TW202012547A - Compound and manufacturing method thereof - Google Patents
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- 0 *c1c(*)[n](*I)c(C(C(*2CC2)*2c3c(*)c(*)c(*)[n]3*)C2O)c1* Chemical compound *c1c(*)[n](*I)c(C(C(*2CC2)*2c3c(*)c(*)c(*)[n]3*)C2O)c1* 0.000 description 10
- ICKWVYUBYLYGGN-UHFFFAOYSA-N Cc1c(C(C(C2c3c(C)c(Br)c(C)[nH]3)O)C2O)[nH]c(C)c1Br Chemical compound Cc1c(C(C(C2c3c(C)c(Br)c(C)[nH]3)O)C2O)[nH]c(C)c1Br ICKWVYUBYLYGGN-UHFFFAOYSA-N 0.000 description 1
- PKRRNTJIHGOMRC-UHFFFAOYSA-N OB(c1cc2ccccc2[o]1)O Chemical compound OB(c1cc2ccccc2[o]1)O PKRRNTJIHGOMRC-UHFFFAOYSA-N 0.000 description 1
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- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/32—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/33—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms with substituted hydrocarbon radicals, directly attached to ring carbon atoms
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Abstract
Description
本發明係關於新穎化合物及其製造方法。 The present invention relates to novel compounds and methods for making them.
液晶顯示裝置或有機電致發光(有機EL)顯示裝置等顯示裝置,正在進行色調的調整及提升色純度。專利文獻1中記載,在可有效地濾除從電漿顯示器所發射之氖光(neon light)的電漿顯示器面板用濾光片中,係使用方酸菁(squarylium)系化合物。 Display devices such as liquid crystal display devices or organic electroluminescence (organic EL) display devices are undergoing color tone adjustment and improving color purity.
[專利文獻1]日本特開2001-183522號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2001-183522
本發明之目的在於提供-種對於顯示裝置等的光學濾光片有用的新穎化合物及其製造方法。 An object of the present invention is to provide a novel compound useful for an optical filter of a display device and the like and a method for manufacturing the same.
本發明提供以下所示的化合物及其製造方法。 The present invention provides the compounds shown below and their production methods.
[1]一種式(I)所示之化合物。 [1] A compound represented by formula (I).
T1及T2分別獨立地表示氫原子或可具有取代基之碳數1至6的1價烴基。 T 1 and T 2 each independently represent a hydrogen atom or a
Y1及Y2之任一者表示可具有取代基之1價芳香族基,另一者表示可具有取代基之1價芳香族基、氫原子、鹵素原子或可具有取代基之碳數1至6的1價烴基(該烴基為1價芳香族基以外之基,該烴基所包含的-CH2-可取代為-O-或-CO-)]。 Either Y 1 or Y 2 represents a monovalent aromatic group that may have a substituent, and the other represents a monovalent aromatic group that may have a substituent, a hydrogen atom, a halogen atom, or a carbon number that may have a substituent 1 A monovalent hydrocarbon group up to 6 (the hydrocarbon group is a group other than a monovalent aromatic group, and -CH 2 -contained in the hydrocarbon group may be substituted with -O- or -CO-)].
[2]一種式(II)所示之化合物。 [2] A compound represented by formula (II).
R1至R4分別獨立地表示氫原子或可具有取代基之碳數1至6的1價烴基。 R 1 to R 4 each independently represent a hydrogen atom or a
T1及T2分別獨立地表示氫原子或可具有取代基之碳數1至6的1價烴基。 T 1 and T 2 each independently represent a hydrogen atom or a
X1及X2之任一者表示選自群組A的任一基,另一者表示選自群組A的任一基、氫原子或可具有取代基之碳數1至6的1價烴基(該烴基為1價芳香族基以外之基,該烴基所包含的-CH2-可取代為-O-或-CO-)。 Either X 1 or X 2 represents any group selected from Group A, and the other represents any group selected from Group A, a hydrogen atom, or a monovalent carbon number of 1 to 6 which may have a substituent Hydrocarbon group (the hydrocarbon group is a group other than a monovalent aromatic group, and -CH 2 -contained in the hydrocarbon group may be substituted with -O- or -CO-).
群組A:鹵素原子、硼酸酯基及-B(OH)2所構成之群組。] Group A: a group consisting of halogen atoms, borate groups and -B(OH) 2 . ]
[3]一種式(Ia)所示化合物之製造方法,其包含 [3] A method for producing a compound represented by formula (Ia), which comprises
在鎳催化劑或鈀催化劑的存在下使式(IIa)所示之化合物、式(III-1a)所示之化合物與式(III-2a)所示之化合物反應的步驟。 The step of reacting the compound represented by formula (IIa), the compound represented by formula (III-1a) and the compound represented by formula (III-2a) in the presence of a nickel catalyst or a palladium catalyst.
R1至R4分別獨立地表示氫原子或可具有取代基之碳數1至6的1價烴基。 R 1 to R 4 each independently represent a hydrogen atom or a
T1及T2分別獨立地表示氫原子或可具有取代基之碳數1至6的1價烴基。 T 1 and T 2 each independently represent a hydrogen atom or a
Y1a及Y2a分別獨立地表示可具有取代基之1價芳香族基。] Y 1a and Y 2a each independently represent a monovalent aromatic group which may have a substituent. ]
R1至R4表示與前述相同的意義。 R 1 to R 4 have the same meaning as described above.
T1及T2表示與前述相同的意義。 T 1 and T 2 have the same meaning as described above.
X1a及X2a分別獨立地表示選自群組A的任一基。 X 1a and X 2a each independently represent any group selected from Group A.
群組A:鹵素原子、硼酸酯基及-B(OH)2所構成之群組。] Group A: a group consisting of halogen atoms, borate groups and -B(OH) 2 . ]
Y1a-Z1 (III-1a) Y 1a -Z 1 (III-1a)
Y2a-Z2 (III-2a)[式(III-1a)及式(III-2a)中, Y 2a -Z 2 (III-2a) [In formula (III-1a) and formula (III-2a),
Y1a及Y2a表示與前述相同的意義。 Y 1a and Y 2a have the same meaning as described above.
Z1及Z2分別獨立地表示鹵素原子、硼酸酯基、-B(OH)2、烷基磺酸酯基或芳基磺酸酯基。] Z 1 and Z 2 each independently represent a halogen atom, a borate group, -B(OH) 2 , an alkylsulfonate group or an arylsulfonate group. ]
[4]一種式(Ib)所示化合物之製造方法,其包含 [4] A method for producing a compound represented by formula (Ib), which comprises
在鎳催化劑或鈀催化劑的存在下使式(IIb)所示之化合物與式(III-1b)所示之化合物反應的步驟。 The step of reacting the compound represented by formula (IIb) with the compound represented by formula (III-1b) in the presence of a nickel catalyst or a palladium catalyst.
R1至R4分別獨立地表示氫原子或可具有取代基之碳數1至6的1價烴基。 R 1 to R 4 each independently represent a hydrogen atom or a
T1及T2分別獨立地表示氫原子或可具有取代基之碳數1至6的1價烴基。 T 1 and T 2 each independently represent a hydrogen atom or a
Y1b表示可具有取代基之1價芳香族基。 Y 1b represents a monovalent aromatic group which may have a substituent.
X2b表示氫原子或可具有取代基之碳數1至6的1價烴基(該烴基為1價芳香族基以外之基,該烴基所包含的-CH2-可取代為-O-或-CO-)。] X 2b represents a hydrogen atom or a C1-C6 monovalent hydrocarbon group which may have a substituent (the hydrocarbon group is a group other than a monovalent aromatic group, and -CH 2 -contained in the hydrocarbon group may be substituted to -O- or- CO-). ]
R1至R4表示與前述相同的意義。 R 1 to R 4 have the same meaning as described above.
T1及T2表示與前述相同的意義。 T 1 and T 2 have the same meaning as described above.
X1b表示選自群組A的任一基。 X 1b represents any group selected from group A.
群組A:鹵素原子、硼酸酯基及-B(OH)2所構成之群組。 Group A: a group consisting of halogen atoms, borate groups and -B(OH) 2 .
X2b表示與前述相同的意義。] X 2b has the same meaning as described above. ]
Y1b-Z1 (III-1b)[式中, Y 1b -Z 1 (III-1b) [where,
Y1b表示與前述相同的意義。 Y 1b has the same meaning as described above.
Z1表示鹵素原子、硼酸酯基、-B(OH)2、烷基磺酸酯基或芳基磺酸酯基。] Z 1 represents a halogen atom, a borate group, -B(OH) 2 , an alkylsulfonate group or an arylsulfonate group. ]
本發明之化合物可適當地用於顯示裝置等的光學濾光片。 The compound of the present invention can be suitably used for optical filters of display devices and the like.
1、2‧‧‧影像顯示元件 1, 2‧‧‧ image display component
10‧‧‧光學濾光片 10‧‧‧Optical filter
11‧‧‧影像顯示元件用黏著劑層 11‧‧‧Adhesive layer for image display device
12‧‧‧相位差膜 12‧‧‧phase retardation film
13‧‧‧黏著劑層 13‧‧‧Adhesive layer
14‧‧‧第1保護膜 14‧‧‧The first protective film
15‧‧‧偏光膜 15‧‧‧ Polarizing film
16‧‧‧第2保護膜 16‧‧‧Second protective film
20‧‧‧光學積層體 20‧‧‧Optical laminate
21‧‧‧影像顯示元件用黏著劑層 21‧‧‧Adhesive layer for image display element
24‧‧‧第1保護膜 24‧‧‧The first protective film
25‧‧‧偏光膜 25‧‧‧ Polarizing film
26‧‧‧第2保護膜 26‧‧‧Second protective film
第1圖(a)及(b)係顯示光學濾光片之一例的概略剖面圖。 Fig. 1 (a) and (b) are schematic cross-sectional views showing an example of an optical filter.
第2圖(a)係顯示有機EL顯示裝置之一例的概略剖面圖,(b)係顯示液晶顯示裝置之一例的概略剖面圖。 Fig. 2 (a) is a schematic cross-sectional view showing an example of an organic EL display device, and (b) is a schematic cross-sectional view showing an example of a liquid crystal display device.
(式(I)所示之化合物) (Compound represented by formula (I))
本發明係關於下述式(I)所示之化合物(以下亦稱為「化合物(I)」)。 The present invention relates to a compound represented by the following formula (I) (hereinafter also referred to as "compound (I)").
T1及T2分別獨立地表示氫原子或可具有取代基之碳數1至6的1價烴基; T 1 and T 2 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 6 carbon atoms which may have a substituent;
Y1及Y2之任一者表示可具有取代基之1價芳香族基,另一者表示可具有取代基之1價芳香族基、氫原子,鹵素原子或可具有取代基之碳數1至6的1價烴基(該烴基為1價芳香族基以外之基,該烴基所包含的-CH2-可取代為-O-或-CO-)]。 Either Y 1 or Y 2 represents a monovalent aromatic group which may have a substituent, and the other represents a monovalent aromatic group which may have a substituent, a hydrogen atom, a halogen atom, or a carbon number which may have a substituent 1 A monovalent hydrocarbon group up to 6 (the hydrocarbon group is a group other than a monovalent aromatic group, and -CH 2 -contained in the hydrocarbon group may be substituted with -O- or -CO-)].
化合物(I)中,除了式(I)所示之標記以外,亦存在例如下式所示之共振結構的互變異構物。化合物(I)包含所有的互變異構物。 In the compound (I), in addition to the symbol represented by the formula (I), there are, for example, tautomers of a resonance structure represented by the following formula. Compound (I) contains all tautomers.
式(I)中,作為R1至R4中的碳數1至6的1價烴基,可列舉如1價飽和烴基或1價不飽和烴基。 In the formula (I), examples of the monovalent hydrocarbon group having 1 to 6 carbon atoms in R 1 to R 4 include monovalent saturated hydrocarbon groups or monovalent unsaturated hydrocarbon groups.
作為1價飽和烴基,可列舉如:甲基、乙基、丙基、丁基、戊基或己基等直鏈狀烷基;異丙基、異丁基、第二丁基、第三丁基、異戊基或新戊基等分支鏈狀烷基;環丙基、環戊基或環己基等脂環式飽和烴基等。 Examples of monovalent saturated hydrocarbon groups include linear alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, and hexyl groups; isopropyl, isobutyl, second butyl, and third butyl groups , Isopentyl or neopentyl and other branched chain alkyl groups; cyclopropyl, cyclopentyl or cyclohexyl and other alicyclic saturated hydrocarbon groups.
作為1價不飽和烴基,可列舉如:屬於芳香族烴基的苯基;乙烯基、丙烯基、丁烯基或戊烯基等1價不飽和脂肪族烴基;環丙烯基、環戊烯基或環己烯基等1價脂環式不飽和烴基等。 Examples of the monovalent unsaturated hydrocarbon group include: a phenyl group belonging to an aromatic hydrocarbon group; a monovalent unsaturated aliphatic hydrocarbon group such as vinyl group, propenyl group, butenyl group, or pentenyl group; cyclopropenyl group, cyclopentenyl group, or Monovalent alicyclic unsaturated hydrocarbon group such as cyclohexenyl group.
式(I)中,作為R1至R4之中可具有取代基之碳數1至6的1價烴基的 取代基,可列舉例如:鹵素原子、羥基、胺基、硝基、胺磺醯基、磺酸基等。作為鹵素原子,可列舉如:氟原子、氯原子、溴原子或碘原子。 In the formula (I), examples of the substituent of the
式(I)中,作為T1及T2中的可具有取代基之碳數1至6的1價烴基,可列舉如:R1至R4中所例示者。 In the formula (I), examples of the monovalent hydrocarbon group having 1 to 6 carbon atoms which may have a substituent in T 1 and T 2 include those exemplified in R 1 to R 4 .
式(I)中,Y1及Y2之任一者只要為可具有取代基之1價芳香族基即可,兩者可分別獨立地為可具有取代基之1價芳香族基。Y1及Y2之中,一者為1價芳香族基的情況,另一者可為氫原子、鹵素原子或可具有取代基之碳數1至6的1價烴基,而該烴基所包含的-CH2-可取代為-O-或-CO-。 In formula (I), any one of Y 1 and Y 2 may be a monovalent aromatic group which may have a substituent, and each of them may independently be a monovalent aromatic group which may have a substituent. Among Y 1 and Y 2 , one is a monovalent aromatic group, the other may be a hydrogen atom, a halogen atom, or a
作為Y1及Y2中的可具有取代基之1價芳香族基,可列舉如:可具有取代基之1價芳香族烴基、或可具有取代基之1價芳香族雜環基。1價芳香族基可為單環結構,亦可為稠環結構。 Examples of the monovalent aromatic group which may have a substituent in Y 1 and Y 2 include a monovalent aromatic hydrocarbon group which may have a substituent, or a monovalent aromatic heterocyclic group which may have a substituent. The monovalent aromatic group may have a single ring structure or a fused ring structure.
1價芳香族烴基的碳數通常為6至30,較佳為6至20,更佳為6至13。作為1價芳香族烴基,可列舉如:苯基;萘基;蒽基;菲基;芘基;茀基等。又,1價芳香族烴基,包含上述基所含有的氫被烷基(該烷基所包含的-CH2-可取代為-O-或-CO-)、芳基等烴基所取代的基,其可為例如甲苯基、二甲苯基、三甲苯基、丙基苯基、丁基苯基、己基苯基、聯苯基、聯三苯基、丙基聯苯基等。 The carbon number of the monovalent aromatic hydrocarbon group is usually 6 to 30, preferably 6 to 20, and more preferably 6 to 13. Examples of monovalent aromatic hydrocarbon groups include: phenyl; naphthyl; anthracenyl; phenanthrenyl; pyrenyl; stilbene and the like. In addition, the monovalent aromatic hydrocarbon group includes a group in which hydrogen contained in the above group is substituted with a hydrocarbon group such as an alkyl group (-CH 2 -contained in the alkyl group may be substituted with -O- or -CO-), an aryl group, It may be, for example, tolyl, xylyl, tricresyl, propylphenyl, butylphenyl, hexylphenyl, biphenyl, bitriphenyl, propylbiphenyl, and the like.
1價芳香族雜環基的碳數通常為2至30,較佳為4至20,更佳為4至10。 The carbon number of the monovalent aromatic heterocyclic group is usually 2 to 30, preferably 4 to 20, and more preferably 4 to 10.
1價芳香族雜環基中的雜原子表示氮原子、氧原子或硫原子等。作為1價芳香族雜環基,可列舉如:從呋喃、噻吩、吡咯、唑、異唑、噻唑、異噻唑、咪唑、吡唑、呋呫、三唑、二唑、異唑、四唑、哌喃、吡啶、噻喃、嗒、嘧啶、吡、三、苯并呋喃、異苯并呋喃、苯并噻吩、吲哚、異吲哚、中氮茚 (indolizine)、吲哚啉、異吲哚啉、苯并哌喃、異苯并哌喃、色滿、異色滿、苯并哌喃、喹啉、異喹啉、喹、苯并咪唑、苯并噻唑、苯并噻二唑、吲唑、萘啶、喹啉、喹唑啉、喹唑啶、噌啉(Cinnoline)、呔、嘌呤、喋啶、咔唑、二苯并哌喃(xanthene)、啡啶、吖啶、β-咔啉、呸啶、啡啉、噻嗯、啡噻、啡、啡噻、啡等雜環式化合物去除1個氫原子後的基。又,1價芳香族雜環基係包含上述基所含有的氫被烷基、芳基等烴基所取代的基,其可為例如從N-聯苯咔唑去除1個氫原子後的基。 The hetero atom in the monovalent aromatic heterocyclic group represents a nitrogen atom, an oxygen atom, a sulfur atom, or the like. Examples of monovalent aromatic heterocyclic groups include furan, thiophene, pyrrole, Azole, iso Azole, thiazole, isothiazole, imidazole, pyrazole, furox, triazole, Diazole, iso Azole, tetrazole, piperan, pyridine, thiopyran, ta , Pyrimidine, pyridine ,three , Benzofuran, isobenzofuran, benzothiophene, indole, isoindole, indolizine, indoline, isoindolin, benzopiperan, isobenzopiperan, chroman , Isochroman, benzopiperan, quinoline, isoquinoline, quinoline , Benzimidazole, benzothiazole, benzothiadiazole, indazole, naphthyridine, quinoline Quinoline, quinazoline, quinazolidine, cinnoline (Cinnoline), 呔 , Purine, pyridine, carbazole, xanthene, pyridine, acridine, β-carboline, pyridine, morpholine, thien, morphine Thiocyanine Fenthione ,coffee The heterocyclic compound removes one hydrogen atom. In addition, the monovalent aromatic heterocyclic group includes a group in which hydrogen contained in the above group is substituted with a hydrocarbon group such as an alkyl group or an aryl group, and it may be a group obtained by removing one hydrogen atom from N-biphenylcarbazole, for example.
作為可具有取代基之1價芳香族基中的取代基,可列舉例如:上述鹵素原子;羥基;胺基;硝基;芳氧基;芳基羰基;芳氧基羰基;羧基;磺酸基;胺甲醯基;胺磺醯基等。 Examples of the substituent in the monovalent aromatic group which may have a substituent include the above halogen atom; hydroxyl group; amine group; nitro group; aryloxy group; arylcarbonyl group; aryloxycarbonyl group; carboxyl group; sulfonic acid group ; Amine; Aminosulfonyl and so on.
式(I)之中,Y1及Y2中之任一者之1價芳香族基以外的烴基為可具有取代基之碳數1至6的1價烴基,可列舉如:R1至R4中所例示的可具有取代基之1價飽和烴基、可具有取代基之1價不飽和脂肪族烴基、或可具有取代基之1價脂環式不飽和烴基等。 In the formula (I), the hydrocarbon group other than the monovalent aromatic group of any of Y 1 and Y 2 is a monovalent hydrocarbon group having 1 to 6 carbon atoms which may have a substituent, and examples include: R 1 to R The monovalent saturated hydrocarbon group which may have a substituent, the monovalent unsaturated aliphatic hydrocarbon group which may have a substituent, or the monovalent alicyclic unsaturated hydrocarbon group which may have a substituent, etc., exemplified in 4 .
該烴基所包含的-CH2-可取代為-O-或-CO-,如此之基可列舉如:-C(=O)CH3、-C(=O)-OCH2CH3。 The -CH 2 -contained in the hydrocarbon group may be substituted with -O- or -CO-. Examples of such groups include -C(=O)CH 3 and -C(=O)-OCH 2 CH 3 .
作為化合物(I),可列舉例如下式表示的化合物。 Examples of the compound (I) include compounds represented by the following formula.
化合物(I)可用於顯示裝置等之中的光學濾光片。例如,藉由在成為光學濾光片的層中添加化合物(I),可作為能夠吸收580nm附近(575至590nm)之光(較佳係最大吸收波長為580nm的光)的光學濾光片。藉此,相較於入射光學濾光片的光,穿透光學濾光片的光提高了綠色光與紅色光的分離性,而可期待提升綠色光及紅色光的色純度。因此,藉由將使用化合物(I)的光學濾光片應用於顯示裝置等,可得到色純度提升的顯示裝置。 The compound (I) can be used for optical filters in display devices and the like. For example, by adding the compound (I) to a layer that becomes an optical filter, it can be used as an optical filter capable of absorbing light in the vicinity of 580 nm (575 to 590 nm) (preferably light having a maximum absorption wavelength of 580 nm). As a result, the light passing through the optical filter improves the separation between the green light and the red light compared to the light entering the optical filter, and it is expected to improve the color purity of the green light and the red light. Therefore, by applying the optical filter using the compound (I) to a display device or the like, a display device with improved color purity can be obtained.
(式(II)所示之化合物) (Compound represented by formula (II))
本發明之下述式(II)所示之化合物(以下亦稱為「化合物(II)」)可作為用以製造化合物(I)的中間體使用。 The compound represented by the following formula (II) of the present invention (hereinafter also referred to as "compound (II)") can be used as an intermediate for producing compound (I).
T1及T2分別獨立地表示氫原子或可具有取代基之碳數1至6的1價烴基。 T 1 and T 2 each independently represent a hydrogen atom or a
X1及X2之任一者表示選自群組A的任一基,另一者表示選自群組A的任一基、氫原子或可具有取代基之碳數1至6的1價烴基(該烴基為1價芳香族基以外之基,該烴基所包含的-CH2-可取代為-O-或-CO-)。 Either X 1 or X 2 represents any group selected from Group A, and the other represents any group selected from Group A, a hydrogen atom, or a monovalent carbon number of 1 to 6 which may have a substituent Hydrocarbon group (the hydrocarbon group is a group other than a monovalent aromatic group, and -CH 2 -contained in the hydrocarbon group may be substituted with -O- or -CO-).
群組A:鹵素原子、硼酸酯基及-B(OH)2所構成之群組]。 Group A: a group consisting of a halogen atom, a borate group and -B(OH) 2 ].
化合物(II)中,除了式(II)所示之標記以外,存在例如下式所表示之共振結構的互變異構物。化合物(II)包含所有互變異構物。 In the compound (II), in addition to the symbol represented by the formula (II), there is, for example, a tautomer of a resonance structure represented by the following formula. Compound (II) contains all tautomers.
式(II)中,R1至R4、T1及T2中的可具有取代基之碳數1至6的1價烴基,可列舉如上述者。 In the formula (II), the
式(II)中,X1及X2之任一者表示選自群組A的任一基,亦可兩者皆為選自群組A的任一基。X1及X2之中,一者為選自群組A之任一基的情況,另一 者可為氫原子或可具有取代基之碳數1至6的1價烴基,該烴基所包含的-CH2-可取代為-O-或-CO-。 In formula (II), either X 1 or X 2 represents any group selected from group A, or both may be any group selected from group A. Among X 1 and X 2 , one is a group selected from any group A, and the other may be a hydrogen atom or a
式(II)中,群組A中的鹵素原子可列舉如上述者。 In the formula (II), the halogen atom in the group A may be as mentioned above.
作為X1及X2中的硼酸酯基,可列舉如下述式表示的基。下述式中,*表示鍵結鍵。 Examples of the borate group in X 1 and X 2 include groups represented by the following formulas. In the following formula, * represents a bonding bond.
式(II)之中,X1及X2中之任一者的1價芳香族基以外的烴基為可具有取代基之碳數1至6的1價烴基,可列舉如:R1至R4中例示的1價飽和烴基、1價不飽和脂肪族烴基、或1價脂環式不飽和烴基等。 In the formula (II), the hydrocarbon group other than the monovalent aromatic group of any one of X 1 and X 2 is a
該烴基所包含的-CH2-可取代為-O-或-CO-,如此之基可列舉例如:-C(=O)CH3、-C(=O)-OCH2CH3。 -CH 2 -contained in the hydrocarbon group may be substituted with -O- or -CO-. Examples of such a group include -C(=O)CH 3 and -C(=O)-OCH 2 CH 3 .
化合物(II),可列舉例如:下述式表示的化合物。 The compound (II) may, for example, be a compound represented by the following formula.
(化合物(I)的製造方法[1]) (Production method of compound (I) [1])
說明本發明之化合物(I)中Y1及Y2兩者為可具有取代基之1價芳香族基之情況的化合物(下述式(Ia)所示之化合物(以下亦稱為「化合物(Ia)」))的製造方法。 The compound (I) of the present invention shows that both Y 1 and Y 2 are monovalent aromatic groups which may have a substituent (the compound represented by the following formula (Ia) (hereinafter also referred to as “compound ( Ia)")).
R1至R4分別獨立地表示氫原子或可具有取代基之碳數1至6的1價烴基; R 1 to R 4 independently represent a hydrogen atom or a
T1及T2分別獨立地表示氫原子或可具有取代基之碳數1至6的1價烴基; T 1 and T 2 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 6 carbon atoms which may have a substituent;
Y1a及Y2a分別獨立地表示可具有取代基之1價芳香族基]。 Y 1a and Y 2a each independently represent a monovalent aromatic group which may have a substituent].
式(Ia)中,R1至R4、T1及T2中的可具有取代基之碳數1至6的1價烴基可列舉如上述者。 In the formula (Ia), the
式(Ia)中之Y1a及Y2a中的可具有取代基之1價芳香族基,可列舉如:上述式(I)中以Y1及Y2表示的可具有取代基之1價芳香族基之例示者。 The monovalent aromatic group which may have a substituent in Y 1a and Y 2a in formula (Ia) may be exemplified by the monovalent aromatic group which may have a substituent represented by Y 1 and Y 2 in the above formula (I) An example of a family base.
化合物(Ia)的製造方法可包含在鎳催化劑或鈀催化劑的存在下使式(IIa)所示之化合物、式(III-1a)所示之化合物與式(III-2a)所示之化合物反應的步驟。 The method for producing compound (Ia) may include reacting the compound represented by formula (IIa), the compound represented by formula (III-1a) and the compound represented by formula (III-2a) in the presence of a nickel catalyst or a palladium catalyst A step of.
R1至R4表示與前述相同的意義; R 1 to R 4 have the same meaning as described above;
T1及T2表示與前述相同的意義; T 1 and T 2 have the same meaning as described above;
X1a及X2a分別獨立地表示選自群組A的任一基; X 1a and X 2a independently represent any group selected from group A;
群組A:鹵素原子、硼酸酯基及-B(OH)2所構成之群組]。 Group A: a group consisting of a halogen atom, a borate group and -B(OH) 2 ].
Y1a-Z1 (III-1a) Y 1a -Z 1 (III-1a)
Y2a-Z2 (III-2a)[式(III-Ia)及式(III-2a)中, Y 2a -Z 2 (III-2a) [In formula (III-Ia) and formula (III-2a),
Y1a及Y2a表示與前述相同的意義; Y 1a and Y 2a have the same meaning as above;
Z1及Z2分別獨立地表示鹵素原子、硼酸酯基、-B(OH)2、烷基磺酸酯基或芳基磺酸酯基]。 Z 1 and Z 2 each independently represent a halogen atom, a borate group, -B(OH) 2 , an alkylsulfonate group or an arylsulfonate group].
式(IIa)中,R1至R4、T1及T2中的可具有取代基之碳數1至6的1價烴基可列舉如上述者。 In the formula (IIa), the
式(IIa)中的X1a及X2a之群組A中的鹵素原子、硼酸酯基可列舉如上述者。 The halogen atom and the borate group in the group A of X 1a and X 2a in the formula (IIa) may be as described above.
式(III-1a)及式(III-2a)中,Z1及Z2中的鹵素原子、硼酸酯基可列舉如上述者。 In the formula (III-1a) and the formula (III-2a), the halogen atom and the borate group in Z 1 and Z 2 may be as described above.
作為Z1及Z2中的烷基磺酸酯基,可列舉如:甲烷磺酸酯基、乙烷磺酸酯基或三氟甲烷磺酸酯基等可具有鹵素原子之碳數1至6的烷基磺酸酯基。作為鹵素原子可列舉如上述所例示者。 Examples of the alkyl sulfonate groups in Z 1 and Z 2 include methane sulfonate groups, ethane sulfonate groups, trifluoromethane sulfonate groups, and the like, which may have a halogen atom and a carbon number of 1 to 6. Alkylsulfonate group. Examples of halogen atoms include those exemplified above.
作為Z1及Z2中的芳基磺酸酯基,可列舉如:苯磺酸酯基、對甲苯磺酸酯基、苄基磺酸酯基等碳數6至18的芳基磺酸酯基。 Examples of the arylsulfonate groups in Z 1 and Z 2 include arylsulfonates having 6 to 18 carbon atoms, such as benzenesulfonate groups, p-toluenesulfonate groups, and benzylsulfonate groups. base.
較佳者係Z1及Z2分別獨立地為鹵素原子、硼酸酯基、或-B(OH)2。 Preferably, Z 1 and Z 2 are each independently a halogen atom, a borate group, or -B(OH) 2 .
作為式(IIa)所示之化合物,可列舉例如:下式表示的化合物。 Examples of the compound represented by formula (IIa) include compounds represented by the following formula.
作為式(III-1a)及式(III-2a)所示之化合物,可列舉如:2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚、3,4,5-三甲氧基苯基硼酸、4-己基苯基硼酸、4-己氧基苯基硼酸、4-(二甲胺基)苯基硼酸、4-(二苯胺基)苯基硼酸、4’-丙基-4-聯苯硼酸、6-乙氧基-2-萘硼酸、9,9-二甲基茀-2-硼酸、苯并[b]噻吩-2-硼酸、9-乙基咔唑-3-硼酸、9-(4-聯苯基)咔唑-3-硼酸嚬哪醇、4-第三丁基苯基硼酸、4-甲氧基-3,5-二甲基苯基硼酸、4-羧基苯基硼酸嚬哪醇、1-噻嗯基硼酸、4-甲基-1-萘硼酸等。 Examples of the compounds represented by formula (III-1a) and formula (III-2a) include: 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3, 2-dioxaborolan-2-yl)phenol, 3,4,5-trimethoxyphenylboronic acid, 4-hexylphenylboronic acid, 4-hexyloxyphenylboronic acid, 4-(dimethylamino) ) Phenylboronic acid, 4-(diphenylamino) phenylboronic acid, 4'-propyl-4-biphenylboronic acid, 6-ethoxy-2-naphthaleneboronic acid, 9,9-dimethyl stilbene-2- Boric acid, benzo[b]thiophene-2-boronic acid, 9-ethylcarbazole-3-boronic acid, 9-(4-biphenyl)carbazole-3-boronic acid namalol, 4-third butylbenzene Boronic acid, 4-methoxy-3,5-dimethylphenylboronic acid, 4-carboxyphenylboronic acid coronaol, 1-thienylboronic acid, 4-methyl-1-naphthaleneboronic acid, etc.
製造化合物(Ia)的步驟中,較佳係在鈀催化劑存在下或鎳催化劑存在下使式(IIa)所示之化合物、式(III-1a)所示之化合物與式(III-2a)所示之化合物偶合的方法,最佳係在鈀催化劑存在下所進行的偶合方法。 In the step of producing compound (Ia), it is preferable to use the compound represented by formula (IIa), the compound represented by formula (III-1a) and the formula (III-2a) in the presence of a palladium catalyst or a nickel catalyst The coupling method of the compound shown is the best coupling method in the presence of a palladium catalyst.
作為鈀催化劑,可列舉如:肆(三苯膦)鈀(0)、參(二亞苄基丙酮)二鈀(0)、乙酸鈀(II)、二氯雙三苯膦鈀(II)及六氯鈀(IV)酸鉀等。 Examples of the palladium catalyst include: palladium (0) triphenylphosphine, palladium (0) ginseng (dibenzylideneacetone), palladium (II) acetate, palladium (II) dichlorobistriphenylphosphine and Potassium hexachloropalladium (IV), etc.
作為鎳催化劑,可列舉如:肆(三苯膦)鎳(0)、[雙(1,5-環辛二烯)]鎳(0)、二氯[1,3-雙(二苯基膦基)丙烷]鎳(II)、雙(2,4-戊烷二酮基)鎳(II)、雙(三苯膦)鎳(II)二氯化物及鹵化鎳(II)等。 Examples of nickel catalysts include: (triphenylphosphine) nickel (0), [bis(1,5-cyclooctadiene)] nickel (0), and dichloro[1,3-bis(diphenylphosphine Group) propane] nickel (II), bis (2,4-pentanedione) nickel (II), bis (triphenylphosphine) nickel (II) dichloride and nickel halide (II), etc.
鈀催化劑或鎳催化劑的使用量,相對於式(IIa)所示之化合物1莫耳,較佳為0.1莫耳%以上50莫耳%以下。 The use amount of the palladium catalyst or the nickel catalyst is preferably 0.1 mol% or more and 50 mol% or less with respect to 1 mol of the compound represented by the formula (IIa).
式(III-1a)所示之化合物的使用量,相對於式(IIa)所示之化合物1莫耳,較佳為1莫耳以上5莫耳以下,更佳為1.1莫耳以上3莫耳以下。 The use amount of the compound represented by formula (III-1a) is preferably 1 mole or more and 5 moles or less, more preferably 1.1 moles or more and 3 moles relative to 1 mole of the compound represented by formula (IIa) the following.
式(III-2a)所示之化合物的使用量,相對於式(IIa)所示之化合物1莫耳,較佳為1莫耳以上5莫耳以下,更佳為1.1莫耳以上3莫耳以下。 The use amount of the compound represented by the formula (III-2a) is preferably 1 mole or more and 5 moles or less, more preferably 1.1 moles or more and 3 moles relative to the compound represented by the formula (IIa) at 1 mole. the following.
反應溫度較佳為30℃至180℃,更佳為80℃至140℃。反應時間較佳為1小時至20小時,更佳為3小時至15小時。 The reaction temperature is preferably 30°C to 180°C, and more preferably 80°C to 140°C. The reaction time is preferably 1 hour to 20 hours, and more preferably 3 hours to 15 hours.
從產率的觀點來看,反應較佳係在有機溶劑中進行。作為有機溶劑,可列舉如:甲苯、二甲苯等芳香族烴溶劑;己烷、環己烷、十氫萘等烴溶劑;四氫呋喃、1,4-二烷、二甲氧基乙烷等醚系溶劑;氯苯、二氯苯、氯仿等鹵烴溶劑;甲醇、乙醇、異丙醇、丁醇等醇溶劑;硝基苯等硝基烴溶劑;甲基異丁基酮等酮溶劑;N,N-二甲基甲醯胺、1-甲基-2-吡咯啶酮等醯胺溶劑等,該等亦可混合使用。該等之中,較佳為四氫呋喃。又,亦可藉由在如使用鈀催化劑之偶合反應之與水的2相系或混合系中的反應來進行。有機溶劑的使用量,相對於式(IIa)所示之化合物1質量份,較佳為10質量份以上200質量份以下,更佳為20質量份以上150質量份以下。 From the viewpoint of yield, the reaction is preferably carried out in an organic solvent. Examples of organic solvents include aromatic hydrocarbon solvents such as toluene and xylene; hydrocarbon solvents such as hexane, cyclohexane, and decahydronaphthalene; tetrahydrofuran, 1,4-bis Ether, dimethoxyethane and other ether solvents; chlorobenzene, dichlorobenzene, chloroform and other halogenated hydrocarbon solvents; methanol, ethanol, isopropanol, butanol and other alcohol solvents; nitrobenzene and other nitro hydrocarbon solvents; A Ketone solvents such as isobutyl ketone; amide solvents such as N,N-dimethylformamide and 1-methyl-2-pyrrolidone, etc., which can also be used in combination. Among these, tetrahydrofuran is preferred. In addition, it can also be carried out by a reaction in a two-phase system or a mixed system with water such as a coupling reaction using a palladium catalyst. The amount of the organic solvent used is preferably 10 parts by mass or more and 200 parts by mass or less, and more preferably 20 parts by mass or more and 150 parts by mass or less with respect to 1 part by mass of the compound represented by formula (IIa).
又,亦可在式(IIa)所示之化合物、式(III-1a)所示之化合物及式(III-2a)所示之化合物的反應中添加鹼。該鹼較佳係可充分溶解於反應所使用之溶劑。作為鹼,可列舉例如:碳酸鈉、碳酸鉀、碳酸銫、氟化鉀、氟化銫、磷酸三鉀等無機鹼;丁基鋰、第三丁氧化鉀、第三丁氧化鈉、甲氧化鈉、乙氧化鈉、氟化四丁基銨、氯化四丁基銨、溴化四丁基銨、氫氧化四乙基銨、氫氧化四丁基銨等有機鹼。混合鹼的方法,可列舉如:在氬或氮等的非活性環境下一邊攪拌反應液,一邊添加鹼的溶液的方法,或是在鹼的溶液中添加反應液的方法。 In addition, a base may be added to the reaction of the compound represented by formula (IIa), the compound represented by formula (III-1a), and the compound represented by formula (III-2a). The base is preferably soluble in the solvent used in the reaction. Examples of the base include inorganic bases such as sodium carbonate, potassium carbonate, cesium carbonate, potassium fluoride, cesium fluoride, and tripotassium phosphate; butyl lithium, potassium tributoxide, sodium tributoxide, and sodium methoxide , Sodium ethoxide, tetrabutylammonium fluoride, tetrabutylammonium chloride, tetrabutylammonium bromide, tetraethylammonium hydroxide, tetrabutylammonium hydroxide and other organic bases. The method of mixing alkali includes, for example, a method of adding an alkali solution while stirring the reaction solution in an inactive environment such as argon or nitrogen, or a method of adding a reaction solution to an alkali solution.
鹼的使用量,相對於式(IIa)所示之化合物1莫耳,較佳為2莫耳以上20莫耳以下。 The amount of the base used is preferably 2 moles or more and 20 moles or less relative to 1 mole of the compound represented by formula (IIa).
從反應混合物取得屬於目標化合物之化合物(Ia)的方法並無特別限定,可採用習知的各種手法。例如,在冷卻後將析出之結晶過濾並取出的方法。經過濾而取出的結晶,較佳係以水等洗淨然後進行乾燥。又,亦可因應需求藉由再結晶、管柱層析等的習知手法進一步精製。 The method of obtaining the compound (Ia) belonging to the target compound from the reaction mixture is not particularly limited, and various conventional methods can be used. For example, a method of filtering and taking out precipitated crystals after cooling. The crystals taken out by filtration are preferably washed with water or the like and then dried. In addition, it can be further refined by conventional methods such as recrystallization and column chromatography according to needs.
(化合物(I)的製造方法[2]) (Production method of compound (I) [2])
說明本發明之化合物(I)中Y1為可具有取代基之1價芳香族基、Y2為氫原子或可具有取代基之碳數1至6的1價烴基(該烴基為1價芳香族基以外之基,該烴基所包含的-CH2-可取代為-O-或-CO-)之情況的化合物(下述式(Ib)所示之化合物(以下亦稱為「化合物(Ib)」))的製造方法。 In the compound (I) of the present invention, Y 1 is a monovalent aromatic group which may have a substituent, Y 2 is a hydrogen atom or a
R1至R4分別獨立地表示氫原子或可具有取代基之碳數1至6的1價烴基; R 1 to R 4 independently represent a hydrogen atom or a
T1及T2分別獨立地表示氫原子或可具有取代基之碳數1至6的1價烴基; T 1 and T 2 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 6 carbon atoms which may have a substituent;
Y1b表示可具有取代基之1價芳香族基; Y 1b represents a monovalent aromatic group which may have a substituent;
X2b表示氫原子或可具有取代基之碳數1至6的1價烴基(該烴基為1價芳香族基以外之基,該烴基所包含的-CH2-可取代為-O-或-CO-)]。 X 2b represents a hydrogen atom or a C1-C6 monovalent hydrocarbon group which may have a substituent (the hydrocarbon group is a group other than a monovalent aromatic group, and -CH 2 -contained in the hydrocarbon group may be substituted to -O- or- CO-)].
式(Ib)中,R1至R4、T1及T2中的可具有取代基之碳數1至6的1價烴基,可列舉如:上述式(I)中的R1至R4中所例示者。 In the formula (Ib), R 1 to R 4 , T 1 and T 2 may have a
式(Ib)中,Y1b中的可具有取代基之1價芳香族基,可列舉如:上述式(I)中的 Y1及Y2中所例示者。 In the formula (Ib), the monovalent aromatic group which may have a substituent in Y 1b is exemplified by Y 1 and Y 2 in the above formula (I).
式(Ib)中,X2b中的可具有取代基之碳數1至6的1價烴基,可列舉如:上述式(I)中的R1至R4中所例示者。 In the formula (Ib), the
化合物(Ib)的製造方法,亦可包含在鎳催化劑或鈀催化劑的存在下使式(IIb)所示之化合物與式(III-1b)所示之化合物反應的步驟。 The method for producing the compound (Ib) may further include the step of reacting the compound represented by the formula (IIb) with the compound represented by the formula (III-1b) in the presence of a nickel catalyst or a palladium catalyst.
R1至R4表示與前述相同的意義; R 1 to R 4 have the same meaning as described above;
T1及T2表示與前述相同的意義; T 1 and T 2 have the same meaning as described above;
X1b表示選自群組A的任一基。 X 1b represents any group selected from group A.
群組A:鹵素原子、硼酸酯基及-B(OH)2所構成之群組。 Group A: a group consisting of halogen atoms, borate groups and -B(OH) 2 .
X2b表示與前述相同的意義;] X 2b means the same as before;]
Y1b-Z1 (III-1b)[式中, Y 1b -Z 1 (III-1b) [where,
Y1b表示與前述相同的意義; Y 1b has the same meaning as above;
Z1表示鹵素原子、硼酸酯基、-B(OH)2、烷基磺酸酯基或芳基磺酸酯基]。 Z 1 represents a halogen atom, a borate group, -B(OH) 2 , an alkylsulfonate group or an arylsulfonate group].
式(IIb)及式(III-1b)中,R1至R4、T1及T2、X2b中的可具有取代基之碳數1至6的1價烴基,可列舉如:上述式(I)中的R1至R4中所例示者。 In formula (IIb) and formula (III-1b), R 1 to R 4 , T 1 and T 2 , and X 2b may have a
式(IIb)及式(III-1b)中,Y1b中的可具有取代基之1價芳香族基,可列舉如:上述式(I)中的Y1及Y2中所例示者。 In the formula (IIb) and the formula (III-1b), the monovalent aromatic group which may have a substituent in Y 1b may be exemplified by Y 1 and Y 2 in the above formula (I).
式(IIb)中,X1b中的鹵素原子、硼酸酯基可列舉如上述者。 In the formula (IIb), the halogen atom and the borate group in X 1b may be as described above.
作為式(IIb)所示之化合物,可列舉例如下式表示的化合物。 Examples of the compound represented by the formula (IIb) include compounds represented by the following formula.
作為式(III-1b)所示之化合物,可列舉如上述式(III-1a)及式(III-2a)所示之化合物中所例示之化合物。 Examples of the compound represented by the formula (III-1b) include the compounds exemplified as the compounds represented by the above formula (III-1a) and formula (III-2a).
製造化合物(Ib)的步驟中,較佳係在鈀催化劑存在下或鎳催化劑存在下使式(IIb)所示之化合物與式(III-1b)所示之化合物偶合的方法,最佳係在鈀催化劑的存在下所進行的偶合方法。作為鈀催化劑及鎳催化劑,可列舉如上述者。 In the step of producing compound (Ib), it is preferable to couple the compound represented by formula (IIb) with the compound represented by formula (III-1b) in the presence of a palladium catalyst or a nickel catalyst, and the best method is Coupling method performed in the presence of a palladium catalyst. Examples of the palladium catalyst and nickel catalyst include those mentioned above.
式(III-1b)所示之化合物的使用量,相對於式(IIb)所示之化合物1莫耳,較佳為1莫耳以上5莫耳以下,更佳為1.1莫耳以上3莫耳以下。 The use amount of the compound represented by formula (III-1b) is preferably 1 mole or more and 5 moles or less, more preferably 1.1 moles or more and 3 moles relative to 1 mole of the compound represented by formula (IIb) the following.
鈀催化劑或鎳催化劑的使用量,相對於式(IIb)所示之化合物1莫耳,較佳為0.1莫耳%以上50莫耳%以下。 The use amount of the palladium catalyst or the nickel catalyst is preferably 0.1 mol% or more and 50 mol% or less with respect to 1 mol of the compound represented by formula (IIb).
反應溫度較佳為30℃至180℃,更佳為80℃至140℃。反應時間較佳為1小時至20小時,更佳為3小時至15小時。 The reaction temperature is preferably 30°C to 180°C, and more preferably 80°C to 140°C. The reaction time is preferably 1 hour to 20 hours, and more preferably 3 hours to 15 hours.
從產率的觀點來看,反應較佳係在有機溶劑中進行。有機溶劑,可列舉如上述所例示者。有機溶劑的使用量,相對於式(IIb)所示之化合物1質量份,較佳為10質量份以上200質量份以下,更佳為20質量份以上150質量份以下。 From the viewpoint of yield, the reaction is preferably carried out in an organic solvent. Examples of organic solvents include those exemplified above. The amount of the organic solvent used is preferably 10 parts by mass or more and 200 parts by mass or less, and more preferably 20 parts by mass or more and 150 parts by mass or less with respect to 1 part by mass of the compound represented by formula (IIb).
從反應混合物取得屬於目標化合物之化合物(Ib)的方法並無特別限定,可採用習知的各種手法,可列舉例如上述方法。 The method of obtaining the compound (Ib) belonging to the target compound from the reaction mixture is not particularly limited, and various conventional methods can be used, and examples thereof include the above-mentioned methods.
(化合物(I)的製造方法[3]) (Production method of compound (I) [3])
本發明之化合物(I)的製造方法係可包含使下述式(IV)所示之方酸(3,4-二羥基-3-環丁烯-1,2-二酮)或式(IV-1)所示之化合物(以下亦稱為化合物(IV-1))、下述式(V1)所示之化合物(以下亦稱為「吡咯系化合物(V1)」)與下述式(V2)所示之化合物(以下亦稱為「吡咯系化合物(V2)」)反應的步驟。 The production method of the compound (I) of the present invention may include a squaric acid (3,4-dihydroxy-3-cyclobutene-1,2-dione) represented by the following formula (IV) or formula (IV -1) The compound represented by (hereinafter also referred to as compound (IV-1)), the compound represented by the following formula (V1) (hereinafter also referred to as "pyrrole-based compound (V1)") and the following formula (V2 ) The step of reacting the compound shown (hereinafter also referred to as "pyrrole-based compound (V2)").
R1至R4表示與前述相同的意義; R 1 to R 4 have the same meaning as described above;
Y1及Y2之任一者表示可具有取代基之1價芳香族基,另一者表示可具有取代基之1價芳香族基、氫原子、鹵素原子或可具有取代基之碳數1至6的1價烴基(該烴基為1價芳香族基以外之基,該烴基所包含的-CH2-可取代為-O-或-CO-); Either Y 1 or Y 2 represents a monovalent aromatic group that may have a substituent, and the other represents a monovalent aromatic group that may have a substituent, a hydrogen atom, a halogen atom, or a carbon number that may have a substituent 1 A monovalent hydrocarbon group up to 6 (the hydrocarbon group is a group other than a monovalent aromatic group, and -CH 2 -contained in the hydrocarbon group may be substituted with -O- or -CO-);
T1及T2表示與前述相同的意義; T 1 and T 2 have the same meaning as described above;
R11及R12分別獨立地表示碳數1至4的烷基]。 R 11 and R 12 each independently represent an alkyl group having 1 to 4 carbons].
式(V1)及式(V2)中,R1至R4、T1及T2中的可具有取代基之碳數1至6的1價烴基可列舉如上述者。 In the formula (V1) and the formula (V2), the
式(V1)及式(V2)中,Y1及Y2中的可具有取代基之1價芳香族基、鹵素原子、可具有取代基之碳數1至6的1價烴基可列舉如上述者。 In formula (V1) and formula (V2), the monovalent aromatic group which may have a substituent in Y 1 and Y 2 , a halogen atom, and a monovalent hydrocarbon group having 1 to 6 carbon atoms which may have a substituent are exemplified as described above By.
作為吡咯系化合物(V1)及吡咯系化合物(V2),可列舉例如:下式表示的化合物。 Examples of the pyrrole-based compound (V1) and the pyrrole-based compound (V2) include compounds represented by the following formulas.
製造化合物(I)的步驟中,較佳為使方酸、吡咯系化合物(V1)與吡咯系化合物(V2)在有機溶劑中脫水縮合的方法。作為有機溶劑,可列舉如上述者,較佳為丁醇及甲苯的混合溶劑。 In the step of producing compound (I), a method of dehydrating and condensing squaric acid, pyrrole-based compound (V1) and pyrrole-based compound (V2) in an organic solvent is preferred. Examples of the organic solvent include those described above, and a mixed solvent of butanol and toluene is preferred.
使方酸、吡咯系化合物(V1)與吡咯系化合物(V2)反應的步驟中,方酸的使用量,相對於吡咯系化合物(V1)及吡咯系化合物(V2)總計1莫耳,較佳 為0.45莫耳以上0.6莫耳以下,更佳為0.47莫耳以上0.51莫耳以下。 In the step of reacting squaric acid, pyrrole-based compound (V1) and pyrrole-based compound (V2), the amount of squaric acid used is preferably 1 mol in total with respect to pyrrole-based compound (V1) and pyrrole-based compound (V2). It is 0.45 moles or more and 0.6 moles or less, more preferably 0.47 moles or more and 0.51 moles or less.
吡咯系化合物(V2)的使用量,相對於吡咯系化合物(V1)1莫耳,較佳為1莫耳以上1.5莫耳以下。 The use amount of the pyrrole-based compound (V2) is preferably 1 mole or more and 1.5 mole or less relative to 1 mole of the pyrrole-based compound (V1).
式(IV)所示之化合物或化合物(IV-1)與吡咯系化合物(V1)、吡咯系化合物(V2)的反應,係藉由將式(IV)所示之化合物或化合物(IV-1)與吡咯系化合物(V1)、吡咯系化合物(V2)混合而進行。反應係可使式(IV)所示之化合物或化合物(IV-1)、吡咯系化合物(V1)與吡咯系化合物(V2)全部一起反應。又,亦可為先使式(IV)所示之化合物或化合物(IV-1)與吡咯系化合物(V1)混合,之後再混合吡咯系化合物(V2)的方法,亦可為先使式(IV)所示之化合物或化合物(IV-1)與吡咯系化合物(V2)混合,之後再混合吡咯系化合物(V1)的方法。 The reaction of the compound or compound (IV-1) represented by the formula (IV) with the pyrrole-based compound (V1) and the pyrrole-based compound (V2) is achieved by combining the compound or compound (IV-1) represented by the formula (IV) ) Is mixed with the azole-based compound (V1) and the azole-based compound (V2). In the reaction system, the compound represented by the formula (IV) or the compound (IV-1), the azole-based compound (V1), and the azole-based compound (V2) can be reacted together. Alternatively, a method of first mixing the compound represented by formula (IV) or compound (IV-1) with a pyrrole-based compound (V1) and then mixing the pyrrole-based compound (V2) may also be a method of first using the formula ( IV) The compound or compound (IV-1) shown is mixed with the azole compound (V2), and then the azole compound (V1) is mixed.
反應溫度較佳為30℃至180℃,更佳為80℃至140℃。反應時間較佳為1小時至20小時,更佳為3小時至15小時。 The reaction temperature is preferably 30°C to 180°C, and more preferably 80°C to 140°C. The reaction time is preferably 1 hour to 20 hours, and more preferably 3 hours to 15 hours.
從產率的觀點來看,反應較佳係在有機溶劑中進行。作為有機溶劑,可列舉如上述所例示者。有機溶劑的使用量,相對於方酸1質量份,較佳為5質量份以上200質量份以下,更佳為8質量份以上160質量份以下。 From the viewpoint of yield, the reaction is preferably carried out in an organic solvent. Examples of the organic solvent include those exemplified above. The amount of the organic solvent used is preferably 5 parts by mass or more and 200 parts by mass or less, and more preferably 8 parts by mass or more and 160 parts by mass or less with respect to 1 part by mass of squaric acid.
從反應混合物取得屬於目標化合物之化合物(I)的方法並無特別限定,可採用習知的各種手法,例如上述方法。 The method for obtaining the compound (I) belonging to the target compound from the reaction mixture is not particularly limited, and various conventional methods such as the above-mentioned methods can be used.
吡咯系化合物(V1)例如可藉由使下式(V1’)(以下亦稱為「吡咯系化合物(V1’)」)與鹵化劑反應後,再使該反應產物與下述式(III-1)所示之化合物(以下亦稱為「化合物(III-1)」)反應而製造。又,吡咯系化合物(V2)例如可藉由使下述式(V2’)所示之化合物(以下亦稱為「吡咯系化合物(V2’)」)與鹵化劑反應後,再使該反應產物與下述式(III-2)所示之化合物(以下亦稱為「化合物(III-2)」)反應 而製造。又,因為在預期的位置使化合物(III-1)及化合物(III-2)反應,因此(V1’)及(V2’)可在未預期進行反應的位置具有如乙氧基羰基之保護基,在反應後藉由脫保護即可製造預期的吡咯系化合物(V1)及吡咯系化合物(V2)。 The pyrrole-based compound (V1) can be obtained by reacting the following formula (V1') (hereinafter also referred to as "pyrrole-based compound (V1')") with a halogenating agent, and then reacting the reaction product with the following formula (III- 1) The compound shown (hereinafter also referred to as "compound (III-1)") is produced by reaction. Further, for example, the pyrrole-based compound (V2) can be obtained by reacting a compound represented by the following formula (V2') (hereinafter also referred to as "pyrrole-based compound (V2')") with a halogenating agent, and then reacting the reaction product It is produced by reacting with a compound represented by the following formula (III-2) (hereinafter also referred to as "compound (III-2)"). Moreover, since the compound (III-1) and the compound (III-2) are reacted at the expected position, (V1') and (V2') may have a protecting group such as an ethoxycarbonyl group at a position where the reaction is not expected After the reaction, the desired pyrrole compound (V1) and pyrrole compound (V2) can be produced by deprotection.
R1至R4表示與前述相同的意義; R 1 to R 4 have the same meaning as described above;
T1及T2表示與前述相同的意義]。 T 1 and T 2 have the same meaning as described above].
式(V1’)及式(V2’)之中,R1至R4、T1及T2中的可具有取代基之碳數1至6的1價烴基可列舉如上述者。 In the formula (V1′) and the formula (V2′), the
Y1-Z1 (III-1) Y 1 -Z 1 (III-1)
Y2-Z2 (III-2)[式(III-1)及式(III-2)中, Y 2 -Z 2 (III-2) [In formula (III-1) and formula (III-2),
Y1及Y2表示與前述相同的意義; Y 1 and Y 2 have the same meaning as above;
Z1及Z2分別獨立地表示鹵素原子、硼酸酯基、-B(OH)2、烷基磺酸酯基或芳基磺酸酯基]。 Z 1 and Z 2 each independently represent a halogen atom, a borate group, -B(OH) 2 , an alkylsulfonate group or an arylsulfonate group].
式(III-1)及式(III-2)中,Y1及Y2中的可具有取代基之1價芳香族基、 鹵素原子、可具有取代基之碳數1至6的1價烴基可列舉如上述者。 In formula (III-1) and formula (III-2), the monovalent aromatic group which may have a substituent in Y 1 and Y 2 , a halogen atom, and a monovalent hydrocarbon group having 1 to 6 carbon atoms which may have a substituent As mentioned above.
式(III-1)及式(III-2)中,Z1及Z2中的鹵素原子、硼酸酯基、烷基磺酸酯基或芳基磺酸酯基可列舉如上述者。 In the formula (III-1) and the formula (III-2), the halogen atom, the borate group, the alkylsulfonate group or the arylsulfonate group in Z 1 and Z 2 may be as described above.
作為吡咯系化合物(V1’)及吡咯系化合物(V2’)係可列舉例如:2,4-二甲基吡咯。 Examples of the pyrrole-based compound (V1') and pyrrole-based compound (V2') include 2,4-dimethylpyrrole.
作為化合物(III-1)及化合物(III-2),可列舉例如:4-己基苯基硼酸等。 Examples of the compound (III-1) and the compound (III-2) include 4-hexylphenylboronic acid and the like.
作為鹵化劑,可列舉如:表示為N-鹵素琥珀醯亞胺(NXS)的N-氟琥珀醯亞胺(NFS)、N-氯琥珀醯亞胺(NCS)、N-溴琥珀醯亞胺(NBS)、N-碘琥珀醯亞胺(NIS)、N-氯酞醯亞胺、N-氯二乙胺、N-氯二丁胺、N-氯環己胺、氯、三氯化碘、三氯化鋁、氯化碲(IV)、氯化鉬、氯化銻、氯化鐵(III)、四氯化鈦、五氯化磷、亞硫醯氯、N-溴酞醯亞胺、N-溴雙三氟甲胺、溴、1,2-二溴乙烷、三溴化硼、溴化銅、溴化銀、第三丁基溴、氧化溴等,較佳為N-鹵素琥珀醯亞胺。 Examples of the halogenating agent include N-fluorosuccinimide (NFS), N-chlorosuccinimide (NFS), N-chlorosuccinimide (NCS), and N-bromosuccinimide (NXS). (NBS), N-iodosuccinimide (NIS), N-chlorophthalimide, N-chlorodiethylamine, N-chlorodibutylamine, N-chlorocyclohexylamine, chlorine, iodine trichloride , Aluminum trichloride, tellurium (IV) chloride, molybdenum chloride, antimony chloride, ferric chloride (III), titanium tetrachloride, phosphorus pentachloride, thionyl chloride, N-bromophthalimide , N-bromobistrifluoromethylamine, bromine, 1,2-dibromoethane, boron tribromide, copper bromide, silver bromide, tertiary butyl bromide, bromine oxide, etc., preferably N-halogen Succinimide.
製造吡咯系化合物(V1)及吡咯系化合物(V2)的步驟中,使吡咯系化合物(V1’)或吡咯系化合物(V2’)與鹵化劑反應所得之反應產物與化合物(III-1)或化合物(III-2)的反應,較佳係在鈀催化劑存在下或鎳催化劑存在下進行偶合的方法,最佳係在鈀催化劑存在下進行偶合的方法。作為鈀催化劑及鎳催化劑,可列舉如上述者。 In the steps of producing the pyrrole-based compound (V1) and the pyrrole-based compound (V2), the reaction product obtained by reacting the pyrrole-based compound (V1') or the pyrrole-based compound (V2') with a halogenating agent and the compound (III-1) or The reaction of the compound (III-2) is preferably a method of coupling in the presence of a palladium catalyst or a nickel catalyst, and most preferably a method of coupling in the presence of a palladium catalyst. Examples of the palladium catalyst and nickel catalyst include those mentioned above.
在鈀催化劑存在下進行吡咯系化合物(V1’)或吡咯系化合物(V2’)與鹵化劑的反應產物與化合物(III-1)或化合物(III-2)的反應,藉由鹵化劑導入反應產物的取代基為鹵素原子的情況,化合物(III-1)中的Z1或化合物(III-2)中的Z2之較佳者係分別獨立地為硼酸酯基或-B(OH)2。在鎳催化劑存在下進行上述反應,藉由鹵化劑導入反應產物的取代基為鹵素原子的情況,較佳者係Z1及Z2分別獨立 地為鹵素原子。又,在鈀催化劑存在下進行上述反應,以一般方法將藉由鹵化劑導入反應產物的取代基轉換成硼酸酯基或-B(OH)2的情況,較佳者係Z1及Z2分別獨立地為烷基磺酸酯基或芳基磺酸酯基。 The reaction between the reaction product of the pyrrole-based compound (V1') or the pyrrole-based compound (V2') and the halogenating agent with the compound (III-1) or the compound (III-2) is carried out in the presence of a palladium catalyst, and the reaction is introduced by the halogenating agent When the substituent of the product is a halogen atom, Z 1 in the compound (III-1) or Z 2 in the compound (III-2) is preferably a borate group or -B(OH) independently 2 . When the above reaction is carried out in the presence of a nickel catalyst and the substituent introduced into the reaction product by a halogenating agent is a halogen atom, it is preferred that Z 1 and Z 2 are each independently a halogen atom. In addition, when the above reaction is carried out in the presence of a palladium catalyst and the substituent introduced into the reaction product by a halogenating agent is converted into a borate group or -B(OH) 2 by a general method, Z 1 and Z 2 are preferred Each is independently an alkylsulfonate group or an arylsulfonate group.
在吡咯系化合物(V1’)或吡咯系化合物(V2’)與鹵化劑的反應中,相對於吡咯系化合物(V1’)或吡咯系化合物(V2’)1莫耳,較佳者係鹵化劑為1莫耳以上5莫耳以下,更佳者係1.05莫耳以上3莫耳以下。 In the reaction of a pyrrole-based compound (V1') or a pyrrole-based compound (V2') with a halogenating agent, it is preferably a halogenating agent relative to 1 mole of the pyrrole-based compound (V1') or the pyrrole-based compound (V2'). It is 1 mole or more and 5 moles or less, more preferably 1.05 moles or more and 3 moles or less.
反應溫度較佳為-80℃至溶劑的沸點。反應時間較佳為1小時至20小時,更佳為3小時至15小時。 The reaction temperature is preferably -80°C to the boiling point of the solvent. The reaction time is preferably 1 hour to 20 hours, and more preferably 3 hours to 15 hours.
從產率的觀點來看,反應較佳係在有機溶劑中進行。作為有機溶劑,可列舉如上述所例示者。有機溶劑的使用量,相對於吡咯系化合物(V1’)或吡咯系化合物(V2’)1質量份,較佳為5質量份以上100質量份以下,更佳為8質量份以上50質量份以下。 From the viewpoint of yield, the reaction is preferably carried out in an organic solvent. Examples of the organic solvent include those exemplified above. The amount of the organic solvent used is preferably 5 parts by mass or more and 100 parts by mass or less, and more preferably 8 parts by mass or more and 50 parts by mass or less based on 1 part by mass of the pyrrole-based compound (V1') or the pyrrole-based compound (V2'). .
從反應混合物取得屬於目標化合物之吡咯系化合物(V1’)或吡咯系化合物(V2’)與鹵化劑之反應產物的方法並無特別限定,可採用習知的各種手法,可列舉如上述方法。 The method for obtaining the reaction product of the pyrrole-based compound (V1') or the pyrrole-based compound (V2') and the halogenating agent belonging to the target compound from the reaction mixture is not particularly limited, and various conventional methods can be used, and the methods described above can be cited.
吡咯系化合物(V1’)與鹵化劑之反應產物及化合物(III-1)的反應中,化合物(III-1)的使用量,相對於吡咯系化合物(V1’)1莫耳,較佳為1莫耳以上5莫耳以下,更佳為1.1莫耳以上3莫耳以下。 In the reaction between the reaction product of the pyrrole-based compound (V1') and the halogenating agent and the compound (III-1), the amount of the compound (III-1) used is preferably 1 mole relative to the pyrrole-based compound (V1'). 1 mol or more and 5 mol or less, more preferably 1.1 mol or more and 3 mol or less.
吡咯系化合物(V2’)與鹵化劑的反應產物及化合物(III-2)的反應中,化合物(III-2)的使用量,相對於吡咯系化合物(V2’)1莫耳,較佳為1莫耳以上5莫耳以下,更佳為1.1莫耳以上3莫耳以下。 In the reaction between the reaction product of the pyrrole-based compound (V2') and the halogenating agent and the compound (III-2), the amount of the compound (III-2) used is preferably 1 mole relative to the pyrrole-based compound (V2'). 1 mol or more and 5 mol or less, more preferably 1.1 mol or more and 3 mol or less.
反應溫度較佳為30℃至180℃,更佳為80℃至140℃。反應時間較佳為1小時至20小時,更佳為3小時至15小時。 The reaction temperature is preferably 30°C to 180°C, and more preferably 80°C to 140°C. The reaction time is preferably 1 hour to 20 hours, and more preferably 3 hours to 15 hours.
從反應混合物取得屬於目標化合物之吡咯系化合物(V1)或吡咯系化合物(V2)的方法並無特別限定,可採用習知的各種手法,可列舉如上述方法。 The method for obtaining the pyrrole-based compound (V1) or the pyrrole-based compound (V2) belonging to the target compound from the reaction mixture is not particularly limited, and various conventional methods can be used, and the methods described above can be cited.
(化合物(I)的製造方法[4]) (Production method of compound (I) [4])
說明本發明之化合物(I)中Y1為可具有取代基之1價芳香族基、Y2為鹵素原子之情況的化合物(以下亦稱為「化合物(Ic)」))的製造方法。 The method for producing the compound (I) of the present invention where Y 1 is a monovalent aromatic group which may have a substituent and Y 2 is a halogen atom (hereinafter also referred to as "compound (Ic)") will be described.
化合物(Ic),可藉由在上述式(Ib)所示之化合物的X2b為氫原子的化合物中,將該X2b表示之氫原子鹵化來製造。鹵化可使用例如上述鹵化劑來進行。 Compound (Ic), X 2b may be by the compound of the above formula (Ib) as shown in the hydrogen atom, the hydrogen atom of the halide X 2b represents produced. Halogenation can be performed using, for example, the above-mentioned halogenating agent.
(化合物(II)的製造方法(1)) (Production method (1) of compound (II))
本發明之化合物(II)的製造方法係例如在化合物(II)為式(II)中的X1及X2為鹵素原子之化合物(以下亦稱為「化合物(IIc)」)的情況,可包含下述兩個步驟:使上述式(IV)所示之方酸、上述吡咯系化合物(V1’)與吡咯系化合物(V2’)反應,得到下述式(II’)所示之化合物(以下亦稱為「化合物(II’)」)的步驟、以及使化合物(II’)與鹵化劑反應而得到化合物(IIc)的步驟。 The production method of the compound (II) of the present invention is, for example, in the case where the compound (II) is a compound in which X 1 and X 2 in the formula (II) are halogen atoms (hereinafter also referred to as "compound (IIc)"), It includes the following two steps: reacting the squaric acid represented by the above formula (IV), the pyrrole-based compound (V1′) and the pyrrole-based compound (V2′) to obtain the compound represented by the following formula (II′) ( Hereinafter also referred to as "compound (II')") and the step of reacting compound (II') with a halogenating agent to obtain compound (IIc).
R1至R4分別獨立地表示氫原子或可具有取代基之碳數1至6的1價烴基; R 1 to R 4 independently represent a hydrogen atom or a
T1及T2分別獨立地表示氫原子或可具有取代基之碳數1至6的1價烴基]。 T 1 and T 2 each independently represent a hydrogen atom or a
式(II’)中,R1至R4、T1及T2中的可具有取代基之碳數1至6的1價烴基可列舉如上述者。 In the formula (II′), the
作為鹵化劑,可列舉如上述者。 Examples of the halogenating agent include those mentioned above.
作為上述化合物(II’),可列舉例如下式表示的化合物。 Examples of the compound (II') include compounds represented by the following formula.
在使方酸、吡咯系化合物(V1’)與吡咯系化合物(V2’)反應的步驟中,方酸的使用量,相對於吡咯系化合物(V1’)及吡咯系化合物(V2’)總計1莫耳,較佳為0.45莫耳以上0.6莫耳以下,更佳為0.47莫耳以上0.51莫耳以下。 In the step of reacting the squaric acid, the pyrrole-based compound (V1') and the pyrrole-based compound (V2'), the amount of squaric acid used is 1 in total relative to the pyrrole-based compound (V1') and the pyrrole-based compound (V2') Molar is preferably 0.45 mol or more and 0.6 mol or less, more preferably 0.47 mol or more and 0.51 mol or less.
吡咯系化合物(V2’)的使用量,相對於吡咯系化合物(V1’)1莫耳,較佳為1莫耳以上1.5莫耳以下。 The amount of the pyrrole compound (V2') used is preferably 1 mole or more and 1.5 mole or less relative to 1 mole of the pyrrole compound (V1').
反應溫度較佳為30℃至180℃,更佳為80℃至140℃。反應時間較佳為1小時至20小時,更佳為3小時至15小時。 The reaction temperature is preferably 30°C to 180°C, and more preferably 80°C to 140°C. The reaction time is preferably 1 hour to 20 hours, and more preferably 3 hours to 15 hours.
從產率的觀點來看,反應較佳係在有機溶劑中進行。作為有機溶劑,可使用上述之中例示者。有機溶劑的使用量,相對於吡咯系化合物(V1’)及吡咯系化合物(V2’)總計1質量份,較佳為5質量份以上200質量份以下,更佳為8質量份以上100質量份以下。 From the viewpoint of yield, the reaction is preferably carried out in an organic solvent. As the organic solvent, those exemplified above can be used. The amount of the organic solvent used is preferably 1 part by mass or more and 200 parts by mass or less, more preferably 8 parts by mass or more and 100 parts by mass relative to the total 1 part by mass of the pyrrole-based compound (V1') and the pyrrole-based compound (V2'). the following.
從反應混合物取得屬於目標化合物之化合物(II’)的方法並無特別限定,可採用習知的各種手法,例如可使用上述方法。 The method for obtaining the compound (II') belonging to the target compound from the reaction mixture is not particularly limited, and various conventional methods can be used, and for example, the above-mentioned method can be used.
化合物(II’)與鹵化劑的反應,相對於化合物(II’)1莫耳,較佳係使鹵化劑為2莫耳以上6莫耳以下,更佳為2.2莫耳以上5莫耳以下。 反應溫度較佳為-80℃至溶劑的沸點。反應時間較佳為1小時至20小時,更佳為3小時至15小時。 The reaction of the compound (II') with the halogenating agent is preferably such that the halogenating agent is 2 mol or more and 6 mol or less, more preferably 2.2 mol or more and 5 mol or less with respect to 1 mol of the compound (II'). The reaction temperature is preferably -80°C to the boiling point of the solvent. The reaction time is preferably 1 hour to 20 hours, and more preferably 3 hours to 15 hours.
從產率的觀點來看,反應較佳係在有機溶劑中進行。作為有機溶劑,可使用上述中例示者。有機溶劑的使用量,相對於化合物(II’)1質量份,較佳為5質量份以上200質量份以下,更佳為10質量份以上100質量份以下。 From the viewpoint of yield, the reaction is preferably carried out in an organic solvent. As the organic solvent, those exemplified above can be used. The amount of the organic solvent used is preferably 5 parts by mass or more and 200 parts by mass or less, and more preferably 10 parts by mass or more and 100 parts by mass or less with respect to 1 part by mass of the compound (II').
從反應混合物取得屬於目標化合物之化合物(IIc)的方法並無特別限定,可採用習知的各種手法,例如可使用上述方法。 The method for obtaining the compound (IIc) belonging to the target compound from the reaction mixture is not particularly limited, and various conventional methods can be used, and for example, the above-mentioned method can be used.
(化合物(II)的製造方法(2)) (Production method (2) of compound (II))
本發明之化合物(II)的製造方法係在式(II)中X1及X2為硼酸酯基或-B(OH)2的化合物(以下亦稱為「化合物(IId)」)的情況,可列舉如:使化合物(IIc)[式(II)中X1及X2為鹵素原子的化合物]與鎂切片反應而調製格林納(Grignard)中間體,再使2-異丙氧基-4,4,5,5-四甲基-1,3,2-二氧雜硼烷等與其作用的方法;於鹼的存在下,使用鈀催化劑使化合物(IIc)與雙(頻哪醇酯)二硼反應,藉此進行硼酸酯化的方法;使三甲氧基硼烷或三異丙氧基硼烷等作用後藉由水解而硼氧化的方法等。 The production method of the compound (II) of the present invention is in the case where X 1 and X 2 in the formula (II) are a borate group or a compound of -B(OH) 2 (hereinafter also referred to as "compound (IId)") , For example, the compound (IIc) [the compound of formula (II) where X 1 and X 2 are halogen atoms] is reacted with a magnesium slice to prepare a Grignard intermediate, and then 2-isopropoxy- 4,4,5,5-Tetramethyl-1,3,2-dioxaborolane and other methods of its action; in the presence of a base, using a palladium catalyst to make compound (IIc) and bis (pinacol ester ) Diboron reaction, thereby borate esterification; boron oxidation by hydrolysis after trimethoxyborane or triisopropoxyborane, etc.
(光學濾光片) (Optical filter)
化合物(I),可用於例如顯示裝置等的光學濾光片。光學濾光片,通常係由包含具有透光性(較佳為在光學上透明)的熱塑性樹脂或熱硬化性樹脂的組成物所形成的層,例如可成為膜狀物者。光學濾光片,只要具有包含化合物(I)的層(以下亦稱為「色修正層」)即可,其可為色修正層的單層結構所構成之色修正膜,亦可為具有包含色修正層之多層結構的積層體。光學濾光片為多層結構的情況,可含有1層的色修正層,亦可含有2層以上的色修正層,2層以上的層所包含的化合物(I)可彼此相同,亦可彼此不同。 The compound (I) can be used for optical filters such as display devices. The optical filter is usually a layer formed of a composition containing a thermoplastic resin or a thermosetting resin having translucency (preferably optically transparent), and can be, for example, a film. The optical filter only needs to have a layer containing the compound (I) (hereinafter also referred to as a "color correction layer"), which may be a color correction film composed of a single-layer structure of the color correction layer, or may include Multilayer structure of the color correction layer. When the optical filter has a multi-layer structure, it may contain one color correction layer or two or more color correction layers, and the compound (I) contained in the two or more layers may be the same as or different from each other .
光學濾光片為積層體的情況,色修正層可為接著層,亦可為接著層以外的樹脂層(以下簡稱為「樹脂層」)。色修正層為接著層的情況,可為將光學濾光片所包含的2個層互相貼合者,亦可為用以將光學濾光片貼合於例如影像顯示元件等其他構件者。接著層可為以接著劑組成物所形成的接著劑層、以黏著劑組成物所形成的黏著劑層、或以接著劑組成物及黏著劑組成物所形成的層。 When the optical filter is a laminate, the color correction layer may be an adhesive layer or a resin layer other than the adhesive layer (hereinafter simply referred to as "resin layer"). When the color correction layer is an adhesive layer, the two layers included in the optical filter may be bonded to each other, or may be used to bond the optical filter to other members such as image display elements. The adhesive layer may be an adhesive layer formed with an adhesive composition, an adhesive layer formed with an adhesive composition, or a layer formed with an adhesive composition and an adhesive composition.
色修正層為單層結構之光學濾光片(色修正膜)的情況,或是為多層結構之光學濾光片中接著層以外之樹脂層的情況,使色修正膜或樹脂層含有化合物(I)的方法並無特別限定。例如,可採用[i]與成為色修正膜或樹脂層的樹脂揉合並加熱成形為膜狀的方法、[ii]使成為色修正膜或樹脂層的樹脂或該樹脂之單體與化合物(I)分散或溶解於有機溶劑,再藉由澆鑄法等成形為膜狀的方法。又,[iii]亦可將使化合物(I)分散或溶解於黏結劑樹脂或有機溶劑的塗布液塗布於樹脂基材膜,而將其作為樹脂層,亦可從該樹脂層將樹脂基材膜剝離而作為色修正膜。色修正膜及樹脂層的厚度並無特別限定,可為例如1μm至200μm。 When the color correction layer is a single-layer optical filter (color correction film), or when it is a resin layer other than the adhesive layer in the multi-layer optical filter, the color correction film or resin layer contains a compound ( The method of I) is not particularly limited. For example, [i] a method of kneading with a resin that becomes a color correction film or a resin layer and heat-forming into a film, [ii] a resin that becomes a color correction film or a resin layer, or a monomer and compound of the resin (I ) A method of dispersing or dissolving in an organic solvent, and then forming into a film by casting. In addition, [iii] a coating liquid that disperses or dissolves the compound (I) in a binder resin or an organic solvent may be applied to the resin base film and used as a resin layer, or the resin base may be applied from the resin layer The film is peeled off and used as a color correction film. The thickness of the color correction film and the resin layer is not particularly limited, and may be, for example, 1 μm to 200 μm.
色修正膜或樹脂層含有化合物(I)的情況,其含量無特別限定。例如,相對於成為色修正膜或樹脂層的基質聚合物100質量份,可使化合物(I)為0.001質量份以上,較佳為0.02質量份以上,更佳為0.05質量份以上,又,可為10質量份以下,較佳為3質量份以下,更佳為0.5質量份以下。 When the color correction film or the resin layer contains the compound (I), its content is not particularly limited. For example, the compound (I) may be 0.001 parts by mass or more, preferably 0.02 parts by mass or more, and more preferably 0.05 parts by mass or more with respect to 100 parts by mass of the matrix polymer serving as the color correction film or resin layer. It is 10 parts by mass or less, preferably 3 parts by mass or less, and more preferably 0.5 parts by mass or less.
色修正層為接著層的情況,關於使接著層含有化合物(I)的方法並無特別限定,只要在調製成為接著層之接著劑組成物或黏著劑組成物時,添加化合物(I)即可。接著層的厚度並無特別限定,可為例如1μm至100μm。 When the color correction layer is an adhesive layer, the method of containing the compound (I) in the adhesive layer is not particularly limited, as long as the compound (I) is added when preparing the adhesive composition or adhesive composition to be an adhesive layer . The thickness of the next layer is not particularly limited, and may be, for example, 1 μm to 100 μm.
接著層含有化合物(I)的情況,其含量亦無特別限定。例如,相對於接著層所包含的成為接著劑組成物及/或黏著劑組成物之基質聚合物100質量 份,可使化合物(I)為0.01質量份以上,較佳為0.02質量份以上,更佳為0.05質量份以上,又,可為10質量份以下,較佳為5質量份以下,更佳為0.5質量份以下。 When the subsequent layer contains the compound (I), its content is not particularly limited. For example, with respect to 100 parts by mass of the matrix polymer included in the adhesive layer as the adhesive composition and/or adhesive composition, the compound (I) may be 0.01 parts by mass or more, preferably 0.02 parts by mass or more, and more It is preferably 0.05 parts by mass or more, and may be 10 parts by mass or less, preferably 5 parts by mass or less, and more preferably 0.5 parts by mass or less.
光學濾光片,可用於有機電致發光(有機EL)顯示裝置及液晶顯示裝置等顯示裝置,其可貼合於該顯示裝置之影像顯示元件的觀看側而使用。此情況中,光學濾光片較佳係具有接著層與接著層以外的樹脂層,而較佳係接著層及樹脂層之中的至少一者為包含化合物(I)的色修正層。 The optical filter can be used for display devices such as organic electroluminescence (organic EL) display devices and liquid crystal display devices, and can be used by being attached to the viewing side of the image display element of the display device. In this case, the optical filter preferably has an adhesive layer and a resin layer other than the adhesive layer, and preferably at least one of the adhesive layer and the resin layer is a color correction layer containing the compound (I).
光學濾光片為積層體的情況,其積層結構並無特別限定,可具有例如第1圖(a)及(b)所示的積層結構。第1圖(a)及(b)係顯示光學濾光片之一例的概略剖面圖。第1圖(a)所示的光學濾光片10可使用於有機EL顯示裝置。光學濾光片10,例如,可依序包含影像顯示元件用黏著劑層11、相位差膜12、黏著劑層13、第1保護膜14、偏光膜15、第2保護膜16。影像顯示元件用黏著劑層11及黏著劑層13皆相當於上述接著層,相位差膜12、第1保護膜14、偏光膜15及第2保護膜16皆相當於上述樹脂層。 When the optical filter is a laminate, the laminate structure is not particularly limited, and it may have, for example, the laminate structure shown in (a) and (b) of FIG. 1. Fig. 1 (a) and (b) are schematic cross-sectional views showing an example of an optical filter. The
光學濾光片10中的第1保護膜14、偏光膜15及第2保護膜16成為偏光板,第1保護膜14及第2保護膜16,在與偏光膜15的貼合面側亦可具有接著層。影像顯示元件用黏著劑層11,係用以貼合於有機EL顯示裝置的屬於影像顯示元件之包含有機EL元件的發光層。影像顯示元件用黏著劑層11中與相位差膜12相反側的面上,亦可設置圖中未顯示的分隔片(剝離膜)。 In the
第1圖(b)所示的光學濾光片20可用於液晶顯示裝置。光學濾光片20,例如可依序包含影像顯示元件用黏著劑層21、第1保護膜24、偏光膜25、第2保護膜26。影像顯示元件用黏著劑層21相當於上述接著層,第1保護膜24、偏光膜25、及第2保護膜26皆相當於上述樹脂層。 The
光學濾光片20中的第1保護膜24、偏光膜25、及第2保護膜26成為偏光板,第1保護膜24及第2保護膜26,在與偏光膜25的貼合面側亦可具有接著層。影像顯示元件用黏著劑層21,係用以貼合於液晶顯示裝置的屬於影像顯示元件之液晶單元。在影像顯示元件用黏著劑層21之與第1保護膜24相反側的面可設置圖中未顯示的分隔片(剝離膜)。 In the
成為第1圖(a)及(b)所示之光學濾光片10及20的樹脂層及接著層的至少任一者可包含化合物(I)。第1圖(a)所示的光學濾光片10中,例如,影像顯示元件用黏著劑層11、黏著劑層13、第1保護膜14、第2保護膜15之中的1個以上可包含上述化合物(I)。第1圖(b)所示的光學濾光片20中,例如,影像顯示元件用黏著劑層21、第1保護膜24、第2保護膜25之中的1個以上可包含化合物(I)。 At least any one of the resin layers and the adhesive layers of the
第1圖(a)及(b)所示的光學濾光片10及20僅為一例,亦可具有上述以外的積層結構。例如,在第2保護膜16、26中與偏光膜15、25相反側的面上,亦可具有由附防眩功能之膜或附防止表面反射功能之膜等所構成的層。又,第1保護膜15、25亦可具有作為相位差膜的功能,第2保護膜16、26亦可具有防眩功能或防止表面反射功能、相位差膜的功能等。再者,除了成為第1圖(a)及(b)所示之光學濾光片10及20的各層以外,亦可另外在任意的位置設置包含化合物(I)的色修正層。 The optical filters 10 and 20 shown in (a) and (b) of FIG. 1 are only examples, and may have a laminated structure other than the above. For example, the surfaces of the second
上述光學濾光片,因為包含化合物(I),因此可吸收580nm附近(575至590nm)的光(較佳係最大吸收波長為580nm的光)。藉此,藉由在顯示裝置的影像顯示元件的觀看側積層上述光學濾光片,可從入射光學濾光片的光吸收在580nm附近(575至590nm)的波長區域具有吸收波長的光,而穿透光學濾光片的光,相較於入射光學濾光片的光,可提升綠色光及紅色光的色純度。未使用上述 光學濾光片的以往的顯示裝置,綠色光與紅色光的分離性並不充分,但使用了上述光學濾光片的顯示裝置,可期待綠色光與紅色光的分離性提升。 Since the above optical filter contains the compound (I), it can absorb light in the vicinity of 580 nm (575 to 590 nm) (preferably light having a maximum absorption wavelength of 580 nm). With this, by stacking the above optical filter on the viewing side of the image display element of the display device, light having an absorption wavelength in the wavelength region around 580 nm (575 to 590 nm) can be absorbed from the light incident on the optical filter, and The light passing through the optical filter can enhance the color purity of green light and red light compared to the light entering the optical filter. A conventional display device that does not use the above optical filter has insufficient separation between green light and red light, but a display device using the above optical filter can be expected to improve the separation between green light and red light.
以下詳述成為光學濾光片的各構件。 Hereinafter, each member that becomes an optical filter will be described in detail.
(接著層) (Next layer)
作為可用於接著層的接著劑組成物,可列舉例如:水系接著劑、活性能量線硬化型接著劑及該等的組合。作為水系接著劑,可列舉例如:聚乙烯醇系樹脂水溶液、水系雙液型胺基甲酸酯系乳膠接著劑等。活性能量線硬化型接著劑,係藉由照射紫外線等活性能量線而硬化的接著劑,可列舉例如:包含聚合性化合物及光聚合性起始劑者、包含光反應性樹脂者、包含黏合劑樹脂及光反應性交聯劑者等。作為上述聚合性化合物,可列舉如:光硬化性環氧系單體、光硬化性(甲基)丙烯酸系單體、光硬化性胺基甲酸酯系單體等光聚合性單體、及源自該等單體的寡聚物等。作為上述光聚合起始劑,可列舉如:包含照射紫外線等活性能量線而產生中性自由基、陰離子自由基、陽離子自由基這樣的活性種之物質者。另外,本說明書中「(甲基)丙烯酸系」係指「丙烯酸系及甲基丙烯酸系的至少1種」。 Examples of the adhesive composition that can be used for the adhesive layer include water-based adhesives, active energy ray-curable adhesives, and combinations of these. Examples of the water-based adhesive include polyvinyl alcohol-based resin aqueous solutions and water-based two-component urethane-based latex adhesives. The active energy ray-curable adhesive is an adhesive that is hardened by irradiating active energy rays such as ultraviolet rays, and examples thereof include: a polymerizable compound and a photopolymerizable initiator, a photoreactive resin, and an adhesive. Resin and photoreactive crosslinking agent etc. Examples of the polymerizable compound include photopolymerizable monomers such as photocurable epoxy monomers, photocurable (meth)acrylic monomers, and photocurable urethane monomers, and Oligomers derived from such monomers. Examples of the photopolymerization initiator include substances containing active species such as neutral radicals, anionic radicals, and cationic radicals that are generated by irradiation with active energy rays such as ultraviolet rays. In addition, in this specification, "(meth)acrylic system" means "at least 1 type of an acrylic system and a methacrylic system."
作為可用於接著層的黏著劑組成物,可使用以往習知的黏著劑組成物。作為黏著劑組成物,可列舉例如:(甲基)丙烯酸系黏著劑、胺基甲酸酯系黏著劑、聚矽氧系黏著劑、聚酯系黏著劑、聚醯胺系黏著劑、聚醚系黏著劑、氟系黏著劑、橡膠系黏著劑等。又,亦可為能量線硬化型黏著劑、熱硬化型黏著劑等。該等之中,從透明性、黏著力、可靠性等的觀點來看,較佳係使用(甲基)丙烯酸系黏著劑。 As an adhesive composition that can be used for the adhesive layer, a conventionally known adhesive composition can be used. Examples of the adhesive composition include (meth)acrylic adhesives, urethane adhesives, silicone adhesives, polyester adhesives, polyamide adhesives, and polyethers. Adhesives, fluorine adhesives, rubber adhesives, etc. Also, it may be an energy ray-curable adhesive, a thermosetting adhesive, or the like. Among these, from the viewpoint of transparency, adhesion, reliability, etc., it is preferable to use a (meth)acrylic adhesive.
作為丙烯酸系黏著劑,雖無特別限定,但以(甲基)丙烯酸酯為主成分(含有50質量%以上)的聚合物,可為1種的(甲基)丙烯酸酯的均聚物,亦可為 (甲基)丙烯酸酯與其他(甲基)丙烯酸酯等的共聚物。作為(甲基)丙烯酸酯,可列舉如:(甲基)丙烯酸丁酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸甲酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸2-苯氧基乙酯。再者,以該等(甲基)丙烯酸酯為主體的聚合物,亦可與極性單體共聚合。作為極性單體,可列舉例如:(甲基)丙烯酸、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯醯胺、(甲基)丙烯酸2-(N,N-二甲胺基)乙酯、(甲基)丙烯酸縮水甘油酯等具有羧基、羥基、醯胺基、胺基、環氧基等極性官能基的單體。用於丙烯酸系黏著劑的(甲基)丙烯酸系樹脂,可使用重量平均分子量(Mw)為10萬以上者,較佳為60萬以上,一般為250萬以下。 The acrylic adhesive is not particularly limited, but a polymer containing (meth)acrylate as the main component (containing 50% by mass or more) may be a homopolymer of (meth)acrylate, or It may be a copolymer of (meth)acrylate and other (meth)acrylates. Examples of (meth)acrylates include butyl (meth)acrylate, ethyl (meth)acrylate, methyl (meth)acrylate, isooctyl (meth)acrylate, and (meth)acrylic acid. 2-ethylhexyl ester, 2-phenoxyethyl (meth)acrylate. In addition, polymers mainly composed of these (meth)acrylates can also be copolymerized with polar monomers. Examples of polar monomers include (meth)acrylic acid, (meth)acrylic acid 2-hydroxypropyl ester, (meth)acrylic acid 2-hydroxyethyl ester, (meth)acrylamide, (meth)acrylic acid Monomers such as 2-(N,N-dimethylamino) ethyl ester, glycidyl (meth)acrylate and the like having polar functional groups such as carboxyl group, hydroxyl group, amide group, amine group, and epoxy group. The (meth)acrylic resin used for the acrylic adhesive can use a weight average molecular weight (Mw) of 100,000 or more, preferably 600,000 or more, and generally 2.5 million or less.
該等丙烯酸系黏著劑可單獨使用,但通常與交聯劑併用。作為交聯劑,可列舉如:作為2價或多價金屬離子而與羧基之間形成羧酸金屬鹽者、作為胺化合物而與羧基之間形成醯胺鍵者、作為環氧化合物或二醇化合物而與羧基之間形成酯鍵者、作為異氰酸酯化合物而與羧基之間形成醯胺鍵者等。其中,較佳係使用異氰酸酯化合物。 These acrylic adhesives can be used alone, but are usually used in combination with crosslinking agents. Examples of the cross-linking agent include: those that form a metal salt of a carboxylic acid with a carboxyl group as a divalent or multivalent metal ion, those that form an amide bond with a carboxyl group as an amine compound, and epoxy compounds or diols Compounds that form an ester bond with a carboxyl group and those that form an amide bond with a carboxyl group as an isocyanate compound. Among them, isocyanate compounds are preferably used.
異氰酸酯系化合物之中,較佳係使用:苯二甲基二異氰酸酯、甲苯二異氰酸酯或六亞甲基二異氰酸酯;使甘油或三羥甲基丙烷等多元醇與該等異氰酸酯化合物反應而得到的加成物;使該等異氰酸酯化合物成為二聚物、三聚物等的化合物或該等的混合物;以上舉出之異氰酸酯系化合物之2種以上的混合物等。 Among the isocyanate-based compounds, preferably used are: xylylene diisocyanate, toluene diisocyanate or hexamethylene diisocyanate; the addition of polyhydric alcohols such as glycerin or trimethylolpropane and these isocyanate compounds Compounds; compounds that make these isocyanate compounds into dimers, trimers, etc., or mixtures of these; mixtures of two or more of the isocyanate compounds mentioned above.
作為適合的異氰酸酯系化合物,可列舉如:甲苯二異氰酸酯、使多元醇與甲苯二異氰酸酯反應而得到的加成物、甲苯二異氰酸酯的二聚物、及甲苯二異氰酸酯的三聚物,又,六亞甲基二異氰酸酯、使多元醇與六亞甲基二異氰酸酯反應而 得到的加成物、六亞甲基二異氰酸酯的二聚物、及六亞甲基二異氰酸酯的三聚物。 Examples of suitable isocyanate compounds include toluene diisocyanate, an adduct obtained by reacting a polyol with toluene diisocyanate, a dimer of toluene diisocyanate, and a terpolymer of toluene diisocyanate. Methylene diisocyanate, an adduct obtained by reacting a polyol with hexamethylene diisocyanate, a dimer of hexamethylene diisocyanate, and a terpolymer of hexamethylene diisocyanate.
丙烯酸系黏著劑中的交聯劑之含量,相對於(甲基)丙烯酸系樹脂100質量份,通常為0質量份以上5質量份以下,較佳為0.05質量份以上2質量份以下。 The content of the crosslinking agent in the acrylic adhesive is usually 0 parts by mass or more and 5 parts by mass or less, preferably 0.05 parts by mass or more and 2 parts by mass or less with respect to 100 parts by mass of the (meth)acrylic resin.
丙烯酸系黏著劑可更含有矽烷化合物。丙烯酸系黏著劑含有矽烷化合物時,可提高所得黏著劑層與玻璃基板等光學構件之密合性。 The acrylic adhesive may further contain a silane compound. When the acrylic adhesive contains a silane compound, the adhesion between the resulting adhesive layer and optical members such as glass substrates can be improved.
作為矽烷化合物,可列舉例如:乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基參(2-甲氧基乙氧基)矽烷、3-胺基丙基三乙氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基甲基二甲氧基矽烷、3-氯丙基甲基二甲氧基矽烷、3-氯丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-巰基丙基三甲氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、3-環氧丙氧基丙基二甲氧基甲基矽烷、3-環氧丙氧基丙基乙氧基二甲基矽烷等。亦可使用2種以上的矽烷化合物。 Examples of the silane compound include vinyl trimethoxy silane, vinyl triethoxy silane, vinyl ginseng (2-methoxyethoxy) silane, 3-aminopropyl triethoxy silane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethyl Oxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyl Propyl triethoxysilane, 3-glycidoxypropyl dimethoxymethyl silane, 3-glycidoxypropyl ethoxy dimethyl silane, etc. Two or more kinds of silane compounds can also be used.
矽烷化合物可為聚矽氧寡聚物型。若以(單體)寡聚物的形式表示聚矽氧寡聚物,則可列舉例如:3-巰基丙基三甲氧基矽烷-四甲氧基矽烷共聚物、巰基甲基三甲氧基矽烷-四甲氧基矽烷共聚物、3-環氧丙氧基丙基三甲氧基矽烷-四甲氧基矽烷共聚物、3-甲基丙烯醯氧基丙基三甲氧基矽烷-四甲氧基矽烷共聚物、3-丙烯醯氧基丙基三甲氧基矽烷-四甲氧基矽烷共聚物、乙烯基三甲氧基矽烷-四甲氧基矽烷共聚物等。 The silane compound may be a polysiloxane oligomer type. If the polysiloxane oligomer is represented in the form of (monomer) oligomer, for example: 3-mercaptopropyltrimethoxysilane-tetramethoxysilane copolymer, mercaptomethyltrimethoxysilane- Tetramethoxysilane copolymer, 3-glycidoxypropyltrimethoxysilane-tetramethoxysilane copolymer, 3-methacryloxypropyltrimethoxysilane-tetramethoxysilane Copolymers, 3-propenyl propylpropyl trimethoxysilane-tetramethoxysilane copolymers, vinyl trimethoxysilane-tetramethoxysilane copolymers, etc.
丙烯酸系黏著劑中的矽烷化合物之含量,相對於(甲基)丙烯酸系樹脂100質量份,一般為0.01質量份以上10質量份以下,較佳為0.05質量份以上5 質量份以下,更佳為0.1質量份以上2質量份以下。矽烷化合物的含量若在0.01質量份以上,則容易得到黏著劑層與玻璃基板等光學構件之密合性提升的效果。又,矽烷化合物的含量在10質量份以下時,則可抑制矽烷化合物從黏著劑層滲出。 The content of the silane compound in the acrylic adhesive is generally 0.01 parts by mass or more and 10 parts by mass or less, preferably 0.05 parts by mass or more and 5 parts by mass or less, relative to 100 parts by mass of the (meth)acrylic resin. 0.1 parts by mass or more and 2 parts by mass or less. If the content of the silane compound is 0.01 parts by mass or more, the effect of improving the adhesion between the adhesive layer and the optical member such as the glass substrate is easily obtained. In addition, when the content of the silane compound is 10 parts by mass or less, the silane compound can be suppressed from seeping out from the adhesive layer.
丙烯酸系黏著劑中,亦可更含有離子性化合物作為用以賦予抗靜電性的抗靜電劑。離子性化合物,係具有無機陽離子或有機陽離子與無機陰離子或有機陰離子的化合物。丙烯酸系黏著劑亦可含有2種以上的離子性化合物。 The acrylic adhesive may further contain an ionic compound as an antistatic agent to impart antistatic properties. Ionic compounds are compounds with inorganic cations or organic cations and inorganic anions or organic anions. The acrylic adhesive may also contain two or more ionic compounds.
作為無機陽離子,可列舉如:鋰陽離子[Li+]、鈉陽離子[Na+]、鉀陽離子[K+]等鹼金屬離子,或鈹陽離子[Be2+]、鎂陽離子[Mg2+]、鈣陽離子[Ca2+]等鹼土金屬離子等。 Examples of inorganic cations include alkali metal ions such as lithium cation [Li + ], sodium cation [Na + ], potassium cation [K + ], or beryllium cation [Be 2+ ], magnesium cation [Mg 2+ ], Calcium cation [Ca 2+ ] and other alkaline earth metal ions.
作為有機陽離子,可列舉如:咪唑鎓陽離子、吡啶鎓陽離子、吡咯2啶鎓陽離子、銨陽離子、鋶陽離子、鏻陽離子等。 Examples of organic cations include imidazolium cations, pyridinium cations, pyrrolidinium cations, ammonium cations, ammonium cations, and phosphonium cations.
作為無機陰離子,可列舉如:氯陰離子[Cl-]、溴陰離子[Br-]、碘陰離子[I-]、四氯鋁酸根陰離子[AlCl4 -]、七氯二鋁酸根陰離子[Al2Cl7 -]、四氟硼酸根陰離子[BF4 -]、六氟磷酸根陰離子[PF6 -]、過氯酸根陰離子[ClO4 -]、硝酸根陰離子[NO3 -]、六氟砷酸根陰離子[AsF6 -]、六氟銻酸根陰離子[SbF6 -]、六氟鈮酸根陰離子[NbF6 -]、六氟鉭酸根陰離子[TaF6 -]、二氰胺陰離子[(CN)2N-]等。 Examples of the inorganic anion include such as: chlorine anions [Cl -], bromine anion [Br -], iodide anion [I -], tetrachloroaluminate anion [AlCl 4 -], heptachlor aluminum anions [Al 2 Cl 7--], tetrafluoroborate anion [BF 4 -], hexafluorophosphate anions [PF 6 -], perchloric acid anion [ClO 4 -], nitrate anions [NO 3 -], hexafluoroarsenate anion [AsF 6 -], hexafluoroantimonate anion [SbF 6 -], niobium hexafluorophosphate anion [NbF 6 -], six tantalum fluoride anion [TaF 6 -], dicyanamide anion [(CN) 2 N - ]Wait.
作為有機陰離子,可列舉如:乙酸根陰離子[CH3COO-]、三氟乙酸根陰離子[CF3COO-]、甲烷磺酸根陰離子[CH3SO3 -]、三氟甲烷磺酸根陰離子[CF3SO3 -]、對甲苯磺酸根陰離子[p-CH3C6H4SO3 -]、雙(氟磺醯基)亞胺陰離子[(FSO2)2N-]、雙(三氟甲烷磺醯基)亞胺陰離子[(CF3SO2)2N-]、參(三氟甲烷磺醯基)甲烷陰離子[(CF3SO2)3C-]、二甲基次膦酸根陰離子[(CH3)2POO-]、(聚)氫氟氟化物 陰離子[F(HF)n -](n為1以上3以下左右)、硫氰基陰離子[SCN-]、全氟丁烷磺酸根陰離子[C4F9SO3 -]、雙(五氟乙烷磺醯基)亞胺陰離子[(C2F5SO2)2N-]、全氟丁酸根陰離子[C3F7COO-]、(三氟甲烷磺醯基)(三氟甲烷羰基)亞胺陰離子[(CF3SO2)(CF3CO)N-]等。 Examples of the organic anions include such as: acetate anion [CH 3 COO -], trifluoroacetate anion [CF 3 COO -], methane sulfonate anion [CH 3 SO 3 -], trifluoromethanesulfonate anion [CF 3 SO 3 -], p-toluenesulfonate anion [p-CH 3 C 6 H 4 SO 3 -], bis (sulfo-fluoro-acyl) imide anion [(FSO 2) 2 N - ], bis (trifluoromethane sulfo acyl) imide anion [(CF 3 SO 2) 2 N -], reference (trifluoromethane sulfonic acyl) methane anion [(CF 3 SO 2) 3 C -], dimethyl phosphinate anion [ (CH 3) 2 POO -] , ( poly) hydrogen fluoride anion [F (HF) n -] (n is 1 or about 3 or less), thiocyano anion [SCN -], perfluoro butane sulfonate anion [C 4 F 9 SO 3 - ], bis (pentafluoroethane sulfonic acyl) imide anion [(C 2 F 5 SO 2 ) 2 N -], perfluoro butyrate anion [C 3 F 7 COO -], (trifluoromethane sulfonic acyl) (carbonyl trifluoromethanesulfonyl) imide anion [(CF 3 SO 2) ( CF 3 CO) N -] and the like.
離子性化合物的具體例,可選自上述陽離子成分與陰離子成分的組合。 Specific examples of the ionic compound can be selected from the combination of the aforementioned cationic component and anionic component.
作為具有有機陽離子之離子性化合物的例子,可列舉如:N-辛基吡啶鎓六氟磷酸鹽、N-辛基-4-甲基吡啶鎓六氟磷酸鹽、N-丁基-4-甲基吡啶鎓六氟磷酸鹽、N-癸基吡啶鎓雙(氟磺醯基)亞胺、N-己基吡啶鎓雙(三氟甲烷磺醯基)亞胺、N-辛基吡啶鎓雙(三氟甲烷磺醯基)亞胺等吡啶鎓鹽、1-乙基-3-甲基咪唑鎓六氟磷酸鹽、1-乙基-3-甲基咪唑鎓對甲苯磺酸酯、1-乙基-3-甲基咪唑鎓雙(氟磺醯基)亞胺、1-乙基-3-甲基咪唑鎓雙(三氟甲烷磺醯基)亞胺、1-丁基-3-甲基咪唑鎓甲烷磺酸酯等咪唑鎓鹽;N-丁基-N-甲基吡咯啶鎓六氟磷酸鹽、N-丁基-N-甲基吡咯啶鎓雙(氟磺醯基)亞胺、N-丁基-N-甲基吡咯啶鎓雙(三氟甲烷磺醯基)亞胺等吡咯啶鎓鹽;四丁基銨六氟磷酸鹽、四丁基銨對甲苯磺酸鹽等4級銨鹽。 Examples of ionic compounds having organic cations include N-octylpyridinium hexafluorophosphate, N-octyl-4-methylpyridinium hexafluorophosphate, and N-butyl-4-methyl Pyridinium hexafluorophosphate, N-decylpyridinium bis(fluorosulfonyl)imide, N-hexylpyridinium bis(trifluoromethanesulfonyl)imide, N-octylpyridinium bis(tris (Fluoromethanesulfonyl) imine and other pyridinium salts, 1-ethyl-3-methylimidazolium hexafluorophosphate, 1-ethyl-3-methylimidazolium p-toluenesulfonate, 1-ethyl -3-methylimidazolium bis(fluorosulfonyl)imide, 1-ethyl-3-methylimidazolium bis(trifluoromethanesulfonyl)imide, 1-butyl-3-methylimidazole Imidazolium salts such as onium methanesulfonate; N-butyl-N-methylpyrrolidinium hexafluorophosphate, N-butyl-N-methylpyrrolidinium bis(fluorosulfonyl)imide, N -Butyl-N-methylpyrrolidinium bis(trifluoromethanesulfonyl)imide and other pyrrolidinium salts; tetrabutylammonium hexafluorophosphate, tetrabutylammonium p-toluenesulfonate and other 4 grade ammonium salt.
作為具有無機陽離子之離子性化合物的例子,可列舉如:溴化鋰、碘化鋰、六氟磷酸鈉等。 Examples of ionic compounds having inorganic cations include lithium bromide, lithium iodide, and sodium hexafluorophosphate.
離子性化合物,從保持抗靜電性能的觀點來看,在室溫中較佳為固體。離子性化合物較佳係具有30℃以上、進一步為35℃以上的熔點。另一方面,若其熔點太高,則與(甲基)丙烯酸系樹脂的相溶性變差,因此離子性化合物的熔點較佳為90℃以下,更佳為70℃以下,再佳為小於50℃。 The ionic compound is preferably solid at room temperature from the viewpoint of maintaining antistatic properties. The ionic compound preferably has a melting point of 30°C or higher, and further 35°C or higher. On the other hand, if the melting point is too high, the compatibility with the (meth)acrylic resin deteriorates, so the melting point of the ionic compound is preferably 90°C or lower, more preferably 70°C or lower, and even more preferably less than 50 ℃.
丙烯酸系黏著劑中的離子性化合物的含量,相對於(甲基)丙烯酸系樹脂100質量份,較佳為0.1質量份以上8質量份以下,更佳為0.2質量份以上6質量份以下,再佳為0.5質量份以上5質量份以下,特佳為1質量份以上5質量份以下。離子性化合物的含量在0.1質量份以上時,有利於提升抗靜電性能,而在8質量份以下則有利於維持黏著劑層的耐久性。 The content of the ionic compound in the acrylic adhesive is preferably 0.1 parts by mass or more and 8 parts by mass or less, more preferably 0.2 parts by mass or more and 6 parts by mass or less with respect to 100 parts by mass of the (meth)acrylic resin. It is preferably 0.5 parts by mass or more and 5 parts by mass or less, and particularly preferably 1 part by mass or more and 5 parts by mass or less. When the content of the ionic compound is 0.1 parts by mass or more, it is beneficial to improve antistatic performance, and 8 parts by mass or less is beneficial to maintain the durability of the adhesive layer.
接著劑組成物或黏著劑組成物中,亦可更摻合各種添加劑。作為添加劑,可列舉如:重工劑、黏著性賦予樹脂、抗氧化劑、紫外線吸收劑、消泡劑、抗腐蝕劑、微粒子等光擴散劑等。 In the adhesive composition or the adhesive composition, various additives may be further blended. Examples of the additives include heavy-duty agents, adhesiveness-imparting resins, antioxidants, ultraviolet absorbers, defoamers, anticorrosive agents, and light diffusing agents such as fine particles.
(樹脂層) (Resin layer)
作為樹脂層,可列舉如偏光膜;設置用以保護偏光膜等表面的保護膜;相位差膜;相位差膜以外的光學補償膜;表面具有凹凸形狀的附防眩功能的膜、附防止表面反射功能的膜;表面具有反射功能的反射膜;兼具反射功能與穿透功能的半穿透反射膜;光擴散膜;硬塗膜;色修正膜等。光學濾光片中,可包含1種或2種以上的上述樹脂層。 Examples of the resin layer include a polarizing film; a protective film provided to protect the surface of the polarizing film; a retardation film; an optical compensation film other than the retardation film; a film with an anti-glare function and an anti-glare surface having a concave-convex shape Reflective film; reflective film with reflective function on the surface; semi-transparent reflective film with both reflective and penetrating function; light diffusion film; hard coating film; color correction film, etc. The optical filter may contain one kind or two or more kinds of the above resin layers.
作為偏光膜,可列舉如:碘在聚乙烯醇系樹脂層中配向者、或液晶化合物與二色性色素配向者等。 Examples of the polarizing film include those in which iodine is aligned in the polyvinyl alcohol-based resin layer, or those in which a liquid crystal compound and a dichroic dye are aligned, and the like.
在樹脂層為偏光膜以外的情況中,其材料並無特別限定,但可列舉例如:鏈狀聚烯烴系樹脂(聚乙烯系樹脂、聚丙烯系樹脂等)、環狀聚烯烴系樹脂(降莰烯系樹脂等)等聚烯烴系樹脂;三乙醯纖維素、二乙醯纖維素及乙酸丙酸纖維素等纖維素酯系樹脂;聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯等聚酯系樹脂;聚碳酸酯系樹脂;(甲基)丙烯酸、聚(甲基)丙烯酸甲酯等(甲基)丙烯酸系樹脂;聚乙烯醇及聚乙酸乙烯酯等乙烯醇系樹脂;聚苯乙烯系樹脂;該等混合物、共聚 物等。該等樹脂亦可含有下述添加劑之中的1種或2種以上:潤滑劑、塑化劑、分散劑、熱穩定劑、紫外線吸收劑、紅外線吸收劑、抗靜電劑、抗氧化劑、微粒子等光擴散劑等。 In the case where the resin layer is other than the polarizing film, the material is not particularly limited, but examples include chain polyolefin resins (polyethylene resins, polypropylene resins, etc.), and cyclic polyolefin resins (degraded Camphene resins, etc.) and other polyolefin resins; cellulose ester resins such as triethyl cellulose, diethyl cellulose, and cellulose acetate propionate; polyethylene terephthalate, polyethylene naphthalate Polyester resins such as diesters; polycarbonate resins; (meth)acrylic resins such as (meth)acrylic acid and polymethyl (meth)acrylate; vinyl alcohol resins such as polyvinyl alcohol and polyvinyl acetate ; Polystyrene resin; These mixtures, copolymers, etc. These resins may also contain one or more of the following additives: lubricants, plasticizers, dispersants, heat stabilizers, ultraviolet absorbers, infrared absorbers, antistatic agents, antioxidants, microparticles, etc. Light diffuser, etc.
(顯示裝置) (Display device)
上述光學濾光片,可適當地用於有機EL顯示裝置、液晶顯示裝置、無機電致發光(無機EL)顯示裝置、電子發射顯示裝置等顯示裝置。相較於顯示裝置的影像顯示元件,藉由將光學濾光片配置於觀看側,可在入射光學濾光片的光之中,吸收波長580nm附近(575至590nm)的光(較佳係最大吸收波長為580nm的光)。藉此,穿透光學濾光片的光,相較於未穿透光學濾光片的情況,綠色光及紅色光的色純度變高,因此可擴大顯示裝置能夠表現的色域。未使用上述光學濾光片的以往的顯示裝置,綠色光與紅色光的分離性並不充分,而使用了上述光學濾光片的顯示裝置,可期待提升綠色光與紅色光的分離性。 The above optical filter can be suitably used for display devices such as organic EL display devices, liquid crystal display devices, inorganic electroluminescence (inorganic EL) display devices, electron emission display devices, and the like. Compared with the image display element of the display device, by arranging the optical filter on the viewing side, it can absorb the light near the wavelength of 580 nm (575 to 590 nm) among the light incident on the optical filter (preferably the largest Absorbs light with a wavelength of 580nm). As a result, the light passing through the optical filter has higher color purity than the case where it does not pass through the optical filter, so the color gamut that can be expressed by the display device can be expanded. A conventional display device that does not use the above-mentioned optical filter has insufficient separation between green light and red light, but a display device using the above-mentioned optical filter can be expected to improve the separation between green light and red light.
第2圖(a)及(b)係顯示具備光學濾光片的顯示裝置之一例的概略剖面圖。第2圖(a)所示的顯示裝置,係包含第1圖(a)所示的光學濾光片10與含有機EL元件之發光層之影像顯示元件1的有機EL顯示裝置。光學濾光片10,可透過影像顯示元件用黏著劑層11而配置於影像顯示元件1的觀看側。 2 (a) and (b) are schematic cross-sectional views showing an example of a display device provided with an optical filter. The display device shown in FIG. 2(a) is an organic EL display device including the
第2圖(b)所示的顯示裝置,係包含第1圖(b)所示的光學濾光片20與含液晶層的液晶單元之影像顯示元件2的液晶顯示裝置。光學濾光片20可透過影像顯示元件用黏著劑層21而配置於影像顯示元件2的觀看側。 The display device shown in FIG. 2(b) is a liquid crystal display device including the
以下顯示實施例及比較例而更具體說明本發明,但本發明不受該等例所限定。實施例、比較例、適用例、比較適用例中的「%」及「份」,若無另外記載,則為質量%及質量份。 The following shows examples and comparative examples to explain the present invention more specifically, but the present invention is not limited to these examples. In Examples, Comparative Examples, Application Examples, and Comparative Application Examples, "%" and "parts" are% by mass and parts by mass unless otherwise stated.
[化合物的鑑定] [Identification of compounds]
化合物的結構,係進行質量分析(LC;Agilent製1200型,質量;Agilent製LC/MSD型)而鑑定。 The structure of the compound was identified by mass analysis (LC; model 1200 manufactured by Agilent, mass; model LC/MSD manufactured by Agilent).
[最大吸收波長的測量] [Measurement of maximum absorption wavelength]
針對將實施例及比較例中所得之化合物(式(I)所示之化合物)溶解於表1所示之溶劑而得到的溶液,使用紫外可見光光譜儀(V-650DS;日本分光(股)製)(石英單元,光烴長;1cm)測量最大吸收波長。 For a solution obtained by dissolving the compound obtained in the Examples and Comparative Examples (the compound represented by formula (I)) in the solvent shown in Table 1, an ultraviolet-visible light spectrometer (V-650DS; manufactured by Japan Spectroscopy Co., Ltd.) was used. (Quartz unit, photohydrocarbon length; 1cm) Measure the maximum absorption wavelength.
亦針對適用例及比較適用例中所得之黏著劑片,使用上述紫外可見光光譜儀測量最大吸收波長。 For the adhesive sheets obtained in the application examples and the comparative application examples, the maximum absorption wavelength was measured using the above-mentioned ultraviolet-visible light spectrometer.
[實施例1(式(II)所示之化合物)] [Example 1 (compound represented by formula (II))]
將3,4-二羥基-3-環丁烯-1,2-二酮(FUJIFILM Wako Pure Chemical(股)製)3.0份、2,4-二甲基吡咯(東京化成工業(股)製)5.0份、1-丁醇175份及甲苯290份混合。對於所得之混合物,一邊使用Dean-Stark管將所產生的水去除,一邊於溫度110℃攪拌3小時。反應結束後餾除溶劑,加入300份的離子交換水後,過濾並取出所析出之固體。以甲醇/離子交換水將所濾取的固體洗淨。將所得之固體於溫度60℃減壓乾燥12小時,得到式(A-1)所示之化合物4.0份。 3.0 parts of 3,4-dihydroxy-3-cyclobutene-1,2-dione (manufactured by FUJIFILM Wako Pure Chemical Co., Ltd.), 2,4-dimethylpyrrole (manufactured by Tokyo Chemical Industry Co., Ltd.) 5.0 parts, 175 parts of 1-butanol and 290 parts of toluene were mixed. The resulting mixture was stirred at a temperature of 110°C for 3 hours while removing the generated water using a Dean-Stark tube. After the reaction was completed, the solvent was distilled off, 300 parts of ion-exchanged water was added, and the precipitated solid was filtered and taken out. The filtered solid was washed with methanol/ion exchanged water. The obtained solid was dried under reduced pressure at a temperature of 60°C for 12 hours to obtain 4.0 parts of the compound represented by formula (A-1).
於四氫呋喃200份的存在下,在冰浴中將化合物(A-1)2.3份冷卻後,添加N-溴琥珀醯亞胺(東京化成工業(股)製)3.2份,於冰浴下攪拌3小時。在將所得之反應物料(反應液)升溫至室溫後,添加硫代硫酸鈉水溶液,使反應終止。餾除溶劑,以甲醇/離子交換水洗淨所得之固體。將所得之固體乾燥,得到式(A-2)所示之化合物3.6份。針對所得之化合物進行質量分析。 In the presence of 200 parts of tetrahydrofuran, after cooling 2.3 parts of compound (A-1) in an ice bath, 3.2 parts of N-bromosuccinimide (manufactured by Tokyo Chemical Industry Co., Ltd.) was added, and stirred in an ice bath 3 hour. After warming the obtained reaction mass (reaction liquid) to room temperature, an aqueous solution of sodium thiosulfate was added to terminate the reaction. The solvent was distilled off, and the obtained solid was washed with methanol/ion exchange water. The obtained solid was dried to obtain 3.6 parts of the compound represented by formula (A-2). Mass analysis was performed on the obtained compound.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 424.9 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 424.9
精確質量:423.9 Accurate quality: 423.9
[實施例2(式(I)所示之化合物)] [Example 2 (compound represented by formula (I)]]
將實施例1所得之式(A-2)所示之化合物0.85份、四氫呋喃89份及離子交換水70份混合。添加1mol/L的碳酸銫水溶液6份、參(二亞苄基丙酮)-二鈀(0)0.37份、三-第三丁基鏻 四氟硼酸鹽0.46份、2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚(東京化成工業(股)製)1.49份,使其迴流2小時。反應結束後,添加10%乙酸水溶液使反應停止。加入10%食鹽水,分液後將有機層濃縮。以甲苯/1-丁醇=1/1的溶液100份使所得之固體進行再結晶,得到式(A-3)所示之化合物0.4份。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 0.85 parts of the compound represented by the formula (A-2) obtained in Example 1, 89 parts of tetrahydrofuran, and 70 parts of ion-exchanged water were mixed. Add 1mol/L of cesium carbonate aqueous solution 6 parts, ginseng (dibenzylideneacetone)-dipalladium (0) 0.37 parts, tri-tert-butylphosphonium tetrafluoroborate 0.46 parts, 2,6-dimethyl- 1.49 parts of 4-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)phenol (manufactured by Tokyo Chemical Industry Co., Ltd.) was refluxed for 2 hours. After the reaction was completed, a 10% aqueous acetic acid solution was added to stop the reaction. 10% saline was added, and the organic layer was concentrated after liquid separation. The resulting solid was recrystallized with 100 parts of a solution of toluene/1-butanol=1/1 to obtain 0.4 parts of the compound represented by formula (A-3). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 509.2 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 509.2
精確質量:508.24 Accurate quality: 508.24
[實施例3(式(I)所示之化合物)] [Example 3 (compound represented by formula (I)]]
除了使用3,4,5-三甲氧基苯基硼酸取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-4)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to using 3,4,5-trimethoxyphenylboronic acid instead of 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3,2-bis in Example 2 Except for oxaborolan-2-yl)phenol, it was synthesized in the same manner as in Example 2 to obtain a compound represented by formula (A-4). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 601.3 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 601.3
精確質量:600.25 Accurate quality: 600.25
[實施例4(式(I)所示之化合物)] [Example 4 (Compound represented by formula (I)]]
除了使用4-己基苯基硼酸取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-5)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to using 4-hexylphenylboronic acid instead of 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3,2-dioxaborolane-2 in Example 2 -Group) except phenol, synthesized in the same manner as in Example 2 to obtain a compound represented by formula (A-5). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 589.4 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 589.4
精確質量:588.37 Accurate quality: 588.37
[實施例5(式(I)所示之化合物)] [Example 5 (compound represented by formula (I)]]
除了使用4-己氧基苯基硼酸取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-6)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to using 4-hexyloxyphenylboronic acid instead of 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3,2-dioxaborolane in Example 2 Except for 2-yl)phenol, it was synthesized in the same manner as in Example 2 to obtain a compound represented by formula (A-6). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 621.4 (Mass analysis) ionization mode=ESI + : m/z=[M+H] + 621.4
精確質量:620.36 Accurate quality: 620.36
[實施例6(式(I)所示之化合物)] [Example 6 (compound represented by formula (I)]]
除了使用4-(二甲胺基)苯基硼酸取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-7)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to using 4-(dimethylamino)phenylboronic acid instead of 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3,2-dioxane in Example 2 Except for heteroborane-2-yl)phenol, it was synthesized in the same manner as in Example 2 to obtain a compound represented by formula (A-7). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 507.3 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 507.3
精確質量:506.27 Accurate quality: 506.27
[實施例7(式(I)所示之化合物)] [Example 7 (compound represented by formula (I)]]
除了使用4-(二苯胺基)苯基硼酸取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-8)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to using 4-(diphenylamino)phenylboronic acid instead of 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3,2-dioxa in Example 2 Except for borane-2-yl)phenol, it was synthesized in the same manner as in Example 2 to obtain a compound represented by formula (A-8). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 754.3 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 754.3
精確質量:754.33 Accurate quality: 754.33
[實施例8(式(I)所示之化合物)] [Example 8 (compound represented by formula (I)]]
除了使用4’-丙基-4-聯苯硼酸取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-9)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to using 4'-propyl-4-biphenylboronic acid instead of 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3,2-dioxane in Example 2 Except for heteroborane-2-yl)phenol, it was synthesized in the same manner as in Example 2 to obtain a compound represented by formula (A-9). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 657.3 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 657.3
精確質量:656.34 Accurate quality: 656.34
[實施例9(式(I)所示之化合物)] [Example 9 (compound represented by formula (I)]]
除了使用6-乙氧基-2-萘硼酸取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-10)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to using 6-ethoxy-2-naphthaleneboronic acid instead of 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3,2-dioxa in Example 2 Except for borane-2-yl)phenol, it was synthesized in the same manner as in Example 2 to obtain a compound represented by formula (A-10). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 609.3 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 609.3
精確質量:608.27 Accurate quality: 608.27
[實施例10(式(I)所示之化合物)] [Example 10 (compound represented by formula (I)]]
除了使用9,9-二甲基茀-2-硼酸取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-11)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to using 9,9-dimethyl stilbene-2-boronic acid instead of 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3,2-bis in Example 2 Except for oxaborolan-2-yl)phenol, it was synthesized in the same manner as in Example 2 to obtain a compound represented by formula (A-11). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 653.3 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 653.3
精確質量:652.31 Accurate quality: 652.31
[實施例11(式(I)所示之化合物)] [Example 11 (compound represented by formula (I)]]
除了使用苯并[b]噻吩-2-硼酸取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-12)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to using benzo[b]thiophene-2-boronic acid instead of 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3,2-dioxa in Example 2 Except for borane-2-yl)phenol, it was synthesized in the same manner as in Example 2 to obtain a compound represented by formula (A-12). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 533.1 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 533.1
精確質量:532.13 Accurate quality: 532.13
[實施例12(式(I)所示之化合物)] [Example 12 (compound represented by formula (I)]]
除了使用9-乙基咔唑-3-硼酸取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-13)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to using 9-ethylcarbazole-3-boronic acid instead of 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3,2-dioxa in Example 2 Except for borane-2-yl)phenol, it was synthesized in the same manner as in Example 2 to obtain a compound represented by formula (A-13). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 655.3 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 655.3
精確質量:654.30 Accurate quality: 654.30
[實施例13(式(I)所示之化合物)] [Example 13 (compound represented by formula (I)]]
除了使用9-(4-聯苯基)咔唑-3-硼酸嚬哪醇取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-14)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to the use of 9-(4-biphenyl)carbazole-3-boronic acid cannapol to replace 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1 in Example 2 , 3,2-dioxaborolan-2-yl)phenol, was synthesized in the same manner as in Example 2 to obtain a compound represented by formula (A-14). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 903.4 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 903.4
精確質量:902.36 Accurate quality: 902.36
[比較例1] [Comparative Example 1]
除了使用3-乙基-2,4-二甲基吡咯取代實施例1的式(A-1)所示之化合物的合成法中的2,4-二甲基吡咯之外,以與式(A-1)所示之化合物相同方式合成,得到式(B-1)所示之化合物。針對所得之化合物測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to using 3-ethyl-2,4-dimethylpyrrole in place of 2,4-dimethylpyrrole in the synthesis method of the compound represented by the formula (A-1) in Example 1, the formula ( The compound represented by A-1) is synthesized in the same manner to obtain the compound represented by formula (B-1). The maximum absorption wavelength was measured for the obtained compound. Table 1 shows the measured maximum absorption wavelength.
[比較例2] [Comparative Example 2]
以實施例1的式(A-1)所示之化合物的合成法的順序得到式(A-1)所示之化合物。針對所得之化合物測量最大吸收波長。表1中顯示測量到的最大吸收波長。 The compound represented by formula (A-1) was obtained in the order of the synthesis method of the compound represented by formula (A-1) in Example 1. The maximum absorption wavelength was measured for the obtained compound. Table 1 shows the measured maximum absorption wavelength.
[實施例14(式(I)所示之化合物)] [Example 14 (compound represented by formula (I)]]
除了使用4-第三丁基苯基硼酸取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-15)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to using 4-tert-butylphenylboronic acid instead of 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3,2-dioxaboron in Example 2 Except for alkyl-2-yl)phenol, it was synthesized in the same manner as in Example 2 to obtain a compound represented by formula (A-15). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 533.3 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 533.3
精確質量:532.3 Accurate quality: 532.3
[實施例15(式(I)所示之化合物)] [Example 15 (compound represented by formula (I)]]
除了使用4-甲氧基-3,5-二甲基苯基硼酸取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-16)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to using 4-methoxy-3,5-dimethylphenylboronic acid instead of 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3 in Example 2 ,2-dioxaborolan-2-yl)phenol, was synthesized in the same manner as in Example 2 to obtain a compound represented by formula (A-16). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 537.2 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 537.2
精確質量:536.3 Accurate quality: 536.3
[實施例16(式(I)所示之化合物)] [Example 16 (compound represented by formula (I)]]
除了使用4-羧基苯基硼酸嚬哪醇取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-17)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to using 4-carboxyphenylboronic acid cannapol to replace 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3,2-dioxaborol in Example 2 Except for alkyl-2-yl)phenol, it was synthesized in the same manner as in Example 2 to obtain a compound represented by formula (A-17). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 509.5 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 509.5
精確質量:508.2 Accurate quality: 508.2
[實施例17(式(I)所示之化合物)] [Example 17 (Compound represented by formula (I)]]
除了使用1-噻蒽硼酸取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-18)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to the use of 1-thianthraboric acid instead of 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3,2-dioxaborolane-2- in Example 2 The compound represented by the formula (A-18) was obtained in the same manner as in Example 2 except for phenyl)phenol. Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 697.2 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 697.2
精確質量:696.1 Accurate quality: 696.1
[實施例18(式(I)所示之化合物)] [Example 18 (compound represented by formula (I)]]
除了使用4-甲基-1-萘硼酸取代實施例2中的2,6-二甲基-4-(4,4,5,5-四甲基-1,3,2-二氧雜硼烷-2-基)酚之外,以與實施例2之相同方式合成,得到式(A-19)所示之化合物。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 In addition to using 4-methyl-1-naphthaleneboronic acid instead of 2,6-dimethyl-4-(4,4,5,5-tetramethyl-1,3,2-dioxaboron in Example 2 Except for alkyl-2-yl)phenol, it was synthesized in the same manner as in Example 2 to obtain a compound represented by formula (A-19). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 549.2 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 549.2
精確質量:548.3 Accurate quality: 548.3
[實施例19(式(II)所示之化合物)] [Example 19 (compound represented by formula (II)]]
將3,4-二丁氧基-3-環丁烯-1,2-二酮(東京化成工業(股)製)11.89份及1-丁醇38.9份混合,於110℃加熱攪拌。在所得之混合物中,花費10分鐘滴入2,4-二甲基吡咯(東京化成工業(股)製)5.0份,進行加熱迴流3小時。將所得之混合物冷卻至室溫,過濾析出之結晶,將溶液與結晶分開。對於所得之結晶,使用己烷327份,實施再漿化(repulp)洗淨,結果得到淡綠色的固體。 11.89 parts of 3,4-dibutoxy-3-cyclobutene-1,2-dione (manufactured by Tokyo Chemical Industry Co., Ltd.) and 38.9 parts of 1-butanol were mixed, and heated and stirred at 110°C. To the resulting mixture, 5.0 parts of 2,4-dimethylpyrrole (manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise over 10 minutes, and heated to reflux for 3 hours. The resulting mixture was cooled to room temperature, the precipitated crystals were filtered, and the solution was separated from the crystals. Regarding the obtained crystals, 327 parts of hexane was used and repulp washing was carried out. As a result, a light green solid was obtained.
在以濃鹽酸7.1份及蒸餾水40份進行調整的水溶液中,混合乙酸48.3份與上述固體,於110℃進行加熱迴流2小時,結果顏色從淡綠色變成淡橙色,反應停止。 將所得之反應液冷卻至室溫,過濾出淡橙色的粉體。以164份的己烷對於所得之粉末進行再漿化洗淨,得到淡黃色的式(C-1)所示之化合物5.65份(產率56.2%)。 In an aqueous solution adjusted with 7.1 parts of concentrated hydrochloric acid and 40 parts of distilled water, 48.3 parts of acetic acid and the above solid were mixed, and heated and refluxed at 110°C for 2 hours. As a result, the color changed from pale green to pale orange, and the reaction was stopped. The resulting reaction liquid was cooled to room temperature, and the light orange powder was filtered. The obtained powder was reslurried and washed with 164 parts of hexane to obtain 5.65 parts (yield 56.2%) of the compound represented by the formula (C-1) as pale yellow.
將式(C-1)所示之化合物1.39份、3-乙醯基-2,4-二甲基吡咯(東京化成工業(股)製)1.0份、1-丁醇21.6份及甲苯35.7份混合,於110℃進行加熱迴流3小時。將所得之反應液冷卻至室溫,對於析出之結晶進行過濾,而將溶液與結晶分開。使用327份的己烷,對於結晶進行再漿化洗淨,得到紫色的式(C-2)所示之化合物0.96份(產率85.3%)。 Combine 1.39 parts of the compound represented by formula (C-1), 1.0 part of 3-acetoxy-2,4-dimethylpyrrole (manufactured by Tokyo Chemical Industry Co., Ltd.), 21.6 parts of 1-butanol and 35.7 parts of toluene Mix, heat and reflux at 110°C for 3 hours. The resulting reaction liquid was cooled to room temperature, the precipitated crystals were filtered, and the solution was separated from the crystals. Using 327 parts of hexane, the crystals were reslurried and washed to obtain 0.96 parts of the compound represented by the purple formula (C-2) (yield: 85.3%).
將式(C-2)所示之化合物0.80份及脫水四氫呋喃59.5份混合,於冰溫下(5℃)進行氮取代並且攪拌30分鐘。 0.80 parts of the compound represented by the formula (C-2) and 59.5 parts of dehydrated tetrahydrofuran were mixed, nitrogen substitution was carried out at ice temperature (5°C) and stirred for 30 minutes.
在所得之混合物中投入N-溴琥珀醯亞胺0.94份,於冰溫下(5℃)攪拌2小時。在所得之反應液中加入純水,進行過濾而取得結晶。將所得之結晶再溶解於四氫呋喃後加入純水,再使結晶析出,得到黑紫色的式(A-20)所示之化合物0.91份(產率90.7%)。針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯 示測量到的最大吸收波長。 0.94 parts of N-bromosuccinimide was added to the resulting mixture, and stirred at ice temperature (5°C) for 2 hours. Pure water was added to the resulting reaction liquid, and filtered to obtain crystals. The obtained crystals were redissolved in tetrahydrofuran, pure water was added, and the crystals were precipitated to obtain 0.91 parts of the compound represented by the formula (A-20) in black purple (yield: 90.7%). Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 389.2 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 389.2
精確質量:388.04 Accurate quality: 388.04
[實施例20(式(I)所示之化合物)] [Example 20 (compound represented by formula (I)]]
在四頸燒瓶中加入式(A-20)所示之化合物0.195份、四氫呋喃22.2份及純水17.5份,於80℃導入氮氣60分鐘,進行起泡(bubbling)。在所得之混合物中加入參(二亞苄基丙酮)鈀0.092份、[三(第三丁基)鏻]四氟硼酸酯0.116份、1mol/L的碳酸銫水溶液1.5份。一邊於油浴溫度80℃的條件下攪拌反應液,一邊花費10分鐘滴入使0.243份的苯并呋喃-2-硼酸(東京化成工業(股)製)溶解於6.66份之四氫呋喃所得到的溶液,攪拌2小時。在所得之混合物中加入10質量%的乙酸水溶液100份,於氮環境下攪拌15分鐘。 In a four-necked flask, 0.195 parts of the compound represented by the formula (A-20), 22.2 parts of tetrahydrofuran, and 17.5 parts of pure water were added, and nitrogen was introduced at 80° C. for 60 minutes to perform bubbling. To the resulting mixture, 0.092 parts of ginseng (dibenzylideneacetone) palladium, 0.116 parts of [tri(third butyl)phosphonium] tetrafluoroborate, and 1.5 parts of a 1 mol/L cesium carbonate aqueous solution were added. A solution obtained by dissolving 0.243 parts of benzofuran-2-boronic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) in 6.66 parts of tetrahydrofuran was added dropwise over 10 minutes while stirring the reaction liquid at an oil bath temperature of 80°C. And stir for 2 hours. 100 parts of a 10% by mass acetic acid aqueous solution was added to the resulting mixture, and stirred for 15 minutes under a nitrogen atmosphere.
在所得之混合物中加入10%食鹽水0.3份,進行分液操作,以進行有機層的分化。使用蒸發器使有機層乾燥,得到焦油狀的粗精製物1。對於粗精製物1,使用甲醇進行萃取,之後去除甲醇,藉此得到粗產物2。對於所得之粗產物2,使用甲苯/丁醇=1/1的溶液100份使其加熱溶解,進行再結晶,得到式(A-21)所示之化合物0.07份(產率32.8%)。 To the resulting mixture, 0.3 part of 10% saline was added, and a liquid separation operation was performed to differentiate the organic layer. The organic layer was dried using an evaporator to obtain crude
針對所得之化合物進行質量分析,並且測量最大吸收波長。表1中顯示測量到的最大吸收波長。 Mass analysis was performed on the obtained compound, and the maximum absorption wavelength was measured. Table 1 shows the measured maximum absorption wavelength.
(質量分析)離子化模式=ESI+:m/z=[M+H]+ 427.1 (Mass analysis) ionization mode=ESI+: m/z=[M+H] + 427.1
精確質量:426.16 Accurate quality: 426.16
[表1]
[適用例1] [Application example 1]
((甲基)丙烯酸系樹脂的製造) (Manufacture of (meth)acrylic resin)
在具備冷卻管、氮氣導入管、溫度計及攪拌機的反應容器中,加入作為溶劑的乙酸乙酯81.8份、作為單體之丙烯酸丁酯69.8份、丙烯酸甲酯20份、丙烯酸2-羥基乙酯1份、丙烯酸2-苯氧基乙酯8份、丙烯酸2-甲氧基乙酯1份以及丙烯酸0.2份的混合溶液,一邊以氮氣取代反應容器內的空氣而使其中不含氧,一邊使內溫上升至55℃。將使0.14份的偶氮雙異丁腈(聚合起始劑)溶於10份的乙酸乙酯而得到的溶液全部加入所得之混合溶液中。對於所得之混合物,在將內溫保持於55℃1小時之後,一邊將內溫保持於55℃,一邊以添加速度17.3份/hr將乙酸乙酯連續地加入反應容器內,在(甲基)丙烯酸系樹脂的濃度成為35%的時間點,停止添加乙酸乙酯,使其聚合8小時。最後以使(甲基)丙烯酸系樹脂的濃度為20%的方式加入乙酸乙酯,調製成(甲基)丙烯酸系樹脂的乙酸乙酯溶液。針對所得之(甲基)丙烯酸系樹脂,測量重量平均分子量(Mw)及多分散性(Mw/Mn),結果重量平均分子量(Mw)為140萬,多分散性(Mw/Mn)為5.1。 In a reaction vessel equipped with a cooling tube, a nitrogen introduction tube, a thermometer and a stirrer, 81.8 parts of ethyl acetate as a solvent, 69.8 parts of butyl acrylate as a monomer, 20 parts of methyl acrylate, and 2-
(黏著劑組成物1的調製) (Preparation of Adhesive Composition 1)
對於上述(甲基)丙烯酸系樹脂的製造中所得之(甲基)丙烯酸系樹脂的固形分100份,混合交聯劑(從東曹(股)取得之「CORONATE HXR」(六亞甲基二異氰酸酯的三聚異氰酸酯改質體))0.6份、矽烷化合物(從信越化學工業(股)取得之「KBM-403」(3-環氧丙氧基丙基三甲氧基矽烷)0.5份、作為抗靜電劑的N-己基-4-甲基吡啶鎓六氟化磷3份、式(A-5)所示之化合物0.1份,再以使固形分濃度為14%的方式添加乙酸乙酯,以調製黏著劑組成物1的溶液。 For the solid content of the (meth)acrylic resin obtained in the production of the (meth)acrylic resin, 100 parts, a crosslinking agent ("CORONATE HXR" (hexamethylene di Isocyanate modified polyisocyanate)) 0.6 parts, silane compound ("KBM-403" (3-glycidoxypropyltrimethoxysilane) obtained from Shin-Etsu Chemical Co., Ltd.), 0.5 parts 3 parts of N-hexyl-4-methylpyridinium phosphorous hexafluoride as an electrostatic agent, 0.1 parts of the compound represented by formula (A-5), and then ethyl acetate is added so that the solid content concentration is 14%, A solution of
(黏著劑片1的製作) (Preparation of adhesive sheet 1)
使用敷貼器將黏著劑組成物1塗布於經實施脫模處理的、由聚對苯二甲酸乙二酯膜所構成之第1分隔膜(從LINTEC(股)取得的「PLR-382190」)的脫模處理面, 於100℃使其乾燥1分鐘,製作黏著劑層。所得之黏著劑層的厚度為20μm。在所得之黏著劑層上,貼合經實施脫模處理的由聚對苯二甲酸乙二酯膜所構成之第2分隔膜(從LINTEC(股)取得的「PLR-251130」)的脫模處理面,作為黏著劑片1。將所得之黏著劑片1的分隔膜的單側剝離,貼合於無鹼玻璃(Corning公司製EagleXG)的單面,使用紫外可見光光譜儀(島津製作所公司製UV-2450)測量最大吸收波長。其結果顯示於表2。另外,上述分隔膜及無鹼玻璃在波長400nm至700nm中的吸光度幾乎為0。 Using an applicator, apply the
[適用例2] [Application example 2]
除了使用式(A-6)所示的化合物取代式(A-5)所示的化合物之外,藉由與調製黏著劑組成物1之相同方法,調製黏著劑組成物2。除了使用所得之黏著劑組成物2之外,藉由與製作黏著劑片1之相同方法,製作黏著劑片2,測量最大吸收波長。其結果顯示於表2。 An
[適用例3至11] [Application Examples 3 to 11]
除了使用表2所示之化合物取代式(A-5)所示的化合物之外,藉由與調製黏著劑組成物1之相同方法,調製黏著劑組成物5至11。除了使用所得之黏著劑組成物5至11之外,藉由與製作黏著劑片1之相同方法,製作黏著劑片5至11,測量最大吸收波長。其結果顯示於表2。 The adhesive compositions 5 to 11 were prepared in the same manner as in the preparation of the
[比較適用例1] [Comparative Application Example 1]
除了使用式(B-1)所示的化合物取代式(A-5)所示的化合物之外,藉由與調製黏著劑組成物1之相同方法,調製黏著劑組成物3。除了使用所得之黏著劑組成物3之外,藉由與製作黏著劑片1之相同方法,製作黏著劑片3,測量最大吸收波長。其結果顯示於表2。 An adhesive composition 3 was prepared in the same manner as the preparation of the
[比較適用例2] [Comparative Application Example 2]
除了使用式(A-1)所示的化合物取代式(A-5)所示的化合物之外,藉由與調製黏著劑組成物1之相同方法,調製黏著劑組成物4。除了使用所得之黏著劑組成物4之外,藉由與製作黏著劑片1之相同方法,製作黏著劑片4,測量最大吸收波長。其結果顯示於表2。 An adhesive composition 4 was prepared in the same manner as in the preparation of the
[表2]
[比較適用例3] [Comparative Application Example 3]
除了不使用式(A-5)所示的化合物之外,藉由與調製黏著劑組成物1之相同方法,調製黏著劑組成物14。除了使用所得之黏著劑組成物14之外,藉由與製作黏著劑片1之相同方法,製作黏著劑片14。 The
(計算可重現的色域範圍) (Calculate the reproducible color gamut range)
針對適用例3的黏著劑片5,根據所得之吸收光譜,將黏著劑片5應用於具有通用背光及通用彩色濾光片的面板時,藉由模擬算出面板中可重現的色域範圍[%]。另外,用於模擬的通用背光,係在Blue LED中混合了YAG螢光體者,通用的彩色濾光片係依據sRGB的標準顯示器。又,關於可重現的色域範圍[%],以CIE1976表色系算出與DCI P3色規格相對的顏色可重現之範圍,並進行比較。 For the adhesive sheet 5 of Application Example 3, when the adhesive sheet 5 is applied to a panel with a universal backlight and a universal color filter based on the obtained absorption spectrum, the reproducible color gamut range in the panel is calculated by simulation [ %]. In addition, the general-purpose backlight used for simulation is a blue LED mixed with YAG phosphor, and the general-purpose color filter is a standard display based on sRGB. In addition, regarding the reproducible color gamut range [%], the reproducible range of colors relative to the DCI P3 color specification was calculated using the CIE1976 color system and compared.
使用黏著劑片14取代黏著劑片5的情況亦相同地進行計算。以黏著劑片14的顏色可重現之範圍作為基準,根據下式算出顏色可重現之範圍。 In the case where the
顏色可重現之範圍[%]=(使用黏著劑片5時的顏色可重現之範圍)/(使用黏著劑片14時的顏色可重現之範圍)×100 Color reproducible range [%] = (range of reproducible colors when using adhesive sheet 5)/(range of reproducible colors when using adhesive sheet 14) × 100
亦針對黏著劑片3及黏著劑片4,分別與上述相同地計算可重現之色域範圍。結果顯示於表3。 For the adhesive sheet 3 and the adhesive sheet 4, the reproducible color gamut range is calculated in the same manner as above. The results are shown in Table 3.
(背光之穿透率的計算) (Calculation of backlight transmittance)
藉由模擬算出將黏著劑層片5應用於具有通用背光及通用彩色濾光片之面板時背光的穿透量。另外,用於模擬的通用背光,係在Blue LED中混入YAG螢光體者,通用的彩色濾光片係依據sRGB的標準顯示器。 Through simulation, the amount of backlight penetration when the adhesive layer 5 is applied to a panel with a universal backlight and a universal color filter is calculated. In addition, the general-purpose backlight used for simulation is a YAG phosphor mixed with Blue LED, and the general-purpose color filter is a standard display based on sRGB.
針對使用黏著劑片14取代黏著劑片5的情況,亦相同地進行計算。以使用黏著劑片14之情況中背光的穿透量作為基準,根據以下的算式,計算將黏著劑片5使用於面板時背光的穿透率。結果顯示於表3。 For the case where the
背光的穿透率[%]=(使用黏著劑片5時的背光的穿透量)/(使用黏著劑片14時的背光的穿透量)×100 Backlight penetration rate [%] = (the amount of backlight penetration when using the adhesive sheet 5) / (the amount of backlight penetration when using the adhesive sheet 14) × 100
針對黏著劑片3及黏著劑片4,亦分別與上述相同地計算背光的穿透率。結果顯示於表3。 For the adhesive sheet 3 and the adhesive sheet 4, the transmittance of the backlight is also calculated in the same manner as described above. The results are shown in Table 3.
[表3]
將本發明之化合物與(甲基)丙烯酸樹脂溶液混合,製作黏著劑片,藉此可製作在波長580nm附近(波長575至590nm)的波長區域具有最大吸收波長的光學濾光片。又,藉由將包含化合物(I)之黏著劑片(光學濾光片)應用於顯示裝置,可提升穿透之光線中的綠色光與紅色光的分離性,因此能夠擴大可重現的色域範圍。又,亦可抑制背光的穿透率降低。 The compound of the present invention is mixed with a (meth)acrylic resin solution to prepare an adhesive sheet, whereby an optical filter having a maximum absorption wavelength in the wavelength region around 580 nm (wavelength 575 to 590 nm) can be produced. In addition, by applying an adhesive sheet (optical filter) containing the compound (I) to a display device, the separability of the green light and the red light in the transmitted light can be improved, so that the reproducible color can be expanded Domain scope. In addition, the reduction in backlight transmittance can also be suppressed.
[適用例12(光硬化性接著劑液1的調製)] [Application Example 12 (Preparation of Photocurable Adhesive Solution 1)]
對於3’,4’-環氧環己基甲基3,4-環氧環己烷羧酸酯80份,混合1,4-丁二醇二縮水甘油醚20份、光陽離子聚合起始劑3份、式(A-16)所示的化合物1份,並進行脫泡,藉此調製光硬化性接著劑液1。 For 80 parts of 3',4'-epoxycyclohexylmethyl 3,4-epoxycyclohexane carboxylate, mix 20 parts of 1,4-butanediol diglycidyl ether, photocationic polymerization initiator 3 1 part, 1 part of the compound represented by formula (A-16), and defoaming, thereby preparing photocurable
[適用例13(光硬化性接著劑液2的調製)] [Application Example 13 (Preparation of Photocurable Adhesive Solution 2)]
除了添加式(A-18)所示的化合物取代式(A-16)所示的化合物之外,與光硬化性接著劑液1進行相同調製,藉此調製光硬化性接著劑液2。 The photocurable
[適用例14(偏光板1的製作)] [Application Example 14 (Production of Polarizing Plate 1)]
對於包含紫外線吸收劑之厚度60μm的三乙醯纖維素膜[商品名稱“FUJITEC TG60UL”,FUJIFILM(股)製]的表面實施電暈放電處理,使用塗佈棒,在其電暈放電處理面,以使上述調製之光硬化性接著劑液1硬化後的膜厚約為2μm的方式,塗布該光硬化性接著劑液1。在由該塗布所形成之黏著劑層,貼合厚度28μm的聚乙烯醇-碘系偏光片。又,對於環狀聚烯烴系樹脂所構成之厚度50μm的相位差膜[商品名稱“ZEONOR”,日本ZEON(股)製]的表面實施電暈放電處理,使用塗佈棒,在該電暈放電處理面,以使光硬化性接著劑液1硬化後的膜厚約為2μm的方式,塗布該光硬化性接著劑液1。將單面貼有上述製作之三乙醯纖維素膜的偏光片的偏光片側貼合於由該塗布所形成之黏著劑層,以製作積層物。從該積層物的相位差膜側,使用附有輸送帶的紫外線照射裝置(燈源係使用Fusion UV systems公司製的“D bulb”),以累積光量為200mJ/cm2的方式照射紫外線,使接著劑硬化。如此,製作在偏光片的兩面貼合保護膜的偏光板1。將所得之偏光板裁切為40mm×40mm,配置成使測量光從與相位差膜相反側的面入射的形態,使用紫外可見光光譜儀(島津製作所公司製UV-2450),測量在波長400nm至700nm的範圍中,於偏光板之穿透軸方向的穿透光譜。在所得之光譜中,將穿透率極小之波長作為最大吸收波長。結果顯示於表4。 The surface of triacetyl cellulose film [trade name "FUJITEC TG60UL", manufactured by FUJIFILM (made by FUJIFILM Co., Ltd.)] with a thickness of 60 μm containing an ultraviolet absorber was subjected to corona discharge treatment, using a coating rod, on the corona discharge treatment surface, The photocurable
[適用例15(偏光板2的製作)] [Application Example 15 (Production of Polarizing Plate 2)]
除了使用光硬化性接著劑液2取代光硬化性接著劑液1之外,藉由與製作偏光板1之相同方法,製作在偏光片的兩面貼合有保護膜的偏光板2。將所得之偏光板裁切為40mm×40mm,使用與偏光板1之相同手法求得最大吸收波長。結果顯示於表4。 A
[表4]
10‧‧‧光學濾光片 10‧‧‧Optical filter
11‧‧‧影像顯示元件用黏著劑層 11‧‧‧Adhesive layer for image display device
12‧‧‧相位差膜 12‧‧‧phase retardation film
13‧‧‧黏著劑層 13‧‧‧Adhesive layer
14‧‧‧第1保護膜 14‧‧‧The first protective film
15‧‧‧偏光膜 15‧‧‧ Polarizing film
16‧‧‧第2保護膜 16‧‧‧Second protective film
20‧‧‧光學積層體 20‧‧‧Optical laminate
21‧‧‧影像顯示元件用黏著劑層 21‧‧‧Adhesive layer for image display element
24‧‧‧第1保護膜 24‧‧‧The first protective film
25‧‧‧偏光膜 25‧‧‧ Polarizing film
26‧‧‧第2保護膜 26‧‧‧Second protective film
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