TW202025113A - Display device, display module, and electronic device - Google Patents
Display device, display module, and electronic device Download PDFInfo
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- TW202025113A TW202025113A TW108130993A TW108130993A TW202025113A TW 202025113 A TW202025113 A TW 202025113A TW 108130993 A TW108130993 A TW 108130993A TW 108130993 A TW108130993 A TW 108130993A TW 202025113 A TW202025113 A TW 202025113A
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- Prior art keywords
- conductive layer
- electrode
- emitting diode
- light
- transistor
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Images
Classifications
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- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/075—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
- H01L25/0753—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00 the devices being arranged next to each other
Abstract
Description
本發明的一個實施方式係關於一種顯示裝置、顯示模組及電子裝置。One embodiment of the present invention relates to a display device, a display module, and an electronic device.
注意,本發明的一個實施方式不侷限於上述技術領域。作為本發明的一個實施方式的技術領域的一個例子,可以舉出半導體裝置、顯示裝置、發光裝置、蓄電裝置、記憶體裝置、電子裝置、照明設備、輸入裝置(例如,觸控感測器等)、輸入輸出裝置(例如,觸控面板等)、它們的驅動方法或它們的製造方法。Note that one embodiment of the present invention is not limited to the above technical field. As an example of the technical field of an embodiment of the present invention, semiconductor devices, display devices, light-emitting devices, power storage devices, memory devices, electronic devices, lighting equipment, input devices (for example, touch sensors, etc.) ), input and output devices (for example, touch panels, etc.), their driving methods, or their manufacturing methods.
近年來,已提出了將微型發光二極體(Micro LED(Light Emitting Diode))用於顯示元件的顯示裝置(例如,專利文獻1)。將微型LED用於顯示元件的顯示裝置具有高亮度、高對比、長使用壽命等優點,因此作為新一代顯示裝置,對其的研究開發非常活躍。 [專利文獻]In recent years, a display device using a micro LED (Light Emitting Diode) as a display element has been proposed (for example, Patent Document 1). Display devices using micro LEDs for display elements have the advantages of high brightness, high contrast, and long service life. Therefore, as a new generation of display devices, research and development are very active. [Patent Literature]
[專利文獻1] 美國專利申請公開第2014/0367705號說明書[Patent Document 1] US Patent Application Publication No. 2014/0367705 Specification
本發明的一個實施方式的目的之一是提供一種清晰度高的顯示裝置。本發明的一個實施方式的目的之一是提供一種顯示品質高的顯示裝置。本發明的一個實施方式的目的之一是提供一種低功耗的顯示裝置。本發明的一個實施方式的目的之一是提供一種可靠性高的顯示裝置。One of the objectives of an embodiment of the present invention is to provide a high-definition display device. One of the objectives of an embodiment of the present invention is to provide a display device with high display quality. One of the objectives of an embodiment of the present invention is to provide a display device with low power consumption. One of the objectives of an embodiment of the present invention is to provide a display device with high reliability.
注意,上述目的的描述並不妨礙其他目的的存在。本發明的一個實施方式不一定需要實現所有上述目的。可以從說明書、圖式、申請專利範圍的記載中抽取上述目的以外的目的。Note that the description of the above objectives does not prevent the existence of other objectives. An embodiment of the present invention does not necessarily need to achieve all the above-mentioned objects. Purposes other than those mentioned above can be extracted from the description, drawings, and description of the scope of patent application.
本發明的一個實施方式的顯示裝置在像素中包括第一電晶體、第二電晶體、第一導電層及發光二極體封裝。發光二極體封裝包括第一發光二極體、第二發光二極體、第二導電層、第三導電層及第四導電層。第一發光二極體包括第一電極及第二電極。第二發光二極體包括第三電極及第四電極。第一電晶體的源極和汲極中的一個藉由第二導電層與第一電極電連接。第二電晶體的源極和汲極中的一個藉由第三導電層與第三電極電連接。第一導電層藉由第四導電層與第二電極電連接。第一導電層藉由第四導電層與第四電極電連接。第一導電層被供應固定電位。The display device of one embodiment of the present invention includes a first transistor, a second transistor, a first conductive layer, and a light emitting diode package in a pixel. The light emitting diode package includes a first light emitting diode, a second light emitting diode, a second conductive layer, a third conductive layer, and a fourth conductive layer. The first light emitting diode includes a first electrode and a second electrode. The second light emitting diode includes a third electrode and a fourth electrode. One of the source and drain of the first transistor is electrically connected to the first electrode through the second conductive layer. One of the source and drain of the second transistor is electrically connected to the third electrode through the third conductive layer. The first conductive layer is electrically connected to the second electrode through the fourth conductive layer. The first conductive layer is electrically connected to the fourth electrode through the fourth conductive layer. The first conductive layer is supplied with a fixed potential.
另外,本發明的一個實施方式的顯示裝置在像素中包括第一電晶體、第二電晶體、第三電晶體、第一導電層及發光二極體封裝。發光二極體封裝包括第一發光二極體、第二發光二極體、第三發光二極體、第二導電層、第三導電層、第四導電層及第五導電層。第一發光二極體包括第一電極及第二電極。第二發光二極體包括第三電極及第四電極。第三發光二極體包括第五電極及第六電極。第一電晶體的源極和汲極中的一個藉由第二導電層與第一電極電連接。第二電晶體的源極和汲極中的一個藉由第三導電層與第三電極電連接。第三電晶體的源極和汲極中的一個藉由第五導電層與第五電極電連接。第一導電層藉由第四導電層與第二電極電連接。第一導電層藉由第四導電層與第四電極電連接。第一導電層藉由第四導電層與第六電極電連接。第一導電層被供應固定電位。In addition, the display device according to an embodiment of the present invention includes a first transistor, a second transistor, a third transistor, a first conductive layer, and a light emitting diode package in a pixel. The light emitting diode package includes a first light emitting diode, a second light emitting diode, a third light emitting diode, a second conductive layer, a third conductive layer, a fourth conductive layer, and a fifth conductive layer. The first light emitting diode includes a first electrode and a second electrode. The second light emitting diode includes a third electrode and a fourth electrode. The third light emitting diode includes a fifth electrode and a sixth electrode. One of the source and drain of the first transistor is electrically connected to the first electrode through the second conductive layer. One of the source and drain of the second transistor is electrically connected to the third electrode through the third conductive layer. One of the source and drain of the third transistor is electrically connected with the fifth electrode through the fifth conductive layer. The first conductive layer is electrically connected to the second electrode through the fourth conductive layer. The first conductive layer is electrically connected to the fourth electrode through the fourth conductive layer. The first conductive layer is electrically connected to the sixth electrode through the fourth conductive layer. The first conductive layer is supplied with a fixed potential.
第一發光二極體、第二發光二極體及第三發光二極體較佳為都是小型發光二極體。另外,第一發光二極體、第二發光二極體及第三發光二極體較佳為都是微型發光二極體。The first light emitting diode, the second light emitting diode and the third light emitting diode are preferably all small light emitting diodes. In addition, the first light emitting diode, the second light emitting diode and the third light emitting diode are preferably all miniature light emitting diodes.
第一發光二極體、第二發光二極體及第三發光二極體的每一個較佳為呈現互不相同的顏色的光。例如,第一發光二極體較佳為呈現紅色光,第二發光二極體較佳為呈現綠色光,第三發光二極體較佳為呈現藍色光。Each of the first light-emitting diode, the second light-emitting diode, and the third light-emitting diode preferably exhibits light of different colors. For example, the first light-emitting diode preferably presents red light, the second light-emitting diode preferably presents green light, and the third light-emitting diode preferably presents blue light.
第一電晶體、第二電晶體及第三電晶體較佳為都在通道形成區域中包括金屬氧化物。Preferably, the first transistor, the second transistor and the third transistor all include a metal oxide in the channel formation region.
第四導電層和第二電極較佳為藉由第一引線互相電連接。The fourth conductive layer and the second electrode are preferably electrically connected to each other through the first lead.
第四導電層和第四電極較佳為藉由第二引線互相電連接。The fourth conductive layer and the fourth electrode are preferably electrically connected to each other by a second lead.
第二導電層和第一電極較佳為互相接觸。The second conductive layer and the first electrode are preferably in contact with each other.
第三導電層和第三電極較佳為藉由第三引線互相電連接。The third conductive layer and the third electrode are preferably electrically connected to each other by a third lead.
本發明的一個實施方式是一種包括具有上述任何結構的顯示裝置的模組,該模組安裝有軟性印刷電路板(Flexible printed circuit,以下記為FPC)或TCP(Tape Carrier Package:捲帶式封裝)等連接器或者利用COG (Chip On Glass:晶粒玻璃接合)方式或COF(Chip On Film:薄膜覆晶封裝)方式等安裝有積體電路(IC)。One embodiment of the present invention is a module including a display device having any of the above structures, and the module is mounted with a flexible printed circuit (Flexible printed circuit, hereinafter referred to as FPC) or TCP (Tape Carrier Package: Tape and Reel Package). ) And other connectors, or use COG (Chip On Glass) method or COF (Chip On Film: Chip On Film) method, etc., to mount an integrated circuit (IC).
本發明的一個實施方式是一種包括上述模組、天線、電池、外殼、照相機、揚聲器、麥克風及操作按鈕中的至少一個的電子裝置。An embodiment of the present invention is an electronic device including at least one of the above-mentioned module, antenna, battery, housing, camera, speaker, microphone, and operation button.
根據本發明的一個實施方式,可以提供一種清晰度高的顯示裝置。根據本發明的一個實施方式,可以提供一種顯示品質高的顯示裝置。根據本發明的一個實施方式,可以提供一種低功耗的顯示裝置。根據本發明的一個實施方式,可以提供一種可靠性高的顯示裝置。According to an embodiment of the present invention, a high-definition display device can be provided. According to an embodiment of the present invention, a display device with high display quality can be provided. According to an embodiment of the present invention, a display device with low power consumption can be provided. According to an embodiment of the present invention, a display device with high reliability can be provided.
注意,上述效果的描述並不妨礙其他效果的存在。本發明的一個實施方式不一定需要具有所有上述效果。可以從說明書、圖式、申請專利範圍的記載中抽取上述效果以外的效果。Note that the description of the above effects does not prevent the existence of other effects. An embodiment of the present invention does not necessarily need to have all the above-mentioned effects. Effects other than the above-mentioned effects can be extracted from descriptions, drawings, and descriptions in the scope of patent applications.
參照圖式對實施方式進行詳細說明。注意,本發明不侷限於以下說明,而所屬技術領域的通常知識者可以很容易地理解一個事實就是其方式及詳細內容在不脫離本發明的精神及其範圍的情況下可以被變換為各種形式。因此,本發明不應該被解釋為僅限定在以下所示的實施方式所記載的內容中。The embodiments will be described in detail with reference to the drawings. Note that the present invention is not limited to the following description, and those skilled in the art can easily understand the fact that the method and details can be changed into various forms without departing from the spirit and scope of the present invention. . Therefore, the present invention should not be interpreted as being limited to the content described in the embodiments shown below.
注意,在下面說明的發明結構中,在不同的圖式中共同使用相同的元件符號來顯示相同的部分或具有相同功能的部分,而省略反復說明。此外,當顯示具有相同功能的部分時有時使用相同的陰影線,而不特別添加元件符號。Note that in the structure of the invention described below, the same reference numerals are used in common in different drawings to show the same parts or parts with the same functions, and repeated descriptions are omitted. In addition, the same hatching is sometimes used when displaying parts with the same function, without adding component symbols in particular.
另外,為了便於理解,有時圖式中示出的各構成的位置、大小及範圍等並不顯示其實際的位置、大小及範圍等。因此,所公開的發明不一定侷限於圖式所公開的位置、大小、範圍等。In addition, for ease of understanding, the positions, sizes, and ranges of the various components shown in the drawings may not show their actual positions, sizes, and ranges. Therefore, the disclosed invention is not necessarily limited to the position, size, range, etc. disclosed in the drawings.
另外,根據情況或狀態,可以互相調換“膜”和“層”。例如,可以將“導電層”變換為“導電膜”。此外,可以將“絕緣膜”變換為“絕緣層”。In addition, the "film" and "layer" can be interchanged depending on the situation or state. For example, the "conductive layer" can be changed to the "conductive film". In addition, the "insulating film" can be converted into an "insulating layer".
實施方式1
在本實施方式中,參照圖1A至圖7說明本發明的一個實施方式的顯示裝置。
[顯示裝置的概要] 本實施方式的顯示裝置在像素中包括第一電晶體、第二電晶體、第一導電層及發光二極體封裝(也記為LED封裝)。[Outline of display device] The display device of this embodiment includes a first transistor, a second transistor, a first conductive layer, and a light emitting diode package (also referred to as an LED package) in the pixel.
LED封裝具有引線框架、板或外殼等中密封有一個或多個發光二極體(或發光二極體晶片(也記為LED晶片))的結構。The LED package has a structure in which one or more light-emitting diodes (or light-emitting diode chips (also referred to as LED chips)) are sealed in a lead frame, a board, or a housing.
LED封裝包括第一發光二極體、第二發光二極體、第二導電層、第三導電層及第四導電層。The LED package includes a first light emitting diode, a second light emitting diode, a second conductive layer, a third conductive layer, and a fourth conductive layer.
第一發光二極體包括第一電極及第二電極。第一電極被用作第一發光二極體的像素電極。第一電晶體的源極和汲極中的一個藉由第二導電層與第一電極電連接。The first light emitting diode includes a first electrode and a second electrode. The first electrode is used as the pixel electrode of the first light emitting diode. One of the source and drain of the first transistor is electrically connected to the first electrode through the second conductive layer.
第二發光二極體包括第三電極及第四電極。第三電極被用作第二發光二極體的像素電極。第二電晶體的源極和汲極中的一個藉由第三導電層與第三電極電連接。The second light emitting diode includes a third electrode and a fourth electrode. The third electrode is used as the pixel electrode of the second light emitting diode. One of the source and drain of the second transistor is electrically connected to the third electrode through the third conductive layer.
第二電極被用作第一發光二極體的共用電極,而第四電極被用作第二發光二極體的共用電極。第一導電層藉由第四導電層與第二電極電連接。第一導電層藉由第四導電層與第四電極電連接。第一導電層被供應固定電位。The second electrode is used as the common electrode of the first light emitting diode, and the fourth electrode is used as the common electrode of the second light emitting diode. The first conductive layer is electrically connected to the second electrode through the fourth conductive layer. The first conductive layer is electrically connected to the fourth electrode through the fourth conductive layer. The first conductive layer is supplied with a fixed potential.
可以藉由在形成有多個電晶體的電路板安裝LED封裝來製造本實施方式的顯示裝置。因此,與將發光二極體(或LED晶片)逐一安裝於電路板的方法相比,可以縮短顯示裝置的製造時間並降低製造的難易度。由此,可以提高顯示裝置的製造良率。此外,可以實現顯示裝置的高精細化或大型化。The display device of this embodiment can be manufactured by mounting an LED package on a circuit board formed with a plurality of transistors. Therefore, compared with the method of mounting the light emitting diodes (or LED chips) on the circuit board one by one, the manufacturing time of the display device can be shortened and the manufacturing difficulty can be reduced. As a result, the manufacturing yield of the display device can be improved. In addition, it is possible to achieve high-definition or large-scale display devices.
本實施方式的顯示裝置具有使用發光二極體顯示影像的功能。由於發光二極體是自發光元件,因此在作為顯示元件使用發光二極體時,顯示裝置不需要背光,並也可以不設置偏光板。由此,可以減少顯示裝置的功耗,並可以實現顯示裝置的薄型化及輕量化。此外,因為作為顯示元件使用發光二極體的顯示裝置具有高對比及寬視角,所以可以得到高顯示品質。另外,藉由將無機材料用於發光材料,可以延長顯示裝置的使用壽命來提高可靠性。The display device of this embodiment has a function of displaying an image using a light-emitting diode. Since the light-emitting diode is a self-luminous element, when the light-emitting diode is used as a display element, the display device does not require a backlight, and a polarizing plate may not be provided. As a result, the power consumption of the display device can be reduced, and the thickness and weight of the display device can be reduced. In addition, since a display device using a light-emitting diode as a display element has high contrast and wide viewing angle, high display quality can be obtained. In addition, by using inorganic materials as luminescent materials, the service life of the display device can be prolonged to improve reliability.
注意,在本說明書等中,有時將晶片面積為10000μm2 以下的發光二極體記為微型LED,將晶片面積大於10000μm2 且為1mm2 以下的發光二極體記為小型LED,並將晶片面積大於1mm2 的發光二極體記為大型LED。Note that in this specification, etc., light-emitting diodes with a chip area of 10,000 μm 2 or less are sometimes referred to as micro LEDs, and light-emitting diodes with a chip area greater than 10,000 μm 2 and 1 mm 2 or less are sometimes referred to as small LEDs. A light emitting diode with a chip area greater than 1mm 2 is recorded as a large LED.
例如,晶片的外形尺寸為100μm2 以下的發光二極體也可以說是微型LED(微型LED晶片)。例如,1mm□的LED封裝可以使用微型LED晶片或小型LED晶片。For example, a light-emitting diode with a chip size of 100 μm 2 or less can also be said to be a micro LED (micro LED chip). For example, a 1mm□ LED package can use micro LED chips or small LED chips.
本發明的一個實施方式的顯示裝置可以使用微型LED、小型LED及大型LED中的任何一個。特別是,本發明的一個實施方式的顯示裝置較佳為包括微型LED或小型LED,更佳為包括微型LED。The display device according to an embodiment of the present invention may use any of micro LEDs, small LEDs, and large LEDs. In particular, the display device of one embodiment of the present invention preferably includes a micro LED or a small LED, and more preferably includes a micro LED.
發光二極體的晶片的面積較佳為1mm2 以下,更佳為10000μm2 以下,進一步較佳為3000μm2 以下,進一步較佳為700μm2 以下。Area of the wafer in the light-emitting diode is preferably 1mm 2 or less, more preferably 10000μm 2 or less, more preferably 3000μm 2 or less, more preferably 700μm 2 or less.
發光二極體的發射光的區域的面積較佳為1 mm2 以下,更佳為10000μm2 以下,進一步較佳為3000μm2 以下,進一步較佳為700μm2 以下。Area of the region emitting light emitting diode is preferably 1 mm 2 or less, more preferably 10000μm 2 or less, more preferably 3000μm 2 or less, more preferably 700μm 2 or less.
在本實施方式中,特別說明作為發光二極體使用微型LED的情況的例子。另外,在本實施方式中,說明具有雙異質接面的微型LED。注意,對發光二極體沒有特別的限制,例如,可以採用具有量子井結的微型LED、使用奈米柱的LED等。In this embodiment, an example of a case where a micro LED is used as a light-emitting diode is particularly described. In addition, in this embodiment, a micro LED having a double heterojunction is described. Note that there are no special restrictions on light-emitting diodes. For example, micro-LEDs with quantum well junctions, LEDs using nano-pillars, etc. can be used.
顯示裝置所包括的電晶體較佳為在通道形成區域中具有金屬氧化物。使用金屬氧化物的電晶體可以降低功耗。因此,藉由將該電晶體與微型LED組合,可以實現功耗極低的顯示裝置。The transistor included in the display device preferably has a metal oxide in the channel formation region. The use of metal oxide transistors can reduce power consumption. Therefore, by combining the transistor and the micro LED, a display device with extremely low power consumption can be realized.
[顯示裝置的結構例子1]
圖1A示出顯示裝置100的俯視圖。顯示裝置100在顯示部110中包括多個像素130。顯示部110中以矩陣狀設置有多個像素130。顯示部110從FPC1及FPC2藉由佈線108被供應信號及電力。[Structure example 1 of display device]
FIG. 1A shows a top view of the
圖1B示出顯示裝置100A的俯視圖。顯示裝置100A在顯示部110和佈線108之間包括電路109。顯示部110及電路109從FPC1或FPC2藉由佈線108被供應信號及電力。FIG. 1B shows a top view of the
本發明的一個實施方式的顯示裝置可以內置有掃描線驅動電路(閘極驅動器)及信號線驅動電路(源極驅動器)中的一個或兩個。或者,本發明的一個實施方式的顯示裝置可以具有不內置有閘極驅動器及源極驅動器中的一個或兩個,而在外部設置驅動器的結構。例如,可以將被用作閘極驅動器或源極驅動器的IC電連接到顯示裝置。IC可以以COG方式或COF方式安裝於顯示裝置。或者,可以將安裝有IC的FPC、TAB(Tape Automated Bonding)帶或TCP等連接到顯示裝置。The display device according to an embodiment of the present invention may have one or both of a scanning line drive circuit (gate driver) and a signal line drive circuit (source driver) built in. Alternatively, the display device of one embodiment of the present invention may have a structure in which one or both of the gate driver and the source driver are not built in, and the driver is provided externally. For example, an IC used as a gate driver or a source driver can be electrically connected to the display device. The IC can be installed in the display device in a COG or COF method. Alternatively, an IC-mounted FPC, TAB (Tape Automated Bonding) tape, or TCP, etc. can be connected to the display device.
作為電路109,例如,可以應用閘極驅動器及源極驅動器中的一個或兩個。As the
圖1C示出顯示裝置100所包括的像素130的俯視圖。一個像素130設置有一個LED封裝150。也就是說,圖1A所示的顯示部110以矩陣狀設置有多個LED封裝150。FIG. 1C shows a top view of the
像素130包括導電層131R、導電層131G、導電層131B、導電層132及LED封裝150。The
圖1D示出像素130所包括的LED封裝150的俯視圖。FIG. 1D shows a top view of the
LED封裝150包括至少一個LED晶片。在本實施方式中示出LED封裝150包括紅色LED晶片151R、綠色LED晶片151G及藍色LED晶片151B的例子。也就是說,在本實施方式中,像素130採用由R(紅色)、G(綠色)、B(藍色)的三個顏色的子像素表示一個顏色的結構。The
此外,像素130可以採用由R、G、B、W(白色)的四個顏色的子像素表示一個顏色的結構或由R、G、B、Y(黃色)的四個顏色的子像素表示一個顏色的結構等。此外,對顏色要素沒有特別的限制,也可以使用RGBWY之外的顏色(例如,青色(cyan)或洋紅色(magenta)等)。In addition, the
LED封裝150還包括散熱片154、電極152R、電極152G、電極152B及電極153。The
紅色LED晶片151R位於電極152R上。綠色的LED晶片151G及藍色LED晶片151B位於散熱片154上。The
紅色LED晶片151R、綠色LED晶片151G及藍色LED晶片151B都藉由引線143電連接到電極153。The
紅色LED晶片151R、綠色LED晶片151G及藍色LED晶片151B較佳為包括呈現互不相同的顏色的光的發光二極體。由此,不需要形成顏色轉換層的製程。因此,可以抑制LED晶片的製造成本。The
此外,紅色LED晶片151R、綠色LED晶片151G及藍色LED晶片151B包括呈現相同顏色的光的發光二極體。此時,發光二極體所發射的光藉由顏色轉換層及彩色層中的一個或兩個也可以被提取到顯示裝置外部。顏色轉換層及彩色層中的一個或兩個可以設置在LED封裝150內部或上方。In addition, the
另外,本實施方式的顯示裝置也可以包括呈現紅外光的發光二極體。呈現紅外光的發光二極體例如可以被用作紅外光感測器的光源。In addition, the display device of this embodiment may include a light emitting diode that emits infrared light. A light emitting diode that exhibits infrared light can be used as a light source of an infrared light sensor, for example.
圖2A示出沿著圖1C中的點劃線A-B的剖面圖。也就是說,圖2A是包括藍色LED晶片151B、與該藍色LED晶片151B電連接的導電層131B及導電層132的剖面圖。注意,在圖2A中,為了明確起見,省略佈線等組件的一部分。Fig. 2A shows a cross-sectional view along the chain line A-B in Fig. 1C. That is, FIG. 2A is a cross-sectional view including a
另外,因為包括綠色LED晶片151G、與該綠色LED晶片151G電連接的導電層131G及導電層132的剖面結構也相同於圖2A,所以可以參照下面的說明。In addition, since the cross-sectional structure including the
如圖2A所示,在顯示裝置100中,電晶體120藉由導電層131B與LED封裝150電連接。As shown in FIG. 2A, in the
電晶體120包括被用作背閘極的導電層121、被用作閘極絕緣層的絕緣層122、被用作半導體層的金屬氧化物層123(通道形成區域123i及一對低電阻區域123n)、各自與低電阻區域123n電連接的一對導電層126a、126b、被用作閘極絕緣層的絕緣層124以及被用作閘極的導電層125。導電層121和金屬氧化物層123隔著絕緣層122重疊。導電層125和金屬氧化物層123隔著絕緣層124重疊。The
電晶體120上設置有絕緣層127,並且絕緣層127上設置有導電層131B及導電層132。導電層131B藉由設置在絕緣層127中的開口與導電層126b電連接。An insulating
較佳為對絕緣層124和絕緣層127中的至少一個使用水或氫等雜質不容易擴散的材料。由此,可以有效地抑制來自外部的雜質擴散到電晶體中,從而可以提高顯示裝置的可靠性。絕緣層127被用作平坦化層。It is preferable to use a material that does not easily diffuse impurities such as water or hydrogen for at least one of the insulating
在圖2A中,電晶體120隔著絕緣層104設置在基板102上。絕緣層104具有基底膜的功能。絕緣層104被用作防止水或氫等雜質從基板102擴散到電晶體120及氧從金屬氧化物層123向絕緣層104一側脫離的障壁層。作為絕緣層104,例如可以使用氧化鋁膜、氧化鉿膜、氮化矽膜等的與氧化矽膜相比氫或氧不容易擴散的膜。另外,也可以不設置絕緣層104而在基板102上直接形成電晶體120。In FIG. 2A, the
導電層131B的端部及導電層132的端部被保護層128覆蓋。保護層128包括到達導電層131B的頂面的開口和到達導電層132的頂面的開口。在該開口中,導電層131B及導電層132各自藉由導電體133與LED封裝150電連接。The end of the
作為保護層128的材料,較佳為使用丙烯酸樹脂、聚醯亞胺、環氧、矽酮等樹脂。藉由設置保護層128,可以抑制因導電層131B上的導電體133和導電層132上的導電體133接觸而導致的短路。另外,也可以不設置保護層128。As the material of the
例如,導電體133可以適當地使用銀、碳、銅等的導電膏、金、焊料等的凸塊。此外,與導電體133連接的導電層131R、131G、131B、132及電極152R、152G、152B、153各自較佳為使用與導電體133的接觸電阻低的導電材料。例如,在導電體133使用銀膏時,如果與它們連接的導電材料是鋁、鈦、銅、銀(Ag)、鈀(Pd)和銅(Cu)的合金(Ag-Pd-Cu(APC))等,則接觸電阻低,所以是較佳的。For example, as the
導電體133既可以設置在基板102上,也可以設置在LED封裝150一側。例如,在導電層131R、131G、131B、132的每一個上設置導電體133,然後使導電體133與LED封裝150連接,從而可以在基板102上安裝LED封裝150。The
一個電晶體也可以與多個發光二極體電連接。One transistor can also be electrically connected to multiple light-emitting diodes.
LED封裝150的側面被樹脂129覆蓋。在作為樹脂129使用黑色樹脂時,可以提高顯示對比度,所以是較佳的。此外,也可以在LED封裝150的頂面設置表面保護層、衝擊吸收層等。由於LED封裝150具有將光提取到上側的結構,因此設置於LED封裝150的頂面的層較佳為對可見光具有透過性。The side surface of the
作為基板102,可以使用:絕緣基板諸如玻璃基板、石英基板、藍寶石基板、陶瓷基板等;或者半導體基板諸如以矽或碳化矽等為材料的單晶半導體基板或多晶半導體基板、矽鍺等的化合物半導體基板、SOI基板等。As the
基板102較佳為遮斷可見光(對可見光具有非透過性)。在基板102遮斷可見光時,可以抑制從外部進入形成在基板102上的電晶體120的光。但是,本發明的一個實施方式不侷限於此,基板102也可以對可見光具有透過性。The
另外,基板102也可以包括反射發光二極體的光的反射層及遮斷該光的遮光層中的一個或兩個。In addition, the
LED封裝150所包括的多個發光二極體(LED晶片)既可以由相同結構的電晶體驅動,又可以由互不相同的結構的電晶體驅動。例如,驅動紅色LED晶片151R的電晶體、驅動綠色LED晶片151G的電晶體、驅動藍色LED晶片151B的電晶體的尺寸、通道長度、通道寬度、及結構等中的至少一個也可以互不相同。明確而言,也可以根據用來以所希望的亮度發光的電流量以及顏色而改變電晶體的通道長度及通道寬度中的一個或兩個。The multiple light-emitting diodes (LED chips) included in the
另外,作為可用於構成本實施方式的顯示裝置的各種導電層的材料,可以舉出鋁、鈦、鉻、鎳、銅、釔、鋯、鉬、銀、鉭或鎢等金屬或以它們為主要成分的合金等。可以以單層或疊層結構使用包含這些材料的膜。例如,可以舉出包含矽的鋁膜的單層結構、在鈦膜上層疊鋁膜的兩層結構、在鎢膜上層疊鋁膜的兩層結構、在銅-鎂-鋁合金膜上層疊銅膜的兩層結構、在鈦膜上層疊銅膜的兩層結構、在鎢膜上層疊銅膜的兩層結構、依次層疊鈦膜或氮化鈦膜、鋁膜或銅膜以及鈦膜或氮化鈦膜的三層結構、以及依次層疊鉬膜或氮化鉬膜、鋁膜或銅膜以及鉬膜或氮化鉬膜的三層結構等。另外,可以使用氧化銦、氧化錫或氧化鋅等氧化物。另外,藉由使用包含錳的銅,可以提高蝕刻時的形狀的控制性,所以是較佳的。In addition, as materials that can be used to form various conductive layers of the display device of the present embodiment, metals such as aluminum, titanium, chromium, nickel, copper, yttrium, zirconium, molybdenum, silver, tantalum, or tungsten, or metals such as those mainly Composition of alloys, etc. A film containing these materials can be used in a single-layer or laminated structure. For example, a single-layer structure of an aluminum film containing silicon, a two-layer structure in which an aluminum film is laminated on a titanium film, a two-layer structure in which an aluminum film is laminated on a tungsten film, and a copper-magnesium-aluminum alloy film laminated on copper The two-layer structure of the film, the two-layer structure of laminating a copper film on a titanium film, a two-layer structure of laminating a copper film on a tungsten film, sequentially stacking a titanium film or a titanium nitride film, an aluminum film or a copper film, and a titanium film or nitrogen A three-layer structure of a titanium oxide film, and a three-layer structure in which a molybdenum film or a molybdenum nitride film, an aluminum film or a copper film, and a molybdenum film or a molybdenum nitride film are sequentially stacked. In addition, oxides such as indium oxide, tin oxide, or zinc oxide can be used. In addition, by using copper containing manganese, the controllability of the shape during etching can be improved, which is preferable.
作為可用於構成本實施方式的顯示裝置的各種絕緣層的絕緣材料,例如可以舉出如丙烯酸樹脂、聚醯亞胺、環氧及矽酮等樹脂、如氧化矽、氧氮化矽、氮氧化矽、氮化矽或氧化鋁等無機絕緣材料。Examples of insulating materials that can be used to form various insulating layers of the display device of this embodiment include resins such as acrylic resin, polyimide, epoxy, and silicone, such as silicon oxide, silicon oxynitride, and oxynitride. Inorganic insulating materials such as silicon, silicon nitride or alumina.
參照圖2B對LED封裝150進行詳細的說明。此外,參照圖2C對藍色LED晶片151B進行更詳細的說明。The
圖2B所示的LED封裝150包括基板141、藍色LED晶片151B、電極152B、電極153、散熱片154、黏合層146、外殼142、引線143、引線144及密封層145。The
藍色LED晶片151B由黏合層146貼合於基板141上。藍色LED晶片151B隔著黏合層146與散熱片154重疊地設置。對黏合層146的材料沒有特別的限制,如下所述,將紅色LED晶片151R以電連接到電極152R的方式貼合到電極152R,因此在黏合層146具有導電性時,各顏色的LED晶片的黏合層146可以使用相同材料,所以是較佳的。此外,當在藍色LED晶片及綠色LED晶片中作為黏合層146使用具有導電性的黏合劑時散熱性得到提高,所以是較佳的。散熱片154可以採用與電極152B及電極153同一材料及同一製程形成。The
基板141可以使用玻璃環氧樹脂基板、聚醯亞胺基板、陶瓷基板、氧化鋁基板、氮化鋁基板等。As the
圖2C所示的藍色LED晶片151B具有基板101上設置有發光二極體(LED)的結構。發光二極體包括半導體層111、電極112、發光層113、半導體層114、電極115及電極116。The
電極112與半導體層111電連接。電極116藉由電極115與半導體層114電連接。此外,也可以只設置電極115及電極116中的一個。發光層113被夾在半導體層111和半導體層114之間。在發光層113中,電子和電洞鍵合而發光。半導體層111和半導體層114中的一個是n型半導體層,另一個是p型半導體層。The
在藍色LED晶片151B中,包括半導體層111、發光層113及半導體層114的疊層結構以呈現藍色光的方式形成。In the
另外,在各顏色的發光二極體中,包括一對半導體層和該一對半導體層之間的發光層的疊層結構以呈現紅色、黃色、綠色或藍色等的光的方式形成。例如,將鎵-磷化合物、鎵-砷化合物、鎵-鋁-砷化合物、鋁-鎵-銦-磷化合物、鎵氮化物、銦-氮化鎵化合物、硒-鋅化合物等用於該疊層結構。In addition, in the light-emitting diodes of each color, a stacked structure including a pair of semiconductor layers and a light-emitting layer between the pair of semiconductor layers is formed so as to exhibit red, yellow, green, or blue light. For example, gallium-phosphorus compound, gallium-arsenic compound, gallium-aluminum-arsenic compound, aluminum-gallium-indium-phosphorus compound, gallium nitride, indium-gallium nitride compound, selenium-zinc compound, etc. are used for the laminate structure.
作為基板101,例如可以使用藍寶石(Al2
O3
)基板、碳化矽(SiC)基板、矽(Si)基板、氮化鎵(GaN)基板等單晶基板。As the
電極112藉由引線143與電極152B電連接。電極112被用作發光二極體的像素電極。電極116藉由引線144與電極153電連接。電極116被用作發光二極體的共用電極。The
電極152B及電極153各自可以由選自鎳、銅、銀、鉑或金中的一個元素或者以50%以上包含該元素的合金材料形成。Each of the
電極152B和電極112的連接及電極153和電極116的連接各自可以利用使用熱壓合法或超聲波鍵合法的打線接合法。The connection between the
作為引線143及引線144,各自可以使用由金、包含金的合金、銅或包含銅的合金等形成的金屬細線。As the
作為外殼142的材料,可以使用樹脂。外殼142至少覆蓋藍色LED晶片151B的側面即可,也可以不與藍色LED晶片151B的頂面重疊。例如,在藍色LED晶片151B的頂面一側,密封層145也可以露出。較佳為在外殼142內側的側面,明確而言,藍色LED晶片151B的周圍設置由不鏽鋼等構成的反射器。藍色LED晶片151B所發射的光的一部分被反射器反射,因此可以從LED封裝150提取更多的光。As the material of the
外殼142的內部填充有密封層145。作為密封層145,對可見光具有透過性的樹脂是較佳的。作為密封層145,例如可以使用環氧樹脂、矽酮樹脂等紫外線硬化性樹脂、可見光硬化性樹脂等。The inside of the
圖3A示出沿著圖1C中的點劃線C-D的剖面圖。也就是說,圖3A是包括紅色LED晶片151R、與該紅色LED晶片151R電連接的導電層131R及導電層132的剖面圖。在圖3A中,為了明確起見,省略佈線等組件的一部分。Fig. 3A shows a cross-sectional view along the chain line C-D in Fig. 1C. That is, FIG. 3A is a cross-sectional view including a
如圖3A所示,在顯示裝置100中,電晶體120A藉由導電層131R與LED封裝150電連接。As shown in FIG. 3A, in the
因為電晶體120A具有與圖2A所示的電晶體120同樣的結構,所以省略詳細說明。Since the
電晶體120A上設置有絕緣層127,並且絕緣層127上設置有導電層131R及導電層132。導電層131R藉由設置在絕緣層127中的開口與導電層126b電連接。An insulating
導電層131R及導電層132各自藉由導電體133與LED封裝150電連接。The
參照圖3B對LED封裝150進行詳細的說明。此外,參照圖3C對紅色LED晶片151R進行更詳細的說明。The
圖3B所示的LED封裝150包括基板141、紅色LED晶片151R、電極152R、電極153、黏合層146、外殼142、引線144及密封層145。The
紅色LED晶片151R藉由具有導電性的黏合層146與電極152R電連接。The
圖3C所示的紅色LED晶片151R包括電極103、半導體層117、發光層118、半導體層119及電極106。紅色LED晶片151R也可以是發光二極體(LED)。此外,紅色LED晶片具有導電基板上設置有發光二極體的結構。The
電極103與半導體層117電連接。電極106與半導體層119電連接。發光層118被夾在半導體層117和半導體層119之間。在發光層118中,電子和電洞鍵合而發光。半導體層117和半導體層119中的一個是n型半導體層,另一個是p型半導體層。The
電極103藉由黏合層146與電極152R電連接。電極103被用作發光二極體的像素電極。電極106藉由引線144與電極153電連接。電極106被用作發光二極體的共用電極。The
如圖3D所示的LED封裝155那樣,外殼142內部也可以設置有顏色轉換層147。由此,發光二極體的光藉由顏色轉換層147射出到LED封裝155外部。Like the
另外,圖3D示出顏色轉換層147設置在密封層145上方的結構,但是顏色轉換層147的佈局不侷限於此。例如,顏色轉換層147也可以分散地設置在密封層145內部。In addition, FIG. 3D shows a structure in which the
作為顏色轉換層147較佳為使用螢光體或量子點(QD:Quantum dot)。特別是,量子點的發射光譜的峰寬窄,因此可以得到色純度高的發光。因此,能夠提高顯示裝置的顯示品質。As the
例如,在LED封裝155所包括的多個LED晶片都包括呈現藍色光的發光二極體的情況下,較佳為LED封裝155內部或上方設置有顏色轉換層147。明確而言,較佳為與紅色LED晶片151R重疊的位置上設置有將藍色光轉換為紅色光的顏色轉換層147,並且較佳為與綠色LED晶片151G重疊的位置上設置有將藍色光轉換為綠色光的顏色轉換層147。For example, in the case where the multiple LED chips included in the
由此,在紅色子像素中,發光二極體所發射的光被顏色轉換層147從藍色轉換為紅色,而射出到顯示裝置外部。此外,在綠色子像素中,發光二極體所發射的光被顏色轉換層147從藍色轉換為綠色,而射出到顯示裝置外部。另外,在藍色子像素中,發光二極體所發射的藍色光直接射出到顯示裝置外部。Thus, in the red sub-pixel, the light emitted by the light-emitting diode is converted from blue to red by the
顏色轉換層147藉由液滴噴射法(例如,噴墨法)、塗佈法、壓印(imprint)法及各種印刷法(網版印刷法、膠印法)等形成。另外,也可以使用量子點薄膜等的顏色轉換膜。The
作為螢光體,可以使用其表面印刷有或塗佈有螢光體的有機樹脂層、混合有螢光體的有機樹脂層等。As the phosphor, an organic resin layer printed or coated with a phosphor, an organic resin layer mixed with a phosphor, or the like can be used.
作為構成量子點的材料,沒有特別的限制,例如可以舉出第14族元素、第15族元素、第16族元素、包含多個第14族元素的化合物、第4族至第14族的元素和第16族元素的化合物、第2族元素和第16族元素的化合物、第13族元素和第15族元素的化合物、第13族元素和第17族元素的化合物、第14族元素和第15族元素的化合物、第11族元素和第17族元素的化合物、氧化鐵類、氧化鈦類、硫系尖晶石(spinel chalcogenide)類、半導體簇等。There are no particular limitations on the material constituting the quantum dots, for example, group 14 elements, group 15 elements, group 16 elements, compounds containing multiple group 14 elements, and group 4 to group 14 elements can be mentioned. And compound of group 16 element, compound of group 2 element and group 16 element, compound of group 13 element and group 15 element, compound of group 13 element and group 17 element, group 14 element and group Compounds of group 15 elements, compounds of group 11 elements and group 17 elements, iron oxides, titanium oxides, spinel chalcogenide, semiconductor clusters, etc.
明確而言,可以舉出硒化鎘、硫化鎘、碲化鎘、硒化鋅、氧化鋅、硫化鋅、碲化鋅、硫化汞、硒化汞、碲化汞、砷化銦、磷化銦、砷化鎵、磷化鎵、氮化銦、氮化鎵、銻化銦、銻化鎵、磷化鋁、砷化鋁、銻化鋁、硒化鉛、碲化鉛、硫化鉛、硒化銦、碲化銦、硫化銦、硒化鎵、硫化砷、硒化砷、碲化砷、硫化銻、硒化銻、碲化銻、硫化鉍、硒化鉍、碲化鉍、矽、碳化矽、鍺、錫、硒、碲、硼、碳、磷、氮化硼、磷化硼、砷化硼、氮化鋁、硫化鋁、硫化鋇、硒化鋇、碲化鋇、硫化鈣、硒化鈣、碲化鈣、硫化鈹、硒化鈹、碲化鈹、硫化鎂、硒化鎂、硫化鍺、硒化鍺、碲化鍺、硫化錫、硒化錫、碲化錫、氧化鉛、氟化銅、氯化銅、溴化銅、碘化銅、氧化銅、硒化銅、氧化鎳、氧化鈷、硫化鈷、氧化鐵、硫化鐵、氧化錳、硫化鉬、氧化釩、氧化鎢、氧化鉭、氧化鈦、氧化鋯、氮化矽、氮化鍺、氧化鋁、鈦酸鋇、硒鋅鎘的化合物、銦砷磷的化合物、鎘硒硫的化合物、鎘硒碲的化合物、銦鎵砷的化合物、銦鎵硒的化合物、銦硒硫化合物、銅銦硫的化合物以及它們的組合等。此外,也可以使用以任意比率表示組成的所謂的合金型量子點。Specifically, cadmium selenide, cadmium sulfide, cadmium telluride, zinc selenide, zinc oxide, zinc sulfide, zinc telluride, mercury sulfide, mercury selenide, mercury telluride, indium arsenide, and indium phosphide can be cited. , Gallium arsenide, gallium phosphide, indium nitride, gallium nitride, indium antimonide, gallium antimonide, aluminum phosphide, aluminum arsenide, aluminum antimonide, lead selenide, lead telluride, lead sulfide, selenide Indium, indium telluride, indium sulfide, gallium selenide, arsenic sulfide, arsenic selenide, arsenic telluride, antimony sulfide, antimony selenide, antimony telluride, bismuth sulfide, bismuth selenide, bismuth telluride, silicon, silicon carbide , Germanium, tin, selenium, tellurium, boron, carbon, phosphorus, boron nitride, boron phosphide, boron arsenide, aluminum nitride, aluminum sulfide, barium sulfide, barium selenide, barium telluride, calcium sulfide, selenide Calcium, calcium telluride, beryllium sulfide, beryllium selenide, beryllium telluride, magnesium sulfide, magnesium selenide, germanium sulfide, germanium selenide, germanium telluride, tin sulfide, tin selenide, tin telluride, lead oxide, fluorine Copper, copper chloride, copper bromide, copper iodide, copper oxide, copper selenide, nickel oxide, cobalt oxide, cobalt sulfide, iron oxide, iron sulfide, manganese oxide, molybdenum sulfide, vanadium oxide, tungsten oxide, oxide Tantalum, titanium oxide, zirconium oxide, silicon nitride, germanium nitride, aluminum oxide, barium titanate, selenium zinc cadmium compound, indium arsenic phosphorus compound, cadmium selenium sulfur compound, cadmium selenium tellurium compound, indium gallium arsenide Compounds, indium gallium selenide compounds, indium selenide sulfur compounds, copper indium sulfur compounds, and combinations thereof. In addition, so-called alloy-type quantum dots in which the composition is expressed in an arbitrary ratio can also be used.
作為量子點的結構,有核型、核殼(Core Shell)型、核多殼(Core Multishell)型等。另外,在量子點中,由於表面原子的比例高,因此反應性高而容易發生凝聚。因此,量子點的表面較佳為附著有保護劑或設置有保護基。藉由附著有保護劑或設置有保護基,可以防止凝聚而提高對溶劑的溶解性。此外,還可以藉由降低反應性來提高電穩定性。As the structure of quantum dots, there are core type, core shell type, core multishell type, and the like. In addition, in quantum dots, since the proportion of surface atoms is high, the reactivity is high and aggregation is likely to occur. Therefore, the surface of the quantum dot is preferably attached with a protective agent or provided with a protective group. By attaching a protective agent or providing a protective group, agglomeration can be prevented and the solubility to the solvent can be improved. In addition, the electrical stability can be improved by reducing the reactivity.
量子點其尺寸越小能帶間隙越大,因此適當地調節其尺寸以獲得所希望的波長的光。隨著結晶尺寸變小,量子點的發光向藍色一側(亦即,向高能量一側)遷移,因此,藉由改變量子點的尺寸,可以在涵蓋紫外區域、可見光區域和紅外區域的光譜的波長區域中調節其發光波長。通常使用的量子點的尺寸(直徑)為例如0.5nm以上且20nm以下,較佳為1nm以上且10nm以下。量子點其尺寸分佈越小發射光譜越窄,因此可以獲得色純度高的發光。另外,對量子點的形狀沒有特別的限制,可以為球狀、棒狀、圓盤狀、其他的形狀。為棒狀量子點的量子點具有呈現有指向性的光的功能。The smaller the size of the quantum dot, the larger the band gap, so the size is appropriately adjusted to obtain light of the desired wavelength. As the crystal size becomes smaller, the light emission of quantum dots migrates to the blue side (that is, to the high-energy side). Therefore, by changing the size of the quantum dots, it can be used in the ultraviolet, visible and infrared regions. Adjust the emission wavelength in the wavelength region of the spectrum. The size (diameter) of the quantum dots generally used is, for example, 0.5 nm or more and 20 nm or less, preferably 1 nm or more and 10 nm or less. The smaller the size distribution of the quantum dot, the narrower the emission spectrum, so it can obtain light with high color purity. In addition, the shape of the quantum dots is not particularly limited, and may be spherical, rod-shaped, disc-shaped, or other shapes. Quantum dots, which are rod-shaped quantum dots, have the function of presenting directional light.
或者,也可以LED封裝155內部或上方具有顏色轉換層147和彩色層的疊層結構。由此,在由顏色轉換層147轉換的光經過彩色層時,可以提高光的純度。此外,也可以在與藍色LED晶片151B重疊的位置上設置藍色彩色層。在設置藍色彩色層時,可以提高藍色光的純度。在不設置藍色彩色層時,可以簡化製程。Alternatively, the
彩色層是使特定的波長區域的光透過的有色層。例如,可以使用使紅色、綠色、藍色或黃色的波長域的光透過的濾色片等。作為可以用於彩色層的材料,可以舉出金屬材料、樹脂材料、包含有顏料或染料的樹脂材料等。The colored layer is a colored layer that transmits light in a specific wavelength region. For example, a color filter that transmits light in the wavelength range of red, green, blue, or yellow can be used. Examples of materials that can be used for the color layer include metal materials, resin materials, and resin materials containing pigments or dyes.
[顯示裝置的結構例子2] 圖4至圖6各自示出與顯示裝置的結構例子1不同的顯示裝置的剖面結構例子。[Structure example 2 of display device] 4 to 6 each show a cross-sectional structure example of a display device that is different from Structure Example 1 of the display device.
圖4至圖6所示的顯示裝置和圖2A的主要不同之處是與LED封裝150電連接的電晶體的結構。The main difference between the display device shown in FIGS. 4 to 6 and FIG. 2A is the structure of the transistor electrically connected to the
在圖4所示的顯示裝置中,電晶體120B藉由導電層131B與LED封裝150電連接。In the display device shown in FIG. 4, the
電晶體120B包括被用作閘極的導電層121、被用作閘極絕緣層的絕緣層122、被用作半導體層的金屬氧化物層123、被用作源極及汲極的一對導電層126a、126b、被用作閘極絕緣層的絕緣層124a、124b以及被用作背閘極的導電層125。導電層121和金屬氧化物層123隔著絕緣層122重疊。導電層125和金屬氧化物層123隔著絕緣層124a及絕緣層124b重疊。The
電晶體120B上設置有絕緣層127,並且絕緣層127上設置有導電層131B及導電層132。導電層131B藉由設置在絕緣層127中的開口與導電層126b電連接。An insulating
在圖5所示的顯示裝置中,電晶體120C藉由導電層131B等與LED封裝150電連接。In the display device shown in FIG. 5, the
基板174上設置有絕緣層175、電晶體120C、導電層184a、導電層184b、導電層187、導電層189、絕緣層186、絕緣層188、導電層131B及導電層132等。基板174上還設置有絕緣層162、絕緣層181、絕緣層182、絕緣層183及絕緣層185等絕緣層。這些絕緣層中的一個或多個有時被認為電晶體的組件,但是在本實施方式中,不將其包括在電晶體的組件中而進行說明。The
作為基板151,可以使用:絕緣基板諸如玻璃基板、石英基板、藍寶石基板、陶瓷基板等;或者半導體基板諸如以矽或碳化矽等為材料的單晶半導體基板或多晶半導體基板、矽鍺等的化合物半導體基板、SOI基板等。As the substrate 151, you can use: insulating substrates such as glass substrates, quartz substrates, sapphire substrates, ceramic substrates, etc.; or semiconductor substrates such as single crystal semiconductor substrates or polycrystalline semiconductor substrates made of silicon or silicon carbide, silicon germanium, etc. Compound semiconductor substrates, SOI substrates, etc.
基板151較佳為遮斷可見光(對可見光具有非透過性)。在基板151遮斷可見光時,可以抑制從外部進入形成在基板151上的電晶體120C的光。但是,本發明的一個實施方式不侷限於此,基板151也可以對可見光具有透過性。The substrate 151 preferably blocks visible light (has impermeability to visible light). When the substrate 151 blocks visible light, light entering the
基板174上設置有絕緣層175。絕緣層175被用作障壁層來防止水或氫等雜質從基板174擴散到電晶體120C及氧從金屬氧化物層165向絕緣層175一側脫離。作為絕緣層175,例如可以使用與氧化矽膜相比氫或氧不容易擴散的膜諸如氧化鋁膜、氧化鉿膜、氮化矽膜等。An insulating
電晶體120C包括導電層161、絕緣層163、絕緣層164、金屬氧化物層165、一對導電層166、絕緣層167、導電層168等。The
金屬氧化物層165包括通道形成區域。金屬氧化物層165包括與一對導電層166中的一個重疊的第一區域、與一對導電層166中的另一個重疊的第二區域以及該第一區域和該第二區域之間的第三區域。The
絕緣層175上設置有導電層161及絕緣層162,並且覆蓋導電層161及絕緣層162地設置有絕緣層163及絕緣層164。金屬氧化物層165設置在絕緣層164上。導電層161被用作閘極電極,絕緣層163及絕緣層164被用作閘極絕緣層。導電層161隔著絕緣層163及絕緣層164與金屬氧化物層165重疊。絕緣層163較佳為與絕緣層175同樣被用作障壁層。與金屬氧化物層165接觸的絕緣層164較佳為使用氧化矽膜等氧化物絕緣膜。A
在此,導電層161的頂面的高度與絕緣層162的頂面的高度大致一致。例如,在絕緣層162中設置開口,並以填埋該開口的方式形成導電層161,然後藉由CMP法等進行平坦化處理,從而可以使導電層161的頂面的高度和絕緣層162的頂面的高度一致。由此,可以縮小電晶體120C的尺寸。Here, the height of the top surface of the
一對導電層166分開地設置在金屬氧化物層165上。一對導電層166被用作源極及汲極。覆蓋金屬氧化物層165及一對導電層166地設置有絕緣層181,絕緣層181上設置有絕緣層182。絕緣層181及絕緣層182中設置有到達金屬氧化物層165的開口,絕緣層167及導電層168埋入在該開口內部。該開口與上述第三區域重疊。絕緣層167與絕緣層181的側面及絕緣層182的側面重疊。導電層168隔著絕緣層167與絕緣層181的側面及絕緣層182的側面重疊。導電層168被用作閘極電極,絕緣層167被用作閘極絕緣層。導電層168隔著絕緣層167與金屬氧化物層165重疊。A pair of
在此,導電層168的頂面的高度與絕緣層182的頂面的高度大致一致。例如,在絕緣層182中設置開口,以填埋該開口的方式形成絕緣層167及導電層168,然後進行平坦化處理,從而可以使導電層168的頂面的高度和絕緣層182的頂面的高度一致。由此,可以縮小電晶體120C的尺寸。Here, the height of the top surface of the
而且,覆蓋絕緣層182、絕緣層167及導電層168的頂面地設置有絕緣層183及絕緣層185。絕緣層181及絕緣層183較佳為與絕緣層175同樣被用作障壁層。藉由由絕緣層181覆蓋一對導電層166,可以抑制包含在絕緣層182的氧所導致的一對導電層166的氧化。In addition, an insulating
與一對導電層166中的一個及導電層187電連接的插頭埋入在設置於絕緣層181、絕緣層182、絕緣層183及絕緣層185中的開口內。插頭較佳為包括與該開口的側面及一對導電層166中的一個的頂面接觸的導電層184a及埋入在該導電層184a的內側的導電層184b。此時,作為導電層184a,較佳為使用氫及氧不容易擴散的導電材料。The plug electrically connected to one of the pair of
絕緣層185上設置有導電層187,導電層187上設置有絕緣層186。絕緣層186設置有到達導電層187的開口,導電層189埋入在該開口內部。導電層189被用作使導電層187與導電層131B電連接的插頭。A
一對導電層166中的一個藉由導電層184a、導電層184b、導電層187及導電層189與導電層131B電連接。One of the pair of
如上所述,在圖5所示的電晶體120C中,導電層161的頂面的高度與絕緣層162的頂面的高度大致一致。此外,在圖5所示的電晶體120C中,導電層168的頂面的高度與絕緣層182的頂面的高度大致一致。As described above, in the
如此,本實施方式的顯示裝置較佳為包括閘極電極的頂面的高度與絕緣層的頂面的高度大致一致的電晶體。例如,藉由採用CMP(Chemical Mechanical Polishing)法等進行平坦化處理,使閘極電極的頂面和絕緣層的頂面平坦化來使閘極電極的頂面的高度和絕緣層的頂面的高度一致。In this way, the display device of this embodiment preferably includes a transistor in which the height of the top surface of the gate electrode is substantially the same as the height of the top surface of the insulating layer. For example, the top surface of the gate electrode and the top surface of the insulating layer are flattened by using a CMP (Chemical Mechanical Polishing) method or the like for planarization to make the height of the top surface of the gate electrode and the top surface of the insulating layer Highly consistent.
這種結構的電晶體容易減小其尺寸。藉由減小電晶體的尺寸,可以減小像素的尺寸,從而可以提高顯示裝置的清晰度。The transistor of this structure is easy to reduce its size. By reducing the size of the transistor, the size of the pixel can be reduced, thereby improving the definition of the display device.
在圖6所示的顯示裝置中,與圖5所示的顯示裝置同樣,電晶體120C藉由導電層131B等與LED封裝150電連接。In the display device shown in FIG. 6, similar to the display device shown in FIG. 5, the
圖6所示的顯示裝置包括在基板191中具有通道形成區域的電晶體190和在金屬氧化物中具有通道形成區域的電晶體120C的疊層。The display device shown in FIG. 6 includes a stack of a
作為基板191,較佳為使用單晶矽基板。電晶體190包括導電層195、絕緣層194、絕緣層196、一對低電阻區域193。導電層195被用作閘極。絕緣層194位於導電層195和基板191之間,並被用作閘極絕緣層。絕緣層196覆蓋導電層195的側面地設置,並被用作側壁。一對低電阻區域193是基板191中的摻雜有雜質的區域,其中一個被用作電晶體190的源極,另一個被用作電晶體190的汲極。As the
此外,在相鄰的兩個電晶體之間以埋入在基板191中的方式設置有元件分離層192。In addition, an
覆蓋電晶體190地設置有絕緣層199,絕緣層199上設置有導電層198。導電層198藉由絕緣層199的開口與一對低電阻區域193中的一個電連接。此外,覆蓋導電層198地設置有絕緣層171,絕緣層171上設置有導電層172。導電層198及導電層172各自被用作佈線。此外,覆蓋導電層172地設置有絕緣層173及絕緣層175,絕緣層175上設置有電晶體120C。從絕緣層175到LED封裝150為止的疊層結構與圖5所示的顯示裝置同樣,所以省略詳細的說明。An insulating
電晶體120C可以被用作構成像素電路的電晶體。此外,電晶體190被用作構成像素電路的電晶體或構成用來驅動該像素電路的驅動電路(閘極驅動器和源極驅動器中的一個或兩個)的電晶體。另外,電晶體120C及電晶體190都可以被用作構成運算電路及記憶體電路等的各種電路的電晶體。The
藉由採用這種結構,在發光二極體的正下除形成像素電路外還可以形成驅動電路等,因此與在顯示部的外側設置驅動電路的情況相比,可以使顯示裝置小型化。另外,可以實現窄邊框(非顯示區域窄)的顯示裝置。By adopting this structure, in addition to the pixel circuit, a driver circuit and the like can be formed directly under the light emitting diode. Therefore, the display device can be miniaturized compared with the case where the driver circuit is provided outside the display portion. In addition, a display device with a narrow frame (narrow non-display area) can be realized.
本發明的一個實施方式的顯示裝置也可以用於安裝有觸控感測器的顯示裝置(也稱為輸入輸出裝置或觸控面板)。上述各顯示裝置的結構可以用於觸控面板。The display device of one embodiment of the present invention can also be used in a display device (also referred to as an input/output device or a touch panel) equipped with a touch sensor. The structure of each display device described above can be used for a touch panel.
對本發明的一個實施方式的觸控面板所包括的感測元件(也稱為感測元件)沒有特別的限制。可以將能夠檢測出手指、觸控筆等檢測物件的接近或接觸的各種感測器用作感測元件。There is no particular limitation on the sensing element (also referred to as a sensing element) included in the touch panel of an embodiment of the present invention. Various sensors that can detect the proximity or contact of a detection object such as a finger and a stylus can be used as the sensing element.
例如,作為感測器的方式,可以利用靜電電容式、電阻膜式、表面聲波式、紅外線式、光學式、壓敏式等各種方式。For example, as the method of the sensor, various methods such as an electrostatic capacitance type, a resistive film type, a surface acoustic wave type, an infrared type, an optical type, and a pressure sensitive type can be used.
作為靜電電容式,有表面型靜電電容式、投影型靜電電容式等。另外,作為投影型靜電電容式,有自電容式、互電容式等。較佳為使用互電容式,因為可以同時進行多點感測。As the capacitance type, there are a surface type capacitance type, a projection type capacitance type, and the like. In addition, as the projection type electrostatic capacitance type, there are a self-capacitance type, a mutual capacitance type, and the like. It is preferable to use a mutual capacitance type because it can perform multi-point sensing at the same time.
本發明的一個實施方式的觸控面板可以採用貼合了分別形成的顯示裝置和檢測元件的結構、在支撐顯示元件的基板和相對基板中的一個或兩個設置有構成檢測元件的電極等的結構等各種的結構。The touch panel of one embodiment of the present invention may adopt a structure in which separately formed display devices and detection elements are bonded, and one or both of the substrate supporting the display element and the counter substrate are provided with electrodes constituting the detection element, etc. Various structures such as structure.
如上所述,本實施方式的顯示裝置可以藉由將LED封裝安裝於形成有多個發光二極體的基板來製造,因此可以降低顯示裝置的製造的難易度並提高良率。此外,藉由組合微型LED和使用金屬氧化物的電晶體,可以實現功耗得到減少的顯示裝置。As described above, the display device of this embodiment can be manufactured by mounting an LED package on a substrate on which a plurality of light emitting diodes are formed. Therefore, the difficulty of manufacturing the display device can be reduced and the yield can be improved. In addition, by combining micro LEDs and transistors using metal oxides, a display device with reduced power consumption can be realized.
此外,由於本實施方式的顯示裝置可以減小電晶體尺寸,容易提高清晰度並適用於包括較小的顯示部的電子裝置。In addition, since the display device of the present embodiment can reduce the size of the transistor, it is easy to improve the resolution and is suitable for electronic devices including a smaller display portion.
本實施方式可以與其他實施方式適當地組合。此外,在本說明書中,在一個實施方式中示出多個結構例子的情況下,可以適當地組合該結構例子。This embodiment mode can be combined with other embodiment modes as appropriate. In addition, in this specification, when a plurality of structural examples are shown in one embodiment, the structural examples can be appropriately combined.
實施方式2 在本實施方式中,參照圖7說明本發明的一個實施方式的顯示裝置。Embodiment 2 In this embodiment, a display device according to an embodiment of the present invention will be described with reference to FIG. 7.
[像素] 本實施方式的顯示裝置包括配置為m行n列(m和n都是1以上的整數)的矩陣狀的多個像素。圖7示出像素200(i,j)(i是1以上且m以下的整數,j是1以上且n以下的整數)的電路圖的一個例子。[Pixel] The display device of this embodiment includes a plurality of pixels arranged in a matrix of m rows and n columns (m and n are both integers of 1 or more). FIG. 7 shows an example of a circuit diagram of the pixel 200 (i, j) (i is an integer of 1 or more and m or less, and j is an integer of 1 or more and n or less).
圖7所示的像素200(i,j)包括發光元件210、開關SW21、開關SW22、電晶體M及電容器C1。The pixel 200 (i, j) shown in FIG. 7 includes a light-emitting
在本實施方式中示出作為開關SW21使用電晶體的例子。開關SW21的閘極與掃描線GL1(i)電連接。開關SW21的源極及汲極中的一個與信號線SL(j)電連接,另一個與電晶體M的閘極電連接。In this embodiment, an example in which a transistor is used as the switch SW21 is shown. The gate of the switch SW21 is electrically connected to the scan line GL1(i). One of the source and drain of the switch SW21 is electrically connected to the signal line SL(j), and the other is electrically connected to the gate of the transistor M.
在本實施方式中示出作為開關SW22使用電晶體的例子。開關SW22的閘極與掃描線GL2(i)電連接。開關SW22的源極及汲極中的一個與佈線COM電連接,另一個與電晶體M的閘極電連接。In this embodiment, an example in which a transistor is used as the switch SW22 is shown. The gate of the switch SW22 is electrically connected to the scan line GL2(i). One of the source and drain of the switch SW22 is electrically connected to the wiring COM, and the other is electrically connected to the gate of the transistor M.
電晶體M的閘極與電容器C1的一個電極、開關SW21的源極及汲極中的另一個及開關SW22的源極及汲極中的另一個電連接。電晶體M的源極及汲極中的一個與佈線CATHODE電連接,另一個與發光元件210的陰極電連接。The gate of the transistor M is electrically connected to one electrode of the capacitor C1, the other of the source and drain of the switch SW21, and the other of the source and drain of the switch SW22. One of the source and drain of the transistor M is electrically connected to the wiring CATHODE, and the other is electrically connected to the cathode of the light-emitting
電容器C1的另一個電極與佈線CATHODE電連接。The other electrode of the capacitor C1 is electrically connected to the wiring CATHODE.
發光元件210的陽極與佈線ANODE電連接。The anode of the
掃描線GL1(i)具有供應選擇信號的功能。掃描線GL2(i)具有供應控制信號的功能。信號線SL(j)具有供應影像信號的功能。佈線VCOM、佈線CATHODE及佈線ANODE的每一個被供應固定電位。可以將發光元件210的陽極一側設定為高電位,而將陰極一側設定為低於陽極一側的電位。The scan line GL1(i) has a function of supplying a selection signal. The scan line GL2(i) has a function of supplying control signals. The signal line SL(j) has a function of supplying image signals. Each of the wiring VCOM, the wiring CATHODE, and the wiring ANODE is supplied with a fixed potential. The anode side of the
開關SW21被選擇信號控制,並被用作用來控制像素200的選擇狀態的選擇電晶體。The switch SW21 is controlled by a selection signal, and is used as a selection transistor for controlling the selection state of the
電晶體M被用作根據供應到閘極的電位控制流過發光元件210的電流的驅動電晶體。當開關SW21處於導通狀態時,提供到信號線SL(j)的影像信號被供應到電晶體M的閘極,可以根據其電位控制發光元件210的發光亮度。The transistor M is used as a driving transistor that controls the current flowing through the
開關SW22具有根據控制信號控制電晶體M的閘極電位的功能。明確而言,開關SW22可以將使電晶體M成為非導通狀態的電位供應到電晶體M的閘極。The switch SW22 has a function of controlling the gate potential of the transistor M in accordance with a control signal. Specifically, the switch SW22 can supply the electric potential for turning the transistor M into a non-conducting state to the gate of the transistor M.
例如,開關SW22可以被用於脈衝寬度的控制。在基於控制信號的期間中,可以將電流從電晶體M供應到發光元件210。或者,發光元件210可以根據影像信號及控制信號表現灰階。For example, the switch SW22 can be used for pulse width control. In the period based on the control signal, current may be supplied from the transistor M to the
在此,作為像素200(i,j)所包括的電晶體,較佳為應用其每一個的形成通道的半導體層使用金屬氧化物(氧化物半導體)的電晶體。Here, as the transistor included in the pixel 200 (i, j), it is preferable to use a metal oxide (oxide semiconductor) transistor for each of the semiconductor layers forming the channel.
使用具有比矽寬的能帶間隙及比矽小的載子密度的金屬氧化物的電晶體可以實現極小的關態電流。由此,因為其關態電流小,所以能夠長期間保持儲存於與電晶體串聯連接的電容器中的電荷。因此,作為與電容器C1串聯連接的開關SW21及開關SW22,尤其使用應用氧化物半導體的電晶體。此外,藉由同樣使其他電晶體使用應用氧化物半導體的電晶體,可以減少製造成本。The use of metal oxide transistors with a wider band gap than silicon and a smaller carrier density than silicon can achieve extremely small off-state currents. As a result, since the off-state current is small, the charge stored in the capacitor connected in series with the transistor can be maintained for a long period of time. Therefore, as the switch SW21 and the switch SW22 connected in series with the capacitor C1, in particular, a transistor using an oxide semiconductor is used. In addition, by also using other transistors using oxide semiconductor transistors, manufacturing costs can be reduced.
另外,作為像素200(i,j)所包括的電晶體,可以使用形成通道的半導體應用矽的電晶體。特別是,在使用單晶矽或多晶矽等結晶性高的矽時可以實現高場效移動率及更高速的工作,所以是較佳的。In addition, as the transistor included in the pixel 200 (i, j), a semiconductor using silicon transistor forming a channel can be used. In particular, it is preferable to use high-crystalline silicon such as monocrystalline silicon or polycrystalline silicon, which can achieve high field-efficiency mobility and higher-speed operation.
此外,也可以採用如下結構:作為像素200(i,j)所包括的電晶體中的一個以上使用應用氧化物半導體的電晶體,作為其他電晶體使用應用矽的電晶體。In addition, it is also possible to adopt a structure in which one or more of the transistors included in the pixel 200 (i, j) uses an oxide semiconductor-based transistor, and as the other transistors, a silicon-based transistor is used.
注意,在圖7中,電晶體表示為n通道型電晶體,但是也可以使用p通道型電晶體。Note that in FIG. 7, the transistor is represented as an n-channel type transistor, but a p-channel type transistor may also be used.
[電晶體] 接著,將說明可用於顯示裝置的電晶體。[Transistor] Next, transistors that can be used in display devices will be explained.
對顯示裝置所包括的電晶體結構沒有特別的限制。例如,可以採用平面型電晶體、交錯型電晶體或反交錯型電晶體。此外,電晶體都可以具有頂閘極結構或底閘極結構。或者,也可以在通道的上下設置有閘極電極。There is no particular limitation on the transistor structure included in the display device. For example, planar transistors, interlaced transistors, or inverse interlaced transistors can be used. In addition, all transistors can have a top gate structure or a bottom gate structure. Alternatively, gate electrodes may be provided above and below the channel.
作為顯示裝置所包括的電晶體,可以使用例如將金屬氧化物用於通道形成區域的電晶體。因此,可以實現關態電流極低的電晶體。As the transistor included in the display device, for example, a transistor using a metal oxide for the channel formation region can be used. Therefore, a transistor with extremely low off-state current can be realized.
或者,作為顯示裝置所包括的電晶體,可以使用在通道形成區域中含有矽的電晶體。作為該電晶體可以舉出例如含有非晶矽的電晶體、含有結晶矽(典型為低溫多晶矽)的電晶體、以及含有單晶矽的電晶體等。Alternatively, as the transistor included in the display device, a transistor containing silicon in the channel formation region can be used. Examples of the transistor include a transistor containing amorphous silicon, a transistor containing crystalline silicon (typically low-temperature polycrystalline silicon), and a transistor containing single crystal silicon.
[金屬氧化物] 以下,將說明可用於半導體層的金屬氧化物。[Metal oxide] Hereinafter, metal oxides that can be used for the semiconductor layer will be explained.
金屬氧化物較佳為至少包含銦或鋅。特別是,較佳為包含銦及鋅。此外,較佳為除此之外還包含鋁、鎵、釔或錫等。此外,也可以包含選自硼、鈦、鐵、鎳、鍺、鋯、鉬、鑭、鈰、釹、鉿、鉭、鎢或鎂等中的一種或多種。The metal oxide preferably contains at least indium or zinc. In particular, it preferably contains indium and zinc. In addition, it is preferable to further contain aluminum, gallium, yttrium, tin, or the like. In addition, it may also contain one or more selected from boron, titanium, iron, nickel, germanium, zirconium, molybdenum, lanthanum, cerium, neodymium, hafnium, tantalum, tungsten, or magnesium.
在此,考慮金屬氧化物是包含銦、元素M及鋅的In-M-Zn氧化物的情況。另外,元素M是鋁、鎵、釔或錫等。此外,作為可應用於元素M的元素,有硼、鈦、鐵、鎳、鍺、鋯、鉬、鑭、鈰、釹、鉿、鉭、鎢、鎂等。注意,有時作為元素M可以組合上述多種元素。Here, consider the case where the metal oxide is an In-M-Zn oxide containing indium, element M, and zinc. In addition, the element M is aluminum, gallium, yttrium, tin, or the like. In addition, as elements applicable to element M, there are boron, titanium, iron, nickel, germanium, zirconium, molybdenum, lanthanum, cerium, neodymium, hafnium, tantalum, tungsten, magnesium, and the like. Note that as the element M, the above-mentioned multiple elements may be combined.
金屬氧化物膜可以藉由濺射法形成。此外,還可以採用PLD法、PECVD法、熱CVD法、ALD法、真空蒸鍍法等。The metal oxide film can be formed by a sputtering method. In addition, PLD method, PECVD method, thermal CVD method, ALD method, vacuum evaporation method, etc. can also be used.
在本說明書等中,有時將包含氮的金屬氧化物也稱為金屬氧化物(metal oxide)。此外,也可以將包含氮的金屬氧化物稱為金屬氧氮化物(metal oxynitride)。例如,可以將鋅氧氮化物(ZnON)等含有氮的金屬氧化物用於半導體層。In this specification and the like, a metal oxide containing nitrogen may also be referred to as a metal oxide. In addition, the metal oxide containing nitrogen may also be referred to as metal oxynitride. For example, a metal oxide containing nitrogen such as zinc oxynitride (ZnON) can be used for the semiconductor layer.
在本說明書等中,有時記載為CAAC(c-axis aligned crystal)或CAC(Cloud-Aligned Composite)。CAAC是指結晶結構的一個例子,CAC是指功能或材料構成的一個例子。In this manual, etc., it may be described as CAAC (c-axis aligned crystal) or CAC (Cloud-Aligned Composite). CAAC refers to an example of crystalline structure, and CAC refers to an example of function or material composition.
例如,作為半導體層,可以使用CAC(Cloud-Aligned Composite)-OS。For example, as the semiconductor layer, CAC (Cloud-Aligned Composite)-OS can be used.
CAC-OS或CAC-metal oxide在材料的一部分中具有導電性的功能,在材料的另一部分中具有絕緣性的功能,作為材料的整個部分具有半導體的功能。此外,在將CAC-OS或CAC-metal oxide用於電晶體的半導體層的情況下,導電性的功能是使被用作載子的電子(或電洞)流過的功能,絕緣性的功能是不使被用作載子的電子流過的功能。藉由導電性的功能和絕緣性的功能的互補作用,可以使CAC-OS或CAC-metal oxide具有開關功能(開啟/關閉的功能)。藉由在CAC-OS或CAC-metal oxide中使各功能分離,可以最大限度地提高各功能。CAC-OS or CAC-metal oxide has a conductive function in a part of the material, an insulating function in another part of the material, and a semiconductor function as an entire part of the material. In addition, when CAC-OS or CAC-metal oxide is used for the semiconductor layer of the transistor, the function of conductivity is the function of allowing electrons (or holes) used as carriers to flow, and the function of insulation It is a function to prevent electrons used as carriers from flowing. With the complementary function of conductivity and insulation, CAC-OS or CAC-metal oxide can have a switching function (on/off function). By separating each function in CAC-OS or CAC-metal oxide, each function can be maximized.
此外,CAC-OS或CAC-metal oxide包括導電性區域及絕緣性區域。導電性區域具有上述導電性的功能,絕緣性區域具有上述絕緣性的功能。此外,在材料中,導電性區域和絕緣性區域有時以奈米粒子級分離。另外,導電性區域和絕緣性區域有時在材料中不均勻地分佈。此外,有時觀察到其邊緣模糊而以雲狀連接的導電性區域。In addition, CAC-OS or CAC-metal oxide includes conductive regions and insulating regions. The conductive region has the above-mentioned conductivity function, and the insulating region has the above-mentioned insulating function. In addition, in the material, the conductive region and the insulating region are sometimes separated at the nanoparticle level. In addition, the conductive region and the insulating region are sometimes unevenly distributed in the material. In addition, conductive regions whose edges are blurred and connected in a cloud shape are sometimes observed.
此外,在CAC-OS或CAC-metal oxide中,導電性區域和絕緣性區域有時以0.5nm以上且10nm以下,較佳為0.5nm以上且3nm以下的尺寸分散在材料中。In addition, in CAC-OS or CAC-metal oxide, conductive regions and insulating regions may be dispersed in the material in a size of 0.5 nm or more and 10 nm or less, preferably 0.5 nm or more and 3 nm or less.
此外,CAC-OS或CAC-metal oxide由具有不同能帶間隙的成分構成。例如,CAC-OS或CAC-metal oxide由具有起因於絕緣性區域的寬隙的成分及具有起因於導電性區域的窄隙的成分構成。在該構成中,當使載子流過時,載子主要在具有窄隙的成分中流過。此外,具有窄隙的成分藉由與具有寬隙的成分的互補作用,與具有窄隙的成分聯動而使載子流過具有寬隙的成分。因此,在將上述CAC-OS或CAC-metal oxide用於電晶體的通道形成區域時,在電晶體的導通狀態中可以得到高電流驅動力,亦即大通態電流及高場效移動率。In addition, CAC-OS or CAC-metal oxide is composed of components with different band gaps. For example, CAC-OS or CAC-metal oxide is composed of a component having a wide gap due to the insulating region and a component having a narrow gap due to the conductive region. In this configuration, when the carriers are allowed to flow, the carriers mainly flow in a component having a narrow gap. In addition, the component with a narrow gap interacts with the component with a narrow gap by complementing the component with a wide gap to allow carriers to flow through the component with a wide gap. Therefore, when the above-mentioned CAC-OS or CAC-metal oxide is used in the channel formation region of a transistor, a high current driving force can be obtained in the conduction state of the transistor, that is, a large on-state current and a high field efficiency mobility.
就是說,也可以將CAC-OS或CAC-metal oxide稱為基質複合材料(matrix composite)或金屬基質複合材料(metal matrix composite)。In other words, CAC-OS or CAC-metal oxide can also be referred to as matrix composite or metal matrix composite.
氧化物半導體(金屬氧化物)被分為單晶氧化物半導體和非單晶氧化物半導體。作為非單晶氧化物半導體例如有CAAC-OS(c-axis aligned crystalline oxide semiconductor)、多晶氧化物半導體、nc-OS (nanocrystalline oxide semiconductor)、a-like OS (amorphous-like oxide semiconductor)及非晶氧化物半導體等。Oxide semiconductors (metal oxides) are classified into single crystal oxide semiconductors and non-single crystal oxide semiconductors. Examples of non-single crystal oxide semiconductors include CAAC-OS (c-axis aligned crystalline oxide semiconductor), polycrystalline oxide semiconductor, nc-OS (nanocrystalline oxide semiconductor), a-like OS (amorphous-like oxide semiconductor), and Crystalline oxide semiconductor, etc.
CAAC-OS具有c軸配向性,其多個奈米晶在a-b面方向上連結而結晶結構具有畸變。注意,畸變是指在多個奈米晶連結的區域中晶格排列一致的區域與其他晶格排列一致的區域之間的晶格排列的方向變化的部分。CAAC-OS has c-axis orientation, and its multiple nanocrystals are connected in the a-b plane direction and the crystal structure has distortion. Note that distortion refers to a portion where the direction of the lattice arrangement changes between a region where the crystal lattice arrangement is consistent and other regions where the crystal lattice arrangement is consistent in a region where a plurality of nanocrystals are connected.
雖然奈米晶基本上是六角形,但是並不侷限於正六角形,有不是正六角形的情況。此外,在畸變中有時具有五角形或七角形等晶格排列。另外,在CAAC-OS中,即使在畸變附近也觀察不到明確的晶界(grain boundary)。亦即,可知由於晶格排列畸變,可抑制晶界的形成。這是由於CAAC-OS因為a-b面方向上的氧原子排列的低密度或因金屬元素被取代而使原子間的鍵合距離產生變化等而能夠包容畸變。Although nanocrystals are basically hexagonal, they are not limited to regular hexagons, and some are not regular hexagons. In addition, the distortion sometimes has a pentagonal or heptagonal lattice arrangement. In addition, in CAAC-OS, no clear grain boundary is observed even in the vicinity of distortion. That is, it can be seen that the formation of grain boundaries can be suppressed due to the distortion of the lattice arrangement. This is because CAAC-OS can tolerate distortion due to the low density of the arrangement of oxygen atoms in the a-b plane direction or the change in the bonding distance between atoms due to the substitution of metal elements.
CAAC-OS有具有層狀結晶結構(也稱為層狀結構)的傾向,在該層狀結晶結構中層疊有包含銦及氧的層(下面稱為In層)和包含元素M、鋅及氧的層(下面稱為(M,Zn)層)。另外,銦和元素M彼此可以取代,在用銦取代(M,Zn)層中的元素M的情況下,也可以將該層表示為(In,M,Zn)層。另外,在用元素M取代In層中的銦的情況下,也可以將該層表示為(In,M)層。CAAC-OS tends to have a layered crystal structure (also called a layered structure) in which a layer containing indium and oxygen (hereinafter referred to as In layer) and elements M, zinc and oxygen are laminated的层 (hereinafter referred to as (M, Zn) layer). In addition, indium and element M may be substituted for each other. When indium is substituted for element M in the (M, Zn) layer, the layer may also be expressed as a (In, M, Zn) layer. In addition, when the element M is substituted for indium in the In layer, the layer may also be expressed as an (In, M) layer.
CAAC-OS是結晶性高的金屬氧化物。另一方面,在CAAC-OS中不容易觀察明確的晶界,因此不容易發生起因於晶界的電子移動率的下降。此外,金屬氧化物的結晶性有時因雜質的進入或缺陷的生成等而降低,因此可以說CAAC-OS是雜質或缺陷(氧空位(也稱為VO (oxygen vacancy))等)少的金屬氧化物。因此,包含CAAC-OS的金屬氧化物的物理性質穩定。因此,包含CAAC-OS的金屬氧化物具有高耐熱性及高可靠性。CAAC-OS is a metal oxide with high crystallinity. On the other hand, in CAAC-OS, it is not easy to observe clear grain boundaries, and therefore it is not easy to decrease the electron mobility due to grain boundaries. In addition, the crystallinity of metal oxides may be reduced due to the entry of impurities or the generation of defects. Therefore, it can be said that CAAC-OS has fewer impurities or defects (oxygen vacancy (also called V O (oxygen vacancy)), etc.) Metal oxide. Therefore, the physical properties of the metal oxide containing CAAC-OS are stable. Therefore, the metal oxide containing CAAC-OS has high heat resistance and high reliability.
在nc-OS中,微小的區域(例如1nm以上且10nm以下的區域,特別是1nm以上且3nm以下的區域)中的原子排列具有週期性。另外,nc-OS在不同的奈米晶之間觀察不到結晶定向的規律性。因此,在膜整體中觀察不到配向性。所以,有時nc-OS在某些分析方法中與a-like OS或非晶氧化物半導體沒有差別。In nc-OS, the arrangement of atoms in a minute region (for example, a region of 1 nm or more and 10 nm or less, particularly a region of 1 nm or more and 3 nm or less) has periodicity. In addition, nc-OS has no regularity in crystal orientation between different nanocrystals. Therefore, no alignment was observed in the entire film. Therefore, sometimes nc-OS is not different from a-like OS or amorphous oxide semiconductor in some analysis methods.
另外,在包含銦、鎵和鋅的金屬氧化物的一種的銦-鎵-鋅氧化物(以下,IGZO)有時在由上述奈米晶構成時具有穩定的結構。尤其是,IGZO有在大氣中不容易進行晶體生長的傾向,所以有時與在IGZO由大結晶(在此,幾mm的結晶或者幾cm的結晶)形成時相比在IGZO由小結晶(例如,上述奈米結晶)形成時在結構上穩定。In addition, indium-gallium-zinc oxide (hereinafter, IGZO), which is one of metal oxides containing indium, gallium, and zinc, may have a stable structure when it is composed of the above-mentioned nanocrystal. In particular, IGZO tends to be difficult to grow crystals in the atmosphere, so sometimes it is made of small crystals (for example, IGZO), compared to when IGZO is formed of large crystals (here, a few mm or a few cm). , The above-mentioned nanocrystals are structurally stable when formed.
a-like OS是具有介於nc-OS與非晶氧化物半導體之間的結構的金屬氧化物。a-like OS包含空洞或低密度區域。也就是說,a-like OS的結晶性比nc-OS及CAAC-OS的結晶性低。a-like OS is a metal oxide with a structure between nc-OS and amorphous oxide semiconductor. a-like OS contains voids or low-density areas. In other words, the crystallinity of a-like OS is lower than that of nc-OS and CAAC-OS.
氧化物半導體(金屬氧化物)具有各種結構及各種特性。本發明的一個實施方式的氧化物半導體也可以包括非晶氧化物半導體、多晶氧化物半導體、a-like OS、nc-OS、CAAC-OS中的兩種以上。Oxide semiconductors (metal oxides) have various structures and various characteristics. The oxide semiconductor of one embodiment of the present invention may include two or more of amorphous oxide semiconductor, polycrystalline oxide semiconductor, a-like OS, nc-OS, and CAAC-OS.
用作半導體層的金屬氧化物膜可以使用惰性氣體和氧氣體中的任一個或兩個形成。注意,對形成金屬氧化物膜時的氧流量比(氧分壓)沒有特別的限制。但是,在要獲得場效移動率高的電晶體的情況下,形成金屬氧化物膜時的氧流量比(氧分壓)較佳為0%以上且30%以下,更佳為5%以上且30%以下,進一步較佳為7%以上且15%以下。The metal oxide film used as the semiconductor layer can be formed using either or both of an inert gas and an oxygen gas. Note that there is no particular limitation on the oxygen flow ratio (oxygen partial pressure) when forming the metal oxide film. However, in the case of obtaining a transistor with a high field effect mobility, the oxygen flow ratio (oxygen partial pressure) when forming the metal oxide film is preferably 0% or more and 30% or less, more preferably 5% or more and 30% or less, more preferably 7% or more and 15% or less.
金屬氧化物的能隙較佳為2eV以上,更佳為2.5eV以上,進一步較佳為3eV以上。如此,藉由使用能隙寬的金屬氧化物,可以減少電晶體的關態電流。The energy gap of the metal oxide is preferably 2 eV or more, more preferably 2.5 eV or more, and still more preferably 3 eV or more. In this way, by using a metal oxide with a wide energy gap, the off-state current of the transistor can be reduced.
本實施方式可以與其他實施方式適當地組合。This embodiment mode can be combined with other embodiment modes as appropriate.
實施方式3 在本實施方式中,使用圖8A至圖12F對本發明的一個實施方式的電子裝置進行說明。Embodiment 3 In this embodiment, an electronic device according to an embodiment of the present invention will be described using FIGS. 8A to 12F.
本實施方式的電子裝置在顯示部中包括本發明的一個實施方式的顯示裝置。本發明的一個實施方式的顯示裝置的顯示品質高且功耗低。另外,本發明的一個實施方式的顯示裝置容易實現高精細化及大型化。因此,可以用於各種電子裝置的顯示部。The electronic device of this embodiment includes the display device of one embodiment of the present invention in the display portion. The display device of one embodiment of the present invention has high display quality and low power consumption. In addition, the display device according to an embodiment of the present invention can easily achieve high definition and large size. Therefore, it can be used for display parts of various electronic devices.
作為電子裝置,例如除了電視機、桌上型或膝上型個人電腦、用於電腦等的顯示器、數位看板、彈珠機等大型遊戲機等具有較大的螢幕的電子裝置以外,還可以舉出數位相機、數位攝影機、數位相框、行動電話機、可攜式遊戲機、可攜式資訊終端、音頻再生裝置等。As electronic devices, for example, in addition to televisions, desktop or laptop personal computers, monitors used in computers, digital signage, pachinko machines, and other large game machines with larger screens, you can also cite It produces digital cameras, digital video cameras, digital photo frames, mobile phones, portable game consoles, portable information terminals, audio reproduction devices, etc.
特別是,因為本發明的一個實施方式的顯示裝置可以提高清晰度,所以可以適當地用於包括較小的顯示部的電子裝置。可以將這種電子裝置適當地用於可戴在頭上的可穿戴裝置等,例如手錶型或手鐲型資訊終端設備(可穿戴裝置)、頭戴顯示器等VR(Virtual Reality)用設備、眼鏡型AR(Augmented Reality)用設備或MR(Mixed Reality)用設備等。In particular, because the display device of one embodiment of the present invention can improve the definition, it can be suitably used for an electronic device including a smaller display portion. This electronic device can be suitably used for wearable devices that can be worn on the head, such as watch-type or bracelet-type information terminal equipment (wearable devices), head-mounted displays and other VR (Virtual Reality) equipment, glasses-type AR (Augmented Reality) equipment or MR (Mixed Reality) equipment, etc.
本實施方式的電子裝置也可以包括感測器(該感測器具有測量如下因素的功能:力、位移、位置、速度、加速度、角速度、轉速、距離、光、液、磁、溫度、化學物質、聲音、時間、硬度、電場、電流、電壓、電力、輻射線、流量、濕度、傾斜度、振動、氣味或紅外線)。The electronic device of this embodiment may also include a sensor (the sensor has the function of measuring the following factors: force, displacement, position, speed, acceleration, angular velocity, rotation speed, distance, light, liquid, magnetism, temperature, chemical substance , Sound, time, hardness, electric field, current, voltage, electricity, radiation, flow, humidity, inclination, vibration, smell or infrared).
本實施方式的電子裝置可以具有各種功能。例如,可以具有如下功能:將各種資訊(靜態影像、動態影像、文字影像等)顯示在顯示部上的功能;觸控面板的功能;顯示日曆、日期或時間等的功能;執行各種軟體(程式)的功能;進行無線通訊的功能;讀出儲存在存儲介質中的程式或資料的功能;等。The electronic device of this embodiment may have various functions. For example, it can have the following functions: the function of displaying various information (still images, moving images, text images, etc.) on the display; the function of the touch panel; the function of displaying the calendar, date or time, etc.; the execution of various software (programs) ); the function of wireless communication; the function of reading programs or data stored in the storage medium; etc.
圖8A示出眼鏡型電子裝置900的立體圖。電子裝置900包括一對顯示面板901、一對外殼902、一對光學構件903、一對安裝部904等。FIG. 8A shows a perspective view of the glasses-type
電子裝置900可以將由顯示面板901顯示的影像投影於光學構件903中的顯示區域906。因為光學構件903具有透光性,所以使用者可以與經過光學構件903看到的透過影像重疊地看到顯示於顯示區域906的影像。因此,電子裝置900是能夠進行AR顯示的電子裝置。The
電子裝置900所包括的顯示面板901除了影像顯示功能之外較佳為還具有攝像功能。此時,電子裝置900可以經過光學構件903接收入射到顯示面板901的光,並將其轉換為電信號而輸出。由此,可以拍攝使用者的眼睛或眼睛及其附近,將其輸出到外部或電子裝置900所包括的運算部作為影像資訊。The
一個外殼902設置有能夠拍攝前面的照相機905。此外,雖然未圖示,但是任一個外殼902設置有無線接收器或能夠與電纜連線的連接器,從而可以對外殼902供應影像信號等。此外,藉由在外殼902配置陀螺感測器等加速度感測器,可以檢測到使用者頭部的方向而將對應於該方向的影像顯示於顯示區域906。另外,外殼902較佳為設置有電池,較佳為能夠以無線或有線對該電池進行充電。One
參照圖8B說明相對於電子裝置900的顯示區域906的影像投影方法。外殼902的內部設置有顯示面板901、透鏡911、反射板912。此外,相當於光學構件903的顯示區域906的部分包括被用作半反射鏡的反射面913。An image projection method with respect to the
顯示面板901所發射的光915經過透鏡911而被反射板912反射到光學構件903一側。在光學構件903的內部中,光915在光學構件903的端面反復全反射,在到達反射面913時,影像被投影於反射面913。由此,使用者可以看到反射在反射面913上的光915和經過光學構件903(包括反射面913)的透過光916的兩個。The light 915 emitted by the
圖8A和圖8B示出反射板912及反射面913都具有曲面的例子。由此,與它們是平面的情況相比,可以提高光學設計的彈性,從而可以減薄光學構件903的厚度。另外,反射板912及反射面913也可以是平面。8A and 8B show examples in which both the reflecting
作為反射板912,可以使用具有鏡面的構件,並且該構件較佳為具有高反射率。此外,作為反射面913,也可以使用利用金屬膜的反射的半反射鏡,但是當使用利用全反射的棱鏡等時,可以提高透過光916的穿透率。As the
在此,電子裝置900較佳為具有調整透鏡911和顯示面板901之間的距離及角度中的一個或兩個的機構。由此,可以進行焦點調整、影像的擴大、縮小等。例如,採用透鏡911及顯示面板901中的一個或兩個能夠在光軸方向上移動的結構,即可。Here, the
電子裝置900較佳為具有能夠調整反射板912的角度的機構。藉由改變反射板912的角度,可以改變顯示影像的顯示區域906的位置。由此,可以根據使用者的眼睛的位置將顯示區域906配置於最合適的位置上。The
顯示面板901可以應用本發明的一個實施方式的顯示裝置。因此,可以實現能夠進行清晰度極高的顯示的電子裝置900。The
圖9A、圖9B示出護目鏡型電子裝置950的立體圖。圖9A是示出電子裝置950的正面、平面及左側面的立體圖,圖9B是示出電子裝置950的背面、底面及右側面的立體圖。9A and 9B show perspective views of the goggle type
電子裝置950包括一對顯示面板951、外殼952、一對安裝部954、緩衝構件955、一對透鏡956等。一對顯示面板951的每一個設置在外殼952內部的能夠經過透鏡956看到的位置上。The
電子裝置950是VR用電子裝置。安裝有電子裝置950的使用者可以經過透鏡956看到顯示於顯示面板951的影像。此外,藉由使一對顯示面板951顯示互不相同的影像,也可以進行利用視差的三維顯示。The
外殼952的背面一側設置有輸入端子957和輸出端子958。可以將供應來自影像輸出設備等的影像信號或用來對設置在外殼952內的電池進行充電的電力等的電纜連線到輸入端子957。輸出端子958例如被用作聲音輸出端子,可以與耳機或頭戴式耳機等連接。另外,在能夠藉由無線通訊輸出聲音資料的情況或從外部的影像輸出設備輸出聲音的情況下,也可以不設置該聲音輸出端子。An
電子裝置900較佳為具有一種機構,其中能夠調整透鏡956及顯示面板951的左右位置,以根據使用者的眼睛的位置使透鏡956及顯示面板951位於最合適的位置上。此外,還較佳為具有一種機構,其中藉由改變透鏡956和顯示面板951之間的距離來調整焦點。The
顯示面板951可以應用本發明的一個實施方式的顯示裝置。因此,可以實現能夠進行清晰度極高的顯示的電子裝置950。由此,使用者可以感受高逼真感。The
緩衝構件955是與使用者的臉(額頭及臉頰等)接觸的部分。藉由使緩衝構件955與使用者的臉密接,可以防止漏光,從而可以進一步提高逼真感。緩衝構件955較佳為使用柔軟的材料以在使用者安裝電子裝置950時與使用者的臉密接。例如,可以使用橡膠、矽酮橡膠、聚氨酯、海綿等材料。另外,當作為緩衝構件955使用用布或皮革(天然皮革或合成皮革)等覆蓋海綿等的表面的構件時,在使用者的臉和緩衝構件955之間不容易產生空隙,從而可以適當地防止漏光。在緩衝構件955及安裝部954等的接觸於使用者的皮膚的構件採用可拆卸的結構時,容易進行清洗及交換,所以是較佳的。The cushioning
圖10A所示的電子裝置6500是可以用作智慧手機的可攜式資訊終端設備。The
電子裝置6500包括外殼6501、顯示部6502、電源按鈕6503、按鈕6504、揚聲器6505、麥克風6506、照相機6507及光源6508等。顯示部6502具有觸控面板功能。The
顯示部6502可以使用本發明的一個實施方式的顯示裝置。The
圖10B是包括外殼6501的麥克風6506一側的端部的剖面示意圖。FIG. 10B is a schematic cross-sectional view of the end of the
外殼6501的顯示面一側設置有具有透光性的保護構件6510,被外殼6501及保護構件6510包圍的空間內設置有顯示面板6511、光學構件6512、觸控感測器面板6513、印刷電路板6517、電池6518等。The display surface side of the
顯示面板6511、光學構件6512及觸控感測器面板6513使用黏合層(未圖示)固定到保護構件6510。The
在顯示部6502的外側的區域中,顯示面板6511的一部分疊回,且該疊回部分連接有FPC6515。FPC6515安裝有IC6516。FPC6515與設置於印刷電路板6517的端子連接。In the area outside the
顯示面板6511可以使用本發明的一個實施方式的撓性顯示器。由此,可以實現極輕量的電子裝置。此外,由於顯示面板6511極薄,所以可以在抑制電子裝置的厚度的情況下安裝大容量的電池6518。此外,藉由折疊顯示面板6511的一部分以在像素部的背面設置與FPC6515的連接部,可以實現窄邊框的電子裝置。The
圖11A示出電視機的一個例子。在電視機7100中,外殼7101中組裝有顯示部7000。在此示出利用支架7103支撐外殼7101的結構。Fig. 11A shows an example of a television. In the
可以對顯示部7000適用本發明的一個實施方式的顯示裝置。The display device according to one embodiment of the present invention can be applied to the
可以藉由利用外殼7101所具備的操作開關或另外提供的遙控器7111進行圖11A所示的電視機7100的操作。另外,也可以在顯示部7000中具備觸控感測器,也可以藉由用指頭等觸摸顯示部7000進行電視機7100的操作。另外,也可以在遙控器7111中具備顯示從該遙控器7111輸出的資料的顯示部。藉由利用遙控器7111所具備的操作鍵或觸控面板,可以進行頻道及音量的操作,並可以對顯示在顯示部7000上的影像進行操作。The operation of the
另外,電視機7100具備接收機及數據機等。可以藉由利用接收機接收一般的電視廣播。再者,藉由數據機連接到有線或無線方式的通訊網路,從而進行單向(從發送者到接收者)或雙向(發送者和接收者之間或接收者之間等)的資訊通訊。In addition, the
圖11B示出筆記型個人電腦的一個例子。筆記型個人電腦7200包括外殼7211、鍵盤7212、指向裝置7213、外部連接埠7214等。在外殼7211中組裝有顯示部7000。Fig. 11B shows an example of a notebook personal computer. The notebook
可以對顯示部7000適用本發明的一個實施方式的顯示裝置。The display device according to one embodiment of the present invention can be applied to the
圖11C和圖11D示出數位看板的一個例子。11C and 11D show an example of a digital signage.
圖11C所示的數位看板7300包括外殼7301、顯示部7000及揚聲器7303等。此外,還可以包括LED燈、操作鍵(包括電源開關或操作開關)、連接端子、各種感測器、麥克風等。The
圖11D示出設置於圓柱狀柱子7401上的數位看板7400。數位看板7400包括沿著柱子7401的曲面設置的顯示部7000。FIG. 11D shows a
在圖11C和圖11D中,可以對顯示部7000適用本發明的一個實施方式的顯示裝置。In FIGS. 11C and 11D, the display device according to one embodiment of the present invention can be applied to the
顯示部7000越大,一次能夠提供的資訊量越多。顯示部7000越大,越容易吸引人的注意,例如可以提高廣告宣傳效果。The larger the
藉由將觸控面板用於顯示部7000,不僅可以在顯示部7000上顯示靜態影像或動態影像,使用者還能夠直覺性地進行操作,所以是較佳的。另外,在用於提供路線資訊或交通資訊等資訊的用途時,可以藉由直覺性的操作提高易用性。By using a touch panel for the
如圖11C和圖11D所示,數位看板7300或數位看板7400較佳為可以藉由無線通訊與使用者所攜帶的智慧手機等資訊終端設備7311或資訊終端設備7411聯動。例如,顯示在顯示部7000上的廣告資訊可以顯示在資訊終端設備7311或資訊終端設備7411的螢幕上。此外,藉由操作資訊終端設備7311或資訊終端設備7411,可以切換顯示部7000的顯示。As shown in FIGS. 11C and 11D, the
此外,可以在數位看板7300或數位看板7400上以資訊終端設備7311或資訊終端設備7411的螢幕為操作單元(控制器)執行遊戲。由此,不特定多個使用者可以同時參加遊戲,享受遊戲的樂趣。In addition, the screen of the
圖12A至圖12F所示的電子裝置包括外殼9000、顯示部9001、揚聲器9003、操作鍵9005(包括電源開關或操作開關)、連接端子9006、感測器9007(該感測器具有測量如下因素的功能:力、位移、位置、速度、加速度、角速度、轉速、距離、光、液、磁、溫度、化學物質、聲音、時間、硬度、電場、電流、電壓、電力、輻射線、流量、濕度、傾斜度、振動、氣味或紅外線)、麥克風9008等。The electronic device shown in FIGS. 12A to 12F includes a
圖12A至圖12F所示的電子裝置具有各種功能。例如,可以具有如下功能:將各種資訊(靜態影像、動態影像及文字影像等)顯示在顯示部上的功能;觸控面板的功能;顯示日曆、日期或時間等的功能;藉由利用各種軟體(程式)控制處理的功能;進行無線通訊的功能;讀出儲存在存儲介質中的程式或資料並進行處理的功能;等。注意,電子裝置可具有的功能不侷限於上述功能,而可以具有各種功能。電子裝置可以包括多個顯示部。另外,也可以在電子裝置中設置照相機等而使其具有如下功能:拍攝靜態影像或動態影像,且將所拍攝的影像儲存在存儲介質(外部存儲介質或內置於照相機的存儲介質)中的功能;將所拍攝的影像顯示在顯示部上的功能;等。The electronic devices shown in FIGS. 12A to 12F have various functions. For example, it can have the following functions: the function of displaying various information (still images, moving images, text images, etc.) on the display; the function of the touch panel; the function of displaying the calendar, date or time, etc.; by using various software (Program) The function of controlling processing; the function of performing wireless communication; the function of reading out the program or data stored in the storage medium and processing it; etc. Note that the functions that the electronic device can have are not limited to the above-mentioned functions, but can have various functions. The electronic device may include a plurality of display parts. In addition, it is also possible to install a camera or the like in the electronic device to have the function of shooting still images or moving images, and storing the captured images in a storage medium (external storage medium or storage medium built into the camera) ; The function of displaying the captured images on the display unit; etc.
下面,詳細地說明圖12A至圖12F所示的電子裝置。Hereinafter, the electronic device shown in FIGS. 12A to 12F will be described in detail.
圖12A是示出可攜式資訊終端9101的立體圖。可以將可攜式資訊終端9101例如用作智慧手機。注意,在可攜式資訊終端9101中,也可以設置揚聲器9003、連接端子9006、感測器9007等。另外,作為可攜式資訊終端9101,可以將文字或影像資訊顯示在其多個面上。在圖12A中示出三個圖示9050的例子。另外,可以將以虛線的矩形示出的資訊9051顯示在顯示部9001的其他面上。作為資訊9051的一個例子,可以舉出提示收到電子郵件、SNS或電話等的資訊;電子郵件或SNS等的標題;電子郵件或SNS等的發送者姓名;日期;時間;電池餘量;以及天線接收信號強度的顯示等。或者,可以在顯示有資訊9051的位置上顯示圖示9050等。FIG. 12A is a perspective view showing a
圖12B是示出可攜式資訊終端9102的立體圖。可攜式資訊終端9102具有將資訊顯示在顯示部9001的三個以上的面上的功能。在此,示出資訊9052、資訊9053、資訊9054分別顯示於不同的面上的例子。例如,在將可攜式資訊終端9102放在上衣口袋裡的狀態下,使用者能夠確認顯示在從可攜式資訊終端9102的上方看到的位置上的資訊9053。使用者可以確認到該顯示而無需從口袋裡拿出可攜式資訊終端9102,由此能夠判斷是否接電話。FIG. 12B is a perspective view showing a
圖12C是示出手錶型可攜式資訊終端9200的立體圖。可以將可攜式資訊終端9200例如用作智慧手錶。另外,顯示部9001的顯示面彎曲,可沿著其彎曲的顯示面進行顯示。此外,可攜式資訊終端9200例如藉由與可進行無線通訊的耳麥相互通訊可以進行免提通話。此外,藉由利用連接端子9006,可攜式資訊終端9200可以與其他資訊終端進行資料傳輸或進行充電。充電也可以藉由無線供電進行。FIG. 12C is a perspective view showing a watch-type
圖12D、圖12E、圖12F是示出可以折疊的可攜式資訊終端9201的立體圖。另外,圖12D是將可攜式資訊終端9201展開的狀態的立體圖、圖12F是折疊的狀態的立體圖、圖12E是從圖12D的狀態和圖12F的狀態中的一個轉換成另一個時中途的狀態的立體圖。可攜式資訊終端9201在折疊狀態下可攜性好,而在展開狀態下因為具有無縫拼接較大的顯示區域所以顯示的瀏覽性強。可攜式資訊終端9201所包括的顯示部9001被由鉸鏈9055連結的三個外殼9000支撐。顯示部9001例如可以在曲率半徑0.1mm以上且150mm以下的範圍彎曲。12D, 12E, and 12F are perspective views showing a
本實施方式可以與其他實施方式及實施例適當地組合。 實施例This embodiment mode can be combined with other embodiment modes and examples as appropriate. Example
在本實施例中說明製造本發明的一個實施方式的顯示裝置而得到的結果。In this example, a result obtained by manufacturing a display device according to an embodiment of the present invention will be described.
在本實施例中,製造主動矩陣型顯示裝置,其中顯示部的尺寸為對角線2.23英寸,有效像素數為20× 20,像素尺寸為2000μm×2000μm(LED封裝的安裝間距)。In this embodiment, an active matrix display device is manufactured, in which the size of the display portion is 2.23 inches diagonally, the number of effective pixels is 20×20, and the pixel size is 2000 μm×2000 μm (the mounting pitch of the LED package).
作為顯示元件使用包括紅色、綠色及藍色的三種顏色的小型LED晶片的1mm□的LED封裝。As the display element, a 1mm □ LED package including three colors of red, green, and blue small LED chips is used.
作為電晶體使用將結晶金屬氧化物用於半導體層的自對準型頂閘極(Top Gate Self-Alignment,TGSA)結構的電晶體。作為金屬氧化物使用In-Ga-Zn類氧化物。As the transistor, a TGSA (Top Gate Self-Alignment) structure in which a crystalline metal oxide is used for the semiconductor layer is used. As the metal oxide, an In-Ga-Zn-based oxide is used.
沒有內置閘極驅動器及源極驅動器。There is no built-in gate driver and source driver.
本實施例的顯示裝置的像素電路相當於圖7所示的像素電路。The pixel circuit of the display device of this embodiment corresponds to the pixel circuit shown in FIG. 7.
本實施例的顯示裝置具有圖1A至圖1C所示的俯視結構及圖2A至圖2C及圖3A至圖3C所示的剖面結構。另外,沒有設置絕緣層104及樹脂129。The display device of this embodiment has the top structure shown in FIGS. 1A to 1C and the cross-sectional structure shown in FIGS. 2A to 2C and FIGS. 3A to 3C. In addition, the insulating
基板102使用玻璃基板。導電層131R、導電層131G、導電層131B及導電層132採用大約100nm厚的鈦膜、大約400nm厚的鋁膜及大約100nm厚的鈦膜的疊層結構。也就是說,導電層131R、導電層131G、導電層131B及導電層132的每一個中的接觸於導電體133的層是鈦膜。保護層128使用大約2μm厚的丙烯酸樹脂膜。The
在基板102上形成從電晶體120到保護層128為止的疊層結構,然後在導電層131R、導電層131G、導電層131B及導電層132上塗佈銀膏作為導電體133,安裝LED封裝150。A laminated structure from the
圖13示出本實施例的顯示裝置的顯示照片。FIG. 13 shows a display photograph of the display device of this embodiment.
如上所述,在本實施例中,藉由在形成有將金屬氧化物用於半導體層的電晶體的基板上安裝LED封裝,製造主動矩陣型顯示裝置。此外,如圖13所示,在本實施例中製造的顯示裝置可以得到良好的顯示結果。As described above, in this embodiment, an active matrix display device is manufactured by mounting an LED package on a substrate formed with a transistor using a metal oxide as a semiconductor layer. In addition, as shown in FIG. 13, the display device manufactured in this embodiment can obtain good display results.
C1:電容器 GL1:掃描線 GL2:掃描線 SW21:開關 SW22:開關 100:顯示裝置 100A:顯示裝置 101:基板 102:基板 103:電極 104:絕緣層 106:電極 108:佈線 109:電路 110:顯示部 111:半導體層 112:電極 113:發光層 114:半導體層 115:電極 116:電極 117:半導體層 118:發光層 119:半導體層 120:電晶體 120A:電晶體 120B:電晶體 120C:電晶體 121:導電層 122:絕緣層 123:金屬氧化物層 123i:通道形成區域 123n:低電阻區域 124:絕緣層 124a:絕緣層 124b:絕緣層 125:導電層 126a:導電層 126b:導電層 127:絕緣層 128:保護層 129:樹脂 130:像素 131B:導電層 131G:導電層 131R:導電層 132:導電層 133:導電體 141:基板 142:外殼 143:引線 144:引線 145:密封層 146:黏合層 147:顏色轉換層 150:LED封裝 151:基板 151B:藍色LED晶片 151G:綠色LED晶片 151R:紅色LED晶片 152B:電極 152G:電極 152R:電極 153:電極 154:散熱片 155:LED封裝 161:導電層 162:絕緣層 163:絕緣層 164:絕緣層 165:金屬氧化物層 166:導電層 167:絕緣層 168:導電層 171:絕緣層 172:導電層 173:絕緣層 174:基板 175:絕緣層 181:絕緣層 182:絕緣層 183:絕緣層 184a:導電層 184b:導電層 185:絕緣層 186:絕緣層 187:導電層 188:絕緣層 189:導電層 190:電晶體 191:基板 192:元件分離層 193:低電阻區域 194:絕緣層 195:導電層 196:絕緣層 198:導電層 199:絕緣層 200:像素 210:發光元件 900:電子裝置 901:顯示面板 902:外殼 903:光學構件 904:裝上部 905:照相機 906:顯示區域 911:透鏡 912:反射板 913:反射面 915:光 916:透過光 950:電子裝置 951:顯示面板 952:外殼 954:裝上部 955:緩衝構件 956:透鏡 957:輸入端子 958:輸出端子 6500:電子裝置 6501:外殼 6502:顯示部 6503:電源按鈕 6504:按鈕 6505:揚聲器 6506:麥克風 6507:照相機 6508:光源 6510:保護構件 6511:顯示面板 6512:光學構件 6513:觸控感測器面板 6515:FPC 6516:IC 6517:印刷電路板 6518:電池 7000:顯示部 7100:電視機 7101:外殼 7103:支架 7111:遙控器 7200:筆記型個人電腦 7211:外殼 7212:鍵盤 7213:指向裝置 7214:外部連接埠 7300:數位看板 7301:外殼 7303:揚聲器 7311:資訊終端設備 7400:數位看板 7401:柱子 7411:資訊終端設備 9000:外殼 9001:顯示部 9003:揚聲器 9005:操作鍵 9006:連接端子 9007:感測器 9008:麥克風 9050:圖示 9051:資訊 9052:資訊 9053:資訊 9054:資訊 9055:鉸鏈 9101:可攜式資訊終端 9102:可攜式資訊終端 9200:可攜式資訊終端 9201:可攜式資訊終端C1: Capacitor GL1: Scan line GL2: Scan line SW21: switch SW22: switch 100: display device 100A: display device 101: substrate 102: substrate 103: Electrode 104: insulating layer 106: Electrode 108: Wiring 109: Circuit 110: Display 111: semiconductor layer 112: Electrode 113: Emitting layer 114: semiconductor layer 115: Electrode 116: Electrode 117: semiconductor layer 118: Emitting layer 119: Semiconductor layer 120: Transistor 120A: Transistor 120B: Transistor 120C: Transistor 121: conductive layer 122: insulating layer 123: metal oxide layer 123i: channel formation area 123n: low resistance area 124: Insulation layer 124a: insulating layer 124b: insulating layer 125: conductive layer 126a: conductive layer 126b: conductive layer 127: Insulation layer 128: protective layer 129: Resin 130: pixels 131B: conductive layer 131G: conductive layer 131R: conductive layer 132: conductive layer 133: Conductor 141: Substrate 142: Shell 143: Lead 144: Lead 145: Sealing layer 146: Adhesive layer 147: color conversion layer 150: LED package 151: substrate 151B: Blue LED chip 151G: Green LED chip 151R: Red LED chip 152B: Electrode 152G: Electrode 152R: Electrode 153: Electrode 154: heat sink 155: LED package 161: conductive layer 162: Insulation layer 163: Insulation layer 164: Insulation layer 165: metal oxide layer 166: conductive layer 167: Insulation layer 168: conductive layer 171: Insulation layer 172: conductive layer 173: Insulation layer 174: Substrate 175: Insulation layer 181: Insulation layer 182: Insulation layer 183: Insulation layer 184a: conductive layer 184b: conductive layer 185: insulating layer 186: Insulation layer 187: Conductive layer 188: Insulation layer 189: conductive layer 190: Transistor 191: substrate 192: component separation layer 193: Low resistance area 194: Insulation layer 195: conductive layer 196: Insulation layer 198: conductive layer 199: Insulation layer 200: pixels 210: light-emitting element 900: Electronic device 901: display panel 902: shell 903: Optical components 904: install the upper part 905: camera 906: display area 911: lens 912: reflector 913: reflective surface 915: light 916: transmitted light 950: electronic device 951: display panel 952: shell 954: install the upper part 955: Cushion member 956: lens 957: Input terminal 958: output terminal 6500: electronic device 6501: shell 6502: Display 6503: Power button 6504: Button 6505: speaker 6506: Microphone 6507: Camera 6508: light source 6510: Protective member 6511: display panel 6512: Optical components 6513: Touch sensor panel 6515: FPC 6516: IC 6517: printed circuit board 6518: battery 7000: Display 7100: TV 7101: Shell 7103: Bracket 7111: remote control 7200: Notebook PC 7211: Shell 7212: keyboard 7213: pointing device 7214: External port 7300: digital signage 7301: Shell 7303: Speaker 7311: Information Terminal Equipment 7400: digital signage 7401: pillar 7411: Information Terminal Equipment 9000: Shell 9001: Display Department 9003: Speaker 9005: Operation key 9006: Connection terminal 9007: Sensor 9008: Microphone 9050: icon 9051: Information 9052: Information 9053: Information 9054: Information 9055: Hinge 9101: Portable Information Terminal 9102: Portable Information Terminal 9200: portable information terminal 9201: Portable Information Terminal
在圖式中: 圖1A至圖1D是示出顯示裝置的一個例子的俯視圖; 圖2A是示出顯示裝置的一個例子的剖面圖,圖2B是示出LED封裝的一個例子的剖面圖,圖2C是示出LED晶片的一個例子的剖面圖; 圖3A是示出顯示裝置的一個例子的剖面圖,圖3B及圖3D是示出LED封裝的一個例子的剖面圖,圖3C是示出LED晶片的一個例子的剖面圖; 圖4是示出顯示裝置的一個例子的剖面圖; 圖5是示出顯示裝置的一個例子的剖面圖; 圖6是示出顯示裝置的一個例子的剖面圖; 圖7是示出顯示裝置的像素的一個例子的電路圖; 圖8A和圖8B是示出電子裝置的一個例子的圖; 圖9A和圖9B是示出電子裝置的一個例子的圖; 圖10A和圖10B是示出電子裝置的一個例子的圖; 圖11A至圖11D是示出電子裝置的例子的圖; 圖12A至圖12F是示出電子裝置的例子的圖; 圖13是實施例的顯示裝置的顯示照片。In the schema: 1A to 1D are plan views showing an example of a display device; 2A is a cross-sectional view showing an example of a display device, FIG. 2B is a cross-sectional view showing an example of an LED package, and FIG. 2C is a cross-sectional view showing an example of an LED chip; 3A is a cross-sectional view showing an example of a display device, FIGS. 3B and 3D are cross-sectional views showing an example of an LED package, and FIG. 3C is a cross-sectional view showing an example of an LED chip; Figure 4 is a cross-sectional view showing an example of a display device; FIG. 5 is a cross-sectional view showing an example of a display device; FIG. 6 is a cross-sectional view showing an example of a display device; FIG. 7 is a circuit diagram showing an example of pixels of a display device; 8A and 8B are diagrams showing an example of an electronic device; 9A and 9B are diagrams showing an example of an electronic device; 10A and 10B are diagrams showing an example of an electronic device; 11A to 11D are diagrams showing examples of electronic devices; 12A to 12F are diagrams showing examples of electronic devices; Fig. 13 is a display photograph of the display device of the embodiment.
100:顯示裝置 100: display device
108:佈線 108: Wiring
110:顯示部 110: Display
130:像素 130: pixels
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI779689B (en) * | 2020-09-02 | 2022-10-01 | 大陸商昆山國顯光電有限公司 | Display panel and display device |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011004755A1 (en) * | 2009-07-10 | 2011-01-13 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
WO2019230229A1 (en) * | 2018-05-31 | 2019-12-05 | 株式会社ジャパンディスプレイ | Display device and array substrate |
US11710760B2 (en) | 2019-06-21 | 2023-07-25 | Semiconductor Energy Laboratory Co., Ltd. | Display device, display module, electronic device, and manufacturing method of display device |
US11476299B2 (en) * | 2020-08-31 | 2022-10-18 | Hong Kong Beida Jade Bird Display Limited | Double color micro LED display panel |
WO2022137015A1 (en) * | 2020-12-25 | 2022-06-30 | 株式会社半導体エネルギー研究所 | Display device, display module, and electronic apparatus |
WO2022180481A1 (en) * | 2021-02-26 | 2022-09-01 | 株式会社半導体エネルギー研究所 | Display apparatus and electronic equipment |
JPWO2022238797A1 (en) | 2021-05-13 | 2022-11-17 | ||
CN115083278A (en) * | 2022-06-24 | 2022-09-20 | 维沃移动通信有限公司 | Display module and electronic device |
Family Cites Families (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW540251B (en) * | 1999-09-24 | 2003-07-01 | Semiconductor Energy Lab | EL display device and method for driving the same |
JP4120223B2 (en) | 2002-01-16 | 2008-07-16 | ソニー株式会社 | Electronic component manufacturing method and image display apparatus using the same |
US7230374B2 (en) * | 2003-09-22 | 2007-06-12 | Samsung Sdi Co., Ltd. | Full color organic light-emitting device having color modulation layer |
CN100448040C (en) * | 2006-01-12 | 2008-12-31 | 聚鼎科技股份有限公司 | LED device with temp. control function |
JP5268267B2 (en) | 2007-02-28 | 2013-08-21 | コーア株式会社 | Light emitting component and method for manufacturing the same |
CN101060152A (en) * | 2007-05-15 | 2007-10-24 | 佛山市国星光电科技有限公司 | A sheet-type LED |
JP5317712B2 (en) * | 2008-01-22 | 2013-10-16 | 株式会社半導体エネルギー研究所 | Semiconductor device and manufacturing method of semiconductor device |
CN103545342B (en) * | 2008-09-19 | 2018-01-26 | 株式会社半导体能源研究所 | Semiconductor device |
TWI389295B (en) * | 2009-02-18 | 2013-03-11 | Chi Mei Lighting Tech Corp | Light-emitting diode light source module |
WO2011004755A1 (en) * | 2009-07-10 | 2011-01-13 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
KR101155903B1 (en) * | 2010-03-09 | 2012-06-21 | 삼성모바일디스플레이주식회사 | Organic light emitting diode display and method for manufacturing the same |
US20150014738A1 (en) * | 2012-02-21 | 2015-01-15 | Peiching Ling | Light emitting diode package and method of fabricating the same |
US8803185B2 (en) * | 2012-02-21 | 2014-08-12 | Peiching Ling | Light emitting diode package and method of fabricating the same |
TWI611582B (en) * | 2013-04-10 | 2018-01-11 | 半導體能源研究所股份有限公司 | Semiconductor device and manufacturing method thereof |
US8987765B2 (en) | 2013-06-17 | 2015-03-24 | LuxVue Technology Corporation | Reflective bank structure and method for integrating a light emitting device |
US9318663B2 (en) * | 2013-07-10 | 2016-04-19 | Epistar Corporation | Light-emitting element |
JP2015023220A (en) * | 2013-07-22 | 2015-02-02 | ローム株式会社 | Display device |
JP6280710B2 (en) * | 2013-09-02 | 2018-02-14 | 新光電気工業株式会社 | WIRING BOARD, LIGHT EMITTING DEVICE AND WIRING BOARD MANUFACTURING METHOD |
WO2015083042A1 (en) * | 2013-12-03 | 2015-06-11 | 株式会社半導体エネルギー研究所 | Semiconductor device, and manufacturing method for same |
JP6402017B2 (en) * | 2013-12-26 | 2018-10-10 | 株式会社半導体エネルギー研究所 | Semiconductor device |
KR102116986B1 (en) * | 2014-02-17 | 2020-05-29 | 삼성전자 주식회사 | LED package |
TWI790965B (en) * | 2014-05-30 | 2023-01-21 | 日商半導體能源研究所股份有限公司 | Touch panel |
KR20160141301A (en) * | 2015-05-29 | 2016-12-08 | 삼성전자주식회사 | Semiconductor light emitting device package |
CN104979326B (en) * | 2015-07-09 | 2017-12-05 | 深圳市晶泓科技有限公司 | LED luminescence components, LED luminescent panels and LED display |
US10453759B2 (en) * | 2015-09-11 | 2019-10-22 | Sharp Kabushiki Kaisha | Image display device |
KR20170087091A (en) * | 2016-01-19 | 2017-07-28 | 삼성디스플레이 주식회사 | Display device |
CN109328378A (en) * | 2016-06-29 | 2019-02-12 | 三菱电机株式会社 | The manufacturing method of display device and display device |
JP2018077376A (en) * | 2016-11-10 | 2018-05-17 | 株式会社半導体エネルギー研究所 | Display |
JP7050460B2 (en) * | 2016-11-22 | 2022-04-08 | 株式会社半導体エネルギー研究所 | Display device |
KR20180071743A (en) * | 2016-12-20 | 2018-06-28 | 엘지디스플레이 주식회사 | Light emitting diode chip and light emitting diode display apparatus comprising the same |
KR102374754B1 (en) * | 2017-09-27 | 2022-03-15 | 엘지디스플레이 주식회사 | Display device having a touch structure |
CN110504282B (en) * | 2019-08-27 | 2021-11-23 | 京东方科技集团股份有限公司 | Display substrate, manufacturing method thereof and display device |
KR20210081512A (en) * | 2019-12-23 | 2021-07-02 | 삼성디스플레이 주식회사 | Display apparatus and manufacturing method thereof |
KR20210145553A (en) * | 2020-05-25 | 2021-12-02 | 삼성전자주식회사 | Light emitting device, light source module and method for manufacturing light emitting device |
CN112669714B (en) * | 2020-12-22 | 2022-09-20 | 业成科技(成都)有限公司 | Light emitting diode display and manufacturing method thereof |
CN113160758B (en) * | 2021-03-03 | 2022-12-02 | 华源智信半导体(深圳)有限公司 | Direct type mini-LED backlight module and brightness compensation method and correction system of display device |
US11961822B2 (en) * | 2022-01-17 | 2024-04-16 | Samsung Display Co., Ltd. | Display device, and tiled display device including the display device |
US20230238496A1 (en) * | 2022-01-21 | 2023-07-27 | Samsung Display Co., Ltd. | Display device and tiled display device |
KR20230113474A (en) * | 2022-01-21 | 2023-07-31 | 삼성디스플레이 주식회사 | Display device and tiled display device including the same |
US20230246147A1 (en) * | 2022-01-28 | 2023-08-03 | Samsung Display Co., Ltd. | Display device and tiled display device |
-
2019
- 2019-08-26 CN CN201980058182.9A patent/CN112673411B/en active Active
- 2019-08-26 WO PCT/IB2019/057136 patent/WO2020049397A1/en active Application Filing
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- 2019-08-26 CN CN202311199580.7A patent/CN117316973A/en active Pending
- 2019-08-29 TW TW108130993A patent/TW202025113A/en unknown
-
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- 2023-07-11 JP JP2023113497A patent/JP2023139062A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI779689B (en) * | 2020-09-02 | 2022-10-01 | 大陸商昆山國顯光電有限公司 | Display panel and display device |
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CN112673411B (en) | 2023-10-10 |
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