TW202016350A - A high-adhesive anti-aging nano-coating and a preparation method thereof - Google Patents

A high-adhesive anti-aging nano-coating and a preparation method thereof Download PDF

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TW202016350A
TW202016350A TW108137928A TW108137928A TW202016350A TW 202016350 A TW202016350 A TW 202016350A TW 108137928 A TW108137928 A TW 108137928A TW 108137928 A TW108137928 A TW 108137928A TW 202016350 A TW202016350 A TW 202016350A
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宗堅
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大陸商江蘇菲沃泰納米科技有限公司
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Abstract

The invention provides a high-adhesive anti-aging nano-coating and a preparation method thereof, the substrate is exposed to a monomer vapor atmosphere, and a chemical reaction is formed on the surface of the substrate by plasma discharge to form a protective coating. The monomer vapor is vaporized monomer 1, and/or monomer 2 and/or monomer 3, all of which have their specific structure. The coating obtained by the method of the present application not only achieves good UV aging resistance, but also achieves good adhesion.

Description

一種高粘附性耐老化納米塗層及其製備方法High-adhesion aging-resistant nano-coating and preparation method thereof

本發明涉及等離子體化學氣相沉積技術領域,具體涉及到一種高粘附性耐老化納米防護塗層及其製備方法。The invention relates to the technical field of plasma chemical vapor deposition, in particular to a high-adhesion aging-resistant nano protective coating and a preparation method thereof.

含氟烯烴的聚合物,具有優異的化學穩定性、電絕緣性、自潤滑性、不燃性、耐老化性、抗紫外等,廣泛應用於軍事和日常生活中。如聚四氟乙烯是當今世界上耐腐蝕最佳材料之一,有“塑料王”之稱。聚四氟乙烯密封件、墊圈、墊片等聚四氟乙烯製品已在化工、機械、電子、電器、軍工、航天、環保和橋樑等國民經濟領域中起到了舉足輕重的作用。但常用的氟碳材料表面能一般很低,導致材料間潤濕性能差,不能很好地與基材化學鍵粘接,吸附在基材表面主要靠分子間的范德華力起作用。且該范德華力由於氟碳材料結構高度對稱,分子結構極性低,不能形成較強的取向力和誘導力,僅僅形成較弱的色散力,使塗層容易從基材表面被剝離出來。目前解決的辦法主要是對表面進行改性和合成新型膠粘劑,表面改性方法如化學處理、高溫熔融、輻射接枝等;新型膠粘劑的合成如開發新型的環氧樹脂粘接劑、含氟聚合物粘接劑等。前者往往需要採用耗能嚴重的特殊工序;後者新型膠粘劑的研發比較困難,且使用該膠粘劑往往也給企業帶來成本的大幅上升。另外,這兩種方法不適合於利用等離子體氣相沉積製備納米級塗層的工藝。等離子體氣相沉積方法一般需預先對基材進行表面清洗和等離子體刻蝕處理,然後再將氟碳材料直接沉積在基材表面形成納米級厚度的塗層。如何通過分子結構的調控和不同功能塗層之間複合,達到既保持含氟烯烴聚合物的化學惰性、抗紫外等防護能力,又保證塗層與基材之間足夠的結合力,是目前等離子體納米塗層研究的重要方向之一。Fluorinated olefin polymers have excellent chemical stability, electrical insulation, self-lubricity, non-combustibility, aging resistance, UV resistance, etc., and are widely used in military and daily life. For example, PTFE is one of the best corrosion-resistant materials in the world today, and is known as the "plastic king". Teflon products such as Teflon seals, gaskets, and gaskets have played a pivotal role in the national economy such as chemicals, machinery, electronics, electrical appliances, military industry, aerospace, environmental protection, and bridges. However, the surface energy of commonly used fluorocarbon materials is generally very low, resulting in poor wetting properties between the materials, which cannot be well bonded to the substrate chemically. The adsorption on the substrate surface mainly depends on the intermolecular van der Waals force. Moreover, due to the highly symmetrical structure of the fluorocarbon material and low molecular structure polarity, the van der Waals force cannot form a strong orientation force and an inducing force, but only forms a weak dispersion force, so that the coating is easily peeled off from the surface of the substrate. The current solution is mainly to modify the surface and synthesize new adhesives, surface modification methods such as chemical treatment, high temperature melting, radiation grafting, etc.; the synthesis of new adhesives such as the development of new epoxy resin adhesives, fluorine-containing polymerization Adhesives, etc. The former often requires the use of special energy-intensive special processes; the latter is more difficult to develop new adhesives, and the use of the adhesive often also brings a significant cost increase to the enterprise. In addition, these two methods are not suitable for the process of preparing nano-scale coatings by plasma vapor deposition. The plasma vapor deposition method generally needs to perform surface cleaning and plasma etching treatment on the substrate in advance, and then directly deposit the fluorocarbon material on the surface of the substrate to form a nanometer-thick coating. How to achieve the protection of the chemical inertness and anti-ultraviolet protection of fluorine-containing olefin polymers through the adjustment of molecular structure and the combination of different functional coatings, while ensuring sufficient bonding between the coating and the substrate, is currently the plasma One of the important directions of bulk nano-coating research.

本發明的目的在於提供一種高粘附性耐老化納米塗層及其製備方法,解決塗層與基材表面粘接性差、容易被剝離的問題。The purpose of the present invention is to provide a high-adhesion aging-resistant nano-coating and a preparation method thereof to solve the problems of poor adhesion between the coating and the surface of the substrate and easy peeling.

本發明是通過以下技術方案實現的:The present invention is achieved through the following technical solutions:

一種高粘附性耐老化納米塗層,將基材暴露於單體蒸汽氛圍中,通過等離子體放電在基材表面發生化學反應形成保護塗層;A high-adhesion aging-resistant nano-coating, which exposes the substrate to the atmosphere of monomer vapor, and forms a protective coating by plasma discharge on the surface of the substrate;

所述單體蒸汽為汽化的單體1和/或單體2和/或單體3;也就是說,所述單體蒸汽包括汽化的單體1、單體2和單體3中的一種或者若干種,所述“若干種”是指任兩種單體或者三種單體;若干種氣體可以先後分別通入,也可以同時通入,或者先通入任兩種單體,再通入第三種單體;The monomer vapor is vaporized monomer 1 and/or monomer 2 and/or monomer 3; that is, the monomer vapor includes one of vaporized monomer 1, monomer 2 and monomer 3 Or several types, the "several types" refer to any two types of monomers or three types of monomers; several kinds of gases can be passed in separately or simultaneously, or any two types of monomers can be passed in first and then in The third monomer;

所述單體1具有式(I)所示結構:

Figure 108137928-A0304-0001
(I)The monomer 1 has the structure represented by formula (I):
Figure 108137928-A0304-0001
(I)

所述單體2具有式(II)所示結構:

Figure 108137928-A0304-0002
(II)The monomer 2 has a structure represented by formula (II):
Figure 108137928-A0304-0002
(II)

所述單體3具有式(III)所示的結構:

Figure 108137928-A0304-0003
(III)The monomer 3 has a structure represented by formula (III):
Figure 108137928-A0304-0003
(III)

其中,R1 、R2 、R3 、R4 、R5 、R6 、R7 、R8 、R9 、R10 、R11 、R12 、R13 是與雙鍵相連的基團,可獨立地選自氫、烷基、芳基、鹵素、鹵代烷基或鹵代芳基等疏水性基團。Among them, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , and R 13 are groups connected to the double bond. It is independently selected from hydrophobic groups such as hydrogen, alkyl, aryl, halogen, haloalkyl or haloaryl.

m為0-5的整數,n為1-20的整數,j、k分別為0-10的整數且不能同時為0。m is an integer of 0-5, n is an integer of 1-20, j and k are integers of 0-10 and cannot be 0 at the same time.

R14 是雙乙烯基醚中間的橋聯基團,包括是極性基團和非極性基團,具體地,可以是鍵、-CO-、-COO-、-O-、芳亞基、脂環烷亞基或羥基取代的脂肪烷基亞基。R 14 is a bridging group in the middle of divinyl ether, including polar groups and non-polar groups, specifically, may be a bond, -CO-, -COO-, -O-, arylene, alicyclic Alkylene or hydroxy substituted fatty alkyl subunits.

不飽和鍵上的基團為H、短碳鏈烷基時,可以提高膜層的沉積速度;氟取代基的存在則可以提高膜層的疏水性能。When the group on the unsaturated bond is H or a short carbon chain alkyl, the deposition rate of the film can be increased; the presence of fluorine substituents can improve the hydrophobic performance of the film.

優選地,R1 、R2 、R3 、R4 、R5 、R6 、R7 、R8 、R9 、R10 、R11 、R12 、R13 獨立地選自氫、甲基或氟。Preferably, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , R 13 are independently selected from hydrogen, methyl or fluorine.

合適的氟化烷基碳原子數可以保證單體的熔點、沸點在適當的範圍內,單體容易被汽化引入真空反應腔體。A suitable number of fluorinated alkyl carbon atoms can ensure that the melting point and boiling point of the monomer are within an appropriate range, and the monomer is easily vaporized into the vacuum reaction chamber.

優選地,m為0-2的整數,n為1-8的整數。j、k分別為1-4的整數。Preferably, m is an integer of 0-2, and n is an integer of 1-8. j and k are integers of 1-4, respectively.

環狀結構利於降低聚合物的結晶度,含有羥基基團利於提高塗層與基材的粘接性,優選地,R14 可以是鍵、脂環烷亞基或羥基取代的脂肪烷基亞基。The cyclic structure is beneficial for reducing the crystallinity of the polymer, and containing hydroxyl groups is advantageous for improving the adhesion between the coating and the substrate. Preferably, R 14 may be a bond, an alicyclic alkylene subunit or a hydroxy substituted fatty alkyl subunit .

優選地,單體1在常溫常壓下是一種液體;和/或,單體3在常溫常壓下是一種液體。Preferably, the monomer 1 is a liquid at normal temperature and pressure; and/or the monomer 3 is a liquid at normal temperature and pressure.

優選地,單體2是一種短碳鏈氟化烯烴,在常溫常壓下是一種氣體。Preferably, monomer 2 is a short carbon chain fluorinated olefin, which is a gas at normal temperature and pressure.

所述塗層對不同基材的表面進行耐老化疏水進行防護,基材可以是金屬、光學儀器、衣服織物、電子器件、醫療器械等固體材料。The coating protects the surfaces of different substrates against aging and hydrophobicity. The substrates may be solid materials such as metals, optical instruments, clothing fabrics, electronic devices, and medical devices.

另外,本發明還公開了一種上述納米塗層的製備方法,包括以下步驟:In addition, the present invention also discloses a method for preparing the above nano-coating, including the following steps:

(1)將基材置於等離子體室的反應腔體內,反應腔體內的真空度為0.1-1000毫托;(1) Place the substrate in the reaction chamber of the plasma chamber, the vacuum degree in the reaction chamber is 0.1-1000 mTorr;

(2)通入等離子體源氣體,開啟沉積用等離子體放電;將單體蒸汽通入反應腔體內,進行化學氣相沉積;(2) Pass the plasma source gas to start the plasma discharge for deposition; pass the monomer vapor into the reaction chamber for chemical vapor deposition;

(3)關閉沉積用等離子體放電,通入潔淨的壓縮空氣或者惰性氣體,恢復至常壓,打開反應腔體,取出基材。(3) Turn off the plasma discharge for deposition, pass clean compressed air or inert gas, return to normal pressure, open the reaction chamber, and take out the substrate.

優選地,所述單體蒸汽包括單體1、單體2和單體3;Preferably, the monomer vapor includes monomer 1, monomer 2 and monomer 3;

所述單體1、單體2和單體3的蒸汽分別先後通入反應腔體;The steam of the monomer 1, the monomer 2 and the monomer 3 respectively pass into the reaction chamber successively;

或者,所述單體1、單體2和單體3的蒸汽同時通入反應腔體;Or, the steam of the monomer 1, the monomer 2 and the monomer 3 are simultaneously passed into the reaction chamber;

或者,先將所述單體1、單體2和單體3中的任意兩種同時通入反應腔體,再所述單體1、單體2和單體3中第三種單體通入反應腔體。Alternatively, firstly, any two of the monomer 1, the monomer 2 and the monomer 3 are simultaneously passed into the reaction chamber, and then the third monomer of the monomer 1, the monomer 2 and the monomer 3 are passed Into the reaction chamber.

即,單體1、單體2、單體3的蒸汽可以先後分別通入,也可以同時通入,或者先通入任兩種單體,再通入第三種單體,由於單體2是氣體,其也可以直接通入反應腔體中。That is, the steam of monomer 1, monomer 2, and monomer 3 can be introduced separately, or simultaneously, or any two types of monomers, and then the third type of monomer, because monomer 2 It is a gas, which can also pass directly into the reaction chamber.

優選地,所述單體蒸汽至少包括單體1;單體1占所述單體蒸汽的總通入量的摩爾百分數不低於20%。當通入的單體蒸汽中包含單體1時,單體1占單體蒸汽的總通入量摩爾百分數不低於20%,單體2、單體3可以不通入。Preferably, the monomer vapor includes at least monomer 1; the mole percentage of monomer 1 in the total flux of the monomer vapor is not less than 20%. When the monomer vapor introduced contains monomer 1, monomer 1 accounts for not less than 20% of the total monomer vapor flux, and monomer 2 and monomer 3 may not be introduced.

優選地,等離子體室反應腔體的容積為50-1000L。Preferably, the volume of the reaction chamber of the plasma chamber is 50-1000L.

優選地,步驟(2)中,等離子體室反應腔室的溫度控制在30-60℃;等離子體源氣體的流量為5-300sccm。Preferably, in step (2), the temperature of the reaction chamber of the plasma chamber is controlled at 30-60°C; the flow rate of the plasma source gas is 5-300 sccm.

優選地,步驟(3)中,單體蒸汽在0.1-1000毫托引入反應腔體,所述通入單體蒸汽的流量為10-1000µL/min;Preferably, in step (3), the monomer vapor is introduced into the reaction chamber at 0.1-1000 mTorr, and the flow rate of the monomer vapor is 10-1000 µL/min;

優選地,所述步驟(2)中,在通入所述等離子體源氣體後以及在所述沉積用等離子體放電之前,還包括對基材進行預處理用等離子體放電工序。Preferably, in the step (2), after passing the plasma source gas and before the plasma discharge for deposition, a plasma discharge step for pretreatment of the substrate is further included.

步驟(2)中,通入所述等離子體源氣體後對基材進行等離子體放電預處理。預處理階段結束後進入沉積階段(預處理用等離子體放電轉換為沉積用等離子體放電),此時等離子體放電方式或參數可以改變也可以不改變。In step (2), after the plasma source gas is introduced, the substrate is subjected to plasma discharge pretreatment. After the pretreatment phase ends, it enters the deposition phase (the plasma discharge for pretreatment is converted to plasma discharge for deposition). At this time, the plasma discharge method or parameters may or may not be changed.

優選地,所述等離子體放電(預處理用等離子體放電和/或沉積用等離子體放電)方式為射頻放電、微波放電、中頻放電、潘寧放電或電火花放電。Preferably, the plasma discharge (plasma discharge for pretreatment and/or plasma discharge for deposition) is radio frequency discharge, microwave discharge, intermediate frequency discharge, Penning discharge or electric spark discharge.

優選地,所述等離子體放電(預處理用等離子體放電和/或沉積用等離子體放電)為電火花放電;等離子體放電頻率為20Hz-20KHz,脈寬為5μs-50ms,放電時間為100s-20000s。Preferably, the plasma discharge (pretreatment plasma discharge and/or deposition plasma discharge) is electric spark discharge; plasma discharge frequency is 20Hz-20KHz, pulse width is 5μs-50ms, and discharge time is 100s- 20000s.

相比于現有技術,本發明結合不同單體的性能,對塗層的結構進行了構造。使用主鏈含有多個醚氧健的單體,醚氧健一般與基材的結合力較強,提高了塗層的附著力;利用含氟烯烴單體聚合物的抗紫外特性,提高了塗層抗紫外老化的能力;利用具有氟烷基單體形成的強疏水塗層,使複合塗層的防水性能大大提高。而且,採用本申請的方法製備的塗層,各種性能之間沒有顧此失彼,獲得了兼顧多項性能優良的技術效果。Compared with the prior art, the present invention combines the performance of different monomers to construct the structure of the coating. The use of monomers with multiple ether oxygen in the main chain, which generally has a strong binding force with the substrate, improves the adhesion of the coating; the use of fluorine-containing olefin monomer polymer anti-UV properties, improve the coating The ability of the layer to resist ultraviolet aging; the use of a strong hydrophobic coating formed with fluoroalkyl monomers greatly improves the waterproof performance of the composite coating. Moreover, the coating prepared by the method of the present application does not compromise on various properties, and obtains a technical effect that takes into account multiple excellent properties.

實施例Examples 11

本發明中高粘附性耐老化納米塗層的製備方法中,經過如下步驟:In the preparation method of the high-adhesion and anti-aging nano-coating of the invention, the following steps are performed:

(1)將電子器件的PCB板放置於1000L等離子體真空反應腔體內,對反應腔體連續抽真空使真空度達到30毫托。(1) Place the PCB board of the electronic device in the 1000L plasma vacuum reaction chamber, and continuously evacuate the reaction chamber to achieve a vacuum of 30 mTorr.

(2)通入氮氣,流量為20sccm,開啟電火花等離子體放電對PCB板進行預處理(即開啟電火花式的預處理用等離子體放電),預處理階段放電頻率在500Hz,脈寬200 μs,放電時間為100s。(2) Inject nitrogen gas with a flow rate of 20 sccm. Turn on the EDM plasma discharge to pretreat the PCB board (that is, turn on the EDM type pretreatment plasma discharge). The discharge frequency in the pretreatment stage is 500 Hz and the pulse width is 200 μs. , The discharge time is 100s.

(3)先通入單體3a,結束後,再通入單體2a,最後通入單體1a,在基材表面進行化學氣相沉積製備納米塗層。塗層製備過程中三種單體流量均為150μL/min,通入時間分別為500s、200s和300s,預處理用等離子體放電轉換為沉積用等離子體放電,該沉積階段電火花放電時間為1000s。(3) The monomer 3a is introduced first, and then the monomer 2a is introduced, and finally the monomer 1a is introduced, and chemical vapor deposition is performed on the surface of the substrate to prepare a nano-coating. The flow rate of the three monomers in the coating preparation process is 150 μL/min, the inflow time is 500 s, 200 s and 300 s, respectively. The plasma discharge for pretreatment is converted to the plasma discharge for deposition, and the discharge time for the electrical discharge in this deposition stage is 1000 s.

(4)塗層製備結束後,通入壓縮空氣,使反應腔體恢復至常壓,打開腔體,取出電子器件的PCB板。

Figure 108137928-A0304-0004
(4) After the coating preparation is completed, the compressed air is introduced to restore the reaction chamber to normal pressure, the chamber is opened, and the PCB of the electronic device is taken out.
Figure 108137928-A0304-0004

單體1a

Figure 108137928-A0304-0005
Monomer 1a
Figure 108137928-A0304-0005

單體2a

Figure 108137928-A0304-0006
Monomer 2a
Figure 108137928-A0304-0006

單體3aMonomer 3a

其中,預處理用等離子體放電的裝置和沉積用等離子體放電的裝置可以是一套,也可以為兩套獨立裝置。預處理用等離子體放電裝置(例如電極)優選地設置在反應腔體內,且圍繞基材設置,從而便於預處理後快速與塗層工藝銜接;沉積用等離子體放電裝置可以佈設在反應腔體之外且遠離反應腔體設置,從而可選擇地或盡可能地避免塗層過程中等離子體放電對基材的消極影響。Among them, the device for plasma discharge for pretreatment and the device for plasma discharge for deposition may be one set or two separate devices. The plasma discharge device (for example, electrode) for pretreatment is preferably arranged in the reaction chamber and around the base material, so as to facilitate the quick connection with the coating process after pretreatment; the plasma discharge device for deposition can be arranged in the reaction chamber It is installed outside and away from the reaction chamber, so as to avoid the negative influence of the plasma discharge on the substrate during the coating process selectively or as far as possible.

實施例Examples 22

本發明中高粘附性耐老化納米塗層的製備方法中,經過如下步驟:In the preparation method of the high-adhesion and anti-aging nano-coating of the invention, the following steps are performed:

(1)將汽車後視鏡片放置於200L等離子體真空反應腔體內,對反應腔體連續抽真空使真空度達到5毫托。(1) Place the rear-view lens of the car in the 200L plasma vacuum reaction chamber, and continuously evacuate the reaction chamber to achieve a vacuum of 5 mTorr.

(2)通入氬氣,流量為50sccm,開啟電火花等離子體放電進行預處理(即開啟電火花方式的預處理用等離子體放電),預處理階段放電頻率在1000Hz,脈寬20 μs,放電時間為100s。(2) Introduce argon gas with a flow rate of 50 sccm, and start the spark plasma discharge for pretreatment (that is, start the spark discharge pretreatment plasma discharge), the discharge frequency in the pretreatment stage is 1000 Hz, the pulse width is 20 μs, and the discharge The time is 100s.

(3)先通入單體3b,結束後,再通入單體2b,最後通入單體1a,在基材表面進行化學氣相沉積製備納米塗層,。塗層製備過程中三種單體流量均為150μL/min,通入時間分別為500s、500s和500s,預處理用等離子體放電轉換為沉積用等離子體放電,該沉積階段放電時間為1500s。(3) The monomer 3b is introduced first, then the monomer 2b is introduced, and finally the monomer 1a is introduced, and chemical vapor deposition is performed on the surface of the substrate to prepare a nano-coating. The flow rate of the three monomers in the coating preparation process is 150 μL/min, the lead-in time is 500 s, 500 s, and 500 s, respectively. The plasma discharge for pretreatment is converted to the plasma discharge for deposition, and the discharge time in this deposition stage is 1500 s.

(4)塗層製備結束後,通入壓縮空氣,使反應腔體恢復至常壓,打開腔體,取出汽車後視鏡片。

Figure 108137928-A0304-0007
(4) After the preparation of the coating is completed, compressed air is introduced to restore the reaction chamber to normal pressure, the chamber is opened, and the rear view lens of the automobile is taken out.
Figure 108137928-A0304-0007

單體1b

Figure 02_image015
Monomer 1b
Figure 02_image015

單體2b

Figure 108137928-A0304-0008
Monomer 2b
Figure 108137928-A0304-0008

單體3bMonomer 3b

實施例Examples 33

本發明中高粘附性耐老化納米塗層的製備方法中,經過如下步驟:In the preparation method of the high-adhesion and anti-aging nano-coating of the invention, the following steps are performed:

(1)將鎂合金放置於2000L等離子體真空反應腔體內,對反應腔體連續抽真空使真空度達到100毫托。(1) Place the magnesium alloy in the 2000L plasma vacuum reaction chamber, and continuously evacuate the reaction chamber to achieve a vacuum of 100 mtorr.

(2)通入氬氣,流量為10sccm,開啟電火花等離子體放電進行預處理(即開啟電火花式的預處理用等離子體放電),預處理階段放電頻率在50kHz,脈寬50 μs,放電時間為100s。(2) Introduce argon gas with a flow rate of 10 sccm, and start EDM plasma discharge for pretreatment (that is, start EDM-type plasma discharge for pretreatment). The discharge frequency in the pretreatment phase is 50 kHz, the pulse width is 50 μs, and the discharge The time is 100s.

(3)先通入單體3c,結束後,再同時通入單體2c和單體1c,在基材表面進行化學氣相沉積製備納米塗層。塗層製備過程中三種單體流量均為200μL/min,通入時間分別為1500s、2500s(2c和1c),預處理用等離子體放電調整為沉積用等離子體放電。該沉積階段放電時間為4000s。(3) The monomer 3c is introduced first, and then the monomer 2c and the monomer 1c are simultaneously introduced, and chemical vapor deposition is performed on the surface of the substrate to prepare a nano-coating. The flow rate of the three monomers in the coating preparation process is 200 μL/min, the lead-in time is 1500s and 2500s (2c and 1c), respectively, and the plasma discharge for pretreatment is adjusted to the plasma discharge for deposition. The discharge time of this deposition stage is 4000s.

(4)塗層製備結束後,通入壓縮空氣,使反應腔體恢復至常壓,打開腔體,取出鎂合金。

Figure 108137928-A0304-0009
(4) After the preparation of the coating is completed, compressed air is introduced to restore the reaction chamber to normal pressure, the chamber is opened, and the magnesium alloy is taken out.
Figure 108137928-A0304-0009

單體1cMonomer 1c

Figure 02_image021
單體2c
Figure 02_image023
Figure 02_image021
Monomer 2c
Figure 02_image023

單體3cMonomer 3c

實施例Examples 44

本發明中高粘附性耐老化納米塗層的製備方法中,經過如下步驟:In the preparation method of the high-adhesion and anti-aging nano-coating of the present invention, the following steps are performed:

(1)將汽車後視鏡片放置於1800L等離子體真空反應腔體內,對反應腔體連續抽真空使真空度達到50毫托。(1) Place the rear-view lens of the car in the 1800L plasma vacuum reaction chamber, and continuously evacuate the reaction chamber to achieve a vacuum of 50 mtorr.

(2)通入氬氣,流量為40sccm,開啟電火花等離子體放電進行預處理(即開啟電火花式的預處理用等離子體放電),預處理階段放電頻率在2000Hz,脈寬80 μs,放電時間為200s。(2) Introduce argon gas with a flow rate of 40 sccm. Turn on the EDM plasma discharge for pretreatment (that is, turn on the EDM type pretreatment plasma discharge). The discharge frequency in the pretreatment stage is 2000 Hz, the pulse width is 80 μs, and the discharge The time is 200s.

(3)先通入單體3d,結束後,再通入單體2d,最後通入單體1d,在基材表面進行化學氣相沉積製備納米塗層。塗層製備過程中三種單體流量均為200μL/min,通入時間分別為500s、500s和800s,預處理用等離子體放電調整為沉積用等離子體放電。沉積階段放電時間為1800s。(3) The monomer 3d is introduced first, then the monomer 2d is introduced, and the monomer 1d is finally introduced, and chemical vapor deposition is performed on the surface of the substrate to prepare a nano-coating. The flow rate of the three monomers in the preparation process of the coating is 200 μL/min, the passing time is 500 s, 500 s and 800 s, respectively. The plasma discharge for pretreatment is adjusted to the plasma discharge for deposition. The discharge time in the deposition stage is 1800s.

(4)塗層製備結束後,通入壓縮空氣,使反應腔體恢復至常壓,打開腔體,取出汽車後視鏡片。

Figure 108137928-A0304-0010
(4) After the preparation of the coating is completed, compressed air is introduced to restore the reaction chamber to normal pressure, the chamber is opened, and the rear view lens of the automobile is taken out.
Figure 108137928-A0304-0010

單體1d

Figure 108137928-A0304-0011
Monomer 1d
Figure 108137928-A0304-0011

單體2d

Figure 108137928-A0304-0012
Monolithic 2d
Figure 108137928-A0304-0012

單體3dMonolithic 3d

實施例Examples 55

本發明中高粘附性耐老化納米塗層的製備方法中,經過如下步驟:In the preparation method of the high-adhesion and anti-aging nano-coating of the present invention, the following steps are performed:

(1)將保溫杯放置於3500L等離子體真空反應腔體內,對反應腔體連續抽真空使真空度達到200毫托。(1) Place the heat preservation cup in the 3500L plasma vacuum reaction chamber, and continuously evacuate the reaction chamber to achieve a vacuum of 200 mtorr.

(2)通入氬氣,流量為10sccm,開啟電火花等離子體放電進行預處理(即開啟電火花式的預處理用等離子體放電),預處理階段放電頻率在50kHz,脈寬80 μs,放電時間為200s。(2) Introduce argon gas with a flow rate of 10 sccm, and start EDM plasma discharge for pretreatment (that is, start EDM-type plasma discharge for pretreatment), the discharge frequency in the pretreatment stage is 50 kHz, the pulse width is 80 μs, and the discharge The time is 200s.

(3)先通入單體3e,結束後,再同時通入單體2e和單體1e,在基材表面進行化學氣相沉積製備納米塗層。塗層製備過程中三種單體流量均為250μL/min,通入時間分別為2500s、2500s,預處理用等離子體放電調整為沉積用等離子體放電。沉積階段放電時間為5000s。(3) The monomer 3e is introduced first, and then the monomer 2e and the monomer 1e are simultaneously introduced, and chemical vapor deposition is performed on the surface of the substrate to prepare a nano-coating. The flow rate of the three monomers during the preparation of the coating is 250 μL/min, the lead-in time is 2500 s and 2500 s, respectively. The plasma discharge for pretreatment is adjusted to the plasma discharge for deposition. The discharge time in the deposition stage is 5000s.

(4)塗層製備結束後,通入壓縮空氣,使反應腔體恢復至常壓,打開腔體,取出保溫杯。

Figure 108137928-A0304-0013
(4) After the preparation of the coating is completed, compressed air is introduced to restore the reaction chamber to normal pressure, the chamber is opened, and the insulated cup is taken out.
Figure 108137928-A0304-0013

單體1e

Figure 02_image033
Monomer 1e
Figure 02_image033

單體2eMonomer 2e

Figure 02_image035
單體3e
Figure 02_image035
Monomer 3e

實施例Examples 66

與實施例1相比,將步驟(3)三種單體流量均更換為200 μL/min,其他條件不變。Compared with Example 1, the flow rate of the three monomers in step (3) was changed to 200 μL/min, and other conditions were unchanged.

實施例Examples 77

與實施例1相比,將步驟(3)中,三種單體通入時間分別更換為1000s、800s、900s,放電時間相應的更換為2700s,其他條件不變。Compared with Example 1, in step (3), the three monomers are replaced with 1000s, 800s, and 900s, and the discharge time is correspondingly replaced with 2700s, and other conditions remain unchanged.

實施例Examples 88

與實施例7相比,將步驟(1)中反應腔體連續抽真空使真空度達到10毫托,其他條件不變。Compared with Example 7, the reaction chamber in step (1) was continuously evacuated to a vacuum of 10 mTorr, and other conditions remained unchanged.

實施例Examples 99

與實施例7相比,將步驟(2)中電火花等離子體放電頻率更換為1000Hz,其他條件不變。Compared with Example 7, the discharge frequency of the spark plasma in step (2) was changed to 1000 Hz, and other conditions remained unchanged.

實施例Examples 1010

與實施例7相比,在步驟(3)中,不通入單體1a,其他條件不變。Compared with Example 7, in step (3), monomer 1a is not passed, and other conditions remain unchanged.

實施例Examples 1111

與實施例7相比,在步驟(3)中,不通入單體2a、3a,單體1a通入時間為2700s,放電時間也為2700s,其他條件不變。Compared with Example 7, in the step (3), the monomers 2a and 3a are not introduced, the monomer 1a introduction time is 2700s, the discharge time is also 2700s, and other conditions remain unchanged.

實施例Examples 1212

與實施例7相比,在步驟(3)中,不通入單體1a、3a,單體2a通入時間為2700s,放電時間也為2700s,其他條件不變。Compared with Example 7, in the step (3), the monomers 1a and 3a are not fed, the monomer 2a is introduced for 2700s, the discharge time is also 2700s, and other conditions remain unchanged.

實施例Examples 1313

與實施例7相比,在步驟(3)中,不通入單體1a、2a,單體3a通入時間為2700s,放電時間也為2700s,其他條件不變。Compared with Example 7, in the step (3), the monomers 1a and 2a are not introduced, the monomer 3a introduction time is 2700s, the discharge time is also 2700s, and other conditions remain unchanged.

實施例Examples 1414

與實施例3相比,在步驟 (3)中,不通入單體3c,單體2c、1c同時通入時間為4000s,放電時間也為4000s,其他條件不變。Compared with Example 3, in step (3), the monomer 3c is not fed, and the monomer 2c and 1c are simultaneously fed for 4000s, and the discharge time is also 4000s, and other conditions remain unchanged.

上述各實施例施鍍後的基材,進行塗層厚度、水接觸角、氙燈老化試驗、紫外老化試驗、附著力測試。The substrate after plating in the above embodiments is subjected to coating thickness, water contact angle, xenon lamp aging test, ultraviolet aging test, and adhesion test.

納米塗層厚度,使用美國Filmetrics F20-UV-薄膜厚度測量儀進行檢測。The thickness of the nano-coating is tested using the US Filmetrics F20-UV-film thickness measuring instrument.

納米塗層水接觸角,根據GB/T 30447-2013標準進行測試。Nano-coating water contact angle, tested according to GB/T 30447-2013 standard.

氙燈老化試驗,根據GB/T 16422.2-2014標準進行測試。Xenon lamp aging test is tested according to GB/T 16422.2-2014 standard.

紫外老化試驗,根據GB/T 16422.3-2014標準進行測試。The UV aging test is tested according to the GB/T 16422.3-2014 standard.

附著力測試方法,根據GB/T 9286-1998標準進行百格刀劃格試驗。Adhesion test method, according to GB/T 9286-1998 standard for 100 grid knife scratch test.

表1

Figure 108137928-A0304-0014
Table 1
Figure 108137928-A0304-0014

採用本發明的技術,可獲得具有多重防護性能的納米塗層。常規技術手段為了獲得多重功能塗層,主要通過將不同功能的塗層進行疊加,使厚度達幾十上百微米以上,這往往會導致一些電子器件的信號傳輸、導電性、導熱性變得很差。與此相比,納米塗層由於其厚度處於納米尺度,對上述性能幾乎不產生任何影響。利用等離子體將不同功能的塗層材料同時沉積,解決了塗層之間的粘附性差的缺點。With the technology of the present invention, a nano-coating with multiple protective properties can be obtained. In order to obtain multi-functional coatings by conventional technical means, the coatings with different functions are mainly superimposed to make the thickness more than tens of hundreds of microns, which often leads to the signal transmission, electrical conductivity and thermal conductivity of some electronic devices becoming very difference. In contrast, nano-coatings have almost no effect on the above properties due to their thickness at the nanoscale. Using plasma to deposit coating materials with different functions at the same time solves the disadvantage of poor adhesion between coatings.

最後應說明的是:以上各實施例僅用以說明本發明的技術方案,而非對其限制;儘管參照前述各實施例對本發明進行了詳細的說明,本領域的普通技術人員應當理解:其依然可以對前述各實施例所記載的技術方案進行修改,或者對其中部分或者全部技術特徵進行等同替換;而這些修改或者替換,並不使相應技術方案的本質脫離本發明各實施例技術方案的範圍。Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the present invention, rather than limiting it; although the present invention has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that: The technical solutions described in the foregoing embodiments can still be modified, or some or all of the technical features can be equivalently replaced; and these modifications or replacements do not deviate from the essence of the corresponding technical solutions of the technical solutions of the embodiments of the present invention. range.

no

no

Claims (14)

一種高粘附性耐老化納米塗層,將基材暴露於單體蒸汽氛圍中,通過等離子體放電在基材表面發生化學反應形成保護塗層; 所述單體蒸汽為汽化的單體1、和/或單體2、和/或單體3; 所述單體1具有式(I)所示結構:
Figure 108137928-A0304-0015
(I) 所述單體2具有式(II)所示結構:
Figure 108137928-A0304-0016
(II) 所述單體3具有式(III)所示的結構:
Figure 108137928-A0304-0017
(III) 其中,R1 、R2 、R3 、R4 、R5 、R6 、R7 、R8 、R9 、R10 、R11 、R12 、R13 獨立地選自氫、烷基、芳基、鹵素、鹵代烷基或鹵代芳基; m為0-5的整數,n為1-20的整數,j、k分別為0-10的整數且不能同時為0; R14 是鍵、-CO-、-COO-、芳亞基、脂環烷亞基或羥基取代的脂肪烷基亞基。
A high-adhesion aging-resistant nano-coating, which exposes the substrate to the atmosphere of monomer vapor and forms a protective coating by plasma discharge on the surface of the substrate; the monomer vapor is vaporized monomer 1. And/or monomer 2, and/or monomer 3; the monomer 1 has the structure represented by formula (I):
Figure 108137928-A0304-0015
(I) The monomer 2 has the structure represented by formula (II):
Figure 108137928-A0304-0016
(II) The monomer 3 has a structure represented by formula (III):
Figure 108137928-A0304-0017
(III) where R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , R 13 are independently selected from hydrogen, alkyl Radical, aryl, halogen, haloalkyl or haloaryl; m is an integer of 0-5, n is an integer of 1-20, j and k are integers of 0-10 and cannot be 0 at the same time; R 14 is A bond, -CO-, -COO-, arylene, alicyclic alkylene or hydroxy substituted fatty alkyl subunit.
根據申請專利範圍第1項所述的納米塗層,其特徵在於,R1 、R2 、R3 、R4 、R5 、R6 、R7 、R8 、R9 、R10 、R11 、R12 、R13 獨立地選自氫、甲基或氟。The nano-coating according to item 1 of the patent application scope, characterized in that R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 , R 12 and R 13 are independently selected from hydrogen, methyl or fluorine. 根據申請專利範圍第1項所述的納米塗層,其特徵在於,m為0-2的整數,n為1-8的整數,j、k分別為1-4的整數。The nanocoating according to item 1 of the patent application range, wherein m is an integer of 0-2, n is an integer of 1-8, and j and k are integers of 1-4, respectively. 根據申請專利範圍第1項所述的一種納米塗層製備方法,其特徵在於,所述R14 是鍵、脂環烷亞基或羥基取代的脂肪烷基亞基。A method for preparing a nano-coating according to item 1 of the patent application range, wherein R 14 is a bond, an alicyclic alkylene subunit, or a hydroxy substituted fatty alkyl subunit. 根據申請專利範圍第1項所述的納米塗層製備方法,其特徵在於,所述單體1在常溫常壓下是一種液體和/或單體3在常溫常壓下是一種液體,和/或單體2在常溫常壓下是一種氣體。The method for preparing a nano-coating according to item 1 of the patent application range, wherein the monomer 1 is a liquid at normal temperature and pressure and/or the monomer 3 is a liquid at normal temperature and pressure, and/or Or monomer 2 is a gas at normal temperature and pressure. 根據申請專利範圍第1項所述的納米塗層,其特徵在於,所述基材為金屬、光學儀器、衣服織物、電子器件或醫療器械。The nanocoating according to item 1 of the patent application range, wherein the substrate is metal, optical instruments, clothing fabrics, electronic devices, or medical devices. 一種申請專利範圍1項至第6項中任一項所述高粘附性耐老化納米塗層的製備方法,其特徵在於,其包括以下步驟: (1)將基材置於等離子體室的反應腔體內,反應腔體內真空度為0.1-1000毫托; (2)通入等離子體源氣體,開啟沉積用等離子體放電,將單體蒸汽通入反應腔體內,進行化學氣相沉積; (3)關閉沉積用等離子體放電,通入潔淨的壓縮空氣或者惰性氣體,恢復至常壓,打開反應腔體,取出基材。A method for preparing a high-adhesion and aging-resistant nano-coating according to any one of patent application items 1 to 6, characterized in that it includes the following steps: (1) Place the substrate in the reaction chamber of the plasma chamber, the vacuum degree in the reaction chamber is 0.1-1000 mTorr; (2) Inject the plasma source gas, start the plasma discharge for deposition, and pass the monomer vapor into the reaction chamber for chemical vapor deposition; (3) Turn off the plasma discharge for deposition, pass clean compressed air or inert gas, return to normal pressure, open the reaction chamber, and take out the substrate. 根據申請專利範圍第7項所述的納米塗層的製備方法,其特徵在於,所述單體蒸汽包括單體1、單體2和單體3; 所述單體1、單體2和單體3的蒸汽分別先後通入反應腔體; 或者,所述單體1、單體2和單體3的蒸汽同時通入反應腔體; 或者,先將所述單體1、單體2和單體3中的任意兩種同時通入反應腔體,再所述單體1、單體2和單體3中第三種單體通入反應腔體。The method for preparing a nano-coating according to item 7 of the patent application range, wherein the monomer vapor includes monomer 1, monomer 2 and monomer 3; The steam of the monomer 1, the monomer 2 and the monomer 3 respectively pass into the reaction chamber successively; Or, the steam of the monomer 1, the monomer 2 and the monomer 3 are simultaneously passed into the reaction chamber; Alternatively, firstly, any two of the monomer 1, the monomer 2 and the monomer 3 are simultaneously passed into the reaction chamber, and then the third monomer of the monomer 1, the monomer 2 and the monomer 3 are passed Into the reaction chamber. 根據申請專利範圍第7項或第8項所述的納米塗層的製備方法,其特徵在於,所述單體蒸汽至少包括單體1;單體1占所述單體蒸汽的總通入量的摩爾百分數不低於20%。The method for preparing a nano-coating according to item 7 or 8 of the patent application range, wherein the monomer vapor includes at least monomer 1; monomer 1 accounts for the total flux of the monomer vapor The mole percentage is not less than 20%. 根據申請專利範圍第7項所述的納米塗的層製備方法,其特徵在於,步驟(2)中,等離子體室反應腔體的溫度控制在30-60℃; 通入反應腔體的等離子體源氣體的流量為5-300sccm。The method for preparing a nano-coated layer according to item 7 of the patent application range, characterized in that, in step (2), the temperature of the reaction chamber of the plasma chamber is controlled at 30-60°C; The flow rate of the plasma source gas passed into the reaction chamber is 5-300 sccm. 根據申請專利範圍第7項所述的納米塗層的製備方法,其特徵在於,所述單體蒸汽包括單體1和/或單體3; 步驟(3)中,利用加料泵將單體1和/或單體3霧化和揮發後通入所述反應腔體; 所述單體蒸汽在0.1-1000毫托壓力下引入反應腔體; 所述單體蒸汽通入反應腔體時的流量為10-1000µL/min。The method for preparing a nano-coating according to item 7 of the patent application range, wherein the monomer vapor includes monomer 1 and/or monomer 3; In step (3), the feed pump is used to atomize and volatilize monomer 1 and/or monomer 3 into the reaction chamber; The monomer vapor is introduced into the reaction chamber at a pressure of 0.1-1000 mTorr; The flow rate of the monomer vapor into the reaction chamber is 10-1000 µL/min. 根據申請專利範圍第7項所述的納米塗層的製備方法,其特徵在於,在通入所述等離子體源氣體後以及在所述沉積用等離子體放電之前,還包括對基材進行預處理用等離子體放電工序。The method for preparing a nano-coating according to item 7 of the patent application range, characterized in that, after passing the plasma source gas and before the plasma discharge for deposition, a pretreatment of the substrate is also included Using plasma discharge process. 根據申請專利範圍第7項或第12項所述的納米塗層的製備方法,其特徵在於,所述等離子體放電方式為射頻放電、微波放電、中頻放電、潘寧放電或電火花放電。The method for preparing a nano-coating according to item 7 or item 12 of the patent application range, wherein the plasma discharge method is radio frequency discharge, microwave discharge, intermediate frequency discharge, penning discharge or electric spark discharge. 根據申請專利範圍第7項或第12項所述的納米塗層的製備方法,所述等離子體放電為電火花放電;等離子體放電頻率為20Hz-20KHz,脈寬為5μs-50ms,放電時間為100s-20000s。According to the method for preparing a nano-coating described in Item 7 or Item 12 of the patent application range, the plasma discharge is an electric spark discharge; the plasma discharge frequency is 20 Hz-20 KHz, the pulse width is 5 μs-50 ms, and the discharge time is 100s-20000s.
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