, these optical components 140, 142 define optical resonators for forming the light beam 110.

In some implementations, the optical components 140 and 142 may form an optical feedback mechanism to provide an optical resonator and thereby output the light beam 110 from the light beam 122. Therefore, when the main body 102 of the gas discharge stage 108 is in a series of acceptable positions, the energy source 114 supplies energy to the cavity 112 of the main body 102, and the optical components 140 and 142 are aligned to generate the light beam 122.

In some implementations, the optical component 140 may be a spectral characteristic device that receives the pre-verner light beam 121 and enables the spectral characteristic of the light beam 122 to be fine-tuned by adjusting the spectral characteristic of the primary cursor light beam 121. The spectral features that can be adjusted using the spectral feature device include the center wavelength and bandwidth of the light beam 122. The spectral feature device includes a set of optical features or components configured to optically interact with the preliminary cursor beam 121. The optical components of the spectral characteristic device include, for example, a dispersive optical element (which may be a grating), and a beam expander made of a set of refractive optical elements (which may be a beam). The optical component 142 may be an output coupler that allows the light beam 122 to be extracted from the intracavity beam. The output coupler may include a partial mirror to allow a certain part of the intracavity beam to be transmitted through as the beam 122. The gas discharge stage 108 may also include a beam expander configured to interact with the beam 122 as the beam 122 travels between the output coupler (optical assembly 142) and the cavity 112.

In other implementations, the optical component 140 may be a beam steering device and the optical component 142 may be a beam coupler. The beam steering device includes a configuration of optical parts configured to receive the primary cursor beam 121 emitted from the main body 102 of the gas discharge stage 108 through the port 118 and change the direction of the beam 121 so that the beam 121 re-enters through the first port 118 The main body of the gas discharge stage.

As discussed above, each sensor 124a, 124b in the sensor system 124 is configured to measure the physical state of the body 102 of the gas discharge stage 108 relative to the other sensors 124a, 124b. Each of the sensors 124a and 124b can measure the distance from the sensors 124a and 124b to the main body 102 of the gas discharge stage 108 as the physical form of the main body 102.

In various implementations, the sensors 124a, 124b are mounted to the mechanically stable structure of the gas discharge stage 108, wherein the structure holds the sensors 124a, 124b relative to each other and relative to the defined X axis 106, or defines the XYZ coordinates The components of the system 104 are in fixed positioning. For example, the sensors 124a, 124b can be mounted on an optical table or on other stable mechanical mounts rigidly coupled to optical elements (such as optical elements 140, 142) that delimit the X axis 106. X The axis is the optical axis of the system.

For example, each sensor 124a, 124b is configured to be fixedly mounted relative to the XYZ coordinate system 104. Therefore, the sensors 124a and 124b are fixed relative to the XYZ coordinate system 104 during the measurement. In addition, each sensor 124a, 124b is configured to be fixed at a distance from the other sensor 124b, 124a when it is fixedly installed relative to the XYZ coordinate system 104. Therefore, the distance d(ss) between the sensors 124a and 124b is fixed during operation and measurement. The distance d (ss) between the sensors 124a, 124b is large enough along the X axis 106 so that the control device 128 may determine the rotation about the Z axis (FIG. 3B) based on the output from the sensors 124a, 124b. In detail, the relative change between the output from each of the sensors 124a, 124b can be used to determine the rotation about the Z axis (FIG. 3B). The sensors 124a, 124b have a measurement resolution fast enough to achieve alignment. For example, a time resolution of 1 second (s) can be fast enough; or a time resolution of less than 1 s (for example, 0.1 s) can be fast enough.

In some implementations, each sensor 124a, 124b includes a displacement sensor. The displacement sensor can be an optical displacement sensor, a linear proximity sensor, an electromagnetic sensor or an ultrasonic displacement sensor.

Each sensor 124a, 124b can be a non-contact sensor, which means that it is not in contact with the main body 102. In this design where the sensors 124a, 124b are non-contact type, the measured value itself does not significantly (for example, greater than 1µ) replace the main body 102, because any such displacement can affect the gas discharge stage 108 efficacy.

Any non-contact metrology with a suitable resolution (for example, a resolution better than 10 µm (ie, less than 10 µm)) is suitable for this application. An example of a non-contact sensor is a laser displacement sensor, which is an off-the-shelf product including a laser light source and a photodiode array. The laser light source of each sensor 124a, 124b irradiates light on the surface 134y of the main body 102; the light is reflected back toward the respective sensors 124a, 124b; and the reflected light lands on the position of the diode array This corresponds to the displacement of the surface 134y of the main body 102.

In other implementations, the sensors 124a, 124b are contact sensors, which have minimal contact with the main body 102 at the respective regions 126a, 126b. For example, the sensor may be an electromechanical device used to convert the mechanical motion of the main body 102 into a variable current, voltage, or electrical signal. An example of such a sensor is a linear variable shift converter (LVDT), which is a device that provides a voltage output related to the characteristic (positioning) being measured.

The control device 128 includes one or more of digital electronic circuits, computer hardware, firmware, and software. The control device 128 includes a memory, and the memory may be a read-only memory and/or a random access memory. Storage devices suitable for tangibly embodying computer program instructions and data include all forms of non-volatile memory, including (by way of example) semiconductor memory devices, such as EPROM, EEPROM and flash memory devices; magnetic disks, such as internal Hard disk drives and removable disks; magneto-optical disks; and CD-ROM disks. The control device 128 may also include one or more input devices (such as a keyboard, a touch screen, a microphone, a mouse, a handheld input device, etc.) and one or more output devices (such as a speaker or a monitor).

The control device 128 includes one or more programmable processors, and one or more computer program products tangibly embodied in a machine-readable storage device for the programmable processors to execute. One or more programmable processors can each execute instruction programs to perform desired functions by operating on input data and generating appropriate output. Generally speaking, the processor receives commands and data from the memory. Any of the foregoing can be supplemented or incorporated into a specially designed application-specific integrated circuit (ASIC).

The control device 128 includes a set of modules, where each module includes a set of computer program products executed by one or more processors such as processors. In addition, any of these modules can access data stored in the memory. Each module can receive data from other components and then analyze this data as needed. Each module can communicate with one or more other modules.

Although the control device 128 is represented as a block (in which all its components can be co-located), the control device 128 may be composed of components that are physically distant from each other. For example, a specific module may be physically co-located with the sensor system 124 or a specific module may be physically co-located with another component.

Referring to Figure 4, in some implementations, the sensors 124a, 124b are configured to interact with the surface 134y. In these implementations, the sensors 124a, 124b are mounted on the platform 144, which supports the weight of the sensors 124a, 124b and maintains the stability of the sensors 124a, 124b. In FIG. 4, the platform 144 is a tripod frame or bracket. Figure 5 shows a side cross-sectional view of the configuration. In FIG. 5, the platform 144 is the basic platform base 544 on which the sensors 124a and 124b are placed. The platform base 544 can be integrated into the frame or other components fixed in the gas discharge stage 108. The sensors 124a, 124b can be resettable; that is, the sensors 124a, 124b can be placed at any position relative to any two areas of the main body 102 and then moved to two relative to the main body 102. Another location in other districts.

As shown in FIG. 5, the energy source 114 is a pair of electrodes 514A and 514B arranged in the cavity 112. The electrodes 514A, 514B extend along the X axis 106.

Referring also to FIG. 6, each sensor 124a, 124b measures the distance or displacement from the respective area 126a, 126b of the surface 134y of the main body 102. For example, the sensor 124a measures the displacement d(a) from the sensor 124a to the area 126a of the surface 134y and the sensor 124b measures the displacement d from the sensor 124b to the area 126b of the surface 134y (b). In addition, the calculation performed by the control device 128 requires a set of reference displacements, D(a) and D(b). The reference displacements D(a) and D(b) are used by the respective sensors 124a during the proper alignment of the main body 102 with the X axis 106 and the XYZ coordinate system 104 (this is shown by the dashed box marked 102_ref) , 124b measured value obtained. In some implementations, proper alignment between the main body 102 and the X-axis 106 can be assumed to occur when the gas discharge stage 108 is operating at its highest efficiency (e.g., when most of the energy input via the energy source 114 is converted into the beam 110 In the energy time).

The values of the shifts d(a) and d(b) output from the respective sensors 124a and 124b are not necessarily linearly independent of each other. This means that the shift of one (such as d(a)) can be written according to the other (such as d(b)). It is possible to use additional information to transform such linearly related values into linearly independent values. In this case, the distance L taken along the X axis 106 between the regions 126a, 126b when the main body 102 is aligned with the X axis 106 can be used to provide this transformation. In particular, the distance L and d(a) and d(b) can be used to determine the relative positioning of the center of the main body 102 (given by R) and the relative angular orientation θ of the main body around the Z axis, as discussed below.

；且

。The relative displacements d'(a) and d'(b) are given by:

; And

.

。And the relative displacement R of the main body 102 is defined as half of the sum of the relative displacements d'(a) and d'(b) as follows:

.

。The relative angular orientation θ can be approximated as the ratio of the difference between the relative displacements d'(a) and d'(b) to the distance L as follows:

.

The small-angle approximation is called because of L˃˃|d'(a)−d'(b)|. For example, L is about hundreds of millimeters (mm) (for example, 0.5 to 0.7 meters) and |d'(a)−d'(b)| is about one mm.

Referring to FIG. 7, in some implementations, the device 700 is designed not only to determine the position of the three-dimensional body 102 but also to move the body 102 in the XYZ coordinate system 104. For this purpose, the device 700 is substantially similar to the device 100 and includes all the components detailed above and shown in FIG. 1 and the discussion of those components is not repeated herein.

The device 700 additionally includes an actuation system 754 physically coupled to the main body 102 of the gas discharge stage 108, and the actuation system 754 is configured to adjust the positioning of the main body 102 of the gas discharge stage 108 in the XYZ coordinate system 104. The control device 128 communicates with the actuation system 754 and is configured to provide signals to the actuation system 754 based on the output from the sensor system 124. In detail, the control device 128 determines whether the positioning of the main body 102 of the gas discharge stage 108 has been modified based on the output from the sensor system 124, and the control device 128 determines to adjust to one or more of the actuation systems 754 based on this determination. Signal way.

The actuation system 754 includes a plurality of actuators 754a, 754b, etc., each of which is configured to communicate with entities such as respective areas 756a, 756b of the main body 102 of the gas discharge stage 108. Although the actuation system 754 is shown in physical communication with the surface 134y, the actuation system 754 may include one or more actuators in physical communication with one or more other surfaces of the main body 102. In addition, the actuation system 754 does not have to physically communicate with the same surface or the surface measured by the sensor system 124.

Each actuator 754a, 754b may include one or more of electromechanical devices, servo systems, electric servo systems, hydraulic servo systems, and/or pneumatic servo systems. The various movements imparted to the regions 756a, 756b are used for any of the rotation directions detailed above with respect to FIGS. 3A to 3C and along any of the translation directions detailed above with respect to FIGS. 3D to 3F Adjust the positioning of the main body 102.

Referring to Figure 8, in some implementations, each individual zone 756a, 756b is associated with a rotary mount 857a, 857b attached to the surface 134y. The rotating mounts 857a, 857b are actuated by rotation, and the rotation is converted into translational movement. Therefore, for example, the mounting member 857a rotates clockwise to translate the rod fixed to the area 756a in the -Y direction (this causes the area 756a to translate in the -Y direction). At the same time, the rotation of the mounting member 857a in the counterclockwise direction causes the rod fixed to the area 756a to translate along the Y direction (this causes the area 756a to translate along the Y direction). By rotating the mounts 857a, 857b simultaneously and synchronously (in the same direction), the main body 102 is translated along the Y axis, as shown in FIG. 3D. Simultaneously and asynchronously (in opposite directions) rotating the mounts 857a, 857b causes the main body 102 to rotate on the Z axis, as shown in FIG. 3B. For example, rotating one mounting member 857a clockwise while rotating the other mounting member 857b counterclockwise causes the region 756a to translate along the −Y direction and causes the region 756b to translate along the Y direction and this causes the main body 102 to rotate about the Z axis. It is possible to perform both synchronous and asynchronous rotation of the mounts 857a, 857b to impart translation along the Y axis and rotation around the Z axis to the main body 102. In this example, the rotary mounts 857a, 857b at the respective areas 756a, 756b are controlled by the actuators 754a, 754b, respectively. The actuators 754a and 754b can be any device that rotates the mounting members 857a and 857b, respectively. In addition, the rotation of the mounting members 857a, 857b can be in incremental steps.

Referring to FIG. 9, in some implementations, the device 900 is designed to not only determine the position of the three-dimensional body 102 (using the sensor system 124), and adjust the position of the body 102 (using the actuation system 754), but also measure or monitor the gas The performance or performance characteristics of the discharge stage 108. As discussed above, the alignment of the main body 102 affects or changes the performance of the gas discharge stage 108, and thus it is expected that the misalignment of the main body 102 will reduce the performance. For this purpose, the device 900 is substantially similar to the device 700 and includes all the components detailed above and shown in FIG. 1 and the discussion of these components is not repeated herein.

The device 900 additionally includes a measurement system 960 configured to measure the performance parameters of the light beam 110. Examples of performance parameters include the energy E of the beam 110, spectral characteristics such as the bandwidth or wavelength of the beam 110, and the dose of the beam 110 at a device such as a lithographic exposure device. The control device 128 communicates with the measurement system 960. In this way, the control device 128 can find the best or improved positioning or alignment of the body 102 that provides the best or improved one or more performance parameters. Because the performance of the gas discharge stage 108 is measured based on many different parameters, the parameter space including a plurality of parameters can be considered by the control device 128 when making a determination. For example, the control device 128 can perform adaptive control for adjusting the positioning of the main body 102, which provides a set of performance parameters of the beam 110 that fall within an acceptable range.

The measurement system 960 may include one or more measurement devices, where each measurement device is positioned relative to the beam 110 and measures a specific performance parameter. The measurement system 960 may include an energy monitor for measuring the energy of the light beam 110 as a measurement device. The measurement system 960 may include a spectral characteristic analysis device configured to measure the spectral characteristic (bandwidth or wavelength) of the light beam 110 as a measuring device. In these cases, the measurement device may be a device that has been included in the gas discharge stage 108 or is a part of an analysis module that has been presented to measure the light beam 110. For example, the analysis module may include a wavelength meter and a bandwidth meter, which includes an etalon with an imaging lens, beam homogenization optics, and other components. The analysis module may also include a photodetector module (PDM) that monitors the energy of the light beam 110 and provides fast photodiode signals for diagnostic and timing purposes. In some implementations, one or more energy sensors can be placed anywhere along the path of the light beam 110. The control device 128 may estimate the efficiency of the gas discharge stage 108 based on the ratio of the measured energy to the energy input via the energy source 114 (which may be the voltage applied to the electrode of the energy source 114).

The measurement device may be associated with the diagnosis within the spectral characteristic adjuster (such as the spectral characteristic adjuster 1275 shown in FIG. 12). The spectral characteristic adjuster 1275 receives the preliminary cursor beam 1276 from the main body 102 of the gas discharge stage 1272 to enable fine adjustment of spectral parameters (such as the center wavelength and bandwidth of the beam 1274 at relatively low output pulse energy). It is possible to monitor the beam expander optics in the spectral characteristic adjuster 1272 to track the spectral characteristics (such as bandwidth) of the beam 110, because the beam expander in the spectral characteristic adjuster 1275 directly matches the beam 1274 (and therefore the beam 110) Bandwidth is related.

The measurement system 960 may include a measurement device configured to measure the dose of the light beam 110 at the lithographic exposure apparatus. The measurement system 960 may include a measurement device configured to measure the repetition rate at which the pulse of the light beam 110 is generated. The measurement system 960 may include a measurement device configured to measure the duty cycle of the light beam 110. These measurement devices may include laser energy detectors (such as light detectors). In this example, the dose can be estimated as the sum of the energy in a fixed number of pulses detected by the laser energy detector; the repetition rate can be estimated as any two detected by the laser energy detector The reciprocal of the time between pulses (usually fixed); and the duty cycle can be arbitrarily defined as the number of pulses fired in a time frame (such as the latest two minutes) divided by the maximum repetition rate multiplied by the time frame (such as two minutes) ) The number of passes. The measurement device may also include a timer so that the control device 128 can calculate the repetition rate and the duty cycle from the output.

The control device 128 can send an independent signal to the actuators 754a, 754b, read an independent measurement value from each of the sensors 124a, 124b, and read from each of the measurement devices in the measurement system 960 Read the independent measurement value.

In operation, the control device 128 analyzes the positioning of the main body 102 of the gas discharge stage 108 (which is received from the sensor system 124) and one or more of the measured performance parameters of the light beam 110 (which is received from the measurement system 960). By. The control device 128 determines whether the modification of the positioning of the main body 102 of the gas discharge stage 108 will improve one or more of the measured performance parameters. The control device 128 may execute a processing procedure of mapping the positioning space and determining the optimal positioning of the optimal performance parameter (or parameters).

Referring to FIG. 11, an example of the alignment feedback control processing program is shown in a surface topography map 1162 in which the positioning of the main body 102 can be rotated around the Z axis (Figure 3B) and translated along the Y axis ( Figure 3D), or both. The map 1162 shows the value of the performance parameter (such as energy) relative to the value of the rotation around the Z axis (1162Z) and the value of the translation along the Y axis (1162Y). Because the mapping is a surface topography mapping, the value of energy is listed on each line. The shape of the three-dimensional surface corresponding to the map 1162 is drawn by this contour line, and the relative interval of the lines indicates the relative slope of the three-dimensional surface.

In this example, the control device 128 receives the position measured by the sensors 124a, 124b when controlling the actuators 754a, 754b to generate a mapping 1162 of the energy of the light beam 110. A higher value of energy indicates a more efficient energy value. Therefore, the positioning value of the main body 102 along the Y axis and the rotation angle of the main body 102 around the Z axis are determined, which provides the most efficient energy value of the light beam 110. In some implementations, the feedback control process can be configured to intelligently find the peak of the mapping (and therefore the peak of energy) without mapping the entire space. For example, the search path 1164 shows a specific way to modify the position of the body 102 along the Y axis and rotate the body 102 around the Z axis to obtain the most efficient energy value of the beam 110.

The feedback control processing program can be a nonlinear optimization problem that finds the best solution (the peak value of the mapping or the peak value of the energy) from all feasible solutions. For example, the processing procedure may be gradient ascent, which is a first-order iterative optimization algorithm used to find the maximum value of a function.

12, in some implementations, the gas discharge stage 108 may be incorporated into the dual stage light source 1270. The light source 1270 is designed as a pulsed light source that generates an amplified light beam 1271 of optical pulses. The light source 1270 includes a first gas discharge stage 1272 and a second gas discharge stage 1273. The second gas discharge stage 1273 and the first gas discharge stage 1272 are optically connected in series. Generally speaking, the first stage 1272 includes a first gas discharge chamber containing an energy source and containing a gas mixture including a first gain medium. The second gas discharge stage 1273 includes a second gas discharge chamber containing an energy source and containing a gas mixture including a second gain medium.

The first stage 1272 includes a master oscillator (MO) and the second stage 1273 includes a power amplifier (PA). MO provides seed beam 1274 to PA. The master oscillator usually includes a gain medium (where amplification occurs) and an optical feedback mechanism (such as an optical resonator). The power amplifier usually includes a gain medium, where the amplification occurs when inoculated with the seed beam 1274 of the autonomous oscillator. If the power amplifier is designed as a regenerative ring resonator, it is described as a power ring amplifier (PRA), and in this case, the self-loop design can provide sufficient optical feedback.

The spectral characteristic adjuster 1275 receives the primary cursor beam 1276 from the master oscillator of the first stage 1272 to enable fine adjustment of spectral parameters (for example, the center wavelength and bandwidth of the beam 1274 at relatively low output pulse energy). The power amplifier autonomously controlled oscillator receives the light beam 1274 and amplifies the output to achieve the necessary output power for the photolithography exposure device to use in photolithography.

The main control oscillator includes a discharge chamber with two elongated electrodes, laser gas acting as a gain medium, and a fan that circulates the gas between the electrodes. The laser resonator is formed between the spectral characteristic adjuster 1275 on one side of the discharge chamber and the output coupler 1277 on the second side of the discharge chamber to output the seed beam 1274 to the power amplifier.

The power amplifier includes a power amplifier discharge chamber, and if it is a regenerative loop amplifier, the power amplifier also includes a beam reflector or beam steering device that reflects the light beam back into the discharge chamber to form a circulation path. The discharge chamber of the power amplifier includes a pair of elongated electrodes, a laser gas serving as a gain medium, and a fan for circulating the gas between the electrodes. The seed beam 1274 is amplified by repeatedly passing through the power amplifier. The second stage 1273 may include a beam modification optical system that provides a way to in-couple the seed beam 1274 and out-couple a part of the amplified radiation from the power amplifier to form the amplified beam 1271 (for example, a partial mirror).

The laser gas used in the discharge chamber of the master oscillator and the power amplifier can be any suitable gas used to generate a laser beam of approximately the required wavelength and bandwidth. For example, the laser gas can be argon fluoride (ArF) emitting light with a wavelength of about 193 nm, or krypton fluoride (KrF) emitting light with a wavelength of about 248 nm.

Generally speaking, the light source 1270 may also include a control system 1278 that communicates with the first stage 1272 and the second stage 1273. The control system 1278 includes one or more of digital electronic circuits, computer hardware, firmware, and software. The control system 1278 includes memory, which may be read-only memory and/or random access memory. Storage devices suitable for tangibly embodying computer program instructions and data include all forms of non-volatile memory, including (by way of example) semiconductor memory devices, such as EPROM, EEPROM and flash memory devices; magnetic disks, such as internal Hard disk drives and removable disks; magneto-optical disks; and CD-ROM disks. The control system 1278 may also include one or more input devices (such as a keyboard, a touch screen, a microphone, a mouse, a handheld input device, etc.) and one or more output devices (such as a speaker or a monitor).

The control system 1278 includes one or more programmable processors, and one or more computer program products tangibly embodied in a machine-readable storage device for the programmable processors to execute. One or more programmable processors can each execute instruction programs to perform desired functions by operating on input data and generating appropriate output. Generally speaking, the processor receives commands and data from the memory. Any of the foregoing can be supplemented or incorporated into a specially designed application-specific integrated circuit (ASIC).

The control system 1278 includes a set of modules, where each module includes a set of computer program products executed by one or more processors such as the processors. In addition, any of these modules can access data stored in the memory. Each module can receive data from other components and then analyze this data as needed. Each module can communicate with one or more other modules.

Although the control system 1278 is shown as a box (where all its components can be co-located), the control system 1278 may be composed of components that are physically distant from each other. For example, the specific module may be physically co-located with the optical source 1270 or the specific module may be physically co-located with the spectral characteristic adjuster 1275. In addition, the control system 1278 may be a module incorporated into the control device 128.

The first gas discharge stage 1272 may correspond to the gas discharge stage 108. The second gas discharge stage 1273 may correspond to the gas discharge stage 108. Or each of the first gas discharge stage 1272 and the second gas discharge stage 1273 may correspond to the gas discharge stage 108. Therefore, the device 100, 700, or 900 described above can be designed to determine the positioning of the main body in the first gas discharge stage 1272; adjust the position of the main body in the first gas discharge stage 1272; and adjust based on the positioning The performance parameters associated with the first gas discharge stage 1272 are monitored. Additionally or alternatively, the device 100, 700, or 900 described above may be designed to determine the positioning of the main body in the second gas discharge stage 1273; adjust the positioning of the main body in the second gas discharge stage 1273; and The positioning adjustment monitors the performance parameters associated with the second gas discharge stage 1273. The adjustment and optimization of the positioning of the main body in the second gas discharge stage 1273 can be performed simultaneously with the adjustment and optimization of the positioning of the main body in the first gas discharge stage 1272. In addition, the performance parameters associated with the first gas discharge stage 1272 can be measured by measuring the performance parameters of the seed beam 1274 or the amplified beam 1271 (which is generated from the seed beam 1273). The performance parameters associated with the second gas discharge stage 1273 can be measured by measuring the performance parameters of the amplified light beam 1271.

If both the first gas discharge stage 1272 and the second gas discharge stage 1273 are under the control of the device 100, 700, or 900, a single control device 128 can be configured to interact with two sensor systems 124, two The actuation system 754 and the two measurement systems 960 communicate.

Referring to FIG. 13, a metrology kit 1380 includes components that make up a device (such as device 900). The metrology suite 1380 is suitable because it does not need to be fixed or associated with a single gas discharge stage 108 and can be moved from one gas discharge stage 108 to another. In addition, because of this, the metrology kit 1380 for more than one gas discharge stage 108 can be used instead of the device 900 provided for each gas discharge stage 108, which is more expensive.

The metrology suite 1380 includes a sensor system 1324, which includes a plurality of sensors 1324a, 1324b...1324i (where i is any integer greater than 1). Each sensor 1324a, 1324b...1324i is configured to measure the physical state of the three-dimensional body 102 relative to the other sensor. The metrology suite 1380 includes a measurement system 1360, which includes at least one measurement device 1360a, 1360b...1360j (where j is any integer). Each measuring device 1360a, 1360b...1360j is configured to measure the performance parameters of the beam 110. The metrology suite 1380 includes an actuation system 1354 that includes a plurality of actuators 1354a, 1354b...1354k configured to be physically coupled to the main body 102.

The metrology suite 1380 includes a control device 1328 configured to communicate with the sensor system 1324, the measurement system 1360, and the actuation system 1354. The control device 1328 includes a sensor processing module 1381 configured to interface with the sensor system 1324 and receive sensor information from the sensor system 1324. The control device 1328 includes a measurement processing module 1382 configured to interface with the measurement system 1360 and receive measurement information from the measurement system 1360. The control device 1329 includes an actuator processing module 1383 configured to interface with the actuation system 1354.

The control device 1328 may also include a light source processing module 1384 configured to interface with the gas discharge stage 108 having the three-dimensional body 102.

For example, the control device 1328 may also include an analysis processing module 1385 communicating with the sensor processing module 1381, the measurement processing module 1382, the actuator processing module 1383, and the light source processing module 1384. The analysis and processing module 1385 is configured to instruct the light source processing module 1384 in use to adjust one or more characteristics of the gas discharge stage 108 and analyze the sensor information (from the sensor system 1324) and measurement information (from the sensor system 1324). The measurement system 1360) and the command to the actuator processing module 1383 are determined based on the adjusted characteristics of the gas discharge stage 108.

The metrology kit 1380 is modularized so that it is configured to operably connect to and disconnect from one or more gas discharge stages 108. Each gas discharge stage 108 includes a respective three-dimensional body 102 defining a cavity 112 that generates a respective light beam 110. Therefore, when the positioning of the main body 102 needs to be optimized, the metrology kit 1380 can be installed in the gas discharge chamber 108. For example, the sensors 1324a, 1324b...1324i can be installed at respective positions relative to their respective areas of the main body 102. The measuring devices 1360a, 1360b...1360j can be placed in positions to measure the performance parameters of the beam 110. The actuators 1354a, 1354b...1354k can be physically coupled to respective areas of the main body 102. In addition, the sensor system 1324, the measurement system 1360, and the actuation system 1354 can be connected to the control device 1328 or communicate with the control device 1328 for placement. After the main body 102 has been optimized, the reverse step for disconnection can be performed.

In some implementations, the measurement system 1360 includes one or more measurement interfaces instead of one or more of the measurement devices. Each measurement interface can be connected to the measurement device fixed in the gas discharge stage 108 and to the control device 128 in the set 1380.

Referring to FIG. 14, the process 1487 is executed by the device 900. The procedure 1487 can be executed at any time when the components of the gas discharge stage 108 are moved or replaced or when the efficiency of the gas discharge stage 108 drops below the acceptable range. The procedure 1487 is generally executed when the gas discharge stage 108 and the lithography exposure device are offline.

The efficiency of the gas discharge stage 108 can be represented by one or more efficiency parameters of the light beam 110. In addition, a set of a plurality of performance parameters can be regarded as a parameter space. The parameter space therefore includes a plurality of performance parameters. Program 1487 strives to optimize the parameter space. The optimization of the parameter space does not necessarily mean that a specific performance parameter is optimized or that each performance parameter is optimized. In fact, the set or multiple performance parameters that provide the most efficient operation of the gas discharge stage 108 are determined. As discussed above, examples of performance parameters include the energy E of the beam 110, spectral characteristics such as the bandwidth or wavelength of the beam 110, the dose of the beam 110 at a device (such as a lithographic exposure device), and the pulses that generate the beam 110. The repetition rate, and the working cycle of the beam 110.

The process 1487 includes measuring the physical state of the main body 102 at each of the plurality of different areas 126a, 126b, etc. of the main body 102 of the gas discharge stage 108 (1488). For example, the sensor system 124 (and specifically the sensors 124a, 124b, etc.) can measure the physical state at each of the different regions 126a, 126b, etc.

The procedure 1487 includes measuring one or more performance parameters of the light beam 110 generated by the gas discharge stage 108 (1489). For example, the measurement system 960 can measure one or more performance parameters of the light beam 110. The measurement system 960 may measure only one performance parameter as an indication of the performance of the gas discharge stage 108. In addition, it is also possible for the measurement system 960 to measure a plurality of performance parameters to indicate the performance of the gas discharge stage 108. Examples of measurable performance parameters include the repetition rate of the pulsed beam 110, the energy of the pulsed beam 110, the duty cycle of the pulsed beam 110, and/or the spectral characteristics of the pulsed beam 110.

The program 1487 includes analyzing the measured physical state (1490) to determine that the subject is in the XYZ coordinate system 104 defined by the X axis 106 defined by the plurality of apertures determined by the optical components 140, 142 of the gas discharge stage 108 Positioning in (1491). The procedure 1487 also includes analyzing the determined position of the main body 102 of the gas discharge stage 108 (1492) and analyzing one or more measured performance parameters (1493). The control device 128 performs the analysis 1490, 1492, 1493 after receiving the output from the measurements 1488 and 1489 and after determining the position 1491 of the subject.

The procedure 1487 includes determining whether the modification of the positioning of the main body 102 of the gas discharge stage 108 will improve one or more of the measured performance parameters (1494), and if determining the positioning of the main body 102 of the gas discharge stage 108 The modification will improve one or more of the measured performance parameters, and then modify the positioning of the main body 102 of the gas discharge stage 108 (1495). For an example in which the performance parameter is the energy E of the beam 110, the control device 128 can use feedback control (such as shown in FIG. 11) to incrementally adjust the position of the main body 102, and then measure the performance parameter at 1489 to Determine whether the adjustment improves performance parameters (1494).

If it is determined that no modification to the positioning of the main body 102 will improve one or more of the measured performance parameters (1494), the process 1487 ends. In detail, the program 1487 has determined the positioning of the main body 102 of the gas discharge stage 108 for optimizing the plurality of measured performance parameters. The optimal position of the main body 102 of the gas discharge stage 108 provides an optimal set of values of the performance parameters of the light beam 110, and the program 1487 operates to modify the position of the main body 102 of the gas discharge stage 108 to be at this optimal position.

The positioning of the main body 102 of the gas discharge stage 108 may be modified based on the analysis of the determined position of the main body 102 of the gas discharge stage 108 at 1492 (1495). The positioning of the main body 102 of the gas discharge stage 108 can be determined by one or more of the translation of the main body 102 of the gas discharge stage 108 from the X axis 106 or the rotation of the main body 102 of the gas discharge stage 108 from the X axis 106 (1491). An example of this determination is described above with reference to FIG. 6.

As discussed above, the physical state of the main body 102 at a different area of the main body 102 can be measured (1488) by measuring the distance from the corresponding sensor to the other area of the main body 102.

The procedure 1487 may also include a resonator defined by a beam coupler (such as an optical component 142) at one side of the main body 102 and a beam steering device (such as an optical component 140) at the other side of the main body 102 and The energy generated in the gain medium in the cavity 112 generates a light beam 110 from the gas discharge stage 108. The beam coupler and beam steering device may also define the X axis 106.

As discussed above, and referring to FIG. 15, the light beam 110 may be used in a device such as the lithographic exposure device EX for patterning the substrate W. In this case, the device 100, 700, or 900 is incorporated into the light source LS that provides the amplified and pulsed light beam LB to the lithographic exposure device EX. The light beam LB may correspond to the light beam 110 output from the gas discharge stage 108. Or the light beam LB may correspond to the light beam formed by the light beam 110 output from the gas discharge stage 108. Furthermore, as discussed above, the gas discharge stage 108 and the device 100, 700, or 900 can be incorporated into the dual stage light source LS.

For example, although the connections between the control device 128 and other components of the devices 100, 700, 900 are shown as wires, the connections between the control device 128 and other components may be wired connections or wireless connections.

The following items can be used to further describe the implementation: 1. A light source device, which includes: A gas discharge stage comprising a three-dimensional body defining a cavity configured to interact with an energy source, the body comprising at least two ports that can transmit a light beam having a wavelength in the ultraviolet range; A sensor system comprising a plurality of sensors, each sensor is configured to measure the physical state of a distinct area of the body of the gas discharge stage relative to the other sensor Kind; and A control device that communicates with the sensor system and is configured to analyze the measured physical patterns from the sensors to determine that the main body of the gas discharge stage is moving by a The X axis defines a position in an XYZ coordinate system, wherein the X axis is defined by the geometric structure of the gas discharge stage. 2. The light source device of Clause 1, which further includes a measurement system configured to measure one or more performance parameters of a light beam generated by the gas discharge stage. 3. Such as the light source device of clause 2, wherein the control device communicates with the measurement system and is further configured to: Analyzing the positioning of the main body of the gas discharge stage in the XYZ coordinate system and one or more of the measured performance parameters of the beam; and It is determined whether a modification of the positioning of the main body of the gas discharge stage will improve one or more of the measured performance parameters. 4. The light source device of Clause 3, which further includes an actuation system physically coupled to the main body of the gas discharge stage and configured to adjust the positioning of one of the main bodies of the gas discharge stage. 5. The light source device of Clause 4, wherein the control device communicates with the actuation system and is configured to provide a signal to a determination based on whether the positioning of the main body of the gas discharge stage should be modified The actuation system. 6. The light source device of Clause 5, wherein the actuation system includes a plurality of actuators, and each actuator is configured to physically communicate with a zone of the main body of the gas discharge stage. 7. For the light source device of Clause 6, each actuator includes one or more of an electromechanical device, a servo system, an electric servo system, a hydraulic servo system and/or a pneumatic servo system. 8. The light source device of Clause 1, wherein the control device is configured to determine a translation of the body of the gas discharge stage from the X axis or a movement of the body of the gas discharge stage from the X axis A rotation is used to determine the positioning of the main body of the gas discharge stage in the XYZ coordinate system. 9. The light source device of clause 8, wherein the translation of the main body of the gas discharge stage from the X axis includes one or more of the following: the main body of the gas discharge stage is along the X axis A translation of the main body of the gas discharge stage along a Y axis perpendicular to the X axis, and/or a translation of the main body of the gas discharge stage along a vertical axis to the X axis and the Y axis A translation of the Z axis. 10. The light source device of clause 8, wherein the rotation of the main body of the gas discharge stage from the X axis includes one or more of the following: one of the main body of the gas discharge stage around the X axis Rotation, a rotation of the main body of the gas discharge stage around a Y axis perpendicular to the X axis, and/or the main body of the gas discharge stage along a Z axis perpendicular to the X axis and the Y axis One spin. 11. For the light source device of Clause 1, each sensor is configured to measure a distance from the sensor to the main body of the gas discharge stage as the opposite of the main body of the gas discharge stage The physical state of that sensor. 12. The light source device of clause 1, wherein the gas discharge stage includes a beam steering device at a first end of the main body and a beam coupler at a second end of the main body, the beam steering device And the beam coupler intersects the X axis, so that a beam generated in the gas discharge stage interacts with the beam coupler and the beam steering device. 13. The light source device of clause 12, wherein when the main body of the gas discharge stage is in a series of acceptable positions, the energy source supplies energy to the cavity of the main body, and the beam steering device and beam coupling Aligns the device to produce the beam. 14. The light source device of clause 13, wherein the light beam is an amplified light beam having a wavelength in the ultraviolet range. 15. The light source device of Clause 12, wherein the beam steering device is an optical module including a plurality of optical elements for selecting and adjusting a wavelength of the light beam, and the beam coupler includes a part of a mirror. 16. The light source device of clause 12, wherein the beam steering device includes a configuration of optical parts configured to receive the light beam emitted from the main body of the gas discharge stage through a first port and change the light beam A direction such that the light beam enters the body of the gas discharge stage through the first port. 17. The light source device of clause 12, wherein the gas discharge stage also includes a beam expander configured to interact with the beam when the beam travels between the beam coupler and the cavity. 18. The light source device of Clause 1, wherein each sensor is configured to be fixedly installed relative to the main body of the gas discharge stage. 19. The light source device of Clause 18, wherein each sensor is configured to be fixed at a certain distance from the other sensor when it is fixedly installed relative to the main body of the gas discharge stage. 20. Such as the light source device of Article 1, which further includes: A second gas discharge stage optically connected in series with the gas discharge stage, the second gas discharge stage having a second three-dimensional body defining a second cavity configured to interact with an energy source , The second body includes at least two ports that can transmit a light beam having a wavelength in the ultraviolet range; and A second plurality of sensors, each sensor of the second plurality of sensors is configured to measure a physical state of a distinct area of the second body relative to the other sensor kind; The control device communicates with the second plurality of sensors, and is configured to analyze the measured physical patterns from the sensors of the second plurality of sensors, thereby Determine a position of the second body relative to a second XYZ coordinate system defined by a second X axis passing through the at least two ports of the second body. 21. For the light source device of Clause 1, each sensor includes a displacement sensor. 22. For the light source device of Clause 21, one of the displacement sensors is an optical displacement sensor, a linear proximity sensor, an electromagnetic sensor or an ultrasonic displacement sensor. 23. Such as the light source device of Clause 1, where each sensor includes a non-contact sensor. 24. The light source device of Clause 1, wherein the X axis is composed of a beam of steering devices at a first end of the main body and optically coupled to a first port and at a second end of the main body and with a The second port is defined by a coupler for optical coupling. 25. A measurement device, which includes: A sensor system, including a plurality of sensors, each sensor is configured to measure a physical aspect of a body of a gas discharge stage relative to the other sensor; A measurement system configured to measure one or more performance parameters of a light beam generated by the gas discharge stage; An actuating system, which includes a plurality of actuators, each actuator is configured to be physically coupled to a different area of the main body of the gas discharge stage, and the plurality of actuators work together to adjust the gas A positioning of the main body of the discharge carrier; and A control device that communicates with the sensor system, the measurement system, and the actuation system, and is configured to: Analyze the measured physical patterns from the sensors to determine that the main body of the gas discharge stage is one of an XYZ coordinate system defined by an X axis defined by the gas discharge stage Positioning Analyzing the positioning of the main body of the gas discharge carrier; Analyze one or more measured performance parameters; and Based on the analysis of the positioning of the body of the gas discharge stage and the one or more measured performance parameters, a signal is provided to the actuation system to modify the positioning of the body of the gas discharge stage. 26. The weighing and measuring device of Clause 25, wherein the sensors are far away from each other and positioned relative to the main body of the gas discharge stage. 27. The weights and measures device of Clause 25, wherein the control device is configured to optimize a plurality of performance parameters of the light beam by determining a positioning of the body of the gas discharge stage based on the gas discharge stage The analysis of the positioning of the main body and the one or more measured performance parameters provides the signal to the actuation system to modify the positioning of the main body of the gas discharge stage. 28. The weighing and measuring device of Clause 25, wherein the X axis is composed of a beam of steering devices at a first end of the main body and optically coupled to a first port and at a second end of the main body and connected to a The second port is defined by a coupler for optical coupling. 29. A method, which includes: Measuring a physical state of the main body of a gas discharge stage of a light source at each of a plurality of different regions of the main body of a gas discharge stage; Measuring one or more performance parameters of a light beam generated by the gas discharge stage; Analyze the measured physical patterns to thereby determine a position of the subject in an XYZ coordinate system defined by an X axis, wherein the X axis is determined by a plurality of apertures associated with the gas discharge stage Define Analyze the determined location of the main body of the gas discharge carrier; Analyze one or more measured performance parameters; Determine whether one of the modifications to the positioning of the main body of the gas discharge stage will improve one or more of the measured performance parameters; and If it is determined that a modification of the positioning of the main body of the gas discharge stage will improve one or more of the measured performance parameters, the positioning of the main body of the gas discharge stage is modified. 30. The method of Clause 29, wherein modifying the positioning of the main body of the gas discharge stage is based on the analysis of the determined position of the main body of the gas discharge stage. 31. The method of clause 29, wherein determining the positioning of the body of the gas discharge stage includes determining a translation of the body of the gas discharge stage from the X axis and the body of the gas discharge stage from the One or more of a rotation of the X axis. 32. The method of clause 31, wherein the main body of the gas discharge carrier translated from the X axis includes one or more of the following: the main body of the gas discharge carrier is translated along the X axis, along Translate the main body of the gas discharge stage along a Y axis perpendicular to the X axis, and translate the main body of the gas discharge stage along a Z axis perpendicular to the X axis and the Y axis. 33. The method of clause 31, wherein the main body of the gas discharge stage rotating from the X axis includes one or more of the following: rotating the main body of the gas discharge stage around the X axis, and The X axis is perpendicular to a Y axis to rotate the main body of the gas discharge stage, and/or the main body of the gas discharge stage is rotated along a Z axis that is perpendicular to the X axis and the Y axis. 34. The method of item 29, wherein measuring a physical aspect of the main body at that area includes measuring a distance from the sensor to the area of the main body of the gas discharge stage. 35. The method of item 29, wherein determining whether the modification of the positioning of the main body of the gas discharge stage will improve one or more of the measured performance parameters includes determining optimization of a plurality of measurements A positioning of the main body of the gas discharge stage for measuring performance parameters. 36. The method of clause 29, which further includes generating the light beam from the gas discharge stage, including forming a beam coupler at one side of the main body and a beam steering at the other side of the main body A resonator is defined by the device, and energy is generated in a gain medium in a cavity defined by the main body. The beam coupler and the beam steering device define the X axis. 37. The method of item 29, wherein measuring one or more performance parameters of the beam includes measuring a plurality of performance parameters. 38. The method according to item 37, wherein measuring the plurality of performance parameters includes measuring two or more of the following: a repetition rate of a pulsed beam generated by the light source, the pulsed beam An energy, a duty cycle of the pulsed beam and/or a spectral characteristic of the pulsed beam. 39. As the method of item 37, it further includes: Determining an optimal position of the body of the gas discharge stage that provides an optimal set of the values of the performance parameters of the light beam; and The positioning of the main body of the gas discharge stage is modified to be at the optimal position. 40. A set of weights and measures, which includes: A sensor system, which includes a plurality of sensors, each sensor is configured to measure a physical aspect of a three-dimensional body relative to the other sensor; A measurement system, which includes a plurality of measurement devices, each of which is configured to measure an efficiency parameter of a beam; An actuating system including a plurality of actuators configured to be physically coupled to the three-dimensional body; and A control device configured to communicate with the sensor system, the measurement system, and the actuation system, the control device including: A sensor processing module configured to interface with the sensor system and receive sensor information from the sensor system; A measurement processing module configured to interface with the measurement system and receive measurement information from the measurement system; Actuator processing module, which is configured to interface with the actuation system; and A light source processing module, which is configured to interface with a gas discharge stage having a three-dimensional body. 41. Such as the weights and measures set of item 40, wherein the control device includes communication with the sensor processing module, the measurement processing module, the actuator processing module, and the light source processing module, and is configured In order to instruct the light source processing module to adjust one or more characteristics of the gas discharge stage during use, analyze the sensor information and the measurement information, and determine based on the adjusted characteristics of the gas discharge stage. An analysis processing module of an instruction of the actuator processing module. 42. Such as the weights and measures set of Clause 40, wherein the weights and measures set is modularized so that it is configured to be operatively connected to and disconnected from one or more gas discharge stages Open connection, each gas discharge stage includes a separate three-dimensional body defining a cavity that generates a separate light beam.

Other implementations are within the scope of the following patent applications.

100: device 102: Three-dimensional body 102_ref: dashed box 104: XYZ coordinate system 106: X axis 108: Gas discharge stage 110: beam 112: Cavity 114: Energy Source 118: Port 120: Port 121: Initial cursor beam 122: beam 124: Sensor System 124a: Sensor 124b: Sensor 126a: District 126b: District 128: control device 130x: surface 131x: surface 132z: surface 133z: surface 134y: surface 135y: surface 140: optical components 142: Optical components 144: Platform 514A: Electrode 514B: Electrode 544: base platform base 700: device 754: Actuation System 754a: Actuator 754b: Actuator 756a: District 756b: District 857a: Mounting parts 857b: Mounting parts 900: device 960: measurement system 1162: Surface Topography Mapping 1162Y: The value of translation along the Y axis 1162Z: The value of the rotation around the Z axis 1164: search path 1270: Dual stage light source 1271: Amplified beam 1272: The first gas discharge stage 1273: The second gas discharge stage 1274: beam/seed beam 1275: Spectral feature adjuster 1276: Initial cursor beam 1277: output coupler 1278: Control System 1324: sensor system 1324a: sensor 1324b: sensor 1324i: sensor 1328: control device 1354: Actuation System 1354a: Actuator 1354b: Actuator 1354j: actuator 1360: measurement system 1360a: measurement device 1360b: measurement device 1360k: measurement device 1380: Weights and Measures Set 1381: sensor processing module 1382: Measurement processing module 1383: Actuator Processing Module 1384: light source processing module 1385: Analysis and Processing Module 1487: program 1488: Measurement/Step 1489: measurement/step 1490: analysis/step 1491: step 1492: Analysis/Step 1493: analysis/step 1494: step 1495: step Ab: longitudinal axis d(a): shift d(b): shift d(ss): distance d'(a): shift d'(b): shift D(a): shift D(b): shift EX: Lithography exposure device L: distance LB: Pulsed beam LS: light source R: Relative positioning W: substrate θ: Relative angle orientation

Figure 1 is a block diagram of a device configured to determine the positioning of a three-dimensional body in the XYZ coordinate system of a gas discharge stage, the device including a sensor system;

Figure 2A is a perspective view of the device of Figure 1;

Figure 2B is a perspective view of the main body of the device from Figure 2A, in which the longitudinal axis of the main body is aligned with the X axis of the XYZ coordinate system;

3A is a perspective view of the main body of the device from FIG. 2A, in which the longitudinal axis of the main body is rotated by the main body around the Y axis of the XYZ coordinate system without being aligned with the X axis of the XYZ coordinate system;

3B is a perspective view of the main body of the device from FIG. 2A, in which the longitudinal axis of the main body is rotated by the main body around the Z axis of the XYZ coordinate system without being aligned with the X axis of the XYZ coordinate system;

3C is a perspective view of the main body of the device from FIG. 2A, in which the longitudinal axis of the main body is rotated by the main body around the X axis of the XYZ coordinate system without being aligned with the X axis of the XYZ coordinate system;

3D is a perspective view of the main body of the device from FIG. 2A, in which the longitudinal axis of the main body is not aligned with the X-axis of the XYZ coordinate system by the main body being translated along the Y axis of the XYZ coordinate system;

3E is a perspective view of the main body of the device from FIG. 2A, in which the longitudinal axis of the main body is not aligned with the X axis of the XYZ coordinate system by the main body being translated along the Z axis of the XYZ coordinate system;

3F is a perspective view of the main body of the device from FIG. 2A, in which the longitudinal axis of the main body is not aligned with the X axis of the XYZ coordinate system by the main body being translated along the X axis of the XYZ coordinate system;

Figure 4 is a perspective view of the main body and device of Figures 1 to 2B, showing the implementation of the sensor system and control device;

Figure 5 is a side cross-sectional view of the main body and device of Figure 4 taken along the YZ plane;

6 is a plan view showing the XY plane of the main body and an example of how the sensor system of the device in FIGS. 1 to 2A measures the positioning of the main body;

Figure 7 is a perspective view of a device configured to measure the positioning of the main body. In addition to the device in Figure 7, the device additionally includes a device configured to adjust the positioning of the main body relative to the X axis of the XYZ coordinate system (and therefore also adjust the main body The longitudinal direction) other than the actuation system is similar to the design of Figure 2A;

Figure 8 is a perspective view of the main body and device of Figure 7, showing the implementation of the sensor system, control device and actuation system;

Figure 9 is a perspective view of a device configured to measure the positioning of the main body and adjust the positioning of the main body. In addition to the device in Figure 9, the device also includes a device configured to measure or monitor the performance or performance characteristics of the gas discharge stage Similar to the design shown in Figure 7 except for the measurement system;

Figure 10 is a perspective view of the main body and device of Figure 9, showing the implementation of the sensor system, control device, actuation system, and measurement system;

Figure 11 is a diagram of the implementation of the alignment feedback control processing program, in which the optimal energy of the beam output from the gas discharge stage is determined when the positioning of the main body rotates around the Z axis and translates along the Y axis;

Fig. 12 is a block diagram of a dual-stage light source including two gas discharge stages. Either or both of these stages may include the device of Fig. 2A, Fig. 7 or Fig. 9;

FIG. 13 is a block diagram of a metrology kit including components that make up the device of FIG. 9;

Fig. 14 is a flowchart of a procedure executed by the device of Fig. 1, Fig. 2A, Fig. 7 or Fig. 9; and

Fig. 15 is a block diagram of a light source including the device of Fig. 1, Fig. 2A, Fig. 7 or Fig. 9;

100: device

102: Three-dimensional body

104: XYZ coordinate system

106: X axis

108: Gas discharge stage

110: beam

112: Cavity

114: Energy Source

118: Port

120: Port

121: Initial cursor beam

122: beam

124: Sensor System

124a: Sensor

124b: Sensor

126a: District

126b: District

128: control device

130x: surface

131x: surface

132z: surface

133z: surface

134y: surface

135y: surface

140: optical components

142: Optical components

d(ss): distance

Claims (25)

A light source device comprising: A gas discharge stage comprising a three-dimensional body defining a cavity configured to interact with an energy source, the body comprising at least two ports that can transmit a light beam having a wavelength in the ultraviolet range; A sensor system comprising a plurality of sensors, each sensor is configured to measure the physical state of a distinct area of the body of the gas discharge stage relative to the other sensor Kind; and A control device that communicates with the sensor system and is configured to analyze the measured physical state from the sensors to determine that the main body of the gas discharge stage is moving from an X axis A position in an XYZ coordinate system is defined, where the X axis is defined by the geometric structure of the gas discharge stage. The light source device of claim 1, which further includes a measurement system configured to measure one or more performance parameters of a light beam generated by the gas discharge stage; The control device communicates with the measurement system and is further configured to: Analyzing the positioning of the main body of the gas discharge stage in the XYZ coordinate system and one or more of the measured performance parameters of the beam; and It is determined whether a modification of the positioning of the main body of the gas discharge stage will improve one or more of the measured performance parameters. The light source device of claim 2, which further includes an actuation system physically coupled to the main body of the gas discharge stage and configured to adjust the positioning of one of the main bodies of the gas discharge stage; Wherein the control device communicates with the actuation system and is configured to provide a signal to the actuation system based on a determination as to whether the positioning of the main body of the gas discharge stage should be modified. Such as the light source device of claim 3, wherein the actuation system includes a plurality of actuators, and each actuator is configured to physically communicate with a zone of the main body of the gas discharge stage. Such as the light source device of claim 1, wherein the control device is configured to determine a translation of the main body of the gas discharge stage from the X axis and/or the main body of the gas discharge stage from the X axis One or more of a rotation determines the position of the main body of the gas discharge stage in the XYZ coordinate system. Such as the light source device of claim 5, where: The translation of the main body of the gas discharge stage from the X-axis includes one or more of the following: a translation of the main body of the gas discharge stage along the X-axis, the gas discharge stage A translation of the main body along a Y axis perpendicular to the X axis, and/or a translation of the main body of the gas discharge stage along a Z axis perpendicular to the X axis and the Y axis; and The rotation of the body of the gas discharge stage from the X axis includes one or more of the following: a rotation of the body of the gas discharge stage about the X axis, the body of the gas discharge stage A rotation around a Y axis perpendicular to the X axis, and/or a rotation of the main body of the gas discharge stage along a Z axis perpendicular to the X axis and the Y axis. Such as the light source device of claim 1, wherein each sensor is configured to measure a distance from the sensor to the main body of the gas discharge stage as the main body of the gas discharge stage relative to each other The physical state of the sensor. Such as the light source device of claim 1, where: The gas discharge stage includes a beam steering device at a first end of the main body and a beam coupler at a second end of the main body, the beam steering device and the beam coupler intersect the X axis , So that a light beam generated in the gas discharge stage interacts with the beam coupler and the beam steering device; and When the main body of the gas discharge stage is in a series of acceptable positions, the energy source supplies energy to the cavity of the main body, and the beam steering device and beam coupler are aligned to generate the light beam. The light source device of claim 8, wherein the light beam is an amplified light beam having a wavelength in the ultraviolet range. Such as the light source device of claim 8, where: The beam steering device is an optical module including a plurality of optical elements for selecting and adjusting a wavelength of the beam, and the beam coupler includes a part of a mirror; and/or The beam steering device includes a configuration of optical parts configured to receive the light beam emitted from the main body of the gas discharge stage through a first port and change a direction of the light beam so that the light beam passes through the first The port then enters the main body of the gas discharge stage. Such as the light source device of claim 1, wherein each sensor is configured to be fixedly installed relative to the main body of the gas discharge stage, and each sensor is configured to be fixed relative to the gas discharge carrier When the main body of the table is fixedly installed, it is fixed at a certain distance from another sensor. Such as the light source device of claim 1, which further includes: A second gas discharge stage optically connected in series with the gas discharge stage, the second gas discharge stage having a second three-dimensional body defining a second cavity configured to interact with an energy source , The second body includes at least two ports that can transmit a light beam having a wavelength in the ultraviolet range; and A second plurality of sensors, each sensor of the second plurality of sensors is configured to measure a physical state of a distinct area of the second body relative to the other sensor kind; Wherein the control device communicates with the second plurality of sensors, and is configured to analyze the measured physical state of the sensors from the second plurality of sensors to thereby determine the A positioning of the second body relative to a second XYZ coordinate system defined by a second X axis passing through the at least two ports of the second body. Such as the light source device of claim 1, wherein each sensor includes a non-contact sensor. The light source device of claim 1, wherein the X axis is composed of a beam steering device optically coupled to a first port at a first end of the main body and a second end at a second end of the main body. The port is defined by a beam of couplers optically coupled. A weighing and measuring device includes: A sensor system, including a plurality of sensors, each sensor is configured to measure a physical aspect of a body of a gas discharge stage relative to the other sensor; A measurement system configured to measure one or more performance parameters of a light beam generated by the gas discharge stage; An actuating system, which includes a plurality of actuators, each actuator is configured to be physically coupled to a different area of the main body of the gas discharge stage, and the plurality of actuators work together to adjust the gas A positioning of the main body of the discharge carrier; and A control device that communicates with the sensor system, the measurement system, and the actuation system, and is configured to: Analyze the measured physical patterns from the sensors to thereby determine a position of the main body of the gas discharge stage in an XYZ coordinate system defined by an X axis defined by the gas discharge stage; Analyzing the positioning of the main body of the gas discharge carrier; Analyze one or more measured performance parameters; and Based on the analysis of the positioning of the body of the gas discharge stage and the one or more measured performance parameters, a signal is provided to the actuation system to modify the positioning of the body of the gas discharge stage. The weighing device of claim 15, wherein the sensors are far away from each other and positioned relative to the main body of the gas discharge stage. Such as the metrology device of claim 15, wherein the control device is configured to optimize a plurality of performance parameters of the light beam by determining a positioning of the body of the gas discharge stage based on the gas discharge stage The positioning of the main body and the analysis of the one or more measured performance parameters provide the signal to the actuation system to modify the positioning of the main body of the gas discharge stage. The weighing device of claim 15, wherein the X-axis is composed of a beam of steering device at a first end of the main body and optically coupled with a first port, and at a second end of the main body and with a second The port is defined by a beam of couplers optically coupled. A method that includes: Measuring a physical state of the main body of a gas discharge stage of a light source at each of a plurality of different regions of the main body of a gas discharge stage; Measuring one or more performance parameters of a light beam generated by the gas discharge stage; Analyze the measured physical state to thereby determine a position of the subject in an XYZ coordinate system defined by an X axis, wherein the X axis is defined by a plurality of apertures associated with the gas discharge stage; Analyze the determined location of the main body of the gas discharge carrier; Analyze one or more measured performance parameters; Determine whether one of the modifications to the positioning of the main body of the gas discharge stage will improve one or more of the measured performance parameters; and If it is determined that a modification of the positioning of the main body of the gas discharge stage will improve one or more of the measured performance parameters, the positioning of the main body of the gas discharge stage is modified. The method of claim 19, wherein modifying the positioning of the main body of the gas discharge stage is based on an analysis of the determined position of the main body of the gas discharge stage. Such as the method of claim 19, where: Determining the positioning of the body of the gas discharge stage includes determining one or more of a translation of the body of the gas discharge stage from the X axis or a rotation of the body of the gas discharge stage from the X axis By; Translating the body of the gas discharge stage from the X axis includes one or more of the following: translating the body of the gas discharge stage along the X axis, along a Y axis perpendicular to the X axis Translate the body of the gas discharge stage, and translate the body of the gas discharge stage along a Z axis perpendicular to the X axis and the Y axis; and The body of the gas discharge stage rotating from the X axis includes one or more of the following: rotating the body of the gas discharge stage about the X axis, rotating the body about a Y axis perpendicular to the X axis The main body of the gas discharge stage, and/or the main body of the gas discharge stage is rotated along a Z axis perpendicular to the X axis and the Y axis. The method of claim 19, wherein measuring a physical aspect of the main body at that area includes measuring a distance from the sensor to the area of the main body of the gas discharge stage. The method of claim 19, wherein determining whether the modification of the positioning of the main body of the gas discharge stage will improve one or more of the measured performance parameters includes determining: optimizing a plurality of measured A positioning of the main body of the gas discharge stage of the performance parameter. Such as the method of claim 19, which further includes: Determining an optimal position of the body of the gas discharge stage that provides an optimal set of one or more of the performance parameters of the light beam; and The positioning of the main body of the gas discharge stage is modified to be at the optimal position. A set of weights and measures, which includes: A sensor system, which includes a plurality of sensors, each sensor is configured to measure a physical aspect of a three-dimensional body relative to the other sensor; A measurement system, which includes a plurality of measurement devices, each of which is configured to measure an efficiency parameter of a beam; An actuating system including a plurality of actuators configured to be physically coupled to the three-dimensional body; and A control device configured to communicate with the sensor system, the measurement system, and the actuation system, the control device including: A sensor processing module configured to interface with the sensor system and receive sensor information from the sensor system; A measurement processing module configured to interface with the measurement system and receive measurement information from the measurement system; Actuator processing module, which is configured to interface with the actuation system; and A light source processing module, which is configured to interface with a gas discharge stage having a three-dimensional body.

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